WO2010031540A2

WO2010031540A2 - Measuring system for ophthalmic surgery

Info

Publication number: WO2010031540A2
Application number: PCT/EP2009/006690
Authority: WO
Inventors: Markus Seesselberg; Peter Reimer; Christoph Hauger; Christoph KÜBLER
Original assignee: Carl Zeiss Surgical Gmbh
Priority date: 2008-09-16
Filing date: 2009-09-16
Publication date: 2010-03-25
Also published as: CN102215738A; DE102008047400A1; DE102008047400B9; JP5628177B2; WO2010031540A3; JP2012502674A; CN102215738B; DE102008047400B4

Abstract

The invention relates to an optical measuring system comprising a wave front sensor for characterizing a shape of a wave front of measuring light and an imaging lens, wherein the imaging lens comprises a first optical assembly and a second optical assembly for imaging an object region in an entrance region of the wave front sensor. A distance between the object region and the first optical assembly is larger than a focal length of the first optical assembly. Furthermore, the optical measuring system can comprise an optical microscopy system and optionally an OCT system for carrying out different optical examination methods at the same time.

Description

Eye surgery Measurement System

The present invention relates to an ophthalmic surgery measuring system with a wavefront sensor and an imaging optics. In particular, the present invention relates to an eye surgery measuring system having a wavefront sensor and imaging optics, which is suitable for providing an operation, in particular for an eye operation, by providing a sufficiently large distance between the imaging optics and an object to be examined. Furthermore, the present invention relates to an eye surgery measuring system with a wavefront sensor and an OCT system.

Wavefront sensors for characterizing a shape of a wavefront for measurement light are known in the prior art. In particular, such wavefront sensors can be used to measure aberrations of the human eye using a Hartmann-Shack sensor as described in J. Liang, B. Grimm, S. Goelz, JF Bille, "Objective Measurement of wave aberrations of the human eye with the use of a Hartmann-Shack wave-front sensor ", J. Opt. Soc. At the. A11 (1994) pp. 1949-1957, described. A Hartmann-Shack sensor in particular comprises a field of microlenses arranged in a plane, in the common focal plane of which a spatially resolving light sensor is arranged. With such a Hartmann-Shack sensor, a shape of a wavefront incident on the field of microlenses can be determined by determining local inclinations of the wavefront in the regions of the individual microlenses. To measure the optical properties of a human eye, a point-like illumination spot on the retina of the human eye is generated as far as possible. From this punctiform illumination spot emanates a nearly spherical wave, passes through the vitreous body, the lens and the cornea to emerge from the human eye. The shape of the wavefront is changed when the various optical interfaces of the human eye are passed through, which leads to deviations of the emerging wavefront from a plane wavefront in the presence of defective vision. These deviations from a plane wavefront can be represented by local tilting along a lateral area and thus measured with a Hartmann Shack wavefront sensor.

US 2005/0241653 A1 discloses a wavefront sensor which can be arranged and fastened on an optical microscopy system, between an objective lens of the microscopy system and an object to be examined.

US Pat. No. 6,550,917 B1 discloses a wavefront sensor which can convert a spherical wavefront, which emerges, for example, from a spherically defective human eye, into a plane wavefront so as to increase a measuring range of the wavefront sensor.

From the patent DE 103 60 570 B4 an optical measuring system is known which comprises an OCT system and a wavefront analysis system. Based on a measured wavefront shape, an adaptive optical element is driven in such a way that the wavefronts detected by a wavefront detector are substantially plane wavefronts, in order to obtain an improved OCT signal. However, the wavefront sensors disclosed in the above-mentioned publications are only of limited suitability for operations since they require a small distance of the object to be examined from the optical components closest to the object. Thus, a surgeon does not have enough room to operate.

It is therefore an object of the present invention to provide an optical measuring system with a wavefront sensor which is suitable for operations.

In particular, it is an object of the present invention

Invention to provide a measuring system with a wavefront sensor, which is suitable for eye surgery, especially cataract surgery.

A further object of the present invention is to provide an optical measuring system with a wavefront sensor and an OCT system, which allows an examination of an object by an analysis of wavefronts emanating from the object as well as by recording a three-dimensional structural data set. This measuring system should continue to be suitable for an operation.

Embodiments of the present invention provide an optical measuring system, in particular an ophthalmic surgery measuring system, which allows the surgeon enough space to operate.

According to an embodiment of the present invention, there is provided an optical measuring system comprising a wavefront sensor for characterizing a shape of a wavefront of measurement light in an entrance region of the wavefront sensor; and an imaging optic having a first optics assembly and a second optics assembly for imaging an object region into the entrance region of the - A -

Wavefront sensor with the help of the measuring light, where: 1.1 * f <d, where

f represents a focal length of the first optical assembly and

d represents a distance between the object area and the first optical assembly.

In this case, the wavefront sensor can comprise a field of refractive or diffractive optical elements which extends in two spatial dimensions, in particular a field of microlenses. Each of these refractive or diffractive optical elements has the property of collecting the measuring light in a focal plane. A spatially resolving light sensor is arranged in a common focal plane formed by the focal planes of the refractive or diffractive optical elements. This spatially resolving light sensor may include, for example, a CCD camera and / or a CMOS sensor or other photosensitive sensors. In particular, the spatially resolving light detector can detect an intensity distribution spatially resolved. The spatially resolving light detector may be arranged in a plane perpendicular to an optical axis of the wavefront sensor. The inlet region ^• of the wavefront sensor may be provided by a region in which the array of refractive or diffractive optical elements is disposed. In particular, this area can be a level. This plane may, for example, be given by fitting a plane to optical boundary surfaces of the refractive or diffractive optical elements which comprise optical surfaces of the wavefront sensor located farthest from the spatially resolving light detector. Depending on a shape of a wavefront of the measuring light incident on the wavefront sensor, bundles of this wavefront are imaged through the array of refractive or diffractive optical elements onto an associated field of regions on the spatially resolving light detector. These regions of the collected light bundles may in particular be elliptical or circular. An average position or centroid position of each region relative to a lateral position of the associated refractive or diffractive optical element indicates a local tilt of the refractive or diffractive optical element-associated beam of the wave front incident on the wavefront sensor.

The spatially resolving light detector may in particular comprise a multiplicity of sensor segments or pixels. Depending on a light intensity incident on each detector segment, electrical signals are generated by the wavefront sensor, which are then fed to a computing unit. The arithmetic unit is designed to determine a position of the collected light bundles from the electrical signals, in particular a center of gravity position, for example as the center of gravity of a region extending over a plurality of detector segments, which is formed by the impact of a collected light bundle passing through one of the refractive or diffractive optical beams Elements of the wavefront sensor has entered.

According to embodiments of the present invention, the wavefront sensor is designed as a Hartmann-Shack sensor. Instead of the Hartmann-Shack sensor, for example, an interferometer, a classic Hartmann test, a Ronchi test, Talbot interferometry, phase retrieval methods can be used. It can also be provided vorzukompensieren any existing astigmatism of the eye of the patient by a variable cylindrical lens, wherein the cylindrical lens can be rotatably mounted. In this case, for example, a liquid lens can be used.

The optical measuring system may further comprise a light source for illuminating an object to be examined. In particular, the measuring system can be designed to illuminate the smallest possible area of a retina of an eye to be examined. In this case, a substantially parallel or even spherical wavefront of measuring light can be incident on the eye to be examined in order, after penetrating the cornea, the lens and the vitreous body of the eye to be examined, to be incident on the retina as a substantially spherical wavefront, around a region of small extent to illuminate. Depending on the ametropia of the examined eye, this region can be in particular circular or elliptical. The differences in the lengths of the major axes of the ellipse are greater, the greater is the astigmatic refractive error of the examined eye.

In order to examine a form of a wavefront emerging from the eye to be examined, it is directed into the entrance area of the wavefront sensor. For this purpose, the optical measuring system comprises an imaging optics with a first optical assembly and a second optical assembly.

The optical assemblies may include one or more reflective and / or refractive and / or diffractive optical components, such as mirrors and / or lenses and / or diffraction gratings, and / or one or more electronically or mechanically controllable variable lenses or mirrors, which z. B. may change their optical power by changing the shape include. Optical components of a Optics assembly may be supported in a fixed relative position relative to each other, such as. B. cemented or held by frames spaced Kittglieder and / or individual lenses.

Light emanating in different directions from a point in a focal region of the first optical assembly is transformed by passing the first optical assembly into a bundle of light approximately formed by parallel rays of light. By this property, a position of the focal region of the first optical assembly can be determined. In particular, the focal region may take the form of a plane which is perpendicular to an optical axis of the first optical assembly. The focal area is then also referred to as the focal plane. The location of an intersection of the optical axis of the first optical assembly with the focal plane defines a focal point of the first optical assembly. An incident light beam passing through the focal point of the first optical assembly and subtending a small angle with the optical axis is translated by the first optical assembly into a diffractive light beam parallel to the optical axis of the first optical assembly. An intersection of the extended emergent light beam with the elongated incident light beam is at a major plane of the first optical assembly. The focal length f of the first optical assembly is given by a distance of the main plane of the first optical assembly from the focal plane of the first optical assembly.

The distance d between the object region and the first optical assembly is given by a distance between the object region and an optical surface of a component of the first optical assembly, wherein the optical surface, along a beam path of the measurement light, a may represent the optical area closest to the object area of components of the first optical subassembly. This component of the first optical assembly is an optical component with a lens effect, ie a component which has a refractive power different from zero. In particular, this component is not a plane-parallel plate, and no other is a shape of a wavefront of measurement light-unalterable component. Thus, in a beam path of the measurement light between the object region and the first optical assembly, further optical components may be arranged at a distance from the object region which is smaller than d, which have no optical refractive power, or whose optical refractive power is very small in comparison to FIG optical power of the first optical assembly, such as less than 5%, in particular 1%, of the optical power of the first optical assembly. An optical power of the first optical assembly is obtained by the reciprocal of its focal length, ie by l / f.

The distance d thus characterizes a free area between the first optical assembly and the object to be examined. This free area is sometimes referred to as the work area and the distance d is referred to as the working distance. By satisfying the condition 1.1 * f <d, it is ensured that in particular the working distance d is greater than the focal length f of the first optical assembly. An enlargement of d thus leads to an enlargement of a working area, which is particularly advantageous in operations, in particular on the human eye.

According to one embodiment of the present invention applies

1.5 * f <d, in particular 1.75 * f <d, in particular 2 * f <d. For certain applications, it is advantageous to have a relatively small focal length of the first optical assembly provide. Also in this case, a sufficiently large working distance can be achieved to perform an operation.

According to one embodiment of the present invention, d> 150 mm, in particular d> 175 mm, more particularly d> 190 mm applies. These provided working distances enable operations under a variety of operating conditions, especially for eye surgery. Furthermore, in embodiments d <500 mm, in particular d <300 mm, more particularly d <200 mm.

According to one embodiment of the present invention, at least one of the first optical assembly and the second

Optical assembly a refractive optical assembly, in particular a lens group. A lens group is a lot of

Lenses comprising one or more lenses. A

Lens group may be formed by cemented members. Lenses of a lens group can be fixed in a relative

Positioning be held.

According to an embodiment of the present invention, the optical measuring system further comprises a third optical assembly, which is arranged and formed to image the object area, along a microscope beam path in an image area different from the entrance area of the wavefront sensor. Thus, in addition to an analysis of a wavefront, optical microscopy of the object area is made possible. Optical microscopy is particularly helpful during surgery.

According to one embodiment of the present invention, the object area lies in a focal area of the first optical assembly. According to an embodiment of the present invention, the first optical assembly includes a first optical subassembly and a second optical subassembly spaced from one another. The first optical subassembly and the second optical subassembly together form the first optical subassembly. In particular, the first optical subassembly and the second optical subassembly may be supported in fixed positioning relative to each other.

According to one embodiment of the present invention, an optical path between the first optical assembly and the second optical assembly, which is passed through by the measuring light along a beam path of the measuring light, is variable. The variability of the optical path has the advantage that a spherical refractive error of an examined human eye can be precompensated to minimize a spherical portion of a wavefront incident on the wavefront sensor, and thus to increase a measuring range or a dynamic range of the wavefront sensor. If the wavefront of the measurement light has a spherical shape when it strikes the first optical assembly, then the wavefronts in the entry region of the wavefront sensor can be adjusted by adjusting, i. H. Zooming in or out, an optical path between the first optical assembly, in particular the second optical subassembly of the first optical assembly, and the second optical assembly are converted into a wavefront of a substantially planar shape.

In changing the optical path between the first optical assembly and the second optical assembly, the focal region of the first optical assembly, which may be formed of the first optical subassembly and the second optical subassembly, is further imaged onto the input region of the wavefront sensor. The Modifying the optical path may include displacing / displacing the second optical subassembly relative to the second optical assembly. For changing the optical path, an actuator may be provided which can provide a driving force for displacement, such as a motor, or which can only impart a driving force for displacement, such as by an adjusting mechanism, e.g. B. a screw or the like. The displacement can take place approximately along a rail. A degree of displacement, such as a distance of displacement, can be detected and measured by a detector. The actuator may be connected to a controller, whereby the actuator can be activated. The controller may include or use a calibration curve that allows conversion between a degree of spherical vision defect of the examined eye and a distance of displacement for precompensation of this ametropia. With the aid of this calibration curve, activation of the actuator for displacing the second optical subassembly relative to the second optical subassembly is possible with known defective vision of the examined eye.

According to an embodiment of the present invention, by changing the optical path between the first optical assembly and the second optical module, the ophthalmic surgery measuring system is adapted to form a wavefront of measuring light emitted from an eye located in the object region of -5 dpt to +25 dpt or to characterize this passing measurement light. In this case, the sign of the indicated refractive errors of the eye is defined such that an aphakic eye, ie an eye whose natural lens is removed, has an ametropia of about +20 dpt. According to one embodiment of the present invention, the optical measuring system further comprises a reflector for deflecting the measuring light, in particular by 180 °, which is arranged displaceably in the beam path of the measuring light between the first optical assembly and the second optical assembly to change the traversed optical path of the measuring light , In particular, the reflector is arranged displaceably in the beam path of the measuring light between the second optical subassembly of the first optical subassembly and the second optical subassembly.

According to one embodiment of the present invention, the reflector comprises at least two mirror surfaces arranged at a non-zero angle. In this case, about two or three mirrors may be used, with no further reflecting surface being present in the reflector. Use of exactly two mirrors is advantageous because of favorable polarization behavior.

According to one embodiment of the present invention, the optical measuring system further comprises a retroreflector, which is arranged in the beam path of the measuring light between the first optical assembly (in particular the second optical subassembly of the first optical assembly) and the second optical assembly. A retroreflector is an optical system which essentially reverses a propagation direction of the measurement light, that is to say deflects it by 180 degrees. This property is essentially independent of an orientation of a propagation direction of the measurement light relative to the retroreflector. The measuring light is not reflected back, for example, by the retroreflector along the beam path of the measuring light incident on the retroreflector, but guided on a laterally offset path. Providing a retroreflector between the second The optical subassembly and the second optical assembly enable the optical path between the second optical subassembly and the second optical subassembly to be varied by displacing the retroreflector. Displacement of the retroreflector parallel to an optical axis of the first optical assembly by a length 1 results in an increase or decrease of the optical path between the second optical subassembly and the second optical assembly by 2 * n * 1, where n is a refractive index of a medium within the optical path of the measuring light between the second optical subassembly and the second optical subassembly. By providing the retroreflector, the optical measuring system can be made particularly compact. Thus, it is also suitable for mounting within or below a microscopy system.

According to one embodiment of the present invention, the retroreflector comprises a corner cube. An angle reflector comprises a transparent body, which essentially has a shape of a three-sided pyramid, which comprises three mutually orthogonal right-angled, isosceles triangular faces and an equilateral triangular face. In this angle reflector, an incoming light beam is mirrored on three surfaces. This reflection can be due to total reflection. But it is also possible to mirror the surfaces where a reflection occurs, for example with a thin metal layer. This influences a possible polarization of the light in a different way.

According to one embodiment of the present invention, the optical measuring system further comprises a beam splitter, which is arranged between the inlet region of the

Wavefront sensor and the second optical assembly is arranged. The beam splitter can be designed as a polarization beam splitter. The beam splitter can be used advantageously for coupling the measuring light. Thus, on the way from the beam gun via the second optics assembly, the first optics assembly (particularly the second optics subassembly and the first optics subassembly of the first optics assembly) to the object to be measured in the focal region of the first optics assembly undergoes a substantially similar path to that of the one to be inspected Object outgoing light, which passes through the first optical assembly (in particular the first optical subassembly and the second optical subassembly of the first optical assembly) and the second optical assembly to the beam splitter. Furthermore, the measuring light reaches the wavefront sensor along a part of the beam path that is not traversed by the measuring light on the way to the object. This ensures, in particular, that in the case of a spherically ill-examined eye to be examined by changing the optical path between the second optical subassembly and the second optical subassembly, the measuring light illuminating the eye can be adjusted with respect to a spherical portion of the wavefront of the measuring light that the smallest possible spot of the Retina of the eye to be examined is illuminated.

According to an embodiment of the present invention, d (1, 2)> fl * d / (d-fl), where d (l, 2) represents a distance between components of the first optical subassembly and components of the second optical subassembly and f f is a focal length of the first Optical subassembly represents. The first optical subassembly and the second optical subassembly are so far apart, in particular, along the optical axis of the first optical subassembly that rays emanating from a point in the focal region of the first optical subassembly pass through overlap the first optical subassembly between the first optical subassembly and the second optical subassembly. In particular, an intermediate image of the object region arranged in the focal region of the first optical assembly is formed in a region of such an overlap. d (1, 2) represents along an optical axis of the first optical assembly a distance between an optical surface of a component of the first optical subassembly and an optical surface of a component of the second optical subassembly, both components having a non-zero optical power and, at the same time, those optical components the first and second optical subassembly, which have a minimum distance from each other.

According to one embodiment of the present invention, the first optical subassembly comprises a first lens group, in particular a lens, and a second lens group remote therefrom, wherein the microscope beam path passes through the first lens group of the first optical subassembly and wherein the third optical subassembly comprises a zoom system. Thus, both the beam path of the measuring light for the wavefront sensor and the microscope beam path penetrates the first lens group of the first optical subassembly. This makes it possible to provide an optical measuring system which simultaneously enables analysis of a wavefront and optical microscopy, wherein the first lens group of the first optical subassembly is used for both purposes. This allows a particularly compact integration of the components of the optical measuring system.

According to one embodiment of the present invention, a mirror surface, such as a folding mirror, in which

Beam path of the measuring light between the first Lens group and the second lens group of the first optical subassembly arranged. The mirror surface is provided in order to spatially separate the beam path of the measuring light from the microscope beam path.

According to an embodiment of the present invention, the second lens group of the first optical subassembly and the second optical subassembly together form an afocal system, in particular a Kepler system. After passing through the afocal system, light formed from plane wavefronts is converted into light, which is likewise formed from plane wavefronts. A Kepler system is an optical system formed of two lens systems, the two lenses arranged at a distance along an optical axis of the system, which corresponds to the sum of the focal lengths of the two lenses.

According to an embodiment of the present invention, the object region is disposed in a focal region of the first lens group of the first optical subassembly. The first lens group of the first optical subassembly may be considered as a main objective of a microscopy system. Thus, the object area is arranged in the focal area of the main objective of the microscopy system. This has advantages in using other optical components downstream of the main objective, such as a zoom system or an eyepiece.

According to one embodiment of the present invention, the third optical assembly comprises an objective and a zoom system, wherein the beam path of the measuring light is free from penetration of the objective and wherein a mirror surface is arranged in the beam path of the measuring light between the object region and the first optical subassembly. There are none according to this embodiment the previously mentioned components of the optical measuring system, which are provided both for the purpose of analyzing a wavefront and for optical microscopy. This has the advantage, for example, that the components for analyzing a wavefront can be detachably formed by an optical microscopy system and attached to various optical microscopy systems without requiring essential optical components of the optical microscopy system or having to change essential optical components of the optical microscopy system.

According to an embodiment of the present invention, the object area is arranged in a focal area of the objective.

According to an embodiment of the present invention, the object area is different from a focal area of the first optical unit.

According to an embodiment of the present invention, the first optical assembly and the second optical assembly together form an afocal system, in particular a Kepler system.

According to an embodiment of the present invention, a beam splitter is slidably disposed in a beam path of the measuring light between the first optical assembly and the second optical assembly. About the beam control lighting light can be supplied to the object area.

According to an embodiment of the present invention, a mirror surface (61) is disposed between the first optical assembly and the object region. This can be the optical

Measuring system combined with a microscopy system, wherein the beam splitter decouples a portion of light used for microscopy as a measuring light for wavefront analysis.

According to one embodiment of the present invention, the eye surgery measurement system further comprises an OCT system with an OCT light source for generating OCT measurement light, wherein in a beam path of the OCT measurement light between the first optical assembly and the second optical assembly or between the second optical assembly and the input region of the wavefront sensor, an OCT beam splitter is arranged so as to guide the OCT measuring light for illuminating the object region through at least the first optical assembly therethrough. When the OCT beam splitter is disposed between the first optical assembly and the second optical assembly, the OCT measuring light is passed only through the first optical assembly, but not through the second optical assembly, to illuminate the subject area. If the OCT beam splitter is arranged between the second optical assembly and the entry region of the wavefront sensor, the OCT measurement light for illuminating the object region passes through both the first optical assembly and the second optical assembly. In each case, the OCT measuring light can interact with the OCT beam splitter, which comprises, for example, a transmission or reflection. The OCT beam splitter can serve to arrange the beam path of the OCT measuring light in such a way that it coincides, at least in sections, with a beam path of the measuring light which is used to analyze the wavefront. Thus, the measurement light used for the analysis of the wavefront, together with the OCT measurement light, can pass through or be reflected by optical components of the system, such as the first optical assembly and optionally also the second optical assembly. This allows a compact and cost-effective design can be realized.

Optical coherence tomography (OCT) is an optical interferometric method for obtaining structural information about the object in a volume range by reflecting light at different depths of an object being examined.

The OCT light source may comprise OCT measuring light with wavelengths in the visible and / or near infrared light wavelength range, wherein a bandwidth of the OCT light source is set such that a coherence length of the OCT measuring light emitted by the OCT light source is between a few micrometers and a few tens of micrometers , A portion of the OCT measuring light beam emitted by the OCT light source is directed along an OCT beam path, which may comprise mirrors, lenses and / or fiber optics, to an object in the object area, in which it is dependent on the wavelength and the material within the object penetrates to a certain depth of penetration. A portion of the penetrated OCT measuring light is reflected as a function of a reflectivity within the object and is interferometrically superimposed with a second part of the OCT measuring light emitted by the OCT light source, which second part is reflected at a reference surface. The superimposed light is detected by a detector and converted into electrical signals which correspond to intensities of the detected superimposed light. Due to the comparatively short coherence length of the OCT measurement light, constructive interference is observed only when the optical path traveled by the OCT measurement light back and forth to the object is less than the coherence length of the OCT measurement light from the optical path which differs from the second part of the of the OCT light source emitted light, which is reflected from the reference surface, is covered.

Various embodiments provide various variants of an OCT system. The different

Variants of an OCT system differ in the manner in which scanning of texture information along a depth direction (axial direction) is performed, and in the way the overlaid light is detected. According to one embodiment of a time

Domain OCT (TD-OCT) is the reference surface, at which the second part of the light emitted from the light source is reflected, relocated to structural information of the

To get object from different depths. An intensity of the superimposed light can in this case be detected by a photodetector.

Although in Frequency Domain OCT (FD-OCT) the second part of the OCT measurement light emitted by the OCT light source is also reflected on a reference surface, the reference surface need not be displaced to obtain structural information from different depths within the object , Instead, the superimposed light is split by a spectrometer into spectral parts, which are detected, for example, by a spatially resolving detector, such as a CCD camera. By Fourier transforming the obtained spectrum of the superimposed light, structural information of the object along the depth direction can be obtained (Fourier domain OCT).

Another embodiment of FD-OCT is swept-source OCT

(SS-OCT). In this case, a spectrum of superimposed light is recorded consecutively in time, by a medium

Wavelength of a very narrow-band OCT measuring light is continuously changed and simultaneously the superimposed light is detected by means of a photodiode.

In particular, the OCT system can be used to structurally examine the anterior chamber of the eye or the posterior chamber or even the retina of a human eye, especially during eye surgery.

According to one embodiment of the present invention, the eye surgery measuring system further comprises at least one pivotable scanning mirror arranged in the OCT beam path between the OCT light source and the OCT beam splitter in order to scan the OCT measuring light over the object area. In this case, the OCT system may further comprise collimator optics to collimate the OCT measurement light generated by the OCT light source. The collimated OCT measuring light can then be guided by pivoting the at least one scanning mirror over the object area as a focused OCT measuring light beam in order to obtain structural information from a laterally extended area of the object area. In this case, the system may comprise more than one scanning mirror, such as two, which are each pivotable about different axes.

According to an embodiment of the present invention, the at least one scan mirror, the second lens group of the first optical subassembly, and the second optical subassembly are configured and arranged to image an area near the at least one scan mirror onto a region near the mirror surface. The first optical assembly, as set forth above, includes the first optical subassembly and the second optical subassembly. In this case, the first optical subassembly comprises a second lens group. In this case, the second lens group of the first optical subassembly and the second optical subassembly may form an afocal system to close the region near the Scan mirror on the area near the mirror surface.

The mirror surface is arranged in the beam path of the measuring light used for the analysis of a wavefront between the first lens group of the first optical subassembly and the second lens group of the first optical subassembly. The mirror surface, which is approximately included in a folding mirror, can redirect the measuring light in such a way that on its way to the object region it passes through another lens, for example a microscope objective. For an ideally adjusted system, a center of the at least one scan mirror is optically imaged onto a center of the mirror surface by the second lens group of the first optical subassembly and the second optical subassembly. Such an optical image has the advantage that, for different pivoting positions of the at least one scanning mirror of the scanning mirror in different directions from one point reflected OCT measuring light is mapped to a point in the center of the mirror surface, regardless of the pivot position of the scanning mirror, without emigrating what could lead to the fact that the mirror surface is no longer hit. In this way, the mirror surface can be sized relatively small.

For example, if the system includes two scanning mirrors spaced apart from one another, the system may be configured and adjusted such that a point in the middle of a link between the two scanning mirrors along the OCT beam path through the second lens group optical system of the first Optics subassembly and the second optical subassembly on the mirror surface, in particular on a center of the mirror surface, or at least on an area in the vicinity of the mirror surface, such as a region which along the OCT beam path from a center of the mirror surface is at most a 100-fold, 10-fold, or 2-fold lateral extent of the mirror surface is removed, is mapped. A distance of the area may depend on an optical magnification of the system of the second lens group of the first optical subassembly and the second optical subassembly, such that the distance increases with increasing magnification, such as increases linearly.

A region near the scanning mirror may comprise spatial points whose distances to scanning mirrors included in the system are smaller, in particular a factor of 10, a factor of 5, or a factor of 2, smaller than an extent of the scanning mirror included in the system.

A region near the mirror surface may comprise spatial points whose distances to the mirror surface, in particular along the OCT beam path, are smaller, in particular by a factor of 10, a factor of 5, or a factor of 2 than an extension of the mirror surface in particular, may include an angle between 30 ° and 60 ° with a direction of the OCT beam path.

According to one embodiment of the present invention, the eye surgery measurement system further comprises a wavefront light source for generating the measurement light used for analysis of the wavefront, wherein at least 80% of a total intensity of the measurement light generated by light having wavelengths between 800 nm and 870 nm, in particular between 820 nm and 840 nm. The measuring light can be z. B. be generated by a super-luminescent diode (SLD). Measuring light of this wavelength is particularly suitable to penetrate through a human eye to the retina, there a To form a light spot to escape after diffuse reflection back out of the eye to be examined in terms of a wavefront shape by the wavefront sensor. The advantage of using light of these wavelength ranges is in particular that light from these wavelength ranges is not perceived by the patient's eye, so that the patient is not dazzled and the iris of the patient's eye also does not contract, which could disturb the measurement.

According to one embodiment of the present invention, at least 80% of a total intensity of the generated OCT measurement light is formed by light having wavelengths between 1280 nm and 1320 nm, in particular between 1300 nm and 1320 nm. OCT measuring light of these wavelengths is particularly suitable for entering an area of the anterior chamber of the eye and being reflected from this area in order to obtain structural information from the anterior chamber of the eye. It is also possible to obtain structural information from the posterior chamber of the eye and / or retina.

For observation and examination of the retina by OCT again a wavelength range between 800 nm and 870 nm is well suited, since this light penetrates well up to the retina. In this case, spectra of the wavefront light source 3 and the OCT light source may overlap such that at least 60%, in particular at least 80%, of an intensity of the wavefront analysis light is in a wavelength region in which 80% of an intensity of the OCT light is lie. The measuring light for the analysis of the wavefront can essentially comprise the same wavelengths as the OCT measuring light. In this case, it is possible to provide a single light source both for generating the measuring light for analyzing the wavefront and for generating the OCT measuring light. According to embodiments of the present invention, at least 70%, in particular at least 90%, of intensities of the measurement light used for wavefront analysis and of the OCT measurement light lie in non-overlapping wavelength ranges. Although the measuring light used for wavefront analysis as well as the OCT measuring light, as well as enforce or interact with some of the optical components of the ophthalmic surgery measuring system, such as the first optical assembly and optionally also the second optical assembly, both measuring radiation can be separated due to their different wavelength ranges, for example, by dichroic elements. This reduces interference between wavefront measurement and OCT measurement. However, in other embodiments, both measuring radiations can comprise identical wavelength ranges and their spectra can predominantly overlap.

According to one embodiment of the present invention, the OCT beam splitter comprises a dichroic mirror which in a wavelength range from 800 nm to 870 μm, in particular from 820 nm to 840 nm, has at least twice as high or at most half as high a transmission as in a wavelength range from 1280 nm to 1340 nm, in particular from 1300 nm to 1320 nm.

According to embodiments of the present invention, at least 80% of an intensity of either the measurement light used for wavefront analysis or the OCT measurement light is transmitted through the OCT beam splitter.

According to an embodiment of the present invention, the OCT beam splitter comprises a dichroic mirror which is in a wavelength range of 1280 nm to

1340 nm, in particular 1300 nm to 1320 nm, an at least has twice as high or at most half as high reflectivity as in a wavelength range of 800 to 870 nm, in particular from 820 to 840 nm.

According to embodiments of the present invention, at least 80% of an intensity of either of the

Wavefront analysis used measuring light or the OCT measuring light from the OCT beam splitter reflected.

On the dichroic mirror layers of material of different dielectric constants can be applied, which lead to a constructive interference in reflection or transmission when the measuring light or the OCT measuring light.

According to one embodiment of the present invention, a majority, in particular at least 70%, of an intensity of OCT measurement light incident on the OCT beam splitter is reflected at the OCT beam splitter. In this case, furthermore, a large part, in particular at least 70%, of an intensity of measuring light incident on the OCT beam splitter and used for the wavefront measurement can be transmitted through the OCT beam splitter.

Specific embodiments of the invention will now be described in detail with reference to the attached drawings. Similar elements provided in various embodiments are designated by the same reference numeral but with different appended letters. Thus, any non-existent description of an element of a particular embodiment, a description of that element, may be in the context of another embodiment. Figure IA is a schematic representation of a

Embodiment of an optical measuring system of the present invention, wherein a

Illumination beam path or wavefront beam path is illustrated;

Figure IB schematically shows the one illustrated in Figure IA

Embodiment, wherein an object beam path is illustrated;

Figure IC schematically shows a section of the in the

Figures IA and IB illustrated embodiment of an optical measuring system;

FIG. 2A is a schematic illustration of another embodiment of an optical measuring system according to the present invention, illustrating an illumination beam path and a wavefront beam path, respectively;

Figure 2B schematically illustrates the embodiment shown in Figure 2A, illustrating an object beam path;

FIG. 3 schematically illustrates another embodiment of an optical measuring system according to the present invention;

FIG. 4 schematically illustrates yet another embodiment of an optical measuring system according to the present invention;

FIG. 5A is a schematic representation of another

Embodiment of an optical measuring system according to the present invention, wherein a Illumination beam path or a wavefront beam path is illustrated;

Figure 5B schematically illustrates the embodiment shown in Figure 5A, illustrating an object beam path;

FIG. 6 shows an optical measuring system according to a further embodiment of the present invention, wherein in particular an OCT beam path is illustrated; and

FIG. 7 shows an optical measuring system according to a further embodiment of the present invention, wherein in particular an OCT beam path is illustrated.

FIG. 1A schematically illustrates an optical measuring system 1 according to an embodiment of the present invention. Measuring system 1 comprises a light source 3, which generates measuring light 5. Measuring light 5 is collimated by a collimator optics 7 in order to generate measurement light 9 formed from substantially planar wavefronts. Measuring light 9 is reflected at the beam splitter 11 and passes through the cemented element 13. The measuring light converged by the cemented element 13 passes through the diaphragm 15 and is deflected by a 180 ° reflector 17 formed by two mirror surfaces 17 'and 17 "oriented orthogonally to form measuring light 9 to deflect substantially in an opposite direction and laterally, ie in a direction perpendicular to a propagation direction of the measuring light 9 along the optical axis 10, to put.

The reflector 17 may in other embodiments, for. B. executed as an angle reflector {corner cube)

Retroreflector be formed. The angle reflector comprises a glass body, which is formed in the form of a triangular pyramid, wherein outer surfaces of the pyramid are formed by three equiangular, right-angled triangles, which are arranged in pairs perpendicular to each other. Further, the angle reflector comprises a base surface which is formed in the shape of an isosceles triangle. In the case of using such an angle reflector, the measuring light 9 is reflected at the three isosceles, right triangular faces.

The reflector 17 is displaceable in the directions indicated by the double arrow 20 directions. In this case, the diaphragm 15 is always arranged independently of a displacement position of the reflector 17 in a focal region of the cemented element 13.

The measuring light reflected by the reflector 17 passes through the cemented element 19 to form convergent measuring light. In a plane 21, measuring light 9 essentially converges to one point, crosses over and continues to run as a diverging measuring light. The diverging measuring light 9 passes through another cemented element 23 in order to be converted into plane wavefronts. The flat measuring light 9 then passes through a λ / 4 plate 24 and finally strikes an eye 25 as plane wavefronts. The pupil of the human eye 25 lies in the object plane 28. The pupil of the eye 25 is understood to be the image of the iris. The pupil is typically about 2.7 to 3 mm behind the apex of the cornea 33. The object plane 28 in this embodiment coincides with the focal plane 29 of the first optic assembly 31 formed of cemented member 23 and cemented member 19. Thus, the pupil of the eye 25 is in the focal plane 29th

Measuring light 9 passes through the cornea 33 and the lens 35 of the eye 25 in order to reach the point 37 of the retina 39 to be focused. That measuring light, which is constructed on the beam splitter 11 of planar wavefronts, and is thus composed of a bundle of parallel light beams, is imaged on a point 37 on the retina of the eye 25, is at a fixed relative positioning of the optical components only one right-hand Eye without spherical refractive error, the case when reflector 17 is positioned so that the overall system consisting of the three optical assemblies 23, 19 and 13 is afocal. In the case of a spherically ill-advised eye, however, the reflector 17 or the angle reflector 17 can be displaced along the directions indicated by the double arrow 20 in order to allow either a slightly convergent measuring light 9 or a slightly divergent measuring light 9 to be incident on the eye 25. Thus, it is also possible in the examination of a spherically refractive eye to produce the smallest possible illumination spot of the measuring light on the retina. By moving the angle reflector 17 along the directions indicated by the double arrow 20, an optical path length of the measuring light between the cemented element 13 and the cemented element 19 is changed. Within certain limits of spherical refractive error of the eye 25, measuring light 9 can thus be focused on a point on the retina 39 of the refractive eye 25.

The illuminated point 37 acts as a diffused light source on the retina 39 of the eye 25 and emits light 41, which is formed by substantially spherical wavefronts. Light 41 passes through the vitreous body, lens 35 and cornea 33 to form light 43. Depending on the optical properties and shapes of the lens 35 and the cornea 33, a wavefront of the light 43 deviates from a plane wavefront. The shape of the wavefronts, from which light 43 is formed, can be a conclusion on the defective vision of the optical components or Close the interface of the eye 25, ie in particular on the property and shape of the lens 35 and the cornea 33rd

Light 43 passes through cementing member 23 to form convergent light. In the area of plane 21, where an image of the retina is formed, light 43 is converged to a minimum extent, in order to then proceed divergently. Measurement light 43 also penetrates cemented element 19, is reflected by reflector 17 and displaced laterally, passes through aperture 15, penetrates cemented element 13 in order to form light which is essentially formed from planar wavefronts. A deviation of the wavefronts of the measuring light 43 from plane wavefronts indicates a defective vision of the eye 25.

Measuring light 43 is incident on the entrance area 45 of a Hartmann-Shack sensor 47. The entrance region 45 is formed by a field of microlenses, in the common focal plane of which an electronic image sensor, for example a CCD camera chip, is arranged. The electronic image sensor comprises a plurality of pixels, each of which converts intensity values of received light into electrical signals. The electrical signals are supplied via a data line 49 to a non-illustrated arithmetic unit. For each microlens of the microlens field of the Hartmann-Shack sensor 47, the computing unit determines a shift position of the light focused by the microlens, whereby a shape of a wavefront of the measurement light 43 in the entry region 45 of the Hartmann-Shack sensor can be determined. With reference to FIG. 1B, it is explained that a region of the focal plane 29 is imaged onto the entrance region 45 of the Hartmann-Shack sensor 47. Thus, a shape of a wavefront of the light 43 exiting the eye 25 can be determined. With reference to FIG. 1B, further properties and advantages of the optical measuring system 1 are explained. The pupil of the eye 25 in the object plane 28 is disposed in the focal plane 29 of the first optical assembly 31 formed by the cemented members 23 and 19. From the focal point 51 located in the focal plane 29, three beams 53a, 53b, 53c of the light 43 emanate along the object beam path, passing through the λ / 4 plate 24 and the cemented element 23 so as to be converged to an smallest extent in an intermediate image area 55. From the intermediate image area 55, the rays 53 emanate as divergent rays, and pass through the cemented element 19 to emerge from the cemented element 19 as approximately parallel rays 53a ¹ , 53b ¹ , 53c ¹ . The parallel beams 53a ¹ , 53b ¹ , 53C are reflected by the reflector 17 and displaced laterally, pass through aperture 15, and pass through cemented element 13 to be focused upon passing through the beam splitter 11 to a point passing through an optical axis of the measuring system 1 and the inlet region 45 of the Hartmann Shack sensor 47 is given. Thus, a point in the focal plane 29 is imaged to a point in the entrance region 45 of the Hartmann-Shack sensor 47. A displacement along the directions indicated by the double arrow 20 of the angular reflector 17 does not change this imaging property, since rays which emanate from a point in the focal plane 29, between cemented member 19 and cemented element 13, where in the beam path of the measuring light, the reflector 17 is arranged , are parallel. Thus, a shape of a wavefront exiting a right-handed or spherical-refractive eye can be examined with high precision.

FIG. 1C schematically illustrates a section of the optical measuring system 1 of the embodiment schematically illustrated in FIGS. 1A and 1B according to the present invention. Go from the focal point 51 Rays 53a, 53b and 53c pass through cementing member 23 to be focused in the intermediate image area 55. From there, the three beams continue to divergent and are deflected by cemented member 19 so as to form three parallel beams 53a ¹ , 53b ¹ and 53c 'which are parallel to the optical axis 10. Cement member 23 and cemented member 19 together form the first optical assembly 31 as described above. A focal length f of the first optical assembly 31 may be determined as follows:

The beam 53a ¹ parallel to the optical axis 10 is extended toward and beyond the focal plane 29, as illustrated by dashed line 55a ¹ . Similarly, the beam 53a incident into the first optical assembly 31, which is transferred into the beam 53a ¹ after passing through the optical system 31, is extended beyond the focal plane 29, as illustrated by dashed line 55a. The line 55a and the line 55a ¹ intersect at a point 57a. The point 57a lies in a main plane 59 of the first optical assembly 31. The main plane 59 lies at a distance f away from the focal plane 29 parallel to the main plane 59. In the main plane 59 also the point 57c analogous to point 57a lies through the point of intersection the lines 55c ¹ and 55c is formed. Thus, the rays 53a and 53c passing through the focus are apparently refracted at the points 57a and 57c, respectively, which are in the main plane 59 so as to be parallel to the optical axis after passing through the first optical assembly 31.

The rays 53a ', 53b' and 53c 'are reflected by the angle reflector 17, as illustrated schematically, and are focused by cemented member 13 onto the entrance region 45 of the wavefront sensor 47. The entry region 45 is formed by the cemented member 13 nearest surfaces of microlenses 46. One Object region 28 'in an object plane 28 within the focal plane 29 of the first optical assembly 31 is thus imaged onto the entrance region 45 of the wavefront sensor 47. The microlenses 46 each have a focal length 1. At a distance 1 from the entrance region 45 of the wavefront sensor 47, CCD 48 is arranged in order to detect light intensities in a spatially resolved manner. As described above, detection of a distribution of light intensities and subsequent evaluation allows to determine a shape of a wavefront of the measurement light originating from the object region 28 '. The object area 28 'in the focal plane 29 of the first optical subassembly 31 is arranged at a distance d from an optical area of the first optical subassembly 31 closest to the focal area 29. In the embodiment illustrated here, the distance d is about 2.5 times as large as the focal length f of the first optical assembly 31.

The optical measuring system 1 is particularly suitable for eye surgery, in particular for cataract surgery. In this case, the cornea or the pupil of an eye to be operated lies in the object area 28 '. The distance d between the cornea or the pupil of the eye to be examined and a component of the first optical assembly 31 in the exemplary embodiment 1 is 220 mm. Therefore, the operating surgeon has enough space to perform the surgery with his hands and surgical instruments.

The embodiment 1 of an optical measuring system illustrated in FIGS. 1A, 1B and 1C can be mounted in a fixed positioning relative to an optical microscopy system. For example, the optical measuring system 1 can be in a beam path of measuring light emitted by an object to be examined be supported upstream of a lens of the optical microscopy system. For this embodiment, the measurement light 43 emanating from the object region 28 'can be reflected by a fold mirror 61 indicated diagrammatically in order to impinge on the entrance region 45 of the wavefront sensor 47 after passing through the first optical assembly 31, reflection at the angle reflector 17 and penetration of the cemented element 13. For this purpose, the position of the folding mirror 61 is shown in FIGS. 1A and 1B. Another portion of light emanating from the object area 28 'is passed through a lens of the microscopy system for microscopic imaging. This allows a surgeon to both obtain a microscopic image of an object to be operated on and perform an analysis of a wavefront shape of measurement light emanating from the object region 28 " Workspace as little as possible.

FIGS. 2A and 2B schematically illustrate another embodiment 1a of an optical measuring system according to the present invention. Some components of the optical measuring system 1a are analogous to the components of the optical measuring system 1 illustrated in FIGS. 1A, 1B and 1C, so that for a detailed description of these components reference is made to the corresponding description of embodiment 1. Cement members 19a and 13a of embodiment Ia correspond, for example, to cemented members 19 and 13 of embodiment 1. Furthermore, light source 3, collimator optics 7 and wavefront sensor 47 of embodiment 1 correspond to light source 3a, collimator optics 7a and 7b, respectively.

Wavefront sensor 47a of embodiment Ia. In contrast to the embodiment 1 of the optical measuring system which comprises cemented element 23 illustrated in FIGS. 1A, 1B and 1C, the embodiment Ia illustrated in FIGS. 2A and 2B instead comprises lens group 23a which is formed by lens system 63a and lens system 65a. As a further difference, embodiment Ia does not include a reflector 17 or an angle reflector 17 as in embodiment 1. Instead, aperture 15a, cemented element 13a, beam splitter IIa, collimator optics 7a, light source 3a and wavefront sensor 47a are in fixed positioning relative to each other and along the optical axis 10a of the measuring system 1a, as illustrated by the dashed box 67a, which is displaceable along directions indicated by the double arrow 69. As explained with reference to embodiment 1, which is illustrated in FIGS. 1A, 1B and 1C, a change in an optical path between cemented elements 19 and 13, or 19a and 13a, of the measuring light 9 incident on the object region 28 'and of the optical path from the object area 28 'outgoing measuring light 43 compensation of spherical refractive error of an eye to be examined 25, both in terms of illumination and with respect to the analysis of the wavefront of emerging from the eye 25 measuring light. In turn, a dynamic measuring range of the wavefront sensor 47 can be extended.

Instead of providing a displaceable unit 67a for this purpose in the embodiment Ia, an arrangement using a reflector 17 or an angle reflector 17 may instead be provided, as in analogous

Illustrated in Figures IA and IB. Conversely, the embodiment 1 of the optical measuring system according to the present invention illustrated in FIGS. 1A, 1B and 1C may be implemented without a reflector 17. Instead For example, the diaphragm 15, the cemented element 13, the beam splitter 11, the collimator optics 7, the light source 3 and the wavefront sensor 47 can be held in fixed relative positioning and can be displaceable along the optical axis 10 or can not be displaced, as illustrated in FIGS. 2A and 2B in an analogous manner , If these components are not displaceable, a wavefront sensor 47 with a particularly large dynamic range is provided, since in this case precompensation is not possible when examining a spherically ill-looking eye.

In the object area 28a ¹ in the object plane 28a within the focal plane 29a, the cornea 33 or the pupil of an eye 25 of a right-eye is arranged without spherical refractive error. The light 5a generated by the light source 3a is converted by collimator optics 7a into measuring light 9 consisting of substantially planar wavefronts. After reflection by beam splitter IIa, passing through the cemented element 13a, passing through the diaphragm 15a when crossing the measuring light, passing through the cemented element 19a, crossing the measuring light 9 in plane 21a, passing through the lens system 65a and passing through the lens system 63a, the measuring light 9 is incident as plane wavefronts the eye 25 a. The right-eye 25 without spherical vision focusses measuring light 9 on a point 37 of the retina 39 of the eye 25. From 37 spherical wavefronts go out to after passing through the glass body, the lens 35 and the cornea 33 as measuring light 43 with plane wave fronts in the object area 28 'go out. Measurement light 43 passes through lens system 63a, passes through lens system 65a, passes through cemented element 19a, passes through cemented element 13a, and passes through beam splitter IIa to impinge on wavefront sensor 47a. There, the non-illustrated CCD detector detects a light distribution to a shape of a Wavefront of the outgoing from the object area 28 'measuring light 43 to determine.

The working distance d between the object area 28a ¹ and a surface of the lens system 63a closest to the object area 28a ¹ is about 3 times that of the object area

Focal length f of lens system 63a, lens system 65a and

Kittglied 19a formed first optical assembly 31a. Thus, this embodiment allows Ia of an optical measuring system a sufficiently large working distance d to provide enough free working space for a

To allow surgery.

FIG. 2B illustrates embodiment 1a of the optical measuring system, wherein an object beam path, ie a beam path emanating from object plane 28a, is illustrated in order to explain a further property of the measuring system 1a. Since the pupil of the eye 25 is arranged in the example illustrated here of using the optical measuring system Ia for examining the eye 25 in the object plane 28, the object beam path corresponds to a pupil beam path. From the focal point 51a outgoing rays 53a, 53b and 53c of the light 43, which focal point 51a is simultaneously in the object area 28a ¹ , are converted by lens system 63a in each other approximately parallel beams 53a ^{1 1} , 53b ^{1 1} and 53c '', each parallel to the optical axis 10a of the optical measuring system Ia. Thus, the distance between a main plane 63a ^{1 of} the lens system 63a and the object region 28a ¹ is equal to the focal length f (63a) of the lens system 63a. At the same time, the focal length f (63a) of the lens system 63a substantially corresponds to the working distance d between the object region 28a ¹ and a surface of the lens system 63a closest to this object region 28a '. Lens system 65a and cemented member 19a are at a distance arranged along the optical axis 10, which corresponds to a sum of their focal lengths, ie f (65a) + f (19a). Thus, the lens system 65a and the cemented member 19a together form a so-called Kepler system. The Kepler system is a special case of an afocal system that converts incident parallel beams into outgoing parallel beams. Accordingly, the parallel beams 53a ^{1 1} , 53b ^{1 1} and 53C 'are converted by lens system 65a and cemented member 19a into again parallel beams 53a ¹ , 53b ¹ and 53c'. After rays 53a ¹ , 53b ¹ and 53c 'have penetrated cemented member 13a, they are focused into the entrance region 45a of wavefront sensor 47a. Thus, the object area 28a ^{1 is} imaged onto the entrance area 45a of the wavefront sensor. Corresponding to the parallelism of the beams between the cemented member 19a and the cemented member 13a, such imaging occurs independently of changing an optical path of the measuring light between the cemented members 19a and 13a, which is achieved by shifting the system 67a indicated by the dashed box along the directions indicated by arrow 69 becomes.

FIG. 3 shows a further embodiment 1b of an optical measuring system according to the present invention. The structure and relative orientation of the elements 63b, 65b, 19b, 13b, IIb, 7b, 3b and 47b substantially corresponds to the structure and relative arrangement of the elements 63a, 65a, 19a, 13a, 11a, 7a, 3a and 47a, respectively, which are illustrated and described in Figs. 2A and 2B. In contrast to the previously illustrated and described embodiments of an optical measuring system, the optical measuring system Ib furthermore comprises further lens elements 71, 73 and 75 which are formed in this order between the object area 28b 'in the focal plane 29b of the lens system 63b, lens system 65b and cemented element 19b first optical assembly 31b are arranged. The Lens element 71 has a focal length of 40 mm, the lens element 73 has a focal length of 18.5 mm and the lens element 75 has a focal length of 75 mm. These lens elements 71, 73 and 75 are arranged to examine an aphakic eye 25, ie an eye whose lens has been removed, which is accordingly absent in FIG. Illustrated are rays 43a, 43b and 43c, which divergent from the point 37 of the retina 39 of the eye 25 and leave the eye. The illustrated embodiment is an 19-diopter aphakic eye 25. The divergent beams 43a, 43b and 43c, which originate from the object area 28b ¹ and represent spherical wavefronts, are imaged onto the entrance area 45b of the wavefront sensor by the optical imaging system of the optical measuring system 1b as parallel wavefronts. Thus, by inserting the lens elements 71, 73 and 75, the dynamic range of the wavefront sensor 47 can be further increased, so that it is even possible to examine aphakic eyes for spherical and non-spherical refractive errors. Lens elements 71, 73 and 75 may optionally be provided in embodiments illustrated in Figures 1A, 1B, 1C and 2A, 2B.

FIG. 4 illustrates another embodiment Ic of an optical measuring system according to the present invention. The optical measurement system Ic comprises a wavefront analysis system 77 and an optical microscopy system 79. Many of the components of the wavefront analysis system 77 have a similar structure and relative orientation to the optical measurement system Ia illustrated in FIGS. 2A and 2B. A detailed description of these components is therefore omitted. The lens system 63a of the optical measuring system Ia simultaneously functions as the objective 63c of the optical microscopy system 79 in the optical measuring system Ic Lens 63c has a diameter of 53 mm in the embodiment shown here. Rays 43a, 43b and 43c, which emerge as parallel beams from the object region 28c 'in the focal plane 29c of the first optical assembly 31c formed by the lens system 19c, the lens system 65c and the lens 63c and thus form plane wavefronts, fall after passing through the first optical assembly 31c, passing through the cemented element 13c and passing through the beam splitter 11c on the wavefront sensor 47c as plane wavefronts. Non-parallel rays emanating from the object region 28c ', which thus represent non-planar wavefronts, are incident on the wavefront sensor 47c as non-planar wavefronts. As described above, a shape of such non-planar wavefronts can be determined by detecting intensity distributions by the wavefront sensor 47c and subsequent evaluation.

Furthermore, the optical measuring system Ic allows a microscopic image of the object area 28c ¹ . Of a

Point 51 in the object area 28c ¹ in the focal plane 29c of the first optical assembly 31c (and at the same time the lens

63c) radiate rays 81 and rays 83, between which a stereo angle α is included. Beams 81 pass through a region 85 of the objective 63c and

Rays 83 pass through a portion 87 of the objective 63c to continue as parallel beams.

Then beams 81 penetrate a zoom system 89 and

Rays 83 pass through a zoom system 91. Downstream, an eyepiece system and / or a camera can join to image the object area 28c ¹ into an image area.

The distance d between a surface of the objective 63 c closest to the object region 28 c ¹ and the

Object area 28c ¹ is in the illustrated Embodiment 20 cm. This distance d in the illustrated embodiment corresponds to the focal length f (63c) of the objective. Other embodiments provide a 15 cm or 25 cm focal length lens. A focal length f of the first optical assembly 31c, which is formed by lens system 19c, lens system 65c and lens 63c, is about 70 mm in the illustrated embodiment. This provides a large working space for an operation, while the focal length f is much smaller.

In the optical measuring system embodiment Ic illustrated in FIG. 4, the beams 43a, 43b and 43c used for analysis of a wavefront pass through the lens 63c of the optical microscopy system 79 in a region 86 of the lens 63c which is different from the regions 85 and 87, through which rays 81 and 83 fall, which are used for microscopic imaging. Wavefront analysis beams 43a, 43b and 43c are coupled out of other components of the optical microscopy system 79 by folding mirrors 61c.

As an alternative to this type of decoupling, beams 43a, 43b and 43c can also be coupled out between the object area 28c ¹ and the objective 63c of the optical microscopy system 79 by means of the tilt mirror 61 indicated by a dashed line. In this way, for example, embodiment 1 of an optical measuring system illustrated in FIGS. 1A, 1B and IC can be combined with the optical microscopy system 79 or also with an embodiment Id illustrated in FIGS. 5A, 5B. For this purpose, as already mentioned, folding mirror 61 is already Illustrated in Figures IA and IB and Figures 5A and 5B. Rather than shifting the components of wavefront analysis system 77 included in box 67c together, the optical path between lens system 19c and cemented member 13c may be changed by providing a slidable angular reflector 17 as illustrated in FIGS. 1A and 1B. This type of possibility of precompensation of a spherical refractive error of an eye to be examined can be provided both by decoupling the measuring light 43 via folding mirrors 61c and by decoupling the measuring light 43 via folding mirrors 61.

The optical measuring system Ic shows the surgeon a microscopic image of the anterior segment of the eye and at the same time allows to analyze a wavefront of measuring light emerging from the eye. This allows an objective refraction measurement with the wavefront sensor. Due to the large workspace available, the wavefront analysis system does not need to be swung out during operation and swung back in when used again, which simplifies operation and does not require pivotal brackets.

The object area 28c ¹ is located simultaneously in the focal plane of the objective 63c. Downstream of the objective 63c, rays 81 and 83 emanating from a point 51 of the object region 28c ¹ are parallel, which provides further advantages for subsequent components and overall microscopic imaging. In the wavefront analysis system 77 of the optical measuring system Ic, analogous to the embodiment Ib of an optical measuring system, which is illustrated in FIG. 3, further lens elements 71, 73 and 75 can be provided to also analyze wavefronts of measuring light emerging from an aphakic eye. In this way it is possible Eyes with spherical refractive errors of 14 diopters, 19 diopters, 24 diopters and values in between. If the lens elements 71, 73 and 75 are not provided, eyes with spherical refractive errors at least in the range between

5 diopters and +5 diopters are measured by changing the optical path between elements 13 and 19, 13a and 19a, and 13c and 19c.

The Kepler telescope formed by the lens system 65a and cemented member 19a illustrated in Figures 2A and 2B may be replaced by a Galilean telescope or other afocal system.

The entrance area 45 of the wavefront sensor has an extension of 6.34 mm * 6.34 mm according to one embodiment. In other embodiments, other dimensions may be provided. The light source 3, 3a or 3b and 3c typically comprises a superluminescent diode and acts as PunktlichtquelIe. Providing variability of an optical path in the optical measurement system for precompensation of spherical refractive error is optional. Polarization optical elements such as λ / 4 plates or the design of the beam splitter as a polarization beam splitter are used for the separation of reflected light, which is produced on optical active surfaces, and measuring light, which emanates from the illumination spot 37 on the retina 39.

FIGS. 5 A and 5 B schematically illustrate a further embodiment of an optical measuring system Id according to the present invention. Again, an illumination beam path or a wavefront beam path is illustrated in FIG. 5A and an object beam path is illustrated in FIG. 5B. The optical measuring system Id comprises the first optical assembly 3Id, which is designed here as a cemented component is a second optical assembly 13d, which is embodied here as a cemented member, and a wavefront sensor 47d.

To illuminate the eye 25, the optical measuring system Id further comprises a light source 3d, which

Send 5d light. Light 5d is going through

Beam shaping optics 7 d converted into convergent measuring light 9 to reflect after reflection at the beam splitter Hd in

Area of the diaphragm 12d to be focused. Upon examination of a right eye 25 Aperture 12d is disposed in a focal plane of the cemented member 31d. To

Enforcement of the cemented 3Id comprises measuring light 9 im

Essentially planar wavefronts, which impinge on the eye 25. After passing through the cornea 33 and the human lens 35 measuring light 9 is focused on a point 37 of the retina 39.

From point 37 goes out light 41, which forms after passing through the human lens 35 and the cornea 33 measuring light 43, which comprises in a right-eye substantially planar wavefronts. The pupil of the human eye is arranged in the object plane 28d in object region 28d '. The distance between the object plane 28d and the cemented element 3Id is indicated as distance d, and the focal length of the cemented element 3 Id is indicated by the distance f in FIG. 5A. Measuring light 43 emanating from the object area 28d 'passes through cemented element 3Id, crosses in a plane of the diaphragm 12d, passes through beam splitter Hd, penetrates cemented element 13d in order to impinge on the entrance region 45d of wavefront sensor 47d in the case of right-handed eyes as plane wavefronts.

Cement member 3Id and cemented member 13d together form an afocal system, in particular a Kepler system. For this purpose, the cemented element 3 Id and the cemented element 13d are at a distance arranged along the optical axis 10d, which corresponds to the sum of the focal length of the cemented element 3id and the focal length of the cemented element 13d.

By shifting along the optical axis 10d, indicated by double arrow 16d, the components contained within the box 14d, i. H. the light source 3d, the beam-shaping optics 7d, the beam splitter Hd and the diaphragm 12d, can also be achieved by examining a spherically ill-sighted eye 25, that a small area illumination spot 37 can be produced on the retina 39 of the eye 25. In this case, the measuring light 43 emanating from the object area 28d 'is not formed by substantially plane wavefronts, which thus also applies to the measuring light which strikes the entrance area 45d of the wavefront sensor 47d. For this reason, in the embodiment of the optical measuring system Id, a wavefront sensor with a particularly large dynamic measuring range is used. Thus, the wavefront sensor 47d used in Embodiment Id is able to measure wavefronts of relatively small radius of curvature.

FIG. 5B illustrates an object beam path of the optical measuring system Id. Beams 31a, 53b and 53c emanating from a point 28d "in the object area 28d 'in the object plane 28d pass through the cemented element 31d, beam splitter Hd and cemented element 13d to a point 45d' in FIG Entry region of the wavefront sensor 47d to be imaged. It can be seen that the distance d between the cemented element 3 Id and the object plane 28d is much greater than the focal length f of the cemented element 3Id.

The optical measuring system Id may comprise a case mirror 61, which allows the optical measuring system Id with an optical microscopy system 79 as illustrated in FIG. For this purpose, the position of the folding mirror 61 is indicated schematically in Figure 4.

FIG. 6 schematically illustrates an optical measuring system Ie according to an embodiment of the present invention. The optical measuring system Ie illustrated in FIG. 6 is designed to examine an object region 28e 'by analyzing a wavefront originating from the object region and by optical coherence tomography (OCT). For this purpose, the measuring system Ie illustrated in FIG. 6 comprises, in addition to the measuring system 1 illustrated in FIGS. 1A and 1B, an OCT system 93 and an OCT beam splitter 95. The OCT system 93 comprises OCT components 97 which generate an OCT light source of OCT measuring light 99, an optical coupler for dividing and combining OCT measuring light, a reference mirror, a spectrometer, a spatially resolving detector and an evaluation system.

The OCT light source emits OCT measurement light 99, which passes through collimator optics 101 to enter as a collimated OCT measurement light beam into a scanner comprising two scanning mirrors 103, 105. The scanning mirrors 103, 105 are pivotable about mutually perpendicular axes in order to scan the OCT measuring light 99 over the object region 28e '. For illustration purposes, the elements 97, 101 and 103 in FIG. 6 are shown tilted by 90 ° about the connecting line between the two scanning mirrors 103, 105. The OCT measuring light 99 can comprise in a predominant proportion light wavelengths between 1290 nm to 1330 nm.

By way of example, in FIG. 6, three OCT measuring light beams are shown, which are reflected by a point A of the scanning mirror 105 when the scanning mirror 105 is in three different pivoting positions, which pass through Turning about a perpendicular to the plane and through the point A extending axis of rotation can be reached. The three OCT measuring light beams 99 strike the OCT beam splitter 95, which comprises a dichroic mirror 96. The dichroic mirror 96 comprises layers of different dielectric properties deposited on a mirror surface of the dichroic mirror 96 to reflect with high efficiency the incident OCT measurement light 99 and to transmit only a small amount, say less than 30%. After reflection at the dichroic mirror 96, the OCT measuring light 99 passes through the lens 19e (exemplified here as a cemented element plus single lens) and thereupon the cemented element 23e, the cemented element 23e and the lens 19e together forming the first optical assembly 3Ie. Through the first optical assembly 3Ie, the point A in the center of the scanning mirror 105 is imaged on a point A ¹ between the first optical assembly 3 Ie and the object region 28e 'in which the focal point 5Ie of the first optical assembly 3Ie is located. Similarly, a point P at the center of a connecting line between the scanning mirror 103 and the scanning mirror 105 is imaged by the first optical assembly 3Ie at a point P ¹ . At this point, an exemplarily illustrated and thus optionally available folding mirror 61 with a mirror surface can be arranged to deflect OCT measuring light 99 returning to the object region 28e 'and OCT measuring light returning from the object region 28e', which is advantageous, for example, if the optical Measuring system Ie is used together with an optical microscope. In this case, the mirror 61 may be arranged in a microscope beam path between a main objective of the microscope and the object region 28e '.

In particular, in such a case, the property of the optical measuring system Ie, the point P on the on the Folding mirror 61 lying point P ¹ , advantageous because for different pivot positions of the mirror 103, 105, a migration of the point P 'from a center of the folding mirror 61 is minimized so that the folding mirror 61 can be dimensioned so small that a microscopic beam path hardly vignettiert becomes. In order to achieve this, all the scanning mirrors of a scanner, in this case the scanning mirrors 103, 105, should be arranged as close as possible to the point P, and the case mirror 61 should be arranged as close as possible to the point P ¹ .

The three different scanning positions of the scanning mirror 105 corresponding to three OCT measuring light beams strike at three different points within the object area 28 ', on which they interact with the object arranged in the object area 28e'. While only three sample points are shown in FIG. 6 by way of example only, the entire object region 28e 'is scanned by continuous pivoting of the scan mirrors 103, 105.

OCT measuring light 100 emanating from the object area 28e 'has been reflected at different layers within the object and thus carries structural information of the examined object. The reflected OCT measuring light 100 passes through the cemented element 23e, the lens 19e and in turn is largely reflected at the dichroic mirror 96 of the OCT beam splitter 95. After further reflections on the scanning mirrors 105, 103, the returning OCT measuring light 100 passes through the collimator optics 101 to enter an unillustrated optical fiber of the OCT components 97, be superimposed with reference light, spectrally split by a spectrometer, and detected in a spatially resolved manner to become. A spectrum of the OCT measuring light which is interferometrically superimposed with reference light and returned from the object area 28 "is processed in order to be used for the lateral object area 28e '. To obtain structural information about the object under investigation along a depth direction, ie perpendicular to the object plane 28e.

Like the embodiment 1 of an optical measuring system illustrated in FIGS. 1A, 1B, the embodiment of an optical measuring system Ie illustrated in FIG. 6 also comprises components for analyzing a wavefront, which have already been described above. For the sake of clarity, in FIG. 6, a beam path of the measuring light 9, which is guided to the object region 28e 'by cemented element 13e, lens 19e and cemented element 23e, and returning measuring light 43 are not illustrated. These beam paths can be taken from FIGS. 1A and 1B, from which it follows in particular that the object region 28 ', in particular the focal point 51e of the first optical assembly 3Ie, also projects into the embodiment of an optical measuring system Ie illustrated in FIG. Shack sensor 47e is shown.

Thus, this embodiment Ie enables simultaneous examination of the object area 28e 'by analysis of wavefronts emanating from this area and by acquisition of OCT structure data. In particular, it is provided that the wavefront light source 3e be designed in such a way that a substantial portion of the measurement light generated by the light source 3e lies within a wavelength range of approximately 830 nm to 870 nm. The OCT beam splitter 95, in particular its dichroic mirror 96, is designed in this case to transmit a substantial proportion of light in a wavelength range from about 830 nm to 870 nm. This makes it possible to separate the OCT measuring light from the measuring light to examine a wavefront in order to suppress mutual interference. According to other embodiments, no reflector 17e is provided between the lens 19e and the cemented member 13e, so that an optical path of the measuring light 9, 43 used for analysis of a wavefront is rectilinear along an optical axis of cemented elements 19e, 23e, ie, an optical axis of the first Optical assembly 3 Ie, continues to run without being deflected.

According to further embodiments of the present invention, the OCT beam splitter 95 may optionally be provided between the first optical assembly 3Ie and the second optical assembly

13e between the second optical assembly 13e and the

Hartmann-Shack sensor 45e, as indicated by dashed box 95a. In this case, the OCT system 93 is analogously illustrated by a dashed box labeled 93a. These

Embodiment is then favorable when using the OCT system

Structure information about the rear eye section is to be obtained. This arrangement of the OCT beam splitter 95a and the OCT system 93a can in particular for

Application come when the optical measuring system without a

Reflector 17e is executed, as described above.

FIG. 7 schematically illustrates an optical measuring system If according to a further embodiment of the present invention

Invention. The illustrated in Figure 7 optical measuring system

If has similarities with the optical measuring system Ic illustrated in Figure 4, insofar as the optical

Measuring system If also components 67c of a wavefront analysis system 77, as well as a microscopy system

79 includes. The microscope system 79 comprises a

Lens 63 c arranged around a focal plane 29 c

Object area 28c ¹ after enforcing zoom systems 89, 91 to image. Likewise, the wavefront analysis system 77 is formed, wavefronts originating from or passing through the object region 28c 'with respect to their shape to examine, as described in detail with reference to Figure 4 above.

In addition to the functionalities of the optical measuring system Ic illustrated in FIG

FIG. 7 illustrates optical measuring system If below

Using the OCT system 93a a structural

Examination of the object area 28c ¹ along a

Depth direction, d. H. perpendicular to the focal plane 29c. For this purpose, the OCT system 93a includes components similar to those in FIG

FIG. 6 illustrates OCT system 93 described in this context.

FIG. 7 schematically illustrates a beam path of the OCT measuring light 99a for three different pivot positions of the scanner formed by scanning mirrors 103a, 105a, with a reference to FIG

Figure characteristic of the system from the point P between the scanning mirrors 103a, 105a in three different directions outgoing OCT measuring light 99a is considered.

At this point P, alternatively, a center of a 3D

Be arranged scanner. If a scanner comprises more than one reflecting surface, the point P should advantageously be arranged in such a way as to minimize distances to mirror surfaces of the scanner.

Emanating from the point P OCT measuring light beams 99 are reflected by the scanning mirror 105a, 96a reflected in large part by the dichroic mirror and pass through the through cemented lens 19c, and lens component formed 65c afocal system to the point P ^1, which in the center of FaItspiegeis 61c is arranged to be imaged. In that the point P is provided by the cemented component 19c, ie the second optical subassembly of the first optical assembly 31c and by the cemented component 65c, ie the second lens group of the first optical subassembly When the first optics assembly is imaged at the point P ¹ in the center of the folding mirror 61c, the point P ¹ only minimally travels for different pivot positions of the scanner formed by scanning mirrors 105a, 103a, with migration for an ideally located 3D scanner having only one reflecting surface should disappear. Thus, an extension of the folding mirror 61c can be made so small that microscopic beam paths 81 and 83 can be guided past it into corresponding zoom systems of the stereomicroscope system 79.

As an alternative to the arrangement of the OCT beam splitter 95a and the OCT system 93a, as illustrated in FIG. 7, these, at least the OCT beam splitter 95a, can be arranged between the cemented component 65c and the folding mirror 61c.

As an alternative to the embodiments illustrated in FIGS. 6 and 7, the OCT beam splitter 95, 95a or the dichroic mirror 96, 96a can be designed to transmit OCT measuring light 99, 99a with greater effectiveness than to reflect and furthermore to design the measuring light 9, which is used for wavefront measurement to reflect with greater effectiveness than to transmit. Thus, in alternative embodiments, the wavefront analysis system 77 and the OCT system 93, 93a may be reversed in their spatial arrangement.

According to other embodiments of the present invention, a wavelength range which is 70% of a

Total intensity of the OCT measuring light includes with a

Wavelength range, which comprises 70% of a total intensity of the wavefront investigation light, overlap. Thus, for examination of the wavefront as well as for examination by means of OCT light in a same

Wavelength range can be used. In this case is the execution of the OCT beam splitter 95, 95a with a dichroic mirror 96, 96a not required. In this case, it is preferable to successively perform a measurement for determining the wavefront and a structure measurement using OCT to avoid mutual interference. However, simultaneous execution of both measurements is also possible. In the beam path and polarization-optical elements, such as λ / 4 platelets or the like can be inserted. For example, the element 11, IIa, IIb, 11c, Hd, He can be embodied as a polarization beam splitter.

According to other embodiments, the OCT measuring light beam 99 is not focused in the object area 28c ¹ , 28e ', but in a lower area, such as on the retina of an examined eye.

Claims

Claims. Eye surgery measuring system comprising:

a wavefront sensor (47) for characterizing a shape of a wavefront of measurement light (43) in an entrance region (45) of the wavefront sensor; and

imaging optics (13, 19, 23) having a first optics assembly (31) and a second optics assembly (13) for imaging an object region (28 ') into the entrance region of the wavefront sensor by means of the measurement light (43);

where: 1.1 * f <d, where

f represents a focal length of the first optical assembly (31) and

d represents a distance between the object region (28 ') and the first optical assembly (31).

2. eye surgery measuring system according to claim 1, wherein: 1.5 * f <d, in particular 2 * f <d.

3. ophthalmic surgery measuring system according to claim 1 or 2, wherein the following applies: d> 150 mm, in particular d> 175 mm, more particularly d> 190 mm.

4. eye surgery measuring system according to one of claims 1 to 3, wherein at least one of the first optical assembly (31) and the second optical assembly is a refractive optical assembly, in particular a lens group.

The ophthalmic surgery measurement system of any one of claims 1 to 4, further comprising a third optic assembly

(89, 91) arranged and formed to image the object area, along a microscope beam path, in an image area different from the entrance area of the wavefront sensor.

6. ophthalmic surgery measuring system according to one of claims 1 to 5, wherein the object region (28 ¹ ) in a focal region (29) of the first optical assembly is located.

The eye surgery measurement system of claim 6, wherein the first optics assembly comprises a first optics subassembly

(23) and a second optical subassembly (19) which are spaced from each other.

8. eye surgery measuring system according to claim 6 or 7, wherein one of the measuring light along a beam path of the measuring light traversed optical path (OP, OP ₁ , OP ₂ ) between the first optical assembly (31) and the second optical assembly (13) is variable.

9. eye surgery measuring system according to claim 8, which is adapted by changing the optical path (OP, OPi, OP ₂ ) between the first optical assembly (31) and the second optical assembly (13) has a shape of a wavefront of one in the object area ( 28 ') arranged to characterize the eye of ametropia from -5 D to +25 D of outgoing measurement light.

10. ophthalmic surgery measuring system according to claim 8 or 9, further comprising a reflector for deflecting the measuring light, in particular by 180 °, which is arranged displaceably in the beam path of the measuring light between the first optical assembly (31) and the second optical assembly (13) to change the transmitted optical path of the measuring light.

The eye surgery measurement system of claim 10, wherein the reflector comprises at least two mirror surfaces arranged at a non-zero angle.

12. ophthalmic surgery measuring system according to claim 10, wherein the reflector comprises a retroreflector (17), in particular an angle reflector (corceer cube).

13. eye surgery measuring system according to one of claims 6 to 12, further comprising a beam splitter (11) which is arranged in a beam path of the measuring light between the inlet region (45) of the wavefront sensor (47) and the second optical assembly (13).

14. ophthalmic surgery measuring system according to one of claims 7 to 13 in conjunction with claim 7, wherein

d (l, 2)> fl * d / (d-fl)

wherein d (l, 2) represents a distance between components of the first optical subassembly (23) and components of the second optical subassembly (19) and

fl a focal length of the first

Optical subassembly (23) represents.

The ophthalmic surgery measuring system according to any one of claims 7 to 14 when appended to claim 7, wherein the first optic subassembly (23) comprises a first lens group (63c), in particular a lens, and a second lens group (65c) remote therefrom.

The ophthalmic surgery measurement system of claim 15 when appended to claim 5, wherein the microscopic ray path penetrates the first lens group (63c) of the first optics subassembly and wherein the third optics assembly comprises a zoom system (89, 91).

The eye surgery measuring system according to claim 15 or 16, wherein a mirror surface (61c) is disposed in the optical path of the measuring light between the first lens group (63c) and the second lens group (65c) of the first optical subassembly (23c).

The eye surgery measurement system of any one of claims 15 to 17, wherein the second lens group (65c) of the first optical subassembly and the second optical subassembly

(19c) together form an afocal system, in particular a Kepler system.

The eye surgery measuring system according to any one of claims 15 to 18, wherein the object area is disposed in a focal area of the first lens group (63c) of the first optical subassembly (23c).

The ophthalmic surgery measurement system of any one of claims 6 to 14 when appended to claim 5, wherein the third optics assembly comprises a lens (63c) and a zoom system (89, 91), wherein the beam path of the measurement light is free from permeation of the objective and wherein a mirror surface (61) is arranged in the beam path of the measuring light between the object region (28c ¹ ) and the first optical subassembly (23c).

21. eye surgery measuring system according to claim 20, wherein the object area is arranged in a focal region of the lens.

The ophthalmic surgery measuring system according to any one of claims 1 to 5, wherein said object area (28d ') is different from a focal area (29d) of said first optical unit (3Id).

The ophthalmic surgery measurement system of claim 22, wherein the first optic assembly (3Id) and the second optic assembly (13d) together form an afocal system, in particular a Kepler system.

24 eye surgery measuring system according to claim 22 or 23, wherein a beam splitter (lld) in a beam path of the measuring light between the first optical assembly (3Id) and the second optical assembly (13d) is slidably disposed.

25. The eye surgery measuring system according to claim 22, wherein a mirror surface is arranged between the first optical assembly and the object region.

26. ophthalmic surgery measuring system according to one of the preceding claims, further comprising an OCT system with an OCT light source for generating OCT measuring light, wherein in an OCT optical path of the OCT measuring light between the first optical assembly (31) and the second optical assembly (13) or between the second Optics assembly (13) and the inlet region (45) of the wavefront sensor, an OCT beam splitter is arranged so as to guide the OCT measuring light for illuminating the object area through at least the first optical assembly (31).

27. eye surgery measuring system according to claim 26, further comprising at least one arranged in the OCT beam path between the OCT light source and the OCT beam splitter pivotable scanning mirror.

The ophthalmic surgery measurement system of claim 27 when appended to claim 15 and claim 17, wherein said scan mirror, said second lens group (65c) of said first optical subassembly (23) and said second suboptic subassembly (19c) are formed and arranged proximate to an area imaging the scan mirror onto a region near the mirror surface (61c).

29. ophthalmic surgery measuring system according to one of claims 1 to 28, further comprising a

Wavefront light source for generating the measuring light

(9), wherein at least 80% of a total intensity of the measurement light produced is formed by light having wavelengths between 800 nm and 870 nm, in particular between 820 nm and 840 nm.

30 eye surgery measuring system according to one of claims 26 to 29, wherein at least 80% of an overall intensity of the generated OCT measuring light is formed by light having wavelengths between 1280 nm and 1320 nm, in particular between 1300 nm and 1320 nm.

31. ophthalmic surgery measuring system according to one of claims 26 to 30, wherein the OCT beam splitter a Includes dichroic mirror, which in a wavelength range of 800 nm to 870 nm, in particular from 820 nm to 840 nm, at least twice as high or at most half as high transmission as in a wavelength range of 1280 nm to 1340 nm, in particular 1300 nm 1320 nm.

32. The eye surgery measuring system according to claim 26, wherein the OCT beam splitter comprises a dichroic mirror, which in one

Wavelength range of 1280 nm to 1340 nm, in particular 1300 nm to 1320 nm, at least twice as high or at most half as high reflectivity as in a

Wavelength range from 800 nm to 870 nm, in particular from 820 nm to 840 nm.

33. The eye surgery measuring system according to claim 26, wherein at least 70% of an intensity of OCT measuring light incident on the OCT beam splitter is reflected at the OCT beam splitter.

34. Eye surgery measuring system according to one of claims 26 to 33, wherein at least 70% of an intensity of incident on the OCT beam splitter measuring light (9) is transmitted through the OCT beam splitter.

35. eye surgery measuring system according to one of claims 26 to 34, wherein at least 60%, in particular at least

80%, a total intensity of the measuring light is formed by light of a wavelength range in which wavelength range 80% of an overall intensity of the OCT measuring light.