WO2024255750A1 - 液体除泡装置和清洗设备 - Google Patents

液体除泡装置和清洗设备 Download PDF

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Publication number
WO2024255750A1
WO2024255750A1 PCT/CN2024/098580 CN2024098580W WO2024255750A1 WO 2024255750 A1 WO2024255750 A1 WO 2024255750A1 CN 2024098580 W CN2024098580 W CN 2024098580W WO 2024255750 A1 WO2024255750 A1 WO 2024255750A1
Authority
WO
WIPO (PCT)
Prior art keywords
liquid
inlet
cavity
defoaming device
defoaming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2024/098580
Other languages
English (en)
French (fr)
Inventor
刘晓环
董丽荣
张玉涛
徐瑶
郑士杰
张虎威
赵宏宇
王锐廷
付刚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Beijing Naura Microelectronics Equipment Co Ltd
Original Assignee
Beijing Naura Microelectronics Equipment Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beijing Naura Microelectronics Equipment Co Ltd filed Critical Beijing Naura Microelectronics Equipment Co Ltd
Priority to EP24822699.5A priority Critical patent/EP4729144A1/en
Publication of WO2024255750A1 publication Critical patent/WO2024255750A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D19/00—Degasification of liquids
    • B01D19/0042—Degasification of liquids modifying the liquid flow
    • B01D19/0052—Degasification of liquids modifying the liquid flow in rotating vessels, vessels containing movable parts or in which centrifugal movement is caused
    • B01D19/0057—Degasification of liquids modifying the liquid flow in rotating vessels, vessels containing movable parts or in which centrifugal movement is caused the centrifugal movement being caused by a vortex, e.g. using a cyclone, or by a tangential inlet
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D19/00—Degasification of liquids
    • B01D19/0042—Degasification of liquids modifying the liquid flow
    • B01D19/0052—Degasification of liquids modifying the liquid flow in rotating vessels, vessels containing movable parts or in which centrifugal movement is caused
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D19/00—Degasification of liquids
    • B01D19/0068—General arrangements, e.g. flowsheets
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment

Definitions

  • the present application relates to the field of semiconductor processing technology, and in particular to a liquid defoaming device and a cleaning device.
  • the tank cleaning machine is generally composed of modules with different process functions, such as SC1 (Standard Chemical 1), SC2 (Standard Chemical 2), BOE (Buffered Oxide Etch), SPM (Sulfuric Acid/Hydrogen Peroxide Module), etc.
  • SC1 Standard Chemical 1
  • SC2 Standard Chemical 2
  • BOE Bouffered Oxide Etch
  • SPM Sulfuric Acid/Hydrogen Peroxide Module
  • H 2 O 2 hydrogen peroxide
  • the pump generally used in chemical cleaning is a diaphragm pump, which causes the liquid in the circulation pipeline to flow in the form of pulses, and the flow in the pipeline is not stable, which also brings difficulties to the detection of flow or concentration.
  • the first purpose of the present application is to provide a liquid debubbling device to solve the technical problem of a large number of liquid mixed bubbles in the existing measured pipeline.
  • the liquid defoaming device provided in the present application is applied to semiconductor cleaning equipment, and the liquid defoaming device comprises:
  • the inner wall of the defoaming cavity is a rotating curved surface, and the radius of the lower part of the inner wall gradually decreases from top to bottom;
  • the debubble cavity is provided with a liquid inlet and a first liquid discharge port, wherein the liquid inlet is arranged at the upper part of the debubble cavity and the liquid inlet direction of the liquid inlet is parallel to the tangential direction of the upper part of the inner wall surface of the debubble cavity, and the first liquid discharge port is located at the middle part of the bottom end of the inner wall surface;
  • the cover body is arranged on the defoaming cavity, and the cover body has a second liquid discharge port, and the second liquid discharge port is arranged opposite to the center of the top of the defoaming cavity.
  • the liquid defoaming device also includes a guide member arranged opposite to the liquid inlet, and a first surface of the guide member facing the liquid inlet gradually decreases in the direction of flow of the mixed liquid flowing into the liquid inlet along the first surface, and the first surface is used to increase the downward flow speed of the mixed liquid.
  • the acute angle between the first surface and the horizontal direction gradually increases.
  • the guide member is a rotating impeller, and the rotating impeller rotates circumferentially relative to the cover body and is axially fixed.
  • the cover body includes:
  • the impeller mounting portion is fixedly connected to a surface of the cover body facing the inner side of the defoaming cavity; the bottom of the impeller mounting portion is fixedly connected to an impeller fixing piece, and the impeller fixing piece is used to axially fix the rotating impeller.
  • the impeller mounting portion has a sleeve portion, the bottom of the sleeve portion is provided with an internal thread, the impeller fixing piece has an external thread, and the impeller fixing piece is fixedly connected to the sleeve portion by the external thread and the internal thread that cooperate with each other.
  • the liquid defoaming device further includes:
  • the drain pipe is located at the top of the space in the defoaming cavity and is communicated with the second drain port.
  • the top of the drain pipe is provided with a radial through hole penetrating along the wall thickness direction of the drain pipe.
  • the upper part of the inner wall surface of the defoaming cavity is a cylindrical surface.
  • the second object of the present application is to provide a cleaning device to solve the technical problem of a large number of liquid mixed bubbles in the tested pipeline.
  • the cleaning equipment provided in the present application comprises a circulation pump, a heater, a filter and any one of the above-mentioned liquid defoaming devices which are connected in sequence.
  • the cleaning equipment also includes a process tank, which includes an inner tank and an outer tank arranged outside the inner tank, the inlet of the circulating pump is connected to the outlet of the outer tank, the outlet of the filter is connected to the liquid inlet of the liquid defoaming device, the first discharge port of the liquid defoaming device is connected to the inlet of the inner tank through a flowmeter, and the second discharge port of the liquid defoaming device is connected to the inlet of the outer tank through a throttling device.
  • a process tank which includes an inner tank and an outer tank arranged outside the inner tank, the inlet of the circulating pump is connected to the outlet of the outer tank, the outlet of the filter is connected to the liquid inlet of the liquid defoaming device, the first discharge port of the liquid defoaming device is connected to the inlet of the inner tank through a flowmeter, and the second discharge port of the liquid defoaming device is connected to the inlet of the outer tank through a throttling device.
  • the cleaning equipment also includes a process tank, which includes an inner tank and an outer tank arranged outside the inner tank, the inlet of the circulating pump is connected to the outlet of the outer tank, the outlet of the filter is connected to the liquid inlet of the liquid defoaming device and the inlet of the flow meter, the outlet of the flow meter is connected to the inlet of the inner tank, the first discharge port of the liquid defoaming device is connected to the inlet of the outer tank through a concentration meter, and the second discharge port of the liquid defoaming device is connected to the inlet of the outer tank through a throttling device.
  • a process tank which includes an inner tank and an outer tank arranged outside the inner tank, the inlet of the circulating pump is connected to the outlet of the outer tank, the outlet of the filter is connected to the liquid inlet of the liquid defoaming device and the inlet of the flow meter, the outlet of the flow meter is connected to the inlet of the inner tank, the first discharge port of the liquid def
  • the throttling device includes a throttling cavity, the bottom of the inner wall surface of the throttling cavity is a hemispherical surface, and a throttling hole is provided at the bottom of the throttling cavity.
  • the throttling element is a needle valve or a capillary tube.
  • the liquid debubbling device of the present application sets the liquid inlet at the upper part of the debubbling cavity and in a direction parallel to the tangential direction of the upper part of the inner wall surface, so that when the mixed liquid flows from the liquid inlet into the upper part of the debubbling cavity, the original linear motion of the mixed liquid in a direction parallel to the tangential direction of the upper part of the inner wall surface is changed into a circular motion along the upper part of the inner wall surface. Under the action of centrifugal force, the mixed liquid is thrown toward the inner wall surface of the debubbling cavity. Once it contacts the inner wall surface, it will move in a spiral shape along the upper part of the inner wall surface toward the lower part of the inner wall surface.
  • the mixed liquid will move in a spiral shape along the upper part of the inner wall surface toward the lower part of the inner wall surface.
  • the liquid will be more likely to concentrate on the inner wall than the bubbles, that is, the liquid part will be thrown to the inner wall in a larger proportion, while the bubbles will be relatively far away from the inner wall.
  • the mixed liquid When the mixed liquid enters the lower part of the inner wall surface where the radius gradually decreases from top to bottom, since the flow of the mixed liquid is not in an absolute horizontal plane, the gravity acceleration will be converted into an increase in the actual tangential velocity under the shape coordination of the lower part of the inner wall surface. Moreover, the rotation radius gradually decreases, so the inertial centrifugal force of the mixed liquid will also increase, so the trend of liquid separation outward in the mixed liquid will be more obvious. At the same time, as the rotation radius gradually decreases, the mixed liquid will also produce a velocity component toward the bottom center of the inner wall surface, and finally form a centripetal radial liquid flow under the extrusion of the outer vortex at the bottom.
  • the bubbles will gradually float upward. Since subsequent liquid is continuously injected near the inner wall surface, the bubbles will gradually converge toward the center of the debubble cavity and upward. As a result, the liquid that descends to the bottom of the debubble cavity contains almost no bubbles and can be discharged through the first liquid discharge port located in the middle of the bottom.
  • the mixed liquid containing a higher proportion of bubbles cannot be discharged from the first discharge port under the action of the original tangential velocity, and still forms a spiral flow. At the same time, its outside is still restricted by the downward moving external vortex flow close to the inner wall. Therefore, this part of the mixed liquid containing a higher proportion of bubbles forms a spiral upward flow and is discharged through the second discharge port.
  • the liquid debubbling device can effectively separate the liquid with more bubbles and the liquid without bubbles in the mixed liquid. Compared with static gas-liquid separation or not using a chamber with a radius that gradually decreases from top to bottom, the separation speed and separation efficiency are higher.
  • FIG1 is a schematic diagram of a cleaning device provided by the related art
  • FIG2 is a schematic diagram of another cleaning device provided by the related art.
  • FIG3 is a schematic structural diagram of a liquid defoaming device provided in Example 1 of the present application.
  • FIG4 is a cross-sectional view of a liquid defoaming device provided in Example 1 of the present application.
  • FIG5 is a schematic diagram of the structure of the debubbling chamber in the liquid debubbling device provided in Example 1 of the present application;
  • FIG6 is a left side view of FIG5
  • FIG7 is a top view of FIG5
  • FIG8 is a schematic diagram of liquid flow in a liquid defoaming device provided in Example 1 of the present application.
  • FIG9 is a cross-sectional view of the liquid defoaming device provided in Example 1 of the present application at another position;
  • FIG10 is a schematic structural diagram of a cover body in a liquid defoaming device provided in Example 1 of the present application;
  • FIG11 is a structural schematic diagram of a cover body in the liquid defoaming device provided in the first embodiment of the present application from another perspective;
  • FIG12 is a schematic structural diagram of an implementation method of a cleaning device provided in Example 2 of the present application.
  • FIG13 is a schematic structural diagram of another implementation of the cleaning device provided in Example 2 of the present application.
  • FIG14 is a schematic structural diagram of an implementation method of a throttling device in a cleaning device provided in Example 2 of the present application;
  • FIG. 15 is a schematic structural diagram of the throttling member shown in FIG. 14 observed from another angle.
  • 10-liquid inlet pipe 20-male thread connector; 30-gas-liquid outlet pipe joint; 40-cover body; 41-second liquid discharge port; 42-cover body; 43-impeller mounting portion; 44-internal thread; 45-liquid discharge pipe; 46-radial through hole; 50-bubble removal cavity; 51-upper part of inner wall surface; 52-lower part of inner wall surface; 53-liquid inlet; 54-first liquid discharge port; 60-liquid outlet joint; 70-rotating impeller; 80-impeller fixing piece; 90-sealing ring; 110-process tank; 111-inner tank; 112-outer tank; 120-circulation pump; 130-heater; 140-filter; 150-flow meter; 160-concentrator; 170-throttling element; 171-throttling cavity; 172-throttling hole; 180- Liquid defoaming device.
  • FIG1 shows the circulation piping components in the cleaning equipment in the related art.
  • the process tank 110 is divided into an inner tank 111 and an outer tank 112.
  • the chemical solution flows out of the outer tank 112 and enters the circulation pump 120. It passes through the heater 130, the filter 140, and the flow meter 150, and flows into the inner tank 111. Then, it overflows from the inner tank 111 to the outer tank 112. Thus, a cycle is completed and the wafer is cleaned in the inner tank 111.
  • FIG2 shows a circulating pipeline device in a cleaning device including concentration detection in the related art.
  • H 2 O 2 hydrogen peroxide
  • the pump generally used in chemical cleaning is a diaphragm pump, which causes the liquid in the circulation pipeline to flow in the form of pulses, and the flow in the pipeline is not stable, which also brings difficulties to the detection of flow or concentration.
  • An existing device for removing bubbles from liquid includes: a degassing barrel, a liquid inlet, an exhaust port, a liquid discharge port, a control module and a liquid level detection module, wherein the inner cavity of the degassing barrel is used to provide space for separating liquid and bubbles; the liquid inlet is arranged at the upper part of the degassing barrel, and a liquid inlet valve is arranged at the liquid inlet; the exhaust port is arranged at the top of the degassing barrel, and an exhaust valve is arranged at the exhaust port; the liquid discharge port is arranged at the bottom of the degassing barrel, and a liquid discharge valve is arranged at the liquid discharge port; the liquid inlet valve, the exhaust valve and the liquid discharge valve are all electrically connected to the control module, and are used to perform corresponding actions under the control of the control module; the liquid level detection module is electrically connected to the control module, and is used to detect the liquid level in the degassing barrel, and feed back to the control module.
  • the device The beneficial
  • Embodiment 1 is a diagrammatic representation of Embodiment 1:
  • FIG3 is a schematic diagram of the structure of the liquid debubbling device provided in the first embodiment of the present application
  • FIG4 is a cross-sectional view of the liquid debubbling device provided in the first embodiment of the present application
  • FIG5 is a schematic diagram of the structure of the debubbling cavity in the liquid debubbling device provided in the first embodiment of the present application
  • FIG6 is a left view of FIG5
  • FIG7 is a top view of FIG5.
  • the liquid debubbling device provided in the first embodiment of the present application is applied to semiconductor cleaning equipment, and the liquid debubbling device includes: a debubbling cavity 50 and a cover 40.
  • the inner wall surface of the debubble cavity 50 is a rotating curved surface, and the radius of the lower part 52 of the inner wall surface gradually decreases from top to bottom;
  • the debubble cavity 50 is provided with a liquid inlet 53 and a first liquid discharge port 54, the liquid inlet 53 is arranged at the upper part of the debubble cavity 50 and the liquid inlet direction of the liquid inlet 53 is parallel to the tangential direction of the upper part 51 of the inner wall surface of the debubble cavity 50, and the first liquid discharge port 54 is located in the middle of the bottom end of the inner wall surface.
  • the cover body 40 is disposed on the debubble cavity 50 .
  • the cover body 40 has a second liquid discharge port 41 (as shown in FIG. 11 ).
  • the second liquid discharge port 41 is disposed opposite to the center of the top of the debubble cavity 50 .
  • the lower portion 52 of the inner wall of the defoaming cavity 50 is in the shape of a truncated cone.
  • the lower portion 52 of the inner wall can also be in other shapes, such as a part of an ellipsoidal surface, a part of a parabola, a part of a rugby-shaped surface, a part of a spherical surface, or even a part of a teardrop-shaped surface, as long as the radius gradually decreases from top to bottom, or even a sudden angle appears at the lower portion 52 of the inner wall. Change does not necessarily mean a smooth transition.
  • the first liquid discharge port 54 is provided with a liquid outlet connector 60
  • the second liquid discharge port 41 is provided with a gas-liquid outlet pipe connector 30 .
  • the liquid inlet 53 is connected to the liquid inlet pipe 10 outside the bubble cavity 50 .
  • the edge of the cover 40 can be mounted on the defoaming cavity 50 by engaging a male threaded connector 20 such as a screw or a bolt with a threaded hole disposed on the top surface of the defoaming cavity 50.
  • a sealing ring 90 is disposed between the defoaming cavity 50 and the cover 40 so as to achieve sealing between the defoaming cavity 50 and the cover 40.
  • the sealing ring 90 is, for example, partially fixed in a mounting groove on the top surface of the defoaming cavity 50.
  • the liquid inlet 53 is arranged at the upper part of the debubble cavity 50 and in a direction parallel to the tangential direction of the upper part 51 of the inner wall surface, so that when the mixed liquid flows from the liquid inlet 53 into the upper part of the debubble cavity 50, the original linear motion of the mixed liquid in a direction parallel to the tangential direction of the upper part 51 of the inner wall surface is changed into a circular motion along the upper part 51 of the inner wall surface. Under the action of centrifugal force, the mixed liquid is thrown toward the inner wall surface of the debubble cavity 50. Once it contacts the inner wall surface, it will move in a spiral shape along the upper part 51 of the inner wall surface toward the lower part 52 of the inner wall surface.
  • the density of the liquid in the mixed liquid is much greater than the density of the bubbles mixed therein, during the above spiral motion process, the liquid will be more likely to concentrate on the inner wall surface than the bubbles, that is, the liquid part will be thrown toward the inner wall surface in a larger proportion, while the bubbles will be relatively far away from the inner wall surface.
  • the bubbles will gradually float upward. Since subsequent liquid is continuously injected near the position of the inner wall surface, the bubbles will gradually converge toward the center of the debubble cavity 50 and upward. As a result, the liquid that descends to the bottom of the debubble cavity 50 contains almost no bubbles and can be separated by the liquid in the middle of the bottom.
  • the mixed liquid containing a large proportion of bubbles cannot be discharged from the first liquid discharge port 54 under the action of the original tangential velocity, and still forms a spiral flow. At the same time, its outside is still restricted by the downward-moving external vortex flow close to the inner wall surface.
  • this part of the mixed liquid containing a large proportion of bubbles forms a spiral upward flow, that is, an upward internal vortex flow, and is finally discharged through the second liquid discharge port 41.
  • the flow state of the mixed liquid in the debubble cavity 50 is shown in Figure 8.
  • the spiral line where the hollow arrow is located in Figure 8 represents the downward external vortex flow, and the spiral line where the solid arrow is located represents the upward internal vortex flow.
  • the liquid debubbling device can effectively separate the liquid with more bubbles and the liquid without bubbles in the mixed liquid. Compared with static gas-liquid separation or not using a chamber with a radius that gradually decreases from top to bottom, the separation speed and separation efficiency are higher.
  • Figure 9 is a cross-sectional view of the liquid debubbling device provided in Example 1 of the present application at another position, so as to more clearly show the situation in which the mixed liquid entering the debubbling chamber from the liquid inlet is guided by the guide member; as shown in Figures 4, 8 and 9, preferably, the liquid debubbling device also includes a guide member arranged opposite to the liquid inlet 53, and the first surface of the guide member facing the liquid inlet 53 gradually decreases in the direction of flow of the first surface (i.e., the liquid inlet direction) along which the mixed liquid flowing into the liquid inlet 53 is gradually reduced, and the first surface is used to increase the speed at which the mixed liquid flows downward.
  • the first surface i.e., the liquid inlet direction
  • the first surface is the lower surface of the guide member. Since the lower surface of the guide member is inclined, the lower surface of the guide member is also the surface of the guide member facing the liquid inlet 53. After the mixed liquid enters the defoaming cavity 50, it first impacts the lower surface of the guide member and is guided by the lower surface of the guide member to change the flow direction.
  • part of the velocity of the mixed liquid flowing into the liquid inlet 53 can be converted into a velocity toward the bottom of the defoaming cavity 50, so that the mixed liquid has a horizontal velocity component in the direction parallel to the tangential direction of the upper part of the inner wall surface 51, and a downward vertical velocity component along the height direction of the defoaming cavity 50, which not only accelerates the downward flow velocity of the mixed liquid, accelerates the separation of the inner vortex flow and the outer vortex flow, and avoids a large amount of mixed liquid from accumulating in the upper part of the defoaming cavity 50 for a long time, but also can accelerate the mixed liquid.
  • the gas-liquid dispersion in the mixture breaks the original tendency of uniform mixing of bubbles and liquid, thereby improving the separation efficiency.
  • the acute angle between the first surface and the horizontal direction gradually increases.
  • the first surface may be a curved surface with arc surfaces at all positions, or may be a broken line surface including a plurality of planes, wherein rounded corner transition or angled corner transition may be adopted between the planes.
  • the acute angle between the first surface and the horizontal direction gradually increases, which can gradually convert the tangential velocity of the mixed liquid along the upper part 51 of the inner wall surface into a vertical downward velocity component, thereby reducing the speed loss of the mixed liquid during the direction change process, which is beneficial to ensure the flow velocity of the mixed liquid in the defoaming chamber 50, so as to facilitate the smooth gas-liquid separation.
  • the first surface of the guide blade may be an inclined plane, which may also achieve the function of partially converting the horizontal component of the flow velocity of the mixed liquid into a velocity component in the vertical direction.
  • the guide member is a rotating impeller 70
  • the rotating impeller 70 and the cover body 40 rotate circumferentially relative to each other and are axially fixed.
  • the rotating impeller as a guide member may include a plurality of guide blades, the lower surface of the guide blades being the first surface, and during the operation of the liquid defoaming device, the lower surfaces of different guide blades may be impacted by and guide the mixed liquid flowing into the liquid inlet 53.
  • the guide blades in the rotating impeller may have a root with an angle of, for example, 60° to the horizontal direction, and a free end with an angle of, for example, 30° to the horizontal direction.
  • the rotating impeller 70 is used as a guide member.
  • the guide member When the mixed liquid enters the liquid inlet 53, the guide member will rotate along the liquid inlet direction, that is, rotate along the circumferential direction of the upper part of the inner wall surface, thereby reducing the direct impact of the liquid flow on the guide member.
  • the obstruction of the guide member to the liquid flow can also be reduced, and the loss of liquid energy in the flow process can be reduced.
  • different guide blades can be impacted by the liquid flow, avoiding a fixed area of a guide blade from being continuously impacted for a long time, which is conducive to extending the service life of the guide member.
  • the guide member can be fixedly arranged, for example, one or more guide plates are fixedly arranged, and the lower surface of the guide plate gradually decreases along the liquid inlet direction.
  • the lower surface of the guide plate can be a plane or a curved surface, so that the mixed liquid entering along the liquid inlet 53 can convert the tangential momentum into the vertical downward momentum, thereby accelerating the liquid flow.
  • Figure 10 is a structural schematic diagram of the cover body in the liquid defoaming device provided in Example 1 of the present application
  • Figure 11 is a structural schematic diagram of the cover body in the liquid defoaming device provided in Example 1 of the present application from another perspective
  • the cover body 40 includes: a cover body 42 and an impeller mounting portion 43.
  • the impeller mounting portion 43 is fixedly connected to a surface of the cover body 42 facing the inner side of the defoaming cavity 50 ; an impeller fixing member 80 is fixedly connected to the bottom of the impeller mounting portion 43 , and the impeller fixing member 80 is used to axially fix the rotating impeller 70 .
  • the rotating impeller 70 and/or the impeller mounting portion 43 can be made of polytetrafluoroethylene.
  • Polytetrafluoroethylene is not only chemically stable, but also has self-lubricating properties, which is beneficial to reducing the friction between the impeller mounting portion 43 and the rotating impeller 70, and there is no need to specially set up a rotating bearing to install the rotating impeller 70.
  • the rotating impeller 70 can be prevented from moving in the axial direction of the impeller mounting portion 43 .
  • a vertical axis can also be set at the top of the inner wall surface of the defoaming chamber 50.
  • the vertical axis can be fixedly connected to the top of the inner wall surface through one or more cantilever beams, and the rotary impeller 70 is rotatably installed on the vertical axis.
  • the vertical axis can be solid or hollow. As long as the mixed liquid at the liquid inlet 53 flows to the rotary impeller 70, the rotary impeller 70 is driven to rotate.
  • the rotary impeller 70 is relatively circumferentially rotated and axially fixedly arranged with the cover body 40, which is not limited to the rotary impeller 70 being connected to the cover body 40 through an axis or a cylinder-like part, but represents the relative motion relationship between the two. No matter where the rotary impeller 70 is rotatably installed, it is sufficient as long as it is relatively circumferentially rotated and axially fixed with the cover body 40.
  • the impeller mounting portion 43 has a sleeve portion, the bottom of the sleeve portion
  • the impeller fixing member 80 has an internal thread 44
  • the impeller fixing member 80 has an external thread.
  • the impeller fixing member 80 is fixedly connected to the sleeve portion through the external thread and the internal thread 44 that cooperate with each other.
  • the impeller fixing member 80 is also hollow cylindrical, and in addition to the portion with external threads, the impeller fixing member 80 is also provided with a flange portion. After the impeller fixing member 80 is screwed to the sleeve portion, the flange portion of the impeller fixing member 80 can axially limit the rotating impeller 70.
  • the space on the outer surface of the sleeve can be released, so that the sleeve can have a longer length to cooperate with the rotating impeller 70, thereby increasing the length of the rotating connection support for the rotating impeller 70 and improving the stability of the movement of the rotating impeller 70.
  • the liquid defoaming device further includes a drain pipe 45, which is located at the top of the space in the defoaming cavity 50 and is connected to the second drain port 41.
  • the impeller mounting portion 43 can be coaxially arranged with the drain pipe 45, or can be non-coaxially arranged with the drain pipe 45.
  • the impeller mounting portion 43 can be a hollow cylindrical or solid shaft. That is, in addition to the second drain port 41 and the drain pipe 45 being arranged on the cover body 42, an impeller mounting portion 43 is separately arranged to install the rotating impeller 70. As long as the rotating impeller 70 can rotate under the action of the mixed liquid at the liquid inlet 53 and change the flow direction of the mixed liquid, the effect of accelerating the flow of the liquid and dispersing the bubbles and liquid in the mixed liquid can also be achieved.
  • the impeller fixing member 80 can be a positioning pin that radially passes through the impeller mounting portion 43, or a full circle or multiple sections of annular outer flange are provided on the outer side surface of the bottom of the impeller mounting portion 43, and the lower surface of the annular outer flange is a conical surface.
  • the impeller mounting portion 43 can squeeze the annular outer flange during the installation process and then be installed in place.
  • the liquid debubbling device also includes a drain pipe 45, which is located at the top of the space in the debubbling cavity 50 and is connected to the second drain port 41.
  • the top of the drain pipe 45 is provided with a radial through hole 46 that penetrates the wall thickness direction of the drain pipe 45.
  • the drain pipe 45 is fixedly connected to the side of the cover body 42 facing the inner side of the defoaming cavity 50. More specifically, the drain pipe 45 can be coaxially arranged with the second drain port 41. After the mixed liquid of the internal vortex flow flowing upward enters the drain pipe 45, it can directly enter the second drain port 41.
  • the drain pipe 45 can be integrally provided with the impeller mounting portion 43 mentioned above.
  • the liquid in the mixed liquid with a large bubble content moving upward can be discharged from the radial through hole 46, so that the bubble content in the mixed liquid discharged from the second drain port 41 is larger.
  • the upper portion 51 of the inner wall surface of the defoaming cavity 50 is a cylindrical surface.
  • the upper part of the debubble cavity 50 can have a larger chamber space, which can offset the pulse generated by the diaphragm pump and achieve a flow stabilization and buffering effect.
  • Embodiment 2 is a diagrammatic representation of Embodiment 1:
  • the second embodiment further provides a cleaning device, comprising a circulation pump 120, a heater 130, a filter 140 and the liquid defoaming device 180 of the first embodiment, which are connected in sequence.
  • the cleaning equipment has all the advantages of the above-mentioned liquid debubbling device 180, which will not be described one by one here.
  • Figure 12 is a structural schematic diagram of an implementation method of the cleaning equipment provided in Example 2 of the present application; as shown in Figure 12, preferably, the cleaning equipment also includes a process tank 110, the process tank 110 includes an inner tank 111 and an outer tank 112 arranged on the outside of the inner tank 111, the inlet of the circulating pump 120 is connected to the outlet of the outer tank 112, the outlet of the filter 140 is connected to the liquid inlet 53 of the liquid defoaming device 180, the first discharge port 54 of the liquid defoaming device 180 is connected to the inlet of the inner tank 111 through the flowmeter 150, and the second discharge port 41 of the liquid defoaming device 180 is connected to the inlet of the outer tank 112 through the throttling member 170.
  • the process tank 110 includes an inner tank 111 and an outer tank 112 arranged on the outside of the inner tank 111
  • the inlet of the circulating pump 120 is connected to the outlet of the outer tank 112
  • the outlet of the filter 140 is connected to the liquid inlet
  • the liquid medicine After the liquid medicine flows out of the outer tank 112, it enters the circulation pump 120, passes through the heater 130, the filter 140, and the liquid defoaming device 180, wherein the mixed liquid enters from the liquid inlet 53 of the liquid defoaming device 180, flows out from the first liquid discharge port 54 at the bottom of the liquid defoaming device 180, and enters the inner tank 111 through the flow meter 150, and then overflows from the inner tank 111 to the outer tank 112, thus completing a cycle.
  • the mixed liquid with a high bubble content discharged from the second liquid discharge port 41 at the top of the liquid defoaming device 180 flows back to the throttling device 170.
  • the liquid flow measured by the flow meter 150 is closer to the actual flow, which can improve the accuracy of the flow measurement and thus improve the control accuracy.
  • FIG 13 is a structural schematic diagram of another implementation method of the cleaning equipment provided in Example 2 of the present application; as shown in Figure 13, preferably, the cleaning equipment also includes a process tank 110, the process tank 110 includes an inner tank 111 and an outer tank 112 arranged on the outside of the inner tank 111, the inlet of the circulating pump 120 is connected to the outlet of the outer tank 112, the outlet of the filter 140 is connected to the liquid inlet 53 of the liquid defoaming device 180 and the inlet of the flow meter 150, the outlet of the flow meter 150 is connected to the inlet of the inner tank 111, the first discharge port 54 of the liquid defoaming device 180 is connected to the inlet of the outer tank 112 through the concentration meter 160, and the second discharge port 41 of the liquid defoaming device 180 is connected to the inlet of the outer tank 112 through the throttling member 170.
  • the process tank 110 includes an inner tank 111 and an outer tank 112 arranged on the outside of the inner tank 111
  • the circulation pump 120 After the liquid medicine flows out of the outer tank 112, it enters the circulation pump 120, passes through the heater 130, the filter 140, and the flow meter 150, flows into the inner tank 111, and then overflows from the inner tank 111 to the outer tank 112, thus completing a cycle.
  • a path is branched off after the filter 140 for the mixed liquid to enter from the liquid inlet 53 of the liquid defoaming device 180, and the bubble-free liquid flowing out from the first liquid discharge port 54 at the bottom of the liquid defoaming device 180 enters the concentration meter 160 for detection, and the liquid after detection flows back to the outer tank 112; the mixed liquid with a high bubble content discharged from the second liquid discharge port 41 at the top of the liquid defoaming device 180 flows back to the outer tank 112 through the throttling member 170.
  • the concentration meter 160 By passing the liquid flowing out of the first liquid discharge port 54 of the liquid defoaming device 180 through the concentration meter 160, the liquid flow rate measured by the concentration meter 160 is closer to the actual flow rate, which can improve the accuracy of the flow measurement and thus improve the control accuracy.
  • Figure 14 is a structural schematic diagram of an implementation method of a throttling device in the cleaning equipment provided in Example 2 of the present application
  • Figure 15 is a structural schematic diagram of the throttling device shown in Figure 14 observed from another angle; as shown in Figures 14 and 15, preferably, the throttling device 170 includes a throttling cavity 171, the bottom of the inner wall surface of the throttling cavity 171 is a hemispherical surface, and a throttling hole 172 is provided at the bottom of the throttling cavity 171.
  • the throttling member 170 By providing a throttling member 170 with a throttling hole 172, affected by surface tension, the smaller the aperture of the throttling hole 172, the weaker the ability of the liquid to pass through the throttling hole 172, and accordingly, the greater the proportion of gas in the gas-liquid mixture discharged from the throttling hole 172.
  • the aperture of the throttling hole 172 In order to ensure the gas discharge speed of the liquid defoaming device 180, the aperture of the throttling hole 172 should not be too small. Therefore, by selecting a suitable aperture of the throttling hole 172, the gas-liquid ratio and flow rate of the mixed liquid discharged from the second liquid discharge port 41 can be effectively controlled, and the reflux utilization rate of the liquid in the circulation loop can be improved.
  • the throttle member 170 is a needle valve or a capillary tube.
  • the gas-liquid ratio and flow rate in the discharged mixed liquid can be effectively controlled, the reflux utilization rate of the liquid in the circulation loop can be improved, the cumbersome design caused by the introduction of pneumatic valves and sensors can be avoided, and maintenance is convenient.

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Abstract

本申请提供了一种液体除泡装置和清洗设备，涉及半导体加工技术领域，为解决被测管路中的液体混合气泡较多的问题而设计。液体除泡装置包括：除泡腔体，其内壁面为旋转曲面，内壁面下部的半径自上而下逐渐变小；除泡腔体设有进液口和第一排液口，进液口设置于除泡腔体的上部且进液口的进液方向为平行于除泡腔体的内壁面上部的切向的方向，第一排液口位于内壁面的底端中部；以及，盖体，盖设于除泡腔体，盖体具有第二排液口，第二排液口与除泡腔体顶端的中心相对设置。本申请提供的液体除泡装置可以提高分离效率，减少液体中的气泡含量。

Description

液体除泡装置和清洗设备 技术领域
本申请涉及半导体加工技术领域，具体而言，涉及一种液体除泡装置和清洗设备。
背景技术
半导体行业湿法刻蚀槽式清洗机中，槽式清洗机一般由具有不同工艺功能的模块组成，如SC1(Standard Chemical 1，一号标准液)、SC2(Standard Chemical 2，二号标准液)、BOE(Buffered Oxide Etch，缓冲氧化刻蚀)、SPM(Sulfuric Acid/Hydrogen Peroxide Module，硫酸双氧水模块)等模块。这些模块都包含一套或数套主要药液循环管路，循环管路主要包含工艺槽、循环泵、过滤器、加热器、流量计、浓度仪等。
由于为了增强清洗效果，通常会在清洗过程中，加入双氧水(H2O2)到循环管路中，这就导致管路中含有大量气泡，尤其是SPM模块的循环管路，导致流量计测试流量不准确或者浓度仪无法正确显示实际检测浓度值。而且，在化学清洗中一般使用的泵为隔膜泵，这就导致循环管路中的药液是以脉冲的形式流动，管路中流量不平稳，这也为流量或浓度的检测带来困难。
发明内容
本申请的第一个目的在于提供一种液体除泡装置，以解决现有被测管路中的液体混合气泡较多的技术问题。
本申请提供的液体除泡装置，应用于半导体清洗设备，所述液体除泡装置包括：
除泡腔体，其内壁面为旋转曲面，内壁面下部的半径自上而下逐渐变小； 所述除泡腔体设有进液口和第一排液口，所述进液口设置于所述除泡腔体的上部且所述进液口的进液方向为平行于所述除泡腔体的内壁面上部的切向的方向，所述第一排液口位于所述内壁面的底端中部；以及，
盖体，盖设于所述除泡腔体，所述盖体具有第二排液口，所述第二排液口与所述除泡腔体顶端的中心相对设置。
在一些技术方案中，所述液体除泡装置还包括与所述进液口相对设置的导向件，所述导向件的面向所述进液口的第一面沿所述进液口流入的混合液在所述第一面流动的方向逐渐降低，所述第一面用于增加所述混合液向下流动的速度。
在一些技术方案中，沿所述混合液在所述第一面流动的方向，所述第一面与水平方向所夹锐角逐渐增大。
在一些技术方案中，所述导向件为旋转叶轮，所述旋转叶轮与所述盖体相对周向转动且轴向固定设置。
在一些技术方案中，所述盖体包括：
盖本体；以及，
叶轮安装部，固定连接于所述盖本体的面向所述除泡腔体内侧的一面；所述叶轮安装部的底部固定连接有叶轮固定件，所述叶轮固定件用于将所述旋转叶轮轴向固定。
在一些技术方案中，所述叶轮安装部具有套筒部，所述套筒部的底部设有内螺纹，所述叶轮固定件具有外螺纹，所述叶轮固定件通过相互配合的所述外螺纹和所述内螺纹固定连接于所述套筒部。
在一些技术方案中，所述液体除泡装置还包括：
排液管，位于所述除泡腔体内的空间的顶部，并与所述第二排液口连通，所述排液管的顶部设有沿所述排液管的壁厚方向贯穿的径向通孔。
在一些技术方案中，所述除泡腔体的内壁面上部为圆柱面。
本申请的第二个目的在于提供一种清洗设备，以解决被测管路中的液体混合气泡较多的技术问题。
本申请提供的清洗设备，所述清洗设备包括依次连通的循环泵、加热器、过滤器和上述任一项的液体除泡装置。
在一些技术方案中，所述清洗设备还包括工艺槽，所述工艺槽包括内槽和设置于所述内槽外侧的外槽，所述循环泵的入口连通所述外槽的出口，所述过滤器的出口连通所述液体除泡装置的所述进液口，所述液体除泡装置的所述第一排液口通过流量计与所述内槽的入口连通，所述液体除泡装置的所述第二排液口通过节流件与所述外槽的入口连通。
在一些技术方案中，所述清洗设备还包括工艺槽，所述工艺槽包括内槽和设置于所述内槽外侧的外槽，所述循环泵的入口连通所述外槽的出口，所述过滤器的出口与所述液体除泡装置的所述进液口和流量计的入口连通，所述流量计的出口与所述内槽的入口连通，所述液体除泡装置的所述第一排液口通过浓度仪与所述外槽的入口连通，所述液体除泡装置的所述第二排液口通过节流件与所述外槽的入口连通。
在一些技术方案中，所述节流件包括节流腔体，所述节流腔体的内壁面底部为半球面，所述节流腔体的底部设有节流孔。
在一些技术方案中，所述节流件为针阀或毛细管。
本申请液体除泡装置和清洗设备带来的有益效果是：
本申请的液体除泡装置将进液口设置于除泡腔体的上部且沿平行于内壁面上部的切向的方向设置，可以使得混合液自进液口流入到除泡腔体的上部时，将混合液原有的沿平行于内壁面上部切向的方向的直线运动变为沿内壁面上部的圆周运动，在离心力的作用下，混合液被甩向除泡腔体的内壁面，一旦与内壁面接触，便会沿内壁面上部呈螺旋形朝向内壁面下部的运动。由于混合液中液体密度远远大于其中混合的气泡密度，所以在上述螺旋运动过 程中，液体会相对于气泡更加容易向内壁面集中，即液体部分会被更大比例地甩向内壁面，而气泡则相对地远离内壁面。
当混合液进入到半径从上至下逐渐变小的内壁面下部时，由于混合液的流动不是在绝对水平面内的流动，在内壁面下部的形状配合下，重力加速度会转化为实际切向速度的增加，而且，旋转半径逐渐缩小，所以混合液的惯性离心力也会增加，因而混合液中，液体向外分离的趋势会更加明显。同时，由于旋转半径逐渐缩小，混合液也会产生朝向内壁面底部中心的速度分量，最终在底部外旋流的挤压下形成向心的径向液流。此外，在运动中，由于气泡密度较小，气泡也会逐渐向上浮动。由于在临近内壁面的位置，不停有后续液体注入，所以气泡会逐渐向除泡腔体中心、向上汇聚。从而，下降到除泡腔体底部的液体几乎不含气泡，可以通过位于底部中部位置的第一排液口排出。而含有气泡比例较多的混合液，在原有的切向速度的作用下，也不能从第一排液口中排出，仍然会形成螺旋形的流动，同时其外部仍被贴近内壁面流动的向下运动的外旋流限制，所以这部分含有气泡比例较多的混合液形成螺旋向上的流动，经第二排液口排出。
所以，液体除泡装置可以有效地将混合液中气泡含量较多的液体和不含气泡的液体分离出来，相对于静态的气液分离或不使用半径自上而下逐渐变小部分的腔室而言，分离速度和分离效率更高。
附图说明
为了更清楚地说明本申请实施例或背景技术中的技术方案，下面将对实施例或背景技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本申请的实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据提供的附图获得其他的附图。
图1为相关技术提供的一种清洗设备的示意图；
图2为相关技术提供的另一种清洗设备的示意图；
图3为本申请实施例一提供的液体除泡装置的结构示意图；
图4为本申请实施例一提供的液体除泡装置的剖视图；
图5为本申请实施例一提供的液体除泡装置中的除泡腔体的结构示意图；
图6为图5的左视图；
图7为图5的俯视图；
图8为本申请实施例一提供的液体除泡装置的液体流动示意图；
图9为本申请实施例一提供的液体除泡装置在另一位置的剖视图；
图10为本申请实施例一提供的液体除泡装置中的盖体的结构示意图；
图11为本申请实施例一提供的液体除泡装置中的盖体的另一视角的结构示意图；
图12为本申请实施例二提供的清洗设备的一种实现方式的结构示意图；
图13为本申请实施例二提供的清洗设备的另一种实现方式的结构示意图；
图14为本申请实施例二提供的清洗设备中的节流件的一种实现方式的结构示意图；
图15为图14所示的节流件从另一角度观察的结构示意图。
附图标记说明：
10-进液管；20-公螺纹连接件；30-气液出液管接头；40-盖体；41-第二
排液口；42-盖本体；43-叶轮安装部；44-内螺纹；45-排液管；46-径向通孔；50-除泡腔体；51-内壁面上部；52-内壁面下部；53-进液口；54-第一排液口；60-液体出液接头；70-旋转叶轮；80-叶轮固定件；90-密封圈；
110-工艺槽；111-内槽；112-外槽；120-循环泵；130-加热器；140-过滤
器；150-流量计；160-浓度仪；170-节流件；171-节流腔体；172-节流孔；180- 液体除泡装置。
具体实施方式
图1展现了相关技术中的清洗设备中的循环管路器件，工艺槽110分为内槽111和外槽112，药液从外槽112流出后进入循环泵120，经加热器130、过滤器140、流量计150，流入内槽111，再由内槽111溢流至外槽112，至此完成一个循环，晶圆(Wafer)在内槽111中完成清洗。
图2展现了相关技术中的包含浓度检测的清洗设备中的循环管路器件，药液从外槽112流出后进入循环泵120，途经加热器130、过滤器140、流量计150，流入内槽111，再由内槽111溢流至外槽112，至此完成一个循环。由于浓度仪160在工作时需确保药液在常温状态，所以浓度仪160不能介入主循环管路，需要在过滤器140后分支出一路用来使药液进入浓度仪160，测量后的药液直接回流到工艺槽110的外槽112。
由于为了增强清洗效果，通常会在清洗过程中，加入双氧水(H2O2)到循环管路中，这就导致管路中含有大量气泡，尤其是SPM模块的循环管路，导致流量计测试流量不准确或者浓度仪无法正确显示实际检测浓度值。而且，在化学清洗中一般使用的泵为隔膜泵，这就导致循环管路中的药液是以脉冲的形式流动，管路中流量不平稳，这也为流量或浓度的检测带来困难。
现有的一种液体中气泡去除装置，包括：除气桶、进液口、排气口、排液口、控制模块以及液位检测模块，其中，除气桶的内腔用于为进行液体与气泡的分离提供空间；进液口设置在除气桶的上部，且进液口处设置有进液阀；排气口设置在除气桶的顶部，且排气口处设置有排气阀；排液口设置在除气桶的底部，且排液口处设置有排液阀；进液阀、排气阀、排液阀均与控制模块电性相连，用于在控制模块的控制下执行相应的动作；液位检测模块与控制模块电性相连，用于检测除气桶内液位，并反馈至控制模块。该装置 的有益效果是在控制模块的控制下使液体中的气泡与液体实现自动分离排放，避免液体中的气泡对后续反应产生不良影响。
但是，该方案涉及多个电性相连的气动阀、液位传感器、控制模块，需要电气或软件编程控制，设计较为复杂，成本较高；而且，该装置虽然实现将液体中的气泡与液体自动分离，但在气动阀的开启与关闭过程中，流量的突变势必会引起循环管路液体流动的瞬间紊乱，对清洗工艺造成干扰。
为使本申请的上述目的、特征和优点能够更为明显易懂，下面结合附图对本申请的具体实施例做详细的说明。应当理解，此处所描述的具体实施例仅仅用以解释本申请，并不用于限定本申请。
实施例一：
图3为本申请实施例一提供的液体除泡装置的结构示意图；图4为本申请实施例一提供的液体除泡装置的剖视图；图5为本申请实施例一提供的液体除泡装置中的除泡腔体的结构示意图；图6为图5的左视图；图7为图5的俯视图。如图3-图7所示，本申请实施例一提供的液体除泡装置，应用于半导体清洗设备，液体除泡装置包括：除泡腔体50和盖体40。
除泡腔体50的内壁面为旋转曲面，内壁面下部52的半径自上而下逐渐变小；除泡腔体50设有进液口53和第一排液口54，进液口53设置于除泡腔体50的上部且进液口53的进液方向为平行于除泡腔体50的内壁面上部51的切向的方向，第一排液口54位于内壁面的底端中部。
盖体40盖设于除泡腔体50之上，盖体40具有第二排液口41(如图11所示)，第二排液口41与除泡腔体50顶端的中心相对设置。
其中，本实施例中，除泡腔体50的内壁面下部52为锥台形。在另外的实现方式中，内壁面下部52还可以是其它的形状，诸如椭球形面的局部、抛物面的局部、橄榄球形面的局部、球形面的局部，甚至是水滴形面的局部，只要是半径从上到下逐渐变小的形状，甚至在内壁面下部52出现角度的突 变，不是圆滑过渡皆可。
具体地，本实施例中第一排液口54例如安装有液体出液接头60，而第二排液口41例如安装有气液出液管接头30。而进液口53则与位于除泡腔体50外的进液管10连通设置。
其中，盖体40的边缘部位可以通过螺钉或螺栓之类的公螺纹连接件20与设置在除泡腔体50顶面的螺纹孔的配合，以安装在除泡腔体50上。在除泡腔体50与盖体40之间设有密封圈90，以便除泡腔体50与盖体40实现密封。密封圈90例如部分固定于除泡腔体50顶面的安装槽中。
将进液口53设置于除泡腔体50的上部且沿平行于内壁面上部51的切向的方向设置，可以使得混合液自进液口53流入到除泡腔体50的上部时，将混合液原有的沿平行于内壁面上部51切向的方向的直线运动变为沿内壁面上部51的圆周运动，在离心力的作用下，混合液被甩向除泡腔体50的内壁面，一旦与内壁面接触，便会沿内壁面上部51呈螺旋形朝向内壁面下部52运动。由于混合液中液体密度远远大于其中混合的气泡密度，所以在上述螺旋运动过程中，液体会相对于气泡更加容易向内壁面集中，即液体部分会被更大比例地甩向内壁面，而气泡则相对地远离内壁面。
当混合液进入到半径逐渐从上至下逐渐变小的内壁面下部52时，由于混合液的流动不是在绝对水平面内的流动，在内壁面下部52的形状配合下，重力加速度会转化为实际切向速度的增加，而且，旋转半径逐渐缩小，所以混合液的惯性离心力也会增加，因而混合液中，液体向外分离的趋势会更加明显。同时，由于旋转半径逐渐缩小，混合液也会产生朝向内壁面底部中心的速度分量，最终在底部外旋流的挤压下形成向心的径向液流。此外，在运动中，由于气泡密度较小，气泡也会逐渐向上浮动。由于在临近内壁面的位置，不停有后续液体注入，所以气泡会逐渐向除泡腔体50中心、向上汇聚。从而，下降到除泡腔体50底部的液体几乎不含气泡，可以通过位于底部中部 位置的第一排液口54排出。而含有气泡比例较多的混合液，在原有的切向速度的作用下，也不能从第一排液口54中排出，仍然会形成螺旋形的流动，同时其外部仍被贴近内壁面流动的向下运动的外旋流限制住，所以这部分含有气泡比例较多的混合液形成螺旋向上的流动，即向上的内旋流，最后经第二排液口41排出。其中，混合液在除泡腔体50中的流动状态如图8所示。图8中空心箭头所在的螺旋线表示的是向下的外旋流，而实心箭头所在的螺旋线表示的是向上的内旋流。
所以，液体除泡装置可以有效地将混合液中气泡含量较多的液体和不含气泡的液体分离出来，相对于静态的气液分离或不使用半径自上而下逐渐变小部分的腔室而言，分离速度和分离效率更高。
图9为本申请实施例一提供的液体除泡装置在另一位置的剖视图，以更清楚地表现自进液口进入除泡腔体的混合液被导向件导流的情况；如图4和图8、图9所示，优选地，液体除泡装置还包括与进液口53相对设置的导向件，导向件的面向进液口53的第一面沿进液口53流入的混合液在第一面流动的方向(即，进液方向)逐渐降低，第一面用于增加混合液向下流动的速度。
其中，本实施例中，第一面为导向件的下表面，由于导向件的下表面是倾斜设置的，所以导向件的下表面也是导向件的面向进液口53的表面，混合液进入除泡腔体50内部后首先冲击到导向件的下表面，并被导向件的下表面引导而改变流动方向。
通过设置上述的导向件，可以将进液口53流入的混合液的部分速度转化为向除泡腔体50下方的速度，使混合液具有沿平行于内壁面上部51的切向的方向的水平速度分量，以及沿着除泡腔体50的高度方向的向下的竖直速度分量，不但加快了混合液的向下的流动速度，加速了内旋流和外旋流的分离，避免大量混合液长时间积存在除泡腔体50的上部，而且还可以将混合液 中的气液分散，打破原有的气泡和液体均匀混合的趋势，从而提升分离效率。
如图4和图8、图9所示，优选地，沿混合液在第一面流动的方向，第一面与水平方向所夹锐角逐渐增大。
具体地，第一面可以为各个位置皆为弧面的曲面，还可以为包括多个平面的折线表面，其中各个平面之间可以采用圆角过渡或折角过渡。
沿混合液在第一面流动的方向，第一面与水平方向所夹锐角逐渐增大，可以逐步地将混合液的沿内壁面上部51的切向速度转化成竖直向下的速度分量，从而减少混合液的速度在变向过程中的速度损失，从而有利于保证混合液在除泡腔体50中的流动速度，以利于气液分离的顺利进行。
在另外的实现方式中，导向片的第一面可以为倾斜设置的平面，也可以实现将混合液的流动速度的水平分量部分地转化为竖直方向的速度分量的作用。
如图4所示，优选地，导向件为旋转叶轮70，旋转叶轮70与盖体40相对周向转动且轴向固定设置。
其中，本实施例中，作为导向件的旋转叶轮可以包括多个导向叶片，导向叶片下表面即为第一面，在液体除泡装置的运行过程中，不同的导向叶片的下表面均可以被进液口53流入的混合液冲击并对该混合液进行导向。旋转叶轮中的导向叶片，其根部与水平方向的夹角例如为60°，其自由端与水平方向的夹角例如为30°。
采用旋转叶轮70作为导向件，在受到进液口53进入的混合液的冲击时，导向件会沿进液方向旋转，即，沿内壁面上部的圆周方向旋转，从而减小液流对导向件的直接冲击，相应地，也可以减少导向件对液流的阻碍作用，降低液体能量在流动过程中的损耗。此外，还能够让不同的导向叶片被液流冲击，避免一个导向叶片的固定区域长时间受到连续冲击，有利于延长导向件的使用寿命。
在另外的实现方式中，导向件可以固定设置，例如固定设置一个或多个导向片，导向片的下表面沿进液方向逐渐降低，导向片的下表面可以是平面也可以为曲面，从而使得沿进液口53进入的混合液可以将切向的动量转化为竖直向下的动量，加快液体流动。
图10为本申请实施例一提供的液体除泡装置中的盖体的结构示意图；图11为本申请实施例一提供的液体除泡装置中的盖体的另一视角的结构示意图；如图4和图10、图11所示，优选地，盖体40包括：盖本体42和叶轮安装部43。
叶轮安装部43固定连接于盖本体42的面向除泡腔体50内侧的一面；叶轮安装部43的底部固定连接有叶轮固定件80，叶轮固定件80用于将旋转叶轮70轴向固定。
其中，旋转叶轮70和/或叶轮安装部43，可以选用聚四氟乙烯材质，聚四氟乙烯不但化学性质稳定，而且具有自润滑的性能，有利于减小叶轮安装部43与旋转叶轮70之间的摩擦，无需专门设置转动轴承以安装旋转叶轮70。
通过在叶轮安装部43的底部固定连接叶轮固定件80，可以防止旋转叶轮70沿叶轮安装部43的轴向窜动。
在另外的实现方式中，还可以在除泡腔体50的内壁面的顶部设置一根竖直轴，具体地，该竖直轴可以通过一根或多根悬臂梁固定连接在内壁面的顶部，而旋转叶轮70转动安装在该竖直轴上，当然，该竖直轴可以是实心的也可以是空心的。只要进液口53的混合液流动至旋转叶轮70，带动旋转叶轮70转动即可。所以，旋转叶轮70与盖体40相对周向转动且轴向固定设置，并不局限于旋转叶轮70通过轴或筒类零件与盖体40连接，而是表示二者的相对运动关系，无论旋转叶轮70转动安装在哪里，只要与盖体40是相对周向转动且轴向固定即可。
如图4和图10所示，优选地，叶轮安装部43具有套筒部，套筒部的底 部设有内螺纹44，叶轮固定件80具有外螺纹，叶轮固定件80通过相互配合的外螺纹和内螺纹44固定连接于套筒部。
具体地，本实施例中，叶轮固定件80也为中空筒状，叶轮固定件80除了设有外螺纹的部分之外，还设有法兰部。将叶轮固定件80螺旋连接在套筒部之后，叶轮固定件80的法兰部可以对旋转叶轮70进行轴向限位。
通过将螺纹设置在套筒部的内侧，可以将套筒外表面的空间释放，使得套筒部可以有更大的长度与旋转叶轮70配合，以增加对旋转叶轮70转动连接支撑的长度，提高旋转叶轮70运动的稳定性。
在另外的实现方式中，如图10和图11所示，液体除泡装置还包括排液管45，位于除泡腔体50内的空间的顶部，并与第二排液口41连通，在此基础上，叶轮安装部43可以与排液管45同轴设置，也可以与排液管45不同轴设置，例如叶轮安装部43可以为空心的筒形或实心的轴。即，在盖本体42上设置第二排液口41和排液管45之外，另外单独设置叶轮安装部43，以安装旋转叶轮70。只要旋转叶轮70能够在进液口53的混合液作用下旋转，并且改变混合液的流向，也可以实现加快液体流动、分散混合液中的气泡与液体的效果。
在另外的实现方式中，叶轮固定件80可以是一根沿径向穿过叶轮安装部43的定位销，或者在叶轮安装部43底部外侧面设置一整圈的或多段的环状外凸缘，环状外凸缘的下表面为锥面，叶轮安装部43在安装过程中可以挤压该环状外凸缘，然后安装到位。
如图10和图11所示，优选地，液体除泡装置还包括排液管45，位于除泡腔体50内的空间的顶部，并与第二排液口41连通，排液管45的顶部设有沿排液管45的壁厚方向贯穿的径向通孔46。
具体地，本实施例中，排液管45固定连接于盖本体42的面向除泡腔体50内侧的一面，更具体地，排液管45可以与第二排液口41同轴设置，当向 上流动的内旋流的混合液进入排液管45后，可以直接进入第二排液口41中。而排液管45可以与上述的叶轮安装部43为一体设置。
通过在排液管45的顶部设置沿排液管45的壁厚方向贯穿的径向通孔46，可以将向上运动的气泡含量较大的混合液中的液体从径向通孔46中排出，使得从第二排液口41中排除的混合液中的气泡含量更大。
如图4～图8所示，优选地，除泡腔体50的内壁面上部51为圆柱面。
通过将除泡腔体50的内壁面设置为圆柱面，可以使得除泡腔体50的上部具有较大的腔室空间，可以将隔膜泵所产生的脉冲抵消，起到了稳流缓冲的效果。
实施例二：
实施例二还提供了一种清洗设备，包括依次连通的循环泵120、加热器130、过滤器140和实施例一的液体除泡装置180。
通过在清洗设备中设置上述液体除泡装置180，相应地，该清洗设备具有上述液体除泡装置180的所有优势，在此不再一一赘述。
图12为本申请实施例二提供的清洗设备的一种实现方式的结构示意图；如图12所示，优选地，清洗设备还包括工艺槽110，工艺槽110包括内槽111和设置于内槽111外侧的外槽112，循环泵120的入口连通外槽112的出口，过滤器140的出口连通液体除泡装置180的进液口53，液体除泡装置180的第一排液口54通过流量计150与内槽111的入口连通，液体除泡装置180的第二排液口41通过节流件170与外槽112的入口连通。
药液从外槽112流出后进入循环泵120，途径加热器130、过滤器140、液体除泡装置180，其中混合液从液体除泡装置180的进液口53进入，从液体除泡装置180底部的第一排液口54流出并通过流量计150进入内槽111再由内槽111溢流到外槽112，至此完成一个循环，液体除泡装置180的顶部的第二排液口41排出的气泡含量较高的混合液，则经过节流件170回流到 外槽112。
通过将液体除泡装置180的第一排液口54流出的液体通过流量计150，流量计150所测量的液体流量较为接近真实流量，可以提高流量测量的准确度，从而提高了控制精度。
图13为本申请实施例二提供的清洗设备的另一种实现方式的结构示意图；如图13所示，优选地，清洗设备还包括工艺槽110，工艺槽110包括内槽111和设置于内槽111外侧的外槽112，循环泵120的入口连通外槽112的出口，过滤器140的出口与液体除泡装置180的进液口53和流量计150的入口连通，流量计150的出口与内槽111的入口连通，液体除泡装置180的第一排液口54通过浓度仪160与外槽112的入口连通，液体除泡装置180的第二排液口41通过节流件170与外槽112的入口连通。
药液从外槽112流出后进入循环泵120，途径加热器130、过滤器140、流量计150，流入内槽111，再由内槽111溢流至外槽112，至此完成一个循环。为了检测浓度，在过滤器140后分支出一路用于使混合液从液体除泡装置180的进液口53进入，从液体除泡装置180底部的第一排液口54流出的不含气泡的液体进入浓度仪160进行检测，检测之后的液体回流到外槽112；液体除泡装置180顶部的第二排液口41排出的气泡含量较高的混合液经过节流件170回流到外槽112。
通过将液体除泡装置180的第一排液口54流出的液体通过浓度仪160，浓度仪160所测量的液体流量较为接近真实流量，可以提高流量测量的准确度，从而提高了控制精度。
图14为本申请实施例二提供的清洗设备中的节流件的一种实现方式的结构示意图；图15为图14所示的节流件从另一角度观察的结构示意图；如图14和图15所示，优选地，节流件170包括节流腔体171，节流腔体171的内壁面底部为半球面，节流腔体171的底部设有节流孔172。
通过设置具有节流孔172的节流件170，受表面张力影响，节流孔172的孔径越小，液体通过节流孔172的能力越弱，相应地，节流孔172中所排出的气液混合物中气体比例越大。而为了保证液体除泡装置180的气体排出速度，节流孔172的孔径也不宜过小。所以通过选择合适的节流孔172的孔径，可以有效地控制从第二排液口41排出的混合液的气液比例与流量，提升循环回路中液体的回流利用率。
优选地，节流件170为针阀或毛细管。
采用以上设置，可以有效控制排出的混合液中气液比例与流量，提升循环回路中液体的回流利用率，避免了引入气动阀、传感器的装置带来的繁琐设计，方便维护。
虽然本申请披露如上，但本申请并非限定于此。任何本领域技术人员，在不脱离本申请的精神和范围内，均可作各种更动与修改，因此本申请的保护范围应当以权利要求所限定的范围为准。
最后，还需要说明的是，在本文中，诸如第一和第二等之类的关系术语仅仅用来将一个实体或者操作与另一个实体或操作区分开来，而不一定要求或者暗示这些实体或操作之间存在任何这种实际的关系或者顺序。而且，术语“包括”或者其任何其他变体意在涵盖非排他性的包含，从而使得包括一系列要素的过程、方法、物品或者设备不仅包括那些要素，而且还包括没有明确列出的其他要素，或者是还包括为这种过程、方法、物品或者设备所固有的要素。在没有更多限制的情况下，由语句“包括一个……”限定的要素，并不排除在包括所述要素的过程、方法、物品或者设备中还存在另外的相同要素。
上述实施例中，诸如“上”、“下”等方位的描述，均基于附图所示。
对所公开的实施例的上述说明，使本领域专业技术人员能够实现或使用本申请。对这些实施例的多种修改对本领域的专业技术人员来说将是显而易 见的，本文中所定义的一般原理可以在不脱离本申请的精神或范围的情况下，在其它实施例中实现。
因此，本申请将不会被限制于本文所示的这些实施例，而是要符合与本文所公开的原理和新颖特点相一致的最宽的范围。

Claims (13)

  1. 一种液体除泡装置，其特征在于，应用于半导体清洗设备，所述液体除泡装置包括：
    除泡腔体，其内壁面为旋转曲面，内壁面下部的半径自上而下逐渐变小；所述除泡腔体设有进液口和第一排液口，所述进液口设置于所述除泡腔体的上部且所述进液口的进液方向为平行于所述除泡腔体的内壁面上部的切向的方向，所述第一排液口位于所述内壁面的底端中部；以及，
    盖体，盖设于所述除泡腔体，所述盖体具有第二排液口，所述第二排液口与所述除泡腔体顶端的中心相对设置。
  2. 根据权利要求1所述的液体除泡装置，其特征在于，所述液体除泡装置还包括与所述进液口相对设置的导向件，所述导向件的面向所述进液口的第一面沿所述进液口流入的混合液在所述第一面流动的方向逐渐降低，所述第一面用于增加所述混合液向下流动的速度。
  3. 根据权利要求2所述的液体除泡装置，其特征在于，沿所述混合液在所述第一面流动的方向，所述第一面与水平方向所夹锐角逐渐增大。
  4. 根据权利要求2所述的液体除泡装置，其特征在于，所述导向件为旋转叶轮，所述旋转叶轮与所述盖体相对周向转动且轴向固定设置。
  5. 根据权利要求4所述的液体除泡装置，其特征在于，所述盖体包括：
    盖本体；以及，
    叶轮安装部，固定连接于所述盖本体的面向所述除泡腔体内侧的一面；所述叶轮安装部的底部固定连接有叶轮固定件，所述叶轮固定件用于将所述旋转叶轮轴向固定。
  6. 根据权利要求5所述的液体除泡装置，其特征在于，所述叶轮安装部具有套筒部，所述套筒部的底部设有内螺纹，所述叶轮固定件具有外螺纹，所述叶轮固定件通过相互配合的所述外螺纹和所述内螺纹固定连接于所述套筒部。
  7. 根据权利要求1-6中任一项所述的液体除泡装置，其特征在于，所述液体除泡装置还包括：
    排液管，位于所述除泡腔体内的空间的顶部，并与所述第二排液口连通，所述排液管的顶部设有沿所述排液管的壁厚方向贯穿的径向通孔。
  8. 根据权利要求1-6中任一项所述的液体除泡装置，其特征在于，所述除泡腔体的内壁面上部为圆柱面。
  9. 一种清洗设备，其特征在于，所述清洗设备包括依次连通的循环泵、加热器、过滤器和权利要求1-8中任一项的液体除泡装置。
  10. 根据权利要求9所述的清洗设备，其特征在于，所述清洗设备还包括工艺槽，所述工艺槽包括内槽和设置于所述内槽外侧的外槽，所述循环泵的入口连通所述外槽的出口，所述过滤器的出口连通所述液体除泡装置的所述进液口，所述液体除泡装置的所述第一排液口通过流量计与所述内槽的入口连通，所述液体除泡装置的所述第二排液口通过节流件与所述外槽的入口连通。
  11. 根据权利要求9所述的清洗设备，其特征在于，所述清洗设备还包括工艺槽，所述工艺槽包括内槽和设置于所述内槽外侧的外槽，所述循环泵的入口连通所述外槽的出口，所述过滤器的出口与所述液体除泡装置的进液 口和流量计的入口连通，所述流量计的出口与所述内槽的入口连通，所述液体除泡装置的所述第一排液口通过浓度仪与所述外槽的入口连通，所述液体除泡装置的所述第二排液口通过节流件与所述外槽的入口连通。
  12. 根据权利要求10或11所述的清洗设备，其特征在于，所述节流件包括节流腔体，所述节流腔体的内壁面底部为半球面，所述节流腔体的底部设有节流孔。
  13. 根据权利要求10或11所述的清洗设备，其特征在于，所述节流件为针阀或毛细管。
PCT/CN2024/098580 2023-06-13 2024-06-12 液体除泡装置和清洗设备 Ceased WO2024255750A1 (zh)

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