ZA83253B - Process for the deposition of metals on semiconductor powders - Google Patents

Process for the deposition of metals on semiconductor powders

Info

Publication number
ZA83253B
ZA83253B ZA83253A ZA83253A ZA83253B ZA 83253 B ZA83253 B ZA 83253B ZA 83253 A ZA83253 A ZA 83253A ZA 83253 A ZA83253 A ZA 83253A ZA 83253 B ZA83253 B ZA 83253B
Authority
ZA
South Africa
Prior art keywords
metals
deposition
semiconductor powders
powders
semiconductor
Prior art date
Application number
ZA83253A
Other languages
English (en)
Inventor
Kurt Meier
Niklaus Buehler
Jean-Francois Reber
Original Assignee
Ciba Geigy Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy Ag filed Critical Ciba Geigy Ag
Publication of ZA83253B publication Critical patent/ZA83253B/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B13/00—Obtaining lead
    • C22B13/04—Obtaining lead by wet processes
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B11/00—Obtaining noble metals
    • C22B11/04—Obtaining noble metals by wet processes
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B15/00—Obtaining copper
    • C22B15/0063—Hydrometallurgy
    • C22B15/0084—Treating solutions
    • C22B15/0086—Treating solutions by physical methods
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B17/00—Obtaining cadmium
    • C22B17/04—Obtaining cadmium by wet processes
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B25/00—Obtaining tin
    • C22B25/06—Obtaining tin from scrap, especially tin scrap
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B43/00—Obtaining mercury
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B9/00—General processes of refining or remelting of metals; Apparatus for electroslag or arc remelting of metals
    • C22B9/16—Remelting metals
    • C22B9/22—Remelting metals with heating by wave energy or particle radiation
    • C22B9/221—Remelting metals with heating by wave energy or particle radiation by electromagnetic waves, e.g. by gas discharge lamps
    • C22B9/225—Remelting metals with heating by wave energy or particle radiation by electromagnetic waves, e.g. by gas discharge lamps by microwaves
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/14—Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources
    • C23C18/143—Radiation by light, e.g. photolysis or pyrolysis
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00—Technologies related to metal processing
    • Y02P10/20—Recycling

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • Plasma & Fusion (AREA)
  • Catalysts (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
ZA83253A 1982-01-15 1983-01-14 Process for the deposition of metals on semiconductor powders ZA83253B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH24182 1982-01-15

Publications (1)

Publication Number Publication Date
ZA83253B true ZA83253B (en) 1983-10-26

Family

ID=4182503

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA83253A ZA83253B (en) 1982-01-15 1983-01-14 Process for the deposition of metals on semiconductor powders

Country Status (8)

Country Link
US (2) US4559237A (no)
EP (2) EP0084517B1 (no)
JP (1) JPS58123888A (no)
CA (1) CA1243272A (no)
DE (1) DE3365362D1 (no)
ES (1) ES519001A0 (no)
IN (1) IN159370B (no)
ZA (1) ZA83253B (no)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6120302A (ja) * 1984-07-06 1986-01-29 Hitachi Maxell Ltd 強磁性粉末とその製造方法
US4612208A (en) * 1985-04-22 1986-09-16 Westinghouse Electric Corp. Coupling aid for laser fusion of metal powders
EP0233498B1 (en) * 1986-01-22 1991-08-21 Hitachi, Ltd. Process and apparatus of photoelectrocalalytically reducing noble metals in a nitric acid solution
AT389099B (de) * 1987-09-08 1989-10-10 Simmering Graz Pauker Ag Verfahren und vorrichtung zur reinigung einer mit organischen und/oder anorganischen fremdstoffen belasteten fluessigkeit, sowie verwendung einer halbleiterschicht
US4888204A (en) * 1988-09-12 1989-12-19 Hughes Aircraft Company Photochemical deposition of high purity gold films
US5137607A (en) * 1990-04-27 1992-08-11 Wisconsin Alumni Research Foundation Reactor vessel using metal oxide ceramic membranes
US5616532A (en) * 1990-12-14 1997-04-01 E. Heller & Company Photocatalyst-binder compositions
JP2538851Y2 (ja) * 1991-02-08 1997-06-18 矢崎総業株式会社 自動車用計器の照明装置
US5849200A (en) * 1993-10-26 1998-12-15 E. Heller & Company Photocatalyst-binder compositions
FR2763260A1 (fr) * 1997-05-14 1998-11-20 Rhodia Chimie Sa Procede de traitement de gaz pour la reduction des emissions des oxydes d'azote utilisant un catalyseur a phase catalytique obtenue par reduction radiolytique ou photolytique et compositions catalytiques specifiques
US6635281B2 (en) 1998-12-23 2003-10-21 Alza Corporation Gastric retaining oral liquid dosage form
US6342249B1 (en) 1998-12-23 2002-01-29 Alza Corporation Controlled release liquid active agent formulation dosage forms
US20050232995A1 (en) 2002-07-29 2005-10-20 Yam Nyomi V Methods and dosage forms for controlled delivery of paliperidone and risperidone
US20050152967A1 (en) * 2003-03-28 2005-07-14 Pfab, Lp Dynamic variable release
ES2221802B1 (es) * 2003-06-17 2006-04-16 Universidad Rey Juan Carlos Procedimiento para la recuperacion de oro y/o plata a partir de una disolucion de complejos cianuro de oro y/o plata.
EP1684713A1 (en) * 2003-11-14 2006-08-02 ALZA Corporation Controlled release of topirimate in liquid dosage forms
WO2006023286A2 (en) * 2004-08-19 2006-03-02 Alza Corporation Controlled release nanoparticle active agent formulation dosage forms and methods
CA2596029A1 (en) * 2005-01-27 2006-08-03 David E. Edgren Oral osmotic dosage form having a high flux membrane
CN101232868A (zh) * 2005-04-19 2008-07-30 阿尔扎公司 曲马多和加巴喷丁的控释递药剂型
AR055099A1 (es) * 2005-07-28 2007-08-08 Alza Corp Formulaciones liquidas para la administracion controlada de derivados de bencisoxazol
US20070077309A1 (en) * 2005-09-30 2007-04-05 Wong Patrick S Banded controlled release nanoparticle active agent formulation dosage forms and methods
PL116330U1 (en) * 2005-10-31 2007-04-02 Alza Corp Method for the reduction of alcohol provoked rapid increase in the released dose of the orally administered opioide with prolonged liberation

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3907566A (en) * 1971-07-23 1975-09-23 Canon Kk Photosensitive material containing inorganic compound coated metal particles and the use thereof in photographic development processes
US3993802A (en) * 1971-07-29 1976-11-23 Photocircuits Division Of Kollmorgen Corporation Processes and products for making articles for electroless plating
US4239789A (en) * 1979-05-08 1980-12-16 International Business Machines Corporation Maskless method for electroless plating patterns
US4264421A (en) * 1979-05-30 1981-04-28 Board Of Regents, University Of Texas System Photocatalytic methods for preparing metallized powders
DD157989A3 (de) * 1980-10-10 1982-12-22 Lothar Gierth Verfahren zur strukturierten chemisch-reduktiven metallabscheidung

Also Published As

Publication number Publication date
EP0084517A1 (de) 1983-07-27
US4619838A (en) 1986-10-28
JPS58123888A (ja) 1983-07-23
CA1243272A (en) 1988-10-18
EP0084517B1 (de) 1986-08-20
DE3365362D1 (en) 1986-09-25
ES8402621A1 (es) 1984-03-01
ES519001A0 (es) 1984-03-01
US4559237A (en) 1985-12-17
IN159370B (no) 1987-05-09
EP0163876B1 (de) 1987-09-30
EP0163876A1 (de) 1985-12-11

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