WO2024103651A1 - 一种混气装置、方法及半导体工艺系统 - Google Patents

一种混气装置、方法及半导体工艺系统 Download PDF

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Publication number
WO2024103651A1
WO2024103651A1 PCT/CN2023/093415 CN2023093415W WO2024103651A1 WO 2024103651 A1 WO2024103651 A1 WO 2024103651A1 CN 2023093415 W CN2023093415 W CN 2023093415W WO 2024103651 A1 WO2024103651 A1 WO 2024103651A1
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Prior art keywords
unit
gas
gas delivery
valve
pipeline
Prior art date
Application number
PCT/CN2023/093415
Other languages
English (en)
French (fr)
Inventor
陈亮
范威威
纪雪峰
Original Assignee
上海良薇机电工程有限公司
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Publication of WO2024103651A1 publication Critical patent/WO2024103651A1/zh

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/10—Mixing gases with gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/10—Maintenance of mixers
    • B01F35/11—Maintenance of mixers using fluids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20—Measuring; Control or regulation
    • B01F35/21—Measuring
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere

Definitions

  • the present invention relates to the field of semiconductor production technology, and in particular to a gas mixing device, method and semiconductor process system.
  • mixed gases are generally used, such as 20PPM to 200PPM of PH 3 /H 2 , B 2 H 6 /H 2 , 3% to 5% of H 2 /N 2 , etc.
  • PH 3 /H 2 low-concentration PH 3 /H 2
  • B 2 H 6 /H 2 low-concentration PH 3 /H 2
  • the semiconductor process has high requirements for the stability of gas concentration.
  • the gas is supplied in 40L or 47L finished mixed gas cylinders.
  • the prior art adopts the on-site gas mixing method.
  • two different gas sources are introduced into a gas mixing tank for mixing, and then transported to the process chamber.
  • this gas mixing method cannot guarantee the uniformity of concentration, thereby reducing process efficiency and product yield.
  • the purpose of the present invention is to provide a gas mixing device, method and semiconductor process system to address the deficiencies in the prior art, so as to solve the problems existing in the related art such as too high frequency of bottle replacement when the gas consumption is large, low process efficiency and inability to ensure concentration uniformity of on-site gas mixing.
  • the present invention provides a gas mixing device, comprising:
  • a first gas delivery unit used for delivering a first gas source downstream
  • a second gas delivery unit used for delivering a second gas source downstream
  • concentration monitoring unit being in communication with the second gas delivery unit and being used for monitoring the concentration of the second gas source
  • the mixing buffer unit being connected to the first gas delivery unit and the second gas delivery unit respectively, and being used for mixing the first gas source and the second gas source to obtain a mixed gas source, and delivering the mixed gas source to the process chamber;
  • An exhaust unit wherein the exhaust unit is connected to the first gas delivery unit, the second gas delivery unit, and the mixing buffer unit respectively;
  • a pressure relief unit wherein the pressure relief unit is respectively connected to the first gas delivery unit, the second gas delivery unit, the mixing buffer unit, and the exhaust unit;
  • a purge unit is connected to the first gas delivery unit and the second gas delivery unit respectively.
  • the first gas delivery unit comprises:
  • a first gas delivery element connected to the mixing buffer unit and used to deliver a first gas source to the mixing buffer unit;
  • a first valve element, the first valve element is arranged in a pipeline respectively connected to the first gas delivery element and the mixing buffer unit, and is used to control the opening and closing of the pipeline;
  • a second valve element which is disposed in a pipeline respectively connected to the first gas delivery element and the mixing buffer unit and is located downstream of the first valve element, and is used to control the opening and closing of the pipeline;
  • a first pressure monitoring element which is disposed in a pipeline respectively connected to the first gas delivery element and the mixing buffer unit, and is used to monitor the pipeline pressure
  • a first flow monitoring element wherein the first flow monitoring element is disposed in a pipeline respectively connected to the first gas delivery element and the mixing buffer unit, and is used to monitor the flow of the first gas source.
  • the second gas delivery unit includes:
  • a second gas delivery element connected to the mixing buffer unit, and used to deliver a second gas source to the mixing buffer unit;
  • a third valve element, the third valve element is arranged in a pipeline respectively connected to the second gas delivery element and the mixing buffer unit, and is used to control the opening and closing of the pipeline;
  • the fourth valve element being disposed in a pipeline respectively connected to the second gas delivery element and the mixing buffer unit and being located downstream of the third valve element, and being used for controlling the opening and closing of the pipeline;
  • a second pressure monitoring element which is disposed in a pipeline respectively connected to the second gas delivery element and the mixing buffer unit, and is used to monitor the pipeline pressure
  • the second flow monitoring element is arranged respectively with the second gas delivery element, the mixing buffer element
  • the pipeline connected to the flushing unit is used to monitor the flow rate of the second gas source.
  • the hybrid buffer unit includes:
  • a mixing buffer element, a mixing buffer element, the mixing buffer element is respectively connected to the first gas delivery unit, the second gas delivery unit, the exhaust unit, and the pressure relief unit, and is used to mix the first gas source and the second gas source to obtain a mixed gas source, and deliver the mixed gas source to the process chamber;
  • the fifth valve element being disposed in a pipeline respectively connected to the first gas delivery unit, the second gas delivery unit, the mixing buffer element, and the exhaust unit, and being used to control a gas flow direction of the pipeline;
  • valve element disposed in a pipeline respectively connected to the first gas delivery unit, the second gas delivery unit, and the mixing buffer element, and being located downstream of the fifth valve element, and being used to control the opening and closing of the pipeline;
  • the seventh valve element being arranged in a pipeline respectively connected to the mixing buffer element and the process chamber, and being used for controlling the opening and closing of the pipeline;
  • a third pressure monitoring element is provided in a pipeline respectively connected to the mixing buffer element and the process chamber, and is used for monitoring the pipeline pressure.
  • the hybrid buffer unit further comprises:
  • the fourth gas delivery element being in communication with the mixing buffer element
  • a fourteenth valve element is arranged in a pipeline which is respectively connected with the mixing buffer element and the fourth gas delivery element.
  • the exhaust unit comprises:
  • first vacuum element is connected to the first gas delivery unit, the second gas delivery unit, the mixing buffer unit, and the pressure relief unit respectively;
  • an eighth valve element wherein the eighth valve element is disposed in a pipeline respectively connected to the first gas delivery unit, the second gas delivery unit, the mixing buffer unit, the first vacuum element, and the pressure relief unit;
  • the ninth valve element being disposed in a pipeline connected to the first vacuum element and used for controlling the pipeline for exhausting the first vacuum element to the outside;
  • a tenth valve element wherein the tenth valve element is arranged in a pipeline connected to the first vacuum element, and is used to control the pipeline for conveying a gas source to the first vacuum element.
  • the pressure relief unit includes:
  • a second vacuum element wherein the second vacuum element is connected to the first gas delivery unit, the second gas delivery unit, the mixing buffer unit, and the exhaust unit respectively;
  • the eleventh valve element being disposed in pipelines respectively connected to the mixing buffer unit, the exhaust unit, and the second vacuum element;
  • a twelfth valve element is arranged in a pipeline respectively connected to the mixing buffer unit, the exhaust unit and the second vacuum element.
  • the pressure relief unit further comprises:
  • the fifteenth valve element being disposed in pipelines respectively connected to the mixing buffer unit and the second vacuum element;
  • a fourth pressure monitoring element wherein the fourth pressure monitoring element is arranged in a pipeline respectively connected to the mixing buffer unit and the second vacuum element, and is used to monitor the pipeline pressure.
  • the purge unit includes:
  • the third gas delivery element being connected to the first gas delivery unit and the second gas delivery unit respectively;
  • a thirteenth valve element is disposed in a pipeline connected to the first gas delivery unit, the second gas delivery unit, and the third gas delivery element respectively.
  • it also includes:
  • a safety assurance unit is arranged at the top of the environment where the gas mixing device is located, and is used to monitor environmental information.
  • the security unit includes:
  • a smoke monitoring element which is arranged at the top of the environment where the gas mixing device is located, and is used to monitor smoke information in the environment;
  • a liquid spraying element which is arranged at the top of the environment where the gas mixing device is located, and is used to spray liquid into the environment;
  • a switch element the switch element being arranged on the top of the environment where the gas mixing device is located;
  • a blowing element is arranged at the top of the environment where the gas mixing device is located, and is used to discharge the gas in the environment.
  • the present invention provides a gas mixing method, which is applied to the gas mixing device as described in the first aspect.
  • the present invention provides a semiconductor process system, comprising:
  • a gas mixing device as described in the first aspect is described.
  • the present invention adopts the above technical solution, and has the following technical effects compared with the prior art:
  • the gas mixing device, method and semiconductor process system of the present invention monitor the concentration of the second gas source provided by the second gas delivery unit through a concentration monitoring unit, and can accurately dilute the high-concentration gas on site, thereby reducing the number of times the second gas source is replaced and improving the process efficiency; the first gas source delivered by the first gas delivery unit and the second gas delivery unit are mixed by a mixing buffer unit.
  • the delivered second gas source is mixed and diluted on-site to achieve the concentration required by the process, which extends the single use time of the second gas source, thereby reducing the frequency of replacing the second gas source and further improving the process efficiency; in addition, high-precision, low-concentration gas dilution can be performed through the concentration monitoring unit to meet different process requirements; through the coordination of the exhaust unit, the pressure relief unit and the purge unit, the pipeline of the gas mixing device and the mixing buffer unit can be emptied, purged and pressure-relieved to meet the cleanliness requirements and avoid the residual gas source of the previous process, so that the gas source replacement operation can be performed.
  • FIG1 is a schematic diagram of a gas mixing device according to an embodiment of the present invention (I);
  • FIG2 is a schematic diagram of a first gas delivery unit according to an embodiment of the present invention.
  • FIG3 is a schematic diagram of a second gas delivery unit according to an embodiment of the present invention.
  • FIG4 is a schematic diagram of a hybrid buffer unit according to an embodiment of the present invention (I);
  • FIG5 is a schematic diagram of an exhaust unit according to an embodiment of the present invention.
  • FIG6 is a schematic diagram of a pressure relief unit according to an embodiment of the present invention (I);
  • FIG7 is a schematic diagram of a purge unit according to an embodiment of the present invention.
  • FIG8 is a schematic diagram of a hybrid buffer unit according to an embodiment of the present invention (II);
  • FIG9 is a schematic diagram of a pressure relief unit according to an embodiment of the present invention (II);
  • FIG10 is a schematic diagram of a gas mixing device according to an embodiment of the present invention (II);
  • FIG11 is a schematic diagram of a security unit according to an embodiment of the present invention.
  • FIG. 12 is a specific embodiment of a gas mixing device according to an embodiment of the present invention.
  • the reference numerals are: 100, first gas delivery unit; 110, first gas delivery element; 120, first valve element; 130, second valve element; 140, first pressure monitoring element; 150, first flow monitoring element;
  • second gas delivery unit 210, second gas delivery element; 220, third valve element; 230, fourth valve element; 240, second pressure monitoring element; 250, second flow monitoring element;
  • 600 pressure relief unit; 610, second vacuum element; 620, eleventh valve element; 630, twelfth valve element; 640, tenth Five valve components; 650, fourth pressure monitoring component;
  • connection is not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect.
  • the "multiple”/"several” involved in this application refers to two or more.
  • “And/or” describes the association relationship of associated objects, indicating that there can be three relationships, for example, "A and/or B” can mean: A exists alone, A and B exist at the same time, and B exists alone.
  • the character “/” generally indicates that the objects before and after are in an “or” relationship.
  • first, “second”, “third”, etc. involved in this application are only used to distinguish similar objects and do not represent specific objects. Determine the sort order.
  • This embodiment relates to the gas mixing device of the present invention.
  • An exemplary embodiment of the present invention is a gas mixing device, comprising a first gas delivery unit 100 , a second gas delivery unit 200 , a concentration monitoring unit 300 , a mixing buffer unit 400 , an exhaust unit 500 , a pressure relief unit 600 and a purge unit 700 .
  • the first gas delivery unit 100 is used to deliver the first gas source downstream;
  • the second gas delivery unit 200 is used to deliver the second gas source downstream;
  • the concentration monitoring unit 300 is connected to the second gas delivery unit 200, and is used to monitor the concentration of the second gas source;
  • the mixing buffer unit 400 is connected to the first gas delivery unit 100 and the second gas delivery unit 200 respectively, and is used to mix the first gas source and the second gas source to obtain a mixed gas source, and deliver the mixed gas source to the process chamber;
  • the exhaust unit 500 is connected to the first gas delivery unit 100, the second gas delivery unit 200, and the mixing buffer unit 400 respectively;
  • the pressure relief unit 600 is connected to the first gas delivery unit 100, the second gas delivery unit 200, the mixing buffer unit 400, and the exhaust unit 500 respectively;
  • the purge unit 700 is connected to the first gas delivery unit 100 and the second gas delivery unit 200 respectively.
  • the gas mixing method of the present invention is as follows:
  • the first gas delivery unit 100 delivers a first gas source (generally a single component) to the mixing buffer unit 400;
  • the second gas delivery unit 200 delivers a second gas source (generally a mixed component) to the mixing buffer unit 400;
  • the concentration monitoring unit 300 monitors the concentration of the second gas source, and controls the flow rate of the first gas source and the flow rate of the second gas source according to the concentration of the second gas source;
  • the mixing buffer unit 400 mixes the first gas source and the second gas source into a mixed gas of a preset concentration
  • the mixing buffer unit 400 delivers the mixed gas to the process chamber
  • the exhaust unit 500 exhausts the pipelines connected to the first gas delivery unit 100 and the second gas delivery unit 200;
  • the purge unit 700 purges the pipelines connected to the first gas delivery unit 100 and the second gas delivery unit 200;
  • the pressure relief unit 600 respectively performs pressure relief on the first gas delivery unit 100, the second gas delivery unit 200, and the mixing buffer unit 400. The pressure is released so that the mixing buffer unit 400 is in a negative pressure state.
  • step (ii) to step (iv) can be performed before gas mixing or after gas mixing.
  • step (ii) to step (iv) can be performed by exhausting and purging only the pipeline or exhausting and purging the pipeline and the mixing buffer unit 400 together.
  • the first gas delivery unit 100 includes a first gas delivery element 110, a first valve element 120, a second valve element 130, a first pressure monitoring element 140 and a first flow monitoring element 150.
  • the first gas delivery element 110 is connected to the mixing buffer unit 400, and is used to deliver the first gas source to the mixing buffer unit 400;
  • the first valve element 120 is arranged in the pipelines respectively connected to the first gas delivery element 110 and the mixing buffer unit 400, and is used to control the opening and closing of the pipelines;
  • the second valve element 130 is arranged in the pipelines respectively connected to the first gas delivery element 110 and the mixing buffer unit 400, and is located downstream of the first valve element 120, and is used to control the opening and closing of the pipelines;
  • the first pressure monitoring element 140 is arranged in the pipelines respectively connected to the first gas delivery element 110 and the mixing buffer unit 400, and is used to monitor the pipeline pressure;
  • the first flow monitoring element 150 is arranged in the pipelines respectively connected to the first gas delivery element 110 and the mixing buffer unit 400, and is used to monitor the
  • the first gas delivery element 110 includes a first gas source supply and a first outlet, wherein the first outlet is disposed at the first gas source supply and communicates with the mixing buffer unit 400 .
  • the first outlet is composed of a first outlet pipe and a first outlet interface.
  • the first outlet pipe is connected to a first gas source supply source; the first outlet interface is arranged at the end of the first outlet pipe and is used to be connected to the mixing buffer unit 400.
  • the first outlet interface is connected to a pipeline communicating with the mixing buffer unit 400 .
  • the first valve element 120 includes but is not limited to a diaphragm valve, a pressure regulating valve, and a one-way valve.
  • the first valve element 120 includes but is not limited to a manual diaphragm valve and a pneumatic diaphragm valve.
  • the first valve element 120 includes a plurality of diaphragm valves and pressure regulating valves, wherein the plurality of diaphragm valves and pressure regulating valves are arranged at intervals in pipelines respectively connected to the first gas delivery element 110 and the mixing buffer unit 400 .
  • the first valve element 120 includes a first manual diaphragm valve, a first pressure regulating valve and a second manual diaphragm valve.
  • the first manual diaphragm valve is arranged at the inlet of the pipelines respectively connected to the first gas delivery element 110 and the mixing buffer unit 400;
  • the first pressure regulating valve is arranged downstream of the first manual diaphragm valve and upstream of the pipeline connecting the first gas delivery element 110 and the purge unit 700;
  • the second manual diaphragm valve is arranged downstream of the first pressure regulating valve and downstream of the pipeline connecting the first gas delivery element 110 and the purge unit 700.
  • the second valve element 130 includes but is not limited to a diaphragm valve, a pressure regulating valve, and a one-way valve.
  • the second valve element 130 includes but is not limited to a manual diaphragm valve and a pneumatic diaphragm valve.
  • the second valve element 130 includes a plurality of diaphragm valves.
  • the second valve element 130 includes a first pneumatic diaphragm valve and a second pneumatic diaphragm valve, wherein the first pneumatic diaphragm valve is disposed downstream of the first valve element 120 (second manual diaphragm valve); the second pneumatic diaphragm valve is disposed at the outlet of the pipeline connected to the first gas delivery element 110 and the mixing buffer unit 400, respectively, and is located downstream of the first pneumatic diaphragm valve.
  • the first pressure monitoring element 140 includes but is not limited to a pressure sensor, a pressure gauge, and a pressure gauge.
  • first pressure monitoring elements 140 there are multiple first pressure monitoring elements 140.
  • the multiple first pressure monitoring elements 140 are disposed at intervals in pipelines respectively connected to the first gas delivery element 110 and the mixing buffer unit 400.
  • At least two first pressure monitoring elements 140 there are at least two first pressure monitoring elements 140. At least one first pressure monitoring element 140 is disposed between the first manual diaphragm valve and the first pressure regulating valve to monitor the pipeline pressure; at least one first pressure monitoring element 140 is disposed between the second manual diaphragm valve and the first pneumatic diaphragm valve to monitor the pipeline pressure.
  • first pressure monitoring elements 140 there are at least three first pressure monitoring elements 140.
  • at least one first pressure monitoring element 140 is arranged between the first manual diaphragm valve and the first pressure regulating valve to monitor the pipeline pressure; at least one first pressure monitoring element 140 is arranged between the second manual diaphragm valve and the first pneumatic diaphragm valve to monitor the pipeline pressure; at least one first pressure monitoring element 140 is arranged between the first pressure regulating valve and the second manual diaphragm valve to monitor the pipeline pressure.
  • the first pressure monitoring element 140 disposed between the first pressure regulating valve and the second manual diaphragm valve is used to confirm whether its pressure is the same as the pressure of the first pressure monitoring element 140 disposed between the second manual diaphragm valve and the first pneumatic diaphragm valve after pressure regulation to avoid errors.
  • the first pressure monitoring element 140 is disposed between the first pressure regulating valve and the second manual diaphragm valve, it is located upstream of the pipeline connecting the first gas delivery element 110 and the purge unit 700 .
  • the first flow monitoring element 150 includes but is not limited to a flow sensor, a mass flow meter, and a mass flow controller.
  • the first flow monitoring element 150 is disposed at an outlet of a pipeline connected to the first gas delivery element 110 and the mixing buffer unit 400 respectively.
  • the first flow monitoring element 150 is disposed between the first pneumatic diaphragm valve and the second pneumatic diaphragm valve.
  • the second gas delivery unit 200 includes a second gas delivery element 210, a third valve element 220, a fourth valve element 230, a second pressure monitoring element 240 and a second flow monitoring element 250.
  • the second gas delivery element 210 is connected to the mixing buffer unit 400 to deliver the second gas source to the mixing buffer unit 400; the third valve element 220 is disposed at the second gas source and the third valve element 23 ...
  • the pipeline connected to the delivery element 210 and the mixing buffer unit 400 is used to control the opening and closing of the pipeline;
  • the fourth valve element 230 is arranged in the pipeline connected to the second gas delivery element 210 and the mixing buffer unit 400 respectively, and is located downstream of the third valve element 220, and is used to control the opening and closing of the pipeline;
  • the second pressure monitoring element 240 is arranged in the pipeline connected to the second gas delivery element 210 and the mixing buffer unit 400 respectively, and is used to monitor the pipeline pressure;
  • the second flow monitoring element 250 is arranged in the pipeline connected to the second gas delivery element 210 and the mixing buffer unit 400 respectively, and is used to monitor the flow of the second gas source.
  • the second gas delivery element 210 includes a second gas source supply and a second outlet, wherein the second outlet is disposed at the second gas source supply and communicates with the mixing buffer unit 400 .
  • the second outlet is composed of a second outlet pipe and a second outlet interface.
  • the second outlet pipe is connected to a second gas source supply source; the second outlet interface is arranged at the end of the second outlet pipe for connecting to the mixing buffer unit 400.
  • the second outlet interface is connected to a pipeline communicating with the mixing buffer unit 400 .
  • the third valve element 220 includes but is not limited to a diaphragm valve, a pressure regulating valve, and a one-way valve.
  • the third valve element 220 includes but is not limited to a manual diaphragm valve and a pneumatic diaphragm valve.
  • the third valve element 220 includes a plurality of diaphragm valves and pressure regulating valves, wherein the plurality of diaphragm valves and pressure regulating valves are arranged at intervals in pipelines respectively connected to the second gas delivery element 210 and the mixing buffer unit 400 .
  • the third valve element 220 includes a third manual diaphragm valve, a second pressure regulating valve and a fourth manual diaphragm valve.
  • the third manual diaphragm valve is arranged at the inlet of the pipelines connected to the second gas delivery element 210 and the mixing buffer unit 400 respectively;
  • the second pressure regulating valve is arranged downstream of the third manual diaphragm valve and upstream of the pipeline connected to the second gas delivery element 210 and the purge unit 700;
  • the fourth manual diaphragm valve is arranged downstream of the second pressure regulating valve and downstream of the pipeline connected to the second gas delivery element 210 and the purge unit 700.
  • the fourth valve element 230 includes but is not limited to a diaphragm valve, a pressure regulating valve, and a one-way valve.
  • the fourth valve element 230 includes but is not limited to a manual diaphragm valve and a pneumatic diaphragm valve.
  • the fourth valve element 230 includes a plurality of diaphragm valves, wherein the plurality of diaphragm valves are disposed at intervals in pipelines respectively connected to the second gas delivery element 210 and the mixing buffer unit 400 .
  • the fourth valve element 230 includes a third pneumatic diaphragm valve and a fourth pneumatic diaphragm valve.
  • the third pneumatic diaphragm valve is disposed downstream of the third valve element 220 (fourth manual diaphragm valve); the fourth pneumatic diaphragm valve is disposed at the outlet of the pipeline connected to the second gas delivery element 210 and the mixing buffer unit 400, respectively, and is located downstream of the third pneumatic diaphragm valve.
  • the second pressure monitoring element 240 includes but is not limited to a pressure sensor, a pressure gauge, and a pressure gauge.
  • the multiple second pressure monitoring elements 240 are disposed at intervals in pipelines respectively connected to the second gas delivery element 210 and the mixing buffer unit 400.
  • At least two second pressure monitoring elements 240 there are at least two second pressure monitoring elements 240. At least one second pressure monitoring element 240 is disposed between the third manual diaphragm valve and the second pressure regulating valve to monitor the pipeline pressure; at least one second pressure monitoring element 240 is disposed between the fourth manual diaphragm valve and the third pneumatic diaphragm valve to monitor the pipeline pressure.
  • at least one second pressure monitoring element 240 is disposed between the third manual diaphragm valve and the second pressure regulating valve to monitor the pipeline pressure; at least one second pressure monitoring element 240 is disposed between the fourth manual diaphragm valve and the third pneumatic diaphragm valve to monitor the pipeline pressure; at least one second pressure monitoring element 240 is disposed between the second pressure regulating valve and the fourth manual diaphragm valve to monitor the pipeline pressure.
  • the second pressure monitoring element 240 disposed between the second pressure regulating valve and the fourth manual diaphragm valve is used to confirm whether its pressure is the same as the pressure of the second pressure monitoring element 240 disposed between the fourth manual diaphragm valve and the third pneumatic diaphragm valve after pressure regulation to avoid errors.
  • the second pressure monitoring element 240 is disposed between the second pressure regulating valve and the fourth manual diaphragm valve, it is located upstream of the pipeline connecting the second gas delivery element 210 and the purge unit 700 .
  • the second flow monitoring element 250 includes but is not limited to a flow sensor, a mass flow meter, and a mass flow controller.
  • the second flow monitoring element 250 is disposed at an outlet of a pipeline connected to the second gas delivery element 210 and the mixing buffer unit 400 respectively.
  • the second flow monitoring element 250 is disposed between the third pneumatic diaphragm valve and the fourth pneumatic diaphragm valve.
  • the concentration monitoring unit 300 is disposed in a pipeline connected to the second gas delivery unit 200 and the mixing buffer unit 400 respectively.
  • the concentration monitoring unit 300 is disposed in a pipeline connected to the second gas delivery element 210 and the mixing buffer unit 400 respectively.
  • the concentration monitoring unit 300 is disposed upstream of the second flow monitoring element 250 .
  • the concentration monitoring unit 300 is disposed between the fourth manual diaphragm valve and the third pneumatic diaphragm valve.
  • the concentration monitoring unit 300 includes but is not limited to a concentration sensor and a concentration meter.
  • the mixing buffer unit 400 includes a mixing buffer element 410, a fifth valve element 420, a sixth valve element 430, a seventh valve element 440 and a third pressure monitoring element 450.
  • the mixing buffer element 410 is respectively connected to the first gas delivery unit 100, the second gas delivery unit 200, the exhaust unit 500 and the pressure relief unit 600, and is used to mix the first gas source and the second gas source to obtain a mixed gas source, and to deliver the mixed gas source to the process chamber;
  • the fifth valve element 420 is disposed at the first gas delivery unit 100, the second gas delivery unit 200, the exhaust unit 500 and the pressure relief unit 600, respectively.
  • the pipeline connected to the second gas delivery unit 200, the mixing buffer element 410, the exhaust unit 500, and the pressure relief unit 600 is used to control the gas flow direction of the pipeline;
  • the sixth valve element 430 is arranged in the pipeline connected to the first gas delivery unit 100, the second gas delivery unit 200, and the mixing buffer element 410, and is located downstream of the fifth valve element 420, and is used to control the opening and closing of the pipeline;
  • the seventh valve element 440 is arranged in the pipeline connected to the mixing buffer element 410 and the process chamber, and is used to control the opening and closing of the pipeline;
  • the third pressure monitoring element 450 is arranged in the pipeline connected to the mixing buffer element 410 and the process chamber, and is used to monitor the pipeline pressure.
  • the mixing buffer element 410 is respectively connected to the first gas delivery element 110 and the second gas delivery element 210;
  • the fifth valve element 420 is arranged in the pipelines respectively connected to the first gas delivery element 110, the second gas delivery element 210, the mixing buffer element 410, the exhaust unit 500, and the pressure relief unit 600;
  • the sixth valve element 430 is arranged in the pipelines respectively connected to the first gas delivery element 110, the second gas delivery element 210, and the mixing buffer element 410.
  • the mixing buffer element 410 includes a mixing buffer tank, an air inlet, and an air outlet.
  • the air inlet is provided in the mixing buffer tank and is respectively connected to the first gas delivery element 110 and the second gas delivery element 210;
  • the air outlet is provided in the mixing buffer tank and is respectively connected to the exhaust unit 500, the pressure relief unit 600, and the process chamber.
  • the air inlet includes an air inlet pipe and an air inlet interface.
  • the air inlet pipe is arranged in the mixing buffer tank; the air inlet interface is arranged at the end of the air inlet pipe, located outside the mixing buffer tank, and connected to pipelines respectively connected to the first gas delivery element 110, the second gas delivery element 210, and the mixing buffer element 410.
  • the gas outlet includes a gas outlet pipe and a gas outlet interface.
  • the gas outlet pipe is provided in the mixing buffer tank; the gas outlet interface is provided at the end of the gas outlet pipe, located outside the mixing buffer tank, and connected to pipelines respectively connected to the mixing buffer element 410, the exhaust unit 500, and the pressure relief unit 600.
  • the fifth valve element 420 includes but is not limited to a diaphragm valve and a one-way valve.
  • the fifth valve element 420 is a multi-way diaphragm valve.
  • the fifth valve element 420 is a manual multi-way diaphragm valve or a pneumatic multi-way diaphragm valve.
  • the fifth valve component 420 is a three-way pneumatic diaphragm valve.
  • the fifth valve element 420 includes a pneumatic multi-way diaphragm valve and a one-way valve, wherein the pneumatic multi-way diaphragm valve and the one-way valve are arranged at intervals.
  • the fifth valve element 420 includes a pneumatic multi-way diaphragm valve and a first one-way valve.
  • the pneumatic multi-way diaphragm valve is disposed in a pipeline respectively connected to the first gas delivery element 110, the second gas delivery element 210, the mixing buffer element 410, the exhaust unit 500, and the pressure relief unit 600; the first one-way valve is disposed in a pipeline respectively connected to the pneumatic multi-way diaphragm valve, the exhaust unit 500, and the pressure relief unit 600.
  • the first end of the pneumatic multi-way diaphragm valve is communicated with the first gas delivery element 110 and the second gas delivery element 210 respectively.
  • the second end of the pneumatic multi-way diaphragm valve is communicated with the mixing buffer element 410 ; the third end of the pneumatic multi-way diaphragm valve is communicated with the exhaust unit 500 and the pressure relief unit 600 , respectively.
  • the first end of the pneumatic multi-way diaphragm valve is connected to the pipelines connected to the first gas delivery element 110 and the second gas delivery element 210 respectively; the second end of the pneumatic multi-way diaphragm valve is connected to the pipeline connected to the mixing buffer element 410; the third end of the pneumatic multi-way diaphragm valve is connected to the pipelines connected to the exhaust unit 500 and the pressure relief unit 600 respectively.
  • the sixth valve element 430 includes, but is not limited to, a diaphragm valve.
  • the sixth valve element 430 includes but is not limited to a manual diaphragm valve and a pneumatic diaphragm valve.
  • the sixth valve element 430 includes a fifth manual diaphragm valve, wherein the fifth manual diaphragm valve is disposed in a pipeline that is in communication with the fifth valve element 420 and the mixing buffer element 410 .
  • the seventh valve element 440 includes but is not limited to a diaphragm valve and a pressure regulating valve.
  • the seventh valve component 440 includes but is not limited to a manual diaphragm valve and a pneumatic diaphragm valve.
  • the seventh valve element 440 includes at least one diaphragm valve and a pressure regulating valve.
  • the seventh valve element 440 includes a plurality of diaphragm valves, the plurality of diaphragm valves and the pressure regulating valves are disposed at intervals in pipelines respectively connected to the mixing buffer element 410 and the process chamber.
  • the seventh valve element 440 includes a sixth manual diaphragm valve and a third pressure regulating valve.
  • the sixth manual diaphragm valve is disposed in a pipeline respectively connected to the mixing buffer element 410 and the process chamber;
  • the third pressure regulating valve is disposed in a pipeline respectively connected to the mixing buffer element 410 and the process chamber, and is located downstream of the sixth manual diaphragm valve.
  • the sixth manual diaphragm valve is located upstream of the pipelines connected to the mixing buffer element 410, the exhaust unit 500, and the purge unit 700 respectively.
  • the third pressure regulating valve is located upstream of the pipelines connected to the mixing buffer element 410, the exhaust unit 500, and the purge unit 700, respectively.
  • the seventh valve element 440 further includes a fifth pneumatic diaphragm valve, wherein the fifth pneumatic diaphragm valve is disposed in a pipeline connected to the mixing buffer element 410 and the process chamber respectively, and is located downstream of the third pressure regulating valve.
  • the fifth pneumatic diaphragm valve is located upstream of the pipelines connected to the mixing buffer element 410, the exhaust unit 500, and the purge unit 700 respectively.
  • the third pressure monitoring element 450 includes but is not limited to a pressure sensor, a pressure gauge, and a pressure gauge.
  • third pressure monitoring elements 450 there are multiple third pressure monitoring elements 450.
  • Multiple second pressure monitoring elements 240 are disposed at intervals in pipelines respectively connected to the mixing buffer element 410 and the process chamber.
  • the third pressure monitoring element 450 is one.
  • the third pressure monitoring element 450 is disposed on the sixth hand Downstream of the dynamic diaphragm valve.
  • the third pressure monitoring element 450 is disposed between the sixth manual diaphragm valve and the third pressure regulating valve.
  • the two third pressure monitoring elements 450 are disposed between the sixth manual diaphragm valve and the fifth pneumatic diaphragm valve.
  • a third pressure monitoring element 450 is disposed between the sixth manual diaphragm valve and the third pressure regulating valve; another third pressure monitoring element 450 is disposed between the third pressure regulating valve and the fifth pneumatic diaphragm valve.
  • the exhaust unit 500 includes a first vacuum element 510, an eighth valve element 520, a ninth valve element 530 and a tenth valve element 540.
  • the first vacuum element 510 is respectively connected to the first gas delivery unit 100, the second gas delivery unit 200, the mixing buffer unit 400 and the pressure relief unit 600;
  • the eighth valve element 520 is arranged in the pipelines respectively connected to the first gas delivery unit 100, the second gas delivery unit 200, the mixing buffer unit 400, the first vacuum element 510 and the pressure relief unit 600;
  • the ninth valve element 530 is arranged in the pipeline connected to the first vacuum element 510, and is used to control the pipeline of the first vacuum element 510 to exhaust gas outward;
  • the tenth valve element 540 is arranged in the pipeline connected to the first vacuum element 510, and is used to control the pipeline of the gas source delivered to the first vacuum element 510.
  • the first vacuum element 510 is respectively connected to the first gas delivery element 110, the second gas delivery element 210, the mixing buffer element 410, the first vacuum element 510, and the pressure relief unit 600;
  • the eighth valve element 520 is arranged in the pipelines respectively connected to the first gas delivery element 110, the second gas delivery element 210, the mixing buffer element 410, the first vacuum element 510, and the pressure relief unit 600.
  • the first vacuum element 510 includes a vacuum generator, a first gas port, a second gas port, and a third gas port.
  • the first gas port is provided in the vacuum generator and connected to pipelines respectively connected to the first gas delivery element 110, the second gas delivery element 210, the mixing buffer element 410, and the first vacuum element 510;
  • the second gas port is provided in the vacuum generator and connected to the pipeline connected to the first vacuum element 510;
  • the third gas port is provided in the vacuum generator and connected to the pipeline connected to the first vacuum element 510.
  • the first gas port includes a first gas pipe and a first gas port interface.
  • the first gas pipe is connected to the vacuum generator; the first gas port interface is arranged at the end of the first gas pipe and is connected to pipelines respectively connected to the first gas delivery element 110, the second gas delivery element 210, the mixing buffer element 410, and the first vacuum element 510.
  • the second air port includes a second air pipe and a second air port interface.
  • the second air pipe is connected to the vacuum generator; the second air port interface is arranged at the end of the second air pipe and connected to the pipeline connected to the first vacuum element 510.
  • the third air port includes a third air pipe and a third air port interface.
  • the third air pipe is connected to the vacuum generator; the third air port interface is arranged at the end of the second air pipe and connected to the pipeline connected to the first vacuum element 510.
  • the eighth valve component 520 includes, but is not limited to, a diaphragm valve.
  • the eighth valve component 520 includes but is not limited to a manual diaphragm valve and a pneumatic diaphragm valve.
  • the eighth valve component 520 includes a sixth pneumatic diaphragm valve, wherein the sixth pneumatic diaphragm valve is disposed in pipelines connected to the first gas delivery component 110 , the second gas delivery component 210 , the mixing buffer component 410 , and the first vacuum component 510 , respectively.
  • the ninth valve component 530 includes, but is not limited to, a diaphragm valve.
  • the ninth valve component 530 includes but is not limited to a manual diaphragm valve and a pneumatic diaphragm valve.
  • the ninth valve component 530 includes a seventh manual diaphragm valve, wherein the seventh manual diaphragm valve is disposed in a pipeline communicating with the first vacuum component 510 .
  • the tenth valve element 540 includes, but is not limited to, a diaphragm valve.
  • the tenth valve element 540 includes but is not limited to a manual diaphragm valve and a pneumatic diaphragm valve.
  • the tenth valve element 540 includes an eighth manual diaphragm valve, wherein the eighth manual diaphragm valve is disposed in a pipeline communicating with the first vacuum element 510 .
  • the pressure relief unit 600 includes a second vacuum element 610, an eleventh valve element 620 and a twelfth valve element 630.
  • the second vacuum element 610 is respectively connected to the first gas delivery unit 100, the second gas delivery unit 200, the mixing buffer unit 400 and the exhaust unit 500;
  • the eleventh valve element 620 is arranged in the pipelines respectively connected to the mixing buffer unit 400, the exhaust unit 500 and the second vacuum element 610;
  • the twelfth valve element 630 is arranged in the pipelines respectively connected to the mixing buffer unit 400, the exhaust unit 500 and the second vacuum element 610.
  • the second vacuum element 610 is respectively connected to the first gas delivery element 110, the second gas delivery element 210, the mixing buffer element 410, and the first vacuum element 510;
  • the eleventh valve element 620 is arranged in the pipelines respectively connected to the mixing buffer element 410, the first vacuum element 510, and the second vacuum element 610;
  • the twelfth valve element 630 is arranged in the pipelines respectively connected to the mixing buffer element 410, the first vacuum element 510, and the second vacuum element 610.
  • the second vacuum element 610 is a vacuum pump.
  • the eleventh valve component 620 includes, but is not limited to, a diaphragm valve.
  • the eleventh valve element 620 includes but is not limited to a manual diaphragm valve and a pneumatic diaphragm valve.
  • the eleventh valve element 620 includes a ninth manual diaphragm valve, wherein the ninth manual diaphragm valve is disposed in pipelines connected to the first gas delivery element 110, the second gas delivery element 210, the mixing buffer element 410, the first vacuum element 510, and the second vacuum element 610, respectively.
  • the ninth manual diaphragm valve is disposed at the inlet of the pipeline communicating with the second vacuum element 610 .
  • the twelfth valve element 630 includes but is not limited to a diaphragm valve, a pressure regulating valve, and a needle valve.
  • the twelfth valve element 630 includes but is not limited to a manual diaphragm valve and a pneumatic diaphragm valve.
  • the twelfth valve element 630 includes a plurality of diaphragm valves, pressure regulating valves, and needle valves, wherein the plurality of diaphragm valves, pressure regulating valves, and needle valves are arranged at intervals in pipelines connected to the first gas delivery element 110, the second gas delivery element 210, the mixing buffer element 410, and the first vacuum element 510, respectively.
  • the twelfth valve element 630 includes a tenth manual diaphragm valve, wherein the tenth manual diaphragm valve is disposed in a pipeline connected to the mixing buffer element 410 , the first vacuum element 510 , and the second vacuum element 610 , respectively.
  • the tenth manual diaphragm valve is disposed downstream of the third pressure monitoring element 450 .
  • the twelfth valve element 630 further includes an eleventh manual diaphragm valve, which is disposed in a bypass pipeline of pipelines respectively connected to the mixing buffer element 410, the first vacuum element 510, and the second vacuum element 610, and is located between the ninth manual diaphragm valve and the tenth manual diaphragm valve.
  • the bypass pipeline is connected to the gas detection and analysis equipment, and is used to detect the concentration of the mixed gas in the mixing buffer element 410 through the bypass pipeline to determine whether the concentration of the mixed gas meets the required concentration.
  • the purge unit 700 includes a third gas delivery element 710 and a thirteenth valve element 720.
  • the third gas delivery element 710 is respectively connected to the first gas delivery unit 100 and the second gas delivery unit 200;
  • the thirteenth valve element 720 is arranged in a pipeline respectively connected to the first gas delivery unit 100, the second gas delivery unit 200, and the third gas delivery element 710.
  • the third gas delivery element 710 is communicated with the first gas delivery element 110 and the second gas delivery element 210 respectively; the thirteenth valve element 720 is disposed in a pipeline communicated with the first gas delivery element 110 , the second gas delivery element 210 , and the third gas delivery element 710 respectively.
  • the third gas delivery element 710 includes a third gas source supply and a third outlet, wherein the third outlet is disposed at the third gas source supply and is connected to the first gas delivery element 110 and the second gas delivery element 210 respectively.
  • the third outlet is composed of a third outlet pipe and a third outlet interface.
  • the third outlet pipe is connected to a third gas source supply source; the third outlet interface is arranged at the end of the third outlet pipe, and is used to communicate with the first gas delivery element 110 and the second gas delivery element 210 respectively.
  • the third outlet interface is connected to pipelines that are in communication with the first gas delivery element 110 and the second gas delivery element 210 , respectively.
  • the thirteenth valve element 720 includes but is not limited to a diaphragm valve and a one-way valve.
  • the thirteenth valve component 720 includes but is not limited to a manual diaphragm valve and a pneumatic diaphragm valve.
  • the thirteenth valve element 720 includes a plurality of diaphragm valves and a plurality of one-way valves, wherein the plurality of diaphragm valves and the plurality of one-way valves are arranged at intervals in pipelines respectively connected to the first gas delivery element 110, the second gas delivery element 210, and the third gas delivery element 710.
  • the thirteenth valve component 720 includes a twelfth manual diaphragm valve, a seventh pneumatic diaphragm valve, an eighth pneumatic diaphragm valve, a ninth pneumatic diaphragm valve, a second one-way valve, and a third one-way valve.
  • the twelfth manual diaphragm valve is arranged in the pipeline connected to the first gas delivery element 110, the second gas delivery element 210, and the third gas delivery element 710 respectively;
  • the seventh pneumatic diaphragm valve is arranged in the pipeline connected to the first gas delivery element 110, the second gas delivery element 210, and the third gas delivery element 710, and is located downstream of the twelfth manual diaphragm valve;
  • the eighth pneumatic diaphragm valve is arranged in the pipeline connected to the first gas delivery element 110 and the third gas delivery element 710 respectively;
  • the ninth pneumatic diaphragm valve is arranged in the pipeline connected to the second gas delivery element 210 and the third gas delivery element 710 respectively;
  • the second one-way valve is arranged in the pipeline connected to the first gas delivery element 110 and the third gas delivery element 710 respectively, and is located downstream of the seventh pneumatic diaphragm valve and upstream of the eighth pneumatic diaphragm valve;
  • the third one-way valve is
  • the eighth pneumatic diaphragm valve and the ninth pneumatic diaphragm valve are arranged in parallel; the second one-way valve and the third one-way valve are arranged in parallel.
  • the eighth pneumatic diaphragm valve is disposed between the first pressure regulating valve and the second manual diaphragm valve.
  • the eighth pneumatic diaphragm valve is disposed between the second manual diaphragm valve and the first pneumatic diaphragm valve.
  • the ninth pneumatic diaphragm valve is disposed between the second pressure regulating valve and the fourth manual valve.
  • the ninth pneumatic diaphragm valve is disposed between the fourth manual diaphragm valve and the third pneumatic diaphragm valve.
  • the method of use of the present invention is as follows:
  • the fifth valve element 420 is switched to a state where the first gas delivery element 110 , the second gas delivery element 210 , and the mixing buffer element 410 are connected;
  • the mixing buffer element 410 mixes the first gas source and the second gas source to form a mixed gas
  • the seventh valve element 440 is opened, and the mixing buffer element 410 delivers the mixed gas to the process chamber.
  • the state of switching the fifth valve element 420 is to connect the first gas delivery element 110, the second gas delivery element 210, the first vacuum element 510, a second vacuum element 610;
  • the gas in the pipeline is discharged to the outside through the first vacuum element 510;
  • the second vacuum element 610 performs a vacuuming action on the pipeline so that the pressure of the pipeline is negative pressure
  • the gas in the mixing buffer element 410 is discharged to the outside through the first vacuum element 510;
  • the second vacuum element 610 performs a vacuuming action on the mixing buffer element 410 so that the pressure of the mixing buffer element 410 is a negative pressure
  • the fifth valve element 420 is switched to a state where the first gas delivery element 110 , the second gas delivery element 210 , and the mixing buffer element 410 are connected, and step (I) can be performed.
  • step (ii) to step (iv) further include:
  • the fifth valve element 420 is switched to a state where the first gas delivery element 110 , the second gas delivery element 210 , and the mixing buffer element 410 are connected;
  • the fifth valve element 420 is switched to a state where the first gas delivery element 110 , the second gas delivery element 210 , the first vacuum element 510 , and the second vacuum element 610 are connected;
  • the gas in the mixed buffer element 410 and the gas in the pipeline are discharged to the outside through the first vacuum element 510;
  • the second vacuum element 610 performs a vacuuming action on the mixing buffer element 410 and the pipeline, so that the pressure of the mixing buffer element 410 and the pipeline is negative pressure;
  • the eighth valve element 520 When the pressure values of the first pressure monitoring element 140, the second pressure monitoring element 240, and the third pressure monitoring element 450 reach the first preset pressure value, the eighth valve element 520 is closed, and the pressure of the mixing buffer element 410 and the pressure of the pipeline are both negative pressure;
  • the thirteenth valve element 720 is closed, and at this time, the pressure of the mixing buffer element 410 and the pressure of the pipeline are both positive pressure;
  • the gas in the mixed buffer element 410 and the gas in the pipeline are discharged to the outside through the first vacuum element 510;
  • the second vacuum element 610 performs a vacuuming action on the mixing buffer element 410 and the pipeline, so that the pressure of the mixing buffer element 410 and the pipeline is negative pressure;
  • the twelfth valve element 630 When the pressure values of the first pressure monitoring element 140, the second pressure monitoring element 240, and the third pressure monitoring element 450 reach the third preset pressure value, the twelfth valve element 630 is closed, and the pressure of the mixed buffer element 410 and the pressure of the pipeline are negative pressure;
  • step (i) can be performed.
  • the advantages of the present invention are that, by monitoring the concentration of the second gas source provided by the second gas delivery unit through the concentration monitoring unit, high-concentration gas can be accurately diluted on site, thereby reducing the number of times the second gas source is replaced and improving process efficiency; the first gas source delivered by the first gas delivery unit and the second gas source delivered by the second gas delivery unit are mixed and diluted on site by using the mixing buffer unit to achieve the concentration required by the process, thereby extending the single use time of the second gas source, thereby reducing the frequency of replacing the second gas source and further improving the process efficiency; in addition, high-precision, low-concentration gas dilution can be performed through the concentration monitoring unit to meet different process requirements; through the cooperation of the exhaust unit, the pressure relief unit and the purge unit, the pipeline of the mixing device and the mixing buffer unit can be emptied, purged and pressure-relieved to meet the cleanliness requirements and avoid residual gas source from the previous process, so that the gas source replacement operation can be performed.
  • This embodiment is a variation of Embodiment 1.
  • the mixing buffer unit 400 further includes a fourth gas delivery element 460 and a fourteenth valve element 470.
  • the fourth gas delivery element 460 is connected to the mixing buffer element 410; the fourteenth valve element 470 is disposed in a pipeline connected to the fourth gas delivery element 460 and the mixing buffer element 410 respectively.
  • the fourth gas delivery element 460 includes a fourth gas source supply and a fourth outlet, wherein the fourth outlet is disposed at the fourth gas source supply and communicates with the mixing buffer element 410 .
  • the fourth outlet is composed of a fourth outlet pipe and a fourth outlet interface.
  • the fourth outlet pipe is connected to a fourth gas source supply source; the fourth outlet interface is arranged at the end of the fourth outlet pipe and is used to be connected to the mixing buffer element 410.
  • the fourth outlet interface is connected to pipelines that are in communication with the mixing buffer element 410 and the fourth gas delivery element 460 , respectively.
  • the fourteenth valve element 470 includes, but is not limited to, a diaphragm valve.
  • the fourteenth valve component 470 includes but is not limited to a manual diaphragm valve and a pneumatic diaphragm valve.
  • the fourteenth valve element 470 includes a plurality of diaphragm valves, wherein the plurality of diaphragm valves are disposed at intervals in pipelines respectively connected to the mixing buffer element 410 and the fourth gas delivery element 460 .
  • the fourteenth valve element 470 includes a thirteenth manual diaphragm valve and a tenth pneumatic diaphragm valve, wherein the thirteenth manual diaphragm valve is disposed at the inlet of the pipeline respectively connected to the mixing buffer element 410 and the fourth gas delivery element 460; the tenth pneumatic diaphragm valve is disposed at the outlet of the pipeline respectively connected to the mixing buffer element 410 and the fourth gas delivery element 460, and is located downstream of the thirteenth manual diaphragm valve.
  • the pressure relief unit 600 further includes a fifteenth valve element 640 and a fourth pressure monitoring element 650.
  • the fifteenth valve element 640 is disposed in a pipeline respectively connected to the mixing buffer unit 400 and the second vacuum element 610; the fourth pressure monitoring element 650 is disposed in a pipeline respectively connected to the mixing buffer unit 400 and the second vacuum element 610.
  • the fifteenth valve element 640 is disposed in the pipelines respectively connected to the mixing buffer element 410 and the second vacuum element 610 ; the fourth pressure monitoring element 650 is disposed in the pipelines respectively connected to the mixing buffer element 410 and the second vacuum element 610 .
  • the fifteenth valve element 640 further includes a fourth pressure regulating valve, a needle valve, and an eleventh pneumatic diaphragm valve.
  • the fourth pressure regulating valve is disposed in a pipeline connected to the mixing buffer element 410 and the second vacuum element 610, respectively, and is located upstream of the ninth manual valve;
  • the needle valve is disposed in a pipeline connected to the mixing buffer element 410 and the second vacuum element 610, respectively, and is located upstream of the fourth pressure regulating valve;
  • the eleventh pneumatic diaphragm valve is disposed in a pipeline connected to the mixing buffer element 410 and the second vacuum element 610, respectively, and is located upstream of the needle valve.
  • the pipeline where the fourth pressure regulating valve, the needle valve and the eleventh pneumatic diaphragm valve are located and the pipeline where the tenth manual diaphragm valve is located are parallel pipelines, one end of these two pipelines are respectively connected to the mixing buffer element 410, and the other end of these two pipelines are connected to the second vacuum element 610.
  • the eleventh pneumatic diaphragm valve is disposed downstream of the third pressure regulating valve and upstream of the fifth pneumatic diaphragm valve.
  • the fourth pressure monitoring element 650 includes but is not limited to a pressure sensor, a pressure gauge, and a pressure gauge.
  • the plurality of fourth pressure monitoring elements 650 are disposed at intervals in pipelines respectively connected to the mixing buffer element 410 and the second vacuum element 610.
  • the fourth pressure monitoring element 650 is disposed between the ninth manual diaphragm valve and the fourth pressure regulating valve.
  • the mixing buffer element 410 After a period of mixing, the mixing buffer element 410 needs to be replaced;
  • the fifteenth valve element 640 is closed, the fourteenth valve element 470 is opened, and the fourth gas delivery element 460 delivers the mixed gas to the mixing buffer element 410 .
  • the advantage of this embodiment is that after the mixing buffer element mixes the first gas source and the second gas source to form a mixed gas and delivers it to the process chamber for a period of time, the mixed gas inside the mixing buffer element needs to be replaced to avoid inaccurate concentration of the mixed gas inside the mixing buffer element.
  • This embodiment is a variation of Embodiments 1 to 2.
  • the gas mixing device further includes a safety unit 800.
  • the safety unit 800 is disposed on the top of the environment where the gas mixing device is located, and is used to monitor environmental information.
  • the safety guarantee unit 800 includes a smoke monitoring element 810, a liquid spraying element 820, a switch element 830 and a blower element 840.
  • the smoke monitoring element 810 is arranged at the top of the environment where the gas mixing device is located, and is used to monitor the smoke information of the environment;
  • the liquid spraying element 820 is arranged at the top of the environment where the gas mixing device is located, and is used to spray liquid to the environment;
  • the switch element 830 is arranged at the top of the environment where the gas mixing device is located;
  • the blower element 840 is arranged at the top of the environment where the gas mixing device is located, and is used to discharge the gas in the environment.
  • the smoke monitoring element 810 is a smoke detector.
  • the liquid spraying element 820 is a spray head.
  • the switch element 830 is an infrared/ultraviolet switch.
  • the air blowing element 840 includes, but is not limited to, an exhaust fan.
  • the safety assurance unit 800 also includes a gas monitoring element, a flame monitoring element, a temperature monitoring element, and a Piece.
  • the smoke monitoring element is used for early warning;
  • the liquid spray element is used for spraying to reduce the concentration of related gases and liquids in the environment to prevent explosion; the gas in the environment can be quickly discharged to the exhaust gas treatment system through the blowing element.
  • This embodiment relates to the gas mixing method of the present invention, which is applied to the gas mixing device as described in Embodiments 1 to 3.
  • An exemplary embodiment of the present invention is a gas mixing method, comprising:
  • the exhaust unit 500 exhausts the pipelines connected to the first gas delivery unit 100 and the second gas delivery unit 200;
  • the pressure relief unit 600 When the pipeline is emptied, the pressure relief unit 600 performs a vacuuming action on the pipeline to make the pressure of the pipeline negative pressure;
  • the purge unit 700 purges the pipelines connected to the first gas delivery unit 100 and the second gas delivery unit 200;
  • the pressure relief unit 600 relieves pressure on the first gas delivery unit 100 , the second gas delivery unit 200 , and the mixing buffer unit 400 , respectively, so that the mixing buffer unit 400 is in a negative pressure state.
  • the gas mixing method of this embodiment is as follows:
  • the first manual diaphragm valve, the second manual diaphragm valve, the third manual diaphragm valve, the fourth manual diaphragm valve, the fifth manual diaphragm valve, the sixth manual diaphragm valve, the seventh manual diaphragm valve, the eighth manual diaphragm valve, the ninth manual diaphragm valve, and the twelfth manual diaphragm valve are in an open state
  • the tenth manual diaphragm valve is in a closed state
  • the first pressure regulating valve, the second pressure regulating valve, the third pressure regulating valve, and the fourth pressure regulating valve are in an open state
  • the first pneumatic diaphragm valve, the second pneumatic diaphragm valve, the third pneumatic diaphragm valve, and the fourth pneumatic diaphragm valve are in an open state
  • the system determines that the values of the first pressure monitoring element 140 and the second pressure monitoring element 240 are lower than the first preset pressure threshold, and then closes the first pneumatic diaphragm valve, the second pneumatic diaphragm valve, the third pneumatic diaphragm valve, and the fourth pneumatic diaphragm valve at the same time;
  • the system determines that the values of the first pressure monitoring element 140 and the second pressure monitoring element 240 are higher than the second preset pressure threshold, and then closes the eighth pneumatic diaphragm valve and the ninth pneumatic diaphragm valve;
  • Pressure relief then keep the pneumatic diaphragm valve open, open the tenth manual diaphragm valve, observe the value of the third pressure monitoring element 450, and pump the mixing buffer element 410 to negative pressure;
  • the sixth pneumatic diaphragm valve is closed, and the whole is evacuated to a negative pressure again through the second vacuum element 610;
  • the first manual diaphragm valve, the third manual diaphragm valve, and the tenth manual diaphragm valve are in a closed state;
  • the second manual diaphragm valve, the fourth manual diaphragm valve, the fifth manual diaphragm valve, the ninth manual diaphragm valve, the twelfth manual diaphragm valve, the seventh manual diaphragm valve, and the eighth manual diaphragm valve are in an open state;
  • the first pressure regulating valve, the second pressure regulating valve, and the third pressure regulating valve are in an open state;
  • the first pneumatic diaphragm valve, the second pneumatic diaphragm valve, the third pneumatic diaphragm valve, the fourth pneumatic diaphragm valve, the sixth pneumatic diaphragm valve, the seventh pneumatic diaphragm valve, the seventh pneumatic diaphragm valve, the eighth pneumatic diaphragm valve, and the ninth pneumatic diaphragm valve are in
  • the advantage of the present invention is that, through the cooperation of the exhaust unit, the pressure relief unit and the purge unit, the pipeline of the gas mixing device and the mixing buffer unit can be emptied, purged and pressure-relieved respectively, so as to meet the cleanliness requirements and avoid the residual gas source of the previous process, so that the gas source replacement operation can be carried out.
  • This embodiment relates to the gas mixing method of the present invention, which is applied to the gas mixing device as described in embodiments 1 to 3.
  • An exemplary embodiment of the present invention is a gas mixing method, comprising:
  • the exhaust unit 500 exhausts the pipelines connected to the first gas delivery unit 100, the second gas delivery unit 200, and the mixing buffer unit 400;
  • the pressure relief unit 600 When the pipeline is emptied, the pressure relief unit 600 performs a vacuuming action on the pipeline to make the pressure of the pipeline negative pressure;
  • the purge unit 700 purges the pipelines connected to the first gas delivery unit 100 and the second gas delivery unit 200;
  • the pressure relief unit 600 relieves pressure on the first gas delivery unit 100 , the second gas delivery unit 200 , and the mixing buffer unit 400 , respectively, so that the mixing buffer unit 400 is in a negative pressure state.
  • the gas mixing method of this embodiment is as follows:
  • the first manual diaphragm valve, the second manual diaphragm valve, the third manual diaphragm valve, the fourth manual diaphragm valve, the fifth manual diaphragm valve, the sixth manual diaphragm valve, the seventh manual diaphragm valve, the eighth manual diaphragm valve, the tenth manual diaphragm valve, and the twelfth manual diaphragm valve are in an open state;
  • the first pressure regulating valve, the second pressure regulating valve, and the third pressure regulating valve are in an open state;
  • the first pneumatic diaphragm valve, the second pneumatic diaphragm valve, the third pneumatic diaphragm valve, the fourth pneumatic diaphragm valve, the sixth pneumatic diaphragm valve, the seventh pneumatic diaphragm valve, the eighth pneumatic diaphragm valve, and the ninth pneumatic diaphragm valve are in a closed state;
  • the pneumatic three-way diaphragm valve is in
  • the sixth pneumatic diaphragm valve is closed;
  • the system determines that the values of the first pressure monitoring element 140 and the second pressure monitoring element 240 are higher than the second preset pressure threshold, and then closes the eighth pneumatic diaphragm valve and the ninth pneumatic diaphragm valve;
  • Pressure relief close the sixth pneumatic diaphragm valve and pump the entire system to negative pressure again through the second vacuum element 610;
  • the first manual diaphragm valve, the third manual diaphragm valve, and the tenth manual diaphragm valve are in a closed state;
  • the second manual diaphragm valve, the fourth manual diaphragm valve, the fifth manual diaphragm valve, the ninth manual diaphragm valve, the twelfth manual diaphragm valve, the seventh manual diaphragm valve, and the eighth manual diaphragm valve are in an open state;
  • the first pressure regulating valve, the second pressure regulating valve, and the third pressure regulating valve are in an open state;
  • the first pneumatic diaphragm valve, the second pneumatic diaphragm valve, the third pneumatic diaphragm valve, the fourth pneumatic diaphragm valve, the sixth pneumatic diaphragm valve, the seventh pneumatic diaphragm valve, the seventh pneumatic diaphragm valve, the eighth pneumatic diaphragm valve, and the ninth pneumatic diaphragm valve are in
  • the advantage of the present invention is that, through the cooperation of the exhaust unit, the pressure relief unit and the purge unit, the pipeline of the gas mixing device and the mixing buffer unit can be emptied, purged and pressure relieved at the same time, meeting the cleanliness requirements and avoiding the residual gas source of the previous process, so that the gas source replacement operation can be performed.
  • This embodiment relates to the gas mixing method of the present invention, which is applied to the gas mixing device as described in Example 3.
  • An exemplary embodiment of the present invention is a gas mixing method, comprising:
  • the first gas delivery element 110 and the second gas delivery element 210 deliver gas to the mixing buffer element 410 for mixing, and after a period of use, the gas is replaced and the mixed gas is delivered to the front end of the third pressure regulating valve through the sixth manual diaphragm valve;
  • the mixed gas is sent to the eleventh pneumatic diaphragm valve through the three-way pipeline;
  • the mixed gas flows through the eleventh pneumatic diaphragm valve, it flows to the needle valve, and after passing through the fourth pressure regulating valve which is set and adjusted, the mixed gas to be replaced is discharged to the second vacuum element 610 through the ninth manual diaphragm valve;
  • the eleventh pneumatic diaphragm valve is closed, the thirteenth manual diaphragm valve and the tenth pneumatic diaphragm valve are opened, and the fourth gas delivery element 460 delivers the mixed gas to the mixing buffer element 410 .
  • the fourth pressure regulating valve is slowly adjusted, and the value displayed by the fourth pressure monitoring element 650 is observed. After the value is adjusted to be lower than the value of the third pressure monitoring element 450, the ninth manual diaphragm valve is opened to discharge the gas through the second vacuum element 610;
  • the needle valve and the ninth manual diaphragm valve are both in the open state.
  • the system determines that the value of the third pressure monitoring element 450 at the front end of the third pressure regulating valve has not changed within 1 hour, and the machine equipment is in a resting state.
  • the system first closes the first pneumatic diaphragm valve, the second pneumatic diaphragm valve, the third pneumatic diaphragm valve, and the fourth pneumatic diaphragm valve, and then opens the eleventh pneumatic diaphragm valve to discharge the mixed gas in the mixing buffer element 410 through the second vacuum element 610;
  • the mixing buffer element 410 is filled with new mixed air to complete the mixed air replacement in the mixing buffer element 410 .
  • This embodiment relates to a semiconductor process system of the present invention.
  • An illustrative embodiment of the present invention is a semiconductor process system, comprising a gas mixing device as described in any one of Embodiments 1 to 3.
  • the semiconductor process system further includes a plurality of process chambers, and the plurality of process chambers are respectively connected to the mixing buffer unit 400 of the gas mixing device.
  • a plurality of process chambers are respectively connected to the mixing buffer element 410 to obtain the mixed gas delivered by the mixing buffer element 410 .
  • a plurality of fourteenth manual diaphragm valves are provided on the pipelines connecting the plurality of process chambers and the mixing buffer element 410. At least one fourteenth manual diaphragm valve is provided on the pipeline connecting each process chamber and the mixing buffer element 410. The opening and closing of the pipeline is controlled by the fourteenth manual diaphragm valve.
  • the semiconductor process system further includes at least one reserved outlet, which is in communication with the mixing buffer unit 400. Through the reserved outlet, the gas mixing device can supply mixed gas to multiple machines.
  • the reserved outlet is communicated with the mixing buffer element 410 .
  • a fifteenth manual diaphragm valve is provided on the pipeline where the reserved outlet is connected to the mixing buffer element 410.
  • the fifteenth manual diaphragm valve is used to control the on-off of the pipeline.
  • the fourteenth manual diaphragm valve is opened to allow the mixed gas in the mixing buffer element 410 to flow into the process chamber.
  • the gas supply method of this embodiment is as follows:
  • the fourteenth manual diaphragm valve is opened to allow the mixed gas in the mixing buffer element 410 to flow into the process chamber.
  • This embodiment relates to a specific implementation of the present invention.
  • a gas mixing device includes a first gas supply module, a second gas supply module, a concentration monitoring module, a gas mixing module, an exhaust module, a pressure relief module, a purge module and a life safety protection module.
  • the first gas supply module includes a first gas source (such as H 2 ), a manual diaphragm valve MV1N, a pressure regulating valve PRV1N, a manual diaphragm valve MV2NA, a pneumatic diaphragm valve AV2NA, a pneumatic diaphragm valve AV3NA, a pressure gauge PT1N, a pressure gauge PT2N and a mass flow meter MFC.
  • a first gas source such as H 2
  • a manual diaphragm valve MV1N such as H 2
  • a pressure regulating valve PRV1N such as H 2
  • a manual diaphragm valve MV2NA such as a manual diaphragm valve MV2NA
  • a pneumatic diaphragm valve AV2NA such as a pneumatic diaphragm valve AV3NA
  • a pressure gauge PT1N such as H 2
  • a pressure gauge PT2N such as a pressure gauge PT
  • the second gas supply module includes a second gas source (such as 1% PH 3 & H 2 ), a manual diaphragm valve MV1H, a pressure regulating valve PRV1H, a manual diaphragm valve MV2HA, a pneumatic diaphragm valve AV2HA, a pneumatic diaphragm valve AV3HA, a pressure gauge PT1H, a pressure gauge PT2H and a mass flow meter MFC.
  • a second gas source such as 1% PH 3 & H 2
  • a manual diaphragm valve MV1H such as 1% PH 3 & H 2
  • PRV1H a manual diaphragm valve
  • MV2HA a pneumatic diaphragm valve AV2HA
  • AV3HA a pneumatic diaphragm valve AV3HA
  • a pressure gauge PT1H such as 1% PH 3 & H 2
  • a mass flow meter MFC such as
  • the concentration monitoring module includes a concentration meter Mixer.
  • the gas mixing module includes a pneumatic three-way valve A-PP3, a one-way valve CV4, a manual diaphragm valve MV3S, a buffer tank Buffer Vessel, a manual diaphragm valve MV3M, a pressure regulating valve PRV1M, a pneumatic diaphragm valve AV4M, a pressure gauge PT2M, a pressure gauge PT3M, a fourth gas source (mixed gas), a manual diaphragm valve MV5M3 and a pneumatic diaphragm valve AVBK.
  • a pneumatic three-way valve A-PP3, a one-way valve CV4 a manual diaphragm valve MV3S, a buffer tank Buffer Vessel, a manual diaphragm valve MV3M, a pressure regulating valve PRV1M, a pneumatic diaphragm valve AV4M, a pressure gauge PT2M, a pressure gauge PT3M, a fourth gas source
  • the exhaust module includes vacuum generator VG/BV/CV, Vent Gas Outlet, third gas source (such as GN 2 ), third gas source pneumatic Diaphragm valve PVS, manual diaphragm valve VGO1 and manual diaphragm valve VGI1.
  • third gas source such as GN 2
  • third gas source pneumatic Diaphragm valve PVS pneumatic Diaphragm valve PVS
  • manual diaphragm valve VGO1 manual diaphragm valve VGI1.
  • GN2 enters VG/BV/CV through VGI1, and then enters the Vent Gas Outlet through VGO1 for discharge.
  • the pressure relief module includes Vacuum, a manual diaphragm valve VAU, a manual diaphragm valve TV2V, a pneumatic diaphragm valve BKV, a needle valve MCV, a pressure regulating valve BPR1V and a fourth pressure monitoring element 650 .
  • the purge module includes a fourth gas source (such as LPN 2 ), a manual diaphragm valve MV1P, a pneumatic diaphragm valve PGV, a one-way valve CP, a one-way valve CP, a pneumatic diaphragm valve A-PP1 and a pneumatic diaphragm valve A-PP2.
  • a fourth gas source such as LPN 2
  • MV1P manual diaphragm valve
  • PGV pneumatic diaphragm valve
  • PGV pneumatic diaphragm valve
  • CP pneumatic diaphragm valve
  • A-PP1 pneumatic diaphragm valve A-PP1
  • A-PP2 pneumatic diaphragm valve A-PP2
  • the life safety protection module includes a gas detector, flame detector, temperature sensor, smoke sensor, weighing system and pressure system, and is equipped with a touch control module and an audible and visual alarm module.
  • MV1N, MV1H, MV2NA, MV2HA, MV3S, MV1P, VGO1, VGI1, MV3M, and VAU are in the open state
  • TV2V is in the closed state
  • PRV1N, PRV1H, PRV1M, and BPR1V are in the open state
  • AV2NA, AV2HA, AV3NA, and AV3HA are in the open state
  • PGV, A-PP1, A-PP2, BKV, and PVS are in the closed state
  • A-PP3 is in the state leading to the Buffer Vessel
  • MCV is in the closed state
  • the system determines that the values of PT1N, PT1H, PT2N, and PT2H are lower than -10psi, and then closes AV2NA, AV2HA, AV3NA, and AV3HA simultaneously;
  • the system determines that the values of PT1N, PT1H, PT2N, and PT2H are higher than 100psi, and then closes A-PP1 and APP-2;
  • MV1N, MV1H, TV2V are closed
  • MV2NA, MV2HA, MV3S, VAU, MV1P, VGO1, VGI1 are open
  • PRV1N, PRV1H, PRV1M are open
  • AV2NA, AV2HA, AV3NA, AV3HA, PGV, A-PP1, A-PP2, BKV, and PVS are in the closed state
  • A-PP3 is in the buffer vessel state.
  • MV1N, MV1H, MV2NA, MV2HA, MV3S, MV3M, TV2V, VGO1, VGI1, and MV1P are in the open state;
  • PRV1N, PRV1H, and PRV1M are in the open state;
  • AV2NA, AV2HA, AV3NA, AV3HA, PVS, PGV, A-PP1, and A-PP2 are in the closed state; and
  • A-PP3 is in the state leading to the Buffer Vessel;
  • the PVS is turned off
  • the system determines that the values of PT1N, PT1H, PT2N, PT2H, PT2M, and PT3M are higher than 100 psi, and then closes A-PP1 and APP-2;
  • MV1N, MV1H, MV2NA, MV2HA, MV3S, MV3M, TV2V, VGO1, VGI1, and MV1P are in the open state;
  • PRV1N, PRV1H, and PRV1M are in the open state;
  • AV2NA, AV2HA, AV3NA, AV3HA, PVS, PGV, A-PP1, and A-PP2 are in the closed state; and
  • A-PP3 is in the state leading to the Buffer Vessel.
  • the Buffer Vessel After mixing for a period of time, the Buffer Vessel needs to be replaced. Specifically:
  • the mixed gas is sent to the front end of PRV1M through MV3M;
  • the gas After adjusting PRV1M, the gas is sent to BKV through the three-way pipeline. After the mixed gas flows through BKV, it flows to MCV. After passing through the set and adjusted BPR1V, the mixed gas that needs to be replaced is discharged to Vacuum through VAU.
  • the method of regulating BPR1V includes:
  • the BKV is opened to discharge the mixed gas in the Buffer Vessel through the vacuum pipeline, and the Buffer Vessel is filled with new mixed gas through the fourth gas source to complete the mixed gas replacement in the Buffer Vessel.

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Abstract

本发明涉及一种混气装置、方法及半导体工艺系统，包括第一气体输送单元、第二气体输送单元、浓度监测单元、混合缓冲单元、排气单元、泄压单元和吹扫单元。其优点在于，通过浓度监测单元可以进行高精度、低浓度的气体稀释，从而满足不同的工艺要求；利用混合缓冲单元将第一气体输送单元输送的第一气源和第二气体输送单元输送的第二气源进行现场混合稀释以达到工艺要求的浓度，延长了第二气源的单次使用时间，降低更换第二气源的的频率，进提高工艺效率；通过排气单元、泄压单元和吹扫单元的配合，可以对混气装置的管路以及混合缓冲单元进行排空、吹扫、泄压，满足洁净要求，避免残留前次工艺气源，从而可以进行更换气源操作。

Description

一种混气装置、方法及半导体工艺系统 技术领域
本发明涉及半导体生产技术领域，尤其涉及一种混气装置、方法及半导体工艺系统。
背景技术
在半导体生产工艺中，一般会用到混合气体，例如20PPM～200PPM的PH3/H2、B2H6/H2等、3％～5％的H2/N2等等不同比例的混合气体。对于外延设备而言，其会用到很多低浓度的PH3/H2、B2H6/H2。半导体工艺在使用这些气体时，对气体浓度的稳定性有很高的要求，一般气体的供应方式是40L或47L的成品混气钢瓶。
在每次钢瓶使用完后，都需要对管路重新进行吹扫置换，以清除管路内残存的混合气体，然后进行钢瓶更换。然而，一旦用气量增大，若无法使用大钢瓶进行供气，则更换钢瓶的频率就会增加，不仅增加工艺成本，还会影响到工艺的效率。
此外，由于部分混合气体有保质期。若长时间不使用混合气体，混合气体会分解，进而影响气体浓度，无法保证气体浓度的精确性，从而影响工艺效率。
为了解决上述问题，现有技术中采用现场混气的方式。一般地，将两种不同的气源通入混气罐进行混合，然后再输送至工艺腔室。但是，这种混气方式无法保证浓度的均一性，进而工艺效率、降低产品良率。
目前针对相关技术中存在的在用气量大的情况下换瓶频率过高、工艺效率较低、现场混气无法保证浓度均一性等问题，尚未提出有效的解决方案。
发明内容
本发明的目的是针对现有技术中的不足，提供一种混气装置、方法及半导体工艺系统，以解决相关技术中存在的在用气量大的情况下换瓶频率过高、工艺效率较低、现场混气无法保证浓度均一性等问题。
为实现上述目的，本发明采取的技术方案是：
第一方面，本发明提供一种混气装置，包括：
第一气体输送单元，用于向下游输送第一气源；
第二气体输送单元，用于向下游输送第二气源；
浓度监测单元，所述浓度监测单元与所述第二气体输送单元连通，用于监测所述第二气源的浓度；
混合缓冲单元，所述混合缓冲单元分别与所述第一气体输送单元、所述第二气体输送单元连通，用于将所述第一气源和所述第二气源混合以得到混合气源，并将所述混合气源向工艺腔室输送；
排气单元，所述排气单元分别与所述第一气体输送单元、所述第二气体输送单元、所述混合缓冲单元连通；
泄压单元，所述泄压单元分别与所述第一气体输送单元、所述第二气体输送单元、所述混合缓冲单元、所述排气单元连通；
吹扫单元，所述吹扫单元分别与所述第一气体输送单元、所述第二气体输送单元连通。
在其中的一些实施例中，所述第一气体输送单元包括：
第一气体输送元件，与所述混合缓冲单元连通，用于向所述混合缓冲单元输送第一气源；
第一阀元件，所述第一阀元件设置于分别与所述第一气体输送元件、所述混合缓冲单元连通的管路，用于控制管路开闭；
第二阀元件，所述第二阀元件设置于分别与所述第一气体输送元件、所述混合缓冲单元连通的管路，并位于所述第一阀元件的下游，用于控制管路开闭；
第一压力监测元件，所述第一压力监测元件设置于分别与所述第一气体输送元件、所述混合缓冲单元连通的管路，用于监测管路压力；
第一流量监测元件，所述第一流量监测元件设置于分别与所述第一气体输送元件、所述混合缓冲单元连通的管路，用于监测所述第一气源的流量。
在其中的一些实施例中，所述第二气体输送单元包括：
第二气体输送元件，与所述混合缓冲单元连通，用于向所述混合缓冲单元输送第二气源；
第三阀元件，所述第三阀元件设置于分别与所述第二气体输送元件、所述混合缓冲单元连通的管路，用于控制管路开闭；
第四阀元件，所述第四阀元件设置于分别与所述第二气体输送元件、所述混合缓冲单元连通的管路，并位于所述第三阀元件的下游，用于控制管路开闭；
第二压力监测元件，所述第二压力监测元件设置于分别与所述第二气体输送元件、所述混合缓冲单元连通的管路，用于监测管路压力；
第二流量监测元件，所述第二流量监测元件设置于分别与所述第二气体输送元件、所述混合缓 冲单元连通的管路，用于监测所述第二气源的流量。
在其中的一些实施例中，所述混合缓冲单元包括：
混合缓冲元件，混合缓冲元件，所述混合缓冲元件分别与所述第一气体输送单元、所述第二气体输送单元、所述排气单元、所述泄压单元连通，用于将所述第一气源和所述第二气源混合以得到混合气源，并将所述混合气源向工艺腔室输送；
第五阀元件，所述第五阀元件设置于分别与所述第一气体输送单元、所述第二气体输送单元、所述混合缓冲元件、所述排气单元连通的管路，用于控制管路的气体流向；
第六阀元件，所述第六阀元件设置于分别与所述第一气体输送单元、所述第二气体输送单元、所述混合缓冲元件连通的管路，并位于所述第五阀元件的下游，用于控制管路开闭；
第七阀元件，所述第七阀元件设置于分别与所述混合缓冲元件、工艺腔室连通的管路，用于控制管路开闭；
第三压力监测元件，所述第三压力监测元件设置于分别与所述混合缓冲元件、工艺腔室连通的管路，用于监测管路压力。
在其中的一些实施例中，所述混合缓冲单元还包括：
第四气体输送元件，所述第四气体输送元件与所述混合缓冲元件连通；
第十四阀元件，所述第十四阀元件设置于分别与所述混合缓冲元件、所述第四气体输送元件连通的管路。
在其中的一些实施例中，所述排气单元包括：
第一真空元件，所述第一真空元件分别与所述第一气体输送单元、所述第二气体输送单元、所述混合缓冲单元、所述泄压单元连通；
第八阀元件，所述第八阀元件设置于分别与所述第一气体输送单元、所述第二气体输送单元、所述混合缓冲单元、所述第一真空元件、所述泄压单元连通的管路；；
第九阀元件，所述第九阀元件设置于与所述第一真空元件连通的管路，用于控制所述第一真空元件向外排气的管路；
第十阀元件，所述第十阀元件设置于与所述第一真空元件连通的管路，用于控制向所述第一真空元件输送气源的管路。
在其中的一些实施例中，所述泄压单元包括：
第二真空元件，所述第二真空元件分别与所述第一气体输送单元、所述第二气体输送单元、所述混合缓冲单元、所述排气单元连通；
第十一阀元件，所述第十一阀元件设置于分别与所述混合缓冲单元、所述排气单元、所述第二真空元件连通的管路；
第十二阀元件，所述第十二阀元件设置于分别与所述混合缓冲单元、所述排气单元、所述第二真空元件连通的管路。
在其中的一些实施例中，所述泄压单元还包括：
第十五阀元件，所述第十五阀元件设置于分别与所述混合缓冲单元、所述第二真空元件连通的管路；
第四压力监测元件，所述第四压力监测元件设置于分别与所述混合缓冲单元、所述第二真空元件连通的管路，用于监测管路压力。
在其中的一些实施例中，所述吹扫单元包括：
第三气体输送元件，所述第三气体输送元件分别与所述第一气体输送单元、所述第二气体输送单元连通；
第十三阀元件，所述第十三阀元件设置于与分别与所述第一气体输送单元、所述第二气体输送单元、第三气体输送元件连通的管路。
在其中的一些实施例中，还包括：
安全保障单元，所述安全保障单元设置于所述混气装置所处环境的顶部，用于监测环境信息。
在其中的一些实施例中，所述安全保障单元包括：
烟雾监测元件，所述烟雾监测元件设置于所述混气装置所处环境的顶部，用于监测环境的烟雾信息；
液体喷淋元件，所述液体喷淋元件设置于所述混气装置所处环境的顶部，用于向环境喷淋液体；
开关元件，所述开关元件设置于所述混气装置所处环境的顶部；
鼓风元件，所述鼓风元件设置于所述混气装置所处环境的顶部，用于将环境的气体排出。
第二方面，本发明提供一种混气方法，应用于如第一方面所述的混气装置。
第三方面，本发明提供一种半导体工艺系统，包括：
如第一方面所述的混气装置。
本发明采用以上技术方案，与现有技术相比，具有如下技术效果：
本发明的一种混气装置、方法及半导体工艺系统，通过浓度监测单元对第二气体输送单元提供的第二气源的浓度进行监测，可以在现场对高浓度气体进行精准稀释，从而减少了更换第二气源的次数，提高工艺效率；利用混合缓冲单元将第一气体输送单元输送的第一气源和第二气体输送单元 输送的第二气源进行现场混合稀释以达到工艺要求的浓度，延长了第二气源的单次使用时间，从而降低更换第二气源的的频率，进一步提高工艺效率；此外，通过浓度监测单元可以进行高精度、低浓度的气体稀释，从而满足不同的工艺要求；通过排气单元、泄压单元和吹扫单元的配合，可以对混气装置的管路以及混合缓冲单元进行排空、吹扫、泄压，满足洁净要求，避免残留前次工艺气源，从而可以进行更换气源操作。
附图说明
图1是根据本发明实施例的混气装置的示意图(一)；
图2是根据本发明实施例的第一气体输送单元的示意图；
图3是根据本发明实施例的第二气体输送单元的示意图；
图4是根据本发明实施例的混合缓冲单元的示意图(一)；
图5是根据本发明实施例的排气单元的示意图；
图6是根据本发明实施例的泄压单元的示意图(一)；
图7是根据本发明实施例的吹扫单元的示意图；
图8是根据本发明实施例的混合缓冲单元的示意图(二)；
图9是根据本发明实施例的泄压单元的示意图(二)；
图10是根据本发明实施例的混气装置的示意图(二)；
图11是根据本发明实施例的安全保障单元的示意图；
图12是根据本发明实施例的混气装置的具体实施例。
其中的附图标记为：100、第一气体输送单元；110、第一气体输送元件；120、第一阀元件；130、第二阀元件；140、第一压力监测元件；150、第一流量监测元件；
200、第二气体输送单元；210、第二气体输送元件；220、第三阀元件；230、第四阀元件；240、第二压力监测元件；250、第二流量监测元件；
300、浓度监测单元；
400、混合缓冲单元；410、混合缓冲元件；420、第五阀元件；430、第六阀元件；440、第七阀元件；450、第三压力监测元件；460、第四气体输送元件；470、第十四阀元件；
500、排气单元；510、第一真空元件；520、第八阀元件；530、第九阀元件；540、第十阀元件；
600、泄压单元；610、第二真空元件；620、第十一阀元件；630、第十二阀元件；640、第十 五阀元件；650、第四压力监测元件；
700、吹扫单元；710、第三气体输送元件；720、第十三阀元件；
800、安全保障单元；810、烟雾监测元件；820、液体喷淋元件；830、开关元件；840、鼓风元件。
具体实施方式
为了使本申请的目的、技术方案及优点更加清楚明白，以下结合附图及实施例，对本申请进行描述和说明。应当理解，此处所描述的具体实施例仅仅用以解释本申请，并不用于限定本申请。基于本申请提供的实施例，本领域普通技术人员在没有作出创造性劳动的前提下所获得的所有其他实施例，都属于本申请保护的范围。
显而易见地，下面描述中的附图仅仅是本申请的一些示例或实施例，对于本领域的普通技术人员而言，在不付出创造性劳动的前提下，还可以根据这些附图将本申请应用于其他类似情景。此外，还可以理解的是，虽然这种开发过程中所作出的努力可能是复杂并且冗长的，然而对于与本申请公开的内容相关的本领域的普通技术人员而言，在本申请揭露的技术内容的基础上进行的一些设计，制造或者生产等变更只是常规的技术手段，不应当理解为本申请公开的内容不充分。
在本申请中提及“实施例”意味着，结合实施例描述的特定特征、结构或特性可以包含在本申请的至少一个实施例中。在说明书中的各个位置出现该短语并不一定均是指相同的实施例，也不是与其它实施例互斥的独立的或备选的实施例。本领域普通技术人员显式地和隐式地理解的是，本申请所描述的实施例在不冲突的情况下，可以与其它实施例相结合。
除非另作定义，本申请所涉及的技术术语或者科学术语应当为本申请所属技术领域内具有一般技能的人士所理解的通常意义。本申请所涉及的“一”、“一个”、“一种”、“该”等类似词语并不表示数量限制，可表示单数或复数。本申请所涉及的术语“包括”、“包含”、“具有”以及它们任何变形，意图在于覆盖不排他的包含；例如包含了一系列步骤或单元(单元)的过程、方法、系统、产品或设备没有限定于已列出的步骤或单元，而是可以还包括没有列出的步骤或单元，或可以还包括对于这些过程、方法、产品或设备固有的其它步骤或单元。本申请所涉及的“连接”、“相连”、“耦接”等类似的词语并非限定于物理的或者机械的连接，而是可以包括电气的连接，不管是直接的还是间接的。本申请所涉及的“多个”/“若干”是指两个或两个以上。“和/或”描述关联对象的关联关系，表示可以存在三种关系，例如，“A和/或B”可以表示：单独存在A，同时存在A和B，单独存在B这三种情况。字符“/”一般表示前后关联对象是一种“或”的关系。本申请所涉及的术语“第一”、“第二”、“第三”等仅仅是区别类似的对象，不代表针对对象的特 定排序。
实施例1
本实施例涉及本发明的混气装置。
本发明的一个示意性实施例，如图1所示，一种混气装置，包括第一气体输送单元100、第二气体输送单元200、浓度监测单元300、混合缓冲单元400、排气单元500、泄压单元600和吹扫单元700。其中，第一气体输送单元100用于向下游输送第一气源；第二气体输送单元200用于向下游输送第二气源；浓度监测单元300与第二气体输送单元200连通，用于监测第二气源的浓度；混合缓冲单元400分别与第一气体输送单元100、第二气体输送单元200连通，用于将第一气源和第二气源混合以得到混合气源，并将混合气源向工艺腔室输送；排气单元500分别与第一气体输送单元100、第二气体输送单元200、混合缓冲单元400连通；泄压单元600分别与第一气体输送单元100、第二气体输送单元200、混合缓冲单元400、排气单元500连通；吹扫单元700分别与第一气体输送单元100、第二气体输送单元200连通。
本发明的混气方法如下：
(一)混气
第一气体输送单元100向混合缓冲单元400输送第一气源(一般为单一成分)；
第二气体输送单元200向混合缓冲单元400输送第二气源(一般为混合成分)；
浓度监测单元300监测第二气源的浓度，根据第二气源浓度控制第一气源的流量、第二气源的流量；
混合缓冲单元400将第一气源和第二气源混合成预设浓度的混合气体；
混合缓冲单元400将混合气体输送至工艺腔室；
(二)排气
使混合缓冲单元400分别与第一气体输送单元100、第二气体输送单元200连通的管路成为断路；
排气单元500对与第一气体输送单元100、第二气体输送单元200连通的管路进行排气；
(三)吹扫
使排气单元500分别与第一气体输送单元100、第二气体输送单元200连通的管路成为断路；
吹扫单元700对与第一气体输送单元100、第二气体输送单元200连通的管路进行吹扫；
(四)泄压
泄压单元600分别对第一气体输送单元100、第二气体输送单元200、混合缓冲单元400进行 泄压，以使混合缓冲单元400处于负压状态。
其中，步骤(二)～步骤(四)可以在混气前进行，也可以在混气后进行。此外，步骤(二)～步骤(四)可以仅对管路进行排气和吹扫，也可以将管路和混合缓冲单元400一同进行排气和吹扫。
如图2所示，第一气体输送单元100包括第一气体输送元件110、第一阀元件120、第二阀元件130、第一压力监测元件140和第一流量监测元件150。其中，第一气体输送元件110与混合缓冲单元400连通，用于向混合缓冲单元400输送第一气源；第一阀元件120设置于分别与第一气体输送元件110、混合缓冲单元400连通的管路，用于控制管路开闭；第二阀元件130设置于分别与第一气体输送元件110、混合缓冲单元400连通的管路，并位于第一阀元件120的下游，用于控制管路开闭；第一压力监测元件140设置于分别与第一气体输送元件110、混合缓冲单元400连通的管路，用于监测管路压力；第一流量监测元件150设置于分别与第一气体输送元件110、混合缓冲单元400连通的管路，用于监测第一气源的流量。
在其中的一些实施例中，第一气体输送元件110包括第一气源供应源和第一出口。其中，第一出口设置于第一气源供应源，并与混合缓冲单元400连通。
其中，第一出口由第一出口管和第一出口接口构成。其中，第一出口管与第一气源供应源连通；第一出口接口设置于第一出口管的端部，用于与混合缓冲单元400连通。
更具体地，第一出口接口与与混合缓冲单元400连通的管路连接。
在其中的一些实施例中，第一阀元件120包括但不限于隔膜阀、调压阀、单向阀。
在其中的一些实施例中，第一阀元件120包括但不限于手动隔膜阀、气动隔膜阀。
在其中的一些实施例中，第一阀元件120包括若干隔膜阀和调压阀。其中，若干隔膜阀、调压阀间隔设置于分别与第一气体输送元件110与混合缓冲单元400连通的管路。
具体地，第一阀元件120包括第一手动隔膜阀、第一调压阀和第二手动隔膜阀。其中，第一手动隔膜阀设置于分别与第一气体输送元件110、混合缓冲单元400连通的管路的进口；第一调压阀设置于第一手动隔膜阀的下游，并位于第一气体输送元件110与吹扫单元700连通的管路的上游；第二手动隔膜阀设置于第一调压阀的下游，并位于第一气体输送元件110与吹扫单元700连通的管路的下游。
在其中的一些实施例中，第二阀元件130包括但不限于隔膜阀、调压阀、单向阀。
在其中的一些实施例中，第二阀元件130包括但不限于手动隔膜阀、气动隔膜阀。
在其中的一些实施例中，第二阀元件130包括若干隔膜阀。其中，若干隔膜阀间隔设置于分别 与第一气体输送元件110与混合缓冲单元400连通的管路。
具体地，第二阀元件130包括第一气动隔膜阀和第二气动隔膜阀。其中，第一气动隔膜阀设置于第一阀元件120(第二手动隔膜阀)的下游；第二气动隔膜阀设置于分别与第一气体输送元件110、混合缓冲单元400连通的管路的出口，并位于第一气动隔膜阀的下游。
在其中的一些实施例中，第一压力监测元件140包括但不限于压力传感器、压力计、压力表。
在其中的一些实施例中，第一压力监测元件140为若干个。若干第一压力监测元件140间隔地设置于分别与第一气体输送元件110与混合缓冲单元400连通的管路。
在其中的一些实施例中，第一压力监测元件140至少为两个。其中，至少一个第一压力监测元件140设置于第一手动隔膜阀与第一调压阀之间，用于监测管路压力；至少一个第一压力监测元件140设置于第二手动隔膜阀与第一气动隔膜阀之间，用于监测管路压力。
在其中的一些实施例中，第一压力监测元件140至少为三个。其中，至少一个第一压力监测元件140设置于第一手动隔膜阀与第一调压阀之间，用于监测管路压力；至少一个第一压力监测元件140设置于第二手动隔膜阀与第一气动隔膜阀之间，用于监测管路压力；至少一个第一压力监测元件140设置于第一调压阀与第二手动隔膜阀之间，用于监测管路压力。
具体地，设置于第一调压阀与第二手动隔膜阀之间的第一压力监测元件140用于在调压后，确认其压力与设置于第二手动隔膜阀与第一气动隔膜阀之间的第一压力监测元件140的压力是否相同，避免出现错误。
在其中的一些实施例中，若第一压力监测元件140设置于第一调压阀与第二手动隔膜阀之间，则其位于第一气体输送元件110与吹扫单元700连通的管路的上游。
在其中的一些实施例中，第一流量监测元件150包括但不限于流量传感器、质量流量计、质量流量控制器。
在其中的一些实施例中，第一流量监测元件150至少为一个。
在其中的一些实施例中，第一流量监测元件150设置于分别与第一气体输送元件110、混合缓冲单元400连通的管路的出口。
在其中的一些实施例中，第一流量监测元件150设置于第一气动隔膜阀与第二气动隔膜阀之间。
如图3所示，第二气体输送单元200包括第二气体输送元件210、第三阀元件220、第四阀元件230、第二压力监测元件240和第二流量监测元件250。其中，第二气体输送元件210与混合缓冲单元400连通，用于向混合缓冲单元400输送第二气源；第三阀元件220设置于分别与第二气体 输送元件210、混合缓冲单元400连通的管路，用于控制管路开闭；第四阀元件230设置于分别与第二气体输送元件210、混合缓冲单元400连通的管路，并位于第三阀元件220的下游，用于控制管路开闭；第二压力监测元件240设置于分别与第二气体输送元件210、混合缓冲单元400连通的管路，用于监测管路压力；第二流量监测元件250设置于分别与第二气体输送元件210、混合缓冲单元400连通的管路，用于监测第二气源的流量。
在其中的一些实施例中，第二气体输送元件210包括第二气源供应源和第二出口。其中，第二出口设置于第二气源供应源，并与混合缓冲单元400连通。
其中，第二出口由第二出口管和第二出口接口构成。其中，第二出口管与第二气源供应源连通；第二出口接口设置于第二出口管的端部，用于与混合缓冲单元400连通。
更具体地，第二出口接口与与混合缓冲单元400连通的管路连接。
在其中的一些实施例中，第三阀元件220包括但不限于隔膜阀、调压阀、单向阀。
在其中的一些实施例中，第三阀元件220包括但不限于手动隔膜阀、气动隔膜阀。
在其中的一些实施例中，第三阀元件220包括若干隔膜阀和调压阀。其中，若干隔膜阀、调压阀间隔设置于分别与第二气体输送元件210与混合缓冲单元400连通的管路。
具体地，第三阀元件220包括第三手动隔膜阀、第二调压阀和第四手动隔膜阀。其中，第三手动隔膜阀设置于分别与第二气体输送元件210、混合缓冲单元400连通的管路的进口；第二调压阀设置于第三手动隔膜阀的下游，并位于第二气体输送元件210与吹扫单元700连通的管路的上游；第四手动隔膜阀设置于第二调压阀的下游，并位于第二气体输送元件210与吹扫单元700连通的管路的下游。
在其中的一些实施例中，第四阀元件230包括但不限于隔膜阀、调压阀、单向阀。
在其中的一些实施例中，第四阀元件230包括但不限于手动隔膜阀、气动隔膜阀。
在其中的一些实施例中，第四阀元件230包括若干隔膜阀。其中，若干隔膜阀间隔设置于分别与第二气体输送元件210与混合缓冲单元400连通的管路。
具体地，第四阀元件230包括第三气动隔膜阀和第四气动隔膜阀。其中，第三气动隔膜阀设置于第三阀元件220(第四手动隔膜阀)的下游；第四气动隔膜阀设置于分别与第二气体输送元件210、混合缓冲单元400连通的管路的出口，并位于第三气动隔膜阀的下游。
在其中的一些实施例中，第二压力监测元件240包括但不限于压力传感器、压力计、压力表。
在其中的一些实施例中，第二压力监测元件240为若干个。若干第二压力监测元件240间隔地设置于分别与第二气体输送元件210与混合缓冲单元400连通的管路。
在其中的一些实施例中，第二压力监测元件240至少为两个。其中，至少一个第二压力监测元件240设置于第三手动隔膜阀与第二调压阀之间，用于监测管路压力；至少一个第二压力监测元件240设置于第四手动隔膜阀与第三气动隔膜阀之间，用于监测管路压力。
在其中的一些实施例中，第二压力监测元件240至少为三个。其中，至少一个第二压力监测元件240设置于第三手动隔膜阀与第二调压阀之间，用于监测管路压力；至少一个第二压力监测元件240设置于第四手动隔膜阀与第三气动隔膜阀之间，用于监测管路压力；至少一个第二压力监测元件240设置于第二调压阀与第四手动隔膜阀之间，用于监测管路压力。
具体地，设置于第二调压阀与第四手动隔膜阀之间的第二压力监测元件240用于在调压后，确认其压力与设置于第四手动隔膜阀与第三气动隔膜阀之间的第二压力监测元件240的压力是否相同，避免出现错误。
在其中的一些实施例中，若第二压力监测元件240设置于第二调压阀与第四手动隔膜阀之间，则其位于第二气体输送元件210与吹扫单元700连通的管路的上游。
在其中的一些实施例中，第二流量监测元件250包括但不限于流量传感器、质量流量计、质量流量控制器。
在其中的一些实施例中，第二流量监测元件250至少为一个。
在其中的一些实施例中，第二流量监测元件250设置于分别与第二气体输送元件210、混合缓冲单元400连通的管路的出口。
在其中的一些实施例中，第二流量监测元件250设置于第三气动隔膜阀与第四气动隔膜阀之间。
浓度监测单元300设置于分别与第二气体输送单元200与混合缓冲单元400连通的管路。
具体地，浓度监测单元300设置于分别与第二气体输送元件210与混合缓冲单元400连通的管路。
在其中的一些实施例中，浓度监测单元300设置于第二流量监测元件250的上游。
在其中的一些实施例中，浓度监测单元300设置于第四手动隔膜阀与第三气动隔膜阀之间。
在其中的一些实施例中，浓度监测单元300包括但不限于浓度传感器、浓度计。
如图4所示，混合缓冲单元400包括混合缓冲元件410、第五阀元件420、第六阀元件430、第七阀元件440和第三压力监测元件450。其中，混合缓冲元件410分别与第一气体输送单元100、第二气体输送单元200、排气单元500、泄压单元600连通，用于将第一气源和第二气源混合以得到混合气源，并将混合气源向工艺腔室输送；第五阀元件420设置于分别与第一气体输送单元100、 第二气体输送单元200、混合缓冲元件410、排气单元500、泄压单元600连通的管路，用于控制管路的气体流向；第六阀元件430设置于分别与第一气体输送单元100、第二气体输送单元200、混合缓冲元件410连通的管路，并位于第五阀元件420的下游，用于控制管路开闭；第七阀元件440设置于分别与混合缓冲元件410、工艺腔室连通的管路，用于控制管路开闭；第三压力监测元件450设置于分别与混合缓冲元件410、工艺腔室连通的管路，用于监测管路压力。
具体地，混合缓冲元件410分别与第一气体输送元件110、第二气体输送元件210连通；第五阀元件420设置于分别与第一气体输送元件110、第二气体输送元件210、混合缓冲元件410、排气单元500、泄压单元600连通的管路；第六阀元件430设置于分别与第一气体输送元件110、第二气体输送元件210、混合缓冲元件410连通的管路。
在其中的一些实施例中，混合缓冲元件410包括混合缓冲罐、进气口和出气口。其中，进气口设置于混合缓冲罐，并分别与第一气体输送元件110、第二气体输送元件210连通；出气口设置于混合缓冲罐，并与分别与排气单元500、泄压单元600、工艺腔室连通。
其中，进气口包括进气管和进气接口。其中，进气管设置于混合缓冲罐；进气接口设置于进气管的端部，位于混合缓冲罐的外侧，并与分别与第一气体输送元件110、第二气体输送元件210、混合缓冲元件410连通的管路连接。
其中，出气口包括出气管和出气接口。其中，出气管设置于混合缓冲罐；出气接口设置于出气管的端部，位于混合缓冲罐的外侧，并与分别与混合缓冲元件410、排气单元500、泄压单元600连通的管路连接。
在其中的一些实施例中，第五阀元件420包括但不限于隔膜阀、单向阀。
在其中的一些实施例中，第五阀元件420为多通隔膜阀。
在其中的一些实施例中，第五阀元件420为手动多通隔膜阀、气动多通隔膜阀。
在其中的一些实施例中，第五阀元件420为三通气动隔膜阀。
在其中的一些实施例中，第五阀元件420包括气动多通隔膜阀、单向阀。其中，气动多通隔膜阀、单向阀间隔设置。
在其中的一些实施例中，第五阀元件420包括气动多通隔膜阀和第一单向阀。其中，气动多通隔膜阀设置于分别与第一气体输送元件110、第二气体输送元件210、混合缓冲元件410、排气单元500、泄压单元600连通的管路；第一单向阀设置于分别与气动多通隔膜阀、排气单元500、泄压单元600连通的管路。
具体地，气动多通隔膜阀的第一端分别与第一气体输送元件110、第二气体输送元件210连通， 气动多通隔膜阀的第二端与混合缓冲元件410连通；气动多通隔膜阀的第三端分别与排气单元500、泄压单元600连通。
更具体地，气动多通隔膜阀的第一端与分别与第一气体输送元件110、第二气体输送元件210连通的管路连接；气动多通隔膜阀的第二端与与混合缓冲元件410连通的管路连接；气动多通隔膜阀的第三端与分别与排气单元500、泄压单元600连通的管路连接。
在其中的一些实施例中，第六阀元件430包括但不限于隔膜阀。
在其中的一些实施例中，第六阀元件430包括但不限于手动隔膜阀、气动隔膜阀。
在其中的一些实施例中，第六阀元件430包括第五手动隔膜阀。其中，第五手动隔膜阀设置于分别与第五阀元件420、混合缓冲元件410连通的管路。
在其中的一些实施例中，第七阀元件440包括但不限于隔膜阀、调压阀。
在其中的一些实施例中，第七阀元件440包括但不限于手动隔膜阀、气动隔膜阀。
在其中的一些实施例中，第七阀元件440包括至少一隔膜阀、调压阀。在第七阀元件440包括若干隔膜阀的情况下，若干隔膜阀、调压阀间隔设置于分别与混合缓冲元件410、工艺腔室连通的管路。
在其中的一些实施例中，第七阀元件440包括第六手动隔膜阀和第三调压阀。其中，第六手动隔膜阀设置于分别与混合缓冲元件410、工艺腔室连通的管路；第三调压阀设置于分别与混合缓冲元件410、工艺腔室连通的管路，并位于第六手动隔膜阀的下游。
在其中的一些实施例中，第六手动隔膜阀位于分别与混合缓冲元件410、排气单元500、吹扫单元700连通的管路的上游。
在其中的一些实施例中，第三调压阀位于分别与混合缓冲元件410、排气单元500、吹扫单元700连通的管路的上游。
进一步地，第七阀元件440还包括第五气动隔膜阀。其中，第五气动隔膜阀设置于分别与混合缓冲元件410、工艺腔室连通的管路，并位于第三调压阀的下游。
在其中的一些实施例中，第五气动隔膜阀位于分别与混合缓冲元件410、排气单元500、吹扫单元700连通的管路的上游。
在其中的一些实施例中，第三压力监测元件450包括但不限于压力传感器、压力计、压力表。
在其中的一些实施例中，第三压力监测元件450为若干个。若干第二压力监测元件240间隔地设置于分别与混合缓冲元件410、工艺腔室连通的管路。
在其中的一些实施例中，第三压力监测元件450为一个。第三压力监测元件450设置于第六手 动隔膜阀的下游。
在其中的一些实施例中，第三压力监测元件450设置于第六手动隔膜阀与第三调压阀之间。
在其中的一些实施例中，第三压力监测元件450为两个。其中，两个第三压力监测元件450设置于第六手动隔膜阀与第五气动隔膜阀之间。
在其中的一些实施例中，一个第三压力监测元件450设置于第六手动隔膜阀与第三调压阀之间；另一个第三压力监测元件450设置于第三调压阀与第五气动隔膜阀之间。
如图5所示，排气单元500包括第一真空元件510、第八阀元件520、第九阀元件530和第十阀元件540。其中，第一真空元件510分别与第一气体输送单元100、第二气体输送单元200、混合缓冲单元400、泄压单元600连通；第八阀元件520设置于分别与第一气体输送单元100、第二气体输送单元200、混合缓冲单元400、第一真空元件510、泄压单元600连通的管路；第九阀元件530设置于与第一真空元件510连通的管路，用于控制第一真空元件510向外排气的管路；第十阀元件540设置于与第一真空元件510连通的管路，用于控制向第一真空元件510输送气源的管路。
具体地，第一真空元件510分别与第一气体输送元件110、第二气体输送元件210、混合缓冲元件410、第一真空元件510、泄压单元600连通；第八阀元件520设置于分别与第一气体输送元件110、第二气体输送元件210、混合缓冲元件410、第一真空元件510、泄压单元600连通的管路。
在其中的一些实施例中，第一真空元件510包括真空发生器、第一气口、第二气口和第三气口。其中，第一气口设置于真空发生器，并与分别与第一气体输送元件110、第二气体输送元件210、混合缓冲元件410、第一真空元件510连通的管路连接；第二气口设置于真空发生器，并与与第一真空元件510连通的管路连接；第三气口设置于真空发生器，并与与第一真空元件510连通的管路连接。
其中，第一气口包括第一气管和第一气口接口。其中，第一气管与真空发生器连通；第一气口接口设置于第一气管的端部，并与分别与第一气体输送元件110、第二气体输送元件210、混合缓冲元件410、第一真空元件510连通的管路连接。
其中，第二气口包括第二气管和第二气口接口。其中，第二气管与真空发生器连通；第二气口接口设置于第二气管的端部，并与与第一真空元件510连通的管路连接。
其中，第三气口包括第三气管和第三气口接口。其中，第三气管与真空发生器连通；第三气口接口设置于第二气管的端部，并与与第一真空元件510连通的管路连接。
在其中的一些实施例中，第八阀元件520包括但不限于隔膜阀。
在其中的一些实施例中，第八阀元件520包括但不限于手动隔膜阀、气动隔膜阀。
在其中的一些实施例中，第八阀元件520包括第六气动隔膜阀。其中，第六气动隔膜阀设置于分别与第一气体输送元件110、第二气体输送元件210、混合缓冲元件410、第一真空元件510连通的管路。
在其中的一些实施例中，第九阀元件530包括但不限于隔膜阀。
在其中的一些实施例中，第九阀元件530包括但不限于手动隔膜阀、气动隔膜阀。
在其中的一些实施例中，第九阀元件530包括第七手动隔膜阀。其中，第七手动隔膜阀设置于与第一真空元件510连通的管路。
在其中的一些实施例中，第十阀元件540包括但不限于隔膜阀。
在其中的一些实施例中，第十阀元件540包括但不限于手动隔膜阀、气动隔膜阀。
在其中的一些实施例中，第十阀元件540包括第八手动隔膜阀。其中，第八手动隔膜阀设置于与第一真空元件510连通的管路。
如图6所示，泄压单元600包括第二真空元件610、第十一阀元件620和第十二阀元件630。其中，第二真空元件610分别与第一气体输送单元100、第二气体输送单元200、混合缓冲单元400、排气单元500连通；第十一阀元件620设置于分别与混合缓冲单元400、排气单元500、第二真空元件610连通的管路；第十二阀元件630设置于分别与混合缓冲单元400、排气单元500、第二真空元件610连通的管路。
具体地，第二真空元件610分别与第一气体输送元件110、第二气体输送元件210、混合缓冲元件410、第一真空元件510连通；第十一阀元件620设置于分别与混合缓冲元件410、第一真空元件510、第二真空元件610连通的管路；第十二阀元件630设置于分别与混合缓冲元件410、第一真空元件510、第二真空元件610连通的管路。
在其中的一些实施例中，第二真空元件610为真空泵。
在其中的一些实施例中，第十一阀元件620包括但不限于隔膜阀。
在其中的一些实施例中，第十一阀元件620包括但不限于手动隔膜阀、气动隔膜阀。
在其中的一些实施例中，第十一阀元件620包括第九手动隔膜阀。其中，第九手动隔膜阀设置于分别与第一气体输送元件110、第二气体输送元件210、混合缓冲元件410、第一真空元件510、第二真空元件610连通的管路。
更具体地，第九手动隔膜阀设置于与第二真空元件610连通的管路的入口。
在其中的一些实施例中，第十二阀元件630包括但不限于隔膜阀、调压阀、针阀。
在其中的一些实施例中，第十二阀元件630包括但不限于手动隔膜阀、气动隔膜阀。
在其中的一些实施例中，第十二阀元件630包括若干隔膜阀、调压阀、针阀。其中，若干隔膜阀、调压阀、针阀间隔设置于分别与第一气体输送元件110、第二气体输送元件210、混合缓冲元件410、第一真空元件510连通的管路。
在其中的一些实施例中，第十二阀元件630包括第十手动隔膜阀。其中，第十手动隔膜阀设置于分别与混合缓冲元件410、第一真空元件510、第二真空元件610连通的管路。
在其中的一些实施例中，第十手动隔膜阀设置于第三压力监测元件450的下游。
进一步地，第十二阀元件630还包括第十一手动隔膜阀。其中，第十一手动隔膜阀设置于分别与混合缓冲元件410、第一真空元件510、第二真空元件610连通的管路的旁通管路，并位于第九手动隔膜阀与第十手动隔膜阀之间。
其中，旁通管路与气体检测分析设备连通，用于通过该旁通管路对混合缓冲元件410的混合气体的浓度进行检测，判断混合气体的浓度是否符合要求浓度。
如图7所示，吹扫单元700包括第三气体输送元件710和第十三阀元件720。其中，第三气体输送元件710分别与第一气体输送单元100、第二气体输送单元200连通；第十三阀元件720设置于与分别与第一气体输送单元100、第二气体输送单元200、第三气体输送元件710连通的管路。
具体地，第三气体输送元件710分别与第一气体输送元件110、第二气体输送元件210连通；第十三阀元件720设置于与分别与第一气体输送元件110、第二气体输送元件210、第三气体输送元件710连通的管路。
在其中的一些实施例中，第三气体输送元件710包括第三气源供应源和第三出口。其中，第三出口设置于第三气源供应源，并分别与第一气体输送元件110、第二气体输送元件210连通。
其中，第三出口由第三出口管和第三出口接口构成。其中，第三出口管与第三气源供应源连通；第三出口接口设置于第三出口管的端部，用于分别与第一气体输送元件110、第二气体输送元件210连通。
更具体地，第三出口接口与分别与第一气体输送元件110、第二气体输送元件210连通的管路连接。
在其中的一些实施例中，第十三阀元件720包括但不限于隔膜阀、单向阀。
在其中的一些实施例中，第十三阀元件720包括但不限于手动隔膜阀、气动隔膜阀。
在其中的一些实施例中，第十三阀元件720包括若干隔膜阀和若干单向阀。其中，若干隔膜阀和若干单向阀间隔地设置于分别与第一气体输送元件110、第二气体输送元件210、第三气体输送元件710连通的管路。
在其中的一些实施例中，第十三阀元件720包括第十二手动隔膜阀、第七气动隔膜阀、第八气动隔膜阀、第九气动隔膜阀、第二单向阀和第三单向阀。其中，第十二手动隔膜阀设置于分别与第一气体输送元件110、第二气体输送元件210、第三气体输送元件710连通的管路；第七气动隔膜阀设置于与第一气体输送元件110、第二气体输送元件210、第三气体输送元件710连通的管路，并位于第十二手动隔膜阀的下游；第八气动隔膜阀设置于分别与第一气体输送元件110、第三气体输送元件710连通的管路；第九气动隔膜阀设置于分别与第二气体输送元件210、第三气体输送元件710连通的管路；第二单向阀设置于分别与第一气体输送元件110、第三气体输送元件710连通的管路，并位于第七气动隔膜阀的下游、第八气动隔膜阀的上游；第三单向阀设置于分别与第二气体输送元件210、第三气体输送元件710连通的管路，并位于第七气动隔膜阀的下游、第九气动隔膜阀的上游。
其中，第八气动隔膜阀和第九气动隔膜阀并联设置；第二单向阀和第三单向阀并联设置。
在其中的一些实施例中，第八气动隔膜阀设置于第一调压阀与第二手动隔膜阀之间。
在其中的一些实施例中，第八气动隔膜阀设置于第二手动隔膜阀与第一气动隔膜阀之间。
在其中的一些实施例中，第九气动隔膜阀设置于第二调压阀与第四手动阀之间。
在其中的一些实施例中，第九气动隔膜阀设置于第四手动隔膜阀与第三气动隔膜阀之间。
本发明的使用方法如下：
(一)混气
切换第五阀元件420的状态为连通第一气体输送元件110、第二气体输送元件210、混合缓冲元件410；
打开第一阀元件120、第二阀元件130，以使第一气体输送元件110向混合缓冲元件410输送第一气源；
打开第三阀元件220、第四阀元件230，以使第二气体输送元件210向混合缓冲元件410输送第二气源；
打开第六阀元件430，使第一气源和第二气源分别向混合缓冲元件410输送；
混合缓冲元件410将第一气源和第二气源混合完成形成混合气体；
打开第七阀元件440，混合缓冲元件410将混合气体输送至工艺腔室。
(二)排气
关闭第一阀元件120和第三阀元件220；
切换第五阀元件420的状态为连通第一气体输送元件110、第二气体输送元件210、第一真空 元件510、第二真空元件610；
打开第八阀元件520、第九阀元件530、第十阀元件540和第十一阀元件620；
管路的气体通过第一真空元件510向外排出；
在排空的情况下，第二真空元件610对管路进行抽真空作用，以使管路的压力为负压；
在第一压力监测元件140和第二压力监测元件240的压力数值达到第一预设压力数值的情况下，关闭第二阀元件130、第四阀元件230，此时管路的压力为负压；
(三)吹扫
打开第十三阀元件720，以使第三气体输送元件710向管路输送气体；
在第一压力监测元件140和第二压力监测元件240的压力数值达到第二预设压力数值的情况下，关闭第十三阀元件720，此时管路的压力为正压；
(四)泄压
在重复步骤(二)～(三)若干次后，在管路的压力为负压的情况下，打开第十二阀元件630；
混合缓冲元件410的气体通过第一真空元件510向外排出；
在排空的情况下，第二真空元件610对混合缓冲元件410进行抽真空作用，以使混合缓冲元件410的压力为负压；
在第三压力监测元件450的压力数值达到第三预设压力数值的情况下，关闭第十二阀元件630，此时混合缓冲元件410的压力为负压；
在管路和混合缓冲元件410的压力均为负压的情况下，关闭第八阀元件520；
切换第五阀元件420的状态为连通第一气体输送元件110、第二气体输送元件210、混合缓冲元件410，即可进行步骤(一)。
进一步地，步骤(二)～步骤(四)还包括：
(二)排气
切换第五阀元件420的状态为连通第一气体输送元件110、第二气体输送元件210、混合缓冲元件410；
关闭第一阀元件120和第三阀元件220；
切换第五阀元件420的状态为连通第一气体输送元件110、第二气体输送元件210、第一真空元件510、第二真空元件610；
打开第八阀元件520、第九阀元件530、第十阀元件540和第十一阀元件620；
混合缓冲元件410的气体、管路的气体通过第一真空元件510向外排出；
在排空的情况下，第二真空元件610对混合缓冲元件410以及管路进行抽真空作用，以使混合缓冲元件410以及管路的压力为负压；
在第一压力监测元件140、第二压力监测元件240、第三压力监测元件450的压力数值达到第一预设压力数值的情况下，关闭第八阀元件520，此时混合缓冲元件410的压力、管路的压力均为负压；
(三)吹扫
打开第十三阀元件720，以使第三气体输送元件710向管路、混合缓冲元件410输送气体；
在第一压力监测元件140、第二压力监测元件240、第三压力监测元件450的压力数值达到第二预设压力数值的情况下，关闭第十三阀元件720，此时混合缓冲元件410的压力、管路的压力均为正压；
(四)泄压
在重复步骤(二)～(三)若干次后，在混合缓冲元件410的压力、管路的压力为负压的情况下，打开第十二阀元件630；
混合缓冲元件410的气体、管路的气体通过第一真空元件510向外排出；
在排空的情况下，第二真空元件610对混合缓冲元件410以及管路进行抽真空作用，以使混合缓冲元件410以及管路的压力为负压；
在第一压力监测元件140、第二压力监测元件240、第三压力监测元件450的压力数值达到第三预设压力数值的情况下，关闭第十二阀元件630，此时混合缓冲元件410的压力、管路的压力为负压；
关闭第八阀元件520，即可进行步骤(一)。
本发明的优点在于，通过浓度监测单元对第二气体输送单元提供的第二气源的浓度进行监测，可以在现场对高浓度气体进行精准稀释，从而减少了更换第二气源的次数，提高工艺效率；利用混合缓冲单元将第一气体输送单元输送的第一气源和第二气体输送单元输送的第二气源进行现场混合稀释以达到工艺要求的浓度，延长了第二气源的单次使用时间，从而降低更换第二气源的的频率，进一步提高工艺效率；此外，通过浓度监测单元可以进行高精度、低浓度的气体稀释，从而满足不同的工艺要求；通过排气单元、泄压单元和吹扫单元的配合，可以对混气装置的管路以及混合缓冲单元进行排空、吹扫、泄压，满足洁净要求，避免残留前次工艺气源，从而可以进行更换气源操作。
实施例2
本实施例为实施例1的一个变形实施例。
如图8所示，混合缓冲单元400还包括第四气体输送元件460和第十四阀元件470。其中，第四气体输送元件460与混合缓冲元件410连通；第十四阀元件470设置于分别与第四气体输送元件460、混合缓冲元件410连通的管路。
在其中的一些实施例中，第四气体输送元件460包括第四气源供应源和第四出口。其中，第四出口设置于第四气源供应源，并与混合缓冲元件410连通。
其中，第四出口由第四出口管和第四出口接口构成。其中，第四出口管与第四气源供应源连通；第四出口接口设置于第四出口管的端部，用于与混合缓冲元件410连通。
更具体地，第四出口接口与分别与混合缓冲元件410、第四气体输送元件460连通的管路连接。
在其中的一些实施例中，第十四阀元件470包括但不限于隔膜阀。
在其中的一些实施例中，第十四阀元件470包括但不限于手动隔膜阀、气动隔膜阀。
在其中的一些实施例中，第十四阀元件470包括若干隔膜阀。其中，若干隔膜阀间隔地设置于分别与混合缓冲元件410、第四气体输送元件460连通的管路。
在其中的一些实施例中，第十四阀元件470包括第十三手动隔膜阀和第十气动隔膜阀。其中，第十三手动隔膜阀设置于分别与混合缓冲元件410、第四气体输送元件460连通的管路的进口；第十气动隔膜阀设置于分别与与混合缓冲元件410、第四气体输送元件460连通的管路的出口，并位于第十三手动隔膜阀的下游。
如图9所示，泄压单元600还包括第十五阀元件640和第四压力监测元件650。其中，第十五阀元件640设置于分别与混合缓冲单元400、第二真空元件610连通的管路；第四压力监测元件650设置于分别与混合缓冲单元400、第二真空元件610连通的管路。
具体地，第十五阀元件640设置于分别与混合缓冲元件410、第二真空元件610连通的管路；第四压力监测元件650设置于分别与混合缓冲元件410、第二真空元件610连通的管路。
在其中的一些实施例中，第十五阀元件640还包括第四调压阀、针阀、第十一气动隔膜阀。其中，第四调压阀设置于分别与混合缓冲元件410、第二真空元件610连通的管路，并位于第九手动阀的上游；针阀设置于分别与混合缓冲元件410、第二真空元件610连通的管路，并位于第四调压阀的上游；第十一气动隔膜阀设置于分别与混合缓冲元件410、第二真空元件610连通的管路，并位于针阀的上游。
其中，第四调压阀、针阀和第十一气动隔膜阀所在的管路与第十手动隔膜阀所在的管路为并联管路，这两个管路的一端分别与混合缓冲元件410连通，这两个管路的另一端与第二真空元件610连通。
在其中的一些实施例中，第十一气动隔膜阀设置于第三调压阀的下游、第五气动隔膜阀的上游。
在其中的一些实施例中，第四压力监测元件650包括但不限于压力传感器、压力计、压力表。
在其中的一些实施例中，第四压力监测元件650为若干个。若干第四压力监测元件650间隔地设置于分别与混合缓冲元件410、第二真空元件610连通的管路。
在其中的一些实施例中，第四压力监测元件650为一个。第四压力监测元件650设置于第九手动隔膜阀与第四调压阀之间。
本实施例的使用方法如下：
(五)置换泄压
在混气一段时间后，需要对混合缓冲元件410进行置换；
打开第十五阀元件640，使混合缓冲元件410的混合气体通过第二真空元件610向外排出；
关闭第十五阀元件640，打开第十四阀元件470，第四气体输送元件460向混合缓冲元件410输送混合气体。
本实施例的优点在于，在混合缓冲元件对第一气源和第二气源混合形成混合气体并向工艺腔室输送一段时间后，需要对混合缓冲元件的内部的混合气体进行置换，从而避免混合缓冲元件的内部的混合气体浓度不精准。
实施例3
本实施例为实施例1～2的一个变形实施例。
如图10所示，混气装置还包括安全保障单元800。其中，安全保障单元800设置于混气装置所处环境的顶部，用于监测环境信息。
如图11所示，安全保障单元800包括烟雾监测元件810、液体喷淋元件820、开关元件830和鼓风元件840。其中，烟雾监测元件810设置于混气装置所处环境的顶部，用于监测环境的烟雾信息；液体喷淋元件820设置于混气装置所处环境的顶部，用于向环境喷淋液体；开关元件830设置于混气装置所处环境的顶部；鼓风元件840设置于混气装置所处环境的顶部，用于将环境的气体排出。
在其中的一些实施例中，烟雾监测元件810为烟雾探测器。
在其中的一些实施例中，液体喷淋元件820为喷淋头。
在其中的一些实施例中，开关元件830为红紫外开关。
在其中的一些实施例中，鼓风元件840包括但不限于排气扇。
在其中的一些实施例中，安全保障单元800还包括气体监测元件、火焰监测元件、温度监测元 件。
本实施例的优点在于，在混气装置出现泄漏、燃烧的情况下，利用烟雾监测元件进行预警；使用液体喷淋元件进行喷淋，以降低环境内的相关气体、液体的浓度，防止出现爆炸；通过鼓风元件可以快速将环境内的气体排放至废气处理系统。
实施例4
本实施例涉及本发明的混气方法，应用于如实施例1～实施例3所述的混气装置。
本发明的一个示意性实施例，一种混气方法，包括：
(排气步骤)
使混合缓冲单元400分别与第一气体输送单元100、第二气体输送单元200连通的管路成为断路；
排气单元500对与第一气体输送单元100、第二气体输送单元200连通的管路进行排气；
在管路排空的情况下，泄压单元600对管路进行抽真空作用，以使管路的压力为负压；
(吹扫步骤)
使排气单元500分别与第一气体输送单元100、第二气体输送单元200连通的管路成为断路；
吹扫单元700对与第一气体输送单元100、第二气体输送单元200连通的管路进行吹扫；
(泄压步骤)
泄压单元600分别对第一气体输送单元100、第二气体输送单元200、混合缓冲单元400进行泄压，以使混合缓冲单元400处于负压状态。
具体地，本实施例的混气方法如下：
吹扫前：第一手动隔膜阀、第二手动隔膜阀、第三手动隔膜阀、第四手动隔膜阀、第五手动隔膜阀、第六手动隔膜阀、第七手动隔膜阀、第八手动隔膜阀、第九手动隔膜阀、第十二手动隔膜阀处于打开状态，第十手动隔膜阀处于关闭状态，第一调压阀、第二调压阀、第三调压阀、第四调压阀处于打开状态，第一气动隔膜阀、第二气动隔膜阀、第三气动隔膜阀、第四气动隔膜阀为打开状态，第六气动隔膜阀、第七气动隔膜阀、第七气动隔膜阀、第八气动隔膜阀、第九气动隔膜阀为关闭状态，气动三通隔膜阀为通向混合缓冲元件410状态，针阀为关闭状态；
排气：关闭第一手动隔膜阀、第三手动隔膜阀，气动三通阀门转变为通向第二真空元件610，再打开第六气动隔膜阀，将管路排空气体；
系统判断第一压力监测元件140、第二压力监测元件240数值低于第一预设压力阈值，随后同时关闭第一气动隔膜阀、第二气动隔膜阀、第三气动隔膜阀、第四气动隔膜阀；
吹扫：打开第七气动隔膜阀，打开第八气动隔膜阀、第九气动隔膜阀，使管路充满气体；
系统判断第一压力监测元件140、第二压力监测元件240数值高于第二预设压力阈值，接着关闭第八气动隔膜阀、第九气动隔膜阀；
重复排气步骤和吹扫步骤若干次后，即视为管路吹扫干净；
泄压：随后保持气动隔膜阀开启状态，打开第十手动隔膜阀，观察第三压力监测元件450数值，将混合缓冲元件410抽为负压；
完毕后管路连同混合缓冲元件410为负压状态后，关闭第六气动隔膜阀，通过第二真空元件610将整体再次抽为负压；
泄压后：第一手动隔膜阀、第三手动隔膜阀、第十手动隔膜阀处于关闭状态，第二手动隔膜阀、第四手动隔膜阀、第五手动隔膜阀、第九手动隔膜阀、第十二手动隔膜阀、第七手动隔膜阀、第八手动隔膜阀处于打开状态，第一调压阀、第二调压阀、第三调压阀处于打开状态，第一气动隔膜阀、第二气动隔膜阀、第三气动隔膜阀、第四气动隔膜阀、第六气动隔膜阀、第七气动隔膜阀、第七气动隔膜阀、第八气动隔膜阀、第九气动隔膜阀为关闭状态，气动三通隔膜阀为通向混合缓冲元件410状态。
本发明的优点在于，通过排气单元、泄压单元和吹扫单元的配合，可以对混气装置的管路以及混合缓冲单元分别进行排空、吹扫、泄压，满足洁净要求，避免残留前次工艺气源，从而可以进行更换气源操作。
实施例5
本实施例涉及本发明的混气方法，应用于如实施例1～3所述的混气装置。
本发明的一个示意性实施例，一种混气方法，包括：
(排气步骤)
排气单元500对与第一气体输送单元100、第二气体输送单元200、混合缓冲单元400连通的管路进行排气；
在管路排空的情况下，泄压单元600对管路进行抽真空作用，以使管路的压力为负压；
(吹扫步骤)
使排气单元500分别与第一气体输送单元100、第二气体输送单元200、混合缓冲单元400连通的管路成为断路；
吹扫单元700对与第一气体输送单元100、第二气体输送单元200连通的管路进行吹扫；
(泄压步骤)
泄压单元600分别对第一气体输送单元100、第二气体输送单元200、混合缓冲单元400进行泄压，以使混合缓冲单元400处于负压状态。
具体地，本实施例的混气方法如下：
吹扫前：第一手动隔膜阀、第二手动隔膜阀、第三手动隔膜阀、第四手动隔膜阀、第五手动隔膜阀、第六手动隔膜阀、第七手动隔膜阀、第八手动隔膜阀、第十手动隔膜阀、第十二手动隔膜阀处于打开状态，第一调压阀、第二调压阀、第三调压阀处于打开状态，第一气动隔膜阀、第二气动隔膜阀、第三气动隔膜阀、第四气动隔膜阀、第六气动隔膜阀、第七气动隔膜阀、第八气动隔膜阀、第九气动隔膜阀为关闭状态，气动三通隔膜阀为通向混合缓冲元件410状态；
排气：关闭第一手动隔膜阀、第三手动隔膜阀，打开第六气动隔膜阀，打开第一气动隔膜阀、第二气动隔膜阀、第三气动隔膜阀、第四气动隔膜阀；
系统判断第一压力监测元件140、第二压力监测元件240、第三压力监测元件450数值低于第一预设压力阈值后，关闭第六气动隔膜阀；
吹扫：打开第七气动隔膜阀，打开第八气动隔膜阀、第九气动隔膜阀，使管路充满气体；
系统判断第一压力监测元件140、第二压力监测元件240数值高于第二预设压力阈值，接着关闭第八气动隔膜阀、第九气动隔膜阀；
重复排气步骤和吹扫步骤若干次后，即视为管路与混合缓冲元件410吹扫干净；
泄压：关闭第六气动隔膜阀，通过第二真空元件610将整体再次抽为负压；
泄压后：第一手动隔膜阀、第三手动隔膜阀、第十手动隔膜阀处于关闭状态，第二手动隔膜阀、第四手动隔膜阀、第五手动隔膜阀、第九手动隔膜阀、第十二手动隔膜阀、第七手动隔膜阀、第八手动隔膜阀处于打开状态，第一调压阀、第二调压阀、第三调压阀处于打开状态，第一气动隔膜阀、第二气动隔膜阀、第三气动隔膜阀、第四气动隔膜阀、第六气动隔膜阀、第七气动隔膜阀、第七气动隔膜阀、第八气动隔膜阀、第九气动隔膜阀为关闭状态，气动三通隔膜阀为通向混合缓冲元件410状态。
本发明的优点在于，通过排气单元、泄压单元和吹扫单元的配合，可以对混气装置的管路以及混合缓冲单元同时进行排空、吹扫、泄压，满足洁净要求，避免残留前次工艺气源，从而可以进行更换气源操作。
实施例6
本实施例涉及本发明的混气方法，应用于如实施例3所述的混气装置。
本发明的一个示意性实施例，一种混气方法，包括：
(泄压步骤)
第一气体输送元件110和第二气体输送元件210送气至混合缓冲元件410内进行混气，使用一段时间后进行置换，通过第六手动隔膜阀将混气送至第三调压阀前端；
调节第三调压阀后，通过三通管路将混合气体送至第十一气动隔膜阀；
混合气体流过第十一气动隔膜阀后，流向针阀，经过设定调节的第四调压阀后，将需要置换的混合气体通过第九手动隔膜阀排向第二真空元件610；
(置换步骤)
关闭第十一气动隔膜阀，打开第十三手动隔膜阀和第十气动隔膜阀，第四气体输送元件460向混合缓冲元件410输送混合气体。
进一步地，第四调压阀的调节方法如下：
关闭第九手动隔膜阀，将第四调压阀调节压力为最大；
当气体通过第十一气动隔膜阀与针阀时，缓慢调节第四调压阀，并且观察第四压力监测元件650显示数值，调节至低于第三压力监测元件450的数值后，打开第九手动隔膜阀，通过第二真空元件610将气体排出；
在上线状态下，针阀、第九手动隔膜阀均为开启状态，系统通过判断第三调压阀前端的第三压力监测元件450的数值，在1小时内没有发生改变，机台设备处于休息状态，系统先关闭第一气动隔膜阀、第二气动隔膜阀、第三气动隔膜阀、第四气动隔膜阀，随后打开第十一气动隔膜阀，将混合缓冲元件410内的混气通过第二真空元件610排出；
混合缓冲元件410通过充入新的混气，完成混合缓冲元件410内的混气置换。
实施例7
本实施例涉及本发明的半导体工艺系统。
本发明的一个示意性实施例，一种半导体工艺系统，包括如实施例1～3任一所述的混气装置。
进一步地，半导体工艺系统还包括若干工艺腔室，若干工艺腔室分别与混气装置的混合缓冲单元400连通。
具体地，若干工艺腔室分别与混合缓冲元件410连通，用于获取混合缓冲元件410输送的混合气体。
更具体地，在若干工艺腔室与混合缓冲元件410连通的管路上，设置有若干第十四手动隔膜阀。每一工艺腔室与混合缓冲元件410连通的管路上设置至少一第十四手动隔膜阀。通过第十四手动隔膜阀控制该管路的通断。
进一步地，半导体工艺系统还包括至少一预留出口。预留出口与混合缓冲单元400连通。通过预留出口，使得混气装置可以对多个机台进行混合气体供应。
具体地，预留出口与混合缓冲元件410连通。
更具体地，在预留出口与混合缓冲元件410连通的管路上，设置有第十五手动隔膜阀。通过第十五手动隔膜阀控制该管路的通断。
本实施例的供气方法如下：
打开第七阀元件440；
观察第三压力监测元件450的压力是否有变化；
在无变化的情况下，打开第十四手动隔膜阀，以使混合缓冲元件410的混合气体向工艺腔室流动。
更具体地，本实施例的供气方法如下：
打开第五阀元件；
观察第三压力监测元件450的压力是否有变化；
在无变化的情况下，打开第十四手动隔膜阀，以使混合缓冲元件410的混合气体向工艺腔室流动。
实施例8
本实施例涉及本发明的一个具体实施方式。
如图12所示，一种混气装置，包括第一供气模块、第二供气模块、浓度监测模块、混气模块、排气模块、泄压模块、吹扫模块和生命安全保障模块构成。
第一供气模块包括第一气源(如H2)、手动隔膜阀MV1N、调压阀PRV1N、手动隔膜阀MV2NA、气动隔膜阀AV2NA、气动隔膜阀AV3NA、压力计PT1N、压力计PT2N和质量流量计MFC。
第二供气模块包括第二气源(如1％PH3&H2)、手动隔膜阀MV1H、调压阀PRV1H、手动隔膜阀MV2HA、气动隔膜阀AV2HA、气动隔膜阀AV3HA、压力计PT1H、压力计PT2H和质量流量计MFC。
浓度监测模块包括浓度计Mixer。
混气模块包括气动三通阀A-PP3、单向阀CV4、手动隔膜阀MV3S、缓冲罐Buffer Vessel、手动隔膜阀MV3M、调压阀PRV1M、气动隔膜阀AV4M、压力计PT2M、压力计PT3M、第四气源(混合气体)、手动隔膜阀MV5M3和气动隔膜阀AVBK。
排气模块包括真空发生器VG/BV/CV、Vent Gas Outlet、第三气源(如GN2)、第三气源气动 隔膜阀PVS、手动隔膜阀VGO1和手动隔膜阀VGI1。
在排气模块中，GN2通过VGI1进入VG/BV/CV，然后通过VGO1进入Vent Gas Outlet排出。
泄压模块包括Vacuum、手动隔膜阀VAU、手动隔膜阀TV2V、气动隔膜阀BKV、针阀MCV、调压阀BPR1V和第四压力监测元件650。
吹扫模块包括第四气源(如LPN2)、手动隔膜阀MV1P、气动隔膜阀PGV、单向阀CP、单向阀CP、气动隔膜阀A-PP1和气动隔膜阀A-PP2。
生命安全保障模块包括包含气体侦测器、火焰探测器、温度传感器、烟雾传感器、称重系统及压力系统，并配备触摸控制模组及声光报警模组。
本实施例的使用方法如下：
(一)分别对第一供气模块的管路、第二供气模块的管路、混气模块进行排气吹扫泄压
吹扫前：
MV1N、MV1H、MV2NA、MV2HA、MV3S、MV1P、VGO1、VGI1、MV3M、VAU处于打开状态，TV2V处于关闭状态，PRV1N、PRV1H、PRV1M、BPR1V处于打开状态，AV2NA、AV2HA、AV3NA、AV3HA为打开状态，PGV、A-PP1、A-PP2、BKV、PVS为关闭状态，A-PP3为通向Buffer Vessel状态，MCV为关闭状态；
排气吹扫泄压：
关闭MV1N、MV1H，A-PP3转变为通向Vacuum；
再打开气动隔膜阀PVS，将管路排空气体；
系统判断PT1N、PT1H、PT2N、PT2H数值低于-10psi，随后同时关闭AV2NA、AV2HA、AV3NA、AV3HA；
接着打开PGV，1S后打开A-PP1、APP-2，使管路充满PN2；
系统判断PT1N、PT1H、PT2N、PT2H数值高于100psi，接着关闭A-PP1、APP-2；
同时打开气动隔膜阀AV2NA、AV2HA、AV3NA、AV3HA排出气体，如此充入排出若干次，即视为管路吹扫干净；
随后保持气动隔膜阀开启状态，打开TV2V，观察PT3M数值，将Buffer Vessel抽为负压；
完毕后管路连同Buffer Vessel为负压状态后，关闭PVS，通过Vacuum将整体再次抽为负压；
吹扫后：
MV1N、MV1H、TV2V处于关闭状态，MV2NA、MV2HA、MV3S、VAU、MV1P、VGO1、VGI1处于打开状态，PRV1N、PRV1H、PRV1M处于打开状态，AV2NA、AV2HA、AV3NA、AV3HA、 PGV、A-PP1、A-PP2、BKV、PVS为关闭状态，A-PP3为通向Buffer Vessel状态。
一般地，在系统上线时混气前，采用上述步骤。
(二)同时对第一供气模块的管路、第二供气模块的管路、混气模块进行排气吹扫泄压
吹扫前：
MV1N、MV1H、MV2NA、MV2HA、MV3S、MV3M、TV2V、VGO1、VGI1、MV1P处于打开状态，PRV1N、PRV1H、PRV1M处于打开状态，AV2NA、AV2HA、AV3NA、AV3HA、PVS、PGV、A-PP1、A-PP2为关闭状态，A-PP3为通向Buffer Vessel状态；
排气吹扫泄压：
关闭MV1N、MV1H，打开PVS，随后5S同时打开AV2NA、AV2HA、AV3NA、AV3HA；
系统判断PT1N、PT1H、PT2N、PT2H、PT2M、PT3M数值低于-10psi后，关闭PVS；
接着打开PGV，1S后打开A-PP1、APP-2，使管路充满PN2；
系统判断PT1N、PT1H、PT2N、PT2H、PT2M、PT3M数值高于100psi，接着关闭A-PP1、APP-2；
打开PVS排出气体，如此充入排出若干次，达到标准后，即视为管路与Buffer Vessel吹扫干净；
同上进行一次Vacuum进行抽气，吹扫后管路与Buffer Vessel为负压状态；
吹扫后：
MV1N、MV1H、MV2NA、MV2HA、MV3S、MV3M、TV2V、VGO1、VGI1、MV1P处于打开状态，PRV1N、PRV1H、PRV1M处于打开状态，AV2NA、AV2HA、AV3NA、AV3HA、PVS、PGV、A-PP1、A-PP2为关闭状态，A-PP3为通向Buffer Vessel状态。
一般地，在系统下线时采用上述步骤。
(三)置换泄压
在混气一段时间后，需要对Buffer Vessel进行置换，具体地：
通过MV3M将混气送至PRV1M前端；
调节PRV1M后，通过三通管路将气送至BKV，混气流过BKV后，流向MCV，经过设定调节的BPR1V后，将需要置换的混气通过VAU排向Vacuum。
其中，调节BPR1V的方法包括：
先关闭VAU，将BPR1V调节压力为最大；
当气体通过BKV与MCV时，缓慢调节BPR1V，并且观察PT1L显示数值；
调节至低于PT2M数值后，打开VAU，通过Vacuum将气体排出；
在上线状态下，MCV、VAU均为开启状态，系统通过判断PRV1M前端的PT2M数值；
在1小时内没有发生改变，机台设备处于休息状态，系统先关闭AV2NA、AV2HA、AV3NA、AV3HA；
随后打开BKV，将Buffer Vessel内的混气通过真空管路排出，Buffer Vessel通过第四气源充入新的混气，完成Buffer Vessel内的混气置换。
以上所述仅为本发明较佳的实施例，并非因此限制本发明的实施方式及保护范围，对于本领域技术人员而言，应当能够意识到凡运用本发明说明书及图示内容所作出的等同替换和显而易见的变化所得到的方案，均应当包含在本发明的保护范围内。

Claims (10)

  1. 一种混气装置，其特征在于，包括：
    第一气体输送单元，用于向下游输送第一气源；
    第二气体输送单元，用于向下游输送第二气源；
    浓度监测单元，所述浓度监测单元与所述第二气体输送单元连通，用于监测所述第二气源的浓度；
    混合缓冲单元，所述混合缓冲单元分别与所述第一气体输送单元、所述第二气体输送单元连通，用于将所述第一气源和所述第二气源混合以得到混合气源，并将所述混合气源向工艺腔室输送；
    排气单元，所述排气单元分别与所述第一气体输送单元、所述第二气体输送单元、所述混合缓冲单元连通；
    泄压单元，所述泄压单元分别与所述第一气体输送单元、所述第二气体输送单元、所述混合缓冲单元、所述排气单元连通；
    吹扫单元，所述吹扫单元分别与所述第一气体输送单元、所述第二气体输送单元连通。
  2. 根据权利要求1所述的混气装置，其特征在于，所述第一气体输送单元包括：
    第一气体输送元件，与所述混合缓冲单元连通，用于向所述混合缓冲单元输送第一气源；
    第一阀元件，所述第一阀元件设置于分别与所述第一气体输送元件、所述混合缓冲单元连通的管路，用于控制管路开闭；
    第二阀元件，所述第二阀元件设置于分别与所述第一气体输送元件、所述混合缓冲单元连通的管路，并位于所述第一阀元件的下游，用于控制管路开闭；
    第一压力监测元件，所述第一压力监测元件设置于分别与所述第一气体输送元件、所述混合缓冲单元连通的管路，用于监测管路压力；
    第一流量监测元件，所述第一流量监测元件设置于分别与所述第一气体输送元件、所述混合缓冲单元连通的管路，用于监测所述第一气源的流量。
  3. 根据权利要求1所述的混气装置，其特征在于，所述第二气体输送单元包括：
    第二气体输送元件，与所述混合缓冲单元连通，用于向所述混合缓冲单元输送第二气源；
    第三阀元件，所述第三阀元件设置于分别与所述第二气体输送元件、所述混合缓冲单元连通的管路，用于控制管路开闭；
    第四阀元件，所述第四阀元件设置于分别与所述第二气体输送元件、所述混合缓冲单元连通的管路，并位于所述第三阀元件的下游，用于控制管路开闭；
    第二压力监测元件，所述第二压力监测元件设置于分别与所述第二气体输送元件、所述混合缓 冲单元连通的管路，用于监测管路压力；
    第二流量监测元件，所述第二流量监测元件设置于分别与所述第二气体输送元件、所述混合缓冲单元连通的管路，用于监测所述第二气源的流量。
  4. 根据权利要求1所述的混气装置，其特征在于，所述混合缓冲单元包括：
    混合缓冲元件，所述混合缓冲元件分别与所述第一气体输送单元、所述第二气体输送单元、所述排气单元、所述泄压单元连通，用于将所述第一气源和所述第二气源混合以得到混合气源，并将所述混合气源向工艺腔室输送；
    第五阀元件，所述第五阀元件设置于分别与所述第一气体输送单元、所述第二气体输送单元、所述混合缓冲元件、所述排气单元连通的管路，用于控制管路的气体流向；
    第六阀元件，所述第六阀元件设置于分别与所述第一气体输送单元、所述第二气体输送单元、所述混合缓冲元件连通的管路，并位于所述第五阀元件的下游，用于控制管路开闭；
    第七阀元件，所述第七阀元件设置于分别与所述混合缓冲元件、工艺腔室连通的管路，用于控制管路开闭；
    第三压力监测元件，所述第三压力监测元件设置于分别与所述混合缓冲元件、工艺腔室连通的管路，用于监测管路压力。
  5. 根据权利要求1所述的混气装置，其特征在于，所述排气单元包括：
    第一真空元件，所述第一真空元件分别与所述第一气体输送单元、所述第二气体输送单元、所述混合缓冲单元、所述泄压单元连通；
    第八阀元件，所述第八阀元件设置于分别与所述第一气体输送单元、所述第二气体输送单元、所述混合缓冲单元、所述第一真空元件、所述泄压单元连通的管路；
    第九阀元件，所述第九阀元件设置于与所述第一真空元件连通的管路，用于控制所述第一真空元件向外排气的管路；
    第十阀元件，所述第十阀元件设置于与所述第一真空元件连通的管路，用于控制向所述第一真空元件输送气源的管路。
  6. 根据权利要求1所述的混气装置，其特征在于，所述泄压单元包括：
    第二真空元件，所述第二真空元件分别与所述第一气体输送单元、所述第二气体输送单元、所述混合缓冲单元、所述排气单元连通；
    第十一阀元件，所述第十一阀元件设置于分别与所述混合缓冲单元、所述排气单元、所述第二真空元件连通的管路；
    第十二阀元件，所述第十二阀元件设置于分别与所述混合缓冲单元、所述排气单元、所述第二真空元件连通的管路。
  7. 根据权利要求1所述的混气装置，其特征在于，所述吹扫单元包括：
    第三气体输送元件，所述第三气体输送元件分别与所述第一气体输送单元、所述第二气体输送单元连通；
    第十三阀元件，所述第十三阀元件设置于与分别与所述第一气体输送单元、所述第二气体输送单元、第三气体输送元件连通的管路。
  8. 根据权利要求1～7任一所述的混气装置，其特征在于，还包括：
    安全保障单元，所述安全保障单元设置于所述混气装置所处环境的顶部，用于监测环境信息。
  9. 一种混气方法，应用于如权利要求1～8任一所述的混气装置。
  10. 一种半导体工艺系统，其特征在于，包括：
    如权利要求1～8任一所述的混气装置。
PCT/CN2023/093415 2022-11-20 2023-05-11 一种混气装置、方法及半导体工艺系统 WO2024103651A1 (zh)

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