JP2000196400A - Mounting structure for surface acoustic wave device - Google Patents

Mounting structure for surface acoustic wave device

Info

Publication number
JP2000196400A
JP2000196400A JP10372766A JP37276698A JP2000196400A JP 2000196400 A JP2000196400 A JP 2000196400A JP 10372766 A JP10372766 A JP 10372766A JP 37276698 A JP37276698 A JP 37276698A JP 2000196400 A JP2000196400 A JP 2000196400A
Authority
JP
Japan
Prior art keywords
acoustic wave
surface acoustic
electrode
electrodes
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10372766A
Other languages
Japanese (ja)
Inventor
Yoshifumi Yamagata
佳史 山形
Masayuki Funemi
雅之 船見
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP10372766A priority Critical patent/JP2000196400A/en
Publication of JP2000196400A publication Critical patent/JP2000196400A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To obtain the mounting structure of a surface acoustic wave device by which micro-chip surface acoustic wave filter is obtained without impairing attenuating characteristic by forming a ground electrode for enclosing exciting electrodes at the lower surface side or the outer peripheral part of a piezoelectric substrate and mounting them on a circuit substrate in the mounting structure of the surface acoustic wave device consisting of the piezoelectric substrate where the exciting electrodes are formed. SOLUTION: Plural interdigital resonator electrodes being the exciting electrode are connected to a ladder circuit on the substrate 2, the connecting electrode, an input/output electrode 3a and the ground electrode 3b are formed and, besides, a semi-conductive or insulated protecting film 4 such as silicone or silicon oxide is formed on it so that the chip surface acoustic wave filter is constituted. In the filter 1 constituted in this way, the ground electrode 3b enclosing the resonator electrodes is formed at the lower surface side or the outer peripheral part of the piezoelectric substrate 2 and mounted on the circuit board 6. The distance (h) between the surface of the circuit board 6 and that of the resonator electrodes is set to be larger than the wave length of the surface acoustic wave.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、例えば携帯電話等
の移動体通信機器に用いられる弾性表面波装置の回路基
板への実装構造に関し、特に、究極的に小型化した弾性
表面波装置の実装構造に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mounting structure of a surface acoustic wave device used for a mobile communication device such as a cellular phone on a circuit board, and more particularly to the mounting of an ultimately miniaturized surface acoustic wave device. Regarding the structure.

【0002】[0002]

【従来技術とその課題】現在、移動体通信機器に用いら
れる弾性表面波フィルタは、激化する携帯電話端末の小
型化のために、極限までに低実装面積、低重量、且つ低
背であることが望まれている。
2. Description of the Related Art Currently, surface acoustic wave filters used in mobile communication devices have extremely low mounting area, low weight, and low height in order to reduce the size of portable telephone terminals. Is desired.

【0003】図7(a)〜(c)に示すように、従来の
弾性表面波フィルタ101は、主として励振電極が形成
された圧電性の単結晶から成る基板102と、それを封
止実装するセラミックパッケージ108から成る。
As shown in FIGS. 7A to 7C, in a conventional surface acoustic wave filter 101, a substrate 102 mainly made of a piezoelectric single crystal on which excitation electrodes are formed, and the substrate 102 are sealed and mounted. It consists of a ceramic package 108.

【0004】基板102には、アルミニウムやアルミニ
ウム−銅合金等から成る櫛歯状の弾性表面波共振子電極
(励振電極)103、入出力電極113a,113bと
グランド電極(図示せず)、及びそれらの接続電極が同
一面に形成されている。
A substrate 102 has a comb-shaped surface acoustic wave resonator electrode (excitation electrode) 103 made of aluminum, an aluminum-copper alloy, or the like, input / output electrodes 113a and 113b, and a ground electrode (not shown). Are formed on the same surface.

【0005】励振電極103には、その上面に保護膜1
04が形成されており、ごみなどの付着や腐食を防止し
ている。基板102は、樹脂110によりセラミックパ
ッケージ108の底部に固定され、基板102上の入出
力電極103aとグランド電極(図示せず)が、セラミ
ックパッケージ108の入出力端子電極113a,11
3bへ、それぞれワイヤー114を用いて導通接続され
ている。
The excitation electrode 103 has a protective film 1 on its upper surface.
04 is formed to prevent adhesion and corrosion of dust and the like. The substrate 102 is fixed to the bottom of the ceramic package 108 by a resin 110, and the input / output electrodes 103a and the ground electrode (not shown) on the substrate 102 are connected to the input / output terminal electrodes 113a and 113 of the ceramic package 108.
3b are electrically connected to each other using wires 114.

【0006】ワイヤー114を接続する部分には、接続
の安定性確保のため保護膜は形成していない。基板10
2は弾性体であるので自由振動を確保する空間105が
必要である。このため、上部にリッド109が設けら
れ、外部から水分が入ることによる振動ダンピングを防
止するように、セラミックパッケージ108と樹脂11
0により気密封止されている。
[0006] A protective film is not formed at a portion where the wire 114 is connected to ensure the stability of the connection. Substrate 10
Since 2 is an elastic body, a space 105 for securing free vibration is required. For this reason, a lid 109 is provided on an upper portion, and a ceramic package 108 and a resin 11 are provided so as to prevent vibration damping due to external moisture.
0 is hermetically sealed.

【0007】このような弾性表面波フィルタにおいて
は、基板102とセラミックパッケージ108との電気
的接続をワイヤー114により行っており、この分の高
さが高く小型化の妨げとなっていた。また、セラミック
パッケージ108は基板102に比べ非常に大きく、1
辺当たり約1.5〜2.1mmも大型化し、底面積にい
たっては約3倍にもなっていた。
[0007] In such a surface acoustic wave filter, the electrical connection between the substrate 102 and the ceramic package 108 is made by the wire 114, and the height of the wire is high, which hinders miniaturization. Further, the ceramic package 108 is much larger than the substrate 102,
The size was increased by about 1.5 to 2.1 mm per side, and the bottom area was about three times as large.

【0008】さらに、図7(a)のセラミックパッケー
ジ108内部のグランド端子電極113bが、幅の狭い
端面グランド電極を介して、図7(c)のセラミックパ
ッケージ108の裏面に接続されているためインダクタ
成分が発生しており、図8に円部で示すように通過帯域
(ハッチング部分)の低周波側、及び4〜6GHzにお
ける減衰特性が劣化していた。
Further, since the ground terminal electrode 113b inside the ceramic package 108 shown in FIG. 7A is connected to the back surface of the ceramic package 108 shown in FIG. As shown by a circle in FIG. 8, components were generated, and the attenuation characteristics at the low frequency side of the pass band (hatched portion) and at 4 to 6 GHz were deteriorated.

【0009】図9(a)〜(c)に示す弾性表面波フィ
ルタは、基板102上の入出力電極103aとグランド
電極(図示せず)とを、金属製のバンプ111を介して
セラミックパッケージ108上の端子電極113a、1
13bへ接続し、バンプ111と端子電極113a、1
13bとの接続強度の低さを補うため導電性の樹脂11
2により補強を行っている。また、導電性樹脂112は
バンプ111の平坦度の悪さを吸収する役目も担ってい
る。以上の構造により、ワイヤーのループ高さの分だけ
低背化を図ることができている。
In the surface acoustic wave filter shown in FIGS. 9A to 9C, an input / output electrode 103a on a substrate 102 and a ground electrode (not shown) are connected to a ceramic package 108 via a metal bump 111. Upper terminal electrodes 113a, 1
13b, the bump 111 and the terminal electrodes 113a, 1
13b to compensate for the low strength of connection with 13b.
2 for reinforcement. In addition, the conductive resin 112 also plays a role of absorbing poor flatness of the bump 111. With the structure described above, the height can be reduced by the height of the loop of the wire.

【0010】しかしながら、セラミックパッケージ10
8の底面積が小型になることにより裏面の入出力端子電
極113aの間隔gが狭くなり、この電極間に容量が発
生している。このため、図10に円部で示すように通過
帯域(ハッチング部分)の高周波側、及び3GHz近傍
の減衰特性が劣化していた。また、依然としてセラミッ
クパッケージ108がフィルタ形状の大部分を占めてお
り、小型,軽量,低背化の妨げとなっていた。
However, the ceramic package 10
As the bottom area of 8 is reduced, the distance g between the input / output terminal electrodes 113a on the back surface is reduced, and a capacitance is generated between the electrodes. For this reason, as shown by the circles in FIG. 10, the attenuation characteristics on the high frequency side of the pass band (hatched portion) and near 3 GHz were deteriorated. Further, the ceramic package 108 still occupies most of the filter shape, which hinders reduction in size, weight, and height.

【0011】そこで本発明は、減衰特性を損なわず、超
小型のチップ弾性表面波フィルタとすることが可能な弾
性表面波装置の実装構造を提供することを目的とする。
SUMMARY OF THE INVENTION It is an object of the present invention to provide a mounting structure of a surface acoustic wave device which can be used as a very small chip surface acoustic wave filter without deteriorating attenuation characteristics.

【0012】[0012]

【課題を解決するための手段】上記課題を解決するため
に、本発明の弾性表面波装置は、励振電極を形成した圧
電基板から成る弾性表面波装置の実装構造であって、圧
電基板の下面側もしくは外周部に、励振電極を取り囲む
接地用電極を形成して回路基板上に実装することを特徴
とする。
In order to solve the above problems, a surface acoustic wave device according to the present invention is a mounting structure of a surface acoustic wave device comprising a piezoelectric substrate on which excitation electrodes are formed. A ground electrode surrounding the excitation electrode is formed on the side or the outer peripheral portion and mounted on a circuit board.

【0013】なおここで、接地用電極は圧電基板及び/
又は回路基板上に形成されていればよい。
Here, the ground electrode is a piezoelectric substrate and / or
Alternatively, it may be formed on a circuit board.

【0014】また、回路基板の表面と前記励振電極の表
面との間が、弾性表面波の波長以上の距離に設定されて
いることを特徴とする。
Further, the distance between the surface of the circuit board and the surface of the excitation electrode is set to be equal to or longer than the wavelength of the surface acoustic wave.

【0015】[0015]

【発明の実施の形態】以下に、本発明に係る実施形態に
ついて図面に基づいて詳細に説明する。
Embodiments of the present invention will be described below in detail with reference to the drawings.

【0016】図1に本発明の弾性表面波装置の実装構造
を示す断面図を、図2にその弾性表面波装置の電極平面
図を示す。
FIG. 1 is a sectional view showing a mounting structure of a surface acoustic wave device according to the present invention, and FIG. 2 is a plan view of electrodes of the surface acoustic wave device.

【0017】図1及び図2に示すように、弾性表面波装
置である弾性表面波フィルタ1は、例えばタンタル酸リ
チウム単結晶、ランガサイト型結晶構造を有する例えば
ランタン−ガリウム−ニオブ系単結晶、四ホウ酸リチウ
ム単結晶等の圧電性の単結晶から成る基板2上に、励振
電極である櫛歯状の共振子電極3cの複数が例えばラダ
ー型回路に接続されており、その接続電極3d、及び入
出力電極3aと接地用電極3bを形成し、さらにその上
にシリコンや酸化シリコン等の半導電性もしくは絶縁性
の保護膜4を形成して成るチップ弾性表面波フィルタを
構成している。
As shown in FIGS. 1 and 2, a surface acoustic wave filter 1 which is a surface acoustic wave device includes, for example, a lithium tantalate single crystal, a lanthanum-gallium-niobium single crystal having a langasite-type crystal structure, for example. A plurality of comb-shaped resonator electrodes 3c, which are excitation electrodes, are connected to, for example, a ladder-type circuit on a substrate 2 made of a piezoelectric single crystal such as lithium tetraborate single crystal. A chip surface acoustic wave filter is formed by forming an input / output electrode 3a and a grounding electrode 3b, and further forming a semiconductive or insulating protective film 4 such as silicon or silicon oxide thereon.

【0018】上記のようにして構成した弾性表面波フィ
ルタ1は、圧電基板2の下面側もしくは外周部に、共振
子電極3cを取り囲む接地用電極3bを形成して回路基
板6上に実装する。そして、回路基板6の表面と共振子
電極3cの表面との間hが、弾性表面波の波長以上の距
離に設定されている。なお、図1において8は導電性樹
脂等から成る導電性の接着材であり、9は回路基板6上
に形成した金属等から成る接続パッドである。
The surface acoustic wave filter 1 constructed as described above is mounted on the circuit board 6 by forming a grounding electrode 3b surrounding the resonator electrode 3c on the lower surface side or the outer peripheral portion of the piezoelectric substrate 2. The distance h between the surface of the circuit board 6 and the surface of the resonator electrode 3c is set to a distance equal to or longer than the wavelength of the surface acoustic wave. In FIG. 1, reference numeral 8 denotes a conductive adhesive made of a conductive resin or the like, and reference numeral 9 denotes a connection pad made of a metal or the like formed on the circuit board 6.

【0019】ここで、入出力電極3aと接地用電極3b
は同一プロセスにて形成されているので、これらの電極
は平坦度に優れている。また、半導電性または絶縁性か
ら成る保護膜4よりも入出力電極と接地用電極が突出し
ているので、自由振動のための空間5を保つことがで
き、このまま回路基板6へフェースダウンで実装するこ
とが可能である。また、接地用電極3bが基板2の全周
囲に形成されているので気密性も確保される。
Here, the input / output electrode 3a and the ground electrode 3b
Are formed in the same process, these electrodes have excellent flatness. Further, since the input / output electrodes and the grounding electrode protrude beyond the protective film 4 made of semi-conductive or insulating material, the space 5 for free vibration can be maintained and mounted face-down on the circuit board 6 as it is. It is possible to Further, since the grounding electrode 3b is formed all around the substrate 2, airtightness is also ensured.

【0020】なお、本発明ではラダー型フィルタについ
て説明したが、共振器型や伝搬型のフィルタやフィルタ
以外のデュプレクサ等の弾性表面波装置についても、励
振電極を有するものであれば、本発明を適用できること
はいうまでもない。
Although the ladder type filter has been described in the present invention, the present invention is also applicable to a surface acoustic wave device such as a resonator type or propagation type filter or a duplexer other than a filter as long as it has an excitation electrode. It goes without saying that it can be applied.

【0021】[0021]

【実施例】次に、本発明に係るチップ弾性表面波フィル
タを作製した実施例について説明する。
Next, an embodiment in which a chip surface acoustic wave filter according to the present invention is manufactured will be described.

【0022】図4にチップ弾性表面波フィルタの製造プ
ロセスを示す。なお、製造にはステッパー(縮小投影露
光機)及びRIE(Reactive Ion Etching)装置を用い
フォトリソグラフィーを行った。
FIG. 4 shows a manufacturing process of the chip surface acoustic wave filter. In the production, photolithography was performed using a stepper (reduction projection exposure machine) and an RIE (Reactive Ion Etching) apparatus.

【0023】(1)基板2(タンタル酸リチウム単結晶
の42°Yカット)をアセトン・IPA等を使用して超
音波洗浄を施し、有機成分の除去を行った。次に、クリ
ーンオーブンによって充分に基板乾燥を行った後、電極
3の成膜を行った。電極3の成膜にはスパッタリング装
置を使用し、Al−Cu(2重量%)合金から成る電極
3を成膜した。この電極膜厚は約2000Åとした(図
4(a)を参照)。
(1) Substrate 2 (42 ° Y-cut of lithium tantalate single crystal) was subjected to ultrasonic cleaning using acetone, IPA or the like to remove organic components. Next, after sufficiently drying the substrate with a clean oven, the electrode 3 was formed. The electrode 3 was formed using an Al-Cu (2% by weight) alloy film using a sputtering apparatus. The thickness of the electrode was about 2000 ° (see FIG. 4A).

【0024】(2)レジスト7を約0.5μmの厚みに
スピンコートした(図4(b)を参照)。
(2) The resist 7 was spin-coated to a thickness of about 0.5 μm (see FIG. 4B).

【0025】(3)ステッパーにより所望形状にパター
ンニングを行い、現像装置にて不要部分のレジスト7を
アルカリ現像液で溶解させ、所望レジストパターンを形
成した(図4(c)を参照)。
(3) Patterning was performed to a desired shape by a stepper, and an unnecessary portion of the resist 7 was dissolved with an alkali developing solution by a developing device to form a desired resist pattern (see FIG. 4C).

【0026】(4)RIE装置によりAl−Cu電極3
のエッチングを行った(図4(d)を参照)。
(4) Al-Cu electrode 3 by RIE device
Was etched (see FIG. 4D).

【0027】(5)レジスト7を剥離しパターンニング
を終了した(図4(e)を参照)。
(5) The resist 7 was peeled off, and the patterning was completed (see FIG. 4E).

【0028】(6)SiO2 から成る保護膜4をスパッ
タリング装置にて250Åの厚みに成膜した(図4
(f)を参照)。
(6) A protective film 4 made of SiO 2 was formed to a thickness of 250 ° by a sputtering apparatus (FIG. 4).
(F)).

【0029】(7)レジスト7を約3μm全面に再度塗
布した(図4(g)を参照)。
(7) A resist 7 was applied again on the entire surface of about 3 μm (see FIG. 4G).

【0030】(8)入出力電極3aと接地用電極3bを
形成する基板2のレジスト7を感光させ削除した(図4
(h)を参照)。
(8) The resist 7 on the substrate 2 on which the input / output electrodes 3a and the grounding electrodes 3b are formed is exposed to light and removed (FIG. 4).
(See (h)).

【0031】(9)入出力電極3aと接地用電極3bを
形成する基板2のSiO2 保護膜4をCDEにより除去
した(図4(i)を参照)。
(9) The SiO 2 protective film 4 of the substrate 2 on which the input / output electrode 3a and the ground electrode 3b are formed is removed by CDE (see FIG. 4 (i)).

【0032】(10)Al電極を保護膜4よりも厚くな
るよう2μm蒸着にて成膜した(図4(j)を参照)。
(10) An Al electrode was formed by vapor deposition with a thickness of 2 μm so as to be thicker than the protective film 4 (see FIG. 4 (j)).

【0033】(11)レジスト7とともに電極レジスト
上の電極3をリフトオフにより除去した。(図4(k)
を参照)。
(11) The electrode 3 on the electrode resist together with the resist 7 was removed by lift-off. (FIG. 4 (k)
See).

【0034】(12)ウエハをダイシングラインに沿っ
てダイシングし、チップごとに分割して完成させた。チ
ップサイズは1.6×1.0mmとした。
(12) The wafer was diced along a dicing line, and the wafer was divided into chips and completed. The chip size was 1.6 × 1.0 mm.

【0035】次に実装について説明する。Next, the mounting will be described.

【0036】(13)完成したチップ弾性表面波フィル
タ1を、ガラスエポキシから成る回路基板6にフェース
ダウン実装した(図1を参照)。この実装には、接地用
電極3bの外周及び入出力電極部に、銀フィラーを90
〜93重量%、又は81〜86重量%含有させた、反応
性ポリエステル系樹脂又はエポキシ系樹脂をスクリーン
印刷法にて塗布し、一旦、80℃,1時間程度の仮硬化
を行い、次いで、120〜225℃,10〜60分で硬
化させて実装を行った。
(13) The completed chip surface acoustic wave filter 1 was mounted face down on a circuit board 6 made of glass epoxy (see FIG. 1). For this mounting, a silver filler is applied to the outer periphery of the ground electrode 3b and the input / output electrode portion.
A reactive polyester resin or an epoxy resin containing 9393% by weight or 81-86% by weight is applied by a screen printing method, temporarily cured at 80 ° C. for about 1 hour, and then cured at 120 ° C. Mounting was performed by curing at ℃ 225 ° C. for 10 to 60 minutes.

【0037】上記弾性表面波フィルタの実装構造によれ
ば、基板2の周囲を接地用電極3bで取り囲こむように
しており、気密性も同時に確保できた。入出力電極3a
と接地用電極3bは同一プロセスにて形成されているた
め、平坦度に優れており導通信頼性を極めて高くするこ
とができる。また、空間5の高さは2μmに確保されて
いる。この高さは弾性表面波フィルタの中心周波数にお
ける波長とほぼ同等であり、これ以上の空間高さがあれ
ば弾性表面波の振動を妨げることがない。
According to the mounting structure of the surface acoustic wave filter, the periphery of the substrate 2 is surrounded by the grounding electrode 3b, and airtightness can be secured at the same time. Input / output electrode 3a
And the grounding electrode 3b are formed in the same process, so that they have excellent flatness and extremely high conduction reliability. Further, the height of the space 5 is ensured at 2 μm. This height is substantially equal to the wavelength at the center frequency of the surface acoustic wave filter, and if the height is larger than this, the vibration of the surface acoustic wave will not be hindered.

【0038】このようにして得られたチップ弾性表面波
フィルタの電気特性を図3に示す。図8と図10の円部
にて示したような減衰特性の劣化が無く、良好な減衰特
性を得ることができた。また、通過帯域(ハッチング部
分)よりも高周波側では20dB以上の減衰量を得るこ
とができ、しかも通過帯域近傍の減衰特性の劣化もなか
った。
FIG. 3 shows the electrical characteristics of the chip surface acoustic wave filter thus obtained. As shown by the circles in FIGS. 8 and 10, there was no deterioration in the attenuation characteristics, and good attenuation characteristics could be obtained. Further, on the high frequency side of the pass band (hatched portion), an attenuation of 20 dB or more could be obtained, and the attenuation characteristics near the pass band did not deteriorate.

【0039】従来の実施例と比較して良好な減衰特性が
得られたのは、セラミックパッケージを不要とすること
で、これにより生じる不要なインダクタンスが発生しな
いこと、及びセラミックパッケージがないために、幅が
広い入出力端子電極が不要で、回路基板との導通接続す
るだけの入出力電極で済むため、入出力間電極の対向距
離が広く、発生容量が小さくなること等が考えられる。
The reason why good damping characteristics were obtained as compared with the conventional example is that the ceramic package is not required, and unnecessary inductance caused by the ceramic package is not generated. Since a wide input / output terminal electrode is not required and only an input / output electrode for conducting connection to the circuit board is required, a facing distance between the input / output electrodes may be wide and a generated capacity may be small.

【0040】なお、本発明のチップ弾性表面波フィルタ
においては、図2にdの表示で示すように入出力3aと
接地用電極3bの対向容量による特性劣化が懸念される
が、これについては問題がないことを確認した。この部
分の容量により変化するのは主としてVSWR(定在波
比)であり、VSWRに変化がなければ減衰特性につい
ては全く問題はないことが判明した。図5は入出力その
対向間隔dとそこに生じる容量Cの関係をしめすグラフ
である。対向間隔dが20μm以下になると急激に発生
する容量が大きくなることを示している。dが20μm
における容量は約0.14pFであるので、この場合の
VSWRの変化は、図6に示すようにたかだか0.08
であることがわかった。したがって、対向間隔dは20
μm以上あれば特性を劣化させることがないことを確認
できた。
In the chip surface acoustic wave filter of the present invention, as shown by d in FIG. 2, there is a concern that the characteristics may be deteriorated due to the opposing capacitance between the input / output 3a and the ground electrode 3b. Confirmed that there is no. It is mainly found that the VSWR (standing wave ratio) changes according to the capacitance of this portion, and there is no problem in the attenuation characteristic at all if the VSWR does not change. FIG. 5 is a graph showing the relationship between the input / output opposing distance d and the capacitance C generated there. This shows that when the facing distance d is 20 μm or less, the capacitance that occurs suddenly increases. d is 20 μm
Is about 0.14 pF, the change in VSWR in this case is at most 0.08 pF as shown in FIG.
It turned out to be. Therefore, the facing distance d is 20
It was confirmed that the characteristics were not deteriorated if the thickness was more than μm.

【0041】なおまた、本実施例では回路基板をガラス
エポキシ基板としたが、ガラスセラミックスやアルミナ
などのセラミックス基板でもかまわない。また、電極を
Al−Cu合金から成る電極やAl電極としたが、Ni
やTi等他の材料を使用してもよいことはもちろんであ
る。また、保護膜を酸化シリコンとしたが、シリコンや
窒化シリコン等の他の半導電性や絶縁性の材料を用いて
もよい。
In this embodiment, the circuit board is a glass epoxy board. However, a ceramic board such as glass ceramic or alumina may be used. Although the electrodes were made of an Al--Cu alloy or Al electrodes, Ni
Needless to say, other materials such as Ti and Ti may be used. Although the protective film is made of silicon oxide, another semiconductive or insulating material such as silicon or silicon nitride may be used.

【0042】[0042]

【発明の効果】本発明の弾性表面波装置の実装構造によ
れば、例えば超小型のチップ弾性表面波フィルタを実現
できる。また、高周波の減衰量を確保することができ
る。これにより、従来のように励振電極を形成した圧電
基板を収容するパッケージが不要となり、大幅な小型・
軽量・低コスト化を図ることができる。
According to the mounting structure of the surface acoustic wave device of the present invention, for example, a very small chip surface acoustic wave filter can be realized. In addition, high-frequency attenuation can be secured. This eliminates the need for a package for accommodating a piezoelectric substrate on which excitation electrodes are formed, as in the conventional case.
Light weight and low cost can be achieved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係るチップ弾性表面波フィルタの実装
構造を模式的に示す断面図である。
FIG. 1 is a sectional view schematically showing a mounting structure of a chip surface acoustic wave filter according to the present invention.

【図2】本発明に係るチップ弾性表面波フィルタの電極
構造を模式的に示す平面図である。
FIG. 2 is a plan view schematically showing an electrode structure of the chip surface acoustic wave filter according to the present invention.

【図3】(a)〜(c)は、それぞれ本発明のチップ弾
性表面波フィルタの電気特性を説明する線図である。
FIGS. 3A to 3C are diagrams illustrating electrical characteristics of a chip surface acoustic wave filter according to the present invention.

【図4】(a)〜(k)は、それぞれ本発明のチップ弾
性表面波フィルタの製造工程を説明する断面図である。
FIGS. 4A to 4K are cross-sectional views illustrating steps of manufacturing a surface acoustic wave filter according to the present invention.

【図5】本発明のチップ弾性表面波フィルタの対向間隔
と容量との関係を示す線図である。
FIG. 5 is a diagram showing a relationship between a facing distance and a capacitance of the chip surface acoustic wave filter of the present invention.

【図6】本発明のチップ弾性表面波フィルタの対向容量
とVSWRとの関係を示す線図である。
FIG. 6 is a diagram showing a relationship between a counter capacitance and a VSWR of the chip surface acoustic wave filter of the present invention.

【図7】従来の弾性表面波フィルタを説明する図であ
り、(a)は封止していない状態の上視図、(b)は下
視図、(c)は(a)のA−A線概略断面図である。
7A and 7B are views for explaining a conventional surface acoustic wave filter, wherein FIG. 7A is a top view in an unsealed state, FIG. 7B is a bottom view, and FIG. 7C is A- of FIG. FIG. 3 is a schematic sectional view taken along line A.

【図8】(a)〜(c)は、ぞれぞれ従来の弾性表面波
フィルタの電気特性を説明する線図である。
FIGS. 8A to 8C are diagrams illustrating electrical characteristics of a conventional surface acoustic wave filter.

【図9】従来の他の弾性表面波フィルタを説明する図で
あり、(a)は封止していない状態の上視図、(b)は
下視図、(c)は(a)のB−B線概略断面図である。
9A and 9B are diagrams illustrating another conventional surface acoustic wave filter, wherein FIG. 9A is a top view in an unsealed state, FIG. 9B is a bottom view, and FIG. 9C is a view of FIG. FIG. 3 is a schematic sectional view taken along line BB.

【図10】(a)〜(c)は、ぞれぞれ従来の弾性表面
波フィルタの電気特性を説明する線図である。
FIGS. 10A to 10C are diagrams illustrating electrical characteristics of a conventional surface acoustic wave filter.

【符号の説明】[Explanation of symbols]

1:チップ弾性表面波フィルタ(弾性表面波装置) 2、102:基板 3、103:励振電極 3a:入出力電極 3b:接地用電極 3c:共振子電極(励振電極) 3d:接続電極 4、104:保護膜 5、105:空間 6:回路基板 7:レジスト 8:接着材 9:接続パッド 101:従来の弾性表面波フィルタ 103a:入出力電極 108:セラミックパッケージ 109:リッド 110:樹脂 111:バンプ 112:導電性樹脂 113:端子電極 113a:入出力端子電極 113b:グランド端子電極 114:ワイヤー 1: chip surface acoustic wave filter (surface acoustic wave device) 2, 102: substrate 3, 103: excitation electrode 3a: input / output electrode 3b: ground electrode 3c: resonator electrode (excitation electrode) 3d: connection electrode 4, 104 : Protective film 5, 105: space 6: circuit board 7: resist 8: adhesive 9: connection pad 101: conventional surface acoustic wave filter 103a: input / output electrode 108: ceramic package 109: lid 110: resin 111: bump 112 : Conductive resin 113: terminal electrode 113 a: input / output terminal electrode 113 b: ground terminal electrode 114: wire

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 励振電極を形成した圧電基板から成る弾
性表面波装置の実装構造であって、圧電基板の下面側も
しくは外周部に、前記励振電極を取り囲む接地用電極を
形成して回路基板上に実装することを特徴とする弾性表
面波装置の実装構造。
1. A mounting structure of a surface acoustic wave device comprising a piezoelectric substrate on which an excitation electrode is formed, wherein a grounding electrode surrounding the excitation electrode is formed on a lower surface side or an outer peripheral portion of the piezoelectric substrate. A mounting structure of a surface acoustic wave device characterized by being mounted on a surface acoustic wave device.
【請求項2】 前記回路基板の表面と前記励振電極の表
面との間が、弾性表面波の波長以上の距離に設定されて
いることを特徴とする請求項1に記載の弾性表面波装置
の実装構造。
2. The surface acoustic wave device according to claim 1, wherein a distance between a surface of the circuit board and a surface of the excitation electrode is set to be equal to or longer than a wavelength of a surface acoustic wave. Mounting structure.
JP10372766A 1998-12-28 1998-12-28 Mounting structure for surface acoustic wave device Pending JP2000196400A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10372766A JP2000196400A (en) 1998-12-28 1998-12-28 Mounting structure for surface acoustic wave device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10372766A JP2000196400A (en) 1998-12-28 1998-12-28 Mounting structure for surface acoustic wave device

Publications (1)

Publication Number Publication Date
JP2000196400A true JP2000196400A (en) 2000-07-14

Family

ID=18501016

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10372766A Pending JP2000196400A (en) 1998-12-28 1998-12-28 Mounting structure for surface acoustic wave device

Country Status (1)

Country Link
JP (1) JP2000196400A (en)

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JP2004194290A (en) * 2002-11-26 2004-07-08 Murata Mfg Co Ltd Method for manufacturing electronic component
US6943649B2 (en) * 2002-08-29 2005-09-13 Murata Manufacturing Co., Ltd. Surface acoustic wave filter with a ground pattern partially surrounding a signal pad and communication device using same
WO2006001125A1 (en) * 2004-06-25 2006-01-05 Murata Manufacturing Co., Ltd. Piezoelectric device
JP2006014296A (en) * 2004-05-27 2006-01-12 Kyocera Corp Surface acoustic wave device and communication device
JP2006042007A (en) * 2004-07-28 2006-02-09 Kyocera Corp Surface acoustic wave element and communication device
JP2006066978A (en) * 2004-08-24 2006-03-09 Kyocera Corp Surface acoustic wave device and communication device
JP2006101550A (en) * 2005-12-05 2006-04-13 Fujitsu Media Device Kk Surface acoustic wave device, communication apparatus using the same, and antenna duplexer
US7145417B2 (en) 2002-03-29 2006-12-05 Fujitsu Limited Filter chip and filter device
CN100338873C (en) * 2002-10-30 2007-09-19 京瓷株式会社 Elastic surface wave element, elastic surface wave device using same and electronic instrument
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US7345400B2 (en) 2003-01-27 2008-03-18 Murata Manufacturing Co., Ltd. Surface acoustic wave device

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7145417B2 (en) 2002-03-29 2006-12-05 Fujitsu Limited Filter chip and filter device
US6943649B2 (en) * 2002-08-29 2005-09-13 Murata Manufacturing Co., Ltd. Surface acoustic wave filter with a ground pattern partially surrounding a signal pad and communication device using same
CN100338873C (en) * 2002-10-30 2007-09-19 京瓷株式会社 Elastic surface wave element, elastic surface wave device using same and electronic instrument
JP2004194290A (en) * 2002-11-26 2004-07-08 Murata Mfg Co Ltd Method for manufacturing electronic component
US7345400B2 (en) 2003-01-27 2008-03-18 Murata Manufacturing Co., Ltd. Surface acoustic wave device
JP4634861B2 (en) * 2004-05-27 2011-02-16 京セラ株式会社 Surface acoustic wave device and communication device
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US7436272B2 (en) 2004-06-25 2008-10-14 Murata Manufacturing Co., Ltd. Piezoelectric device
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US7332986B2 (en) 2004-06-28 2008-02-19 Kyocera Corporation Surface acoustic wave apparatus and communications equipment
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