WO2023215268A1 - Systèmes et procédés de projection de franges d'interférence réglables - Google Patents

Systèmes et procédés de projection de franges d'interférence réglables Download PDF

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Publication number
WO2023215268A1
WO2023215268A1 PCT/US2023/020661 US2023020661W WO2023215268A1 WO 2023215268 A1 WO2023215268 A1 WO 2023215268A1 US 2023020661 W US2023020661 W US 2023020661W WO 2023215268 A1 WO2023215268 A1 WO 2023215268A1
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WO
WIPO (PCT)
Prior art keywords
light
deflector
adjustable
receive
mirror
Prior art date
Application number
PCT/US2023/020661
Other languages
English (en)
Inventor
Goldie Lynne GOLDSTEIN
Takuto TAKEMOTO
Daniel Gene Smith
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Publication of WO2023215268A1 publication Critical patent/WO2023215268A1/fr

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/067—Dividing the beam into multiple beams, e.g. multifocusing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
    • B23K26/0624—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1ns or less
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/0643—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising mirrors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/0652—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising prisms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/0665—Shaping the laser beam, e.g. by masks or multi-focusing by beam condensation on the workpiece, e.g. for focusing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36—Removing material
    • B23K26/362—Laser etching

Definitions

  • Optical systems such as laser systems, may be utilized to perform manufacturing operations.
  • laser systems (especially laser interferometry systems) may be used to ablate material from the surface of an object in order to produce three- dimensional (3D) patterns on and/or in the object.
  • 3D three- dimensional
  • Such systems may find use in manufacturing a variety of patterns for a variety of applications.
  • such systems may be used to pattern surfaces with aerodynamic nblets.
  • nblets may reduce aerodynamic drag on surfaces such as the wings, fuselage, or propeller of an aircraft, or the blades of a wind or gas turbine.
  • it may be important to have the ability to vary properties of a laser interferometry system, such as the pitch or orientation of interferometric fringes projected on the surface.
  • laser interferometry systems may lack the ability to project interference fringes with adjustable pitches or orientations.
  • Laser interferometry systems that do feature such an ability may require a large and expensive optical system, reducing the economic efficiency of the laser manufacturing operations.
  • presented herein are systems and methods for projecting laser interferometric patterns with adjustable fringe pitches and/or fringe orientations.
  • the adjustable fringe pitch and/or orientation may be referred to as a controllable fringe pitch and/or orientation.
  • FIG. 1 shows a schematic depicting a first variation of a first exemplary system for projecting laser interferometric patterns with adjustable fringe pitches or fringe orientations.
  • FIG. 2 shows a schematic depicting a second variation of the first exemplary system for projecting laser interferometric patterns with adjustable fringe pitches or fringe orientations.
  • FIG. 3 shows a first exemplary deflection module for use with the system described herein with respect to FIG. 1 or FIG. 2.
  • FIG. 4 shows a second exemplary deflection module for use with the system described herein with respect to FIG. 1 or FIG. 2.
  • FIG. 5 shows a schematic depicting a second exemplary system for projecting laser interferometric patterns with adjustable fringe pitches or fringe orientations.
  • FIG. 6 shows a flowchart depicting a first exemplary method for proj ecting laser interferometric patterns with adjustable fringe pitches or fringe orientations.
  • FIG. 7 shows a flowchart depicting a second exemplary method for projecting laser interferometric paterns with adjustable fringe pitches or fringe orientations.
  • FIG. 8 is a block diagram of a computer system used in some embodiments to perform or control portions of methods for projecting laser interferometric patterns with adjustable fringe pitches or fringe orientations described herein.
  • the inventions can be implemented in numerous ways, including as a process; an apparatus; a system; a composition of mater; a computer program product embodied on a computer readable storage medium; and/or a processor, such as a processor configured to execute instructions stored on and/or provided by a memory coupled to the processor.
  • these implementations, or any other form that the inventions may take, may be referred to as techniques.
  • the order of the steps of disclosed processes may be altered within the scope of the inventions.
  • a component such as a processor or a memory described as being configured to perform a task may be implemented as a general component that is temporarily configured to perform the task at a given time or a specific component that is manufactured to perform the task.
  • the term “processor” refers to one or more devices, circuits, and/or processing cores configured to process data, such as computer program instructions.
  • the term "or” shall convey both disjunctive and conjunctive meanings.
  • the phrase “A or B” shall be interpreted to include element A alone, element B alone, and the combination of elements A and B.
  • Recent advances in optical manufacturing systems allow the use of short, high- power optical pulses to ablate material from the surface of an object in order to produce three- dimensional (3D) patterns in the object.
  • Such systems find use in manufacturing a variety of patterns for a variety of applications.
  • such systems may be used to pattern surfaces with aerodynamic riblets.
  • Such riblets may reduce aerodynamic drag on surfaces such as the wings, fuselage, or propeller of an aircraft, or the blades of a wind or gas turbine.
  • laser interferometry systems may lack the ability to project interference fringes with adjustable pitches or orientations. Laser interferometry systems that do feature such an ability may require a large and expensive optical system, reducing the economic efficiency of the laser manufacturing operations.
  • the systems and methods generally utilize a light source to project substantially collimated source light (such as laser light).
  • the source light is received by a beamsplitter that splits the source light into first and second beams of light.
  • the first and second beams of light are received by a deflection module that imparts an adjustable shear (such as an adjustable lateral shear) between the first and second beams of light.
  • At least one focusing optical element receives the first and second beams of light and directs the first and second beams of light to overlap on a surface (such as a surface to be patterned with riblets). This results in an interference pattern between the first and second beams of light being formed on the surface.
  • the interference pattern generally comprises a plurality of bright fringes and a plurality of dark fringes.
  • the interference pattern may be used to, for instance, bum or ablate portions of the surface (or a plane below the surface) at points of high optical intensity' (the bright fringes) in the interference pattern, thereby creating the desired pattern on or below the surface.
  • the bright fringes are separated from neighboring bright fringes (and the dark fringes are separated from neighboring dark fringes) by an adjustable fringe pitch which is based on the adjustable shear.
  • the bright fringes and the dark fringes are oriented along an orientation direction which depends on an orientation of one or more components of the deflection module.
  • the fringe pitch or the fringe orientation can be adjusted. This allows the interference pattern to be reconfigured on the fly during the optical manufacturing process, allowing greatly increased flexibility in the vanety of patterns that can be imparted to or below the surface.
  • a variety of optical components that may be used to provide adjustability in the fringe pitch or the fringe orientation are described herein.
  • the adjustable fringe pitch or direction may be referred to as a controllable pitch or orientation.
  • a first system for projecting laser interferometric patterns with adjustable fringe pitches or fringe orientations is disclosed herein.
  • the system generally comprises: a beamsplitter configured to receive source light and to split the source light into at least a first beam of light and a second beam of light; a deflection module comprising at least a first deflector configured to receive the first beam of light at a first oblique angle and at least a second deflector configured to receive the second beam of light at a second oblique angle, the deflection module configured to impart an adjustable shear between the first beam of light and the second beam of light; and at least one focusing optical element configured to receive the first beam of light and the second beam of light and to direct the first beam of light and the second beam of light to overlap on a surface, thereby projecting an interference pattern between the first beam of light and the second beam of light on the surface.
  • the interference pattern comprises a plurality of bright fringes and a plurality of dark fringes, each bright fringe separated from a neighboring bright fringe by an adjustable fringe pitch, each dark fringe separated from a neighboring dark fringe by the adjustable fringe pitch, the adjustable fringe pitch based on the adjustable shear.
  • the plurality of bright fringes and the plurality of dark fringes are oriented along an adjustable orientation direction, the adjustable orientation direction based on an orientation of one or more components of the deflection module.
  • the deflection module further comprises a translatable stage coupled to the first deflector and/or the second deflector, the translatable stage configured to change a position of the deflector and/or the second deflector to thereby adjust the adjustable shear between the first beam of light and the second beam of light.
  • the translatable stage is configured to change an angle of intersection between the first beam of light and the second beam of light.
  • the deflection module further comprises a rotatable stage coupled to the deflecting module, the rotatable stage configured to rotate the deflecting module or a component of the deflection module about an optical axis of the deflection module or an axis parallel to the optical axis to thereby adjust the adjustable orientation direction.
  • the system further comprises a light source configured to project the source light.
  • the source light comprises substantially collimated source light.
  • the light source comprises a laser light source and the source light comprises a laser light.
  • the laser light source comprises a pulsed laser light source and the source light comprises a pulsed laser light.
  • the beamsplitter comprises a diffraction grating.
  • the deflection module further comprises a third deflector configured to receive the first beam of light from the first deflector at a third oblique angle and a fourth deflector configured to receive the second beam of light from the second deflector at a fourth oblique angle.
  • the first, second, third, and fourth deflectors comprise first, second, third, and fourth mirrors, respectively.
  • the deflection module comprises a first roof mirror and a second roof mirror, wherein the first and fourth deflectors comprise first and second surfaces of the first roof mirror, respectively, and wherein the second and third deflectors comprise first and second surfaces of the second roof mirror respectively.
  • the deflection module further comprises an adjustable spacer coupled to the first roof mirror and the second roof mirror, the adjustable spacer configured to adj ust an adj ustable distance between the first roof mirror and the second roof mirror to thereby adjust the adjustable shear.
  • a second system for projecting laser interferometric patterns with adjustable fringe pitches or fringe orientations is disclosed herein.
  • the system generally comprises: a beamsplitter configured to receive source light and to split the source light into at least a first beam of light and a second beam of light; a first mirror configured to receive the first beam of light and to deflect the first beam of light away from a surface; a second mirror configured to receive the second beam of light and to deflect the second beam of light away from the surface; a deflection module comprising at least a first deflector configured to receive the first beam of light from the first mirror and at least a second deflector configured to receive the second beam of light from the second mirror, the deflection module configured to impart an adjustable shear between the first beam of light and the second beam of light; and a non-planar mirror configured to receive the first beam of light from the first deflector, to receive the second beam of light from the second deflector, and to direct the first beam of light and the second beam of light to overlap on the surface,
  • the interference patern comprises a plurality of bright fringes and a plurality of dark fringes, each bright fringe separated from a neighboring bright fringe by an adjustable fringe pitch, each dark fringe separated from a neighboring dark fringe by the adjustable fringe pitch, the adjustable fringe pitch based on the adjustable shear.
  • the plurality of bright fringes and the plurality of dark fringes are oriented along an adjustable orientation direction, the adjustable orientation direction based on an orientation of one or more components of the deflection module.
  • the first deflector is configured to receive the first beam of light from the first mirror at a first oblique angle and wherein the second deflector is configured to receive the second beam of light from the second mirror at a second oblique angle.
  • the deflection module further comprises a third deflector configured to receive the first beam of light from the first deflector and a fourth deflector configured to receive the second beam of light from the second deflector.
  • the third deflector is configured to receive the first beam of light from the first deflector at a third oblique angle and wherein the fourth deflector is configured to receive the second beam of light from the second mirror at a fourth oblique angle.
  • the deflection module comprises a first roof mirror and a second roof mirror, wherein the first and fourth deflectors comprise first and second surfaces of the first roof mirror, respectively, and wherein the second and third deflectors comprise first and second surfaces of the second roof mirror respectively.
  • the detection module further comprises an adjustable spacer coupled to the first roof mirror and the second roof mirror, the adjustable spacer configured to adjust an adjustable distance between the first roof mirror and the second roof mirror to thereby adjust the adjustable shear.
  • the non-planar mirror comprises a parabolic mirror or an elliptical mirror.
  • a first method for projecting laser interferometric paterns with adjustable fringe pitches or fringe orientations is disclosed herein.
  • the method generally comprises: using a beamspliter to receive source light and to split the source light into at least a first beam of light and a second beam of light; using a deflection module to receive the first beam of light at a first oblique angle with a first deflector, to receive the second beam of light at a second oblique angle with a second deflector, and to impart an adjustable shear between the first beam of light and the second beam of light; and using at least one focusing optical element configured to receive the first beam of light and the second beam of light and to direct the first beam of light and the second beam of light to overlap on a surface, thereby projecting an interference patern between the first beam of light and the second beam of light on the surface.
  • the interference patern comprises a plurality of bright fringes and a plurality of dark fringes, each bright fringe separated from a neighboring bright fringe by an adjustable fringe pitch, each dark fringe separated from a neighboring dark fringe by the adjustable fringe pitch, the adjustable fringe pitch based on the adjustable shear.
  • the plurality of bright fringes and the plurality of dark fringes are oriented along an adjustable orientation direction, the adjustable orientation direction based on an orientation of one or more components of the deflection module.
  • a second method for projecting laser interferometric patterns with adjustable fringe pitches or fringe orientations is disclosed herein.
  • the method generally comprises: using a beamsplitter configured to receive source light and to split the source light into at least a first beam of light and a second beam of light; using a first mirror to receive the first beam of light and to deflect the first beam of light away from a surface; using a second mirror to receive the second beam of light and to deflect the second beam of light away from the surface; using a deflection module to receive the first beam of light from the first mirror with a first deflector, to receive the second beam of light from the second mirror with a second deflector, and to impart an adjustable shear between the first beam of light and the second beam of light; and using a non-planar mirror to receive the first beam of light from the first deflector, to receive the second beam of light from the second deflector, and to direct the first beam of light and the second beam of light to overlap on the surface, thereby projecting an interference pattern between the first
  • the interference pattern comprises a plurality of bright fringes and a plurality of dark fringes, each bright fringe separated from a neighboring bright fringe by an adjustable fringe pitch, each dark fringe separated from a neighboring dark fringe by the adjustable fringe pitch, the adjustable fringe pitch based on the adjustable shear.
  • the plurality of bright fringes and the plurality of dark fringes are oriented along an adjustable orientation direction, the adjustable orientation direction based on an orientation of one or more components of the deflection module.
  • the method further comprises using the deflection module to receive the first beam of light from the first mirror at a first oblique angle with the first deflector and to receive the second beam of light from the second mirror at a second oblique angle with the second deflector.
  • the method further comprises using the deflection module to receive the first beam of light from the first deflector with a third deflector and to receive the second beam of light from the second deflector with a fourth deflector. In some embodiments, the method further comprises using the deflection module to receive the first beam of light from the first deflector at a third oblique angle with the third deflector and to receive the second beam of light from the second deflector at a fourth oblique angle with the fourth deflector.
  • the deflection module comprises a first roof mirror and a second roof mirror, wherein the first and fourth deflectors comprise first and second surfaces of the first roof mirror, respectively, and wherein the second and third deflectors comprise first and second surfaces of the second roof mirror respectively.
  • the deflection module further comprises an adjustable spacer coupled to the first roof mirror and the second roof mirror, the adjustable spacer configured to adjust an adjustable distance between the first roof mirror and the second roof mirror to thereby adjust the adjustable shear.
  • the non-planar mirror comprises a parabolic mirror or an elliptical mirror.
  • FIG. 1 shows a schematic depicting a first variation of a first exemplary system 100 for projecting laser interferometric patterns with adjustable fringe pitches or fringe orientations.
  • the adjustable fringe pitch or orientation may be referred to as a controllable pitch or orientation.
  • the system 100 comprises a light source 110.
  • the light source 110 is configured to project source light 112.
  • the light source 110 comprises at least one laser light source.
  • the laser light source comprises at least one continuous wave (CW) laser light source.
  • the CW laser light source is configured to project any CW source light 112 described herein.
  • the laser light source comprises at least one pulsed laser light source.
  • the pulsed laser light source is configured to project any pulsed laser source light 112 described herein.
  • the laser light source comprises at least one gas laser.
  • the laser light source comprises at least one dye laser.
  • the laser light source comprises at least one metal-vapor laser.
  • the laser light source comprises at least one solid-state laser.
  • the laser light source comprises at least one semiconductor laser or diode laser.
  • the laser light source compnses a nanosecond laser light source, a picosecond laser light source, or a femtosecond laser light source.
  • the system 100 comprises at least two of the above-mentioned light sources.
  • the source light 112 is projected by any light source 110 described herein In some embodiments, the source light 112 is substantially collimated. In some embodiments, the source light 112 comprises laser light. In some embodiments, the laser light comprises CW laser light. In some embodiments, the laser light comprises pulsed laser light. In some embodiments, the pulsed laser light is produced as a series of laser pulses. In some embodiments, the laser pulses have a peak optical power of at least about 1 watt (W) or more. In some embodiments, the laser pulses have a peak optical power of at most about 1,000 gigawatts (GW) 1 W or less. In some embodiments, the laser pulses have a peak optical power between about 1 W and about 1,000 GW.
  • W watt
  • GW gigawatts
  • the laser pulses have a pulse length of at least about 1 picosecond (ps) or more. In some embodiments, the laser pulses have a pulse length of at most about 1,000 microseconds (ps) or less. In some embodiments, the laser pulses have a pulse length between about I ps and about 1,000 ps.
  • the laser pulses have a pulse energy of at least about 1 picojoule (pJ) or more. In some embodiments, the laser pulses have a pulse energy of at most about 1,000 microjoules (pJ) or less. In some embodiments, the laser pulses have a pulse energy between about 1 pJ and about 1,000 pJ.
  • the laser pulses have a repetition rate of at least about 1 hertz (Hz) or more. In some embodiments, the laser pulses have a repetition rate of at most about 1,000 kilohertz (kHz) or less. In some embodiments, the laser pulses have a repetition rate between about 1 Hz and about 1,000 kHz.
  • Hz hertz
  • kHz kilohertz
  • the laser pulses have a wavelength that is within the ultraviolet (UV), visible, or infrared (IR) portion of the electromagnetic spectrum. In some embodiments, the laser pulses have at least one wavelength of at least about 100 nanometers (nm) or more. In some embodiments, the laser pulses have at least one wavelength of at most about 10 micrometers (pm) or less. In some embodiments, the laser pulses have at least one wavelength between about 100 nm and about 10 pm.
  • UV ultraviolet
  • IR infrared
  • the system 100 comprises a beamsplitter 120.
  • the beamsplitter 120 is configured to receive the source light 112 and to split the source light 112 into at least a first beam of light 122 and a second beam of light 124.
  • the beamsplitter 120 comprises a non-polarizing beamsplitter.
  • the beamsplitter 120 comprises a polarizing beamsplitter and the system 100 further comprises a half-wave plate (HWP, not shown in FIG. 1) arranged to receive either the first beam of light 122 or the second beam of light 124 and to rotate the polarization state of the first beam of light 122 or the second beam of light 124.
  • HWP half-wave plate
  • the beamsplitter 120 comprises a 50/50 beamsplitter with a reflectivity of about 50% and a transmissivity of about 50%.
  • an optical system for beam transmission (such as an optical fiber) is interposed between the beam source 110 and the beamsplitter 120.
  • a collimating lens is provided at an output end of the optical fiber.
  • the system 100 comprises a deflection module 130.
  • the deflection module 130 comprises at least a first deflector 132 and at least a second deflector 134.
  • the first deflector 132 or the second deflector 134 comprises a mirror.
  • the first deflector 132 or the second deflector comprises a planar mirror.
  • the first deflector 132 or the second deflector 134 comprises a concave mirror.
  • the first deflector 132 or the second deflector 134 comprises a parabolic mirror.
  • the first deflector 132 or the second deflector 134 comprises a reflectivity of at least about 95% or more.
  • the deflection module 130 is configured to impart an adjustable shear 136 between the first beam of light 122 and the second beam of light 124.
  • the adjustable shear 136 comprises an adjustable lateral shear.
  • the deflection module 130 comprises any of the first and second deflection modules 300 and 400 described herein with respect to FIGs. 3 and 4, respectively.
  • the first deflector 132 is configured to receive the first beam of light 122 at a first oblique angle.
  • the second deflector 134 is configured to receive the second beam of light 124 at a second oblique angle.
  • the first oblique angle comprises a first obtuse angle.
  • the second oblique angle comprises a second obtuse angle.
  • the first obtuse angle or the second obtuse angle is more than about 90 degrees or more, less than about 720 degrees or less, or between about 90 degrees and about 720 degrees.
  • the deflection module 130 comprises a translatable stage (not shown in FIG. 1).
  • the translatable stage is coupled to the first deflector 132 or the second deflector 134.
  • the deflection module 130 comprises first and second translatable stages (not shown in FIG. 1) coupled to the first and second deflectors 132 and 134, respectively.
  • the translatable stage is configured to adjust a position of the first deflector 132 or the second deflector 134 to thereby adjust the adjustable shear 136 between the first beam of light 122 and the second beam of light 124, as described herein with reference to FIGs. 3 and 4.
  • the translatable stage is configured to adjust the adjustable shear 136 and thus the adjustable fringe pitch described herein. In some embodiments, the translatable stage is configured to adjust an angle of intersection between the first beam of light 122 and the second beam of light 124. In some embodiments, the translatable stage changes a pose or an orientation of the first deflector 132 or the second deflector 134 when it adjusts the position of the first deflector 132 or the second deflector 134. In some embodiments, the translatable stage does not change the pose or the orientation ofthe first deflector 132 or the second deflector 134 when it adjusts the position of the first deflector 132 or the second deflector 134.
  • changing the pose or the orientation of the first deflector 132 or the second deflector 134 is achieved by tilting or rotating the first deflector 132 or the second deflector 134 about an axis other than an axis normal to the surface of the first deflector 132 or the second deflector 134.
  • the rotatable stage is configured to rotate the deflection module 130 or one or both of the first deflector 132 and the second deflector 134 about an axis of the beamsplitter 120 to thereby adjust the adjustable orientation direction described herein. In some embodiments, the rotatable stage is configured to rotate the deflection module 130 or one or both of the first deflection 132 and the second deflector 134 about an axis of the beamsplitter that is normal to a surface of the beamsplitter.
  • the rotatable stage is configured to rotate the deflection module 130, or one or both of the first deflector 132 and the second deflector 134, about an optical axis of the deflection module 130, or about an axis parallel to the optical axis of the deflection module 130.
  • the system 100 comprises at least one focusing optical element 140.
  • the at least one focusing optical element 140 is configured to receive the first beam of light 122 and the second beam of light 124 and to direct the first beam of light 122 and the second beam of light 124 to overlap on a surface 150.
  • the at least one focusing optical element comprises a plurality of focusing optical elements.
  • the at least one focusing optical element comprises a focusing optical system.
  • the at least one focusing optical element 140 comprises an imaging optic, an imaging optical system, a lens, a condensing lens, a cylindrical lens, a multi-element lens, an objective lens, a mirror, a concave mirror, a parabolic mirror, or any combination thereof
  • the at least one focusing optical element 140 comprises at least one spherical focusing optical element.
  • the at least one focusing optical element 140 comprises at least one aspheric focusing optical element.
  • the at least one focusing optical element 140 comprises at least one rotationally symmetric focusing optical element.
  • the at least one focusing optical element 140 comprise at least one non-rotationally symmetric focusing optical element.
  • the at least one focusing optical element 140 may be referred to as a condensing optical element or a condensing optical system.
  • the surface 150 comprises a wing of an aircraft. In some embodiments, the surface 150 comprises a fuselage of an aircraft. In some embodiments, the surface 150 comprises a propeller of an aircraft. In some embodiments, the surface 150 comprises a tail of an aircraft. In some embodiments, the surface 150 comprises a blade of a wind turbine. In some embodiments, the surface 150 comprises a blade of a gas turbine.
  • the interference pattern 160 comprises a plurality of bright fringes 162 and a plurality of dark fringes 164.
  • each bright fringe 162 is separated from neighboring bright fringes by an adjustable fringe pitch 166.
  • each dark fringe 164 is separated from neighboring dark fringes by the adjustable fringe pitch 166.
  • the adjustable fringe pitch 166 is based on the adjustable shear 136.
  • the adjustable shear 136 between the first and second beams of light 122 and 124 incident on the focusing optical element 140 is changed, the crossing angle 20 on the surface 150 is thereby changed, therefore. As a result, the pitch of the interference pattern 160 changes.
  • adjusting the adjustable shear 136 adjusts the adjustable fringe pitch 166.
  • the adjustable shear 136 and thus the adjustable fringe pitch 166, may be adjusted using any of the first and second deflections modules 300 and 400 described herein with respect to FIGs. 3 and 4, respectively.
  • the adjustable shear 136 may be adjusted a first period of time after receiving a command (e.g., from a controller, not shown in FIG. 1) to adjust the adjustable shear 136.
  • the first period of time is at least about 1 microsecond (ps) or more, at most about 1 millisecond (ms) or less, or between about 1 ps and about 1 ms.
  • the plurality of bright fringes 162 and the plurality of dark fringes 164 are oriented along an adjustable orientation direction 168.
  • the adjustable orientation direction 168 is based on an orientation of one or more components of the deflection module 130. That is, in some embodiments, adjusting an orientation of the one or more components of the deflection module 130 adjusts the adjustable orientation direction 168.
  • the adjustable orientation direction 168 may be adjusted using any of the first and second deflection modules 300 and 400 described herein with respect to FIGs. 3 and 4, respectively.
  • the adjustable orientation direction 168 may be adjusted a second period of time after receiving a command (e.g., from a controller, not shown in FIG. 1) to adjust the adjustable orientation direction 168.
  • the second period of time is at least about 1 microsecond (ps) or more, at most about 1 second (s) or less, between about 1 ps and about 1 s.
  • the system 100 need not contain such a component.
  • the at least one focusing optical element 140 may be removed from system 100 and the deflection module 130 may be configured to direct the first beam of light 122 along a first optical path and to direct the second beam of light 124 along a second optical path that is not parallel to the first optical path.
  • the first and second optical paths converge at the surface 150, allowing generation of the interference pattern 160.
  • the system 100 further comprises one or more beam shaping elements (not shown in FIG 1).
  • the one or more beam shaping elements comprise one or more beam shaping elements comprise one or more lenses, cylindrical lenses, waveplates, or any combination thereof.
  • the one or more beam shaping elements are configured to impart one or more beam shaping operations, such as Gaussian to flat top conversion, circular illumination to line illumination conversion, or any combination thereof.
  • the one or more beam shaping elements are located prior to the beamsplitter 120. That is, in some embodiments, the one or more beams shaping elements are configured to receive the source light 112, to shape the source light 112, and to direct the source light 112 to the beamsplitter 120.
  • the one or more beam shaping elements are located between the beamsplitter 120 and the deflection module 130. That is, in some embodiments, the one or more beam shaping elements are configured to receive the first beam of light 122 and the second beam of light 124, to shape the first beam of light 122 and the second beam of light 124, and to direct the first beam of light 122 and the second beam of light 124 to the deflection module 130.
  • the one or more beam shaping elements are located between the deflection module 130 and the at least one focusing optical element 140. That is, in some embodiments, the one or more beam shaping elements are configured to receive the first beam of light 122 and the second beam of light 124 from the deflection module 130, to shape the first beam of light 122 and the second beam of light 124, and to direct the first beam of light 122 and the second beam of light 124 to the at least one focusing optical element 140.
  • placing the at least one beam shaping element between the deflection module 130 and the at least one focusing optical element 140 allows the first beam of light 122 and the second beam of light 124 to strike optical components of the deflection module 130 with a reduced intensity, thereby reducing the thermal load on the optical components and reducing the chance of damage to the optical components.
  • the one or more beam shaping elements are located between the at least one focusing optical element 140 and the surface 150. That is, in some embodiments, the one or more beam shaping elements are configured to receive the first beam of light 122 and the second beam of light 124 from the at least one focusing optical element 140, to shape the first beam of light 122 and the second beam of light 124, and to direct the first beam of light 122 and the second beam of light 124 to overlap on the surface 150.
  • the system 100 comprises one or more compensating plates (not shown in FIG. 1 ).
  • the one or more compensating plates are configured to substantially equalize the optical path lengths of the first beam of light 122 and the second beam of light 124.
  • FIG. 2 shows a schematic depicting a second variation of a first exemplary system 200 for projecting laser interferometric patterns with adjustable fringe pitches or fringe orientations.
  • the system 200 comprises many of the same elements as the system 100 described herein with respect to FIG. 1.
  • the system 200 comprises the light source 110, the deflection module 130, the first deflector 132, the second deflector 134, and the focusing element 140, which are configured to function in a manner similar to the manner described herein with respect to system 100 of FIG. 1.
  • the system 200 of FIG. 2 comprises a diffraction grating 210 in place of the beamsplitter 120 described herein wdth respect to FIG. 1.
  • the diffraction grating 210 is configured to receive the source light 112 from the light source 110 and to split the source light 112 into the first beam of light 122 and the second beam of light 124.
  • the first beam of light 122 comprises a +1 diffraction order diffracted from the diffraction grating 210.
  • the second beam of light 124 comprises a -1 diffraction order diffracted from the diffraction grating 210.
  • the system 200 comprises a beam block 220 configured to block a 0 diffraction order diffracted from the diffraction grating 210.
  • the system 200 comprises a lens 230 configured to direct the first beam of light 122 and the second beam of light 124 to the deflection module 130, which then imparts the adjustable shear 136.
  • the diffraction grating 210 generates a beam having a diffraction order larger than ⁇ 1. For instance, in some embodiments, the diffraction grating 210 generates a beam having a diffraction order of ⁇ 2, ⁇ 3, and so forth.
  • the beam(s) having a diffraction order greater than ⁇ 1 are blocked by the beam block 220 or are guided to the surface 150 through the deflection module 130 and the focusing optical element 140. Since the diffraction grating 210 generates a plurality of beams, the diffraction grating 210 may be referred to as the beamsplitter.
  • the system 200 comprises one or more compensating plates (not shown in FIG. 2).
  • the one or more compensating plates are configured to substantially equalize the optical path lengths of the first beam of light 122 and the second beam of light 124.
  • FIG. 3 shows a first exemplary deflection module 300 for use with the system described herein with respect to FIG. 1 or FIG. 2.
  • the first deflection module 300 comprises the first deflector 132 and the second deflector 134.
  • the first deflection module comprises a third deflector 310 and a fourth deflector 312.
  • the third deflector 310 or the fourth deflector 312 comprises a mirror.
  • the third deflector 310 or the fourth deflector comprises a planar mirror.
  • the third deflector 310 or the fourth deflector 312 comprises a concave mirror.
  • the third deflector 310 or the fourth deflector 134 comprises a parabolic mirror. In some embodiments, the third deflector 310 or the fourth deflector 312 comprises a reflectivity of at least about 95% or more. In some embodiments, the first deflection module 300 is configured to impart an adjustable shear 136 between the first beam of light 122 and the second beam of light 124.
  • the third deflector 310 is configured to receive the first beam of light 122 from the first deflector 132 at a third oblique angle.
  • the fourth deflector 312 is configured to receive the second beam of light 124 from the second deflector 134 at a fourth oblique angle.
  • the third oblique angle comprises a third obtuse angle.
  • the fourth oblique angle comprises a fourth obtuse angle.
  • the third obtuse angle or the fourth obtuse angle is more than about 90 degrees or more, less than about 720 degrees, or between about 90 degrees and about 720 degrees or less.
  • the first deflection module 300 comprises a translatable stage 138.
  • the translatable stage 138 is coupled to the first deflector 132.
  • the translatable stage 138 is instead coupled to the second deflector 134, the third deflector 310, or the fourth deflector 312.
  • the deflection module 130 comprises first, second, third, or fourth translatable stages (not shown in FIG. 3) coupled to the first, second, third, or fourth deflectors 132, 134, 310, or 320 respectively.
  • the translatable stage 138 is configured to adjust a position of the first, second, third, or fourth deflector 132, 134, 310, or 312, respectively, to thereby adjust the adjustable shear 136 between the first beam of light 122 and the second beam of light 124.
  • the translatable stage 138 is configured to adjust the adjustable shear 136 and thus the adjustable fringe pitch described herein.
  • the translatable stage 138 is configured to adjust an angle of intersection between the first beam of light 122 and the second beam of light 124.
  • the translatable stage 138 changes a pose or an orientation of the first deflector 132, the second deflector 134, the third deflector 310, or the fourth deflector 312 when it adjusts the position of the first deflector 132, the second deflector 134, the third deflector 310, or the fourth deflector 312. In some embodiments, the translatable stage 138 does not change the pose or the orientation of the first deflector 132, the second deflector 134, the third deflector 310, or the fourth deflector 312 when it adjusts the position of the first deflector 132, the second deflector 134, the third deflector 310, or the fourth deflector 312.
  • changing the pose or the orientation of the first deflector 132, the second deflector 134, the third deflector 310, or the fourth deflector 312 is achieved by tilting or rotating the first deflector 132, the second deflector 134, the third deflector 310, or the fourth deflector 312 about an axis other than an axis normal to the surface of the first deflector 132, the second deflector 134, the third deflector 310, or the fourth deflector 312.
  • the first deflection module 300 comprises a rotatable stage (not shown in FIG. 3).
  • the rotatable stage is coupled to the first deflection module 300 or to one, two, three, or four of the first deflector 132, the second deflector 134, the third deflector 310, and the fourth deflector 312.
  • the rotatable stage comprises a drum surrounding the first deflection module 300 or one, two, three, or four of the first deflector 132, the second deflector 134, the third deflector 310, and the fourth deflector 312, and the first deflection module 300 or one, two, three, or four of the first deflector 132, the second deflector 134, the third deflector 310, and the fourth deflector 312 are coupled (for instance, mechanically coupled) to the drum.
  • the rotatable stage is configured to rotate the first deflection module 300 or one, two, three, or four of the first deflector 132, the second deflector 134, the third deflector 310, and the fourth deflector 312 about an axis of the beamsplitter or diffraction grating (not shown in FIG. 3) to thereby adjust the adjustable orientation direction described herein.
  • the rotatable stage is configured to rotate the first deflection module 300, or one, two, three, or four of the first deflector 132, the second deflector 134, the third deflector 310, and the fourth deflector 312, about an optical axis of the first deflection module 300, or about an axis parallel to the optical axis of the first deflection module 300.
  • the first deflection module 300 comprises one or more intermediate deflectors (not shown in FIG. 3). In some embodiments, the first deflection module 300 comprises at least about 1, 2, 3, 4, or more intermediate deflectors, at most about 4, 3, 2, or 1 intermediate deflectors, or a number of intermediate deflectors that is within a range defined by any two of the preceding values. In some embodiments, the intermediate deflectors are located between the first deflector 132 and the third deflector 310, between the first deflector 132 and the fourth deflector 312, between the second deflector 134 and the third deflector 310, or between the second deflector 134 and the fourth deflector 312. In some embodiments, the intermediate deflectors comprise mirrors. In some embodiments, the intermediate deflectors comprise planar mirrors.
  • the first deflection module 300 comprises one or more compensating plates (not shown in FIG. 3).
  • the one or more compensating plates are configured to substantially equalize the optical path lengths of the first beam of light 122 and the second beam of light 124.
  • FIG. 4 shows a second exemplary deflection module 400 for use with the system described herein with respect to FIG. 1 or FIG. 2.
  • the second deflection module 400 comprises a first roof mirror 410 and a second roof mirror 412.
  • the first roof mirror 410 comprises the first deflector 132 and the fourth deflector 312 described herein with respect to FIGs. 1-3.
  • the first deflector 132 and the fourth deflector 312 comprise first and second surfaces, respectively, of the first roof mirror 410.
  • the second roof mirror 412 comprises the second deflector 134 and the third deflector 310 described herein with respect to FIGs. 1-3.
  • the second deflector 134 and the third deflector 310 comprise first and second surfaces, respectively, of the second roof mirror 412.
  • the adjustable spacer is configured to adjust an angle of intersection between the first beam of light 122 and the second beam of light 124. In some embodiments, the adjustable spacer changes a pose or an orientation of the first deflector 132, the second deflector 134, the third deflector 310, or the fourth deflector 312 when it adjusts the position of the roof mirror 410 or the second roof mirror 412. In some embodiments, the adjustable spacer does not change the pose or the orientation of the first deflector 132, the second deflector 134, the third deflector 310, or the fourth deflector 312 when it adjusts the position of the first roof mirror 410 or the second roof mirror 412.
  • changing the pose or the orientation of the first deflector 132, the second deflector 134, the third deflector 310, or the fourth deflector 312 is achieved by tilting or rotating the first roof mirror 410 or the second roof mirror 412 about an axis other than an axis normal to the surface of the first deflector 132, the second deflector 134, the third deflector
  • the adjustable distance 414 is related to the adjustable shear by Equation (1):
  • d' is the adjustable shear 136
  • g is the adjustable distance 414
  • y is the angle formed between the first deflector 132 and the fourth deflector 312 (or between the second deflector 134 and the third deflector 310)
  • d is the distance between the first beam of light 122 and the second beam of light prior to striking the first deflector 132 and the second deflector 134, respectively.
  • adjusting the adjustable distance 414 adjusts the adjustable shear 136.
  • the second deflection module 400 comprises a rotatable stage (not shown in FIG. 4).
  • the rotatable stage is coupled to the second deflection module 400 or to one or both of the first roof mirror 410 and the second roof mirror 412.
  • the rotatable stage comprises a drum surrounding the second deflection module 400 or one or both of the first roof mirror 410 and the second roof mirror 412, and the second deflection module 400 or one or both of the first roof mirror 410 and the second roof mirror 412 are coupled (for instance, mechanically coupled) to the drum.
  • the rotatable stage is configured to rotate the second deflection module 400 or one or both of the first roof mirror 410 and the second roof mirror 412 about an axis of the beamsplitter or diffraction grating (not shown in FIG.
  • the rotatable stage is configured to rotate the second deflection module 400 or one or both of the first roof minor 410 and the second roof mirror 412, about an optical axis of the second deflection module 400, or about an axis parallel to the optical axis of the second deflection module 400.
  • the second deflection module 400 comprises an optical trombone (not shown in FIG. 4).
  • the optical trombone has a plurality of deflection mirrors and is configured to substantially equalize the optical path lengths of the first beam of light 122 and the second beam of light 124.
  • the second deflection module 400 comprises one or more mirrors (not shown in FIG. 4) configured to deflect the first beam of light 122 and the second beam of light 124 to the optical trombone.
  • the second deflection module 400 comprises one or more compensating plates (not shown in FIG. 4).
  • the one or more compensating plates are configured to substantially equalize the optical path lengths of the first beam of light 122 and the second beam of light 124.
  • FIG. 5 shows a schematic depicting a second exemplary system 500 for projecting laser interferometric patterns with adjustable fringe pitches or fringe orientations.
  • the system 500 comprises a light source 110.
  • the light source 110 comprises any light source described herein with respect to FIG. 1.
  • the light source 110 is configured to project source light 112.
  • the source light 112 comprises any source light described herein with respect to FIG. 1.
  • the source light 112 has any peak optical power, pulse length, pulse energy, repetition rate, or wavelength described herein with respect to FIG. 1.
  • the system 500 comprises a beamsplitter 120.
  • the beamsplitter 120 comprises any beamsplitter described herein with respect to FIG. 1.
  • the beamsplitter 120 comprises the diffraction grating 210 described herein with respect to FIG. 2.
  • the beamsplitter 120 is configured to receive the source light 112 and to split the source light 112 into a first beam of light 122 and a second beam of light 124.
  • the system 500 comprises a first mirror 510.
  • the first mirror 510 is configured to receive the first beam of light 122 and to direct the first beam of light 122 away from a surface 140.
  • the surface 140 comprises any surface described herein with respect to FIG. 1.
  • the second mirror 520 is configured to receive the second beam of light 124 and to direct the second beam of light 124 away from the surface 140.
  • the system 500 comprises a deflection module 130.
  • the deflection module 130 comprises any deflection module described herein with respect to FIGs. 1-4.
  • the deflection module 130 comprises at least a first deflector 132 and at least a second deflector 134.
  • the first deflector 132 comprises any first deflector described herein with respect to FIGs. 1-4.
  • the second deflector 134 comprises any second deflector described herein with respect to FIGs. 1-4.
  • the first deflector 132 is configured to receive the first beam of light 122 from the first mirror 510.
  • the first deflector 132 is configured to receive the first beam of light 122 from the first mirror 510 at a first oblique angle. In some embodiments, the first oblique angle comprises any first oblique angle described herein with respect to FIG. 1.
  • the second deflector 134 is configured to receive the second beam of light 124 from the second mirror 520. In some embodiments, the second deflector 134 is configured to receive the second beam of light 124 from the second mirror 520 at a second oblique angle. In some embodiments, the second oblique angle comprises any second oblique angle described herein with respect to FIG. 1.
  • the deflection module 130 comprises a third deflector 310, a fourth deflector 312, a first roof mirror 410, and a second roof mirror 412, as described herein with respect to FIGs. 3 and 4.
  • the first deflector 132 is configured to direct the first beam of light 122 to the third deflector 310 or the fourth deflector 312.
  • the second deflector 134 is configured to direct the second beam of light to the third deflector 310 or the fourth deflector 312.
  • the third deflector 310 is configured to receive the first beam of light 122 or the second beam of light 124 from the first mirror 510 or the second mirror 520 at the first oblique angle or the second oblique angle.
  • the fourth deflector 312 is configured to receive the first beam of light 122 or the second beam of light 124 from the first mirror 510 or the second mirror 520 at the first oblique angle or the second oblique angle.
  • the system 500 comprises a non-planar mirror 530.
  • the non-planar mirror comprises a parabolic mirror, as shown in FIG. 5.
  • the non-planar mirror 530 comprises an elliptical mirror.
  • the non-planar mirror 530 is configured to receive the first beam of light 122 from the first deflector 132.
  • the non-planar mirror 530 is configured to receive the first beam of light 122 from the third deflector 310 or the fourth deflector 312.
  • the non-planar mirror 530 is configured to receive the second beam of light 124 from the second deflector 132.
  • the non-planar mirror 530 is configured to receive the second beam of light from the third deflector 310 or the fourth deflector 312. In some embodiments, the non-planar mirror 530 is configured to receive the first beam of light 122 along a first axis. In some embodiments, the first axis is substantially parallel to an optical axis of the non-planar mirror 530. In some embodiments, the first axis is not substantially parallel to the optical axis of the non-planar mirror 530. In some embodiments, the first axis has a first angle of intersection with the optical axis of the non-planar mirror 530 of at least about 1 degree or more, at most about 45 degrees or less, or between about 1 degree and about 45 degrees.
  • the non-planar mirror 530 is configured to receive the second beam of light 124 from the second deflector 134. In some embodiments, the non- planar minor 530 is configured to receive the second beam of light along a second axis. In some embodiments, the second axis is substantially parallel to an optical axis of the non-planar mirror 530. In some embodiments, the second axis is not substantially parallel to the optical axis of the non-planar mirror 530. In some embodiments, the second axis has a first angle of intersection with the optical axis of the non-planar mirror 530 of at least about 1 degree or more, at most about 45 degrees or less, or between about 1 degree and about 45 degrees.
  • the non-planar mirror 530 is configured to direct the first beam of light 122 and the second beam of light 124 to overlap on the surface 140 to thereby project an interference pattern (not shown in FIG. 5) between the first beam of light 122 and the second beam of light 124 on the surface 140.
  • the interference pattern comprises any interference pattern described herein with respect to FIG. 1.
  • the system 500 comprises one or more mirrors (elements 540 and 542 in FIG. 5) configured to receive the second beam of light 124 from the beamsplitter 120 and to direct the second beam of light 124 to the second mirror 520.
  • the system 500 comprise one or more mirrors (not shown in FIG. 5) configured to receive the first beam of light 122 from the beamsplitter 120 and to direct the first beam of light 122 to the first mirror 510.
  • the system 500 comprises an adjustable spacer (not shown in FIG. 5).
  • the adjustable spacer comprises any adjustable spacer described herein with respect to FIG. 4.
  • the adjustable spacer is coupled (for instance, mechanically coupled) to the first roof mirror 410 and the second roof mirror 412.
  • the adjustable spacer is configured to adjust an adjustable distance 414 between the first roof mirror 410 and the second roof mirror 412.
  • the adjustable spacer is configured to adjust a position of the first roof mirror 410 or the second roof mirror 412.
  • adjusting the adjustable distance 414 adjusts the adjustable shear 136 between the first beam of light 122 and the second beam of light 124.
  • the adjustable spacer is configured to adjust the adjustable shear 136 and thus the adjustable fringe pitch described herein.
  • the sy stem does not comprise the adjustable spacer and instead comprises a translatable stage (not shown in FIG. 5).
  • the translatable stage comprises any translatable stage descnbed herein with respect to FIGs. 1-3.
  • the translatable stage is configured to adjust a position of the first, second, third, or fourth deflector 132, 134, 310, or 312, respectively, to thereby adjust the adjustable shear 136 between the first beam of light 122 and the second beam of light 124.
  • the translatable stage is configured to adjust the adjustable shear 136 and thus the adjustable fringe pitch described herein.
  • the system 500 comprises a rotatable stage (not shown in FIG. 5).
  • the rotatable stage is coupled to the deflection module 130, to one or both of the first roof mirror 410 and the second roof mirror 412, or to any one, two, three, or four of the first deflector 132, the second deflector 134, the third deflector 310, and the fourth deflector 312.
  • the rotatable stage comprises a drum surrounding the deflection module 130, or one or both of the first roof mirror 410 and the second roof mirror 412, or any one, two, three, or four of the first deflector 132, the second deflector 134, the third deflector 310, and the fourth deflector 312 and the deflection module 130, or one or both of the first roof mirror 410 and the second roof mirror 412, or any one, two, three, or four of the first deflector 132, the second deflector 134, the third deflector 310, and the fourth deflector 312 are coupled (for instance, mechanically coupled) to the drum.
  • the rotatable stage is configured to rotate the deflection module 130, or one or both of the first roof mirror 410 and the second roof mirror 412, or any one, two, three, or four of the first deflector 132, the second deflector 134, the third deflector 310, and the fourth deflector 312 about an axis of the beamsplitter 120 or diffraction grating (not shown in FIG. 5) to thereby adjust the adjustable orientation direction described herein.
  • the rotatable stage is configured to rotate the deflection module 130, or one or both of the first roof mirror 410 and the second roof mirror 412, or any one, two, three, or four of the first deflector 132, the second deflector 134, the third deflector 310, and the fourth deflector 312, about an optical axis of the deflection module 130, or about an axis parallel to the optical axis of the deflection module 130.
  • the system 500 further comprises one or more beam shaping elements (not shown in FIG. 5).
  • the one or more beam shaping elements comprise one or more beam shaping elements comprise one or more lenses, cylindrical lenses, waveplates, or any combination thereof.
  • the one or more beam shaping elements are configured to impart one or more beam shaping operations, such as Gaussian to flat top conversion, circular illumination to line illumination conversion, or any combination thereof.
  • the system 100 further comprises one or more beam shaping elements (not shown in FIG. 1).
  • the one or more beam shaping elements comprise one or more beam shaping elements comprise one or more lenses, cylindrical lenses, waveplates, or any combination thereof.
  • the one or more beam shaping elements are configured to impart one or more beam shaping operations, such as Gaussian to flat top conversion, circular illumination to line illumination conversion, or any combination thereof.
  • the one or more beam shaping elements are located prior to the beamsplitter 120. That is, in some embodiments, the one or more beams shaping elements are configured to receive the source light 112, to shape the source light 112, and to direct the source tight 112 to the beamsplitter 120.
  • the one or more beam shaping elements are located between the beamsplitter 120 and the deflection module 130. That is, in some embodiments, the one or more beam shaping elements are configured to receive the first beam of light 122 and the second beam of light 124, to shape the first beam of light 122 and the second beam of light 124, and to direct the first beam of light 122 and the second beam of light 124 to the deflection module 130.
  • the one or more beam shaping elements are located between the deflection module 130 and the non-planar mirror 530. That is, in some embodiments, the one or more beam shaping elements are configured to receive the first beam of light 122 and the second beam of light 124 from the deflection module 130, to shape the first beam of light 122 and the second beam of light 124, and to direct the first beam of light 122 and the second beam of light 124 to the non-planar mirror 530.
  • placing the at least one beam shaping element between the deflection module 130 and the at least one focusing optical element 140 allows the first beam of light 122 and the second beam of light 124 to strike optical components of the deflection module 130 with a reduced intensity, thereby reducing the thermal load on the optical components and reducing the chance of damage to the optical components.
  • the one or more beam shaping elements are located between the non-planar mirror 530 and the surface 150. That is, in some embodiments, the one or more beam shaping elements are configured to receive the first beam of light 122 and the second beam of light 124 from the non-planar mirror 530, to shape the first beam of light 122 and the second beam of light 124, and to direct the first beam of light 122 and the second beam of light 124 to overlap on the surface 150.
  • FIG. 6 shows a flowchart depicting a first exemplary method 600 for projecting laser interferometric patterns with adjustable fringe pitches or fringe orientations.
  • substantially collimated source light is projected at 610.
  • the source light comprises any source light described herein with respect to FIG. 1.
  • a beamsplitter is used to receive the source light and to split the source light into at least a first beam of light and a second beam of light at 620.
  • the beamsplitter comprises any beamsplitter described herein with respect to FIG. 1 or any diffraction grating described herein with respect to FIG. 2.
  • the first beam of light comprises any first beam of light described herein with respect to FIG. 1.
  • the second beam of light comprises any second beam of light described herein with respect to FIG. 1.
  • a deflection module is used to receive the first beam of light at a first oblique angle with a first deflector, to receive the second beam of light with a second deflector, and to impart an adjustable shear between the first beam of light and the second beam of light at 630.
  • the deflection module comprises any of the deflection module described herein with respect to FIG. 1, or the first deflection module described herein with respect to FIG. 3, or the second deflection module described herein with respect to FIG. 4.
  • the shear comprises any shear described herein with respect to FIG. 1.
  • At least one focusing optical element is used to receive the first beam of light and the second beam of light and to direct the first beam of light and the second beam of light to overlap on a surface, thereby projecting an interference pattern between the first beam of light and the second beam of light on the surface at 640.
  • the at least one focusing optical element comprises any focusing optical element described herein with respect to FIG. 1.
  • the surface comprises any surface described herein with respect to FIG. 1.
  • the interference pattern comprises any interference pattern described herein with respect to FIG. 1.
  • the method 600 further comprises repeating operations 610, 620, 630, and 640 to project a plurality of interference patterns on the surface.
  • the first and second beams of light are scanned across the surface to generate interference patterns at a plurality of locations on the surface.
  • the plurality of interference patterns are varied as the scan progresses, allowing different interference patterns to be projected to different locations on the surface.
  • the adjustable shear, the adjustable fringe pitch, or the adjustable fringe orientation is varied as the scan progresses, thereby projecting the different interference patterns to the different locations on the surface. In some embodiments, such a procedure permits different laser manufacturing operations to be conducted at the different locations on the surface.
  • riblets of different pitches or orientations may be fabricated at different locations on or in the surface.
  • the operations 610, 620, 630, and 640 are repeated at least about 1 time or more, at most about 1,000,000 times or less, or between about 1 time and about 1,000,000 times.
  • FIG. 7 shows a flowchart depicting a second exemplary method 700 for projecting laser interferometric patterns with adjustable fringe pitches or fringe orientations.
  • substantially collimated source light is projected at 710.
  • the source light comprises any source light described herein with respect to FIG. 5.
  • a beamsplitter is used to receive the source light and to split the source light into at least a first beam of light and a second beam of light at 720.
  • the beamsplitter comprises any beamsplitter described herein with respect to FIG. 5.
  • the first beam of light comprises any first beam of light described herein with respect to FIG. 5.
  • the second beam of light comprises any second beam of light described herein with respect to FIG. 5.
  • a first mirror is used to receive the first beam of light and to deflect the first beam of light away from a surface at 730.
  • the first mirror comprises any first mirror described herein with respect to FIG. 5.
  • the surface comprises any surface described herein with respect to FIG. 5.
  • a second mirror is used to receive the second beam of light and to deflect the second beam of light away from the surface at 740.
  • the second mirror comprises any second minor described herein with respect to FIG 5.
  • a deflection module is used to receive the first beam of light from the first mirror, to receive the second beam of light from the second mirror, and to impart an adjustable shear between the first beam of light and the second beam of light at 750.
  • the deflection module comprises any deflection module described herein with respect to FIG. 5.
  • the shear comprises any shear described herein with respect to FIG. 5.
  • a non-planar mirror is used to receive the first beam of light, to receive the second beam of light, and to direct the first beam of light and the second beam of light to overlap on the surface, thereby projecting an interference pattern between the first beam of light and the second beam of light on the surface at 760.
  • the non-planar mirror comprises any non-planar mirror described herein with respect to FIG. 5.
  • the interference pattern comprises any interference pattern described herein with respect to FIG. 5.
  • the method 700 further comprises repeating operations 710, 720, 730, 740, 750, and 760 to project a plurality of interference patterns on the surface.
  • the first and second beams of light are scanned across the surface to generate interference patterns at a plurality of locations on the surface.
  • the plurality of interference patterns are varied as the scan progresses, allowing different interference patterns to be projected to different locations on the surface.
  • the adjustable shear, the adjustable fringe pitch, or the adjustable fringe orientation is varied as the scan progresses, thereby projecting the different interference patterns to the different locations on the surface.
  • such a procedure permits different laser manufacturing operations to be conducted at the different locations on the surface.
  • riblets of different pitches or orientations may be fabricated at different locations on or in the surface.
  • the operations 710, 720, 730, 740, 750, and 760 are repeated at least about 1 time or more, at most about 1,000,000 times or less, or between about 1 time and about 1,000,000 times.
  • systems are disclosed that can be used to perform or control the method 600 of FIG. 6, the method 700 of FIG. 7, any of operations 610, 620, 630, and 640, or any of operations 710, 720, 730, 740, 750, and 760, described herein.
  • the systems comprise one or more processors and memory coupled to the one or more processors.
  • the one or more processors are configured to implement or control one or more operations of method 600 described herein with respect to FIG. 6 or of method 700 described herein with respect to FIG. 7
  • the memory is configured to provide the one or more processors with instructions corresponding to the operations of method 600 or of method 700.
  • the instructions are embodied in a tangible computer readable storage medium.
  • FIG. 8 is a block diagram of a computer system 800 used in some embodiments to perform or control portions of methods for projecting laser interferometric patterns with adjustable fringe pitches or fringe orientations described herein (such as operation 610, 620, 630, or 640 as described herein with respect to FIG. 6 or operation 710, 720, 730, 740, 750, or 760 of method 700 as described herein with respect to FIG. 7).
  • the computer system may be utilized as a component in systems for projecting laser interferometric patterns with adjustable fringe pitches or fringe orientations described herein.
  • FIG. 8 illustrates one embodiment of a general purpose computer system. Other computer system architectures and configurations can be used for carrying out the processing of the present inventions.
  • Computer system 800 made up of various subsystems described below, includes at least one microprocessor subsystem 801.
  • the microprocessor subsystem comprises at least one central processing unit (CPU) or graphical processing unit (GPU).
  • the microprocessor subsystem can be implemented by a single-chip processor or by multiple processors.
  • the microprocessor subsystem is a general purpose digital processor which controls the operation of the computer system 800. Using instructions retrieved from memory 804, the microprocessor subsystem controls the reception and manipulation of input data, and the output and display of data on output devices.
  • the microprocessor subsystem 801 is coupled bi-directionally with memory 804, which can include a first primary storage, typically a random access memory (RAM), and a second primary storage area, typically a read-only memory (ROM).
  • primary storage can be used as a general storage area and as scratch-pad memory, and can also be used to store input data and processed data. It can also store programming instructions and data, in the form of data objects and text objects, in addition to other data and instructions for processes operating on microprocessor subsystem.
  • primary storage typically includes basic operating instructions, program code, data and objects used by the microprocessor subsystem to perform its functions.
  • Primary storage devices 804 may include any suitable computer-readable storage media, described below, depending on whether, for example, data access needs to be bi-directional or uni-directional.
  • the microprocessor subsystem 801 can also directly and very rapidly retrieve and store frequently needed data in a cache memory (not shown).
  • a removable mass storage device 805 provides additional data storage capacity for the computer system 800, and is coupled either bi-directionally (read/write) or unidirectionally (read only) to microprocessor subsystem 801.
  • Storage 805 may also include computer-readable media such as magnetic tape, flash memory, signals embodied on a carrier wave, PC-CARDS, portable mass storage devices, holographic storage devices, and other storage devices.
  • a fixed mass storage 809 can also provide additional data storage capacity. The most common example of mass storage 809 is a hard disk drive.
  • Mass storage 805 and 809 generally store additional programming instructions, data, and the like that typically are not in active use by the processing subsystem. It will be appreciated that the information retained within mass storage 805 and 809 may be incorporated, if needed, in standard fashion as part of primary storage 804 (e.g., RAM) as virtual memory.
  • bus 806 can be used to provide access other subsystems and devices as well.
  • these can include a display monitor 808, a network interface 807, a keyboard 802, and a pointing device 803, as well as an auxiliary input/output device interface, a sound card, speakers, and other subsystems as needed.
  • the pointing device 803 may be a mouse, stylus, track ball, or tablet, and is useful for interacting with a graphical user interface.
  • the network interface 807 allows the processing subsystem 801 to be coupled to another computer, computer network, or telecommunications network using a network connection as shown.
  • the processing subsystem 801 might receive information, e.g., data objects or program instructions, from another network, or might output information to another network in the course of performing the above-described method steps.
  • Information often represented as a sequence of instructions to be executed on a processing subsystem, may be received from and outputted to another network, for example, in the form of a computer data signal embodied in a carrier wave.
  • An interface card or similar device and appropriate software implemented by processing subsystem 801 can be used to connect the computer system 800 to an external network and transfer data according to standard protocols.
  • method embodiments of the present inventions may execute solely upon processing subsystem 801, or may be performed across a network such as the Internet, intranet networks, or local area networks, in conjunction with a remote processing subsystem that shares a portion of the processing.
  • Additional mass storage devices may also be connected to processing subsystem 801 through network interface 807.
  • auxiliary I/O device interface (not shown) can be used in conjunction with computer system 800.
  • the auxiliary I/O device interface can include general and customized interfaces that allow the processing subsystem 801 to send and, more typically, receive data from other devices such as microphones, touch-sensitive displays, transducer card readers, tape readers, voice or handwriting recognizers, biometrics readers, cameras, portable mass storage devices, and other computers.
  • embodiments of the present inventions further relate to computer storage products with a computer readable medium that contains program code for performing various computer-implemented operations.
  • the computer-readable medium is any data storage device that can store data which can thereafter be read by a computer system.
  • the media and program code may be those specially designed and constructed for the purposes of the present inventions, or they may be of the kind well known to those of ordinary skill in the computer software arts.
  • Examples of computer-readable media include, but are not limited to, all the media mentioned above: magnetic media such as hard disks, floppy disks, and magnetic tape; optical media such as CD-ROM disks; magneto-optical media such as floptical disks; and specially configured hardware devices such as application-specific integrated circuits (ASICs), programmable logic devices (PLDs), and ROM and RAM devices.
  • the computer-readable medium can also be distributed as a data signal embodied in a carrier wave over a network of coupled computer systems so that the computer-readable code is stored and executed in a distributed fashion.
  • Examples of program code include both machine code, as produced, for example, by a compiler, or files containing higher level code that may be executed using an interpreter.
  • bus 806 is illustrative of any interconnection scheme serving to link the subsystems.
  • Other computer architectures having different configurations of subsystems may also be utilized.
  • any system or adjustable shearing cyclic interferometer described herein with respect to FIGs. 1-8, or any combination of such systems or adjustable shearing cyclic interferometers is referred to as a processing system.
  • the processing system is modified according to the disclosure of US Patent Application Publication No. 2020/0391325A1, which is herein incorporated by reference in its entirety for all purposes.
  • the processing system forms the riblet structure on the surface (e.g., of a workpiece).
  • the processing system may form any structure having any shape on the surface.
  • the processing system can form a fine texture structure (e.g., a concave and convex structure) that is formed regularly or irregularly in a micrometer or nanometer order.
  • This fine texture structure may include at least one of a shark skin structure or a dimple structure that reduces resistance from a fluid (such as a liquid and/or a gas).
  • the fine texture structure may include a lotus leaf surface structure.
  • the lotus leaf structure may repel liquid or enable self-cleaning via a lotus effect.
  • the fine texture structure may include at least one of a fine protrusion structure (e.g., a fine protrusion structure described in U.S. Patent Application Publication No. 2017/0044002A1, which is herein incorporated by reference in its entirety for all purposes) configured to enhance liquid transport, a concave and convex structure configured to produce a lyophile effect, a concave and convex structure configured to produce an antifouling effect, a moth eye structure configured to reduce reflectance and/or to repel liquid, a concave and convex structure configured to intensity only light of a specific wavelength by interference to thereby have a structural color, a pillar array structure configured to enhance adhesion via the van der Waals force, a concave and convex structure configured to reduce aerodynamic noise, or a honeycomb structure configured to enhance droplet collection.
  • a fine protrusion structure e.g., a fine protrusion structure described in U.S. Patent Application Publication No. 2017/0044002A1, which is here
  • the processing system processes the surface of the workpiece by the ablation.
  • the processing system may remove a part of the workpiece by heat processing.
  • the processing system forms the riblet structure to reduce resistance of the surface of the workpiece to the fluid.
  • the processing system may form a mold for molding an object with a functional surface such as a riblet structure.
  • Embodiment 1 A system comprising: a beamsplitter configured to receive source light and to split the source light into at least a first beam of light and a second beam of light: a deflection module comprising at least a first deflector configured to receive the first beam of light at a first oblique angle and at least a second deflector configured to receive the second beam of light at a second oblique angle, the deflection module configured to impart an adjustable shear between the first beam of light and the second beam of light; and at least one focusing optical element configured to receive the first beam of light and the second beam of light and to direct the first beam of light and the second beam of light to overlap on a surface, thereby projecting an interference pattern between the first beam of light and the second beam of light on the surface.
  • Embodiment 2 The system of Embodiment 1, wherein the interference pattern comprises a plurality of bright fringes and a plurality of dark fringes, each bright fringe separated from a neighboring bright fringe by an adjustable fringe pitch, each dark fringe separated from a neighboring dark fringe by the adjustable fringe pitch, the adjustable fringe pitch based on the adjustable shear.
  • Embodiment 3 The system of Embodiment 1 or 2, wherein the plurality of bright fringes and the plurality of dark fringes are oriented along an adjustable orientation direction, the adjustable orientation direction based on an orientation of one or more components of the deflection module.
  • Embodiment 4 The system of any one of Embodiments 1-3, wherein the deflection module further comprises a translatable stage coupled to the first deflector and/or the second deflector, the translatable stage configured to change a position of the deflector and/or the second deflector to thereby adjust the adjustable shear between the first beam of light and the second beam of light.
  • Embodiment 5 The system of Embodiment 4, wherein the translatable stage is configured to change an angle of intersection between the first beam of light and the second beam of light.
  • Embodiment 6 The system of any one of Embodiments 1-5, wherein the deflection module further comprises a rotatable stage coupled to the deflecting module, the rotatable stage configured to rotate the deflecting module or a component of the deflection module about an optical axis of the deflection module or an axis parallel to the optical axis to thereby adjust the adjustable orientation direction.
  • Embodiment 7 The system of any one of Embodiments 1-6, further comprising a light source configured to project the source light.
  • Embodiment 8 The system of any one of Embodiments 1-7, wherein the source light comprises substantially collimated source light.
  • Embodiment 9. The system of Embodiment 7 or 8, wherein the light source comprises a laser light source and the source light comprises a laser light.
  • Embodiment 10 The system of Embodiment 9, wherein the laser light source comprises a pulsed laser light source and the source light comprises a pulsed laser light.
  • Embodiment 11 The system of any one of Embodiments 1-10, wherein the beamsplitter comprises a diffraction grating.
  • Embodiment 12 The system of any one of Embodiments 1-11, wherein the deflection module further comprises a third deflector configured to receive the first beam of light from the first deflector at a third oblique angle and a fourth deflector configured to receive the second beam of light from the second deflector at a fourth oblique angle.
  • Embodiment 13 The system of Embodiment 12, wherein the first, second, third, and fourth deflectors comprise first, second, third, and fourth mirrors, respectively.
  • Embodiment 14 The system of Embodiment 12, wherein the deflection module comprises a first roof mirror and a second roof mirror, wherein the first and fourth deflectors comprise first and second surfaces of the first roof mirror, respectively, and wherein the second and third deflectors comprise first and second surfaces of the second roof mirror respectively.
  • Embodiment 15 The system of Embodiment 14, wherein the deflection module further comprises an adjustable spacer coupled to the first roof mirror and the second roof mirror, the adjustable spacer configured to adjust an adjustable distance between the first roof mirror and the second roof mirror to thereby adjust the adjustable shear.
  • Embodiment 16 A system comprising: a beamsplitter configured to receive source light and to split the source light into at least a first beam of light and a second beam of light; a first mirror configured to receive the first beam of light and to deflect the first beam of light away from a surface; a second mirror configured to receive the second beam of light and to deflect the second beam of light away from the surface; a deflection module comprising at least a first deflector configured to receive the first beam of light from the first mirror and at least a second deflector configured to receive the second beam of light from the second mirror, the deflection module configured to impart an adjustable shear between the first beam of light and the second beam of light; and a non-planar mirror configured to receive the first beam of light from the first deflector, to receive the second beam of light from the second deflector, and to direct the first beam of light and the second beam of light to overlap on the surface, thereby projecting an interference pattern between the first beam of light and the second beam of light on the
  • Embodiment 17 The system of Embodiment 16, wherein the interference pattern comprises a plurality of bright fringes and a plurality of dark fringes, each bright fringe separated from a neighboring bright fringe by an adjustable fringe pitch, each dark fringe separated from a neighboring dark fringe by the adjustable fringe pitch, the adjustable fringe pitch based on the adjustable shear.
  • Embodiment 18 The system of Embodiment 16 or 17, wherein the plurality of bright fringes and the plurality of dark fringes are oriented along an adjustable orientation direction, the adjustable orientation direction based on an orientation of one or more components of the deflection module.
  • Embodiment 19 The system of any one of Embodiments 16-18, wherein the first deflector is configured to receive the first beam of light from the first mirror at a first oblique angle and wherein the second deflector is configured to receive the second beam of light from the second mirror at a second oblique angle.
  • Embodiment 20 The system of any one of Embodiments 16-19, wherein the deflection module further comprises a third deflector configured to receive the first beam of light from the first deflector and a fourth deflector configured to receive the second beam of light from the second deflector.
  • Embodiment 21 The system of Embodiment 20, wherein the third deflector is configured to receive the first beam of light from the first deflector at a third oblique angle and wherein the fourth deflector is configured to receive the second beam of light from the second mirror at a fourth oblique angle.
  • Embodiment 22 The system of Embodiment 20 or 21, wherein the deflection module comprises a first roof mirror and a second roof mirror, wherein the first and fourth deflectors comprise first and second surfaces of the first roof mirror, respectively, and wherein the second and third deflectors comprise first and second surfaces of the second roof mirror respectively.
  • Embodiment 23 The system of Embodiment 22, wherein the detection module further comprises an adjustable spacer coupled to the first roof mirror and the second roof mirror, the adjustable spacer configured to adjust an adjustable distance between the first roof mirror and the second roof mirror to thereby adjust the adjustable shear.
  • Embodiment 24 The system of any one of Embodiments 16-23, wherein the non-planar mirror comprises a parabolic mirror or an elliptical mirror.
  • Embodiment 25 A method comprising: using a beamsplitter to receive source light and to split the source light into at least a first beam of light and a second beam of light; using a deflection module to receive the first beam of light at a first oblique angle with a first deflector, to receive the second beam of light at a second oblique angle with a second deflector, and to impart an adjustable shear between the first beam of light and the second beam of light; and using at least one focusing optical element configured to receive the first beam of light and the second beam of light and to direct the first beam of light and the second beam of light to overlap on a surface, thereby projecting an interference pattern between the first beam of light and the second beam of light on the surface.
  • Embodiment 26 The method of Embodiment 25, wherein the interference pattern comprises a plurality of bright fringes and a plurality of dark fringes, each bright fringe separated from a neighboring bright fringe by an adjustable fringe pitch, each dark fringe separated from a neighboring dark fringe by the adjustable fringe pitch, the adjustable fringe pitch based on the adjustable shear.
  • Embodiment 27 The method of Embodiment 25 or 26, wherein the plurality of bright fringes and the plurality of dark fringes are oriented along an adjustable orientation direction, the adjustable orientation direction based on an orientation of one or more components of the deflection module.
  • Embodiment 28 A method comprising: using a beamsplitter configured to receive source light and to split the source light into at least a first beam of light and a second beam of light; using a first mirror to receive the first beam of light and to deflect the first beam of light away from a surface; using a second mirror to receive the second beam of light and to deflect the second beam of light away from the surface; using a deflection module to receive the first beam of light from the first mirror with a first deflector, to receive the second beam of light from the second mirror with a second deflector, and to impart an adjustable shear between the first beam of light and the second beam of light; and using a non-planar mirror to receive the first beam of light from the first deflector, to receive the second beam of light from the second deflector, and to direct the first beam of light and the second beam of light to overlap on the surface, thereby projecting an interference pattern between the first beam of light and the second beam of light on the surface.
  • Embodiment 29 The method of Embodiment 28, wherein the interference pattern comprises a plurality of bright fringes and a plurality of dark fringes, each bright fringe separated from a neighboring bright fringe by an adjustable fringe pitch, each dark fringe separated from a neighboring dark fringe by the adjustable fringe pitch, the adjustable fringe pitch based on the adjustable shear.
  • Embodiment 30 The method of Embodiment 28 or 29, wherein the plurality of bright fringes and the plurality of dark fringes are oriented along an adjustable orientation direction, the adjustable orientation direction based on an orientation of one or more components of the deflection module.
  • Embodiment 31 The method of any one of Embodiments 28-30, further comprising using the deflection module to receive the first beam of light from the first mirror at a first oblique angle with the first deflector and to receive the second beam of light from the second mirror at a second oblique angle with the second deflector.
  • Embodiment 32 The method of any one of Embodiments 28-31, further comprising using the deflection module to receive the first beam of light from the first deflector with a third deflector and to receive the second beam of light from the second deflector with a fourth deflector.
  • Embodiment 33 The method of Embodiment 32, further comprising using the deflection module to receive the first beam of light from the first deflector at a third oblique angle with the third deflector and to receive the second beam of light from the second deflector at a fourth oblique angle with the fourth deflector.
  • Embodiment 34 The method of Embodiment 33, wherein the deflection module comprises a first roof mirror and a second roof mirror, wherein the first and fourth deflectors comprise first and second surfaces of the first roof mirror, respectively, and wherein the second and third deflectors comprise first and second surfaces of the second roof mirror respectively.
  • Embodiment 35 The method of Embodiment 34, wherein the deflection module further comprises an adjustable spacer coupled to the first roof mirror and the second roof mirror, the adjustable spacer configured to adjust an adjustable distance between the first roof mirror and the second roof mirror to thereby adjust the adjustable shear.
  • Embodiment 36 The method of any one of Embodiments 28-35, wherein the non-planar mirror comprises a parabolic mirror or an elliptical mirror.

Abstract

Sont divulguées des techniques qui projettent des franges réglables (162, 164) dans des systèmes (100) d'interférométrie laser. Les techniques utilisent une source de lumière (110) pour projeter une lumière source (112) sensiblement collimatée reçue par un diviseur (120) de faisceau qui divise la lumière source (112) en des premier et second faisceaux (122, 124) de lumière. Les premier et second faisceaux (122, 124) de lumière sont reçus par un module de déviation (130) qui confère un cisaillement réglable entre les premier et second faisceaux (122, 124) de lumière. Au moins un élément optique de focalisation (140) reçoit et dirige les premier et second faisceaux (122, 124) de lumière pour qu'ils se chevauchent sur une surface (150). Il en résulte un motif d'interférence entre les premier et second faisceaux (122, 124) de lumière qui est formé sur la surface (150). Le motif d'interférence peut être utilisé pour brûler ou ablater des parties de la surface (150) ou un plan au-dessous de la surface (150) à des points d'intensité optique élevée du motif d'interférence, créant ainsi le motif souhaité sur ou au-dessous de la surface (150).
PCT/US2023/020661 2022-05-04 2023-05-02 Systèmes et procédés de projection de franges d'interférence réglables WO2023215268A1 (fr)

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001035168A1 (fr) * 1999-11-10 2001-05-17 Massachusetts Institute Of Technology Lithographie interferentielle utilisant des faisceaux de balayage a verrouillage de phase
US20040227927A1 (en) * 2003-05-13 2004-11-18 3M Innovative Properties Company Fiber grating writing interferometer with continuous wavelength tuning and chirp capability
US20050012933A1 (en) * 2003-07-15 2005-01-20 3M Innovative Properties Company Tunable talbot interferometers for fiber bragg grating writing
JP2006110587A (ja) * 2004-10-14 2006-04-27 Canon Inc レーザー干渉加工方法および装置
US20170044002A1 (en) 2014-04-23 2017-02-16 Japan Science And Technology Agency Combined-blade-type open flow path device and joined body thereof
US20200391325A1 (en) 2017-10-25 2020-12-17 Nikon Corporation Processing apparatus, and manufacturing method of movable body

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001035168A1 (fr) * 1999-11-10 2001-05-17 Massachusetts Institute Of Technology Lithographie interferentielle utilisant des faisceaux de balayage a verrouillage de phase
US20040227927A1 (en) * 2003-05-13 2004-11-18 3M Innovative Properties Company Fiber grating writing interferometer with continuous wavelength tuning and chirp capability
US20050012933A1 (en) * 2003-07-15 2005-01-20 3M Innovative Properties Company Tunable talbot interferometers for fiber bragg grating writing
JP2006110587A (ja) * 2004-10-14 2006-04-27 Canon Inc レーザー干渉加工方法および装置
US20170044002A1 (en) 2014-04-23 2017-02-16 Japan Science And Technology Agency Combined-blade-type open flow path device and joined body thereof
US20200391325A1 (en) 2017-10-25 2020-12-17 Nikon Corporation Processing apparatus, and manufacturing method of movable body

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