WO2024065448A1 - 彩膜基板、显示基板及显示装置 - Google Patents

彩膜基板、显示基板及显示装置 Download PDF

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Publication number
WO2024065448A1
WO2024065448A1 PCT/CN2022/122786 CN2022122786W WO2024065448A1 WO 2024065448 A1 WO2024065448 A1 WO 2024065448A1 CN 2022122786 W CN2022122786 W CN 2022122786W WO 2024065448 A1 WO2024065448 A1 WO 2024065448A1
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WIPO (PCT)
Prior art keywords
pixel
sub
area
pixels
color film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
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PCT/CN2022/122786
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English (en)
French (fr)
Inventor
卢彦春
王永灿
余娅
张明飞
施申伟
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
Original Assignee
BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
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Application filed by BOE Technology Group Co Ltd, Hefei Xinsheng Optoelectronics Technology Co Ltd filed Critical BOE Technology Group Co Ltd
Priority to PCT/CN2022/122786 priority Critical patent/WO2024065448A1/zh
Priority to US18/271,673 priority patent/US20240393511A1/en
Priority to CN202280003390.0A priority patent/CN118119883A/zh
Publication of WO2024065448A1 publication Critical patent/WO2024065448A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/003—Light absorbing elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/441—Interconnections, e.g. scanning lines
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/40—OLEDs integrated with touch screens
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/50—OLEDs integrated with light modulating elements, e.g. with electrochromic elements, photochromic elements or liquid crystal elements

Definitions

  • the present disclosure relates to the technical field of display equipment, and in particular to a color film substrate, a display substrate and a display device.
  • the display area of the color filter substrate included in many display devices is a special-shaped display area, with a special-shaped or rounded design at the boundary line of the display area to adapt to different application scenarios of the display device.
  • the contours of the irregular or rounded corners of the display area of the color filter substrate are shielded by a black matrix layer to achieve grayscale transition at the edges of the contours.
  • the black matrix layer when used to block the pixels corresponding to the irregular or rounded corner positions of the display area, a blocking method is usually adopted in which the upper domain and the lower domain of the pixel are each blocked, so that the opening area formed by the pixel is distributed on both sides of the pixel.
  • the black matrix in the middle of the pixel is also arranged in the row direction, thereby causing visual burrs at the irregular or rounded corner positions of the display area of the color filter substrate, affecting the display effect of the color filter substrate.
  • the embodiments of the present disclosure provide a color filter substrate, a display substrate and a display device to solve the problem of burrs appearing at irregular shapes or rounded corners of a display area of a color filter substrate in the related art.
  • an embodiment of the present disclosure provides a color film substrate, the color film substrate comprising:
  • a base substrate wherein the base substrate has a special-shaped display area and a peripheral area surrounding the special-shaped display area;
  • the special-shaped display area includes a plurality of first pixels and at least one second pixel, wherein the second pixels are closer to the peripheral area than the first pixels, and the shape of the boundary line of each second pixel close to the peripheral area is the same as the shape of the boundary line of the peripheral area;
  • a black matrix layer wherein the black matrix layer comprises a plurality of shielding structures, and at least one of the plurality of shielding structures shields the second pixel in a single domain or shields all around to form an opening area;
  • the shielding structure shields the second pixel in a single domain, the area of the opening region formed by the second pixel is greater than half of the area of the second pixel;
  • the shielding structure shields the second pixel on all sides, the opening area formed by the second pixel is concentrated in the middle of the second pixel.
  • the second pixel includes multiple first sub-pixels, at least one of the multiple first sub-pixels is an irregular sub-pixel, and after the blocking structure performs the single-domain blocking on the first sub-pixel, the area of the opening area formed by each first sub-pixel is equal.
  • the overlapping portion of the projection of the shielding structure on the base substrate along the first direction and the projection of the irregular sub-pixel on the color filter substrate along the first direction is a first figure, and the area of the first figure is smaller than half of the area of the irregular sub-pixel.
  • the overlapping portion of the projection of the blocking structure along the first direction on the base substrate and the projection of the irregular sub-pixel along the first direction on the color film substrate is the blocking portion, and the area of the blocking portion and the blocking position of the irregular sub-pixel at different positions of the irregular display area are different, wherein the blocking position is the position of the irregular sub-pixel on either side of the midline of the pixel row upward.
  • the special-shaped display area is provided with a blind hole
  • the blind hole is arranged close to the peripheral area, and a plurality of the second sub-pixels are arranged around the blind hole.
  • the blind hole includes a first part, a second part and a third part
  • the black matrix layer includes at least a first blocking structure, a second blocking structure and a third blocking structure
  • the second portion is located between the first portion and the third portion, and the first portion is close to the peripheral area;
  • the first shielding structure shields the second sub-pixel arranged in the first portion to form a first opening area
  • the second shielding structure shields the second sub-pixel arranged in the second portion to form a second opening area
  • the third shielding structure shields the second sub-pixel arranged in the second portion to form a third opening area
  • the first opening area is located on a side of the second sub-pixel close to the peripheral area
  • the third opening area is located on a side of the second sub-pixel close to the peripheral area
  • the second opening area is located in a middle portion of the second sub-pixel.
  • the area of the first part is equal to the area of the second part.
  • first portion and the second portion are both fan-shaped structures, and the center angle of the first portion and the center angle of the second portion are both between 76° and 90°.
  • the second pixel includes a plurality of first sub-pixels, at least one of the plurality of first sub-pixels is an irregular sub-pixel, the shielding structure shields the first sub-pixel on all sides, and the area of the opening region formed by each first sub-pixel is equal.
  • the width of the opening area formed by the shielding structure shielding the second sub-pixel is less than 10 micrometers, wherein the width of the opening area is the size of the opening area along the column direction of the second sub-pixel.
  • At least a portion of the boundary of the special-shaped display area is an arc, and a boundary line adjacent to the arc is tangent to the arc.
  • the color filter substrate further includes a signal line
  • the signal line is connected to each second sub-pixel in the color filter substrate.
  • the signal line includes: a plurality of data lines and a plurality of gate lines;
  • Each of the data lines is connected to a column of the second sub-pixels, and each of the gate lines is connected to a row of the second sub-pixels.
  • At least one data line among the plurality of data lines is in a bent shape, and at least one of the second sub-pixels in a column of the second sub-pixels connected to the bent data line is the irregular-shaped sub-pixel.
  • At least one gate line among the plurality of gate lines is bent, and at least one sub-pixel in a row of the second sub-pixels connected by the bent gate line is a heteromorphic sub-pixel.
  • the data line includes a touch signal line
  • the touch signal line is connected to a target second sub-pixel included in the second pixel, wherein the target second sub-pixel is a blue sub-pixel.
  • an embodiment of the present disclosure further provides a display substrate, wherein the electronic device comprises the color film substrate described in the first aspect.
  • an embodiment of the present disclosure further provides a display device, wherein the electronic device comprises the display substrate described in the second aspect.
  • the source-drain metal layer includes a first signal line and a second signal line
  • the auxiliary signal transmission layer includes a third signal line and a fourth signal line
  • the third signal line and the first signal line are arranged overlappingly
  • the fourth signal line and the second signal line are arranged overlappingly.
  • the signal can continue to be transmitted through the third signal line arranged overlappingly with the first signal line, and the signal can continue to be transmitted through the fourth signal line arranged overlappingly with the second signal line, so that the signal can continue to be transmitted, thereby reducing the occurrence of poor signal conduction caused by foreign matter to a certain extent, and ensuring the display effect of the color film substrate.
  • FIG1 is a schematic diagram of pixel distribution of a color filter substrate provided by an embodiment of the present disclosure
  • FIG2 is a schematic diagram showing a cross-sectional structure of a color filter substrate provided in an embodiment of the present disclosure
  • FIG3 is a schematic diagram of pixel distribution of a color filter substrate in the area of FIG1A provided by an embodiment of the present disclosure
  • FIG4 is a schematic diagram of pixel distribution of a color filter substrate in the area of FIG1B provided by an embodiment of the present disclosure
  • FIG5 is a schematic diagram of pixel distribution of a color filter substrate in area C of FIG1 according to an embodiment of the present disclosure
  • FIG6 is a schematic diagram of pixel distribution of a color filter substrate in the area of FIG1D provided by an embodiment of the present disclosure
  • FIG. 7 is a schematic diagram showing a change in the area of the opening region formed by the second sub-pixel in the area A and area B of the color filter substrate provided by an embodiment of the present disclosure
  • FIG8 is a schematic diagram showing a change in the area of the opening region formed by the second sub-pixel in the area C and the area D of the color filter substrate provided by an embodiment of the present disclosure
  • FIG9 is a schematic diagram showing the distribution of opening areas formed after pixels of a color filter substrate provided by an embodiment of the present disclosure are blocked by a single domain;
  • FIG10 is a schematic diagram showing the distribution of opening areas formed after pixels of a color filter substrate provided by an embodiment of the present disclosure are blocked on all sides;
  • FIG11 is a schematic diagram showing the regional distribution of blind holes of a color filter substrate provided by an embodiment of the present disclosure
  • FIG. 12 is a schematic diagram showing the distribution of signal lines of a color filter substrate provided by an embodiment of the present disclosure.
  • 1 substrate; 2: special-shaped display area; 3: peripheral area; 4: black matrix layer; 5: blind hole; 6: signal line; 21: first pixel; 22: second pixel; 51: first part; 52: second part; 53: third part; 61: data line; 62: line; 201: opening area; 221: first sub-pixel.
  • first and second are used for descriptive purposes only and are not to be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features.
  • a feature defined as “first” or “second” may explicitly or implicitly include one or more of the features.
  • plural means two or more.
  • the expression “electrically connected” and its derivatives may be used.
  • the term “electrically connected” may be used to indicate that two or more components have direct physical or electrical contact with each other.
  • a and/or B includes the following three combinations: A only, B only, and a combination of A and B.
  • “approximately” includes the stated values and averages that are within an acceptable range of deviation from the particular value, where the acceptable range of deviation is determined by one of ordinary skill in the art taking into account the measurements in question and the errors associated with the measurement of the particular quantity (i.e., the limitations of the measurement system).
  • “same layer” refers to a layer structure formed by using the same film-forming process to form a film layer for forming a specific pattern, and then using the same mask to form a layer structure through a single patterning process.
  • a single patterning process may include multiple exposure, development or etching processes, and the specific pattern in the formed layer structure may be continuous or discontinuous, and these specific patterns may also be at different heights or have different thicknesses.
  • “different layers” refers to a layer structure formed by using corresponding film-forming processes to form a film layer for forming a specific pattern, and then using corresponding mask templates through a patterning process. For example, "two layer structures are arranged in different layers” means that the two layer structures are formed in corresponding process steps (film-forming process and patterning process).
  • Exemplary embodiments are described herein with reference to cross-sectional views and/or plan views that are idealized exemplary drawings.
  • the thickness of layers and regions are exaggerated for clarity. Therefore, variations in shape relative to the drawings due to, for example, manufacturing techniques and/or tolerances are conceivable. Therefore, the exemplary embodiments should not be interpreted as being limited to the shapes of the regions shown herein, but include shape deviations due to, for example, manufacturing. For example, an etched region shown as a rectangle will typically have curved features. Therefore, the regions shown in the drawings are schematic in nature, and their shapes are not intended to illustrate the actual shape of regions of the device, and are not intended to limit the scope of the exemplary embodiments.
  • an embodiment of the present disclosure provides a color filter substrate
  • FIG. 1 is a schematic diagram of pixel distribution of the color filter substrate provided by the embodiment of the present disclosure
  • FIG. 2 is a schematic diagram of a cross-sectional structure of the color filter substrate provided by the embodiment of the present disclosure
  • FIG. 3 is a schematic diagram of pixel distribution of the color filter substrate provided by the embodiment of the present disclosure in the area of FIG. 1A. As shown in FIG. 1 , FIG. 2 and FIG.
  • the color filter substrate comprises: a base substrate 1, the base substrate 1 having a special-shaped display area 2 and a peripheral area 3 surrounding the special-shaped display area 2;
  • the special-shaped display area 2 comprises a plurality of first pixels 21 and at least one second pixel 22, wherein the second pixel 22 is close to the peripheral area 3 relative to the first pixel 21, and each second pixel 22 is close to the peripheral area 3.
  • the shape of the boundary line is the same as the shape of the boundary line of the peripheral area 3; the black matrix layer 4, the black matrix layer 4 includes multiple blocking structures, at least one of the multiple blocking structures performs single-domain blocking or all-around blocking on the second pixel 22 to form an opening area 201; when the blocking structure performs single-domain blocking on the second pixel 22, the area of the opening area 201 formed by the second pixel 22 is greater than half of the area of the second pixel 22; when the blocking structure blocks the second pixel 22 all around, the opening area 201 formed by the second pixel 22 is concentrated in the middle of the second pixel 22.
  • the first pixel 21 is far from the boundary line of the special-shaped display area 2, and the second pixel 22 is close to the boundary line of the special-shaped display area 2.
  • the first pixel 21 and the second pixel 22 can be located in the same layer of the base substrate 1. And the first pixel 21 and the second pixel 22 can be arranged in the same layer.
  • each film layer included in the first pixel 21 and the corresponding film layer in the second pixel 22 can be prepared by the same patterning process.
  • the second pixel 22 is closer to the peripheral area 3 relative to the first pixel 21, and the shape of the boundary line of each second pixel 22 close to the peripheral area 3 is the same as the shape of the boundary line of the peripheral area 3, when the boundary line of the peripheral area 3 is in an arc shape, a sawtooth shape, etc., the shape of the second pixel 22 close to the peripheral area 3 is also in an arc shape, a sawtooth shape, etc., that is, the second pixel 22 is an irregular pixel compared to the first pixel 21.
  • the black matrix layer 4 may be located on a side of the plurality of first pixels 21 and the at least one second pixel 22 away from the base substrate 1.
  • the black matrix layer 4 may form an opening area 201 in the area where each pixel in the plurality of first pixels 21 and the at least one second pixel 22 is located, so that light emitted by each pixel can be emitted from the opening area 201, thereby realizing normal display of the display device.
  • the black matrix layer 4 includes a plurality of shielding structures, and at least one of the plurality of shielding structures performs single-domain shielding or all-around shielding on the second pixel 22.
  • the formed opening area 201 close to the boundary line of the peripheral area 3 is the same as the boundary line of the peripheral area 3, so that the opening area 201 formed by the second pixel 22 can be prevented from exceeding the irregular display area 2 of the color filter substrate, and the presence of burrs on the graphics displayed at the boundary line of the irregular display area 2 domain can be avoided.
  • the single-domain shielding can be understood as shielding the pixel on one side along the column direction of the pixel, so that when the shielding structure performs single-domain shielding on the second pixel 22, the area of the opening region 201 formed by the second pixel 22 is greater than half of the area of the second pixel 22, that is, the area of the second pixel 22 shielded by the shielding structure is less than half of the area of the second pixel 22, and the shielded position of the second pixel 22 is located on either side of the midline in the pixel row direction.
  • the opening region 201 formed by the second pixel 22 can form an integral structure through single-domain shielding, and the shielding position of the second pixel 22 by the shielding structure can be adjusted as the line at the boundary of the special-shaped display area 2 changes, so as to adapt to the special-shaped display area 2 and avoid the presence of burrs in the graphics displayed at the boundary line of the special-shaped display area 2.
  • the shading on all sides can be used when a small aperture ratio is required, such as when the size of the opening area 201 formed by the second pixel 22 in the pixel column direction is less than 10 microns, so that the shading structure is shading along the circumference of the second pixel 22, that is, the edge position of the second pixel 22 along the pixel row direction and the edge position along the pixel column direction are both shading by the shading structure, so that the shading on all sides can make the opening area 201 formed by the second pixel 22 concentrated in the middle of the second pixel 22.
  • the spacing between the upper and lower blocks can be widened, and the gray scale of the color filter substrate can be more accurate when the exposure resolution capability is met.
  • the pixel row direction is the direction shown by X in Figure 1
  • the pixel column direction is the direction shown by Y in Figure 1.
  • the spacing of pixels in the row direction is 30 microns
  • the grayscale of a certain place near the peripheral area 3 of the special-shaped display area 2 is 72
  • the area of the opening area 201 formed by the second pixel 22 is 300 square microns
  • the spacing of pixels in the column direction is 10 microns.
  • the minimum pixel spacing that the exposure machine can achieve needs to be greater than 14 microns, the exposure machine cannot meet the exposure resolution capability, so that the grayscale cannot reach 72.
  • the spacing of pixels in the row direction can be adjusted to 20 microns, and the spacing of pixels in the column direction is 15 microns, so that the spacing of pixels in the row direction and the column direction both meet the exposure resolution capability of the exposure machine, so that the grayscale accurately reaches 72.
  • At least part of the boundary of the special-shaped display area 2 is an arc, and the boundary line adjacent to the arc is tangent to the arc, so that part of the special-shaped display area 2 presents a regular arc structure, so as to present an arc-shaped rounded structure at the four corners.
  • the black matrix layer 4 includes multiple shielding structures, at least one of the multiple shielding structures performs single-domain shielding or all-around shielding on the second pixel 22 to form an opening area 201.
  • the shielding structure performs single-domain shielding on the second pixel 22
  • the area of the opening area 201 formed by the second pixel 22 is greater than half of the area of the second pixel 22.
  • the opening area 201 formed by the second pixel 22 is concentrated in the middle of the second pixel 22, so that the middle of the second pixel is the opening area 201, and the opening area 201 is an integral structure, thereby avoiding the occurrence of burrs in the black matrix in the middle of the second pixel 22 when it is continuously arranged.
  • the second pixel 22 includes a plurality of first sub-pixels 221 , at least one of the plurality of first sub-pixels 221 being an irregular sub-pixel, and after the occluding structure performs single-domain occlusion on the first sub-pixel 221 , the areas of the formed opening regions 201 are equal.
  • the three first sub-pixels 221 included in each second pixel 22 may be a red (red, R) sub-pixel, a green (green, G) sub-pixel, and a blue (blue, B) sub-pixel, wherein the color of the light emitted by the red sub-pixel is red, the color of the light emitted by the green sub-pixel is green, and the color of the light emitted by the blue sub-pixel is blue.
  • the areas of the opening regions 201 formed after the shielding structure shields the first sub-pixels 221 in a single domain are equal, the brightness of the light emitted by each first sub-pixel 221 is consistent, thereby avoiding color shift.
  • the overlapping portion of the projection of the shielding structure along the first direction on the base substrate 1 and the projection of the irregular sub-pixel along the first direction on the color filter substrate is a first figure, and the area of the first figure is smaller than half of the area of the irregular sub-pixel.
  • the overlapping part of the projection of the shielding structure on the base substrate 1 along the first direction and the projection of the shaped sub-pixel on the color filter substrate along the first direction is the first figure, and the area of the first figure is less than half of the area of the shaped sub-pixel, that is, the area of the opening area 201 formed by the shaped sub-pixel is greater than half of the area of the shaped sub-pixel, and the shielded position of the shaped sub-pixel is located on either side of the midline in the pixel row direction.
  • the opening area 201 formed by the shaped sub-pixel can form an integral structure through single-domain shielding, and the shielding position of the shaped sub-pixel by the shielding structure can be adjusted as the line at the boundary of the shaped display area 2 changes, so as to adapt to the shaped display area 2 and avoid the presence of burrs in the figure displayed at the boundary line of the shaped display area 2.
  • the specific shielding method for the special-shaped sub-pixels located at different positions in different special-shaped display areas 2 can be as follows: as shown in Figures 3, 4, 5 and 6, the projection of the shielding structure along the first direction on the base substrate 1, and the overlapping part of the projection of the special-shaped sub-pixel along the first direction on the color film substrate are the shielding parts, and the areas and shielding positions of the shielding parts of the special-shaped sub-pixels at different positions in the special-shaped display area 2 are different, wherein the shielding position is the position of the special-shaped sub-pixel on either side of the midline of the pixel row upward.
  • the shielding position may be the side of the midline of the irregular sub-pixel in the upward direction of the pixel row close to the peripheral area 3, and as shown in FIG8 , for the rounded corners at C and D, it may be the side of the midline of the irregular sub-pixel in the upward direction of the pixel row away from the peripheral area 3.
  • the area of the shielded portion is also constantly changing to adapt to the arc transition of the rounded corner.
  • the area of the shielded portion gradually changes in grayscale from area B to area A along the X direction in FIG1
  • the size of the shielded portion along the column direction of the pixel corresponding to the second pixel 22 with a grayscale of 254 is 4.5 microns
  • the size of the shielded portion along the column direction of the pixel corresponding to the second pixel 22 with a grayscale of 251 is 10.5 microns
  • the size of the shielded portion along the column direction of the pixel corresponding to the second pixel 22 with a grayscale of 248 is 13.8 microns
  • the size of the shielded portion along the column direction of the pixel corresponding to the second pixel 22 with a grayscale of 242 is 13.8 microns.
  • the second pixel 22 with a grayscale of 232, the second pixel 22 with a grayscale of 219, the second pixel 22 with a grayscale of 204, the second pixel 22 with a grayscale of 184, the second pixel 22 with a grayscale of 150, the second pixel 22 with a grayscale of 123, and the second pixel 22 with a grayscale of 72, respectively, have corresponding sizes of the blocked parts along the column direction of the pixels of 18.8 microns, 26.2 microns, 35.2 microns, 45.2 microns, 56.6 microns, 73.6 microns, 90.2 microns, and 91.1 microns, respectively.
  • the grayscale of the irregular display area 2 can be gradually transitioned, so that the opening area 201 formed by the second pixel 22 can be reduced synchronously with the reduction of the pixel area of the second pixel 22, thereby avoiding the influence on the actual display effect of the boundary of the irregular display area 2, and further improving the display effect.
  • the special-shaped display area 2 is provided with a blind hole 5, the blind hole 5 is provided close to the peripheral area, and a plurality of second sub-pixels are provided around the blind hole 5. In this way, the normal entry and exit of light can be met through the blind hole 5 to meet the light requirements such as video recording and shooting.
  • the opening area 201 formed by the second pixel 22 will be arranged according to a certain direction rule, which will reduce the adaptability to the contour of the blind hole 5, and then the horizontal stripe phenomenon will occur, affecting the display effect of the color film substrate.
  • the blind hole 5 may include a first part 51, a second part 52 and a third part 53, and the black matrix layer 4 includes at least a first shielding structure, a second shielding structure and a third shielding structure;
  • the second part 52 is located between the first part 51 and the third part 53, and the first part 51 is close to the peripheral area 3;
  • the first shielding structure blocks the second sub-pixel arranged in the first part 51 to form a first opening area 201, the second shielding structure blocks the second sub-pixel arranged in the second part 52 to form a second opening area 201, and the third shielding structure blocks the second sub-pixel arranged in the second part 52 to form a third opening area 201;
  • the first opening area 201 is located on the side of the second sub-pixel close to the peripheral area 3
  • the third opening area 201 is located on the side of the second sub-pixel close to the peripheral area 3
  • the second opening area 201 is located in the middle of the second sub-pixel.
  • the first shielding structure shields the second sub-pixel arranged around the first portion 51 to form the first opening area 201
  • the first opening area 201 is located on the side of the second sub-pixel close to the peripheral area 3
  • the second portion 52 is located between the first portion 51 and the third portion 53, and the first portion 51 is close to the peripheral area 3
  • the first opening area 201 is located on the side of the second sub-pixel close to the peripheral area 3
  • the third opening area 201 is located on the side of the second sub-pixel close to the peripheral area 3
  • the second opening area 201 is located in the middle of the second sub-pixel, so that the shielding part of the blind hole 5 close to the peripheral area 3 is the side of the second pixel 22 close to the peripheral area 3.
  • the shielding part of the blind hole 5 away from the peripheral area 3 is the side of the second pixel 22 away from the peripheral area 3.
  • the shielding part of the blind hole 5 away from the peripheral area 3 is the middle of the second pixel 22. In this way, the opening areas 201 formed by the second pixels 22 at different positions around the blind hole 5 are all arranged around the blind hole 5, thereby improving the adaptability of the opening area 201 to the contour of the blind hole 5, thereby avoiding the occurrence of horizontal stripes, and further improving the display effect of the color film substrate at the blind hole 5.
  • the area of the first portion 51 is equal to the area of the second portion 52.
  • the first shielding structure shields the first opening area 201 formed by the second sub-pixel arranged around the first portion 51
  • the second shielding structure shields the second sub-pixel arranged around the second portion 52 to form the second opening area 201, which are arranged in a relative manner, and the distance in the axial direction of the blind hole 5 is equal, which is more conducive to improving the display effect of the color film substrate at the blind hole 5.
  • first part 51 and the second part 52 are both fan-shaped structures, and the center angle of the first part 51 and the center angle of the second part 52 are both between 76° and 90°. This can achieve the best display effect of the color filter substrate at the blind hole 5. It should be noted that the center angle of the first part 51 and the center angle of the second part 52 can be determined according to the size of the blind hole 5, and the embodiment of the present disclosure does not limit this.
  • the second pixel 22 includes a plurality of first sub-pixels 221, at least one of the plurality of first sub-pixels 221 being an irregular sub-pixel, and the occlusion structure occludes the first sub-pixel 221 on all sides, and the area of the opening region 201 formed by each first sub-pixel 221 is equal.
  • the shielding structure shields the first sub-pixel 221 on all sides, the opening region 201 formed by each first sub-pixel 221 has the same area, so the brightness of the light emitted by each first sub-pixel 221 is consistent, thereby avoiding color shift.
  • the 4-sided shielding can be used when a small aperture ratio is required, such as when the size of the opening area 201 formed by the irregular pixel in the pixel column direction is less than 10 microns, so that the shielding structure shields along the circumference of the irregular pixel, that is, the edge position of the irregular pixel along the pixel row direction and the edge position along the pixel column direction are shielded by the shielding structure, so that the 4-sided shielding can make the opening area 201 formed by the irregular pixel concentrated in the middle of the irregular pixel. In this way, the spacing between the upper and lower blocks can be widened, and the gray scale of the color filter substrate can be more accurate while meeting the exposure resolution capability.
  • the spacing of pixels in the row direction is 30 microns
  • the grayscale of a certain place of the special-shaped display area 2 close to the peripheral area 3 is 72
  • the area of the opening area 201 formed by the special-shaped pixels is 300 square microns
  • the spacing of pixels in the column direction is 10 microns.
  • the minimum pixel spacing that the exposure machine can achieve needs to be greater than 14 microns, the exposure machine cannot meet the exposure resolution capability, so that the grayscale cannot reach 72.
  • the spacing of pixels in the row direction can be adjusted to 20 microns, and the spacing of pixels in the column direction is 15 microns, so that the spacing of pixels in the row direction and the column direction both meet the exposure resolution capability of the exposure machine, so that the grayscale accurately reaches 72.
  • the color filter substrate further includes a signal line 6 , and the signal line 6 is connected to each second sub-pixel in the color filter substrate.
  • the signal line 6 may include a plurality of data lines 61 and a plurality of gate lines.
  • Each data line 61 may be connected to a column of sub-pixels, and each gate line may be connected to a row of sub-pixels.
  • the multiple sub-pixels included in each pixel are arranged along the pixel row direction. Since the length of the irregular sub-pixels included in the second pixel 22 in the pixel row direction is different from the length of the sub-pixels included in the first pixel 21 in the pixel row direction, in order to enable the data line 61 to connect the first sub-pixel 221 in the irregular pixel and the sub-pixels in the second pixel 22, at least one of the multiple data lines 61 can be bent. Moreover, at least one sub-pixel in a column of sub-pixels connected by the bent data line 61 is an irregular sub-pixel.
  • the multiple sub-pixels included in each pixel are arranged along the pixel column direction. Since the length of the second pixel 22 in the pixel column direction is different from the length of the first pixel 21 in the pixel column direction, in order to enable the gate line to connect the first sub-pixel 221 in the first pixel 21 and the sub-pixel in the second pixel 22, at least one of the multiple gate lines can be bent. Moreover, at least one sub-pixel in a row of sub-pixels connected by the bent gate line is a special-shaped sub-pixel.
  • the data line 61 includes a touch signal line 6 ; the touch signal line 6 is connected to a target second sub-pixel included in the second pixel 22 , wherein the target second sub-pixel is a blue sub-pixel.
  • the touch signal line 6 is connected to the target second sub-pixel included in the second pixel 22, that is, the touch signal line 6 is only on the blue color resistance of the blue sub-pixel, and since the traditional simulation method does not consider the blue color resistance, it is simulated according to the color resistance of the red sub-pixel, and then applied to the color resistance of the red sub-pixel, the color resistance of the green sub-pixel, and the color resistance of the blue sub-pixel. In this way, the difference in white point coordinates will be caused, and the macroscopic manifestation is the color temperature difference. In severe cases, the boundary line of the special-shaped display area 2 will appear slightly yellow or blue, affecting the display effect.
  • the touch signal line 6 is connected to the target second sub-pixel included in the second pixel 22, so the color resistance of the red sub-pixel and the color resistance of the blue sub-pixel can be simulated respectively, so that the blue sub-pixel, the red sub-pixel and the green sub-pixel are always at the same aperture ratio, so that the brightness of the light emitted by each first sub-pixel 221 is consistent, thereby avoiding color deviation.
  • each pixel can be set differently without glitches.
  • the upper and lower domains can be blocked at the same time, so that the opening area 201 formed by the pixel is concentrated in the middle of the pixel.
  • a single domain blocking method can be used, that is, the upper domain or the lower domain of the pixel is blocked, so that the area of the opening area 201 formed by the pixel is larger than half of the area of the second pixel 22.
  • the grayscale is small, that is, the blocking area is small, the pixels can be set differently without glitches to achieve the best display effect.
  • the blocking sizes and blocking locations corresponding to different grayscales are shown in the following table:
  • the black matrix layer 4 includes multiple shielding structures, at least one of the multiple shielding structures performs single-domain shielding or all-around shielding on the irregular pixel to form an opening area 201.
  • the shielding structure performs single-domain shielding on the irregular pixel, the area of the opening area 201 formed by the irregular pixel is greater than half of the area of the irregular pixel.
  • the opening area 201 formed by the irregular pixel is concentrated in the middle of the irregular pixel, so that the middle of the second image pixel is the opening area 201, and the opening area 201 is an integral structure, thereby avoiding the occurrence of burrs in the black matrix in the middle of the irregular pixel when it is continuously arranged.
  • the embodiment of the present disclosure further provides a display substrate, which includes the color filter substrate described in any embodiment of the first aspect.
  • the beneficial effects of the display substrate are consistent with the beneficial effects of the above-mentioned color filter substrate, and the embodiment of the present disclosure will not be repeated.
  • an embodiment of the present disclosure provides a display device, which includes the display device described in the second aspect.
  • the display device can be a mobile display device such as a mobile phone, a tablet computer, a laptop computer, a PDA, a car display device, a wearable device, an ultra-mobile personal computer (UMPC), a netbook or a personal digital assistant (PDA), and a non-mobile display device can be a personal computer (PC), a television (TV), a teller machine or a self-service machine, etc., which is not specifically limited in the embodiments of the present disclosure.
  • the beneficial effects of the display device are consistent with the beneficial effects of the above-mentioned color film substrate, and the embodiments of the present disclosure will not be repeated.

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Abstract

本公开实施例提供了一种彩膜基板、显示基板及显示装置。彩膜基板包括：衬底基板，衬底基板上具有异形显示区域以及围绕异形显示区域的周边区域；异形显示区内包括多个第一像素和至少一个第二像素，其中，第二像素相对于第一像素靠近周边区域，且每个第二像素靠近周边区域的边界线的形状和周边区域的边界线的形状相同；黑矩阵层，黑矩阵层包括多个遮挡结构，多个遮挡结构中的至少一个遮挡结构对第二像素进行单畴遮挡或者四周遮挡以形成开口区域；在遮挡结构对第二像素进行单畴遮挡的情况下，第二像素形成的开口区域的面积大于第二像素面积的二分之一；在遮挡结构对第二像素进行四周遮挡的情况下，第二像素形成的开口区域集中在第二像素的中部。

Description

彩膜基板、显示基板及显示装置 技术领域
本公开涉及显示设备技术领域，具体涉及一种彩膜基板、显示基板及显示装置。
背景技术
随着显示装置的不断发展，人们对显示装置的显示要求也在逐步提升。其中，许多显示装置包括的彩膜基板的显示区为异形显示区，在显示区边界线处呈现异形或者圆角的设计，以适应显示装置的不同应用场景。
目前，彩膜基板的显示区的异形或者圆角位置的轮廓，是通过黑矩阵层进行遮挡，在轮廓边缘实现灰阶过渡。
然而，由于目前通过黑矩阵层对显示区的异形或者圆角位置对应的像素进行遮挡时，通常采用像素的上畴和下畴各遮挡一部分的遮挡方式，使得像素形成的开口区域分布在像素的两侧。这样，当像素以行向排布时，像素中间的黑矩阵也随着行向排布，进而在彩膜基板的显示区的异形或者圆角位置在视觉上造成毛刺现象，影响彩膜基板的显示效果。
概述
本公开实施例提供了一种彩膜基板、显示基板及显示装置，以解决相关技术中彩膜基板的显示区的异形或者圆角位置出现毛刺的问题。
为了解决上述技术问题，本公开是这样实现的：
第一方面，本公开实施例提供了一种彩膜基板，所述彩膜基板包括：
衬底基板，所述衬底基板上具有异形显示区域以及围绕所述异形显示区域的周边区域；
所述异形显示区内包括多个第一像素和至少一个第二像素，其中，所述第二像素相对于所述第一像素靠近所述周边区域，且每个所述第二像素靠近所述周边区域的边界线的形状和所述周边区域的边界线的形状相同；
黑矩阵层，所述黑矩阵层包括多个遮挡结构，所述多个遮挡结构中的至少一个所述遮挡结构对所述第二像素进行单畴遮挡或者四周遮挡以形成开口区域；
在所述遮挡结构对所述第二像素进行单畴遮挡的情况下，所述第二像素形成的所述开口区域的面积大于所述第二像素面积的二分之一；
在所述遮挡结构对所述第二像素进行四周遮挡的情况下，所述第二像素形成的开口区域集中在所述第二像素的中部。
可选的，所述第二像素包括多个第一子像素，多个所述第一子像素中的至少一个所述第一子像素为异形子像素，所述遮挡结构对所述第一子像素进行所述单畴遮挡后，每个所述第一子像素形成的开口区域的面积相等。
可选的，所述遮挡结构沿第一方向在所述衬底基板上的投影和所述异形子像素沿所述第一方向在所述彩膜基板上的投影重叠的部分为第一图形，所述第一图形的面积小于所述异形子像素的面积的一半。
可选的，所述遮挡结构沿第一方向在所述衬底基板上的投影，和所述异形子像素沿所述第一方向在所述彩膜基板上的投影重叠的部分为遮挡部分，所述异形显示区的不同位置的所述异形子像素的遮挡部分的面积以及遮挡位置不同，其中，所述遮挡位置为所述异形子像素在像素行向上的中线的任一侧所在的位置。
可选的，所述异形显示区设置有盲孔；
所述盲孔靠近于所述周边区设置，多个所述第二子像素围绕所述盲孔设置。
可选的，所述盲孔包括第一部分、第二部分和第三部分，所述黑矩阵层至少包括第一遮挡结构、第二遮挡结构和第三遮挡结构；
所述第二部分位于所述第一部分和所述第三部分之间，且所述第一部分靠近于所述周边区域；
所述第一遮挡结构遮挡饶设在所述第一部分的所述第二子像素形成第一开口区域，所述第二遮挡结构遮挡饶设在所述第二部分的所述第二子像素形成第二开口区域，所述第三遮挡结构遮挡饶设在所述第二部分的所述第二子像素形成第三开口区域；
所述第一开口区域位于所述第二子像素靠近所述周边区域的一侧，所述 第三开口区域位于所述第二子像素靠近所述周边区域的一侧，所述第二开口区域位于所述第二子像素的中部。
可选的，所述第一部分的面积和所述第二部分的面积相等。
可选的，所述第一部分和所述第二部分均为扇形结构，所述第一部分的圆心角和所述第二部分的圆心角均位于76°至90°之间。
可选的，所述第二像素包括多个第一子像素，多个所述第一子像素中的至少一个所述第一子像素为异形子像素，所述遮挡结构对所述第一子像素进行四周遮挡，每个所述第一子像素形成的开口区域的面积相等。
可选的，所述遮挡结构遮挡所述第二子像素形成的开口区域的宽度小于10微米，其中所述开口区域的宽度为所述开口区域沿所述第二子像素的列方向的尺寸。
可选的，所述异形显示区的至少部分边界为弧线，与所述弧线相邻的边界线，与所述弧线相切。
可选的，所述彩膜基板还包括，信号线；
所述信号线与所述彩膜基板中的每个第二子像素连接。
可选的，所述信号线包括:多条数据线和多条栅线；
每条所述数据线与一列所述第二子像素连接，每条所述栅线与一行所述第二子像素连接。
可选的，所述多条数据线中的至少一条数据线呈弯折状,弯折状的所述数据线连接的一列所述第二子像素中至少一个所述第二子像素为所述异形子像素。
可选的，所述多条栅线中的至少一条栅线呈弯折状,弯折状的所述栅线连接的一行所述第二子像素中至少一个所述子像素为异形子像素。
可选的，所述数据线包括触控信号线；
所述触控信号线连接在所述第二像素包括的目标第二子像素中，其中，所述目标第二子像素为蓝色子像素。
第二方面，本公开实施例还提供了一种显示基板，所述电子设备包括第一方面所述的彩膜基板。
第三方面，本公开实施例还提供了一种显示设备，所述电子设备包括第二方面所述的显示基板。
从上述实施例可以看出，在本公开实施例中，由于在源漏金属层的至少一个表面上设置有辅助信号传输层，源漏金属层包括第一信号线和第二信号线，辅助信号传输层包括第三信号线和第四信号线，第三信号线和第一信号线重叠设置，第四信号线和第二信号线重叠设置，这样，在第一信号线或者第二信号线因源漏金属层沉积过程产生异物而发生断路的情况发生时，可以通过与第一信号线重叠设置的第三信号线继续传递信号，通过与第二信号线重叠设置的第四信号线继续传递信号，进而使得信号可以继续传输，从而在一定程度在减少因异物导致的信号传导不良的发生，保证彩膜基板的显示效果。
附图简述
为了更清楚地说明本公开实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作一简单地介绍，显而易见地，下面描述中的附图是本公开的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1是本公开实施例提供的彩膜基板的像素分布示意图；
图2表示本公开实施例提供的彩膜基板的截面结构示意图；
图3是本公开实施例提供的彩膜基板在图1A区的像素分布示意图；
图4是本公开实施例提供的彩膜基板在图1B区的像素分布示意图；
图5是本公开实施例提供的彩膜基板在图1C区的像素分布示意图；
图6是本公开实施例提供的彩膜基板在图1D区的像素分布示意图；
图7表示本公开实施例提供的彩膜基板在图1A区和B区中第二子像素形成的开口区域的面积的变化示意图；
图8表示本公开实施例提供的彩膜基板在图1C区和D区中第二子像素形成的开口区域的面积的变化示意图；
图9表示本公开实施例提供的一种彩膜基板的像素被单畴遮挡后形成的开口区域的分布示意图；
图10表示本公开实施例提供的一种彩膜基板的像素被四周遮挡后形成的开口区域的分布示意图；
图11表示本公开实施例提供的一种彩膜基板的盲孔的区域分布示意图；
图12表示本公开实施例提供的一种彩膜基板的信号线的分布示意图。
附图标记：
1：衬底基板；2：异形显示区；3：周边区域；4：黑矩阵层；5：盲孔；6：信号线；21：第一像素；22：第二像素；51：第一部分；52：第二部分；53：第三部分；61：数据线；62：珊线；201：开口区域；221：第一子像素。
详细描述
下面将结合附图，对本公开一些实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本公开一部分实施例，而不是全部的实施例。基于本公开所提供的实施例，本领域普通技术人员所获得的所有其他实施例，都属于本公开保护的范围。
除非上下文另有要求，否则，在整个说明书和权利要求书中，术语“包括(comprise)”及其其他形式例如第三人称单数形式“包括(comprises)”和现在分词形式“包括(comprising)”被解释为开放、包含的意思，即为“包含，但不限于”。在说明书的描述中，术语“一个实施例(one embodiment)”、“一些实施例(some embodiments)”、“示例性实施例(exemplary embodiments)”、“示例(example)”、“特定示例(specific example)”或“一些示例(some examples)”等旨在表明与该实施例或示例相关的特定特征、结构、材料或特性包括在本公开的至少一个实施例或示例中。上述术语的示意性表示不一定是指同一实施例或示例。此外，所述的特定特征、结构、材料或特点可以以任何适当方式包括在任何一个或多个实施例或示例中。
以下，术语“第一”、“第二”仅用于描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个该特征。在本公开实施例的描述中，除非另有说明，“多个”的含义是两个或两个以上。
在描述一些实施例时，可能使用了“电连接”及其衍伸的表达。例如，描述一些实施例时可能使用了术语“电连接”以表明两个或两个以上部件彼此间有直接物理接触或电接触。
“A和/或B”，包括以下三种组合：仅A，仅B，及A和B的组合。
本文中“被配置为”的使用意味着开放和包容性的语言，其不排除适用于或被配置为执行额外任务或步骤的设备。
如本文所使用的那样，“大致”包括所阐述的值以及处于特定值的可接受偏差范围内的平均值，其中所述可接受偏差范围如由本领域普通技术人员考虑到正在讨论的测量以及与特定量的测量相关的误差(即，测量系统的局限性)所确定。
本文中“同层”指的是采用同一成膜工艺形成用于形成特定图形的膜层，然后利用同一掩模板通过一次构图工艺形成的层结构。根据特定图形的不同，一次构图工艺可能包括多次曝光、显影或刻蚀工艺，而形成的层结构中的特定图形可以是连续的也可以是不连续的，这些特定图形还可能处于不同的高度或者具有不同的厚度。与之相反地，“异层”指的是分别采用相应的成膜工艺形成用于形成特定图形的膜层，然后利用相应的掩模板通过构图工艺形成的层结构，例如，“两个层结构异层设置”是指两个层结构分别在相应的工艺步骤(成膜工艺和构图工艺)下形成。
本文参照作为理想化示例性附图的剖视图和/或平面图描述了示例性实施方式。在附图中，为了清楚，放大了层和区域的厚度。因此，可设想到由于例如制造技术和/或公差引起的相对于附图的形状的变动。因此，示例性实施方式不应解释为局限于本文示出的区域的形状，而是包括因例如制造而引起的形状偏差。例如，示为矩形的蚀刻区域通常将具有弯曲的特征。因此，附图中所示的区域本质上是示意性的，且它们的形状并非旨在示出设备的区域的实际形状，并且并非旨在限制示例性实施方式的范围。
第一方面，本公开实施例提供了一种彩膜基板，图1是本公开实施例提供的彩膜基板的像素分布示意图，图2表示本公开实施例提供的彩膜基板的截面结构示意图，图3是本公开实施例提供的彩膜基板在图1A区的像素分布示意图，如图1、图2和图3所示，彩膜基板包括：衬底基板1，衬底基板1上具有异形显示区2域以及围绕异形显示区2域的周边区域3；异形显示区2内包括多个第一像素21和至少一个第二像素22，其中，第二像素22相对于第一像素21靠近周边区域3，且每个第二像素22靠近周边区域3的 边界线的形状和周边区域3的边界线的形状相同；黑矩阵层4，黑矩阵层4包括多个遮挡结构，多个遮挡结构中的至少一个遮挡结构对第二像素22进行单畴遮挡或者四周遮挡以形成开口区域201；在遮挡结构对第二像素22进行单畴遮挡的情况下，第二像素22形成的开口区域201的面积大于第二像素22面积的二分之一；在遮挡结构对第二像素22进行四周遮挡的情况下，第二像素22形成的开口区域201集中在第二像素22的中部。
其中，第一像素21远离异形显示区2域的边界线，第二像素22靠近异形显示区2域的边界线。第一像素21和第二像素22均可以位于衬底基板1的同一层。且第一像素21与第二像素22可以同层设置。例如，该第一像素21包括的每个膜层,与第二像素22中的对应膜层可以采用同一次构图工艺制备得到。
需要说明的是，由于第二像素22相对于第一像素21靠近周边区域3，且每个第二像素22靠近周边区域3的边界线的形状和周边区域3的边界线的形状相同，因此在周边区域3的边界线为弧形、锯齿形等形状的情况下，使得第二像素22靠近周边区域3的形状也为弧形、锯齿形等形状，即第二像素22相比于第一像素21为异形像素。
黑矩阵层4可以位于多个第一像素21和至少一个第二像素22远离衬底基板1的一侧。此外，该黑矩阵层4可以在多个第一像素21和至少一个第二像素22中的每个像素所在区域形成开口区域201，以使得每个像素发出的光线能够从该开口区域201射出，实现显示装置的正常显示。
在本公开实施例中，黑矩阵层4包括多个遮挡结构，多个遮挡结构中的至少一个遮挡结构对第二像素22进行单畴遮挡或者四周遮挡。在遮挡结构对第二像素22进行单畴遮挡或者四周遮挡后，形成的开口区域201靠近周边区域3的边界线和周边区域3的边界线相同，这样，可以避免第二像素22形成的开口区域201超过彩膜基板的异形显示区2，避免异形显示区2域的边界线处显示的图形的存在毛刺。
需要说明的是，单畴遮挡可以理解为沿像素的列方向遮挡对像素进行单侧遮挡，使得在遮挡结构对第二像素22进行单畴遮挡的情况下，第二像素22形成的开口区域201的面积大于第二像素22面积的二分之一，即第二像素22被遮挡结构遮挡的面积小于第二像素22面积的二分之一，且第二像素 22的被遮挡位置位于像素行方向上中线的任一侧。这样，通过单畴遮挡可以使得第二像素22形成的开口区域201形成一个整体结构，且可以随着异形显示区2的边界处线条的变化调整遮挡结构对第二像素22的遮挡位置，以适应异形显示区2，避免异形显示区2域的边界线处显示的图形的存在毛刺。
四周遮挡可以为需要小开口率的情况下，如第二像素22形成的开口区域201在像素列向的尺寸为10微米以下的情况下时，使得遮挡结构沿第二像素22的周向进行遮挡，即第二像素22的沿像素行向的边缘位置以及沿像素列向的边缘位置均有遮挡结构进行遮挡，使得过四周遮挡可以使得第二像素22形成的开口区域201集中在第二像素22的中部。这样，这样可以拉开上下挡块的间距，满足曝光解析能力的情况下，使得彩膜基板的灰阶更为准确。其中，像素行向如图1中的X所示的方向，像素的列向如图1中Y所示的方向。
示例性的，以像素的行向的间距为30微米，若异形显示区2靠近周边区域3的某处的灰阶为72，第二像素22形成的开口区域201的面积为300平方微米，则以像素的列向的间距为10微米。而由于曝光机能达到的像素间距的最小值需要大于14微米，因此使得曝光机无法满足曝光解析的能力，使得灰阶无法达到72。而在本公开实施例中，由于采用四周遮挡的方式，因此可以使得以像素的行向的间距调整为20微米，则像素的列向的间距则为15微米，使得像素行向和列向的间距均满足曝光机的曝光解析的能力，使得灰阶准确达到72。
在一些实施例中，异形显示区2的至少部分边界为弧线，与弧线相邻的边界线，与弧线相切。这样，即使得异形显示区2部分呈现规则的弧形结构，以在四角处呈现弧形圆角结构。
从上述实施例可以看出，在本公开实施例中，由于黑矩阵层4包括多个遮挡结构，多个遮挡结构中的至少一个遮挡结构对第二像素22进行单畴遮挡或者四周遮挡以形成开口区域201，在遮挡结构对第二像素22进行单畴遮挡的情况下，第二像素22形成的开口区域201的面积大于第二像素22面积的二分之一,在遮挡结构对第二像素22进行四周遮挡的情况下，第二像素22形成的开口区域201集中在第二像素22的中部，因此使得第二像像素的中部为开口区域201，且开口区域201为一个整体结构，进而可以避免第二像 素22中间的黑矩阵在连续排布的情况下出现毛刺现象的发生。
对于单畴遮挡，在一些实施例中，如图9所示，第二像素22包括多个第一子像素221，多个第一子像素221中的至少一个第一子像素221为异形子像素，遮挡结构对第一子像素221进行单畴遮挡后，形成的开口区域201的面积相等。
需要说明的是，在本公开实施例中，每个第二像素22包括的3个第一子像素221可以分别为红色(red，R)子像素，绿色(green，G)子像素以及蓝色(blue，B)子像素。其中，该红色子像素发出的光线的颜色为红色，该绿色子像素发出的光线的颜色为绿色,该蓝色子像素发出的光线的颜色为蓝色。
此外，由于遮挡结构对第一子像素221进行单畴遮挡后，形成的开口区域201的面积相等，因此使得各个第一子像素221发出的光线的亮度一致，进而可以避免色偏。
进一步的，遮挡结构沿第一方向在衬底基板1上的投影和异形子像素沿第一方向在彩膜基板上的投影重叠的部分为第一图形，第一图形的面积小于异形子像素的面积的一半。
需要说明的是，遮挡结构沿第一方向在衬底基板1上的投影和异形子像素沿第一方向在彩膜基板上的投影重叠的部分为第一图形，第一图形的面积小于异形子像素的面积的一半，即异形子像素形成的开口区域201的面积大于异形子像素面积的二分之一，且异形子像素的被遮挡位置位于像素行方向上中线的任一侧。这样，通过单畴遮挡可以使得异形子像素形成的开口区域201形成一个整体结构，且可以随着异形显示区2的边界处线条的变化调整遮挡结构对异形子像素的遮挡位置，以适应异形显示区2，避免异形显示区2域的边界线处显示的图形的存在毛刺。
具体的，对于位于不同异形显示区2的不同位置的异形子像素具体的遮挡方式可以如下所示：如图3、图4、图5和图6所示，遮挡结构沿第一方向在衬底基板1上的投影，和异形子像素沿第一方向在彩膜基板上的投影重叠的部分为遮挡部分，异形显示区2的不同位置的异形子像素的遮挡部分的面积以及遮挡位置不同，其中，遮挡位置为异形子像素在像素行向上的中线的任一侧所在的位置。
示例性的，如图1所示，以异形显示区2具有四个圆角为例，对于A处 和B处圆角，如图7所示，遮挡位置可以为异形子像素在像素行向上的中线靠近周边区域3的一侧，如图8所示，对于C处和D处圆角，可以为异形子像素在像素行向上的中线远离周边区域3的一侧。且随着圆角弧度的变化，遮挡部分的面积也在不断发生变化，以适应圆角的弧形过渡。示例性的，以A区的半圆角为例，遮挡部分的面积沿图1中的X方向，从B区至A区的方向灰阶逐渐变化，分别是灰阶为254的第二像素22对应的遮挡部分沿像素的列向的尺寸为4.5微米，灰阶为251的第二像素22对应遮挡部分沿像素的列向的尺寸10.5微米，灰阶为248的第二像素22对应的遮挡部分沿像素的列向的尺寸为13.8微米，灰阶为242的第二像素22、灰阶为232的第二像素22、灰阶为219的第二像素22、灰阶为204的第二像素22、灰阶为184的第二像素22、灰阶为150的第二像素22、灰阶为123的第二像素22、灰阶为72的第二像素22，分别对应遮挡部分沿像素的列向的尺寸依次为18.8微米、26.2微米、35.2微米、45.2微米、56.6微米、73.6微米、90.2微米、91.1微米。
综上所述，可以使得异形显示区2的的灰阶逐渐过渡，使得第二像素22形成的开口区域201可以随着第二像素22的像素面积的减少而同步减少，进而避免对异形显示区2的边界的实际显示效果造成影响，进一步提升显示效果。。
在一些实施例中，如图11所示，异形显示区2设置有盲孔5，盲孔5靠近于周边区设置，多个第二子像素围绕盲孔5设置。这样，通过盲孔5可以满足光线的正常出入，以满足如摄像、拍摄等光线需求。
对于上述盲孔5设置，若围绕盲孔5周侧的所有第二子像素均按照同一遮挡方式通过遮挡结构进行遮挡，由于盲孔5的面积较小，因此会由于第二像素22形成的开口区域201按照一定的方向规则排列，降低与盲孔5的轮廓的适配性，进而出现横纹现象，影响彩膜基板的显示效果。
基于此，可选的，如图11所示，盲孔5可以包括第一部分51、第二部分52和第三部分53，黑矩阵层4至少包括第一遮挡结构、第二遮挡结构和第三遮挡结构；第二部分52位于第一部分51和第三部分53之间，且第一部分51靠近于周边区域3；第一遮挡结构遮挡饶设在第一部分51的第二子像素形成第一开口区域201，第二遮挡结构遮挡饶设在第二部分52的第二子 像素形成第二开口区域201，第三遮挡结构遮挡饶设在第二部分52的第二子像素形成第三开口区域201；第一开口区域201位于第二子像素靠近周边区域3的一侧，第三开口区域201位于第二子像素靠近周边区域3的一侧，第二开口区域201位于第二子像素的中部。
需要说明的是，由于第一遮挡结构遮挡饶设在第一部分51的第二子像素形成第一开口区域201，第一开口区域201位于第二子像素靠近周边区域3的一侧，第二部分52位于第一部分51和第三部分53之间，且第一部分51靠近于周边区域3，第一开口区域201位于第二子像素靠近周边区域3的一侧，第三开口区域201位于第二子像素靠近周边区域3的一侧，第二开口区域201位于第二子像素的中部，因此使得盲孔5靠近周边区域3的部分的遮挡部位为第二像素22靠近周边区域3的一侧。由于第二遮挡结构遮挡绕设在第二部分52的第二子像素形成第二开口区域201，因此使得盲孔5远离周边区域3的部分的遮挡部位为第二像素22远离周边区域3的一侧。由于第三遮挡结构遮挡绕设在第二部分52的第二子像素形成第三开口区域201，因此使得盲孔5远离周边区域3的部分的遮挡部位为第二像素22中部。这样，使得盲孔5周向不同部位的第二像素22形成的开口区域201均环绕盲孔5设置，进而可以提升开口区域201与盲孔5的轮廓的适配性，进而避免横纹现象的出现，进一步提升彩膜基板的在盲孔5处的显示效果。
在一些实施例中，第一部分51的面积和第二部分52的面积相等。这样可以使得第一遮挡结构遮挡绕设在第一部分51的第二子像素形成的第一开口区域201，和第二遮挡结构遮挡绕设在第二部分52的第二子像素形成第二开口区域201处于相对设置，盲孔5的轴线方向的距离相等，这样，更有利于升彩膜基板的在盲孔5处的显示效果
进一步的，第一部分51和第二部分52均为扇形结构，第一部分51的圆心角和第二部分52的圆心角均位于76°至90°之间。可以使得彩膜基板的在盲孔5处的显示效果达到最佳效果。需要说明的是，第一部分51的圆心角和第二部分52的圆心角可以依据盲孔5的尺寸确定，本公开实施例对此不做限定。
对于四周遮挡，如图10所示，第二像素22包括多个第一子像素221，多个第一子像素221中的至少一个第一子像素221为异形子像素，遮挡结构 对第一子像素221进行四周遮挡，每个第一子像素221形成的开口区域201的面积相等。
需要说明的是，由于遮挡结构对第一子像素221进行四周遮挡后，每个第一子像素221形成的开口区域201的面积相等，因此使得各个第一子像素221发出的光线的亮度一致，进而可以避免色偏。
还需要说明的是，四周遮挡可以为需要小开口率的情况下，如异形像素形成的开口区域201在像素列向的尺寸为10微米以下的情况下时，使得遮挡结构沿异形像素的周向进行遮挡，即异形像素的沿像素行向的边缘位置以及沿像素列向的边缘位置均有遮挡结构进行遮挡，使得过四周遮挡可以使得异形像素形成的开口区域201集中在异形像素的中部。这样，这样可以拉开上下挡块的间距，满足曝光解析能力的情况下，使得彩膜基板的灰阶更为准确。
示例性的，以像素的行向的间距为30微米，若异形显示区2靠近周边区域3的某处的灰阶为72，异形像素形成的开口区域201的面积为300平方微米，则以像素的列向的间距为10微米。而由于曝光机能达到的像素间距的最小值需要大于14微米，因此使得曝光机无法满足曝光解析的能力，使得灰阶无法达到72。而在本公开实施例中，由于采用四周遮挡的方式，因此可以使得以像素的行向的间距调整为20微米，则像素的列向的间距则为15微米，使得像素行向和列向的间距均满足曝光机的曝光解析的能力，使得灰阶准确达到72。
在一些实施例中，彩膜基板还包括信号线6，信号线6与彩膜基板中的每个第二子像素连接。
如图12所示，信号线6可以包括多条数据线61和多条栅线，每个数据线61可以与一列子像素连接，每条栅线可以与一行子像素连接。
需要说明的是，每个像素中包括的多个子像素均沿像素行方向排列，由于第二像素22包括的异形子像素在像素行方向上的长度与第一像素21包括的子像素在像素行方向上的长度存在差异，因此为了使得数据线61能够连接异形像素中的第一子像素221，以及第二像素22中的子像素可以使得多条数据线61中的至少一条数据线61呈弯折状。并且,弯折状的数据线61连接的一列子像素中至少一个子像素为异形子像素。
作为另一种可能的情况，，每个像素中包括的多个子像素均沿像素列方向排列，由于第二像素22在像素列方向上的长度与第一像素21在像素列方向上的长度存在差异，因此为了使得栅线能够连接第一像素21中的第一子像素221，以及第二像素22中中的子像素,可以使得多条栅线中的至少一条栅线呈弯折状。并且，弯折状的栅线连接的一行子像素中至少一个子像素为异形子像素。
作为一种可选的实施例，数据线61包括触控信号线6；触控信号线6连接在第二像素22包括的目标第二子像素中，其中，目标第二子像素为蓝色子像素。
需要说明的是，由于触控信号线6连接在第二像素22包括的目标第二子像素中，即触控信号线6仅在蓝色子像素的蓝色色阻上，且由于传统模拟方法是不考虑蓝色色阻，按照红色子像素的色阻进行模拟，然后适用到红色子像素的色阻、绿色子像素的色阻以及蓝色子像素的色阻上。这样，会导致白点坐标的差异，宏观表现就是色温差异。严重的话会造成异形显示区2的边界线处呈现轻微的发黄或者发蓝，影响显示效果。
基于此，在本公开实施例中，触控信号线6连接在第二像素22包括的目标第二子像素中，因此可以对红色子像素的色阻和蓝色子像素的色阻分别进行模拟，以使得蓝色子像素、红色子像素和绿色子像素始终处于同一个开口率，因此使得各个第一子像素221发出的光线的亮度一致，进而可以避免避免色偏。
除此之外，可以对高灰阶的像素，在不出现毛刺的情况下对各个像素进行差异化设定。对于灰阶大于246的像素可以采用上畴和下畴同时遮挡的方式，以使得像素形成的开口区域201集中在像素的中部，对于灰阶小于246的像素，可以采用单畴遮挡的方式，即遮挡像素的上畴或者下畴，以使得像素形成的所述开口区域201的面积大于所述第二像素22面积的二分之一，进而使得在灰阶较小的情况下，即遮挡面积较小的情况下，在不出现毛刺的情况下，可以对像素进行差异化设定，以达到最佳的显示效果。不同灰阶对应的遮挡尺寸和遮挡部位如下表所示：
从上述实施例可以看出，在本公开实施例中，由于黑矩阵层4包括多个 遮挡结构，多个遮挡结构中的至少一个遮挡结构对异形像素进行单畴遮挡或者四周遮挡以形成开口区域201，在遮挡结构对异形像素进行单畴遮挡的情况下，异形像素形成的开口区域201的面积大于异形像素面积的二分之一,在遮挡结构对异形像素进行四周遮挡的情况下，异形像素形成的开口区域201集中在异形像素的中部，因此使得第二像像素的中部为开口区域201，且开口区域201为一个整体结构，进而可以避免异形像素中间的黑矩阵在连续排布的情况下出现毛刺现象的发生。
第二方面，本公开实施例还提供了一种显示基板，该显示基板包括第一方面任一实施例所述的彩膜基板。该显示基板所具备的有益效果和上述彩膜基板所具备的有益效果一致，本公开实施例对此不再赘述。
第三方面，本公开实施例提供了一种显示装置，该显示装置包括第二方面所述的显示装置。
需要说明的是，该显示装置可以为手机、平板电脑、笔记本电脑、掌上电脑、车载显示装置、可穿戴设备、超级移动个人计算机(ultra-mobile personal computer，UMPC)、上网本或者个人数字助理(personal digital assistant，PDA)等移动显示装置，非移动显示装置可以为个人计算机(personal computer，PC)、电视机(television，TV)、柜员机或者自助机等，本公开实施例不作具体限定。该显示装置所具备的有益效果和上述彩膜基板所具备的有益效果一致，本公开实施例对此不再赘述。
需要说明的是，本说明书中的各个实施例均采用递进的方式描述，每个实施例重点说明的都是与其他实施例的不同之处，各个实施例之间相同相似的部分互相参见即可。
尽管已描述了本公开实施例的可选实施例，但本领域内的技术人员一旦得知了基本创造性概念，则可对这些实施例做出另外的变更和修改。所以，所附权利要求意欲解释为包括可选实施例以及落入本公开实施例范围的所有变更和修改。
最后，还需要说明的是，在本文中，诸如第一和第二等之类的关系术语仅仅用来将一个实体与另一个实体区分开来，而不一定要求或者暗示这些实 体之间存在任何这种实际的关系或者顺序。而且，术语“包括”、“包含”或者其任何其他变体意在涵盖非排他性的包含，从而使得包括一系列要素的物品或者终端设备不仅包括那些要素，而且还包括没有明确列出的其他要素，或者是还包括为这种物品或者终端设备所固有的要素。在没有更多限制的情况下，由语句“包括一个……”限定的要素，并不排除在包括要素的物品或者终端设备中还存在另外的相同要素。
以上对本公开所提供的技术方案进行了详细介绍，本文中应用了具体个例对本公开的原理及实施方式进行了阐述，同时，对于本领域的一般技术人员，依据本公开的原理及实现方式，在具体实施方式及应用范围上均会有改变之处，综上，本说明书内容不应理解为对本公开的限制。

Claims (18)

  1. 一种彩膜基板，其特征在于，所述彩膜基板包括：
    衬底基板，所述衬底基板上具有异形显示区域以及围绕所述异形显示区域的周边区域；
    所述异形显示区内包括多个第一像素和至少一个第二像素，其中，所述第二像素相对于所述第一像素靠近所述周边区域，且每个所述第二像素靠近所述周边区域的边界线的形状和所述周边区域的边界线的形状相同；
    黑矩阵层，所述黑矩阵层包括多个遮挡结构，所述多个遮挡结构中的至少一个所述遮挡结构对所述第二像素进行单畴遮挡或者四周遮挡以形成开口区域；
    在所述遮挡结构对所述第二像素进行单畴遮挡的情况下，所述第二像素形成的所述开口区域的面积大于所述第二像素面积的二分之一；
    在所述遮挡结构对所述第二像素进行四周遮挡的情况下，所述第二像素形成的开口区域集中在所述第二像素的中部。
  2. 根据权利要求1所述的彩膜基板，其特征在于，所述第二像素包括多个第一子像素，多个所述第一子像素中的至少一个所述第一子像素为异形子像素，所述遮挡结构对所述第一子像素进行所述单畴遮挡后，每个所述第一子像素形成的开口区域的面积相等。
  3. 据权利要求2所述的彩膜基板，其特征在于，所述遮挡结构沿第一方向在所述衬底基板上的投影和所述异形子像素沿所述第一方向在所述彩膜基板上的投影重叠的部分为第一图形，所述第一图形的面积小于所述异形子像素的面积的一半。
  4. 据权利要求3所述的彩膜基板，其特征在于，所述遮挡结构沿第一方向在所述衬底基板上的投影，和所述异形子像素沿所述第一方向在所述彩膜基板上的投影重叠的部分为遮挡部分，所述异形显示区的不同位置的所述异形子像素的遮挡部分的面积以及遮挡位置不同，其中，所述遮挡位置为所述异形子像素在像素行向上的中线的任一侧所在的位置。
  5. 据权利要求3所述的彩膜基板，其特征在于，所述异形显示区设置有盲孔；
    所述盲孔靠近于所述周边区设置，多个所述第二子像素围绕所述盲孔设置。
  6. 根据权利要求5所述的彩膜基板，其特征在于，所述盲孔包括第一部分、第二部分和第三部分，所述黑矩阵层至少包括第一遮挡结构、第二遮挡结构和第三遮挡结构；
    所述第二部分位于所述第一部分和所述第三部分之间，且所述第一部分靠近于所述周边区域；
    所述第一遮挡结构遮挡饶设在所述第一部分的所述第二子像素形成第一开口区域，所述第二遮挡结构遮挡饶设在所述第二部分的所述第二子像素形成第二开口区域，所述第三遮挡结构遮挡饶设在所述第二部分的所述第二子像素形成第三开口区域；
    所述第一开口区域位于所述第二子像素靠近所述周边区域的一侧，所述第三开口区域位于所述第二子像素靠近所述周边区域的一侧，所述第二开口区域位于所述第二子像素的中部。
  7. 根据权利要求6所述的彩膜基板，其特征在于，所述第一部分的面积和所述第二部分的面积相等。
  8. 根据权利要求7所述的彩膜基板，其特征在于，所述第一部分和所述第二部分均为扇形结构，所述第一部分的圆心角和所述第二部分的圆心角均位于76°至90°之间。
  9. 根据权利要求1所述的彩膜基板，其特征在于，所述第二像素包括多个第一子像素，多个所述第一子像素中的至少一个所述第一子像素为异形子像素，所述遮挡结构对所述第一子像素进行四周遮挡，每个所述第一子像素形成的开口区域的面积相等。
  10. 根据权利要求9所述的彩膜基板，其特征在于，所述遮挡结构遮挡所述第二子像素形成的开口区域的宽度小于10微米，其中所述开口区域的宽度为所述开口区域沿所述第二子像素的列方向的尺寸。
  11. 根据权利要求1所述的彩膜基板，其特征在于，所述异形显示区的至少部分边界为弧线，与所述弧线相邻的边界线，与所述弧线相切。
  12. 根据权利要求2或者权利要求9任一项所述的彩膜基板，其特征在于，所述彩膜基板还包括，信号线；
    所述信号线与所述彩膜基板中的每个第二子像素连接。
  13. 根据权利要求12所述的彩膜基板，其特征在于，所述信号线包括:多条数据线和多条栅线；
    每条所述数据线与一列所述第二子像素连接，每条所述栅线与一行所述第二子像素连接。
  14. 根据权利要求13所述的彩膜基板,其特征在于，所述多条数据线中的至少一条数据线呈弯折状,弯折状的所述数据线连接的一列所述第二子像素中至少一个所述第二子像素为所述异形子像素。
  15. 根据权利要求13所述的彩膜基板，其特征在于，所述多条栅线中的至少一条栅线呈弯折状,弯折状的所述栅线连接的一行所述第二子像素中至少一个所述子像素为异形子像素。
  16. 根据权利要求13所述的彩膜基板，其特征在于，所述数据线包括触控信号线；
    所述触控信号线连接在所述第二像素包括的目标第二子像素中，其中，所述目标第二子像素为蓝色子像素。
  17. 一种显示基板，其特征在于，所述显示装置包括权利要求1-16任一所述的彩膜基板。
  18. 一种显示装置，其特征在于，所述显示装置包括权利要求17所述的显示基板。
PCT/CN2022/122786 2022-09-29 2022-09-29 彩膜基板、显示基板及显示装置 Ceased WO2024065448A1 (zh)

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