DK453579A - Fotopolymeriserbare materialer afledte belaegninger og andre polymeriserede produkter - Google Patents
Fotopolymeriserbare materialer afledte belaegninger og andre polymeriserede produkterInfo
- Publication number
- DK453579A DK453579A DK453579A DK453579A DK453579A DK 453579 A DK453579 A DK 453579A DK 453579 A DK453579 A DK 453579A DK 453579 A DK453579 A DK 453579A DK 453579 A DK453579 A DK 453579A
- Authority
- DK
- Denmark
- Prior art keywords
- polymerized products
- photopolymerizable materials
- polymerisation
- acid
- products
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
- C08G65/08—Saturated oxiranes
- C08G65/10—Saturated oxiranes characterised by the catalysts used
- C08G65/105—Onium compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Paints Or Removers (AREA)
- Polymerisation Methods In General (AREA)
- Polymerization Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
- Epoxy Resins (AREA)
- Polyethers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB7842235 | 1978-10-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DK453579A true DK453579A (da) | 1980-04-28 |
Family
ID=10500642
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DK453579A DK453579A (da) | 1978-10-27 | 1979-10-26 | Fotopolymeriserbare materialer afledte belaegninger og andre polymeriserede produkter |
Country Status (12)
| Country | Link |
|---|---|
| EP (1) | EP0010897B1 (de) |
| JP (1) | JPS5560521A (de) |
| AT (1) | ATE6002T1 (de) |
| AU (1) | AU5195979A (de) |
| CA (1) | CA1126436A (de) |
| DE (1) | DE2966584D1 (de) |
| DK (1) | DK453579A (de) |
| ES (1) | ES485415A1 (de) |
| IE (1) | IE49092B1 (de) |
| NZ (1) | NZ191925A (de) |
| ZA (1) | ZA795794B (de) |
| ZW (1) | ZW21279A1 (de) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3107087A1 (de) * | 1980-02-29 | 1981-12-24 | CIBA-GEIGY AG, 4002 Basel | "photopolymerisierbare gemische und verfahren zur photopolymerisation von kationisch polymerisierbaren verbindungen" |
| US4336366A (en) * | 1980-02-29 | 1982-06-22 | Ciba-Geigy Corporation | Thermally polymerizable mixtures and processes for the thermally-initiated polymerization of cationically polymerizable compounds |
| US4351708A (en) * | 1980-02-29 | 1982-09-28 | Ciba-Geigy Corporation | Photochemically or thermally polymerizable mixtures |
| US4564578A (en) * | 1982-11-25 | 1986-01-14 | Ciba-Geigy Corporation | Novel thioxanthones substituted by alpha-aminoalkyl groups |
| JPS61500974A (ja) * | 1983-10-28 | 1986-05-15 | ロクタイト．コ−ポレ−シヨン | ２つの硬化タイプのプレポリマ−を含む光硬化性組成物 |
| GB8332073D0 (en) * | 1983-12-01 | 1984-01-11 | Ciba Geigy Ag | Polymerisable compositions |
| DE3639955A1 (de) * | 1986-11-22 | 1988-05-26 | Wolfen Filmfab Veb | Verfahren zur herstellung fotopolymerisierbarer materialien |
| DE3641053A1 (de) * | 1986-12-19 | 1988-06-16 | Wolfen Filmfab Veb | Fotopolymerisierbares material |
| US4800152A (en) * | 1987-03-16 | 1989-01-24 | International Business Machines Corporation | Negative resist compositions |
| IE872653L (en) * | 1987-10-05 | 1989-04-05 | Hoffmann La Roche | Cationically curable compositions |
| JPH01238656A (ja) * | 1988-03-18 | 1989-09-22 | Nippon Paint Co Ltd | 高感度光重合性組成物 |
| US6635195B1 (en) * | 2000-02-04 | 2003-10-21 | Essilor International Compagnie Generale D'optique | Cationic photopolymerization of diepisulfides and application to the manufacture of optical lenses |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4028204A (en) * | 1971-11-18 | 1977-06-07 | Sun Chemical Corporation | Photopolymerizable compounds and compositions comprising the product of the reaction of a resin and a polycarboxy-substituted benzophenone |
| US3741769A (en) * | 1972-10-24 | 1973-06-26 | Minnesota Mining & Mfg | Novel photosensitive polymerizable systems and their use |
| GB1539192A (en) * | 1975-01-27 | 1979-01-31 | Ici Ltd | Photopolymerisable compositions |
| US4256828A (en) * | 1975-09-02 | 1981-03-17 | Minnesota Mining And Manufacturing Company | Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials |
-
1979
- 1979-10-16 DE DE7979302225T patent/DE2966584D1/de not_active Expired
- 1979-10-16 AT AT79302225T patent/ATE6002T1/de not_active IP Right Cessation
- 1979-10-16 EP EP79302225A patent/EP0010897B1/de not_active Expired
- 1979-10-19 AU AU51959/79A patent/AU5195979A/en not_active Abandoned
- 1979-10-23 IE IE2031/79A patent/IE49092B1/en unknown
- 1979-10-24 CA CA338,323A patent/CA1126436A/en not_active Expired
- 1979-10-24 ZW ZW212/79A patent/ZW21279A1/xx unknown
- 1979-10-25 NZ NZ191925A patent/NZ191925A/xx unknown
- 1979-10-26 ES ES485415A patent/ES485415A1/es not_active Expired
- 1979-10-26 JP JP13783279A patent/JPS5560521A/ja active Pending
- 1979-10-26 DK DK453579A patent/DK453579A/da not_active Application Discontinuation
- 1979-10-29 ZA ZA00795794A patent/ZA795794B/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| EP0010897B1 (de) | 1984-01-25 |
| IE49092B1 (en) | 1985-07-24 |
| JPS5560521A (en) | 1980-05-07 |
| CA1126436A (en) | 1982-06-22 |
| EP0010897A3 (en) | 1981-01-21 |
| AU5195979A (en) | 1981-04-30 |
| ZA795794B (en) | 1980-10-29 |
| DE2966584D1 (en) | 1984-03-01 |
| ATE6002T1 (de) | 1984-02-15 |
| IE792031L (en) | 1980-04-27 |
| NZ191925A (en) | 1981-12-15 |
| ZW21279A1 (en) | 1981-05-27 |
| ES485415A1 (es) | 1980-09-01 |
| EP0010897A2 (de) | 1980-05-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DK453579A (da) | Fotopolymeriserbare materialer afledte belaegninger og andre polymeriserede produkter | |
| DK453679A (da) | Fotopolymeriserbare naterialer afledte belaegninger og andre polymeriserede produkter | |
| DE3379158D1 (en) | Photopolymerisable compositions | |
| EP0284561A3 (de) | Neue alpha-Aminoacetophenone als Photoinitiatoren | |
| AU600746B2 (en) | Two-layer system | |
| JPS55118030A (en) | Photopolymerizable composition | |
| ES2058345T3 (es) | Masas dentales. | |
| BE862988A (fr) | Nouveaux photoinducteurs de polymerisation, compositions photopolymerisables les contenant et procede de photopolymerisation | |
| FR2332290A1 (fr) | Masses a base d'esters acryliques, polymerisables au moyen de rayons ultra-violets | |
| EP0144148A2 (de) | Fotohärtbare Zusammensetzungen aus Prepolymeren mit zwei verschiedenen Härtungsverfahren | |
| ES8800449A1 (es) | Procedimiento para la formacion de imagenes por exposicion a radiacion actinica | |
| JPS52129790A (en) | Ultraviolet/curing composition | |
| DE3473357D1 (de) | Photopolymerizable laminate | |
| EP0404499A3 (de) | Lichtempfindliche Zusammensetzungen, die ausgewählte photoaktive Materialien enthalten, und ihre Verwendung zur Herstellung hochauflösender Photolackbilder mittels naher UV-Strahlung | |
| FI945787A0 (fi) | Sulfoniumsuoloja ja menetelmä niiden valmistamiseksi | |
| TW343939B (en) | Photosensitive resin composition for photo-cast-molding | |
| DK0520242T3 (da) | Optisk aktive svovlholdige aminosyre-derivater, deres fremstilling, deres polymerisation til optisk aktive polymerer og deres anvendelse | |
| ATE189319T1 (de) | Lichtempfindliches material und verfahren zur herstellung von flachdruckplatten | |
| KR890017674A (ko) | 레이저 사진 정보기록에 적당한 광중합가능한 조성물 | |
| EP0403100A3 (de) | Photopolymerisierbare Zusammensetzungen mit hoher Empfindlichkeit, die wasserstoffabgebende Merkaptane enthalten | |
| KR910006778A (ko) | 반수성 현상액에서 현상 가능한 광반응성 수지 조성물 | |
| ES2068470T3 (es) | Granulados de aglutinante para barnices. | |
| SE419679B (sv) | Fotosensitiv komposition | |
| JPS538687A (en) | Resin compositions |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AHB | Application shelved due to non-payment |