CN102215738A - Measuring system for ophthalmic surgery - Google Patents

Measuring system for ophthalmic surgery Download PDF

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Publication number
CN102215738A
CN102215738A CN2009801455586A CN200980145558A CN102215738A CN 102215738 A CN102215738 A CN 102215738A CN 2009801455586 A CN2009801455586 A CN 2009801455586A CN 200980145558 A CN200980145558 A CN 200980145558A CN 102215738 A CN102215738 A CN 102215738A
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light
optical
optical module
measuring system
oct
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CN102215738B (en
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马库斯·塞萨尔伯格
彼得·瑞梅尔
克里斯托夫·豪格尔
克里斯托夫·库韦布勒
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Carl Zeiss Meditec AG
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Carl Zeiss Surgical GmbH
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    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B3/00—Apparatus for testing the eyes; Instruments for examining the eyes
    • A61B3/10—Objective types, i.e. instruments for examining the eyes independent of the patients' perceptions or reactions
    • A61B3/1015—Objective types, i.e. instruments for examining the eyes independent of the patients' perceptions or reactions for wavefront analysis
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61F—FILTERS IMPLANTABLE INTO BLOOD VESSELS; PROSTHESES; DEVICES PROVIDING PATENCY TO, OR PREVENTING COLLAPSING OF, TUBULAR STRUCTURES OF THE BODY, e.g. STENTS; ORTHOPAEDIC, NURSING OR CONTRACEPTIVE DEVICES; FOMENTATION; TREATMENT OR PROTECTION OF EYES OR EARS; BANDAGES, DRESSINGS OR ABSORBENT PADS; FIRST-AID KITS
    • A61F9/00—Methods or devices for treatment of the eyes; Devices for putting-in contact lenses; Devices to correct squinting; Apparatus to guide the blind; Protective devices for the eyes, carried on the body or in the hand
    • A61F9/007—Methods or devices for eye surgery
    • A61F9/00736—Instruments for removal of intra-ocular material or intra-ocular injection, e.g. cataract instruments

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  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Medical Informatics (AREA)
  • Biophysics (AREA)
  • Ophthalmology & Optometry (AREA)
  • Engineering & Computer Science (AREA)
  • Biomedical Technology (AREA)
  • Heart & Thoracic Surgery (AREA)
  • Physics & Mathematics (AREA)
  • Molecular Biology (AREA)
  • Surgery (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Eye Examination Apparatus (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Microscoopes, Condenser (AREA)

Abstract

The invention relates to an optical measuring system comprising a wave front sensor for characterizing a shape of a wave front of measuring light and an imaging lens, wherein the imaging lens comprises a first optical assembly and a second optical assembly for imaging an object region in an entrance region of the wave front sensor. A distance between the object region and the first optical assembly is larger that a focal length of the first optical assembly. Furthermore, the optical measuring system can comprise an optical microscopy system and optionally an OCT system for carrying out different optical examination methods at the same time.

Description

The external coat measuring system
Technical field
The present invention relates to have the external coat measuring system of wavefront sensor and image optics device.Specifically, that the present invention relates to have wavefront sensor and image optics device and external coat measuring system by between image optics device and examined object, providing enough big distance to be suitable in external coat, using in surgery, particularly.In addition, the present invention relates to have the external coat measuring system of wavefront sensor and OCT system.
Background technology
The wavefront sensor that is configured to characterize the wavefront form of measuring light is known in this area.By using Shack-Hartmann (Hartmann-Shack) pick off, such wavefront sensor can be specifically used for measuring the aberration of human eye, as at paper J.Liang, B.Grimm, S.Goelz, J.F.Bille, " Objective measurement of a Hartmann-Shack wavefront sensor " describes among J.Opt.Soc.Am.A 11 (1994) pp.1949-1957.In such system, the Shack-Hartmann pick off comprises particularly is arranged to planar microlens array, wherein in the confocal plane of microlens, is provided with the optical sensor of position sensing.Utilize such Shack-Hartmann pick off, the form that incides the wave surface on the microlens array can be determined by the local dip of measuring the wave surface in the zone corresponding with each microlens.
In order to measure the optical property of human eye, on the retina of human eye, generate as far as possible little illumination speckle.Approximate spherical wave passes vitreous body, crystalline lens and cornea and leaves eyes from this point-like illumination speckle emission.When it passed the different optical interface of human eye, the form of wave surface changed.This causes existing wave surface to depart from flat wave surface.Depart from and to represent by the local dip in transverse area from these of flat wave surface, and therefore can measure by using Hartmann-Shack wavefront transducer.
Document US 2005/0241653A1 discloses can be provided with and be installed in the object lens of microscopic system and the wavefront sensor between the examined object.
Document US 6550917B1 discloses a kind of wavefront sensor, and it is designed so that the deformable of spherical wave front is a plane front.For example the spherical wave front can be the wave surface that withdraws from the ametropic eye (ametropic eye) with spherical aberration.Thus, can increase the measuring range of wavefront sensor.
Document DE 103 60 570 B4 disclose the optical measuring system of a kind of OCT of comprising system and wave surface analytical system.Based on the measurement of wavefront form, the control adaptive optical element, feasible wave surface by the wave surface detectors measure is roughly plane front.The OCT signal that can be improved thus.
But disclosed wavefront sensor only limited purposes in surgical procedures in above-mentioned document is because they need thing and the short distance between the optical module of close thing.
Summary of the invention
Therefore, an object of the present invention is to provide a kind of optical measuring system that has wavefront sensor and be suitable in surgical procedures, using.Specifically, an object of the present invention is to provide and a kind ofly have wavefront sensor and be suitable in external coat, the measuring system in the cataract surgery, used particularly.
Another object of the present invention provides a kind ofly to be had wavefront sensor and OCT system and allows that the optical measuring system of examined object is wherein come execution analysis by measuring the three-dimensional structure data group by analyzing the wave surface of sending from thing.This measuring system also must be suitable for surgical procedures.
Embodiments of the present invention provide a kind of optical measuring system, particularly a kind ofly provide enough work spaces to carry out the external coat measuring system of surgical procedures to the surgeon.
According to an embodiment of the invention, a kind of optical measuring system is provided, it comprises: wavefront sensor, this wavefront sensor are used for being characterized in the wavefront form of the measuring light that enters zone (entry region) of wavefront sensor; With the image optics device, this image optics device has first optical module and second optical module on the zone of entering that is used for by using measuring light object area is imaged onto wavefront sensor, and wherein following relation is set up:
1.1*f≤d, wherein
F represents the focal length of first optical module; With
D represents the distance between the object area and first optical module.
Wavefront sensor can comprise the extension array of refraction or diffraction optical element.The array of optical element is the array of microlens specifically.In these refractions or the diffraction optical element each is designed so that measuring light focuses in the focal plane.The common focal plane that the independent focal plane from refraction or diffraction optical element forms, provide the position sensing optical sensor.The position sensing optical sensor can for example be CCD camera and/or cmos sensor or any other light sensor.Specifically, the position sensing optical sensor can be configured to the analytic space intensity distributions.The position sensing photodetector can be arranged in the plane, and this planar orientation is vertical with the optical axis of wavefront sensor.Wavefront sensor enter the area limiting that the zone can be arranged by the refraction or the array of diffraction optical element.Specifically, this zone can have planar form.This plane can be for example limit by the optical interface that the plane is coupled to refraction or diffraction optical element, and wherein optical interface comprises those optical planes of the wavefront sensor of putting responsive optical sensor of offing normal farthest.
According to the wavefront form of the measuring light that is incident on wavefront sensor, by the array of refraction or diffraction optical element, the light shafts of this wave surface are imaged onto on the corresponding region array on the position sensing photodetector.These zones of focused light wire harness can have ellipse or circular form particularly.With respect to local dip or deflection that each the regional mean place or the centroid position of the lateral attitude of corresponding refraction or diffraction optical element are represented the light shafts of each refraction or diffraction optical element, the wave surface that wherein incides wavefront sensor comprises this light shafts.
The position sensing optical sensor can comprise a plurality of sensor part or pixel particularly.According to the light intensity that is incident on each of detector parts, generate the signal of telecommunication by wavefront sensor.Then, these signals of telecommunication are transferred to processing unit.Processing unit is configured to determine the position of restrainting on the focused ray according to the signal of telecommunication.This position can be in particular the center or for example as the position of barycenter of the barycenter in zone, and this zone is extended on a plurality of detector parts and formed by the incident focused beam acts of light, and one of the refraction of wavefront sensor or diffraction optical element are passed in this zone.
According to the embodiment of the present invention, wavefront sensor is the Shack-Hartmann pick off.Alternatively, wavefront sensor can for example be interferometer, classical Hartmann test, the test of bright contract, Talbot interference measuring instrument or phase retrieval method.In addition, optical measuring system can be configured so that the possible astigmatic aberration of patient's eyes is by variable cylindrical lens precompensation.Cylindrical lens can rotatably be supported.For example, cylindrical lens can be a liquid crystal lens.
Optical measuring system can also comprise the light source that is used to illuminate examined object.Specifically, measuring system can be configured to illuminate the amphiblestroid zone of being examined eyes, and is wherein should the zone as far as possible little.The wave surface of the measuring light of almost parallel or sphere can be incident on and be examined on the eyes, and wave surface pass be subjected to Oph cornea, crystalline lens and vitreous body after, wave surface is incident on the retina as spherical wave front roughly.Thus, amphiblestroid zone is illuminated, and it has little scope.According to the ametropia of being examined eyes, this zone can have circular or oval-shaped form.Difference between the length of oval-shaped main shaft can increase along with the astigmatic aberration of being examined eyes.
In order to measure from being examined the form of the wave surface that eyes send, wave surface is directed to entering on the zone of wavefront sensor.For this reason, optical measuring system comprises the image optics device with first optical module and second optical module.Optical module is one of below can comprising or its combination: refraction optical element, diffraction optical element, such as reflector and/or lens and/or grating and/or one or more electricity or mechanical may command variable lens or reflector, they can be designed in such a way that it is changeable making their light refractive index by the shape that changes them.The optics of optical module can have fixed position relative to each other, such as adherent element or independent lens and/or the attaching components for using lens mount to install alternatively.
By passing first optical module, the light that the point from the focal zone of first optical module sends to different directions is changed into light beam, and this light beam is made up of the light of almost parallel.Based on this fact, the position of the focal zone of first optical module is confirmable.Focal zone can have planar form particularly, and this plane positioning is the optical axis perpendicular to first optical module.In this case, focal zone can be called the focal plane.The point that the optical axis that the focus of first optical module can be defined as first optical module and focal plane intersect.Pass the focus of first optical module and form low-angle incident ray with optical axis and change outgoing beam into by first optical module, this parallel beam is in the optical axis of first optical module and advance.The cross point of the outgoing beam that extends and the incident beam of extension is arranged in the principal plane of first optical module.The focal distance f of first optical module is limited by the distance between the focal plane of the principal plane of first optical module and first optical module.
Being limited by the distance between the optical surface of the parts of the object area and first optical module apart from d between the object area and first optical module, wherein this optical surface can be represented the most close object area optical surface on the beam path of measuring light of the parts of first optical module.These parts of first optical module are the parts with lens effect, that is, refractive index is greater than 0 parts.Specifically, these parts are not the other forms of parts of plane-parallel plate or the wavefront form that does not change measuring light.Therefore, more optics can be arranged on according to the distance from object area in the beam path of the measuring light between the object area and first optical module, from the distance of object area less than d.These more opticses can have 0 refractive index or compare less refractive index with the refractive index of first optics, as less than 5% of the refractive index of first optical module, particularly less than 1%.The inverse of the refractive index of first optical module by focal length, promptly provide by 1/f.
Represent free space between first optical module and the examined object apart from d thus.This free space is commonly referred to work space and is commonly referred to operating distance apart from d.By the 1.1*f≤d that satisfies condition, guarantee the focal distance f of operating distance d greater than first optical module.The increase of d causes the increase of operating distance thus, and this is particularly advantageous in surgical procedures, particularly in the surgical procedures that human eye is carried out
According to an embodiment of the invention, keep 1.5*f≤d, particularly 1.75*f≤d, particularly 2*f≤d.For concrete application, advantageously, provide the less focal length of first optical module.In addition in this case, can obtain enough big operating distance in order to carry out surgical procedures.
According to an embodiment of the invention, keep d 〉=150 millimeter, particularly keep d 〉=175 millimeter, particularly keep d 〉=190 millimeter in addition.Such operating distance allows to carry out surgical procedures under various requirement, particularly carries out surgical procedures down from carrying out these requirements that external coat produced.According to other embodiment, keep d≤500 millimeter, particularly keep d≤300 millimeter, particularly keep d≤200 millimeter in addition.
According to an embodiment of the invention, at least one in first optical module and second optical module is refractive optics assembly, particularly lens subassembly.Lens subassembly is one group of lens, and it comprises one or more lens.Lens subassembly can be made up of attaching components.The lens of lens subassembly can be provided with according to fixed position relative to each other.
According to an embodiment of the invention, optical measuring system also comprises the 3rd optical module, the 3rd optical module is set up and is configured to object area is imaged onto on the image-region along microscopical beam path, and this image-region is different from the zone that enters of wavefront sensor.Thus, except carrying out the analysis of wave surface, can also carry out the optical microscope method of object area.It is particularly advantageous carrying out the optical microscope method during carrying out surgical procedures.
According to an embodiment of the invention, object area is positioned at the focal zone place of first optical module.
According to an embodiment of the invention, first optical module comprises first optical sub-assembly and second optical sub-assembly, and first optical sub-assembly and second optical sub-assembly are at a distance from each other.First optical module is made up of first optical sub-assembly and second optical sub-assembly.Specifically, first optical sub-assembly and second optical sub-assembly are provided with according to relative to each other fixed position.
According to an embodiment of the invention, the light path on the beam path of the measuring light between first optical module and second optical module that is passed by measuring light is variable.The advantage that the transmutability of light path has is, but the aberration of being examined human eye is a precompensation.Thus, the curvature that is incident on the wave surface on the wavefront sensor is minimized, and increase the measuring range or the dynamic range of wavefront sensor thus.The wave surface of measuring light has under the situation of sphere form on being incident on first optical module time, and the wave surface that enters in the zone of wavefront sensor can change the wave surface with general plane form into.By increasing or reduce the light path between first optical module and second optical module,, and can adjust this transformation particularly by increasing or reduce second optical sub-assembly of first optical module and the light path between second optical module.
Even when the light path that changes between first optical module and second optical module, the focal zone of first optical module that can be made up of first optical sub-assembly and second optical sub-assembly still is imaged onto entering on the zone of wavefront sensor.The change of light path can comprise with respect to second optical module moves/displacement second optical sub-assembly.Can be provided for changing the actuator of light path, wherein actuator is designed to be provided for the driving force with respect to the second optical module displacement, second optical sub-assembly.Actuator can be the actuator that motor maybe can be configured to transmit the driving force that displacement uses, such as the actuating mechanism of similar screw rod.Can carry out displacement along track or guiding piece.Displacement such as shift length can detect and measure by detector.Actuator can carry out signal with controller communicates by letter, and makes controller can start actuator.Controller can comprise or utilize calibration curve, and it allows in the amount of spherical aberration of being examined eyes and is used for changing between the shift length of this ametropia of precompensation.By using calibration curve, can control controller based on the known ametropia of being examined eyes, so that with respect to the second optical module displacement, second optical sub-assembly.
According to an embodiment of the invention, the external coat measuring system is configured to characterize the wavefront form of the measuring light that the eyes from be arranged on object area send, wherein by changing the light path between first optical module and second optical module, eyes have-and 5dpt (diopter) is to the spherical aberration of+25dpt (diopter).The symbol of the spherical aberration of eyes is defined as and makes aphakic eyes (that is, having removed the eyes of natural lens) have approximately+spherical aberration of 20dpt.
According to an embodiment of the invention, optical measuring system also comprise be used for the deflection measuring light, particularly deflection measuring light reaches 180 ° reflector, wherein reflector is arranged in the beam path of measuring light and between first optical module and second optical module movablely, to change the light path that is passed by measuring light.Specifically, reflector is arranged in the beam path of measuring light and between second optical sub-assembly and second optical module of first optical module movablely.
According to an embodiment of the invention, reflector comprises at least two minute surfaces, and they are to be different from 0 angle setting.Reflector for example can comprise two or three mirrors, and wherein reflector does not comprise any more reflecting surface.Advantageously, owing to lucky two mirrors are used in favourable polarisation behavior.
According to an embodiment of the invention, optical measuring system also comprises retroreflector, and this retroreflector is arranged between first optical module (being in particular second optical sub-assembly of first optical module) and second optical module in the beam path of measuring light.Retroreflector is roughly to reverse the optical system of the direction of propagation of measuring light.This feature is independent of the orientation of the direction of propagation of measuring light with respect to retroreflector substantially.As example, measuring light is not reflected by retroreflector along the beam path of incident measuring light, but the edge is reflected by retroreflector with respect to the path of the beam path lateral displacement of incident measuring light.By between second optical sub-assembly and second optical module, retroreflector being set, can change light path between second optical sub-assembly and second optical module by making the retroreflector displacement.Retroreflector reaches distance at the direction top offset parallel with the optical axis of first optical module and 1 causes the increase or the minimizing of the light path between second optical sub-assembly and second optical module to reach 2*n*1, and wherein n represents the refractive index of the medium in the beam path of the measuring light between second optical sub-assembly and second optical module.Provide retroreflector to allow to design optical measuring system very compact on the size.This allow again optical measuring system be installed in microscopic system inside or below.
According to an embodiment of the invention, retroreflector comprises prism of corner cube, and prism of corner cube comprises transparent main body, and this main body roughly has the pyramidal form of three sides.Three inclines awl can comprise localized three trianglees that are perpendicular to one another, and each triangle is that the form and the surface of isosceles right triangle is the form of equilateral triangle.Utilize this prism of corner cube, incident beam is reflected three surfaces by prism of corner cube.Reflection is handled and can be produced by total internal reflection.But, can also imagine that for example by the plating coating, reflectance coating can be coated to the surface that reflection is handled takes place.Thus, the possible polarization of light is affected according to different modes.
According to an embodiment of the invention, optical measuring system also comprises beam splitter, and beam splitter is arranged on entering between the zone and second optical module of wavefront sensor.Beam splitter can be designed as the polarized beam splitting device.Beam splitter can be advantageously used in measuring light is coupled to beam path.Therefore, the measuring light in the way of the thing the focal zone from beam splitter to first optical module is roughly passed the identical light path of light that sends to beam splitter with thing from the way.In the way from the beam splitter to the thing, measuring light is passed second optical module and first optical module (being in particular first optical sub-assembly and second optical sub-assembly of first optical module).In the way from the thing to the beam splitter, measuring light is passed first optical module (being in particular first optical sub-assembly and second optical sub-assembly of first optical module) and second optical module.In addition, measuring light arrives wavefront sensor along the part of beam path, and the measuring light that the part of this beam path be can't help in the way from the beam splitter to the thing is passed.Thus, guarantee particularly that examined under the situation that eyes have spherical aberration, the measuring light of irradiation eyes can be adjusted with respect to the curve of the wave surface of measuring light, makes at the irradiation speckle of being examined on the retina of eyes as far as possible little.This can carry out by the light path that changes between second optical module and second optical sub-assembly.
According to an embodiment of the invention, keep relation of plane d (1,2) 〉=f1*d (d-f1) down, wherein d (1,2) distance between the parts of the parts of expression first optical sub-assembly and second optical sub-assembly, and f1 represents the focal length of first optical sub-assembly.First optical sub-assembly and second optical sub-assembly are located according to certain each other distance along the optical axis of first optical module particularly, and the light beam that feasible point from the focal zone of first optical module sends intersects between first optical sub-assembly and second optical sub-assembly after passing first optical sub-assembly.In the zone of such intersection, particularly form the intermediate image of the object area in the focal zone that is arranged on first optical module.D (1,2) expression is along the distance of the optical axis of first optical module between the optical surface of the parts of the optical surface of the parts of first optical sub-assembly and second optical sub-assembly, wherein two parts have and are different from 0 optics multiplying power, and wherein two opticses are respectively those opticses that have first and second optical sub-assemblies of minimum range each other.
According to an embodiment of the invention, first optical sub-assembly comprises first battery of lens (being in particular object lens) and second battery of lens, second battery of lens is set to apart from first battery of lens certain distance is arranged, wherein the microscope beam path passes first battery of lens of first optical sub-assembly, and wherein the 3rd optical module comprises panntographic system.Thus, at the beam path of the measuring light of wavefront sensor and first battery of lens that the microscope beam path passes first optical sub-assembly.Thus, can provide a kind of optical measuring system, this optical measuring system allows to carry out the analysis of wave surface and carry out the optical microscope method simultaneously, and wherein first battery of lens of first optical sub-assembly is used for two kinds of purposes.Parts integrated of compact optical measuring system can be provided on the size thus.
According to an embodiment of the invention, be set in place in the beam path of first battery of lens of first optical sub-assembly and the measuring light between second battery of lens such as the minute surface of the minute surface of collapsible reflector.Minute surface is set to be used for separating on the beam path of measuring light and the microscope beam path space.
According to an embodiment of the invention, second battery of lens of first optical sub-assembly and second optical sub-assembly form afocal system, particularly form Kepler telescope.By passing afocal system, the light of being made up of plane front changes the light of also being made up of plane front into.The optical system that Kepler telescope is made up of two lens or lens combination.Two lens each other according to certain distance along the optical axis setting, wherein this distance corresponding to the focal length of two lens and.
According to an embodiment, object area is arranged in the focal zone of first battery of lens of first optical sub-assembly.First battery of lens of first optical sub-assembly can be called the principal goods mirror of microscopic system.Therefore, object area is arranged in the focal zone of the principal goods mirror of microscopic system.This is used under the situation such as the downstream of the principal goods mirror of panntographic system or eyepiece at more opticses is favourable.
According to an embodiment of the invention, the 3rd optical module comprises object lens and panntographic system, and wherein the beam path of measuring light does not cross object lens and wherein in the described beam path of described measuring light, be provided with minute surface between described object area and first optical sub-assembly.According to this embodiment, the parts of the optical measuring system of mentioning so far all are not provided for the analysis of wave surface and are used to carry out the optical microscope method.Specifically, this advantage that has is, the parts that are used to analyze wave surface can be designed in such a way that they removably can be installed in optical microscope system, and therefore can pull down to carry out the analysis of wave surface.In addition, parts can be designed in such a way that they can be installed on the different optical microscope systems, and do not need the important optics of optical microscope system, perhaps do not need to adjust the important optics of optical microscope system.
According to an embodiment of the invention, object area is arranged in the focal zone of object lens.
According to an embodiment of the invention, object area is different from the focal zone of first optical module.
According to an embodiment of the invention, first optical module and second optical module form afocal system, particularly Kepler telescope together.
According to an embodiment of the invention, beam splitter is arranged in the beam path of measuring light movablely, between first optical module and second optical module.By beam splitter, illumination light is bootable to object area.
According to an embodiment of the invention, minute surface (61) is arranged between first optical module and the object area.Thus, optical measuring system and microscopic system are capable of being combined, and wherein beam splitter will form at the part of the measuring light of wave surface analysis and separate with the light that is used for microscopy.
According to an embodiment of the invention, the external coat measuring system also comprises the OCT system, this OCT system has the OCT light source that is used to generate the OCT measuring light, wherein between first optical module and second optical module or in the beam path that enters the OCT measuring light between the zone of second optical module and wavefront sensor, be provided with the OCT beam splitter, make the OCT measuring light be directed at least by first optical module to illuminate object area.Under the OCT beam splitter was arranged on situation between first optical module and second optical module, the OCT measuring light only was directed by first optical module, and by second optical module, to illuminate object area.Be arranged at the OCT beam splitter under the situation between the zone of entering of second optical module and wavefront sensor, the OCT measuring light is passed first optical module and second optical module, to illuminate object area.The OCT measuring light can interact with the OCT beam splitter, and wherein interacting for example can comprise transmission or reflection.The OCT beam splitter can be configured to be provided with the beam path of OCT measuring light, makes its (its part at least) identical with the beam path of the measuring light that is used to analyze wave surface.Thus, the measuring light that is used to analyze wave surface can pass the parts of system or by the reflection of the parts of system, the parts of such system are also passed by the OCT measuring light or also reflect the OCT measuring light, and wherein the optics of system can comprise first optical module.In addition, these parts can also comprise second optical module.Thus, can obtain compact structure on cost-efficient and the size.
Means of optical coherence tomography (OCT) is based on the method for the structural information of the thing of interferometry by being used for obtaining the volume part at the different depth place of examined object reflected light.
The OCT light source can be configured to provide the OCT measuring light of the wavelength of the wavelength that has in visible light and/or near infrared region, wherein adjust the bandwidth of OCT light source, make that from the coherence length of the OCT measuring light of OCT light emitted be to tens microns at several microns.Be directed to the thing that is arranged in object area from the part of the OCT measuring light of OCT light emitted along the OCT beam path, this OCT beam path comprises mirror, lens and/or optical fiber.The OCT measuring light is according to the material in wavelength and the thing and the penetration depth of penetrator Da Teding.The part of the OCT measuring light that penetrates reflects according to the reflectance in the thing and is superimposed upon from the OCT light emitted and on the second portion of the OCT measuring light that reference surface is reflected.Synergetic light is detected by detector and is converted to the signal of telecommunication, and the signal of telecommunication is corresponding to detected stack light intensity.Because the short coherence length of OCT measuring light, during less than the coherence length of OCT measuring light, only observe constructive interference (constructive interference) when the light path of propagating by the OCT measuring light and returning with by the difference between the light path of propagating from the second portion of OCT light emitted and the light that reflected by reference surface from thing.
Different embodiments provides the different variants of OCT system.The different variants of OCT system differ from one another obtaining the mode of structural information along depth direction (axial direction) scanning and detect on the mode of superimposed light.According to the embodiment of time domain OCT (TD-OCT), the reference surface displacement of the second portion of light light emitted and that be reflected is with the structural information of the thing of acquisition different depth.In this case, the stack light intensity can be detected by photodetector.
In frequency domain OCT (FD-OCT), also be reflected at the reference surface place by the second portion of the OCT measuring light of OCT light emitted.But reference surface needn't displacement obtain structural information with the different depth in thing.But, be separated into spectra part by spectrogrph on the synergetic smooth space, wherein for example detect spectra part by position sensitive detectors such as the CCD camera.By the spectrographic Fourier transform of the superimposed light that obtains, can obtain (Fourier domain OCT) along the structural information of the thing of depth direction.
The more variant of FD-OCT is frequency sweep OCT (SS-OCT).By changing the mean wavelength of OCT measuring light continuously, sequentially write down the spectrum of superimposed light with narrow bandwidth.Simultaneously, by using photodiode to write down superimposed light.
The OCT system can be specifically used for checking ante-chamber or the structure of back cavity or the retina of human eye of human eye.
According to an embodiment of the invention, the external coat measuring system also comprises at least one scanning mirror, and this scanning mirror is arranged between OCT light source and the OCT beam splitter pivotly, with scanning OCT measuring light on object area.The OCT system can also comprise the collimating optics device that is used to collimate the OCT measuring light that is generated by the OCT light source.By at least one scanning mirror that pivots, the OCT measuring light of collimation can be directed to the focusing OCT measuring beam on object area.Thus, can partly obtain structural information from the horizontal expansion of object area.System can comprise more than one scanning mirror, and such as two scanning mirrors, they can pivot around disalignment.
According to an embodiment of the invention, second battery of lens of described at least one scanning mirror, first optical sub-assembly and second optical sub-assembly be configured and be set to near the regional imaging of described at least one scanning mirror near on the zone of minute surface.As mentioned above, first optical module comprises first optical sub-assembly and second optical sub-assembly, and wherein first optical sub-assembly comprises second battery of lens.Second battery of lens and second optical sub-assembly of first optical sub-assembly can form afocal system, with will be near the regional imaging of scanning mirror near on the zone of minute surface.
Minute surface is arranged in the beam path of measuring light, between second battery of lens of first battery of lens of first optical sub-assembly and first optical sub-assembly, to analyze wave surface.For example can reflection measurement light as the minute surface of the part of collapsible reflector, make it pass other lens (such as at the microscopical object lens to the path of object area).For best adjustment system, the center of described at least one scanning mirror is by second battery of lens of first optical sub-assembly and be imaged onto the center of minute surface by second optical sub-assembly.Such optical imagery is handled the advantage that has and is that at the different pivot positions of described at least one scanning mirror, the OCT measuring light that the point from scanning mirror sends is imaged onto the point at the center of minute surface,, does not have light beam disperse (walk-off) that is.Thus, prevent that the OCT measuring light from can not clash into minute surface.Therefore, can design minute surface dimensionally more compactly.
Comprise in system under the situation of two scanning mirrors that are located at a distance from each other, system can design and adjust, make the mid point of the line between two scanning mirrors be imaged onto the center of minute surface particularly, perhaps be imaged onto the zone near minute surface at least, be positioned on the OCT beam path such as being imaged onto, one distance arranged, be at most on the zone of 100 times, 10 times of the minute surface breadth wise dimension or 2 times with the center of minute surface.Line is along the OCT beam path orientation of optical system, and optical system is made up of second battery of lens and second optical sub-assembly of first optical sub-assembly.The optics enlargement ratio of system can be depended on to the distance of minute surface in this zone, and optical system is made up of second battery of lens and second optical sub-assembly of first optical sub-assembly, makes distance increase with higher enlargement ratio.This dependency can be linear.
Can comprise spatial point near the zone of scanning mirror, these points have the distance that scans mirror to system, and the yardstick of the scanning mirror that this distance comprises than system particularly is little, particularly little by 1/10th, 1/5th or 1/2nd.
Can comprise having the spatial point of the distance along the OCT beam path to minute surface particularly near the zone of minute surface, this distance is littler by 1/10th than the yardstick of minute surface particularly, 1/5th or 1/2nd.Minute surface and OCT beam path can form the angle between 30 ° to 60 °.
According to an embodiment of the invention, the external coat measuring system also comprises the wave surface light source that is used to generate measuring light, this measuring light is used to analyze wave surface, wherein at least 80% of the overall strength of the measuring light that is generated is made up of to the light the 870nm at 800nm wavelength, particularly is made up of to the light the 840nm at 820nm wavelength.Measuring light can for example be generated by superluminescent diode (SLD).The measuring light of such wavelength is particularly suitable for passing human eye up to retina, makes it form the illumination speckle on retina.Then, after diffuse-reflectance, light leave eyes and according to its form of wave surface by the wavefront sensor inspection.Advantageously utilize the light of these wave-length coverages,, make the blind and patient's of patient the iris of eyes not shrink because this light do not discovered by patient's eyes.The iris that shrinks will damage measurement.
According to an embodiment of the invention, at least 80% of the overall strength of the OCT measuring light that is generated is made up of to the light the 1320nm at 1280nm wavelength, particularly is made up of to the light the 1320nm at 1300nm wavelength.The OCT measuring light of such wavelength be particularly suitable for entering eyes inner chamber the zone and by this regional reflex.Thus, can obtain structural information from inner chamber.In addition, can obtain back cavity and/or amphiblestroid structural information from eyes.
In order to be checked by OCT or to observe retina, 800nm is well suited for to the wave-length coverage between the 870nm, because this light arrives retina.In this case, the spectrum of wave surface light source and OCT light source can be overlapping, makes the wave-length coverage that at least 60%, particularly at least 80% 80% intensity that is positioned at the OCT measuring light of overall strength of the described measuring light be used for analyzing wave surface is positioned at.The measuring light that is used to analyze wave surface can comprise the basic wavelength identical with the OCT measuring light.In this case, can use single source, this light source generates measuring light and the OCT measuring light that is used to analyze wave surface.
According to the embodiment of the present invention, be used for the measuring light of wave surface analysis and at least 70%, particularly at least 90% intensity of OCT measuring light and be not positioned at overlapping wave-length coverage.Pass the optics of external coat measuring system or intersect with it although be used for the measuring light of wave surface analysis and OCT measuring light, these measuring light for example by recombination dichroic elements because their different wave-length coverages and separated from one another.The optics that measuring light and its interaction or measuring light are passed for example can be first optical module; Also can be second optical module particularly.Thus, prevent that the measurement of wave surface from influencing the measurement of OCT system.But two measuring light can comprise that common wave-length coverage and their spectrum can be overlapping to a great extent.
According to an embodiment of the invention, the OCT beam splitter comprises dichroic mirror, wherein dichroic mirror in the absorbance of 800nm in the wave-length coverage between the 870nm, particularly be in the absorbance of 1280nm in the wave-length coverage between the 1340nm, particularly high or to mostly high to the absorbance in the wave-length coverage between the 840nm in the twice at least of the absorbance of 1300nm in the wave-length coverage between the 1320nm at 820nm.
According to the embodiment of the present invention, be used for measuring light that wave surface analyzes or OCT measure light intensity at least 80% by the transmission of OCT beam splitter.
According to an embodiment of the invention, the OCT beam splitter comprises dichroic mirror, wherein dichroic mirror at the reflectance of 1280nm in the wave-length coverage between the 1340nm, particularly be at the reflectance of 800nm in the wave-length coverage between the 870nm, particularly high or to mostly high to the reflectance in the wave-length coverage between the 1320nm in the twice at least of the reflectance of 820nm in the wave-length coverage between the 840nm at 1300nm.
According to an embodiment of the invention, be used for measuring light that wave surface analyzes or OCT measure light intensity at least 80% by the OCT beam splitter reflection.
Dichroic mirror can be coated with the material layer with differing dielectric constant.These layers can be configured so that under the situation of measuring light bump dichroic mirror at the measuring light of the measuring light of reflection or transmission and the generating structure interference.
According to an embodiment of the invention, the OCT of bump OCT beam splitter measures the major part of light intensity, be in particular at least 70% is reflected at OCT beam splitter place.In this is handled, the major part of the measurement light intensity that is used for the wave surface analysis of bump OCT beam splitter, be in particular at least 70% at OCT beam splitter place by transmission.
Description of drawings
With reference to accompanying drawing, describe the specific embodiment of the present invention in detail.The similar components that provides in different embodiments is to have the identical labelling indication of different letters as suffix.Thus, can obtain the description that lacks of the element of different embodiments according to the description of the element of an embodiment.
Figure 1A schematically shows an embodiment of optical measuring system of the present invention, and illuminating bundle path or wave surface beam path wherein are shown respectively;
Figure 1B is illustrated schematically in the embodiment shown in Figure 1A, the path of object beam shown in it;
Fig. 1 C schematically shows the part at the embodiment shown in Figure 1A and Figure 1B of optical measuring system;
Fig. 2 A schematically shows another embodiment according to optical measuring system of the present invention, and illuminating bundle path or wave surface beam path wherein are shown respectively;
Fig. 2 B is illustrated schematically in the embodiment shown in Fig. 2 A, the path of object beam shown in it;
Fig. 3 schematically shows another embodiment according to optical measuring system of the present invention;
Fig. 4 schematically shows another embodiment according to optical measuring system of the present invention;
Fig. 5 A schematically shows another embodiment according to optical measuring system of the present invention, and illuminating bundle path or wave surface beam path wherein are shown respectively;
Fig. 5 B is illustrated schematically in the embodiment shown in Fig. 5 A, the path of object beam shown in it;
Fig. 6 illustrates the optical measuring system of another embodiment according to the present invention, and OCT measuring beam path wherein is shown particularly; With
Fig. 7 illustrates the optical measuring system of another embodiment according to the present invention, and the OCT beam path wherein is shown particularly.
The specific embodiment
Figure 1A schematically shows the optical measuring system 1 according to one embodiment of the present invention.Measuring system 1 comprises light source 3, and light source 3 generates measuring light 5.Measuring light 5 is by collimating optics device 7 collimations, and to generate measuring light 9, measuring light 9 roughly is made up of plane front.Measuring light 9 is reflected at beam splitter 11 places and passes attaching components 13.Passed hole 15 and reached 180 ° by reflector 17 deflections by the measuring light that attaching components 13 is assembled, reflector 17 comprises two minute surfaces 17 ' and 17 ", minute surface 17 ' and 17 " is orientated orthogonally.Measuring light 9 is in roughly opposite direction upper deflecting and displacement in a lateral direction thus, promptly at the direction top offset perpendicular to the direction of propagation of measuring light 9.
In other embodiment, reflector 17 can be prism of corner cube (corner cube).Prism of corner cube comprise make by glass, have a main body of three incline tapereds.Pyramidal outer surface is made up of isosceles right triangle, wherein these leg-of-mutton each to with being perpendicular to one another the orientation.In addition, prism of corner cube comprises basal surface, and this basal surface is an isosceles triangle.Be used at prism of corner cube under the situation of measuring system, measuring light 9 is reflected three isosceles right triangle surfaces.
Reflector 17 can be by double-head arrow 20 indicated direction top offsets.Hole 15 is arranged in the focal zone of attaching components 13, and is irrelevant with the displaced position of reflector 17.
Measuring light 9 by reflector 17 reflections is passed attaching components 19, forms the measuring light of assembling thus.In plane 21, measuring light 9 roughly converges to point, cross part (crossover), also continues as the measuring light of dispersing.The measuring light 19 of dispersing is passed another attaching components 23 and is changed plane front into.Plane survey light 9 passes quarter wave plate 24, and clashes into eyes 25 with the form of plane front.The pupil of eye 25 is arranged in object plane 28.The image of iris is called the pupil of eyes 25.Usually pupil is positioned at about 2.7 to 3 millimeters places behind the summit of cornea 33.In this embodiment, object plane 28 is positioned at 29 places, focal plane of first optical module 31, and first optical module 31 is made up of attaching components 23 and attaching components 19.Therefore, the pupil of eyes 25 is arranged in focal plane 29.
Measuring light 9 is passed the cornea 33 and the crystalline lens 35 of eyes 25, and focuses on the speckle 37 on the retina 39.At beam splitter 22 places, measuring light is made up of plane front, promptly by a parallel ray beam Shu Zucheng.When optics only relative to each other was in a fixed position under emmetropic eyes do not have the situation of spherical aberration, measuring light was imaged on the speckle 37 on the retina of eyes 25.In this case, reflector is positioned as, and makes that the total system that is made up of three optical modules 23,19 and 13 is an afocal system.But, have at eyes under the situation of spherical aberration, can make reflector 17 or prism of corner cube 17 along by double-head arrow 20 indicated direction displacements respectively, be incident on measuring light of assembling slightly 9 on the eyes 25 or the light of dispersing slightly 9 with generation.Thus, even have at eyes under the situation of spherical aberration, also can on retina, generate the as far as possible little illumination speckle of measuring light.Make prism of corner cube 17 displacements by the edge by double-head arrow 20 indicated directions, the light path of the measuring light between attaching components 13 and the attaching components 19 changes.Therefore, be positioned under the situation of certain limit in the spherical aberration of eyes 25, measuring light 9 can focus on the point on the retina 39 of ametropic eye 15.
Illumination speckle 37 is the scattering light sources on the retina 39 of eyes 25 of emission light 41, and light 41 is made up of spherical wave front roughly.Light 41 passes vitreous body, crystalline lens 35 and cornea 33, and forms light 43.According to the optical property and the shape of crystalline lens 35 and cornea 33, the wave surface of light 43 departs from plane front.The form that forms the wave surface of light 43 is represented the interface of the ametropia or the eyes 25 of optics, promptly particularly represents the character and the shape of crystalline lens 35 and cornea 33.
Light 43 passes attaching components 23 and forms converging light.Form therein in the area of space on plane 21 of amphiblestroid image, light 43 is farthest assembled, is dispersed subsequently.In addition, measuring light 43 is passed attaching components 19, and device 17 reflection and the lateral displacements that are reflected pass hole 15, pass attaching components 13 and form the light of roughly being made up of plane front.The wave surface of measuring light 43 departs from the ametropia that plane front is represented eyes 25.
Measuring light 43 enter Shack-Hartmann pick off 47 enter the zone 45.Enter zone 45 and form, wherein in lenticular confocal, be provided with electronic imaging pick off such as the CCD camera chip by microlens array.The electronic imaging pick off comprises a plurality of pixels, and each pixel is converted to the signal of telecommunication with the intensity level of incident illumination.The signal of telecommunication is transferred to unshowned processing unit by data wire 49.At each lenticule in the microlens array of Shack-Hartmann pick off 47, processing unit is determined the displaced position by the light of corresponding lenticule focusing.Thus, can determine form in the wave surface that enters the measuring light 43 of zone in 45 of Shack-Hartmann pick off 47.With reference to Figure 1B, regional imaging the entering on the zone 45 to Shack-Hartmann pick off 47 of focal plane 29 described.Thus, can determine from the form of the wave surface of the light 43 of eyes 25 emission.With reference to Figure 1B, the more character and the advantage of optical measuring system 1 described.The pupil of the eyes 25 in object plane 28 is arranged in the focal plane 29 of first optical module 31, and first optical module 31 is made up of attaching components 23 and 19.Three light beam 53a, 53b and the focus 53 of 53c from focal plane 29 are sent along the object beam path, pass quarter wave plate 24 and attaching components 23, and farthest are focused in the intermediate image zone 55.Light beam 53 sends from middle image-region 55 with divergent beams, passes attaching components 19 and penetrates from attaching components 19 with light beam 53a ', the 53b ' of almost parallel, 53c '.Parallel light beam 53a ', 53b ', 53c ' pass hole 15 by reflector 17 reflection and lateral displacements, pass attaching components 13 and focus on a bit after passing beam splitter 11.This is limited by the optical axis of measuring system 1 and the zone 45 that enters of Shack-Hartmann pick off 47.What thus, the point in focal plane 29 was imaged onto Shack-Hartmann pick off 47 enters the point of zone in 45.Prism of corner cube does not change this imaging character along the displacement of double-head arrow 20 indicated directions, because the light beam that the point from focal plane 29 sends is parallel-oriented between attaching components 19 and attaching components 13, wherein reflector 17 is arranged in the beam path.Therefore, the form of the wave surface that penetrates from ametropic eye or emmetropia can be checked accurately.
Fig. 1 C schematically shows the part of the optical measuring system 1 of the embodiment that schematically shows according to Figure 1A of the present invention and Fig. 2 B.Light beam 53a, 53b and 53c send from focus 51, pass attaching components 23 and focus on the intermediate image zone 55.Send and by attaching components 19 deflections from 55, three light beams of middle image-region, make to form three collimated light beam 53a ', 53b ' and 53c ', they and optical axis 10 are advanced abreast.Attaching components 23 and 19 forms first optical module 31, as mentioned above.The focal distance f of first optical module 31 can be determined as described belowly:
The light beam 53a ' parallel with optical axis 10 is extending on the direction of focal plane 29 and surpassing focal plane 29, as shown by dotted line 55a '.Therefore, be incident on first optical module 31 and the light beam 53b that changes light beam 53a ' after passing optical system 31 into extends beyond focal plane 29, as shown by dotted line 55a.Line 55a and line 55a ' intersect at a 57a.Point 57a is arranged in the principal plane 59 of first optical module 31.Principal plane 59 be positioned at apart from the focal plane 29 apart from the f place, focal plane 29 is parallel to principal plane 59.In principal plane, also there is similar anchor point 57c with some 57a, its mid point 57c is by line 55c ' and 55c is crossing limits.Therefore, light beam 53a and 53c show as respectively and reflect at a 57a or 57c place, and some 57a or 57c are arranged in principal plane 59.After passing first optical module 31, light beam 53a and 53c are parallel to optical axis and advance.
Light beam 53a ', 53b ' and 53c ' are reflected by prism of corner cube 17, as schematically show, and they focus on entering on the zone 45 of wavefront sensor 47 by attaching components 13.Enter zone 45 those surperficial formation by the most close attaching components 13 of lenticule 46.Object area 28 ' in the object plane 28 in the focal plane 29 of first optical module 31 therefore is imaged onto entering on the zone 45 of wavefront sensor 47.Each lenticule 46 has focal length 1.Distance 1 place that enters zone 45 at distance wavefront sensor 47 is provided with the CCD 48 that is used for light intensity is carried out the position sensing detection.As mentioned above, the form of the wave surface of the measuring light sent from object area 28 ' allow is determined in the detection of distribution of light intensity and analysis after this.Object area 28 ' in the focal plane 29 of first optical module 31 be positioned at apart from the optical surface of first optical module 31 apart from the d place, this optical surface optical surface that is the most close focal zone 29 wherein.In the illustrative embodiments that illustrates, approximately 2.5 times of focal distance f of first optical module 31 apart from d.
Optical measuring system 1 is particularly suitable for external coat, particularly the cataract surgery.Eye's cornea in the surgery or pupil are arranged on object area 28 ' and locate.Be 220 millimeters apart from d in illustrative embodiments 1 between the parts of eye's cornea in the surgery or pupil and first optical module 31.Therefore, the surgeon has enough work spaces, carries out surgical procedures with the hands that uses him.
The optical measuring system of the embodiment 1 shown in Figure 1A, 1B and 1C can be installed in the place, fixed position with respect to optical microscope system.For example, optical measuring system is supported on the upstream of sending the object lens of the optical microscope system the beam path of measuring light from examined object.In this embodiment, the measuring light of sending from object area 28 ' 43 can be by collapsible reflector 61 reflections that schematically show.After collapsible reflector 61 places reflections, measuring light is passed and is incident on the entering on the zone 45 of wavefront sensor 47 behind first optical module 31, and is reflected at prism of corner cube 17 places and passes attaching components 13.In Figure 1A and Figure 1B, indicate the position of collapsible reflector 61.Another part of the light that sends from object area 28 ' is by the object lens guiding of microscopic system, to carry out microscope imaging.Therefore, surgeon's analysis that can obtain the MIcrosope image of the thing in the surgery and carry out the wavefront form of the measuring light of sending from object area 28 '.According to embodiment, collapsible reflector 61 is near the object lens of microscopic system.Thus, free work space reduces as far as possible for a short time.
Fig. 2 A and Fig. 2 B schematically show the optical measuring system according to another embodiment of the present invention 1a.Some parts of optical measuring system 1a are similar to the parts in the optical measuring system 1 shown in Figure 1A, Figure 1B and Fig. 1 C.Thus, for the detailed description of these parts, the corresponding description of reference implementation mode 1.For example, the attaching components 19a of embodiment 1a and 13a are corresponding to the attaching components 19 and 13 of embodiment 1.In addition, the light source 3 of embodiment 1, collimating optics device 7 and wavefront sensor 47 are corresponding to light source 3a, collimating optics device 7a and wavefront sensor 47a.
Be different from the optical measuring system shown in Figure 1A, Figure 1B and Fig. 1 C and comprise the embodiment 1 of attaching components 23, comprise the battery of lens 23a that forms by lens combination 63a and lens combination 65a at the embodiment 1a shown in Fig. 2 A and Fig. 2 B.In addition, embodiment 1a does not comprise respectively reflector 17 or the prism of corner cube 17 as the situation of enforcement mode 1.But hole 15a, attaching components 13a, beam splitter 11a, collimating optics device 7a, light source 3a and wavefront sensor 47a relative to each other are arranged on fixed position, and can be together at direction top offset along the optical axis 10a of measuring system 1a.This by dashed box 67a illustrate, frame of broken lines 67a can be along by the direction displacement shown in the double-head arrow 69.As with reference to described at the embodiment 1 shown in Figure 1A, Figure 1B and Fig. 1 C, be incident on measuring light on the object area 28 ' attaching components 19 and 13 or 19a and 13a between separately the variation of the light path of the variation of light path and the measuring light 43 sent from object area 28 ' allow to be carried out the compensation of spherical aberration to examining eyes 25.The analysis of the wave surface of the measuring light of this compensation influence illumination and ejaculation eyes 25.Thus, can expand the range of dynamic measurement of wavefront sensor 47.
For this purpose in the embodiment, substituting provides movable unit 67a, by use reflector 17 or prism of corner cube 17 (as respectively according to corresponding manner shown in Figure 1A and Figure 1B) a kind of structure can be provided.Therefore, can not comprise reflector 17 as embodiment 1 in the optical measuring system shown in Figure 1A, Figure 1B and Fig. 1 C.On the contrary, member apertures 15, attaching components 13, beam splitter 11, collimating optics device 7, light source 3 and wavefront sensor 47 can relative to each other be supported on the place, fixed position, and be designed to can be together along optical axis 10 displacements, as according to corresponding manner shown in Fig. 2 A and Fig. 2 B.These parts can also be designed to not movable.Under the not movable situation of these parts, provide a kind of wavefront sensor 47, because when the eyes with spherical aberration are examined, can not carry out precompensation in this case with big dynamic range.
In the object area 28 ' among the object plane 28a in the 29a of focal plane, the cornea 33 or the pupil of the emmetropic eyes 25 that do not have spherical aberration is set.The light 5a that is generated by light source 3a is changed into the measuring light of roughly being made up of plane front 9 by collimating optics device 7a.By beam splitter 11a reflection, pass attaching components 13a, by hole 15a, by cross part, pass attaching components 19a, by the measuring light among the 21a of plane 9 cross part, pass lens combination 65a and pass lens combination 63a after, measuring light 9 is incident on eyes 25 with plane front.There is not the ametropic eye of spherical aberration measuring light 9 to be focused on the point 37 of retina 39 of eyes 25.From putting 37, the spherical wave front sends and penetrates eyes as have the measuring light 43 of plane front in object area 28 ' after passing vitreous body, crystalline lens 35 and cornea 33.Measuring light 43 is passed lens combination 63a, passes lens combination 65a, passes attaching components 19a, passes attaching components 13a and is passed beam splitter 11a and is incident on the wavefront sensor 47a.Here, the distribution of unshowned CCD detector recording light is with the form of the wave surface of the measuring light 43 determining to send from object area 28 '.
Operating distance d between the surface of the most close object area 28 ' of object area 28 ' and lens combination 63a approximately is three times of focal distance f of the first optical module 31a, and the first optical module 31a is made up of lens combination 63a, lens combination 65a and attaching components 19a.Therefore, the embodiment 1a of optical measuring system provides enough big operating distance d, thinks that carrying out surgical procedures provides enough free work spaces.
Fig. 2 B illustrates the embodiment 1a of optical measuring system, and the path of object beam shown in it, the beam path that promptly sends from object plane 28a are with more character of explanation measuring system 1a.The pupil of eyes 25 is arranged in the object plane 28 in the example that illustrates, and the example that illustrates is used to check the optical measuring system 1a of eyes 25.Therefore, the object beam path is corresponding to the pupil beam path.Light beam 53a, the 53b of the light 43 that sends from focus 51a and 53c change light beam 53a ", 53b " and 53c into by lens combination 63a ", light beam 53a ", 53b " and 53c " each optical axis 10a that is parallel to optical measuring system 1a advances.Focus 51a also is arranged in object area 28a '.Therefore, the principal plane 63a ' of lens combination 63a and the distance between the object area 28a ' equal the focal distance f (63a) of lens combination 63a.The focal distance f of lens combination 63a (63a) is roughly corresponding to the operating distance d between the surface of the most close object area 28a ' of object area 28a ' and lens combination 63a.Lens combination 65a and attaching components 19a are arranged on the optical axis 10 according to the distance of focal length sum (that is f (65a)+f (19a)) corresponding to them.Thus, lens combination 65a and attaching components 19a form so-called Kepler telescope.Kepler telescope is the example of afocal system, and it changes incident collimated light beam into the collimated light beam of outgoing.Therefore, collimated light beam 53a ", 53b " and 53c " change collimated light beam 53a ', 53b ' and 53c ' into by lens combination 65a and attaching components 19a.After light beam 53a ', 53b ' and 53c ' passed attaching components 13a, they focused on the regional 45a of entering of wavefront sensor 47a.Thus, object area 28a ' is imaged onto on the regional 45a of entering of wavefront sensor.Because the parallel beam between attaching components 19a and the attaching components 13a, such imaging is independent of the change of the light path of the measuring light between attaching components 19a and the attaching components 13a.Such change is by obtaining system's 67a displacement along arrow 69 indicated directions.
Fig. 3 illustrates another embodiment 1b according to optical measuring system of the present invention.Element 63b, 65b, 19b, 13b, 11b, 7b, 3b and 47b structure and orientation relative to each other roughly corresponds respectively at element 63a, 65a, 19a, 13a, 11a, 7a, 3a and the 47a shown in Fig. 2 A and Fig. 2 B.Compare with the embodiment of describing with shown so far, optical measuring system 1b also comprises lens element 71,73 and 75, they are set in sequence between the object area 28b ' and attaching components 19b of focal plane 29b of the first optical module 31b according to this, and the first optical module 31b is made up of lens combination 63b and lens combination 65b.Lens element 71 comprises 40 millimeters focal length, and lens element 73 comprises 18.5 millimeters focal length, and lens element 75 comprises 75 millimeters focal length.These lens elements 71,73 and 75 are set to check aphakic eye 25 (being eyes), and wherein lens have been removed and therefore omitted in Fig. 3.Light beam 43a, 43b and 43c are shown, and these light beams send and penetrate eyes 25 from the point 37 of the retina 39 of eyes 25.In the embodiment that illustrates, aphakic eye has 19 diopters.Send and represent that the light beam 43a, the 43b that disperse of spherical wave front and 43c are imaged onto on the regional 45b of entering of wavefront sensor with the parallel wave front by the optical imaging system of optical measuring system 1b from object area 28b '.Thus, can be by inserting lens element 71,73 and 75, with the range of dynamic measurement of further increase wavefront sensor 47, feasible even aphakic eye also can be checked according to sphere and aspheric surface aberration.Lens element 71,73 and 75 can also be arranged in the embodiment shown in Figure 1A, 1B, 1C, 2A and the 2B.
Fig. 4 illustrates another embodiment 1c according to optical measuring system of the present invention.Optical measuring system 1c comprises wave surface analytical system 77 and optical microscope system 79.Many parts of wave surface analytical system 77 have in Fig. 2 A structure and similar relative orientation similar with the optical measuring system 1a shown in Fig. 2 B.Therefore the detailed description of these parts is omitted.The lens combination 63a of optical measuring system 1a is the object lens 63c of the optical microscope system 79 in optical measuring system 1c still.In the embodiment shown in Fig. 4, object lens 63c has 53 millimeters diameter.That object area 28c ' from the focal plane 29c of the first optical module 31c that is made up of lens combination 19c, lens combination 65c and object lens 63c sends as collimated light beam, and light beam 43a, the 43b and the 43c that therefore form plane front after passing the first optical module 31c, attaching components 13c and beam splitter 11c, be incident on the wavefront sensor 47c with plane front.Collimated light beam that send from object area 28c ' and that therefore do not show plane front is incident on the wavefront sensor 47c with the nonplanar wave front.As mentioned above, the form of such nonplanar wave front can be by being distributed by wavefront sensor 47c detected intensity and determining by subsequent analysis.
In addition, optical measuring system 1c allows to obtain the MIcrosope image of object area 28c '.Point 51 among the object area 28c ' from the first optical module 31c focal plane 29c of (with object lens 63c) sends light beam 81 and 83. Light beam 81 and 83 forms three-dimensional viewpoin α.Light beam 81 passes the zone 85 of object lens 63c, and light beam 83 passes the zone 87 of object lens 63c, propagates as collimated light beam then.Then, light beam 81 passes panntographic system 89 and light beam 83 passes panntographic system 91.In the downstream of object lens 63c, can there be the eyepiece system and/or the camera that are used for object area 28c ' is imaged onto image-region.
In the embodiment that illustrates, amount to 20 centimetres apart from d between the surface of the object area 28c ' of the most close object lens 63c and the object area 28c '.In the embodiment that illustrates, this distance is corresponding to the focal distance f (63c) of object lens.More embodiment comprises the object lens of the focal length with 15 centimetres or 25 centimetres.The focal distance f of the optical module 31c that is made up of lens combination 19c, lens combination 65c and object lens 63c amounts to about 70 millimeters in the embodiment that illustrates.Thus, provide enough big work space for carrying out surgical procedures, wherein focal distance f is little a lot.
Among the embodiment 1c of optical measuring system shown in Figure 4, be used to analyze light 43a, the 43b of wave surface and the object lens 63c that 43c passes optical microscope system 79.Object lens 63c is passed in the zone 86 of object lens 63c, and this zone 86 is different from the zone 85 and 87 that light beam 81 and 83 passes through, and light beam 81 and 83 is used for microscope imaging.Be used to analyze light beam 43a, the 43b of wave surface and 43c by the other parts uncoupling of collapsible reflector 61c from optical microscope system 79.
As the alternative example to this method of uncoupling, light beam 43a, 43b and 43c can be by collapsible reflector 61c uncouplings between the object lens 63c of object area 28c ' and optical microscope system 79, and this is indicated by dotted line.Thus, the embodiment 1 of the optical measuring system shown in Figure 1A, 1B and the 1C can with optical microscope system 79 or with make up at the embodiment 1d shown in Fig. 5 A and Fig. 5 B.By collapsible reflector 61, this is illustrated among Figure 1A, Figure 1B, Fig. 5 A and Fig. 5 B.
Substitute the parts of simultaneous displacement by the frame 67c encirclement of wave surface analytical system 77, the light path between lens combination 19c and the attaching components 13c can change by movable prism of corner cube 17 (such as shown in Figure 1A, Figure 1B) is provided.Being examined this mode of precompensation of the spherical aberration of eyes can use in combination with the uncoupling of the uncoupling of the measuring light 47 with collapsible reflector 61c and the measuring light 43 by using collapsible reflector 61.
Optical measuring system 1c provide eyes to the surgeon ante-chamber MIcrosope image and allow to analyze the wave surface of the measuring light of sending from eyes simultaneously.Thus, by using wavefront sensor can carry out refractive accurate measurement.Because big work space, the wave surface analytical system needn't and needn't be inserted under its situation of needs in surgery operating period removal.Thus, handling simplification significantly and wave surface analytical system does not need to support pivotly.
Object area 28c ' also is arranged in the focal plane of object lens 63c.In the downstream of object lens 63c, parallel with 83 from the light beam 81 that the point 51 of object area 28c ' sends, this causes the more advantage at subsequent parts and microscope imaging.In the wave surface analytical system 77 of optical measuring system 1c, provide more poly-lens element 71,73 and 75 similarly with the embodiment 1b of optical measuring system shown in Figure 3, to analyze the wave surface that penetrates from aphakic eye.Therefore, can check have 14 diopters, the eyes of the spherical aberration of 19 diopters, 24 diopters and value therebetween.Under the situation that lens element 71,73 and 75 are not provided, the eyes that have at least in the-5dft spherical aberration in the scope the between+5dft can be examined by the light path that changes respectively between element 13 and 19,13a and 19a or 13c and the 19c.
Can substitute by Galilean telescope or another afocal system at the Kepler telescope that forms by lens combination 65a and attaching components 19a shown in Fig. 2 A and Fig. 2 B.
According to an embodiment, wavefront sensor enter the yardstick that the zone has 6.34mm*6.34mm.In alternative embodiment, can provide other yardsticks.Light source 3,3a, 3b and 3c generally include superluminescent diode respectively and are used as point source.In addition, optical measuring system 1c can be designed in such a way that light path is variable at the precompensation of spherical aberration.Can be used for the reflected light that will generate with the interactional optical element of polarisation of light and separate such as for example quarter wave plate or beam splitter (being configured to the polarized beam splitting device) with the measuring light that illumination speckle from retina 39 sends at the optical surface place.
Fig. 5 A and Fig. 5 B schematically show another embodiment according to optical measuring system 1d of the present invention.Illuminating bundle path or wave surface beam path are shown once more and in object beam path shown in Fig. 5 B in Fig. 5 A.Optical measuring system 1d comprised in this embodiment for the first optical module 31d of attaching components, be the second optical module 13d and the wavefront sensor 47d of attaching components in this embodiment.
In order to illuminate eyes 25, optical measuring system 1d also comprises the light source 3d that sends light 5d.Light 5d is converted to the measuring light 9 of convergence by beam-shaping optics 7d and focuses on the zone of hole 12d after beam splitter 11d place is reflected.Checking that hole 12d is arranged in the focal plane of attaching components 31d under the emmetropic situation.After passing attaching components 31d, measuring light 9 roughly comprises the plane front that is incident on the eyes 25.Behind the crystalline lens 35 that passes cornea 33, nature, measuring light 9 focuses on the point 37 of retina 39.
Light 41 sends and formation measuring light 43 behind crystalline lens 35 that passes nature and cornea 33 from putting 37.Under emmetropic situation, measuring light 43 roughly is made up of plane front.The pupil of human eye is arranged among the object plane 28d among the object area 28d '.Distance table between object plane 28d and the attaching components 31d is shown apart from d, and the focal length of attaching components 31d is expressed as apart from f in Fig. 5 A.Pass attaching components 31d from the measuring light 43 that object area 28d ' sends, by the cross part in the plane of hole 12d, pass beam splitter 11d, pass attaching components 13d and under emmetropic situation with the regional 45d that enters of plane front bump wavefront sensor 47d.
Attaching components 31d and attaching components 13d form afocal system, particularly Kepler system.In order to realize this target, attaching components 31d and attaching components 13d are provided with at a certain distance along optical axis 10d, and wherein this distance is corresponding to the focal length sum of attaching components 31d and attaching components 13d.
By the parts that indicated in double-head arrow 16d, surround by frame 14d along optical axis 10d displacement (promptly, light source 3d, beam-shaping optics 7d, beam splitter 11d and hole 12d), even can generate illumination speckle 37 on the retina 39 at eyes 25 under the confirmed situation of the eyes with spherical aberration with small scale.In this case, the measuring light of sending from object area 28d ' 43 be can't help the general plane wave surface and is formed.This also is the situation that is incident on the measuring light that enters regional 45d of wavefront sensor 47d.Therefore, the wavefront sensor 47d for using in embodiment 1d can measure the wave surface that has than small curve.
Fig. 5 B illustrates the object beam path of optical measuring system 1d.Point 28 among the object area 28d ' from object plane 28d " sends the some 45d ' in the zone of entering that light beam passes attaching components 31d, beam splitter 11d and attaching components 13d and clashes into wavefront sensor 47d.Be apparent that the focal distance f apart from d specific adhesion element 31d between attaching components 31d and the object plane 28d is many greatly.
Optical measuring system 1d can comprise collapsible reflector 61, and this collapsible reflector 61 allows with optical measuring system 1d and optical microscope system 79 combinations, as shown in FIG. 4.In Fig. 4, the position of collapsible reflector 61 schematically shows.
Fig. 6 schematically shows the optical measuring system 1e according to embodiment of the present invention.As shown in Figure 6, optical measuring system 1e is configured to also come examined object zone 28e ' by means of optical coherence tomography (OCT) by analysis from the wave surface that object area sends.For this effect, as shown in Figure 6, except in the measuring system 1 shown in Figure 1A and the 1B, optical measuring system 1e also comprises OCT system 93 and OCT beam splitter 95.OCT system 93 comprises OCT parts 97, and OCT parts 97 comprise the OCT light source that is used to generate OCT measuring light 99, the optical coupler that is used to separate and make up the OCT measuring light, reference mirror, spectrogrph, position sensitive detectors and analytical system.
The OCT light source sends OCT measuring light 99, and OCT measuring light 99 is passed collimating optics device 101 and entered scanner as collimation OCT measuring beam, and scanner comprises two scanning mirrors 103 and 105.Scanning mirror 103 and 105 can pivot around axle, and these axles are orientation with being perpendicular to one another, is used for the OCT measuring light 99 of scanning on object area 28e '.For illustrative purposes, element 97,101 and 103 shown in Figure 6, they tilt about the line between two scanning mirrors 103 and 105.OCT measuring light 99 can comprise the light of 1290nm to the wavelength between the 1330nm, as major part.
Fig. 6 illustrates three light beams of the OCT measuring light that reflects at the some A place of scanning mirror 105 when scanning mirror is positioned at three different pivoted position according to exemplary approach, three different pivot positions are by should obtaining by the pivot mirror around said pivot, and this pivotal axis intersects perpendicular to the paper planar orientation and with an A.The light beam of OCT measuring light 99 is incident on the OCT beam splitter 95 that comprises dichroic mirror 96.Dichroic mirror 96 comprises a plurality of layer on the minute surface that is deposited on dichroic mirror 96, and wherein these layers have different dielectric propertys, with reflect expeditiously incident OCT measuring light 99 and only transmission such as less than 30% fraction.OCT measuring light 99 is passed lens 19e after the reflection of dichroic mirror 96 places.For example, lens 19e can be designed as cemented lens and additional independent lens.Then, OCT measuring light 99 is passed cemented lens 23e.Cemented lens 23e and lens 19e form the first optical module 31e.The first optical module 31e is imaged onto some A ' between the first optical module 31e and the object area 28e ' with the some A at the center of scanning mirror 105, and the focus 51e of the first optical module 31e is arranged in object area 28e '.In like manner, the some P at the center of the line between scanning mirror 103 and the scanning mirror 105 is imaged onto a P ' by the first optical module 31e.In this position, optical fold formula reflector 61 can be located, and is used for deflection towards the OCT measuring light 99 of object area 28e ' propagation and the OCT measuring light of returning from object area 28e '.This may be favourable under the situation that optical measuring system 1e and optical microscope use in combination.In this case, collapsible reflector 61 can be arranged in the microscopical beam path between microscopical principal goods mirror and the object area 28e '.
Specifically, under these circumstances, advantageously, optical measuring system 1e will put P and be imaged onto the some P ' that is positioned on the collapsible reflector 61, because for the different pivot positions of mirror 103,105, some P ' minimizes from the discrete of center of collapsible reflector 61.Therefore, can design size on compact collapsible reflector 61, make to prevent the fuzzy of microscopical beam path.In order to realize this target, all the scanning mirror (being scanning mirror 103 and 105 in this case) of scanner must be provided with by as close as possible some P, and collapsible reflector 61 must as close as possible some P '.
Be incident on three difference places in the object area 28e ' corresponding to three light beams of the OCT measuring light of three different pivot positions of scanning mirror 105, in these some place's light beams and thing interaction, these points are arranged among the object area 28e '.In Fig. 6, three scanning elements only are shown.But by continuous pivot scanning mirror 103,105, whole object area 28e ' are scanned.
The OCT measuring light of sending from object area 28e ' the different layers in thing is reflected and comprises the structural information of examined object thus.The OCT measuring light 100 of reflection is passed attaching components 23e, lens 19e, and major part is in the reflection of dichroic mirror 96 places of OCT beam splitter 95.After scanning mirror 103,105 places were further reflected, the OCT measuring light of returning was passed collimating optics device 101 and is entered the optical fiber (this is not shown) of OCT parts 97.Then, the OCT measuring light of returning is superimposed upon reference light and detects by dispersion on the spectrogrph spectrum and by position sensitive detectors.The spectrum that interference is superimposed upon the OCT measuring light of returning on the reference light is handled with the horizontal object area 28e ' from examined object and is obtained structural information along depth direction (that is, perpendicular to object plane 28e).
As shown in Figure 1A and the 1B, such as the embodiment 1 of optical measuring system, also have optical measuring system 1e as shown in Figure 6 to comprise the aforesaid parts that are used to analyze wave surface.For the explanation in the reduced graph 6, be illustrated towards the beam path of the measuring light 9 of object area 28e ' guiding and the measuring light of returning 43 by attaching components 13e, lens 19e and attaching components 23e.These beam paths are shown in Figure 1A and the 1B, see from Figure 1A and 1B, in the embodiment of optical measuring system 1e also shown in Figure 6, object area 28e ', particularly the focus 51e of the first optical module 31e are imaged onto the regional 45e that enters of Shack-Hartmann pick off 47e.
Therefore, embodiment 1e is by analyzing the wave surface sent from object area and allowing to check simultaneously this object area 28e ' by obtaining the OCT structured data.Specifically, wave surface light source 3e can be configured so that the middle body of the measuring light that generated by light source 3e is positioned at the wave-length coverage of about 830nm to 870nm.OCT beam splitter 95, particularly its dichroic mirror 96 are designed to make the essential part of light of wave-length coverage of projection 830nm to 870nm.Thus, the OCT measuring light can be separated with being used to check the measuring light of wave surface, disturb to reduce.
According to another embodiment, not cremasteric reflex device 17e between lens 19e and attaching components 13e, make to be used for of optical axis (that is, the optical axis of the first optical module 31e) straightline propagation of the beam path of the measuring light 9,43 that wave surface analyzes, and be not deflected along attaching components 19e, 23e.
According to another embodiment of the present invention, OCT beam splitter 95 can be arranged between the second optical module 13e and the Shack-Hartmann pick off 45e, and not between the first optical module 31e and the second optical module 13e.This is indicated by frame of broken lines 95a.Therefore, OCT system 93 is depicted as the alternative of the frame of broken lines with label 93a.This embodiment is being favourable by using the OCT system from the situation of the rear portion acquisition structural information of eyes.When optical measuring system did not have reflector 17e, this of OCT beam splitter 95a or the 93a of OCT system was provided with and can uses particularly, as mentioned above.
Fig. 7 schematically shows the optical measuring system 1f of another embodiment according to the present invention.As shown in Figure 7, optical measuring system 1f designs according to the mode similar to the optical measuring system 1c shown in Fig. 4, and as for optical measuring system 1f, it also comprises the parts 67c and the microscopic system 79 of wave surface analytical system 77.Microscopic system 79 comprises the object lens 63c that is used for object area 28c ' imaging, and object area 28c ' are arranged in focal plane 29c after passing panntographic system 89,91.In addition, wave surface analytical system 77 is designed to make wave surface of sending from object area 28c ' or the wave surface of passing object area 28c ' can check according to their form, as described with reference to figure 4.
Except the function of the optical measuring system 1c that goes out as shown in Figure 4, the optical measuring system 1f shown in Fig. 7 also allows along depth direction, promptly checks the structure of object area 28c ' perpendicular to the direction of focal plane 29c by using the OCT 93a of system.For this reason, the 93a of OCT system comprises the parts similar to OCT system shown in Figure 6 93.
In Fig. 7, the beam path of the OCT measuring light 99a of schematically illustrated three different pivot positions at scanner, scanner is made up of scanning mirror 103a, 105a.For the purpose of simplifying the description, the OCT measuring light 99a that sends according to three different directions from the some P between scanning mirror 103a, the 105a is shown.Alternatively, at this P place, the center of 3D scanner can be set.Comprise at scanner under the situation of more than one mirror surface that some P is advantageously provided, and makes the distance minimization of the minute surface that obtains scanner.
The light beam of the OCT measuring light of sending from a P 99 is in dichroic mirror 96a reflection major part and pass afocal system (being made up of attaching components 19c and attaching components 65c), and is imaged onto a P ', puts the center that P ' is arranged on collapsible reflector 61c.Point P is by attaching components 19c (i.e. second optical sub-assembly of the first optical module 31c) and pass through attaching components 65c (promptly, second battery of lens of first optical sub-assembly of first optical module) be imaged onto a P ', some P ' is positioned at the center of collapsible reflector 61c.Therefore, at the different pivot positions of the scanner of forming by scanning mirror 103a, 105a, there be discrete to the minimum of a P '.Under the situation with 3D scanner of a reflecting surface only that is provided with ideally, expectation does not have light beam discrete.This allows collapsible reflector 61c compact on the design size, makes the beam path of microscope 81 and 83 can pass through collapsible reflector 61c, and enters in the corresponding panntographic system of stereo microscope system 79.
As alternative example to the setting of OCT beam splitter 95a shown in Fig. 7 and the 93a of OCT system, these parts or at least OCT beam splitter 95a can be arranged between attaching components 65c and the collapsible reflector 61c.
As alternative example to the embodiment shown in Fig. 6 and Fig. 7, OCT beam splitter 95,95a or dichroic mirror 96,96a can be designed in such a way that OCT measuring light 99,99a can by than the higher efficient of reflection by transmission.They can also be designed to the feasible measuring light 9 that is used for the measurement of wave surface and be reflected by the efficient higher than transmission.Therefore, in alternative embodiment, the space of wave surface system 77 and OCT system 93,93a is provided with and can exchanges.
According to other embodiment of the present invention, comprise that 70% wave-length coverage of the overall strength of OCT measuring light can be overlapping with 70% wave-length coverage of the overall strength that comprises the measuring light that is used to check wave surface.Thus, in order to check wave surface and, can to use the light of same wavelength ranges in order to use the inspection of OCT light.In this case, it is dispensable to have OCT beam splitter 95, the 95a of dichroic mirror 96,96a.In this case, advantageously, execution is used for determining the measurement of top wave surface and is used for by using OCT to determine the measurement of structure continuously.Thus, prevent to disturb.But, can also carry out two kinds of measurements simultaneously.The optical element with polarisation effect such as quarter wave plate can insert beam path.For example, element 11,11a, 11b, 11c, 11d, 11e can be configured to the polarized beam splitting device.
According to other embodiment, the light beam out-focus of OCT measuring light 99 arrives object area 28c ', 28e ', and focuses on darker zone, such as focusing on the retina of being examined eyes.

Claims (35)

1. external coat measuring system, this external coat measuring system comprises:
Wavefront sensor (47), it is used for characterizing the wavefront form that enter zone (45) of measuring light (43) at described wavefront sensor; With
Image optics device (13,19,23), it comprises described first optical module (31) and second optical module (13) that enters the zone that is used for by using described measuring light (43) object area (28 ') being imaged onto described wavefront sensor,
Wherein, below relation is set up: 1.1*f≤d,
Wherein:
F represents the focal length of described first optical module (31); With
D represents the distance between described object area (28 ') and described first optical module (31).
2. external coat measuring system according to claim 1, wherein, below relation is set up: 1.5*f≤d, particularly 2*f≤d.
3. external coat measuring system according to claim 1 and 2, wherein, below relation is set up: d 〉=150 millimeter, particularly d 〉=175 millimeter, especially particularly d 〉=190 millimeter.
4. according to any one described external coat measuring system in the claim 1 to 3, wherein, at least one in described first optical module (31) and described second optical module (13) is refractive optics assembly, particularly battery of lens.
5. according to any one described external coat measuring system in the claim 1 to 4, this external coat measuring system also comprises the 3rd optical module (89,91), described the 3rd optical module (89,91) is set up and is designed for described object area (28 ') is imaged onto on the image-region along the microscope beam path, and wherein said image-region is different from the described zone (45) that enters of described wavefront sensor.
6. according to any one described external coat measuring system in the claim 1 to 5, wherein, described object area (28 ') is arranged in the focal zone (29) of described first optical module.
7. external coat measuring system according to claim 6, wherein, described first optical module comprises first optical sub-assembly (23) and second optical sub-assembly (19) that is provided with at a distance from each other.
8. according to claim 6 or 7 described external coat measuring systems, wherein, described measuring light is along light path that the beam path passed (OP of described measuring light between described first optical module (31) and described second optical module (13); OP 1, OP 2) be variable.
9. external coat measuring system according to claim 8, wherein, described external coat measuring system is designed to: by changing the described light path (OP between described first optical module (31) and described second optical module (13); OP 1, OP 2), can characterize from be arranged on described object area (28 ') and have-form of the wave surface of the measuring light that 5dpt sends to the eyes of the ametropia the+25dpt.
10. according to Claim 8 or 9 described external coat measuring systems, this external coat measuring system comprises that also being used for the described measuring light of deflection described measuring light, particularly deflection reaches 180 ° reflector, wherein said reflector is arranged in the described beam path of described measuring light movablely, between described first optical module (31) and described second optical module (13), to change the light path that passes of described measuring light.
11. external coat measuring system according to claim 10, wherein, described reflector comprises at least two minute surfaces that are provided with according to the angle that is different from 0.
12. external coat measuring system according to claim 10, wherein, described reflector comprises retroreflector (17), particularly prism of corner cube.
13. according to any one described external coat measuring system in the claim 6 to 12, this external coat measuring system also comprises beam splitter (11), and described beam splitter (11) is arranged in the described beam path of described measuring light, the described of described wavefront sensor (47) enters between zone (45) and described second optical module (13).
14. according to the bonded claim 7 to 13 of claim 7 in any one described external coat measuring system, wherein, below relation is set up:
d(1，2)≥f1*d(d-f1)，
Wherein:
Distance between the parts of d (1,2) described first optical sub-assembly of expression (23) and the parts of described second optical sub-assembly (19), and
F1 represents the focal length of described first optical sub-assembly (23).
15. according to the bonded claim 7 to 14 of claim 7 in any one described external coat measuring system, wherein, described first optical sub-assembly (23) comprises first battery of lens (63c), object lens particularly, and described first optical sub-assembly (23) also comprises second battery of lens (65c), and described second battery of lens (65c) is set at a distance of described first battery of lens (63c) a distance.
16. according to the described external coat measuring system of the bonded claim 15 of claim 5, wherein, described microscope beam path passes described first battery of lens (63c) of described first optical sub-assembly, and wherein said the 3rd optical module comprises panntographic system (89,91).
17. according to claim 15 or 16 described external coat measuring systems, wherein, in the described beam path of described measuring light, between described first battery of lens (63c) of described first optical sub-assembly (23c) and described second battery of lens (65c), be provided with minute surface (61c).
18. according to any one described external coat measuring system in the claim 15 to 17, wherein, described second battery of lens (65c) and described second optical sub-assembly (19c) of described first optical sub-assembly form afocal system, particularly Kepler system together.
19. according to any one described external coat measuring system in the claim 15 to 18, wherein, described object area is arranged in the focal zone of described first battery of lens (63c) of described first optical sub-assembly (23c).
20. according to the bonded claim 6 to 14 of claim 5 in any one described external coat measuring system, wherein, described the 3rd optical module comprises object lens (63c) and panntographic system (89,91), the described beam path of wherein said measuring light does not cross described object lens, and wherein in the described beam path of described measuring light, between described object area (28c ') and described first optical sub-assembly (23c), be provided with minute surface (61).
21. external coat measuring system according to claim 20, wherein, described object area is arranged in the focal zone of described object lens.
22. according to any one described external coat measuring system in the claim 1 to 5, wherein, described object area (28d ') is different from the focal zone (29d) of described first optical module (31d).
23. external coat measuring system according to claim 22, wherein, described first optical module (31d) and described second optical module (13d) form afocal system, particularly Kepler system.
24. according to claim 22 or 23 described external coat measuring systems, wherein, in the described beam path of described measuring light, between described first optical module (31d) and described second optical module (13d), be provided with beam splitter (11d) movablely.
25., wherein, between described first optical module (31d) and described object area (28d '), be provided with minute surface (61) according to any one described external coat measuring system in the claim 22 to 24.
26. according to any one described external coat measuring system in the aforesaid right requirement, this external coat measuring system also comprises the OCT system, this OCT system has the OCT light source that is used to generate the OCT measuring light, wherein in the OCT of described OCT measuring light beam path, between described first optical module (31) and described second optical module (13) or described the entering between the zone (45) of described second optical module (13) and described wavefront sensor, be provided with the OCT beam splitter, make described OCT measuring light be directed at least by described first optical module (31) to illuminate described object area (28d ').
27. external coat measuring system according to claim 26, this external coat measuring system also comprises at least one pivotable scanning mirror, and described scanning mirror is arranged in the described OCT beam path, between described OCT light source and the described OCT beam splitter.
28. according to claim 15 and the described external coat measuring system of the bonded claim 27 of claim 17, wherein, described second battery of lens (65c) of described scanning mirror, described first optical sub-assembly (23) and described second optical sub-assembly (19c) are designed and are arranged so that the regional imaging near described scanning mirror is arrived near on the zone of described minute surface (61c).
29. according to any one described external coat measuring system in the claim 1 to 28, this external coat measuring system also comprises the wave surface light source that is used to generate described measuring light (9), wherein at least 80% of the overall strength of the measuring light that is generated is made up of to the light the 870nm at 800nm wavelength, particularly is made up of to the light the 840nm at 820nm wavelength.
30. according to any one described external coat measuring system in the claim 26 to 29, wherein, at least 80% of the overall strength of the OCT measuring light that is generated is made up of to the light the 1320nm at 1280nm wavelength, particularly is made up of to the light the 1320nm at 1300nm wavelength.
31. according to any one described external coat measuring system in the claim 26 to 30, wherein, described OCT beam splitter comprises dichroic mirror, wherein said OCT beam splitter in the absorbance of 800nm in the wave-length coverage between the 870nm, particularly be in the absorbance of 1280nm in the wave-length coverage between the 1340nm, particularly high or to mostly high to the absorbance in the wave-length coverage between the 840nm in the twice at least of the absorbance of 1300nm in the wave-length coverage between the 1320nm at 820nm.
32. according to any one described external coat measuring system in the claim 26 to 31, wherein, described OCT beam splitter comprises dichroic mirror, wherein said dichroic mirror at the reflectance of 1280nm in the wave-length coverage between the 1340nm, particularly be at the reflectance of 800nm in the wave-length coverage between the 870nm, particularly high or to mostly high to the reflectance in the wave-length coverage between the 1320nm in the twice at least of the reflectance of 820nm in the wave-length coverage between the 840nm at 1300nm.
33. according to any one described external coat measuring system in the claim 26 to 32, wherein, at least 70% the intensity that is incident on OCT measuring light on the described OCT beam splitter is reflected at described OCT beam splitter place.
34. according to any one described external coat measuring system in the claim 26 to 33, wherein, at least 70% the intensity transmission that is incident on described measuring light (9) on the described OCT beam splitter is by described OCT beam splitter.
35. according to any one described external coat measuring system in the claim 26 to 34, wherein, at least 60%, particularly at least 80% of the overall strength of described measuring light (9) is made up of the light of 80% wave-length coverage that is arranged in of the overall strength of described OCT measuring light.
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