ZA712565B - Improvements in and relating to light-sensitive copying compositions and etchresistant reproduction material made therefrom - Google Patents
Improvements in and relating to light-sensitive copying compositions and etchresistant reproduction material made therefromInfo
- Publication number
- ZA712565B ZA712565B ZA712565A ZA712565A ZA712565B ZA 712565 B ZA712565 B ZA 712565B ZA 712565 A ZA712565 A ZA 712565A ZA 712565 A ZA712565 A ZA 712565A ZA 712565 B ZA712565 B ZA 712565B
- Authority
- ZA
- South Africa
- Prior art keywords
- etchresistant
- relating
- light
- material made
- made therefrom
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2019426A DE2019426C3 (de) | 1970-04-22 | 1970-04-22 | Lichtempfindliches Gemisch und lichtempfindliches Kopiermaterial |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA712565B true ZA712565B (en) | 1972-01-26 |
Family
ID=5768839
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA712565A ZA712565B (en) | 1970-04-22 | 1971-04-21 | Improvements in and relating to light-sensitive copying compositions and etchresistant reproduction material made therefrom |
Country Status (9)
Country | Link |
---|---|
AU (1) | AU2797371A (de) |
BE (1) | BE765966A (de) |
BR (1) | BR7102385D0 (de) |
CA (1) | CA979711A (de) |
DE (1) | DE2019426C3 (de) |
FR (1) | FR2090544A5 (de) |
GB (1) | GB1352411A (de) |
NL (1) | NL7104769A (de) |
ZA (1) | ZA712565B (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2655553A1 (de) * | 1976-12-08 | 1978-06-15 | Licentia Gmbh | Mittels einer diazoniumverbindung sensibilisierte waesserige loesung eines polymerisates sowie verwendung einer solchen loesung zur herstellung von leuchtschirmen fuer farbbildkathodenstrahlroehren |
DE3268611D1 (en) * | 1981-02-25 | 1986-03-06 | Hitachi Ltd | Colorless liquid crystalline compounds |
DE3130987A1 (de) * | 1981-08-05 | 1983-02-24 | Hoechst Ag, 6000 Frankfurt | Verfahren zur herstellung von flachdruckformen aus einem lichtempfindlichen material auf basis von diazoniumsalz-polykondensationsprodukten |
US4511640A (en) * | 1983-08-25 | 1985-04-16 | American Hoechst Corporation | Aqueous developable diazo lithographic printing plates with admixture of polyvinyl acetate and styrene maleic acid ester copolymer |
DE3404366A1 (de) * | 1984-02-08 | 1985-08-14 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial |
US4772538A (en) * | 1985-08-02 | 1988-09-20 | American Hoechst Corporation | Water developable lithographic composition |
US4822720A (en) * | 1985-08-02 | 1989-04-18 | Hoechst Celanese Corporation | Water developable screen printing composition |
US4780392A (en) * | 1985-08-02 | 1988-10-25 | Hoechst Celanese Corporation | Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer |
US4652604A (en) * | 1985-08-02 | 1987-03-24 | American Hoechst Corporation | Radiation-polymerizable composition and element containing a photopolymer composition |
US4707437A (en) * | 1985-08-02 | 1987-11-17 | Hoechst Celanese Corporation | Radiation-polymerizable composition and element containing a photopolymer composition |
-
1970
- 1970-04-22 DE DE2019426A patent/DE2019426C3/de not_active Expired
-
1971
- 1971-04-08 NL NL7104769A patent/NL7104769A/xx unknown
- 1971-04-19 BE BE765966A patent/BE765966A/xx unknown
- 1971-04-19 CA CA110,659A patent/CA979711A/en not_active Expired
- 1971-04-20 GB GB1016071*[A patent/GB1352411A/en not_active Expired
- 1971-04-21 ZA ZA712565A patent/ZA712565B/xx unknown
- 1971-04-21 AU AU27973/71A patent/AU2797371A/en not_active Expired
- 1971-04-22 BR BR2385/71A patent/BR7102385D0/pt unknown
- 1971-04-22 FR FR7114302A patent/FR2090544A5/fr not_active Expired
Also Published As
Publication number | Publication date |
---|---|
BE765966A (fr) | 1971-10-19 |
FR2090544A5 (de) | 1972-01-14 |
DE2019426A1 (de) | 1971-11-11 |
GB1352411A (en) | 1974-05-08 |
NL7104769A (de) | 1971-10-26 |
AU2797371A (en) | 1972-10-26 |
CA979711A (en) | 1975-12-16 |
DE2019426C3 (de) | 1981-01-29 |
BR7102385D0 (pt) | 1973-04-05 |
DE2019426B2 (de) | 1980-05-14 |
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