WO2024134777A1 - Observation device, observation method, and method for manufacturing semiconductor device - Google Patents

Abstract

An observation device (100) according to the present embodiment comprises: a mechanism for levitating or supporting a substrate (16) such that a space is formed directly below the substrate; a conveyance mechanism for conveying the substrate on the mechanism in a conveyance direction; an observation unit (50) that comprises an optical detector (52) that detects light from the substrate (16) and an optical system (51) that guides the light from the substrate (16) to the optical detector (52); and a movement mechanism (55) that moves the observation unit (50) in a direction inclined to the conveyance direction in a top view.

Description

Observation device, observation method, and semiconductor device manufacturing method

The present invention relates to an observation device, an observation method, and a manufacturing method for a semiconductor device.

Patent Document 1 discloses a laser annealing device that uses an excimer laser. In this patent document, a levitation unit levitates a substrate, and a transport unit transports the substrate. A line-shaped laser beam is then irradiated onto the substrate during transport. Furthermore, this laser irradiation device has a line sensor provided on the substrate. The line sensor captures an image of the substrate during transport.

JP 2018-64048 A

In such devices, it is desirable to be able to properly observe the substrate.

Other objects and novel features will become apparent from the description of this specification and the accompanying drawings.

According to one embodiment, the observation device includes an observation unit including a mechanism for floating or supporting the substrate so that a space is formed directly below the substrate, a transport mechanism for transporting the substrate above the mechanism in a transport direction, a photodetector for detecting light from the substrate, and an optical system for directing the light from the substrate to the photodetector, and a movement mechanism for moving the observation unit in a direction inclined to the transport direction in a top view so as to change the observation position of the substrate.

According to one embodiment, the observation method is an observation method in an observation device that includes an observation unit that includes a mechanism for floating or supporting the substrate so that a space is formed directly below the substrate, a photodetector for detecting light from the substrate, and an optical system for directing the light from the substrate to the photodetector, and includes the steps of (A1) a transport mechanism transporting the substrate in a transport direction, (A2) using the observation unit to observe the substrate transported by the transport mechanism, and (A3) moving the observation unit in a direction inclined from the transport direction in a top view to change the observation position of the substrate and observe the substrate.

According to one embodiment, a method for manufacturing a semiconductor device includes the steps of: (S1) using a mechanism to float or support the substrate so that a space is formed directly below the substrate; (S2) using a transport mechanism to transport the substrate on the mechanism in a transport direction; (S3) using an observation unit that includes a photodetector that detects light from the substrate and an optical system that directs the light from the substrate to the photodetector; and (S4) using a movement mechanism to move the observation unit in a direction inclined from the transport direction in a top view so as to change the observation position of the substrate.

According to the above embodiment, it is possible to provide an observation device, an observation method, and a method for manufacturing a semiconductor device that can properly observe a substrate.

1 is an XY plan view illustrating a schematic diagram of an observation device according to a first embodiment; 1 is an XZ plan view illustrating a schematic view of an observation device according to a first embodiment; 1 is a YZ plan view illustrating a schematic view of an observation device according to a first embodiment. FIG. 2 is an enlarged view showing the configuration of an observation unit. FIG. 11 is an XY plan view illustrating an observation device according to a second embodiment. FIG. 11 is an XZ plan view illustrating an observation device according to a second embodiment. FIG. 11 is an XY plan view illustrating an observation device according to a third embodiment. FIG. 13 is an XZ plan view illustrating an observation device according to a third embodiment. FIG. 13 is an XY plan view illustrating an observation device according to a fourth embodiment. FIG. 13 is an XZ plan view illustrating an observation device according to a fourth embodiment. FIG. 2 is an enlarged XY plan view showing the configuration of an observation unit and an adsorption portion. 11 is an XZ plan view showing an enlarged configuration of the observation unit when the suction unit suctions the substrate. FIG. 11 is an XZ plan view showing an enlarged configuration of the observation unit when the suction unit releases the suction fixation of the substrate. FIG. FIG. 13 is an XZ plan view illustrating an observation device according to a fifth embodiment. FIG. 2 is an XY plan view showing a schematic configuration of the precision levitation unit. FIG. 2 is an XZ plan view illustrating a schematic configuration of the precision levitation unit. FIG. 23 is an XY plan view illustrating an observation device according to a sixth embodiment. FIG. 23 is an XZ plan view illustrating an observation device according to a sixth embodiment. FIG. 23 is an XY plan view illustrating an observation device according to a seventh embodiment. FIG. 23 is an XZ plan view illustrating an observation device according to a seventh embodiment. FIG. 23 is an XY plan view illustrating an observation device according to an eighth embodiment. FIG. 23 is an XZ plan view illustrating an observation device according to an eighth embodiment. FIG. 23 is a YZ plan view illustrating an observation device according to an eighth embodiment. FIG. 23 is an XY plan view illustrating a schematic configuration of an observation device according to an eighth embodiment when the movement direction is changed. FIG. 13 is an XY plan view illustrating an observation device according to a ninth embodiment. FIG. 13 is an XZ plan view illustrating an observation device according to a ninth embodiment. FIG. 23 is a YZ plan view illustrating an observation device according to a ninth embodiment. FIG. 23 is an XY plan view illustrating an observation device according to a tenth embodiment. FIG. 23 is an XZ plan view illustrating an observation device according to a tenth embodiment. FIG. 2 is a schematic diagram showing a configuration of a laser irradiation device equipped with an observation device. 1 is a cross-sectional view showing a simplified configuration of an organic EL display. 1A to 1C are cross-sectional views showing steps of a manufacturing method of a semiconductor device according to an embodiment of the present invention. 1A to 1C are cross-sectional views showing steps of a manufacturing method of a semiconductor device according to an embodiment of the present invention.

The observation device in this embodiment is an observation device for observing a substrate from the back side. For example, the substrate is a glass substrate for an organic EL display. Various patterns such as a metal wiring layer, a transparent electrode layer, a semiconductor layer, a light-emitting layer, and a color filter layer are formed on the glass substrate. In other words, multiple patterns are formed on the glass substrate.

In the figures below, for ease of explanation, an XYZ three-dimensional Cartesian coordinate system is shown where appropriate. The Z direction is the vertical direction, and is perpendicular to the main surface of the substrate. The XY plane is a plane parallel to the main surface of the substrate. The XY directions are parallel to the edges of the rectangular substrate. The X direction is the substrate transport direction. The Y direction is perpendicular to the X and Z directions.

First embodiment
The configuration of the observation device according to the first embodiment will be described with reference to Fig. 1 to Fig. 3. Fig. 1 is a top view (XY plan view) that shows a schematic configuration of the observation device 100. Fig. 2 is a side view (XZ plan view) that shows a schematic configuration of the laser irradiation device 1. Fig. 3 is a side view (YZ plan view) that shows a schematic configuration of the laser irradiation device 1.

The observation device 100 includes a levitation unit 10, a transport mechanism 11, and an observation unit 50. As shown in FIG. 2, the levitation unit 10 is configured to eject gas from the surface of the levitation unit 10. The levitation unit 10 levitates the substrate 16 with its upper surface. The gas ejected from the surface of the levitation unit 10 is sprayed onto the underside of the substrate 16, causing the substrate 16 to levitate. For example, when the substrate 16 is transported, the levitation unit 10 adjusts the amount of levitation so that the substrate 16 does not come into contact with other mechanisms (not shown) arranged above the substrate 16.

The levitation unit 10 ejects gas onto the substrate 16 so as not to come into contact with the substrate 16. Thus, a space G is formed directly below the substrate 16. The space G is a tiny air gap created by the gas from the levitation unit 10. In other words, the space G is the gap from the upper surface of the levitation unit 10 to the lower surface of the substrate 16. The gas ejected from the levitation unit 10 may be air, nitrogen, or a dry gas.

The levitation unit 10 is a mechanism for levitating the substrate 16 so that a space G is formed directly below the substrate 16. The levitation unit 10 has a plurality of levitation unit cells 10a and levitation unit cells 10b. The levitation unit cell 10b is disposed on the +X side of the levitation unit cell 10a. The levitation unit cells 10a and 10b are disposed across a gap 17. Each of the levitation unit cells 10a and 10b ejects gas. An observation unit 50 is disposed between the levitation unit cells 10a and 10b. The observation unit 50 will be described later.

The levitation unit cell 10a and the levitation unit cell 10b may be formed of a porous body such as ceramic. Porous bodies that can be used include porous carbon, porous alumina ceramic, and porous SiC ceramic. The levitation unit cell 10a and the levitation unit cell 10b may be formed of a metal material having multiple gas ejection holes.

A transport mechanism 11 is disposed on the +Y side of the levitation unit 10. The transport mechanism 11 transports the levitated substrate 16 in the transport direction. As shown in FIG. 3, the transport mechanism 11 has a holding mechanism 12 that vacuum-sucks the end of the substrate 16. The holding mechanism 12 suction-holds the end of the substrate 16 on the +Y side.

For example, the holding mechanism 12 can be constructed using a vacuum suction mechanism. The vacuum suction mechanism is made of a metal material such as an aluminum alloy. Alternatively, the holding mechanism 12 may be made of a resin material such as PEEK (polyether ether ketone). The upper surface of the holding mechanism 12 has suction grooves, suction holes, etc. formed thereon. The holding mechanism 12 may also be made of a porous material.

The holding mechanism 12 is connected to the drive mechanism 13. The drive mechanism 13 moves the holding mechanism 12 in the X direction. The drive mechanism 13 is equipped with an actuator such as an air cylinder or a motor. For example, the drive mechanism 13 has a guide mechanism along the X direction. The drive mechanism 13 slides the holding mechanism 12 along the X direction. This allows the transport mechanism 11 to transport the substrate 16 in the X direction. Furthermore, the drive mechanism 13 may have a lifting mechanism for raising and lowering the holding mechanism 12 in the Z direction (up and down direction).

In the X direction, an observation unit 50 is disposed in the gap 17 between the levitation unit cell 10a and the levitation unit cell 10b. The observation unit 50 includes a photodetector 52 and an optical system 51. The photodetector 52 may be a CCD (Charge-Coupled Device) camera, a CMOS (Complementary metal-oxide-semiconductor) image sensor, or a photodiode array. The photodetector 52 is a camera with pixels arranged in the X and Y directions.

The optical system 51 guides light from the substrate 16 to the photodetector 52. This allows the photodetector 52 to capture an image of the substrate 16. For example, the optical system 51 has an objective lens that magnifies and forms an image of the substrate 16. For example, the observation unit 50 can capture an image magnified 50 to 100 times. The optical system 51 may also have other optical elements such as lenses, beam splitters, and filters.

A cable 53 is connected to the photodetector 52 for power supply and signal input/output. The image data captured by the photodetector 52 is stored in a memory or the like. Alternatively, the image may be displayed on an external monitor.

Furthermore, the observation unit 50 is connected to a moving mechanism 55. The moving mechanism 55 moves the observation unit 50 in the Y direction. Here, the photodetector 52 moves together with the optical system 51. In the XY plan view, the position of the observation unit 50 with respect to the substrate 16 changes. The observation device 100 can change the observation position of the substrate 16.

The moving mechanism 55 changes the Y-direction position of the observation unit 50. Furthermore, the transport mechanism 11 transports the substrate 16 in the X-direction. This allows the observation unit 50 to image any position on the substrate 16. The observation device 100 can image multiple observation positions on the substrate 16. Because the relative position of the observation unit 50 to the substrate 16 changes in the XY directions, the observation device 100 can make a desired position on the substrate 16 the observation position. Note that, in a top view, the moving direction of the moving mechanism 55 and the transport direction of the transport mechanism 11 are not limited to the directions shown in the figure. In a top view, the moving direction of the moving mechanism 55 and the transport direction of the transport mechanism 11 are not limited to being orthogonal, but may be inclined.

2 and 3, an illumination light source 59 is disposed above the substrate 16. The illumination light source 59 generates illumination light for illuminating the substrate 16. The observation unit 50 receives light from the area illuminated by the illumination light source 59. A lens or the like may be provided to focus the illumination light from the illumination light source 59 onto the substrate 16.

The illumination light source 59 is not limited to being located on the substrate 16. For example, the illumination light source 59 may be arranged so as to illuminate coaxially with the optical axis of the optical system 51. Furthermore, the illumination light source 59 may be a ring light arranged on the outside of the lens. Alternatively, an indoor light may be used as the illumination light source 59. The illumination light source 59 may generate linear illumination light with the Y direction as the longitudinal direction. Alternatively, as described below, it may move along the Y direction together with the observation unit 50.

FIG. 4 is an enlarged view of the configuration of the observation unit 50. In FIG. 4, the lens barrel of the objective lens 51a is shown as the optical system 51. The optical system 51 is fixed to the photodetector 52. Light refracted by the optical system 51 is imaged on the image sensor 52a of the photodetector 52. The image sensor 52a is a two-dimensional array photodetector having multiple pixels arranged in the X and Y directions. Note that, although only one lens is shown inside the lens barrel of the objective lens 51a in FIG. 4, multiple lenses may be provided.

For example, the optical axis of the objective lens 51a is parallel to the Z direction. Therefore, the observation position of the substrate 16 is directly above the photodetector 52. If the height of the substrate 16 changes beyond the focal depth D of the objective lens 51a, the image of the substrate 16 will become blurred. In this embodiment, the levitation unit 10 is used, so the height of the substrate 16 can be controlled with high precision. By using the observation device 100 according to this embodiment, the substrate 16 can be properly observed.

In particular, the levitation units 10 are arranged on both sides of the substrate 16 in the X direction. That is, the levitation unit cell 10a is arranged on the -X side of the substrate 16, and the levitation unit cell 10b is arranged on the +X side of the substrate 16. In this way, fluctuations in the height of the substrate 16 can be suppressed, and therefore blurring of the image can be prevented. By using the observation device 100 according to this embodiment, the substrate 16 can be properly imaged.

Also, as shown in Figures 2 and 3, a part of the optical system 51 is disposed above the floating surface of the floating unit 10. Specifically, the upper end of the objective lens 51a is disposed above the floating surface of the floating unit 10. This allows an objective lens 51a with a short working distance to be mounted on the optical system 51. Since an objective lens with a large numerical aperture can be used, the observation unit 50 can capture high-resolution images.

The observation unit 50 is disposed below the substrate 16. The substrate 16 can be observed from the back side. In other words, the pattern formed on the substrate 16 can be imaged through the transparent substrate. Even if an opaque metal layer or the like is formed on the top side of the substrate 16, the underlying pattern of the opaque layer of the substrate 16 can be properly imaged. This allows the substrate to be inspected with high precision.

Embodiment 2
The observation device 100 according to the second embodiment will be described with reference to Fig. 5 and Fig. 6. Fig. 5 is an XY plan view showing the configuration of the observation device 100. Fig. 6 is an XZ plan view showing the configuration of the observation device 100. In the second embodiment, the configuration of the levitation unit 10 is different from that of the first embodiment. The configuration other than the levitation unit 10 is the same as that of the first embodiment, so the description will be omitted.

Here, the levitation unit 10 is not separated into two levitation unit cells 10a, 10b. In other words, the levitation unit 10 is formed as a single unit. The levitation unit 10 is provided with an opening 10c for placing the observation unit 50. The opening 10c is provided along the Y direction. In other words, the opening 10c is a rectangle with the Y direction as its longitudinal direction and the X direction as its transverse direction. The observation unit 50 moves in the Y direction inside the opening 10c.

Even with this configuration, the substrate 16 can be properly observed. The levitation units 10 are arranged on both sides of the substrate 16 in the X direction. In this way, fluctuations in the height of the substrate 16 can be suppressed. By using the observation device 100 according to this embodiment, the substrate 16 can be properly imaged.

The space for placing the observation unit 50 is not limited to the opening 10c, but may be a recess or the like. In other words, a groove along the Y direction may be formed on the upper surface of the levitation unit 10. Then, the movement mechanism 55 may move the observation unit 50 along the groove.

Embodiment 3
An observation device 100 according to the third embodiment will be described with reference to Fig. 7 and Fig. 8. Fig. 7 is an XY plan view showing the configuration of the observation device 100. Fig. 8 is an XZ plan view showing the configuration of the observation device 100. In the third embodiment, a support unit 30 is provided instead of the levitation unit 10 of the first and second embodiments. Note that the configuration other than the support unit 30 is similar to that of the first embodiment, and therefore description thereof will be omitted.

The support unit 30 includes a base stage 31 and a number of transport rollers 33. The base stage 31 is disposed directly below the substrate 16. The base stage 31 is provided with a number of transport rollers 33. In the XY plane view, the multiple transport rollers 33 are arranged in an array. The multiple transport rollers 33 are rotatably attached to the base stage 31. The rotation axis 34 of the transport rollers 33 is parallel to the Y axis.

The transport rollers 33 are positioned above the base stage 31. Therefore, the transport rollers 33 come into contact with the bottom surface of the substrate 16. The heights of the multiple transport rollers 33 are the same. As the transport rollers 33 rotate, the substrate 16 is transported in the X direction.

With this configuration, a space G is formed directly below the substrate 16. The support unit 30 is a mechanism that supports the substrate 16 so that a space G is formed directly below the substrate 16. The objective lens of the optical system 51 is disposed in the space G directly below the substrate 16. Therefore, similar to the first and second embodiments, the observation unit 50 can properly image the substrate 16. This allows the substrate 16 to be properly observed.

Fourth embodiment
An observation device according to the fourth embodiment will be described with reference to Fig. 9 and Fig. 10. Fig. 9 is an XY plan view showing the configuration of the observation device 100. Fig. 10 is an XZ plan view showing the configuration of the observation device 100. In this embodiment, a suction unit 60 is provided around the observation unit 50. The configuration other than the suction unit 60 is the same as that of the first embodiment, and therefore description thereof will be omitted.

The suction unit 60 fixes the substrate 16 by vacuum suction. The observation unit 50 is housed inside the suction unit 60. The movement mechanism 55 moves the observation unit 50 together with the suction unit 60 in the Y direction.

The configuration of the suction unit 60 will be described with reference to Figures 11 and 12. Figure 11 is a top view showing the configuration of the suction unit 60. Figure 12 is an XZ cross-sectional view showing the configuration of the suction unit 60.

The suction unit 60 has an suction portion 61, a storage portion 62, and a window portion 63. The storage portion 62 is a case (housing) for storing the observation unit 50. The photodetector 52 and the optical system 51 are fixed to the storage portion 62. The cable 53 is taken out to the outside of the storage portion 62. The movement mechanism 55 moves the storage portion 62 along the Y direction. This moves the observation unit 50, making it possible to change the observation position on the substrate 16 in the Y direction.

Furthermore, an adsorption part 61 is provided on the upper side of the storage part 62. The adsorption part 61 is capable of adsorbing and holding the substrate 16 by sucking in gas from its upper surface. The upper surface of the adsorption part 61 serves as an adsorption surface. The upper end of the objective lens 51a is lower than the adsorption surface of the adsorption part 61.

The suction portion 61 is provided with a circular window portion 63. Light from the substrate 16 passes through the window portion 63 and enters the optical system 51. The window portion 63 may be a space, or may have a transparent material such as glass disposed therein. This allows the suction unit 60 to suction and hold the entire circumference of the observation area of the substrate 16. The suction unit 60 can suction and hold the area surrounding the observation area of the substrate 16.

The suction unit 60 fixes the substrate 16 by vacuum suction. This makes it possible to further suppress fluctuations in the height of the substrate 16. In other words, the distance from the objective lens 51a to the bottom surface of the substrate 16 can be kept constant, allowing for more appropriate observation. This allows for stable observation.

The suction unit 60 suctions and holds the substrate 16 when the substrate 16 is observed. When the substrate 16 is transported, the suction unit 60 releases the suction hold. For example, as shown in FIG. 13, gas can be ejected from the suction section 61. This creates a space G between the substrate 16 and the suction section 61. In other words, the transport mechanism 11 can transport the substrate 16 so that the substrate 16 floats in the air.

Fifth embodiment
An observation device according to the fifth embodiment will be described with reference to Fig. 14. Fig. 14 is an XZ plan view showing the configuration of an observation device 100. In this embodiment, a precision levitation unit 80 is provided around an observation unit 50. In other words, the suction unit of the fourth embodiment is replaced with the precision levitation unit 80. The configuration other than the precision levitation unit 80 is the same as that of the first embodiment, and therefore description thereof will be omitted.

The configuration of the precision levitation unit 80 will be described with reference to Figures 15 and 16. Figure 15 is a top view showing the configuration of the precision levitation unit 80. Figure 16 is an XZ cross-sectional view showing the configuration of the precision levitation unit 80.

The precision levitation unit 80 comprises a storage section 82 and a suction/ejection section 81. The storage section 82 is a case (housing) for storing the observation unit 50. The photodetector 52 and the objective lens 51a are fixed to the storage section 82. The cable 53 is taken out to the outside of the storage section 82. The movement mechanism 55 moves the storage section 82 along the Y direction. This moves the observation unit 50, making it possible to change the observation position on the substrate 16 in the Y direction.

A suction/spray unit 81 is provided above the storage unit 82. The suction/spray unit 81 sucks in gas from its upper surface and sprays the gas onto the substrate 16. The gas from the suction/spray unit 81 is sprayed onto the underside of the substrate 16, causing the substrate 16 to float. The suction/spray unit 81 sucks in gas that is present between the substrate 16 and the suction/spray unit 81.

The suction/ejection section 81 is a precision levitation unit cell made of a porous body such as ceramic. Porous bodies that can be used include porous carbon, porous alumina ceramic, and porous SiC ceramic.

The suction/jetting part 81 ejects gas upward. The suction/jetting part 81 is also provided with suction holes that suck in gas. The porous body has suction holes machined into it at predetermined intervals that reach the top surface. The suction holes are tiny holes that create a negative pressure between the substrate 16 and the suction/jetting part 81. The porous body ejects gas from almost the entire surface except for the suction holes. The ejection surface that creates a positive pressure is formed on almost the entire surface except for the suction holes. Alternatively, the suction/jetting part 81 may be formed from a metal block having multiple suction holes and multiple ejection holes.

Because the suction/ejection part 81 ejects gas onto the underside of the substrate 16, a tiny space G is formed between the suction/ejection part 81 and the substrate 16. The space G is an air gap created by the gas from the suction/ejection part 81. Furthermore, the suction/ejection part 81 sucks in the gas in the space G. This generates a suction force that sucks the substrate 16 downward, achieving high floating accuracy.

The suction/ejection unit 81 is provided with a circular window 83. Light from the substrate 16 passes through the window 83 and enters the optical system 51. The window 83 may be a space, or may be made of a transparent material such as glass. This allows the suction/ejection unit 81 to suck in gas from the entire periphery of the observation area of the substrate 16. The suction/ejection unit 81 can levitate the area surrounding the observation area of the substrate 16 with high levitation accuracy. This can increase the levitation accuracy around the observation unit 50. This allows the observation unit 50 to properly image the substrate 16.

Furthermore, in this embodiment, the substrate 16 is not fixed by suction. Therefore, the observation unit 50 can capture an image of the substrate 16 even while the substrate 16 is being transported. In other words, the observation unit 50 can capture an image of the substrate 16 while it is moving. This allows the substrate 16 to be captured efficiently. The substrate 16 can be observed and inspected with high productivity.

Sixth embodiment
An observation apparatus according to the sixth embodiment will be described with reference to Fig. 17 and Fig. 18. Fig. 17 is an XY plan view showing the configuration of the observation apparatus 100. Fig. 18 is an XZ plan view showing the configuration of the observation apparatus 100.

In this embodiment, the configuration of the levitation unit 10 differs from that of embodiment 1. Specifically, the levitation unit 10 includes levitation unit cells 10a and 10b and precision levitation unit cells 10d and 10e. The configuration other than the precision levitation unit cells 10d and 10e is the same as in embodiment 1, so a description thereof will be omitted.

The precision levitation unit cells 10d, 10e, like the suction/ejection unit 81 of embodiment 5, both suck in and eject gas. Because the precision levitation unit cells 10d, 10e eject gas onto the underside of the substrate 16, a minute space G is formed between the precision levitation unit cells 10d, 10e and the substrate 16. The space G is an air gap created by the gas from the precision levitation unit cells 10d, 10e. Furthermore, the precision levitation unit cells 10d, 10e suck in the gas in the space G. This creates a suction force that sucks the substrate 16 downward, achieving high levitation precision.

In the X direction, the precision levitation unit cells 10d and 10e are arranged on both sides of the observation unit 50. That is, the precision levitation unit cell 10d is arranged on the -X side of the observation unit 50, and the precision levitation unit cell 10e is arranged on the +X side of the observation unit 50. This makes it possible to increase the levitation accuracy around the observation unit 50 on both sides in the transport direction. This allows the observation unit 50 to properly image the substrate 16.

Seventh embodiment
An observation apparatus according to the seventh embodiment will be described with reference to Fig. 19 and Fig. 20. Fig. 19 is an XY plan view showing the configuration of the observation apparatus 100. Fig. 20 is an XZ plan view showing the configuration of the observation apparatus 100.

In this embodiment, an adsorption unit 18 is added to the configuration of embodiment 1. Specifically, the precision levitation unit cells 10d and 10e of embodiment 6 are replaced with the adsorption unit 18.

The upper surface of the suction unit 18 is higher than the upper surface of the levitation unit 10. In the transport direction, the suction units 18 are arranged on both sides of the observation unit 50. The suction units 18 vacuum-suck the substrate 16, similar to the suction section 61. That is, the suction unit 18 sucks in the gas in the space G directly below the substrate 16. This causes the substrate 16 to be fixed by suction to the upper surface of the suction unit 18. Fluctuations in the height of the substrate 16 can be suppressed. That is, the observation unit 50 can capture an image of the substrate 16 at a constant height. This allows stable observation.

Embodiment 8
The observation device according to the eighth embodiment will be described with reference to Figs. 21, 22, and 23. Fig. 21 is an XY plan view showing the configuration of the observation device 100. Fig. 22 is an XZ plan view showing the configuration of the observation device 100. Fig. 23 is a YZ plan view showing the configuration of the observation device 100. Note that the description of the contents common to the above-mentioned embodiments will be omitted as appropriate. For example, the configurations of the observation unit 50 and the moving mechanism 55 are the same as those of the first embodiment.

In this embodiment, a transport robot 70 is provided instead of the levitation unit 10. The transport robot 70 includes an arm mechanism 71 and a robot hand 72.

The robot hand 72 is a mechanism for supporting the substrate 16 so that a space G is formed directly below the substrate 16. Specifically, the robot hand 72 has a fork 72a. The fork 72a extends along the X direction. The substrate 16 is placed on the fork 72a. Between adjacent forks 72a, a space G is formed directly below the substrate 16. The robot hand 72 may suction and hold the substrate 16 by vacuum suction or the like.

The arm mechanism 71 has an actuator such as a servo motor, and drives the robot hand 72. As a result, the substrate 16 is transported in the X direction as shown in FIG. 22. Furthermore, the movement mechanism 55 moves the observation unit 50 in the Y direction. This makes it possible to observe any position on the substrate 16.

As shown in FIG. 24, the movement directions of the arm mechanism 71 and the moving mechanism 55 may be reversed. In FIG. 24, the arm mechanism 71 may move the substrate 16 in the Y direction, and the moving mechanism 55 may move the substrate 16 in the X direction. In this way, the transport direction of the substrate 16 and the movement direction of the observation unit 50 are not particularly limited.

Embodiment 9
In the first to eighth embodiments, the moving mechanism 55 moves the observation unit 50 to change the observation position of the substrate, but the moving mechanism may move the substrate 16. The moving mechanism may move the position of the observation unit relative to the substrate in a direction inclined to the substrate transport direction when viewed from above. In the present embodiment, the moving mechanism moves the substrate 16 on the levitation unit 10 in the Y direction.

The configuration of the observation device 100 according to this embodiment will be described with reference to Figs. 25 to 27. Fig. 25 is an XY plan view showing the configuration of the observation device 100. Fig. 26 is an XZ plan view showing the configuration of the observation device 100. Fig. 27 is a YZ plan view showing the configuration of the observation device 100.

In this embodiment, a moving mechanism 91 is provided instead of the moving mechanism 55. The moving mechanism 91 moves the substrate 16 in the Y direction. This causes the observation position of the substrate 16 by the observation unit 50 to change in the Y direction. The position of the observation unit 50 is fixed. For example, the observation unit 50 is fixed inside the opening 10h provided in the cell b of the levitation unit 10. Therefore, the observation unit 50 does not move.

More specifically, as shown in FIG. 25, the levitation unit 10 includes levitation unit cells 10a, 10b, 10f, and 10g. For example, levitation unit cells 10f and 10g are added to the configuration of the levitation unit 10 in FIG. 1. The levitation unit cells 10f and 10g eject gas upward, similar to the levitation unit cells 10a and 10b. The levitation unit cell 10f is disposed on the +Y side of the levitation unit cell 10a. The levitation unit cell 10g is disposed on the +Y side of the levitation unit cell 10b.

The transport mechanism 11 moves in the X direction in the space between the levitation unit cells 10a and 10f. The transport mechanism 11 moves in the X direction in the space between the levitation unit cells 10b and 10g. The movement mechanism 91 moves in the Y direction in the space between the levitation unit cells 10a and 10b. The movement mechanism 91 moves in the Y direction in the space between the levitation unit cells 10f and 10g.

The moving mechanism 91 has a similar configuration to the transport mechanism 11, but its transport direction is different from that of the transport mechanism 11. Specifically, as shown in Figures 26 and 27, the moving mechanism 91 has a holding mechanism 92 and a driving mechanism 93. The holding mechanism 92, like the holding mechanism 12, adsorbs and holds the substrate 16. The driving mechanism 93 moves the holding mechanism 92 in the Y direction. Thus, the moving mechanism 91 can move the substrate 16 in the Y direction. An observation unit 50 is disposed directly below the substrate 16. This allows the observation position of the substrate 16 to be changed.

For example, suppose that the transport mechanism 11 and the moving mechanism 91 are disposed directly below the substrate 16. In this state, the transport mechanism 11 and the moving mechanism 91 can transfer the substrate 16. With the holding mechanism 92 holding the substrate 16, the holding mechanism 12 releases its hold on the substrate 16. As a result, the substrate 16 is transferred from the transport mechanism 11 to the moving mechanism 91, allowing the substrate 16 to move in the Y direction. After transferring the substrate 16, the transport mechanism 11 may lower the holding mechanism 12 so as not to come into contact with the substrate 16.

When the drive mechanism 93 drives the holding mechanism 92, the substrate 16 moves in the Y direction. This causes the observation position of the observation unit 50 on the substrate 16 to move in the Y direction. In other words, the movement mechanism 91 moves the relative position of the observation unit 50 with respect to the substrate 16 in the Y direction.

With the holding mechanism 12 holding the substrate 16, the holding mechanism 92 releases its hold on the substrate 16. This allows the substrate 16 to be transferred from the moving mechanism 91 to the transport mechanism 11, making the substrate 16 movable in the X direction. After transferring the substrate 16, the moving mechanism 91 may lower the holding mechanism 92 so as not to come into contact with the substrate 16.

When the drive mechanism 13 drives the holding mechanism 12, the substrate 16 moves in the X direction. This causes the observation position of the observation unit 50 on the substrate 16 to move in the X direction. In other words, the transport mechanism 11 moves the relative position of the observation unit 50 with respect to the substrate 16 in the X direction.

In this embodiment, the substrate 16 is moved in the Y direction, not the observation unit 50. By combining substrate transport in the X direction by the transport mechanism 11 and substrate transport in the Y direction by the movement mechanism 91, the observation position of the observation unit 50 can be changed in the XY direction. Therefore, because the substrate 16 is transported in the XY direction, the observation device 100 can observe any position of the substrate 16.

Also, as shown in Figures 25 and 26, a moving mechanism 95 is disposed on the +X side of the levitation unit cell 10b. The moving mechanism 95 has a configuration similar to that of the moving mechanism 91. Specifically, the moving mechanism 95 includes a holding mechanism 96 and a driving mechanism 97. The holding mechanism 96 corresponds to the holding mechanism 92, and the driving mechanism 97 corresponds to the driving mechanism 93. The moving mechanism 95 moves the substrate 16 in the Y direction. For example, after the moving mechanism 91 moves the substrate 16 in the -Y direction, the moving mechanism 95 moves the substrate 16 in the +Y direction. This returns the substrate 16 to its original position in the Y direction.

Also in this embodiment, the cells of the precision levitation unit 80 may be arranged around the observation unit 50. Alternatively, the suction unit 60 may be arranged around the observation unit 50.

Embodiment 10
The configuration of an observation device 100 according to a tenth embodiment will be described with reference to Figs. 28 and 29. In this embodiment, a rotation mechanism 99 is added to the configuration of the ninth embodiment. The configuration other than the rotation mechanism 99 is similar to that of the above-mentioned embodiments, and therefore description thereof will be omitted.

The rotation mechanism 99 rotates the substrate 16 levitated above the levitation unit 10 around the Z axis. The rotation mechanism 99 is disposed in an opening provided in the levitation unit cell 10a. The rotation mechanism 99 includes a holding mechanism 99a and a drive mechanism 99b. The holding mechanism 99a adsorbs and holds the substrate 16 in the same manner as the holding mechanisms 12, 92, etc. The drive mechanism 99b includes a motor and a rotating shaft that rotate the holding mechanism 99a. The rotating shaft is parallel to the Z direction.

The holding mechanism 99a holds the substrate 16 while the levitation unit cells 10a, 10f, etc. are blowing gas onto the substrate 16. When the drive mechanism 99b rotates the holding mechanism 99a, the substrate 16 rotates around the Z axis. For example, the rotation mechanism 99 rotates the substrate 16 by 90° or 180° around the Z axis. The observation position of the substrate 16 can be changed using the rotation mechanism 99. Thus, in this embodiment, the observation device 100 can move the substrate 16 with three degrees of freedom: the X axis, the Y axis, and the rotation axis. Therefore, the observation device 100 can observe the entire surface of the substrate 16.

Thus, the observation apparatus 100 includes an observation unit including a mechanism for floating or supporting the substrate so that a space is formed directly below the substrate, a photodetector for detecting light from the substrate, and an optical system for directing the light from the substrate to the photodetector. The observation method in the observation apparatus includes the following steps (A1) to (A3).
(A1) A step in which a transport mechanism transports the substrate in a transport direction.
(A2) observing the substrate transported by the transport mechanism using the observation unit.
(A3) A step of changing an observation position of the substrate by moving a relative position of the observation unit with respect to the substrate in a direction inclined to the transport direction when viewed from above, and observing the substrate.

The configurations of the first to tenth embodiments can be used in appropriate combination. Furthermore, the observation device 100 shown in the first to tenth embodiments can be applied to a semiconductor device manufacturing device. In the semiconductor device manufacturing process, the substrate can be properly observed. Therefore, semiconductor devices can be manufactured with high productivity.

For example, the observation device 100 may be mounted on a part of the laser irradiation device. FIG. 25 is an XZ cross-sectional view showing the configuration of the laser irradiation device 1 equipped with the observation device 100 according to the first embodiment. The laser irradiation device 1 is, for example, an excimer laser annealing (ELA: Excimer laser Anneal) device that forms a low temperature polysilicon (LTPS: Low Temperature Poly-Silicon) film. In this case, the substrate 16 is a glass substrate on which an amorphous silicon film is formed.

The laser irradiation device 1 includes an observation device 100 and a laser irradiation unit 14. Here, the laser irradiation unit 14 is added to the observation device 100 in FIG. 1. The laser irradiation unit 14 is placed on a substrate 16 being transported in the X direction. In FIG. 25, it is placed on the levitation unit cell 10b.

The laser irradiation unit 14 has a laser light source that generates laser light 15 and an irradiation optical system that guides the laser light 15 to the substrate 16. The laser irradiation unit 14 irradiates the substrate 16 with a line beam whose longitudinal direction is the Y direction. Since the substrate 16 is transported in the X direction, the laser light can be irradiated onto almost the entire surface of the substrate 16.

For example, the laser irradiation unit 14 has an excimer laser light source that generates laser light. Furthermore, the laser irradiation unit 14 has an optical system that guides the laser light to the substrate 16. The laser irradiation unit 14 has a lens that focuses the laser light 15 on the substrate 16. For example, the laser irradiation unit 14 has a cylindrical lens for forming a line-shaped irradiation area. The substrate 16 is irradiated with line-shaped laser light 15 (line beam), specifically, with a focal point extending in the y direction. The focal point of the laser light 15 is formed on the substrate 16.

The levitation unit 10 levitates the substrate 16 with high precision. This allows the laser irradiation section 14 to appropriately irradiate the laser light. Since the in-plane variation of the laser light can be suppressed, a uniform process is possible. The levitation height can be made uniform. This allows for a more stable process and allows a uniform polysilicon film to be formed. This improves productivity.

In Figure 30, the substrate 16 can be observed after laser irradiation. Of course, it is also possible to observe the substrate 16 before laser irradiation. In this case, the laser irradiation unit 14 can irradiate the laser light on the -X side of the observation unit 50. For example, the laser irradiation unit 14 can be placed above the levitation unit cell 10a.

Note that, although FIG. 30 illustrates an example in which the observation device 100 is applied to the laser irradiation device 1, the observation device 100 can be applied to devices other than laser irradiation devices. In other words, the observation device 100 can be applied to manufacturing devices used in the manufacturing process of semiconductor devices.

(Organic EL display)
The semiconductor device having the polysilicon film is suitable for a TFT (Thin Film Transistor) array substrate for an organic EL (ElectroLuminescence) display. That is, the polysilicon film is used as a semiconductor layer having a source region, a channel region, and a drain region of the TFT.

Below, a configuration in which the semiconductor device according to this embodiment is applied to an organic EL display will be described. Figure 31 is a cross-sectional view showing a simplified pixel circuit of an organic EL display. The organic EL display 300 shown in Figure 31 is an active matrix type display device in which a TFT is arranged in each pixel PX.

The organic EL display 300 includes a substrate 310, a TFT layer 311, an organic layer 312, a color filter layer 313, and a sealing substrate 314. FIG. 31 shows a top-emission organic EL display in which the sealing substrate 314 side is the viewing side. Note that the following description shows one configuration example of an organic EL display, and the present embodiment is not limited to the configuration described below. For example, the semiconductor device according to the present embodiment may be used in a bottom-emission organic EL display.

The substrate 310 is a glass substrate or a metal substrate. A TFT layer 311 is provided on the substrate 310. The TFT layer 311 has a TFT 311a arranged in each pixel PX. Furthermore, the TFT layer 311 has wiring (not shown) connected to the TFT 311a, etc. The TFT 311a and the wiring etc. constitute a pixel circuit.

An organic layer 312 is provided on the TFT layer 311. The organic layer 312 has an organic EL element 312a arranged for each pixel PX. Furthermore, the organic layer 312 is provided with partition walls 312b for separating the organic EL elements 312a between the pixels PX.

A color filter layer 313 is provided on the organic layer 312. The color filter layer 313 is provided with a color filter 313a for color display. That is, in each pixel PX, a resin layer colored R (red), G (green), or B (blue) is provided as the color filter 313a.

A sealing substrate 314 is provided on the color filter layer 313. The sealing substrate 314 is a transparent substrate such as a glass substrate, and is provided to prevent deterioration of the organic EL light-emitting element of the organic layer 312.

The current flowing through the organic EL element 312a of the organic layer 312 changes depending on the display signal supplied to the pixel circuit. Therefore, by supplying a display signal corresponding to the display image to each pixel PX, the amount of light emitted by each pixel PX can be controlled. This makes it possible to display the desired image.

In an active matrix display device such as an organic EL display, one pixel PX is provided with one or more TFTs (e.g., a switching TFT or a driving TFT). The TFT of each pixel PX is provided with a semiconductor layer having a source region, a channel region, and a drain region. The polysilicon film of this embodiment is suitable for the semiconductor layer of a TFT. In other words, by using a polysilicon film manufactured by the above manufacturing method as the semiconductor layer of a TFT array substrate, it is possible to suppress in-plane variations in TFT characteristics. Therefore, a display device with excellent display characteristics can be manufactured with high productivity.

(Method of manufacturing a semiconductor device)
The manufacturing method of a semiconductor device using the laser irradiation device according to the present embodiment is suitable for manufacturing a TFT array substrate. The manufacturing method of a semiconductor device having TFTs will be described with reference to Figs. 26 and 32. Figs. 32 and 33 are cross-sectional views showing the manufacturing process of a semiconductor device. In the following description, a manufacturing method of a semiconductor device having an inverted staggered type TFT will be described. Figs. 32 and 33 show the process of forming a polysilicon film in the semiconductor manufacturing method. It should be noted that the other manufacturing processes can be performed by known methods, and therefore the description will be omitted.

As shown in FIG. 32, a gate electrode 402 is formed on a glass substrate 401. A gate insulating film 403 is formed on the gate electrode 402. An amorphous silicon film 404 is formed on the gate insulating film 403. The amorphous silicon film 404 is disposed so as to overlap the gate electrode 402 with the gate insulating film 403 interposed therebetween. For example, the gate insulating film 403 and the amorphous silicon film 404 are successively formed by a CVD (Chemical Vapor Deposition) method.

Then, the glass substrate 401 on which the amorphous silicon film 404 is formed is transported to the transport device 600. The amorphous silicon film 404 is irradiated with laser light L1 to form a polysilicon film 405 as shown in FIG. 33. That is, the amorphous silicon film 404 is crystallized by the laser irradiation device 1 shown in FIG. 25 etc. As a result, a polysilicon film 405 made of crystallized silicon is formed on the gate insulating film 403. The polysilicon film 405 corresponds to the polysilicon film described above. While the transport device 600 is transporting the glass substrate 401, the laser light L1 is irradiated. As a result, the amorphous silicon film 404 is annealed and converted into the polysilicon film 405.

Furthermore, in the above description, the laser annealing apparatus according to the present embodiment has been described as irradiating an amorphous silicon film with laser light to form a polysilicon film, but it may also be irradiating an amorphous silicon film with laser light to form a microcrystalline silicon film. Furthermore, the laser light used for annealing is not limited to an Nd:YAG laser. The method according to the present embodiment can also be applied to a laser annealing apparatus that crystallizes a thin film other than a silicon film. In other words, the method according to the present embodiment can be applied to any laser annealing apparatus that irradiates an amorphous film with laser light to form a crystallized film. The laser annealing apparatus according to the present embodiment can appropriately modify a substrate with a crystallized film.

The method for manufacturing a semiconductor device according to the present embodiment may include the following steps (S1) to (S4).
(S1) A step of floating or supporting a substrate using a mechanism so that a space is formed directly below the substrate.
(S2) Using a transport mechanism, transporting the substrate on the mechanism in a transport direction.
(S3) A step of observing the substrate using an observation unit including a photodetector that detects light from the substrate and an optical system that guides the light from the substrate to the photodetector.
(S4) A step of moving the position of the observation unit relative to the substrate in a direction inclined to the transport direction in a top view using a movement mechanism so as to change the observation position of the substrate.

Furthermore, the transport mechanism may transport the substrate so that the laser irradiation section can irradiate the substrate with laser light before or after observation by the observation unit.

The present invention is not limited to the above embodiment, and can be modified as appropriate without departing from the spirit of the invention.

REFERENCE SIGNS LIST 10 Floating unit 11 Transport mechanism 12 Holding mechanism 13 Driving mechanism 16 Substrate 30 Support unit 31 Base stage 33 Transport roller 50 Observation unit 51 Optical system 51a Objective lens 52 Photodetector 53 Cable 55 Moving mechanism 59 Illumination light source 60 Suction unit 61 Suction section 62 Storage section 63 Window section 70 Transport robot 71 Arm mechanism 72 Robot hand 72a Fork 80 Precision floating unit 81 Suction/ejection section 82 Storage section 83 Window section 100 Observation device

Claims (24)

1. a mechanism for floating or supporting the substrate so that a space is formed directly below the substrate;
   a transport mechanism that transports the substrate on the mechanism in a transport direction;
   an observation unit including a photodetector that detects light from the substrate and an optical system that guides the light from the substrate to the photodetector;
   a moving mechanism that moves a relative position of the observation unit with respect to the substrate in a direction inclined to the transport direction when viewed from above so as to change an observation position of the substrate.
2. the mechanism includes a levitation unit that ejects gas onto the substrate,
   The observation device according to claim 1 , wherein the floating units are disposed on both sides of the observation unit in the transport direction.
3. The observation device according to claim 2, wherein the movement mechanism moves the observation unit.
4. The observation device according to claim 2, wherein the movement mechanism moves the substrate.
5. a suction unit that suctions the substrate by vacuum around the observation unit;
   4. The observation apparatus according to claim 2, wherein the observation unit observes the substrate while the suction unit suction-fixes the substrate.
6. The observation device according to claim 2 or 3, which observes the substrate while blowing gas onto the underside of the substrate around the observation unit and sucking in the gas underneath the substrate.
7. the mechanism includes a plurality of transport rollers that support the substrate;
   The observation apparatus according to claim 1 , wherein the plurality of transport rollers rotate so as to transport the substrate in the transport direction.
8. the mechanism includes a robot hand that supports the substrate;
   2. The observation device according to claim 1, wherein the transport mechanism includes an arm mechanism that drives the robot hand.
9. a mechanism for floating or supporting the substrate so that a space is formed directly below the substrate;
   An observation method in an observation apparatus including an observation unit including a photodetector that detects light from the substrate and an optical system that guides the light from the substrate to the photodetector,
   (A1) a transport mechanism transporting the substrate in a transport direction;
   (A2) observing the substrate transported by the transport mechanism using the observation unit;
   (A3) moving a relative position of the observation unit with respect to the substrate in a direction inclined with respect to the transport direction in a top view to change an observation position of the substrate, and observing the substrate;
   An observation method comprising:
10. the mechanism includes a levitation unit that ejects gas onto the substrate;
    The observation method according to claim 9 , wherein the floating units are disposed on both sides of the observation unit in the transport direction.
11. The observation method according to claim 10, wherein in step (A3), the observation unit is moved.
12. The observation method according to claim 10, wherein in step (A3), the substrate is moved.
13. a suction unit that suctions the substrate by vacuum around the observation unit;
    The observation method according to claim 10 or 11, wherein the observation unit observes the substrate while the suction unit suction-fixes the substrate.
14. The observation method according to claim 10 or 11, in which the substrate is observed while gas is ejected onto the underside of the substrate around the observation unit and the gas underneath the substrate is sucked in.
15. the mechanism includes a plurality of transport rollers that support the substrate;
    The observation method according to claim 9 , wherein the plurality of transport rollers rotate so as to transport the substrate in the transport direction.
16. the mechanism includes a robot hand that supports the substrate;
    The observation method according to claim 9 , wherein the transport mechanism includes an arm mechanism that drives the robot hand.
17. (S1) using a mechanism to float or support a substrate so that a space is formed directly below the substrate;
    (S2) using a transport mechanism to transport the substrate on the mechanism in a transport direction;
    (S3) observing the substrate using an observation unit including a photodetector that detects light from the substrate and an optical system that guides the light from the substrate to the photodetector;
    (S4) moving a position of the observation unit relative to the substrate in a direction inclined to the transport direction in a top view by using a moving mechanism so as to change an observation position of the substrate;
    A method for manufacturing a semiconductor device comprising the steps of:
18. the mechanism includes a levitation unit that ejects gas onto the substrate;
    18. The method for manufacturing a semiconductor device according to claim 17, wherein the floating units are disposed on both sides of the observation unit in the transport direction.
19. The method for manufacturing a semiconductor device according to claim 18, wherein in step (S4), the moving mechanism moves the observation unit.
20. The method for manufacturing a semiconductor device according to claim 18, wherein in step (S4), the moving mechanism moves the substrate.
21. a suction unit that suctions the substrate by vacuum around the observation unit;
    20. The method for manufacturing a semiconductor device according to claim 18, wherein the observation unit observes the substrate while the suction unit suction-fixes the substrate.
22. The method for manufacturing a semiconductor device according to claim 18 or 19, in which gas is ejected onto the underside of the substrate around the observation unit, and the substrate is observed while the gas underneath the substrate is sucked in.
23. the mechanism includes a plurality of transport rollers that support the substrate;
    The method for manufacturing a semiconductor device according to claim 17 , wherein the plurality of transport rollers rotate so as to transport the substrate in the transport direction.
24. the mechanism includes a robot hand that supports the substrate;
    18. The method for manufacturing a semiconductor device according to claim 17, wherein the transport mechanism includes an arm mechanism for driving the robot hand.

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