WO2016048119A1 - Uv-curable ink composition, method for producing bezel pattern of display substrate using same, and bezel pattern produced thereby - Google Patents

Uv-curable ink composition, method for producing bezel pattern of display substrate using same, and bezel pattern produced thereby Download PDF

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Publication number
WO2016048119A1
WO2016048119A1 PCT/KR2015/010345 KR2015010345W WO2016048119A1 WO 2016048119 A1 WO2016048119 A1 WO 2016048119A1 KR 2015010345 W KR2015010345 W KR 2015010345W WO 2016048119 A1 WO2016048119 A1 WO 2016048119A1
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Prior art keywords
ink composition
curable ink
bezel
pattern
method according
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PCT/KR2015/010345
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French (fr)
Korean (ko)
Inventor
박성은
구용성
백승아
김준형
Original Assignee
주식회사 엘지화학
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Priority to KR10-2014-0129417 priority Critical
Priority to KR20140129417 priority
Application filed by 주식회사 엘지화학 filed Critical 주식회사 엘지화학
Priority to KR10-2015-0138098 priority
Priority to KR1020150138098A priority patent/KR101818306B1/en
Priority claimed from CN201580063817.6A external-priority patent/CN107004384A/en
Publication of WO2016048119A1 publication Critical patent/WO2016048119A1/en

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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/101Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements

Abstract

The present invention relates to a UV-curable ink composition, a method for producing a bezel pattern of a display substrate using same, and a bezel pattern produced thereby, the UV-curable ink composition comprising a colorant, an epoxy resin, an oxetane resin, and a photopolymerization initiator, the content ratio of the epoxy resin to the oxetane resin being 1:0.5-1:6, and the UV-curable ink composition having a taper angle after curing of 0°-30°, and having an optical density (OD) value of 0.05-2.5 per 1.0µm of film thickness.

Description

UV-curable ink composition, a method for producing a pattern on the display substrate using the same bezel, the bezel, and thus producing a pattern by

This application is dated 26 Sep. 2014 Korea Patent Application No. 10-2014-0129417, December 11, 2014 Date of Korea Patent Application No. 10-2014-0178523 and No. 09 in 2015, 30-day Korea Patent Application No. 10-2015 and claims the benefit of priority based on -0138098 call, all information disclosed in the literature of the Korea patent application are included as part of the specification.

The present invention relates to a production method and hence the bezel patterns produced by the pattern of the bezel of the UV-curable ink compositions, the display substrate using the same.

In the display device, it has been used a method that in order to achieve the weight reduction and thinning is formed on the substrate to replace the bezel pattern using a separate bezel structure.

In order to manufacture the bezel pattern having an acceptable level of optical density (optical density, OD) to cover up the internal wiring in a conventional screen printing method, from a few microns due to possess a thickness sufficient to tens of microns 2-3 degrees It has the disadvantage that it requires additional printing process. Furthermore, black (black) color other white (white) or gold (gold) on the film laminated to the pattern forming portion and mihyeong part of the step occurs as the bezel part further printing frequency with a color, such as increasing problem the cell defect appears a.

Therefore, it is necessary to develop the bezel pattern forming method having a sufficient optical density to shield the metal wiring and electrodes and the like of the substrate in the thin film state than the conventional pattern formation method of the bezel.

In order to solve the problems of the prior art, the present invention has a small taper angle and short-circuit, the bubble generation and the release of the film by the by forming a thin film bezel pattern using a UV-curable ink compositions that exhibit a thickness, a large level difference when curing the method in accordance with the pattern of the bezel does not represent a luminous refined reduced, and an object thereof is to provide a pattern bezel and the display substrate comprising the same produced accordingly.

In order to achieve the foregoing object,

The present invention, a colorant, an epoxy resin, an oxetane resin and containing a photopolymerization initiator, the epoxy resin: the content ratio of the oxetane resin 1: 0.5 to 1: 6, and the taper angle of 0 ° ~ 30 ° after curing and and it provides a UV-curable ink composition OD (Optical Density) value of 0.05 to 2.5 per film thickness 1.0㎛.

In addition, the present invention includes the steps of using the ultraviolet curable ink composition to form a bezel pattern onto the substrate; And a step of curing the bezel pattern; provides a method of producing a pattern for a display substrate including a bezel.

In addition, the present invention, the ultraviolet curable ink composition is cured, provides a bezel pattern for a display substrate is formed on the substrate.

Small taper angle and a thin film by forming a bezel pattern using a UV-curable ink compositions that exhibit a thickness, the bezel does not represent a luminous refined reduced according to the variant of the paragraph, the bubbler and the film by a large step pattern when cured, according to the present invention the can be prepared.

Bezel method for producing a pattern of the present invention by using an ultraviolet curable ink composition comprising a surface active agent, manufactured bezel pattern is excellent in adhesive strength and coating properties to the substrate, is excellent in adhesion to the upper substrate.

Hereinafter, the present invention in more detail.

The present invention, a colorant, an epoxy resin, an oxetane resin and containing a photopolymerization initiator, the epoxy resin: the content ratio of the oxetane resin 1: 0.5 to 1: 6, and the taper angle of 0 ° ~ 30 ° after curing and and it provides a UV-curable ink composition OD (Optical Density) value of 0.05 to 2.5 per film thickness 1.0㎛.

Further, the ultraviolet curable ink compositions of the present invention may further include surfactants, adhesion promoters, diluents, and any one or more selected from the group consisting of a photosensitizer agent.

UV-curable ink compositions, there are generally a radical polymerization type resins and cationic polymerization type resin can be used mainly. For the radical polymerization-type resin, since the feed of the curing failure due to oxygen it is not suitable for curing of the thin film, and is not suitable for pattern formation bezel adhesiveness is lowered in the glass substrate due to curing shrinkage in size. In the case of cationic polymerization-type resin on the other hand, the curing shrinkage ratio was typically low, as it is advantageous to cure the thin film is small the influence by the oxygen.

UV-curable ink composition used in the present invention includes an epoxy resin as a cationic curing component. Wherein the epoxy resin is specifically selected from a bisphenol type epoxy resin, novolak type epoxy resin, glycidyl ester type epoxy resin, glycidyl amine type epoxy resins, linear aliphatic epoxy resins, biphenyl type epoxy resins and aliphatic epoxy compound one kind or may be a mixture of two or more.

The alicyclic epoxy compounds, may mean a compound comprising at least one epoxidized aliphatic cyclic group.

In the alicyclic epoxy compound containing an epoxidized aliphatic chain, wherein the epoxidized by an aliphatic ring group means a group of the epoxy bonded to the alicyclic ring, for example, 3,4-epoxy cyclopentyl group, 3,4-epoxy cyclohexyl, 3,4-epoxy-cyclopentyl-methyl, 3,4-epoxycyclohexyl group, 2- (3,4-epoxy cyclopentyl) ethyl group, 2- (3,4-epoxycyclohexyl) ethyl group, 3- (3,4-epoxy cyclohexyl petil) has a functional group such as propyl or 3- (3,4-epoxycyclohexyl) propyl group can be exemplified. The hydrogen atom of the alicyclic ring in the above, and may be optionally substituted by a substituent such as an alkyl group. With the aliphatic epoxy compound is, for example, in the following, but can use a compound that is specifically exemplified, without being limited to the type of the epoxy compound that can be used.

E.g. dicyclopentadiene diendi oxide, cyclohexene oxide, 4-vinyl-1,2-epoxy-4-vinyl cyclohexene, vinyl cyclohexene dioxide, limonene mono-oxide, limonene dioxide, (3,4-epoxycyclohexyl) methyl- 3, 4-epoxycyclohexane carboxylate, 3-vinylcyclohexene oxide, bis (2,3-epoxy cyclopentyl) ether, bis (3,4-epoxycyclohexylmethyl) adipate, bis (3,4 epoxy-6-methylcyclohexyl methyl) adipate, (3,4-epoxycyclohexyl) methyl alcohol, (3,4-epoxy-6-methylcyclohexyl) methyl-3,4-epoxy-6-methylcyclohexane carboxylate, ethylene glycol-bis (3,4-epoxycyclohexyl) ether, 3,4-epoxy-cyclohexene-carboxylic acid ethylene glycol ester, (3,4-epoxycyclohexyl) ethyltrimethoxysilane, Daicel ㈜ selrok's side may be used, such as 8000.

The amount of the epoxy resin is preferably from 5 to 50% by weight based on the total weight of the UV-curable ink composition, and may be more preferably 10 to 30% by weight. If it exceeds 50% by weight, the coating property is lowered, and the sensitivity reduction is less than 5% by weight.

The ultraviolet-curable ink composition should include the oxetane resin is used as the other cationic polymerizable monomer.

An oxetane resin can be a compound having a 4-membered cyclic ether and cationic lower the viscosity of the cured ink composition (for example, less than 50cPs at 25 ℃) acting in the molecule structure.

Specifically, 3-ethyl-3-hydroxymethyl-oxetane, 1,4-bis [(3-ethyl-3-oxetanyl) methoxymethyl] benzene, 3-ethyl-3- (phenoxymethyl) oxetane, di [(3-ethyl-3-oxetanyl) methyl] ether, 3-ethyl-3- (2-ethylhexyloxymethyl) oxetane, 3-ethyl-3-cyclohexyl-yloxymethyl oxetane or include phenol novolac oxetane can be exemplified. Oxetane compounds include, for example, a Toa Gosei ㈜'s "Alon oxetane OXT-101", "Alon oxetane OXT-121", "oxetane OXT-211-alone", "oxetane OXT-221-alone" or and the like can be used "Alon oxetane OXT-212". These alone, or may be used two or more kinds in combination.

The oxide content of the cetane resin is preferably 15 to 75% by weight based on the total weight of the UV-curable ink composition, and may be more preferably 40 to 60% by weight. If it exceeds 75% by weight of a low degree of cure, the coating property is lowered to less than 15% by weight If the viscosity is raised.

In addition, an oxetane resin of the invention can be used, including the oxetane compound having an oxetane compound and two oxetane rings having one oxetane ring. When used with the oxetane compound having an oxetane compound and two oxetane ring having the one oxetane ring has the advantage of being able to control the viscosity and film flexibility. When used with the oxetane compound of two as described above, an oxetane compound having one oxetane ring: in the range of 3: 2 oxide content range of the oxetane compound having a cetane ring is from 1: 1.16 to 1 the use is preferred.

The present invention is an epoxy resin: 6 characterized in that the: the content ratio of the oxetane resin 1: 0.5-1. To 0.5, the high viscosity of the composition is less than: the ratio of the epoxy compound and the oxetane compound 1: if it exceeds 6 can be lowered is coated castle sensitivity superior one curing of the composition according to the viscosity of the composition low, 1 there are coatability may be reduced accordingly.

The ink composition of the present invention may contain a cationic cation by irradiation with UV light as a photo-polymerization initiator (cation) to produce a paper or a Bronsted acid compound, e.g., such as iodonium salt or sulfonium salt, necessarily with this it is not.

The iodonium salts or sulfonium salts, and by a monomer having an unsaturated double bond contained in the ink in the ultraviolet curing reaction to occur, the curing reaction to form a polymer, it is also possible to use photosensitizers according to the polymerization efficiency.

In one example, the photoinitiator is SbF 6 -, AsF 6 -, BF 6 -, (C 6 F 5) 4 B-, PF 6 - or, but may be one having an anion represented by the RfnF 6-n, it must be limited thereto it is not.

The photoinitiator may comprise from 1 to be preferred, preferably 2 to 10% by weight than is contained in 15% by weight based on the total weight of the UV-curable ink composition. Without the content of the photopolymerization initiator, the curing reaction is sufficient if it is less than 1% by weight, is insoluble both a 15% by weight greater than or coating properties may be lowered to a viscosity increase.

The ink composition may further comprise a diluent to improve the coating property by increasing the fluidity by lowering the viscosity of the ink.

The diluents include ethylcellosolve cellosolve, methyl ethyl ketone, methyl cells, glycol dimethyl ether, ethylene glycol diethyl ether, propylene glycol dimethyl ether, propylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol ether, diethylene glycol methyl ethyl ether, 2-ethoxy propanol, 2-methoxypropanol, ethoxyethanol, 3-methoxybutanol, cyclohexanone, cyclopentanone, propylene glycol methyl ether acetate, propylene glycol 2- from ethyl ether acetate, 3-methoxybutyl acetate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, methyl cellosolve acetate, butyl acetate, dipropylene glycol monomethyl ether, cyclohexene oxide, and the group consisting of propylene carbonate in the but it can be selected at least one and half You like are not limited.

The amount of the diluent is preferably 0 to 30% by weight based on the total weight of the UV-curable ink composition, and may be more preferably 0.1 to 20% by weight. If more than 30% by weight of the curing sensitivity is lowered.

The ultraviolet curable ink composition to comprise a colorant.

The colorant may be used alone or more pigments, dyes or a mixture thereof, there can be exhibited the color according to the need is not particularly limited.

Examples of one embodiment of the present invention can be used as a black pigment, carbon black, graphite, metal oxide, organic pigments such as black.

Examples of the carbon black is Sisto 5HIISAF-HS, Sisto KH, Sisto 3HHAF-HS, Sisto NH, Sisto 3M, Sisto 300HAF-LS, Sisto 116HMMAF-HS, Sisto 116MAF, Sisto FMFEF-HS , Sisto SOFEF, Sisto VGPF, Sisto SVHSRF-HS and Sisto SSRF (East carbon ㈜); Diagram Black II, diagram Black N339, diagrams black SH, diagram Black H, diagram LH, diagram HA, diagram SF, diagram N550M, Diagram M, Diagram E, the diagram G, diagram, R, diagram N760M, diagram LR, # 2700, # 2600, # 2400, # 2350, # 2300, # 2200, # 1000, # 980, # 900, MCF88, # 52, # 50, # 47, # 45, # 45L, # 25, # CF9, # 95, # 3030, # 3050, MA7, MA77, MA8, MA11, MA100, MA40, OIL7B, OIL9B, OIL11B, OIL30B and OIL31B (Mitsubishi chemical ㈜); PRINTEX-U, PRINTEX-V, PRINTEX-140U, PRINTEX-140V, PRINTEX-95, PRINTEX-85, PRINTEX-75, PRINTEX-55, PRINTEX-45, PRINTEX-300, PRINTEX-35, PRINTEX-25, PRINTEX- 200, PRINTEX-40, PRINTEX-30, PRINTEX-3, PRINTEX-A, SPECIAL BLACK-550, SPECIAL BLACK-350, SPECIAL BLACK-250, SPECIAL BLACK-100, and LAMP BLACK-101 (cod four ㈜); RAVEN-1100ULTRA, RAVEN-1080ULTRA, RAVEN-1060ULTRA, RAVEN-1040, RAVEN-1035, RAVEN-1020, RAVEN-1000, RAVEN-890H, RAVEN-890, RAVEN-880ULTRA, RAVEN-860ULTRA, RAVEN-850, RAVEN- 820, RAVEN-790ULTRA, RAVEN-780ULTRA, RAVEN-760ULTRA, RAVEN-520, RAVEN-500, RAVEN-460, RAVEN-450, RAVEN-430ULTRA, RAVEN-420, RAVEN-410, RAVEN-2500ULTRA, RAVEN-2000, RAVEN-1500, RAVEN-1255, RAVEN-1250, RAVEN-1200, RAVEN-1190ULTRA, RAVEN-1170, and (Colombia carbon ㈜) or a mixture thereof and the like.

The organic black pigments aniline black, perylene black or lactams can be used, but the black line or the like, is not limited thereto.

The present invention UV-curable ink composition in is characterized in that it has an OD (Optical Density) are cured by irradiation of ultraviolet light of a certain degree of long-wavelength (365 or 395 nm as an example). For this purpose, the content of the coloring agent is preferably from 1 to 15% by weight based on the total weight of the UV-curable ink composition, and may be more preferably 3 to 10% by weight. When the content of the colorant is less than 1% by weight, not the level of the OD of interest appear to be applied to the bezel, the case of 15 weight%, the excessive amount of the colorant is not dispersed in the ink precipitate can be formed.

When the content of the colorant is within the range of OD is necessary 0.05 to 2.5, per 1.0㎛ film thickness can be maintained in the range of 0.25 to 1.0.

The ultraviolet-curable ink composition should contain a surfactant which lowers the surface tension of the ink composition to denote a small taper angle.

To the surface active agent may be used a commercially available product, for example, DIC (DaiNippon Ink & Chemicals)'s Megafack F-444, F-475, F-478, F-479, F-484, F-550, F-552 , F-553, F-555, F-570, RS-75 or Asahi Glass company Surflon S-111, S-112, S-113, S-121, S-131, S-132, S-141 and S-145 or Sumitomo M., Inc. Fluorad FC-93, FC-95, FC-98, FC-129, FC-135, FC-170C, FC-430 and FC-4430 or DuPont Zonyl FS-300, FSN, FSN-100, and BYK-306, and FSO's BYK, BYK-310, BYK-320, BYK-330, BYK-331, BYK-333, BYK-342, BYK-350, BYK-354, BYK-355, BYK- 356, BYK-358N, BYK-359, BYK-361N, BYK-381, BYK-370, BYK-371, BYK-378, BYK-388, BYK-392, BYK-394, BYK-399, BYK-3440, BYK-3441, BYKETOL-AQ, BYK-DYNWET 800, BYK-SILCLEAN 3700 and BYK-UV 3570 or Tego Corporation Rad 2100, Rad 2011, Glide 100, Glide 410, Glide 450, from the group consisting of such as Flow 370 and Flow 425 You can use that option.

The surfactant is preferably included at 0.1 to 5.0% by weight, more preferably 0.5 to 3.0% by weight of the ultraviolet curable ink composition total weight. When the content of the surfactant 0.1% by weight is less than the effect of lowering the surface tension of the composition is a coating defects when coating the composition to the substrate is generated due to insufficient, if it exceeds 5.0 wt%, the surface active agent is used in excess there is a problem in the compatibility and parcel of the composition to be reduced rather.

The ultraviolet-curable ink composition may further include a light sensitizer to compensate for curing of the active energy rays in the long wavelength.

The photosensitizers are anthracene, 9,10-dibutoxy anthracene, 9,10-dimethoxy-

Anthracene-based compounds such as anthracene, 9,10-diethoxy anthracene, 2-ethyl-9,10-dimethoxy-anthracene; Benzophenone, 4,4-bis (dimethylamino) benzophenone, 4,4-bis (diethylamino) benzophenone, 2,4,6-trimethyl-amino-benzophenone, -o- methyl benzoyl benzoate, 3, 3 -dimethyl-4-methoxybenzophenone, 3,3,4,4- tetra (t- butyl peroxy carbonyl) benzophenone compounds such as benzophenone; Acetophenone; Ketone-based compounds such as dimethoxy-acetophenone, diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, propanone; Perylene; Floresta based compounds of the 9-fluorenone-flow, such as 9-fluorenone Pro fluorenone, 2-methyl-9-flow 2-chroman; Such as thioxanthone, 2,4-diethyl thioxanthone, 2-chloro-thioxanthone, 1-chloro-4-propyloxy thioxanthone, isopropyl thioxanthone (ITX), diisopropyl thioxanthone tongye thioxanthone compound; Xanthan tongye compounds such as xanthone, 2-methyl-xanthone; Anthraquinone-based compounds such as anthraquinone, 2-methyl anthraquinone, 2-ethylanthraquinone, t- butyl-anthraquinone, 2,6-dichloro-9,10-anthraquinone; 9-phenyl-O, such as acridine, 1,7-bis (9-acridinyl) heptane, 1,5-bis (9-acridinyl-pentane), 1,3-bis (9-acridinyl) propane acridine-based compounds; Benzyl, l, 7,7-trimethyl-bicyclo [2,2,1] -dicarbonyl compounds such as 2,3-heptane-dione, 9,10-phenanthrene-quinone; 2,4,6-trimethylbenzoyl diphenylphosphine oxide, bis (2,6-dimethoxybenzoyl) -2,4,4- trimethylpentyl phosphine phosphine oxide-based compounds such as oxides; Methyl-4- (dimethylamino) benzoate, ethyl 4- (dimethylamino) benzoate, 2-n- butoxyethyl-4- (dimethylamino) benzoate compounds such as benzoate; 2,5-bis (4-diethylamino-benzalkonium) cyclopentanone, 2,6-bis (4-diethylamino-benzalkonium) cyclohexanone, 2,6-bis (4-diethylamino-benzalkonium) -4 host amino synergy such as cyclopentanone-methyl; 3,3-carbonyl carbon vinyl-7- (diethylamino) coumarin, 3- (2-benzothiazolyl) -7- (diethylamino) coumarin, 3-benzoyl-7- (diethylamino) coumarin, 3 -benzoyl-7-methoxy-coumarin, 10,10--carbonyl-bis [1,1,7,7- tetramethyl -2,3,6,7- tetrahydro -1H, 5H, 11H-C1] - benzo coumarin-based compounds such as quinolinium binary-11-on-pyrano [6,7,8-ij]; Chalcone compounds, such as 4-diethylamino-chalcone, 4-azido-benzalkonium acetophenone; 2-benzoyl methylene; And it may be at least one selected from the group consisting of 3-methyl-naphthyl -b- totiah sleepy.

The photosensitizers are based on 100 parts by weight of a photopolymerization initiator, and preferably an amount of 1 to 200 parts by weight, and more preferably at an amount of 10 to 100 wt. If less than 1 part by weight, there can not be expected a synergistic curing sensitivity in a desired wavelength, if not more than 200 parts by weight of a photosensitizer agent is not dissolved, there is a problem of decreasing the adhesive strength and the cross-linking density of the pattern.

The ultraviolet-curable ink composition may further include an adhesion promoter as an additive.

By a film deposited on the bezel pattern is repeated expansion and contraction with temperature and humidity conditions of use, is a stress is applied to the bezel, the pattern can be eliminated from the film and the bezel glass substrate. As adhesion enhancing agents in order to prevent this, an alkoxysilane-based compound, an epoxy silane compound, amino phenyl silane compound, amino silane-based compound, a mercapto-silane-based compound and a vinyl silane compound a silane-based compound at least one member selected from the group consisting of when using the can exhibit excellent results.

Among them, the epoxy silane compound is more preferred adhesion promoting agent of the present invention.

The adhesion promoter is preferably contained in 0.1 to 15% by weight based on the total weight of the ink composition, more preferably from 2 to 10% by weight. If 0.1 wt% is less than mothamyeo not prevented from peeling from the bezel pattern is described, there are, the viscosity rises and the low dispersibility of the problem when the ink solution exceeds 15% by weight.

UV-curable ink composition used in the present invention exhibits excellent adhesion characteristics to get up are spread in a short period of time immediately after the ink-jet printing, exhibit excellent coating properties, is cured. Therefore, when the ultraviolet-curable ink composition applied is preferable to provide a UV-lamp immediately after the ink-jet head to be able to be cured at the same time as ink jet printing.

The ultraviolet-curable ink composition may be 1 ~ 10,000 mJ / ㎠, preferably the amount of curing dose is 80 ~ 2,000 mJ / ㎠.

The ultraviolet-curable ink composition is cured by absorbing radiation in the wavelength range of 250 nm to 450 nm, preferably 360 nm to 410 nm.

The ultraviolet-curable ink composition is suitable for ink-jet process, by having a viscosity of less than 3cp to 45cp at 1cP to 50cP, and more preferably from 25 ℃ 25 ℃ example. UV-curable ink composition has a viscosity in the above range is excellent in discharge at a processing temperature. The process temperature is meant the temperature was heated to lower the viscosity of the curable ink composition. Process temperature may be 10 ℃ to 100 ℃, may preferably be 20 ℃ to 70 ℃.

The ultraviolet-curable ink composition is excellent in adhesive strength and coating properties to the substrate.

Further, the ultraviolet curable ink composition bezel pattern formed in accordance with the present invention by including a fluorine-based surfactant is excellent in adhesion to the upper substrate.

The ultraviolet upper end of the bezel, the pattern formed of the curable ink composition is attached with the upper substrate via an adhesive layer for the upper substrate, the ultraviolet curable ink composition is an acrylic pressure sensitive adhesive, a styrene butadiene rubber-based adhesive, an epoxy adhesive, a polyvinyl alcohol-based adhesive, polyurethane-based because it represents the upper substrate pressure-sensitive adhesive with excellent adhesion for the pressure-sensitive adhesive, etc., when using the UV-curable ink composition can be obtained the effect that the adhesion between the bezel pattern and the upper substrate to be improved. Preparation of the bezel and the pattern on the display substrate of the present invention the method uses a UV-curable ink composition.

Specifically, the manufacturing method of the bezel and the display pattern of the substrate of the present invention, a) the step of using the ultraviolet curable ink composition to form a bezel pattern onto the substrate; And b) a step of curing the bezel pattern; includes.

In addition, the manufacturing method of the bezel and the display pattern of the substrate of the present invention, prior to the step of forming the a) the bezel pattern may further comprise a cleaning and drying step of the substrate. This is to selectively carried out the surface treatment depending on the surface energy of the substrate for the removal of stains due to improved coating properties of the ink and foreign substances.

Specifically, the surface treatment may be carried out by wet processing such as surface treatment, UV ozone, a normal pressure plasma.

A method of forming a bezel pattern on the substrate may use an ink jet (Inkjet) printing, gravure (Gravure) coating and reverse offset (Reverse offset) method selected from the group consisting of coating with a radiation-curing resin instead of the photolithography and screen printing. The viscosity of the ink composition of the present invention to apply the above method may be a 1 cP to about 50 cP, preferably in the 3cp to 45cp.

An ink composition having a low viscosity of 1 cP to 50 cP in order to form the bezel pattern in a specific portion of a substrate by the method of 0.1 to 20 ㎛, and more specifically is applied to a height of 0.5 to 5 ㎛. The compositions are applied to and cured via exposure to ultraviolet light it includes, as a result, 0.1 to 20 ㎛, more specifically, can be prepared a pattern bezel having a thin film thickness of 0.5 to 5 ㎛.

A light source for curing the ultraviolet curable ink composition to the invention, for example, but the like having a wavelength of 250 to mercury vapor, which emits light 450㎚ of arc (arc), carbon arc, Xe arc, LED gyeonghwagi necessarily limited thereto no.

The bezel is a pattern taper angle is greater than 0 ° 30 °, measured after the curing treatment, characterized in that a thickness of 0.1㎛ ~ 20㎛. Further, the taper angle may preferably be greater than 0 ° 10 °. Further, the thickness may preferably be 0.5㎛ ~ 5㎛. Bezel pattern of the present invention may represent a short-circuit due to the large step by having the characteristic as described above, the bubbling and the luminous refined reduced according to the release of the film.

The optical density (OD) of the bezel, the pattern is necessary 0.05 to 2.5, per 1.0㎛ film thickness, may be 0.25 to 1.0. In this case, there is a superior advantage of the shielding properties due to the bezel pattern. If the optical density exceeds 2.5, since the required amount of pigment to be added becomes high, and so may adversely affect the production process and the ink-jet ink, an ultraviolet-curable ink composition can be inhibited from being cured by radiation.

The invention provides a bezel pattern of the display substrate manufactured by the method. Bezel pattern in the present invention refers to a pattern formed on the rims of the various devices such as watches, display devices.

The bezel is a pattern taper angle is greater than 0 ° 30 °, measured after the curing treatment, characterized in that a thickness of 0.1㎛ ~ 20㎛. Further, the taper angle may preferably be greater than 0 ° 10 °. Further, the thickness may preferably be 0.5㎛ ~ 5㎛. Bezel pattern of the present invention may represent a short-circuit due to the large step by having the characteristic as described above, the bubbling and the luminous refined reduced according to the release of the film.

The optical density (OD) of the bezel, the pattern is necessary 0.05 to 2.5, per 1.0㎛ film thickness, may be 0.25 to 1.0. In this case, there is a superior advantage of the shielding properties due to the bezel pattern. If the optical density exceeds 2.5, since the required amount of pigment to be added becomes high, and so may adversely affect the production process and the ink-jet ink, an ultraviolet-curable ink composition can be inhibited from being cured by radiation.

The present invention also provides a display substrate including the bezel pattern.

Wherein the display is a plasma display panel (Plasma Display Panel, PDP), light emitting diodes (Light Emitting Diode, LED), organic light emitting device (Organic Light Emitting Diode, OLED), liquid crystal display (Liquid Crystal Display, LCD), a thin film transistor liquid crystal of the display device (Thin Film Transistor- Liquid Crystal display, LCD-TFT) and a cathode ray tube (cathode Ray tube, CRT) can be used for any of them.

It will be described in detail below with reference to examples of the invention. The following examples are not limited to that, and the scope of the present invention comprises the claims and their substitutions and changes described in the claims below, the scope of the embodiments for explaining the present invention.

<Example>

To a mixture of a composition as in Table 1 and stirred for 3 hours, was prepared in Examples 1 to 4 and Comparative Examples 1 to 4. The composition for forming a pattern of the bezel.

Table 1

coloring agent Epoxy Oxetane A polymerization initiator Surfactants diluent
Example A B C D E G
One A1: 5 B1: 20 C2: 69 D1: 5 E1: 1 -
2 A1: 7.5 B1: 19 C2: 67.5 D1: 5 E1: 1 -
3 A1: 11 B1: 18 C2: 65 D1: 5 E1: 1 -
4 A1: 15 B1: 12 C2: 57 D2: 5 E1: 1 G1: 10
Comparative Example -
One A1: 0.5 B1: 24.5 C2: 73 D5: 1 E2: 1 -
2 A1: 7.5 B1: 10 C2: 80.5 D3: 1 E2: 1 -
3 A1: 20 B1: 20 C2: 58 D3: 1 E2: 1 -
4 A1: 40 B1: 10 C2: 48 D3: 1 E2: 1 -

A1: Carbon Black

B1: selrok side 2021P (by Daicel Corporation)

C2: 221 Aaron oxetane (Toa Gosei)

D1: CPI-200K (acid-Afro)

D2: Rhodorsil 2074 (Blue Star Silicone)

D3: Irgacure 290 (BASF)

D4: WPI-130 (WAKO)

E1: BYK-330 (BYK chemie)

G1: propylene glycol monomethyl ether acetate

<Preparation Example 1> Preparation of bezel pattern

In the above embodiments 1 to 4 and Comparative Examples 1 to 4, the LCD glass substrate washed with a composition prepared at a thickness after curing so that 2㎛ was coated with an inkjet coating method. By curing by irradiation with ultraviolet rays under the condition to the coating in less than one minute after coating in order to prevent foreign matter attached to form a bezel pattern. UV irradiation was used as a high-pressure mercury lamp was irradiated with a light amount of the reference UVV 1000mJ / cm 2.

<Preparation Example 2> Preparation of a display device using a bezel pattern

The display panel (the panel) forms a pattern in accordance with the bezel method of Preparation Example 1 to the top surface, which was then attached to LG Chemicals Manufacturing NRT polarizing film using the acrylic pressure-sensitive adhesive layer as described above. After attachment, was inkaep around a sealant to prevent moisture and foreign matter into the gap of the polarizing film with the pattern.

<Experimental Example 1>: Viscosity

In the above Examples 1 to 4 and Comparative Examples 1 to 4 were measured for viscosity on a composition prepared. The DV-Ⅲ + Brookfield's viscosity by measuring equipment was used.

<Experimental Example 2> Measurement of curing sensitivity

Press after wear latex gloves in a lapse of 5 minutes after UV irradiation In order to measure the sensitivity of the cure time of a bezel pattern produced according to the Production Example 1 was confirmed that the surface condition of the bore.

○: Bezel pattern is not sticky, it is completely cured

△: the bezel, but the pattern curing, there is stickiness

×: the insufficient and non-reacted residue is buried M hardening of the bezel pattern

<Experimental Example 3> evaluated spreadability

After application on the embodiments 1 to 4 and Comparative Examples 1 to 2, the LCD glass substrate cleaned with a composition in the manufacture, to measure the contact angle.

<Experiment 4>: OD bezel pattern evaluation

An ink jet coating instead of spin-coated film bezel OD exposure produced was coated on a conventional LCD glass substrate as in the method of Production Example 1 was measured by X-rite Corp. OD meter. OD was checked for hiding power that can block the transient rental internal wire and a base metal was converted to a standard 1㎛ thickness, the coating on the LCD display panel.

Table 2

Example Viscosity Curing presence Spreadability OD values
Condition (CP) After 5 min UV irradiation, O: tack-free △: tack feeling X: Uncured The contact angle O: <10 ° △: 10 ° ~ 30 ° X:> 30 ° / 1㎛
One 16 O O 0.33
2 20 O O 0.47
3 42 O O 0.72
4 44 O O 1.25
Comparative Example
One 15 O O 0.04
2 15 O 0.50
3 52 X O 1.89
4 A coloring agent is not uniformly dispersed in the composition

Examples 1 to a bezel, a pattern formed by the ink composition of 4, but the curing sensitivity and the OD is satisfactory, but the ink composition of Comparative Example 1, the curing sensitivity is good, was hiding power is insufficient, the ink composition of Comparative Example 3 had a viscosity is high, the curing time of curing was insufficient with only ultraviolet light. But. When hayeoteul more thermosetting through post-baking for 10 minutes (post-bake) process in FIG. 60 is a cured film was formed showed a very high hiding power. The composition of Comparative Example 2, but the viscosity is appropriate and OD, the curing time of curing was insufficient with only ultraviolet light. Comparative compositions of examples 4 to OD is however expected to be at least 2.5 per 1.0㎛ excessive content of the colorant, it was a problem that the colorant aggregates not being evenly dispersed in the ink composition when considering the content of the colorant.

Claims (37)

  1. A coloring agent, and an epoxy resin, an oxetane resin and a photopolymerization initiator,
    And 6: the content ratio of the oxetane resin 1: The epoxy resin, 0.5 to 1
    Taper angle after curing is 0 ° ~ 30 ° and, OD (Optical Density) value of 0.05 to 2.5 per film thickness of 1.0㎛ UV-curable ink composition.
  2. The method according to claim 1,
    Surfactants, adhesion promoters, UV-curable ink composition according to claim 1, further comprising at least one selected from the group consisting of a diluent and photosensitizer agent.
  3. The method according to claim 1,
    The oxetane resin is an ultraviolet curing type ink composition comprising the oxetane compound having an oxetane compound and two oxetane rings having one oxetane ring.
  4. The method according to claim 3,
    An oxetane compound having one oxetane ring wherein: the oxide content ratio of cetane compound having two oxetane rings 1:16 to 1: UV-curable ink composition, characterized in that 3.
  5. The method according to claim 1,
    The amount of the epoxy resin is an ultraviolet-curable ink composition, characterized in that 5 to 50% by weight relative to the total weight of the UV-curable ink composition.
  6. The method according to claim 1,
    The oxide content of the cetane resin is UV-curable ink composition according to claim 15 to 75% by weight based on the total weight of the UV-curable ink composition.
  7. The method according to claim 1,
    The photopolymerization initiator is an ultraviolet-curable ink composition according to claim iodonium salt or a sulfonium salt.
  8. The method according to claim 1,
    The amount of the photopolymerization initiator is a UV-curable ink composition, characterized in that 1 to 15% by weight relative to the total weight of the UV-curable ink composition.
  9. The method according to claim 1,
    The amount of the coloring agent is a UV-curable ink composition, characterized in that 1 to 15% by weight relative to the total weight of the UV-curable ink composition.
  10. The method according to claim 2,
    The amount of the diluent is a UV-curable ink composition, characterized in that 0 to 30% by weight relative to the total weight of the UV-curable ink composition.
  11. The method according to claim 2,
    The surface active agent is an ultraviolet-curable ink composition which is characterized in that the fluorine-containing surfactant.
  12. The method according to claim 11,
    The fluorine-containing surfactant is an ultraviolet-curable ink composition which is characterized in that comprises from 0.1 to 5.0% by weight based on the total weight of the UV-curable ink composition.
  13. The method according to claim 2,
    The light sensitizer is an ultraviolet-curable ink composition which is characterized in that an amount of 1 to 200 parts by weight based on 100 parts by weight of the photopolymerization initiator.
  14. The method according to claim 2,
    The adhesion promoter is an ultraviolet-curable ink composition, characterized in that an epoxy silane compound.
  15. The method according to claim 2,
    The adhesion promoter is an ultraviolet-curable ink composition which is characterized in that comprises from 0.1 to 15% by weight relative to the ultraviolet curable ink composition total weight.
  16. The method according to claim 1,
    UV-curable ink compositions cure dose amount of the ultraviolet-curable ink composition characterized in that 1 ~ 10,000 mJ / ㎠.
  17. The method according to claim 1,
    UV-curable ink composition The viscosity of the ultraviolet-curable ink composition is from 25 ℃ wherein the 1cp to 50cp.
  18. The method according to claim 17,
    UV-curable ink composition The viscosity of the ultraviolet-curable ink composition is from 25 ℃ characterized in that 3cp to 45cp.
  19. The method according to claim 1,
    UV-curable ink composition which is characterized in that the taper angle is 0 ° ~ 10 °.
  20. The method according to claim 1,
    The ultraviolet-curable ink composition is UV-curable ink composition, characterized in that the bezel Pattern tolerated.
  21. comprising the steps of: a) using a UV-curable ink composition of claim 1, forming a bezel, a pattern on a substrate; And
    b) the step of curing the bezel pattern; method of producing a pattern for a display substrate including a bezel.
  22. The method according to claim 21,
    The a) method for producing a substrate for a display bezel pattern comprising previously forming a bezel pattern, further more pohamreul cleaning and drying step of the substrate.
  23. The method according to claim 22,
    Cleaning and drying step of the substrate is a wet surface treatment, UV ozone treatment, method of producing a normal pressure plasma treatment group which bezel pattern for a display substrate, characterized in that is carried by one or more processes selected from the consisting of.
  24. The method according to claim 21,
    Wherein a) a method of forming a bezel pattern onto the substrate in the step is an ink jet (Inkjet) printing, gravure (Gravure) coating and reverse offset (Reverse offset) process for producing a bezel pattern for a display substrate characterized in that the method selected from the coating .
  25. The method according to claim 21,
    The a) step is producing a pattern bezel for the display substrate, comprising a step carried out at a process temperature of 10 ℃ to 100 ℃.
  26. The method according to claim 25,
    The a) step is producing a pattern bezel for the display substrate, characterized in that for performing the process temperature of 20 ℃ to 70 ℃.
  27. The method according to claim 21,
    The method of the bezel pattern for a display substrate, characterized in that a thickness of the bezel 0.1㎛ ~ 20㎛ pattern.
  28. The method according to claim 27,
    The method of the bezel pattern for a display substrate, characterized in that a thickness of the bezel 0.5㎛ ~ 5㎛ pattern.
  29. The method according to claim 21,
    Method for manufacturing a taper angle of 0 ° ~ 30 ° bezel pattern for a display substrate, characterized in that the bezel of the pattern.
  30. The method according to claim 29,
    Method for manufacturing a taper angle of 0 ° ~ 10 ° bezel pattern for a display substrate, characterized in that the bezel of the pattern.
  31. The method according to claim 21,
    0.05 ~ 2.5 The method of producing a pattern-bezel for the display substrate, characterized in that sugar is the OD value of the bezel pattern 1.0㎛ thickness.
  32. The ultraviolet-curable ink composition of Claim 1 is hardened, the bezel pattern for a display substrate is formed on the substrate.
  33. The method according to claim 32,
    Bezel pattern for a display substrate, characterized in that the thickness of the bezel, the pattern 0.1㎛ ~ 20㎛.
  34. The method according to claim 33,
    Bezel pattern for a display substrate, characterized in that the thickness of the bezel, the pattern 0.5㎛ ~ 5㎛.
  35. The method according to claim 32,
    Bezel pattern for a display substrate, characterized in that the taper angle of the bezel, the pattern of 0 ° ~ 30 °.
  36. The method according to claim 35,
    Bezel pattern for a display substrate, characterized in that the taper angle of the bezel, the pattern of 0 ° ~ 10 °.
  37. The method according to claim 32,
    Bezel pattern for a display substrate, characterized in that the OD value of the bezel pattern 0.05 to 2.5 per film thickness 1.0㎛.
PCT/KR2015/010345 2014-09-26 2015-09-30 Uv-curable ink composition, method for producing bezel pattern of display substrate using same, and bezel pattern produced thereby WO2016048119A1 (en)

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KR20140129417 2014-09-26
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KR1020150138098A KR101818306B1 (en) 2014-09-26 2015-09-30 Uv-curable ink composition, manufacturing method for bezel pattern of display panel and bezel pattern of display panel using the same

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CN201580063817.6A CN107004384A (en) 2014-09-26 2015-09-30 Uv-curable ink composition, method for producing bezel pattern of display substrate using same, and bezel pattern produced thereby
US15/514,306 US10227498B2 (en) 2014-09-26 2015-09-30 UV-curable ink composition, method for producing bezel pattern of display substrate using same, and bezel pattern produced thereby

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010007000A (en) * 2008-06-30 2010-01-14 Osaka Sealing Printing Co Ltd Radiation-curable composition and inkjet ink containing the same
JP2010013596A (en) * 2008-07-07 2010-01-21 Konica Minolta Ij Technologies Inc Active ray-curable inkjet ink composition
KR20130132322A (en) * 2012-05-25 2013-12-04 주식회사 엘지화학 Photosensitive resin composition, pattern formed by using the same and display panel comprising the same
WO2014010884A1 (en) * 2012-07-11 2014-01-16 주식회사 엘지화학 Method for forming bezel pattern on display substrate
KR20140086584A (en) * 2012-12-28 2014-07-08 삼성전기주식회사 Photo-sensitive resin composition for bezel of touch screen module and bezel for touch screen module using the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010007000A (en) * 2008-06-30 2010-01-14 Osaka Sealing Printing Co Ltd Radiation-curable composition and inkjet ink containing the same
JP2010013596A (en) * 2008-07-07 2010-01-21 Konica Minolta Ij Technologies Inc Active ray-curable inkjet ink composition
KR20130132322A (en) * 2012-05-25 2013-12-04 주식회사 엘지화학 Photosensitive resin composition, pattern formed by using the same and display panel comprising the same
WO2014010884A1 (en) * 2012-07-11 2014-01-16 주식회사 엘지화학 Method for forming bezel pattern on display substrate
KR20140086584A (en) * 2012-12-28 2014-07-08 삼성전기주식회사 Photo-sensitive resin composition for bezel of touch screen module and bezel for touch screen module using the same

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