WO2024079836A1 - Processing device, processing method, and control program - Google Patents

Processing device, processing method, and control program Download PDF

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Publication number
WO2024079836A1
WO2024079836A1 PCT/JP2022/038156 JP2022038156W WO2024079836A1 WO 2024079836 A1 WO2024079836 A1 WO 2024079836A1 JP 2022038156 W JP2022038156 W JP 2022038156W WO 2024079836 A1 WO2024079836 A1 WO 2024079836A1
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Prior art keywords
processing
container
liquid
sample
control device
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PCT/JP2022/038156
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French (fr)
Japanese (ja)
Inventor
由雄 池澤
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株式会社島津製作所
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Priority to PCT/JP2022/038156 priority Critical patent/WO2024079836A1/en
Publication of WO2024079836A1 publication Critical patent/WO2024079836A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B03SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03DFLOTATION; DIFFERENTIAL SEDIMENTATION
    • B03D1/00Flotation
    • B03D1/14Flotation machines
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00Sampling; Preparing specimens for investigation
    • G01N1/02Devices for withdrawing samples
    • G01N1/04Devices for withdrawing samples in the solid state, e.g. by cutting

Definitions

  • the present disclosure relates to a processing device for processing a sample to recover a target substance, a processing method for processing a sample to recover a target substance, and a control program for processing a sample to recover a target substance.
  • Patent Document 1 discloses a purification device that introduces a decomposition liquid into a container that holds the sample to decompose impurities contained in the sample, and then introduces a heavy liquid into the container after the impurities have been decomposed to recover a target substance that has a lighter specific gravity than the heavy liquid.
  • the refining device disclosed in Patent Document 1 is configured to decompose impurities contained in a sample using a decomposition liquid, and the amount of decomposition liquid introduced is preset according to the amount of sample that can be introduced. Although a certain limit can be set for the amount of sample that can be introduced based on the dimensions of the refining device's container, depending on the amount of impurities contained in the sample to be decomposed, the impurities may not be sufficiently decomposed. If the impurities are not sufficiently decomposed, the accuracy of the purification may decrease and may affect the subsequent analysis process. To prevent this, it is possible to introduce a larger amount of decomposition liquid than usual, but the allowable introduction amount is determined based on the dimensions of the refining device's container.
  • the present disclosure has been made to solve the problems described above, and its purpose is to provide a technique for appropriately processing impurities contained in a sample.
  • a processing device includes a container for storing a sample, a control device for extracting a target substance from the sample stored in the container, and an input device for receiving input from a user.
  • the control device introduces a first processing liquid for treating impurities contained in the sample into the container storing the sample, and after introducing the first processing liquid, executes a refresh process for introducing a second processing liquid into the container for re-treating the impurities contained in the sample based on the input to the input device.
  • a processing method includes the steps of: introducing a first processing liquid into a container containing the sample for processing impurities contained in the sample; and, after the introduction of the first processing liquid, performing a refresh process based on a user's input, in which a second processing liquid is introduced into the container for processing again the impurities contained in the sample.
  • a control program causes a computer to execute a step of introducing a first processing liquid into a container containing the sample for processing impurities contained in the sample, and a step of executing a refresh process, which introduces a second processing liquid into the container for processing impurities contained in the sample again based on a user's input after the introduction of the first processing liquid.
  • the impurities contained in the sample can be processed again using a second processing liquid introduced into the container based on user input, so that the impurities contained in the sample can be properly processed.
  • FIG. 1 is a diagram illustrating a processing apparatus according to an embodiment.
  • FIG. 2 is a diagram for explaining a hardware configuration of a processing device according to an embodiment.
  • 4 is a flowchart of a refining process executed by a control device of the processing apparatus according to the embodiment.
  • 11 is a flowchart of a decomposition process executed by a control device of the processing device according to the embodiment.
  • FIG. 1 is a diagram showing a schematic diagram of the processing device 1 according to an embodiment.
  • the processing device 1 includes a purifier 10 for purifying a mixed sample, and a control device 500 for controlling the purifier 10.
  • the processing device 1 processes the mixed sample by controlling the purifier 10 by the control device 500.
  • the processing device 1 purifies the mixed sample by controlling the purifier 10 by the control device 500, and recovers a target substance contained in the mixed sample that is a recovery target.
  • “Purification” includes extracting a target substance from a mixture using a decomposition liquid, a heavy liquid, or the like.
  • the “mixed sample” refined by the processing device 1 may be in any form as long as it contains the target substance.
  • examples of the “mixed sample” include seawater and sand collected from the ocean or the coast, and processed products such as food or cosmetics.
  • an example of the “mixed sample” is seawater and sand collected from the ocean or the coast.
  • the “mixed sample” will also be referred to simply as the “sample”.
  • the "target substance" to be collected by the processing device 1 may be in any form as long as it is a component that can be collected by the processing device 1.
  • the "target substance” may be microplastics, which are minute plastic particles with a size of 5 mm or less.
  • the "target substance” may be, for example, microplastics contained in seawater and sand collected from the ocean or coast.
  • the purifier 10 includes a container 50 for holding the sample, pipes 11-22, pumps 31-33, solenoid valves 41-43, ports 61-64, a stirrer 71, a stirring bar 72, and an exhaust pipe 80.
  • the container 50 includes a processing section 51 for processing the sample and an overflow section 52 located above the processing section 51, and can be separated into the processing section 51 and the overflow section 52. Ports 61 to 64 are connected to the lower part of the processing section 51.
  • the user opens the container 50 by removing the overflow section 52 from the processing section 51, and introduces a sample into the processing section 51 in the container 50.
  • the processing section 51 is configured as a cylinder with a circular bottom surface, but the bottom surface of the processing section 51 is not limited to a circle, and may have other shapes such as a polygon or an ellipse.
  • the sample contained in the container 50 contains impurities, which are processed in the container 50 using a processing liquid such as a decomposition liquid.
  • impurities are foreign matter in the sample other than the target substance.
  • an example of “impurities” is organic impurities that have the properties of organic matter.
  • the container 50 has a transmittance that allows the status of the decomposition process of impurities contained in the sample stored in the container 50 to be visible from the outside.
  • the processing section 51 and overflow section 52 of the container 50 are formed of a transparent material (e.g., glass) so that the user can view the inside of the container 50 from the outside. Therefore, the user can check from the outside the status of the decomposition process of impurities using the decomposition liquid that is being performed inside the container 50.
  • Pipe 11 connects the decomposition liquid reservoir 210 and the solenoid valve 41.
  • Pipe 12 connects the solenoid valve 41 and the pump 31.
  • Pipe 13 connects the pump 31 and a port 61 provided on the outer periphery of the container 50. In this way, the decomposition liquid reservoir 210 and the port 61 of the container 50 are connected by pipes 11, 12, and 13 via the solenoid valve 41 and the pump 31.
  • Pipe 14 connects the heavy liquid reservoir 220 to the solenoid valve 42.
  • Pipe 15 connects the solenoid valve 42 to the pump 32.
  • Pipe 16 connects the pump 32 to a port 62 provided on the outer periphery of the container 50. In this way, the heavy liquid reservoir 220 and the port 62 of the container 50 are connected by pipes 14, 15, and 16 via the solenoid valve 42 and the pump 32.
  • Pipe 17 connects the rinse liquid reservoir 230 and the solenoid valve 41. That is, the solenoid valve 41 is connected to the decomposition liquid reservoir 210 by pipe 11, and is also connected to the rinse liquid reservoir 230 by pipe 14. In this way, the rinse liquid reservoir 230 and the port 61 of the container 50 are connected by pipes 17, 12, and 13 via the solenoid valve 41 and the pump 31.
  • the pipe 18 connects the rinse liquid reservoir 230 and the solenoid valve 42. That is, the solenoid valve 42 is connected to the heavy liquid reservoir 220 by the pipe 14, and is also connected to the rinse liquid reservoir 230 by the pipe 18. In this way, the rinse liquid reservoir 230 and the port 62 of the container 50 are connected by the pipes 18, 15, and 16 via the solenoid valve 42 and the pump 32.
  • Pipe 19 connects the waste liquid reservoir 240 and the solenoid valve 43.
  • Pipe 20 connects the solenoid valve 43 and the pump 33.
  • Pipe 21 connects the pump 33 and a port 63 provided on the outer periphery of the container 50. In this way, the waste liquid reservoir 240 and the port 63 of the container 50 are connected by pipes 19, 20, and 21 via the solenoid valve 43 and the pump 33.
  • Pipe 22 connects pump 33 to port 64 provided on the outer periphery of container 50. That is, pump 33 is connected to port 63 of container 50 by pipe 21, and is also connected to port 64 of container 50 by pipe 22. In this way, waste liquid reservoir 240 and port 64 of container 50 are connected by pipes 19, 20, and 22 via solenoid valve 43 and pump 33.
  • Pipe 23 connects the waste liquid reservoir 250 and the solenoid valve 43. That is, the solenoid valve 43 is connected to the waste liquid reservoir 240 by pipe 19, and is also connected to the waste liquid reservoir 250 by pipe 23. In this way, the waste liquid reservoir 250 and the port 63 of the container 50 are connected by pipes 23, 20, and 21 via the solenoid valve 43 and the pump 33. In addition, the waste liquid reservoir 250 and the port 64 of the container 50 are connected by pipes 23, 20, and 22 via the solenoid valve 43 and the pump 33.
  • the decomposition liquid reservoir 210 stores a processing liquid for treating impurities.
  • the "processing liquid” may be in any form as long as it treats organic impurities.
  • the "processing liquid” is exemplified by a decomposition liquid for decomposing organic impurities.
  • the “decomposition liquid” is, for example, an oxidizing agent such as hydrogen peroxide (H2O2) or a mixture of hydrogen peroxide (H2O2) and iron (II) oxide (FeO).
  • the heavy liquid reservoir 220 stores a heavy liquid for separating samples by difference in specific gravity.
  • the “heavy liquid” may be in any form as long as it separates samples by difference in specific gravity.
  • the “heavy liquid” causes inorganic impurities having inorganic properties to settle by difference in specific gravity.
  • the “heavy liquid” is, for example, sodium chloride (NaCl), sodium iodide (NaI), zinc chloride (ZnCl2), etc.
  • the “inorganic impurities” are sand, glass, stones, etc.
  • the specific gravity of the "heavy liquid” is set to be greater than the specific gravity of the "target substance” to be recovered by the processing device 1 and less than the specific gravity of the "inorganic impurities".
  • the specific gravity of the "heavy liquid” is set to be greater than the specific gravity of microplastics and less than the specific gravity of sand, glass, stones, etc.
  • the specific gravity of the "heavy liquid” is set to approximately 1.5 to 1.7.
  • the rinse liquid reservoir 230 stores rinse liquid, which is a cleaning liquid for cleaning the inside of the container 50.
  • the “rinse liquid” may be in any form as long as it is used to clean the inside of the container 50.
  • the “rinse liquid” is, for example, water.
  • the “rinse liquid” also has the role of diluting the decomposition liquid introduced into the container 50.
  • the waste liquid reservoirs 240, 250 store waste liquids such as heavy liquid, decomposition liquid, rinse liquid, and seawater contained in the sample discharged from the container 50.
  • the pump 31 introduces the decomposition liquid from the decomposition liquid reservoir 210 or the rinsing liquid from the rinsing liquid reservoir 230 into the container 50 via the port 61 under the control of the control device 500.
  • the pump 31 lowers the pressure on the suction side and raises the pressure on the discharge side to suck in the decomposition liquid or rinsing liquid via the pipe 12 and discharge the decomposition liquid or rinsing liquid to the port 61 via the pipe 13.
  • the control device 500 can adjust the output amount (suction amount, discharge amount) of the pump 31 by controlling the pump 31.
  • the pump 32 introduces the heavy liquid from the heavy liquid reservoir 220 or the rinsing liquid from the rinsing liquid reservoir 230 into the container 50 via the port 62 under the control of the control device 500.
  • the pump 32 lowers the pressure on the suction side and raises the pressure on the discharge side to suck in the heavy liquid or rinsing liquid via the pipe 15 and discharge the heavy liquid or rinsing liquid to the port 62 via the pipe 16.
  • the control device 500 can adjust the amount of the pump 32 delivered (the amount of suction, the amount of discharge).
  • Pump 33 under the control of control device 500, discharges unnecessary liquid in container 50 as waste liquid to waste liquid reservoir 240 or waste liquid reservoir 250 via port 63 or port 64.
  • pump 33 lowers the pressure on the suction side and raises the pressure on the discharge side to suck in waste liquid from container 50 via pipes 21 and 22 and discharge the waste liquid to waste liquid reservoirs 240 and 250 via pipe 20.
  • Control device 500 can adjust the amount of pump 33 delivered (suction amount, discharge amount) by controlling pump 33.
  • the solenoid valve 41 switches the path connected to the port 61 of the container 50 between the decomposition liquid reservoir 210 and the rinsing liquid reservoir 230 under the control of the control device 500.
  • the solenoid valve 42 switches the path connected to the port 62 of the container 50 between the heavy liquid reservoir 220 and the rinse liquid reservoir 230 under the control of the control device 500.
  • the solenoid valve 43 switches the paths connected to the ports 63, 64 of the container 50 between the waste liquid reservoir 240 and the waste liquid reservoir 250 under the control of the control device 500. For example, the waste liquid containing the heavy liquid is discharged to the waste liquid reservoir 240, and the waste liquid containing the decomposition liquid is discharged to the waste liquid reservoir 250.
  • Port 61 introduces into container 50 the decomposition liquid from decomposition liquid reservoir 210 or the rinse liquid from rinse liquid reservoir 230, which is delivered by pump 31.
  • Port 62 introduces into container 50 the heavy liquid from heavy liquid reservoir 220 or the rinse liquid from rinse liquid reservoir 230, which is delivered by pump 32.
  • Ports 63 and 64 discharge the waste liquid in container 50 to pump 33 when pump 33 is driven. The waste liquid delivered by pump 33 is discharged into waste liquid reservoir 240 or waste liquid reservoir 250.
  • the purifier 10 further includes a strainer 300 that captures the target substance contained in the sample and holds it in the container 50.
  • the strainer 300 is provided inside the processing section 51 located below the container 50, which can be separated into two.
  • the strainer 300 is roughly basket-shaped and has meshes large enough to capture the target substance, microplastics.
  • the strainer 300 is made of SUS (Steel Use Stainless), and has multiple openings formed therein that are large enough to capture the target substance, microplastics.
  • the mesh size of the strainer 300 needs to be large enough to prevent particles of 0.1 mm to 5.0 mm from passing through, and approximately 0.1 mm is preferable.
  • the stirrer 71 is, for example, a thermostatic stirrer, and is disposed below the processing section 51 in the container 50.
  • the stirrer 71 stirs the sample in the container 50 by rotating an agitator 72 provided in the container 50 under the control of the control device 500. Furthermore, the stirrer 71 applies heat to the container 50 from below, thereby keeping the temperature of the sample in the container 50 constant.
  • the discharge pipe 80 is connected to a discharge port 55 provided at the top of the overflow section 52 of the container 50, and the supernatant liquid of the sample containing the target substance overflows from the container 50 to the outside and is discharged.
  • the filtration unit 110 recovers the target substance contained in the supernatant by filtering the supernatant of the sample discharged from the discharge pipe 80.
  • the supernatant that passes through the filtration unit 110 is recovered by the waste liquid reservoir 260.
  • the filtration unit 110 has meshes large enough to capture the target substance, microplastics.
  • the filtration unit 110 is a wire mesh made of SUS or a membrane filter made of PTFE (polytetrafluoroethylene) (Teflon (registered trademark)).
  • the mesh size of the filtration unit 110 needs to be large enough to block particles of 0.1 mm to 5.0 mm, and is preferably about 0.1 mm.
  • the control device 500 may be realized by a general-purpose computer, or may be realized by a dedicated computer for controlling the refiner 10.
  • the control device 500 may be an information terminal that executes predetermined information processing, such as a desktop personal computer (PC), a laptop PC, a smartphone, a smart watch, a wearable device, or a tablet PC.
  • the control device 500 controls the pumps 31-33, the solenoid valves 41-43, and the stirrer 71 in the refiner 10.
  • the control device 500 corresponds to one embodiment of the "computer" in this disclosure.
  • Fig. 2 is a diagram for explaining the hardware configuration of the processing device 1 according to the embodiment.
  • the control device 500 includes, as main hardware elements, a calculation device 501, a memory 502, a communication device 503, a display device 504, an input device 505, a data reading device 506, and a storage 510.
  • the arithmetic device 501 is a processor that reads out programs (e.g., a control program 511 and an OS (Operating System) 513) stored in the storage 510, and deploys the read out programs in the memory 502 for execution.
  • the arithmetic device 501 executes a process for controlling the refiner 10 (e.g., the process in FIG. 3 and FIG. 4 described below) by executing the control program 511.
  • a processor which is an example of the arithmetic device 501, is composed of, for example, a microcontroller, a CPU (central processing unit), or an MPU (micro-processing unit).
  • processor has the function of executing various processes by executing a program, but some or all of these functions may be implemented using a dedicated hardware circuit such as an ASIC (Application Specific Integrated Circuit) or an FPGA (Field-Programmable Gate Array).
  • ASIC Application Specific Integrated Circuit
  • FPGA Field-Programmable Gate Array
  • the term "processor” is not limited to a processor in the narrow sense that executes processes using a stored program method, such as a CPU or an MPU, but may also include a hardwired circuit such as an ASIC or an FPGA. For this reason, the processor may be interpreted as a processing circuit, the processing of which is defined in advance by computer-readable code and/or hardwired circuitry.
  • the computing device 501 may be composed of one chip or multiple chips.
  • the processor and associated processing circuitry may be composed of multiple computers interconnected in a wired or wireless manner, such as via a local area network or a wireless network.
  • the processor and associated processing circuitry may be composed of a cloud computer that performs calculations remotely based on input data and outputs the results of the calculations to another device in a remote location.
  • Memory 502 provides a storage area for temporarily storing program code or work memory, etc., when the computing device 501 executes any program.
  • Memory 502 may be one or more non-transitory computer readable mediums.
  • Memory 502 is composed of volatile memory such as DRAM (Dynamic Random Access Memory) or SRAM (Static Random Access Memory), or non-volatile memory such as ROM (Read Only Memory) or flash memory.
  • the communication device 503 includes an interface for outputting control signals for controlling the pumps 31-33, solenoid valves 41-43, or stirrer 71 of the purifier 10.
  • the communication device 503 may also include an interface for transmitting and receiving data to and from other devices via a network (not shown).
  • the communication device 503 is compatible with any communication method, such as Ethernet (registered trademark), wireless LAN (Local Area Network), or Bluetooth (registered trademark).
  • the display device 504 is composed of, for example, an LCD (Liquid Crystal Display) and displays a design screen for a program related to the control of the refiner 10, a setting screen related to the control of the refiner 10, or an alert screen in the event of an abnormality, etc.
  • LCD Liquid Crystal Display
  • the input device 505 is composed of, for example, a keyboard or a mouse, and is operated by the user.
  • the input device 505 may be a touch panel provided on the screen of the display device 504.
  • an input signal corresponding to the operation is input to the arithmetic device 501.
  • the arithmetic device 501 receives an input signal from the input device 505, it outputs a control signal based on the user's input to the pumps 31-33, solenoid valves 41-43, stirrer 71, or the like of the purifier 10.
  • the pumps 31-33, solenoid valves 41-43, or stirrer 71 operate in accordance with the control signal from the arithmetic device 501.
  • the data reading device 506 reads data stored in the recording medium 507.
  • the recording medium 507 may be a non-transitory and tangible computer readable storage medium.
  • the recording medium 507 may be in any form capable of recording various types of data, such as a CD (Compact Disc), a DVD (Digital Versatile Disc), or a USB (Universal Serial Bus) memory.
  • Storage 510 provides a memory area for storing various data required for refining processes, etc.
  • Storage 510 may be one or more computer readable storage media.
  • Storage 510 is configured, for example, by a non-volatile memory device such as a hard disk drive (HDD) or a solid state drive (SSD).
  • Storage 510 stores a control program 511, control data 512, and an OS 513.
  • the control program 511 is a program that describes the contents of the purification process for purifying a sample, and is executed by the computing device 501.
  • the control program 511 may be designed by a user using the input device 505, may be read from the recording medium 507 by the data reading device 506, or may be obtained via a network from another device such as a server by the communication device 503.
  • the control data 512 is data used by the computing device 501 when executing the control program 511.
  • the control data 512 includes data such as settings for controlling the pumps 31-33, the solenoid valves 41-43, and the stirrer 71.
  • the control data 512 may be input by a user using the input device 505, may be read from the recording medium 507 by the data reading device 506, or may be obtained by the communication device 503 from another device such as a server via a network.
  • the OS 513 provides basic functions for the arithmetic unit 501 to execute various processes.
  • Fig. 3 is a flow chart of the purification process executed by the control device 500 of the processing device 1 according to the embodiment. Each step shown in Fig. 3 is realized by the arithmetic device 501 of the control device 500 executing the OS 513 and the control program 511.
  • the user opens the container 50 by removing the processing section 51 from the overflow section 52, and introduces the sample into the processing section 51 in the container 50. After that, the user performs a start operation using the input device 505 of the control device 500, thereby starting control of the purifier 10 by the control device 500.
  • control device 500 When the control device 500 starts to control the purifier 10, the control device 500 controls the discharge pump 33 and solenoid valve 43 to discharge the liquid contained in the sample stored in the container 50 as waste liquid through the pipes 20-23 and ports 63, 64 to the waste liquid reservoir 250 (S1). Note that substances other than the liquid, such as microplastics, are captured by the strainer 300 provided inside the container 50 and are retained within the container 50.
  • the control device 500 executes a decomposition process using the decomposition liquid to decompose organic impurities contained in the sample stored in the container 50 (S2). Details of the decomposition process will be described later with reference to FIG. 4.
  • control device 500 controls the discharge pump 33 and solenoid valve 43 to discharge the waste liquid in the container 50, which is contained in the sample after the decomposition process of the organic impurities, into the waste liquid reservoir 250 via the pipes 20-23 and ports 63, 64 (S3).
  • the target substance, microplastics, is captured by the strainer 300 installed inside the container 50 and is retained in the container 50.
  • the control device 500 stops the discharge pump 33 while controlling the introduction pump 31 and solenoid valve 41 to introduce the rinse liquid in the rinse liquid reservoir 230 into the container 50 via the pipes 17, 12, 13 and port 61, thereby cleaning the inside of the container 50 (S4). At this time, the control device 500 controls the discharge rate of the pump 31 to introduce an amount of rinse liquid preset by the user into the container 50.
  • the amount of rinse liquid introduced in S4 is set to be equal to or less than the capacity of the processing section 51, for example, 150 ml or less.
  • the control device 500 stops the inlet pump 31 while controlling the outlet pump 33 and solenoid valve 43 to discharge the waste liquid after cleaning with the rinse liquid through the pipes 20-23 and ports 63, 64 to the waste liquid reservoir 250 (S5). This cleans the inside of the container 50 with the rinse liquid.
  • the target substance, microplastics is captured by the strainer 300 provided inside the container 50 and is retained within the container 50.
  • the control device 500 may then dry the sample by leaving it as it is for a predetermined period of time (for example, one day).
  • the control device 500 stops the discharge pump 33 while controlling the inlet pump 32 and solenoid valve 42 to introduce the heavy liquid from the heavy liquid reservoir 220 into the container 50 via the pipes 14-16 and port 62 (S6). At this time, the control device 500 controls the output rate of the pump 32 to introduce the amount of heavy liquid preset by the user into the container 50.
  • the control device 500 stops the inlet pump 32 and leaves the sample as it is for a predetermined period of time (for example, one day) (S7).
  • a predetermined period of time for example, one day
  • the control device 500 again controls the pump 32 and the solenoid valve 42 to introduce the heavy liquid from the heavy liquid reservoir 220 back into the container 50 via the pipes 14-16 and the port 62 (S8). At this time, the control device 500 controls the output rate of the pump 32 to introduce an amount of heavy liquid preset by the user into the container 50.
  • the control device 500 controls the output rate of the pump 32 to introduce an amount of heavy liquid preset by the user into the container 50.
  • the discharged liquid discharged through the discharge pipe 80 is filtered by the filtration section 110, and only the waste liquid that passes through the filtration section 110 is collected by the waste liquid reservoir 260.
  • Microplastics which are components with a lower specific gravity than the heavy liquid, remain in the filtration section 110.
  • the control device 500 cleans the inside of the container 50 as a post-processing step. Specifically, the control device 500 controls the pump 33 and solenoid valve 43 on the discharge side to discharge the waste liquid from the container 50 after the microplastics have been recovered into the waste liquid reservoir 240 via the pipes 19-22 and ports 63, 64 (S9).
  • the control device 500 stops the discharge pump 33, while controlling the introduction pump 32 and solenoid valve 42 to introduce the rinse liquid in the rinse liquid reservoir 230 into the container 50 via the pipes 18, 15, 16 and port 62, thereby cleaning the inside of the container 50 (S10). At this time, the control device 500 controls the amount of rinse liquid discharged by the pump 32 to introduce the amount of rinse liquid preset by the user into the container 50.
  • the control device 500 stops the pump 32 on the introduction side, while controlling the pump 33 and solenoid valve 43 on the discharge side to discharge the waste liquid in the container 50 after the rinsing liquid has been introduced into the waste liquid reservoir 240 via the pipes 19-22 and ports 63, 64 (S11). This allows the inside of the container 50 to be cleaned with the rinsing liquid. The control device 500 then ends the processing related to this flow.
  • the control device 500 automatically introduces the decomposition liquid and heavy liquid to the sample contained in the container 50 at an appropriate timing and for an appropriate period of time, and also discharges the waste liquid from the container 50. Therefore, the user does not need to introduce the decomposition liquid and heavy liquid into the container 50 or discharge the waste liquid from the container 50 by himself. Furthermore, according to the processing device 1 of the embodiment, the control device 500 automatically cleans the used container 50 after collecting the microplastics. This allows the user to stably collect microplastics without relying on his or her own skill, and allows the sample to be purified with high accuracy.
  • the processing device 1 is configured to decompose impurities contained in the sample using a decomposition liquid by the decomposition process of S2 in the purification process.
  • the amount of decomposition liquid introduced is preset by the user according to the amount of sample that can be loaded. Although a certain limit can be set for the amount of sample that can be loaded based on the dimensions of the container 50, the impurities may not be sufficiently decomposed depending on the amount of impurities contained in the sample to be decomposed. If the impurities are not sufficiently decomposed, the accuracy of the purification will decrease, which may affect the subsequent analysis process. In addition, the presence of impurities in the recovered material may affect weight measurement or size measurement.
  • the allowable introduction amount is determined by the dimensions of the container 50. If this allowable introduction amount is exceeded, bubbles generated by decomposition may adhere to unexpected locations, which may reduce the purification accuracy. In addition, introducing excessive decomposition liquid may result in unnecessary consumption of the decomposition liquid. Furthermore, if the decomposition process is performed for a long period of time or using an excessive amount of decomposition liquid, the microplastics to be recovered may be damaged depending on their physical properties, which may have an unintended effect on the analysis results of the microplastics. For example, if the microplastics are damaged by excessive decomposition process, the weight and size of the microplastics may change, which may affect the weight or size measurement.
  • the processing device 1 is configured to, in the decomposition process, introduce a decomposition liquid predetermined by the user into the container 50 to decompose the impurities, and then, based on the user's input to the input device 505, execute a refresh process in which new decomposition liquid is introduced into the container 50 to re-decompose the impurities.
  • FIG. 4 is a flowchart of the decomposition process executed by the control device 500 of the processing device 1 according to the embodiment. Each step shown in FIG. 4 is realized by the arithmetic device 501 of the control device 500 executing the OS 513 and the control program 511.
  • control device 500 controls the pump 31 and solenoid valve 41 on the inlet side to introduce the decomposition liquid in the decomposition liquid reservoir 210 into the container 50 via the pipes 11-13 and the port 61 (S21).
  • the decomposition liquid introduced in S21 corresponds to one example of the "first processing liquid" in this disclosure.
  • the control device 500 introduces the amount of decomposition liquid preset by the user into the container 50 by controlling the output amount of the pump 31.
  • the decomposition of impurities using the decomposition liquid needs to be carried out inside the processing section 51 in which the strainer 300 is provided so that the strainer 300 can capture microplastics.
  • the amount of decomposition liquid introduced in S21 is set to be equal to or less than the capacity of the processing section 51, for example, 150 ml or less.
  • control device 500 may introduce an amount of decomposition liquid preset by the user into the container 50 in multiple batches at predetermined intervals preset by the user.
  • the control device 500 may introduce 150 ml of decomposition liquid into the container 50 in 30 ml increments at one-hour intervals over a period of five hours. This allows the processing device 1 to suppress excessive decomposition reactions that may occur when the decomposition liquid is introduced into the container 50 all at once.
  • the control device 500 controls the stirrer 71 to rotate the stirrer 72 provided in the container 50 while applying a constant heat to the container 50, thereby stirring the sample (S22).
  • the temperature inside the container 50, the rotation speed of the stirrer 72, and the rotation time are preset by the user. In this way, the control device 500 can promote the decomposition of organic impurities using the decomposition liquid by stirring the sample while applying heat. Note that while heating is not necessarily required when stirring the sample, the decomposition of organic impurities is promoted by maintaining a constant sample temperature through heating.
  • the control device 500 determines whether or not a stop input based on the user's operation of the input device 505 has been received (S23). If the control device 500 has not received a stop input from the user (NO in S23), it determines whether or not the decomposition processing period has elapsed (S29).
  • the decomposition processing period is preset by the user, for example, three days.
  • control device 500 ends the decomposition processing and proceeds to processing S3 in FIG. 3. On the other hand, if the decomposition processing period has not elapsed (NO in S29), the control device 500 returns to processing S23.
  • control device 500 If the control device 500 receives a stop input from the user (YES in S23), it pauses the decomposition process by stopping the operation of the stirrer 71 and the stirring bar 72 (S24).
  • the control device 500 determines whether or not a refresh input based on the user's operation of the input device 505 has been received while the decomposition process is paused (S25).
  • control device 500 determines whether or not a resume input based on the user's operation of the input device 505 has been received (S30).
  • control device 500 If the control device 500 receives a restart input from the user (YES in S30), it controls the stirrer 71 and the stirring bar 72 to apply a constant amount of heat to the container 50 while rotating the stirring bar 72 installed inside the container 50 again to stir the sample and restart the decomposition process (S31). The control device 500 then proceeds to the process of S29. On the other hand, if the control device 500 does not receive a restart input from the user (NO in S30), it returns to the process of S23.
  • control device 500 When the control device 500 receives a refresh input from the user (YES in S25), it executes the refresh process. Specifically, the control device 500 controls the discharge pump 33 and solenoid valve 43 to discharge the waste liquid in the container 50 generated by the decomposition process of the organic impurities into the waste liquid reservoir 250 via the pipes 20-23 and ports 63, 64 (S26).
  • the target substance, microplastics is captured by the strainer 300 installed inside the container 50 and is retained in the container 50.
  • control device 500 stops the discharge pump 33 while controlling the inlet pump 31 and solenoid valve 41 to introduce the decomposition liquid in the decomposition liquid reservoir 210 back into the container 50 via the pipes 11-13 and port 61 (S27).
  • the decomposition liquid introduced in S27 corresponds to one example of the "second processing liquid" in this disclosure.
  • the control device 500 controls the discharge rate of the pump 31 to reintroduce the amount of decomposition liquid preset by the user into the container 50.
  • the amount of decomposition liquid introduced in S27 is equal to or less than the amount of decomposition liquid introduced in S21.
  • the concentration of the decomposition liquid introduced into the container 50 in S27 may be equal to or less than the concentration of the decomposition liquid introduced into the container 50 in S21. This allows the processing device 1 to prevent the impurities treated with the decomposition liquid introduced in S21 from being excessively decomposed by the decomposition liquid introduced in S27 of the refresh process, which would result in damage to microplastics.
  • control device 500 may introduce an amount of decomposition liquid preset by the user into the container 50 in multiple batches at predetermined intervals preset by the user, similar to the process of S21.
  • the control device 500 may introduce 150 ml of decomposition liquid into the container 50 in 30 ml increments at one-hour intervals over a period of five hours. This allows the processing device 1 to suppress excessive decomposition reactions that may occur when the decomposition liquid is introduced into the container 50 all at once, even in the refresh process.
  • control device 500 controls the stirrer 71 to rotate the stirring bar 72 provided in the container 50 while applying a constant amount of heat to the container 50, thereby stirring the sample (S28). The control device 500 then proceeds to the process of S29.
  • the processing device 1 introduces the decomposition liquid in S21 to decompose the impurities contained in the sample, then temporarily stops the decomposition of the impurities based on a stop input from the user, and then executes a refresh process in S26-S28 to reintroduce the decomposition liquid into the container 50 and re-decompose the impurities based on a refresh input from the user.
  • the processing device 1 can execute such a refresh process multiple times until it determines in S29 that the decomposition process period has elapsed.
  • the user can check the status of the decomposition process of the impurities being performed inside the container 50 from the outside, and if it is determined that the decomposition of the impurities is not proceeding properly, the user can perform the refresh process to replace the decomposition liquid used in the decomposition process with new decomposition liquid, thereby performing the decomposition process of the impurities again.
  • This allows the user to suppress excessive decomposition reactions caused by the decomposition liquid initially introduced in S21, and to sufficiently decompose the impurities with the new decomposition liquid introduced in S27 of the refresh process. Therefore, the user can appropriately decompose the impurities according to the progress of the decomposition process of the impurities, without extending the time of the decomposition process longer than usual or increasing the amount of decomposition liquid initially introduced.
  • a processing apparatus includes a container for storing a sample, a control device for extracting a target substance from the sample stored in the container, and an input device for receiving input from a user.
  • the control device introduces a first processing liquid for processing impurities contained in the sample into the container storing the sample, and after introducing the first processing liquid, executes a refresh process for introducing a second processing liquid into the container for processing the impurities contained in the sample again based on the input to the input device.
  • the second processing liquid introduced into the container based on the user's input can be used to reprocess the impurities contained in the sample, making it possible to appropriately process the impurities contained in the sample and recover the target substance.
  • control device discharges waste liquid generated by processing impurities using the first processing liquid during the refresh process, and then introduces the second processing liquid into the container.
  • the processing device described in paragraph 2 can replace the first processing liquid used to process the impurities in the refresh process with a new second processing liquid, allowing the impurities to be processed again using the new second processing liquid.
  • control device can execute the refresh process multiple times.
  • the user can execute the refresh process multiple times until the impurities can be sufficiently processed.
  • control device introduces the first treatment liquid into the container in multiple batches.
  • the treatment device described in paragraph 4 can suppress excessive treatment reactions that may occur when the first treatment liquid is poured into the container all at once.
  • control device introduces the second treatment liquid into the container in multiple batches.
  • the processing device described in paragraph 5 can also suppress excessive processing reactions that may occur during the refresh process by pouring the second processing liquid into the container all at once.
  • the amount of the second treatment liquid introduced into the container is equal to or less than the amount of the first treatment liquid introduced into the container.
  • the processing device described in paragraph 6 can prevent the impurities that have been initially treated with the first processing liquid from being excessively treated with the second processing liquid introduced during the refresh process.
  • the concentration of the second treatment liquid introduced into the container is equal to or lower than the concentration of the first treatment liquid introduced into the container.
  • the treatment device described in paragraph 7 can prevent the impurities treated with the first treatment liquid introduced initially from being excessively treated with the second treatment liquid introduced during the refresh process.
  • the container has a transmittance that allows the processing status of impurities contained in the sample contained in the container to be visually observed from the outside.
  • the user after the user introduces the first processing liquid to process the impurities, the user can check the status of the impurity processing being carried out inside the container from the outside, and can perform a refresh process according to the impurity processing status.
  • the target substance is microplastics.
  • the processing device described in paragraph 9 can properly process impurities contained in a sample and recover microplastics.
  • a processing method includes the steps of: introducing a first processing liquid into a container that holds the sample, the first processing liquid being used to process impurities contained in the sample; and, after the first processing liquid has been introduced, executing a refresh process based on a user's input to introduce a second processing liquid into the container to reprocess the impurities contained in the sample.
  • the second processing liquid introduced into the container based on user input can be used to process the impurities contained in the sample again, making it possible to appropriately process the impurities contained in the sample and recover the target substance.
  • a control program causes a computer to execute a step of introducing a first processing liquid into a container that holds the sample, for processing impurities contained in the sample, and a step of executing a refresh process that introduces a second processing liquid into the container, for processing impurities contained in the sample again, based on a user's input, after the introduction of the first processing liquid.
  • the second processing liquid introduced into the container based on user input can be used to re-treat the impurities contained in the sample, making it possible to appropriately treat the impurities contained in the sample and recover the target substance.
  • 1 Processing device 10 Purifier, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23 Piping, 31, 32, 33 Pump, 41, 42, 43 Solenoid valve, 50 Container, 51 Processing device, 52 Overflow device, 55 Discharge port, 61, 62, 63, 64 Port, 71 Stirrer, 72 Stirring bar, 80 Discharge pipe, 110 Filtration device, 210 Minutes Solution reservoir, 220 heavy liquid reservoir, 230 rinse liquid reservoir, 240, 250, 260 waste liquid reservoir, 300 strainer, 500 control device, 501 calculation device, 502 memory, 503 communication device, 504 display device, 505 input device, 506 data reading device, 507 recording medium, 510 storage, 511 control program, 512 control data.

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Abstract

A processing device (1) comprises: a container (50) that accommodates a specimen; a control device (500) that extracts a target substance from the specimen accommodated in the container; and an input device (505) that receives input from a user. The control device performs a refresh process in which a first processing liquid for processing a contaminant included in the specimen is introduced into the container in which the specimen is accommodated, and after the first processing liquid has been introduced, on the basis of an input to the input device, a second processing liquid for re-processing the contaminant included in the specimen is introduced into the container.

Description

処理装置、処理方法、および制御プログラムProcessing device, processing method, and control program
 本開示は、試料を処理して対象物質を回収するための処理装置、試料を処理して対象物質を回収するための処理方法、および試料を処理して対象物質を回収するための制御プログラムに関する。 The present disclosure relates to a processing device for processing a sample to recover a target substance, a processing method for processing a sample to recover a target substance, and a control program for processing a sample to recover a target substance.
 従来、試料を処理することによって回収対象である対象物質を回収することが可能な処理装置が公知である。たとえば、特許文献1は、試料が収容された容器に分解液を導入することによって試料に含まれる夾雑物を分解し、夾雑物が分解された後の容器に重液を導入することによって重液よりも比重の軽い対象物質を回収する精製装置を開示する。  Traditionally, there are known processing devices capable of recovering a target substance by processing a sample. For example, Patent Document 1 discloses a purification device that introduces a decomposition liquid into a container that holds the sample to decompose impurities contained in the sample, and then introduces a heavy liquid into the container after the impurities have been decomposed to recover a target substance that has a lighter specific gravity than the heavy liquid.
国際公開第2022/003995号International Publication No. 2022/003995
 特許文献1に開示された精製装置は、分解液を用いて試料に含まれる夾雑物を分解するように構成されており、分解液の導入量は、投入できる試料の量に応じて予め設定されている。投入できる試料の量は精製装置の容器の寸法から一定の制限を設定することができるが、分解の対象となる試料に含まれる夾雑物の量によっては、夾雑物が十分に分解されない。夾雑物が十分に分解されないと、精製の精度が低下し、その後の分析工程に影響を及ぼし得る。これを防ぐため、分解液の導入量を通常よりも多くすることも考えられるが、精製装置の容器の寸法から許容導入量が決まっている。この許容導入量を超過してしまうと、分解によって発生する泡などが想定外の箇所に付着し、精製精度が低下するおそれがある。また、過剰な分解液を導入した結果、分解液を無駄に消費してしまうおそれもある。さらに、長時間に亘って分解処理を実行したり、過剰な量の分解液を用いて分解処理を実行したりした場合、回収対象である対象物質の物性によっては当該対象物質に損傷を与えてしまうおそれもあり、対象物質の分析結果に意図せぬ影響を与えてしまう可能性がある。このため、試料を精製する精製装置においては、夾雑物に対して分解などの処理を適切に行う技術が求められている。 The refining device disclosed in Patent Document 1 is configured to decompose impurities contained in a sample using a decomposition liquid, and the amount of decomposition liquid introduced is preset according to the amount of sample that can be introduced. Although a certain limit can be set for the amount of sample that can be introduced based on the dimensions of the refining device's container, depending on the amount of impurities contained in the sample to be decomposed, the impurities may not be sufficiently decomposed. If the impurities are not sufficiently decomposed, the accuracy of the purification may decrease and may affect the subsequent analysis process. To prevent this, it is possible to introduce a larger amount of decomposition liquid than usual, but the allowable introduction amount is determined based on the dimensions of the refining device's container. If this allowable introduction amount is exceeded, bubbles generated by the decomposition may adhere to unexpected places, and the accuracy of the purification may decrease. In addition, as a result of introducing an excessive amount of decomposition liquid, the decomposition liquid may be wasted. Furthermore, if the decomposition process is performed for a long time or an excessive amount of decomposition liquid is used, depending on the physical properties of the target substance to be recovered, the target substance may be damaged, which may have an unintended effect on the analysis results of the target substance. For this reason, there is a demand for technology that can appropriately treat impurities, such as by decomposing them, in purification devices that purify samples.
 本開示は、上記のような課題を解決するためになされたものであって、その目的は、試料に含まれる夾雑物を適切に処理する技術を提供することである。 The present disclosure has been made to solve the problems described above, and its purpose is to provide a technique for appropriately processing impurities contained in a sample.
 本開示のある局面に従う処理装置は、試料を収容する容器と、容器に収容された試料から対象物質を抽出する制御装置と、ユーザからの入力を受け付ける入力装置とを備える。制御装置は、試料が収容された容器に、試料に含まれる夾雑物を処理するための第1の処理液を導入し、第1の処理液を導入した後、入力装置への入力に基づいて、容器に試料に含まれる夾雑物を再度処理するための第2の処理液を導入するリフレッシュ処理を実行する。 A processing device according to an aspect of the present disclosure includes a container for storing a sample, a control device for extracting a target substance from the sample stored in the container, and an input device for receiving input from a user. The control device introduces a first processing liquid for treating impurities contained in the sample into the container storing the sample, and after introducing the first processing liquid, executes a refresh process for introducing a second processing liquid into the container for re-treating the impurities contained in the sample based on the input to the input device.
 本開示の他の局面に従う処理方法は、試料が収容された容器に、試料に含まれる夾雑物を処理するための第1の処理液を導入するステップと、第1の処理液を導入した後、ユーザによる入力に基づいて、容器に試料に含まれる夾雑物を再度処理するための第2の処理液を導入するリフレッシュ処理を実行するステップとを含む。 A processing method according to another aspect of the present disclosure includes the steps of: introducing a first processing liquid into a container containing the sample for processing impurities contained in the sample; and, after the introduction of the first processing liquid, performing a refresh process based on a user's input, in which a second processing liquid is introduced into the container for processing again the impurities contained in the sample.
 本開示の他の局面に従う制御プログラムは、コンピュータに、試料が収容された容器に、試料に含まれる夾雑物を処理するための第1の処理液を導入するステップと、第1の処理液を導入した後、ユーザによる入力に基づいて、容器に試料に含まれる夾雑物を再度処理するための第2の処理液を導入するリフレッシュ処理を実行するステップとを実行させる。 A control program according to another aspect of the present disclosure causes a computer to execute a step of introducing a first processing liquid into a container containing the sample for processing impurities contained in the sample, and a step of executing a refresh process, which introduces a second processing liquid into the container for processing impurities contained in the sample again based on a user's input after the introduction of the first processing liquid.
 本開示によれば、容器に導入された第1の処理液を用いて試料に含まれる夾雑物を十分に処理できない場合でも、ユーザによる入力に基づいて容器に導入された第2の処理液を用いて試料に含まれる夾雑物を再度処理することができるため、試料に含まれる夾雑物を適切に処理することができる。 According to the present disclosure, even if the first processing liquid introduced into the container cannot sufficiently process the impurities contained in the sample, the impurities contained in the sample can be processed again using a second processing liquid introduced into the container based on user input, so that the impurities contained in the sample can be properly processed.
実施の形態に係る処理装置を模式的に示す図である。FIG. 1 is a diagram illustrating a processing apparatus according to an embodiment. 実施の形態に係る処理装置のハードウェア構成を説明するための図である。FIG. 2 is a diagram for explaining a hardware configuration of a processing device according to an embodiment. 実施の形態に係る処理装置の制御装置が実行する精製処理のフローチャートである。4 is a flowchart of a refining process executed by a control device of the processing apparatus according to the embodiment. 実施の形態に係る処理装置の制御装置が実行する分解処理のフローチャートである。11 is a flowchart of a decomposition process executed by a control device of the processing device according to the embodiment.
 以下、本開示の実施の形態について、図面を参照しながら詳細に説明する。なお、図中同一または相当部分には同一符号を付してその説明は繰り返さない。 Below, the embodiments of the present disclosure will be described in detail with reference to the drawings. Note that the same or corresponding parts in the drawings will be given the same reference numerals and their description will not be repeated.
 [処理装置の構成]
 図1を参照しながら、実施の形態に係る処理装置1の主な構成を説明する。図1は、実施の形態に係る処理装置1を模式的に示す図である。図1に示すように、処理装置1は、混合試料を精製するための精製器10と、精製器10を制御する制御装置500とを備える。処理装置1は、制御装置500によって精製器10を制御することによって、混合試料を処理する。具体的には、処理装置1は、制御装置500によって精製器10を制御することによって、混合試料を精製し、混合試料に含まれる回収対象である対象物質を回収する。「精製」とは、分解液および重液などを用いて混合物から対象物質を取り出すことを含む。
[Configuration of Processing Device]
A main configuration of a processing device 1 according to an embodiment will be described with reference to FIG. 1. FIG. 1 is a diagram showing a schematic diagram of the processing device 1 according to an embodiment. As shown in FIG. 1, the processing device 1 includes a purifier 10 for purifying a mixed sample, and a control device 500 for controlling the purifier 10. The processing device 1 processes the mixed sample by controlling the purifier 10 by the control device 500. Specifically, the processing device 1 purifies the mixed sample by controlling the purifier 10 by the control device 500, and recovers a target substance contained in the mixed sample that is a recovery target. "Purification" includes extracting a target substance from a mixture using a decomposition liquid, a heavy liquid, or the like.
 処理装置1によって精製される「混合試料」は、対象物質を含むものであればどのような形態であってもよい。たとえば、「混合試料」としては、海中または海岸から収集される海水および砂、食品または化粧品などの加工品が挙げられる。実施の形態においては、「混合試料」として、海中または海岸から収集される海水および砂が例示される。なお、以下では、「混合試料」を単に「試料」とも称する。 The "mixed sample" refined by the processing device 1 may be in any form as long as it contains the target substance. For example, examples of the "mixed sample" include seawater and sand collected from the ocean or the coast, and processed products such as food or cosmetics. In the embodiment, an example of the "mixed sample" is seawater and sand collected from the ocean or the coast. In the following, the "mixed sample" will also be referred to simply as the "sample".
 処理装置1の回収対象である「対象物質」は、処理装置1によって回収される成分であればどのような形態であってもよい。たとえば、「対象物質」としては、5mm以下の大きさを有する微細なプラスチック粒子であるマイクロプラスチックが挙げられる。実施の形態においては、「対象物質」として、海中または海岸から収集される海水および砂に含まれるマイクロプラスチックが例示される。 The "target substance" to be collected by the processing device 1 may be in any form as long as it is a component that can be collected by the processing device 1. For example, the "target substance" may be microplastics, which are minute plastic particles with a size of 5 mm or less. In the embodiment, the "target substance" may be, for example, microplastics contained in seawater and sand collected from the ocean or coast.
 精製器10は、試料を収容する容器50と、配管11~22と、ポンプ31~33と、電磁弁41~43と、ポート61~64と、スターラ71と、撹拌子72と、排出管80とを備える。 The purifier 10 includes a container 50 for holding the sample, pipes 11-22, pumps 31-33, solenoid valves 41-43, ports 61-64, a stirrer 71, a stirring bar 72, and an exhaust pipe 80.
 容器50は、試料を処理するための処理部51と処理部51の上方に位置するオーバーフロー部52とを含み、処理部51とオーバーフロー部52とに分離可能である。処理部51の下部には、ポート61~64が接続されている。ユーザは、処理部51からオーバーフロー部52を取り外すことによって容器50を開放し、容器50における処理部51内に試料を導入する。実施の形態においては、処理部51が円形の底面を有する円柱状で構成されているが、処理部51の底面は、円形に限らず、多角形または楕円など、その他の形状を有していてもよい。 The container 50 includes a processing section 51 for processing the sample and an overflow section 52 located above the processing section 51, and can be separated into the processing section 51 and the overflow section 52. Ports 61 to 64 are connected to the lower part of the processing section 51. The user opens the container 50 by removing the overflow section 52 from the processing section 51, and introduces a sample into the processing section 51 in the container 50. In the embodiment, the processing section 51 is configured as a cylinder with a circular bottom surface, but the bottom surface of the processing section 51 is not limited to a circle, and may have other shapes such as a polygon or an ellipse.
 容器50に収容される試料には、夾雑部が含まれており、容器50内において分解液などの処理液を用いて夾雑物が処理される。「夾雑物」は、試料のうち、対象物質以外の異物である。実施形態においては、「夾雑物」として、有機物の性質を有する有機夾雑物が例示される。 The sample contained in the container 50 contains impurities, which are processed in the container 50 using a processing liquid such as a decomposition liquid. "Impurities" are foreign matter in the sample other than the target substance. In the embodiment, an example of "impurities" is organic impurities that have the properties of organic matter.
 容器50は、容器50に収容された試料に含まれる夾雑物の分解処理の状況を外部から視認可能な透過率を有する。たとえば、容器50の処理部51およびオーバーフロー部52は、ユーザが外部から容器50の内部を視認可能なように透明な材料(たとえば、ガラス)で形成されている。このため、ユーザは、容器50内で行われる分解液を用いた夾雑物の分解処理の状況を外部から確認することができる。 The container 50 has a transmittance that allows the status of the decomposition process of impurities contained in the sample stored in the container 50 to be visible from the outside. For example, the processing section 51 and overflow section 52 of the container 50 are formed of a transparent material (e.g., glass) so that the user can view the inside of the container 50 from the outside. Therefore, the user can check from the outside the status of the decomposition process of impurities using the decomposition liquid that is being performed inside the container 50.
 配管11は、分解液リザーバ210と電磁弁41とを接続する。配管12は、電磁弁41とポンプ31とを接続する。配管13は、ポンプ31と容器50の外周部分に設けられたポート61とを接続する。このように、分解液リザーバ210と容器50のポート61とは、電磁弁41およびポンプ31を介して、配管11,12,13によって接続されている。 Pipe 11 connects the decomposition liquid reservoir 210 and the solenoid valve 41. Pipe 12 connects the solenoid valve 41 and the pump 31. Pipe 13 connects the pump 31 and a port 61 provided on the outer periphery of the container 50. In this way, the decomposition liquid reservoir 210 and the port 61 of the container 50 are connected by pipes 11, 12, and 13 via the solenoid valve 41 and the pump 31.
 配管14は、重液リザーバ220と電磁弁42とを接続する。配管15は、電磁弁42とポンプ32とを接続する。配管16は、ポンプ32と容器50の外周部分に設けられたポート62とを接続する。このように、重液リザーバ220と容器50のポート62とは、電磁弁42およびポンプ32を介して、配管14,15,16によって接続されている。 Pipe 14 connects the heavy liquid reservoir 220 to the solenoid valve 42. Pipe 15 connects the solenoid valve 42 to the pump 32. Pipe 16 connects the pump 32 to a port 62 provided on the outer periphery of the container 50. In this way, the heavy liquid reservoir 220 and the port 62 of the container 50 are connected by pipes 14, 15, and 16 via the solenoid valve 42 and the pump 32.
 配管17は、リンス液リザーバ230と電磁弁41とを接続する。すなわち、電磁弁41は、配管11によって分解液リザーバ210に接続されている一方で、配管14によってリンス液リザーバ230にも接続されている。このように、リンス液リザーバ230と容器50のポート61とは、電磁弁41およびポンプ31を介して、配管17,12,13によって接続されている。 Pipe 17 connects the rinse liquid reservoir 230 and the solenoid valve 41. That is, the solenoid valve 41 is connected to the decomposition liquid reservoir 210 by pipe 11, and is also connected to the rinse liquid reservoir 230 by pipe 14. In this way, the rinse liquid reservoir 230 and the port 61 of the container 50 are connected by pipes 17, 12, and 13 via the solenoid valve 41 and the pump 31.
 配管18は、リンス液リザーバ230と電磁弁42とを接続する。すなわち、電磁弁42は、配管14によって重液リザーバ220に接続されている一方で、配管18によってリンス液リザーバ230にも接続されている。このように、リンス液リザーバ230と容器50のポート62とは、電磁弁42およびポンプ32を介して、配管18,15,16によって接続されている。 The pipe 18 connects the rinse liquid reservoir 230 and the solenoid valve 42. That is, the solenoid valve 42 is connected to the heavy liquid reservoir 220 by the pipe 14, and is also connected to the rinse liquid reservoir 230 by the pipe 18. In this way, the rinse liquid reservoir 230 and the port 62 of the container 50 are connected by the pipes 18, 15, and 16 via the solenoid valve 42 and the pump 32.
 配管19は、廃液リザーバ240と電磁弁43とを接続する。配管20は、電磁弁43とポンプ33とを接続する。配管21は、ポンプ33と容器50の外周部分に設けられたポート63とを接続する。このように、廃液リザーバ240と容器50のポート63とは、電磁弁43およびポンプ33を介して、配管19,20,21によって接続されている。 Pipe 19 connects the waste liquid reservoir 240 and the solenoid valve 43. Pipe 20 connects the solenoid valve 43 and the pump 33. Pipe 21 connects the pump 33 and a port 63 provided on the outer periphery of the container 50. In this way, the waste liquid reservoir 240 and the port 63 of the container 50 are connected by pipes 19, 20, and 21 via the solenoid valve 43 and the pump 33.
 配管22は、ポンプ33と容器50の外周部分に設けられたポート64とを接続する。すなわち、ポンプ33は、配管21によって容器50のポート63に接続されている一方で、配管22によって容器50のポート64にも接続されている。このように、廃液リザーバ240と容器50のポート64とは、電磁弁43およびポンプ33を介して、配管19,20,22によって接続されている。 Pipe 22 connects pump 33 to port 64 provided on the outer periphery of container 50. That is, pump 33 is connected to port 63 of container 50 by pipe 21, and is also connected to port 64 of container 50 by pipe 22. In this way, waste liquid reservoir 240 and port 64 of container 50 are connected by pipes 19, 20, and 22 via solenoid valve 43 and pump 33.
 配管23は、廃液リザーバ250と電磁弁43とを接続する。すなわち、電磁弁43は、配管19によって廃液リザーバ240に接続されている一方で、配管23によって廃液リザーバ250にも接続されている。このように、廃液リザーバ250と容器50のポート63とは、電磁弁43およびポンプ33を介して、配管23,20,21によって接続されている。また、廃液リザーバ250と容器50のポート64とは、電磁弁43およびポンプ33を介して、配管23,20,22によって接続されている。 Pipe 23 connects the waste liquid reservoir 250 and the solenoid valve 43. That is, the solenoid valve 43 is connected to the waste liquid reservoir 240 by pipe 19, and is also connected to the waste liquid reservoir 250 by pipe 23. In this way, the waste liquid reservoir 250 and the port 63 of the container 50 are connected by pipes 23, 20, and 21 via the solenoid valve 43 and the pump 33. In addition, the waste liquid reservoir 250 and the port 64 of the container 50 are connected by pipes 23, 20, and 22 via the solenoid valve 43 and the pump 33.
 分解液リザーバ210は、夾雑物を処理するための処理液を貯留する。「処理液」は、有機夾雑物を処理するものであればどのような形態であってもよい。実施の形態においては、「処理液」として、有機夾雑物を分解するための分解液が例示される。「分解液」は、たとえば、過酸化水素水(H2O2)、過酸化水素水(H2O2)と酸化鉄(II)(FeO)との混合物などの酸化剤である。「試料」が海水および砂である場合、「有機夾雑物」は、たとえば、海水または砂に混じった木くずおよびプランクトンなどである。 The decomposition liquid reservoir 210 stores a processing liquid for treating impurities. The "processing liquid" may be in any form as long as it treats organic impurities. In the embodiment, the "processing liquid" is exemplified by a decomposition liquid for decomposing organic impurities. The "decomposition liquid" is, for example, an oxidizing agent such as hydrogen peroxide (H2O2) or a mixture of hydrogen peroxide (H2O2) and iron (II) oxide (FeO). When the "sample" is seawater and sand, the "organic impurities" are, for example, wood chips and plankton mixed in the seawater or sand.
 重液リザーバ220は、比重差により試料を分離させるための重液を貯留する。「重液」は、比重差により試料を分離させるものであればどのような形態であってもよい。実施形態においては、「重液」は、無機物の性質を有する無機夾雑物を比重差で沈降させる。「重液」は、たとえば、塩化ナトリウム(NaCl)、ヨウ化ナトリウム(NaI)、塩化亜鉛(ZnCl2)などである。「試料」が海水および砂である場合、「無機夾雑物」は、砂、ガラス、または石などである。「重液」の比重は、処理装置1の回収対象となる「対象物質」の比重よりも大きく、かつ、「無機夾雑物」の比重よりも小さく設定されている。たとえば、処理装置1の回収対象となる「対象物質」がマイクロプラスチックであり、「無機夾雑物」が砂、ガラス、または石などの場合、「重液」の比重は、マイクロプラスチックの比重よりも大きく、かつ、砂、ガラス、および石などの比重よりも小さく設定される。具体的には、「重液」の比重は、約1.5~約1.7に設定されている。 The heavy liquid reservoir 220 stores a heavy liquid for separating samples by difference in specific gravity. The "heavy liquid" may be in any form as long as it separates samples by difference in specific gravity. In the embodiment, the "heavy liquid" causes inorganic impurities having inorganic properties to settle by difference in specific gravity. The "heavy liquid" is, for example, sodium chloride (NaCl), sodium iodide (NaI), zinc chloride (ZnCl2), etc. When the "sample" is seawater and sand, the "inorganic impurities" are sand, glass, stones, etc. The specific gravity of the "heavy liquid" is set to be greater than the specific gravity of the "target substance" to be recovered by the processing device 1 and less than the specific gravity of the "inorganic impurities". For example, when the "target substance" to be recovered by the processing device 1 is microplastics and the "inorganic impurities" are sand, glass, stones, etc., the specific gravity of the "heavy liquid" is set to be greater than the specific gravity of microplastics and less than the specific gravity of sand, glass, stones, etc. Specifically, the specific gravity of the "heavy liquid" is set to approximately 1.5 to 1.7.
 リンス液リザーバ230は、容器50内を洗浄するための洗浄液であるリンス液を貯留する。「リンス液」は、容器50内を洗浄するためのものであればどのような形態であってもよい。「リンス液」は、たとえば、水などである。なお、「リンス液」は、容器50内を洗浄する役割の他、容器50に導入される分解液を薄める役割を有する。 The rinse liquid reservoir 230 stores rinse liquid, which is a cleaning liquid for cleaning the inside of the container 50. The "rinse liquid" may be in any form as long as it is used to clean the inside of the container 50. The "rinse liquid" is, for example, water. In addition to cleaning the inside of the container 50, the "rinse liquid" also has the role of diluting the decomposition liquid introduced into the container 50.
 廃液リザーバ240,250は、容器50から排出された重液、分解液、リンス液、および試料に含まれる海水などの廃液を貯留する。 The waste liquid reservoirs 240, 250 store waste liquids such as heavy liquid, decomposition liquid, rinse liquid, and seawater contained in the sample discharged from the container 50.
 ポンプ31は、制御装置500の制御に従って、分解液リザーバ210の分解液またはリンス液リザーバ230のリンス液を、ポート61を介して容器50に導入する。たとえば、ポンプ31は、制御装置500の制御に従って、吸入側の圧力を下げるとともに吐出側の圧力を上げることによって、配管12を介して分解液またはリンス液を吸い込むとともに、配管13を介して分解液またはリンス液をポート61へ吐出する。制御装置500は、ポンプ31を制御することによって、ポンプ31の送出量(吸入量,排出量)を調整することができる。 The pump 31 introduces the decomposition liquid from the decomposition liquid reservoir 210 or the rinsing liquid from the rinsing liquid reservoir 230 into the container 50 via the port 61 under the control of the control device 500. For example, under the control of the control device 500, the pump 31 lowers the pressure on the suction side and raises the pressure on the discharge side to suck in the decomposition liquid or rinsing liquid via the pipe 12 and discharge the decomposition liquid or rinsing liquid to the port 61 via the pipe 13. The control device 500 can adjust the output amount (suction amount, discharge amount) of the pump 31 by controlling the pump 31.
 ポンプ32は、制御装置500の制御に従って、重液リザーバ220の重液またはリンス液リザーバ230のリンス液を、ポート62を介して容器50に導入する。たとえば、ポンプ32は、制御装置500の制御に従って、吸入側の圧力を下げるとともに吐出側の圧力を上げることによって、配管15を介して重液またはリンス液を吸い込むとともに、配管16を介して重液またはリンス液をポート62へ吐出する。制御装置500は、ポンプ32を制御することによって、ポンプ32の送出量(吸入量,排出量)を調整することができる。 The pump 32 introduces the heavy liquid from the heavy liquid reservoir 220 or the rinsing liquid from the rinsing liquid reservoir 230 into the container 50 via the port 62 under the control of the control device 500. For example, under the control of the control device 500, the pump 32 lowers the pressure on the suction side and raises the pressure on the discharge side to suck in the heavy liquid or rinsing liquid via the pipe 15 and discharge the heavy liquid or rinsing liquid to the port 62 via the pipe 16. The control device 500 can adjust the amount of the pump 32 delivered (the amount of suction, the amount of discharge).
 ポンプ33は、制御装置500の制御に従って、ポート63またはポート64を介して、容器50内の不要な液体を廃液として、廃液リザーバ240または廃液リザーバ250へ排出する。たとえば、ポンプ33は、制御装置500の制御に従って、吸入側の圧力を下げるとともに吐出側の圧力を上げることによって、配管21,22を介して容器50内の廃液を吸い込むとともに、配管20を介して廃液を廃液リザーバ240,250へ吐出する。制御装置500は、ポンプ33を制御することによって、ポンプ33の送出量(吸入量,排出量)を調整することができる。 Pump 33, under the control of control device 500, discharges unnecessary liquid in container 50 as waste liquid to waste liquid reservoir 240 or waste liquid reservoir 250 via port 63 or port 64. For example, under the control of control device 500, pump 33 lowers the pressure on the suction side and raises the pressure on the discharge side to suck in waste liquid from container 50 via pipes 21 and 22 and discharge the waste liquid to waste liquid reservoirs 240 and 250 via pipe 20. Control device 500 can adjust the amount of pump 33 delivered (suction amount, discharge amount) by controlling pump 33.
 電磁弁41は、制御装置500の制御に従って、容器50のポート61に接続される経路を、分解液リザーバ210とリンス液リザーバ230との間で切り替える。 The solenoid valve 41 switches the path connected to the port 61 of the container 50 between the decomposition liquid reservoir 210 and the rinsing liquid reservoir 230 under the control of the control device 500.
 電磁弁42は、制御装置500の制御に従って、容器50のポート62に接続される経路を、重液リザーバ220とリンス液リザーバ230との間で切り替える。 The solenoid valve 42 switches the path connected to the port 62 of the container 50 between the heavy liquid reservoir 220 and the rinse liquid reservoir 230 under the control of the control device 500.
 電磁弁43は、制御装置500の制御に従って、容器50のポート63,64に接続される経路を、廃液リザーバ240と廃液リザーバ250との間で切り替える。たとえば、重液を含む廃液は廃液リザーバ240に排出され、分解液を含む廃液は廃液リザーバ250に排出される。 The solenoid valve 43 switches the paths connected to the ports 63, 64 of the container 50 between the waste liquid reservoir 240 and the waste liquid reservoir 250 under the control of the control device 500. For example, the waste liquid containing the heavy liquid is discharged to the waste liquid reservoir 240, and the waste liquid containing the decomposition liquid is discharged to the waste liquid reservoir 250.
 ポート61は、ポンプ31によって送出された分解液リザーバ210からの分解液またはリンス液リザーバ230からのリンス液を容器50内に導入する。ポート62は、ポンプ32によって送出された重液リザーバ220からの重液またはリンス液リザーバ230からのリンス液を容器50内に導入する。ポート63,64は、ポンプ33の駆動によって、容器50内の廃液をポンプ33に排出する。ポンプ33によって送出された廃液は、廃液リザーバ240または廃液リザーバ250に排出される。 Port 61 introduces into container 50 the decomposition liquid from decomposition liquid reservoir 210 or the rinse liquid from rinse liquid reservoir 230, which is delivered by pump 31. Port 62 introduces into container 50 the heavy liquid from heavy liquid reservoir 220 or the rinse liquid from rinse liquid reservoir 230, which is delivered by pump 32. Ports 63 and 64 discharge the waste liquid in container 50 to pump 33 when pump 33 is driven. The waste liquid delivered by pump 33 is discharged into waste liquid reservoir 240 or waste liquid reservoir 250.
 精製器10は、試料に含まれる対象物質を補足して容器50内に保持するストレーナ300をさらに備える。ストレーナ300は、2分割可能な容器50の下側に位置する処理部51の内部に設けられる。また、ストレーナ300は、概略的には籠形状を有しており、対象物質であるマイクロプラスチックを捕捉可能な大きさの網目を有する。たとえば、ストレーナ300は、SUS(Steel Use Stainless)製であり、対象物質であるマイクロプラスチックを捕捉可能なサイズの複数の開口が形成されている。対象物質がマイクロプラスチックである場合、ストレーナ300の網目の大きさは、0.1mm~5.0mmの粒子を通過さない大きさが必要であり、約0.1mmが好ましい。 The purifier 10 further includes a strainer 300 that captures the target substance contained in the sample and holds it in the container 50. The strainer 300 is provided inside the processing section 51 located below the container 50, which can be separated into two. The strainer 300 is roughly basket-shaped and has meshes large enough to capture the target substance, microplastics. For example, the strainer 300 is made of SUS (Steel Use Stainless), and has multiple openings formed therein that are large enough to capture the target substance, microplastics. When the target substance is microplastics, the mesh size of the strainer 300 needs to be large enough to prevent particles of 0.1 mm to 5.0 mm from passing through, and approximately 0.1 mm is preferable.
 スターラ71は、たとえば、恒温スターラであり、容器50における処理部51の下方に配置されている。スターラ71は、制御装置500の制御に従って、容器50内に設けられた撹拌子72を回転させることによって、容器50内の試料を撹拌する。さらに、スターラ71は、容器50の下方から容器50に熱を加えることによって、容器50内の試料の温度を一定に保つ。 The stirrer 71 is, for example, a thermostatic stirrer, and is disposed below the processing section 51 in the container 50. The stirrer 71 stirs the sample in the container 50 by rotating an agitator 72 provided in the container 50 under the control of the control device 500. Furthermore, the stirrer 71 applies heat to the container 50 from below, thereby keeping the temperature of the sample in the container 50 constant.
 排出管80は、容器50におけるオーバーフロー部52の最上部に設けられた排出口55に接続されており、対象物質を含む試料の上澄み液を容器50から外部にオーバーフローして排出する。 The discharge pipe 80 is connected to a discharge port 55 provided at the top of the overflow section 52 of the container 50, and the supernatant liquid of the sample containing the target substance overflows from the container 50 to the outside and is discharged.
 濾過部110は、排出管80から排出された試料の上澄み液を濾過することによって、上澄み液に含まれる対象物質を回収する。濾過部110を通過した上澄み液は、廃液リザーバ260によって回収される。濾過部110は、対象物質であるマイクロプラスチックを捕捉可能な大きさの網目を有する。たとえば、濾過部110は、SUS製の金網またはPTFE(polytetrafluoroethylene)(テフロン(登録商標))製のメンブレンフィルタである。対象物質がマイクロプラスチックである場合、濾過部110の網目の大きさは、0.1mm~5.0mmの粒子を通さない大きさが必要であり、約0.1mmが好ましい。 The filtration unit 110 recovers the target substance contained in the supernatant by filtering the supernatant of the sample discharged from the discharge pipe 80. The supernatant that passes through the filtration unit 110 is recovered by the waste liquid reservoir 260. The filtration unit 110 has meshes large enough to capture the target substance, microplastics. For example, the filtration unit 110 is a wire mesh made of SUS or a membrane filter made of PTFE (polytetrafluoroethylene) (Teflon (registered trademark)). When the target substance is microplastics, the mesh size of the filtration unit 110 needs to be large enough to block particles of 0.1 mm to 5.0 mm, and is preferably about 0.1 mm.
 制御装置500は、汎用コンピュータで実現されてもよいし、精製器10を制御するための専用コンピュータで実現されてもよい。たとえば、制御装置500は、デスクトップ型のPC(personal computer)、ラップトップ型のPC、スマートフォン、スマートウォッチ、ウェアラブルデバイス、およびタブレットPCなど、所定の情報処理を実行する情報端末であってもよい。制御装置500は、精製器10における、ポンプ31~33、電磁弁41~43、およびスターラ71を制御する。制御装置500は、本開示における「コンピュータ」の一実施例に相当する。 The control device 500 may be realized by a general-purpose computer, or may be realized by a dedicated computer for controlling the refiner 10. For example, the control device 500 may be an information terminal that executes predetermined information processing, such as a desktop personal computer (PC), a laptop PC, a smartphone, a smart watch, a wearable device, or a tablet PC. The control device 500 controls the pumps 31-33, the solenoid valves 41-43, and the stirrer 71 in the refiner 10. The control device 500 corresponds to one embodiment of the "computer" in this disclosure.
 [ハードウェア構成]
 図2を参照しながら、処理装置1のハードウェア構成を説明する。図2は、実施の形態に係る処理装置1のハードウェア構成を説明するための図である。図2に示すように、制御装置500は、主なハードウェア要素として、演算装置501と、メモリ502と、通信装置503と、表示装置504と、入力装置505と、データ読取装置506と、ストレージ510とを備える。
[Hardware configuration]
The hardware configuration of the processing device 1 will be described with reference to Fig. 2. Fig. 2 is a diagram for explaining the hardware configuration of the processing device 1 according to the embodiment. As shown in Fig. 2, the control device 500 includes, as main hardware elements, a calculation device 501, a memory 502, a communication device 503, a display device 504, an input device 505, a data reading device 506, and a storage 510.
 演算装置501は、ストレージ510に記憶されたプログラム(たとえば、制御プログラム511およびOS(Operating System)513)を読み出し、読み出したプログラムをメモリ502に展開して実行するプロセッサである。たとえば、演算装置501は、制御プログラム511を実行することによって、精製器10を制御するための処理(たとえば、後述の図3および図4の処理)を実行する。演算装置501の一例であるプロセッサは、たとえば、マイクロコントローラ(microcontroller)、CPU(central processing unit)、またはMPU(Micro-processing unit)などで構成される。なお、プロセッサは、プログラムを実行することによって各種の処理を実行する機能を有するが、これらの機能の一部または全部を、ASIC(Application Specific Integrated Circuit)またはFPGA(Field-Programmable Gate Array)などの専用のハードウェア回路を用いて実装してもよい。「プロセッサ」は、CPUまたはMPUのようにストアードプログラム方式で処理を実行する狭義のプロセッサに限らず、ASICまたはFPGAなどのハードワイヤード回路を含み得る。このため、プロセッサは、コンピュータ読み取り可能なコードおよび/またはハードワイヤード回路によって予め処理が定義されている、処理回路(processing circuitry)と読み替えることもできる。なお、演算装置501は、1つのチップで構成されてもよいし、複数のチップで構成されてもよい。さらに、プロセッサおよび関連する処理回路は、ローカルエリアネットワークまたは無線ネットワークなどを介して、有線または無線で相互接続された複数のコンピュータで構成されてもよい。プロセッサおよび関連する処理回路は、入力データに基づきリモートで演算し、その演算結果を離れた位置にある他のデバイスへと出力するような、クラウドコンピュータで構成されてもよい。 The arithmetic device 501 is a processor that reads out programs (e.g., a control program 511 and an OS (Operating System) 513) stored in the storage 510, and deploys the read out programs in the memory 502 for execution. For example, the arithmetic device 501 executes a process for controlling the refiner 10 (e.g., the process in FIG. 3 and FIG. 4 described below) by executing the control program 511. A processor, which is an example of the arithmetic device 501, is composed of, for example, a microcontroller, a CPU (central processing unit), or an MPU (micro-processing unit). Note that the processor has the function of executing various processes by executing a program, but some or all of these functions may be implemented using a dedicated hardware circuit such as an ASIC (Application Specific Integrated Circuit) or an FPGA (Field-Programmable Gate Array). The term "processor" is not limited to a processor in the narrow sense that executes processes using a stored program method, such as a CPU or an MPU, but may also include a hardwired circuit such as an ASIC or an FPGA. For this reason, the processor may be interpreted as a processing circuit, the processing of which is defined in advance by computer-readable code and/or hardwired circuitry. The computing device 501 may be composed of one chip or multiple chips. Furthermore, the processor and associated processing circuitry may be composed of multiple computers interconnected in a wired or wireless manner, such as via a local area network or a wireless network. The processor and associated processing circuitry may be composed of a cloud computer that performs calculations remotely based on input data and outputs the results of the calculations to another device in a remote location.
 メモリ502は、演算装置501が任意のプログラムを実行するにあたって、プログラムコードまたはワークメモリなどを一時的に格納する記憶領域を提供する。メモリ502は、1または複数の非一時的コンピュータ可読媒体(non-transitory computer readable medium)であってもよい。メモリ502は、DRAM(Dynamic Random Access Memory)またはSRAM(Static Random Access Memory)などの揮発性メモリ、あるいは、ROM(Read Only Memory)またはフラッシュメモリなどの不揮発性メモリで構成される。 Memory 502 provides a storage area for temporarily storing program code or work memory, etc., when the computing device 501 executes any program. Memory 502 may be one or more non-transitory computer readable mediums. Memory 502 is composed of volatile memory such as DRAM (Dynamic Random Access Memory) or SRAM (Static Random Access Memory), or non-volatile memory such as ROM (Read Only Memory) or flash memory.
 通信装置503は、精製器10のポンプ31~33、電磁弁41~43、またはスターラ71などを制御する制御信号を出力するためのインターフェースを含む。また、通信装置503は、ネットワーク(図示せず)を介して、他の装置との間でデータを送受信するインターフェースを含んでいてもよい。この場合、通信装置503は、たとえば、イーサネット(登録商標)、無線LAN(Local Area Network)、Bluetooth(登録商標)などの任意の通信方式に対応する。 The communication device 503 includes an interface for outputting control signals for controlling the pumps 31-33, solenoid valves 41-43, or stirrer 71 of the purifier 10. The communication device 503 may also include an interface for transmitting and receiving data to and from other devices via a network (not shown). In this case, the communication device 503 is compatible with any communication method, such as Ethernet (registered trademark), wireless LAN (Local Area Network), or Bluetooth (registered trademark).
 表示装置504は、たとえば、LCD(Liquid Crystal Display)などで構成され、精製器10の制御に関するプログラムの設計画面、精製器10の制御に関する設定画面、または異常時のアラート画面などを表示する。 The display device 504 is composed of, for example, an LCD (Liquid Crystal Display) and displays a design screen for a program related to the control of the refiner 10, a setting screen related to the control of the refiner 10, or an alert screen in the event of an abnormality, etc.
 入力装置505は、たとえば、キーボードまたはマウスなどで構成され、ユーザによって操作される。なお、入力装置505は、表示装置504の画面上に設けられたタッチパネルであってもよい。ユーザが入力装置505を操作することにより、当該操作に対応する入力信号が演算装置501に入力される。演算装置501は、入力装置505からの入力信号を受信すると、ユーザによる入力に基づく制御信号を、精製器10のポンプ31~33、電磁弁41~43、またはスターラ71などに出力する。ポンプ31~33、電磁弁41~43、またはスターラ71は、演算装置501からの制御信号従って動作する。 The input device 505 is composed of, for example, a keyboard or a mouse, and is operated by the user. The input device 505 may be a touch panel provided on the screen of the display device 504. When the user operates the input device 505, an input signal corresponding to the operation is input to the arithmetic device 501. When the arithmetic device 501 receives an input signal from the input device 505, it outputs a control signal based on the user's input to the pumps 31-33, solenoid valves 41-43, stirrer 71, or the like of the purifier 10. The pumps 31-33, solenoid valves 41-43, or stirrer 71 operate in accordance with the control signal from the arithmetic device 501.
 データ読取装置506は、記録媒体507に格納されているデータを読み出す。記録媒体507は、非一過性かつ有形のコンピュータ可読記憶媒体(non-transitory and tangible computer readable storage medium)であってもよい。記録媒体507は、CD(Compact Disc)、DVD(Digital Versatile Disc)、またはUSB(Universal Serial Bus)メモリなど、各種のデータを記録することができるものであればどのような形態であってもよい。 The data reading device 506 reads data stored in the recording medium 507. The recording medium 507 may be a non-transitory and tangible computer readable storage medium. The recording medium 507 may be in any form capable of recording various types of data, such as a CD (Compact Disc), a DVD (Digital Versatile Disc), or a USB (Universal Serial Bus) memory.
 ストレージ510は、精製処理などに必要な各種のデータを格納する記憶領域を提供する。ストレージ510は、1または複数のコンピュータ読み取り可能な記憶媒体(computer readable storage medium)であってもよい。ストレージ510は、たとえば、HDD(Hard Disk Drive)またはSSD(Solid State Drive)などの不揮発性メモリデバイスで構成される。ストレージ510は、制御プログラム511と、制御用データ512と、OS513とを格納する。 Storage 510 provides a memory area for storing various data required for refining processes, etc. Storage 510 may be one or more computer readable storage media. Storage 510 is configured, for example, by a non-volatile memory device such as a hard disk drive (HDD) or a solid state drive (SSD). Storage 510 stores a control program 511, control data 512, and an OS 513.
 制御プログラム511は、試料を精製するための精製処理の内容が記述されたプログラムであり、演算装置501によって実行される。制御プログラム511は、入力装置505を用いてユーザによって設計されてもよいし、データ読取装置506によって記録媒体507から読み取られてもよいし、通信装置503によってサーバなどの他の装置からネットワークを介して取得されてもよい。 The control program 511 is a program that describes the contents of the purification process for purifying a sample, and is executed by the computing device 501. The control program 511 may be designed by a user using the input device 505, may be read from the recording medium 507 by the data reading device 506, or may be obtained via a network from another device such as a server by the communication device 503.
 制御用データ512は、演算装置501が制御プログラム511を実行する際に用いるデータである。たとえば、制御用データ512は、ポンプ31~33、電磁弁41~43、およびスターラ71を制御するための設定値などのデータを含む。制御用データ512は、入力装置505を用いてユーザによって入力されてもよいし、データ読取装置506によって記録媒体507から読み取られてもよいし、通信装置503によってサーバなどの他の装置からネットワークを介して取得されてもよい。 The control data 512 is data used by the computing device 501 when executing the control program 511. For example, the control data 512 includes data such as settings for controlling the pumps 31-33, the solenoid valves 41-43, and the stirrer 71. The control data 512 may be input by a user using the input device 505, may be read from the recording medium 507 by the data reading device 506, or may be obtained by the communication device 503 from another device such as a server via a network.
 OS513は、演算装置501によって各種の処理を実行するための基本的な機能を提供する。 The OS 513 provides basic functions for the arithmetic unit 501 to execute various processes.
 [精製処理]
 図3を参照しながら、処理装置1が実行する試料の精製処理を説明する。図3は、実施の形態に係る処理装置1の制御装置500が実行する精製処理のフローチャートである。図3に示す各ステップは、制御装置500の演算装置501が、OS513および制御プログラム511を実行することによって実現される。
[Refining process]
The sample purification process executed by the processing device 1 will be described with reference to Fig. 3. Fig. 3 is a flow chart of the purification process executed by the control device 500 of the processing device 1 according to the embodiment. Each step shown in Fig. 3 is realized by the arithmetic device 501 of the control device 500 executing the OS 513 and the control program 511.
 まず、精製処理の準備として、ユーザは、オーバーフロー部52から処理部51を取り外すことによって容器50を開放し、容器50における処理部51の内部に試料を導入する。その後、ユーザは、制御装置500の入力装置505を用いて開始操作を行うことによって、制御装置500による精製器10の制御を開始する。 First, in preparation for the purification process, the user opens the container 50 by removing the processing section 51 from the overflow section 52, and introduces the sample into the processing section 51 in the container 50. After that, the user performs a start operation using the input device 505 of the control device 500, thereby starting control of the purifier 10 by the control device 500.
 制御装置500による精製器10の制御が開始されると、制御装置500は、排出側のポンプ33および電磁弁43を制御することによって、配管20~23およびポート63,64を介して、容器50に収容された試料に含まれる液体を廃液として廃液リザーバ250に排出する(S1)。なお、マイクロプラスチックなどの液体以外の物質は、容器50の内部に設けられたストレーナ300によって捕捉され、容器50内に保持される。 When the control device 500 starts to control the purifier 10, the control device 500 controls the discharge pump 33 and solenoid valve 43 to discharge the liquid contained in the sample stored in the container 50 as waste liquid through the pipes 20-23 and ports 63, 64 to the waste liquid reservoir 250 (S1). Note that substances other than the liquid, such as microplastics, are captured by the strainer 300 provided inside the container 50 and are retained within the container 50.
 制御装置500は、分解液を用いて容器50に収容された試料に含まれる有機夾雑物を分解するための分解処理を実行する(S2)。なお、分解処理の詳細については図4を用いて後述する。 The control device 500 executes a decomposition process using the decomposition liquid to decompose organic impurities contained in the sample stored in the container 50 (S2). Details of the decomposition process will be described later with reference to FIG. 4.
 制御装置500は、分解処理の後、排出側のポンプ33および電磁弁43を制御することによって、配管20~23およびポート63,64を介して、有機夾雑物の分解処理後の試料に含まれる容器50内の廃液を廃液リザーバ250に排出する(S3)。なお、対象物質のマイクロプラスチックは、容器50の内部に設けられたストレーナ300によって捕捉され、容器50内に保持される。 After the decomposition process, the control device 500 controls the discharge pump 33 and solenoid valve 43 to discharge the waste liquid in the container 50, which is contained in the sample after the decomposition process of the organic impurities, into the waste liquid reservoir 250 via the pipes 20-23 and ports 63, 64 (S3). The target substance, microplastics, is captured by the strainer 300 installed inside the container 50 and is retained in the container 50.
 制御装置500は、排出側のポンプ33を停止する一方で、導入側のポンプ31および電磁弁41を制御することによって、配管17,12,13およびポート61を介して、リンス液リザーバ230内のリンス液を容器50に導入し、容器50内を洗浄する(S4)。このとき、制御装置500は、ポンプ31の送出量を制御することによって、ユーザによって予め設定された量のリンス液を容器50に導入する。S4におけるリンス液の導入量は、処理部51の容量以下とされ、たとえば150ml以下である。 The control device 500 stops the discharge pump 33 while controlling the introduction pump 31 and solenoid valve 41 to introduce the rinse liquid in the rinse liquid reservoir 230 into the container 50 via the pipes 17, 12, 13 and port 61, thereby cleaning the inside of the container 50 (S4). At this time, the control device 500 controls the discharge rate of the pump 31 to introduce an amount of rinse liquid preset by the user into the container 50. The amount of rinse liquid introduced in S4 is set to be equal to or less than the capacity of the processing section 51, for example, 150 ml or less.
 制御装置500は、導入側のポンプ31を停止する一方で、排出側のポンプ33および電磁弁43を制御することによって、配管20~23およびポート63,64を介して、リンス液による洗浄後の廃液を廃液リザーバ250に排出する(S5)。これにより、リンス液によって容器50内が洗浄される。なお、対象物質のマイクロプラスチックは、容器50の内部に設けられたストレーナ300によって捕捉され、容器50内に保持される。その後、制御装置500は、所定期間(たとえば、1日間)に亘って試料をそのまま放置することによって試料を乾燥させてもよい。 The control device 500 stops the inlet pump 31 while controlling the outlet pump 33 and solenoid valve 43 to discharge the waste liquid after cleaning with the rinse liquid through the pipes 20-23 and ports 63, 64 to the waste liquid reservoir 250 (S5). This cleans the inside of the container 50 with the rinse liquid. The target substance, microplastics, is captured by the strainer 300 provided inside the container 50 and is retained within the container 50. The control device 500 may then dry the sample by leaving it as it is for a predetermined period of time (for example, one day).
 制御装置500は、排出側のポンプ33を停止する一方で、導入側のポンプ32および電磁弁42を制御することによって、配管14~16およびポート62を介して、重液リザーバ220の重液を容器50に導入する(S6)。このとき、制御装置500は、ポンプ32の送出量を制御することによって、ユーザによって予め設定された量の重液を容器50に導入する。 The control device 500 stops the discharge pump 33 while controlling the inlet pump 32 and solenoid valve 42 to introduce the heavy liquid from the heavy liquid reservoir 220 into the container 50 via the pipes 14-16 and port 62 (S6). At this time, the control device 500 controls the output rate of the pump 32 to introduce the amount of heavy liquid preset by the user into the container 50.
 制御装置500は、導入側のポンプ32を停止した状態で、所定期間(たとえば、1日間)に亘って試料をそのまま放置する(S7)。このようにして重液が容器50内の試料に導入されて放置されると、試料に含まれる無機夾雑物が比重差によって容器50の底付近に沈降する。一方、重液よりも比重の軽い対象物質のマイクロプラスチックは、重液の液面上に浮上する。 The control device 500 stops the inlet pump 32 and leaves the sample as it is for a predetermined period of time (for example, one day) (S7). When the heavy liquid is introduced into the sample in the container 50 in this manner and left as it is, inorganic impurities contained in the sample will settle near the bottom of the container 50 due to the difference in specific gravity. Meanwhile, the target substance, microplastics, which have a lower specific gravity than the heavy liquid, will rise to the surface of the heavy liquid.
 制御装置500は、再びポンプ32および電磁弁42を制御することによって、配管14~16およびポート62を介して、重液リザーバ220の重液を容器50に再び導入する(S8)。このとき、制御装置500は、ポンプ32の送出量を制御することによって、ユーザによって予め設定された量の重液を容器50に導入する。このようにして重液が容器50内の試料に再び導入されると、比重分離された試料の液面が容器50内を徐々に上昇し、やがて試料の上澄み液が容器50の排出口55に到達する。そして、試料の上澄み液は、排出口55および排出管80を通って排出液として外部に排出される。 The control device 500 again controls the pump 32 and the solenoid valve 42 to introduce the heavy liquid from the heavy liquid reservoir 220 back into the container 50 via the pipes 14-16 and the port 62 (S8). At this time, the control device 500 controls the output rate of the pump 32 to introduce an amount of heavy liquid preset by the user into the container 50. When the heavy liquid is introduced back into the sample in the container 50 in this way, the liquid level of the gravity-separated sample gradually rises inside the container 50, and the supernatant liquid of the sample eventually reaches the discharge port 55 of the container 50. The supernatant liquid of the sample is then discharged to the outside as a discharge liquid through the discharge port 55 and the discharge pipe 80.
 排出管80を通って排出された排出液は、濾過部110によって濾過され、濾過部110を通過した廃液のみが廃液リザーバ260によって回収される。濾過部110には、重液よりも比重の軽い成分であるマイクロプラスチックが残留する。 The discharged liquid discharged through the discharge pipe 80 is filtered by the filtration section 110, and only the waste liquid that passes through the filtration section 110 is collected by the waste liquid reservoir 260. Microplastics, which are components with a lower specific gravity than the heavy liquid, remain in the filtration section 110.
 試料の精製によってマイクロプラスチックが回収された後、制御装置500は、後処理として容器50内を洗浄する。具体的には、制御装置500は、排出側のポンプ33および電磁弁43を制御することによって、配管19~22およびポート63,64を介して、マイクロプラスチックが回収された後の容器50内の廃液を廃液リザーバ240に排出する(S9)。 After the microplastics have been recovered by refining the sample, the control device 500 cleans the inside of the container 50 as a post-processing step. Specifically, the control device 500 controls the pump 33 and solenoid valve 43 on the discharge side to discharge the waste liquid from the container 50 after the microplastics have been recovered into the waste liquid reservoir 240 via the pipes 19-22 and ports 63, 64 (S9).
 制御装置500は、排出側のポンプ33を停止する一方で、導入側のポンプ32および電磁弁42を制御することによって、配管18,15,16およびポート62を介して、リンス液リザーバ230内のリンス液を容器50に導入し、容器50内を洗浄する(S10)。このとき、制御装置500は、ポンプ32の送出量を制御することによって、ユーザによって予め設定された量のリンス液を容器50に導入する。 The control device 500 stops the discharge pump 33, while controlling the introduction pump 32 and solenoid valve 42 to introduce the rinse liquid in the rinse liquid reservoir 230 into the container 50 via the pipes 18, 15, 16 and port 62, thereby cleaning the inside of the container 50 (S10). At this time, the control device 500 controls the amount of rinse liquid discharged by the pump 32 to introduce the amount of rinse liquid preset by the user into the container 50.
 制御装置500は、導入側のポンプ32を停止する一方で、排出側のポンプ33および電磁弁43を制御することによって、配管19~22およびポート63,64を介して、リンス液が導入された後の容器50内の廃液を廃液リザーバ240に排出する(S11)。これにより、リンス液によって容器50内が洗浄される。その後、制御装置500は、本フローに係る処理を終了する。 The control device 500 stops the pump 32 on the introduction side, while controlling the pump 33 and solenoid valve 43 on the discharge side to discharge the waste liquid in the container 50 after the rinsing liquid has been introduced into the waste liquid reservoir 240 via the pipes 19-22 and ports 63, 64 (S11). This allows the inside of the container 50 to be cleaned with the rinsing liquid. The control device 500 then ends the processing related to this flow.
 以上のように、実施の形態に係る処理装置1によれば、制御装置500は、適切なタイミングおよび適切な時間に亘って自動的に、容器50に収容された試料に対して分解液および重液を導入し、また、容器50から廃液を排出する。このため、ユーザは、自ら、容器50に分解液および重液を導入し、また、容器50から廃液を排出する必要がない。さらに、実施の形態に係る処理装置1によれば、制御装置500は、マイクロプラスチックを回収した後、使用した容器50を自動的に洗浄する。これにより、ユーザは、自身の技量に依存することなく、マイクロプラスチックを安定的に回収することが可能となり、精度よく試料を精製することができる。 As described above, according to the processing device 1 of the embodiment, the control device 500 automatically introduces the decomposition liquid and heavy liquid to the sample contained in the container 50 at an appropriate timing and for an appropriate period of time, and also discharges the waste liquid from the container 50. Therefore, the user does not need to introduce the decomposition liquid and heavy liquid into the container 50 or discharge the waste liquid from the container 50 by himself. Furthermore, according to the processing device 1 of the embodiment, the control device 500 automatically cleans the used container 50 after collecting the microplastics. This allows the user to stably collect microplastics without relying on his or her own skill, and allows the sample to be purified with high accuracy.
 [分解処理]
 上述したように、処理装置1は、精製処理におけるS2の分解処理によって、分解液を用いて試料に含まれる夾雑物を分解するように構成されている。分解液の導入量は、投入できる試料の量に応じてユーザによって予め設定されている。投入できる試料の量は容器50の寸法から一定の制限を設定することができるが、分解の対象となる試料に含まれる夾雑物の量によっては、夾雑物が十分に分解されない。夾雑物が十分に分解されないと、精製の精度が低下し、その後の分析工程に影響を及ぼし得る。また、回収物に夾雑物が混ざることで、重量計測またはサイズ計測に影響を与えてしまうおそれもある。
[Decomposition Processing]
As described above, the processing device 1 is configured to decompose impurities contained in the sample using a decomposition liquid by the decomposition process of S2 in the purification process. The amount of decomposition liquid introduced is preset by the user according to the amount of sample that can be loaded. Although a certain limit can be set for the amount of sample that can be loaded based on the dimensions of the container 50, the impurities may not be sufficiently decomposed depending on the amount of impurities contained in the sample to be decomposed. If the impurities are not sufficiently decomposed, the accuracy of the purification will decrease, which may affect the subsequent analysis process. In addition, the presence of impurities in the recovered material may affect weight measurement or size measurement.
 これを防ぐため、分解液の導入量を通常よりも多くすることも考えられるが、容器50の寸法から許容導入量が決まっている。この許容導入量を超過してしまうと、分解によって発生する泡などが想定外の箇所に付着し、精製精度が低下するおそれがある。また、過剰な分解液を導入した結果、分解液を無駄に消費してしまうおそれもある。さらに、長時間に亘って分解処理を実行したり、過剰な量の分解液を用いて分解処理を実行したりした場合、回収対象であるマイクロプラスチックの物性によっては当該マイクロプラスチックに損傷を与えてしまうおそれもあり、マイクロプラスチックの分析結果に意図せぬ影響を与えてしまう可能性がある。たとえば、過度な分解処理によってマイクロプラスチックが損傷した場合、マイクロプラスチックの重量およびサイズが変化して、重量計測またはサイズ計測に影響を与えてしまうおそれがある。 To prevent this, it is possible to introduce a larger amount of decomposition liquid than usual, but the allowable introduction amount is determined by the dimensions of the container 50. If this allowable introduction amount is exceeded, bubbles generated by decomposition may adhere to unexpected locations, which may reduce the purification accuracy. In addition, introducing excessive decomposition liquid may result in unnecessary consumption of the decomposition liquid. Furthermore, if the decomposition process is performed for a long period of time or using an excessive amount of decomposition liquid, the microplastics to be recovered may be damaged depending on their physical properties, which may have an unintended effect on the analysis results of the microplastics. For example, if the microplastics are damaged by excessive decomposition process, the weight and size of the microplastics may change, which may affect the weight or size measurement.
 そこで、実施の形態に係る処理装置1は、分解処理において、ユーザによって予め定められた分解液を容器50に導入して夾雑物の分解を行った後、ユーザによる入力装置505への入力に基づいて、新たな分解液を容器50に導入して夾雑物の再分解を行うリフレッシュ処理を実行するように構成されている。 The processing device 1 according to the embodiment is configured to, in the decomposition process, introduce a decomposition liquid predetermined by the user into the container 50 to decompose the impurities, and then, based on the user's input to the input device 505, execute a refresh process in which new decomposition liquid is introduced into the container 50 to re-decompose the impurities.
 図4を参照しながら、処理装置1が実行する試料の分解処理を説明する。図4は、実施の形態に係る処理装置1の制御装置500が実行する分解処理のフローチャートである。図4に示す各ステップは、制御装置500の演算装置501が、OS513および制御プログラム511を実行することによって実現される。 The sample decomposition process executed by the processing device 1 will be described with reference to FIG. 4. FIG. 4 is a flowchart of the decomposition process executed by the control device 500 of the processing device 1 according to the embodiment. Each step shown in FIG. 4 is realized by the arithmetic device 501 of the control device 500 executing the OS 513 and the control program 511.
 図4に示すように、制御装置500は、導入側のポンプ31および電磁弁41を制御することによって、配管11~13およびポート61を介して、分解液リザーバ210内の分解液を容器50に導入する(S21)。なお、S21において導入される分解液は、本開示における「第1の処理液」の一実施例に相当する。 As shown in FIG. 4, the control device 500 controls the pump 31 and solenoid valve 41 on the inlet side to introduce the decomposition liquid in the decomposition liquid reservoir 210 into the container 50 via the pipes 11-13 and the port 61 (S21). Note that the decomposition liquid introduced in S21 corresponds to one example of the "first processing liquid" in this disclosure.
 このとき、制御装置500は、ポンプ31の送出量を制御することによって、ユーザによって予め設定された量の分解液を容器50に導入する。たとえば、分解液を用いた夾雑物の分解は、ストレーナ300によってマイクロプラスチックを捕捉可能とするために、ストレーナ300が設けられた処理部51の内部で行われることが必要である。このため、S21における分解液の導入量は、処理部51の容量以下とされ、たとえば150ml以下である。 At this time, the control device 500 introduces the amount of decomposition liquid preset by the user into the container 50 by controlling the output amount of the pump 31. For example, the decomposition of impurities using the decomposition liquid needs to be carried out inside the processing section 51 in which the strainer 300 is provided so that the strainer 300 can capture microplastics. For this reason, the amount of decomposition liquid introduced in S21 is set to be equal to or less than the capacity of the processing section 51, for example, 150 ml or less.
 さらに、制御装置500は、ユーザによって予め設定された量の分解液を、ユーザによって予め設定された所定間隔で複数回に分けて容器50に導入してもよい。たとえば、制御装置500は、5時間に亘って、150mlの分解液を30mlずつ1時間間隔で容器50に導入してもよい。これにより、処理装置1は、容器50に分解液を一度に入れることで生じ得る過剰な分解反応を抑制することができる。 Furthermore, the control device 500 may introduce an amount of decomposition liquid preset by the user into the container 50 in multiple batches at predetermined intervals preset by the user. For example, the control device 500 may introduce 150 ml of decomposition liquid into the container 50 in 30 ml increments at one-hour intervals over a period of five hours. This allows the processing device 1 to suppress excessive decomposition reactions that may occur when the decomposition liquid is introduced into the container 50 all at once.
 分解液を導入した後、制御装置500は、スターラ71を制御することによって、容器50に一定の熱を加えながら容器50内に設けられた撹拌子72を回転させて試料を撹拌する(S22)。容器50内の温度、撹拌子72の回転速度、および回転時間は、ユーザによって予め設定されている。このように、制御装置500は、熱を加えながら試料を撹拌することによって、分解液を用いた有機夾雑物の分解を促進することができる。なお、試料の撹拌時においては、必ずしも加熱は必要ないが、加熱によって試料の温度を一定温度に保つことによって有機夾雑物の分解が促進される。 After introducing the decomposition liquid, the control device 500 controls the stirrer 71 to rotate the stirrer 72 provided in the container 50 while applying a constant heat to the container 50, thereby stirring the sample (S22). The temperature inside the container 50, the rotation speed of the stirrer 72, and the rotation time are preset by the user. In this way, the control device 500 can promote the decomposition of organic impurities using the decomposition liquid by stirring the sample while applying heat. Note that while heating is not necessarily required when stirring the sample, the decomposition of organic impurities is promoted by maintaining a constant sample temperature through heating.
 制御装置500は、ユーザによる入力装置505の操作に基づく停止入力を受け付けたか否かを判定する(S23)。制御装置500は、ユーザによる停止入力を受け付けていない場合(S23でNO)、分解処理期間が経過したか否かを判定する(S29)。分解処理期間は、たとえば3日間など、ユーザによって予め設定される。 The control device 500 determines whether or not a stop input based on the user's operation of the input device 505 has been received (S23). If the control device 500 has not received a stop input from the user (NO in S23), it determines whether or not the decomposition processing period has elapsed (S29). The decomposition processing period is preset by the user, for example, three days.
 制御装置500は、分解処理期間が経過した場合(S29でYES)、分解処理を終了して、図3のS3の処理に移行する。一方、制御装置500は、分解処理期間が経過していない場合(S29でNO)、S23の処理に戻る。 If the decomposition processing period has elapsed (YES in S29), the control device 500 ends the decomposition processing and proceeds to processing S3 in FIG. 3. On the other hand, if the decomposition processing period has not elapsed (NO in S29), the control device 500 returns to processing S23.
 制御装置500は、ユーザによる停止入力を受け付けた場合(S23でYES)、スターラ71および撹拌子72の動作を停止することによって、分解処理を一時停止する(S24)。 If the control device 500 receives a stop input from the user (YES in S23), it pauses the decomposition process by stopping the operation of the stirrer 71 and the stirring bar 72 (S24).
 制御装置500は、分解処理を一時停止した状態において、ユーザによる入力装置505の操作に基づくリフレッシュ入力を受け付けたか否かを判定する(S25)。 The control device 500 determines whether or not a refresh input based on the user's operation of the input device 505 has been received while the decomposition process is paused (S25).
 制御装置500は、ユーザによるリフレッシュ入力を受け付けていない場合(S25でNO)、ユーザによる入力装置505の操作に基づく再開入力を受け付けたか否かを判定する(S30)。 If the control device 500 has not received a refresh input from the user (NO in S25), it determines whether or not a resume input based on the user's operation of the input device 505 has been received (S30).
 制御装置500は、ユーザによる再開入力を受け付けた場合(S30でYES)、スターラ71および撹拌子72を制御することによって、容器50に一定の熱を加えながら容器50内に設けられた撹拌子72を再び回転させて試料を撹拌し、分解処理を再開する(S31)。その後、制御装置500は、S29の処理に移行する。一方、制御装置500は、ユーザによる再開入力を受け付けていない場合(S30でNO)、S23の処理に戻る。 If the control device 500 receives a restart input from the user (YES in S30), it controls the stirrer 71 and the stirring bar 72 to apply a constant amount of heat to the container 50 while rotating the stirring bar 72 installed inside the container 50 again to stir the sample and restart the decomposition process (S31). The control device 500 then proceeds to the process of S29. On the other hand, if the control device 500 does not receive a restart input from the user (NO in S30), it returns to the process of S23.
 制御装置500は、ユーザによるリフレッシュ入力を受け付けた場合(S25でYES)、リフレッシュ処理を実行する。具体的には、制御装置500は、排出側のポンプ33および電磁弁43を制御することによって、配管20~23およびポート63,64を介して、有機夾雑物の分解処理によって生じた容器50内の廃液を廃液リザーバ250に排出する(S26)。なお、対象物質のマイクロプラスチックは、容器50の内部に設けられたストレーナ300によって捕捉され、容器50内に保持される。 When the control device 500 receives a refresh input from the user (YES in S25), it executes the refresh process. Specifically, the control device 500 controls the discharge pump 33 and solenoid valve 43 to discharge the waste liquid in the container 50 generated by the decomposition process of the organic impurities into the waste liquid reservoir 250 via the pipes 20-23 and ports 63, 64 (S26). The target substance, microplastics, is captured by the strainer 300 installed inside the container 50 and is retained in the container 50.
 その後、制御装置500は、排出側のポンプ33を停止する一方で、導入側のポンプ31および電磁弁41を制御することによって、配管11~13およびポート61を介して、分解液リザーバ210内の分解液を容器50に再び導入する(S27)。なお、S27において導入される分解液は、本開示における「第2の処理液」の一実施例に相当する。 Then, the control device 500 stops the discharge pump 33 while controlling the inlet pump 31 and solenoid valve 41 to introduce the decomposition liquid in the decomposition liquid reservoir 210 back into the container 50 via the pipes 11-13 and port 61 (S27). Note that the decomposition liquid introduced in S27 corresponds to one example of the "second processing liquid" in this disclosure.
 このとき、制御装置500は、ポンプ31の送出量を制御することによって、ユーザによって予め設定された量の分解液を容器50に再び導入する。たとえば、S27における分解液の導入量は、S21における分解液の導入量以下である。また、S27において容器50に導入される分解液の濃度は、ユーザによって予め設定された濃度であってもよい。たとえば、S27において容器50に導入される分解液の濃度は、S21において容器50に導入される分解液の濃度以下であってもよい。これにより、処理装置1は、S21において導入された分解液によって処理された夾雑物に対して、リフレッシュ処理のS27において導入された分解液によって過剰に分解処理してしまい、マイクロプラスチックをも損傷してしまうことを防ぐことができる。 At this time, the control device 500 controls the discharge rate of the pump 31 to reintroduce the amount of decomposition liquid preset by the user into the container 50. For example, the amount of decomposition liquid introduced in S27 is equal to or less than the amount of decomposition liquid introduced in S21. The concentration of the decomposition liquid introduced into the container 50 in S27 may be equal to or less than the concentration of the decomposition liquid introduced into the container 50 in S21. This allows the processing device 1 to prevent the impurities treated with the decomposition liquid introduced in S21 from being excessively decomposed by the decomposition liquid introduced in S27 of the refresh process, which would result in damage to microplastics.
 さらに、制御装置500は、S27の処理において、S21の処理と同様に、ユーザによって予め設定された量の分解液を、ユーザによって予め設定された所定間隔で複数回に分けて容器50に導入してもよい。たとえば、制御装置500は、5時間に亘って、150mlの分解液を30mlずつ1時間間隔で容器50に導入してもよい。これにより、処理装置1は、リフレッシュ処理においても、容器50に分解液を一度に入れることで生じ得る過剰な分解反応を抑制することができる。 Furthermore, in the process of S27, the control device 500 may introduce an amount of decomposition liquid preset by the user into the container 50 in multiple batches at predetermined intervals preset by the user, similar to the process of S21. For example, the control device 500 may introduce 150 ml of decomposition liquid into the container 50 in 30 ml increments at one-hour intervals over a period of five hours. This allows the processing device 1 to suppress excessive decomposition reactions that may occur when the decomposition liquid is introduced into the container 50 all at once, even in the refresh process.
 分解液を再度導入した後、制御装置500は、スターラ71を制御することによって、容器50に一定の熱を加えながら容器50内に設けられた撹拌子72を回転させて試料を撹拌する(S28)。その後、制御装置500は、S29の処理に移行する。 After reintroducing the decomposition liquid, the control device 500 controls the stirrer 71 to rotate the stirring bar 72 provided in the container 50 while applying a constant amount of heat to the container 50, thereby stirring the sample (S28). The control device 500 then proceeds to the process of S29.
 以上のように、処理装置1は、S21で分解液を導入して試料に含まれる夾雑物の分解を行った後、ユーザによる停止入力に基づいて夾雑物の分解を一旦停止し、さらに、ユーザによるリフレッシュ入力に基づいてS26~S28で分解液を容器50に再導入して夾雑物の再分解を行うリフレッシュ処理を実行する。処理装置1は、このようなリフレッシュ処理を、S29で分解処理期間が経過したと判定するまで複数回実行可能である。 As described above, the processing device 1 introduces the decomposition liquid in S21 to decompose the impurities contained in the sample, then temporarily stops the decomposition of the impurities based on a stop input from the user, and then executes a refresh process in S26-S28 to reintroduce the decomposition liquid into the container 50 and re-decompose the impurities based on a refresh input from the user. The processing device 1 can execute such a refresh process multiple times until it determines in S29 that the decomposition process period has elapsed.
 このように、ユーザは、分解液を導入して夾雑物の分解処理を実行した後、外部から容器50内で行われている夾雑物の分解処理の状況を確認し、夾雑物の分解が適切に進んでいないと判断した場合に、リフレッシュ処理を実行することで、分解処理に用いられた分解液を新たな分解液に入れ替えることで、夾雑物の分解処理を再度実行することができる。これにより、ユーザは、S21で最初に導入する分解液による過剰な分解反応を抑制するとともに、リフレッシュ処理のS27で新たに導入する分解液によって夾雑物を十分に分解することができる。したがって、ユーザは、分解処理の時間を通常よりも多くしたり、最初に導入する分解液の量を増やしたりすることなく、夾雑物の分解処理の進捗度合いに応じて夾雑物を適切に分解処理することができる。 In this way, after introducing the decomposition liquid to perform the decomposition process of the impurities, the user can check the status of the decomposition process of the impurities being performed inside the container 50 from the outside, and if it is determined that the decomposition of the impurities is not proceeding properly, the user can perform the refresh process to replace the decomposition liquid used in the decomposition process with new decomposition liquid, thereby performing the decomposition process of the impurities again. This allows the user to suppress excessive decomposition reactions caused by the decomposition liquid initially introduced in S21, and to sufficiently decompose the impurities with the new decomposition liquid introduced in S27 of the refresh process. Therefore, the user can appropriately decompose the impurities according to the progress of the decomposition process of the impurities, without extending the time of the decomposition process longer than usual or increasing the amount of decomposition liquid initially introduced.
 (態様)
 (第1項)一態様に係る処理装置は、試料を収容する容器と、容器に収容された試料から対象物質を抽出する制御装置と、ユーザからの入力を受け付ける入力装置とを備える。制御装置は、試料が収容された容器に、試料に含まれる夾雑物を処理するための第1の処理液を導入し、第1の処理液を導入した後、入力装置への入力に基づいて、容器に試料に含まれる夾雑物を再度処理するための第2の処理液を導入するリフレッシュ処理を実行する。
(Aspects)
(Item 1) A processing apparatus according to one aspect includes a container for storing a sample, a control device for extracting a target substance from the sample stored in the container, and an input device for receiving input from a user. The control device introduces a first processing liquid for processing impurities contained in the sample into the container storing the sample, and after introducing the first processing liquid, executes a refresh process for introducing a second processing liquid into the container for processing the impurities contained in the sample again based on the input to the input device.
 第1項に記載の処理装置によれば、容器に導入された第1の処理液を用いて試料に含まれる夾雑物を十分に処理できない場合でも、ユーザによる入力に基づいて容器に導入された第2の処理液を用いて試料に含まれる夾雑物を再度処理することができるため、試料に含まれる夾雑物を適切に処理して対象物質を回収することができる。  According to the processing device described in paragraph 1, even if the first processing liquid introduced into the container cannot sufficiently process the impurities contained in the sample, the second processing liquid introduced into the container based on the user's input can be used to reprocess the impurities contained in the sample, making it possible to appropriately process the impurities contained in the sample and recover the target substance.
 (第2項)第1項に記載の処理装置において、制御装置は、リフレッシュ処理において、第1の処理液を用いた夾雑物の処理によって生じた廃液を排出した後に、容器に第2の処理液を導入する。 (2) In the processing device described in 1, the control device discharges waste liquid generated by processing impurities using the first processing liquid during the refresh process, and then introduces the second processing liquid into the container.
 第2項に記載の処理装置によれば、リフレッシュ処理において夾雑物の処理に用いられた第1の処理液を新たな第2の処理液に入れ替えることで、新たな第2の処理液を用いて夾雑物の処理を再度実行することができる。 The processing device described in paragraph 2 can replace the first processing liquid used to process the impurities in the refresh process with a new second processing liquid, allowing the impurities to be processed again using the new second processing liquid.
 (第3項)第1項または第2項に記載の処理装置において、制御装置は、リフレッシュ処理を複数回実行可能である。 (Clause 3) In the processing device described in clause 1 or clause 2, the control device can execute the refresh process multiple times.
 第3項に記載の処理装置によれば、ユーザは、夾雑物を十分に処理することができるまで、リフレッシュ処理を複数回実行することができる。  According to the processing device described in paragraph 3, the user can execute the refresh process multiple times until the impurities can be sufficiently processed.
 (第4項)第1項~第3項のいずれか1項に記載の処理装置において、制御装置は、容器に第1の処理液を複数回に分けて導入する。 (4) In the treatment device described in any one of paragraphs 1 to 3, the control device introduces the first treatment liquid into the container in multiple batches.
 第4項に記載の処理装置によれば、容器に第1の処理液を一度に入れることで生じ得る過剰な処理反応を抑制することができる。 The treatment device described in paragraph 4 can suppress excessive treatment reactions that may occur when the first treatment liquid is poured into the container all at once.
 (第5項)第1項~第4項のいずれか1項に記載の処理装置において、制御装置は、容器に第2の処理液を複数回に分けて導入する。 (5) In the treatment device described in any one of paragraphs 1 to 4, the control device introduces the second treatment liquid into the container in multiple batches.
 第5項に記載の処理装置によれば、リフレッシュ処理においても、容器に第2の処理液を一度に入れることで生じ得る過剰な処理反応を抑制することができる。 The processing device described in paragraph 5 can also suppress excessive processing reactions that may occur during the refresh process by pouring the second processing liquid into the container all at once.
 (第6項)第1項~第5項のいずれか1項に記載の処理装置において、容器に導入される第2の処理液の量は、容器に導入された第1の処理液の量以下である。 (6) In the treatment device described in any one of paragraphs 1 to 5, the amount of the second treatment liquid introduced into the container is equal to or less than the amount of the first treatment liquid introduced into the container.
 第6項に記載の処理装置によれば、最初に導入された第1の処理液によって処理された夾雑物に対して、リフレッシュ処理において導入された第2の処理液によって過剰に処理してしまうことを防ぐことができる。 The processing device described in paragraph 6 can prevent the impurities that have been initially treated with the first processing liquid from being excessively treated with the second processing liquid introduced during the refresh process.
 (第7項)第1項~第6項のいずれか1項に記載の処理装置において、容器に導入される第2の処理液の濃度は、容器に導入された第1の処理液の濃度以下である。 (7) In the treatment device described in any one of paragraphs 1 to 6, the concentration of the second treatment liquid introduced into the container is equal to or lower than the concentration of the first treatment liquid introduced into the container.
 第7項に記載の処理装置によれば、最初に導入された第1の処理液によって処理された夾雑物に対して、リフレッシュ処理において導入された第2の処理液によって過剰に処理してしまうことを防ぐことができる。 The treatment device described in paragraph 7 can prevent the impurities treated with the first treatment liquid introduced initially from being excessively treated with the second treatment liquid introduced during the refresh process.
 (第8項)第1項~第7項のいずれか1項に記載の処理装置において、容器は、容器に収容された試料に含まれる夾雑物の処理状況を外部から視認可能な透過率を有する。 (8) In the processing device described in any one of paragraphs 1 to 7, the container has a transmittance that allows the processing status of impurities contained in the sample contained in the container to be visually observed from the outside.
 第8項に記載の処理装置によれば、ユーザは、第1の処理液を導入して夾雑物の処理を実行した後、外部から容器内で行われている夾雑物の処理状況を確認することができ、夾雑物の処理状況に応じてリフレッシュ処理を実行することができる。  According to the processing device described in paragraph 8, after the user introduces the first processing liquid to process the impurities, the user can check the status of the impurity processing being carried out inside the container from the outside, and can perform a refresh process according to the impurity processing status.
 (第9項)第1項~第8項のいずれか1項に記載の処理装置において、対象物質は、マイクロプラスチックである。 (9) In the processing device described in any one of paragraphs 1 to 8, the target substance is microplastics.
 第9項に記載の処理装置によれば、試料に含まれる夾雑物を適切に処理してマイクロプラスチックを回収することができる。 The processing device described in paragraph 9 can properly process impurities contained in a sample and recover microplastics.
 (第10項)一態様に係る処理方法は、試料が収容された容器に、試料に含まれる夾雑物を処理するための第1の処理液を導入するステップと、第1の処理液を導入した後、ユーザによる入力に基づいて、容器に試料に含まれる夾雑物を再度処理するための第2の処理液を導入するリフレッシュ処理を実行するステップとを含む。 (Clause 10) A processing method according to one embodiment includes the steps of: introducing a first processing liquid into a container that holds the sample, the first processing liquid being used to process impurities contained in the sample; and, after the first processing liquid has been introduced, executing a refresh process based on a user's input to introduce a second processing liquid into the container to reprocess the impurities contained in the sample.
 第10項に記載の処理方法によれば、容器に導入された第1の処理液を用いて試料に含まれる夾雑物を十分に処理できない場合でも、ユーザによる入力に基づいて容器に導入された第2の処理液を用いて試料に含まれる夾雑物を再度処理することができるため、試料に含まれる夾雑物を適切に処理して対象物質を回収することができる。 According to the processing method described in paragraph 10, even if the first processing liquid introduced into the container cannot sufficiently process the impurities contained in the sample, the second processing liquid introduced into the container based on user input can be used to process the impurities contained in the sample again, making it possible to appropriately process the impurities contained in the sample and recover the target substance.
 (第11項)一態様に係る制御プログラムは、コンピュータに、試料が収容された容器に、試料に含まれる夾雑物を処理するための第1の処理液を導入するステップと、第1の処理液を導入した後、ユーザによる入力に基づいて、容器に試料に含まれる夾雑物を再度処理するための第2の処理液を導入するリフレッシュ処理を実行するステップとを実行させる。 (Clause 11) A control program according to one embodiment causes a computer to execute a step of introducing a first processing liquid into a container that holds the sample, for processing impurities contained in the sample, and a step of executing a refresh process that introduces a second processing liquid into the container, for processing impurities contained in the sample again, based on a user's input, after the introduction of the first processing liquid.
 第11項に記載の制御プログラムによれば、容器に導入された第1の処理液を用いて試料に含まれる夾雑物を十分に処理できない場合でも、ユーザによる入力に基づいて容器に導入された第2の処理液を用いて試料に含まれる夾雑物を再度処理することができるため、試料に含まれる夾雑物を適切に処理して対象物質を回収することができる。 According to the control program described in paragraph 11, even if the first processing liquid introduced into the container cannot sufficiently treat the impurities contained in the sample, the second processing liquid introduced into the container based on user input can be used to re-treat the impurities contained in the sample, making it possible to appropriately treat the impurities contained in the sample and recover the target substance.
 今回開示された実施の形態は、すべての点で例示であって制限的なものではないと考えられるべきである。本発明の範囲は、上記した実施の形態の説明ではなくて請求の範囲によって示され、請求の範囲と均等の意味および範囲内でのすべての変更が含まれることが意図される。 The embodiments disclosed herein should be considered in all respects as illustrative and not restrictive. The scope of the present invention is indicated by the claims, not by the description of the embodiments above, and is intended to include all modifications within the meaning and scope of the claims.
 1 処理装置、10 精製器、11,12,13,14,15,16,17,18,19,20,21,22,23 配管、31,32,33 ポンプ、41,42,43 電磁弁、50 容器、51 処理部、52 オーバーフロー部、55 排出口、61,62,63,64 ポート、71 スターラ、72 撹拌子、80 排出管、110 濾過部、210 分解液リザーバ、220 重液リザーバ、230 リンス液リザーバ、240,250,260 廃液リザーバ、300 ストレーナ、500 制御装置、501 演算装置、502 メモリ、503 通信装置、504 表示装置、505 入力装置、506 データ読取装置、507 記録媒体、510 ストレージ、511 制御プログラム、512 制御用データ。 1 Processing device, 10 Purifier, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23 Piping, 31, 32, 33 Pump, 41, 42, 43 Solenoid valve, 50 Container, 51 Processing device, 52 Overflow device, 55 Discharge port, 61, 62, 63, 64 Port, 71 Stirrer, 72 Stirring bar, 80 Discharge pipe, 110 Filtration device, 210 Minutes Solution reservoir, 220 heavy liquid reservoir, 230 rinse liquid reservoir, 240, 250, 260 waste liquid reservoir, 300 strainer, 500 control device, 501 calculation device, 502 memory, 503 communication device, 504 display device, 505 input device, 506 data reading device, 507 recording medium, 510 storage, 511 control program, 512 control data.

Claims (11)

  1.  試料を処理して対象物質を回収するための処理装置であって、
     前記試料を収容する容器と、
     前記容器に収容された前記試料から前記対象物質を抽出する制御装置と、
     ユーザからの入力を受け付ける入力装置とを備え、
     前記制御装置は、
     前記試料が収容された前記容器に、前記試料に含まれる夾雑物を処理するための第1の処理液を導入し、
     前記第1の処理液を導入した後、前記入力装置への入力に基づいて、前記容器に前記試料に含まれる前記夾雑物を再度処理するための第2の処理液を導入するリフレッシュ処理を実行する、処理装置。
    A processing device for processing a sample to recover a target substance, comprising:
    A container for containing the sample;
    a control device that extracts the target substance from the sample contained in the container;
    an input device for receiving an input from a user;
    The control device includes:
    introducing a first processing solution for processing impurities contained in the sample into the container containing the sample;
    A processing device that, after introducing the first processing liquid, performs a refresh process of introducing a second processing liquid into the container for re-processing the impurities contained in the sample based on an input to the input device.
  2.  前記制御装置は、前記リフレッシュ処理において、前記第1の処理液を用いた前記夾雑物の処理によって生じた廃液を排出した後に、前記容器に前記第2の処理液を導入する、請求項1に記載の処理装置。 The processing device according to claim 1, wherein the control device, in the refresh process, introduces the second processing liquid into the container after discharging waste liquid generated by processing the impurities using the first processing liquid.
  3.  前記制御装置は、前記リフレッシュ処理を複数回実行可能である、請求項1または請求項2に記載の処理装置。 The processing device according to claim 1 or 2, wherein the control device is capable of executing the refresh process multiple times.
  4.  前記制御装置は、前記容器に前記第1の処理液を複数回に分けて導入する、請求項1または請求項2に記載の処理装置。 The processing device according to claim 1 or 2, wherein the control device introduces the first processing liquid into the container in multiple batches.
  5.  前記制御装置は、前記容器に前記第2の処理液を複数回に分けて導入する、請求項1または請求項2に記載の処理装置。 The processing device according to claim 1 or 2, wherein the control device introduces the second processing liquid into the container in multiple batches.
  6.  前記容器に導入される前記第2の処理液の量は、前記容器に導入された前記第1の処理液の量以下である、請求項1または請求項2に記載の処理装置。 The treatment device according to claim 1 or claim 2, wherein the amount of the second treatment liquid introduced into the container is equal to or less than the amount of the first treatment liquid introduced into the container.
  7.  前記容器に導入される前記第2の処理液の濃度は、前記容器に導入された前記第1の処理液の濃度以下である、請求項1または請求項2に記載の処理装置。 The treatment device according to claim 1 or 2, wherein the concentration of the second treatment liquid introduced into the container is equal to or lower than the concentration of the first treatment liquid introduced into the container.
  8.  前記容器は、前記容器に収容された前記試料に含まれる前記夾雑物の処理状況を外部から視認可能な透過率を有する、請求項1または請求項2に記載の処理装置。 The processing device according to claim 1 or 2, wherein the container has a transmittance that allows the processing status of the impurities contained in the sample contained in the container to be visually observed from the outside.
  9.  前記対象物質は、マイクロプラスチックである、請求項1または請求項2に記載の処理装置。 The processing device according to claim 1 or claim 2, wherein the target substance is microplastics.
  10.  コンピュータの制御に従って試料を処理して対象物質を回収するための処理方法であって、
     前記試料が収容された容器に、前記試料に含まれる夾雑物を処理するための第1の処理液を導入するステップと、
     前記第1の処理液を導入した後、ユーザによる入力に基づいて、前記容器に前記試料に含まれる前記夾雑物を再度処理するための第2の処理液を導入するリフレッシュ処理を実行するステップとを含む、処理方法。
    1. A method for recovering a substance of interest by processing a sample under computer control, comprising:
    A step of introducing a first processing solution into a container containing the sample for processing impurities contained in the sample;
    and after introducing the first processing liquid, performing a refresh process of introducing a second processing liquid into the container for re-processing the impurities contained in the sample based on input from a user.
  11.  試料を処理して対象物質を回収するための制御プログラムであって、
     前記制御プログラムは、コンピュータに、
     前記試料が収容された容器に、前記試料に含まれる夾雑物を処理するための第1の処理液を導入するステップと、
     前記第1の処理液を導入した後、ユーザによる入力に基づいて、前記容器に前記試料に含まれる前記夾雑物を再度処理するための第2の処理液を導入するリフレッシュ処理を実行するステップとを実行させる、制御プログラム。
    a control program for processing a sample to recover a substance of interest,
    The control program includes:
    introducing a first processing solution into a container containing the sample for processing impurities contained in the sample;
    and after introducing the first processing liquid, performing a refresh process of introducing a second processing liquid into the container to re-process the impurities contained in the sample based on input from a user.
PCT/JP2022/038156 2022-10-13 2022-10-13 Processing device, processing method, and control program WO2024079836A1 (en)

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