ZA200105159B - Coating agent. - Google Patents
Coating agent. Download PDFInfo
- Publication number
- ZA200105159B ZA200105159B ZA200105159A ZA200105159A ZA200105159B ZA 200105159 B ZA200105159 B ZA 200105159B ZA 200105159 A ZA200105159 A ZA 200105159A ZA 200105159 A ZA200105159 A ZA 200105159A ZA 200105159 B ZA200105159 B ZA 200105159B
- Authority
- ZA
- South Africa
- Prior art keywords
- composition
- monomer
- free
- radical
- mixture
- Prior art date
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- 239000011248 coating agent Substances 0.000 title claims description 9
- 239000000178 monomer Substances 0.000 claims description 58
- 239000000203 mixture Substances 0.000 claims description 33
- -1 alkyl radical Chemical class 0.000 claims description 31
- 229920000642 polymer Polymers 0.000 claims description 22
- 239000003999 initiator Substances 0.000 claims description 21
- 239000008199 coating composition Substances 0.000 claims description 19
- 150000001875 compounds Chemical class 0.000 claims description 18
- 239000007795 chemical reaction product Substances 0.000 claims description 17
- 238000006243 chemical reaction Methods 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 13
- 238000000576 coating method Methods 0.000 claims description 9
- 239000000654 additive Substances 0.000 claims description 8
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 7
- 239000006185 dispersion Substances 0.000 claims description 7
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical group C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 claims description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical group [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 6
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 claims description 6
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims description 5
- 239000011541 reaction mixture Substances 0.000 claims description 5
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N N-phenyl amine Natural products NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 claims description 4
- 230000000996 additive effect Effects 0.000 claims description 4
- 239000008346 aqueous phase Substances 0.000 claims description 4
- PJANXHGTPQOBST-QXMHVHEDSA-N cis-stilbene Chemical compound C=1C=CC=CC=1/C=C\C1=CC=CC=C1 PJANXHGTPQOBST-QXMHVHEDSA-N 0.000 claims description 4
- 239000000470 constituent Substances 0.000 claims description 4
- 230000001590 oxidative effect Effects 0.000 claims description 4
- PJANXHGTPQOBST-VAWYXSNFSA-N trans-stilbene Chemical compound C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 claims description 4
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical class C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 claims description 3
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 3
- 229910021529 ammonia Inorganic materials 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 3
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 claims description 2
- 229960002887 deanol Drugs 0.000 claims description 2
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims description 2
- 239000012972 dimethylethanolamine Substances 0.000 claims description 2
- 230000002209 hydrophobic effect Effects 0.000 claims description 2
- 150000003254 radicals Chemical class 0.000 claims description 2
- NQRFAUVGDLHPGH-UHFFFAOYSA-N 2-bromoheptanoic acid Chemical compound CCCCCC(Br)C(O)=O NQRFAUVGDLHPGH-UHFFFAOYSA-N 0.000 claims 1
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 claims 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 claims 1
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 10
- 238000006116 polymerization reaction Methods 0.000 description 8
- 238000003756 stirring Methods 0.000 description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 239000008367 deionised water Substances 0.000 description 6
- 229910021641 deionized water Inorganic materials 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 5
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 4
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- SJIXRGNQPBQWMK-UHFFFAOYSA-N 2-(diethylamino)ethyl 2-methylprop-2-enoate Chemical compound CCN(CC)CCOC(=O)C(C)=C SJIXRGNQPBQWMK-UHFFFAOYSA-N 0.000 description 3
- GNSFRPWPOGYVLO-UHFFFAOYSA-N 3-hydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCO GNSFRPWPOGYVLO-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 3
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 150000001991 dicarboxylic acids Chemical class 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 150000002763 monocarboxylic acids Chemical class 0.000 description 3
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 238000010526 radical polymerization reaction Methods 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Chemical compound C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- DPBJAVGHACCNRL-UHFFFAOYSA-N 2-(dimethylamino)ethyl prop-2-enoate Chemical compound CN(C)CCOC(=O)C=C DPBJAVGHACCNRL-UHFFFAOYSA-N 0.000 description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 2
- QZPSOSOOLFHYRR-UHFFFAOYSA-N 3-hydroxypropyl prop-2-enoate Chemical compound OCCCOC(=O)C=C QZPSOSOOLFHYRR-UHFFFAOYSA-N 0.000 description 2
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 2
- NDWUBGAGUCISDV-UHFFFAOYSA-N 4-hydroxybutyl prop-2-enoate Chemical compound OCCCCOC(=O)C=C NDWUBGAGUCISDV-UHFFFAOYSA-N 0.000 description 2
- ALXUOLQRSSGTMU-UHFFFAOYSA-N 6-(diethylamino)-2-methylhex-2-enamide Chemical compound CCN(CC)CCCC=C(C)C(N)=O ALXUOLQRSSGTMU-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- VVJKKWFAADXIJK-UHFFFAOYSA-N Allylamine Chemical compound NCC=C VVJKKWFAADXIJK-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 2
- 239000012986 chain transfer agent Substances 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
- ZQXSMRAEXCEDJD-UHFFFAOYSA-N n-ethenylformamide Chemical compound C=CNC=O ZQXSMRAEXCEDJD-UHFFFAOYSA-N 0.000 description 2
- XFHJDMUEHUHAJW-UHFFFAOYSA-N n-tert-butylprop-2-enamide Chemical compound CC(C)(C)NC(=O)C=C XFHJDMUEHUHAJW-UHFFFAOYSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 238000009736 wetting Methods 0.000 description 2
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 1
- NRYGCICLBPJWHA-KHPPLWFESA-N (z)-n'-decylbut-2-enediamide Chemical compound CCCCCCCCCCNC(=O)\C=C/C(N)=O NRYGCICLBPJWHA-KHPPLWFESA-N 0.000 description 1
- QLAJNZSPVITUCQ-UHFFFAOYSA-N 1,3,2-dioxathietane 2,2-dioxide Chemical compound O=S1(=O)OCO1 QLAJNZSPVITUCQ-UHFFFAOYSA-N 0.000 description 1
- FSRCPKKQDVVIQS-UHFFFAOYSA-N 1-(prop-2-enoylamino)pentan-3-ylphosphonic acid Chemical compound CCC(P(O)(O)=O)CCNC(=O)C=C FSRCPKKQDVVIQS-UHFFFAOYSA-N 0.000 description 1
- BDHGFCVQWMDIQX-UHFFFAOYSA-N 1-ethenyl-2-methylimidazole Chemical compound CC1=NC=CN1C=C BDHGFCVQWMDIQX-UHFFFAOYSA-N 0.000 description 1
- JWYVGKFDLWWQJX-UHFFFAOYSA-N 1-ethenylazepan-2-one Chemical compound C=CN1CCCCCC1=O JWYVGKFDLWWQJX-UHFFFAOYSA-N 0.000 description 1
- OSSNTDFYBPYIEC-UHFFFAOYSA-N 1-ethenylimidazole Chemical compound C=CN1C=CN=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-N 0.000 description 1
- OSSNTDFYBPYIEC-UHFFFAOYSA-O 1-ethenylimidazole;hydron Chemical class C=CN1C=C[NH+]=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-O 0.000 description 1
- WDRZVZVXHZNSFG-UHFFFAOYSA-N 1-ethenylpyridin-1-ium Chemical class C=C[N+]1=CC=CC=C1 WDRZVZVXHZNSFG-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- QHVBLSNVXDSMEB-UHFFFAOYSA-N 2-(diethylamino)ethyl prop-2-enoate Chemical compound CCN(CC)CCOC(=O)C=C QHVBLSNVXDSMEB-UHFFFAOYSA-N 0.000 description 1
- SSZXAJUPVKMUJH-UHFFFAOYSA-N 2-(dimethylamino)ethyl prop-2-enoate;hydrochloride Chemical compound Cl.CN(C)CCOC(=O)C=C SSZXAJUPVKMUJH-UHFFFAOYSA-N 0.000 description 1
- BDKSYBXVYUGXIG-UHFFFAOYSA-N 2-(ethylamino)ethyl prop-2-enoate Chemical compound CCNCCOC(=O)C=C BDKSYBXVYUGXIG-UHFFFAOYSA-N 0.000 description 1
- 229920000536 2-Acrylamido-2-methylpropane sulfonic acid Polymers 0.000 description 1
- XHZPRMZZQOIPDS-UHFFFAOYSA-N 2-Methyl-2-[(1-oxo-2-propenyl)amino]-1-propanesulfonic acid Chemical compound OS(=O)(=O)CC(C)(C)NC(=O)C=C XHZPRMZZQOIPDS-UHFFFAOYSA-N 0.000 description 1
- MZGMQAMKOBOIDR-UHFFFAOYSA-N 2-[2-(2-hydroxyethoxy)ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCO MZGMQAMKOBOIDR-UHFFFAOYSA-N 0.000 description 1
- VETIYACESIPJSO-UHFFFAOYSA-N 2-[2-(2-hydroxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound OCCOCCOCCOC(=O)C=C VETIYACESIPJSO-UHFFFAOYSA-N 0.000 description 1
- XUDBVJCTLZTSDC-UHFFFAOYSA-N 2-ethenylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C=C XUDBVJCTLZTSDC-UHFFFAOYSA-N 0.000 description 1
- WROUWQQRXUBECT-UHFFFAOYSA-N 2-ethylacrylic acid Chemical compound CCC(=C)C(O)=O WROUWQQRXUBECT-UHFFFAOYSA-N 0.000 description 1
- NEYTXADIGVEHQD-UHFFFAOYSA-N 2-hydroxy-2-(prop-2-enoylamino)acetic acid Chemical compound OC(=O)C(O)NC(=O)C=C NEYTXADIGVEHQD-UHFFFAOYSA-N 0.000 description 1
- IEVADDDOVGMCSI-UHFFFAOYSA-N 2-hydroxybutyl 2-methylprop-2-enoate Chemical compound CCC(O)COC(=O)C(C)=C IEVADDDOVGMCSI-UHFFFAOYSA-N 0.000 description 1
- PSZAEHPBBUYICS-UHFFFAOYSA-N 2-methylidenepropanedioic acid Chemical compound OC(=O)C(=C)C(O)=O PSZAEHPBBUYICS-UHFFFAOYSA-N 0.000 description 1
- XEEYSDHEOQHCDA-UHFFFAOYSA-N 2-methylprop-2-ene-1-sulfonic acid Chemical compound CC(=C)CS(O)(=O)=O XEEYSDHEOQHCDA-UHFFFAOYSA-N 0.000 description 1
- KAKQRSZHYGBPGR-UHFFFAOYSA-N 2-methylpropoxymethyl 2-methylprop-2-enoate Chemical compound CC(C)COCOC(=O)C(C)=C KAKQRSZHYGBPGR-UHFFFAOYSA-N 0.000 description 1
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 description 1
- KFNGWPXYNSJXOP-UHFFFAOYSA-N 3-(2-methylprop-2-enoyloxy)propane-1-sulfonic acid Chemical compound CC(=C)C(=O)OCCCS(O)(=O)=O KFNGWPXYNSJXOP-UHFFFAOYSA-N 0.000 description 1
- BQQGVSONEPNPAB-UHFFFAOYSA-N 3-(diethoxymethylsilyl)propyl 2-methylprop-2-enoate Chemical compound CCOC(OCC)[SiH2]CCCOC(=O)C(C)=C BQQGVSONEPNPAB-UHFFFAOYSA-N 0.000 description 1
- UIVRRNUEJAYDMX-UHFFFAOYSA-N 3-(diethoxymethylsilyl)propyl prop-2-enoate Chemical compound CCOC(OCC)[SiH2]CCCOC(=O)C=C UIVRRNUEJAYDMX-UHFFFAOYSA-N 0.000 description 1
- HHHPYRGQUSPESB-UHFFFAOYSA-N 3-(dimethoxymethylsilyl)propyl prop-2-enoate Chemical compound COC(OC)[SiH2]CCCOC(=O)C=C HHHPYRGQUSPESB-UHFFFAOYSA-N 0.000 description 1
- WWJCRUKUIQRCGP-UHFFFAOYSA-N 3-(dimethylamino)propyl 2-methylprop-2-enoate Chemical compound CN(C)CCCOC(=O)C(C)=C WWJCRUKUIQRCGP-UHFFFAOYSA-N 0.000 description 1
- UFQHFMGRRVQFNA-UHFFFAOYSA-N 3-(dimethylamino)propyl prop-2-enoate Chemical compound CN(C)CCCOC(=O)C=C UFQHFMGRRVQFNA-UHFFFAOYSA-N 0.000 description 1
- WHLXWNNASHWYEM-UHFFFAOYSA-N 3-[di(propan-2-yloxy)methylsilyl]propyl 2-methylprop-2-enoate Chemical compound CC(C)OC(OC(C)C)[SiH2]CCCOC(=O)C(C)=C WHLXWNNASHWYEM-UHFFFAOYSA-N 0.000 description 1
- KIUQKRVLTQTVDR-UHFFFAOYSA-N 3-di(propan-2-yloxy)silylpropyl prop-2-enoate Chemical compound CC(C)O[SiH](OC(C)C)CCCOC(=O)C=C KIUQKRVLTQTVDR-UHFFFAOYSA-N 0.000 description 1
- SLDXSSRFNABVCN-UHFFFAOYSA-N 3-diethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[SiH](OCC)CCCOC(=O)C(C)=C SLDXSSRFNABVCN-UHFFFAOYSA-N 0.000 description 1
- HNVMCAHOYIOFAQ-UHFFFAOYSA-N 3-dimethoxysilylpropyl prop-2-enoate Chemical compound CO[SiH](OC)CCCOC(=O)C=C HNVMCAHOYIOFAQ-UHFFFAOYSA-N 0.000 description 1
- YYPNJNDODFVZLE-UHFFFAOYSA-N 3-methylbut-2-enoic acid Chemical compound CC(C)=CC(O)=O YYPNJNDODFVZLE-UHFFFAOYSA-N 0.000 description 1
- SDYYWRBMQSZLOC-UHFFFAOYSA-N 3-methyloxetane-2,4-dione Chemical compound CC1C(=O)OC1=O SDYYWRBMQSZLOC-UHFFFAOYSA-N 0.000 description 1
- NYUTUWAFOUJLKI-UHFFFAOYSA-N 3-prop-2-enoyloxypropane-1-sulfonic acid Chemical compound OS(=O)(=O)CCCOC(=O)C=C NYUTUWAFOUJLKI-UHFFFAOYSA-N 0.000 description 1
- ZJWCURYIRDLMTM-UHFFFAOYSA-N 3-tributoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCCCO[Si](OCCCC)(OCCCC)CCCOC(=O)C(C)=C ZJWCURYIRDLMTM-UHFFFAOYSA-N 0.000 description 1
- YFISHOAHNLGUEL-UHFFFAOYSA-N 3-tributoxysilylpropyl prop-2-enoate Chemical compound CCCCO[Si](OCCCC)(OCCCC)CCCOC(=O)C=C YFISHOAHNLGUEL-UHFFFAOYSA-N 0.000 description 1
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 1
- XDQWJFXZTAWJST-UHFFFAOYSA-N 3-triethoxysilylpropyl prop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C=C XDQWJFXZTAWJST-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- KBQVDAIIQCXKPI-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=C KBQVDAIIQCXKPI-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- MAGFQRLKWCCTQJ-UHFFFAOYSA-N 4-ethenylbenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(C=C)C=C1 MAGFQRLKWCCTQJ-UHFFFAOYSA-N 0.000 description 1
- JTHZUSWLNCPZLX-UHFFFAOYSA-N 6-fluoro-3-methyl-2h-indazole Chemical compound FC1=CC=C2C(C)=NNC2=C1 JTHZUSWLNCPZLX-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- SWNRQFURMFHRNC-HJWRWDBZSA-N CCCCCC\C(=C\C(N)=O)C(=O)NC Chemical compound CCCCCC\C(=C\C(N)=O)C(=O)NC SWNRQFURMFHRNC-HJWRWDBZSA-N 0.000 description 1
- 239000004971 Cross linker Substances 0.000 description 1
- IEPRKVQEAMIZSS-UHFFFAOYSA-N Di-Et ester-Fumaric acid Natural products CCOC(=O)C=CC(=O)OCC IEPRKVQEAMIZSS-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-WAYWQWQTSA-N Diethyl maleate Chemical compound CCOC(=O)\C=C/C(=O)OCC IEPRKVQEAMIZSS-WAYWQWQTSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- 229920000028 Gradient copolymer Polymers 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- NJSSICCENMLTKO-HRCBOCMUSA-N [(1r,2s,4r,5r)-3-hydroxy-4-(4-methylphenyl)sulfonyloxy-6,8-dioxabicyclo[3.2.1]octan-2-yl] 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)O[C@H]1C(O)[C@@H](OS(=O)(=O)C=2C=CC(C)=CC=2)[C@@H]2OC[C@H]1O2 NJSSICCENMLTKO-HRCBOCMUSA-N 0.000 description 1
- IAXXETNIOYFMLW-COPLHBTASA-N [(1s,3s,4s)-4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl] 2-methylprop-2-enoate Chemical compound C1C[C@]2(C)[C@@H](OC(=O)C(=C)C)C[C@H]1C2(C)C IAXXETNIOYFMLW-COPLHBTASA-N 0.000 description 1
- VUQBZRUPQCOFGI-UHFFFAOYSA-N [1-[(2-methylpropan-2-yl)oxy]-2-phenylethenyl]benzene Chemical group C=1C=CC=CC=1C(OC(C)(C)C)=CC1=CC=CC=C1 VUQBZRUPQCOFGI-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 150000001253 acrylic acids Chemical class 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O ammonium group Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 1
- 239000012935 ammoniumperoxodisulfate Substances 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 1
- KCXMKQUNVWSEMD-UHFFFAOYSA-N benzyl chloride Chemical compound ClCC1=CC=CC=C1 KCXMKQUNVWSEMD-UHFFFAOYSA-N 0.000 description 1
- 229940073608 benzyl chloride Drugs 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 1
- 239000003139 biocide Substances 0.000 description 1
- 229920005605 branched copolymer Polymers 0.000 description 1
- INLLPKCGLOXCIV-UHFFFAOYSA-N bromoethene Chemical compound BrC=C INLLPKCGLOXCIV-UHFFFAOYSA-N 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- PVEOYINWKBTPIZ-UHFFFAOYSA-N but-3-enoic acid Chemical compound OC(=O)CC=C PVEOYINWKBTPIZ-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- NEHMKBQYUWJMIP-NJFSPNSNSA-N chloro(114C)methane Chemical compound [14CH3]Cl NEHMKBQYUWJMIP-NJFSPNSNSA-N 0.000 description 1
- HRYZWHHZPQKTII-UHFFFAOYSA-N chloroethane Chemical compound CCCl HRYZWHHZPQKTII-UHFFFAOYSA-N 0.000 description 1
- WQHCGPGATAYRLN-UHFFFAOYSA-N chloromethane;2-(dimethylamino)ethyl prop-2-enoate Chemical compound ClC.CN(C)CCOC(=O)C=C WQHCGPGATAYRLN-UHFFFAOYSA-N 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 229940018557 citraconic acid Drugs 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- DENRZWYUOJLTMF-UHFFFAOYSA-N diethyl sulfate Chemical compound CCOS(=O)(=O)OCC DENRZWYUOJLTMF-UHFFFAOYSA-N 0.000 description 1
- 229940008406 diethyl sulfate Drugs 0.000 description 1
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical compound COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000007720 emulsion polymerization reaction Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- MEGHWIAOTJPCHQ-UHFFFAOYSA-N ethenyl butanoate Chemical compound CCCC(=O)OC=C MEGHWIAOTJPCHQ-UHFFFAOYSA-N 0.000 description 1
- GFJVXXWOPWLRNU-UHFFFAOYSA-N ethenyl formate Chemical compound C=COC=O GFJVXXWOPWLRNU-UHFFFAOYSA-N 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 229960003750 ethyl chloride Drugs 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical compound FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- ZHNUHDYFZUAESO-UHFFFAOYSA-N formamide Substances NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 239000006221 furniture coating Substances 0.000 description 1
- 238000005227 gel permeation chromatography Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- 239000003630 growth substance Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 125000001841 imino group Chemical group [H]N=* 0.000 description 1
- 239000006115 industrial coating Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 229940119545 isobornyl methacrylate Drugs 0.000 description 1
- 239000010985 leather Substances 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- HNEGQIOMVPPMNR-NSCUHMNNSA-N mesaconic acid Chemical compound OC(=O)C(/C)=C/C(O)=O HNEGQIOMVPPMNR-NSCUHMNNSA-N 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- HNEGQIOMVPPMNR-UHFFFAOYSA-N methylfumaric acid Natural products OC(=O)C(C)=CC(O)=O HNEGQIOMVPPMNR-UHFFFAOYSA-N 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229920006030 multiblock copolymer Polymers 0.000 description 1
- GUAWMXYQZKVRCW-UHFFFAOYSA-N n,2-dimethylaniline Chemical compound CNC1=CC=CC=C1C GUAWMXYQZKVRCW-UHFFFAOYSA-N 0.000 description 1
- DPLUMPJQXVYXBH-UHFFFAOYSA-N n,n-diethyl-2-phenylethenamine Chemical compound CCN(CC)C=CC1=CC=CC=C1 DPLUMPJQXVYXBH-UHFFFAOYSA-N 0.000 description 1
- UTKONZMCFKGKAR-UHFFFAOYSA-N n,n-diethyl-2-phenylprop-1-en-1-amine Chemical compound CCN(CC)C=C(C)C1=CC=CC=C1 UTKONZMCFKGKAR-UHFFFAOYSA-N 0.000 description 1
- 229940088644 n,n-dimethylacrylamide Drugs 0.000 description 1
- YLGYACDQVQQZSW-UHFFFAOYSA-N n,n-dimethylprop-2-enamide Chemical compound CN(C)C(=O)C=C YLGYACDQVQQZSW-UHFFFAOYSA-N 0.000 description 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
- VQGWOOIHSXNRPW-UHFFFAOYSA-N n-butyl-2-methylprop-2-enamide Chemical compound CCCCNC(=O)C(C)=C VQGWOOIHSXNRPW-UHFFFAOYSA-N 0.000 description 1
- YRVUCYWJQFRCOB-UHFFFAOYSA-N n-butylprop-2-enamide Chemical compound CCCCNC(=O)C=C YRVUCYWJQFRCOB-UHFFFAOYSA-N 0.000 description 1
- RQAKESSLMFZVMC-UHFFFAOYSA-N n-ethenylacetamide Chemical compound CC(=O)NC=C RQAKESSLMFZVMC-UHFFFAOYSA-N 0.000 description 1
- YPHQUSNPXDGUHL-UHFFFAOYSA-N n-methylprop-2-enamide Chemical compound CNC(=O)C=C YPHQUSNPXDGUHL-UHFFFAOYSA-N 0.000 description 1
- CNWVYEGPPMQTKA-UHFFFAOYSA-N n-octadecylprop-2-enamide Chemical compound CCCCCCCCCCCCCCCCCCNC(=O)C=C CNWVYEGPPMQTKA-UHFFFAOYSA-N 0.000 description 1
- QQZXAODFGRZKJT-UHFFFAOYSA-N n-tert-butyl-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NC(C)(C)C QQZXAODFGRZKJT-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- HVAMZGADVCBITI-UHFFFAOYSA-N pent-4-enoic acid Chemical compound OC(=O)CCC=C HVAMZGADVCBITI-UHFFFAOYSA-N 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N phosphonic acid group Chemical group P(O)(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920001748 polybutylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- UIIIBRHUICCMAI-UHFFFAOYSA-N prop-2-ene-1-sulfonic acid Chemical compound OS(=O)(=O)CC=C UIIIBRHUICCMAI-UHFFFAOYSA-N 0.000 description 1
- RZKYDQNMAUSEDZ-UHFFFAOYSA-N prop-2-enylphosphonic acid Chemical compound OP(O)(=O)CC=C RZKYDQNMAUSEDZ-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 238000007342 radical addition reaction Methods 0.000 description 1
- 239000012763 reinforcing filler Substances 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000010557 suspension polymerization reaction Methods 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- ZTWTYVWXUKTLCP-UHFFFAOYSA-N vinylphosphonic acid Chemical compound OP(O)(=O)C=C ZTWTYVWXUKTLCP-UHFFFAOYSA-N 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D151/00—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
- C09D151/06—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers grafted on to homopolymers or copolymers of aliphatic hydrocarbons containing only one carbon-to-carbon double bond
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09D133/062—Copolymers with monomers not covered by C09D133/06
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
Description
0.72.0062/02158/Sue
AS ORIGINALLY FILED
Coating composition
The present invention relates to a coating composition comprising at least one reaction product (A) prepared by a process comprising reacting under free-radical conditions at least one free-radically reactable monomer (a) in the presence of at least one free-radical initiator and of a compound (I) as defined below in aqueous phase, to coating compositions comprising at least one polymer (B) as defined herein, and to coating compositions comprising if desired (A) and/or (B) as a dispersion.
WO 98/01478 describes a process for preparing polymers in which the monomer to be reacted, which is selected in particular from vinyl monomers and acid derivatives having unsaturated groups, such as anhydrides, esters and imides of (meth)acrylic acid, for example, is reacted in the presence of a free-radical initiator and a thiocarbonylthio compound as chain transfer agent.
WO 92/13903 describes a process for preparing polymers having a low molecular weight by free-radical chain polymerization of one or more monomers in the presence of a group transfer agent, as defined therein, which has a C-S double bond. On the evidence of that document the compounds described therein having a
C-S double bond act not only as chain transfer agents but also as growth regulators, so that in accordance with that document it is only possible to prepare polymers of low molecular weight in the presence of this compound.
A process for free-radical chain polymerization of unsaturated monomers in aqueous medium and in the presence of a macromonomer having a -CH,-C(X)=CH; end group is defined in WO 93/22351, which also defines X. On the evidence of the examples of that application, various (meth)acrylates or (meth)acrylic acid and, if desired, monomers such as styrene are reacted in each case under emulsion or suspension polymerization conditions.
AMENDED SHEET
-2- 0.2.0062/02158/Sue macromonomer as described in WO 93/2235].
WO 96/15157 likewise describes a process for preparing polymers having a comparatively narrow molecular weight distribution, in which a vinyl monomer, as defined therein, is reacted with a likewise vinyl-terminated macromonomer in the presence of a free-radical initiator.
Furthermore, WO 98/37104 relates to the preparation of polymers of controlled molecular weight, including acrylate-based polymers, by free-radical polymerization of corresponding monomers using a chain transfer agent which is defined more closely therein and has a C-C double bond and radicals which activate that double bond in terms of the free-radical addition reaction of monomers.
A free-radical chain polymerization or copolymerization with an w-unsaturated oligo(methyl methacrylate) with ethyl acrylate, styrene, methyl methacrylate, acrylonitrile and vinyl acetate as comonomers is described in a scientific article in
J. Macromol. Sci.-Chem., A 23(7), 839-852 (1986).
These documents do not mention using the products compositions described therein as coating ingredients.
The above-described polymer structures are of great interest for coating compositions, since such polymers enable the properties of the coating compositions to be set in a specific manner.
A need exists to provide coating compositions constituents which comprise chemically structured polymers which can be prepared by simple polymerization techniques. The polymers of the invention should in particular exhibit great variability in terms of the chemical composition and molecular weight.
The present invention provides the coating composition of the invention comprising at least one reaction product (A), obtainable by a process comprising the following stage(1):
-3- 0.2.0062/02158/Sue (i) reacting under free-radical conditions a reaction mixture comprising at least one free-radically reactable monomer (a) in the presence of at least one free-radical initiator and of a compound (I) of the formula
Ra AR
C=—=C re ~~
Ry Ry Co in which R; to R4 each independently of one another are hydrogen, a substituted or unsubstituted alkyl radical, cycloalkyl radical or aralkyl radical, or an unsubstituted or a substituted aromatic hydrocarbon radical, with the proviso that at least two of R; to R4 are an unsubstituted or a substituted aromatic hydrocarbon radical ) in aqueous phase, and at least one additive (C).
To prepare the abovementioned reaction product it is possible to use all free- radically reactable monomers as monomer (a). As monomer (a) it is preferred to use those free-radically homopolymerizable or copolymerizable compounds which include a hydrophilic group, such as, for example, a carboxyl group. With further preference, the monomers (a) comprise hydrophilic, free-radically homopolymerizable or copolymerizable monomers, i.e., monomers whose solubility in water is greater than that of styrene. It is of course also possible for mixtures of different hydrophilic monomers, and mixtures of at least one hydrophilic monomer and at least one hydrophobic monomer, to be present in the reaction mixture of stage (i). Specific representatives of monomers (a) are: methyl methacrylate, ethyl methacrylate, propyl methacrylate (all isomers), butyl methacrylate (all isomers), 2-ethylhexyl methacrylate, isobornyl methacrylate, methacrylic acid, benzyl methacrylate, phenyl methacrylate, methacrylonitrile, alpha-methylstyrene, methyl acrylate, ethyl acrylate, propyl acrylate (all isomers), butyl acrylate (all isomers), 2-ethylhexyl! acrylate, isobornyl acrylate, acrylic acid, benzyl acrylate, phenyl acrylate, acrylonitrile, styrene, functionalized methacrylates; acrylic acids and styrenes, selected from glycidyl methacrylate, 2-hydroxyethyl methacrylate, hydroxypropyl methacrylate (all isomers), hydroxybutyl methacrylate (all isomers), diethylaminoethyl methacrylate,
-4- 0.2.0062/02158/Sue triethylene glycol methacrylate, itaconic anhydride, itaconic acid, glycidyl acrylate, 2-hydroxyethyl acrylate, hydroxypropyl acrylate (all isomers), hydroxybutyl acrylate (all isomers), diethylaminoethyl acrylate, triethylene glycol acrylate, methacrylamide, N-tert-butylmethacrylamide, N-n-butylmethacrylamide, N-methylolmethacrylamide, N-ethylolmethacrylamide, N-tert-butylacrylamide,
N-butylacrylamide, N-methylolacrylamide, N-ethylolacrylamide, vinylbenzoic acid (all isomers), diethylaminostyrene (all isomers), alpha-methylvinylbenzoic acid (all isomers), diethylamino-alpha-methylstyrene (all isomers), para- methylstyrene, p-vinylbenzenesulfonic acid, trimethoxysilylpropyl methacrylate, triethoxysilylpropyl methacrylate, tributoxysilylpropyl methacrylate, diethoxymethylsilylpropyl methacrylate, dibutoxymethylsilylpropyl methacrylate, diisopropoxymethylsilylpropyl methacrylate, dimethoxysilylpropy!l methacrylate, diethoxysilylpropyl methacrylate, dibutoxysilylpropyl methacrylate, diisopro- poxysilylpropyl methacrylate, trimethoxysilylpropyl acrylate, triethoxysilylpropyl acrylate, tributoxysilylpropyl acrylate, dimethoxymethylsilylpropyl acrylate, diethoxymethylsilylpropyl acrylate, dibutoxymethylsilylpropyl acrylate, diisopropoxymethylsilyl-propyl ~~ acrylate, dimethoxysilylpropyl acrylate, diethoxysilylpropy! acrylate, dibutoxysilylpropyl acrylate, diisopropoxysilylpropyl acrylate, vinyl acetate and vinyl butyrate, vinyl chloride, vinyl fluoride, vinyl bromide, and mixtures of the abovementioned monomers.
Preferably used as a first monomer (a’) is acrylic or methacrylic acid, a C;-Cy4-alkyl or C;-C4-hydroxyalkyl acrylate or methacrylate, vinyl acetate, a substituted or unsubstituted vinylpyrrolidone, a mixture of two or more thereof, or a mixture of said first monomer (a’) with at least one further free-radically homopolymerizable or copolymerizable monomer (a).
Also used in connection with the preparation of the reaction product (A) is a compound (I) of the formula
Rae AR
C=—=C ~~ ~
R4 Ry in which R; to Rs each independently of one another are hydrogen, an unsubstituted or substituted alkyl radical, cycloalkyl radical or aralkyl radical or an
-5- 0.2.0062/02158/Sue unsubstituted or substituted aromatic hydrocarbon radical, the invention requiring at least two of R; to R4 to be an unsubstituted or substituted aromatic hydrocarbon radical.
S Here again it is possible in principle to use all compounds of the above formula in accordance with the invention. Preference is given as compound (I) to the use of diphenylethylene, dinaphthaleneethylene, 4,4-vinylidenebis(N,N’-dimethylaniline), 4 4-vinylidenebis(aminobenzene), cis- and trans-stilbene or a mixture of two or more thereof, further preference being given to using diphenylethylene. It is also possible to use substituted diphenylethylenes, which are substituted on either one or both aromatic hydrocarbon radicals with electron-withdrawing or electron- donating substituents, such as, for example, tert-butyl, benzyl or CN groups, or an alkoxydiphenyl-ethylene, such as, for example, methoxy-, ethoxy- or tert- butoxydiphenylethylene, or analogous thio or amine compounds.
In addition, the reaction product (A) is prepared by reaction in the presence of at least one free-radical initiator, preference being given here to oxidizing free-radical initiators. The initiator should preferably be soluble in water. In general, however, it is possible to use all azo and/or peroxo compounds which are conventionally used in free-radical chain polymerization. Suitable initiators are described in
WO 98/01478 on p. 10, lines 17-34, which in this regard is incorporated in its entirety into the present specification. Preference is given to the use of oxidizing free-radical initiators, such as potassium, sodium and ammonium peroxodisulfates, for example, or to a combination of a conventional - i.e., non-oxidizing - initiator with HyO,.
In one preferred embodiment for the preparation of the reaction product a comparatively large amount of free-radical initiator is added, the free-radical initiator as a proportion of the reaction mixture being preferably from 0.5 to 50% by weight, more preferably from 1 to 20% by weight, based in each case on the overall amount of the monomer (a) and of the initiator. The ratio of initiator to compound (I) is preferably from 3:1 to 1:3, more preferably from 2:1 to 1:2, and in particular from 1.5:1 to 1:1.5.
The reaction described above in accordance with stage (i) is conducted in the aqueous phase, in which case preference is given here to water or mixtures of water with water-miscible solvents, such as THF and ethanol, for example. It is,
-6- 0.2.0062/02158/Sue however, also possible to conduct the reaction in the presence of a mixture of water and a water-immiscible solvent, such as, for example, an aromatic solvent, such as toluene, for example.
In a further embodiment the above reaction according to stage (i) is conducted in the presence of at least one base. In this context, all low molecular mass bases can be used in principle, with preference being given to NaOH, KOH, ammonia, diethanolamine, triethanolamine, mono-, di- ~~ and = triethylamine, dimethylethanolamine or a mixture of two or more thereof and particular preference to ammonia and di- and triethanolamine.
The temperature during the reaction in accordance with stage (i) is generally above room temperature and below the decomposition temperature of the monomers, the temperature range chosen being preferably from 50 to 150°C, more preferably from 70 to 120°C and, in particular, from 80 to 110°C.
Although no restrictions whatsoever exist in respect of the molecular weight distribution, it is possible in the reaction according to (i) to obtain a reaction product which has a molecular weight distribution M,/M,, measured by gel permeation chromatography using polystyrene as standard, of <4, preferably < 3, more preferably < 2, in particular < 1.5 and, in certain cases, < 1.3. The molecular weights of the reaction product (A) can be controlled within wide limits through the choice of the ratio of monomers (a) to compounds (I) to free-radical initiator. In this context the molecular weight is determined in particular by the amount of compound (I), specifically such that the greater the proportion of compound (I), the lower the resulting molecular weight.
The reaction in accordance with stage (i) can also be conducted in the presence of a surface-active substance.
The product of the reaction according to (i), which is generally obtained in the form of an aqueous mixture, can be further processed directly as a dispersion or else, preferably, be used as a macroinitiator for the subsequent reaction in accordance with stage (ii), as defined later on below. It is also possible to isolate the reaction product of stage (i) as a solid and then to react it further.
-7- 0.2.0062/02158/Sue
In the reaction in accordance with stage (ii) it is possible to react at least one freely selectable, free-radically homopolymerizable or copolymerizable monomer (b).
This monomer (b) can be identical to or different than the monomer (a) used in stage (i). The selection of the monomer (b) is made in principle in accordance with the desired structure of the polymer prepared in stage (ii) and hence in dependence on the intended use of this polymer. “~The following specific monomers preferied for use as monomers (b) may be mentioned: monomers (b) are preferably selected from monoethylenically unsaturated Cs-Cg monocarboxylic acids, their alkali metal salts and/or ammonium salts, examples being acrylic acid, methacrylic acid, dimethylacrylic acid, ethylacrylic acid, allylacetic acid and vinylacetic acid, and also monoethylenically unsaturated C4-Cg dicarboxylic acids, their monoesters, anhydrides, alkali metal salts and/or ammonium salts, examples being maleic acid, fumaric acid, itaconic acid, mesaconic acid, methylenemalonic acid, citraconic acid, maleic anhydride, itaconic anhydride and methylmalonic anhydride; and also monoethylenically unsaturated monomers containing sulfonic acid groups, examples being allylsulfonic acid, styrenesulfonic acid, 2-acrylamido-2-methylpropanesulfonic acid, meth- allylsulfonic acid, vinylsulfonic acid, 3-sulfopropyl acrylate and 3-sulfopropyl methacrylate, and also monoethylenically unsaturated monomers containing phos- phonic acid groups, examples being vinylphosphonic acid, allylphosphonic acid and acrylamidoethylpropane-phosphonic acid, C;-Cyp-alkyl and hydroxyalkyl esters of monoethylenically unsaturated C;-C;o monocarboxylic acids or C4-Cg dicarboxylic acids, examples being methyl acrylate, ethyl acrylate, n-butyl acrylate, stearyl acrylate, diethyl maleate, hydroxyethyl acrylate, hydroxypropyl acrylate, hydroxybutyl acrylate, hydroxy-ethyl methacrylate and hydroxypropyl methacrylate, and also (meth)acrylic esters of alkoxylated C;-C;s alcohols that have been reacted with from 2 to 50 mol of ethylene oxide, propylene oxide, butylene oxide or mixtures thereof; and also amides and N-substituted amides of monoethylenically unsaturated C;-Cjp mono-carboxylic acids or C4-Cg dicarboxylic acids, examples being acrylamide, N-alkylacrylamides and
N,N-dialkyl-acrylamides having in each case 1 to 18 carbon atoms in the alkyl group, such as N-methylacrylamide, N,N-dimethylacrylamide, N-tert- butylacrylamide and N-octadecylacrylamide, N-methylhexylmaleamide, N-decyl- maleamide, diethylaminopropylmethacrylamide and acryl-amidoglycolic acid; and
-8- 0.2.0062/02158/Sue also alkylamidoalkyl (meth)-acrylates, examples being dimethylaminoethyl acrylate, dimethylaminoethyl = methacrylate, ethylaminoethyl acrylate, diethylaminoethyl methacrylate, dimethylaminopropyl acrylate and dimethylaminopropyl methacrylate; and also vinyl esters, such as vinyl formate,
S vinyl acetate and vinyl propionate, which may also be in hydrolyzed form following the polymerization; and also N-vinyl compounds, examples being
N-vinylpyrrolidone, N-vinylcaprolactam, N-vinylformamide, N-vinyl-N-methyl- ‘— formamide, 1-vinylimidazole and 1-vinyl-2-methylimidazole; and also vinyl ethers of C;-C,3 alcohols, vinyl ethers of alkoxylated C;-C,s alcohols and vinyl ethers of polyalkylene oxides such as polyethylene oxide, polypropylene oxide or polybutylene oxide, styrene or its derivatives such as alpha-methylstyrene, indene and dicyclopentadiene; monomers containing amino or imino groups, such as, for example, dimethylaminoethyl acrylate, diethylaminoethyl methacrylate, diethylaminopropylmethacrylamide and allylamine, monomers which carry quaternary ammonium groups, in the form, for example, of salts, as obtained by reacting the basic amino functions with acids such as hydrochloric acid, sulfuric acid, nitric acid, formic acid or acetic acid, or in quaternized form (examples of suitable quaternizing agents being dimethyl sulfate, diethyl sulfate, methyl chloride, ethyl chloride and benzyl chloride), such as, for example, dimethylaminoethyl acrylate hydrochloride, diallyldimethylammonium chloride, dimethylaminoethyl acrylate methyl chloride, dimethylaminoethylamino- propylmethacrylamide methosulfate, vinylpyridinium salts and 1-vinylimidazolium salts; and monomers in which the amino groups and/or ammonium groups are liberated only after the polymerization and subsequent hydrolysis, such as, for example, N-vinylformamide and N-vinylacetamide.
The present invention accordingly also provides a coating composition which comprises in addition to at least one suitable additive (C) a polymer (B) obtainable by a process comprising: reacting the reaction product (A) obtained in stage (i) under free-radical conditions in the presence of at least one free-radically homopolymerizable or copoly- merizable monomer (b).
-9- 0.2.0062/02158/Sue
The reaction in accordance with stage (ii) is conducted in principle in accordance with the customary conditions for a free-radical polymerization, it being possible for appropriate solvents to be present.
Stages (i) and (ii) of the process of the invention can be conducted separately from one another both spatially and temporally, in which case, of course, stage (i) is conducted first and then stage (ii). In addition, however, stages (i) and (ii) can also -- be-carried out in succession in-one reactor; i.e., first of all the compound of the formula (I) is reacted partially or totally, as a function of the desired use and/or of the desired properties, with at least one monomer (a) and then at least one monomer (b) is added and free-radical polymerization is carried out, or else right from the beginning a monomer mixture comprising at least one monomer (a) and at least one monomer (b) is used and is reacted with the compound (I). In this context it is assumed that the compound (I) is first of all reacted with said at least one monomer (a) and then the reaction product (A) formed therefrom also reacts, above a certain molecular weight, with the monomer (b).
Depending on reaction regime it is possible in accordance with the invention in this case to prepare endgroup-functionalized polymers, block or multiblock and gradient (co)polymers, star polymers, graft copolymers and branched (co)polymers as coating composition components.
Furthermore, the present invention also provides a coating composition comprising an aqueous mixture comprising the reaction product (A) or the polymer (B) or a combination of two or more thereof.
The reaction product (A) and/or the polymer (B) or a mixture of two or more thereof can be used in accordance with the utility as coating composition component in a form suitable for that purpose, especially as polymer dispersions.
In accordance with their field of use, the coating compositions of the invention include suitable additives (C) such as polymers, especially crosslinkers, crosslinking catalysts, initiators, especially pigments, dyes, fillers, reinforcing fillers, rheological assistants, wetting and dispersing agents, defoamers, adhesion promoters, additives for improving the substrate wetting, additives for improving the surface smoothness, flatting agents, leveling agents, film-forming auxiliaries, siccatives, antiskinning agents, light stabilizers, corrosion inhibitors, biocides,
-10- 0.2.0062/02158/Sue flame retardants, polymerization inhibitors, especially photoinhibitors, or plasticizers, as are known and conventional, for example, in the plastics or coatings sectors. The selection of the additives is guided by the desired profile of properties of the coating composition and by its intended use.
The coating compositions of the invention can be applied using the known methods of application of liquid phases, such as dipping, spraying, knife coating, brushing, roller coating or curtain coating. Examples of suitable substrates are films, foils, fibers, sheet metal, woven fabrics or moldings, especially automotive bodywork components, made of metal, glass, wood, paper, plastic, leather, mineral substrates or composite materials. At the time of application, these substrates may be in a state of rest or of mobility, such as in the case of the coil coating technique, for instance.
In addition, the coating compositions of the invention can be employed in powder form, especially in the case of powder coating.
In particular, the coating compositions of the invention can be constituents of multicoat coating systems, as are encountered, for example, in automotive OEM finishing, automotive refinishing, the coating of plastics, industrial coating, container coating, the coil coating technique, or furniture coating.
The intention of the text below is to illustrate the present invention with reference to a number of examples.
Example 1
A reaction vessel was charged with 52.56 g of deionized water and this initial charge was heated to 90°C. Subsequently, at a constant temperature of 90°C, three separate feedstreams were metered in at a uniform rate in parallel. Feedstream 1 consisted of 10.18 g of acrylic acid, 18.35 g of methyl methacrylate and 1.49 g of diphenylethylene. As feedstream 2, 9.9 g of a 25% strength by weight ammonia solution were added. Feedstream 3 consisted of a solution of 2.25 g of ammonium peroxodisulfate in 5.25 g of deionized water. Feedstreams I and II were metered in over the course of 1 hour, feedstream III over the course of 1.25 hours. When addition was at an end, a 4-hour postpolymerization phase ensued, with cooling.
The resulting micellar solution had a solids content of 33% by weight.
-11- 0.2.0062/02158/Sue
Example 2
First of all, 9.1 g of the product prepared in Example 1 were initially introduced in 51.62 g of deionized water and this initial charge was heated to 90°C with stirring in a reactor. Subsequently, a feedstream consisting of 9.86 g of n-butyl methacrylate, 7.88 g of styrene, 12.66 g of hydroxyethyl methacrylate and 8.88 g of methyl methacrylate was metered in over the course of 6 hours with thorough stirring. The resulting dispersion had a solids content of about 40% by weight.
Example 3
First of all, 9.1 g of the product prepared in Example 1 were initially introduced in 51.62 g of deionized water and this initial charge was heated to 90°C with stirring in a reactor. Subsequently, a feedstream consisting of 9.86 g of n-butyl methacrylate, 7.88 g of styrene, 12.66 g of hydroxypropyl methacrylate and 8.88 g of ethylhexyl methacrylate was metered in over the course of 6 hours with thorough stirring. The resulting dispersion had a solids content of about 40% by weight.
Example 4
First of all, 9.1 g of the product prepared in Example 1 were initially introduced in 51.62 g of deionized water and this initial charge was heated to 90°C with stirring in a reactor. Subsequently, a feedstream consisting of 9.86g of n-butyl methacrylate, 7.88 g of vinyl acetate, 12.66 g of hydroxyethyl methacrylate and 8.88 g of 2-ethylhexyl methacrylate was metered in over the course of 6 hours with thorough stirring. The resulting dispersion had a solids content of about 40% by weight.
Example 5
First of all, 9.1 g of the product prepared in Example 1 were initially introduced in 51.62 g of deionized water and this initial charge was heated to 90°C with stirring in a reactor. Subsequently, a feedstream consisting of 9.86 g of n-butyl methacrylate, 7.88 g of styrene, 3.94 g of isobutoxymethyl methacrylate, 8.72 g of hydroxyethyl methacrylate and 8.88 g of ethylhexyl methacrylate was metered in
Claims (13)
1. A coating composition comprising at least one reaction product (A) and at least one suitable additive (C), (A) being obtainable by a process comprising the following stage (i): (1) reacting under free-radical conditions a reaction mixture comprising at least one free-radically reactable monomer (a) in the presence of at least one free-radical initiator and of a compound (I) of the formula R R INC Pe 1 C=—=C Pe ~~ Ry R; in which R; to R4 each independently of one another are hydrogen, a substituted or unsubstituted alkyl radical, cyclo- alkyl radical or aralkyl radical, or an unsubstituted or a substituted aromatic hydrocarbon radical, with the proviso that at least two of Rj; to R4 are an unsubstituted or a substituted aromatic hydrocarbon radical in aqueous phase.
2. A composition as claimed in claim 1, wherein the reaction (i) is conducted in the presence of at least one base.
3. A composition as claimed in claim 1 or 2, wherein said free-radical initiator is an oxidizing free-radical initiator. 4, A composition as claimed in any of claims 1 to 3, wherein the proportion of free-radical initiator to said at least one monomer (a) is from 0.5 to 50% by weight, based on the overall amount of the initiator and of the monomer (a).
-14 - 0.72.0062/02158/Sue
5. A composition as claimed in any of claims 1 to 4, wherein said compound (I) is diphenylethylene, an alkoxydiphenylethylene, dinaphthaleneethylene, 4,4-vinylidenebis(N,N-dimethylaniline), 4,4-vinyl- idenebis(1-aminobenzene), cis- or trans-stilbene or a mixture of two or more thereof.
6. A composition as claimed in any of claims 1 to 5, wherein said monomer (a) 1s a hydrophilic monomer, a mixture comprising at least two hydrophilic monomers or a mixture comprising at least one hydrophilic and at least one hydrophobic monomer.
7. A composition as claimed in any of claims 1 to 6, wherein the reaction mixture comprises as a first monomer (a) acrylic or methacrylic acid, a C,-Cs-alkyl or C,-C4-hydroxyalkyl acrylate or methacrylate, vinyl acetate, a substituted or unsubstituted vinylpyrrolidone, a mixture of two or more thereof, or a mixture of said first monomer (a) with at least one further free- radically homopolymerizable or copolymerizable monomer.
8. A composition as claimed in any of claims 1 to 7, wherein the low molecular mass base is NaOH, KOH, ammonia, diethanolamine, triethanolamine, mono-, di- or triethylamine, dimethylethanolamine or a mixture of two or more thereof.
9. A coating composition comprising if desired a reaction product (A) as set forth in any of the above claims, at least one suitable additive (C) and at least one polymer (B) obtainable by (ii) reacting the reaction product (A) obtained in stage (i) under free- radical conditions in the presence of at least one free-radically homopolymerizable or copolymerizable monomer (b).
10. A composition as claimed in any of claims 1 to 9, comprising the reaction product (A) and/or the polymer (B) as a dispersion.
11. A process for coating substates, which comprises using a composition as claimed in any of claims 1 to 10.
-15- 0.2.0062/02158/Sue
12. A process as claimed in claim 11, wherein said composition is a constituent of a multicoat system.
13. A process as claimed in claim 11 or 12, wherein the composition comprises crosslinkable constituents.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE1998160011 DE19860011A1 (en) | 1998-12-23 | 1998-12-23 | Coating composition, e.g. useful for coating automobiles, coils and furniture, comprises product obtained by reacting one or more radical-polymerizable monomers and diarylethylene compound |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA200105159B true ZA200105159B (en) | 2002-12-20 |
Family
ID=7892641
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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ZA200105159A ZA200105159B (en) | 1998-12-23 | 2001-06-22 | Coating agent. |
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DE (1) | DE19860011A1 (en) |
ZA (1) | ZA200105159B (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19930664A1 (en) | 1999-07-02 | 2001-01-11 | Basf Coatings Ag | Clear varnish and its use for the production of clear varnishes and color and / or effect multilayer varnishes |
DE10029694A1 (en) * | 2000-06-16 | 2001-12-20 | Basf Ag | Use of radically-produced polymers, including block copolymers, in a very wide range of applications, eg coatings, toners, cosmetics, detergents, ink-jets, adhesives, moldings, films and fibers |
DE10126651A1 (en) | 2001-06-01 | 2002-12-12 | Basf Coatings Ag | Use of copolymers with diphenylethylene units as emulsifiers for the production of powder slurry and coating powder for use in coating materials, adhesives and sealants, e.g. for painting cars |
DE10240553A1 (en) * | 2002-08-29 | 2004-03-11 | Röhm GmbH & Co. KG | Block copolymers, coated metal foils and heat sealing lacquers |
DE10306431A1 (en) * | 2003-02-15 | 2004-09-09 | Basf Coatings Ag | Monomodal aqueous, essentially acid and emulsifier free dispersion |
-
1998
- 1998-12-23 DE DE1998160011 patent/DE19860011A1/en not_active Withdrawn
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2001
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