KR20220130037A - Colored resin composition - Google Patents
Colored resin composition Download PDFInfo
- Publication number
- KR20220130037A KR20220130037A KR1020220032071A KR20220032071A KR20220130037A KR 20220130037 A KR20220130037 A KR 20220130037A KR 1020220032071 A KR1020220032071 A KR 1020220032071A KR 20220032071 A KR20220032071 A KR 20220032071A KR 20220130037 A KR20220130037 A KR 20220130037A
- Authority
- KR
- South Korea
- Prior art keywords
- group
- meth
- resin composition
- acrylate
- mass
- Prior art date
Links
- 239000011342 resin composition Substances 0.000 title claims abstract description 65
- 150000001875 compounds Chemical class 0.000 claims abstract description 103
- 239000011347 resin Substances 0.000 claims abstract description 78
- 229920005989 resin Polymers 0.000 claims abstract description 78
- 239000003086 colorant Substances 0.000 claims abstract description 49
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 25
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 11
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 11
- 125000001424 substituent group Chemical group 0.000 claims abstract description 10
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 7
- 125000005843 halogen group Chemical group 0.000 claims abstract description 7
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims abstract description 7
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims abstract description 6
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 4
- 238000000034 method Methods 0.000 claims description 29
- 239000003505 polymerization initiator Substances 0.000 claims description 23
- 229910052757 nitrogen Inorganic materials 0.000 claims description 14
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 12
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 9
- 125000004434 sulfur atom Chemical group 0.000 claims description 9
- 229910052717 sulfur Inorganic materials 0.000 claims description 7
- 125000006615 aromatic heterocyclic group Chemical group 0.000 claims description 3
- -1 (1-ethyl)propyl group Chemical group 0.000 description 163
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 82
- 239000002904 solvent Substances 0.000 description 51
- 239000000178 monomer Substances 0.000 description 33
- KWYUFKZDYYNOTN-UHFFFAOYSA-M potassium hydroxide Inorganic materials [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 32
- 229920001577 copolymer Polymers 0.000 description 24
- 150000002430 hydrocarbons Chemical group 0.000 description 23
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 22
- 239000000049 pigment Substances 0.000 description 21
- 239000000975 dye Substances 0.000 description 20
- 239000000203 mixture Substances 0.000 description 17
- 238000006116 polymerization reaction Methods 0.000 description 16
- 239000000243 solution Substances 0.000 description 16
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 15
- 239000010408 film Substances 0.000 description 15
- 125000000623 heterocyclic group Chemical group 0.000 description 15
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 14
- 239000007787 solid Substances 0.000 description 14
- 239000004094 surface-active agent Substances 0.000 description 13
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 12
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 12
- 238000000576 coating method Methods 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 11
- 239000000758 substrate Substances 0.000 description 11
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 10
- 239000003795 chemical substances by application Substances 0.000 description 10
- 150000004292 cyclic ethers Chemical group 0.000 description 10
- 239000002270 dispersing agent Substances 0.000 description 10
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 10
- 125000000217 alkyl group Chemical group 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 9
- 229920002126 Acrylic acid copolymer Polymers 0.000 description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 8
- 125000002723 alicyclic group Chemical group 0.000 description 8
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 8
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 8
- 239000010949 copper Substances 0.000 description 8
- 230000000977 initiatory effect Effects 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 7
- 229910052802 copper Inorganic materials 0.000 description 7
- 238000003786 synthesis reaction Methods 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical group C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 238000004040 coloring Methods 0.000 description 6
- 230000002349 favourable effect Effects 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 239000002244 precipitate Substances 0.000 description 6
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 6
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 5
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 125000002618 bicyclic heterocycle group Chemical group 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- 229910052731 fluorine Inorganic materials 0.000 description 5
- 229920001296 polysiloxane Polymers 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 229920006395 saturated elastomer Polymers 0.000 description 5
- 125000000169 tricyclic heterocycle group Chemical group 0.000 description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 5
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 4
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 4
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- 239000004793 Polystyrene Substances 0.000 description 4
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 4
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 4
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 4
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 4
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 description 4
- 125000001153 fluoro group Chemical group F* 0.000 description 4
- OTTZHAVKAVGASB-UHFFFAOYSA-N hept-2-ene Chemical compound CCCCC=CC OTTZHAVKAVGASB-UHFFFAOYSA-N 0.000 description 4
- 238000004949 mass spectrometry Methods 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 125000003566 oxetanyl group Chemical group 0.000 description 4
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 229920002223 polystyrene Polymers 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 230000009257 reactivity Effects 0.000 description 4
- IANQTJSKSUMEQM-UHFFFAOYSA-N 1-benzofuran Chemical compound C1=CC=C2OC=CC2=C1 IANQTJSKSUMEQM-UHFFFAOYSA-N 0.000 description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 3
- ONJRTQUWKRDCTA-UHFFFAOYSA-N 2h-thiochromene Chemical compound C1=CC=C2C=CCSC2=C1 ONJRTQUWKRDCTA-UHFFFAOYSA-N 0.000 description 3
- WDQIDQYSOAQPNJ-UHFFFAOYSA-N 3,4-epoxytricyclo[5.2.1.02,6]decyl acrylate Chemical compound C12CC3OC3C2C2(OC(=O)C=C)CC1CC2 WDQIDQYSOAQPNJ-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- GSNUFIFRDBKVIE-UHFFFAOYSA-N DMF Natural products CC1=CC=C(C)O1 GSNUFIFRDBKVIE-UHFFFAOYSA-N 0.000 description 3
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 150000001408 amides Chemical class 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical class C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- UFDHBDMSHIXOKF-UHFFFAOYSA-N cyclohexene-1,2-dicarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- 125000003718 tetrahydrofuranyl group Chemical group 0.000 description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 3
- FTNJQNQLEGKTGD-UHFFFAOYSA-N 1,3-benzodioxole Chemical compound C1=CC=C2OCOC2=C1 FTNJQNQLEGKTGD-UHFFFAOYSA-N 0.000 description 2
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical compound C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 2
- MKRBAPNEJMFMHU-UHFFFAOYSA-N 1-benzylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1CC1=CC=CC=C1 MKRBAPNEJMFMHU-UHFFFAOYSA-N 0.000 description 2
- BQTPKSBXMONSJI-UHFFFAOYSA-N 1-cyclohexylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1CCCCC1 BQTPKSBXMONSJI-UHFFFAOYSA-N 0.000 description 2
- UAJRSHJHFRVGMG-UHFFFAOYSA-N 1-ethenyl-4-methoxybenzene Chemical compound COC1=CC=C(C=C)C=C1 UAJRSHJHFRVGMG-UHFFFAOYSA-N 0.000 description 2
- 125000004066 1-hydroxyethyl group Chemical group [H]OC([H])([*])C([H])([H])[H] 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 2
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 2
- BAXOFTOLAUCFNW-UHFFFAOYSA-N 1H-indazole Chemical compound C1=CC=C2C=NNC2=C1 BAXOFTOLAUCFNW-UHFFFAOYSA-N 0.000 description 2
- SDJHPPZKZZWAKF-UHFFFAOYSA-N 2,3-dimethylbuta-1,3-diene Chemical compound CC(=C)C(C)=C SDJHPPZKZZWAKF-UHFFFAOYSA-N 0.000 description 2
- PAPNRQCYSFBWDI-UHFFFAOYSA-N 2,5-Dimethyl-1H-pyrrole Chemical compound CC1=CC=C(C)N1 PAPNRQCYSFBWDI-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- WYGWHHGCAGTUCH-UHFFFAOYSA-N 2-[(2-cyano-4-methylpentan-2-yl)diazenyl]-2,4-dimethylpentanenitrile Chemical compound CC(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)C WYGWHHGCAGTUCH-UHFFFAOYSA-N 0.000 description 2
- PTJWCLYPVFJWMP-UHFFFAOYSA-N 2-[[3-hydroxy-2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)COCC(CO)(CO)CO PTJWCLYPVFJWMP-UHFFFAOYSA-N 0.000 description 2
- QMDFJHAAWUGVKQ-UHFFFAOYSA-N 2h-thiopyran Chemical compound C1SC=CC=C1 QMDFJHAAWUGVKQ-UHFFFAOYSA-N 0.000 description 2
- QENGPZGAWFQWCZ-UHFFFAOYSA-N 3-Methylthiophene Chemical compound CC=1C=CSC=1 QENGPZGAWFQWCZ-UHFFFAOYSA-N 0.000 description 2
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 2
- HCFAJYNVAYBARA-UHFFFAOYSA-N 4-heptanone Chemical compound CCCC(=O)CCC HCFAJYNVAYBARA-UHFFFAOYSA-N 0.000 description 2
- XKVUYEYANWFIJX-UHFFFAOYSA-N 5-methyl-1h-pyrazole Chemical compound CC1=CC=NN1 XKVUYEYANWFIJX-UHFFFAOYSA-N 0.000 description 2
- OZJPLYNZGCXSJM-UHFFFAOYSA-N 5-valerolactone Chemical compound O=C1CCCCO1 OZJPLYNZGCXSJM-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- KDCGOANMDULRCW-UHFFFAOYSA-N 7H-purine Chemical compound N1=CNC2=NC=NC2=C1 KDCGOANMDULRCW-UHFFFAOYSA-N 0.000 description 2
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 2
- KYNSBQPICQTCGU-UHFFFAOYSA-N Benzopyrane Chemical compound C1=CC=C2C=CCOC2=C1 KYNSBQPICQTCGU-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- FFOPEPMHKILNIT-UHFFFAOYSA-N Isopropyl butyrate Chemical compound CCCC(=O)OC(C)C FFOPEPMHKILNIT-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- UQFQONCQIQEYPJ-UHFFFAOYSA-N N-methylpyrazole Chemical compound CN1C=CC=N1 UQFQONCQIQEYPJ-UHFFFAOYSA-N 0.000 description 2
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 2
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
- MKOCCXFKHVQLPW-UHFFFAOYSA-N [[1-oxo-1-(4-phenylsulfanylphenyl)butan-2-ylidene]amino] benzoate Chemical compound C=1C=C(SC=2C=CC=CC=2)C=CC=1C(=O)C(CC)=NOC(=O)C1=CC=CC=C1 MKOCCXFKHVQLPW-UHFFFAOYSA-N 0.000 description 2
- LOCXTTRLSIDGPS-UHFFFAOYSA-N [[1-oxo-1-(4-phenylsulfanylphenyl)octan-2-ylidene]amino] benzoate Chemical compound C=1C=C(SC=2C=CC=CC=2)C=CC=1C(=O)C(CCCCCC)=NOC(=O)C1=CC=CC=C1 LOCXTTRLSIDGPS-UHFFFAOYSA-N 0.000 description 2
- OFUWNULILNEATR-UHFFFAOYSA-N [[3-cyclopentyl-1-oxo-1-(4-phenylsulfanylphenyl)propan-2-ylidene]amino] benzoate Chemical compound O=C(ON=C(CC1CCCC1)C(=O)C1=CC=C(SC2=CC=CC=C2)C=C1)C1=CC=CC=C1 OFUWNULILNEATR-UHFFFAOYSA-N 0.000 description 2
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 238000000889 atomisation Methods 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- VYHBFRJRBHMIQZ-UHFFFAOYSA-N bis[4-(diethylamino)phenyl]methanone Chemical compound C1=CC(N(CC)CC)=CC=C1C(=O)C1=CC=C(N(CC)CC)C=C1 VYHBFRJRBHMIQZ-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 239000007809 chemical reaction catalyst Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N coumarin Chemical compound C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 description 2
- HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- TXCDCPKCNAJMEE-UHFFFAOYSA-N dibenzofuran Chemical compound C1=CC=C2C3=CC=CC=C3OC2=C1 TXCDCPKCNAJMEE-UHFFFAOYSA-N 0.000 description 2
- IYYZUPMFVPLQIF-UHFFFAOYSA-N dibenzothiophene Chemical compound C1=CC=C2C3=CC=CC=C3SC2=C1 IYYZUPMFVPLQIF-UHFFFAOYSA-N 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 229940116333 ethyl lactate Drugs 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical group FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 2
- 239000001530 fumaric acid Substances 0.000 description 2
- GAEKPEKOJKCEMS-UHFFFAOYSA-N gamma-valerolactone Chemical compound CC1CCC(=O)O1 GAEKPEKOJKCEMS-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 2
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 2
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- HNEGQIOMVPPMNR-NSCUHMNNSA-N mesaconic acid Chemical compound OC(=O)C(/C)=C/C(O)=O HNEGQIOMVPPMNR-NSCUHMNNSA-N 0.000 description 2
- ALHUXMDEZNLFTA-UHFFFAOYSA-N methyl-quinoxaline Natural products C1=CC=CC2=NC(C)=CN=C21 ALHUXMDEZNLFTA-UHFFFAOYSA-N 0.000 description 2
- HNEGQIOMVPPMNR-UHFFFAOYSA-N methylfumaric acid Natural products OC(=O)C(C)=CC(O)=O HNEGQIOMVPPMNR-UHFFFAOYSA-N 0.000 description 2
- 125000002950 monocyclic group Chemical group 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 125000000466 oxiranyl group Chemical group 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- LCPDWSOZIOUXRV-UHFFFAOYSA-N phenoxyacetic acid Chemical compound OC(=O)COC1=CC=CC=C1 LCPDWSOZIOUXRV-UHFFFAOYSA-N 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- LYKMMUBOEFYJQG-UHFFFAOYSA-N piperoxan Chemical compound C1OC2=CC=CC=C2OC1CN1CCCCC1 LYKMMUBOEFYJQG-UHFFFAOYSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 238000001226 reprecipitation Methods 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L sodium carbonate Substances [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 229930192474 thiophene Natural products 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- HHQAGBQXOWLTLL-UHFFFAOYSA-N (2-hydroxy-3-phenoxypropyl) prop-2-enoate Chemical compound C=CC(=O)OCC(O)COC1=CC=CC=C1 HHQAGBQXOWLTLL-UHFFFAOYSA-N 0.000 description 1
- RYNQKSJRFHJZTK-UHFFFAOYSA-N (3-methoxy-3-methylbutyl) acetate Chemical compound COC(C)(C)CCOC(C)=O RYNQKSJRFHJZTK-UHFFFAOYSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 1
- WNHHRXSVKWWRJY-UHFFFAOYSA-N (5-methyl-5-bicyclo[2.2.1]hept-2-enyl)methanol Chemical compound C1C2C(C)(CO)CC1C=C2 WNHHRXSVKWWRJY-UHFFFAOYSA-N 0.000 description 1
- LBUJPTNKIBCYBY-UHFFFAOYSA-N 1,2,3,4-tetrahydroquinoline Chemical compound C1=CC=C2CCCNC2=C1 LBUJPTNKIBCYBY-UHFFFAOYSA-N 0.000 description 1
- KMOUUZVZFBCRAM-UHFFFAOYSA-N 1,2,3,6-tetrahydrophthalic anhydride Chemical compound C1C=CCC2C(=O)OC(=O)C21 KMOUUZVZFBCRAM-UHFFFAOYSA-N 0.000 description 1
- KTZQTRPPVKQPFO-UHFFFAOYSA-N 1,2-benzoxazole Chemical compound C1=CC=C2C=NOC2=C1 KTZQTRPPVKQPFO-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- JIHQDMXYYFUGFV-UHFFFAOYSA-N 1,3,5-triazine Chemical compound C1=NC=NC=N1 JIHQDMXYYFUGFV-UHFFFAOYSA-N 0.000 description 1
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- VNQXSTWCDUXYEZ-UHFFFAOYSA-N 1,7,7-trimethylbicyclo[2.2.1]heptane-2,3-dione Chemical compound C1CC2(C)C(=O)C(=O)C1C2(C)C VNQXSTWCDUXYEZ-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- FLBAYUMRQUHISI-UHFFFAOYSA-N 1,8-naphthyridine Chemical compound N1=CC=CC2=CC=CN=C21 FLBAYUMRQUHISI-UHFFFAOYSA-N 0.000 description 1
- LAVARTIQQDZFNT-UHFFFAOYSA-N 1-(1-methoxypropan-2-yloxy)propan-2-yl acetate Chemical compound COCC(C)OCC(C)OC(C)=O LAVARTIQQDZFNT-UHFFFAOYSA-N 0.000 description 1
- OXHNLMTVIGZXSG-UHFFFAOYSA-N 1-Methylpyrrole Chemical compound CN1C=CC=C1 OXHNLMTVIGZXSG-UHFFFAOYSA-N 0.000 description 1
- BOGFHOWTVGAYFK-UHFFFAOYSA-N 1-[2-(2-propoxyethoxy)ethoxy]propane Chemical compound CCCOCCOCCOCCC BOGFHOWTVGAYFK-UHFFFAOYSA-N 0.000 description 1
- NCFIKBMPEOEIED-UHFFFAOYSA-N 1-acridin-9-ylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=C(C=CC=C2)C2=NC2=CC=CC=C12 NCFIKBMPEOEIED-UHFFFAOYSA-N 0.000 description 1
- HNAGHMKIPMKKBB-UHFFFAOYSA-N 1-benzylpyrrolidine-3-carboxamide Chemical compound C1C(C(=O)N)CCN1CC1=CC=CC=C1 HNAGHMKIPMKKBB-UHFFFAOYSA-N 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- NVZWEEGUWXZOKI-UHFFFAOYSA-N 1-ethenyl-2-methylbenzene Chemical compound CC1=CC=CC=C1C=C NVZWEEGUWXZOKI-UHFFFAOYSA-N 0.000 description 1
- JZHGRUMIRATHIU-UHFFFAOYSA-N 1-ethenyl-3-methylbenzene Chemical compound CC1=CC=CC(C=C)=C1 JZHGRUMIRATHIU-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- CNJRPYFBORAQAU-UHFFFAOYSA-N 1-ethoxy-2-(2-methoxyethoxy)ethane Chemical compound CCOCCOCCOC CNJRPYFBORAQAU-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- 125000006432 1-methyl cyclopropyl group Chemical group [H]C([H])([H])C1(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 description 1
- 125000005978 1-naphthyloxy group Chemical group 0.000 description 1
- 125000006017 1-propenyl group Chemical group 0.000 description 1
- HFZLSTDPRQSZCQ-UHFFFAOYSA-N 1-pyrrolidin-3-ylpyrrolidine Chemical compound C1CCCN1C1CNCC1 HFZLSTDPRQSZCQ-UHFFFAOYSA-N 0.000 description 1
- VYMSWGOFSKMMCE-UHFFFAOYSA-N 10-butyl-2-chloroacridin-9-one Chemical compound ClC1=CC=C2N(CCCC)C3=CC=CC=C3C(=O)C2=C1 VYMSWGOFSKMMCE-UHFFFAOYSA-N 0.000 description 1
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 1
- TZMSYXZUNZXBOL-UHFFFAOYSA-N 10H-phenoxazine Chemical compound C1=CC=C2NC3=CC=CC=C3OC2=C1 TZMSYXZUNZXBOL-UHFFFAOYSA-N 0.000 description 1
- QWENRTYMTSOGBR-UHFFFAOYSA-N 1H-1,2,3-Triazole Chemical compound C=1C=NNN=1 QWENRTYMTSOGBR-UHFFFAOYSA-N 0.000 description 1
- OCQIDKDXSRANFH-UHFFFAOYSA-N 2,2-dichloro-2-phenylsulfanylacetic acid Chemical compound ClC(C(=O)O)(SC1=CC=CC=C1)Cl OCQIDKDXSRANFH-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- GFKPPVSGGNHXOL-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylsulfanylacetic acid Chemical compound COC(C(=O)O)(SC1=CC=CC=C1)OC GFKPPVSGGNHXOL-UHFFFAOYSA-N 0.000 description 1
- VBSNQEZPXZKHGV-UHFFFAOYSA-N 2,3-diethoxybicyclo[2.2.1]hept-5-ene Chemical compound C1C2C=CC1C(OCC)C2OCC VBSNQEZPXZKHGV-UHFFFAOYSA-N 0.000 description 1
- VEPOHXYIFQMVHW-XOZOLZJESA-N 2,3-dihydroxybutanedioic acid (2S,3S)-3,4-dimethyl-2-phenylmorpholine Chemical compound OC(C(O)C(O)=O)C(O)=O.C[C@H]1[C@@H](OCCN1C)c1ccccc1 VEPOHXYIFQMVHW-XOZOLZJESA-N 0.000 description 1
- WFDBQLSDFKLLEC-UHFFFAOYSA-N 2,3-dimethoxybicyclo[2.2.1]hept-5-ene Chemical compound C1C2C=CC1C(OC)C2OC WFDBQLSDFKLLEC-UHFFFAOYSA-N 0.000 description 1
- FJSKXQVRKZTKSI-UHFFFAOYSA-N 2,3-dimethylfuran Chemical compound CC=1C=COC=1C FJSKXQVRKZTKSI-UHFFFAOYSA-N 0.000 description 1
- AHDSRXYHVZECER-UHFFFAOYSA-N 2,4,6-tris[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC(CN(C)C)=C(O)C(CN(C)C)=C1 AHDSRXYHVZECER-UHFFFAOYSA-N 0.000 description 1
- UXCIJKOCUAQMKD-UHFFFAOYSA-N 2,4-dichlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC(Cl)=C3SC2=C1 UXCIJKOCUAQMKD-UHFFFAOYSA-N 0.000 description 1
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 1
- QIRUERQWPNHWRC-UHFFFAOYSA-N 2-(1,3-benzodioxol-5-ylmethyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(CC=2C=C3OCOC3=CC=2)=N1 QIRUERQWPNHWRC-UHFFFAOYSA-N 0.000 description 1
- YTZSKPAYFHSKOL-UHFFFAOYSA-N 2-(2,3-dichlorophenyl)-2-[2-(2,3-dichlorophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound ClC1=CC=CC(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=C(Cl)C=CC=2)Cl)=C1Cl YTZSKPAYFHSKOL-UHFFFAOYSA-N 0.000 description 1
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- GBOJZXLCJZDBKO-UHFFFAOYSA-N 2-(2-chlorophenyl)-2-[2-(2-chlorophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound ClC1=CC=CC=C1C1(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)Cl)N=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=N1 GBOJZXLCJZDBKO-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- FVNIIPIYHHEXQA-UHFFFAOYSA-N 2-(4-methoxynaphthalen-1-yl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C12=CC=CC=C2C(OC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 FVNIIPIYHHEXQA-UHFFFAOYSA-N 0.000 description 1
- QRHHZFRCJDAUNA-UHFFFAOYSA-N 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(OC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 QRHHZFRCJDAUNA-UHFFFAOYSA-N 0.000 description 1
- CZYVCAJKUNEWLC-UHFFFAOYSA-N 2-(5-bicyclo[2.2.1]hept-2-enyl)ethanol Chemical compound C1C2C(CCO)CC1C=C2 CZYVCAJKUNEWLC-UHFFFAOYSA-N 0.000 description 1
- PUBNJSZGANKUGX-UHFFFAOYSA-N 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=C(C)C=C1 PUBNJSZGANKUGX-UHFFFAOYSA-N 0.000 description 1
- JJRUAPNVLBABCN-UHFFFAOYSA-N 2-(ethenoxymethyl)oxirane Chemical compound C=COCC1CO1 JJRUAPNVLBABCN-UHFFFAOYSA-N 0.000 description 1
- AAMTXHVZOHPPQR-UHFFFAOYSA-N 2-(hydroxymethyl)prop-2-enoic acid Chemical compound OCC(=C)C(O)=O AAMTXHVZOHPPQR-UHFFFAOYSA-N 0.000 description 1
- SIVZFLKJXSKCGT-UHFFFAOYSA-N 2-(naphthalen-1-ylamino)acetic acid Chemical compound C1=CC=C2C(NCC(=O)O)=CC=CC2=C1 SIVZFLKJXSKCGT-UHFFFAOYSA-N 0.000 description 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 1
- GJKGAPPUXSSCFI-UHFFFAOYSA-N 2-Hydroxy-4'-(2-hydroxyethoxy)-2-methylpropiophenone Chemical compound CC(C)(O)C(=O)C1=CC=C(OCCO)C=C1 GJKGAPPUXSSCFI-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- JFWFAUHHNYTWOO-UHFFFAOYSA-N 2-[(2-ethenylphenyl)methoxymethyl]oxirane Chemical compound C=CC1=CC=CC=C1COCC1OC1 JFWFAUHHNYTWOO-UHFFFAOYSA-N 0.000 description 1
- OCKQMFDZQUFKRD-UHFFFAOYSA-N 2-[(3-ethenylphenyl)methoxymethyl]oxirane Chemical compound C=CC1=CC=CC(COCC2OC2)=C1 OCKQMFDZQUFKRD-UHFFFAOYSA-N 0.000 description 1
- ZADXFVHUPXKZBJ-UHFFFAOYSA-N 2-[(4-ethenylphenyl)methoxymethyl]oxirane Chemical compound C1=CC(C=C)=CC=C1COCC1OC1 ZADXFVHUPXKZBJ-UHFFFAOYSA-N 0.000 description 1
- AJJLBMIIDVIQIA-UHFFFAOYSA-N 2-[1-(2-ethenylphenyl)ethoxymethyl]oxirane Chemical compound C=1C=CC=C(C=C)C=1C(C)OCC1CO1 AJJLBMIIDVIQIA-UHFFFAOYSA-N 0.000 description 1
- ZJRNXDIVAGHETA-UHFFFAOYSA-N 2-[2-(3,4-dimethoxyphenyl)ethenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=C(OC)C(OC)=CC=C1C=CC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 ZJRNXDIVAGHETA-UHFFFAOYSA-N 0.000 description 1
- FRQBLXZRFGNJKN-UHFFFAOYSA-N 2-[2-(3-ethenylphenyl)-1-[2-(3-ethenylphenyl)-1-(oxiran-2-yl)propoxy]propyl]oxirane Chemical compound C=1C=CC(C=C)=CC=1C(C)C(C1OC1)OC(C1OC1)C(C)C1=CC=CC(C=C)=C1 FRQBLXZRFGNJKN-UHFFFAOYSA-N 0.000 description 1
- BXXFCTMAQXSXFO-UHFFFAOYSA-N 2-[2-(4-ethenylphenyl)-1-[2-(4-ethenylphenyl)-1-(oxiran-2-yl)propoxy]propyl]oxirane Chemical compound C=1C=C(C=C)C=CC=1C(C)C(C1OC1)OC(C1OC1)C(C)C1=CC=C(C=C)C=C1 BXXFCTMAQXSXFO-UHFFFAOYSA-N 0.000 description 1
- XOPKKHCDIAYUSK-UHFFFAOYSA-N 2-[2-(5-methylfuran-2-yl)ethenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound O1C(C)=CC=C1C=CC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 XOPKKHCDIAYUSK-UHFFFAOYSA-N 0.000 description 1
- PNDRGJCVJPHPOZ-UHFFFAOYSA-N 2-[2-(furan-2-yl)ethenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C=CC=2OC=CC=2)=N1 PNDRGJCVJPHPOZ-UHFFFAOYSA-N 0.000 description 1
- DJNMUNZDHCXGMC-UHFFFAOYSA-N 2-[3-(2-hydroxyethyl)-2-bicyclo[2.2.1]hept-5-enyl]ethanol Chemical compound C1C2C=CC1C(CCO)C2CCO DJNMUNZDHCXGMC-UHFFFAOYSA-N 0.000 description 1
- BWONDYSHSJIGBM-UHFFFAOYSA-N 2-[[2-ethenyl-3,5-bis(oxiran-2-ylmethoxymethyl)phenyl]methoxymethyl]oxirane Chemical compound C1=C(COCC2OC2)C=C(COCC2OC2)C(C=C)=C1COCC1CO1 BWONDYSHSJIGBM-UHFFFAOYSA-N 0.000 description 1
- DZYCUUFNXNXWBU-UHFFFAOYSA-N 2-[[2-ethenyl-3,6-bis(oxiran-2-ylmethoxymethyl)phenyl]methoxymethyl]oxirane Chemical compound C1=CC(COCC2OC2)=C(COCC2OC2)C(C=C)=C1COCC1CO1 DZYCUUFNXNXWBU-UHFFFAOYSA-N 0.000 description 1
- NAHOABUATCSPEQ-UHFFFAOYSA-N 2-[[2-ethenyl-3-(oxiran-2-ylmethoxymethyl)phenyl]methoxymethyl]oxirane Chemical compound C1=CC=C(COCC2OC2)C(C=C)=C1COCC1CO1 NAHOABUATCSPEQ-UHFFFAOYSA-N 0.000 description 1
- LOXIWIOCGARHCY-UHFFFAOYSA-N 2-[[2-ethenyl-4-(oxiran-2-ylmethoxymethyl)phenyl]methoxymethyl]oxirane Chemical compound C=1C=C(COCC2OC2)C(C=C)=CC=1COCC1CO1 LOXIWIOCGARHCY-UHFFFAOYSA-N 0.000 description 1
- DMAFESHBEJJZMF-UHFFFAOYSA-N 2-[[2-ethenyl-5-(oxiran-2-ylmethoxymethyl)phenyl]methoxymethyl]oxirane Chemical compound C1=C(COCC2OC2)C(C=C)=CC=C1COCC1CO1 DMAFESHBEJJZMF-UHFFFAOYSA-N 0.000 description 1
- RPZQXXDQOBDBGO-UHFFFAOYSA-N 2-[[2-ethenyl-6-(oxiran-2-ylmethoxymethyl)phenyl]methoxymethyl]oxirane Chemical compound C1OC1COCC=1C(C=C)=CC=CC=1COCC1CO1 RPZQXXDQOBDBGO-UHFFFAOYSA-N 0.000 description 1
- JHLMJWVEODHXFB-UHFFFAOYSA-N 2-[[3-ethenyl-2,6-bis(oxiran-2-ylmethoxymethyl)phenyl]methoxymethyl]oxirane Chemical compound C1OC1COCC1=C(COCC2OC2)C(C=C)=CC=C1COCC1CO1 JHLMJWVEODHXFB-UHFFFAOYSA-N 0.000 description 1
- HBJKAXHCQPNZBZ-UHFFFAOYSA-N 2-[[4-ethenyl-2,6-bis(oxiran-2-ylmethoxymethyl)phenyl]methoxymethyl]oxirane Chemical compound C1OC1COCC=1C(COCC2OC2)=CC(C=C)=CC=1COCC1CO1 HBJKAXHCQPNZBZ-UHFFFAOYSA-N 0.000 description 1
- UXGVMFHEKMGWMA-UHFFFAOYSA-N 2-benzofuran Chemical compound C1=CC=CC2=COC=C21 UXGVMFHEKMGWMA-UHFFFAOYSA-N 0.000 description 1
- LVUNJHSREDQSGA-UHFFFAOYSA-N 2-benzyl-n,n-dimethyl-1-(4-morpholin-4-ylphenyl)butan-2-amine Chemical compound C=1C=C(N2CCOCC2)C=CC=1CC(N(C)C)(CC)CC1=CC=CC=C1 LVUNJHSREDQSGA-UHFFFAOYSA-N 0.000 description 1
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- SHWSEVRMRXIDDB-UHFFFAOYSA-N 2-chloro-2-phenylsulfanylacetic acid Chemical compound ClC(C(=O)O)SC1=CC=CC=C1 SHWSEVRMRXIDDB-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- SURWYRGVICLUBJ-UHFFFAOYSA-N 2-ethyl-9,10-dimethoxyanthracene Chemical compound C1=CC=CC2=C(OC)C3=CC(CC)=CC=C3C(OC)=C21 SURWYRGVICLUBJ-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- IJBSPUKPEDBNKQ-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-(4-prop-1-en-2-ylphenyl)propan-1-one Chemical compound CC(=C)C1=CC=C(C(=O)C(C)(C)O)C=C1 IJBSPUKPEDBNKQ-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- BWLBGMIXKSTLSX-UHFFFAOYSA-M 2-hydroxyisobutyrate Chemical compound CC(C)(O)C([O-])=O BWLBGMIXKSTLSX-UHFFFAOYSA-M 0.000 description 1
- MATVXAIQBNEASA-UHFFFAOYSA-N 2-iminooctanal Chemical compound CCCCCCC(=N)C=O MATVXAIQBNEASA-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- ICPWFHKNYYRBSZ-UHFFFAOYSA-M 2-methoxypropanoate Chemical compound COC(C)C([O-])=O ICPWFHKNYYRBSZ-UHFFFAOYSA-M 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- UYGHXQNQIUVOES-UHFFFAOYSA-N 2-methyl-2-phenylsulfanylpropanoic acid Chemical compound OC(=O)C(C)(C)SC1=CC=CC=C1 UYGHXQNQIUVOES-UHFFFAOYSA-N 0.000 description 1
- SOWNNYHYNUIDHV-UHFFFAOYSA-N 2-methyl-3h-1,2-oxazole Chemical compound CN1CC=CO1 SOWNNYHYNUIDHV-UHFFFAOYSA-N 0.000 description 1
- CRWNQZTZTZWPOF-UHFFFAOYSA-N 2-methyl-4-phenylpyridine Chemical compound C1=NC(C)=CC(C=2C=CC=CC=2)=C1 CRWNQZTZTZWPOF-UHFFFAOYSA-N 0.000 description 1
- JSAHYTOSTYPFIJ-UHFFFAOYSA-N 2-methyl-5,6,7,8-tetrahydroquinoxaline Chemical compound C1CCCC2=NC(C)=CN=C21 JSAHYTOSTYPFIJ-UHFFFAOYSA-N 0.000 description 1
- DTFKRVXLBCAIOZ-UHFFFAOYSA-N 2-methylanisole Chemical compound COC1=CC=CC=C1C DTFKRVXLBCAIOZ-UHFFFAOYSA-N 0.000 description 1
- SSVKYZDOIWXDIO-UHFFFAOYSA-N 2-methylbicyclo[2.2.1]hept-5-ene-3-carboxylic acid Chemical compound C1C2C=CC1C(C)C2C(O)=O SSVKYZDOIWXDIO-UHFFFAOYSA-N 0.000 description 1
- 125000001622 2-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C(*)C([H])=C([H])C2=C1[H] 0.000 description 1
- 125000005979 2-naphthyloxy group Chemical group 0.000 description 1
- RZCJYMOBWVJQGV-UHFFFAOYSA-N 2-naphthyloxyacetic acid Chemical compound C1=CC=CC2=CC(OCC(=O)O)=CC=C21 RZCJYMOBWVJQGV-UHFFFAOYSA-N 0.000 description 1
- NMUIIYJWWOPNIP-UHFFFAOYSA-N 2-pentan-3-ylidenebutanedioic acid Chemical compound CCC(CC)=C(C(O)=O)CC(O)=O NMUIIYJWWOPNIP-UHFFFAOYSA-N 0.000 description 1
- 125000006024 2-pentenyl group Chemical group 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- MOTOSAGBNXXRRE-UHFFFAOYSA-N 2-phenylsulfanylacetic acid Chemical compound OC(=O)CSC1=CC=CC=C1 MOTOSAGBNXXRRE-UHFFFAOYSA-N 0.000 description 1
- GTMBPAXUQQLAGD-UHFFFAOYSA-N 2-phenylsulfanylbutanoic acid Chemical compound CCC(C(O)=O)SC1=CC=CC=C1 GTMBPAXUQQLAGD-UHFFFAOYSA-N 0.000 description 1
- SMVCUJHUXYLBIQ-UHFFFAOYSA-N 2-phenylsulfanylpropanoic acid Chemical compound OC(=O)C(C)SC1=CC=CC=C1 SMVCUJHUXYLBIQ-UHFFFAOYSA-N 0.000 description 1
- KTALPKYXQZGAEG-UHFFFAOYSA-N 2-propan-2-ylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC=C3SC2=C1 KTALPKYXQZGAEG-UHFFFAOYSA-N 0.000 description 1
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- MGADZUXDNSDTHW-UHFFFAOYSA-N 2H-pyran Chemical compound C1OC=CC=C1 MGADZUXDNSDTHW-UHFFFAOYSA-N 0.000 description 1
- CMLFRMDBDNHMRA-UHFFFAOYSA-N 2h-1,2-benzoxazine Chemical compound C1=CC=C2C=CNOC2=C1 CMLFRMDBDNHMRA-UHFFFAOYSA-N 0.000 description 1
- SLJFKNONPLNAPF-UHFFFAOYSA-N 3-Vinyl-7-oxabicyclo[4.1.0]heptane Chemical compound C1C(C=C)CCC2OC21 SLJFKNONPLNAPF-UHFFFAOYSA-N 0.000 description 1
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 1
- UJTRCPVECIHPBG-UHFFFAOYSA-N 3-cyclohexylpyrrole-2,5-dione Chemical compound O=C1NC(=O)C(C2CCCCC2)=C1 UJTRCPVECIHPBG-UHFFFAOYSA-N 0.000 description 1
- KBIWOJBFYNSQKW-UHFFFAOYSA-N 3-ethenylphthalic acid Chemical compound OC(=O)C1=CC=CC(C=C)=C1C(O)=O KBIWOJBFYNSQKW-UHFFFAOYSA-N 0.000 description 1
- JSGVZVOGOQILFM-UHFFFAOYSA-N 3-methoxy-1-butanol Chemical compound COC(C)CCO JSGVZVOGOQILFM-UHFFFAOYSA-N 0.000 description 1
- MFKRHJVUCZRDTF-UHFFFAOYSA-N 3-methoxy-3-methylbutan-1-ol Chemical compound COC(C)(C)CCO MFKRHJVUCZRDTF-UHFFFAOYSA-N 0.000 description 1
- QMYGFTJCQFEDST-UHFFFAOYSA-N 3-methoxybutyl acetate Chemical compound COC(C)CCOC(C)=O QMYGFTJCQFEDST-UHFFFAOYSA-N 0.000 description 1
- CUMCMYMKECWGHO-UHFFFAOYSA-N 3-methyl-1,2-oxazole Chemical compound CC=1C=CON=1 CUMCMYMKECWGHO-UHFFFAOYSA-N 0.000 description 1
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- YHFGMFYKZBWPRW-UHFFFAOYSA-N 3-methylpentane-1,1-diol Chemical compound CCC(C)CC(O)O YHFGMFYKZBWPRW-UHFFFAOYSA-N 0.000 description 1
- LDMRLRNXHLPZJN-UHFFFAOYSA-N 3-propoxypropan-1-ol Chemical compound CCCOCCCO LDMRLRNXHLPZJN-UHFFFAOYSA-N 0.000 description 1
- WERQPPCVTFSKSO-UHFFFAOYSA-N 3a,7a-dimethyl-4,5-dihydro-2-benzofuran-1,3-dione Chemical compound C1CC=CC2(C)C(=O)OC(=O)C21C WERQPPCVTFSKSO-UHFFFAOYSA-N 0.000 description 1
- HMMBJOWWRLZEMI-UHFFFAOYSA-N 4,5,6,7-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CCCC2=C1C(=O)OC2=O HMMBJOWWRLZEMI-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- FWTBRYBHCBCJEQ-UHFFFAOYSA-N 4-[(4-phenyldiazenylnaphthalen-1-yl)diazenyl]phenol Chemical compound C1=CC(O)=CC=C1N=NC(C1=CC=CC=C11)=CC=C1N=NC1=CC=CC=C1 FWTBRYBHCBCJEQ-UHFFFAOYSA-N 0.000 description 1
- ABFSTRGQQNSRNH-UHFFFAOYSA-N 4-[(dimethylamino)methyl]benzoic acid Chemical compound CN(C)CC1=CC=C(C(O)=O)C=C1 ABFSTRGQQNSRNH-UHFFFAOYSA-N 0.000 description 1
- BLLOXKZNPPDLGM-UHFFFAOYSA-N 4-[2-[4,6-bis(trichloromethyl)-1,3,5-triazin-2-yl]ethenyl]-n,n-diethyl-3-methylaniline Chemical compound CC1=CC(N(CC)CC)=CC=C1C=CC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 BLLOXKZNPPDLGM-UHFFFAOYSA-N 0.000 description 1
- ACQVEWFMUBXEMR-UHFFFAOYSA-N 4-bromo-2-fluoro-6-nitrophenol Chemical compound OC1=C(F)C=C(Br)C=C1[N+]([O-])=O ACQVEWFMUBXEMR-UHFFFAOYSA-N 0.000 description 1
- DOWVFPAIJRADGF-UHFFFAOYSA-N 4-ethenyl-2-benzofuran-1,3-dione Chemical compound C=CC1=CC=CC2=C1C(=O)OC2=O DOWVFPAIJRADGF-UHFFFAOYSA-N 0.000 description 1
- IRQWEODKXLDORP-UHFFFAOYSA-N 4-ethenylbenzoic acid Chemical compound OC(=O)C1=CC=C(C=C)C=C1 IRQWEODKXLDORP-UHFFFAOYSA-N 0.000 description 1
- ODXNOGQHTZSYFY-UHFFFAOYSA-N 4-ethenylphthalic acid Chemical compound OC(=O)C1=CC=C(C=C)C=C1C(O)=O ODXNOGQHTZSYFY-UHFFFAOYSA-N 0.000 description 1
- 125000004860 4-ethylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])C([H])([H])[H] 0.000 description 1
- VHWFNFITHSPBSR-UHFFFAOYSA-N 4-methyl-1,2-oxazole Chemical compound CC=1C=NOC=1 VHWFNFITHSPBSR-UHFFFAOYSA-N 0.000 description 1
- PUMREIFKTMLCAF-UHFFFAOYSA-N 4-methyl-1,3-oxazole Chemical compound CC1=COC=N1 PUMREIFKTMLCAF-UHFFFAOYSA-N 0.000 description 1
- KTFBBRWUJNKOLY-UHFFFAOYSA-N 4-methyl-2h-chromene Chemical compound C1=CC=C2C(C)=CCOC2=C1 KTFBBRWUJNKOLY-UHFFFAOYSA-N 0.000 description 1
- QYJGMAIQZRWXSD-UHFFFAOYSA-N 4-methylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid Chemical compound C1C2C=CC1(C)C(C(O)=O)C2C(O)=O QYJGMAIQZRWXSD-UHFFFAOYSA-N 0.000 description 1
- LVILGAOSPDLNRM-UHFFFAOYSA-N 4-methylpyrimidine Chemical compound CC1=CC=NC=N1 LVILGAOSPDLNRM-UHFFFAOYSA-N 0.000 description 1
- VDBSRPBXFACZJJ-UHFFFAOYSA-N 4-oxatetracyclo[6.2.1.02,7.03,5]undecan-9-yl prop-2-enoate Chemical compound C12CC3OC3C2C2CC(OC(=O)C=C)C1C2 VDBSRPBXFACZJJ-UHFFFAOYSA-N 0.000 description 1
- IKVYHNPVKUNCJM-UHFFFAOYSA-N 4-propan-2-ylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C(C(C)C)=CC=C2 IKVYHNPVKUNCJM-UHFFFAOYSA-N 0.000 description 1
- NSPMIYGKQJPBQR-UHFFFAOYSA-N 4H-1,2,4-triazole Chemical compound C=1N=CNN=1 NSPMIYGKQJPBQR-UHFFFAOYSA-N 0.000 description 1
- MRUWJENAYHTDQG-UHFFFAOYSA-N 4H-pyran Chemical compound C1C=COC=C1 MRUWJENAYHTDQG-UHFFFAOYSA-N 0.000 description 1
- STBGWNRZMPCVTG-UHFFFAOYSA-N 4h-thiopyran Chemical compound C1C=CSC=C1 STBGWNRZMPCVTG-UHFFFAOYSA-N 0.000 description 1
- LUMNWCHHXDUKFI-UHFFFAOYSA-N 5-bicyclo[2.2.1]hept-2-enylmethanol Chemical compound C1C2C(CO)CC1C=C2 LUMNWCHHXDUKFI-UHFFFAOYSA-N 0.000 description 1
- OHMDZMAJDUVGHO-UHFFFAOYSA-N 5-ethenyl-2-benzofuran-1,3-dione Chemical compound C=CC1=CC=C2C(=O)OC(=O)C2=C1 OHMDZMAJDUVGHO-UHFFFAOYSA-N 0.000 description 1
- LLNJETIYJIMHAV-UHFFFAOYSA-N 5-ethoxybicyclo[2.2.1]hept-2-ene Chemical compound C1C2C(OCC)CC1C=C2 LLNJETIYJIMHAV-UHFFFAOYSA-N 0.000 description 1
- IHEGKRQSANCPRR-UHFFFAOYSA-N 5-ethylbicyclo[2.2.1]hept-2-en-5-ol Chemical compound C1C2C(CC)(O)CC1C=C2 IHEGKRQSANCPRR-UHFFFAOYSA-N 0.000 description 1
- QHJIJNGGGLNBNJ-UHFFFAOYSA-N 5-ethylbicyclo[2.2.1]hept-2-ene Chemical compound C1C2C(CC)CC1C=C2 QHJIJNGGGLNBNJ-UHFFFAOYSA-N 0.000 description 1
- RCDOWRWNYHNLLA-UHFFFAOYSA-N 5-methoxybicyclo[2.2.1]hept-2-ene Chemical compound C1C2C(OC)CC1C=C2 RCDOWRWNYHNLLA-UHFFFAOYSA-N 0.000 description 1
- AGQOIYCTCOEHGR-UHFFFAOYSA-N 5-methyl-1,2-oxazole Chemical compound CC1=CC=NO1 AGQOIYCTCOEHGR-UHFFFAOYSA-N 0.000 description 1
- ZAVRBAGOQPJLCD-UHFFFAOYSA-N 5-methylbicyclo[2.2.1]hept-2-en-5-ol Chemical compound C1C2C(C)(O)CC1C=C2 ZAVRBAGOQPJLCD-UHFFFAOYSA-N 0.000 description 1
- PCBPVYHMZBWMAZ-UHFFFAOYSA-N 5-methylbicyclo[2.2.1]hept-2-ene Chemical compound C1C2C(C)CC1C=C2 PCBPVYHMZBWMAZ-UHFFFAOYSA-N 0.000 description 1
- JIHFJSOMLKXSSQ-UHFFFAOYSA-N 5-methylbicyclo[2.2.1]hept-2-ene-5-carboxylic acid Chemical compound C1C2C(C)(C(O)=O)CC1C=C2 JIHFJSOMLKXSSQ-UHFFFAOYSA-N 0.000 description 1
- XAYDWGMOPRHLEP-UHFFFAOYSA-N 6-ethenyl-7-oxabicyclo[4.1.0]heptane Chemical compound C1CCCC2OC21C=C XAYDWGMOPRHLEP-UHFFFAOYSA-N 0.000 description 1
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
- NYEVBSJUVMRZNE-UHFFFAOYSA-N 9,10-dibutoxy-2-ethylanthracene Chemical compound CCC1=CC=C2C(OCCCC)=C(C=CC=C3)C3=C(OCCCC)C2=C1 NYEVBSJUVMRZNE-UHFFFAOYSA-N 0.000 description 1
- FUWFDADDJOUNDL-UHFFFAOYSA-N 9,10-diethoxy-2-ethylanthracene Chemical compound CCC1=CC=C2C(OCC)=C(C=CC=C3)C3=C(OCC)C2=C1 FUWFDADDJOUNDL-UHFFFAOYSA-N 0.000 description 1
- GJNKQJAJXSUJBO-UHFFFAOYSA-N 9,10-diethoxyanthracene Chemical compound C1=CC=C2C(OCC)=C(C=CC=C3)C3=C(OCC)C2=C1 GJNKQJAJXSUJBO-UHFFFAOYSA-N 0.000 description 1
- JWJMBKSFTTXMLL-UHFFFAOYSA-N 9,10-dimethoxyanthracene Chemical compound C1=CC=C2C(OC)=C(C=CC=C3)C3=C(OC)C2=C1 JWJMBKSFTTXMLL-UHFFFAOYSA-N 0.000 description 1
- YYVYAPXYZVYDHN-UHFFFAOYSA-N 9,10-phenanthroquinone Chemical compound C1=CC=C2C(=O)C(=O)C3=CC=CC=C3C2=C1 YYVYAPXYZVYDHN-UHFFFAOYSA-N 0.000 description 1
- GJCOSYZMQJWQCA-UHFFFAOYSA-N 9H-xanthene Chemical compound C1=CC=C2CC3=CC=CC=C3OC2=C1 GJCOSYZMQJWQCA-UHFFFAOYSA-N 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 101001101476 Bacillus subtilis (strain 168) 50S ribosomal protein L21 Proteins 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- MRABAEUHTLLEML-UHFFFAOYSA-N Butyl lactate Chemical compound CCCCOC(=O)C(C)O MRABAEUHTLLEML-UHFFFAOYSA-N 0.000 description 1
- MQMOUZRCJREBAQ-UHFFFAOYSA-N C(C)C(C(=O)O)(C)SC1=CC=CC=C1 Chemical compound C(C)C(C(=O)O)(C)SC1=CC=CC=C1 MQMOUZRCJREBAQ-UHFFFAOYSA-N 0.000 description 1
- GNKXLESZCDNGCX-UHFFFAOYSA-N COC(C(=O)O)SC1=CC=CC=C1 Chemical compound COC(C(=O)O)SC1=CC=CC=C1 GNKXLESZCDNGCX-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- YYLLIJHXUHJATK-UHFFFAOYSA-N Cyclohexyl acetate Chemical compound CC(=O)OC1CCCCC1 YYLLIJHXUHJATK-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-UHFFFAOYSA-N Di-Et ester-Fumaric acid Natural products CCOC(=O)C=CC(=O)OCC IEPRKVQEAMIZSS-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-WAYWQWQTSA-N Diethyl maleate Chemical compound CCOC(=O)\C=C/C(=O)OCC IEPRKVQEAMIZSS-WAYWQWQTSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- XXRCUYVCPSWGCC-UHFFFAOYSA-N Ethyl pyruvate Chemical compound CCOC(=O)C(C)=O XXRCUYVCPSWGCC-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- QPJVMBTYPHYUOC-UHFFFAOYSA-N Methyl benzoate Natural products COC(=O)C1=CC=CC=C1 QPJVMBTYPHYUOC-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- WRQNANDWMGAFTP-UHFFFAOYSA-N Methylacetoacetic acid Chemical compound COC(=O)CC(C)=O WRQNANDWMGAFTP-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- NPKSPKHJBVJUKB-UHFFFAOYSA-N N-phenylglycine Chemical compound OC(=O)CNC1=CC=CC=C1 NPKSPKHJBVJUKB-UHFFFAOYSA-N 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- SJEYSFABYSGQBG-UHFFFAOYSA-M Patent blue Chemical compound [Na+].C1=CC(N(CC)CC)=CC=C1C(C=1C(=CC(=CC=1)S([O-])(=O)=O)S([O-])(=O)=O)=C1C=CC(=[N+](CC)CC)C=C1 SJEYSFABYSGQBG-UHFFFAOYSA-M 0.000 description 1
- 229910001252 Pd alloy Inorganic materials 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- LCXXNKZQVOXMEH-UHFFFAOYSA-N Tetrahydrofurfuryl methacrylate Chemical compound CC(=C)C(=O)OCC1CCCO1 LCXXNKZQVOXMEH-UHFFFAOYSA-N 0.000 description 1
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- SLINHMUFWFWBMU-UHFFFAOYSA-N Triisopropanolamine Chemical compound CC(O)CN(CC(C)O)CC(C)O SLINHMUFWFWBMU-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- FJBTVNOKENFOFP-UHFFFAOYSA-N [1-[6-[4-[(2,2-dimethyl-1,3-dioxolan-4-yl)methoxy]-2-methylbenzoyl]-9-ethylcarbazol-3-yl]ethylideneamino] acetate Chemical compound C=1C=C2N(CC)C3=CC=C(C(C)=NOC(C)=O)C=C3C2=CC=1C(=O)C(C(=C1)C)=CC=C1OCC1COC(C)(C)O1 FJBTVNOKENFOFP-UHFFFAOYSA-N 0.000 description 1
- SEEVRZDUPHZSOX-UHFFFAOYSA-N [1-[9-ethyl-6-(2-methylbenzoyl)carbazol-3-yl]ethylideneamino] acetate Chemical compound C=1C=C2N(CC)C3=CC=C(C(C)=NOC(C)=O)C=C3C2=CC=1C(=O)C1=CC=CC=C1C SEEVRZDUPHZSOX-UHFFFAOYSA-N 0.000 description 1
- IGHHPVIMEQGKNE-UHFFFAOYSA-N [3-(hydroxymethyl)-2-bicyclo[2.2.1]hept-5-enyl]methanol Chemical compound C1C2C=CC1C(CO)C2CO IGHHPVIMEQGKNE-UHFFFAOYSA-N 0.000 description 1
- DBHQYYNDKZDVTN-UHFFFAOYSA-N [4-(4-methylphenyl)sulfanylphenyl]-phenylmethanone Chemical compound C1=CC(C)=CC=C1SC1=CC=C(C(=O)C=2C=CC=CC=2)C=C1 DBHQYYNDKZDVTN-UHFFFAOYSA-N 0.000 description 1
- ZXXUPZWDQJEEQW-UHFFFAOYSA-N [[3-cyclohexyl-1-oxo-1-(4-phenylsulfanylphenyl)propan-2-ylidene]amino] acetate Chemical compound C(C)(=O)ON=C(C(=O)C1=CC=C(C=C1)SC1=CC=CC=C1)CC1CCCCC1 ZXXUPZWDQJEEQW-UHFFFAOYSA-N 0.000 description 1
- NUSQTXKJPQHCCN-UHFFFAOYSA-N [[3-cyclopentyl-1-[9-ethyl-6-(2-methylbenzoyl)carbazol-3-yl]-1-oxopropan-2-ylidene]amino] benzoate Chemical compound C(C1=CC=CC=C1)(=O)ON=C(C(=O)C=1C=CC=2N(C3=CC=C(C=C3C=2C=1)C(C1=C(C=CC=C1)C)=O)CC)CC1CCCC1 NUSQTXKJPQHCCN-UHFFFAOYSA-N 0.000 description 1
- VTIBEXNGFOHUNW-UHFFFAOYSA-N [[3-cyclopentyl-1-[9-ethyl-6-(2-methylbenzoyl)carbazol-3-yl]propylidene]amino] acetate Chemical compound C(C)(=O)ON=C(CCC1CCCC1)C=1C=CC=2N(C3=CC=C(C=C3C=2C=1)C(C1=C(C=CC=C1)C)=O)CC VTIBEXNGFOHUNW-UHFFFAOYSA-N 0.000 description 1
- DBPBVATYWAEPRC-UHFFFAOYSA-N [[3-cyclopentyl-1-oxo-1-(4-phenylsulfanylphenyl)propan-2-ylidene]amino] acetate Chemical compound CC(=O)ON=C(CC1CCCC1)C(=O)c1ccc(Sc2ccccc2)cc1 DBPBVATYWAEPRC-UHFFFAOYSA-N 0.000 description 1
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 1
- HZSIFDFXFAXICF-UHFFFAOYSA-N acetolactone Chemical compound O=C1CO1 HZSIFDFXFAXICF-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 239000000980 acid dye Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 1
- 125000005074 adamantylmethyl group Chemical group 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- 125000004448 alkyl carbonyl group Chemical group 0.000 description 1
- 125000005332 alkyl sulfoxy group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000001000 anthraquinone dye Substances 0.000 description 1
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 125000001204 arachidyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 125000005018 aryl alkenyl group Chemical group 0.000 description 1
- 125000001691 aryl alkyl amino group Chemical group 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000005015 aryl alkynyl group Chemical group 0.000 description 1
- 125000005129 aryl carbonyl group Chemical group 0.000 description 1
- 125000005161 aryl oxy carbonyl group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000000987 azo dye Substances 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- XSCHRSMBECNVNS-UHFFFAOYSA-N benzopyrazine Natural products N1=CC=NC2=CC=CC=C21 XSCHRSMBECNVNS-UHFFFAOYSA-N 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 125000000440 benzylamino group Chemical group [H]N(*)C([H])([H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- VEZXCJBBBCKRPI-UHFFFAOYSA-N beta-propiolactone Chemical compound O=C1CCO1 VEZXCJBBBCKRPI-UHFFFAOYSA-N 0.000 description 1
- MKOSBHNWXFSHSW-UHFFFAOYSA-N bicyclo[2.2.1]hept-2-en-5-ol Chemical compound C1C2C(O)CC1C=C2 MKOSBHNWXFSHSW-UHFFFAOYSA-N 0.000 description 1
- FYGUSUBEMUKACF-UHFFFAOYSA-N bicyclo[2.2.1]hept-2-ene-5-carboxylic acid Chemical compound C1C2C(C(=O)O)CC1C=C2 FYGUSUBEMUKACF-UHFFFAOYSA-N 0.000 description 1
- NIDNOXCRFUCAKQ-UHFFFAOYSA-N bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid Chemical compound C1C2C=CC1C(C(=O)O)C2C(O)=O NIDNOXCRFUCAKQ-UHFFFAOYSA-N 0.000 description 1
- TZLWRLOYRRZECT-UHFFFAOYSA-N bicyclo[2.2.1]hept-5-ene-2,3-diol Chemical compound C1C2C(O)C(O)C1C=C2 TZLWRLOYRRZECT-UHFFFAOYSA-N 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- WJLVDUQVYDVHDC-UHFFFAOYSA-N bis[4-[ethyl(methyl)amino]phenyl]methanone Chemical compound C1=CC(N(C)CC)=CC=C1C(=O)C1=CC=C(N(C)CC)C=C1 WJLVDUQVYDVHDC-UHFFFAOYSA-N 0.000 description 1
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 1
- 239000001055 blue pigment Substances 0.000 description 1
- 229930006711 bornane-2,3-dione Natural products 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 125000000707 boryl group Chemical group B* 0.000 description 1
- 239000001058 brown pigment Substances 0.000 description 1
- OBNCKNCVKJNDBV-UHFFFAOYSA-N butanoic acid ethyl ester Natural products CCCC(=O)OCC OBNCKNCVKJNDBV-UHFFFAOYSA-N 0.000 description 1
- 239000001191 butyl (2R)-2-hydroxypropanoate Substances 0.000 description 1
- IWPATTDMSUYMJV-UHFFFAOYSA-N butyl 2-methoxyacetate Chemical compound CCCCOC(=O)COC IWPATTDMSUYMJV-UHFFFAOYSA-N 0.000 description 1
- XUPYJHCZDLZNFP-UHFFFAOYSA-N butyl butanoate Chemical group CCCCOC(=O)CCC XUPYJHCZDLZNFP-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- VZWXIQHBIQLMPN-UHFFFAOYSA-N chromane Chemical compound C1=CC=C2CCCOC2=C1 VZWXIQHBIQLMPN-UHFFFAOYSA-N 0.000 description 1
- WCZVZNOTHYJIEI-UHFFFAOYSA-N cinnoline Chemical compound N1=NC=CC2=CC=CC=C21 WCZVZNOTHYJIEI-UHFFFAOYSA-N 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 229940018557 citraconic acid Drugs 0.000 description 1
- 229920006026 co-polymeric resin Polymers 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- 229960000956 coumarin Drugs 0.000 description 1
- 235000001671 coumarin Nutrition 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000000392 cycloalkenyl group Chemical group 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000004850 cyclobutylmethyl group Chemical group C1(CCC1)C* 0.000 description 1
- 125000001162 cycloheptenyl group Chemical group C1(=CCCCCC1)* 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 1
- ILUAAIDVFMVTAU-UHFFFAOYSA-N cyclohex-4-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CC=CCC1C(O)=O ILUAAIDVFMVTAU-UHFFFAOYSA-N 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- KAAQPMPUQHKLLE-UHFFFAOYSA-N cyclohexene-1,4-dicarboxylic acid Chemical compound OC(=O)C1CCC(C(O)=O)=CC1 KAAQPMPUQHKLLE-UHFFFAOYSA-N 0.000 description 1
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 1
- MSPIWBYBMMBCEX-UHFFFAOYSA-N cyclohexyl bicyclo[2.2.1]hept-2-ene-5-carboxylate Chemical compound C1C(C=C2)CC2C1C(=O)OC1CCCCC1 MSPIWBYBMMBCEX-UHFFFAOYSA-N 0.000 description 1
- 125000004210 cyclohexylmethyl group Chemical group [H]C([H])(*)C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000000522 cyclooctenyl group Chemical group C1(=CCCCCCC1)* 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000004851 cyclopentylmethyl group Chemical group C1(CCCC1)C* 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 125000004186 cyclopropylmethyl group Chemical group [H]C([H])(*)C1([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- IEPRKVQEAMIZSS-AATRIKPKSA-N diethyl fumarate Chemical compound CCOC(=O)\C=C\C(=O)OCC IEPRKVQEAMIZSS-AATRIKPKSA-N 0.000 description 1
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000000982 direct dye Substances 0.000 description 1
- KGGOIDKBHYYNIC-UHFFFAOYSA-N ditert-butyl 4-[3,4-bis(tert-butylperoxycarbonyl)benzoyl]benzene-1,2-dicarboperoxoate Chemical compound C1=C(C(=O)OOC(C)(C)C)C(C(=O)OOC(C)(C)C)=CC=C1C(=O)C1=CC=C(C(=O)OOC(C)(C)C)C(C(=O)OOC(C)(C)C)=C1 KGGOIDKBHYYNIC-UHFFFAOYSA-N 0.000 description 1
- FYPWTNDNZOOPAO-UHFFFAOYSA-N ditert-butyl bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylate Chemical compound C1C2C=CC1C(C(=O)OC(C)(C)C)C2C(=O)OC(C)(C)C FYPWTNDNZOOPAO-UHFFFAOYSA-N 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- CKSRFHWWBKRUKA-UHFFFAOYSA-N ethyl 2-ethoxyacetate Chemical compound CCOCC(=O)OCC CKSRFHWWBKRUKA-UHFFFAOYSA-N 0.000 description 1
- JLEKJZUYWFJPMB-UHFFFAOYSA-N ethyl 2-methoxyacetate Chemical compound CCOC(=O)COC JLEKJZUYWFJPMB-UHFFFAOYSA-N 0.000 description 1
- WHRLOJCOIKOQGL-UHFFFAOYSA-N ethyl 2-methoxypropanoate Chemical compound CCOC(=O)C(C)OC WHRLOJCOIKOQGL-UHFFFAOYSA-N 0.000 description 1
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 1
- IJUHLFUALMUWOM-UHFFFAOYSA-N ethyl 3-methoxypropanoate Chemical compound CCOC(=O)CCOC IJUHLFUALMUWOM-UHFFFAOYSA-N 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- 229940117360 ethyl pyruvate Drugs 0.000 description 1
- 125000004705 ethylthio group Chemical group C(C)S* 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000012847 fine chemical Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- RIKMMFOAQPJVMX-UHFFFAOYSA-N fomepizole Chemical compound CC=1C=NNC=1 RIKMMFOAQPJVMX-UHFFFAOYSA-N 0.000 description 1
- 229960004285 fomepizole Drugs 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 239000001046 green dye Substances 0.000 description 1
- 239000001056 green pigment Substances 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- DMEGYFMYUHOHGS-UHFFFAOYSA-N heptamethylene Natural products C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 description 1
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 1
- HOBCFUWDNJPFHB-UHFFFAOYSA-N indolizine Chemical compound C1=CC=CN2C=CC=C21 HOBCFUWDNJPFHB-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- HEBMCVBCEDMUOF-UHFFFAOYSA-N isochromane Chemical compound C1=CC=C2COCCC2=C1 HEBMCVBCEDMUOF-UHFFFAOYSA-N 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 1
- GWVMLCQWXVFZCN-UHFFFAOYSA-N isoindoline Chemical compound C1=CC=C2CNCC2=C1 GWVMLCQWXVFZCN-UHFFFAOYSA-N 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- ZLTPDFXIESTBQG-UHFFFAOYSA-N isothiazole Chemical compound C=1C=NSC=1 ZLTPDFXIESTBQG-UHFFFAOYSA-N 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- CTAPFRYPJLPFDF-UHFFFAOYSA-N isoxazole Chemical compound C=1C=NOC=1 CTAPFRYPJLPFDF-UHFFFAOYSA-N 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- QDLAGTHXVHQKRE-UHFFFAOYSA-N lichenxanthone Natural products COC1=CC(O)=C2C(=O)C3=C(C)C=C(OC)C=C3OC2=C1 QDLAGTHXVHQKRE-UHFFFAOYSA-N 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 238000004811 liquid chromatography Methods 0.000 description 1
- 125000000040 m-tolyl group Chemical group [H]C1=C([H])C(*)=C([H])C(=C1[H])C([H])([H])[H] 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 125000002960 margaryl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- PPFNAOBWGRMDLL-UHFFFAOYSA-N methyl 2-ethoxyacetate Chemical compound CCOCC(=O)OC PPFNAOBWGRMDLL-UHFFFAOYSA-N 0.000 description 1
- YVWPDYFVVMNWDT-UHFFFAOYSA-N methyl 2-ethoxypropanoate Chemical compound CCOC(C)C(=O)OC YVWPDYFVVMNWDT-UHFFFAOYSA-N 0.000 description 1
- HSDFKDZBJMDHFF-UHFFFAOYSA-N methyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OC HSDFKDZBJMDHFF-UHFFFAOYSA-N 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- 229940095102 methyl benzoate Drugs 0.000 description 1
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- YLHXLHGIAMFFBU-UHFFFAOYSA-N methyl phenylglyoxalate Chemical compound COC(=O)C(=O)C1=CC=CC=C1 YLHXLHGIAMFFBU-UHFFFAOYSA-N 0.000 description 1
- 229940017219 methyl propionate Drugs 0.000 description 1
- CWKLZLBVOJRSOM-UHFFFAOYSA-N methyl pyruvate Chemical compound COC(=O)C(C)=O CWKLZLBVOJRSOM-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- 239000000983 mordant dye Substances 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- GYVGXEWAOAAJEU-UHFFFAOYSA-N n,n,4-trimethylaniline Chemical compound CN(C)C1=CC=C(C)C=C1 GYVGXEWAOAAJEU-UHFFFAOYSA-N 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000002560 nitrile group Chemical group 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 239000001005 nitro dye Substances 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 125000001196 nonadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 description 1
- 125000003261 o-tolyl group Chemical group [H]C1=C([H])C(*)=C(C([H])=C1[H])C([H])([H])[H] 0.000 description 1
- 239000001053 orange pigment Substances 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002958 pentadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 239000013500 performance material Substances 0.000 description 1
- 125000005561 phenanthryl group Chemical group 0.000 description 1
- DLRJIFUOBPOJNS-UHFFFAOYSA-N phenetole Chemical compound CCOC1=CC=CC=C1 DLRJIFUOBPOJNS-UHFFFAOYSA-N 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- HPAFOABSQZMTHE-UHFFFAOYSA-N phenyl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)C1=CC=CC=C1 HPAFOABSQZMTHE-UHFFFAOYSA-N 0.000 description 1
- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 1
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- LFSXCDWNBUNEEM-UHFFFAOYSA-N phthalazine Chemical compound C1=NN=CC2=CC=CC=C21 LFSXCDWNBUNEEM-UHFFFAOYSA-N 0.000 description 1
- 239000001007 phthalocyanine dye Substances 0.000 description 1
- CLYVDMAATCIVBF-UHFFFAOYSA-N pigment red 224 Chemical compound C=12C3=CC=C(C(OC4=O)=O)C2=C4C=CC=1C1=CC=C2C(=O)OC(=O)C4=CC=C3C1=C42 CLYVDMAATCIVBF-UHFFFAOYSA-N 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 229960000380 propiolactone Drugs 0.000 description 1
- FKRCODPIKNYEAC-UHFFFAOYSA-N propionic acid ethyl ester Natural products CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- CYIRLFJPTCUCJB-UHFFFAOYSA-N propyl 2-methoxypropanoate Chemical compound CCCOC(=O)C(C)OC CYIRLFJPTCUCJB-UHFFFAOYSA-N 0.000 description 1
- ILPVOWZUBFRIAX-UHFFFAOYSA-N propyl 2-oxopropanoate Chemical compound CCCOC(=O)C(C)=O ILPVOWZUBFRIAX-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- CPNGPNLZQNNVQM-UHFFFAOYSA-N pteridine Chemical compound N1=CN=CC2=NC=CN=C21 CPNGPNLZQNNVQM-UHFFFAOYSA-N 0.000 description 1
- 125000001725 pyrenyl group Chemical group 0.000 description 1
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 150000003230 pyrimidines Chemical class 0.000 description 1
- JWVCLYRUEFBMGU-UHFFFAOYSA-N quinazoline Chemical compound N1=CN=CC2=CC=CC=C21 JWVCLYRUEFBMGU-UHFFFAOYSA-N 0.000 description 1
- 239000001008 quinone-imine dye Substances 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 239000001044 red dye Substances 0.000 description 1
- 239000001054 red pigment Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000000992 solvent dye Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- MUTNCGKQJGXKEM-UHFFFAOYSA-N tamibarotene Chemical compound C=1C=C2C(C)(C)CCC(C)(C)C2=CC=1NC(=O)C1=CC=C(C(O)=O)C=C1 MUTNCGKQJGXKEM-UHFFFAOYSA-N 0.000 description 1
- BZBMBZJUNPMEBD-UHFFFAOYSA-N tert-butyl bicyclo[2.2.1]hept-2-ene-5-carboxylate Chemical compound C1C2C(C(=O)OC(C)(C)C)CC1C=C2 BZBMBZJUNPMEBD-UHFFFAOYSA-N 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- GVIJJXMXTUZIOD-UHFFFAOYSA-N thianthrene Chemical compound C1=CC=C2SC3=CC=CC=C3SC2=C1 GVIJJXMXTUZIOD-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- QERYCTSHXKAMIS-UHFFFAOYSA-N thiophene-2-carboxylic acid Chemical compound OC(=O)C1=CC=CS1 QERYCTSHXKAMIS-UHFFFAOYSA-N 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229940042596 viscoat Drugs 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000001018 xanthene dye Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000001043 yellow dye Substances 0.000 description 1
- 239000001052 yellow pigment Substances 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0041—Optical brightening agents, organic pigments
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3412—Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
- C08K5/3415—Five-membered rings
- C08K5/3417—Five-membered rings condensed with carbocyclic rings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/148—Charge coupled imagers
- H01L27/14862—CID imagers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Nonlinear Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Structural Engineering (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Architecture (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optical Filters (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Materials For Photolithography (AREA)
- Liquid Crystal (AREA)
Abstract
Description
본 발명은 착색 수지 조성물, 컬러 필터, 및 표시 장치에 관한 것이다.The present invention relates to a colored resin composition, a color filter, and a display device.
액정 표시 장치, 일렉트로 루미네선스 표시 장치 및 플라즈마 디스플레이 등의 표시 장치나 CCD나 CMOS 센서 등의 고체 촬상 소자에 사용되는 컬러 필터는, 착색 수지 조성물로부터 제조된다. 당해 컬러 필터 형성을 위한 착색 수지 조성물로서, 여러 가지 착색제가 사용되고 있으며, 예를 들면 착색제로서 탄소 축합환 구조를 갖는 식 (I-2)로 나타내어지는 화합물을 착색 조성물로 사용한 예가 알려져 있다(특허문헌 1).The color filter used for display apparatuses, such as a liquid crystal display device, an electroluminescent display device, and a plasma display, and solid-state imaging elements, such as a CCD and CMOS sensor, is manufactured from a colored resin composition. As a colored resin composition for the said color filter formation, various coloring agents are used, For example, the example using the compound represented by Formula (I-2) which has a carbon condensed ring structure as a coloring agent as a coloring composition is known (patent document). One).
그러나, 상기 화합물을 포함하는 착색 수지 조성물은, 콘트라스트를 충분히 만족할 수 없는 경우가 있었다. 그래서 본 발명은, 콘트라스트가 우수한 컬러 필터를 형성할 수 있는 착색 수지 조성물을 제공하는 것을 목적으로 한다.However, the colored resin composition containing the said compound may not fully be able to satisfy|fill contrast. Then, this invention aims at providing the colored resin composition which can form the color filter excellent in contrast.
본 발명의 요지는 이하와 같다.The gist of the present invention is as follows.
[1] 착색제 및 알칼리 가용성 수지를 함유하고, 상기 착색제가 식 (I)로 나타내어지는 화합물을 포함하는 착색 수지 조성물.[1] A colored resin composition containing a colorant and an alkali-soluble resin, wherein the colorant contains a compound represented by formula (I).
[식 (I) 중,[In formula (I),
R1∼R9는, 서로 독립적으로, 치환기를 갖고 있어도 되는 탄소수 1∼20의 탄화수소기, 수소 원자, 할로겐 원자, 히드록시기, 카르복시기 또는 니트로기를 나타내고, 당해 탄화수소기에 포함되는 메틸렌기는 -O- 또는 -CO-로 치환되어 있어도 된다.R 1 to R 9 each independently represent a hydrocarbon group having 1 to 20 carbon atoms, a hydrogen atom, a halogen atom, a hydroxy group, a carboxy group or a nitro group which may have a substituent, and the methylene group contained in the hydrocarbon group is -O- or - It may be substituted with CO-.
환 Z는 방향족 복소환을 나타낸다.]Ring Z represents an aromatic heterocycle.]
[2] 환 Z가 질소 원자, 산소 원자, 및 유황 원자로 이루어지는 군으로부터 선택되는 1종 이상을 포함하는 방향족 복소환인 [1]에 기재된 착색 수지 조성물.[2] The colored resin composition according to [1], wherein ring Z is an aromatic heterocyclic ring containing at least one selected from the group consisting of a nitrogen atom, an oxygen atom, and a sulfur atom.
[3] 추가로 중합성 화합물 및 중합개시제를 함유하는 [1] 또는 [2]에 기재된 착색 수지 조성물.[3] The colored resin composition according to [1] or [2], further comprising a polymerizable compound and a polymerization initiator.
[4] [1]∼[3] 중 어느 것에 기재된 착색 수지 조성물로부터 형성되는 컬러 필터.[4] A color filter formed from the colored resin composition according to any one of [1] to [3].
[5] [4]에 기재된 컬러 필터를 포함하는 표시 장치.[5] A display device comprising the color filter according to [4].
본 발명에 의하면, 콘트라스트가 우수한 컬러 필터를 제공할 수 있다.ADVANTAGE OF THE INVENTION According to this invention, the color filter excellent in contrast can be provided.
본 발명의 착색 수지 조성물은, 포토레지스트용이어도 되며, 착색제(이하, 착색제 (A)라고 하는 경우가 있음), 알칼리 가용성 수지(이하, 수지 (B)라고 하는 경우가 있음)를 포함한다.The colored resin composition of the present invention may be used for a photoresist, and contains a colorant (hereinafter, sometimes referred to as a coloring agent (A)) and an alkali-soluble resin (hereinafter, may be referred to as a resin (B)).
본 발명의 착색 수지 조성물은, 중합성 화합물(이하, 중합성 화합물 (C)라고 하는 경우가 있음) 및 중합개시제(이하, 중합개시제 (D)라고 하는 경우가 있음)를 포함하고 있어도 된다.The colored resin composition of the present invention may contain a polymerizable compound (hereinafter, may be referred to as a polymerizable compound (C)) and a polymerization initiator (hereinafter may be referred to as a polymerization initiator (D)).
본 발명의 착색 수지 조성물은, 추가로 용제(이하, 용제 (E)라고 하는 경우가 있음)를 포함하고 있어도 된다.The colored resin composition of the present invention may further contain a solvent (hereinafter, sometimes referred to as a solvent (E)).
본 발명의 착색 수지 조성물은, 추가로 중합개시 조제(이하, 중합개시 조제 (D1)이라고 하는 경우가 있음)를 포함하고 있어도 된다.The colored resin composition of the present invention may further contain a polymerization initiation assistant (hereinafter, sometimes referred to as polymerization initiation assistant (D1)).
본 발명의 착색 수지 조성물은, 추가로 레벨링제(이하, 레벨링제 (F)라고 하는 경우가 있음)를 포함하고 있어도 된다.The colored resin composition of this invention may contain the leveling agent (Hereinafter, it may call a leveling agent (F)) further.
또한 본 명세서에 있어서, 각 성분으로서 예시하는 화합물은, 특별히 언급이 없는 한, 단독으로 또는 복수 종을 조합하여 사용할 수 있다.In addition, in this specification, the compound illustrated as each component can be used individually or in combination of multiple types, unless otherwise indicated.
< 착색제 (A) >< Colorant (A) >
착색제 (A)는, 식 (I)로 나타내어지는 화합물(이하, 화합물 (I)이라고도 함)을 포함한다. 화합물 (I)은 1종 또는 2종 이상으로 사용해도 된다.A coloring agent (A) contains the compound (henceforth compound (I)) represented by Formula (I). You may use compound (I) by 1 type or 2 or more types.
<< 화합물 (I) >><< Compound (I) >>
[식 (I) 중,[In formula (I),
R1∼R9는, 서로 독립적으로, 치환기를 갖고 있어도 되는 탄소수 1∼20의 탄화수소기, 수소 원자, 할로겐 원자, 히드록시기, 카르복시기 또는 니트로기를 나타내고, 당해 탄화수소기에 포함되는 메틸렌기는 -O- 또는 -CO-로 치환되어 있어도 된다.R 1 to R 9 each independently represent a hydrocarbon group having 1 to 20 carbon atoms, a hydrogen atom, a halogen atom, a hydroxy group, a carboxy group or a nitro group which may have a substituent, and the methylene group contained in the hydrocarbon group is -O- or - It may be substituted with CO-.
환 Z는 방향족 복소환을 나타낸다.]Ring Z represents an aromatic heterocycle.]
R1∼R9로 나타내어지는 할로겐 원자로서는, 불소 원자, 염소 원자, 브롬 원자 및 요오드 원자 등을 들 수 있다.Examples of the halogen atom represented by R 1 to R 9 include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
R1∼R9로 나타내어지는 탄소수 1∼20의 탄화수소기로서는, 지방족 탄화수소기 및 방향족 탄화수소기를 들 수 있다. 지방족 탄화수소기는, 포화 또는 불포화여도 되고, 쇄상 또는 지환식이어도 된다.Examples of the hydrocarbon group having 1 to 20 carbon atoms represented by R 1 to R 9 include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. The aliphatic hydrocarbon group may be saturated or unsaturated, and may be linear or alicyclic.
R1∼R9로 나타내어지는 포화 또는 불포화 쇄상 탄화수소기로서는, 메틸기, 에틸기, 프로필기, 부틸기, 펜틸기, 헥실기, 헵틸기, 옥틸기, 노닐기, 데실기, 운데실기, 도데실기, 트리데실기, 테트라데실기, 펜타데실기, 헥사데실기, 헵타데실기, 옥타데실기, 노나데실기, 이코실기 등의 직쇄상 알킬기 등; 이소프로필기, (1-에틸)프로필기, 이소부틸기, sec-부틸기, tert-부틸기, (1-에틸)부틸기, (2-에틸)부틸기, (1-프로필)부틸기, 이소펜틸기, 네오펜틸기, tert-펜틸기, (2-메틸)펜틸기, (1-에틸)펜틸기, (3-에틸)펜틸기, (1-프로필)펜틸기, (1-부틸)펜틸기, 이소헥실기, (2-메틸)헥실기, (5-메틸)헥실기, (2-에틸)헥실기, (1-부틸)헥실기, (1-펜틸)헥실기, (2-메틸)헵틸기, (2-에틸)헵틸기, (3-에틸)헵틸기, (1-헥실)헵틸기, (2-메틸)옥틸기, (2-에틸)옥틸기, (1-헵틸)옥틸기, (2-에틸)노닐기, (1-옥틸)노닐기 등의 분지쇄상 알킬기 등; 비닐기, 1-프로페닐기, 2-프로페닐기(알릴기), (1-메틸)에테닐기, 2-부테닐기, 3-부테닐기, 1,3-부타디에닐기, (1-(2-프로페닐))에테닐기, (1,2-디메틸)프로페닐기, 2-펜테닐기 등의 알케닐기; 등을 들 수 있다. 포화 쇄상 탄화수소기의 탄소수는 1∼18이 바람직하고, 보다 바람직하게는 2∼15, 더 바람직하게는 3∼12이다. 또, 불포화 쇄상 탄화수소기의 탄소수는 2∼18이 바람직하고, 보다 바람직하게는 2∼15, 더 바람직하게는 3∼12이다.Examples of the saturated or unsaturated chain hydrocarbon group represented by R 1 to R 9 include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group, a decyl group, an undecyl group, a dodecyl group, linear alkyl groups such as tridecyl group, tetradecyl group, pentadecyl group, hexadecyl group, heptadecyl group, octadecyl group, nonadecyl group and icosyl group; isopropyl group, (1-ethyl)propyl group, isobutyl group, sec-butyl group, tert-butyl group, (1-ethyl)butyl group, (2-ethyl)butyl group, (1-propyl)butyl group, Isopentyl group, neopentyl group, tert-pentyl group, (2-methyl)pentyl group, (1-ethyl)pentyl group, (3-ethyl)pentyl group, (1-propyl)pentyl group, (1-butyl) Pentyl group, isohexyl group, (2-methyl)hexyl group, (5-methyl)hexyl group, (2-ethyl)hexyl group, (1-butyl)hexyl group, (1-pentyl)hexyl group, (2- Methyl) heptyl group, (2-ethyl) heptyl group, (3-ethyl) heptyl group, (1-hexyl) heptyl group, (2-methyl) octyl group, (2-ethyl) octyl group, (1-heptyl) branched alkyl groups such as octyl group, (2-ethyl)nonyl group, and (1-octyl)nonyl group; Vinyl group, 1-propenyl group, 2-propenyl group (allyl group), (1-methyl)ethenyl group, 2-butenyl group, 3-butenyl group, 1,3-butadienyl group, (1-(2-pro alkenyl groups such as phenyl))ethenyl, (1,2-dimethyl)propenyl, and 2-pentenyl; and the like. As for carbon number of a saturated chain hydrocarbon group, 1-18 are preferable, More preferably, it is 2-15, More preferably, it is 3-12. Moreover, as for carbon number of an unsaturated chain hydrocarbon group, 2-18 are preferable, More preferably, it is 2-15, More preferably, it is 3-12.
R1∼R9로 나타내어지는 포화 또는 불포화 지환식 탄화수소기로서는, 시클로프로필기, 시클로부틸기, 시클로펜틸기, 시클로헥실기, 시클로헵틸기, 시클로옥틸기 등의 시클로알킬기; 시클로헥세닐기(예를 들면 시클로헥사-2-엔, 시클로헥사-3-엔), 시클로헵테닐기, 시클로옥테닐기 등의 시클로알케닐기; 노르보르닐기, 아다만틸기, 비시클로[2.2.2]옥틸기 등을 들 수 있다. 포화 또는 불포화 지환식 탄화수소기의 탄소수는 3∼15가 바람직하고, 보다 바람직하게는 3∼12이다.Examples of the saturated or unsaturated alicyclic hydrocarbon group represented by R 1 to R 9 include cycloalkyl groups such as cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group and cyclooctyl group; Cycloalkenyl groups, such as a cyclohexenyl group (For example, cyclohexa-2-ene, cyclohexa-3-ene), a cycloheptenyl group, and a cyclooctenyl group; a norbornyl group, an adamantyl group, a bicyclo[2.2.2]octyl group, etc. are mentioned. As for carbon number of a saturated or unsaturated alicyclic hydrocarbon group, 3-15 are preferable, More preferably, it is 3-12.
R1∼R9로 나타내어지는 방향족 탄화수소기로서는, 페닐기, 1-나프틸기, 2-나프틸기, 페난트릴기, 안트릴기, 피렌일기 등을 들 수 있다. 방향족 탄화수소기의 탄소수는 6∼15가 바람직하고, 보다 바람직하게는 6∼12이다.Examples of the aromatic hydrocarbon group represented by R 1 to R 9 include a phenyl group, a 1-naphthyl group, a 2-naphthyl group, a phenanthryl group, an anthryl group, and a pyrenyl group. As for carbon number of an aromatic hydrocarbon group, 6-15 are preferable, More preferably, it is 6-12.
R1∼R9로 나타내어지는 탄화수소기는, 탄소수의 상한이 20 이하인 한, 상기에 든 쇄상 탄화수소기, 지환식 탄화수소기, 및 방향족 탄화수소기를 2개 이상 조합한 기여도 된다. 이와 같은 기는, 예를 들면, 방향족 탄화수소기와, 쇄상 탄화수소기, 지환식 탄화수소기 및 방향족 탄화수소기로부터 선택되는 기의 적어도 1개를 조합한 기여도 되며, 당해 조합에 의한 탄화수소기에서는, 쇄상 탄화수소기를, 2가의 기(예를 들면, 알칸디일기)로서 조합해도 된다. 조합에 의한 탄화수소기의 예로서는, 벤질기, 페네틸기, 1-메틸-1-페닐에틸기 등의 아랄킬기; 페닐에테닐기(페닐비닐기) 등의 아릴알케닐기; 페닐에티닐기 등의 아릴알키닐기; o-톨릴기, m-톨릴기, p-톨릴기, 2-에틸페닐기, 3-에틸페닐기, 4-에틸페닐기, 2,3-디메틸페닐기, 2,4-디메틸페닐기, 2,5-디메틸페닐기, 2,6-디메틸페닐기, 3,4-디메틸페닐기, 3,5-디메틸페닐기, 4-비닐페닐기, o-이소프로필페닐기, m-이소프로필페닐기, p-이소프로필페닐기, 2,3-디이소프로필페닐기, 2,4-디이소프로필페닐기, 2,5-디이소프로필페닐기, 2,6-디이소프로필페닐기, 2,4,6-트리이소프로필페닐기, 4-부틸페닐기, o-tert-부틸페닐기, m-tert-부틸페닐기, p-tert-부틸페닐기, 2,6-디(tert-부틸)페닐기, 3,5-디(tert-부틸)페닐기, 3,6-디(tert-부틸)페닐기, 4-tert-부틸-2,6-디메틸페닐기, 4-펜틸페닐기, 4-옥틸페닐기, 4-(2,4,4-트리메틸-2-펜틸)페닐기, 2-도데실페닐기, 3-도데실페닐기, 4-도데실페닐기 등의 알킬아릴기; 2,3-디히드로-4-인데닐기, 1,2,3,5,6,7-헥사히드로-4-s-인다세닐기, 8-메틸-1,2,3,5,6,7-헥사히드로-4-s-인다세닐기, 5,6,7,8-테트라히드로-1-나프틸기, 5,6,7,8-테트라히드로-2-나프틸기, 3-메틸-5,6,7,8-테트라히드로-2-나프틸기, 3,5,5,8,8-펜타메틸-5,6,7,8-테트라히드로-2-나프틸기 등의 알칸디일기가 결합한 아릴기; 비페닐일기, 터페닐일기 등의 1개 이상의 아릴기가 결합한 아릴기; 시클로헥실메틸페닐기, 벤질페닐기, (디메틸(페닐)메틸)페닐기 등을 들 수 있다. 또, 상기 탄화수소기는, 예를 들면, 쇄상 탄화수소기와 지환식 탄화수소기와의 조합에 의한 탄화수소기여도 되며, 그 예로서 1-메틸시클로프로필기, 1-메틸시클로헥실기, 2-메틸시클로헥실기, 3-메틸시클로헥실기, 4-메틸시클로헥실기, 1,2-디메틸시클로헥실기, 1,3-디메틸시클로헥실기, 1,4-디메틸시클로헥실기, 2,3-디메틸시클로헥실기, 2,4-디메틸시클로헥실기, 2,5-디메틸시클로헥실기, 2,6-디메틸시클로헥실기, 3,4-디메틸시클로헥실기, 3,5-디메틸시클로헥실기, 2,2-디메틸시클로헥실기, 3,3-디메틸시클로헥실기, 4,4-디메틸시클로헥실기, 2,4,6-트리메틸시클로헥실기, 2,2,6,6-테트라메틸시클로헥실기, 3,3,5,5-테트라메틸시클로헥실기, 4-펜틸시클로헥실기, 4-옥틸시클로헥실기, 4-시클로헥실시클로헥실기 등의 1 이상의 알킬기가 결합한 지환식 탄화수소기; 시클로프로필메틸기, 시클로프로필에틸기, 시클로부틸메틸기, 시클로부틸에틸기, 시클로펜틸메틸기, 시클로펜틸에틸기, 시클로헥실메틸기, 2-메틸시클로헥실메틸기, 시클로헥실에틸기, 아다만틸메틸기 등의 1 이상의 지환식 탄화수소기가 결합한 알킬기 등을 들 수 있다. 쇄상 탄화수소기, 지환식 탄화수소기, 및 방향족 탄화수소기를 2개 이상 조합한 기의 탄소수는, 바람직하게는 6∼18, 보다 바람직하게는 6∼15이다.The hydrocarbon group represented by R 1 to R 9 may be a combination of two or more of the aforementioned chain hydrocarbon groups, alicyclic hydrocarbon groups, and aromatic hydrocarbon groups as long as the upper limit of the number of carbon atoms is 20 or less. Such a group may, for example, be a contribution obtained by combining at least one of an aromatic hydrocarbon group, a chain hydrocarbon group, an alicyclic hydrocarbon group and an aromatic hydrocarbon group, and in the hydrocarbon group by the combination, a chain hydrocarbon group, You may combine as a bivalent group (for example, alkanediyl group). Examples of the hydrocarbon group in combination include an aralkyl group such as a benzyl group, a phenethyl group, and a 1-methyl-1-phenylethyl group; arylalkenyl groups such as a phenylethenyl group (phenylvinyl group); Aryl alkynyl groups, such as a phenylethynyl group; o-tolyl group, m-tolyl group, p-tolyl group, 2-ethylphenyl group, 3-ethylphenyl group, 4-ethylphenyl group, 2,3-dimethylphenyl group, 2,4-dimethylphenyl group, 2,5-dimethylphenyl group , 2,6-dimethylphenyl group, 3,4-dimethylphenyl group, 3,5-dimethylphenyl group, 4-vinylphenyl group, o-isopropylphenyl group, m-isopropylphenyl group, p-isopropylphenyl group, 2,3-di Isopropylphenyl group, 2,4-diisopropylphenyl group, 2,5-diisopropylphenyl group, 2,6-diisopropylphenyl group, 2,4,6-triisopropylphenyl group, 4-butylphenyl group, o-tert -Butylphenyl group, m-tert-butylphenyl group, p-tert-butylphenyl group, 2,6-di(tert-butyl)phenyl group, 3,5-di(tert-butyl)phenyl group, 3,6-di(tert- Butyl) phenyl group, 4-tert-butyl-2,6-dimethylphenyl group, 4-pentylphenyl group, 4-octylphenyl group, 4-(2,4,4-trimethyl-2-pentyl)phenyl group, 2-dodecylphenyl group, alkylaryl groups such as 3-dodecylphenyl group and 4-dodecylphenyl group; 2,3-dihydro-4-indenyl group, 1,2,3,5,6,7-hexahydro-4-s-indacenyl group, 8-methyl-1,2,3,5,6,7 -hexahydro-4-s-indacenyl group, 5,6,7,8-tetrahydro-1-naphthyl group, 5,6,7,8-tetrahydro-2-naphthyl group, 3-methyl-5, Aryl to which an alkanediyl group such as 6,7,8-tetrahydro-2-naphthyl group or 3,5,5,8,8-pentamethyl-5,6,7,8-tetrahydro-2-naphthyl group is bonded energy; an aryl group to which one or more aryl groups such as a biphenylyl group and a terphenylyl group are bonded; A cyclohexylmethylphenyl group, a benzylphenyl group, (dimethyl(phenyl)methyl)phenyl group, etc. are mentioned. The hydrocarbon group may be, for example, a hydrocarbon group formed by a combination of a chain hydrocarbon group and an alicyclic hydrocarbon group, and examples thereof include 1-methylcyclopropyl group, 1-methylcyclohexyl group, 2-methylcyclohexyl group, 3 -Methylcyclohexyl group, 4-methylcyclohexyl group, 1,2-dimethylcyclohexyl group, 1,3-dimethylcyclohexyl group, 1,4-dimethylcyclohexyl group, 2,3-dimethylcyclohexyl group, 2 ,4-dimethylcyclohexyl group, 2,5-dimethylcyclohexyl group, 2,6-dimethylcyclohexyl group, 3,4-dimethylcyclohexyl group, 3,5-dimethylcyclohexyl group, 2,2-dimethylcyclo Hexyl group, 3,3-dimethylcyclohexyl group, 4,4-dimethylcyclohexyl group, 2,4,6-trimethylcyclohexyl group, 2,2,6,6-tetramethylcyclohexyl group, 3,3, an alicyclic hydrocarbon group to which one or more alkyl groups such as 5,5-tetramethylcyclohexyl group, 4-pentylcyclohexyl group, 4-octylcyclohexyl group and 4-cyclohexylcyclohexyl group are bonded; One or more alicyclic hydrocarbons such as cyclopropylmethyl group, cyclopropylethyl group, cyclobutylmethyl group, cyclobutylethyl group, cyclopentylmethyl group, cyclopentylethyl group, cyclohexylmethyl group, 2-methylcyclohexylmethyl group, cyclohexylethyl group, and adamantylmethyl group The alkyl group etc. which the group couple|bonded are mentioned. The carbon number of the group combining two or more of a chain hydrocarbon group, an alicyclic hydrocarbon group, and an aromatic hydrocarbon group becomes like this. Preferably it is 6-18, More preferably, it is 6-15.
R1∼R9로 나타내어지는 탄소수 1∼20의 탄화수소기가 갖고 있어도 되는 치환기로서는, 예를 들면, 할로겐 원자; 니트릴기; 니트로기; 아미노기; 히드록시기; 메톡시기, 에톡시기 등의 탄소수 1∼20의 알콕시기; 페닐옥시기, 1-나프틸옥시기, 2-나프틸옥시기 등의 탄소수 6∼20의 아릴옥시기; 티올기; 메틸티오기, 에틸티오기 등의 탄소수 1∼20의 알킬티오기; 알릴티오기; 페닐티오기, 1-나프틸티오기, 2-나프틸티오기 등의 탄소수 6∼20의 아릴티오기; 술폭시기; 메틸술폭시기, 에틸술폭시기 등의 탄소수 1∼20의 알킬술폭시기; 페닐술폭시기, 1-나프틸술폭시기, 2-나프틸술폭시기 등의 탄소수 6∼20의 아릴술폭시기; 실릴기; 보릴기; 모노메틸아미노기, 디메틸아미노기, 트리메틸아미노기, 모노에틸아미노기, 디에틸아미노기, 트리에틸아미노기 등의 탄소수 1∼20의 알킬아미노기; 모노페닐아미노기, 디페닐아미노기, 트리페닐아미노기 등의 탄소수 6∼20의 아릴아미노기; 벤질아미노기 등의 탄소수 7∼20의 아랄킬아미노기; 카르복시기; 카르바모일기; 아세틸기, 프로피오닐기 등의 탄소수 2∼20의 알킬카르보닐기; 벤조일기, 1-나프틸카르보닐기, 2-나프틸카르보닐기 등의 탄소수 7∼20의 아릴카르보닐기; 메톡시카르보닐기, 에톡시카르보닐기 등의 탄소수 2∼20의 알콕시카르보닐기; 페닐옥시카르보닐기, 1-나프틸옥시카르보닐기, 2-나프틸옥시카르보닐기 등의 탄소수 7∼20의 아릴옥시카르보닐기; 등을 들 수 있다.As a substituent which the C1-C20 hydrocarbon group represented by R1 - R9 may have, For example, a halogen atom; nitrile group; nitro group; amino group; hydroxyl group; an alkoxy group having 1 to 20 carbon atoms such as a methoxy group and an ethoxy group; C6-C20 aryloxy groups, such as a phenyloxy group, 1-naphthyloxy group, and 2-naphthyloxy group; thiol group; C1-C20 alkylthio groups, such as a methylthio group and an ethylthio group; allylthio group; C6-C20 arylthio groups, such as a phenylthio group, 1-naphthylthio group, and 2-naphthylthio group; sulfoxy group; an alkylsulfoxy group having 1 to 20 carbon atoms, such as a methylsulfoxy group and an ethylsulfoxy group; an arylsulfoxy group having 6 to 20 carbon atoms, such as a phenylsulfoxy group, a 1-naphthylsulfoxy group, and a 2-naphthylsulfoxy group; silyl group; Boryl group; C1-C20 alkylamino groups, such as a monomethylamino group, a dimethylamino group, a trimethylamino group, a monoethylamino group, a diethylamino group, and a triethylamino group; C6-C20 arylamino groups, such as a monophenylamino group, a diphenylamino group, and a triphenylamino group; an aralkylamino group having 7 to 20 carbon atoms, such as a benzylamino group; carboxyl group; carbamoyl group; an alkylcarbonyl group having 2 to 20 carbon atoms, such as an acetyl group and a propionyl group; an arylcarbonyl group having 7 to 20 carbon atoms, such as a benzoyl group, a 1-naphthylcarbonyl group, and a 2-naphthylcarbonyl group; an alkoxycarbonyl group having 2 to 20 carbon atoms, such as a methoxycarbonyl group and an ethoxycarbonyl group; an aryloxycarbonyl group having 7 to 20 carbon atoms, such as a phenyloxycarbonyl group, a 1-naphthyloxycarbonyl group, and a 2-naphthyloxycarbonyl group; and the like.
R1∼R9로 나타내어지는 탄소수 1∼20의 탄화수소기에 포함되는 메틸렌기(-CH2-)는 -O-, 또는 -CO-로 치환되어 있어도 된다.The methylene group (-CH 2 -) contained in the hydrocarbon group having 1 to 20 carbon atoms represented by R 1 to R 9 may be substituted with -O- or -CO-.
R1∼R9로 나타내어지는 탄화수소기에 포함되는 -CH2-가, -O-, -CO-로 치환되는 경우, 그 수는 1개여도 되고 2개 이상이어도 된다. 또한, 탄화수소기에 포함되는 -CH2-가, -O-, -CO-로 치환되는 경우, 치환되기 전의 탄소수를 당해 탄화수소기의 탄소수라고 한다. R1∼R9로 나타내어지는 탄화수소기에 포함되는 -CH2-가, -O-, -CO-로 치환된 기로서는, 구체적으로는 하기 식 (Y-1)∼식 (Y-25)로 나타내어지는 기를 들 수 있다. *은 결합손을 나타낸다.When -CH 2 - contained in the hydrocarbon group represented by R 1 to R 9 is substituted with -O- or -CO-, the number may be one or two or more. In addition, when -CH 2 - contained in a hydrocarbon group is substituted with -O-, -CO-, let the carbon number before substitution be carbon number of the said hydrocarbon group. As a group in which -CH 2 - contained in the hydrocarbon group represented by R 1 to R 9 is substituted with -O- or -CO-, it is specifically represented by the following formulas (Y-1) to (Y-25), losing can be lifted. * indicates a bond.
R1은, 치환기를 갖고 있어도 되는 탄소수 1∼20의 탄화수소기인 것이 바람직하고, 치환기를 갖고 있어도 되는 탄소수 1∼20의 지방족 탄화수소기 또는 방향족 탄화수소기인 것이 보다 바람직하고, 치환기를 갖고 있어도 되는 탄소수 1∼18의 지방족 탄화수소기인 것이 더 바람직하고, 탄소수 3∼16의 분지쇄상 알킬기인 것이 보다 더 바람직하다.It is preferable that R< 1 > is a C1-C20 hydrocarbon group which may have a substituent, It is more preferable that it is a C1-C20 aliphatic hydrocarbon group or an aromatic hydrocarbon group which may have a substituent, It is C1-C20 which may have a substituent. It is more preferable that it is an aliphatic hydrocarbon group of 18, and it is still more preferable that it is a C3-C16 branched alkyl group.
R2∼R9는 수소 원자인 것이 바람직하다.R 2 to R 9 are preferably a hydrogen atom.
환 Z는 방향족 복소환을 나타낸다.Ring Z represents an aromatic heterocycle.
환 Z로 나타내어지는 방향족 복소환은, 단환이어도 되고 다환이어도 된다.The aromatic heterocycle represented by ring Z may be monocyclic or polycyclic may be sufficient as it.
방향족 복소환의 탄소수는 바람직하게는 3∼20이고, 더 바람직하게는 3∼18이고, 특히 바람직하게는 3∼12이다. 방향족 복소환은 5∼12원환인 것이 바람직하고, 5∼10원환인 것이 보다 바람직하고, 5∼9원환인 것이 더 바람직하다.The aromatic heterocycle preferably has 3 to 20 carbon atoms, more preferably 3 to 18 carbon atoms, and particularly preferably 3 to 12 carbon atoms. It is preferable that it is a 5-12 membered ring, as for an aromatic heterocycle, it is more preferable that it is a 5-10 membered ring, It is more preferable that it is a 5-9 membered ring.
환 Z는, 헤테로 원자를 포함하고, 질소 원자, 산소 원자, 및 유황 원자로 이루어지는 군으로부터 선택되는 1종 이상을 포함하는 방향족 복소환인 것이 바람직하다.It is preferable that ring Z is an aromatic heterocyclic ring containing a hetero atom and 1 or more types selected from the group which consists of a nitrogen atom, an oxygen atom, and a sulfur atom.
환 Z는, 헤테로 원자를 2개 이상 포함하고 있어도 되고, 질소 원자, 산소 원자, 또는 유황 원자를 각각 2개 이상 포함하고 있어도 되고, 질소 원자와 산소 원자, 질소 원자와 유황 원자, 또는 산소 원자와 유황 원자의 조합이어도 되고, 질소 원자, 산소 원자 및 유황 원자의 조합이어도 된다.Ring Z may contain two or more heteroatoms, and may contain two or more nitrogen atoms, oxygen atoms, or sulfur atoms, respectively, and a nitrogen atom and an oxygen atom, a nitrogen atom and a sulfur atom, or an oxygen atom and A combination of sulfur atoms may be sufficient, and the combination of a nitrogen atom, an oxygen atom, and a sulfur atom may be sufficient.
질소 원자를 포함하는 복소환으로서는,As a heterocyclic ring containing a nitrogen atom,
피롤, 1-메틸피롤, 2,5-디메틸피롤 등의 피롤, 피라졸, 1-메틸피라졸, 2-메틸피라졸, 3-메틸피라졸, 4-메틸피라졸, 5-메틸피라졸 등의 피라졸, 이미다졸, 1,2,3-트리아졸 및 1,2,4-트리아졸 등의 이미다졸 등의 5원환계 불포화 복소환;pyrrole such as pyrrole, 1-methylpyrrole, 2,5-dimethylpyrrole, pyrazole, 1-methylpyrazole, 2-methylpyrazole, 3-methylpyrazole, 4-methylpyrazole, 5-methylpyrazole, etc. 5-membered ring unsaturated heterocycles such as imidazoles such as pyrazole, imidazole, 1,2,3-triazole and 1,2,4-triazole;
피리딘, 피리다진, 피리미딘, 6-메틸피리미딘 등의 피리미딘, 피라진 및 1,3,5-트리아진 등의 6원환계 불포화 복소환;pyrimidines such as pyridine, pyridazine, pyrimidine and 6-methylpyrimidine; 6-membered ring unsaturated heterocycles such as pyrazine and 1,3,5-triazine;
인다졸, 인돌린, 이소인돌린, 인돌, 인돌리진, 벤조이미다졸, 퀴놀린, 이소퀴놀린, 5,6,7,8-테트라히드로(3-메틸)퀴녹살린, 3-메틸퀴녹살린 등의 퀴녹살린, 퀴나졸린, 신놀린, 프탈라진, 나프티리딘, 퓨린, 프테리딘, 벤조피라졸, 벤조피페리딘 등의 축합 2환계 복소환;Quinox such as indazole, indoline, isoindoline, indole, indolizine, benzimidazole, quinoline, isoquinoline, 5,6,7,8-tetrahydro(3-methyl)quinoxaline, 3-methylquinoxaline condensed bicyclic heterocycles such as saline, quinazoline, cinnoline, phthalazine, naphthyridine, purine, pteridine, benzopyrazole, and benzopiperidine;
카르바졸, 아크리딘 및 페나진 등의 축합 3환계 복소환; 등을 들 수 있다.condensed tricyclic heterocycles such as carbazole, acridine and phenazine; and the like.
산소 원자를 포함하는 복소환으로서는,As a heterocyclic ring containing an oxygen atom,
α-아세토락톤, β-프로피오락톤, γ-부티로락톤, γ-발레로락톤 및 δ-발레로락톤 등의 락톤계 복소환;lactone-based heterocycles such as α-acetolactone, β-propiolactone, γ-butyrolactone, γ-valerolactone and δ-valerolactone;
푸란, 2,3-디메틸푸란, 2,5-디메틸푸란 등의 5원환계 불포화 복소환;5-membered ring unsaturated heterocycles such as furan, 2,3-dimethylfuran, and 2,5-dimethylfuran;
2H-피란, 4H-피란 등의 6원환계 불포화 복소환;6-membered ring unsaturated heterocycles such as 2H-pyran and 4H-pyran;
1-벤조푸란 등의 벤조푸란, 이소벤조푸란, 벤조피란, 4-메틸벤조피란 등의 벤조피란, 벤조디옥솔, 1,3-벤조디옥솔, 벤조디옥산, 크로만 및 이소크로만 등의 축합 2환계 복소환;Benzofuran such as 1-benzofuran, benzopyran such as isobenzofuran, benzopyran, 4-methylbenzopyran, benzodioxole, 1,3-benzodioxole, benzodioxane, chroman, isochroman condensed bicyclic heterocycle;
크산텐, 디벤조푸란 등의 축합 3환계 복소환; 등을 들 수 있다.Condensed tricyclic heterocycles, such as xanthene and dibenzofuran; and the like.
유황 원자를 포함하는 복소환으로서는,As a heterocyclic ring containing a sulfur atom,
티오펜, 3-메틸티오펜, 2-카르복시티오펜 등의 티오펜, 2H-티오피란, 4H-티오피란 등의 티오피란, 벤조테트라히드로티오피란 등의 벤조티오피란 등의 5원환계 불포화 복소환 및 6원환계 불포화 복소환;Thiophene such as thiophene, 3-methylthiophene and 2-carboxythiophene, thiopyran such as 2H-thiopyran and 4H-thiopyran, and benzothiopyran such as benzotetrahydrothiopyran Summoned and 6-membered unsaturated heterocyclic rings;
벤조티오피란, 벤조테트라히드로티오피란 등의 벤조티오피란, 벤조티오펜 등의 축합 2환계 복소환 등;Condensed bicyclic heterocyclic rings, such as benzothiopyran, such as benzothiopyran and benzotetrahydrothiopyran, and benzothiophene;
티안트렌, 디벤조티오펜 등의 축합 3환계 복소환; 등을 들 수 있다.condensed tricyclic heterocycles such as thianthrene and dibenzothiophene; and the like.
질소 원자 및 산소 원자를 포함하는 복소환으로서는,As a heterocyclic ring containing a nitrogen atom and an oxygen atom,
이소티아졸, 옥사졸, 4-메틸옥사졸 등의 옥사졸, 2-메틸이소옥사졸, 3-메틸이소옥사졸, 4-메틸이소옥사졸, 5-메틸이소옥사졸 등의 이소옥사졸 등의 단환계 불포화 복소환;Monocyclic unsaturated, such as isoxazole, such as oxazole, such as isothiazole, oxazole, 4-methyloxazole, 2-methylisoxazole, 3-methylisoxazole, 4-methylisoxazole, 5-methylisoxazole, etc. heterocycle;
벤조옥사졸, 벤조이소옥사졸, 벤조옥사진, 벤조디옥산, 벤조이미다졸린 등의 축합 2환계 복소환;Condensed bicyclic heterocyclic rings, such as benzoxazole, benzoisooxazole, benzoxazine, benzodioxane, and benzoimidazoline;
페녹사진 등의 축합 3환계 복소환;condensed tricyclic heterocycles such as phenoxazine;
등을 들 수 있다.and the like.
질소 원자 및 유황 원자를 포함하는 복소환으로서는,As a heterocyclic ring containing a nitrogen atom and a sulfur atom,
티아졸 등의 5원환계 불포화 복소환;5-membered ring system unsaturated heterocycles, such as thiazole;
벤조티아졸 등의 축합 2환계 복소환;Condensed bicyclic heterocycles, such as benzothiazole;
페노티아진 등의 축합 3환계 복소환; 등을 들 수 있다.condensed tricyclic heterocycles such as phenothiazine; and the like.
또한, 상기의 복소환의 결합 위치는, 각 복소환에 포함되는 임의의 수소 원자가 2개 탈리한 부분이다.In addition, the bonding position of the said heterocyclic ring is the part from which two arbitrary hydrogen atoms contained in each heterocycle were removed.
방향족 복소환은 치환기를 갖고 있어도 되며, 치환기로서는 불소 원자, 염소 원자, 브롬 원자 또는 요오드 원자 등의 할로겐 원자, 시아노기, 니트로기, 히드록시기, 치환 또는 무치환의 아미노기, 탄소수 1∼8의 알콕시기 등을 들 수 있다.The aromatic heterocycle may have a substituent, and examples of the substituent include a halogen atom such as a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, a cyano group, a nitro group, a hydroxy group, a substituted or unsubstituted amino group, and an alkoxy group having 1 to 8 carbon atoms. and the like.
그 중에서도, 방향족 복소환은, 질소 원자를 포함하는 방향족 복소환인 것이 바람직하고, 질소 원자를 포함하는 5원환계 불포화 복소환인 것이 보다 바람직하고, 이미다졸인 것이 더 바람직하다.Among them, the aromatic heterocycle is preferably an aromatic heterocycle containing a nitrogen atom, more preferably a 5-membered ring unsaturated heterocycle containing a nitrogen atom, and still more preferably imidazole.
식 (I)로 나타내어지는 화합물은, 표 1∼5에 나타내는 것과 같이, 식 (Ia-1)∼식 (Ia-280)으로 나타내어지는 화합물인 것이 바람직하다.The compound represented by the formula (I) is preferably a compound represented by the formulas (Ia-1) to (Ia-280), as shown in Tables 1 to 5.
표 1∼5에 있어서, (D-1)∼(D-16), (G-1)∼(G-24), (Z-1)∼(Z-7)은, 이하에 나타내는 구조와 마찬가지이다. 각 기의 *은 결합손을 나타낸다.In Tables 1 to 5, (D-1) to (D-16), (G-1) to (G-24), and (Z-1) to (Z-7) have the same structures as those shown below. to be. * in each group represents a bond.
그 중에서도 식 (Ia-1)∼식 (Ia-48), 식 (Ia-113)∼식 (Ia-184)로 나타내어지는 화합물이 바람직하고, 식 (Ia-13)으로 나타내어지는 화합물, 식 (Ia-29)로 나타내어지는 화합물, 식 (Ia-45)로 나타내어지는 화합물인 것이 보다 바람직하고, 식 (Ia-45)로 나타내어지는 화합물(후술하는 화합물 (I-4))이 더 바람직하다.Among them, compounds represented by formulas (Ia-1) to (Ia-48) and (Ia-113) to (Ia-184) are preferable, and compounds represented by formula (Ia-13), formula ( The compound represented by the formula (Ia-29) or the compound represented by the formula (Ia-45) is more preferable, and the compound represented by the formula (Ia-45) (the compound (I-4) to be described later) is more preferable.
식 (I)로 나타내어지는 화합물은, 종래 공지의 방법으로 제조되어도 되며, 예를 들면 Angew. Chem. Int. Ed. 1999, 38. 201-203에 기재된 방법에 따라서 합성해도 된다.The compound represented by Formula (I) may be manufactured by a conventionally well-known method, For example, Angew. Chem. Int. Ed. 1999, 38. You may synthesize|combine according to the method described in 201-203.
<< 착색제 (A1) >><< Colorant (A1) >>
본 발명의 착색 수지 조성물은, 착색제 (A)로서, 화합물 (I) 이외의 염료(이하, 염료 (A1-1)이라고 하는 경우가 있음) 및/또는 안료(이하, 안료 (A1-2)라고 하는 경우가 있음)를 포함하고 있어도 된다(이하, 염료 (A1-1) 및 안료 (A1-2)를 합쳐서 착색제 (A1)이라고 하는 경우가 있음). 이들은 단독으로 이용해도 되고, 또는 2종 이상을 조합하여 사용해도 된다.The colored resin composition of the present invention is a colorant (A) as a dye other than the compound (I) (hereinafter sometimes referred to as dye (A1-1)) and/or pigment (hereinafter referred to as pigment (A1-2) may be included) (hereinafter, the dye (A1-1) and the pigment (A1-2) may be collectively referred to as a coloring agent (A1)). These may be used independently and may be used in combination of 2 or more type.
염료 (A1-1)은, 화합물 (I)을 포함하지 않는 한, 특별히 한정되지 않고 공지의 염료를 사용할 수 있고, 예를 들면, 용제 염료, 산성 염료, 직접 염료, 매염 염료 등을 들 수 있다. 염료로서는, 예를 들면, 컬러 인덱스(The Society of Dyers and Colourists 출판)에서 염료로 분류되어 있는 화합물이나, 염색 노트(시키센샤)에 기재되어 있는 공지의 염료를 들 수 있다. 또, 화학 구조에 의하면, 아조 염료, 시아닌 염료, 트리페닐메탄 염료, 크산텐 염료, 안트라퀴논 염료, 나프토퀴논 염료, 퀴논이민 염료, 메틴 염료, 아조메틴 염료, 스쿠아릴리움 염료, 아크리딘 염료, 스티릴 염료, 쿠마린 염료, 퀴놀린 염료, 니트로 염료, 및 프탈로시아닌 염료 등을 들 수 있다. 이들 중, 유기 용제 가용성 염료가 바람직하다.The dye (A1-1) is not particularly limited as long as it does not contain the compound (I), and a known dye can be used. Examples of the dye (A1-1) include solvent dyes, acid dyes, direct dyes, and mordant dyes. . As a dye, the compound classified as a dye by the color index (published by The Society of Dyers and Colorists), and the well-known dye described in the dyeing notebook (Skisensha) are mentioned, for example. Moreover, according to the chemical structure, azo dye, cyanine dye, triphenylmethane dye, xanthene dye, anthraquinone dye, naphthoquinone dye, quinoneimine dye, methine dye, azomethine dye, squarylium dye, acridine and dyes, styryl dyes, coumarin dyes, quinoline dyes, nitro dyes, and phthalocyanine dyes. Among these, organic solvent-soluble dyes are preferable.
안료 (A1-2)로서는, 화합물 (I)을 포함하지 않는 한, 특별히 한정되지 않고 공지의 안료를 사용할 수 있고, 예를 들면, 컬러 인덱스(The Society of Dyers and Colourists 출판)에서 피그먼트로 분류되어 있는 안료를 들 수 있다.As the pigment (A1-2), as long as it does not contain compound (I), it does not specifically limit, A well-known pigment can be used, For example, it is classified as a pigment by the color index (published by The Society of Dyers and Colorists). pigments can be mentioned.
피그먼트로 분류되어 있는 안료로서는, 예를 들면, C. I. 피그먼트 옐로 1, 3, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53, 83, 86, 93, 94, 109, 110, 117, 125, 128, 129, 137, 138, 139, 147, 148, 150, 153, 154, 166, 173, 185, 194, 214, 231 등의 황색 안료;As a pigment classified as a pigment, For example, C.I. Pigment Yellow 1, 3, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53, 83, 86, 93, 94, 109 , 110, 117, 125, 128, 129, 137, 138, 139, 147, 148, 150, 153, 154, 166, 173, 185, 194, 214, 231 yellow pigments;
C. I. 피그먼트 오렌지 13, 31, 36, 38, 40, 42, 43, 51, 55, 59, 61, 64, 65, 71, 73 등의 오렌지색 안료;C. I. Orange pigments such as pigment orange 13, 31, 36, 38, 40, 42, 43, 51, 55, 59, 61, 64, 65, 71, 73;
C. I. 피그먼트 레드 9, 97, 105, 122, 144, 166, 168, 176, 177, 180, 190, 192, 209, 215, 216, 224, 242, 254, 255, 264, 265, 266, 268, 269, 273 등의 적색 안료;C. I. Pigment Red 9, 97, 105, 122, 144, 166, 168, 176, 177, 180, 190, 192, 209, 215, 216, 224, 242, 254, 255, 264, 265, 266, 268, red pigments such as 269 and 273;
C. I. 피그먼트 블루 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 60 등의 청색 안료;C. I. Blue pigments such as Pigment Blue 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 60;
C. I. 피그먼트 바이올렛 1, 19, 23, 32, 36, 38 등의 바이올렛색 안료;C. I. Violet pigments such as Pigment Violet 1, 19, 23, 32, 36, 38;
C. I. 피그먼트 그린 7, 36, 58, 59, 62, 63 등의 녹색 안료;Green pigments such as C. I. Pigment Green 7, 36, 58, 59, 62, 63;
C. I. 피그먼트 브라운 23, 25 등의 브라운색 안료;C. I. Brown pigments such as Pigment Brown 23 and 25;
C. I. 피그먼트 블랙 1, 7 등의 흑색 안료; 를 들 수 있다.C. I. Black pigments such as Pigment Black 1 and 7; can be heard
착색제 (A1)로서는 황색, 적색 또는 녹색의 염료 및 안료가 바람직하다.As the colorant (A1), yellow, red or green dyes and pigments are preferred.
착색제 (A1)은, 필요에 따라서, 로진 처리, 산성기 또는 염기성기가 도입된 유도체 등을 이용한 표면 처리, 고분자 화합물 등에 의한 착색제 (A1) 표면에의 그라프트 처리, 황산 미립화법 등에 의한 미립화 처리, 불순물을 제거하기 위한 유기 용제나 물 등에 의한 세정 처리, 이온성 불순물의 이온교환법 등에 의한 제거 처리 등이 실시되어 있어도 된다. 착색제 (A1)의 입경은 대략 균일한 것이 바람직하다.The colorant (A1) is, if necessary, a rosin treatment, a surface treatment using a derivative into which an acidic group or a basic group is introduced, a graft treatment to the surface of the colorant (A1) with a polymer compound, etc., atomization treatment by a sulfuric acid atomization method, etc.; Washing treatment with an organic solvent, water, etc. for removing impurities, removal treatment of ionic impurities by an ion exchange method, etc. may be performed. It is preferable that the particle diameter of a coloring agent (A1) is substantially uniform.
착색제 (A)가 착색제 (A1)을 추가로 포함하는 경우, 착색제 (A) 중의 화합물 (I)의 합계량의 함유율의 하한은, 착색제 (A)의 총량에 대하여, 예를 들면, 1 질량% 이상이고, 바람직하게는 2 질량% 이상이고, 보다 바람직하게는 10 질량% 이상이고, 더 바람직하게는 25 질량% 이상이고, 특히 바람직하게는 50 질량% 이상이다. 한편, 착색제 (A)가 착색제 (A1)을 추가로 포함하는 경우, 착색제 (A) 중의 화합물 (I)의 합계량의 함유율의 상한은, 착색제 (A)의 총량에 대하여, 예를 들면, 100 질량% 미만이다.When the colorant (A) further contains the colorant (A1), the lower limit of the content rate of the total amount of the compound (I) in the colorant (A) is, for example, 1% by mass or more with respect to the total amount of the colorant (A). and preferably 2 mass % or more, more preferably 10 mass % or more, still more preferably 25 mass % or more, and particularly preferably 50 mass % or more. On the other hand, when the colorant (A) further contains the colorant (A1), the upper limit of the content rate of the total amount of the compound (I) in the colorant (A) is, for example, 100 masses with respect to the total amount of the colorant (A). less than %.
착색 수지 조성물이, 용제 (E)를 포함하는 경우, 미리 착색제 (A)와 용제 (E)를 포함하는 착색제 함유액(착색 조성물이라고 칭하는 경우도 있음)을 조제한 후, 당해 착색제 함유액을 사용하여 착색 수지 조성물을 조제해도 된다. 착색제 (A)가 용제 (E)에 용해되지 않는 경우, 예를 들면 착색제 (A)가 안료 (A1-2)를 포함하는 경우 등에는, 착색제 함유액은, 착색제 (A)를 용제 (E)에 분산시켜 혼합함으로써 조제할 수 있다. 착색제 함유액은, 착색 수지 조성물에 함유되는 용제 (E)의 일부 또는 전부를 포함하고 있어도 된다.When the colored resin composition contains the solvent (E), a colorant-containing liquid (sometimes referred to as a coloring composition) containing the colorant (A) and the solvent (E) is prepared in advance, and then using the colorant-containing liquid You may prepare a colored resin composition. In the case where the colorant (A) does not dissolve in the solvent (E), for example, when the colorant (A) contains the pigment (A1-2), the colorant-containing liquid is prepared by adding the colorant (A) to the solvent (E). It can be prepared by dispersing and mixing. The coloring agent containing liquid may contain a part or all of the solvent (E) contained in a colored resin composition.
착색제 함유액 중의 고형분의 함유율은, 착색제 함유액의 총량에 대하여, 바람직하게는 0.01 질량% 이상 99.99 질량% 이하, 보다 바람직하게는 0.1 질량% 이상 99.9 질량% 이하, 더 바람직하게는 0.1 질량% 이상 99 질량% 이하, 보다 더 바람직하게는 0.5 질량% 이상 90 질량% 이하이고, 특히 바람직하게는 1 질량% 이상 50 질량% 이하이다.The content rate of the solid content in the colorant-containing liquid is preferably 0.01 mass% or more and 99.99 mass% or less, more preferably 0.1 mass% or more and 99.9 mass% or less, further preferably 0.1 mass% or more with respect to the total amount of the colorant-containing liquid. 99 mass % or less, More preferably, it is 0.5 mass % or more and 90 mass % or less, Especially preferably, it is 1 mass % or more and 50 mass % or less.
착색제 (A)는, 분산제를 함유시켜 분산 처리를 행함으로써, 착색제 (A)가 용액 중에서 균일하게 분산된 상태로 할 수 있다. 착색제 (A)로서 2종 이상을 조합하여 사용하는 경우는, 각각을 단독으로 분산 처리해도 되고, 복수 종을 혼합하여 분산 처리해도 된다.A coloring agent (A) can be made into the state in which the coloring agent (A) disperse|distributed uniformly in a solution by making it contain a dispersing agent and performing a dispersion process. When using in combination of 2 or more type as a coloring agent (A), each may be individually dispersed, and multiple types may be mixed and a dispersion-processed may be carried out.
분산제로서는, 예를 들면, 계면활성제 등을 들 수 있고, 카티온계, 아니온계, 논이온계 및 양성의 어느 것의 계면활성제여도 된다. 구체적으로는 폴리에스테르계, 폴리아민계 및 아크릴계 등의 계면활성제 등을 들 수 있다. 이들 분산제는 단독으로 또는 2종 이상을 조합하여 이용해도 된다. 분산제로서는, 상품명으로 나타내면, KP(신에츠화학공업(주) 제), 플로렌(교에이샤화학(주) 제), 솔스퍼스(등록상표)(제네카(주) 제), EFKA(등록상표)(BASF사 제), 아지스파(등록상표)(아지노모토파인테크노(주) 제) 및 Disperbyk(등록상표)(빅케미(주) 제), BYK(등록상표)(빅케미(주) 제) 등을 들 수 있다. 분산제로서, 후술하는 수지 (B)를 사용해도 된다.As a dispersing agent, surfactant etc. are mentioned, for example, Cationic, anionic, nonionic, and any surfactant of amphoteric type may be sufficient. Specifically, surfactants, such as a polyester type, a polyamine type, and an acryl type, etc. are mentioned. You may use these dispersing agents individually or in combination of 2 or more types. As a dispersing agent, if it shows by a brand name, KP (Shin-Etsu Chemical Co., Ltd. product), Florene (Kyoeisha Chemical Co., Ltd. product), Solsperse (trademark) (Zeneca Co., Ltd. product), EFKA (registered trademark) (manufactured by BASF), Azispa (registered trademark) (manufactured by Ajinomoto Fine Techno Co., Ltd.) and Disperbyk (registered trademark) (manufactured by Big Chemi Co., Ltd.), BYK (registered trademark) (manufactured by Big Chemi Co., Ltd.), etc. can be heard As a dispersing agent, you may use resin (B) mentioned later.
분산제를 이용하는 경우, 당해 분산제(고형분)의 사용량은, 착색제 (A) 100 질량부에 대하여, 통상 1 질량부 이상 10000 질량부 이하이고, 바람직하게는 5 질량부 이상 5000 질량부 이하이고, 보다 바람직하게는 10 질량부 이상 1000 질량부 이하이고, 더 바람직하게는 15 질량부 이상 800 질량부 이하이다. 당해 분산제의 사용량이 상기의 범위에 있으면, 보다 균일한 분산 상태의 착색제 함유액이 얻어지는 경향이 있다.When using a dispersing agent, the usage-amount of the said dispersing agent (solid content) is 1 mass part or more and 10000 mass parts or less normally with respect to 100 mass parts of coloring agents (A), Preferably it is 5 mass parts or more and 5000 mass parts or less, More preferably Preferably, they are 10 mass parts or more and 1000 mass parts or less, More preferably, they are 15 mass parts or more and 800 mass parts or less. When the usage-amount of the said dispersing agent exists in the said range, there exists a tendency for the colorant containing liquid in a more uniformly dispersed state to be obtained.
착색제 (A)의 함유율은, 착색 수지 조성물의 고형분의 총량에 대하여, 바람직하게는 0.1 질량% 이상 50 질량% 이하이고, 보다 바람직하게는 0.5 질량% 이상 40 질량% 이하이고, 더 바람직하게는 1 질량% 이상 30 질량% 이하이다. 착색제 (A)의 함유율이 상기의 범위에 있으면, 컬러 필터로 하였을 때의 색 농도가 충분하고, 또한 조성물 중에 수지 (B)를 필요량 함유시킬 수 있으므로, 기계적 강도가 충분한 패턴을 형성할 수 있는 것으로부터 바람직하다.The content rate of the colorant (A) is preferably 0.1 mass % or more and 50 mass % or less, more preferably 0.5 mass % or more and 40 mass % or less, further preferably 1 to the total amount of solid content of the colored resin composition. mass % or more and 30 mass % or less. When the content of the colorant (A) is within the above range, the color density when a color filter is used is sufficient, and the resin (B) can be contained in a required amount in the composition, so that a pattern having sufficient mechanical strength can be formed. preferred from
여기에서, 본 명세서에 있어서의 「고형분의 총량」이란, 착색 수지 조성물의 총량으로부터 용제의 함유량을 제외한 양을 말한다. 고형분의 총량 및 이것에 대한 각 성분의 함유량은, 예를 들면, 액체 크로마토그래피 또는 가스 크로마토그래피 등의 공지의 분석 수단으로 측정할 수 있다.Here, the "total amount of solid content" in this specification means the quantity remove|excluding content of the solvent from the total amount of a colored resin composition. The total amount of solid content and content of each component with respect to this can be measured by well-known analytical means, such as liquid chromatography or gas chromatography, for example.
< 수지 (B) >< Resin (B) >
수지 (B)는, 열가소성 수지와는 달리, 포토레지스트의 형성에 사용되는 것이라면, 특별히 한정되지 않지만, 알칼리 가용성 수지이고, 카르본산을 갖는 알칼리 가용성 수지인 것이 바람직하다.Although it will not specifically limit if resin (B) is used for formation of a photoresist unlike a thermoplastic resin, It is alkali-soluble resin, It is preferable that it is alkali-soluble resin which has carboxylic acid.
수지 (B)로서는 이하의 수지 [K1]∼[K6] 등을 들 수 있다.Examples of the resin (B) include the following resins [K1] to [K6].
수지 [K1]; 불포화 카르본산 및 불포화 카르본산 무수물로 이루어지는 군으로부터 선택되는 적어도 1종 (a)(이하 「(a)」라고 하는 경우가 있음)에 유래하는 구조단위와, 탄소수 2∼4의 환상 에테르 구조와 에틸렌성 불포화 결합을 갖는 단량체 (b)(이하 「(b)」라고 하는 경우가 있음)에 유래하는 구조단위를 갖는 공중합체;resin [K1]; A structural unit derived from at least one (a) (hereinafter sometimes referred to as “(a)”) selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic acid anhydrides, a cyclic ether structure having 2 to 4 carbon atoms, and ethylene a copolymer having a structural unit derived from a monomer (b) having a sexually unsaturated bond (hereinafter sometimes referred to as “(b)”);
수지 [K2]; (a)에 유래하는 구조단위와 (b)에 유래하는 구조단위와, (a)와 공중합 가능한 단량체 (c)(단, (a) 및 (b)와는 다르다.)(이하 「(c)」라고 하는 경우가 있음)에 유래하는 구조단위를 갖는 공중합체;resin [K2]; The structural unit derived from (a), the structural unit derived from (b), and the monomer (c) copolymerizable with (a) (however, it is different from (a) and (b).) (hereinafter "(c)" copolymers having a structural unit derived from );
수지 [K3]; (a)에 유래하는 구조단위와 (c)에 유래하는 구조단위를 갖는 공중합체;resin [K3]; a copolymer having a structural unit derived from (a) and a structural unit derived from (c);
수지 [K4]; (a)에 유래하는 구조단위에 (b)를 부가시킨 구조단위와 (c)에 유래하는 구조단위를 갖는 공중합체;resin [K4]; a copolymer having a structural unit derived from (c) and a structural unit obtained by adding (b) to the structural unit derived from (a);
수지 [K5]; (b)에 유래하는 구조단위에 (a)를 부가시킨 구조단위와 (c)에 유래하는 구조단위를 갖는 공중합체;resin [K5]; a copolymer having a structural unit derived from (a) added to the structural unit derived from (b) and a structural unit derived from (c);
수지 [K6]; (b)에 유래하는 구조단위에 (a)를 부가시키고, 카르본산 무수물을 추가로 부가시킨 구조단위와 (c)에 유래하는 구조단위를 갖는 공중합체.resin [K6]; A copolymer having a structural unit derived from (c) and a structural unit obtained by adding (a) to the structural unit derived from (b) and further adding carboxylic acid anhydride.
단량체 (a)로서는, 예를 들면, 아크릴산, 메타크릴산, 크로톤산 및 o-, m-, p-비닐안식향산 등의 불포화 모노카르본산;As a monomer (a), For example, unsaturated monocarboxylic acids, such as acrylic acid, methacrylic acid, a crotonic acid, and o-, m-, p-vinyl benzoic acid;
말레산, 푸마르산, 시트라콘산, 메사콘산, 이타콘산, 3-비닐프탈산, 4-비닐프탈산, 3,4,5,6-테트라히드로프탈산, 1,2,3,6-테트라히드로프탈산, 디메틸테트라히드로프탈산 및 1,4-시클로헥센디카르본산 등의 불포화 디카르본산;Maleic acid, fumaric acid, citraconic acid, mesaconic acid, itaconic acid, 3-vinylphthalic acid, 4-vinylphthalic acid, 3,4,5,6-tetrahydrophthalic acid, 1,2,3,6-tetrahydrophthalic acid, dimethyl unsaturated dicarboxylic acids such as tetrahydrophthalic acid and 1,4-cyclohexenedicarboxylic acid;
메틸-5-노르보르넨-2,3-디카르본산, 5-카르복시비시클로[2.2.1]헵트-2-엔, 5,6-디카르복시비시클로[2.2.1]헵트-2-엔, 5-카르복시-5-메틸비시클로[2.2.1]헵트-2-엔, 5-카르복시-6-메틸비시클로[2.2.1]헵트-2-엔 및 5-카르복시-6-에틸비시클로[2.2.1]헵트-2-엔 등의 카르복시기를 함유하는 비시클로 불포화 화합물;Methyl-5-norbornene-2,3-dicarboxylic acid, 5-carboxybicyclo[2.2.1]hept-2-ene, 5,6-dicarboxybicyclo[2.2.1]hept-2-ene , 5-carboxy-5-methylbicyclo[2.2.1]hept-2-ene, 5-carboxy-6-methylbicyclo[2.2.1]hept-2-ene and 5-carboxy-6-ethylbicyclo [2.2.1] a bicyclo unsaturated compound containing a carboxy group such as hept-2-ene;
푸마르산 및 메사콘산을 제외한 상기 불포화 디카르본산의 무수물 등의 카르본산 무수물;carboxylic acid anhydrides such as anhydrides of the above unsaturated dicarboxylic acids other than fumaric acid and mesaconic acid;
숙신산 모노〔2-(메타)아크릴로일옥시에틸〕 및 프탈산 모노〔2-(메타)아크릴로일옥시에틸〕 등의 2가 이상의 다가 카르본산의 불포화 모노〔(메타)아크릴로일옥시알킬〕에스테르류;Unsaturated mono[(meth)acryloyloxyalkyl] of polyhydric carboxylic acid having more than divalence, such as succinic acid mono[2-(meth)acryloyloxyethyl] and phthalic acid mono[2-(meth)acryloyloxyethyl] esters;
α-(히드록시메틸)아크릴산과 같은, 동일 분자 중에 히드록시기 및 카르복시기를 함유하는 불포화 아크릴레이트류; 등을 들 수 있다.unsaturated acrylates containing a hydroxyl group and a carboxyl group in the same molecule, such as α-(hydroxymethyl)acrylic acid; and the like.
이들 중, 공중합 반응성의 점이나 얻어지는 수지의 알칼리 수용액에의 용해성의 점에서, 아크릴산, 메타크릴산 및 무수 말레산 등이 바람직하다.Among these, acrylic acid, methacrylic acid, maleic anhydride, etc. are preferable from the point of copolymerization reactivity and the solubility point to the aqueous alkali solution of resin obtained.
또한, 본 명세서에 있어서, 「(메타)아크릴산」이란, 아크릴산 및 메타크릴산으로 이루어지는 군으로부터 선택되는 적어도 1종을 나타낸다. 「(메타)아크릴로일」 및 「(메타)아크릴레이트」 등의 표기도, 마찬가지의 의미를 갖는다.In addition, in this specification, "(meth)acrylic acid" shows at least 1 sort(s) chosen from the group which consists of acrylic acid and methacrylic acid. Notations, such as "(meth)acryloyl" and "(meth)acrylate", also have the same meaning.
단량체 (b)는, 탄소수 2∼4의 환상 에테르 구조(예를 들면, 옥시란환, 옥세탄환 및 테트라히드로푸란환(옥솔란환)으로 이루어지는 군으로부터 선택되는 적어도 1종)와 에틸렌성 불포화 결합을 갖는 중합성 화합물을 말한다. 단량체 (b)는, 탄소수 2∼4의 환상 에테르와 (메타)아크릴로일옥시기를 갖는 단량체인 것이 바람직하다.The monomer (b) has a cyclic ether structure having 2 to 4 carbon atoms (eg, at least one selected from the group consisting of an oxirane ring, an oxetane ring and a tetrahydrofuran ring (oxolane ring)) and an ethylenically unsaturated bond. It refers to a polymerizable compound having It is preferable that a monomer (b) is a monomer which has a C2-C4 cyclic ether and a (meth)acryloyloxy group.
단량체 (b)로서는, 예를 들면, 옥시라닐기와 에틸렌성 불포화 결합을 갖는 단량체(이하, 「단량체 (b1)」이라고 하는 경우가 있음), 옥세타닐기와 에틸렌성 불포화 결합을 갖는 단량체(이하, 「단량체 (b2)」라고 하는 경우가 있음), 테트라히드로푸릴기와 에틸렌성 불포화 결합을 갖는 단량체(이하, 「단량체 (b3)」이라고 하는 경우가 있음) 등을 들 수 있다.As the monomer (b), for example, a monomer having an oxiranyl group and an ethylenically unsaturated bond (hereinafter, sometimes referred to as "monomer (b1)"), a monomer having an oxetanyl group and an ethylenically unsaturated bond (hereinafter, "monomer (b2)" may be referred to), a monomer having a tetrahydrofuryl group and an ethylenically unsaturated bond (hereinafter, may be referred to as "monomer (b3)"), and the like.
단량체 (b1)로서는, 예를 들면, 불포화 지방족 탄화수소를 에폭시화한 구조를 갖는 단량체(이하, 「단량체 (b1-1)」이라고 하는 경우가 있음), 불포화 지환식탄화수소를 에폭시화한 구조를 갖는 단량체(이하, 「단량체 (b1-2)」라고 하는 경우가 있음)를 들 수 있다.As the monomer (b1), for example, a monomer having a structure in which an unsaturated aliphatic hydrocarbon is epoxidized (hereinafter sometimes referred to as "monomer (b1-1)"), a structure in which an unsaturated alicyclic hydrocarbon is epoxidized A monomer (Hereinafter, it may be called "monomer (b1-2)") is mentioned.
단량체 (b1-1)로서는, 글리시딜기와 에틸렌성 불포화 결합을 갖는 단량체가 바람직하다. 단량체 (b1-1)로서는, 구체적으로는 글리시딜(메타)아크릴레이트, β-메틸글리시딜(메타)아크릴레이트, β-에틸글리시딜(메타)아크릴레이트, 글리시딜비닐에테르, o-비닐벤질글리시딜에테르, m-비닐벤질글리시딜에테르, p-비닐벤질글리시딜에테르, α-메틸-o-비닐벤질글리시딜에테르, α-메틸-m-비닐벤질글리시딜에테르, α-메틸-p-비닐벤질글리시딜에테르, 2,3-비스(글리시딜옥시메틸)스티렌, 2,4-비스(글리시딜옥시메틸)스티렌, 2,5-비스(글리시딜옥시메틸)스티렌, 2,6-비스(글리시딜옥시메틸)스티렌, 2,3,4-트리스(글리시딜옥시메틸)스티렌, 2,3,5-트리스(글리시딜옥시메틸)스티렌, 2,3,6-트리스(글리시딜옥시메틸)스티렌, 3,4,5-트리스(글리시딜옥시메틸)스티렌, 2,4,6-트리스(글리시딜옥시메틸)스티렌 등을 들 수 있다.As the monomer (b1-1), a monomer having a glycidyl group and an ethylenically unsaturated bond is preferable. Specific examples of the monomer (b1-1) include glycidyl (meth) acrylate, β-methylglycidyl (meth) acrylate, β-ethyl glycidyl (meth) acrylate, glycidyl vinyl ether, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl ether, α-methyl-o-vinylbenzyl glycidyl ether, α-methyl-m-vinylbenzylglycidyl ether dilether, α-methyl-p-vinylbenzylglycidyl ether, 2,3-bis(glycidyloxymethyl)styrene, 2,4-bis(glycidyloxymethyl)styrene, 2,5-bis( Glycidyloxymethyl)styrene, 2,6-bis(glycidyloxymethyl)styrene, 2,3,4-tris(glycidyloxymethyl)styrene, 2,3,5-tris(glycidyloxy) Methyl) styrene, 2,3,6-tris (glycidyloxymethyl) styrene, 3,4,5-tris (glycidyloxymethyl) styrene, 2,4,6-tris (glycidyloxymethyl) Styrene etc. are mentioned.
단량체 (b1-2)로서는 비닐시클로헥센모노옥사이드, 1,2-에폭시-4-비닐시클로헥산(예를 들면, 셀록사이드(등록상표) 2000; (주)다이셀 제), 3,4-에폭시시클로헥실메틸(메타)아크릴레이트(예를 들면, 사이클로머(등록상표) A400; (주)다이셀 제), 3,4-에폭시시클로헥실메틸(메타)아크릴레이트(예를 들면, 사이클로머(등록상표) M100; (주)다이셀 제), 식 (BI)로 나타내어지는 화합물 및 식 (BII)로 나타내어지는 화합물 등을 들 수 있다.As the monomer (b1-2), vinylcyclohexene monoxide, 1,2-epoxy-4-vinylcyclohexane (for example, Celoxide (registered trademark) 2000; manufactured by Daicel Corporation), 3,4-epoxy Cyclohexylmethyl (meth) acrylate (for example, Cyclomer (registered trademark) A400; manufactured by Daicel Corporation), 3,4-epoxycyclohexylmethyl (meth) acrylate (for example, cyclomer ( registered trademark) M100 (manufactured by Daicel Corporation), the compound represented by the formula (BI), the compound represented by the formula (BII), and the like.
[식 (BI) 및 식 (BII) 중, Ra 및 Rb는, 서로 독립적으로, 수소 원자, 또는 탄소수 1∼4의 알킬기를 나타내고, 당해 알킬기에 포함되는 수소 원자는, 히드록시기에 의해 치환되어 있어도 된다.[In formulas (BI) and (BII), R a and R b each independently represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and the hydrogen atom contained in the alkyl group is substituted with a hydroxy group, there may be
Xa 및 Xb는, 서로 독립적으로, 단결합, *-Rc-, *-Rc-O-, *-Rc-S- 또는 *-Rc-NH-를 나타낸다.X a and X b each independently represent a single bond, *-R c -, *-R c -O-, *-R c -S- or *-R c -NH-.
Rc는 탄소수 1∼6의 알칸디일기를 나타낸다.R c represents an alkanediyl group having 1 to 6 carbon atoms.
*은 O와의 결합손을 나타낸다.]* indicates a bond with O.]
탄소수 1∼4의 알킬기로서는, 예를 들면, 메틸기, 에틸기, n-프로필기, 이소프로필기, n-부틸기, sec-부틸기, tert-부틸기 등을 들 수 있다.Examples of the alkyl group having 1 to 4 carbon atoms include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group and tert-butyl group.
수소 원자가 히드록시기에 의해 치환된 알킬기로서는, 예를 들면, 히드록시메틸기, 1-히드록시에틸기, 2-히드록시에틸기, 1-히드록시프로필기, 2-히드록시프로필기, 3-히드록시프로필기, 1-히드록시-1-메틸에틸기, 2-히드록시-1-메틸에틸기, 1-히드록시부틸기, 2-히드록시부틸기, 3-히드록시부틸기, 4-히드록시부틸기 등을 들 수 있다.Examples of the alkyl group in which a hydrogen atom is substituted by a hydroxy group include a hydroxymethyl group, 1-hydroxyethyl group, 2-hydroxyethyl group, 1-hydroxypropyl group, 2-hydroxypropyl group, and 3-hydroxypropyl group. , 1-hydroxy-1-methylethyl group, 2-hydroxy-1-methylethyl group, 1-hydroxybutyl group, 2-hydroxybutyl group, 3-hydroxybutyl group, 4-hydroxybutyl group, etc. can be heard
Ra 및 Rb로서는, 바람직하게는 수소 원자, 메틸기, 히드록시메틸기, 1-히드록시에틸기, 2-히드록시에틸기를 들 수 있고, 보다 바람직하게는 수소 원자, 메틸기를 들 수 있다.R a and R b preferably include a hydrogen atom, a methyl group, a hydroxymethyl group, a 1-hydroxyethyl group and a 2-hydroxyethyl group, and more preferably a hydrogen atom and a methyl group.
알칸디일기로서는, 예를 들면, 메틸렌기, 에틸렌기, 프로판-1,2-디일기, 프로판-1,3-디일기, 부탄-1,4-디일기, 펜탄-1,5-디일기, 헥산-1,6-디일기 등을 들 수 있다.Examples of the alkanediyl group include a methylene group, an ethylene group, a propane-1,2-diyl group, a propane-1,3-diyl group, a butane-1,4-diyl group, and a pentane-1,5-diyl group. , a hexane-1,6-diyl group, and the like.
Xa 및 Xb로서는, 바람직하게는 단결합, 메틸렌기, 에틸렌기, *-CH2-O-(*은 O와의 결합손을 나타냄)기, *-CH2CH2-O-기를 들 수 있고, 보다 바람직하게는 단결합, *-CH2CH2-O-기를 들 수 있다(*은 O와의 결합손을 나타낸다.).As X a and X b , Preferably, a single bond, a methylene group, an ethylene group, *-CH 2 -O- (* represents a bond with O) group, and *-CH 2 CH 2 -O- group are mentioned. and more preferably a single bond and *-CH 2 CH 2 -O- group (* represents a bond with O).
식 (BI)로 나타내어지는 화합물로서는, 식 (BI-1)∼식 (BI-15)의 어느 것으로 나타내어지는 화합물 등을 들 수 있다. 그 중에서도 식 (BI-1), 식 (BI-3), 식 (BI-5), 식 (BI-7), 식 (BI-9) 및 식 (BI-11)∼식 (BI-15)로 나타내어지는 화합물이 바람직하고, 식 (BI-1), 식 (BI-7), 식 (BI-9) 및 식 (BI-15)로 나타내어지는 화합물이 보다 바람직하다.Examples of the compound represented by the formula (BI) include compounds represented by any of formulas (BI-1) to (BI-15). Among them, formula (BI-1), formula (BI-3), formula (BI-5), formula (BI-7), formula (BI-9) and formula (BI-11) to formula (BI-15) The compound represented by is preferable, and the compound represented by a formula (BI-1), a formula (BI-7), a formula (BI-9), and a formula (BI-15) is more preferable.
식 (BII)로 나타내어지는 화합물로서는, 식 (BII-1)∼식 (BII-15)의 어느 것으로 나타내어지는 화합물 등을 들 수 있고, 그 중에서도 바람직하게는 식 (BII-1), 식 (BII-3), 식 (BII-5), 식 (BII-7), 식 (BII-9) 및 식 (BII-11)∼식 (BII-15)로 나타내어지는 화합물을 들 수 있고, 보다 바람직하게는 식 (BII-1), 식 (BII-7), 식 (BII-9) 및 식 (BII-15)로 나타내어지는 화합물을 들 수 있다.Examples of the compound represented by formula (BII) include compounds represented by any of formulas (BII-1) to (BII-15), and among these, formulas (BII-1) and formula (BII) are preferred. -3), a compound represented by a formula (BII-5), a formula (BII-7), a formula (BII-9) and a formula (BII-11) to a formula (BII-15), more preferably is a compound represented by formula (BII-1), formula (BII-7), formula (BII-9) and formula (BII-15).
식 (BI)로 나타내어지는 화합물 및 식 (BII)로 나타내어지는 화합물은, 각각 단독으로 이용해도 되고, 식 (BI)로 나타내어지는 화합물과 식 (BII)로 나타내어지는 화합물을 병용해도 된다. 이들을 병용하는 경우, 식 (BI)로 나타내어지는 화합물 및 식 (BII)로 나타내어지는 화합물의 함유 비율은 몰 기준으로, 바람직하게는 5:95∼95:5이고, 보다 바람직하게는 10:90∼90:10이고, 더 바람직하게는 20:80∼80:20이다.The compound represented by the formula (BI) and the compound represented by the formula (BII) may be used alone, respectively, or the compound represented by the formula (BI) and the compound represented by the formula (BII) may be used in combination. When these are used together, the content ratio of the compound represented by the formula (BI) and the compound represented by the formula (BII) is, on a molar basis, preferably 5:95 to 95:5, more preferably 10:90 to It is 90:10, More preferably, it is 20:80-80:20.
옥세타닐기와 에틸렌성 불포화 결합을 갖는 단량체 (b2)로서는, 옥세타닐기와 (메타)아크릴로일옥시기를 갖는 단량체가 보다 바람직하다. 단량체 (b2)로서는, 예를 들면, 3-메틸-3-(메타)아크릴로일옥시메틸옥세탄, 3-에틸-3-(메타)아크릴로일옥시메틸옥세탄, 3-메틸-3-(메타)아크릴로일옥시에틸옥세탄, 3-에틸-3-(메타)아크릴로일옥시에틸옥세탄 등을 들 수 있다.As a monomer (b2) which has an oxetanyl group and an ethylenically unsaturated bond, the monomer which has an oxetanyl group and a (meth)acryloyloxy group is more preferable. As the monomer (b2), for example, 3-methyl-3-(meth)acryloyloxymethyloxetane, 3-ethyl-3-(meth)acryloyloxymethyloxetane, 3-methyl-3- (meth)acryloyloxyethyloxetane, 3-ethyl-3-(meth)acryloyloxyethyloxetane, etc. are mentioned.
테트라히드로푸릴기와 에틸렌성 불포화 결합을 갖는 단량체 (b3)으로서는, 테트라히드로푸릴기와 (메타)아크릴로일옥시기를 갖는 단량체가 보다 바람직하다. 단량체 (b3)으로서는, 예를 들면, 테트라히드로푸르푸릴아크릴레이트(예를 들면, 비스코트 V#150, 오사카유기화학공업(주) 제), 테트라히드로푸르푸릴메타크릴레이트 등을 들 수 있다.As the monomer (b3) having a tetrahydrofuryl group and an ethylenically unsaturated bond, a monomer having a tetrahydrofuryl group and a (meth)acryloyloxy group is more preferable. As a monomer (b3), tetrahydrofurfuryl acrylate (For example, Viscoat V#150, Osaka Organic Chemical Co., Ltd. product), tetrahydrofurfuryl methacrylate etc. are mentioned, for example.
단량체 (c)로서는, 예를 들면, 메틸(메타)아크릴레이트, 에틸(메타)아크릴레이트, n-부틸(메타)아크릴레이트, sec-부틸(메타)아크릴레이트, tert-부틸(메타)아크릴레이트, 2-에틸헥실(메타)아크릴레이트, 도데실(메타)아크릴레이트, 라우릴(메타)아크릴레이트, 스테아릴(메타)아크릴레이트, 시클로펜틸(메타)아크릴레이트, 시클로헥실(메타)아크릴레이트, 2-메틸시클로헥실(메타)아크릴레이트, 트리시클로[5.2.1.02,6]데칸-8-일(메타)아크릴레이트(당해 기술 분야에서는, 관용명으로서 「디시클로펜타닐(메타)아크릴레이트」라고 불리고 있다. 또, 「트리시클로데실(메타)아크릴레이트」라고 하는 경우가 있음), 트리시클로[5.2.1.02,6]데칸-9-일(메타)아크릴레이트, 트리시클로[5.2.1.02,6]데센-8-일(메타)아크릴레이트(당해 기술 분야에서는, 관용명으로서 「디시클로펜테닐(메타)아크릴레이트」라고 불리고 있음), 트리시클로[5.2.1.02,6]데센-9-일(메타)아크릴레이트, 디시클로펜타닐옥시에틸(메타)아크릴레이트, 이소보르닐(메타)아크릴레이트, 아다만틸(메타)아크릴레이트, 알릴(메타)아크릴레이트, 프로파르길(메타)아크릴레이트, 페닐(메타)아크릴레이트, 나프틸(메타)아크릴레이트 및 벤질(메타)아크릴레이트 등의 (메타)아크릴산 에스테르;As the monomer (c), for example, methyl (meth) acrylate, ethyl (meth) acrylate, n-butyl (meth) acrylate, sec-butyl (meth) acrylate, tert-butyl (meth) acrylate , 2-ethylhexyl (meth) acrylate, dodecyl (meth) acrylate, lauryl (meth) acrylate, stearyl (meth) acrylate, cyclopentyl (meth) acrylate, cyclohexyl (meth) acrylate , 2-methylcyclohexyl (meth) acrylate, tricyclo [5.2.1.0 2,6 ] decan-8-yl (meth) acrylate (in the technical field, as a common name, "dicyclopentanyl (meth) acrylate" Also called "tricyclodecyl (meth)acrylate" in some cases), tricyclo[5.2.1.0 2,6 ]decan-9-yl (meth)acrylate, tricyclo[5.2.1.0 2,6 ]decene-8-yl (meth)acrylate (in the technical field, commonly referred to as "dicyclopentenyl (meth)acrylate"), tricyclo[5.2.1.0 2,6 ]decene- 9-yl (meth) acrylate, dicyclopentanyloxyethyl (meth) acrylate, isobornyl (meth) acrylate, adamantyl (meth) acrylate, allyl (meth) acrylate, propargyl (meth) ) (meth)acrylic acid esters such as acrylate, phenyl (meth)acrylate, naphthyl (meth)acrylate and benzyl (meth)acrylate;
2-히드록시에틸(메타)아크릴레이트 및 2-히드록시프로필(메타)아크릴레이트 등의 히드록시기 함유 (메타)아크릴산 에스테르;hydroxy group-containing (meth)acrylic acid esters such as 2-hydroxyethyl (meth)acrylate and 2-hydroxypropyl (meth)acrylate;
말레산 디에틸, 푸마르산 디에틸 및 이타콘산 디에틸 등의 디카르본산 디에스테르;dicarboxylic acid diesters such as diethyl maleate, diethyl fumarate, and diethyl itaconic acid;
비시클로[2.2.1]헵트-2-엔, 5-메틸비시클로[2.2.1]헵트-2-엔, 5-에틸비시클로[2.2.1]헵트-2-엔, 5-히드록시비시클로[2.2.1]헵트-2-엔, 5-히드록시메틸비시클로[2.2.1]헵트-2-엔, 5-(2'-히드록시에틸)비시클로[2.2.1]헵트-2-엔, 5-메톡시비시클로[2.2.1]헵트-2-엔, 5-에톡시비시클로[2.2.1]헵트-2-엔, 5,6-디히드록시비시클로[2.2.1]헵트-2-엔, 5,6-디(히드록시메틸)비시클로[2.2.1]헵트-2-엔, 5,6-디(2'-히드록시에틸)비시클로[2.2.1]헵트-2-엔, 5,6-디메톡시비시클로[2.2.1]헵트-2-엔, 5,6-디에톡시비시클로[2.2.1]헵트-2-엔, 5-히드록시-5-메틸비시클로[2.2.1]헵트-2-엔, 5-히드록시-5-에틸비시클로[2.2.1]헵트-2-엔, 5-히드록시메틸-5-메틸비시클로[2.2.1]헵트-2-엔, 5-tert-부톡시카르보닐비시클로[2.2.1]헵트-2-엔, 5-시클로헥실옥시카르보닐비시클로[2.2.1]헵트-2-엔, 5-페녹시카르보닐비시클로[2.2.1]헵트-2-엔, 5,6-비스(tert-부톡시카르보닐)비시클로[2.2.1]헵트-2-엔 및 5,6-비스(시클로헥실옥시카르보닐)비시클로[2.2.1]헵트-2-엔 등의 비시클로 불포화 화합물;Bicyclo[2.2.1]hept-2-ene, 5-methylbicyclo[2.2.1]hept-2-ene, 5-ethylbicyclo[2.2.1]hept-2-ene, 5-hydroxybi Cyclo[2.2.1]hept-2-ene, 5-hydroxymethylbicyclo[2.2.1]hept-2-ene, 5-(2'-hydroxyethyl)bicyclo[2.2.1]hept-2 -ene, 5-methoxybicyclo[2.2.1]hept-2-ene, 5-ethoxybicyclo[2.2.1]hept-2-ene, 5,6-dihydroxybicyclo[2.2.1]hept -2-ene, 5,6-di(hydroxymethyl)bicyclo[2.2.1]hept-2-ene, 5,6-di(2'-hydroxyethyl)bicyclo[2.2.1]hept- 2-ene, 5,6-dimethoxybicyclo[2.2.1]hept-2-ene, 5,6-diethoxybicyclo[2.2.1]hept-2-ene, 5-hydroxy-5-methyl Bicyclo[2.2.1]hept-2-ene, 5-hydroxy-5-ethylbicyclo[2.2.1]hept-2-ene, 5-hydroxymethyl-5-methylbicyclo[2.2.1] Hept-2-ene, 5-tert-butoxycarbonylbicyclo[2.2.1]hept-2-ene, 5-cyclohexyloxycarbonylbicyclo[2.2.1]hept-2-ene, 5-phenoxy Cycarbonylbicyclo[2.2.1]hept-2-ene, 5,6-bis(tert-butoxycarbonyl)bicyclo[2.2.1]hept-2-ene and 5,6-bis(cyclohexylox) bicyclo unsaturated compounds such as cycarbonyl)bicyclo[2.2.1]hept-2-ene;
N-페닐말레이미드, N-시클로헥실말레이미드, N-벤질말레이미드, N-숙신이미딜-3-말레이미드벤조에이트, N-숙신이미딜-4-말레이미드부티레이트, N-숙신이미딜-6-말레이미드카프로에이트, N-숙신이미딜-3-말레이미드프로피오네이트 및 N-(9-아크리디닐)말레이미드 등의 디카르보닐이미드 유도체;N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, N-succinimidyl-3-maleimidebenzoate, N-succinimidyl-4-maleimidebutyrate, N-succinimidyl- dicarbonylimide derivatives such as 6-maleimide caproate, N-succinimidyl-3-maleimide propionate and N-(9-acridinyl)maleimide;
스티렌, o-메틸스티렌, m-메틸스티렌, p-메틸스티렌, 비닐톨루엔 및 p-메톡시스티렌 등의 비닐기 함유 방향족 화합물; (메타)아크릴로니트릴 등의 비닐기 함유 니트릴; 염화비닐 및 염화비닐리덴 등의 할로겐화 탄화수소; (메타)아크릴아미드 등의 비닐기 함유 아미드; 아세트산 비닐 등의 에스테르; 1,3-부타디엔, 이소프렌 및 2,3-디메틸-1,3-부타디엔 등의 디엔; 등을 들 수 있다.vinyl group-containing aromatic compounds such as styrene, o-methylstyrene, m-methylstyrene, p-methylstyrene, vinyltoluene and p-methoxystyrene; vinyl group-containing nitriles such as (meth)acrylonitrile; halogenated hydrocarbons such as vinyl chloride and vinylidene chloride; vinyl group-containing amides such as (meth)acrylamide; esters such as vinyl acetate; dienes such as 1,3-butadiene, isoprene and 2,3-dimethyl-1,3-butadiene; and the like.
이들 중, 공중합 반응성 및 내열성의 점에서, 스티렌, 비닐톨루엔, 트리시클로[5.2.1.02,6]데칸-8-일(메타)아크릴레이트, 트리시클로[5.2.1.02,6]데칸-9-일(메타)아크릴레이트, 트리시클로[5.2.1.02,6]데센-8-일(메타)아크릴레이트, 트리시클로[5.2.1.02,6]데센-9-일(메타)아크릴레이트, N-페닐말레이미드, N-시클로헥실말레이미드, N-벤질말레이미드, 비시클로[2.2.1]헵트-2-엔 및 벤질(메타)아크릴레이트 등이 바람직하다.Among these, from the viewpoint of copolymerization reactivity and heat resistance, styrene, vinyltoluene, tricyclo[5.2.1.0 2,6 ]decan-8-yl (meth)acrylate, and tricyclo[5.2.1.0 2,6 ]decane-9 -yl (meth) acrylate, tricyclo [5.2.1.0 2,6 ] decen-8-yl (meth) acrylate, tricyclo [5.2.1.0 2,6 ] decen-9-yl (meth) acrylate, N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, bicyclo[2.2.1]hept-2-ene, benzyl (meth)acrylate and the like are preferable.
수지 [K1]에 있어서, 각각에 유래하는 구조단위의 비율은, 수지 [K1]을 구성하는 전체 구조단위 중,In the resin [K1], the ratio of the structural units derived from each of the total structural units constituting the resin [K1],
(a)에 유래하는 구조단위; 2∼60 몰%a structural unit derived from (a); 2-60 mol%
(b)에 유래하는 구조단위; 40∼98 몰%a structural unit derived from (b); 40-98 mol%
인 것이 바람직하고,It is preferable that
(a)에 유래하는 구조단위; 10∼50 몰%a structural unit derived from (a); 10-50 mol%
(b)에 유래하는 구조단위; 50∼90 몰%a structural unit derived from (b); 50-90 mol%
인 것이 보다 바람직하다.It is more preferable that
수지 [K1]의 구조단위의 비율이 상기의 범위에 있으면, 착색 수지 조성물의 보존 안정성, 착색 패턴을 형성할 때의 현상성, 및 얻어지는 광학 필터의 내용제성이 우수한 경향이 있다.When the ratio of the structural unit of resin [K1] exists in the said range, there exists a tendency excellent in the storage stability of a colored resin composition, developability at the time of forming a colored pattern, and the solvent resistance of the optical filter obtained.
수지 [K1]은, 예를 들면, 문헌 「고분자 합성의 실험법」(오츠 타카유키 저 발행소 (주)화학동인 제1판 제1쇄 1972년 3월 1일 발행)에 기재된 방법 및 당해 문헌에 기재된 인용문헌을 참고로 하여 제조할 수 있다.Resin [K1] is, for example, the method described in the document "Experimental Methods for Polymer Synthesis" (published by Takayuki Otsu, Chemical Dongin, 1st Edition, 1st Edition, March 1, 1972) and citations described in the document It can be prepared with reference to the literature.
구체적으로는 (a) 및 (b)의 소정량, 중합개시제 및 용제 등을 반응 용기 중에 넣어, 예를 들면, 질소에 의해 산소를 치환함으로써, 탈산소 분위기로 하고, 교반하면서, 가열 및 보온하는 방법을 들 수 있다. 또한, 여기에서 이용되는 중합개시제 및 용제 등은, 특별히 한정되지 않고, 당해 분야에서 통상 사용되고 있는 것을 사용할 수 있다. 예를 들면, 중합개시제로서는 아조 화합물(2,2'-아조비스이소부티로니트릴, 2,2'-아조비스(2,4-디메틸발레로니트릴) 등)이나 유기 과산화물(벤조일퍼옥사이드 등)을 들 수 있으며, 용제로서는, 각 모노머를 용해하는 것이면 되고, 본 발명의 착색 수지 조성물의 용제 (E)로서 후술하는 용제 등을 들 수 있다.Specifically, a predetermined amount of (a) and (b), a polymerization initiator, a solvent, etc. are put in a reaction vessel, for example, by replacing oxygen with nitrogen, a deoxidized atmosphere is created, and heating and keeping warm while stirring. method can be found. In addition, the polymerization initiator, a solvent, etc. used here are not specifically limited, What is normally used in the said field|area can be used. For example, as a polymerization initiator, an azo compound (2,2'-azobisisobutyronitrile, 2,2'-azobis(2,4-dimethylvaleronitrile), etc.) or an organic peroxide (benzoyl peroxide etc.) These are mentioned, What is necessary is just to melt|dissolve each monomer as a solvent, The solvent etc. which are mentioned later as a solvent (E) of the colored resin composition of this invention are mentioned.
또한, 얻어진 공중합체는, 반응 후의 용액을 그대로 사용해도 되고, 농축 또는 희석한 용액을 사용해도 되고, 재침전 등의 방법으로 고체(분체(粉體))로서 취출한 것을 사용해도 된다. 특히, 이 중합시에 용제로서, 본 발명의 착색 수지 조성물에 포함되는 용제를 사용함으로써, 반응 후의 용액을 그대로 본 발명의 착색 수지 조성물의 조제에 사용할 수 있기 때문에, 본 발명의 착색 수지 조성물의 제조 공정을 간략화할 수 있다.In addition, the obtained copolymer may use the solution after reaction as it is, may use the concentrated or diluted solution, and may use what was taken out as a solid (powder) by methods, such as reprecipitation. In particular, by using the solvent contained in the colored resin composition of the present invention as a solvent at the time of this polymerization, the solution after the reaction can be used as it is for preparation of the colored resin composition of the present invention, so production of the colored resin composition of the present invention The process can be simplified.
수지 [K2]에 있어서, 각각에 유래하는 구조단위의 비율은, 수지 [K2]를 구성하는 전체 구조단위 중,In the resin [K2], the ratio of the structural units derived from each of the total structural units constituting the resin [K2],
(a)에 유래하는 구조단위; 2∼45 몰%a structural unit derived from (a); 2-45 mol%
(b)에 유래하는 구조단위; 2∼95 몰%a structural unit derived from (b); 2-95 mol%
(c)에 유래하는 구조단위; 1∼65 몰%a structural unit derived from (c); 1-65 mol%
인 것이 바람직하고,It is preferable that
(a)에 유래하는 구조단위; 5∼40 몰%a structural unit derived from (a); 5-40 mol%
(b)에 유래하는 구조단위; 5∼80 몰%a structural unit derived from (b); 5-80 mol%
(c)에 유래하는 구조단위; 5∼60 몰%a structural unit derived from (c); 5-60 mol%
인 것이 보다 바람직하다.It is more preferable that
수지 [K2]의 구조단위의 비율이 상기의 범위에 있으면, 착색 수지 조성물의 보존 안정성, 착색 패턴을 형성할 때의 현상성, 및, 얻어지는 광학 필터의 내용제성, 내열성 및 기계 강도가 우수한 경향이 있다.When the ratio of the structural unit of the resin [K2] is within the above range, the storage stability of the colored resin composition, the developability when forming a colored pattern, and the solvent resistance, heat resistance and mechanical strength of the resulting optical filter tend to be excellent. have.
수지 [K2]는, 예를 들면, 수지 [K1]의 제조 방법으로서 기재한 방법과 마찬가지로 제조할 수 있다.The resin [K2] can be produced, for example, in the same manner as described as the method for producing the resin [K1].
수지 [K3]에 있어서, 각각에 유래하는 구조단위의 비율은, 수지 [K3]을 구성하는 전체 구조단위 중,In the resin [K3], the ratio of the structural units derived from each of the total structural units constituting the resin [K3],
(a)에 유래하는 구조단위; 2∼60 몰%a structural unit derived from (a); 2-60 mol%
(c)에 유래하는 구조단위; 40∼98 몰%a structural unit derived from (c); 40-98 mol%
인 것이 바람직하고,It is preferable that
(a)에 유래하는 구조단위; 10∼50 몰%a structural unit derived from (a); 10-50 mol%
(c)에 유래하는 구조단위; 50∼90 몰%a structural unit derived from (c); 50-90 mol%
인 것이 보다 바람직하다.It is more preferable that
수지 [K3]은, 예를 들면, 수지 [K1]의 제조 방법으로서 기재한 방법과 마찬가지로 제조할 수 있다.The resin [K3] can be produced, for example, in the same manner as the method described as the method for producing the resin [K1].
수지 [K4]는, (a)와 (c)의 공중합체를 얻어, (b)가 갖는 탄소수 2∼4의 환상 에테르를 (a)가 갖는 카르본산 및/또는 카르본산 무수물에 부가시킴으로써 제조할 수 있다.Resin [K4] can be prepared by obtaining the copolymer of (a) and (c), and adding the cyclic ether having 2 to 4 carbon atoms of (b) to the carboxylic acid and/or carboxylic acid anhydride of (a). can
먼저 (a)와 (c)의 공중합체를, 수지 [K1]의 제조 방법으로서 기재한 방법과 마찬가지로 제조한다. 이 경우, 각각에 유래하는 구조단위의 비율은, 수지 [K3]에서 든 것과 동일한 비율인 것이 바람직하다.First, the copolymer of (a) and (c) is produced in the same manner as described as the method for producing the resin [K1]. In this case, it is preferable that the ratio of the structural unit derived from each is the same ratio as that given in the resin [K3].
다음으로, 상기 공중합체 중의 (a)에 유래하는 카르본산 및/또는 카르본산 무수물의 일부에, (b)가 갖는 탄소수 2∼4의 환상 에테르를 반응시킨다.Next, the C2-C4 cyclic ether which (b) has is made to react with a part of the carboxylic acid and/or carboxylic acid anhydride derived from (a) in the said copolymer.
(a)와 (c)의 공중합체의 제조에 계속해서, 플라스크 내 분위기를 질소로부터 공기로 치환하고, (b), 카르본산 또는 카르본산 무수물과 환상 에테르와의 반응 촉매(예를 들면 트리스(디메틸아미노메틸)페놀 등) 및 중합금지제(예를 들면 하이드로퀴논 등) 등을 플라스크 내에 넣어, 예를 들면, 60∼130℃에서, 1∼10시간 반응함으로써, 수지 [K4]를 제조할 수 있다.Continuing with the preparation of the copolymer of (a) and (c), the atmosphere in the flask is substituted with air from nitrogen, and (b), a reaction catalyst between carboxylic acid or carboxylic acid anhydride and a cyclic ether (e.g., tris ( dimethylaminomethyl)phenol) and a polymerization inhibitor (such as hydroquinone) are placed in a flask and reacted at, for example, 60 to 130° C. for 1 to 10 hours to produce resin [K4]. have.
(b)의 사용량은, (a) 100 몰에 대하여, 5∼80 몰이 바람직하고, 보다 바람직하게는 10∼75 몰이다. 이 범위로 함으로써, 착색 수지 조성물의 보존 안정성, 패턴을 형성할 때의 현상성, 및, 얻어지는 패턴의 내용제성, 내열성, 기계 강도 및 감도의 밸런스가 양호해지는 경향이 있다. 환상 에테르의 반응성이 높아, 미반응의 (b)가 잔존하기 어려운 것으로부터, 수지 [K4]에 이용하는 (b)로서는 (b1)이 바람직하고, (b1-1)이 더 바람직하다.As for the usage-amount of (b), 5-80 mol is preferable with respect to (a) 100 mol, More preferably, it is 10-75 mol. By setting it as this range, there exists a tendency for the balance of the storage stability of a colored resin composition, the developability at the time of forming a pattern, and solvent resistance, heat resistance, mechanical strength, and a sensitivity of the pattern obtained to become favorable. Since the reactivity of a cyclic ether is high and unreacted (b) hardly remains, as (b) used for resin [K4], (b1) is preferable and (b1-1) is more preferable.
상기 반응 촉매의 사용량은, (a), (b) 및 (c)의 합계량 100 질량부에 대하여 0.001∼5 질량부가 바람직하다. 상기 중합금지제의 사용량은, (a), (b) 및 (c)의 합계량 100 질량부에 대하여 0.001∼5 질량부가 바람직하다.As for the usage-amount of the said reaction catalyst, 0.001-5 mass parts is preferable with respect to 100 mass parts of total amounts of (a), (b), and (c). As for the usage-amount of the said polymerization inhibitor, 0.001-5 mass parts is preferable with respect to 100 mass parts of total amounts of (a), (b), and (c).
도입 방법, 반응 온도 및 시간 등의 반응 조건은, 제조 설비나 중합에 의한 발열량 등을 고려하여 적절히 조정할 수 있다. 또한, 중합 조건과 마찬가지로, 제조 설비나 중합에 의한 발열량 등을 고려하여, 도입 방법이나 반응 온도를 적절히 조정할 수 있다.Reaction conditions, such as an introduction method, reaction temperature, and time, can be suitably adjusted in consideration of manufacturing equipment, the amount of heat generated by polymerization, and the like. In addition, similarly to polymerization conditions, the introduction method and reaction temperature can be adjusted suitably in consideration of manufacturing equipment, the calorific value by polymerization, etc.
수지 [K5]는, 제 1 단계로서, 상술한 수지 [K1]의 제조 방법과 마찬가지로 하여, (b)와 (c)의 공중합체를 얻는다. 상기와 마찬가지로, 얻어진 공중합체는, 반응 후의 용액을 그대로 사용해도 되고, 농축 또는 희석한 용액을 사용해도 되고, 재침전 등의 방법으로 고체(분체)로서 취출한 것을 사용해도 된다.The resin [K5] is the first step, in the same manner as in the above-described method for producing the resin [K1], to obtain a copolymer of (b) and (c). Similarly to the above, the obtained copolymer may use the solution after reaction as it is, may use a concentrated or diluted solution, and may use what was taken out as a solid (powder) by methods, such as reprecipitation.
(b) 및 (c)에 유래하는 구조단위의 비율은, 상기의 공중합체를 구성하는 전체 구조단위의 합계 몰수에 대하여, 각각,The ratio of the structural units derived from (b) and (c) is, respectively, with respect to the total number of moles of all the structural units constituting the copolymer,
(b)에 유래하는 구조단위; 5∼95 몰%a structural unit derived from (b); 5-95 mol%
(c)에 유래하는 구조단위; 5∼95 몰%a structural unit derived from (c); 5-95 mol%
인 것이 바람직하고,It is preferable that
(b)에 유래하는 구조단위; 10∼90 몰%a structural unit derived from (b); 10-90 mol%
(c)에 유래하는 구조단위; 10∼90 몰%a structural unit derived from (c); 10-90 mol%
인 것이 보다 바람직하다.It is more preferable that
또한, 수지 [K4]의 제조 방법과 마찬가지의 조건으로, (b)와 (c)의 공중합체가 갖는 (b)에 유래하는 환상 에테르에, (a)가 갖는 카르본산 또는 카르본산 무수물을 반응시킴으로써, 수지 [K5]를 얻을 수 있다.Further, the carboxylic acid or carboxylic acid anhydride of (a) is reacted with the cyclic ether derived from (b) which the copolymer of (b) and (c) has under the same conditions as in the production method of the resin [K4]. By doing this, resin [K5] can be obtained.
상기의 공중합체에 반응시키는 (a)의 사용량은, (b) 100 몰에 대하여, 5∼80 몰이 바람직하다. 환상 에테르의 반응성이 높아, 미반응의 (b)가 잔존하기 어려운 것으로부터, 수지 [K5]에 이용하는 (b)로서는 (b1)이 바람직하고, (b1-1)이 더 바람직하다.As for the usage-amount of (a) made to react with said copolymer, 5-80 mol is preferable with respect to 100 mol of (b). Since the reactivity of a cyclic ether is high and unreacted (b) hardly remains, as (b) used for resin [K5], (b1) is preferable and (b1-1) is more preferable.
수지 [K6]은, 수지 [K5]에, 추가로 카르본산 무수물을 반응시킨 수지이다. 환상 에테르와 카르본산 또는 카르본산 무수물과의 반응에 의해 발생하는 히드록시기에, 카르본산 무수물을 반응시킨다.Resin [K6] is resin in which resin [K5] was further made to react with carboxylic acid anhydride. A carboxylic acid anhydride is made to react with the hydroxyl group which generate|occur|produces by reaction of a cyclic ether and carboxylic acid or carboxylic acid anhydride.
카르본산 무수물로서는 무수 말레산, 시트라콘산 무수물, 이타콘산 무수물, 3-비닐프탈산 무수물, 4-비닐프탈산 무수물, 3,4,5,6-테트라히드로프탈산 무수물, 1,2,3,6-테트라히드로프탈산 무수물, 디메틸테트라히드로프탈산 무수물, 5,6-디카르복시비시클로[2.2.1]헵트-2-엔 무수물 등을 들 수 있다. 카르본산 무수물의 사용량은, (a)의 사용량 1 몰에 대하여, 0.5∼1 몰이 바람직하다.Examples of the carboxylic anhydride include maleic anhydride, citraconic anhydride, itaconic anhydride, 3-vinyl phthalic anhydride, 4-vinyl phthalic anhydride, 3,4,5,6-tetrahydrophthalic anhydride, 1,2,3,6- tetrahydrophthalic anhydride, dimethyltetrahydrophthalic anhydride, 5,6-dicarboxybicyclo[2.2.1]hept-2-ene anhydride, and the like. As for the usage-amount of carboxylic acid anhydride, 0.5-1 mol is preferable with respect to 1 mol of usage-amounts of (a).
구체적인 수지 (B)로서는 3,4-에폭시시클로헥실메틸(메타)아크릴레이트/(메타)아크릴산 공중합체, 3,4-에폭시트리시클로[5.2.1.02,6]데실아크릴레이트/(메타)아크릴산 공중합체 등의 수지 [K1]; 글리시딜(메타)아크릴레이트/벤질(메타)아크릴레이트/(메타)아크릴산 공중합체, 글리시딜(메타)아크릴레이트/스티렌/(메타)아크릴산 공중합체, 3,4-에폭시트리시클로[5.2.1.02,6]데실아크릴레이트/(메타)아크릴산/N-시클로헥실말레이미드 공중합체, 3,4-에폭시트리시클로[5.2.1.02,6]데실아크릴레이트/(메타)아크릴산/N-시클로헥실말레이미드/2-히드록시에틸(메타)아크릴레이트 공중합체, 3-메틸-3-(메타)아크릴로일옥시메틸옥세탄/(메타)아크릴산/스티렌 공중합체 등의 수지 [K2]; 벤질(메타)아크릴레이트/(메타)아크릴산 공중합체, 스티렌/(메타)아크릴산 공중합체 등의 수지 [K3]; 벤질(메타)아크릴레이트/(메타)아크릴산 공중합체에 글리시딜(메타)아크릴레이트를 부가시킨 수지, 트리시클로데실(메타)아크릴레이트/스티렌/(메타)아크릴산 공중합체에 글리시딜(메타)아크릴레이트를 부가시킨 수지, 트리시클로데실(메타)아크릴레이트/벤질(메타)아크릴레이트/(메타)아크릴산 공중합체에 글리시딜(메타)아크릴레이트를 부가시킨 수지 등의 수지 [K4]; 트리시클로데실(메타)아크릴레이트/글리시딜(메타)아크릴레이트의 공중합체에 (메타)아크릴산을 반응시킨 수지, 트리시클로데실(메타)아크릴레이트/스티렌/글리시딜(메타)아크릴레이트의 공중합체에 (메타)아크릴산을 반응시킨 수지 등의 수지 [K5]; 트리시클로데실(메타)아크릴레이트/글리시딜(메타)아크릴레이트의 공중합체에 (메타)아크릴산을 반응시킨 수지에 추가로 테트라히드로프탈산 무수물을 반응시킨 수지 등의 수지 [K6] 등을 들 수 있다.Specific examples of the resin (B) include 3,4-epoxycyclohexylmethyl (meth)acrylate/(meth)acrylic acid copolymer, 3,4-epoxytricyclo[5.2.1.0 2,6 ]decylacrylate/(meth)acrylic acid resins such as copolymer [K1]; Glycidyl (meth) acrylate / benzyl (meth) acrylate / (meth) acrylic acid copolymer, glycidyl (meth) acrylate / styrene / (meth) acrylic acid copolymer, 3,4-epoxytricyclo [5.2 .1.0 2,6 ]decylacrylate/(meth)acrylic acid/N-cyclohexylmaleimide copolymer, 3,4-epoxytricyclo[5.2.1.0 2,6 ]decylacrylate/(meth)acrylic acid/N- Resin [K2], such as a cyclohexyl maleimide/2-hydroxyethyl (meth)acrylate copolymer and 3-methyl-3- (meth)acryloyloxymethyloxetane/(meth)acrylic acid/styrene copolymer; resins [K3] such as benzyl (meth)acrylate/(meth)acrylic acid copolymer and styrene/(meth)acrylic acid copolymer; A resin obtained by adding glycidyl (meth) acrylate to a benzyl (meth) acrylate/(meth) acrylic acid copolymer, and glycidyl (meth) to a tricyclodecyl (meth) acrylate/styrene/(meth)acrylic acid copolymer ) Resin to which acrylate was added, resin [K4], such as a resin which added glycidyl (meth)acrylate to tricyclodecyl (meth)acrylate/benzyl (meth)acrylate/(meth)acrylic acid copolymer; A resin obtained by reacting (meth)acrylic acid with a copolymer of tricyclodecyl (meth)acrylate/glycidyl (meth)acrylate, tricyclodecyl (meth)acrylate/styrene/glycidyl (meth)acrylate resin [K5] such as a resin obtained by reacting (meth)acrylic acid with a copolymer; and resin [K6] such as a resin obtained by reacting a copolymer of tricyclodecyl (meth)acrylate/glycidyl (meth)acrylate with (meth)acrylic acid and further reacting with tetrahydrophthalic anhydride. have.
수지 (B)는 수지 [K1] 및 수지 [K2]인 것이 보다 바람직하고, 수지 [K1]인 것이 특히 바람직하다.The resin (B) is more preferably a resin [K1] and a resin [K2], and particularly preferably a resin [K1].
수지 (B)의 폴리스티렌 환산의 중량평균 분자량 (Mw)는, 바람직하게는 1,000 이상 100,000 이하이고, 보다 바람직하게는 2,000 이상 50,000 이하이고, 더 바람직하게는 3,000 이상 30,000 이하이다. 중량평균 분자량이 상기의 범위에 있으면, 미노광부의 현상액에 대한 용해성이 높아, 얻어지는 패턴의 잔막률이나 경도도 높은 경향이 있다.The weight average molecular weights (Mw) in terms of polystyrene of the resin (B) are preferably 1,000 or more and 100,000 or less, more preferably 2,000 or more and 50,000 or less, and still more preferably 3,000 or more and 30,000 or less. When a weight average molecular weight exists in said range, the solubility with respect to the developing solution of an unexposed part is high, and there exists a tendency for the residual film rate and hardness of the pattern obtained also to be high.
수지 (B)의 분산도 [중량평균 분자량 (Mw)/수평균 분자량 (Mn)]은, 바람직하게는 1 이상 6 이하이고, 보다 바람직하게는 1.001 이상 4 이하이고, 더 바람직하게는 1.01 이상 4 이하이다.The degree of dispersion of the resin (B) [weight average molecular weight (Mw)/number average molecular weight (Mn)] is preferably 1 or more and 6 or less, more preferably 1.001 or more and 4 or less, still more preferably 1.01 or more and 4 is below.
수지 (B)의 산가(고형분 환산값)는 바람직하게는 10 mg-KOH/g 이상 300 mg-KOH/g 이하이고, 보다 바람직하게는 20 mg-KOH/g 이상 250 mg-KOH/g 이하이고, 더 바람직하게는 25 mg-KOH/g 이상 200 mg-KOH/g 이하이고, 보다 더 바람직하게는 30 mg-KOH/g 이상 150 mg-KOH/g 이하이고, 특히 바람직하게는 60 mg-KOH/g 이상 135 mg-KOH/g 이하이다. 여기서 산가는 수지 1 g을 중화하는 데에 필요한 수산화칼륨의 양(mg)으로서 측정되는 값이며, 예를 들면 수산화칼륨 수용액을 이용하여 적정(滴定)함으로써 구할 수 있다.The acid value (in terms of solid content) of the resin (B) is preferably 10 mg-KOH/g or more and 300 mg-KOH/g or less, more preferably 20 mg-KOH/g or more and 250 mg-KOH/g or less, , more preferably 25 mg-KOH/g or more and 200 mg-KOH/g or less, even more preferably 30 mg-KOH/g or more and 150 mg-KOH/g or less, particularly preferably 60 mg-KOH/g or less. /g or more and 135 mg-KOH/g or less. Here, the acid value is a value measured as the amount (mg) of potassium hydroxide required to neutralize 1 g of the resin, and can be obtained by titration using, for example, an aqueous potassium hydroxide solution.
수지 (B)의 함유율은, 착색 수지 조성물의 고형분 100 질량% 중, 바람직하게는 5∼50 질량%이고, 보다 바람직하게는 10∼40 질량%이고, 더 바람직하게는 15∼30 질량%이다. 수지 (B)의 함유량이 상기의 범위에 있으면, 미노광부의 현상액에 대한 용해성이 높은 경향이 있다.In 100 mass % of solid content of a colored resin composition, content rate of resin (B) becomes like this. Preferably it is 5-50 mass %, More preferably, it is 10-40 mass %, More preferably, it is 15-30 mass %. When content of resin (B) exists in said range, there exists a tendency for the solubility with respect to the developing solution of an unexposed part to be high.
< 중합성 화합물 (C) ><Polymerizable compound (C)>
중합성 화합물 (C)는, 중합개시제 (D)로부터 발생한 활성 라디칼 및/또는 산에 의해서 중합할 수 있는 화합물이며, 예를 들면, 중합성의 에틸렌성 불포화 결합을 갖는 화합물 등을 들 수 있고, 바람직하게는 (메타)아크릴산 에스테르 화합물이다.The polymerizable compound (C) is a compound that can be polymerized with an active radical and/or an acid generated from the polymerization initiator (D), and examples thereof include compounds having a polymerizable ethylenically unsaturated bond, preferably Preferably, it is a (meth)acrylic acid ester compound.
에틸렌성 불포화 결합을 1개 갖는 중합성 화합물로서는, 예를 들면, 노닐페닐카르비톨아크릴레이트, 2-히드록시-3-페녹시프로필아크릴레이트, 2-에틸헥실카르비톨아크릴레이트, 2-히드록시에틸아크릴레이트, N-비닐피롤리돈 등, 및, 상술의 단량체 (a), 단량체 (b) 및 단량체 (c)를 들 수 있다.Examples of the polymerizable compound having one ethylenically unsaturated bond include nonylphenylcarbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexylcarbitol acrylate, and 2-hydroxy Ethyl acrylate, N-vinylpyrrolidone, etc., and the above-mentioned monomer (a), monomer (b), and monomer (c) are mentioned.
에틸렌성 불포화 결합을 2개 갖는 중합성 화합물로서는, 예를 들면, 1,6-헥산디올디(메타)아크릴레이트, 에틸렌글리콜디(메타)아크릴레이트, 네오펜틸글리콜디(메타)아크릴레이트, 트리에틸렌글리콜디(메타)아크릴레이트, 비스페놀 A의 비스(아크릴로일옥시에틸)에테르 및 3-메틸펜탄디올디(메타)아크릴레이트 등을 들 수 있다.Examples of the polymerizable compound having two ethylenically unsaturated bonds include 1,6-hexanediol di(meth)acrylate, ethylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate, tri Ethylene glycol di(meth)acrylate, the bis(acryloyloxyethyl) ether of bisphenol A, 3-methylpentanediol di(meth)acrylate, etc. are mentioned.
그 중에서도 중합성 화합물 (C)는, 에틸렌성 불포화 결합을 3개 이상 갖는 중합성 화합물인 것이 바람직하다. 이와 같은 중합성 화합물로서는, 예를 들면, 트리메틸올프로판트리(메타)아크릴레이트, 펜타에리스리톨트리(메타)아크릴레이트, 펜타에리스리톨테트라(메타)아크릴레이트, 디펜타에리스리톨펜타(메타)아크릴레이트, 디펜타에리스리톨헥사(메타)아크릴레이트, 트리펜타에리스리톨옥타(메타)아크릴레이트, 트리펜타에리스리톨헵타(메타)아크릴레이트, 테트라펜타에리스리톨데카(메타)아크릴레이트, 테트라펜타에리스리톨노나(메타)아크릴레이트, 트리스(2-(메타)아크릴로일옥시에틸)이소시아누레이트, 에틸렌글리콜 변성 펜타에리스리톨테트라(메타)아크릴레이트, 에틸렌글리콜 변성 디펜타에리스리톨헥사(메타)아크릴레이트, 프로필렌글리콜 변성 펜타에리스리톨테트라(메타)아크릴레이트, 프로필렌글리콜 변성 디펜타에리스리톨헥사(메타)아크릴레이트, 카프로락톤 변성 펜타에리스리톨테트라(메타)아크릴레이트 및 카프로락톤 변성 디펜타에리스리톨헥사(메타)아크릴레이트 등을 들 수 있고, 바람직하게는 디펜타에리스리톨펜타(메타)아크릴레이트 및 디펜타에리스리톨헥사(메타)아크릴레이트를 들 수 있다.Among them, the polymerizable compound (C) is preferably a polymerizable compound having three or more ethylenically unsaturated bonds. Examples of such a polymerizable compound include trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, and dipentaerythritol penta(meth)acrylate. Pentaerythritol hexa (meth) acrylate, tripentaerythritol octa (meth) acrylate, tripentaerythritol hepta (meth) acrylate, tetrapentaerythritol deca (meth) acrylate, tetrapentaerythritol nona (meth) acrylate, tris (2-(meth)acryloyloxyethyl)isocyanurate, ethylene glycol modified pentaerythritol tetra(meth)acrylate, ethylene glycol modified dipentaerythritol hexa(meth)acrylate, propylene glycol modified pentaerythritol tetra(meth) ) acrylate, propylene glycol-modified dipentaerythritol hexa (meth) acrylate, caprolactone-modified pentaerythritol tetra (meth) acrylate, and caprolactone-modified dipentaerythritol hexa (meth) acrylate, preferably Dipentaerythritol penta(meth)acrylate and dipentaerythritol hexa(meth)acrylate are mentioned.
중합성 화합물 (C)의 중량평균 분자량은, 바람직하게는 50 이상 4,000 이하이고, 보다 바람직하게는 70 이상 3,500 이하이고, 더 바람직하게는 100 이상 3,000 이하이고, 보다 더 바람직하게는 150 이상 2,900 이하이고, 특히 바람직하게는 250 이상 1,500 이하이다.The weight average molecular weight of the polymerizable compound (C) is preferably 50 or more and 4,000 or less, more preferably 70 or more and 3,500 or less, still more preferably 100 or more and 3,000 or less, still more preferably 150 or more and 2,900 or less. and particularly preferably 250 or more and 1,500 or less.
중합성 화합물 (C)의 함유율은, 착색 수지 조성물의 고형분의 총량에 대하여, 예를 들면 1 질량% 이상 99 질량% 이하여도 되고, 바람직하게는 5 질량% 이상 90 질량% 이하이고, 보다 바람직하게는 10 질량% 이상 80 질량% 이하이고, 더 바람직하게는 20 질량% 이상 70 질량% 이하이다.The content rate of the polymerizable compound (C) may be, for example, 1 mass % or more and 99 mass % or less, preferably 5 mass % or more and 90 mass % or less, with respect to the total amount of solid content of the colored resin composition, more preferably is 10 mass% or more and 80 mass% or less, and more preferably 20 mass% or more and 70 mass% or less.
< 중합개시제 (D) >< Polymerization initiator (D) >
중합개시제 (D)는, 광이나 열의 작용에 의해 활성 라디칼, 산 등을 발생하고, 중합을 개시할 수 있는 화합물이라면 특별히 한정되지 않고, 공지의 중합개시제를 이용할 수 있다.The polymerization initiator (D) is not particularly limited as long as it is a compound capable of initiating polymerization by generating an active radical, an acid, etc. under the action of light or heat, and a known polymerization initiator can be used.
중합개시제 (D)로서는 O-아실옥심 화합물, 알킬페논 화합물, 비이미다졸 화합물, 트리아진 화합물 및 아실포스핀옥사이드 화합물 등을 들 수 있다.Examples of the polymerization initiator (D) include an O-acyloxime compound, an alkylphenone compound, a biimidazole compound, a triazine compound, and an acylphosphine oxide compound.
O-아실옥심 화합물로서는, 예를 들면, N-벤조일옥시-1-(4-페닐술파닐페닐)부탄-1-온-2-이민, N-벤조일옥시-1-(4-페닐술파닐페닐)옥탄-1-온-2-이민, N-벤조일옥시-1-(4-페닐술파닐페닐)-3-시클로펜틸프로판-1-온-2-이민, N-아세톡시-1-(4-페닐술파닐페닐)-3-시클로펜틸프로판-1-온-2-이민, N-아세톡시-1-(4-페닐술파닐페닐)-3-시클로헥실프로판-1-온-2-이민, N-아세톡시-1-[9-에틸-6-(2-메틸벤조일)-9H-카르바졸-3-일]에탄-1-이민, N-아세톡시-1-[9-에틸-6-{2-메틸-4-(3,3-디메틸-2,4-디옥사시클로펜타닐메틸옥시)벤조일}-9H-카르바졸-3-일]에탄-1-이민, N-아세톡시-1-[9-에틸-6-(2-메틸벤조일)-9H-카르바졸-3-일]-3-시클로펜틸프로판-1-이민 및 N-벤조일옥시-1-[9-에틸-6-(2-메틸벤조일)-9H-카르바졸-3-일]-3-시클로펜틸프로판-1-온-2-이민 등을 들 수 있다. 또, O-아실옥심 화합물로서 이르가큐어(등록상표) OXE01, OXE02(이상, BASF사 제) 및 N-1919((주)ADEKA 제) 등의 시판품을 이용해도 된다. 그 중에서도 O-아실옥심 화합물로서는 N-벤조일옥시-1-(4-페닐술파닐페닐)부탄-1-온-2-이민, N-벤조일옥시-1-(4-페닐술파닐페닐)옥탄-1-온-2-이민 및 N-벤조일옥시-1-(4-페닐술파닐페닐)-3-시클로펜틸프로판-1-온-2-이민으로 이루어지는 군으로부터 선택되는 적어도 1종이 바람직하고, N-벤조일옥시-1-(4-페닐술파닐페닐)옥탄-1-온-2-이민이 보다 바람직하다.As the O-acyloxime compound, for example, N-benzoyloxy-1-(4-phenylsulfanylphenyl)butan-1-one-2-imine, N-benzoyloxy-1-(4-phenylsulfanylphenyl) ) Octan-1-one-2-imine, N-benzoyloxy-1-(4-phenylsulfanylphenyl)-3-cyclopentylpropan-1-one-2-imine, N-acetoxy-1-(4 -Phenylsulfanylphenyl)-3-cyclopentylpropan-1-one-2-imine, N-acetoxy-1-(4-phenylsulfanylphenyl)-3-cyclohexylpropan-1-one-2-imine , N-acetoxy-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethane-1-imine, N-acetoxy-1-[9-ethyl-6 -{2-methyl-4-(3,3-dimethyl-2,4-dioxacyclopentanylmethyloxy)benzoyl}-9H-carbazol-3-yl]ethane-1-imine, N-acetoxy-1 -[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-3-cyclopentylpropan-1-imine and N-benzoyloxy-1-[9-ethyl-6-( 2-methylbenzoyl)-9H-carbazol-3-yl]-3-cyclopentylpropan-1-one-2-imine and the like. Moreover, you may use commercial items, such as Irgacure (trademark) OXE01, OXE02 (above, BASF Corporation make), and N-1919 (made by ADEKA Corporation) as an O-acyl oxime compound. Among them, as the O-acyloxime compound, N-benzoyloxy-1-(4-phenylsulfanylphenyl)butan-1-one-2-imine, N-benzoyloxy-1-(4-phenylsulfanylphenyl)octane- At least one selected from the group consisting of 1-one-2-imine and N-benzoyloxy-1-(4-phenylsulfanylphenyl)-3-cyclopentylpropan-1-one-2-imine is preferable, and N -benzoyloxy-1-(4-phenylsulfanylphenyl)octan-1-one-2-imine is more preferable.
알킬페논 화합물로서는 2-메틸-2-모르폴리노-1-(4-메틸술파닐페닐)프로판-1-온, 2-디메틸아미노-1-(4-모르폴리노페닐)-2-벤질부탄-1-온 및 2-(디메틸아미노)-2-[(4-메틸페닐)메틸]-1-[4-(4-모르폴리닐)페닐]부탄-1-온 등을 들 수 있다. 알킬페논 화합물로서, 이르가큐어(등록상표) 369, 907, 379(이상, BASF사 제) 등의 시판품을 이용해도 된다.Examples of the alkylphenone compound include 2-methyl-2-morpholino-1-(4-methylsulfanylphenyl)propan-1-one, 2-dimethylamino-1-(4-morpholinophenyl)-2-benzylbutane. -1-one and 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-[4-(4-morpholinyl)phenyl]butan-1-one; and the like. As an alkylphenone compound, you may use commercial items, such as Irgacure (trademark) 369, 907, 379 (above, BASF Corporation make).
알킬페논 화합물로서는 2-히드록시-2-메틸-1-페닐프로판-1-온, 2-히드록시-2-메틸-1-〔4-(2-히드록시에톡시)페닐〕프로판-1-온, 1-히드록시시클로헥실페닐케톤, 2-히드록시-2-메틸-1-(4-이소프로페닐페닐)프로판-1-온의 올리고머, α,α-디에톡시아세토페논 및 벤질디메틸케탈도 들 수 있다.Examples of the alkylphenone compound include 2-hydroxy-2-methyl-1-phenylpropan-1-one, 2-hydroxy-2-methyl-1-[4-(2-hydroxyethoxy)phenyl]propane-1-one. one, 1-hydroxycyclohexylphenylketone, oligomer of 2-hydroxy-2-methyl-1-(4-isopropenylphenyl)propan-1-one, α,α-diethoxyacetophenone and benzyldimethylketal can also be heard.
비이미다졸 화합물로서는, 예를 들면, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2,3-디클로로페닐)-4,4',5,5'-테트라페닐비이미다졸(예를 들면, 일본 공개특허 특개평6-75372호 공보, 일본 공개특허 특개평6-75373호 공보 등 참조.), 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라(알콕시페닐)비이미다졸, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라(디알콕시페닐)비이미다졸, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라(트리알콕시페닐)비이미다졸(예를 들면, 일본 공고특허 특공소48-38403호 공보, 일본 공개특허 특개소62-174204호 공보 등 참조.) 및 4,4',5,5'- 위치의 페닐기가 카르보알콕시기에 의해 치환되어 있는 비이미다졸 화합물(예를 들면, 일본 공개특허 특개평7-10913호 공보 등 참조.) 등을 들 수 있다.As the biimidazole compound, for example, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2,3- dichlorophenyl)-4,4',5,5'-tetraphenylbiimidazole (see, for example, Japanese Patent Application Laid-Open No. 6-75372, Japanese Patent Application Laid-Open No. 6-75373, etc.); 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(alkoxyphenyl)biimidazole, 2,2'-bis(2-chlorophenyl)-4,4', 5,5'-tetra(dialkoxyphenyl)biimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(trialkoxyphenyl)biimidazole (e.g. For example, see Japanese Patent Application Laid-Open No. 48-38403, Japanese Patent Application Laid-Open No. 62-174204, etc.) and a phenyl group at the 4,4',5,5'-position is substituted with a carboalkoxy group. Biimidazole compounds (For example, refer to Unexamined-Japanese-Patent No. 7-10913 etc.) etc. are mentioned.
트리아진 화합물로서는 2,4-비스(트리클로로메틸)-6-(4-메톡시페닐)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시나프틸)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-피페로닐-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시스티릴)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-〔2-(5-메틸푸란-2-일)에테닐〕-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-〔2-(푸란-2-일)에테닐〕-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-〔2-(4-디에틸아미노-2-메틸페닐)에테닐〕-1,3,5-트리아진 및 2,4-비스(트리클로로메틸)-6-〔2-(3,4-디메톡시페닐)에테닐〕-1,3,5-트리아진 등을 들 수 있다.Examples of the triazine compound include 2,4-bis(trichloromethyl)-6-(4-methoxyphenyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-(4- Methoxynaphthyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-piperonyl-1,3,5-triazine, 2,4-bis(trichloromethyl) )-6-(4-methoxystyryl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(5-methylfuran-2-yl)ethenyl ]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(furan-2-yl)ethenyl]-1,3,5-triazine, 2,4 -bis(trichloromethyl)-6-[2-(4-diethylamino-2-methylphenyl)ethenyl]-1,3,5-triazine and 2,4-bis(trichloromethyl)-6- [2-(3,4-dimethoxyphenyl)ethenyl]-1,3,5-triazine etc. are mentioned.
아실포스핀옥사이드 화합물로서는 2,4,6-트리메틸벤조일디페닐포스핀옥사이드 등을 들 수 있다. 이르가큐어(등록상표) 819(BASF사 제) 등의 시판품을 이용해도 된다.2,4,6-trimethylbenzoyldiphenylphosphine oxide etc. are mentioned as an acylphosphine oxide compound. You may use commercial items, such as Irgacure (trademark) 819 (made by BASF).
또한 중합개시제 (D)로서는 벤조인, 벤조인메틸에테르, 벤조인에틸에테르, 벤조인이소프로필에테르, 벤조인이소부틸에테르 등의 벤조인 화합물; 벤조페논, o-벤조일안식향산 메틸, 4-페닐벤조페논, 4-벤조일-4'-메틸디페닐설파이드, 3,3',4,4'-테트라(tert-부틸퍼옥시카르보닐)벤조페논 및 2,4,6-트리메틸벤조페논 등의 벤조페논 화합물; 9,10-페난트렌퀴논, 2-에틸안트라퀴논 및 캄퍼퀴논 등의 퀴논 화합물; 10-부틸-2-클로로아크리돈, 벤질, 페닐글리옥실산 메틸 및 티타노센 화합물 등을 들 수 있다.Moreover, as a polymerization initiator (D), Benzoin compounds, such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzoin isobutyl ether; Benzophenone, o-benzoyl methylbenzoate, 4-phenylbenzophenone, 4-benzoyl-4'-methyldiphenylsulfide, 3,3',4,4'-tetra(tert-butylperoxycarbonyl)benzophenone and benzophenone compounds such as 2,4,6-trimethylbenzophenone; quinone compounds such as 9,10-phenanthrenequinone, 2-ethylanthraquinone and camphorquinone; 10-butyl-2-chloroacridone, benzyl, methyl phenylglyoxylate, titanocene compound, and the like.
이들은 후술의 중합개시 조제 (D1)(특히 아민류)과 조합하여 이용하는 것이 바람직하다.It is preferable to use these in combination with the polymerization initiation auxiliary|assistant (D1) (particularly amines) mentioned later.
중합개시제 (D)는 바람직하게는 알킬페논 화합물, 트리아진 화합물, 아실포스핀옥사이드 화합물, O-아실옥심 화합물 및 비이미다졸 화합물로 이루어지는 군으로부터 선택되는 적어도 1종을 포함하는 중합개시제이고, 보다 바람직하게는 O-아실옥심 화합물을 포함하는 중합개시제이다.The polymerization initiator (D) is preferably a polymerization initiator comprising at least one selected from the group consisting of an alkylphenone compound, a triazine compound, an acylphosphine oxide compound, an O-acyloxime compound, and a biimidazole compound, and more Preferably, it is a polymerization initiator containing an O-acyl oxime compound.
중합개시제 (D)의 함유량은, 착색 수지 조성물에 포함되는 전(全) 수지 (B) 및 중합성 화합물 (C)의 합계량 100 질량부에 대하여, 바람직하게는 0.1 질량부 이상 30 질량부 이하이고, 보다 바람직하게는 1 질량부 이상 20 질량부 이하이다. 중합개시제 (D)의 함유량이 상기의 범위 내에 있으면, 고감도화되어 노광 시간이 단축되는 경향이 있기 때문에 컬러 필터의 생산성이 향상된다.The content of the polymerization initiator (D) is preferably 0.1 parts by mass or more and 30 parts by mass or less with respect to 100 parts by mass of the total amount of all the resins (B) and the polymerizable compound (C) contained in the colored resin composition. , More preferably, they are 1 mass part or more and 20 mass parts or less. When content of a polymerization initiator (D) exists in said range, since there exists a tendency for it to become highly sensitive and exposure time to shorten, productivity of a color filter improves.
< 중합개시 조제 (D1) >< Auxiliary for polymerization initiation (D1) >
중합개시 조제 (D1)은, 중합개시제 (D)에 의해서 중합이 개시된 중합성 화합물 (C)의 중합을 촉진하기 위하여 이용되는 화합물, 또는 증감제이다. 중합개시 조제 (D1)을 포함하는 경우, 통상 중합개시제 (D)와 조합하여 이용된다.The polymerization initiation auxiliary (D1) is a compound or sensitizer used to promote polymerization of the polymerizable compound (C) whose polymerization is initiated by the polymerization initiator (D). When the polymerization initiator auxiliary (D1) is included, it is usually used in combination with the polymerization initiator (D).
중합개시 조제 (D1)로서는 아민 화합물, 알콕시안트라센 화합물, 티오크산톤 화합물 및 카르본산 화합물 등을 들 수 있다.Examples of the polymerization initiation auxiliary (D1) include an amine compound, an alkoxyanthracene compound, a thioxanthone compound, and a carboxylic acid compound.
아민 화합물로서는 트리에탄올아민, 메틸디에탄올아민, 트리이소프로판올아민, 4-디메틸아미노안식향산 메틸, 4-디메틸아미노안식향산 에틸, 4-디메틸아미노안식향산 이소아밀, 안식향산 2-디메틸아미노에틸, 4-디메틸아미노안식향산 2-에틸헥실, N,N-디메틸파라톨루이딘, 4,4'-비스(디메틸아미노)벤조페논(통칭 미힐러 케톤), 4,4'-비스(디에틸아미노)벤조페논 및 4,4'-비스(에틸메틸아미노)벤조페논 등을 들 수 있고, 바람직하게는 4,4'-비스(디에틸아미노)벤조페논을 들 수 있다. 또, 아민 화합물로서, EAB-F(호도가야화학공업(주) 제) 등의 시판품을 이용해도 된다.Examples of the amine compound include triethanolamine, methyldiethanolamine, triisopropanolamine, 4-dimethylaminomethylbenzoate, 4-dimethylaminobenzoate ethyl, 4-dimethylaminobenzoate isoamyl, benzoate 2-dimethylaminoethyl, 4-dimethylaminobenzoic acid 2 -Ethylhexyl, N,N-dimethylparatoluidine, 4,4'-bis(dimethylamino)benzophenone (commonly known as Michler's ketone), 4,4'-bis(diethylamino)benzophenone and 4,4'- Bis(ethylmethylamino)benzophenone etc. are mentioned, Preferably 4,4'-bis(diethylamino)benzophenone is mentioned. Moreover, as an amine compound, you may use commercial items, such as EAB-F (made by Hodogaya Chemical Industry Co., Ltd.).
알콕시안트라센 화합물로서는 9,10-디메톡시안트라센, 2-에틸-9,10-디메톡시안트라센, 9,10-디에톡시안트라센, 2-에틸-9,10-디에톡시안트라센, 9,10-디부톡시안트라센 및 2-에틸-9,10-디부톡시안트라센 등을 들 수 있다.Examples of the alkoxyanthracene compound include 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 2-ethyl-9,10-diethoxyanthracene, and 9,10-dibutoxy. anthracene and 2-ethyl-9,10-dibutoxyanthracene; and the like.
티오크산톤 화합물로서는 2-이소프로필티오크산톤, 4-이소프로필티오크산톤, 2,4-디에틸티오크산톤, 2,4-디클로로티오크산톤 및 1-클로로-4-프로폭시티오크산톤 등을 들 수 있다.Examples of the thioxanthone compound include 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, and 1-chloro-4-propoxythiok. Santon etc. are mentioned.
카르본산 화합물로서는 페닐술파닐아세트산, 메틸페닐술파닐아세트산, 에틸페닐술파닐아세트산, 메틸에틸페닐술파닐아세트산, 디메틸페닐술파닐아세트산, 메톡시페닐술파닐아세트산, 디메톡시페닐술파닐아세트산, 클로로페닐술파닐아세트산, 디클로로페닐술파닐아세트산, N-페닐글리신, 페녹시아세트산, 나프틸티오아세트산, N-나프틸글리신 및 나프톡시아세트산 등을 들 수 있다.Examples of the carboxylic acid compound include phenylsulfanylacetic acid, methylphenylsulfanylacetic acid, ethylphenylsulfanylacetic acid, methylethylphenylsulfanylacetic acid, dimethylphenylsulfanylacetic acid, methoxyphenylsulfanylacetic acid, dimethoxyphenylsulfanylacetic acid, and chlorophenylsulfanylacetic acid. Panylacetic acid, dichlorophenylsulfanylacetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine, naphthoxyacetic acid, etc. are mentioned.
이들 중합개시 조제 (D1)을 이용하는 경우, 그 함유량은, 착색 수지 조성물에 포함되는 전 수지 (B) 및 중합성 화합물 (C)의 합계량 100 질량부에 대하여, 바람직하게는 0.1 질량부 이상 30 질량부 이하, 보다 바람직하게는 1 질량부 이상 20 질량부 이하이다.When using these polymerization initiation auxiliary|assistant (D1), the content becomes like this with respect to 100 mass parts of total amounts of all resin (B) and polymeric compound (C) contained in a colored resin composition, Preferably 0.1 mass part or more and 30 mass part or less, More preferably, they are 1 mass part or more and 20 mass parts or less.
< 용제 (E) >< Solvent (E) >
용제 (E)는, 특별히 한정되지 않고, 당해 분야에서 통상 사용되는 용제를 이용할 수 있다.The solvent (E) is not specifically limited, The solvent normally used in this field|area can be used.
용제 (E)는, 예를 들면, 에스테르 용제(분자 내에 -COO-를 포함하고, -O-를 포함하지 않는 용제), 에테르 용제(분자 내에 -O-를 포함하고, -COO-를 포함하지 않는 용제), 에테르에스테르 용제(분자 내에 -COO-와 -O-를 포함하는 용제), 케톤 용제(분자 내에 -CO-를 포함하고, -COO-를 포함하지 않는 용제), 알코올 용제(분자 내에 OH를 포함하고, -O-, -CO- 및 -COO-를 포함하지 않는 용제), 방향족 탄화수소 용제, 아미드 용제, 디메틸술폭시드 등을 들 수 있다. 이들 용제는 2종 이상을 병용해도 된다.The solvent (E) is, for example, an ester solvent (a solvent containing -COO- in the molecule and not containing -O-), an ether solvent (containing -O- in the molecule and not containing -COO-). solvent), ether ester solvent (solvent containing -COO- and -O- in the molecule), ketone solvent (solvent containing -CO- in the molecule and not containing -COO-), alcohol solvent (solvent containing -COO- in the molecule) solvents containing OH and not containing -O-, -CO- and -COO-), aromatic hydrocarbon solvents, amide solvents, dimethyl sulfoxide, and the like. These solvents may use 2 or more types together.
에스테르 용제로서는 젖산 메틸, 젖산 에틸, 젖산 부틸, 2-히드록시이소부탄산 메틸, 아세트산 에틸, 아세트산 n-부틸, 아세트산 이소부틸, 포름산 펜틸, 아세트산 이소펜틸, 프로피온산 부틸, 부티르산 이소프로필, 부티르산 에틸, 부티르산 부틸, 피루브산 메틸, 피루브산 에틸, 피루브산 프로필, 아세토아세트산 메틸, 아세토아세트산 에틸, 시클로헥산올아세테이트 및 γ-부티로락톤 등을 들 수 있다.As an ester solvent, methyl lactate, ethyl lactate, butyl lactate, 2-hydroxyisobutanoate, ethyl acetate, n-butyl acetate, isobutyl acetate, pentyl formate, isopentyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyric acid butyl, methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, cyclohexanol acetate, γ-butyrolactone, and the like.
에테르 용제로서는 에틸렌글리콜모노메틸에테르, 에틸렌글리콜모노에틸에테르, 에틸렌글리콜모노프로필에테르, 에틸렌글리콜모노부틸에테르, 디에틸렌글리콜모노메틸에테르, 디에틸렌글리콜모노에틸에테르, 디에틸렌글리콜모노부틸에테르, 프로필렌글리콜모노메틸에테르, 프로필렌글리콜모노에틸에테르, 프로필렌글리콜모노프로필에테르, 프로필렌글리콜모노부틸에테르, 3-메톡시-1-부탄올, 3-메톡시-3-메틸부탄올, 테트라히드로푸란, 테트라히드로피란, 1,4-디옥산, 디에틸렌글리콜디메틸에테르, 디에틸렌글리콜디에틸에테르, 디에틸렌글리콜메틸에틸에테르, 디에틸렌글리콜디프로필에테르, 디에틸렌글리콜디부틸에테르, 아니솔, 페네톨 및 메틸아니솔 등을 들 수 있다.As the ether solvent, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol Monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, 3-methoxy-1-butanol, 3-methoxy-3-methylbutanol, tetrahydrofuran, tetrahydropyran, 1 ,4-dioxane, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether, anisole, phenetol and methyl anisole, etc. can be heard
에테르에스테르 용제로서는 메톡시아세트산 메틸, 메톡시아세트산 에틸, 메톡시아세트산 부틸, 에톡시아세트산 메틸, 에톡시아세트산 에틸, 3-메톡시프로피온산 메틸, 3-메톡시프로피온산 에틸, 3-에톡시프로피온산 메틸, 3-에톡시프로피온산 에틸, 2-메톡시프로피온산 메틸, 2-메톡시프로피온산 에틸, 2-메톡시프로피온산 프로필, 2-에톡시프로피온산 메틸, 2-에톡시프로피온산 에틸, 2-메톡시-2-메틸프로피온산 메틸, 2-에톡시-2-메틸프로피온산 에틸, 3-메톡시부틸아세테이트, 3-메틸-3-메톡시부틸아세테이트, 프로필렌글리콜모노메틸에테르아세테이트, 프로필렌글리콜모노에틸에테르아세테이트, 프로필렌글리콜모노프로필에테르아세테이트, 에틸렌글리콜모노메틸에테르아세테이트, 에틸렌글리콜모노에틸에테르아세테이트, 디에틸렌글리콜모노에틸에테르아세테이트, 디에틸렌글리콜모노부틸에테르아세테이트 및 디프로필렌글리콜메틸에테르아세테이트 등을 들 수 있다.Examples of the ether ester solvent include methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, Ethyl 3-ethoxypropionate, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, 2-methoxy-2-methyl Methyl propionate, 2-ethoxy-2-methyl ethyl propionate, 3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl and ether acetate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate, and dipropylene glycol methyl ether acetate.
케톤 용제로서는 4-히드록시-4-메틸-2-펜탄온, 아세톤, 2-부탄온, 2-헵탄온, 3-헵탄온, 4-헵탄온, 4-메틸-2-펜탄온, 시클로펜탄온, 시클로헥산온 및 이소포론 등을 들 수 있다.As a ketone solvent, 4-hydroxy-4-methyl-2-pentanone, acetone, 2-butanone, 2-heptanone, 3-heptanone, 4-heptanone, 4-methyl-2-pentanone, cyclopentane on, cyclohexanone, isophorone, and the like.
알코올 용제로서는 메탄올, 에탄올, 프로판올, 부탄올, 헥산올, 시클로헥산올, 에틸렌글리콜, 프로필렌글리콜 및 글리세린 등을 들 수 있다.Examples of the alcohol solvent include methanol, ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol and glycerin.
방향족 탄화수소 용제로서는 벤젠, 톨루엔, 크실렌, 메시틸렌 등을 들 수 있다.Examples of the aromatic hydrocarbon solvent include benzene, toluene, xylene, and mesitylene.
아미드 용제로서는 N,N-디메틸포름아미드, N,N-디메틸아세트아미드 및 N-메틸피롤리돈 등을 들 수 있다.Examples of the amide solvent include N,N-dimethylformamide, N,N-dimethylacetamide and N-methylpyrrolidone.
용제 (E)로서는 프로필렌글리콜모노메틸에테르아세테이트, 프로필렌글리콜모노메틸에테르, 젖산 에틸 및 시클로헥산온이 바람직하다.As the solvent (E), propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, ethyl lactate, and cyclohexanone are preferable.
용제 (E)를 포함하는 경우, 용제 (E)의 함유율은, 착색 수지 조성물의 총량에 대하여, 통상 99.99 질량% 이하이고, 바람직하게는 40 질량% 이상 99 질량% 이하이고, 보다 바람직하게는 50 질량% 이상 95 질량% 이하이고, 더 바람직하게는 70 질량% 이상 95 질량% 이하이고, 보다 더 바람직하게는 75 질량% 이상 90 질량% 이하이다. 환언하면, 착색 수지 조성물의 고형분의 총량은, 통상 0.01 질량% 이상이고, 바람직하게는 1 질량% 이상 60 질량% 이하이고, 보다 바람직하게는 5 질량% 이상 50 질량% 이하이고, 더 바람직하게는 5 질량% 이상 30 질량% 이하이고, 보다 더 바람직하게는 10 질량% 이상 25 질량% 이하이다. 용제 (E)의 함유율이 상기의 범위 내에 있으면, 도포시의 평탄성이 양호해지고, 또, 컬러 필터를 형성하였을 때에 색 농도가 부족하지 않기 때문에 표시 특성이 양호하게 되는 경향이 있다.When a solvent (E) is included, the content rate of a solvent (E) is 99.99 mass % or less normally with respect to the total amount of a colored resin composition, Preferably they are 40 mass % or more and 99 mass % or less, More preferably, 50 They are mass % or more and 95 mass % or less, More preferably, they are 70 mass % or more and 95 mass % or less, More preferably, they are 75 mass % or more and 90 mass % or less. In other words, the total amount of solid content of the colored resin composition is usually 0.01 mass % or more, preferably 1 mass % or more and 60 mass % or less, more preferably 5 mass % or more and 50 mass % or less, further preferably They are 5 mass % or more and 30 mass % or less, More preferably, they are 10 mass % or more and 25 mass % or less. When the content rate of the solvent (E) is within the above range, flatness at the time of application becomes favorable, and since color density does not run short when a color filter is formed, there exists a tendency for a display characteristic to become favorable.
< 레벨링제 (F) >< Leveling agent (F) >
레벨링제 (F)로서는 실리콘계 계면활성제, 불소계 계면활성제 및 불소 원자를 갖는 실리콘계 계면활성제 등을 들 수 있다. 이들은 측쇄에 중합성기를 갖고 있어도 된다.As a leveling agent (F), a silicone type surfactant, a fluorine type surfactant, the silicone type surfactant which has a fluorine atom, etc. are mentioned. These may have a polymerizable group in a side chain.
실리콘계 계면활성제로서는, 분자 내에 실록산 결합을 갖는 계면활성제 등을 들 수 있다. 구체적으로는 도레이실리콘 DC3PA, 동(同) SH7PA, 동 DC11PA, 동 SH21PA, 동 SH28PA, 동 SH29PA, 동 SH30PA, 동 SH8400(상품명: 도레이·다우코닝(주) 제), KP321, KP322, KP323, KP324, KP326, KP340, KP341(신에츠화학공업(주) 제), TSF400, TSF401, TSF410, TSF4300, TSF4440, TSF4445, TSF4446, TSF4452 및 TSF4460(모멘티브·퍼포먼스·머티리얼즈·재팬합동회사 제) 등을 들 수 있다.As a silicone type surfactant, the surfactant etc. which have a siloxane bond in a molecule|numerator are mentioned. Specifically, Toray Silicon DC3PA, SH7PA, DC11PA, SH21PA, SH28PA, SH29PA, SH30PA, SH8400 (trade name: Toray Dow Corning Co., Ltd.), KP321, KP322, KP323, KP324 , KP326, KP340, KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), TSF400, TSF401, TSF410, TSF4300, TSF4440, TSF4445, TSF4446, TSF4452 and TSF4460 (manufactured by Momentive Performance Materials Japan Joint Stock Company), etc. can
불소계 계면활성제로서는, 분자 내에 플루오로카본쇄를 갖는 계면활성제 등을 들 수 있다. 구체적으로는 플로라드(등록상표) FC430, 동 FC431(스미토모쓰리엠(주) 제), 메가팍(등록상표) F142D, 동 F171, 동 F172, 동 F173, 동 F177, 동 F183, 동 F554, 동 R30, 동 RS-718-K(DIC(주) 제), 에프톱(등록상표) EF301, 동 EF303, 동 EF351, 동 EF352(미쓰비시머티리얼전자화성(주) 제), 서프론(등록상표) S381, 동 S382, 동 SC101, 동 SC105(아사히글래스(주) 제) 및 E5844((주)다이킨파인케미컬연구소 제) 등을 들 수 있다.As a fluorochemical surfactant, the surfactant etc. which have a fluorocarbon chain in a molecule|numerator are mentioned. Specifically, Florad (registered trademark) FC430, dong FC431 (manufactured by Sumitomo 3M Co., Ltd.), Megapac (registered trademark) F142D, dong F171, dong F172, dong F173, dong F177, dong F183, dong F554, dong R30 , RS-718-K (manufactured by DIC Co., Ltd.), EFTO (registered trademark) EF301, EF303, EF351, EF352 (manufactured by Mitsubishi Material Electric Chemical Co., Ltd.), Surflon (registered trademark) S381, Copper S382, copper SC101, copper SC105 (manufactured by Asahi Glass Co., Ltd.) and E5844 (manufactured by Daikin Fine Chemical Research Institute), etc. are mentioned.
불소 원자를 갖는 실리콘계 계면활성제로서는, 분자 내에 실록산 결합 및 플루오로카본쇄를 갖는 계면활성제 등을 들 수 있다. 구체적으로는 메가팍(등록상표) R08, 동 BL20, 동 F475, 동 F477 및 동 F443(DIC(주) 제) 등을 들 수 있다.Examples of the silicone-based surfactant having a fluorine atom include a surfactant having a siloxane bond and a fluorocarbon chain in the molecule. Specific examples thereof include Megapac (registered trademark) R08, copper BL20, copper F475, copper F477, and copper F443 (manufactured by DIC Corporation).
레벨링제 (F)를 함유하는 경우, 레벨링제 (F)의 함유율은, 착색 수지 조성물의 총량에 대하여, 바람직하게는 0.0005 질량% 이상 1 질량% 이하이고, 보다 바람직하게는 0.001 질량% 이상 0.5 질량% 이하이고, 더 바람직하게는 0.005 질량% 이상 0.1 질량% 이하이다. 또한, 이 함유량에 안료분산제의 함유량은 포함되지 않는다. 레벨링제 (F)의 함유율이 상기의 범위 내에 있으면, 컬러 필터의 평탄성을 양호하게 할 수 있다.When containing a leveling agent (F), the content rate of a leveling agent (F) with respect to the total amount of a colored resin composition, Preferably they are 0.0005 mass % or more and 1 mass % or less, More preferably, they are 0.001 mass % or more and 0.5 mass % or less, more preferably 0.005 mass% or more and 0.1 mass% or less. In addition, content of a pigment dispersant is not included in this content. When the content rate of a leveling agent (F) exists in said range, the flatness of a color filter can be made favorable.
< 기타의 성분 >< Other ingredients >
착색 수지 조성물은, 필요에 따라서, 충전제, 기타의 고분자 화합물, 밀착촉진제, ??처, 산화방지제, 광안정제, 연쇄이동제 등, 당해 기술 분야에서 공지의 첨가제를 포함해도 된다.The colored resin composition may contain additives known in the art, such as fillers, other high molecular compounds, adhesion promoters, quenchers, antioxidants, light stabilizers, and chain transfer agents, as needed.
< 착색 수지 조성물의 제조 방법 ><Method for producing colored resin composition>
착색 수지 조성물은 착색제 (A), 수지 (B), 필요에 따라서 이용되는 중합성 화합물 (C), 중합개시제 (D), 용제 (E), 레벨링제 (F) 및 기타의 성분을 혼합함으로써 조제할 수 있다. 혼합은 공지 또는 관용의 장치나 조건에 의해 행할 수 있다.The colored resin composition is prepared by mixing a colorant (A), a resin (B), a polymerizable compound (C) used as necessary, a polymerization initiator (D), a solvent (E), a leveling agent (F) and other components can do. Mixing can be performed by a well-known or customary apparatus and conditions.
착색제 (A)는, 미리 용제 (E)의 일부 또는 전부와 혼합하고, 평균 입자경(徑)이 0.2 ㎛ 이하 정도로 될 때까지, 비즈 밀 등을 이용하여 분산시킨 상태에서 이용해도 되고, 분산시킨 상태에서 이용하는 것이 바람직하다. 이 때, 필요에 따라서 상기 분산제, 수지 (B)의 일부 또는 전부를 배합해도 된다. 또, 착색제 (A)는, 미리 용제 (E)의 일부 또는 전부에 용해시킨 상태에서 이용해도 된다. 이와 같이 하여 얻어진 착색제 함유액에, 나머지의 성분을, 소정의 농도로 되도록 혼합함으로써, 목적으로 하는 착색 수지 조성물을 조제할 수 있다.The colorant (A) may be used in a state in which it is mixed with a part or all of the solvent (E) in advance and dispersed using a bead mill or the like until the average particle diameter is about 0.2 µm or less, or in a dispersed state It is preferable to use in At this time, you may mix|blend a part or all of the said dispersing agent and resin (B) as needed. Moreover, you may use the coloring agent (A) in the state previously melt|dissolved in a part or all of a solvent (E). The color resin composition made into the objective can be prepared by mixing the remaining component with the coloring agent containing liquid obtained in this way so that it may become predetermined density|concentration.
< 컬러 필터의 제조 방법 >< Manufacturing method of color filter >
착색 수지 조성물로부터, 색 변환층이어도 되는 컬러 필터를 형성할 수 있다. 착색 패턴을 형성하는 방법으로서는, 포토리소그래프법, 잉크젯법, 인쇄법 등을 들 수 있다. 그 중에서도 포토리소그래프법이 바람직하다. 포토리소그래프법은, 상기 착색 수지 조성물을 기판에 도포하고, 건조시켜 착색 수지 조성물층을 형성하고, 포토마스크를 개재하여 당해 착색 수지 조성물층을 노광하여, 현상하는 방법이다. 포토리소그래프법에 있어서, 노광시에 포토마스크를 이용하지 않는 것, 및/또는 현상하지 않는 것에 의해, 상기 착색 수지 조성물층의 경화물인 착색 도막을 형성할 수 있다. 이와 같이 형성한 착색 패턴이나 착색 도막이 본 발명의 컬러 필터이다.From a colored resin composition, the color filter which may be a color conversion layer can be formed. A photolithographic method, an inkjet method, a printing method, etc. are mentioned as a method of forming a coloring pattern. Among them, the photolithography method is preferable. The photolithography method is a method of apply|coating the said colored resin composition to a board|substrate, drying it, forming a colored resin composition layer, exposing the said colored resin composition layer through a photomask, and developing. The photolithographic method WHEREIN: The colored coating film which is hardened|cured material of the said colored resin composition layer can be formed by not using a photomask at the time of exposure and/or not developing. The colored pattern and colored coating film thus formed are the color filters of the present invention.
제작하는 컬러 필터의 막두께는, 특별히 한정되지 않고, 목적이나 용도 등에 따라서 적절히 조정할 수 있고, 예를 들면, 0.1 ㎛ 이상 30 ㎛ 이하이고, 바람직하게는 0.1 ㎛ 이상 20 ㎛ 이하이고, 더 바람직하게는 0.5 ㎛ 이상 6 ㎛ 이하이다.The film thickness of the color filter to be produced is not particularly limited, and can be appropriately adjusted according to the purpose or use, for example, 0.1 µm or more and 30 µm or less, preferably 0.1 µm or more and 20 µm or less, more preferably is 0.5 µm or more and 6 µm or less.
기판으로서는 석영 유리, 붕규산 유리, 알루미나규산염 유리, 표면을 실리카 코팅한 소다라임 유리 등의 유리판이나, 폴리카보네이트, 폴리메타크릴산 메틸, 폴리에틸렌테레프탈레이트 등의 수지판, 실리콘, 상기 기판 상에 알루미늄, 은, 은/구리/팔라듐 합금 박막 등을 형성한 것이 이용된다. 이들 기판 상에는, 다른 컬러 필터층, 수지층, 트랜지스터, 회로 등이 형성되어 있어도 된다.Examples of the substrate include a glass plate such as quartz glass, borosilicate glass, alumina silicate glass, and soda lime glass coated with silica, a resin plate such as polycarbonate, polymethyl methacrylate, polyethylene terephthalate, silicon, aluminum on the substrate, What formed a silver, silver/copper/palladium alloy thin film etc. is used. On these board|substrates, another color filter layer, a resin layer, a transistor, a circuit, etc. may be formed.
포토리소그래프법에 의한 각 색 화소의 형성은, 공지 또는 관용의 장치나 조건으로 행할 수 있다. 예를 들면, 하기와 같이 하여 제작할 수 있다.Formation of each color pixel by the photolithographic method can be performed with a well-known or customary apparatus and conditions. For example, it can be produced as follows.
먼저, 착색 수지 조성물을 기판 상에 도포하고, 가열 건조(프리베이크) 및/또는 감압 건조함으로써 용제 등의 휘발 성분을 제거하여 건조시켜, 평활한 착색 수지 조성물층을 얻는다.First, a colored resin composition is apply|coated on a board|substrate, volatile components, such as a solvent, are removed and dried by heat-drying (pre-baking) and/or drying under reduced pressure, and a smooth colored resin composition layer is obtained.
도포 방법으로서는 스핀 코팅법, 슬릿 코팅법, 슬릿 앤드 스핀 코팅법 등을 들 수 있다.Examples of the coating method include a spin coating method, a slit coating method, and a slit-and-spin coating method.
가열 건조를 행하는 경우의 온도는 30℃ 이상 120℃ 이하가 바람직하고, 50℃ 이상 110℃ 이하가 보다 바람직하다. 또, 가열 시간으로서는 10초간 이상 60분간 이하인 것이 바람직하고, 30초간 이상 30분간 이하인 것이 보다 바람직하다.30 degreeC or more and 120 degrees C or less are preferable and, as for the temperature in the case of heat-drying, 50 degreeC or more and 110 degrees C or less are more preferable. Moreover, as a heating time, it is preferable that they are 10 second or more and 60 minutes or less, and it is more preferable that they are 30 second or more and 30 minutes or less.
감압 건조를 행하는 경우는 50 ㎩ 이상 150 ㎩ 이하의 압력 하, 20℃ 이상 25℃ 이하의 온도 범위에서 행하는 것이 바람직하다.When performing reduced-pressure drying, it is preferable to carry out in the temperature range of 20 degreeC or more and 25 degrees C or less under the pressure of 50 Pa or more and 150 Pa or less.
착색 수지 조성물층의 막두께는, 특별히 한정되지 않고, 목적으로 하는 컬러 필터의 막두께에 따라서 적절히 선택하면 된다.The film thickness of a colored resin composition layer is not specifically limited, What is necessary is just to select suitably according to the film thickness of the target color filter.
다음으로, 착색 수지 조성물층은, 목적으로 하는 착색 패턴을 형성하기 위한 포토마스크를 개재하여 노광된다. 당해 포토마스크 상의 패턴은 특별히 한정되지 않고, 목적으로 하는 용도에 따른 패턴이 이용된다. 또, 노광면 전체에 균일하게 평행 광선을 조사하는 것이나, 포토마스크와 착색 수지 조성물층이 형성된 기판과의 정확한 위치맞춤을 행할 수 있기 때문에, 마스크 얼라이너 및 스테퍼 등의 노광 장치를 사용하는 것이 바람직하다.Next, the colored resin composition layer is exposed through a photomask for forming a target colored pattern. The pattern on the said photomask is not specifically limited, The pattern according to the intended use is used. In addition, it is preferable to use an exposure apparatus such as a mask aligner and a stepper, since it is possible to uniformly irradiate parallel rays to the entire exposure surface and to accurately align the photomask and the substrate on which the colored resin composition layer is formed. do.
노광에 이용되는 광원으로서는, 250 ㎚ 이상 450 ㎚ 이하의 파장의 광을 발생하는 광원이 바람직하다. 예를 들면, 350 ㎚ 미만의 광을, 이 파장 영역을 커트하는 필터를 이용하여 커트하거나, 436 ㎚ 부근, 408 ㎚ 부근, 365 ㎚ 부근의 광을, 이들 파장 영역을 취출하는 밴드패스 필터를 이용하여 선택적으로 취출하거나 해도 된다. 구체적으로는 수은등, 발광 다이오드, 메탈 할라이드 램프, 할로겐 램프 등을 들 수 있다.As a light source used for exposure, the light source which generate|occur|produces the light of the wavelength of 250 nm or more and 450 nm or less is preferable. For example, light of less than 350 nm is cut using a filter that cuts this wavelength region, or a bandpass filter that extracts light in the vicinity of 436 nm, 408 nm, and 365 nm in these wavelength ranges is used. Thus, it may be selectively taken out or may be taken out. Specifically, a mercury lamp, a light emitting diode, a metal halide lamp, a halogen lamp, etc. are mentioned.
노광 후의 착색 수지 조성물층을 현상액에 접촉시켜 현상함으로써, 기판 상에 착색 패턴이 형성된다. 현상에 의해, 착색 수지 조성물층의 미노광부가 현상액에 용해되어 제거된다. 현상액으로서는, 예를 들면, 수산화칼륨, 탄산수소나트륨, 탄산나트륨, 수산화테트라메틸암모늄 등의 알칼리성 화합물의 수용액이 바람직하다. 이들 알칼리성 화합물의 수용액 중의 농도는, 바람직하게는 0.01 질량% 이상 10 질량% 이하이고, 보다 바람직하게는 0.03 질량% 이상 5 질량% 이하이다. 또한, 현상액은 계면활성제를 포함하고 있어도 된다.A colored pattern is formed on a board|substrate by making a developing solution contact and developing the colored resin composition layer after exposure. By image development, the unexposed part of a colored resin composition layer melt|dissolves in a developing solution, and is removed. As a developing solution, the aqueous solution of alkaline compounds, such as potassium hydroxide, sodium hydrogencarbonate, sodium carbonate, and tetramethylammonium hydroxide, is preferable, for example. The concentration of these alkaline compounds in the aqueous solution is preferably 0.01 mass% or more and 10 mass% or less, and more preferably 0.03 mass% or more and 5 mass% or less. Moreover, the developing solution may contain surfactant.
현상 방법은 패들법, 디핑법 및 스프레이법 등의 어느 것이어도 된다. 또한 현상시에 기판을 임의의 각도로 기울여도 된다.The developing method may be any of a paddle method, a dipping method, and a spray method. Moreover, you may incline a board|substrate at an arbitrary angle at the time of development.
현상 후의 기판은 수세되는 것이 바람직하다.The substrate after development is preferably washed with water.
또한, 얻어진 착색 패턴에, 포스트베이크를 행하는 것이 바람직하다. 포스트베이크 온도는 150℃ 이상 250℃ 이하가 바람직하고, 160℃ 이상 240℃ 이하가 보다 바람직하다. 포스트베이크 시간은 1분간 이상 120분간 이하가 바람직하고, 10분간 이상 60분간 이하가 보다 바람직하다.Moreover, it is preferable to post-baking to the obtained coloring pattern. 150 degreeC or more and 250 degrees C or less are preferable, and, as for post-baking temperature, 160 degreeC or more and 240 degrees C or less are more preferable. 1 minute or more and 120 minutes or less are preferable, and, as for post-baking time, 10 minutes or more and 60 minutes or less are more preferable.
< 표시 장치 >< Display device >
상기 컬러 필터는, 표시 장치(예를 들면, 액정 표시 장치, 유기 EL 장치, 전자 페이퍼 등) 및 고체 촬상 소자에 이용되는 컬러 필터로서, 그 중에서도 유기 EL 장치에 이용되는 컬러 필터로서 유용하다.The color filter is useful as a color filter used for a display device (for example, a liquid crystal display device, an organic EL device, electronic paper, etc.) and a solid-state image sensor, and especially as a color filter used for an organic EL device.
[실시예][Example]
이하, 실시예를 들어 본 발명을 보다 구체적으로 설명하지만, 본 발명은 애초부터 하기 실시예에 의해서 제한을 받는 것은 아니고, 전·후기의 취지에 적합할 수 있는 범위에서 적당히 변경을 가하여 실시하는 것도 물론 가능하며, 그것들은 모두 본 발명의 기술적 범위에 포함된다. 또한, 이하에 있어서는, 특별히 언급이 없는 한, 「부(部)」는 「질량부」를, 「%」는 「질량%」를 의미한다.Hereinafter, the present invention will be described in more detail with reference to examples, but the present invention is not limited by the following examples from the beginning, and it is also carried out with appropriate changes within the range that can be suitable for the purpose of the preceding and latter period. Of course, it is possible, and all of them are included in the technical scope of the present invention. In addition, in the following, unless otherwise indicated, "part" means "mass part" and "%" means "mass %".
이하의 실시예에 있어서, 화합물의 구조는 질량 분석(LC; Agilent 제 1200형(型), MASS; Agilent 제 LC/MSD6130형)에 의해 확인하였다.In the following examples, the structure of the compound was confirmed by mass spectrometry (LC; Agilent Model 1200, MASS; Agilent Model LC/MSD6130).
수지의 폴리스티렌 환산의 중량평균 분자량 (Mw) 및 수평균 분자량 (Mn)의 측정은, GPC법에 의해 이하의 조건으로 행하였다.The polystyrene conversion weight average molecular weight (Mw) and number average molecular weight (Mn) of the resin were measured by GPC method under the following conditions.
장치: HLC-8120GPC(도소(주) 제)Device: HLC-8120GPC (manufactured by Tosoh Corporation)
컬럼: TSK-GELG2000HXLColumn: TSK-GELG2000HXL
컬럼 온도: 40℃Column temperature: 40°C
용제: 테트라히드로푸란Solvent: tetrahydrofuran
유속: 1.0 mL/분Flow rate: 1.0 mL/min
분석 시료의 고형분 농도: 0.001∼0.01 질량%Solid content concentration of analysis sample: 0.001 to 0.01 mass %
주입량: 50 μLInjection volume: 50 μL
검출기: RIDetector: RI
교정용 표준 물질: TSK STANDARD POLYSTYRENE F-40, F-4, F-288, A-2500, A-500(도소(주) 제)Calibration standards: TSK STANDARD POLYSTYRENE F-40, F-4, F-288, A-2500, A-500 (manufactured by Tosoh Corporation)
상기에서 얻어진 폴리스티렌 환산의 중량평균 분자량 및 수평균 분자량의 비 (Mw/Mn)을 분산도라고 하였다.The ratio (Mw/Mn) of the weight average molecular weight and the number average molecular weight in terms of polystyrene obtained above was referred to as the degree of dispersion.
합성례 1Synthesis Example 1
3,4,9,10-페릴렌테트라카르본산 이무수물(도쿄가세이공업(주) 제) 8.0부, 7-트리데카아민(도쿄가세이공업(주) 제) 10부, 아세트산 아연 1.3부(간토화학(주) 제), 및 이미다졸(도쿄가세이공업(주) 제) 314부를 첨가하고, 150℃, 3시간 교반하였다. 얻어진 혼합물을 20℃ 이하로 유지하면서, 미리 조제한 37% 염산(간토화학(주) 제) 267부와 물 1300부를 추가한 바, 등적색(橙赤色)의 침전물이 생겼다. 이 등적색의 침전물을 포함하는 혼합물을 여과하고, 여과 후의 잔사를 물 400부, 메탄올 200부로 세정하였다. 얻어진 잔사를 60℃에서 감압 건조하여, 식 (I-2)로 나타내어지는 화합물(화합물 (I-2))을 12부 얻었다(수율 79%).3,4,9,10-perylenetetracarboxylic dianhydride (manufactured by Tokyo Chemical Industry Co., Ltd.) 8.0 parts, 7-tridecaamine (manufactured by Tokyo Chemical Industry Co., Ltd.) 10 parts, zinc acetate 1.3 parts (manufactured by Kanto Chemical Co., Ltd.) and 314 parts of imidazole (manufactured by Tokyo Chemical Industry Co., Ltd.) were added, followed by stirring at 150°C for 3 hours. While maintaining the obtained mixture at 20°C or lower, 267 parts of 37% hydrochloric acid (manufactured by Kanto Chemical Co., Ltd.) prepared in advance and 1300 parts of water were added, and an orange-red precipitate was formed. The mixture containing this orange-red precipitate was filtered, and the residue after filtration was wash|cleaned with 400 parts of water and 200 parts of methanol. The obtained residue was dried under reduced pressure at 60°C to obtain 12 parts of the compound represented by the formula (I-2) (compound (I-2)) (yield 79%).
< 화합물 (I-2)의 동정(同定) ><Identification of compound (I-2)>
(질량분석)이온화 모드=ESI+: m/z=[M+H]+ 755(Mass spectrometry) Ionization mode = ESI +: m/z = [M + H] + 755
Exact Mass: 754 Exact Mass: 754
합성례 2Synthesis example 2
합성례 1에서 얻어진 화합물 (I-2) 5.0부, 수산화칼륨 1.5부(간토화학(주) 제), 및 tert-부틸알코올(간토화학(주) 제) 10부를 첨가하고, 80℃, 1시간 교반하였다. 0℃로 냉각하고, 얻어진 혼합물을 20℃ 이하로 유지하면서, 미리 조제한 염산(간토화학(주) 제) 10부와 물 48부를 추가한 바, 자색(紫色)의 침전물이 생겼다. 이 자색의 침전물을 포함하는 혼합물을 여과하고, 여과 후의 잔사를 물 400부, 에탄올 15부로 세정하였다. 얻어진 잔사를 60℃에서 감압 건조하여, 실리카겔 컬럼(용제: 클로로포름/아세트산=50/1, vol/vol)으로 정제한 바, 식 (I-3)으로 나타내어지는 화합물(화합물 (I-3))을 2.3부 얻었다(수율 61%).5.0 parts of compound (I-2) obtained in Synthesis Example 1, 1.5 parts of potassium hydroxide (manufactured by Kanto Chemical Co., Ltd.), and 10 parts of tert-butyl alcohol (manufactured by Kanto Chemical Co., Ltd.) were added, and the mixture was heated at 80°C for 1 hour. stirred. Cooling to 0°C and maintaining the obtained mixture at 20°C or lower, 10 parts of hydrochloric acid (manufactured by Kanto Chemical Co., Ltd.) and 48 parts of water prepared beforehand were added, and a purple precipitate was formed. The mixture containing this purple precipitate was filtered, and the residue after filtration was washed with 400 parts of water and 15 parts of ethanol. The obtained residue was dried under reduced pressure at 60° C. and purified by a silica gel column (solvent: chloroform/acetic acid = 50/1, vol/vol). The compound represented by formula (I-3) (compound (I-3)) was obtained 2.3 parts (yield 61%).
< 화합물 (I-3)의 동정 ><Identification of compound (I-3)>
(질량분석)이온화 모드=ESI+: m/z=[M+H]+ 574(Mass spectrometry) Ionization mode = ESI +: m/z = [M + H] + 574
Exact Mass:573 Exact Mass:573
합성례 3Synthesis example 3
합성례 2에서 얻어진 화합물 (I-3) 5.0부, 이미다졸 20부(도쿄가세이공업(주) 제), 및 4-디메틸아미노피리딘(도쿄가세이공업(주) 제) 21부를 첨가하고, 170℃, 15시간 교반하였다. 90℃로 냉각하고, 얻어진 혼합물을 미리 조제한 염산(간토화학(주) 제) 520부와 물 2600부와 에탄올 2100부를 추가한 바, 적자색(赤紫色)의 침전물이 생겼다. 이 적자색의 침전물을 포함하는 혼합물을 여과하고, 여과 후의 잔사를 물 400부, 에탄올 15부로 세정하였다. 얻어진 잔사를 60℃에서 감압 건조하여, 실리카겔 컬럼(용제: 클로로포름/아세트산 에틸=2/1, vol/vol)으로 정제한 바, 식 (I-4)로 나타내어지는 화합물(화합물 (I-4))을 1.0부 얻었다(수율 19%).5.0 parts of compound (I-3) obtained in Synthesis Example 2, 20 parts of imidazole (manufactured by Tokyo Chemical Industry Co., Ltd.), and 21 parts of 4-dimethylaminopyridine (manufactured by Tokyo Chemical Industry Co., Ltd.) were added, The mixture was stirred at 170°C for 15 hours. It cooled to 90 degreeC, and when 520 parts of hydrochloric acid (Kanto Chemical Co., Ltd. product) prepared beforehand, 2600 parts of water, and 2100 parts of ethanol were added, the reddish-purple precipitate arose. The mixture containing this reddish-purple precipitate was filtered, and the residue after filtration was wash|cleaned with 400 parts of water and 15 parts of ethanol. The obtained residue was dried under reduced pressure at 60° C. and purified by a silica gel column (solvent: chloroform/ethyl acetate = 2/1, vol/vol), and the compound represented by formula (I-4) (compound (I-4)) ) was obtained (yield 19%).
< 화합물 (I-4)의 동정 ><Identification of compound (I-4)>
(질량분석)이온화 모드=ESI+: m/z=[M+H]+ 596(Mass spectrometry) Ionization mode = ESI +: m/z = [M + H] + 596
Exact Mass: 595 Exact Mass: 595
합성례 4Synthesis Example 4
환류 냉각기, 적하 깔때기 및 교반기를 구비한 플라스크 내에 질소를 적량 흐르게 하여 질소 분위기로 치환하고, 프로필렌글리콜모노메틸에테르아세테이트 280부를 넣고, 교반하면서 80℃까지 가열하였다. 이어서, 아크릴산 38부, 3,4-에폭시트리시클로[5.2.1.02,6]데칸-8-일아크릴레이트 및 3,4-에폭시트리시클로[5.2.1.02,6]데칸-9-일아크릴레이트의 혼합물(함유비는 몰비로 1:1) 289부, 프로필렌글리콜모노메틸에테르아세테이트 125부의 혼합 용액을 5시간 걸쳐 적하하였다. 한편, 2,2-아조비스(2,4-디메틸발레로니트릴) 33부를 프로필렌글리콜모노메틸에테르아세테이트 235부에 용해시킨 용액을 6시간 걸쳐 적하하였다. 적하 종료 후, 80℃에서 4시간 보지(保持)한 후, 실온까지 냉각하여, 고형분 35.1%, B형 점도계(23℃)로 측정한 점도 125 mPa·s의 공중합체(수지 B1) 용액을 얻었다. 생성한 공중합체의 중량평균 분자량 Mw는 9.2×103, 분산도 2.08, 고형분 환산의 산가는 77 mg-KOH/g이었다. 수지 B1은 이하의 구조단위를 갖는다.In a flask equipped with a reflux condenser, a dropping funnel, and a stirrer, an appropriate amount of nitrogen was flowed into the flask, replaced with a nitrogen atmosphere, 280 parts of propylene glycol monomethyl ether acetate was placed, and the mixture was heated to 80°C while stirring. Then, 38 parts of acrylic acid, 3,4-epoxytricyclo[5.2.1.0 2,6 ]decan-8-ylacrylate and 3,4-epoxytricyclo[5.2.1.0 2,6 ]decan-9-ylacrylic A mixed solution of 289 parts of a mixture (content ratio of 1:1) and 125 parts of propylene glycol monomethyl ether acetate was added dropwise over 5 hours. On the other hand, a solution obtained by dissolving 33 parts of 2,2-azobis(2,4-dimethylvaleronitrile) in 235 parts of propylene glycol monomethyl ether acetate was added dropwise over 6 hours. After completion of the dropwise addition, the mixture was held at 80°C for 4 hours, cooled to room temperature, and a copolymer (resin B1) solution having a solid content of 35.1% and a viscosity of 125 mPa·s measured with a B-type viscometer (23°C) was obtained. . The resulting copolymer had a weight average molecular weight Mw of 9.2×10 3 , a dispersion degree of 2.08 and an acid value in terms of solid content of 77 mg-KOH/g. Resin B1 has the following structural units.
실시예 1Example 1
(1) 착색 수지 조성물 1의 조제(1) Preparation of colored resin composition 1
이하의 성분을 혼합하여, 착색 수지 조성물 1을 얻었다.The following components were mixed and the colored resin composition 1 was obtained.
(A) 착색제: 식 (I-4)로 나타내어지는 화합물 2.6부(A) Colorant: a compound represented by formula (I-4) Part 2.6
(B) 수지: 수지 B1 용액 54부(B) Resin: Resin B1 solution 54 copies
(E) 용제: 프로필렌글리콜모노메틸에테르아세테이트 420부(E) Solvent: propylene glycol monomethyl ether acetate 420 copies
(2) 착색 수지 조성물 1'의 조제(2) Preparation of colored resin composition 1'
이어서, 이하의 성분을 혼합하여 착색 수지 조성물 1'를 얻었다.Next, the following components were mixed and colored resin composition 1' was obtained.
착색 수지 조성물 1 478부Colored resin composition 1 478 copies
(C) 중합성 화합물: 디펜타에리스리톨헥사아크릴레이트(C) Polymerizable compound: dipentaerythritol hexaacrylate
(카야라드(등록상표) DPHA; 니혼카야쿠(주) 제) 40부 (Kayarad (registered trademark) DPHA; manufactured by Nihon Kayaku Co., Ltd.) 40 copies
(D) 중합개시제: N-벤조일옥시-1-(4-페닐술파닐페닐)옥탄-1-온-2-이민(이르가큐어(등록상표) OXE 01; BASF사 제) 2부(D) Polymerization initiator: N-benzoyloxy-1-(4-phenylsulfanylphenyl)octan-1-one-2-imine (Irgacure (registered trademark) OXE 01; manufactured by BASF) part 2
(F) 레벨링제: 폴리에테르 변성 실리콘 오일(도레이실리콘 SH8400: 도레이·다우코닝(주) 제) 0.15부(F) Leveling agent: polyether-modified silicone oil (Toray Silicone SH8400: manufactured by Toray Dow Corning Co., Ltd.) 0.15 parts
(2) 착색 도막(컬러 필터)의 제작(2) Production of colored coating film (color filter)
가로세로 5 ㎝의 유리 기판(이글 XG; 코닝사 제) 상에, 착색 수지 조성물을, 포스트베이크 후의 막두께가 2.0 ㎛가 되도록 스핀 코팅법으로 도포한 후, 100℃에서 3분간 프리베이크하여, 착색 조성물층을 형성하였다. 방랭(放冷) 후, 기판 상에 형성된 착색 조성물층에, 노광기(TME-150RSK; 탑콘(주) 제)를 이용하여, 대기 분위기 하, 80 mJ/㎠의 노광량(365 ㎚ 기준)으로 광 조사하였다. 광 조사 후, 오븐 중, 230℃에서 30분간 포스트베이크를 행하여, 착색 도막을 얻었다.On a 5 cm wide glass substrate (Eagle XG; manufactured by Corning), the colored resin composition is applied by spin coating so that the post-baking film thickness becomes 2.0 μm, and then pre-baked at 100° C. for 3 minutes to color. A composition layer was formed. After standing to cool, the coloring composition layer formed on the substrate was irradiated with light at an exposure dose of 80 mJ/cm 2 (based on 365 nm) in an atmospheric atmosphere using an exposure machine (TME-150RSK; manufactured by Topcon Co., Ltd.). did. After light irradiation, in oven, it post-baked at 230 degreeC for 30 minute(s), and obtained the colored coating film.
또한, 착색 도막의 막두께는 DEKTAK3(일본진공기술(주) 제)을 이용하여 측정하였다.In addition, the film thickness of the colored coating film was measured using DEKTAK3 (made by Nippon Vacuum Technology Co., Ltd.).
(3) 콘트라스트 평가(3) Contrast evaluation
얻어진 착색 도막에 대하여, 콘트라스트계(CT-1: 츠보사카덴키(주), 색채색차계 BM-5A: 탑콘사 제, 광원: F-10, 편광 필름: 츠보사카덴키(주))를 이용하여 콘트라스트를 측정하였다. 또한, 측정시의 블랭크 값은 30,000이다. 착색 도막의 콘트라스트가 양호하면, 동일한 착색 수지 조성물로부터 제작된 착색 패턴도, 콘트라스트는 양호하다고 할 수 있다. 결과를 표 6에 나타낸다.About the obtained colored coating film, using a contrast meter (CT-1: Tsubosaka Denki Co., Ltd., chromaticity meter BM-5A: Topcon company make, light source: F-10, polarizing film: Tsubosaka Denki Co., Ltd.) Contrast was measured. In addition, the blank value at the time of measurement is 30,000. If the contrast of a colored coating film is favorable, it can be said that the contrast is also favorable also for the coloring pattern produced from the same colored resin composition. A result is shown in Table 6.
비교예 1Comparative Example 1
실시예 1의 식 (I-4)로 나타내어지는 화합물을 식 (I-2)로 나타내어지는 화합물로 바꾸는 것 이외에는 실시예 1과 마찬가지의 조작을 행하여, 착색 수지 조성물 및 착색 도막을 제작하고, 콘트라스트 평가를 행하였다. 결과를 표 6에 나타낸다.Except for changing the compound represented by the formula (I-4) of Example 1 to the compound represented by the formula (I-2), the same operation as in Example 1 was performed to produce a colored resin composition and a colored coating film, and contrast evaluation was performed. A result is shown in Table 6.
Claims (5)
[식 (I) 중,
R1∼R9는, 서로 독립적으로, 치환기를 갖고 있어도 되는 탄소수 1∼20의 탄화수소기, 수소 원자, 할로겐 원자, 히드록시기, 카르복시기 또는 니트로기를 나타내고, 당해 탄화수소기에 포함되는 메틸렌기는 -O- 또는 -CO-로 치환되어 있어도 된다.
환 Z는 방향족 복소환을 나타낸다.]A colored resin composition comprising a colorant and an alkali-soluble resin, wherein the colorant contains a compound represented by formula (I).
[In formula (I),
R 1 to R 9 each independently represent a hydrocarbon group having 1 to 20 carbon atoms, a hydrogen atom, a halogen atom, a hydroxy group, a carboxy group or a nitro group which may have a substituent, and the methylene group contained in the hydrocarbon group is -O- or - It may be substituted with CO-.
Ring Z represents an aromatic heterocycle.]
환 Z가 질소 원자, 산소 원자, 및 유황 원자로 이루어지는 군으로부터 선택되는 1종 이상을 포함하는 방향족 복소환인 착색 수지 조성물.The method of claim 1,
The colored resin composition in which ring Z is an aromatic heterocyclic ring containing 1 or more types selected from the group which consists of a nitrogen atom, an oxygen atom, and a sulfur atom.
추가로 중합성 화합물 및 중합개시제를 함유하는 착색 수지 조성물.3. The method according to claim 1 or 2,
A colored resin composition further comprising a polymerizable compound and a polymerization initiator.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2021-043487 | 2021-03-17 | ||
JP2021043487A JP2022143135A (en) | 2021-03-17 | 2021-03-17 | colored resin composition |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20220130037A true KR20220130037A (en) | 2022-09-26 |
Family
ID=83324883
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020220032071A KR20220130037A (en) | 2021-03-17 | 2022-03-15 | Colored resin composition |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2022143135A (en) |
KR (1) | KR20220130037A (en) |
CN (1) | CN115113478A (en) |
TW (1) | TW202305505A (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020079397A (en) | 2018-11-13 | 2020-05-28 | 住友化学株式会社 | Coloring composition |
-
2021
- 2021-03-17 JP JP2021043487A patent/JP2022143135A/en active Pending
-
2022
- 2022-02-14 TW TW111105236A patent/TW202305505A/en unknown
- 2022-02-22 CN CN202210160360.2A patent/CN115113478A/en active Pending
- 2022-03-15 KR KR1020220032071A patent/KR20220130037A/en unknown
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020079397A (en) | 2018-11-13 | 2020-05-28 | 住友化学株式会社 | Coloring composition |
Also Published As
Publication number | Publication date |
---|---|
CN115113478A (en) | 2022-09-27 |
JP2022143135A (en) | 2022-10-03 |
TW202305505A (en) | 2023-02-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR102276924B1 (en) | Colored curable resin composition | |
JP6028326B2 (en) | Colored curable resin composition | |
TW201326317A (en) | Colored curable resin composition | |
KR102423136B1 (en) | Colored curable resin composition | |
KR20210119321A (en) | Colored curable resin composition | |
KR20210124318A (en) | Colored curable resin composition | |
KR20230141797A (en) | curable composition | |
KR20220130037A (en) | Colored resin composition | |
JP7474090B2 (en) | Compound and colored resin composition | |
CN113444380B (en) | Compound, colorant and colored resin composition | |
WO2024070371A1 (en) | Composition, optical filter, and solid-state imaging element | |
JP7548834B2 (en) | Colored resin composition | |
KR20220130038A (en) | Colored resin composition, color filter and display device | |
KR20220126231A (en) | Colored resin composition and compound | |
KR20220121728A (en) | Colored resin composition, compound, color filter, and display device | |
CN114380766A (en) | Compound useful as colorant, and colored curable resin composition containing same | |
KR20220118338A (en) | Colored resin composition | |
JP2024088596A (en) | Colored curable resin composition, color filter, display device, and solid-state imaging element | |
CN118584748A (en) | Curable resin composition, color filter and display device | |
TW202436524A (en) | Curable resin composition, color filter and display device | |
WO2021065802A1 (en) | Benzoperylene compound and color curable resin composition | |
KR20220136169A (en) | Curable resin composition and its cured product | |
CN115340774A (en) | Red coloring composition | |
KR20220121204A (en) | Colored resin composition | |
KR20210146343A (en) | Colored curable resin composition, color filter, and solid-state image sensor |