AR084513A1 - Metodo para fabricar un crisol para la cristalizacion de silicio, crisol obtenible por dicho metodo y su uso - Google Patents

Metodo para fabricar un crisol para la cristalizacion de silicio, crisol obtenible por dicho metodo y su uso

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Publication number
AR084513A1
AR084513A1 ARP110104852A ARP110104852A AR084513A1 AR 084513 A1 AR084513 A1 AR 084513A1 AR P110104852 A ARP110104852 A AR P110104852A AR P110104852 A ARP110104852 A AR P110104852A AR 084513 A1 AR084513 A1 AR 084513A1
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AR
Argentina
Prior art keywords
weight
crisol
silicon
manufacturing
obtainable
Prior art date
Application number
ARP110104852A
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English (en)
Inventor
Rune Roligheten
Original Assignee
Steuler Solar Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Steuler Solar Gmbh filed Critical Steuler Solar Gmbh
Publication of AR084513A1 publication Critical patent/AR084513A1/es

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    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B28/00Production of homogeneous polycrystalline material with defined structure
    • C30B28/04Production of homogeneous polycrystalline material with defined structure from liquids
    • C30B28/06Production of homogeneous polycrystalline material with defined structure from liquids by normal freezing or freezing under temperature gradient
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    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/58Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
    • C04B35/584Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicon nitride
    • C04B35/591Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicon nitride obtained by reaction sintering
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    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/002Crucibles or containers for supporting the melt
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    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/14Crucibles or vessels
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    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • C30B29/06Silicon
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    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/327Iron group oxides, their mixed metal oxides, or oxide-forming salts thereof
    • C04B2235/3272Iron oxides or oxide forming salts thereof, e.g. hematite, magnetite
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    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/38Non-oxide ceramic constituents or additives
    • C04B2235/3817Carbides
    • C04B2235/3826Silicon carbides
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    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/42Non metallic elements added as constituents or additives, e.g. sulfur, phosphor, selenium or tellurium
    • C04B2235/428Silicon
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    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/46Gases other than oxygen used as reactant, e.g. nitrogen used to make a nitride phase
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    • C04B2235/50Constituents or additives of the starting mixture chosen for their shape or used because of their shape or their physical appearance
    • C04B2235/54Particle size related information
    • C04B2235/5418Particle size related information expressed by the size of the particles or aggregates thereof
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    • C04B2235/656Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes characterised by specific heating conditions during heat treatment
    • C04B2235/6562Heating rate
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    • C04B2235/74Physical characteristics
    • C04B2235/77Density
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10Apparatus
    • Y10T117/1024Apparatus for crystallization from liquid or supercritical state

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Ceramic Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Structural Engineering (AREA)
  • Ceramic Products (AREA)
  • Silicon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Catalysts (AREA)

Abstract

Método para fabricar un crisol para la cristalización de silicio, que comprende las etapas de: preparar una lechada de sólidos y líquidos, dichos sólidos comprenden: polvo de metal de silicio, hasta 25% (peso a peso) de polvo SiC, hasta 10% (peso a peso) de SiN, hasta 0,5% (peso a peso) de un catalizador, hasta 1% (peso a peso) de un aglutinante; formar la lechada en un cuerpo verde de un crisol; calentar el cuerpo verde en una atmósfera de nitrógeno que opcionalmente comprende gas inerte, para hacer reaccionar el silicio al menos parcialmente en nitruro de silicio.
ARP110104852A 2010-12-22 2011-12-21 Metodo para fabricar un crisol para la cristalizacion de silicio, crisol obtenible por dicho metodo y su uso AR084513A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP10196529 2010-12-22

Publications (1)

Publication Number Publication Date
AR084513A1 true AR084513A1 (es) 2013-05-22

Family

ID=43560033

Family Applications (1)

Application Number Title Priority Date Filing Date
ARP110104852A AR084513A1 (es) 2010-12-22 2011-12-21 Metodo para fabricar un crisol para la cristalizacion de silicio, crisol obtenible por dicho metodo y su uso

Country Status (14)

Country Link
US (1) US20130284084A1 (es)
EP (1) EP2655705B1 (es)
JP (1) JP2014503459A (es)
KR (1) KR101550115B1 (es)
CN (1) CN103298983B (es)
AR (1) AR084513A1 (es)
DK (1) DK2655705T3 (es)
ES (1) ES2535340T3 (es)
HU (1) HUE025241T2 (es)
PL (1) PL2655705T3 (es)
SG (1) SG191169A1 (es)
SI (1) SI2655705T1 (es)
TW (1) TWI523827B (es)
WO (1) WO2012084832A1 (es)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105198440B (zh) * 2015-11-02 2018-02-06 攀枝花学院 耐热震性碳化硅坩埚及其制作工艺
DE102018206982A1 (de) * 2018-05-04 2019-11-07 Alzchem Trostberg Gmbh Tiegel zur Herstellung von multikristallinem Silicium mittels gerichteter Erstarrung, Verfahren zu dessen Herstellung und dessen Verwendung, sowie Verfahren zur Herstellung von multikristallinem Silicium mittels gerichteter Erstarrung
FR3131295B1 (fr) 2021-12-23 2023-12-29 Saint Gobain Ct Recherches support de cuisson de poudre alcaline avec revêtement de porosité contrôlée

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH326155A (de) * 1952-12-23 1957-12-15 Carborundum Co Verfahren zur Herstellung von Siliziumnitrid
GB895769A (en) * 1959-02-27 1962-05-09 Nat Res Dev Improvements in or relating to shaped silicon nitride bodies and their manufacture
US3206318A (en) * 1961-04-25 1965-09-14 Showa Denko Kk Refractory material
GB1206468A (en) * 1967-04-10 1970-09-23 Lucas Industries Ltd Method of manufacturing silicon nitride powder
GB1373816A (en) * 1972-05-11 1974-11-13 Advanced Materials Eng Method of making ceramic hollow -ware articles from powdered material
DE3639335A1 (de) * 1986-11-18 1988-05-26 Bayer Ag Gegenueber metall- und salzschmelzen resistente werkstoffe, ihre herstellung und deren verwendung
CA2116644A1 (en) * 1994-02-28 1995-08-29 Yasunobu Kawakami Silicon nitride reaction-sintered body and method and apparatus for producing same
US5928601A (en) * 1994-02-28 1999-07-27 Honda Giken Kogyo Kabushiki Kaisha Method for producing silicon nitride reaction sintered body
JPH1095604A (ja) * 1996-09-17 1998-04-14 Shin Etsu Chem Co Ltd 高α型窒化ケイ素の製造方法
JPH10101311A (ja) * 1996-10-02 1998-04-21 Shin Etsu Chem Co Ltd 窒化ケイ素粉末の製造方法
JPH10203808A (ja) * 1997-01-16 1998-08-04 Shin Etsu Chem Co Ltd 高α型窒化ケイ素の製造方法
JPH1160217A (ja) * 1997-08-13 1999-03-02 Shin Etsu Chem Co Ltd 窒化ケイ素粉末の製造方法
JPH11278812A (ja) * 1998-03-30 1999-10-12 Shin Etsu Chem Co Ltd 窒化ケイ素粉末の製造方法
NO317080B1 (no) 2002-08-15 2004-08-02 Crusin As Silisiumnitriddigler som er bestandige mot silisiumsmelter og fremgangsmate for fremstilling av slike digler
EP1811064A1 (fr) * 2006-01-12 2007-07-25 Vesuvius Crucible Company Creuset pour le traitement de silicium à l'état fondu
CN101495680A (zh) 2006-06-23 2009-07-29 Rec斯坎沃佛股份有限公司 可重复使用的坩埚及其制造方法
US20090208400A1 (en) * 2006-06-23 2009-08-20 Stein Julsrud Method and crucible for direct solidification of semiconductor grade multi-crystalline silicon ingots
DE102006060561C5 (de) * 2006-12-21 2015-09-10 Schott Ag Verfahren zur Herstellung eines Quarzglasformkörpers
US8062704B2 (en) * 2007-08-02 2011-11-22 Motech Americas, Llc Silicon release coating, method of making same, and method of using same
CN201567387U (zh) * 2009-12-01 2010-09-01 江苏华盛精细陶瓷科技有限公司 太阳能电池用氮化硅坩埚
CN201553616U (zh) * 2009-12-01 2010-08-18 江苏华盛精细陶瓷科技有限公司 多晶硅太阳能电池铸锭用氮化硅坩埚

Also Published As

Publication number Publication date
SI2655705T1 (sl) 2015-07-31
ES2535340T3 (es) 2015-05-08
SG191169A1 (en) 2013-07-31
EP2655705B1 (en) 2015-01-28
EP2655705A1 (en) 2013-10-30
PL2655705T3 (pl) 2015-08-31
KR101550115B1 (ko) 2015-09-03
TW201226364A (en) 2012-07-01
HUE025241T2 (en) 2016-03-29
CN103298983B (zh) 2016-03-16
DK2655705T3 (en) 2015-04-27
TWI523827B (zh) 2016-03-01
WO2012084832A1 (en) 2012-06-28
US20130284084A1 (en) 2013-10-31
JP2014503459A (ja) 2014-02-13
KR20130102632A (ko) 2013-09-17
CN103298983A (zh) 2013-09-11

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