WO2025156751A1 - 光波导结构的制作方法、光波导结构及显示设备 - Google Patents

光波导结构的制作方法、光波导结构及显示设备

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Publication number
WO2025156751A1
WO2025156751A1 PCT/CN2024/128577 CN2024128577W WO2025156751A1 WO 2025156751 A1 WO2025156751 A1 WO 2025156751A1 CN 2024128577 W CN2024128577 W CN 2024128577W WO 2025156751 A1 WO2025156751 A1 WO 2025156751A1
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WIPO (PCT)
Prior art keywords
layer
waveguide
waveguide layer
optical
bonding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/CN2024/128577
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English (en)
French (fr)
Inventor
谭伟
熊雯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Beijing Zitiao Network Technology Co Ltd
Original Assignee
Beijing Zitiao Network Technology Co Ltd
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Filing date
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Application filed by Beijing Zitiao Network Technology Co Ltd filed Critical Beijing Zitiao Network Technology Co Ltd
Publication of WO2025156751A1 publication Critical patent/WO2025156751A1/zh
Anticipated expiration legal-status Critical
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/124—Geodesic lenses or integrated gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12166—Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12166—Manufacturing methods
    • G02B2006/12169—Annealing

Definitions

  • the present application belongs to the field of display technology, and in particular relates to a method for manufacturing an optical waveguide structure, an optical waveguide structure, and a display device.
  • Augmented reality (AR) technology combines virtual information with the real world.
  • Optical display technologies primarily include arrayed waveguides, volume holography, birdbaths, and freeform surfaces. Diffraction waveguides based on surface relief have become a mainstream optical display solution due to their advantages, including small size, light weight, high transmittance, and ease of fabrication into desired display devices (such as glasses).
  • Optical waveguide structures are essential components in diffraction waveguide solutions.
  • the present application aims to solve at least one of the technical problems existing in the prior art. To this end, the present application proposes a method for manufacturing an optical waveguide structure, an optical waveguide structure, and a display device.
  • the present application provides a method for manufacturing an optical waveguide structure, comprising:
  • first waveguide layer and a second waveguide layer, the first waveguide layer having a refractive index greater than a refractive index of the second waveguide layer;
  • a grating layer is formed on a side of the first waveguide layer facing away from the second waveguide layer.
  • bonding the first waveguide layer to the second waveguide layer includes:
  • the pre-bonded first waveguide layer and the second waveguide layer are subjected to a high-temperature annealing process to achieve stable bonding between the first waveguide layer and the second waveguide layer.
  • both the first waveguide layer and the second waveguide layer include at least one of glass and resin.
  • the refractive index of the first waveguide layer is between 1.7 and 2.1.
  • the refractive index of the second waveguide layer is between 1.4 and 1.8.
  • the thickness of the second waveguide layer is smaller than the thickness of the first waveguide layer.
  • bonding the first waveguide layer to the second waveguide layer includes:
  • the first waveguide layer and the second waveguide layer are bonded together through the bonding layer.
  • the bonding layer includes at least one of silicon oxide and silicon nitride.
  • the method before forming the grating layer on the side of the first waveguide layer facing away from the second waveguide layer, the method further includes:
  • the third waveguide layer having a refractive index less than that of the second waveguide layer
  • the third waveguide layer is bonded to a side of the second waveguide layer facing away from the first waveguide layer.
  • forming a grating layer on a side of the first waveguide layer facing away from the second waveguide layer includes:
  • the grating material layer is processed by a nanoimprint process or an etching process to obtain a grating layer.
  • the method further includes:
  • An optical functional layer is formed on a side of the grating layer facing away from the first waveguide layer.
  • an optical waveguide structure comprising:
  • the grating layer is located on a side of the first waveguide layer facing away from the second waveguide layer.
  • both the first waveguide layer and the second waveguide layer include at least one of glass and resin.
  • the refractive index of the first waveguide layer is between 1.7 and 2.1, and the refractive index of the second waveguide layer is between 1.4 and 1.8.
  • the thickness of the second waveguide layer is smaller than the thickness of the first waveguide layer.
  • the optical waveguide structure further includes a bonding layer
  • the bonding layer is located between the first waveguide layer and the second waveguide layer, and the first waveguide structure and the second waveguide structure are bonded and connected via the bonding layer.
  • the bonding layer includes at least one of silicon oxide and silicon nitride.
  • the optical waveguide structure further includes a third waveguide layer
  • the third waveguide layer is bonded to a side of the second waveguide layer facing away from the first waveguide layer, and a refractive index of the third waveguide layer is smaller than a refractive index of the second waveguide layer.
  • the optical waveguide structure further includes an optical functional layer
  • the optical functional layer is located on a side of the grating layer facing away from the first waveguide layer.
  • the present application provides a display device comprising the above-mentioned optical waveguide structure.
  • FIG1 is a schematic flow chart of a method for manufacturing an optical waveguide structure according to an embodiment of the present application
  • FIG2 is a schematic diagram showing bonding between a first waveguide layer and a second waveguide layer in a method for manufacturing an optical waveguide structure according to an embodiment of the present application;
  • FIG3 is a second schematic diagram of bonding the first waveguide layer and the second waveguide layer in the method for manufacturing the optical waveguide structure provided by an embodiment of the present application;
  • FIG4 is a third schematic diagram of bonding the first waveguide layer and the second waveguide layer in the method for manufacturing the optical waveguide structure provided by an embodiment of the present application;
  • FIG5 is a schematic diagram of one of the structures of the method for manufacturing an optical waveguide structure provided in an embodiment of the present application.
  • FIG6 is a second structural diagram of the method for manufacturing an optical waveguide structure provided in an embodiment of the present application.
  • FIG7 is a third structural diagram of the method for manufacturing an optical waveguide structure provided in an embodiment of the present application.
  • FIG8 is a fourth structural diagram of the method for manufacturing an optical waveguide structure provided in an embodiment of the present application.
  • FIG9 is a schematic diagram of a structure of an optical waveguide structure provided in an embodiment of the present application.
  • FIG10 is a fifth structural diagram of a method for manufacturing an optical waveguide structure provided in an embodiment of the present application.
  • FIG11 is a sixth structural diagram of a method for manufacturing an optical waveguide structure provided in an embodiment of the present application.
  • FIG12 is a second structural schematic diagram of the optical waveguide structure provided in an embodiment of the present application.
  • FIG13 is a third structural diagram of an optical waveguide structure provided in an embodiment of the present application.
  • FIG14 is a schematic diagram of an optical waveguide structure in the related art
  • FIG15 is a schematic diagram of the optical waveguide structure provided in an embodiment of the present application.
  • Augmented reality (AR) technology combines virtual information with the real world.
  • Optical display technologies primarily include arrayed waveguides, volume holography, birdbaths, and freeform surfaces. Diffraction waveguides based on surface relief have become a mainstream optical display solution due to their advantages, including small size, light weight, high transmittance, and ease of fabrication into desired display devices (such as glasses).
  • Optical waveguide structures are essential components in diffraction waveguide solutions.
  • a single-layer diffraction waveguide is used.
  • the propagation paths and exit pupil densities of red, blue, and green (RGB) light of different wavelengths vary within the waveguide, resulting in uneven color at different locations within the eyebox.
  • the present application proposes an improved method for manufacturing an optical waveguide structure, an optical waveguide structure, and a display device, which can reduce the thickness and weight of the optical waveguide structure while improving the color uniformity of the waveguide and improving the yield of the optical waveguide structure.
  • FIG1 is a schematic flow chart of a method for manufacturing an optical waveguide structure provided in an embodiment of the present application.
  • the method for manufacturing an optical waveguide structure provided in an embodiment of the present application includes steps 110 to 130 .
  • Step 110 Provide a first waveguide layer and a second waveguide layer, wherein the refractive index of the first waveguide layer is greater than the refractive index of the second waveguide layer.
  • a first waveguide layer 1 and a second waveguide layer 2 are provided.
  • the refractive index of the first waveguide layer 1 is greater than that of the second waveguide layer 2 .
  • the refractive index of the first waveguide layer 1 is between 1.7 and 2.1, and the refractive index of the second waveguide layer 2 is between 1.4 and 1.8.
  • the material of the first waveguide layer 1 and the material of the second waveguide layer 2 may be the same or different.
  • both the first waveguide layer 1 and the second waveguide layer 2 comprise at least one of glass and resin.
  • the rigidity of the optical waveguide structure can be increased, thereby improving the reliability of the optical waveguide structure.
  • the weight of the optical waveguide structure can be reduced, contributing to the development of a lighter and thinner optical waveguide structure.
  • the thickness of the second waveguide layer 2 may be smaller than that of the first waveguide layer 1 , so as to avoid excessive influence of the second waveguide layer 2 on the thickness and weight of the optical waveguide structure.
  • the thickness of the first waveguide layer 1 is between 0.3 mm and 3 mm, and the thickness of the second waveguide layer 2 is between 0.2 mm and 1 mm.
  • the size of the second waveguide layer 2 is the same as that of the first waveguide layer 1.
  • the size of the first waveguide layer 1 and the second waveguide layer 2 may be any one of 4 inches, 6 inches, 8 inches, and 12 inches.
  • Step 120 Bond the first waveguide layer and the second waveguide layer.
  • a bonding process is used to bond the first waveguide layer 1 and the second waveguide layer 2.
  • the bonding process can be a fusion bonding (FB) process or a hybrid bonding (Hybrid bonding) process.
  • Bonding (HB) process is not specifically limited here.
  • bonding the first waveguide layer to the second waveguide layer in step 120 includes:
  • the pre-bonded first waveguide layer and the pre-bonded second waveguide layer are subjected to a high-temperature annealing process to achieve stable bonding between the first waveguide layer and the second waveguide layer.
  • the first and second waveguide layers 1 and 2 are first hydrophilized to introduce a large number of hydrophilic -OH groups, thereby forming silanol bonds (Si-OH) on the surfaces of the first and second waveguide layers 1 and 2.
  • Si-OH silanol bonds
  • pre-bonding is achieved by means of -OH and H bonds on the surfaces of the first and second waveguide layers 1 and 2.
  • a high-temperature annealing process is performed, causing a polymerization reaction between the silanol bonds (Si-OH) on the surfaces of the first and second waveguide layers 1 and 2, producing water ( H2O ) and silicon-oxygen bonds (Si-O-Si), thereby achieving stable bonding between the first and second waveguide layers 1 and 2, as shown in Figure 5.
  • the high-temperature annealing process can be performed at a temperature between 400°C and 1000°C.
  • Step 130 forming a grating layer on a side of the first waveguide layer facing away from the second waveguide layer.
  • forming a grating layer on a side of the first waveguide layer facing away from the second waveguide layer in step 130 includes:
  • the grating material layer is processed by a nanoimprint process or an etching process to obtain a grating layer.
  • an adhesive layer 3 can be formed on the side of the first waveguide layer 1 facing away from the second waveguide layer 2.
  • the adhesive layer 3 can be coated on the surface of the first waveguide layer 1 facing away from the second waveguide layer 2.
  • the coating process can include spin coating, inkjet printing (IJP), or slit coating.
  • the thickness of the adhesive layer 3 can be less than or equal to 1 nm.
  • a grating material layer 40 is formed on the side of the adhesive layer 3 facing away from the first waveguide layer 1.
  • the grating material layer 40 may cover the surface of the adhesive layer 3 facing away from the first waveguide layer 1.
  • the grating material layer 40 is processed to form a grating layer 4 on the side of the adhesive layer 3 facing away from the first waveguide layer 1, thereby forming an optical waveguide structure.
  • the process for processing the grating material layer 40 may be a nanoimprint process, an etching process, or other processes, which are not specifically limited here.
  • the grating material layer 40 can be an embossed material layer.
  • the thickness of the embossed material layer can be between 50 nm and 5000 nm.
  • a mold 41 is disposed on the side of the grating material layer 40 facing away from the first waveguide layer 1.
  • the grating material layer 40 is embossed, exposed, and demolded using the mold 41 to obtain the grating layer 4, as shown in FIG8 .
  • the embossing process can include a roll-to-plate or plate-to-plate embossing process.
  • the UV exposure wavelength can be 365 nm.
  • the grating material layer 40 is an inorganic film layer, and an etching process is used to etch the grating material layer 40 into the grating layer 4.
  • the etching process may include an ICP (Inductively Coupled Plasma) or a RIBE (Reactive Ion Beam Etching) process.
  • a semiconductor process flow is used to perform exposure, development, etching, cleaning and other processes on the grating material layer 40 to obtain the grating layer 4.
  • the refractive index of the grating layer 4 is consistent with the refractive index of the first waveguide layer 1.
  • the material of the grating layer 4 may include titanium oxide, silicon nitride, zirconium oxide or hafnium oxide.
  • Optical waveguide structures are mainly divided into one-dimensional and two-dimensional structures.
  • the grating layer 4 can include an in-coupling grating and a turning and out-coupling grating.
  • the grating layer 4 includes an in-coupling grating and an out-coupling grating.
  • the basic principle of the optical waveguide structure is that the coupling grating 1 couples the light from the external optical machine into the waveguide layer, which is then totally reflected inside the waveguide layer and propagates forward. The light is then coupled out after pupil expansion through the turning and coupling grating (or coupling grating), so that the external ambient light is integrated with the virtual information and reaches the human eye to enhance the display.
  • a bonding process is used to bond the first and second waveguide layers together, such as using an adhesive.
  • this bonding process is prone to numerous issues, including poor TTV (thickness uniformity), the presence of bubbles, and poor alignment between the first and second waveguide layers. This can lead to a decrease in the MTF (Modulation Transfer Function) of the bonded waveguide, reduced waveguide clarity, and a reduction in overall yield.
  • MTF Modulation Transfer Function
  • the present embodiment utilizes a bonding process to bond the first waveguide layer 1 to the second waveguide layer 2, eliminating issues such as bubbles, poor TTV, and decreased MTF associated with lamination, effectively improving the yield of the optical waveguide structure.
  • the refractive index of the first waveguide layer 1 is greater than that of the second waveguide layer 2, improving the propagation distance and exit pupil density of red, green, and blue light within the waveguide and enhancing color uniformity.
  • the first waveguide layer 1 and grating layer 4 are designed as a single-layer optical waveguide structure, reducing the thickness and weight of the optical waveguide structure. The relatively thin second waveguide layer 2 does not significantly impact the thickness and weight of the optical waveguide structure.
  • the method for manufacturing the optical waveguide structure further includes:
  • An optical functional layer is formed on a side of the grating layer facing away from the first waveguide layer.
  • an optical functional layer 5 can be deposited on the side of the grating layer 4 facing away from the first waveguide layer 1.
  • Deposition processes can include evaporation, ALD (Atomic Layer Deposition), PECVD (Plasma Enhanced Chemical Vapor Deposition), TFECVD, or PVD (Physical Vapor Deposition).
  • the optical functional layer 5 may include a reflective layer or other film layers, which are not specifically limited herein.
  • the thickness of the optical functional layer 5 may be between 20 nm and 500 nm.
  • the material of the optical function layer 5 may include at least one of TiO 2 , Al, Si 3 N 4 , and HfO 2 .
  • optical waveguide structure in this embodiment may be a waveguide sheet or a waveguide wafer.
  • the waveguide wafer 100 includes a plurality of waveguide slices 10.
  • a cutting process is used to cut the outer shapes of the waveguide slices 10 in the waveguide wafer 100 to obtain a plurality of waveguide slices 10, as shown in FIG11 .
  • the cutting process may include picosecond laser cutting, CO2 laser cleaving, or CNC (Computer Numerical Control) processing.
  • subsequent processes such as waveguide bonding and black coating may be performed on the waveguide slices 10, which are not specifically limited here.
  • bonding the first waveguide layer to the second waveguide layer in step 120 includes:
  • the first waveguide layer and the second waveguide layer are bonded together through the bonding layer.
  • a bonding layer may be formed on one side of the first waveguide layer 1 and/or the second waveguide layer 2 to bond the first waveguide layer 1 to the second waveguide layer 2 via the bonding layer, thereby improving the bonding effect between the first waveguide layer 1 and the second waveguide layer 2.
  • the material of the bonding layer includes at least one of silicon oxide and silicon nitride, such as silicon monoxide, silicon dioxide, and silicon nitride.
  • a first waveguide layer 1 and a second waveguide layer 2 are first provided.
  • a first bonding layer 61 is then formed on one side of the first waveguide layer 1, and a second bonding layer 62 is formed on one side of the second waveguide layer 2.
  • the first waveguide layer 1 and the second waveguide layer 2 are bonded together by the first bonding layer 61 and the second bonding layer 62.
  • the step of bonding the first waveguide layer 1 to the second waveguide layer 2 via the first bonding layer 61 and the second bonding layer 62 may include: firstly performing a hydrophilic treatment on the first bonding layer 61 and the second bonding layer 62 to pre-bond the first waveguide layer 1 to the second waveguide layer 2 via the first bonding layer 61 and the second bonding layer 62. Then, performing a high-temperature annealing treatment on the pre-bonded first waveguide layer 1 and the second waveguide layer 2 to achieve stable bonding between the first waveguide layer 1 and the second waveguide layer 2 via the first bonding layer 61 and the second bonding layer 62.
  • a grating layer 4 is formed on a side of the first waveguide layer 1 facing away from the second waveguide layer 2 .
  • the method before forming the grating layer on the side of the first waveguide layer facing away from the second waveguide layer, the method further includes:
  • the third waveguide layer having a refractive index less than that of the second waveguide layer
  • the third waveguide layer is bonded to a side of the second waveguide layer facing away from the first waveguide layer.
  • a first waveguide layer 1 and a second waveguide layer 2 are first provided, and then the first waveguide layer 1 and the second waveguide layer 2 are bonded together.
  • a third waveguide layer 7 is provided, and the refractive index of the third waveguide layer 7 is lower than that of the second waveguide layer 2. That is, the refractive indices of the first waveguide layer 1, the second waveguide layer 2, and the third waveguide layer 7 gradually decrease.
  • the third waveguide layer 7 is then bonded to the side of the second waveguide layer 2 facing away from the first waveguide layer 1.
  • the bonding process may include a fusion bonding process or a hybrid bonding process.
  • a bonding layer may be formed on one side of the third waveguide layer 7 and/or the side of the second waveguide layer 2 facing away from the first waveguide layer 1, so as to bond the third waveguide layer 7 to the side of the second waveguide layer 2 facing away from the first waveguide layer 1 through the bonding layer. Bonding improves the bonding effect between the third waveguide layer 7 and the second waveguide layer 2.
  • the material of the third waveguide layer 7 may include at least one of glass and resin.
  • the material of the third waveguide layer 7 may be the same as or different from the materials of the first waveguide layer 1 and the second waveguide layer 2.
  • the grating layer 4 is formed on the side of the first waveguide layer 1 facing away from the second waveguide layer 2 .
  • a fourth waveguide layer can be bonded to the side of the third waveguide layer 7 facing away from the second waveguide layer 2.
  • the refractive index of the fourth waveguide layer is lower than that of the third waveguide layer 7.
  • the number of waveguide layers in the optical waveguide structure can be set according to actual needs and is not specifically limited here.
  • an optical waveguide structure includes a first waveguide layer 1 and a grating layer 4 located on one side of the first waveguide layer 1, as shown in Figure 14.
  • Red, blue, and green (RGB) light of different wavelengths has different propagation paths and exit pupil densities within the waveguide, resulting in uneven color at different locations within the eyebox.
  • the present application provides a first waveguide layer 1 and a second waveguide layer 2, wherein the refractive index of the first waveguide layer 1 is greater than that of the second waveguide layer 2.
  • the first waveguide layer 1 and the second waveguide layer 2 are bonded together, and a grating layer 4 is formed on the side of the first waveguide layer 1 facing away from the second waveguide layer 2 to form a single-layer optical waveguide structure. This reduces the thickness and weight of the optical waveguide structure.
  • the provision of waveguide layers with different refractive indices improves the propagation distance and exit pupil density of red, green, and blue light within the waveguide (as shown in FIG.
  • red light R propagates in the first waveguide layer 1
  • blue light B propagates in the first waveguide layer 1 and the second waveguide layer 2). This improves the color uniformity of the waveguide, and the waveguide layers are bonded using a bonding process to improve the yield of the optical waveguide structure.
  • an embodiment of the present application further provides an optical waveguide structure, which can be manufactured by the method for manufacturing the optical waveguide structure in the above embodiment.
  • the optical waveguide structure provided in an embodiment of the present application includes a first waveguide layer 1, a second waveguide layer 2, and a grating layer 4.
  • the first waveguide layer 1 is bonded to the second waveguide layer 2, and the refractive index of the first waveguide layer 1 is greater than the refractive index of the second waveguide layer 2.
  • the grating layer 4 is located on the side of the first waveguide layer facing away from the second waveguide layer 2.
  • the refractive index of the first waveguide layer 1 is between 1.7 and 2.1, and the refractive index of the second waveguide layer 2 is between 1.4 and 1.8.
  • the material of the first waveguide layer 1 and the material of the second waveguide layer 2 may be the same or different.
  • both the first waveguide layer 1 and the second waveguide layer 2 comprise at least one of glass and resin.
  • the rigidity of the optical waveguide structure can be increased, thereby improving the reliability of the optical waveguide structure.
  • the weight of the optical waveguide structure can be reduced, contributing to the development of a lighter and thinner optical waveguide structure.
  • the thickness of the second waveguide layer 2 may be smaller than that of the first waveguide layer 1 , so as to avoid excessive influence of the second waveguide layer 2 on the thickness and weight of the optical waveguide structure.
  • the thickness of the first waveguide layer 1 is between 0.3 mm and 3 mm, and the thickness of the second waveguide layer The thickness of 2 is between 0.2 mm and 1 mm.
  • the size of the second waveguide layer 2 is the same as that of the first waveguide layer 1.
  • the size of the first waveguide layer 1 and the second waveguide layer 2 may be any one of 4 inches, 6 inches, 8 inches, and 12 inches.
  • the refractive index of the grating layer 4 is consistent with the refractive index of the first waveguide layer 1.
  • the material of the grating layer 4 may include titanium oxide, silicon nitride, zirconium oxide or hafnium oxide.
  • Optical waveguide structures are mainly divided into one-dimensional and two-dimensional structures.
  • the grating layer 4 can include an in-coupling grating and a turning and out-coupling grating.
  • the grating layer 4 includes an in-coupling grating and an out-coupling grating.
  • the basic principle of the optical waveguide structure is that the coupling grating 1 couples the light from the external optical machine into the waveguide layer, which is then totally reflected inside the waveguide layer and propagates forward. The light is then coupled out after pupil expansion through the turning and coupling grating (or coupling grating), so that the external ambient light is integrated with the virtual information and reaches the human eye to enhance the display.
  • the optical waveguide structure may further include an adhesive layer 3 .
  • the adhesive layer 3 is located between the first waveguide layer 1 and the grating layer 4 , so that the first waveguide layer 1 and the grating layer 4 are bonded together via the adhesive layer 3 .
  • the optical waveguide structure may further include an optical functional layer 5 .
  • the optical functional layer 5 is located on a side of the grating layer 4 facing away from the first waveguide layer 1 .
  • the optical functional layer 5 may include a reflective layer or other film layers, which are not specifically limited herein.
  • the thickness of the optical functional layer 5 may be between 20 nm and 500 nm.
  • the material of the optical function layer 5 may include at least one of TiO 2 , Al, Si 3 N 4 , and HfO 2 .
  • the optical waveguide structure may further include a bonding layer, wherein the bonding layer is located between the first waveguide layer 1 and the second waveguide layer 2, and the first waveguide layer 1 and the second waveguide layer 2 are bonded together via the bonding layer.
  • the optical waveguide structure may further include a first bonding layer 61 and a second bonding layer 62.
  • the first bonding layer 61 is located on a side of the first waveguide layer 1 close to the second waveguide layer 2, and the second bonding layer 62 is located between the first bonding layer 61 and the second waveguide layer 2.
  • the first waveguide layer 1 and the second waveguide layer 2 are bonded together via the first bonding layer 61 and the second bonding layer 62.
  • the material of the bonding layer includes at least one of silicon oxide and silicon nitride, such as silicon monoxide, silicon dioxide, and silicon nitride, etc.
  • the materials of the first bonding layer 61 and the second bonding layer 62 can be the same or different.
  • the optical waveguide structure may further include a third waveguide layer 7.
  • the refractive index of the third waveguide layer 7 is lower than that of the second waveguide layer 2. That is, the refractive indices of the first waveguide layer 1, the second waveguide layer 2, and the third waveguide layer 7 gradually decrease.
  • the third waveguide layer 7 is located on the side of the second waveguide layer 2 facing away from the first waveguide layer 1.
  • the material of the third waveguide layer 7 may include at least one of glass and resin.
  • the material of the third waveguide layer 7 may be the same as or different from the materials of the first waveguide layer 1 and the second waveguide layer 2.
  • the guide structure may further include a fourth waveguide layer, the refractive index of the fourth waveguide layer being lower than the refractive index of the third waveguide layer 7 , and the fourth waveguide layer being located on a side of the third waveguide layer 7 facing away from the second waveguide layer 2 .
  • a first waveguide layer, a second waveguide layer, and a grating layer are provided.
  • the refractive index of the first waveguide layer is greater than that of the second waveguide layer.
  • the first waveguide layer and the second waveguide layer are bonded together.
  • the grating layer is located on the side of the first waveguide layer facing away from the second waveguide layer, thereby forming a single-layer optical waveguide structure. This reduces the thickness and weight of the optical waveguide structure.
  • the provision of waveguide layers with different refractive indices improves the propagation distance and exit pupil density of red, green, and blue light within the waveguide, thereby enhancing the color uniformity of the waveguide.
  • the first waveguide layer and the second waveguide layer are bonded together, thereby improving the yield of the optical waveguide structure.
  • an embodiment of the present application further provides a display device, including the optical waveguide structure in the above embodiment, which will not be described in detail here.
  • a first waveguide layer, a second waveguide layer, and a grating layer are provided.
  • the refractive index of the first waveguide layer is greater than that of the second waveguide layer.
  • the first waveguide layer and the second waveguide layer are bonded together.
  • the grating layer is located on the side of the first waveguide layer facing away from the second waveguide layer, thereby forming a single-layer optical waveguide structure. This reduces the thickness and weight of the optical waveguide structure.
  • the provision of waveguide layers with different refractive indices improves the propagation distance and exit pupil density of red, green, and blue light within the waveguide, improves the color uniformity of the waveguide, and thereby improves the display effect of the display device.
  • the first waveguide layer and the second waveguide layer are bonded together, thereby improving the yield rate of the optical waveguide structure.
  • the display device provided in the embodiment of the present application can be an AR display device, such as AR glasses or AR helmets, and other products or components with AR display functions.
  • first,” “second,” and the like in the specification and claims of this application are used to distinguish similar objects, and are not used to describe a particular order or precedence. It should be understood that the terms used in this manner are interchangeable where appropriate, so that the embodiments of this application can be implemented in orders other than those illustrated or described herein. Furthermore, the terms “first,” “second,” and the like generally distinguish objects of a class and do not limit the number of objects. For example, the first object may be one or more.

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Abstract

一种光波导结构的制作方法、光波导结构及显示设备，属于显示技术领域。光波导结构的制作方法包括：提供第一波导层（1）和第二波导层（2），第一波导层（1）的折射率大于第二波导层（2）的折射率；将第一波导层（1）与第二波导层（2）相键合；在第一波导层（1）背离第二波导层（2）的一侧形成光栅层（4）。

Description

光波导结构的制作方法、光波导结构及显示设备
相关申请的交叉引用
本申请是以申请号为202410093799.7、申请日为2024年1月23日的中国申请为基础，并主张其优先权，该中国申请的公开内容在此作为整体引入本申请中。
技术领域
本申请属于显示技术领域，尤其涉及一种光波导结构的制作方法、光波导结构及显示设备。
背景技术
增强现实(Augmented Reality，AR)技术是一种将虚拟信息与真实世界相结合的技术，其中的光学显示技术主要包括阵列波导方案、体全息方案、光浴(birdbath)方案和自由曲面方案等。基于表面浮雕的衍射波导方案由于其体积小、重量轻、透过率高且易于做成所需显示设备(如眼镜)的形态等优势，成为主流光学显示方案之一。光波导结构为衍射波导方案中的必要器件。
发明内容
本申请旨在至少解决现有技术中存在的技术问题之一。为此，本申请提出一种光波导结构的制作方法、光波导结构及显示设备。
第一方面，本申请提供了一种光波导结构的制作方法，包括：
提供第一波导层和第二波导层，所述第一波导层的折射率大于所述第二波导层的折射率；
将所述第一波导层与所述第二波导层相键合；
在所述第一波导层背离所述第二波导层的一侧形成光栅层。
根据本申请的一个实施例，所述将所述第一波导层与所述第二波导层相键合，包括：
对所述第一波导层和所述第二波导层进行亲水处理，以将所述第一波导层与所述第二波导层进行预键合；
对预键合的所述第一波导层和所述第二波导层进行高温退火处理，实现所述第一波导层与所述第二波导层的稳定键合。
根据本申请的一个实施例，所述第一波导层和所述第二波导层均包括玻璃和树脂中的至少一种。
根据本申请的一个实施例，所述第一波导层的折射率位于1.7至2.1之间，所述 第二波导层的折射率位于1.4至1.8之间。
根据本申请的一个实施例，所述第二波导层的厚度小于所述第一波导层的厚度。
根据本申请的一个实施例，所述将所述第一波导层与所述第二波导层相键合，包括：
在所述第一波导层和/或第二波导层的一侧形成键合层；
通过所述键合层，将所述第一波导层和所述第二波导层相键合。
根据本申请的一个实施例，所述键合层包括氧化硅和氮化硅中的至少一种。
根据本申请的一个实施例，所述在所述第一波导层背离所述第二波导层的一侧形成光栅层之前，还包括：
提供第三波导层，所述第三波导层的折射率小于所述第二波导层的折射率；
将所述第三波导层与所述第二波导层背离所述第一波导层的一侧相键合。
根据本申请的一个实施例，所述在所述第一波导层背离所述第二波导层的一侧形成光栅层，包括：
在所述第一波导层背离所述第二波导层的一侧形成光栅材料层；
采用纳米压印工艺或刻蚀工艺，对所述光栅材料层进行处理，得到光栅层。
根据本申请的一个实施例，所述方法还包括：
在所述光栅层背离所述第一波导层的一侧形成光学功能层。
第二方面，本申请提供了一种光波导结构，包括：
第一波导层；
第二波导层，与所述第一波导层键合连接，所述第一波导层的折射率大于所述第二波导层的折射率；
光栅层，位于所述第一波导层背离所述第二波导层的一侧。
根据本申请的一个实施例，所述第一波导层和所述第二波导层均包括玻璃和树脂中的至少一种。
根据本申请的一个实施例，所述第一波导层的折射率位于1.7至2.1之间，所述第二波导层的折射率位于1.4至1.8之间。
根据本申请的一个实施例，所述第二波导层的厚度小于所述第一波导层的厚度。
根据本申请的一个实施例，所述光波导结构还包括键合层；
所述键合层位于所述第一波导层与所述第二波导层之间，所述第一波导结构与所述第二波导结构通过所述键合层键合连接。
根据本申请的一个实施例，所述键合层包括氧化硅和氮化硅中的至少一种。
根据本申请的一个实施例，所述光波导结构还包括第三波导层；
所述第三波导层与所述第二波导层背离所述第一波导层的一侧键合连接，所述第三波导层的折射率小于所述第二波导层的折射率。
根据本申请的一个实施例，所述光波导结构还包括光学功能层；
所述光学功能层位于所述光栅层背离所述第一波导层的一侧。
第三方面，本申请提供了一种显示设备，该显示设备包括上述光波导结构。
本申请的附加方面和优点将在下面的描述中部分给出，部分将从下面的描述中变得明显，或通过本申请的实践了解到。
附图说明
本申请的上述和/或附加的方面和优点从结合下面附图对实施例的描述中将变得明显和容易理解，其中：
图1是本申请实施例提供的光波导结构的制作方法的流程示意图；
图2是本申请实施例提供的光波导结构的制作方法中第一波导层和第二波导层相键合的原理图之一；
图3是本申请实施例提供的光波导结构的制作方法中第一波导层和第二波导层相键合的原理图之二；
图4是本申请实施例提供的光波导结构的制作方法中第一波导层和第二波导层相键合的原理图之三；
图5是本申请实施例提供的光波导结构的制作方法中的结构示意图之一；
图6是本申请实施例提供的光波导结构的制作方法中的结构示意图之二；
图7是本申请实施例提供的光波导结构的制作方法中的结构示意图之三；
图8是本申请实施例提供的光波导结构的制作方法中的结构示意图之四；
图9是本申请实施例提供的光波导结构的结构示意图之一；
图10是本申请实施例提供的光波导结构的制作方法中的结构示意图之五；
图11是本申请实施例提供的光波导结构的制作方法中的结构示意图之六；
图12是本申请实施例提供的光波导结构的结构示意图之二；
图13是本申请实施例提供的光波导结构的结构示意图之三；
图14是相关技术中光波导结构的原理图；
图15是本申请实施例提供的光波导结构的原理图。
具体实施方式
下面详细描述本申请的实施例，所述实施例的示例在附图中示出，其中自始至终相同或类似的标号表示相同或类似的元件或具有相同或类似功能的元件。下面通过参考附图描述的实施例是示例性的，仅用于解释本申请，而不能理解为对本申请的限制。
下面参考附图描述本申请实施例提供的光波导结构的制作方法、光波导结构及显示设备。
增强现实(Augmented Reality，AR)技术是一种将虚拟信息与真实世界相结合的技术，其中的光学显示技术主要包括阵列波导方案、体全息方案、光浴(birdbath)方案和自由曲面方案等。基于表面浮雕的衍射波导方案由于其体积小、重量轻、透过率高且易于做成所需显示设备(如眼镜)的形态等优势，成为主流光学显示方案之一。光波导结构为衍射波导方案中的必要器件。
为了降低衍射波导的厚度和重量，采用单层结构的衍射波导。但对于单层结构的衍射波导，不同波段的红蓝绿(RGB)三色光在波导内的传播路径和出瞳密度不同，导致Eyebox(眼盒)不同位置色彩不均一。
鉴于此，本申请提出了改进的光波导结构的制作方法、光波导结构及显示设备，能够在降低光波导结构的厚度和重量的同时，提高波导色彩均一性，且提高光波导结构的良率。
图1为本申请实施例提供的光波导结构的制作方法的流程示意图。
如图1所示，本申请实施例提供的光波导结构的制作方法包括步骤110至步骤130。
步骤110、提供第一波导层和第二波导层，第一波导层的折射率大于第二波导层的折射率。
结合图2至图5所示，提供第一波导层1和第二波导层2，第一波导层1的折射率大于第二波导层2的折射率。
在一些实施例中，第一波导层1的折射率位于1.7至2.1之间，第二波导层2的折射率位于1.4至1.8之间。
第一波导层1的材料与第二波导层2的材料可以相同，也可以不同。
在一些实施例中，第一波导层1和第二波导层2均包括玻璃和树脂中的至少一种。在第一波导层1和/或第二波导层2的材料为玻璃的情况下，可以提高光波导结构的刚性，进而提高光波导结构的可靠性。在一波导层1和/或第二波导层2的材料为树脂的情况下，可以减小光波导结构的重量，有助于光波导结构的轻薄化发展。
第二波导层2的厚度可以小于第一波导层1的厚度，以避免第二波导层2的设置对光波导结构的厚度和重量产生过多影响。
在一些实施例中，第一波导层1的厚度位于0.3毫米至3毫米之间，第二波导层2的厚度位于0.2毫米至1毫米之间。
第二波导层2的尺寸与第一波导层1的尺寸相同。例如，第一波导层1和第二波导层2的尺寸均包括4寸、6寸、8寸和12寸等中的任意一种。
步骤120、将第一波导层与第二波导层相键合。
结合图2至图5所示，采用键合工艺，将第一波导层1和第二波导层2相键合。其中，键合工艺可以为熔融键合(Fusion Bonding，FB)工艺，也可以为混合键合(Hybrid  Bonding，HB)工艺，此处不作具体限定。
在一些实施例中，步骤120中的将第一波导层与第二波导层相键合，包括：
对第一波导层和第二波导层进行亲水处理，以将第一波导层与第二波导层进行预键合；
对预键合的第一波导层和第二波导层进行高温退火处理，实现第一波导层与第二波导层的稳定键合。
如图2所示，先对第一波导层1和第二波导层2进行亲水处理，引入大量亲水基团-OH，以在第一波导层1和第二波导层2的表面形成硅醇键Si-OH。在室温下，如图3所示，依靠第一波导层1和第二波导层2表面的-OH及H键完成预键合。然后，如图4所示，通过高温退火工艺，第一波导层1和第二波导层2表面的硅醇键Si-OH之间发生聚合反应，产生水H2O和硅氧键Si-O-Si，实现第一波导层1与第二波导层2的稳定键合，如图5所示。其中，高温退火工艺的温度可以位于400℃至1000℃之间。
步骤130、在第一波导层背离第二波导层的一侧形成光栅层。
在一些实施例中，步骤130中的在第一波导层背离第二波导层的一侧形成光栅层，包括：
在第一波导层背离第二波导层的一侧形成光栅材料层；
采用纳米压印工艺或刻蚀工艺，对光栅材料层进行处理，得到光栅层。
如图6所示，在形成光栅材料层之前，可以先在第一波导层1背离第二波导层2的一侧形成粘结层3。粘结层3可以涂覆在第一波导层1背离第二波导层2一侧的表面。其中，涂覆工艺可以包括旋涂(Spin Coating)、喷墨打印(Ink-jet Printing，IJP)或狭缝(Slit)涂覆工艺等。粘结层3的厚度可以小于或等于1nm。
然后，在粘结层3背离第一波导层1的一侧形成光栅材料层40，光栅材料层40可以覆盖粘结层3背离第一波导层1一侧的表面。对光栅材料层40进行处理，以在粘结层3背离第一波导层1的一侧形成光栅层4，从而形成光波导结构。其中，对光栅材料层40进行处理的工艺可以为纳米压印工艺，也可以为刻蚀工艺，也可以为其他工艺，此处不作具体限定。
例如，光栅材料层40可以为压印材料层。其中，压印材料层的厚度可以位于50nm至5000nm之间。如图7所示，在光栅材料层40背离第一波导层1的一侧设置模具41，通过模具41对光栅材料层40进行压印、曝光和脱模等处理，得到光栅层4，如图8所示。其中，压印工艺可以包括辊对板型(Roll to plate)或板对板型(Plate to Plate)压印工艺等。紫外曝光波长可以为365nm。
例如，光栅材料层40为无机膜层。采用刻蚀工艺，将光栅材料层40刻蚀为光栅层4。其中，刻蚀工艺可以包括ICP(Inductively Coupled Plasma，电感耦合等离子体)或RIBE(Reactive Ion Beam Etching，反应离子束刻蚀)工艺等。
可选地，采用半导体工艺流程，对光栅材料层40进行曝光、显影、刻蚀和清洗等工艺，得到光栅层4。
在一些实施例中，光栅层4的折射率与第一波导层1的折射率相一致。光栅层4的材料可以包括氧化钛、氮化硅、氧化锆或氧化铪等。
光波导结构主要分为一维架构和二维架构。对于一维架构的光波导结构，光栅层4可以包括耦入光栅以及转折和耦出光栅。对于二维架构的光波导结构，光栅层4包括耦入光栅和耦出光栅。
光波导结构的基本原理为耦入光栅1将外部光机的光耦入波导层，在波导层内部进行全反射向前传播，并通过转折和耦出光栅(或者耦出光栅)扩瞳后耦出，以将外界环境光与虚拟信息融合后到达人眼起到增强显示的作用。
相关技术中，为了降低光波导结构的重量和厚度，且为了提高波导色彩均一性，采用贴合工艺，将第一波导层与第二波导层相贴合，如采用粘接剂将第一波导层与第二波导层相贴合。但是，贴合工艺过程中容易出现很多问题，如贴合TTV(厚度均匀性)差，出现气泡，第一波导层与第二波导层对位精度差，导致贴合波导MTF(Modulation Transfer Function，调制传递函数)下降，波导清晰度变差，整体良率下降等。
而本申请实施例通过键合工艺，将第一波导层1与第二波导层2相键合，避免采用贴合工艺导致的气泡、TTV差及MTF下降等问题，有效提高光波导结构的良率。而且，第一波导层1的折射率大于第二波导层2的折射率，改善红绿蓝三色光在波导内的传播距离和出瞳密度，提高波导色彩均一性。另外，第一波导层1与光栅层4的设计为单层光波导结构，减小光波导结构的厚度和重量，而第二波导层2的厚度较薄，不会对光波导结构的厚度和重量产生过多影响。
在一些实施例中，该光波导结构的制作方法还包括：
在光栅层背离第一波导层的一侧形成光学功能层。
如图9所示，根据光波导结构的实际需求，可在光栅层4背离第一波导层1的一侧沉积光学功能层5。其中，沉积工艺可以包括蒸镀、ALD(Atomic Layer Deposition，原子层沉积)、PECVD(Plasma Enhanced Chemical Vapor Deposition，等离子体增强化学气相沉积)、TFECVD或PVD(Physical Vapor Deposition，物理气相沉积)等。
其中，光学功能层5可以包括反射层，也可以包括其他膜层，此处不作具体限定。光学功能层5的厚度可以位于20nm至500nm之间。
在一些实施例中，光学功能层5的材料可以包括TiO2、Al、Si3N4和HfO2等中的至少一种。
需要说明的是，本实施例中的光波导结构可以为波导片，也可以为波导晶圆(wafer)。
在光波导结构为波导晶圆时，如图10所示，波导晶圆100包括多个波导片10。采用切割工艺，对波导晶圆100中的波导片10的外形进行切割，得到多个波导片10，如图11所示。其中，切割工艺可以包括皮秒激光切割和CO2激光裂片工艺或者CNC(Computer Numerical Control，数控加工)工艺等。在切割获得波导片10后，还可以对波导片10进行波导贴合及涂黑等后道制程，此处不作具体限定。
在一些实施例中，步骤120中的将第一波导层与第二波导层相键合，包括：
在第一波导层和/或第二波导层的一侧形成键合层；
通过键合层，将第一波导层和第二波导层相键合。
在第一波导层1与第二波导层2相键合之前，可以先在第一波导层1和/或第二波导层2的一侧形成键合层，以通过键合层将第一波导层1与第二波导层2相键合，提高第一波导层1和第二波导层2的键合效果。
在一些实施例中，键合层的材料包括硅的氧化物和硅的氮化物等中的至少一种，如一氧化硅、二氧化硅和氮化硅等。
如图12所示，先提供第一波导层1和第二波导层2。然后，在第一波导层1的一侧形成第一键合层61，在第二波导层2的一侧形成第二键合层62。通过第一键合层61和第二键合层62，将第一波导层1与第二波导层2相键合。
其中，通过第一键合层61和第二键合层62，将第一波导层1与第二波导层2相键合的步骤，可以包括：先对第一键合层61和第二键合层62进行亲水处理，以通过第一键合层61和第二键合层62，将第一波导层1与第二波导层2进行预键合。然后，对预键合的第一波导层1和第二波导层2进行高温退火处理，以通过第一键合层61和第二键合层62，实现第一波导层1与第二波导层2的稳定键合。
在第一波导层1与第二波导层2相键合后，在第一波导层1背离第二波导层2的一侧形成光栅层4。
在一些实施例中，在第一波导层背离第二波导层的一侧形成光栅层之前，还包括：
提供第三波导层，第三波导层的折射率小于第二波导层的折射率；
将第三波导层与第二波导层背离第一波导层的一侧相键合。
如图13所示，先提供第一波导层1和第二波导层2，然后将第一波导层1与第二波导层2相键合。提供第三波导层7，第三波导层7的折射率小于第二波导层2的折射率，即第一波导层1、第二波导层2和第三波导层7的折射率逐渐减小。然后，将第三波导层7与第二波导层2背离第一波导层1的一侧相键合。其中，键合工艺可以包括熔融键合工艺或混合键合工艺等。
在一些实施例中，在将第三波导层7与第二波导层2背离第一波导层1的一侧相键合之前，可以在第三波导层7的一侧和/或第二波导层2背离第一波导层1的一侧形成键合层，以通过键合层将第三波导层7与第二波导层2背离第一波导层1的一侧相 键合，提高第三波导层7与第二波导层2的键合效果。
在一些实施例中，第三波导层7的材料可以包括玻璃和树脂中的至少一种。第三波导层7的材料可以与第一波导层1和第二波导层2的材料相同，也可以不同。
在第三波导层7与第二波导层2相键合之后，在第一波导层1背离第二波导层2的一侧形成光栅层4。
需要说明的是，光波导结构中还可以形成更多波导层，例如在第一波导层1背离第二波导层2的一侧形成光栅层4之前，还可以继续在第三波导层7背离第二波导层2的一侧键合第四波导层，第四波导层的折射率小于第三波导层7的折射率。光波导结构中波导层的数量可根据实际需求设置，此处不作具体限定。
相关技术中，光波导结构包括第一波导层1以及位于第一波导层1一侧的光栅层4，如图14所示。不同波段的红蓝绿(RGB)三色光在波导内的传播路径和出瞳密度不同，导致Eyebox(眼盒)不同位置色彩不均一。
而本申请通过提供第一波导层1和第二波导层2，且第一波导层1的折射率大于第二波导层2的折射率，将第一波导层1与第二波导层2相键合，并在第一波导层1背离第二波导层2的一侧形成光栅层4，构成单层光波导结构，减小光波导结构的厚度和重量，设置不同折射率的波导层，改善红绿蓝三色光在波导内的传播距离和出瞳密度(如图15所示，红光R在第一波导层1中传播，蓝光B在第一波导层1和第二波导层2中传播)，提高波导色彩均一性，且采用键合工艺将波导层相键合，提高光波导结构的良率。
相应地，本申请实施例还提供一种光波导结构，能够通过上述实施例中的光波导结构的制作方法制作形成。
如图9所示，本申请实施例提供的光波导结构包括第一波导层1、第二波导层2和光栅层4。第一波导层1与第二波导层2键合连接，且第一波导层1的折射率大于第二波导层2的折射率。光栅层4位于第一波导层背离第二波导层2的一侧。
在一些实施例中，第一波导层1的折射率位于1.7至2.1之间，第二波导层2的折射率位于1.4至1.8之间。
第一波导层1的材料与第二波导层2的材料可以相同，也可以不同。
在一些实施例中，第一波导层1和第二波导层2均包括玻璃和树脂中的至少一种。在第一波导层1和/或第二波导层2的材料为玻璃的情况下，可以提高光波导结构的刚性，进而提高光波导结构的可靠性。在一波导层1和/或第二波导层2的材料为树脂的情况下，可以减小光波导结构的重量，有助于光波导结构的轻薄化发展。
第二波导层2的厚度可以小于第一波导层1的厚度，以避免第二波导层2的设置对光波导结构的厚度和重量产生过多影响。
在一些实施例中，第一波导层1的厚度位于0.3毫米至3毫米之间，第二波导层 2的厚度位于0.2毫米至1毫米之间。
第二波导层2的尺寸与第一波导层1的尺寸相同。例如，第一波导层1和第二波导层2的尺寸均包括4寸、6寸、8寸和12寸等中的任意一种。
在一些实施例中，光栅层4的折射率与第一波导层1的折射率相一致。光栅层4的材料可以包括氧化钛、氮化硅、氧化锆或氧化铪等。
光波导结构主要分为一维架构和二维架构。对于一维架构的光波导结构，光栅层4可以包括耦入光栅以及转折和耦出光栅。对于二维架构的光波导结构，光栅层4包括耦入光栅和耦出光栅。
光波导结构的基本原理为耦入光栅1将外部光机的光耦入波导层，在波导层内部进行全反射向前传播，并通过转折和耦出光栅(或者耦出光栅)扩瞳后耦出，以将外界环境光与虚拟信息融合后到达人眼起到增强显示的作用。
在一些实施例中，如图9所示，光波导结构还可以包括粘结层3。粘结层3位于第一波导层1与光栅层4之间，使第一波导层1与光栅层4通过粘结层3相粘结。
在一些实施例中，如图9所示，光波导结构还可以包括光学功能层5。光学功能层5位于光栅层4背离第一波导层1的一侧。
其中，光学功能层5可以包括反射层，也可以包括其他膜层，此处不作具体限定。光学功能层5的厚度可以位于20nm至500nm之间。
在一些实施例中，光学功能层5的材料可以包括TiO2、Al、Si3N4和HfO2等中的至少一种。
在一些实施例中，光波导结构还可以包括键合层。键合层位于第一波导层1与第二波导层2之间，且第一波导层1与第二波导层2通过键合层键合连接。
如图12所示，光波导结构还可以包括第一键合层61和第二键合层62。第一键合层61位于第一波导层1靠近第二波导层2的一侧，第二键合层62位于第一键合层61与第二波导层2之间，第一波导层1与第二波导层2通过第一键合层61和第二键合层62键合连接。
在一些实施例中，键合层的材料包括硅的氧化物和硅的氮化物等中的至少一种，如一氧化硅、二氧化硅和氮化硅等。第一键合层61和第二键合层62的材料可以相同或不同。
在一些实施例中，如图13所示，光波导结构还可以包括第三波导层7，第三波导层7的折射率小于第二波导层2的折射率，即第一波导层1、第二波导层2和第三波导层7的折射率逐渐减小。第三波导层7位于第二波导层2背离第一波导层1的一侧。
在一些实施例中，第三波导层7的材料可以包括玻璃和树脂中的至少一种。第三波导层7的材料可以与第一波导层1和第二波导层2的材料相同，也可以不同。
需要说明的是，光波导结构中的波导层的数量可根据实际需求设置，例如，光波 导结构还可以包括第四波导层，第四波导层的折射率小于第三波导层7的折射率，第四波导层位于第三波导层7背离第二波导层2的一侧。
根据本申请的光波导结构，通过提供第一波导层、第二波导层和光栅层，第一波导层的折射率大于第二波导层的折射率，第一波导层与第二波导层键合连接，光栅层位于第一波导层背离第二波导层的一侧，以构成单层光波导结构，降低光波导结构的厚度和重量，且设置不同折射率的波导层，改善红绿蓝三色光在波导内的传播距离和出瞳密度，提高波导色彩均一性，且第一波导层与第二波导层键合连接，提高光波导结构的良率。
相应地，本申请实施例还提供一种显示设备，包括上述实施例中的光波导结构，此处不再详细赘述。
根据本申请实施例提供的显示设备，通过提供第一波导层、第二波导层和光栅层，第一波导层的折射率大于第二波导层的折射率，第一波导层与第二波导层键合连接，光栅层位于第一波导层背离第二波导层的一侧，以构成单层光波导结构，降低光波导结构的厚度和重量，且设置不同折射率的波导层，改善红绿蓝三色光在波导内的传播距离和出瞳密度，提高波导色彩均一性，进而提高显示设备的显示效果，且第一波导层与第二波导层键合连接，提高光波导结构的良率。
本申请实施例提供的显示设备可以AR显示设备，如AR眼镜或AR头盔等具有AR显示功能的产品或部件。
本申请的说明书和权利要求书中的术语“第一”、“第二”等是用于区别类似的对象，而不用于描述特定的顺序或先后次序。应该理解这样使用的数据在适当情况下可以互换，以便本申请的实施例能够以除了在这里图示或描述的那些以外的顺序实施，且“第一”、“第二”等所区分的对象通常为一类，并不限定对象的个数，例如第一对象可以是一个，也可以是多个。
在本申请的描述中，“多个”的含义是两个或两个以上。
在本说明书的描述中，参考术语“一个实施例”、“一些实施例”、“示意性实施例”、“示例”、“具体示例”、或“一些示例”等的描述意指结合该实施例或示例描述的具体特征、结构、材料或者特点包含于本申请的至少一个实施例或示例中。在本说明书中，对上述术语的示意性表述不一定指的是相同的实施例或示例。而且，描述的具体特征、结构、材料或者特点可以在任何的一个或多个实施例或示例中以合适的方式结合。
尽管已经示出和描述了本申请的实施例，本领域的普通技术人员可以理解：在不脱离本申请的原理和宗旨的情况下可以对这些实施例进行多种变化、修改、替换和变型，本申请的范围由权利要求及其等同物限定。

Claims (19)

  1. 一种光波导结构的制作方法，包括：
    提供第一波导层和第二波导层，所述第一波导层的折射率大于所述第二波导层的折射率；
    将所述第一波导层与所述第二波导层相键合；
    在所述第一波导层背离所述第二波导层的一侧形成光栅层。
  2. 根据权利要求1所述的光波导结构的制作方法，其中，所述将所述第一波导层与所述第二波导层相键合，包括：
    对所述第一波导层和所述第二波导层进行亲水处理，以将所述第一波导层与所述第二波导层进行预键合；
    对预键合的所述第一波导层和所述第二波导层进行高温退火处理，实现所述第一波导层与所述第二波导层的稳定键合。
  3. 根据权利要求1所述的光波导结构的制作方法，其中，所述第一波导层和所述第二波导层均包括玻璃和树脂中的至少一种。
  4. 根据权利要求1所述的光波导结构的制作方法，其中，所述第一波导层的折射率位于1.7至2.1之间，所述第二波导层的折射率位于1.4至1.8之间。
  5. 根据权利要求1所述的光波导结构的制作方法，其中，所述第二波导层的厚度小于所述第一波导层的厚度。
  6. 根据权利要求1所述的光波导结构的制作方法，其中，所述将所述第一波导层与所述第二波导层相键合，包括：
    在所述第一波导层和/或第二波导层的一侧形成键合层；
    通过所述键合层，将所述第一波导层和所述第二波导层相键合。
  7. 根据权利要求6所述的光波导结构的制作方法，其中，所述键合层包括硅的氧化物和硅的氮化物中的至少一种。
  8. 根据权利要求1所述的光波导结构的制作方法，其中，所述在所述第一波导层背离所述第二波导层的一侧形成光栅层之前，还包括：
    提供第三波导层，所述第三波导层的折射率小于所述第二波导层的折射率；
    将所述第三波导层与所述第二波导层背离所述第一波导层的一侧相键合。
  9. 根据权利要求1所述的光波导结构的制作方法，其中，所述在所述第一波导层背离所述第二波导层的一侧形成光栅层，包括：
    在所述第一波导层背离所述第二波导层的一侧形成光栅材料层；
    采用纳米压印工艺或刻蚀工艺，对所述光栅材料层进行处理，得到光栅层。
  10. 根据权利要求1-9任一项所述的光波导结构的制作方法，其中，所述方法还包括：
    在所述光栅层背离所述第一波导层的一侧形成光学功能层。
  11. 一种光波导结构，包括：
    第一波导层；
    第二波导层，与所述第一波导层键合连接，所述第一波导层的折射率大于所述第二波导层的折射率；
    光栅层，位于所述第一波导层背离所述第二波导层的一侧。
  12. 根据权利要求11所述的光波导结构，其中，所述第一波导层和所述第二波导层均包括玻璃和树脂中的至少一种。
  13. 根据权利要求11所述的光波导结构，其中，所述第一波导层的折射率位于1.7至2.1之间，所述第二波导层的折射率位于1.4至1.8之间。
  14. 根据权利要求11所述的光波导结构，其中，所述第二波导层的厚度小于所述第一波导层的厚度。
  15. 根据权利要求11所述的光波导结构，其中，所述光波导结构还包括键合层；
    所述键合层位于所述第一波导层与所述第二波导层之间，且所述第一波导结构与所述第二波导结构通过所述键合层键合连接。
  16. 根据权利要求15所述的光波导结构，其中，所述键合层包括硅的氧化物和硅的氮化物中的至少一种。
  17. 根据权利要求11所述的光波导结构，其中，所述光波导结构还包括第三波导层；
    所述第三波导层与所述第二波导层背离所述第一波导层的一侧键合连接，所述第三波导层的折射率小于所述第二波导层的折射率。
  18. 根据权利要求11-17任一项所述的光波导结构，其中，所述光波导结构还包括光学功能层；
    所述光学功能层位于所述光栅层背离所述第一波导层的一侧。
  19. 一种显示设备，包括根据权利要求11-18任一项所述的光波导结构。
PCT/CN2024/128577 2024-01-23 2024-10-30 光波导结构的制作方法、光波导结构及显示设备 Pending WO2025156751A1 (zh)

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CN104637813A (zh) * 2013-11-13 2015-05-20 江苏物联网研究发展中心 Igbt的制作方法
CN212111857U (zh) * 2020-04-24 2020-12-08 罕王微电子（辽宁）有限公司 一种堆叠式光波导结构
CN113433613A (zh) * 2021-07-22 2021-09-24 Oppo广东移动通信有限公司 波导组件、光学装置及智能眼镜
US20220206232A1 (en) * 2020-12-30 2022-06-30 Facebook Technologies, Llc Layered waveguide fabrication by additive manufacturing
CN115453687A (zh) * 2022-10-14 2022-12-09 上海图灵智算量子科技有限公司 光学组件及包含其的光芯片
CN117348146A (zh) * 2023-12-04 2024-01-05 上海鲲游科技有限公司 基于双面键合工艺的衍射光波导制备方法

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CN104637813A (zh) * 2013-11-13 2015-05-20 江苏物联网研究发展中心 Igbt的制作方法
CN212111857U (zh) * 2020-04-24 2020-12-08 罕王微电子（辽宁）有限公司 一种堆叠式光波导结构
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