ZA872295B - - Google Patents
Info
- Publication number
- ZA872295B ZA872295B ZA872295A ZA872295A ZA872295B ZA 872295 B ZA872295 B ZA 872295B ZA 872295 A ZA872295 A ZA 872295A ZA 872295 A ZA872295 A ZA 872295A ZA 872295 B ZA872295 B ZA 872295B
- Authority
- ZA
- South Africa
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB868606258A GB8606258D0 (en) | 1986-03-13 | 1986-03-13 | Processing of lithographic printing plates |
| CA000533663A CA1309291C (en) | 1986-03-13 | 1987-04-02 | Processing of exposed lithographic printing plates |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ZA872295B true ZA872295B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1987-09-22 |
Family
ID=25671294
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ZA872295A ZA872295B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1986-03-13 | 1987-03-30 |
Country Status (3)
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5286609A (en) * | 1988-11-01 | 1994-02-15 | Yamatoya & Co., Ltd. | Process for the formation of a negative resist pattern from a composition comprising a diazoquinone compound and an imidazole and having as a heat step the use of a hot water containing spray |
| DE3940911A1 (de) * | 1989-12-12 | 1991-06-13 | Hoechst Ag | Verfahren zur herstellung negativer kopien |
| US5330875A (en) * | 1993-05-05 | 1994-07-19 | Sun Chemical Corporation | Process for producing negative and positive original images on a bilevel printing plate utilizing non-silver halide layer and silver halide overlayer |
| US5372915A (en) * | 1993-05-19 | 1994-12-13 | Eastman Kodak Company | Method of making a lithographic printing plate containing a resole resin and a novolac resin in the radiation sensitive layer |
| EP0672954B1 (en) * | 1994-03-14 | 1999-09-15 | Kodak Polychrome Graphics LLC | Radiation-sensitive composition containing a resole resin, a novolac resin, an infrared absorber and a triazine and use thereof in lithographic printing plates |
| US5466557A (en) * | 1994-08-29 | 1995-11-14 | Eastman Kodak Company | Radiation-sensitive composition containing a resole resin, a novolac resin, a latent bronsted acid, an infrared absorber and terephthalaldehyde and use thereof in lithographic printing plates |
| US5491046A (en) * | 1995-02-10 | 1996-02-13 | Eastman Kodak Company | Method of imaging a lithographic printing plate |
| JP3147908B2 (ja) | 1996-04-23 | 2001-03-19 | コダック ポリクローム グラフィックス カンパニー リミテッド | 感熱性組成物および該組成物を使用したリソグラフィックプリンティングフォームの作製方法 |
| US5705322A (en) * | 1996-09-30 | 1998-01-06 | Eastman Kodak Company | Method of providing an image using a negative-working infrared photosensitive element |
| US6117610A (en) * | 1997-08-08 | 2000-09-12 | Kodak Polychrome Graphics Llc | Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use |
| US5858626A (en) | 1996-09-30 | 1999-01-12 | Kodak Polychrome Graphics | Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition |
| US5705308A (en) * | 1996-09-30 | 1998-01-06 | Eastman Kodak Company | Infrared-sensitive, negative-working diazonaphthoquinone imaging composition and element |
| US5919601A (en) * | 1996-11-12 | 1999-07-06 | Kodak Polychrome Graphics, Llc | Radiation-sensitive compositions and printing plates |
| US6063544A (en) * | 1997-03-21 | 2000-05-16 | Kodak Polychrome Graphics Llc | Positive-working printing plate and method of providing a positive image therefrom using laser imaging |
| US6090532A (en) * | 1997-03-21 | 2000-07-18 | Kodak Polychrome Graphics Llc | Positive-working infrared radiation sensitive composition and printing plate and imaging method |
| AU8229498A (en) | 1997-07-05 | 1999-01-25 | Kodak Polychrome Graphics Llc | Pattern-forming methods |
| US6060217A (en) * | 1997-09-02 | 2000-05-09 | Kodak Polychrome Graphics Llc | Thermal lithographic printing plates |
| US7264354B2 (en) * | 1999-07-02 | 2007-09-04 | E-Vision, Llc | Method and apparatus for correcting vision using an electro-active phoropter |
| US6143479A (en) * | 1999-08-31 | 2000-11-07 | Kodak Polychrome Graphics Llc | Developing system for alkaline-developable lithographic printing plates |
| US6255042B1 (en) | 1999-11-24 | 2001-07-03 | Kodak Polychrome Graphics, Llc | Developing system for alkaline-developable lithographic printing plates with different interlayers |
| US6691618B2 (en) | 2000-05-08 | 2004-02-17 | Pisces-Print Imaging Sciences, Inc. | Chemical imaging of a lithographic printing plate |
| US6315916B1 (en) | 2000-05-08 | 2001-11-13 | Pisces-Print Image Sciences, Inc. | Chemical imaging of a lithographic printing plate |
| US20040154489A1 (en) * | 2000-05-08 | 2004-08-12 | Deutsch Albert S. | Chemical imaging of a lithographic printing plate |
| US6677106B2 (en) | 2002-01-03 | 2004-01-13 | Kodak Polychrome Graphics Llc | Method and equipment for using photo- or thermally imagable, negatively working patterning compositions |
| US6599676B2 (en) | 2002-01-03 | 2003-07-29 | Kodak Polychrome Graphics Llc | Process for making thermal negative printing plate |
| US6843176B2 (en) * | 2002-04-26 | 2005-01-18 | Kodak Polychrome Graphics, Llc | Method to remove unwanted, unexposed, radiation-sensitive layer in a lithographic printing plate |
| US7041174B2 (en) * | 2003-02-19 | 2006-05-09 | Sunmodics,Inc. | Grafting apparatus and method of using |
| WO2013181498A1 (en) | 2012-06-01 | 2013-12-05 | Surmodics, Inc. | Apparatus and method for coating balloon catheters |
| US9827401B2 (en) | 2012-06-01 | 2017-11-28 | Surmodics, Inc. | Apparatus and methods for coating medical devices |
| US11090468B2 (en) | 2012-10-25 | 2021-08-17 | Surmodics, Inc. | Apparatus and methods for coating medical devices |
| US11628466B2 (en) | 2018-11-29 | 2023-04-18 | Surmodics, Inc. | Apparatus and methods for coating medical devices |
| US11819590B2 (en) | 2019-05-13 | 2023-11-21 | Surmodics, Inc. | Apparatus and methods for coating medical devices |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL280959A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1961-07-28 | |||
| US3723120A (en) * | 1971-08-30 | 1973-03-27 | Du Pont | Process for hardening photohardenable images |
| SU542167A1 (ru) * | 1974-11-19 | 1977-01-05 | Украинский Научно-Исследовательский Институт Полиграфической Промышленности | Способ изготовлени фотополимерных печатных форм |
| US4148934A (en) * | 1977-12-02 | 1979-04-10 | W. R. Grace Ltd. | Secondary photocuring of photocured printing plate, apparatus and method |
| US4338007A (en) * | 1978-12-22 | 1982-07-06 | Howard A. Fromson | Apparatus and process for making lithographic printing plate with reinforced image |
| DE3020976C2 (de) * | 1980-06-03 | 1983-01-27 | Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf | Verfahren zur Erhöhung der Verarbeitungsbreite von lichthärtbaren Aufzeichnungsmaterialien |
| JPS5897043A (ja) * | 1981-12-04 | 1983-06-09 | Teijin Ltd | 液中後露光法 |
| JPS58100128A (ja) * | 1981-12-10 | 1983-06-14 | Teijin Ltd | 液中後露光方法 |
| US4415654A (en) * | 1982-08-19 | 1983-11-15 | Hercules Incorporated | Post-exposure process |
| NL8203521A (nl) * | 1982-09-10 | 1984-04-02 | Philips Nv | Werkwijze voor het vervaardigen van een inrichting. |
| DE3325022A1 (de) * | 1983-07-11 | 1985-01-24 | Hoechst Ag, 6230 Frankfurt | Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden |
| DE3325023A1 (de) * | 1983-07-11 | 1985-01-24 | Hoechst Ag, 6230 Frankfurt | Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden |
| GB2171530B (en) * | 1985-02-27 | 1989-06-28 | Imtec Products Inc | Method of producing reversed photoresist images by vapour diffusion |
-
1987
- 1987-03-30 ZA ZA872295A patent/ZA872295B/xx unknown
- 1987-04-02 CA CA000533663A patent/CA1309291C/en not_active Expired - Fee Related
-
1988
- 1988-11-14 US US07/274,730 patent/US4927741A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CA1309291C (en) | 1992-10-27 |
| US4927741A (en) | 1990-05-22 |