ZA924998B - Aqueous photosensitive resin compsition and print obtained by using the same - Google Patents
Aqueous photosensitive resin compsition and print obtained by using the sameInfo
- Publication number
- ZA924998B ZA924998B ZA924998A ZA924998A ZA924998B ZA 924998 B ZA924998 B ZA 924998B ZA 924998 A ZA924998 A ZA 924998A ZA 924998 A ZA924998 A ZA 924998A ZA 924998 B ZA924998 B ZA 924998B
- Authority
- ZA
- South Africa
- Prior art keywords
- same
- photosensitive resin
- print obtained
- aqueous photosensitive
- compsition
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Processes Of Treating Macromolecular Substances (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Graft Or Block Polymers (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3172247A JP3040202B2 (en) | 1991-07-12 | 1991-07-12 | Aqueous photosensitive resin composition and method for producing printed circuit board using the same |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA924998B true ZA924998B (en) | 1994-09-26 |
Family
ID=15938352
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA924998A ZA924998B (en) | 1991-07-12 | 1992-07-06 | Aqueous photosensitive resin compsition and print obtained by using the same |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP3040202B2 (en) |
CA (1) | CA2072702A1 (en) |
GB (1) | GB2257711B (en) |
HK (1) | HK22696A (en) |
TW (1) | TW236071B (en) |
ZA (1) | ZA924998B (en) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06258832A (en) * | 1992-11-17 | 1994-09-16 | W R Grace & Co | Photosensitive resin composition |
US5445919A (en) * | 1993-06-14 | 1995-08-29 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition |
AU660882B1 (en) * | 1994-01-25 | 1995-07-06 | Morton International, Inc. | Waterborne photoresists having non-ionic fluorocarbon surfactants |
US5364737A (en) * | 1994-01-25 | 1994-11-15 | Morton International, Inc. | Waterbone photoresists having associate thickeners |
AU661438B1 (en) * | 1994-01-25 | 1995-07-20 | Morton International, Inc. | Waterborne photoresists having polysiloxanes |
AU660881B1 (en) * | 1994-01-25 | 1995-07-06 | Morton International, Inc. | Waterborne photoresists having binders neutralized with amino acrylates |
JPH08289942A (en) * | 1995-04-25 | 1996-11-05 | Yukio Tsunoda | Golf club |
US5512607A (en) * | 1995-06-06 | 1996-04-30 | W. R. Grace & Co.-Conn. | Unsaturated epoxy ester with quaternary ammonium and phosphate groups |
WO1996041240A1 (en) * | 1995-06-07 | 1996-12-19 | W.R. Grace & Co.-Conn. | Water photoresist emulsions and methods of preparation thereof |
JPH0915857A (en) * | 1995-06-29 | 1997-01-17 | Hitachi Chem Co Ltd | Colored image forming material, photosensitive solution using it, photosensitive element, and manufacture of color filter |
EP1451640A1 (en) * | 2001-12-03 | 2004-09-01 | Showa Denko K.K. | Photosensitive composition and production processes for photosensitive film and printed wiring board |
ATE376036T1 (en) * | 2002-05-06 | 2007-11-15 | Sun Chemical Corp | SINGLE-PHASE WATER-BASED ENERGY CURRENT COMPOSITIONS AND METHOD FOR PRODUCING COATINGS AND PRINTING INKS |
US7226959B2 (en) | 2003-11-06 | 2007-06-05 | Sun Chemical Corporation | Water soluble energy curable stereo-crosslinkable ionomer compositions |
JP5624288B2 (en) * | 2009-06-30 | 2014-11-12 | 互応化学工業株式会社 | Manufacturing method of printed wiring board with through hole |
WO2011122473A1 (en) | 2010-03-29 | 2011-10-06 | 三菱製紙株式会社 | Photosensitive composition and photosensitive lithographic printing plate material |
JP7181775B2 (en) * | 2017-12-12 | 2022-12-01 | 三洋化成工業株式会社 | Aqueous (co)polymer composition |
CN115197381B (en) * | 2022-09-16 | 2022-11-25 | 广州鹿山新材料股份有限公司 | Unsaturated SMA resin modified polypropylene and preparation method thereof |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DD250593A1 (en) * | 1984-04-03 | 1987-10-14 | Wolfen Filmfab Veb | PHOTOPOLYMERIZABLE MATERIAL |
PT85756A (en) * | 1986-09-22 | 1988-10-14 | Napp Systems Inc | PROCESS FOR THE PREPARATION OF PHOTOSENSIVE AND REVEALED SHEETS WITH WATER |
EP0287019A3 (en) * | 1987-04-16 | 1990-07-11 | W.R. Grace & Co.-Conn. | Aqueous developable, radiation curable composition |
EP0295944A3 (en) * | 1987-06-18 | 1989-09-06 | Napp Systems (Usa) Inc. | Photosensitive resin composition and printing plate prepared therefrom |
US5403698A (en) * | 1990-10-16 | 1995-04-04 | Hitachi Chemical Company, Ltd. | Negative type photosensitive electrodepositing resin composition |
-
1991
- 1991-07-12 JP JP3172247A patent/JP3040202B2/en not_active Expired - Lifetime
-
1992
- 1992-06-29 CA CA002072702A patent/CA2072702A1/en not_active Abandoned
- 1992-07-06 ZA ZA924998A patent/ZA924998B/en unknown
- 1992-07-13 GB GB9214858A patent/GB2257711B/en not_active Expired - Fee Related
- 1992-07-21 TW TW081105764A patent/TW236071B/zh active
-
1996
- 1996-02-08 HK HK22696A patent/HK22696A/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
GB2257711A (en) | 1993-01-20 |
GB2257711B (en) | 1995-09-20 |
JPH0527437A (en) | 1993-02-05 |
GB9214858D0 (en) | 1992-08-26 |
TW236071B (en) | 1994-12-11 |
CA2072702A1 (en) | 1993-01-13 |
JP3040202B2 (en) | 2000-05-15 |
HK22696A (en) | 1996-02-16 |
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