Classifications

• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
  • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
  • C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
  • B23B—TURNING; BORING
  • B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
  • B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
  • C23C16/02—Pretreatment of the material to be coated
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
  • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
  • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
  • C23C16/36—Carbonitrides
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
  • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
  • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
  • C23C16/40—Oxides
  • C23C16/403—Oxides of aluminium, magnesium or beryllium
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
  • C23C16/56—After-treatment
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
  • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
  • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
  • C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
  • C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
  • B23B—TURNING; BORING
  • B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
  • B23B2228/10—Coatings
  • B23B2228/105—Coatings with specified thickness

Definitions

• This disclosure relates to cutting tools.
• Cutting tools comprising a substrate and a coating disposed on the substrate have traditionally been used in cutting processes (Patent Documents 1 to 6).
• the cutting tool of the present disclosure comprises: 1.
• a cutting tool comprising a substrate and a coating disposed on the substrate, the coating includes a first layer disposed on the substrate and a second layer disposed on the first layer;
• the first layer is made of ⁇ -Al 2 O 3 ;
• the second layer is made of TiCN;
• the thickness of the second layer is 0.5 ⁇ m or more and less than 2.0 ⁇ m;
• the second layer has a residual stress X of ⁇ 2.0 GPa or more and ⁇ 0.5 GPa or less.
• FIG. 1 is a schematic cross-sectional view illustrating one embodiment of a cutting tool according to the present disclosure.
• FIG. 2 is a schematic cross-sectional view illustrating another embodiment of the cutting tool of the present disclosure.
• FIG. 3 is a schematic cross-sectional view illustrating another embodiment of the cutting tool of the present disclosure.
• Figure 4 is a schematic cross-sectional view of an example of a CVD (Chemical Vapor Deposition) apparatus used in manufacturing the cutting tool of the present disclosure.
• CVD Chemical Vapor Deposition
• cutting tools have been used that include a substrate and a coating disposed on the substrate, the coating including an ⁇ -Al 2 O 3 layer disposed on the substrate and a TiCN layer disposed on the ⁇ -Al 2 O 3 layer.
• the ⁇ -Al 2 O 3 layer is formed by a CVD method, and therefore the TiCN layer is also formed by a CVD method.
• the TiCN layer contributes to the "wear resistance” and "chipping resistance” of the coating. Furthermore, from the viewpoint of improving "wear resistance,” cutting tools are used in which the thickness of the TiCN layer is 0.5 ⁇ m or more but less than 2.0 ⁇ m. However, in such cutting tools, when attempting to impart high compressive residual stress in order to impart better cutting performance, the TiCN layer is easily worn away due to its thin thickness, making it difficult to achieve both excellent "wear resistance” and excellent “chipping resistance.” Therefore, there is a demand for extending tool life, particularly in intermittent turning of cast iron, by providing both excellent "wear resistance” and excellent “chipping resistance.”
• the present disclosure therefore aims to provide a cutting tool with a long tool life, particularly in intermittent turning of cast iron.
• the cutting tool of the present disclosure is 1.
• a cutting tool comprising a substrate and a coating disposed on the substrate, the coating includes a first layer disposed on the substrate and a second layer disposed on the first layer;
• the first layer is made of ⁇ -Al 2 O 3 ;
• the second layer is made of TiCN;
• the thickness of the second layer is 0.5 ⁇ m or more and less than 2.0 ⁇ m;
• the second layer has a residual stress X of ⁇ 2.0 GPa or more and ⁇ 0.5 GPa or less.
• This disclosure makes it possible to provide a cutting tool with a long tool life, particularly in intermittent turning of cast iron.
• the thickness of the first layer may be 3.0 ⁇ m or more and 15.0 ⁇ m or less. This makes it possible to provide a cutting tool with a longer tool life, particularly in intermittent turning of cast iron.
• the orientation index TC(0 0 12) of the first layer may be 3.0 or greater. This makes it possible to provide a cutting tool with a longer tool life, particularly in intermittent turning of cast iron.
• the coating further includes a third layer located between the substrate and the first layer, the third layer is made of TiCN,
• the residual stress Y of the third layer may be ⁇ 1.0 GPa or more and 1.0 GPa or less, thereby providing a cutting tool having a longer tool life, particularly in intermittent turning of cast iron.
• a ⁇ B means the upper and lower limits of a range (i.e., greater than or equal to A and less than or equal to B). If no unit is specified for A and only a unit is specified for B, the units for A and B are the same.
• FIG. 1 A cutting tool according to one embodiment of the present disclosure will be described with reference to FIGS. 1 to 3.
• FIG. One embodiment of the present disclosure (hereinafter also referred to as “the present embodiment") is A cutting tool 10 comprising a substrate 1 and a coating 2 disposed on the substrate 1,
• the coating 2 includes a first layer 3 located on the substrate 1 and a second layer 4 located on the first layer 3;
• the first layer 3 is made of ⁇ -Al 2 O 3
• the second layer 4 is made of TiCN, the thickness of the second layer 4 is equal to or greater than 0.5 ⁇ m and less than 2.0 ⁇ m;
• the residual stress X of the second layer 4 is not less than ⁇ 2.0 GPa and not more than ⁇ 0.5 GPa.
• the thickness of the second layer 4 is equal to or greater than 0.5 ⁇ m and less than 2.0 ⁇ m. This improves the "wear resistance" of the cutting tool 10.
• the "wear resistance" of the cutting tool 10 can be improved by making the thickness of the second layer 4 between 0.5 ⁇ m and 2.0 ⁇ m.
• simply making the thickness of the second layer 4 between 0.5 ⁇ m and 2.0 ⁇ m and 2.0 ⁇ m can make the second layer 4 prone to wear and tear when attempting to impart high compressive residual stress to further improve the cutting performance of the cutting tool 10.
• the residual stress X of the second layer 4 is ⁇ 2.0 GPa or more and ⁇ 0.5 GPa or less. This allows for excellent compressive residual stress to be imparted to the surface side of the coating relative to the layer made of ⁇ -Al 2 O 3 (i.e., the first layer), thereby improving the “chipping resistance” of the cutting tool 10.
• a cutting tool 10 includes a substrate 1 and a coating 2 disposed on the substrate 1.
• the coating 2 preferably covers the entire surface of the substrate 1, but it does not depart from the scope of this embodiment even if a portion of the substrate 1 is not coated with the coating 2 or if the configuration of the coating 2 is partially different.
• the coating 2 may be disposed so as to cover the surface of at least a portion of the substrate 1 that is involved in cutting.
• the portion of the substrate 1 that is involved in cutting refers to the region of the substrate 1 that is surrounded by the cutting edge ridge and an imaginary surface that is, depending on the size and shape of the substrate 1, a distance from the cutting edge ridge toward the substrate 1 along a perpendicular to the tangent to the cutting edge ridge, of, for example, 5 mm, 3 mm, 2 mm, 1 mm, or 0.5 mm.
• the cutting tool 10 of this embodiment can be suitably used as a cutting tool 10 for drills, end mills, indexable cutting tips for drills, indexable cutting tips for end mills, indexable cutting tips for milling, indexable cutting tips for turning, metal saws, gear cutting tools, reamers, taps, and the like.
• any conventionally known substrate 1 of this type can be used as the substrate 1.
• cemented carbide WC-based cemented carbide, cemented carbide containing WC and Co, cemented carbide containing carbonitrides of Ti, Ta, Nb, etc.
• cermet mainly composed of TiC (titanium carbide), TiN (titanium nitride), TiCN (titanium carbonitride), etc.
• high-speed steel ceramics (titanium carbide, silicon carbide, silicon nitride, aluminum nitride, aluminum oxide, etc.), cubic boron nitride sintered body, or diamond sintered body is preferred.
• WC-based cemented carbide and cermet particularly TiCN-based cermet.
• These substrates 1 have an excellent balance of hardness and strength, especially at high temperatures, and when used as the substrate 1 of a cutting tool 10, they can contribute to extending the life of the cutting tool 10.
• the coating 2 includes a first layer 3 located on the substrate 1 and a second layer 4 located on the first layer 3. By covering the substrate 1, the coating 2 improves various properties of the cutting tool 10, such as wear resistance and chipping resistance, and extends the life of the cutting tool 10. The effects of the present disclosure can be achieved by having the second layer present in part or the entire area involved in cutting.
• the coating 2 may be composed of a first layer 3 located on the substrate 1 and a second layer 4 located on the first layer 3.
• the coating 2 may further include a third layer 5 located between the substrate 1 and the first layer 3.
• the coating 2 may be composed of the first layer 3 located on the substrate 1, a second layer 4 located on the first layer 3, and a third layer 5 located between the substrate 1 and the first layer 3.
• the coating 2 may further include a fourth layer 6 located on the second layer 4.
• the coating 2 may be composed of a first layer 3 positioned on the substrate 1, a second layer 4 positioned on the first layer 3, and a fourth layer 6 positioned on the second layer 4.
• the coating 2 may be composed of the first layer 3 positioned on the substrate 1, the second layer 4 positioned on the first layer 3, a third layer 5 positioned between the substrate 1 and the first layer 3, and a fourth layer 6 positioned on the second layer 4.
• the coating 2 may also include "other layers" described below, as long as the effects of the present disclosure are not impaired.
• the thickness of the coating 2 may be 3.5 ⁇ m or more and 30.0 ⁇ m or less. If the thickness of the coating 2 is less than 3.5 ⁇ m, the coating 2 is too thin, which tends to shorten the life of the cutting tool 10. On the other hand, if the thickness of the coating 2 exceeds 30.0 ⁇ m, chipping of the coating 2 is more likely to occur in the early stages of cutting, which tends to shorten the life of the cutting tool 10.
• the thickness of the coating 3 can be measured by observing the cross section of the coating 2 using a scanning electron microscope (SEM).
• the observation magnification of the cross section sample is set to 5,000 to 10,000 times, the observation area is set to 100 to 500 ⁇ m2 , the thickness width is measured at any three points in one field of view, and the average value is taken as the "thickness.” The same applies to the thickness of each layer described below unless otherwise specified.
• the first layer 3 is made of ⁇ -Al 2 O 3 (in other words, ⁇ -alumina).
• ⁇ -Al 2 O 3 means that, as long as the effects of the present disclosure are achieved, inevitable impurities can be contained in addition to ⁇ -Al 2 O 3.
• the inevitable impurities include chlorine atoms (Cl).
• the total content of the inevitable impurities in the first layer 3 may be more than 0 mass% or less than 3 mass%.
• the fact that the first layer 3 is made of ⁇ -Al 2 O 3 is measured by X-ray diffraction (XRD) and energy dispersive X-ray analysis (EDX).
• XRD X-ray diffraction
• EDX energy dispersive X-ray analysis
• SIMS secondary ion mass spectrometry
• the thickness of the first layer 3 may be 3.0 ⁇ m or more and 15.0 ⁇ m or less. This allows the cutting tool 10 to have both better wear resistance and better chipping resistance, making it possible to provide a cutting tool 10 with a longer tool life, particularly in intermittent turning of cast iron.
• the thickness of the first layer 3 may be 3.2 ⁇ m or more and 13.1 ⁇ m or less, or 3.5 ⁇ m or more and 10.2 ⁇ m or less.
• the orientation index TC(0 0 12) of the first layer 3 may be 3.0 or more. This allows for both better wear resistance and better chipping resistance, making it possible to provide a cutting tool 10 with a longer tool life, particularly in intermittent turning of cast iron.
• the orientation index TC(0 0 12) of the first layer 3 may be 3.0 or more and 8.0 or less, 3.1 or more and 7.7 or less, or 3.2 or more and 7.4 or less.
• the orientation index TC(0 0 12) of the first layer 3 refers to the orientation index TC(0 0 12) of the (0 0 12) plane in the first layer 3, among the orientation indexes TC(hkl) defined by the following formula 1.
• Equation 1 I(hkl) represents the X-ray diffraction intensity of the (hkl) reflection plane, and I 0 (hkl) represents the standard intensity according to ICDD PDF card number 00-010-0173. Furthermore, n in Equation 1 represents the number of reflections used in the calculation, which is 8 in this embodiment.
• the (hkl) planes used for reflection are (012), (104), (110), (0 0 12), (113), (024), (116), and (300).
• ICDD registered trademark
• PDF registered trademark
• orientation index TC (0 0 12) of the first layer 3 in this embodiment can be expressed by the following formula 2.
• the orientation index TC(0 0 12) of the first layer 3 is 3.0 or greater
• the value obtained by substituting TC(0 0 12) into formula 1 above to obtain formula 2 is 3.0 or greater.
• TC(hkl) The above-described measurement of TC(hkl) is possible by analysis using an X-ray diffraction apparatus.
• TC(hkl) can be measured, for example, using Rigaku Corporation's SmartLab (registered trademark) (scan speed: 21.7°/min, step: 0.01°, scan range: 15 to 140°) under the following conditions.
• XRD results the measurement results of TC(hkl) using an X-ray diffraction apparatus are referred to as "XRD results.”
• Characteristic X-ray Cu-K ⁇ Tube voltage: 45 kV Tube current: 200mA
• Filter Multilayer mirror
• Optical system Focusing method
• X-ray diffraction method ⁇ -2 ⁇ method
• X-rays are irradiated onto the rake face of a cutting tool. Since the rake face is usually uneven, while the flank face is flat, it is preferable to irradiate the flank face with X-rays to eliminate disturbance factors.
• the value of the orientation index TC(hkl) of the first layer 3 on the flank face of the substrate is the same as the value of TC(hkl) of the first layer 3 on the rake face of the substrate. Furthermore, in this embodiment, it was confirmed that similar results were obtained even when multiple measurement locations were arbitrarily selected on the same sample and the above measurements were performed for each measurement location.
• the orientation index TC (0 0 12) of the first layer 3 can be set within a desired range by appropriately adjusting the content [vol %] of H 2 S in the mixed gas in step 2A in the second embodiment described later.
• the second layer 4 is made of TiCN.
• "made of TiCN” means that the second layer 4 may contain inevitable impurities in addition to TiCN, as long as the effects of the present disclosure are exhibited.
• the inevitable impurities include chlorine atoms (Cl).
• the total content of the inevitable impurities in the second layer 4 may be greater than 0 mass% or less than 3 mass%.
• the second layer 4 is made of TiCN is determined using X-ray diffraction (XRD) and energy dispersive X-ray analysis (EDX).
• XRD X-ray diffraction
• EDX energy dispersive X-ray analysis
• SIMS secondary ion mass spectrometry
• the thickness of the second layer 4 is 0.5 ⁇ m or more and less than 2.0 ⁇ m, which can improve the “wear resistance” of the cutting tool 10.
• the thickness of the second layer 4 may be 0.6 ⁇ m or more and 1.8 ⁇ m or less, or 0.7 ⁇ m or more and 1.7 ⁇ m or less.
• the residual stress X of the second layer 4 is ⁇ 2.0 GPa or more and ⁇ 0.5 GPa or less, which can improve the “chipping resistance” of the cutting tool 10.
• the residual stress X of the second layer 4 may be ⁇ 1.9 GPa or more and ⁇ 0.6 GPa or less, or may be ⁇ 1.8 GPa or more and ⁇ 0.9 GPa or less.
• Residual stress is a type of internal stress (intrinsic strain) present within a layer. Residual stress can be broadly divided into compressive residual stress and tensile residual stress. Compressive residual stress refers to residual stress expressed as a "-" (negative) numerical value (expressed in units of "GPa” in this specification). For example, “compressive residual stress of 10 GPa” can be understood as a residual stress of -10 GPa. Therefore, the concept of high compressive residual stress indicates that the absolute value of the above numerical value is large, and the concept of low compressive residual stress indicates that the absolute value of the above numerical value is small.
• Tensile residual stress refers to residual stress expressed as a "+" (positive) numerical value (expressed in units of "GPa” in this specification).
• "tensile residual stress of 10 GPa” can be understood as a residual stress of 10 GPa. Therefore, the concept of high tensile residual stress indicates that the above numerical value is large, and the concept of low tensile residual stress indicates that the above numerical value is small.
• the residual stress X of the second layer 4 can be determined by measuring the second layer 4 using an X-ray residual stress device with the sin2 ⁇ method (see pages 54-66 of "X-Ray Stress Measurement Method" (Japan Society for Materials Science, published by Yokendo Co., Ltd. in 1981). The temperature during this measurement is room temperature (20°C). It has also been confirmed that, as long as measurements are taken using the same cutting tool 10, there is no variation in the measurement results even if the measurement location is arbitrarily selected.
• the third layer 5 is made of TiCN.
• "made of TiCN” means that the third layer 5 may contain inevitable impurities in addition to TiCN, as long as the effects of the present disclosure are exhibited.
• the inevitable impurities include chlorine atoms (Cl).
• the total content of the inevitable impurities in the third layer 5 may be greater than 0% by mass or less than 3% by mass.
• the third layer 5 is made of TiCN is determined using X-ray diffraction (XRD) and energy dispersive X-ray analysis (EDX).
• XRD X-ray diffraction
• EDX energy dispersive X-ray analysis
• SIMS secondary ion mass spectrometry
• the thickness of the third layer 5 may be 2 ⁇ m or more and 12 ⁇ m or less. This allows for both better chipping resistance and better wear resistance, making it possible to provide a cutting tool with a longer tool life, particularly in intermittent turning of cast iron.
• the thickness of the third layer 5 may be 4 ⁇ m or more and 10 ⁇ m or less, or 5 ⁇ m or more and 7 ⁇ m or less.
• the residual stress Y in the third layer 5 can be determined using a method similar to that used to measure the residual stress X in the second layer 4, except that the measurement is performed on the third layer 5. It has been confirmed that, as long as the measurement is performed using the same cutting tool 10, there is no variation in the measurement results even if the measurement location is selected arbitrarily.
• the fourth layer 6 is made of TiN.
• "made of TiN” means that the fourth layer 6 may contain inevitable impurities in addition to TiN, as long as the effects of the present disclosure are exhibited.
• the inevitable impurities include chlorine atoms (Cl).
• the total content of the inevitable impurities in the fourth layer 6 may be greater than 0 mass% or less than 3 mass%.
• the fourth layer 6 is made of TiN is measured using X-ray diffraction (XRD) and energy dispersive X-ray analysis (EDX).
• XRD X-ray diffraction
• EDX energy dispersive X-ray analysis
• SIMS secondary ion mass spectrometry
• the thickness of the fourth layer 6 may be 0.1 ⁇ m or more and 0.5 ⁇ m or less. This allows for both better chipping resistance and better wear resistance, making it possible to provide a cutting tool with a longer tool life, particularly in intermittent turning of cast iron.
• the thickness of the fourth layer 6 may be 0.2 ⁇ m or more and 0.4 ⁇ m or less.
• Examples of other layers include a base layer (not shown), an intermediate layer (not shown), and a surface layer (not shown).
• the base layer is a layer disposed between the substrate 1 and the third layer 5 when the third layer is present, and between the substrate 1 and the first layer 3 when the third layer is not present.
• the surface layer is a layer located on the surface of the coating 2.
• the intermediate layer is a layer disposed between the third layer 5 and the first layer 3, between the first layer 3 and the second layer 4, or between the second layer 4 and the fourth layer 6.
• the intermediate layer is a thin adhesive layer such as TiCNO. Therefore, the intermediate layer does not affect the stress distribution.
• Fig. 4 is a schematic cross-sectional view of an example of a CVD apparatus used in manufacturing the cutting tool of this embodiment.
• a method for manufacturing a cutting tool according to the present embodiment is the method for manufacturing the cutting tool according to the first embodiment, A first step of preparing a substrate; a second step of forming a coating on the substrate; and a third step of subjecting the coating to a blast treatment to obtain a cutting tool.
• the second step includes, in this order, a step 2A in which a first layer is formed by a CVD method and a step 2B in which a second layer is formed by a CVD method.
• the second step may further include a step 2C in which a third layer is formed by a CVD method before the step 2A.
• the second step may further include a step 2D in which a fourth layer is formed by a CVD method after the step 2B. Details of each step are described below.
• a substrate is prepared.
• the substrate described in the first embodiment can be used.
• a commercially available substrate may be used, or it may be manufactured using a general powder metallurgy method.
• a general powder metallurgy method for example, WC powder and Co powder are mixed using a ball mill or the like to obtain a mixed powder. After drying, the mixed powder is molded into a desired shape to obtain a green body. The green body is then sintered to obtain a WC-Co cemented carbide (sintered body). Next, the sintered body is subjected to a desired cutting edge processing such as honing, thereby producing a substrate made of a WC-Co cemented carbide. Substrates other than those mentioned above can also be prepared as long as they are conventionally known as this type of substrate.
• a coating is formed on the substrate to obtain a cutting tool.
• the coating is formed using, for example, a CVD apparatus as shown in FIG. 4 .
• the CVD apparatus 30 includes a plurality of substrate setting jigs 31 for holding the substrate 1 and a heat-resistant alloy steel reaction vessel 32 that encases the substrate setting jigs 31.
• a temperature control device 33 is provided around the reaction vessel 32 to control the temperature inside the reaction vessel 32.
• the reaction vessel 32 is provided with a gas introduction pipe 35 having a gas introduction port 34.
• the gas introduction pipe 35 extends vertically within the internal space of the reaction vessel 32 in which the substrate setting jigs 31 are placed, and is rotatable about the vertical axis.
• the gas introduction pipe 35 is also provided with a plurality of injection holes (through holes 36) for injecting gas into the reaction vessel 32.
• the third, first, second, and fourth layers that constitute the coating can be formed as follows.
• the coating includes the “other layers” described in embodiment 1, the “other layers” can be formed using conventional methods.
• step 2C the first layer is formed by CVD. More specifically, the substrate 1 is first placed in a substrate setting jig 31, and a source gas for the first layer is introduced into the reaction vessel 32 from a gas inlet pipe 35 while controlling the temperature and pressure in the reaction vessel 32 within predetermined ranges. This results in the formation of a third layer on the substrate 1.
• the source gas for the third layer is a mixed gas of TiCl 4 , CH 3 CN, CO, N 2 , HCl, and H 2 .
• the TiCl4 content in the mixed gas may be 8.0 vol% or more and 9.0 vol% or less.
• the CH3CN content in the mixed gas may be 0.2 vol% or more and 1.0 vol% or less.
• the CO content in the mixed gas may be 1.3 vol% or more and 2.0 vol% or less.
• the N2 content in the mixed gas may be 8.0 vol% or more and 12.0 vol% or less.
• the HCl content in the mixed gas may be 1.0 vol% or more and 3.0 vol% or less.
• the temperature inside the reaction vessel 32 may be controlled to between 800°C and 850°C, and the pressure inside the reaction vessel 32 may be controlled to between 100 hPa and 120 hPa.
• the gas inlet pipe 35 may be rotated when introducing gas.
• the configuration of the third layer can be changed by controlling the various conditions of the CVD method.
• the thickness of the third layer can be controlled by adjusting the deposition time.
• Step 2A Step of forming first layer by CVD method>
• the first layer is formed by a CVD method. More specifically, when step 2D is performed, the first cutting tool precursor having the third layer formed on the substrate is placed in substrate setting jig 31, and a source gas for the first layer is introduced into reaction vessel 32 from gas inlet pipe 35 while controlling the temperature and pressure within reaction vessel 32 within a predetermined range. This forms the first layer on the third layer.
• substrate 1 is placed in substrate setting jig 31, and a source gas for the first layer is introduced into reaction vessel 32 from gas inlet pipe 35 while controlling the temperature and pressure within reaction vessel 32 within a predetermined range. This forms the first layer on the substrate.
• a mixed gas of AlCl 3 , CO 2 , H 2 S, and H 2 is used as the source gas for the first layer.
• the AlCl3 content in the mixed gas may be 2.0 vol% or more and 2.5 vol% or less, the CO2 content in the mixed gas may be 2.5 vol% or more and 3.5 vol% or less, and the H2S content in the mixed gas may be 0.5 vol% or more and 1.0 vol% or less.
• the temperature inside the reaction vessel 32 may be controlled to between 980°C and 1015°C, and the pressure inside the reaction vessel 32 may be controlled to between 60 hPa and 75 hPa.
• the gas inlet pipe 35 may be rotated when introducing gas.
• the characteristics of the first layer can be changed by controlling the various conditions of the CVD method.
• the thickness of the first layer can be controlled by adjusting the deposition time.
• Step 2B Step of forming second layer by CVD method>
• the second layer is formed by CVD. More specifically, the second cutting tool precursor, which has the first layer formed on the substrate, is placed in a substrate setting jig 31, and a source gas for the second layer is introduced into the reaction vessel 32 through a gas inlet pipe 35 while controlling the temperature and pressure within a predetermined range. This forms the second layer on the first layer.
• the source gas for the second layer is a mixed gas of TiCl 4 , CH 3 CN, CO, N 2 , HCl, and H 2 .
• the TiCl4 content in the mixed gas may be 8.0 vol% or more and 9.0 vol% or less.
• the CH3CN content in the mixed gas may be 0.2 vol% or more and 0.8 vol% or less.
• the CO content in the mixed gas may be 1.3 vol% or more and 2.0 vol% or less.
• the N2 content in the mixed gas may be 8.0 vol% or more and 12.0 vol% or less.
• the HCl content in the mixed gas may be 0.5 vol% or more and 2.0 vol% or less.
• the temperature inside the reaction vessel 32 is controlled to between 850°C and 950°C, and the pressure inside the reaction vessel 32 is controlled to between 100 hPa and 110 hPa.
• the gas inlet pipe 35 may be rotated when introducing gas.
• the characteristics of the second layer can be changed by controlling the various conditions of the CVD method.
• the thickness of the second layer can be controlled by adjusting the deposition time.
• step 2D step of forming fourth layer by CVD method>
• the fourth layer is formed by CVD. More specifically, the third cutting tool precursor, in which the second layer is formed on the first layer, is placed in a substrate setting jig 31, and a source gas for the fourth layer is introduced into the reaction vessel 32 through a gas inlet pipe 35 while controlling the temperature and pressure within a predetermined range. This forms the fourth layer on the second layer.
• a mixed gas of TiCl 4 , N 2 , HCl, and H 2 is used as a source gas for the fourth layer.
• the mixed gas may contain TiCl4 in an amount of 3% by volume or more and 7% by volume or less, N2 in an amount of 20% by volume or more and 30% by volume or less, and HCl in an amount of 5% by volume or more and 10% by volume or less.
• the temperature inside the reaction vessel 32 may be controlled to between 800°C and 1000°C, and the pressure inside the reaction vessel 32 may be controlled to between 100 hPa and 110 hPa.
• the gas inlet pipe 35 may be rotated when introducing gas.
• the configuration of the fourth layer can be changed by controlling the various conditions of the CVD method.
• the thickness of the fourth layer can be controlled by adjusting the deposition time.
• ⁇ Third step Step of obtaining a cutting tool by blasting the coating>
• the coating is subjected to a blasting treatment to obtain a cutting tool.
• blasting refers to a process in which a large number of small spheres (media) made of steel or non-ferrous metal (e.g., ceramics) are collided (projected) at high speed onto the surface of the coating, such as the rake face, to change various properties of the surface, such as residual stress.
• Examples of media types include ceramics, zirconia, alumina, etc.
• the average particle size of the media is greater than 15 ⁇ m and less than 30 ⁇ m.
• the density of the projected media is between 100g/min and 350g/min.
• the distance between the projection unit that projects the media and the surface of the coating (hereinafter also referred to as the "projection distance") is 20 mm or more and less than 30 mm.
• the projection angle of the media is 45° relative to the coating surface.
• the pressure applied to the media when projecting (hereinafter also referred to as “projection pressure”) is 0.10 MPa or more and 0.50 MPa or less.
• the blast processing time is between 20 and 50 seconds.
• the above-mentioned blasting conditions can be adjusted appropriately to suit the composition of the coating.
• the cutting tool obtained by the above manufacturing method is a cutting tool comprising a substrate and a coating disposed on the substrate, the coating including a first layer located on the substrate and a second layer located on the first layer, the first layer made of ⁇ -Al 2 O 3 , the second layer made of TiCN, the thickness of the second layer being 0.5 ⁇ m or more and less than 2.0 ⁇ m, and the residual stress X of the second layer being -2.0 GPa or more and -0.5 GPa or less.
• the reason for this is presumed to be as follows.
• the cutting tool manufacturing method of this embodiment is particularly characterized in that the second step includes steps 2A and 2B, and in step 2B, the film formation time is adjusted so that the thickness of the second layer is 0.5 ⁇ m or more and less than 2.0 ⁇ m, and in step 2B, the temperature inside the reaction vessel 32 is controlled to be 850°C or more and 950°C or less, and the pressure inside the reaction vessel 32 is controlled to be 100 hPa or more and 110 hPa or less, and in step 3, the average particle size of the media is more than 15 ⁇ m and 30 ⁇ m or less, the concentration of the projected media is 100 g/min or more and 350 g/min or less, the projection distance is 20 mm or more and less than 30 mm, the projection angle of the media is 45° with respect to the surface of the coating, the projection pressure is 0.10 MPa or more and 0.50 MPa or less, and the blast processing time is 20 seconds or more and 50 seconds or less. This makes it possible to suppress wear of the second layer caused by blasting and effectively
• a cemented carbide indexable cutting tip (shape: SEET13T3AGSN-G, manufactured by Sumitomo Electric Hardmetal Corporation) having a composition consisting of Co (6 mass%) and WC (balance) (including unavoidable impurities) was prepared.
• Step 2C TiCl4 content in the mixed gas: 8.0 to 9.0% by volume CH 3 CN content in the mixed gas: 0.2 to 1.0% by volume CO content in the mixed gas: 1.3 to 2.0% by volume N2 content in mixed gas: 8.0 to 12.0% by volume HCl content in the mixed gas: 1.0 to 3.0% by volume H2 content in the mixed gas: balance Temperature: 800 to 850°C Pressure: 100-120 hPa
• a first layer was formed on the third layer by CVD under the following conditions so that the composition of the first layer was as shown in Tables 3 and 4 (Step 2A). Furthermore, for each of Samples 1 to 18 and Samples 101 to 105, a first layer was formed on the substrate by CVD under the following conditions so that the composition of the first layer was as shown in Tables 5 and 6 (Step 2A). The deposition time was appropriately adjusted so that the first layer had a thickness as shown in Tables 5 and 6. The content of H 2 S in the mixed gas was appropriately adjusted within the following range so that the orientation index TC(0 0 12) of the first layer was as shown in Tables 5 and 6.
• a second layer was formed on the first layer by CVD under the following conditions so that the composition of the second layer would be as shown in Tables 5 and 6 (Step 2B).
• the deposition time was appropriately adjusted so that the third layer would have a thickness as shown in Tables 5 and 6.
• Step 2B TiCl4 content in the mixed gas: 8.0 to 9.0% by volume CH 3 CN content in the mixed gas: 0.2 to 0.8% by volume CO content in the mixed gas: 1.3 to 2.0% by volume N2 content in mixed gas: 8.0 to 12.0% by volume HCl content in the mixed gas: 0.5 to 2.0% by volume H2 content in the mixed gas: balance Temperature: as described in Tables 1 and 2 Pressure: as described in Tables 1 and 2
• a second layer was formed on the first layer by CVD under the following conditions (Step 2B) so that the composition of the second layer was as shown in Table 6.
• the deposition time was adjusted appropriately so that the second layer had a thickness as shown in Table 6.
• AlCl3 content in the mixed gas 6.0% by volume
• NH3 content in mixed gas 1.5% by volume
• H2 content in the mixed gas balance Temperature: as shown in Table 2 Pressure: as shown in Table 2
• step 2B was not performed on sample 101.
• composition of the first layer of each sample cutting tool was determined by the method described in embodiment 1. The results obtained are shown in the "Composition” column of the “First Layer” column in Tables 5 and 6. When “ ⁇ -Al 2 O 3 " is written in the "Composition” column of the “First Layer” column in Tables 5 and 6, it means that the first layer is made of ⁇ -Al 2 O 3 .
• composition of the second layer of each sample cutting tool was determined by the method described in embodiment 1. The results obtained are shown in the "Composition” column of the “Second Layer” column in Tables 5 and 6. When “TiCN” is listed in the “Composition” column of the “Second Layer” column in Tables 5 and 6, it means that the second layer is made of TiCN.
• composition of the third layer of each sample cutting tool was determined by the method described in embodiment 1. The results obtained are shown in the "Composition” column of the “Third Layer” column in Tables 5 and 6. When “TiCN” is listed in the “Composition” column of the “Third Layer” column in Tables 5 and 6, it means that the third layer is made of TiCN.
• Cutting tests were carried out using the cutting tools of each sample under the following cutting conditions.
• the tool life was measured as the time when damage progressed due to a combination of wear and chipping, and the maximum flank wear amount Vbmax [mm] of the ridge line portion of the cutting tool exceeded 0.3 mm.
• the results are shown in the "Tool life [min]" column of Tables 5 and 6.
• Work material FCD450 (grooved round bar) Processing: Grooved round bar external diameter turning
• Cutting speed 250 m/min
• Feed rate 0.2 mm/rev
• Cutting fluid Water-soluble cutting oil
• the above cutting conditions correspond to the cutting conditions for intermittent turning of cast iron.
• Cutting tools according to samples 1 to 22 correspond to examples.
• Cutting tools according to samples 101 to 107 correspond to comparative examples.
• the results in Tables 5 and 6 show that cutting tools according to samples 1 to 22 have a longer tool life, even in intermittent turning of cast iron, than cutting tools according to samples 101 to 107.
• Substrate 2. Coating, 3. First layer, 4. Second layer, 5. Third layer, 6. Fourth layer, 10. Cutting tool, 30.
• CVD device 31.
• Substrate setting jig 32.
• Reaction vessel 33.
• Temperature control device 34.
• Gas inlet 35.
• Gas inlet pipe 36. Through-hole.

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