TWI539589B - Display device packaging method and device - Google Patents

Display device packaging method and device Download PDF

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TWI539589B
TWI539589B TW102139517A TW102139517A TWI539589B TW I539589 B TWI539589 B TW I539589B TW 102139517 A TW102139517 A TW 102139517A TW 102139517 A TW102139517 A TW 102139517A TW I539589 B TWI539589 B TW I539589B
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glass paste
paste layer
display device
packaging
height
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TW102139517A
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TW201442220A (en
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翟宏峰
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上海和輝光電有限公司
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass

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  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)

Description

顯示器件的封裝方法及裝置 Display device packaging method and device

本發明涉及顯示裝置的封裝技術領域,具體涉及一種顯示器件的封裝方法及裝置。 The present invention relates to the field of packaging technology for display devices, and in particular, to a packaging method and device for a display device.

目前,在OLED的低熔點玻璃(frit)封裝工藝中均包括燒結工藝,即於襯底上塗布一圈玻璃膏層(frit paste)後,通過烘烤工藝將玻璃膏層內的溶劑蒸發掉,以將該玻璃膏固化。 At present, in the low-melting frit packaging process of the OLED, a sintering process is included, that is, after coating a circle of a frit paste on the substrate, the solvent in the glass paste layer is evaporated by a baking process. The glass paste is cured.

但是,由於在塗布玻璃膏時不能保證玻璃膏層上表面的平整度,且經過烘烤工藝後的該玻璃膏層的形貌就會定型,即當塗覆形成的玻璃膏層具有粗糙的上表面時,經過烘烤工藝後,已經固化的玻璃膏層的上表面也是粗糙的,在進行laser sealing(鐳射封裝)工藝以及其他後續的封裝制程時,會降低封裝工藝的密封性,進而影響器件的性能和產品的良率。 However, since the flatness of the upper surface of the glass paste layer cannot be ensured when the glass paste is applied, the morphology of the glass paste layer after the baking process is shaped, that is, when the glass paste layer formed by the coating has a rough upper surface On the surface, after the baking process, the upper surface of the cured glass paste layer is also rough, which will reduce the sealing of the packaging process and further affect the device during the laser sealing process and other subsequent packaging processes. Performance and product yield.

第一圖為傳統封裝工藝的結構示意圖,如第一圖所示,硬質基板1上設置有器件區2,環繞該器件區2的周圍塗覆有玻璃膏3,由於塗覆過程中難以控制該玻璃膏3上表面的平整度,進而造成塗覆形成的玻璃膏3的上表面較為粗糙;在經過烘烤工藝之後,由於其形貌不會因烘烤工藝而有所改變,即制備的玻璃膏層的上表面具有如第一圖所示粗糙結構,後續採用蓋板4對器件區域2進行封裝時,由於玻璃膏層3的上表面不平整,使得蓋板4與該玻璃膏層3的接觸面結合不緊密(留有細微的縫隙),會造成後續封裝工藝的密封性降低,容易導致外界的水、氧等雜質會滲透至該器件區域2中,進而會降低產品的性能及其良率。 The first figure is a schematic structural view of a conventional packaging process. As shown in the first figure, the hard substrate 1 is provided with a device region 2, and the periphery of the device region 2 is coated with a glass paste 3, which is difficult to control due to the coating process. The flatness of the upper surface of the glass paste 3, which in turn causes the upper surface of the glass paste 3 formed by the coating to be rough; after the baking process, the shape is not changed by the baking process, that is, the prepared glass The upper surface of the paste layer has a rough structure as shown in the first figure. When the device region 2 is subsequently packaged by the cover 4, the upper surface of the glass paste layer 3 is uneven, so that the cover 4 and the glass paste layer 3 are If the contact surface is not tightly bonded (with a slight gap), the sealing performance of the subsequent packaging process will be reduced, and the external water, oxygen and other impurities will easily penetrate into the device region 2, which will reduce the performance of the product. rate.

中國專利(公開號:CN 102436999 A)公開了一種顯示裝置的封裝結構及封裝方法,包含玻璃框架、玻璃熔塊、至少一線圈組合以 及玻璃基板。玻璃框架具有接合面,玻璃熔塊對應設置於接合面上,線圈組合設置於接合面與玻璃熔塊之間;玻璃基板覆膏於玻璃框架上,使玻璃熔塊位於玻璃框架與玻璃基板之間。但是該發明所公開的顯示裝置封裝結構,其主要是在顯示裝置的框架與玻璃基板的接合處設置封閉線圈,並利用高周波的電磁感應原理,使得框架與玻璃基板之間所設置的封閉線圈感應升溫來進行封裝工藝。但是該專利文獻記載的技術方案中在使用高周波的電磁感應使框架與玻璃基板之間的封閉線圈感應升溫時並不能保證玻璃熔塊表面的平整性,進而降低封合後的密封性能。 Chinese Patent (Publication No.: CN 102436999 A) discloses a package structure and a packaging method of a display device, comprising a glass frame, a glass frit, and at least one coil combination And a glass substrate. The glass frame has a joint surface, the glass frit is correspondingly disposed on the joint surface, the coil combination is disposed between the joint surface and the glass frit; the glass substrate is coated on the glass frame, and the glass frit is located between the glass frame and the glass substrate . However, the display device package structure disclosed in the invention mainly provides a closed coil at a joint between the frame of the display device and the glass substrate, and utilizes a high-frequency electromagnetic induction principle to cause a closed coil sensing between the frame and the glass substrate. Warming up to carry out the encapsulation process. However, in the technical solution described in this patent document, when high-frequency electromagnetic induction is used to induce temperature rise of the closed coil between the frame and the glass substrate, the flatness of the surface of the glass frit cannot be ensured, and the sealing performance after sealing can be reduced.

中國專利(公開號:CN 19537199 B),公開了一種有機發光顯示裝置及其制造方法,該裝置包括:第一基板;有機發光像素陣列,形成在基底上;第二基底,與第一基底相對。熔塊密封件,置於所述第一基底和所述第二基底之間,同時包圍所述陣列,其中,所述熔塊密封件包括面向所述陣列的內表面;膜結構,包括一個或多個層狀膜,其中,所述膜結構包括置於所述第二基底和所述陣列之間的部分,所述膜結構基本上填充所述第二基底和所述陣列之間的空間並且還接觸所述第二基底的所述內表面和所述頂表面,其中,所述膜結構還基本上接觸所述熔塊密封件的內表面的整個部分,其中,接觸所述熔塊密封件的所述內表面的所述膜結構包含樹脂材料,其中,所述熔塊密封件還包括背離所述陣列的外表面,其中,相同的樹脂材料形成在所述熔塊密封件的外表面的整個部分上。該專利文獻記載的技術方案中是通過設計密封件在頂基底或底基底表面平行的方向上的厚度和寬度,使之在密封件與底基底和頂基底之間接觸,以將頂板與底板之間形成緊閉的接合,但是在進行封裝工藝中並不能夠很好地保證封裝的密封性,進而導致外部水、氧進入器件,進而影響產品性能。 Chinese Patent (Publication No.: CN 19537199 B), discloses an organic light emitting display device and a method of fabricating the same, comprising: a first substrate; an organic light emitting pixel array formed on the substrate; and a second substrate opposite to the first substrate . a frit seal disposed between the first substrate and the second substrate while surrounding the array, wherein the frit seal includes an inner surface facing the array; a film structure comprising one or a plurality of layered films, wherein the film structure includes a portion disposed between the second substrate and the array, the film structure substantially filling a space between the second substrate and the array and Also contacting the inner surface of the second substrate and the top surface, wherein the film structure also substantially contacts an entire portion of the inner surface of the frit seal, wherein contacting the frit seal The film structure of the inner surface comprises a resin material, wherein the frit seal further comprises an outer surface facing away from the array, wherein the same resin material is formed on an outer surface of the frit seal On the whole part. In the technical solution described in the patent document, the thickness and width of the sealing member in the direction parallel to the surface of the top substrate or the bottom substrate are designed to be in contact with the bottom substrate and the top substrate to connect the top plate and the bottom plate. A tight joint is formed between them, but the sealing property of the package is not well ensured in the packaging process, which causes external water and oxygen to enter the device, thereby affecting product performance.

美國專利(公開號:US 2008/0001533)公開了一種有機電致發光顯示器件及其制造方法,其中包括:制備第一基板;在第一基板上形成顯示元件;制備第二基板;在第一或第二基板的外圍塗覆密封劑,並且粘接所述第一基板到所述第二基板;以及固化所述密封劑,所述密封劑包括玻璃粉末和光~熱轉換劑,所述顯示元件包括設置於第一基板上並具有不同功函數的第一電極和第二電極;以及設置在第一電極和第二電極之間並且具有有機發光層的有機層,在所述第二基板中還包括濕氣吸收劑。 熔塊玻璃通過防止有機電致發光二極管在固化工藝過程被熱分解,可以減少濕氣和氧氣傳播率,以提高密封性。該專利文獻中記載了通過熔塊玻璃封裝兩個基板,可以增加有機電致發光顯示器的壽命和可靠性的技術方案,但該技術方案在進行封裝工藝後也並不能夠很好的保證器件良好的密封性,從而導致外部水、氧進入器件內部,影響器件性能。 An organic electroluminescent display device and a method of fabricating the same are disclosed in US Patent Publication No. US 2008/0001533, which comprises: preparing a first substrate; forming a display element on the first substrate; preparing a second substrate; Or applying a sealant to the periphery of the second substrate, and bonding the first substrate to the second substrate; and curing the sealant, the sealant comprising a glass powder and a light-to-heat conversion agent, the display element a first electrode and a second electrode disposed on the first substrate and having different work functions; and an organic layer disposed between the first electrode and the second electrode and having an organic light-emitting layer, further in the second substrate Includes moisture absorbent. The frit glass can reduce the moisture and oxygen transmission rate by preventing the organic electroluminescent diode from being thermally decomposed during the curing process to improve the sealing property. The patent document describes a technical solution for encapsulating two substrates by frit glass, which can increase the life and reliability of the organic electroluminescent display, but the technical solution does not ensure good device well after the packaging process. The sealing property causes external water and oxygen to enter the inside of the device and affect device performance.

本發明提供了一種顯示器件的封裝方法及裝置,通過在基板上塗覆玻璃膏後,進行低溫烘烤工藝,以蒸發掉玻璃膏中一部分的溶劑,形成半固化的玻璃膏,並繼續使用一個具有平整表面的平板對該半固化的玻璃膏的表面進行平坦化處理,以改善該玻璃膏的上表面的平整度,最後再利用高溫烘烤蒸發掉玻璃膏內剩餘的溶劑,以形成具有平整表面的完全固化的玻璃膏,從而保證了在進行後續的封裝方法時蓋板與該玻璃膏的密封性,進而提高了經過封裝方法的器件的性能和產品良率。 The invention provides a method and a device for packaging a display device. After applying a glass paste on a substrate, a low-temperature baking process is performed to evaporate a part of the solvent in the glass paste to form a semi-cured glass paste, and continue to use one The flat surface plate flattens the surface of the semi-cured glass paste to improve the flatness of the upper surface of the glass paste, and finally evaporates the remaining solvent in the glass paste by high-temperature baking to form a flat surface. The fully cured glass paste ensures the sealing of the cover and the glass paste during subsequent packaging methods, thereby improving the performance and yield of the packaged device.

本發明採用的技術方案為:一種顯示器件的封裝方法,應用於一具有器件區域的硬質基板上,其中,包括以下步驟:於所述基板的一表面塗覆玻璃膏層,所述玻璃膏層環繞所述器件區域形成一閉合的玻璃膏層;對所述玻璃膏層進行第一次加熱,並對所述玻璃膏層的上表面進行平坦化處理;對所述玻璃膏層進行第二次加熱,並固化所述玻璃膏層。 The technical solution adopted by the present invention is: a packaging method of a display device, which is applied to a rigid substrate having a device region, wherein the method comprises the steps of: coating a surface of the substrate with a glass paste layer, the glass paste layer Forming a closed glass paste layer around the device region; heating the glass paste layer for the first time, and planarizing the upper surface of the glass paste layer; performing the glass paste layer a second time The glass paste layer is heated and cured.

優選的,該顯示器件的封裝方法,其中,採用第一次加熱步驟之溫度範圍為80℃~120℃。 Preferably, the display device is packaged in a temperature range of 80 ° C to 120 ° C using the first heating step.

優選的,該顯示器件的封裝方法,其中,採用第二次加熱步驟之溫度高於所述第一加熱步驟之溫度。 Preferably, the display device is packaged in which the temperature of the second heating step is higher than the temperature of the first heating step.

優選的,該顯示器件的封裝方法,其中,所述第二次加熱步驟之溫度範圍為100℃~150℃。 Preferably, the display device is packaged, wherein the second heating step has a temperature ranging from 100 ° C to 150 ° C.

優選的,該顯示器件的封裝方法,其中,採用一壓板對所述玻璃膏層的上表面進行平坦化處理。 Preferably, the display device is packaged in which the upper surface of the glass paste layer is planarized by a press plate.

優選的,該顯示器件的封裝方法,其中,所述壓板上設置有一聯動裝置,所述聯動裝置用於控制所述壓板對所述玻璃膏層的上表面進 行平坦化處理。 Preferably, the display device of the display device, wherein the pressure plate is provided with a linkage device for controlling the pressure plate to enter the upper surface of the glass paste layer Line flattening.

優選的,該顯示器件的封裝方法,其中,所述壓板與所述玻璃膏層接觸的表面上設置有襯墊,且該襯墊的高度小於所述玻璃膏層的厚度。 Preferably, the display device of the display device, wherein the surface of the platen contacting the glass paste layer is provided with a gasket, and the height of the gasket is smaller than the thickness of the glass paste layer.

優選的,該顯示器件的封裝方法,其中,所述襯墊的高度為5um~30um。 Preferably, the display device is packaged, wherein the spacer has a height of 5 um to 30 um.

優選的,該顯示器件的封裝方法,其中,所述壓板下表面與所述玻璃膏層之間的粘附力小於所述玻璃膏層與所述硬質基板之間的粘附力。 Preferably, the display device is packaged, wherein an adhesion between the lower surface of the platen and the glass paste layer is less than an adhesion between the glass paste layer and the hard substrate.

一種顯示器件的封裝裝置,應用於具有器件區域的硬質襯底上,且環繞該器件區域外圍的硬質襯底的上表面設置有一閉合的玻璃膏層,其中,所述封裝裝置包括一壓板,該壓板通過一聯動裝置設置於所述玻璃膏層的正上方,所述聯動裝置控制所述壓板對所述玻璃膏層的上表面進行平坦化工藝;採用所述壓板對所述玻璃膏層進行平坦化工藝時,所述玻璃膏層為半固化狀態。 A packaging device for a display device is applied to a hard substrate having a device region, and a closed glass paste layer is disposed on an upper surface of the hard substrate surrounding the periphery of the device region, wherein the packaging device includes a pressing plate, The pressure plate is disposed directly above the glass paste layer by a linkage device, the linkage device controls the pressure plate to planarize an upper surface of the glass paste layer; and the glass paste layer is flattened by using the pressure plate In the chemical process, the glass paste layer is in a semi-cured state.

優選的,該顯示器件的封裝裝置,其中,所述玻璃膏層與所述硬質基板之間的粘附力大於所述壓板下表面與所述玻璃膏層之間的粘附力。 Preferably, the packaging device of the display device, wherein the adhesion between the glass paste layer and the hard substrate is greater than the adhesion between the lower surface of the pressure plate and the glass paste layer.

優選的,該顯示器件的封裝裝置,其中,所述壓板與所述玻璃膏層接觸的表面設置有襯墊,所述襯墊的高度小於所述玻璃膏層的厚度。 Preferably, the display device of the display device, wherein a surface of the platen contacting the glass paste layer is provided with a liner having a height smaller than a thickness of the glass paste layer.

優選的,該顯示器件的封裝裝置,其中,所述襯墊高度為5um~30um。 Preferably, the display device of the display device, wherein the pad height is 5 um to 30 um.

由於本發明採用了以上技術方案,在進行顯示器件封裝時,通過對玻璃膏上表面進行平坦化處理,進而提高產品在後續封裝方法中的質量,避免了因外界的水和氧滲入器件內部造成的產品缺陷,提高產品的良率。 Since the present invention adopts the above technical solution, when the display device is packaged, the surface of the glass paste is planarized, thereby improving the quality of the product in the subsequent packaging method, thereby avoiding the infiltration of water and oxygen into the device. Product defects, improve product yield.

1‧‧‧硬質基板 1‧‧‧hard substrate

2‧‧‧器件區域 2‧‧‧Device area

3‧‧‧玻璃膏層 3‧‧‧ glass paste layer

3A‧‧‧半固化的玻璃膏層 3A‧‧‧Semi-cured glass paste layer

3B‧‧‧進行過平坦化後的玻璃膏層 3B‧‧‧A layer of glass paste after flattening

3C‧‧‧固化玻璃膏層 3C‧‧‧cured glass paste layer

4‧‧‧蓋板 4‧‧‧ Cover

5‧‧‧壓板 5‧‧‧Press

6‧‧‧襯墊 6‧‧‧ cushion

第一圖為傳統OLED封裝工藝的結構示意圖; 第二圖至第六圖為本發明實施例一中對玻璃膏層進行平坦化工藝的流程圖;第七圖為本發明實施例一中採用另一種壓板對玻璃膏層進行平坦化工藝的結構示意圖;第八圖為本發明實施例二中顯示器件的封裝裝置的結構示意圖。 The first figure is a schematic structural diagram of a conventional OLED packaging process; 2 to 6 are flowcharts showing a planarization process of a glass paste layer according to Embodiment 1 of the present invention; and FIG. 7 is a structure for planarizing a glass paste layer by using another press plate in Embodiment 1 of the present invention; FIG. 8 is a schematic structural view of a packaging device of a display device according to Embodiment 2 of the present invention.

下面結合附圖對本發明的具體實施方式作進一步的說明:實施例一:參照第二圖至第六圖所示,本申請一種顯示器件的封裝方法,具體包括以下步驟:首先,提供一基板1(如玻璃基板或其他類型的基板等),且該硬質基板1的上表面設置有器件區域2,該器件區域2中可設置有TFT晶體管等器件(但不局限於TFT晶體管),並於器件區域2外圍的硬質基板1的上表面上塗布一圈玻璃膏以形成玻璃膏層3A,即形成如第二圖所示的結構;其中,該玻璃膏層3A環繞器件區域2形成一閉合區域(器件區域2位於該閉合區域中),以對上述的器件區域2進行封裝方法,且該玻璃膏層3A的高度大於一預設高度,該設定厚度可根據不同的工藝需求而設定,可以為2-40um,在本實施例中,優選的該玻璃膏層3的高度大於30um且小於32um(如30.5um、30.75um、31um或31.5um等值),同時該玻璃膏層3的寬度也要小於一預設寬度,該設定的寬度也可根據工藝需求而設定,以預留相應的空間給後續對該玻璃膏層3進行平坦化工藝,可以為200-1200um。 The following describes the specific embodiment of the present invention with reference to the accompanying drawings: Embodiment 1: Referring to FIG. 2 to FIG. 6 , the packaging method of the display device of the present application specifically includes the following steps: First, a substrate 1 is provided. (such as a glass substrate or other type of substrate, etc.), and the upper surface of the hard substrate 1 is provided with a device region 2, in which a device such as a TFT transistor (but not limited to a TFT transistor) may be disposed in the device region 2 A ring of glass paste is coated on the upper surface of the hard substrate 1 on the periphery of the region 2 to form a glass paste layer 3A, that is, a structure as shown in the second figure is formed; wherein the glass paste layer 3A forms a closed region around the device region 2 ( The device region 2 is located in the closed region to encapsulate the device region 2, and the height of the glass paste layer 3A is greater than a predetermined height. The set thickness can be set according to different process requirements, and can be 2 -40um, in this embodiment, the height of the glass paste layer 3 is preferably greater than 30um and less than 32um (such as 30.5um, 30.75um, 31um or 31.5um equivalent), and the width of the glass paste layer 3 is also In a predetermined width, the width of the set may be set according to process requirements, to reserve space for a respective glass paste layer 3 for the subsequent planarization process may be 200-1200um.

另外,由於在硬質基板1上塗布玻璃膏制備玻璃膏層3A時,由於工藝技術限制無法保證塗布玻璃膏的上表面的平整度,使得形成的玻璃膏層3A的上表面具有凹凸不平的結構(具有粗糙結構的表面),在後續的烘烤工藝中若不對具有粗糙表面的玻璃膏層3A進行處理,經過烘烤工藝固化後的玻璃膏層的表面也是粗糙的,即進行固化工藝後形成的玻璃膏層的上表面的平整度差,進而會影響器件的密封效果,使得外部的水、氧等易滲入器件區域2中,進而降低器件性能及產品良率。 In addition, since the glass paste layer 3A is prepared by coating a glass paste on the hard substrate 1, the flatness of the upper surface of the coated glass paste cannot be ensured due to the limitation of the process technology, so that the upper surface of the formed glass paste layer 3A has an uneven structure ( Surface having a rough structure), if the glass paste layer 3A having a rough surface is not treated in the subsequent baking process, the surface of the glass paste layer cured by the baking process is also rough, that is, formed after the curing process The flatness of the upper surface of the glass paste layer is poor, which in turn affects the sealing effect of the device, so that external water, oxygen, and the like easily penetrate into the device region 2, thereby reducing device performance and product yield.

其次,繼續對塗布有玻璃膏層3A的硬質基板1進行第一次加熱工藝,在本實施例中,將第一次加熱工藝的溫度控制在90℃至120℃之間(如採用90℃,100℃,110℃或120℃等值的溫度進行該第一次加熱工藝),以對玻璃膏層3A內的溶劑(如有機溶劑等)進行蒸發,由於上述第一次加熱工藝的溫度並沒有達到玻璃膏層3A完全固化的溫度(玻璃膏的固化溫度要大於120℃),故蒸發玻璃膏層3A內的溶劑速率較緩慢;當該玻璃膏層3A中的溶劑一部分被蒸發掉時,玻璃膏層的流動性就會降低,進而形成半固化的玻璃膏層3A,即此時的半固化的玻璃膏層3A仍具有一定的可塑性;同時由於該步驟只是採取加熱工藝以蒸發玻璃膏內的溶劑,並不會對玻璃膏層的形貌產生影響,使得經過第一次加熱工藝後形成的結構圖形與第二圖所示的結構圖形相同;所以,半固化的玻璃膏層3A的上表面仍具有一定的粗糙度。 Next, the first heating process of the hard substrate 1 coated with the glass paste layer 3A is continued. In this embodiment, the temperature of the first heating process is controlled between 90 ° C and 120 ° C (eg, 90 ° C, The first heating process is performed at a temperature of 100 ° C, 110 ° C or 120 ° C, to evaporate the solvent (such as an organic solvent, etc.) in the glass paste layer 3A, since the temperature of the first heating process is not The temperature at which the glass paste layer 3A is completely cured (the curing temperature of the glass paste is greater than 120 ° C), so the rate of solvent evaporation in the glass paste layer 3A is slow; when a part of the solvent in the glass paste layer 3A is evaporated, the glass The fluidity of the paste layer is lowered, thereby forming a semi-cured glass paste layer 3A, that is, the semi-cured glass paste layer 3A at this time still has a certain plasticity; and since this step is only a heating process to evaporate the glass paste The solvent does not affect the morphology of the glass paste layer, so that the structural pattern formed after the first heating process is the same as the structural pattern shown in the second figure; therefore, the upper surface of the semi-cured glass paste layer 3A Still with Certain roughness.

之後,如第三、四圖所示,採用一壓板5對半固化的玻璃膏層3A的上表面進行平坦化處理;具體的,該壓板5上設置有聯動裝置(圖中未標出),該聯動裝置控制壓板5來對半固化的玻璃膏層3A的上表面進行平坦化工藝。優選的,該聯動裝置(如機械手等設備)固定設置在壓板5的上表面,以帶動該壓板5位於玻璃膏層3A的正上方進行上下運動,且該壓板5的下表面設置有襯墊6,由於該襯墊6的高度與上述的玻璃膏層3A的預設高度相同,所以當聯動裝置帶動壓板5對半固化的玻璃膏層3A的上表面進行平坦化處理時,因為半固化的玻璃膏層3A的厚度大於襯墊6的高度,相應的當壓板5向下運動時,半固化的玻璃膏層3A的上表面與壓板5的下表面接觸後,襯墊6才能與硬質基板1接觸,在壓板5對半固化的玻璃膏層3A進行平坦化工藝時,襯墊6能夠預防壓板5過度擠壓該半固化的玻璃膏層3A,以使得進行過平坦化後的玻璃膏層3B的厚度符合工藝需求。 Thereafter, as shown in the third and fourth figures, the upper surface of the semi-cured glass paste layer 3A is planarized by a pressing plate 5; specifically, the pressing plate 5 is provided with a linkage device (not shown). The linkage controls the platen 5 to planarize the upper surface of the semi-cured glass paste layer 3A. Preferably, the linkage device (such as a robot) is fixedly disposed on the upper surface of the pressure plate 5 to drive the pressure plate 5 to move up and down directly above the glass paste layer 3A, and the lower surface of the pressure plate 5 is provided with a gasket. 6. Since the height of the spacer 6 is the same as the preset height of the above-mentioned glass paste layer 3A, when the interlocking device drives the pressing plate 5 to planarize the upper surface of the semi-cured glass paste layer 3A, since it is semi-cured The thickness of the glass paste layer 3A is greater than the height of the liner 6, and when the upper surface of the semi-cured glass paste layer 3A is in contact with the lower surface of the pressure plate 5, the liner 6 can be combined with the hard substrate 1 when the pressure plate 5 is moved downward. Contact, when the platen 5 planarizes the semi-cured glass paste layer 3A, the liner 6 can prevent the platen 5 from over-extruding the semi-cured glass paste layer 3A, so that the planarized glass paste layer 3B is The thickness meets the process requirements.

進一步的,由於壓板5的下表面比較平整(壓板5與玻璃膏層3A接觸的表面的平整度要小於一預設的值,該預設的值可根據具體的工藝需求而設定);在本發明的實施例中,優選的採用如具有光滑表面的大理石或其他與玻璃膏層粘附性較小的硬質材料作為壓板5的材質。在進行平坦化工藝時,由於半固化的玻璃膏層3A具有一定的可塑性,當壓板5擠壓該半固化的玻璃膏層3A的上表面時,就會將半固化的玻璃膏層3A上表面上的凹凸不平的粗糙結構壓平整,進而降低半固化的玻璃膏層3A上表面的 粗糙度。 Further, since the lower surface of the pressing plate 5 is relatively flat (the flatness of the surface of the pressing plate 5 contacting the glass paste layer 3A is less than a preset value, the preset value may be set according to specific process requirements); In the embodiment of the invention, it is preferable to use, for example, marble having a smooth surface or other hard material having less adhesion to the glass paste layer as the material of the press plate 5. When the planarization process is performed, since the semi-cured glass paste layer 3A has a certain plasticity, when the platen 5 presses the upper surface of the semi-cured glass paste layer 3A, the upper surface of the semi-cured glass paste layer 3A is formed. The uneven rough structure on the upper surface is flattened, thereby lowering the upper surface of the semi-cured glass paste layer 3A Roughness.

另外,如第四圖所示,當壓板5擠壓半固化的玻璃膏層3A的上表面進行平坦化工藝時,在降低半固化的玻璃膏層3A的厚度的同時,會擠壓該半固化的玻璃膏層3A向橫向方向延展,而由於前期在塗覆玻璃膏時預留了一定的延展空間,使得經過平坦化工藝後的半固化的玻璃膏層3B的厚度和寬度均符合工藝的需求。 Further, as shown in the fourth figure, when the platen 5 presses the upper surface of the semi-cured glass paste layer 3A to perform a planarization process, the semi-cured portion is pressed while the thickness of the semi-cured glass paste layer 3A is lowered. The glass paste layer 3A is extended in the lateral direction, and the thickness and width of the semi-cured glass paste layer 3B after the planarization process are in accordance with the process requirements due to the reserved space for coating the glass paste in the early stage. .

優選的,該襯墊6高度為5um~30um(如5um,10um,20um,30um等在數值範圍內的高度),在本發明的實施例中,襯墊6可為一閉合的凸起(參見第三圖所示結構),當壓板5與玻璃膏層3接觸時,襯墊6環繞玻璃膏層3A的外圍,同時該襯墊6也可為兩閉合凸起構成的凹槽結構(參見第七圖所示的結構),該凹槽結構可根據工藝需求設置(即該凹槽結構的深度與預設高度相同,寬度與預設寬度相同),同樣該襯墊6也可設置為其他形狀的支撐結構(如多個柱狀結構等),只要該襯墊6能保證經行過平坦化工藝後的玻璃膏層的厚度為工藝需求設定的厚度即可。 Preferably, the pad 6 has a height of 5 um to 30 um (e.g., 5 um, 10 um, 20 um, 30 um, etc., in a range of values), and in the embodiment of the invention, the pad 6 may be a closed bulge (see The structure shown in the third figure), when the platen 5 is in contact with the glass paste layer 3, the gasket 6 surrounds the periphery of the glass paste layer 3A, and the gasket 6 can also be a groove structure composed of two closed protrusions (see the The structure shown in Figure 7 can be set according to the process requirements (that is, the depth of the groove structure is the same as the preset height, and the width is the same as the preset width), and the pad 6 can also be set to other shapes. The support structure (such as a plurality of columnar structures, etc.), as long as the liner 6 can ensure that the thickness of the glass paste layer after the planarization process is set to a thickness required by the process.

進一步的,在進行完上述的平坦化工藝後,聯動裝置帶動壓板5遠離進行過平坦化後的玻璃膏層3B,由於壓板5下表面與該平坦化後的玻璃膏層3B的上表面之間的粘附力小於硬質基板1上表面與平坦化後的玻璃膏層3B下表面之間的粘附力,故壓板5在向上運動時,平坦化後的玻璃膏層3B不會粘附在壓板5的下表面,避免將平坦化後的玻璃膏層3B剝離硬質基板1的上表面。 Further, after the planarization process is performed, the linkage device drives the pressure plate 5 away from the planarized glass paste layer 3B, between the lower surface of the pressure plate 5 and the upper surface of the planarized glass paste layer 3B. The adhesion is less than the adhesion between the upper surface of the hard substrate 1 and the lower surface of the planarized glass paste layer 3B, so that the flattened glass paste layer 3B does not adhere to the platen when the platen 5 is moved upward. The lower surface of 5 prevents the flattened glass paste layer 3B from being peeled off from the upper surface of the hard substrate 1.

在本實施例中,可通過控制襯墊6的高度來控制玻璃膏層高度,以滿足不同的工藝生產需求。 In this embodiment, the height of the glass paste layer can be controlled by controlling the height of the liner 6 to meet different process production requirements.

然後,採用溫度高於上述第一次加熱工藝時的溫度,進行第二次加熱工藝(較佳的第二次加熱工藝的溫度值要高於上述第一次加熱工藝的溫度值40℃),完全去除平坦化後的玻璃膏層3B內的溶劑,以使得玻璃膏層3B完全固化,進而得到具有平整上表面的固化玻璃膏層3C,且該固化玻璃膏層3C的各位置處厚度均相等,其厚度和寬度也均滿足工藝需求。在本實施例中,將反應室內的溫度控制在110℃至150℃(如110℃,130℃,140℃,150℃等溫度值),進行第二次加熱工藝,以加速平坦化後的玻璃膏層3B內剩餘溶劑的蒸發速度,使得平坦化後的玻璃膏層3B快速固化,得到一具有平整上表面且各位置處厚度相等的固化玻璃膏層3C,該步驟完成 後形成如第六圖所示結構。如第六圖所示,上述第二次加熱工藝完成後,玻璃膏已完全固化,且制備的固化玻璃膏層3C的上表面相對玻璃膏層3A上表面其粗糙結構已經被平坦化,進而能保證在進行後續的封裝方法中玻璃膏層與蓋板之間的密封性,以提升封裝器件的性能。 Then, using a temperature higher than the temperature of the first heating process, the second heating process is performed (the temperature of the second heating process is preferably higher than the temperature of the first heating process by 40 ° C). The solvent in the planarized glass paste layer 3B is completely removed, so that the glass paste layer 3B is completely cured, thereby obtaining a cured glass paste layer 3C having a flat upper surface, and the thickness of the cured glass paste layer 3C is equal at each position. Its thickness and width also meet the process requirements. In this embodiment, the temperature in the reaction chamber is controlled at 110 ° C to 150 ° C (such as 110 ° C, 130 ° C, 140 ° C, 150 ° C, etc.), and a second heating process is performed to accelerate the flattened glass. The evaporation rate of the remaining solvent in the paste layer 3B is such that the planarized glass paste layer 3B is rapidly solidified to obtain a cured glass paste layer 3C having a flat upper surface and equal thickness at each position, and the step is completed. The structure as shown in the sixth figure is formed later. As shown in the sixth figure, after the second heating process is completed, the glass paste is completely cured, and the upper surface of the prepared cured glass paste layer 3C has been flattened relative to the upper surface of the glass paste layer 3A, thereby enabling The sealing between the glass paste layer and the cover plate in the subsequent packaging method is ensured to improve the performance of the packaged device.

在本發明的實施例中,優選的,第一次加熱工藝和第二次加熱工藝為烘烤工藝。 In an embodiment of the invention, preferably, the first heating process and the second heating process are baking processes.

最後,進行後續的鐳射封裝方法,以完成該器件的封合制程,後續的工藝步驟為本領域常規技術手段,在此不予贅述。 Finally, a subsequent laser encapsulation method is performed to complete the sealing process of the device, and the subsequent process steps are conventional technical means in the art, and are not described herein.

實施例二:第八圖為實施例二中顯示器件的封裝裝置的結構示意圖;如第八圖所示,一種顯示器件的封裝裝置,該封裝置在可應用於具有器件區域2的硬質基板1上進行封裝方法,且該硬質基板1的上表面環繞該器件區域2外圍設置有一閉合的玻璃膏層3A;上述的封裝裝置包括一壓板5,該壓板5通過一聯動裝置設置於玻璃膏層3A的正上方,聯動裝置控制壓板對玻璃膏層的上表面進行平坦化工藝;在採用壓板對玻璃膏層進行平坦化工藝時,玻璃膏層為半固化狀態。 Embodiment 2: FIG. 8 is a schematic structural view of a packaging device of a display device in Embodiment 2; as shown in FIG. 8 , a packaging device for a display device, which is applicable to a rigid substrate 1 having a device region 2 The encapsulation method is performed, and the upper surface of the hard substrate 1 is disposed around the periphery of the device region 2 with a closed glass paste layer 3A; the packaging device includes a pressing plate 5, and the pressing plate 5 is disposed on the glass paste layer 3A through a linkage device. Directly above, the linkage controls the platen to planarize the upper surface of the glass paste layer; when the platen is planarized by the platen, the glass paste layer is semi-cured.

其中,該壓板5的下表面設置有襯墊6,優選的,該襯墊6高度為5um~30um(如5um,10um,20um,30um等在數值範圍內的高度);該壓板5下表面的平整度根據工藝需求設定,在本實施例中,優選採用一具有光滑下表面的壓板來進行平坦化工藝,優選的採用如具有光滑表面的大理石或其他與玻璃膏層粘附性較小的硬質材料作為壓板5的材質;故壓板5在向上運動時,玻璃膏層不會粘附在壓板5的下表面,避免將平坦化後的玻璃膏層剝離硬質基板1的上表面,從而保證封裝方法的正常進行。 Wherein, the lower surface of the pressure plate 5 is provided with a gasket 6 . Preferably, the gasket 6 has a height of 5 um to 30 um (such as a height within a numerical range of 5 um, 10 um, 20 um, 30 um, etc.); the lower surface of the pressure plate 5 The flatness is set according to the process requirements. In the present embodiment, a flattening process is preferably employed by using a press plate having a smooth lower surface, preferably using a marble having a smooth surface or other hard adhered to the glass paste layer. The material is used as the material of the pressure plate 5; therefore, when the pressure plate 5 moves upward, the glass paste layer does not adhere to the lower surface of the pressure plate 5, and the flattened glass paste layer is prevented from being peeled off the upper surface of the hard substrate 1, thereby ensuring the packaging method. The normal progress.

綜上所述,由於本發明採用了以上技術方案,在進行玻璃膏封裝時,先採用低溫烘烤蒸發去除玻璃膏內的部分溶劑,使玻璃膏呈半固化從而具有一定的可塑性,然後採用一具有光滑下表面的壓板對玻璃膏進行平坦化工藝,使玻璃膏的上表面趨於平整,最後使用高溫烘烤蒸發玻璃膏內剩餘的溶劑使其完全固化並進行後續的鐳射封裝及封合制程。本發明通過低溫烘烤後再對玻璃膏進行平坦化工藝,最後進行高溫烘烤三個工藝步驟,保證了玻璃膏上表面的平整度,同時使玻璃膏滿足生產工藝需求,使器件在進行後續的封裝方法時具備良好的密封性,避免了外部的水分和 氧進入器件內部,提高了器件性能和產品良率。 In summary, since the present invention adopts the above technical solution, in the glass paste package, a part of the solvent in the glass paste is first removed by low-temperature baking evaporation, so that the glass paste is semi-cured to have a certain plasticity, and then a The platen with a smooth lower surface planarizes the glass paste, so that the upper surface of the glass paste tends to be flat. Finally, the remaining solvent in the glass paste is evaporated at a high temperature to completely cure the film and perform subsequent laser encapsulation and sealing processes. . The invention planarizes the glass paste by baking at a low temperature, and finally performs three high-temperature baking process steps to ensure the flatness of the upper surface of the glass paste, and at the same time makes the glass paste meet the production process requirements, so that the device is followed. The sealing method has good sealing and avoids external moisture and Oxygen enters the interior of the device, improving device performance and product yield.

通過說明和附圖,給出了具體實施方式的特定結構的典型實施例,基於本發明精神,還可作其他的轉換。盡管上述發明提出了現有的較佳實施例,然而,這些內容並不作為局限。 Exemplary embodiments of the specific structure of the specific embodiments are given by way of illustration and the accompanying drawings, and other transitions are possible in accordance with the spirit of the invention. Although the above invention proposes a prior preferred embodiment, these are not intended to be limiting.

對於本領域的技術人員而言,閱讀上述說明後,各種變化和修正無疑將顯而易見。因此,所附的權利要求書應看作是涵蓋本發明的真實意圖和範圍的全部變化和修正。在權利要求書範圍內任何和所有等價的範圍與內容,都應認為仍屬本發明的意圖和範圍內。 Various changes and modifications will no doubt become apparent to those skilled in the <RTIgt; Accordingly, the appended claims are to cover all such modifications and modifications The scope and content of any and all equivalents are intended to be within the scope and spirit of the invention.

1‧‧‧硬質基板 1‧‧‧hard substrate

2‧‧‧器件區 2‧‧‧Device area

5‧‧‧壓板 5‧‧‧Press

6‧‧‧襯墊 6‧‧‧ cushion

3B‧‧‧平坦化後的玻璃膏層3B‧‧‧flattened glass paste layer

Claims (10)

一種顯示器件的封裝方法,應用於一具有器件區域的基板上,其特徵在於,包括以下步驟:於所述基板的一表面塗覆玻璃膏層,所述玻璃膏層具有一第一高度及第一寬度,並環繞所述器件區域形成一閉合的玻璃膏層;對所述玻璃膏層進行第一次加熱;採用一壓板對所述玻璃膏層的上表面進行平坦化處理,其中所述壓板與所述玻璃膏層接觸的表面上設置有襯墊,藉此使經平坦化處理後的玻璃膏層具有一第二高度和第二寬度,其中所述第二高度小於所述第一高度且等於所述襯墊高度,所述第二寬度大於所述第一寬度;以及對所述玻璃膏層進行第二次加熱,並固化所述玻璃膏層。 A method for packaging a display device, applied to a substrate having a device region, comprising the steps of: coating a surface of the substrate with a glass paste layer, the glass paste layer having a first height and a a width, and forming a closed glass paste layer around the device region; first heating the glass paste layer; planarizing the upper surface of the glass paste layer with a press plate, wherein the press plate a surface is disposed on the surface in contact with the glass paste layer, whereby the planarized glass paste layer has a second height and a second width, wherein the second height is less than the first height and Equal to the pad height, the second width being greater than the first width; and heating the glass paste layer a second time and curing the glass paste layer. 如申請專利範圍第1項所述的顯示器件的封裝方法,其中,採用第一次加熱步驟之溫度範圍為80℃~120℃。 The method of packaging a display device according to claim 1, wherein the temperature of the first heating step is in the range of 80 ° C to 120 ° C. 如申請專利範圍第2項所述的顯示器件的封裝方法,其中,採用第二次加熱步驟之溫度高於所述第一次加熱步驟之溫度。 The method of packaging a display device according to claim 2, wherein the temperature of the second heating step is higher than the temperature of the first heating step. 如申請專利範圍第3項所述的顯示器件的封裝方法,其中,所述第二次加熱步驟之溫度範圍為100℃~150℃。 The method of packaging a display device according to claim 3, wherein the temperature of the second heating step ranges from 100 ° C to 150 ° C. 如申請專利範圍第1項所述的顯示器件的封裝方法,其中,所述壓板上設置有一聯動裝置,所述聯動裝置控制所述壓板對所述玻璃膏層的上表面進行平坦化處理。 The method of packaging a display device according to claim 1, wherein the platen is provided with a linkage device, and the linkage device controls the platen to planarize an upper surface of the glass paste layer. 如申請專利範圍第1項所述的顯示器件的封裝方法,其中,所述襯墊的高度為5um~30um。 The method of packaging a display device according to claim 1, wherein the spacer has a height of 5 um to 30 um. 如申請專利範圍第1項所述的顯示器件的封裝方法,其中,所述壓板與所述玻璃膏層之間的粘附力小於所述玻璃膏層與所述硬質基板之間的粘附力。 The method of packaging a display device according to claim 1, wherein the adhesion between the platen and the glass paste layer is less than the adhesion between the glass paste layer and the hard substrate. . 一種顯示器件的封裝裝置,應用於具有器件區域的硬質襯底上,且環繞該器件區域外圍的硬質襯底的上表面設置有一閉合的玻璃膏層,所述玻璃膏層具有一第一高度及第一寬度,其特徵在於,所述封裝裝置包括一壓板,該壓板通過一聯動裝置設置於所述玻璃膏層的正上方,所述聯動裝置控制所述壓板對所述玻璃膏層的上表面進行平坦化工藝;其中,採用所述壓板對所述玻璃膏層進行平坦化工藝時,所述玻璃膏層為半固化狀態,所述壓板與所述玻璃膏層接觸的表面上設置有襯墊,藉此使經平坦化處理 後的玻璃膏層具有一第二高度和第二寬度,其中所述第二高度小於所述第一高度且等於所述襯墊高度,所述第二寬度大於所述第一寬度。 A packaging device for a display device is applied to a hard substrate having a device region, and a closed glass paste layer is disposed on an upper surface of the hard substrate surrounding the periphery of the device region, the glass paste layer having a first height and a first width, wherein the packaging device comprises a pressing plate disposed directly above the glass paste layer by a linkage device, the linkage device controlling the pressing plate to an upper surface of the glass paste layer Performing a planarization process; wherein, when the glass paste layer is planarized by the press plate, the glass paste layer is in a semi-cured state, and the surface of the pressure plate that is in contact with the glass paste layer is provided with a liner Thereby flattening The subsequent glass paste layer has a second height and a second width, wherein the second height is less than the first height and equal to the pad height, and the second width is greater than the first width. 如申請專利範圍第8項所述的顯示器件的封裝裝置,其中,所述玻璃膏層與所述硬質基板之間的粘附力大於所述壓板與所述玻璃膏層之間的粘附力。 The packaging device of the display device of claim 8, wherein the adhesion between the glass paste layer and the hard substrate is greater than the adhesion between the pressure plate and the glass paste layer. . 如申請專利範圍第8項所述的顯示器件的封裝裝置,其中,所述襯墊高度為5um~30um。 The packaging device of the display device according to claim 8, wherein the pad height is 5 um to 30 um.
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