WO2026007487A1 - 一种偏振全息光学元件及其制备方法 - Google Patents

一种偏振全息光学元件及其制备方法

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Publication number
WO2026007487A1
WO2026007487A1 PCT/CN2025/087707 CN2025087707W WO2026007487A1 WO 2026007487 A1 WO2026007487 A1 WO 2026007487A1 CN 2025087707 W CN2025087707 W CN 2025087707W WO 2026007487 A1 WO2026007487 A1 WO 2026007487A1
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WIPO (PCT)
Prior art keywords
liquid crystal
substrate
optical element
holographic optical
polarization holographic
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PCT/CN2025/087707
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English (en)
French (fr)
Inventor
翁一士
周亮
张宇宁
潘栩生
魏然
王闯
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Shi Cheng Laboratory For Information Display And Visualization
Southeast University
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Shi Cheng Laboratory For Information Display And Visualization
Southeast University
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Publication of WO2026007487A1 publication Critical patent/WO2026007487A1/zh
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/32—Holograms used as optical elements

Definitions

  • This invention relates to a polarization holographic optical element and its fabrication method, belonging to the field of optical element technology.
  • a polarization holographic grating is a diffractive optical element formed by patterning a thin film using anisotropy in optics. Its uniform anisotropy results in higher diffraction efficiency and a single diffraction order compared to traditional holographic optical elements.
  • the polarization holographic grating utilizes polymerizable liquid crystal materials to design the optical element as multiple liquid crystal sublayers with a single orientation layer.
  • polymerizable liquid crystal materials By adding chiral dopants to reactive liquid crystal molecules (also called low molecular weight polymerizable liquid crystals, LCP), chiral twisting can be achieved in each layer. This chiral twisting helps to adjust and optimize the angular bandwidth and wavelength bandwidth under high diffraction efficiency.
  • this polarization holographic grating makes its fabrication process simpler than that of traditional holographic optical elements, and the grating has excellent diffraction characteristics, enabling more complex optical functions, the arrangement and curing of reactive liquid crystal molecules in this grating structure still makes it impossible to avoid the preparation of alignment layers and polarization holographic exposure during the grating fabrication process.
  • the alignment material requires a series of operations such as solution preparation and spin coating.
  • the exposure optical path has more stringent requirements than ordinary optical paths, is more complex to build, and has a narrow range of applications, often used in coupling devices in augmented reality.
  • the optical element design required for the construction of the exposure optical path is small in dimension, and the process of preparing the alignment material solution required for the alignment layer is complex, making it impossible to achieve large-scale preparation in the initial stage.
  • the existing polarization holographic gratings have limited application areas. Therefore, those skilled in the art need to seek a new type of polarization holographic optical element.
  • this invention provides a polarization holographic optical element and its fabrication method.
  • This design and fabrication method utilizes surface undulation microstructures to create unevenness and irregularities on the substrate surface, thereby overcoming the limitations of alignment layer fabrication materials and polarization holographic exposure optical path design dimensions in existing polarization holographic optical element fabrication processes. This reduces the fabrication difficulty of polarization holographic optical elements, and the fabricated polarization holographic optical elements can be used in polarization optical lenses, polarization holographic modulators, etc.
  • a polarization holographic optical element includes: a substrate layer and an anisotropic dielectric layer.
  • the substrate layer includes a substrate and a surface undulation microstructure layer.
  • the surface undulation microstructure layer includes undulation microstructures arranged in an array on the substrate.
  • the anisotropic dielectric layer uses liquid crystal material.
  • the liquid crystal material may include, but is not limited to, liquid crystal molecules arranged in a helical, tilted pattern.
  • the material of the surface undulation microstructure layer should be the same as the material of the substrate.
  • the undulating microstructure includes, but is not limited to, a triangular prism structure.
  • liquid crystal molecules in the anisotropic dielectric layer have the following lateral periods: ⁇ x , ⁇ y , ⁇ B , a, b, c, ⁇ .
  • a is the length of the left hypotenuse of the triangular face
  • b is the length of the right hypotenuse of the triangular face
  • c is the length of the base of the triangular face
  • ⁇ is the angle between the base and the left hypotenuse of the triangular face.
  • ⁇ is the angle between the base and right hypotenuse of the triangular face
  • ⁇ B is the Bragg wavelength in vacuum
  • P is the pitch of the anisotropic medium
  • neff is the effective refractive index of the anisotropic medium
  • n is a multiple.
  • a method for fabricating a polarization holographic optical element specifically includes:
  • Micro-nano fabrication technology is used to arrange undulating microstructures in an array on the substrate, and then the substrate is cleaned again.
  • the liquid crystal material solution is uniformly coated using a coating process.
  • the curing method is determined based on the liquid crystal type, and then curing is performed.
  • the substrate may be made of materials including, but not limited to, glass, quartz, plastic, resin, silicon dioxide, or silicon nitride.
  • the liquid crystal material solution includes a solute, a photoinitiator, a surfactant, a chiral agent, and a solvent.
  • the solute is one or more liquid crystal monomers.
  • the photoinitiator is one or more materials that enable the solution to form a polymer by being excited by ultraviolet light.
  • the surfactant is one or more materials that make the surface of the coated finished product smooth.
  • the chiral agent is a material that enables the liquid crystal material to form a left-handed or right-handed optically active state.
  • One or more organic solvents are used as solvents.
  • the micro/nano fabrication process includes, but is not limited to, etching, nanoimprinting, or photolithography.
  • the curing method includes, but is not limited to, irradiating the sample with ultraviolet light with an energy of not less than 3J/ cm2 in an oxygen-free environment under protective gas or in a vacuum environment to form a photopolymer.
  • the present invention provides a polarization holographic optical element and its fabrication method.
  • the present invention can replace the alignment layer preparation and polarization holographic exposure process in the existing polarization holographic optical element fabrication, reducing the difficulty of polarization holographic optical element fabrication.
  • the controllable size and angle of the surface microstructure expands the design optimization dimension of the polarization holographic optical system, providing the possibility for the large-scale production and application of polarization holographic optical elements.
  • This invention utilizes the surface unevenness and irregularities caused by surface microstructure to align liquid crystals, and generates a spiral longitudinal period due to the self-assembly characteristics of liquid crystals, forming a three-dimensional period.
  • This replaces the alignment layer preparation and polarization holographic exposure process in the fabrication of polarization holographic optical elements, reducing the complexity of the fabrication process, providing the possibility for large-scale fabrication of polarization holographic optical elements, and expanding the design optimization dimensions of polarization holographic optical elements.
  • This invention presents a method for fabricating a polarization holographic optical element structure. This method allows for real-time adjustment of structural parameters based on actual needs through calculation, enabling the fabrication of novel polarization holographic optical elements that can be used as optical lenses, polarization holographic modulators, vector light field generators, etc.
  • Figure 1 is a schematic diagram of the overall structure of a polarization holographic optical element provided in the embodiment of the present invention.
  • Figure 2 is a schematic diagram of the surface undulation microstructure layer and the anisotropic medium layer of the present invention.
  • Figure 3 is a schematic diagram of the undulating microstructure of the present invention.
  • Figure 4 is a schematic diagram showing the relationship between the transverse period of the undulating microstructure of the present invention and the longitudinal period of the liquid crystal molecules in the anisotropic dielectric layer.
  • Figure 5 is a schematic diagram of the simulation model of the polarization holographic optical element of the present invention.
  • the simulation model is after the light is incident normally; in Figure 5(b), the simulation model is after the light is incident obliquely; and in Figure 5(c), the simulation model is the undulating microstructure.
  • Figure 6 shows a schematic diagram of simulation results for an existing polarizing holographic grating and the polarizing holographic optical element mentioned in this invention.
  • Figure 6(a) the relationship between the diffraction efficiency and diffraction angle of the existing polarizing holographic grating is shown
  • Figure 6(b) the relationship between the diffraction efficiency and diffraction angle of the polarizing holographic optical element of this invention is shown.
  • 101 is the substrate
  • 102 is the surface undulation microstructure layer
  • 103 is the anisotropic dielectric layer
  • 201 is the longitudinal period of liquid crystal molecules ⁇ y
  • 202 is the period of liquid crystal molecules ⁇ B
  • 203 is the lateral period of liquid crystal molecules ⁇ x
  • 204 is the left oblique edge
  • 205 is the right oblique edge
  • 206 is the bottom edge
  • 401 is the undulation microstructure.
  • This embodiment introduces a polarization holographic optical element, as shown in Figure 1, which includes: a substrate layer and an anisotropic dielectric layer 103.
  • the substrate layer includes a substrate 101 and a surface undulation microstructure layer 102.
  • the surface undulation microstructure layer includes undulation microstructures arranged in an array on the substrate 101.
  • the anisotropic dielectric layer 103 is made of liquid crystal material.
  • the liquid crystal material includes, but is not limited to, liquid crystal molecules arranged in a helical tilt.
  • the substrate 101 may be made of materials including but not limited to glass, quartz, plastic, resin, silicon dioxide or silicon nitride, and the refractive index of the substrate 101 may be variable.
  • the material of the surface undulation microstructure layer 102 should be the same as the material of the substrate 101.
  • the undulating microstructure includes, but is not limited to, the triangular prism structure shown in Figure 3.
  • the transverse period ⁇ x 203 of the liquid crystal molecules in the anisotropic medium layer 103 is set as the transverse period of the grating of the polarization holographic optical element
  • the longitudinal period ⁇ y 201 of the liquid crystal molecules in the anisotropic medium layer 103 is set as the longitudinal period of the grating of the polarization holographic optical element
  • the period ⁇ B 202 of the liquid crystal molecules in the anisotropic medium layer 103 is set as the Bragg period of the polarization holographic optical element.
  • variable for the length of the base 206 of the triangular face corresponding to the undulating microstructure 401 is c
  • the variable for the length of the left hypotenuse 204 is a
  • the variable for the length of the right hypotenuse 205 is b
  • the angle between the base 206 and the left hypotenuse 204 is set to ⁇
  • the angle between the base 206 and the right hypotenuse 205 is set to...
  • the angle between the left hypotenuse 204 and the right hypotenuse 205 is set as ⁇ .
  • the parameters of the undulating microstructure can be adjusted in real time according to the required optical performance of the optical element during the fabrication process of the polarization holographic optical element, based on the grating period, tilt angle, and orientation. Therefore, the transverse period ⁇ x , longitudinal period ⁇ y , and liquid crystal molecule period ⁇ B , a, b, c, ⁇ of the anisotropic dielectric layer 103 are determined.
  • ⁇ B is the Bragg wavelength in vacuum
  • P is the pitch of the anisotropic medium
  • neff is the effective refractive index of the anisotropic medium
  • n is a multiple.
  • the solution of the liquid crystal material includes, but is not limited to, reactive liquid crystals, chiral materials, photoinitiators, and chemical solvents.
  • chemical solvents include ethyl acetate.
  • n is any positive integer.
  • This embodiment describes a method for fabricating a polarization holographic optical element, specifically including:
  • Micro-nano fabrication technology is used to arrange undulating microstructures in an array on a substrate, and then the substrate is cleaned.
  • the liquid crystal material solution is uniformly coated using a coating process.
  • the curing method is determined based on the liquid crystal type, and then curing is performed.
  • the substrate is cleaned, including ultrasonic cleaning with alcohol or other organic solvents and vacuum cleaning in a plasma cleaner.
  • ultrasonic cleaning and plasma cleaning machine vacuum cleaning include, but are not limited to, other processes that can make the substrate hydrophobic and clean its surface.
  • micro-nano fabrication process includes, but is not limited to, etching, nanoimprinting, or photolithography.
  • the undulating microstructure should be processed with the surface corresponding to the bottom edge as the base, and should be arranged in an array order on the interface.
  • the liquid crystal material solution includes a solute, a photoinitiator, a surfactant, a chiral agent, and a solvent.
  • the solute is one or more liquid crystal monomers, such as RM101, RM257 and other liquid crystal monomers.
  • Photoinitiators are one or more materials that enable the solution to form a polymer through ultraviolet light excitation, such as irgacure 651, irgacure 18, or one or more other materials.
  • Surfactants are one or more materials that make the surface of the coated product smooth, such as leveling agents, defoamers, etc.
  • Chiral agents are materials that enable liquid crystal materials to form left-handed or right-handed optically active states, such as R5011/S5011, S811, etc.
  • the solvent is one or more organic solvents, such as ethyl acetate, toluene, methyl ethyl ketone, etc.
  • liquid crystal materials include, but are not limited to, active liquid crystals and passive liquid crystals.
  • the curing method includes, but is not limited to, irradiating the sample with ultraviolet light with an energy of not less than 3J/ cm2 in an oxygen-free environment protected by gases such as nitrogen or in a vacuum environment to form a photopolymer and controlling the liquid crystal orientation through electrodes.
  • FIG. 5(a) shows the simulation model after normal light incidence
  • Figure 5(b) shows the simulation model after oblique light incidence
  • Figure 5(c) shows the simulation model of the surface undulation microstructure. Specifically, it includes:
  • Step 1 Calculate and build the simulation model parameters of the polarizing body holographic optical coupling element mentioned in this invention, and build the simulation model based on the parameters.
  • Step 2 Set the light source to normal incidence and oblique incidence, perform simulations respectively, and observe the changes in refractive index.
  • Step 3 Simulate the surface undulation microstructure and observe its diffraction efficiency.
  • Step 4 Analyze the diffraction characteristics of the polarizing holographic optical coupling element mentioned in this invention through simulation results, and adjust the simulation model in real time according to the simulation results as needed.
  • a substrate layer and an anisotropic dielectric layer are set, wherein the substrate layer includes a substrate and undulating microstructures.
  • the anisotropic medium described in this embodiment is a cholesteric liquid crystal with a helical molecular structure in the liquid crystal state, and its liquid crystal material is set as RM257, S811, ethyl acetate, and photoinitiator.
  • the undulating microstructure is represented by a triangular prism microstructure.
  • the substrate thickness in the substrate layer is 0.1 to 1 mm, and the refractive index is 1 to 2.5. In this embodiment, the substrate thickness is set to 0.75 mm and the refractive index is 1.6.
  • the tilt angle of the triangular prism microstructure is 10° to 40°, and the model in this embodiment sets the included angle. It is 30°.
  • the substrate and the triangular prism microstructure are made of glass.
  • the lateral period of the liquid crystal molecules in the anisotropic dielectric layer is 380nm to 780nm.
  • the lateral period ⁇ x of the liquid crystal molecules is set to 390nm
  • the effective refractive index neff is 1.67
  • the Bragg wavelength in vacuum is 530nm
  • ⁇ x is the transverse period of the liquid crystal molecule arrangement
  • ⁇ y is the longitudinal period of the liquid crystal molecule arrangement
  • ⁇ B is the Bragg period
  • ⁇ B is the Bragg wavelength in vacuum
  • P is the pitch
  • neff is the effective refractive index
  • n is the multiple
  • c is the base length of the microstructure.
  • the parameters set in this embodiment can be obtained from the material parameters during the actual preparation process.
  • the tilt angle of the incident light is 15°.
  • the polarization holographic optical element described in this embodiment can be directly filled with liquid crystal after actual fabrication, according to its structural parameters, including but not limited to the coating process. This eliminates the need for the traditional process of tilting liquid crystal molecules in the anisotropic medium layer during the fabrication of polarization holographic optical elements, including but not limited to the polarization holographic exposure and alignment layer fabrication process.
  • This embodiment simulates existing polarizer holographic gratings and the structure mentioned in this paper, and analyzes their diffraction characteristics.
  • Step 1 Calculate the structure of existing polarization holographic optical elements and the structural parameters mentioned in this article.
  • Step 2 Build simulation models of existing polarization holographic optical elements and simulation models of the structures mentioned in this paper.
  • Step 3 Record and analyze the diffraction characteristic curves of the two structural simulation models.
  • This embodiment uses a substrate with a thickness of 0.75 mm and a refractive index of 1.6.
  • the surface undulation microstructure is represented by a triangular prism microstructure with a tilt angle of 30°.
  • the lateral period of the existing polarizing holographic grating is 390 nm.
  • Figure 6(a) shows the relationship between the diffraction efficiency and diffraction angle of the existing polarizing holographic grating
  • Figure 6(b) shows the relationship between the diffraction efficiency and diffraction angle of the structure mentioned in this paper.
  • the horizontal axis represents the incident angle
  • the vertical axis represents the diffraction efficiency.
  • the incident angle range is -25° to 25°.
  • the peak diffraction efficiency of the existing polarizing holographic grating is close to 0.5 within the incident angle range, while the peak diffraction efficiency of the structure mentioned in this paper is close to 0.7 within the incident angle range.
  • the structure mentioned in this paper has higher diffraction efficiency, wider angular bandwidth, and better diffraction characteristics as obtained through simulation.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Polarising Elements (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

本发明公开了一种偏振全息光学元件及其制备方法，包括：基板层、各向异性介质层；其中，所述基板层，包括基板、表面起伏微结构层，所述表面起伏微结构层，包括起伏微结构，所述起伏微结构呈阵列方式排列在基板上，所述各向异性介质层采用液晶材料。本发明提供的一种偏振全息光学元件及其制备方法，减小了偏振全息光学元件制备难度，并且表面微结构的大小和角度可控拓展了偏振全息光学系统的设计优化维度，为实现大规模偏振全息光学元件的生产和应用提供可能性。

Description

一种偏振全息光学元件及其制备方法 技术领域
本发明涉及一种偏振全息光学元件及其制备方法，属于光学元件技术领域。
背景技术
随着光学技术的不断发展，研究人员逐渐探索将偏振光学和全息光学结合的可能性，以便实现更加精确和多功能的光学调制。2016年，研究人员将体光栅布拉格衍射与Pancharatnam-Berry(PB)相位调控机制相结合，利用偏振光取向技术与液晶自组装特性，提出了一种偏振全息光栅。偏振全息光栅是通过光学中的各向异性对于薄膜进行图案化而形成的衍射光学元件，具有均匀各项异性量值这一特征，导致了偏振全息光栅与传统的全息光学元件相比衍射效率较高，衍射级次单一，并且偏振全息光栅利用可聚合的液晶材料将光学元件设计成多个具有单一定向层的液晶子层。通过在反应性液晶分子(也叫低分子量聚合性液晶，LCP)中加入手性掺杂剂，可以在每一层中实现手性扭曲。这种手性扭曲有助于调整和优化高衍射效率下的角带宽和波长带宽。
然而，虽然这种偏振全息光栅的结构使其制备流程相对于传统全息光学元件制作工艺更为简单，且光栅衍射特性优秀，能实现更复杂的光学功能，但是这种光栅结构中的反应性液晶分子的排列与固化导致光栅制备过程中仍然无法避免取向层制备和偏振全息曝光，而取向材料需要进行配置溶液、旋涂等一系列操作，曝光光路相对于普通光路的所需条件更为苛刻，搭建更为复杂，并且应用领域窄，常用于增强现实中的耦合器件。
由于光与光学元件的相互作用需要受到材料和几何参数二者共同限制，曝光光路的搭建所需的光学元件设计维度小，取向层制备所需的取向材料调配溶液过程复杂，无法初步实现大规模制备，并且现有的偏振全息光栅应用领域单一，因此，本领域技术人员需要寻求一种新型偏振全息光学元件。
发明内容
目的：为了克服现有技术中存在的现有偏振全息光学元件制备流程中操作难度较高，曝光光路搭建复杂，无法初步实现大规模制备，并且偏振全息光栅制备工艺导致的应用领域单一问题，本发明提供一种偏振全息光学元件及其制备方法，该设计和制备方法利用表面起伏微结构导致基板表面凹凸和不平整，从而克服现有偏振全息光学元件制备流程中取向层制备材料和偏振全息曝光光路设计维度的限制，降低偏振全息光学元件的制备难度，制备的偏振全息光学元件可用于偏振光学透镜、偏振全息调制器等。
技术方案：为解决上述技术问题，本发明采用的技术方案为：
第一方面，一种偏振全息光学元件，包括：基板层、各向异性介质层。
其中，所述基板层，包括基板、表面起伏微结构层，所述表面起伏微结构层，包括起伏微结构，所述起伏微结构呈阵列方式排列在基板上，所述各向异性介质层采用液晶材料。
可选的，所述液晶材料包括但不限于由螺旋倾斜排列的液晶分子组成。
可选的，所述表面起伏微结构层的材质与基板的材质应相同。
可选的，所述起伏微结构，包括但不限于三角柱体结构。
可选的，各向异性介质层的液晶分子横向周期Λx、液晶分子纵向周期Λy、液晶分子周期ΛB、a、b、c、α、和θ之间的关系表达式如下：

2Λy＝P
其中，a为三角形面的左斜边长度，b为三角形面的右斜边长度，c为角形面的底边长度，θ为三角形面的底边与左斜边的夹角，为三角形面的底边与右斜边的夹角，α为三角形面的左斜边与右斜边的夹角，λB为真空中的布拉格波长，P为各向异性介质的节距，neff为各向异性介质的有效折射率，n为倍数。
第二方面，一种偏振全息光学元件的制备方法，具体包括：
清洗基板。
采用微纳制作工艺将起伏微结构呈阵列排布于基板上，再次清洗基板。
通过涂布工艺均匀涂覆液晶材料溶液。
根据液晶类型确定固化方法，并固化。
可选的，所述基板的材质，包括但不限于玻璃、石英、塑料、树脂、二氧化硅或氮化硅。
可选的，所述液晶材料溶液，包括溶质、光引发剂、表面活性剂、手性剂和溶剂。
其中，溶质采用一种或多种液晶单体。
光引发剂采用一种或多种使溶液通过紫外光激发形成聚合物的材料。
表面活性剂采用一种或多种使涂布后的成品表面平整的材料。
手性剂采用使液晶材料形成左旋或右旋的旋光态的材料。
溶剂采用一种或多种有机溶剂。
可选的，所述微纳制作工艺包括但不限于刻蚀、纳米压印或光刻。
可选的，所述固化方法，包括但不限于在保护气体的无氧气环境或抽真空环境下，能量不小于3J/cm2的紫外光照射样品形成光致聚合物。
有益效果：本发明提供的一种偏振全息光学元件及其制备方法，本发明可取代现有偏振全息光学元件制备中的取向层制备和偏振全息曝光过程，减小了偏振全息光学元件制备难度，并且表面微结构的大小和角度可控拓展了偏振全息光学系统的设计优化维度，为实现大规模偏振全息光学元件的生产和应用提供可能性。
本发明利用表面微结构导致的表面凹凸和不平整对液晶取向，并且由于液晶的自组装特性产生螺旋纵向的周期，形成三维周期，取代了偏振全息光学元件制备过程中的取向层制备和偏振全息曝光过程，减小了制作工艺的复杂程度，为偏振全息光学元件的大规模制备提供可能性，拓展了偏振全息光学元件的设计优化维度。
基于本发明提出的偏振全息光学元件结构的一种制备方法，该方法可基于实际所需通过计算对结构参数进行实时调整，能制备出新型偏振全息光学元件，可用作光学透镜、偏振全息调制器、矢量光场生成器等。
附图说明
图1为本发明实施中提供的一种偏振全息光学元件的整体结构示意图。
图2为本发明的表面起伏微结构层以及各向异性介质层的结构示意图。
图3为本发明的起伏微结构的结构示意图。
图4为本发明起伏微结构的横向周期与各向异性介质层的液晶分子纵向周期之间关系示意图。
图5为本发明偏振全息光学元件的仿真模型示意图，其中，图5中(a)为光线正入射后的仿真模型，图5中(b)为光线斜入射后的仿真模型，图5中(c)为起伏微结构的仿真模型。
图6为现有偏振体全息光栅与本发明提及的偏振全息光学元件仿真结果示意图。图6中(a)为现有的偏振体全息光栅的衍射效率与衍射角的关系，图6中(b)为本发明的偏振全息光学元件的衍射效率与衍射角的关系。
图中，101、基板，102、表面起伏微结构层，103、各向异性介质层，201、液晶分子纵向周期Λy，202、液晶分子周期ΛB，203、液晶分子横向周期Λx，204、左斜边，205、右斜边，206、底边，401、起伏微结构。
具体实施方式
下面结合本发明实例中的附图，对本发明实例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明的实施例，本领域技术人员在没有做创造性劳动前提下所获得的所有其他实施例，都属于本发明的保护范围。
下面结合具体实施例对本发明作更进一步的说明。
实施例1：
本实施例介绍一种偏振全息光学元件，如图1所示，包括：基板层、各向异性介质层103。
其中，所述基板层，包括基板101、表面起伏微结构层102，所述表面起伏微结构层，包括起伏微结构，所述起伏微结构呈阵列方式排列在基板101上，所述各向异性介质层103采用液晶材料。所述液晶材料包括但不限于由螺旋倾斜排列的液晶分子组成。
进一步的，所述基板101的材质，包括但不限于玻璃、石英、塑料、树脂、二氧化硅或氮化硅等，并且基板101的折射率可变。
进一步的，所述表面起伏微结构层102的材质与基板101的材质应相同。
进一步的，所述起伏微结构，包括但不限于如图3所示的三角柱体结构。
进一步的，如图2所示，所述各向异性介质层103的液晶分子横向周期Λx203设置为偏振全息光学元件的光栅横向周期，各向异性介质层103的液晶分子纵向周期Λy201设置为偏振全息光学元件的光栅纵向周期，各向异性介质层103中的液晶分子周期ΛB202设置为偏振全息光学元件的布拉格周期。
进一步的，如图3所示，所述起伏微结构401对应的三角形面的底边206长度的变量为c，左斜边204长度的变量为a，右斜边205长度的变量为b，底边206与左斜边204的夹角设置为θ，底边206与右斜边205的夹角设置为左斜边204与右斜边205的夹角设置为α。
进一步的，所述起伏微结构的参数可根据偏振全息光学元件制备过程中光学元件的光栅周期、倾斜角度与方向对应所需光学性能实时调整，因此，各向异性介质层103的液晶分子横向周期Λx、液晶分子纵向周期Λy、液晶分子周期ΛB、a、b、c、α、和θ之间的关系表达式如下：

2Λy＝P
其中，λB为真空中的布拉格波长，P为各向异性介质的节距，neff为各向异性介质的有效折射率，n为倍数。
进一步的，所述液晶材料的溶液包括但不限于反应性液晶、手性材料、光引发剂和化学溶剂。其中，化学溶剂如乙酸乙酯。
进一步的，如图4所示，所述起伏微结构401的右斜边b与各向异性介质层103的液晶分子纵向周期201的关系表达式如下：
其中，n为任意正整数。
实施例2：
本实施例介绍一种偏振全息光学元件的制备方法，具体包括：
清洗基板。
采用微纳制作工艺将起伏微结构呈阵列排布于基板上，清洗基板。
通过涂布工艺均匀涂覆液晶材料溶液。
根据液晶类型确定固化方法，并固化。
进一步的，清洗基板，包括用酒精或其他有机溶剂对基板进行超声清洗，并放入等离子清洗机真空清洗。
进一步的，所述超声清洗和等离子清洗机真空清洗包括但不限于其他可使基板疏水及表面清洁的过程。
进一步的，所述微纳制作工艺包括但不限于刻蚀、纳米压印或光刻等。
进一步的，所述起伏微结构应以底边所对应的面为底进行加工，且应在界面上以阵列顺序排列。
进一步的，所述液晶材料溶液，包括溶质、光引发剂、表面活性剂、手性剂和溶剂。
其中，溶质采用一种或多种液晶单体，如RM101、RM257等一种或多种液晶单体。
光引发剂采用一种或多种使溶液通过紫外光激发形成聚合物的材料，如irgacure 651、irgacure18等一种或多种的材料。
表面活性剂采用一种或多种使涂布后的成品表面平整的材料，如流平剂、消泡剂等一种或多种的材料。
手性剂采用使液晶材料形成左旋或右旋的旋光态的材料，如R5011/S5011、S811等。
溶剂采用一种或多种有机溶剂，有机溶剂如乙酸乙酯、甲苯、丁酮等一种或多种的材料。
进一步的，所述液晶材料的类型包括但不限于主动性液晶和被动性液晶等。
进一步的，所述固化方法，包括但不限于在氮气等气体的保护的无氧气环境或抽真空环境下，能量不小于3J/cm2的紫外光照射样品形成光致聚合物和通过电极控制液晶方向等。
实施例3：
本实施例介绍本发明一种偏振全息光学元件工作原理，通过搭建偏振全息光学元件仿真模型进行说明，如图5所示，图5中(a)为光线正入射后的仿真模型，图5中(b)为光线斜入射后的仿真模型，图5中(c)为表面起伏微结构的仿真模型。具体包括：
步骤1、计算搭建本发明提及的偏振体全息光学耦合元件仿真模型参数，并根据参数搭建仿真模型。
步骤2、将光源设置为正入射和斜入射，分别进行仿真，并观察其折射率变化。
步骤3、对于所述表面起伏微结构进行仿真，观察其衍射效率。
步骤4、通过仿真结果分析本发明提及的偏振体全息光学耦合元件的衍射特性，并根据需求按照仿真结果实时调整仿真模型。
进一步的，本实施例仿真过程中设置基板层和各向异性介质层，其中基板层包括基板和起伏微结构。
进一步的，本实施例模型所述各向异性介质为在液晶状态下分子结构为螺旋状的胆甾相液晶，其液晶材料设置为RM257、S811、乙酸乙酯、光引发剂。
进一步的，所述起伏微结构在本实施例中以三角柱体微结构表示。
进一步的，所述基板层中的基板厚度为0.1～1mm，折射率为1～2.5，本实施例模型设置基板厚度为0.75mm，折射率为1.6。
进一步的，所述三角柱体微结构倾斜角为10°～40°，本实施例模型设置夹角为30°。
进一步的，本实施例模型所述基板和三角柱体微结构设置为玻璃材质。
进一步的，所述各向异性介质层液晶分子横向周期为380nm～780nm，本实施例模型设置液晶分子横向周期Λx为390nm，有效折射率neff为1.67，真空中的布拉格波长为530nm，其他结构参数的计算公式为：

2Λy＝P
其中Λx为液晶分子排列的横向周期，Λy为液晶分子排列的纵向周期，ΛB为布拉格周期，λB为真空中的布拉格波长，P为节距，neff为有效折射率，n为倍数，c为微结构的底边长。
进一步的，本实施例设置的参数在实际制备过程中可从材料参数中得到。
进一步的，本实施例所述光线斜入射的光线倾斜角为15°。
本实施例所述的偏振全息光学元件根据结构参数可在实际制备后直接进行液晶填充，包括但不限于涂布工艺，免除了传统偏振全息光学元件制备过程中的使各向异性介质层中液晶分子倾斜的工艺，包括但不限于偏振全息曝光和取向层制备过程。
本实施例分别对现有的偏振体全息光栅和本文所提及的结构进行仿真，并分析其衍射特性。
步骤1、计算现有的偏振全息光学元件的结构以及本文提及的结构参数。
步骤2、分别搭建现有的偏振全息光学元件的仿真模型和本文所提及结构的仿真模型。
步骤3、记录并分析两种结构仿真模型的衍射特性曲线。
本实施例是采用基板厚度为0.75mm，折射率为1.6，且表面起伏微结构以三角柱体微结构表示，三角柱体微结构倾斜角为30°，现有偏振体全息光栅的横向周期为390nm。如图6所示，图6中(a)为现有的偏振体全息光栅的衍射效率与衍射角的关系，图6中(b)为本文提及结构的衍射效率与衍射角的关系，其中横坐标表示入射角，纵坐标表示衍射效率，入射角所取范围都为-25°～25°，现有偏振体全息光栅的衍射效率峰值在所取入射角范围内接近0.5，本文提及结构的衍射效率峰值在所取入射角范围内接近0.7，本文提及的结构通过仿真后得到的衍射效率更高，角带宽更大，并且衍射特性更为优秀。
以上所述仅是本发明的优选实施方式，应当指出：对于本技术领域的普通技术人员来说，在不脱离本发明原理的前提下，还可以做出若干改进和润饰，这些改进和润饰也应视为本发明的保护范围。

Claims (10)

  1. 一种偏振全息光学元件，其特征在于：包括：基板层、各向异性介质层；
    其中，所述基板层，包括基板、表面起伏微结构层，所述表面起伏微结构层，包括起伏微结构，所述起伏微结构呈阵列方式排列在基板上，所述各向异性介质层采用液晶材料。
  2. 根据权利要求1所述的一种偏振全息光学元件，其特征在于：所述液晶材料包括但不限于由螺旋倾斜排列的液晶分子组成。
  3. 根据权利要求1所述的一种偏振全息光学元件，其特征在于：所述表面起伏微结构层的材质与基板的材质应相同。
  4. 根据权利要求1所述的一种偏振全息光学元件，其特征在于：所述起伏微结构，包括但不限于三角柱体结构。
  5. 根据权利要求4所述的一种偏振全息光学元件，其特征在于：各向异性介质层的液晶分子横向周期Λx、液晶分子纵向周期Λy、液晶分子周期ΛB、a、b、c、α、和θ之间的关系表达式如下：

    2Λy＝P
    其中，a为三角形面的左斜边长度，b为三角形面的右斜边长度，c为角形面的底边长度，θ为三角形面的底边与左斜边的夹角，为三角形面的底边与右斜边的夹角，α为三角形面的左斜边与右斜边的夹角，λB为真空中的布拉格波长，P为各向异性介质的节距，neff为各向异性介质的有效折射率，n为倍数。
  6. 根据权利要求1至5任一项所述的一种偏振全息光学元件的制备方法，其特征在于：具体包括：
    清洗基板；
    采用微纳制作工艺将起伏微结构呈阵列排布于基板上，再次清洗基板；
    通过涂布工艺均匀涂覆液晶材料溶液；
    根据液晶类型确定固化方法，并固化。
  7. 根据权利要求6所述的制备方法，其特征在于：所述基板的材质，包括但不限于玻璃、石英、塑料、树脂、二氧化硅或氮化硅。
  8. 根据权利要求6所述的制备方法，其特征在于：所述液晶材料溶液，包括溶质、光引发剂、表面活性剂、手性剂和溶剂；
    其中，溶质采用一种或多种液晶单体；
    光引发剂采用一种或多种使溶液通过紫外光激发形成聚合物的材料；
    表面活性剂采用一种或多种使涂布后的成品表面平整的材料；
    手性剂采用使液晶材料形成左旋或右旋的旋光态的材料；
    溶剂采用一种或多种有机溶剂。
  9. 根据权利要求6所述的制备方法，其特征在于：所述微纳制作工艺包括但不限于刻蚀、纳米压印或光刻。
  10. 根据权利要求6所述的制备方法，其特征在于：所述固化方法，包括但不限于在保护气体的无氧气环境或抽真空环境下，能量不小于3J/cm2的紫外光照射样品形成光致聚合物。
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004004160A (ja) * 2002-05-30 2004-01-08 Ricoh Co Ltd 偏光ホログラム素子及びその製造方法
US20050042391A1 (en) * 2002-01-18 2005-02-24 Ryan Timothy George Method of making a patterned optical element
CN111367004A (zh) * 2020-04-29 2020-07-03 刘奡 一种偏振体全息光栅的喷墨打印制备方法
CN116626798A (zh) * 2023-05-31 2023-08-22 东南大学 一种基于表面微纳结构的偏振体全息光栅制备方法
CN116893462A (zh) * 2023-09-08 2023-10-17 北京灵犀微光科技有限公司 一种偏振体全息光栅制备方法及偏振体全息光栅
CN119758510A (zh) * 2025-03-05 2025-04-04 东南大学 一种偏振全息光学元件及其制备方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5237451A (en) * 1975-09-19 1977-03-23 Hitachi Ltd Liquid crystal display device
JP2001311824A (ja) * 2000-04-28 2001-11-09 Minolta Co Ltd 偏光分離素子
JP2002365417A (ja) * 2001-06-07 2002-12-18 Sankyo Seiki Mfg Co Ltd 偏光性回折素子およびその製造方法
JP2008152135A (ja) * 2006-12-19 2008-07-03 Ricoh Co Ltd 液晶ホログラム素子
JP2022144917A (ja) * 2021-03-19 2022-10-03 株式会社ジャパンディスプレイ 液晶素子
CN114236819B (zh) * 2021-12-29 2022-09-27 东南大学 一种基于偏振体全息光栅的波导显示二维扩瞳方法
US20240272473A1 (en) * 2023-02-15 2024-08-15 Meta Platforms Technologies, Llc High efficiency reflective liquid crystal polarization hologram for multi-wavelengths

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050042391A1 (en) * 2002-01-18 2005-02-24 Ryan Timothy George Method of making a patterned optical element
JP2004004160A (ja) * 2002-05-30 2004-01-08 Ricoh Co Ltd 偏光ホログラム素子及びその製造方法
CN111367004A (zh) * 2020-04-29 2020-07-03 刘奡 一种偏振体全息光栅的喷墨打印制备方法
CN116626798A (zh) * 2023-05-31 2023-08-22 东南大学 一种基于表面微纳结构的偏振体全息光栅制备方法
CN116893462A (zh) * 2023-09-08 2023-10-17 北京灵犀微光科技有限公司 一种偏振体全息光栅制备方法及偏振体全息光栅
CN119758510A (zh) * 2025-03-05 2025-04-04 东南大学 一种偏振全息光学元件及其制备方法

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