WO2024070371A1 - Composition, optical filter, and solid-state imaging element - Google Patents
Composition, optical filter, and solid-state imaging element Download PDFInfo
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- WO2024070371A1 WO2024070371A1 PCT/JP2023/030666 JP2023030666W WO2024070371A1 WO 2024070371 A1 WO2024070371 A1 WO 2024070371A1 JP 2023030666 W JP2023030666 W JP 2023030666W WO 2024070371 A1 WO2024070371 A1 WO 2024070371A1
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- ATCZONOLUJITKL-UHFFFAOYSA-N dicyclohexyl bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylate Chemical compound C1=CC2CC1C(C(=O)OC1CCCCC1)C2C(=O)OC1CCCCC1 ATCZONOLUJITKL-UHFFFAOYSA-N 0.000 description 1
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- IEPRKVQEAMIZSS-AATRIKPKSA-N diethyl fumarate Chemical compound CCOC(=O)\C=C\C(=O)OCC IEPRKVQEAMIZSS-AATRIKPKSA-N 0.000 description 1
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- UMIKAXKFQJWKCV-UHFFFAOYSA-M diphenyliodanium;4-methylbenzenesulfonate Chemical compound CC1=CC=C(S([O-])(=O)=O)C=C1.C=1C=CC=CC=1[I+]C1=CC=CC=C1 UMIKAXKFQJWKCV-UHFFFAOYSA-M 0.000 description 1
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 1
- VQHHOXOLUXRQFQ-UHFFFAOYSA-L dipotassium;4,5,6,7-tetrachloro-2',4',5',7'-tetraiodo-3-oxospiro[2-benzofuran-1,9'-xanthene]-3',6'-diolate Chemical compound [K+].[K+].O1C(=O)C(C(=C(Cl)C(Cl)=C2Cl)Cl)=C2C21C1=CC(I)=C([O-])C(I)=C1OC1=C(I)C([O-])=C(I)C=C21 VQHHOXOLUXRQFQ-UHFFFAOYSA-L 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- UJKTWIYIDOPXOI-UHFFFAOYSA-L disodium 2-carboxy-4-[[4-[4-[(3-carboxy-4-oxidophenyl)diazenyl]-3-methylphenyl]-2-methylphenyl]diazenyl]phenolate Chemical compound [Na+].[Na+].CC1=CC(=CC=C1N=NC1=CC(C([O-])=O)=C(O)C=C1)C1=CC=C(N=NC2=CC=C(O)C(=C2)C([O-])=O)C(C)=C1 UJKTWIYIDOPXOI-UHFFFAOYSA-L 0.000 description 1
- DSARWKALPGYFTA-UHFFFAOYSA-L disodium 4-hydroxy-7-[(5-hydroxy-6-phenyldiazenyl-7-sulfonatonaphthalen-2-yl)carbamoylamino]-3-phenyldiazenylnaphthalene-2-sulfonate Chemical compound [Na+].[Na+].[O-]S(=O)(=O)C1=CC2=CC(NC(=O)NC=3C=C4C=C(C(N=NC=5C=CC=CC=5)=C(O)C4=CC=3)S([O-])(=O)=O)=CC=C2C(O)=C1N=NC1=CC=CC=C1 DSARWKALPGYFTA-UHFFFAOYSA-L 0.000 description 1
- RAGZEDHHTPQLAI-UHFFFAOYSA-L disodium;2',4',5',7'-tetraiodo-3-oxospiro[2-benzofuran-1,9'-xanthene]-3',6'-diolate Chemical compound [Na+].[Na+].O1C(=O)C2=CC=CC=C2C21C1=CC(I)=C([O-])C(I)=C1OC1=C(I)C([O-])=C(I)C=C21 RAGZEDHHTPQLAI-UHFFFAOYSA-L 0.000 description 1
- KGGOIDKBHYYNIC-UHFFFAOYSA-N ditert-butyl 4-[3,4-bis(tert-butylperoxycarbonyl)benzoyl]benzene-1,2-dicarboperoxoate Chemical compound C1=C(C(=O)OOC(C)(C)C)C(C(=O)OOC(C)(C)C)=CC=C1C(=O)C1=CC=C(C(=O)OOC(C)(C)C)C(C(=O)OOC(C)(C)C)=C1 KGGOIDKBHYYNIC-UHFFFAOYSA-N 0.000 description 1
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- VYXSBFYARXAAKO-UHFFFAOYSA-N ethyl 2-[3-(ethylamino)-6-ethylimino-2,7-dimethylxanthen-9-yl]benzoate;hydron;chloride Chemical compound [Cl-].C1=2C=C(C)C(NCC)=CC=2OC2=CC(=[NH+]CC)C(C)=CC2=C1C1=CC=CC=C1C(=O)OCC VYXSBFYARXAAKO-UHFFFAOYSA-N 0.000 description 1
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- 238000002474 experimental method Methods 0.000 description 1
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- 239000000706 filtrate Substances 0.000 description 1
- 239000012847 fine chemical Substances 0.000 description 1
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- WTPOYMNMKZIOGO-UHFFFAOYSA-K trisodium;2,5-dichloro-4-[4-[[5-[[4-chloro-6-(4-sulfonatoanilino)-1,3,5-triazin-2-yl]amino]-2-sulfonatophenyl]diazenyl]-3-methyl-5-oxo-4h-pyrazol-1-yl]benzenesulfonate Chemical compound [Na+].[Na+].[Na+].CC1=NN(C=2C(=CC(=C(Cl)C=2)S([O-])(=O)=O)Cl)C(=O)C1N=NC(C(=CC=1)S([O-])(=O)=O)=CC=1NC(N=1)=NC(Cl)=NC=1NC1=CC=C(S([O-])(=O)=O)C=C1 WTPOYMNMKZIOGO-UHFFFAOYSA-K 0.000 description 1
- BWHDROKFUHTORW-UHFFFAOYSA-N tritert-butylphosphane Chemical compound CC(C)(C)P(C(C)(C)C)C(C)(C)C BWHDROKFUHTORW-UHFFFAOYSA-N 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- JXUKQCUPTNLTCS-UHFFFAOYSA-N vat green 1 Chemical group C1=CC=C[C]2C(=O)C(C3=C45)=CC=C4C(C4=C67)=CC=C7C(=O)[C]7C=CC=CC7=C6C=C(OC)C4=C5C(OC)=CC3=C21 JXUKQCUPTNLTCS-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229940042596 viscoat Drugs 0.000 description 1
- 125000001834 xanthenyl group Chemical group C1=CC=CC=2OC3=CC=CC=C3C(C12)* 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D471/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00
- C07D471/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00 in which the condensed system contains two hetero rings
- C07D471/06—Peri-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B57/00—Other synthetic dyes of known constitution
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
- C09B67/006—Preparation of organic pigments
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
Definitions
- the present invention relates to a composition, an optical filter, and a solid-state imaging device.
- an optical filter used in displays such as liquid crystal displays, electroluminescent displays, and plasma displays, and in solid-state imaging devices such as CCD and CMOS sensors, is a filter that absorbs near-infrared radiation.
- a material for producing such filters that absorb near-infrared radiation for example, a composition containing a near-infrared absorbing dye such as a compound having a cyanine structure is known (for example, Patent Document 1).
- the present invention aims to provide a composition that can form an optical filter with reduced aggregates.
- the present invention also aims to provide a compound that can be used to prepare such a composition, and a simple method for producing the compound.
- the composition, wherein the near infrared absorbing dye comprises a compound represented by formula (I):
- R 1 , R 4 , R 5 , and R 8 each independently represent a hydrocarbon group having 1 to 20 carbon atoms, a halogen atom, or an OR 11 group;
- R 2 , R 3 , R 6 and R 7 each independently represent a hydrogen atom, a halogen atom or an OR 11 group;
- R 9 , R 10 , and R 11 each independently represent a hydrocarbon group having 1 to 20 carbon atoms;
- X 1 to X 4 each independently represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms;
- Y 1 to Y 8 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an OR 12 group;
- R 12 represents an alkyl group having 1 to 5 carbon atoms, and when two or more R 12 are present, they may be the same or different.
- R 1a , R 4a , R 5a , and R 8a each independently represent a halogen atom
- R 2a , R 3a , R 6a , and R 7a each independently represent a hydrogen atom, a halogen atom, or OR 11a group
- R 9 and R 10 each independently represent a hydrocarbon group having 1 to 20 carbon atoms
- R 11a represents a hydrocarbon group having 1 to 13 carbon atoms, and when two or more R 11a are present, They may be the same or different from each other
- X 1 to X 4 each independently represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms
- Y 1 to Y 8 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an OR 12 group
- R 12 represents an alkyl group having 1 to 5 carbon atoms, and when two or more R 12 are present, they may be the same or different.
- a method for producing a compound represented by formula (I), comprising a step of reacting a compound represented by formula (I-x1), a compound represented by formula (I-x2), and a compound represented by formula (I-y1) or a compound represented by formula (I-y2) in the presence of a catalyst.
- R 1 , R 4 , R 5 , and R 8 each independently represent a hydrocarbon group having 1 to 20 carbon atoms, a halogen atom, or an OR 11 group
- R 2 , R 3 , R 6 and R 7 each independently represent a hydrogen atom, a halogen atom or an OR 11 group
- R 9 , R 10 , and R 11 each independently represent a hydrocarbon group having 1 to 20 carbon atoms
- X 1 to X 4 each independently represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms
- Y 1 , Y 4 , Y 5 , and Y 8 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an OR 12 group
- R 12 represents an alkyl group having 1 to 5 carbon atoms, and when two or more R 12 are present, they may be the same
- Y 2 , Y 3 , Y 6 , and Y 7 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an OR 12 group;
- a 1 and A 2 each independently represent a hydroxyl group, a hydrocarbon group having 1 to 20 carbon atoms, or an OR 13 group;
- R 13 represents a hydrocarbon having 1 to 20 carbon atoms, and when two or more R 13 are present, they may be the same or different from each other; OR 13 groups bonded to the same boron atom may be bonded to each other to form a ring.
- R 1 to R 10 , X 1 to X 4 , and Y 1 to Y 8 are as defined above.
- the present invention provides a composition capable of forming an optical filter with reduced aggregates.
- the present invention also provides an optical filter with reduced aggregates, and a solid-state imaging device including the optical filter. Furthermore, the present invention provides a compound that can be used to prepare the composition, and a simple (more specifically, a simple method for producing the compound with a small number of steps).
- FIG. 1 is a schematic diagram showing an embodiment of a solid-state imaging device.
- composition contains a near-infrared absorbing dye, an alkali-soluble resin, and a solvent (hereinafter, these may be referred to as the near-infrared absorbing dye (A1), the resin (B), and the solvent (E), respectively).
- the composition may further contain one or more of a polymerizable compound, a polymerization initiator, and a leveling agent (hereinafter, these may be referred to as the polymerizable compound (C), the polymerization initiator (D), and the leveling agent (F), respectively).
- the compounds exemplified as each component may be used alone or in combination, unless otherwise specified.
- the composition according to this aspect contains a compound represented by formula (I) described below as a near-infrared absorbing dye, and therefore aggregates caused by the near-infrared absorbing dye are unlikely to occur even when the composition is formed into a film. Therefore, the composition according to this aspect can form an optical filter with reduced aggregates.
- the optical filter thus formed is excellent in light resistance.
- the compound represented by formula (I) absorbs a specific wavelength in the near-infrared region, the optical filter thus formed can be used as a near-infrared cut filter or a near-infrared transmission filter.
- the near-infrared absorbing dye means a dye that absorbs wavelengths in the near-infrared region (781 nm to 3 ⁇ m).
- the near-infrared absorbing dye (A1) contains one or more compounds represented by formula (I).
- the near-infrared absorbing dye (A1) may consist of a compound represented by formula (I).
- R 1 , R 4 , R 5 , and R 8 each independently represent a hydrocarbon group having 1 to 20 carbon atoms, a halogen atom, or an OR 11 group.
- R 1 , R 4 , R 5 , and R 8 are preferably a halogen atom or an OR 11 group, and more preferably a chlorine atom or an OR 11 group.
- Examples of the hydrocarbon group having 1 to 20 carbon atoms represented by R 1 , R 4 , R 5 , or R 8 include aliphatic hydrocarbon groups and aromatic hydrocarbon groups.
- the aliphatic hydrocarbon group may be saturated or unsaturated, and may be linear or alicyclic.
- Examples of the saturated or unsaturated chain hydrocarbon group represented by R 1 , R 4 , R 5 , or R 8 include linear alkyl groups such as methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, undecyl, dodecyl, tridecyl, tetradecyl, pentadecyl, hexadecyl, heptadecyl, octadecyl, nonadecyl, and icosyl groups; isopropyl, (1-methyl)propyl, (1-ethyl)propyl, isobutyl, sec-butyl, tert-butyl, (1-ethyl)butyl, (2-ethyl)butyl, (1-propyl)butyl, isopentyl, neopentyl,
- the number of carbon atoms in the saturated chain hydrocarbon group is preferably 1 to 18, more preferably 2 to 15, and even more preferably 3 to 12.
- the number of carbon atoms in the unsaturated chain hydrocarbon group is preferably 2 to 18, more preferably 2 to 15, and even more preferably 3 to 12.
- Examples of the saturated or unsaturated alicyclic hydrocarbon group represented by R 1 , R 4 , R 5 , or R 8 include cycloalkyl groups such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, and cyclooctyl groups; cycloalkenyl groups such as cyclohexenyl groups (e.g., cyclohex-2-ene, cyclohex-3-ene), cycloheptenyl, and cyclooctenyl groups; norbornyl, adamantyl, and bicyclo[2.2.2]octyl groups.
- the number of carbon atoms in the saturated or unsaturated alicyclic hydrocarbon group is preferably 3 to 15, and more preferably 3 to 12.
- Examples of the aromatic hydrocarbon group represented by R 1 , R 4 , R 5 , or R 8 include a phenyl group, a 1-naphthyl group, a 2-naphthyl group, a phenanthryl group, an anthryl group, a pyrenyl group, etc.
- the aromatic hydrocarbon group preferably has 6 to 15 carbon atoms, more preferably 6 to 12 carbon atoms.
- the hydrocarbon group represented by R 1 , R 4 , R 5 , or R 8 may be a group obtained by combining two or more of the above-mentioned chain hydrocarbon groups, alicyclic hydrocarbon groups, and aromatic hydrocarbon groups, so long as the upper limit of the carbon number is not more than 20.
- Such a group may be, for example, a group obtained by combining an aromatic hydrocarbon group with at least one group selected from a chain hydrocarbon group, an alicyclic hydrocarbon group, and an aromatic hydrocarbon group, and in such a combined hydrocarbon group, the chain hydrocarbon group may be combined as a divalent group (for example, an alkanediyl group).
- Examples of the combined hydrocarbon groups include aralkyl groups such as benzyl group, phenethyl group, 1-methyl-1-phenylethyl group, tert-butylphenyl group, tert-octylphenyl group, tert-butylbenzyl group, and tert-octylbenzyl group; arylalkenyl groups such as phenylethenyl group (phenylvinyl group); arylalkynyl groups such as phenylethynyl group; o-tolyl group, m-tolyl group, p-tolyl group, 2-ethylphenyl group, 3-ethylphenyl group, 4-ethylphenyl group, 2,3-dimethylphenyl group, 2,4-dimethylphenyl group, 2,5-dimethylphenyl group, 2,6-dimethylphenyl group, 2,7-dimethylphenyl group, 2,
- the hydrocarbon group may be, for example, a hydrocarbon group formed by combining a chain hydrocarbon group and an alicyclic hydrocarbon group, and examples thereof include a 1-methylcyclopropyl group, a 1-methylcyclohexyl group, a 2-methylcyclohexyl group, a 3-methylcyclohexyl group, a 4-methylcyclohexyl group, a 1,2-dimethylcyclohexyl group, a 1,3-dimethylcyclohexyl group, a 1,4-dimethylcyclohexyl group, a 2,3-dimethylcyclohexyl group, a 2,4-dimethylcyclohexyl group, a 2,5-dimethylcyclohexyl group, a 2,6-dimethylcyclohexyl group, a 3,4-dimethylcyclohexyl group, a 3,5-dimethylcyclohexyl group, a 2,2-dimethylcyclohexyl group
- alkyl groups having one or more alicyclic hydrocarbon groups bonded thereto such as a cyclopropylmethyl group, a cyclopropylethyl group, a cyclobutylmethyl group, a cyclobutylethyl group, a cyclopentylmethyl group, a cyclopentylethyl group, a cyclohexylmethyl group, a 2-methylcyclohexylmethyl group, a cyclohexylethyl group, and an adamantylmethyl group.
- the number of carbon atoms in a group consisting of two or more of a chain hydrocarbon group, an alicyclic hydrocarbon group, and an aromatic hydrocarbon group is preferably 6 to 18 or 7 to 18, and more preferably 6 to 15 or 7 to 15.
- the halogen atom represented by R 1 , R 4 , R 5 or R 8 may be, for example, a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
- the halogen atom is preferably a chlorine atom.
- R 11 represents a hydrocarbon group having 1 to 20 carbon atoms. When two or more R 11 are present in formula (I), they may be the same or different from each other. Examples of the hydrocarbon group having 1 to 20 carbon atoms represented by R 11 include the groups exemplified as the hydrocarbon group having 1 to 20 carbon atoms represented by R 1 , R 4 , R 5 , or R 8.
- the hydrocarbon group having 1 to 20 carbon atoms is preferably an aromatic hydrocarbon group, more preferably a phenyl group, a tolyl group, a methoxyphenyl group, a propoxyphenyl group, a tert-butylphenyl group, or a tert-octylphenyl group, and most preferably a propoxyphenyl group or a tert-butylphenyl group.
- the number of carbon atoms in the hydrocarbon group is preferably 6 to 15, more preferably 6 to 12, and even more preferably 6 to 10.
- R 2 , R 3 , R 6 and R 7 each independently represent a hydrogen atom, a halogen atom or an OR 11 group.
- R 11 is as defined above.
- R 2 , R 3 , R 6 and R 7 are preferably halogen atoms.
- the halogen atom represented by R 2 , R 3 , R 6 or R 7 may be, for example, a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
- R 9 and R 10 each independently represent a hydrocarbon group having 1 to 20 carbon atoms.
- the hydrocarbon group having 1 to 20 carbon atoms represented by R 9 or R 10 include the groups exemplified as the hydrocarbon group having 1 to 20 carbon atoms represented by R 1 , R 4 , R 5 or R 8.
- Examples of the hydrocarbon group having 1 to 20 carbon atoms include the groups represented by the following formulae (D-1) to (D-47) or formulae (G-1) to (G-24). In the formulae, * represents a bond.
- X 1 to X 4 each independently represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms. X 1 to X 4 are preferably a hydrogen atom.
- Examples of the alkyl group having 1 to 10 carbon atoms represented by X 1 to X 4 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, an n-pentyl group, a neopentyl group, a tert-pentyl group, an n-hexyl group, a cyclohexyl group, an n-heptyl group, a 2-ethylhexyl group, an n-octyl group, an n-nonyl group, and an n-decyl group.
- Y 1 to Y 8 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an OR 12 group. Y 1 to Y 8 are preferably a hydrogen atom.
- Examples of the alkyl group having 1 to 5 carbon atoms represented by Y 1 to Y 8 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, an s-butyl group, a t-butyl group, and an n-pentyl group.
- R 12 represents an alkyl group having 1 to 5 carbon atoms. When two or more R 12 are present in formula (I), they may be the same or different from each other. Examples of the alkyl group having 1 to 5 carbon atoms represented by R 12 include the groups exemplified as the alkyl group having 1 to 5 carbon atoms represented by Y 1 to Y 8 .
- the compound represented by formula (I) is preferably a compound represented by formula (Ia).
- R 9 , R 10 , X 1 to X 4 , and Y 1 to Y 8 are as defined above.
- R 1a , R 4a , R 5a and R 8a each independently represent a halogen atom.
- the halogen atom may be, for example, a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
- R 2a , R 3a , R 6a and R 7a each independently represent a hydrogen atom, a halogen atom or an OR 11a group.
- R 2a , R 3a , R 6a and R 7a are preferably halogen atoms.
- the halogen atom may be, for example, a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
- R 11a represents a hydrocarbon group having 1 to 13 carbon atoms, and when two or more R 11a are present, they may be the same or different from each other.
- the hydrocarbon group having 1 to 13 carbon atoms include alkyl groups such as methyl, ethyl, propyl, butyl, hexyl, octyl, and dodecyl; aryl groups such as phenyl, o-tolyl, m-tolyl, p-tolyl, 2,4,6-trimethylphenyl, and naphthyl; and aralkyl groups such as benzyl and phenethyl.
- the hydrocarbon group having 1 to 13 carbon atoms may be, for example, a propoxyphenyl group or a tert-butylphenyl group.
- the number of carbon atoms in the hydrocarbon group is preferably 1 to 10, and more preferably 1 to 9.
- the compound represented by formula (I) include a compound represented by the following formula:
- the compound represented by the following formula is a compound represented by formula (I) in which R 1 to R 8 are chlorine atoms, X 1 to X 4 and Y 1 to Y 8 are hydrogen atoms, and R 9 and R 10 are diisopropylphenyl groups.
- the compound represented by the following formula is a compound represented by formula (I) in which R 1 , R 4 , R 5 , and R 8 are 4-propoxyphenoxy groups, R 2 , R 3 , R 6 , and R 7 are hydrogen atoms, X 1 to X 4 and Y 1 to Y 8 are hydrogen atoms, and R 9 and R 10 are 3-ethylhexyl groups.
- the compound represented by the following formula is a compound represented by formula (I) in which R 1 to R 8 are each independently a 4-tert-butylphenoxy group or a chlorine atom, X 1 to X 4 and Y 1 to Y 8 are hydrogen atoms, and R 9 and R 10 are diisopropylphenyl groups.
- the compound represented by the following formula is a compound represented by formula (I) in which R 1 , R 4 , R 5 , and R 8 are 4-tert-butylphenoxy groups, R 2 , R 3 , R 6 , and R 7 are hydrogen atoms, X 1 to X 4 and Y 1 to Y 8 are hydrogen atoms, and R 9 and R 10 are diisopropylphenyl groups.
- the compound represented by formula (I) is a compound that absorbs specific wavelengths in the near-infrared region.
- the compound represented by formula (I) is a compound that transmits specific wavelengths in the near-infrared region. Therefore, an optical filter formed from a composition containing the compound represented by formula (I) can be used as a near-infrared cut filter or a near-infrared transmittance filter depending on the absorption wavelength.
- the absorption wavelength in the near infrared region of the compound represented by formula (I) is not particularly limited, but for example, the compound represented by formula (I) may have an absorption maximum in the range of 800 nm to 1400 nm.
- the compound represented by formula (I) has high absorption in the visible region.
- the absorbance at a wavelength of 780 nm is expressed as Abs(780)
- the absorbance at a wavelength (maximum absorption wavelength ⁇ max ) showing the maximum value of absorbance in the wavelength range of 300 to 1400 nm is expressed as Abs( ⁇ max )
- the ratio Abs(780)/Abs( ⁇ max ) is preferably 0.50 or more, 0.60 or more, 0.70 or more, or 0.75 or more.
- Abs(780)/Abs( ⁇ max ) may be, for example, 1.0 or less. Since 780 nm is the upper limit wavelength of the visible region, it can be said that the higher the ratio, the more suitable it is for use in a near-infrared transmission filter. Furthermore, when the maximum absorbance in the wavelength range of 900 to 1400 nm is represented as Abs(900-1400), the ratio of Abs(900-1400) to Abs( ⁇ max ), Abs(900-1400)/Abs( ⁇ max ), is preferably 0.3 or less, 0.25 or less, 0.20 or less, or 0.15 or less. Abs(900-1400)/Abs( ⁇ max ) may be, for example, 0.01 or more, or 0.03 or more. The smaller this value is, the higher the transmittance in the near-infrared region, and the more suitable it is for use in a near-infrared transmission filter.
- the absorbance of the compound represented by formula (I) is a value measured using an ultraviolet-visible-near infrared absorption spectrometer (V-770, manufactured by JASCO Corporation).
- V-770 ultraviolet-visible-near infrared absorption spectrometer
- the compound represented by formula (I) is dissolved in a solvent so that its concentration becomes 10 ppm, and the absorbance can be measured in the wavelength range of 300 to 1400 nm (data sampling interval 1 nm).
- a solvent for example, propylene glycol monomethyl ether acetate or chloroform can be used as the solvent.
- the absorbance is hardly affected by the resin (B), polymerizable compound (C), polymerization initiator (D), dispersant, etc. described below.
- composition in which the compound represented by formula (I) is mixed with these components is diluted with a solvent so that the concentration of the compound represented by formula (I) becomes 10 ppm, and the absorbance of this solution is measured, and the obtained absorbance can be regarded as the absorbance of the compound represented by formula (I).
- the compound represented by formula (I) may be produced according to a conventionally known method, or may be produced according to a production method according to one aspect of the present invention described below.
- the content of the near-infrared absorbing dye (A1) may be 0.5 to 60 mass%, 2 to 60 mass%, 4 to 55 mass%, or 6 to 50 mass% of the total amount of solids in the composition.
- the "total amount of solids” refers to the total amount of components excluding the solvent from the composition.
- the total amount of solids and the content of each component relative to the total amount of solids can be measured by known analytical means such as liquid chromatography and gas chromatography.
- the composition does not need to contain any near-infrared absorbing dye other than the compound represented by formula (I).
- the composition of the present invention may further contain a colorant other than the near infrared absorbing dye (A1) (hereinafter, also referred to as colorant (A2)).
- the colorant (A2) may be a dye or a pigment.
- Dyes include, for example, compounds classified as having a hue other than pigments in the Color Index (published by The Society of Dyers and Colourists), and known dyes described in Dyeing Notes (Shikisensha Co., Ltd.). Xanthene dyes are preferred as dyes.
- Xanthene dyes are dyes containing a compound having a xanthene skeleton.
- xanthene dyes include C.I. Acid Red 51, 52, 87, 92, 94, 289, and 388; C.I. Acid Violet 9, 30, and 102; C.I. Basic Red 1 (Rhodamine 6G), 2, 3, 4, 8, 10, and 11; C.I. Basic Violet 10 (Rhodamine B) and 11; C.I. Solvent Red 218; C.I. Mordant Red 27; C.I.
- Reactive Red 36 (Rose Bengal B); Sulforhodamine G; xanthene dyes described in JP-A-2010-32999; and xanthene dyes described in JP-A-4492760.
- the xanthene dye is preferably a xanthene dye that is soluble in an organic solvent.
- xanthene dye commercially available xanthene dyes such as "Chugai AminoL Fast Pink R-H/C” manufactured by Chugai Chemical Industry Co., Ltd. and “Rhodamin 6G” manufactured by Taoka Chemical Co., Ltd. can be used.
- xanthene dye a xanthene dye synthesized according to the method described in JP-A-2010-32999 using a commercially available xanthene dye as a starting material can also be used.
- dyes that may be used include known azo dyes, cyanine dyes, triphenylmethane dyes, thiazole dyes, oxazine dyes, phthalocyanine dyes, quinophthalone dyes, anthraquinone dyes, naphthoquinone dyes, quinoneimine dyes, methine dyes, azomethine dyes, squarylium dyes, acridine dyes, styryl dyes, coumarin dyes, quinoline dyes, nitro dyes, etc.
- examples of such dyes include C.I. solvent dyes, C.I. acid dyes, C.I. direct dyes, C.I. disperse dyes, C.I. basic dyes, C.I. reactive dyes, C.I. mordant dyes, and C.I. vat dyes.
- C.I. Solvent dyes include, for example, C.I. Solvent Yellow 4, 14, 15, 23, 24, 38, 62, 63, 68, 82, 94, 98, 99, 117, 162, 163, 167, and 189; C.I. Solvent Red 45, 49, 111, 125, 130, 143, 145, 146, 150, 151, 155, 168, 169, 172, 175, 181, 207, 222, 227, 230, 245, and 247; C.I. Solvent Orange 2, 7, 11, 15, 26, 56, 77, and 86; C.I. C.I. Solvent Violet 11, 13, 14, 26, 31, 36, 37, 38, 45, 47, 48, 51, 59, and 60; C.I.
- Solvent Blue 4 5, 14, 18, 35, 36, 37, 45, 58, 59, 59:1, 63, 67, 68, 69, 70, 78, 79, 83, 90, 94, 97, 98, 100, 101, 102, 104, 105, 111, 112, 122, 128, 132, 136, and 139; and C.I. Solvent Green 1, 3, 4, 5, 7, 28, 29, 32, 33, 34, and 35.
- C.I. Acid dyes include, for example, C.I. Acid Yellow 1, 3, 7, 9, 11, 17, 23, 25, 29, 34, 36, 38, 40, 42, 54, 65, 72, 73, 76, 79, 98, 99, 111, 112, 113, 114, 116, 119, 123, 128, 134, 135, 138, 139, 140, 144, 150, 155, 157 , 160, 161, 163, 168, 169, 172, 177, 178, 179, 184, 190, 193, 196, 197, 199, 202, 203, 204, 205, 207, 212, 214, 220, 221, 228, 230, 232, 235, 238, 240, 242, 243, and 251; C.I.
- C.I. direct dyes include, for example, C.I. Direct Yellow 2, 33, 34, 35, 38, 39, 43, 47, 50, 54, 58, 68, 69, 70, 71, 86, 93, 94, 95, 98, 102, 108, 109, 129, 136, 138, and 141; C.I. C.I.
- C.I. Disperse dyes include, for example, C.I. Disperse Yellow 51, 54, and 76; C.I. Disperse Violet 26 and 27; and C.I. Disperse Blue 1, 14, 56, and 60.
- C.I. Basic dyes include, for example, C.I. Basic Blue 1, 3, 5, 7, 9, 19, 21, 22, 24, 25, 26, 28, 29, 40, 41, 45, 47, 54, 58, 59, 60, 64, 65, 66, 67, 68, 81, 83, 88, and 89; C.I. Basic Violet 2; C.I. Basic Red 9; and C.I. Basic Green 1.
- C.I. reactive dyes include, for example, C.I. Reactive Yellow 2, 76, and 116; C.I. Reactive Orange 16; and C.I. Reactive Red 36.
- C.I. Mordant dyes include, for example, C.I. Mordant Yellow 5, 8, 10, 16, 20, 26, 30, 31, 33, 42, 43, 45, 56, 61, 62, and 65; C.I. Mordant Red 1, 2, 3, 4, 9, 11, 12, 14, 17, 18, 19, 22, 23, 24, 25, 26, 29, 30, 32, 33, 36, 37, 38, 39, 41, 42, 43, 45, 46, 48, 52, 53, 56, 62, 63, 71, 74, 76, 78, 85, 86, 88, 90, 94, and 95; C.I. C.I. Mordant Orange 3, 4, 5, 8, 12, 13, 14, 20, 21, 23, 24, 28, 29, 32, 34, 35, 36, 37, 42, 43, 47, and 48; C.I.
- Mordant Violet 1 1:1, 2, 3, 4, 5, 6, 7, 8, 10, 11, 14, 15, 16, 17, 18, 19, 21, 22, 23, 24, 27, 28, 30, 31, 32, 33, 36, 37, 39, 40, 41, 44, 45, 47, 48, 49, 53, and 58; C.I. Mordant Blue 1, 2, 3, 7, 8, 9, 12, 13, 15, 16, 19, 20, 21, 22, 23, 24, 26, 30, 31, 32, 39, 40, 41, 43, 44, 48, 49, 53, 61, 74, 77, 83, and 84; and C.I. Mordant Green 1, 3, 4, 5, 10, 13, 15, 19, 21, 23, 26, 29, 31, 33, 34, 35, 41, 43, and .
- C.I. vat dye is C.I. Vat Green 1.
- pigments examples include those classified as pigments in the Color Index (published by the Society of Dyers and Colourists).
- Pigments include, for example, green pigments, yellow pigments, orange pigments, red pigments, blue pigments, and purple pigments.
- Green pigments include C.I. Pigment Green 7, 36, 58, and 59.
- Yellow pigments include C.I. Pigment Yellow 1, 3, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53, 83, 86, 93, 94, 109, 110, 117, 125, 128, 129, 137, 138, 139, 147, 148, 150, 153, 154, 166, 173, 185, 194, and 214.
- Orange pigments include C.I. Examples of pigments that may be used include C.I.
- Red pigments include C.I. Pigment Red 9, 97, 105, 122, 123, 144, 149, 166, 168, 176, 177, 180, 192, 209, 215, 216, 224, 242, 254, 255, 264, 265, and 269.
- Blue pigments include C.I. Pigment Blue 15, 15:3, 15:4, 15:6, and 60.
- Purple pigments include C.I. Pigment Violet 1, 19, 23, 29, 32, 36, and 38.
- a single pigment or multiple pigments may be used for each color, and multiple color pigments may be combined.
- the pigment may be subjected to a treatment such as rosin treatment, surface treatment using a pigment derivative into which an acidic or basic group has been introduced, grafting treatment to the pigment surface with a polymer compound, atomization treatment using a sulfuric acid atomization method, etc., washing treatment with an organic solvent or water to remove impurities, removal treatment of ionic impurities using an ion exchange method, etc. It is preferable that the particle size of the pigment is approximately uniform.
- the content of colorant (A2) may be, for example, 0.5 to 70% by mass, 1 to 70% by mass, 2 to 65% by mass, 5 to 60% by mass, or 7 to 55% by mass of the total amount of solids in the composition.
- the content of colorant (A2) is within the above range, it becomes easier to obtain the desired spectral characteristics.
- the near-infrared absorbing dye (A1) and pigment can be dispersed in the dispersant solution to form a dispersion in which they are uniformly dispersed.
- the near-infrared absorbing dye (A1) and pigment may be dispersed individually, or multiple types of near-infrared absorbing dyes (A1) or pigments may be mixed and dispersed.
- the amount of the dispersant used may be, for example, 10 to 200 parts by mass, 15 to 180 parts by mass, 20 to 160 parts by mass, or 80 to 160 parts by mass, per 100 parts by mass of the total of the near-infrared absorbing dye (A1) and pigment.
- the amount of the dispersant used is within the above range, when two or more types of near-infrared absorbing dyes (A1) or pigments are used, a dispersion in which the near-infrared absorbing dye (A1) or pigment is more uniformly dispersed tends to be obtained.
- Dispersants include, for example, silicone-based, fluorine-based, ester-based, cationic, anionic, nonionic, amphoteric, polyester-based, polyamine-based, and acrylic surfactants.
- Surfactants include polyoxyethylene alkyl ethers, polyoxyethylene alkyl phenyl ethers, polyethylene glycol diesters, sorbitan fatty acid esters, fatty acid modified polyesters, tertiary amine modified polyurethanes, and polyethyleneimines.
- dispersants include, for example, BYKLPN-6919 (manufactured by BYK), KP (manufactured by Shin-Etsu Chemical Co., Ltd.), FLOWRENE (manufactured by Kyoeisha Chemical Co., Ltd.), Solpers (manufactured by Zeneca Corporation), EFKA (manufactured by BASF Japan Ltd.), AJISPER (registered trademark) (manufactured by Ajinomoto Fine-Techno Co., Ltd.), and Disperbyk (manufactured by BYK-Chemie).
- Resin [K1] is a copolymer having a structural unit derived from at least one member (a) (hereinafter may be referred to as "(a)") selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic anhydrides, and a structural unit derived from a monomer (b) (hereinafter may be referred to as "(b)") having a cyclic ether structure having 2 to 4 carbon atoms and an ethylenically unsaturated bond;
- Resin [K2] is a copolymer having a structural unit derived from (a), a structural unit derived from (b), and a structural unit derived from a monomer (c) copolymerizable with (a) (however, different from (a) and (b)) (hereinafter, may be referred to as "(c)”);
- Resin [K3] is a copolymer having a structural unit derived from at least one member (a) (herein
- resin (B) is preferably a copolymer having a structural unit derived from at least one selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic anhydrides, and a structural unit derived from a monomer having a cyclic ether structure having 2 to 4 carbon atoms and an ethylenically unsaturated bond (i.e., resin K1 or K2), and more preferably resin K2.
- (a) include unsaturated monocarboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, o-, m-, and p-vinylbenzoic acid; maleic acid, fumaric acid, citraconic acid, mesaconic acid, itaconic acid, 3-vinylphthalic acid, 4-vinylphthalic acid, 3,4,5,6-tetrahydrophthalic acid, 1,2,3,6-tetrahydrophthalic acid, dimethyltetrahydrophthalic acid, and 1,4-cyclohexenedicarboxylic acid.
- unsaturated monocarboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, o-, m-, and p-vinylbenzoic acid
- maleic acid fumaric acid, citraconic acid, mesaconic acid, itaconic acid
- 3-vinylphthalic acid 4-vinylphthalic acid, 3,4,5,6-tetrahydrophthalic acid, 1,
- unsaturated dicarboxylic acids such as methyl-5-norbornene-2,3-dicarboxylic acid, 5-carboxybicyclo[2.2.1]hept-2-ene, 5,6-dicarboxybicyclo[2.2.1]hept-2-ene, 5-carboxy-5-methylbicyclo[2.2.1]hept-2-ene, 5-carboxy-5-ethylbicyclo[2.2.1]hept-2-ene, 5-carboxy-6-methylbicyclo[2.2.1]hept-2-ene, unsaturated dicarboxylic acid anhydrides such as maleic anhydride, citraconic anhydride, itaconic anhydride, 3-vinylphthalic anhydride, 4-vinylphthalic anhydride, 3,4,5,6-tetrahydrophthalic anhydride, 1,2,3,6-tetrahydrophthalic anhydride, dimethyltetrahydrophthalic anhydride, 5,6-dicarboxybicyclo[2.2.1]hept-2-
- the cyclic ether structure having 2 to 4 carbon atoms contained in monomer (b) may be, for example, at least one selected from the group consisting of an oxirane ring, an oxetane ring, and a tetrahydrofuran ring.
- (b) preferably has a cyclic ether having 2 to 4 carbon atoms and a (meth)acryloyloxy group.
- (meth)acrylic acid refers to at least one selected from the group consisting of acrylic acid and methacrylic acid
- (meth)acryloyl refers to at least one selected from the group consisting of acryloyl and methacryloyl
- (meth)acrylate refers to at least one selected from the group consisting of acrylate and methacrylate.
- (b) may be, for example, a monomer (b1) having an oxiranyl group and an ethylenically unsaturated bond (hereinafter sometimes referred to as "(b1)"), a monomer (b2) having an oxetanyl group and an ethylenically unsaturated bond (hereinafter sometimes referred to as "(b2)”), or a monomer (b3) having a tetrahydrofuryl group and an ethylenically unsaturated bond (hereinafter sometimes referred to as "(b3)").
- a monomer (b1) having an oxiranyl group and an ethylenically unsaturated bond hereinafter sometimes referred to as "(b1)
- a monomer (b2) having an oxetanyl group and an ethylenically unsaturated bond hereinafter sometimes referred to as "(b2)
- (b1) may be, for example, a monomer (b1-1) (hereinafter sometimes referred to as "(b1-1)”) having a structure in which a linear or branched aliphatic unsaturated hydrocarbon has been epoxidized, or a monomer (b1-2) (hereinafter sometimes referred to as "(b1-2)”) having a structure in which an alicyclic unsaturated hydrocarbon has been epoxidized.
- (b1-1) may, for example, be glycidyl (meth)acrylate, ⁇ -methyl glycidyl (meth)acrylate, ⁇ -ethyl glycidyl (meth)acrylate, glycidyl vinyl ether, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl ether, ⁇ -methyl-o-vinylbenzyl glycidyl ether, ⁇ -methyl-m-vinylbenzyl glycidyl ether, ⁇ -methyl-p-vinylbenzyl glycidyl ether, 2,3-bis(glycidyl 2,4-bis(glycidyloxymethyl)styrene, 2,5-bis(glycidyloxymethyl)styrene, 2,6-bis(glycidyloxymethyl)st
- Examples of (b1-2) include vinylcyclohexene monoxide, 1,2-epoxy-4-vinylcyclohexane (e.g., Celloxide 2000, manufactured by Daicel Corporation), 3,4-epoxycyclohexylmethyl (meth)acrylate (e.g., Cyclomer A400, manufactured by Daicel Corporation), 3,4-epoxycyclohexylmethyl (meth)acrylate (e.g., Cyclomer M100, manufactured by Daicel Corporation), 3,4-epoxytricyclo[5.2.1.0 2,6 ]decyl (meth)acrylate, and 3,4-epoxytricyclo[5.2.1.0 2,6 ]decyloxyethyl (meth)acrylate.
- vinylcyclohexene monoxide e.g., 1,2-epoxy-4-vinylcyclohexane (e.g., Celloxide 2000, manufactured by Daicel Corporation), 3,4-epoxycyclohexyl
- (b2) is preferably a monomer having an oxetanyl group and a (meth)acryloyloxy group, and examples of such (b2) include 3-methyl-3-methacryloyloxymethyloxetane, 3-methyl-3-acryloyloxymethyloxetane, 3-ethyl-3-methacryloyloxymethyloxetane, 3-ethyl-3-acryloyloxymethyloxetane, 3-methyl-3-methacryloyloxyethyloxetane, 3-methyl-3-acryloyloxyethyloxetane, 3-ethyl-3-methacryloyloxyethyloxetane, and 3-ethyl-3-acryloyloxyethyloxetane.
- (b3) is preferably a monomer having a tetrahydrofuryl group and a (meth)acryloyloxy group, and examples of such (b3) include tetrahydrofurfuryl acrylate (e.g., Viscoat V#150, manufactured by Osaka Organic Chemical Industry Co., Ltd.) and tetrahydrofurfuryl methacrylate.
- tetrahydrofurfuryl acrylate e.g., Viscoat V#150, manufactured by Osaka Organic Chemical Industry Co., Ltd.
- (b) is (b1). Furthermore, from the viewpoint of obtaining a composition with excellent storage stability, it is more preferable that (b) is (b1-2).
- Examples of (c) include methyl (meth)acrylate, ethyl (meth)acrylate, n-butyl (meth)acrylate, sec-butyl (meth)acrylate, tert-butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, dodecyl (meth)acrylate, lauryl (meth)acrylate, stearyl (meth)acrylate, cyclopentyl (meth)acrylate, cyclohexyl (meth)acrylate, 2-methylcyclohexyl (meth)acrylate, tricyclo[5.2.1.0 2,6 ]decan-8-yl (meth)acrylate (commonly known in the art as "dicyclopentanyl (meth)acrylate” and sometimes also as “tricyclodecyl (meth)acrylate”), tricyclo[5.2.1.0 2,6 ](meth)acrylic acid esters such as decene-8-yl
- styrene vinyltoluene
- N-phenylmaleimide N-cyclohexylmaleimide
- N-benzylmaleimide N-benzylmaleimide
- bicyclo[2.2.1]hept-2-ene are preferred.
- the structural unit derived from (a) accounts for 2 to 60 mol % based on the total number of moles of all structural units constituting the resin [K1], and 40 to 98 mol % of structural units derived from (b) It is preferred that The structural unit derived from (a) is 10 to 50 mol %, and 50 to 90 mol % of structural units derived from (b) It is more preferable that: When the ratio of each structural unit in the resin [K1] is within the above range, the composition tends to have excellent storage stability, developability when forming a colored pattern described below, and solvent resistance of the optical filter.
- Resin [K1] can be produced, for example, by referring to the method described in the document "Experimental Methods for Polymer Synthesis” (written by Otsu Takayuki, published by Kagaku Dojin Co., Ltd., 1st edition, 1st printing, published March 1, 1972) and the documents cited therein.
- Specific examples include a method in which predetermined amounts of (a) and (b), a polymerization initiator, a solvent, etc. are placed in a reaction vessel, and the mixture is heated and kept warm while stirring, for example, under a nitrogen atmosphere.
- the polymerization initiator, solvent, etc. used here are not particularly limited, and polymerization initiators, solvents, etc. commonly used in the field can be used.
- polymerization initiators include azo compounds (2,2'-azobisisobutyronitrile, 2,2'-azobis(2,4-dimethylvaleronitrile), etc.) or organic peroxides (benzoyl peroxide, etc.).
- the solvent is not particularly limited as long as it dissolves the monomers, and for example, the solvent described below can be used as the solvent (E) of the composition.
- the total number of moles of all structural units constituting the resin [K2] is:
- the structural unit derived from (a) is 2 to 45 mol %
- the structural unit derived from (b) is 2 to 95 mol % and the structural unit derived from (c) is 1 to 65 mol %
- the structural unit derived from (a) is 5 to 40 mol %
- the structural unit derived from (b) is 5 to 80 mol %
- 5 to 60 mol % of structural units derived from (c) It is more preferable that:
- the ratio of each structural unit of the resin [K2] is within the above range, the composition tends to have excellent storage stability, developability when forming a colored pattern, and the optical filter tends to have excellent solvent resistance, heat resistance, and mechanical strength.
- Resin [K2] can be produced in the same manner as resin [K1], except that, for example, (a), (b), and (c) are used instead of (a) and (b).
- the total number of moles of all structural units constituting the resin [K3] is The structural unit derived from (a) is 2 to 60 mol % and the structural unit derived from (c) is 40 to 98 mol %. It is preferred that The structural unit derived from (a) is 10 to 50 mol % and the structural unit derived from (c) is 50 to 90 mol % It is more preferable that:
- Resin [K3] can be produced in the same manner as resin [K1], except that (a) and (c) are used instead of (a) and (b).
- Resin [K4] can be produced by obtaining a copolymer of (a) and (c), and adding the cyclic ether having 2 to 4 carbon atoms contained in (b) to the carboxylic acid and/or carboxylic anhydride of (a).
- the copolymer of (a) and (c) is produced by the same method as that for resin [K3].
- the ratio of the structural units derived from (a) and the structural units derived from (c) is preferably the same as that for resin [K3].
- a part of the carboxylic acid and/or carboxylic anhydride derived from (a) in the copolymer is reacted with the cyclic ether having 2 to 4 carbon atoms contained in (b).
- the atmosphere in the flask is replaced from nitrogen to air, and (b) a reaction catalyst for the carboxylic acid or carboxylic anhydride and the cyclic ether (e.g., tris(dimethylaminomethyl)phenol, etc.), a polymerization inhibitor (e.g., hydroquinone, etc.), etc. are placed in the flask, and the mixture is reacted, for example, at 60 to 130°C for 1 to 10 hours to produce resin [K4].
- the reaction conditions such as the charging method, reaction temperature, and reaction time, can be adjusted appropriately taking into account the production equipment and the amount of heat generated by polymerization.
- the amount of (b) used is preferably 5 to 80 moles, and more preferably 10 to 75 moles, per 100 moles of (a). By keeping the amount of (b) used within this range, the storage stability of the composition, the developability when forming a colored pattern, and the balance of the solvent resistance, heat resistance, mechanical strength, and sensitivity of the optical filter tend to be good. Since the reactivity of cyclic ethers is high and unreacted (b) is unlikely to remain, (b1) is preferred as the (b) used in resin [K4], and (b1-1) is more preferred.
- the amount of the reaction catalyst used is preferably 0.001 to 5 parts by mass per 100 parts by mass of the total of (a), (b), and (c).
- the amount of the polymerization inhibitor used is preferably 0.001 to 5 parts by mass per 100 parts by mass of the total of (a), (b), and (c).
- Resin [K5] can be produced in the same manner as Resin [K4], except that (b) is used instead of (a) and (a) is used instead of (b). That is, first, a copolymer of (b) and (c) is obtained, and then the cyclic ether derived from (b) contained in the copolymer of (b) and (c) is reacted with a carboxylic acid or carboxylic anhydride derived from (a), to obtain Resin K5.
- the ratio of the structural unit derived from (b) and the structural unit derived from (c) is, relative to the total number of moles of all structural units constituting the above copolymer,
- the structural unit derived from (b) is 5 to 95 mol % and the structural unit derived from (c) is 5 to 95 mol %
- the structural unit derived from (b) is 10 to 90 mol % and the structural unit derived from (c) is 10 to 90 mol %
- the amount of (a) reacted with the copolymer is preferably 5 to 80 moles per 100 moles of (b). Since the reactivity of cyclic ethers is high and unreacted (b) is unlikely to remain, (b1) is preferred as (b) used in resin [K5], and (b1-1) is more preferred.
- Resin [K6] is a resin obtained by further reacting resin [K5] with a carboxylic acid anhydride. Specifically, the hydroxyl group generated by the reaction of the cyclic ether derived from (b) with the carboxylic acid or carboxylic acid anhydride derived from (a) is reacted with the carboxylic acid anhydride.
- carboxylic acid anhydride examples include maleic anhydride, citraconic anhydride, itaconic anhydride, 3-vinylphthalic anhydride, 4-vinylphthalic anhydride, 3,4,5,6-tetrahydrophthalic anhydride, 1,2,3,6-tetrahydrophthalic anhydride, dimethyltetrahydrophthalic anhydride, and 5,6-dicarboxybicyclo[2.2.1]hept-2-ene anhydride.
- the amount of the carboxylic acid anhydride used is preferably 0.5 to 1 mole per mole of (a).
- the resin (B) include resins [K1] such as 3,4-epoxycyclohexylmethyl(meth)acrylate/(meth)acrylic acid copolymer, 3,4-epoxytricyclo[5.2.1.0 2.6 ]decyl acrylate/(meth)acrylic acid copolymer, glycidyl(meth)acrylate/benzyl(meth)acrylate/(meth)acrylic acid copolymer, glycidyl(meth)acrylate/styrene/(meth)acrylic acid copolymer, 3,4-epoxytricyclo[5.2.1.0 2,6 ]decyl acrylate/(meth)acrylic acid/N-cyclohexylmaleimide copolymer, 3,4-epoxytricyclo[5.2.1.0 2,6 ] decyl acrylate / (meth) acrylic acid / N-cyclohexylmaleimide / 2-hydroxyethyl (K1
- the resin [K2] may be, for example, a benzyl methacrylate/acrylic acid/3,4-epoxytricyclo[5.2.1.0 2,6 ]decan-8-yl acrylate/3,4-epoxytricyclo[5.2.1.0 2,6 ]decan-9-yl acrylate copolymer having a structural unit represented by the following formula:
- the resin [K4] may be, for example, a resin in which glycidyl methacrylate is added to a tricyclodecyl methacrylate/benzyl methacrylate/methacrylic acid copolymer.
- the weight average molecular weight of resin (B) in terms of polystyrene is preferably 3,000 to 100,000, more preferably 5,000 to 50,000, and even more preferably 5,000 to 30,000.
- the molecular weight is within the above range, the hardness of the optical filter is improved, the residual film rate is high, the solubility of the unexposed parts in the developer is good, and the resolution of the colored pattern tends to be improved.
- the dispersity of resin (B) [weight average molecular weight (Mw)/number average molecular weight (Mn)] is preferably 1.1 to 6, and more preferably 1.2 to 4.
- the acid value of resin (B), calculated as solid content, is preferably 50 to 170 mg-KOH/g, more preferably 60 to 150 mg-KOH/g, and even more preferably 70 to 135 mg-KOH/g.
- the acid value is the amount (mg) of potassium hydroxide required to neutralize 1 g of resin (B), and can be determined, for example, by titration using an aqueous potassium hydroxide solution.
- the content of resin (B) may be, for example, 7 to 65 mass%, 13 to 60 mass%, or 17 to 55 mass% relative to the total amount of solids in the composition.
- the content of resin (B) is within the above range, a colored pattern can be formed well, and the resolution and remaining film rate of the colored pattern tend to be improved.
- the polymerizable compound (C) is a compound that can be polymerized by the active radicals and/or acid generated from the polymerization initiator (D).
- the polymerizable compound (C) is, for example, a compound having a polymerizable ethylenically unsaturated bond, and is preferably a (meth)acrylic acid ester.
- the polymerizable compound (C) is preferably a polymerizable compound having three or more ethylenically unsaturated bonds.
- examples of such polymerizable compounds include trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol poly(meth)acrylate (e.g., dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, etc.), tripentaerythritol octa(meth)acrylate, tripentaerythritol hepta(meth)acrylate, tetrapentaerythritol deca(meth)acrylate, tetrapentaerythritol Examples of the acrylate include nona(meth)acrylate, tris
- the weight average molecular weight of the polymerizable compound (C) is preferably 150 to 2900, and more preferably 250 to 1500.
- the content of the polymerizable compound (C) is preferably 7 to 65 mass %, more preferably 13 to 60 mass %, and even more preferably 17 to 55 mass %, based on the total amount of solids in the composition.
- the content of the polymerizable compound (C) is within the above range, the residual film rate during color pattern formation and the chemical resistance of the optical filter tend to improve.
- the polymerization initiator (D) is not particularly limited as long as it is a compound that can generate active radicals, acids, etc. by light or heat and initiate polymerization, and any known polymerization initiator can be used.
- Polymerization initiators that generate active radicals include, for example, alkylphenone compounds, triazine compounds, acylphosphine oxide compounds, O-acyloxime compounds, and biimidazole compounds.
- the above O-acyloxime compound is a compound having a partial structure represented by formula (d1).
- * represents a bond.
- O-acyloxime compounds include N-benzoyloxy-1-(4-phenylsulfanylphenyl)butan-1-one-2-imine, N-benzoyloxy-1-(4-phenylsulfanylphenyl)octan-1-one-2-imine, N-benzoyloxy-1-(4-phenylsulfanylphenyl)-3-cyclopentylpropan-1-one-2-imine, N-acetoxy-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethane-1-imine, N-acetoxy-1-[9-ethyl-6- ⁇ 2-methyl-4-(3,3-dimethyl)phenyl]ethane-1-imine, Examples of the methyl ether ester include N-ethyl-2,4-dioxacyclopentanylmethyloxy)benzoyl ⁇ -9H-carbazol-3-yl]ethane
- the O-acyloxime compound is preferably at least one selected from the group consisting of N-acetyloxy-1-(4-phenylsulfanylphenyl)-3-cyclohexylpropan-1-one-2-imine, N-benzoyloxy-1-(4-phenylsulfanylphenyl)butan-1-one-2-imine, N-benzoyloxy-1-(4-phenylsulfanylphenyl)octan-1-one-2-imine, and N-benzoyloxy-1-(4-phenylsulfanylphenyl)-3-cyclopentylpropan-1-one-2-imine, and more preferably N-acetyloxy
- the alkylphenone compound is a compound having a partial structure represented by formula (d2) or a partial structure represented by formula (d3).
- the benzene ring may have a substituent.
- the alkylphenone compound is preferably a compound having a partial structure represented by formula (d2).
- Examples of compounds having the partial structure represented by formula (d2) include 2-methyl-2-morpholino-1-(4-methylsulfanylphenyl)propan-1-one, 2-dimethylamino-1-(4-morpholinophenyl)-2-benzylbutan-1-one, and 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-[4-(4-morpholinyl)phenyl]butan-1-one.
- Commercially available products such as Omnirad (formerly Irgacure) 369, 907, and 379 (all manufactured by IGM Resins B.V.) may also be used.
- Examples of compounds having the partial structure represented by formula (d3) include 2-hydroxy-2-methyl-1-phenylpropan-1-one, 2-hydroxy-2-methyl-1-[4-(2-hydroxyethoxy)phenyl]propan-1-one, 1-hydroxycyclohexyl phenyl ketone, oligomers of 2-hydroxy-2-methyl-1-(4-isopropenylphenyl)propan-1-one, ⁇ , ⁇ -diethoxyacetophenone, and benzyl dimethyl ketal.
- triazine compounds examples include 2,4-bis(trichloromethyl)-6-(4-methoxyphenyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-(4-methoxynaphthyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-piperonyl-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-(4-methoxystyryl)-1,3,5-triazine, and 2,4-bis(trichloromethyl)-6- Examples include [2-(5-methylfuran-2-yl)ethenyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(furan-2-yl)ethenyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(4-diethylamino-2-methylphenyl
- the acylphosphine oxide compound may be 2,4,6-trimethylbenzoyldiphenylphosphine oxide.
- Commercially available products such as Omnirad 819 (manufactured by IGM Resins B.V.) may also be used.
- the above biimidazole compounds include, for example, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2,3-dichlorophenyl)-4,4',5,5'-tetraphenylbiimidazole (see, for example, JP-A-6-75372 and JP-A-6-75373, etc.), 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(alkoxyphenyl) phenyl) biimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(dialkoxyphenyl) biimidazole, 2,2'-bis(2-chlorophenyl)-4,4',
- polymerization initiator (D) examples include benzoin compounds such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzoin isobutyl ether; benzophenone compounds such as benzophenone, o-benzoyl methyl benzoate, 4-phenylbenzophenone, 4-benzoyl-4'-methyldiphenyl sulfide, 3,3',4,4'-tetra(tert-butylperoxycarbonyl)benzophenone, and 2,4,6-trimethylbenzophenone; quinone compounds such as 9,10-phenanthrenequinone, 2-ethylanthraquinone, and camphorquinone; 10-butyl-2-chloroacridone; benzyl; methyl phenylglyoxylate; and titanocene compounds. These are preferably used in combination with the polymerization initiator aid (D1) (particularly an tert
- polymerization initiators that generate acid include onium salts such as 4-hydroxyphenyldimethylsulfonium p-toluenesulfonate, 4-hydroxyphenyldimethylsulfonium hexafluoroantimonate, 4-acetoxyphenyldimethylsulfonium p-toluenesulfonate, 4-acetoxyphenylmethylbenzylsulfonium hexafluoroantimonate, triphenylsulfonium p-toluenesulfonate, triphenylsulfonium hexafluoroantimonate, diphenyliodonium p-toluenesulfonate, and diphenyliodonium hexafluoroantimonate, as well as nitrobenzyl tosylates and benzoin tosylates.
- onium salts such as 4-hydroxyphenyldimethylsulfonium p-
- a polymerization initiator that generates active radicals is preferred, a polymerization initiator containing at least one selected from the group consisting of an alkylphenone compound, a triazine compound, an acylphosphine oxide compound, an O-acyloxime compound, and a biimidazole compound is more preferred, and a polymerization initiator containing an O-acyloxime compound is even more preferred.
- the content of the polymerization initiator (D) may be, for example, 0.1 to 30 parts by mass or 1 to 20 parts by mass per 100 parts by mass of the total amount of the resin (B) and the polymerizable compound (C). If the content of the polymerization initiator (D) is within the above range, the sensitivity tends to be increased and the exposure time tends to be shortened, thereby improving the productivity of the optical filter.
- the composition may further include a polymerization initiation aid (D1).
- the polymerization initiation aid (D1) is a compound used to promote the polymerization of the polymerizable compound (C) whose polymerization has been initiated by a polymerization initiator, or a sensitizer.
- the polymerization initiation aid (D1) is usually used in combination with the polymerization initiator (D).
- Examples of the polymerization initiation aid (D1) include an amine compound, an alkoxyanthracene compound, a thioxanthone compound, and a carboxylic acid compound.
- the above amine compounds include triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 2-dimethylaminoethyl benzoate, 2-ethylhexyl 4-dimethylaminobenzoate, N,N-dimethyl-p-toluidine, 4,4'-bis(dimethylamino)benzophenone (commonly known as Michler's ketone), 4,4'-bis(diethylamino)benzophenone, 4,4'-bis(ethylmethylamino)benzophenone, etc., of which 4,4'-bis(diethylamino)benzophenone is preferred.
- EAB-F manufactured by Hodogaya Chemical Co., Ltd.
- alkoxyanthracene compounds include 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 2-ethyl-9,10-diethoxyanthracene, 9,10-dibutoxyanthracene, and 2-ethyl-9,10-dibutoxyanthracene.
- thioxanthone compounds include 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, 1-chloro-4-propoxythioxanthone, etc.
- the above carboxylic acid compounds include phenylsulfanylacetic acid, methylphenylsulfanylacetic acid, ethylphenylsulfanylacetic acid, methylethylphenylsulfanylacetic acid, dimethylphenylsulfanylacetic acid, methoxyphenylsulfanylacetic acid, dimethoxyphenylsulfanylacetic acid, chlorophenylsulfanylacetic acid, dichlorophenylsulfanylacetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine, naphthoxyacetic acid, etc.
- the content is preferably 0.1 to 30 parts by mass, and more preferably 1 to 20 parts by mass, per 100 parts by mass of the total amount of the resin (B) and the polymerizable compound (C).
- the amount of the polymerization initiation aid (D1) is within this range, a colored pattern can be formed with even higher sensitivity, and the productivity of the optical filter tends to improve.
- the solvent (E) is not particularly limited, and a solvent commonly used in the field can be used.
- the solvent (E) include ester solvents (i.e., solvents containing -COO- and not containing -O- in the molecule), ether solvents (i.e., solvents containing -O- and not containing -COO- in the molecule), ether ester solvents (i.e., solvents containing -COO- and -O- in the molecule), ketone solvents (i.e., solvents containing -CO- and not containing -COO- in the molecule), alcohol solvents (solvents containing OH in the molecule and not containing -O-, -CO- and -COO-), aromatic hydrocarbon solvents, amide solvents, dimethyl sulfoxide, and the like.
- Ester solvents include methyl lactate, ethyl lactate, butyl lactate, methyl 2-hydroxyisobutanoate, ethyl acetate, n-butyl acetate, isobutyl acetate, pentyl formate, isopentyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, cyclohexanol acetate, and gamma-butyrolactone.
- Ether solvents include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, 3-methoxy-1-butanol, 3-methoxy-3-methylbutanol, tetrahydrofuran, tetrahydropyran, 1,4-dioxane, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether, anisole, phenetole, methylanisole, etc.
- Ether ester solvents include methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, methyl 2-methoxy-2-methylpropionate, ethyl 2-ethoxy-2-methylpropionate, 3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monoethyl ether
- Ketone solvents include 4-hydroxy-4-methyl-2-pentanone, acetone, 2-butanone, 2-heptanone, 3-heptanone, 4-heptanone, 4-methyl-2-pentanone, cyclopentanone, cyclohexanone, isophorone, etc.
- Alcohol solvents include methanol, ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, glycerin, etc.
- Aromatic hydrocarbon solvents include benzene, toluene, xylene, mesitylene, etc.
- Amide solvents include N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, etc.
- the solvent preferably contains one or more selected from the group consisting of ether solvents, ether ester solvents, and amide solvents, more preferably contains ether solvents, ether ester solvents, and amide solvents, and even more preferably contains diethylene glycol methyl ethyl ether, propylene glycol monomethyl ether acetate, and N-methylpyrrolidone.
- the content of the solvent (E) may be, for example, 70 to 95% by mass or 75 to 92% by mass, based on the total amount of the composition.
- the solid content of the composition may be, for example, 5 to 30% by mass or 8 to 25% by mass.
- Leveling Agent (F) examples include silicone-based surfactants, fluorine-based surfactants, etc. These surfactants may have a polymerizable group in the side chain.
- silicone-based surfactants include surfactants that have siloxane bonds in the molecule.
- Specific examples of silicone surfactants include DOWSIL (registered trademark) (formerly Toray Silicone) DC3PA, SH7PA, DC11PA, SH21PA, SH28PA, SH29PA, SH30PA, and SH8400 (product names, manufactured by DuPont Toray Specialty Materials Co., Ltd.
- TSF400 TSF401, TSF410, TSF4300, TSF4440, TSF4445, TSF4446, TSF4452, and TSF4460 (manufactured by Momentive Performance Materials Japan LLC).
- the silicone surfactant may be a silicone surfactant having a fluorine atom.
- silicone surfactants having a fluorine atom include surfactants having a siloxane bond and a fluorocarbon chain in the molecule.
- Specific examples of silicone surfactants include Megafac (registered trademark) R08, BL20, F475, F477, and F443 (manufactured by DIC Corporation).
- fluorosurfactants include, for example, surfactants having a fluorocarbon chain in the molecule.
- fluorosurfactants include Fluorad (registered trademark) FC430 and FC431 (manufactured by Sumitomo 3M Limited); Megafac (registered trademark) F142D, F171, F172, F173, F177, F183, F554, R30, and RS-718-K (manufactured by DIC Corporation); F-top (registered trademark) EF301, EF303, EF351, and EF352 (manufactured by Mitsubishi Materials Electronic Chemicals Co., Ltd.); Surflon (registered trademark) S381, S382, SC101, and SC105 (manufactured by AGC Inc. (formerly Asahi Glass Co., Ltd.)); and E5844 (manufactured by Daikin Fine Chemicals Research Institute, Ltd.).
- the content of the leveling agent (F) may be, for example, 0.001 to 0.2 mass%, 0.002 to 0.1 mass%, or 0.01 to 0.05 mass% relative to the total amount of the composition, from the viewpoint of obtaining an optical filter with good flatness. Note that this content does not include the content of the dispersant.
- composition according to this aspect of the invention may optionally contain additives known in the art, such as fillers, other polymeric compounds, adhesion promoters, antioxidants, light stabilizers, chain transfer agents, and the like.
- composition according to this aspect can be prepared, for example, by mixing the near-infrared absorbing dye (A1), the resin (B), and the solvent (E), as well as the colorant (A2), the polymerizable compound (C), the polymerization initiator (D), the leveling agent (F), the polymerization initiator aid (D1), the dispersant, and other components that are used as needed.
- the mixed composition is preferably filtered through a filter having a pore size of about 0.01 to 10 ⁇ m.
- a dispersion of the near-infrared absorbing dye (A1) and/or colorant (A2) may be prepared, and this dispersion may be mixed with other components to prepare the composition.
- the dispersion of the near-infrared absorbing dye (A1) and/or colorant (A2) may be prepared by mixing them with a solvent (E) together with an appropriate resin (B) and dispersant, and dispersing them using a bead mill or the like.
- the diameter of the beads may be, for example, 0.05 to 0.5 mm or less.
- An optical filter according to one aspect of the present invention is formed from the above-mentioned composition.
- the optical filter may include a cured product of the above-mentioned composition, or may be made of a cured product of the above-mentioned composition.
- the cured product of the composition can be obtained, for example, by irradiating the composition formed into a film with light, or by heating the composition formed into a film.
- the above-mentioned composition is unlikely to cause aggregates due to the near-infrared absorbing dye even when formed into a film, so that aggregates are reduced in the optical filter formed from the above-mentioned composition.
- Such an optical filter is also excellent in light resistance.
- the above-mentioned composition absorbs specific wavelengths in the near-infrared region, so that an optical filter formed from the composition can be used as a near-infrared cut filter or a near-infrared transmission filter. Therefore, the optical filter according to this aspect can be used, for example, in infrared sensors and display devices (for example, liquid crystal display devices, organic EL devices, or electronic paper).
- infrared sensors and display devices for example, liquid crystal display devices, organic EL devices, or electronic paper.
- the thickness of the optical filter is preferably 20 ⁇ m or less, more preferably 6 ⁇ m or less, even more preferably 3 ⁇ m or less, even more preferably 1.5 ⁇ m or less, and particularly preferably 0.5 ⁇ m or less.
- the thickness of the optical filter is preferably 0.1 ⁇ m or more, more preferably 0.2 ⁇ m or more, and even more preferably 0.3 ⁇ m or more.
- the thickness of the optical filter may be, for example, 0.1 to 30 ⁇ m, 0.1 to 20 ⁇ m, or 0.5 to 6 ⁇ m.
- the method for manufacturing the optical filter is not particularly limited, and it can be manufactured by a conventionally known method.
- an optical filter can be formed on any substrate by a photolithography method, an inkjet method, or a printing method.
- the photolithography method is preferable.
- the substrate may be, for example, a glass plate such as quartz glass, borosilicate glass, alumina silicate glass, or soda lime glass with a silica-coated surface; a resin plate such as polycarbonate, polymethylmethacrylate, or polyethylene terephthalate; or silicon.
- a glass plate such as quartz glass, borosilicate glass, alumina silicate glass, or soda lime glass with a silica-coated surface
- a resin plate such as polycarbonate, polymethylmethacrylate, or polyethylene terephthalate
- silicon silicon
- Substrates having thin films of aluminum, silver, or silver/copper/palladium alloys on these substrates may also be used.
- Substrates having hexamethyldisilazane (HMDS) treatment on silicon substrates may also be used.
- substrates having other optical filters, resin layers, transistors, circuits, etc. on these substrates may also be used.
- the above-mentioned composition is first applied to a substrate, and the composition is dried to form a coating film.
- the composition can be applied by, for example, spin coating, slit coating, or slit and spin coating.
- the thickness of the coating film can be appropriately determined depending on the thickness of the desired optical filter.
- the composition can be dried by, for example, heat drying (pre-baking) and/or reduced pressure drying.
- the heat drying temperature is preferably 30 to 120°C, more preferably 50 to 110°C.
- the heating time is preferably 10 seconds to 60 minutes, more preferably 30 seconds to 30 minutes.
- the reduced pressure drying is preferably performed at a pressure of 50 to 150 Pa and a temperature range of 20 to 25°C.
- the coating film is exposed through a photomask having a predetermined pattern, and then developed by contacting with a developer to form a colored pattern consisting of the cured product of the coating film.
- the pattern of the photomask can be appropriately determined depending on the application of the optical filter.
- the light source used for exposure is preferably a light source that generates light with a wavelength of 250 to 450 nm.
- Light of such wavelengths can be obtained, for example, by cutting light of a specific wavelength range (e.g., less than 350 nm) from a specific light source using a filter that cuts this wavelength range, or by selectively extracting light of a specific wavelength (e.g., near 436 nm, near 408 nm, or near 365 nm) using a bandpass filter that extracts these wavelength ranges.
- the light source may be, for example, a mercury lamp, a light-emitting diode, a metal halide lamp, or a halogen lamp.
- a reduction projection exposure device or a proximity exposure device such as a mask aligner and a stepper, because it is possible to uniformly irradiate the entire exposure surface with parallel light rays and to accurately align the photomask and the substrate.
- the developer is preferably an aqueous solution of an alkaline compound such as potassium hydroxide, sodium hydrogen carbonate, sodium carbonate, or tetramethylammonium hydroxide.
- concentration of the alkaline compound in the aqueous solution is preferably 0.01 to 10% by mass, and more preferably 0.03 to 5% by mass.
- the developer may contain a surfactant.
- Development may be performed by, for example, a paddle method, a dipping method, or a spray method.
- the substrate may be tilted at any angle during development. By development, the unexposed parts of the coating film are dissolved in the developer and removed.
- the post-baking temperature may be, for example, 80 to 250°C, 100 to 245°C, 150 to 250°C, or 160 to 250°C.
- the post-baking time may be, for example, 1 to 120 minutes, 2 to 30 minutes, or 5 to 60 minutes.
- the cured product of the coating and the color pattern are both included in the scope of the optical filter according to this aspect.
- a solid-state imaging device includes the optical filter described above.
- the optical filter may be a near-infrared transmission filter and/or a near-infrared cut filter.
- the portions of the solid-state imaging device other than the optical filter may be the same as those of a conventionally known solid-state imaging device.
- An example of a solid-state imaging device is shown in FIG. 1.
- the solid-state imaging element 100 shown in FIG. 1 includes a semiconductor substrate 2 including a light receiving element and the like (not shown), a near-infrared cut filter 4, a near-infrared transmission filter 6, a color filter 8, a microlens 10, and a planarization layer 12.
- the near-infrared cut filter 4 and/or the near-infrared transmission filter 6 may be the optical filters described above.
- the color filter 8 is not particularly limited, and may be a conventionally known color filter for pixel formation, such as the color filter described in JP-A-2014-043556.
- the microlens 10 and planarization layer 12 are also not particularly limited, and may be a known microlens and planarization layer.
- the near-infrared cut filter 4, the color filter 8, and the microlens 10 are laminated in this order, but the positions of the near-infrared cut filter 4 and the color filter 8 may be interchanged. Between the transparent electrode 1 and the color filter 8, another further layer may be provided.
- the solid-state imaging device can be used, for example, in an infrared sensor. That is, according to one aspect of the present invention, there is also provided an infrared sensor including the above-mentioned solid-state imaging device.
- a method for producing a compound represented by formula (I) according to one aspect of the present invention includes a step of reacting a compound represented by formula (I-x1), a compound represented by formula (I-x2), and a compound represented by formula (I-y1) or a compound represented by formula (I-y2) in the presence of a catalyst.
- the compound represented by formula (I-x1), the compound represented by formula (I-x2), the compound represented by formula (I-y1), and the compound represented by formula (I-y2) may be collectively referred to as "raw material compounds".
- This reaction is the so-called Suzuki coupling and Heck reaction, which causes ring formation and results in the formation of a pentalylene skeleton.
- the method according to this aspect requires fewer steps and can more easily produce the compound represented by formula (I) compared to the conventional method for producing a compound having a pentalylene skeleton.
- R 1 to R 10 , X 1 to X 4 , and Y 1 , Y 4 , Y 5 , and Y 8 are as defined and explained in formula (I).
- Z 1 to Z 4 each independently represent a bromine atom or an iodine atom.
- a 1 and A 2 each independently represent a hydroxy group, a hydrocarbon group having 1 to 20 carbon atoms, or an OR 13 group.
- Examples of the hydrocarbon group having 1 to 20 carbon atoms represented by A 1 and A 2 include the groups exemplified as the hydrocarbon group having 1 to 20 carbon atoms represented by R 1 , R 4 , R 5 or R 8 .
- R 13 represents a hydrocarbon group having 1 to 20 carbon atoms. When two or more R 13 are present in formula (I-y1) or formula (I-y2), they may be the same or different. Examples of the hydrocarbon group having 1 to 20 carbon atoms represented by R 13 include the groups exemplified as the hydrocarbon group having 1 to 20 carbon atoms represented by R 1 , R 4 , R 5 , or R 8. R 13 may be, for example, a methyl group, an ethyl group, or an isopropyl group.
- OR 13 groups bonded to the same boron atom may be bonded to each other to form a ring.
- the ring formed may be, for example, a ring represented by the following formula:
- the compound represented by formula (I-x1), the compound represented by formula (I-x2), the compound represented by formula (I-y1), and the compound represented by formula (I-y2) can all be synthesized by a person skilled in the art in accordance with known methods.
- the ratio of the total number of moles of the compound represented by formula (I-x1) and the compound represented by formula (I-x2) to the number of moles of the compound represented by formula (I-y1) is usually 2:1, but may be 4.0:1 to 1.5:1.
- the ratio of the total number of moles of the compound represented by formula (I-x1) and the compound represented by formula (I-x2) to the number of moles of the compound represented by formula (I-y2) is usually 2:1, but may be 4.0:1 to 1.5:1.
- both the compound represented by formula (I-y1) and the compound represented by formula (I-y2) may be used.
- the ratio of the total number of moles of the compound represented by formula (I-x1) and the compound represented by formula (I-x2) to the total number of moles of the compound represented by formula (I-y1) and the compound represented by formula (I-y2) is usually 2:1, but may be 4.0:1 to 1.5:1.
- the catalyst is not particularly limited as long as it is a catalyst that catalyzes the Suzuki-Miyaura cross-coupling and Heck-Mizoroki cross-coupling reactions, and may be, for example, a transition metal complex such as a palladium complex or a nickel complex.
- a transition metal complex such as a palladium complex or a nickel complex.
- palladium complexes include tris(benzylideneacetone)dipalladium(0), [1,1'-bis(diphenylphosphino)ferrocene]palladium(II) dichloride, tetrakis(triphenylphosphine)palladium(0), bis(triphenylphosphine)palladium(II) dichloride, and palladium acetate.
- nickel complexes examples include tetrakis(triphenylphosphine)nickel(0), [1,3-bis(diphenylphosphino)propane)nickel(II) dichloride, and bis(1,4-cyclooctadiene)nickel(0).
- the catalyst may be the above-mentioned transition metal complex further having a ligand such as tricyclohexylphosphine, triphenylphosphine, tri(o-tolyl)phosphine, tri(tert-butyl)phosphine, 1,3-bis(diphenylphosphino)propane, bipyridyl, etc.
- the catalyst is preferably tris(benzylideneacetone)dipalladium(0) having tricyclohexylphosphine as a ligand.
- the amount of catalyst used may be, for example, 0.001 to 0.3 mol% relative to the total number of moles of the compound represented by formula (I-y1) and the compound represented by formula (I-y2), and is preferably 0.05 to 0.3 mol%.
- the above reaction is preferably carried out in the presence of a base.
- the base may be, for example, an inorganic base such as sodium carbonate, potassium carbonate, cesium carbonate, potassium fluoride, cesium fluoride, or tripotassium phosphate, or an organic base such as tetrabutylammonium fluoride, tetraethylammonium hydroxide, or tetrabutylammonium hydroxide.
- the amount of base used may be 1 to 100 moles, and preferably 3 to 20 moles, per mole of the compound represented by formula (I-y1) and the compound represented by formula (I-y2).
- the solvent for the above reaction is not particularly limited as long as it does not adversely affect the reaction.
- mesitylene, xylene, toluene, N,N-dimethylformamide, dimethyl sulfoxide, tetrahydrofuran, 1,4-dioxane, and cyclopentyl methyl ether can be used.
- the amount of the solvent used is, for example, 1 to 100 parts by mass, preferably 5 to 50 parts by mass, per 1 part by mass of the total of the compound represented by formula (I-y1) and the compound represented by formula (I-y2).
- the reaction temperature may be, for example, 40 to 200°C or 100 to 180°C.
- the reaction time may be, for example, 0.5 to 50 hours or 5 to 30 hours.
- the above production method may further include a step of substituting some or all of R 1 to R 8 in the compound represented by formula (I) obtained in the above step of reacting the raw material compounds with other types of R 1 to R 8.
- R 1 to R 8 in the obtained compound represented by formula (I) are halogen atoms
- some or all of the halogen atoms can be substituted with OR 11 groups by reacting the compound represented by formula (I) with R 11 OH.
- the maximum absorption wavelength of each compound was confirmed using an ultraviolet-visible-near infrared absorption spectrometer (V-770, manufactured by JASCO Corporation). Specifically, a 10 ppm chloroform solution of the compound was prepared, and the absorbance was measured in the wavelength range of 300 to 1400 nm (data sampling interval 1 nm) to confirm the maximum absorption wavelength.
- V-770 ultraviolet-visible-near infrared absorption spectrometer
- the polystyrene-equivalent weight average molecular weight (Mw) and number average molecular weight (Mn) of the resin were measured by GPC under the following conditions.
- Apparatus HLC-8120GPC (manufactured by Tosoh Corporation) Column: TSK-GELG2000HXL Column temperature: 40°C Solvent: tetrahydrofuran Flow rate: 1.0 mL/min Solids concentration of analytical sample: 0.001 to 0.01% by mass Injection volume: 50 ⁇ L Detector: RI
- Calibration standard material TSK STANDARD POLYSTYRENE F-40, F-4, F-288, A-2500, A-500 (manufactured by Tosoh Corporation)
- the ratio of the weight average molecular weight and number average molecular weight (Mw/Mn) calculated in terms of polystyrene obtained above was taken as the degree of dispersion.
- Synthesis Example 3 Synthesis of compound (IC) Under a nitrogen atmosphere, 22 parts of compound (IB), 10 parts of 4,4,5,5-tetramethyl-2-(1-naphthyl)-1,3,2-dioxaborolane, 3.6 parts of tris(dibenzylideneacetone)dipalladium(0) (Tokyo Chemical Industry Co., Ltd.), 4.4 parts of tricyclohexylphosphine (Fujifilm Wako Pure Chemical Industries, Ltd.), 67 parts of potassium carbonate (Kanto Chemical Co., Ltd.), and 720 parts of dehydrated xylene (Kanto Chemical Co., Ltd.) were mixed and stirred at 145°C for 18 hours. After cooling to 20°C, the reaction liquid was filtered. The solvent was distilled off under reduced pressure, and the crude product was purified by silica gel column chromatography (solvent: chloroform) to obtain 9 parts of a red solid of compound (IC).
- the obtained organic layer was dehydrated with anhydrous sodium sulfate (manufactured by Kanto Chemical Co., Ltd.), and the sodium sulfate was filtered, and the solvent was distilled off.
- Synthesis Example 5 Synthesis of compound (I-x-1) Under a nitrogen atmosphere, 10 parts of compound (ID), 4.0 parts of 4-propoxyphenol (manufactured by Tokyo Chemical Industry Co., Ltd.), 4.1 parts of potassium carbonate (manufactured by Kanto Chemical Co., Ltd.), and 323 parts of N-methyl-2-pyrrolidinone (manufactured by Kanto Chemical Co., Ltd.) were mixed and stirred at 120°C for 6 hours. After completion of the reaction, the reaction solution was cooled to room temperature (18 to 24°C), and 198 parts of concentrated hydrochloric acid (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) and 992 parts of water were added.
- the precipitated solid was washed twice with 200 parts of ion-exchanged water and then twice with 200 parts of methanol, and decanted.
- the crude product was purified by silica gel column chromatography (solvent: chloroform) to obtain 8.5 parts of a red solid of compound (I-x-1).
- Synthesis Example 6 Synthesis of compound (I-y-1) Under a nitrogen atmosphere, 5.0 parts of 1,8-dibromonaphthalene (manufactured by Tokyo Chemical Industry Co., Ltd.), 11 parts of bis(pinacolato)diboron (manufactured by Tokyo Chemical Industry Co., Ltd.), 10 parts of potassium acetate (manufactured by Kanto Chemical Co., Ltd.), 1.3 parts of 1,1-bis(diphenylphosphino)ferrocenedichloropalladium(II) (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.), and 95 parts of dehydrated N,N-dimethylformamide (manufactured by Kanto Chemical Co., Ltd.) were mixed and stirred at 90° C.
- Synthesis Example 7 Synthesis of Example Compound (I-2) Under a nitrogen atmosphere, 52 parts of compound (I-x-1), 10 parts of compound (I-y-1), 4.8 parts of tris(dibenzylideneacetone)dipalladium(0) (manufactured by Tokyo Chemical Industry Co., Ltd.), 5.9 parts of tricyclohexylphosphine (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.), 45 parts of potassium carbonate (manufactured by Kanto Chemical Co., Ltd.), and 720 parts of mesitylene (manufactured by Tokyo Chemical Industry Co., Ltd.) were mixed and stirred at 160 ° C. for 18 hours.
- reaction liquid was cooled to room temperature and poured into 8000 parts of methanol.
- the precipitated solid was washed twice with 200 parts of ion-exchanged water, followed by washing twice with 200 parts of methanol, and decantation was performed.
- the crude product was purified by silica gel column chromatography (solvent: chloroform) to obtain 28 parts of a dark green solid of compound (I-2).
- the precipitated solid was filtered, washed twice with 100 parts of ion-exchanged water and then twice with 100 parts of methanol, and decanted. The mixture was dried under reduced pressure at 60°C to obtain 10 parts of yellow crystals of compound (I-E).
- Synthesis Example 9 Synthesis of compound (I-x-2) Under a nitrogen atmosphere, 10 parts of compound (I-E), 5.7 parts of 2,6-diisopropylaniline (manufactured by Tokyo Chemical Industry Co., Ltd.), 80 parts of acetic acid (manufactured by Kanto Chemical Co., Ltd.), and 160 parts of N-methyl-2-pyrrolidinone (manufactured by Kanto Chemical Co., Ltd.) were mixed and stirred at 110° C. for 49 hours. After completion of the reaction, the reaction liquid was cooled to room temperature (18 to 24° C.), and 2,500 parts of water were added. The precipitated solid was filtered and washed twice with 30 parts of ion-exchanged water. The crude product was purified by silica gel column chromatography (solvent: chloroform) to obtain 6.5 parts of a red solid of compound (I-x-2).
- Synthesis Example 10 Synthesis of Example Compound (I-1) 13 parts of dark green crystals of compound (I-1) were obtained in the same manner as in the synthesis of compound (I-2) in Synthesis Example 7, except that 52 parts of compound (I-x-1) (manufactured by Tokyo Chemical Industry Co., Ltd.) was changed to 45 parts of compound (I-x-2).
- Synthesis Example 11 Synthesis of Example Compound (I-3) Under a nitrogen atmosphere, 10 parts of compound (I-1), 12 parts of 4-tert-butylphenol (manufactured by Tokyo Chemical Industry Co., Ltd.), 12 parts of potassium carbonate (manufactured by Kanto Chemical Co., Ltd.), and 323 parts of N-methyl-2-pyrrolidinone (manufactured by Kanto Chemical Co., Ltd.) were mixed and stirred at 120 ° C. for 6 hours. After the reaction was completed, the reaction solution was cooled to room temperature (18 to 24 ° C.), and 198 parts of concentrated hydrochloric acid (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) and 992 parts of water were added.
- the precipitated solid was washed twice with 200 parts of ion-exchanged water, followed by washing twice with 200 parts of methanol, and decantation was performed.
- the crude product was purified by silica gel column chromatography (solvent: chloroform) to obtain 13 parts of dark green crystals of a mixture of compounds represented by formula (I-3) (hereinafter, for convenience, this mixture of compounds is referred to as compound (I-3)).
- the mixture of compounds represented by formula (I-3) was a mixture of three types of compounds containing, as the substituent R in formula (I-3), a chlorine atom and a 4-tert-butylphenoxy group in ratios of 3/5, 2/6, and 1/7, respectively.
- Synthesis Example 12 Synthesis of compound (IF) Thirteen parts of red crystals of compound (IF) were obtained in the same manner as in the synthesis of compound (IB) in Synthesis Example 2, except that 5.0 parts of 2-ethylhexylamine was changed to 5.2 parts of 2,6-diisopropylaniline (manufactured by Tokyo Chemical Industry Co., Ltd.).
- the obtained organic layer was dehydrated with anhydrous sodium sulfate (manufactured by Kanto Chemical Co., Ltd.), and the sodium sulfate was filtered, and the solvent was distilled off.
- the crude product was purified by silica gel column chromatography (solvent: chloroform) to obtain 12 parts of red crystals of compound (I-H).
- Synthesis Example 15 Synthesis of compound (I-J) 7.5 parts of red crystals of compound (I-J) were obtained in the same manner as in the synthesis of compound (I-x-1) in Synthesis example 5, except that compound (ID) was changed to compound (I-H) and 4.0 parts of 4-propoxyphenol was changed to 4.2 parts of 4-tert-butylphenol (manufactured by Tokyo Chemical Industry Co., Ltd.).
- Synthesis Example 17 Synthesis of Example Compound (I-4) Under a nitrogen atmosphere, 10 parts of compound (I-K), 6.5 parts of anhydrous iron(III) chloride (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.), 57 parts of nitromethane (manufactured by Tokyo Chemical Industry Co., Ltd.), and 465 parts of chloroform (manufactured by Nacalai Tesque, Inc.) were mixed and stirred at 20 to 25 ° C. for 24 hours. After the reaction was completed, the solvent was distilled off and the mixture was washed with 300 parts of water.
- anhydrous iron(III) chloride manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.
- 57 parts of nitromethane manufactured by Tokyo Chemical Industry Co., Ltd.
- 465 parts of chloroform manufactured by Nacalai Tesque, Inc.
- Synthesis Example 18 Synthesis of Resin (B-1) A suitable amount of nitrogen was flowed into a flask equipped with a reflux condenser, a dropping funnel and a stirrer to replace the atmosphere with nitrogen, 340 parts of propylene glycol monomethyl ether acetate was added, and the mixture was heated to 80°C while stirring.
- Example 1 (1) Preparation of Composition 1 30 parts of compound (I-1), 24 parts (solid content equivalent) of a dispersant (propylene glycol monomethyl ether acetate 60% solution, BYKLPN-6919, manufactured by BYK Corporation), 24 parts (solid content equivalent) of resin (B-1), 522 parts of propylene glycol monomethyl ether acetate, and 900 parts of 0.2 mm zirconia beads were mixed, and the resulting mixture was shaken for 1 hour using a paint conditioner (manufactured by LAU Corporation). Thereafter, the zirconia beads were removed by filtration to obtain composition 1.
- a dispersant propylene glycol monomethyl ether acetate 60% solution, BYKLPN-6919, manufactured by BYK Corporation
- resin (B-1) 5022 parts of propylene glycol monomethyl ether acetate
- 900 parts of 0.2 mm zirconia beads were mixed, and the resulting mixture was shaken for 1 hour using a paint conditioner (manufacture
- composition 1 was diluted with propylene glycol monomethyl ether acetate so that the content of compound (I-1) in composition 1 was 10 ppm, and the absorbance was measured in the wavelength range of 300 to 1400 nm (data sampling interval 1 nm).
- the maximum absorption wavelength ⁇ max was 830 nm.
- the ratio Abs(780)/Abs( ⁇ max ) of the absorbance Abs(780) at a wavelength of 780 nm to the absorbance Abs( ⁇ max ) at ⁇ max was calculated to be 1.0.
- the ratio Abs(900-1400)/Abs( ⁇ max ) of the maximum absorbance Abs(900-1400) at a wavelength range of 900 to 1400 nm to Abs( ⁇ max ) was calculated to be 0.11.
- the viscosity of Composition 1 was measured using a Brookfield viscometer (23° C.) and evaluated on a 5-point scale. The evaluation criteria were as follows: 1: 0 or more and less than 8 mPa ⁇ s 2: 8 or more and less than 20 mPa ⁇ s 3: 20 or more and less than 1,000 mPa ⁇ s 4: 1,000 or more but less than 10,000 mPa ⁇ s 5: 10,000 or more mPas
- the high viscosity is considered to be due to aggregation of the pigments caused by the low stability of the dispersion of the near-infrared absorbing pigment contained in the composition. If the viscosity of the dispersion of the near-infrared absorbing pigment is low, the stability of the dispersion is high, and it is preferable that the dispersion is easy to handle during the production process of the optical filter.
- Curable composition 1 was obtained by mixing the following components.
- Composition 1 720 parts Resin (B): Resin (B-1) 73 parts (solid equivalent)
- Comparative Example 1 Comparative composition 1, comparative curable composition 1, and comparative optical filter 1 were prepared in the same manner as composition 1, curable composition 1, and optical filter 1 in Example 1, respectively, except that the compound (I-1) was replaced with the same amount of Lumogen (registered trademark) F Orange 240 (manufactured by Tokyo Chemical Industry Co., Ltd.) represented by the following formula. Comparative composition 1 and comparative optical filter 1 were subjected to various evaluations (viscosity, presence or absence of aggregates, and light resistance test) in the same manner as in Example 1.
- Lumogen registered trademark
- F Orange 240 manufactured by Tokyo Chemical Industry Co., Ltd.
- Example 1 The results of various evaluations (viscosity, presence or absence of aggregates, and light resistance test) in Example 1 and Comparative Example 1 are shown in Table 1.
- compositions 2 to 4 Curable compositions 2 to 4, and optical filters 2 to 4 are prepared in the same manner as the composition 1, curable composition 1, and optical filter 1 of Example 1, respectively, except that compound (I-1) is replaced with compound (I-2), (I-3), or (I-4).
- Various evaluations viscosity, presence or absence of aggregates, and light resistance test) are performed on compositions 2 to 4 and optical filters 2 to 4 in the same manner as in Example 1.
- compositions 2 to 4 containing compounds (I-2) to (I-4) as near-infrared absorbing dyes have low viscosity, and optical filters 2 to 4 prepared from curable compositions 2 to 4 containing compounds (I-2) to (I-4), respectively, have no aggregates and are excellent in light resistance.
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Abstract
The present invention addresses the problem of providing a composition capable of forming an optical filter that has fewer aggregates. The present invention relates to a composition comprising a near-infrared absorbing dye, an alkali-soluble resin, and a solvent, wherein the near-infrared absorbing dye comprises a compound represented by formula (I). (In formula (I), R1, R4, R5, and R8 each independently represent a C1-20 hydrocarbon group or the like; R2, R3, R6, and R7 each independently represent a hydrogen atom or the like; R9, R10, and R11 each independently represent a C1-20 hydrocarbon group, and if two or more R11 moieties are present, said moieties may be the same or different; X1-X4 each independently represent a hydrogen atom or the like; Y1-Y8 each independently represent a hydrogen atom or the like; and R12 represents a C1-5 alkyl group, and if two or more R12 moieties are present, said moieties may be the same or different)
Description
本発明は、組成物、光学フィルタ及び固体撮像素子に関する。
The present invention relates to a composition, an optical filter, and a solid-state imaging device.
液晶表示装置、エレクトロルミネッセンス表示装置、プラズマディスプレイ等の表示装置及びCCD、CMOSセンサ等の固体撮像素子に使用される光学フィルタの一例として、近赤外線を吸収するフィルタがある。このような近赤外線を吸収するフィルタを作製するための材料として、例えば、シアニン構造を有する化合物等の近赤外吸収色素を含有する組成物が知られている(例えば、特許文献1)。
One example of an optical filter used in displays such as liquid crystal displays, electroluminescent displays, and plasma displays, and in solid-state imaging devices such as CCD and CMOS sensors, is a filter that absorbs near-infrared radiation. As a material for producing such filters that absorb near-infrared radiation, for example, a composition containing a near-infrared absorbing dye such as a compound having a cyanine structure is known (for example, Patent Document 1).
近赤外吸収色素を含有する従来の組成物から光学フィルタを形成すると、近赤外吸収色素に起因する凝集物が生じる場合があった。そこで本発明は、凝集物が低減された光学フィルタを形成することのできる組成物を提供することを目的とする。また、本発明は、そのような組成物の調製に使用することのできる化合物、及び該化合物の簡便な製造方法を提供することも目的とする。
When an optical filter is formed from a conventional composition containing a near-infrared absorbing dye, aggregates due to the near-infrared absorbing dye may occur. Therefore, the present invention aims to provide a composition that can form an optical filter with reduced aggregates. The present invention also aims to provide a compound that can be used to prepare such a composition, and a simple method for producing the compound.
本発明は以下の側面を有する。
[1] 近赤外吸収色素、アルカリ可溶性樹脂、及び溶剤を含有する組成物であって、
前記近赤外吸収色素は式(I)で表される化合物を含む、組成物。 The present invention has the following aspects.
[1] A composition containing a near-infrared absorbing dye, an alkali-soluble resin, and a solvent,
The composition, wherein the near infrared absorbing dye comprises a compound represented by formula (I):
[1] 近赤外吸収色素、アルカリ可溶性樹脂、及び溶剤を含有する組成物であって、
前記近赤外吸収色素は式(I)で表される化合物を含む、組成物。 The present invention has the following aspects.
[1] A composition containing a near-infrared absorbing dye, an alkali-soluble resin, and a solvent,
The composition, wherein the near infrared absorbing dye comprises a compound represented by formula (I):
R1、R4、R5、及びR8は、それぞれ独立に、炭素数1~20の炭化水素基、ハロゲン原子、又はOR11基を表し、
R2、R3、R6、及びR7は、それぞれ独立に、水素原子、ハロゲン原子、又はOR11基を表し、
R9、R10、及びR11は、それぞれ独立に、炭素数1~20の炭化水素基を表し、
2以上のR11が存在する場合、それらは互いに同一でも異なっていてもよく、
X1~X4は、それぞれ独立に、水素原子は炭素数1~10のアルキル基を表し、
Y1~Y8は、それぞれ独立に、水素原子、炭素数1~5のアルキル基、又はOR12基を表し、
R12は、炭素数1~5のアルキル基を表し、2以上のR12が存在する場合、それらは互いに同一でも異なっていてもよい。]
[2] 前記式(I)におけるX1~X4及びY1~Y8が水素原子である、[1]に記載の組成物。
[3] 重合開始剤及び重合性化合物をさらに含有する、[2]に記載の組成物。
[4] [1]~[3]のいずれかに記載の組成物より形成される、光学フィルタ。
[5] [4]に記載の光学フィルタを含む、固体撮像素子。
[6] 式(Ia)で表される化合物。
R 1 , R 4 , R 5 , and R 8 each independently represent a hydrocarbon group having 1 to 20 carbon atoms, a halogen atom, or an OR 11 group;
R 2 , R 3 , R 6 and R 7 each independently represent a hydrogen atom, a halogen atom or an OR 11 group;
R 9 , R 10 , and R 11 each independently represent a hydrocarbon group having 1 to 20 carbon atoms;
When two or more R 11 are present, they may be the same or different from each other;
X 1 to X 4 each independently represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms;
Y 1 to Y 8 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an OR 12 group;
R 12 represents an alkyl group having 1 to 5 carbon atoms, and when two or more R 12 are present, they may be the same or different.
[2] The composition according to [1], wherein X 1 to X 4 and Y 1 to Y 8 in formula (I) are hydrogen atoms.
[3] The composition according to [2], further comprising a polymerization initiator and a polymerizable compound.
[4] An optical filter formed from the composition according to any one of [1] to [3].
[5] A solid-state imaging device comprising the optical filter according to [4].
[6] A compound represented by formula (Ia):
[式(Ia)中、
R1a、R4a、R5a、及びR8aは、それぞれ独立に、ハロゲン原子を表し、
R2a、R3a、R6a、及びR7aは、それぞれ独立に、水素原子、ハロゲン原子、
又はOR11a基を表し、
R9及びR10は、それぞれ独立に、炭素数1~20の炭化水素基を表し、
R11aは、炭素数1~13の炭化水素基を表し、2以上のR11aが存在する場合、
それらは互いに同一でも異なっていてもよく、
X1~X4は、それぞれ独立に、水素原子は炭素数1~10のアルキル基を表し、
Y1~Y8は、それぞれ独立に、水素原子、炭素数1~5のアルキル基、又はOR12基を表し、
R12は、炭素数1~5のアルキル基を表し、2以上のR12が存在する場合、それらは互いに同一でも異なっていてもよい。]
[7] 式(I-x1)で表される化合物と、式(I-x2)で表される化合物と、式(I-y1)で表される化合物又は式(I-y2)で表される化合物とを、触媒の存在下で反応させる工程を含む、式(I)で表される化合物の製造方法。
[In formula (Ia),
R 1a , R 4a , R 5a , and R 8a each independently represent a halogen atom;
R 2a , R 3a , R 6a , and R 7a each independently represent a hydrogen atom, a halogen atom,
or OR 11a group,
R 9 and R 10 each independently represent a hydrocarbon group having 1 to 20 carbon atoms;
R 11a represents a hydrocarbon group having 1 to 13 carbon atoms, and when two or more R 11a are present,
They may be the same or different from each other,
X 1 to X 4 each independently represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms;
Y 1 to Y 8 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an OR 12 group;
R 12 represents an alkyl group having 1 to 5 carbon atoms, and when two or more R 12 are present, they may be the same or different.
[7] A method for producing a compound represented by formula (I), comprising a step of reacting a compound represented by formula (I-x1), a compound represented by formula (I-x2), and a compound represented by formula (I-y1) or a compound represented by formula (I-y2) in the presence of a catalyst.
[式(I-x1)及び(I-x2)中、
R1、R4、R5、及びR8は、それぞれ独立に、炭素数1~20の炭化水素基、ハロゲン原子、又はOR11基を表し、
R2、R3、R6、及びR7は、それぞれ独立に、水素原子、ハロゲン原子、又はOR11基を表し、
R9、R10、及びR11は、それぞれ独立に、炭素数1~20の炭化水素基を表し、
2以上のR11が存在する場合、それらは互いに同一でも異なっていてもよく、
X1~X4は、それぞれ独立に、水素原子は炭素数1~10のアルキル基を表し、
Y1、Y4、Y5、及びY8は、それぞれ独立に、水素原子、炭素数1~5のアルキル基、又はOR12基を表し、
R12は、炭素数1~5のアルキル基を表し、2以上のR12が存在する場合、それらは互いに同一でも異なっていてもよく、
Z1~Z4は、それぞれ独立に、臭素原子又はヨウ素原子を表す。]
[In formulas (I-x1) and (I-x2),
R 1 , R 4 , R 5 , and R 8 each independently represent a hydrocarbon group having 1 to 20 carbon atoms, a halogen atom, or an OR 11 group;
R 2 , R 3 , R 6 and R 7 each independently represent a hydrogen atom, a halogen atom or an OR 11 group;
R 9 , R 10 , and R 11 each independently represent a hydrocarbon group having 1 to 20 carbon atoms;
When two or more R 11 are present, they may be the same or different from each other;
X 1 to X 4 each independently represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms;
Y 1 , Y 4 , Y 5 , and Y 8 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an OR 12 group;
R 12 represents an alkyl group having 1 to 5 carbon atoms, and when two or more R 12 are present, they may be the same or different from each other.
Z 1 to Z 4 each independently represent a bromine atom or an iodine atom.]
Y2、Y3、Y6、及びY7は、それぞれ独立に、水素原子、炭素数1~5のアルキル基、又はOR12基を表し、
A1及びA2は、それぞれ独立に、ヒドロキシ基、炭素数1~20の炭化水素基又はOR13基を表し、
R13は、炭素数1~20の炭化水素を表し、2以上のR13が存在する場合、それらは互いに同一でも異なっていてもよく、
同じホウ素原子に結合するOR13基同士は、互いに結合して環を形成していてもよい。]
Y 2 , Y 3 , Y 6 , and Y 7 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an OR 12 group;
A 1 and A 2 each independently represent a hydroxyl group, a hydrocarbon group having 1 to 20 carbon atoms, or an OR 13 group;
R 13 represents a hydrocarbon having 1 to 20 carbon atoms, and when two or more R 13 are present, they may be the same or different from each other;
OR 13 groups bonded to the same boron atom may be bonded to each other to form a ring.
本発明によれば、凝集物が低減された光学フィルタを形成することのできる組成物が提供される。また、本発明によれば、凝集物が低減された光学フィルタ、及び該光学フィルタを含む固体撮像素子が提供される。さらに、本発明によれば、上記組成物の調製に使用することのできる化合物、及び該化合物の簡便な(より具体的には、工程数の少ない)製造方法が提供される。
The present invention provides a composition capable of forming an optical filter with reduced aggregates. The present invention also provides an optical filter with reduced aggregates, and a solid-state imaging device including the optical filter. Furthermore, the present invention provides a compound that can be used to prepare the composition, and a simple (more specifically, a simple method for producing the compound with a small number of steps).
<組成物>
本発明の一側面に係る組成物は、近赤外吸収色素、アルカリ可溶性樹脂、及び溶剤(以下、それぞれ近赤外吸収色素(A1)、樹脂(B)、及び溶剤(E)という場合がある。)を含有する。組成物は、重合性化合物、重合開始剤、及びレベリング剤(以下、それぞれ重合性化合物(C)、重合開始剤(D)、及びレベリング剤(F)という場合がある。)のうち1種以上をさらに含有してもよい。本明細書において、各成分として例示する化合物は、特に断りのない限り、単独で使用してもよく、複数種の化合物を組合せて使用してもよい。 <Composition>
The composition according to one aspect of the present invention contains a near-infrared absorbing dye, an alkali-soluble resin, and a solvent (hereinafter, these may be referred to as the near-infrared absorbing dye (A1), the resin (B), and the solvent (E), respectively). The composition may further contain one or more of a polymerizable compound, a polymerization initiator, and a leveling agent (hereinafter, these may be referred to as the polymerizable compound (C), the polymerization initiator (D), and the leveling agent (F), respectively). In this specification, the compounds exemplified as each component may be used alone or in combination, unless otherwise specified.
本発明の一側面に係る組成物は、近赤外吸収色素、アルカリ可溶性樹脂、及び溶剤(以下、それぞれ近赤外吸収色素(A1)、樹脂(B)、及び溶剤(E)という場合がある。)を含有する。組成物は、重合性化合物、重合開始剤、及びレベリング剤(以下、それぞれ重合性化合物(C)、重合開始剤(D)、及びレベリング剤(F)という場合がある。)のうち1種以上をさらに含有してもよい。本明細書において、各成分として例示する化合物は、特に断りのない限り、単独で使用してもよく、複数種の化合物を組合せて使用してもよい。 <Composition>
The composition according to one aspect of the present invention contains a near-infrared absorbing dye, an alkali-soluble resin, and a solvent (hereinafter, these may be referred to as the near-infrared absorbing dye (A1), the resin (B), and the solvent (E), respectively). The composition may further contain one or more of a polymerizable compound, a polymerization initiator, and a leveling agent (hereinafter, these may be referred to as the polymerizable compound (C), the polymerization initiator (D), and the leveling agent (F), respectively). In this specification, the compounds exemplified as each component may be used alone or in combination, unless otherwise specified.
本側面に係る組成物は、近赤外吸収色素として、後述する式(I)で表される化合物を含むため、成膜しても、近赤外吸収色素に起因する凝集物が生じにくい。したがって、本側面に係る組成物によれば、凝集物が低減された光学フィルタを形成することができる。
形成された光学フィルタは、耐光性にも優れる。また、後述するように、式(I)で表される化合物は、近赤外領域における特定の波長を吸収するため、形成された光学フィルタは、近赤外線カットフィルタ又は近赤外線透過フィルタとして利用できる。 The composition according to this aspect contains a compound represented by formula (I) described below as a near-infrared absorbing dye, and therefore aggregates caused by the near-infrared absorbing dye are unlikely to occur even when the composition is formed into a film. Therefore, the composition according to this aspect can form an optical filter with reduced aggregates.
The optical filter thus formed is excellent in light resistance. In addition, as described later, since the compound represented by formula (I) absorbs a specific wavelength in the near-infrared region, the optical filter thus formed can be used as a near-infrared cut filter or a near-infrared transmission filter.
形成された光学フィルタは、耐光性にも優れる。また、後述するように、式(I)で表される化合物は、近赤外領域における特定の波長を吸収するため、形成された光学フィルタは、近赤外線カットフィルタ又は近赤外線透過フィルタとして利用できる。 The composition according to this aspect contains a compound represented by formula (I) described below as a near-infrared absorbing dye, and therefore aggregates caused by the near-infrared absorbing dye are unlikely to occur even when the composition is formed into a film. Therefore, the composition according to this aspect can form an optical filter with reduced aggregates.
The optical filter thus formed is excellent in light resistance. In addition, as described later, since the compound represented by formula (I) absorbs a specific wavelength in the near-infrared region, the optical filter thus formed can be used as a near-infrared cut filter or a near-infrared transmission filter.
<近赤外吸収色素(A1)>
本明細書において、近赤外吸収色素とは、近赤外領域(781nm~3μm)における波長を吸収する色素を意味する。近赤外吸収色素(A1)は、式(I)で表される化合物を1種以上含む。近赤外吸収色素(A1)は、式(I)で表される化合物からなってもよい。 <Near infrared absorbing dye (A1)>
In this specification, the near-infrared absorbing dye means a dye that absorbs wavelengths in the near-infrared region (781 nm to 3 μm). The near-infrared absorbing dye (A1) contains one or more compounds represented by formula (I). The near-infrared absorbing dye (A1) may consist of a compound represented by formula (I).
本明細書において、近赤外吸収色素とは、近赤外領域(781nm~3μm)における波長を吸収する色素を意味する。近赤外吸収色素(A1)は、式(I)で表される化合物を1種以上含む。近赤外吸収色素(A1)は、式(I)で表される化合物からなってもよい。 <Near infrared absorbing dye (A1)>
In this specification, the near-infrared absorbing dye means a dye that absorbs wavelengths in the near-infrared region (781 nm to 3 μm). The near-infrared absorbing dye (A1) contains one or more compounds represented by formula (I). The near-infrared absorbing dye (A1) may consist of a compound represented by formula (I).
式(I)中、R1、R4、R5、及びR8は、それぞれ独立に、炭素数1~20の炭化水素基、ハロゲン原子、又はOR11基を表す。R1、R4、R5、及びR8は、好ましくはハロゲン原子又はOR11基であり、より好ましくは塩素原子又はOR11基である。
In formula (I), R 1 , R 4 , R 5 , and R 8 each independently represent a hydrocarbon group having 1 to 20 carbon atoms, a halogen atom, or an OR 11 group. R 1 , R 4 , R 5 , and R 8 are preferably a halogen atom or an OR 11 group, and more preferably a chlorine atom or an OR 11 group.
R1、R4、R5、又はR8で表される炭素数1~20の炭化水素基としては、脂肪族炭化水素基及び芳香族炭化水素基が挙げられる。脂肪族炭化水素基は、飽和又は不飽和であってもよく、鎖状又は脂環式であってもよい。
Examples of the hydrocarbon group having 1 to 20 carbon atoms represented by R 1 , R 4 , R 5 , or R 8 include aliphatic hydrocarbon groups and aromatic hydrocarbon groups. The aliphatic hydrocarbon group may be saturated or unsaturated, and may be linear or alicyclic.
R1、R4、R5、又はR8で表される飽和又は不飽和鎖状炭化水素基としては、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、ウンデシル基、ドデシル基、トリデシル基、テトラデシル基、ペンタデシル基、ヘキサデシル基、ヘプタデシル基、オクタデシル基、ノナデシル基、イコシル基等の直鎖状アルキル基;イソプロピル基、(1-メチル)プロピル基、(1-エチル)プロピル基、イソブチル基、sec-ブチル基、tert-ブチル基、(1-エチル)ブチル基、(2-エチル)ブチル基、(1-プロピル)ブチル基、イソペンチル基、ネオペンチル基、tert-ペンチル基、(2-メチル)ペンチル基、(1-エチル)ペンチル基、(3-エチル)ペンチル基、(1-プロピル)ペンチル基、(1-ブチル)ペンチル基、イソヘキシル基、(2-メチル)ヘキシル基、(5-メチル)ヘキシル基、(2-エチル)ヘキシル基、(1-ブチル)ヘキシル基、(1-ペンチル)ヘキシル基、(2-メチル)ヘプチル基、(2-エチル)ヘプチル基、(3-エチル)ヘプチル基、(1-ヘキシル)ヘプチル基、(2-メチル)オクチル基、(2-エチル)オクチル基、(1-ヘプチル)オクチル基、(2-エチル)ノニル基、(1-オクチル)ノニル基等の分枝鎖状アルキル基;ビニル基、1-プロペニル基、2-プロペニル基(アリル基)、(1-メチル)エテニル基、2-ブテニル基、3-ブテニル基、1,3-ブタジエニル基、(1-(2-プロペニル))エテニル基、(1,2-ジメチル)プロペニル基、2-ペンテニル基等のアルケニル基等が挙げられる。飽和鎖状炭化水素基の炭素数は、1~18が好ましく、より好ましくは2~15、さらに好ましくは3~12である。また不飽和鎖状炭化水素基の炭素数は、2~18が好ましく、より好ましくは2~15、さらに好ましくは3~12である。
Examples of the saturated or unsaturated chain hydrocarbon group represented by R 1 , R 4 , R 5 , or R 8 include linear alkyl groups such as methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, undecyl, dodecyl, tridecyl, tetradecyl, pentadecyl, hexadecyl, heptadecyl, octadecyl, nonadecyl, and icosyl groups; isopropyl, (1-methyl)propyl, (1-ethyl)propyl, isobutyl, sec-butyl, tert-butyl, (1-ethyl)butyl, (2-ethyl)butyl, (1-propyl)butyl, isopentyl, neopentyl, tert-pentyl, (2-methyl)pentyl, (1-ethyl)pentyl, (3-ethyl)pentyl, (1-propyl)pentyl, (1-propyl)pentyl, and (butyl)pentyl group, isohexyl group, (2-methyl)hexyl group, (5-methyl)hexyl group, (2-ethyl)hexyl group, (1-butyl)hexyl group, (1-pentyl)hexyl group, (2-methyl)heptyl group, (2-ethyl)heptyl group, (3-ethyl)heptyl group, (1-hexyl)heptyl group, (2-methyl)octyl group, (2-ethyl)octyl group, (1-heptyl) Examples of the alkyl groups include branched alkyl groups such as octyl, (2-ethyl)nonyl, and (1-octyl)nonyl; and alkenyl groups such as vinyl, 1-propenyl, 2-propenyl (allyl), (1-methyl)ethenyl, 2-butenyl, 3-butenyl, 1,3-butadienyl, (1-(2-propenyl))ethenyl, (1,2-dimethyl)propenyl, and 2-pentenyl. The number of carbon atoms in the saturated chain hydrocarbon group is preferably 1 to 18, more preferably 2 to 15, and even more preferably 3 to 12. The number of carbon atoms in the unsaturated chain hydrocarbon group is preferably 2 to 18, more preferably 2 to 15, and even more preferably 3 to 12.
R1、R4、R5、又はR8で表される飽和又は不飽和脂環式炭化水素基としては、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基、シクロオクチル基等のシクロアルキル基;シクロヘキセニル基(例えばシクロヘキサ-2-エン、シクロヘキサ-3-エン)、シクロヘプテニル基、シクロオクテニル基等のシクロアルケニル基;ノルボルニル基、アダマンチル基、ビシクロ[2.2.2]オクチル基等が挙げられる。飽和又は不飽和脂環式炭化水素基の炭素数は、3~15が好ましく、より好ましくは3~12である。
Examples of the saturated or unsaturated alicyclic hydrocarbon group represented by R 1 , R 4 , R 5 , or R 8 include cycloalkyl groups such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, and cyclooctyl groups; cycloalkenyl groups such as cyclohexenyl groups (e.g., cyclohex-2-ene, cyclohex-3-ene), cycloheptenyl, and cyclooctenyl groups; norbornyl, adamantyl, and bicyclo[2.2.2]octyl groups. The number of carbon atoms in the saturated or unsaturated alicyclic hydrocarbon group is preferably 3 to 15, and more preferably 3 to 12.
R1、R4、R5、又はR8で表される芳香族炭化水素基としては、フェニル基、1-ナフチル基、2-ナフチル基、フェナントリル基、アントリル基、ピレニル基等が挙げられる。芳香族炭化水素基の炭素数は、6~15が好ましく、より好ましくは6~12である。
Examples of the aromatic hydrocarbon group represented by R 1 , R 4 , R 5 , or R 8 include a phenyl group, a 1-naphthyl group, a 2-naphthyl group, a phenanthryl group, an anthryl group, a pyrenyl group, etc. The aromatic hydrocarbon group preferably has 6 to 15 carbon atoms, more preferably 6 to 12 carbon atoms.
R1、R4、R5、又はR8で表される炭化水素基は、炭素数の上限が20以下である限り、上記に挙げた鎖状炭化水素基、脂環式炭化水素基、及び芳香族炭化水素基のうち2つ以上組み合わせた基であってもよい。このような基は、例えば、芳香族炭化水素基と、鎖状炭化水素基、脂環式炭化水素基及び芳香族炭化水素基から選ばれる基の少なくとも1つとを組み合わせた基であってよく、該組み合わせによる炭化水素基では、鎖状炭化水素基を、2価の基(例えば、アルカンジイル基)として組み合わせてもよい。組み合わせによる炭化水素基の例としては、ベンジル基、フェネチル基、1-メチル-1-フェニルエチル基、tert-ブチルフェニル基、tert-オクチルフェニル基、tert-ブチルベンジル基、tert-オクチルベンジル基等のアラルキル基;フェニルエテニル基(フェニルビニル基)等のアリールアルケニル基;フェニルエチニル基等のアリールアルキニル基;o-トリル基、m-トリル基、p-トリル基、2-エチルフェニル基、3-エチルフェニル基、4-エチルフェニル基、2,3-ジメチルフェニル基、2,4-ジメチルフェニル基、2,5-ジメチルフェニル基、2,6-ジメチルフェニル基、3,4-ジメチルフェニル基、3,5-ジメチルフェニル基、4-ビニルフェニル基、o-イソプロピルフェニル基、m-イソプロピルフェニル基、p-イソプロピルフェニル基、2,3-ジイソプロピルフェニル基、2,4-ジイソプロピルフェニル基、2,5-ジイソプロピルフェニル基、2,6-ジイソプロピルフェニル基、2,4,6-トリイソプロピルフェニル基、4-ブチルフェニル基、o-tert-ブチルフェニル基、m-tert-ブチルフェニル基、p-tert-ブチルフェニル基、2,6-ジ(tert-ブチル)フェニル基、3,5-ジ(tert-ブチル)フェニル基、3,6-ジ(tert-ブチル)フェニル基、4-tert-ブチル-2,6-ジメチルフェニル基、4-ペンチルフェニル基、4-オクチルフェニル基、4-(2,4,4-トリメチル-2-ペンチル)フェニル基、2-ドデシルフェニル基、3-ドデシルフェニル基、4-ドデシルフェニル基等のアルキルアリール基;2,3-ジヒドロ-4-インデニル基、1,2,3,5,6,7-ヘキサヒドロ-4-s-インダセニル基、8-メチル-1,2,3,5,6,7-ヘキサヒドロ-4-s-インダセニル基、5,6,7,8-テトラヒドロ-1-ナフチル基、5,6,7,8-テトラヒドロ-2-ナフチル基、3-メチル-5,6,7,8-テトラヒドロ-2-ナフチル基、3,5,5,8,8-ペンタメチル-5,6,7,8-テトラヒドロ-2-ナフチル基等のアルカンジイル基が結合して環を形成したアリール基;ビフェニリル基、ターフェニリル基等の1つ以上のアリール基が結合したアリール基;シクロヘキシルメチルフェニル基、ベンジルフェニル基、(ジメチル(フェニル)メチル)フェニル基等が挙げられる。また上記炭化水素基は、例えば、鎖状炭化水素基と脂環式炭化水素基との組み合わせによる炭化水素基であってよく、その例として、1-メチルシクロプロピル基、1-メチルシクロヘキシル基、2-メチルシクロヘキシル基、3-メチルシクロヘキシル基、4-メチルシクロヘキシル基、1,2-ジメチルシクロヘキシル基、1,3-ジメチルシクロヘキシル基、1,4-ジメチルシクロヘキシル基、2,3-ジメチルシクロヘキシル基、2,4-ジメチルシクロヘキシル基、2,5-ジメチルシクロヘキシル基、2,6-ジメチルシクロヘキシル基、3,4-ジメチルシクロヘキシル基、3,5-ジメチルシクロヘキシル基、2,2-ジメチルシクロヘキシル基、3,3-ジメチルシクロヘキシル基、4,4-ジメチルシクロヘキシル基、2,4,6-トリメチルシクロヘキシル基、2,2,6,6-テトラメチルシクロヘキシル基、3,3,5,5-テトラメチルシクロヘキシル基、4-ペンチルシクロヘキシル基、4-オクチルシクロヘキシル基、4-シクロヘキシルシクロヘキシル基等の1以上のアルキル基が結合した脂環式炭化水素基;シクロプロピルメチル基、シクロプロピルエチル基、シクロブチルメチル基、シクロブチルエチル基、シクロペンチルメチル基、シクロペンチルエチル基、シクロヘキシルメチル基、2-メチルシクロヘキシルメチル基、シクロヘキシルエチル基、アダマンチルメチル基等の1以上の脂環式炭化水素基が結合したアルキル基等が挙げられる。鎖状炭化水素基、脂環式炭化水素基、及び芳香族炭化水素基のうち2つ以上組み合わせた基の炭素数は、好ましくは6~18又は7~18、より好ましくは6~15又は7~15である。
The hydrocarbon group represented by R 1 , R 4 , R 5 , or R 8 may be a group obtained by combining two or more of the above-mentioned chain hydrocarbon groups, alicyclic hydrocarbon groups, and aromatic hydrocarbon groups, so long as the upper limit of the carbon number is not more than 20. Such a group may be, for example, a group obtained by combining an aromatic hydrocarbon group with at least one group selected from a chain hydrocarbon group, an alicyclic hydrocarbon group, and an aromatic hydrocarbon group, and in such a combined hydrocarbon group, the chain hydrocarbon group may be combined as a divalent group (for example, an alkanediyl group). Examples of the combined hydrocarbon groups include aralkyl groups such as benzyl group, phenethyl group, 1-methyl-1-phenylethyl group, tert-butylphenyl group, tert-octylphenyl group, tert-butylbenzyl group, and tert-octylbenzyl group; arylalkenyl groups such as phenylethenyl group (phenylvinyl group); arylalkynyl groups such as phenylethynyl group; o-tolyl group, m-tolyl group, p-tolyl group, 2-ethylphenyl group, 3-ethylphenyl group, 4-ethylphenyl group, 2,3-dimethylphenyl group, 2,4-dimethylphenyl group, 2,5-dimethylphenyl group, 2,6-dimethylphenyl group, 2,7-dimethylphenyl group, 2,8-dimethylphenyl group, 2,9-dimethylphenyl group, 3,10-dimethylphenyl group, 3,11-dimethylphenyl group, 3,12-dimethylphenyl group, 3,13-dimethylphenyl group, 3,14-dimethylphenyl group, 3,15-dimethylphenyl group, 3,16-dimethylphenyl group, 3,17-dimethylphenyl group, 3,18-dimethylphenyl group, 3,19-dimethylphenyl group, 3,20-dimethylphenyl group, 3,21-dimethylphenyl group, 3,22-dimethylphenyl group, 3,23-dimethylphenyl group, 3,24-dimethylphenyl group, 3,25-dimethylphenyl group, 3,26-dimethylphenyl group, 3,27-dimethylphenyl group, 3,28-dimethylphenyl group, 3,29-dimethylphenyl group, 3,30-dimethylphenyl group, 3,31-dimethylphenyl group, 3,32-dimethylphenyl group, 3,33-dimethylphenyl group, 3,40-dimethylphenyl group, 3,41-dimethylphenyl group, 3,42-dimethylphenyl group, 3,43-dimethylphenyl group, 3,44-dimethylphenyl group, 3,45 ,5-dimethylphenyl group, 2,6-dimethylphenyl group, 3,4-dimethylphenyl group, 3,5-dimethylphenyl group, 4-vinylphenyl group, o-isopropylphenyl group, m-isopropylphenyl group, p-isopropylphenyl group, 2,3-diisopropylphenyl group, 2,4-diisopropylphenyl group, 2,5-diisopropylphenyl group, 2,6-diisopropylphenyl group, 2,4,6-triisopropylphenyl group, 4-butylphenyl group, o-tert-butylphenyl group, m-tert-butylphenyl group, p-tert-butylphenyl group , alkylaryl groups such as 2,6-di(tert-butyl)phenyl group, 3,5-di(tert-butyl)phenyl group, 3,6-di(tert-butyl)phenyl group, 4-tert-butyl-2,6-dimethylphenyl group, 4-pentylphenyl group, 4-octylphenyl group, 4-(2,4,4-trimethyl-2-pentyl)phenyl group, 2-dodecylphenyl group, 3-dodecylphenyl group, and 4-dodecylphenyl group; 2,3-dihydro-4-indenyl group, 1,2,3,5,6,7-hexahydro-4-s-indacenyl group, 8-methyl-1,2,3,5,6,7 aryl groups to which alkanediyl groups are bonded to form a ring, such as -hexahydro-4-s-indacenyl group, 5,6,7,8-tetrahydro-1-naphthyl group, 5,6,7,8-tetrahydro-2-naphthyl group, 3-methyl-5,6,7,8-tetrahydro-2-naphthyl group, and 3,5,5,8,8-pentamethyl-5,6,7,8-tetrahydro-2-naphthyl group; aryl groups to which one or more aryl groups are bonded, such as a biphenylyl group and a terphenylyl group; cyclohexylmethylphenyl group, benzylphenyl group, and (dimethyl(phenyl)methyl)phenyl group. The hydrocarbon group may be, for example, a hydrocarbon group formed by combining a chain hydrocarbon group and an alicyclic hydrocarbon group, and examples thereof include a 1-methylcyclopropyl group, a 1-methylcyclohexyl group, a 2-methylcyclohexyl group, a 3-methylcyclohexyl group, a 4-methylcyclohexyl group, a 1,2-dimethylcyclohexyl group, a 1,3-dimethylcyclohexyl group, a 1,4-dimethylcyclohexyl group, a 2,3-dimethylcyclohexyl group, a 2,4-dimethylcyclohexyl group, a 2,5-dimethylcyclohexyl group, a 2,6-dimethylcyclohexyl group, a 3,4-dimethylcyclohexyl group, a 3,5-dimethylcyclohexyl group, a 2,2-dimethylcyclohexyl group, a 3,3-dimethylcyclohexyl group, and the like. and alkyl groups having one or more alicyclic hydrocarbon groups bonded thereto, such as a cyclopropylmethyl group, a cyclopropylethyl group, a cyclobutylmethyl group, a cyclobutylethyl group, a cyclopentylmethyl group, a cyclopentylethyl group, a cyclohexylmethyl group, a 2-methylcyclohexylmethyl group, a cyclohexylethyl group, and an adamantylmethyl group. The number of carbon atoms in a group consisting of two or more of a chain hydrocarbon group, an alicyclic hydrocarbon group, and an aromatic hydrocarbon group is preferably 6 to 18 or 7 to 18, and more preferably 6 to 15 or 7 to 15.
R1、R4、R5、又はR8で表されるハロゲン原子は、例えば、フッ素原子、塩素原子、臭素原子、又はヨウ素原子であってよい。ハロゲン原子は、好ましくは塩素原子である。
The halogen atom represented by R 1 , R 4 , R 5 or R 8 may be, for example, a fluorine atom, a chlorine atom, a bromine atom or an iodine atom. The halogen atom is preferably a chlorine atom.
R11は炭素数1~20の炭化水素基を表す。式(I)中に2以上のR11が存在する場合、それらは互いに同一でも異なっていてもよい。R11で表される炭素数1~20の炭化水素基としては、例えば、R1、R4、R5、又はR8で表される炭素数1~20の炭化水素基として例示した基が挙げられる。炭素数1~20の炭化水素基としては、芳香族炭化水素基が好ましく、フェニル基、トリル基、メトキシフェニル基、プロポキシフェニル基、tert-ブチルフェニル基、又はtert-オクチルフェニル基がより好ましく、プロポキシフェニル基又はtert-ブチルフェニル基が最も好ましい。炭化水素基の炭素数は、好ましくは6~15、より好ましくは6~12、さらに好ましくは6~10である。
R 11 represents a hydrocarbon group having 1 to 20 carbon atoms. When two or more R 11 are present in formula (I), they may be the same or different from each other. Examples of the hydrocarbon group having 1 to 20 carbon atoms represented by R 11 include the groups exemplified as the hydrocarbon group having 1 to 20 carbon atoms represented by R 1 , R 4 , R 5 , or R 8. The hydrocarbon group having 1 to 20 carbon atoms is preferably an aromatic hydrocarbon group, more preferably a phenyl group, a tolyl group, a methoxyphenyl group, a propoxyphenyl group, a tert-butylphenyl group, or a tert-octylphenyl group, and most preferably a propoxyphenyl group or a tert-butylphenyl group. The number of carbon atoms in the hydrocarbon group is preferably 6 to 15, more preferably 6 to 12, and even more preferably 6 to 10.
式(I)中、R2、R3、R6、及びR7は、それぞれ独立に、水素原子、ハロゲン原子、又はOR11基を表す。R11は上記で定義したとおりである。R2、R3、R6、及びR7は、好ましくはハロゲン原子である。R2、R3、R6、又はR7で表されるハロゲン原子は、例えば、フッ素原子、塩素原子、臭素原子、又はヨウ素原子であってよい。
In formula (I), R 2 , R 3 , R 6 and R 7 each independently represent a hydrogen atom, a halogen atom or an OR 11 group. R 11 is as defined above. R 2 , R 3 , R 6 and R 7 are preferably halogen atoms. The halogen atom represented by R 2 , R 3 , R 6 or R 7 may be, for example, a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
式(I)中、R9及びR10は、それぞれ独立に、炭素数1~20の炭化水素基を表す。R9又はR10で表される炭素数1~20の炭化水素基としては、例えば、R1、R4、R5、又はR8で表される炭素数1~20の炭化水素基として例示した基が挙げられる。また、炭素数1~20の炭素水素基としては、例えば、下記式(D-1)~(D-47)、又は式(G-1)~(G-24)で表される基も挙げられる。式中、*は結合手を表す。
In formula (I), R 9 and R 10 each independently represent a hydrocarbon group having 1 to 20 carbon atoms. Examples of the hydrocarbon group having 1 to 20 carbon atoms represented by R 9 or R 10 include the groups exemplified as the hydrocarbon group having 1 to 20 carbon atoms represented by R 1 , R 4 , R 5 or R 8. Examples of the hydrocarbon group having 1 to 20 carbon atoms include the groups represented by the following formulae (D-1) to (D-47) or formulae (G-1) to (G-24). In the formulae, * represents a bond.
なかでも、式(D-12)、(D-13)、(D-14)、(D-44)、(G-3)、(G-8)、(G-13)、(G-15)、又は(G-23)で表される基が好ましく、式(D-44)又は(G-8)で表される基がより好ましい。
Among these, groups represented by formula (D-12), (D-13), (D-14), (D-44), (G-3), (G-8), (G-13), (G-15), or (G-23) are preferred, and groups represented by formula (D-44) or (G-8) are more preferred.
式(I)中、X1~X4は、それぞれ独立に、水素原子は炭素数1~10のアルキル基を表す。X1~X4は、水素原子であることが好ましい。
In formula (I), X 1 to X 4 each independently represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms. X 1 to X 4 are preferably a hydrogen atom.
X1~X4で表される炭素数1~10のアルキル基としては、例えば、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、sec-ブチル基、tert-ブチル基、n-ペンチル基、ネオペンチル基、tert-ペンチル基、n-ヘキシル基、シクロヘキシル基、n-ヘプチル基、2-エチルヘキシル基、n-オクチル基、n-ノニル基及びn-デシル基が挙げられる。
Examples of the alkyl group having 1 to 10 carbon atoms represented by X 1 to X 4 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, an n-pentyl group, a neopentyl group, a tert-pentyl group, an n-hexyl group, a cyclohexyl group, an n-heptyl group, a 2-ethylhexyl group, an n-octyl group, an n-nonyl group, and an n-decyl group.
式(I)中、Y1~Y8は、それぞれ独立に、水素原子、炭素数1~5のアルキル基、又はOR12基を表す。Y1~Y8は、水素原子であることが好ましい。
In formula (I), Y 1 to Y 8 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an OR 12 group. Y 1 to Y 8 are preferably a hydrogen atom.
Y1~Y8で表される炭素数1~5のアルキル基としては、例えば、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、s-ブチル基、t-ブチル基、及びn-ペンチル基が挙げられる。
Examples of the alkyl group having 1 to 5 carbon atoms represented by Y 1 to Y 8 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, an s-butyl group, a t-butyl group, and an n-pentyl group.
R12は、炭素数1~5のアルキル基を表す。式(I)中に2以上のR12が存在する場合、それらは互いに同一でも異なっていてもよい。R12で表される炭素数1~5のアルキル基としては、例えば、Y1~Y8で表される炭素数1~5のアルキル基として例示した基が挙げられる。
R 12 represents an alkyl group having 1 to 5 carbon atoms. When two or more R 12 are present in formula (I), they may be the same or different from each other. Examples of the alkyl group having 1 to 5 carbon atoms represented by R 12 include the groups exemplified as the alkyl group having 1 to 5 carbon atoms represented by Y 1 to Y 8 .
式(I)で表される化合物は、好ましくは式(Ia)で表される化合物である。
The compound represented by formula (I) is preferably a compound represented by formula (Ia).
式(Ia)中、R9、R10、X1~X4、及びY1~Y8は、上記に定義したとおりである。
In formula (Ia), R 9 , R 10 , X 1 to X 4 , and Y 1 to Y 8 are as defined above.
式(Ia)中、R1a、R4a、R5a、及びR8aは、それぞれ独立に、ハロゲン原子を表す。ハロゲン原子は、例えば、フッ素原子、塩素原子、臭素原子、又はヨウ素原子であってよい。
In formula (Ia), R 1a , R 4a , R 5a and R 8a each independently represent a halogen atom. The halogen atom may be, for example, a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
式(Ia)中、R2a、R3a、R6a、及びR7aは、それぞれ独立に、水素原子、ハロゲン原子、又はOR11a基を表す。R2a、R3a、R6a、及びR7aは、好ましくはハロゲン原子である。ハロゲン原子は、例えば、フッ素原子、塩素原子、臭素原子、又はヨウ素原子であってよい。
In formula (Ia), R 2a , R 3a , R 6a and R 7a each independently represent a hydrogen atom, a halogen atom or an OR 11a group. R 2a , R 3a , R 6a and R 7a are preferably halogen atoms. The halogen atom may be, for example, a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
R11aは、炭素数1~13の炭化水素基を表し、2以上のR11aが存在する場合、それらは互いに同一でも異なっていてもよい。炭素数1~13の炭化水素基としては、例えば、メチル基、エチル基、プロピル基、ブチル基、ヘキシル基、オクチル基、ドデシル基等のアルキル基;フェニル基、o-トリル基、m-トリル基、p-トリル基、2,4,6-トリメチルフェニル基、ナフチル基等のアリール基;ベンジル基、フェネチル基等のアラルキル基などが挙げられる。炭素数1~13の炭化水素基は、例えば、プロポキシフェニル基又はtert-ブチルフェニル基であってよい。炭化水素基の炭素数は、好ましくは1~10、より好ましくは1~9である。
R 11a represents a hydrocarbon group having 1 to 13 carbon atoms, and when two or more R 11a are present, they may be the same or different from each other. Examples of the hydrocarbon group having 1 to 13 carbon atoms include alkyl groups such as methyl, ethyl, propyl, butyl, hexyl, octyl, and dodecyl; aryl groups such as phenyl, o-tolyl, m-tolyl, p-tolyl, 2,4,6-trimethylphenyl, and naphthyl; and aralkyl groups such as benzyl and phenethyl. The hydrocarbon group having 1 to 13 carbon atoms may be, for example, a propoxyphenyl group or a tert-butylphenyl group. The number of carbon atoms in the hydrocarbon group is preferably 1 to 10, and more preferably 1 to 9.
式(I)で表される化合物の具体例としては、下式で表される化合物が挙げられる。下式で表される化合物は、式(I)で表される化合物であって、R1~R8が塩素原子であり、X1~X4及びY1~Y8が水素原子であり、R9及びR10がジイソプロピルフェニル基である、化合物である。
Specific examples of the compound represented by formula (I) include a compound represented by the following formula: The compound represented by the following formula is a compound represented by formula (I) in which R 1 to R 8 are chlorine atoms, X 1 to X 4 and Y 1 to Y 8 are hydrogen atoms, and R 9 and R 10 are diisopropylphenyl groups.
式(I)で表される化合物の別の具体例としては、下式で表される化合物が挙げられる。下式で表される化合物は、式(I)で表される化合物であって、R1、R4、R5、及びR8が4-プロポキシフェノキシ基であり、R2、R3、R6、及びR7が水素原子であり、X1~X4及びY1~Y8が水素原子であり、R9及びR10が3-エチルヘキシル基である、化合物である。
Another specific example of the compound represented by formula (I) is a compound represented by the following formula: The compound represented by the following formula is a compound represented by formula (I) in which R 1 , R 4 , R 5 , and R 8 are 4-propoxyphenoxy groups, R 2 , R 3 , R 6 , and R 7 are hydrogen atoms, X 1 to X 4 and Y 1 to Y 8 are hydrogen atoms, and R 9 and R 10 are 3-ethylhexyl groups.
式(I)で表される化合物の別の具体例としては、下式で表される化合物が挙げられる。下式で表される化合物は、式(I)で表される化合物であって、R1~R8がそれぞれ独立に、4-tert-ブチルフェノキシ基又は塩素原子であり、X1~X4及びY1~Y8が水素原子であり、R9及びR10がジイソプロピルフェニル基である、化合物である。
Another specific example of the compound represented by formula (I) is a compound represented by the following formula: The compound represented by the following formula is a compound represented by formula (I) in which R 1 to R 8 are each independently a 4-tert-butylphenoxy group or a chlorine atom, X 1 to X 4 and Y 1 to Y 8 are hydrogen atoms, and R 9 and R 10 are diisopropylphenyl groups.
式(I)で表される化合物の別の具体例としては、下式で表される化合物が挙げられる。下式で表される化合物は、式(I)で表される化合物であって、R1、R4、R5、及びR8が4-tert-ブチルフェノキシ基であり、R2、R3、R6、及びR7が水素原子であり、X1~X4及びY1~Y8が水素原子であり、R9及びR10がジイソプロピルフェニル基である、化合物である。
Another specific example of the compound represented by formula (I) is a compound represented by the following formula: The compound represented by the following formula is a compound represented by formula (I) in which R 1 , R 4 , R 5 , and R 8 are 4-tert-butylphenoxy groups, R 2 , R 3 , R 6 , and R 7 are hydrogen atoms, X 1 to X 4 and Y 1 to Y 8 are hydrogen atoms, and R 9 and R 10 are diisopropylphenyl groups.
式(I)で表される化合物は、近赤外領域における特定の波長を吸収する化合物である。裏返せば、式(I)で表される化合物は、近赤外領域における特定の波長を透過する化合物である。したがって、式(I)で表される化合物を含む組成物から形成される光学フィルタは、その吸収波長に応じて、近赤外線カットフィルタ又は近赤外線透過フィルタとして利用できる。
The compound represented by formula (I) is a compound that absorbs specific wavelengths in the near-infrared region. In other words, the compound represented by formula (I) is a compound that transmits specific wavelengths in the near-infrared region. Therefore, an optical filter formed from a composition containing the compound represented by formula (I) can be used as a near-infrared cut filter or a near-infrared transmittance filter depending on the absorption wavelength.
式(I)で表される化合物の近赤外領域における吸収波長は特に限定されないが、例えば、式(I)で表される化合物は800nm~1400nmに吸収極大を有するものであってよい。
The absorption wavelength in the near infrared region of the compound represented by formula (I) is not particularly limited, but for example, the compound represented by formula (I) may have an absorption maximum in the range of 800 nm to 1400 nm.
式(I)で表される化合物を含む組成物から形成される光学フィルタを近赤外線透過フィルタとして利用する観点からは、式(I)で表される化合物は、可視領域における吸収が高いことが好ましい。例えば、波長780nmにおける吸光度をAbs(780)と表し、波長300~1400nmの範囲における吸光度の極大値を示す波長(極大吸収波長λmax)における吸光度をAbs(λmax)と表すとき、これらの比Abs(780)/Abs(λmax)は、好ましくは0.50以上、0.60以上、0.70以上、又は0.75以上である。Abs(780)/Abs(λmax)は、例えば1.0以下であってよい。780nmは可視領域の上限波長であるため、上記比が高いほど、近赤外線透過フィルタへの利用に適しているといえる。また、波長900~1400nmの範囲における最大吸光度をAbs(900-1400)と表すとき、Abs(900-1400)とAbs(λmax)との比Abs(900-1400)/Abs(λmax)は、好ましくは0.3以下、0.25以下、0.20以下、又は0.15以下である。Abs(900-1400)/Abs(λmax)は、例えば0.01以上又は0.03以上であってよい。この値が小さいほど、近赤外領域の透過性が高くなり、近赤外線透過フィルタへの利用に適しているといえる。
From the viewpoint of using an optical filter formed from a composition containing a compound represented by formula (I) as a near-infrared transmission filter, it is preferable that the compound represented by formula (I) has high absorption in the visible region. For example, when the absorbance at a wavelength of 780 nm is expressed as Abs(780), and the absorbance at a wavelength (maximum absorption wavelength λ max ) showing the maximum value of absorbance in the wavelength range of 300 to 1400 nm is expressed as Abs(λ max ), the ratio Abs(780)/Abs(λ max ) is preferably 0.50 or more, 0.60 or more, 0.70 or more, or 0.75 or more. Abs(780)/Abs(λ max ) may be, for example, 1.0 or less. Since 780 nm is the upper limit wavelength of the visible region, it can be said that the higher the ratio, the more suitable it is for use in a near-infrared transmission filter. Furthermore, when the maximum absorbance in the wavelength range of 900 to 1400 nm is represented as Abs(900-1400), the ratio of Abs(900-1400) to Abs(λ max ), Abs(900-1400)/Abs(λ max ), is preferably 0.3 or less, 0.25 or less, 0.20 or less, or 0.15 or less. Abs(900-1400)/Abs(λ max ) may be, for example, 0.01 or more, or 0.03 or more. The smaller this value is, the higher the transmittance in the near-infrared region, and the more suitable it is for use in a near-infrared transmission filter.
本明細書において、式(I)で表される化合物の吸光度は、紫外可視近赤外吸収分光装置(V-770、日本分光株式会社製)で測定した場合の値である。具体的には、例えば、式(I)で表される化合物を、その濃度が10ppmになるように溶剤に溶解し、波長300~1400nmの範囲で吸光度を測定することができる(データサンプリング間隔1nm)。溶剤としては、例えば、プロピレングリコールモノメチルエーテルアセテート又はクロロホルムを使用することができる。なお、吸光度は、後述する樹脂(B)、重合性化合物(C)、重合開始剤(D)、分散剤等の影響をほとんど受けない。したがって、式(I)で表される化合物にこれらの成分を混合した組成物を、式(I)で表される化合物の濃度が10ppmになるように溶剤で希釈し、この溶液の吸光度を測定して、得られた吸光度を式(I)で表される化合物の吸光度とみなすこともできる。
In this specification, the absorbance of the compound represented by formula (I) is a value measured using an ultraviolet-visible-near infrared absorption spectrometer (V-770, manufactured by JASCO Corporation). Specifically, for example, the compound represented by formula (I) is dissolved in a solvent so that its concentration becomes 10 ppm, and the absorbance can be measured in the wavelength range of 300 to 1400 nm (data sampling interval 1 nm). For example, propylene glycol monomethyl ether acetate or chloroform can be used as the solvent. The absorbance is hardly affected by the resin (B), polymerizable compound (C), polymerization initiator (D), dispersant, etc. described below. Therefore, a composition in which the compound represented by formula (I) is mixed with these components is diluted with a solvent so that the concentration of the compound represented by formula (I) becomes 10 ppm, and the absorbance of this solution is measured, and the obtained absorbance can be regarded as the absorbance of the compound represented by formula (I).
式(I)で表される化合物は、従来公知の方法に準じて製造してもよいし、後述する本発明の一側面に係る製造方法により製造してもよい。
The compound represented by formula (I) may be produced according to a conventionally known method, or may be produced according to a production method according to one aspect of the present invention described below.
近赤外吸収色素(A1)の含有量は、組成物の固形分の総量中、0.5~60質量%、2~60質量%、4~55質量%、又は6~50質量%であってよい。本明細書において「固形分の総量」とは、組成物から溶剤を除いた成分の合計量をいう。固形分の総量及びこれに対する各成分の含有量は、例えば、液体クロマトグラフィー、ガスクロマトグラフィー等の公知の分析手段により測定することができる。組成物は、式(I)で表される化合物以外の近赤外吸収色素を含まなくてもよい。
The content of the near-infrared absorbing dye (A1) may be 0.5 to 60 mass%, 2 to 60 mass%, 4 to 55 mass%, or 6 to 50 mass% of the total amount of solids in the composition. In this specification, the "total amount of solids" refers to the total amount of components excluding the solvent from the composition. The total amount of solids and the content of each component relative to the total amount of solids can be measured by known analytical means such as liquid chromatography and gas chromatography. The composition does not need to contain any near-infrared absorbing dye other than the compound represented by formula (I).
<着色剤(A2)>
本発明の組成物は、近赤外吸収色素(A1)以外の着色剤(以下、着色剤(A2)ともいう)をさらに含んでよい。着色剤(A2)は、染料又は顔料であってよい。 <Colorant (A2)>
The composition of the present invention may further contain a colorant other than the near infrared absorbing dye (A1) (hereinafter, also referred to as colorant (A2)). The colorant (A2) may be a dye or a pigment.
本発明の組成物は、近赤外吸収色素(A1)以外の着色剤(以下、着色剤(A2)ともいう)をさらに含んでよい。着色剤(A2)は、染料又は顔料であってよい。 <Colorant (A2)>
The composition of the present invention may further contain a colorant other than the near infrared absorbing dye (A1) (hereinafter, also referred to as colorant (A2)). The colorant (A2) may be a dye or a pigment.
染料としては、例えば、カラーインデックス(The Society of Dyers and Colourists出版)において顔料以外で色相を有するものに分類されている化合物、及び染色ノート(株式会社色染社)に記載されている公知の染料が挙げられる。染料としては、キサンテン染料が好ましい。
Dyes include, for example, compounds classified as having a hue other than pigments in the Color Index (published by The Society of Dyers and Colourists), and known dyes described in Dyeing Notes (Shikisensha Co., Ltd.). Xanthene dyes are preferred as dyes.
キサンテン染料は、キサンテン骨格を有する化合物を含む染料である。キサンテン染料としては、例えば、C.I.アシッドレッド51、52、87、92、94、289、及び388;C.I.アシッドバイオレット9、30、及び102;C.I.ベーシックレッド1(ローダミン6G)、2、3、4、8、10、及び11;C.I.ベーシックバイオレット10(ローダミンB)及び11;C.I.ソルベントレッド218;C.I.モーダントレッド27;C.I.リアクティブレッド36(ローズベンガルB);スルホローダミンG;特開2010-32999号公報に記載のキサンテン染料;並びに特許第4492760号公報に記載のキサンテン染料が挙げられる。キサンテン染料は、好ましくは有機溶剤に溶解するキサンテン染料である。
Xanthene dyes are dyes containing a compound having a xanthene skeleton. Examples of xanthene dyes include C.I. Acid Red 51, 52, 87, 92, 94, 289, and 388; C.I. Acid Violet 9, 30, and 102; C.I. Basic Red 1 (Rhodamine 6G), 2, 3, 4, 8, 10, and 11; C.I. Basic Violet 10 (Rhodamine B) and 11; C.I. Solvent Red 218; C.I. Mordant Red 27; C.I. Reactive Red 36 (Rose Bengal B); Sulforhodamine G; xanthene dyes described in JP-A-2010-32999; and xanthene dyes described in JP-A-4492760. The xanthene dye is preferably a xanthene dye that is soluble in an organic solvent.
キサンテン染料としては、中外化成株式会社製の「Chugai Aminol Fast Pink R-H/C」、田岡化学工業株式会社製の「Rhodamin 6G」等、市販のキサンテン染料を用いることができる。また、キサンテン染料としては、市販のキサンテン染料を出発原料として、特開2010-32999号公報に記載の方法に従って合成されるキサンテン染料を用いることもできる。
As the xanthene dye, commercially available xanthene dyes such as "Chugai AminoL Fast Pink R-H/C" manufactured by Chugai Chemical Industry Co., Ltd. and "Rhodamin 6G" manufactured by Taoka Chemical Co., Ltd. can be used. In addition, as the xanthene dye, a xanthene dye synthesized according to the method described in JP-A-2010-32999 using a commercially available xanthene dye as a starting material can also be used.
その他の染料として、公知のアゾ染料、シアニン染料、トリフェニルメタン染料、チアゾール染料、オキサジン染料、フタロシアニン染料、キノフタロン染料、アントラキノン染料、ナフトキノン染料、キノンイミン染料、メチン染料、アゾメチン染料、スクアリリウム染料、アクリジン染料、スチリル染料、クマリン染料、キノリン染料、ニトロ染料等を使用してもよい。このような染料としては、例えば、C.I.ソルベント染料、C.I.アシッド染料、C.I.ダイレクト染料、C.I.ディスパース染料、C.I.ベーシック染料、C.I.リアクティブ染料、C.I.モーダント染料、及びC.I.バット染料が挙げられる。
Other dyes that may be used include known azo dyes, cyanine dyes, triphenylmethane dyes, thiazole dyes, oxazine dyes, phthalocyanine dyes, quinophthalone dyes, anthraquinone dyes, naphthoquinone dyes, quinoneimine dyes, methine dyes, azomethine dyes, squarylium dyes, acridine dyes, styryl dyes, coumarin dyes, quinoline dyes, nitro dyes, etc. Examples of such dyes include C.I. solvent dyes, C.I. acid dyes, C.I. direct dyes, C.I. disperse dyes, C.I. basic dyes, C.I. reactive dyes, C.I. mordant dyes, and C.I. vat dyes.
C.I.ソルベント染料としては、例えば、C.I.ソルベントイエロー4、14、15、23、24、38、62、63、68、82、94、98、99、117、162、163、167、及び189;C.I.ソルベントレッド45、49、111、125、130、143、145、146、150、151、155、168、169、172、175、181、207、222、227、230、245、及び247;C.I.ソルベントオレンジ2、7、11、15、26、56、77、及び86;C.I.ソルベントバイオレット11、13、14、26、31、36、37、38、45、47、48、51、59、及び60;C.I.ソルベントブルー4、5、14、18、35、36、37、45、58、59、59:1、63、67、68、69、70、78、79、83、90、94、97、98、100、101、102、104、105、111、112、122、128、132、136、及び139;並びにC.I.ソルベントグリーン1、3、4、5、7、28、29、32、33、34、及び35が挙げられる。
C.I. Solvent dyes include, for example, C.I. Solvent Yellow 4, 14, 15, 23, 24, 38, 62, 63, 68, 82, 94, 98, 99, 117, 162, 163, 167, and 189; C.I. Solvent Red 45, 49, 111, 125, 130, 143, 145, 146, 150, 151, 155, 168, 169, 172, 175, 181, 207, 222, 227, 230, 245, and 247; C.I. Solvent Orange 2, 7, 11, 15, 26, 56, 77, and 86; C.I. C.I. Solvent Violet 11, 13, 14, 26, 31, 36, 37, 38, 45, 47, 48, 51, 59, and 60; C.I. Solvent Blue 4, 5, 14, 18, 35, 36, 37, 45, 58, 59, 59:1, 63, 67, 68, 69, 70, 78, 79, 83, 90, 94, 97, 98, 100, 101, 102, 104, 105, 111, 112, 122, 128, 132, 136, and 139; and C.I. Solvent Green 1, 3, 4, 5, 7, 28, 29, 32, 33, 34, and 35.
C.I.アシッド染料としては、例えば、C.I.アシッドイエロー1、3、7、9、11、17、23、25、29、34、36、38、40、42、54、65、72、73、76、79、98、99、111、112、113、114、116、119、123、128、134、135、138、139、140、144、150、155、157、160、161、163、168、169、172、177、178、179、184、190、193、196、197、199、202、203、204、205、207、212、214、220、221、228、230、232、235、238、240、242、243、及び251;C.I.アシッドレッド1、4、8、14、17、18、26、27、29、31、33、34、35、37、40、42、44、50、57、66、73、76、80、88、91、95、97、98、103、106、111、114、129、133、134、138、143、145、150、151、155、158、160、172、176、182、183、195、198、206、211、215、216、217、227、228、249、252、257、258、260、261、266、268、270、274、277、280、281、308、312、315、316、339、341、345、346、349、382、383、394、401、412、417、418、422、及び426;C.I.アシッドオレンジ6、7、8、10、12、26、50、51、52、56、62、63、64、74、75、94、95、107、108、169、及び173;C.I.アシッドバイオレット6B、7、15、16、17、19、21、23、24、25、34、38、49、及び72;C.I.アシッドブルー1、3、5、7、9、11、13、15、17、18、22、23、24、25、26、27、29、34、38、40、41、42、43、45、48、51、54、59、60、62、70、72、74、75、78、80、82、83、86、87、88、90、90:1、91、92、93、93:1、96、99、100、102、103、104、108、109、110、112、113、117、119、120、123、126、127、129、130、131、138、140、142、143、147、150、151、154、158、161、166、167、168、170、171、175、182、183、184、187、192、199、203、204、205、210、213、229、234、236、242、243、256、259、267、269、278、280、285、290、296、315、324:1、335、及び340;並びにC.I.アシッドグリーン1、3、5、6、7、8、9、11、13、14、15、16、22、25、27、28、41、50、50:1、58、63、65、80、104、105、106、及び109が挙げられる。
C.I. Acid dyes include, for example, C.I. Acid Yellow 1, 3, 7, 9, 11, 17, 23, 25, 29, 34, 36, 38, 40, 42, 54, 65, 72, 73, 76, 79, 98, 99, 111, 112, 113, 114, 116, 119, 123, 128, 134, 135, 138, 139, 140, 144, 150, 155, 157 , 160, 161, 163, 168, 169, 172, 177, 178, 179, 184, 190, 193, 196, 197, 199, 202, 203, 204, 205, 207, 212, 214, 220, 221, 228, 230, 232, 235, 238, 240, 242, 243, and 251; C.I. Acid Red 1, 4, 8, 14, 17, 18, 26, 27, 29, 31, 33, 34, 35, 37, 40, 42, 44, 50, 57, 66, 73, 76, 80, 88, 91, 95, 97, 98, 103, 106, 111, 114, 129, 133, 134, 138, 143, 145, 150, 151, 155, 158, 160, 172, 176, 182, 183, C.I. 195, 198, 206, 211, 215, 216, 217, 227, 228, 249, 252, 257, 258, 260, 261, 266, 268, 270, 274, 277, 280, 281, 308, 312, 315, 316, 339, 341, 345, 346, 349, 382, 383, 394, 401, 412, 417, 418, 422, and 426; C.I. Acid Orange 6, 7, 8, 10, 12, 26, 50, 51, 52, 56, 62, 63, 64, 74, 75, 94, 95, 107, 108, 169, and 173; C.I. Acid Violet 6B, 7, 15, 16, 17, 19, 21, 23, 24, 25, 34, 38, 49, and 72; C.I. Acid Blue 1, 3, 5, 7, 9, 11, 13, 15, 17, 18, 22, 23, 24, 25, 26, 27, 29, 34, 38, 40, 41, 42, 43, 45, 48, 51, 54, 59, 60, 62, 70, 72, 74, 75, 78, 80, 82, 83, 86, 87, 88, 90, 90:1, 91, 92, 93, 93:1, 96, 99, 100, 102, 103, 104, 108, 109, 110, 112, 113, 117, 119, 120, 123, 12 C.I.6, 127, 129, 130, 131, 138, 140, 142, 143, 147, 150, 151, 154, 158, 161, 166, 167, 168, 170, 171, 175, 182, 183, 184, 187, 192, 199, 203, 204, 205, 210, 213, 229, 234, 236, 242, 243, 256, 259, 267, 269, 278, 280, 285, 290, 296, 315, 324:1, 335, and 340; Acid Green 1, 3, 5, 6, 7, 8, 9, 11, 13, 14, 15, 16, 22, 25, 27, 28, 41, 50, 50:1, 58, 63, 65, 80, 104, 105, 106, and 109.
C.I.ダイレクト染料としては、例えば、C.I.ダイレクトイエロー2、33、34、35、38、39、43、47、50、54、58、68、69、70、71、86、93、94、95、98、102、108、109、129、136、138、及び141;C.I.ダイレクトレッド79、82、83、84、91、92、96、97、98、99、105、106、107、172、173、176、177、179、181、182、184、204、207、211、213、218、220、221、222、232、233、234、241、243、246、及び250;C.I.ダイレクトオレンジ26、34、39、41、46、50、52、56、57、61、64、65、68、70、96、97、106、及び107;C.I.ダイレクトバイオレット47、52、54、59、60、65、66、79、80、81、82、84、89、90、93、95、96、103、及び104;C.I.ダイレクトブルー1、2、3、6、8、15、22、25、28、29、40、41、42、47、52、55、57、71、76、77、78、80、81、84、85、86、90、93、94、95、97、98、99、100、101、106、107、108、109、113、114、115、117、119、120、137、149、150、153、155、156、158、159、160、161、162、163、164、165、166、167、168、170、171、172、173、188、189、190、192、193、194、195、196、198、199、200、201、202、203、207、209、210、212、213、214、222、225、226、228、229、236、237、238、242、243、244、245、246、247、248、249、250、251、252、256、257、259、260、268、274、275、及び293;並びにC.I.ダイレクトグリーン25、27、31、32、34、37、63、65、66、67、68、69、72、77、79、及び82が挙げられる。
C.I. direct dyes include, for example, C.I. Direct Yellow 2, 33, 34, 35, 38, 39, 43, 47, 50, 54, 58, 68, 69, 70, 71, 86, 93, 94, 95, 98, 102, 108, 109, 129, 136, 138, and 141; C.I. C.I. Direct Red 79, 82, 83, 84, 91, 92, 96, 97, 98, 99, 105, 106, 107, 172, 173, 176, 177, 179, 181, 182, 184, 204, 207, 211, 213, 218, 220, 221, 222, 232, 233, 234, 241, 243, 246, and 250; C.I. Direct Orange 26, 34, 39, 41, 46, 50, 52, 56, 57, 61, 64, 65, 68, 70, 96, 97, 106, and 107; C.I. C.I. Direct Violet 47, 52, 54, 59, 60, 65, 66, 79, 80, 81, 82, 84, 89, 90, 93, 95, 96, 103, and 104; Direct Blue 1, 2, 3, 6, 8, 15, 22, 25, 28, 29, 40, 41, 42, 47, 52, 55, 57, 71, 76, 77, 78, 80, 81, 84, 85, 86, 90, 93, 94, 95, 97, 98, 99, 100, 101, 106, 107, 108, 109, 113, 114, 115, 117, 119, 120, 137, 149, 150, 153, 155, 156, 158, 159, 160, 161, 162, 163, 164, 165, 166, 167, 168, 170, 171, 172, 173, 188, 189, 190, 192, 193, 194, 195, 196, 198, 199, 200, 201, 202, 203, 207, 209, 210, 212, 213, 214, 222, 225, 226, 228, 229, 236, 237, 238, 242, 243, 244, 245, 246, 247, 248, 249, 250, 251, 252, 256, 257, 259, 260, 268, 274, 275, and 293; and C.I. Direct Green 25, 27, 31, 32, 34, 37, 63, 65, 66, 67, 68, 69, 72, 77, 79, and 82.
C.I.ディスパース染料としては、例えば、C.I.ディスパースイエロー51、54、及び76;C.I.ディスパースバイオレット26及び27;並びにC.I.ディスパースブルー1、14、56、及び60が挙げられる。
C.I. Disperse dyes include, for example, C.I. Disperse Yellow 51, 54, and 76; C.I. Disperse Violet 26 and 27; and C.I. Disperse Blue 1, 14, 56, and 60.
C.I.ベーシック染料としては、例えば、C.I.ベーシックブルー1、3、5、7、9、19、21、22、24、25、26、28、29、40、41、45、47、54、58、59、60、64、65、66、67、68、81、83、88、及び89;C.I.ベーシックバイオレット2;C.I.ベーシックレッド9;並びにC.I.ベーシックグリーン1が挙げられる。
C.I. Basic dyes include, for example, C.I. Basic Blue 1, 3, 5, 7, 9, 19, 21, 22, 24, 25, 26, 28, 29, 40, 41, 45, 47, 54, 58, 59, 60, 64, 65, 66, 67, 68, 81, 83, 88, and 89; C.I. Basic Violet 2; C.I. Basic Red 9; and C.I. Basic Green 1.
C.I.リアクティブ染料としては、例えば、C.I.リアクティブイエロー2、76、及び116;C.I.リアクティブオレンジ16;並びにC.I.リアクティブレッド36が挙げられる。
C.I. reactive dyes include, for example, C.I. Reactive Yellow 2, 76, and 116; C.I. Reactive Orange 16; and C.I. Reactive Red 36.
C.I.モーダント染料、としては、例えば、C.I.モーダントイエロー5、8、10、16、20、26、30、31、33、42、43、45、56、61、62、及び65;C.I.モーダントレッド1、2、3、4、9、11、12、14、17、18、19、22、23、24、25、26、29、30、32、33、36、37、38、39、41、42、43、45、46、48、52、53、56、62、63、71、74、76、78、85、86、88、90、94、及び95;C.I.モーダントオレンジ3、4、5、8、12、13、14、20、21、23、24、28、29、32、34、35、36、37、42、43、47、及び48;C.I.モーダントバイオレット1、1:1、2、3、4、5、6、7、8、10、11、14、15、16、17、18、19、21、22、23、24、27、28、30、31、32、33、36、37、39、40、41、44、45、47、48、49、53、及び58;C.I.モーダントブルー1、2、3、7、8、9、12、13、15、16、19、20、21、22、23、24、26、30、31、32、39、40、41、43、44、48、49、53、61、74、77、83、及び84;並びにC.I.モーダントグリーン1、3、4、5、10、13、15、19、21、23、26、29、31、33、34、35、41、43、及びが挙げられる。
C.I. Mordant dyes include, for example, C.I. Mordant Yellow 5, 8, 10, 16, 20, 26, 30, 31, 33, 42, 43, 45, 56, 61, 62, and 65; C.I. Mordant Red 1, 2, 3, 4, 9, 11, 12, 14, 17, 18, 19, 22, 23, 24, 25, 26, 29, 30, 32, 33, 36, 37, 38, 39, 41, 42, 43, 45, 46, 48, 52, 53, 56, 62, 63, 71, 74, 76, 78, 85, 86, 88, 90, 94, and 95; C.I. C.I. Mordant Orange 3, 4, 5, 8, 12, 13, 14, 20, 21, 23, 24, 28, 29, 32, 34, 35, 36, 37, 42, 43, 47, and 48; C.I. Mordant Violet 1, 1:1, 2, 3, 4, 5, 6, 7, 8, 10, 11, 14, 15, 16, 17, 18, 19, 21, 22, 23, 24, 27, 28, 30, 31, 32, 33, 36, 37, 39, 40, 41, 44, 45, 47, 48, 49, 53, and 58; C.I. Mordant Blue 1, 2, 3, 7, 8, 9, 12, 13, 15, 16, 19, 20, 21, 22, 23, 24, 26, 30, 31, 32, 39, 40, 41, 43, 44, 48, 49, 53, 61, 74, 77, 83, and 84; and C.I. Mordant Green 1, 3, 4, 5, 10, 13, 15, 19, 21, 23, 26, 29, 31, 33, 34, 35, 41, 43, and .
C.I.バット染料としては、例えば、C.I.バットグリーン1が挙げられる。
An example of a C.I. vat dye is C.I. Vat Green 1.
顔料としては、例えば、カラーインデックス(The Society of Dyers and Colourists出版)においてピグメントに分類されている顔料が挙げられ。
Examples of pigments include those classified as pigments in the Color Index (published by the Society of Dyers and Colourists).
顔料としては、例えば、緑色顔料、黄色顔料、オレンジ色顔料、赤色顔料、青色顔料、及び紫色顔料が挙げられる。緑色顔料としては、C.I.ピグメントグリーン7、36、58、及び59が挙げられる。黄色顔料としては、C.I.ピグメントイエロー1、3、12、13、14、15、16、17、20、24、31、53、83、86、93、94、109、110、117、125、128、129、137、138、139、147、148、150、153、154、166、173、185、194、及び214が挙げられる。オレンジ色顔料としては、C.I.ピグメントオレンジ13、31、36、38、40、42、43、51、55、59、61、64、65、71、及び73が挙げられる。赤色顔料としては、C.I.ピグメントレッド9、97、105、122、123、144、149、166、168、176、177、180、192、209、215、216、224、242、254、255、264、265、及び269が挙げられる。青色顔料としては、C.I.ピグメントブルー15、15:3、15:4、15:6、及び60が挙げられる。紫色顔料としては、C.I.ピグメントバイオレット1、19、23、29、32、36、及び38が挙げられる。各色について1種の顔料又は複数の顔料を使用してもよく、複数の色の顔料を組み合わせてもよい。
Pigments include, for example, green pigments, yellow pigments, orange pigments, red pigments, blue pigments, and purple pigments. Green pigments include C.I. Pigment Green 7, 36, 58, and 59. Yellow pigments include C.I. Pigment Yellow 1, 3, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53, 83, 86, 93, 94, 109, 110, 117, 125, 128, 129, 137, 138, 139, 147, 148, 150, 153, 154, 166, 173, 185, 194, and 214. Orange pigments include C.I. Examples of pigments that may be used include C.I. Pigment Orange 13, 31, 36, 38, 40, 42, 43, 51, 55, 59, 61, 64, 65, 71, and 73. Red pigments include C.I. Pigment Red 9, 97, 105, 122, 123, 144, 149, 166, 168, 176, 177, 180, 192, 209, 215, 216, 224, 242, 254, 255, 264, 265, and 269. Blue pigments include C.I. Pigment Blue 15, 15:3, 15:4, 15:6, and 60. Purple pigments include C.I. Pigment Violet 1, 19, 23, 29, 32, 36, and 38. A single pigment or multiple pigments may be used for each color, and multiple color pigments may be combined.
顔料には、必要に応じて、ロジン処理、酸性基又は塩基性基が導入された顔料誘導体を用いた表面処理、高分子化合物による顔料表面へのグラフト処理、硫酸微粒化法等による微粒化処理、不純物を除去するための有機溶剤や水等による洗浄処理、イオン性不純物のイオン交換法等による除去処理等の処理が施されていてもよい。顔料の粒径は、略均一であることが好ましい。
If necessary, the pigment may be subjected to a treatment such as rosin treatment, surface treatment using a pigment derivative into which an acidic or basic group has been introduced, grafting treatment to the pigment surface with a polymer compound, atomization treatment using a sulfuric acid atomization method, etc., washing treatment with an organic solvent or water to remove impurities, removal treatment of ionic impurities using an ion exchange method, etc. It is preferable that the particle size of the pigment is approximately uniform.
組成物が着色剤(A2)を含む場合、着色剤(A2)の含有量は、組成物の固形分の総量中、例えば、0.5質量~70質量%、1~70質量%、2~65質量%、5~60質量%、又は7~55質量%であってよい。着色剤(A2)の含有量が上記範囲内にあると、所望する分光特性をより得やすくなる。
When the composition contains colorant (A2), the content of colorant (A2) may be, for example, 0.5 to 70% by mass, 1 to 70% by mass, 2 to 65% by mass, 5 to 60% by mass, or 7 to 55% by mass of the total amount of solids in the composition. When the content of colorant (A2) is within the above range, it becomes easier to obtain the desired spectral characteristics.
<分散剤>
<Dispersant>
上記の近赤外吸収色素(A1)及び顔料は、分散剤を加えて分散処理を行うことで、分散剤溶液の中で均一に分散した状態の分散液とすることができる。近赤外吸収色素(A1)及び顔料は、それぞれ単独で分散処理してもよいし、複数種の近赤外吸収色素(A1)又は顔料を混合して分散処理してもよい。分散剤を用いる場合、その使用量は、近赤外吸収色素(A1)及び顔料の合計100質量部に対して、例えば、10~200質量部、15~180質量部、20~160質量部、又は80~160質量部であってよい。分散剤の使用量が上記範囲内にあると、2種以上の近赤外吸収色素(A1)又は顔料を使用する場合に、近赤外吸収色素(A1)又は顔料がより均一に分散された分散液が得られる傾向がある。
The near-infrared absorbing dye (A1) and pigment can be dispersed in the dispersant solution to form a dispersion in which they are uniformly dispersed. The near-infrared absorbing dye (A1) and pigment may be dispersed individually, or multiple types of near-infrared absorbing dyes (A1) or pigments may be mixed and dispersed. When a dispersant is used, the amount of the dispersant used may be, for example, 10 to 200 parts by mass, 15 to 180 parts by mass, 20 to 160 parts by mass, or 80 to 160 parts by mass, per 100 parts by mass of the total of the near-infrared absorbing dye (A1) and pigment. When the amount of the dispersant used is within the above range, when two or more types of near-infrared absorbing dyes (A1) or pigments are used, a dispersion in which the near-infrared absorbing dye (A1) or pigment is more uniformly dispersed tends to be obtained.
分散剤としては、例えば、シリコーン系、フッ素系、エステル系、カチオン系、アニオン系、ノニオン系、両性、ポリエステル系、ポリアミン系、アクリル系等の界面活性剤が挙げられる。界面活性剤としては、ポリオキシエチレンアルキルエーテル類、ポリオキシエチレンアルキルフェニルエーテル類、ポリエチレングリコールジエステル類、ソルビタン脂肪酸エステル類、脂肪酸変性ポリエステル類、3級アミン変性ポリウレタン類、ポリエチレンイミン類等が挙げられる。分散剤の市販品としては、例えば、BYKLPN-6919(BYK社製)、KP(信越化学工業株式会社製)、フローレン(共栄社化学株式会社製)、ソルパース(ゼネカ株式会社製)、EFKA(BASFジャパン株式会社製)、アジスパー(登録商標)(味の素ファインテクノ株式会社製)、Disperbyk(ビックケミー社製)等が挙げられる。
Dispersants include, for example, silicone-based, fluorine-based, ester-based, cationic, anionic, nonionic, amphoteric, polyester-based, polyamine-based, and acrylic surfactants. Surfactants include polyoxyethylene alkyl ethers, polyoxyethylene alkyl phenyl ethers, polyethylene glycol diesters, sorbitan fatty acid esters, fatty acid modified polyesters, tertiary amine modified polyurethanes, and polyethyleneimines. Commercially available dispersants include, for example, BYKLPN-6919 (manufactured by BYK), KP (manufactured by Shin-Etsu Chemical Co., Ltd.), FLOWRENE (manufactured by Kyoeisha Chemical Co., Ltd.), Solpers (manufactured by Zeneca Corporation), EFKA (manufactured by BASF Japan Ltd.), AJISPER (registered trademark) (manufactured by Ajinomoto Fine-Techno Co., Ltd.), and Disperbyk (manufactured by BYK-Chemie).
<樹脂(B)>
樹脂(B)としては、例えば以下の樹脂[K1]~[K6]が挙げられる:
不飽和カルボン酸及び不飽和カルボン酸無水物からなる群より選ばれる少なくとも1種(a)(以下「(a)」という場合がある)に由来する構造単位と、炭素数2~4の環状エーテル構造及びエチレン性不飽和結合を有する単量体(b)(以下「(b)」という場合がある)に由来する構造単位と、を有する共重合体である樹脂[K1];
(a)に由来する構造単位と(b)に由来する構造単位と、(a)と共重合可能な単量体(c)(ただし、(a)及び(b)とは異なる。)(以下「(c)」という場合がある)に由来する構造単位と、を有する共重合体である樹脂[K2];
(a)に由来する構造単位と、(c)に由来する構造単位と、を有する共重合体である樹脂[K3];
(a)に由来する構造単位に(b)を付加させた構造単位と、(c)に由来する構造単位と、を有する共重合体である樹脂[K4];
(b)に由来する構造単位に(a)を付加させた構造単位と、(c)に由来する構造単位と、を有する共重合体である樹脂[K5];又は
(b)に由来する構造単位に(a)を付加させ、カルボン酸無水物をさらに付加させた構造単位と、(c)に由来する構造単位と、を有する共重合体である樹脂[K6]。
なかでも、樹脂(B)は、不飽和カルボン酸及び不飽和カルボン酸無水物からなる群より選ばれる少なくとも1種に由来する構造単位と、炭素数2~4の環状エーテル構造及びエチレン性不飽和結合を有する単量体に由来する構造単位と、を有する共重合体(すなわち、樹脂K1又はK2)であることが好ましく、樹脂K2であることがより好ましい。 <Resin (B)>
Examples of the resin (B) include the following resins [K1] to [K6]:
Resin [K1] is a copolymer having a structural unit derived from at least one member (a) (hereinafter may be referred to as "(a)") selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic anhydrides, and a structural unit derived from a monomer (b) (hereinafter may be referred to as "(b)") having a cyclic ether structure having 2 to 4 carbon atoms and an ethylenically unsaturated bond;
Resin [K2] is a copolymer having a structural unit derived from (a), a structural unit derived from (b), and a structural unit derived from a monomer (c) copolymerizable with (a) (however, different from (a) and (b)) (hereinafter, may be referred to as "(c)");
Resin [K3] which is a copolymer having a structural unit derived from (a) and a structural unit derived from (c);
Resin [K4] is a copolymer having a structural unit derived from (a) to which (b) has been added, and a structural unit derived from (c);
Resin [K5] is a copolymer having a structural unit obtained by adding (a) to a structural unit derived from (b), and a structural unit derived from (c); or Resin [K6] is a copolymer having a structural unit obtained by adding (a) to a structural unit derived from (b) and further adding a carboxylic acid anhydride, and a structural unit derived from (c).
Among these, resin (B) is preferably a copolymer having a structural unit derived from at least one selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic anhydrides, and a structural unit derived from a monomer having a cyclic ether structure having 2 to 4 carbon atoms and an ethylenically unsaturated bond (i.e., resin K1 or K2), and more preferably resin K2.
樹脂(B)としては、例えば以下の樹脂[K1]~[K6]が挙げられる:
不飽和カルボン酸及び不飽和カルボン酸無水物からなる群より選ばれる少なくとも1種(a)(以下「(a)」という場合がある)に由来する構造単位と、炭素数2~4の環状エーテル構造及びエチレン性不飽和結合を有する単量体(b)(以下「(b)」という場合がある)に由来する構造単位と、を有する共重合体である樹脂[K1];
(a)に由来する構造単位と(b)に由来する構造単位と、(a)と共重合可能な単量体(c)(ただし、(a)及び(b)とは異なる。)(以下「(c)」という場合がある)に由来する構造単位と、を有する共重合体である樹脂[K2];
(a)に由来する構造単位と、(c)に由来する構造単位と、を有する共重合体である樹脂[K3];
(a)に由来する構造単位に(b)を付加させた構造単位と、(c)に由来する構造単位と、を有する共重合体である樹脂[K4];
(b)に由来する構造単位に(a)を付加させた構造単位と、(c)に由来する構造単位と、を有する共重合体である樹脂[K5];又は
(b)に由来する構造単位に(a)を付加させ、カルボン酸無水物をさらに付加させた構造単位と、(c)に由来する構造単位と、を有する共重合体である樹脂[K6]。
なかでも、樹脂(B)は、不飽和カルボン酸及び不飽和カルボン酸無水物からなる群より選ばれる少なくとも1種に由来する構造単位と、炭素数2~4の環状エーテル構造及びエチレン性不飽和結合を有する単量体に由来する構造単位と、を有する共重合体(すなわち、樹脂K1又はK2)であることが好ましく、樹脂K2であることがより好ましい。 <Resin (B)>
Examples of the resin (B) include the following resins [K1] to [K6]:
Resin [K1] is a copolymer having a structural unit derived from at least one member (a) (hereinafter may be referred to as "(a)") selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic anhydrides, and a structural unit derived from a monomer (b) (hereinafter may be referred to as "(b)") having a cyclic ether structure having 2 to 4 carbon atoms and an ethylenically unsaturated bond;
Resin [K2] is a copolymer having a structural unit derived from (a), a structural unit derived from (b), and a structural unit derived from a monomer (c) copolymerizable with (a) (however, different from (a) and (b)) (hereinafter, may be referred to as "(c)");
Resin [K3] which is a copolymer having a structural unit derived from (a) and a structural unit derived from (c);
Resin [K4] is a copolymer having a structural unit derived from (a) to which (b) has been added, and a structural unit derived from (c);
Resin [K5] is a copolymer having a structural unit obtained by adding (a) to a structural unit derived from (b), and a structural unit derived from (c); or Resin [K6] is a copolymer having a structural unit obtained by adding (a) to a structural unit derived from (b) and further adding a carboxylic acid anhydride, and a structural unit derived from (c).
Among these, resin (B) is preferably a copolymer having a structural unit derived from at least one selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic anhydrides, and a structural unit derived from a monomer having a cyclic ether structure having 2 to 4 carbon atoms and an ethylenically unsaturated bond (i.e., resin K1 or K2), and more preferably resin K2.
(a)としては、具体的には、例えば、アクリル酸、メタクリル酸、クロトン酸、o-、m-、p-ビニル安息香酸等の不飽和モノカルボン酸;マレイン酸、フマル酸、シトラコン酸、メサコン酸、イタコン酸、3-ビニルフタル酸、4-ビニルフタル酸、3,4,5,6-テトラヒドロフタル酸、1,2,3,6-テトラヒドロフタル酸、ジメチルテトラヒドロフタル酸、1,4-シクロヘキセンジカルボン酸等の不飽和ジカルボン酸;メチル-5-ノルボルネン-2,3-ジカルボン酸、5-カルボキシビシクロ[2.2.1]ヘプト-2-エン、5,6-ジカルボキシビシクロ[2.2.1]ヘプト-2-エン、5-カルボキシ-5-メチルビシクロ[2.2.1]ヘプト-2-エン、5-カルボキシ-5-エチルビシクロ[2.2.1]ヘプト-2-エン、5-カルボキシ-6-メチルビシクロ[2.2.1]ヘプト-2-エン、5-カルボキシ-6-エチルビシクロ[2.2.1]ヘプト-2-エン等のカルボキシ基を含有するビシクロ不飽和化合物;無水マレイン酸、シトラコン酸無水物、イタコン酸無水物、3-ビニルフタル酸無水物、4-ビニルフタル酸無水物、3,4,5,6-テトラヒドロフタル酸無水物、1,2,3,6-テトラヒドロフタル酸無水物、ジメチルテトラヒドロフタル酸無水物、5,6-ジカルボキシビシクロ[2.2.1]ヘプト-2-エン無水物等の不飽和ジカルボン酸無水物;コハク酸モノ〔2-(メタ)アクリロイルオキシエチル〕、フタル酸モノ〔2-(メタ)アクリロイルオキシエチル〕等の2価以上の多価カルボン酸の不飽和モノ〔(メタ)アクリロイルオキシアルキル〕エステル;α-(ヒドロキシメチル)アクリル酸等の、ヒドロキシ基及びカルボキシ基を含有する不飽和アクリレート等が挙げられる。これらのうち、共重合反応性の点、及び得られる樹脂のアルカリ水溶液への溶解性の観点から、アクリル酸、メタクリル酸、又は無水マレイン酸が(a)として好ましい。
Specific examples of (a) include unsaturated monocarboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, o-, m-, and p-vinylbenzoic acid; maleic acid, fumaric acid, citraconic acid, mesaconic acid, itaconic acid, 3-vinylphthalic acid, 4-vinylphthalic acid, 3,4,5,6-tetrahydrophthalic acid, 1,2,3,6-tetrahydrophthalic acid, dimethyltetrahydrophthalic acid, and 1,4-cyclohexenedicarboxylic acid. unsaturated dicarboxylic acids such as methyl-5-norbornene-2,3-dicarboxylic acid, 5-carboxybicyclo[2.2.1]hept-2-ene, 5,6-dicarboxybicyclo[2.2.1]hept-2-ene, 5-carboxy-5-methylbicyclo[2.2.1]hept-2-ene, 5-carboxy-5-ethylbicyclo[2.2.1]hept-2-ene, 5-carboxy-6-methylbicyclo[2.2.1]hept-2-ene, unsaturated dicarboxylic acid anhydrides such as maleic anhydride, citraconic anhydride, itaconic anhydride, 3-vinylphthalic anhydride, 4-vinylphthalic anhydride, 3,4,5,6-tetrahydrophthalic anhydride, 1,2,3,6-tetrahydrophthalic anhydride, dimethyltetrahydrophthalic anhydride, 5,6-dicarboxybicyclo[2.2.1]hept-2-ene anhydride; unsaturated mono[(meth)acryloyloxyalkyl]esters of divalent or higher polyvalent carboxylic acids such as succinic acid mono[2-(meth)acryloyloxyethyl] and phthalic acid mono[2-(meth)acryloyloxyethyl]; and unsaturated acrylates containing hydroxy and carboxy groups such as α-(hydroxymethyl)acrylic acid. Of these, acrylic acid, methacrylic acid, or maleic anhydride are preferred as (a) from the viewpoint of copolymerization reactivity and the solubility of the resulting resin in an alkaline aqueous solution.
単量体(b)に含まれる炭素数2~4の環状エーテル構造は、例えば、オキシラン環、オキセタン環及びテトラヒドロフラン環からなる群より選ばれる少なくとも1種であってよい。(b)は、好ましくは炭素数2~4の環状エーテルと、(メタ)アクリロイルオキシ基とを有するである。本明細書において、「(メタ)アクリル酸」とは、アクリル酸及びメタクリル酸からなる群より選ばれる少なくとも1種を表し、「(メタ)アクリロイル」とは、アクリロイル及びメタアクリロイルからなる群より選ばれる少なくとも1種を表し、「(メタ)アクリレート」とは、アクリレート及びメタアクリレートからなる群より選ばれる少なくとも1種を表す。
The cyclic ether structure having 2 to 4 carbon atoms contained in monomer (b) may be, for example, at least one selected from the group consisting of an oxirane ring, an oxetane ring, and a tetrahydrofuran ring. (b) preferably has a cyclic ether having 2 to 4 carbon atoms and a (meth)acryloyloxy group. In this specification, "(meth)acrylic acid" refers to at least one selected from the group consisting of acrylic acid and methacrylic acid, "(meth)acryloyl" refers to at least one selected from the group consisting of acryloyl and methacryloyl, and "(meth)acrylate" refers to at least one selected from the group consisting of acrylate and methacrylate.
(b)は、例えば、オキシラニル基とエチレン性不飽和結合とを有する単量体(b1)(以下「(b1)」という場合がある)、オキセタニル基とエチレン性不飽和結合とを有する単量体(b2)(以下「(b2)」という場合がある)、又はテトラヒドロフリル基とエチレン性不飽和結合とを有する単量体(b3)(以下「(b3)」という場合がある)であってよい。
(b) may be, for example, a monomer (b1) having an oxiranyl group and an ethylenically unsaturated bond (hereinafter sometimes referred to as "(b1)"), a monomer (b2) having an oxetanyl group and an ethylenically unsaturated bond (hereinafter sometimes referred to as "(b2)"), or a monomer (b3) having a tetrahydrofuryl group and an ethylenically unsaturated bond (hereinafter sometimes referred to as "(b3)").
(b1)は、例えば、直鎖状又は分枝鎖状の脂肪族不飽和炭化水素がエポキシ化された構造を有する単量体(b1-1)(以下「(b1-1)」という場合がある)、又は脂環状不飽和炭化水素がエポキシ化された構造を有する単量体(b1-2)(以下「(b1-2)」という場合がある)が挙げられる。
(b1) may be, for example, a monomer (b1-1) (hereinafter sometimes referred to as "(b1-1)") having a structure in which a linear or branched aliphatic unsaturated hydrocarbon has been epoxidized, or a monomer (b1-2) (hereinafter sometimes referred to as "(b1-2)") having a structure in which an alicyclic unsaturated hydrocarbon has been epoxidized.
(b1-1)としては、例えば、グリシジル(メタ)アクリレート、β-メチルグリシジル(メタ)アクリレート、β-エチルグリシジル(メタ)アクリレート、グリシジルビニルエーテル、o-ビニルベンジルグリシジルエーテル、m-ビニルベンジルグリシジルエーテル、p-ビニルベンジルグリシジルエーテル、α-メチル-o-ビニルベンジルグリシジルエーテル、α-メチル-m-ビニルベンジルグリシジルエーテル、α-メチル-p-ビニルベンジルグリシジルエーテル、2,3-ビス(グリシジルオキシメチル)スチレン、2,4-ビス(グリシジルオキシメチル)スチレン、2,5-ビス(グリシジルオキシメチル)スチレン、2,6-ビス(グリシジルオキシメチル)スチレン、2,3,4-トリス(グリシジルオキシメチル)スチレン、2,3,5-トリス(グリシジルオキシメチル)スチレン、2,3,6-トリス(グリシジルオキシメチル)スチレン、3,4,5-トリス(グリシジルオキシメチル)スチレン、及び2,4,6-トリス(グリシジルオキシメチル)スチレンが挙げられる。
(b1-1) may, for example, be glycidyl (meth)acrylate, β-methyl glycidyl (meth)acrylate, β-ethyl glycidyl (meth)acrylate, glycidyl vinyl ether, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl ether, α-methyl-o-vinylbenzyl glycidyl ether, α-methyl-m-vinylbenzyl glycidyl ether, α-methyl-p-vinylbenzyl glycidyl ether, 2,3-bis(glycidyl 2,4-bis(glycidyloxymethyl)styrene, 2,5-bis(glycidyloxymethyl)styrene, 2,6-bis(glycidyloxymethyl)styrene, 2,3,4-tris(glycidyloxymethyl)styrene, 2,3,5-tris(glycidyloxymethyl)styrene, 2,3,6-tris(glycidyloxymethyl)styrene, 3,4,5-tris(glycidyloxymethyl)styrene, and 2,4,6-tris(glycidyloxymethyl)styrene.
(b1-2)としては、例えば、ビニルシクロヘキセンモノオキサイド、1,2-エポキシ-4-ビニルシクロヘキサン(例えば、セロキサイド2000、株式会社ダイセル製)、3,4-エポキシシクロヘキシルメチル(メタ)アクリレート(例えば、サイクロマーA400、株式会社ダイセル製)、3,4-エポキシシクロヘキシルメチル(メタ)アクリレート(例えば、サイクロマーM100、株式会社ダイセル製)、3,4-エポキシトリシクロ[5.2.1.02,6]デシル(メタ)アクリレート及び、3,4-エポキシトリシクロ[5.2.1.02,6]デシルオキシエチル(メタ)アクリレートが挙げられる。
Examples of (b1-2) include vinylcyclohexene monoxide, 1,2-epoxy-4-vinylcyclohexane (e.g., Celloxide 2000, manufactured by Daicel Corporation), 3,4-epoxycyclohexylmethyl (meth)acrylate (e.g., Cyclomer A400, manufactured by Daicel Corporation), 3,4-epoxycyclohexylmethyl (meth)acrylate (e.g., Cyclomer M100, manufactured by Daicel Corporation), 3,4-epoxytricyclo[5.2.1.0 2,6 ]decyl (meth)acrylate, and 3,4-epoxytricyclo[5.2.1.0 2,6 ]decyloxyethyl (meth)acrylate.
(b2)としては、オキセタニル基と(メタ)アクリロイルオキシ基とを有する単量体が好ましく、このような(b2)としては、例えば、3-メチル-3-メタクリルロイルオキシメチルオキセタン、3-メチル-3-アクリロイルオキシメチルオキセタン、3-エチル-3-メタクリロイルオキシメチルオキセタン、3-エチル-3-アクリロイルオキシメチルオキセタン、3-メチル-3-メタクリロイルオキシエチルオキセタン、3-メチル-3-アクリロイルオキシエチルオキセタン、3-エチル-3-メタクリロイルオキシエチルオキセタン、及び3-エチル-3-アクリロイルオキシエチルオキセタンが挙げられる。
(b2) is preferably a monomer having an oxetanyl group and a (meth)acryloyloxy group, and examples of such (b2) include 3-methyl-3-methacryloyloxymethyloxetane, 3-methyl-3-acryloyloxymethyloxetane, 3-ethyl-3-methacryloyloxymethyloxetane, 3-ethyl-3-acryloyloxymethyloxetane, 3-methyl-3-methacryloyloxyethyloxetane, 3-methyl-3-acryloyloxyethyloxetane, 3-ethyl-3-methacryloyloxyethyloxetane, and 3-ethyl-3-acryloyloxyethyloxetane.
(b3)としては、テトラヒドロフリル基と(メタ)アクリロイルオキシ基とを有する単量体が好ましく、このような(b3)としては、例えばテトラヒドロフルフリルアクリレート(例えば、ビスコートV#150、大阪有機化学工業株式会社製)、及びテトラヒドロフルフリルメタクリレートが挙げられる。
(b3) is preferably a monomer having a tetrahydrofuryl group and a (meth)acryloyloxy group, and examples of such (b3) include tetrahydrofurfuryl acrylate (e.g., Viscoat V#150, manufactured by Osaka Organic Chemical Industry Co., Ltd.) and tetrahydrofurfuryl methacrylate.
光学フィルタの耐熱性、耐薬品性等の信頼性をより高くする観点から、(b)は(b1)であることが好ましい。さらに、保存安定性の優れた組成物を得る観点から、(b)は(b1-2)であることがより好ましい。
From the viewpoint of improving the reliability of the optical filter in terms of heat resistance, chemical resistance, etc., it is preferable that (b) is (b1). Furthermore, from the viewpoint of obtaining a composition with excellent storage stability, it is more preferable that (b) is (b1-2).
(c)としては、例えば、メチル(メタ)アクリレート、エチル(メタ)アクリレート、n-ブチル(メタ)アクリレート、sec-ブチル(メタ)アクリレート、tert-ブチル(メタ)アクリレート、2-エチルヘキシル(メタ)アクリレート、ドデシル(メタ)アクリレート、ラウリル(メタ)アクリレート、ステアリル(メタ)アクリレート、シクロペンチル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、2-メチルシクロヘキシル(メタ)アクリレート、トリシクロ[5.2.1.02,6]デカン-8-イル(メタ)アクリレート(当該技術分野では、慣用名として「ジシクロペンタニル(メタ)アクリレート」といわれている。また、「トリシクロデシル(メタ)アクリレート」という場合もある。)、トリシクロ[5.2.1.02,6]デセン-8-イル(メタ)アクリレート(当該技術分野では、慣用名として「ジシクロペンテニル(メタ)アクリレート」といわれている。)、ジシクロペンタニルオキシエチル(メタ)アクリレート、イソボルニル(メタ)アクリレート、アダマンチル(メタ)アクリレート、アリル(メタ)アクリレート、プロパルギル(メタ)アクリレート、フェニル(メタ)アクリレート、ナフチル(メタ)アクリレート、ベンジル(メタ)アクリレート等の(メタ)アクリル酸エステル;
2-ヒドロキシエチル(メタ)アクリレート、2-ヒドロキシプロピル(メタ)アクリレート等のヒドロキシ基含有(メタ)アクリル酸エステル;
マレイン酸ジエチル、フマル酸ジエチル、イタコン酸ジエチル等のジカルボン酸ジエステル;
ビシクロ[2.2.1]ヘプト-2-エン、5-メチルビシクロ[2.2.1]ヘプト-2-エン、5-エチルビシクロ[2.2.1]ヘプト-2-エン、5-ヒドロキシビシクロ[2.2.1]ヘプト-2-エン、5-ヒドロキシメチルビシクロ[2.2.1]ヘプト-2-エン、5-(2’-ヒドロキシエチル)ビシクロ[2.2.1]ヘプト-2-エン、5-メトキシビシクロ[2.2.1]ヘプト-2-エン、5-エトキシビシクロ[2.2.1]ヘプト-2-エン、5,6-ジヒドロキシビシクロ[2.2.1]ヘプト-2-エン、5,6-ジ(ヒドロキシメチル)ビシクロ[2.2.1]ヘプト-2-エン、5,6-ジ(2’-ヒドロキシエチル)ビシクロ[2.2.1]ヘプト-2-エン、5,6-ジメトキシビシクロ[2.2.1]ヘプト-2-エン、5,6-ジエトキシビシクロ[2.2.1]ヘプト-2-エン、5-ヒドロキシ-5-メチルビシクロ[2.2.1]ヘプト-2-エン、5-ヒドロキシ-5-エチルビシクロ[2.2.1]ヘプト-2-エン、5-ヒドロキシメチル-5-メチルビシクロ[2.2.1]ヘプト-2-エン、5-tert-ブトキシカルボニルビシクロ[2.2.1]ヘプト-2-エン、5-シクロヘキシルオキシカルボニルビシクロ[2.2.1]ヘプト-2-エン、5-フェノキシカルボニルビシクロ[2.2.1]ヘプト-2-エン、5,6-ビス(tert-ブトキシカルボニル)ビシクロ[2.2.1]ヘプト-2-エン、5,6-ビス(シクロヘキシルオキシカルボニル)ビシクロ[2.2.1]ヘプト-2-エン等のビシクロ不飽和化合物;
N-フェニルマレイミド、N-シクロヘキシルマレイミド、N-ベンジルマレイミド、N-スクシンイミジル-3-マレイミドベンゾエート、N-スクシンイミジル-4-マレイミドブチレート、N-スクシンイミジル-6-マレイミドカプロエート、N-スクシンイミジル-3-マレイミドプロピオネート、N-(9-アクリジニル)マレイミド等のジカルボニルイミド誘導体;
スチレン、α-メチルスチレン、m-メチルスチレン、p-メチルスチレン、ビニルトルエン、p-メトキシスチレン、アクリロニトリル、メタクリロニトリル、塩化ビニル、塩化ビニリデン、アクリルアミド、メタクリルアミド、酢酸ビニル、1,3-ブタジエン、イソプレン、2,3-ジメチル-1,3-ブタジエン等が挙げられる。
これらのうち、共重合反応性及び耐熱性の観点から、スチレン、ビニルトルエン、N-フェニルマレイミド、N-シクロヘキシルマレイミド、N-ベンジルマレイミド、又はビシクロ[2.2.1]ヘプト-2-エンが好ましい。 Examples of (c) include methyl (meth)acrylate, ethyl (meth)acrylate, n-butyl (meth)acrylate, sec-butyl (meth)acrylate, tert-butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, dodecyl (meth)acrylate, lauryl (meth)acrylate, stearyl (meth)acrylate, cyclopentyl (meth)acrylate, cyclohexyl (meth)acrylate, 2-methylcyclohexyl (meth)acrylate, tricyclo[5.2.1.0 2,6 ]decan-8-yl (meth)acrylate (commonly known in the art as "dicyclopentanyl (meth)acrylate" and sometimes also as "tricyclodecyl (meth)acrylate"), tricyclo[5.2.1.0 2,6 ](meth)acrylic acid esters such as decene-8-yl (meth)acrylate (commonly known in the art as "dicyclopentenyl (meth)acrylate"), dicyclopentanyloxyethyl (meth)acrylate, isobornyl (meth)acrylate, adamantyl (meth)acrylate, allyl (meth)acrylate, propargyl (meth)acrylate, phenyl (meth)acrylate, naphthyl (meth)acrylate, and benzyl (meth)acrylate;
Hydroxy group-containing (meth)acrylic acid esters such as 2-hydroxyethyl (meth)acrylate and 2-hydroxypropyl (meth)acrylate;
dicarboxylic acid diesters such as diethyl maleate, diethyl fumarate, and diethyl itaconate;
Bicyclo[2.2.1]hept-2-ene, 5-methylbicyclo[2.2.1]hept-2-ene, 5-ethylbicyclo[2.2.1]hept-2-ene, 5-hydroxybicyclo[2.2.1]hept-2-ene, 5-hydroxymethylbicyclo[2.2.1]hept-2-ene, 5-(2'-hydroxyethyl)bicyclo[2.2.1]hept-2-ene, 5-methoxybicyclo[2.2.1]hept-2-ene, Cyclo[2.2.1]hept-2-ene, 5-ethoxybicyclo[2.2.1]hept-2-ene, 5,6-dihydroxybicyclo[2.2.1]hept-2-ene, 5,6-di(hydroxymethyl)bicyclo[2.2.1]hept-2-ene, 5,6-di(2'-hydroxyethyl)bicyclo[2.2.1]hept-2-ene, 5,6-dimethoxybicyclo[2.2.1]hept unsaturated compounds such as 5-hydroxy-5-methylbicyclo[2.2.1]hept-2-ene, 5-hydroxy-5-ethylbicyclo[2.2.1]hept-2-ene, 5-hydroxymethyl-5-methylbicyclo[2.2.1]hept-2-ene, 5-tert-butoxycarbonylbicyclo[2.2.1]hept-2-ene, 5-cyclohexyloxycarbonylbicyclo[2.2.1]hept-2-ene, 5-phenoxycarbonylbicyclo[2.2.1]hept-2-ene, 5,6-bis(tert-butoxycarbonyl)bicyclo[2.2.1]hept-2-ene, 5,6-bis(cyclohexyloxycarbonyl)bicyclo[2.2.1]hept-2-ene;
dicarbonyl imide derivatives such as N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, N-succinimidyl-3-maleimidobenzoate, N-succinimidyl-4-maleimidobutyrate, N-succinimidyl-6-maleimidocaproate, N-succinimidyl-3-maleimidopropionate, and N-(9-acridinyl)maleimide;
Examples of the copolymer include styrene, α-methylstyrene, m-methylstyrene, p-methylstyrene, vinyltoluene, p-methoxystyrene, acrylonitrile, methacrylonitrile, vinyl chloride, vinylidene chloride, acrylamide, methacrylamide, vinyl acetate, 1,3-butadiene, isoprene, and 2,3-dimethyl-1,3-butadiene.
Among these, from the viewpoints of copolymerization reactivity and heat resistance, styrene, vinyltoluene, N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, and bicyclo[2.2.1]hept-2-ene are preferred.
2-ヒドロキシエチル(メタ)アクリレート、2-ヒドロキシプロピル(メタ)アクリレート等のヒドロキシ基含有(メタ)アクリル酸エステル;
マレイン酸ジエチル、フマル酸ジエチル、イタコン酸ジエチル等のジカルボン酸ジエステル;
ビシクロ[2.2.1]ヘプト-2-エン、5-メチルビシクロ[2.2.1]ヘプト-2-エン、5-エチルビシクロ[2.2.1]ヘプト-2-エン、5-ヒドロキシビシクロ[2.2.1]ヘプト-2-エン、5-ヒドロキシメチルビシクロ[2.2.1]ヘプト-2-エン、5-(2’-ヒドロキシエチル)ビシクロ[2.2.1]ヘプト-2-エン、5-メトキシビシクロ[2.2.1]ヘプト-2-エン、5-エトキシビシクロ[2.2.1]ヘプト-2-エン、5,6-ジヒドロキシビシクロ[2.2.1]ヘプト-2-エン、5,6-ジ(ヒドロキシメチル)ビシクロ[2.2.1]ヘプト-2-エン、5,6-ジ(2’-ヒドロキシエチル)ビシクロ[2.2.1]ヘプト-2-エン、5,6-ジメトキシビシクロ[2.2.1]ヘプト-2-エン、5,6-ジエトキシビシクロ[2.2.1]ヘプト-2-エン、5-ヒドロキシ-5-メチルビシクロ[2.2.1]ヘプト-2-エン、5-ヒドロキシ-5-エチルビシクロ[2.2.1]ヘプト-2-エン、5-ヒドロキシメチル-5-メチルビシクロ[2.2.1]ヘプト-2-エン、5-tert-ブトキシカルボニルビシクロ[2.2.1]ヘプト-2-エン、5-シクロヘキシルオキシカルボニルビシクロ[2.2.1]ヘプト-2-エン、5-フェノキシカルボニルビシクロ[2.2.1]ヘプト-2-エン、5,6-ビス(tert-ブトキシカルボニル)ビシクロ[2.2.1]ヘプト-2-エン、5,6-ビス(シクロヘキシルオキシカルボニル)ビシクロ[2.2.1]ヘプト-2-エン等のビシクロ不飽和化合物;
N-フェニルマレイミド、N-シクロヘキシルマレイミド、N-ベンジルマレイミド、N-スクシンイミジル-3-マレイミドベンゾエート、N-スクシンイミジル-4-マレイミドブチレート、N-スクシンイミジル-6-マレイミドカプロエート、N-スクシンイミジル-3-マレイミドプロピオネート、N-(9-アクリジニル)マレイミド等のジカルボニルイミド誘導体;
スチレン、α-メチルスチレン、m-メチルスチレン、p-メチルスチレン、ビニルトルエン、p-メトキシスチレン、アクリロニトリル、メタクリロニトリル、塩化ビニル、塩化ビニリデン、アクリルアミド、メタクリルアミド、酢酸ビニル、1,3-ブタジエン、イソプレン、2,3-ジメチル-1,3-ブタジエン等が挙げられる。
これらのうち、共重合反応性及び耐熱性の観点から、スチレン、ビニルトルエン、N-フェニルマレイミド、N-シクロヘキシルマレイミド、N-ベンジルマレイミド、又はビシクロ[2.2.1]ヘプト-2-エンが好ましい。 Examples of (c) include methyl (meth)acrylate, ethyl (meth)acrylate, n-butyl (meth)acrylate, sec-butyl (meth)acrylate, tert-butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, dodecyl (meth)acrylate, lauryl (meth)acrylate, stearyl (meth)acrylate, cyclopentyl (meth)acrylate, cyclohexyl (meth)acrylate, 2-methylcyclohexyl (meth)acrylate, tricyclo[5.2.1.0 2,6 ]decan-8-yl (meth)acrylate (commonly known in the art as "dicyclopentanyl (meth)acrylate" and sometimes also as "tricyclodecyl (meth)acrylate"), tricyclo[5.2.1.0 2,6 ](meth)acrylic acid esters such as decene-8-yl (meth)acrylate (commonly known in the art as "dicyclopentenyl (meth)acrylate"), dicyclopentanyloxyethyl (meth)acrylate, isobornyl (meth)acrylate, adamantyl (meth)acrylate, allyl (meth)acrylate, propargyl (meth)acrylate, phenyl (meth)acrylate, naphthyl (meth)acrylate, and benzyl (meth)acrylate;
Hydroxy group-containing (meth)acrylic acid esters such as 2-hydroxyethyl (meth)acrylate and 2-hydroxypropyl (meth)acrylate;
dicarboxylic acid diesters such as diethyl maleate, diethyl fumarate, and diethyl itaconate;
Bicyclo[2.2.1]hept-2-ene, 5-methylbicyclo[2.2.1]hept-2-ene, 5-ethylbicyclo[2.2.1]hept-2-ene, 5-hydroxybicyclo[2.2.1]hept-2-ene, 5-hydroxymethylbicyclo[2.2.1]hept-2-ene, 5-(2'-hydroxyethyl)bicyclo[2.2.1]hept-2-ene, 5-methoxybicyclo[2.2.1]hept-2-ene, Cyclo[2.2.1]hept-2-ene, 5-ethoxybicyclo[2.2.1]hept-2-ene, 5,6-dihydroxybicyclo[2.2.1]hept-2-ene, 5,6-di(hydroxymethyl)bicyclo[2.2.1]hept-2-ene, 5,6-di(2'-hydroxyethyl)bicyclo[2.2.1]hept-2-ene, 5,6-dimethoxybicyclo[2.2.1]hept unsaturated compounds such as 5-hydroxy-5-methylbicyclo[2.2.1]hept-2-ene, 5-hydroxy-5-ethylbicyclo[2.2.1]hept-2-ene, 5-hydroxymethyl-5-methylbicyclo[2.2.1]hept-2-ene, 5-tert-butoxycarbonylbicyclo[2.2.1]hept-2-ene, 5-cyclohexyloxycarbonylbicyclo[2.2.1]hept-2-ene, 5-phenoxycarbonylbicyclo[2.2.1]hept-2-ene, 5,6-bis(tert-butoxycarbonyl)bicyclo[2.2.1]hept-2-ene, 5,6-bis(cyclohexyloxycarbonyl)bicyclo[2.2.1]hept-2-ene;
dicarbonyl imide derivatives such as N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, N-succinimidyl-3-maleimidobenzoate, N-succinimidyl-4-maleimidobutyrate, N-succinimidyl-6-maleimidocaproate, N-succinimidyl-3-maleimidopropionate, and N-(9-acridinyl)maleimide;
Examples of the copolymer include styrene, α-methylstyrene, m-methylstyrene, p-methylstyrene, vinyltoluene, p-methoxystyrene, acrylonitrile, methacrylonitrile, vinyl chloride, vinylidene chloride, acrylamide, methacrylamide, vinyl acetate, 1,3-butadiene, isoprene, and 2,3-dimethyl-1,3-butadiene.
Among these, from the viewpoints of copolymerization reactivity and heat resistance, styrene, vinyltoluene, N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, and bicyclo[2.2.1]hept-2-ene are preferred.
樹脂[K1]において、樹脂[K1]を構成する全構造単位の合計モル数に対して、(a)に由来する構造単位が2~60モル%であり、かつ、
(b)に由来する構造単位が40~98モル%
であることが好ましく、
(a)に由来する構造単位が10~50モル%であり、かつ、
(b)に由来する構造単位が50~90モル%
であることがより好ましい。
樹脂[K1]の各構造単位の比率が上記範囲内にあると、組成物の保存安定性、後述する着色パターンを形成する際の現像性、及び光学フィルタの耐溶剤性に優れる傾向がある。 In the resin [K1], the structural unit derived from (a) accounts for 2 to 60 mol % based on the total number of moles of all structural units constituting the resin [K1], and
40 to 98 mol % of structural units derived from (b)
It is preferred that
The structural unit derived from (a) is 10 to 50 mol %, and
50 to 90 mol % of structural units derived from (b)
It is more preferable that:
When the ratio of each structural unit in the resin [K1] is within the above range, the composition tends to have excellent storage stability, developability when forming a colored pattern described below, and solvent resistance of the optical filter.
(b)に由来する構造単位が40~98モル%
であることが好ましく、
(a)に由来する構造単位が10~50モル%であり、かつ、
(b)に由来する構造単位が50~90モル%
であることがより好ましい。
樹脂[K1]の各構造単位の比率が上記範囲内にあると、組成物の保存安定性、後述する着色パターンを形成する際の現像性、及び光学フィルタの耐溶剤性に優れる傾向がある。 In the resin [K1], the structural unit derived from (a) accounts for 2 to 60 mol % based on the total number of moles of all structural units constituting the resin [K1], and
40 to 98 mol % of structural units derived from (b)
It is preferred that
The structural unit derived from (a) is 10 to 50 mol %, and
50 to 90 mol % of structural units derived from (b)
It is more preferable that:
When the ratio of each structural unit in the resin [K1] is within the above range, the composition tends to have excellent storage stability, developability when forming a colored pattern described below, and solvent resistance of the optical filter.
樹脂[K1]は、例えば、文献「高分子合成の実験法」(大津隆行著、株式会社化学同人発行、第1版第1刷、1972年3月1日発行)に記載された方法及び当該文献に引用された文献を参考にして製造することができる。
Resin [K1] can be produced, for example, by referring to the method described in the document "Experimental Methods for Polymer Synthesis" (written by Otsu Takayuki, published by Kagaku Dojin Co., Ltd., 1st edition, 1st printing, published March 1, 1972) and the documents cited therein.
具体的には、(a)及び(b)の所定量、重合開始剤、溶剤等を反応容器中に入れて、例えば窒素雰囲気下で撹拌しながら、加熱及び保温する方法が挙げられる。なお、ここで用いられる重合開始剤、溶剤等は、特に限定されず、当該分野で通常使用される重合開始剤、溶剤等を使用することができる。例えば、重合開始剤としては、アゾ化合物(2,2’-アゾビスイソブチロニトリル、2,2’-アゾビス(2,4-ジメチルバレロニトリル)等)又は有機過酸化物(ベンゾイルペルオキシド等)が挙げられる。溶剤は、単量体を溶解するものであれば特に限定されず、例えば、組成物の溶剤(E)として後述する溶剤を用いることができる。
Specific examples include a method in which predetermined amounts of (a) and (b), a polymerization initiator, a solvent, etc. are placed in a reaction vessel, and the mixture is heated and kept warm while stirring, for example, under a nitrogen atmosphere. The polymerization initiator, solvent, etc. used here are not particularly limited, and polymerization initiators, solvents, etc. commonly used in the field can be used. For example, polymerization initiators include azo compounds (2,2'-azobisisobutyronitrile, 2,2'-azobis(2,4-dimethylvaleronitrile), etc.) or organic peroxides (benzoyl peroxide, etc.). The solvent is not particularly limited as long as it dissolves the monomers, and for example, the solvent described below can be used as the solvent (E) of the composition.
樹脂[K2]において、樹脂[K2]を構成する全構造単位の合計モル数に対して、
(a)に由来する構造単位が2~45モル%であり、
(b)に由来する構造単位が2~95モル%であり、かつ
(c)に由来する構造単位が1~65モル%
であることが好ましく、
(a)に由来する構造単位が5~40モル%であり、
(b)に由来する構造単位が5~80モル%であり、かつ、
(c)に由来する構造単位が5~60モル%
であることがより好ましい。
樹脂[K2]の各構造単位の比率が上記範囲内にあると、組成物の保存安定性、着色パターンを形成する際の現像性、並びに、光学フィルタの耐溶剤性、耐熱性及び機械強度に優れる傾向がある。 In the resin [K2], the total number of moles of all structural units constituting the resin [K2] is:
The structural unit derived from (a) is 2 to 45 mol %,
The structural unit derived from (b) is 2 to 95 mol % and the structural unit derived from (c) is 1 to 65 mol %
It is preferred that
The structural unit derived from (a) is 5 to 40 mol %,
The structural unit derived from (b) is 5 to 80 mol %, and
5 to 60 mol % of structural units derived from (c)
It is more preferable that:
When the ratio of each structural unit of the resin [K2] is within the above range, the composition tends to have excellent storage stability, developability when forming a colored pattern, and the optical filter tends to have excellent solvent resistance, heat resistance, and mechanical strength.
(a)に由来する構造単位が2~45モル%であり、
(b)に由来する構造単位が2~95モル%であり、かつ
(c)に由来する構造単位が1~65モル%
であることが好ましく、
(a)に由来する構造単位が5~40モル%であり、
(b)に由来する構造単位が5~80モル%であり、かつ、
(c)に由来する構造単位が5~60モル%
であることがより好ましい。
樹脂[K2]の各構造単位の比率が上記範囲内にあると、組成物の保存安定性、着色パターンを形成する際の現像性、並びに、光学フィルタの耐溶剤性、耐熱性及び機械強度に優れる傾向がある。 In the resin [K2], the total number of moles of all structural units constituting the resin [K2] is:
The structural unit derived from (a) is 2 to 45 mol %,
The structural unit derived from (b) is 2 to 95 mol % and the structural unit derived from (c) is 1 to 65 mol %
It is preferred that
The structural unit derived from (a) is 5 to 40 mol %,
The structural unit derived from (b) is 5 to 80 mol %, and
5 to 60 mol % of structural units derived from (c)
It is more preferable that:
When the ratio of each structural unit of the resin [K2] is within the above range, the composition tends to have excellent storage stability, developability when forming a colored pattern, and the optical filter tends to have excellent solvent resistance, heat resistance, and mechanical strength.
樹脂[K2]は、例えば、(a)及び(b)のかわりに(a)、(b)、及び(c)を用いる以外は樹脂[K1]と同様の方法により、製造することができる。
Resin [K2] can be produced in the same manner as resin [K1], except that, for example, (a), (b), and (c) are used instead of (a) and (b).
樹脂[K3]において、樹脂[K3]を構成する全構造単位の合計モル数に対して、
(a)に由来する構造単位が2~60モル%であり、かつ
(c)に由来する構造単位が40~98モル%
であることが好ましく、
(a)に由来する構造単位が10~50モル%であり、かつ
(c)に由来する構造単位が50~90モル%
であることがより好ましい。 In the resin [K3], the total number of moles of all structural units constituting the resin [K3] is
The structural unit derived from (a) is 2 to 60 mol % and the structural unit derived from (c) is 40 to 98 mol %.
It is preferred that
The structural unit derived from (a) is 10 to 50 mol % and the structural unit derived from (c) is 50 to 90 mol %
It is more preferable that:
(a)に由来する構造単位が2~60モル%であり、かつ
(c)に由来する構造単位が40~98モル%
であることが好ましく、
(a)に由来する構造単位が10~50モル%であり、かつ
(c)に由来する構造単位が50~90モル%
であることがより好ましい。 In the resin [K3], the total number of moles of all structural units constituting the resin [K3] is
The structural unit derived from (a) is 2 to 60 mol % and the structural unit derived from (c) is 40 to 98 mol %.
It is preferred that
The structural unit derived from (a) is 10 to 50 mol % and the structural unit derived from (c) is 50 to 90 mol %
It is more preferable that:
樹脂[K3]は、例えば、(a)及び(b)のかわりに(a)及び(c)を用いる以外は樹脂[K1]と同様の方法により、製造することができる。
Resin [K3] can be produced in the same manner as resin [K1], except that (a) and (c) are used instead of (a) and (b).
樹脂[K4]は、(a)と(c)との共重合体を得て、(b)が有する炭素数2~4の環状エーテルを(a)のカルボン酸及び/又はカルボン酸無水物に付加させることにより製造することができる。まず、(a)と(c)との共重合体を、樹脂[K3]と同様の方法により製造する。(a)に由来すると構造単位及び(c)に由来する構造単位の比率は、樹脂[K3]と同じであることが好ましい。次に、上記共重合体中の(a)に由来するカルボン酸及び/又はカルボン酸無水物の一部に、(b)が有する炭素数2~4の環状エーテルを反応させる。具体的には、(a)と(c)との共重合体の製造に引き続き、フラスコ内雰囲気を窒素から空気に置換し、(b)、カルボン酸又はカルボン酸無水物と環状エーテルとの反応触媒(例えばトリス(ジメチルアミノメチル)フェノール等)、重合禁止剤(例えばハイドロキノン等)等をフラスコ内に入れて、例えば、60~130℃で、1~10時間反応させることにより、樹脂[K4]を製造することができる。仕込方法及び反応温度、反応時間等の反応条件は、製造設備及び重合による発熱量等を考慮して適宜調整することができる。
Resin [K4] can be produced by obtaining a copolymer of (a) and (c), and adding the cyclic ether having 2 to 4 carbon atoms contained in (b) to the carboxylic acid and/or carboxylic anhydride of (a). First, the copolymer of (a) and (c) is produced by the same method as that for resin [K3]. The ratio of the structural units derived from (a) and the structural units derived from (c) is preferably the same as that for resin [K3]. Next, a part of the carboxylic acid and/or carboxylic anhydride derived from (a) in the copolymer is reacted with the cyclic ether having 2 to 4 carbon atoms contained in (b). Specifically, following the production of the copolymer of (a) and (c), the atmosphere in the flask is replaced from nitrogen to air, and (b) a reaction catalyst for the carboxylic acid or carboxylic anhydride and the cyclic ether (e.g., tris(dimethylaminomethyl)phenol, etc.), a polymerization inhibitor (e.g., hydroquinone, etc.), etc. are placed in the flask, and the mixture is reacted, for example, at 60 to 130°C for 1 to 10 hours to produce resin [K4]. The reaction conditions, such as the charging method, reaction temperature, and reaction time, can be adjusted appropriately taking into account the production equipment and the amount of heat generated by polymerization.
(b)の使用量は、(a)100モルに対して、好ましくは5~80モルであり、より好ましくは10~75モルである。(b)の使用量をこの範囲にすることにより、組成物の保存安定性、着色パターンを形成する際の現像性、並びに、光学フィルタの耐溶剤性、耐熱性、機械強度及び感度のバランスが良好になる傾向がある。環状エーテルの反応性が高く、未反応の(b)が残存しにくいことから、樹脂[K4]に用いる(b)としては(b1)が好ましく、(b1-1)がより好ましい。
The amount of (b) used is preferably 5 to 80 moles, and more preferably 10 to 75 moles, per 100 moles of (a). By keeping the amount of (b) used within this range, the storage stability of the composition, the developability when forming a colored pattern, and the balance of the solvent resistance, heat resistance, mechanical strength, and sensitivity of the optical filter tend to be good. Since the reactivity of cyclic ethers is high and unreacted (b) is unlikely to remain, (b1) is preferred as the (b) used in resin [K4], and (b1-1) is more preferred.
上記反応触媒の使用量は、(a)、(b)及び(c)の合計量100質量部に対して0.001~5質量部が好ましい。上記重合禁止剤の使用量は、(a)、(b)及び(c)の合計量100質量部に対して0.001~5質量部が好ましい。
The amount of the reaction catalyst used is preferably 0.001 to 5 parts by mass per 100 parts by mass of the total of (a), (b), and (c). The amount of the polymerization inhibitor used is preferably 0.001 to 5 parts by mass per 100 parts by mass of the total of (a), (b), and (c).
樹脂[K5]は、(a)のかわりに(b)を用い、(b)のかわりに(a)を用いる以外は樹脂[K4]と同様の方法により、製造することができる。すなわち、まず、(b)と(c)との共重合体を得て、次いで、(b)と(c)との共重合体が有する(b)に由来する環状エーテルに、(a)に由来するカルボン酸又はカルボン酸無水物を反応させることにより、樹脂K5を得ることができる。ただし、(b)に由来する構造単位及び(c)に由来する構造単位の比率は、上記の共重合体を構成する全構造単位の合計モル数に対して、
(b)に由来する構造単位が5~95モル%であり、かつ
(c)に由来する構造単位が5~95モル%
であることが好ましく、
(b)に由来する構造単位が10~90モル%であり、かつ
(c)に由来する構造単位が10~90モル%
であることがより好ましい。
また、上記の共重合体に反応させる(a)の使用量は、(b)100モルに対して、5~80モルが好ましい。環状エーテルの反応性が高く、未反応の(b)が残存しにくいことから、樹脂[K5]に用いる(b)としては(b1)が好ましく、(b1-1)がより好ましい。 Resin [K5] can be produced in the same manner as Resin [K4], except that (b) is used instead of (a) and (a) is used instead of (b). That is, first, a copolymer of (b) and (c) is obtained, and then the cyclic ether derived from (b) contained in the copolymer of (b) and (c) is reacted with a carboxylic acid or carboxylic anhydride derived from (a), to obtain Resin K5. However, the ratio of the structural unit derived from (b) and the structural unit derived from (c) is, relative to the total number of moles of all structural units constituting the above copolymer,
The structural unit derived from (b) is 5 to 95 mol % and the structural unit derived from (c) is 5 to 95 mol %
It is preferred that
The structural unit derived from (b) is 10 to 90 mol % and the structural unit derived from (c) is 10 to 90 mol %
It is more preferable that:
The amount of (a) reacted with the copolymer is preferably 5 to 80 moles per 100 moles of (b). Since the reactivity of cyclic ethers is high and unreacted (b) is unlikely to remain, (b1) is preferred as (b) used in resin [K5], and (b1-1) is more preferred.
(b)に由来する構造単位が5~95モル%であり、かつ
(c)に由来する構造単位が5~95モル%
であることが好ましく、
(b)に由来する構造単位が10~90モル%であり、かつ
(c)に由来する構造単位が10~90モル%
であることがより好ましい。
また、上記の共重合体に反応させる(a)の使用量は、(b)100モルに対して、5~80モルが好ましい。環状エーテルの反応性が高く、未反応の(b)が残存しにくいことから、樹脂[K5]に用いる(b)としては(b1)が好ましく、(b1-1)がより好ましい。 Resin [K5] can be produced in the same manner as Resin [K4], except that (b) is used instead of (a) and (a) is used instead of (b). That is, first, a copolymer of (b) and (c) is obtained, and then the cyclic ether derived from (b) contained in the copolymer of (b) and (c) is reacted with a carboxylic acid or carboxylic anhydride derived from (a), to obtain Resin K5. However, the ratio of the structural unit derived from (b) and the structural unit derived from (c) is, relative to the total number of moles of all structural units constituting the above copolymer,
The structural unit derived from (b) is 5 to 95 mol % and the structural unit derived from (c) is 5 to 95 mol %
It is preferred that
The structural unit derived from (b) is 10 to 90 mol % and the structural unit derived from (c) is 10 to 90 mol %
It is more preferable that:
The amount of (a) reacted with the copolymer is preferably 5 to 80 moles per 100 moles of (b). Since the reactivity of cyclic ethers is high and unreacted (b) is unlikely to remain, (b1) is preferred as (b) used in resin [K5], and (b1-1) is more preferred.
樹脂[K6]は、樹脂[K5]にさらにカルボン酸無水物を反応させて得られる樹脂である。具体的には、(b)に由来する環状エーテルと(a)に由来するカルボン酸又はカルボン酸無水物との反応により発生するヒドロキシ基に、カルボン酸無水物を反応させる。カルボン酸無水物としては、無水マレイン酸、シトラコン酸無水物、イタコン酸無水物、3-ビニルフタル酸無水物、4-ビニルフタル酸無水物、3,4,5,6-テトラヒドロフタル酸無水物、1,2,3,6-テトラヒドロフタル酸無水物、ジメチルテトラヒドロフタル酸無水物、5,6-ジカルボキシビシクロ[2.2.1]ヘプト-2-エン無水物等が挙げられる。カルボン酸無水物の使用量は、(a)の使用量1モルに対して、0.5~1モルが好ましい。
Resin [K6] is a resin obtained by further reacting resin [K5] with a carboxylic acid anhydride. Specifically, the hydroxyl group generated by the reaction of the cyclic ether derived from (b) with the carboxylic acid or carboxylic acid anhydride derived from (a) is reacted with the carboxylic acid anhydride. Examples of the carboxylic acid anhydride include maleic anhydride, citraconic anhydride, itaconic anhydride, 3-vinylphthalic anhydride, 4-vinylphthalic anhydride, 3,4,5,6-tetrahydrophthalic anhydride, 1,2,3,6-tetrahydrophthalic anhydride, dimethyltetrahydrophthalic anhydride, and 5,6-dicarboxybicyclo[2.2.1]hept-2-ene anhydride. The amount of the carboxylic acid anhydride used is preferably 0.5 to 1 mole per mole of (a).
具体的な樹脂(B)としては、3,4-エポキシシクロヘキシルメチル(メタ)アクリレート/(メタ)アクリル酸共重合体、3,4-エポキシトリシクロ[5.2.1.02.6]デシルアクリレート/(メタ)アクリル酸共重合体等の樹脂[K1];グリシジル(メタ)アクリレート/ベンジル(メタ)アクリレート/(メタ)アクリル酸共重合体、グリシジル(メタ)アクリレート/スチレン/(メタ)アクリル酸共重合体、3,4-エポキシトリシクロ[5.2.1.02,6]デシルアクリレート/(メタ)アクリル酸/N-シクロヘキシルマレイミド共重合体、3,4-エポキシトリシクロ[5.2.1.02,6]デシルアクリレート/(メタ)アクリル酸/N-シクロヘキシルマレイミド/2-ヒドロキシエチル(メタ)アクリレート共重合体、3-メチル-3-(メタ)アクリルロイルオキシメチルオキセタン/(メタ)アクリル酸/スチレン共重合体、ベンジル(メタ)アクリレート/(メタ)アクリル酸/3,4-エポキシトリシクロ[5.2.1.02,6]デシルアクリレート共重合体の樹脂[K2];ベンジル(メタ)アクリレート/(メタ)アクリル酸共重合体、スチレン/(メタ)アクリル酸共重合体等の樹脂[K3];ベンジル(メタ)アクリレート/(メタ)アクリル酸共重合体にグリシジル(メタ)アクリレートを付加させた樹脂、トリシクロデシル(メタ)アクリレート/スチレン/(メタ)アクリル酸共重合体にグリシジル(メタ)アクリレートを付加させた樹脂、トリシクロデシル(メタ)アクリレート/ベンジル(メタ)アクリレート/(メタ)アクリル酸共重合体にグリシジル(メタ)アクリレートを付加させた樹脂等の樹脂[K4];トリシクロデシル(メタ)アクリレート/グリシジル(メタ)アクリレートの共重合体に(メタ)アクリル酸を反応させた樹脂、トリシクロデシル(メタ)アクリレート/スチレン/グリシジル(メタ)アクリレートの共重合体に(メタ)アクリル酸を反応させた樹脂等の樹脂[K5];トリシクロデシル(メタ)アクリレート/グリシジル(メタ)アクリレートの共重合体に(メタ)アクリル酸を反応させた樹脂にさらにテトラヒドロフタル酸無水物を反応させた樹脂等の樹脂[K6]等が挙げられる。
Specific examples of the resin (B) include resins [K1] such as 3,4-epoxycyclohexylmethyl(meth)acrylate/(meth)acrylic acid copolymer, 3,4-epoxytricyclo[5.2.1.0 2.6 ]decyl acrylate/(meth)acrylic acid copolymer, glycidyl(meth)acrylate/benzyl(meth)acrylate/(meth)acrylic acid copolymer, glycidyl(meth)acrylate/styrene/(meth)acrylic acid copolymer, 3,4-epoxytricyclo[5.2.1.0 2,6 ]decyl acrylate/(meth)acrylic acid/N-cyclohexylmaleimide copolymer, 3,4-epoxytricyclo[5.2.1.0 2,6 ] decyl acrylate / (meth) acrylic acid / N-cyclohexylmaleimide / 2-hydroxyethyl (meth) acrylate copolymer, 3-methyl-3- (meth) acryloyloxymethyloxetane / (meth) acrylic acid / styrene copolymer, benzyl (meth) acrylate / (meth) acrylic acid / 3, 4-epoxy tricyclo [5.2.1.0 2, 6 ] decyl acrylate copolymer resin [K2]; benzyl (meth) acrylate / (meth) acrylic acid copolymer, styrene / (meth) acrylic acid copolymer and other resins [K3]; benzyl (meth) acrylate / (meth) acrylic acid copolymer to which glycidyl (meth) acrylate has been added, tricyclodecyl (meth) acrylate / styrene / (meth) acrylic acid copolymer to which glycidyl (meth) acrylate has been added, tricyclodecyl (meth) acrylate / benzyl (meth) acrylate / (meth) acrylic acid copolymer to which glycidyl (meth) acrylate has been added, tricyclodecyl (meth) acrylate / benzyl (meth) acrylate / (meth) acrylic acid copolymer to which glycidyl (meth) acrylate has been added, Resins [K4] such as resins to which acrylate has been added; resins [K5] such as resins obtained by reacting a copolymer of tricyclodecyl (meth)acrylate/glycidyl (meth)acrylate with (meth)acrylic acid, resins [K6] such as resins obtained by reacting a copolymer of tricyclodecyl (meth)acrylate/styrene/glycidyl (meth)acrylate with (meth)acrylic acid and further reacting the resulting copolymer with tetrahydrophthalic anhydride.
樹脂[K2]は、例えば、ベンジルメタクリレート/アクリル酸/3,4-エポキシトリシクロ[5.2.1.02,6]デカン-8-イルアクリレート/3,4-エポキシトリシクロ[5.2.1.02,6]デカン-9-イルアクリレート共重合体であってよい。この共重合体は、下式で示される構造単位を有する。
The resin [K2] may be, for example, a benzyl methacrylate/acrylic acid/3,4-epoxytricyclo[5.2.1.0 2,6 ]decan-8-yl acrylate/3,4-epoxytricyclo[5.2.1.0 2,6 ]decan-9-yl acrylate copolymer having a structural unit represented by the following formula:
樹脂[K4]は、例えば、トリシクロデシルメタクリレート/ベンジルメタクリレート/メタクリル酸共重合体にグリシジルメタクリレートを付加させた樹脂であってよい。
The resin [K4] may be, for example, a resin in which glycidyl methacrylate is added to a tricyclodecyl methacrylate/benzyl methacrylate/methacrylic acid copolymer.
樹脂(B)のポリスチレン換算の重量平均分子量は、好ましくは3000~100000であり、より好ましくは5000~50000であり、さらに好ましくは5000~30000である。分子量が上記範囲内にあると、光学フィルタの硬度が向上し、残膜率が高く、未露光部の現像液に対する溶解性が良好で、着色パターンの解像度が向上する傾向がある。
The weight average molecular weight of resin (B) in terms of polystyrene is preferably 3,000 to 100,000, more preferably 5,000 to 50,000, and even more preferably 5,000 to 30,000. When the molecular weight is within the above range, the hardness of the optical filter is improved, the residual film rate is high, the solubility of the unexposed parts in the developer is good, and the resolution of the colored pattern tends to be improved.
樹脂(B)の分散度[重量平均分子量(Mw)/数平均分子量(Mn)]は、好ましくは1.1~6であり、より好ましくは1.2~4である。
The dispersity of resin (B) [weight average molecular weight (Mw)/number average molecular weight (Mn)] is preferably 1.1 to 6, and more preferably 1.2 to 4.
樹脂(B)の酸価は、固形分換算で、好ましくは50~170mg-KOH/g、より好ましくは60~150mg-KOH/g、さらに好ましくは70~135mg-KOH/gである。ここで、酸価は、樹脂(B)1gを中和するために必要な水酸化カリウムの量(mg)であり、例えば水酸化カリウム水溶液を用いた滴定により求めることができる。
The acid value of resin (B), calculated as solid content, is preferably 50 to 170 mg-KOH/g, more preferably 60 to 150 mg-KOH/g, and even more preferably 70 to 135 mg-KOH/g. Here, the acid value is the amount (mg) of potassium hydroxide required to neutralize 1 g of resin (B), and can be determined, for example, by titration using an aqueous potassium hydroxide solution.
樹脂(B)の含有量は、組成物中の固形分の総量に対して、例えば、7~65質量%、13~60質量%、又は17~55質量%であってよい。樹脂(B)の含有量が上記範囲内にあると、着色パターンが良好に形成でき、また着色パターンの解像度及び残膜率が向上する傾向がある。
The content of resin (B) may be, for example, 7 to 65 mass%, 13 to 60 mass%, or 17 to 55 mass% relative to the total amount of solids in the composition. When the content of resin (B) is within the above range, a colored pattern can be formed well, and the resolution and remaining film rate of the colored pattern tend to be improved.
<重合性化合物(C)>
重合性化合物(C)は、重合開始剤(D)から発生した活性ラジカル及び/又は酸によって重合し得る化合物である。重合性化合物(C)は、例えば重合性のエチレン性不飽和結合を有する化合物であり、好ましくは(メタ)アクリル酸エステルである。 <Polymerizable Compound (C)>
The polymerizable compound (C) is a compound that can be polymerized by the active radicals and/or acid generated from the polymerization initiator (D). The polymerizable compound (C) is, for example, a compound having a polymerizable ethylenically unsaturated bond, and is preferably a (meth)acrylic acid ester.
重合性化合物(C)は、重合開始剤(D)から発生した活性ラジカル及び/又は酸によって重合し得る化合物である。重合性化合物(C)は、例えば重合性のエチレン性不飽和結合を有する化合物であり、好ましくは(メタ)アクリル酸エステルである。 <Polymerizable Compound (C)>
The polymerizable compound (C) is a compound that can be polymerized by the active radicals and/or acid generated from the polymerization initiator (D). The polymerizable compound (C) is, for example, a compound having a polymerizable ethylenically unsaturated bond, and is preferably a (meth)acrylic acid ester.
重合性化合物(C)は、エチレン性不飽和結合を3つ以上有する重合性化合物であることが好ましい。このような重合性化合物としては、例えば、トリメチロールプロパントリ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、ジペンタエリスリトールポリ(メタ)アクリレート(例えば、ジペンタエリスリトールペンタ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート等)、トリペンタエリスリトールオクタ(メタ)アクリレート、トリペンタエリスリトールヘプタ(メタ)アクリレート、テトラペンタエリスリトールデカ(メタ)アクリレート、テトラペンタエリスリトールノナ(メタ)アクリレート、トリス(2-(メタ)アクリロイルオキシエチル)イソシアヌレート、エチレングリコール変性ペンタエリスリトールテトラ(メタ)アクリレート、エチレングリコール変性ジペンタエリスリトールヘキサ(メタ)アクリレート、プロピレングリコール変性ペンタエリスリトールテトラ(メタ)アクリレート、プロピレングリコール変性ジペンタエリスリトールヘキサ(メタ)アクリレート、カプロラクトン変性ペンタエリスリトールテトラ(メタ)アクリレート、カプロラクトン変性ジペンタエリスリトールヘキサ(メタ)アクリレート等が挙げられる。なかでも、トリメチロールプロパントリ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート、又はジペンタエリスリトールヘキサ(メタ)アクリレートが好ましい。
The polymerizable compound (C) is preferably a polymerizable compound having three or more ethylenically unsaturated bonds. Examples of such polymerizable compounds include trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol poly(meth)acrylate (e.g., dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, etc.), tripentaerythritol octa(meth)acrylate, tripentaerythritol hepta(meth)acrylate, tetrapentaerythritol deca(meth)acrylate, tetrapentaerythritol Examples of the acrylate include nona(meth)acrylate, tris(2-(meth)acryloyloxyethyl)isocyanurate, ethylene glycol modified pentaerythritol tetra(meth)acrylate, ethylene glycol modified dipentaerythritol hexa(meth)acrylate, propylene glycol modified pentaerythritol tetra(meth)acrylate, propylene glycol modified dipentaerythritol hexa(meth)acrylate, caprolactone modified pentaerythritol tetra(meth)acrylate, and caprolactone modified dipentaerythritol hexa(meth)acrylate. Among these, trimethylolpropane tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, and dipentaerythritol hexa(meth)acrylate are preferred.
重合性化合物(C)の重量平均分子量は、好ましくは150~2900、より好ましくは250~1500である。
The weight average molecular weight of the polymerizable compound (C) is preferably 150 to 2900, and more preferably 250 to 1500.
重合性化合物(C)の含有量は、組成物中の固形分の総量に対して、好ましくは7~65質量%、より好ましくは13~60質量%、さらに好ましくは17~55質量%である。重合性化合物(C)の含有量が、上記範囲内にあると、着色パターン形成時の残膜率及び光学フィルタの耐薬品性が向上する傾向がある。
The content of the polymerizable compound (C) is preferably 7 to 65 mass %, more preferably 13 to 60 mass %, and even more preferably 17 to 55 mass %, based on the total amount of solids in the composition. When the content of the polymerizable compound (C) is within the above range, the residual film rate during color pattern formation and the chemical resistance of the optical filter tend to improve.
<重合開始剤(D)>
重合開始剤(D)は、光又は熱により活性ラジカル、酸等を発生し、重合を開始し得る化合物であれば特に限定されず、公知の重合開始剤を用いることができる。 <Polymerization initiator (D)>
The polymerization initiator (D) is not particularly limited as long as it is a compound that can generate active radicals, acids, etc. by light or heat and initiate polymerization, and any known polymerization initiator can be used.
重合開始剤(D)は、光又は熱により活性ラジカル、酸等を発生し、重合を開始し得る化合物であれば特に限定されず、公知の重合開始剤を用いることができる。 <Polymerization initiator (D)>
The polymerization initiator (D) is not particularly limited as long as it is a compound that can generate active radicals, acids, etc. by light or heat and initiate polymerization, and any known polymerization initiator can be used.
活性ラジカルを発生する重合開始剤としては、例えば、アルキルフェノン化合物、トリアジン化合物、アシルホスフィンオキサイド化合物、O-アシルオキシム化合物、及びビイミダゾール化合物が挙げられる。
Polymerization initiators that generate active radicals include, for example, alkylphenone compounds, triazine compounds, acylphosphine oxide compounds, O-acyloxime compounds, and biimidazole compounds.
上記O-アシルオキシム化合物は、式(d1)で表される部分構造を有する化合物である。以下、*は結合手を表す。
The above O-acyloxime compound is a compound having a partial structure represented by formula (d1). Hereinafter, * represents a bond.
O-アシルオキシム化合物としては、例えば、N-ベンゾイルオキシ-1-(4-フェニルスルファニルフェニル)ブタン-1-オン-2-イミン、N-ベンゾイルオキシ-1-(4-フェニルスルファニルフェニル)オクタン-1-オン-2-イミン、N-ベンゾイルオキシ-1-(4-フェニルスルファニルフェニル)-3-シクロペンチルプロパン-1-オン-2-イミン、N-アセトキシ-1-[9-エチル-6-(2-メチルベンゾイル)-9H-カルバゾール-3-イル]エタン-1-イミン、N-アセトキシ-1-[9-エチル-6-{2-メチル-4-(3,3-ジメチル-2,4-ジオキサシクロペンタニルメチルオキシ)ベンゾイル}-9H-カルバゾール-3-イル]エタン-1-イミン、N-アセトキシ-1-[9-エチル-6-(2-メチルベンゾイル)-9H-カルバゾール-3-イル]-3-シクロペンチルプロパン-1-イミン、N-ベンゾイルオキシ-1-[9-エチル-6-(2-メチルベンゾイル)-9H-カルバゾール-3-イル]-3-シクロペンチルプロパン-1-オン-2-イミン、及びN-アセチルオキシ-1-(4-フェニルスルファニルフェニル)-3-シクロヘキシルプロパン-1-オン-2-イミンが挙げられる。イルガキュアOXE01、OXE02(どちらもBASF社製)、N-1919(株式会社ADEKA製)等の市販品を用いてもよい。なかでも、高明度な光学フィルタを得る観点から、O-アシルオキシム化合物は、N-アセチルオキシ-1-(4-フェニルスルファニルフェニル)-3-シクロヘキシルプロパン-1-オン-2-イミン、N-ベンゾイルオキシ-1-(4-フェニルスルファニルフェニル)ブタン-1-オン-2-イミン、N-ベンゾイルオキシ-1-(4-フェニルスルファニルフェニル)オクタン-1-オン-2-イミン、及びN-ベンゾイルオキシ-1-(4-フェニルスルファニルフェニル)-3-シクロペンチルプロパン-1-オン-2-イミンからなる群より選ばれる少なくとも1種が好ましく、N-アセチルオキシ-1-(4-フェニルスルファニルフェニル)-3-シクロヘキシルプロパン-1-オン-2-イミン又はN-ベンゾイルオキシ-1-(4-フェニルスルファニルフェニル)オクタン-1-オン-2-イミンがより好ましい。
Examples of O-acyloxime compounds include N-benzoyloxy-1-(4-phenylsulfanylphenyl)butan-1-one-2-imine, N-benzoyloxy-1-(4-phenylsulfanylphenyl)octan-1-one-2-imine, N-benzoyloxy-1-(4-phenylsulfanylphenyl)-3-cyclopentylpropan-1-one-2-imine, N-acetoxy-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethane-1-imine, N-acetoxy-1-[9-ethyl-6-{2-methyl-4-(3,3-dimethyl)phenyl]ethane-1-imine, Examples of the methyl ether ester include N-ethyl-2,4-dioxacyclopentanylmethyloxy)benzoyl}-9H-carbazol-3-yl]ethane-1-imine, N-acetoxy-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-3-cyclopentylpropan-1-imine, N-benzoyloxy-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-3-cyclopentylpropan-1-one-2-imine, and N-acetyloxy-1-(4-phenylsulfanylphenyl)-3-cyclohexylpropan-1-one-2-imine. Commercially available products such as Irgacure OXE01, OXE02 (both manufactured by BASF Corporation), and N-1919 (manufactured by ADEKA Corporation) may also be used. Among them, from the viewpoint of obtaining a high-brightness optical filter, the O-acyloxime compound is preferably at least one selected from the group consisting of N-acetyloxy-1-(4-phenylsulfanylphenyl)-3-cyclohexylpropan-1-one-2-imine, N-benzoyloxy-1-(4-phenylsulfanylphenyl)butan-1-one-2-imine, N-benzoyloxy-1-(4-phenylsulfanylphenyl)octan-1-one-2-imine, and N-benzoyloxy-1-(4-phenylsulfanylphenyl)-3-cyclopentylpropan-1-one-2-imine, and more preferably N-acetyloxy-1-(4-phenylsulfanylphenyl)-3-cyclohexylpropan-1-one-2-imine or N-benzoyloxy-1-(4-phenylsulfanylphenyl)octan-1-one-2-imine.
上記アルキルフェノン化合物は、式(d2)で表される部分構造又は式(d3)で表される部分構造を有する化合物である。これらの部分構造中、ベンゼン環は置換基を有していてもよい。感度の観点から、アルキルフェノン化合物としては、式(d2)で表される部分構造を有する化合物が好ましい。
The alkylphenone compound is a compound having a partial structure represented by formula (d2) or a partial structure represented by formula (d3). In these partial structures, the benzene ring may have a substituent. From the viewpoint of sensitivity, the alkylphenone compound is preferably a compound having a partial structure represented by formula (d2).
式(d2)で表される部分構造を有する化合物としては、例えば、2-メチル-2-モルホリノ-1-(4-メチルスルファニルフェニル)プロパン-1-オン、2-ジメチルアミノ-1-(4-モルホリノフェニル)-2-ベンジルブタン-1-オン、2-(ジメチルアミノ)-2-[(4-メチルフェニル)メチル]-1-[4-(4-モルホリニル)フェニル]ブタン-1-オン等が挙げられる。Omnirad(旧イルガキュア)369、907、379(いずれもIGM Resins B.V.社製)等の市販品を用いてもよい。
Examples of compounds having the partial structure represented by formula (d2) include 2-methyl-2-morpholino-1-(4-methylsulfanylphenyl)propan-1-one, 2-dimethylamino-1-(4-morpholinophenyl)-2-benzylbutan-1-one, and 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-[4-(4-morpholinyl)phenyl]butan-1-one. Commercially available products such as Omnirad (formerly Irgacure) 369, 907, and 379 (all manufactured by IGM Resins B.V.) may also be used.
式(d3)で表される部分構造を有する化合物としては、例えば、2-ヒドロキシ-2-メチル-1-フェニルプロパン-1-オン、2-ヒドロキシ-2-メチル-1-〔4-(2-ヒドロキシエトキシ)フェニル〕プロパン-1-オン、1-ヒドロキシシクロヘキシルフェニルケトン、2-ヒドロキシ-2-メチル-1-(4-イソプロペニルフェニル)プロパン-1-オンのオリゴマー、α,α-ジエトキシアセトフェノン、ベンジルジメチルケタール等が挙げられる。
Examples of compounds having the partial structure represented by formula (d3) include 2-hydroxy-2-methyl-1-phenylpropan-1-one, 2-hydroxy-2-methyl-1-[4-(2-hydroxyethoxy)phenyl]propan-1-one, 1-hydroxycyclohexyl phenyl ketone, oligomers of 2-hydroxy-2-methyl-1-(4-isopropenylphenyl)propan-1-one, α,α-diethoxyacetophenone, and benzyl dimethyl ketal.
上記トリアジン化合物としては、例えば、2,4-ビス(トリクロロメチル)-6-(4-メトキシフェニル)-1,3,5-トリアジン、2,4-ビス(トリクロロメチル)-6-(4-メトキシナフチル)-1,3,5-トリアジン、2,4-ビス(トリクロロメチル)-6-ピペロニル-1,3,5-トリアジン、2,4-ビス(トリクロロメチル)-6-(4-メトキシスチリル)-1,3,5-トリアジン、2,4-ビス(トリクロロメチル)-6-〔2-(5-メチルフラン-2-イル)エテニル〕-1,3,5-トリアジン、2,4-ビス(トリクロロメチル)-6-〔2-(フラン-2-イル)エテニル〕-1,3,5-トリアジン、2,4-ビス(トリクロロメチル)-6-〔2-(4-ジエチルアミノ-2-メチルフェニル)エテニル〕-1,3,5-トリアジン、2,4-ビス(トリクロロメチル)-6-〔2-(3,4-ジメトキシフェニル)エテニル〕-1,3,5-トリアジン等が挙げられる。
Examples of the triazine compounds include 2,4-bis(trichloromethyl)-6-(4-methoxyphenyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-(4-methoxynaphthyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-piperonyl-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-(4-methoxystyryl)-1,3,5-triazine, and 2,4-bis(trichloromethyl)-6- Examples include [2-(5-methylfuran-2-yl)ethenyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(furan-2-yl)ethenyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(4-diethylamino-2-methylphenyl)ethenyl]-1,3,5-triazine, and 2,4-bis(trichloromethyl)-6-[2-(3,4-dimethoxyphenyl)ethenyl]-1,3,5-triazine.
上記アシルホスフィンオキサイド化合物としては、2,4,6-トリメチルベンゾイルジフェニルホスフィンオキサイド等が挙げられる。Omnirad 819(IGM Resins B.V.社製)等の市販品を用いてもよい。
The acylphosphine oxide compound may be 2,4,6-trimethylbenzoyldiphenylphosphine oxide. Commercially available products such as Omnirad 819 (manufactured by IGM Resins B.V.) may also be used.
上記ビイミダゾール化合物としては、例えば、2,2’-ビス(2-クロロフェニル)-4,4’,5,5’-テトラフェニルビイミダゾール、2,2’-ビス(2,3-ジクロロフェニル)-4,4’,5,5’-テトラフェニルビイミダゾール(例えば、特開平6-75372号公報、特開平6-75373号公報等参照。)、2,2’-ビス(2-クロロフェニル)-4,4’,5,5’-テトラフェニルビイミダゾール、2,2’-ビス(2-クロロフェニル)-4,4’,5,5’-テトラ(アルコキシフェニル)ビイミダゾール、2,2’-ビス(2-クロロフェニル)-4,4’,5,5’-テトラ(ジアルコキシフェニル)ビイミダゾール、2,2’-ビス(2-クロロフェニル)-4,4’,5,5’-テトラ(トリアルコキシフェニル)ビイミダゾール(例えば、特公昭48-38403号公報、特開昭62-174204号公報等参照。)、4,4’5,5’-位のフェニル基がカルボアルコキシ基により置換されているビイミダゾール化合物(例えば、特開平7-10913号公報等参照)等が挙げられる。
The above biimidazole compounds include, for example, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2,3-dichlorophenyl)-4,4',5,5'-tetraphenylbiimidazole (see, for example, JP-A-6-75372 and JP-A-6-75373, etc.), 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(alkoxyphenyl) phenyl) biimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(dialkoxyphenyl) biimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(trialkoxyphenyl) biimidazole (see, for example, JP-B-48-38403 and JP-A-62-174204), and biimidazole compounds in which the phenyl groups at the 4,4',5,5'-positions are substituted with carboalkoxy groups (see, for example, JP-A-7-10913).
重合開始剤(D)としては、ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル、ベンゾインイソブチルエーテル等のベンゾイン化合物;ベンゾフェノン、o-ベンゾイル安息香酸メチル、4-フェニルベンゾフェノン、4-ベンゾイル-4’-メチルジフェニルサルファイド、3,3’,4,4’-テトラ(tert-ブチルパーオキシカルボニル)ベンゾフェノン、2,4,6-トリメチルベンゾフェノン等のベンゾフェノン化合物;9,10-フェナンスレンキノン、2-エチルアントラキノン、カンファーキノン等のキノン化合物;10-ブチル-2-クロロアクリドン;ベンジル;フェニルグリオキシル酸メチル;チタノセン化合物等がさらに挙げられる。これらは、後述の重合開始助剤(D1)(特にアミン化合物)と組み合わせて用いることが好ましい。
Further examples of the polymerization initiator (D) include benzoin compounds such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzoin isobutyl ether; benzophenone compounds such as benzophenone, o-benzoyl methyl benzoate, 4-phenylbenzophenone, 4-benzoyl-4'-methyldiphenyl sulfide, 3,3',4,4'-tetra(tert-butylperoxycarbonyl)benzophenone, and 2,4,6-trimethylbenzophenone; quinone compounds such as 9,10-phenanthrenequinone, 2-ethylanthraquinone, and camphorquinone; 10-butyl-2-chloroacridone; benzyl; methyl phenylglyoxylate; and titanocene compounds. These are preferably used in combination with the polymerization initiator aid (D1) (particularly an amine compound) described below.
酸を発生する重合開始剤としては、例えば、4-ヒドロキシフェニルジメチルスルホニウムp-トルエンスルホナート、4-ヒドロキシフェニルジメチルスルホニウムヘキサフルオロアンチモネート、4-アセトキシフェニルジメチルスルホニウムp-トルエンスルホナート、4-アセトキシフェニルメチルベンジルスルホニウムヘキサフルオロアンチモネート、トリフェニルスルホニウムp-トルエンスルホナート、トリフェニルスルホニウムヘキサフルオロアンチモネート、ジフェニルヨードニウムp-トルエンスルホナート、ジフェニルヨードニウムヘキサフルオロアンチモネート等のオニウム塩、ニトロベンジルトシレート類、ベンゾイントシレート類等が挙げられる。
Examples of polymerization initiators that generate acid include onium salts such as 4-hydroxyphenyldimethylsulfonium p-toluenesulfonate, 4-hydroxyphenyldimethylsulfonium hexafluoroantimonate, 4-acetoxyphenyldimethylsulfonium p-toluenesulfonate, 4-acetoxyphenylmethylbenzylsulfonium hexafluoroantimonate, triphenylsulfonium p-toluenesulfonate, triphenylsulfonium hexafluoroantimonate, diphenyliodonium p-toluenesulfonate, and diphenyliodonium hexafluoroantimonate, as well as nitrobenzyl tosylates and benzoin tosylates.
重合開始剤(D)としては、活性ラジカルを発生する重合開始剤が好ましく、アルキルフェノン化合物、トリアジン化合物、アシルホスフィンオキサイド化合物、O-アシルオキシム化合物、及びビイミダゾール化合物からなる群よりから選ばれる少なくとも1種を含む重合開始剤がより好ましく、O-アシルオキシム化合物を含む重合開始剤がさらに好ましい。
As the polymerization initiator (D), a polymerization initiator that generates active radicals is preferred, a polymerization initiator containing at least one selected from the group consisting of an alkylphenone compound, a triazine compound, an acylphosphine oxide compound, an O-acyloxime compound, and a biimidazole compound is more preferred, and a polymerization initiator containing an O-acyloxime compound is even more preferred.
重合開始剤(D)の含有量は、樹脂(B)及び重合性化合物(C)の合計量100質量部に対して、例えば、0.1~30質量部又は1~20質量部であってよい。重合開始剤(D)の含有量が上記範囲内にあると、高感度化して露光時間が短縮される傾向があるため、光学フィルタの生産性が向上する。
The content of the polymerization initiator (D) may be, for example, 0.1 to 30 parts by mass or 1 to 20 parts by mass per 100 parts by mass of the total amount of the resin (B) and the polymerizable compound (C). If the content of the polymerization initiator (D) is within the above range, the sensitivity tends to be increased and the exposure time tends to be shortened, thereby improving the productivity of the optical filter.
<重合開始助剤(D1)>
組成物は、重合開始助剤(D1)をさらに含むことができる。重合開始助剤(D1)は、重合開始剤によって重合が開始された重合性化合物(C)の重合を促進するために用いられる化合物、又は増感剤である。重合開始助剤(D1)は、通常、重合開始剤(D)と組み合わせて用いられる。重合開始助剤(D1)としては、例えば、アミン化合物、アルコキシアントラセン化合物、チオキサントン化合物、及びカルボン酸化合物が挙げられる。 <Polymerization Initiator Auxiliary Agent (D1)>
The composition may further include a polymerization initiation aid (D1). The polymerization initiation aid (D1) is a compound used to promote the polymerization of the polymerizable compound (C) whose polymerization has been initiated by a polymerization initiator, or a sensitizer. The polymerization initiation aid (D1) is usually used in combination with the polymerization initiator (D). Examples of the polymerization initiation aid (D1) include an amine compound, an alkoxyanthracene compound, a thioxanthone compound, and a carboxylic acid compound.
組成物は、重合開始助剤(D1)をさらに含むことができる。重合開始助剤(D1)は、重合開始剤によって重合が開始された重合性化合物(C)の重合を促進するために用いられる化合物、又は増感剤である。重合開始助剤(D1)は、通常、重合開始剤(D)と組み合わせて用いられる。重合開始助剤(D1)としては、例えば、アミン化合物、アルコキシアントラセン化合物、チオキサントン化合物、及びカルボン酸化合物が挙げられる。 <Polymerization Initiator Auxiliary Agent (D1)>
The composition may further include a polymerization initiation aid (D1). The polymerization initiation aid (D1) is a compound used to promote the polymerization of the polymerizable compound (C) whose polymerization has been initiated by a polymerization initiator, or a sensitizer. The polymerization initiation aid (D1) is usually used in combination with the polymerization initiator (D). Examples of the polymerization initiation aid (D1) include an amine compound, an alkoxyanthracene compound, a thioxanthone compound, and a carboxylic acid compound.
上記アミン化合物としては、トリエタノールアミン、メチルジエタノールアミン、トリイソプロパノールアミン、4-ジメチルアミノ安息香酸メチル、4-ジメチルアミノ安息香酸エチル、4-ジメチルアミノ安息香酸イソアミル、安息香酸2-ジメチルアミノエチル、4-ジメチルアミノ安息香酸2-エチルヘキシル、N,N-ジメチルパラトルイジン、4,4’-ビス(ジメチルアミノ)ベンゾフェノン(通称ミヒラーズケトン)、4,4’-ビス(ジエチルアミノ)ベンゾフェノン、4,4’-ビス(エチルメチルアミノ)ベンゾフェノン等が挙げられ、なかでも4,4’-ビス(ジエチルアミノ)ベンゾフェノンが好ましい。EAB-F(保土谷化学工業株式会社製)等の市販品を用いてもよい。
The above amine compounds include triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 2-dimethylaminoethyl benzoate, 2-ethylhexyl 4-dimethylaminobenzoate, N,N-dimethyl-p-toluidine, 4,4'-bis(dimethylamino)benzophenone (commonly known as Michler's ketone), 4,4'-bis(diethylamino)benzophenone, 4,4'-bis(ethylmethylamino)benzophenone, etc., of which 4,4'-bis(diethylamino)benzophenone is preferred. Commercially available products such as EAB-F (manufactured by Hodogaya Chemical Co., Ltd.) may also be used.
上記アルコキシアントラセン化合物としては、9,10-ジメトキシアントラセン、2-エチル-9,10-ジメトキシアントラセン、9,10-ジエトキシアントラセン、2-エチル-9,10-ジエトキシアントラセン、9,10-ジブトキシアントラセン、2-エチル-9,10-ジブトキシアントラセン等が挙げられる。
Examples of the alkoxyanthracene compounds include 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 2-ethyl-9,10-diethoxyanthracene, 9,10-dibutoxyanthracene, and 2-ethyl-9,10-dibutoxyanthracene.
上記チオキサントン化合物としては、2-イソプロピルチオキサントン、4-イソプロピルチオキサントン、2,4-ジエチルチオキサントン、2,4-ジクロロチオキサントン、1-クロロ-4-プロポキシチオキサントン等が挙げられる。
The above thioxanthone compounds include 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, 1-chloro-4-propoxythioxanthone, etc.
上記カルボン酸化合物としては、フェニルスルファニル酢酸、メチルフェニルスルファニル酢酸、エチルフェニルスルファニル酢酸、メチルエチルフェニルスルファニル酢酸、ジメチルフェニルスルファニル酢酸、メトキシフェニルスルファニル酢酸、ジメトキシフェニルスルファニル酢酸、クロロフェニルスルファニル酢酸、ジクロロフェニルスルファニル酢酸、N-フェニルグリシン、フェノキシ酢酸、ナフチルチオ酢酸、N-ナフチルグリシン、ナフトキシ酢酸等が挙げられる。
The above carboxylic acid compounds include phenylsulfanylacetic acid, methylphenylsulfanylacetic acid, ethylphenylsulfanylacetic acid, methylethylphenylsulfanylacetic acid, dimethylphenylsulfanylacetic acid, methoxyphenylsulfanylacetic acid, dimethoxyphenylsulfanylacetic acid, chlorophenylsulfanylacetic acid, dichlorophenylsulfanylacetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine, naphthoxyacetic acid, etc.
これらの重合開始助剤(D1)を用いる場合、その含有量は、樹脂(B)及び重合性化合物(C)の合計量100質量部に対して、好ましくは0.1~30質量部、より好ましくは1~20質量部である。重合開始助剤(D1)の量がこの範囲内にあると、さらに高感度で着色パターンを形成することができ、光学フィルタの生産性が向上する傾向にある。
When these polymerization initiation aids (D1) are used, the content is preferably 0.1 to 30 parts by mass, and more preferably 1 to 20 parts by mass, per 100 parts by mass of the total amount of the resin (B) and the polymerizable compound (C). When the amount of the polymerization initiation aid (D1) is within this range, a colored pattern can be formed with even higher sensitivity, and the productivity of the optical filter tends to improve.
<溶剤(E)>
溶剤(E)は、特に限定されず、当該分野で通常使用される溶剤を用いることができる。溶剤(E)としては、例えば、エステル溶剤(すなわち、分子内に-COO-を含み、-O-を含まない溶剤)、エーテル溶剤(すなわち、分子内に-O-を含み、-COO-を含まない溶剤)、エーテルエステル溶剤(すなわち、分子内に-COO-と-O-とを含む溶剤)、ケトン溶剤(すなわち、分子内に-CO-を含み、-COO-を含まない溶剤)、アルコール溶剤(分子内にOHを含み、-O-、-CO-及び-COO-を含まない溶剤)、芳香族炭化水素溶剤、アミド溶剤、ジメチルスルホキシド等が挙げられる。 <Solvent (E)>
The solvent (E) is not particularly limited, and a solvent commonly used in the field can be used. Examples of the solvent (E) include ester solvents (i.e., solvents containing -COO- and not containing -O- in the molecule), ether solvents (i.e., solvents containing -O- and not containing -COO- in the molecule), ether ester solvents (i.e., solvents containing -COO- and -O- in the molecule), ketone solvents (i.e., solvents containing -CO- and not containing -COO- in the molecule), alcohol solvents (solvents containing OH in the molecule and not containing -O-, -CO- and -COO-), aromatic hydrocarbon solvents, amide solvents, dimethyl sulfoxide, and the like.
溶剤(E)は、特に限定されず、当該分野で通常使用される溶剤を用いることができる。溶剤(E)としては、例えば、エステル溶剤(すなわち、分子内に-COO-を含み、-O-を含まない溶剤)、エーテル溶剤(すなわち、分子内に-O-を含み、-COO-を含まない溶剤)、エーテルエステル溶剤(すなわち、分子内に-COO-と-O-とを含む溶剤)、ケトン溶剤(すなわち、分子内に-CO-を含み、-COO-を含まない溶剤)、アルコール溶剤(分子内にOHを含み、-O-、-CO-及び-COO-を含まない溶剤)、芳香族炭化水素溶剤、アミド溶剤、ジメチルスルホキシド等が挙げられる。 <Solvent (E)>
The solvent (E) is not particularly limited, and a solvent commonly used in the field can be used. Examples of the solvent (E) include ester solvents (i.e., solvents containing -COO- and not containing -O- in the molecule), ether solvents (i.e., solvents containing -O- and not containing -COO- in the molecule), ether ester solvents (i.e., solvents containing -COO- and -O- in the molecule), ketone solvents (i.e., solvents containing -CO- and not containing -COO- in the molecule), alcohol solvents (solvents containing OH in the molecule and not containing -O-, -CO- and -COO-), aromatic hydrocarbon solvents, amide solvents, dimethyl sulfoxide, and the like.
エステル溶剤としては、乳酸メチル、乳酸エチル、乳酸ブチル、2-ヒドロキシイソブタン酸メチル、酢酸エチル、酢酸n-ブチル、酢酸イソブチル、ギ酸ペンチル、酢酸イソペンチル、プロピオン酸ブチル、酪酸イソプロピル、酪酸エチル、酪酸ブチル、ピルビン酸メチル、ピルビン酸エチル、ピルビン酸プロピル、アセト酢酸メチル、アセト酢酸エチル、シクロヘキサノールアセテート、γ-ブチロラクトン等が挙げられる。
Ester solvents include methyl lactate, ethyl lactate, butyl lactate, methyl 2-hydroxyisobutanoate, ethyl acetate, n-butyl acetate, isobutyl acetate, pentyl formate, isopentyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, cyclohexanol acetate, and gamma-butyrolactone.
エーテル溶剤としては、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノプロピルエーテル、エチレングリコールモノブチルエーテル、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノブチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、プロピレングリコールモノプロピルエーテル、プロピレングリコールモノブチルエーテル、3-メトキシ-1-ブタノール、3-メトキシ-3-メチルブタノール、テトラヒドロフラン、テトラヒドロピラン、1,4-ジオキサン、ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、ジエチレングリコールメチルエチルエーテル、ジエチレングリコールジプロピルエーテル、ジエチレングリコールジブチルエーテル、アニソール、フェネトール、メチルアニソール等が挙げられる。
Ether solvents include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, 3-methoxy-1-butanol, 3-methoxy-3-methylbutanol, tetrahydrofuran, tetrahydropyran, 1,4-dioxane, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether, anisole, phenetole, methylanisole, etc.
エーテルエステル溶剤としては、メトキシ酢酸メチル、メトキシ酢酸エチル、メトキシ酢酸ブチル、エトキシ酢酸メチル、エトキシ酢酸エチル、3-メトキシプロピオン酸メチル、3-メトキシプロピオン酸エチル、3-エトキシプロピオン酸メチル、3-エトキシプロピオン酸エチル、2-メトキシプロピオン酸メチル、2-メトキシプロピオン酸エチル、2-メトキシプロピオン酸プロピル、2-エトキシプロピオン酸メチル、2-エトキシプロピオン酸エチル、2-メトキシ-2-メチルプロピオン酸メチル、2-エトキシ-2-メチルプロピオン酸エチル、3-メトキシブチルアセテート、3-メチル-3-メトキシブチルアセテート、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノエチルエーテルアセテート、プロピレングリコールモノプロピルエーテルアセテート、エチレングリコールモノメチルエーテルアセテート、エチレングリコールモノエチルエーテルアセテート、ジエチレングリコールモノエチルエーテルアセテート、ジエチレングリコールモノブチルエーテルアセテート等が挙げられる。
Ether ester solvents include methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, methyl 2-methoxy-2-methylpropionate, ethyl 2-ethoxy-2-methylpropionate, 3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate, etc.
ケトン溶剤としては、4-ヒドロキシ-4-メチル-2-ペンタノン、アセトン、2-ブタノン、2-ヘプタノン、3-ヘプタノン、4-ヘプタノン、4-メチル-2-ペンタノン、シクロペンタノン、シクロヘキサノン、イソホロン等が挙げられる。
Ketone solvents include 4-hydroxy-4-methyl-2-pentanone, acetone, 2-butanone, 2-heptanone, 3-heptanone, 4-heptanone, 4-methyl-2-pentanone, cyclopentanone, cyclohexanone, isophorone, etc.
アルコール溶剤としては、メタノール、エタノール、プロパノール、ブタノール、ヘキサノール、シクロヘキサノール、エチレングリコール、プロピレングリコール、グリセリン等が挙げられる。
Alcohol solvents include methanol, ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, glycerin, etc.
芳香族炭化水素溶剤としては、ベンゼン、トルエン、キシレン、メシチレン等が挙げられる。
Aromatic hydrocarbon solvents include benzene, toluene, xylene, mesitylene, etc.
アミド溶剤としては、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N-メチルピロリドン等が挙げられる。
Amide solvents include N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, etc.
溶剤は、エーテル溶剤、エーテルエステル溶剤及びアミド溶剤からなる群より選ばれる1種以上を含むことが好ましく、エーテル溶剤、エーテルエステル溶剤、及びアミド溶剤を含むことがより好ましく、ジエチレングリコールメチルエチルエーテル、プロピレングリコールモノメチルエーテルアセテート、及びN-メチルピロリドンを含むことがさらに好ましい。
The solvent preferably contains one or more selected from the group consisting of ether solvents, ether ester solvents, and amide solvents, more preferably contains ether solvents, ether ester solvents, and amide solvents, and even more preferably contains diethylene glycol methyl ethyl ether, propylene glycol monomethyl ether acetate, and N-methylpyrrolidone.
溶剤(E)の含有量は、組成物の総量に対して、例えば、70~95質量%又は75~92質量%であってよい。いいかえると、組成物の固形分は、例えば、5~30質量%又は8~25質量%であってよい。溶剤(E)の含有量が上記範囲内にあると、塗布時の平坦性が良好になるため、表示特性が良好となる傾向がある。
The content of the solvent (E) may be, for example, 70 to 95% by mass or 75 to 92% by mass, based on the total amount of the composition. In other words, the solid content of the composition may be, for example, 5 to 30% by mass or 8 to 25% by mass. When the content of the solvent (E) is within the above range, the flatness during application is good, and the display characteristics tend to be good.
<レベリング剤(F)>
レベリング剤(F)としては、シリコーン系界面活性剤、フッ素系界面活性剤等が挙げられる。これら界面活性剤は、側鎖に重合性基を有していてもよい。 <Leveling Agent (F)>
Examples of the leveling agent (F) include silicone-based surfactants, fluorine-based surfactants, etc. These surfactants may have a polymerizable group in the side chain.
レベリング剤(F)としては、シリコーン系界面活性剤、フッ素系界面活性剤等が挙げられる。これら界面活性剤は、側鎖に重合性基を有していてもよい。 <Leveling Agent (F)>
Examples of the leveling agent (F) include silicone-based surfactants, fluorine-based surfactants, etc. These surfactants may have a polymerizable group in the side chain.
シリコーン系界面活性剤としては、例えば、分子内にシロキサン結合を有する界面活性剤が挙げられる。具体的には、DOWSIL(登録商標)(旧トーレシリコーン)DC3PA、SH7PA、DC11PA、SH21PA、SH28PA、SH29PA、SH30PA、及びSH8400(商品名、デュポン・東レ・スペシャルティ・マテリアル株式会社(旧東レ・ダウコーニング株式会社)製);KP321、KP322、KP323、KP324、KP326、KP340、及びKP341(信越化学工業株式会社製);TSF400、TSF401、TSF410、TSF4300、TSF4440、TSF4445、TSF4446、TSF4452、及びTSF4460(モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社製)等がシリコーン系界面活性剤として挙げられる。
Examples of silicone-based surfactants include surfactants that have siloxane bonds in the molecule. Specific examples of silicone surfactants include DOWSIL (registered trademark) (formerly Toray Silicone) DC3PA, SH7PA, DC11PA, SH21PA, SH28PA, SH29PA, SH30PA, and SH8400 (product names, manufactured by DuPont Toray Specialty Materials Co., Ltd. (formerly Toray Dow Corning Co., Ltd.)); KP321, KP322, KP323, KP324, KP326, KP340, and KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.); TSF400, TSF401, TSF410, TSF4300, TSF4440, TSF4445, TSF4446, TSF4452, and TSF4460 (manufactured by Momentive Performance Materials Japan LLC).
あるいは、シリコーン系界面活性剤は、フッ素原子を有するシリコーン系界面活性剤であってもよい。フッ素原子を有するシリコーン系界面活性剤としては、例えば、分子内にシロキサン結合及びフルオロカーボン鎖を有する界面活性剤が挙げられる。具体的には、メガファック(登録商標)R08、BL20、F475、F477、及びF443(DIC株式会社製)等がシリコーン系界面活性剤として挙げられる。
Alternatively, the silicone surfactant may be a silicone surfactant having a fluorine atom. Examples of silicone surfactants having a fluorine atom include surfactants having a siloxane bond and a fluorocarbon chain in the molecule. Specific examples of silicone surfactants include Megafac (registered trademark) R08, BL20, F475, F477, and F443 (manufactured by DIC Corporation).
上記のフッ素系界面活性剤としては、例えば、分子内にフルオロカーボン鎖を有する界面活性剤が挙げられる。具体的には、フロラード(登録商標)FC430及びFC431(住友スリーエム株式会社製);メガファック(登録商標)F142D、F171、F172、F173、F177、F183、F554、R30、及びRS-718-K(DIC株式会社製);エフトップ(登録商標)EF301、EF303、EF351、及びEF352(三菱マテリアル電子化成株式会社製);サーフロン(登録商標)S381、S382、SC101、及びSC105(AGC株式会社(旧旭硝子株式会社)製);E5844(株式会社ダイキンファインケミカル研究所製)等がフッ素系界面活性剤として挙げられる。
The above-mentioned fluorosurfactants include, for example, surfactants having a fluorocarbon chain in the molecule. Specific examples of fluorosurfactants include Fluorad (registered trademark) FC430 and FC431 (manufactured by Sumitomo 3M Limited); Megafac (registered trademark) F142D, F171, F172, F173, F177, F183, F554, R30, and RS-718-K (manufactured by DIC Corporation); F-top (registered trademark) EF301, EF303, EF351, and EF352 (manufactured by Mitsubishi Materials Electronic Chemicals Co., Ltd.); Surflon (registered trademark) S381, S382, SC101, and SC105 (manufactured by AGC Inc. (formerly Asahi Glass Co., Ltd.)); and E5844 (manufactured by Daikin Fine Chemicals Research Institute, Ltd.).
レベリング剤(F)の含有量は、平坦性の良好な光学フィルタを得る観点から、組成物の総量に対して、例えば、0.001~0.2質量%、0.002~0.1質量%、又は0.01~0.05質量%であってよい。なお、この含有量に、上記分散剤の含有量は含まれない。
The content of the leveling agent (F) may be, for example, 0.001 to 0.2 mass%, 0.002 to 0.1 mass%, or 0.01 to 0.05 mass% relative to the total amount of the composition, from the viewpoint of obtaining an optical filter with good flatness. Note that this content does not include the content of the dispersant.
<その他の成分>
本発明の本側面に係る組成物は、必要に応じて、充填剤、他の高分子化合物、密着促進剤、酸化防止剤、光安定剤、連鎖移動剤等、当該技術分野で公知の添加剤を含んでもよい。 <Other ingredients>
The composition according to this aspect of the invention may optionally contain additives known in the art, such as fillers, other polymeric compounds, adhesion promoters, antioxidants, light stabilizers, chain transfer agents, and the like.
本発明の本側面に係る組成物は、必要に応じて、充填剤、他の高分子化合物、密着促進剤、酸化防止剤、光安定剤、連鎖移動剤等、当該技術分野で公知の添加剤を含んでもよい。 <Other ingredients>
The composition according to this aspect of the invention may optionally contain additives known in the art, such as fillers, other polymeric compounds, adhesion promoters, antioxidants, light stabilizers, chain transfer agents, and the like.
<組成物の製造方法>
本側面に係る組成物は、例えば、近赤外吸収色素(A1)、樹脂(B)、及び溶剤(E)、並びに必要に応じて用いられる着色剤(A2)、重合性化合物(C)、重合開始剤(D)、レベリング剤(F)、重合開始助剤(D1)、分散剤、及びその他の成分を混合することにより調製できる。混合後の組成物は、孔径0.01~10μm程度のフィルタでろ過することが好ましい。 <Production method of composition>
The composition according to this aspect can be prepared, for example, by mixing the near-infrared absorbing dye (A1), the resin (B), and the solvent (E), as well as the colorant (A2), the polymerizable compound (C), the polymerization initiator (D), the leveling agent (F), the polymerization initiator aid (D1), the dispersant, and other components that are used as needed. The mixed composition is preferably filtered through a filter having a pore size of about 0.01 to 10 μm.
本側面に係る組成物は、例えば、近赤外吸収色素(A1)、樹脂(B)、及び溶剤(E)、並びに必要に応じて用いられる着色剤(A2)、重合性化合物(C)、重合開始剤(D)、レベリング剤(F)、重合開始助剤(D1)、分散剤、及びその他の成分を混合することにより調製できる。混合後の組成物は、孔径0.01~10μm程度のフィルタでろ過することが好ましい。 <Production method of composition>
The composition according to this aspect can be prepared, for example, by mixing the near-infrared absorbing dye (A1), the resin (B), and the solvent (E), as well as the colorant (A2), the polymerizable compound (C), the polymerization initiator (D), the leveling agent (F), the polymerization initiator aid (D1), the dispersant, and other components that are used as needed. The mixed composition is preferably filtered through a filter having a pore size of about 0.01 to 10 μm.
一実施形態において、近赤外吸収色素(A1)及び/又は着色剤(A2)の分散液を調製し、この分散液を他の成分と混合することにより組成物を調製してもよい。近赤外吸収色素(A1)及び/又は着色剤(A2)の分散液は、これらを適宜樹脂(B)及び分散剤とともに溶剤(E)と混合し、ビーズミルなどを用いて分散させることにより調製することができる。ビーズの直径は、例えば、0.05~0.5mm以下であってよい。
In one embodiment, a dispersion of the near-infrared absorbing dye (A1) and/or colorant (A2) may be prepared, and this dispersion may be mixed with other components to prepare the composition. The dispersion of the near-infrared absorbing dye (A1) and/or colorant (A2) may be prepared by mixing them with a solvent (E) together with an appropriate resin (B) and dispersant, and dispersing them using a bead mill or the like. The diameter of the beads may be, for example, 0.05 to 0.5 mm or less.
<光学フィルタ及びその製造方法>
本発明の一側面に係る光学フィルタは、上述の組成物から形成される。光学フィルタは、上述の組成物の硬化物を含んでよく、又は上述の組成物の硬化物からなってもよい。組成物の硬化物は、例えば、膜状に成形した組成物に対して光を照射することにより、又は膜状に成形した組成物を加熱することにより、得ることができる。上述の組成物は、成膜しても近赤外吸収色素に起因する凝集物が生じにくいため、上述の組成物から形成された光学フィルタにおいては、凝集物が低減されている。かかる光学フィルタは、耐光性にも優れる。 Optical Filter and Its Manufacturing Method
An optical filter according to one aspect of the present invention is formed from the above-mentioned composition. The optical filter may include a cured product of the above-mentioned composition, or may be made of a cured product of the above-mentioned composition. The cured product of the composition can be obtained, for example, by irradiating the composition formed into a film with light, or by heating the composition formed into a film. The above-mentioned composition is unlikely to cause aggregates due to the near-infrared absorbing dye even when formed into a film, so that aggregates are reduced in the optical filter formed from the above-mentioned composition. Such an optical filter is also excellent in light resistance.
本発明の一側面に係る光学フィルタは、上述の組成物から形成される。光学フィルタは、上述の組成物の硬化物を含んでよく、又は上述の組成物の硬化物からなってもよい。組成物の硬化物は、例えば、膜状に成形した組成物に対して光を照射することにより、又は膜状に成形した組成物を加熱することにより、得ることができる。上述の組成物は、成膜しても近赤外吸収色素に起因する凝集物が生じにくいため、上述の組成物から形成された光学フィルタにおいては、凝集物が低減されている。かかる光学フィルタは、耐光性にも優れる。 Optical Filter and Its Manufacturing Method
An optical filter according to one aspect of the present invention is formed from the above-mentioned composition. The optical filter may include a cured product of the above-mentioned composition, or may be made of a cured product of the above-mentioned composition. The cured product of the composition can be obtained, for example, by irradiating the composition formed into a film with light, or by heating the composition formed into a film. The above-mentioned composition is unlikely to cause aggregates due to the near-infrared absorbing dye even when formed into a film, so that aggregates are reduced in the optical filter formed from the above-mentioned composition. Such an optical filter is also excellent in light resistance.
また、上述のとおり、上述の組成物は近赤外領域における特定の波長を吸収するため、該組成物から形成された光学フィルタは、近赤外線カットフィルタ又は近赤外線透過フィルタとして利用できる。したがって、本側面にかかる光学フィルタは、例えば、赤外線センサ及び表示装置(例えば、液晶表示装置、有機EL装置、又は電子ペーパー)に用いることができる。
Furthermore, as described above, the above-mentioned composition absorbs specific wavelengths in the near-infrared region, so that an optical filter formed from the composition can be used as a near-infrared cut filter or a near-infrared transmission filter. Therefore, the optical filter according to this aspect can be used, for example, in infrared sensors and display devices (for example, liquid crystal display devices, organic EL devices, or electronic paper).
光学フィルタの厚みは、好ましくは20μm以下、より好ましくは6μm以下、さらに好ましくは3μm以下、さらにより好ましくは1.5μm以下、特に好ましくは0.5μm以下である。光学フィルタの厚みは、好ましくは0.1μm以上、より好ましくは0.2μm以上、さらに好ましくは0.3μm以上である。光学フィルタの厚みは、例えば、0.1~30μm、0.1~20μm、又は0.5~6μmであってよい。
The thickness of the optical filter is preferably 20 μm or less, more preferably 6 μm or less, even more preferably 3 μm or less, even more preferably 1.5 μm or less, and particularly preferably 0.5 μm or less. The thickness of the optical filter is preferably 0.1 μm or more, more preferably 0.2 μm or more, and even more preferably 0.3 μm or more. The thickness of the optical filter may be, for example, 0.1 to 30 μm, 0.1 to 20 μm, or 0.5 to 6 μm.
光学フィルタを製造する方法は特に限定されず、従来公知の方法により製造することができる。例えば、フォトリソグラフ法、インクジェット法、又は印刷法により、任意の基板の上に光学フィルタを形成することができる。なかでも、フォトリソグラフ法が好ましい。
The method for manufacturing the optical filter is not particularly limited, and it can be manufactured by a conventionally known method. For example, an optical filter can be formed on any substrate by a photolithography method, an inkjet method, or a printing method. Among these, the photolithography method is preferable.
基板は、例えば、石英ガラス、ホウケイ酸ガラス、アルミナケイ酸塩ガラス、表面をシリカコートしたソーダライムガラス等のガラス板、ポリカーボネート、ポリメタクリル酸メチル、ポリエチレンテレフタレート等の樹脂板、又はシリコンであってよい。また、これらの基板上に、アルミニウム、銀、銀/銅/パラジウム合金等の薄膜を備える基板を用いることもできる。シリコン基板上にヘキサメチルジシラザン(HMDS)処理を施した基板を用いることもできる。さらに、これらの基板上に、別の光学フィルタ、樹脂層、トランジスタ、回路等を備える基板を用いることもできる。
The substrate may be, for example, a glass plate such as quartz glass, borosilicate glass, alumina silicate glass, or soda lime glass with a silica-coated surface; a resin plate such as polycarbonate, polymethylmethacrylate, or polyethylene terephthalate; or silicon. Substrates having thin films of aluminum, silver, or silver/copper/palladium alloys on these substrates may also be used. Substrates having hexamethyldisilazane (HMDS) treatment on silicon substrates may also be used. Furthermore, substrates having other optical filters, resin layers, transistors, circuits, etc. on these substrates may also be used.
フォトリソグラフ法では、まず、上述の組成物を基板に塗布し、組成物を乾燥させて塗膜を形成する。組成物の塗布は、例えば、スピンコート法、スリットコート法、又はスリット アンド スピンコート法により行うことができる。塗膜の厚みは、目的とする光学フィルタの厚みに応じて適宜決定できる。組成物の乾燥は、例えば、加熱乾燥(プリベーク)及び/又は減圧乾燥により行うことができる。加熱乾燥の温度は、好ましくは30~120℃、より好ましくは50~110℃である。加熱時間は、好ましくは10秒~60分、より好ましくは30秒~30分である。減圧乾燥は、50~150Paの圧力下、20~25℃の温度範囲で行うことが好ましい。
In the photolithography method, the above-mentioned composition is first applied to a substrate, and the composition is dried to form a coating film. The composition can be applied by, for example, spin coating, slit coating, or slit and spin coating. The thickness of the coating film can be appropriately determined depending on the thickness of the desired optical filter. The composition can be dried by, for example, heat drying (pre-baking) and/or reduced pressure drying. The heat drying temperature is preferably 30 to 120°C, more preferably 50 to 110°C. The heating time is preferably 10 seconds to 60 minutes, more preferably 30 seconds to 30 minutes. The reduced pressure drying is preferably performed at a pressure of 50 to 150 Pa and a temperature range of 20 to 25°C.
その後、所定のパターンを有するフォトマスクを介して塗膜を露光し、次いで現像液を接触させて現像することにより、塗膜の硬化物からなる着色パターンを形成する。フォトマスクの有するパターンは、光学フィルタの用途に応じて適宜決定できる。露光に用いられる光源は、好ましくは250~450nmの波長の光を発生する光源である。このような波長の光は、例えば、所定の光源から特定の波長域(例えば350nm未満)の光を、この波長域をカットするフィルタを用いてカットすることにより得ることもできるし、特定の波長(例えば、436nm付近、408nm付近、又は365nm付近)の光を、これらの波長域を取り出すバンドパスフィルタを用いて選択的に取り出すことにより得ることもできる。光源は、例えば、水銀灯、発光ダイオード、メタルハライドランプ、又はハロゲンランプであってよい。露光面全体に均一に平行光線を照射すること、及びフォトマスクと基板との正確な位置合わせを行うことができるため、マスクアライナ及びステッパ等の縮小投影露光装置又はプロキシミティ露光装置を使用することが好ましい。
Then, the coating film is exposed through a photomask having a predetermined pattern, and then developed by contacting with a developer to form a colored pattern consisting of the cured product of the coating film. The pattern of the photomask can be appropriately determined depending on the application of the optical filter. The light source used for exposure is preferably a light source that generates light with a wavelength of 250 to 450 nm. Light of such wavelengths can be obtained, for example, by cutting light of a specific wavelength range (e.g., less than 350 nm) from a specific light source using a filter that cuts this wavelength range, or by selectively extracting light of a specific wavelength (e.g., near 436 nm, near 408 nm, or near 365 nm) using a bandpass filter that extracts these wavelength ranges. The light source may be, for example, a mercury lamp, a light-emitting diode, a metal halide lamp, or a halogen lamp. It is preferable to use a reduction projection exposure device or a proximity exposure device such as a mask aligner and a stepper, because it is possible to uniformly irradiate the entire exposure surface with parallel light rays and to accurately align the photomask and the substrate.
現像液としては、例えば、水酸化カリウム、炭酸水素ナトリウム、炭酸ナトリウム、水酸化テトラメチルアンモニウム等のアルカリ性化合物の水溶液が好ましい。アルカリ性化合物の水溶液中の濃度は、好ましくは0.01~10質量%であり、より好ましくは0.03~5質量%である。現像液は、界面活性剤を含んでいてもよい。現像は、例えばパドル法、ディッピング法又はスプレー法によって行うことができる。現像時に基板を任意の角度に傾けてもよい。現像により、塗膜の未露光部が、現像液に溶解して除去される。
The developer is preferably an aqueous solution of an alkaline compound such as potassium hydroxide, sodium hydrogen carbonate, sodium carbonate, or tetramethylammonium hydroxide. The concentration of the alkaline compound in the aqueous solution is preferably 0.01 to 10% by mass, and more preferably 0.03 to 5% by mass. The developer may contain a surfactant. Development may be performed by, for example, a paddle method, a dipping method, or a spray method. The substrate may be tilted at any angle during development. By development, the unexposed parts of the coating film are dissolved in the developer and removed.
得られた着色パターンには、ポストベークを行うことが好ましい。ポストベークの温度は、例えば、80~250℃、100~245℃、150~250℃、又は160~250℃であってよい。ポストベークの時間は、例えば、1~120分、2~30分間、又は5~60分であってよい。
It is preferable to perform post-baking on the obtained colored pattern. The post-baking temperature may be, for example, 80 to 250°C, 100 to 245°C, 150 to 250°C, or 160 to 250°C. The post-baking time may be, for example, 1 to 120 minutes, 2 to 30 minutes, or 5 to 60 minutes.
なお、上記フォトリソグラフ法において、露光の際にフォトマスクを用いないこと、及び/又は現像しないことにより、パターン化されていない塗膜の硬化物を得ることができる。
In addition, in the above photolithography method, by not using a photomask during exposure and/or by not developing, it is possible to obtain a cured coating film that is not patterned.
上記塗膜の硬化物及び着色パターンは、いずれも本側面に係る光学フィルタの範囲に包含される。
The cured product of the coating and the color pattern are both included in the scope of the optical filter according to this aspect.
<固体撮像素子>
本発明の一側面に係る固体撮像素子は、上述の光学フィルタを備える。光学フィルタは近赤外線透過フィルタ及び/又は近赤外線カットフィルタであってよい。固体素子における光学フィルタ以外の部分は、従来公知の固体撮像素子と同様であってよい。図1に固体撮像素子の一例を示す。 <Solid-state imaging element>
A solid-state imaging device according to one aspect of the present invention includes the optical filter described above. The optical filter may be a near-infrared transmission filter and/or a near-infrared cut filter. The portions of the solid-state imaging device other than the optical filter may be the same as those of a conventionally known solid-state imaging device. An example of a solid-state imaging device is shown in FIG. 1.
本発明の一側面に係る固体撮像素子は、上述の光学フィルタを備える。光学フィルタは近赤外線透過フィルタ及び/又は近赤外線カットフィルタであってよい。固体素子における光学フィルタ以外の部分は、従来公知の固体撮像素子と同様であってよい。図1に固体撮像素子の一例を示す。 <Solid-state imaging element>
A solid-state imaging device according to one aspect of the present invention includes the optical filter described above. The optical filter may be a near-infrared transmission filter and/or a near-infrared cut filter. The portions of the solid-state imaging device other than the optical filter may be the same as those of a conventionally known solid-state imaging device. An example of a solid-state imaging device is shown in FIG. 1.
図1に示す固体撮像素子100は、受光素子等(図示せず)を備える半導体基板2と、近赤外線カットフィルタ4と、近赤外線透過フィルタ6と、カラーフィルタ8と、マイクロレンズ10と、平坦化層12と、を備える。近赤外線カットフィルタ4及び/又は近赤外線透過フィルタ6としては、上述の光学フィルタを用いることができる。カラーフィルタ8は、特に限定されず、例えば、特開2014-043556号公報に記載されるカラーフィルタ等、従来公知の画素形成用のカラーフィルタを用いることができる。マイクロレンズ10及び平坦化層12も特に限定されず、公知のマイクロレンズ及び平坦化層を用いることができる。
The solid-state imaging element 100 shown in FIG. 1 includes a semiconductor substrate 2 including a light receiving element and the like (not shown), a near-infrared cut filter 4, a near-infrared transmission filter 6, a color filter 8, a microlens 10, and a planarization layer 12. The near-infrared cut filter 4 and/or the near-infrared transmission filter 6 may be the optical filters described above. The color filter 8 is not particularly limited, and may be a conventionally known color filter for pixel formation, such as the color filter described in JP-A-2014-043556. The microlens 10 and planarization layer 12 are also not particularly limited, and may be a known microlens and planarization layer.
なお、図1に示す固体撮像素子100においては、近赤外線カットフィルタ4と、カラ
ーフィルタ8と、マイクロレンズ10とがこの順で積層されているが、近赤外線カットフ
ィルタ4とカラーフィルタ8の位置を交換してもよい。また、近赤外線カットフィルタ4
とカラーフィルタ8との間には、別のさらなる層が設けられていてもよい。 In the solid-state imaging device 100 shown in FIG. 1, the near-infrared cut filter 4, the color filter 8, and the microlens 10 are laminated in this order, but the positions of the near-infrared cut filter 4 and the color filter 8 may be interchanged.
Between the transparent electrode 1 and the color filter 8, another further layer may be provided.
ーフィルタ8と、マイクロレンズ10とがこの順で積層されているが、近赤外線カットフ
ィルタ4とカラーフィルタ8の位置を交換してもよい。また、近赤外線カットフィルタ4
とカラーフィルタ8との間には、別のさらなる層が設けられていてもよい。 In the solid-
Between the transparent electrode 1 and the color filter 8, another further layer may be provided.
固体撮像素子は、例えば赤外線センサに用いることができる。すなわち、本発明の一側
面によれば、上述の固体撮像素子を備える赤外線センサも提供される。 The solid-state imaging device can be used, for example, in an infrared sensor. That is, according to one aspect of the present invention, there is also provided an infrared sensor including the above-mentioned solid-state imaging device.
面によれば、上述の固体撮像素子を備える赤外線センサも提供される。 The solid-state imaging device can be used, for example, in an infrared sensor. That is, according to one aspect of the present invention, there is also provided an infrared sensor including the above-mentioned solid-state imaging device.
<式(I)で表される化合物の製造方法>
本発明の一側面に係る、式(I)で表される化合物の製造方法は、式(I-x1)で表される化合物と、式(I-x2)で表される化合物と、式(I-y1)で表される化合物又は式(I-y2)で表される化合物とを、触媒の存在下で反応させる工程を含む。以下、式(I-x1)で表される化合物、式(I-x2)で表される化合物、式(I-y1)で表される化合物、及び式(I-y2)で表される化合物をまとめて、「原料化合物」という場合がある。 <Method for producing the compound represented by formula (I)>
A method for producing a compound represented by formula (I) according to one aspect of the present invention includes a step of reacting a compound represented by formula (I-x1), a compound represented by formula (I-x2), and a compound represented by formula (I-y1) or a compound represented by formula (I-y2) in the presence of a catalyst. Hereinafter, the compound represented by formula (I-x1), the compound represented by formula (I-x2), the compound represented by formula (I-y1), and the compound represented by formula (I-y2) may be collectively referred to as "raw material compounds".
本発明の一側面に係る、式(I)で表される化合物の製造方法は、式(I-x1)で表される化合物と、式(I-x2)で表される化合物と、式(I-y1)で表される化合物又は式(I-y2)で表される化合物とを、触媒の存在下で反応させる工程を含む。以下、式(I-x1)で表される化合物、式(I-x2)で表される化合物、式(I-y1)で表される化合物、及び式(I-y2)で表される化合物をまとめて、「原料化合物」という場合がある。 <Method for producing the compound represented by formula (I)>
A method for producing a compound represented by formula (I) according to one aspect of the present invention includes a step of reacting a compound represented by formula (I-x1), a compound represented by formula (I-x2), and a compound represented by formula (I-y1) or a compound represented by formula (I-y2) in the presence of a catalyst. Hereinafter, the compound represented by formula (I-x1), the compound represented by formula (I-x2), the compound represented by formula (I-y1), and the compound represented by formula (I-y2) may be collectively referred to as "raw material compounds".
この反応は、いわゆる鈴木カップリング及びヘック反応であり、これらの反応によって環形成が起こり、ペンタリレン骨格が形成される。本側面に係る方法によれば、ペンタリレン骨格を有する化合物の従来の製造方法を利用した場合と比べて、必要な工程数が少なく、より簡便に式(I)で表される化合物を製造することができる。
This reaction is the so-called Suzuki coupling and Heck reaction, which causes ring formation and results in the formation of a pentalylene skeleton. The method according to this aspect requires fewer steps and can more easily produce the compound represented by formula (I) compared to the conventional method for producing a compound having a pentalylene skeleton.
式(I-x1)及び式(I-x2)中、R1~R10、X1~X4、並びにY1、Y4、Y5、及びY8は、式(I)において定義及び説明したとおりである。
In formula (I-x1) and formula (I-x2), R 1 to R 10 , X 1 to X 4 , and Y 1 , Y 4 , Y 5 , and Y 8 are as defined and explained in formula (I).
式(I-x1)及び式(I-x2)中、Z1~Z4は、それぞれ独立に、臭素原子又はヨウ素原子を表す。
In formulae (I-x1) and (I-x2), Z 1 to Z 4 each independently represent a bromine atom or an iodine atom.
式(I-y1)及び式(I-y2)中、Y2、Y3、Y6、及びY7は、式(I)において定義及び説明したとおりである。
In formula (I-y1) and formula (I-y2), Y 2 , Y 3 , Y 6 and Y 7 are as defined and explained in formula (I).
式(I-y1)及び式(I-y2)中、A1及びA2は、それぞれ独立に、ヒドロキシ基、炭素数1~20の炭化水素基又はOR13基を表す。
In formula (I-y1) and formula (I-y2), A 1 and A 2 each independently represent a hydroxy group, a hydrocarbon group having 1 to 20 carbon atoms, or an OR 13 group.
A1及びA2で表される炭素数1~20の炭化水素基としては、例えば、R1、R4、R5、又はR8で表される炭素数1~20の炭化水素基として例示した基が挙げられる。
Examples of the hydrocarbon group having 1 to 20 carbon atoms represented by A 1 and A 2 include the groups exemplified as the hydrocarbon group having 1 to 20 carbon atoms represented by R 1 , R 4 , R 5 or R 8 .
R13は炭素数1~20の炭化水素基を表す。式(I-y1)又は式(I-y2)中に2以上のR13が存在する場合、それらは互いに同一でも異なっていてもよい。R13で表される炭素数1~20の炭化水素基としては、例えば、R1、R4、R5、又はR8で表される炭素数1~20の炭化水素基として例示した基が挙げられる。R13は、例えば、メチル基、エチル基、又はイソプロピル基であってよい。
R 13 represents a hydrocarbon group having 1 to 20 carbon atoms. When two or more R 13 are present in formula (I-y1) or formula (I-y2), they may be the same or different. Examples of the hydrocarbon group having 1 to 20 carbon atoms represented by R 13 include the groups exemplified as the hydrocarbon group having 1 to 20 carbon atoms represented by R 1 , R 4 , R 5 , or R 8. R 13 may be, for example, a methyl group, an ethyl group, or an isopropyl group.
同じホウ素原子に結合するOR13基同士は、互いに結合して環を形成していてもよい。形成される環は、例えば、下式で表される環であってよい。
OR 13 groups bonded to the same boron atom may be bonded to each other to form a ring. The ring formed may be, for example, a ring represented by the following formula:
式(I-x1)で表される化合物、式(I-x2)で表される化合物、式(I-y1)で表される化合物、及び式(I-y2)で表される化合物は、いずれも当業者が公知の手法に準じて合成することができる。
The compound represented by formula (I-x1), the compound represented by formula (I-x2), the compound represented by formula (I-y1), and the compound represented by formula (I-y2) can all be synthesized by a person skilled in the art in accordance with known methods.
式(I-x1)で表される化合物及び式(I-x2)で表される化合物の合計モル数と、式(I-y1)で表される化合物のモル数との比は、通常2:1であるが、4.0:1~1.5:1であってもよい。
The ratio of the total number of moles of the compound represented by formula (I-x1) and the compound represented by formula (I-x2) to the number of moles of the compound represented by formula (I-y1) is usually 2:1, but may be 4.0:1 to 1.5:1.
式(I-x1)で表される化合物及び式(I-x2)で表される化合物の合計モル数と、式(I-y2)で表される化合物のモル数との比は、通常2:1であるが、4.0:1~1.5:1であってもよい。
The ratio of the total number of moles of the compound represented by formula (I-x1) and the compound represented by formula (I-x2) to the number of moles of the compound represented by formula (I-y2) is usually 2:1, but may be 4.0:1 to 1.5:1.
また、式(I-y1)で表される化合物と式(I-y2)で表される化合物の両方を用いてもよく、その場合には、式(I-x1)で表される化合物及び式(I-x2)で表される化合物の合計モル数と、式(I-y1)で表される化合物及び式(I-y2)で表される化合物の合計モル数との比は、通常2:1であるが、4.0:1~1.5:1であってもよい。
Also, both the compound represented by formula (I-y1) and the compound represented by formula (I-y2) may be used. In that case, the ratio of the total number of moles of the compound represented by formula (I-x1) and the compound represented by formula (I-x2) to the total number of moles of the compound represented by formula (I-y1) and the compound represented by formula (I-y2) is usually 2:1, but may be 4.0:1 to 1.5:1.
触媒は、鈴木-宮浦クロスカップリング及びヘック-溝呂木クロスカップリング反応の触媒となる触媒であれば特に限定されず、例えば、パラジウム錯体、ニッケル錯体等の遷移金属錯体であってよい。パラジウム錯体としては、例えば、トリス(ベンジリデンアセトン)ジパラジウム(0)、[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウム(II)ジクロリド、テトラキス(トリフェニルホスフィン)パラジウム(0)、ビス(トリフェニルホスフィン)パラジウム(II)ジクロリド、及び酢酸パラジウムが挙げられる。ニッケル錯体としては、例えば、テトラキス(トリフェニルホスフィン)ニッケル(0)、[1,3-ビス(ジフェニルホスフィノ)プロパン)ニッケル(II)ジクロリド、及びビス(1,4-シクロオクタジエン)ニッケル(0)が挙げられる。触媒は、上記遷移金属錯体であって、トリシクロヘキシルホスフィン、トリフェニルホスフィン、トリ(o-トリル)ホスフィン、トリ(tert-ブチル)ホスフィン、1,3-ビス(ジフェニルホスフィノ)プロパン、ビピリジル等の配位子をさらに有する、遷移金属錯体であってもよい。触媒は、好ましくはトリシクロヘキシルホスフィンを配位子として有するトリス(ベンジリデンアセトン)ジパラジウム(0)である。
The catalyst is not particularly limited as long as it is a catalyst that catalyzes the Suzuki-Miyaura cross-coupling and Heck-Mizoroki cross-coupling reactions, and may be, for example, a transition metal complex such as a palladium complex or a nickel complex. Examples of palladium complexes include tris(benzylideneacetone)dipalladium(0), [1,1'-bis(diphenylphosphino)ferrocene]palladium(II) dichloride, tetrakis(triphenylphosphine)palladium(0), bis(triphenylphosphine)palladium(II) dichloride, and palladium acetate. Examples of nickel complexes include tetrakis(triphenylphosphine)nickel(0), [1,3-bis(diphenylphosphino)propane)nickel(II) dichloride, and bis(1,4-cyclooctadiene)nickel(0). The catalyst may be the above-mentioned transition metal complex further having a ligand such as tricyclohexylphosphine, triphenylphosphine, tri(o-tolyl)phosphine, tri(tert-butyl)phosphine, 1,3-bis(diphenylphosphino)propane, bipyridyl, etc. The catalyst is preferably tris(benzylideneacetone)dipalladium(0) having tricyclohexylphosphine as a ligand.
触媒の使用量は、例えば、式(I-y1)で表される化合物及び式(I-y2)で表される化合物の合計モル数に対して、0.001~0.3モル%であってよく、好ましくは、0.05~0.3モル%である。
The amount of catalyst used may be, for example, 0.001 to 0.3 mol% relative to the total number of moles of the compound represented by formula (I-y1) and the compound represented by formula (I-y2), and is preferably 0.05 to 0.3 mol%.
上記反応は、さらに塩基の存在下で行うことが好ましい。塩基は、例えば、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、フッ化カリウム、フッ化セシウム、リン酸三カリウム等の無機塩基、又はフッ化テトラブチルアンモニウム、水酸化テトラエチルアンモニウム、水酸化テトラブチルアンモニウム等の有機塩基であってよい。
The above reaction is preferably carried out in the presence of a base. The base may be, for example, an inorganic base such as sodium carbonate, potassium carbonate, cesium carbonate, potassium fluoride, cesium fluoride, or tripotassium phosphate, or an organic base such as tetrabutylammonium fluoride, tetraethylammonium hydroxide, or tetrabutylammonium hydroxide.
塩基の使用量は、式(I-y1)で表される化合物と式(I-y2)で表される化合物の合計1モルに対して、1~100モルであってよく、好ましくは、3~20モルである。
The amount of base used may be 1 to 100 moles, and preferably 3 to 20 moles, per mole of the compound represented by formula (I-y1) and the compound represented by formula (I-y2).
上記反応の溶媒は、反応に悪影響を及ぼさない限り特に限定されず、例えば、メシチレン、キシレン、トルエン、N、N-ジメチルホルムアミド、ジメチルスルホキシド、テトラヒドロフラン、1,4-ジオキサン、シクロペンチルメチルエーテルを使用することができる。
The solvent for the above reaction is not particularly limited as long as it does not adversely affect the reaction. For example, mesitylene, xylene, toluene, N,N-dimethylformamide, dimethyl sulfoxide, tetrahydrofuran, 1,4-dioxane, and cyclopentyl methyl ether can be used.
溶媒の使用量は、例えば、式(I-y1)で表される化合物と式(I-y2)で表される化合物の合計1質量部に対して、1~100質量部、好ましくは、5~50質量部である。
The amount of the solvent used is, for example, 1 to 100 parts by mass, preferably 5 to 50 parts by mass, per 1 part by mass of the total of the compound represented by formula (I-y1) and the compound represented by formula (I-y2).
反応温度は、例えば、40~200℃又は100~180℃であってよい。反応時間は、例えば、0.5~50時間又は5~30時間であってよい。
The reaction temperature may be, for example, 40 to 200°C or 100 to 180°C. The reaction time may be, for example, 0.5 to 50 hours or 5 to 30 hours.
一実施形態において、上記製造方法は、原料化合物を反応させる上記工程において得られた式(I)で表される化合物におけるR1~R8の一部又は全部を、他の種類のR1~R8に置換する工程をさらに含んでもよい。例えば、得られた式(I)で表される化合物におけるR1~R8がハロゲン原子の場合、式(I)で表される化合物にR11OHを反応させることで、ハロゲン原子の一部又は全部をOR11基で置換することができる。
In one embodiment, the above production method may further include a step of substituting some or all of R 1 to R 8 in the compound represented by formula (I) obtained in the above step of reacting the raw material compounds with other types of R 1 to R 8. For example, when R 1 to R 8 in the obtained compound represented by formula (I) are halogen atoms, some or all of the halogen atoms can be substituted with OR 11 groups by reacting the compound represented by formula (I) with R 11 OH.
以下、実施例を挙げて本発明をより具体的に説明するが、本発明はもとより下記実施例によって制限を受けるものではなく、上記の趣旨に適合し得る範囲で適当に変更を加えて実施することも勿論可能であり、それらはいずれも本発明の技術的範囲に包含される。なお、以下においては、特に断りのない限り、「部」は「質量部」を意味し、「%」は「質量%」を意味する。
The present invention will be explained in more detail below with reference to examples. However, the present invention is not limited to the following examples, and it is of course possible to carry out the invention with appropriate modifications within the scope of the above-mentioned intent, and all such modifications are included within the technical scope of the present invention. In the following, unless otherwise specified, "parts" means "parts by mass" and "%" means "% by mass".
以下の合成例において、化合物の構造は質量分析装置(LC:Agilent社製1200型、MASS:Agilent社製LC/MSD6130型)又はNMR(Varian社製400-MR)で確認した。
In the following synthesis examples, the structures of the compounds were confirmed using a mass spectrometer (LC: Agilent 1200 model, MASS: Agilent LC/MSD6130 model) or NMR (Varian 400-MR).
以下の合成例において、各化合物の極大吸収波長は紫外可視近赤外吸収分光装置(日本分光(株)製V-770)で確認した。具体的には、化合物の10ppmクロロホルム溶液を調製し、波長300~1400nmの範囲で吸光度を測定する(データサンプリング間隔1nm)ことにより、極大吸収波長を確認した。
In the following synthesis examples, the maximum absorption wavelength of each compound was confirmed using an ultraviolet-visible-near infrared absorption spectrometer (V-770, manufactured by JASCO Corporation). Specifically, a 10 ppm chloroform solution of the compound was prepared, and the absorbance was measured in the wavelength range of 300 to 1400 nm (data sampling interval 1 nm) to confirm the maximum absorption wavelength.
樹脂のポリスチレン換算の重量平均分子量(Mw)及び数平均分子量(Mn)の測定は、GPC法により以下の条件で行った。
装置:HLC-8120GPC(東ソー(株)製)
カラム:TSK-GELG2000HXL
カラム温度:40℃
溶剤:テトラヒドロフラン
流速:1.0mL/分
分析試料の固形分濃度:0.001~0.01質量%
注入量:50μL
検出器:RI
校正用標準物質:TSK STANDARD POLYSTYRENE F-40、F-4、F-288、A-2500、A-500(東ソー(株)製) The polystyrene-equivalent weight average molecular weight (Mw) and number average molecular weight (Mn) of the resin were measured by GPC under the following conditions.
Apparatus: HLC-8120GPC (manufactured by Tosoh Corporation)
Column: TSK-GELG2000HXL
Column temperature: 40°C
Solvent: tetrahydrofuran Flow rate: 1.0 mL/min Solids concentration of analytical sample: 0.001 to 0.01% by mass
Injection volume: 50 μL
Detector: RI
Calibration standard material: TSK STANDARD POLYSTYRENE F-40, F-4, F-288, A-2500, A-500 (manufactured by Tosoh Corporation)
装置:HLC-8120GPC(東ソー(株)製)
カラム:TSK-GELG2000HXL
カラム温度:40℃
溶剤:テトラヒドロフラン
流速:1.0mL/分
分析試料の固形分濃度:0.001~0.01質量%
注入量:50μL
検出器:RI
校正用標準物質:TSK STANDARD POLYSTYRENE F-40、F-4、F-288、A-2500、A-500(東ソー(株)製) The polystyrene-equivalent weight average molecular weight (Mw) and number average molecular weight (Mn) of the resin were measured by GPC under the following conditions.
Apparatus: HLC-8120GPC (manufactured by Tosoh Corporation)
Column: TSK-GELG2000HXL
Column temperature: 40°C
Solvent: tetrahydrofuran Flow rate: 1.0 mL/min Solids concentration of analytical sample: 0.001 to 0.01% by mass
Injection volume: 50 μL
Detector: RI
Calibration standard material: TSK STANDARD POLYSTYRENE F-40, F-4, F-288, A-2500, A-500 (manufactured by Tosoh Corporation)
上記で得られたポリスチレン換算の重量平均分子量及び数平均分子量の比(Mw/Mn)を分散度とした。
The ratio of the weight average molecular weight and number average molecular weight (Mw/Mn) calculated in terms of polystyrene obtained above was taken as the degree of dispersion.
<合成例1:化合物(I-A)の合成>
窒素雰囲気下、ナフタレン-1,4,5,8-テトラカルボン酸二無水物(東京化成工業(株)製)5.4部、水酸化カリウム(関東化学(株)製)、及び水104部を混合し、85℃に昇温した。臭素8.0部(富士フイルム和光純薬(株)製)を1時間かけて滴下し、3時間撹拌した。10℃に冷却後、濃塩酸11部を滴下したところ、白色の沈殿物が生じた。この白色の沈殿物を含む混合物をろ過し、ろ過後の残渣を水50部及びメタノール20部で洗浄した。得られた残渣を60℃で減圧乾燥して、4,5-ジブロモナフタレン-1,8-ジカルボン酸二無水物(化合物(I-A))を6.8部得た。 <Synthesis Example 1: Synthesis of compound (IA)>
Under a nitrogen atmosphere, 5.4 parts of naphthalene-1,4,5,8-tetracarboxylic dianhydride (manufactured by Tokyo Chemical Industry Co., Ltd.), potassium hydroxide (manufactured by Kanto Chemical Co., Ltd.), and 104 parts of water were mixed and heated to 85°C. 8.0 parts of bromine (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) were added dropwise over 1 hour, and the mixture was stirred for 3 hours. After cooling to 10°C, 11 parts of concentrated hydrochloric acid were added dropwise, resulting in the formation of a white precipitate. The mixture containing this white precipitate was filtered, and the residue after filtration was washed with 50 parts of water and 20 parts of methanol. The resulting residue was dried under reduced pressure at 60°C to obtain 6.8 parts of 4,5-dibromonaphthalene-1,8-dicarboxylic dianhydride (compound (I-A)).
窒素雰囲気下、ナフタレン-1,4,5,8-テトラカルボン酸二無水物(東京化成工業(株)製)5.4部、水酸化カリウム(関東化学(株)製)、及び水104部を混合し、85℃に昇温した。臭素8.0部(富士フイルム和光純薬(株)製)を1時間かけて滴下し、3時間撹拌した。10℃に冷却後、濃塩酸11部を滴下したところ、白色の沈殿物が生じた。この白色の沈殿物を含む混合物をろ過し、ろ過後の残渣を水50部及びメタノール20部で洗浄した。得られた残渣を60℃で減圧乾燥して、4,5-ジブロモナフタレン-1,8-ジカルボン酸二無水物(化合物(I-A))を6.8部得た。 <Synthesis Example 1: Synthesis of compound (IA)>
Under a nitrogen atmosphere, 5.4 parts of naphthalene-1,4,5,8-tetracarboxylic dianhydride (manufactured by Tokyo Chemical Industry Co., Ltd.), potassium hydroxide (manufactured by Kanto Chemical Co., Ltd.), and 104 parts of water were mixed and heated to 85°C. 8.0 parts of bromine (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) were added dropwise over 1 hour, and the mixture was stirred for 3 hours. After cooling to 10°C, 11 parts of concentrated hydrochloric acid were added dropwise, resulting in the formation of a white precipitate. The mixture containing this white precipitate was filtered, and the residue after filtration was washed with 50 parts of water and 20 parts of methanol. The resulting residue was dried under reduced pressure at 60°C to obtain 6.8 parts of 4,5-dibromonaphthalene-1,8-dicarboxylic dianhydride (compound (I-A)).
<合成例2:化合物(I-B)の合成>
窒素雰囲気下、化合物(I-A)2.5部、2-エチルヘキシルアミン(東京化成工業(株)製)5.0部、1-メチル-2-ピロリドン(富士フイルム和光純薬(株)製)15部、及びプロピオン酸(東京化成工業(株)製)15部を混合し、160℃で12時間撹拌した。10℃に冷却後、水100部を滴下したところ、淡褐色の沈殿物が生じた。この淡褐色の沈殿物を含む混合物をろ過し、ろ過後の残渣を水50部及びメタノール10部で洗浄した。得られた残渣をシリカゲルカラムクロマトグラフィー(溶剤:クロロホルム)によって精製し、60℃で減圧乾燥して化合物(I-B)を2.0部得た。 <Synthesis Example 2: Synthesis of compound (IB)>
Under a nitrogen atmosphere, 2.5 parts of compound (I-A), 5.0 parts of 2-ethylhexylamine (manufactured by Tokyo Chemical Industry Co., Ltd.), 15 parts of 1-methyl-2-pyrrolidone (manufactured by Fujifilm Wako Pure Chemical Industries Co., Ltd.), and 15 parts of propionic acid (manufactured by Tokyo Chemical Industry Co., Ltd.) were mixed and stirred at 160°C for 12 hours. After cooling to 10°C, 100 parts of water were added dropwise, resulting in the formation of a light brown precipitate. The mixture containing this light brown precipitate was filtered, and the residue after filtration was washed with 50 parts of water and 10 parts of methanol. The obtained residue was purified by silica gel column chromatography (solvent: chloroform) and dried under reduced pressure at 60°C to obtain 2.0 parts of compound (IB).
窒素雰囲気下、化合物(I-A)2.5部、2-エチルヘキシルアミン(東京化成工業(株)製)5.0部、1-メチル-2-ピロリドン(富士フイルム和光純薬(株)製)15部、及びプロピオン酸(東京化成工業(株)製)15部を混合し、160℃で12時間撹拌した。10℃に冷却後、水100部を滴下したところ、淡褐色の沈殿物が生じた。この淡褐色の沈殿物を含む混合物をろ過し、ろ過後の残渣を水50部及びメタノール10部で洗浄した。得られた残渣をシリカゲルカラムクロマトグラフィー(溶剤:クロロホルム)によって精製し、60℃で減圧乾燥して化合物(I-B)を2.0部得た。 <Synthesis Example 2: Synthesis of compound (IB)>
Under a nitrogen atmosphere, 2.5 parts of compound (I-A), 5.0 parts of 2-ethylhexylamine (manufactured by Tokyo Chemical Industry Co., Ltd.), 15 parts of 1-methyl-2-pyrrolidone (manufactured by Fujifilm Wako Pure Chemical Industries Co., Ltd.), and 15 parts of propionic acid (manufactured by Tokyo Chemical Industry Co., Ltd.) were mixed and stirred at 160°C for 12 hours. After cooling to 10°C, 100 parts of water were added dropwise, resulting in the formation of a light brown precipitate. The mixture containing this light brown precipitate was filtered, and the residue after filtration was washed with 50 parts of water and 10 parts of methanol. The obtained residue was purified by silica gel column chromatography (solvent: chloroform) and dried under reduced pressure at 60°C to obtain 2.0 parts of compound (IB).
化合物(I-B)の同定:
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 466
Exact Mass:465 Identification of compound (IB):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 466
Exact Mass: 465
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 466
Exact Mass:465 Identification of compound (IB):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 466
Exact Mass: 465
<合成例3:化合物(I-C)の合成>
窒素雰囲気下、化合物(I-B)22部、4,4,5,5-テトラメチル-2-(1-ナフチル)-1,3,2-ジオキサボロラン10部、トリス(ジベンジリデンアセトン)ジパラジウム(0)(東京化成工業(株)製)3.6部、トリシクロヘキシルホスフィン(富士フイルム和光純薬(株)製)4.4部、炭酸カリウム(関東化学(株)製)67部、及び脱水キシレン(関東化学(株)製)720部を混合し、145℃で18時間撹拌した。20℃に冷却後、反応液をろ過した。溶媒を減圧留去し、粗成生物をシリカゲルカラムクロマトグラフィー(溶媒:クロロホルム)によって精製して、化合物(I-C)の赤色固体を9部得た。 Synthesis Example 3: Synthesis of compound (IC)
Under a nitrogen atmosphere, 22 parts of compound (IB), 10 parts of 4,4,5,5-tetramethyl-2-(1-naphthyl)-1,3,2-dioxaborolane, 3.6 parts of tris(dibenzylideneacetone)dipalladium(0) (Tokyo Chemical Industry Co., Ltd.), 4.4 parts of tricyclohexylphosphine (Fujifilm Wako Pure Chemical Industries, Ltd.), 67 parts of potassium carbonate (Kanto Chemical Co., Ltd.), and 720 parts of dehydrated xylene (Kanto Chemical Co., Ltd.) were mixed and stirred at 145°C for 18 hours. After cooling to 20°C, the reaction liquid was filtered. The solvent was distilled off under reduced pressure, and the crude product was purified by silica gel column chromatography (solvent: chloroform) to obtain 9 parts of a red solid of compound (IC).
窒素雰囲気下、化合物(I-B)22部、4,4,5,5-テトラメチル-2-(1-ナフチル)-1,3,2-ジオキサボロラン10部、トリス(ジベンジリデンアセトン)ジパラジウム(0)(東京化成工業(株)製)3.6部、トリシクロヘキシルホスフィン(富士フイルム和光純薬(株)製)4.4部、炭酸カリウム(関東化学(株)製)67部、及び脱水キシレン(関東化学(株)製)720部を混合し、145℃で18時間撹拌した。20℃に冷却後、反応液をろ過した。溶媒を減圧留去し、粗成生物をシリカゲルカラムクロマトグラフィー(溶媒:クロロホルム)によって精製して、化合物(I-C)の赤色固体を9部得た。 Synthesis Example 3: Synthesis of compound (IC)
Under a nitrogen atmosphere, 22 parts of compound (IB), 10 parts of 4,4,5,5-tetramethyl-2-(1-naphthyl)-1,3,2-dioxaborolane, 3.6 parts of tris(dibenzylideneacetone)dipalladium(0) (Tokyo Chemical Industry Co., Ltd.), 4.4 parts of tricyclohexylphosphine (Fujifilm Wako Pure Chemical Industries, Ltd.), 67 parts of potassium carbonate (Kanto Chemical Co., Ltd.), and 720 parts of dehydrated xylene (Kanto Chemical Co., Ltd.) were mixed and stirred at 145°C for 18 hours. After cooling to 20°C, the reaction liquid was filtered. The solvent was distilled off under reduced pressure, and the crude product was purified by silica gel column chromatography (solvent: chloroform) to obtain 9 parts of a red solid of compound (IC).
化合物(I-C)の同定:
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 434
Exact Mass:433 Identification of compound (IC):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 434
Exact Mass: 433
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 434
Exact Mass:433 Identification of compound (IC):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 434
Exact Mass: 433
<合成例4:化合物(I-D)の合成>
窒素雰囲気下、化合物(I-C)10部、臭素(富士フイルム和光純薬(株)製)737部、及びクロロホルム(ナカライテスク(株)製)700部を混合し、60℃で48時間撹拌した。反応終了後、反応液を室温(18~24℃)まで冷却し、亜硫酸ナトリウム水溶液(1M)3000部を加えた。クロロホルム700部で洗浄を行い、分液操作を行った。得られた有機層を無水硫酸ナトリウム(関東化学(株)製)で脱水し、硫酸ナトリウムを濾過後、溶媒を留去した。粗成生物をシリカゲルカラムクロマトグラフィー(溶媒:クロロホルム/酢酸エチル=5/1(容積/容積))によって精製し、化合物(I-D)の無色結晶を5.3部得た。 <Synthesis Example 4: Synthesis of compound (ID)>
Under a nitrogen atmosphere, 10 parts of compound (IC), 737 parts of bromine (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.), and 700 parts of chloroform (manufactured by Nacalai Tesque, Inc.) were mixed and stirred at 60°C for 48 hours. After the reaction was completed, the reaction solution was cooled to room temperature (18 to 24°C), and 3000 parts of an aqueous sodium sulfite solution (1M) was added. The mixture was washed with 700 parts of chloroform and subjected to a liquid separation operation. The obtained organic layer was dehydrated with anhydrous sodium sulfate (manufactured by Kanto Chemical Co., Ltd.), and the sodium sulfate was filtered, and the solvent was distilled off. The crude product was purified by silica gel column chromatography (solvent: chloroform/ethyl acetate = 5/1 (volume/volume)), and 5.3 parts of colorless crystals of compound (ID) were obtained.
窒素雰囲気下、化合物(I-C)10部、臭素(富士フイルム和光純薬(株)製)737部、及びクロロホルム(ナカライテスク(株)製)700部を混合し、60℃で48時間撹拌した。反応終了後、反応液を室温(18~24℃)まで冷却し、亜硫酸ナトリウム水溶液(1M)3000部を加えた。クロロホルム700部で洗浄を行い、分液操作を行った。得られた有機層を無水硫酸ナトリウム(関東化学(株)製)で脱水し、硫酸ナトリウムを濾過後、溶媒を留去した。粗成生物をシリカゲルカラムクロマトグラフィー(溶媒:クロロホルム/酢酸エチル=5/1(容積/容積))によって精製し、化合物(I-D)の無色結晶を5.3部得た。 <Synthesis Example 4: Synthesis of compound (ID)>
Under a nitrogen atmosphere, 10 parts of compound (IC), 737 parts of bromine (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.), and 700 parts of chloroform (manufactured by Nacalai Tesque, Inc.) were mixed and stirred at 60°C for 48 hours. After the reaction was completed, the reaction solution was cooled to room temperature (18 to 24°C), and 3000 parts of an aqueous sodium sulfite solution (1M) was added. The mixture was washed with 700 parts of chloroform and subjected to a liquid separation operation. The obtained organic layer was dehydrated with anhydrous sodium sulfate (manufactured by Kanto Chemical Co., Ltd.), and the sodium sulfate was filtered, and the solvent was distilled off. The crude product was purified by silica gel column chromatography (solvent: chloroform/ethyl acetate = 5/1 (volume/volume)), and 5.3 parts of colorless crystals of compound (ID) were obtained.
化合物(I-D)の同定:
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 746
Exact Mass:745 Identification of compound (ID):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 746
Exact Mass: 745
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 746
Exact Mass:745 Identification of compound (ID):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 746
Exact Mass: 745
<合成例5:化合物(I-x-1)の合成>
窒素雰囲気下、化合物(I-D)10部、4-プロポキシフェノール(東京化成工業(株)製)4.0部、炭酸カリウム(関東化学(株)製)4.1部、及びN-メチル-2-ピロリジノン(関東化学(株)製)323部を混合し、120℃で6時間撹拌した。反応終了後、反応液を室温(18~24℃)まで冷却し、濃塩酸(富士フイルム和光純薬(株)製)198部及び水992部を加えた。析出した固体を、イオン交換水200部で2回、続いてメタノール200部で2回洗浄し、デカンテーションした。粗成生物をシリカゲルカラムクロマトグラフィー(溶媒:クロロホルム)によって精製し、化合物(I-x-1)の赤色固体を8.5部得た。 Synthesis Example 5: Synthesis of compound (I-x-1)
Under a nitrogen atmosphere, 10 parts of compound (ID), 4.0 parts of 4-propoxyphenol (manufactured by Tokyo Chemical Industry Co., Ltd.), 4.1 parts of potassium carbonate (manufactured by Kanto Chemical Co., Ltd.), and 323 parts of N-methyl-2-pyrrolidinone (manufactured by Kanto Chemical Co., Ltd.) were mixed and stirred at 120°C for 6 hours. After completion of the reaction, the reaction solution was cooled to room temperature (18 to 24°C), and 198 parts of concentrated hydrochloric acid (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) and 992 parts of water were added. The precipitated solid was washed twice with 200 parts of ion-exchanged water and then twice with 200 parts of methanol, and decanted. The crude product was purified by silica gel column chromatography (solvent: chloroform) to obtain 8.5 parts of a red solid of compound (I-x-1).
窒素雰囲気下、化合物(I-D)10部、4-プロポキシフェノール(東京化成工業(株)製)4.0部、炭酸カリウム(関東化学(株)製)4.1部、及びN-メチル-2-ピロリジノン(関東化学(株)製)323部を混合し、120℃で6時間撹拌した。反応終了後、反応液を室温(18~24℃)まで冷却し、濃塩酸(富士フイルム和光純薬(株)製)198部及び水992部を加えた。析出した固体を、イオン交換水200部で2回、続いてメタノール200部で2回洗浄し、デカンテーションした。粗成生物をシリカゲルカラムクロマトグラフィー(溶媒:クロロホルム)によって精製し、化合物(I-x-1)の赤色固体を8.5部得た。 Synthesis Example 5: Synthesis of compound (I-x-1)
Under a nitrogen atmosphere, 10 parts of compound (ID), 4.0 parts of 4-propoxyphenol (manufactured by Tokyo Chemical Industry Co., Ltd.), 4.1 parts of potassium carbonate (manufactured by Kanto Chemical Co., Ltd.), and 323 parts of N-methyl-2-pyrrolidinone (manufactured by Kanto Chemical Co., Ltd.) were mixed and stirred at 120°C for 6 hours. After completion of the reaction, the reaction solution was cooled to room temperature (18 to 24°C), and 198 parts of concentrated hydrochloric acid (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) and 992 parts of water were added. The precipitated solid was washed twice with 200 parts of ion-exchanged water and then twice with 200 parts of methanol, and decanted. The crude product was purified by silica gel column chromatography (solvent: chloroform) to obtain 8.5 parts of a red solid of compound (I-x-1).
化合物(I-x-1)の同定:
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 890
Exact Mass:889 Identification of compound (I-x-1):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 890
Exact Mass: 889
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 890
Exact Mass:889 Identification of compound (I-x-1):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 890
Exact Mass: 889
<合成例6:化合物(I-y-1)の合成>
窒素雰囲気下、1,8-ジブロモナフタレン(東京化成工業(株)製)5.0部、ビス(ピナコラト)ジボロン(東京化成工業(株)製)11部、酢酸カリウム(関東化学(株)製)10部、1,1-ビス(ジフェニルホスフィノ)フェロセンジクロロパラジウム(II)(富士フイルム和光純薬(株)製)1.3部、及び脱水N,N-ジメチルホルムアミド(関東化学(製))95部を混合し、90℃で17時間撹拌した。得られた混合物をセライトろ過し、ろ液を濃縮した。残渣をメタノール18部で洗浄した。得られた残渣を60℃で減圧乾燥して、化合物(化合物(I-y-1)を5.6部得た。 Synthesis Example 6: Synthesis of compound (I-y-1)
Under a nitrogen atmosphere, 5.0 parts of 1,8-dibromonaphthalene (manufactured by Tokyo Chemical Industry Co., Ltd.), 11 parts of bis(pinacolato)diboron (manufactured by Tokyo Chemical Industry Co., Ltd.), 10 parts of potassium acetate (manufactured by Kanto Chemical Co., Ltd.), 1.3 parts of 1,1-bis(diphenylphosphino)ferrocenedichloropalladium(II) (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.), and 95 parts of dehydrated N,N-dimethylformamide (manufactured by Kanto Chemical Co., Ltd.) were mixed and stirred at 90° C. for 17 hours. The resulting mixture was filtered through Celite, and the filtrate was concentrated. The residue was washed with 18 parts of methanol. The resulting residue was dried under reduced pressure at 60° C. to obtain 5.6 parts of a compound (Compound (I-y-1).
窒素雰囲気下、1,8-ジブロモナフタレン(東京化成工業(株)製)5.0部、ビス(ピナコラト)ジボロン(東京化成工業(株)製)11部、酢酸カリウム(関東化学(株)製)10部、1,1-ビス(ジフェニルホスフィノ)フェロセンジクロロパラジウム(II)(富士フイルム和光純薬(株)製)1.3部、及び脱水N,N-ジメチルホルムアミド(関東化学(製))95部を混合し、90℃で17時間撹拌した。得られた混合物をセライトろ過し、ろ液を濃縮した。残渣をメタノール18部で洗浄した。得られた残渣を60℃で減圧乾燥して、化合物(化合物(I-y-1)を5.6部得た。 Synthesis Example 6: Synthesis of compound (I-y-1)
Under a nitrogen atmosphere, 5.0 parts of 1,8-dibromonaphthalene (manufactured by Tokyo Chemical Industry Co., Ltd.), 11 parts of bis(pinacolato)diboron (manufactured by Tokyo Chemical Industry Co., Ltd.), 10 parts of potassium acetate (manufactured by Kanto Chemical Co., Ltd.), 1.3 parts of 1,1-bis(diphenylphosphino)ferrocenedichloropalladium(II) (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.), and 95 parts of dehydrated N,N-dimethylformamide (manufactured by Kanto Chemical Co., Ltd.) were mixed and stirred at 90° C. for 17 hours. The resulting mixture was filtered through Celite, and the filtrate was concentrated. The residue was washed with 18 parts of methanol. The resulting residue was dried under reduced pressure at 60° C. to obtain 5.6 parts of a compound (Compound (I-y-1).
化合物(I-y-1)の同定:
1H NMR(400MHz,CDCl3,25℃)δ 1.42(s,24H),7.51(dd,2H),8.02(s,2H),8.75(dd,2H). Identification of compound (I-y-1):
1H NMR (400MHz, CDCl3, 25 [deg.]C) δ 1.42 (s, 24H), 7.51 (dd, 2H), 8.02 (s, 2H), 8.75 (dd, 2H).
1H NMR(400MHz,CDCl3,25℃)δ 1.42(s,24H),7.51(dd,2H),8.02(s,2H),8.75(dd,2H). Identification of compound (I-y-1):
1H NMR (400MHz, CDCl3, 25 [deg.]C) δ 1.42 (s, 24H), 7.51 (dd, 2H), 8.02 (s, 2H), 8.75 (dd, 2H).
<合成例7:実施例化合物(I-2)の合成>
窒素雰囲気下、化合物(I-x-1)52部、化合物(I-y-1)10部、トリス(ジベンジリデンアセトン)ジパラジウム(0)(東京化成工業(株)製)4.8部、トリシクロヘキシルホスフィン(富士フイルム和光純薬(株)製)5.9部、炭酸カリウム(関東化学(株)製)45部、及びメシチレン(東京化成(株)製)720部を混合し、160℃で18時間撹拌した。反応終了後、反応液を室温まで冷却し、8000部のメタノール中に注いだ。析出した固体を、イオン交換水200部で2回、続いてメタノール200部で2回洗浄し、デカンテーションした。粗成生物をシリカゲルカラムクロマトグラフィー(溶剤:クロロホルム)によって精製し、化合物(I-2)の暗緑色固体を28部得た。 Synthesis Example 7: Synthesis of Example Compound (I-2)
Under a nitrogen atmosphere, 52 parts of compound (I-x-1), 10 parts of compound (I-y-1), 4.8 parts of tris(dibenzylideneacetone)dipalladium(0) (manufactured by Tokyo Chemical Industry Co., Ltd.), 5.9 parts of tricyclohexylphosphine (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.), 45 parts of potassium carbonate (manufactured by Kanto Chemical Co., Ltd.), and 720 parts of mesitylene (manufactured by Tokyo Chemical Industry Co., Ltd.) were mixed and stirred at 160 ° C. for 18 hours. After the reaction was completed, the reaction liquid was cooled to room temperature and poured into 8000 parts of methanol. The precipitated solid was washed twice with 200 parts of ion-exchanged water, followed by washing twice with 200 parts of methanol, and decantation was performed. The crude product was purified by silica gel column chromatography (solvent: chloroform) to obtain 28 parts of a dark green solid of compound (I-2).
窒素雰囲気下、化合物(I-x-1)52部、化合物(I-y-1)10部、トリス(ジベンジリデンアセトン)ジパラジウム(0)(東京化成工業(株)製)4.8部、トリシクロヘキシルホスフィン(富士フイルム和光純薬(株)製)5.9部、炭酸カリウム(関東化学(株)製)45部、及びメシチレン(東京化成(株)製)720部を混合し、160℃で18時間撹拌した。反応終了後、反応液を室温まで冷却し、8000部のメタノール中に注いだ。析出した固体を、イオン交換水200部で2回、続いてメタノール200部で2回洗浄し、デカンテーションした。粗成生物をシリカゲルカラムクロマトグラフィー(溶剤:クロロホルム)によって精製し、化合物(I-2)の暗緑色固体を28部得た。 Synthesis Example 7: Synthesis of Example Compound (I-2)
Under a nitrogen atmosphere, 52 parts of compound (I-x-1), 10 parts of compound (I-y-1), 4.8 parts of tris(dibenzylideneacetone)dipalladium(0) (manufactured by Tokyo Chemical Industry Co., Ltd.), 5.9 parts of tricyclohexylphosphine (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.), 45 parts of potassium carbonate (manufactured by Kanto Chemical Co., Ltd.), and 720 parts of mesitylene (manufactured by Tokyo Chemical Industry Co., Ltd.) were mixed and stirred at 160 ° C. for 18 hours. After the reaction was completed, the reaction liquid was cooled to room temperature and poured into 8000 parts of methanol. The precipitated solid was washed twice with 200 parts of ion-exchanged water, followed by washing twice with 200 parts of methanol, and decantation was performed. The crude product was purified by silica gel column chromatography (solvent: chloroform) to obtain 28 parts of a dark green solid of compound (I-2).
化合物(I-2)の同定:
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 1588
Exact Mass:1587
(吸収スペクトル)10ppmクロロホルム溶液極大吸収波長(λmax):889nm Identification of compound (I-2):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 1588
Exact Mass: 1587
(Absorption spectrum) 10 ppm chloroform solution Maximum absorption wavelength (λ max ): 889 nm
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 1588
Exact Mass:1587
(吸収スペクトル)10ppmクロロホルム溶液極大吸収波長(λmax):889nm Identification of compound (I-2):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 1588
Exact Mass: 1587
(Absorption spectrum) 10 ppm chloroform solution Maximum absorption wavelength (λ max ): 889 nm
<合成例8:化合物(I-E)の合成>
窒素雰囲気下、1,6,7,12-テトラクロロ-3,4,9,10-ペリレンテトラカルボン酸無水物(CombiBlcok社製)10部、水酸化ナトリウム(関東化学(株)製)6.8部、及び水490部を混合した。臭素(富士フイルム和光純薬(株)製)6.6部、及び酢酸(関東化学(製))4.5部を混合し、80℃で2時間撹拌した。反応終了後、反応液を室温(18~24℃)まで冷却した。析出した固体を濾過し、イオン交換水100部で2回、続いてメタノール100部で2回洗浄し、デカンテーションした。60℃で減圧乾燥し、化合物(I-E)の黄色結晶を10部得た。 <Synthesis Example 8: Synthesis of compound (IE)>
Under a nitrogen atmosphere, 10 parts of 1,6,7,12-tetrachloro-3,4,9,10-perylenetetracarboxylic anhydride (manufactured by CombiBlcok), 6.8 parts of sodium hydroxide (manufactured by Kanto Chemical Co., Ltd.), and 490 parts of water were mixed. 6.6 parts of bromine (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) and 4.5 parts of acetic acid (manufactured by Kanto Chemical Co., Ltd.) were mixed and stirred at 80°C for 2 hours. After completion of the reaction, the reaction liquid was cooled to room temperature (18 to 24°C). The precipitated solid was filtered, washed twice with 100 parts of ion-exchanged water and then twice with 100 parts of methanol, and decanted. The mixture was dried under reduced pressure at 60°C to obtain 10 parts of yellow crystals of compound (I-E).
窒素雰囲気下、1,6,7,12-テトラクロロ-3,4,9,10-ペリレンテトラカルボン酸無水物(CombiBlcok社製)10部、水酸化ナトリウム(関東化学(株)製)6.8部、及び水490部を混合した。臭素(富士フイルム和光純薬(株)製)6.6部、及び酢酸(関東化学(製))4.5部を混合し、80℃で2時間撹拌した。反応終了後、反応液を室温(18~24℃)まで冷却した。析出した固体を濾過し、イオン交換水100部で2回、続いてメタノール100部で2回洗浄し、デカンテーションした。60℃で減圧乾燥し、化合物(I-E)の黄色結晶を10部得た。 <Synthesis Example 8: Synthesis of compound (IE)>
Under a nitrogen atmosphere, 10 parts of 1,6,7,12-tetrachloro-3,4,9,10-perylenetetracarboxylic anhydride (manufactured by CombiBlcok), 6.8 parts of sodium hydroxide (manufactured by Kanto Chemical Co., Ltd.), and 490 parts of water were mixed. 6.6 parts of bromine (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) and 4.5 parts of acetic acid (manufactured by Kanto Chemical Co., Ltd.) were mixed and stirred at 80°C for 2 hours. After completion of the reaction, the reaction liquid was cooled to room temperature (18 to 24°C). The precipitated solid was filtered, washed twice with 100 parts of ion-exchanged water and then twice with 100 parts of methanol, and decanted. The mixture was dried under reduced pressure at 60°C to obtain 10 parts of yellow crystals of compound (I-E).
<合成例9:化合物(I-x-2)の合成>
窒素雰囲気下、化合物(I-E)10部、2,6-ジイソプロピルアニリン5.7部(東京化成工業(株)製)、酢酸(関東化学(株)製)80部、及びN-メチル-2-ピロリジノン(関東化学(株)製)160部を混合し、110℃で49時間撹拌した。反応終了後、反応液を室温(18~24℃)まで冷却し、水2500部を加えた。析出した固体を濾過し、イオン交換水30部で2回洗浄した。粗生成物をシリカゲルカラムクロマトグラフィー(溶剤:クロロホルム)によって精製し、化合物(I-x-2)の赤色固体を6.5部得た。 Synthesis Example 9: Synthesis of compound (I-x-2)
Under a nitrogen atmosphere, 10 parts of compound (I-E), 5.7 parts of 2,6-diisopropylaniline (manufactured by Tokyo Chemical Industry Co., Ltd.), 80 parts of acetic acid (manufactured by Kanto Chemical Co., Ltd.), and 160 parts of N-methyl-2-pyrrolidinone (manufactured by Kanto Chemical Co., Ltd.) were mixed and stirred at 110° C. for 49 hours. After completion of the reaction, the reaction liquid was cooled to room temperature (18 to 24° C.), and 2,500 parts of water were added. The precipitated solid was filtered and washed twice with 30 parts of ion-exchanged water. The crude product was purified by silica gel column chromatography (solvent: chloroform) to obtain 6.5 parts of a red solid of compound (I-x-2).
窒素雰囲気下、化合物(I-E)10部、2,6-ジイソプロピルアニリン5.7部(東京化成工業(株)製)、酢酸(関東化学(株)製)80部、及びN-メチル-2-ピロリジノン(関東化学(株)製)160部を混合し、110℃で49時間撹拌した。反応終了後、反応液を室温(18~24℃)まで冷却し、水2500部を加えた。析出した固体を濾過し、イオン交換水30部で2回洗浄した。粗生成物をシリカゲルカラムクロマトグラフィー(溶剤:クロロホルム)によって精製し、化合物(I-x-2)の赤色固体を6.5部得た。 Synthesis Example 9: Synthesis of compound (I-x-2)
Under a nitrogen atmosphere, 10 parts of compound (I-E), 5.7 parts of 2,6-diisopropylaniline (manufactured by Tokyo Chemical Industry Co., Ltd.), 80 parts of acetic acid (manufactured by Kanto Chemical Co., Ltd.), and 160 parts of N-methyl-2-pyrrolidinone (manufactured by Kanto Chemical Co., Ltd.) were mixed and stirred at 110° C. for 49 hours. After completion of the reaction, the reaction liquid was cooled to room temperature (18 to 24° C.), and 2,500 parts of water were added. The precipitated solid was filtered and washed twice with 30 parts of ion-exchanged water. The crude product was purified by silica gel column chromatography (solvent: chloroform) to obtain 6.5 parts of a red solid of compound (I-x-2).
化合物(I-x-2)の同定:
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 774
Exact Mass:773 Identification of compound (I-x-2):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 774
Exact Mass: 773
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 774
Exact Mass:773 Identification of compound (I-x-2):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 774
Exact Mass: 773
<合成例10:実施例化合物(I-1)の合成>
化合物(I-x-1)(東京化成工業(株)製)52部を化合物(I-x-2)45部に変えた以外は、合成例7の化合物(I-2)の合成と同様にして、化合物(I-1)の暗緑色結晶を13部得た。 Synthesis Example 10: Synthesis of Example Compound (I-1)
13 parts of dark green crystals of compound (I-1) were obtained in the same manner as in the synthesis of compound (I-2) in Synthesis Example 7, except that 52 parts of compound (I-x-1) (manufactured by Tokyo Chemical Industry Co., Ltd.) was changed to 45 parts of compound (I-x-2).
化合物(I-x-1)(東京化成工業(株)製)52部を化合物(I-x-2)45部に変えた以外は、合成例7の化合物(I-2)の合成と同様にして、化合物(I-1)の暗緑色結晶を13部得た。 Synthesis Example 10: Synthesis of Example Compound (I-1)
13 parts of dark green crystals of compound (I-1) were obtained in the same manner as in the synthesis of compound (I-2) in Synthesis Example 7, except that 52 parts of compound (I-x-1) (manufactured by Tokyo Chemical Industry Co., Ltd.) was changed to 45 parts of compound (I-x-2).
化合物(I-1)の同定:
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 1355
Exact Mass:1354
(吸収スペクトル)10ppmクロロホルム溶液極大吸収波長(λmax):822nm Identification of compound (I-1):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 1355
Exact Mass: 1354
(Absorption spectrum) 10 ppm chloroform solution Maximum absorption wavelength (λ max ): 822 nm
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 1355
Exact Mass:1354
(吸収スペクトル)10ppmクロロホルム溶液極大吸収波長(λmax):822nm Identification of compound (I-1):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 1355
Exact Mass: 1354
(Absorption spectrum) 10 ppm chloroform solution Maximum absorption wavelength (λ max ): 822 nm
<合成例11:実施例化合物(I-3)の合成>
窒素雰囲気下、化合物(I-1)10部、4-tert-ブチルフェノール(東京化成工業(株)製)12部、炭酸カリウム(関東化学(株)製)12部、及びN-メチル-2-ピロリジノン(関東化学(株)製)323部を混合し、120℃で6時間撹拌した。反応終了後、反応液を室温(18~24℃)まで冷却し、濃塩酸(富士フイルム和光純薬(株)製)198部及び水992部を加えた。析出した固体を、イオン交換水200部で2回、続いてメタノール200部で2回洗浄し、デカンテーションした。粗成生物をシリカゲルカラムクロマトグラフィー(溶媒:クロロホルム)によって精製し、式(I-3)で表される化合物の混合物の暗緑色結晶を13部得た(以下、便宜上、この化合物の混合物を化合物(I-3)という)。式(I-3)で表される化合物の混合物は、式(I-3)中の置換基Rとして、塩素原子と4-tert-ブチルフェノキシ基とを、3/5、2/6、及び1/7の比でそれぞれ含む3種類の化合物の混合物であった。 Synthesis Example 11: Synthesis of Example Compound (I-3)
Under a nitrogen atmosphere, 10 parts of compound (I-1), 12 parts of 4-tert-butylphenol (manufactured by Tokyo Chemical Industry Co., Ltd.), 12 parts of potassium carbonate (manufactured by Kanto Chemical Co., Ltd.), and 323 parts of N-methyl-2-pyrrolidinone (manufactured by Kanto Chemical Co., Ltd.) were mixed and stirred at 120 ° C. for 6 hours. After the reaction was completed, the reaction solution was cooled to room temperature (18 to 24 ° C.), and 198 parts of concentrated hydrochloric acid (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) and 992 parts of water were added. The precipitated solid was washed twice with 200 parts of ion-exchanged water, followed by washing twice with 200 parts of methanol, and decantation was performed. The crude product was purified by silica gel column chromatography (solvent: chloroform) to obtain 13 parts of dark green crystals of a mixture of compounds represented by formula (I-3) (hereinafter, for convenience, this mixture of compounds is referred to as compound (I-3)). The mixture of compounds represented by formula (I-3) was a mixture of three types of compounds containing, as the substituent R in formula (I-3), a chlorine atom and a 4-tert-butylphenoxy group in ratios of 3/5, 2/6, and 1/7, respectively.
窒素雰囲気下、化合物(I-1)10部、4-tert-ブチルフェノール(東京化成工業(株)製)12部、炭酸カリウム(関東化学(株)製)12部、及びN-メチル-2-ピロリジノン(関東化学(株)製)323部を混合し、120℃で6時間撹拌した。反応終了後、反応液を室温(18~24℃)まで冷却し、濃塩酸(富士フイルム和光純薬(株)製)198部及び水992部を加えた。析出した固体を、イオン交換水200部で2回、続いてメタノール200部で2回洗浄し、デカンテーションした。粗成生物をシリカゲルカラムクロマトグラフィー(溶媒:クロロホルム)によって精製し、式(I-3)で表される化合物の混合物の暗緑色結晶を13部得た(以下、便宜上、この化合物の混合物を化合物(I-3)という)。式(I-3)で表される化合物の混合物は、式(I-3)中の置換基Rとして、塩素原子と4-tert-ブチルフェノキシ基とを、3/5、2/6、及び1/7の比でそれぞれ含む3種類の化合物の混合物であった。 Synthesis Example 11: Synthesis of Example Compound (I-3)
Under a nitrogen atmosphere, 10 parts of compound (I-1), 12 parts of 4-tert-butylphenol (manufactured by Tokyo Chemical Industry Co., Ltd.), 12 parts of potassium carbonate (manufactured by Kanto Chemical Co., Ltd.), and 323 parts of N-methyl-2-pyrrolidinone (manufactured by Kanto Chemical Co., Ltd.) were mixed and stirred at 120 ° C. for 6 hours. After the reaction was completed, the reaction solution was cooled to room temperature (18 to 24 ° C.), and 198 parts of concentrated hydrochloric acid (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) and 992 parts of water were added. The precipitated solid was washed twice with 200 parts of ion-exchanged water, followed by washing twice with 200 parts of methanol, and decantation was performed. The crude product was purified by silica gel column chromatography (solvent: chloroform) to obtain 13 parts of dark green crystals of a mixture of compounds represented by formula (I-3) (hereinafter, for convenience, this mixture of compounds is referred to as compound (I-3)). The mixture of compounds represented by formula (I-3) was a mixture of three types of compounds containing, as the substituent R in formula (I-3), a chlorine atom and a 4-tert-butylphenoxy group in ratios of 3/5, 2/6, and 1/7, respectively.
化合物(I-3)の同定:
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 1934、2048、2162
Exact Mass: 1933、2047、2161
(吸収スペクトル)10ppmクロロホルム溶液極大吸収波長(λmax):891nm Identification of compound (I-3):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 1934, 2048, 2162
Exact Mass: 1933, 2047, 2161
(Absorption spectrum) 10 ppm chloroform solution Maximum absorption wavelength (λ max ): 891 nm
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 1934、2048、2162
Exact Mass: 1933、2047、2161
(吸収スペクトル)10ppmクロロホルム溶液極大吸収波長(λmax):891nm Identification of compound (I-3):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 1934, 2048, 2162
Exact Mass: 1933, 2047, 2161
(Absorption spectrum) 10 ppm chloroform solution Maximum absorption wavelength (λ max ): 891 nm
<合成例12:化合物(I-F)の合成>
2-エチルヘキシルアミン5.0部を2,6-ジイソプロピルアニリン(東京化成工業(株)製)5.2部に変えた以外は、合成例2の化合物(I-B)の合成と同様にして、化合物(I-F)の赤色結晶を13部得た。 Synthesis Example 12: Synthesis of compound (IF)
Thirteen parts of red crystals of compound (IF) were obtained in the same manner as in the synthesis of compound (IB) in Synthesis Example 2, except that 5.0 parts of 2-ethylhexylamine was changed to 5.2 parts of 2,6-diisopropylaniline (manufactured by Tokyo Chemical Industry Co., Ltd.).
2-エチルヘキシルアミン5.0部を2,6-ジイソプロピルアニリン(東京化成工業(株)製)5.2部に変えた以外は、合成例2の化合物(I-B)の合成と同様にして、化合物(I-F)の赤色結晶を13部得た。 Synthesis Example 12: Synthesis of compound (IF)
Thirteen parts of red crystals of compound (IF) were obtained in the same manner as in the synthesis of compound (IB) in Synthesis Example 2, except that 5.0 parts of 2-ethylhexylamine was changed to 5.2 parts of 2,6-diisopropylaniline (manufactured by Tokyo Chemical Industry Co., Ltd.).
化合物(I-F)の同定:
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 514
Exact Mass:513 Identification of compound (I-F):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 514
Exact Mass: 513
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 514
Exact Mass:513 Identification of compound (I-F):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 514
Exact Mass: 513
<合成例13:化合物(I-G)の合成>
化合物(I-B)を化合物(I-F)に変えた以外は、合成例3の化合物(I-C)の合成と同様にして、化合物(I-G)の赤色結晶を11部得た。 <Synthesis Example 13: Synthesis of compound (IG)>
Eleven parts of red crystals of compound (IG) were obtained in the same manner as in the synthesis of compound (IC) in Synthesis Example 3, except that compound (IB) was changed to compound (IF).
化合物(I-B)を化合物(I-F)に変えた以外は、合成例3の化合物(I-C)の合成と同様にして、化合物(I-G)の赤色結晶を11部得た。 <Synthesis Example 13: Synthesis of compound (IG)>
Eleven parts of red crystals of compound (IG) were obtained in the same manner as in the synthesis of compound (IC) in Synthesis Example 3, except that compound (IB) was changed to compound (IF).
化合物(I-G)の同定:
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 482
Exact Mass:481 Identification of compound (IG):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 482
Exact Mass: 481
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 482
Exact Mass:481 Identification of compound (IG):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 482
Exact Mass: 481
<合成例14:化合物(I-H)の合成>
窒素雰囲気下、化合物(I-G)10部、臭素(富士フイルム和光純薬(株)製)183部、及びクロロホルム(ナカライテスク(株)製)1860部を混合し、65℃で6時間撹拌した。反応終了後、反応液を室温(18~24℃)まで冷却し、水1667部、水酸化カリウム(関東化学(株)製)、及び亜硫酸ナトリウム8.3部(関東化学(株)製)を加え、分液操作を行った。得られた有機層を無水硫酸ナトリウム(関東化学(株)製)で脱水し、硫酸ナトリウムを濾過後、溶媒を留去した。粗生成物をシリカゲルカラムクロマトグラフィー(溶媒:クロロホルム)によって精製し、化合物(I-H)の赤色結晶を12部得た。 <Synthesis Example 14: Synthesis of compound (I-H)>
Under a nitrogen atmosphere, 10 parts of compound (IG), 183 parts of bromine (manufactured by FUJIFILM Wako Pure Chemical Industries, Ltd.), and 1860 parts of chloroform (manufactured by Nacalai Tesque, Inc.) were mixed and stirred at 65°C for 6 hours. After the reaction was completed, the reaction solution was cooled to room temperature (18 to 24°C), and 1667 parts of water, potassium hydroxide (manufactured by Kanto Chemical Co., Ltd.), and 8.3 parts of sodium sulfite (manufactured by Kanto Chemical Co., Ltd.) were added, and a separation operation was performed. The obtained organic layer was dehydrated with anhydrous sodium sulfate (manufactured by Kanto Chemical Co., Ltd.), and the sodium sulfate was filtered, and the solvent was distilled off. The crude product was purified by silica gel column chromatography (solvent: chloroform) to obtain 12 parts of red crystals of compound (I-H).
窒素雰囲気下、化合物(I-G)10部、臭素(富士フイルム和光純薬(株)製)183部、及びクロロホルム(ナカライテスク(株)製)1860部を混合し、65℃で6時間撹拌した。反応終了後、反応液を室温(18~24℃)まで冷却し、水1667部、水酸化カリウム(関東化学(株)製)、及び亜硫酸ナトリウム8.3部(関東化学(株)製)を加え、分液操作を行った。得られた有機層を無水硫酸ナトリウム(関東化学(株)製)で脱水し、硫酸ナトリウムを濾過後、溶媒を留去した。粗生成物をシリカゲルカラムクロマトグラフィー(溶媒:クロロホルム)によって精製し、化合物(I-H)の赤色結晶を12部得た。 <Synthesis Example 14: Synthesis of compound (I-H)>
Under a nitrogen atmosphere, 10 parts of compound (IG), 183 parts of bromine (manufactured by FUJIFILM Wako Pure Chemical Industries, Ltd.), and 1860 parts of chloroform (manufactured by Nacalai Tesque, Inc.) were mixed and stirred at 65°C for 6 hours. After the reaction was completed, the reaction solution was cooled to room temperature (18 to 24°C), and 1667 parts of water, potassium hydroxide (manufactured by Kanto Chemical Co., Ltd.), and 8.3 parts of sodium sulfite (manufactured by Kanto Chemical Co., Ltd.) were added, and a separation operation was performed. The obtained organic layer was dehydrated with anhydrous sodium sulfate (manufactured by Kanto Chemical Co., Ltd.), and the sodium sulfate was filtered, and the solvent was distilled off. The crude product was purified by silica gel column chromatography (solvent: chloroform) to obtain 12 parts of red crystals of compound (I-H).
化合物(I-H)の同定:
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 716
Exact Mass:715 Identification of compound (I-H):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 716
Exact Mass: 715
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 716
Exact Mass:715 Identification of compound (I-H):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 716
Exact Mass: 715
<合成例15:化合物(I-J)の合成>
化合物(I-D)を化合物(I-H)に変え、4-プロポキシフェノール4.0部を4-tert-ブチルフェノール(東京化成工業(株)製)4.2部に変えた以外は、合成例5の化合物(I-x-1)の合成と同様にして、化合物(I-J)の赤色結晶を7.5部得た。 Synthesis Example 15: Synthesis of compound (I-J)
7.5 parts of red crystals of compound (I-J) were obtained in the same manner as in the synthesis of compound (I-x-1) in Synthesis example 5, except that compound (ID) was changed to compound (I-H) and 4.0 parts of 4-propoxyphenol was changed to 4.2 parts of 4-tert-butylphenol (manufactured by Tokyo Chemical Industry Co., Ltd.).
化合物(I-D)を化合物(I-H)に変え、4-プロポキシフェノール4.0部を4-tert-ブチルフェノール(東京化成工業(株)製)4.2部に変えた以外は、合成例5の化合物(I-x-1)の合成と同様にして、化合物(I-J)の赤色結晶を7.5部得た。 Synthesis Example 15: Synthesis of compound (I-J)
7.5 parts of red crystals of compound (I-J) were obtained in the same manner as in the synthesis of compound (I-x-1) in Synthesis example 5, except that compound (ID) was changed to compound (I-H) and 4.0 parts of 4-propoxyphenol was changed to 4.2 parts of 4-tert-butylphenol (manufactured by Tokyo Chemical Industry Co., Ltd.).
化合物(I-J)の同定:
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 856
Exact Mass:855 Identification of Compound (I-J):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 856
Exact Mass: 855
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 856
Exact Mass:855 Identification of Compound (I-J):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 856
Exact Mass: 855
<合成例16:化合物(I-K)の合成>
化合物(I-x-1)52部を化合物(I-J)45部に代えた以外は、合成例7の化合物(I-2)の合成と同様にして、化合物(I-K)の赤色結晶を38部得た。 <Synthesis Example 16: Synthesis of compound (I-K)>
38 parts of red crystals of compound (IK) were obtained in the same manner as in the synthesis of compound (I-2) in Synthesis Example 7, except that 52 parts of compound (I-x-1) was changed to 45 parts of compound (I-J).
化合物(I-x-1)52部を化合物(I-J)45部に代えた以外は、合成例7の化合物(I-2)の合成と同様にして、化合物(I-K)の赤色結晶を38部得た。 <Synthesis Example 16: Synthesis of compound (I-K)>
38 parts of red crystals of compound (IK) were obtained in the same manner as in the synthesis of compound (I-2) in Synthesis Example 7, except that 52 parts of compound (I-x-1) was changed to 45 parts of compound (I-J).
化合物(I-K)の同定:
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 1680
Exact Mass:1679
(吸収スペクトル)10ppmクロロホルム溶液極大吸収波長(λmax):873nm Identification of compound (I-K):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 1680
Exact Mass: 1679
(Absorption spectrum) 10 ppm chloroform solution Maximum absorption wavelength (λ max ): 873 nm
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 1680
Exact Mass:1679
(吸収スペクトル)10ppmクロロホルム溶液極大吸収波長(λmax):873nm Identification of compound (I-K):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 1680
Exact Mass: 1679
(Absorption spectrum) 10 ppm chloroform solution Maximum absorption wavelength (λ max ): 873 nm
<合成例17:実施例化合物(I-4)の合成>
窒素雰囲気下、化合物(I-K)10部、無水塩化鉄(III)(富士フイルム和光純薬(株)製)6.5部、ニトロメタン(東京化成工業(株)製)57部、及びクロロホルム(ナカライテスク(株)製)465部を混合し、20~25℃で24時間撹拌した。反応終了後、溶媒を留去し、水300部で洗浄を行った。炭酸カリウム(関東化学(株)製)17部及びエタノールアミン(東京化成工業(株)製)357部を加え、130℃で16時間撹拌した。反応終了後、反応液を室温(18~24℃)まで冷却し、水7500部加えた。析出した固体を濾過し、イオン交換水30部で2回洗浄した。粗生成物を、シリカゲルカラムクロマトグラフィー(溶剤:クロロホルム)によって精製し、化合物(I-4)の暗緑色固体を4.8部得た。 Synthesis Example 17: Synthesis of Example Compound (I-4)
Under a nitrogen atmosphere, 10 parts of compound (I-K), 6.5 parts of anhydrous iron(III) chloride (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.), 57 parts of nitromethane (manufactured by Tokyo Chemical Industry Co., Ltd.), and 465 parts of chloroform (manufactured by Nacalai Tesque, Inc.) were mixed and stirred at 20 to 25 ° C. for 24 hours. After the reaction was completed, the solvent was distilled off and the mixture was washed with 300 parts of water. 17 parts of potassium carbonate (manufactured by Kanto Chemical Co., Ltd.) and 357 parts of ethanolamine (manufactured by Tokyo Chemical Industry Co., Ltd.) were added and stirred at 130 ° C. for 16 hours. After the reaction was completed, the reaction solution was cooled to room temperature (18 to 24 ° C.), and 7,500 parts of water were added. The precipitated solid was filtered and washed twice with 30 parts of ion-exchanged water. The crude product was purified by silica gel column chromatography (solvent: chloroform) to obtain 4.8 parts of a dark green solid of compound (I-4).
窒素雰囲気下、化合物(I-K)10部、無水塩化鉄(III)(富士フイルム和光純薬(株)製)6.5部、ニトロメタン(東京化成工業(株)製)57部、及びクロロホルム(ナカライテスク(株)製)465部を混合し、20~25℃で24時間撹拌した。反応終了後、溶媒を留去し、水300部で洗浄を行った。炭酸カリウム(関東化学(株)製)17部及びエタノールアミン(東京化成工業(株)製)357部を加え、130℃で16時間撹拌した。反応終了後、反応液を室温(18~24℃)まで冷却し、水7500部加えた。析出した固体を濾過し、イオン交換水30部で2回洗浄した。粗生成物を、シリカゲルカラムクロマトグラフィー(溶剤:クロロホルム)によって精製し、化合物(I-4)の暗緑色固体を4.8部得た。 Synthesis Example 17: Synthesis of Example Compound (I-4)
Under a nitrogen atmosphere, 10 parts of compound (I-K), 6.5 parts of anhydrous iron(III) chloride (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.), 57 parts of nitromethane (manufactured by Tokyo Chemical Industry Co., Ltd.), and 465 parts of chloroform (manufactured by Nacalai Tesque, Inc.) were mixed and stirred at 20 to 25 ° C. for 24 hours. After the reaction was completed, the solvent was distilled off and the mixture was washed with 300 parts of water. 17 parts of potassium carbonate (manufactured by Kanto Chemical Co., Ltd.) and 357 parts of ethanolamine (manufactured by Tokyo Chemical Industry Co., Ltd.) were added and stirred at 130 ° C. for 16 hours. After the reaction was completed, the reaction solution was cooled to room temperature (18 to 24 ° C.), and 7,500 parts of water were added. The precipitated solid was filtered and washed twice with 30 parts of ion-exchanged water. The crude product was purified by silica gel column chromatography (solvent: chloroform) to obtain 4.8 parts of a dark green solid of compound (I-4).
化合物(I-4)の同定:
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 1676
Exact Mass:1675
(吸収スペクトル)10ppmクロロホルム溶液極大吸収波長(λmax):877nm Identification of compound (I-4):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 1676
Exact Mass: 1675
(Absorption spectrum) 10 ppm chloroform solution Maximum absorption wavelength (λ max ): 877 nm
(質量分析)イオン化モード=ESI+:m/z=[M+H]+ 1676
Exact Mass:1675
(吸収スペクトル)10ppmクロロホルム溶液極大吸収波長(λmax):877nm Identification of compound (I-4):
(Mass spectrometry) Ionization mode = ESI+: m/z = [M+H] + 1676
Exact Mass: 1675
(Absorption spectrum) 10 ppm chloroform solution Maximum absorption wavelength (λ max ): 877 nm
<合成例18:樹脂(B-1)の合成>
還流冷却器、滴下ロート及び撹拌機を備えたフラスコ内に窒素を適量流して窒素雰囲気に置換し、プロピレングリコールモノメチルエーテルアセテート340部を入れて、撹拌しながら80℃まで加熱した。次いで、アクリル酸57部と、3,4-エポキシトリシクロ[5.2.1.02,6]デカン-8-イルアクリレート及び3,4-エポキシトリシクロ[5.2.1.02,6]デカン-9-イルアクリレートの混合物(含有比はモル比で1:1)54部と、ベンジルメタクリレート239部と、プロピレングリコールモノメチルエーテルアセテート73部との混合溶液を5時間かけて滴下した。一方、重合開始剤2,2-アゾビス(2,4-ジメチルバレロニトリル)40部をプロピレングリコールモノメチルエーテルアセテート197部に溶解した溶液を6時間かけて滴下した。開始剤溶液の滴下終了後、反応液を80℃で3時間保持した後、室温まで冷却して、固形分37.0%の共重合体(樹脂(B-1))溶液を得た。B型粘度計(23℃)で測定した共重体溶液の粘度は127mPa・sであった。共重合体の重量平均分子量Mwは9.4×103であり、分散度は1.89であり、固形分換算の酸価は114mg-KOH/gであった。樹脂B-1は、以下の構造単位を有する。 Synthesis Example 18: Synthesis of Resin (B-1)
A suitable amount of nitrogen was flowed into a flask equipped with a reflux condenser, a dropping funnel and a stirrer to replace the atmosphere with nitrogen, 340 parts of propylene glycol monomethyl ether acetate was added, and the mixture was heated to 80°C while stirring. Next, a mixed solution of 57 parts of acrylic acid, 54 parts of a mixture of 3,4-epoxytricyclo[5.2.1.0 2,6 ]decan-8-yl acrylate and 3,4-epoxytricyclo[5.2.1.0 2,6 ]decan-9-yl acrylate (content ratio is 1:1 in molar ratio), 239 parts of benzyl methacrylate, and 73 parts of propylene glycol monomethyl ether acetate was added dropwise over 5 hours. Meanwhile, a solution of 40 parts ofpolymerization initiator 2,2-azobis(2,4-dimethylvaleronitrile) dissolved in 197 parts of propylene glycol monomethyl ether acetate was added dropwise over 6 hours. After the dropwise addition of the initiator solution was completed, the reaction solution was kept at 80°C for 3 hours and then cooled to room temperature to obtain a copolymer (resin (B-1)) solution with a solid content of 37.0%. The viscosity of the copolymer solution measured with a Brookfield viscometer (23°C) was 127 mPa·s. The weight average molecular weight Mw of the copolymer was 9.4×10 3 , the dispersity was 1.89, and the acid value calculated as solid content was 114 mg-KOH/g. Resin B-1 has the following structural units.
還流冷却器、滴下ロート及び撹拌機を備えたフラスコ内に窒素を適量流して窒素雰囲気に置換し、プロピレングリコールモノメチルエーテルアセテート340部を入れて、撹拌しながら80℃まで加熱した。次いで、アクリル酸57部と、3,4-エポキシトリシクロ[5.2.1.02,6]デカン-8-イルアクリレート及び3,4-エポキシトリシクロ[5.2.1.02,6]デカン-9-イルアクリレートの混合物(含有比はモル比で1:1)54部と、ベンジルメタクリレート239部と、プロピレングリコールモノメチルエーテルアセテート73部との混合溶液を5時間かけて滴下した。一方、重合開始剤2,2-アゾビス(2,4-ジメチルバレロニトリル)40部をプロピレングリコールモノメチルエーテルアセテート197部に溶解した溶液を6時間かけて滴下した。開始剤溶液の滴下終了後、反応液を80℃で3時間保持した後、室温まで冷却して、固形分37.0%の共重合体(樹脂(B-1))溶液を得た。B型粘度計(23℃)で測定した共重体溶液の粘度は127mPa・sであった。共重合体の重量平均分子量Mwは9.4×103であり、分散度は1.89であり、固形分換算の酸価は114mg-KOH/gであった。樹脂B-1は、以下の構造単位を有する。 Synthesis Example 18: Synthesis of Resin (B-1)
A suitable amount of nitrogen was flowed into a flask equipped with a reflux condenser, a dropping funnel and a stirrer to replace the atmosphere with nitrogen, 340 parts of propylene glycol monomethyl ether acetate was added, and the mixture was heated to 80°C while stirring. Next, a mixed solution of 57 parts of acrylic acid, 54 parts of a mixture of 3,4-epoxytricyclo[5.2.1.0 2,6 ]decan-8-yl acrylate and 3,4-epoxytricyclo[5.2.1.0 2,6 ]decan-9-yl acrylate (content ratio is 1:1 in molar ratio), 239 parts of benzyl methacrylate, and 73 parts of propylene glycol monomethyl ether acetate was added dropwise over 5 hours. Meanwhile, a solution of 40 parts of
<実施例1>
(1)組成物1の調製
化合物(I-1)30部、分散剤(プロピレングリコールモノメチルエーテルアセテート60%溶液、BYKLPN-6919、BYK社製)24部(固形分換算)、樹脂(B-1)24部(固形分換算)、プロピレングリコールモノメチルエーテルアセテート522部、及び0.2mmのジルコニアビーズ900部を混合し、ペイントコンディショナー(LAU社製)を使用して、得られた混合物を1時間振盪した。その後、ジルコニアビーズをろ過により除去して組成物1を得た。 Example 1
(1) Preparation of Composition 1 30 parts of compound (I-1), 24 parts (solid content equivalent) of a dispersant (propylene glycol monomethyl ether acetate 60% solution, BYKLPN-6919, manufactured by BYK Corporation), 24 parts (solid content equivalent) of resin (B-1), 522 parts of propylene glycol monomethyl ether acetate, and 900 parts of 0.2 mm zirconia beads were mixed, and the resulting mixture was shaken for 1 hour using a paint conditioner (manufactured by LAU Corporation). Thereafter, the zirconia beads were removed by filtration to obtain composition 1.
(1)組成物1の調製
化合物(I-1)30部、分散剤(プロピレングリコールモノメチルエーテルアセテート60%溶液、BYKLPN-6919、BYK社製)24部(固形分換算)、樹脂(B-1)24部(固形分換算)、プロピレングリコールモノメチルエーテルアセテート522部、及び0.2mmのジルコニアビーズ900部を混合し、ペイントコンディショナー(LAU社製)を使用して、得られた混合物を1時間振盪した。その後、ジルコニアビーズをろ過により除去して組成物1を得た。 Example 1
(1) Preparation of Composition 1 30 parts of compound (I-1), 24 parts (solid content equivalent) of a dispersant (propylene glycol monomethyl ether acetate 60% solution, BYKLPN-6919, manufactured by BYK Corporation), 24 parts (solid content equivalent) of resin (B-1), 522 parts of propylene glycol monomethyl ether acetate, and 900 parts of 0.2 mm zirconia beads were mixed, and the resulting mixture was shaken for 1 hour using a paint conditioner (manufactured by LAU Corporation). Thereafter, the zirconia beads were removed by filtration to obtain composition 1.
(2)組成物1の紫外可視近赤外吸収分光測定
組成物1における化合物(I-1)の含有量が10ppmになるように、組成物1をプロピレングリコールモノメチルエーテルアセテートで希釈し、波長300~1400nmの範囲で吸光度を測定した(データサンプリング間隔1nm)。極大吸収波長λmaxは、830nmであった。波長780nmにおける吸光度Abs(780)とλmaxにおける吸光度Abs(λmax)との比Abs(780)/Abs(λmax)は、1.0と算出された。また、波長900~1400nmの範囲における最大吸光度Abs(900-1400)とAbs(λmax)との比Abs(900-1400)/Abs(λmax)は、0.11と算出された。 (2) UV-Vis-Near-Infrared Absorption Spectroscopy of Composition 1 Composition 1 was diluted with propylene glycol monomethyl ether acetate so that the content of compound (I-1) in composition 1 was 10 ppm, and the absorbance was measured in the wavelength range of 300 to 1400 nm (data sampling interval 1 nm). The maximum absorption wavelength λ max was 830 nm. The ratio Abs(780)/Abs(λ max ) of the absorbance Abs(780) at a wavelength of 780 nm to the absorbance Abs(λ max ) at λ max was calculated to be 1.0. In addition, the ratio Abs(900-1400)/Abs(λ max ) of the maximum absorbance Abs(900-1400) at a wavelength range of 900 to 1400 nm to Abs(λ max ) was calculated to be 0.11.
組成物1における化合物(I-1)の含有量が10ppmになるように、組成物1をプロピレングリコールモノメチルエーテルアセテートで希釈し、波長300~1400nmの範囲で吸光度を測定した(データサンプリング間隔1nm)。極大吸収波長λmaxは、830nmであった。波長780nmにおける吸光度Abs(780)とλmaxにおける吸光度Abs(λmax)との比Abs(780)/Abs(λmax)は、1.0と算出された。また、波長900~1400nmの範囲における最大吸光度Abs(900-1400)とAbs(λmax)との比Abs(900-1400)/Abs(λmax)は、0.11と算出された。 (2) UV-Vis-Near-Infrared Absorption Spectroscopy of Composition 1 Composition 1 was diluted with propylene glycol monomethyl ether acetate so that the content of compound (I-1) in composition 1 was 10 ppm, and the absorbance was measured in the wavelength range of 300 to 1400 nm (data sampling interval 1 nm). The maximum absorption wavelength λ max was 830 nm. The ratio Abs(780)/Abs(λ max ) of the absorbance Abs(780) at a wavelength of 780 nm to the absorbance Abs(λ max ) at λ max was calculated to be 1.0. In addition, the ratio Abs(900-1400)/Abs(λ max ) of the maximum absorbance Abs(900-1400) at a wavelength range of 900 to 1400 nm to Abs(λ max ) was calculated to be 0.11.
(3)組成物1の粘度の評価
組成物1をB型粘度計(23℃)で測定し、粘度を5段階で評価した。評価基準は以下のとおりである。
1:0以上8未満mPa・s
2:8以上20未満mPa・s
3:20以上1,000未満mPa・s
4:1,000以上10,000未満mPa・s
5:10,000以上mPas
粘度が高いことは、組成物に含まれる近赤外吸収色素の分散液の安定性が低くいことによる、色素同士の凝集に起因するものと考えられる。近赤外吸収色素の分散液の粘度が低いと、分散液の安定性が高く、光学フィルタの作製過程での取り扱いが容易になるため好ましい。 (3) Evaluation of Viscosity of Composition 1 The viscosity of Composition 1 was measured using a Brookfield viscometer (23° C.) and evaluated on a 5-point scale. The evaluation criteria were as follows:
1: 0 or more and less than 8 mPa·s
2: 8 or more and less than 20 mPa·s
3: 20 or more and less than 1,000 mPa·s
4: 1,000 or more but less than 10,000 mPa·s
5: 10,000 or more mPas
The high viscosity is considered to be due to aggregation of the pigments caused by the low stability of the dispersion of the near-infrared absorbing pigment contained in the composition. If the viscosity of the dispersion of the near-infrared absorbing pigment is low, the stability of the dispersion is high, and it is preferable that the dispersion is easy to handle during the production process of the optical filter.
組成物1をB型粘度計(23℃)で測定し、粘度を5段階で評価した。評価基準は以下のとおりである。
1:0以上8未満mPa・s
2:8以上20未満mPa・s
3:20以上1,000未満mPa・s
4:1,000以上10,000未満mPa・s
5:10,000以上mPas
粘度が高いことは、組成物に含まれる近赤外吸収色素の分散液の安定性が低くいことによる、色素同士の凝集に起因するものと考えられる。近赤外吸収色素の分散液の粘度が低いと、分散液の安定性が高く、光学フィルタの作製過程での取り扱いが容易になるため好ましい。 (3) Evaluation of Viscosity of Composition 1 The viscosity of Composition 1 was measured using a Brookfield viscometer (23° C.) and evaluated on a 5-point scale. The evaluation criteria were as follows:
1: 0 or more and less than 8 mPa·s
2: 8 or more and less than 20 mPa·s
3: 20 or more and less than 1,000 mPa·s
4: 1,000 or more but less than 10,000 mPa·s
5: 10,000 or more mPas
The high viscosity is considered to be due to aggregation of the pigments caused by the low stability of the dispersion of the near-infrared absorbing pigment contained in the composition. If the viscosity of the dispersion of the near-infrared absorbing pigment is low, the stability of the dispersion is high, and it is preferable that the dispersion is easy to handle during the production process of the optical filter.
(4)硬化性組成物1の調製
以下の成分を混合することにより、硬化性組成物1を得た。
・組成物1:720部
・樹脂(B):樹脂(B-1)73部(固形換算)
・重合性化合物(C):ジペンタエリスリトールポリアクリレート(商品名A-9550、新中村化学工業(株)製)68部
・重合開始剤(D):N-アセチルオキシ-1-(4-フェニルスルファニルフェニル)-3-シクロヘキシルプロパン-1-オン-2-イミン(商品名TR-PBG327、常州強力電子新材料社製)5.1部
・溶剤(E):プロピレングリコールモノメチルエーテルアセテート1134部
・レベリング剤(F):ポリエーテル変性シリコーンオイル(商品名DOWSIL SH8400、デュポン・東レ・スペシャルティ・マテリアル(株)製)1.4部 (4) Preparation of Curable Composition 1 Curable composition 1 was obtained by mixing the following components.
Composition 1: 720 parts Resin (B): Resin (B-1) 73 parts (solid equivalent)
Polymerizable compound (C): Dipentaerythritol polyacrylate (trade name A-9550, manufactured by Shin-Nakamura Chemical Co., Ltd.) 68 parts Polymerization initiator (D): N-acetyloxy-1-(4-phenylsulfanylphenyl)-3-cyclohexylpropan-1-one-2-imine (trade name TR-PBG327, manufactured by Changzhou Strong Electronic New Materials Co., Ltd.) 5.1 parts Solvent (E): Propylene glycol monomethyl ether acetate 1134 parts Leveling agent (F): Polyether modified silicone oil (trade name DOWSIL SH8400, manufactured by DuPont Toray Specialty Materials Co., Ltd.) 1.4 parts
以下の成分を混合することにより、硬化性組成物1を得た。
・組成物1:720部
・樹脂(B):樹脂(B-1)73部(固形換算)
・重合性化合物(C):ジペンタエリスリトールポリアクリレート(商品名A-9550、新中村化学工業(株)製)68部
・重合開始剤(D):N-アセチルオキシ-1-(4-フェニルスルファニルフェニル)-3-シクロヘキシルプロパン-1-オン-2-イミン(商品名TR-PBG327、常州強力電子新材料社製)5.1部
・溶剤(E):プロピレングリコールモノメチルエーテルアセテート1134部
・レベリング剤(F):ポリエーテル変性シリコーンオイル(商品名DOWSIL SH8400、デュポン・東レ・スペシャルティ・マテリアル(株)製)1.4部 (4) Preparation of Curable Composition 1 Curable composition 1 was obtained by mixing the following components.
Composition 1: 720 parts Resin (B): Resin (B-1) 73 parts (solid equivalent)
Polymerizable compound (C): Dipentaerythritol polyacrylate (trade name A-9550, manufactured by Shin-Nakamura Chemical Co., Ltd.) 68 parts Polymerization initiator (D): N-acetyloxy-1-(4-phenylsulfanylphenyl)-3-cyclohexylpropan-1-one-2-imine (trade name TR-PBG327, manufactured by Changzhou Strong Electronic New Materials Co., Ltd.) 5.1 parts Solvent (E): Propylene glycol monomethyl ether acetate 1134 parts Leveling agent (F): Polyether modified silicone oil (trade name DOWSIL SH8400, manufactured by DuPont Toray Specialty Materials Co., Ltd.) 1.4 parts
(5)光学フィルタ1の作製及び凝集物の確認
硬化性組成物1を、5cm角のガラス基板(イーグル2000、コーニング社製)上にスピンコート法で塗布した後、100℃で3分間プリベークした。放冷後、露光機(TME-150RSK、トプコン(株)製)を用いて、大気雰囲気下、1000mJ/cm2の露光量(365nm基準)で、得られた塗膜に光照射を行った。その後、オーブン中、220℃で5分間ポストベークを行い、光学フィルタ1を得た。得られた光学フィルタ1上の凝集物の有無を目視で確認した。 (5) Preparation of Optical Filter 1 and Confirmation of Aggregates The curable composition 1 was applied to a 5 cm square glass substrate (Eagle 2000, Corning Incorporated) by spin coating, and then prebaked at 100°C for 3 minutes. After cooling, the obtained coating film was irradiated with light at an exposure dose of 1000 mJ/ cm2 (based on 365 nm) in an air atmosphere using an exposure machine (TME-150RSK, Topcon Corporation). Thereafter, post-baking was performed in an oven at 220°C for 5 minutes to obtain an optical filter 1. The presence or absence of aggregates on the obtained optical filter 1 was visually confirmed.
硬化性組成物1を、5cm角のガラス基板(イーグル2000、コーニング社製)上にスピンコート法で塗布した後、100℃で3分間プリベークした。放冷後、露光機(TME-150RSK、トプコン(株)製)を用いて、大気雰囲気下、1000mJ/cm2の露光量(365nm基準)で、得られた塗膜に光照射を行った。その後、オーブン中、220℃で5分間ポストベークを行い、光学フィルタ1を得た。得られた光学フィルタ1上の凝集物の有無を目視で確認した。 (5) Preparation of Optical Filter 1 and Confirmation of Aggregates The curable composition 1 was applied to a 5 cm square glass substrate (Eagle 2000, Corning Incorporated) by spin coating, and then prebaked at 100°C for 3 minutes. After cooling, the obtained coating film was irradiated with light at an exposure dose of 1000 mJ/ cm2 (based on 365 nm) in an air atmosphere using an exposure machine (TME-150RSK, Topcon Corporation). Thereafter, post-baking was performed in an oven at 220°C for 5 minutes to obtain an optical filter 1. The presence or absence of aggregates on the obtained optical filter 1 was visually confirmed.
(6)光学フィルタ1の耐光性試験
光学フィルタ1上に380nm以下の光をカットする紫外線カットフィルタ(COLORED OPTICAL GLASS L38、ホヤ社製、)を配置し、耐光性試験機(SUNTEST CPS+、(株)東洋精機製作所製)にてキセノンランプ光を48時間照射した。照射前後の光学フィルタ1の極大吸収波長における吸光度を測定し、下式で示される吸光度維持率を算出した。吸光度維持率が高いほど、光学フィルタの耐光性が良好であるといえる。
吸光度維持率(%)=(照射後の光学フィルタの極大吸収波長における吸光度)/(照射前の光学フィルタの極大吸収波長における吸光度)×100 (6) Lightfastness Test of Optical Filter 1 An ultraviolet cut filter (COLORED OPTICAL GLASS L38, manufactured by Hoya Co., Ltd.) that cuts light of 380 nm or less was placed on the optical filter 1, and xenon lamp light was irradiated for 48 hours using a lightfastness tester (SUNTEST CPS+, manufactured by Toyo Seiki Seisakusho Co., Ltd.). The absorbance at the maximum absorption wavelength of the optical filter 1 before and after irradiation was measured, and the absorbance maintenance rate shown in the following formula was calculated. It can be said that the higher the absorbance maintenance rate, the better the lightfastness of the optical filter.
Absorbance maintenance rate (%)=(absorbance at the maximum absorption wavelength of the optical filter after irradiation)/(absorbance at the maximum absorption wavelength of the optical filter before irradiation)×100
光学フィルタ1上に380nm以下の光をカットする紫外線カットフィルタ(COLORED OPTICAL GLASS L38、ホヤ社製、)を配置し、耐光性試験機(SUNTEST CPS+、(株)東洋精機製作所製)にてキセノンランプ光を48時間照射した。照射前後の光学フィルタ1の極大吸収波長における吸光度を測定し、下式で示される吸光度維持率を算出した。吸光度維持率が高いほど、光学フィルタの耐光性が良好であるといえる。
吸光度維持率(%)=(照射後の光学フィルタの極大吸収波長における吸光度)/(照射前の光学フィルタの極大吸収波長における吸光度)×100 (6) Lightfastness Test of Optical Filter 1 An ultraviolet cut filter (COLORED OPTICAL GLASS L38, manufactured by Hoya Co., Ltd.) that cuts light of 380 nm or less was placed on the optical filter 1, and xenon lamp light was irradiated for 48 hours using a lightfastness tester (SUNTEST CPS+, manufactured by Toyo Seiki Seisakusho Co., Ltd.). The absorbance at the maximum absorption wavelength of the optical filter 1 before and after irradiation was measured, and the absorbance maintenance rate shown in the following formula was calculated. It can be said that the higher the absorbance maintenance rate, the better the lightfastness of the optical filter.
Absorbance maintenance rate (%)=(absorbance at the maximum absorption wavelength of the optical filter after irradiation)/(absorbance at the maximum absorption wavelength of the optical filter before irradiation)×100
<比較例1>
化合物(I-1)に代えて、下式で表される同量のルモゲン(登録商標)F Orange240(東京化成工業(株)製)を用いたこと以外は、実施例1の組成物1、硬化性組成物1、及び光学フィルタ1の作製とそれぞれ同様にして、比較組成物1、比較硬化性組成物1、及び比較光学フィルタ1を作製した。実施例1と同様にして、比較組成物1及び比較光学フィルタ1について各種評価(粘度、凝集物の有無、及び耐光性試験)を行った。 <Comparative Example 1>
Comparative composition 1, comparative curable composition 1, and comparative optical filter 1 were prepared in the same manner as composition 1, curable composition 1, and optical filter 1 in Example 1, respectively, except that the compound (I-1) was replaced with the same amount of Lumogen (registered trademark) F Orange 240 (manufactured by Tokyo Chemical Industry Co., Ltd.) represented by the following formula. Comparative composition 1 and comparative optical filter 1 were subjected to various evaluations (viscosity, presence or absence of aggregates, and light resistance test) in the same manner as in Example 1.
化合物(I-1)に代えて、下式で表される同量のルモゲン(登録商標)F Orange240(東京化成工業(株)製)を用いたこと以外は、実施例1の組成物1、硬化性組成物1、及び光学フィルタ1の作製とそれぞれ同様にして、比較組成物1、比較硬化性組成物1、及び比較光学フィルタ1を作製した。実施例1と同様にして、比較組成物1及び比較光学フィルタ1について各種評価(粘度、凝集物の有無、及び耐光性試験)を行った。 <Comparative Example 1>
Comparative composition 1, comparative curable composition 1, and comparative optical filter 1 were prepared in the same manner as composition 1, curable composition 1, and optical filter 1 in Example 1, respectively, except that the compound (I-1) was replaced with the same amount of Lumogen (registered trademark) F Orange 240 (manufactured by Tokyo Chemical Industry Co., Ltd.) represented by the following formula. Comparative composition 1 and comparative optical filter 1 were subjected to various evaluations (viscosity, presence or absence of aggregates, and light resistance test) in the same manner as in Example 1.
実施例1及び比較例1における各種評価(粘度、凝集物の有無、及び耐光性試験)の結果を表1に示す。
The results of various evaluations (viscosity, presence or absence of aggregates, and light resistance test) in Example 1 and Comparative Example 1 are shown in Table 1.
<実施例2~4>
化合物(I-1)に代えて、化合物(I-2)、(I-3)、又は(I-4)を用いること以外は、実施例1の組成物1、硬化性組成物1、及び光学フィルタ1の作製とそれぞれ同様にして、組成物2~4、硬化性組成物2~4、及び光学フィルタ2~4を作製する。実施例1と同様にして、組成物2~4及び光学フィルタ2~4について各種評価(粘度、凝集物の有無、及び耐光性試験)を行う。近赤外吸収色素として化合物(I-2)~(I-4)を含む組成物2~4は粘度が低く、化合物(I-2)~(I-4)をそれぞれ含む硬化性組成物2~4から作製される光学フィルタ2~4は、凝集物がなく、耐光性にも優れる。 <Examples 2 to 4>
Compositions 2 to 4, curable compositions 2 to 4, and optical filters 2 to 4 are prepared in the same manner as the composition 1, curable composition 1, and optical filter 1 of Example 1, respectively, except that compound (I-1) is replaced with compound (I-2), (I-3), or (I-4). Various evaluations (viscosity, presence or absence of aggregates, and light resistance test) are performed on compositions 2 to 4 and optical filters 2 to 4 in the same manner as in Example 1. Compositions 2 to 4 containing compounds (I-2) to (I-4) as near-infrared absorbing dyes have low viscosity, and optical filters 2 to 4 prepared from curable compositions 2 to 4 containing compounds (I-2) to (I-4), respectively, have no aggregates and are excellent in light resistance.
化合物(I-1)に代えて、化合物(I-2)、(I-3)、又は(I-4)を用いること以外は、実施例1の組成物1、硬化性組成物1、及び光学フィルタ1の作製とそれぞれ同様にして、組成物2~4、硬化性組成物2~4、及び光学フィルタ2~4を作製する。実施例1と同様にして、組成物2~4及び光学フィルタ2~4について各種評価(粘度、凝集物の有無、及び耐光性試験)を行う。近赤外吸収色素として化合物(I-2)~(I-4)を含む組成物2~4は粘度が低く、化合物(I-2)~(I-4)をそれぞれ含む硬化性組成物2~4から作製される光学フィルタ2~4は、凝集物がなく、耐光性にも優れる。 <Examples 2 to 4>
2・・・半導体基板、4・・・近赤外線カットフィルタ、6・・・近赤外線透過フィルタ、8・・・カラーフィルタ、10・・・マイクロレンズ、100・・・固体撮像素子。
2: semiconductor substrate, 4: near-infrared cut filter, 6: near-infrared transmission filter, 8: color filter, 10: microlens, 100: solid-state imaging element.
Claims (7)
- 近赤外吸収色素、アルカリ可溶性樹脂、及び溶剤を含有する組成物であって、
前記近赤外吸収色素は式(I)で表される化合物を含む、組成物。
[式(I)中、
R1、R4、R5、及びR8は、それぞれ独立に、炭素数1~20の炭化水素基、ハロゲン原子、又はOR11基を表し、
R2、R3、R6、及びR7は、それぞれ独立に、水素原子、ハロゲン原子、又はOR11基を表し、
R9、R10、及びR11は、それぞれ独立に、炭素数1~20の炭化水素基を表し、
2以上のR11が存在する場合、それらは互いに同一でも異なっていてもよく、
X1~X4は、それぞれ独立に、水素原子は炭素数1~10のアルキル基を表し、
Y1~Y8は、それぞれ独立に、水素原子、炭素数1~5のアルキル基、又はOR12基を表し、
R12は、炭素数1~5のアルキル基を表し、2以上のR12が存在する場合、それらは互いに同一でも異なっていてもよい。] A composition comprising a near-infrared absorbing dye, an alkali-soluble resin, and a solvent,
The composition, wherein the near infrared absorbing dye comprises a compound represented by formula (I):
[In formula (I),
R 1 , R 4 , R 5 , and R 8 each independently represent a hydrocarbon group having 1 to 20 carbon atoms, a halogen atom, or an OR 11 group;
R 2 , R 3 , R 6 and R 7 each independently represent a hydrogen atom, a halogen atom or an OR 11 group;
R 9 , R 10 , and R 11 each independently represent a hydrocarbon group having 1 to 20 carbon atoms;
When two or more R 11 are present, they may be the same or different from each other;
X 1 to X 4 each independently represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms;
Y 1 to Y 8 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an OR 12 group;
R 12 represents an alkyl group having 1 to 5 carbon atoms, and when two or more R 12 are present, they may be the same or different. - 前記式(I)におけるX1~X4及びY1~Y8が水素原子である、請求項1に記載の組成物。 The composition according to claim 1, wherein X 1 to X 4 and Y 1 to Y 8 in formula (I) are hydrogen atoms.
- 重合開始剤及び重合性化合物をさらに含有する、請求項2に記載の組成物。 The composition according to claim 2, further comprising a polymerization initiator and a polymerizable compound.
- 請求項1~3のいずれか一項に記載の組成物より形成される、光学フィルタ。 An optical filter formed from the composition according to any one of claims 1 to 3.
- 請求項4に記載の光学フィルタを含む、固体撮像素子。 A solid-state imaging device including the optical filter according to claim 4.
- 式(Ia)で表される化合物。
[式(Ia)中、
R1a、R4a、R5a、及びR8aは、それぞれ独立に、ハロゲン原子を表し、
R2a、R3a、R6a、及びR7aは、それぞれ独立に、水素原子、ハロゲン原子、又はOR11a基を表し、
R9及びR10は、それぞれ独立に、炭素数1~20の炭化水素基を表し、
R11aは、炭素数1~13の炭化水素基を表し、2以上のR11aが存在する場合、それらは互いに同一でも異なっていてもよく、
X1~X4は、それぞれ独立に、水素原子は炭素数1~10のアルキル基を表し、
Y1~Y8は、それぞれ独立に、水素原子、炭素数1~5のアルキル基、又はOR12基を表し、
R12は、炭素数1~5のアルキル基を表し、2以上のR12が存在する場合、それらは互いに同一でも異なっていてもよい。] A compound represented by formula (Ia).
[In formula (Ia),
R 1a , R 4a , R 5a , and R 8a each independently represent a halogen atom;
R 2a , R 3a , R 6a and R 7a each independently represent a hydrogen atom, a halogen atom or an OR 11a group;
R 9 and R 10 each independently represent a hydrocarbon group having 1 to 20 carbon atoms;
R 11a represents a hydrocarbon group having 1 to 13 carbon atoms, and when two or more R 11a are present, they may be the same or different from each other.
X 1 to X 4 each independently represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms;
Y 1 to Y 8 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an OR 12 group;
R 12 represents an alkyl group having 1 to 5 carbon atoms, and when two or more R 12 are present, they may be the same or different. - 式(I-x1)で表される化合物と、式(I-x2)で表される化合物と、式(I-y1)で表される化合物又は式(I-y2)で表される化合物とを、触媒の存在下で反応させる工程を含む、式(I)で表される化合物の製造方法。
[式(I-x1)及び(I-x2)中、
R1、R4、R5、及びR8は、それぞれ独立に、炭素数1~20の炭化水素基、ハロゲン原子、又はOR11基を表し、
R2、R3、R6、及びR7は、それぞれ独立に、水素原子、ハロゲン原子、又はOR11基を表し、
R9、R10、及びR11は、それぞれ独立に、炭素数1~20の炭化水素基を表し、
2以上のR11が存在する場合、それらは互いに同一でも異なっていてもよく、
X1~X4は、それぞれ独立に、水素原子は炭素数1~10のアルキル基を表し、
Y1、Y4、Y5、及びY8は、それぞれ独立に、水素原子、炭素数1~5のアルキル基、又はOR12基を表し、
R12は、炭素数1~5のアルキル基を表し、2以上のR12が存在する場合、それらは互いに同一でも異なっていてもよく、
Z1~Z4は、それぞれ独立に、臭素原子又はヨウ素原子を表す。]
[式(I-y1)及び(I-y2)中、
Y2、Y3、Y6、及びY7は、それぞれ独立に、水素原子、炭素数1~5のアルキル基、又はOR12基を表し、
A1及びA2は、それぞれ独立に、ヒドロキシ基、炭素数1~20の炭化水素基又はOR13基を表し、
R13は、炭素数1~20の炭化水素を表し、2以上のR13が存在する場合、それらは互いに同一でも異なっていてもよく、
同じホウ素原子に結合するOR13基同士は、互いに結合して環を形成していてもよい。]
[式(I)中、
R1~R10、X1~X4、及びY1~Y8は、前記と同義である。] A method for producing a compound represented by formula (I), comprising a step of reacting a compound represented by formula (I-x1), a compound represented by formula (I-x2), and a compound represented by formula (I-y1) or a compound represented by formula (I-y2) in the presence of a catalyst.
[In formulas (I-x1) and (I-x2),
R 1 , R 4 , R 5 , and R 8 each independently represent a hydrocarbon group having 1 to 20 carbon atoms, a halogen atom, or an OR 11 group;
R 2 , R 3 , R 6 and R 7 each independently represent a hydrogen atom, a halogen atom or an OR 11 group;
R 9 , R 10 , and R 11 each independently represent a hydrocarbon group having 1 to 20 carbon atoms;
When two or more R 11 are present, they may be the same or different from each other;
X 1 to X 4 each independently represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms;
Y 1 , Y 4 , Y 5 , and Y 8 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an OR 12 group;
R 12 represents an alkyl group having 1 to 5 carbon atoms, and when two or more R 12 are present, they may be the same or different from each other.
Z 1 to Z 4 each independently represent a bromine atom or an iodine atom.]
[In formulas (I-y1) and (I-y2),
Y 2 , Y 3 , Y 6 , and Y 7 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an OR 12 group;
A 1 and A 2 each independently represent a hydroxyl group, a hydrocarbon group having 1 to 20 carbon atoms, or an OR 13 group;
R 13 represents a hydrocarbon having 1 to 20 carbon atoms, and when two or more R 13 are present, they may be the same or different from each other;
OR 13 groups bonded to the same boron atom may be bonded to each other to form a ring.
[In formula (I),
R 1 to R 10 , X 1 to X 4 , and Y 1 to Y 8 are as defined above.]
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JP2016505671A (en) * | 2012-12-13 | 2016-02-25 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツングMerck Patent Gesellschaft mit beschraenkter Haftung | Liquid crystal medium |
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