ZA921510B - Polymers and a radiation-sensitive mixture prepared with these - Google Patents

Polymers and a radiation-sensitive mixture prepared with these

Info

Publication number
ZA921510B
ZA921510B ZA921510A ZA921510A ZA921510B ZA 921510 B ZA921510 B ZA 921510B ZA 921510 A ZA921510 A ZA 921510A ZA 921510 A ZA921510 A ZA 921510A ZA 921510 B ZA921510 B ZA 921510B
Authority
ZA
South Africa
Prior art keywords
polymers
radiation
mixture prepared
sensitive mixture
sensitive
Prior art date
Application number
ZA921510A
Other languages
English (en)
Inventor
Klaus Juergen Przybilla
Juergen Przybilla Klaus
Ralph Dammel
Dammel Ralph
Georg Pawlowski
Pawlowski Georg
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of ZA921510B publication Critical patent/ZA921510B/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/96—Esters of carbonic or haloformic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F20/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00—Technologies relating to chemical industry
    • Y02P20/50—Improvements relating to the production of bulk chemicals
    • Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials For Photolithography (AREA)
ZA921510A 1991-03-01 1992-02-28 Polymers and a radiation-sensitive mixture prepared with these ZA921510B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4106558A DE4106558C2 (de) 1991-03-01 1991-03-01 Polymere mit Einheiten aus Estern von alpha,beta-ungesättigten Carbonsäuren und damit hergestelltes strahlungsempfindliches Gemisch

Publications (1)

Publication Number Publication Date
ZA921510B true ZA921510B (en) 1992-10-28

Family

ID=6426246

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA921510A ZA921510B (en) 1991-03-01 1992-02-28 Polymers and a radiation-sensitive mixture prepared with these

Country Status (4)

Country Link
AU (1) AU8496691A (de)
DE (1) DE4106558C2 (de)
WO (1) WO1992015549A1 (de)
ZA (1) ZA921510B (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070190465A1 (en) * 2004-03-24 2007-08-16 Jsr Corporation Positively radiation-sensitive resin composition

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3528930A1 (de) * 1985-08-13 1987-02-26 Hoechst Ag Polymere verbindungen und diese enthaltendes strahlungsempfindliches gemisch
DE3902115A1 (de) * 1989-01-25 1990-08-02 Basf Ag Strahlungsempfindliche polymere

Also Published As

Publication number Publication date
DE4106558A1 (de) 1992-09-03
WO1992015549A1 (de) 1992-09-17
AU8496691A (en) 1992-10-06
DE4106558C2 (de) 2000-05-31

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