WO2024144011A1 - Ultraviolet curable ink composition for forming bezel pattern with high reliability - Google Patents
Ultraviolet curable ink composition for forming bezel pattern with high reliability Download PDFInfo
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- WO2024144011A1 WO2024144011A1 PCT/KR2023/020559 KR2023020559W WO2024144011A1 WO 2024144011 A1 WO2024144011 A1 WO 2024144011A1 KR 2023020559 W KR2023020559 W KR 2023020559W WO 2024144011 A1 WO2024144011 A1 WO 2024144011A1
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- weight
- parts
- ultraviolet curable
- curable ink
- ink composition
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- 239000000203 mixture Substances 0.000 title claims abstract description 246
- 150000001875 compounds Chemical class 0.000 claims description 170
- 239000003999 initiator Substances 0.000 claims description 63
- 239000004593 Epoxy Substances 0.000 claims description 42
- -1 diglycidyl ether compound Chemical class 0.000 claims description 39
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- 125000002723 alicyclic group Chemical group 0.000 claims description 33
- 125000002091 cationic group Chemical group 0.000 claims description 31
- 239000002270 dispersing agent Substances 0.000 claims description 29
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 claims description 29
- 239000000049 pigment Substances 0.000 claims description 27
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- 230000035945 sensitivity Effects 0.000 abstract description 42
- 230000003287 optical effect Effects 0.000 abstract description 24
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- 238000000016 photochemical curing Methods 0.000 description 6
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- 125000001931 aliphatic group Chemical group 0.000 description 3
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- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 3
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- UNMJLQGKEDTEKJ-UHFFFAOYSA-N (3-ethyloxetan-3-yl)methanol Chemical compound CCC1(CO)COC1 UNMJLQGKEDTEKJ-UHFFFAOYSA-N 0.000 description 2
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- PCKZAVNWRLEHIP-UHFFFAOYSA-N 2-hydroxy-1-[4-[[4-(2-hydroxy-2-methylpropanoyl)phenyl]methyl]phenyl]-2-methylpropan-1-one Chemical compound C1=CC(C(=O)C(C)(O)C)=CC=C1CC1=CC=C(C(=O)C(C)(C)O)C=C1 PCKZAVNWRLEHIP-UHFFFAOYSA-N 0.000 description 2
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- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
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- FZIIBDOXPQOKBP-UHFFFAOYSA-N 2-methyloxetane Chemical compound CC1CCO1 FZIIBDOXPQOKBP-UHFFFAOYSA-N 0.000 description 1
- UWHSVIYYROIHDN-UHFFFAOYSA-N 2-methylxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3OC2=C1 UWHSVIYYROIHDN-UHFFFAOYSA-N 0.000 description 1
- UMWZLYTVXQBTTE-UHFFFAOYSA-N 2-pentylanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(CCCCC)=CC=C3C(=O)C2=C1 UMWZLYTVXQBTTE-UHFFFAOYSA-N 0.000 description 1
- KTALPKYXQZGAEG-UHFFFAOYSA-N 2-propan-2-ylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC=C3SC2=C1 KTALPKYXQZGAEG-UHFFFAOYSA-N 0.000 description 1
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- CPVJWBWVJUAOMV-UHFFFAOYSA-N 3-benzoyl-7-(diethylamino)chromen-2-one Chemical compound O=C1OC2=CC(N(CC)CC)=CC=C2C=C1C(=O)C1=CC=CC=C1 CPVJWBWVJUAOMV-UHFFFAOYSA-N 0.000 description 1
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- OKISUZLXOYGIFP-UHFFFAOYSA-N 4,4'-dichlorobenzophenone Chemical compound C1=CC(Cl)=CC=C1C(=O)C1=CC=C(Cl)C=C1 OKISUZLXOYGIFP-UHFFFAOYSA-N 0.000 description 1
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- YYVYAPXYZVYDHN-UHFFFAOYSA-N 9,10-phenanthroquinone Chemical compound C1=CC=C2C(=O)C(=O)C3=CC=CC=C3C2=C1 YYVYAPXYZVYDHN-UHFFFAOYSA-N 0.000 description 1
- RXHZPGSSIWOFGS-UHFFFAOYSA-N 9-(3-acridin-9-ylpropyl)acridine Chemical compound C1=CC=C2C(CCCC=3C4=CC=CC=C4N=C4C=CC=CC4=3)=C(C=CC=C3)C3=NC2=C1 RXHZPGSSIWOFGS-UHFFFAOYSA-N 0.000 description 1
- YDTZWEXADJYOBJ-UHFFFAOYSA-N 9-(7-acridin-9-ylheptyl)acridine Chemical compound C1=CC=C2C(CCCCCCCC=3C4=CC=CC=C4N=C4C=CC=CC4=3)=C(C=CC=C3)C3=NC2=C1 YDTZWEXADJYOBJ-UHFFFAOYSA-N 0.000 description 1
- UVYLOCWZULTTNG-UHFFFAOYSA-N 9-pentylacridine Chemical compound C1=CC=C2C(CCCCC)=C(C=CC=C3)C3=NC2=C1 UVYLOCWZULTTNG-UHFFFAOYSA-N 0.000 description 1
- MTRFEWTWIPAXLG-UHFFFAOYSA-N 9-phenylacridine Chemical compound C1=CC=CC=C1C1=C(C=CC=C2)C2=NC2=CC=CC=C12 MTRFEWTWIPAXLG-UHFFFAOYSA-N 0.000 description 1
- 206010001488 Aggression Diseases 0.000 description 1
- ADAHGVUHKDNLEB-UHFFFAOYSA-N Bis(2,3-epoxycyclopentyl)ether Chemical compound C1CC2OC2C1OC1CCC2OC21 ADAHGVUHKDNLEB-UHFFFAOYSA-N 0.000 description 1
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- 239000007848 Bronsted acid Substances 0.000 description 1
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- QSJXEFYPDANLFS-UHFFFAOYSA-N Diacetyl Chemical group CC(=O)C(C)=O QSJXEFYPDANLFS-UHFFFAOYSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- NQSMEZJWJJVYOI-UHFFFAOYSA-N Methyl 2-benzoylbenzoate Chemical compound COC(=O)C1=CC=CC=C1C(=O)C1=CC=CC=C1 NQSMEZJWJJVYOI-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
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- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
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- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical group O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
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- BRHJUILQKFBMTL-UHFFFAOYSA-N [4,4-bis(dimethylamino)cyclohexa-1,5-dien-1-yl]-phenylmethanone Chemical compound C1=CC(N(C)C)(N(C)C)CC=C1C(=O)C1=CC=CC=C1 BRHJUILQKFBMTL-UHFFFAOYSA-N 0.000 description 1
- DBHQYYNDKZDVTN-UHFFFAOYSA-N [4-(4-methylphenyl)sulfanylphenyl]-phenylmethanone Chemical compound C1=CC(C)=CC=C1SC1=CC=C(C(=O)C=2C=CC=CC=2)C=C1 DBHQYYNDKZDVTN-UHFFFAOYSA-N 0.000 description 1
- GUCYFKSBFREPBC-UHFFFAOYSA-N [phenyl-(2,4,6-trimethylbenzoyl)phosphoryl]-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C(=O)C1=C(C)C=C(C)C=C1C GUCYFKSBFREPBC-UHFFFAOYSA-N 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- WNLRTRBMVRJNCN-UHFFFAOYSA-L adipate(2-) Chemical compound [O-]C(=O)CCCCC([O-])=O WNLRTRBMVRJNCN-UHFFFAOYSA-L 0.000 description 1
- PFXFKBDDQUKKTF-UHFFFAOYSA-N amino(phenyl)silicon Chemical compound N[Si]C1=CC=CC=C1 PFXFKBDDQUKKTF-UHFFFAOYSA-N 0.000 description 1
- 230000003254 anti-foaming effect Effects 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-M benzenesulfonate Chemical compound [O-]S(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-M 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- LMMDJMWIHPEQSJ-UHFFFAOYSA-N bis[(3-methyl-7-oxabicyclo[4.1.0]heptan-4-yl)methyl] hexanedioate Chemical compound C1C2OC2CC(C)C1COC(=O)CCCCC(=O)OCC1CC2OC2CC1C LMMDJMWIHPEQSJ-UHFFFAOYSA-N 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000012663 cationic photopolymerization Methods 0.000 description 1
- 150000001788 chalcone derivatives Chemical class 0.000 description 1
- 235000005513 chalcones Nutrition 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- VBVAVBCYMYWNOU-UHFFFAOYSA-N coumarin 6 Chemical compound C1=CC=C2SC(C3=CC4=CC=C(C=C4OC3=O)N(CC)CC)=NC2=C1 VBVAVBCYMYWNOU-UHFFFAOYSA-N 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- ZWAJLVLEBYIOTI-UHFFFAOYSA-N cyclohexene oxide Chemical compound C1CCCC2OC21 ZWAJLVLEBYIOTI-UHFFFAOYSA-N 0.000 description 1
- FWFSEYBSWVRWGL-UHFFFAOYSA-N cyclohexene oxide Natural products O=C1CCCC=C1 FWFSEYBSWVRWGL-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 125000004989 dicarbonyl group Chemical group 0.000 description 1
- BQQUFAMSJAKLNB-UHFFFAOYSA-N dicyclopentadiene diepoxide Chemical compound C12C(C3OC33)CC3C2CC2C1O2 BQQUFAMSJAKLNB-UHFFFAOYSA-N 0.000 description 1
- UJTGYJODGVUOGO-UHFFFAOYSA-N diethoxy-methyl-propylsilane Chemical compound CCC[Si](C)(OCC)OCC UJTGYJODGVUOGO-UHFFFAOYSA-N 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- OWZDULOODZHVCQ-UHFFFAOYSA-N diphenyl-(4-phenylsulfanylphenyl)sulfanium Chemical compound C=1C=C([S+](C=2C=CC=CC=2)C=2C=CC=CC=2)C=CC=1SC1=CC=CC=C1 OWZDULOODZHVCQ-UHFFFAOYSA-N 0.000 description 1
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- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 150000002496 iodine Chemical class 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 150000003951 lactams Chemical class 0.000 description 1
- CCEFMUBVSUDRLG-UHFFFAOYSA-N limonene-1,2-epoxide Chemical compound C1C(C(=C)C)CCC2(C)OC21 CCEFMUBVSUDRLG-UHFFFAOYSA-N 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- DBQGARDMYOMOOS-UHFFFAOYSA-N methyl 4-(dimethylamino)benzoate Chemical compound COC(=O)C1=CC=C(N(C)C)C=C1 DBQGARDMYOMOOS-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- AUONHKJOIZSQGR-UHFFFAOYSA-N oxophosphane Chemical compound P=O AUONHKJOIZSQGR-UHFFFAOYSA-N 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- UKASIOIEWZDBIT-UHFFFAOYSA-N phenyl-(2,3,4-trimethylphenyl)methanone Chemical compound CC1=C(C)C(C)=CC=C1C(=O)C1=CC=CC=C1 UKASIOIEWZDBIT-UHFFFAOYSA-N 0.000 description 1
- ALIATVYMFGMEJC-UHFFFAOYSA-N phenyl-[2,4,6-tris(methylamino)phenyl]methanone Chemical compound CNC1=CC(NC)=CC(NC)=C1C(=O)C1=CC=CC=C1 ALIATVYMFGMEJC-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical compound S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 1
- KPNZYDNOFDZXNR-UHFFFAOYSA-N tetratert-butyl 4-benzoylcyclohexa-3,5-diene-1,1,2,2-tetracarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1(C(=O)OOC(C)(C)C)C(C(=O)OOC(C)(C)C)(C(=O)OOC(C)(C)C)C=CC(C(=O)C=2C=CC=CC=2)=C1 KPNZYDNOFDZXNR-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 125000002088 tosyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])S(*)(=O)=O 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- JFZKOODUSFUFIZ-UHFFFAOYSA-N trifluoro phosphate Chemical compound FOP(=O)(OF)OF JFZKOODUSFUFIZ-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/10—Printing inks based on artificial resins
- C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
- C09D11/037—Printing inks characterised by features other than the chemical nature of the binder characterised by the pigment
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
- C09D11/32—Inkjet printing inks characterised by colouring agents
- C09D11/322—Pigment inks
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
- C09D11/38—Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
Definitions
- Metal wiring for driving the device is located around display devices such as TVs and monitors.
- display devices such as TVs and monitors.
- a separate bezel structure was assembled to cover this, but recently, in order to achieve weight reduction and thinness, printing methods such as inkjet have been used to create a black screen on the substrate.
- a method of directly printing a shaped light-shielding pattern is being used.
- the present invention has excellent curing sensitivity, enabling easy photocuring in atmospheric conditions, realizing excellent optical density and adhesion characteristics after curing, and improving reliability with no decrease in adhesion and less thickness reduction when evaluating reliability in high temperature and high humidity conditions.
- One embodiment of the present invention is an ultraviolet curable ink composition for forming a bezel pattern comprising a pigment, a dispersant, an alicyclic epoxy-based compound, an oxetane-based compound, a vinyl ether-based compound, a diglycidyl ether compound, a cationic initiator, and a radical-based initiator.
- the ultraviolet curable ink composition for forming a bezel pattern according to an exemplary embodiment of the present invention has excellent curing sensitivity and can be easily photocured under atmospheric conditions.
- the ultraviolet curable ink composition for forming a bezel pattern according to an exemplary embodiment of the present invention may have excellent storage stability.
- the ultraviolet curable ink composition for forming a bezel pattern according to an exemplary embodiment of the present invention has excellent dispersibility and can easily dissolve additives such as photoinitiators and sensitizers.
- the ultraviolet curable ink composition for forming a bezel pattern according to an exemplary embodiment of the present invention can achieve excellent optical density and adhesion after curing.
- the ultraviolet curable ink composition for forming a bezel pattern according to an exemplary embodiment of the present invention has excellent reliability after curing, so there is no decrease in adhesion and little change in thickness when evaluating reliability.
- the ultraviolet curable ink composition for forming a bezel pattern according to an exemplary embodiment of the present invention may have excellent heat resistance properties.
- viscosity may mean a value measured by a Brookfield viscometer with a Cone Spindle (CPA-40Z) at room temperature (25°C).
- the unit “part by weight” may refer to the ratio of weight between each component.
- the ultraviolet curable ink composition for forming a bezel pattern according to an exemplary embodiment of the present invention has excellent curing sensitivity and can be easily photocured under atmospheric conditions.
- the ultraviolet curable ink composition for forming a bezel pattern has a curing sensitivity at a temperature of 18 °C or more and 30 °C and a relative humidity of 15 % or more and 45 % in the absence of external stabilization conditions such as nitrogen filling as atmospheric conditions. Photocuring can be performed stably without degradation.
- the ultraviolet curable ink composition for forming a bezel pattern according to an exemplary embodiment of the present invention may have excellent storage stability.
- the ultraviolet curable ink composition for forming a bezel pattern according to an exemplary embodiment of the present invention has excellent dispersibility and can easily dissolve additives such as photoinitiators and sensitizers.
- the ultraviolet curable ink composition for forming a bezel pattern according to an exemplary embodiment of the present invention has excellent reliability after curing, so there is no decrease in adhesion when evaluating reliability, and the thickness change may be small.
- the ultraviolet curable ink composition for forming a bezel pattern includes a pigment, a dispersant, an alicyclic epoxy compound, an oxetane compound, a vinyl ether compound, a diglycidyl ether compound, and two types of compounds. Contains photoinitiators (cationic initiators, radical-based initiators). Specifically, the ultraviolet curable ink composition for forming a bezel pattern may not contain a solvent. That is, the ultraviolet curable ink composition for forming a bezel pattern may be a solvent-free ultraviolet curable ink composition for forming a bezel pattern.
- the solvent is an organic solvent and may refer to a reactive diluent for viscosity adjustment commonly used in the art.
- Conventional photocurable compositions for forming black patterns included solvents.
- photocurable compositions containing solvents have problems with poor storage stability and low hardness and curing sensitivity of photocurable products.
- the ultraviolet curable ink composition for forming a bezel pattern can improve storage stability by not containing a solvent.
- the photocured product of the ultraviolet curable ink composition for forming a bezel pattern that does not contain a solvent may have excellent hardness (for example, pencil hardness) after curing and can effectively improve adhesion to the substrate.
- the carbon black is Systo 5HIISAF-HS, Systo KH, Systo 3HHAF-HS, Systo NH, Systo 3M, Systo 300HAFLS, Systo 116HMMAF-HS, Systo 116MAF, Systo FMFEF- HS, Systo SOFEF, Systo VGPF, Systo SVHSRF-HS, and Systo SSRF (Donghae Carbon Co., Ltd.); Diagram Black II, Diagram Black N339, Diagram Black SH, Diagram Black H, Diagram LH, Diagram HA, Diagram SF, Diagram N550M, Diagram M, Diagram E, Diagram G, Diagram R, Diagram N760M, Diagram LR, #2700, # 2600, #2400, #2350, #2300, #2200, #1000, #980, #900, MCF88, #52, #50, #47, #45, #45L, #25, #CF9, #95, # 3030, #3050, MA7, MA77, MA8,
- It can be 13 parts by weight or less, 8 parts by weight or more but 11 parts by weight or less, 10 parts by weight or more but 16.5 parts by weight or less, 10 parts by weight or more and 15 parts by weight or less, 10 parts by weight or more and 12.5 parts by weight or less, or 10 parts by weight or more and 11 parts by weight or less.
- the content of the pigment contained in the ultraviolet curable ink composition is within the above-mentioned range, the photocured product of the ultraviolet curable ink composition for bezel pattern formation is obtained without reducing the curing sensitivity of the ultraviolet curable ink composition for bezel pattern formation. Homogeneous color can be achieved.
- the ultraviolet curable ink composition for forming a bezel pattern By improving the dispersibility of the based compound, photoinitiator, and additive, it is possible to provide an ultraviolet curable ink composition for forming a bezel pattern having a homogeneous composition. Through this, the hardness and adhesion to the substrate of the photocured product of the ultraviolet curable ink composition for forming a bezel pattern can be effectively improved.
- the ultraviolet curable ink composition for forming a bezel pattern includes a polyurethane-based dispersant, so that the pigment can be evenly dispersed in the ultraviolet curable ink composition for forming a bezel pattern, and an even color distribution can be achieved while improving curing efficiency.
- a urethane-based compound included in the dispersant may be one used in the art.
- Disperbyk160 to 167 and 182 series which are urethane-based dispersants, can be used as the dispersant, but the type of urethane-based dispersant is not limited.
- the dispersant may not include an acrylic dispersant.
- an acrylic-based dispersant is included as a dispersant, the hardness (for example, pencil hardness) and adhesion of the photocurable product of the ultraviolet curable ink composition for forming a bezel pattern may decrease.
- the ultraviolet curable ink composition for forming a bezel pattern according to an exemplary embodiment of the present invention includes a urethane-based compound as a dispersant, and thus can effectively improve hardness and adhesion after curing.
- the content of the dispersant may be 1 part by weight or more and 6 parts by weight or less. Specifically, the content of the dispersant is 2 parts by weight or more and 5.5 parts by weight or less, 2 parts by weight or more and 5 parts by weight or less, 2 parts by weight or more and 4 parts by weight or less, and 2 parts by weight or more, based on 100 parts by weight of the ultraviolet curable ink composition.
- 3 parts by weight or less 2.25 parts by weight or more, 5 parts by weight or less, 2.25 parts by weight or more, 4 parts by weight or less, 2.25 parts by weight or more, 3 parts by weight or less, 2.25 parts by weight or more, 2.75 parts by weight or less, 2.5 parts by weight or more, 4.0 parts by weight or less, It may be 2.5 parts by weight or more and 3.5 parts by weight or less, 2.5 parts by weight or more and 3 parts by weight or less, or 2.5 parts by weight or more and 2.75 parts by weight or less.
- the ultraviolet curable ink composition for forming a bezel pattern may include an oxetane-based compound.
- the oxetane-based compound may include one or more oxetane rings within the molecule. More specifically, the number of oxetane rings contained in the molecule of the oxetane-based compound may be 1 to 4, 1 to 3, 1 to 2, or 1.
- the curing sensitivity, storage stability, and dispersibility of the ultraviolet curable ink composition for forming a bezel pattern can be improved.
- the optical density, hardness, and adhesion of the photocurable product of the ultraviolet curable ink composition for forming the bezel pattern can be effectively improved.
- the oxetane-based compound may include at least one of an aliphatic oxetane-based compound and an aromatic oxetane-based compound.
- the oxetane-based compound may include at least one of a compound represented by Formula 1-1 below and a compound represented by Formula 1-2 below. More specifically, the oxetane-based compound may be a compound represented by the following formula 1-1.
- R 1 and R 4 may each independently be a straight-chain or branched alkyl group having 1 to 10 carbon atoms
- R 2 and R 3 may each independently be a straight-chain or branched alkyl group having 1 to 5 carbon atoms. It may be alkylene
- n1 may be 0 or an integer from 1 to 4.
- R 1 and R 4 may each independently be a straight-chain or branched alkyl group with 1 to 8 carbon atoms, an alkyl group with 2 to 6 carbon atoms, or an alkyl group with 5 to 10 carbon atoms.
- R 2 and R 3 may each independently be straight-chain or branched alkylene having 1 to 3 carbon atoms, or alkylene having 1 to 2 carbon atoms.
- the n1 may be 0 or an integer of 1 to 2, 1, or 0.
- An ultraviolet curable ink composition for forming a bezel pattern with excellent curing sensitivity, storage stability, and dispersibility by using an oxetane-based compound containing at least one of the compound represented by Formula 1-1 and the compound represented by Formula 1-2. can be implemented. Additionally, the ultraviolet curable ink composition for forming a bezel pattern may have excellent optical density, hardness, and adhesion after curing.
- the oxetane-based compound may include at least one of the following compounds 1-1 to 1-3. Specifically, the oxetane-based compound may be Compound 1-1 below.
- R 11 to R 13 and n3 may be the same as defined in Formula 2-1.
- the vinyl ether-based compound may include at least one compound among compounds 3-1 to 3-3 below.
- the vinyl ether-based compound may include Compound 3-1 below.
- the ultraviolet curable ink composition for forming a bezel pattern By adjusting the content of the vinyl ether-based compound contained in the ultraviolet curable ink composition to the above-mentioned range, curing sensitivity, storage stability, and dispersibility of the ultraviolet curable ink composition for forming a bezel pattern can be improved. In addition, the optical density, hardness, and adhesion of the photocurable product of the ultraviolet curable ink composition for forming the bezel pattern can be effectively improved. In particular, under high humidity conditions, the ultraviolet curable ink composition for forming a bezel pattern can effectively prevent curing from progressing or a decrease in curing sensitivity.
- the ultraviolet curable ink composition may include a diglycidyl ether-based compound.
- the diglycidyl ether-based compounds include ethylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, bisphenol A diglycidyl ether, 1,4-butanediol diglycidyl ether, and 1,6-bis. (2,3-epoxypropoxy)hexane, 4,4'-bis(2,3-epoxypropoxy)biphenyl and 1,4-bis((2,3-epoxypropoxy)methyl)cyclohexane (CDMDG ), etc. can be used. These can be used individually or in combination of two or more types.
- R 41 to R 46 may each independently be a straight-chain or branched alkylene having 1 to 6 carbon atoms, and Cy2 may be a cycloalkylene having 5 to 10 carbon atoms. Specifically, R 41 to R 46 may each independently be a linear or branched alkylene having 1 to 4 carbon atoms, and Cy2 is cycloalkylene having 5 to 8 carbon atoms, cycloalkylene having 5 to 6 carbon atoms, or cyclohexylene. It can be.
- the diglycidyl ether-based compound may include the following compound 4-1 or compound 4-2.
- the curing sensitivity characteristics of the ultraviolet curable ink composition for forming a bezel pattern are improved in atmospheric conditions and in high temperature and high humidity conditions, It is possible to obtain a solvent-free UV-curable ink composition for forming bezel patterns that has excellent properties without reducing thickness and adhesion.
- the curing sensitivity, storage stability, and dispersibility of the ultraviolet curable ink composition for forming a bezel pattern can be improved, and the ultraviolet curable ink composition for forming a bezel pattern can be After curing, it can have excellent optical density, hardness, and adhesion.
- a cationic initiator such as a sulfonate having a symmetrical structure, a sulfonate containing one or more sulfur in the molecule, or an iodine salt, the curing sensitivity and storage stability of the ultraviolet curable ink composition for forming a bezel pattern are reduced.
- the photocurable product of the ultraviolet curable ink composition for forming the bezel pattern may have poor hardness, adhesion, and optical density properties.
- the content of the cationic initiator may be 2 parts by weight or more and 6 parts by weight or less, based on 100 parts by weight of the ultraviolet curable ink composition.
- the content of the cationic initiator is 3 parts by weight or more and 6 parts by weight or less, 3 parts by weight or more and 5 parts by weight or less, 3 parts by weight or more and 4 parts by weight or less, and 4 parts by weight. It may be more than 5 parts by weight or less, 3.5 parts by weight or more and 5.5 parts by weight or less, or 4 parts by weight or more and 6 parts by weight or less.
- the ultraviolet curable ink composition for forming a bezel pattern may include a radical-based initiator.
- the radical-based initiator may refer to a radical-based photopolymerization initiator.
- the radical-based initiator serves as a Co-Initiator to compensate for the insufficient reactivity of the cationic initiator.
- the content of the radical-based initiator may be 1 part by weight or more and 4 parts by weight or less. Specifically, with respect to 100 parts by weight of the ultraviolet curable ink composition, the content of the radical-based initiator may be 1 part by weight or more and 3.5 parts by weight or less, or 1 part by weight or more and 3 parts by weight or less.
- the radical-based initiator includes at least one type of photoinitiator such as an acylphosphine-based photoinitiator, diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide-based photoinitiator, acetophenone-based photoinitiator, and ⁇ -hydroxyketone-based photoinitiator. It is desirable to use As specific examples, biacetyl, benzoin, benzyl, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxy.
- photoinitiator such as an acylphosphine-based photoinitiator, diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide-based photoinitiator, acetophenone-based photoinitiator, and ⁇ -hydroxyketone-based photoinitiator
- the weight ratio of the radical-based initiator and the cationic initiator may be 1:1 to 1:6.
- the weight ratio of the radical-based initiator and the cationic initiator is 1:1 to 1:6, 1:1 to 1:5, 1:1 to 1:4, 1:1 to 1:3, or 1:3 to 1. :4.
- the photocuring reaction of the ultraviolet curable ink composition for forming the bezel pattern can be stably performed, and the initiator can be used to form the bezel pattern. It can be prevented from precipitating in the ultraviolet curable ink composition for pattern formation and impairing its stability.
- Precipitation of the cationic initiator can be prevented from forming in the ultraviolet curable ink composition for forming the bezel pattern, and the viscosity of the ultraviolet curable ink composition for forming the bezel pattern is increased, thereby preventing deterioration of coating properties.
- the weight ratio of the radical-based initiator and the cationic initiator included in the ultraviolet curable ink composition is outside the above-mentioned range, the reactivity is weak or the reactivity is high, so there is a possibility that properties such as adhesion may decrease and problems with solubility may occur. high.
- the ultraviolet curable ink composition for forming a bezel pattern may further include an additive.
- the additive may include at least one of a sensitizer, an adhesion enhancer, a surfactant, and an antioxidant.
- the ultraviolet curable ink composition for forming a bezel pattern may include a sensitizer as an additive.
- the sensitizer may be a photosensitizer that is used in the industry.
- the sensitizer includes anthracene-based compounds such as anthracene, 9,10-dibutoxyanthracene, 9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, and 2-ethyl9,10-dimethoxyanthracene;
- Benzophenone 4,4-bis(dimethylamino)benzophenone, 4,4-bis(diethylamino)benzophenone, 2,4,6-trimethylaminobenzophenone, methyl-o-benzoylbenzoate, 3,3 -benzophenone-based compounds such as dimethyl-4-methoxybenzophenone and 3,3,4,4-tetra(t-butylperoxycarbonyl)benzophenone;
- Thioxanthone-based compounds such as xanthone and 2-methylxanthone;
- Anthraquinone-based compounds such as anthraquinone, 2-methyl anthraquinone, 2-ethyl anthraquinone, t-butyl anthraquinone, and 2,6-dichloro-9,10-anthraquinone; 9-phenylacridine, 1,7-bis(9-acridinyl)heptane, 1,5-bis(9-acridinylpentane), 1,3-bis(9-acridinyl)propane, etc.
- acridine-based compounds dicarbonyl compounds such as benzyl, 1,7,7-trimethyl-bicyclo[2,2,1]heptane-2,3-dione, and 9,10-phenanthrenequinone; phosphine oxide-based compounds such as 2,4,6-trimethylbenzoyl diphenylphosphine oxide and bis(2,6-dimethoxybenzoyl)-2,4,4-trimethylpentyl phosphine oxide; Benzoate-based compounds such as methyl-4-(dimethylamino)benzoate, ethyl-4-(dimethylamino)benzoate, and 2-n-butoxyethyl-4-(dimethylamino)benzoate; 2,5-bis(4-diethylaminobenzal)cyclopentanone, 2,6-bis(4-diethylaminobenzal)cyclohexanone, 2,6-bis(4-diethylaminobenzal)-4
- the content of the sensitizer may be 1 part by weight or more and 4.5 parts by weight or less, based on 100 parts by weight of the ultraviolet curable ink composition.
- the content of the sensitizer may be 1 part by weight or more and 4 parts by weight or less, 1 part by weight or more and 3 parts by weight or less, or 2 parts by weight or more and 3 parts by weight or less.
- the ultraviolet curable ink composition for forming a bezel pattern may include a surfactant as an additive.
- a surfactant By adding a surfactant, the surface tension of the ultraviolet curable ink composition for forming a bezel pattern can be lowered, thereby improving the coating properties of the ultraviolet curable ink composition for forming a bezel pattern.
- the surfactant those used in the industry can be used.
- the surfactant is Megaface F444, F-475, F-478, F-479, F-484, F-550, F-552, F-553, F-555 manufactured by DIC (DaiNippon Ink & Chemicals).
- the content of the surfactant is 0.1 part by weight to 5 parts by weight, 0.1 to 3 parts by weight, and 0.1 to 1 part by weight, based on 100 parts by weight of the ultraviolet curable ink composition. parts or less, 0.2 parts by weight or more and 5 parts by weight or less, 0.2 parts by weight or more and 3 parts by weight or less, 0.2 parts by weight or more and 1 part by weight or less, or 0.2 parts by weight or more and 0.5 parts by weight or less.
- the ultraviolet curable ink composition for forming a bezel pattern may include an adhesion enhancer as an additive.
- an adhesion enhancer By adding an adhesion enhancer, it is possible to effectively prevent the photocured product of the ultraviolet curable ink composition for forming a bezel pattern from peeling off from the substrate.
- the adhesion enhancer may include a silane-based compound.
- the silane-based compound that can be used as the adhesion enhancer is, for example, any one of an alkoxy silane-based compound, an epoxy silane-based compound, an aminophenyl silane-based compound, an amino silane-based compound, a mercapto silane-based compound, and a vinyl silane-based compound. may include.
- the types of additives included in the ultraviolet curable ink composition for forming a bezel pattern are not limited to those described above, and other additives used in the art may be further included within a range that does not impair the required physical properties.
- the ultraviolet curable ink composition for forming a bezel pattern may have a viscosity of 3 cP or more and 30 cP or less at 25°C.
- the ultraviolet curable ink composition for forming a bezel pattern has a viscosity at 25°C of 3 cP or more and 25 cP or less, 3 cP or more and 20 cP or less, 5 cP or more and 25 cP or less, 5 cP or more and 20 cP or less, and 10 cP or more.
- the ultraviolet curable ink composition for forming a bezel pattern having a viscosity in the above-described range may have excellent applicability, excellent inkjet ejection properties, and excellent processability. Specifically, when the viscosity of the ultraviolet curable ink composition for forming a bezel pattern is within the above-mentioned range, it may be suitable for an inkjet process and may have good ejection at the process temperature.
- the process temperature refers to a temperature at which the ultraviolet curable ink composition for bezel pattern formation is heated to lower the viscosity, and may be 10°C or higher and 100°C or lower, or 20°C or higher and 70°C or lower.
- the black pattern using the ultraviolet curable ink composition for forming the bezel pattern it can be performed through a method used in the art. For example, forming a black pattern by inkjet printing the ultraviolet curable ink composition for forming a bezel pattern on a substrate; and curing the black pattern by irradiating ultraviolet rays.
- the black pattern can be formed using the ultraviolet curable ink composition for forming the bezel pattern.
- the ultraviolet curable ink composition for forming a bezel pattern in order to photocure the ultraviolet curable ink composition for forming a bezel pattern, light having a wavelength range of 250 nm to 450 m is used at 500 mJ/mm 2 or more and 5,000 mJ/mm 2 or less. It can be investigated based on the total exposure amount. Specifically, the light having a wavelength range of 360 nm to 410 nm is 500 mJ/mm 2 or more and 5,000 mJ/mm 2 or less, 500 mJ/mm 2 or more and 4,000 mJ/mm 2 or less, and 500 mJ/mm 2 or more and 3,000 mJ.
- the black pattern containing the photocured product of the ultraviolet curable ink composition for forming the bezel pattern may exhibit a pencil hardness of 1B or higher as a result of a pencil hardness test. Specifically, the black pattern may represent a pencil hardness of 1H or higher or F or higher.
- the black pattern containing the photocured product of the ultraviolet curable ink composition for forming the bezel pattern may exhibit an adhesion of 4B or more (the separated surface is less than 5% of the total area) as a result of a crocut test. That is, the black pattern containing the photocured product of the ultraviolet curable ink composition for forming the bezel pattern may have excellent hardness and excellent adhesion to the substrate.
- the black pattern containing the photocured product of the ultraviolet curable ink composition for forming the bezel pattern may have a thickness change rate of less than 5% when evaluating heat resistance properties and reliability.
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Abstract
The present invention relates to an ultraviolet curable ink composition for forming a bezel pattern that has excellent curing sensitivity and thus can be easily photocured under atmospheric conditions, exhibits excellent hardness, optical density and adhesion after curing, and has improved reliability due to no decrease in adhesion and a small decrease in thickness when evaluating reliability.
Description
본 명세서는 2022년 12월 26일에 한국특허청에 제출된 한국 특허 출원 제10-2022-0184418호의 출원일의 이익을 주장하며, 그 내용 전부는 본 발명에 포함된다.This specification claims the benefit of the filing date of Korean Patent Application No. 10-2022-0184418 filed with the Korea Intellectual Property Office on December 26, 2022, the entire contents of which are included in the present invention.
본 발명은 신뢰성이 우수한 베젤 패턴 형성용 자외선 경화형 잉크 조성물에 관한 것이다.The present invention relates to a highly reliable ultraviolet curable ink composition for forming bezel patterns.
TV, 모니터 등 디스플레이 기기 주변에는 기기 구동을 위한 금속 배선이 위치하며, 종래에는 이를 가리기 위해 별도의 베젤 구조물을 조립하였으나, 최근 경량화 및 박막화를 달성하기 위해 잉크젯 등의 인쇄 방법을 이용하여 기판 위에 블랙 형상의 차광 패턴을 직접 인쇄하는 방법이 사용되고 있다. Metal wiring for driving the device is located around display devices such as TVs and monitors. In the past, a separate bezel structure was assembled to cover this, but recently, in order to achieve weight reduction and thinness, printing methods such as inkjet have been used to create a black screen on the substrate. A method of directly printing a shaped light-shielding pattern is being used.
또한, 최근 모바일 기기의 패턴과 블랙 패턴이 시인되지 않도록 하기 위하여, 얇은 두께에서도 차광 특성이 우수한 블랙 패턴이 필요한 실정이다. 이를 위해, 대기 조건에서 UV 경화가 용이하게 수행될 수 있는 우수한 경화 감도 특성을 가지는 광경화성 조성물의 개발이 이루어지고 있다.In addition, in order to prevent the patterns and black patterns of recent mobile devices from being visible, there is a need for black patterns with excellent light blocking properties even at a thin thickness. To this end, the development of photocurable compositions with excellent curing sensitivity properties that allow UV curing to be easily performed under atmospheric conditions is being developed.
본 발명은 경화 감도가 우수하여 대기 조건에서 용이하게 광경화가 가능하며, 경화 후에 우수한 광학 밀도 및 밀착력 특성을 구현하며, 고온 및 고습 상태에서의 신뢰성 평가시 접착력 저하가 없고 두께 감소가 적은 신뢰성이 개선된 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 제공하는 것이다.The present invention has excellent curing sensitivity, enabling easy photocuring in atmospheric conditions, realizing excellent optical density and adhesion characteristics after curing, and improving reliability with no decrease in adhesion and less thickness reduction when evaluating reliability in high temperature and high humidity conditions. To provide an ultraviolet curable ink composition for forming a bezel pattern.
또한, 본 발명은 내열 특성이 향상된 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 제공하는 것이다.Additionally, the present invention provides an ultraviolet curable ink composition for forming a bezel pattern with improved heat resistance properties.
다만, 본 발명이 해결하고자 하는 과제는 상기 언급한 과제로 제한되지 않으며, 언급되지 않은 또 다른 과제들은 하기의 기재로부터 당업자에게 명확하게 이해될 수 있을 것이다.However, the problem to be solved by the present invention is not limited to the problems mentioned above, and other problems not mentioned will be clearly understood by those skilled in the art from the following description.
본 발명의 일 실시상태는 안료, 분산제, 지환식 에폭시계 화합물, 옥세탄계 화합물, 비닐 에테르계 화합물, 다이글리시딜 에테르 화합물, 양이온 개시제 및 라디칼계 개시제를 포함하는 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 제공한다.One embodiment of the present invention is an ultraviolet curable ink composition for forming a bezel pattern comprising a pigment, a dispersant, an alicyclic epoxy-based compound, an oxetane-based compound, a vinyl ether-based compound, a diglycidyl ether compound, a cationic initiator, and a radical-based initiator. provides.
본 발명의 일 실시상태에 따른 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 경화 감도가 우수하여 대기 조건에서 용이하게 광경화 될 수 있다.The ultraviolet curable ink composition for forming a bezel pattern according to an exemplary embodiment of the present invention has excellent curing sensitivity and can be easily photocured under atmospheric conditions.
또한, 본 발명의 일 실시상태에 따른 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 저장 안정성이 우수할 수 있다.Additionally, the ultraviolet curable ink composition for forming a bezel pattern according to an exemplary embodiment of the present invention may have excellent storage stability.
또한, 본 발명의 일 실시상태에 따른 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 분산성이 우수하여, 광개시제 및 증감제 등의 첨가제를 용이하게 용해시킬 수 있다.In addition, the ultraviolet curable ink composition for forming a bezel pattern according to an exemplary embodiment of the present invention has excellent dispersibility and can easily dissolve additives such as photoinitiators and sensitizers.
또한, 본 발명의 일 실시상태에 따른 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 경화 후에 우수한 광학 밀도 및 밀착력을 구현할 수 있다.In addition, the ultraviolet curable ink composition for forming a bezel pattern according to an exemplary embodiment of the present invention can achieve excellent optical density and adhesion after curing.
또한, 본 발명의 일 실시상태에 따른 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 경화 후에 신뢰성이 우수하여, 신뢰성 평가시 접착력 저하가 없고 두께 변화가 적다.In addition, the ultraviolet curable ink composition for forming a bezel pattern according to an exemplary embodiment of the present invention has excellent reliability after curing, so there is no decrease in adhesion and little change in thickness when evaluating reliability.
또한, 본 발명의 일 실시상태에 따른 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 내열 특성이 우수할 수 있다.Additionally, the ultraviolet curable ink composition for forming a bezel pattern according to an exemplary embodiment of the present invention may have excellent heat resistance properties.
다만, 본 발명의 효과는 상술한 효과에 한정되는 것이 아니며, 본 발명의 사상 및 영역으로부터 벗어나지 않는 범위에서 다양하게 확장될 수 있을 것이다.However, the effects of the present invention are not limited to the effects described above, and may be expanded in various ways without departing from the spirit and scope of the present invention.
본원 명세서 전체에서, 어떤 부분이 어떤 구성요소를 "포함"한다고 할 때, 이는 특별히 반대되는 기재가 없는 한 다른 구성요소를 제외하는 것이 아니라 다른 구성요소를 더 포함할 수 있음을 의미한다.Throughout the specification of the present application, when a part is said to “include” a certain element, this means that it may further include other elements rather than excluding other elements, unless specifically stated to the contrary.
본원 명세서 전체에서, 어떤 부재가 다른 부재 "상에" 위치하고 있다고 할 때, 이는 어떤 부재가 다른 부재에 접해 있는 경우뿐 아니라 두 부재 사이에 또 다른 부재가 존재하는 경우도 포함한다.Throughout this specification, when a member is said to be located “on” another member, this includes not only the case where the member is in contact with the other member, but also the case where another member exists between the two members.
본원 명세서 전체에서, "점도"는 상온(25 ℃) 조건에서 Cone Spindle(CPA-40Z)로 Brookfield viscometer에 의하여 측정된 값을 의미할 수 있다.Throughout the specification herein, “viscosity” may mean a value measured by a Brookfield viscometer with a Cone Spindle (CPA-40Z) at room temperature (25°C).
본원 명세서 전체에서, 단위 "중량부"는 각 성분간의 중량의 비율을 의미할 수 있다.Throughout the specification herein, the unit “part by weight” may refer to the ratio of weight between each component.
이하, 본 발명에 대하여 더욱 상세하게 설명한다.Hereinafter, the present invention will be described in more detail.
본 발명의 일 실시상태는 안료, 분산제, 지환식 에폭시계 화합물, 옥세탄계 화합물, 비닐 에테르계 화합물, 다이글리시딜 에테르 화합물, 양이온 개시제 및 라디칼계 개시제를 포함하는 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 제공한다.One embodiment of the present invention is an ultraviolet curable ink composition for forming a bezel pattern comprising a pigment, a dispersant, an alicyclic epoxy-based compound, an oxetane-based compound, a vinyl ether-based compound, a diglycidyl ether compound, a cationic initiator, and a radical-based initiator. provides.
본 발명의 일 실시상태에 따른 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 경화 감도가 우수하여 대기 조건에서 용이하게 광경화 될 수 있다. 구체적으로, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은, 대기 조건으로서 질소 충진 등의 외부 안정화 조건이 없는 상태에서, 18 ℃ 이상 30 ℃의 온도 및 15 % 이상 45 %의 상대습도 조건에서 경화 감도의 저하 없이 안정적으로 광경화를 수행할 수 있다.The ultraviolet curable ink composition for forming a bezel pattern according to an exemplary embodiment of the present invention has excellent curing sensitivity and can be easily photocured under atmospheric conditions. Specifically, the ultraviolet curable ink composition for forming a bezel pattern has a curing sensitivity at a temperature of 18 ℃ or more and 30 ℃ and a relative humidity of 15 % or more and 45 % in the absence of external stabilization conditions such as nitrogen filling as atmospheric conditions. Photocuring can be performed stably without degradation.
또한, 본 발명의 일 실시상태에 따른 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 저장 안정성이 우수할 수 있다.Additionally, the ultraviolet curable ink composition for forming a bezel pattern according to an exemplary embodiment of the present invention may have excellent storage stability.
또한, 본 발명의 일 실시상태에 따른 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 분산성이 우수하여, 광개시제 및 증감제 등의 첨가제를 용이하게 용해시킬 수 있다.In addition, the ultraviolet curable ink composition for forming a bezel pattern according to an exemplary embodiment of the present invention has excellent dispersibility and can easily dissolve additives such as photoinitiators and sensitizers.
또한, 본 발명의 일 실시상태에 따른 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 경화 후에 신뢰성이 우수하여, 신뢰성 평가시 접착력 저하가 없고, 두께변화가 적을 수 있다.In addition, the ultraviolet curable ink composition for forming a bezel pattern according to an exemplary embodiment of the present invention has excellent reliability after curing, so there is no decrease in adhesion when evaluating reliability, and the thickness change may be small.
본 발명의 일 실시상태에 따르면, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은, 안료, 분산제, 지환식 에폭시계 화합물, 옥세탄계 화합물, 비닐 에테르계 화합물, 다이글리시딜 에테르계 화합물 및 2종의 광개시제 (양이온 개시제, 라디칼계 개시제)를 포함한다. 구체적으로, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 용제를 포함하지 않을 수 있다. 즉, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 용제 미포함 베젤 패턴 형성용 자외선 경화형 잉크 조성물일 수 있다. 이때, 상기 용제는 유기 용제로서, 당업계에서 일반적으로 사용되는 점도 조절용 반응성 희석제를 의미할 수 있다. 종래의 블랙 패턴 형성용 광경화성 조성물은 용제를 포함하였다. 다만, 용제를 포함하는 광경화성 조성물은 저장 안정성이 열등하고, 광경화물의 경도 및 경화감도가 떨어지는 문제가 있었다. 반면, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 용제를 포함하지 않음으로써, 저장 안정성을 향상시킬 수 있다. 또한, 용제를 포함하지 않는 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 광경화물은 경화 후에 우수한 경도(예를 들어, 연필 경도)를 가질 수 있고, 기재와의 밀착력을 효과적으로 향상시킬 수 있다.According to one embodiment of the present invention, the ultraviolet curable ink composition for forming a bezel pattern includes a pigment, a dispersant, an alicyclic epoxy compound, an oxetane compound, a vinyl ether compound, a diglycidyl ether compound, and two types of compounds. Contains photoinitiators (cationic initiators, radical-based initiators). Specifically, the ultraviolet curable ink composition for forming a bezel pattern may not contain a solvent. That is, the ultraviolet curable ink composition for forming a bezel pattern may be a solvent-free ultraviolet curable ink composition for forming a bezel pattern. At this time, the solvent is an organic solvent and may refer to a reactive diluent for viscosity adjustment commonly used in the art. Conventional photocurable compositions for forming black patterns included solvents. However, photocurable compositions containing solvents have problems with poor storage stability and low hardness and curing sensitivity of photocurable products. On the other hand, the ultraviolet curable ink composition for forming a bezel pattern can improve storage stability by not containing a solvent. In addition, the photocured product of the ultraviolet curable ink composition for forming a bezel pattern that does not contain a solvent may have excellent hardness (for example, pencil hardness) after curing and can effectively improve adhesion to the substrate.
본 발명의 일 실시상태에 따르면, 상기 안료는 흑색안료를 포함할 수 있다. 상기 흑색안료로서 당업계에서 사용되는 것을 이용할 수 있다. 예를 들어, 상기 흑색안료는, 카본블랙, 흑연, 금속 산화물 및 유기블랙 안료 중 적어도 하나를 포함할 수 있으나, 상기 흑색안료의 종류를 한정하는 것은 아니다.According to one embodiment of the present invention, the pigment may include a black pigment. As the black pigment, those used in the industry can be used. For example, the black pigment may include at least one of carbon black, graphite, metal oxide, and organic black pigment, but the type of black pigment is not limited.
예를 들어, 상기 카본블랙은 시스토 5HIISAF-HS, 시스토 KH, 시스토 3HHAF-HS, 시스토 NH, 시스토 3M, 시스토 300HAFLS, 시스토 116HMMAF-HS, 시스토 116MAF, 시스토 FMFEF-HS, 시스토 SOFEF, 시스토 VGPF, 시스토 SVHSRF-HS 및 시스토 SSRF(동해카본 ㈜); 다이어그램 블랙 II, 다이어그램 블랙 N339, 다이어그램 블랙 SH, 다이어그램 블랙 H, 다이어그램 LH, 다이어그램 HA, 다이어그램 SF, 다이어그램 N550M, 다이어그램 M, 다이어그램 E, 다이어그램 G, 다이어그램 R, 다이어그램 N760M, 다이어그램 LR, #2700, #2600, #2400, #2350, #2300, #2200, #1000, #980, #900, MCF88, #52, #50, #47, #45, #45L, #25, #CF9, #95, #3030, #3050, MA7, MA77, MA8, MA11, MA100, MA40, OIL7B, OIL9B, OIL11B, OIL30B 및 OIL31B(미쯔비시화학㈜) ; PRINTEX-U, PRINTEX-V, PRINTEX140U, PRINTEX-140V, PRINTEX-95, PRINTEX-85, PRINTEX-75, PRINTEX-55, PRINTEX-45, PRINTEX-300, PRINTEX35, PRINTEX-25, PRINTEX-200, PRINTEX-40, PRINTEX-30, PRINTEX-3, PRINTEX-A, SPECIAL BLACK-550, SPECIAL BLACK-350, SPECIAL BLACK-250, SPECIAL BLACK-100, 및 LAMP BLACK-101(대구사㈜); RAVEN-1100ULTRA, RAVEN1080ULTRA, RAVEN-1060ULTRA, RAVEN-1040, RAVEN-1035, RAVEN-1020, RAVEN-1000, RAVEN-890H, RAVEN-890, RAVEN-880ULTRA, RAVEN-860ULTRA, RAVEN-850, RAVEN-820, RAVEN-790ULTRA, RAVEN-780ULTRA, RAVEN-760ULTRA, RAVEN-520, RAVEN-500, RAVEN-460, RAVEN-450, RAVEN-430ULTRA, RAVEN-420, RAVEN-410, RAVEN-2500ULTRA, RAVEN-2000, RAVEN-1500, RAVEN-1255, RAVEN-1250, RAVEN-1200, RAVEN-1190ULTRA, 및 RAVEN-1170(콜롬비아 카본㈜) 또는 이들의 혼합물 등을 들 수 있다. 또한, 상기 유기블랙 안료로서 아닐린 블랙, 락탐 블랙 또는 페릴렌 블랙계열 등을 사용할 수 있으나, 이로 한정하는 것은 아니다.For example, the carbon black is Systo 5HIISAF-HS, Systo KH, Systo 3HHAF-HS, Systo NH, Systo 3M, Systo 300HAFLS, Systo 116HMMAF-HS, Systo 116MAF, Systo FMFEF- HS, Systo SOFEF, Systo VGPF, Systo SVHSRF-HS, and Systo SSRF (Donghae Carbon Co., Ltd.); Diagram Black II, Diagram Black N339, Diagram Black SH, Diagram Black H, Diagram LH, Diagram HA, Diagram SF, Diagram N550M, Diagram M, Diagram E, Diagram G, Diagram R, Diagram N760M, Diagram LR, #2700, # 2600, #2400, #2350, #2300, #2200, #1000, #980, #900, MCF88, #52, #50, #47, #45, #45L, #25, #CF9, #95, # 3030, #3050, MA7, MA77, MA8, MA11, MA100, MA40, OIL7B, OIL9B, OIL11B, OIL30B and OIL31B (Mitsubishi Chemical Co., Ltd.); PRINTEX-U, PRINTEX-V, PRINTEX140U, PRINTEX-140V, PRINTEX-95, PRINTEX-85, PRINTEX-75, PRINTEX-55, PRINTEX-45, PRINTEX-300, PRINTEX35, PRINTEX-25, PRINTEX-200, PRINTEX- 40, PRINTEX-30, PRINTEX-3, PRINTEX-A, SPECIAL BLACK-550, SPECIAL BLACK-350, SPECIAL BLACK-250, SPECIAL BLACK-100, and LAMP BLACK-101 (Daegusa Co., Ltd.); RAVEN-1100ULTRA, RAVEN1080ULTRA, RAVEN-1060ULTRA, RAVEN-1040, RAVEN-1035, RAVEN-1020, RAVEN-1000, RAVEN-890H, RAVEN-890, RAVEN-880ULTRA, RAVEN-860ULTRA, RAVEN-850, RAVEN-820, RAVEN-790ULTRA, RAVEN-780ULTRA, RAVEN-760ULTRA, RAVEN-520, RAVEN-500, RAVEN-460, RAVEN-450, RAVEN-430ULTRA, RAVEN-420, RAVEN-410, RAVEN-2500ULTRA, RAVEN-2000, RAVEN- 1500, RAVEN-1255, RAVEN-1250, RAVEN-1200, RAVEN-1190ULTRA, and RAVEN-1170 (Colombia Carbon Co., Ltd.) or mixtures thereof. In addition, the organic black pigment may be aniline black, lactam black, or perylene black, but is not limited thereto.
본 발명의 일 실시상태에 따르면, 상기 자외선 경화형 잉크 조성물 100 중량부 기준으로, 상기 안료의 함량은 5 중량부 이상 20 중량부 이하일 수 있다. 구체적으로, 상기 안료의 함량은 상기 자외선 경화형 잉크 조성물 100 중량부 기준으로, 6.5 중량부 이상 17.5 중량부 이하, 8 중량부 이상 16 중량부 이하, 8 중량부 이상 15 중량부 이하, 8 중량부 이상 13 중량부 이하, 8 중량부 이상 11 중량부 이하, 10 중량부 이상 16.5 중량부 이하, 10 중량부 이상 15 중량부 이하, 10 중량부 이상 12.5 중량부 이하 또는 10 중량부 이상 11 중량부 이하일 수 있다. 상기 자외선 경화형 잉크 조성물에 포함된 상기 안료의 함량이 전술한 범위 내인 경우, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 경화 감도를 저하시키지 않으면서, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 광경화물이 균질한 색상을 구현할 수 있다.According to one embodiment of the present invention, based on 100 parts by weight of the ultraviolet curable ink composition, the content of the pigment may be 5 parts by weight or more and 20 parts by weight or less. Specifically, the content of the pigment is 6.5 parts by weight or more and 17.5 parts by weight or less, 8 parts by weight or more and 16 parts by weight or less, 8 parts by weight or more and 15 parts by weight or less, and 8 parts by weight or more, based on 100 parts by weight of the ultraviolet curable ink composition. It can be 13 parts by weight or less, 8 parts by weight or more but 11 parts by weight or less, 10 parts by weight or more but 16.5 parts by weight or less, 10 parts by weight or more and 15 parts by weight or less, 10 parts by weight or more and 12.5 parts by weight or less, or 10 parts by weight or more and 11 parts by weight or less. there is. When the content of the pigment contained in the ultraviolet curable ink composition is within the above-mentioned range, the photocured product of the ultraviolet curable ink composition for bezel pattern formation is obtained without reducing the curing sensitivity of the ultraviolet curable ink composition for bezel pattern formation. Homogeneous color can be achieved.
특히, 상기 안료의 함량이 전술한 범위 내인 경우, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 경화 후에 요구되는 수준의 광학밀도를 구현할 수 있다. 또한, 상기 안료가 베젤 패턴 형성용 자외선 경화형 잉크 조성물에 분산되지 않아 침전물이 형성되는 것을 효과적으로 억제할 수 있고, 잉크젯 공정 시에 노즐 막힘 등의 공정 성능이 저하되는 것을 방지할 수 있다.In particular, when the content of the pigment is within the above-mentioned range, the ultraviolet curable ink composition for forming a bezel pattern can achieve the required level of optical density after curing. In addition, since the pigment is not dispersed in the ultraviolet curable ink composition for forming a bezel pattern, the formation of precipitates can be effectively suppressed, and deterioration of process performance such as nozzle clogging during the inkjet process can be prevented.
본 발명의 일 실시상태에 따르면, 상기 분산제는 우레탄계 화합물을 포함할 수 있다. 즉, 상기 분산제는 우레탄 결합을 함유하는 화합물을 포함할 수 있다. 구체적으로, 상기 자외선 경화형 잉크 조성물에 포함된 상기 분산제는 폴리우레탄계 분산제일 수 있다. 상기 자외선 경화형 잉크 조성물에 우레탄계 화합물을 포함하는 분산제를 첨가함으로써, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물에 포함된 안료, 옥세탄계 화합물, 지환식 에폭시계 화합물, 비닐 에테르계 화합물, 다이글리시딜 에테르계 화합물, 광개시제 및 첨가제의 분산성을 향상시켜, 균질한 조성물을 가지는 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 제공할 수 있다. 이를 통해, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 광경화물은 경도 및 기재와의 밀착력이 효과적으로 향상될 수 있다. 또한, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 폴리우레탄계 분산제를 포함함으로써, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물 내에 안료를 고르게 분산시킬 수 있고, 경화 효율을 향상시키면서 고른 색상 분포를 구현할 수 있다.According to one embodiment of the present invention, the dispersant may include a urethane-based compound. That is, the dispersant may include a compound containing a urethane bond. Specifically, the dispersant included in the ultraviolet curable ink composition may be a polyurethane-based dispersant. By adding a dispersant containing a urethane-based compound to the ultraviolet curable ink composition, the pigment, oxetane-based compound, alicyclic epoxy-based compound, vinyl ether-based compound, and diglycidyl ether contained in the ultraviolet-curable ink composition for forming the bezel pattern. By improving the dispersibility of the based compound, photoinitiator, and additive, it is possible to provide an ultraviolet curable ink composition for forming a bezel pattern having a homogeneous composition. Through this, the hardness and adhesion to the substrate of the photocured product of the ultraviolet curable ink composition for forming a bezel pattern can be effectively improved. In addition, the ultraviolet curable ink composition for forming a bezel pattern includes a polyurethane-based dispersant, so that the pigment can be evenly dispersed in the ultraviolet curable ink composition for forming a bezel pattern, and an even color distribution can be achieved while improving curing efficiency.
본 발명의 일 실시상태에 따르면, 상기 분산제에 포함되는 우레탄계 화합물로서 당업계에서 사용되는 것을 이용할 수 있다. 예를 들어, 상기 분산제로서 우레탄계 분산제인 Disperbyk160 내지 167 및 182 시리즈를 사용할 수 있으나, 상기 우레탄계 분산제의 종류를 한정하는 것은 아니다.According to an exemplary embodiment of the present invention, a urethane-based compound included in the dispersant may be one used in the art. For example, Disperbyk160 to 167 and 182 series, which are urethane-based dispersants, can be used as the dispersant, but the type of urethane-based dispersant is not limited.
본 발명의 일 실시상태에 따르면, 상기 분산제는 아크릴계 분산제를 포함하지 않을 수 있다. 분산제로서 아크릴계 분산제를 포함하는 경우, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 광경화물의 경도(예를 들어, 연필 경도)와 밀착력이 저하되는 문제가 발생될 수 있다. 반면, 본 발명의 일 실시상태에 따른 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 분산제로서 우레탄계 화합물을 포함함으로써, 경화 후에 경도 및 밀착력을 효과적으로 향상시킬 수 있다.According to an exemplary embodiment of the present invention, the dispersant may not include an acrylic dispersant. When an acrylic-based dispersant is included as a dispersant, the hardness (for example, pencil hardness) and adhesion of the photocurable product of the ultraviolet curable ink composition for forming a bezel pattern may decrease. On the other hand, the ultraviolet curable ink composition for forming a bezel pattern according to an exemplary embodiment of the present invention includes a urethane-based compound as a dispersant, and thus can effectively improve hardness and adhesion after curing.
본 발명의 일 실시상태에 따르면, 상기 자외선 경화형 잉크 조성물 100 중량부 기준으로, 상기 분산제의 함량은 1 중량부 이상 6 중량부 이하일 수 있다. 구체적으로, 상기 분산제의 함량은 상기 자외선 경화형 잉크 조성물 100 중량부 기준으로, 2 중량부 이상 5.5 중량부 이하, 2 중량부 이상 5 중량부 이하, 2 중량부 이상 4 중량부 이하, 2 중량부 이상 3 중량부 이하, 2.25 중량부 이상 5 중량부 이하, 2.25 중량부 이상 4 중량부 이하, 2.25 중량부 이상 3 중량부 이하, 2.25 중량부 이상 2.75 중량부 이하, 2.5 중량부 이상 4.0 중량부 이하, 2.5 중량부 이상 3.5 중량부 이하, 2.5 중량부 이상 3 중량부 이하 또는 2.5 중량부 이상 2.75 중량부 이하일 수 있다. 상기 자외선 경화형 잉크 조성물에 포함된 상기 분산제의 함량을 전술한 범위로 조절함으로써, 상기 자외선 경화형 잉크 조성물의 분산성이 향상되어 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 균질한 조성을 가질 수 있다. 또한, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물 내에 안료를 고르게 분산시킬 수 있고, 경화 효율을 향상시키면서 고른 색상 분포를 구현할 수 있다. 또한, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 광경화물은 경도 및 기재와의 밀착력이 효과적으로 향상될 수 있다.According to one embodiment of the present invention, based on 100 parts by weight of the ultraviolet curable ink composition, the content of the dispersant may be 1 part by weight or more and 6 parts by weight or less. Specifically, the content of the dispersant is 2 parts by weight or more and 5.5 parts by weight or less, 2 parts by weight or more and 5 parts by weight or less, 2 parts by weight or more and 4 parts by weight or less, and 2 parts by weight or more, based on 100 parts by weight of the ultraviolet curable ink composition. 3 parts by weight or less, 2.25 parts by weight or more, 5 parts by weight or less, 2.25 parts by weight or more, 4 parts by weight or less, 2.25 parts by weight or more, 3 parts by weight or less, 2.25 parts by weight or more, 2.75 parts by weight or less, 2.5 parts by weight or more, 4.0 parts by weight or less, It may be 2.5 parts by weight or more and 3.5 parts by weight or less, 2.5 parts by weight or more and 3 parts by weight or less, or 2.5 parts by weight or more and 2.75 parts by weight or less. By adjusting the content of the dispersant contained in the ultraviolet curable ink composition to the above-mentioned range, the dispersibility of the ultraviolet curable ink composition is improved, so that the ultraviolet curable ink composition for forming a bezel pattern can have a homogeneous composition. In addition, the pigment can be evenly dispersed in the ultraviolet curable ink composition for forming the bezel pattern, and even color distribution can be achieved while improving curing efficiency. In addition, the photocured product of the ultraviolet curable ink composition for forming a bezel pattern can effectively improve hardness and adhesion to the substrate.
본 발명의 일 실시상태에 따르면, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 옥세탄계 화합물을 포함할 수 있다. 구체적으로, 상기 옥세탄계 화합물은 분자 내에 1개 이상의 옥세탄 고리를 포함할 수 있다. 보다 구체적으로, 상기 옥세탄계 화합물의 분자 내에 함유된 옥세탄 고리의 수는 1 개 이상 4 개 이하, 1 개 이상 3 개 이하, 1 개 이상 2 개 이하 또는 1 개일 수 있다. 전술한 범위의 옥세탄 고리를 함유하는 옥세탄계 화합물을 사용함으로써, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 경화 감도, 저장 안정성 및 분산성을 향상시킬 수 있다. 또한, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 광경화물의 광학밀도, 경도 및 밀착성을 효과적으로 향상시킬 수 있다.According to an exemplary embodiment of the present invention, the ultraviolet curable ink composition for forming a bezel pattern may include an oxetane-based compound. Specifically, the oxetane-based compound may include one or more oxetane rings within the molecule. More specifically, the number of oxetane rings contained in the molecule of the oxetane-based compound may be 1 to 4, 1 to 3, 1 to 2, or 1. By using an oxetane-based compound containing an oxetane ring in the above-described range, the curing sensitivity, storage stability, and dispersibility of the ultraviolet curable ink composition for forming a bezel pattern can be improved. In addition, the optical density, hardness, and adhesion of the photocurable product of the ultraviolet curable ink composition for forming the bezel pattern can be effectively improved.
본 발명의 일 실시상태에 따르면, 상기 옥세탄계 화합물은 지방족 옥세탄계 화합물 및 방향족 옥세탄계 화합물 중 적어도 하나를 포함할 수 있다. 구체적으로, 상기 옥세탄계 화합물은 하기 화학식 1-1로 표시되는 화합물 및 하기 화학식 1-2로 표시되는 화합물 중 적어도 하나를 포함할 수 있다. 보다 구체적으로, 상기 옥세탄계 화합물은 하기 화학식 1-1로 표시되는 화합물일 수 있다.According to an exemplary embodiment of the present invention, the oxetane-based compound may include at least one of an aliphatic oxetane-based compound and an aromatic oxetane-based compound. Specifically, the oxetane-based compound may include at least one of a compound represented by Formula 1-1 below and a compound represented by Formula 1-2 below. More specifically, the oxetane-based compound may be a compound represented by the following formula 1-1.
[화학식 1-1][Formula 1-1]
[화학식 1-2][Formula 1-2]
상기 화학식 1-1에서, R1 및 R4는 각각 독립적으로 직쇄 또는 분지쇄의 탄소수 1 내지 10의 알킬기일 수 있고, R2 및 R3는 각각 독립적으로 직쇄 또는 분지쇄의 탄소수 1 내지 5의 알킬렌일 수 있고, n1은 0 또는 1 내지 4의 정수일 수 있다. 구체적으로, R1 및 R4는 각각 독립적으로 직쇄 또는 분지쇄의 탄소수 1 내지 8의 알킬기, 탄소수 2 내지 6의 알킬기, 또는 탄소수 5 내지 10의 알킬기일 수 있다. 또한, R2 및 R3는 각각 독립적으로 직쇄 또는 분지쇄의 탄소수 1 내지 3의 알킬렌, 또는 탄소수 1 내지 2의 알킬렌일 수 있다. 상기 n1은 0 또는 1 내지 2의 정수, 1, 또는 0일 수 있다.In Formula 1-1, R 1 and R 4 may each independently be a straight-chain or branched alkyl group having 1 to 10 carbon atoms, and R 2 and R 3 may each independently be a straight-chain or branched alkyl group having 1 to 5 carbon atoms. It may be alkylene, and n1 may be 0 or an integer from 1 to 4. Specifically, R 1 and R 4 may each independently be a straight-chain or branched alkyl group with 1 to 8 carbon atoms, an alkyl group with 2 to 6 carbon atoms, or an alkyl group with 5 to 10 carbon atoms. Additionally, R 2 and R 3 may each independently be straight-chain or branched alkylene having 1 to 3 carbon atoms, or alkylene having 1 to 2 carbon atoms. The n1 may be 0 or an integer of 1 to 2, 1, or 0.
상기 화학식 1-2에서, R5 및 R10는 각각 독립적으로 직쇄 또는 분지쇄의 탄소수 1 내지 10의 알킬기일 수 있고, R6 내지 R9는 각각 독립적으로 직쇄 또는 분지쇄의 탄소수 1 내지 5의 알킬렌일 수 있고, Ar1은 탄소수 6 내지 20의 아릴렌일 수 있고, n2은 1 내지 4의 정수일 수 있다. 구체적으로, R5 및 R10는 각각 독립적으로 직쇄 또는 분지쇄의 탄소수 1 내지 8의 알킬기, 탄소수 2 내지 6의 알킬기, 또는 탄소수 2 내지 4의 알킬기일 수 있다. 또한, R6 내지 R9는 각각 독립적으로 직쇄 또는 분지쇄의 탄소수 1 내지 3의 알킬렌, 또는 탄소수 1 내지 2의 알킬렌일 수 있다. 또한, Ar1은 6 내지 18의 아릴렌, 6 내지 15의 아릴렌, 6 내지 10의 아릴렌, 또는 벤젠일 수 있다.In Formula 1-2, R 5 and R 10 may each independently be a straight-chain or branched alkyl group having 1 to 10 carbon atoms, and R 6 to R 9 may each independently be a straight-chain or branched alkyl group having 1 to 5 carbon atoms. It may be alkylene, Ar1 may be an arylene having 6 to 20 carbon atoms, and n2 may be an integer of 1 to 4. Specifically, R 5 and R 10 may each independently be a linear or branched alkyl group with 1 to 8 carbon atoms, an alkyl group with 2 to 6 carbon atoms, or an alkyl group with 2 to 4 carbon atoms. In addition, R 6 to R 9 may each independently be linear or branched alkylene having 1 to 3 carbon atoms, or alkylene having 1 to 2 carbon atoms. Additionally, Ar1 may be 6 to 18 arylene, 6 to 15 arylene, 6 to 10 arylene, or benzene.
상기 화학식 1-1로 표시되는 화합물 및 상기 화학식 1-2로 표시되는 화합물 중 적어도 하나를 포함하는 옥세탄계 화합물을 사용함으로써, 경화 감도, 저장 안정성 및 분산성이 우수한 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 구현할 수 있다. 또한, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 경화 후에 우수한 광학밀도, 경도 및 밀착성을 가질 수 있다.An ultraviolet curable ink composition for forming a bezel pattern with excellent curing sensitivity, storage stability, and dispersibility by using an oxetane-based compound containing at least one of the compound represented by Formula 1-1 and the compound represented by Formula 1-2. can be implemented. Additionally, the ultraviolet curable ink composition for forming a bezel pattern may have excellent optical density, hardness, and adhesion after curing.
상기 옥세탄계 화합물은 하기 화합물 1-1 내지 화합물 1-3 중 적어도 하나를 포함할 수 있다. 구체적으로, 상기 옥세탄계 화합물은 하기 화합물 1-1일 수 있다.The oxetane-based compound may include at least one of the following compounds 1-1 to 1-3. Specifically, the oxetane-based compound may be Compound 1-1 below.
[화합물 1-1][Compound 1-1]
[화합물 1-2][Compound 1-2]
[화합물 1-3][Compound 1-3]
상기 화합물 1-3에서, n은 1 내지 4의 정수이다.In compounds 1-3, n is an integer of 1 to 4.
또한, 상기 옥세탄계 화합물은 3-에틸-3-히드록시메틸 옥세탄, 1,4-비스[(3-에틸-3-옥세타닐)메톡시메틸]벤젠, 3-에틸-3-(페녹 시메틸)옥세탄, 디[(3-에틸-3-옥세타닐)메틸]에테르, 3-에틸-3-(2-에틸헥실옥시메틸)옥세탄, 3-에틸-3-시클로헥 실옥시메틸 옥세탄 및 페놀노볼락 옥세탄 중 적어도 하나를 포함할 수도 있다. 옥세탄 화합물로서, 예를 들면, 토아고세이㈜ 사의 「알론옥세탄 OXT-101」, 「알론옥세탄 OXT-121」, 「알론옥세탄 OXT-211」, 「알론옥세탄 OXT-221」 또는 「알론옥세탄 OXT-212」 등을 사용할 수 있다. 이들은 단독으로, 혹은 2종 이상을 조합으로 이용할 수 있다.In addition, the oxetane-based compounds include 3-ethyl-3-hydroxymethyl oxetane, 1,4-bis[(3-ethyl-3-oxetanyl)methoxymethyl]benzene, 3-ethyl-3-(phenol Cymethyl)oxetane, di[(3-ethyl-3-oxetanyl)methyl]ether, 3-ethyl-3-(2-ethylhexyloxymethyl)oxetane, 3-ethyl-3-cyclohexyloxy It may also include at least one of methyl oxetane and phenol novolac oxetane. As an oxetane compound, for example, "Alonoxetane OXT-101", "Alonoxetane OXT-121", "Alonoxetane OXT-211", "Alonoxetane OXT-221" or "Alonoxetane OXT-221" manufactured by Toagosei Co., Ltd. Allonoxetane OXT-212” etc. can be used. These can be used individually or in combination of two or more types.
본 발명의 일 실시상태에 따르면, 상기 자외선 경화형 잉크 조성물 100 중량부 기준으로, 상기 옥세탄계 화합물의 함량은 5 중량부 이상 25 중량부 이하일 수 있다. 구체적으로, 상기 옥세탄계 화합물의 함량은 상기 자외선 경화형 잉크 조성물 100 중량부 기준으로, 5 중량부 이상 23 중량부 이하, 7 중량부 이상 25 중량부 이하, 7 중량부 이상 23 중량부 이하, 10 중량부 이상 25 중량부 이하, 10 중량부 이상 23 중량부 이하, 13 중량부 이상 25 중량부 이하, 13 중량부 이상 23 중량부 이하, 15 중량부 이상 25 중량부 이하, 15 중량부 이상 23 중량부 이하 또는 15 중량부 이상 22 중량부 이하일 수 있다. 상기 자외선 경화형 잉크 조성물에 포함된 상기 옥세탄계 화합물의 함량을 전술한 범위로 조절함으로써, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 경화 감도, 저장 안정성 및 분산성을 향상시킬 수 있다. 또한, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 광경화물의, 경도 및 밀착성을 효과적으로 향상시킬 수 있다. 특히, 상기 옥세탄계 화합물의 함량이 전술한 범위 내인 경우, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 경화 감도가 저하되는 것을 방지할 수 있고, 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 점도가 상승하여 코팅성이 떨어지는 것을 효과적으로 억제할 수 있다.According to one embodiment of the present invention, based on 100 parts by weight of the ultraviolet curable ink composition, the content of the oxetane-based compound may be 5 parts by weight or more and 25 parts by weight or less. Specifically, the content of the oxetane-based compound is 5 parts by weight or more and 23 parts by weight or less, 7 parts by weight or more and 25 parts by weight or less, 7 parts by weight or more and 23 parts by weight or less, and 10 parts by weight, based on 100 parts by weight of the ultraviolet curable ink composition. Not less than 25 parts by weight, not less than 10 parts by weight but not more than 23 parts by weight, not less than 13 parts by weight but not more than 25 parts by weight, not less than 13 parts by weight but not more than 23 parts by weight, not less than 15 parts by weight but not more than 25 parts by weight, not less than 15 parts by weight but not more than 23 parts by weight It may be less than or equal to 15 parts by weight or more and less than or equal to 22 parts by weight. By adjusting the content of the oxetane-based compound contained in the ultraviolet curable ink composition to the above-mentioned range, curing sensitivity, storage stability, and dispersibility of the ultraviolet curable ink composition for forming a bezel pattern can be improved. In addition, the hardness and adhesion of the photocurable product of the ultraviolet curable ink composition for forming the bezel pattern can be effectively improved. In particular, when the content of the oxetane-based compound is within the above-mentioned range, the curing sensitivity of the ultraviolet curable ink composition for forming a bezel pattern can be prevented from decreasing, and the viscosity of the ultraviolet curable ink composition for forming a bezel pattern increases to increase coating It can effectively suppress temper tantrums.
본 발명의 일 실시상태에 따르면, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 에폭시계 화합물을 포함할 수 있다. 구체적으로, 상기 에폭시계 화합물은 분자 내에 에스테르(ester) 결합을 포함할 수 있다. 구체적으로, 상기 에폭시계 화합물의 분자 내에 포함된 에스테르 결합의 수는 1 개 이상 4 개 이하, 1 개 이상 3 개 이하, 1 개 이상 2 개 이하, 또는 1 개일 수 있다. 전술한 범위의 에스테르 결합을 함유하는 에폭시계 화합물을 사용함으로써, 경화 감도, 저장 안정성 및 분산성이 우수한 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 구현할 수 있다. 또한, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 경화 후에 우수한 광학밀도, 경도 및 밀착성을 가질 수 있다.According to one embodiment of the present invention, the ultraviolet curable ink composition for forming a bezel pattern may include an epoxy-based compound. Specifically, the epoxy-based compound may contain an ester bond within the molecule. Specifically, the number of ester bonds contained in the molecule of the epoxy compound may be 1 to 4, 1 to 3, or 1 to 2. By using an epoxy-based compound containing an ester bond in the above-mentioned range, the ultraviolet curable ink composition for forming a bezel pattern with excellent curing sensitivity, storage stability, and dispersibility can be implemented. Additionally, the ultraviolet curable ink composition for forming a bezel pattern may have excellent optical density, hardness, and adhesion after curing.
본 발명의 일 실시상태에 따르면, 상기 에폭시계 화합물은 지환식 에폭시계 화합물일 수 있다. 상기 지환식 에폭시계 화합물은 말단에 지환식 에폭시기를 포함할 수 있다. 상기 "지환식 에폭시기"는 탄소수 5 내지 10의 시클로알킬기와 에폭시가 결합(fused)하여, 2개의 고리가 융합되어 에폭시화된 지방족 고리기를 의미할 수 있다. 이때, 상기에서 시클로알킬기를 구성하는 수소 원자는, 임의적으로 알킬기 등의 치환기에 의해 치환될 수도 있다. 예를 들어, 상기 지환식 에폭시기는, 3,4-에폭시시클로펜틸기, 3,4-에폭시시클로헥실기, 3,4-에폭시시클로펜틸메틸기, 3,4-에폭시시클로헥실메틸기, 2-(3,4-에폭시시클로펜틸)에틸기, 2-(3,4-에폭시시클로 헥실)에틸기, 3-(3,4-에폭시시클로페틸)프로필기 또는 3-(3,4-에폭시시클로헥실)프로필기일 수 있다.According to one embodiment of the present invention, the epoxy-based compound may be an alicyclic epoxy-based compound. The alicyclic epoxy compound may include an alicyclic epoxy group at the terminal. The “alicyclic epoxy group” may refer to an aliphatic ring group in which a cycloalkyl group having 5 to 10 carbon atoms and an epoxy group are fused, and the two rings are fused and epoxidized. At this time, the hydrogen atom constituting the cycloalkyl group may be optionally substituted with a substituent such as an alkyl group. For example, the alicyclic epoxy group is 3,4-epoxycyclopentyl group, 3,4-epoxycyclohexyl group, 3,4-epoxycyclopentylmethyl group, 3,4-epoxycyclohexylmethyl group, 2-(3 ,4-epoxycyclopentyl)ethyl group, 2-(3,4-epoxycyclohexyl)ethyl group, 3-(3,4-epoxycyclopentyl)propyl group, or 3-(3,4-epoxycyclohexyl)propyl group. there is.
상기 지환식 에폭시계 화합물은 1개 이상 4 개 이하, 또는 1개 이상 2 개 이하의 지환식 에폭시기를 함유할 수 있다. 전술한 범위의 지환식 에폭시기를 함유하는 에폭시계 화합물을 사용함으로써, 경화 감도, 저장 안정성 및 분산성이 우수한 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 구현할 수 있다. 또한, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 경화 후에 우수한 광학밀도, 경도 및 밀착성을 가질 수 있다.The alicyclic epoxy compound may contain 1 to 4 alicyclic epoxy groups, or 1 to 2 alicyclic epoxy groups. By using an epoxy-based compound containing an alicyclic epoxy group in the above-mentioned range, the ultraviolet curable ink composition for forming a bezel pattern with excellent curing sensitivity, storage stability, and dispersibility can be implemented. Additionally, the ultraviolet curable ink composition for forming a bezel pattern may have excellent optical density, hardness, and adhesion after curing.
본 발명의 일 실시상태에 따르면, 상기 지환식 에폭시계 화합물은 2개의 지환식 에폭시기를 함유하는 제1 에폭시계 화합물 및 1 개의 지환식 에폭시기와 1개의 비닐기를 함유하는 제2 에폭시계 화합물 중 적어도 하나를 포함할 수 있다. 구체적으로, 상기 에폭시계 화합물은 하기 화학식 2-1로 표시되는 화합물 및 하기 화학식 2-2로 표시되는 화합물 중 적어도 하나를 포함할 수 있다. 보다 구체적으로, 상기 지환식 에폭시계 화합물은 하기 화학식 2-1로 표시되는 화합물일 수 있다.According to an exemplary embodiment of the present invention, the alicyclic epoxy compound is at least one of a first epoxy compound containing two alicyclic epoxy groups and a second epoxy compound containing one alicyclic epoxy group and one vinyl group. may include. Specifically, the epoxy-based compound may include at least one of a compound represented by Formula 2-1 below and a compound represented by Formula 2-2 below. More specifically, the alicyclic epoxy compound may be a compound represented by the following formula 2-1.
[화학식 2-1][Formula 2-1]
[화학식 2-2][Formula 2-2]
상기 화학식 2-1에서, R11 및 R13는 각각 독립적으로 단일결합, 또는 직쇄 또는 분지쇄의 탄소수 1 내지 5의 알킬렌일 수 있고, R12는 직쇄 또는 분지쇄의 탄소수 1 내지 5의 알킬렌일 수 있고, n3은 0 또는 1 내지 3의 정수일 수 있다. 구체적으로, R11 및 R13는 각각 독립적으로 단일결합, 또는 직쇄 또는 분지쇄의 탄소수 1 내지 3의 알킬렌, 또는 탄소수 1 내지 2의 알킬렌일 수 있다. 또한, n3은 0 또는 1 내지 2의 정수, 1, 또는 0일 수 있다.In Formula 2-1, R 11 and R 13 may each independently be a single bond or a straight-chain or branched alkylene group having 1 to 5 carbon atoms, and R 12 is a straight-chain or branched alkylene group having 1 to 5 carbon atoms. and n3 may be 0 or an integer from 1 to 3. Specifically, R 11 and R 13 may each independently be a single bond, a straight-chain or branched alkylene having 1 to 3 carbon atoms, or an alkylene having 1 to 2 carbon atoms. Additionally, n3 may be 0 or an integer of 1 to 2, 1, or 0.
상기 화학식 2-2에서, R14는 단일결합, 또는 직쇄 또는 분지쇄의 탄소수 1 내지 5의 알킬렌일 수 있다.In Formula 2-2, R 14 may be a single bond, or a straight-chain or branched alkylene having 1 to 5 carbon atoms.
상기 화학식 2-1로 표시되는 화합물 및 상기 화학식 2-2로 표시되는 화합물 중 적어도 하나를 포함하는 지환식 에폭시계 화합물을 사용함으로써, 경화 감도, 저장 안정성 및 분산성이 우수한 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 구현할 수 있다. 또한, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 경화 후에 우수한 광학밀도, 경도 및 밀착성을 가질 수 있다.By using an alicyclic epoxy compound containing at least one of the compound represented by Formula 2-1 and the compound represented by Formula 2-2, ultraviolet rays for forming the bezel pattern have excellent curing sensitivity, storage stability, and dispersibility. A curable ink composition can be implemented. Additionally, the ultraviolet curable ink composition for forming a bezel pattern may have excellent optical density, hardness, and adhesion after curing.
또한, 상기 화학식 2-1로 표시되는 화합물은 보다 구체적으로 하기 화학식 2-1a로 표시되는 화합물일 수 있다.In addition, the compound represented by Formula 2-1 may be more specifically a compound represented by Formula 2-1a below.
[화학식 2-1a][Formula 2-1a]
상기 화학식 2-1a에서 R11 내지 R13 및 n3은 상기 화학식 2-1에서 정의한 것과 동일할 수 있다.In Formula 2-1a, R 11 to R 13 and n3 may be the same as defined in Formula 2-1.
상기 지환식 에폭시계 화합물은 하기 화합물 2-1 내지 화합물 2-3 중 적어도 하나를 포함할 수 있다. 구체적으로, 상기 지환식 에폭시계 화합물은 하기 화합물 2-1 또는 화합물 2-2일 수 있다.The alicyclic epoxy compound may include at least one of Compounds 2-1 to 2-3 below. Specifically, the alicyclic epoxy-based compound may be Compound 2-1 or Compound 2-2 below.
[화합물 2-1][Compound 2-1]
[화합물 2-2][Compound 2-2]
[화합물 2-3][Compound 2-3]
또한, 상기 지환식 에폭시계 화합물은 비스페놀형 에폭시 화합물, 노볼락형 에폭시 화합물, 글리시딜 에스테르형 에폭시 화합물, 글리시딜 아민형 에폭시 화합물, 선형 지방족 에폭시 화합물, 비페닐형 에폭시 화합물 및 지환식 에폭시 화합물 중 적어도 하나를 포함할 수도 있다.In addition, the alicyclic epoxy compounds include bisphenol-type epoxy compounds, novolak-type epoxy compounds, glycidyl ester-type epoxy compounds, glycidyl amine-type epoxy compounds, linear aliphatic epoxy compounds, biphenyl-type epoxy compounds, and alicyclic epoxy compounds. It may include at least one of the compounds.
예를 들어, 상기 지환식 에폭시계 화합물은 디시클로펜타디엔디옥사이드, 시클로헥센옥사이드, 4-비닐-1,2-에폭시-4-비닐시클로헥센, 비닐시클로헥 센디옥사이드, 리모넨모노옥사이드, 리모넨디옥사이드, (3,4-에폭시시클로헥실)메틸-3,4-에폭시시클로헥산카르복실레이트, 3-비닐시클로헥센옥사이드, 비스(2,3-에폭시시클로펜틸)에테르, 비스(3,4-에폭시시클로헥실메틸)아 디페이트, 비스(3,4-에폭시-6-메틸시클로헥실메틸)아디페이트, (3,4-에폭시시클로헥실)메틸알코올, (3,4-에폭시 -6-메틸시클로헥실)메틸-3,4-에폭시-6-메틸시클로헥산카르복실레이트, 에틸렌글리콜비스(3,4-에폭시시클로헥 실)에테르, 3,4-에폭시시클로헥센카르본산 에틸렌글리콜디에스테르, (3,4-에폭시시클로헥실)에틸트리메톡시실란, 다이셀 코포레이션사의 셀록사이드 8000 등을 사용할 수 있다. 이들은 단독으로, 혹은 2종 이상을 조합으로 이용할 수 있다.For example, the alicyclic epoxy compounds include dicyclopentadiene dioxide, cyclohexene oxide, 4-vinyl-1,2-epoxy-4-vinylcyclohexene, vinylcyclohexene dioxide, limonene monoxide, limonene dioxide, (3,4-epoxycyclohexyl)methyl-3,4-epoxycyclohexanecarboxylate, 3-vinylcyclohexene oxide, bis(2,3-epoxycyclopentyl)ether, bis(3,4-epoxycyclohexyl) Methyl)adipate, bis(3,4-epoxy-6-methylcyclohexylmethyl)adipate, (3,4-epoxycyclohexyl)methyl alcohol, (3,4-epoxy-6-methylcyclohexyl)methyl -3,4-Epoxy-6-methylcyclohexanecarboxylate, ethylene glycol bis(3,4-epoxycyclohexyl)ether, 3,4-epoxycyclohexenecarboxylic acid ethylene glycol diester, (3,4- Epoxycyclohexyl)ethyltrimethoxysilane, Celoxide 8000 from Daicel Corporation, etc. can be used. These can be used individually or in combination of two or more types.
본 발명의 일 실시상태에 따르면, 상기 자외선 경화형 잉크 조성물 100 중량부 기준으로, 상기 지환식 에폭시계 화합물의 함량은 10 중량부 이상 40 중량부 이하일 수 있다. 구체적으로, 상기 지환식 에폭시계 화합물의 함량은 상기 자외선 경화형 잉크 조성물 100 중량부 기준으로, 12.5 중량부 이상 37.5 중량부 이하, 15 중량부 이상 35 중량부 이하, 15 중량부 이상 35 중량부 이하, 13 중량부 이상 33 중량부 이하, 15 중량부 이상 40 중량부 이하, 20 중량부 이상 30 중량부 이하, 20 중량부 이상 25 중량부 이하 또는 20 중량부 이상 22.5 중량부 이하일 수 있다. 상기 자외선 경화형 잉크 조성물에 포함된 상기 지환식 에폭시계 화합물의 함량을 전술한 범위로 조절함으로써, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 경화 감도, 저장 안정성 및 분산성을 향상시킬 수 있다. 또한, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 광경화물의 광학밀도, 경도 및 밀착성을 효과적으로 향상시킬 수 있다. 특히, 상기 광경화 조성물에 포함된 상기 지환식 에폭시계 화합물의 함량이 전술한 범위 내인 경우, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 경화 감도가 저하되는 것을 효과적으로 방지할 수 있다.According to one embodiment of the present invention, based on 100 parts by weight of the ultraviolet curable ink composition, the content of the alicyclic epoxy compound may be 10 parts by weight or more and 40 parts by weight or less. Specifically, the content of the alicyclic epoxy compound is 12.5 parts by weight or more and 37.5 parts by weight or less, 15 parts by weight or more and 35 parts by weight or less, 15 parts by weight or more and 35 parts by weight or less, based on 100 parts by weight of the ultraviolet curable ink composition. It may be 13 parts by weight or more and 33 parts by weight or less, 15 parts by weight or more and 40 parts by weight or less, 20 parts by weight or more and 30 parts by weight or less, 20 parts by weight or more and 25 parts by weight or less, or 20 parts by weight or more and 22.5 parts by weight or less. By adjusting the content of the alicyclic epoxy compound contained in the ultraviolet curable ink composition to the above-mentioned range, curing sensitivity, storage stability, and dispersibility of the ultraviolet curable ink composition for forming a bezel pattern can be improved. In addition, the optical density, hardness, and adhesion of the photocurable product of the ultraviolet curable ink composition for forming the bezel pattern can be effectively improved. In particular, when the content of the alicyclic epoxy compound contained in the photocurable composition is within the above-mentioned range, it is possible to effectively prevent the curing sensitivity of the ultraviolet curable ink composition for forming a bezel pattern from being reduced.
본 발명의 일 실시상태에 따르면, 상기 자외선 경화형 잉크 조성물은 비닐 에테르계 화합물을 포함할 수 있다. 구체적으로, 상기 비닐 에테르계 화합물은 탄소수 5 내지 10의 시클로알킬렌에 비닐 에테르기가 결합된 것일 수 있다. 분자 내의 기본 골격이 고리형 알킬인 상기 비닐 에테르계 화합물을 이용함으로써, 경화 감도, 저장 안정성 및 분산성이 우수한 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 구현할 수 있다. 또한, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 경화 후에 우수한 광학밀도, 경도 및 밀착성을 가질 수 있다.According to one embodiment of the present invention, the ultraviolet curable ink composition may include a vinyl ether-based compound. Specifically, the vinyl ether-based compound may be one in which a vinyl ether group is bonded to a cycloalkylene having 5 to 10 carbon atoms. By using the vinyl ether-based compound whose basic skeleton in the molecule is cyclic alkyl, it is possible to implement an ultraviolet curable ink composition for forming a bezel pattern that has excellent curing sensitivity, storage stability, and dispersibility. Additionally, the ultraviolet curable ink composition for forming a bezel pattern may have excellent optical density, hardness, and adhesion after curing.
본 발명의 일 실시상태에 따르면, 상기 비닐 에테르계 화합물은 적어도 하나의 비닐 에테르기를 함유할 수 있다. 구체적으로, 상기 비닐 에테르계 화합물에 함유된 비닐 에테르기의 수는 1 내지 3, 1 내지 2, 또는 2일 수 있다. 상기 비닐 에테르계 화합물은 하기 화학식 3-1로 표시되는 화합물을 포함할 수 있다.According to one embodiment of the present invention, the vinyl ether-based compound may contain at least one vinyl ether group. Specifically, the number of vinyl ether groups contained in the vinyl ether-based compound may be 1 to 3, 1 to 2, or 2. The vinyl ether-based compound may include a compound represented by the following Chemical Formula 3-1.
[화학식 3-1][Formula 3-1]
상기 화학식 3-1에서, R21 및 R22는 각각 독립적으로 단일결합, 또는 직쇄 또는 분지쇄의 탄소수 1 내지 5의 알킬렌일 수 있고, R23은 비닐 에테르기 또는 히드록시기일 수 있고, n4는 0 또는 1 내지 2의 정수일 수 있고, Cy1은 탄소수 5 내지 10의 시클로알킬렌일 수 있다. 구체적으로, R21 및 R22는 각각 독립적으로 단일결합, 직쇄 또는 분지쇄의 탄소수 1 내지 3의 알킬렌, 또는 탄소수 1 내지 2의 알킬렌일 수 있다. n4는 0 또는 1일 수 있고, Cy1은 탄소수 5 내지 8의 시클로알킬렌, 5 내지 6의 시클로알킬렌, 또는 시클로헥실렌일 수 있다.In Formula 3-1, R 21 and R 22 may each independently be a single bond or a straight-chain or branched alkylene having 1 to 5 carbon atoms, R 23 may be a vinyl ether group or a hydroxy group, and n4 is 0. Alternatively, it may be an integer of 1 to 2, and Cy1 may be a cycloalkylene having 5 to 10 carbon atoms. Specifically, R 21 and R 22 may each independently be a single bond, straight-chain or branched alkylene having 1 to 3 carbon atoms, or alkylene having 1 to 2 carbon atoms. n4 may be 0 or 1, and Cy1 may be cycloalkylene with 5 to 8 carbon atoms, cycloalkylene with 5 to 6 carbon atoms, or cyclohexylene.
상기 화학식 3-1로 표시되는 화합물을 포함하는 비닐 에테르계 화합물을 사용함으로써, 경화 감도, 저장 안정성 및 분산성이 우수한 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 구현할 수 있다. 또한, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 경화 후에 우수한 광학밀도, 경도 및 밀착성을 가질 수 있다.By using a vinyl ether-based compound containing the compound represented by Formula 3-1, an ultraviolet curable ink composition for forming a bezel pattern with excellent curing sensitivity, storage stability, and dispersibility can be implemented. Additionally, the ultraviolet curable ink composition for forming a bezel pattern may have excellent optical density, hardness, and adhesion after curing.
또한, 상기 화학식 3-1로 표시되는 화합물은 보다 구체적으로 하기 화학식 3-1a로 표시되는 화합물일 수 있다.Additionally, the compound represented by Formula 3-1 may be more specifically represented by Formula 3-1a below.
[화학식 3-1a][Formula 3-1a]
상기 화학식 3-1a에서 R21 내지 R23은 상기 화학식 3-1에서 정의한 것과 동일할 수 있고, n4는 0 또는 1일 수 있다.In Formula 3-1a, R 21 to R 23 may be the same as defined in Formula 3-1, and n4 may be 0 or 1.
본 발명의 일 실시상태에 따르면, 상기 비닐 에테르계 화합물은, 1개의 비닐 에테르 말단기를 함유하는 제1 비닐 에테르계 화합물 또는 2개 이상의 비닐 에테르 말단기를 함유하는 제2 비닐 에테르계 화합물을 포함할 수 있다. 구체적으로, 상기 제2 비닐 에테르계 화합물은 비닐 에테르 말단기를 2 개 내지 5개, 2 개 내지 3개, 또는 2개 함유할 수 있다. 상기 자외선 경화형 잉크 조성물이 상기 제1 비닐 에테르계 화합물 또는 제2 비닐 에테르계 화합물을 포함하는 경우, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 경화 감도, 저장 안정성 및 분산성을 향상시킬 수 있다. 또한, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 광경화물의 광학밀도, 경도 및 밀착성을 효과적으로 향상시킬 수 있다. 특히, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 경화 감도를 보다 향상시킬 수 있다.According to one embodiment of the present invention, the vinyl ether-based compound includes a first vinyl ether-based compound containing one vinyl ether end group or a second vinyl ether-based compound containing two or more vinyl ether end groups. can do. Specifically, the second vinyl ether-based compound may contain 2 to 5, 2 to 3, or 2 vinyl ether end groups. When the ultraviolet curable ink composition includes the first vinyl ether-based compound or the second vinyl ether-based compound, curing sensitivity, storage stability, and dispersibility of the ultraviolet curable ink composition for forming a bezel pattern can be improved. In addition, the optical density, hardness, and adhesion of the photocurable product of the ultraviolet curable ink composition for forming the bezel pattern can be effectively improved. In particular, the curing sensitivity of the ultraviolet curable ink composition for forming a bezel pattern can be further improved.
본 발명의 일 실시상태에 따르면, 상기 비닐 에테르계 화합물은 하기 화합물 3-1 내지 화합물 3-3 중 적어도 1개의 화합물을 포함할 수 있다. 구체적으로, 상기 비닐 에테르계 화합물은 하기 화합물 3-1을 포함할 수 있다.According to one embodiment of the present invention, the vinyl ether-based compound may include at least one compound among compounds 3-1 to 3-3 below. Specifically, the vinyl ether-based compound may include Compound 3-1 below.
[화합물 3-1][Compound 3-1]
[화합물 3-2][Compound 3-2]
[화합물 3-3][Compound 3-3]
본 발명의 일 실시상태에 따르면, 상기 자외선 경화형 잉크 조성물 100 중량부 기준으로, 상기 비닐 에테르계 화합물의 함량은 10 중량부 이상 60 중량부 이하일 수 있다. 구체적으로, 상기 비닐 에테르계 화합물의 함량은 상기 자외선 경화형 잉크 조성물 100 중량부 기준으로, 10 중량부 이상 60 중량부 이하, 10 중량부 이상 50 중량부 이하, 10 중량부 이상 40 중량부 이하, 10 중량부 이상 35 중량부 이하, 20 중량부 이상 60 중량부 이하, 20 중량부 이상 55 중량부 이하, 20 중량부 이상 45 중량부 이하, 20 중량부 이상 35 중량부 이하, 25 중량부 이상 60 중량부 이하, 25 중량부 이상 55 중량부 이하, 25 중량부 이상 45 중량부 이하, 25 중량부 이상 35 중량부 이하, 26 중량부 이상 31 중량부 이하 또는 27 중량부 이상 31 중량부 이하일 수 있다.According to one embodiment of the present invention, based on 100 parts by weight of the ultraviolet curable ink composition, the content of the vinyl ether-based compound may be 10 parts by weight or more and 60 parts by weight or less. Specifically, the content of the vinyl ether compound is 10 parts by weight or more and 60 parts by weight or less, 10 parts by weight or more and 50 parts by weight or less, 10 parts by weight or more and 40 parts by weight or less, and 10 parts by weight, based on 100 parts by weight of the ultraviolet curable ink composition. Not less than 35 parts by weight but not more than 20 parts by weight, not more than 60 parts by weight, not less than 20 parts by weight but not more than 55 parts by weight, not less than 20 parts by weight but not more than 45 parts by weight, not less than 20 parts by weight but not more than 35 parts by weight, not less than 25 parts by weight but not more than 60 parts by weight parts by weight or less, 25 parts by weight or more and 55 parts by weight or less, 25 parts by weight or more and 45 parts by weight or less, 25 parts by weight or more and 35 parts by weight or less, 26 parts by weight or more and 31 parts by weight or less, or 27 parts by weight or more and 31 parts by weight or less.
상기 자외선 경화형 잉크 조성물에 포함된 상기 비닐 에테르계 화합물의 함량을 전술한 범위로 조절함으로써, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 경화 감도, 저장 안정성 및 분산성을 향상시킬 수 있다. 또한, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 광경화물의 광학밀도, 경도 및 밀착성을 효과적으로 향상시킬 수 있다. 특히, 높은 습도 조건에서 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물이 경화가 진행되지 않거나, 경화 감도가 저하되는 것을 효과적으로 억제할 수 있다.By adjusting the content of the vinyl ether-based compound contained in the ultraviolet curable ink composition to the above-mentioned range, curing sensitivity, storage stability, and dispersibility of the ultraviolet curable ink composition for forming a bezel pattern can be improved. In addition, the optical density, hardness, and adhesion of the photocurable product of the ultraviolet curable ink composition for forming the bezel pattern can be effectively improved. In particular, under high humidity conditions, the ultraviolet curable ink composition for forming a bezel pattern can effectively prevent curing from progressing or a decrease in curing sensitivity.
본 발명의 일 실시상태에 따르면, 상기 자외선 경화형 잉크 조성물은 다이글리시딜 에테르계 화합물을 포함할 수 있다. 상기 다이글리시딜 에테르계 화합물은 에틸렌글리콜다이글리시딜에테르, 폴리에틸렌글리콜다이글리시딜에테르 비스페놀 A 다이글리시딜에테르, 1,4-부탄다이올 다이글리시딜 에테르, 1,6-비스(2,3-에폭시프로폭시)헥산, 4,4'- 비스(2,3- 에폭시프로폭시)비페닐 및 1,4-비스((2,3-에폭시프로폭시)메틸) 사이클로헥산 (CDMDG) 등을 사용할 수 있다. 이들은 단독으로, 혹은 2종 이상을 조합으로 이용할 수 있다. According to one embodiment of the present invention, the ultraviolet curable ink composition may include a diglycidyl ether-based compound. The diglycidyl ether-based compounds include ethylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, bisphenol A diglycidyl ether, 1,4-butanediol diglycidyl ether, and 1,6-bis. (2,3-epoxypropoxy)hexane, 4,4'-bis(2,3-epoxypropoxy)biphenyl and 1,4-bis((2,3-epoxypropoxy)methyl)cyclohexane (CDMDG ), etc. can be used. These can be used individually or in combination of two or more types.
[화학식 4-1][Formula 4-1]
[화학식 4-2][Formula 4-2]
상기 화학식 4-1 및 화학식 4-2에서, R41 내지 R46은 각각 독립적으로 직쇄 또는 분지쇄의 탄소수 1 내지 6의 알킬렌일 수 있고, Cy2는 탄소수 5 내지 10의 시클로알킬렌일 수 있다. 구체적으로, R41 내지 R46은 각각 독립적으로 직쇄 또는 분지쇄의 탄소수 1 내지 4의 알킬렌일 수 있고, Cy2는 탄소수 5 내지 8의 시클로알킬렌, 5 내지 6의 시클로알킬렌, 또는 시클로헥실렌일 수 있다.In Formulas 4-1 and 4-2, R 41 to R 46 may each independently be a straight-chain or branched alkylene having 1 to 6 carbon atoms, and Cy2 may be a cycloalkylene having 5 to 10 carbon atoms. Specifically, R 41 to R 46 may each independently be a linear or branched alkylene having 1 to 4 carbon atoms, and Cy2 is cycloalkylene having 5 to 8 carbon atoms, cycloalkylene having 5 to 6 carbon atoms, or cyclohexylene. It can be.
본 발명의 일 실시상태에 따르면, 상기 다이글리시딜 에테르계 화합물은 하기 화합물 4-1 또는 화합물 4-2의 화합물을 포함할 수 있다. According to one embodiment of the present invention, the diglycidyl ether-based compound may include the following compound 4-1 or compound 4-2.
[화합물 4-1][Compound 4-1]
1,4-부탄다이올 다이글리시딜 에테르1,4-Butanediol diglycidyl ether
CAS No: 2425-79-8CAS No: 2425-79-8
[화합물 4-2][Compound 4-2]
1,4-비스((2,3-에폭시프로폭시)메틸) 사이클로헥산(CDMDG), 1,4-bis((2,3-epoxypropoxy)methyl)cyclohexane (CDMDG),
CAS No: 14228-73-0 CAS No: 14228-73-0
본 발명의 일 실시 상태에 따르면, 상기 자외선 경화형 잉크 조성물 100 중량부 기준으로, 상기 다이글리시딜 에테르계 화합물의 함량은 2.5 중량부 이상 10 중량부 이하, 3 중량부 이상 10 중량부 이하, 4 중량부 이상 10 중량부 이하 또는 5 중량부 이상 10 중량부 이하일 수 있다. According to one embodiment of the present invention, based on 100 parts by weight of the ultraviolet curable ink composition, the content of the diglycidyl ether-based compound is 2.5 parts by weight or more and 10 parts by weight or less, 3 parts by weight or more and 10 parts by weight or less, 4 It may be from 5 parts by weight to 10 parts by weight or less, or from 5 parts by weight to 10 parts by weight.
상기 광경화 조성물에 포함된 상기 다이글리시딜 에테르계 화합물의 함량을 전술한 범위로 조절함으로써, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 대기상태에서의 경화 감도 특성 개선과 고온 고습상태에서의, 두께 감소와 접착력 저하가 없는 우수한 특성을 가지는 무용제형 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 확보할 수 있다.By adjusting the content of the diglycidyl ether-based compound contained in the photocurable composition to the above-mentioned range, the curing sensitivity characteristics of the ultraviolet curable ink composition for forming a bezel pattern are improved in atmospheric conditions and in high temperature and high humidity conditions, It is possible to obtain a solvent-free UV-curable ink composition for forming bezel patterns that has excellent properties without reducing thickness and adhesion.
본 발명의 일 실시상태에 따르면, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 광개시제로서 양이온 개시제 및 라디칼계 개시제를 포함한다. 상기 양이온 개시제는 양이온성 광중합 개시제로서, 광(예를 들어, 자외선) 조사에 의해 양이온(cation) 종이나 브론스테드 산을 형성하는 화합물일 수 있다. 상기 양이온 개시제는 비대칭 구조를 가지는 설폰산염을 포함할 수 있다. 구체적으로, 상기 양이온 개시제는 분자 내에 황(S) 원자를 2개 함유하며, 비대칭 구조를 가지는 페닐계 설폰산염을 포함할 수 있다. 예를 들어, 상기 양이온 개시제는 하기 화합물 5-1를 포함할 수 있다.According to one embodiment of the present invention, the ultraviolet curable ink composition for forming a bezel pattern includes a cationic initiator and a radical-based initiator as a photoinitiator. The cationic initiator is a cationic photopolymerization initiator and may be a compound that forms a cationic species or Bronsted acid when irradiated with light (for example, ultraviolet rays). The cationic initiator may include a sulfonate having an asymmetric structure. Specifically, the cationic initiator contains two sulfur (S) atoms in the molecule and may include a phenyl sulfonate having an asymmetric structure. For example, the cationic initiator may include the following compound 5-1.
[화합물 5-1][Compound 5-1]
상기 비대칭 구조를 가지는 설폰산염을 포함하는 양이온 개시제를 사용함으로써, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 경화 감도, 저장 안정성 및 분산성을 향상시킬 수 있고, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 경화 후에 우수한 광학밀도, 경도 및 밀착성을 가질 수 있다. 상기 양이온 개시제로서 대칭구조를 가지는 설폰산염, 분자 내에 함유된 황의 수가 1개, 또는 3개 이상인 설폰산염, 요오드염을 사용하는 경우, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 경화 감도, 저장 안정성이 저하되고, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 광경화물의 경도, 밀착력, 광학밀도의 물성이 열등한 문제가 발생될 수 있다.By using a cationic initiator containing a sulfonate having the asymmetric structure, the curing sensitivity, storage stability, and dispersibility of the ultraviolet curable ink composition for forming a bezel pattern can be improved, and the ultraviolet curable ink composition for forming a bezel pattern can be After curing, it can have excellent optical density, hardness, and adhesion. When using a cationic initiator such as a sulfonate having a symmetrical structure, a sulfonate containing one or more sulfur in the molecule, or an iodine salt, the curing sensitivity and storage stability of the ultraviolet curable ink composition for forming a bezel pattern are reduced. The photocurable product of the ultraviolet curable ink composition for forming the bezel pattern may have poor hardness, adhesion, and optical density properties.
본 발명의 일 실시상태에 따르면, 상기 양이온 개시제의 함량은 상기 자외선 경화형 잉크 조성물 100 중량부에 대하여, 2 중량부 이상 6 중량부 이하일 수 있다. 구체적으로, 상기 자외선 경화형 잉크 조성물 100 중량부에 대하여, 상기 양이온 개시제의 함량은 3 중량부 이상 6 중량부 이하, 3 중량부 이상 5 중량부 이하, 3 중량부 이상 4 중량부 이하, 4 중량부 이상 5 중량부 이하, 3.5 중량부 이상 5.5 중량부 이하 또는 4 중량부 이상 6 중량부 이하일 수 있다. 상기 양이온 개시제의 함량이 전술한 범위 내인 경우, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 광경화 반응이 안정적으로 수행될 수 있고, 상기 개시제가 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물 내에 석출되어 안정성을 저해하는 것을 방지할 수 있다. 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물 내에 양이온 개시제의 침전물이 생기는 것을 억제할 수 있으며, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 점도가 증가하여 코팅성이 저하되는 것을 방지할 수 있다.According to one embodiment of the present invention, the content of the cationic initiator may be 2 parts by weight or more and 6 parts by weight or less, based on 100 parts by weight of the ultraviolet curable ink composition. Specifically, with respect to 100 parts by weight of the ultraviolet curable ink composition, the content of the cationic initiator is 3 parts by weight or more and 6 parts by weight or less, 3 parts by weight or more and 5 parts by weight or less, 3 parts by weight or more and 4 parts by weight or less, and 4 parts by weight. It may be more than 5 parts by weight or less, 3.5 parts by weight or more and 5.5 parts by weight or less, or 4 parts by weight or more and 6 parts by weight or less. When the content of the cationic initiator is within the above-mentioned range, the photocuring reaction of the ultraviolet curable ink composition for forming a bezel pattern can be stably performed, and the initiator is precipitated in the ultraviolet curable ink composition for forming a bezel pattern to ensure stability. It can prevent interference. Precipitation of the cationic initiator can be prevented from forming in the ultraviolet curable ink composition for forming the bezel pattern, and the viscosity of the ultraviolet curable ink composition for forming the bezel pattern is increased, thereby preventing deterioration of coating properties.
본 발명의 일 실시상태에 따르면, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 라디칼계 개시제를 포함할 수 있다. 상기 라디칼계 개시제는 라디칼계 광중합 개시제를 의미할 수 있다. 상기 라디칼계 개시제는 양이온 개시제의 부족한 반응성을 보완하는 Co-Initiator 역할을 하게 된다. According to one embodiment of the present invention, the ultraviolet curable ink composition for forming a bezel pattern may include a radical-based initiator. The radical-based initiator may refer to a radical-based photopolymerization initiator. The radical-based initiator serves as a Co-Initiator to compensate for the insufficient reactivity of the cationic initiator.
본 발명의 일 실시 상태에 따르면, 상기 자외선 경화형 잉크 조성물 100 중량부 기준으로, 상기 라디칼계 개시제의 함량은 1 중량부 이상 4 중량부 이하일 수 있다. 구체적으로, 상기 자외선 경화형 잉크 조성물 100 중량부에 대하여, 상기 라디칼계 개시제의 함량은 1 중량부 이상 3.5 중량부 이하 또는 1 중량부 이상 3 중량부 이하일 수 있다.According to one embodiment of the present invention, based on 100 parts by weight of the ultraviolet curable ink composition, the content of the radical-based initiator may be 1 part by weight or more and 4 parts by weight or less. Specifically, with respect to 100 parts by weight of the ultraviolet curable ink composition, the content of the radical-based initiator may be 1 part by weight or more and 3.5 parts by weight or less, or 1 part by weight or more and 3 parts by weight or less.
상기 라디칼계 개시제는 양이온 개시제에 더하여 상기 모노머의 중합을 개시 및 상승시키는 역할을 하게 되며, 라디칼계 개시제의 함량이 자외선 경화형 잉크 조성물 100 중량부에 대해 전술한 범위보다 적은 경우에는 반응성이 약하며, 전술한 범위보다 많은 경우에는 반응성이 높아 밀착력 등의 특성 저하 발생 및 용해성에서의 문제가 발생할 가능성이 높다. The radical-based initiator serves to initiate and increase the polymerization of the monomer in addition to the cationic initiator, and when the content of the radical-based initiator is less than the above-mentioned range for 100 parts by weight of the ultraviolet curable ink composition, the reactivity is weak, and the above-mentioned If it is more than one range, the reactivity is high, so there is a high possibility that properties such as adhesion will decrease and problems with solubility will occur.
상기 라디칼계 개시제로는 아실포스핀계 광개시제, 디페닐(2,4,6-트리메틸벤조일)포스핀 옥사이드계 광개시제, 아세토페논계 광개시제 및 α-히드록시케톤계 광개시제등의 광개시제를 적어도 한종류 이상을 사용하는 것이 바람직하다. 구체적인 예로서, 비아세틸, 벤조인, 벤질, 벤조인메틸에테르, 벤조인에틸에테르, 벤조인 아이소프로필에테르, 아세토페논, 2,2-디메톡시-2-페닐아세토페논, 2,2-디에톡시-2-페닐 아세토페논, 1,1-디클로로아세토페논,1-하이드록시시클로헥실페닐케톤, 1-하이드록시-1-메틸에틸-페놀케톤, p-아이소프로필-α-하이드록시아이소부틸페논, N,N-디메틸아미노아세토페논, 2-메틸-1-[4-(메틸티오)페닐]-2-몰포리노프로판-1-온, 에틸-p-디메틸아미노벤조에이트, 2-메틸안트라퀴논, 2-에틸안트라퀴논, 2-t-부틸안트라퀴논, 1-클로로안트라퀴논,2-아밀안트라퀴논, 2-아미노안트라퀴논, 2,4-디메틸티오크산톤, 2-클로로티오크산톤,2,4-디아이소프로필티오크산톤, 아세토페논디메틸케탈, 벤질디메틸케탈, 벤조페논, 메틸 벤조페논, 트리메틸 벤조페논(TZT), 4-벤조일 4'-메틸디페닐 술피드, 4,4'-디클로로벤조페논, 디에틸티오잔톤(DETX), 2-아이소프로필티오잔톤(ITX), 4,4'-비스디에틸아미노벤조페논, 2-메틸-1-[4-(메틸티오)페닐]-2-몰포리노프로판온-1(IRGACURE907), 2-벤질-2-디메틸아미노-1-(4-몰포리노페닐)-부탄온-1(IRGACURE 369), 2-디메틸아미노-2-(4-메틸벤질)-1-(4-몰포리닐페닐)-부탄온1(IRGACURE 379), 비스(2,4,6-트리메틸벤조일)-페닐포스핀옥사이드(IRGACURE 819),2,4,6-트리메틸벤조일디페닐포스핀옥사이드(TPO), 비스(에타 5-2,4-사이클로펜타디엔-1-일)비스[2,6-디플루오로 -3-(1H-피롤-1-일)페닐]티타니움, 2-히드록시-1-{1-[4-(2-히드록시-2-메틸프로피오닐)페닐]-1,3,3-트리메틸인단-5-일}-2-메틸-프로판1-온(2-hydroxy-1-{1-[4-(2-hydroxy-2-methyl-propionyl)-phenyl]-1,3,3-trimethyl-indan-5-yl}-2-methylpropan-1-one) (ESACURE ONE), 1-프로판온, 1-[4-[(4-벤조일페닐)티오]페닐]-2-메틸-2-[(4-메틸페닐)설포닐](1-[4-[(4-benzoylphenyl)thio]phenyl]-2-methyl-2-[(4-methylphenyl)sulphonyl]) (ESACURE 1001M), 비스N,N-[(4-디메틸아미노벤조일)옥시에틸렌-1-일]-메틸아민 (bis-N,N-[(4-dimethylaminobenzoyl)oxyethylen-lyl]-methylamine) 또는 이들의 2종 이상의 혼합물을 사용할 수 있다. 상기 라디칼계 개시제는 하기 화합물 5-2를 포함할 수 있다.The radical-based initiator includes at least one type of photoinitiator such as an acylphosphine-based photoinitiator, diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide-based photoinitiator, acetophenone-based photoinitiator, and α-hydroxyketone-based photoinitiator. It is desirable to use As specific examples, biacetyl, benzoin, benzyl, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxy. -2-phenyl acetophenone, 1,1-dichloroacetophenone, 1-hydroxycyclohexylphenyl ketone, 1-hydroxy-1-methylethyl-phenol ketone, p-isopropyl-α-hydroxyisobutylphenone, N,N-dimethylaminoacetophenone, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one, ethyl-p-dimethylaminobenzoate, 2-methylanthraquinone, 2-Ethylanthraquinone, 2-t-butylanthraquinone, 1-chloroanthraquinone, 2-amylanthraquinone, 2-aminoanthraquinone, 2,4-dimethylthioxanthone, 2-chlorothioxanthone, 2, 4-Diisopropylthioxanthone, acetophenone dimethyl ketal, benzyl dimethyl ketal, benzophenone, methyl benzophenone, trimethyl benzophenone (TZT), 4-benzoyl 4'-methyldiphenyl sulfide, 4,4'-dichloro Benzophenone, diethylthioxanthone (DETX), 2-isopropylthioxanthone (ITX), 4,4'-bisdiethylaminobenzophenone, 2-methyl-1-[4-(methylthio)phenyl]-2 -Morphorinopropanone-1 (IRGACURE907), 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone-1 (IRGACURE 369), 2-dimethylamino-2-(4-methyl Benzyl)-1-(4-morpholinylphenyl)-butanone 1 (IRGACURE 379), bis(2,4,6-trimethylbenzoyl)-phenylphosphine oxide (IRGACURE 819), 2,4,6-trimethyl Benzoyldiphenylphosphine oxide (TPO), bis(eta 5-2,4-cyclopentadien-1-yl)bis[2,6-difluoro-3-(1H-pyrrol-1-yl)phenyl] Titanium, 2-hydroxy-1-{1-[4-(2-hydroxy-2-methylpropionyl)phenyl]-1,3,3-trimethylindan-5-yl}-2-methyl-propane 1 -one (2-hydroxy-1-{1-[4-(2-hydroxy-2-methyl-propionyl)-phenyl]-1,3,3-trimethyl-indan-5-yl}-2-methylpropan-1 -one) (ESACURE ONE), 1-propanone, 1-[4-[(4-benzoylphenyl)thio]phenyl]-2-methyl-2-[(4-methylphenyl)sulfonyl](1-[4 -[(4-benzoylphenyl)thio]phenyl]-2-methyl-2-[(4-methylphenyl)sulphonyl]) (ESACURE 1001M), bisN,N-[(4-dimethylaminobenzoyl)oxyethylene-1- [1] -methylamine (bis-N,N-[(4-dimethylaminobenzoyl)oxyethylen-lyl]-methylamine) or a mixture of two or more types thereof can be used. The radical-based initiator may include the following compound 5-2.
[화합물 5-2][Compound 5-2]
2-Hydroxy-1-(4-(4-(2-hydroxy-2-methylpropionyl)benzyl)phenyl)-2-methylpropan-1-one CAS NO.:474510-57-1 (Omnirad 127D)2-Hydroxy-1-(4-(4-(2-hydroxy-2-methylpropionyl)benzyl)phenyl)-2-methylpropan-1-one CAS NO.:474510-57-1 (Omnirad 127D)
본 발명의 일 실시상태에 따르면, 상기 라디칼계 개시제 및 양이온 개시제의 중량비는 1:1 내지 1:6인 것일 수 있다. 구체적으로, 상기 라디칼계 개시제 및 양이온 개시제의 중량비는 1:1 내지 1:6, 1:1 내지 1:5, 1:1 내지 1:4, 1:1 내지 1:3 또는 1:3 내지 1:4인 것일 수 있다. 상기 자외선 경화형 잉크 조성물에 포함된 상기 라디칼계 개시제 및 양이온 개시제의 중량비가 전술한 범위 내인 경우, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 광경화 반응이 안정적으로 수행될 수 있고, 상기 개시제가 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물 내에 석출되어 안정성을 저해하는 것을 방지할 수 있다. 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물 내에 양이온 개시제의 침전물이 생기는 것을 억제할 수 있으며, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 점도가 증가하여 코팅성이 저하되는 것을 방지할 수 있다.According to one embodiment of the present invention, the weight ratio of the radical-based initiator and the cationic initiator may be 1:1 to 1:6. Specifically, the weight ratio of the radical-based initiator and the cationic initiator is 1:1 to 1:6, 1:1 to 1:5, 1:1 to 1:4, 1:1 to 1:3, or 1:3 to 1. :4. When the weight ratio of the radical-based initiator and the cationic initiator included in the ultraviolet curable ink composition is within the above-mentioned range, the photocuring reaction of the ultraviolet curable ink composition for forming the bezel pattern can be stably performed, and the initiator can be used to form the bezel pattern. It can be prevented from precipitating in the ultraviolet curable ink composition for pattern formation and impairing its stability. Precipitation of the cationic initiator can be prevented from forming in the ultraviolet curable ink composition for forming the bezel pattern, and the viscosity of the ultraviolet curable ink composition for forming the bezel pattern is increased, thereby preventing deterioration of coating properties.
반면, 상기 자외선 경화형 잉크 조성물에 포함된 상기 라디칼계 개시제 및 양이온 개시제의 중량비가 전술한 범위를 벗어나는 경우에는 반응성이 약하거나, 반응성이 높아 밀착력 등의 특성 저하 발생 및 용해성에서의 문제가 발생할 가능성이 높다.On the other hand, if the weight ratio of the radical-based initiator and the cationic initiator included in the ultraviolet curable ink composition is outside the above-mentioned range, the reactivity is weak or the reactivity is high, so there is a possibility that properties such as adhesion may decrease and problems with solubility may occur. high.
본 발명의 일 실시상태에 따르면, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 첨가제를 더 포함할 수 있다. 구체적으로, 상기 첨가제는 증감제, 부착력 증진제, 계면활성제 및 산화방지제 중 적어도 하나를 포함할 수 있다.According to one embodiment of the present invention, the ultraviolet curable ink composition for forming a bezel pattern may further include an additive. Specifically, the additive may include at least one of a sensitizer, an adhesion enhancer, a surfactant, and an antioxidant.
본 발명의 일 실시상태에 따르면, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 첨가제로서 증감제를 포함할 수 있다. 상기 증감제는 광증감제로서 당업계에서 사용되는 것을 이용할 수 있다. 예를 들어, 상기 증감제는 안트라센, 9,10-디부톡시안트라센, 9,10-디메톡시안트라센, 9,10-디에톡시안트라센, 2-에틸9,10-디메톡시안트라센 등의 안트라센계 화합물; 벤조페논, 4,4-비스(디메틸아미노)벤조페논, 4,4-비스(디에틸 아미노)벤조페논, 2,4,6-트리메틸아미노벤조페논, 메틸-o-벤조일벤조에이트, 3,3-디메틸-4-메톡시벤조페논, 3,3,4,4-테트라(t-부틸퍼옥시카보닐)벤조페논 등의 벤조페논계 화합물; 아세토페논; 디메톡시아세토페논, 디에톡시아세토페논, 2-히드록시-2-메틸-1-페닐프로판-1-온, 프로판온 등의 케톤계 화합물; 페릴렌; 9-플로레논, 2- 크로로-9-프로레논, 2-메틸-9-플로레논 등의 플로레논계 화합물; 티옥산톤, 2,4-디에틸 티옥산톤, 2-클로로 티옥산톤, 1-클로로-4-프로필옥시 티옥산톤, 이소프로필티옥산톤(ITX), 디이소프로필티옥산톤 등의 티옥산톤계 화합물; 크산톤, 2-메틸크산톤 등의 크산톤계 화합물; 안트라퀴논, 2-메틸 안트라퀴논, 2-에틸 안트라퀴논, t-부틸 안트라퀴논, 2,6-디클로로-9,10- 안트라퀴논 등의 안트라퀴논계 화합물; 9-페닐아크리딘, 1,7-비스(9-아크리 디닐)헵탄, 1,5-비스(9-아크리디닐펜탄), 1,3-비스(9-아크리디닐)프로판 등의 아크리딘계 화합물; 벤질, 1,7,7- 트리메틸-비시클로[2,2,1]헵탄-2,3-디온, 9,10-펜안트렌퀴논 등의 디카보닐 화합물; 2,4,6-트리메틸벤조일 디페닐포스핀 옥사이드, 비스(2,6-디메톡시벤조일)-2,4,4-트리메틸펜틸 포스핀 옥사이드 등의 포스핀 옥사이드계 화 합물; 메틸-4-(디메틸아미노)벤조에이트, 에틸-4-(디메틸아미노)벤조에이트, 2-n-부톡시에틸-4-(디메틸아미노) 벤조에이트 등의 벤조에이트계 화합물; 2,5-비스(4-디에틸아미노벤잘)시클로펜타논, 2,6-비스(4-디에틸아미노벤 잘)시클로헥사논, 2,6-비스(4-디에틸아미노벤잘)-4-메틸-시클로펜타논 등의 아미노 시너지스트; 3,3-카본닐비닐 -7-(디에틸아미노)쿠마린, 3-(2-벤조티아졸일)-7-(디에틸아미노)쿠마린, 3-벤조일-7-(디에틸아미노)쿠마린, 3- 벤조일-7-메톡시-쿠마린, 10,10-카르보닐비스[1,1,7,7-테트라메틸-2,3,6,7-테트라히드로-1H,5H,11H-C1]-벤조피 라노[6,7,8-ij]-퀴놀리진-11-온 등의 쿠마린계 화합물; 4-디에틸아미노 칼콘, 4-아지드벤잘아세토페논 등의 칼 콘 화합물; 2-벤조일메틸렌; 및 3-메틸-b-나프토티아졸린으로 이루어진 군으로부터 선택되는 1종 이상일 수 있다.According to one embodiment of the present invention, the ultraviolet curable ink composition for forming a bezel pattern may include a sensitizer as an additive. The sensitizer may be a photosensitizer that is used in the industry. For example, the sensitizer includes anthracene-based compounds such as anthracene, 9,10-dibutoxyanthracene, 9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, and 2-ethyl9,10-dimethoxyanthracene; Benzophenone, 4,4-bis(dimethylamino)benzophenone, 4,4-bis(diethylamino)benzophenone, 2,4,6-trimethylaminobenzophenone, methyl-o-benzoylbenzoate, 3,3 -benzophenone-based compounds such as dimethyl-4-methoxybenzophenone and 3,3,4,4-tetra(t-butylperoxycarbonyl)benzophenone; Acetophenone; Ketone-based compounds such as dimethoxyacetophenone, diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, and propanone; perylene; florenone-based compounds such as 9-florenone, 2-chloro-9-florenone, and 2-methyl-9-florenone; Thioxanthone, 2,4-diethyl thioxanthone, 2-chloro thioxanthone, 1-chloro-4-propyloxy thioxanthone, isopropyl thioxanthone (ITX), diisopropyl thioxanthone, etc. Thioxanthone-based compounds; xanthone-based compounds such as xanthone and 2-methylxanthone; Anthraquinone-based compounds such as anthraquinone, 2-methyl anthraquinone, 2-ethyl anthraquinone, t-butyl anthraquinone, and 2,6-dichloro-9,10-anthraquinone; 9-phenylacridine, 1,7-bis(9-acridinyl)heptane, 1,5-bis(9-acridinylpentane), 1,3-bis(9-acridinyl)propane, etc. acridine-based compounds; dicarbonyl compounds such as benzyl, 1,7,7-trimethyl-bicyclo[2,2,1]heptane-2,3-dione, and 9,10-phenanthrenequinone; phosphine oxide-based compounds such as 2,4,6-trimethylbenzoyl diphenylphosphine oxide and bis(2,6-dimethoxybenzoyl)-2,4,4-trimethylpentyl phosphine oxide; Benzoate-based compounds such as methyl-4-(dimethylamino)benzoate, ethyl-4-(dimethylamino)benzoate, and 2-n-butoxyethyl-4-(dimethylamino)benzoate; 2,5-bis(4-diethylaminobenzal)cyclopentanone, 2,6-bis(4-diethylaminobenzal)cyclohexanone, 2,6-bis(4-diethylaminobenzal)-4 -Amino synergists such as methyl-cyclopentanone; 3,3-carbonyl vinyl -7-(diethylamino)coumarin, 3-(2-benzothiazolyl)-7-(diethylamino)coumarin, 3-benzoyl-7-(diethylamino)coumarin, 3 - Benzoyl-7-methoxy-coumarin, 10,10-carbonylbis[1,1,7,7-tetramethyl-2,3,6,7-tetrahydro-1H,5H,11H-C1]-benzo Coumarin-based compounds such as pyrano[6,7,8-ij]-quinolizin-11-one; chalcone compounds such as 4-diethylamino chalcone and 4-azidbenzalacetophenone; 2-benzoylmethylene; and 3-methyl-b-naphthothiazoline.
본 발명의 일 실시상태에 따르면, 상기 증감제의 함량은 상기 자외선 경화형 잉크 조성물 100 중량부에 대하여, 1 중량부 이상 4.5 중량부 이하일 수 있다. 구체적으로, 상기 자외선 경화형 잉크 조성물 100 중량부에 대하여, 상기 증감제의 함량은 1 중량부 이상 4 중량부 이하, 1 중량부 이상 3 중량부 이하 또는 2 중량부 이상 3 중량부 이하일 수 있다. 상기 증감제의 함량을 전술한 범위로 조절함으로써, 경화 감도가 저하되는 것을 방지하여 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 광경화물의 도막 특성을 향상시킬 수 있다. 또한, 상기 증감제가 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물 내에 석출되어 안정성을 저해하는 것을 방지할 수 있다.According to one embodiment of the present invention, the content of the sensitizer may be 1 part by weight or more and 4.5 parts by weight or less, based on 100 parts by weight of the ultraviolet curable ink composition. Specifically, with respect to 100 parts by weight of the ultraviolet curable ink composition, the content of the sensitizer may be 1 part by weight or more and 4 parts by weight or less, 1 part by weight or more and 3 parts by weight or less, or 2 parts by weight or more and 3 parts by weight or less. By adjusting the content of the sensitizer within the above-mentioned range, it is possible to prevent curing sensitivity from decreasing and improve the film properties of the photocured product of the ultraviolet curable ink composition for forming a bezel pattern. In addition, the sensitizer can be prevented from precipitating in the ultraviolet curable ink composition for forming the bezel pattern and impairing its stability.
본 발명의 일 실시상태에 따르면, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 첨가제로서 계면활성제를 포함할 수 있다. 계면활성제를 첨가함으로써, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 표면 장력을 낮추어, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 코팅성을 향상시킬 수 있다. 상기 계면활성제로서 당업계에서 사용되는 것을 이용할 수 있다. 예를 들어, 상기 계면활성제는 DIC(DaiNippon Ink & Chemicals) 사의 Megaface F444, F-475, F-478, F-479, F-484, F-550, F-552, F-553, F-555, F-570, RS-75; 아사히 가라스 사의 Surflon S-111, S-112, S-113, S-121, S-131, S-132, S-141 및 S-145; 스미토모 스리엠 사의 Fluorad FC93, FC-95, FC-98, FC-129, FC-135, FC-170C, FC-430 및 FC-4430; 듀퐁 사의 Zonyl FS-300, FSN, FSN-100 및 FSO 및 BYK사의 BYK-306, BYK-310, BYK-320, BYK-330, BYK-331, BYK-333, BYK-342, BYK-350, BYK-354, BYK-355, BYK-356, BYK-358N, BYK-359, BYK-361N, BYK-381, BYK-370, BYK-371, BYK-378, BYK-388, BYK-392, BYK-394, BYK-399, BYK-3440, BYK-3441, BYKETOL-AQ, BYK-DYNWET 800, BYK-SILCLEAN 3700 및 BYK-UV 3570; 또는 테고 사의 Rad 2100, Rad 2011, Glide 100, Glide 410, Glide 450, Flow 370 및 Flow 425 등으로 이루어진 군에서 선택되는 것을 사용할 수 있다.According to one embodiment of the present invention, the ultraviolet curable ink composition for forming a bezel pattern may include a surfactant as an additive. By adding a surfactant, the surface tension of the ultraviolet curable ink composition for forming a bezel pattern can be lowered, thereby improving the coating properties of the ultraviolet curable ink composition for forming a bezel pattern. As the surfactant, those used in the industry can be used. For example, the surfactant is Megaface F444, F-475, F-478, F-479, F-484, F-550, F-552, F-553, F-555 manufactured by DIC (DaiNippon Ink & Chemicals). , F-570, RS-75; Surflon S-111, S-112, S-113, S-121, S-131, S-132, S-141 and S-145 from Asahi Glass; Fluorad FC93, FC-95, FC-98, FC-129, FC-135, FC-170C, FC-430 and FC-4430 from Sumitomo 3M; Zonyl FS-300, FSN, FSN-100 and FSO from Dupont and BYK-306, BYK-310, BYK-320, BYK-330, BYK-331, BYK-333, BYK-342, BYK-350 and BYK from BYK. -354, BYK-355, BYK-356, BYK-358N, BYK-359, BYK-361N, BYK-381, BYK-370, BYK-371, BYK-378, BYK-388, BYK-392, BYK-394 , BYK-399, BYK-3440, BYK-3441, BYKETOL-AQ, BYK-DYNWET 800, BYK-SILCLEAN 3700 and BYK-UV 3570; Alternatively, one selected from the group consisting of Tego's Rad 2100, Rad 2011, Glide 100, Glide 410, Glide 450, Flow 370 and Flow 425 can be used.
본 발명의 일 실시상태에 따르면, 상기 계면활성제의 함량은 상기 자외선 경화형 잉크 조성물 100 중량부에 대하여, 0.1 중량부 이상 5 중량부 이하, 0.1 중량부 이상 3 중량부 이하, 0.1 중량부 이상 1 중량부 이하, 0.2 중량부 이상 5 중량부 이하, 0.2 중량부 이상 3 중량부 이하, 0.2 중량부 이상 1 중량부 이하 또는 0.2 중량부 이상 0.5 중량부 이하일 수 있다. 상기 계면활성제의 함량을 전술한 범위로 조절함으로써, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 표면장력을 효과적으로 낮추어 기재에 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 효과적으로 코팅할 수 있다. 또한, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 상용성 및 소포성이 감소되는 것을 방지할 수 있다.According to one embodiment of the present invention, the content of the surfactant is 0.1 part by weight to 5 parts by weight, 0.1 to 3 parts by weight, and 0.1 to 1 part by weight, based on 100 parts by weight of the ultraviolet curable ink composition. parts or less, 0.2 parts by weight or more and 5 parts by weight or less, 0.2 parts by weight or more and 3 parts by weight or less, 0.2 parts by weight or more and 1 part by weight or less, or 0.2 parts by weight or more and 0.5 parts by weight or less. By adjusting the content of the surfactant to the above-mentioned range, the surface tension of the ultraviolet curable ink composition for forming a bezel pattern can be effectively lowered and the substrate can be effectively coated with the ultraviolet curable ink composition for forming a bezel pattern. In addition, it is possible to prevent the compatibility and anti-foaming properties of the ultraviolet curable ink composition for forming the bezel pattern from being reduced.
본 발명의 일 실시상태에 따르면, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 첨가제로서 부착력 증진제를 포함할 수 있다. 부착력 증진제를 첨가함으로써, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 광경화물이 기재에서 박리되는 것을 효과적으로 방지할 수 있다. 상기 부착력 증진제는 실란계 화합물을 포함할 수 있다. 상기 부착력 증진제로 사용될 수 있는 상기 실란계 화합물은 예를 들어, 알콕시 실란계 화합물, 에폭시 실란계 화합물, 아미노페닐 실란계 화합물, 아미노 실란계 화합물, 메르캅토 실란계 화합물 및 비닐 실란계 화합물 중 어느 하나를 포함할 수 있다. 구체적으로, 상기 부착력 증진제는 3-글리시독시프로필 트리메톡시실란, 3-글리시독시프로필 메틸디메톡시실란, 2-(3,4 에폭시사이클로헥실)에틸트리메톡시실란, 3-글리시독시프로필 메틸디에톡시실란, 3-글리시독시프로필 트리에톡시실란 및 3-메타크릴옥시프로필 트리메톡시실란 중 적어도 하나를 포함할 수 있다. 다만, 상기 부착력 증진제의 종류를 한정하는 것은 아니고, 상기 부착력 증진제는 포스페이트계 아크릴레이트 화합물을 포함할 수도 있다.According to one embodiment of the present invention, the ultraviolet curable ink composition for forming a bezel pattern may include an adhesion enhancer as an additive. By adding an adhesion enhancer, it is possible to effectively prevent the photocured product of the ultraviolet curable ink composition for forming a bezel pattern from peeling off from the substrate. The adhesion enhancer may include a silane-based compound. The silane-based compound that can be used as the adhesion enhancer is, for example, any one of an alkoxy silane-based compound, an epoxy silane-based compound, an aminophenyl silane-based compound, an amino silane-based compound, a mercapto silane-based compound, and a vinyl silane-based compound. may include. Specifically, the adhesion promoter is 3-glycidoxypropyl trimethoxysilane, 3-glycidoxypropyl methyldimethoxysilane, 2-(3,4 epoxycyclohexyl)ethyltrimethoxysilane, 3-glycidoxy It may include at least one of propyl methyldiethoxysilane, 3-glycidoxypropyl triethoxysilane, and 3-methacryloxypropyl trimethoxysilane. However, the type of the adhesion enhancer is not limited, and the adhesion enhancer may include a phosphate-based acrylate compound.
본 발명의 일 실시상태에 따르면, 상기 부착력 증진제의 함량은 상기 자외선 경화형 잉크 조성물 100 중량부에 대하여, 1 중량부 이상 10 중량부 이하, 3 중량부 이상 7 중량부 이하 또는 5 중량부 이상 7 중량부 이하일 수 있다. 상기 부착력 증진제의 함량이 전술한 범위 내인 경우, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 광경화물이 기재에서 박리되는 것을 효과적으로 방지할 수 있다. 또한, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 점도가 상승하는 것과 분산성이 저하되는 것을 억제할 수 있다.According to one embodiment of the present invention, the content of the adhesion promoter is 1 part by weight to 10 parts by weight, 3 to 7 parts by weight, or 5 to 7 parts by weight, based on 100 parts by weight of the ultraviolet curable ink composition. It may be less than 100%. When the content of the adhesion enhancer is within the above-mentioned range, it is possible to effectively prevent the photocured product of the ultraviolet curable ink composition for forming a bezel pattern from peeling off from the substrate. In addition, it is possible to suppress an increase in viscosity and a decrease in dispersibility of the ultraviolet curable ink composition for forming a bezel pattern.
본 발명의 일 실시상태에 따르면, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 첨가제로서 산화방지제를 포함할 수 있다. 상기 산화방지제로서 당업계에서 사용되는 것을 제한 없이 이용할 수 있다. 상기 산화방지제의 함량은 상기 자외선 경화형 잉크 조성물 100 중량부에 대하여, 0.01 중량부 이상 0.2 중량부 이하, 0.01 중량부 이상 0.1 중량부 이하, 0.01 중량부 이상 0.07 중량부 이하, 0.03 중량부 이상 0.07 중량부 이하 또는 0.05 중량부 이상 0.1 중량부 이하일 수 있다. 상기 산화방지제의 함량을 전술한 범위로 조절함으로써, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 광경화물이 산화되는 것을 효과적으로 방지하여, 장기 신뢰성을 보다 향상시킬 수 있다.According to one embodiment of the present invention, the ultraviolet curable ink composition for forming a bezel pattern may include an antioxidant as an additive. As the antioxidant, those used in the industry can be used without limitation. The content of the antioxidant is 0.01 to 0.2 parts by weight, 0.01 to 0.1 parts by weight, 0.01 to 0.07 parts by weight, 0.03 to 0.07 parts by weight, based on 100 parts by weight of the ultraviolet curable ink composition. It may be less than or equal to 0.05 parts by weight and less than or equal to 0.1 parts by weight. By adjusting the content of the antioxidant within the above-described range, oxidation of the photocured product of the ultraviolet curable ink composition for forming a bezel pattern can be effectively prevented, thereby further improving long-term reliability.
한편, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물에 포함되는 첨가제의 종류를 전술한 것으로 한정하는 것은 아니고, 요구되는 물성이 저해되지 않는 범위 내에서 당업계에서 이용되는 기타 첨가제를 더 포함할 수 있다.Meanwhile, the types of additives included in the ultraviolet curable ink composition for forming a bezel pattern are not limited to those described above, and other additives used in the art may be further included within a range that does not impair the required physical properties.
본 발명의 일 실시상태에 따르면, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 25 ℃에서의 점도가 3 cP 이상 30 cP 이하일 수 있다. 구체적으로, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 25 ℃에서의 점도가 3 cP 이상 25 cP 이하, 3 cP 이상 20 cP 이하, 5 cP 이상 25 cP 이하, 5 cP 이상 20 cP 이하, 10 cP 이상 30 cP 이하, 10 cP 이상 20 cP 이하, 14 cP 이상 30 cP 이하, 14 cP 이상 25 cP 이하 또는 14 cP 이상 20 cP 이하 일 수 있다. 전술한 범위의 점도를 가지는 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 도포성이 우수하여 잉크젯 토출성이 우수하며, 가공성이 우수할 수 있다. 구체적으로, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 점도가 전술한 범위 내인 경우, 잉크젯 공정에 적합할 수 있고, 공정 온도에서의 토출이 양호할 수 있다. 상기 공정 온도는 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 점도가 낮아지도록 가열한 온도를 의미하며, 10 ℃ 이상 100 ℃ 이하 또는 20 ℃ 이상 70 ℃ 이하일 수 있다.According to one embodiment of the present invention, the ultraviolet curable ink composition for forming a bezel pattern may have a viscosity of 3 cP or more and 30 cP or less at 25°C. Specifically, the ultraviolet curable ink composition for forming a bezel pattern has a viscosity at 25°C of 3 cP or more and 25 cP or less, 3 cP or more and 20 cP or less, 5 cP or more and 25 cP or less, 5 cP or more and 20 cP or less, and 10 cP or more. It may be 30 cP or less, 10 cP or more and 20 cP or less, 14 cP or more and 30 cP or less, 14 cP or more and 25 cP or less, or 14 cP or more and 20 cP or less. The ultraviolet curable ink composition for forming a bezel pattern having a viscosity in the above-described range may have excellent applicability, excellent inkjet ejection properties, and excellent processability. Specifically, when the viscosity of the ultraviolet curable ink composition for forming a bezel pattern is within the above-mentioned range, it may be suitable for an inkjet process and may have good ejection at the process temperature. The process temperature refers to a temperature at which the ultraviolet curable ink composition for bezel pattern formation is heated to lower the viscosity, and may be 10°C or higher and 100°C or lower, or 20°C or higher and 70°C or lower.
본 발명의 일 실시상태에 따르면, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 블랙 패턴 형성용 잉크일 수 있다. 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 전술한 조성을 가짐으로써, 블랙 패턴 형성 시에 양호한 도포성을 가지며, 광경화 후에 얇은 두께에서도 차광 특성이 우수할 수 있다. 또한, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 경화 감도가 우수하여, 질소 충진 등의 외부 안정화 조건이 없는 대기 조건에서 UV 광경화를 통해 용이하게 블랙 패턴을 형성할 수 있고, 형성된 블랙 패턴에 표면 주름이 발생되는 것을 효과적으로 억제하여, 품질이 우수한 블랙 패턴을 구현할 수 있다.According to one embodiment of the present invention, the ultraviolet curable ink composition for forming a bezel pattern may be an ink for forming a black pattern. By having the above-mentioned composition, the ultraviolet curable ink composition for forming a bezel pattern has good applicability when forming a black pattern, and can have excellent light blocking properties even at a thin thickness after photocuring. In addition, the ultraviolet curable ink composition for forming a bezel pattern has excellent curing sensitivity, so that a black pattern can be easily formed through UV photocuring in atmospheric conditions without external stabilization conditions such as nitrogen filling, and the formed black pattern has a surface By effectively suppressing the occurrence of wrinkles, a high-quality black pattern can be realized.
본 발명의 일 실시상태는 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 경화물을 포함하는 블랙 패턴을 제공한다.One embodiment of the present invention provides a black pattern including a cured product of the ultraviolet curable ink composition for forming a bezel pattern.
상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 이용하여 상기 블랙 패턴을 형성하기 위하여, 당업계에서 이용되는 방법을 통해 수행될 수 있다. 예를 들어, 기판에 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 잉크젯 프린팅하여 블랙 패턴을 형성하는 단계; 및 상기 블랙 패턴에 자외선을 조사하여 경화하는 단계;를 포함하는 방법을 통해, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 이용하여 상기 블랙 패턴을 형성할 수 있다.In order to form the black pattern using the ultraviolet curable ink composition for forming the bezel pattern, it can be performed through a method used in the art. For example, forming a black pattern by inkjet printing the ultraviolet curable ink composition for forming a bezel pattern on a substrate; and curing the black pattern by irradiating ultraviolet rays. The black pattern can be formed using the ultraviolet curable ink composition for forming the bezel pattern.
본 발명의 일 실시상태에 따르면, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 잉크젯 프린팅 직후에 짧은 시간 내에 퍼질 수 있어 우수한 도막 특성을 나타내며, 경화되어 우수한 접착 특성을 나타낼 수 있다. 이에, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 이용하여 블랙 패턴 형성 시에, 잉크젯 프린팅과 동시에 경화가 가능하도록 잉크젯 헤드 바로 뒤에 광원(예를 들어, UV-lamp)를 설치하는 것이 바람직할 수 있다.According to one embodiment of the present invention, the ultraviolet curable ink composition for forming a bezel pattern can spread within a short time immediately after inkjet printing, exhibiting excellent film properties, and can be cured to exhibit excellent adhesive properties. Therefore, when forming a black pattern using the ultraviolet curable ink composition for forming a bezel pattern, it may be desirable to install a light source (e.g., UV-lamp) immediately behind the inkjet head to enable curing at the same time as inkjet printing. .
본 발명의 일 실시상태에 따르면, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 광경화하기 위하여, 250 nm 이상 450 m 이하의 파장 범위를 가지는 광을 500 mJ/mm2 이상 5,000 mJ/mm2 이하의 총 노광량으로 조사할 수 있다. 구체적으로, 상기 360 nm 내지 410 nm의 파장 범위를 가지는 광을 500 mJ/mm2 이상 5,000 mJ/mm2 이하, 500 mJ/mm2 이상 4,000 mJ/mm2 이하, 500 mJ/mm2 이상 3,000 mJ/mm2 이하, 1,000 mJ/mm2 이상 5,000 mJ/mm2 이하, 1,000 mJ/mm2 이상 4,000 mJ/mm2 이하, 1,000 mJ/mm2 이상 3,000 mJ/mm2 이하 또는 2,000 mJ/mm2 이상 3,000 mJ/mm2 이하의 총 노광량으로 조사하여, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 광경화할 수 있다.According to an exemplary embodiment of the present invention, in order to photocure the ultraviolet curable ink composition for forming a bezel pattern, light having a wavelength range of 250 nm to 450 m is used at 500 mJ/mm 2 or more and 5,000 mJ/mm 2 or less. It can be investigated based on the total exposure amount. Specifically, the light having a wavelength range of 360 nm to 410 nm is 500 mJ/mm 2 or more and 5,000 mJ/mm 2 or less, 500 mJ/mm 2 or more and 4,000 mJ/mm 2 or less, and 500 mJ/mm 2 or more and 3,000 mJ. /mm 2 or less, 1,000 mJ/mm 2 or more 5,000 mJ/mm 2 or less, 1,000 mJ/mm 2 or more 4,000 mJ/mm 2 or less, 1,000 mJ/mm 2 or more 3,000 mJ/mm 2 or less or 2,000 mJ/mm 2 or more The ultraviolet curable ink composition for forming a bezel pattern can be photocured by irradiating with a total exposure dose of 3,000 mJ/mm 2 or less.
본 발명의 일 실시상태에 따르면, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 광경화물을 포함하는 블랙 패턴은, 연필 경도 테스트 결과 1B 이상의 연필 경도를 나타낼 수 있다. 구체적으로, 상기 블랙 패턴은 1H 이상 또는 F 이상의 연필 경도를 나타낼 수 있다. 또한, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 광경화물을 포함하는 블랙 패턴은, 크로컷 테스트 결과, 4B 이상의 밀착력(떨어진 면이 총 면적 대비 5 % 미만)을 나타낼 수 있다. 즉, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 광경화물을 포함하는 블랙 패턴은 경도 및 기판에 대한 부착력(밀착력)이 우수할 수 있다. 또한, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 광경화물을 포함하는 블랙 패턴은 내열 특성 평가 및 신뢰성 평가시 두께변화율이 5 % 미만일 수 있다.According to one embodiment of the present invention, the black pattern containing the photocured product of the ultraviolet curable ink composition for forming the bezel pattern may exhibit a pencil hardness of 1B or higher as a result of a pencil hardness test. Specifically, the black pattern may represent a pencil hardness of 1H or higher or F or higher. In addition, the black pattern containing the photocured product of the ultraviolet curable ink composition for forming the bezel pattern may exhibit an adhesion of 4B or more (the separated surface is less than 5% of the total area) as a result of a crocut test. That is, the black pattern containing the photocured product of the ultraviolet curable ink composition for forming the bezel pattern may have excellent hardness and excellent adhesion to the substrate. In addition, the black pattern containing the photocured product of the ultraviolet curable ink composition for forming the bezel pattern may have a thickness change rate of less than 5% when evaluating heat resistance properties and reliability.
본 발명의 일 실시상태는 상기 블랙 패턴을 포함하는 디스플레이 기판을 제공한다. 전술한 바와 같이, 상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 광경화물을 포함하는 상기 블랙 패턴은 표면 품질이 우수하고, 기판과의 밀착성(부착성)이 우수하며, 얇은 두께에서도 광학밀도가 우수하여, 상기 블랙 패턴을 포함하는 디스플레이 기판은 우수한 품질을 가질 수 있다. 이에, 상기 디스플레이 기판을 사용하여, 영상 품질 등이 우수한 디스플레이 장치를 구현할 수 있다.One embodiment of the present invention provides a display substrate including the black pattern. As described above, the black pattern containing the photocured product of the ultraviolet curable ink composition for forming the bezel pattern has excellent surface quality, excellent adhesion to the substrate, and excellent optical density even at a thin thickness. , a display substrate including the black pattern may have excellent quality. Accordingly, a display device with excellent image quality, etc. can be implemented using the display substrate.
이하, 본 발명을 구체적으로 설명하기 위해 실시예를 들어 상세하게 설명하기로 한다. 그러나, 본 발명에 따른 실시예들은 여러 가지 다른 형태로 변형될 수 있으며, 본 발명의 범위가 아래에서 기술하는 실시예들에 한정되는 것으로 해석되지 않는다. 본 명세서의 실시예들은 당업계에서 평균적인 지식을 가진 자에게 본 발명을 보다 완전하게 설명하기 위해 제공되는 것이다.Hereinafter, the present invention will be described in detail with reference to examples. However, the embodiments according to the present invention may be modified into various other forms, and the scope of the present invention should not be construed as being limited to the embodiments described below. The embodiments of this specification are provided to more completely explain the present invention to those skilled in the art.
화합물compound
1) 흑색안료: CB-221) Black pigment: CB-22
2) 분산제:2) Dispersant:
- 우레탄 type: Disperbyk160(빅크케미사 제조)- Urethane type: Disperbyk160 (manufactured by Big Chemistry)
3) 옥세탄계 화합물:3) Oxetane-based compounds:
- 화합물 1-1 (비스[1-에틸(3-옥세타닐)]메틸에테르; OXT-221; 토아고세이 제조)- Compound 1-1 (bis [1-ethyl (3-oxetanyl)] methyl ether; OXT-221; manufactured by Toagosei)
4) 지환식 에폭시계 화합물:4) Alicyclic epoxy compounds:
- 화합물 2-1 ((3',4'-에폭시사이클로헥산)메틸-3,4-에폭시사이클로헥실 카복실레이트; Celloxide 2021P; 다이셀 제조)- Compound 2-1 ((3',4'-epoxycyclohexane)methyl-3,4-epoxycyclohexyl carboxylate; Celloxide 2021P; manufactured by Daicel)
5) 비닐 에테르계 화합물:5) Vinyl ether compounds:
- 화합물 3-1 (사이클로헥실비닐에테르; CHVE; BASF 제조)- Compound 3-1 (cyclohexyl vinyl ether; CHVE; manufactured by BASF)
6) 다이글리시딜 에테르계 화합물:6) Diglycidyl ether-based compounds:
- 화합물 4-2 (1,4-사이클로헥산디메탄올 다이글리시딜 에테르; CDMDG; Showa denko제조)- Compound 4-2 (1,4-cyclohexanedimethanol diglycidyl ether; CDMDG; manufactured by Showa Denko)
6) 광개시제 (양이온 개시제):6) Photoinitiator (cationic initiator):
- 화합물 5-1 (4-(페닐티오)페닐디페닐설포늄트리스(펜타플루오로에틸) 트리 플루오로 포스페이트; CPI-210S; SanApro 제조)- Compound 5-1 (4-(phenylthio)phenyldiphenylsulfonium tris(pentafluoroethyl)trifluorophosphate; CPI-210S; manufactured by SanApro)
7) 증감제: 7) Sensitizer:
- UVS-1331 (9,10-다이부톡시 안트라센; Kawasaki Chemical 제조)- UVS-1331 (9,10-dibutoxyanthracene; manufactured by Kawasaki Chemical)
8) 라디칼계 개시제 (Co-initiator):8) Radical-based initiator (Co-initiator):
- 화합물 5-2 Omnirad 127D (2-하이드록시-1-[4-[4-(2-하이드록시-2-메틸프로피오닐)벤질]페닐]-2-2메틸프로판-1-온; IGM Resins 제조)- Compound 5-2 Omnirad 127D (2-hydroxy-1-[4-[4-(2-hydroxy-2-methylpropionyl)benzyl]phenyl]-2-2methylpropan-1-one; IGM Resins manufacturing)
9) 부착력 증진제: KBM-403 (3-글리시독시프로필 트리메톡시실란; Shinetsu 제조)9) Adhesion enhancer: KBM-403 (3-glycidoxypropyl trimethoxysilane; manufactured by Shinetsu)
10) 계면활성제: F-554 (DIC사 제조)10) Surfactant: F-554 (manufactured by DIC)
11) 산화방지제: BHT (Junsei사 제조)11) Antioxidant: BHT (manufactured by Junsei)
실시예Example
실시예 1Example 1
고내열성 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 제조Preparation of ultraviolet curable ink composition for forming highly heat-resistant bezel patterns
흑색안료로서 CB-22, 분산제로서 우레탄 type Disperbyk160, 옥세탄계 화합물로서 화합물 OXT-221, 지환식 에폭시계 화합물로서 화합물 (2021P), 비닐 에테르계 화합물로서 (CHVE), 다이글리시딜 에테르계 화합물로서 화합물 (CDMDG), 광개시제(양이온 개시제)로서 (CPI-210S), 증감제로서 UVS-1331, Co-initiator(라디칼계 광개시제)로서 Omnirad 127D, 부착력 증진제로서 KBM-403, 계면활성제로서 F-554, 산화방지제로서 BHT을 상온에서 6 시간 동안 교반하여 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 제조하였다.CB-22 as a black pigment, urethane type Disperbyk160 as a dispersant, compound OXT-221 as an oxetane-based compound, compound (2021P) as an alicyclic epoxy-based compound, (CHVE) as a vinyl ether-based compound, and diglycidyl ether-based compound. Compound (CDMDG), (CPI-210S) as a photoinitiator (cationic initiator), UVS-1331 as a sensitizer, Omnirad 127D as a co-initiator (radical photoinitiator), KBM-403 as an adhesion enhancer, F-554 as a surfactant, An ultraviolet curable ink composition for forming a bezel pattern was prepared by stirring BHT as an antioxidant for 6 hours at room temperature.
이때, 광경화 조성물 100 중량부에 대하여, 흑색안료의 함량은 11 중량부, 분산제의 함량은 2.75 중량부, 옥세탄계 화합물의 함량은 15 중량부, 지환식 에폭시계 화합물의 함량은 21 중량부, 비닐 에테르계 화합물의 함량은 31 중량부, 다이글리시딜 에테르계 화합물의 함량은 5 중량부, 광개시제(양이온 개시제)의 함량은 4 중량부, Co-initiator(라디칼계 광개시제)의 함량은 1 중량부, 증감제의 함량은 3 중량부, 부착력 증진제의 함량은 6 중량부, 계면활성제의 함량은 0.2 중량부, 산화방지제의 함량은 0.05 중량부이었다.At this time, based on 100 parts by weight of the photocurable composition, the content of the black pigment is 11 parts by weight, the content of the dispersant is 2.75 parts by weight, the content of the oxetane compound is 15 parts by weight, the content of the alicyclic epoxy compound is 21 parts by weight, The content of the vinyl ether compound is 31 parts by weight, the content of the diglycidyl ether compound is 5 parts by weight, the content of the photoinitiator (cationic initiator) is 4 parts by weight, and the content of the co-initiator (radical photoinitiator) is 1 part by weight. The content of the sensitizer was 3 parts by weight, the content of the adhesion enhancer was 6 parts by weight, the content of the surfactant was 0.2 parts by weight, and the content of the antioxidant was 0.05 parts by weight.
실시예 2 내지 실시예 5Examples 2 to 5
하기 표 1과 같이 조성을 조절한 것을 제외하고, 상기 실시예 1과 동일한 방법으로 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 제조하였다.An ultraviolet curable ink composition for forming a bezel pattern was prepared in the same manner as in Example 1, except that the composition was adjusted as shown in Table 1 below.
| 고내열성 베젤 패턴 형성용 자외선 경화형 잉크 조성물Ultraviolet curable ink composition for forming highly heat-resistant bezel patterns | 실시예 1Example 1 | 실시예 2Example 2 | 실시예 3Example 3 | 실시예 4Example 4 | 실시예 5Example 5 | ||
| 흑색안료black pigment | CB-22CB-22 | 1111 | 99 | 1111 | 1111 | 1111 | |
| 분산제dispersant | 우레탄 typeUrethane type | 2.752.75 | 2.252.25 | 2.752.75 | 2.752.75 | 2.752.75 | |
| 옥세탄계 화합물Oxetane-based compounds | OXT-221OXT-221 | 1515 | 2222 | 1515 | 1515 | 1515 | |
| 지환식 에폭시계 화합물Alicyclic epoxy compounds | 2021P2021P | 2121 | 2121 | 2121 | 2121 | 2121 | |
| 비닐 에테르계 화합물vinyl ether compounds | CHVECHVE | 3131 | 27.527.5 | 2626 | 3030 | 2929 | |
| 다이글리시딜 에테르계 화합물Diglycidyl ether compounds | CDMDGCDMDG | 55 | 55 | 1010 | 55 | 55 | |
| 광개시제photoinitiator | 양이온개시제Cationic initiator | CPI-210SCPI-210S | 44 | 33 | 44 | 33 | 66 |
| 라디칼개시제radical initiator | Omnirad 127DOmnirad 127D | 1One | 1One | 1One | 33 | 1One | |
| 첨가제additive | 증감제sensitizer | UVS-1331UVS-1331 | 33 | 33 | 33 | 33 | 33 |
| 부착력증진제Adhesion enhancer | KBM-403KBM-403 | 66 | 66 | 66 | 66 | 66 | |
| 계면활성제Surfactants | F-554F-554 | 0.20.2 | 0.20.2 | 0.20.2 | 0.20.2 | 0.20.2 | |
| 산화방지제antioxidant | BHTBHT | 0.050.05 | 0.050.05 | 0.050.05 | 0.050.05 | 0.050.05 | |
비교예 1 내지 비교예 6Comparative Examples 1 to 6
하기 표 2와 같이 조성을 조절한 것을 제외하고, 상기 실시예 1과 동일한 방법으로 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 제조하였다.An ultraviolet curable ink composition for forming a bezel pattern was prepared in the same manner as Example 1, except that the composition was adjusted as shown in Table 2 below.
| 고내열성 베젤 패턴 형성용 자외선 경화형 잉크 조성물Ultraviolet curable ink composition for forming highly heat-resistant bezel patterns | 비교예 1Comparative Example 1 | 비교예 2Comparative Example 2 | 비교예 3Comparative Example 3 | 비교예 4Comparative Example 4 | 비교예 5Comparative Example 5 | 비교예 6Comparative Example 6 | ||
| 흑색안료black pigment | CB-22CB-22 | 1111 | 1111 | 1111 | 1111 | 1111 | 1111 | |
| 분산제dispersant | 우레탄 typeUrethane type | 2.752.75 | 2.752.75 | 2.752.75 | 2.752.75 | 2.752.75 | 2.752.75 | |
| 옥세탄계 화합물Oxetane-based compounds | OXT-221OXT-221 | 1515 | 1515 | 1515 | 1515 | 3030 | 1515 | |
| 에폭시계 화합물Epoxy-based compounds | 2021P2021P | 2121 | 2121 | 2121 | 2121 | 2121 | 2121 | |
|
비닐 에테르계 화합물Vinyl ether type compound |
CHVECHVE | 3636 | 2121 | 3232 | 2626 | 1616 | 2727 | |
| 다이글리시딜 에테르계 화합물Diglycidyl ether compounds | CDMDGCDMDG | -- | 1515 | 55 | 55 | 55 | 55 | |
| 광개시제photoinitiator | 양이온개시제Cationic initiator | CPI-210SCPI-210S | 44 | 44 | 44 | 44 | 44 | 88 |
| 라디칼개시제radical initiator | Omnirad 127DOmnirad 127D | 1One | 1One | -- | 66 | 1One | 1One | |
| 첨가제additive | 증감제sensitizer | UVS-1331UVS-1331 | 33 | 33 | 33 | 33 | 33 | 33 |
| 부착력증진제Adhesion enhancer | KBM-403KBM-403 | 66 | 66 | 66 | 66 | 66 | 66 | |
| 계면활성제Surfactants | F-554F-554 | 0.20.2 | 0.20.2 | 0.20.2 | 0.20.2 | 0.20.2 | 0.20.2 | |
| 산화방지제antioxidant | BHTBHT | 0.050.05 | 0.050.05 | 0.050.05 | 0.050.05 | 0.050.05 | 0.050.05 | |
상기 표 1 내지 표 2에서 기재된 성분들의 함량(중량부)은 베젤 패턴 형성용 자외선 경화형 잉크 조성물 100 중량부에 대한 함량이다.The content (parts by weight) of the components listed in Tables 1 and 2 is the content per 100 parts by weight of the ultraviolet curable ink composition for forming a bezel pattern.
실험예Experiment example
점도 측정Viscosity measurement
상기 실시예 1에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물에 대하여, 상온(25 ℃) 조건에서 Cone Spindle(CPA-40Z)로 Brookfield viscometer을 이용하여 조성물의 점도를 측정하였고, 그 결과를 하기 표 3에 나타내었다.With respect to the ultraviolet curable ink composition for forming a bezel pattern prepared in Example 1, the viscosity of the composition was measured using a Brookfield viscometer with a Cone Spindle (CPA-40Z) at room temperature (25°C), and the results are shown in the table below. It is shown in 3.
실시예 2 내지 실시예 5에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물에 대해서도 동일한 방법으로 점도를 측정하였고, 하기 표 3에 나타내었다.The viscosity of the ultraviolet curable ink compositions for forming bezel patterns prepared in Examples 2 to 5 was measured in the same manner and is shown in Table 3 below.
비교예 1 내지 비교예 6에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물에 대해서도 동일한 방법으로 점도를 측정하였고, 하기 표 4에 나타내었다.The viscosity of the ultraviolet curable ink compositions for forming bezel patterns prepared in Comparative Examples 1 to 6 was measured in the same manner and is shown in Table 4 below.
경화 감도 평가Curing sensitivity evaluation
상기 실시예 1에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 유리 기판 (5X5 cm)에 스포이드로 도포하고, 두께 3 ㎛가 되도록 약 3,000 rpm의 회전 속도로 스핀코팅을 실시하였다. 그런 다음, UV 조사장치(395 nm UV LED)를 이용하여 총 노광량이 2000 mJ/㎠의 자외선을 조사하여, 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 경화하였다. 노광량의 측정은 조도계를 이용하여 측정 계산하였다. The ultraviolet curable ink composition for forming a bezel pattern prepared in Example 1 was applied to a glass substrate (5X5 cm) with a dropper, and spin coating was performed at a rotation speed of about 3,000 rpm to achieve a thickness of 3 ㎛. Then, the UV curable ink composition for forming the bezel pattern was cured by irradiating UV rays with a total exposure dose of 2000 mJ/cm2 using a UV irradiation device (395 nm UV LED). The exposure amount was measured and calculated using an illuminance meter.
자외선 조사 후에 1 분 경과 후에 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 지촉하였을 시, 액막이 완전히 경화가 되지 않고 액체로 묻어 나올 때는 미경화로 판단하여 불량으로 나타내고, 액막이 완전히 경화되지 않아 끈적임이 남아 있을 경우(Tack성이 있는 경우)에는 무름, 막이 완전히 경화되어 끈적임이 없을 경우에는 양호로 평가하였고, 그 결과를 하기 표 3에 나타내었다.When the UV curable ink composition for forming a bezel pattern is touched 1 minute after UV irradiation, if the liquid film is not completely cured and comes out as liquid, it is judged as uncured and indicated as a defect. If the liquid film is not completely cured and stickiness remains ( If there was tackiness, it was evaluated as soft; if the film was completely cured and there was no stickiness, it was evaluated as good. The results are shown in Table 3 below.
실시예 2 내지 실시예 5에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물에 대해서도 동일한 방법으로 평가를 진행하였고, 그 결과를 하기 표 3에 나타내었다.The UV-curable ink compositions for forming bezel patterns prepared in Examples 2 to 5 were evaluated in the same manner, and the results are shown in Table 3 below.
비교예 1 내지 비교예 6에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물에 대해서도 동일한 방법으로 평가를 진행하였고, 그 결과를 하기 표 4에 나타내었다.The UV-curable ink compositions for forming bezel patterns prepared in Comparative Examples 1 to 6 were evaluated in the same manner, and the results are shown in Table 4 below.
저장 안정성 평가Storage stability evaluation
상기 실시예 1에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물에 대해 저장 안정성을 측정하였다. 구체적으로, 조성물을 20 ml의 갈색 유리병에 약 15 ml 가량 주입한 후에 저온(7 ℃) 및 상온(25 ℃)에 대한 보관 안정성을 평가하였다. 각 용기 내의 조성물의 점도를 섭씨 25 ℃에서 Viscometer DV-2 (Brookfield)를 사용하여 측정하였다. 저온(7 ℃) 및 상온(25 ℃)에서 각각 1 달 경과 후에 조성물의 점도변화율{(변화된 점도값/초기 점도값-1)}이 50 % 이상일 경우는 X로, 10~50 % 사이의 경우는 △로, 10 % 이하일 경우는 ○로 평가하였고, 그 결과를 하기 표 3에 나타내었다.The storage stability of the ultraviolet curable ink composition for forming a bezel pattern prepared in Example 1 was measured. Specifically, about 15 ml of the composition was injected into a 20 ml brown glass bottle, and storage stability at low temperature (7°C) and room temperature (25°C) was evaluated. The viscosity of the composition in each container was measured using a Viscometer DV-2 (Brookfield) at 25°C. If the viscosity change rate {(changed viscosity value/initial viscosity value-1)} of the composition after 1 month at low temperature (7 ℃) and room temperature (25 ℃) is more than 50%, it is marked as was evaluated as △, and if it was 10% or less, it was evaluated as ○, and the results are shown in Table 3 below.
실시예 2 내지 실시예 5에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물에 대해서도 동일한 방법으로 평가를 진행하였고, 그 결과를 하기 표 3에 나타내었다.The UV-curable ink compositions for forming bezel patterns prepared in Examples 2 to 5 were evaluated in the same manner, and the results are shown in Table 3 below.
비교예 1 내지 비교예 6에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물에 대해서도 동일한 방법으로 평가를 진행하였고, 그 결과를 하기 표 4에 나타내었다.The UV-curable ink compositions for forming bezel patterns prepared in Comparative Examples 1 to 6 were evaluated in the same manner, and the results are shown in Table 4 below.
연필경도 평가Pencil hardness evaluation
상기 “경화감도 평가”와 동일한 방법으로 상기 실시예 1에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 경화시켜, 블랙 시편을 제조하였다. 이후, 연필경도 측정기를 이용하여 측정 표준 JIS K5400에 따라, 200 gf의 하중으로 한 연필당 총 3회 측정한 후 긁힘 및 눌림 정도를 측정하여 경도를 확인하였고, 그 결과를 하기 표 3에 나타내었다.The ultraviolet curable ink composition for forming a bezel pattern prepared in Example 1 was cured in the same manner as in the “curing sensitivity evaluation” to prepare a black specimen. Afterwards, using a pencil hardness meter, according to the measurement standard JIS K5400, each pencil was measured a total of three times with a load of 200 gf, and the degree of scratches and compression were measured to confirm the hardness, and the results are shown in Table 3 below. .
실시예 2 내지 실시예 5에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물에 대해서도 동일한 방법으로 평가를 진행하였고, 그 결과를 하기 표 3에 나타내었다.The UV-curable ink compositions for forming bezel patterns prepared in Examples 2 to 5 were evaluated in the same manner, and the results are shown in Table 3 below.
비교예 1 내지 비교예 6에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물에 대해서도 동일한 방법으로 평가를 진행하였고, 그 결과를 하기 표 4에 나타내었다.The UV-curable ink compositions for forming bezel patterns prepared in Comparative Examples 1 to 6 were evaluated in the same manner, and the results are shown in Table 4 below.
참고로, 연필경도는 6B, 5B, 4B, 3B, 2B, B, HB, F, H, 2H, 3H, 4H, 5H, 6H, 7H, 8H, 9H 순으로 경도가 증가한다.For reference, pencil hardness increases in the following order: 6B, 5B, 4B, 3B, 2B, B, HB, F, H, 2H, 3H, 4H, 5H, 6H, 7H, 8H, 9H.
밀착력 평가Adhesion evaluation
상기 “경화감도 평가”와 동일한 방법으로 상기 실시예 1에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 경화시켜, 블랙 시편을 제조하였다. 제조된 블랙 시편을 크로스 컷 기준인 ASTM D3359의 규격에 준거하여, 크로스 컷 테스트를 수행하였다. 구체적으로, 시편을 1 mm 간격으로 가로 및 세로 방향으로 각각 10 줄씩 칼로 그어 가로와 세로가 각각 1 mm인 100개의 정사각형 격자를 만들었다. 그 후, Nichiban사의 CT-24 접착 테이프를 상기 재단면에 부착한 후 떼어낼 때에, 함께 떨어지는 면의 상태를 광학 현미경으로 측정하였다.The ultraviolet curable ink composition for forming a bezel pattern prepared in Example 1 was cured in the same manner as in the “curing sensitivity evaluation” to prepare a black specimen. A cross-cut test was performed on the manufactured black specimen in accordance with the standards of ASTM D3359, which is a cross-cut standard. Specifically, the specimen was drawn with a knife in 10 lines each in the horizontal and vertical directions at 1 mm intervals to create 100 square grids with each width and height being 1 mm. Afterwards, when Nichiban's CT-24 adhesive tape was attached to the cut surface and then removed, the condition of the surface that fell together was measured using an optical microscope.
- 크로스-컷 밀착력 평가 기준 -- Cross-cut adhesion evaluation criteria -
5B : 떨어진 면이 초기 대비 변화 없을 경우5B: When the dropped surface does not change compared to the initial
4B : 떨어진 면이 총 면적 대비 5 % 미만인 경우4B: When the fallen surface is less than 5% of the total area
3B : 떨어진 면이 총 면적 대비 5 % 이상 15 % 미만인 경우3B: When the fallen surface is more than 5% and less than 15% of the total area
2B : 떨어진 면이 총 면적 대비 15 % 이상 35 % 미만인 경우2B: When the fallen surface is 15% to 35% of the total area
1B : 떨어진 면이 총 면적 대비 35 % 이상 65 % 미만인 경우1B: When the fallen surface is more than 35% and less than 65% of the total area
0B : 떨어진 면이 총 면적 대비 65 % 이상 100 % 미만인 경우0B: When the fallen surface is more than 65% and less than 100% of the total area
X: 블랙 시편이 붙어 있지 않는 경우 (떨어진 면이 총 면적 대비 100 %)X: When the black specimen is not attached (the separated side is 100% of the total area)
실시예 1 내지 실시예 5에 대하여 상기 평가 기준으로 통해 테스트한 결과를 하기 표 3에 나타내었고, 비교예 1 내지 비교예 6에 대하여 상기 평가 기준으로 통해 테스트한 결과를 하기 표 4에 나타내었다.The results of testing for Examples 1 to 5 using the above evaluation criteria are shown in Table 3 below, and the results of testing using the above evaluation criteria for Comparative Examples 1 to 6 are shown in Table 4 below.
용해성 및 석출 여부 평가Solubility and precipitation evaluation
상기 실시예 1에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 제조 시에, 광개시제 및 증감제의 용해 여부에 대한 특성을 평가하였고, 그 결과를 하기 표 3에 나타내었다. 구체적으로, 육안으로 침전이 전혀 관찰되지 않는 경우 ○, 침전이 약간 생성되는 경우 또는 육안상 판단이 잘 안되는 경우 △, 침전이 다량 생성되는 경우 X로 평가하였다.When preparing the ultraviolet curable ink composition for forming a bezel pattern prepared in Example 1, the dissolution properties of the photoinitiator and sensitizer were evaluated, and the results are shown in Table 3 below. Specifically, it was evaluated as ○ if no precipitation was observed with the naked eye, △ if a small amount of precipitation was formed or difficult to determine with the naked eye, and X if a large amount of precipitation was formed.
또한, 상기 “경화감도 평가”와 동일한 방법으로 상기 실시예 1에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 경화시켜, 블랙 시편을 제조하였다. 제조된 블랙 시편에 대하여 석출에 의한 표면 돌기 등의 현상이 발생한지 여부를 광학현미경을 통해 검사 평가하였다. 석출(돌기 및 분화구 등) 없이 양호한 경우 ○, 석출(돌기 및 분화구 등) 현상 발생하였을 경우 X로 표기하였다.In addition, the ultraviolet curable ink composition for forming a bezel pattern prepared in Example 1 was cured in the same manner as in the “curing sensitivity evaluation” to prepare a black specimen. The manufactured black specimen was examined and evaluated using an optical microscope to determine whether phenomena such as surface protrusions due to precipitation occurred. If it is good without precipitation (protrusions, craters, etc.), it is marked as ○, and if precipitation (protrusions, craters, etc.) occurs, it is marked as X.
실시예 2 내지 실시예 5에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물에 대해서도 동일한 방법으로 평가를 진행하였고, 그 결과를 하기 표 3에 나타내었다.The UV-curable ink compositions for forming bezel patterns prepared in Examples 2 to 5 were evaluated in the same manner, and the results are shown in Table 3 below.
비교예 1 내지 비교예 6에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물에 대해서도 동일한 방법으로 평가를 진행하였고, 그 결과를 하기 표 4에 나타내었다.The UV-curable ink compositions for forming bezel patterns prepared in Comparative Examples 1 to 6 were evaluated in the same manner, and the results are shown in Table 4 below.
블랙 막의 광학밀도/두께(OD/㎛) 평가Optical density/thickness (OD/㎛) evaluation of black film
상기 "경화감도 평가"와 동일한 방법으로 상기 실시예 1에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 경화시켜, 블랙 시편을 제조하였다. 이후, 블랙 시편의 광학밀도를 X-rite사의 OD측정기를 통해 측정하였고, 광학밀도(OD) 측정 부위와 동일한 부위의 블랙 시편 두께를 Alpha-step 두께 측정기를 이용하여 측정하였다. 이후, 측정된 데이터를 통해 OD/㎛ 계산하여 하기 표 3에 나타내었다.The ultraviolet curable ink composition for forming a bezel pattern prepared in Example 1 was cured in the same manner as in the “curing sensitivity evaluation” to prepare a black specimen. Afterwards, the optical density of the black specimen was measured using an OD meter from X-rite, and the thickness of the black specimen at the same area as the optical density (OD) measurement area was measured using an Alpha-step thickness meter. Afterwards, OD/㎛ was calculated using the measured data and is shown in Table 3 below.
실시예 2 내지 실시예 5에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물에 대해서도 동일한 방법으로 평가를 진행하였고, 그 결과를 하기 표 3에 나타내었다.The UV-curable ink compositions for forming bezel patterns prepared in Examples 2 to 5 were evaluated in the same manner, and the results are shown in Table 3 below.
비교예 1 내지 비교예 6에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물에 대해서도 동일한 방법으로 평가를 진행하였고, 그 결과를 하기 표 4에 나타내었다.The UV-curable ink compositions for forming bezel patterns prepared in Comparative Examples 1 to 6 were evaluated in the same manner, and the results are shown in Table 4 below.
두께 변화율 평가(내열 특성 평가)Thickness change rate evaluation (heat resistance property evaluation)
상기 “경화감도 평가”와 동일한 방법으로 상기 실시예 1에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 경화시켜, 블랙 시편을 제조하였다. 이후 블랙 시편 두께를 Alpha-step 두께 측정기를 이용하여 측정하였고, Hot-plate를 이용하여 85 ℃ 30 분 동안 방치한 후, 동일한 부위에 두께를 측정하였다. 블랙 시편의 두께변화율(변화된 두께/초기두께) 10 % 이상일 경우 X로, 10~5 % 사이의 경우는 △로, 5 % 미만일 경우 ○로 평가하였고, 그 결과를 하기 표 3에 나타내었다.The ultraviolet curable ink composition for forming a bezel pattern prepared in Example 1 was cured in the same manner as in the “curing sensitivity evaluation” to prepare a black specimen. Afterwards, the thickness of the black specimen was measured using an Alpha-step thickness gauge, and after being left at 85°C for 30 minutes using a hot-plate, the thickness was measured at the same area. The thickness change rate (changed thickness/initial thickness) of the black specimen was evaluated as
실시예 2 내지 실시예 5에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물에 대해서도 동일한 방법으로 평가를 진행하였고, 그 결과를 하기 표 3에 나타내었다.The UV-curable ink compositions for forming bezel patterns prepared in Examples 2 to 5 were evaluated in the same manner, and the results are shown in Table 3 below.
비교예 1 내지 비교예 6에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물에 대해서도 동일한 방법으로 평가를 진행하였고, 그 결과를 하기 표 4에 나타내었다.The UV-curable ink compositions for forming bezel patterns prepared in Comparative Examples 1 to 6 were evaluated in the same manner, and the results are shown in Table 4 below.
신뢰성 평가Reliability evaluation
상기 “경화감도 평가”와 동일한 방법으로 상기 실시예 1에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물을 경화시켜, 블랙 시편을 제조하였다. 이후 블랙 시편을 85/85 조건(온도 85℃, 상대습도 85 %)에서 200 hr 방치하였고, 상기 “밀착력 평가”와 동일한 방법으로 블랙시편의 밀착력을 측정하였다. 또한 Alpha-step을 이용하여 두께를 측정하였다. 블랙 시편의 두께변화율(변화된 두께/초기두께) 10 % 이상일 경우 X로, 10~5 % 사이의 경우는 △로, 5 % 미만일 경우 ○로 평가하였고, 그 결과를 하기 표 3에 나타내었다.The ultraviolet curable ink composition for forming a bezel pattern prepared in Example 1 was cured in the same manner as in the “curing sensitivity evaluation” to prepare a black specimen. Afterwards, the black specimen was left under 85/85 conditions (temperature 85°C, relative humidity 85%) for 200 hr, and the adhesion of the black specimen was measured using the same method as the “adhesion evaluation” above. Additionally, the thickness was measured using Alpha-step. The thickness change rate (changed thickness/initial thickness) of the black specimen was evaluated as
실시예 2 내지 실시예 5에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물에 대해서도 동일한 방법으로 평가를 진행하였고, 그 결과를 하기 표 3에 나타내었다.The UV-curable ink compositions for forming bezel patterns prepared in Examples 2 to 5 were evaluated in the same manner, and the results are shown in Table 3 below.
비교예 1 내지 비교예 6에서 제조된 베젤 패턴 형성용 자외선 경화형 잉크 조성물에 대해서도 동일한 방법으로 평가를 진행하였고, 그 결과를 하기 표 4에 나타내었다.The UV-curable ink compositions for forming bezel patterns prepared in Comparative Examples 1 to 6 were evaluated in the same manner, and the results are shown in Table 4 below.
| 실시예 1Example 1 | 실시예 2Example 2 | 실시예 3Example 3 | 실시예 4Example 4 | 실시예 5Example 5 | |
| 점도(cP)Viscosity (cP) | 15.315.3 | 14.214.2 | 19.419.4 | 18.218.2 | 19.219.2 |
| 경화감도Curing sensitivity | 양호Good | 양호Good | 양호Good | 양호Good | 양호Good |
|
저장 안정성 (25℃)storage stability (25℃) |
OO | OO | OO | OO | OO |
| 연필경도pencil hardness | FF | FF | FF | FF | FF |
| 밀착력Adhesion | 4B4B | 4B4B | 4B4B | 4B4B | 4B4B |
| 용해성Solubility | OO | OO | OO | OO | OO |
| OD/㎛OD/㎛ | 0.890.89 | 0.710.71 | 0.860.86 | 0.870.87 | 0.870.87 |
| 두께(㎛)Thickness (㎛) | 33 | 33 | 33 | 33 | 33 |
|
두께 변화율 (내열특성 평가)Thickness change rate (Heat resistance evaluation) |
OO | OO | OO | OO | OO |
| 신뢰성 평가Reliability evaluation | OO | OO | OO | OO | OO |
| 비교예 1Comparative Example 1 | 비교예 2Comparative Example 2 | 비교예 3Comparative Example 3 | 비교예 4Comparative Example 4 | 비교예 5Comparative Example 5 | 비교예 6Comparative Example 6 | |
| 점도(cP)Viscosity (cP) | 11.111.1 | 24.224.2 | 18.118.1 | 21.721.7 | 25.825.8 | -- |
| 경화감도Curing sensitivity | 양호Good | 양호Good | 양호Good | -- | 양호Good | -- |
|
저장 안정성 (25℃)storage stability (25℃) |
OO | OO | OO | XX | OO | XX |
| 연필경도pencil hardness | FF | 6B6B | 4B4B | -- | HH | -- |
| 밀착력Adhesion | 2B2B | 3B3B | 2B2B | -- | 0B0B | -- |
| 용해성Solubility | OO | OO | OO | XX | OO | XX |
| OD/㎛OD/㎛ | 0.850.85 | 0.850.85 | 0.820.82 | -- | 0.820.82 | -- |
| 두께(㎛)Thickness (㎛) | 33 | 33 | 33 | -- | 33 | -- |
|
두께 변화율 (내열특성 평가)Thickness change rate (Heat resistance evaluation) |
XX | △△ | △△ | -- | OO | -- |
| 신뢰성 평가Reliability evaluation | XX | △△ | △△ | -- | OO | -- |
상기 표 3을 참고하면, 본 발명의 실시예 1 내지 실시예 5에서 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 잉크젯 공정 상에 있어 적절한 점도를 가지며, 경화감도, 저장 안정성, 연필경도, 밀착력, 용해성, 광학밀도/두께 및 열에 의한 두께 변화율 평가 모두에서 우수한 것을 확인하였다.Referring to Table 3, the ultraviolet curable ink composition for forming a bezel pattern in Examples 1 to 5 of the present invention has an appropriate viscosity in the inkjet process, and has curing sensitivity, storage stability, pencil hardness, adhesion, solubility, It was confirmed to be excellent in both optical density/thickness and heat-induced thickness change rate evaluation.
한편, 상기 표 4를 참고하면 비교예 1의 경우, 다이글리시딜 에테르 화합물이 제외된 조성으로 밀착력 및 내열 특성을 확보하기는 힘든 것을 확인하였다. Meanwhile, referring to Table 4, it was confirmed that in the case of Comparative Example 1, it was difficult to secure adhesion and heat resistance properties with a composition excluding the diglycidyl ether compound.
구체적으로, 내열 특성 평가 시에 초기 두께 대비, 평가 후의 두께 감소 변화가 크게 발생하는 것을 확인하였으며, 이로 인하여 비교예 1의 경우 내열 특성을 확보하기는 힘든 것을 알 수 있다. Specifically, when evaluating heat resistance properties, it was confirmed that there was a large change in thickness reduction after evaluation compared to the initial thickness. As a result, it was found that it was difficult to secure heat resistance properties in Comparative Example 1.
비교예 2의 경우, 광경화 조성물의 조성 상에 있어 다이글리시딜 에테르 화합물이 일정 비율 이상일 경우, 점도 상승, 표면 경화 감도 저하가 발생하는 것을 확인하였다. 구체적으로, 광경화 조성물의 조성 상에 있어 다이글리시딜 에테르 화합물이 일정 비율 이상일 경우, 가교 후의 경화 공정에 참여하지 않은 잔여 모노머에 의해 경화 후의 표면막이 무르게 되는 것으로 인해 경화 감도 저하가 발생할 수 있다.In Comparative Example 2, it was confirmed that when the diglycidyl ether compound was contained in a certain ratio or more in the composition of the photocurable composition, the viscosity increased and the surface curing sensitivity decreased. Specifically, when the diglycidyl ether compound in the composition of the photocurable composition is more than a certain ratio, the surface film after curing becomes soft due to residual monomers that did not participate in the curing process after crosslinking, which may cause a decrease in curing sensitivity. .
비교예 3의 경우, 광경화 조성물의 조성 상에 있어 라디칼계 개시제가 제외된 조성으로, 경화 감도가 약해지고 경도에 있어서 열등하였다. 구체적으로, 광경화 조성물의 조성 상에 있어 경화 공정에 참여하지 않은 잔여 모노머에 의해 경화 후 표면막이 무르게 되는 것으로 경도 저하가 발생할 수 있다.In the case of Comparative Example 3, the photocurable composition was a composition in which the radical-based initiator was excluded, and the curing sensitivity was weakened and the hardness was inferior. Specifically, in the composition of the photocurable composition, the surface film becomes soft after curing due to residual monomers that did not participate in the curing process, which may cause a decrease in hardness.
비교예 4의 경우, 광경화 조성물의 조성 상에 있어 라디칼계 개시제가 일정 비율 이상일 경우로서, 이 경우에는 용해성에 문제가 발생하여 경화 특성 평가가 거의 불가능할 정도로 열등하였다.In the case of Comparative Example 4, the composition of the photocurable composition contained a certain ratio or more of a radical-based initiator. In this case, problems with solubility occurred and the curing properties were inferior to the point where evaluation was almost impossible.
비교예 5의 경우, 광경화 조성물의 조성 상에 있어 옥세탄계 화합물이 일정 비율 이상일 경우로서, 점도 상승, 밀착력 평가 결과가 매우 열등하였다.In the case of Comparative Example 5, when the oxetane-based compound was contained in a certain ratio or more in the composition of the photocurable composition, the viscosity increase and adhesion evaluation results were very poor.
비교예 6의 경우, 광경화 조성물의 조성 상에 있어 양이온 개시제가 일정 비율 이상일 경우로서, 이 경우에는 용해성에 문제가 발생하여 특성 평가가 거의 불가능할 정도로 열등하였다.In the case of Comparative Example 6, the photocurable composition contained a certain ratio or more of a cationic initiator. In this case, problems with solubility occurred and the properties were inferior to the point where evaluation was almost impossible.
이를 통해, 본 발명의 일 실시상태에 따른 고내열성 베젤 패턴 형성용 자외선 경화형 잉크 조성물은, 경화 감도가 우수하여 대기 조건으로서 질소 충진 등의 외부 안정화 조건이 없는 상태에서 용이하게 광경화가 가능하고, 저장 안정성 및 분산성이 우수하며, 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 광경화물의 광학밀도, 경도 및 밀착성이 우수한 것을 알 수 있다.Through this, the ultraviolet curable ink composition for forming a highly heat-resistant bezel pattern according to an embodiment of the present invention has excellent curing sensitivity and can be easily photocured in the absence of external stabilization conditions such as nitrogen filling as atmospheric conditions, and can be stored. It can be seen that stability and dispersibility are excellent, and the optical density, hardness, and adhesion of the photocured product of the ultraviolet curable ink composition for bezel pattern formation are excellent.
이상의 상세한 설명은 본 발명을 예시하고 설명하는 것이다. 또한, 전술한 내용은 본 발명의 바람직한 실시 형태를 나타내고 설명하는 것에 불과하며, 전술한 바와 같이 본 발명은 다양한 다른 조합, 변경 및 환경에서 사용할 수 있으며, 본 명세서에 개시된 발명의 개념의 범위, 전술한 개시 내용과 균등한 범위 및/또는 당업계의 기술 또는 지식의 범위 내에서 변경 또는 수정이 가능하다. 따라서, 이상의 발명의 상세한 설명은 개시된 실시 상태로 본 발명을 제한하려는 의도가 아니다. 또한, 첨부된 청구범위는 다른 실시 상태도 포함하는 것으로 해석되어야 한다.The foregoing detailed description illustrates and explains the invention. In addition, the foregoing merely shows and describes preferred embodiments of the present invention, and as described above, the present invention can be used in various other combinations, modifications, and environments, and the scope of the inventive concept disclosed herein, the foregoing Changes or modifications may be made within the scope of equivalent disclosure and/or skill or knowledge in the art. Accordingly, the above detailed description of the invention is not intended to limit the invention to the disclosed embodiments. Additionally, the appended claims should be construed to include other embodiments as well.
Claims (14)
- 안료, 분산제, 지환식 에폭시계 화합물, 옥세탄계 화합물, 비닐 에테르계 화합물, 다이글리시딜 에테르 화합물, 양이온 개시제 및 라디칼계 개시제를 포함하는 베젤 패턴 형성용 자외선 경화형 잉크 조성물.An ultraviolet curable ink composition for forming a bezel pattern comprising a pigment, a dispersant, an alicyclic epoxy-based compound, an oxetane-based compound, a vinyl ether-based compound, a diglycidyl ether compound, a cationic initiator, and a radical-based initiator.
- 제1항에 있어서,According to paragraph 1,상기 안료는 흑색안료를 포함하며,The pigment includes a black pigment,상기 자외선 경화형 조성물 100 중량부 기준으로, Based on 100 parts by weight of the ultraviolet curable composition,상기 안료의 함량은 5 중량부 이상 20 중량부 이하인 것인 베젤 패턴 형성용 자외선 경화형 잉크 조성물.An ultraviolet curable ink composition for forming a bezel pattern, wherein the content of the pigment is 5 parts by weight or more and 20 parts by weight or less.
- 제1항에 있어서,According to paragraph 1,상기 분산제는 우레탄계 화합물을 포함하는 것인 베젤 패턴 형성용 자외선 경화형 잉크 조성물.An ultraviolet curable ink composition for forming a bezel pattern, wherein the dispersant includes a urethane-based compound.
- 제1항에 있어서,According to paragraph 1,상기 자외선 경화형 조성물 100 중량부 기준으로, Based on 100 parts by weight of the ultraviolet curable composition,상기 분산제의 함량은 1 중량부 이상 6 중량부 이하인 것인 베젤 패턴 형성용 자외선 경화형 잉크 조성물.An ultraviolet curable ink composition for forming a bezel pattern, wherein the content of the dispersant is 1 part by weight or more and 6 parts by weight or less.
- 제1항에 있어서,According to paragraph 1,상기 자외선 경화형 조성물 100 중량부 기준으로,Based on 100 parts by weight of the ultraviolet curable composition,상기 옥세탄계 화합물의 함량은 5 중량부 이상 25 중량부 이하인 것인 베젤 패턴 형성용 자외선 경화형 잉크 조성물.An ultraviolet curable ink composition for forming a bezel pattern, wherein the content of the oxetane-based compound is 5 parts by weight or more and 25 parts by weight or less.
- 제1항에 있어서,According to paragraph 1,상기 자외선 경화형 조성물 100 중량부 기준으로, Based on 100 parts by weight of the ultraviolet curable composition,상기 지환식 에폭시계 화합물의 함량은 10 중량부 이상 40 중량부 이하인 것인 베젤 패턴 형성용 자외선 경화형 잉크 조성물.An ultraviolet curable ink composition for forming a bezel pattern, wherein the content of the alicyclic epoxy compound is 10 parts by weight or more and 40 parts by weight or less.
- 제1항에 있어서,According to paragraph 1,상기 자외선 경화형 조성물 100 중량부 기준으로, Based on 100 parts by weight of the ultraviolet curable composition,상기 비닐 에테르계 화합물의 함량은 10 중량부 이상 60 중량부 이하인 것인 베젤 패턴 형성용 자외선 경화형 잉크 조성물.An ultraviolet curable ink composition for forming a bezel pattern, wherein the content of the vinyl ether-based compound is 10 parts by weight or more and 60 parts by weight or less.
- 제1항에 있어서,According to paragraph 1,상기 자외선 경화형 조성물 100 중량부 기준으로, Based on 100 parts by weight of the ultraviolet curable composition,상기 다이글리시딜 에테르 화합물의 함량은 2.5 중량부 이상 10 중량부 이하인 것인 베젤 패턴 형성용 자외선 경화형 잉크 조성물.An ultraviolet curable ink composition for forming a bezel pattern, wherein the diglycidyl ether compound content is 2.5 parts by weight or more and 10 parts by weight or less.
- 제1항에 있어서,According to paragraph 1,상기 양이온 개시제의 함량은 상기 자외선 경화형 조성물 100 중량부에 대하여, 2 중량부 이상 6 중량부 이하인 것인 베젤 패턴 형성용 자외선 경화형 잉크 조성물.An ultraviolet curable ink composition for forming a bezel pattern, wherein the content of the cationic initiator is 2 parts by weight or more and 6 parts by weight or less based on 100 parts by weight of the ultraviolet curable composition.
- 제1항에 있어서,According to paragraph 1,상기 라디칼계 개시제 함량은 상기 자외선 경화형 조성물 100 중량부에 대하여, 1 중량부 이상 4 중량부 이하인 것인 베젤 패턴 형성용 자외선 경화형 잉크 조성물.The radical-based initiator content is 1 part by weight or more and 4 parts by weight or less based on 100 parts by weight of the ultraviolet curable composition.
- 제1항에 있어서,According to paragraph 1,상기 라디칼계 개시제 및 양이온 개시제의 중량비는 1:1 내지 1:6인 것인, 베젤 패턴 형성용 자외선 경화형 잉크 조성물.An ultraviolet curable ink composition for forming a bezel pattern, wherein the weight ratio of the radical-based initiator and the cationic initiator is 1:1 to 1:6.
- 제1항에 있어서,According to paragraph 1,증감제, 부착력 증진제, 계면활성제 및 산화방지제 중 적어도 하나를 포함하는 첨가제를 더 포함하는 것인 베젤 패턴 형성용 자외선 경화형 잉크 조성물.An ultraviolet curable ink composition for forming a bezel pattern, further comprising an additive including at least one of a sensitizer, an adhesion enhancer, a surfactant, and an antioxidant.
- 제1항에 있어서,According to paragraph 1,상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물의 광경화물이 신뢰성 평가시 두께변화율이 5% 미만이며, 밀착력 4B 이상인 것인 베젤 패턴 형성용 자외선 경화형 잉크 조성물.An ultraviolet curable ink composition for forming a bezel pattern, wherein the photocured product of the ultraviolet curable ink composition for forming a bezel pattern has a thickness change rate of less than 5% and an adhesion of 4B or more when evaluating reliability.
- 제1항에 있어서,According to paragraph 1,상기 베젤 패턴 형성용 자외선 경화형 잉크 조성물은 블랙 패턴 형성용인 것인 베젤 패턴 형성용 자외선 경화형 잉크 조성물.The ultraviolet curable ink composition for forming a bezel pattern is for forming a black pattern.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2022-0184418 | 2022-12-26 | ||
| KR20220184418 | 2022-12-26 |
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| WO2024144011A1 true WO2024144011A1 (en) | 2024-07-04 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/KR2023/020559 WO2024144011A1 (en) | 2022-12-26 | 2023-12-13 | Ultraviolet curable ink composition for forming bezel pattern with high reliability |
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| Country | Link |
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| KR (1) | KR102691846B1 (en) |
| WO (1) | WO2024144011A1 (en) |
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| KR20140047773A (en) * | 2012-10-12 | 2014-04-23 | 주식회사 엘지화학 | Ink composition improved wear resistance and electronic device using the same |
| KR20160071336A (en) * | 2014-12-11 | 2016-06-21 | 주식회사 엘지화학 | photosensitive color ink composition for bezel, bezel pattern formed by using the same, and display panel comprising the pattern |
| KR20180039556A (en) * | 2016-10-10 | 2018-04-18 | 주식회사 엘지화학 | Infrared ray transmittance ink composition for inkjet, method for preparing a bezel pattern using the same, the bezel pattern using the same method and display panel comprising the bezel pattern |
| KR20190071597A (en) * | 2017-12-14 | 2019-06-24 | 주식회사 엘지화학 | UV-curable black ink composition for a foldable display and method of manufacturing a bezel pattern using the same |
| KR20200020289A (en) * | 2018-08-17 | 2020-02-26 | 주식회사 엘지화학 | A film-printable ultraviolet curable ink composition for inkjet, a method for preparing a bezel pattern using the same, a bezel pattern prepared thereby and a display panel comprising the bezel pattern |
| CN112062675A (en) * | 2020-09-15 | 2020-12-11 | 常州速固得感光新材料有限公司 | Monomer with free radical and cation dual curing functions, preparation method and radiation curing gravure ink |
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| US10259957B2 (en) * | 2014-09-26 | 2019-04-16 | Lg Chem, Ltd. | UV-curable ink composition, method for producing bezel pattern of display substrate using same, and bezel pattern produced thereby |
| KR101924686B1 (en) | 2016-04-29 | 2018-12-03 | 아이피유브이 주식회사 | Uv-curable ink composition |
| KR20210014298A (en) * | 2019-07-30 | 2021-02-09 | 주식회사 엘지화학 | Ink composition for forming colored bezel pattern having good light shielding property and method of forming colored bezel pattern using the same |
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2023
- 2023-12-13 KR KR1020230181078A patent/KR102691846B1/en active IP Right Grant
- 2023-12-13 WO PCT/KR2023/020559 patent/WO2024144011A1/en unknown
Patent Citations (6)
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| KR20140047773A (en) * | 2012-10-12 | 2014-04-23 | 주식회사 엘지화학 | Ink composition improved wear resistance and electronic device using the same |
| KR20160071336A (en) * | 2014-12-11 | 2016-06-21 | 주식회사 엘지화학 | photosensitive color ink composition for bezel, bezel pattern formed by using the same, and display panel comprising the pattern |
| KR20180039556A (en) * | 2016-10-10 | 2018-04-18 | 주식회사 엘지화학 | Infrared ray transmittance ink composition for inkjet, method for preparing a bezel pattern using the same, the bezel pattern using the same method and display panel comprising the bezel pattern |
| KR20190071597A (en) * | 2017-12-14 | 2019-06-24 | 주식회사 엘지화학 | UV-curable black ink composition for a foldable display and method of manufacturing a bezel pattern using the same |
| KR20200020289A (en) * | 2018-08-17 | 2020-02-26 | 주식회사 엘지화학 | A film-printable ultraviolet curable ink composition for inkjet, a method for preparing a bezel pattern using the same, a bezel pattern prepared thereby and a display panel comprising the bezel pattern |
| CN112062675A (en) * | 2020-09-15 | 2020-12-11 | 常州速固得感光新材料有限公司 | Monomer with free radical and cation dual curing functions, preparation method and radiation curing gravure ink |
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| Publication number | Publication date |
|---|---|
| KR20240102844A (en) | 2024-07-03 |
| KR102691846B1 (en) | 2024-08-06 |
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