WO2024036910A1 - Structure and method for testing performance of packaged chip - Google Patents

Structure and method for testing performance of packaged chip Download PDF

Info

Publication number
WO2024036910A1
WO2024036910A1 PCT/CN2023/077726 CN2023077726W WO2024036910A1 WO 2024036910 A1 WO2024036910 A1 WO 2024036910A1 CN 2023077726 W CN2023077726 W CN 2023077726W WO 2024036910 A1 WO2024036910 A1 WO 2024036910A1
Authority
WO
WIPO (PCT)
Prior art keywords
die
redundant
performance
detecting
unconnected
Prior art date
Application number
PCT/CN2023/077726
Other languages
French (fr)
Chinese (zh)
Inventor
梅萌
史刚
王培春
李广峰
Original Assignee
澜起电子科技(昆山)有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 澜起电子科技(昆山)有限公司 filed Critical 澜起电子科技(昆山)有限公司
Publication of WO2024036910A1 publication Critical patent/WO2024036910A1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/544Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps

Definitions

  • the present invention generally relates to the field of chip packaging technology, and in particular to a structure and method for detecting the performance of packaged chips.
  • ETS embedded trace substrate
  • the purpose of this application is to provide a structure and method for detecting the performance of packaged chips, which can be used to detect whether there is a problem of non-wetting in the package of the package substrate and the die.
  • the structure is simple, the test method is simple, and the test can be performed at any time. Helps monitor the manufacturing process in real time.
  • This application discloses a structure for detecting the performance of packaged chips, which includes: a packaging substrate, on which at least one unconnected solder ball is provided;
  • each corner area of the die is provided with at least one redundant bump, and the redundant bumps located in each corner area and the at least one unconnected solder ball are connected in series to form a test loop. road.
  • electrical connections are made between redundant bumps located in different corner areas and between redundant bumps and unconnected solder balls via substrate wiring.
  • redundant bumps located in the same corner area are electrically connected via a rewiring layer inside the die, and the resistance value or capacitance value of the loop is tested through the at least one unconnected solder ball, To determine whether there are unwetted redundant bumps between the die and the packaging substrate.
  • an unconnected solder ball is provided on the packaging substrate, and the capacitance value of the circuit is tested through the unconnected solder ball to determine whether there is no wetting between the die and the packaging substrate. of redundant bumps.
  • two unconnected solder balls are provided on the packaging substrate, and the resistance value of the circuit is tested through the two unconnected solder balls to determine whether there is a gap between the die and the packaging substrate. Uninfiltrated redundant bumps.
  • the resistance value or capacitance value indicates that the loop is an open circuit, it is determined that there are unwetted redundant bumps between the die and the packaging substrate.
  • the redistribution layer includes aluminum, and the thickness of the redistribution layer is 2 to 3 microns.
  • the application also discloses a method for detecting the performance of a packaged chip.
  • the method is applied to a structure for detecting the performance of a packaged chip.
  • the structure includes: a packaging substrate, on which at least one unconnected solder ball is provided; a die, At least one redundant bump is provided in each corner area of the die, and the redundant bumps located in each corner area and the at least one unconnected solder ball are connected in series to form a test loop; the method includes :
  • the method further includes:
  • Disconnect the rerouting layers between redundant bumps located in the same corner area and The redundant bumps in a corner area are connected through the lowest metal layer of the metal interconnection layer inside the die, and the resistance value or capacitance value of the loop is selectively tested through the at least one unconnected solder ball. to determine whether there is a crack in the bottom metal layer of the metal interconnection layer.
  • the bottom metal layer is an ultra-low dielectric layer, and the thickness of the ultra-low dielectric layer is 0.2 microns to 0.5 microns.
  • the embodiment of the present application connects the unconnected solder balls on the packaging substrate to the redundant bumps at the corner areas of the die to form a test structure. It is only necessary to test the resistance value or capacitance value of the structure through the unconnected solder balls. It can be determined whether there is no problem of non-wetting in the package between the packaging substrate and the die. Therefore, this test structure is simple and easy to set up, and the test method is simple, which is conducive to real-time monitoring of the production and manufacturing process.
  • this application simply adjusts the connection lines between the redundant bumps in the same corner area, that is, the connection lines between the redundant bumps located in the same corner area are connected via the tube.
  • the bottom metal layer of the metal interconnection layer inside the core is connected, and then the resistance value or capacitance value of the structure is tested through the unconnected solder ball to determine whether there is a crack in the bottom metal layer of the metal interconnection layer.
  • Figure 1 shows a schematic diagram of a structure for detecting the performance of a packaged chip according to one embodiment of the present application.
  • FIG. 2 shows a schematic cross-sectional view of a metal interconnect layer in a die according to an embodiment of the present application.
  • FIG. 1 shows a schematic diagram of the structure for detecting the performance of a packaged chip in one embodiment.
  • the structure includes a packaging substrate (eg, a printed circuit board PCB) 101 and a die 102 .
  • At least one unconnected solder ball 103 is provided on the packaging substrate 101 .
  • four unconnected solder balls 103 are provided on the packaging substrate 101 .
  • Each corner area (Corner) 107 of the die 102 is provided with at least one redundant (Dummy) bump 104.
  • Dummy redundant
  • each corner area 107 is provided with two redundant bumps 104 .
  • the number of redundant bumps 104 provided in each corner area 107 is not limited thereto.
  • embodiments of the present application may also provide redundant bumps 104 in other edge areas of the die or other areas prone to non-wetting problems to increase the detection probability.
  • the central area of the die 102 is also provided with bumps that electrically connect the internal structure of the die.
  • the redundant bumps 104 located in each corner area 107 and the at least one unconnected solder ball 103 are connected in series to form a test loop.
  • the redundant bumps 104 located in different corner areas 107 and the redundant bumps 104 and the unconnected solder balls 103 are electrically connected via the substrate wiring 105 .
  • the redundant bumps 104 located in the same corner area 107 are electrically connected via a redistributed layer (RDL) 106 inside the die 102 .
  • RDL redistributed layer
  • the redistribution layer 106 includes aluminum, and the thickness of the redistribution layer 106 is 2 to 3 microns.
  • the thickness of the redistribution layer 106 is 2.3 microns, 2.5 microns, 2.8 microns, etc.
  • the resistance value or capacitance value of the loop is tested through the at least one unconnected solder ball 103 to determine whether there is unwetted redundancy between the die 102 and the packaging substrate 101 Bump 104.
  • an unconnected solder ball 103 is provided on the packaging substrate 101, and the capacitance value of the loop is tested through the unconnected solder ball 103 to determine the relationship between the die 102 and the packaging substrate 101. Whether there are uninfiltrated redundant bumps 104.
  • a multimeter can be used to measure the The capacitance value connecting the solder ball 103 to the power supply or ground, and when the capacitance value indicates that the loop is an open circuit, it is determined that there is an unwetted redundant bump 104 between the die 102 and the packaging substrate 101 .
  • two or more unconnected solder balls 103 are provided on the packaging substrate 101, and only two of the unconnected solder balls 103 are included in the circuit. Connect the solder balls 103 to test the resistance value of the loop to determine whether there are unwetted redundant bumps 104 between the die 102 and the packaging substrate 101 . For example, the resistance value between the two unconnected solder balls 103 can be tested. When the resistance value indicates that the loop is an open circuit, it is determined that there is unwetted redundancy between the die 102 and the packaging substrate 101 Bump 104.
  • the packaging substrate 101 and the die 102 have respectively completed corresponding tests, that is, the packaging substrate 101, the die 102, and the electrical connection between the packaging substrate 101 and the die 102. All sex tests passed. The application can further test whether there are unwetted redundant bumps 104 between the die 102 and the packaging substrate 101 .
  • the present application also discloses a method for detecting the performance of a packaged chip.
  • the method is applied to a structure for detecting the performance of a packaged chip, for example, the structure shown in FIG. 1 .
  • the structure includes a packaging substrate 101 and a die 102 .
  • At least one unconnected solder ball 103 is provided on the packaging substrate 101 .
  • Each corner area 107 of the die 102 is provided with at least one redundant bump 104 .
  • the redundant bumps 104 located in each corner area 107 and the at least one unconnected solder ball 103 are connected in series to form a test loop.
  • the redundant bumps 104 located in different corner areas and the redundant bumps 104 and the bumps 104 are electrically connected via the rewiring layer 106 inside the die 102 .
  • the redistribution layer 106 includes aluminum, and the thickness of the redistribution layer 106 is 2 to 3 microns.
  • the methods include:
  • the resistance value or capacitance value of the loop is selectively tested through the at least one unconnected solder ball 103 to determine whether there are unwetted redundant bumps between the die and the packaging substrate.
  • selectively testing the resistance value or capacitance value of the loop through the at least one unconnected solder ball 103 may include the following situations:
  • the method may further include: disconnecting the redundant bumps located in the same corner area. 104 are connected through the redistribution layer 106, and the redundant bumps 104 located in the same corner area are connected through the lowest metal layer of the metal interconnection layer inside the die 101, and through the at least one unused
  • the solder ball 103 is connected to selectively test the resistance value or capacitance value of the circuit to determine whether there is a crack in the bottom metal layer of the metal interconnection layer.
  • the bottom metal layer is an ultra-low dielectric layer, and the thickness of the ultra-low dielectric layer is 0.2 microns to 0.5 microns. For example, the thickness of the ultra-low dielectric layer is 0.21 microns, 0.3 microns, 0.4 microns, and 0.46 microns. wait.
  • FIG. 2 shows a schematic cross-sectional view of a metal interconnect layer in a die in an embodiment of the present application.
  • the metal interconnection layer includes multiple metal layers, and a dielectric layer (not shown in the figure) is formed between each metal layer.
  • the bottom metal layer 201 adopts an ultra-low dielectric layer (ELK), for example, the dielectric constant K is 3.03, and the dielectric constant of the metal layers 202 and 203 on the bottom metal layer 201 is greater than the bottom metal layer 201, for example , the dielectric constant K of the metal layers 202 and 203 is 4.2.
  • a rewiring layer 204 and a passivation layer 205 are formed on the metal layer 203.
  • the blocks are connected via the bottom metal layer 201 of the metal interconnect layer inside the die, and the resistance value or capacitance value of the loop is selectively tested through at least one unconnected solder ball to determine the bottom metal layer of the metal interconnect layer. Are there any cracks? When the resistance value or capacitance value indicates that the loop is open, it is determined that a crack exists in the bottom metal layer of the metal interconnection layer.
  • the corner area is most prone to non-wetting problems. Therefore, if the unconnected solder balls on the packaging substrate are connected to the redundant bumps on each corner area of the die , where the adjacent redundant bumps located in the same corner area are connected using RDL on the package substrate, and the redundant bumps located in different corner areas, and the redundant bumps and unconnected solder balls are electrically connected via substrate wiring , thus forming a loop for detecting the presence of unwetted redundant bumps.
  • the connection point between the package substrate and the die is the redundant bump. If any one of the redundant bumps is not wetted, an open circuit will appear between the two unconnected solder balls, which can be detected by measuring the DC resistance of the loop. If there is only one unconnected solder ball, it can be detected by measuring the capacitance between the unconnected solder ball and a reference solder ball.
  • the reference solder ball can be the ground voltage or the power supply voltage.
  • more redundant bumps can be added to increase the probability of detecting non-wetted bumps.
  • This test structure takes into account that the connection between the die and the packaging substrate has the greatest stress in the corner area. At the same time, for large-sized die, redundant bumps need to exist, and considering the mechanical support of the corner area of the die and the PCB The presence of unconnected solder balls is also required. Therefore, this application does not increase the area of the die and the packaging area.
  • This test structure only needs to add a section of transmission line to the packaged structure. Since it is mainly testing the DC resistance value or capacitance value, there is no requirement for signal integrity.
  • the added transmission line can be segmented and multi-layered, and will basically not change the existing packaging design.
  • This test structure only needs to add a section of RDL trace on the die, which basically has no impact on the design of the die.
  • some structures can be added under the redundant bumps of the die. For example, instead of RDL connection, ELK layer wire interconnection can be used to detect whether cracks will appear in the ELK.
  • the testing process only requires a multimeter to detect.
  • Real-time monitoring can be achieved during surface assembly technology (SMT) production and manufacturing of die and PCB, and real-time establishment can also be achieved during reliability testing of die to facilitate monitoring of the production and manufacturing process.
  • SMT surface assembly technology
  • an act is performed based on a certain element, it means that the act is performed based on at least that element, which includes two situations: performing the act based on that element only, and performing the act based on both that element and Other elements perform this behavior.
  • Expressions such as multiple, multiple times, multiple, etc. include 2, 2 times, 2 kinds, and 2 or more, 2 or more times, or 2 or more kinds.

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)

Abstract

Disclosed in the present application are a structure and method for testing the performance of a packaged chip. The structure may comprise a package substrate and a die, wherein the package substrate is provided with at least one unconnected solder ball; each corner area of the die is provided with at least one redundant bump; and the redundant bumps located in the corner areas are connected in series to the at least one unconnected solder ball to form a test loop. The present application can detect, by means of measuring the resistance value or capacitance value of the test loop, whether the package substrate and a package body of the die have the problem of non-wetting.

Description

检测封装芯片性能的结构及方法Structure and method for testing packaged chip performance 技术领域Technical field
本发明一般涉及芯片封装技术领域,特别涉及一种检测封装芯片性能的结构及方法。The present invention generally relates to the field of chip packaging technology, and in particular to a structure and method for detecting the performance of packaged chips.
背景技术Background technique
根据IPC标准,未浸润(none wetting)被定义为熔融焊料无法与基底金属形成金属连结。这会导致基板或者PCB焊盘或元器件的焊接点在回流过程中无法捕捉到焊料。随着封装基板尺寸以及管芯(Die)尺寸的增大,基板与管芯之间的热膨胀系数(CTE)不匹配,翘曲增大,会导致管芯上的凸块与基板的未浸润失效率增大。不仅如此,封装基板向轻薄化发展,也会导致基板的翘曲进一步增大,使得凸块与基板的未浸润失效率增大。According to IPC standards, none wetting is defined as the inability of molten solder to form a metallic bond with the base metal. This results in the substrate or PCB pads or component solder joints not being able to capture the solder during the reflow process. As the size of the packaging substrate and the die size increase, the coefficient of thermal expansion (CTE) between the substrate and the die does not match, and the warpage increases, which will lead to non-wetting failure of the bumps on the die and the substrate. rate increases. Not only that, the development of packaging substrates towards thinner and lighter packaging will also lead to further increase in the warpage of the substrate, which will increase the non-wetting failure rate between the bumps and the substrate.
此外,随着芯片的晶圆节点工艺的演进,为了缩小管芯尺寸,同时为了使封装基板上的线路更加密集,嵌入式迹线基板(ETS)成为一种新选择。由于ETS基板里面,焊盘(BOP)和线路(BOT)是内嵌到封装基板里面,这样会导致凸块与焊盘或线路接触面积减小,增加凸块与基板的未浸润失效率。In addition, with the evolution of chip wafer node technology, in order to reduce the die size and make the circuits on the packaging substrate denser, embedded trace substrate (ETS) has become a new option. Since the bonding pads (BOP) and circuits (BOT) are embedded in the package substrate in the ETS substrate, this will reduce the contact area between the bumps and the pads or circuits, and increase the non-wetting failure rate between the bumps and the substrate.
发明内容Contents of the invention
本申请的目的在于提供一种检测封装芯片性能的结构及方法,可以用于检测封装基板与管芯的封装体是否存在未浸润的问题,且该结构简单、测试方法简便,可以随时进行测试,有助于实时监测生产制造过程。The purpose of this application is to provide a structure and method for detecting the performance of packaged chips, which can be used to detect whether there is a problem of non-wetting in the package of the package substrate and the die. The structure is simple, the test method is simple, and the test can be performed at any time. Helps monitor the manufacturing process in real time.
本申请公开了一种检测封装芯片性能的结构,包括:封装基板,所述封装基板上设置有至少一个未连接锡球;This application discloses a structure for detecting the performance of packaged chips, which includes: a packaging substrate, on which at least one unconnected solder ball is provided;
管芯,所述管芯的每个拐角区域设置有至少一个冗余凸块,并且,位于各拐角区域的冗余凸块、所述至少一个未连接锡球串联连接形成一测试回 路。The die, each corner area of the die is provided with at least one redundant bump, and the redundant bumps located in each corner area and the at least one unconnected solder ball are connected in series to form a test loop. road.
在一些实施例中,位于不同拐角区域的冗余凸块之间、以及冗余凸块与未连接锡球之间经由基板布线电连接。In some embodiments, electrical connections are made between redundant bumps located in different corner areas and between redundant bumps and unconnected solder balls via substrate wiring.
在一些实施例中,位于同一拐角区域的冗余凸块之间经由所述管芯内部的重布线层电连接,通过所述至少一个未连接锡球测试所述回路的电阻值或电容值,以确定所述管芯与所述封装基板之间是否存在未浸润的冗余凸块。In some embodiments, redundant bumps located in the same corner area are electrically connected via a rewiring layer inside the die, and the resistance value or capacitance value of the loop is tested through the at least one unconnected solder ball, To determine whether there are unwetted redundant bumps between the die and the packaging substrate.
在一个实施例中,所述封装基板上设置有一个未连接锡球,通过所述一个未连接锡球测试所述回路的电容值确定所述管芯与所述封装基板之间是否存在未浸润的冗余凸块。In one embodiment, an unconnected solder ball is provided on the packaging substrate, and the capacitance value of the circuit is tested through the unconnected solder ball to determine whether there is no wetting between the die and the packaging substrate. of redundant bumps.
在一个实施例中,所述封装基板上设置有两个未连接锡球,通过所述两个未连接锡球测试所述回路的电阻值确定所述管芯与所述封装基板之间是否存在未浸润的冗余凸块。In one embodiment, two unconnected solder balls are provided on the packaging substrate, and the resistance value of the circuit is tested through the two unconnected solder balls to determine whether there is a gap between the die and the packaging substrate. Uninfiltrated redundant bumps.
在一个实施例中,所述电阻值或电容值指示所述回路为开路时,确定所述管芯与所述封装基板之间存在未浸润的冗余凸块。In one embodiment, when the resistance value or capacitance value indicates that the loop is an open circuit, it is determined that there are unwetted redundant bumps between the die and the packaging substrate.
在一个实施例中,所述重布线层包括铝,所述重布线层的厚度为2微米~3微米。In one embodiment, the redistribution layer includes aluminum, and the thickness of the redistribution layer is 2 to 3 microns.
本申请还公开了一种检测封装芯片性能的方法所述方法应用于检测封装芯片性能的结构,所述结构包括:封装基板,所述封装基板上设置有至少一个未连接锡球;管芯,所述管芯每个拐角区域设置有至少一个冗余凸块,并且,位于各拐角区域的冗余凸块、所述至少一个未连接锡球之间串联连接形成一测试回路;所述方法包括:The application also discloses a method for detecting the performance of a packaged chip. The method is applied to a structure for detecting the performance of a packaged chip. The structure includes: a packaging substrate, on which at least one unconnected solder ball is provided; a die, At least one redundant bump is provided in each corner area of the die, and the redundant bumps located in each corner area and the at least one unconnected solder ball are connected in series to form a test loop; the method includes :
通过所述至少一个未连接锡球测试所述回路的电阻值或电容值,以确定所述管芯与封装基板之间是否存在未浸润的冗余凸块。Test the resistance value or capacitance value of the loop through the at least one unconnected solder ball to determine whether there are unwetted redundant bumps between the die and the packaging substrate.
在一个实施例中,在确定所述管芯与所述封装基板之间不存在未浸润的冗余凸块之后,所述方法还包括:In one embodiment, after determining that there are no unwetted redundant bumps between the die and the packaging substrate, the method further includes:
断开位于同一拐角区域的冗余凸块之间的重布线层连接,并使位于同 一拐角区域的冗余凸块之间经由所述管芯内部的金属互连层的最底层金属层连接,并通过所述至少一个未连接锡球选择性测试所述回路的电阻值或电容值,以确定所述金属互连层的最底层金属层是否存在裂纹。Disconnect the rerouting layers between redundant bumps located in the same corner area and The redundant bumps in a corner area are connected through the lowest metal layer of the metal interconnection layer inside the die, and the resistance value or capacitance value of the loop is selectively tested through the at least one unconnected solder ball. to determine whether there is a crack in the bottom metal layer of the metal interconnection layer.
在一个实施例中,所述最底层金属层为超低介电层,所述超低介电层的厚度为0.2微米~0.5微米。In one embodiment, the bottom metal layer is an ultra-low dielectric layer, and the thickness of the ultra-low dielectric layer is 0.2 microns to 0.5 microns.
本申请实施方式将封装基板上的未连接锡球与管芯拐角区域处的各冗余凸块连接,形成一测试结构,只需要通过该未连接锡球测试该结构的电阻值或电容值,就可以确定封装基板与管芯的封装体是否出现未浸润的问题。因此,这种测试结构简单易搭建,且测试方法简便,有利于实时监测生产制造过程。The embodiment of the present application connects the unconnected solder balls on the packaging substrate to the redundant bumps at the corner areas of the die to form a test structure. It is only necessary to test the resistance value or capacitance value of the structure through the unconnected solder balls. It can be determined whether there is no problem of non-wetting in the package between the packaging substrate and the die. Therefore, this test structure is simple and easy to set up, and the test method is simple, which is conducive to real-time monitoring of the production and manufacturing process.
进一步的,本申请在确定封装体未出现未浸润的问题后,简单调整下同一拐角区域的冗余凸块之间的连接线,即,使位于同一拐角区域的冗余凸块之间经由管芯内部的金属互连层的最底层金属层连接,此后再通过该未连接锡球测试该结构的电阻值或电容值,就可以确定金属互连层的最底层金属层是否存在裂纹。Furthermore, after confirming that the package does not have a problem of non-wetting, this application simply adjusts the connection lines between the redundant bumps in the same corner area, that is, the connection lines between the redundant bumps located in the same corner area are connected via the tube. The bottom metal layer of the metal interconnection layer inside the core is connected, and then the resistance value or capacitance value of the structure is tested through the unconnected solder ball to determine whether there is a crack in the bottom metal layer of the metal interconnection layer.
附图说明Description of drawings
图1示出了根据本申请一个实施例中的检测封装芯片性能的结构的示意图。Figure 1 shows a schematic diagram of a structure for detecting the performance of a packaged chip according to one embodiment of the present application.
图2示出了根据本申请一个实施例中的管芯中金属互连层的剖面示意图。FIG. 2 shows a schematic cross-sectional view of a metal interconnect layer in a die according to an embodiment of the present application.
具体实施方式Detailed ways
在以下的叙述中,为了使读者更好地理解本申请而提出了许多技术细节。但是,本领域的普通技术人员可以理解,即使没有这些技术细节和基于以下各实施方式的种种变化和修改,也可以实现本申请所要求保护的技术方案。 In the following description, many technical details are provided to enable readers to better understand this application. However, those of ordinary skill in the art can understand that the technical solution claimed in this application can be implemented even without these technical details and various changes and modifications based on the following embodiments.
本申请公开了一种检测封装芯片性能的结构,图1示出了一个实施例中的检测封装芯片性能的结构的示意图。该结构包括封装基板(例如,印刷电路板PCB)101和管芯102。所述封装基板101上设置有至少一个未连接锡球103。例如,在图1的示例中,所述封装基板101上设置有四个未连接锡球103,应当理解,本申请实施例中封装基板101上设置的未连接锡球103的数量并不以此为限。所述管芯102的每个拐角区域(Corner)107设置有至少一个冗余(Dummy)凸块104。在图1的示例中,每个拐角区域107设置有两个冗余凸块104,应当理解,每个拐角区域107中设置的冗余凸块104的数量并不以此为限。此外,需要说明的是,除拐角区域107之外,本申请实施例也可以另外在管芯的其他边缘区域或其他容易出现未浸润问题的区域设置冗余凸块104,以增大检测几率。应当理解,管芯102中除了设置在拐角区域107的冗余凸块104之外,管芯102的中心区域还设置有将管芯内部结构电性接出的凸块。位于各个拐角区域107的冗余凸块104、所述至少一个未连接锡球103串联连接形成一测试回路。This application discloses a structure for detecting the performance of a packaged chip. Figure 1 shows a schematic diagram of the structure for detecting the performance of a packaged chip in one embodiment. The structure includes a packaging substrate (eg, a printed circuit board PCB) 101 and a die 102 . At least one unconnected solder ball 103 is provided on the packaging substrate 101 . For example, in the example of FIG. 1 , four unconnected solder balls 103 are provided on the packaging substrate 101 . It should be understood that the number of unconnected solder balls 103 provided on the packaging substrate 101 in the embodiment of the present application does not depend on this. is limited. Each corner area (Corner) 107 of the die 102 is provided with at least one redundant (Dummy) bump 104. In the example of FIG. 1 , each corner area 107 is provided with two redundant bumps 104 . It should be understood that the number of redundant bumps 104 provided in each corner area 107 is not limited thereto. In addition, it should be noted that in addition to the corner area 107, embodiments of the present application may also provide redundant bumps 104 in other edge areas of the die or other areas prone to non-wetting problems to increase the detection probability. It should be understood that in addition to the redundant bumps 104 provided in the corner areas 107 of the die 102, the central area of the die 102 is also provided with bumps that electrically connect the internal structure of the die. The redundant bumps 104 located in each corner area 107 and the at least one unconnected solder ball 103 are connected in series to form a test loop.
在一个实施例中,位于不同拐角区域107的冗余凸块104之间、以及冗余凸块104与未连接锡球103之间经由基板布线105电连接。In one embodiment, the redundant bumps 104 located in different corner areas 107 and the redundant bumps 104 and the unconnected solder balls 103 are electrically connected via the substrate wiring 105 .
在一个实施例中,位于同一拐角区域107的冗余凸块104之间经由所述管芯102内部的重布线层(Re-distributed layer,RDL)106电连接。在一个实施例中,所述重布线层106包括铝,所述重布线层106的厚度为2微米~3微米,例如,重布线层106的厚度为2.3微米、2.5微米、2.8微米等。In one embodiment, the redundant bumps 104 located in the same corner area 107 are electrically connected via a redistributed layer (RDL) 106 inside the die 102 . In one embodiment, the redistribution layer 106 includes aluminum, and the thickness of the redistribution layer 106 is 2 to 3 microns. For example, the thickness of the redistribution layer 106 is 2.3 microns, 2.5 microns, 2.8 microns, etc.
在上述测试回路形成之后,通过所述至少一个未连接锡球103测试所述回路的电阻值或电容值,以确定所述管芯102与所述封装基板101之间是否存在未浸润的冗余凸块104。After the above test loop is formed, the resistance value or capacitance value of the loop is tested through the at least one unconnected solder ball 103 to determine whether there is unwetted redundancy between the die 102 and the packaging substrate 101 Bump 104.
在一个实施例中,所述封装基板101上设置有一个未连接锡球103,通过该未连接锡球103测试所述回路的电容值以确定所述管芯102与所述封装基板101之间是否存在未浸润的冗余凸块104。例如,可用万用表测量该未 连接锡球103与电源或地的电容值,在所述电容值指示所述回路为开路时,确定所述管芯102与所述封装基板101之间存在未浸润的冗余凸块104。In one embodiment, an unconnected solder ball 103 is provided on the packaging substrate 101, and the capacitance value of the loop is tested through the unconnected solder ball 103 to determine the relationship between the die 102 and the packaging substrate 101. Whether there are uninfiltrated redundant bumps 104. For example, a multimeter can be used to measure the The capacitance value connecting the solder ball 103 to the power supply or ground, and when the capacitance value indicates that the loop is an open circuit, it is determined that there is an unwetted redundant bump 104 between the die 102 and the packaging substrate 101 .
在另一个实施例中,所述封装基板101上设置有两个或两个以上未连接锡球103,所述回路中仅需包括其中的两个未连接锡球103,通过所述两个未连接锡球103测试所述回路的电阻值以确定所述管芯102与所述封装基板101之间是否存在未浸润的冗余凸块104。例如,可测试该两个未连接锡球103间的电阻值,在所述电阻值指示所述回路为开路时,确定所述管芯102与所述封装基板101之间存在未浸润的冗余凸块104。In another embodiment, two or more unconnected solder balls 103 are provided on the packaging substrate 101, and only two of the unconnected solder balls 103 are included in the circuit. Connect the solder balls 103 to test the resistance value of the loop to determine whether there are unwetted redundant bumps 104 between the die 102 and the packaging substrate 101 . For example, the resistance value between the two unconnected solder balls 103 can be tested. When the resistance value indicates that the loop is an open circuit, it is determined that there is unwetted redundancy between the die 102 and the packaging substrate 101 Bump 104.
应当理解,在将封装基板101与管芯102进行封装之前,封装基板101和管芯102各自完成了相应的测试,即封装基板101、管芯102以及封装基板101和管芯102之间的电性测试均通过。本申请可以进一步测试管芯102与封装基板101之间是否存在未浸润的冗余凸块104。It should be understood that before the packaging substrate 101 and the die 102 are packaged, the packaging substrate 101 and the die 102 have respectively completed corresponding tests, that is, the packaging substrate 101, the die 102, and the electrical connection between the packaging substrate 101 and the die 102. All sex tests passed. The application can further test whether there are unwetted redundant bumps 104 between the die 102 and the packaging substrate 101 .
本申请的另一个实施例中还公开了一种检测封装芯片性能的方法,所述方法应用于检测封装芯片性能的结构,例如,图1所示出的结构。所述结构包括封装基板101和管芯102。所述封装基板101上设置有至少一个未连接锡球103。所述管芯102的每个拐角区域107设置有至少一个冗余凸块104。位于各个拐角区域107的冗余凸块104、所述至少一个未连接锡球103串联连接形成一测试回路。位于不同拐角区域的冗余凸块104之间、以及冗余凸块104与未104之间经由所述管芯102内部的重布线层106电连接。在一个实施例中,所述重布线层106包括铝,所述重布线层106的厚度为2微米~3微米。所述方法包括:Another embodiment of the present application also discloses a method for detecting the performance of a packaged chip. The method is applied to a structure for detecting the performance of a packaged chip, for example, the structure shown in FIG. 1 . The structure includes a packaging substrate 101 and a die 102 . At least one unconnected solder ball 103 is provided on the packaging substrate 101 . Each corner area 107 of the die 102 is provided with at least one redundant bump 104 . The redundant bumps 104 located in each corner area 107 and the at least one unconnected solder ball 103 are connected in series to form a test loop. The redundant bumps 104 located in different corner areas and the redundant bumps 104 and the bumps 104 are electrically connected via the rewiring layer 106 inside the die 102 . In one embodiment, the redistribution layer 106 includes aluminum, and the thickness of the redistribution layer 106 is 2 to 3 microns. The methods include:
通过所述至少一个未连接锡球103选择性测试所述回路的电阻值或电容值,以确定所述管芯与封装基板之间是否存在未浸润的冗余凸块。The resistance value or capacitance value of the loop is selectively tested through the at least one unconnected solder ball 103 to determine whether there are unwetted redundant bumps between the die and the packaging substrate.
在一个实施例中,通过所述至少一个未连接锡球103选择性测试所述回路的电阻值或电容值,可以包括如下情形:In one embodiment, selectively testing the resistance value or capacitance value of the loop through the at least one unconnected solder ball 103 may include the following situations:
(i)若所述封装基板101上设置有一个未连接锡球103,则通过所述一 个未连接锡球103测试所述回路的电容值,在所述电容值指示所述回路为开路时,确定所述管芯102与所述封装基板101之间存在未浸润的冗余凸块104。(i) If an unconnected solder ball 103 is provided on the packaging substrate 101, then through the Unconnected solder balls 103 test the capacitance value of the loop. When the capacitance value indicates that the loop is open, it is determined that there are unwetted redundant bumps 104 between the die 102 and the packaging substrate 101 .
(ii)若所述封装基板102上设置有两个或两个以上未连接锡球103,所述回路中仅需要包括其中的两个未连接锡球103,通过所述两个未连接锡球103测试所述回路的电阻值,在所述电阻值指示所述回路为开路时,确定所述管芯102与所述封装基板101之间存在未浸润的冗余凸块104。(ii) If there are two or more unconnected solder balls 103 on the packaging substrate 102, only two of the unconnected solder balls 103 need to be included in the circuit. 103. Test the resistance value of the loop. When the resistance value indicates that the loop is an open circuit, it is determined that there are unwetted redundant bumps 104 between the die 102 and the packaging substrate 101.
在一个实施例中,在确定所述管芯102与所述封装基板101之间不存在未浸润的冗余凸块之后,所述方法还可以包括:断开位于同一拐角区域的冗余凸块104之间的重布线层106连接,并使位于同一拐角区域的冗余凸块104之间经由所述管芯101内部的金属互连层的最底层金属层连接,并通过所述至少一个未连接锡球103选择性测试所述回路的电阻值或电容值,以确定所述金属互连层的最底层金属层是否存在裂纹。所述最底层金属层为超低介电层,所述超低介电层的厚度为0.2微米~0.5微米,例如,超低介电层的厚度为0.21微米、0.3微米、0.4微米、0.46微米等。In one embodiment, after determining that there are no unwetted redundant bumps between the die 102 and the packaging substrate 101, the method may further include: disconnecting the redundant bumps located in the same corner area. 104 are connected through the redistribution layer 106, and the redundant bumps 104 located in the same corner area are connected through the lowest metal layer of the metal interconnection layer inside the die 101, and through the at least one unused The solder ball 103 is connected to selectively test the resistance value or capacitance value of the circuit to determine whether there is a crack in the bottom metal layer of the metal interconnection layer. The bottom metal layer is an ultra-low dielectric layer, and the thickness of the ultra-low dielectric layer is 0.2 microns to 0.5 microns. For example, the thickness of the ultra-low dielectric layer is 0.21 microns, 0.3 microns, 0.4 microns, and 0.46 microns. wait.
图2示出了本申请一个实施例中的管芯中金属互连层的剖面示意图。本实施例中,金属互连层包括多个金属层,每个金属层之间形成有介质层(图中未示出)。其中,最底层金属层201采用超低介电层(ELK),例如,介电常数K为3.03,最底层金属层201上的金属层202、203的介电常数大于最底层金属层201,例如,金属层202、203的介电常数K为4.2。在金属层203上形成重布线层204和钝化层205。在确定管芯与封装基板之间不存在未浸润的冗余凸块之后,断开位于同一拐角区域的冗余凸块之间的重布线层204连接,并使位于同一拐角区域的冗余凸块之间经由管芯内部的金属互连层的最底层金属层201连接,并通过至少一个未连接锡球选择性测试回路的电阻值或电容值,以确定金属互连层的最底层金属层是否存在裂纹。在电阻值或电容值指示回路为开路时,确定金属互连层的最底层金属层存在裂纹。 FIG. 2 shows a schematic cross-sectional view of a metal interconnect layer in a die in an embodiment of the present application. In this embodiment, the metal interconnection layer includes multiple metal layers, and a dielectric layer (not shown in the figure) is formed between each metal layer. Among them, the bottom metal layer 201 adopts an ultra-low dielectric layer (ELK), for example, the dielectric constant K is 3.03, and the dielectric constant of the metal layers 202 and 203 on the bottom metal layer 201 is greater than the bottom metal layer 201, for example , the dielectric constant K of the metal layers 202 and 203 is 4.2. A rewiring layer 204 and a passivation layer 205 are formed on the metal layer 203. After determining that there are no unwetted redundant bumps between the die and the package substrate, disconnect the rewiring layer 204 between the redundant bumps located in the same corner area, and enable the redundant bumps located in the same corner area. The blocks are connected via the bottom metal layer 201 of the metal interconnect layer inside the die, and the resistance value or capacitance value of the loop is selectively tested through at least one unconnected solder ball to determine the bottom metal layer of the metal interconnect layer. Are there any cracks? When the resistance value or capacitance value indicates that the loop is open, it is determined that a crack exists in the bottom metal layer of the metal interconnection layer.
由于管芯与封装基板之间的连接在拐角区域应力最大,拐角区域最容易出现未浸润的问题,因此如果将封装基板上未连接锡球与管芯上各拐角区域上的冗余凸块连接,其中位于同一拐角区域相邻的冗余凸块采用封装基板上的RDL连接,位于不同拐角区域的冗余凸块之间、以及冗余凸块与未连接锡球之间经由基板布线电连接,这样就可以形成一个用于检测是否存在未浸润的冗余凸块的回路。Since the connection between the die and the packaging substrate has the greatest stress in the corner area, the corner area is most prone to non-wetting problems. Therefore, if the unconnected solder balls on the packaging substrate are connected to the redundant bumps on each corner area of the die , where the adjacent redundant bumps located in the same corner area are connected using RDL on the package substrate, and the redundant bumps located in different corner areas, and the redundant bumps and unconnected solder balls are electrically connected via substrate wiring , thus forming a loop for detecting the presence of unwetted redundant bumps.
由于封装基板已经经过O/S测试,同时管芯也已经做过探针O/S测试。在该回路中,封装基板与管芯的连接点就是冗余凸块。如果冗余凸块中任意一个出现未浸润,那么两个未连接锡球之间就会出现开路,通过测量回路的直流电阻值就能够检测出。如果只有一个未连接锡球,通过测量未连接锡球与参考锡球之间的电容值就可以检测出,例如,参考锡球可以是接地电压或电源电压。当然,本申请的其他实施例中还可以增加更多冗余凸块来增加检测出未浸润凸块的几率。Since the packaging substrate has already undergone O/S testing, the die has also undergone probe O/S testing. In this loop, the connection point between the package substrate and the die is the redundant bump. If any one of the redundant bumps is not wetted, an open circuit will appear between the two unconnected solder balls, which can be detected by measuring the DC resistance of the loop. If there is only one unconnected solder ball, it can be detected by measuring the capacitance between the unconnected solder ball and a reference solder ball. For example, the reference solder ball can be the ground voltage or the power supply voltage. Of course, in other embodiments of the present application, more redundant bumps can be added to increase the probability of detecting non-wetted bumps.
这个测试结构考虑到管芯与封装基板之间的连接在拐角区域应力最大,同时对于大尺寸的管芯,冗余凸块是需要存在的,而考虑到管芯的拐角区域与PCB的机械支撑也会需要未连接锡球的存在,因此,本申请不会增加管芯的面积以及封装面积。This test structure takes into account that the connection between the die and the packaging substrate has the greatest stress in the corner area. At the same time, for large-sized die, redundant bumps need to exist, and considering the mechanical support of the corner area of the die and the PCB The presence of unconnected solder balls is also required. Therefore, this application does not increase the area of the die and the packaging area.
这个测试结构只需在封装后的结构上加一段传输线,由于主要是测试DC电阻值或者电容值,对信号完整性没有要求,增加的传输线可以分段多层走线,基本不会改变现有的封装设计。这个测试结构只需在管芯上加上一段RDL走线,基本不会对管芯的设计有影响。同时,可以在管芯的冗余凸块下面加上一些结构,例如不用RDL连接,而采用ELK层导线互联,可以来检测ELK是否会出现裂纹。This test structure only needs to add a section of transmission line to the packaged structure. Since it is mainly testing the DC resistance value or capacitance value, there is no requirement for signal integrity. The added transmission line can be segmented and multi-layered, and will basically not change the existing packaging design. This test structure only needs to add a section of RDL trace on the die, which basically has no impact on the design of the die. At the same time, some structures can be added under the redundant bumps of the die. For example, instead of RDL connection, ELK layer wire interconnection can be used to detect whether cracks will appear in the ELK.
测试过程只需要采用万用表就可以检测。在管芯与PCB的表面组装技术(SMT)生产制造中可以做到实时监测,在管芯做可靠性测试中也可以做到实时建立,方便监控生产制造工艺。 The testing process only requires a multimeter to detect. Real-time monitoring can be achieved during surface assembly technology (SMT) production and manufacturing of die and PCB, and real-time establishment can also be achieved during reliability testing of die to facilitate monitoring of the production and manufacturing process.
需要说明的是,在本专利的申请文件中,诸如第一和第二等之类的关系术语仅仅用来将一个实体或者操作与另一个实体或操作区分开来,而不一定要求或者暗示这些实体或操作之间存在任何这种实际的关系或者顺序。而且,术语“包括”、“包含”或者其任何其他变体意在涵盖非排他性的包含,从而使得包括一系列要素的过程、方法、物品或者设备不仅包括那些要素,而且还包括没有明确列出的其他要素,或者是还包括为这种过程、方法、物品或者设备所固有的要素。在没有更多限制的情况下,由语句“包括一个”限定的要素,并不排除在包括所述要素的过程、方法、物品或者设备中还存在另外的相同要素。本专利的申请文件中,如果提到根据某要素执行某行为,则是指至少根据该要素执行该行为的意思,其中包括了两种情况:仅根据该要素执行该行为、和根据该要素和其它要素执行该行为。多个、多次、多种等表达包括2个、2次、2种以及2个以上、2次以上、2种以上。It should be noted that in the application documents of this patent, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply these There is no such actual relationship or sequence between entities or operations. Furthermore, the terms "comprises," "comprises," or any other variations thereof are intended to cover a non-exclusive inclusion such that a process, method, article, or apparatus that includes a list of elements includes not only those elements, but also those not expressly listed other elements, or elements inherent to the process, method, article or equipment. Without further limitation, an element defined by the statement "comprises a" does not exclude the presence of additional identical elements in a process, method, article, or device that includes the stated element. In the application documents of this patent, if it is mentioned that an act is performed based on a certain element, it means that the act is performed based on at least that element, which includes two situations: performing the act based on that element only, and performing the act based on both that element and Other elements perform this behavior. Expressions such as multiple, multiple times, multiple, etc. include 2, 2 times, 2 kinds, and 2 or more, 2 or more times, or 2 or more kinds.
本说明书包括本文所描述的各种实施例的组合。对实施例的单独提及(例如“一个实施例”或“一些实施例”或“优选实施例”)不一定是指相同的实施例;然而,除非指示为是互斥的或者本领域技术人员很清楚是互斥的,否则这些实施例并不互斥。应当注意的是,除非上下文另外明确指示或者要求,否则在本说明书中以非排他性的意义使用“或者”一词。This specification includes combinations of various embodiments described herein. Individual references to an embodiment (eg, "one embodiment" or "some embodiments" or "preferred embodiments") do not necessarily refer to the same embodiment; however, unless indicated to be mutually exclusive or to those skilled in the art Clearly mutually exclusive, otherwise these embodiments are not mutually exclusive. It should be noted that the word "or" is used in this specification in a non-exclusive sense unless the context clearly indicates or requires otherwise.
在本说明书提及的所有文献都被认为是整体性地包括在本申请的公开内容中,以便在必要时可以作为修改的依据。此外应理解,以上所述仅为本说明书的较佳实施例而已,并非用于限定本说明书的保护范围。凡在本说明书一个或多个实施例的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本说明书一个或多个实施例的保护范围之内。 All documents mentioned in this specification are considered to be included in the disclosure of this application in their entirety so as to serve as a basis for modifications when necessary. In addition, it should be understood that the above descriptions are only preferred embodiments of this specification and are not intended to limit the scope of protection of this specification. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of one or more embodiments of this specification shall be included in the protection scope of one or more embodiments of this specification.

Claims (15)

  1. 一种检测封装芯片性能的结构,其特征在于,包括:A structure for testing the performance of packaged chips, which is characterized by including:
    封装基板,所述封装基板上设置有至少一个未连接锡球;A packaging substrate, with at least one unconnected solder ball provided on the packaging substrate;
    管芯,所述管芯的每个拐角区域设置有至少一个冗余凸块,并且,位于各拐角区域的冗余凸块、所述至少一个未连接锡球串联连接形成一测试回路。Each corner area of the die is provided with at least one redundant bump, and the redundant bumps located in each corner area and the at least one unconnected solder ball are connected in series to form a test loop.
  2. 根据权利要求1所述的检测封装芯片性能的结构,其特征在于,位于不同拐角区域的冗余凸块之间、以及冗余凸块与未连接锡球之间经由基板布线电连接。The structure for detecting the performance of packaged chips according to claim 1, wherein the redundant bumps located in different corner areas and the redundant bumps and unconnected solder balls are electrically connected through substrate wiring.
  3. 根据权利要求1所述的检测封装芯片性能的结构,其特征在于,位于同一拐角区域的冗余凸块之间经由所述管芯内部的重布线层电连接,通过所述至少一个未连接锡球测试所述回路的电阻值或电容值,以确定所述管芯与所述封装基板之间是否存在未浸润的冗余凸块。The structure for detecting the performance of packaged chips according to claim 1, wherein the redundant bumps located in the same corner area are electrically connected via the rewiring layer inside the die, and the at least one unconnected tin Ball tests the resistance value or capacitance value of the loop to determine whether there are unwetted redundant bumps between the die and the packaging substrate.
  4. 根据权利要求3所述的检测封装芯片性能的结构,其特征在于,所述封装基板上设置有一个未连接锡球,通过所述一个未连接锡球测试所述回路的电容值确定所述管芯与所述封装基板之间是否存在未浸润的冗余凸块。The structure for detecting the performance of a packaged chip according to claim 3, characterized in that an unconnected solder ball is provided on the packaging substrate, and the capacitance value of the circuit is tested by the one unconnected solder ball to determine the tube. Whether there are unwetted redundant bumps between the core and the package substrate.
  5. 根据权利要求3所述的检测封装芯片性能的结构,其特征在于,所述封装基板上设置有两个未连接锡球,通过所述两个未连接锡球测试所述回路的电阻值确定所述管芯与所述封装基板之间是否存在未浸润的冗余凸块。The structure for detecting the performance of a packaged chip according to claim 3, characterized in that two unconnected solder balls are provided on the package substrate, and the resistance value of the circuit is determined by testing the two unconnected solder balls. Whether there are unwetted redundant bumps between the die and the packaging substrate.
  6. 根据权利要求3所述的检测封装芯片性能的结构,其特征在于,所述电阻值或电容值指示所述回路为开路时,确定所述管芯与所述封装基板之间存在未浸润的冗余凸块。The structure for detecting the performance of a packaged chip according to claim 3, characterized in that when the resistance value or the capacitance value indicates that the loop is an open circuit, it is determined that there is unwetted redundancy between the die and the packaging substrate. remaining bumps.
  7. 根据权利要求3所述的检测封装芯片性能的结构,其特征在于,所述重布线层包括铝,所述重布线层的厚度为2微米~3微米。The structure for detecting the performance of packaged chips according to claim 3, wherein the rewiring layer includes aluminum, and the thickness of the rewiring layer is 2 to 3 microns.
  8. 一种检测封装芯片性能的方法,其特征在于,所述方法应用于检测封装芯片性能的结构,所述结构包括:封装基板,所述封装基板上设置有至少一个未连接锡球;管芯,所述管芯每个拐角区域设置有至少一个冗余凸块,并且,位于各拐角区域的冗余凸块、所述至少一个未连接锡球之间串联连接形成一测试回 路;所述方法包括:A method for detecting the performance of packaged chips, characterized in that the method is applied to a structure for detecting the performance of packaged chips. The structure includes: a packaging substrate, on which at least one unconnected solder ball is provided; a die, At least one redundant bump is provided in each corner area of the die, and the redundant bumps located in each corner area and the at least one unconnected solder ball are connected in series to form a test loop. Road; the method includes:
    通过所述至少一个未连接锡球测试所述回路的电阻值或电容值,以确定所述管芯与封装基板之间是否存在未浸润的冗余凸块。Test the resistance value or capacitance value of the loop through the at least one unconnected solder ball to determine whether there are unwetted redundant bumps between the die and the packaging substrate.
  9. 根据权利要求8所述的检测封装芯片性能的方法,其特征在于,通过所述至少一个未连接锡球选择性测试所述回路的电阻值或电容值,包括:The method for detecting the performance of packaged chips according to claim 8, characterized in that selectively testing the resistance value or capacitance value of the loop through the at least one unconnected solder ball includes:
    若所述封装基板上设置有一个未连接锡球,则通过所述一个未连接锡球测试所述回路的电容值;If an unconnected solder ball is provided on the packaging substrate, the capacitance value of the circuit is tested through the unconnected solder ball;
    若所述封装基板上设置有两个未连接锡球,则通过所述两个未连接锡球测试所述回路的电阻值。If two unconnected solder balls are provided on the packaging substrate, the resistance value of the loop is tested through the two unconnected solder balls.
  10. 根据权利要求8所述的检测封装芯片性能的方法,其特征在于,在所述电阻值或电容值指示所述回路为开路时,确定所述管芯与所述封装基板之间存在未浸润的冗余凸块。The method for detecting the performance of a packaged chip according to claim 8, characterized in that when the resistance value or the capacitance value indicates that the loop is an open circuit, it is determined that there is an unwetted layer between the die and the packaging substrate. Redundant bumps.
  11. 根据权利要求8所述的检测封装芯片性能的方法,其特征在于,位于不同拐角区域的冗余凸块之间、以及冗余凸块与未连接锡球之间经由基板布线电连接。The method for detecting the performance of a packaged chip according to claim 8, wherein the redundant bumps located in different corner areas and the redundant bumps and unconnected solder balls are electrically connected via substrate wiring.
  12. 根据权利要求8所述的检测封装芯片性能的方法,其特征在于,位于同一拐角区域的冗余凸块之间经由所述管芯内部的重布线层电连接。The method for detecting the performance of a packaged chip according to claim 8, wherein the redundant bumps located in the same corner area are electrically connected via a rewiring layer inside the die.
  13. 根据权利要求12所述的检测封装芯片性能的方法,其特征在于,在确定所述管芯与所述封装基板之间不存在未浸润的冗余凸块之后,所述方法还包括:The method for detecting the performance of a packaged chip according to claim 12, wherein after determining that there are no unwetted redundant bumps between the die and the packaging substrate, the method further includes:
    断开位于同一拐角区域的冗余凸块之间的重布线层连接,并使位于同一拐角区域的冗余凸块之间经由所述管芯内部的金属互连层的最底层金属层连接,并通过所述至少一个未连接锡球选择性测试所述回路的电阻值或电容值,以确定所述金属互连层的最底层金属层是否存在裂纹。Disconnect the rewiring layer connection between the redundant bumps located in the same corner area, and connect the redundant bumps located in the same corner area via the lowest metal layer of the metal interconnection layer inside the die, And selectively test the resistance value or capacitance value of the loop through the at least one unconnected solder ball to determine whether there is a crack in the bottom metal layer of the metal interconnection layer.
  14. 根据权利要求12所述的检测封装芯片性能的方法,其特征在于,所述重布线层包括铝,所述重布线层的厚度为2微米~3微米。The method for detecting the performance of a packaged chip according to claim 12, wherein the rewiring layer includes aluminum, and the thickness of the rewiring layer is 2 to 3 microns.
  15. 根据权利要求13所述的检测封装芯片性能的方法,其特征在于,所述 最底层金属层为超低介电层,所述超低介电层的厚度为0.2微米~0.5微米。 The method for detecting packaged chip performance according to claim 13, characterized in that: The bottom metal layer is an ultra-low dielectric layer, and the thickness of the ultra-low dielectric layer is 0.2 microns to 0.5 microns.
PCT/CN2023/077726 2022-08-16 2023-02-22 Structure and method for testing performance of packaged chip WO2024036910A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN202210983387.1 2022-08-16
CN202210983387.1A CN117637698A (en) 2022-08-16 2022-08-16 Structure and method for detecting performance of packaged chip

Publications (1)

Publication Number Publication Date
WO2024036910A1 true WO2024036910A1 (en) 2024-02-22

Family

ID=89940540

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2023/077726 WO2024036910A1 (en) 2022-08-16 2023-02-22 Structure and method for testing performance of packaged chip

Country Status (2)

Country Link
CN (1) CN117637698A (en)
WO (1) WO2024036910A1 (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6166556A (en) * 1998-05-28 2000-12-26 Motorola, Inc. Method for testing a semiconductor device and semiconductor device tested thereby
US20040238818A1 (en) * 2003-03-13 2004-12-02 Dong-Han Kim Semiconductor chip with test pads and tape carrier package using the same
US20120161805A1 (en) * 2010-12-27 2012-06-28 Myung-Sook Jung Display device and method of testing the same
CN102983106A (en) * 2011-09-02 2013-03-20 台湾积体电路制造股份有限公司 Packaging and function tests for package-on-package and system-in-package structures

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6166556A (en) * 1998-05-28 2000-12-26 Motorola, Inc. Method for testing a semiconductor device and semiconductor device tested thereby
US20040238818A1 (en) * 2003-03-13 2004-12-02 Dong-Han Kim Semiconductor chip with test pads and tape carrier package using the same
US20120161805A1 (en) * 2010-12-27 2012-06-28 Myung-Sook Jung Display device and method of testing the same
CN102983106A (en) * 2011-09-02 2013-03-20 台湾积体电路制造股份有限公司 Packaging and function tests for package-on-package and system-in-package structures

Also Published As

Publication number Publication date
CN117637698A (en) 2024-03-01

Similar Documents

Publication Publication Date Title
US11193953B2 (en) 3D chip testing through micro-C4 interface
US10950507B2 (en) Electrical testing method of interposer
US11226363B2 (en) Reliability testing method and apparatus
US8829918B2 (en) Die connection monitoring system and method
US8373275B2 (en) Fine pitch solder bump structure with built-in stress buffer
JP5918205B2 (en) Test apparatus and test method thereof
WO2024036910A1 (en) Structure and method for testing performance of packaged chip
JP2715793B2 (en) Semiconductor device and manufacturing method thereof
JP2009524925A (en) Method for manufacturing an integrated circuit comprising different components
Gagnon et al. Thermo-compression bonding and mass reflow assembly processes of 3D logic die stacks
Zhang et al. 45RFSOI WLCSP board level package risk assessment and solder joint reliability performance improvement
US9087805B2 (en) Semiconductor test and monitoring structure to detect boundaries of safe effective modulus
JP5174505B2 (en) Semiconductor device with defect detection function
KR101320934B1 (en) Semiconductor device and manufacturing method thereof
KR101169687B1 (en) Bump for mounting semiconductor chip and semiconductor chip including the same and electrical test method thereof
KR20090132186A (en) Manufacturing method of electronic parts built-in substrate
TWI305273B (en) A test assembly for testing a ball grid array package device
TWM521801U (en) Adapting interface board with multi-layer structure with high bonding strength
JP4140366B2 (en) Interlayer connection via hole inspection method and multilayer circuit wiring board
Luo et al. Effects of bonding parameters on the drop impact reliability of microbumps in chip on chip interconnection
Shutler et al. A family of high performance MCM-C/D packages utilizing cofired alumina multilayer ceramic and a shielded thin film redistribution structure
JPH08255976A (en) Multilayer wiring board
TWI387079B (en) Semiconductor package structure and method for manufacturing the same
TWM506366U (en) Wafer testing interface assembly and its improved adapting interface board bonding structure
TW201514517A (en) Detection method of intermediate plate and intermediate plate adapted for the detection method

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 23853827

Country of ref document: EP

Kind code of ref document: A1