ZA795794B - Photopolymerisable compositions - Google Patents

Photopolymerisable compositions

Info

Publication number
ZA795794B
ZA795794B ZA00795794A ZA795794A ZA795794B ZA 795794 B ZA795794 B ZA 795794B ZA 00795794 A ZA00795794 A ZA 00795794A ZA 795794 A ZA795794 A ZA 795794A ZA 795794 B ZA795794 B ZA 795794B
Authority
ZA
South Africa
Prior art keywords
polymerisation
acid
compositions
under
photopolymerisable compositions
Prior art date
Application number
ZA00795794A
Other languages
English (en)
Inventor
R Mcguiness
A Ledwith
Original Assignee
Ici Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ici Ltd filed Critical Ici Ltd
Publication of ZA795794B publication Critical patent/ZA795794B/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08Saturated oxiranes
    • C08G65/10Saturated oxiranes characterised by the catalysts used
    • C08G65/105Onium compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymerization Catalysts (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Epoxy Resins (AREA)
  • Polyethers (AREA)
ZA00795794A 1978-10-27 1979-10-29 Photopolymerisable compositions ZA795794B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB7842235 1978-10-27

Publications (1)

Publication Number Publication Date
ZA795794B true ZA795794B (en) 1980-10-29

Family

ID=10500642

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA00795794A ZA795794B (en) 1978-10-27 1979-10-29 Photopolymerisable compositions

Country Status (12)

Country Link
EP (1) EP0010897B1 (de)
JP (1) JPS5560521A (de)
AT (1) ATE6002T1 (de)
AU (1) AU5195979A (de)
CA (1) CA1126436A (de)
DE (1) DE2966584D1 (de)
DK (1) DK453579A (de)
ES (1) ES485415A1 (de)
IE (1) IE49092B1 (de)
NZ (1) NZ191925A (de)
ZA (1) ZA795794B (de)
ZW (1) ZW21279A1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3107087A1 (de) * 1980-02-29 1981-12-24 CIBA-GEIGY AG, 4002 Basel "photopolymerisierbare gemische und verfahren zur photopolymerisation von kationisch polymerisierbaren verbindungen"
US4336366A (en) * 1980-02-29 1982-06-22 Ciba-Geigy Corporation Thermally polymerizable mixtures and processes for the thermally-initiated polymerization of cationically polymerizable compounds
US4351708A (en) * 1980-02-29 1982-09-28 Ciba-Geigy Corporation Photochemically or thermally polymerizable mixtures
US4564578A (en) * 1982-11-25 1986-01-14 Ciba-Geigy Corporation Novel thioxanthones substituted by alpha-aminoalkyl groups
JPS61500974A (ja) * 1983-10-28 1986-05-15 ロクタイト.コ−ポレ−シヨン 2つの硬化タイプのプレポリマ−を含む光硬化性組成物
GB8332073D0 (en) * 1983-12-01 1984-01-11 Ciba Geigy Ag Polymerisable compositions
DE3639955A1 (de) * 1986-11-22 1988-05-26 Wolfen Filmfab Veb Verfahren zur herstellung fotopolymerisierbarer materialien
DE3641053A1 (de) * 1986-12-19 1988-06-16 Wolfen Filmfab Veb Fotopolymerisierbares material
US4800152A (en) * 1987-03-16 1989-01-24 International Business Machines Corporation Negative resist compositions
IE872653L (en) * 1987-10-05 1989-04-05 Hoffmann La Roche Cationically curable compositions
JPH01238656A (ja) * 1988-03-18 1989-09-22 Nippon Paint Co Ltd 高感度光重合性組成物
US6635195B1 (en) * 2000-02-04 2003-10-21 Essilor International Compagnie Generale D'optique Cationic photopolymerization of diepisulfides and application to the manufacture of optical lenses

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4028204A (en) * 1971-11-18 1977-06-07 Sun Chemical Corporation Photopolymerizable compounds and compositions comprising the product of the reaction of a resin and a polycarboxy-substituted benzophenone
US3741769A (en) * 1972-10-24 1973-06-26 Minnesota Mining & Mfg Novel photosensitive polymerizable systems and their use
GB1539192A (en) * 1975-01-27 1979-01-31 Ici Ltd Photopolymerisable compositions
US4256828A (en) * 1975-09-02 1981-03-17 Minnesota Mining And Manufacturing Company Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials

Also Published As

Publication number Publication date
EP0010897B1 (de) 1984-01-25
IE49092B1 (en) 1985-07-24
JPS5560521A (en) 1980-05-07
CA1126436A (en) 1982-06-22
EP0010897A3 (en) 1981-01-21
AU5195979A (en) 1981-04-30
DE2966584D1 (en) 1984-03-01
ATE6002T1 (de) 1984-02-15
IE792031L (en) 1980-04-27
NZ191925A (en) 1981-12-15
DK453579A (da) 1980-04-28
ZW21279A1 (en) 1981-05-27
ES485415A1 (es) 1980-09-01
EP0010897A2 (de) 1980-05-14

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