ZA200702946B - Detonator device - Google Patents
Detonator device Download PDFInfo
- Publication number
- ZA200702946B ZA200702946B ZA200702946A ZA200702946A ZA200702946B ZA 200702946 B ZA200702946 B ZA 200702946B ZA 200702946 A ZA200702946 A ZA 200702946A ZA 200702946 A ZA200702946 A ZA 200702946A ZA 200702946 B ZA200702946 B ZA 200702946B
- Authority
- ZA
- South Africa
- Prior art keywords
- oxidant
- porous material
- porous
- energy
- layer
- Prior art date
Links
- 239000010410 layer Substances 0.000 claims description 149
- 239000011148 porous material Substances 0.000 claims description 98
- 239000007800 oxidant agent Substances 0.000 claims description 97
- 230000001590 oxidative effect Effects 0.000 claims description 97
- 239000000758 substrate Substances 0.000 claims description 89
- 239000000463 material Substances 0.000 claims description 69
- 238000000034 method Methods 0.000 claims description 33
- 230000000977 initiatory effect Effects 0.000 claims description 29
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 24
- 230000003287 optical effect Effects 0.000 claims description 22
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 14
- 239000004065 semiconductor Substances 0.000 claims description 14
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 7
- 239000011241 protective layer Substances 0.000 claims description 7
- 239000000377 silicon dioxide Substances 0.000 claims description 7
- 235000012239 silicon dioxide Nutrition 0.000 claims description 7
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 7
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 claims description 6
- 238000012546 transfer Methods 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 230000000694 effects Effects 0.000 claims description 3
- MWFSXYMZCVAQCC-UHFFFAOYSA-N gadolinium(iii) nitrate Chemical group [Gd+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O MWFSXYMZCVAQCC-UHFFFAOYSA-N 0.000 claims description 3
- 235000010333 potassium nitrate Nutrition 0.000 claims description 3
- 239000004323 potassium nitrate Substances 0.000 claims description 3
- 230000008021 deposition Effects 0.000 claims description 2
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 239000002360 explosive Substances 0.000 description 35
- 230000015556 catabolic process Effects 0.000 description 31
- 229910021426 porous silicon Inorganic materials 0.000 description 24
- 229920005591 polysilicon Polymers 0.000 description 22
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 19
- 230000000873 masking effect Effects 0.000 description 19
- 229910052710 silicon Inorganic materials 0.000 description 19
- 239000010703 silicon Substances 0.000 description 19
- 230000005684 electric field Effects 0.000 description 16
- 230000005855 radiation Effects 0.000 description 11
- 238000005516 engineering process Methods 0.000 description 9
- 238000005530 etching Methods 0.000 description 9
- 238000004880 explosion Methods 0.000 description 8
- 238000002955 isolation Methods 0.000 description 8
- 230000007246 mechanism Effects 0.000 description 8
- 230000020169 heat generation Effects 0.000 description 5
- WYTGDNHDOZPMIW-RCBQFDQVSA-N alstonine Natural products C1=CC2=C3C=CC=CC3=NC2=C2N1C[C@H]1[C@H](C)OC=C(C(=O)OC)[C@H]1C2 WYTGDNHDOZPMIW-RCBQFDQVSA-N 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 230000035939 shock Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000013590 bulk material Substances 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 238000001311 chemical methods and process Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000005474 detonation Methods 0.000 description 2
- 238000010892 electric spark Methods 0.000 description 2
- 230000003116 impacting effect Effects 0.000 description 2
- 239000007943 implant Substances 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000013307 optical fiber Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 230000001902 propagating effect Effects 0.000 description 2
- 238000007493 shaping process Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000005864 Sulphur Substances 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000003610 charcoal Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 239000002159 nanocrystal Substances 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 230000021715 photosynthesis, light harvesting Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F42—AMMUNITION; BLASTING
- F42B—EXPLOSIVE CHARGES, e.g. FOR BLASTING, FIREWORKS, AMMUNITION
- F42B3/00—Blasting cartridges, i.e. case and explosive
- F42B3/10—Initiators therefor
- F42B3/11—Initiators therefor characterised by the material used, e.g. for initiator case or electric leads
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F42—AMMUNITION; BLASTING
- F42B—EXPLOSIVE CHARGES, e.g. FOR BLASTING, FIREWORKS, AMMUNITION
- F42B3/00—Blasting cartridges, i.e. case and explosive
- F42B3/10—Initiators therefor
- F42B3/12—Bridge initiators
- F42B3/13—Bridge initiators with semiconductive bridge
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Semiconductor Integrated Circuits (AREA)
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| ZA200702946A ZA200702946B (en) | 2004-11-24 | 2007-04-10 | Detonator device |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| ZA200409462 | 2004-11-24 | ||
| ZA200702946A ZA200702946B (en) | 2004-11-24 | 2007-04-10 | Detonator device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ZA200702946B true ZA200702946B (en) | 2008-05-28 |
Family
ID=36002917
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ZA200702946A ZA200702946B (en) | 2004-11-24 | 2007-04-10 | Detonator device |
Country Status (2)
| Country | Link |
|---|---|
| WO (1) | WO2006058349A1 (fr) |
| ZA (1) | ZA200702946B (fr) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2567183B1 (fr) * | 2010-05-07 | 2019-10-23 | Orica International Pte Ltd | Initiateur, système d'abattage à l'explosif et procédé d'abattage à l'explosif |
| CA2943953C (fr) | 2014-03-24 | 2021-04-20 | Battelle Memorial Institute | Pont semi-conducteur reactif a couche de finition d'oxyde |
| PE20201435A1 (es) | 2018-03-08 | 2020-12-09 | Orica Int Pte Ltd | Sistemas, aparatos, dispositivos y metodos para iniciar o detonar medios explosivos terciarios mediante energia fotonica |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19815928C2 (de) * | 1998-04-09 | 2000-05-11 | Daimler Chrysler Ag | Halbleiterzünder mit verbesserter konstruktiver Festigkeit |
| DE10162413B4 (de) * | 2001-12-19 | 2006-12-21 | Robert Bosch Gmbh | Integriertes Spreng- oder Zündelement und dessen Verwendung |
| DE10204833B4 (de) * | 2002-02-06 | 2005-11-10 | Trw Airbag Systems Gmbh & Co. Kg | Mikroelektronisch-Pyrotechnisches Bauteil |
| DE10204834B4 (de) * | 2002-02-06 | 2005-05-25 | Trw Airbag Systems Gmbh & Co. Kg | Explosionsfähige Zusammensetzung und Verfahren zu deren Herstellung |
| DE10204895B4 (de) * | 2002-02-06 | 2004-07-29 | Diehl Munitionssysteme Gmbh & Co. Kg | Verfahren zur Herstellung von Reaktivstoffen |
-
2005
- 2005-11-24 WO PCT/ZA2005/000175 patent/WO2006058349A1/fr active Application Filing
-
2007
- 2007-04-10 ZA ZA200702946A patent/ZA200702946B/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO2006058349A1 (fr) | 2006-06-01 |
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