EP2496419B1 - Inkjet printhead assembly having backside electrical connection - Google Patents
Inkjet printhead assembly having backside electrical connection Download PDFInfo
- Publication number
- EP2496419B1 EP2496419B1 EP09847677.3A EP09847677A EP2496419B1 EP 2496419 B1 EP2496419 B1 EP 2496419B1 EP 09847677 A EP09847677 A EP 09847677A EP 2496419 B1 EP2496419 B1 EP 2496419B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- silicon
- printhead
- connector
- printhead assembly
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 229910052710 silicon Inorganic materials 0.000 claims description 61
- 239000010703 silicon Substances 0.000 claims description 61
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 23
- 239000000758 substrate Substances 0.000 claims description 19
- 239000004020 conductor Substances 0.000 claims description 16
- 230000000712 assembly Effects 0.000 claims description 15
- 238000000429 assembly Methods 0.000 claims description 15
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 12
- 229910052802 copper Inorganic materials 0.000 claims description 12
- 239000010949 copper Substances 0.000 claims description 12
- 238000009792 diffusion process Methods 0.000 claims description 8
- 230000004888 barrier function Effects 0.000 claims description 6
- 238000004891 communication Methods 0.000 claims description 4
- 239000012530 fluid Substances 0.000 claims description 4
- 229910000679 solder Inorganic materials 0.000 claims description 3
- 229920005570 flexible polymer Polymers 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 23
- 238000004519 manufacturing process Methods 0.000 description 19
- 239000000463 material Substances 0.000 description 13
- 238000000034 method Methods 0.000 description 12
- 238000000465 moulding Methods 0.000 description 12
- 238000000151 deposition Methods 0.000 description 10
- 230000008021 deposition Effects 0.000 description 10
- 238000005530 etching Methods 0.000 description 10
- 229920002120 photoresistant polymer Polymers 0.000 description 10
- XBBRGUHRZBZMPP-UHFFFAOYSA-N 1,2,3-trichloro-4-(2,4,6-trichlorophenyl)benzene Chemical compound ClC1=CC(Cl)=CC(Cl)=C1C1=CC=C(Cl)C(Cl)=C1Cl XBBRGUHRZBZMPP-UHFFFAOYSA-N 0.000 description 9
- 239000000377 silicon dioxide Substances 0.000 description 8
- 229910052681 coesite Inorganic materials 0.000 description 7
- 229910052906 cristobalite Inorganic materials 0.000 description 7
- 229910052814 silicon oxide Inorganic materials 0.000 description 7
- 229910052682 stishovite Inorganic materials 0.000 description 7
- 229910052905 tridymite Inorganic materials 0.000 description 7
- 239000002313 adhesive film Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 239000004205 dimethyl polysiloxane Substances 0.000 description 6
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 6
- 238000012423 maintenance Methods 0.000 description 6
- CXQXSVUQTKDNFP-UHFFFAOYSA-N octamethyltrisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 description 6
- 238000004987 plasma desorption mass spectroscopy Methods 0.000 description 6
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- 229910052719 titanium Inorganic materials 0.000 description 5
- 229910017083 AlN Inorganic materials 0.000 description 4
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 4
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 4
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 239000011295 pitch Substances 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000000565 sealant Substances 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- PTXMVOUNAHFTFC-UHFFFAOYSA-N alumane;vanadium Chemical compound [AlH3].[V] PTXMVOUNAHFTFC-UHFFFAOYSA-N 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 238000005334 plasma enhanced chemical vapour deposition Methods 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 230000002939 deleterious effect Effects 0.000 description 1
- 238000009429 electrical wiring Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 230000002706 hydrostatic effect Effects 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000004513 sizing Methods 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14427—Structure of ink jet print heads with thermal bend detached actuators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/145—Arrangement thereof
- B41J2/155—Arrangement thereof for line printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1632—Manufacturing processes machining
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1635—Manufacturing processes dividing the wafer into individual chips
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1637—Manufacturing processes molding
- B41J2/1639—Manufacturing processes molding sacrificial molding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1642—Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1648—Production of print heads with thermal bend detached actuators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/17—Ink jet characterised by ink handling
- B41J2/175—Ink supply systems ; Circuit parts therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2002/14491—Electrical connection
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
- B41J2202/18—Electrical connection established using vias
Description
- The present invention relates to printers and in particular inkjet printers. It is has been developed primarily for providing improved mounting of printhead integrated circuits so as to facilitate printhead maintenance.
- The Applicant has previously demonstrated that pagewidth inkjet printheads may be constructed using a plurality of printhead integrated circuits ('chips'), which are abutted end-on-end along the width of a page. Although this arrangement of printhead integrated circuits has many advantages (e.g. minimizing the width of a print zone in the paper feed direction), each printhead integrated circuit must still be connected to other printer electronics, which supply power and data to each printhead integrated circuit.
- Hitherto, the Applicant has described how a printhead integrated circuit may be connected to an external power/data supply by wirebonding bond pads on each printhead integrated circuit to a flex PCB (see, for example,
US 7,441,865 ). However, wirebonds protrude from the ink ejection face of the printhead and can, therefore, have a deleterious effect on both print maintenance and print quality. - It would be desirable to provide a printhead assembly in which printhead integrated circuits are connected to an external power/data supply without these connections affecting print maintenance and/or print quality.
-
US 6,394,580 describes a printhead assemblies having printhead integrated circuits bonded to a laminated ink supply manifold. Each printhead integrated circuit has frontside wirebonds which connect with electrical wiring extending through the laminated ink supply manifold. - Accordingly, there is provided a printhead integrated circuit and an inkjet printhead assembly as defined in the claims hereinbelow.
- Inkjet printhead assemblies according to the present invention advantageously provide a convenient means for attaching printhead integrated circuits to an ink supply manifold whilst accommodating electrical connections to the printhead. Furthermore, the frontside face of the printhead is fully planar along its entire extent.
- Embodiments of the present invention will now be described in detail with reference to following drawings in which:-
-
Figure 1 is a front perspective of a printhead integrated circuit; -
Figure 2 is a front perspective of a pair of butting printhead integrated circuits; -
Figure 3 is a rear perspective of the printhead integrated circuit shown inFigure 1 ; -
Figure 4 is a cutaway perspective of an inkjet nozzle assembly having a floor nozzle inlet; -
Figure 5 is a cutaway perspective of an inkjet nozzle assembly having a sidewall nozzle inlet; -
Figure 6 is a side perspective of a printhead assembly; -
Figure 7 is a lower perspective of the printhead assembly shown inFigure 6 ; -
Figure 8 is an exploded upper perspective of the printhead assembly shown inFigure 6 ; -
Figure 9 is an exploded lower perspective of the printhead assembly shown inFigure 6 ; -
Figure 10 is overlaid plan view of a printhead integrated circuit attached to an ink supply manifold; -
Figure 11 is a magnified view ofFigure 10 ; -
Figure 12 is a perspective of an inkjet printer; -
Figure 13 is a schematic cross-section of the printhead assembly shown inFigure 6 ; -
Figure 14 is a schematic cross-section of a printhead assembly according to the present invention; -
Figure 15 is a schematic cross-section of an alternative printhead assembly according to the present invention; -
Figures 16 to 24 are schematic cross-sections of a wafer after a various stages of fabricating a printhead integrated circuit according to the present invention; and -
Figure 25 is a schematic cross-section of a printhead integrated circuit according to the present invention. - Hitherto, the Applicant has described printhead integrated circuits (or 'chips') 100 which may be linked together in a butting end-on-end arrangement to define a pagewidth printhead.
Figure 1 shows a frontside face of part of aprinthead IC 100 in perspective, whilstFigure 2 shows a pair of printhead ICs butted together. - Each
printhead IC 100 comprises thousands ofnozzles 102 arranged in rows. As shown inFigures 1 and2 , theprinthead IC 100 is configured to receive and print five different colors of ink (e.g. CMYK and IR (infrared); CCMMY; or CMYKK). Eachcolor channel 104 of theprinthead IC 100 comprises a paired row of nozzles, one row of the pair printing even dots and the other row of the pair printing odd dots. Nozzles from eachcolor channel 104 are vertically aligned, in a paper feed direction, to perform dot-on-dot printing at high resolution (e.g. 1600 dpi). A horizontal distance ('pitch') between twoadjacent nozzles 102 on a single row is about 32 microns, whilst the vertical distance between rows of nozzles is based on the firing order of the nozzles; however, rows are typically separated by an exact number of dot lines (e.g. 10 dot lines). A more detailed description of nozzle row arrangements and nozzle firing can be found inUS Patent No. 7,438,371 . - The length of an
individual printhead IC 100 is typically about 20 to 22 mm. Thus, in order to print an A4/US letter sized page, eleven or twelveindividual printhead ICs 100 are contiguously linked together. The number ofindividual printhead ICs 100 may be varied to accommodate sheets of other widths. For example, a 4" photo printer typically employs five printhead ICs linked together. - The
printhead ICs 100 may be linked together in a variety of ways. One particular manner for linking theICs 100 is shown inFigure 2 . In this arrangement, theICs 100 are shaped at their ends so as to link together and form a horizontal line of ICs, with no vertical offset between neighboring ICs. A sloping join 106, having substantially a 45° angle, is provided between the printhead ICs. The joining edge has a sawtooth profile to facilitate positioning of butting printhead ICs. - As will be apparent from
Figures 1 and2 , the leftmostink delivery nozzles 102 of each row are dropped by 10 line pitches and arranged in atriangle configuration 107. This arrangement maintains the pitch of the nozzles across thejoin 106 to ensure that the drops of ink are delivered consistently along a print zone. This arrangement also ensures that more silicon is provided at the edge of eachprinthead IC 100 to ensure sufficient linkage between butting ICs. The nozzles contained in each dropped row must be fired at a different time to ensure that nozzles in a corresponding row fire onto the same line on a page. Whilst control of the operation of the nozzles is performed by a printhead controller ("SoPEC") device, compensation for the dropped rows of nozzles may be performed by CMOS circuitry in the printhead, or may be shared between the printhead and the SoPEC device. A full description of the dropped nozzle arrangement and control thereof is contained inUS Patent No. 7,275,805 . - Referring now to
Figure 3 , there is shown an opposite backside face of the printhead integratedcircuit 100.Ink supply channels 110 are defined in the backside of theprinthead IC 100, which extend longitudinally along the length of the printhead IC. These longitudinalink supply channels 110 meet withnozzle inlets 112, which fluidically communicate with thenozzles 102 in the frontside.Figure 4 shows part of a printhead IC where the nozzle inlet 112 feeds ink directly into a nozzle chamber.Figure 5 shows part of an alternative printhead IC where thenozzle inlets 112 feed ink intoink conduits 114 extending longitudinally alongside each row of nozzle chambers. In this alternative arrangement, the nozzle chambers receive ink via a sidewall entrance from its adjacent ink conduit ambit of the present invention. - Returning to
Figure 3 , the longitudinally extendingink supply channels 110 are divided into sections by silicon bridges orwalls 116. Thesewalls 116 provide theprinthead IC 100 with additional mechanical strength in a transverse direction relative to thelongitudinal channels 110. - Ink is supplied to the backside of each
printhead IC 100 via an ink supply manifold in the form a two-part LCP molding. Referring toFigures 6 to 9 , there is shown aprinthead assembly 130 comprisingprintheads ICs 100, which are attached to the ink supply manifold via anadhesive film 120. - The ink supply manifold comprises a
main LCP molding 122 and anLCP channel molding 124 sealed to its underside. Theprinthead ICs 100 are bonded to the underside of thechannel molding 124 with the adhesive IC attachfilm 120. The upperside of theLCP channel molding 124 comprises LCPmain channels 126, which connect withink inlets 127 andink outlets 128 in themain LCP molding 122. Theink inlets 127 andink outlets 128 fluidically communicate with ink reservoirs and an ink supply system (not shown), which supplies ink to the printhead at a predetermined hydrostatic pressure. - The
main LCP molding 122 has a plurality ofair cavities 129, which communicate with the LCPmain channels 126 defined in theLCP channel molding 124. Theair cavities 129 serve to dampen ink pressure pulses in the ink supply system. - At the base of each LCP
main channel 126 are a series ofink supply passages 132 leading to theprinthead ICs 100. Theadhesive film 120 has a series of laser-drilledsupply holes 134 so that the backside of eachprinthead IC 100 is in fluid communication with theink supply passages 132. - Referring now to
Figure 10 , theink supply passages 132 are arranged in a series of five rows. A middle row ofink supply passages 132 feed ink directly to the backside of theprinthead IC 100 through laser-drilledholes 134, whilst the outer rows ofink supply passages 132 feed ink to the printhead IC viamicromolded channels 135, each micromolded channel terminating at one of the laser-drilledholes 134. -
Figure 11 shows in more detail how ink is fed to the backsideink supply channels 110 of theprinthead ICs 100. Each laser-drilledhole 134, which is defined in theadhesive film 120, is aligned with a correspondingink supply channel 110. Generally, the laser-drilledhole 134 is aligned with one of thetransverse walls 116 in thechannel 110 so that ink is supplied to a channel section on either side of thewall 116. This arrangement reduces the number of fluidic connections required between the ink supply manifold and theprinthead ICs 100. - To aid in positioning of the
ICs 100 correctly,fiducials 103A are provided on the surface of the ICs 100 (seeFigures 1 and11 ). Thefiducials 103A are in the form of markers that are readily identifiable by appropriate positioning equipment to indicate the true position of theIC 100 with respect to a neighbouring IC. Theadhesive film 120 hascomplementary fiducials 103B, which aid alignment of eachprinthead IC 100 with respect to the adhesive film during bonding of the printhead ICs to the ink supply manifold. Thefiducials ICs 100 and along the length of the adhesive IC attachfilm 120. - Returning now to
Figure 1 , theprinthead IC 100 has a plurality ofbond pads 105 extending along one of its longitudinal edges. Thebond pads 105 provide a means for receiving data and/or power from the printhead controller ("SoPEC") device to control the operation of theinkjet nozzles 102. - The
bond pads 105 are connected to an upper CMOS layer of theprinthead IC 100. As shown inFigures 4 and5 , each MEMS nozzle assembly is formed on aCMOS layer 113, which contain the requisite logic and drive circuitry for firing each nozzle. - Referring to
Figures 6 to 9 , aflex PCB 140 is wirebonded to thebond pads 105 of theprinthead ICs 100. The wirebonds are sealed and protected with a wirebond sealant 142 (seeFigure 7 ), which is typically a polymeric resin. TheLCP molding 122 comprises acurved support wing 123 around which theflex PCB 140 is bent and secured. Thesupport wing 123 has a number ofopenings 125 for accommodating variouselectrical components 144 of the flex PCB. In this way, theflex PCB 140 can bend around an outside surface of theprinthead assembly 130. Apaper guide 148 is mounted to an opposite side of theLCP molding 122, with respect to theflex PCB 140, and completes theprinthead assembly 130. - The
printhead assembly 130 is designed as part of a user-replaceable printhead cartridge, which can be removed from and replaced in an inkjet printer 160 (seeFigure 12 ). Hence, theflex PCB 140 has a plurality ofcontacts 146 enabling power and data connections to electronics, including the SoPEC device, in the printer body. - Since the
flex PCB 140 is wirebonded tobond pads 105 on eachprinthead IC 100, the printhead inevitably has a non-planar longitudinal edge region in the vicinity of the bond pads. This is illustrated most clearly inFigure 13 , which shows awirebond 150 extending from abond pad 105 of aprinthead IC 100 comprising a plurality ofinkjet nozzle assemblies 101. In the configuration shown inFigure 13 , thebond pad 105 is formed in a MEMS layer and connects to theunderlying CMOS 113 via connector posts 152. Alternatively, thebond pad 105 may be an exposed upper layer of theCMOS 113 without any other connections to the MEMS layer. In either configuration, wirebonds extend from anink ejection face 154 of the printhead and connect with theflex PCB 140. - Wirebonding to the
bond pads 105 in theprinthead IC 100 has several disadvantages, principally due to the fact that a significant longitudinal region of the printhead IC has wirebonds 150 (and, moreover, the wirebond sealant 142) projecting from itsink ejection face 154. The non-planarity of theink ejection face 154 may result in less effective printhead maintenance. For example, a wiper blade is unable to sweep across the entire width of theink ejection face 154 because thewirebond sealant 142 blocks the path of the wiper blade, either upstream or downstream of thenozzles 102 with respect to a wiping direction. - Another disadvantage of wirebond projections is that the entire printhead cannot be coated with a hydrophobic coating, such as PDMS. The Applicant has found that PDMS coatings significantly improve both print quality and printhead maintenance (see, for example, US Publication No.
US 2008/0225076 ) and a fully planar ink ejection face would improve the efficacy of such coatings even further. - In view of some of the inherent disadvantages of wirebond connections to the
printhead IC 100, the Applicant has developed aprinthead IC 2, which uses backside electrical connections and therefore has a fully planar ink ejection face. - Referring to
Figure 14 , theprinthead IC 2 is mounted to theLCP channel molding 124 of the ink supply manifold using theadhesive film 120. Theprinthead IC 2 has at least one longitudinalink supply channel 110, which provides fluidic communication between the ink supply manifold and thenozzle assemblies 101 via thenozzle inlet 112 andink conduit 114. Hence, the printhead assembly 60 (which includes printhead IC 2), has the same fluidic arrangement as the printhead assembly 130 (which includes printhead IC 100) described above in connection withFigures 1 to 11 . - However, the
printhead IC 2 differs from theprinthead IC 100 by virtue of the electrical connections made to its CMOS circuitry layers 113. Significantly, theprinthead IC 2 lacks any frontside wirebonding along its longitudinal edge region 4. Rather, theprinthead IC 2 has abackside recess 6 at its longitudinal edge, which accommodates a TAB (tape-automated bonding)film 8. TheTAB film 8 is typically a flexible polymer film (e.g. Mylar® film) comprising a plurality of conductive tracks terminating at corresponding film contacts 10 at a connector end of the TAB film. TheTAB film 8 is positioned flush with abackside surface 12 of theprinthead IC 2 so that the TAB film and theprinthead IC 2 can be bonded together to theLCP channel molding 124. TheTAB film 8 may be connected to theflex PCB 140; indeed, the TAB film may be integrated with theflex PCB 140. Alternatively, theTAB film 8 may be connected to the printer electronics using alternative connection arrangements known to the person skilled in the art. - The
printhead IC 2 has a plurality of through-silicon vias extending from its frontside and into the longitudinal recessededge portion 6, which accommodates theTAB film 8. Each through-silicon via is filled with a conductor (e.g. copper) to define a through-silicon connector 14, which provides electrical connection to theTAB film 8. Each film contact 10 is connected to a foot orbase 15 of the through-silicon connector 14 using a suitable connection e.g.solder ball 16. - The through-
silicon connector 14 extends through asilicon substrate 20 of theprinthead IC 2 and through the CMOS circuitry layers 113. The through-silicon connector 14 is insulated from thesilicon substrate 20 by insulatingsidewalls 21. The insulatingsidewalls 21 may be formed from any suitable insulating material compatible with MEMS fabrication, such as amorphous silicon, polysilicon or silicon dioxide. The insulatingsidewalls 21 may be monolayered or multilayered. For example, the insulatingsidewalls 21 may comprise an outer Si or SiO2 layer and an inner tantalum layer. The inner Ta layer acts as diffusion barrier so as to minimize diffusion of copper into the bulk silicon substrate. The Ta layer may also act as seed layer for electrodeposition of copper during fabrication of the through-silicon connectors 14. - As shown in
Figure 14 , ahead 22 of the through-silicon connector 14 meets with acontact pad 24 defined in aMEMS layer 26 of theprinthead IC 2. TheMEMS layer 26 is disposed on the CMOS circuitry layers 113 of theprinthead IC 2 and comprises all theinkjet nozzle assemblies 101 formed by MEMS processing steps. - In the case of the Applicant's thermal bend-actuated printheads, such as those described in
US 2008/0129793 , a conductivethermoelastic actuator 25 may define a roof of eachnozzle chamber 101. Hence, thecontact pad 24 may be formed at the same time as thethermoelastic actuator 25 during MEMS fabrication and, moreover, be formed of the same material. For example, thecontact pad 24 may be formed from thermoelastic materials, such as vanadium-aluminium alloys, titanium nitride, titanium aluminium nitride etc. - However, it will appreciated that formation of the
contact pad 24 may be incorporated into any step of MEMS fabrication and, moreover, may be comprised of any suitably conductive material e.g. copper, titanium, aluminium, titanium nitride, titanium aluminium nitride etc. - The
contact pad 24 is connected to an upper layer of theCMOS circuitry 113 via copper conductor posts 30 extending from the contact pad towards the CMOS circuitry. Hence, the conductor posts 30 provide electrical connection is provided between theTAB film 8 and theCMOS circuitry 113. - Although the arrangement of
contact pad 24 andconnector posts 30 inFigure 14 is conveniently compatible with the Applicant's MEMS fabrication process for forming thermal bend-actuated inkjet nozzles (as described inUS Patent No. 8,029,097 ), the present invention, of course, encompasses alternative arrangements which provide similar backside electrical connections to theCMOS circuitry 113 from thebackside TAB film 8. - For example, and referring now to
Figure 15 , the through-silicon connectors 14 may terminate at apassivation layer 27 above theCMOS circuitry 113. An embeddedcontact pad 23 connects the through-silicon connector 14 with an upper CMOS layer by deposition of a suitably conductive material onto thehead 22 of the through-silicon connector and the upper CMOS layer exposed through thepassivation layer 27. Subsequent deposition ofphotoresist 31 and a roof layer 37 (e.g. silicon nitride, silicon oxide etc) during MEMS nozzle fabrication then provides a fully planar nozzle plate and ink ejection face for the printhead. Furthermore, the embeddedcontact pads 23 are fully sealed and encapsulated with thephotoresist 31 beneath theroof layer 37. This alternative contact pad arrangement would be compatible with, for example, the Applicant's MEMS fabrication processes for forming thermal bubble-forming inkjet nozzle assemblies, as described inUS Patent Nos. 6,755,509 and7,303,930 . The nozzle assembly shown inFigure 15 is a thermal bubble-forming inkjet nozzle assembly comprising a suspendedheater element 28 andnozzle opening 102, as described inUS 6,755,509 . It will be readily apparent to the person skilled in the art that the embeddedcontact pad 23 and the suspendedheater element 28 may be co-formed during MEMS fabrication by deposition of the heater element material and subsequent etching. Accordingly, the embeddedcontact pad 23 may be comprised of the same material as the heater element 36 e.g. titanium nitride, titanium aluminium nitride etc. - Returning now to
Figure 14 , it should be noted that the ink ejection face of theprinthead IC 2 is fully planar and coated with a layer ofhydrophobic PDMS 48. PDMS coatings and their advantages are described in detail inUS Publication No. 2008/0225082 . As already mentioned, the planarity of the ink ejection face, including those parts of the face at the longitudinal edge region 4 of the printhead integratedcircuit 2, provides significant advantages in terms of printhead maintenance and control of face flooding. - Although in
Figures 14 and15 , the contact pad is shown schematically adjacent to thenozzles 102, it will be appreciated that thecontacts pads 24 in theprinthead IC 2 typically occupy similar positions to thebond pads 105 of the printhead IC 100 (Figure 1 ), with a corresponding number of through-silicon connectors 14 extending into thesilicon substrate 20. Nevertheless, it is an advantage of the present invention that thecontact pads 24 need not be spatially distant from theinkjet nozzles 102 in the same way that is required forbond pads 105, which require sufficient surrounding space to allow wirebonding and wirebond encapsulation. Thus, backside TAB film connections enable more efficient use of silicon and potentially reduce the overall width of each IC or, alternatively, allow a greater number ofnozzles 102 to be formed across the same width of IC. For example, whereas about 60-70% of the IC width is dedicated toinkjet nozzles 102 in theprinthead IC 100, the present invention enables more than 80% of the IC width to be dedicated to inkjet nozzles. Given that silicon is one of the most expensive components in pagewidth inkjet printers, this is a significant advantage. - A MEMS fabrication process for the
printhead IC 2 shown inFigure 14 will now be described in detail. This MEMS fabrication process includes several modifications of the process described inUS Patent No. 8,029,097 so as to incorporate the features required for backside connection to theTAB film 8. Although the MEMS process is described in detail herein for illustrative purposes, it will be appreciated by the skilled person that similar modifications of any inkjet nozzle fabrication process would provide a printhead integrated circuit configured for backside electrical connection. Indeed, the Applicant has already alluded to a suitable MEMS fabrication process for fabricating the thermally-actuated printhead IC shown inFigure 15 . Hence, the present invention is not intended to be limited to theparticular nozzle assemblies 101 described hereinbelow. -
Figures 16 to 25 show a sequence of MEMS fabrication steps for forming theprinthead IC 2 described in connection withFigure 14 . The completedprinthead IC 2 comprises a plurality ofnozzle assemblies 101 as well as features enabling backside connections to theCMOS circuitry 113. - The starting point for MEMS fabrication is a standard CMOS wafer comprising the
silicon substrate 20 andCMOS circuitry 113 formed on a frontside surface of the wafer. At the end of the MEMS fabrication process, the wafer is diced into individual printhead integrated circuits (ICs) via etched dicing streets, which define the dimensions of each printhead IC fabricated from the wafer. - Although the present description refers to MEMS fabrication processes performed on the
CMOS layer 113, it will of course be understood that theCMOS layer 113 may comprise multiple CMOS layers (e.g. 3 or 4 CMOS layers) and is usually passivated. TheCMOS layer 113 may be passivated with, for example, a layer of silicon oxide or, more usually, a standard 'ONO' stack comprising a layer of silicon nitride sandwiched between two layers of silicon oxide. Hence, references herein to theCMOS layer 113 implicitly include a passivated CMOS layer, which typically comprises multiple layers of CMOS. - The following description focuses on fabrication steps for one
nozzle assembly 101 and one through-silicon connector 14. However, it will of course be appreciated that corresponding steps are being performed simultaneously for all nozzle assemblies and all through-silicon connectors. - In a first sequence of steps shown in
Figure 16 , afrontside inlet hole 32 is etched through theCMOS layer 113 and into thesilicon substrate 20 of the CMOS wafer. At the same time, a frontsidedicing street hole 33 is etched through theCMOS layer 113 and into the silicon substrate.Photoresist 31 is then spun onto the frontside of the wafer so as to plug thefrontside inlet hole 32 and frontsidedicing street hole 33. The wafer is then polished by chemical mechanical planarization (CMP) to provide the wafer shown inFigure 16 , having a planar frontside surface ready for subsequent MEMS steps. - Referring to
Figure 17 , in the next sequence of steps, an 8 micron layer of low-stress silicon oxide is deposited onto theCMOS layer 113 by plasma-enhanced chemical vapour deposition (PECVD). The depth of thissilicon oxide layer 35 defines the depth of each nozzle chamber of the inkjet nozzle assemblies. After deposition of the SiO2 layer 35, subsequent etching through the SiO2 layer defines walls 36 for nozzle chambers and part of a frontsidedicing street hole 32. A silicon etch chemistry is then employed to extend the frontsidedicing street hole 33 and etch anink inlet hole 32 into thesilicon substrate 20. The resulting holes 32 and 33 are subsequently plugged withphotoresist 31 by spinning on the photoresist and planarizing the wafer using CMP polishing. Thephotoresist 31 is a sacrificial material which acts as a scaffold for the subsequent deposition of roof material. It will be readily apparent that other suitable sacrificial materials (e.g. polyimide) may be used for this purpose. - The roof material (e.g. silicon oxide, silicon nitride, or combinations thereof) is deposited onto the planarized SiO2 layer 35 to define the
frontside roof layer 37. Theroof layer 37 will define a rigid planar nozzle plate in the completedprinthead IC 2.Figure 17 shows the wafer at end of this sequence of MEMS processing steps. - In the next stage, and referring now to
Figure 18 , a plurality conductor post vias 38 are etched through theroof layer 37 and the SiO2 layer 35 down to theCMOS layer 113. The conductor post vias 38A etched through the walls 36 will enable connection of nozzle actuators to theunderlying CMOS 113. Meanwhile, the conductor post vias 38B will enable electrical connection between thecontact pad 24 and theunderlying CMOS 113. - Before filling the vias 38 with a conductive material, and in a modification of the process described in
US Patent No. 8,029,097 , a through-silicon via 39 is defined in the next step by etching through theroof layer 37, the SiO2 layer 35, theCMOS layer 113 and into the silicon substrate 20 (seeFigure 19 ). The through-silicon vias 39 are positioned so as to be spaced apart along a longitudinal edge region of each completedprinthead IC 2. (The frontsidedicing street hole 33 effectively defines the longitudinal edge of each printhead IC 2). Each via 39 is generally tapered towards the backside of thesilicon substrate 20. The exact positioning of thevias 39 is determined by the positioning of film contacts 10 in theTAB film 8, which meet with the base of each via when the printhead IC is assembled and connected to the TAB film. - The through-silicon via etch is performed by patterning a mask layer of
photoresist 40 and etching through the various layers. Of course, different etch chemistries may be required for etching through each of the various layers, although the same photoresist mask may be employed for each etch. - Each through-silicon via 39 typically has a depth through the
silicon substrate 20 corresponding to the depth of the plugged frontside ink inlet 32 (typically about 20 microns). However, each via 39 may be made deeper than thefrontside ink inlet 32 depending on the thickness of theTAB film 8. - In the next sequence of steps, and referring to
Figures 20 and 21 , the through-silicon via 39 is provided with insulatingwalls 21, which isolate the via from thesilicon substrate 20. The insulatingwalls 21 comprise an insulatingfilm 42 and adiffusion barrier 43. Thediffusion barrier 43 minimizes diffusion of copper into thebulk silicon substrate 20 when each via 39 is filled with copper. The insulatingfilm 42 and thediffusion barrier 43 are formed by sequential deposition steps, optionally using themask layer 40 for selective deposition of each layer into the via 39. - The insulating
film 42 may be comprised of any suitable insulating material, such as amorphous silicon, polysilicon, silicon oxide etc. Thediffusion barrier 43 is typically a tantalum film. - Referring next to
Figure 22 , the conductor post vias 38 and the through-silicon vias 39 are filled simultaneously with a highly conductive metal, such as copper, using electroless plating. The copper deposition step simultaneously forms nozzle conductor posts 44, contact pad conductor posts 30 and the through-silicon connector 14. Appropriate sizing of the diameters of thevias 38 and 39 may be required to ensure simultaneous copper plating during this step. After the copper plating step, the deposited copper is subjected to CMP, stopping on theroof layer 37 to provide a planar structure. It can be seen that the conductor posts 30 and 44, formed during the electroless copper plating, meet with theCMOS layer 113 to provide a linear conductive path from the CMOS layer up to theroof layer 37. - In the next sequence of steps, and referring to
Figure 23 , a thermoelastic material is deposited over theroof layer 37 and then etched to define thethermoelastic beam member 25 for eachnozzle assembly 101 as well as thecontact pad 24 overlaying a head of the through-silicon connector 14. - By virtue of being fused to
thermoelastic beam members 25, parts of the SiO2 roof layer 37 function as a lowerpassive beam member 46 of a mechanical thermal bend actuator. Therefore, eachnozzle assembly 101 comprises a thermal bend actuator comprising an upperthermoelastic beam 25 connected to theCMOS 113, and a lowerpassive beam 46. These types of thermal bend actuator are described in more detail in, for example,US Publication No. 2008/309729 . - The thermoelastic
active beam member 25 may be comprised of any suitable thermoelastic material, such as titanium nitride, titanium aluminium nitride and aluminium alloys. As explained in the Applicant's earlierUS Publication No. 2008/129793 , vanadium-aluminium alloys are a preferred material, because they combine the advantageous properties of high thermal expansion, low density and high Young's modulus. - As mentioned above, the thermoelastic material is also used to define the
contact pad 24. Thecontact pad 24 extends between heads of the conductor posts 30 and thehead 22 of the through-silicon connector 14. Hence, thecontact pad 24 electrically connects the through-silicon connector 14 with eachconductor post 30 and theunderlying CMOS layer 113. - Still referring to
Figure 23 , after deposition of the thermoelastic material and etching to define the thermal bend actuators andcontact pads 24, the final frontside MEMS fabrication steps comprise etching of thenozzle openings 102 with simultaneous etching of afrontside street opening 47 and deposition of aPDMS coating 48 over theentire roof layer 37 so as to hydrophobize the frontside face and provide elastic mechanical seals for each thermal bend actuator. The use of PDMS coatings was described extensively inUS Patent Nos. 7,794,613 and7,938,974 . - Referring now to
Figure 24 , the entire frontside of the wafer is coated with a relatively thick layer ofphotoresist 49, which protects the frontside MEMS structures and enables the wafer to be attached to ahandle wafer 50 for backside MEMS processing. Backside etching defines theink supply channel 110 and the recessedportion 6 into which extends which thefoot 15 of the through-silicon connector 14. Part of the insulatingfilm 42 is removed when thefoot 15 of the through-silicon connector 14 is exposed by the backside etch. The backside etch also enables singulation of individual printhead ICs by etching down to the plugged frontsidedicing street hole 33. - Final oxidative removal ('ashing') of the
protective photoresist 49 results in singulation ofindividual printhead ICs 2 and formation of fluid connections between the backside and thenozzle assemblies 101. Theresultant printhead IC 2 shown inFigure 25 is now ready for connection to theTAB film 8 viasolder joints 16 to the through-silicon connectors 14. Subsequent bonding of the resulting printhead IC/TAB film assembly to the ink supply manifold provides theprinthead assembly 60 shown inFigure 14 . - The present invention has been described with reference to a preferred embodiment and number of specific alternative embodiments. However, it will be appreciated by those skilled in the relevant fields that a number of other embodiments, differing from those specifically described, will also fall within the and scope of the present invention. Accordingly, it will be understood that the invention is not intended to be limited to the specific embodiments described in the present specification. The scope of the invention is only limited by the attached claims.
Claims (15)
- An inkjet printhead assembly (60) comprising:an ink supply manifold (124);one or more printhead integrated circuits (2), each printhead integrated circuit comprising:a silicon substrate (20);a frontside having at least one CMOS layer (113) comprising drive circuitry and a MEMS layer (26) comprising a plurality of inkjet nozzle assemblies (101), said CMOS layer being positioned between said silicon substrate and said MEMS layer;a backside (12) attached to said ink supply manifold (124); andat least one ink supply channel (110) providing fluid communication between said backside and said inkjet nozzle assemblies; andat least one connector film (8) for supplying power to said drive circuitry,wherein a connection end of said connector film is sandwiched between at least part of said ink supply manifold and said one or more printhead integrated circuits;and wherein each printhead integrated circuit comprises a plurality of through-silicon connectors (14) providing electrical connection between said drive circuitry and said connection end of said connector film (8), each through-silicon connector extending linearly from a contact pad (24) in said MEMS layer (26), through said CMOS layer (113) and through a whole thickness of the silicon substrate, said contact pad (24) being electrically connected to said CMOS layer.
- The inkjet printhead assembly of claim 1, wherein said connector film (8) comprises a flexible polymer film having a plurality of conductive tracks.
- The inkjet printhead assembly of claim 1, wherein said connector film (8) is a tape-automated bonding (TAB) film.
- The inkjet printhead assembly of claim 1, wherein said backside (12) has a recessed portion (6) for accommodating said connector film.
- The inkjet printhead assembly of claim 1, wherein said recessed portion (6) is defined along a longitudinal edge region of each printhead integrated circuit (2).
- The inkjet printhead assembly of claim 1, wherein each through-silicon connector (14) extends linearly from said frontside towards said backside.
- The inkjet printhead assembly of claim 6, wherein each through-silicon connector (14) is tapered towards said backside.
- The inkjet printhead assembly of claim 6, wherein each through-silicon connector (14) is comprised of copper.
- The inkjet printhead assembly of claim 1 comprising one or more conductor posts (30) extending linearly between said contact pad (24) and said CMOS layer (113).
- The inkjet printhead assembly of claim 1, wherein each through-silicon connector (14) is electrically insulated from said CMOS layer.
- The inkjet printhead assembly of claim 10, wherein each through-silicon connector (14) has outer sidewalls comprising an insulating film (42).
- The inkjet printhead assembly of claim 11, wherein said outer sidewalls comprise a diffusion barrier layer (43) between said insulating film (42) and a conductive core of said through-silicon connector (14).
- The inkjet printhead assembly of claim 1, wherein each through-silicon connector (14) is connected to said connection end of said film (8) with solder.
- The inkjet printhead assembly of claim 1, wherein a frontside face of said printhead integrated circuit is planar and free of any wirebond connections.
- A printhead integrated circuit for use in the printhead assembly according to claim 1, the printhead integrated circuit comprising:a silicon substrate (20);a frontside having at least one CMOS layer (113) comprising drive circuitry and a MEMS layer (26) comprising a plurality of inkjet nozzle assemblies (101), said CMOS layer being positioned between said silicon substrate and said MEMS layer;a backside (12) for attachment to an ink supply manifold, the backside having a recessed portion (6) for accommodating a connector film; andat least one ink supply channel (110) providing fluid communication between said backside and said inkjet nozzle assemblies; anda plurality of through-silicon connectors (14) each extending linearly from a contact pad (24) in said MEMS layer (26), through said CMOS layer (113) and through a whole thickness of the silicon substrate, said contact pad (24) being electrically connected to said CMOS layer.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/AU2009/000953 WO2011011807A1 (en) | 2009-07-27 | 2009-07-27 | Inkjet printhead assembly having backside electrical connection |
Publications (3)
Publication Number | Publication Date |
---|---|
EP2496419A1 EP2496419A1 (en) | 2012-09-12 |
EP2496419A4 EP2496419A4 (en) | 2014-02-19 |
EP2496419B1 true EP2496419B1 (en) | 2018-05-30 |
Family
ID=43528619
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP09847677.3A Active EP2496419B1 (en) | 2009-07-27 | 2009-07-27 | Inkjet printhead assembly having backside electrical connection |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP2496419B1 (en) |
JP (1) | JP5475116B2 (en) |
KR (1) | KR101444560B1 (en) |
CN (1) | CN102470671B (en) |
SG (1) | SG176568A1 (en) |
WO (1) | WO2011011807A1 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9289974B2 (en) | 2013-04-29 | 2016-03-22 | Hewlett-Packard Development Company L.P. | Printhead control systems and methods for controlling a printhead |
CN105453539B (en) * | 2013-08-02 | 2019-02-22 | 富士胶片株式会社 | Image processing apparatus, photographic device and image processing method |
JP6492891B2 (en) | 2015-03-31 | 2019-04-03 | ブラザー工業株式会社 | Liquid ejection device and liquid ejection device unit |
JP6911170B2 (en) * | 2016-02-24 | 2021-07-28 | ヒューレット−パッカード デベロップメント カンパニー エル.ピー.Hewlett‐Packard Development Company, L.P. | Fluid discharge device including integrated circuits |
TWI789529B (en) * | 2018-07-30 | 2023-01-11 | 瑞士商西克帕控股有限公司 | A multi-chip module (mcm) assembly |
EP3921171A1 (en) * | 2019-02-06 | 2021-12-15 | Hewlett-Packard Development Company, L.P. | Fluid ejection device with a carrier having a slot |
US11472180B2 (en) | 2019-02-06 | 2022-10-18 | Hewlett-Packard Development Company, L.P. | Fluid ejection devices including electrical interconnect elements for fluid ejection dies |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3309341B2 (en) * | 1992-08-05 | 2002-07-29 | 株式会社吉野工業所 | Tube container supply device |
US6536882B1 (en) * | 2000-07-26 | 2003-03-25 | Eastman Kodak Company | Inkjet printhead having substrate feedthroughs for accommodating conductors |
US6394580B1 (en) | 2001-03-20 | 2002-05-28 | Hewlett-Packard Company | Electrical interconnection for wide-array inkjet printhead assembly |
US6727115B2 (en) * | 2001-10-31 | 2004-04-27 | Hewlett-Packard Development Company, L.P. | Back-side through-hole interconnection of a die to a substrate |
US6902872B2 (en) * | 2002-07-29 | 2005-06-07 | Hewlett-Packard Development Company, L.P. | Method of forming a through-substrate interconnect |
US6755509B2 (en) | 2002-11-23 | 2004-06-29 | Silverbrook Research Pty Ltd | Thermal ink jet printhead with suspended beam heater |
JP2005044927A (en) * | 2003-07-25 | 2005-02-17 | Kyocera Corp | Piezoelectric actuator and its manufacturing method, and liquid discharge apparatus |
US7441865B2 (en) | 2004-01-21 | 2008-10-28 | Silverbrook Research Pty Ltd | Printhead chip having longitudinal ink supply channels |
US7524016B2 (en) * | 2004-01-21 | 2009-04-28 | Silverbrook Research Pty Ltd | Cartridge unit having negatively pressurized ink storage |
WO2005070679A1 (en) * | 2004-01-21 | 2005-08-04 | Silverbrook Research Pty Ltd | Printhead assembly and printhead module for same |
GB2410467A (en) | 2004-01-30 | 2005-08-03 | Hewlett Packard Development Co | A method of making an inkjet printhead |
US7275805B2 (en) | 2004-05-27 | 2007-10-02 | Silverbrook Research Pty Ltd | Printhead comprising different printhead modules |
US7690767B2 (en) * | 2004-07-22 | 2010-04-06 | Canon Kabushiki Kaisha | Ink jet recording head and ink jet recording apparatus |
US7303930B2 (en) | 2005-10-11 | 2007-12-04 | Silverbrook Research Pty Ltd | Method of fabricating suspended beam in a MEMS process |
US7438371B2 (en) | 2005-12-05 | 2008-10-21 | Silverbrook Research Pty Ltd | Method of modulating printhead peak power requirement using redundant nozzles |
JP2007326340A (en) * | 2006-06-09 | 2007-12-20 | Canon Inc | Inkjet recording head and its manufacturing method |
JP4819608B2 (en) * | 2006-07-31 | 2011-11-24 | 富士フイルム株式会社 | Liquid ejection head, liquid ejection apparatus, and image forming apparatus |
US7984973B2 (en) | 2006-12-04 | 2011-07-26 | Silverbrook Research Pty Ltd | Thermal bend actuator comprising aluminium alloy |
US7938974B2 (en) | 2007-03-12 | 2011-05-10 | Silverbrook Research Pty Ltd | Method of fabricating printhead using metal film for protecting hydrophobic ink ejection face |
US7669967B2 (en) | 2007-03-12 | 2010-03-02 | Silverbrook Research Pty Ltd | Printhead having hydrophobic polymer coated on ink ejection face |
US7794613B2 (en) | 2007-03-12 | 2010-09-14 | Silverbrook Research Pty Ltd | Method of fabricating printhead having hydrophobic ink ejection face |
US7819503B2 (en) | 2007-06-15 | 2010-10-26 | Silverbrook Research Pty Ltd | Printhead integrated circuit comprising inkjet nozzle assemblies having connector posts |
US8029097B2 (en) | 2008-11-26 | 2011-10-04 | Silverbrook Research Pty Ltd | Inkjet nozzle assembly having moving roof structure and sealing bridge |
-
2009
- 2009-07-27 WO PCT/AU2009/000953 patent/WO2011011807A1/en active Application Filing
- 2009-07-27 EP EP09847677.3A patent/EP2496419B1/en active Active
- 2009-07-27 SG SG2011085248A patent/SG176568A1/en unknown
- 2009-07-27 JP JP2012514289A patent/JP5475116B2/en active Active
- 2009-07-27 CN CN200980160208.7A patent/CN102470671B/en active Active
- 2009-07-27 KR KR1020127000846A patent/KR101444560B1/en active IP Right Grant
Non-Patent Citations (1)
Title |
---|
None * |
Also Published As
Publication number | Publication date |
---|---|
WO2011011807A1 (en) | 2011-02-03 |
JP2012529384A (en) | 2012-11-22 |
JP5475116B2 (en) | 2014-04-16 |
CN102470671B (en) | 2014-11-26 |
SG176568A1 (en) | 2012-01-30 |
KR20120031499A (en) | 2012-04-03 |
EP2496419A1 (en) | 2012-09-12 |
KR101444560B1 (en) | 2014-10-07 |
EP2496419A4 (en) | 2014-02-19 |
CN102470671A (en) | 2012-05-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US8101438B2 (en) | Method of fabricating printhead integrated circuit with backside electrical connections | |
US8287095B2 (en) | Printhead integrated comprising through-silicon connectors | |
US8506055B2 (en) | MEMS integrated circuit having backside integrated circuit contacts | |
EP2496419B1 (en) | Inkjet printhead assembly having backside electrical connection | |
EP1923219B1 (en) | Inkjet head | |
US8256877B2 (en) | Inkjet printhead assembly having backside electrical connection | |
US20020113846A1 (en) | Ink jet printheads and methods therefor | |
KR101819882B1 (en) | High density multilayer interconnect for print head | |
KR20100082216A (en) | Inkjet head chip and inkjet print head using the same | |
EP3268226B1 (en) | Electronic device | |
US8323993B2 (en) | Method of fabricating inkjet printhead assembly having backside electrical connections | |
JP5692881B2 (en) | Ink jet print head having common conductive path in nozzle plate | |
TWI495570B (en) | Inkjet printhead assembly having backside electrical connection | |
TWI492851B (en) | Printhead integrated comprising through-silicon connectors | |
JP2015110340A (en) | Inkjet nozzle assembly accompanying drip direction control by independently-operable roof paddle | |
TW201103762A (en) | Printhead integrated circuit configured for backside electrical connection | |
US8567912B2 (en) | Inkjet printing device with composite substrate | |
CN111703207A (en) | Piezoelectric ink-jet printing device with single-layer internal electrode | |
JP5341688B2 (en) | Liquid discharge head and manufacturing method thereof | |
JP2007283549A (en) | Inkjet recording head and method for manufacturing the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20120608 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK SM TR |
|
DAX | Request for extension of the european patent (deleted) | ||
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: ZAMTEC LIMITED |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: ZAMTEC LIMITED |
|
A4 | Supplementary search report drawn up and despatched |
Effective date: 20140122 |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: B41J 2/16 20060101ALI20140116BHEP Ipc: B41J 2/14 20060101AFI20140116BHEP |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: MEMJET TECHNOLOLGY LIMITED |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: MEMJET TECHNOLOGY LIMITED |
|
17Q | First examination report despatched |
Effective date: 20150313 |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R079 Ref document number: 602009052618 Country of ref document: DE Free format text: PREVIOUS MAIN CLASS: B41J0002135000 Ipc: B41J0002140000 |
|
GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: B41J 2/155 20060101ALI20180215BHEP Ipc: B41J 2/14 20060101AFI20180215BHEP Ipc: B41J 2/16 20060101ALI20180215BHEP |
|
INTG | Intention to grant announced |
Effective date: 20180228 |
|
GRAS | Grant fee paid |
Free format text: ORIGINAL CODE: EPIDOSNIGR3 |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK SM TR |
|
REG | Reference to a national code |
Ref country code: GB Ref legal event code: FG4D |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: EP |
|
REG | Reference to a national code |
Ref country code: AT Ref legal event code: REF Ref document number: 1003203 Country of ref document: AT Kind code of ref document: T Effective date: 20180615 |
|
REG | Reference to a national code |
Ref country code: IE Ref legal event code: FG4D |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R096 Ref document number: 602009052618 Country of ref document: DE |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: PLFP Year of fee payment: 10 |
|
REG | Reference to a national code |
Ref country code: NL Ref legal event code: MP Effective date: 20180530 |
|
REG | Reference to a national code |
Ref country code: LT Ref legal event code: MG4D |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20180530 Ref country code: CY Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20180530 Ref country code: FI Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20180530 Ref country code: BG Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20180830 Ref country code: NO Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20180830 Ref country code: LT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20180530 Ref country code: ES Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20180530 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20180831 Ref country code: HR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20180530 Ref country code: LV Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20180530 |
|
REG | Reference to a national code |
Ref country code: AT Ref legal event code: MK05 Ref document number: 1003203 Country of ref document: AT Kind code of ref document: T Effective date: 20180530 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: NL Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20180530 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: RO Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20180530 Ref country code: AT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20180530 Ref country code: CZ Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20180530 Ref country code: EE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20180530 Ref country code: PL Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20180530 Ref country code: DK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20180530 Ref country code: SK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20180530 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20180530 Ref country code: SM Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20180530 |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R097 Ref document number: 602009052618 Country of ref document: DE |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: MC Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20180530 Ref country code: LU Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20180727 |
|
REG | Reference to a national code |
Ref country code: BE Ref legal event code: MM Effective date: 20180731 |
|
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LI Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20180731 Ref country code: CH Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20180731 |
|
26N | No opposition filed |
Effective date: 20190301 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SI Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20180530 Ref country code: BE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20180731 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: MT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20180727 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: TR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20180530 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: PT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20180530 Ref country code: HU Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT; INVALID AB INITIO Effective date: 20090727 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: MK Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20180530 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IS Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20180930 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: IE Payment date: 20210727 Year of fee payment: 13 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: FR Payment date: 20220725 Year of fee payment: 14 |
|
P01 | Opt-out of the competence of the unified patent court (upc) registered |
Effective date: 20230417 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20220727 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 20230727 Year of fee payment: 15 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20230727 Year of fee payment: 15 |