Classifications

• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
  • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
  • B05C11/023—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface
  • B05C11/025—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface with an essentially cylindrical body, e.g. roll or rod
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
  • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
  • H10P72/04—Apparatus for manufacture or treatment
  • H10P72/0448—Apparatus for applying a liquid, a resin, an ink or the like
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
  • B05C1/04—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
  • B05C1/04—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
  • B05C1/08—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line
  • B05C1/0804—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line the material being applied without contact with the roller
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
  • B05C1/04—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
  • B05C1/08—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line
  • B05C1/0826—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line the work being a web or sheets
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
  • B05C1/04—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
  • B05C1/08—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line
  • B05C1/0873—Controlling means responsive to conditions of the liquid or other fluent material, of the ambient medium, of the roller or of the work
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05D1/00—Processes for applying liquids or other fluent materials
  • B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05D1/00—Processes for applying liquids or other fluent materials
  • B05D1/40—Distributing applied liquids or other fluent materials by members moving relatively to surface
  • B05D1/42—Distributing applied liquids or other fluent materials by members moving relatively to surface by non-rotary members
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
  • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
  • H10K30/50—Photovoltaic [PV] devices
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
  • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
  • H10K71/10—Deposition of organic active material
  • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05D2252/00—Sheets
  • B05D2252/02—Sheets of indefinite length

Definitions

• An embodiment of the present invention relates to a coating apparatus and coating method that can be used for device formation.
• Organic thin-film solar cells and organic/inorganic hybrid solar cells using organic semiconductors are expected to be low-cost solar cells because inexpensive coating methods can be applied to form the active layer.
• the film thickness of each layer is about several nm to several hundreds of nm, and it is necessary to form such extremely thin layers with good uniformity over a large area.
• meniscus coating and slit coating are known as roll-to-roll (R2R) coating methods that can coat extremely thin layers over a large area at low cost.
• R2R roll-to-roll
• it may be difficult to obtain a uniform film thickness by simply adopting these conventionally known methods, and a coating device that can apply the liquid using a more uniform coating bar and form a uniform coating film is desired.
• An embodiment of the present invention provides a coating device and coating method that can form a uniform coating film.
• a coating apparatus comprising a coating bar, a substrate transport member that transports a substrate, and a coating liquid supply member that supplies a coating liquid to the coating bar, further comprising an equalizing bar downstream of the coating of the coating bar, the equalizing bar being positioned at a position where the coating liquid forms a meniscus between the equalizing bar and the substrate.
• the coating apparatus according to [1] further comprising an equalizing bar position adjustment member that controls a distance between the equalizing bar and the substrate.
• the coating apparatus according to claim 1 or 2 wherein the equalizing bar is arranged so as not to rotate.
• the coating device according to any one of [1] to [3], further comprising a coating bar position adjustment member that controls a position of the coating bar.
• the coating device according to any one of [1] to [4], wherein the coating liquid is supplied from a plurality of nozzles.
• the coating device according to [5], wherein the opening surfaces of the multiple nozzles are needle-shaped and cut at an angle of 75 degrees or more and 105 degrees or less.
• the coating apparatus according to any one of [5] to [7], further comprising a nozzle for supplying the coating liquid to the uniformizing bar.
• a coating method for forming a coating film by applying a coating liquid to the surface of a substrate using a coating bar comprising: disposing an equalizing bar downstream of the coating bar; and forming a meniscus between the substrate and the equalizing bar using the coating liquid supplied from the primary coating film formed by the coating bar, thereby forming a secondary coating film.
• FIG. 1 is a schematic side view illustrating the coating apparatus according to the first embodiment.
• FIG. 2 is a schematic top view illustrating the coating apparatus according to the first embodiment.
• FIG. 3 is a flow chart illustrating a coating method according to the second embodiment.
• Fig. 1 is a schematic side view illustrating the coating apparatus according to the first embodiment.
• Fig. 2 is a schematic top view illustrating the coating apparatus according to the first embodiment.
• the coating device 100 includes a coating bar 101, a substrate transport member 102 for transporting a substrate, a coating liquid supply member 104 for supplying the coating bar with coating liquid 103 stored in a liquid reservoir 112, and an equalizing bar 105.
• the equalizing bar 105 is disposed at a position where the coating liquid forms a meniscus between the equalizing bar and the substrate.
• the coating bar is used to form a primary coating film by a so-called meniscus method.
• Each member is disposed so that the coating liquid 103 is supplied from a nozzle 106 to the surface of the coating bar 101, the coating liquid flows from the surface of the coating bar between the coating bar 101 and the substrate 107 to form a meniscus 103Ma, and the substrate is transported in the direction of the arrow to form a primary coating film 108a.
• the cross-sectional shape of the coating bar 101 is arbitrary.
• the cross-sectional shape is, for example, a circle, a flattened circle, or a polygon.
• a part of the cross-sectional shape that corresponds to the meniscus forming portion may be curved, and the other part may be straight.
• the cross-sectional shape of the surface of the coating bar 101 that faces the substrate 107 may be curved.
• the applicator bar can be positioned so that it does not rotate. By not having the applicator bar rotate like a roller, the stability of the meniscus is improved.
• the coating bar 101 includes, for example, at least one selected from the group consisting of stainless steel, aluminum, titanium, and glass. This allows for easy processing when preparing the coating bar 101.
• the surface of the coating bar 101 is a mirror surface.
• the surface of the coating bar 101 may include an uneven structure.
• the equalizing bar 105 is installed downstream of the coating bar 101.
• the coating liquid 103 is applied to almost the entire surface of the substrate 107 by the coating bar 101 to form a coating film 108a, but the coating film 108a may not be uniform enough.
• the coating film 108a formed comes into contact with the equalizing bar 105 arranged downstream of the coating bar as the substrate is transported.
• a meniscus 103Mb of the coating liquid 103 can be formed between the substrate 107 and the equalizing bar 105.
• the surface tension of the coating liquid spreads the coating liquid in the lateral direction in the gap between the equalizing bar 105 and the substrate 107, creating a uniform meniscus 103Mb.
• the coating film 108b is solidified, for example, by drying, to obtain the desired film (solid film). For example, this can be achieved by arranging a drying member 109 downstream of the equalizing bar.
• the coating device illustrated in Figures 1 and 2 forms a primary coating film by the meniscus method, and can further include a nozzle position adjustment member 110 that adjusts the position of the nozzle 106, a nozzle position detection member 111 that detects the distance between the coating bar 101 and the nozzle 106, etc., in order to improve the uniformity of the primary coating film.
• multiple nozzles 106 and multiple pumps 104 can be provided.
• the multiple nozzles 106 can face the coating bar 101.
• the multiple nozzles 106 can supply coating liquid 103 toward the coating bar 101.
• An additional nozzle that supplies coating liquid to the equalizing bar 105 can also be provided. By arranging such an additional nozzle, a meniscus can be formed between the substrate and the equalizing bar before the start of coating to form the primary coating film.
• the multiple nozzles 106 are aligned along a first direction.
• the first direction is, for example, the Y-axis direction.
• One direction perpendicular to the Y-axis direction is defined as the X-axis direction.
• the movement direction of the substrate can coincide with the X-axis.
• the direction perpendicular to the Y-axis direction and the X-axis direction is defined as the Z-axis direction.
• the coating bar 101 extends along, for example, the Y-axis direction.
• the number of the multiple nozzles 106 can be three or more. This allows a large area of the primary coating film 108a to be formed stably. In the example of FIG. 2, the number of the multiple nozzles 106 is four. In an embodiment, the number can be any integer number equal to or greater than three.
• the nozzle may be a slot die or may be needle-shaped.
• the discharge amount of the coating liquid 103 can be controlled with high precision.
• the nozzle is needle-shaped, for example, the tips of the multiple nozzles can be easily brought into contact with the coating bar 101.
• the needle-shaped nozzle has high flexibility. Due to the high flexibility, for example, it is possible to suppress damage to the nozzle due to vibration of the coating bar 101.
• the length of the nozzle is, for example, 10 mm or more and 100 mm or less, and the inner diameter of the nozzle is, for example, 0.5 mm or more and 2 mm or less.
• the angle between the end face of the tip of the nozzle and the extension direction of the nozzle is, for example, about 90 degrees (for example, 75 degrees or more and 105 degrees or less). With such a shape, for example, it is possible to suppress the occurrence of scratches on the coating bar 101.
• the coating bar may further include a member for detecting contact between each nozzle. Contact can be easily detected, for example, by measuring the electrical resistance between the nozzle and coating bar, and variation can be reduced by adjusting the coating conditions based on this. When there is contact, the coating liquid can be applied directly to the coating bar, making it less likely for the coating liquid to repel.
• a member for measuring the electrical resistance between each nozzle and the coating bar can be provided as a member for detecting contact between the coating bar and each nozzle. If each nozzle and coating bar are made of conductive stainless steel or the like and each nozzle is insulated, the electrical resistance between the coating bar and each nozzle can be measured and the electrical resistance will drop sharply the moment they come into contact. In addition, since the electrical resistance changes as the contact state changes, it becomes possible to monitor the contact state. For example, if the nozzle is pressed against the coating bar so strongly that it is curved too much, the coating bar will contact not only the tip of the nozzle but also its side, and the electrical resistance will be very small.
• the coating liquid will easily be ejected from the tip of the nozzle to places other than the coating bar, which will easily cause uneven coating.
• the optimal electrical resistance varies depending on the shape and material of the nozzle and coating bar, so it is desirable to measure it in advance.
• the wiring should have an opening and closing section so that each nozzle can be moved before coating to check contact with the coating bar. Also, if the electrical resistance is measured during coating, any abnormalities in the contact between the nozzle and coating bar can be detected.
• the electrical resistance measuring device can also be an external device separate from the coating device.
• the nozzles are removable. Nozzles are prone to clogging due to their small openings. In the coating device according to the embodiment, when such clogging occurs, the discharge amount of each nozzle can be adjusted using the coating liquid supply member and the coating liquid supply amount adjustment member, but if the clogging becomes significant or discharging becomes completely impossible, cleaning or replacement is necessary. In such cases, it is preferable that the nozzles are removable, as this makes maintenance easier.
• the coating liquid is supplied from multiple nozzles as shown in Figures 1 and 2 to form the primary coating film 108a by the meniscus method, but the primary coating film may be formed by another method.
• a coating bar can be used for slit coating, and a slit die head can be used that has an internal manifold and supplies coating liquid from the manifold via slits to the substrate surface.
• a slit die head can be used instead of the nozzles in Figures 1 and 2 to supply coating liquid to the coating bar.
• the coating device 100 may further include a drying member 109.
• the drying member 109 is capable of drying the coating film 108b applied to the substrate 107.
• the drying member 109 may include, for example, an air nozzle or a far-infrared lamp.
• the distance between the coating bar 101 and the leveling bar 105 can be freely changed. It is also preferable to provide a member for controlling the gap between the uniformizing bar 105 and the substrate 107. For this purpose, a gap ring, a micrometer, or the like can be used.
• the equalizing bar may be straight or curved. If it is straight, it is easier to achieve a uniform thickness for the coating film. If it is curved, it is easier to vary the thickness, for example by making it thicker in the center, but it is easier to achieve uniformity in the coating direction.
• the cross-sectional shape of the equalizing bar 105 is arbitrary.
• the coating cross-sectional shape is, for example, a circle, a flattened circle, or a polygon. A part of the cross-sectional shape may be curved and the other part may be straight.
• the cross-sectional shape of the surface of the equalizing bar 105 facing the substrate 107 may be curved.
• the equalizer bar can be positioned so that it does not rotate. By not rotating the equalizer bar like a roller, the meniscus becomes more stable.
• the equalizing bar 105 includes, for example, at least one selected from the group consisting of stainless steel, aluminum, titanium, and glass. This allows for easy processing when preparing the equalizing bar 105.
• the surface of the equalizing bar 105 is a mirror surface.
• the surface of the equalizing bar 26 may include an uneven structure.
• the second embodiment relates to a coating method.
• coating is performed using, for example, the coating apparatus 10 (or a variation thereof) described in relation to the first embodiment.
• FIG. 3 is a flow chart illustrating a coating method (S30) according to the second embodiment.
• the method includes a step of detecting and adjusting the distance between the coating bar and meniscus equalizing bar and the substrate (S31), a step of detecting and adjusting the distance between the coating bar and each nozzle (S32), a step of creating a meniscus between the substrate and the equalizing bar (S33), and a step of supplying coating liquid and applying the coating liquid to the substrate (S34).
• step S33 the meniscus M22 is stably generated during the coating process. In this way, in order to form a meniscus between the substrate and the equalizing bar before coating begins, it is preferable to provide an additional nozzle that supplies coating liquid to the equalizing bar.
• each nozzle can be mounted on a single cantilevered fixed plate that can rotate, move horizontally, or move vertically. This arrangement allows the position of all nozzles to be adjusted simultaneously.
• a solar cell can be formed by coating using the coating device 100.
• the number of pumps is four.
• a tube connected to one pump is connected to four nozzles.
• the total number of nozzles is 16.
• the nozzles are attached to a single cantilever bar.
• Each nozzle is equipped with an actuator for movement and wiring for measuring electrical resistance.
• the wiring is connected to an electrical resistance meter.
• a nozzle position detection member such as a camera, is installed to observe the positional relationship between the nozzle and the coating bar.
• the substrate 107 is a rolled PET film.
• the width of the PET film is, for example, 330 mm.
• a light-transmitting electrode having a width of 300 mm is formed on the PET film by a roll-to-roll compatible sputtering device.
• the sheet resistance of the electrode is, for example, 10 ⁇ / ⁇ .
• the electrode has, for example, a laminated structure of an ITO film/Ag alloy/ITO film.
• multiple electrodes are provided.
• the length of each of the multiple electrodes is, for example, about 10 mm.
• the distance between the multiple electrodes is, for example, 50 ⁇ m.
• the cross section of the coating bar 101 and the equalizing bar 105 is circular.
• the radius of the circle is 10 mm.
• the length of the coating bar 101 and the equalizing bar 105 is 300 mm.
• the coating bar 101 and the equalizing bar 105 include, for example, stainless steel (e.g., SUS303).
• the nozzle includes a stainless steel locking member.
• the length of the nozzle is 50 mm.
• the piping for the coating liquid is a polytetrafluoroethylene tube.
• the nozzle and the tube are connected by a detachable joint.
• the tube is connected to a pump.
• the hole transport layer is formed by the coating liquid 103.
• the coating liquid 103 is an aqueous solution containing PEDOT and PSS.
• the relative positional relationship between the coating bar 101 and the equalizing bar 105 and the substrate 107 is controlled by a gap ring or an actuator.
• the nozzle is placed in a horizontal position. In this state, the coating liquid 103 is supplied and the air in the nozzle is expelled.
• the coating liquid is supplied to the equalizing bar 105 with a syringe to create a meniscus 103Mb between the equalizing bar and the substrate 107.
• the coating liquid 103 is continuously supplied by a pump.
• the movement speed of the substrate 107 is, for example, 5 m/min.
• the drying member 109 blows heated dry air onto the applied coating liquid 103.
• a solidified coating film is obtained from the coating liquid 103.
• another coating liquid may be further coated.
• the other coating liquid includes, for example, a semiconductor material.
• the other coating liquid includes, for example, PTB7 ([poly ⁇ 4,8-bis[(2-ethylhexyl)oxy]benzo[1,2-b:4,5-b']dithiophene-2,6-diyl-1t-alt-3-fluoro-2-[(2-ethylhexyl)carbonyl]thieno[3,4-b]thiophene-4,6-diyl ⁇ ]) and PC70BM ([6,6]phenyl C71 butyric acid methyl ester).
• PTB7 is, for example, a p-type semiconductor.
• PC70BM is, for example, an n-type semiconductor.
• the other coating liquid further includes, for example, monochlorobenzene.
• the amount of PTB7 is 8 mg per 1 mL of monochlorobenzene.
• the amount of PC70BM is 12 mg per 1 mL of monochlorobenzene.
• Another coating liquid is a dispersion containing an organic semiconductor.
• the other coating liquid becomes, for example, a semiconductor film for a solar cell.
• the minimum gap distance between the coating bar 101 and the substrate 107 is 300 ⁇ m.
• the moving speed of the substrate 107 is, for example, 5 m/min. After application, drying is performed by the drying member 109.
• the coating liquid 103 may be applied to the substrate 107 at a position where the substrate 107 is transported in the vertical direction. This, for example, applies the effect of gravity to the meniscus, making it easier to obtain a uniform film even at high speeds.
• a coating device and a coating method are provided that can form a uniform coating film.
• Coating device 101 Coating bar 102
• Substrate transport member 103 Coating liquid 104
• Coating liquid supply member 105 Uniformity bar 106
• Nozzle 107 ...
• Substrate 108a Primary coating film 108b
• Secondary coating film 109 ...
• Drying member 110 Nozzle position adjustment member 111
• Nozzle position detection member 112 Liquid reservoir

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• Engineering & Computer Science (AREA)
• Manufacturing & Machinery (AREA)
• Physics & Mathematics (AREA)
• Electromagnetism (AREA)
• Coating Apparatus (AREA)

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Applications Claiming Priority (1)

Related Child Applications (1)

Publications (1)

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Citations (5)

• 2023
  • 2023-03-08 EP EP23926302.3A patent/EP4557352A1/en active Pending
  • 2023-03-08 CN CN202380059793.1A patent/CN119731773A/zh active Pending
  • 2023-03-08 JP JP2025505004A patent/JP7714830B2/ja active Active
  • 2023-03-08 WO PCT/JP2023/008884 patent/WO2024185092A1/ja not_active Ceased
• 2025
  • 2025-02-12 US US19/051,515 patent/US20250178021A1/en active Pending

Patent Citations (5)

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