WO2023223829A1 - Semiconductor device - Google Patents

Semiconductor device Download PDF

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Publication number
WO2023223829A1
WO2023223829A1 PCT/JP2023/017093 JP2023017093W WO2023223829A1 WO 2023223829 A1 WO2023223829 A1 WO 2023223829A1 JP 2023017093 W JP2023017093 W JP 2023017093W WO 2023223829 A1 WO2023223829 A1 WO 2023223829A1
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WIPO (PCT)
Prior art keywords
switching element
arm
main surface
electrode
semiconductor device
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PCT/JP2023/017093
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French (fr)
Japanese (ja)
Inventor
尚弘 小谷
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ローム株式会社
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Publication of WO2023223829A1 publication Critical patent/WO2023223829A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/07Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00

Definitions

  • the present disclosure relates to a semiconductor device.
  • Patent Document 1 discloses an example of a conventional semiconductor device.
  • the semiconductor device described in Patent Document 1 is an intelligent power module (hereinafter referred to as "IPM") used for drive control of a motor, for example.
  • the semiconductor device includes a power semiconductor chip as the switching element.
  • the power semiconductor chip is an IGBT, a MOSFET, or the like.
  • one switching element is sometimes connected to another switching element in parallel, and these switching elements are operated as one switch section. For example, switching is performed by connecting multiple switching elements in parallel for the purpose of ensuring the permissible current of a semiconductor device, suppressing the voltage and current input to a switching element, or suppressing power loss.
  • switching is performed by connecting multiple switching elements in parallel for the purpose of ensuring the permissible current of a semiconductor device, suppressing the voltage and current input to a switching element, or suppressing power loss.
  • An object of the present disclosure is to provide a semiconductor device that is improved over the conventional semiconductor device.
  • an object of the present disclosure is to provide a semiconductor device having a more preferable structure in a configuration in which a plurality of switching elements connected in parallel operate as one switch section.
  • a semiconductor device provided by one aspect of the present disclosure includes at least one first switch section each including a first switching element and a second switching element; A first control element that inputs a drive signal, a mounting part on which the first switching element and the second switching element are mounted, and a plurality of wires including a first wire, a second wire, and a third wire. .
  • the first switching element and the second switching element are electrically connected in parallel, and the first switching element connects one side of the mounting section in the thickness direction.
  • a first control electrode disposed on the first main surface; It has a second control electrode arranged on the surface and a main surface wiring section. The first wire is connected to the first control element and the main surface wiring section.
  • the second wire is connected to the main surface wiring section and the first control electrode.
  • the third wire is connected to the first control element and the second control electrode.
  • the first control element is arranged on one side of the first switching element and the second switching element in a first direction perpendicular to the thickness direction.
  • the second switching element is arranged between the first control element and the first switching element in the first direction.
  • FIG. 1 is a perspective view showing a semiconductor device according to a first embodiment.
  • FIG. 2 is a plan view showing the semiconductor device according to the first embodiment.
  • FIG. 3 is a diagram showing the sealing member in imaginary lines in the plan view of FIG. 2.
  • FIG. 4 is a partially enlarged view of FIG. 3.
  • FIG. 5 is a partially enlarged view of FIG. 4.
  • FIG. 6 is a partially enlarged view of FIG. 3.
  • FIG. 7 is a partially enlarged view of FIG. 6.
  • FIG. 8 is a front view showing the semiconductor device according to the first embodiment.
  • FIG. 9 is a side view (right side view) showing the semiconductor device according to the first embodiment.
  • FIG. 10 is a sectional view taken along line XX in FIG. 3.
  • FIG. 10 is a sectional view taken along line XX in FIG. 3.
  • FIG. 11 is a cross-sectional view taken along line XI-XI in FIG. 3.
  • FIG. 12 is a sectional view taken along line XII-XII in FIG. 3.
  • FIG. 13 is a cross-sectional view taken along line XIII-XIII in FIG.
  • FIG. 14 is a diagram showing an example of the circuit configuration of the semiconductor device according to the first embodiment.
  • FIG. 15 is a plan view showing the semiconductor device according to the second embodiment, in which the sealing member is shown with imaginary lines.
  • FIG. 16 is a partially enlarged view of FIG. 15.
  • FIG. 17 is a partially enlarged view of FIG. 15.
  • FIG. 18 is a cross-sectional view taken along line XVIII-XVIII in FIG. 15.
  • FIG. 16 is a partially enlarged view of FIG. 15.
  • FIG. 17 is a partially enlarged view of FIG. 15.
  • FIG. 18 is a cross-sectional view taken along line XVIII-XVIII in FIG. 15.
  • FIG. 19 is a cross-sectional view taken along line XIX-XIX in FIG. 15.
  • FIG. 20 is a cross-sectional view showing a semiconductor device according to a modification of the second embodiment.
  • FIG. 21 is an enlarged plan view of main parts showing a semiconductor device according to a third embodiment.
  • FIG. 22 is an enlarged plan view of a main part of a semiconductor device according to a third embodiment.
  • FIG. 23 is an enlarged plan view of a main part of a semiconductor device according to a modification of the third embodiment.
  • FIG. 24 is a plan view showing the semiconductor device according to the fourth embodiment, in which the sealing member is shown with imaginary lines.
  • FIG. 25 is a partially enlarged view of FIG. 24.
  • FIG. 26 is a partially enlarged view of FIG. 24.
  • FIG. 25 is a partially enlarged view of FIG. 24.
  • FIG. 27 is a diagram showing an example of the circuit configuration of the semiconductor device according to the fourth embodiment.
  • FIG. 28 is an enlarged plan view of main parts showing another example of the configuration of the main surface wiring section.
  • FIG. 29 is an enlarged plan view of main parts showing another example of the configuration of the main surface wiring section.
  • FIG. 30 is an enlarged plan view of main parts showing another example of the configuration of the main surface wiring section.
  • FIG. 31 is an enlarged plan view of main parts showing another example of the configuration of the main surface wiring section.
  • FIG. 32 is an enlarged plan view of main parts showing another example of the configuration of the main surface wiring section.
  • FIG. 33 is an enlarged plan view of main parts showing another example of the configuration of the main surface wiring section.
  • FIG. 34 is an enlarged plan view of main parts showing another example of the configuration of the main surface wiring section.
  • a thing A is formed on a thing B" and "a thing A is formed on a thing B” mean “a thing A is formed on a thing B" unless otherwise specified.
  • A is formed directly on something B
  • a thing A is formed on something B, with another thing interposed between them.” including.
  • "a certain thing A is placed on a certain thing B” and "a certain thing A is placed on a certain thing B” are used as "a certain thing A is placed on a certain thing B” unless otherwise specified.
  • ⁇ It is placed directly on something B,'' and ⁇ A thing A is placed on something B, with another thing interposed between them.'' include.
  • an object A is located on an object B
  • an object A is in contact with an object B, and an object A is located on an object B.
  • an object A overlaps an object B when viewed in a certain direction means, unless otherwise specified, “an object A overlaps all of an object B” and "a certain object A overlaps an object B”. This includes "overlapping a part of something B.”
  • the semiconductor device A1 includes a plurality of first switch sections 1, a plurality of second switch sections 2, a plurality of leads 3A to 3G, 3Z, a plurality of leads 4A to 4H, 4J to 4N, 4P to 4R, a support substrate 51, and a plurality of The connecting member 6, the sealing member 7, the first control element 8A, the second control element 8B, and a plurality of electronic components 89U, 89V, 89W, etc. are provided.
  • the plurality of connection members 6 include a plurality of wires 6A to 6F, 6H, 6J to 6L, 61G, 61Q, 62G, and 62Q.
  • the application of the semiconductor device A1 is not particularly limited, it is configured as an IPM used for, for example, drive control of a motor.
  • the z direction is the thickness direction of the semiconductor device A1.
  • one direction in the z direction is sometimes referred to as upper and the other is referred to as lower.
  • descriptions such as “upper”, “lower”, “upper”, “lower”, “upper surface”, and “lower surface” indicate the relative positional relationship of each component etc. in the z direction, and do not necessarily refer to the direction of gravity. It is not a term that defines the relationship between Moreover, “planar view” refers to when viewed in the z direction.
  • the x direction is the left-right direction in the plan view of the semiconductor device A1 (see FIGS. 2 and 3).
  • the y direction is the vertical direction in the plan view of the semiconductor device A1 (see FIGS. 2 and 3).
  • the x direction is an example of the "second direction” described in the claims
  • the y direction is an example of the "first direction” described in the claims.
  • one side in the x direction is referred to as the x1 side in the x direction
  • the other side in the x direction is referred to as the x2 side in the x direction.
  • one side in the y direction is referred to as the y1 side in the y direction
  • the other side in the y direction is referred to as the y2 side in the y direction.
  • one side in the z direction is referred to as a z1 side in the z direction
  • the other side in the z direction is referred to as a z2 side in the z direction.
  • the plurality of first switch sections 1 and the plurality of second switch sections 2 are elements that perform the electrical functions of the semiconductor device A1.
  • a three-phase AC inverter circuit is configured by a plurality of first switch sections 1 and a plurality of second switch sections 2.
  • the plurality of first switch sections 1 include a first arm 1A, a second arm 1B, and a third arm 1C, as shown in FIGS. 3, 4, and 14. As shown in FIG. 4, the first arm 1A, the second arm 1B, and the third arm 1C are arranged along the x direction.
  • the second arm 1B includes each of a plurality of first switch parts 1 (first arm 1A, second arm 1B, and third arm 1C) located between the first arm 1A and the third arm 1C in the x direction. is switched between an on state and an off state according to the first drive signal from the first control element 8A.
  • Each of the plurality of first switch sections 1 has a switching element 11, a switching element 12, and a protection element 13.
  • the switching elements 11 of the first arm 1A, the second arm 1B, and the third arm 1C are respectively referred to as a switching element 11A, a switching element 11B, and a switching element 11C.
  • the switching elements 12 of the first arm 1A, the second arm 1B, and the third arm 1C are respectively referred to as a switching element 12A, a switching element 12B, and a switching element 12C.
  • the protection elements 13 of the arm 1C are respectively referred to as a protection element 13A, a protection element 13B, and a protection element 13C.
  • the switching element 11, switching element 12, and protection element 13 described below are common to each first switch section 1 (each of the first arm 1A, second arm 1B, and third arm 1C) unless otherwise specified. do.
  • Each of the switching element 11 and the switching element 12 is a power semiconductor element and has a switching function section.
  • the switching element 11 and the switching element 12 are each one of, for example, an IGBT, a bipolar transistor, a MOSFET, and a HEMT (High Electron Mobility Transistor).
  • the switching element 11 and the switching element 12 are different in type from each other.
  • the types of switching elements in the present disclosure are classified according to their structure, such as IGBTs, bipolar transistors, MOSFETs, and HEMTs. As shown in FIG. 14, in the semiconductor device A1, the switching element 11 is an IGBT, and the switching element 12 is a MOSFET.
  • the switching element 11 may be a MOSFET, and the switching element 12 may be an IGBT.
  • Switching element 11 and switching element 12 are each configured to include a semiconductor material.
  • the semiconductor material for example, SiC (silicon carbide), Si (silicon), GaAs (gallium arsenide), or GaN (gallium nitride) is used.
  • the switching element 11 contains Si as a semiconductor material
  • the switching element 12 contains SiC as a semiconductor material.
  • switching element 11 may contain SiC as a semiconductor material
  • switching element 12 may contain Si as a semiconductor material
  • both switching element 11 and switching element 12 may contain SiC or Si as a semiconductor material. It may contain either.
  • the switching element 11 is an example of a "first switching element" as set forth in the claims
  • the switching element 12 is an example of a "second switching element” as set forth in the claims. .
  • the switching element 11 has an element main surface 11a and an element back surface 11b, as shown in FIGS. 10 and 12.
  • the element main surface 11a and the element back surface 11b are spaced apart in the z direction.
  • the element main surface 11a faces upward in the z direction (z1 side in the z direction), and the element back surface 11b faces downward in the z direction (z2 side in the z direction).
  • the element main surface 11a and the element back surface 11b are each flat (including the case where they are substantially flat).
  • the switching element 11 has three electrodes 111, 112, and 113.
  • the electrode 111 is provided on the back surface 11b of the element, and the electrodes 112 and 113 are provided on the main surface 11a of the element.
  • the three electrodes 111, 112, 113 are electrically connected to the switching function section of the switching element 11, respectively.
  • switching element 11 is an IGBT
  • electrode 111 is a collector
  • electrode 112 is an emitter
  • electrode 113 is a gate.
  • the switching element 11 performs a switching operation according to a drive signal (first drive signal) input to the electrode 113.
  • the switching operation is an operation in which an on state in which current flows between the two electrodes 111 and 112 and an off state in which no current flows between the two electrodes 111 and 112 are switched.
  • a forward current flows from the electrode 111 to the electrode 112.
  • the electrode 113 is an example of a "first control electrode" described in the claims.
  • the switching element 12 has an element main surface 12a and an element back surface 12b, as shown in FIGS. 11 and 12.
  • the element main surface 12a and the element back surface 12b are spaced apart in the z direction.
  • the element main surface 12a faces upward in the z direction (z1 side in the z direction), and the element back surface 12b faces downward in the z direction (z2 side in the z direction).
  • the element main surface 12a and the element back surface 12b are each flat (including the case where they are substantially flat).
  • the switching element 12 has three electrodes 121, 122, 123.
  • the electrode 121 is provided on the back surface 12b of the element, and the electrodes 122 and 123 are provided on the main surface 12a of the element.
  • the three electrodes 121, 122, 123 are electrically connected to the switching function section of the switching element 12, respectively.
  • electrode 121 is a drain
  • electrode 122 is a source
  • electrode 123 is a gate.
  • the switching element 12 performs a switching operation in response to a drive signal (first drive signal) input to the electrode 123.
  • the switching operation is an operation in which an on state in which current flows between the two electrodes 121 and 122 and an off state in which no current flows between the two electrodes 121 and 122 are switched.
  • a forward current flows from the electrode 121 to the electrode 122.
  • the electrode 123 is an example of a "second control electrode" described in the claims.
  • the switching element 12 has a main surface wiring section 125.
  • the main surface wiring section 125 like the electrode 123, is provided on the element main surface 12a.
  • the main surface wiring section 125 is not electrically connected to the switching function section of the switching element 12 .
  • main surface wiring section 125 has a rectangular shape in plan view. Further, the main surface wiring section 125 is located on the y1 side in the y direction from the center in the y direction on the element main surface 12a.
  • the main surface wiring section 125 includes a first pad section 125a, a second pad section 125b, and a connecting section 125c.
  • the first pad portion 125a is a portion to which a wire 61G, which will be described later, is bonded.
  • the second pad portion 125b is a portion to which a wire 62G, which will be described later, is bonded.
  • the first pad section 125a and the second pad section 125b are arranged along the y direction in plan view.
  • the first pad portion 125a is located closer to the y1 side in the y direction than the second pad portion 125b.
  • the first pad section 125a is located closer to the first control element 8A than the second pad section 125b in the y direction.
  • the dimension of the first pad section 125a in the x direction and the dimension of the second pad section 125b in the x direction are the same (or substantially the same).
  • the connecting portion 125c connects the first pad portion 125a and the second pad portion 125b.
  • the dimension of the connecting portion 125c in the x direction is the same (or approximately the same) as each dimension of the first pad portion 125a and the second pad portion 125b in the x direction.
  • each first switch section 1 (each of the first arm 1A, second arm 1B, and third arm 1C), the switching element 11 and the switching element 12 are electrically connected in parallel. Specifically, electrode 111 (collector) and electrode 121 (drain) are electrically connected, and electrode 112 (emitter) and electrode 122 (source) are electrically connected.
  • the protection element 13 includes a diode function section.
  • the diode function section operates as a freewheeling diode.
  • the protection element 13 is, for example, a Schottky barrier diode, but may be another type of diode.
  • the protection element 13 has an element main surface 13a and an element back surface 13b.
  • the element main surface 13a and the element back surface 13b are spaced apart in the z direction.
  • the element main surface 13a faces upward in the z direction (z1 side in the z direction), and the element back surface 13b faces downward in the z direction (z2 side in the z direction).
  • the element main surface 13a and the element back surface 13b are each flat (including the case where they are substantially flat).
  • the protection element 13 includes two electrodes 131 and 132, as shown in FIG.
  • the electrode 131 is formed on the main surface 13a of the element, and the electrode 132 is formed on the back surface 13b of the element.
  • the electrode 131 is an anode and the electrode 132 is a cathode.
  • each first switch section 1 (each of the first arm 1A, second arm 1B, and third arm 1C), the protection element 13 is connected in antiparallel to the switching element 11 and the switching element 12.
  • Antiparallel means a state in which the forward currents of the switching elements 11 and 12 and the forward currents of the protection element 13 are connected in parallel so that they are in opposite directions.
  • the electrode 131 (anode) of the protection element 13 is connected to the electrode 112 (emitter) of the switching element 11 and the electrode 122 (source) of the switching element 12, and the electrode 132 (cathode) of the protection element 13 is connected to the electrode 112 (emitter) of the switching element 11 and the electrode 122 (source) of the switching element 12.
  • switching element 11A, switching element 12A, and protection element 13A are each bonded to lead 3B via conductive bonding material 19.
  • Switching element 11B, switching element 12B, and protection element 13B are each bonded to lead 3C via conductive bonding material 19.
  • the switching element 11C, the switching element 12C, and the protection element 13C are each bonded to the lead 3D via a conductive bonding material 19.
  • These conductive bonding materials 19 are, for example, solder, metal paste, or sintered metal.
  • each first switch section 1 (each of the first arm 1A, second arm 1B, and third arm 1C), the switching element 11, the switching element 12, and the protection element 13 are arranged in a line in the y direction.
  • the switching element 12, the switching element 11 , protection element 13 are arranged in this order. Therefore, the switching element 11 is located between the switching element 12 and the protection element 13 in the y direction.
  • the positions of the switching element 11 and the switching element 12 may be opposite. In this case, a main surface wiring section similar to the main surface wiring section 125 is formed in the switching element 11 .
  • the plurality of second switch sections 2 include a fourth arm 2A, a fifth arm 2B, and a sixth arm 2C. As shown in FIG. 6, the fourth arm 2A, the fifth arm 2B, and the sixth arm 2C are arranged along the x direction. The fifth arm 2B is located between the fourth arm 2A and the sixth arm 2C in the x direction. Each of the plurality of second switch sections 2 (fourth arm 2A, fifth arm 2B, and sixth arm 2C) is switched between an on state and an off state according to a second drive signal from a second control element 8B. .
  • the plurality of second switch parts 2 each have a switching element 21, a switching element 22, and a protection element 23.
  • the switching elements 11 of the fourth arm 2A, the fifth arm 2B, and the sixth arm 2C are respectively referred to as a switching element 21A, a switching element 21B, and a switching element 21C.
  • the switching elements 22 of the fourth arm 2A, the fifth arm 2B, and the sixth arm 2C are respectively referred to as a switching element 22A, a switching element 22B, and a switching element 22C.
  • the protection elements 23 of the arm 2C are respectively referred to as a protection element 23A, a protection element 23B, and a protection element 23C. This will be explained below.
  • the switching element 21, the switching element 22, and the protection element 23 are common to each second switch section 2 (fourth arm 2A, fifth arm 2B, and sixth arm 2C) unless otherwise specified.
  • the switching element 21 and the switching element 22 are each a power semiconductor element like the switching element 11 and the switching element 12, and each has a switching function section.
  • Each of the switching element 21 and the switching element 22 is, for example, an IGBT, a bipolar transistor, a MOSFET, a HEMT, or the like.
  • the switching element 21 and the switching element 22 are different types. As shown in FIG. 14, in the semiconductor device A1, the switching element 21 is an IGBT, and the switching element 22 is a MOSFET. Unlike this example, the switching element 21 may be a MOSFET, and the switching element 22 may be an IGBT. Switching element 21 and switching element 22 are each configured to include a semiconductor material.
  • the switching element 21 contains Si as a semiconductor material
  • the switching element 22 contains SiC as a semiconductor material
  • the switching element 21 may contain SiC as a semiconductor material
  • the switching element 22 may contain Si as a semiconductor material
  • both the switching element 21 and the switching element 22 may contain SiC or Si as a semiconductor material. It may contain either.
  • the switching element 21 is an example of a "third switching element” as set forth in the claims
  • the switching element 22 is an example of a "fourth switching element” as set forth in the claims. .
  • the switching element 21 has an element main surface 21a and an element back surface 21b.
  • the element main surface 21a and the element back surface 21b are spaced apart in the z direction.
  • the element main surface 21a faces upward in the z direction (z1 side in the z direction), and the element back surface 21b faces downward in the z direction (z2 side in the z direction).
  • the element main surface 21a and the element back surface 21b are each flat (including the case where they are substantially flat).
  • the switching element 21 has three electrodes 211, 212, and 213.
  • the electrode 211 is provided on the back surface 21b of the element, and the electrodes 212 and 213 are provided on the main surface 21a of the element.
  • the three electrodes 211, 212, 213 are electrically connected to the switching function section of the switching element 21, respectively.
  • switching element 21 is an IGBT
  • electrode 211 is a collector
  • electrode 212 is an emitter
  • electrode 213 is a gate.
  • the switching element 21 performs a switching operation in response to a drive signal (second drive signal) input to the electrode 213.
  • the switching operation is an operation in which an on state in which current flows between the two electrodes 211 and 212 and an off state in which no current flows between the two electrodes 211 and 212 are switched.
  • a forward current flows from the electrode 211 to the electrode 212.
  • the electrode 213 is an example of a "third control electrode" described in the claims.
  • the switching element 22 has an element main surface 22a and an element back surface 22b, as shown in FIGS. 11 and 13.
  • the element main surface 22a and the element back surface 22b are spaced apart in the z direction.
  • the element main surface 22a faces upward in the z direction (z1 side in the z direction), and the element back surface 22b faces downward in the z direction (z2 side in the z direction).
  • the element main surface 22a and the element back surface 22b are each flat (including the case where they are substantially flat).
  • the switching element 22 has three electrodes 221, 222, and 223.
  • the electrode 221 is provided on the back surface 22b of the element, and the electrodes 222 and 223 are provided on the main surface 22a of the element.
  • the three electrodes 221, 222, 223 are electrically connected to the switching function section of the switching element 22, respectively.
  • electrode 221 is a drain
  • electrode 222 is a source
  • electrode 223 is a gate.
  • the switching element 22 performs a switching operation in response to a drive signal (second drive signal) input to the electrode 223.
  • the switching operation is an operation in which an on state in which current flows between the two electrodes 221 and 222 and an off state in which no current flows between the two electrodes 221 and 222 are switched.
  • a forward current flows from the electrode 221 to the electrode 222.
  • the electrode 223 is an example of a "fourth control electrode" described in the claims.
  • the switching element 22 has a main surface wiring section 225.
  • the main surface wiring section 225 like the electrode 223, is provided on the element main surface 22a.
  • the main surface wiring portion 225 is not electrically connected to the switching function portion of the switching element 22 .
  • the main surface wiring section 225 has a rectangular shape in plan view. Further, the main surface wiring section 225 is located on the y1 side in the y direction from the center in the y direction on the element main surface 22a.
  • the main surface wiring section 225 includes a third pad section 225a, a fourth pad section 225b, and a connecting section 225c.
  • the third pad portion 225a is a portion to which a wire 61Q, which will be described later, is bonded.
  • the fourth pad portion 225b is a portion to which a wire 62Q, which will be described later, is bonded.
  • the third pad section 225a and the fourth pad section 225b are arranged along the y direction in plan view.
  • the third pad portion 225a is located closer to the y1 side in the y direction than the fourth pad portion 225b.
  • the third pad portion 225a is located closer to the second control element 8B than the fourth pad portion 225b in the y direction.
  • the dimension of the third pad section 225a in the x direction and the dimension of the fourth pad section 225b in the x direction are the same (or substantially the same).
  • the connecting portion 225c connects the third pad portion 225a and the fourth pad portion 225b.
  • the dimension of the connecting portion 225c in the x direction is the same (or approximately the same) as each dimension of the third pad portion 225a and the fourth pad portion 225b in the x direction.
  • each second switch section 2 (each of the fourth arm 2A, fifth arm 2B, and sixth arm 2C), the switching element 21 and the switching element 22 are electrically connected in parallel. Specifically, electrode 211 (collector) and electrode 221 (drain) are electrically connected, and electrode 212 (emitter) and electrode 222 (source) are electrically connected.
  • the protection element 23 includes a diode function section.
  • the diode function section operates as a freewheeling diode.
  • the protection element 23 is, for example, a Schottky barrier diode.
  • the protection element 23 has an element main surface 23a and an element back surface 23b.
  • the element main surface 23a and the element back surface 23b are spaced apart in the z direction.
  • the element main surface 23a faces upward in the z direction (z1 side in the z direction), and the element back surface 23b faces downward in the z direction (z2 side in the z direction).
  • the element main surface 23a and the element back surface 23b are each flat (including the case where they are substantially flat).
  • the protection element 23 includes two electrodes 231 and 232, as shown in FIG.
  • the electrode 231 is formed on the main surface 23a of the element, and the electrode 232 is formed on the back surface 23b of the element.
  • electrode 231 is an anode and electrode 232 is a cathode.
  • the protection element 23 is connected antiparallel to the switching element 21 and the switching element 22.
  • Antiparallel means a state in which the forward currents of the switching elements 21 and 22 and the forward currents of the protection element 23 are connected in parallel so that they are in opposite directions.
  • the electrode 231 (anode) of the protection element 23 is connected to the electrode 212 (emitter) of the switching element 21 and the electrode 222 (source) of the switching element 22, and the electrode 232 (cathode) of the protection element 23 is connected to the electrode 212 (emitter) of the switching element 21 and the electrode 222 (source) of the switching element 22.
  • each second switch section 2 when a reverse voltage is applied to the switching element 21 and the switching element 22, a forward current flows through the protection element 23, and the reverse voltage is applied to the switching element 21 and the switching element 22. is reduced.
  • the switching element 21A, the switching element 22A, and the protection element 23A are each bonded to the lead 3A via the conductive bonding material 29.
  • Switching element 21B, switching element 22B, and protection element 23B are also bonded to lead 3A via conductive bonding material 29, respectively.
  • the switching element 21C, the switching element 22C, and the protection element 23C are also each bonded to the lead 3A via the conductive bonding material 29.
  • These conductive bonding materials 29 are, for example, solder, metal paste, or sintered metal.
  • each second switch section 2 (each of the fourth arm 2A, the fifth arm 2B, and the sixth arm 2C), the switching element 21, the switching element 22, and the protection element 23 are arranged in a line in the y direction.
  • the switching element 21, the switching element 22, and the protection element 23 are arranged in a line in the y direction.
  • the switching element 21 is located between the switching element 22 and the protection element 23 in the y direction.
  • the positions of the switching element 21 and the switching element 22 may be opposite.
  • a main surface wiring section similar to the main surface wiring section 225 is formed in the switching element 21 .
  • a three-phase AC inverter circuit constituted by a plurality of first switch sections 1 and a plurality of second switch sections 2 has a first phase of 10U, a second phase of 10V, and a third phase of 10W.
  • the first phase 10U, second phase 10V, and third phase 10W are U phase, V phase, and W phase, respectively.
  • the first phase 10U includes a first arm 1A and a fourth arm 2A.
  • the first arm 1A and the fourth arm 2A are electrically connected in series.
  • the first arm 1A is the lower arm of the first phase 10U
  • the fourth arm 2A is the upper arm of the first phase 10U.
  • the second phase 10V includes a second arm 1B and a fifth arm 2B. At the second phase of 10V, the second arm 1B and the fifth arm 2B are electrically connected in series.
  • the second arm 1B is the lower arm of the second phase 10V
  • the fifth arm 2B is the upper arm of the second phase 10V.
  • the third phase 10W includes a third arm 1C and a sixth arm 2C.
  • the third arm 1C and the sixth arm 2C are electrically connected in series.
  • the third arm 1C is the lower arm of the third phase 10W
  • the sixth arm 2C is the upper arm of the third phase 10W.
  • the first control element 8A controls the switching operations of the plurality of switching elements 11 and the plurality of switching elements 12, and is, for example, a driver IC.
  • the first control element 8A receives a first input signal from the outside and generates a first drive signal for controlling the switching operation of each first switch section 1 based on the first input signal.
  • the first control element 8A outputs a first drive signal (eg, gate voltage) to the electrode 113 (gate) of each switching element 11 and the electrode 123 (gate) of each switching element 12. Thereby, the switching operation of each switching element 11 and each switching element 12 is controlled.
  • the first control element 8A has a rectangular shape whose longitudinal direction is in the x direction in plan view.
  • the first control element 8A provides a first drive signal input to the switching element 11 for each first switch section 1 (each of the first arm 1A, second arm 1B, and third arm 1C).
  • a delay time is provided between the first drive signal and the first drive signal input to the switching element 12.
  • the delay time is changed as appropriate depending on, for example, the switching speed of switching element 11 and the switching speed of switching element 12.
  • the switching element 11 is an IGBT and the switching element 12 is a MOSFET
  • the first drive signal to the switching element 12 has a timing of switching from an on signal to an off signal than the first drive signal to the switching element 11. , and the switching timing from the off signal to the on signal is early.
  • the first control element 8A does not necessarily need to provide a delay time between the first drive signal input to the switching element 11 and the first drive signal input to the switching element 12.
  • the first control element 8A is located on the y1 side in the y direction with respect to each first switch section 1. Therefore, the first control element 8A is located closer to the y1 side in the y direction than the switching element 11 and the switching element 12 of each first switch section 1.
  • the switching element 12 in each first switch section 1, the switching element 12 is located on the y1 side in the y direction than the switching element 11, so the switching element 12 is located closer to the first control element 8A and the switching element 11 in the y direction. located between.
  • the second control element 8B controls the switching operations of the plurality of switching elements 21 and the plurality of switching elements 22, and is, for example, a driver IC.
  • the second control element 8B receives a second input signal from the outside and generates a second drive signal for controlling the switching operation of each second switch section 2 based on the second input signal.
  • the second control element 8B outputs a second drive signal (eg, gate voltage) to the electrode 213 (gate) of each switching element 21 and the electrode 223 (gate) of each switching element 22. Thereby, the switching operation of each switching element 21 and each switching element 22 is controlled.
  • the second control element 8B has a rectangular shape whose longitudinal direction is the x direction in plan view.
  • the second control element 8B provides a second drive signal input to the switching element 21 for each second switch section 2 (fourth arm 2A, fifth arm 2B, and sixth arm 2C).
  • a delay time is provided between the second drive signal and the second drive signal input to the switching element 22.
  • the delay time is changed as appropriate depending on, for example, the switching speed of the switching element 21 and the switching speed of the switching element 22.
  • the switching element 21 is an IGBT and the switching element 22 is a MOSFET
  • the second drive signal to the switching element 22 has a timing for switching from an on signal to an off signal than the second drive signal to the switching element 21. , and the switching timing from the off signal to the on signal is early.
  • the second control element 8B does not necessarily need to provide a delay time between the second drive signal input to the switching element 21 and the second drive signal input to the switching element 22.
  • the second control element 8B is located on the y1 side in the y direction with respect to each second switch section 2. Therefore, the second control element 8B is located closer to the y1 side in the y direction than the switching element 21 and the switching element 22 of each second switch section 2.
  • the switching element 22 is located on the y1 side in the y direction than the switching element 21, so that the switching element 22 is located closer to the second control element 8B and the switching element 21 in the y direction. located between.
  • the first control element 8A and the second control element 8B each have a plurality of electrodes 81 and 82.
  • a plurality of electrodes 81 and 82 are arranged on the upper surface of each of the first control element 8A and the second control element 8B.
  • the plurality of electrodes 81 of the first control element 8A are electrically connected to any one of the plurality of first switch sections 1 (first arm 1A, second arm 1B, and third arm 1C).
  • the aforementioned first drive signal is output from the plurality of electrodes 81 of the first control element 8A.
  • the plurality of electrodes 82 of the first control element 8A are electrically connected to any of the leads 4A to 4H.
  • the plurality of electrodes 81 of the second control element 8B are electrically connected to any one of the plurality of second switch sections 2 (fourth arm 2A, fifth arm 2B, and sixth arm 2C).
  • the aforementioned second drive signal is output from the electrode 81 of the second control element 8B.
  • the plurality of electrodes 82 of the second control element 8B are electrically connected to any one of the leads 4J to 4N, 4Q, and 4R.
  • the second control element 8B has a plurality of electrodes 83.
  • a plurality of electrodes 83 are arranged on the upper surface of the second control element 8B.
  • Each of the plurality of electrodes 83 is electrically connected to a corresponding one of the plurality of second switch sections 2 (fourth arm 2A, fifth arm 2B, and sixth arm 2C).
  • a detection signal for detecting the conduction state of each first switch section 1 is input to the plurality of electrodes 83 .
  • the first control element 8A is bonded to the lead 4R via a bonding material 85, as shown in FIG.
  • the second control element 8B is bonded to the lead 4H via a bonding material 85, as shown in FIG.
  • the bonding material 85 may be conductive or insulating.
  • the bonding material 85 may be a conductive material (for example, solder, metal paste material, sintered metal, etc.). It will be done.
  • the plurality of electronic components 89U, 89V, and 89W are elements that assist the respective functions of the first control element 8A and the second control element 8B, and are, for example, diodes. Although the example shown in FIG. 3 includes three electronic components 89U, 89V, and 89W, the number of electronic components is not limited to this. As shown in FIG. 3, each of the plurality of electronic components 89U, 89V, and 89W is joined to a corresponding one of the plurality of leads 4A, 4B, and 4C. The plurality of electronic components 89U, 89V, and 89W are each bonded using a conductive bonding material 891, as shown in FIG.
  • the conductive bonding material 891 is, for example, solder, metal paste material, sintered metal, or the like.
  • the plurality of leads 3A to 3G, 3Z and the plurality of leads 4A to 4H, 4J to 4N, 4P to 4R are connected to the plurality of switching elements 11, the plurality of switching elements 12, and the plurality of protection elements 13, as shown in FIG. , supports the plurality of switching elements 21, the plurality of switching elements 22, the plurality of protection elements 23, the first control element 8A, the second control element 8B, and the plurality of electronic components 89U, 89V, 89W, and is connected to them. Constructs a conduction path.
  • the leads 4H and 4R are integrally formed, and the others are spaced apart from each other.
  • the auxiliary line L1 shown in FIG. 3 is the boundary between the lead 4H and the lead 4R, and shows a part where they are integrally connected. Note that the lead 4H and the lead 4R may be regarded as one lead. Unlike this example, the leads 4H and 4R may be spaced apart from each other.
  • the plurality of leads 3A to 3G, 3Z and the plurality of leads 4A to 4H, 4J to 4N, 4P to 4R may be formed from different conductive members, or may be formed from one conductive member.
  • the plurality of leads 3A to 3G, 3Z and the plurality of leads 4A to 4H, 4J to 4N, 4P to 4R are made of, for example, Cu or a Cu alloy.
  • the constituent materials of the plurality of leads 3A to 3G, 3Z and the plurality of leads 4A to 4H, 4J to 4N, 4P to 4R may be not Cu or Cu alloy, but Ni or Ni alloy, or 42 alloy. good. Note that the respective constituent materials of the plurality of leads 3A to 3G, 3Z and the respective constituent materials of the plurality of leads 4A to 4H, 4J to 4N, 4P to 4R may be the same or different. .
  • a motor drive current is passed through the plurality of leads 3A to 3G, and a control current is passed to the plurality of leads 4A to 4H, 4J to 4N, and 4P to 4R. Therefore, a higher voltage is applied to the plurality of leads 3A to 3G than to the plurality of leads 4A to 4H, 4J to 4N, and 4P to 4R, and a larger current is applied to the plurality of leads 3A to 3G.
  • the plurality of leads 3A to 3G, 3Z on the high voltage side and the leads 4A to 4H, 4J to 4N, 4P to 4R on the low voltage side are mutually connected in the y direction. They are placed on opposite sides.
  • the switching element 21, switching element 22, and protection element 23 of each of the plurality of second switch sections 2 are mounted on the lead 3A.
  • the lead 3A includes an electrode 211 (collector) of each switching element 21, an electrode 221 (drain) of each switching element 22, and an electrode 232 (cathode) of each protection element 23. conducts to.
  • the lead 3A includes a plurality of mounting portions 311A, 312A, 313A, a terminal portion 32A, a pad portion 33A, and a connecting portion 34A.
  • the plurality of mounting parts 311A, 312A, and 313A are each covered with a sealing member 7.
  • the plurality of mounting parts 311A, 312A, and 313A are integrally formed.
  • the plurality of mounting parts 311A, 312A, and 313A are each bonded to the support substrate 51 via a bonding material 39.
  • the bonding material 39 may be conductive or insulating.
  • the bonding material 39 is preferably one with excellent thermal conductivity.
  • a switching element 21A, a switching element 22A, and a protection element 23A are mounted on the mounting portion 311A, respectively.
  • the mounting portion 311A is electrically connected to the electrode 211 (collector) of the switching element 21A and the electrode 221 (drain) of the switching element 22A, and is electrically connected to the electrode 232 (cathode) of the protection element 23A. That is, the electrode 211 of the switching element 21A, the electrode 221 of the switching element 22A, and the electrode 232 of the protection element 23A are electrically connected to each other via the mounting portion 311A.
  • a switching element 21B, a switching element 22B, and a protection element 23B are mounted on the mounting portion 312A, respectively.
  • the mounting portion 312A is electrically connected to the electrode 211 (collector) of the switching element 21B and the electrode 221 (drain) of the switching element 22B, and is electrically connected to the electrode 232 (cathode) of the protection element 23B. That is, the electrode 211 of the switching element 21B, the electrode 221 of the switching element 22B, and the electrode 232 of the protection element 23B are electrically connected to each other via the mounting portion 312A.
  • a switching element 21C, a switching element 22C, and a protection element 23C are mounted on the mounting portion 313A, respectively.
  • the mounting portion 313A is electrically connected to the electrode 211 (collector) of the switching element 21C and the electrode 221 (drain) of the switching element 22C, and is electrically connected to the electrode 232 (cathode) of the protection element 23C. That is, the electrode 211 of the switching element 21C, the electrode 221 of the switching element 22C, and the electrode 232 of the protection element 23C are electrically connected to each other via the mounting portion 313A.
  • the terminal portion 32A is a portion of the lead 3A that protrudes from the sealing member 7, as shown in FIG.
  • the terminal portion 32A protrudes from the mounting portions 311A, 312A, and 313A on the opposite side from the leads 4A to 4H, 4J to 4N, and 4P to 4R in the y direction.
  • the terminal portion 32A is used to electrically connect the semiconductor device A1 to an external circuit.
  • the terminal portion 32A is bent toward the z1 side in the z direction to form an L-shape.
  • the pad portion 33A and the connecting portion 34A are covered with the sealing member 7.
  • the pad portion 33A and the connecting portion 34A are interposed between the mounting portion 312A and the terminal portion 32A, as shown in FIG.
  • the pad portion 33A is located on the z1 side in the z direction with respect to the mounting portion 312A, and is connected to the terminal portion 32A.
  • the connecting portion 34A is connected to the mounting portion 311A and the pad portion 33A, and is inclined with respect to the y direction.
  • the leads 3B, 3C, and 3D are arranged on the x2 side in the x direction with respect to the leads 3A. Leads 3B, 3C, and 3D are lined up in the x direction.
  • the shapes of the leads 3B, 3C, and 3D are not particularly limited, and in the illustrated example, the leads 3B, 3C, and 3D have the same shape (or approximately the same shape) and the same size (or approximately the same size). ).
  • the first arm 1A is mounted on the lead 3B. That is, the switching element 11A, the switching element 12A, and the protection element 13A are mounted on the lead 3B, respectively.
  • the lead 3B is electrically connected to the electrode 111 (collector) of the switching element 11A, the electrode 121 (drain) of the switching element 12A, and the electrode 132 (cathode) of the protection element 13A.
  • the lead 3B includes a mounting portion 31B, a terminal portion 32B, a pad portion 33B, and a connecting portion 34B.
  • the mounting portion 31B is covered with a sealing member 7.
  • the mounting portion 31B is bonded to the support substrate 51 via a bonding material 39.
  • a switching element 11A, a switching element 12A, and a protection element 13A are mounted on the mounting portion 31B, respectively.
  • the mounting portion 31B is electrically connected to the electrode 111 (collector) of the switching element 11A and the electrode 121 (drain) of the switching element 12A, and is electrically connected to the electrode 132 (cathode) of the protection element 13A. That is, the electrode 111 of the switching element 11A, the electrode 121 of the switching element 12A, and the electrode 132 of the protection element 13A are electrically connected to each other via the mounting portion 31B.
  • the terminal portion 32B is a portion of the lead 3B that protrudes from the sealing member 7, as shown in FIG.
  • the terminal portion 32B protrudes from the mounting portion 31B in the y direction on the side opposite to the leads 4A to 4H, 4J to 4N, and 4P to 4R.
  • the terminal portion 32B is used to electrically connect the semiconductor device A1 to an external circuit.
  • the terminal portion 32B is bent toward the z1 side in the z direction to form an L-shape.
  • the pad portion 33B and the connecting portion 34B are covered with the sealing member 7.
  • the pad portion 33B and the connecting portion 34B are interposed between the mounting portion 31B and the terminal portion 32B, as shown in FIG.
  • the pad portion 33B like the pad portion 33A, is located on the z1 side in the z direction with respect to the mounting portion 31B.
  • the pad portion 33B is connected to the terminal portion 32B.
  • a wire 6A is bonded to the pad portion 33B.
  • the connecting portion 34B is connected to the mounting portion 31B and the pad portion 33B, and is inclined with respect to the y direction similarly to the connecting portion 34A.
  • the second arm 1B is mounted on the lead 3C. That is, the switching element 11B, the switching element 12B, and the protection element 13B are mounted on the lead 3C, respectively.
  • the lead 3C is electrically connected to the electrode 111 (collector) of the switching element 11B, the electrode 121 (drain) of the switching element 12B, and the electrode 132 (cathode) of the protection element 13B.
  • the lead 3C includes a mounting portion 31C, a terminal portion 32C, a pad portion 33C, and a connecting portion 34C.
  • the mounting portion 31C is covered with a sealing member 7.
  • the mounting portion 31C is bonded to the support substrate 51 via a bonding material 39.
  • a switching element 11B, a switching element 12B, and a protection element 13B are mounted on the mounting portion 31C.
  • the mounting portion 31C is electrically connected to the electrode 111 (collector) of the switching element 11B and the electrode 121 (drain) of the switching element 12B, and is electrically connected to the electrode 132 (cathode) of the protection element 13B. That is, the electrode 111 of the switching element 11B, the electrode 121 of the switching element 12B, and the electrode 132 of the protection element 13B are electrically connected to each other via the mounting portion 31C.
  • the terminal portion 32C is a portion of the lead 3C that protrudes from the sealing member 7, as shown in FIG.
  • the terminal portion 32C protrudes in the y direction with respect to the mounting portion 31C on the side opposite to the leads 4A to 4H, 4J to 4N, and 4P to 4R.
  • the terminal portion 32C is used to electrically connect the semiconductor device A1 to an external circuit.
  • the terminal portion 32C is bent toward the z1 side in the z direction to form an L-shape.
  • the pad portion 33C and the connecting portion 34C are covered with the sealing member 7.
  • the pad portion 33C and the connecting portion 34C are interposed between the mounting portion 31C and the terminal portion 32C, as shown in FIG.
  • the pad portion 33C is located on the z1 side in the z direction with respect to the mounting portion 31C, similarly to the pad portions 33A and 33B.
  • the pad portion 33C is connected to the terminal portion 32C.
  • a wire 6B is bonded to the pad portion 33C.
  • the connecting portion 34C is connected to the mounting portion 31C and the pad portion 33C, and is inclined with respect to the y direction like the connecting portions 34A and 34B.
  • the third arm 1C is mounted on the lead 3D. That is, the lead 3D is equipped with a switching element 11C, a switching element 12C, and a protection element 13C, respectively. As will be understood from the configuration detailed later, the lead 3D is electrically connected to the electrode 111 (collector) of the switching element 11C, the electrode 121 (drain) of the switching element 12C, and the electrode 132 (cathode) of the protection element 13C. As shown in FIGS. 3 and 4, the lead 3D includes a mounting portion 31D, a terminal portion 32D, a pad portion 33D, and a connecting portion 34D.
  • the mounting portion 31D is covered with a sealing member 7.
  • the mounting portion 31D is bonded to the support substrate 51 via a bonding material 39.
  • a switching element 11C, a switching element 12C, and a protection element 13C are mounted on the mounting portion 31D.
  • the mounting portion 31D is electrically connected to the electrode 111 (collector) of the switching element 11C and the electrode 121 (drain) of the switching element 12C, and is electrically connected to the electrode 132 (cathode) of the protection element 13C. That is, the electrode 111 of the switching element 11C, the electrode 121 of the switching element 12C, and the electrode 132 of the protection element 13C are electrically connected to each other via the mounting portion 31D.
  • the terminal portion 32D is a portion of the lead 3D that protrudes from the sealing member 7.
  • the terminal portion 32D protrudes from the mounting portion 31D in the y direction on the opposite side from the leads 4A to 4H, 4J to 4N, and 4P to 4R.
  • the terminal portion 32D is used to electrically connect the semiconductor device A1 to an external circuit.
  • the terminal portion 32D is bent toward the z1 side in the z direction to form an L-shape.
  • the pad portion 33D and the connecting portion 34D are covered with the sealing member 7. As shown in FIG. 3, the pad portion 33D and the connecting portion 34D are interposed between the mounting portion 31D and the terminal portion 32D.
  • the pad portion 33D is located on the z1 side in the z direction with respect to the mounting portion 31D, similarly to the pad portions 33A, 33B, and 33C.
  • the pad portion 33D is connected to the terminal portion 32D.
  • a wire 6C is bonded to the pad portion 33D.
  • the connecting portion 34D is connected to the mounting portion 31D and the pad portion 33D, and is inclined with respect to the y direction like the connecting portions 34A, 34B, and 34C.
  • the leads 3E, 3F, and 3G are arranged on the x2 side in the x direction with respect to the leads 3D. Leads 3E, 3F, and 3G are lined up in the x direction. Each of the leads 3E, 3F, and 3G is not mounted with any of the plurality of first switch sections 1 and the plurality of second switch sections 2.
  • the lead 3E is electrically connected to the electrode 112 (emitter) of the switching element 11A, the electrode 122 (source) of the switching element 12A, and the electrode 131 (anode) of the protection element 13A, according to a configuration that will be described in detail later.
  • the lead 3E includes a terminal portion 32E and a pad portion 33E, as shown in FIG. 3 and the like. The terminal portion 32E and the pad portion 33E are connected.
  • the terminal portion 32E is a portion of the lead 3E that protrudes from the sealing member 7. As shown in FIG. 3, the terminal portion 32E protrudes from the pad portion 33E in the y direction on the opposite side from the leads 4A to 4H, 4J to 4N, and 4P to 4R.
  • the terminal portion 32E is used to electrically connect the semiconductor device A1 to an external circuit. In the illustrated example, the terminal portion 32E is bent toward the z1 side in the z direction to form an L-shape.
  • the pad portion 33E is covered with the sealing member 7, and has a rectangular shape in plan view in the illustrated example. As shown in FIG. 3, the pad portion 33E does not overlap the support substrate 51 in plan view.
  • the pad portion 33E is arranged at the same (or approximately the same) position (at the same (or approximately the same) height) as each of the pad portions 33A to 33D in the z direction. As shown in FIG. 3, the pad portion 33E is connected to a wire 6D, and is connected to the electrode 112 (emitter) of the switching element 11A, the electrode 122 (source) of the switching element 12A, and the protection element 13A via the wire 6D.
  • the electrodes 131 (anodes) are electrically connected to each other.
  • the lead 3F is electrically connected to the electrode 112 (emitter) of the switching element 11B, the electrode 122 (source) of the switching element 12B, and the electrode 131 (anode) of the protection element 13B, respectively, according to a configuration described in detail later.
  • the lead 3F includes a terminal portion 32F and a pad portion 33F, as shown in FIG. 3 and the like. The terminal portion 32F and pad portion 33F are connected.
  • the terminal portion 32F is a portion of the lead 3F that protrudes from the sealing member 7. As shown in FIG. 3, the terminal portion 32F protrudes in the y direction with respect to the pad portion 33F on the opposite side from the leads 4A to 4H, 4J to 4N, and 4P to 4R.
  • the terminal portion 32F is used to electrically connect the semiconductor device A1 to an external circuit. In the illustrated example, the terminal portion 32F is bent toward the z1 side in the z direction to form an L-shape.
  • the pad portion 33F is covered with the sealing member 7, and has a rectangular shape in plan view in the illustrated example. As shown in FIG. 3, the pad portion 33F does not overlap the support substrate 51 in plan view.
  • the pad section 33F is arranged at the same (or approximately the same) position (at the same (or approximately the same) height) as each of the pad sections 33A to 33E in the z direction. As shown in FIG. 3, the pad portion 33F is connected to a wire 6E, and is connected to the electrode 112 (emitter) of the switching element 11B, the electrode 122 (source) of the switching element 12B, and the protection element 13B via the wire 6E.
  • the electrodes 131 (anodes) are electrically connected to each other.
  • the lead 3G is electrically connected to the electrode 112 (emitter) of the switching element 11C, the electrode 122 (source) of the switching element 12C, and the electrode 131 (anode) of the protection element 13C, according to a configuration that will be described in detail later.
  • the lead 3G includes a terminal portion 32G and a pad portion 33G, as shown in FIG. 3 and the like. The terminal portion 32G and the pad portion 33G are connected.
  • the terminal portion 32G is a portion of the lead 3G that protrudes from the sealing member 7. As shown in FIG. 3, the terminal portion 32G protrudes in the y direction with respect to the pad portion 33G on the opposite side from the leads 4A to 4H, 4J to 4N, and 4P to 4R.
  • the terminal portion 32G is used to electrically connect the semiconductor device A1 to an external circuit. In the illustrated example, the terminal portion 32G is bent toward the z1 side in the z direction to form an L-shape.
  • the pad portion 33G is covered with the sealing member 7. As shown in FIG. 3, the pad portion 33G does not overlap the support substrate 51 in plan view.
  • the pad portion 33G is arranged at the same (or approximately the same) position (at the same (or approximately the same) height) as each of the pad portions 33A to 33F in the z direction.
  • the pad portion 33G is connected to a wire 6F, which connects the electrode 112 (emitter) of the switching element 11C, the electrode 122 (source) of the switching element 12C, and the protection element 13C via the wire 6F.
  • the electrodes 131 (anodes) are electrically connected to each other.
  • the lead 3Z is arranged on the x1 side in the x direction with respect to the lead 3A.
  • the lead 3Z is not electrically connected to any of the plurality of first switch sections 1 and the plurality of second switch sections 2.
  • the lead 3Z includes a terminal portion 32Z and a pad portion 33Z, as shown in FIG. 3 and the like. The terminal portion 32Z and the pad portion 33Z are connected.
  • the terminal portion 32Z is a portion of the lead 3Z that protrudes from the sealing member 7. As shown in FIG. 3, the terminal portion 32Z protrudes in the y direction with respect to the pad portion 33Z on the opposite side from the leads 4A to 4H, 4J to 4N, and 4P to 4R. In the illustrated example, the terminal portion 32Z is bent toward the z1 side in the z direction to form an L-shape.
  • the pad portion 33Z is covered with the sealing member 7. As shown in FIG. 3, the pad portion 33Z does not overlap the support substrate 51 in plan view.
  • the pad section 33Z is arranged at the same (or approximately the same) position (at the same (or approximately the same) height) as each of the pad sections 33A to 33G in the z direction.
  • the leads 4A, 4B, and 4C are arranged on the x1 side in the x direction with respect to the lead 4D.
  • lead 4A will be described in detail below, lead 4B and lead 4C also include similar components.
  • the constituent parts of the lead 4B and the lead 4C are obtained by changing "A" to "B” or "C" in each constituent part of the lead 4A.
  • the lead 4A includes a terminal portion 42A and a pad portion 43A, as shown in FIG. 3 and the like.
  • the lead 4B includes a terminal portion 42B and a pad portion 43B
  • the lead 4C includes a terminal portion 42C and a pad portion 43C.
  • the terminal portion 42A is a portion of the lead 4A that protrudes from the sealing member 7. As shown in FIG. 3, the terminal portion 42A protrudes in the y direction with respect to the pad portion 43A on the opposite side from the leads 3A to 3G and 3Z.
  • the terminal portion 42A is used to electrically connect the semiconductor device A1 to an external circuit. In the illustrated example, the terminal portion 42A is bent toward the z1 side in the z direction to form an L-shape.
  • the pad portion 43A is covered with the sealing member 7. As shown in FIG. 3, the electronic component 89U and one of the plurality of wires 6L are bonded to the pad portion 43A. Note that an electronic component 89V is bonded to the pad portion 43B instead of the electronic component 89U, and an electronic component 89W is bonded to the pad portion 43C instead of the electronic component 89U.
  • the shape of the pad portion 43A is not limited to the illustrated example.
  • leads 4D to 4G are arranged on the x2 side in the x direction with respect to the lead 4C.
  • leads 4E, 4F, and 4G also include similar components.
  • the constituent parts of the leads 4E, 4F, and 4G are obtained by changing "D" to "E", “F", or "G" in each constituent part of the lead 4D.
  • the lead 4D includes a terminal portion 42D, a pad portion 43D, and a connecting portion 44D.
  • the lead 4E includes a terminal portion 42E, a pad portion 43E, and a connecting portion 44E
  • the lead 4F includes a terminal portion 42F, a pad portion 43F, and a connecting portion 44E.
  • the lead 4G includes a terminal portion 42G, a pad portion 43G, and a connecting portion 44G.
  • the terminal portion 42D is a portion of the lead 4D that protrudes from the sealing member 7. As shown in FIG. 3, the terminal portion 42D protrudes in the y direction with respect to the pad portion 43D on the opposite side to the leads 3A to 3G and 3Z.
  • the terminal portion 42D is used to electrically connect the semiconductor device A1 to an external circuit. In the illustrated example, the terminal portion 42D is bent toward the z1 side in the z direction to form an L-shape.
  • the pad portion 43D is covered with the sealing member 7. As shown in FIG. 3, the pad portion 43D is connected to one of the plurality of wires 6L, and is electrically connected to the electrode 82 of the second control element 8B via the wire 6L.
  • the connecting portion 44D is covered with the sealing member 7. As shown in FIG. 3, the connecting portion 44D is connected to the terminal portion 42D and the pad portion 43D and is interposed between them.
  • the second control element 8B is mounted on the lead 4H.
  • the lead 4H includes a mounting portion 41H, a terminal portion 42H, a pad portion 43H, a plurality of connecting portions 44H, and a protruding portion 45H.
  • the mounting portion 41H is covered with the sealing member 7. As shown in FIGS. 3 and 13, the second control element 8B is mounted on the mounting portion 41H. The second control element 8B is fixed to the mounting portion 41H by the bonding material 85, as described above. As shown in FIG. 13, the mounting portion 41H is spaced apart from the support substrate 51 in the z direction.
  • the terminal portion 42H is a portion of the lead 4H that protrudes from the sealing member 7. As shown in FIG. 3, the terminal portion 42H protrudes from the mounting portion 41H to the side opposite to the leads 3A to 3G and 3Z in the y direction.
  • the terminal portion 42H is used to electrically connect the semiconductor device A1 to an external circuit. In the illustrated example, the terminal portion 42H is bent in the z direction to form an L-shape.
  • the pad portion 43H is covered with the sealing member 7.
  • the pad portion 43H is adjacent to the mounting portion 41H.
  • one of the plurality of wires 6L is bonded to the pad portion 43H.
  • Each of the plurality of connecting portions 44H is covered with a sealing member 7.
  • Some of the plurality of connecting parts 44H are interposed between and connected to the terminal part 42H and the pad part 43H, and others are interposed between and connected to the mounting part 41H and the protruding part 45H.
  • the protruding portion 45H extends from the connecting portion 44H connected to the mounting portion 41H toward the y1 side in the y direction, and protrudes from the sealing member 7.
  • the first control element 8A is mounted on the lead 4R.
  • the lead 4R includes a mounting portion 41R, a terminal portion 42R, a pad portion 43R, and a connecting portion 44R, as shown in FIG. 3 and the like.
  • the mounting portion 41R is covered with a sealing member 7. As shown in FIGS. 3 and 12, the first control element 8A is mounted on the mounting portion 41R. As described above, the first control element 8A is fixed to the mounting portion 41R with the bonding material 85. As shown in FIG. 12, the mounting portion 41R is spaced apart from the support substrate 51 in the z direction, similarly to the mounting portion 41H.
  • the terminal portion 42R is a portion of the lead 4R that protrudes from the sealing member 7. As shown in FIG. 3, the terminal portion 42R protrudes from the mounting portion 41R to the side opposite to the leads 3A to 3G and 3Z in the y direction.
  • the terminal portion 42R is used to electrically connect the semiconductor device A1 to an external circuit. In the illustrated example, the terminal portion 42R is bent in the z direction to form an L-shape.
  • the pad portion 43R is covered with the sealing member 7.
  • the pad portion 43R is adjacent to the mounting portion 41R. As shown in FIG. 3, one of the plurality of wires 6L is bonded to the pad portion 43R.
  • the connecting portions 44R are each covered with a sealing member 7.
  • the connecting portion 44R is interposed between the terminal portion 42R and the pad portion 43R and connected thereto.
  • leads 4J to 4N, 4P, and 4Q are arranged on the x2 side in the x direction with respect to the lead 4H.
  • lead 4Q will be described in detail below, leads 4J, 4K, 4L, 4M, 4N, and 4P also include similar components. In this case, leads 4J, 4K, 4L, These are the constituent parts of 4M, 4N, and 4P.
  • the lead 4Q includes a terminal portion 42Q, a pad portion 43Q, and a connecting portion 44Q.
  • the lead 4J includes a terminal portion 42J, a pad portion 43J, and a connecting portion 44J
  • the lead 4K includes a terminal portion 42K, a pad portion 43K, and a connecting portion.
  • the lead 4L includes a terminal portion 42L, a pad portion 43L, and a connecting portion 44L
  • the lead 4M includes a terminal portion 42M, a pad portion 43M, and a connecting portion 44M
  • the lead 4N includes a terminal portion 42N, a pad portion 43L, and a connecting portion 44M.
  • the lead 4P includes a terminal portion 42P, a pad portion 43P, and a connecting portion 44P.
  • the terminal portion 42Q is a portion of the lead 4Q that protrudes from the sealing member 7. As shown in FIG. 3, the terminal portion 42Q protrudes in the y direction from the pad portion 43Q on the side opposite to the leads 3A to 3G and 3Z.
  • the terminal portion 42Q is used to electrically connect the semiconductor device A1 to an external circuit. In the illustrated example, the terminal portion 42Q is bent in the z direction to form an L-shape.
  • the terminal portions 42Q, 42J to 42N of the plurality of leads 4Q, 4J to 4N are respectively arranged between the terminal portion 42H of the lead 4H and the terminal portion 42R of the lead 4R in the x direction, and are arranged between the terminal portion 42H of the lead 4H and the terminal portion 42R of the lead 4R.
  • 42P is located on the x2 side in the x direction with respect to the terminal portion 42R.
  • the pad portion 43Q is covered with the sealing member 7. As shown in FIG. 3, one of the plurality of wires 6L is bonded to the pad portion 43Q, and the pad portion 43Q is electrically connected to the electrode 82 of the first control element 8A via the wire 6L. However, in the example shown in FIG. 3, none of the plurality of wires 6L is bonded to the pad portion 43P.
  • the connecting portion 44Q is covered with the sealing member 7. As shown in FIG. 3, the connecting portion 44Q is connected to the terminal portion 42Q and the pad portion 43Q, and is interposed between them.
  • the plurality of terminal portions 42A to 42C are arranged in line in the x direction with a first pitch width d1 (see FIG. 3). Further, the plurality of terminal portions 42D to 42H, 42J to 42N, and 42P to 42R are arranged in line in the x direction with a second pitch width d2 (see FIG. 3). The first pitch width d1 is larger than the second pitch width d2. The distance between the terminal portion 42C and the terminal portion 42D along the x direction is the first pitch width d1.
  • the support substrate 51 supports a plurality of leads 3A to 3D, and for example, leads from each of the plurality of first switch sections 1 and the plurality of second switch sections 2 via these.
  • the semiconductor device A1 is provided for transmitting heat to the outside of the semiconductor device A1.
  • the support substrate 51 is plate-shaped and rectangular in plan view.
  • the support substrate 51 is made of an insulating material, and examples of the insulating material include ceramics such as alumina (Al 2 O 3 ), silicon nitride (SiN), aluminum nitride (AlN), and alumina containing zirconia.
  • the support substrate 51 is preferably made of ceramics from the viewpoint of strength, heat transfer rate, and insulation, but is not limited thereto, and various materials (eg, epoxy resin, silicon, etc.) may be used. Further, the support substrate 51 is preferably made of a material having higher thermal conductivity than the sealing member 7.
  • the support substrate 51 has a first surface 511, a second surface 512, a third surface 513, a fourth surface 514, a fifth surface 515, and a sixth surface 516, as shown in FIG. 3 and FIGS. 10 to 13.
  • the first surface 511 and the second surface 512 are spaced apart in the z direction.
  • the first surface 511 faces upward in the z direction (z1 side in the z direction), and the second surface 512 faces downward in the z direction (z2 side in the z direction).
  • FIGS. 10 to 13 the first surface 511 and the second surface 512 are spaced apart in the z direction.
  • the first surface 511 faces upward in the z direction (z1 side in the z direction)
  • the second surface 512 faces downward in the z direction (z2 side in the z direction).
  • a plurality of mounting portions 311A, 312A, 313A, 31B, 31C, and 31D are bonded to the first surface 511 via a plurality of bonding materials 39, respectively.
  • the second surface 512 is exposed from the sealing member 7, as shown in FIGS. 10 to 13.
  • the third surface 513, the fourth surface 514, the fifth surface 515, and the sixth surface 516 are located between the first surface 511 and the second surface 512 in the z direction and are connected to them.
  • the third surface 513 and the fourth surface 514 are spaced apart in the x direction.
  • the third surface 513 faces the x2 side in the x direction
  • the fourth surface 514 faces the x1 side in the x direction.
  • the fifth surface 515 and the sixth surface 516 are spaced apart in the y direction.
  • the fifth surface 515 faces the y2 side in the y direction
  • the sixth surface 516 faces the y1 side in the y direction.
  • the first surface 511, the second surface 512, the third surface 513, the fourth surface 514, the fifth surface 515, and the sixth surface 516 are each flat.
  • the plurality of connection members 6 connect two parts separated from each other.
  • the plurality of connection members 6 include a plurality of wires 6A to 6F, 6H, 6J to 6L, 61G, 61Q, 62G, and 62Q.
  • Each of the wires 6A to 6F, 6H, 6J to 6L, 61G, 61Q, 62G, and 62Q is a bonding wire.
  • a conductive plate member may be used instead of each 6A to 6F, 6H, 6J to 6L, 61G, 61Q, 62G, and 62Q, or a bonding ribbon may be used.
  • plated wire may also be used.
  • the wire 6A is connected to the electrode 212 (emitter) of the switching element 21A, the electrode 222 (source) of the switching element 22A, and the electrode 231 (anode) of the protection element 23A.
  • the electrode 212 of the switching element 21A, the electrode 222 of the switching element 22A, and the electrode 231 of the protection element 23A are electrically connected to each other.
  • the wire 6A is joined to the pad portion 33B of the lead 3B, as shown in FIG.
  • the lead 3B is electrically connected to the first arm 1A (the electrode 111 of the switching element 11A, the electrode 121 of the switching element 12A, and the electrode 132 of the protection element 13A), the electrode 212 of the switching element 21A, the electrode 222 of the switching element 22A, and the protection Electrode 231 of element 23A, electrode 111 of switching element 11A, electrode 121 of switching element 12A, and electrode 132 of protection element 13A are electrically connected via lead 3B and wire 6A.
  • the wire 6B is connected to the electrode 212 (emitter) of the switching element 21B, the electrode 222 (source) of the switching element 22B, and the electrode 231 (anode) of the protection element 23B.
  • the electrode 212 of the switching element 21B, the electrode 222 of the switching element 22B, and the electrode 231 of the protection element 23B are electrically connected to each other.
  • the wire 6B is joined to the pad portion 33C of the lead 3C, as shown in FIG.
  • the lead 3C is electrically connected to the second arm 1B (the electrode 111 of the switching element 11B, the electrode 121 of the switching element 12B, and the electrode 132 of the protection element 13B), the electrode 212 of the switching element 21B, the electrode 222 of the switching element 22B, and the protection Electrode 231 of element 23B, electrode 111 of switching element 11B, electrode 121 of switching element 12B, and electrode 132 of protection element 13B are electrically connected via lead 3C and wire 6B.
  • the wire 6C is connected to the electrode 212 (emitter) of the switching element 21C, the electrode 222 (source) of the switching element 22C, and the electrode 231 (anode) of the protection element 23C.
  • the electrode 212 of the switching element 21C, the electrode 222 of the switching element 22C, and the electrode 231 of the protection element 23C are electrically connected to each other.
  • the wire 6C is joined to the pad portion 33D of the lead 3D, as shown in FIG.
  • the lead 3D is electrically connected to the third arm 1C (the electrode 111 of the switching element 11C, the electrode 121 of the switching element 12C, and the electrode 132 of the protection element 13C), the electrode 212 of the switching element 21C, the electrode 222 of the switching element 22C, and the protection Electrode 231 of element 23C, electrode 111 of switching element 11C, electrode 121 of switching element 12C, and electrode 132 of protection element 13C are electrically connected via lead 3D and wire 6C.
  • the wire 6D is connected to the electrode 112 (emitter) of the switching element 11A, the electrode 122 (source) of the switching element 12A, and the electrode 131 (anode) of the protection element 13A.
  • the electrode 112 of the switching element 11A, the electrode 122 of the switching element 12A, and the electrode 131 of the protection element 13A are electrically connected to each other.
  • the wire 6D is joined to the pad portion 33E of the lead 3E, as shown in FIG. Therefore, the lead 3E is electrically connected to the electrode 112 of the switching element 11A, the electrode 122 of the switching element 12A, and the electrode 131 of the protection element 13A via the wire 6D.
  • the wire 6E is connected to the electrode 112 (emitter) of the switching element 11B, the electrode 122 (source) of the switching element 12B, and the electrode 131 (anode) of the protection element 13B.
  • the electrode 112 of the switching element 11B, the electrode 122 of the switching element 12B, and the electrode 131 of the protection element 13B are electrically connected to each other.
  • the wire 6E is joined to the pad portion 33F of the lead 3F, as shown in FIG. Therefore, the lead 3F is electrically connected to the electrode 112 of the switching element 11B, the electrode 122 of the switching element 12B, and the electrode 131 of the protection element 13B via the wire 6E.
  • the wire 6F is connected to the electrode 112 (emitter) of the switching element 11C, the electrode 122 (source) of the switching element 12C, and the electrode 131 (anode) of the protection element 13C.
  • the electrode 112 of the switching element 11C, the electrode 122 of the switching element 12C, and the electrode 131 of the protection element 13C are electrically connected to each other.
  • the wire 6F is joined to the pad portion 33G of the lead 3G, as shown in FIG. Therefore, the lead 3G is electrically connected to the electrode 112 of the switching element 11C, the electrode 122 of the switching element 12C, and the electrode 131 of the protection element 13C via the wire 6F.
  • the plurality of wires 61G are individually connected to the electrode 81 of the first control element 8A and the main surface wiring part 125 (first pad part 125a) of the plurality of switching elements 12. Joined. As shown in FIGS. 4 and 5, the plurality of wires 62G are connected to the main surface wiring part 125 (second pad part 125b) of the plurality of switching elements 12 and the electrode 113 (gate) of the plurality of switching elements 11, Each is individually joined. With this configuration, the electrode 113 of each switching element 11 is electrically connected to the electrode 81 of the first control element 8A via the wire 62G, the main surface wiring section 125, and the wire 61G. Therefore, the first drive signal for each switching element 11 is input to the electrode 113 of each switching element 11 from the electrode 81 of the first control element 8A, through the wire 61G, the main surface wiring section 125, and the wire 62G.
  • the plurality of wires 6H are connected to the electrode 123 of each switching element 12 and the electrode 81 of the first control element 8A.
  • the plurality of wires 6H each transmit the first drive signal corresponding to each of the plurality of switching elements 12. That is, the first drive signal for each switching element 12 is input from the electrode 81 of the first control element 8A to the electrode 123 of each switching element 12 via the wire 6H.
  • the plurality of wires 61Q are individually connected to the electrode 81 of the second control element 8B and the main surface wiring part 225 (third pad part 225a) of the plurality of switching elements 22. Joined. As shown in FIGS. 6 and 7, the plurality of wires 62Q are connected to the main surface wiring part 225 (fourth pad part 225b) of the plurality of switching elements 22 and the electrode 213 (gate) of the plurality of switching elements 21, Each is individually joined. With this configuration, the electrode 213 of each switching element 21 is electrically connected to the electrode 81 of the second control element 8B via the wire 62Q, the main surface wiring section 225, and the wire 61Q. Therefore, the second drive signal for each switching element 21 is input to the electrode 213 of each switching element 21 from the electrode 81 of the second control element 8B, through the wire 61Q, the main surface wiring section 225, and the wire 62Q.
  • the plurality of wires 6J are connected to the electrode 223 of each switching element 22 and the electrode 81 of the second control element 8B.
  • the plurality of wires 6J each transmit the second drive signal corresponding to each of the plurality of switching elements 22. That is, the second drive signal for each switching element 22 is input from the electrode 81 of the second control element 8B to the electrode 223 of each switching element 22 via the wire 6J.
  • the plurality of wires 6K are connected to the electrode 222 of each switching element 22 and the electrode 83 of the second control element 8B.
  • Each of the plurality of wires 6K transmits a detection signal for detecting the conduction state of any one of the fourth arm 2A, the fifth arm 2B, and the sixth arm 2C.
  • the detection signal is the source current (or source voltage) of each switching element 22.
  • Each of the plurality of wires 6L connects to the electrode 82 of the first control element 8A or the electrode 82 of the second control element 8B, and one of the plurality of electronic components 89U, 89V, 89W or the plurality of leads 4A to 4H, 4J to 4N, It is connected to any of the pad portions 43A to 43H, 43J to 43N, and 43P to 43R of 4P to 4R. Therefore, each wire 6L connects the first control element 8A or the second control element 8B to each of the leads 4A to 4H, 4J to 4N, and 4P to 4R.
  • each wire 6A to 6F has a larger wire diameter than each wire 6H, 6J to 6L, 61G, 61Q, 62G, and 62Q. This is because when the semiconductor device A1 is configured as an IPM, a higher voltage is applied to the plurality of leads 3A to 3G than to the plurality of leads 4A to 4F, and a larger current flows through the plurality of leads 3A to 3G.
  • Each wire 6A to 6F is made of, for example, Al or an Al alloy.
  • the constituent material of each wire 6A to 6F may be Au or an Au alloy, or Cu or a Cu alloy instead of Al or an Al alloy.
  • Each wire 6H, 6J to 6L, 61G, 61Q, 62G, 62Q is made of, for example, Au or an Au alloy.
  • the constituent material of each wire 6H, 6J to 6L, 61G, 61Q, 62G, 62Q may be Al or Al alloy, Cu or Cu alloy instead of Au or Au alloy.
  • the sealing member 7 includes a plurality of first switch sections 1, a plurality of second switch sections 2, a first control element 8A, a second control element 8B, A plurality of electronic components 89U, 89V, 89W, a portion of each of the plurality of leads 3A to 3G, 3Z, a portion of each of the plurality of leads 4A to 4H, 4J to 4N, 4P to 4R, and the support substrate 51. It covers a part and a plurality of connection members 6.
  • the sealing member 7 is, for example, a black epoxy resin.
  • the sealing member 7 has a resin main surface 71, a resin back surface 72, and a plurality of resin side surfaces 73 to 76.
  • the resin main surface 71 and the resin back surface 72 are spaced apart in the z direction.
  • the main resin surface 71 faces upward in the z direction (z1 side in the z direction), and the resin back surface 72 faces downward in the z direction (z2 side in the z direction).
  • the main resin surface 71 and the resin back surface 72 are each substantially flat.
  • Each of the plurality of resin side surfaces 73 to 76 is located between and connected to the resin main surface 71 and the resin back surface 72 in the z direction.
  • the pair of resin side surfaces 73 and 74 are spaced apart in the x direction.
  • a pair of resin side surfaces 73 and 74 face oppositely to each other in the x direction.
  • the pair of resin side surfaces 75 and 76 are spaced apart in the y direction.
  • a pair of resin side surfaces 75 and 76 face opposite to each other in the y direction.
  • a recess 731 recessed in the x direction is formed in the resin side surface 73.
  • a recess 741 recessed in the x direction is formed in the resin side surface 74.
  • the recess 731 and the recess 741 are used, for example, to fix the semiconductor device A1 when it is mounted.
  • a plurality of recesses 761 are formed in the resin side surface 76, each recessed in the y direction.
  • the first DC voltage applied to the terminal portion 32A (lead 3A) and the terminal portion 32E (lead 3E) is changed to the first AC voltage by each switching operation of the first arm 1A and the fourth arm 2A. converted to voltage. Then, the first AC voltage is output from the terminal portion 32B (lead 3B). Further, the second DC voltage applied to the terminal portion 32A (lead 3A) and the terminal portion 32F (lead 3F) is converted into a second AC voltage by each switching operation of the second arm 1B and the fifth arm 2B. be done. Then, the second AC voltage is output from the terminal portion 32C (lead 3C).
  • the third DC voltage applied to the terminal part 32A (lead 3A) and the terminal part 32G (lead 3G) is converted into a third AC voltage by each switching operation of the third arm 1C and the sixth arm 2C. be done. Then, the third AC voltage is output from the terminal portion 32D (lead 3D).
  • each switching element 11A, 11B, 11C and each switching element 21A, 21B, 21C is an IGBT
  • each switching element 12A, 12B, 12C and each switching element 22A, 22B, 22C is each an IGBT.
  • MOSFET MOSFET
  • each protection element 13A, 13B, 13C and each protection element 23A, 23B, 23C is a Schottky barrier diode, respectively.
  • the parasitic diodes of each switching element 12A, 12B, 12C and each switching element 22A, 22B, 22C are also illustrated.
  • the collector (electrode 211) of each switching element 21A, 21B, 21C, the drain (electrode 221) of each switching element 22A, 22B, 22C, and the cathode (electrode 131) of each protection element 23A, 23B, 23C are connected to each other, Connected to the terminal (lead 3A).
  • the emitter (electrode 212) of the switching element 21A, the source (electrode 222) of the switching element 22A, and the anode (electrode 231) of the protection element 23A are connected to the collector (electrode 111) of the switching element 11A and the switching element 21A through the connection point N1.
  • Connection point N1 is connected to the U terminal (lead 3B).
  • the emitter (electrode 212) of the switching element 21B, the source (electrode 222) of the switching element 22B, and the anode (electrode 231) of the protection element 23B are connected to the collector (electrode 111) of the switching element 11B and the switching element 11B via the connection point N2.
  • Connection point N2 is connected to the V terminal (lead 3C).
  • the emitter (electrode 212) of the switching element 21C, the source (electrode 222) of the switching element 22C, and the anode (electrode 231) of the protection element 23C are connected to the collector (electrode 111) of the switching element 11C and the switching element 11C via the connection point N3. It is connected to the drain of 12C (electrode 121) and the cathode (electrode 132) of protection element 13C. Connection point N3 is connected to the W terminal (lead 3D).
  • the emitter (electrode 112) of the switching element 11A, the source (electrode 122) of the switching element 12A, and the anode (electrode 131) of the protection element 13A are connected to the NU terminal (lead 3E).
  • the emitter (electrode 112) of the switching element 11B, the source (electrode 122) of the switching element 12B, and the anode (electrode 131) of the protection element 13B are connected to the NV terminal (lead 3F).
  • the emitter (electrode 112) of the switching element 11C, the source (electrode 122) of the switching element 12C, and the anode (electrode 131) of the protection element 13C are connected to the NW terminal (lead 3G).
  • the voltage levels applied to the U terminal (lead 3B), V terminal (lead 3C), and W terminal (lead 3D) are, for example, about 0V to 650V.
  • the voltage level applied to the NU terminal (lead 3E), NV terminal (lead 3F), and NW terminal (lead 3G) is, for example, about 0V
  • the gate (electrode 213) of each switching element 21A, 21B, 21C and the gate (electrode 223) of each switching element 22A, 22B, 22C are respectively connected to the second control element 8B.
  • the sources (electrodes 222) of each switching element 22A, 22B, 22C are respectively connected to the second control element 8B.
  • the gate (electrode 113) of each switching element 11A, 11B, 11C and the gate (electrode 123) of each switching element 12A, 12B, 12C are respectively connected to the first control element 8A.
  • the LINU terminal (lead 4Q), LINV terminal (lead 4J), and LINW terminal (lead 4K) are connected to an external gate control circuit, and the first input signal is input from the gate control circuit.
  • the HINU terminal (lead 4E), HINV terminal (lead 4F), and HINW terminal (lead 4G) are connected to the gate control circuit (not shown), and a second input signal is input from the gate control circuit.
  • the first control element 8A includes a LINU terminal (lead 4Q), a LINV terminal (lead 4J), a LINW terminal (lead 4K), a second VCC terminal (lead 4L), an FO terminal (lead 4M), a CIN terminal (lead 4N), And it is electrically connected to the second GND terminal (lead 4R). Further, the first control element 8A is also electrically connected to the first GND terminal (lead 4H).
  • the second VCC terminal is a terminal that supplies the power supply voltage VCC to the first control element 8A.
  • a first input signal is input to the first control element 8A from the LINU terminal, LINV terminal, and LINW terminal.
  • the first control element 8A generates the first drive signal (for example, gate voltage) based on the input first input signal.
  • the generated first drive signal is then input to the gate (electrode 113) of each switching element 11A, 11B, 11C and the gate (electrode 123) of each switching element 12A, 12B, 12C.
  • the second control element 8B includes a VBU terminal (lead 4A), a VBV terminal (lead 4B), a VBW terminal (lead 4C), a HINU terminal (lead 4D), a HINV terminal (lead 4E), a HINW terminal (lead 4F), and a VBU terminal (lead 4B). It is electrically connected to the 1VCC terminal (lead 4G) and the first GND terminal (lead 4H). Further, the second control element 8B is also electrically connected to the second GND terminal (lead 4R).
  • the first VCC terminal is a terminal that supplies the power supply voltage VCC to the second control element 8B.
  • a second input signal is input to the second control element 8B from the HINU terminal, HINV terminal, and HIINW terminal.
  • the second control element 8B generates the second drive signal (for example, gate voltage) based on the input second input signal.
  • the generated second drive signal is then input to the gate (electrode 213) of each switching element 21A, 21B, 21C and the gate (electrode 223) of each switching element 22A, 22B, 22C.
  • the first GND terminal (lead 4H) and the second GND terminal (lead 4R) are connected inside the semiconductor device A1 and have the same potential. Unlike this configuration, the first GND terminal (lead 4H) and the second GND terminal (lead 4R) may be separated from each other inside the semiconductor device A1 and may have different potentials.
  • the functions and effects of the semiconductor device A1 are as follows.
  • the semiconductor device A1 includes at least one first switch section 1 and a first control element 8A.
  • Each of the at least one first switch section 1 has a switching element 11 and a switching element 12.
  • the first control element 8A is arranged on the y1 side in the y direction than the switching element 11 and the switching element 12, and the switching element 12 is arranged between the first control element 8A and the switching element 11 in the y direction. placed between.
  • the first control element 8A and the switching element 11 are directly connected with one wire, and the first control element 8A and the switching element 12 are connected directly. If these are directly connected with one wire, the wire connected to the switching element 11 relatively far from the first control element 8A becomes long.
  • the semiconductor device A1 the main surface wiring section 125 is provided in the switching element 12, the first control element 8A and the main surface wiring section 125 are connected with the wire 61G, and the main surface wiring section 125 and the switching element 11 are connected with the wire 61G. I configured it to connect at 62G.
  • each of the wires 61G and 62G becomes shorter than when the first control element 8A and the switching element 11 are directly connected with one wire.
  • the semiconductor device A1 can suppress the wire flow of each of the wires 61G and 62G. Therefore, the semiconductor device A1 has a more preferable structure in which a plurality of switching elements (switching element 11 and switching element 12) are operated as one first switch section 1.
  • each of the switching elements 21 and 22 of the at least one second switch section 2 and the second control element 8B is provided with the main surface wiring section 225, the second control element 8B and the main surface wiring section 225 are connected with the wire 61Q, and the main surface wiring section 225 and the switching element 21 are connected with the wire 61Q. I configured it to connect with 62Q.
  • each wire 61Q, 62Q can be made shorter than when the second control element 8B and the switching element 21 are directly connected with one wire.
  • the semiconductor device A1 can suppress the wire flow of each of the wires 61Q and 62Q. Therefore, the semiconductor device A1 has a more preferable structure in which a plurality of switching elements (switching element 21 and switching element 22) are operated as one second switch section 2.
  • the switching element 11 and the switching element 12 in each first switch section 1 are of different types.
  • switching elements such as IGBTs, MOSFETs, and bipolar transistors
  • MOSFETs and IGBTs exhibit the following electrical characteristics due to differences in physical properties and structures.
  • MOSFETs have faster switching speeds than IGBTs and lower switching losses than IGBTs.
  • IGBTs have lower on-resistance than MOSFETs and lower steady-state losses than MOSFETs in large current ranges. Therefore, in the semiconductor device A1, the switching element 11 is configured with an IGBT, and the switching element 12 is configured with a MOSFET.
  • switching loss can be reduced by controlling so that a large amount of current flows through the switching element 12, and when each first switch section 1 is in a steady state, By controlling so that a large amount of current flows through the switching element 11, steady-state loss can be reduced. Therefore, the semiconductor device A1 in which the switching element 11 is configured with an IGBT and the switching element 12 is configured with a MOSFET can reduce both switching loss and steady loss, and reduce power loss. In other words, the semiconductor device A1 can improve conversion efficiency.
  • the switching element 11 and the switching element 12 are made of different types, they can be operated so as to complement each other's electrical characteristics, so a plurality of switching elements (switching element 11 and switching element 12) can be combined into one.
  • This is preferable for operating as one first switch section 1.
  • This also applies to the relationship between the switching elements 21 and 22 in each second switch section 2. That is, in the semiconductor device A1, it is preferable to use different types of the switching element 21 and the switching element 22 in order to operate the plurality of switching elements (switching element 21 and switching element 22) as one second switch section 2. .
  • the switching element 21 is an IGBT and the switching element 22 is a MOSFET, both switching loss and steady loss can be reduced, and power loss can be reduced.
  • the semiconductor device A2 includes a plurality of first switch sections 1, a plurality of second switch sections 2, a first control element 8A, a second control element 8B, and a plurality of electronic components 89U, 89V, 89W. , a plurality of leads 3A to 3G, 3Z, a plurality of leads 4A to 4H, 4J to 4N, 4P to 4R, a support substrate 51, a wiring pattern 52, a plurality of connection members 6, and a sealing member 7. That is, the semiconductor device A2 differs from the semiconductor device A1 mainly in that it further includes the wiring pattern 52.
  • the wiring pattern 52 is formed on the first surface 511 of the support substrate 51.
  • the wiring pattern 52 is made of a conductive material.
  • the wiring pattern 52 is covered with the sealing member 7.
  • the wiring pattern 52 includes a plurality of wiring parts 52A to 52H, 52J to 52N, 52P to 52R, and a plurality of joint parts 53A to 53D.
  • a plurality of wiring portions 52A to 52H, 52J to 52N, and 52P to 52R are formed on the support substrate 51, respectively.
  • each wiring portion 52A to 52H, 52J to 52N, and 52P to 52R is formed on the first surface 511 of the support substrate 51.
  • Each wiring portion 52A to 52H, 52J to 52N, and 52P to 52R is made of a conductive material.
  • the conductive material constituting each of the wiring portions 52A to 52H, 52J to 52N, and 52P to 52R is not particularly limited, but includes, for example, materials containing Ag, Cu, Au, and the like.
  • each of the wiring portions 52A to 52H, 52J to 52N, and 52P to 52R contains Ag.
  • each of the wiring portions 52A to 52H, 52J to 52N, and 52P to 52R may contain Cu instead of Ag, or may contain Au instead of Ag or Cu.
  • each of the wiring portions 52A to 52H, 52J to 52N, and 52P to 52R may contain Ag-Pt or Ag-Pd.
  • the method of forming each of the wiring portions 52A to 52H, 52J to 52N, and 52P to 52R is not limited, and may be formed, for example, by printing a paste containing these metals and then firing it.
  • the wiring part 52H and the wiring part 52R are integrally formed, and the other parts are spaced apart from each other. Unlike this example, the wiring portion 52H and the wiring portion 52R may be spaced apart from each other.
  • the wiring portion 52A, the wiring portion 52B, and the wiring portion 52C are arranged on the x1 side in the x direction with respect to the wiring portion 52D.
  • a wire 6L connected to the second control element 8B and an electronic component 89U are joined to the wiring portion 52A. Further, the lead 4A is joined to the wiring portion 52A.
  • the wire 6L and the electronic component 89V that are bonded to the second control element 8B are bonded to the wiring portion 52B. Further, the lead 4B is joined to the wiring portion 52B.
  • the wire 6L and the electronic component 89W, which are bonded to the second control element 8B, are bonded to the wiring portion 52C. Further, the lead 4C is joined to the wiring portion 52C.
  • the wiring portion 52D is arranged on the x2 side in the x direction than the wiring portion 52C.
  • the wire 6L connected to the second control element 8B is connected to the wiring portion 52D.
  • a lead 4D is joined to the wiring portion 52D.
  • the plurality of wiring parts 52E, 52F, and 52G are arranged on the x2 side in the x direction with respect to the wiring part 52D.
  • Wires 6L connected to the second control element 8B are connected to the plurality of wiring parts 52E, 52F, and 52G, respectively.
  • a corresponding one of the plurality of leads 4E, 4F, and 4G is connected to each of the plurality of wiring portions 52E, 52F, and 52G.
  • a second control element 8B is mounted on the wiring section 52H. Further, the lead 4H is joined to the wiring portion 52H.
  • the wiring section 52H includes a pad section 521H, as shown in FIG. 15.
  • the pad portion 521H is a portion of the wiring portion 52H to which the second control element 8B is bonded.
  • the pad portion 521H has a rectangular shape in plan view.
  • the first control element 8A is mounted on the wiring section 52R. Further, the lead 4R is joined to the wiring portion 52R.
  • the wiring section 52R includes a pad section 521R, as shown in FIG. 15.
  • the pad portion 521R is a portion of the wiring portion 52R to which the first control element 8A is bonded.
  • the pad portion 521R has a rectangular shape in plan view.
  • the plurality of wiring parts 52Q, 52J, 52K, 52L, 52M, and 52N are arranged on the x2 side in the x direction with respect to the wiring part 52H.
  • Wires 6L connected to the first control element 8A are connected to the plurality of wiring parts 52Q, 52J, 52K, 52L, 52M, and 52N, respectively.
  • each of the plurality of wiring parts 52Q, 52J, 52K, 52L, 52M, and 52N has a corresponding one of the plurality of leads 4Q, 4J, 4K, 4L, 4M, and 4N. Joined.
  • the lead 4P is joined to the wiring portion 52P.
  • the wire 6L is not joined to the wiring portion 52P.
  • the leads 4A to 4H, 4J to 4N, corresponding to the wiring portions 52A to 52H, 52J to 52N, 52P to 52R the leads 4A to 4H, 4J to 4N, corresponding to the wiring portions 52A to 52H, 52J to 52N, 52P to 52R.
  • the portion where 4P to 4R are bonded is arranged along the periphery of the support substrate 51 in plan view.
  • the plurality of joints 53A to 53D are each formed on the support substrate 51.
  • the respective joint portions 53A to 53D are formed on the first surface 511 of the support substrate 51, similarly to the respective wiring portions 52A to 52H, 52J to 52N, and 52P to 52R.
  • the joint 53A is arranged below the mounting parts 311A, 312A, 313A of the lead 3A (z2 side in the z direction), and the joint 53B is arranged below the mounting part 31B of the lead 3B.
  • each of the bonding parts 53A to 53D is not particularly limited, and is made of a material that can bond the support substrate 51 and each of the leads 3A to 3D.
  • Each joint 53A to 53D is made of, for example, a conductive material.
  • the conductive material constituting each of the joints 53A to 53D is not particularly limited, but includes, for example, materials containing Ag, Cu, Au, and the like.
  • Each of the joint portions 53A to 53D includes the same conductive material that constitutes each of the wiring portions 52A to 52H, 52J to 52N, and 52P to 52R.
  • each of the joint portions 53A to 53D may contain copper instead of silver, or may contain gold instead of silver or copper.
  • each joint portion 53A to 53D may contain Ag-Pt or Ag-Pd.
  • the method of forming each of the joint parts 53A to 53D is not limited, and for example, similarly to each of the wiring parts 52A to 52H, 52J to 52N, and 52P to 52R, a paste containing these metals may be printed and then fired. It is formed.
  • the material of each joint 53A to 53D may not be electrically conductive.
  • the wiring pattern 52 does not have to include each of the plurality of joints 53A to 53D.
  • the semiconductor device A2 the plurality of leads 4A to 4H, 4J to 4N, and 4P to 4R are each connected to the wiring pattern 52. Also. Compared to the semiconductor device A1, the semiconductor device A2 further includes a lead 4Z.
  • the plurality of leads 4A to 4H, 4J to 4N, and 4P to 4R are arranged on the x2 side in the x direction with respect to the lead 4Z.
  • lead 4A will be described in detail, but other leads 4B to 4H, 4J to 4N, and 4P to 4R also include similar constituent parts.
  • the lead 4A includes a terminal portion 42A, a connecting portion 44A, and a joining portion 46A, as shown in FIG. 15 and the like.
  • the terminal portion 42A of the semiconductor device A2 is configured similarly to the terminal portion 42A of the semiconductor device A1.
  • the connecting portion 44A connects the terminal portion 42A and the joint portion 46A.
  • the bonding portions 46A are bonded to the wiring portions 52A via the conductive bonding material 49, respectively.
  • the bonding portions 46B (46C to 46H, 46J to 46N, 46P to 46R) are bonded to the wiring portions 52B (52C to 52H, 52J to 52N, 52P to 52R), respectively, via the conductive bonding material 49. Ru.
  • the conductive bonding material 49 is, for example, solder, metal paste material, sintered metal, or the like. As shown in FIG. 19, a through hole 461C is formed in the joint portion 46C. Unlike this configuration, the through hole 461C does not need to be formed in the joint portion 46C. Further, although through holes are formed in the other joint portions 46A, 46B, 46D to 46H, 46J to 46N, and 46P to 46R, the through holes may not be formed.
  • the lead 4Z is arranged on the x1 side in the x direction with respect to the lead 4A.
  • the lead 4Z is not electrically connected to any of the plurality of first switch sections 1, the plurality of second switch sections 2, the first control element 8A, and the second control element 8B.
  • the lead 4Z includes a pad portion 43Z and a protruding portion 45Z, as shown in FIG. 15. The pad portion 43Z and the protruding portion 45Z are connected.
  • the pad portion 43Z is covered with the sealing member 7. As shown in FIG. 15, the pad portion 43Z does not overlap the support substrate 51 in plan view.
  • the protruding portion 45Z extends from the pad portion 43Z toward the y1 side in the y direction, and protrudes from the sealing member 7, as shown in FIG.
  • the semiconductor device A2 can also have the same functions and effects as the semiconductor device A1.
  • the semiconductor device A2 has a more preferable structure in which a plurality of switching elements (switching element 11 and switching element 12) are operated as one first switch section 1.
  • the semiconductor device A2 includes a support substrate 51 and a wiring pattern 52 formed on the first surface 511.
  • the wiring pattern 52 includes a plurality of wiring parts 52A to 52H, 52J to 52N, 52P to 52R, and the plurality of wiring parts 52A to 52H, 52J to 52N, 52P to 52R are connected to the first control element 8A and the second control element.
  • 8B transmits a control signal (for example, the above-mentioned first input signal and the above-mentioned second input signal) for controlling the plurality of first switch sections 1 and the plurality of second switch sections 2, and the control signal of the control signal is Configure the transmission path.
  • the plurality of wiring parts 52A to 52H, 52J to 52N, and 52P to 52R are formed by, for example, printing a paste containing Ag and then firing it. According to this configuration, it is possible to make the transmission path thinner and higher in density than, for example, when the transmission path of the control signal is configured using a metal lead frame. Therefore, the semiconductor device A2 can be highly integrated.
  • FIG. 20 shows a semiconductor device A21 according to a modification of the second embodiment.
  • FIG. 20 is a cross-sectional view showing the semiconductor device A21, and corresponds to the cross-section shown in FIG. 19.
  • the dimension in the z direction of the second control element 8B of the semiconductor device A21 is larger than the dimension in the z direction of the second control element 8B of the semiconductor device A2.
  • FIG. 20 shows the relationship between the second control element 8B and the fifth arm 2B (switching element 21B, switching element 22B, and protection element 23B), the relationship between the second control element 8B and the fourth arm 2A
  • the relationships between the second control element 8B and the sixth arm 2C may also be the same.
  • the relationship between the first control element 8A and each first switch section 1 (each of the first arm 1A, second arm 1B, and third arm 1C) may be the same.
  • the semiconductor device A21 As shown in FIG. There is a difference in height in the z direction between Therefore, even if the thickness of the second control element 8B is larger than each thickness of the switching element 21B, the switching element 22B, and the protection element 23B, the element main surface 21a of the switching element 21B and the element main surface 22a of the switching element 22B
  • the element main surface 23a of the protection element 23B and the upper surface (the surface facing the z1 side in the z direction) of the second control element 8B are at the same (or substantially the same) height.
  • the semiconductor device A21 also has the same functions and effects as the semiconductor device A2.
  • the element main surface 21a of the switching element 21, the element main surface 22a of the switching element 22, the element main surface 23a of the protection element 23, and the upper surface of the second control element 8B Since the wires 61Q, 62Q, 6J, and 6K are at the same (or substantially the same) height, the wires 61Q, 62Q, 6J, and 6K can be easily joined.
  • the switching element 21B, the switching element 22B, and the protection element 23B have the same (or approximately the same) thickness, but if these are different types, the thickness of each may be different. There are different things. In such a case, for example, if the thickness of the lead 3A (mounting portion 312A) is partially changed, the element main surface 21a of the switching element 21B, the element main surface 22a of the switching element 22B, and the element main surface 23a of the protection element 23B can be changed. It is possible to make the heights the same.
  • each thickness of the switching element 21, the switching element 22, and the protection element 23, and each thickness of the second control element 8B are different from each other. Good too.
  • the element main surface 21a of the switching element 21, the element main surface 22a of the switching element 22, the element main surface 23a of the protection element 23, and the second control It is possible to make the upper surface of the element 8B (the surface facing the z1 side in the z direction) the same (or substantially the same) height.
  • FIGS. 21 and 22 show a semiconductor device A3 according to the third embodiment.
  • the semiconductor device A3 differs from the semiconductor device A2 in the following points. That is, as shown in FIGS. 21 and 22, the size of each switching element 11 in plan view and the size of each switching element 21 in plan view are each large.
  • each switching element 11 contains Si as a semiconductor material
  • each switching element 12 contains SiC as a semiconductor material.
  • the on-resistance of the switching element 11 may be larger than the on-resistance of the switching element 12. Therefore, in the semiconductor device A3, as shown in FIG. 21, the planar view size of the switching element 11 is made larger than the planar view size of the switching element 11 of the semiconductor device A1. Due to the large size of the switching element 11 in plan view, the on-resistance of the switching element 11 becomes small, and the on-resistance has a characteristic value close to the on-resistance of the switching element 12.
  • the x-direction dimension of the switching element 11 remains the same (or approximately the same) as the x-direction dimension of the switching element 12, and the y-direction dimension of the switching element 11 is larger than the y-direction dimension of the switching element 12. It's also big. By enlarging the size of the switching element 11 in plan view in this manner, it is possible to suppress the generation of wasted space in each of the mounting portions 31B, 31C, and 31D.
  • each switching element 21 contains Si as a semiconductor material
  • each switching element 22 contains SiC as a semiconductor material.
  • the on-resistance of the switching element 21 may be larger than the on-resistance of the switching element 22. Therefore, in the semiconductor device A3, as shown in FIG. 22, the planar view size of the switching element 21 is made larger than the planar view size of the switching element 21 of the semiconductor device A1. Since the size of the switching element 21 in plan view is large in this way, the on-resistance of the switching element 21 becomes small, and the on-resistance has a characteristic value close to the on-resistance of the switching element 22.
  • the x-direction dimension of the switching element 21 remains the same (or approximately the same) as the x-direction dimension of the switching element 22, and the y-direction dimension of the switching element 21 is larger than the y-direction dimension of the switching element 22. It's also big. By enlarging the size of the switching element 21 in plan view in this manner, it is possible to suppress the generation of wasted space in each of the mounting portions 311A, 312A, and 313A.
  • the semiconductor device A3 according to the present embodiment also has the same functions and effects as the semiconductor device A1. Further, as understood from the present embodiment, the semiconductor device of the present disclosure is not limited to a configuration in which the switching element 11 and the switching element 12 have the same (or substantially the same) size in plan view; Also includes configurations with different visual sizes. This also applies to switching element 21 and switching element 22.
  • FIG. 23 shows a semiconductor device A31 according to a modification of the second embodiment.
  • the semiconductor device A31 differs from the semiconductor device A3 in the following points. That is, in each of the first switch sections 1 (each of the first arm 1A, second arm 1B, and third arm 1C), the switching element 11 is arranged closer to the y1 side than the switching element 12 in the y direction. That is, the switching element 11 is located between the first control element 8A and the switching element 12 in the y direction.
  • the switching element 11 is an example of a "second switching element" as set forth in the claims
  • the switching element 12 is an example of a "first switching element” as set forth in the claims. .
  • each switching element 12 does not have the main surface wiring section 125.
  • each switching element 11 has a main surface wiring section 115.
  • the main surface wiring section 115 is provided on the element main surface 11a.
  • the main surface wiring section 115 is not electrically connected to the switching function section of the switching element 11 .
  • the main surface wiring section 115 is configured similarly to the main surface wiring section 125 in the switching element 12 .
  • the plurality of connection members 6 include a wire 6G instead of the two wires 61G and 62G, and include two wires 61H and 62H instead of the wire 6H.
  • the wire 6G is connected to the electrode 81 of the first control element 8A and the electrode 113 of the switching element 11, making them conductive.
  • the wire 61H is joined to the electrode 81 of the first control element 8A and the main surface wiring portion 115 of the switching element 11, thereby making them conductive.
  • the wire 62H is connected to the main surface wiring portion 115 of the switching element 11 and the electrode 123 of the switching element 12, thereby making them conductive.
  • the semiconductor device A31 also has the same functions and effects as the semiconductor device A3. Further, in the semiconductor device A31, each of the wires 6D, 6E, and 6F can be made shorter than in the semiconductor device A3.
  • each wire 6A, 6B, 6C can be shortened.
  • each first switch section 1 does not have the protection element 13.
  • each second switch section 2 does not have the protection element 23.
  • the switching element 11 of each first switch section 1 is a reverse conduction IGBT, and as shown in FIG. 27, includes a switching function section and a diode function section.
  • the switching function section operates as an IGBT
  • the diode function section operates as a freewheeling diode. That is, each switching element 11 of this embodiment includes a diode function section (freewheeling diode).
  • each switching element 11 is formed by combining the switching element 11 and the protection element 13 of the semiconductor device A1 into one chip, and includes a diode function section (freewheeling diode). As shown in FIG. 27, in each switching element 11, the switching function section and the diode function section are electrically connected in antiparallel relationship.
  • each switching element 21 of each second switch section 2 is a reverse conduction IGBT, and includes a switching function section and a diode function section, as shown in FIG. 27.
  • the switching function section operates as an IGBT
  • the diode function section operates as a freewheeling diode. That is, each switching element 21 of this embodiment includes a diode function section (freewheeling diode).
  • each switching element 21 is a single chip of the switching element 21 and the protection element 23 of the semiconductor device A1. As shown in FIG. 27, in each switching element 21, the switching function section and the diode function section are electrically connected in antiparallel relationship.
  • the semiconductor device A4 according to this embodiment also has the same functions and effects as the semiconductor device A1.
  • the semiconductor device A4 has a more preferable structure in which a plurality of switching elements (switching element 11 and switching element 12) are operated as one first switch unit 1.
  • FIGS. 28 to 34 show other configuration examples of the main surface wiring section 125 (switching element 12).
  • FIGS. 28 to 34 are enlarged plan views of main parts showing the main surface wiring section 125 (switching element 12) according to each modification.
  • FIGS. 28 to 34 show examples in which the configuration of the switching element 12 is changed in the semiconductor device A1, the same configuration can be applied to the other semiconductor devices A2, A3, and A4.
  • FIGS. 28 to 34 show other configuration examples of the main surface wiring section 125 of the switching element 12, the main surface wiring section 225 of the switching element 22 can also be configured in a similar manner.
  • the dimension of the connecting portion 125c in the x direction is smaller than the dimensions of the first pad portion 125a and the second pad portion 125b in the x direction.
  • the main surface wiring portion 125 has a dumbbell shape in plan view.
  • the main surface wiring section 125 shown in FIG. 28 has a smaller planar area compared to the main surface wiring section 125 in the semiconductor device A1, so that the manufacturing cost of the switching element 12 can be reduced.
  • the second pad portion 125b is located on the x1 side in the x direction and on the y2 side in the y direction with respect to the first pad portion 125a.
  • the main surface wiring section 125 has a rectangular shape in which the first pad section 125a and the second pad section 125b are two diagonally located corners among the four corners when viewed from above. .
  • the planar area is enlarged compared to the main surface wiring section 125 in the semiconductor device A1, so that the degree of freedom in the bonding position of each wire 61G, 62G is increased.
  • the main surface wiring section 125 is arranged along a part of the periphery of the element main surface 12a in plan view, and has a band shape along the edge on the x2 side in the x direction.
  • the periphery refers to the entire outer periphery of the object (for example, the outer periphery of the element main surface 12a in a plan view)
  • the edge refers to any part of the outer periphery of the object (for example, the outer periphery of the element main surface 12a in a plan view). It's about the area.
  • the connecting section 125c has a larger dimension in the y direction than the main surface interconnection section 125 in the semiconductor device A1.
  • the main surface wiring section 125 straddles both sides of the element main surface 12a with the center in the y direction interposed therebetween.
  • the electrodes 122 are not arranged on both sides of the main surface wiring section 125 in the y direction.
  • the main surface wiring section 125 is also formed on the y2 side in the y direction of the element main surface 12a from the center in the y direction. Therefore, in the configuration shown in FIG. 30, the wire 62G can be further shortened compared to the semiconductor device A1. Further, in the configuration shown in FIG.
  • the main surface wiring section 125 is formed along the edge of the element main surface 12a on the x2 side in the x direction, so that an appropriate area of the electrode 122 in plan view can be secured. That is, in the configuration shown in FIG. 30, the main surface wiring portion 125 does not become an obstacle when joining the wires 6E (6D, 6F).
  • the position of the electrode 123 is changed from the example shown in FIG. 30.
  • the electrode 123 is arranged on the x2 side in the x direction of the device main surface 12a divided into three equal parts in the x direction.
  • the electrode 123 is arranged at the center of the element main surface 12a divided into three equal parts in the x direction, and in the example shown in FIG. is placed on the x1 side of the x-direction, which is divided into three equal parts in the x-direction. Even with these configurations, the same effects as the configuration shown in FIG. 30 can be achieved. Furthermore, in the configurations shown in FIGS.
  • the distance between the main surface wiring portion 125 and the electrode 123 can be increased compared to the configuration shown in FIG. 30. Thereby, the wire 61G joined to the main surface wiring part 125 and the wire 6H joined to the electrode 123 can be prevented from being unintentionally short-circuited.
  • the main surface wiring section 125 is arranged at the center of the element main surface 12a divided into three equal parts in the x direction.
  • the position of the main surface wiring section 125 can be changed as appropriate depending on the positional relationship with the first control element 8A and the switching element 11.
  • the main surface wiring section 125 is arranged along a part of the periphery of the element main surface 12a in plan view.
  • the main surface wiring section 125 includes a first strip section 1251 and a second strip section 1252.
  • the first strip portion 1251 and the second strip portion 1252 are integrally formed.
  • the first strip portion 1251 extends along the edge of the element main surface 12a on the x2 side in the x direction in plan view.
  • the first pad portion 125a is a part of the first strip portion 1251.
  • the second strip portion 1252 extends along the edge of the element main surface 12a on the y2 side in the y direction in plan view.
  • the second pad portion 125b is a part of the second strip portion 1252.
  • the surplus portion in which none of the element 21, the plurality of switching elements 22, and the plurality of protection elements 23 are mounted may be further reduced. Reducing the surplus portion in this way is preferable in reducing the planar view size of the semiconductor device.
  • the semiconductor device according to the present disclosure is not limited to the embodiments described above.
  • the specific configuration of each part of the semiconductor device of the present disclosure can be modified in various ways.
  • the semiconductor device of the present disclosure includes embodiments related to the following additional notes. Additional note 1. at least one first switch section each including a first switching element and a second switching element; a first control element that inputs a first drive signal to the first switching element and the second switching element; a mounting section on which the first switching element and the second switching element are mounted; a plurality of wires including a first wire, a second wire and a third wire; Equipped with In each of the at least one first switch section, the first switching element and the second switching element are electrically connected in parallel,
  • the first switching element has a first main surface facing one of the thickness directions of the mounting section, and a first control electrode disposed on the first main surface
  • the second switching element has a second main surface facing one side in the thickness direction, a second control electrode and a main surface wiring section disposed on the second main surface,
  • Appendix 2 The semiconductor device according to appendix 1, wherein the main surface wiring section includes a first pad section to which the first wire is bonded and a second pad section to which the second wire is bonded. Appendix 3. The first pad portion and the second pad portion are arranged along the first direction when viewed in the thickness direction, The semiconductor device according to appendix 2, wherein the first pad portion is located closer to the first control element than the second pad portion in the first direction. Appendix 4. The semiconductor device according to appendix 3, wherein the main surface wiring section includes a connecting section that connects the first pad section and the second pad section. Appendix 5.
  • a dimension of the connecting portion in the thickness direction and a second direction perpendicular to the first direction is the same as a dimension of each of the first pad portion and the second pad portion in the second direction.
  • a dimension of the connecting portion in the thickness direction and a second direction perpendicular to the first direction is smaller than a dimension in the second direction of each of the first pad portion and the second pad portion.
  • the second pad section is located on one side in the first direction with respect to the first pad section, and on the other side in a second direction perpendicular to the thickness direction and the first direction.
  • the second control electrode is located closer to the first control element in the first direction than the center of the second main surface in the first direction.
  • Appendix 9. In the second main surface, each of the second control electrode and the main surface wiring section is arranged at a central portion in a second direction perpendicular to the thickness direction and the first direction.
  • Appendix 10. The semiconductor device according to appendix 8, wherein the main surface wiring section is arranged along a part of the periphery of the second main surface when viewed in the thickness direction.
  • Appendix 11. 11 The semiconductor device according to appendix 10, wherein the main surface wiring section has a band shape along one edge of the second main surface in the second direction when viewed in the thickness direction.
  • the main surface wiring portion When viewed in the thickness direction, the main surface wiring portion includes a first band-shaped portion along one edge of the second main surface in the second direction, and a first band-shaped portion along one edge of the second main surface in the second direction; a second band-shaped portion along the other edge of the main surface in the first direction;
  • the semiconductor device according to appendix 10 wherein the first strip portion and the second strip portion are integrally formed.
  • the at least one first switch section includes a plurality of first switch sections, The semiconductor device according to any one of appendices 1 to 12, wherein the plurality of first switch sections include a first arm, a second arm, and a third arm, each of which has a first switching element and a second switching element.
  • the first arm, the second arm, and the third arm are arranged in the thickness direction and a second direction perpendicular to the first direction,
  • the third switching element has a third main surface facing one side in the thickness direction, and a third control electrode disposed on the third main surface
  • the fourth switching element has a fourth main surface facing one side in the thickness direction, a fourth control electrode and a second main surface wiring section disposed on the fourth main surface
  • the plurality of wires include a fourth wire, a fifth wire, and a sixth wire, the fourth wire is joined to the second control element and the second main surface wiring section, the fifth wire is joined to the second main surface wiring section and the third control electrode, the sixth wire is joined to the second control element and the fourth control electrode,
  • the second control element is arranged on one side in the first direction than the third switching element and the fourth switching element
  • the at least one second switch section includes a plurality of second switch sections,
  • the plurality of second switch parts include a fourth arm, a fifth arm, and a sixth arm,
  • the fourth arm, the fifth arm, and the sixth arm are arranged in a second direction perpendicular to the thickness direction and the first direction,
  • the semiconductor device according to appendix 15, wherein the fifth arm is located between the fourth arm and the sixth arm in the second direction.
  • the first arm is a lower arm
  • the fourth arm is an upper arm
  • the first arm and the fourth arm are electrically connected in series to constitute a first phase of a three-phase AC circuit
  • the second arm is a lower arm
  • the fifth arm is an upper arm
  • the second arm and the fifth arm are electrically connected in series to constitute a second phase of the three-phase AC circuit
  • the third arm is a lower arm
  • the sixth arm is an upper arm
  • the third arm and the sixth arm are electrically connected in series to constitute a third phase of the three-phase AC circuit.
  • A1, A2, A21, A3, A31, A4 Semiconductor device 10U: First phase 10V: Second phase 10W: Third phase 1: First switch section 1A: First arm 1B: Second arm 1C: Third arm 11, 11A, 11B, 11C: Switching element 11a: Element main surface 11b: Element back surface 111, 112, 113: Electrode 12, 12A, 12B, 12C: Switching element 12a: Element main surface 12b: Element back surface 121, 122, 123 : Electrodes 115, 125: Main surface wiring part 125a: First pad part 125b: Second pad part 125c: Connecting part 1251: First strip part 1252: Second strip part 13, 13A, 13B, 13C: Protective element 13a: Element main surface 13b: Element back surface 131, 132: Electrode 19: Conductive bonding material 2: Second switch part 2A: Fourth arm 2B: Fifth arm 2C: Sixth arm 21, 21A, 21B, 21C: Switching element 21a : E

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Abstract

This semiconductor device comprises a first switch part, a first control element, a mounting part, and first to third wires. The first switch part has a first switching element and a second switching element. The first switching element and the second switching element are electrically connected in parallel to each other. The first switching element has a first electrode. The second switching element has a second electrode and a main surface wiring part. The first wire is joined to the first control element and the main surface wiring part, and the second wire is joined to the main surface wiring part and the first electrode. The third wire is joined to the first control element and the second electrode.

Description

半導体装置semiconductor equipment
 本開示は、半導体装置に関する。 The present disclosure relates to a semiconductor device.
 従来、MOSFET(Metal Oxide Semiconductor Field Effect Transistor)およびIGBT(Insulated Gate Bipolar Transistor)などのスイッチング素子を備える半導体装置が知られている。たとえば、特許文献1には、従来の半導体装置の一例が開示されている。特許文献1に記載の半導体装置は、たとえばモータの駆動制御に用いられるインテリジェントパワーモジュール(Intelligent Power Module、以下「IPM」という)である。当該半導体装置は、上記スイッチング素子としてのパワー半導体チップを備える。当該パワー半導体チップは、IGBT、または、MOSFETなどである。 Conventionally, semiconductor devices are known that include switching elements such as MOSFETs (Metal Oxide Semiconductor Field Effect Transistors) and IGBTs (Insulated Gate Bipolar Transistors). For example, Patent Document 1 discloses an example of a conventional semiconductor device. The semiconductor device described in Patent Document 1 is an intelligent power module (hereinafter referred to as "IPM") used for drive control of a motor, for example. The semiconductor device includes a power semiconductor chip as the switching element. The power semiconductor chip is an IGBT, a MOSFET, or the like.
特開2020-4893号公報JP 2020-4893 Publication
 半導体装置において、1つのスイッチング素子に、他のスイッチング素子を並列に接続して、これらのスイッチング素子を1つのスイッチ部としてスイッチング動作させることがある。たとえば、半導体装置の許容電流を確保すること、スイッチング素子に入力される電圧および電流を抑制すること、あるいは、電力損失を抑制することなどを目的として、複数のスイッチング素子を並列に接続してスイッチングさせる。一方で、特許文献1に記載の半導体装置においては、各スイッチング素子に他のスイッチング素子を並列に接続する際に、未だ改善の余地があった。 In a semiconductor device, one switching element is sometimes connected to another switching element in parallel, and these switching elements are operated as one switch section. For example, switching is performed by connecting multiple switching elements in parallel for the purpose of ensuring the permissible current of a semiconductor device, suppressing the voltage and current input to a switching element, or suppressing power loss. let On the other hand, in the semiconductor device described in Patent Document 1, there is still room for improvement when connecting each switching element to another switching element in parallel.
 本開示は、従来より改良が施された半導体装置を提供することを一の課題とする。特に本開示は、上記事情に鑑み、互いに並列に接続された複数のスイッチング素子を1つのスイッチ部として動作させる構成において、より好ましい構造を有する半導体装置を提供することをその一の課題とする。 An object of the present disclosure is to provide a semiconductor device that is improved over the conventional semiconductor device. In particular, in view of the above circumstances, an object of the present disclosure is to provide a semiconductor device having a more preferable structure in a configuration in which a plurality of switching elements connected in parallel operate as one switch section.
 本開示の一の側面によって提供される半導体装置は、各々が第1スイッチング素子および第2スイッチング素子を含む少なくとも1つの第1スイッチ部と、前記第1スイッチング素子および前記第2スイッチング素子に第1駆動信号を入力する第1制御素子と、前記第1スイッチング素子および前記第2スイッチング素子が搭載される搭載部と、第1ワイヤ、第2ワイヤおよび第3ワイヤを含む複数のワイヤと、を備える。前記少なくとも1つの第1スイッチ部の各々において、前記第1スイッチング素子と前記第2スイッチング素子とが電気的に並列に接続され、前記第1スイッチング素子は、前記搭載部の厚さ方向の一方を向く第1主面と、前記第1主面に配置された第1制御電極とを有し、前記第2スイッチング素子は、前記厚さ方向の一方を向く第2主面と、前記第2主面に配置された第2制御電極および主面配線部とを有する。前記第1ワイヤは、前記第1制御素子と、前記主面配線部とに接合される。前記第2ワイヤは、前記主面配線部と、前記第1制御電極とに接合される。前記第3ワイヤは、前記第1制御素子と、前記第2制御電極とに接合される。前記第1制御素子は、前記第1スイッチング素子および前記第2スイッチング素子よりも、前記厚さ方向に直交する第1方向の一方側に配置される。前記第2スイッチング素子は、前記第1方向において、前記第1制御素子と前記第1スイッチング素子との間に配置される。 A semiconductor device provided by one aspect of the present disclosure includes at least one first switch section each including a first switching element and a second switching element; A first control element that inputs a drive signal, a mounting part on which the first switching element and the second switching element are mounted, and a plurality of wires including a first wire, a second wire, and a third wire. . In each of the at least one first switch section, the first switching element and the second switching element are electrically connected in parallel, and the first switching element connects one side of the mounting section in the thickness direction. and a first control electrode disposed on the first main surface; It has a second control electrode arranged on the surface and a main surface wiring section. The first wire is connected to the first control element and the main surface wiring section. The second wire is connected to the main surface wiring section and the first control electrode. The third wire is connected to the first control element and the second control electrode. The first control element is arranged on one side of the first switching element and the second switching element in a first direction perpendicular to the thickness direction. The second switching element is arranged between the first control element and the first switching element in the first direction.
 上記構成によれば、互いに並列に接続された複数のスイッチング素子を1つのスイッチ部として動作させる構成において、より好ましい構造を提供することが可能である。 According to the above configuration, it is possible to provide a more preferable structure in a configuration in which a plurality of switching elements connected in parallel to each other operate as one switch section.
図1は、第1実施形態にかかる半導体装置を示す斜視図である。FIG. 1 is a perspective view showing a semiconductor device according to a first embodiment. 図2は、第1実施形態にかかる半導体装置を示す平面図である。FIG. 2 is a plan view showing the semiconductor device according to the first embodiment. 図3は、図2の平面図において、封止部材を想像線で示した図である。FIG. 3 is a diagram showing the sealing member in imaginary lines in the plan view of FIG. 2. 図4は、図3の一部を拡大した部分拡大図である。FIG. 4 is a partially enlarged view of FIG. 3. 図5は、図4の一部を拡大した部分拡大図である。FIG. 5 is a partially enlarged view of FIG. 4. 図6は、図3の一部を拡大した部分拡大図である。FIG. 6 is a partially enlarged view of FIG. 3. 図7は、図6の一部を拡大した部分拡大図である。FIG. 7 is a partially enlarged view of FIG. 6. 図8は、第1実施形態にかかる半導体装置を示す正面図である。FIG. 8 is a front view showing the semiconductor device according to the first embodiment. 図9は、第1実施形態にかかる半導体装置を示す側面図(右側面図)である。FIG. 9 is a side view (right side view) showing the semiconductor device according to the first embodiment. 図10は、図3のX-X線に沿う断面図である。FIG. 10 is a sectional view taken along line XX in FIG. 3. 図11は、図3のXI-XI線に沿う断面図である。FIG. 11 is a cross-sectional view taken along line XI-XI in FIG. 3. 図12は、図3のXII-XII線に沿う断面図である。FIG. 12 is a sectional view taken along line XII-XII in FIG. 3. 図13は、図3のXIII-XIII線に沿う断面図である。FIG. 13 is a cross-sectional view taken along line XIII-XIII in FIG. 図14は、第1実施形態にかかる半導体装置の回路構成例を示す図である。FIG. 14 is a diagram showing an example of the circuit configuration of the semiconductor device according to the first embodiment. 図15は、第2実施形態にかかる半導体装置を示す平面図であって、封止部材を想像線で示した図である。FIG. 15 is a plan view showing the semiconductor device according to the second embodiment, in which the sealing member is shown with imaginary lines. 図16は、図15の一部を拡大した部分拡大図である。FIG. 16 is a partially enlarged view of FIG. 15. 図17は、図15の一部を拡大した部分拡大図である。FIG. 17 is a partially enlarged view of FIG. 15. 図18は、図15のXVIII-XVIII線に沿う断面図である。FIG. 18 is a cross-sectional view taken along line XVIII-XVIII in FIG. 15. 図19は、図15のXIX-XIX線に沿う断面図である。FIG. 19 is a cross-sectional view taken along line XIX-XIX in FIG. 15. 図20は、第2実施形態の変形例にかかる半導体装置を示す断面図である。FIG. 20 is a cross-sectional view showing a semiconductor device according to a modification of the second embodiment. 図21は、第3実施形態にかかる半導体装置を示す要部拡大平面図である。FIG. 21 is an enlarged plan view of main parts showing a semiconductor device according to a third embodiment. 図22は、第3実施形態にかかる半導体装置を示す要部拡大平面図である。FIG. 22 is an enlarged plan view of a main part of a semiconductor device according to a third embodiment. 図23は、第3実施形態の変形例にかかる半導体装置を示す要部拡大平面図である。FIG. 23 is an enlarged plan view of a main part of a semiconductor device according to a modification of the third embodiment. 図24は、第4実施形態にかかる半導体装置を示す平面図であって、封止部材を想像線で示した図である。FIG. 24 is a plan view showing the semiconductor device according to the fourth embodiment, in which the sealing member is shown with imaginary lines. 図25は、図24の一部を拡大した部分拡大図である。FIG. 25 is a partially enlarged view of FIG. 24. 図26は、図24の一部を拡大した部分拡大図である。FIG. 26 is a partially enlarged view of FIG. 24. 図27は、第4実施形態にかかる半導体装置の回路構成例を示す図である。FIG. 27 is a diagram showing an example of the circuit configuration of the semiconductor device according to the fourth embodiment. 図28は、主面配線部の他の構成例を示す要部拡大平面図である。FIG. 28 is an enlarged plan view of main parts showing another example of the configuration of the main surface wiring section. 図29は、主面配線部の他の構成例を示す要部拡大平面図である。FIG. 29 is an enlarged plan view of main parts showing another example of the configuration of the main surface wiring section. 図30は、主面配線部の他の構成例を示す要部拡大平面図である。FIG. 30 is an enlarged plan view of main parts showing another example of the configuration of the main surface wiring section. 図31は、主面配線部の他の構成例を示す要部拡大平面図である。FIG. 31 is an enlarged plan view of main parts showing another example of the configuration of the main surface wiring section. 図32は、主面配線部の他の構成例を示す要部拡大平面図である。FIG. 32 is an enlarged plan view of main parts showing another example of the configuration of the main surface wiring section. 図33は、主面配線部の他の構成例を示す要部拡大平面図である。FIG. 33 is an enlarged plan view of main parts showing another example of the configuration of the main surface wiring section. 図34は、主面配線部の他の構成例を示す要部拡大平面図である。FIG. 34 is an enlarged plan view of main parts showing another example of the configuration of the main surface wiring section.
 本開示の半導体装置の好ましい実施の形態について、図面を参照して、以下に説明する。以下では、同一あるいは類似の構成要素に、同じ符号を付して、重複する説明を省略する。本開示における「第1」、「第2」、「第3」等の用語は、単にラベルとして用いたものであり、必ずしもそれらの対象物に順列を付することを意図していない。 Preferred embodiments of the semiconductor device of the present disclosure will be described below with reference to the drawings. Hereinafter, the same or similar components will be denoted by the same reference numerals, and redundant explanation will be omitted. Terms such as "first", "second", "third", etc. in this disclosure are used merely as labels and are not necessarily intended to attach a permutation to those objects.
 本開示において、「ある物Aがある物Bに形成されている」および「ある物Aがある物B(の)上に形成されている」とは、特段の断りのない限り、「ある物Aがある物Bに直接形成されていること」、および、「ある物Aとある物Bとの間に他の物を介在させつつ、ある物Aがある物Bに形成されていること」を含む。同様に、「ある物Aがある物Bに配置されている」および「ある物Aがある物B(の)上に配置されている」とは、特段の断りのない限り、「ある物Aがある物Bに直接配置されていること」、および、「ある物Aとある物Bとの間に他の物を介在させつつ、ある物Aがある物Bに配置されていること」を含む。同様に、「ある物Aがある物B(の)上に位置している」とは、特段の断りのない限り、「ある物Aがある物Bに接して、ある物Aがある物B(の)上に位置していること」、および、「ある物Aとある物Bとの間に他の物が介在しつつ、ある物Aがある物B(の)上に位置していること」を含む。また、「ある方向に見てある物Aがある物Bに重なる」とは、特段の断りのない限り、「ある物Aがある物Bのすべてに重なること」、および、「ある物Aがある物Bの一部に重なること」を含む。 In the present disclosure, "a thing A is formed on a thing B" and "a thing A is formed on a thing B" mean "a thing A is formed on a thing B" unless otherwise specified. "A is formed directly on something B," and "A thing A is formed on something B, with another thing interposed between them." including. Similarly, "a certain thing A is placed on a certain thing B" and "a certain thing A is placed on a certain thing B" are used as "a certain thing A is placed on a certain thing B" unless otherwise specified. ``It is placed directly on something B,'' and ``A thing A is placed on something B, with another thing interposed between them.'' include. Similarly, "an object A is located on an object B" means, unless otherwise specified, "an object A is in contact with an object B, and an object A is located on an object B". ``Being located on (above) something'' and ``A thing A being located on (above) a thing B while another thing is intervening between the thing A and the thing B.'' Including "thing". In addition, "an object A overlaps an object B when viewed in a certain direction" means, unless otherwise specified, "an object A overlaps all of an object B" and "a certain object A overlaps an object B". This includes "overlapping a part of something B."
 図1~図14は、第1実施形態にかかる半導体装置A1を示している。半導体装置A1は、複数の第1スイッチ部1、複数の第2スイッチ部2、複数のリード3A~3G,3Z、複数のリード4A~4H,4J~4N,4P~4R、支持基板51、複数の接続部材6、封止部材7、第1制御素子8A、第2制御素子8Bおよび複数の電子部品89U,89V,89Wなどを備えている。複数の接続部材6は、複数のワイヤ6A~6F,6H,6J~6L,61G,61Q,62G,62Qを含む。半導体装置A1の用途は、特に限定されないが、たとえばモータの駆動制御などに用いられるIPMとして構成される。 1 to 14 show a semiconductor device A1 according to the first embodiment. The semiconductor device A1 includes a plurality of first switch sections 1, a plurality of second switch sections 2, a plurality of leads 3A to 3G, 3Z, a plurality of leads 4A to 4H, 4J to 4N, 4P to 4R, a support substrate 51, and a plurality of The connecting member 6, the sealing member 7, the first control element 8A, the second control element 8B, and a plurality of electronic components 89U, 89V, 89W, etc. are provided. The plurality of connection members 6 include a plurality of wires 6A to 6F, 6H, 6J to 6L, 61G, 61Q, 62G, and 62Q. Although the application of the semiconductor device A1 is not particularly limited, it is configured as an IPM used for, for example, drive control of a motor.
 説明の便宜上、互いに直交する3つのx方向、y方向、z方向を参照する。z方向は、半導体装置A1の厚さ方向である。以下の説明において、z方向の一方を上方、他方を下方ということがある。なお、「上」、「下」、「上方」、「下方」、「上面」および「下面」などの記載は、z方向における各部品等の相対的位置関係を示すものであり、必ずしも重力方向との関係を規定する用語ではない。また、「平面視」とは、z方向に見たときをいう。x方向は、半導体装置A1の平面図(図2および図3参照)における左右方向である。y方向は、半導体装置A1の平面図(図2および図3参照)における上下方向である。本実施形態では、x方向は、特許請求の範囲に記載の「第2方向」の一例であり、y方向は、特許請求の範囲に記載の「第1方向」の一例である。なお、x方向の一方側をx方向のx1側、x方向の他方側をx方向のx2側と称する。また、y方向の一方側をy方向のy1側、y方向の他方側をy方向のy2側と称する。また、z方向の一方側をz方向のz1側、z方向の他方側をz方向のz2側と称する。 For convenience of explanation, three mutually orthogonal x, y, and z directions will be referred to. The z direction is the thickness direction of the semiconductor device A1. In the following description, one direction in the z direction is sometimes referred to as upper and the other is referred to as lower. Note that descriptions such as "upper", "lower", "upper", "lower", "upper surface", and "lower surface" indicate the relative positional relationship of each component etc. in the z direction, and do not necessarily refer to the direction of gravity. It is not a term that defines the relationship between Moreover, "planar view" refers to when viewed in the z direction. The x direction is the left-right direction in the plan view of the semiconductor device A1 (see FIGS. 2 and 3). The y direction is the vertical direction in the plan view of the semiconductor device A1 (see FIGS. 2 and 3). In this embodiment, the x direction is an example of the "second direction" described in the claims, and the y direction is an example of the "first direction" described in the claims. Note that one side in the x direction is referred to as the x1 side in the x direction, and the other side in the x direction is referred to as the x2 side in the x direction. Further, one side in the y direction is referred to as the y1 side in the y direction, and the other side in the y direction is referred to as the y2 side in the y direction. Further, one side in the z direction is referred to as a z1 side in the z direction, and the other side in the z direction is referred to as a z2 side in the z direction.
 複数の第1スイッチ部1および複数の第2スイッチ部2は、半導体装置A1の電気的機能を発揮する要素である。半導体装置A1では、図14に示すように、複数の第1スイッチ部1および複数の第2スイッチ部2によって、三相交流のインバータ回路が構成される。 The plurality of first switch sections 1 and the plurality of second switch sections 2 are elements that perform the electrical functions of the semiconductor device A1. In the semiconductor device A1, as shown in FIG. 14, a three-phase AC inverter circuit is configured by a plurality of first switch sections 1 and a plurality of second switch sections 2.
 複数の第1スイッチ部1は、図3、図4および図14に示すように、第1アーム1A、第2アーム1Bおよび第3アーム1Cを含む。図4に示すように、第1アーム1A、第2アーム1Bおよび第3アーム1Cは、x方向に沿って配列される。第2アーム1Bは、x方向において、第1アーム1Aと第3アーム1Cとの間に位置する複数の第1スイッチ部1(第1アーム1A、第2アーム1Bおよび第3アーム1C)の各々は、第1制御素子8Aからの第1駆動信号に応じて、オン状態とオフ状態とが切り替わる。 The plurality of first switch sections 1 include a first arm 1A, a second arm 1B, and a third arm 1C, as shown in FIGS. 3, 4, and 14. As shown in FIG. 4, the first arm 1A, the second arm 1B, and the third arm 1C are arranged along the x direction. The second arm 1B includes each of a plurality of first switch parts 1 (first arm 1A, second arm 1B, and third arm 1C) located between the first arm 1A and the third arm 1C in the x direction. is switched between an on state and an off state according to the first drive signal from the first control element 8A.
 複数の第1スイッチ部1(第1アーム1A、第2アーム1Bおよび第3アーム1C)はそれぞれ、スイッチング素子11、スイッチング素子12および保護素子13を有する。説明の便宜上、第1アーム1A、第2アーム1Bおよび第3アーム1Cの各スイッチング素子11をそれぞれ、スイッチング素子11A、スイッチング素子11B、スイッチング素子11Cという。また、第1アーム1A、第2アーム1Bおよび第3アーム1Cの各スイッチング素子12をそれぞれ、スイッチング素子12A、スイッチング素子12B、スイッチング素子12Cといい、第1アーム1A、第2アーム1Bおよび第3アーム1Cの各保護素子13をそれぞれ、保護素子13A、保護素子13B、保護素子13Cという。以下で説明するスイッチング素子11、スイッチング素子12および保護素子13は、特段の断りがない限り、各第1スイッチ部1(第1アーム1A、第2アーム1Bおよび第3アーム1Cの各々)で共通する。 Each of the plurality of first switch sections 1 (first arm 1A, second arm 1B, and third arm 1C) has a switching element 11, a switching element 12, and a protection element 13. For convenience of explanation, the switching elements 11 of the first arm 1A, the second arm 1B, and the third arm 1C are respectively referred to as a switching element 11A, a switching element 11B, and a switching element 11C. The switching elements 12 of the first arm 1A, the second arm 1B, and the third arm 1C are respectively referred to as a switching element 12A, a switching element 12B, and a switching element 12C. The protection elements 13 of the arm 1C are respectively referred to as a protection element 13A, a protection element 13B, and a protection element 13C. The switching element 11, switching element 12, and protection element 13 described below are common to each first switch section 1 (each of the first arm 1A, second arm 1B, and third arm 1C) unless otherwise specified. do.
 スイッチング素子11およびスイッチング素子12はそれぞれ、パワー系半導体素子であって、スイッチング機能部を有する。スイッチング素子11およびスイッチング素子12はそれぞれ、たとえばIGBT、バイポーラトランジスタ、MOSFETおよびHEMT(High Electron Mobility Transistor)などのいずれかである。スイッチング素子11およびスイッチング素子12は、互いに種類が異なる。本開示におけるスイッチング素子の種類とは、IGBT、バイポーラトランジスタ、MOSFET、HEMTなどの構造の違いにより分類されたものである。図14に示すように、半導体装置A1では、スイッチング素子11は、IGBTであり、スイッチング素子12は、MOSFETである。この例と異なり、スイッチング素子11がMOSFETであり、スイッチング素子12がIGBTであってもよい。スイッチング素子11およびスイッチング素子12はそれぞれ、半導体材料を含んで構成される。当該半導体材料は、たとえばSiC(炭化ケイ素)、Si(シリコン)、GaAs(ヒ化ガリウム)あるいはGaN(窒化ガリウム)などが採用される。半導体装置A1では、スイッチング素子11は、半導体材料としてSiを含み、スイッチング素子12は、半導体材料としてSiCを含む。この例と異なり、スイッチング素子11が半導体材料としてSiCを含み、スイッチング素子12が半導体材料としてSiを含んでいてもよいし、スイッチング素子11およびスイッチング素子12の両方が、半導体材料としてSiCまたはSiのいずれかを含んでいてもよい。本実施形態では、スイッチング素子11が、特許請求の範囲に記載の「第1スイッチング素子」の一例であり、スイッチング素子12が、特許請求の範囲に記載の「第2スイッチング素子」の一例である。 Each of the switching element 11 and the switching element 12 is a power semiconductor element and has a switching function section. The switching element 11 and the switching element 12 are each one of, for example, an IGBT, a bipolar transistor, a MOSFET, and a HEMT (High Electron Mobility Transistor). The switching element 11 and the switching element 12 are different in type from each other. The types of switching elements in the present disclosure are classified according to their structure, such as IGBTs, bipolar transistors, MOSFETs, and HEMTs. As shown in FIG. 14, in the semiconductor device A1, the switching element 11 is an IGBT, and the switching element 12 is a MOSFET. Unlike this example, the switching element 11 may be a MOSFET, and the switching element 12 may be an IGBT. Switching element 11 and switching element 12 are each configured to include a semiconductor material. As the semiconductor material, for example, SiC (silicon carbide), Si (silicon), GaAs (gallium arsenide), or GaN (gallium nitride) is used. In the semiconductor device A1, the switching element 11 contains Si as a semiconductor material, and the switching element 12 contains SiC as a semiconductor material. Unlike this example, switching element 11 may contain SiC as a semiconductor material, switching element 12 may contain Si as a semiconductor material, or both switching element 11 and switching element 12 may contain SiC or Si as a semiconductor material. It may contain either. In this embodiment, the switching element 11 is an example of a "first switching element" as set forth in the claims, and the switching element 12 is an example of a "second switching element" as set forth in the claims. .
 スイッチング素子11は、図10および図12に示すように、素子主面11aおよび素子裏面11bを有する。素子主面11aおよび素子裏面11bは、z方向に離間する。素子主面11aはz方向上方(z方向のz1側)を向き、素子裏面11bはz方向下方(z方向のz2側)を向く。素子主面11aおよび素子裏面11bはそれぞれ、平坦である(略平坦である場合を含む)。 The switching element 11 has an element main surface 11a and an element back surface 11b, as shown in FIGS. 10 and 12. The element main surface 11a and the element back surface 11b are spaced apart in the z direction. The element main surface 11a faces upward in the z direction (z1 side in the z direction), and the element back surface 11b faces downward in the z direction (z2 side in the z direction). The element main surface 11a and the element back surface 11b are each flat (including the case where they are substantially flat).
 スイッチング素子11は、3つの電極111,112,113を有する。電極111は、素子裏面11bに設けられており、電極112,113は、素子主面11aに設けられている。3つの電極111,112,113はそれぞれ、スイッチング素子11の上記スイッチング機能部に導通する。スイッチング素子11がIGBTである例において、電極111はコレクタであり、電極112はエミッタであり、電極113はゲートである。スイッチング素子11は、電極113に入力される駆動信号(第1駆動信号)に応じて、スイッチング動作する。当該スイッチング動作とは、2つの電極111,112間に電流が流れるオン状態と、2つの電極111,112間に電流が流れないオフ状態とが切り替わる動作である。スイッチング素子11がオン状態のとき、電極111から電極112に順方向電流が流れる。電極113は、特許請求の範囲に記載の「第1制御電極」の一例である。 The switching element 11 has three electrodes 111, 112, and 113. The electrode 111 is provided on the back surface 11b of the element, and the electrodes 112 and 113 are provided on the main surface 11a of the element. The three electrodes 111, 112, 113 are electrically connected to the switching function section of the switching element 11, respectively. In an example where switching element 11 is an IGBT, electrode 111 is a collector, electrode 112 is an emitter, and electrode 113 is a gate. The switching element 11 performs a switching operation according to a drive signal (first drive signal) input to the electrode 113. The switching operation is an operation in which an on state in which current flows between the two electrodes 111 and 112 and an off state in which no current flows between the two electrodes 111 and 112 are switched. When the switching element 11 is in the on state, a forward current flows from the electrode 111 to the electrode 112. The electrode 113 is an example of a "first control electrode" described in the claims.
 スイッチング素子12は、図11および図12に示すように、素子主面12aおよび素子裏面12bを有する。素子主面12aおよび素子裏面12bは、z方向に離間する。素子主面12aはz方向上方(z方向のz1側)を向き、素子裏面12bはz方向下方(z方向のz2側)を向く。素子主面12aおよび素子裏面12bはそれぞれ、平坦である(略平坦である場合を含む)。 The switching element 12 has an element main surface 12a and an element back surface 12b, as shown in FIGS. 11 and 12. The element main surface 12a and the element back surface 12b are spaced apart in the z direction. The element main surface 12a faces upward in the z direction (z1 side in the z direction), and the element back surface 12b faces downward in the z direction (z2 side in the z direction). The element main surface 12a and the element back surface 12b are each flat (including the case where they are substantially flat).
 スイッチング素子12は、3つの電極121,122,123を有する。電極121は、素子裏面12bに設けられており、電極122,123は、素子主面12aに設けられている。3つの電極121,122,123はそれぞれ、スイッチング素子12の上記スイッチング機能部に導通する。スイッチング素子12がMOSFETである例において、電極121はドレインであり、電極122はソースであり、電極123はゲートである。スイッチング素子12は、電極123に入力される駆動信号(第1駆動信号)に応じて、スイッチング動作する。当該スイッチング動作とは、2つの電極121,122間に電流が流れるオン状態と、2つの電極121,122間に電流が流れないオフ状態とが切り替わる動作である。スイッチング素子12がオン状態のとき、電極121から電極122に順方向電流が流れる。電極123は、特許請求の範囲に記載の「第2制御電極」の一例である。 The switching element 12 has three electrodes 121, 122, 123. The electrode 121 is provided on the back surface 12b of the element, and the electrodes 122 and 123 are provided on the main surface 12a of the element. The three electrodes 121, 122, 123 are electrically connected to the switching function section of the switching element 12, respectively. In an example where switching element 12 is a MOSFET, electrode 121 is a drain, electrode 122 is a source, and electrode 123 is a gate. The switching element 12 performs a switching operation in response to a drive signal (first drive signal) input to the electrode 123. The switching operation is an operation in which an on state in which current flows between the two electrodes 121 and 122 and an off state in which no current flows between the two electrodes 121 and 122 are switched. When the switching element 12 is in the on state, a forward current flows from the electrode 121 to the electrode 122. The electrode 123 is an example of a "second control electrode" described in the claims.
 図4、図5および図11に示すように、スイッチング素子12は、主面配線部125を有する。図11に示すように、主面配線部125は、電極123と同様に、素子主面12aに設けられている。主面配線部125は、スイッチング素子12の上記スイッチング機能部に非導通である。図示された例では、主面配線部125は、平面視において矩形状である。また、主面配線部125は、素子主面12aにおいて、y方向の中央よりもy方向のy1側に位置する。図5に示すように、主面配線部125は、第1パッド部125a、第2パッド部125bおよび連結部125cを含む。第1パッド部125aは、後述のワイヤ61Gが接合される部位である。第2パッド部125bは、後述のワイヤ62Gが接合される部位である。第1パッド部125aと第2パッド部125bとは、平面視において、y方向に沿って配置されている。第1パッド部125aは、第2パッド部125bよりもy方向のy1側に位置する。第1パッド部125aは、y方向において、第2パッド部125bよりも第1制御素子8Aの近くに位置する。図示された例では、第1パッド部125aのx方向の寸法と、第2パッド部125bのx方向の寸法とは同じ(あるいは略同じ)である。連結部125cは、第1パッド部125aと第2パッド部125bとを繋ぐ。連結部125cのx方向の寸法は、第1パッド部125aおよび第2パッド部125bのx方向の各寸法と同じ(あるいは略同じ)である。 As shown in FIGS. 4, 5, and 11, the switching element 12 has a main surface wiring section 125. As shown in FIG. 11, the main surface wiring section 125, like the electrode 123, is provided on the element main surface 12a. The main surface wiring section 125 is not electrically connected to the switching function section of the switching element 12 . In the illustrated example, main surface wiring section 125 has a rectangular shape in plan view. Further, the main surface wiring section 125 is located on the y1 side in the y direction from the center in the y direction on the element main surface 12a. As shown in FIG. 5, the main surface wiring section 125 includes a first pad section 125a, a second pad section 125b, and a connecting section 125c. The first pad portion 125a is a portion to which a wire 61G, which will be described later, is bonded. The second pad portion 125b is a portion to which a wire 62G, which will be described later, is bonded. The first pad section 125a and the second pad section 125b are arranged along the y direction in plan view. The first pad portion 125a is located closer to the y1 side in the y direction than the second pad portion 125b. The first pad section 125a is located closer to the first control element 8A than the second pad section 125b in the y direction. In the illustrated example, the dimension of the first pad section 125a in the x direction and the dimension of the second pad section 125b in the x direction are the same (or substantially the same). The connecting portion 125c connects the first pad portion 125a and the second pad portion 125b. The dimension of the connecting portion 125c in the x direction is the same (or approximately the same) as each dimension of the first pad portion 125a and the second pad portion 125b in the x direction.
 各第1スイッチ部1(第1アーム1A、第2アーム1Bおよび第3アーム1Cの各々)において、スイッチング素子11およびスイッチング素子12は、電気的に並列に接続されている。具体的には、電極111(コレクタ)と電極121(ドレイン)とが電気的に接続され、電極112(エミッタ)と電極122(ソース)とが電気的に接続される。 In each first switch section 1 (each of the first arm 1A, second arm 1B, and third arm 1C), the switching element 11 and the switching element 12 are electrically connected in parallel. Specifically, electrode 111 (collector) and electrode 121 (drain) are electrically connected, and electrode 112 (emitter) and electrode 122 (source) are electrically connected.
 保護素子13は、ダイオード機能部を含む。当該ダイオード機能部は、還流ダイオードとして動作する。本実施形態では、保護素子13は、たとえばショットキーバリアダイオードであるが、他の種類のダイオードであってもよい。 The protection element 13 includes a diode function section. The diode function section operates as a freewheeling diode. In this embodiment, the protection element 13 is, for example, a Schottky barrier diode, but may be another type of diode.
 保護素子13は、図12に示すように、素子主面13aおよび素子裏面13bを有する。素子主面13aと素子裏面13bとは、z方向に離間する。素子主面13aは、z方向上方(z方向のz1側)を向き、素子裏面13bは、z方向下方(z方向のz2側)を向く。素子主面13aおよび素子裏面13bはそれぞれ、平坦である(略平坦である場合を含む)。 As shown in FIG. 12, the protection element 13 has an element main surface 13a and an element back surface 13b. The element main surface 13a and the element back surface 13b are spaced apart in the z direction. The element main surface 13a faces upward in the z direction (z1 side in the z direction), and the element back surface 13b faces downward in the z direction (z2 side in the z direction). The element main surface 13a and the element back surface 13b are each flat (including the case where they are substantially flat).
 保護素子13は、図12に示すように、2つの電極131,132を含む。電極131は、素子主面13aに形成され、電極132は、素子裏面13bに形成されている。保護素子13がダイオードである例において、電極131はアノードであり、電極132はカソードである。 The protection element 13 includes two electrodes 131 and 132, as shown in FIG. The electrode 131 is formed on the main surface 13a of the element, and the electrode 132 is formed on the back surface 13b of the element. In the example where the protection element 13 is a diode, the electrode 131 is an anode and the electrode 132 is a cathode.
 各第1スイッチ部1(第1アーム1A、第2アーム1Bおよび第3アーム1Cの各々)において、保護素子13は、スイッチング素子11およびスイッチング素子12に対して、逆並列に接続されている。逆並列とは、スイッチング素子11およびスイッチング素子12の各順方向電流と、保護素子13における順方向電流とが、逆向きになるように並列接続された状態である。保護素子13の電極131(アノード)は、スイッチング素子11の電極112(エミッタ)およびスイッチング素子12の電極122(ソース)に接続され、保護素子13の電極132(カソード)は、スイッチング素子11の電極111(コレクタ)およびスイッチング素子12の電極121(ドレイン)に接続されている。これにより、各第1スイッチ部1において、スイッチング素子11およびスイッチング素子12に逆電圧が印加されたとき、保護素子13に順方向電流が流れ、スイッチング素子11およびスイッチング素子12に印加される逆電圧が低減される。 In each first switch section 1 (each of the first arm 1A, second arm 1B, and third arm 1C), the protection element 13 is connected in antiparallel to the switching element 11 and the switching element 12. Antiparallel means a state in which the forward currents of the switching elements 11 and 12 and the forward currents of the protection element 13 are connected in parallel so that they are in opposite directions. The electrode 131 (anode) of the protection element 13 is connected to the electrode 112 (emitter) of the switching element 11 and the electrode 122 (source) of the switching element 12, and the electrode 132 (cathode) of the protection element 13 is connected to the electrode 112 (emitter) of the switching element 11 and the electrode 122 (source) of the switching element 12. 111 (collector) and the electrode 121 (drain) of the switching element 12. As a result, when a reverse voltage is applied to the switching element 11 and the switching element 12 in each first switch section 1, a forward current flows through the protection element 13, and the reverse voltage is applied to the switching element 11 and the switching element 12. is reduced.
 図10~図12から理解されるように、スイッチング素子11A、スイッチング素子12Aおよび保護素子13Aはそれぞれ、導電性接合材19を介して、リード3Bに接合されている。スイッチング素子11B、スイッチング素子12Bおよび保護素子13Bはそれぞれ、導電性接合材19を介して、リード3Cに接合されている。スイッチング素子11C、スイッチング素子12Cおよび保護素子13Cはそれぞれ、導電性接合材19を介して、リード3Dに接合されている。これらの導電性接合材19は、たとえばはんだ、金属ペースト材、あるいは焼結金属などである。 As understood from FIGS. 10 to 12, switching element 11A, switching element 12A, and protection element 13A are each bonded to lead 3B via conductive bonding material 19. Switching element 11B, switching element 12B, and protection element 13B are each bonded to lead 3C via conductive bonding material 19. The switching element 11C, the switching element 12C, and the protection element 13C are each bonded to the lead 3D via a conductive bonding material 19. These conductive bonding materials 19 are, for example, solder, metal paste, or sintered metal.
 図4に示すように、各第1スイッチ部1(第1アーム1A、第2アーム1Bおよび第3アーム1Cの各々)において、スイッチング素子11、スイッチング素子12および保護素子13は、y方向に一列に配置される。図示された例では、各第1スイッチ部1(第1アーム1A、第2アーム1Bおよび第3アーム1Cの各々)において、y方向のy1側からy2側に向け、スイッチング素子12、スイッチング素子11、保護素子13の順に配置される。よって、スイッチング素子11は、y方向において、スイッチング素子12と保護素子13との間に位置する。なお、各第1スイッチ部1(第1アーム1A、第2アーム1Bおよび第3アーム1Cの各々)において、スイッチング素子11とスイッチング素子12との各位置が反対であってもよい。この場合、スイッチング素子11に主面配線部125と同様の主面配線部が形成される。 As shown in FIG. 4, in each first switch section 1 (each of the first arm 1A, second arm 1B, and third arm 1C), the switching element 11, the switching element 12, and the protection element 13 are arranged in a line in the y direction. will be placed in In the illustrated example, in each first switch section 1 (each of the first arm 1A, second arm 1B, and third arm 1C), the switching element 12, the switching element 11 , protection element 13 are arranged in this order. Therefore, the switching element 11 is located between the switching element 12 and the protection element 13 in the y direction. Note that in each of the first switch sections 1 (each of the first arm 1A, second arm 1B, and third arm 1C), the positions of the switching element 11 and the switching element 12 may be opposite. In this case, a main surface wiring section similar to the main surface wiring section 125 is formed in the switching element 11 .
 複数の第2スイッチ部2は、第4アーム2A、第5アーム2Bおよび第6アーム2Cを含む。図6に示すように、第4アーム2A、第5アーム2Bおよび第6アーム2Cは、x方向に沿って配列される。第5アーム2Bは、x方向において、第4アーム2Aと第6アーム2Cとの間に位置する。複数の第2スイッチ部2(第4アーム2A、第5アーム2Bおよび第6アーム2C)の各々は、第2制御素子8Bからの第2駆動信号に応じて、オン状態とオフ状態とが切り替わる。 The plurality of second switch sections 2 include a fourth arm 2A, a fifth arm 2B, and a sixth arm 2C. As shown in FIG. 6, the fourth arm 2A, the fifth arm 2B, and the sixth arm 2C are arranged along the x direction. The fifth arm 2B is located between the fourth arm 2A and the sixth arm 2C in the x direction. Each of the plurality of second switch sections 2 (fourth arm 2A, fifth arm 2B, and sixth arm 2C) is switched between an on state and an off state according to a second drive signal from a second control element 8B. .
 複数の第2スイッチ部2(第4アーム2A、第5アーム2Bおよび第6アーム2C)はそれぞれ、スイッチング素子21、スイッチング素子22および保護素子23を有する。説明の便宜上、第4アーム2A、第5アーム2Bおよび第6アーム2Cの各スイッチング素子11をそれぞれ、スイッチング素子21A、スイッチング素子21B、スイッチング素子21Cという。また、第4アーム2A、第5アーム2Bおよび第6アーム2Cの各スイッチング素子22をそれぞれ、スイッチング素子22A、スイッチング素子22Bおよびスイッチング素子22Cといい、第4アーム2A、第5アーム2Bおよび第6アーム2Cの各保護素子23をそれぞれ、保護素子23A、保護素子23Bおよび保護素子23Cという。以下で説明する。スイッチング素子21、スイッチング素子22および保護素子23は、特段の断りがない限り、各第2スイッチ部2(第4アーム2A、第5アーム2Bおよび第6アーム2Cの各々)で共通する。 The plurality of second switch parts 2 (fourth arm 2A, fifth arm 2B, and sixth arm 2C) each have a switching element 21, a switching element 22, and a protection element 23. For convenience of explanation, the switching elements 11 of the fourth arm 2A, the fifth arm 2B, and the sixth arm 2C are respectively referred to as a switching element 21A, a switching element 21B, and a switching element 21C. Further, the switching elements 22 of the fourth arm 2A, the fifth arm 2B, and the sixth arm 2C are respectively referred to as a switching element 22A, a switching element 22B, and a switching element 22C. The protection elements 23 of the arm 2C are respectively referred to as a protection element 23A, a protection element 23B, and a protection element 23C. This will be explained below. The switching element 21, the switching element 22, and the protection element 23 are common to each second switch section 2 (fourth arm 2A, fifth arm 2B, and sixth arm 2C) unless otherwise specified.
 スイッチング素子21およびスイッチング素子22はそれぞれ、スイッチング素子11およびスイッチング素子12と同様にパワー半導体素子であり、スイッチング機能部を有する。スイッチング素子21およびスイッチング素子22はそれぞれ、たとえばIGBT、バイポーラトランジスタ、MOSFETおよびHEMTなどのいずれかである。スイッチング素子21とスイッチング素子22とは、異なる種類である。図14に示すように、半導体装置A1では、スイッチング素子21は、IGBTであり、スイッチング素子22は、MOSFETである。この例と異なり、スイッチング素子21がMOSFETであり、スイッチング素子22がIGBTであってもよい。スイッチング素子21およびスイッチング素子22はそれぞれ、半導体材料を含んで構成される。当該半導体材料は、たとえばSiC(炭化ケイ素)、Si(シリコン)、GaAs(ヒ化ガリウム)あるいはGaN(窒化ガリウム)などが採用される。半導体装置A1では、スイッチング素子21は、半導体材料としてSiを含み、スイッチング素子22は、半導体材料としてSiCを含む。この例と異なり、スイッチング素子21が半導体材料としてSiCを含み、スイッチング素子22が半導体材料としてSiを含んでいてもよいし、スイッチング素子21およびスイッチング素子22の両方が、半導体材料としてSiCまたはSiのいずれかを含んでいてもよい。本実施形態では、スイッチング素子21が、特許請求の範囲に記載の「第3スイッチング素子」の一例であり、スイッチング素子22が、特許請求の範囲に記載の「第4スイッチング素子」の一例である。 The switching element 21 and the switching element 22 are each a power semiconductor element like the switching element 11 and the switching element 12, and each has a switching function section. Each of the switching element 21 and the switching element 22 is, for example, an IGBT, a bipolar transistor, a MOSFET, a HEMT, or the like. The switching element 21 and the switching element 22 are different types. As shown in FIG. 14, in the semiconductor device A1, the switching element 21 is an IGBT, and the switching element 22 is a MOSFET. Unlike this example, the switching element 21 may be a MOSFET, and the switching element 22 may be an IGBT. Switching element 21 and switching element 22 are each configured to include a semiconductor material. As the semiconductor material, for example, SiC (silicon carbide), Si (silicon), GaAs (gallium arsenide), or GaN (gallium nitride) is used. In the semiconductor device A1, the switching element 21 contains Si as a semiconductor material, and the switching element 22 contains SiC as a semiconductor material. Unlike this example, the switching element 21 may contain SiC as a semiconductor material, and the switching element 22 may contain Si as a semiconductor material, or both the switching element 21 and the switching element 22 may contain SiC or Si as a semiconductor material. It may contain either. In the present embodiment, the switching element 21 is an example of a "third switching element" as set forth in the claims, and the switching element 22 is an example of a "fourth switching element" as set forth in the claims. .
 スイッチング素子21は、図10および図13に示すように、素子主面21aおよび素子裏面21bを有する。素子主面21aおよび素子裏面21bは、z方向に離間する。素子主面21aはz方向上方(z方向のz1側)を向き、素子裏面21bはz方向下方(z方向のz2側)を向く。素子主面21aおよび素子裏面21bはそれぞれ、平坦である(略平坦である場合を含む)。 As shown in FIGS. 10 and 13, the switching element 21 has an element main surface 21a and an element back surface 21b. The element main surface 21a and the element back surface 21b are spaced apart in the z direction. The element main surface 21a faces upward in the z direction (z1 side in the z direction), and the element back surface 21b faces downward in the z direction (z2 side in the z direction). The element main surface 21a and the element back surface 21b are each flat (including the case where they are substantially flat).
 スイッチング素子21は、3つの電極211,212,213を有する。電極211は、素子裏面21bに設けられており、電極212,213は、素子主面21aに設けられている。3つの電極211,212,213はそれぞれ、スイッチング素子21の上記スイッチング機能部に導通する。スイッチング素子21がIGBTである例において、電極211はコレクタであり、電極212はエミッタであり、電極213はゲートである。スイッチング素子21は、電極213に入力される駆動信号(第2駆動信号)に応じて、スイッチング動作する。当該スイッチング動作とは、2つの電極211,212間に電流が流れるオン状態と、2つの電極211,212間に電流が流れないオフ状態とが切り替わる動作である。スイッチング素子21がオン状態のとき、電極211から電極212に順方向電流が流れる。電極213は、特許請求の範囲に記載の「第3制御電極」の一例である。 The switching element 21 has three electrodes 211, 212, and 213. The electrode 211 is provided on the back surface 21b of the element, and the electrodes 212 and 213 are provided on the main surface 21a of the element. The three electrodes 211, 212, 213 are electrically connected to the switching function section of the switching element 21, respectively. In an example where switching element 21 is an IGBT, electrode 211 is a collector, electrode 212 is an emitter, and electrode 213 is a gate. The switching element 21 performs a switching operation in response to a drive signal (second drive signal) input to the electrode 213. The switching operation is an operation in which an on state in which current flows between the two electrodes 211 and 212 and an off state in which no current flows between the two electrodes 211 and 212 are switched. When the switching element 21 is in the on state, a forward current flows from the electrode 211 to the electrode 212. The electrode 213 is an example of a "third control electrode" described in the claims.
 スイッチング素子22は、図11および図13に示すように、素子主面22aおよび素子裏面22bを有する。素子主面22aおよび素子裏面22bは、z方向に離間する。素子主面22aはz方向上方(z方向のz1側)を向き、素子裏面22bはz方向下方(z方向のz2側)を向く。素子主面22aおよび素子裏面22bはそれぞれ、平坦である(略平坦である場合を含む)。 The switching element 22 has an element main surface 22a and an element back surface 22b, as shown in FIGS. 11 and 13. The element main surface 22a and the element back surface 22b are spaced apart in the z direction. The element main surface 22a faces upward in the z direction (z1 side in the z direction), and the element back surface 22b faces downward in the z direction (z2 side in the z direction). The element main surface 22a and the element back surface 22b are each flat (including the case where they are substantially flat).
 スイッチング素子22は、3つの電極221,222,223を有する。電極221は、素子裏面22bに設けられており、電極222,223は、素子主面22aに設けられている。3つの電極221,222,223はそれぞれ、スイッチング素子22の上記スイッチング機能部に導通する。スイッチング素子22がMOSFETである例において、電極221はドレインであり、電極222はソースであり、電極223はゲートである。スイッチング素子22は、電極223に入力される駆動信号(第2駆動信号)に応じて、スイッチング動作する。当該スイッチング動作とは、2つの電極221,222間に電流が流れるオン状態と、2つの電極221,222間に電流が流れないオフ状態とが切り替わる動作である。スイッチング素子22がオン状態のとき、電極221から電極222に順方向電流が流れる。電極223は、特許請求の範囲に記載の「第4制御電極」の一例である。 The switching element 22 has three electrodes 221, 222, and 223. The electrode 221 is provided on the back surface 22b of the element, and the electrodes 222 and 223 are provided on the main surface 22a of the element. The three electrodes 221, 222, 223 are electrically connected to the switching function section of the switching element 22, respectively. In an example where switching element 22 is a MOSFET, electrode 221 is a drain, electrode 222 is a source, and electrode 223 is a gate. The switching element 22 performs a switching operation in response to a drive signal (second drive signal) input to the electrode 223. The switching operation is an operation in which an on state in which current flows between the two electrodes 221 and 222 and an off state in which no current flows between the two electrodes 221 and 222 are switched. When the switching element 22 is in the on state, a forward current flows from the electrode 221 to the electrode 222. The electrode 223 is an example of a "fourth control electrode" described in the claims.
 図6、図7および図11に示すように、スイッチング素子22は、主面配線部225を有する。図11に示すように、主面配線部225は、電極223と同様に、素子主面22aに設けられている。主面配線部225は、スイッチング素子22の上記スイッチング機能部に非導通である。図示された例では、主面配線部225は、平面視において、矩形状である。また、主面配線部225は、素子主面22aにおいて、y方向の中央よりもy方向のy1側に位置する。図7に示すように、主面配線部225は、第3パッド部225a、第4パッド部225bおよび連結部225cを含む。第3パッド部225aは、後述のワイヤ61Qが接合される部位である。第4パッド部225bは、後述のワイヤ62Qが接合される部位である。第3パッド部225aと第4パッド部225bとは、平面視において、y方向に沿って配置されている。第3パッド部225aは、第4パッド部225bよりもy方向のy1側に位置する。第3パッド部225aは、y方向において、第4パッド部225bよりも第2制御素子8Bの近くに位置する。図示された例では、第3パッド部225aのx方向の寸法と、第4パッド部225bのx方向の寸法とは同じ(あるいは略同じ)である。連結部225cは、第3パッド部225aと第4パッド部225bとを繋ぐ。連結部225cのx方向の寸法は、第3パッド部225aおよび第4パッド部225bのx方向の各寸法と同じ(あるいは略同じ)である。 As shown in FIGS. 6, 7, and 11, the switching element 22 has a main surface wiring section 225. As shown in FIG. 11, the main surface wiring section 225, like the electrode 223, is provided on the element main surface 22a. The main surface wiring portion 225 is not electrically connected to the switching function portion of the switching element 22 . In the illustrated example, the main surface wiring section 225 has a rectangular shape in plan view. Further, the main surface wiring section 225 is located on the y1 side in the y direction from the center in the y direction on the element main surface 22a. As shown in FIG. 7, the main surface wiring section 225 includes a third pad section 225a, a fourth pad section 225b, and a connecting section 225c. The third pad portion 225a is a portion to which a wire 61Q, which will be described later, is bonded. The fourth pad portion 225b is a portion to which a wire 62Q, which will be described later, is bonded. The third pad section 225a and the fourth pad section 225b are arranged along the y direction in plan view. The third pad portion 225a is located closer to the y1 side in the y direction than the fourth pad portion 225b. The third pad portion 225a is located closer to the second control element 8B than the fourth pad portion 225b in the y direction. In the illustrated example, the dimension of the third pad section 225a in the x direction and the dimension of the fourth pad section 225b in the x direction are the same (or substantially the same). The connecting portion 225c connects the third pad portion 225a and the fourth pad portion 225b. The dimension of the connecting portion 225c in the x direction is the same (or approximately the same) as each dimension of the third pad portion 225a and the fourth pad portion 225b in the x direction.
 各第2スイッチ部2(第4アーム2A、第5アーム2Bおよび第6アーム2Cの各々)において、スイッチング素子21およびスイッチング素子22は、電気的に並列に接続されている。具体的には、電極211(コレクタ)と電極221(ドレイン)とが電気的に接続され、電極212(エミッタ)と電極222(ソース)とが電気的に接続される。 In each second switch section 2 (each of the fourth arm 2A, fifth arm 2B, and sixth arm 2C), the switching element 21 and the switching element 22 are electrically connected in parallel. Specifically, electrode 211 (collector) and electrode 221 (drain) are electrically connected, and electrode 212 (emitter) and electrode 222 (source) are electrically connected.
 保護素子23は、ダイオード機能部を含む。当該ダイオード機能部は、還流ダイオードとして動作する。本実施形態では、保護素子23は、たとえばショットキーバリアダイオードである。 The protection element 23 includes a diode function section. The diode function section operates as a freewheeling diode. In this embodiment, the protection element 23 is, for example, a Schottky barrier diode.
 保護素子23は、図13に示すように、素子主面23aおよび素子裏面23bを有する。素子主面23aと素子裏面23bとは、z方向に離間する。素子主面23aは、z方向上方(z方向のz1側)を向き、素子裏面23bは、z方向下方(z方向のz2側)を向く。素子主面23aおよび素子裏面23bはそれぞれ、平坦である(略平坦である場合を含む)。 As shown in FIG. 13, the protection element 23 has an element main surface 23a and an element back surface 23b. The element main surface 23a and the element back surface 23b are spaced apart in the z direction. The element main surface 23a faces upward in the z direction (z1 side in the z direction), and the element back surface 23b faces downward in the z direction (z2 side in the z direction). The element main surface 23a and the element back surface 23b are each flat (including the case where they are substantially flat).
 保護素子23は、図13に示すように、2つの電極231,232を含む。電極231は、素子主面23aに形成され、電極232は、素子裏面23bに形成されている。保護素子23がダイオードである例において、電極231はアノードであり、電極232はカソードである。 The protection element 23 includes two electrodes 231 and 232, as shown in FIG. The electrode 231 is formed on the main surface 23a of the element, and the electrode 232 is formed on the back surface 23b of the element. In the example where protection element 23 is a diode, electrode 231 is an anode and electrode 232 is a cathode.
 各第2スイッチ部2(第4アーム2A、第5アーム2Bおよび第6アーム2Cの各々)において、保護素子23は、スイッチング素子21およびスイッチング素子22に対して、逆並列に接続されている。逆並列とは、スイッチング素子21およびスイッチング素子22の各順方向電流と、保護素子23における順方向電流とが、逆向きになるように並列接続された状態である。保護素子23の電極231(アノード)は、スイッチング素子21の電極212(エミッタ)およびスイッチング素子22の電極222(ソース)に接続され、保護素子23の電極232(カソード)は、スイッチング素子21の電極211(コレクタ)およびスイッチング素子22の電極221(ドレイン)に接続されている。これにより、各第2スイッチ部2において、スイッチング素子21およびスイッチング素子22に逆電圧が印加されたとき、保護素子23に順方向電流が流れ、スイッチング素子21およびスイッチング素子22に印加される逆電圧が低減される。 In each of the second switch sections 2 (fourth arm 2A, fifth arm 2B, and sixth arm 2C), the protection element 23 is connected antiparallel to the switching element 21 and the switching element 22. Antiparallel means a state in which the forward currents of the switching elements 21 and 22 and the forward currents of the protection element 23 are connected in parallel so that they are in opposite directions. The electrode 231 (anode) of the protection element 23 is connected to the electrode 212 (emitter) of the switching element 21 and the electrode 222 (source) of the switching element 22, and the electrode 232 (cathode) of the protection element 23 is connected to the electrode 212 (emitter) of the switching element 21 and the electrode 222 (source) of the switching element 22. 211 (collector) and the electrode 221 (drain) of the switching element 22. Thereby, in each second switch section 2, when a reverse voltage is applied to the switching element 21 and the switching element 22, a forward current flows through the protection element 23, and the reverse voltage is applied to the switching element 21 and the switching element 22. is reduced.
 図10、図11および図13から理解されるように、スイッチング素子21A、スイッチング素子22Aおよび保護素子23Aはそれぞれ、導電性接合材29を介して、リード3Aに接合されている。スイッチング素子21B、スイッチング素子22Bおよび保護素子23Bもそれぞれ、導電性接合材29を介して、リード3Aに接合されている。スイッチング素子21C、スイッチング素子22Cおよび保護素子23Cもそれぞれ、導電性接合材29を介して、リード3Aに接合されている。これらの導電性接合材29は、たとえばはんだ、金属ペースト材、あるいは焼結金属などである。 As understood from FIGS. 10, 11, and 13, the switching element 21A, the switching element 22A, and the protection element 23A are each bonded to the lead 3A via the conductive bonding material 29. Switching element 21B, switching element 22B, and protection element 23B are also bonded to lead 3A via conductive bonding material 29, respectively. The switching element 21C, the switching element 22C, and the protection element 23C are also each bonded to the lead 3A via the conductive bonding material 29. These conductive bonding materials 29 are, for example, solder, metal paste, or sintered metal.
 図6に示すように、各第2スイッチ部2(第4アーム2A、第5アーム2Bおよび第6アーム2Cの各々)において、スイッチング素子21、スイッチング素子22および保護素子23は、y方向に一列に配置される。図示された例では、各第2スイッチ部2(第4アーム2A、第5アーム2Bおよび第6アーム2C)において、y方向のy1側からy2側に向け、スイッチング素子22、スイッチング素子21、保護素子23の順に配置される。よって、y方向において、スイッチング素子21は、スイッチング素子22と保護素子23との間に位置する。なお、各第2スイッチ部2(第4アーム2A、第5アーム2Bおよび第6アーム2Cの各々)において、スイッチング素子21とスイッチング素子22との各位置が反対であってもよい。この場合、スイッチング素子21に主面配線部225と同様の主面配線部が形成される。 As shown in FIG. 6, in each second switch section 2 (each of the fourth arm 2A, the fifth arm 2B, and the sixth arm 2C), the switching element 21, the switching element 22, and the protection element 23 are arranged in a line in the y direction. will be placed in In the illustrated example, in each second switch section 2 (fourth arm 2A, fifth arm 2B, and sixth arm 2C), the switching element 22, the switching element 21, the protection They are arranged in the order of elements 23. Therefore, the switching element 21 is located between the switching element 22 and the protection element 23 in the y direction. In addition, in each of the second switch sections 2 (each of the fourth arm 2A, the fifth arm 2B, and the sixth arm 2C), the positions of the switching element 21 and the switching element 22 may be opposite. In this case, a main surface wiring section similar to the main surface wiring section 225 is formed in the switching element 21 .
 複数の第1スイッチ部1および複数の第2スイッチ部2によって構成される三相交流のインバータ回路は、図14に示すように、第1相10U、第2相10Vおよび第3相10Wを有する。第1相10U、第2相10Vおよび第3相10Wはそれぞれ、U相、V相、W相である。 As shown in FIG. 14, a three-phase AC inverter circuit constituted by a plurality of first switch sections 1 and a plurality of second switch sections 2 has a first phase of 10U, a second phase of 10V, and a third phase of 10W. . The first phase 10U, second phase 10V, and third phase 10W are U phase, V phase, and W phase, respectively.
 第1相10Uは、第1アーム1Aと第4アーム2Aとを含む。第1相10Uにおいて、第1アーム1Aと第4アーム2Aとは電気的に直列に接続されている。第1アーム1Aは、第1相10Uの下アームであり、第4アーム2Aは、第1相10Uの上アームである。 The first phase 10U includes a first arm 1A and a fourth arm 2A. In the first phase 10U, the first arm 1A and the fourth arm 2A are electrically connected in series. The first arm 1A is the lower arm of the first phase 10U, and the fourth arm 2A is the upper arm of the first phase 10U.
 第2相10Vは、第2アーム1Bと第5アーム2Bとを含む。第2相10Vにおいて、第2アーム1Bと第5アーム2Bとは電気的に直列に接続されている。第2アーム1Bは、第2相10Vの下アームであり、第5アーム2Bは、第2相10Vの上アームである。 The second phase 10V includes a second arm 1B and a fifth arm 2B. At the second phase of 10V, the second arm 1B and the fifth arm 2B are electrically connected in series. The second arm 1B is the lower arm of the second phase 10V, and the fifth arm 2B is the upper arm of the second phase 10V.
 第3相10Wは、第3アーム1Cと第6アーム2Cとを含む。第3相10Wにおいて、第3アーム1Cと第6アーム2Cとは電気的に直列に接続されている。第3アーム1Cは、第3相10Wの下アームであり、第6アーム2Cは、第3相10Wの上アームである。 The third phase 10W includes a third arm 1C and a sixth arm 2C. In the third phase 10W, the third arm 1C and the sixth arm 2C are electrically connected in series. The third arm 1C is the lower arm of the third phase 10W, and the sixth arm 2C is the upper arm of the third phase 10W.
 第1制御素子8Aは、複数のスイッチング素子11および複数のスイッチング素子12のスイッチング動作を制御するものであり、たとえばドライバICである。第1制御素子8Aは、外部から第1入力信号が入力され、当該第1入力信号に基づいて、各第1スイッチ部1のスイッチング動作を制御するための第1駆動信号を生成する。第1制御素子8Aは、各スイッチング素子11の電極113(ゲート)および各スイッチング素子12の電極123(ゲート)に第1駆動信号(たとえばゲート電圧)を出力する。これにより、各スイッチング素子11および各スイッチング素子12のスイッチング動作を制御する。本実施形態では、第1制御素子8Aは、平面視において、x方向を長手方向とする矩形状である。 The first control element 8A controls the switching operations of the plurality of switching elements 11 and the plurality of switching elements 12, and is, for example, a driver IC. The first control element 8A receives a first input signal from the outside and generates a first drive signal for controlling the switching operation of each first switch section 1 based on the first input signal. The first control element 8A outputs a first drive signal (eg, gate voltage) to the electrode 113 (gate) of each switching element 11 and the electrode 123 (gate) of each switching element 12. Thereby, the switching operation of each switching element 11 and each switching element 12 is controlled. In the present embodiment, the first control element 8A has a rectangular shape whose longitudinal direction is in the x direction in plan view.
 本実施形態では、第1制御素子8Aは、各第1スイッチ部1(第1アーム1A、第2アーム1Bおよび第3アーム1Cの各々)に対して、スイッチング素子11に入力する第1駆動信号と、スイッチング素子12に入力する第1駆動信号とで、遅延時間を設けている。当該遅延時間は、たとえば、スイッチング素子11のスイッチング速度とスイッチング素子12のスイッチング速度とに応じて適宜変更される。スイッチング素子11がIGBTであり、スイッチング素子12がMOSFETである例において、スイッチング素子12への第1駆動信号は、スイッチング素子11への第1駆動信号よりも、オン信号からオフ信号への切り替わりタイミング、および、オフ信号からオン信号への切り替わりタイミングがそれぞれ早い。なお、第1制御素子8Aは、スイッチング素子11に入力する第1駆動信号と、スイッチング素子12に入力する第1駆動信号とで、必ずしも遅延時間を設けなくてもよい。 In this embodiment, the first control element 8A provides a first drive signal input to the switching element 11 for each first switch section 1 (each of the first arm 1A, second arm 1B, and third arm 1C). A delay time is provided between the first drive signal and the first drive signal input to the switching element 12. The delay time is changed as appropriate depending on, for example, the switching speed of switching element 11 and the switching speed of switching element 12. In an example in which the switching element 11 is an IGBT and the switching element 12 is a MOSFET, the first drive signal to the switching element 12 has a timing of switching from an on signal to an off signal than the first drive signal to the switching element 11. , and the switching timing from the off signal to the on signal is early. Note that the first control element 8A does not necessarily need to provide a delay time between the first drive signal input to the switching element 11 and the first drive signal input to the switching element 12.
 図4に示すように、第1制御素子8Aは、各第1スイッチ部1に対して、y方向のy1側に位置する。よって、第1制御素子8Aは、各第1スイッチ部1のスイッチング素子11およびスイッチング素子12よりも、y方向のy1側に位置する。本実施形態では、各第1スイッチ部1において、スイッチング素子12がスイッチング素子11よりもy方向のy1側に位置するので、スイッチング素子12は、y方向において、第1制御素子8Aとスイッチング素子11との間に位置する。 As shown in FIG. 4, the first control element 8A is located on the y1 side in the y direction with respect to each first switch section 1. Therefore, the first control element 8A is located closer to the y1 side in the y direction than the switching element 11 and the switching element 12 of each first switch section 1. In the present embodiment, in each first switch section 1, the switching element 12 is located on the y1 side in the y direction than the switching element 11, so the switching element 12 is located closer to the first control element 8A and the switching element 11 in the y direction. located between.
 第2制御素子8Bは、複数のスイッチング素子21および複数のスイッチング素子22のスイッチング動作を制御するものであり、たとえばドライバICである。第2制御素子8Bは、外部から第2入力信号が入力され、当該第2入力信号に基づいて、各第2スイッチ部2のスイッチング動作を制御するための第2駆動信号を生成する。第2制御素子8Bは、各スイッチング素子21の電極213(ゲート)および各スイッチング素子22の電極223(ゲート)に第2駆動信号(たとえばゲート電圧)を出力する。これにより、各スイッチング素子21および各スイッチング素子22のスイッチング動作を制御する。本実施形態では、第2制御素子8Bは、平面視において、x方向を長手方向とする矩形状である。 The second control element 8B controls the switching operations of the plurality of switching elements 21 and the plurality of switching elements 22, and is, for example, a driver IC. The second control element 8B receives a second input signal from the outside and generates a second drive signal for controlling the switching operation of each second switch section 2 based on the second input signal. The second control element 8B outputs a second drive signal (eg, gate voltage) to the electrode 213 (gate) of each switching element 21 and the electrode 223 (gate) of each switching element 22. Thereby, the switching operation of each switching element 21 and each switching element 22 is controlled. In this embodiment, the second control element 8B has a rectangular shape whose longitudinal direction is the x direction in plan view.
 本実施形態では、第2制御素子8Bは、各第2スイッチ部2(第4アーム2A、第5アーム2Bおよび第6アーム2Cの各々)に対して、スイッチング素子21に入力する第2駆動信号と、スイッチング素子22に入力する第2駆動信号とで、遅延時間を設けている。当該遅延時間は、たとえば、スイッチング素子21のスイッチング速度とスイッチング素子22のスイッチング速度とに応じて適宜変更される。スイッチング素子21がIGBTであり、スイッチング素子22がMOSFETである例において、スイッチング素子22への第2駆動信号は、スイッチング素子21への第2駆動信号よりも、オン信号からオフ信号への切り替わりタイミング、および、オフ信号からオン信号への切り替わりタイミングがそれぞれ早い。なお、第2制御素子8Bは、スイッチング素子21に入力する第2駆動信号と、スイッチング素子22に入力する第2駆動信号とで、必ずしも遅延時間を設けなくてもよい。 In the present embodiment, the second control element 8B provides a second drive signal input to the switching element 21 for each second switch section 2 (fourth arm 2A, fifth arm 2B, and sixth arm 2C). A delay time is provided between the second drive signal and the second drive signal input to the switching element 22. The delay time is changed as appropriate depending on, for example, the switching speed of the switching element 21 and the switching speed of the switching element 22. In an example in which the switching element 21 is an IGBT and the switching element 22 is a MOSFET, the second drive signal to the switching element 22 has a timing for switching from an on signal to an off signal than the second drive signal to the switching element 21. , and the switching timing from the off signal to the on signal is early. Note that the second control element 8B does not necessarily need to provide a delay time between the second drive signal input to the switching element 21 and the second drive signal input to the switching element 22.
 図6に示すように、第2制御素子8Bは、各第2スイッチ部2に対して、y方向のy1側に位置する。よって、第2制御素子8Bは、各第2スイッチ部2のスイッチング素子21およびスイッチング素子22よりも、y方向のy1側に位置する。本実施形態では、各第2スイッチ部2において、スイッチング素子22がスイッチング素子21よりもy方向のy1側に位置するので、スイッチング素子22は、y方向において、第2制御素子8Bとスイッチング素子21との間に位置する。 As shown in FIG. 6, the second control element 8B is located on the y1 side in the y direction with respect to each second switch section 2. Therefore, the second control element 8B is located closer to the y1 side in the y direction than the switching element 21 and the switching element 22 of each second switch section 2. In this embodiment, in each second switch section 2, the switching element 22 is located on the y1 side in the y direction than the switching element 21, so that the switching element 22 is located closer to the second control element 8B and the switching element 21 in the y direction. located between.
 図4および図6に示すように、第1制御素子8Aおよび第2制御素子8Bはそれぞれ、複数の電極81,82を有する。複数の電極81,82は、第1制御素子8Aおよび第2制御素子8Bの各々の上面に配置される。第1制御素子8Aの複数の電極81は、複数の第1スイッチ部1(第1アーム1A、第2アーム1Bおよび第3アーム1C)のいずれかに導通する。第1制御素子8Aの複数の電極81からは、先述の第1駆動信号が出力される。第1制御素子8Aの複数の電極82は、リード4A~4Hのいずれかに導通する。第2制御素子8Bの複数の電極81は、複数の第2スイッチ部2(第4アーム2A、第5アーム2Bおよび第6アーム2C)のいずれかに導通する。第2制御素子8Bの電極81からは、先述の第2駆動信号が出力される。第2制御素子8Bの複数の電極82は、リード4J~4N,4Q,4Rのいずれかに導通する。さらに、第2制御素子8Bは、複数の電極83を有する。複数の電極83は、第2制御素子8Bの上面に配置される。複数の電極83はそれぞれ、複数の第2スイッチ部2(第4アーム2A、第5アーム2Bおよび第6アーム2C)のうちの対応する1つに導通する。複数の電極83には、各第1スイッチ部1の導通状態を検出するための検出信号が入力される。 As shown in FIGS. 4 and 6, the first control element 8A and the second control element 8B each have a plurality of electrodes 81 and 82. A plurality of electrodes 81 and 82 are arranged on the upper surface of each of the first control element 8A and the second control element 8B. The plurality of electrodes 81 of the first control element 8A are electrically connected to any one of the plurality of first switch sections 1 (first arm 1A, second arm 1B, and third arm 1C). The aforementioned first drive signal is output from the plurality of electrodes 81 of the first control element 8A. The plurality of electrodes 82 of the first control element 8A are electrically connected to any of the leads 4A to 4H. The plurality of electrodes 81 of the second control element 8B are electrically connected to any one of the plurality of second switch sections 2 (fourth arm 2A, fifth arm 2B, and sixth arm 2C). The aforementioned second drive signal is output from the electrode 81 of the second control element 8B. The plurality of electrodes 82 of the second control element 8B are electrically connected to any one of the leads 4J to 4N, 4Q, and 4R. Furthermore, the second control element 8B has a plurality of electrodes 83. A plurality of electrodes 83 are arranged on the upper surface of the second control element 8B. Each of the plurality of electrodes 83 is electrically connected to a corresponding one of the plurality of second switch sections 2 (fourth arm 2A, fifth arm 2B, and sixth arm 2C). A detection signal for detecting the conduction state of each first switch section 1 is input to the plurality of electrodes 83 .
 第1制御素子8Aは、図12に示すように、接合材85を介して、リード4Rに接合される。第2制御素子8Bは、図13に示すように、接合材85を介して、リード4Hに接合される。半導体装置A1では、第1制御素子8Aおよび第2制御素子8Bの各下面(z方向のz2側を向く面)に電極が形成されていないため、接合材85は、導電性でも絶縁性でもよい。なお、第1制御素子8Aおよび第2制御素子8Bの各下面に電極が形成されている場合、接合材85には、導電性のもの(たとえばはんだ、金属ペース材、焼結金属など)が用いられる。 The first control element 8A is bonded to the lead 4R via a bonding material 85, as shown in FIG. The second control element 8B is bonded to the lead 4H via a bonding material 85, as shown in FIG. In the semiconductor device A1, since electrodes are not formed on the lower surfaces of the first control element 8A and the second control element 8B (the surfaces facing the z2 side in the z direction), the bonding material 85 may be conductive or insulating. . Note that when electrodes are formed on the lower surfaces of each of the first control element 8A and the second control element 8B, the bonding material 85 may be a conductive material (for example, solder, metal paste material, sintered metal, etc.). It will be done.
 複数の電子部品89U,89V,89Wはそれぞれ、第1制御素子8Aおよび第2制御素子8Bの各機能を補助する素子であり、たとえばダイオードである。図3に示す例では、3つの電子部品89U,89V,89Wを備えるが、当該電子部品の数は、これに限定されない。複数の電子部品89U,89V,89Wはそれぞれ、図3に示すように、複数のリード4A,4B,4Cのうちの対応する1つにそれぞれ接合されている。複数の電子部品89U,89V,89Wはそれぞれ、図13に示すように、導電性接合材891により、接合されている。導電性接合材891は、たとえばはんだ、金属ペースト材、または焼結金属などである。 The plurality of electronic components 89U, 89V, and 89W are elements that assist the respective functions of the first control element 8A and the second control element 8B, and are, for example, diodes. Although the example shown in FIG. 3 includes three electronic components 89U, 89V, and 89W, the number of electronic components is not limited to this. As shown in FIG. 3, each of the plurality of electronic components 89U, 89V, and 89W is joined to a corresponding one of the plurality of leads 4A, 4B, and 4C. The plurality of electronic components 89U, 89V, and 89W are each bonded using a conductive bonding material 891, as shown in FIG. The conductive bonding material 891 is, for example, solder, metal paste material, sintered metal, or the like.
 複数のリード3A~3G,3Zおよび複数のリード4A~4H,4J~4N,4P~4Rは、図3などに示すように、複数のスイッチング素子11、複数のスイッチング素子12、複数の保護素子13、複数のスイッチング素子21、複数のスイッチング素子22、複数の保護素子23、第1制御素子8A、第2制御素子8B、および、複数の電子部品89U,89V,89Wを支持し、且つ、これらへの導通経路を構成する。複数のリード3A~3G,3Zおよび複数のリード4A~4H,4J~4N,4P~4Rのうち、リード4Hとリード4Rとは一体的に形成されており、それ以外は、互いに離間する。図3に示す補助線L1は、リード4Hとリード4Rとの境界であって、一体的に繋がる部分を示している。なお、リード4Hとリード4Rとを1つのリードとみなしてもよい。この例とは異なり、リード4Hとリード4Rとが互いに離間していてもよい。 The plurality of leads 3A to 3G, 3Z and the plurality of leads 4A to 4H, 4J to 4N, 4P to 4R are connected to the plurality of switching elements 11, the plurality of switching elements 12, and the plurality of protection elements 13, as shown in FIG. , supports the plurality of switching elements 21, the plurality of switching elements 22, the plurality of protection elements 23, the first control element 8A, the second control element 8B, and the plurality of electronic components 89U, 89V, 89W, and is connected to them. Constructs a conduction path. Among the plurality of leads 3A to 3G, 3Z and the plurality of leads 4A to 4H, 4J to 4N, and 4P to 4R, the leads 4H and 4R are integrally formed, and the others are spaced apart from each other. The auxiliary line L1 shown in FIG. 3 is the boundary between the lead 4H and the lead 4R, and shows a part where they are integrally connected. Note that the lead 4H and the lead 4R may be regarded as one lead. Unlike this example, the leads 4H and 4R may be spaced apart from each other.
 複数のリード3A~3G,3Zと、複数のリード4A~4H,4J~4N,4P~4Rとは、異なる導電部材から形成されてもよいし、1つの導電部材から形成されてもよい。複数のリード3A~3G,3Zおよび複数のリード4A~4H,4J~4N,4P~4Rは、たとえばCuまたはCu合金からなる。複数のリード3A~3G,3Zおよび複数のリード4A~4H,4J~4N,4P~4Rの各構成材料は、CuまたはCu合金でなく、NiまたはNi合金、あるいは、42アロイなどであってもよい。なお、複数のリード3A~3G,3Zの各構成材料と、複数のリード4A~4H,4J~4N,4P~4Rの各構成材料とは、同じであってもよいし、異なっていてもよい。 The plurality of leads 3A to 3G, 3Z and the plurality of leads 4A to 4H, 4J to 4N, 4P to 4R may be formed from different conductive members, or may be formed from one conductive member. The plurality of leads 3A to 3G, 3Z and the plurality of leads 4A to 4H, 4J to 4N, 4P to 4R are made of, for example, Cu or a Cu alloy. The constituent materials of the plurality of leads 3A to 3G, 3Z and the plurality of leads 4A to 4H, 4J to 4N, 4P to 4R may be not Cu or Cu alloy, but Ni or Ni alloy, or 42 alloy. good. Note that the respective constituent materials of the plurality of leads 3A to 3G, 3Z and the respective constituent materials of the plurality of leads 4A to 4H, 4J to 4N, 4P to 4R may be the same or different. .
 半導体装置A1がIPMとして構成された場合、複数のリード3A~3Gにはモータの駆動電流が流され、複数のリード4A~4H,4J~4N,4P~4Rには制御電流が流される。このため、複数のリード3A~3Gには、複数のリード4A~4H,4J~4N,4P~4Rよりも高電圧が印加され、より大きな電流が流される。図3に示すように、本実施形態では、高電圧側の複数のリード3A~3G,3Zと、低電圧側のリード4A~4H,4J~4N,4P~4Rとは、y方向において、互いに反対側に分かれて配置されている。 When the semiconductor device A1 is configured as an IPM, a motor drive current is passed through the plurality of leads 3A to 3G, and a control current is passed to the plurality of leads 4A to 4H, 4J to 4N, and 4P to 4R. Therefore, a higher voltage is applied to the plurality of leads 3A to 3G than to the plurality of leads 4A to 4H, 4J to 4N, and 4P to 4R, and a larger current is applied to the plurality of leads 3A to 3G. As shown in FIG. 3, in this embodiment, the plurality of leads 3A to 3G, 3Z on the high voltage side and the leads 4A to 4H, 4J to 4N, 4P to 4R on the low voltage side are mutually connected in the y direction. They are placed on opposite sides.
 リード3Aには、複数の第2スイッチ部2(第4アーム2A、第5アーム2Bおよび第6アーム2C)の各々のスイッチング素子21、スイッチング素子22および保護素子23がそれぞれ、搭載される。リード3Aは、後に後述される構成から理解されるように、各スイッチング素子21の電極211(コレクタ)、各スイッチング素子22の電極221(ドレイン)、および、各保護素子23の電極232(カソード)に導通する。リード3Aは、図3および図6などに示すように、複数の搭載部311A,312A,313A、端子部32A、パッド部33Aおよび連結部34Aを含む。 The switching element 21, switching element 22, and protection element 23 of each of the plurality of second switch sections 2 (fourth arm 2A, fifth arm 2B, and sixth arm 2C) are mounted on the lead 3A. As will be understood from the configuration described later, the lead 3A includes an electrode 211 (collector) of each switching element 21, an electrode 221 (drain) of each switching element 22, and an electrode 232 (cathode) of each protection element 23. conducts to. As shown in FIGS. 3 and 6, the lead 3A includes a plurality of mounting portions 311A, 312A, 313A, a terminal portion 32A, a pad portion 33A, and a connecting portion 34A.
 図3に示すように、複数の搭載部311A,312A,313Aはそれぞれ、封止部材7に覆われている。複数の搭載部311A,312A,313Aは、一体的に形成されている。複数の搭載部311A,312A,313Aはそれぞれ、接合材39を介して、支持基板51に接合されている。接合材39は、導電性のものであってもよいし絶縁性のものであってもよい。接合材39は、好ましくは熱伝導性に優れたものがよい。 As shown in FIG. 3, the plurality of mounting parts 311A, 312A, and 313A are each covered with a sealing member 7. The plurality of mounting parts 311A, 312A, and 313A are integrally formed. The plurality of mounting parts 311A, 312A, and 313A are each bonded to the support substrate 51 via a bonding material 39. The bonding material 39 may be conductive or insulating. The bonding material 39 is preferably one with excellent thermal conductivity.
 図6に示すように、搭載部311Aには、スイッチング素子21A、スイッチング素子22Aおよび保護素子23Aがそれぞれ搭載されている。搭載部311Aは、スイッチング素子21Aの電極211(コレクタ)およびスイッチング素子22Aの電極221(ドレイン)に導通しつつ、保護素子23Aの電極232(カソード)に導通する。つまり、搭載部311Aを介して、スイッチング素子21Aの電極211とスイッチング素子22Aの電極221と保護素子23Aの電極232とが互いに導通する。 As shown in FIG. 6, a switching element 21A, a switching element 22A, and a protection element 23A are mounted on the mounting portion 311A, respectively. The mounting portion 311A is electrically connected to the electrode 211 (collector) of the switching element 21A and the electrode 221 (drain) of the switching element 22A, and is electrically connected to the electrode 232 (cathode) of the protection element 23A. That is, the electrode 211 of the switching element 21A, the electrode 221 of the switching element 22A, and the electrode 232 of the protection element 23A are electrically connected to each other via the mounting portion 311A.
 図6に示すように、搭載部312Aには、スイッチング素子21B、スイッチング素子22Bおよび保護素子23Bがそれぞれ搭載されている。搭載部312Aは、スイッチング素子21Bの電極211(コレクタ)およびスイッチング素子22Bの電極221(ドレイン)に導通しつつ、保護素子23Bの電極232(カソード)に導通する。つまり、搭載部312Aを介して、スイッチング素子21Bの電極211とスイッチング素子22Bの電極221と保護素子23Bの電極232とが互いに導通する。 As shown in FIG. 6, a switching element 21B, a switching element 22B, and a protection element 23B are mounted on the mounting portion 312A, respectively. The mounting portion 312A is electrically connected to the electrode 211 (collector) of the switching element 21B and the electrode 221 (drain) of the switching element 22B, and is electrically connected to the electrode 232 (cathode) of the protection element 23B. That is, the electrode 211 of the switching element 21B, the electrode 221 of the switching element 22B, and the electrode 232 of the protection element 23B are electrically connected to each other via the mounting portion 312A.
 図6に示すように、搭載部313Aには、スイッチング素子21C、スイッチング素子22Cおよび保護素子23Cがそれぞれ搭載されている。搭載部313Aは、スイッチング素子21Cの電極211(コレクタ)およびスイッチング素子22Cの電極221(ドレイン)に導通しつつ、保護素子23Cの電極232(カソード)に導通する。つまり、搭載部313Aを介して、スイッチング素子21Cの電極211とスイッチング素子22Cの電極221と保護素子23Cの電極232とが互いに導通する。 As shown in FIG. 6, a switching element 21C, a switching element 22C, and a protection element 23C are mounted on the mounting portion 313A, respectively. The mounting portion 313A is electrically connected to the electrode 211 (collector) of the switching element 21C and the electrode 221 (drain) of the switching element 22C, and is electrically connected to the electrode 232 (cathode) of the protection element 23C. That is, the electrode 211 of the switching element 21C, the electrode 221 of the switching element 22C, and the electrode 232 of the protection element 23C are electrically connected to each other via the mounting portion 313A.
 端子部32Aは、図3に示すように、リード3Aのうち封止部材7から突出した部位である。端子部32Aは、y方向において、各搭載部311A,312A,313Aに対して、リード4A~4H,4J~4N,4P~4Rとは反対側に突出している。端子部32Aは、半導体装置A1を外部の回路に電気的に接続するために用いられる。図示された例においては、端子部32Aは、z方向のz1側に折り曲げられて、L字状をなす。 The terminal portion 32A is a portion of the lead 3A that protrudes from the sealing member 7, as shown in FIG. The terminal portion 32A protrudes from the mounting portions 311A, 312A, and 313A on the opposite side from the leads 4A to 4H, 4J to 4N, and 4P to 4R in the y direction. The terminal portion 32A is used to electrically connect the semiconductor device A1 to an external circuit. In the illustrated example, the terminal portion 32A is bent toward the z1 side in the z direction to form an L-shape.
 パッド部33Aおよび連結部34Aは、封止部材7に覆われている。パッド部33Aおよび連結部34Aは、図3に示すように、搭載部312Aと端子部32Aとの間に介在する。パッド部33Aは、搭載部312Aに対してz方向のz1側に位置しており、端子部32Aに繋がっている。連結部34Aは、図13に示すように、搭載部311Aとパッド部33Aとに繋がっており、y方向に対して傾いている。 The pad portion 33A and the connecting portion 34A are covered with the sealing member 7. The pad portion 33A and the connecting portion 34A are interposed between the mounting portion 312A and the terminal portion 32A, as shown in FIG. The pad portion 33A is located on the z1 side in the z direction with respect to the mounting portion 312A, and is connected to the terminal portion 32A. As shown in FIG. 13, the connecting portion 34A is connected to the mounting portion 311A and the pad portion 33A, and is inclined with respect to the y direction.
 図3に示すように、リード3B、リード3Cおよびリード3Dは、リード3Aに対してx方向のx2側に配置されている。リード3B、リード3Cおよびリード3Dは、x方向に並んでいる。リード3B、リード3Cおよびリード3Dの形状等は特に限定されず、図示された例においては、リード3B、リード3Cおよびリード3Dは、同形状(あるいは略同形状)および同サイズ(あるいは略同サイズ)である。 As shown in FIG. 3, the leads 3B, 3C, and 3D are arranged on the x2 side in the x direction with respect to the leads 3A. Leads 3B, 3C, and 3D are lined up in the x direction. The shapes of the leads 3B, 3C, and 3D are not particularly limited, and in the illustrated example, the leads 3B, 3C, and 3D have the same shape (or approximately the same shape) and the same size (or approximately the same size). ).
 リード3Bには、第1アーム1Aが搭載される。つまり、リード3Bには、スイッチング素子11A、スイッチング素子12Aおよび保護素子13Aがそれぞれ搭載される。リード3Bは、後に詳述される構成から理解されるように、スイッチング素子11Aの電極111(コレクタ)、スイッチング素子12Aの電極121(ドレイン)および保護素子13Aの電極132(カソード)に導通する。リード3Bは、図3および図4に示すように、搭載部31B、端子部32B、パッド部33Bおよび連結部34Bを含む。 The first arm 1A is mounted on the lead 3B. That is, the switching element 11A, the switching element 12A, and the protection element 13A are mounted on the lead 3B, respectively. As will be understood from the configuration detailed later, the lead 3B is electrically connected to the electrode 111 (collector) of the switching element 11A, the electrode 121 (drain) of the switching element 12A, and the electrode 132 (cathode) of the protection element 13A. As shown in FIGS. 3 and 4, the lead 3B includes a mounting portion 31B, a terminal portion 32B, a pad portion 33B, and a connecting portion 34B.
 図3に示すように、搭載部31Bは、封止部材7に覆われている。搭載部31Bは、接合材39を介して、支持基板51に接合されている。図4に示すように、搭載部31Bには、スイッチング素子11A、スイッチング素子12Aおよび保護素子13Aがそれぞれ搭載されている。搭載部31Bは、スイッチング素子11Aの電極111(コレクタ)およびスイッチング素子12Aの電極121(ドレイン)に導通しつつ、保護素子13Aの電極132(カソード)に導通する。つまり、搭載部31Bを介して、スイッチング素子11Aの電極111と、スイッチング素子12Aの電極121、と保護素子13Aの電極132とが互いに導通する。 As shown in FIG. 3, the mounting portion 31B is covered with a sealing member 7. The mounting portion 31B is bonded to the support substrate 51 via a bonding material 39. As shown in FIG. 4, a switching element 11A, a switching element 12A, and a protection element 13A are mounted on the mounting portion 31B, respectively. The mounting portion 31B is electrically connected to the electrode 111 (collector) of the switching element 11A and the electrode 121 (drain) of the switching element 12A, and is electrically connected to the electrode 132 (cathode) of the protection element 13A. That is, the electrode 111 of the switching element 11A, the electrode 121 of the switching element 12A, and the electrode 132 of the protection element 13A are electrically connected to each other via the mounting portion 31B.
 端子部32Bは、図3に示すように、リード3Bのうち封止部材7から突出した部位である。端子部32Bは、y方向において搭載部31Bに対してリード4A~4H,4J~4N,4P~4Rとは反対側に突出している。端子部32Bは、半導体装置A1を外部の回路に電気的に接続するために用いられる。図示された例においては、端子部32Bは、z方向のz1側に折り曲げられて、L字状をなす。 The terminal portion 32B is a portion of the lead 3B that protrudes from the sealing member 7, as shown in FIG. The terminal portion 32B protrudes from the mounting portion 31B in the y direction on the side opposite to the leads 4A to 4H, 4J to 4N, and 4P to 4R. The terminal portion 32B is used to electrically connect the semiconductor device A1 to an external circuit. In the illustrated example, the terminal portion 32B is bent toward the z1 side in the z direction to form an L-shape.
 パッド部33Bおよび連結部34Bは、封止部材7に覆われている。パッド部33Bおよび連結部34Bは、図3に示すように、搭載部31Bと端子部32Bとの間に介在する。パッド部33Bは、パッド部33Aと同様に搭載部31Bに対してz方向のz1側に位置する。パッド部33Bは、端子部32Bに繋がっている。パッド部33Bには、ワイヤ6Aが接合されている。連結部34Bは、搭載部31Bとパッド部33Bとに繋がっており、連結部34Aと同様に、y方向に対して傾いている。 The pad portion 33B and the connecting portion 34B are covered with the sealing member 7. The pad portion 33B and the connecting portion 34B are interposed between the mounting portion 31B and the terminal portion 32B, as shown in FIG. The pad portion 33B, like the pad portion 33A, is located on the z1 side in the z direction with respect to the mounting portion 31B. The pad portion 33B is connected to the terminal portion 32B. A wire 6A is bonded to the pad portion 33B. The connecting portion 34B is connected to the mounting portion 31B and the pad portion 33B, and is inclined with respect to the y direction similarly to the connecting portion 34A.
 リード3Cには、第2アーム1Bが搭載される。つまり、リード3Cには、スイッチング素子11B、スイッチング素子12Bおよび保護素子13Bがそれぞれ搭載される。リード3Cは、後に詳述される構成から理解されるように、スイッチング素子11Bの電極111(コレクタ)、スイッチング素子12Bの電極121(ドレイン)および保護素子13Bの電極132(カソード)に導通する。リード3Cは、図3および図4に示すように、搭載部31C、端子部32C、パッド部33Cおよび連結部34Cを含む。 The second arm 1B is mounted on the lead 3C. That is, the switching element 11B, the switching element 12B, and the protection element 13B are mounted on the lead 3C, respectively. As will be understood from the configuration detailed later, the lead 3C is electrically connected to the electrode 111 (collector) of the switching element 11B, the electrode 121 (drain) of the switching element 12B, and the electrode 132 (cathode) of the protection element 13B. As shown in FIGS. 3 and 4, the lead 3C includes a mounting portion 31C, a terminal portion 32C, a pad portion 33C, and a connecting portion 34C.
 図3に示すように、搭載部31Cは、封止部材7に覆われている。搭載部31Cは、接合材39を介して、支持基板51に接合されている。図4に示すように、搭載部31Cには、スイッチング素子11B、スイッチング素子12Bおよび保護素子13Bが搭載されている。搭載部31Cは、スイッチング素子11Bの電極111(コレクタ)およびスイッチング素子12Bの電極121(ドレイン)に導通しつつ、保護素子13Bの電極132(カソード)に導通する。つまり、搭載部31Cを介して、スイッチング素子11Bの電極111と、スイッチング素子12Bの電極121と、保護素子13Bの電極132とが互いに導通する。 As shown in FIG. 3, the mounting portion 31C is covered with a sealing member 7. The mounting portion 31C is bonded to the support substrate 51 via a bonding material 39. As shown in FIG. 4, a switching element 11B, a switching element 12B, and a protection element 13B are mounted on the mounting portion 31C. The mounting portion 31C is electrically connected to the electrode 111 (collector) of the switching element 11B and the electrode 121 (drain) of the switching element 12B, and is electrically connected to the electrode 132 (cathode) of the protection element 13B. That is, the electrode 111 of the switching element 11B, the electrode 121 of the switching element 12B, and the electrode 132 of the protection element 13B are electrically connected to each other via the mounting portion 31C.
 端子部32Cは、図3に示すように、リード3Cのうち封止部材7から突出した部位である。端子部32Cは、y方向において搭載部31Cに対してリード4A~4H,4J~4N,4P~4Rとは反対側に突出している。端子部32Cは、半導体装置A1を外部の回路に電気的に接続するために用いられる。図示された例においては、端子部32Cは、z方向のz1側に折り曲げられて、L字状をなす。 The terminal portion 32C is a portion of the lead 3C that protrudes from the sealing member 7, as shown in FIG. The terminal portion 32C protrudes in the y direction with respect to the mounting portion 31C on the side opposite to the leads 4A to 4H, 4J to 4N, and 4P to 4R. The terminal portion 32C is used to electrically connect the semiconductor device A1 to an external circuit. In the illustrated example, the terminal portion 32C is bent toward the z1 side in the z direction to form an L-shape.
 パッド部33Cおよび連結部34Cは、封止部材7に覆われている。パッド部33Cおよび連結部34Cは、図3に示すように、搭載部31Cと端子部32Cとの間に介在している。パッド部33Cは、パッド部33A,33Bと同様に搭載部31Cに対してz方向のz1側に位置する。パッド部33Cは、端子部32Cに繋がっている。パッド部33Cには、ワイヤ6Bが接合されている。連結部34Cは、搭載部31Cとパッド部33Cとに繋がっており、連結部34A,34Bと同様に、y方向に対して傾いている。 The pad portion 33C and the connecting portion 34C are covered with the sealing member 7. The pad portion 33C and the connecting portion 34C are interposed between the mounting portion 31C and the terminal portion 32C, as shown in FIG. The pad portion 33C is located on the z1 side in the z direction with respect to the mounting portion 31C, similarly to the pad portions 33A and 33B. The pad portion 33C is connected to the terminal portion 32C. A wire 6B is bonded to the pad portion 33C. The connecting portion 34C is connected to the mounting portion 31C and the pad portion 33C, and is inclined with respect to the y direction like the connecting portions 34A and 34B.
 リード3Dは、第3アーム1Cが搭載される。つまり、リード3Dには、スイッチング素子11C、スイッチング素子12Cおよび保護素子13Cがそれぞれ搭載される。リード3Dは、後に詳述される構成から理解されるように、スイッチング素子11Cの電極111(コレクタ)、スイッチング素子12Cの電極121(ドレイン)および保護素子13Cの電極132(カソード)に導通する。リード3Dは、図3および図4に示すように、搭載部31D、端子部32D、パッド部33Dおよび連結部34Dを含む。 The third arm 1C is mounted on the lead 3D. That is, the lead 3D is equipped with a switching element 11C, a switching element 12C, and a protection element 13C, respectively. As will be understood from the configuration detailed later, the lead 3D is electrically connected to the electrode 111 (collector) of the switching element 11C, the electrode 121 (drain) of the switching element 12C, and the electrode 132 (cathode) of the protection element 13C. As shown in FIGS. 3 and 4, the lead 3D includes a mounting portion 31D, a terminal portion 32D, a pad portion 33D, and a connecting portion 34D.
 図3に示すように、搭載部31Dは、封止部材7に覆われている。搭載部31Dは、接合材39を介して、支持基板51に接合されている。図4に示すように、搭載部31Dには、スイッチング素子11C、スイッチング素子12Cおよび保護素子13Cが搭載されている。搭載部31Dは、スイッチング素子11Cの電極111(コレクタ)およびスイッチング素子12Cの電極121(ドレイン)に導通しつつ、保護素子13Cの電極132(カソード)に導通する。つまり、搭載部31Dを介して、スイッチング素子11Cの電極111と、スイッチング素子12Cの電極121と、保護素子13Cの電極132とが互いに導通する。 As shown in FIG. 3, the mounting portion 31D is covered with a sealing member 7. The mounting portion 31D is bonded to the support substrate 51 via a bonding material 39. As shown in FIG. 4, a switching element 11C, a switching element 12C, and a protection element 13C are mounted on the mounting portion 31D. The mounting portion 31D is electrically connected to the electrode 111 (collector) of the switching element 11C and the electrode 121 (drain) of the switching element 12C, and is electrically connected to the electrode 132 (cathode) of the protection element 13C. That is, the electrode 111 of the switching element 11C, the electrode 121 of the switching element 12C, and the electrode 132 of the protection element 13C are electrically connected to each other via the mounting portion 31D.
 端子部32Dは、図3に示すように、リード3Dのうち封止部材7から突出した部位である。端子部32Dは、y方向において搭載部31Dに対してリード4A~4H,4J~4N,4P~4Rとは反対側に突出している。端子部32Dは、半導体装置A1を外部の回路に電気的に接続するために用いられる。図示された例においては、端子部32Dは、z方向のz1側に折り曲げられて、L字状をなす。 As shown in FIG. 3, the terminal portion 32D is a portion of the lead 3D that protrudes from the sealing member 7. The terminal portion 32D protrudes from the mounting portion 31D in the y direction on the opposite side from the leads 4A to 4H, 4J to 4N, and 4P to 4R. The terminal portion 32D is used to electrically connect the semiconductor device A1 to an external circuit. In the illustrated example, the terminal portion 32D is bent toward the z1 side in the z direction to form an L-shape.
 パッド部33Dおよび連結部34Dは、封止部材7に覆われている。パッド部33Dおよび連結部34Dは、図3に示すように、搭載部31Dと端子部32Dとの間に介在している。パッド部33Dは、パッド部33A,33B,33Cと同様に搭載部31Dに対してz方向のz1側に位置する。パッド部33Dは、端子部32Dに繋がっている。パッド部33Dには、ワイヤ6Cが接合されている。連結部34Dは、搭載部31Dとパッド部33Dとに繋がっており、連結部34A,34B,34Cと同様に、y方向に対して傾いている。 The pad portion 33D and the connecting portion 34D are covered with the sealing member 7. As shown in FIG. 3, the pad portion 33D and the connecting portion 34D are interposed between the mounting portion 31D and the terminal portion 32D. The pad portion 33D is located on the z1 side in the z direction with respect to the mounting portion 31D, similarly to the pad portions 33A, 33B, and 33C. The pad portion 33D is connected to the terminal portion 32D. A wire 6C is bonded to the pad portion 33D. The connecting portion 34D is connected to the mounting portion 31D and the pad portion 33D, and is inclined with respect to the y direction like the connecting portions 34A, 34B, and 34C.
 図2および図3に示すように、リード3E、リード3Fおよびリード3Gは、リード3Dに対してx方向のx2側に配置されている。リード3E、リード3Fおよびリード3Gは、x方向に並んでいる。リード3E、リード3Fおよびリード3Gはそれぞれ、複数の第1スイッチ部1および複数の第2スイッチ部2のいずれも搭載されない。 As shown in FIGS. 2 and 3, the leads 3E, 3F, and 3G are arranged on the x2 side in the x direction with respect to the leads 3D. Leads 3E, 3F, and 3G are lined up in the x direction. Each of the leads 3E, 3F, and 3G is not mounted with any of the plurality of first switch sections 1 and the plurality of second switch sections 2.
 リード3Eは、後に詳述される構成により、スイッチング素子11Aの電極112(エミッタ)、スイッチング素子12Aの電極122(ソース)および保護素子13Aの電極131(アノード)にそれぞれ導通する。リード3Eは、図3などに示すように、端子部32Eおよびパッド部33Eを含む。端子部32Eとパッド部33Eとは繋がっている。 The lead 3E is electrically connected to the electrode 112 (emitter) of the switching element 11A, the electrode 122 (source) of the switching element 12A, and the electrode 131 (anode) of the protection element 13A, according to a configuration that will be described in detail later. The lead 3E includes a terminal portion 32E and a pad portion 33E, as shown in FIG. 3 and the like. The terminal portion 32E and the pad portion 33E are connected.
 端子部32Eは、リード3Eのうち封止部材7から突出した部位である。端子部32Eは、図3に示すように、y方向においてパッド部33Eに対してリード4A~4H,4J~4N,4P~4Rとは反対側に突出している。端子部32Eは、半導体装置A1を外部の回路に電気的に接続するために用いられる。図示された例においては、端子部32Eは、z方向のz1側に折り曲げられて、L字状をなす。 The terminal portion 32E is a portion of the lead 3E that protrudes from the sealing member 7. As shown in FIG. 3, the terminal portion 32E protrudes from the pad portion 33E in the y direction on the opposite side from the leads 4A to 4H, 4J to 4N, and 4P to 4R. The terminal portion 32E is used to electrically connect the semiconductor device A1 to an external circuit. In the illustrated example, the terminal portion 32E is bent toward the z1 side in the z direction to form an L-shape.
 パッド部33Eは、封止部材7に覆われており、図示された例においては、平面視矩形状である。パッド部33Eは、図3に示すように、平面視において支持基板51に重ならない。パッド部33Eは、z方向において、各パッド部33A~33Dと同じ(あるいは略同じ)位置(同じ(あるいは略同じ)高さ)に配置される。パッド部33Eは、図3に示すように、ワイヤ6Dが接合されており、ワイヤ6Dを介して、スイッチング素子11Aの電極112(エミッタ)、スイッチング素子12Aの電極122(ソース)および保護素子13Aの電極131(アノード)にそれぞれ導通する。 The pad portion 33E is covered with the sealing member 7, and has a rectangular shape in plan view in the illustrated example. As shown in FIG. 3, the pad portion 33E does not overlap the support substrate 51 in plan view. The pad portion 33E is arranged at the same (or approximately the same) position (at the same (or approximately the same) height) as each of the pad portions 33A to 33D in the z direction. As shown in FIG. 3, the pad portion 33E is connected to a wire 6D, and is connected to the electrode 112 (emitter) of the switching element 11A, the electrode 122 (source) of the switching element 12A, and the protection element 13A via the wire 6D. The electrodes 131 (anodes) are electrically connected to each other.
 リード3Fは、後に詳述される構成により、スイッチング素子11Bの電極112(エミッタ)、スイッチング素子12Bの電極122(ソース)および保護素子13Bの電極131(アノード)にそれぞれ導通する。リード3Fは、図3などに示すように、端子部32Fおよびパッド部33Fを含む。端子部32Fとパッド部33Fとは繋がっている。 The lead 3F is electrically connected to the electrode 112 (emitter) of the switching element 11B, the electrode 122 (source) of the switching element 12B, and the electrode 131 (anode) of the protection element 13B, respectively, according to a configuration described in detail later. The lead 3F includes a terminal portion 32F and a pad portion 33F, as shown in FIG. 3 and the like. The terminal portion 32F and pad portion 33F are connected.
 端子部32Fは、リード3Fのうち封止部材7から突出した部位である。端子部32Fは、図3に示すように、y方向においてパッド部33Fに対してリード4A~4H,4J~4N,4P~4Rとは反対側に突出している。端子部32Fは、半導体装置A1を外部の回路に電気的に接続するために用いられる。図示された例においては、端子部32Fは、z方向のz1側に折り曲げられて、L字状をなす。 The terminal portion 32F is a portion of the lead 3F that protrudes from the sealing member 7. As shown in FIG. 3, the terminal portion 32F protrudes in the y direction with respect to the pad portion 33F on the opposite side from the leads 4A to 4H, 4J to 4N, and 4P to 4R. The terminal portion 32F is used to electrically connect the semiconductor device A1 to an external circuit. In the illustrated example, the terminal portion 32F is bent toward the z1 side in the z direction to form an L-shape.
 パッド部33Fは、封止部材7に覆われており、図示された例においては、平面視矩形状である。パッド部33Fは、図3に示すように、平面視において支持基板51に重ならない。パッド部33Fは、z方向において、各パッド部33A~33Eと同じ(あるいは略同じ)位置(同じ(あるいは略同じ)高さ)に配置される。パッド部33Fは、図3に示すように、ワイヤ6Eが接合されており、ワイヤ6Eを介して、スイッチング素子11Bの電極112(エミッタ)、スイッチング素子12Bの電極122(ソース)および保護素子13Bの電極131(アノード)にそれぞれ導通する。 The pad portion 33F is covered with the sealing member 7, and has a rectangular shape in plan view in the illustrated example. As shown in FIG. 3, the pad portion 33F does not overlap the support substrate 51 in plan view. The pad section 33F is arranged at the same (or approximately the same) position (at the same (or approximately the same) height) as each of the pad sections 33A to 33E in the z direction. As shown in FIG. 3, the pad portion 33F is connected to a wire 6E, and is connected to the electrode 112 (emitter) of the switching element 11B, the electrode 122 (source) of the switching element 12B, and the protection element 13B via the wire 6E. The electrodes 131 (anodes) are electrically connected to each other.
 リード3Gは、後に詳述される構成により、スイッチング素子11Cの電極112(エミッタ)、スイッチング素子12Cの電極122(ソース)および保護素子13Cの電極131(アノード)にそれぞれ導通する。リード3Gは、図3などに示すように、端子部32Gおよびパッド部33Gを含む。端子部32Gとパッド部33Gとは繋がっている。 The lead 3G is electrically connected to the electrode 112 (emitter) of the switching element 11C, the electrode 122 (source) of the switching element 12C, and the electrode 131 (anode) of the protection element 13C, according to a configuration that will be described in detail later. The lead 3G includes a terminal portion 32G and a pad portion 33G, as shown in FIG. 3 and the like. The terminal portion 32G and the pad portion 33G are connected.
 端子部32Gは、リード3Gのうち封止部材7から突出した部位である。端子部32Gは、図3に示すように、y方向においてパッド部33Gに対してリード4A~4H,4J~4N,4P~4Rとは反対側に突出している。端子部32Gは、半導体装置A1を外部の回路に電気的に接続するために用いられる。図示された例においては、端子部32Gは、z方向のz1側に折り曲げられて、L字状をなす。 The terminal portion 32G is a portion of the lead 3G that protrudes from the sealing member 7. As shown in FIG. 3, the terminal portion 32G protrudes in the y direction with respect to the pad portion 33G on the opposite side from the leads 4A to 4H, 4J to 4N, and 4P to 4R. The terminal portion 32G is used to electrically connect the semiconductor device A1 to an external circuit. In the illustrated example, the terminal portion 32G is bent toward the z1 side in the z direction to form an L-shape.
 パッド部33Gは、封止部材7に覆われている。パッド部33Gは、図3に示すように、平面視において支持基板51に重ならない。パッド部33Gは、z方向において、各パッド部33A~33Fと同じ(あるいは略同じ)位置(同じ(あるいは略同じ)高さ)に配置される。パッド部33Gは、図3に示すように、ワイヤ6Fが接合されており、ワイヤ6Fを介して、スイッチング素子11Cの電極112(エミッタ)、スイッチング素子12Cの電極122(ソース)および保護素子13Cの電極131(アノード)にそれぞれ導通する。 The pad portion 33G is covered with the sealing member 7. As shown in FIG. 3, the pad portion 33G does not overlap the support substrate 51 in plan view. The pad portion 33G is arranged at the same (or approximately the same) position (at the same (or approximately the same) height) as each of the pad portions 33A to 33F in the z direction. As shown in FIG. 3, the pad portion 33G is connected to a wire 6F, which connects the electrode 112 (emitter) of the switching element 11C, the electrode 122 (source) of the switching element 12C, and the protection element 13C via the wire 6F. The electrodes 131 (anodes) are electrically connected to each other.
 リード3Zは、リード3Aに対してx方向のx1側に配置されている。リード3Zは、複数の第1スイッチ部1および複数の第2スイッチ部2のいずれにも導通しない。リード3Zは、図3などに示すように、端子部32Zおよびパッド部33Zを含む。端子部32Zとパッド部33Zとは繋がっている。 The lead 3Z is arranged on the x1 side in the x direction with respect to the lead 3A. The lead 3Z is not electrically connected to any of the plurality of first switch sections 1 and the plurality of second switch sections 2. The lead 3Z includes a terminal portion 32Z and a pad portion 33Z, as shown in FIG. 3 and the like. The terminal portion 32Z and the pad portion 33Z are connected.
 端子部32Zは、リード3Zのうち封止部材7から突出した部位である。端子部32Zは、図3に示すように、y方向においてパッド部33Zに対してリード4A~4H,4J~4N,4P~4Rとは反対側に突出している。図示された例においては、端子部32Zは、z方向のz1側に折り曲げられて、L字状をなす。 The terminal portion 32Z is a portion of the lead 3Z that protrudes from the sealing member 7. As shown in FIG. 3, the terminal portion 32Z protrudes in the y direction with respect to the pad portion 33Z on the opposite side from the leads 4A to 4H, 4J to 4N, and 4P to 4R. In the illustrated example, the terminal portion 32Z is bent toward the z1 side in the z direction to form an L-shape.
 パッド部33Zは、封止部材7に覆われている。パッド部33Zは、図3に示すように、平面視において支持基板51に重ならない。パッド部33Zは、z方向において、各パッド部33A~33Gと同じ(あるいは略同じ)位置(同じ(あるいは略同じ)高さ)に配置される。 The pad portion 33Z is covered with the sealing member 7. As shown in FIG. 3, the pad portion 33Z does not overlap the support substrate 51 in plan view. The pad section 33Z is arranged at the same (or approximately the same) position (at the same (or approximately the same) height) as each of the pad sections 33A to 33G in the z direction.
 図3に示すように、リード4A、リード4Bおよびリード4Cは、リード4Dに対して、x方向のx1側に配置されている。以下においては、リード4Aについて詳述するが、リード4Bおよびリード4Cも同様の構成部位を含む。この場合、リード4Aの各構成部位の「A」を「B」または「C」に変えたものが、リード4Bおよびリード4Cの各構成部位となる。 As shown in FIG. 3, the leads 4A, 4B, and 4C are arranged on the x1 side in the x direction with respect to the lead 4D. Although lead 4A will be described in detail below, lead 4B and lead 4C also include similar components. In this case, the constituent parts of the lead 4B and the lead 4C are obtained by changing "A" to "B" or "C" in each constituent part of the lead 4A.
 リード4Aは、図3などに示すように、端子部42Aおよびパッド部43Aを含む。上述の通り、詳述は省略するが、図3などに示すように、リード4Bは、端子部42Bおよびパッド部43Bを含み、リード4Cは、端子部42Cおよびパッド部43Cを含む。 The lead 4A includes a terminal portion 42A and a pad portion 43A, as shown in FIG. 3 and the like. As described above, although detailed description is omitted, as shown in FIG. 3 and the like, the lead 4B includes a terminal portion 42B and a pad portion 43B, and the lead 4C includes a terminal portion 42C and a pad portion 43C.
 端子部42Aは、リード4Aのうち封止部材7から突出した部位である。端子部42Aは、図3に示すように、y方向においてパッド部43Aに対してリード3A~3G,3Zとは反対側に突出している。端子部42Aは、半導体装置A1を外部の回路に電気的に接続するために用いられる。図示された例においては、端子部42Aは、z方向のz1側に折り曲げられて、L字状をなす。 The terminal portion 42A is a portion of the lead 4A that protrudes from the sealing member 7. As shown in FIG. 3, the terminal portion 42A protrudes in the y direction with respect to the pad portion 43A on the opposite side from the leads 3A to 3G and 3Z. The terminal portion 42A is used to electrically connect the semiconductor device A1 to an external circuit. In the illustrated example, the terminal portion 42A is bent toward the z1 side in the z direction to form an L-shape.
 パッド部43Aは、封止部材7に覆われている。パッド部43Aには、図3に示すように、電子部品89Uおよび複数のワイヤ6Lのいずれかが接合される。なお、パッド部43Bには、電子部品89Uの代わりに、電子部品89Vが接合され、パッド部43Cには、電子部品89Uの代わりに、電子部品89Wが接合されている。パッド部43Aの形状は、図示された例に限定されない。 The pad portion 43A is covered with the sealing member 7. As shown in FIG. 3, the electronic component 89U and one of the plurality of wires 6L are bonded to the pad portion 43A. Note that an electronic component 89V is bonded to the pad portion 43B instead of the electronic component 89U, and an electronic component 89W is bonded to the pad portion 43C instead of the electronic component 89U. The shape of the pad portion 43A is not limited to the illustrated example.
 図3に示すように、複数のリード4D~4Gは、リード4Cに対してx方向のx2側に配置されている。以下においては、リード4Dについて詳述するが、リード4E,4F,4Gも同様の構成部位を含む。この場合、リード4Dの各構成部位の「D」を「E」、「F」または「G」に変えたものが、リード4E,4F,4Gの各構成部位となる。 As shown in FIG. 3, the plurality of leads 4D to 4G are arranged on the x2 side in the x direction with respect to the lead 4C. Although lead 4D will be described in detail below, leads 4E, 4F, and 4G also include similar components. In this case, the constituent parts of the leads 4E, 4F, and 4G are obtained by changing "D" to "E", "F", or "G" in each constituent part of the lead 4D.
 リード4Dは、図3などに示すように、端子部42D、パッド部43Dおよび連結部44Dを含む。上述の通り、詳述は省略するが、図3などに示すように、リード4Eは、端子部42E、パッド部43Eおよび連結部44Eを含み、リード4Fは、端子部42F、パッド部43Fおよび連結部44Fを含み、リード4Gは、端子部42G、パッド部43Gおよび連結部44Gを含む。 As shown in FIG. 3, the lead 4D includes a terminal portion 42D, a pad portion 43D, and a connecting portion 44D. As mentioned above, as shown in FIG. 3 etc., the lead 4E includes a terminal portion 42E, a pad portion 43E, and a connecting portion 44E, and the lead 4F includes a terminal portion 42F, a pad portion 43F, and a connecting portion 44E. The lead 4G includes a terminal portion 42G, a pad portion 43G, and a connecting portion 44G.
 端子部42Dは、リード4Dのうち封止部材7から突出した部位である。端子部42Dは、図3に示すように、y方向においてパッド部43Dに対してリード3A~3G,3Zとは反対側に突出している。端子部42Dは、半導体装置A1を外部の回路に電気的に接続するために用いられる。図示された例においては、端子部42Dは、z方向のz1側に折り曲げられて、L字状をなす。 The terminal portion 42D is a portion of the lead 4D that protrudes from the sealing member 7. As shown in FIG. 3, the terminal portion 42D protrudes in the y direction with respect to the pad portion 43D on the opposite side to the leads 3A to 3G and 3Z. The terminal portion 42D is used to electrically connect the semiconductor device A1 to an external circuit. In the illustrated example, the terminal portion 42D is bent toward the z1 side in the z direction to form an L-shape.
 パッド部43Dは、封止部材7に覆われている。パッド部43Dは、図3に示すように、複数のワイヤ6Lのいずれかが接合されており、当該ワイヤ6Lを介して、第2制御素子8Bの電極82に導通する。 The pad portion 43D is covered with the sealing member 7. As shown in FIG. 3, the pad portion 43D is connected to one of the plurality of wires 6L, and is electrically connected to the electrode 82 of the second control element 8B via the wire 6L.
 連結部44Dは、封止部材7に覆われている。連結部44Dは、図3に示すように、端子部42Dとパッド部43Dとに繋がり、これらの間に介在している。 The connecting portion 44D is covered with the sealing member 7. As shown in FIG. 3, the connecting portion 44D is connected to the terminal portion 42D and the pad portion 43D and is interposed between them.
 リード4Hは、第2制御素子8Bが搭載される。リード4Hは、図3などに示すように、搭載部41H、端子部42H、パッド部43H、複数の連結部44Hおよび突出部45Hを含む。 The second control element 8B is mounted on the lead 4H. As shown in FIG. 3, the lead 4H includes a mounting portion 41H, a terminal portion 42H, a pad portion 43H, a plurality of connecting portions 44H, and a protruding portion 45H.
 搭載部41Hは、封止部材7に覆われている。搭載部41Hには、図3および図13に示すように、第2制御素子8Bが搭載されている。第2制御素子8Bは、上述の通り、接合材85により、搭載部41Hに固着されている。搭載部41Hは、図13に示すように、z方向において支持基板51から離間している。 The mounting portion 41H is covered with the sealing member 7. As shown in FIGS. 3 and 13, the second control element 8B is mounted on the mounting portion 41H. The second control element 8B is fixed to the mounting portion 41H by the bonding material 85, as described above. As shown in FIG. 13, the mounting portion 41H is spaced apart from the support substrate 51 in the z direction.
 端子部42Hは、リード4Hのうち封止部材7から突出した部位である。端子部42Hは、図3に示すように、y方向において、搭載部41Hよりもリード3A~3G,3Zとは反対側に突出している。端子部42Hは、半導体装置A1を外部の回路の電気的に接続するために用いられる。図示された例において、端子部42Hは、z方向に折り曲げられて、L字状をなす。 The terminal portion 42H is a portion of the lead 4H that protrudes from the sealing member 7. As shown in FIG. 3, the terminal portion 42H protrudes from the mounting portion 41H to the side opposite to the leads 3A to 3G and 3Z in the y direction. The terminal portion 42H is used to electrically connect the semiconductor device A1 to an external circuit. In the illustrated example, the terminal portion 42H is bent in the z direction to form an L-shape.
 パッド部43Hは、封止部材7に覆われている。パッド部43Hは、搭載部41Hに隣接している。パッド部43Hには、図3に示すように、複数のワイヤ6Lのいずれかが接合されている。 The pad portion 43H is covered with the sealing member 7. The pad portion 43H is adjacent to the mounting portion 41H. As shown in FIG. 3, one of the plurality of wires 6L is bonded to the pad portion 43H.
 複数の連結部44Hはそれぞれ、封止部材7に覆われている。複数の連結部44Hには、端子部42Hとパッド部43Hとの間に介在しこれらに繋がるもの、および、搭載部41Hと突出部45Hとの間に介在しこれらに繋がるものがある。 Each of the plurality of connecting portions 44H is covered with a sealing member 7. Some of the plurality of connecting parts 44H are interposed between and connected to the terminal part 42H and the pad part 43H, and others are interposed between and connected to the mounting part 41H and the protruding part 45H.
 突出部45Hは、図3に示すように、搭載部41Hに繋がる連結部44Hからy方向のy1側に延びており、封止部材7から突出している。 As shown in FIG. 3, the protruding portion 45H extends from the connecting portion 44H connected to the mounting portion 41H toward the y1 side in the y direction, and protrudes from the sealing member 7.
 リード4Rは、第1制御素子8Aが搭載される。リード4Rは、図3などに示すように、搭載部41R、端子部42R、パッド部43Rおよび連結部44Rを含む。 The first control element 8A is mounted on the lead 4R. The lead 4R includes a mounting portion 41R, a terminal portion 42R, a pad portion 43R, and a connecting portion 44R, as shown in FIG. 3 and the like.
 搭載部41Rは、封止部材7に覆われている。搭載部41Rには、図3および図12に示すように、第1制御素子8Aが搭載されている。第1制御素子8Aは、上述の通り、接合材85により、搭載部41Rに固着されている。搭載部41Rは、図12に示すように、搭載部41Hと同様に、z方向において支持基板51から離間している。 The mounting portion 41R is covered with a sealing member 7. As shown in FIGS. 3 and 12, the first control element 8A is mounted on the mounting portion 41R. As described above, the first control element 8A is fixed to the mounting portion 41R with the bonding material 85. As shown in FIG. 12, the mounting portion 41R is spaced apart from the support substrate 51 in the z direction, similarly to the mounting portion 41H.
 端子部42Rは、リード4Rのうち封止部材7から突出した部位である。端子部42Rは、図3に示すように、y方向において、搭載部41Rよりもリード3A~3G,3Zとは反対側に突出している。端子部42Rは、半導体装置A1を外部の回路の電気的に接続するために用いられる。図示された例において、端子部42Rは、z方向に折り曲げられて、L字状をなす。 The terminal portion 42R is a portion of the lead 4R that protrudes from the sealing member 7. As shown in FIG. 3, the terminal portion 42R protrudes from the mounting portion 41R to the side opposite to the leads 3A to 3G and 3Z in the y direction. The terminal portion 42R is used to electrically connect the semiconductor device A1 to an external circuit. In the illustrated example, the terminal portion 42R is bent in the z direction to form an L-shape.
 パッド部43Rは、封止部材7に覆われている。パッド部43Rは、搭載部41Rに隣接している。パッド部43Rには、図3に示すように、複数のワイヤ6Lのいずれかが接合されている。 The pad portion 43R is covered with the sealing member 7. The pad portion 43R is adjacent to the mounting portion 41R. As shown in FIG. 3, one of the plurality of wires 6L is bonded to the pad portion 43R.
 連結部44Rはそれぞれ、封止部材7に覆われている。連結部44Rは、端子部42Rとパッド部43Rとの間に介在し、これらに繋がる。 The connecting portions 44R are each covered with a sealing member 7. The connecting portion 44R is interposed between the terminal portion 42R and the pad portion 43R and connected thereto.
 図3に示すように、複数のリード4J~4N,4P,4Qは、リード4Hに対してx方向のx2側に配置されている。以下においては、リード4Qについて詳述するが、リード4J,4K,4L,4M,4N,4Pも同様の構成部位を含む。この場合、リード4Qの各構成部位の「Q」を「J」、「K」、「L」、「M」、「N」または「P」に変えたものが、リード4J,4K,4L,4M,4N,4Pの各構成部位となる。 As shown in FIG. 3, the plurality of leads 4J to 4N, 4P, and 4Q are arranged on the x2 side in the x direction with respect to the lead 4H. Although lead 4Q will be described in detail below, leads 4J, 4K, 4L, 4M, 4N, and 4P also include similar components. In this case, leads 4J, 4K, 4L, These are the constituent parts of 4M, 4N, and 4P.
 リード4Qは、図3に示すように、端子部42Q、パッド部43Qおよび連結部44Qを含む。上述の通り、詳述は省略するが、図3に示すように、リード4Jは、端子部42J、パッド部43Jおよび連結部44Jを含み、リード4Kは、端子部42K、パッド部43Kおよび連結部44Kを含み、リード4Lは、端子部42L、パッド部43Lおよび連結部44Lを含み、リード4Mは、端子部42M、パッド部43Mおよび連結部44Mを含み、リード4Nは、端子部42N、パッド部43Nおよび連結部44Nを含み、リード4Pは、端子部42P、パッド部43Pおよび連結部44Pを含む。 As shown in FIG. 3, the lead 4Q includes a terminal portion 42Q, a pad portion 43Q, and a connecting portion 44Q. As described above, although detailed description is omitted, as shown in FIG. 3, the lead 4J includes a terminal portion 42J, a pad portion 43J, and a connecting portion 44J, and the lead 4K includes a terminal portion 42K, a pad portion 43K, and a connecting portion. 44K, the lead 4L includes a terminal portion 42L, a pad portion 43L, and a connecting portion 44L, the lead 4M includes a terminal portion 42M, a pad portion 43M, and a connecting portion 44M, and the lead 4N includes a terminal portion 42N, a pad portion 43L, and a connecting portion 44M. 43N and a connecting portion 44N, and the lead 4P includes a terminal portion 42P, a pad portion 43P, and a connecting portion 44P.
 端子部42Qは、リード4Qのうち封止部材7から突出した部位である。端子部42Qは、図3に示すように、y方向において、パッド部43Qに対してリード3A~3G,3Zとは反対側に突出している。端子部42Qは、半導体装置A1を外部の回路に電気的に接続するために用いられる。図示された例においては、端子部42Qは、z方向に折り曲げられて、L字状をなす。複数のリード4Q,4J~4Nの端子部42Q,42J~42Nはそれぞれ、x方向において、リード4Hの端子部42Hとリード4Rの端子部42Rとの間に配置されており、リード4Pの端子部42Pは、端子部42Rに対してx方向のx2側に位置する。 The terminal portion 42Q is a portion of the lead 4Q that protrudes from the sealing member 7. As shown in FIG. 3, the terminal portion 42Q protrudes in the y direction from the pad portion 43Q on the side opposite to the leads 3A to 3G and 3Z. The terminal portion 42Q is used to electrically connect the semiconductor device A1 to an external circuit. In the illustrated example, the terminal portion 42Q is bent in the z direction to form an L-shape. The terminal portions 42Q, 42J to 42N of the plurality of leads 4Q, 4J to 4N are respectively arranged between the terminal portion 42H of the lead 4H and the terminal portion 42R of the lead 4R in the x direction, and are arranged between the terminal portion 42H of the lead 4H and the terminal portion 42R of the lead 4R. 42P is located on the x2 side in the x direction with respect to the terminal portion 42R.
 パッド部43Qは、封止部材7に覆われている。パッド部43Qには、図3に示すように、複数のワイヤ6Lのいずれかが接合されており、当該ワイヤ6Lを介して、第1制御素子8Aの電極82に導通する。ただし、図3に示す例では、パッド部43Pには、複数のワイヤ6Lのいずれも接合されていない。 The pad portion 43Q is covered with the sealing member 7. As shown in FIG. 3, one of the plurality of wires 6L is bonded to the pad portion 43Q, and the pad portion 43Q is electrically connected to the electrode 82 of the first control element 8A via the wire 6L. However, in the example shown in FIG. 3, none of the plurality of wires 6L is bonded to the pad portion 43P.
 連結部44Qは、封止部材7に覆われている。連結部44Qは、図3に示すように、端子部42Qとパッド部43Qとに繋がり、これらの間に介在している。 The connecting portion 44Q is covered with the sealing member 7. As shown in FIG. 3, the connecting portion 44Q is connected to the terminal portion 42Q and the pad portion 43Q, and is interposed between them.
 図示された例において、複数の端子部42A~42Cは、第1ピッチ幅d1(図3参照)でx方向に並んで配置されている。また、複数の端子部42D~42H,42J~42N,42P~42Rは、第2ピッチ幅d2(図3参照)でx方向に並んで配置されている。第1ピッチ幅d1は、第2ピッチ幅d2よりも大きい。端子部42Cと端子部42Dとのx方向に沿う距離は、第1ピッチ幅d1である。 In the illustrated example, the plurality of terminal portions 42A to 42C are arranged in line in the x direction with a first pitch width d1 (see FIG. 3). Further, the plurality of terminal portions 42D to 42H, 42J to 42N, and 42P to 42R are arranged in line in the x direction with a second pitch width d2 (see FIG. 3). The first pitch width d1 is larger than the second pitch width d2. The distance between the terminal portion 42C and the terminal portion 42D along the x direction is the first pitch width d1.
 支持基板51は、図10~図13に示すように、複数のリード3A~3Dを支持しており、たとえばこれらを介して複数の第1スイッチ部1および複数の第2スイッチ部2のそれぞれからの熱を半導体装置A1外に伝達するために設けられている。支持基板51は、板状であって、平面視矩形状である。支持基板51は、絶縁性材料からなり、当該絶縁性材料としては、たとえばアルミナ(Al23)、窒化ケイ素(SiN)、窒化アルミ(AlN)、ジルコニア入りアルミナなどのセラミックスが採用される。なお、支持基板51は、セラミックスからなる構成が強度、熱伝達率および絶縁性の観点から好ましいが、これに限定されず、種々の材料(たとえばエポキシ樹脂やシリコンなど)が採用される。また、支持基板51は、封止部材7よりも熱伝導率が高い材料が好ましい。 As shown in FIGS. 10 to 13, the support substrate 51 supports a plurality of leads 3A to 3D, and for example, leads from each of the plurality of first switch sections 1 and the plurality of second switch sections 2 via these. The semiconductor device A1 is provided for transmitting heat to the outside of the semiconductor device A1. The support substrate 51 is plate-shaped and rectangular in plan view. The support substrate 51 is made of an insulating material, and examples of the insulating material include ceramics such as alumina (Al 2 O 3 ), silicon nitride (SiN), aluminum nitride (AlN), and alumina containing zirconia. Note that the support substrate 51 is preferably made of ceramics from the viewpoint of strength, heat transfer rate, and insulation, but is not limited thereto, and various materials (eg, epoxy resin, silicon, etc.) may be used. Further, the support substrate 51 is preferably made of a material having higher thermal conductivity than the sealing member 7.
 支持基板51は、図3および図10~図13に示すように、第1面511、第2面512、第3面513、第4面514、第5面515および第6面516を有する。図10~図13に示すように、第1面511および第2面512は、z方向に離間する。第1面511はz方向上方(z方向のz1側)を向き、第2面512はz方向下方(z方向のz2側)を向く。図10~図13に示すように、第1面511には、複数の搭載部311A,312A,313A,31B,31C,31Dが、複数の接合材39を介してそれぞれ接合されている。第2面512は、図10~図13に示すように、封止部材7から露出している。第3面513、第4面514、第5面515および第6面516は、z方向において第1面511と第2面512との間に位置し、これらに繋がる。図3、図10および図11に示すように、第3面513および第4面514は、x方向に離間する。第3面513はx方向のx2側を向き、第4面514はx方向のx1側を向く。図3、図12および図13に示すように、第5面515および第6面516はy方向に離間する。第5面515はy方向のy2側を向き、第6面516はy方向のy1側を向く。図示された例において、第1面511、第2面512、第3面513、第4面514、第5面515および第6面516はそれぞれ、平坦である。 The support substrate 51 has a first surface 511, a second surface 512, a third surface 513, a fourth surface 514, a fifth surface 515, and a sixth surface 516, as shown in FIG. 3 and FIGS. 10 to 13. As shown in FIGS. 10 to 13, the first surface 511 and the second surface 512 are spaced apart in the z direction. The first surface 511 faces upward in the z direction (z1 side in the z direction), and the second surface 512 faces downward in the z direction (z2 side in the z direction). As shown in FIGS. 10 to 13, a plurality of mounting portions 311A, 312A, 313A, 31B, 31C, and 31D are bonded to the first surface 511 via a plurality of bonding materials 39, respectively. The second surface 512 is exposed from the sealing member 7, as shown in FIGS. 10 to 13. The third surface 513, the fourth surface 514, the fifth surface 515, and the sixth surface 516 are located between the first surface 511 and the second surface 512 in the z direction and are connected to them. As shown in FIGS. 3, 10, and 11, the third surface 513 and the fourth surface 514 are spaced apart in the x direction. The third surface 513 faces the x2 side in the x direction, and the fourth surface 514 faces the x1 side in the x direction. As shown in FIGS. 3, 12, and 13, the fifth surface 515 and the sixth surface 516 are spaced apart in the y direction. The fifth surface 515 faces the y2 side in the y direction, and the sixth surface 516 faces the y1 side in the y direction. In the illustrated example, the first surface 511, the second surface 512, the third surface 513, the fourth surface 514, the fifth surface 515, and the sixth surface 516 are each flat.
 複数の接続部材6は、互いに離間する2つの部位を導通させる。図3~図7から理解されるように、複数の接続部材6は、複数のワイヤ6A~6F,6H,6J~6L,61G,61Q,62G,62Qを含む。各ワイヤ6A~6F,6H,6J~6L,61G,61Q,62G,62Q(各接続部材6)は、ボンディングワイヤである。なお、各接続部材6として、各6A~6F,6H,6J~6L,61G,61Q,62G,62Qの代わりに、導電性の板状部材を用いてもよいし、ボンディングリボンを用いてもよいし、メッキ線を用いてもよい。 The plurality of connection members 6 connect two parts separated from each other. As understood from FIGS. 3 to 7, the plurality of connection members 6 include a plurality of wires 6A to 6F, 6H, 6J to 6L, 61G, 61Q, 62G, and 62Q. Each of the wires 6A to 6F, 6H, 6J to 6L, 61G, 61Q, 62G, and 62Q (each connection member 6) is a bonding wire. In addition, as each connection member 6, a conductive plate member may be used instead of each 6A to 6F, 6H, 6J to 6L, 61G, 61Q, 62G, and 62Q, or a bonding ribbon may be used. However, plated wire may also be used.
 ワイヤ6Aは、図6に示すように、スイッチング素子21Aの電極212(エミッタ)と、スイッチング素子22Aの電極222(ソース)と、保護素子23Aの電極231(アノード)とに接合されている。これにより、スイッチング素子21Aの電極212と、スイッチング素子22Aの電極222と、保護素子23Aの電極231とが互いに導通する。また、ワイヤ6Aは、図3に示すように、リード3Bのパッド部33Bに接合されている。リード3Bが第1アーム1A(スイッチング素子11Aの電極111、スイッチング素子12Aの電極121および保護素子13Aの電極132)に導通することから、スイッチング素子21Aの電極212、スイッチング素子22Aの電極222および保護素子23Aの電極231と、スイッチング素子11Aの電極111、スイッチング素子12Aの電極121および保護素子13Aの電極132とが、リード3Bおよびワイヤ6Aを介して、電気的に接続される。 As shown in FIG. 6, the wire 6A is connected to the electrode 212 (emitter) of the switching element 21A, the electrode 222 (source) of the switching element 22A, and the electrode 231 (anode) of the protection element 23A. Thereby, the electrode 212 of the switching element 21A, the electrode 222 of the switching element 22A, and the electrode 231 of the protection element 23A are electrically connected to each other. Moreover, the wire 6A is joined to the pad portion 33B of the lead 3B, as shown in FIG. Since the lead 3B is electrically connected to the first arm 1A (the electrode 111 of the switching element 11A, the electrode 121 of the switching element 12A, and the electrode 132 of the protection element 13A), the electrode 212 of the switching element 21A, the electrode 222 of the switching element 22A, and the protection Electrode 231 of element 23A, electrode 111 of switching element 11A, electrode 121 of switching element 12A, and electrode 132 of protection element 13A are electrically connected via lead 3B and wire 6A.
 ワイヤ6Bは、図6に示すように、スイッチング素子21Bの電極212(エミッタ)と、スイッチング素子22Bの電極222(ソース)と、保護素子23Bの電極231(アノード)とに接合されている。これにより、スイッチング素子21Bの電極212と、スイッチング素子22Bの電極222と、保護素子23Bの電極231とが互いに導通する。また、ワイヤ6Bは、図3に示すように、リード3Cのパッド部33Cに接合されている。リード3Cが第2アーム1B(スイッチング素子11Bの電極111、スイッチング素子12Bの電極121および保護素子13Bの電極132)に導通することから、スイッチング素子21Bの電極212、スイッチング素子22Bの電極222および保護素子23Bの電極231と、スイッチング素子11Bの電極111、スイッチング素子12Bの電極121および保護素子13Bの電極132とが、リード3Cおよびワイヤ6Bを介して、電気的に接続される。 As shown in FIG. 6, the wire 6B is connected to the electrode 212 (emitter) of the switching element 21B, the electrode 222 (source) of the switching element 22B, and the electrode 231 (anode) of the protection element 23B. Thereby, the electrode 212 of the switching element 21B, the electrode 222 of the switching element 22B, and the electrode 231 of the protection element 23B are electrically connected to each other. Moreover, the wire 6B is joined to the pad portion 33C of the lead 3C, as shown in FIG. Since the lead 3C is electrically connected to the second arm 1B (the electrode 111 of the switching element 11B, the electrode 121 of the switching element 12B, and the electrode 132 of the protection element 13B), the electrode 212 of the switching element 21B, the electrode 222 of the switching element 22B, and the protection Electrode 231 of element 23B, electrode 111 of switching element 11B, electrode 121 of switching element 12B, and electrode 132 of protection element 13B are electrically connected via lead 3C and wire 6B.
 ワイヤ6Cは、図6に示すように、スイッチング素子21Cの電極212(エミッタ)と、スイッチング素子22Cの電極222(ソース)と、保護素子23Cの電極231(アノード)とに接合されている。これにより、スイッチング素子21Cの電極212と、スイッチング素子22Cの電極222と、保護素子23Cの電極231とが互いに導通する。また、ワイヤ6Cは、図3に示すように、リード3Dのパッド部33Dに接合されている。リード3Dが第3アーム1C(スイッチング素子11Cの電極111、スイッチング素子12Cの電極121および保護素子13Cの電極132)に導通することから、スイッチング素子21Cの電極212、スイッチング素子22Cの電極222および保護素子23Cの電極231と、スイッチング素子11Cの電極111、スイッチング素子12Cの電極121および保護素子13Cの電極132とが、リード3Dおよびワイヤ6Cを介して、電気的に接続される。 As shown in FIG. 6, the wire 6C is connected to the electrode 212 (emitter) of the switching element 21C, the electrode 222 (source) of the switching element 22C, and the electrode 231 (anode) of the protection element 23C. Thereby, the electrode 212 of the switching element 21C, the electrode 222 of the switching element 22C, and the electrode 231 of the protection element 23C are electrically connected to each other. Moreover, the wire 6C is joined to the pad portion 33D of the lead 3D, as shown in FIG. Since the lead 3D is electrically connected to the third arm 1C (the electrode 111 of the switching element 11C, the electrode 121 of the switching element 12C, and the electrode 132 of the protection element 13C), the electrode 212 of the switching element 21C, the electrode 222 of the switching element 22C, and the protection Electrode 231 of element 23C, electrode 111 of switching element 11C, electrode 121 of switching element 12C, and electrode 132 of protection element 13C are electrically connected via lead 3D and wire 6C.
 ワイヤ6Dは、図4に示すように、スイッチング素子11Aの電極112(エミッタ)と、スイッチング素子12Aの電極122(ソース)と、保護素子13Aの電極131(アノード)とに接合されている。これにより、スイッチング素子11Aの電極112と、スイッチング素子12Aの電極122と、保護素子13Aの電極131とが互いに導通する。また、ワイヤ6Dは、図3に示すように、リード3Eのパッド部33Eに接合されている。よって、リード3Eは、ワイヤ6Dを介して、スイッチング素子11Aの電極112、スイッチング素子12Aの電極122および保護素子13Aの電極131に導通する。 As shown in FIG. 4, the wire 6D is connected to the electrode 112 (emitter) of the switching element 11A, the electrode 122 (source) of the switching element 12A, and the electrode 131 (anode) of the protection element 13A. Thereby, the electrode 112 of the switching element 11A, the electrode 122 of the switching element 12A, and the electrode 131 of the protection element 13A are electrically connected to each other. Moreover, the wire 6D is joined to the pad portion 33E of the lead 3E, as shown in FIG. Therefore, the lead 3E is electrically connected to the electrode 112 of the switching element 11A, the electrode 122 of the switching element 12A, and the electrode 131 of the protection element 13A via the wire 6D.
 ワイヤ6Eは、図4に示すように、スイッチング素子11Bの電極112(エミッタ)と、スイッチング素子12Bの電極122(ソース)と、保護素子13Bの電極131(アノード)とに接合されている。これにより、スイッチング素子11Bの電極112と、スイッチング素子12Bの電極122と、保護素子13Bの電極131とが互いに導通する。また、ワイヤ6Eは、図3に示すように、リード3Fのパッド部33Fに接合されている。よって、リード3Fは、ワイヤ6Eを介して、スイッチング素子11Bの電極112、スイッチング素子12Bの電極122および保護素子13Bの電極131に導通する。 As shown in FIG. 4, the wire 6E is connected to the electrode 112 (emitter) of the switching element 11B, the electrode 122 (source) of the switching element 12B, and the electrode 131 (anode) of the protection element 13B. Thereby, the electrode 112 of the switching element 11B, the electrode 122 of the switching element 12B, and the electrode 131 of the protection element 13B are electrically connected to each other. Moreover, the wire 6E is joined to the pad portion 33F of the lead 3F, as shown in FIG. Therefore, the lead 3F is electrically connected to the electrode 112 of the switching element 11B, the electrode 122 of the switching element 12B, and the electrode 131 of the protection element 13B via the wire 6E.
 ワイヤ6Fは、図4に示すように、スイッチング素子11Cの電極112(エミッタ)と、スイッチング素子12Cの電極122(ソース)と、保護素子13Cの電極131(アノード)とに接合されている。これにより、スイッチング素子11Cの電極112と、スイッチング素子12Cの電極122と、保護素子13Cの電極131とが互いに導通する。また、ワイヤ6Fは、図3に示すように、リード3Gのパッド部33Gに接合されている。よって、リード3Gは、ワイヤ6Fを介して、スイッチング素子11Cの電極112、スイッチング素子12Cの電極122および保護素子13Cの電極131に導通する。 As shown in FIG. 4, the wire 6F is connected to the electrode 112 (emitter) of the switching element 11C, the electrode 122 (source) of the switching element 12C, and the electrode 131 (anode) of the protection element 13C. Thereby, the electrode 112 of the switching element 11C, the electrode 122 of the switching element 12C, and the electrode 131 of the protection element 13C are electrically connected to each other. Moreover, the wire 6F is joined to the pad portion 33G of the lead 3G, as shown in FIG. Therefore, the lead 3G is electrically connected to the electrode 112 of the switching element 11C, the electrode 122 of the switching element 12C, and the electrode 131 of the protection element 13C via the wire 6F.
 複数のワイヤ61Gは、図4および図5に示すように、第1制御素子8Aの電極81と、複数のスイッチング素子12の主面配線部125(第1パッド部125a)とに、それぞれ個別に接合される。複数のワイヤ62Gは、図4および図5に示すように、複数のスイッチング素子12の主面配線部125(第2パッド部125b)と、複数のスイッチング素子11の電極113(ゲート)とに、それぞれ個別に接合される。この構成により、各スイッチング素子11の電極113は、ワイヤ62G、主面配線部125およびワイヤ61Gを介して、第1制御素子8Aの電極81に導通する。よって、各スイッチング素子11に対する第1駆動信号は、第1制御素子8Aの電極81から、ワイヤ61G、主面配線部125およびワイヤ62Gを伝って、各スイッチング素子11の電極113に入力される。 As shown in FIGS. 4 and 5, the plurality of wires 61G are individually connected to the electrode 81 of the first control element 8A and the main surface wiring part 125 (first pad part 125a) of the plurality of switching elements 12. Joined. As shown in FIGS. 4 and 5, the plurality of wires 62G are connected to the main surface wiring part 125 (second pad part 125b) of the plurality of switching elements 12 and the electrode 113 (gate) of the plurality of switching elements 11, Each is individually joined. With this configuration, the electrode 113 of each switching element 11 is electrically connected to the electrode 81 of the first control element 8A via the wire 62G, the main surface wiring section 125, and the wire 61G. Therefore, the first drive signal for each switching element 11 is input to the electrode 113 of each switching element 11 from the electrode 81 of the first control element 8A, through the wire 61G, the main surface wiring section 125, and the wire 62G.
 複数のワイヤ6Hは、図4に示すように、各スイッチング素子12の電極123と、第1制御素子8Aの電極81とに接続されている。複数のワイヤ6Hは、複数のスイッチング素子12の各々に対応する上記第1駆動信号をそれぞれ伝送する。つまり、各スイッチング素子12に対する第1駆動信号は、第1制御素子8Aの電極81から、ワイヤ6Hを伝って、各スイッチング素子12の電極123に入力される。 As shown in FIG. 4, the plurality of wires 6H are connected to the electrode 123 of each switching element 12 and the electrode 81 of the first control element 8A. The plurality of wires 6H each transmit the first drive signal corresponding to each of the plurality of switching elements 12. That is, the first drive signal for each switching element 12 is input from the electrode 81 of the first control element 8A to the electrode 123 of each switching element 12 via the wire 6H.
 複数のワイヤ61Qは、図6および図7に示すように、第2制御素子8Bの電極81と、複数のスイッチング素子22の主面配線部225(第3パッド部225a)とに、それぞれ個別に接合される。複数のワイヤ62Qは、図6および図7に示すように、複数のスイッチング素子22の主面配線部225(第4パッド部225b)と、複数のスイッチング素子21の電極213(ゲート)とに、それぞれ個別に接合される。この構成により、各スイッチング素子21の電極213は、ワイヤ62Q、主面配線部225およびワイヤ61Qを介して、第2制御素子8Bの電極81に導通する。よって、各スイッチング素子21に対する第2駆動信号は、第2制御素子8Bの電極81から、ワイヤ61Q、主面配線部225およびワイヤ62Qを伝って、各スイッチング素子21の電極213に入力される。 As shown in FIGS. 6 and 7, the plurality of wires 61Q are individually connected to the electrode 81 of the second control element 8B and the main surface wiring part 225 (third pad part 225a) of the plurality of switching elements 22. Joined. As shown in FIGS. 6 and 7, the plurality of wires 62Q are connected to the main surface wiring part 225 (fourth pad part 225b) of the plurality of switching elements 22 and the electrode 213 (gate) of the plurality of switching elements 21, Each is individually joined. With this configuration, the electrode 213 of each switching element 21 is electrically connected to the electrode 81 of the second control element 8B via the wire 62Q, the main surface wiring section 225, and the wire 61Q. Therefore, the second drive signal for each switching element 21 is input to the electrode 213 of each switching element 21 from the electrode 81 of the second control element 8B, through the wire 61Q, the main surface wiring section 225, and the wire 62Q.
 複数のワイヤ6Jは、図5に示すように、各スイッチング素子22の電極223と、第2制御素子8Bの電極81とに接続されている。複数のワイヤ6Jは、複数のスイッチング素子22の各々に対応する上記第2駆動信号をそれぞれ伝送する。つまり、各スイッチング素子22に対する第2駆動信号は、第2制御素子8Bの電極81から、ワイヤ6Jを伝って、各スイッチング素子22の電極223に入力される。 As shown in FIG. 5, the plurality of wires 6J are connected to the electrode 223 of each switching element 22 and the electrode 81 of the second control element 8B. The plurality of wires 6J each transmit the second drive signal corresponding to each of the plurality of switching elements 22. That is, the second drive signal for each switching element 22 is input from the electrode 81 of the second control element 8B to the electrode 223 of each switching element 22 via the wire 6J.
 複数のワイヤ6Kは、各スイッチング素子22の電極222と、第2制御素子8Bの電極83とに接続されている。複数のワイヤ6Kはそれぞれ、第4アーム2A、第5アーム2Bおよび第6アーム2Cのいずれかの導通状態をそれぞれ検出するための検出信号を伝送する。図示された例では、当該検出信号は、各スイッチング素子22のソース電流(またはソース電圧)である。 The plurality of wires 6K are connected to the electrode 222 of each switching element 22 and the electrode 83 of the second control element 8B. Each of the plurality of wires 6K transmits a detection signal for detecting the conduction state of any one of the fourth arm 2A, the fifth arm 2B, and the sixth arm 2C. In the illustrated example, the detection signal is the source current (or source voltage) of each switching element 22.
 複数のワイヤ6Lはそれぞれ、第1制御素子8Aの電極82または第2制御素子8Bの電極82と、複数の電子部品89U,89V,89Wのいずれかまたは複数のリード4A~4H,4J~4N,4P~4Rのいずれかのパッド部43A~43H,43J~43N,43P~43Rとに接続されている。よって、各ワイヤ6Lは、第1制御素子8Aまたは第2制御素子8Bと、各リード4A~4H,4J~4N,4P~4Rとを導通させる。 Each of the plurality of wires 6L connects to the electrode 82 of the first control element 8A or the electrode 82 of the second control element 8B, and one of the plurality of electronic components 89U, 89V, 89W or the plurality of leads 4A to 4H, 4J to 4N, It is connected to any of the pad portions 43A to 43H, 43J to 43N, and 43P to 43R of 4P to 4R. Therefore, each wire 6L connects the first control element 8A or the second control element 8B to each of the leads 4A to 4H, 4J to 4N, and 4P to 4R.
 複数の接続部材6において、各ワイヤ6A~6Fは、各ワイヤ6H,6J~6L,61G,61Q,62G,62Qよりも線径が太い。これは、半導体装置A1が、IPMとして構成された場合、複数のリード3A~3Gには、複数のリード4A~4Fよりも高電圧が印加され、より大きな電流が流されるからである。各ワイヤ6A~6Fは、たとえばAlまたはAl合金からなる。各ワイヤ6A~6Fの構成材料は、AlまたはAl合金ではなく、AuまたはAu合金あるいはCuまたはCu合金であってもよい。各ワイヤ6H,6J~6L,61G,61Q,62G,62Qは、たとえばAuまたはAu合金からなる。各ワイヤ6H,6J~6L,61G,61Q,62G,62Qの構成材料は、AuまたはAu合金ではなく、AlまたはAl合金あるいはCuまたはCu合金であってもよい。 In the plurality of connection members 6, each wire 6A to 6F has a larger wire diameter than each wire 6H, 6J to 6L, 61G, 61Q, 62G, and 62Q. This is because when the semiconductor device A1 is configured as an IPM, a higher voltage is applied to the plurality of leads 3A to 3G than to the plurality of leads 4A to 4F, and a larger current flows through the plurality of leads 3A to 3G. Each wire 6A to 6F is made of, for example, Al or an Al alloy. The constituent material of each wire 6A to 6F may be Au or an Au alloy, or Cu or a Cu alloy instead of Al or an Al alloy. Each wire 6H, 6J to 6L, 61G, 61Q, 62G, 62Q is made of, for example, Au or an Au alloy. The constituent material of each wire 6H, 6J to 6L, 61G, 61Q, 62G, 62Q may be Al or Al alloy, Cu or Cu alloy instead of Au or Au alloy.
 封止部材7は、図1~図3および図8~図13に示すように、複数の第1スイッチ部1、複数の第2スイッチ部2、第1制御素子8A、第2制御素子8B、複数の電子部品89U,89V,89W、複数のリード3A~3G,3Zのそれぞれの一部と、複数のリード4A~4H,4J~4N,4P~4Rのそれぞれの一部と、支持基板51の一部および複数の接続部材6とを覆っている。封止部材7は、たとえば黒色のエポキシ樹脂である。封止部材7は、樹脂主面71、樹脂裏面72および複数の樹脂側面73~76を有する。 As shown in FIGS. 1 to 3 and 8 to 13, the sealing member 7 includes a plurality of first switch sections 1, a plurality of second switch sections 2, a first control element 8A, a second control element 8B, A plurality of electronic components 89U, 89V, 89W, a portion of each of the plurality of leads 3A to 3G, 3Z, a portion of each of the plurality of leads 4A to 4H, 4J to 4N, 4P to 4R, and the support substrate 51. It covers a part and a plurality of connection members 6. The sealing member 7 is, for example, a black epoxy resin. The sealing member 7 has a resin main surface 71, a resin back surface 72, and a plurality of resin side surfaces 73 to 76.
 図8~図13に示すように、樹脂主面71および樹脂裏面72は、z方向に離間する。樹脂主面71はz方向上方(z方向のz1側)を向き、樹脂裏面72はz方向下方(z方向のz2側)を向く。樹脂主面71および樹脂裏面72はそれぞれ、略平坦である。複数の樹脂側面73~76はそれぞれ、z方向において樹脂主面71と樹脂裏面72との間に位置し、これらに繋がっている。図2、図3、図8、図10および図11に示すように、一対の樹脂側面73,74は、x方向に離間する。一対の樹脂側面73,74は、x方向において互いに反対側を向く。図2、図3、図9、図12および図13に示すように、一対の樹脂側面75,76は、y方向に離間する。一対の樹脂側面75,76は、y方向において互いに反対側を向く。図2および図3などに示すように、樹脂側面73には、x方向に窪んだ凹部731が形成されている。樹脂側面74には、x方向に窪んだ凹部741が形成されている。凹部731および凹部741は、たとえば半導体装置A1を実装する際の固定に用いられる。また、図2および図3に示すように、樹脂側面76には、各々がy方向に窪んだ複数の凹部761が形成されている。 As shown in FIGS. 8 to 13, the resin main surface 71 and the resin back surface 72 are spaced apart in the z direction. The main resin surface 71 faces upward in the z direction (z1 side in the z direction), and the resin back surface 72 faces downward in the z direction (z2 side in the z direction). The main resin surface 71 and the resin back surface 72 are each substantially flat. Each of the plurality of resin side surfaces 73 to 76 is located between and connected to the resin main surface 71 and the resin back surface 72 in the z direction. As shown in FIGS. 2, 3, 8, 10, and 11, the pair of resin side surfaces 73 and 74 are spaced apart in the x direction. A pair of resin side surfaces 73 and 74 face oppositely to each other in the x direction. As shown in FIGS. 2, 3, 9, 12, and 13, the pair of resin side surfaces 75 and 76 are spaced apart in the y direction. A pair of resin side surfaces 75 and 76 face opposite to each other in the y direction. As shown in FIGS. 2 and 3, a recess 731 recessed in the x direction is formed in the resin side surface 73. A recess 741 recessed in the x direction is formed in the resin side surface 74. The recess 731 and the recess 741 are used, for example, to fix the semiconductor device A1 when it is mounted. Further, as shown in FIGS. 2 and 3, a plurality of recesses 761 are formed in the resin side surface 76, each recessed in the y direction.
 半導体装置A1では、端子部32A(リード3A)と端子部32E(リード3E)とに印加された第1直流電圧が、第1アーム1Aと第4アーム2Aとの各スイッチング動作により、第1交流電圧に変換される。そして、当該第1交流電圧が端子部32B(リード3B)から出力される。また、端子部32A(リード3A)と端子部32F(リード3F)とに印加された第2直流電圧が、第2アーム1Bと第5アーム2Bとの各スイッチング動作により、第2交流電圧に変換される。そして、当該第2交流電圧が端子部32C(リード3C)から出力される。さらに、端子部32A(リード3A)と端子部32G(リード3G)とに印加された第3直流電圧が、第3アーム1Cと第6アーム2Cとの各スイッチング動作により、第3交流電圧に変換される。そして、当該第3交流電圧が端子部32D(リード3D)から出力される。 In the semiconductor device A1, the first DC voltage applied to the terminal portion 32A (lead 3A) and the terminal portion 32E (lead 3E) is changed to the first AC voltage by each switching operation of the first arm 1A and the fourth arm 2A. converted to voltage. Then, the first AC voltage is output from the terminal portion 32B (lead 3B). Further, the second DC voltage applied to the terminal portion 32A (lead 3A) and the terminal portion 32F (lead 3F) is converted into a second AC voltage by each switching operation of the second arm 1B and the fifth arm 2B. be done. Then, the second AC voltage is output from the terminal portion 32C (lead 3C). Furthermore, the third DC voltage applied to the terminal part 32A (lead 3A) and the terminal part 32G (lead 3G) is converted into a third AC voltage by each switching operation of the third arm 1C and the sixth arm 2C. be done. Then, the third AC voltage is output from the terminal portion 32D (lead 3D).
 以上のように構成された半導体装置A1の回路構成は、図14に示すように、次の通りである。図14に示す例では、各スイッチング素子11A,11B,11Cおよび各スイッチング素子21A,21B,21Cはそれぞれ、IGBTであり、各スイッチング素子12A,12B,12Cおよび各スイッチング素子22A,22B,22Cはそれぞれ、MOSFETである。また、各保護素子13A,13B,13Cおよび各保護素子23A,23B,23Cはそれぞれ、ショットキーバリアダイオードである。なお、図14においては、各スイッチング素子12A,12B,12Cおよび各スイッチング素子22A,22B,22Cの寄生ダイオードも図示する。 The circuit configuration of the semiconductor device A1 configured as described above is as shown in FIG. 14 as follows. In the example shown in FIG. 14, each switching element 11A, 11B, 11C and each switching element 21A, 21B, 21C is an IGBT, and each switching element 12A, 12B, 12C and each switching element 22A, 22B, 22C is each an IGBT. , MOSFET. Moreover, each protection element 13A, 13B, 13C and each protection element 23A, 23B, 23C is a Schottky barrier diode, respectively. In addition, in FIG. 14, the parasitic diodes of each switching element 12A, 12B, 12C and each switching element 22A, 22B, 22C are also illustrated.
 各スイッチング素子21A,21B,21Cのコレクタ(電極211)、各スイッチング素子22A,22B,22Cのドレイン(電極221)および各保護素子23A,23B,23Cのカソード(電極131)は互いに接続され、P端子(リード3A)に接続されている。 The collector (electrode 211) of each switching element 21A, 21B, 21C, the drain (electrode 221) of each switching element 22A, 22B, 22C, and the cathode (electrode 131) of each protection element 23A, 23B, 23C are connected to each other, Connected to the terminal (lead 3A).
 スイッチング素子21Aのエミッタ(電極212)、スイッチング素子22Aのソース(電極222)および保護素子23Aのアノード(電極231)は、接続点N1を介して、スイッチング素子11Aのコレクタ(電極111)、スイッチング素子12Aのドレイン(電極121)および保護素子13Aのカソード(電極132)に接続されている。接続点N1は、U端子(リード3B)に接続される。 The emitter (electrode 212) of the switching element 21A, the source (electrode 222) of the switching element 22A, and the anode (electrode 231) of the protection element 23A are connected to the collector (electrode 111) of the switching element 11A and the switching element 21A through the connection point N1. 12A (electrode 121) and the cathode (electrode 132) of the protection element 13A. Connection point N1 is connected to the U terminal (lead 3B).
 スイッチング素子21Bのエミッタ(電極212)、スイッチング素子22Bのソース(電極222)および保護素子23Bのアノード(電極231)は、接続点N2を介して、スイッチング素子11Bのコレクタ(電極111)、スイッチング素子12Bのドレイン(電極121)および保護素子13Bのカソード(電極132)に接続されている。接続点N2は、V端子(リード3C)に接続される。 The emitter (electrode 212) of the switching element 21B, the source (electrode 222) of the switching element 22B, and the anode (electrode 231) of the protection element 23B are connected to the collector (electrode 111) of the switching element 11B and the switching element 11B via the connection point N2. 12B (electrode 121) and the cathode (electrode 132) of protection element 13B. Connection point N2 is connected to the V terminal (lead 3C).
 スイッチング素子21Cのエミッタ(電極212)、スイッチング素子22Cのソース(電極222)および保護素子23Cのアノード(電極231)は、接続点N3を介して、スイッチング素子11Cのコレクタ(電極111)、スイッチング素子12Cのドレイン(電極121)および保護素子13Cのカソード(電極132)に接続されている。接続点N3は、W端子(リード3D)に接続される。 The emitter (electrode 212) of the switching element 21C, the source (electrode 222) of the switching element 22C, and the anode (electrode 231) of the protection element 23C are connected to the collector (electrode 111) of the switching element 11C and the switching element 11C via the connection point N3. It is connected to the drain of 12C (electrode 121) and the cathode (electrode 132) of protection element 13C. Connection point N3 is connected to the W terminal (lead 3D).
 スイッチング素子11Aのエミッタ(電極112)、スイッチング素子12Aのソース(電極122)および保護素子13Aのアノード(電極131)は、NU端子(リード3E)に接続される。スイッチング素子11Bのエミッタ(電極112)、スイッチング素子12Bのソース(電極122)および保護素子13Bのアノード(電極131)は、NV端子(リード3F)に接続される。スイッチング素子11Cのエミッタ(電極112)、スイッチング素子12Cのソース(電極122)および保護素子13Cのアノード(電極131)は、NW端子(リード3G)に接続される。 The emitter (electrode 112) of the switching element 11A, the source (electrode 122) of the switching element 12A, and the anode (electrode 131) of the protection element 13A are connected to the NU terminal (lead 3E). The emitter (electrode 112) of the switching element 11B, the source (electrode 122) of the switching element 12B, and the anode (electrode 131) of the protection element 13B are connected to the NV terminal (lead 3F). The emitter (electrode 112) of the switching element 11C, the source (electrode 122) of the switching element 12C, and the anode (electrode 131) of the protection element 13C are connected to the NW terminal (lead 3G).
 U端子(リード3B)、V端子(リード3C)およびW端子(リード3D)に印加される電圧レベルは、たとえば0V~650V程度である。一方、NU端子(リード3E)、NV端子(リード3F)およびNW端子(リード3G)に印加される電圧レベルは、たとえば、0V程度であり、U端子(リード3B)、V端子(リード3C)およびW端子(リード3D)に印加される電圧レベルよりも低い。 The voltage levels applied to the U terminal (lead 3B), V terminal (lead 3C), and W terminal (lead 3D) are, for example, about 0V to 650V. On the other hand, the voltage level applied to the NU terminal (lead 3E), NV terminal (lead 3F), and NW terminal (lead 3G) is, for example, about 0V, and the voltage level applied to the U terminal (lead 3B), V terminal (lead 3C) and the voltage level applied to the W terminal (lead 3D).
 各スイッチング素子21A,21B,21Cのゲート(電極213)および各スイッチング素子22A,22B,22Cのゲート(電極223)はそれぞれ、第2制御素子8Bに接続される。各スイッチング素子22A,22B,22Cのソース(電極222)はそれぞれ、第2制御素子8Bに接続される。各スイッチング素子11A,11B,11Cのゲート(電極113)および各スイッチング素子12A,12B,12Cのゲート(電極123)はそれぞれ、第1制御素子8Aに接続される。 The gate (electrode 213) of each switching element 21A, 21B, 21C and the gate (electrode 223) of each switching element 22A, 22B, 22C are respectively connected to the second control element 8B. The sources (electrodes 222) of each switching element 22A, 22B, 22C are respectively connected to the second control element 8B. The gate (electrode 113) of each switching element 11A, 11B, 11C and the gate (electrode 123) of each switching element 12A, 12B, 12C are respectively connected to the first control element 8A.
 LINU端子(リード4Q)、LINV端子(リード4J)、LINW端子(リード4K)は、外部のゲート制御回路が接続され、ゲート制御回路から第1入力信号が入力される。HINU端子(リード4E)、HINV端子(リード4F)、HINW端子(リード4G)は、上記ゲート制御回路(図示略)が接続され、当該ゲート制御回路から第2入力信号が入力される。 The LINU terminal (lead 4Q), LINV terminal (lead 4J), and LINW terminal (lead 4K) are connected to an external gate control circuit, and the first input signal is input from the gate control circuit. The HINU terminal (lead 4E), HINV terminal (lead 4F), and HINW terminal (lead 4G) are connected to the gate control circuit (not shown), and a second input signal is input from the gate control circuit.
 第1制御素子8Aは、LINU端子(リード4Q)、LINV端子(リード4J)、LINW端子(リード4K)、第2VCC端子(リード4L)、FO端子(リード4M)、CIN端子(リード4N)、および、第2GND端子(リード4R)に電気的に接続されている。また、第1制御素子8Aは、第1GND端子(リード4H)にも電気的に接続されている。第2VCC端子は、第1制御素子8Aに電源電圧VCCを供給する端子である。第1制御素子8Aは、LINU端子、LINV端子、LINW端子から第1入力信号が入力される。第1制御素子8Aは、入力される第1入力信号に基づいて、上記第1駆動信号(たとえばゲート電圧)を生成する。そして、生成した第1駆動信号を、各スイッチング素子11A,11B,11Cのゲート(電極113)および各スイッチング素子12A,12B,12Cのゲート(電極123)にそれぞれ入力する。 The first control element 8A includes a LINU terminal (lead 4Q), a LINV terminal (lead 4J), a LINW terminal (lead 4K), a second VCC terminal (lead 4L), an FO terminal (lead 4M), a CIN terminal (lead 4N), And it is electrically connected to the second GND terminal (lead 4R). Further, the first control element 8A is also electrically connected to the first GND terminal (lead 4H). The second VCC terminal is a terminal that supplies the power supply voltage VCC to the first control element 8A. A first input signal is input to the first control element 8A from the LINU terminal, LINV terminal, and LINW terminal. The first control element 8A generates the first drive signal (for example, gate voltage) based on the input first input signal. The generated first drive signal is then input to the gate (electrode 113) of each switching element 11A, 11B, 11C and the gate (electrode 123) of each switching element 12A, 12B, 12C.
 第2制御素子8Bは、VBU端子(リード4A)、VBV端子(リード4B)、VBW端子(リード4C)、HINU端子(リード4D)、HINV端子(リード4E)、HINW端子(リード4F)、第1VCC端子(リード4G)、および、第1GND端子(リード4H)に、電気的に接続されている。また、第2制御素子8Bは、第2GND端子(リード4R)にも電気的に接続されている。第1VCC端子は、第2制御素子8Bに電源電圧VCCを供給する端子である。第2制御素子8Bは、HINU端子、HINV端子およびHINW端子から第2入力信号が入力される。第2制御素子8Bは、入力された第2入力信号に基づいて、上記第2駆動信号(たとえばゲート電圧)を生成する。そして、生成した第2駆動信号を、各スイッチング素子21A,21B,21Cのゲート(電極213)および各スイッチング素子22A,22B,22Cのゲート(電極223)にそれぞれ入力する。 The second control element 8B includes a VBU terminal (lead 4A), a VBV terminal (lead 4B), a VBW terminal (lead 4C), a HINU terminal (lead 4D), a HINV terminal (lead 4E), a HINW terminal (lead 4F), and a VBU terminal (lead 4B). It is electrically connected to the 1VCC terminal (lead 4G) and the first GND terminal (lead 4H). Further, the second control element 8B is also electrically connected to the second GND terminal (lead 4R). The first VCC terminal is a terminal that supplies the power supply voltage VCC to the second control element 8B. A second input signal is input to the second control element 8B from the HINU terminal, HINV terminal, and HIINW terminal. The second control element 8B generates the second drive signal (for example, gate voltage) based on the input second input signal. The generated second drive signal is then input to the gate (electrode 213) of each switching element 21A, 21B, 21C and the gate (electrode 223) of each switching element 22A, 22B, 22C.
 図14に示す例では、第1GND端子(リード4H)と第2GND端子(リード4R)とは、半導体装置A1の内部において繋がっており、互いに同電位である。この構成とは異なり、第1GND端子(リード4H)と第2GND端子(リード4R)とは、半導体装置A1の内部において互いに分離しており、異なる電位であってもよい。 In the example shown in FIG. 14, the first GND terminal (lead 4H) and the second GND terminal (lead 4R) are connected inside the semiconductor device A1 and have the same potential. Unlike this configuration, the first GND terminal (lead 4H) and the second GND terminal (lead 4R) may be separated from each other inside the semiconductor device A1 and may have different potentials.
 半導体装置A1の作用および効果は、次の通りである。 The functions and effects of the semiconductor device A1 are as follows.
 半導体装置A1は、少なくとも1つの第1スイッチ部1および第1制御素子8Aを備える。少なくとも1つの第1スイッチ部1の各々は、スイッチング素子11およびスイッチング素子12を有している。そして、第1制御素子8Aは、スイッチング素子11およびスイッチング素子12よりも、y方向のy1側に配置されており、スイッチング素子12は、y方向において、第1制御素子8Aとスイッチング素子11との間に配置される。第1制御素子8A、スイッチング素子11およびスイッチング素子12のこのような位置関係では、第1制御素子8Aとスイッチング素子11とを1本のワイヤで直接接続し、第1制御素子8Aとスイッチング素子12とを1本ワイヤで直接接続すると、相対的に第1制御素子8Aから遠いスイッチング素子11に接合するワイヤが長くなる。ワイヤは、長ければ長い程、モールド樹脂(封止部材7)の形成時においてワイヤ流れが発生しやすい。そこで、半導体装置A1では、スイッチング素子12に主面配線部125を設け、第1制御素子8Aと主面配線部125とをワイヤ61Gで接続し、主面配線部125とスイッチング素子11とをワイヤ62Gで接続する構成にした。これにより、第1制御素子8Aとスイッチング素子11とを1本のワイヤで直接接続する場合よりも、各ワイヤ61G,62Gが短くなる。つまり、半導体装置A1は、各ワイヤ61G,62Gのワイヤ流れを抑制することが可能となる。したがって、半導体装置A1は、複数のスイッチング素子(スイッチング素子11とスイッチング素子12と)を1つの第1スイッチ部1として動作させる構成において、より好ましい構造となる。 The semiconductor device A1 includes at least one first switch section 1 and a first control element 8A. Each of the at least one first switch section 1 has a switching element 11 and a switching element 12. The first control element 8A is arranged on the y1 side in the y direction than the switching element 11 and the switching element 12, and the switching element 12 is arranged between the first control element 8A and the switching element 11 in the y direction. placed between. In such a positional relationship between the first control element 8A, the switching element 11, and the switching element 12, the first control element 8A and the switching element 11 are directly connected with one wire, and the first control element 8A and the switching element 12 are connected directly. If these are directly connected with one wire, the wire connected to the switching element 11 relatively far from the first control element 8A becomes long. The longer the wire is, the more likely it is that the wire will flow during formation of the mold resin (sealing member 7). Therefore, in the semiconductor device A1, the main surface wiring section 125 is provided in the switching element 12, the first control element 8A and the main surface wiring section 125 are connected with the wire 61G, and the main surface wiring section 125 and the switching element 11 are connected with the wire 61G. I configured it to connect at 62G. Thereby, each of the wires 61G and 62G becomes shorter than when the first control element 8A and the switching element 11 are directly connected with one wire. In other words, the semiconductor device A1 can suppress the wire flow of each of the wires 61G and 62G. Therefore, the semiconductor device A1 has a more preferable structure in which a plurality of switching elements (switching element 11 and switching element 12) are operated as one first switch section 1.
 先述のワイヤ流れに関しては、少なくとも1つの第2スイッチ部2の各々のスイッチング素子21およびスイッチング素子22と、第2制御素子8Bと、の関係においても同様である。つまり、半導体装置A1では、スイッチング素子22に主面配線部225を設け、第2制御素子8Bと主面配線部225とをワイヤ61Qで接続し、主面配線部225とスイッチング素子21とをワイヤ62Qで接続する構成にした。これにより、第2制御素子8Bとスイッチング素子21とを直接1本のワイヤで接続する場合よりも、各ワイヤ61Q,62Qを短くできる。つまり、半導体装置A1は、各ワイヤ61Q,62Qのワイヤ流れを抑制することが可能となる。したがって、半導体装置A1は、複数のスイッチング素子(スイッチング素子21とスイッチング素子22と)を1つの第2スイッチ部2として動作させる構成において、より好ましい構造となる。 Regarding the wire flow described above, the same applies to the relationship between each of the switching elements 21 and 22 of the at least one second switch section 2 and the second control element 8B. That is, in the semiconductor device A1, the switching element 22 is provided with the main surface wiring section 225, the second control element 8B and the main surface wiring section 225 are connected with the wire 61Q, and the main surface wiring section 225 and the switching element 21 are connected with the wire 61Q. I configured it to connect with 62Q. Thereby, each wire 61Q, 62Q can be made shorter than when the second control element 8B and the switching element 21 are directly connected with one wire. In other words, the semiconductor device A1 can suppress the wire flow of each of the wires 61Q and 62Q. Therefore, the semiconductor device A1 has a more preferable structure in which a plurality of switching elements (switching element 21 and switching element 22) are operated as one second switch section 2.
 半導体装置A1では、各第1スイッチ部1において、スイッチング素子11とスイッチング素子12とは、異なる種類である。スイッチング素子には、IGBT、MOSFET、バイポーラトランジスタなどの種類があるが、その種類が異なれば、電気的特性も異なる。たとえば、MOSFETとIGBTとは、物性および構造の違いにより、次のような電気的特性を示すことが知られている。たとえば、MOSFETは、IGBTよりもスイッチング速度が速く、IGBTよりもスイッチング損失が小さい。一方、IGBTは、大電流域において、MOSFETよりもオン抵抗が小さく、MOSFETよりも定常損失が小さい。そこで、半導体装置A1は、スイッチング素子11をIGBTで構成し、スイッチング素子12をMOSFETで構成する。そして、各第1スイッチ部1のスイッチング時(ターンオンおよびターンオフ)では、スイッチング素子12に多くの電流が流れるように制御することで、スイッチング損失を低減でき、各第1スイッチ部1が定常状態では、スイッチング素子11に多くの電流が流れるように制御することで、定常損失を低減できる。したがって、スイッチング素子11がIGBTで構成され、且つ、スイッチング素子12がMOSFETで構成された半導体装置A1は、スイッチング損失および定常損失の双方を低減し、電力損失を低減できる。つまり、半導体装置A1は、変換効率を向上させることが可能となる。このように、スイッチング素子11とスイッチング素子12とを異なる種類にすれば、互いの電気的特性を補うように動作させることができるので、複数のスイッチング素子(スイッチング素子11およびスイッチング素子12)を1つの第1スイッチ部1として動作させる上で好ましい。このことは、各第2スイッチ部2におけるスイッチング素子21とスイッチング素子22との関係においても同様である。つまり、半導体装置A1において、スイッチング素子21とスイッチング素子22とを異なる種類にすることは、複数のスイッチング素子(スイッチング素子21およびスイッチング素子22)を1つの第2スイッチ部2として動作させる上で好ましい。たとえば、スイッチング素子21がIGBTであり、スイッチング素子22がMOSFETであれば、スイッチング損失および定常損失の双方を低減し、電力損失を低減できる。 In the semiconductor device A1, the switching element 11 and the switching element 12 in each first switch section 1 are of different types. There are different types of switching elements, such as IGBTs, MOSFETs, and bipolar transistors, and different types have different electrical characteristics. For example, it is known that MOSFETs and IGBTs exhibit the following electrical characteristics due to differences in physical properties and structures. For example, MOSFETs have faster switching speeds than IGBTs and lower switching losses than IGBTs. On the other hand, IGBTs have lower on-resistance than MOSFETs and lower steady-state losses than MOSFETs in large current ranges. Therefore, in the semiconductor device A1, the switching element 11 is configured with an IGBT, and the switching element 12 is configured with a MOSFET. During switching (turn-on and turn-off) of each first switch section 1, switching loss can be reduced by controlling so that a large amount of current flows through the switching element 12, and when each first switch section 1 is in a steady state, By controlling so that a large amount of current flows through the switching element 11, steady-state loss can be reduced. Therefore, the semiconductor device A1 in which the switching element 11 is configured with an IGBT and the switching element 12 is configured with a MOSFET can reduce both switching loss and steady loss, and reduce power loss. In other words, the semiconductor device A1 can improve conversion efficiency. In this way, if the switching element 11 and the switching element 12 are made of different types, they can be operated so as to complement each other's electrical characteristics, so a plurality of switching elements (switching element 11 and switching element 12) can be combined into one. This is preferable for operating as one first switch section 1. This also applies to the relationship between the switching elements 21 and 22 in each second switch section 2. That is, in the semiconductor device A1, it is preferable to use different types of the switching element 21 and the switching element 22 in order to operate the plurality of switching elements (switching element 21 and switching element 22) as one second switch section 2. . For example, if the switching element 21 is an IGBT and the switching element 22 is a MOSFET, both switching loss and steady loss can be reduced, and power loss can be reduced.
 以下に、本開示の半導体装置の他の実施形態および変形例について、説明する。なお、各実施形態および各変形例における各部の構成は、技術的な矛盾が生じない範囲において相互に組み合わせ可能である。 Other embodiments and modifications of the semiconductor device of the present disclosure will be described below. Note that the configurations of each part in each embodiment and each modification can be combined with each other within a range that does not cause technical contradiction.
 図15~図19は、第2実施形態にかかる半導体装置A2を示している。これらの図に示すように、半導体装置A2は、複数の第1スイッチ部1、複数の第2スイッチ部2、第1制御素子8A、第2制御素子8B、複数の電子部品89U,89V,89W、複数のリード3A~3G,3Z,複数のリード4A~4H,4J~4N,4P~4R、支持基板51、配線パターン52、複数の接続部材6および封止部材7を備えている。つまり、半導体装置A2は、半導体装置A1と比較して、配線パターン52をさらに備える点で主に異なる。 15 to 19 show a semiconductor device A2 according to the second embodiment. As shown in these figures, the semiconductor device A2 includes a plurality of first switch sections 1, a plurality of second switch sections 2, a first control element 8A, a second control element 8B, and a plurality of electronic components 89U, 89V, 89W. , a plurality of leads 3A to 3G, 3Z, a plurality of leads 4A to 4H, 4J to 4N, 4P to 4R, a support substrate 51, a wiring pattern 52, a plurality of connection members 6, and a sealing member 7. That is, the semiconductor device A2 differs from the semiconductor device A1 mainly in that it further includes the wiring pattern 52.
 配線パターン52は、支持基板51の第1面511上に形成されている。配線パターン52は、導電性材料からなる。配線パターン52は、封止部材7に覆われている。配線パターン52は、複数の配線部52A~52H,52J~52N,52P~52Rおよび複数の接合部53A~53Dを含む。 The wiring pattern 52 is formed on the first surface 511 of the support substrate 51. The wiring pattern 52 is made of a conductive material. The wiring pattern 52 is covered with the sealing member 7. The wiring pattern 52 includes a plurality of wiring parts 52A to 52H, 52J to 52N, 52P to 52R, and a plurality of joint parts 53A to 53D.
 複数の配線部52A~52H,52J~52N,52P~52Rはそれぞれ、支持基板51上に形成されている。本実施形態では、各配線部52A~52H,52J~52N,52P~52Rは、支持基板51の第1面511上に形成されている。各配線部52A~52H,52J~52N,52P~52Rは、導電性材料からなる。各配線部52A~52H,52J~52N,52P~52Rを構成する導電性材料は、特に限定されないが、たとえばAg、Cu、Au等を含むものが挙げられる。以降の説明においては、各配線部52A~52H,52J~52N,52P~52RがAgを含む場合を例に説明する。なお、各配線部52A~52H,52J~52N,52P~52Rは、Agに代えてCuを含んでいてもよいし、AgまたはCuに代えてAuを含んでいてもよい。あるいは、各配線部52A~52H,52J~52N,52P~52Rは、Ag-PtやAg-Pdを含んでいてもよい。また、各配線部52A~52H,52J~52N,52P~52Rの形成手法は限定されず、たとえばこれらの金属を含むペーストを印刷した後に、焼成することによって形成される。 A plurality of wiring portions 52A to 52H, 52J to 52N, and 52P to 52R are formed on the support substrate 51, respectively. In this embodiment, each wiring portion 52A to 52H, 52J to 52N, and 52P to 52R is formed on the first surface 511 of the support substrate 51. Each wiring portion 52A to 52H, 52J to 52N, and 52P to 52R is made of a conductive material. The conductive material constituting each of the wiring portions 52A to 52H, 52J to 52N, and 52P to 52R is not particularly limited, but includes, for example, materials containing Ag, Cu, Au, and the like. In the following description, an example will be described in which each of the wiring portions 52A to 52H, 52J to 52N, and 52P to 52R contains Ag. Note that each of the wiring portions 52A to 52H, 52J to 52N, and 52P to 52R may contain Cu instead of Ag, or may contain Au instead of Ag or Cu. Alternatively, each of the wiring portions 52A to 52H, 52J to 52N, and 52P to 52R may contain Ag-Pt or Ag-Pd. Further, the method of forming each of the wiring portions 52A to 52H, 52J to 52N, and 52P to 52R is not limited, and may be formed, for example, by printing a paste containing these metals and then firing it.
 複数の配線部52A~52H,52J~52N,52P~52Rのうち、配線部52Hと配線部52Rとは、一体的に形成されており、それ以外は互いに離間する。この例とは異なり、配線部52Hと配線部52Rとが、互いに離間していてもよい。 Among the plurality of wiring parts 52A to 52H, 52J to 52N, and 52P to 52R, the wiring part 52H and the wiring part 52R are integrally formed, and the other parts are spaced apart from each other. Unlike this example, the wiring portion 52H and the wiring portion 52R may be spaced apart from each other.
 図15に示すように、配線部52A、配線部52Bおよび配線部52Cは、配線部52Dに対して、x方向のx1側に配置されている。 As shown in FIG. 15, the wiring portion 52A, the wiring portion 52B, and the wiring portion 52C are arranged on the x1 side in the x direction with respect to the wiring portion 52D.
 配線部52Aには、図15に示すように、第2制御素子8Bに接続されたワイヤ6Lおよび電子部品89Uが接合される。また、配線部52Aには、リード4Aが接合される。 As shown in FIG. 15, a wire 6L connected to the second control element 8B and an electronic component 89U are joined to the wiring portion 52A. Further, the lead 4A is joined to the wiring portion 52A.
 配線部52Bには、図15に示すように、第2制御素子8Bに接合されたワイヤ6Lおよび電子部品89Vが接合される。また、配線部52Bには、リード4Bが接合される。 As shown in FIG. 15, the wire 6L and the electronic component 89V that are bonded to the second control element 8B are bonded to the wiring portion 52B. Further, the lead 4B is joined to the wiring portion 52B.
 配線部52Cには、図15に示すように、第2制御素子8Bに接合されたワイヤ6Lおよび電子部品89Wが接合される。また、配線部52Cには、リード4Cが接合される。 As shown in FIG. 15, the wire 6L and the electronic component 89W, which are bonded to the second control element 8B, are bonded to the wiring portion 52C. Further, the lead 4C is joined to the wiring portion 52C.
 配線部52Dには、図15に示すように、配線部52Cよりも、x方向のx2側に配置される。配線部52Dは、第2制御素子8Bに接合されたワイヤ6Lが接合される。また、配線部52Dには、リード4Dが接合される。 As shown in FIG. 15, the wiring portion 52D is arranged on the x2 side in the x direction than the wiring portion 52C. The wire 6L connected to the second control element 8B is connected to the wiring portion 52D. Furthermore, a lead 4D is joined to the wiring portion 52D.
 図15に示すように、複数の配線部52E,52F,52Gは、配線部52Dに対して、x方向のx2側に配置されている。複数の配線部52E,52F,52Gにはそれぞれ、第2制御素子8Bに接合されたワイヤ6Lが接合される。また、複数の配線部52E,52F,52Gにはそれぞれ、図15に示すように、複数のリード4E,4F,4Gのうちの対応する1つがそれぞれ接合される。 As shown in FIG. 15, the plurality of wiring parts 52E, 52F, and 52G are arranged on the x2 side in the x direction with respect to the wiring part 52D. Wires 6L connected to the second control element 8B are connected to the plurality of wiring parts 52E, 52F, and 52G, respectively. Furthermore, as shown in FIG. 15, a corresponding one of the plurality of leads 4E, 4F, and 4G is connected to each of the plurality of wiring portions 52E, 52F, and 52G.
 配線部52Hには、第2制御素子8Bが搭載される。また、配線部52Hには、リード4Hが接合される。配線部52Hは、図15に示すように、パッド部521Hを含む。パッド部521Hは、配線部52Hのうちの第2制御素子8Bが接合される部位である。パッド部521Hは、平面視矩形状である。 A second control element 8B is mounted on the wiring section 52H. Further, the lead 4H is joined to the wiring portion 52H. The wiring section 52H includes a pad section 521H, as shown in FIG. 15. The pad portion 521H is a portion of the wiring portion 52H to which the second control element 8B is bonded. The pad portion 521H has a rectangular shape in plan view.
 配線部52Rには、第1制御素子8Aが搭載される。また、配線部52Rには、リード4Rが接合される。配線部52Rは、図15に示すように、パッド部521Rを含む。パッド部521Rは、配線部52Rのうちの第1制御素子8Aが接合される部位である。パッド部521Rは、平面視矩形状である。 The first control element 8A is mounted on the wiring section 52R. Further, the lead 4R is joined to the wiring portion 52R. The wiring section 52R includes a pad section 521R, as shown in FIG. 15. The pad portion 521R is a portion of the wiring portion 52R to which the first control element 8A is bonded. The pad portion 521R has a rectangular shape in plan view.
 図15に示すように複数の配線部52Q,52J,52K,52L,52M,52Nは、配線部52Hに対して、x方向のx2側に配置される。複数の配線部52Q,52J,52K,52L,52M,52Nにはそれぞれ、第1制御素子8Aに接合されたワイヤ6Lが接合される。また、複数の配線部52Q,52J,52K,52L,52M,52Nにはそれぞれ、図15に示すように、複数のリード4Q,4J,4K,4L,4M,4Nのうちの対応する1つがそれぞれ接合される。 As shown in FIG. 15, the plurality of wiring parts 52Q, 52J, 52K, 52L, 52M, and 52N are arranged on the x2 side in the x direction with respect to the wiring part 52H. Wires 6L connected to the first control element 8A are connected to the plurality of wiring parts 52Q, 52J, 52K, 52L, 52M, and 52N, respectively. Further, as shown in FIG. 15, each of the plurality of wiring parts 52Q, 52J, 52K, 52L, 52M, and 52N has a corresponding one of the plurality of leads 4Q, 4J, 4K, 4L, 4M, and 4N. Joined.
 図15に示すように、配線部52Pには、リード4Pが接合される。本実施形態では、配線部52Pには、ワイヤ6Lが接合されていない。 As shown in FIG. 15, the lead 4P is joined to the wiring portion 52P. In this embodiment, the wire 6L is not joined to the wiring portion 52P.
 図15に示すように、各配線部52A~52H,52J~52N,52P~52Rのうち、当該配線部52A~52H,52J~52N,52P~52Rに対応するリード4A~4H,4J~4N,4P~4Rが接合される部位は、平面視において、支持基板51の周縁に沿って配置される。 As shown in FIG. 15, among the wiring portions 52A to 52H, 52J to 52N, 52P to 52R, the leads 4A to 4H, 4J to 4N, corresponding to the wiring portions 52A to 52H, 52J to 52N, 52P to 52R, The portion where 4P to 4R are bonded is arranged along the periphery of the support substrate 51 in plan view.
 複数の接合部53A~53Dはそれぞれ、支持基板51上に形成されている。図18に示すように、各接合部53A~53Dは、各配線部52A~52H,52J~52N,52P~52Rと同様に、支持基板51の第1面511上に形成されている。図18に示すように、接合部53Aは、リード3Aの複数の搭載部311A,312A,313Aの下方(z方向のz2側)に配置され、接合部53Bは、リード3Bの搭載部31Bの下方(z方向のz2側)に配置され、接合部53Cは、リード3Cの搭載部31Cの下方(z方向のz2側)に配置され、接合部53Dは、リード3Dの搭載部31Dの下方(z方向のz2側)に配置される。各接合部53A~53Dの構成材料は、特に限定されず、支持基板51と各リード3A~3Dとを接合可能な材料で構成されている。各接合部53A~53Dは、たとえば導電性材料からなる。各接合部53A~53Dを構成する導電性材料は、特に限定されないが、たとえばAg、Cu、Au等を含むものが挙げられる。各接合部53A~53Dは、各配線部52A~52H,52J~52N,52P~52Rを構成する導電性材料と同じものを含む。なお、各接合部53A~53Dは、銀に代えて銅を含んでいてもよいし、銀または銅に代えて金を含んでいてもよい。あるいは、各接合部53A~53Dは、Ag-PtやAg-Pdを含んでいてもよい。また、各接合部53A~53Dの形成手法は限定されず、たとえば各配線部52A~52H,52J~52N,52P~52Rと同様に、これらの金属を含むペーストを印刷した後に、焼成することによって形成される。なお、各接合部53A~53Dの材料は、導電性ではなくもよい。また、配線パターン52は、複数の接合部53A~53Dのそれぞれを含んでいなくてもよい。 The plurality of joints 53A to 53D are each formed on the support substrate 51. As shown in FIG. 18, the respective joint portions 53A to 53D are formed on the first surface 511 of the support substrate 51, similarly to the respective wiring portions 52A to 52H, 52J to 52N, and 52P to 52R. As shown in FIG. 18, the joint 53A is arranged below the mounting parts 311A, 312A, 313A of the lead 3A (z2 side in the z direction), and the joint 53B is arranged below the mounting part 31B of the lead 3B. (z2 side in the z direction), the joint portion 53C is located below the mounting portion 31C of the lead 3C (z2 side in the z direction), and the joint portion 53D is located below the mounting portion 31D of the lead 3D (z z2 side). The constituent material of each of the bonding parts 53A to 53D is not particularly limited, and is made of a material that can bond the support substrate 51 and each of the leads 3A to 3D. Each joint 53A to 53D is made of, for example, a conductive material. The conductive material constituting each of the joints 53A to 53D is not particularly limited, but includes, for example, materials containing Ag, Cu, Au, and the like. Each of the joint portions 53A to 53D includes the same conductive material that constitutes each of the wiring portions 52A to 52H, 52J to 52N, and 52P to 52R. Note that each of the joint portions 53A to 53D may contain copper instead of silver, or may contain gold instead of silver or copper. Alternatively, each joint portion 53A to 53D may contain Ag-Pt or Ag-Pd. Further, the method of forming each of the joint parts 53A to 53D is not limited, and for example, similarly to each of the wiring parts 52A to 52H, 52J to 52N, and 52P to 52R, a paste containing these metals may be printed and then fired. It is formed. Note that the material of each joint 53A to 53D may not be electrically conductive. Furthermore, the wiring pattern 52 does not have to include each of the plurality of joints 53A to 53D.
 半導体装置A2において、複数のリード4A~4H,4J~4N,4P~4Rはそれぞれ、配線パターン52に接合されている。また。半導体装置A2は、半導体装置A1と比較して、リード4Zをさらに備えている。 In the semiconductor device A2, the plurality of leads 4A to 4H, 4J to 4N, and 4P to 4R are each connected to the wiring pattern 52. Also. Compared to the semiconductor device A1, the semiconductor device A2 further includes a lead 4Z.
 図15に示すように、複数のリード4A~4H,4J~4N,4P~4Rは、リード4Zに対して、x方向のx2側に配置されている。以下においては、リード4Aについて詳述するが、他のリード4B~4H,4J~4N,4P~4Rも同様の構成部位を含む。この場合、リード4Aの各構成部位の「A」を「B」~「H」,「J」~「N」,「P」~「R」にそれぞれ変えたものが、各リード4B~4H,4J~4N,4P~4Rの各構成部位となる。 As shown in FIG. 15, the plurality of leads 4A to 4H, 4J to 4N, and 4P to 4R are arranged on the x2 side in the x direction with respect to the lead 4Z. In the following, lead 4A will be described in detail, but other leads 4B to 4H, 4J to 4N, and 4P to 4R also include similar constituent parts. In this case, each component of lead 4A with "A" changed to "B" to "H", "J" to "N", "P" to "R", and each lead 4B to 4H, These are the constituent parts of 4J to 4N and 4P to 4R.
 リード4Aは、図15などに示すように、端子部42A、連結部44Aおよび接合部46Aを含む。半導体装置A2の端子部42Aは、半導体装置A1における端子部42Aと同様に構成される。連結部44Aは、端子部42Aと接合部46Aとを連結する。接合部46Aは、導電性接合材49を介して、配線部52Aにそれぞれ接合される。同様に、接合部46B(46C~46H,46J~46N,46P~46R)は、導電性接合材49を介して、配線部52B(52C~52H,52J~52N,52P~52R)にそれぞれ接合される。導電性接合材49は、たとえば、はんだ、金属ペースト材、焼結金属などである。図19に示すように、接合部46Cには、貫通孔461Cが形成されている。この構成と異なり、接合部46Cに貫通孔461Cが形成されていなくてもよい。また、他の接合部46A,46B,46D~46H,46J~46N,46P~46Rにも貫通孔が形成されているが、当該貫通孔が形成されていなくてもよい。 The lead 4A includes a terminal portion 42A, a connecting portion 44A, and a joining portion 46A, as shown in FIG. 15 and the like. The terminal portion 42A of the semiconductor device A2 is configured similarly to the terminal portion 42A of the semiconductor device A1. The connecting portion 44A connects the terminal portion 42A and the joint portion 46A. The bonding portions 46A are bonded to the wiring portions 52A via the conductive bonding material 49, respectively. Similarly, the bonding portions 46B (46C to 46H, 46J to 46N, 46P to 46R) are bonded to the wiring portions 52B (52C to 52H, 52J to 52N, 52P to 52R), respectively, via the conductive bonding material 49. Ru. The conductive bonding material 49 is, for example, solder, metal paste material, sintered metal, or the like. As shown in FIG. 19, a through hole 461C is formed in the joint portion 46C. Unlike this configuration, the through hole 461C does not need to be formed in the joint portion 46C. Further, although through holes are formed in the other joint portions 46A, 46B, 46D to 46H, 46J to 46N, and 46P to 46R, the through holes may not be formed.
 リード4Zは、リード4Aに対してx方向のx1側に配置されている。リード4Zは、複数の第1スイッチ部1、複数の第2スイッチ部2、第1制御素子8Aおよび第2制御素子8Bのいずれにも導通しない。リード4Zは、図15に示すように、パッド部43Zおよび突出部45Zを含む。パッド部43Zと突出部45Zとは、繋がっている。 The lead 4Z is arranged on the x1 side in the x direction with respect to the lead 4A. The lead 4Z is not electrically connected to any of the plurality of first switch sections 1, the plurality of second switch sections 2, the first control element 8A, and the second control element 8B. The lead 4Z includes a pad portion 43Z and a protruding portion 45Z, as shown in FIG. 15. The pad portion 43Z and the protruding portion 45Z are connected.
 パッド部43Zは、封止部材7に覆われている。パッド部43Zは、図15に示すように、平面視において、支持基板51に重ならない。突出部45Zは、図15に示すように、パッド部43Zからy方向のy1側に延びており、封止部材7から突出している。 The pad portion 43Z is covered with the sealing member 7. As shown in FIG. 15, the pad portion 43Z does not overlap the support substrate 51 in plan view. The protruding portion 45Z extends from the pad portion 43Z toward the y1 side in the y direction, and protrudes from the sealing member 7, as shown in FIG.
 本実施形態にかかる半導体装置A2においても、半導体装置A1と同様の作用および効果を奏することができる。たとえば、半導体装置A2は、半導体装置A1と同様に、複数のスイッチング素子(スイッチング素子11とスイッチング素子12と)を1つの第1スイッチ部1として動作させる構成において、より好ましい構造となる。 The semiconductor device A2 according to this embodiment can also have the same functions and effects as the semiconductor device A1. For example, like the semiconductor device A1, the semiconductor device A2 has a more preferable structure in which a plurality of switching elements (switching element 11 and switching element 12) are operated as one first switch section 1.
 半導体装置A2は、支持基板51と第1面511上に形成された配線パターン52とを備える。配線パターン52は、複数の配線部52A~52H,52J~52N,52P~52Rを含み、複数の配線部52A~52H,52J~52N,52P~52Rは、第1制御素子8Aおよび第2制御素子8Bが、複数の第1スイッチ部1および複数の第2スイッチ部2を制御するための制御信号(たとえば上記第1入力信号および上記第2入力信号など)を伝送しており、当該制御信号の伝達経路を構成する。複数の配線部52A~52H,52J~52N,52P~52Rは、たとえばAgを含むペーストを印刷した後に、焼成することによって形成される。この構成によると、たとえば金属製のリードフレームによって制御信号の伝達経路を構成する場合と比べて、当該伝達経路の細線化や高密度化を図ることが可能である。したがって、半導体装置A2は、高集積化が可能となる。 The semiconductor device A2 includes a support substrate 51 and a wiring pattern 52 formed on the first surface 511. The wiring pattern 52 includes a plurality of wiring parts 52A to 52H, 52J to 52N, 52P to 52R, and the plurality of wiring parts 52A to 52H, 52J to 52N, 52P to 52R are connected to the first control element 8A and the second control element. 8B transmits a control signal (for example, the above-mentioned first input signal and the above-mentioned second input signal) for controlling the plurality of first switch sections 1 and the plurality of second switch sections 2, and the control signal of the control signal is Configure the transmission path. The plurality of wiring parts 52A to 52H, 52J to 52N, and 52P to 52R are formed by, for example, printing a paste containing Ag and then firing it. According to this configuration, it is possible to make the transmission path thinner and higher in density than, for example, when the transmission path of the control signal is configured using a metal lead frame. Therefore, the semiconductor device A2 can be highly integrated.
 図20は、第2実施形態の変形例にかかる半導体装置A21を示している。図20は、半導体装置A21を示す断面図であって、図19に示す断面に対応する。半導体装置A21の第2制御素子8Bのz方向の寸法は、半導体装置A2の第2制御素子8Bのz方向の寸法よりも大きい。なお、図20では、第2制御素子8Bと第5アーム2B(スイッチング素子21B、スイッチング素子22Bおよび保護素子23Bの各々)との関係を示しているが、第2制御素子8Bと第4アーム2Aと、第2制御素子8Bと第6アーム2Cとの各関係も同様であってもよい。また、第1制御素子8Aと各第1スイッチ部1(第1アーム1A、第2アーム1Bおよび第3アーム1Cの各々)との関係も同様であってもよい。 FIG. 20 shows a semiconductor device A21 according to a modification of the second embodiment. FIG. 20 is a cross-sectional view showing the semiconductor device A21, and corresponds to the cross-section shown in FIG. 19. The dimension in the z direction of the second control element 8B of the semiconductor device A21 is larger than the dimension in the z direction of the second control element 8B of the semiconductor device A2. Note that although FIG. 20 shows the relationship between the second control element 8B and the fifth arm 2B (switching element 21B, switching element 22B, and protection element 23B), the relationship between the second control element 8B and the fourth arm 2A The relationships between the second control element 8B and the sixth arm 2C may also be the same. Further, the relationship between the first control element 8A and each first switch section 1 (each of the first arm 1A, second arm 1B, and third arm 1C) may be the same.
 半導体装置A21では、図20に示すように、搭載部312Aの上面(スイッチング素子21B、スイッチング素子22Bおよび保護素子23Bの各々が接合される面)と、パッド部521Hの上面(第2制御素子8Bが接合される面)とで、z方向の高さに違いがある。このため、第2制御素子8Bの厚さが、スイッチング素子21B、スイッチング素子22Bおよび保護素子23Bの各厚さよりも大きくても、スイッチング素子21Bの素子主面21a、スイッチング素子22Bの素子主面22aおよび保護素子23Bの素子主面23aと、第2制御素子8Bの上面(z方向のz1側を向く面)とが、同じ(あるいは略同じ)高さである。 In the semiconductor device A21, as shown in FIG. There is a difference in height in the z direction between Therefore, even if the thickness of the second control element 8B is larger than each thickness of the switching element 21B, the switching element 22B, and the protection element 23B, the element main surface 21a of the switching element 21B and the element main surface 22a of the switching element 22B The element main surface 23a of the protection element 23B and the upper surface (the surface facing the z1 side in the z direction) of the second control element 8B are at the same (or substantially the same) height.
 半導体装置A21においても、半導体装置A2と同様の作用および効果を奏する。また、半導体装置A21では、各第2スイッチ部2におけるスイッチング素子21の素子主面21a、スイッチング素子22の素子主面22aおよび保護素子23の素子主面23aと、第2制御素子8Bの上面(z方向のz1側を向く面)とが、同じ(あるいは略同じ)高さであることにより、各ワイヤ61Q,62Q,6J,6Kの接合が容易となる。 The semiconductor device A21 also has the same functions and effects as the semiconductor device A2. In the semiconductor device A21, the element main surface 21a of the switching element 21, the element main surface 22a of the switching element 22, the element main surface 23a of the protection element 23, and the upper surface of the second control element 8B ( Since the wires 61Q, 62Q, 6J, and 6K are at the same (or substantially the same) height, the wires 61Q, 62Q, 6J, and 6K can be easily joined.
 なお、半導体装置A21では、スイッチング素子21B、スイッチング素子22Bおよび保護素子23Bの各厚さが同じ(あるいは略同じ)である例を示したが、これらが異なる種類であれば、各々の厚さが異なることがある。このような場合、たとえば、リード3A(搭載部312A)の厚さを部分的に変えれば、スイッチング素子21Bの素子主面21a、スイッチング素子22Bの素子主面22aおよび保護素子23Bの素子主面23aの高さを揃えることが可能である。 Note that in the semiconductor device A21, an example has been shown in which the switching element 21B, the switching element 22B, and the protection element 23B have the same (or approximately the same) thickness, but if these are different types, the thickness of each may be different. There are different things. In such a case, for example, if the thickness of the lead 3A (mounting portion 312A) is partially changed, the element main surface 21a of the switching element 21B, the element main surface 22a of the switching element 22B, and the element main surface 23a of the protection element 23B can be changed. It is possible to make the heights the same.
 本変形例から理解されるように、本開示の半導体装置において、スイッチング素子21、スイッチング素子22および保護素子23の各厚さ、および、第2制御素子8Bの各厚さが、それぞれ異なっていてもよい。この場合、リード3Aおよび配線部52Hの厚さまたは位置を調整すれば、スイッチング素子21の素子主面21a、スイッチング素子22の素子主面22aおよび保護素子23の素子主面23aと、第2制御素子8Bの上面(z方向のz1側を向く面)とを、同じ(あるいは略同じ)高さにすることが可能である。 As understood from this modification, in the semiconductor device of the present disclosure, each thickness of the switching element 21, the switching element 22, and the protection element 23, and each thickness of the second control element 8B are different from each other. Good too. In this case, by adjusting the thickness or position of the lead 3A and the wiring portion 52H, the element main surface 21a of the switching element 21, the element main surface 22a of the switching element 22, the element main surface 23a of the protection element 23, and the second control It is possible to make the upper surface of the element 8B (the surface facing the z1 side in the z direction) the same (or substantially the same) height.
 図21および図22は、第3実施形態にかかる半導体装置A3を示している。半導体装置A3は、半導体装置A2と比較して、次の点で異なる。すなわち、図21および図22に示すように、各スイッチング素子11の平面視サイズおよび各スイッチング素子21の平面視サイズがそれぞれ大きい。 21 and 22 show a semiconductor device A3 according to the third embodiment. The semiconductor device A3 differs from the semiconductor device A2 in the following points. That is, as shown in FIGS. 21 and 22, the size of each switching element 11 in plan view and the size of each switching element 21 in plan view are each large.
 上述の通り、各スイッチング素子11は、半導体材料としてSiを含み、各スイッチング素子12は、半導体材料としてSiCを含む。この構成においては、各スイッチング素子11と各スイッチング素子12の平面視サイズが同じ(あるいは略同じ)場合、スイッチング素子11のオン抵抗が、スイッチング素子12のオン抵抗よりも大きくなることがある。そこで、半導体装置A3では、図21に示すように、スイッチング素子11の平面視サイズを、半導体装置A1のスイッチング素子11の平面視サイズよりも、大きくしている。このようにスイッチング素子11の平面視サイズが大きいことにより、スイッチング素子11のオン抵抗が小さくなり、当該オン抵抗がスイッチング素子12のオン抵抗に近い特性値となる。なお、図21に示す例では、スイッチング素子11のx方向寸法がスイッチング素子12のx方向寸法と同じ(あるいは略同じ)まま、スイッチング素子11のy方向の寸法がスイッチング素子12のy方向寸法よりも大きい。このようにスイッチング素子11の平面視サイズを拡大すれば、各搭載部31B,31C,31Dに無駄なスペースが生じることを抑制できる。 As described above, each switching element 11 contains Si as a semiconductor material, and each switching element 12 contains SiC as a semiconductor material. In this configuration, when each switching element 11 and each switching element 12 have the same (or substantially the same) size in plan view, the on-resistance of the switching element 11 may be larger than the on-resistance of the switching element 12. Therefore, in the semiconductor device A3, as shown in FIG. 21, the planar view size of the switching element 11 is made larger than the planar view size of the switching element 11 of the semiconductor device A1. Due to the large size of the switching element 11 in plan view, the on-resistance of the switching element 11 becomes small, and the on-resistance has a characteristic value close to the on-resistance of the switching element 12. In the example shown in FIG. 21, the x-direction dimension of the switching element 11 remains the same (or approximately the same) as the x-direction dimension of the switching element 12, and the y-direction dimension of the switching element 11 is larger than the y-direction dimension of the switching element 12. It's also big. By enlarging the size of the switching element 11 in plan view in this manner, it is possible to suppress the generation of wasted space in each of the mounting portions 31B, 31C, and 31D.
 同様に、各スイッチング素子21は、半導体材料としてSiを含み、各スイッチング素子22は、半導体材料としてSiCを含む。この構成においては、各スイッチング素子21と各スイッチング素子22との平面視サイズが同じ(あるいは略同じ)場合、スイッチング素子21のオン抵抗が、スイッチング素子22のオン抵抗よりも大きくなることがある。そこで、半導体装置A3では、図22に示すように、スイッチング素子21の平面視サイズを、半導体装置A1のスイッチング素子21の平面視サイズよりも、大きくしている。このようにスイッチング素子21の平面視サイズが大きいことにより、スイッチング素子21のオン抵抗が小さくなり、当該オン抵抗がスイッチング素子22のオン抵抗に近い特性値となる。なお、図22に示す例では、スイッチング素子21のx方向寸法がスイッチング素子22のx方向寸法と同じ(あるいは略同じ)まま、スイッチング素子21のy方向の寸法がスイッチング素子22のy方向寸法よりも大きい。このようにスイッチング素子21の平面視サイズを拡大すれば、各搭載部311A,312A,313Aに無駄なスペースが生じることを抑制できる。 Similarly, each switching element 21 contains Si as a semiconductor material, and each switching element 22 contains SiC as a semiconductor material. In this configuration, when each switching element 21 and each switching element 22 have the same (or substantially the same) size in plan view, the on-resistance of the switching element 21 may be larger than the on-resistance of the switching element 22. Therefore, in the semiconductor device A3, as shown in FIG. 22, the planar view size of the switching element 21 is made larger than the planar view size of the switching element 21 of the semiconductor device A1. Since the size of the switching element 21 in plan view is large in this way, the on-resistance of the switching element 21 becomes small, and the on-resistance has a characteristic value close to the on-resistance of the switching element 22. In the example shown in FIG. 22, the x-direction dimension of the switching element 21 remains the same (or approximately the same) as the x-direction dimension of the switching element 22, and the y-direction dimension of the switching element 21 is larger than the y-direction dimension of the switching element 22. It's also big. By enlarging the size of the switching element 21 in plan view in this manner, it is possible to suppress the generation of wasted space in each of the mounting portions 311A, 312A, and 313A.
 本実施形態にかかる半導体装置A3においても、半導体装置A1と同様の作用および効果を奏する。また、本実施形態から理解されるように、本開示の半導体装置は、スイッチング素子11およびスイッチング素子12の各平面視サイズが同じ(あるいは略同じ)である構成に限定されず、これらの各平面視サイズが異なる構成も含む。このことは、スイッチング素子21およびスイッチング素子22においても同様である。 The semiconductor device A3 according to the present embodiment also has the same functions and effects as the semiconductor device A1. Further, as understood from the present embodiment, the semiconductor device of the present disclosure is not limited to a configuration in which the switching element 11 and the switching element 12 have the same (or substantially the same) size in plan view; Also includes configurations with different visual sizes. This also applies to switching element 21 and switching element 22.
 図23は、第2実施形態の変形例にかかる半導体装置A31を示している。半導体装置A31は、半導体装置A3と比較して、次の点で異なる。すなわち、各第1スイッチ部1(第1アーム1A、第2アーム1Bおよび第3アーム1Cの各々)において、スイッチング素子11が、スイッチング素子12よりもy方向のy1側に配置されている。つまり、スイッチング素子11は、y方向において、第1制御素子8Aとスイッチング素子12との間に位置する。本変形例では、スイッチング素子11が、特許請求の範囲に記載の「第2スイッチング素子」の一例であり、スイッチング素子12が、特許請求の範囲に記載の「第1スイッチング素子」の一例である。 FIG. 23 shows a semiconductor device A31 according to a modification of the second embodiment. The semiconductor device A31 differs from the semiconductor device A3 in the following points. That is, in each of the first switch sections 1 (each of the first arm 1A, second arm 1B, and third arm 1C), the switching element 11 is arranged closer to the y1 side than the switching element 12 in the y direction. That is, the switching element 11 is located between the first control element 8A and the switching element 12 in the y direction. In this modification, the switching element 11 is an example of a "second switching element" as set forth in the claims, and the switching element 12 is an example of a "first switching element" as set forth in the claims. .
 半導体装置A31では、各スイッチング素子12は、主面配線部125を有していない。一方で、各スイッチング素子11は、主面配線部115を有する。主面配線部115は、電極113と同様に、素子主面11aに設けられる。主面配線部115は、スイッチング素子11のスイッチング機能部に非導通である。主面配線部115は、スイッチング素子12における主面配線部125と同様に構成される。 In the semiconductor device A31, each switching element 12 does not have the main surface wiring section 125. On the other hand, each switching element 11 has a main surface wiring section 115. Like the electrode 113, the main surface wiring section 115 is provided on the element main surface 11a. The main surface wiring section 115 is not electrically connected to the switching function section of the switching element 11 . The main surface wiring section 115 is configured similarly to the main surface wiring section 125 in the switching element 12 .
 半導体装置A31では、複数の接続部材6は、2つのワイヤ61G,62Gの代わりに、ワイヤ6Gを含み、ワイヤ6Hの代わりに、2つのワイヤ61H,62Hを含む。図23に示すように、ワイヤ6Gは、第1制御素子8Aの電極81とスイッチング素子11の電極113とに接合され、これらを導通させる。ワイヤ61Hは、第1制御素子8Aの電極81とスイッチング素子11の主面配線部115とに接合され、これらを導通させる。ワイヤ62Hは、スイッチング素子11の主面配線部115とスイッチング素子12の電極123とに接合され、これらを導通させる。 In the semiconductor device A31, the plurality of connection members 6 include a wire 6G instead of the two wires 61G and 62G, and include two wires 61H and 62H instead of the wire 6H. As shown in FIG. 23, the wire 6G is connected to the electrode 81 of the first control element 8A and the electrode 113 of the switching element 11, making them conductive. The wire 61H is joined to the electrode 81 of the first control element 8A and the main surface wiring portion 115 of the switching element 11, thereby making them conductive. The wire 62H is connected to the main surface wiring portion 115 of the switching element 11 and the electrode 123 of the switching element 12, thereby making them conductive.
 半導体装置A31においても、半導体装置A3と同様の作用および効果を奏する。また、半導体装置A31は、半導体装置A3と比較して、各ワイヤ6D,6E,6Fを短くできる。 The semiconductor device A31 also has the same functions and effects as the semiconductor device A3. Further, in the semiconductor device A31, each of the wires 6D, 6E, and 6F can be made shorter than in the semiconductor device A3.
 なお、上記半導体装置A31では、半導体装置A3と比較して、各第1スイッチ部1において、スイッチング素子11とスイッチング素子12との位置関係を反対にした構成について説明したが、これの代わりに、あるいは、これに加えて、各第2スイッチ部2(第4アーム2A、第5アーム2Bおよび第6アーム2Cの各々)におけるスイッチング素子21およびスイッチング素子22においても同様に構成してもよい。この場合、各ワイヤ6A,6B,6Cを短くできる。 Note that, in the semiconductor device A31, a configuration has been described in which the positional relationship between the switching element 11 and the switching element 12 is reversed in each first switch section 1 compared to the semiconductor device A3, but instead of this, Alternatively, in addition to this, the switching element 21 and the switching element 22 in each second switch section 2 (fourth arm 2A, fifth arm 2B, and sixth arm 2C) may also be configured in the same manner. In this case, each wire 6A, 6B, 6C can be shortened.
 図24~図27は、第4実施形態にかかる半導体装置A4を示している。半導体装置A4は、半導体装置A1と比較して、次の点で異なる。すなわち、図24、図25および図27に示すように、各第1スイッチ部1は、保護素子13を有していない。また、図24、図26および図27に示すように、各第2スイッチ部2は、保護素子23を有していない。 24 to 27 show a semiconductor device A4 according to the fourth embodiment. The semiconductor device A4 differs from the semiconductor device A1 in the following points. That is, as shown in FIGS. 24, 25, and 27, each first switch section 1 does not have the protection element 13. Further, as shown in FIGS. 24, 26, and 27, each second switch section 2 does not have the protection element 23.
 各第1スイッチ部1のスイッチング素子11は、逆導通IGBTであり、図27に示すように、スイッチング機能部とダイオード機能部を含む。スイッチング機能部はIGBTとして動作し、ダイオード機能部は還流ダイオードとして動作する。すなわち、本実施形態の各スイッチング素子11は、ダイオード機能部(還流ダイオード)を内蔵する。たとえば、各スイッチング素子11は、半導体装置A1のスイッチング素子11と保護素子13とが1チップ化されたものであり、ダイオード機能部(還流ダイオード)を内蔵する。図27に示すように、各スイッチング素子11において、スイッチング機能部とダイオード機能部とは、電気的に逆並列接続の関係にある。 The switching element 11 of each first switch section 1 is a reverse conduction IGBT, and as shown in FIG. 27, includes a switching function section and a diode function section. The switching function section operates as an IGBT, and the diode function section operates as a freewheeling diode. That is, each switching element 11 of this embodiment includes a diode function section (freewheeling diode). For example, each switching element 11 is formed by combining the switching element 11 and the protection element 13 of the semiconductor device A1 into one chip, and includes a diode function section (freewheeling diode). As shown in FIG. 27, in each switching element 11, the switching function section and the diode function section are electrically connected in antiparallel relationship.
 同様に、各第2スイッチ部2のスイッチング素子21は、逆導通IGBTであり、図27に示すように、スイッチング機能部とダイオード機能部を含む。スイッチング機能部はIGBTとして動作し、ダイオード機能部は還流ダイオードとして動作する。すなわち、本実施形態の各スイッチング素子21は、ダイオード機能部(還流ダイオード)を内蔵する。たとえば、各スイッチング素子21は、半導体装置A1のスイッチング素子21と保護素子23とが1チップ化されたものである。図27に示すように、各スイッチング素子21において、スイッチング機能部とダイオード機能部とは、電気的に逆並列接続の関係にある。 Similarly, the switching element 21 of each second switch section 2 is a reverse conduction IGBT, and includes a switching function section and a diode function section, as shown in FIG. 27. The switching function section operates as an IGBT, and the diode function section operates as a freewheeling diode. That is, each switching element 21 of this embodiment includes a diode function section (freewheeling diode). For example, each switching element 21 is a single chip of the switching element 21 and the protection element 23 of the semiconductor device A1. As shown in FIG. 27, in each switching element 21, the switching function section and the diode function section are electrically connected in antiparallel relationship.
 本実施形態にかかる半導体装置A4においても、半導体装置A1と同様の作用および効果を奏する。たとえば、半導体装置A4は、半導体装置A1と同様に、複数のスイッチング素子(スイッチング素子11とスイッチング素子12と)を1つの第1スイッチ部1として動作させる構成において、より好ましい構造となる。 The semiconductor device A4 according to this embodiment also has the same functions and effects as the semiconductor device A1. For example, like the semiconductor device A1, the semiconductor device A4 has a more preferable structure in which a plurality of switching elements (switching element 11 and switching element 12) are operated as one first switch unit 1.
 図28~図34は、主面配線部125(スイッチング素子12)の他の構成例を示している。図28~図34は、各変形例にかかる主面配線部125(スイッチング素子12)を示す要部拡大平面図である。図28~図34では、半導体装置A1において、スイッチング素子12の構成を変更した例を示すが、他の半導体装置A2,A3,A4においても、同様に構成することが可能である。また、図28~図34では、スイッチング素子12の主面配線部125の他の構成例を示すが、スイッチング素子22の主面配線部225も同様に構成することが可能である。 28 to 34 show other configuration examples of the main surface wiring section 125 (switching element 12). FIGS. 28 to 34 are enlarged plan views of main parts showing the main surface wiring section 125 (switching element 12) according to each modification. Although FIGS. 28 to 34 show examples in which the configuration of the switching element 12 is changed in the semiconductor device A1, the same configuration can be applied to the other semiconductor devices A2, A3, and A4. Further, although FIGS. 28 to 34 show other configuration examples of the main surface wiring section 125 of the switching element 12, the main surface wiring section 225 of the switching element 22 can also be configured in a similar manner.
 図28に示す例では、連結部125cのx方向の寸法が、第1パッド部125aおよび第2パッド部125bのx方向の各寸法よりも小さい。この構成により、図28に示すように、主面配線部125は、平面視においてダンベル形状をなす。図28に示す主面配線部125は、半導体装置A1における主面配線部125と比較して、平面視面積が小さくなるので、スイッチング素子12の製造コストを低減できる。 In the example shown in FIG. 28, the dimension of the connecting portion 125c in the x direction is smaller than the dimensions of the first pad portion 125a and the second pad portion 125b in the x direction. With this configuration, as shown in FIG. 28, the main surface wiring portion 125 has a dumbbell shape in plan view. The main surface wiring section 125 shown in FIG. 28 has a smaller planar area compared to the main surface wiring section 125 in the semiconductor device A1, so that the manufacturing cost of the switching element 12 can be reduced.
 図29に示す例では、第2パッド部125bは、第1パッド部125aに対して、x方向のx1側に位置し、且つ、y方向のy2側に位置する。図29に示す例では、主面配線部125は、平面視において、第1パッド部125aと第2パッド部125bとを、四隅のうちの対角に位置する2つの角とする矩形状である。図29に示す主面配線部125では、半導体装置A1における主面配線部125と比較して、平面視面積が拡大されるので、各ワイヤ61G,62Gの接合位置の自由度が高くなる。 In the example shown in FIG. 29, the second pad portion 125b is located on the x1 side in the x direction and on the y2 side in the y direction with respect to the first pad portion 125a. In the example shown in FIG. 29, the main surface wiring section 125 has a rectangular shape in which the first pad section 125a and the second pad section 125b are two diagonally located corners among the four corners when viewed from above. . In the main surface wiring section 125 shown in FIG. 29, the planar area is enlarged compared to the main surface wiring section 125 in the semiconductor device A1, so that the degree of freedom in the bonding position of each wire 61G, 62G is increased.
 図30に示す例では、主面配線部125は、平面視において、素子主面12aの周縁の一部に沿って配置されており、x方向のx2側の端縁に沿う帯状である。本開示において、周縁は、対象の外周(たとえば素子主面12aの平面視における外周)全体のことであり、端縁は、対象の外周(たとえば素子主面12aの平面視における外周)のいずれかの辺のことである。当該主面配線部125では、半導体装置A1における主面配線部125よりも、連結部125cのy方向寸法が大きい。図示された例では、主面配線部125は、素子主面12aにおいて、y方向の中央を挟んで両側に跨っている。また、主面配線部125のy方向の両側には、電極122が配置されていない。図30に示す構成では、主面配線部125は、素子主面12aのy方向の中央よりもy方向のy2側にも形成されている。このため、図30に示す構成は、半導体装置A1と比較して、ワイヤ62Gをさらに短くできる。また、図30に示す構成では、主面配線部125は、素子主面12aのx方向のx2側の端縁に沿って形成されているので、電極122の平面視面積を適度に確保できる。つまり、図30に示す構成では、主面配線部125が、ワイヤ6E(6D,6F)を接合する際の障害にならない。 In the example shown in FIG. 30, the main surface wiring section 125 is arranged along a part of the periphery of the element main surface 12a in plan view, and has a band shape along the edge on the x2 side in the x direction. In the present disclosure, the periphery refers to the entire outer periphery of the object (for example, the outer periphery of the element main surface 12a in a plan view), and the edge refers to any part of the outer periphery of the object (for example, the outer periphery of the element main surface 12a in a plan view). It's about the area. In the main surface interconnection section 125, the connecting section 125c has a larger dimension in the y direction than the main surface interconnection section 125 in the semiconductor device A1. In the illustrated example, the main surface wiring section 125 straddles both sides of the element main surface 12a with the center in the y direction interposed therebetween. Further, the electrodes 122 are not arranged on both sides of the main surface wiring section 125 in the y direction. In the configuration shown in FIG. 30, the main surface wiring section 125 is also formed on the y2 side in the y direction of the element main surface 12a from the center in the y direction. Therefore, in the configuration shown in FIG. 30, the wire 62G can be further shortened compared to the semiconductor device A1. Further, in the configuration shown in FIG. 30, the main surface wiring section 125 is formed along the edge of the element main surface 12a on the x2 side in the x direction, so that an appropriate area of the electrode 122 in plan view can be secured. That is, in the configuration shown in FIG. 30, the main surface wiring portion 125 does not become an obstacle when joining the wires 6E (6D, 6F).
 図31および図32に示す例は、図30に示す例に対して、電極123の位置を変更したものである。図30に示す例では、電極123は、素子主面12aをx方向に三等分したうちのx方向のx2側に配置されていた。一方、図31に示す例では、電極123は、素子主面12aをx方向に三等分したうちの中央部に配置されており、図32に示す例では、電極123は、素子主面12aをx方向に三等分したうちのx方向のx1側に配置されている。これらの構成であっても、図30に示す構成と同じ効果を奏する。また、図31および図32に示す構成では、図30に示す構成と比較して、主面配線部125と電極123との距離を大きくできる。これにより、主面配線部125に接合されるワイヤ61Gと、電極123に接合されるワイヤ6Hとが、意図せず短絡してしまうことを抑制できる。 In the example shown in FIGS. 31 and 32, the position of the electrode 123 is changed from the example shown in FIG. 30. In the example shown in FIG. 30, the electrode 123 is arranged on the x2 side in the x direction of the device main surface 12a divided into three equal parts in the x direction. On the other hand, in the example shown in FIG. 31, the electrode 123 is arranged at the center of the element main surface 12a divided into three equal parts in the x direction, and in the example shown in FIG. is placed on the x1 side of the x-direction, which is divided into three equal parts in the x-direction. Even with these configurations, the same effects as the configuration shown in FIG. 30 can be achieved. Furthermore, in the configurations shown in FIGS. 31 and 32, the distance between the main surface wiring portion 125 and the electrode 123 can be increased compared to the configuration shown in FIG. 30. Thereby, the wire 61G joined to the main surface wiring part 125 and the wire 6H joined to the electrode 123 can be prevented from being unintentionally short-circuited.
 図33に示す例では、主面配線部125は、素子主面12aをx方向に三等分したうちの中央部に配置されている。本変形例から理解されるように、本開示の半導体装置において、主面配線部125の位置は、第1制御素子8Aおよびスイッチング素子11との位置関係に応じて、適宜変更可能である。 In the example shown in FIG. 33, the main surface wiring section 125 is arranged at the center of the element main surface 12a divided into three equal parts in the x direction. As understood from this modification, in the semiconductor device of the present disclosure, the position of the main surface wiring section 125 can be changed as appropriate depending on the positional relationship with the first control element 8A and the switching element 11.
 図34に示す例では、主面配線部125は、平面視において、素子主面12aの周縁の一部に沿って配置されている。図34に示す例では、主面配線部125は、第1帯状部1251および第2帯状部1252を含む。第1帯状部1251および第2帯状部1252は、一体的に形成されている。第1帯状部1251は、平面視において、素子主面12aのx方向のx2側の端縁に沿って延びる。第1パッド部125aは、第1帯状部1251の一部である。第2帯状部1252は、平面視において、素子主面12aのy方向のy2側の端縁に沿って延びる。第2パッド部125bは、第2帯状部1252の一部である。 In the example shown in FIG. 34, the main surface wiring section 125 is arranged along a part of the periphery of the element main surface 12a in plan view. In the example shown in FIG. 34, the main surface wiring section 125 includes a first strip section 1251 and a second strip section 1252. The first strip portion 1251 and the second strip portion 1252 are integrally formed. The first strip portion 1251 extends along the edge of the element main surface 12a on the x2 side in the x direction in plan view. The first pad portion 125a is a part of the first strip portion 1251. The second strip portion 1252 extends along the edge of the element main surface 12a on the y2 side in the y direction in plan view. The second pad portion 125b is a part of the second strip portion 1252.
 上記した各実施形態および各変形例において、各搭載部311A,312A,313A,31B,31C,31Dのうちの、複数のスイッチング素子11、複数のスイッチング素子12、複数の保護素子13、複数のスイッチング素子21、複数のスイッチング素子22および複数の保護素子23のいずれも搭載されない余剰部分をさらに削減してもよい。このように、余剰部分を削減することは、半導体装置の平面視サイズを縮小化する上で好ましい。 In each of the embodiments and modifications described above, a plurality of switching elements 11, a plurality of switching elements 12, a plurality of protection elements 13, a plurality of switching The surplus portion in which none of the element 21, the plurality of switching elements 22, and the plurality of protection elements 23 are mounted may be further reduced. Reducing the surplus portion in this way is preferable in reducing the planar view size of the semiconductor device.
 本開示にかかる半導体装置は、上記した実施形態に限定されるものではない。本開示の半導体装置の各部の具体的な構成は、種々に設計変更自在である。たとえば、本開示の半導体装置は、以下の付記に関する実施形態を含む。
 付記1.
 各々が第1スイッチング素子および第2スイッチング素子を含む少なくとも1つの第1スイッチ部と、
 前記第1スイッチング素子および前記第2スイッチング素子に第1駆動信号を入力する第1制御素子と、
 前記第1スイッチング素子および前記第2スイッチング素子が搭載される搭載部と、
 第1ワイヤ、第2ワイヤおよび第3ワイヤを含む複数のワイヤと、
を備え、
 前記少なくとも1つの第1スイッチ部の各々において、前記第1スイッチング素子と前記第2スイッチング素子とが電気的に並列に接続され、
 前記第1スイッチング素子は、前記搭載部の厚さ方向の一方を向く第1主面と、前記第1主面に配置された第1制御電極とを有し、
 前記第2スイッチング素子は、前記厚さ方向の一方を向く第2主面と、前記第2主面に配置された第2制御電極および主面配線部とを有し、
 前記第1ワイヤは、前記第1制御素子と、前記主面配線部とに接合され、
 前記第2ワイヤは、前記主面配線部と、前記第1制御電極とに接合され、
 前記第3ワイヤは、前記第1制御素子と、前記第2制御電極とに接合され、
 前記第1制御素子は、前記第1スイッチング素子および前記第2スイッチング素子よりも、前記厚さ方向に直交する第1方向の一方側に配置され、
 前記第2スイッチング素子は、前記第1方向において、前記第1制御素子と前記第1スイッチング素子との間に配置される、半導体装置。
 付記2.
 前記主面配線部は、前記第1ワイヤが接合される第1パッド部と前記第2ワイヤが接合される第2パッド部とを含む、付記1に記載の半導体装置。
 付記3.
 前記第1パッド部と前記第2パッド部とは、前記厚さ方向に見て、前記第1方向に沿って配置され、
 前記第1パッド部は、前記第1方向において、前記第2パッド部よりも前記第1制御素子の近くに位置する、付記2に記載の半導体装置。
 付記4.
 前記主面配線部は、前記第1パッド部と前記第2パッド部とを繋ぐ連結部を含む、付記3に記載の半導体装置。
 付記5.
 前記連結部の前記厚さ方向および前記第1方向に直交する第2方向の寸法が、前記第1パッド部および前記第2パッド部の各々の前記第2方向の寸法と同じである、付記4に記載の半導体装置。
 付記6.
 前記連結部の前記厚さ方向および前記第1方向に直交する第2方向の寸法が、前記第1パッド部および前記第2パッド部の各々の前記第2方向の寸法よりも小さい、付記4に記載の半導体装置。
 付記7.
 前記第2パッド部は、前記第1パッド部に対して、前記第1方向の一方側に位置し、かつ、前記厚さ方向および前記第1方向に直交する第2方向の他方側に位置する、付記2に記載の半導体装置。
 付記8.
 前記第2制御電極は、前記第1方向において、前記第2主面の前記第1方向の中央よりも前記第1制御素子の近くに位置する、
付記1ないし付記7のいずれかに記載の半導体装置。
 付記9.
 前記第2主面において、前記第2制御電極および前記主面配線部の各々は、前記厚さ方向および前記第1方向に直交する第2方向における中央部に配置される、付記8に記載の半導体装置。
 付記10.
 前記主面配線部は、前記厚さ方向に見た前記第2主面の周縁の一部に沿って配置される、付記8に記載の半導体装置。
 付記11.
 前記主面配線部は、前記厚さ方向に見て、前記第2主面の前記第2方向の一方側の端縁に沿う帯状である、付記10に記載の半導体装置。
 付記12.
 前記主面配線部は、前記厚さ方向に見て、前記第2主面の前記第2方向の一方側の端縁に沿う第1帯状部と、前記厚さ方向に見て、前記第2主面の前記第1方向の他方側の端縁に沿う第2帯状部と、を含み、
 前記第1帯状部と前記第2帯状部とは、一体的に形成されている、付記10に記載の半導体装置。
 付記13.
 前記少なくとも1つの第1スイッチ部は、複数の第1スイッチ部を含み、
 前記複数の第1スイッチ部は、各々が第1スイッチング素子および第2スイッチング素子を有する第1アーム、第2アームおよび第3アームを含む、付記1ないし付記12のいずれかに記載の半導体装置。
 付記14.
 前記第1アーム、前記第2アームおよび前記第3アームは、前記厚さ方向および前記第1方向に直交する第2方向に配列され、
 前記第2アームは、前記第2方向において、前記第1アームと前記第3アームとの間に位置する、付記13に記載の半導体装置。
 付記15.
 各々が第3スイッチング素子および第4スイッチング素子を含む少なくとも1つの第2スイッチ部と、
 前記少なくとも1つの第2スイッチ部の各々の前記第3スイッチング素子および前記第4スイッチング素子に第2駆動信号を入力する第2制御素子と、
をさらに備え、
 前記少なくとも1つの第2スイッチ部の各々において、前記第3スイッチング素子と前記第4スイッチング素子とが電気的に並列に接続され、
 前記第3スイッチング素子は、前記厚さ方向の一方を向く第3主面と、前記第3主面に配置された第3制御電極とを有し、
 前記第4スイッチング素子は、前記厚さ方向の一方を向く第4主面と、前記第4主面に配置された第4制御電極および第2主面配線部とを有し、
 前記複数のワイヤは、第4ワイヤ、第5ワイヤおよび第6ワイヤを含み、
 前記第4ワイヤは、前記第2制御素子と、前記第2主面配線部とに接合され、
 前記第5ワイヤは、前記第2主面配線部と、前記第3制御電極とに接合され、
 前記第6ワイヤは、前記第2制御素子と、前記第4制御電極とに接合され、
 前記第2制御素子は、前記第3スイッチング素子および前記第4スイッチング素子よりも、前記第1方向の一方側に配置され、
 前記第4スイッチング素子は、前記第1方向において、前記第2制御素子と前記第3スイッチング素子との間に配置される、付記13または付記14に記載の半導体装置。
 付記16.
 前記少なくとも1つの第2スイッチ部は、複数の第2スイッチ部を含み、
 前記複数の第2スイッチ部は、第4アーム、第5アームおよび第6アームを含み、
 前記第4アーム、前記第5アームおよび前記第6アームは、前記厚さ方向および前記第1方向に直交する第2方向に配列され、
 前記第5アームは、前記第2方向において、前記第4アームと前記第6アームとの間に位置する、付記15に記載の半導体装置。
 付記17.
 前記第1アームを下アーム、前記第4アームを上アームとして、前記第1アームと前記第4アームとが電気的に直列に接続されて、三相交流回路の第1相を構成し、
 前記第2アームを下アーム、前記第5アームを上アームとして、前記第2アームと前記第5アームとが電気的に直列に接続されて、前記三相交流回路の第2相を構成し、
 前記第3アームを下アーム、前記第6アームを上アームとして、前記第3アームと前記第6アームとが電気的に直列に接続されて、前記三相交流回路の第3相を構成する、付記16に記載の半導体装置。
The semiconductor device according to the present disclosure is not limited to the embodiments described above. The specific configuration of each part of the semiconductor device of the present disclosure can be modified in various ways. For example, the semiconductor device of the present disclosure includes embodiments related to the following additional notes.
Additional note 1.
at least one first switch section each including a first switching element and a second switching element;
a first control element that inputs a first drive signal to the first switching element and the second switching element;
a mounting section on which the first switching element and the second switching element are mounted;
a plurality of wires including a first wire, a second wire and a third wire;
Equipped with
In each of the at least one first switch section, the first switching element and the second switching element are electrically connected in parallel,
The first switching element has a first main surface facing one of the thickness directions of the mounting section, and a first control electrode disposed on the first main surface,
The second switching element has a second main surface facing one side in the thickness direction, a second control electrode and a main surface wiring section disposed on the second main surface,
the first wire is joined to the first control element and the main surface wiring section,
the second wire is joined to the main surface wiring section and the first control electrode,
the third wire is joined to the first control element and the second control electrode,
The first control element is arranged on one side of the first switching element and the second switching element in a first direction perpendicular to the thickness direction,
The semiconductor device, wherein the second switching element is arranged between the first control element and the first switching element in the first direction.
Appendix 2.
The semiconductor device according to appendix 1, wherein the main surface wiring section includes a first pad section to which the first wire is bonded and a second pad section to which the second wire is bonded.
Appendix 3.
The first pad portion and the second pad portion are arranged along the first direction when viewed in the thickness direction,
The semiconductor device according to appendix 2, wherein the first pad portion is located closer to the first control element than the second pad portion in the first direction.
Appendix 4.
The semiconductor device according to appendix 3, wherein the main surface wiring section includes a connecting section that connects the first pad section and the second pad section.
Appendix 5.
Supplementary note 4, wherein a dimension of the connecting portion in the thickness direction and a second direction perpendicular to the first direction is the same as a dimension of each of the first pad portion and the second pad portion in the second direction. The semiconductor device described in .
Appendix 6.
According to appendix 4, a dimension of the connecting portion in the thickness direction and a second direction perpendicular to the first direction is smaller than a dimension in the second direction of each of the first pad portion and the second pad portion. The semiconductor device described.
Appendix 7.
The second pad section is located on one side in the first direction with respect to the first pad section, and on the other side in a second direction perpendicular to the thickness direction and the first direction. , the semiconductor device according to appendix 2.
Appendix 8.
The second control electrode is located closer to the first control element in the first direction than the center of the second main surface in the first direction.
The semiconductor device according to any one of Supplementary notes 1 to 7.
Appendix 9.
In the second main surface, each of the second control electrode and the main surface wiring section is arranged at a central portion in a second direction perpendicular to the thickness direction and the first direction. Semiconductor equipment.
Appendix 10.
The semiconductor device according to appendix 8, wherein the main surface wiring section is arranged along a part of the periphery of the second main surface when viewed in the thickness direction.
Appendix 11.
11. The semiconductor device according to appendix 10, wherein the main surface wiring section has a band shape along one edge of the second main surface in the second direction when viewed in the thickness direction.
Appendix 12.
When viewed in the thickness direction, the main surface wiring portion includes a first band-shaped portion along one edge of the second main surface in the second direction, and a first band-shaped portion along one edge of the second main surface in the second direction; a second band-shaped portion along the other edge of the main surface in the first direction;
The semiconductor device according to appendix 10, wherein the first strip portion and the second strip portion are integrally formed.
Appendix 13.
The at least one first switch section includes a plurality of first switch sections,
The semiconductor device according to any one of appendices 1 to 12, wherein the plurality of first switch sections include a first arm, a second arm, and a third arm, each of which has a first switching element and a second switching element.
Appendix 14.
The first arm, the second arm, and the third arm are arranged in the thickness direction and a second direction perpendicular to the first direction,
The semiconductor device according to attachment 13, wherein the second arm is located between the first arm and the third arm in the second direction.
Appendix 15.
at least one second switch section each including a third switching element and a fourth switching element;
a second control element that inputs a second drive signal to the third switching element and the fourth switching element of each of the at least one second switch section;
Furthermore,
In each of the at least one second switch section, the third switching element and the fourth switching element are electrically connected in parallel,
The third switching element has a third main surface facing one side in the thickness direction, and a third control electrode disposed on the third main surface,
The fourth switching element has a fourth main surface facing one side in the thickness direction, a fourth control electrode and a second main surface wiring section disposed on the fourth main surface,
The plurality of wires include a fourth wire, a fifth wire, and a sixth wire,
the fourth wire is joined to the second control element and the second main surface wiring section,
the fifth wire is joined to the second main surface wiring section and the third control electrode,
the sixth wire is joined to the second control element and the fourth control electrode,
The second control element is arranged on one side in the first direction than the third switching element and the fourth switching element,
The semiconductor device according to attachment 13 or attachment 14, wherein the fourth switching element is arranged between the second control element and the third switching element in the first direction.
Appendix 16.
The at least one second switch section includes a plurality of second switch sections,
The plurality of second switch parts include a fourth arm, a fifth arm, and a sixth arm,
The fourth arm, the fifth arm, and the sixth arm are arranged in a second direction perpendicular to the thickness direction and the first direction,
The semiconductor device according to appendix 15, wherein the fifth arm is located between the fourth arm and the sixth arm in the second direction.
Appendix 17.
The first arm is a lower arm, the fourth arm is an upper arm, and the first arm and the fourth arm are electrically connected in series to constitute a first phase of a three-phase AC circuit,
The second arm is a lower arm, the fifth arm is an upper arm, and the second arm and the fifth arm are electrically connected in series to constitute a second phase of the three-phase AC circuit,
The third arm is a lower arm, and the sixth arm is an upper arm, and the third arm and the sixth arm are electrically connected in series to constitute a third phase of the three-phase AC circuit. The semiconductor device according to appendix 16.
A1,A2,A21,A3,A31,A4:半導体装置
10U:第1相   10V:第2相
10W:第3相   1:第1スイッチ部
1A:第1アーム   1B:第2アーム
1C:第3アーム
11,11A,11B,11C:スイッチング素子
11a:素子主面   11b:素子裏面
111,112,113:電極
12,12A,12B,12C:スイッチング素子
12a:素子主面   12b:素子裏面
121,122,123:電極
115,125:主面配線部   125a:第1パッド部
125b:第2パッド部   125c:連結部
1251:第1帯状部   1252:第2帯状部
13,13A,13B,13C:保護素子
13a:素子主面   13b:素子裏面
131,132:電極   19:導電性接合材
2:第2スイッチ部   2A:第4アーム
2B:第5アーム   2C:第6アーム
21,21A,21B,21C:スイッチング素子
21a:素子主面   21b:素子裏面
211,212,213:電極
225:主面配線部   225a:第3パッド部
225b:第4パッド部   225c:連結部
22,22A,22B,22C:スイッチング素子
22a:素子主面   22b:素子裏面
221,222,223:電極
23,23A,23B,23C:保護素子
23a:素子主面   23b:素子裏面
231,232:電極   29:導電性接合材
3A~3G,3Z:リード   301~306:端縁
311A,312A,313A,31B~31D:搭載部
32A~32G,32Z:端子部
33A~33G,33Z:パッド部
34A~34D:連結部   39:接合材
4A~4H,4J~4N,4P~4R,4Z:リード
41H,41R:搭載部
42A~42H,42J~42N,42P~42R:端子部
43A~43H,43J~43N,43P~43R,43Z:パッド部
44A~44H,44J~44N,44P~44R:連結部
45H:突出部   45Z:突出部
46A~46H,46J~46N,46P~46R:接合部
461C:貫通孔   49:導電性接合材
51:支持基板   511:第1面
512:第2面   513:第3面
514:第4面   515:第5面
516:第6面   52:配線パターン
52A~52H,52J~52N,52P~52R:配線部
521H,521R:パッド部   53A~53D:接合部
6:接続部材   6A~6H,6J~6L:ワイヤ
61G,61H,61Q,62G,62H,62Q:ワイヤ
7:封止部材   71:樹脂主面
72:樹脂裏面   73~76:樹脂側面
731,741,761:凹部   8A:第1制御素子
8B:第2制御素子   81,82,83:電極
85:接合材   89U,89V,89W:電子部品
891:導電性接合材
A1, A2, A21, A3, A31, A4: Semiconductor device 10U: First phase 10V: Second phase 10W: Third phase 1: First switch section 1A: First arm 1B: Second arm 1C: Third arm 11, 11A, 11B, 11C: Switching element 11a: Element main surface 11b: Element back surface 111, 112, 113: Electrode 12, 12A, 12B, 12C: Switching element 12a: Element main surface 12b: Element back surface 121, 122, 123 : Electrodes 115, 125: Main surface wiring part 125a: First pad part 125b: Second pad part 125c: Connecting part 1251: First strip part 1252: Second strip part 13, 13A, 13B, 13C: Protective element 13a: Element main surface 13b: Element back surface 131, 132: Electrode 19: Conductive bonding material 2: Second switch part 2A: Fourth arm 2B: Fifth arm 2C: Sixth arm 21, 21A, 21B, 21C: Switching element 21a : Element main surface 21b: Element back surface 211, 212, 213: Electrode 225: Main surface wiring part 225a: Third pad part 225b: Fourth pad part 225c: Connection part 22, 22A, 22B, 22C: Switching element 22a: Element Main surface 22b: Element back surface 221, 222, 223: Electrode 23, 23A, 23B, 23C: Protective element 23a: Element main surface 23b: Element back surface 231, 232: Electrode 29: Conductive bonding material 3A to 3G, 3Z: Lead 301 to 306: Edges 311A, 312A, 313A, 31B to 31D: Mounting parts 32A to 32G, 32Z: Terminal parts 33A to 33G, 33Z: Pad parts 34A to 34D: Connecting parts 39: Bonding materials 4A to 4H, 4J to 4N, 4P to 4R, 4Z: Leads 41H, 41R: Mounting parts 42A to 42H, 42J to 42N, 42P to 42R: Terminal parts 43A to 43H, 43J to 43N, 43P to 43R, 43Z: Pad parts 44A to 44H, 44J ~44N, 44P~44R: Connecting portion 45H: Protruding portion 45Z: Protruding portion 46A~46H, 46J~46N, 46P~46R: Joint portion 461C: Through hole 49: Conductive bonding material 51: Support substrate 511: First surface 512: Second surface 513: Third surface 514: Fourth surface 515: Fifth surface 516: Sixth surface 52: Wiring patterns 52A to 52H, 52J to 52N, 52P to 52R: Wiring portions 521H, 521R: Pad portions 53A ~53D: Joint portion 6: Connection member 6A~6H, 6J~6L: Wire 61G, 61H, 61Q, 62G, 62H, 62Q: Wire 7: Sealing member 71: Resin main surface 72: Resin back surface 73~76: Resin Side surfaces 731, 741, 761: Recessed portion 8A: First control element 8B: Second control element 81, 82, 83: Electrode 85: Bonding material 89U, 89V, 89W: Electronic component 891: Conductive bonding material

Claims (17)

  1.  各々が第1スイッチング素子および第2スイッチング素子を含む少なくとも1つの第1スイッチ部と、
     前記第1スイッチング素子および前記第2スイッチング素子に第1駆動信号を入力する第1制御素子と、
     前記第1スイッチング素子および前記第2スイッチング素子が搭載される搭載部と、
     第1ワイヤ、第2ワイヤおよび第3ワイヤを含む複数のワイヤと、
    を備え、
     前記少なくとも1つの第1スイッチ部の各々において、前記第1スイッチング素子と前記第2スイッチング素子とが電気的に並列に接続され、
     前記第1スイッチング素子は、前記搭載部の厚さ方向の一方を向く第1主面と、前記第1主面に配置された第1制御電極とを有し、
     前記第2スイッチング素子は、前記厚さ方向の一方を向く第2主面と、前記第2主面に配置された第2制御電極および主面配線部とを有し、
     前記第1ワイヤは、前記第1制御素子と、前記主面配線部とに接合され、
     前記第2ワイヤは、前記主面配線部と、前記第1制御電極とに接合され、
     前記第3ワイヤは、前記第1制御素子と、前記第2制御電極とに接合され、
     前記第1制御素子は、前記第1スイッチング素子および前記第2スイッチング素子よりも、前記厚さ方向に直交する第1方向の一方側に配置され、
     前記第2スイッチング素子は、前記第1方向において、前記第1制御素子と前記第1スイッチング素子との間に配置される、
     半導体装置。
    at least one first switch section each including a first switching element and a second switching element;
    a first control element that inputs a first drive signal to the first switching element and the second switching element;
    a mounting section on which the first switching element and the second switching element are mounted;
    a plurality of wires including a first wire, a second wire and a third wire;
    Equipped with
    In each of the at least one first switch section, the first switching element and the second switching element are electrically connected in parallel,
    The first switching element has a first main surface facing one of the thickness directions of the mounting section, and a first control electrode disposed on the first main surface,
    The second switching element has a second main surface facing one side in the thickness direction, a second control electrode and a main surface wiring section disposed on the second main surface,
    the first wire is joined to the first control element and the main surface wiring section,
    the second wire is joined to the main surface wiring section and the first control electrode,
    the third wire is joined to the first control element and the second control electrode,
    The first control element is arranged on one side of the first switching element and the second switching element in a first direction perpendicular to the thickness direction,
    The second switching element is arranged between the first control element and the first switching element in the first direction.
    Semiconductor equipment.
  2.  前記主面配線部は、前記第1ワイヤが接合される第1パッド部と前記第2ワイヤが接合される第2パッド部とを含む、
     請求項1に記載の半導体装置。
    The main surface wiring section includes a first pad section to which the first wire is bonded and a second pad section to which the second wire is bonded.
    The semiconductor device according to claim 1.
  3.  前記第1パッド部と前記第2パッド部とは、前記厚さ方向に見て、前記第1方向に沿って配置され、
     前記第1パッド部は、前記第1方向において、前記第2パッド部よりも前記第1制御素子の近くに位置する、
     請求項2に記載の半導体装置。
    The first pad portion and the second pad portion are arranged along the first direction when viewed in the thickness direction,
    The first pad portion is located closer to the first control element than the second pad portion in the first direction.
    The semiconductor device according to claim 2.
  4.  前記主面配線部は、前記第1パッド部と前記第2パッド部とを繋ぐ連結部を含む、
     請求項3に記載の半導体装置。
    The main surface wiring section includes a connecting section that connects the first pad section and the second pad section.
    The semiconductor device according to claim 3.
  5.  前記連結部の前記厚さ方向および前記第1方向に直交する第2方向の寸法が、前記第1パッド部および前記第2パッド部の各々の前記第2方向の寸法と同じである、
     請求項4に記載の半導体装置。
    A dimension of the connecting portion in the thickness direction and a second direction perpendicular to the first direction is the same as a dimension of each of the first pad portion and the second pad portion in the second direction.
    The semiconductor device according to claim 4.
  6.  前記連結部の前記厚さ方向および前記第1方向に直交する第2方向の寸法が、前記第1パッド部および前記第2パッド部の各々の前記第2方向の寸法よりも小さい、
     請求項4に記載の半導体装置。
    A dimension of the connecting portion in the thickness direction and a second direction perpendicular to the first direction is smaller than a dimension of each of the first pad portion and the second pad portion in the second direction.
    The semiconductor device according to claim 4.
  7.  前記第2パッド部は、前記第1パッド部に対して、前記第1方向の一方側に位置し、かつ、前記厚さ方向および前記第1方向に直交する第2方向の他方側に位置する、
     請求項2に記載の半導体装置。
    The second pad section is located on one side in the first direction with respect to the first pad section, and on the other side in a second direction perpendicular to the thickness direction and the first direction. ,
    The semiconductor device according to claim 2.
  8.  前記第2制御電極は、前記第1方向において、前記第2主面の前記第1方向の中央よりも前記第1制御素子の近くに位置する、
     請求項1ないし請求項7のいずれかに記載の半導体装置。
    The second control electrode is located closer to the first control element in the first direction than the center of the second main surface in the first direction.
    A semiconductor device according to any one of claims 1 to 7.
  9.  前記第2主面において、前記第2制御電極および前記主面配線部の各々は、前記厚さ方向および前記第1方向に直交する第2方向における中央部に配置される、
     請求項8に記載の半導体装置。
    In the second main surface, each of the second control electrode and the main surface wiring section is arranged at a central portion in a second direction perpendicular to the thickness direction and the first direction.
    The semiconductor device according to claim 8.
  10.  前記主面配線部は、前記厚さ方向に見た前記第2主面の周縁の一部に沿って配置される、
     請求項8に記載の半導体装置。
    The main surface wiring section is arranged along a part of the periphery of the second main surface when viewed in the thickness direction.
    The semiconductor device according to claim 8.
  11.  前記主面配線部は、前記厚さ方向に見て、前記第2主面の前記厚さ方向および前記第1方向に直交する第2方向の一方側の端縁に沿う帯状である、
     請求項10に記載の半導体装置。
    When viewed in the thickness direction, the main surface wiring portion has a band shape along one edge of the second main surface in a second direction perpendicular to the thickness direction and the first direction.
    The semiconductor device according to claim 10.
  12.  前記主面配線部は、前記厚さ方向に見て、前記第2主面の前記厚さ方向および前記第1方向に直交する第2方向の一方側の端縁に沿う第1帯状部と、前記厚さ方向に見て、前記第2主面の前記第1方向の他方側の端縁に沿う第2帯状部と、を含み、
     前記第1帯状部と前記第2帯状部とは、一体的に形成されている、
     請求項10に記載の半導体装置。
    The main surface wiring portion includes a first band-shaped portion along one edge of the second main surface in a second direction perpendicular to the thickness direction and the first direction, when viewed in the thickness direction; a second band-shaped portion along the other edge of the second main surface in the first direction when viewed in the thickness direction;
    The first belt-shaped part and the second belt-shaped part are integrally formed,
    The semiconductor device according to claim 10.
  13.  前記少なくとも1つの第1スイッチ部は、複数の第1スイッチ部を含み、
     前記複数の第1スイッチ部は、各々が第1スイッチング素子および第2スイッチング素子を有する第1アーム、第2アームおよび第3アームを含む、
     請求項1ないし請求項12のいずれかに記載の半導体装置。
    The at least one first switch section includes a plurality of first switch sections,
    The plurality of first switch parts each include a first arm, a second arm, and a third arm, each having a first switching element and a second switching element.
    A semiconductor device according to any one of claims 1 to 12.
  14.  前記第1アーム、前記第2アームおよび前記第3アームは、前記厚さ方向および前記第1方向に直交する第2方向に配列され、
     前記第2アームは、前記第2方向において、前記第1アームと前記第3アームとの間に位置する、
     請求項13に記載の半導体装置。
    The first arm, the second arm, and the third arm are arranged in the thickness direction and a second direction perpendicular to the first direction,
    the second arm is located between the first arm and the third arm in the second direction;
    The semiconductor device according to claim 13.
  15.  各々が第3スイッチング素子および第4スイッチング素子を含む少なくとも1つの第2スイッチ部と、
     前記少なくとも1つの第2スイッチ部の各々の前記第3スイッチング素子および前記第4スイッチング素子に第2駆動信号を入力する第2制御素子と、
    をさらに備え、
     前記少なくとも1つの第2スイッチ部の各々において、前記第3スイッチング素子と前記第4スイッチング素子とが電気的に並列に接続され、
     前記第3スイッチング素子は、前記厚さ方向の一方を向く第3主面と、前記第3主面に配置された第3制御電極とを有し、
     前記第4スイッチング素子は、前記厚さ方向の一方を向く第4主面と、前記第4主面に配置された第4制御電極および第2主面配線部とを有し、
     前記複数のワイヤは、第4ワイヤ、第5ワイヤおよび第6ワイヤを含み、
     前記第4ワイヤは、前記第2制御素子と、前記第2主面配線部とに接合され、
     前記第5ワイヤは、前記第2主面配線部と、前記第3制御電極とに接合され、
     前記第6ワイヤは、前記第2制御素子と、前記第4制御電極とに接合され、
     前記第2制御素子は、前記第3スイッチング素子および前記第4スイッチング素子よりも、前記第1方向の一方側に配置され、
     前記第4スイッチング素子は、前記第1方向において、前記第2制御素子と前記第3スイッチング素子との間に配置される、
     請求項13または請求項14に記載の半導体装置。
    at least one second switch section each including a third switching element and a fourth switching element;
    a second control element that inputs a second drive signal to the third switching element and the fourth switching element of each of the at least one second switch section;
    Furthermore,
    In each of the at least one second switch section, the third switching element and the fourth switching element are electrically connected in parallel,
    The third switching element has a third main surface facing one side in the thickness direction, and a third control electrode disposed on the third main surface,
    The fourth switching element has a fourth main surface facing one side in the thickness direction, a fourth control electrode and a second main surface wiring section disposed on the fourth main surface,
    The plurality of wires include a fourth wire, a fifth wire, and a sixth wire,
    the fourth wire is joined to the second control element and the second main surface wiring section,
    the fifth wire is joined to the second main surface wiring section and the third control electrode,
    the sixth wire is joined to the second control element and the fourth control electrode,
    The second control element is arranged on one side in the first direction than the third switching element and the fourth switching element,
    The fourth switching element is arranged between the second control element and the third switching element in the first direction.
    The semiconductor device according to claim 13 or 14.
  16.  前記少なくとも1つの第2スイッチ部は、複数の第2スイッチ部を含み、
     前記複数の第2スイッチ部は、第4アーム、第5アームおよび第6アームを含み、
     前記第4アーム、前記第5アームおよび前記第6アームは、前記厚さ方向および前記第1方向に直交する第2方向に配列され、
     前記第5アームは、前記第2方向において、前記第4アームと前記第6アームとの間に位置する、
     請求項15に記載の半導体装置。
    The at least one second switch section includes a plurality of second switch sections,
    The plurality of second switch parts include a fourth arm, a fifth arm, and a sixth arm,
    The fourth arm, the fifth arm, and the sixth arm are arranged in a second direction perpendicular to the thickness direction and the first direction,
    The fifth arm is located between the fourth arm and the sixth arm in the second direction.
    The semiconductor device according to claim 15.
  17.  前記第1アームを下アーム、前記第4アームを上アームとして、前記第1アームと前記第4アームとが電気的に直列に接続されて、三相交流回路の第1相を構成し、
     前記第2アームを下アーム、前記第5アームを上アームとして、前記第2アームと前記第5アームとが電気的に直列に接続されて、前記三相交流回路の第2相を構成し、
     前記第3アームを下アーム、前記第6アームを上アームとして、前記第3アームと前記第6アームとが電気的に直列に接続されて、前記三相交流回路の第3相を構成する、
     請求項16に記載の半導体装置。
    The first arm is a lower arm, the fourth arm is an upper arm, and the first arm and the fourth arm are electrically connected in series to form a first phase of a three-phase AC circuit,
    The second arm is a lower arm, the fifth arm is an upper arm, and the second arm and the fifth arm are electrically connected in series to constitute a second phase of the three-phase AC circuit,
    The third arm is a lower arm, and the sixth arm is an upper arm, and the third arm and the sixth arm are electrically connected in series to constitute a third phase of the three-phase AC circuit.
    The semiconductor device according to claim 16.
PCT/JP2023/017093 2022-05-19 2023-05-01 Semiconductor device WO2023223829A1 (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007103411A (en) * 2005-09-30 2007-04-19 Fujitsu Ltd Relay member arranged in semiconductor device and semiconductor device
JP2013125806A (en) * 2011-12-14 2013-06-24 Mitsubishi Electric Corp Power semiconductor device
JP2016162960A (en) * 2015-03-04 2016-09-05 エスアイアイ・セミコンダクタ株式会社 Semiconductor element and semiconductor device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007103411A (en) * 2005-09-30 2007-04-19 Fujitsu Ltd Relay member arranged in semiconductor device and semiconductor device
JP2013125806A (en) * 2011-12-14 2013-06-24 Mitsubishi Electric Corp Power semiconductor device
JP2016162960A (en) * 2015-03-04 2016-09-05 エスアイアイ・セミコンダクタ株式会社 Semiconductor element and semiconductor device

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