WO2024041825A1 - Procédé de dépôt compact de lithium sur un substrat électroconducteur - Google Patents
Procédé de dépôt compact de lithium sur un substrat électroconducteur Download PDFInfo
- Publication number
- WO2024041825A1 WO2024041825A1 PCT/EP2023/070430 EP2023070430W WO2024041825A1 WO 2024041825 A1 WO2024041825 A1 WO 2024041825A1 EP 2023070430 W EP2023070430 W EP 2023070430W WO 2024041825 A1 WO2024041825 A1 WO 2024041825A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- lithium
- substrate
- process according
- ammonia
- metallic
- Prior art date
Links
- 229910052744 lithium Inorganic materials 0.000 title claims abstract description 89
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical group [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 title claims abstract description 80
- 238000000034 method Methods 0.000 title claims abstract description 49
- 239000000758 substrate Substances 0.000 title claims abstract description 47
- 230000008021 deposition Effects 0.000 title claims description 15
- 229910052737 gold Inorganic materials 0.000 claims abstract description 23
- 229910052751 metal Inorganic materials 0.000 claims abstract description 23
- 239000002184 metal Substances 0.000 claims abstract description 17
- 229910052718 tin Inorganic materials 0.000 claims abstract description 14
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 14
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 13
- 229910052733 gallium Inorganic materials 0.000 claims abstract description 13
- 229910052738 indium Inorganic materials 0.000 claims abstract description 12
- 229910052796 boron Inorganic materials 0.000 claims abstract description 11
- 229910052709 silver Inorganic materials 0.000 claims abstract description 11
- 229910052793 cadmium Inorganic materials 0.000 claims abstract description 10
- 229910052749 magnesium Inorganic materials 0.000 claims abstract description 10
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 7
- 229910052732 germanium Inorganic materials 0.000 claims abstract description 7
- 229910052748 manganese Inorganic materials 0.000 claims abstract description 7
- 229910052752 metalloid Inorganic materials 0.000 claims abstract description 7
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 7
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 7
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 7
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 7
- 150000002739 metals Chemical class 0.000 claims abstract description 6
- 239000003575 carbonaceous material Substances 0.000 claims abstract description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 68
- 229910021529 ammonia Inorganic materials 0.000 claims description 27
- 239000000203 mixture Substances 0.000 claims description 23
- 239000011888 foil Substances 0.000 claims description 16
- 239000011248 coating agent Substances 0.000 claims description 15
- 238000000151 deposition Methods 0.000 claims description 15
- 238000000576 coating method Methods 0.000 claims description 14
- 239000007788 liquid Substances 0.000 claims description 14
- 229910000069 nitrogen hydride Inorganic materials 0.000 claims description 12
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 9
- 229910052802 copper Inorganic materials 0.000 claims description 8
- 239000010949 copper Substances 0.000 claims description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 7
- 229910000906 Bronze Inorganic materials 0.000 claims description 6
- 239000010974 bronze Substances 0.000 claims description 6
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 claims description 6
- 239000003960 organic solvent Substances 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 5
- 239000011261 inert gas Substances 0.000 claims description 5
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- 150000002894 organic compounds Chemical class 0.000 claims description 5
- 150000004651 carbonic acid esters Chemical class 0.000 claims description 4
- 229930195733 hydrocarbon Natural products 0.000 claims description 4
- 150000002430 hydrocarbons Chemical class 0.000 claims description 4
- 150000002898 organic sulfur compounds Chemical class 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical class [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- AQRHTGSVDQECPZ-UHFFFAOYSA-N azane;lithium Chemical compound [Li].N AQRHTGSVDQECPZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 229910052756 noble gas Inorganic materials 0.000 claims description 3
- 239000010703 silicon Chemical class 0.000 claims description 3
- 229910019256 POF3 Inorganic materials 0.000 claims description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 claims description 2
- 239000002041 carbon nanotube Substances 0.000 claims description 2
- 150000001733 carboxylic acid esters Chemical class 0.000 claims description 2
- 229910021389 graphene Inorganic materials 0.000 claims description 2
- 125000000623 heterocyclic group Chemical group 0.000 claims description 2
- 150000002576 ketones Chemical class 0.000 claims description 2
- 150000002825 nitriles Chemical class 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 238000002161 passivation Methods 0.000 claims description 2
- OBCUTHMOOONNBS-UHFFFAOYSA-N phosphorus pentafluoride Chemical compound FP(F)(F)(F)F OBCUTHMOOONNBS-UHFFFAOYSA-N 0.000 claims description 2
- WKFBZNUBXWCCHG-UHFFFAOYSA-N phosphorus trifluoride Chemical compound FP(F)F WKFBZNUBXWCCHG-UHFFFAOYSA-N 0.000 claims description 2
- FFUQCRZBKUBHQT-UHFFFAOYSA-N phosphoryl fluoride Chemical compound FP(F)(F)=O FFUQCRZBKUBHQT-UHFFFAOYSA-N 0.000 claims description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 claims description 2
- 150000003457 sulfones Chemical class 0.000 claims description 2
- 150000008053 sultones Chemical class 0.000 claims description 2
- 238000000427 thin-film deposition Methods 0.000 claims description 2
- 238000004438 BET method Methods 0.000 claims 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims 1
- 229910052698 phosphorus Inorganic materials 0.000 claims 1
- 239000011574 phosphorus Substances 0.000 claims 1
- 239000011229 interlayer Substances 0.000 abstract description 5
- 239000010410 layer Substances 0.000 description 34
- 239000010931 gold Substances 0.000 description 15
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 13
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 239000010408 film Substances 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 239000012535 impurity Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 229910052723 transition metal Inorganic materials 0.000 description 3
- 150000003624 transition metals Chemical class 0.000 description 3
- 229910000733 Li alloy Inorganic materials 0.000 description 2
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical class CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 238000000560 X-ray reflectometry Methods 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 150000002641 lithium Chemical class 0.000 description 2
- 239000001989 lithium alloy Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical class CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 238000010963 scalable process Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- JWUJQDFVADABEY-UHFFFAOYSA-N 2-methyltetrahydrofuran Chemical compound CC1CCCO1 JWUJQDFVADABEY-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 229910013458 LiC6 Inorganic materials 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical class CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 238000010640 amide synthesis reaction Methods 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 239000010405 anode material Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000001198 high resolution scanning electron microscopy Methods 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 238000009830 intercalation Methods 0.000 description 1
- 230000002687 intercalation Effects 0.000 description 1
- AFRJJFRNGGLMDW-UHFFFAOYSA-N lithium amide Chemical compound [Li+].[NH2-] AFRJJFRNGGLMDW-UHFFFAOYSA-N 0.000 description 1
- 229910003002 lithium salt Inorganic materials 0.000 description 1
- 159000000002 lithium salts Chemical class 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 239000011573 trace mineral Substances 0.000 description 1
- 235000013619 trace mineral Nutrition 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
- C23C14/025—Metallic sublayers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
Definitions
- the invention relates to processes for the production of a lithiophilic intermediate layer on an electrically conductive substrate and for the subsequent deposition of compact lithium on such an intermediate layer.
- the invention further relates to the correspondingly manufactured substrates coated with the lithiophilic intermediate layer and the compact lithium.
- the currently commercially available lithium batteries function according to the intercalation principle.
- a graphitic material with a maximum capacity of 372 mAh/g (corresponding to the formula LiC 6 ) is used as the anode.
- Higher capacities and thus energy densities can be achieved by partial or complete replacement of graphite by alloy active materials (for example silicon or tin ("alloy anode materials") or by complete replacement of graphitic materials by metallic lithium .
- GB 642 034 A describes an electrochemical manufacturing process of alkali and alkaline earth metals.
- lithium salts are electrolyzed in liquid ammonia, among other things, and liquid or paste-like lithium/ammonia adducts are obtained.
- lithium metal can be obtained from this by evaporating the ammonia at low temperatures. The metal is obtained in the form of a sponge-like mass (p. 7, lines 35- 47) .
- WO 2021/245196 A1 describes processes for the production of lithium metal and lithium alloy shaped bodies from ammoniacal lithium metal solutions.
- the present invention aims to provide a scalable process for producing a thin, uniform and compact lithium coating on substrates with good electronic conductivity, such as metal or carbon-based films, which can also be carried out at mild temperatures. Further, such a substrate shall be provided, which is equipped with a thin, uniform and compact lithium coating .
- the lithiophilic interlayer consists of a 1 - 5000 nm, preferably 5 - 1000 nm thick coating of the metal- or carbon- based substrates/foils with at least one metallic or metalloid element capable of forming alloys with lithium.
- This element is selected from the group Zn, Al, B, Cd, Au, Ag, Si, Pb, Sn, Ge, Ga, In, Mg, Cr, V, Mo, W, Zr, Mn.
- Preferred elements are Zn, Al, B, Cd, Au, Ag, Si, Pb, Sn, Ga, In and Mg.
- the elements Zn, Al, Au, Si, Sn, Ga and are particularly preferred. These elements are present either in pure form or as a mixture of at least two of the elements mentioned.
- the lithiophilic coating is applied to at least one of the substrate/foil sides, preferably on all sides or both sides.
- the compact lithium-coated conductive substrate according to the invention consists of sheet-like metal or sheet-like carbon-based material having on at least one side of the substrate a 1 to 5000 nm thick lithiophilic intermediate layer containing or consisting of at least one metallic or metalloid element selected from the group consisting of Zn, Al, B, Cd, Au, Ag, Si, Pb, Sn, Ge, Ga, In, Mg, Cr, V, Mo, W, Zr, Mn.
- the lithiophilic interlayer can be deposited by different processes, the most important ones being the following:
- the substrate e.g. a foil
- the electrically conductive substrate is preferably coated beforehand with a thin (1 - 50 nm thick) nickel layer, provided the substrate itself is not made of nickel.
- the nickel layer serves as a diffusion barrier between the substrate and the gold layer.
- electrochemical thin-film deposition (“plating”).
- a solution of the lithium-alloyable element is electrolyzed, with the electrically conductive substrate, usually in foil form, serving as the cathode on which the lithium-alloyable element is deposited.
- electrolyte residues Prior to the subsequent lithium coating step according to the invention, electrolyte residues must be removed by dripping, washing and, if necessary, drying.
- substrates with good electronic conductivity flat structures consisting of copper, nickel, iron or films consisting of or containing carbon nanotubes (CNT's) or graphene are preferably used. Such substrates are typically used as current-conducting films in lithium batteries.
- SEM Scanning Electron Microscopy
- the measurements were made in accordance with DIN EN ISO 9220 (Metallic coatings - Measurement of coating thickness - Scanning electron microscope method).
- Very thin coating thicknesses ( ⁇ 100 nm) can also be measured using X- ray methods, especially the X-ray reflectivity technique (XRR). This technique is described by Miho Yasaka, The Rigaku Journal, 26(2), 2010.
- the substrate/foil coated homogeneously is next contacted with a solution of pure metallic lithium in ammonia, preferably with pure liquid lithium bronze of the composition Li(NH 3 )4 at temperatures in the range of -40 to +40°C, preferably in the range of -10 to +30°C, even more preferably +15 to +30°C, especially preferably at ambient temperatures of +20 to +30°C.
- the electrically conductive substrate/foil equipped with the lithiophilic intermediate layer is dipped into the liquid lithium/ammonia composition. This can be done, for example, piece by piece with the aid of tweezers or continuously by a roll-to-roll process.
- the contact times range from 0.1 to 10,000 seconds, preferably 1 to 2,000 seconds.
- part of the ammonia is evaporated and either an alloy consisting of lithium and the alloy-forming element of the intermediate layer is formed in the contact area with the conductive lithiophilic substrate or/and the metallic lithium is deposited in pure form over the intermediate layer.
- Lithium alloy layers are often formed with a decreasing concentration of the alloy-forming element towards the outside.
- Lithium formation and deposition onto the electrically conductive substrates/foils equipped with a lithiophilic interlayer is then completed by quantitative removal of the ammonia.
- This step is carried out at temperatures between -40°C and +100°C, preferably -10 and +60°C, more preferably +15 to +30°C and particularly preferably at ambient temperatures of +20 to +30°C, preferably under reduced pressure, i.e. in the pressure range of 0.001 to 700 mbar.
- the ammonia can also be removed by passing an inert gas stream. Since the ammonia concentration is reduced by the stripping gas (the inert gas stream) and the recovery of ammonia is made more difficult, this process is generally less cost-effective than the vacuum process.
- the elemental lithium metal remains in the form of a thin, homogeneous (cohesive), areal, compact layer on the lithiophilized deposition substrate.
- the metallic lithium is deposited on the lithiophilic intermediate layer with a layer thickness of 0.01 to 50 ⁇ m, preferably 0.1 to 30 ⁇ m, particularly preferably 0.5 to 25 ⁇ m, as determined by SEM.
- the compactness of the lithium can be characterized by measuring the specific surface area of the lithium coating, measured by gas adsorption using the BET (Brunauer, Emmett, Teller) method. These measurements were performed with the ASAP 2020 instrument from Micromeritics. Because of the high reactivity of metallic lithium, a noble gas such as argon/liquid argon was used as the determination gas . The measurements were carried out in accordance with ISO 9277 ("Determination of the specific surface area of solids by gas adsorption - BET").
- the lithium layers produced by the method according to the invention have specific surface areas in the range between 500 and 20,000 cm 2 /g Li, preferably 1,000 to 10,000 cm 2 /g.
- lithium metal or preferably lithium of purer battery or alloy grade is used as the lithium source.
- metal grades are available, for example, from Sigma-Aldrich-Fluka (SAF).
- SAF Sigma-Aldrich-Fluka
- metal impurities of no more than 15,000 ppm, with sodium taking by far the highest percentage.
- Transition metals especially Fe, Ag, Cu, Zn
- the sum of transition metal impurities is mostly in the range of 100 ppm and below.
- lithium is available from SAF in battery quality, i.e. a Li content (based on metallic trace elements) of 99.9 %.
- Such particularly pure battery grade contains a maximum of 1500 ppm of foreign metal impurities, with sodium predominating in this case as well.
- metallic lithium with a summed transition metal impurity content of not more than 200 ppm, particularly preferably not more than 100 ppm and very especially preferably not more than 50 ppm is preferably used.
- the thermal decomposition or dissociation of the lithium ammonia solutions and compounds used, in particular of the defined lithium bronze, can take place either in the presence of an additional organic solvent (for example a hydrocarbon or ethers or amines) or without such additives.
- an additional organic solvent for example a hydrocarbon or ethers or amines
- saturated aliphatic hydrocarbons such as pentanes, hexanes, heptanes, octanes or common, commercially available mixtures of such compounds (technical "petroleum ethers", “white oils”, “benzines" are suitable as organic solvents.
- Aromatic hydrocarbons can be used to a limited extent. The latter can promote undesirable decomposition with lithium amide formation.
- etheric compounds such as diethyl ether, dibutyl ether, methyl tert-butyl ether, tetrahydrofuran, methyl tetrahydrofuran, tetrahydropyran, glymes and the like is also possible, but less preferred than the use of hydrocarbons .
- the metallic lithium freshly deposited from lithium-NH 3 compositions is very reactive to air and moisture.
- passivation of the metal surface i.e. application of a thin protective layer, is a further preferred process step.
- Such a process step involves contacting with gaseous or liquid substances that form stable polymers and/or salts upon contact with lithium.
- Such a process step is described, for example, in WO 2011/073324 A1.
- elements or compounds selected from the group consisting of inorganic compounds consisting of: N 2 , CO 2 , CO, O 2 , N 2 O, NO, NO 2 , HF, F 2 , PF 3 , PF 5 , BF 3 , POF 3 , H 3 PO 4 , or liquid organic compounds/solvents/solutions (coating agents) selected from the groups: carbonic acid esters; lithium chelatoborate solutions as solutions in organic solvents; organosulfur compounds; N-containing organic compounds; organic phosphorus- containing compounds; partially fluorinated hydrocarbons; silicon-containing organic compounds.
- the organic solvents mentioned are preferably selected from the group consisting of: oxygen-containing heterocycles, carbonic acid esters, nitriles, carboxylic acid esters or ketones; the organosulfur compounds are preferably selected from the group consisting of: sulfites, sulfones, sultones.
- lithium chelatoborate lithium bis(oxalato)borate (LiBOB) is preferably used.
- Example 1 Application of an ultrathin gold layer on a copper foil
- Example 2 Deposition of a lithium metal film on a copper sheet
- the specific surface area of the lithium layer on the top surface determined by BET was 1,800 cm 2 /g.
- Example 3 Application of a gold layer using a sputtering process
- a 20 ⁇ m thick copper sheet with a width of 15 mm was sputtered with gold in a high vacuum sputter coater from Leica (model EM ACE600) .
- Argon was used as the sputtering gas, and the sputtering time was 15 minutes.
- Example 4 Deposition of a lithium metal film on an Au- sputtered copper sheet
- the specific surface area of the lithium layer on the top surface determined by BET was 2,100 cm 2 /g.
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Abstract
L'invention concerne un substrat conducteur revêtu de lithium compact, le substrat étant constitué de métaux de type feuille ou de matériaux à base de carbone de type feuille. Sur au moins un côté du substrat est présente une couche intermédiaire lithiophile épaisse de 1 à 5 000 nm qui contient ou est constituée d'au moins un élément métallique ou métalloïde choisi dans le groupe Zn, Al, B, Cd, Au, Ag, Si, Pb, Sn, Ge, Ga, In, Mg, Cr, V, Mo, W, Zr, Mn. L'invention concerne également des procédés de production d'un tel substrat revêtu de lithium.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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DE102022121255.6A DE102022121255A1 (de) | 2022-08-23 | 2022-08-23 | Verfahren zur Kompaktabscheidung von Lithium auf einem elektrisch leitfähigen Substrat |
DE102022121255.6 | 2022-08-23 |
Publications (1)
Publication Number | Publication Date |
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WO2024041825A1 true WO2024041825A1 (fr) | 2024-02-29 |
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PCT/EP2023/070430 WO2024041825A1 (fr) | 2022-08-23 | 2023-07-24 | Procédé de dépôt compact de lithium sur un substrat électroconducteur |
Country Status (3)
Country | Link |
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DE (1) | DE102022121255A1 (fr) |
TW (1) | TW202409346A (fr) |
WO (1) | WO2024041825A1 (fr) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB642034A (en) | 1946-05-27 | 1950-08-23 | G And W H Corson Inc | A process of producing alkali and alkaline earth metals |
WO2011073324A1 (fr) | 2009-12-18 | 2011-06-23 | Chemetall Gmbh | Lithium métal passivé en surface, et procédé pour sa production |
US20210257624A1 (en) * | 2020-02-18 | 2021-08-19 | Samsung Sdi Co., Ltd. | Negative electrode and solid-state secondary battery including the same |
WO2021245196A1 (fr) | 2020-06-04 | 2021-12-09 | Albemarle Germany Gmbh | Procédé pour la préparation de pièces moulées en lithium métal et en alliage de lithium |
US20220216482A1 (en) * | 2019-04-17 | 2022-07-07 | 2555663 Ontario Limited | Lithium metal anode assemblies and an apparatus and method of making same |
-
2022
- 2022-08-23 DE DE102022121255.6A patent/DE102022121255A1/de active Pending
-
2023
- 2023-07-07 TW TW112125562A patent/TW202409346A/zh unknown
- 2023-07-24 WO PCT/EP2023/070430 patent/WO2024041825A1/fr unknown
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB642034A (en) | 1946-05-27 | 1950-08-23 | G And W H Corson Inc | A process of producing alkali and alkaline earth metals |
WO2011073324A1 (fr) | 2009-12-18 | 2011-06-23 | Chemetall Gmbh | Lithium métal passivé en surface, et procédé pour sa production |
US20220216482A1 (en) * | 2019-04-17 | 2022-07-07 | 2555663 Ontario Limited | Lithium metal anode assemblies and an apparatus and method of making same |
US20210257624A1 (en) * | 2020-02-18 | 2021-08-19 | Samsung Sdi Co., Ltd. | Negative electrode and solid-state secondary battery including the same |
WO2021245196A1 (fr) | 2020-06-04 | 2021-12-09 | Albemarle Germany Gmbh | Procédé pour la préparation de pièces moulées en lithium métal et en alliage de lithium |
Non-Patent Citations (5)
Title |
---|
H. JAFFE, Z. PHYS., vol. 93, 1935, pages 741 - 761 |
J. BRONN: "Liquefied ammonia as a solvent", 31 December 1905, JULIUS SPRINGER, pages: 116 - 117 |
M. PIS) UR, J. PHYS. CHEM., vol. 37, 1933, pages 93 - 99 |
MIHO YASAKA, THE RIGAKU JOURNAL, vol. 26, 2010, pages 2 |
R. HOFFMANN ET AL., ANGEW. CHEM. INT., vol. 48, 2009, pages 8198 - 8232 |
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TW202409346A (zh) | 2024-03-01 |
DE102022121255A1 (de) | 2024-02-29 |
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