ZA724729B - Method for the manufacturing of a semiconductor device - Google Patents
Method for the manufacturing of a semiconductor deviceInfo
- Publication number
- ZA724729B ZA724729B ZA724729A ZA724729A ZA724729B ZA 724729 B ZA724729 B ZA 724729B ZA 724729 A ZA724729 A ZA 724729A ZA 724729 A ZA724729 A ZA 724729A ZA 724729 B ZA724729 B ZA 724729B
- Authority
- ZA
- South Africa
- Prior art keywords
- manufacturing
- semiconductor device
- semiconductor
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2139631A DE2139631C3 (de) | 1971-08-07 | 1971-08-07 | Verfahren zum Herstellen eines Halbleiterbauelements, bei dem der Rand einer Diffusionszone auf den Rand einer polykristallinen Siliciumelektrode ausgerichtet ist |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ZA724729B true ZA724729B (en) | 1973-04-25 |
Family
ID=5816091
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ZA724729A ZA724729B (en) | 1971-08-07 | 1972-07-11 | Method for the manufacturing of a semiconductor device |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS4829370A (enExample) |
| AU (1) | AU4513372A (enExample) |
| DE (1) | DE2139631C3 (enExample) |
| FR (1) | FR2148439B1 (enExample) |
| GB (1) | GB1339384A (enExample) |
| IT (1) | IT963314B (enExample) |
| ZA (1) | ZA724729B (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5131255B1 (enExample) * | 1971-02-27 | 1976-09-06 | ||
| GB1540450A (en) * | 1975-10-29 | 1979-02-14 | Intel Corp | Self-aligning double polycrystalline silicon etching process |
| JPS56130497A (en) * | 1980-03-19 | 1981-10-13 | Toyota Motor Corp | Formation of pattern or the like utilizing electro-deposition coating |
| US4318759A (en) * | 1980-07-21 | 1982-03-09 | Data General Corporation | Retro-etch process for integrated circuits |
| JPS6137998A (ja) * | 1984-07-27 | 1986-02-22 | Seiko Instr & Electronics Ltd | 時計文字板の製造方法 |
-
1971
- 1971-08-07 DE DE2139631A patent/DE2139631C3/de not_active Expired
-
1972
- 1972-07-11 ZA ZA724729A patent/ZA724729B/xx unknown
- 1972-07-25 IT IT27361/72A patent/IT963314B/it active
- 1972-07-27 FR FR7227021A patent/FR2148439B1/fr not_active Expired
- 1972-07-31 AU AU45133/72A patent/AU4513372A/en not_active Expired
- 1972-08-03 GB GB3623272A patent/GB1339384A/en not_active Expired
- 1972-08-07 JP JP47079014A patent/JPS4829370A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| FR2148439A1 (enExample) | 1973-03-23 |
| DE2139631B2 (de) | 1978-08-31 |
| JPS4829370A (enExample) | 1973-04-18 |
| AU4513372A (en) | 1974-02-07 |
| FR2148439B1 (enExample) | 1976-03-12 |
| DE2139631A1 (de) | 1973-03-01 |
| GB1339384A (en) | 1973-12-05 |
| DE2139631C3 (de) | 1979-05-10 |
| IT963314B (it) | 1974-01-10 |
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