WO2024022327A1 - Specialty gas safety control method and apparatus, circuit, and semiconductor process device - Google Patents

Specialty gas safety control method and apparatus, circuit, and semiconductor process device Download PDF

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Publication number
WO2024022327A1
WO2024022327A1 PCT/CN2023/109090 CN2023109090W WO2024022327A1 WO 2024022327 A1 WO2024022327 A1 WO 2024022327A1 CN 2023109090 W CN2023109090 W CN 2023109090W WO 2024022327 A1 WO2024022327 A1 WO 2024022327A1
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WO
WIPO (PCT)
Prior art keywords
circuit
relay
pair
gas
corresponding valve
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PCT/CN2023/109090
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French (fr)
Chinese (zh)
Inventor
刘畅
荣延栋
胡云龙
刘旭
Original Assignee
北京北方华创微电子装备有限公司
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Publication of WO2024022327A1 publication Critical patent/WO2024022327A1/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/08Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides
    • C23C16/14Deposition of only one other metal element
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52Controlling or regulating the coating process

Definitions

  • the invention relates to the field of semiconductor technology, and in particular to a special gas safety control method, device, control circuit and semiconductor process equipment, as well as a computer-readable storage medium.
  • Chemical Vapor Deposition (CVD) technology is a method that can plate substances on the surface of a substrate in the form of an atomic film.
  • a characteristic of the CVD process is that a variety of process gases enter the chamber.
  • the process gas enters the chamber at the same time and adheres to the wafer, reacting on the wafer surface to generate the required film.
  • a vacuum pump is required to continuously remove by-products and remaining reactants.
  • CVD process gases will contain a variety of special gases. Special gases refer to flammable, explosive, toxic, and corrosive gases, such as H 2 , WF 6 , 5% B 2 H 6 /95% N 2 , NF 3 , SiH 4 .
  • embodiments of the present invention are proposed to provide a special gas safety control method, device, semiconductor process equipment, and computer-readable storage medium that overcome the above problems or at least partially solve the above problems.
  • inventions of the present invention disclose a special gas safety control method, which is applied to semiconductor process equipment.
  • the semiconductor process equipment includes: a process chamber and a control circuit;
  • the control circuit includes a first circuit for controlling the on-off of the valve corresponding to the first gas, a second circuit for controlling the on-off of the valve corresponding to the second gas, and a third circuit for controlling the on-off of the valve corresponding to the third gas,
  • the methods include:
  • the first circuit is controlled to be disconnected, and the second circuit is controlled to be opened.
  • the third circuit Connect with the third circuit to close the first gas corresponding valve and open the second gas corresponding valve and the third gas corresponding valve;
  • the first circuit When it is necessary to open the first gas corresponding valve, the first circuit is controlled to be turned on, and the second circuit and the third circuit are controlled to be turned off, so that the first gas corresponding valve is opened and the The second gas corresponding valve and the third gas corresponding valve are closed.
  • the first circuit, the second circuit and the third circuit are controlled to be turned on so that the first gas corresponds to the valve, the The second gas corresponding valve and the third gas corresponding valve are opened.
  • control circuit further includes: a first relay, a second relay and a third relay
  • method further includes:
  • the second relay When the pressure value is greater than the preset pressure threshold, the second relay is controlled to be turned on and the third relay to be turned off through the first relay, so that the second relay controls the third relay.
  • the second circuit On and off of a circuit, the second circuit and the third circuit;
  • the first relay When the pressure value is less than or equal to the preset pressure threshold, the first relay is used to control the second relay to turn off and the third relay to turn on, so that the third relay controls all The first circuit, the second circuit and the third circuit are switched on and off.
  • the first relay includes a first pair of normally closed contacts and a first pair of normally open contacts; when the pressure value is greater than the preset pressure threshold, the first relay control station The second relay is turned on and the third relay is turned off, so that the second relay controls the on/off of the first circuit, the second circuit and the third circuit, including:
  • the first pair of normally open contacts is controlled by the first relay to remain in an open state, so as to control the third relay to open, and through the The first relay controls the first pair of normally closed contacts to remain in a closed state to control the second relay to turn on, so that the second relay controls the first circuit, the second circuit and the The third circuit is switched on and off.
  • the second relay includes a second pair of normally closed contacts, a second pair of normally open contacts and a third pair of normally open contacts; in the case where the pressure value is greater than the preset pressure threshold,
  • the first circuit is controlled to be disconnected, and the second circuit and the third circuit are controlled to be connected, so that the third circuit is connected.
  • a gas corresponding valve is closed, the second gas corresponding valve and the third gas corresponding valve are opened, including:
  • the second pair of normally closed contacts is controlled to open through the second relay, the first circuit is controlled to open, and the second pair of normally open contacts and the third pair of normally open contacts are controlled through the second relay.
  • the normally open contact is closed, the second circuit and the third circuit are respectively controlled to be connected, so that the first gas corresponding valve is closed, the second gas corresponding valve and the third gas corresponding valve are opened. .
  • the first circuit is controlled to be turned on, and the second circuit and the third circuit are controlled to be turned off, so that the first gas The corresponding valve is opened, the second gas corresponding valve and the third gas corresponding valve are closed, including:
  • the second pair of normally closed contacts is controlled to remain closed through the second relay, the first circuit is controlled to be turned on, and the second pair of normally open contacts and the third pair of normally open contacts are controlled through the second relay.
  • Three pairs of normally open contacts remain in a disconnected state and control the disconnection of the second circuit and the third circuit respectively, so that the first gas corresponding valve opens, the second gas corresponding valve and the third gas corresponding valve open. The gas corresponding valve is closed.
  • the The second relay is controlled to be turned off and the third relay is turned on through the first relay, so that the third relay controls the passage of the first circuit, the second circuit and the third circuit.
  • Breaks include:
  • the first pair of normally closed contacts is controlled to open through the first relay
  • the second relay is controlled to open
  • the first pair of normally closed contacts is controlled to open through the third relay.
  • a relay controls the first pair of normally open contacts to close and controls the third relay to turn on, so that the third relay controls the conduction of the first circuit, the second circuit and the third circuit. Break.
  • the third relay includes a fourth pair of normally open contacts, a fifth pair of normally open contacts and a sixth pair of normally open contacts; when the pressure value is less than or equal to the preset pressure threshold
  • the first circuit, the second circuit and the third circuit are controlled to be connected so that the first gas corresponding valve, the second gas corresponding valve and the third gas corresponding valve Open, including:
  • the third relay controls the fourth pair of normally open contacts, the fifth pair of normally open contacts and the sixth pair of normally open contacts to close, and controls the first circuit and the second circuit and the third circuit to open the first gas corresponding valve, the second gas corresponding valve and the third gas corresponding valve.
  • the first gas is NF 3
  • the second gas is H 2
  • the third gas is SiH 4 .
  • An embodiment of the present invention also discloses a control circuit, which is applied to semiconductor process equipment.
  • the control circuit includes: a first circuit for controlling the on-off of the valve corresponding to the first gas, and a first circuit for controlling the on-off of the valve corresponding to the second gas.
  • the second circuit and the third circuit used to control the on-off of the corresponding valve of the third gas,
  • It also includes a first relay, a second relay and a third relay.
  • the first relay is used to control the second relay to turn on and the third relay to turn on.
  • the relay is turned off, so that the second relay controls the on-off of the first circuit, the second circuit and the third circuit; when the pressure value is less than or equal to the preset pressure threshold,
  • the first relay is also used to control the second relay to turn off and the third relay to turn on, so that the third relay controls the first circuit, the second circuit and the The third circuit is switched on and off.
  • the first relay includes a first pair of normally closed contacts and a first pair of normally open contacts; when the pressure value is greater than a preset pressure threshold, the first relay is used to control the The first pair of normally open contacts remains in the open state, controlling the third relay to open, and the first pair of normally closed contacts is controlled to remain in the closed state through the first relay, and the second relay is controlled to open , so that the second relay controls the on and off of the first circuit, the second circuit and the third circuit; and/or,
  • the second relay includes a second pair of normally closed contacts, a second pair of normally open contacts and a third pair of normally open contacts; the second relay is used to control the disconnection of the second pair of normally closed contacts, To control the opening of the first circuit, the second relay is also used to control the closing of the second pair of normally open contacts and the third pair of normally open contacts to respectively control the second circuit and the The third circuit is connected so that the first gas corresponding valve is closed, the second gas corresponding valve and the third gas corresponding valve are opened;; and/or,
  • the third relay includes a fourth pair of normally open contacts, a fifth pair of normally open contacts and a sixth pair of normally open contacts; the third relay is used to control the fourth pair of normally open contacts, the The fifth pair of normally open contacts and the sixth pair of normally open contacts are closed to control the first circuit, the second circuit and the third circuit to be connected so that the first gas corresponding valve , the second gas corresponding valve and the third gas corresponding valve are opened.
  • An embodiment of the present invention also discloses a semiconductor process equipment.
  • the semiconductor process equipment includes: a process chamber and a control circuit; the control circuit includes a first circuit for controlling the on/off of the valve corresponding to the first gas; A second circuit for turning on and off the valve corresponding to the second gas and a third circuit for controlling the turning on and off of the valve corresponding to the third gas.
  • the semiconductor process equipment also includes:
  • Controller used to obtain the pressure value of the process chamber; when the pressure value is greater than the preset pressure In the case of a threshold value, when the second gas corresponding valve and the third gas corresponding valve need to be opened, the first circuit is controlled to be disconnected, and the second circuit and the third circuit are controlled to be connected, So that the first gas corresponding valve is closed, the second gas corresponding valve and the third gas corresponding valve are opened; when the first gas corresponding valve needs to be opened, the first circuit is controlled to be turned on, and The second circuit and the third circuit are controlled to be disconnected, so that the first gas corresponding valve is opened, and the second gas corresponding valve and the third gas corresponding valve are closed.
  • the controller is also configured to control the first circuit, the second circuit and the third circuit to turn on when the pressure value is less than or equal to the preset pressure threshold. , so that the first gas corresponding valve, the second gas corresponding valve and the third gas corresponding valve are opened.
  • control circuit further includes: a first relay, a second relay and a third relay
  • controller is further configured to, when the pressure value is greater than the preset pressure threshold, use the The first relay controls the second relay to be turned on and the third relay to be turned off, so that the second relay controls the on/off of the first circuit, the second circuit and the third circuit; in When the pressure value is less than or equal to the preset pressure threshold, the first relay controls the second relay to turn off and the third relay to turn on, so that the third relay controls the The first circuit, the second circuit and the third circuit are connected and disconnected.
  • the first relay includes a first pair of normally closed contacts and a first pair of normally open contacts; and the controller is configured to, when the pressure value is greater than a preset pressure threshold, use the The first relay controls the first pair of normally open contacts to maintain an open state, controls the third relay to open, and controls the first pair of normally closed contacts to maintain a closed state through the first relay, controlling all The second relay is turned on, so that the second relay controls the on/off of the first circuit, the second circuit and the third circuit.
  • the second relay includes a second pair of normally closed contacts, a second pair of normally open contacts and a third pair of normally open contacts; the controller is configured to control the The second pair of normally closed contacts point is disconnected, the first circuit is controlled to be disconnected, and the second pair of normally open contacts and the third pair of normally open contacts are controlled to be closed through the second relay, respectively controlling the second circuit and The third circuit is turned on, so that the first gas corresponding valve is closed, the second gas corresponding valve and the third gas corresponding valve are opened.
  • the controller is configured to control the second pair of normally closed contacts to maintain a closed state through the second relay, control the first circuit to be turned on, and control the second pair of normally closed contacts through the second relay.
  • the second pair of normally open contacts and the third pair of normally open contacts remain disconnected, and control the disconnection of the second circuit and the third circuit respectively, so that the first gas corresponding valve opens, and the The second gas corresponding valve and the third gas corresponding valve are closed.
  • the controller is configured to control the first pair of normally closed contacts to open through the first relay when the pressure value is less than or equal to the preset pressure threshold, and control the The second relay is turned off, and the first pair of normally open contacts are controlled to be closed by the first relay, and the third relay is controlled to be turned on, so that the third relay controls the first circuit, the The second circuit and the third circuit are connected and disconnected.
  • the third relay includes a fourth pair of normally open contacts, a fifth pair of normally open contacts, and a sixth pair of normally open contacts; and the controller is configured to control the third relay through the third relay.
  • the fourth pair of normally open contacts, the fifth pair of normally open contacts and the sixth pair of normally open contacts are closed to control the connection of the first circuit, the second circuit and the third circuit, So that the first gas corresponding valve, the second gas corresponding valve and the third gas corresponding valve are opened.
  • the first gas is NF 3
  • the second gas is H 2
  • the third gas is SiH 4 .
  • An embodiment of the present invention also discloses a special gas safety control device for controlling a control circuit in semiconductor process equipment.
  • the special gas safety control device includes at least one processor and at least one memory, and the memory stores Have at least one program;
  • the at least one program When executed by the at least one processor, the at least one The processor implements the above method disclosed in the embodiment of the present invention.
  • Embodiments of the present invention also disclose a computer-readable storage medium for use in semiconductor processing equipment, on which a computer program is stored. When the program is executed by a processor, the above method disclosed in the embodiment of the present invention is implemented.
  • the pressure value of the process chamber is obtained; when the pressure value is greater than the preset pressure threshold, when the second gas corresponding valve and the third gas corresponding valve need to be opened, the first circuit is controlled to be disconnected, Control the second circuit and the third circuit to be connected so that the first gas corresponding valve is closed, the second gas corresponding valve and the third gas corresponding valve are opened; when it is necessary to open the first gas corresponding valve, control the first circuit to be connected, and controlling the disconnection of the second circuit and the third circuit to open the first gas corresponding valve, and close the second gas corresponding valve and the third gas corresponding valve.
  • the valve interlock function can be realized, that is, the valve interlock is added to the circuit design, so that when the process chamber pressure reaches the preset threshold, the first gas corresponding valve and The valve corresponding to the second gas will not be opened at the same time, and the valve corresponding to the first gas and the valve corresponding to the third gas will not be opened at the same time, thereby avoiding the risk of software control failure and preventing chemical reactions between special gases from generating by-products, causing hardware failure. Damage and personal injury, eliminate safety hazards, and protect system and personnel safety.
  • Figure 1 is a step flow chart of a special gas safety control method provided by an embodiment of the present invention
  • Figure 2 is a schematic diagram of a special gas safety control provided by an embodiment of the present invention.
  • Figure 3 is a structural block diagram of a semiconductor process equipment provided by an embodiment of the present invention.
  • Figure 4 is a structural block diagram of the special gas safety control device provided in the embodiment of the present invention.
  • the embodiment of the present invention takes the tungsten metal chemical vapor deposition process (CVD W process) as an example.
  • the CVD W process is mainly used to deposit W metal thin films of the 28-14nm technology generation.
  • Special gases in the process gases used by CVD W equipment can include: H 2 , WF 6 , 5% B 2 H 6 /95% N 2 , NF 3 and SiH 4 .
  • the MSDS (Material Safety Data Sheet) of each gas is as follows:
  • Hydrogen is stored in high-pressure cylinders and is a colorless, odorless, flammable compressed gas. When the hydrogen content in the air is >4%, a fire or explosion may occur at any time.
  • Boiling point (1 atmosphere) -423.0F (-252.8C).
  • Hazard Overview Colorless, highly toxic, extremely flammable gas sold mixed with argon, helium, hydrogen or nitrogen that has a sickly sweet smell. Causes death if inhaled or absorbed through skin.
  • Oxidizing agents aluminum, lithium, halides and metal oxides.
  • Hazard overview Toxic, corrosive, non-flammable liquefied gas, which hydrolyzes into corrosive hydrofluoric acid when exposed to moisture. Causes severe chemical burns if inhaled or in contact with skin.
  • Hazard Summary Toxic, non-flammable compressed gas. It is an oxidizing agent that causes or promotes the burning of metallic and non-metallic substances.
  • Silane is a colorless, air-reactive gas that can cause asphyxiation. This gas usually burns when in contact with air and emits thick white amorphous silica fumes.
  • H 2 and SiH 4 are reducing, and NF 3 is an oxidant.
  • the chemical bond energy of NF 3 is relatively weak and not stable enough. Under certain conditions, NF 3 can chemically react with H 2 reaction, the chemical equation is:
  • the reaction products SiF 4 and NH 3 will cause pollution to the chamber and pipelines. Moreover, one of the reactants, HF, is toxic and corrosive, which will cause hardware damage and safety hazards. Since the concentration of gas is proportional to the space pressure, when the chamber pressure is less than a certain value (such as 10Torr), the gas concentration is low and the gas molecules are inactive, making it difficult for chemical reactions to occur, and electrical interlocking is not required.
  • a certain value such as 10Torr
  • the switch of the special gas valve is controlled through software according to the preset interlock conditions. For example, when the chamber upper cover is closed, the pressure difference between the gas cabinet and the environment is greater than the alarm value, the chamber gas cabinet door is closed, etc. When one or more of them are not satisfied, the special gas valve is not allowed to open, which can prevent special gases from leaking into the air; when one or more of the coolant leakage alarms, chamber overtemperature sensor alarms, smoke sensor alarms, etc. are detected, When an abnormality occurs, closing the special gas valve can promptly prohibit the flow of special gas when an abnormal situation occurs to prevent more serious hazards.
  • valves Although the interlocking between valves is implemented by a software program in the current design, there is a risk of software failure, and this function needs to be added to the electrical design.
  • One of the core ideas of the embodiments of the present invention is to provide a new special gas valve control method, which controls the opening and closing of the special gas valve through a circuit, so that when the process chamber pressure is greater than the preset pressure threshold, the first gas corresponding valve and the third gas valve are connected to each other.
  • the valves corresponding to the two gases will not be opened at the same time, and the valves corresponding to the first gas and the third gas will not be opened at the same time, thereby avoiding the risk of software control failure and preventing chemical reactions between special gases from generating by-products and causing damage to the hardware. and personnel injuries, eliminate safety hazards, and protect system and personnel safety.
  • the semiconductor process equipment includes: a process chamber and a control circuit; the control circuit includes: A first circuit for controlling the on-off of the valve corresponding to the first gas, a second circuit for controlling on-off of the valve corresponding to the second gas, and a third circuit for controlling the on-off of the valve corresponding to the third gas.
  • the special gas safety control method can be Includes the following steps:
  • Step 101 obtain the pressure value of the process chamber
  • control circuit may also include a controller (PLC, Programm Logic Controller) for acquiring the pressure value signal of the process chamber and providing the control signal to the control circuit.
  • PLC Programm Logic Controller
  • the circuit outputs a level signal.
  • control circuit further includes: a first relay, a second relay and a third relay
  • special gas safety control method further includes: obtaining the pressure value of the process chamber, and when the pressure value is greater than the preset pressure In the case of a threshold value, the first relay is used to control the second relay to be turned on and the third relay to be turned off, so that the second relay controls the on/off of the first circuit, the second circuit and the third circuit; when the pressure value is less than or equal to the preset
  • a pressure threshold is set, the first relay is used to control the second relay to be turned off and the third relay to be turned on, so that the third relay controls the on/off of the first circuit, the second circuit and the third circuit.
  • the on/off of the second relay and the third relay can be controlled through the first relay; the first circuit, the second circuit and the third circuit can be controlled through the second relay and/or the third relay.
  • the circuit is on and off.
  • the PLC can transmit a control signal to the first relay to control the corresponding contact point of the first relay to close or open, and then control the corresponding contact point of the second relay and the third relay to close or open.
  • the first relay can be used to control the second relay to turn on and the third relay to turn off, so that the second relay controls the first circuit, the second circuit and the third circuit.
  • the first relay can be used to control the second relay to turn off and the third relay to turn on, so that the third relay controls the first circuit and the second circuit. circuit and the third circuit.
  • Step 102 When the pressure value is greater than the preset pressure threshold, when it is necessary to open the second gas corresponding valve and the third gas corresponding valve, control the first circuit to be disconnected, and control the second circuit and the third circuit to be connected, So that the first gas corresponding valve is closed, the second gas corresponding valve and the third gas corresponding valve are opened.
  • control circuit may include a first circuit, a second circuit, and a third circuit.
  • first circuit can control the on-off of the first gas valve
  • second circuit can control the on-off of the second gas valve
  • third circuit can control the on-off of the third gas valve.
  • the pressure value of the process chamber is greater than the preset pressure threshold, it means that the concentration of special gases in the process chamber is high, and the special gases are prone to react with each other and cause pollution to the process chamber and pipelines.
  • the first circuit can be controlled to be disconnected, and the second circuit and the third circuit can be controlled to be connected, so that the first gas valve is closed and the second gas valve is connected to the third gas valve.
  • the gas valve opens.
  • the first relay includes a first pair of normally closed contacts and a first pair of normally open contacts; when the pressure value is greater than a preset pressure threshold, the first pair is controlled by the first relay The normally open contact remains open to control the third relay to open, and the first pair of normally closed contacts is controlled to remain closed through the first relay to control the second relay to open, so that the second relay controls the first circuit, the second circuit and the third circuit.
  • the first relay may include a first pair of normally closed contacts and a first pair of normally open contacts.
  • the PLC can output a low-level signal to the first relay.
  • the first relay receives the low-level signal and can control the first pair of normally open contacts to remain disconnected. So that the third relay is disconnected, and the first pair of normally closed contacts can be controlled to remain closed, so that the second relay is connected, and the second relay can control the first circuit, the second circuit and the third circuit in the connected state. The switching of three circuits.
  • FIG 2 is a schematic diagram of a special gas safety control provided by an embodiment of the present invention.
  • KA01 is the first relay
  • KA02 is the second relay
  • KA03 is the third relay
  • the first relay KA01 includes a first pair of normal relays.
  • the closed contacts 11 and 12 are used to control the on-off of the second relay KA02.
  • the first relay KA01 also includes a first pair of normally open contacts 13 and 14, used to control the on-off of the third relay KA03.
  • the preset pressure threshold for example, 10Torr
  • the first pair of normally open contacts 13 and 13 of the first relay KA01 14 is open and the first pair of normally closed contacts 11 and 12 are closed, then the third relay KA03 is open and the second relay KA02 is connected.
  • the second relay KA02 controls the first circuit, the second circuit and the third circuit. On and off.
  • the second relay includes a second pair of normally closed contacts, a second pair of normally open contacts and a third pair of normally open contacts; the second pair of normally closed contacts is controlled by the second relay Maintain the closed state, control the first circuit to be connected, and control the second pair of normally open contacts and the third pair of normally open contacts to maintain the disconnected state through the second relay, respectively control the second circuit and the third circuit to disconnect, so as to The first gas corresponding valve is closed, the second gas corresponding valve and the third gas corresponding valve are opened.
  • the second relay may include a second pair of normally closed contacts, a second pair of normally open contacts, and a third pair of normally open contacts.
  • the first relay controls the second relay to turn on and the third relay to turn off.
  • the second relay can maintain the closed state by controlling the second pair of normally closed contacts to control the third relay.
  • One circuit is connected, and the second pair of normally open contacts and the third pair of normally open contacts are controlled to remain disconnected, and the second circuit and the third circuit are respectively controlled to be disconnected, so that the first gas valve is closed and the second gas valve is closed. valve and third gas valve open.
  • the first gas is NF 3
  • the second gas is H 2
  • the third gas is SiH 4 .
  • the first gas may be NF 3
  • the second gas may be H 2
  • the third gas may be SiH 4 .
  • the second relay KA02 includes a second pair of normally closed contacts 21 and 22, which can be controlled by controlling the on-off of the first circuit.
  • the second relay KA02 also includes a second pair of normally open contacts 23 and 24, which can control the on and off of the H2 valve by controlling the on and off of the second circuit;
  • the second relay KA02 also includes a third pair of normally open contacts.
  • the opening contacts 25 and 26 can control the opening and closing of the SiH4 valve by controlling the opening and closing of the third circuit.
  • the second relay KA02 controls the on and off of the first circuit, the second circuit and the third circuit.
  • the PLC's NF 3 and The switching signal of H 2 and SiH 4 valve opening can output a high level signal.
  • the second relay KA02 receives the high level signal and can control the second pair of normally open contacts 23, 24 and the third pair of normally open contacts of the second relay KA02. Contacts 25 and 26 are closed, and the second pair of normally closed contacts 21 and 22 are open.
  • the control The circuit of the H2 valve and the SiH 4 valve is connected, the circuit controlling the NF 3 valve is disconnected, the H2 valve and the SiH 4 valve are allowed to open, and the NF 3 valve is closed.
  • Step 103 When it is necessary to open the valve corresponding to the first gas, control the first circuit to be turned on, and control the second circuit and the third circuit to be turned off, so that the first gas corresponding valve is opened, the second gas corresponding valve and the third gas are connected. The corresponding valve is closed.
  • the first circuit can be controlled to be turned on, and the second circuit and the third circuit can be controlled to be turned off, The first gas valve is opened, and the second gas valve and the third gas valve are closed, thereby realizing that the first gas and the second gas valve are not opened at the same time, and the first gas and the third gas valve are not opened at the same time.
  • the second pair of normally closed contacts is controlled to remain closed through the second relay, the first circuit is controlled to be turned on, and the second pair of normally open contacts and the third pair are controlled through the second relay.
  • the normally open contact remains in a disconnected state and controls the disconnection of the second circuit and the third circuit respectively, so that the first gas corresponding valve is opened, the second gas corresponding valve and the third gas corresponding valve are closed.
  • the second relay when the second relay is turned on, when the NF 3 valve needs to be opened, the second relay can control the second pair of normally closed contacts to remain closed to make the first circuit turn on, and control the second Keep the normally open contact and the third pair of normally open contacts in a disconnected state to disconnect the second circuit and the third circuit respectively, thereby controlling the NF 3 valve to open, the H 2 valve and the SiH 4 valve to close.
  • the switching signal of the PLC's NF 3 and H 2 and SiH 4 valve openings can output a low-level signal, and the second relay KA02 receives the low-level signal.
  • the signal can control the second pair of normally open contacts 23, 24 and the third pair of normally open contacts 25, 26 of the second relay KA02 to open, and the second pair of normally closed contacts 21, 22 to close.
  • control H 2 The circuit between the valve and the SiH 4 valve is disconnected, the circuit controlling the NF 3 valve is connected, the H 2 valve and the SiH 4 valve are closed, and the NF 3 valve is allowed to open.
  • the first circuit, the second circuit and the third circuit are controlled to be connected, so that the first gas corresponding valve, the second gas corresponding valve and the third gas corresponding valve are opened.
  • the pressure value of the process chamber is less than or equal to the preset pressure threshold, it means that the concentration of the special gas in the process chamber is low, and the gas molecules are inactive and are not prone to chemical reactions. There is no need for electrical interlocking. You can pass The first circuit, the second circuit and the third circuit are controlled to be connected to open the NF 3 valve, H 2 valve and SiH 4 valve.
  • the first pair of normally closed contacts is controlled to open through the first relay
  • the second relay is controlled to open
  • the first pair of normally closed contacts is controlled through the first relay.
  • the first pair of normally open contacts are controlled to be closed
  • the third relay is controlled to be turned on, so that the third relay controls the opening and closing of the first circuit, the second circuit and the third circuit.
  • the PLC can output a high-level signal to the first relay, and the first relay receives the high-level signal and can control the first pair of normally closed
  • the contacts open to disconnect the second relay, and the first pair of normally open contacts are controlled to close to connect the third relay, thereby controlling the third relay to control the conduction of the first circuit, the second circuit and the third circuit. Break.
  • the PLC can output a high-level signal to the first relay KA01.
  • the first relay KA01 receives the high-level signal and can control the first pair of normally closed contacts 11 and 12 to open. , so that the second relay KA02 is turned off, and the first pair of normally open contacts 13 and 14 are controlled to close, so that the third relay KA03 is turned on, and the third relay KA03 controls the first circuit, the second circuit and the third circuit On and off.
  • the third relay controls the closing of the fourth pair of normally open contacts, the fifth pair of normally open contacts and the sixth pair of normally open contacts, and controls the first circuit, the second circuit and the third pair of normally open contacts.
  • the three circuits are connected to open the first gas corresponding valve, the second gas corresponding valve and the third gas corresponding valve.
  • the third relay when the third relay is turned on, the third relay can control the fourth pair of normally open contacts, the fifth pair of normally open contacts, and the sixth pair of normally open contacts to close, so that the first circuit, Second circuit It is connected to the third circuit to control the opening of the valve corresponding to NF 3 , the valve corresponding to H 2 and the valve corresponding to SiH 4 .
  • Figure 2 is a schematic diagram of a special gas safety control provided by an embodiment of the present invention.
  • the third relay KA03 includes a fourth pair of normally open contacts 31 and 32, which can control the on and off of the NF3 valve by controlling the on and off of the first circuit, and a fifth pair of normally open contacts 33 and 34, which can control the on and off of the second circuit.
  • the on-off of the circuit is used to control the on-off of the H2 valve, including the sixth pair of normally open contacts 35 and 36.
  • the on-off of the third circuit can be controlled to control the on-off of the SiH4 valve.
  • the PLC can output a high level signal to the 0 contact of the first relay KA01.
  • the first pair of normally open contacts 13 and 14 of the first relay KA01 are closed, and the first pair of normally open contacts 13 and 14 of the first relay KA01 are closed.
  • the first pair of normally closed contacts 11 and 12 are disconnected to ensure that the second relay KA02 will not get a high level, then the second relay KA02 is disconnected, and the 0 contact of the third relay KA03 gets a 24V high level signal.
  • the circuit is controlled by the third relay KA03.
  • the fourth pair of normally open contacts 31, 32, the fifth pair of normally open contacts 33, 34 and the sixth pair of normally open contacts 35, 36 of the third relay KA03 are closed, then the H 2 , NF 3 and SiH 4 valves are opened.
  • the signal is turned on and the valve opens.
  • the H 2 , NF 3 and SiH 4 valves are not electrically mutually exclusive.
  • the pressure value of the process chamber is obtained; when the pressure value is greater than the preset pressure threshold, when the second gas corresponding valve and the third gas corresponding valve need to be opened, the first circuit is controlled to be disconnected, Control the second circuit and the third circuit to be connected so that the first gas corresponding valve is closed, the second gas corresponding valve and the third gas corresponding valve are opened; when it is necessary to open the first gas corresponding valve, control the first circuit to be connected, and controlling the disconnection of the second circuit and the third circuit to open the first gas corresponding valve, and close the second gas corresponding valve and the third gas corresponding valve.
  • the valve interlock function can be realized, that is, the valve interlock is added to the circuit design, so that when the process chamber pressure reaches the preset threshold, the first gas corresponding valve and The valve corresponding to the second gas will not be opened at the same time, and the valve corresponding to the first gas and the valve corresponding to the third gas will not be opened at the same time, thus avoiding the risk of software control failure and preventing chemical occurrence between special gases.
  • the reaction generates by-products, causing damage to hardware and injuries to personnel, eliminating potential safety hazards and protecting system and personnel safety.
  • a control circuit provided by an embodiment of the present invention is applied to semiconductor process equipment.
  • the control circuit includes: a first circuit for controlling the on-off of the valve corresponding to the first gas, and a third circuit for controlling the on-off of the valve corresponding to the second gas.
  • the second circuit and the third circuit for controlling the on-off of the third gas corresponding valve also include a first relay, a second relay and a third relay.
  • the first relay When the pressure value is greater than the preset pressure threshold, the first relay is used For controlling the second relay to be turned on and the third relay to be turned off, so that the second relay controls the on/off of the first circuit, the second circuit and the third circuit; when the pressure value is less than or equal to the preset pressure threshold, the third relay One relay is also used to control the second relay to turn off and the third relay to turn on, so that the third relay controls the on/off of the first circuit, the second circuit and the third circuit.
  • the first relay may include a first pair of normally closed contacts and a first pair of normally open contacts.
  • the PLC can output a low-level signal to the first relay.
  • the first relay receives the low-level signal and can control the first pair of normally open contacts to remain disconnected. So that the third relay is disconnected, and the first pair of normally closed contacts can be controlled to remain closed, so that the second relay is connected, and the second relay can control the first circuit, the second circuit and the third circuit in the connected state. The switching of three circuits.
  • KA01 is the first relay
  • KA02 is the second relay
  • KA03 is the third relay
  • the first relay KA01 includes a first pair of normally closed contacts 11 and 12, which are used to control the second relay KA02.
  • the first relay KA01 also includes the first pair of normally open contacts 13 and 14, Used to control the on and off of the third relay KA03.
  • the preset pressure threshold for example, 10Torr
  • the first pair of normally open contacts 13 and 13 of the first relay KA01 14 is open and the first pair of normally closed contacts 11 and 12 are closed, then the third relay KA03 is open and the second relay KA02 is connected.
  • the second relay KA02 controls the first circuit, the second circuit and the third circuit. On and off.
  • the second relay includes a second pair of normally closed contacts, a second pair of normally open contacts and a third pair of normally open contacts; the second pair of normally closed contacts is controlled by the second relay Maintain the closed state, control the first circuit to be connected, and control the second pair of normally open contacts and the third pair of normally open contacts to maintain the disconnected state through the second relay, respectively control the second circuit and the third circuit to disconnect, so as to The first gas corresponding valve is closed, the second gas corresponding valve and the third gas corresponding valve are opened.
  • the second relay may include a second pair of normally closed contacts, a second pair of normally open contacts, and a third pair of normally open contacts.
  • the first relay controls the second relay to turn on and the third relay to turn off.
  • the second relay can maintain the closed state by controlling the second pair of normally closed contacts to control the third relay.
  • One circuit is connected, and the second pair of normally open contacts and the third pair of normally open contacts are controlled to remain disconnected, and the second circuit and the third circuit are respectively controlled to be disconnected, so that the first gas valve is closed and the second gas valve is closed. valve and third gas valve open.
  • the second relay KA02 includes a second pair of normally closed contacts 21 and 22 , the on-off of the NF 3 valve can be controlled by controlling the on-off of the first circuit; the second relay KA02 also includes a second pair of normally open contacts 23, 24, which can control the on-off of the H2 valve by controlling the on-off of the second circuit. On and off; the second relay KA02 also includes a third pair of normally open contacts 25 and 26, which can control the on and off of the SiH 4 valve by controlling the on and off of the third circuit.
  • the second relay KA02 controls the on and off of the first circuit, the second circuit and the third circuit.
  • the NF 3 of the PLC and The switching signal of H 2 and SiH 4 valve opening can output a high level signal
  • the second relay KA02 receives the high level signal and can control the second relay KA02
  • the second pair of normally open contacts 23, 24 and the third pair of normally open contacts 25, 26 are closed, and the second pair of normally closed contacts 21, 22 are disconnected.
  • the circuits controlling the H 2 valve and the SiH 4 valve are connected. Pass, the circuit controlling the NF 3 valve is disconnected, the H 2 valve and SiH 4 valve are allowed to open, and the NF 3 valve is closed.
  • the first pair of normally closed contacts is controlled to open through the first relay
  • the second relay is controlled to open
  • the first pair of normally closed contacts is controlled through the first relay.
  • the first pair of normally open contacts are controlled to be closed
  • the third relay is controlled to be turned on, so that the third relay controls the opening and closing of the first circuit, the second circuit and the third circuit.
  • the PLC can output a high-level signal to the first relay, and the first relay receives the high-level signal and can control the first pair of normally closed
  • the contacts open to disconnect the second relay, and the first pair of normally open contacts are controlled to close to connect the third relay, thereby controlling the third relay to control the conduction of the first circuit, the second circuit and the third circuit. Break.
  • the PLC can output a high-level signal to the first relay KA01.
  • the first relay KA01 receives the high-level signal and can control the first pair of normally closed contacts 11 and 12 to open. , so that the second relay KA02 is turned off, and the first pair of normally open contacts 13 and 14 are controlled to close, so that the third relay KA03 is turned on, and the third relay KA03 controls the first circuit, the second circuit and the third circuit On and off.
  • the third relay controls the closing of the fourth pair of normally open contacts, the fifth pair of normally open contacts and the sixth pair of normally open contacts, and controls the first circuit, the second circuit and the third pair of normally open contacts.
  • the three circuits are connected to open the first gas corresponding valve, the second gas corresponding valve and the third gas corresponding valve.
  • the third relay when the third relay is turned on, the third relay can control the fourth pair of normally open contacts, the fifth pair of normally open contacts, and the sixth pair of normally open contacts to close, so that the first circuit, The second circuit and the third circuit are connected, thereby controlling the NF 3 corresponding valve, the H 2 corresponding valve and the SiH 4 corresponding valve to open.
  • the third relay KA03 includes a fourth pair of normally open contacts 31, 32, which can The on-off of the NF 3 valve can be controlled by controlling the on-off of the first circuit, including the fifth pair of normally open contacts 33, 34, and the on-off of the H2 valve can be controlled by controlling the on-off of the second circuit, including the fifth pair of normally open contacts 33 and 34.
  • Six pairs of normally open contacts 35 and 36 can control the opening and closing of the SiH 4 valve by controlling the opening and closing of the third circuit.
  • the PLC can output a high level signal to the 0 contact of the first relay KA01.
  • the first pair of normally open contacts 13 and 14 of the first relay KA01 are closed, and the first pair of normally open contacts 13 and 14 of the first relay KA01 are closed.
  • the first pair of normally closed contacts 11 and 12 are disconnected to ensure that the second relay KA02 will not get a high level, then the second relay KA02 is disconnected, and the 0 contact of the third relay KA03 gets a 24V high level signal.
  • the circuit is controlled by the third relay KA03.
  • the fourth pair of normally open contacts 31, 32, the fifth pair of normally open contacts 33, 34 and the sixth pair of normally open contacts 35, 36 of the third relay KA03 are closed, then the H 2 , NF 3 and SiH 4 valves are opened.
  • the signal is turned on and the valve opens.
  • the H 2 , NF 3 and SiH 4 valves are not electrically mutually exclusive.
  • the description is relatively simple. For relevant details, please refer to the partial description of the method embodiment.
  • the above-mentioned semiconductor process equipment 301 includes: a process chamber and a control circuit; the above-mentioned control circuit includes a valve for controlling the first gas corresponding valve on and off.
  • the first circuit, the second circuit for controlling the on-off of the valve corresponding to the second gas, and the third circuit for controlling the on-off of the valve corresponding to the third gas, the above-mentioned semiconductor process equipment also include:
  • the controller 3011 is used to obtain the pressure value of the above-mentioned process chamber; when the above-mentioned pressure value is greater than the preset pressure threshold, when it is necessary to open the above-mentioned second gas corresponding valve and the above-mentioned third gas corresponding valve, control the above-mentioned first gas corresponding valve.
  • the circuit is disconnected, and the above-mentioned second circuit and the above-mentioned third circuit are controlled to be connected, so that the above-mentioned first gas corresponding valve is closed, the above-mentioned second gas corresponding valve and the above-mentioned third gas corresponding valve are opened; when it is necessary to open the above-mentioned first gas
  • the above-mentioned first circuit is controlled to be connected, and the above-mentioned second circuit and the above-mentioned third circuit are controlled to be disconnected, so that the above-mentioned first gas corresponding valve is opened, the above-mentioned second gas corresponding valve and the above-mentioned third gas corresponding valve are closed.
  • the above-mentioned controller is also used to control the above-mentioned first circuit, the above-mentioned second circuit and the above-mentioned third circuit to turn on when the pressure value is less than or equal to the preset pressure threshold. , so that the first gas corresponding valve, the second gas corresponding valve and the third gas corresponding valve are opened.
  • the above-mentioned circuit also includes: a first relay, a second relay and a third relay.
  • the above-mentioned controller is also configured to, when the above-mentioned pressure value is greater than the preset pressure threshold, use the above-mentioned
  • the first relay controls the above-mentioned second relay to be on and the above-mentioned third relay to be off, so that the above-mentioned second relay controls the on-off of the above-mentioned first circuit, the above-mentioned second circuit and the above-mentioned third circuit; when the above-mentioned pressure value is less than or equal to
  • the first relay controls the second relay to turn off and the third relay to turn on, so that the third relay controls the first circuit, the second circuit and the third circuit. On and off.
  • the above-mentioned first relay includes a first pair of normally closed contacts and a first pair of normally open contacts; and the above-mentioned controller is used when the above-mentioned pressure value is greater than a preset pressure threshold. , controlling the first pair of normally open contacts to maintain an open state through the first relay, controlling the third relay to open, and controlling the first pair of normally closed contacts to maintain a closed state through the first relay, controlling the third The two relays are turned on, so that the second relay controls the on-off of the first circuit, the second circuit and the third circuit.
  • the above-mentioned second relay includes a second pair of normally closed contacts, a second pair of normally open contacts and a third pair of normally open contacts; the above-mentioned controller is configured to pass the above-mentioned second pair of normally open contacts.
  • the relay controls the opening of the above-mentioned second pair of normally closed contacts, controls the opening of the above-mentioned first circuit, and controls the closing of the above-mentioned second pair of normally open contacts and the above-mentioned third pair of normally open contacts through the above-mentioned second relay, controlling the above-mentioned third pair of normally open contacts to close.
  • the second circuit and the above-mentioned third circuit are connected, so that the above-mentioned first gas corresponding valve is closed, the above-mentioned second gas corresponding valve and the above-mentioned third gas corresponding valve are opened.
  • the above-mentioned controller is used to control the above-mentioned second pair of normally closed contacts to maintain a closed state through the above-mentioned second relay, control the above-mentioned first circuit to be turned on, and through the above-mentioned second relay
  • the above-mentioned second relay controls the above-mentioned second pair of normally open contacts and the above-mentioned third pair of normally open contacts to remain disconnected, and controls the above-mentioned second circuit and the above-mentioned third circuit to disconnect, so that the above-mentioned first gas corresponding valve opens,
  • the above-mentioned second gas corresponding valve and the above-mentioned third gas corresponding valve are closed.
  • the above-mentioned controller is used to control the above-mentioned first pair of normally closed contacts to open through the above-mentioned first relay when the above-mentioned pressure value is less than or equal to the preset pressure threshold, and controls the above-mentioned
  • the second relay is turned off, and the first pair of normally open contacts are controlled to close through the first relay, and the third relay is controlled to be turned on, so that the third relay controls the first circuit, the second circuit and the third circuit. The switching of three circuits.
  • the above-mentioned third relay includes a fourth pair of normally open contacts, a fifth pair of normally open contacts and a sixth pair of normally open contacts; the above-mentioned controller is configured to pass the above-mentioned third pair of normally open contacts.
  • the relay controls the fourth pair of normally open contacts, the above fifth pair of normally open contacts, and the above sixth pair of normally open contacts to close, and controls the above first circuit, the above second circuit, and the above third circuit to connect, so that the above The first gas corresponding valve, the second gas corresponding valve and the third gas corresponding valve are opened.
  • the first gas is NF3
  • the second gas is H2
  • the third gas is SiH4.
  • the description is relatively simple. For relevant details, please refer to the partial description of the method embodiment.
  • FIG 4 is a structural block diagram of a special gas safety control device provided in an embodiment of the present invention.
  • the special gas safety control device is used to control a control circuit in a semiconductor process equipment and includes: at least one Processor 101, memory 102, at least one I/O interface 103.
  • At least one program is stored on the memory 102.
  • the at least one processor 101 implements the steps in any of the methods in the above embodiments; at least one I/O interface 103 is connected Between the processor 101 and the memory 102, it is configured to realize information exchange between the processor and the memory.
  • the processor 101 is a device with data processing capabilities, including but not limited to a central processing unit processor (CPU), etc.
  • the memory 102 is a device with data storage capabilities, including but not limited to random access memory (RAM, more specifically such as SDRAM, DDR, etc.), read-only memory (ROM), power-erasable programmable memory, etc.
  • RAM random access memory
  • ROM read-only memory
  • EEPROM electrically erasable programmable memory
  • I/O interface (read-write interface) 103 is connected between the processor 101 and the memory 102, and can realize information interaction between the processor 101 and the memory 102, including but not limited to data Bus, etc.
  • processor 101 memory 102, and I/O interface 103 are connected to each other and, in turn, to other components of the computing device via bus 104.
  • the processor 101 includes an FPGA.
  • a computer-readable medium stores a computer program, wherein when the program is executed by the processor, the steps in any of the test wafer scheduling methods in the above embodiments are implemented.
  • embodiments of the present disclosure include a computer program product including a computer program carried on a machine-readable medium, the computer program containing program code for performing the method illustrated in the flowchart.
  • the computer program may be downloaded and installed from the network via the communications component, and/or installed from removable media.
  • CPU central processing unit
  • the computer-readable medium shown in the present disclosure may be a computer-readable signal medium or a computer-readable storage medium, or any combination of the above two.
  • the computer-readable storage medium may be, for example, but is not limited to, an electrical, magnetic, optical, electromagnetic, infrared, or semiconductor system, apparatus or device, or any combination thereof. More specific examples of computer readable storage media may include, but are not limited to: an electrical connection having one or more wires, a portable computer disk, a hard drive, random access memory (RAM), read only memory (ROM), removable Programmd read-only memory (EPROM or flash memory), fiber optics, portable compact disk read-only memory (CD-ROM), optical storage device, magnetic storage device, or any suitable combination of the above.
  • computer readable A storage medium may be any tangible medium that contains or stores a program for use by or in connection with an instruction execution system, apparatus, or device.
  • a computer-readable signal medium may include a data signal propagated in baseband or as part of a carrier wave, carrying computer-readable program code therein. Such propagated data signals may take many forms, including but not limited to electromagnetic signals, optical signals, or any suitable combination of the above.
  • a computer-readable signal medium may also be any computer-readable medium other than a computer-readable storage medium that can send, propagate, or transmit a program for use by or in connection with an instruction execution system, apparatus, or device .
  • Program code embodied on a computer-readable medium may be transmitted using any suitable medium, including but not limited to: wireless, wire, optical cable, RF, etc., or any suitable combination of the foregoing.
  • each block in the flowchart or block diagrams may represent a module, segment, or portion of code that contains one or more components that implement the specified logical function(s). executable instructions.
  • the functions noted in the block may occur out of the order noted in the figures. For example, two blocks shown one after another may actually execute substantially in parallel, or they may sometimes execute in the reverse order, depending on the functionality involved.
  • each block of the block diagram and/or flowchart illustration, and combinations of blocks in the block diagram and/or flowchart illustration can be implemented by special purpose hardware-based systems that perform the specified functions or operations. , or can be implemented using a combination of specialized hardware and computer instructions.
  • embodiments of the present invention may be provided as methods, devices, or computer program products. Therefore, embodiments of the present invention may adopt completely hardware embodiments, completely In the form of a software embodiment, or an embodiment combining software and hardware aspects. Furthermore, embodiments of the invention may take the form of a computer program product embodied on one or more computer-usable storage media (including, but not limited to, disk storage, CD-ROM, optical storage, etc.) having computer-usable program code embodied therein.
  • computer-usable storage media including, but not limited to, disk storage, CD-ROM, optical storage, etc.
  • Embodiments of the invention are described with reference to flowcharts and/or block diagrams of methods, terminal devices (systems), and computer program products according to embodiments of the invention. It will be understood that each process and/or block in the flowchart illustrations and/or block diagrams, and combinations of processes and/or blocks in the flowchart illustrations and/or block diagrams, can be implemented by computer program instructions. These computer program instructions may be provided to a processor of a general-purpose computer, special-purpose computer, embedded processor, or other programmable data processing terminal device to produce a machine such that the instructions are executed by the processor of the computer or other programmable data processing terminal device. Means are generated for implementing the functions specified in the process or processes of the flowchart diagrams and/or the block or blocks of the block diagrams.
  • These computer program instructions may also be stored in a computer-readable memory that causes a computer or other programmable data processing terminal equipment to operate in a particular manner, such that the instructions stored in the computer-readable memory produce an article of manufacture including the instruction means, the The instruction means implements the functions specified in a process or processes of the flowchart and/or a block or blocks of the block diagram.
  • These computer program instructions can also be loaded onto a computer or other programmable data processing terminal equipment, so that a series of operating steps are performed on the computer or other programmable terminal equipment to produce computer-implemented processing, thereby causing the computer or other programmable terminal equipment to perform a computer-implemented process.
  • the instructions executed on provide steps for implementing the functions specified in a process or processes of the flow diagrams and/or a block or blocks of the block diagrams.

Abstract

Embodiments of the present invention provide a specialty gas safety control method and apparatus, a control circuit, a semiconductor process device, and a computer readable storage medium. The method comprises: acquiring the pressure value of a chamber; when the pressure value is greater than a preset pressure threshold and when a second gas valve and a third gas valve need to be opened, controlling a first circuit to be disconnected and a second circuit and a third circuit to be connected, so that a first gas valve is closed, and the second gas valve and the third gas valve are opened; and when the first gas valve needs to be opened, controlling the first circuit to be connected and the second circuit and the third circuit to be disconnected, so that the first gas valve is opened, and the second gas valve and the third gas valve are closed. The present solution avoids the risk of software control failure, prevents hardware damage and personnel injury due to the generation of byproducts caused by a chemical reaction between specialty gases, eradicates potential safety hazards, and protects the system and personnel safety.

Description

特种气体安全控制方法、装置、电路和半导体工艺设备Special gas safety control methods, devices, circuits and semiconductor process equipment 技术领域Technical field
本发明涉及半导体技术领域,特别是涉及一种特种气体安全控制方法、装置、控制电路和半导体工艺设备,以及计算机可读存储介质。The invention relates to the field of semiconductor technology, and in particular to a special gas safety control method, device, control circuit and semiconductor process equipment, as well as a computer-readable storage medium.
背景技术Background technique
化学气相沉积(Chemical Vapor Deposition,CVD)技术是一种可以将物质以原子膜形式镀在基底表面的方法。随着微电子和深亚微米芯片技术的发展要求器件和材料的尺寸不断降低,而器件中的高宽比不断增加,CVD在填充方面的优势越来越明显,这项工艺越来越受到半导体行业的青睐。Chemical Vapor Deposition (CVD) technology is a method that can plate substances on the surface of a substrate in the form of an atomic film. With the development of microelectronics and deep submicron chip technology, the size of devices and materials continues to be reduced, and the aspect ratio in devices continues to increase. The advantages of CVD in filling are becoming more and more obvious. This process is increasingly favored by semiconductors. Industry favor.
CVD工艺过程的一个特征是有多种工艺气体进入腔室。当腔室环境就绪,工艺气体同时进入腔室并附着在晶片(wafer)上,在wafer表面发生反应,生成所需要的薄膜。同时需要真空泵不断抽走副产物及剩余反应物。CVD工艺气体中会含有多种特种气体,特种气体是指易燃易爆,有毒,有腐蚀性的气体,如H2、WF6、5%B2H6/95%N2、NF3、SiH4A characteristic of the CVD process is that a variety of process gases enter the chamber. When the chamber environment is ready, the process gas enters the chamber at the same time and adheres to the wafer, reacting on the wafer surface to generate the required film. At the same time, a vacuum pump is required to continuously remove by-products and remaining reactants. CVD process gases will contain a variety of special gases. Special gases refer to flammable, explosive, toxic, and corrosive gases, such as H 2 , WF 6 , 5% B 2 H 6 /95% N 2 , NF 3 , SiH 4 .
现有技术中,由软件程序根据特种气体阀门互锁条件,控制阀门之间的互锁,但是软件有失效风险,存在安全隐患。In the existing technology, a software program controls the interlocking between valves according to the interlocking conditions of special gas valves. However, the software has the risk of failure and poses safety risks.
发明内容Contents of the invention
鉴于上述问题,提出了本发明实施例以便提供一种克服上述问题或者至少部分地解决上述问题的一种特种气体安全控制方法、装置和半导体工艺设备,以及计算机可读存储介质。In view of the above problems, embodiments of the present invention are proposed to provide a special gas safety control method, device, semiconductor process equipment, and computer-readable storage medium that overcome the above problems or at least partially solve the above problems.
为了解决上述问题,本发明实施例公开了一种特种气体安全控制方法,应用于半导体工艺设备,所述半导体工艺设备包括:工艺腔室和控制电路; 所述控制电路包括用于控制第一气体对应阀门通断的第一电路、用于控制第二气体对应阀门通断的第二电路和用于控制第三气体对应阀门通断的第三电路,所述方法包括:In order to solve the above problems, embodiments of the present invention disclose a special gas safety control method, which is applied to semiconductor process equipment. The semiconductor process equipment includes: a process chamber and a control circuit; The control circuit includes a first circuit for controlling the on-off of the valve corresponding to the first gas, a second circuit for controlling the on-off of the valve corresponding to the second gas, and a third circuit for controlling the on-off of the valve corresponding to the third gas, The methods include:
获取所述工艺腔室的压力值;Obtain the pressure value of the process chamber;
在所述压力值大于预设压力阈值的情况下,当需要打开所述第二气体对应阀门和所述第三气体对应阀门时,控制所述第一电路断开,以及控制所述第二电路和所述第三电路接通,以使所述第一气体对应阀门关闭、所述第二气体对应阀门和所述第三气体对应阀门打开;When the pressure value is greater than the preset pressure threshold, when the second gas corresponding valve and the third gas corresponding valve need to be opened, the first circuit is controlled to be disconnected, and the second circuit is controlled to be opened. Connect with the third circuit to close the first gas corresponding valve and open the second gas corresponding valve and the third gas corresponding valve;
当需要打开所述第一气体对应阀门时,控制所述第一电路接通,以及控制所述第二电路和所述第三电路断开,以使所述第一气体对应阀门打开、所述第二气体对应阀门和所述第三气体对应阀门关闭。When it is necessary to open the first gas corresponding valve, the first circuit is controlled to be turned on, and the second circuit and the third circuit are controlled to be turned off, so that the first gas corresponding valve is opened and the The second gas corresponding valve and the third gas corresponding valve are closed.
可选地,还包括:Optionally, also includes:
在所述压力值小于或等于所述预设压力阈值的情况下,控制所述第一电路、所述第二电路和所述第三电路接通,以使所述第一气体对应阀门、所述第二气体对应阀门和所述第三气体对应阀门打开。When the pressure value is less than or equal to the preset pressure threshold, the first circuit, the second circuit and the third circuit are controlled to be turned on so that the first gas corresponds to the valve, the The second gas corresponding valve and the third gas corresponding valve are opened.
可选地,所述控制电路还包括:第一继电器、第二继电器和第三继电器,所述方法还包括:Optionally, the control circuit further includes: a first relay, a second relay and a third relay, and the method further includes:
在所述压力值大于所述预设压力阈值的情况下,通过所述第一继电器控制所述第二继电器接通以及所述第三继电器断开,以使所述第二继电器控制所述第一电路、所述第二电路和所述第三电路的通断;When the pressure value is greater than the preset pressure threshold, the second relay is controlled to be turned on and the third relay to be turned off through the first relay, so that the second relay controls the third relay. On and off of a circuit, the second circuit and the third circuit;
在所述压力值小于或等于所述预设压力阈值的情况下,通过所述第一继电器控制所述第二继电器断开以及所述第三继电器接通,以使所述第三继电器控制所述第一电路、所述第二电路和所述第三电路的通断。When the pressure value is less than or equal to the preset pressure threshold, the first relay is used to control the second relay to turn off and the third relay to turn on, so that the third relay controls all The first circuit, the second circuit and the third circuit are switched on and off.
可选地,所述第一继电器包括第一对常闭触点和第一对常开触点;所述在所述压力值大于所述预设压力阈值的情况下,通过所述第一继电器控制所 述第二继电器接通以及所述第三继电器断开,以使所述第二继电器控制所述第一电路、所述第二电路和所述第三电路的通断,包括:Optionally, the first relay includes a first pair of normally closed contacts and a first pair of normally open contacts; when the pressure value is greater than the preset pressure threshold, the first relay control station The second relay is turned on and the third relay is turned off, so that the second relay controls the on/off of the first circuit, the second circuit and the third circuit, including:
在所述压力值大于所述预设压力阈值的情况下,通过所述第一继电器控制所述第一对常开触点保持断开状态,以控制所述第三继电器断开,以及通过所述第一继电器控制所述第一对常闭触点保持闭合状态,以控制所述第二继电器接通,以使所述第二继电器控制所述第一电路、所述第二电路和所述第三电路的通断。When the pressure value is greater than the preset pressure threshold, the first pair of normally open contacts is controlled by the first relay to remain in an open state, so as to control the third relay to open, and through the The first relay controls the first pair of normally closed contacts to remain in a closed state to control the second relay to turn on, so that the second relay controls the first circuit, the second circuit and the The third circuit is switched on and off.
可选地,所述第二继电器包括第二对常闭触点、第二对常开触点和第三对常开触点;所述在所述压力值大于预设压力阈值的情况下,当需要打开所述第二气体对应阀门和所述第三气体对应阀门时,控制所述第一电路断开,以及控制所述第二电路和所述第三电路接通,以使所述第一气体对应阀门关闭、所述第二气体对应阀门和所述第三气体对应阀门打开,包括:Optionally, the second relay includes a second pair of normally closed contacts, a second pair of normally open contacts and a third pair of normally open contacts; in the case where the pressure value is greater than the preset pressure threshold, When it is necessary to open the second gas corresponding valve and the third gas corresponding valve, the first circuit is controlled to be disconnected, and the second circuit and the third circuit are controlled to be connected, so that the third circuit is connected. A gas corresponding valve is closed, the second gas corresponding valve and the third gas corresponding valve are opened, including:
通过所述第二继电器控制所述第二对常闭触点断开,控制所述第一电路断开,以及通过所述第二继电器控制所述第二对常开触点和所述第三对常开触点闭合,分别控制所述第二电路和所述第三电路接通,以使所述第一气体对应阀门关闭、所述第二气体对应阀门和所述第三气体对应阀门打开。The second pair of normally closed contacts is controlled to open through the second relay, the first circuit is controlled to open, and the second pair of normally open contacts and the third pair of normally open contacts are controlled through the second relay. When the normally open contact is closed, the second circuit and the third circuit are respectively controlled to be connected, so that the first gas corresponding valve is closed, the second gas corresponding valve and the third gas corresponding valve are opened. .
可选地,所述当需要打开所述第一气体对应阀门时,控制所述第一电路接通,以及控制所述第二电路和所述第三电路断开,以使所述第一气体对应阀门打开、所述第二气体对应阀门和所述第三气体对应阀门关闭,包括:Optionally, when the first gas corresponding valve needs to be opened, the first circuit is controlled to be turned on, and the second circuit and the third circuit are controlled to be turned off, so that the first gas The corresponding valve is opened, the second gas corresponding valve and the third gas corresponding valve are closed, including:
通过所述第二继电器控制所述第二对常闭触点保持闭合状态,控制所述第一电路接通,以及通过所述第二继电器控制所述第二对常开触点和所述第三对常开触点保持断开状态,分别控制所述第二电路和所述第三电路断开,以使所述第一气体对应阀门打开、所述第二气体对应阀门和所述第三气体对应阀门关闭。The second pair of normally closed contacts is controlled to remain closed through the second relay, the first circuit is controlled to be turned on, and the second pair of normally open contacts and the third pair of normally open contacts are controlled through the second relay. Three pairs of normally open contacts remain in a disconnected state and control the disconnection of the second circuit and the third circuit respectively, so that the first gas corresponding valve opens, the second gas corresponding valve and the third gas corresponding valve open. The gas corresponding valve is closed.
可选地,所述在所述压力值小于或等于所述预设压力阈值的情况下,通 过所述第一继电器控制所述第二继电器断开以及所述第三继电器接通,以使所述第三继电器控制所述第一电路、所述第二电路和所述第三电路的通断,包括:Optionally, in the case where the pressure value is less than or equal to the preset pressure threshold, the The second relay is controlled to be turned off and the third relay is turned on through the first relay, so that the third relay controls the passage of the first circuit, the second circuit and the third circuit. Breaks include:
在所述压力值小于或等于所述预设压力阈值的情况下,通过所述第一继电器控制所述第一对常闭触点打开,控制所述第二继电器断开,以及通过所述第一继电器控制所述第一对常开触点闭合,控制所述第三继电器接通,以使所述第三继电器控制所述第一电路、所述第二电路和所述第三电路的通断。When the pressure value is less than or equal to the preset pressure threshold, the first pair of normally closed contacts is controlled to open through the first relay, the second relay is controlled to open, and the first pair of normally closed contacts is controlled to open through the third relay. A relay controls the first pair of normally open contacts to close and controls the third relay to turn on, so that the third relay controls the conduction of the first circuit, the second circuit and the third circuit. Break.
可选地,所述第三继电器包括第四对常开触点、第五对常开触点和第六对常开触点;所述在所述压力值小于或等于所述预设压力阈值的情况下,控制所述第一电路、所述第二电路和所述第三电路接通,以使所述第一气体对应阀门、所述第二气体对应阀门和所述第三气体对应阀门打开,包括:Optionally, the third relay includes a fourth pair of normally open contacts, a fifth pair of normally open contacts and a sixth pair of normally open contacts; when the pressure value is less than or equal to the preset pressure threshold In the case of , the first circuit, the second circuit and the third circuit are controlled to be connected so that the first gas corresponding valve, the second gas corresponding valve and the third gas corresponding valve Open, including:
通过所述第三继电器控制所述第四对常开触点、所述第五对常开触点和所述第六对常开触点闭合,控制所述第一电路、所述第二电路和所述第三电路接通,以使所述第一气体对应阀门、所述第二气体对应阀门和第三气体对应阀门打开。The third relay controls the fourth pair of normally open contacts, the fifth pair of normally open contacts and the sixth pair of normally open contacts to close, and controls the first circuit and the second circuit and the third circuit to open the first gas corresponding valve, the second gas corresponding valve and the third gas corresponding valve.
可选地,所述第一气体为NF3,所述第二气体为H2,所述第三气体为SiH4Optionally, the first gas is NF 3 , the second gas is H 2 , and the third gas is SiH 4 .
本发明实施例还公开了一种控制电路,应用于半导体工艺设备,所述控制电路包括:包括用于控制第一气体对应阀门通断的第一电路、用于控制第二气体对应阀门通断的第二电路和用于控制第三气体对应阀门通断的第三电路,An embodiment of the present invention also discloses a control circuit, which is applied to semiconductor process equipment. The control circuit includes: a first circuit for controlling the on-off of the valve corresponding to the first gas, and a first circuit for controlling the on-off of the valve corresponding to the second gas. The second circuit and the third circuit used to control the on-off of the corresponding valve of the third gas,
还包括第一继电器、第二继电器和第三继电器,在所述压力值大于所述预设压力阈值的情况下,所述第一继电器用于控制所述第二继电器接通以及所述第三继电器断开,以使所述第二继电器控制所述第一电路、所述第二电路和所述第三电路的通断;在所述压力值小于或等于所述预设压力阈值的情 况下,所述第一继电器还用于控制所述第二继电器断开以及所述第三继电器接通,以使所述第三继电器控制所述第一电路、所述第二电路和所述第三电路的通断。It also includes a first relay, a second relay and a third relay. When the pressure value is greater than the preset pressure threshold, the first relay is used to control the second relay to turn on and the third relay to turn on. The relay is turned off, so that the second relay controls the on-off of the first circuit, the second circuit and the third circuit; when the pressure value is less than or equal to the preset pressure threshold, In this case, the first relay is also used to control the second relay to turn off and the third relay to turn on, so that the third relay controls the first circuit, the second circuit and the The third circuit is switched on and off.
可选地,所述第一继电器包括第一对常闭触点和第一对常开触点;在所述压力值大于预设压力阈值的情况下,所述第一继电器用于控制所述第一对常开触点保持断开状态,控制所述第三继电器断开,以及通过所述第一继电器控制所述第一对常闭触点保持闭合状态,控制所述第二继电器接通,以使所述第二继电器控制所述第一电路、所述第二电路和所述第三电路的通断;和/或,Optionally, the first relay includes a first pair of normally closed contacts and a first pair of normally open contacts; when the pressure value is greater than a preset pressure threshold, the first relay is used to control the The first pair of normally open contacts remains in the open state, controlling the third relay to open, and the first pair of normally closed contacts is controlled to remain in the closed state through the first relay, and the second relay is controlled to open , so that the second relay controls the on and off of the first circuit, the second circuit and the third circuit; and/or,
所述第二继电器包括第二对常闭触点、第二对常开触点和第三对常开触点;所述第二继电器用于控制所述第二对常闭触点断开,以控制所述第一电路断开,所述第二继电器还用于控制所述第二对常开触点和所述第三对常开触点闭合,以分别控制所述第二电路和所述第三电路接通,以使所述第一气体对应阀门关闭、所述第二气体对应阀门和所述第三气体对应阀门打开;;和/或,The second relay includes a second pair of normally closed contacts, a second pair of normally open contacts and a third pair of normally open contacts; the second relay is used to control the disconnection of the second pair of normally closed contacts, To control the opening of the first circuit, the second relay is also used to control the closing of the second pair of normally open contacts and the third pair of normally open contacts to respectively control the second circuit and the The third circuit is connected so that the first gas corresponding valve is closed, the second gas corresponding valve and the third gas corresponding valve are opened;; and/or,
所述第三继电器包括第四对常开触点、第五对常开触点和第六对常开触点;所述第三继电器用于控制所述第四对常开触点、所述第五对常开触点和所述第六对常开触点闭合,以控制所述第一电路、所述第二电路和所述第三电路接通,以使所述第一气体对应阀门、所述第二气体对应阀门和第三气体对应阀门打开。The third relay includes a fourth pair of normally open contacts, a fifth pair of normally open contacts and a sixth pair of normally open contacts; the third relay is used to control the fourth pair of normally open contacts, the The fifth pair of normally open contacts and the sixth pair of normally open contacts are closed to control the first circuit, the second circuit and the third circuit to be connected so that the first gas corresponding valve , the second gas corresponding valve and the third gas corresponding valve are opened.
本发明实施例还公开了一种半导体工艺设备,所述半导体工艺设备包括:工艺腔室和控制电路;所述控制电路包括用于控制第一气体对应阀门通断的第一电路、用于控制第二气体对应阀门通断的第二电路和用于控制第三气体对应阀门通断的第三电路,所述半导体工艺设备还包括:An embodiment of the present invention also discloses a semiconductor process equipment. The semiconductor process equipment includes: a process chamber and a control circuit; the control circuit includes a first circuit for controlling the on/off of the valve corresponding to the first gas; A second circuit for turning on and off the valve corresponding to the second gas and a third circuit for controlling the turning on and off of the valve corresponding to the third gas. The semiconductor process equipment also includes:
控制器,用于获取所述工艺腔室的压力值;在所述压力值大于预设压力 阈值的情况下,当需要打开所述第二气体对应阀门和所述第三气体对应阀门时,控制所述第一电路断开,以及控制所述第二电路和所述第三电路接通,以使所述第一气体对应阀门关闭、所述第二气体对应阀门和所述第三气体对应阀门打开;当需要打开所述第一气体对应阀门时,控制所述第一电路接通,以及控制所述第二电路和所述第三电路断开,以使所述第一气体对应阀门打开、所述第二气体对应阀门和所述第三气体对应阀门关闭。Controller, used to obtain the pressure value of the process chamber; when the pressure value is greater than the preset pressure In the case of a threshold value, when the second gas corresponding valve and the third gas corresponding valve need to be opened, the first circuit is controlled to be disconnected, and the second circuit and the third circuit are controlled to be connected, So that the first gas corresponding valve is closed, the second gas corresponding valve and the third gas corresponding valve are opened; when the first gas corresponding valve needs to be opened, the first circuit is controlled to be turned on, and The second circuit and the third circuit are controlled to be disconnected, so that the first gas corresponding valve is opened, and the second gas corresponding valve and the third gas corresponding valve are closed.
可选地,所述控制器,还用于在所述压力值小于或等于所述预设压力阈值的情况下,控制所述第一电路、所述第二电路和所述第三电路接通,以使所述第一气体对应阀门、所述第二气体对应阀门和所述第三气体对应阀门打开。Optionally, the controller is also configured to control the first circuit, the second circuit and the third circuit to turn on when the pressure value is less than or equal to the preset pressure threshold. , so that the first gas corresponding valve, the second gas corresponding valve and the third gas corresponding valve are opened.
可选地,所述控制电路还包括:第一继电器、第二继电器和第三继电器,所述控制器,还用于在所述压力值大于所述预设压力阈值的情况下,通过所述第一继电器控制所述第二继电器接通以及所述第三继电器断开,以使所述第二继电器控制所述第一电路、所述第二电路和所述第三电路的通断;在所述压力值小于或等于所述预设压力阈值的情况下,通过所述第一继电器控制所述第二继电器断开以及所述第三继电器接通,以使所述第三继电器控制所述第一电路、所述第二电路和所述第三电路的通断。Optionally, the control circuit further includes: a first relay, a second relay and a third relay, and the controller is further configured to, when the pressure value is greater than the preset pressure threshold, use the The first relay controls the second relay to be turned on and the third relay to be turned off, so that the second relay controls the on/off of the first circuit, the second circuit and the third circuit; in When the pressure value is less than or equal to the preset pressure threshold, the first relay controls the second relay to turn off and the third relay to turn on, so that the third relay controls the The first circuit, the second circuit and the third circuit are connected and disconnected.
可选地,所述第一继电器包括第一对常闭触点和第一对常开触点;所述控制器,用于在所述压力值大于预设压力阈值的情况下,通过所述第一继电器控制所述第一对常开触点保持断开状态,控制所述第三继电器断开,以及通过所述第一继电器控制所述第一对常闭触点保持闭合状态,控制所述第二继电器接通,以使所述第二继电器控制所述第一电路、所述第二电路和所述第三电路的通断。Optionally, the first relay includes a first pair of normally closed contacts and a first pair of normally open contacts; and the controller is configured to, when the pressure value is greater than a preset pressure threshold, use the The first relay controls the first pair of normally open contacts to maintain an open state, controls the third relay to open, and controls the first pair of normally closed contacts to maintain a closed state through the first relay, controlling all The second relay is turned on, so that the second relay controls the on/off of the first circuit, the second circuit and the third circuit.
可选地,所述第二继电器包括第二对常闭触点、第二对常开触点和第三对常开触点;所述控制器,用于通过所述第二继电器控制所述第二对常闭触 点断开,控制所述第一电路断开,以及通过所述第二继电器控制所述第二对常开触点和所述第三对常开触点闭合,分别控制所述第二电路和所述第三电路接通,以使所述第一气体对应阀门关闭、所述第二气体对应阀门和所述第三气体对应阀门打开。Optionally, the second relay includes a second pair of normally closed contacts, a second pair of normally open contacts and a third pair of normally open contacts; the controller is configured to control the The second pair of normally closed contacts point is disconnected, the first circuit is controlled to be disconnected, and the second pair of normally open contacts and the third pair of normally open contacts are controlled to be closed through the second relay, respectively controlling the second circuit and The third circuit is turned on, so that the first gas corresponding valve is closed, the second gas corresponding valve and the third gas corresponding valve are opened.
可选地,所述控制器,用于通过所述第二继电器控制所述第二对常闭触点保持闭合状态,控制所述第一电路接通,以及通过所述第二继电器控制所述第二对常开触点和所述第三对常开触点保持断开状态,分别控制所述第二电路和所述第三电路断开,以使所述第一气体对应阀门打开、所述第二气体对应阀门和所述第三气体对应阀门关闭。Optionally, the controller is configured to control the second pair of normally closed contacts to maintain a closed state through the second relay, control the first circuit to be turned on, and control the second pair of normally closed contacts through the second relay. The second pair of normally open contacts and the third pair of normally open contacts remain disconnected, and control the disconnection of the second circuit and the third circuit respectively, so that the first gas corresponding valve opens, and the The second gas corresponding valve and the third gas corresponding valve are closed.
可选地,所述控制器,用于在所述压力值小于或等于所述预设压力阈值的情况下,通过所述第一继电器控制所述第一对常闭触点打开,控制所述第二继电器断开,以及通过所述第一继电器控制所述第一对常开触点闭合,控制所述第三继电器接通,以使所述第三继电器控制所述第一电路、所述第二电路和所述第三电路的通断。Optionally, the controller is configured to control the first pair of normally closed contacts to open through the first relay when the pressure value is less than or equal to the preset pressure threshold, and control the The second relay is turned off, and the first pair of normally open contacts are controlled to be closed by the first relay, and the third relay is controlled to be turned on, so that the third relay controls the first circuit, the The second circuit and the third circuit are connected and disconnected.
可选地,所述第三继电器包括第四对常开触点、第五对常开触点和第六对常开触点;所述控制器,用于通过所述第三继电器控制所述第四对常开触点、所述第五对常开触点和所述第六对常开触点闭合,控制所述第一电路、所述第二电路和所述第三电路接通,以使所述第一气体对应阀门、所述第二气体对应阀门和第三气体对应阀门打开。Optionally, the third relay includes a fourth pair of normally open contacts, a fifth pair of normally open contacts, and a sixth pair of normally open contacts; and the controller is configured to control the third relay through the third relay. The fourth pair of normally open contacts, the fifth pair of normally open contacts and the sixth pair of normally open contacts are closed to control the connection of the first circuit, the second circuit and the third circuit, So that the first gas corresponding valve, the second gas corresponding valve and the third gas corresponding valve are opened.
可选地,所述第一气体为NF3,所述第二气体为H2,所述第三气体为SiH4Optionally, the first gas is NF 3 , the second gas is H 2 , and the third gas is SiH 4 .
本发明实施例还公开了一种特种气体安全控制装置,用于对半导体工艺设备中的控制电路进行控制,所述特种气体安全控制装置包括至少一个处理器和至少一个存储器,所述存储器中存储有至少一个程序;An embodiment of the present invention also discloses a special gas safety control device for controlling a control circuit in semiconductor process equipment. The special gas safety control device includes at least one processor and at least one memory, and the memory stores Have at least one program;
当所述至少一个程序被所述至少一个处理器执行时,使得所述至少一个 处理器实现本发明实施例公开的上述方法。When the at least one program is executed by the at least one processor, the at least one The processor implements the above method disclosed in the embodiment of the present invention.
本发明实施例还公开了一种计算机可读存储介质,用于半导体加工设备,其上存储有计算机程序,所述程序被处理器执行时实现本发明实施例公开的上述方法。Embodiments of the present invention also disclose a computer-readable storage medium for use in semiconductor processing equipment, on which a computer program is stored. When the program is executed by a processor, the above method disclosed in the embodiment of the present invention is implemented.
本发明实施例包括以下优点:Embodiments of the present invention include the following advantages:
在本发明实施例中,获取工艺腔室的压力值;在压力值大于预设压力阈值的情况下,当需要打开第二气体对应阀门和第三气体对应阀门时,控制第一电路断开,控制第二电路和第三电路接通,以使第一气体对应阀门关闭、第二气体对应阀门和第三气体对应阀门打开;当需要打开第一气体对应阀门时,控制第一电路接通,以及控制第二电路和第三电路断开,以使第一气体对应阀门打开、第二气体对应阀门和第三气体对应阀门关闭。通过对上述第一电路、第二电路和第三电路的控制,可以实现阀门互锁功能,即将阀门互锁加入电路设计中,使工艺腔室压力达到预设阈值时,第一气体对应阀门与第二气体对应阀门不会同时开启,第一气体对应阀门与第三气体对应阀门不会同时开启,从而避免了软件控制失效的风险,防止特种气体之间发生化学反应生成副产物,造成硬件的损坏和人员的伤害,杜绝安全隐患,保护系统和人员安全。In the embodiment of the present invention, the pressure value of the process chamber is obtained; when the pressure value is greater than the preset pressure threshold, when the second gas corresponding valve and the third gas corresponding valve need to be opened, the first circuit is controlled to be disconnected, Control the second circuit and the third circuit to be connected so that the first gas corresponding valve is closed, the second gas corresponding valve and the third gas corresponding valve are opened; when it is necessary to open the first gas corresponding valve, control the first circuit to be connected, and controlling the disconnection of the second circuit and the third circuit to open the first gas corresponding valve, and close the second gas corresponding valve and the third gas corresponding valve. Through the control of the above-mentioned first circuit, second circuit and third circuit, the valve interlock function can be realized, that is, the valve interlock is added to the circuit design, so that when the process chamber pressure reaches the preset threshold, the first gas corresponding valve and The valve corresponding to the second gas will not be opened at the same time, and the valve corresponding to the first gas and the valve corresponding to the third gas will not be opened at the same time, thereby avoiding the risk of software control failure and preventing chemical reactions between special gases from generating by-products, causing hardware failure. Damage and personal injury, eliminate safety hazards, and protect system and personnel safety.
附图说明Description of drawings
图1是本发明实施例提供的一种特种气体安全控制方法的步骤流程图;Figure 1 is a step flow chart of a special gas safety control method provided by an embodiment of the present invention;
图2是本发明实施例提供的一种特种气体安全控制原理图;Figure 2 is a schematic diagram of a special gas safety control provided by an embodiment of the present invention;
图3是本发明实施例提供的一种半导体工艺设备的结构框图;Figure 3 is a structural block diagram of a semiconductor process equipment provided by an embodiment of the present invention;
图4为本发明实施例中提供的特种气体安全控制装置的一种结构框图。Figure 4 is a structural block diagram of the special gas safety control device provided in the embodiment of the present invention.
具体实施方式Detailed ways
为使本发明的上述目的、特征和优点能够更加明显易懂,下面结合附图 和具体实施方式对本发明作进一步详细的说明。In order to make the above objects, features and advantages of the present invention more apparent and understandable, the following is provided in conjunction with the accompanying drawings. and specific embodiments to further describe the present invention in detail.
本发明实施例以钨金属化学气相沉积工艺(CVD W工艺)为例,CVD W工艺主要是用于沉积28-14nm技术代的W金属物薄膜沉积。CVD W设备用到的工艺气体中特种气体可以包括:H2、WF6、5%B2H6/95%N2、NF3、SiH4。各气体MSDS(Material Safety Data Sheet,化学品安全说明)如下:The embodiment of the present invention takes the tungsten metal chemical vapor deposition process (CVD W process) as an example. The CVD W process is mainly used to deposit W metal thin films of the 28-14nm technology generation. Special gases in the process gases used by CVD W equipment can include: H 2 , WF 6 , 5% B 2 H 6 /95% N 2 , NF 3 and SiH 4 . The MSDS (Material Safety Data Sheet) of each gas is as follows:
1.H21.H 2 :
危害概述:氢气存储在高压气瓶内,是一种无色、无嗅、易燃的压缩气体。当空气中氢含量>4%时,随时都可能发生火灾或爆炸。Hazard overview: Hydrogen is stored in high-pressure cylinders and is a colorless, odorless, flammable compressed gas. When the hydrogen content in the air is >4%, a fire or explosion may occur at any time.
分子量:2.016。Molecular weight: 2.016.
沸点:(1个大气压)-423.0F(-252.8C)。Boiling point: (1 atmosphere) -423.0F (-252.8C).
化学稳定性:稳定的。Chemical stability: stable.
不兼容性:氧化剂。Incompatibilities: Oxidizing agents.
2.B2H62.B 2 H 6 :
危害概述:无色、剧毒、极易燃与氩、氦、氢或氮混合出售的气体,该气体有令人作呕的甜味。吸入或通过皮肤吸收会造成死亡。Hazard Overview: Colorless, highly toxic, extremely flammable gas sold mixed with argon, helium, hydrogen or nitrogen that has a sickly sweet smell. Causes death if inhaled or absorbed through skin.
分子量:27.67。Molecular weight: 27.67.
沸点:(1个大气压)-135.1F(-92.8C)。Boiling point: (1 atmosphere)-135.1F (-92.8C).
化学稳定性:不稳定。Chemical stability: unstable.
不兼容性:氧化剂、铝、锂、卤代物和金属氧化物。Incompatibilities: Oxidizing agents, aluminum, lithium, halides and metal oxides.
3.WF63.WF 6 :
危害概述:有毒,有腐蚀性不可燃的液化气体,接触潮气后水解生成腐蚀性的氢氟酸。如果吸入或接触皮肤会造成严重的化学灼伤。Hazard overview: Toxic, corrosive, non-flammable liquefied gas, which hydrolyzes into corrosive hydrofluoric acid when exposed to moisture. Causes severe chemical burns if inhaled or in contact with skin.
分子量:297.8。Molecular weight: 297.8.
沸点:(1个大气压)62.7F(17.2C)。Boiling point: (1 atmosphere) 62.7F (17.2C).
化学稳定性:稳定。 Chemical stability: stable.
反应性:水解产生氢氟酸及氟氧化钨。Reactivity: Hydrolysis produces hydrofluoric acid and tungsten oxyfluoride.
4.NF34.NF 3 :
危害概述:有毒、不可燃的压缩气体。它是一种氧化剂,会引起或促进金属和非金属物质的燃烧。Hazard Summary: Toxic, non-flammable compressed gas. It is an oxidizing agent that causes or promotes the burning of metallic and non-metallic substances.
分子量:71.0。Molecular weight: 71.0.
沸点:(1个大气压)-200.3F(-129.1C)。Boiling point: (1 atmosphere) -200.3F (-129.1C).
化学稳定性:稳定。Chemical stability: stable.
不兼容性:油、油脂、碳氢化合物。Incompatibilities: Oils, greases, hydrocarbons.
5.SiH45.SiH 4 :
危害概述:硅烷是一种无色、与空气反应并会引起窒息的气体。该气体通常与空气接触会引起燃烧并放出很浓的白色的无定型二氧化硅烟雾。Hazard Summary: Silane is a colorless, air-reactive gas that can cause asphyxiation. This gas usually burns when in contact with air and emits thick white amorphous silica fumes.
分子量:32.12。Molecular weight: 32.12.
沸点:(1个大气压)-169.0F(-111.7C)。Boiling point: (1 atmosphere)-169.0F (-111.7C).
化学稳定性:自燃,暴露在空气中会自燃。Chemical Stability: Spontaneous ignition, will ignite spontaneously when exposed to air.
不兼容性:空气、其他氧化剂和潮气。Incompatibilities: Air, other oxidizing agents and moisture.
可见在CVD W机台中,对气体安全的设计是重要部分。It can be seen that in CVD W machines, the design of gas safety is an important part.
在CVD W机台所用的特殊气体中,H2及SiH4具有还原性,NF3是氧化剂,NF3的化学键键能比较弱,不够稳定,在一定条件下,NF3可以与H2发生化学反应,化学方程式为:Among the special gases used in CVD W machines, H 2 and SiH 4 are reducing, and NF 3 is an oxidant. The chemical bond energy of NF 3 is relatively weak and not stable enough. Under certain conditions, NF 3 can chemically react with H 2 reaction, the chemical equation is:
NF3+3H2=NH3+6HFNF 3 +3H 2 =NH 3 +6HF
NF3可以与SiH4发生化学反应,化学方程式为:NF 3 can react chemically with SiH 4 , and the chemical equation is:
8NF3+3SiH4=4N2+3SiF4+12HF8NF 3 +3SiH 4 =4N 2 +3SiF 4 +12HF
反应生成物SiF4、NH3会对腔室和管路造成污染,而且,反应物之一HF有毒性和腐蚀性,会造成硬件的损坏和安全的隐患。由于气体的浓度与空间压力成正比,当腔室压力小于一定值(如10Torr)时,气体浓度低,且气体分子不活跃,不易发生化学反应,不需做电气互锁。 The reaction products SiF 4 and NH 3 will cause pollution to the chamber and pipelines. Moreover, one of the reactants, HF, is toxic and corrosive, which will cause hardware damage and safety hazards. Since the concentration of gas is proportional to the space pressure, when the chamber pressure is less than a certain value (such as 10Torr), the gas concentration is low and the gas molecules are inactive, making it difficult for chemical reactions to occur, and electrical interlocking is not required.
当工艺腔室压力达到一定值(如大于10Torr)时,必须防止上述化学反应的发生。防止NF3对应阀门与H2对应阀门同时打开,防止NF3对应阀门与SiH4对应阀门同时打开。When the process chamber pressure reaches a certain value (such as greater than 10Torr), the above chemical reaction must be prevented from occurring. Prevent the NF 3 corresponding valve and the H 2 corresponding valve from opening at the same time, and prevent the NF 3 corresponding valve and the SiH 4 corresponding valve from opening at the same time.
现有技术中,根据预设互锁条件,通过软件控制特气阀门的开关,例如,当腔室上盖关闭、气柜与环境压力差大于报警值、腔室气柜门关闭等条件中有一个或多个不满足时,不允许特气阀打开,可以避免特种气体向空气中泄露;当检测到冷却液漏液报警、腔室过温传感器报警、烟雾传感器报警等报警中有一个或多个发生时,关闭特气阀门,可以在异常情况发生及时禁止特气流通,防止更严重危害发生。In the existing technology, the switch of the special gas valve is controlled through software according to the preset interlock conditions. For example, when the chamber upper cover is closed, the pressure difference between the gas cabinet and the environment is greater than the alarm value, the chamber gas cabinet door is closed, etc. When one or more of them are not satisfied, the special gas valve is not allowed to open, which can prevent special gases from leaking into the air; when one or more of the coolant leakage alarms, chamber overtemperature sensor alarms, smoke sensor alarms, etc. are detected, When an abnormality occurs, closing the special gas valve can promptly prohibit the flow of special gas when an abnormal situation occurs to prevent more serious hazards.
虽然,目前设计中由软件程序做了阀门之间的互锁,但是软件有失效风险,需要将此功能增加在电气设计中。Although the interlocking between valves is implemented by a software program in the current design, there is a risk of software failure, and this function needs to be added to the electrical design.
本发明实施例的核心构思之一在于,提供一种新的特种气体阀门控制方式,通过电路控制特种气体阀门的开关,使工艺腔室压力大于预设压力阈值时,第一气体对应阀门与第二气体对应阀门不会同时开启,第一气体对应阀门与第三气体对应阀门不会同时开启,从而避免了软件控制失效的风险,防止特种气体之间发生化学反应生成副产物,造成硬件的损坏和人员的伤害,杜绝安全隐患,保护系统和人员安全。One of the core ideas of the embodiments of the present invention is to provide a new special gas valve control method, which controls the opening and closing of the special gas valve through a circuit, so that when the process chamber pressure is greater than the preset pressure threshold, the first gas corresponding valve and the third gas valve are connected to each other. The valves corresponding to the two gases will not be opened at the same time, and the valves corresponding to the first gas and the third gas will not be opened at the same time, thereby avoiding the risk of software control failure and preventing chemical reactions between special gases from generating by-products and causing damage to the hardware. and personnel injuries, eliminate safety hazards, and protect system and personnel safety.
参照图1,示出了本发明实施例提供的一种特种气体安全控制方法的步骤流程图,应用于半导体工艺设备,该半导体工艺设备包括:工艺腔室和控制电路;该控制电路包括用于控制第一气体对应阀门通断的第一电路、用于控制第二气体对应阀门通断的第二电路和用于控制第三气体对应阀门通断的第三电路,特种气体安全控制方法具体可以包括如下步骤:Referring to Figure 1, there is shown a step flow chart of a special gas safety control method provided by an embodiment of the present invention, which is applied to semiconductor process equipment. The semiconductor process equipment includes: a process chamber and a control circuit; the control circuit includes: A first circuit for controlling the on-off of the valve corresponding to the first gas, a second circuit for controlling on-off of the valve corresponding to the second gas, and a third circuit for controlling the on-off of the valve corresponding to the third gas. The special gas safety control method can be Includes the following steps:
步骤101,获取工艺腔室的压力值;Step 101, obtain the pressure value of the process chamber;
示例性地,在本发明实施例中,控制电路中还可以包括控制器(PLC,Programm Logic Controller),用于获取工艺腔室的压力值信号,以及向控制 电路输出电平信号。Exemplarily, in the embodiment of the present invention, the control circuit may also include a controller (PLC, Programm Logic Controller) for acquiring the pressure value signal of the process chamber and providing the control signal to the control circuit. The circuit outputs a level signal.
在本发明的一种实施例中,控制电路还包括:第一继电器、第二继电器和第三继电器,特种气体安全控制方法还包括:获取工艺腔室的压力值,在压力值大于预设压力阈值的情况下,通过第一继电器控制第二继电器接通以及第三继电器断开,以使第二继电器控制第一电路、第二电路和第三电路的通断;在压力值小于或等于预设压力阈值的情况下,通过第一继电器控制第二继电器断开以及第三继电器接通,以使第三继电器控制第一电路、第二电路和第三电路的通断。In an embodiment of the present invention, the control circuit further includes: a first relay, a second relay and a third relay, and the special gas safety control method further includes: obtaining the pressure value of the process chamber, and when the pressure value is greater than the preset pressure In the case of a threshold value, the first relay is used to control the second relay to be turned on and the third relay to be turned off, so that the second relay controls the on/off of the first circuit, the second circuit and the third circuit; when the pressure value is less than or equal to the preset When a pressure threshold is set, the first relay is used to control the second relay to be turned off and the third relay to be turned on, so that the third relay controls the on/off of the first circuit, the second circuit and the third circuit.
作为一种示例,在本发明实施例中,可以通过第一继电器控制第二继电器和第三继电器的通断;通过第二继电器和/或第三继电器控制第一电路、第二电路和第三电路的通断。As an example, in the embodiment of the present invention, the on/off of the second relay and the third relay can be controlled through the first relay; the first circuit, the second circuit and the third circuit can be controlled through the second relay and/or the third relay. The circuit is on and off.
示例性地,PLC可以向第一继电器传输控制信号,以控制第一继电器的对应触点闭合或断开,进而控制第二继电器和第三继电器的相应触点闭合或断开。在工艺腔室压力值大于预设压力阈值的情况下,可以通过第一继电器控制第二继电器接通,以及控制第三继电器断开,以使第二继电器控制第一电路、第二电路和第三电路的通断;在压力值小于或等于预设压力阈值的情况下,可以通过第一继电器控制第二继电器断开以及第三继电器接通,以使第三继电器控制第一电路、第二电路和第三电路的通断。For example, the PLC can transmit a control signal to the first relay to control the corresponding contact point of the first relay to close or open, and then control the corresponding contact point of the second relay and the third relay to close or open. When the pressure value of the process chamber is greater than the preset pressure threshold, the first relay can be used to control the second relay to turn on and the third relay to turn off, so that the second relay controls the first circuit, the second circuit and the third circuit. On and off of the three circuits; when the pressure value is less than or equal to the preset pressure threshold, the first relay can be used to control the second relay to turn off and the third relay to turn on, so that the third relay controls the first circuit and the second circuit. circuit and the third circuit.
步骤102,在压力值大于预设压力阈值的情况下,当需要打开第二气体对应阀门和第三气体对应阀门时,控制第一电路断开,以及控制第二电路和第三电路接通,以使第一气体对应阀门关闭、第二气体对应阀门和第三气体对应阀门打开。Step 102: When the pressure value is greater than the preset pressure threshold, when it is necessary to open the second gas corresponding valve and the third gas corresponding valve, control the first circuit to be disconnected, and control the second circuit and the third circuit to be connected, So that the first gas corresponding valve is closed, the second gas corresponding valve and the third gas corresponding valve are opened.
示例性地,控制电路可以包括第一电路、第二电路和第三电路。其中,第一电路可以控制第一气体阀门的通断,第二电路可以控制第二气体阀门的通断,第三电路可以控制第三气体阀门的通断。 Exemplarily, the control circuit may include a first circuit, a second circuit, and a third circuit. Among them, the first circuit can control the on-off of the first gas valve, the second circuit can control the on-off of the second gas valve, and the third circuit can control the on-off of the third gas valve.
示例性地,若工艺腔室的压力值大于预设压力阈值,则说明工艺腔室内的特种气体浓度高,特种气体间容易发生反应而对工艺腔室和管路造成污染。当需要打开第二气体阀门和第三气体阀门时,可以通过控制第一电路断开,以及控制第二电路和第三电路接通,以使第一气体阀门关闭、第二气体阀门和第三气体阀门打开。For example, if the pressure value of the process chamber is greater than the preset pressure threshold, it means that the concentration of special gases in the process chamber is high, and the special gases are prone to react with each other and cause pollution to the process chamber and pipelines. When it is necessary to open the second gas valve and the third gas valve, the first circuit can be controlled to be disconnected, and the second circuit and the third circuit can be controlled to be connected, so that the first gas valve is closed and the second gas valve is connected to the third gas valve. The gas valve opens.
在本发明的一种实施例中,第一继电器包括第一对常闭触点和第一对常开触点;在压力值大于预设压力阈值的情况下,通过第一继电器控制第一对常开触点保持断开状态,以控制第三继电器断开,以及通过第一继电器控制第一对常闭触点保持闭合状态,以控制第二继电器接通,以使第二继电器控制第一电路、第二电路和第三电路的通断。In one embodiment of the present invention, the first relay includes a first pair of normally closed contacts and a first pair of normally open contacts; when the pressure value is greater than a preset pressure threshold, the first pair is controlled by the first relay The normally open contact remains open to control the third relay to open, and the first pair of normally closed contacts is controlled to remain closed through the first relay to control the second relay to open, so that the second relay controls the first circuit, the second circuit and the third circuit.
示例性地,第一继电器可以包括第一对常闭触点和第一对常开触点。在工艺腔室压力值大于预设压力阈值的情况下,PLC可以向第一继电器输出低电平信号,第一继电器接收低电平信号,可以控制第一对常开触点保持断开状态,以使第三继电器断开,以及可以控制第一对常闭触点保持闭合状态,以使第二继电器接通,第二继电器在接通的状态下可以控制第一电路、第二电路和第三电路的通断。Illustratively, the first relay may include a first pair of normally closed contacts and a first pair of normally open contacts. When the pressure value of the process chamber is greater than the preset pressure threshold, the PLC can output a low-level signal to the first relay. The first relay receives the low-level signal and can control the first pair of normally open contacts to remain disconnected. So that the third relay is disconnected, and the first pair of normally closed contacts can be controlled to remain closed, so that the second relay is connected, and the second relay can control the first circuit, the second circuit and the third circuit in the connected state. The switching of three circuits.
例如,如图2所示为本发明实施例提供的一种特种气体安全控制原理图,KA01为第一继电器,KA02为第二继电器,KA03为第三继电器;第一继电器KA01包括第一对常闭触点11、12,用于控制第二继电器KA02的通断,第一继电器KA01还包括第一对常开触点13、14,用于控制第三继电器KA03的通断。在工艺腔室压力值大于预设压力阈值(例如10Torr)的情况下,PLC向第一继电器KA01的0触点输出低电平,此时第一继电器KA01的第一对常开触点13、14断开,第一对常闭触点11、12闭合,则第三继电器KA03断开,第二继电器KA02接通,此时由第二继电器KA02控制第一电路、第二电路和第三电路的通断。 For example, Figure 2 is a schematic diagram of a special gas safety control provided by an embodiment of the present invention. KA01 is the first relay, KA02 is the second relay, and KA03 is the third relay; the first relay KA01 includes a first pair of normal relays. The closed contacts 11 and 12 are used to control the on-off of the second relay KA02. The first relay KA01 also includes a first pair of normally open contacts 13 and 14, used to control the on-off of the third relay KA03. When the process chamber pressure value is greater than the preset pressure threshold (for example, 10Torr), the PLC outputs a low level to the 0 contact of the first relay KA01. At this time, the first pair of normally open contacts 13 and 13 of the first relay KA01 14 is open and the first pair of normally closed contacts 11 and 12 are closed, then the third relay KA03 is open and the second relay KA02 is connected. At this time, the second relay KA02 controls the first circuit, the second circuit and the third circuit. On and off.
在本发明的一种实施例中,第二继电器包括第二对常闭触点、第二对常开触点和第三对常开触点;通过第二继电器控制第二对常闭触点保持闭合状态,控制第一电路接通,以及通过第二继电器控制第二对常开触点和第三对常开触点保持断开状态,分别控制第二电路和第三电路断开,以使第一气体对应阀门关闭、第二气体对应阀门和第三气体对应阀门打开。In one embodiment of the present invention, the second relay includes a second pair of normally closed contacts, a second pair of normally open contacts and a third pair of normally open contacts; the second pair of normally closed contacts is controlled by the second relay Maintain the closed state, control the first circuit to be connected, and control the second pair of normally open contacts and the third pair of normally open contacts to maintain the disconnected state through the second relay, respectively control the second circuit and the third circuit to disconnect, so as to The first gas corresponding valve is closed, the second gas corresponding valve and the third gas corresponding valve are opened.
示例性地,第二继电器可以包括第二对常闭触点、第二对常开触点和第三对常开触点。在工艺腔室压力值大于预设压力阈值的情况下,第一继电器控制第二继电器接通以及第三继电器断开,第二继电器可以通过控制第二对常闭触点保持闭合状态,控制第一电路接通,以及控制第二对常开触点和第三对常开触点保持断开状态,分别控制第二电路和第三电路断开,以使第一气体阀门关闭、第二气体阀门和第三气体阀门打开。Illustratively, the second relay may include a second pair of normally closed contacts, a second pair of normally open contacts, and a third pair of normally open contacts. When the pressure value of the process chamber is greater than the preset pressure threshold, the first relay controls the second relay to turn on and the third relay to turn off. The second relay can maintain the closed state by controlling the second pair of normally closed contacts to control the third relay. One circuit is connected, and the second pair of normally open contacts and the third pair of normally open contacts are controlled to remain disconnected, and the second circuit and the third circuit are respectively controlled to be disconnected, so that the first gas valve is closed and the second gas valve is closed. valve and third gas valve open.
在本发明的一种实施例中,第一气体为NF3,第二气体为H2,第三气体为SiH4In an embodiment of the present invention, the first gas is NF 3 , the second gas is H 2 , and the third gas is SiH 4 .
作为一种示例,第一气体可以为NF3,第二气体可以为H2,第三气体可以为SiH4As an example, the first gas may be NF 3 , the second gas may be H 2 , and the third gas may be SiH 4 .
例如,如图2所示为本发明实施例提供的一种特种气体安全控制原理图,第二继电器KA02包括第二对常闭触点21、22,可以通过控制第一电路的通断以控制NF3阀门的通断;第二继电器KA02还包括第二对常开触点23、24,可以通过控制第二电路的通断以控制H2阀门的通断;第二继电器KA02还包括第三对常开触点25、26,可以通过控制第三电路的通断以控制SiH4阀门的通断。在工艺腔室压力大于10Torr的情况下,此时由第二继电器KA02控制第一电路、第二电路和第三电路的通断,当需要打开H2、SiH4阀门时,PLC的NF3与H2、SiH4开阀的切换信号可以输出高电平信号,第二继电器KA02接收高电平信号,可以控制第二继电器KA02的第二对常开触点23、24和第三对常开触点25、26闭合,第二对常闭触点21、22断开,此时控制 H2阀门和SiH4阀门的电路接通,控制NF3阀门的电路断开,H2阀门、SiH4阀门允许打开,NF3阀门关闭。For example, as shown in Figure 2 is a schematic diagram of a special gas safety control provided by an embodiment of the present invention. The second relay KA02 includes a second pair of normally closed contacts 21 and 22, which can be controlled by controlling the on-off of the first circuit. On and off of the NF3 valve; the second relay KA02 also includes a second pair of normally open contacts 23 and 24, which can control the on and off of the H2 valve by controlling the on and off of the second circuit; the second relay KA02 also includes a third pair of normally open contacts. The opening contacts 25 and 26 can control the opening and closing of the SiH4 valve by controlling the opening and closing of the third circuit. When the process chamber pressure is greater than 10Torr, the second relay KA02 controls the on and off of the first circuit, the second circuit and the third circuit. When the H 2 and SiH 4 valves need to be opened, the PLC's NF 3 and The switching signal of H 2 and SiH 4 valve opening can output a high level signal. The second relay KA02 receives the high level signal and can control the second pair of normally open contacts 23, 24 and the third pair of normally open contacts of the second relay KA02. Contacts 25 and 26 are closed, and the second pair of normally closed contacts 21 and 22 are open. At this time, the control The circuit of the H2 valve and the SiH 4 valve is connected, the circuit controlling the NF 3 valve is disconnected, the H2 valve and the SiH 4 valve are allowed to open, and the NF 3 valve is closed.
步骤103,当需要打开第一气体对应阀门时,控制第一电路接通,以及控制第二电路和第三电路断开,以使第一气体对应阀门打开、第二气体对应阀门和第三气体对应阀门关闭。Step 103: When it is necessary to open the valve corresponding to the first gas, control the first circuit to be turned on, and control the second circuit and the third circuit to be turned off, so that the first gas corresponding valve is opened, the second gas corresponding valve and the third gas are connected. The corresponding valve is closed.
示例性地,在工艺腔室的压力值大于预设压力阈值的情况下,当需要打开第一气体阀门时,可以通过控制第一电路接通,以及控制第二电路和第三电路断开,以使第一气体阀门打开、第二气体阀门和第三气体阀门关闭,从而实现第一气体与第二气体阀门不同时打开,第一气体与第三气体阀门不同时打开。For example, when the pressure value of the process chamber is greater than the preset pressure threshold, when the first gas valve needs to be opened, the first circuit can be controlled to be turned on, and the second circuit and the third circuit can be controlled to be turned off, The first gas valve is opened, and the second gas valve and the third gas valve are closed, thereby realizing that the first gas and the second gas valve are not opened at the same time, and the first gas and the third gas valve are not opened at the same time.
在本发明的一种实施例中,通过第二继电器控制第二对常闭触点保持闭合状态,控制第一电路接通,以及通过第二继电器控制第二对常开触点和第三对常开触点保持断开状态,分别控制第二电路和第三电路断开,以使第一气体对应阀门打开、第二气体对应阀门和第三气体对应阀门关闭。In one embodiment of the present invention, the second pair of normally closed contacts is controlled to remain closed through the second relay, the first circuit is controlled to be turned on, and the second pair of normally open contacts and the third pair are controlled through the second relay. The normally open contact remains in a disconnected state and controls the disconnection of the second circuit and the third circuit respectively, so that the first gas corresponding valve is opened, the second gas corresponding valve and the third gas corresponding valve are closed.
示例性地,在第二继电器接通的情况下,当需要打开NF3阀门时,第二继电器可以控制第二对常闭触点保持闭合状态,以使第一电路接通,以及控制第二对常开触点和第三对常开触点保持断开状态,以分别使第二电路和第三电路断开,从而控制NF3阀门打开、H2阀门和SiH4阀门关闭。For example, when the second relay is turned on, when the NF 3 valve needs to be opened, the second relay can control the second pair of normally closed contacts to remain closed to make the first circuit turn on, and control the second Keep the normally open contact and the third pair of normally open contacts in a disconnected state to disconnect the second circuit and the third circuit respectively, thereby controlling the NF 3 valve to open, the H 2 valve and the SiH 4 valve to close.
例如,在第二继电器KA02接通的情况下,当需要打开NF3阀门时,PLC的NF3与H2、SiH4开阀的切换信号可以输出低电平信号,第二继电器KA02接收低电平信号,可以控制第二继电器KA02的第二对常开触点23、24以及第三对常开触点25、26断开,第二对常闭触点21、22闭合,此时控制H2阀门和SiH4阀门的电路断开,控制NF3阀门的电路接通,H2阀门、SiH4阀门关闭,NF3阀门允许打开。For example, when the second relay KA02 is turned on, when the NF3 valve needs to be opened, the switching signal of the PLC's NF 3 and H 2 and SiH 4 valve openings can output a low-level signal, and the second relay KA02 receives the low-level signal. The signal can control the second pair of normally open contacts 23, 24 and the third pair of normally open contacts 25, 26 of the second relay KA02 to open, and the second pair of normally closed contacts 21, 22 to close. At this time, control H 2 The circuit between the valve and the SiH 4 valve is disconnected, the circuit controlling the NF 3 valve is connected, the H 2 valve and the SiH 4 valve are closed, and the NF 3 valve is allowed to open.
在本发明的一种实施例中,在压力值小于或等于预设压力阈值的情况 下,控制第一电路、第二电路和第三电路接通,以使第一气体对应阀门、第二气体对应阀门和第三气体对应阀门打开。In one embodiment of the present invention, when the pressure value is less than or equal to the preset pressure threshold Under the control, the first circuit, the second circuit and the third circuit are controlled to be connected, so that the first gas corresponding valve, the second gas corresponding valve and the third gas corresponding valve are opened.
示例性地,若工艺腔室的压力值小于或等于预设压力阈值,则说明工艺腔室内的特种气体浓度低,且气体分子不活跃,不易发生化学反应,不需做电气互锁,可以通过控制第一电路、第二电路和第三电路接通,以使NF3阀门、H2阀门和SiH4阀门打开。For example, if the pressure value of the process chamber is less than or equal to the preset pressure threshold, it means that the concentration of the special gas in the process chamber is low, and the gas molecules are inactive and are not prone to chemical reactions. There is no need for electrical interlocking. You can pass The first circuit, the second circuit and the third circuit are controlled to be connected to open the NF 3 valve, H 2 valve and SiH 4 valve.
在本发明的一种实施例中,在压力值小于或等于预设压力阈值的情况下,通过第一继电器控制第一对常闭触点打开,控制第二继电器断开,以及通过第一继电器控制第一对常开触点闭合,控制第三继电器接通,以使第三继电器控制第一电路、第二电路和第三电路的通断。In one embodiment of the present invention, when the pressure value is less than or equal to the preset pressure threshold, the first pair of normally closed contacts is controlled to open through the first relay, the second relay is controlled to open, and the first pair of normally closed contacts is controlled through the first relay. The first pair of normally open contacts are controlled to be closed, and the third relay is controlled to be turned on, so that the third relay controls the opening and closing of the first circuit, the second circuit and the third circuit.
示例性地,在工艺腔室的压力值小于或等于预设压力阈值的情况下,PLC可以向第一继电器输出高电平信号,第一继电器接收高电平信号,可以控制第一对常闭触点打开,以使第二继电器断开,以及控制第一对常开触点闭合,以使第三继电器接通,从而控制第三继电器控制第一电路、第二电路和第三电路的通断。For example, when the pressure value of the process chamber is less than or equal to the preset pressure threshold, the PLC can output a high-level signal to the first relay, and the first relay receives the high-level signal and can control the first pair of normally closed The contacts open to disconnect the second relay, and the first pair of normally open contacts are controlled to close to connect the third relay, thereby controlling the third relay to control the conduction of the first circuit, the second circuit and the third circuit. Break.
例如,工艺腔室的压力值小于或等于10Torr时,PLC可以向第一继电器KA01输出高电平信号,第一继电器KA01接收高电平信号,可以控制第一对常闭触点11、12打开,以使第二继电器KA02断开,以及控制第一对常开触点13、14闭合,以使第三继电器KA03接通,由第三继电器KA03控制第一电路、第二电路和第三电路的通断。For example, when the pressure value of the process chamber is less than or equal to 10Torr, the PLC can output a high-level signal to the first relay KA01. The first relay KA01 receives the high-level signal and can control the first pair of normally closed contacts 11 and 12 to open. , so that the second relay KA02 is turned off, and the first pair of normally open contacts 13 and 14 are controlled to close, so that the third relay KA03 is turned on, and the third relay KA03 controls the first circuit, the second circuit and the third circuit On and off.
在本发明的一种实施例中,通过第三继电器控制第四对常开触点、第五对常开触点和第六对常开触点闭合,控制第一电路、第二电路和第三电路接通,以使第一气体对应阀门、第二气体对应阀门和第三气体对应阀门打开。In one embodiment of the present invention, the third relay controls the closing of the fourth pair of normally open contacts, the fifth pair of normally open contacts and the sixth pair of normally open contacts, and controls the first circuit, the second circuit and the third pair of normally open contacts. The three circuits are connected to open the first gas corresponding valve, the second gas corresponding valve and the third gas corresponding valve.
示例性地,在第三继电器接通的情况下,第三继电器可以控制第四对常开触点、第五对常开触点和第六对常开触点闭合,以使第一电路、第二电路 和第三电路接通,从而控制NF3对应阀门、H2对应阀门和SiH4对应阀门打开。For example, when the third relay is turned on, the third relay can control the fourth pair of normally open contacts, the fifth pair of normally open contacts, and the sixth pair of normally open contacts to close, so that the first circuit, Second circuit It is connected to the third circuit to control the opening of the valve corresponding to NF 3 , the valve corresponding to H 2 and the valve corresponding to SiH 4 .
例如,如图2所示为本发明实施例提供的一种特种气体安全控制原理图,For example, Figure 2 is a schematic diagram of a special gas safety control provided by an embodiment of the present invention.
第三继电器KA03包括第四对常开触点31、32,可以通过控制第一电路的通断以控制NF3阀门的通断,包括第五对常开触点33、34,可以通过控制第二电路的通断以控制H2阀门的通断,包括第六对常开触点35、36,可以通过控制第三电路的通断以控制SiH4阀门的通断。The third relay KA03 includes a fourth pair of normally open contacts 31 and 32, which can control the on and off of the NF3 valve by controlling the on and off of the first circuit, and a fifth pair of normally open contacts 33 and 34, which can control the on and off of the second circuit. The on-off of the circuit is used to control the on-off of the H2 valve, including the sixth pair of normally open contacts 35 and 36. The on-off of the third circuit can be controlled to control the on-off of the SiH4 valve.
当工艺腔室压力小于10Torr时,PLC可以向第一继电器KA01的0触点输出高电平信号,此时第一继电器KA01的第一对常开触点13、14闭合,第一继电器KA01的第一对常闭触点11、12断开,保证第二继电器KA02不会获得高电平,则第二继电器KA02断开,第三继电器KA03的0触点得到24V高电平信号,此时由第三继电器KA03控制电路。第三继电器KA03的第四对常开触点31、32、第五对常开触点33、34以及第六对常开触点35、36闭合,则H2、NF3、SiH4阀门开启的信号接通,阀门开启。此时,实现腔室压力小于10Torr时,H2、NF3、SiH4阀门不做电气的互斥。When the process chamber pressure is less than 10Torr, the PLC can output a high level signal to the 0 contact of the first relay KA01. At this time, the first pair of normally open contacts 13 and 14 of the first relay KA01 are closed, and the first pair of normally open contacts 13 and 14 of the first relay KA01 are closed. The first pair of normally closed contacts 11 and 12 are disconnected to ensure that the second relay KA02 will not get a high level, then the second relay KA02 is disconnected, and the 0 contact of the third relay KA03 gets a 24V high level signal. At this time The circuit is controlled by the third relay KA03. The fourth pair of normally open contacts 31, 32, the fifth pair of normally open contacts 33, 34 and the sixth pair of normally open contacts 35, 36 of the third relay KA03 are closed, then the H 2 , NF 3 and SiH 4 valves are opened. The signal is turned on and the valve opens. At this time, when the chamber pressure is less than 10Torr, the H 2 , NF 3 and SiH 4 valves are not electrically mutually exclusive.
在本发明实施例中,获取工艺腔室的压力值;在压力值大于预设压力阈值的情况下,当需要打开第二气体对应阀门和第三气体对应阀门时,控制第一电路断开,控制第二电路和第三电路接通,以使第一气体对应阀门关闭、第二气体对应阀门和第三气体对应阀门打开;当需要打开第一气体对应阀门时,控制第一电路接通,以及控制第二电路和第三电路断开,以使第一气体对应阀门打开、第二气体对应阀门和第三气体对应阀门关闭。通过对上述第一电路、第二电路和第三电路的控制,可以实现阀门互锁功能,即将阀门互锁加入电路设计中,使工艺腔室压力达到预设阈值时,第一气体对应阀门与第二气体对应阀门不会同时开启,第一气体对应阀门与第三气体对应阀门不会同时开启,从而避免了软件控制失效的风险,防止特种气体之间发生化学 反应生成副产物,造成硬件的损坏和人员的伤害,杜绝安全隐患,保护系统和人员安全。In the embodiment of the present invention, the pressure value of the process chamber is obtained; when the pressure value is greater than the preset pressure threshold, when the second gas corresponding valve and the third gas corresponding valve need to be opened, the first circuit is controlled to be disconnected, Control the second circuit and the third circuit to be connected so that the first gas corresponding valve is closed, the second gas corresponding valve and the third gas corresponding valve are opened; when it is necessary to open the first gas corresponding valve, control the first circuit to be connected, and controlling the disconnection of the second circuit and the third circuit to open the first gas corresponding valve, and close the second gas corresponding valve and the third gas corresponding valve. Through the control of the above-mentioned first circuit, second circuit and third circuit, the valve interlock function can be realized, that is, the valve interlock is added to the circuit design, so that when the process chamber pressure reaches the preset threshold, the first gas corresponding valve and The valve corresponding to the second gas will not be opened at the same time, and the valve corresponding to the first gas and the valve corresponding to the third gas will not be opened at the same time, thus avoiding the risk of software control failure and preventing chemical occurrence between special gases. The reaction generates by-products, causing damage to hardware and injuries to personnel, eliminating potential safety hazards and protecting system and personnel safety.
需要说明的是,对于方法实施例,为了简单描述,故将其都表述为一系列的动作组合,但是本领域技术人员应该知悉,本发明实施例并不受所描述的动作顺序的限制,因为依据本发明实施例,某些步骤可以采用其他顺序或者同时进行。其次,本领域技术人员也应该知悉,说明书中所描述的实施例均属于优选实施例,所涉及的动作并不一定是本发明实施例所必须的。It should be noted that for the sake of simple description, the method embodiments are expressed as a series of action combinations. However, those skilled in the art should know that the embodiments of the present invention are not limited by the described action sequence because According to embodiments of the present invention, certain steps may be performed in other orders or simultaneously. Secondly, those skilled in the art should also know that the embodiments described in the specification are preferred embodiments, and the actions involved are not necessarily necessary for the embodiments of the present invention.
本发明实施例提供的一种控制电路,应用于半导体工艺设备,该控制电路包括:包括用于控制第一气体对应阀门通断的第一电路、用于控制第二气体对应阀门通断的第二电路和用于控制第三气体对应阀门通断的第三电路,还包括第一继电器、第二继电器和第三继电器,在压力值大于所述预设压力阈值的情况下,第一继电器用于控制第二继电器接通以及第三继电器断开,以使第二继电器控制第一电路、第二电路和第三电路的通断;在压力值小于或等于预设压力阈值的情况下,第一继电器还用于控制第二继电器断开以及第三继电器接通,以使第三继电器控制第一电路、第二电路和第三电路的通断。A control circuit provided by an embodiment of the present invention is applied to semiconductor process equipment. The control circuit includes: a first circuit for controlling the on-off of the valve corresponding to the first gas, and a third circuit for controlling the on-off of the valve corresponding to the second gas. The second circuit and the third circuit for controlling the on-off of the third gas corresponding valve also include a first relay, a second relay and a third relay. When the pressure value is greater than the preset pressure threshold, the first relay is used For controlling the second relay to be turned on and the third relay to be turned off, so that the second relay controls the on/off of the first circuit, the second circuit and the third circuit; when the pressure value is less than or equal to the preset pressure threshold, the third relay One relay is also used to control the second relay to turn off and the third relay to turn on, so that the third relay controls the on/off of the first circuit, the second circuit and the third circuit.
示例性地,第一继电器可以包括第一对常闭触点和第一对常开触点。在工艺腔室压力值大于预设压力阈值的情况下,PLC可以向第一继电器输出低电平信号,第一继电器接收低电平信号,可以控制第一对常开触点保持断开状态,以使第三继电器断开,以及可以控制第一对常闭触点保持闭合状态,以使第二继电器接通,第二继电器在接通的状态下可以控制第一电路、第二电路和第三电路的通断。Illustratively, the first relay may include a first pair of normally closed contacts and a first pair of normally open contacts. When the pressure value of the process chamber is greater than the preset pressure threshold, the PLC can output a low-level signal to the first relay. The first relay receives the low-level signal and can control the first pair of normally open contacts to remain disconnected. So that the third relay is disconnected, and the first pair of normally closed contacts can be controlled to remain closed, so that the second relay is connected, and the second relay can control the first circuit, the second circuit and the third circuit in the connected state. The switching of three circuits.
例如,如图2所示,KA01为第一继电器,KA02为第二继电器,KA03为第三继电器;第一继电器KA01包括第一对常闭触点11、12,用于控制第二继电器KA02的通断,第一继电器KA01还包括第一对常开触点13、14, 用于控制第三继电器KA03的通断。在工艺腔室压力值大于预设压力阈值(例如10Torr)的情况下,PLC向第一继电器KA01的0触点输出低电平,此时第一继电器KA01的第一对常开触点13、14断开,第一对常闭触点11、12闭合,则第三继电器KA03断开,第二继电器KA02接通,此时由第二继电器KA02控制第一电路、第二电路和第三电路的通断。For example, as shown in Figure 2, KA01 is the first relay, KA02 is the second relay, and KA03 is the third relay; the first relay KA01 includes a first pair of normally closed contacts 11 and 12, which are used to control the second relay KA02. On and off, the first relay KA01 also includes the first pair of normally open contacts 13 and 14, Used to control the on and off of the third relay KA03. When the process chamber pressure value is greater than the preset pressure threshold (for example, 10Torr), the PLC outputs a low level to the 0 contact of the first relay KA01. At this time, the first pair of normally open contacts 13 and 13 of the first relay KA01 14 is open and the first pair of normally closed contacts 11 and 12 are closed, then the third relay KA03 is open and the second relay KA02 is connected. At this time, the second relay KA02 controls the first circuit, the second circuit and the third circuit. On and off.
在本发明的一种实施例中,第二继电器包括第二对常闭触点、第二对常开触点和第三对常开触点;通过第二继电器控制第二对常闭触点保持闭合状态,控制第一电路接通,以及通过第二继电器控制第二对常开触点和第三对常开触点保持断开状态,分别控制第二电路和第三电路断开,以使第一气体对应阀门关闭、第二气体对应阀门和第三气体对应阀门打开。In one embodiment of the present invention, the second relay includes a second pair of normally closed contacts, a second pair of normally open contacts and a third pair of normally open contacts; the second pair of normally closed contacts is controlled by the second relay Maintain the closed state, control the first circuit to be connected, and control the second pair of normally open contacts and the third pair of normally open contacts to maintain the disconnected state through the second relay, respectively control the second circuit and the third circuit to disconnect, so as to The first gas corresponding valve is closed, the second gas corresponding valve and the third gas corresponding valve are opened.
示例性地,第二继电器可以包括第二对常闭触点、第二对常开触点和第三对常开触点。在工艺腔室压力值大于预设压力阈值的情况下,第一继电器控制第二继电器接通以及第三继电器断开,第二继电器可以通过控制第二对常闭触点保持闭合状态,控制第一电路接通,以及控制第二对常开触点和第三对常开触点保持断开状态,分别控制第二电路和第三电路断开,以使第一气体阀门关闭、第二气体阀门和第三气体阀门打开。Illustratively, the second relay may include a second pair of normally closed contacts, a second pair of normally open contacts, and a third pair of normally open contacts. When the pressure value of the process chamber is greater than the preset pressure threshold, the first relay controls the second relay to turn on and the third relay to turn off. The second relay can maintain the closed state by controlling the second pair of normally closed contacts to control the third relay. One circuit is connected, and the second pair of normally open contacts and the third pair of normally open contacts are controlled to remain disconnected, and the second circuit and the third circuit are respectively controlled to be disconnected, so that the first gas valve is closed and the second gas valve is closed. valve and third gas valve open.
例如,如图2所示,以第一气体可以为NF3,第二气体可以为H2,第三气体可以为SiH4为例,第二继电器KA02包括第二对常闭触点21、22,可以通过控制第一电路的通断以控制NF3阀门的通断;第二继电器KA02还包括第二对常开触点23、24,可以通过控制第二电路的通断以控制H2阀门的通断;第二继电器KA02还包括第三对常开触点25、26,可以通过控制第三电路的通断以控制SiH4阀门的通断。在工艺腔室压力大于10Torr的情况下,此时由第二继电器KA02控制第一电路、第二电路和第三电路的通断,当需要打开H2、SiH4阀门时,PLC的NF3与H2、SiH4开阀的切换信号可以输出高电平信号,第二继电器KA02接收高电平信号,可以控制第二继电器KA02 的第二对常开触点23、24和第三对常开触点25、26闭合,第二对常闭触点21、22断开,此时控制H2阀门和SiH4阀门的电路接通,控制NF3阀门的电路断开,H2阀门、SiH4阀门允许打开,NF3阀门关闭。For example, as shown in Figure 2 , taking the first gas as NF 3 , the second gas as H 2 , and the third gas as SiH 4 as an example, the second relay KA02 includes a second pair of normally closed contacts 21 and 22 , the on-off of the NF 3 valve can be controlled by controlling the on-off of the first circuit; the second relay KA02 also includes a second pair of normally open contacts 23, 24, which can control the on-off of the H2 valve by controlling the on-off of the second circuit. On and off; the second relay KA02 also includes a third pair of normally open contacts 25 and 26, which can control the on and off of the SiH 4 valve by controlling the on and off of the third circuit. When the process chamber pressure is greater than 10Torr, the second relay KA02 controls the on and off of the first circuit, the second circuit and the third circuit. When the H 2 and SiH 4 valves need to be opened, the NF 3 of the PLC and The switching signal of H 2 and SiH 4 valve opening can output a high level signal, and the second relay KA02 receives the high level signal and can control the second relay KA02 The second pair of normally open contacts 23, 24 and the third pair of normally open contacts 25, 26 are closed, and the second pair of normally closed contacts 21, 22 are disconnected. At this time, the circuits controlling the H 2 valve and the SiH 4 valve are connected. Pass, the circuit controlling the NF 3 valve is disconnected, the H 2 valve and SiH 4 valve are allowed to open, and the NF 3 valve is closed.
在本发明的一种实施例中,在压力值小于或等于预设压力阈值的情况下,通过第一继电器控制第一对常闭触点打开,控制第二继电器断开,以及通过第一继电器控制第一对常开触点闭合,控制第三继电器接通,以使第三继电器控制第一电路、第二电路和第三电路的通断。In one embodiment of the present invention, when the pressure value is less than or equal to the preset pressure threshold, the first pair of normally closed contacts is controlled to open through the first relay, the second relay is controlled to open, and the first pair of normally closed contacts is controlled through the first relay. The first pair of normally open contacts are controlled to be closed, and the third relay is controlled to be turned on, so that the third relay controls the opening and closing of the first circuit, the second circuit and the third circuit.
示例性地,在工艺腔室的压力值小于或等于预设压力阈值的情况下,PLC可以向第一继电器输出高电平信号,第一继电器接收高电平信号,可以控制第一对常闭触点打开,以使第二继电器断开,以及控制第一对常开触点闭合,以使第三继电器接通,从而控制第三继电器控制第一电路、第二电路和第三电路的通断。For example, when the pressure value of the process chamber is less than or equal to the preset pressure threshold, the PLC can output a high-level signal to the first relay, and the first relay receives the high-level signal and can control the first pair of normally closed The contacts open to disconnect the second relay, and the first pair of normally open contacts are controlled to close to connect the third relay, thereby controlling the third relay to control the conduction of the first circuit, the second circuit and the third circuit. Break.
例如,工艺腔室的压力值小于或等于10Torr时,PLC可以向第一继电器KA01输出高电平信号,第一继电器KA01接收高电平信号,可以控制第一对常闭触点11、12打开,以使第二继电器KA02断开,以及控制第一对常开触点13、14闭合,以使第三继电器KA03接通,由第三继电器KA03控制第一电路、第二电路和第三电路的通断。For example, when the pressure value of the process chamber is less than or equal to 10Torr, the PLC can output a high-level signal to the first relay KA01. The first relay KA01 receives the high-level signal and can control the first pair of normally closed contacts 11 and 12 to open. , so that the second relay KA02 is turned off, and the first pair of normally open contacts 13 and 14 are controlled to close, so that the third relay KA03 is turned on, and the third relay KA03 controls the first circuit, the second circuit and the third circuit On and off.
在本发明的一种实施例中,通过第三继电器控制第四对常开触点、第五对常开触点和第六对常开触点闭合,控制第一电路、第二电路和第三电路接通,以使第一气体对应阀门、第二气体对应阀门和第三气体对应阀门打开。In one embodiment of the present invention, the third relay controls the closing of the fourth pair of normally open contacts, the fifth pair of normally open contacts and the sixth pair of normally open contacts, and controls the first circuit, the second circuit and the third pair of normally open contacts. The three circuits are connected to open the first gas corresponding valve, the second gas corresponding valve and the third gas corresponding valve.
示例性地,在第三继电器接通的情况下,第三继电器可以控制第四对常开触点、第五对常开触点和第六对常开触点闭合,以使第一电路、第二电路和第三电路接通,从而控制NF3对应阀门、H2对应阀门和SiH4对应阀门打开。For example, when the third relay is turned on, the third relay can control the fourth pair of normally open contacts, the fifth pair of normally open contacts, and the sixth pair of normally open contacts to close, so that the first circuit, The second circuit and the third circuit are connected, thereby controlling the NF 3 corresponding valve, the H 2 corresponding valve and the SiH 4 corresponding valve to open.
例如,如图2所示,第三继电器KA03包括第四对常开触点31、32,可 以通过控制第一电路的通断以控制NF3阀门的通断,包括第五对常开触点33、34,可以通过控制第二电路的通断以控制H2阀门的通断,包括第六对常开触点35、36,可以通过控制第三电路的通断以控制SiH4阀门的通断。For example, as shown in Figure 2, the third relay KA03 includes a fourth pair of normally open contacts 31, 32, which can The on-off of the NF 3 valve can be controlled by controlling the on-off of the first circuit, including the fifth pair of normally open contacts 33, 34, and the on-off of the H2 valve can be controlled by controlling the on-off of the second circuit, including the fifth pair of normally open contacts 33 and 34. Six pairs of normally open contacts 35 and 36 can control the opening and closing of the SiH 4 valve by controlling the opening and closing of the third circuit.
当工艺腔室压力小于10Torr时,PLC可以向第一继电器KA01的0触点输出高电平信号,此时第一继电器KA01的第一对常开触点13、14闭合,第一继电器KA01的第一对常闭触点11、12断开,保证第二继电器KA02不会获得高电平,则第二继电器KA02断开,第三继电器KA03的0触点得到24V高电平信号,此时由第三继电器KA03控制电路。第三继电器KA03的第四对常开触点31、32、第五对常开触点33、34以及第六对常开触点35、36闭合,则H2、NF3、SiH4阀门开启的信号接通,阀门开启。此时,实现腔室压力小于10Torr时,H2、NF3、SiH4阀门不做电气的互斥。When the process chamber pressure is less than 10Torr, the PLC can output a high level signal to the 0 contact of the first relay KA01. At this time, the first pair of normally open contacts 13 and 14 of the first relay KA01 are closed, and the first pair of normally open contacts 13 and 14 of the first relay KA01 are closed. The first pair of normally closed contacts 11 and 12 are disconnected to ensure that the second relay KA02 will not get a high level, then the second relay KA02 is disconnected, and the 0 contact of the third relay KA03 gets a 24V high level signal. At this time The circuit is controlled by the third relay KA03. The fourth pair of normally open contacts 31, 32, the fifth pair of normally open contacts 33, 34 and the sixth pair of normally open contacts 35, 36 of the third relay KA03 are closed, then the H 2 , NF 3 and SiH 4 valves are opened. The signal is turned on and the valve opens. At this time, when the chamber pressure is less than 10Torr, the H 2 , NF 3 and SiH 4 valves are not electrically mutually exclusive.
对于装置实施例而言,由于其与方法实施例基本相似,所以描述的比较简单,相关之处参见方法实施例的部分说明即可。As for the device embodiment, since it is basically similar to the method embodiment, the description is relatively simple. For relevant details, please refer to the partial description of the method embodiment.
参照图3,示出了本发明实施例提供的一种半导体工艺设备的结构框图,上述半导体工艺设备301包括:工艺腔室和控制电路;上述控制电路包括用于控制第一气体对应阀门通断的第一电路、用于控制第二气体对应阀门通断的第二电路和用于控制第三气体对应阀门通断的第三电路,上述半导体工艺设备还包括:Referring to Figure 3, there is shown a structural block diagram of a semiconductor process equipment provided by an embodiment of the present invention. The above-mentioned semiconductor process equipment 301 includes: a process chamber and a control circuit; the above-mentioned control circuit includes a valve for controlling the first gas corresponding valve on and off. The first circuit, the second circuit for controlling the on-off of the valve corresponding to the second gas, and the third circuit for controlling the on-off of the valve corresponding to the third gas, the above-mentioned semiconductor process equipment also include:
控制器3011,用于获取上述工艺腔室的压力值;在上述压力值大于预设压力阈值的情况下,当需要打开上述第二气体对应阀门和上述第三气体对应阀门时,控制上述第一电路断开,以及控制上述第二电路和上述第三电路接通,以使上述第一气体对应阀门关闭、上述第二气体对应阀门和上述第三气体对应阀门打开;当需要打开上述第一气体对应阀门时,控制上述第一电路接通,以及控制上述第二电路和上述第三电路断开,以使上述第一气体对应阀门打开、上述第二气体对应阀门和上述第三气体对应阀门关闭。 The controller 3011 is used to obtain the pressure value of the above-mentioned process chamber; when the above-mentioned pressure value is greater than the preset pressure threshold, when it is necessary to open the above-mentioned second gas corresponding valve and the above-mentioned third gas corresponding valve, control the above-mentioned first gas corresponding valve. The circuit is disconnected, and the above-mentioned second circuit and the above-mentioned third circuit are controlled to be connected, so that the above-mentioned first gas corresponding valve is closed, the above-mentioned second gas corresponding valve and the above-mentioned third gas corresponding valve are opened; when it is necessary to open the above-mentioned first gas When corresponding to the valve, the above-mentioned first circuit is controlled to be connected, and the above-mentioned second circuit and the above-mentioned third circuit are controlled to be disconnected, so that the above-mentioned first gas corresponding valve is opened, the above-mentioned second gas corresponding valve and the above-mentioned third gas corresponding valve are closed. .
在本发明一个可选的实施例中,上述控制器,还用于在上述压力值小于或等于预设压力阈值的情况下,控制上述第一电路、上述第二电路和上述第三电路接通,以使上述第一气体对应阀门、上述第二气体对应阀门和上述第三气体对应阀门打开。In an optional embodiment of the present invention, the above-mentioned controller is also used to control the above-mentioned first circuit, the above-mentioned second circuit and the above-mentioned third circuit to turn on when the pressure value is less than or equal to the preset pressure threshold. , so that the first gas corresponding valve, the second gas corresponding valve and the third gas corresponding valve are opened.
在本发明一个可选的实施例中,上述电路还包括:第一继电器、第二继电器和第三继电器,上述控制器,还用于在上述压力值大于预设压力阈值的情况下,通过上述第一继电器控制上述第二继电器接通以及上述第三继电器断开,以使上述第二继电器控制上述第一电路、上述第二电路和上述第三电路的通断;在上述压力值小于或等于预设压力阈值的情况下,通过上述第一继电器控制上述第二继电器断开以及上述第三继电器接通,以使上述第三继电器控制上述第一电路、上述第二电路和上述第三电路的通断。In an optional embodiment of the present invention, the above-mentioned circuit also includes: a first relay, a second relay and a third relay. The above-mentioned controller is also configured to, when the above-mentioned pressure value is greater than the preset pressure threshold, use the above-mentioned The first relay controls the above-mentioned second relay to be on and the above-mentioned third relay to be off, so that the above-mentioned second relay controls the on-off of the above-mentioned first circuit, the above-mentioned second circuit and the above-mentioned third circuit; when the above-mentioned pressure value is less than or equal to When the pressure threshold is preset, the first relay controls the second relay to turn off and the third relay to turn on, so that the third relay controls the first circuit, the second circuit and the third circuit. On and off.
在本发明一个可选的实施例中,上述第一继电器包括第一对常闭触点和第一对常开触点;上述控制器,用于在上述压力值大于预设压力阈值的情况下,通过上述第一继电器控制上述第一对常开触点保持断开状态,控制上述第三继电器断开,以及通过上述第一继电器控制上述第一对常闭触点保持闭合状态,控制上述第二继电器接通,以使上述第二继电器控制上述第一电路、上述第二电路和上述第三电路的通断。In an optional embodiment of the present invention, the above-mentioned first relay includes a first pair of normally closed contacts and a first pair of normally open contacts; and the above-mentioned controller is used when the above-mentioned pressure value is greater than a preset pressure threshold. , controlling the first pair of normally open contacts to maintain an open state through the first relay, controlling the third relay to open, and controlling the first pair of normally closed contacts to maintain a closed state through the first relay, controlling the third The two relays are turned on, so that the second relay controls the on-off of the first circuit, the second circuit and the third circuit.
在本发明一个可选的实施例中,上述第二继电器包括第二对常闭触点、第二对常开触点和第三对常开触点;上述控制器,用于通过上述第二继电器控制上述第二对常闭触点断开,控制上述第一电路断开,以及通过上述第二继电器控制上述第二对常开触点和上述第三对常开触点闭合,控制上述第二电路和上述第三电路接通,以使上述第一气体对应阀门关闭、上述第二气体对应阀门和上述第三气体对应阀门打开。In an optional embodiment of the present invention, the above-mentioned second relay includes a second pair of normally closed contacts, a second pair of normally open contacts and a third pair of normally open contacts; the above-mentioned controller is configured to pass the above-mentioned second pair of normally open contacts. The relay controls the opening of the above-mentioned second pair of normally closed contacts, controls the opening of the above-mentioned first circuit, and controls the closing of the above-mentioned second pair of normally open contacts and the above-mentioned third pair of normally open contacts through the above-mentioned second relay, controlling the above-mentioned third pair of normally open contacts to close. The second circuit and the above-mentioned third circuit are connected, so that the above-mentioned first gas corresponding valve is closed, the above-mentioned second gas corresponding valve and the above-mentioned third gas corresponding valve are opened.
在本发明一个可选的实施例中,上述控制器,用于通过上述第二继电器控制上述第二对常闭触点保持闭合状态,控制上述第一电路接通,以及通过 上述第二继电器控制上述第二对常开触点和上述第三对常开触点保持断开状态,控制上述第二电路和上述第三电路断开,以使上述第一气体对应阀门打开、上述第二气体对应阀门和上述第三气体对应阀门关闭。In an optional embodiment of the present invention, the above-mentioned controller is used to control the above-mentioned second pair of normally closed contacts to maintain a closed state through the above-mentioned second relay, control the above-mentioned first circuit to be turned on, and through the above-mentioned second relay The above-mentioned second relay controls the above-mentioned second pair of normally open contacts and the above-mentioned third pair of normally open contacts to remain disconnected, and controls the above-mentioned second circuit and the above-mentioned third circuit to disconnect, so that the above-mentioned first gas corresponding valve opens, The above-mentioned second gas corresponding valve and the above-mentioned third gas corresponding valve are closed.
在本发明一个可选的实施例中,上述控制器,用于在上述压力值小于或等于预设压力阈值的情况下,通过上述第一继电器控制上述第一对常闭触点打开,控制上述第二继电器断开,以及通过上述第一继电器控制上述第一对常开触点闭合,控制上述第三继电器接通,以使上述第三继电器控制上述第一电路、上述第二电路和上述第三电路的通断。In an optional embodiment of the present invention, the above-mentioned controller is used to control the above-mentioned first pair of normally closed contacts to open through the above-mentioned first relay when the above-mentioned pressure value is less than or equal to the preset pressure threshold, and controls the above-mentioned The second relay is turned off, and the first pair of normally open contacts are controlled to close through the first relay, and the third relay is controlled to be turned on, so that the third relay controls the first circuit, the second circuit and the third circuit. The switching of three circuits.
在本发明一个可选的实施例中,上述第三继电器包括第四对常开触点、第五对常开触点和第六对常开触点;上述控制器,用于通过上述第三继电器控制上述第四对常开触点、上述第五对常开触点和上述第六对常开触点闭合,控制上述第一电路、上述第二电路和上述第三电路接通,以使上述第一气体对应阀门、上述第二气体对应阀门和第三气体对应阀门打开。In an optional embodiment of the present invention, the above-mentioned third relay includes a fourth pair of normally open contacts, a fifth pair of normally open contacts and a sixth pair of normally open contacts; the above-mentioned controller is configured to pass the above-mentioned third pair of normally open contacts. The relay controls the fourth pair of normally open contacts, the above fifth pair of normally open contacts, and the above sixth pair of normally open contacts to close, and controls the above first circuit, the above second circuit, and the above third circuit to connect, so that the above The first gas corresponding valve, the second gas corresponding valve and the third gas corresponding valve are opened.
在本发明一个可选的实施例中,上述第一气体为NF3,上述第二气体为H2,上述第三气体为SiH4。In an optional embodiment of the present invention, the first gas is NF3, the second gas is H2, and the third gas is SiH4.
对于装置实施例而言,由于其与方法实施例基本相似,所以描述的比较简单,相关之处参见方法实施例的部分说明即可。As for the device embodiment, since it is basically similar to the method embodiment, the description is relatively simple. For relevant details, please refer to the partial description of the method embodiment.
图4为本发明实施例中提供的特种气体安全控制装置的一种结构框图,如图4所示,该特种气体安全控制装置用于对半导体工艺设备中的控制电路进行控制,包括:至少一个处理器101、存储器102、至少一个I/O接口103。存储器102上存储有至少一个程序,当该至少一个程序被该至少一个处理器101执行,使得该至少一个处理器实现如上述实施例中任一方法中的步骤;至少一个I/O接口103连接在处理器101与存储器102之间,配置为实现处理器与存储器的信息交互。Figure 4 is a structural block diagram of a special gas safety control device provided in an embodiment of the present invention. As shown in Figure 4, the special gas safety control device is used to control a control circuit in a semiconductor process equipment and includes: at least one Processor 101, memory 102, at least one I/O interface 103. At least one program is stored on the memory 102. When the at least one program is executed by the at least one processor 101, the at least one processor implements the steps in any of the methods in the above embodiments; at least one I/O interface 103 is connected Between the processor 101 and the memory 102, it is configured to realize information exchange between the processor and the memory.
其中,处理器101为具有数据处理能力的器件,其包括但不限于中央处 理器(CPU)等;存储器102为具有数据存储能力的器件,其包括但不限于随机存取存储器(RAM,更具体如SDRAM、DDR等)、只读存储器(ROM)、带电可擦可编程只读存储器(EEPROM)、闪存(FLASH);I/O接口(读写接口)103连接在处理器101与存储器102间,能实现处理器101与存储器102的信息交互,其包括但不限于数据总线(Bus)等。Among them, the processor 101 is a device with data processing capabilities, including but not limited to a central processing unit processor (CPU), etc.; the memory 102 is a device with data storage capabilities, including but not limited to random access memory (RAM, more specifically such as SDRAM, DDR, etc.), read-only memory (ROM), power-erasable programmable memory, etc. Read-only memory (EEPROM), flash memory (FLASH); I/O interface (read-write interface) 103 is connected between the processor 101 and the memory 102, and can realize information interaction between the processor 101 and the memory 102, including but not limited to data Bus, etc.
在一些实施例中,处理器101、存储器102和I/O接口103通过总线104相互连接,进而与计算设备的其它组件连接。In some embodiments, processor 101, memory 102, and I/O interface 103 are connected to each other and, in turn, to other components of the computing device via bus 104.
在一些实施例中,该处理器101包括FPGA。In some embodiments, the processor 101 includes an FPGA.
根据本公开的实施例,还提供一种计算机可读介质。该计算机可读介质上存储有计算机程序,其中,该程序被处理器执行时实现如上述实施例任一测试晶片调度方法中的步骤。According to embodiments of the present disclosure, a computer-readable medium is also provided. The computer readable medium stores a computer program, wherein when the program is executed by the processor, the steps in any of the test wafer scheduling methods in the above embodiments are implemented.
特别地,根据本公开实施例,上文参考流程图描述的过程可以被实现为计算机软件程序。例如,本公开的实施例包括一种计算机程序产品,其包括承载在机器可读介质上的计算机程序,该计算机程序包含用于执行流程图所示的方法的程序代码。在这样的实施例中,该计算机程序可以通过通信部分从网络上被下载和安装,和/或从可拆卸介质被安装。在该计算机程序被中央处理单元(CPU)执行时,执行本公开的系统中限定的上述功能。In particular, according to embodiments of the present disclosure, the processes described above with reference to the flowcharts may be implemented as computer software programs. For example, embodiments of the present disclosure include a computer program product including a computer program carried on a machine-readable medium, the computer program containing program code for performing the method illustrated in the flowchart. In such embodiments, the computer program may be downloaded and installed from the network via the communications component, and/or installed from removable media. When the computer program is executed by a central processing unit (CPU), the above-described functions defined in the system of the present disclosure are performed.
需要说明的是,本公开所示的计算机可读介质可以是计算机可读信号介质或者计算机可读存储介质或者是上述两者的任意组合。计算机可读存储介质例如可以是——但不限于——电、磁、光、电磁、红外线、或半导体的系统、装置或器件,或者任意以上的组合。计算机可读存储介质的更具体的例子可以包括但不限于:具有一个或多个导线的电连接、便携式计算机磁盘、硬盘、随机访问存储器(RAM)、只读存储器(ROM)、可擦式可编程只读存储器(EPROM或闪存)、光纤、便携式紧凑磁盘只读存储器(CD-ROM)、光存储器件、磁存储器件、或者上述的任意合适的组合。在本公开中,计算机可读 存储介质可以是任何包含或存储程序的有形介质,该程序可以被指令执行系统、装置或者器件使用或者与其结合使用。而在本公开中,计算机可读的信号介质可以包括在基带中或者作为载波一部分传播的数据信号,其中承载了计算机可读的程序代码。这种传播的数据信号可以采用多种形式,包括但不限于电磁信号、光信号或上述的任意合适的组合。计算机可读的信号介质还可以是计算机可读存储介质以外的任何计算机可读介质,该计算机可读介质可以发送、传播或者传输用于由指令执行系统、装置或者器件使用或者与其结合使用的程序。计算机可读介质上包含的程序代码可以用任何适当的介质传输,包括但不限于:无线、电线、光缆、RF等等,或者上述的任意合适的组合。It should be noted that the computer-readable medium shown in the present disclosure may be a computer-readable signal medium or a computer-readable storage medium, or any combination of the above two. The computer-readable storage medium may be, for example, but is not limited to, an electrical, magnetic, optical, electromagnetic, infrared, or semiconductor system, apparatus or device, or any combination thereof. More specific examples of computer readable storage media may include, but are not limited to: an electrical connection having one or more wires, a portable computer disk, a hard drive, random access memory (RAM), read only memory (ROM), removable Programmed read-only memory (EPROM or flash memory), fiber optics, portable compact disk read-only memory (CD-ROM), optical storage device, magnetic storage device, or any suitable combination of the above. In this disclosure, computer readable A storage medium may be any tangible medium that contains or stores a program for use by or in connection with an instruction execution system, apparatus, or device. In the present disclosure, a computer-readable signal medium may include a data signal propagated in baseband or as part of a carrier wave, carrying computer-readable program code therein. Such propagated data signals may take many forms, including but not limited to electromagnetic signals, optical signals, or any suitable combination of the above. A computer-readable signal medium may also be any computer-readable medium other than a computer-readable storage medium that can send, propagate, or transmit a program for use by or in connection with an instruction execution system, apparatus, or device . Program code embodied on a computer-readable medium may be transmitted using any suitable medium, including but not limited to: wireless, wire, optical cable, RF, etc., or any suitable combination of the foregoing.
附图中的流程图和框图,图示了按照本公开各种实施例的系统、方法和计算机程序产品的可能实现的体系架构、功能和操作。在这点上,流程图或框图中的每个方框可以代表一个模块、程序段、或代码的一部分,前述模块、程序段、或代码的一部分包含一个或多个用于实现规定的逻辑功能的可执行指令。也应当注意,在有些作为替换的实现中,方框中所标注的功能也可以以不同于附图中所标注的顺序发生。例如,两个接连地表示的方框实际上可以基本并行地执行,它们有时也可以按相反的顺序执行,这依所涉及的功能而定。也要注意的是,框图和/或流程图中的每个方框、以及框图和/或流程图中的方框的组合,可以用执行规定的功能或操作的专用的基于硬件的系统来实现,或者可以用专用硬件与计算机指令的组合来实现。The flowcharts and block diagrams in the figures illustrate the architecture, functionality, and operations of possible implementations of systems, methods, and computer program products according to various embodiments of the present disclosure. In this regard, each block in the flowchart or block diagrams may represent a module, segment, or portion of code that contains one or more components that implement the specified logical function(s). executable instructions. It should also be noted that, in some alternative implementations, the functions noted in the block may occur out of the order noted in the figures. For example, two blocks shown one after another may actually execute substantially in parallel, or they may sometimes execute in the reverse order, depending on the functionality involved. It will also be noted that each block of the block diagram and/or flowchart illustration, and combinations of blocks in the block diagram and/or flowchart illustration, can be implemented by special purpose hardware-based systems that perform the specified functions or operations. , or can be implemented using a combination of specialized hardware and computer instructions.
本说明书中的各个实施例均采用递进的方式描述,每个实施例重点说明的都是与其他实施例的不同之处,各个实施例之间相同相似的部分互相参见即可。Each embodiment in this specification is described in a progressive manner. Each embodiment focuses on its differences from other embodiments. The same and similar parts between the various embodiments can be referred to each other.
本领域内的技术人员应明白,本发明实施例的实施例可提供为方法、装置、或计算机程序产品。因此,本发明实施例可采用完全硬件实施例、完全 软件实施例、或结合软件和硬件方面的实施例的形式。而且,本发明实施例可采用在一个或多个其中包含有计算机可用程序代码的计算机可用存储介质(包括但不限于磁盘存储器、CD-ROM、光学存储器等)上实施的计算机程序产品的形式。It should be understood by those skilled in the art that embodiments of the present invention may be provided as methods, devices, or computer program products. Therefore, embodiments of the present invention may adopt completely hardware embodiments, completely In the form of a software embodiment, or an embodiment combining software and hardware aspects. Furthermore, embodiments of the invention may take the form of a computer program product embodied on one or more computer-usable storage media (including, but not limited to, disk storage, CD-ROM, optical storage, etc.) having computer-usable program code embodied therein.
本发明实施例是参照根据本发明实施例的方法、终端设备(系统)、和计算机程序产品的流程图和/或方框图来描述的。应理解可由计算机程序指令实现流程图和/或方框图中的每一流程和/或方框、以及流程图和/或方框图中的流程和/或方框的结合。可提供这些计算机程序指令到通用计算机、专用计算机、嵌入式处理机或其他可编程数据处理终端设备的处理器以产生一个机器,使得通过计算机或其他可编程数据处理终端设备的处理器执行的指令产生用于实现在流程图一个流程或多个流程和/或方框图一个方框或多个方框中指定的功能的装置。Embodiments of the invention are described with reference to flowcharts and/or block diagrams of methods, terminal devices (systems), and computer program products according to embodiments of the invention. It will be understood that each process and/or block in the flowchart illustrations and/or block diagrams, and combinations of processes and/or blocks in the flowchart illustrations and/or block diagrams, can be implemented by computer program instructions. These computer program instructions may be provided to a processor of a general-purpose computer, special-purpose computer, embedded processor, or other programmable data processing terminal device to produce a machine such that the instructions are executed by the processor of the computer or other programmable data processing terminal device. Means are generated for implementing the functions specified in the process or processes of the flowchart diagrams and/or the block or blocks of the block diagrams.
这些计算机程序指令也可存储在能引导计算机或其他可编程数据处理终端设备以特定方式工作的计算机可读存储器中,使得存储在该计算机可读存储器中的指令产生包括指令装置的制造品,该指令装置实现在流程图一个流程或多个流程和/或方框图一个方框或多个方框中指定的功能。These computer program instructions may also be stored in a computer-readable memory that causes a computer or other programmable data processing terminal equipment to operate in a particular manner, such that the instructions stored in the computer-readable memory produce an article of manufacture including the instruction means, the The instruction means implements the functions specified in a process or processes of the flowchart and/or a block or blocks of the block diagram.
这些计算机程序指令也可装载到计算机或其他可编程数据处理终端设备上,使得在计算机或其他可编程终端设备上执行一系列操作步骤以产生计算机实现的处理,从而在计算机或其他可编程终端设备上执行的指令提供用于实现在流程图一个流程或多个流程和/或方框图一个方框或多个方框中指定的功能的步骤。These computer program instructions can also be loaded onto a computer or other programmable data processing terminal equipment, so that a series of operating steps are performed on the computer or other programmable terminal equipment to produce computer-implemented processing, thereby causing the computer or other programmable terminal equipment to perform a computer-implemented process. The instructions executed on provide steps for implementing the functions specified in a process or processes of the flow diagrams and/or a block or blocks of the block diagrams.
尽管已描述了本发明实施例的优选实施例,但本领域内的技术人员一旦得知了基本创造性概念,则可对这些实施例做出另外的变更和修改。所以,所附权利要求意欲解释为包括优选实施例以及落入本发明实施例范围的所有变更和修改。 Although preferred embodiments of the embodiments of the present invention have been described, those skilled in the art will be able to make additional changes and modifications to these embodiments once the basic inventive concepts are apparent. Therefore, it is intended that the appended claims be construed to include the preferred embodiments and all changes and modifications that fall within the scope of embodiments of the invention.
最后,还需要说明的是,在本文中,诸如第一和第二等之类的关系术语仅仅用来将一个实体或者操作与另一个实体或操作区分开来,而不一定要求或者暗示这些实体或操作之间存在任何这种实际的关系或者顺序。而且,术语“包括”、“包含”或者其任何其他变体意在涵盖非排他性的包含,从而使得包括一系列要素的过程、方法、物品或者终端设备不仅包括那些要素,而且还包括没有明确列出的其他要素,或者是还包括为这种过程、方法、物品或者终端设备所固有的要素。在没有更多限制的情况下,由语句“包括一个……”限定的要素,并不排除在包括要素的过程、方法、物品或者终端设备中还存在另外的相同要素。Finally, it should be noted that in this article, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply that these entities or any such actual relationship or sequence between operations. Furthermore, the terms "comprises," "comprises," or any other variation thereof are intended to cover a non-exclusive inclusion such that a process, method, article, or end device that includes a list of elements includes not only those elements, but also elements not expressly listed or other elements inherent to such process, method, article or terminal equipment. Without further limitation, an element defined by the statement "comprises a..." does not exclude the presence of additional identical elements in the process, method, article, or terminal device that includes the element.
以上对本发明所提供的一种特种气体安全控制方法和一种半导体工艺设备,进行了详细介绍,本文中应用了具体个例对本发明的原理及实施方式进行了阐述,以上实施例的说明只是用于帮助理解本发明的方法及其核心思想;同时,对于本领域的一般技术人员,依据本发明的思想,在具体实施方式及应用范围上均会有改变之处,综上,本说明书内容不应理解为对本发明的限制。 The above is a detailed introduction to a special gas safety control method and a semiconductor process equipment provided by the present invention. Specific examples are used in this article to illustrate the principles and implementation modes of the present invention. The description of the above embodiments is only for reference. To help understand the method and its core idea of the present invention; at the same time, for those of ordinary skill in the art, there will be changes in the specific implementation and application scope based on the idea of the present invention. In summary, the content of this specification does not It should be understood as a limitation of the invention.

Claims (14)

  1. 一种特种气体安全控制方法,其特征在于,应用于半导体工艺设备,所述半导体工艺设备包括:工艺腔室和控制电路;所述控制电路包括用于控制第一气体对应阀门通断的第一电路、用于控制第二气体对应阀门通断的第二电路和用于控制第三气体对应阀门通断的第三电路,所述方法包括:A special gas safety control method, characterized in that it is applied to semiconductor process equipment. The semiconductor process equipment includes: a process chamber and a control circuit; the control circuit includes a first valve for controlling the on-off of the corresponding valve of the first gas. circuit, a second circuit for controlling the on-off of the valve corresponding to the second gas, and a third circuit for controlling the on-off of the valve corresponding to the third gas. The method includes:
    获取所述工艺腔室的压力值;Obtain the pressure value of the process chamber;
    在所述压力值大于预设压力阈值的情况下,当需要打开所述第二气体对应阀门和所述第三气体对应阀门时,控制所述第一电路断开,以及控制所述第二电路和所述第三电路接通,以使所述第一气体对应阀门关闭、所述第二气体对应阀门和所述第三气体对应阀门打开;When the pressure value is greater than the preset pressure threshold, when the second gas corresponding valve and the third gas corresponding valve need to be opened, the first circuit is controlled to be disconnected, and the second circuit is controlled to be opened. Connect with the third circuit to close the first gas corresponding valve and open the second gas corresponding valve and the third gas corresponding valve;
    当需要打开所述第一气体对应阀门时,控制所述第一电路接通,以及控制所述第二电路和所述第三电路断开,以使所述第一气体对应阀门打开、所述第二气体对应阀门和所述第三气体对应阀门关闭。When it is necessary to open the first gas corresponding valve, the first circuit is controlled to be turned on, and the second circuit and the third circuit are controlled to be turned off, so that the first gas corresponding valve is opened and the The second gas corresponding valve and the third gas corresponding valve are closed.
  2. 根据权利要求1所述的方法,其特征在于,还包括:The method according to claim 1, further comprising:
    在所述压力值小于或等于所述预设压力阈值的情况下,控制所述第一电路、所述第二电路和所述第三电路接通,以使所述第一气体对应阀门、所述第二气体对应阀门和所述第三气体对应阀门打开。When the pressure value is less than or equal to the preset pressure threshold, the first circuit, the second circuit and the third circuit are controlled to be turned on so that the first gas corresponds to the valve, the The second gas corresponding valve and the third gas corresponding valve are opened.
  3. 根据权利要求2所述的方法,其特征在于,所述控制电路还包括:第一继电器、第二继电器和第三继电器,所述方法还包括:The method according to claim 2, wherein the control circuit further includes: a first relay, a second relay and a third relay, and the method further includes:
    在所述压力值大于所述预设压力阈值的情况下,通过所述第一继电器控制所述第二继电器接通以及所述第三继电器断开,以使所述第二继电器控制所述第一电路、所述第二电路和所述第三电路的通断;When the pressure value is greater than the preset pressure threshold, the second relay is controlled to be turned on and the third relay to be turned off through the first relay, so that the second relay controls the third relay. On and off of a circuit, the second circuit and the third circuit;
    在所述压力值小于或等于所述预设压力阈值的情况下,通过所述第一继电器控制所述第二继电器断开以及所述第三继电器接通,以使所述第三继电 器控制所述第一电路、所述第二电路和所述第三电路的通断。When the pressure value is less than or equal to the preset pressure threshold, the first relay is used to control the second relay to turn off and the third relay to turn on, so that the third relay The controller controls the on/off of the first circuit, the second circuit and the third circuit.
  4. 根据权利要求3所述的方法,其特征在于,所述第一继电器包括第一对常闭触点和第一对常开触点;The method of claim 3, wherein the first relay includes a first pair of normally closed contacts and a first pair of normally open contacts;
    所述在所述压力值大于预设压力阈值的情况下,通过所述第一继电器控制所述第二继电器接通以及所述第三继电器断开,以使所述第二继电器控制所述第一电路、所述第二电路和所述第三电路的通断,包括:When the pressure value is greater than the preset pressure threshold, the first relay is used to control the second relay to be turned on and the third relay to be turned off, so that the second relay controls the third relay. The switching of a circuit, the second circuit and the third circuit includes:
    在所述压力值大于所述预设压力阈值的情况下,通过所述第一继电器控制所述第一对常开触点保持断开状态,以控制所述第三继电器断开,以及通过所述第一继电器控制所述第一对常闭触点保持闭合状态,以控制所述第二继电器接通,以使所述第二继电器控制所述第一电路、所述第二电路和所述第三电路的通断。When the pressure value is greater than the preset pressure threshold, the first pair of normally open contacts is controlled by the first relay to remain in an open state, so as to control the third relay to open, and through the The first relay controls the first pair of normally closed contacts to remain in a closed state to control the second relay to turn on, so that the second relay controls the first circuit, the second circuit and the The third circuit is switched on and off.
  5. 根据权利要求4所述的方法,其特征在于,所述第二继电器包括第二对常闭触点、第二对常开触点和第三对常开触点;The method of claim 4, wherein the second relay includes a second pair of normally closed contacts, a second pair of normally open contacts, and a third pair of normally open contacts;
    所述在所述压力值大于预设压力阈值的情况下,当需要打开所述第二气体对应阀门和所述第三气体对应阀门时,控制所述第一电路断开,以及控制所述第二电路和所述第三电路接通,以使所述第一气体对应阀门关闭、所述第二气体对应阀门和所述第三气体对应阀门打开,包括:When the pressure value is greater than the preset pressure threshold, when the second gas corresponding valve and the third gas corresponding valve need to be opened, the first circuit is controlled to be disconnected, and the third gas corresponding valve is controlled to be opened. The second circuit and the third circuit are connected to close the first gas corresponding valve and open the second gas corresponding valve and the third gas corresponding valve, including:
    通过所述第二继电器控制所述第二对常闭触点断开,控制所述第一电路断开,以及通过所述第二继电器控制所述第二对常开触点和所述第三对常开触点闭合,分别控制所述第二电路和所述第三电路接通,以使所述第一气体对应阀门关闭、所述第二气体对应阀门和所述第三气体对应阀门打开。The second pair of normally closed contacts is controlled to open through the second relay, the first circuit is controlled to open, and the second pair of normally open contacts and the third pair of normally open contacts are controlled through the second relay. When the normally open contact is closed, the second circuit and the third circuit are respectively controlled to be connected, so that the first gas corresponding valve is closed, the second gas corresponding valve and the third gas corresponding valve are opened. .
  6. 根据权利要求5所述的方法,其特征在于,所述当需要打开所述第一气体对应阀门时,控制所述第一电路接通,以及控制所述第二电路和所述第三电路断开,以使所述第一气体对应阀门打开、所述第二气体对应阀门和 所述第三气体对应阀门关闭,包括:The method according to claim 5, characterized in that when the first gas corresponding valve needs to be opened, the first circuit is controlled to be turned on, and the second circuit and the third circuit are controlled to be turned off. open, so that the first gas corresponding valve opens, the second gas corresponding valve and The third gas corresponding valve is closed, including:
    通过所述第二继电器控制所述第二对常闭触点保持闭合状态,控制所述第一电路接通,以及通过所述第二继电器控制所述第二对常开触点和所述第三对常开触点保持断开状态,分别控制所述第二电路和所述第三电路断开,以使所述第一气体对应阀门打开、所述第二气体对应阀门和所述第三气体对应阀门关闭。The second pair of normally closed contacts is controlled to remain closed through the second relay, the first circuit is controlled to be turned on, and the second pair of normally open contacts and the third pair of normally open contacts are controlled through the second relay. Three pairs of normally open contacts remain in a disconnected state, respectively controlling the disconnection of the second circuit and the third circuit, so that the first gas corresponding valve opens, the second gas corresponding valve and the third gas corresponding valve open. The gas corresponding valve is closed.
  7. 根据权利要求4所述的方法,其特征在于,所述在所述压力值小于或等于所述预设压力阈值的情况下,通过所述第一继电器控制所述第二继电器断开以及所述第三继电器接通,以使所述第三继电器控制所述第一电路、所述第二电路和所述第三电路的通断,包括:The method of claim 4, wherein when the pressure value is less than or equal to the preset pressure threshold, the first relay is used to control the second relay to open and the The third relay is turned on, so that the third relay controls the on-off of the first circuit, the second circuit and the third circuit, including:
    在所述压力值小于或等于所述预设压力阈值的情况下,通过所述第一继电器控制所述第一对常闭触点打开,控制所述第二继电器断开,以及通过所述第一继电器控制所述第一对常开触点闭合,控制所述第三继电器接通,以使所述第三继电器控制所述第一电路、所述第二电路和所述第三电路的通断。When the pressure value is less than or equal to the preset pressure threshold, the first pair of normally closed contacts is controlled to open through the first relay, the second relay is controlled to open, and the first pair of normally closed contacts is controlled to open through the third relay. A relay controls the first pair of normally open contacts to close and controls the third relay to turn on, so that the third relay controls the conduction of the first circuit, the second circuit and the third circuit. Break.
  8. 根据权利要求7所述的方法,其特征在于,所述第三继电器包括第四对常开触点、第五对常开触点和第六对常开触点;The method of claim 7, wherein the third relay includes a fourth pair of normally open contacts, a fifth pair of normally open contacts, and a sixth pair of normally open contacts;
    所述在所述压力值小于或等于所述预设压力阈值的情况下,控制所述第一电路、所述第二电路和所述第三电路接通,以使所述第一气体对应阀门、所述第二气体对应阀门和所述第三气体对应阀门打开,包括:When the pressure value is less than or equal to the preset pressure threshold, the first circuit, the second circuit and the third circuit are controlled to be turned on so that the first gas corresponds to the valve , the second gas corresponding valve and the third gas corresponding valve are opened, including:
    通过所述第三继电器控制所述第四对常开触点、所述第五对常开触点和所述第六对常开触点闭合,控制所述第一电路、所述第二电路和所述第三电路接通,以使所述第一气体对应阀门、所述第二气体对应阀门和第三气体对应阀门打开。 The third relay controls the fourth pair of normally open contacts, the fifth pair of normally open contacts and the sixth pair of normally open contacts to close, and controls the first circuit and the second circuit and the third circuit to open the first gas corresponding valve, the second gas corresponding valve and the third gas corresponding valve.
  9. 根据权利要求1所述的方法,其特征在于,所述第一气体为NF3,所述第二气体为H2,所述第三气体为SiH4The method of claim 1, wherein the first gas is NF3 , the second gas is H2 , and the third gas is SiH4 .
  10. 一种控制电路,应用于半导体工艺设备,其特征在于,所述控制电路包括:包括用于控制第一气体对应阀门通断的第一电路、用于控制第二气体对应阀门通断的第二电路和用于控制第三气体对应阀门通断的第三电路,A control circuit applied to semiconductor process equipment, characterized in that the control circuit includes: a first circuit for controlling the on-off of the valve corresponding to the first gas, and a second circuit for controlling the on-off of the valve corresponding to the second gas. circuit and a third circuit used to control the on-off of the third gas corresponding valve,
    还包括第一继电器、第二继电器和第三继电器,在所述压力值大于所述预设压力阈值的情况下,所述第一继电器用于控制所述第二继电器接通以及所述第三继电器断开,以使所述第二继电器控制所述第一电路、所述第二电路和所述第三电路的通断;在所述压力值小于或等于所述预设压力阈值的情况下,所述第一继电器还用于控制所述第二继电器断开以及所述第三继电器接通,以使所述第三继电器控制所述第一电路、所述第二电路和所述第三电路的通断。It also includes a first relay, a second relay and a third relay. When the pressure value is greater than the preset pressure threshold, the first relay is used to control the second relay to turn on and the third relay to turn on. The relay is turned off, so that the second relay controls the on-off of the first circuit, the second circuit and the third circuit; when the pressure value is less than or equal to the preset pressure threshold , the first relay is also used to control the second relay to turn off and the third relay to turn on, so that the third relay controls the first circuit, the second circuit and the third The circuit is on and off.
  11. 根据权利要求10所述的控制电路,其特征在于,所述第一继电器包括第一对常闭触点和第一对常开触点;在所述压力值大于预设压力阈值的情况下,所述第一继电器用于控制所述第一对常开触点保持断开状态,控制所述第三继电器断开,以及通过所述第一继电器控制所述第一对常闭触点保持闭合状态,控制所述第二继电器接通,以使所述第二继电器控制所述第一电路、所述第二电路和所述第三电路的通断;和/或,The control circuit according to claim 10, wherein the first relay includes a first pair of normally closed contacts and a first pair of normally open contacts; when the pressure value is greater than a preset pressure threshold, The first relay is used to control the first pair of normally open contacts to remain open, control the third relay to open, and control the first pair of normally closed contacts to remain closed through the first relay. state, controlling the second relay to be turned on, so that the second relay controls the on/off of the first circuit, the second circuit and the third circuit; and/or,
    所述第二继电器包括第二对常闭触点、第二对常开触点和第三对常开触点;所述第二继电器用于控制所述第二对常闭触点断开,以控制所述第一电路断开,所述第二继电器还用于控制所述第二对常开触点和所述第三对常开触点闭合,以分别控制所述第二电路和所述第三电路接通,以使所述第一气体对应阀门关闭、所述第二气体对应阀门和所述第三气体对应阀门打开;;和/或,The second relay includes a second pair of normally closed contacts, a second pair of normally open contacts and a third pair of normally open contacts; the second relay is used to control the opening of the second pair of normally closed contacts, To control the opening of the first circuit, the second relay is also used to control the closing of the second pair of normally open contacts and the third pair of normally open contacts to respectively control the second circuit and the The third circuit is connected so that the first gas corresponding valve is closed, the second gas corresponding valve and the third gas corresponding valve are opened;; and/or,
    所述第三继电器包括第四对常开触点、第五对常开触点和第六对常开触 点;所述第三继电器用于控制所述第四对常开触点、所述第五对常开触点和所述第六对常开触点闭合,以控制所述第一电路、所述第二电路和所述第三电路接通,以使所述第一气体对应阀门、所述第二气体对应阀门和第三气体对应阀门打开。The third relay includes a fourth pair of normally open contacts, a fifth pair of normally open contacts and a sixth pair of normally open contacts. point; the third relay is used to control the closing of the fourth pair of normally open contacts, the fifth pair of normally open contacts and the sixth pair of normally open contacts to control the first circuit, the The second circuit and the third circuit are connected to open the first gas corresponding valve, the second gas corresponding valve and the third gas corresponding valve.
  12. 一种半导体工艺设备,其特征在于,所述半导体工艺设备包括:工艺腔室、控制电路;所述控制电路包括用于控制第一气体对应阀门通断的第一电路、用于控制第二气体对应阀门通断的第二电路和用于控制第三气体对应阀门通断的第三电路,所述半导体工艺设备还包括:A semiconductor process equipment, characterized in that the semiconductor process equipment includes: a process chamber and a control circuit; the control circuit includes a first circuit for controlling the on/off of a valve corresponding to the first gas, and a first circuit for controlling the second gas. A second circuit corresponding to the on-off valve and a third circuit for controlling the on-off corresponding valve of the third gas. The semiconductor process equipment also includes:
    控制器,用于获取所述工艺腔室的压力值;在所述压力值大于预设压力阈值的情况下,当需要打开所述第二气体对应阀门和所述第三气体对应阀门时,控制所述第一电路断开,以及控制所述第二电路和所述第三电路接通,以使所述第一气体对应阀门关闭、所述第二气体对应阀门和所述第三气体对应阀门打开;当需要打开所述第一气体对应阀门时,控制所述第一电路接通,以及控制所述第二电路和所述第三电路断开,以使所述第一气体对应阀门打开、所述第二气体对应阀门和所述第三气体对应阀门关闭。A controller, configured to obtain the pressure value of the process chamber; when the pressure value is greater than the preset pressure threshold, when it is necessary to open the second gas corresponding valve and the third gas corresponding valve, control The first circuit is disconnected, and the second circuit and the third circuit are controlled to be connected so that the first gas corresponding valve is closed, the second gas corresponding valve and the third gas corresponding valve are closed. Open; when it is necessary to open the first gas corresponding valve, control the first circuit to be turned on, and control the second circuit and the third circuit to be turned off, so that the first gas corresponding valve is opened, The second gas corresponding valve and the third gas corresponding valve are closed.
  13. 一种特种气体安全控制装置,其特征在于,用于对半导体工艺设备中的控制电路进行控制,所述特种气体安全控制装置包括至少一个处理器和至少一个存储器,所述存储器中存储有至少一个程序;A special gas safety control device, characterized in that it is used to control a control circuit in a semiconductor process equipment. The special gas safety control device includes at least one processor and at least one memory, and at least one memory is stored in the memory. program;
    当所述至少一个程序被所述至少一个处理器执行时,使得所述至少一个处理器实现如权利要求1-9中任意一项所述的方法。When the at least one program is executed by the at least one processor, the at least one processor is caused to implement the method according to any one of claims 1-9.
  14. 一种计算机可读存储介质,用于半导体加工设备,其上存储有计算机程序,其特征在于,所述程序被处理器执行时实现如权利要求1-9中任意一项所述的方法。 A computer-readable storage medium for semiconductor processing equipment, on which a computer program is stored, characterized in that when the program is executed by a processor, the method according to any one of claims 1-9 is implemented.
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Publication number Priority date Publication date Assignee Title
CN117305819A (en) * 2022-07-29 2023-12-29 北京北方华创微电子装备有限公司 Special gas safety control device

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1799129A (en) * 2003-11-11 2006-07-05 东京毅力科创株式会社 Method for processing substrate
CN1969060A (en) * 2004-04-30 2007-05-23 兰姆研究公司 Gas distribution system having fast gas switching capabilities
JP2011119433A (en) * 2009-12-03 2011-06-16 Renesas Electronics Corp Method for manufacturing semiconductor device
CN111593329A (en) * 2019-02-20 2020-08-28 Asm Ip私人控股有限公司 Cyclical deposition method comprising a processing step and device therefor
CN112695299A (en) * 2020-12-15 2021-04-23 长江先进存储产业创新中心有限责任公司 Deposition apparatus and method
CN115354312A (en) * 2022-07-29 2022-11-18 北京北方华创微电子装备有限公司 Special gas safety control method and semiconductor process equipment

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020160620A1 (en) * 2001-02-26 2002-10-31 Rudolf Wagner Method for producing coated workpieces, uses and installation for the method
US20070012402A1 (en) * 2003-07-08 2007-01-18 Sundew Technologies, Llc Apparatus and method for downstream pressure control and sub-atmospheric reactive gas abatement
JP4718141B2 (en) * 2004-08-06 2011-07-06 東京エレクトロン株式会社 Thin film forming method and thin film forming apparatus
JP5572447B2 (en) * 2010-05-25 2014-08-13 株式会社日立国際電気 Semiconductor device manufacturing method, substrate processing method, and substrate processing apparatus
TWI458843B (en) * 2011-10-06 2014-11-01 Ind Tech Res Inst Evaporation apparatus and method of forminf organic film
CN103670707B (en) * 2012-09-18 2016-01-13 广西玉柴机器股份有限公司 Anti-cracking gas handling system and apply the anti-cracking air inlet method of this system
CN105156885A (en) * 2015-09-16 2015-12-16 四川菲博斯科技有限责任公司 SF6 gas charging unit of SF6 electrical device
CN105299445A (en) * 2015-09-16 2016-02-03 四川菲博斯科技有限责任公司 Intelligent SF6 inflation device of electric equipment
CN105552001B (en) * 2015-12-10 2018-06-15 武汉华星光电技术有限公司 A kind of vacuum system
CN107068587B (en) * 2016-10-28 2019-10-25 北京北方华创微电子装备有限公司 The control pressurer system and compress control method of reaction chamber
CN109097755A (en) * 2017-06-20 2018-12-28 华邦电子股份有限公司 Processing chamber gas detecting system and its operating method
JP6613276B2 (en) * 2017-09-22 2019-11-27 株式会社Kokusai Electric Semiconductor device manufacturing method, program, recording medium, and substrate processing apparatus
CN113699590B (en) * 2021-08-27 2022-06-17 北京北方华创微电子装备有限公司 Semiconductor heat treatment equipment and control method of pressure in process chamber thereof
CN114060723A (en) * 2021-11-18 2022-02-18 季华实验室 Safety protection pressure relief system for epitaxial process equipment and epitaxial process equipment

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1799129A (en) * 2003-11-11 2006-07-05 东京毅力科创株式会社 Method for processing substrate
CN1969060A (en) * 2004-04-30 2007-05-23 兰姆研究公司 Gas distribution system having fast gas switching capabilities
JP2011119433A (en) * 2009-12-03 2011-06-16 Renesas Electronics Corp Method for manufacturing semiconductor device
CN111593329A (en) * 2019-02-20 2020-08-28 Asm Ip私人控股有限公司 Cyclical deposition method comprising a processing step and device therefor
CN112695299A (en) * 2020-12-15 2021-04-23 长江先进存储产业创新中心有限责任公司 Deposition apparatus and method
CN115354312A (en) * 2022-07-29 2022-11-18 北京北方华创微电子装备有限公司 Special gas safety control method and semiconductor process equipment

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