ZA727392B - Thin layer semiconductor device - Google Patents

Thin layer semiconductor device

Info

Publication number
ZA727392B
ZA727392B ZA727392A ZA727392A ZA727392B ZA 727392 B ZA727392 B ZA 727392B ZA 727392 A ZA727392 A ZA 727392A ZA 727392 A ZA727392 A ZA 727392A ZA 727392 B ZA727392 B ZA 727392B
Authority
ZA
South Africa
Prior art keywords
semiconductor device
thin layer
layer semiconductor
thin
semiconductor
Prior art date
Application number
ZA727392A
Other languages
English (en)
Inventor
Y Sakai
Original Assignee
Pioneer Electronic Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pioneer Electronic Corp filed Critical Pioneer Electronic Corp
Publication of ZA727392B publication Critical patent/ZA727392B/xx

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N52/00—Hall-effect devices
    • H10N52/01—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N52/00—Hall-effect devices
    • H10N52/80—Constructional details
    • H10N52/85—Magnetic active materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/005—Antimonides of gallium or indium
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/065—Gp III-V generic compounds-processing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/122—Polycrystalline
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/15—Silicon on sapphire SOS
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/169—Vacuum deposition, e.g. including molecular beam epitaxy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S420/00—Alloys or metallic compositions
    • Y10S420/903—Semiconductive

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Hall/Mr Elements (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Physical Vapour Deposition (AREA)
ZA727392A 1971-10-26 1972-10-17 Thin layer semiconductor device ZA727392B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP46084808A JPS513632B2 (xx) 1971-10-26 1971-10-26

Publications (1)

Publication Number Publication Date
ZA727392B true ZA727392B (en) 1973-06-27

Family

ID=13841004

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA727392A ZA727392B (en) 1971-10-26 1972-10-17 Thin layer semiconductor device

Country Status (12)

Country Link
US (1) US3850685A (xx)
JP (1) JPS513632B2 (xx)
AU (1) AU4801772A (xx)
CA (1) CA974152A (xx)
CH (1) CH541880A (xx)
DE (1) DE2252197A1 (xx)
FR (1) FR2157964A1 (xx)
GB (1) GB1367262A (xx)
IT (1) IT966480B (xx)
NL (1) NL7214481A (xx)
SE (1) SE385784B (xx)
ZA (1) ZA727392B (xx)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3928092A (en) * 1974-08-28 1975-12-23 Bell Telephone Labor Inc Simultaneous molecular beam deposition of monocrystalline and polycrystalline III(a)-V(a) compounds to produce semiconductor devices
SE393967B (sv) * 1974-11-29 1977-05-31 Sateko Oy Forfarande och for utforande av stroleggning mellan lagren i ett virkespaket
JPS53100945A (en) * 1977-02-17 1978-09-02 Nippon Dennetsu Keiki Kk Jet stream solder tank
US4468415A (en) * 1981-03-30 1984-08-28 Asahi Kasei Kogyo Kabushiki Kaisha Indium-antimony complex crystal semiconductor and process for production thereof
US4539178A (en) * 1981-03-30 1985-09-03 Asahi Kasei Kogyo Kabushiki Kaisha Indium-antimony complex crystal semiconductor and process for production thereof
US4399097A (en) * 1981-07-29 1983-08-16 Bell Telephone Laboratories, Incorporated Preparation of III-V materials by reduction
JPS5913385A (ja) * 1982-07-13 1984-01-24 Asahi Chem Ind Co Ltd ＩｎＡｓホ−ル素子
GB8324231D0 (en) * 1983-09-09 1983-10-12 Dolphin Machinery Soldering apparatus
US4740386A (en) * 1987-03-30 1988-04-26 Rockwell International Corporation Method for depositing a ternary compound having a compositional profile

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3441453A (en) * 1966-12-21 1969-04-29 Texas Instruments Inc Method for making graded composition mixed compound semiconductor materials
US3674549A (en) * 1968-02-28 1972-07-04 Pioneer Electronic Corp Manufacturing process for an insb thin film semiconductor element
US3558373A (en) * 1968-06-05 1971-01-26 Avco Corp Infrared detecting materials,methods of preparing them,and intermediates
US3666553A (en) * 1970-05-08 1972-05-30 Bell Telephone Labor Inc Method of growing compound semiconductor films on an amorphous substrate

Also Published As

Publication number Publication date
AU4801772A (en) 1974-04-26
SE385784B (sv) 1976-07-26
FR2157964A1 (xx) 1973-06-08
GB1367262A (en) 1974-09-18
IT966480B (it) 1974-02-11
NL7214481A (xx) 1973-05-01
CA974152A (en) 1975-09-09
US3850685A (en) 1974-11-26
JPS513632B2 (xx) 1976-02-04
CH541880A (de) 1973-09-15
JPS4850681A (xx) 1973-07-17
DE2252197A1 (de) 1973-05-03

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