CN109696742A - Microscope - Google Patents
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- CN109696742A CN109696742A CN201811212148.6A CN201811212148A CN109696742A CN 109696742 A CN109696742 A CN 109696742A CN 201811212148 A CN201811212148 A CN 201811212148A CN 109696742 A CN109696742 A CN 109696742A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/06—Means for illuminating specimens
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B3/00—Apparatus for testing the eyes; Instruments for examining the eyes
- A61B3/10—Objective types, i.e. instruments for examining the eyes independent of the patients' perceptions or reactions
- A61B3/13—Ophthalmic microscopes
- A61B3/132—Ophthalmic microscopes in binocular arrangement
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
- G02B21/0012—Surgical microscopes
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/18—Arrangements with more than one light path, e.g. for comparing two specimens
- G02B21/20—Binocular arrangements
- G02B21/22—Stereoscopic arrangements
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- Surgery (AREA)
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- Engineering & Computer Science (AREA)
- Heart & Thoracic Surgery (AREA)
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- Ophthalmology & Optometry (AREA)
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- Microscoopes, Condenser (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
A kind of microscope, include the observation optical path with principal goods mirror, Wavefront measuring apparatus with the first detection optical path and the first illumination path, first and second optical device groups, the beam splitter being arranged between first and second optical device group and the lighting device with the second illumination path, wherein the first detection optical path includes principal goods mirror, first optical device group, the beam splitter and the second optical device group as reflecting element between first and second optical device group, and principal goods mirror and the first and second optical device groups collectively form the first detection optical path without burnt imaging optical system, wherein the first illumination path includes the beam splitter, first optical device group, principal goods mirror, and the second optical device group is not included, and the first optical device group is directed toward via the beam splitter for the illumination beam of Wavefront measuring apparatus, and wherein second shines Mingguang City road includes between first and second optical device group as the beam splitter of transmissive element, the first optical device group and principal goods mirror.
Description
Cross reference to related applications
This application claims the German patent applications number 10 2,017 124 547.2 submitted on October 20th, 2017
Priority, wherein all the contents of the application are incorporated herein by reference.
Technical field
The present invention relates to a kind of microscopes with the observation optical path with principal goods mirror, and wherein the microscope is particular formed as
Surgical operation microscope.
Background technique
This microscope and especially this surgical operation microscope are had increasing need for, for carrying out various diagnosis during surgery
It checks (such as imaging method or dioptrometry).However for example during operation, thus needed for individual equipment can significant shadow
Ring working environment and workflow.
Summary of the invention
Based on this point, therefore the object of the present invention is to provide a kind of with the micro- of the observation optical path with principal goods mirror
Mirror, the microscope provide at least one additional measurement function and at the same time being formed as compact.
The present invention is defined in claim 1.Scheme is advantageously improved to provide in the dependent claims.
Microscope according to the present invention may include: observation optical path with principal goods mirror, have the first detection optical path and
The Wavefront measuring apparatus of first illumination path, the first and second optical device groups, be arranged in first and second optical device group it
Between the first beam splitter (hereinafter also referred to wavefront beam splitter) and the lighting device with the second illumination path.First detection
Optical path may include principal goods mirror, the first optical device group, the first beam splitter and the second optical device as reflecting element
Group, wherein principal goods mirror and the first and second optical device groups collectively form the first detection optical path without burnt imaging optical system.The
One illumination path may include the first beam splitter, the first optical device group and principal goods mirror.In particular, the first illumination path can be with
Not comprising the second optical device group, so that the illumination beam of Wavefront measuring apparatus can be directed toward first via the first beam splitter
Optical device group.The illumination beam for being accordingly used in wavefront measurement is not passed through the second optical device group, to want in an advantageous manner
The optical boundary face passed through is less, be likely to occur at these optical boundary faces may have an adverse effect to wavefront measurement it is anti-
It penetrates.Therefore the first illumination beam of Wavefront measuring apparatus can will be used micro- by the first optical device group and principal goods mirror direction
The sample of spectroscopy.
In addition, the second illumination path may include the first beam splitter as transmissive element, the first optical device group and
Principal goods mirror.
Since principal goods mirror and the first beam splitter are the composition portions of the first detection optical path and the first and second illumination paths
Point, therefore can be in part with same optical element for the first detection optical path and two illumination paths, this is realized
The structure of compact.
Furthermore the first beam splitter is used as reflecting element in the first detection optical path, with alternatively possible transmission purposes phase
Than this realizes better optical imaging properties, because just without flat in the region of the first beam splitter in detection optical path
Capable ray trend.However this is not a problem for the reflection purposes of the first beam splitter.If in the first detection optical path
First beam splitter is used as transmissive element, then undesirable aberration may cause by the channel of the first beam splitter
(Abbildungsfehler), these aberrations are difficult to correct or can only expend with high optics to be corrected.
First detection optical path can be formed as Kepler telescope without burnt imaging optical system, wherein principal goods mirror and first
Optical device group forms the object lens of Kepler telescope, and the second optical device group forms the eyepiece of Kepler telescope.In addition,
The object lens and eyepiece of Kepler telescope can be formed as the coincidence of its focus.
The ray (such as from visible spectrum) of lighting device can be via between first and second optical device group
One beam splitter is coupled into, so that ray is directed toward via the first optical device group and principal goods mirror (and without second optical device group)
Sample to be checked.Lighting device can be particular formed as coaxial lighting device.
In particular, same first beam splitter between first and second optical device group can be used for Wavefront measuring apparatus
Illumination beam and the illumination beam of lighting device turn to the first optical device group, allow these rays by the first optics
Device group and principal goods mirror are directed toward sample to be checked or object to be checked.Therefore, the first optical device group and principal goods mirror are used as
The sub- optical system of shared first.
The second beam splitter (hereinafter also referred to illumination beamsplitter or other beam splitters) can be provided, which makes to shine
The illumination beam of bright device and the illumination beam of Wavefront measuring apparatus are Chong Die and be turned around the first beam splitter.Preferably,
The front of two beam splitters provides the second sub- optical system for the illumination beam of Wavefront measuring apparatus and is directed to lighting device
Illumination beam provides the sub- optical system of third, so as to provide desired photocurrent versus light intensity, these photocurrent versus light intensities are for wavefront
It is different for the illumination beam of measuring device and the illumination beam of lighting device.
So if from visible spectral regions (400-700nm) ray to uniformly and by color school light field at
Picture, then being advantageous for the illumination beam of lighting device.This can be disappeared by light source to the achromatism-of infinite point
Spherical aberration is imaged to realize.(by the light field edge in color school) is imaged followed by the achromatism of light field aperture to object plane.
For for example can be in the illumination beam of the Wavefront measuring apparatus near infrared range (770-870nm), micro-
There should be plane wave in the focal plane of mirror.In detection side, which should be imaged and be detected in a manner of diffraction limited.
In a microscope in accordance with the invention, the first illumination path may include the first beam splitter as transmissive element.
In addition, the second beam splitter can be arranged in except the first detection optical path.In particular, the second beam splitter is the first and second illumination paths
Component part.Preferably, the second beam splitter is reflecting element in the first illumination path, and is in the second illumination path
Penetrate element.
In particular, the second beam splitter can be dichroic beam splitters.Therefore, the illumination beam of lighting device can be in visible wave
In long range and therefore it is preferably in the range of 400-700nm.The illumination beam of wavefront measurement can be for example in near-infrared
In range (such as 770 to 870nm) or in the infra-red range of longer wavelength.
Microscope according to the present invention may include OCT device and third optical device with the second detection optical path
Group, wherein the second detection optical path includes first to third optical device group, which constitutes the nothing of the second detection optical path
Burnt imaging optical system.
Second beam splitter can be arranged in except the second detection optical path.
Second detection optical path can be formed as Kepler telescope without burnt imaging optical system, wherein the first and second light
It learns device group and collectively forms object lens, and third optical device group constitutes eyepiece.Therefore, object lens and eyepiece can be designed to its coke
Point is overlapped.
It may also be said that two Kepler telescopes of two detection optical paths are nested among each other.
In addition, two of two detection optical paths are formed so that the middle graph of the second detection optical path without burnt imaging optical system
As plane is between second and third optical device group.
Third beam splitter (hereinafter also referred to detection beam splitter) can be arranged between second and third optical device group, it should
Third beam splitter separates first and second detection optical path.Third beam splitter can be formed such that presence is permanently separated from, thus
Always two detection optical paths can be used to measure.This for example by dichroic beam splitters or can be formed as partially transparent mirror
The beam splitter of son is realized.Also it is possible that make third beam splitter be formed as reflection first detection optical path light and thoroughly
Penetrate the light of the second detection optical path.For this purpose, third beam splitter is formed as mirror, which has in the range of the light of the second optical path
There is hole or is formed as transparent.If the intermediate image plane of the second optical path between second and third optical device group,
This point can be so realized especially goodly.Certainly, third beam splitter almost can also be constituted inversely.In this case,
The only light of the second detection of reflection optical path and the light of transmission the first detection optical path.For this purpose, beam splitter is formed as small mirror, the small mirror
Son only reflects the light of the second optical path.If second detection optical path intermediate image plane be located at second with third optical device group it
Between, then it can particularly advantageously realize this point.
In addition, third beam splitter can be formed as interim beam splitter, two states can be switched to, wherein at both
Light is conducted in the first detection optical path in the first state of state, and light is visited second in the second state of both states
It surveys in optical path and is conducted.This can for example realize that the mirror can be switched to instead by the mirror with electrochromic layer
It penetrates and transmissive state.Furthermore such mirror can be provided, i.e., its be located in one of both states second with
In optical path between third optical device group, and it is located between second and third optical device group in the second state
Optical path except.Therefore it provides a kind of movable or moveable mirror.The movement can be translational motion and/or pivot fortune
Dynamic (or rotary motion).
In addition, the aperture diaphragm for the first detection optical path can be arranged between first and second optical device group.
First sub- optical system (principal goods mirror and the first optical device group) may apply the illumination beam of lighting device
Add aberration, but these aberrations can be corrected by the sub- optical system of third, so that meeting the requirement to lighting device.
Then, the second optical device group is designed to the aberration of the first sub- optical system of compensation wavefront measurement.Thing
Real example is bright, can be realized correction good enough having very high requirement even if in wavefront measurement.
First detection optical path can prejudicially extend through principal goods mirror (and in due course prejudicially pass through first and second
Optical device group).Therefore, the optimum position in lighting device can be positioned in for the illumination reflection aperture of lighting device
On.
In the case where the first detection optical path is eccentric advantageously, arranging aperture between first and second optical device group
Boundary of the aperture as the assessment pupil of wavefront.In addition, the detection direction at the first beam splitter rear, can arrange useful
In the long pass filter of wavefront measurement axial length and OCT measurement axial length, to inhibit interference light.
In particular, lighting device can be formed in a manner of identical with the lighting device 120 of 1 918 756 B1 of EP.?
This is referring especially to Fig. 1 to Fig. 5 and related description.
In particular, the microscope can be formed to have the solid of two observation optical paths (for example, visual observation optical path)
Microscope.Furthermore the microscope can have eyepiece in observation optical path (or in every observation optical path).In addition, the microscope
It can be formed as surgical operation microscope.Preferably as the surgical operation microscope for ophthalmologic operation.
In a microscope in accordance with the invention, the first and second detection optical paths can prejudicially extend through principal goods mirror (simultaneously
And in due course pass through first, second and/or the sub- optical system of third).Therefore for example for the illumination reflected light of coaxial-illuminating
Circle can be positioned on optimum position.
It is self-evident, these above-mentioned features and will can not only be in the group provided in feature described below
It uses, but also in other combinations or can be used alone in conjunction, without departing from the scope of the present invention.
Detailed description of the invention
Below with reference to the accompanying drawings the present invention is explained further by means of embodiment, attached drawing also discloses necessary to the present invention
Feature.These embodiments are merely to illustrate, and should not be construed as restrictive.For example, to the reality with multiple element or component
The explanation for applying example should not be construed are as follows: need to realize all these elements or component.But other embodiments also may include replacing
The element and component in generation, less element or component or additional element or component.Unless otherwise stated, various implementations
The element or component of example can be combined with each other.It is readily applicable to for modifications and variations described in one of embodiment
His embodiment.In order to avoid repeating, the element that is identical or corresponding to each other in different attached drawings is denoted by the same reference numerals
And it no longer explains repeatedly.In attached drawing:
Fig. 1 shows the schematic diagram of the embodiment of microscope 1 according to the present invention；
Fig. 2 shows the microscopical top views from Fig. 1；
Fig. 3 shows top view according to fig. 2, depicts OCT light beam wherein (not scanning) among field；
Fig. 4 shows top view according to fig. 2, wherein depicting the detection optical path of Wavefront measuring apparatus；
Fig. 5 shows the diagram according to Fig. 3, wherein depicting the third beam splitter 22 in its second position；
Fig. 6 shows the schematic diagram of the second optical device group 14, third beam splitter 22 and Shack-Hartmann sensor 23, with
For explaining the spatial proximity of these elements, and
Fig. 7 shows the substitution solution of the component from Fig. 6.
Specific embodiment
In Fig. 1, it is schematically shown that two optical observation optical paths 2,3 of microscope 1 according to the present invention, this is micro-
Mirror is formed as three-dimensional surgical operation microscope 1 herein.These optical paths extend through principal goods mirror 5 from object 4 to be seen, are then passed through first point
Beam device 6 (being also referred hereinafter as main beam splitter 6), zoom optics 71、72With eyepiece lens barrel optical device 81、82(hereinafter also referred to
Eyepiece 81、82), so that observer can see object to be seen with its eye RA, LA in the way to enlarge.
In addition, microscope 1 includes 10 (OCT=Optische of OCT deviceOptical coherence is disconnected
Layer scanning), Wavefront measuring apparatus 11 and lighting device 12, the illumination path of the lighting device deflect from the first beam splitter 6 to master
Object lens 5, so that illumination path passes through principal goods mirror 5, and the detection optical path of the lighting device passes through principal goods mirror 5 and from the first beam splitting
Device 6 deflects.OCT device 10, Wavefront measuring apparatus 11 and lighting device 12 are not drawn for simplified diagram, in Fig. 1.It is coming from
Shown in the top view of Fig. 2 its structure and its arrangement, wherein only symbolically indicate in the figure optical observation optical path 2,
3。
In addition to principal goods mirror 5 and the first beam splitter 6, OCT device 10 further includes the first optical device group 13, the second beam splitter
20, deflecting mirror 33, the second optical device group 14, third optical device group 15, scanning element 16, collimator optics 17, light
Conductor 18 and OCT module 19.
Wavefront measuring apparatus 11 includes: principal goods mirror 5, the first beam splitter 6, the first optical device group 13, the second beam splitter 20
(hereinafter also referred to wavefront beam splitter 20), aperture diaphragm 21, the second optical device group 14, third beam splitter 22 are (hereinafter also referred to
Detect beam splitter 22) and for detection Wavefront sensor 23 (such as Shack-Hartmann camera 23).Wavefront measuring apparatus
11 further include: illumination laser 24 laser beam of 785nm (the illumination laser launch wavelength be), the 4th optical device group 25,
4th beam splitter 26 (hereinafter also referred to illumination beamsplitter 26), the second beam splitter 20, the first optical device group 13, the first beam splitter
6 and for illumination principal goods mirror 5.
Lighting device 12 includes: light source 27 (light source emits the illumination beam within the scope of 400 to 700nm), the 5th light
Learn device group 28, the 4th beam splitter 26, the second beam splitter 20, the first optical device group 13, the first beam splitter 6 and principal goods mirror
5。
As being hereafter described in detail further, is formed by first to third optical device group 13-15 and be used for OCT device 10
Detection optical path Kepler telescope, and formed by principal goods mirror 5 and the first and second optical device groups 13,14 and be used for wave
The Kepler telescope of the detection optical path of preceding measuring device 11, thus the two Kepler telescopes are nested among each other.Cause
This realizes highly integrated and space optimization structure.
The aperture optical path of the OCT device 10 for light beam is depicted in Fig. 3, which focuses on object 4 to be seen
On point P (Fig. 1) (point P is the optical axis of principal goods mirror 5 and the intersection point of the focal plane where object to be seen 4).As from being drawn
It can be seen, the first and second optical device groups 13,14 constitute the object lens of Kepler telescope, and third optics device in optical path
The eyepiece of the composition Kepler telescope of part group 15.It may also be said that first fills to the composition of third optical device group 13 to 15 for OCT
Set 10 without burnt imaging optical system.
In operation, OCT module 19 generates required coherent illumination ray, be guided through optical conductor 18 and by means of
Collimator optics 17 aim at.Scanning element 16 executes necessary deflection in the x and y direction.By first to third optics device
The Kepler telescope that part group 13 to 15 is constituted executes being imaged without coke for light beam, which deflects and borrow by the first beam splitter 6
Principal goods mirror 5 is helped to focus.
Detection optical path passes through in the same way in the opposite direction.Then the ray detected is drawn by optical conductor 18
It is directed at OCT module 19, is detected in known manner with method in the module.
The detection optical path of Wavefront measuring apparatus 11 is schematically shown in Fig. 4.Here, principal goods mirror 5 and the first optics device
Part group 13 constitutes the object lens of Kepler telescope, and the second optical device group 14 constitutes the eyepiece of Kepler telescope.Therefore, exist
This is equally existed without burnt imaging optical system, is made of principal goods mirror 5 and the first and second optical device groups 13 and 14.Thus
It can be illuminated for the object under test 4 with plane wave, which is imaged as plane wave on Wavefront sensor 23.
The optical texture for the Kepler telescope being nested among each other by two, in the OCT optical path of object 4
Between image ZB (Fig. 3) shaped between second and third optical device group 14,15.Intermediate image ZB also enters with optical conductor 18
Mouth conjugation.It may also be said that being conjugated there are the actual intermediate image ZB of optical conductor 18 with object 4.Intermediate image ZB along
The optical axis of the Kepler telescope of OCT device 10 is closer to (at a distance from away from the second optical device group 14 phase of third beam splitter 22
Than).The intermediate image is located at herein between third beam splitter 22 and the second optical device group 14.
Advantageously, intermediate image ZB is close to third beam splitter 22 or on the position in third beam splitter 22,
Because the aperture diaphragm 21 from there through Wavefront measuring apparatus 11 can be by the scanning area of the scanning element 16 of OCT device 10
Unfavorable cutting minimizes.
The diameter of intermediate image ZB can be for example in the range of 8 to 20nm.
First to fourth beam splitter 6,20,22 and 26 can be each formed as dichroic beam splitters, but they have difference
Dichroic characteristic.
In order to can with from visible wave range (the visible wave range be hereinafter also referred to VIS range and preferably have 400 to
The wavelength of 700nm) light realize bright enough illumination, the 4th and second at beam splitter 26 and 20 transmission of VIS range to the greatest extent may be used
It can height (preferably 100%).The reflectivity of VIS range possessed by first beam splitter 6 is 5% to 30%, and is accordingly transmitted as
95% to 70%.Thus enough illumination lights are also ensured to fall on object 4, and can by two observation optical paths 2,3 into
The optical detection acted charitably.
In order to obtain enough illuminations for wavefront measurement, the 4th beam splitter 26 has the ray of illumination laser 24
Wavelength XWFSReflection as high as possible.λWFSIt can be, for example, 785nm.It is λ that second beam splitter 20, which has for wavelength,WFSPenetrate
The transmission in 1% to 10% range of line, and the reflectivity in 99% to 90% range.First beam splitter 6 has excellent
Be selected as 100% for λWFSReflectivity.Therefore, although about 1% to 10% ray for only providing illumination laser 24 is used for
The illumination of wavefront measurement, but this is enough.It is important that the second dichroic beam splitters 20 are to wavelength XWFSHigh reflection, so as to
It is lost from natively weak return signal as few as possible.It, can be with since illumination laser 24 has enough power
Select the path.
If microscope 1 to be for example used for the treatment or operation of eyes, the optical system of Wavefront measuring apparatus 11 can be with
It is designed to transmission fluctuation as small as possible, because the laser of transmitting must be set for each individually microscope 1
The intensity of ray, so that it is no more than the maximum permissible value on eyes to be treated.Relative fluctuation is smaller, the function of illumination laser 24
Rate needs the dynamic having smaller or needs to adjust illumination laser 24 fewlyer.This is for example it is meant that the second beam splitter 20
For wavelength XWFS95 ± 0.5% reflection be better than 99 ± 0.5% because in the first scenario transmit (T=1-R) phase
It is 10% (5% ± 0.5%) to fluctuation, and is in the latter case 50% (1% ± 0.5%).
Since the rectangle curve of spectrum of reflection/transmission can only be come in fact in the case where dichroic beam splitters with very high consuming
It is existing, therefore this can be used by this way and method for the second beam splitter 20 herein, mode is so that by λWFS
It is chosen in the edge that its spectrum for being in reflection rises or on edge, wherein with λOCTThe wavelength of (=OCT ray)
Increase up to its maximum value and λOCTIt is herein, for example, 1050nm.Therefore the consuming in layer being produced minimizes, and the
The reflection of two beam splitters 20 is in λOCTWavelength at it is maximum, and in λWFSPlace is then smaller, therefore allows to be coupled into.
Third beam splitter 22 must separate the optical path of wavefront measurement and OCT measurement.Therefore, third beam splitter 22 is for wavelength
λOCTWith very high transmission, and for wavelength XWFSReflection as high as possible.
Finally, the first beam splitter 6 has for wavelength XOCTHigh reflection (preferably 100%), to draw when OCT is measured
Play loss as few as possible.
As the diagram for example especially from Fig. 2 it can be noted that the illumination laser 24 of Wavefront measuring apparatus 11
In the optical path for the Kepler telescope that ray is coupled into Wavefront measuring apparatus 11 via the second beam splitter 20, so that laser illuminator
The ray of device 24 only passes through the first optical device group 13 and principal goods mirror 5, and without the second optical device group 14.
Therefore, the light of wavefront laser 24 extends only through a small number of lens, there through less optical boundary face, in these light
The undesirable reflection being likely to occur in boundary face to the light of wavefront laser is learned, these reflections then may be with undesirable side
Formula is incident on Shack-Hartmann camera 23.
As has been described, third beam splitter 22 can not only be formed as dichroic beam splitters.Such as it is also possible that
Three beam splitters 22 are formed as partially transparent mirror, and the part detection ray for being used for wavefront measurement is therefore reflected into the summer
Gram-Hartmann's camera 23, and the part for being used for OCT measurement is measured into transmission of radiation to third optical device group 15.
In addition, third beam splitter 22 can be formed as such mirror, i.e., mirror reflection is all incident thereon penetrates
Line.Third beam splitter 22 has hole in the region that OCT optical path is extended, and penetrates for transmiting OCT illumination beam and OCT measurement
Line.Since intermediate image ZB is close or directly at third beam splitter 22, which can be relatively small.The hole can be formed
For mechanical hole, such as be formed as the transparent region that OCT ray may pass through.
In described embodiment so far, third beam splitter 22 is designed to that wavefront measurement can be carried out simultaneously
It is measured with OCT.However, if this is not desired and only allows to successively carry out wavefront measurement and OCT in time
Measurement, then third beam splitter 22 can be formed as changeable deflecting element.Changeable deflecting element can be from first state
It is switched to the second state, the whole light being incident on deflecting element in a first state are deflected by Shack-Hartmann camera 23,
Light is not deflected but can unhinderedly be transmitted to third optical device group 15 in the second state.
For this purpose, third beam splitter 22 can have such as electrochromic layer or electrochromism layer system, the system is by applying
Making alive switches to state of activation, and the system is high reflection in the state of activation, and can be accordingly switched to non-
State of activation (when such as no application voltage), the system is high transmission in the unactivated state.
Alternatively, third beam splitter 22 can be formed as such mirror, i.e., the mirror can be from it shown in fig. 3
Position (=first state) be moved to position shown in Fig. 5 (the=the second state).Position shown in fig. 5 is located at OCT device
10 and Wavefront measuring apparatus 11 optical path except, so as to carry out OCT measurement.In state shown in Fig. 3, entire ray quilt
Shack-Hartmann camera 23 is deflected into, so as to execute wavefront measurement.
In the schematic diagram according to fig. 2 to Fig. 6, first to third optical device group 13 to 15 is respectively drawn into lens.
Certainly, each of optical device group 13 to 15 may include multiple lens or other image-forming components.
As have been shown, intermediate image ZB is close to third beam splitter 22 or at the position of third beam splitter.This may
The parts variation in third beam splitter 22 or the dirty of such as third beam splitter 22 is caused to have an adverse effect OCT measurement.
Furthermore, it is possible to following difficulty occur: the last one component of the second optical device group 14 is relative to Shack-Hartmann
Sensor 23 only has relatively small distance (optical path length), so that Shack-Hartmann sensor 23 and third
Space between optical device group 15 can be minimum.This point is schematically shown in Fig. 6 for region 30.
In order to increase mechanical distance, third beam splitter 22 can be formed as deviation prism 31, such as schematically show in Fig. 7
Out.Deflection plane 32 can provide the optical characteristics of third beam splitter 22.
Now due to a part of path from the second optical device group 14 to Shack-Hartmann sensor 23 is because of deviation prism
31 and no longer pass through but passed through in the biggish medium of optical density (OD) in air, therefore there are desired biggish machines
Tool distance.
Deviation prism 31 can be formed such that deflection plane 32 is split, and survey to carry out OCT measurement and wavefront simultaneously
Amount.Alternatively, deviation prism 31 can have pure reflection deflection plane 32.In this case, deviation prism 31 is located in Fig. 7
Shown in position, to carry out wavefront measurement.OCT measurement is carried out if not wavefront measurement is carried out, then deviation prism
31 are moved out of optical path (using mode identical with the third beam splitter 22 in Fig. 5).
Third beam splitter 22 or deviation prism 31 can pass through linear movement and/or (or rotary motion) realization that moves pivotally
Position shown in Fig. 5 is moved to from Fig. 3, Fig. 6 or position shown in fig. 7.It preferably provides for institute in Fig. 3, Fig. 6 or Fig. 7
The Mechanical stops of the position shown, thus third beam splitter 22 or deviation prism 31 (or third beam splitter 22 or deviation prism
31 frame, bracket etc.) it must only be in contact with stop part, to realize that position is accurate and accurately repeats according to Fig. 3, Fig. 6 or Fig. 7
Positioning.
In the embodiment described so far, third beam splitter 22 always realizes reflection, is surveyed with detection for wavefront
The ray of amount.OCT measurement carries out in transmission.Certainly, this also may be implemented in turn, so that the reflection at third beam splitter 22
It is related to the detection optical path of OCT measurement and transmits to be related to wavefront measurement.Such as it can also be to illumination laser 24 and light source 27
Illumination beam reflected and transmitted between this transformation.
Claims (19)
1. a kind of microscope, includes
Observation optical path (2,3) with principal goods mirror (5),
Wavefront measuring apparatus (11) with the first detection optical path and the first illumination path,
First and second optical device groups (13,14),
The beam splitter (20) being arranged between first and second optical device group (13,14), and
Lighting device (12) with the second illumination path,
Wherein the first detection optical path includes the principal goods mirror (5), the first optical device group (13), is arranged in this first and second
Beam splitter (20) and the second optical device group (14) as reflecting element between optical device group (13,14), and
And the principal goods mirror (5) and the first and second optical devices group (13,14) collectively form being imaged without coke for the first detection optical path
Optical system,
Wherein first illumination path includes the beam splitter being arranged between first and second optical device group (13,14)
(20), the first optical device group (13), the principal goods mirror (5), and do not include the second optical device group (14), and for being somebody's turn to do
The illumination beam of Wavefront measuring apparatus (11) is via the beam splitting being arranged between first and second optical device group (13,14)
Device (20) is directed toward the first optical device group (13),
And wherein second illumination path is saturating comprising the conduct being arranged between first and second optical device group (13,14)
Penetrate the beam splitter (20), the first optical device group (13) and the principal goods mirror (5) of element.
2. microscope according to claim 1, wherein first illumination path includes to be arranged in first and second optics
Beam splitter (20) as transmissive element between device group (13,14).
3. microscope according to claim 1, wherein in first and second illumination path but in the first detection light
Arrange there are another beam splitter (26) except road, so as to by the illumination beam and the lighting device of the Wavefront measuring apparatus (11)
(12) illumination beam is guided to the beam splitter (20) being arranged between first and second optical device group (13,14).
4. microscope according to claim 2, wherein in first and second illumination path but in the first detection light
Arrange there are another beam splitter (26) except road, so as to by the illumination beam and the lighting device of the Wavefront measuring apparatus (11)
(12) illumination beam is guided to the beam splitter (20) being arranged between first and second optical device group (13,14).
5. microscope according to claim 1,
It includes the OCT device (10) and third optical device group (15) for detecting optical path with second,
Wherein the second detection optical path includes this first to third optical device group (13,14,15), which is constituted should
Second detection optical path without burnt imaging optical system.
6. microscope according to claim 2,
It includes the OCT device (10) and third optical device group (15) for detecting optical path with second,
Wherein the second detection optical path includes this first to third optical device group (13,14,15), which is constituted should
Second detection optical path without burnt imaging optical system.
7. microscope according to claim 3,
It includes the OCT device (10) and third optical device group (15) for detecting optical path with second,
Wherein the second detection optical path includes this first to third optical device group (13,14,15), which is constituted should
Second detection optical path without burnt imaging optical system.
8. microscope according to claim 5, wherein intermediate image plane (ZB) of the second detection optical path be located at this
Between two and third optical device group (14,15).
9. microscope according to claim 6, wherein intermediate image plane (ZB) of the second detection optical path be located at this
Between two and third optical device group (14,15).
10. microscope according to claim 5, wherein this second and third optical device group (14,15) between arrange
There are third beam splitter (22), which separates first and second detection optical path.
11. microscope according to claim 8, wherein this second and third optical device group (14,15) between arrange
There are third beam splitter (22), which separates first and second detection optical path.
12. microscope according to claim 10, wherein the third beam splitter (22) is formed as dichroic beam splitters.
13. microscope according to claim 11, wherein the third beam splitter (22) is formed as dichroic beam splitters.
14. microscope according to claim 10, wherein the third beam splitter (22) allows hand over as the first and second shapes
State, wherein the light from the second optical device group (14) is in the first state of the third beam splitter (22) in first spy
It surveys in optical path and is conducted and conducted in the second detection optical path in second state of the third beam splitter (22).
15. microscope according to claim 11, wherein the third beam splitter (22) allows hand over as the first and second shapes
State, wherein the light from the second optical device group (14) is in the first state of the third beam splitter (22) in first spy
It surveys in optical path and is conducted and conducted in the second detection optical path in second state of the third beam splitter (22).
16. microscope according to claim 14, wherein the third beam splitter (22) deflects in one of both states
Light from the second optical device group (14), and make in another state of both states from the second optics device
The light of part group (14) passes through in the clear.
17. microscope according to claim 15, wherein the third beam splitter (22) deflects in one of both states
Light from the second optical device group (14), and make in another state of both states from the second optics device
The light of part group (14) passes through in the clear.
18. microscope according to claim 14, wherein the third beam splitter (22) is moveable, and at both
Be located in one of state this second and third optical device group (14,15) between optical path in, and in both shapes
Be located in another state of state this second with third optical device group (14,15) between optical path except.
19. microscope according to claim 16, wherein the third beam splitter (22) is moveable, and at both
Be located in one of state this second and third optical device group (14,15) between optical path in, and in both shapes
Be located in another state of state this second with third optical device group (14,15) between optical path except.
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| Application Number | Priority Date | Filing Date | Title |
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| DE102017124547.2A DE102017124547B4 (en) | 2017-10-20 | 2017-10-20 | microscope |
| DE102017124547.2 | 2017-10-20 |
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| US20030078753A1 (en) * | 2000-03-22 | 2003-04-24 | Campin John Alfred | Optimization of ablation correction of an optical system and associated methods |
| CN102215738A (en) * | 2008-09-16 | 2011-10-12 | 卡尔蔡司外科器械有限责任公司 | Measuring system for ophthalmic surgery |
| WO2012116807A1 (en) * | 2011-03-03 | 2012-09-07 | Optocraft Gmbh | Method and device for topography measurement on the eye |
| WO2016170817A1 (en) * | 2015-04-20 | 2016-10-27 | 株式会社トプコン | Ophthalmic surgical microscope |
| CN106539555A (en) * | 2012-11-07 | 2017-03-29 | 透明医疗体系公司 | Apparatus and method for operating big power range order Wavefront sensor in real time |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102007019677A1 (en) | 2006-11-06 | 2008-05-08 | Carl Zeiss Surgical Gmbh | Surgical microscope with OCT system and surgical microscope illumination module with OCT system |
| EP3479753B1 (en) | 2008-03-19 | 2020-05-13 | Carl Zeiss Meditec AG | Surgical microscopy system having an optical coherence tomography facility |
| US8459795B2 (en) | 2008-09-16 | 2013-06-11 | Carl Zeiss Meditec Ag | Measuring system for ophthalmic surgery |
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2017
- 2017-10-20 DE DE102017124547.2A patent/DE102017124547B4/en active Active
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030078753A1 (en) * | 2000-03-22 | 2003-04-24 | Campin John Alfred | Optimization of ablation correction of an optical system and associated methods |
| CN102215738A (en) * | 2008-09-16 | 2011-10-12 | 卡尔蔡司外科器械有限责任公司 | Measuring system for ophthalmic surgery |
| WO2012116807A1 (en) * | 2011-03-03 | 2012-09-07 | Optocraft Gmbh | Method and device for topography measurement on the eye |
| CN106539555A (en) * | 2012-11-07 | 2017-03-29 | 透明医疗体系公司 | Apparatus and method for operating big power range order Wavefront sensor in real time |
| WO2016170817A1 (en) * | 2015-04-20 | 2016-10-27 | 株式会社トプコン | Ophthalmic surgical microscope |
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| DE102017124547A1 (en) | 2019-04-25 |
| DE102017124547B4 (en) | 2020-01-02 |
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Application publication date: 20190430 |