WO2023198747A1 - Flexible monolayered polysiloxane hard coating - Google Patents
Flexible monolayered polysiloxane hard coating Download PDFInfo
- Publication number
- WO2023198747A1 WO2023198747A1 PCT/EP2023/059509 EP2023059509W WO2023198747A1 WO 2023198747 A1 WO2023198747 A1 WO 2023198747A1 EP 2023059509 W EP2023059509 W EP 2023059509W WO 2023198747 A1 WO2023198747 A1 WO 2023198747A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- siloxane polymer
- silane
- coating
- monomers
- tert
- Prior art date
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- 238000000576 coating method Methods 0.000 title claims abstract description 85
- 239000011248 coating agent Substances 0.000 title claims abstract description 76
- -1 polysiloxane Polymers 0.000 title claims description 36
- 229920001296 polysiloxane Polymers 0.000 title claims description 9
- 229920000642 polymer Polymers 0.000 claims abstract description 86
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims abstract description 73
- 239000010410 layer Substances 0.000 claims abstract description 68
- 239000000758 substrate Substances 0.000 claims abstract description 65
- 239000002356 single layer Substances 0.000 claims abstract description 59
- 238000000034 method Methods 0.000 claims abstract description 38
- 229920002313 fluoropolymer Polymers 0.000 claims abstract description 28
- 239000000178 monomer Substances 0.000 claims description 66
- 239000000203 mixture Substances 0.000 claims description 64
- 239000002904 solvent Substances 0.000 claims description 40
- 229910000077 silane Inorganic materials 0.000 claims description 36
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 35
- 238000004132 cross linking Methods 0.000 claims description 34
- 238000005299 abrasion Methods 0.000 claims description 21
- 239000003054 catalyst Substances 0.000 claims description 21
- 238000012360 testing method Methods 0.000 claims description 21
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 20
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 claims description 18
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 claims description 16
- 239000003999 initiator Substances 0.000 claims description 15
- 239000010702 perfluoropolyether Substances 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 15
- 230000007062 hydrolysis Effects 0.000 claims description 14
- 238000006460 hydrolysis reaction Methods 0.000 claims description 14
- 239000005060 rubber Substances 0.000 claims description 14
- 238000002834 transmittance Methods 0.000 claims description 14
- 239000004593 Epoxy Substances 0.000 claims description 13
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 12
- 230000000007 visual effect Effects 0.000 claims description 11
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 10
- 230000001464 adherent effect Effects 0.000 claims description 10
- 238000000151 deposition Methods 0.000 claims description 10
- 229920003023 plastic Polymers 0.000 claims description 10
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 10
- 229920002554 vinyl polymer Polymers 0.000 claims description 10
- 239000004642 Polyimide Substances 0.000 claims description 9
- 125000003700 epoxy group Chemical group 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 9
- 230000036961 partial effect Effects 0.000 claims description 9
- 229920001721 polyimide Polymers 0.000 claims description 9
- 230000005855 radiation Effects 0.000 claims description 9
- 230000000977 initiatory effect Effects 0.000 claims description 8
- 230000008569 process Effects 0.000 claims description 8
- 229920002799 BoPET Polymers 0.000 claims description 7
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 7
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 7
- 229910000831 Steel Inorganic materials 0.000 claims description 6
- 239000011521 glass Substances 0.000 claims description 6
- 239000004033 plastic Substances 0.000 claims description 6
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 6
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 6
- 239000010959 steel Substances 0.000 claims description 6
- 210000002268 wool Anatomy 0.000 claims description 6
- 238000006116 polymerization reaction Methods 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 claims description 5
- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 claims description 4
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 claims description 4
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 4
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 claims description 4
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 claims description 4
- CVQVSVBUMVSJES-UHFFFAOYSA-N dimethoxy-methyl-phenylsilane Chemical compound CO[Si](C)(OC)C1=CC=CC=C1 CVQVSVBUMVSJES-UHFFFAOYSA-N 0.000 claims description 4
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 claims description 4
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 claims description 4
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 claims description 4
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims description 4
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 claims description 4
- 239000004417 polycarbonate Substances 0.000 claims description 4
- 238000010992 reflux Methods 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 claims description 4
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 claims description 4
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 claims description 4
- UMFJXASDGBJDEB-UHFFFAOYSA-N triethoxy(prop-2-enyl)silane Chemical compound CCO[Si](CC=C)(OCC)OCC UMFJXASDGBJDEB-UHFFFAOYSA-N 0.000 claims description 4
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims description 3
- 229920000515 polycarbonate Polymers 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- 239000007921 spray Substances 0.000 claims description 3
- IZRJPHXTEXTLHY-UHFFFAOYSA-N triethoxy(2-triethoxysilylethyl)silane Chemical compound CCO[Si](OCC)(OCC)CC[Si](OCC)(OCC)OCC IZRJPHXTEXTLHY-UHFFFAOYSA-N 0.000 claims description 3
- KDGNCLDCOVTOCS-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy propan-2-yl carbonate Chemical compound CC(C)OC(=O)OOC(C)(C)C KDGNCLDCOVTOCS-UHFFFAOYSA-N 0.000 claims description 2
- ODBCKCWTWALFKM-UHFFFAOYSA-N 2,5-bis(tert-butylperoxy)-2,5-dimethylhex-3-yne Chemical compound CC(C)(C)OOC(C)(C)C#CC(C)(C)OOC(C)(C)C ODBCKCWTWALFKM-UHFFFAOYSA-N 0.000 claims description 2
- AZCYBBHXCQYWTO-UHFFFAOYSA-N 2-[(2-chloro-6-fluorophenyl)methoxy]benzaldehyde Chemical compound FC1=CC=CC(Cl)=C1COC1=CC=CC=C1C=O AZCYBBHXCQYWTO-UHFFFAOYSA-N 0.000 claims description 2
- RFSCGDQQLKVJEJ-UHFFFAOYSA-N 2-methylbutan-2-yl benzenecarboperoxoate Chemical compound CCC(C)(C)OOC(=O)C1=CC=CC=C1 RFSCGDQQLKVJEJ-UHFFFAOYSA-N 0.000 claims description 2
- SIUOAIYCRNJMLQ-UHFFFAOYSA-N 3,3,4,4,5,5,5-heptafluoropentyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)C(F)(F)C(F)(F)F SIUOAIYCRNJMLQ-UHFFFAOYSA-N 0.000 claims description 2
- HJIMAFKWSKZMBK-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F HJIMAFKWSKZMBK-UHFFFAOYSA-N 0.000 claims description 2
- VQIWEYGMCDFBSW-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,12-henicosafluorododecyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F VQIWEYGMCDFBSW-UHFFFAOYSA-N 0.000 claims description 2
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 claims description 2
- 239000004342 Benzoyl peroxide Substances 0.000 claims description 2
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 claims description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 2
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 claims description 2
- 239000004952 Polyamide Substances 0.000 claims description 2
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 2
- HHKDWDAAEFGBAC-LAGVYOHYSA-N [(1s,4s)-5-bicyclo[2.2.1]hept-2-enyl]-triethoxysilane Chemical compound C1[C@@H]2C([Si](OCC)(OCC)OCC)C[C@H]1C=C2 HHKDWDAAEFGBAC-LAGVYOHYSA-N 0.000 claims description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Natural products CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 claims description 2
- 235000019400 benzoyl peroxide Nutrition 0.000 claims description 2
- 238000013461 design Methods 0.000 claims description 2
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 claims description 2
- XYYQWMDBQFSCPB-UHFFFAOYSA-N dimethoxymethylsilane Chemical compound COC([SiH3])OC XYYQWMDBQFSCPB-UHFFFAOYSA-N 0.000 claims description 2
- 150000002148 esters Chemical class 0.000 claims description 2
- 238000007765 extrusion coating Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 108010033145 microsomal ethanol-oxidizing system Proteins 0.000 claims description 2
- 150000002978 peroxides Chemical class 0.000 claims description 2
- 229920000058 polyacrylate Polymers 0.000 claims description 2
- 229920002647 polyamide Polymers 0.000 claims description 2
- 229920000728 polyester Polymers 0.000 claims description 2
- 229920000098 polyolefin Polymers 0.000 claims description 2
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 claims description 2
- 239000010453 quartz Substances 0.000 claims description 2
- 230000002441 reversible effect Effects 0.000 claims description 2
- 238000007650 screen-printing Methods 0.000 claims description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 2
- GJBRNHKUVLOCEB-UHFFFAOYSA-N tert-butyl benzenecarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1=CC=CC=C1 GJBRNHKUVLOCEB-UHFFFAOYSA-N 0.000 claims description 2
- SWAXTRYEYUTSAP-UHFFFAOYSA-N tert-butyl ethaneperoxoate Chemical compound CC(=O)OOC(C)(C)C SWAXTRYEYUTSAP-UHFFFAOYSA-N 0.000 claims description 2
- 229920001169 thermoplastic Polymers 0.000 claims description 2
- AVYKQOAMZCAHRG-UHFFFAOYSA-N triethoxy(3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F AVYKQOAMZCAHRG-UHFFFAOYSA-N 0.000 claims description 2
- MLXDKRSDUJLNAB-UHFFFAOYSA-N triethoxy(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F MLXDKRSDUJLNAB-UHFFFAOYSA-N 0.000 claims description 2
- KWEUJTRPCBXYLS-UHFFFAOYSA-N triethoxy(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,12-henicosafluorododecyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F KWEUJTRPCBXYLS-UHFFFAOYSA-N 0.000 claims description 2
- CBZXLVMVIMSMCZ-UHFFFAOYSA-N triethoxy(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,13,13,14,14,14-pentacosafluorotetradecyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F CBZXLVMVIMSMCZ-UHFFFAOYSA-N 0.000 claims description 2
- JCGDCINCKDQXDX-UHFFFAOYSA-N trimethoxy(2-trimethoxysilylethyl)silane Chemical compound CO[Si](OC)(OC)CC[Si](OC)(OC)OC JCGDCINCKDQXDX-UHFFFAOYSA-N 0.000 claims description 2
- BVQYIDJXNYHKRK-UHFFFAOYSA-N trimethoxy(3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F BVQYIDJXNYHKRK-UHFFFAOYSA-N 0.000 claims description 2
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 claims description 2
- YKTNISGZEGZHIS-UHFFFAOYSA-N 2-$l^{1}-oxidanyloxy-2-methylpropane Chemical group CC(C)(C)O[O] YKTNISGZEGZHIS-UHFFFAOYSA-N 0.000 claims 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 claims 1
- KYIKRXIYLAGAKQ-UHFFFAOYSA-N abcn Chemical compound C1CCCCC1(C#N)N=NC1(C#N)CCCCC1 KYIKRXIYLAGAKQ-UHFFFAOYSA-N 0.000 claims 1
- FOQJQXVUMYLJSU-UHFFFAOYSA-N triethoxy(1-triethoxysilylethyl)silane Chemical compound CCO[Si](OCC)(OCC)C(C)[Si](OCC)(OCC)OCC FOQJQXVUMYLJSU-UHFFFAOYSA-N 0.000 claims 1
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- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 45
- 239000011247 coating layer Substances 0.000 description 23
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- 238000001723 curing Methods 0.000 description 11
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- 239000011541 reaction mixture Substances 0.000 description 10
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- 125000003545 alkoxy group Chemical group 0.000 description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
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- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 4
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- 125000004432 carbon atom Chemical group C* 0.000 description 4
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- 238000003786 synthesis reaction Methods 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
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- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
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- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 3
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- 230000005494 condensation Effects 0.000 description 3
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Natural products CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 3
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 3
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 230000001737 promoting effect Effects 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 229910008051 Si-OH Inorganic materials 0.000 description 2
- 229910006358 Si—OH Inorganic materials 0.000 description 2
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 2
- XRMBQHTWUBGQDN-UHFFFAOYSA-N [2-[2,2-bis(prop-2-enoyloxymethyl)butoxymethyl]-2-(prop-2-enoyloxymethyl)butyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(CC)COCC(CC)(COC(=O)C=C)COC(=O)C=C XRMBQHTWUBGQDN-UHFFFAOYSA-N 0.000 description 2
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000000304 alkynyl group Chemical group 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 239000006118 anti-smudge coating Substances 0.000 description 2
- 125000002091 cationic group Chemical group 0.000 description 2
- 238000007385 chemical modification Methods 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
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- 238000009472 formulation Methods 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000004128 high performance liquid chromatography Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 230000000670 limiting effect Effects 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000012643 polycondensation polymerization Methods 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 2
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 2
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 2
- KWEKXPWNFQBJAY-UHFFFAOYSA-N (dimethyl-$l^{3}-silanyl)oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](C)C KWEKXPWNFQBJAY-UHFFFAOYSA-N 0.000 description 1
- HSLFISVKRDQEBY-UHFFFAOYSA-N 1,1-bis(tert-butylperoxy)cyclohexane Chemical compound CC(C)(C)OOC1(OOC(C)(C)C)CCCCC1 HSLFISVKRDQEBY-UHFFFAOYSA-N 0.000 description 1
- CCNDOQHYOIISTA-UHFFFAOYSA-N 1,2-bis(2-tert-butylperoxypropan-2-yl)benzene Chemical compound CC(C)(C)OOC(C)(C)C1=CC=CC=C1C(C)(C)OOC(C)(C)C CCNDOQHYOIISTA-UHFFFAOYSA-N 0.000 description 1
- QVCUKHQDEZNNOC-UHFFFAOYSA-N 1,2-diazabicyclo[2.2.2]octane Chemical compound C1CC2CCN1NC2 QVCUKHQDEZNNOC-UHFFFAOYSA-N 0.000 description 1
- 125000001989 1,3-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([H])C([*:2])=C1[H] 0.000 description 1
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 1
- 229940044613 1-propanol Drugs 0.000 description 1
- WISUNKZXQSKYMR-UHFFFAOYSA-N 2,2,3,3,4,4,5,5-octafluoropentyl prop-2-enoate Chemical compound FC(F)C(F)(F)C(F)(F)C(F)(F)COC(=O)C=C WISUNKZXQSKYMR-UHFFFAOYSA-N 0.000 description 1
- HQOVXPHOJANJBR-UHFFFAOYSA-N 2,2-bis(tert-butylperoxy)butane Chemical compound CC(C)(C)OOC(C)(CC)OOC(C)(C)C HQOVXPHOJANJBR-UHFFFAOYSA-N 0.000 description 1
- DMWVYCCGCQPJEA-UHFFFAOYSA-N 2,5-bis(tert-butylperoxy)-2,5-dimethylhexane Chemical compound CC(C)(C)OOC(C)(C)CCC(C)(C)OOC(C)(C)C DMWVYCCGCQPJEA-UHFFFAOYSA-N 0.000 description 1
- DAJFVZRDKCROQC-UHFFFAOYSA-N 3-(oxiran-2-ylmethoxy)propyl-tripropoxysilane Chemical compound CCCO[Si](OCCC)(OCCC)CCCOCC1CO1 DAJFVZRDKCROQC-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 241001486863 Sprattus sprattus Species 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- 229910009257 Y—Si Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 239000012491 analyte Substances 0.000 description 1
- 125000004653 anthracenylene group Chemical group 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 230000003669 anti-smudge Effects 0.000 description 1
- 239000002519 antifouling agent Substances 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 125000002529 biphenylenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C12)* 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000011162 core material Substances 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- HAQCYFVZKUAIEU-UHFFFAOYSA-N dichloro-fluoro-methylsilane Chemical compound C[Si](F)(Cl)Cl HAQCYFVZKUAIEU-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical compound CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- MOFUBYAISCMULF-UHFFFAOYSA-N fluoro-dimethoxy-methylsilane Chemical compound CO[Si](C)(F)OC MOFUBYAISCMULF-UHFFFAOYSA-N 0.000 description 1
- IVJISJACKSSFGE-UHFFFAOYSA-N formaldehyde;1,3,5-triazine-2,4,6-triamine Chemical class O=C.NC1=NC(N)=NC(N)=N1 IVJISJACKSSFGE-UHFFFAOYSA-N 0.000 description 1
- 239000005400 gorilla glass Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000001475 halogen functional group Chemical group 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- QLOAVXSYZAJECW-UHFFFAOYSA-N methane;molecular fluorine Chemical group C.FF QLOAVXSYZAJECW-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 125000005062 perfluorophenyl group Chemical group FC1=C(C(=C(C(=C1F)F)F)F)* 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000002096 quantum dot Substances 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- QBERHIJABFXGRZ-UHFFFAOYSA-M rhodium;triphenylphosphane;chloride Chemical compound [Cl-].[Rh].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 QBERHIJABFXGRZ-UHFFFAOYSA-M 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 235000011149 sulphuric acid Nutrition 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- HHPPHUYKUOAWJV-UHFFFAOYSA-N triethoxy-[4-(oxiran-2-yl)butyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCCC1CO1 HHPPHUYKUOAWJV-UHFFFAOYSA-N 0.000 description 1
- VOITXYVAKOUIBA-UHFFFAOYSA-N triethylaluminium Chemical compound CC[Al](CC)CC VOITXYVAKOUIBA-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- NVHGPBWXDPPIDQ-UHFFFAOYSA-N trimethoxy-[2-(oxiran-2-yl)ethyl]silane Chemical compound CO[Si](OC)(OC)CCC1CO1 NVHGPBWXDPPIDQ-UHFFFAOYSA-N 0.000 description 1
- LTOKKZDSYQQAHL-UHFFFAOYSA-N trimethoxy-[4-(oxiran-2-yl)butyl]silane Chemical compound CO[Si](OC)(OC)CCCCC1CO1 LTOKKZDSYQQAHL-UHFFFAOYSA-N 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- CESKYMDZTHKIPO-UHFFFAOYSA-N tris(2-methoxyethoxy)-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound COCCO[Si](OCCOC)(OCCOC)CCCOCC1CO1 CESKYMDZTHKIPO-UHFFFAOYSA-N 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/0427—Coating with only one layer of a composition containing a polymer binder
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/046—Forming abrasion-resistant coatings; Forming surface-hardening coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2367/00—Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
- C08J2367/02—Polyesters derived from dicarboxylic acids and dihydroxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2483/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
- C08J2483/04—Polysiloxanes
- C08J2483/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
Definitions
- the present invention relates to a layered structure comprising a flexible or bendable substrate layer (A) and a monolayer coating comprises a siloxane polymer, which comprises side chains comprising one or more fluorinated polymer groups, and a method for preparing said layered structure.
- Transparent plastics have been widely used as a core material in optical and transparent display industries.
- transparent plastics such as PET (polyethylene terephthalate), PI (polyimide), PC (polycarbonate) or PMMA (polymethyl methacrylate) have been applied in flexible electronics applications, including displays, optical lens, transparent boards, and automotive industries as a lightweight alternative to glass owing to the properties of high light transmittance and suitable refractive index.
- PET polyethylene terephthalate
- PI polyimide
- PC polycarbonate
- PMMA polymethyl methacrylate
- these plastics have the disadvantage of low abrasion resistance, because they have lower surface hardness than glass.
- Suitable flexible hard coatings are for instance polysiloxane based flexible hard coatings as e.g. disclosed in WO 2019/193258.
- Hard coatings have the drawback of reducing the visibility of e.g. the display due to an increased light reflection.
- antireflective coatings have been proposed as additional layer on hard coating layers in multilayer approaches.
- WO 2006/082701 Al discloses a two-layer coating on a transparent plastic film substrate with a first hard coating layer from a material which contains a (meth)acrylate group containing curable compound and a (meth)acrylate group-containing reactive silicone and a second antireflection (low refractive) coating layer from a material which contains a siloxane component containing compound.
- the coating shows good scratch resistance and lower rainbow pattern but does not address the problem of high reflectance.
- TW 2014-11177 A describes a monolayer coating which contains a nanoparticle mixture and a binder, having a dry-etched surface, and exhibiting a moth-eye structure formed on the dry-etched surface. This creates a plurality of prismatic structures on the hard-coating surface.
- the refractive index difference between the plastic substrate and the hard-coating layer is not large and thus the effect of reflectance decreasement is not very big.
- a monolayer coating which shows such an improved balance of properties.
- Said monolayer coating comprises a siloxane polymer which comprises side chains comprising one or more fluorinated polymer groups.
- the present invention relates to a layered structure comprising
- the substrate layer (A) a monolayer coating coated on at least one surface of the substrate layer (A), wherein the monolayer coating (B) comprises a siloxane polymer which comprises side chains comprising one or more fluorinated polymer groups; and the substrate layer (A) is flexible, bendable or both.
- the monolayer coating (B) comprises a siloxane polymer which comprises side chains comprising one or more fluorinated polymer groups; and the substrate layer (A) is flexible, bendable or both.
- the present invention relates to a method for producing a layered structure as described above or below comprising the following steps:
- composition comprising at least three different silane monomers, wherein at least one of the silane monomers includes an active group capable of achieving crosslinking to adjacent siloxane polymer, and at least one monomer comprising a fluorinated polymer group;
- composition comprising a siloxane polymer comprising side chains comprising one or more fluorinated polymer groups;
- composition comprising the siloxane polymer comprising side chains comprising one or more fluorinated polymer groups onto at least one surface of the substrate to form a monolayer coating of the composition comprising the siloxane polymer;
- the present invention relates to a silane composition
- a silane composition comprising, dispersed or dissolved in a solvent
- silane monomers • at least three different silane monomers, wherein at least one of the silane monomers includes an active group capable of achieving cross-linking to adjacent siloxane polymer, and
- composition being capable for forming upon polymerization a monolayer coating having a thickness of 1 to 50 pm, in particular about 5 to 20 pm on at least one surface of a substrate layer, which is flexible, bendable or both.
- the present invention relates to a process for producing a siloxane polymer comprising side chains comprising one or more fluorinated polymer groups comprising the following steps:
- siloxane polymer comprising side chains comprising one or more fluorinated polymer groups, said siloxane polymer being capable for forming a monolayer coating having a thickness of 1 to 50 pm, in particular about 5 to 20 pm on at least one surface of a substrate layer, which is flexible, bendable or both.
- the silane composition, the siloxane polymer, its monomers, the monolayer coating and the substrate layer preferably are defined by all their embodiments and properties as described above and below.
- the inventive monolayer coating shows an improved balance of properties in regard of mechanical properties, especially scratch resistance, and optical properties, especially a low refractive index. Due to using a monolayer coating no interlayer adhesion problems as in multilayer coatings occur.
- “Monolayer coating” in the sense of the present invention means a coating on at least one surface of the substrate layer (A) which consists of a single layer.
- the monolayer coating (B) being in adherent contact with at least one surface of the substrate layer (A) in the sense of the present invention means that there is no further coating layer or adhesive layer between the at least one surface of the substrate layer (A) and the monolayer coating (B).
- the present technology provides for layered structures wherein a substrate layer (A) is provided with a monolayer coating comprising a siloxane polymer, which comprises side chains comprising one or more fluorinated polymer groups.
- the layered structure is “bendable” in the sense that it is capable of being bent about a mandrel, having a radius of curvature, without breaking.
- the properties of bendability can be tested using a test involving infolding or out-folding of the layered structure about a mandrel as described in WO 2019/193258.
- the substrate layer (A) can be any kind of substrates such as glass, quartz, silicon, silicon nitride, polymers, metals and plastics or mixtures thereof. Furthermore, the substrate layer (A) can also include number of different surfaces such as different oxides, doped oxides, semimetals and the like or mixture thereof.
- Suitable polymers are e.g. thermoplastic polymers, such as polyolefins, polyesters, polyamides, polyimides, polycarbonates, acrylic polymers, such as poly(methylmethacrylate), and Custom Design polymers.
- thermoplastic polymers such as polyolefins, polyesters, polyamides, polyimides, polycarbonates, acrylic polymers, such as poly(methylmethacrylate), and Custom Design polymers.
- Especially preferred polymers are polymethylmethacrylate (PMMA), polyethyleneterephtalate (PET) and colorless polyimide (CPI).
- PMMA polymethylmethacrylate
- PET polyethyleneterephtalate
- CPI colorless polyimide
- the substrate layer (A) can be the outmost layer of a device or an internal layer of a single stack.
- the substrate layer (A) can be coated on one or both sides.
- the substrate layer (A) preferably has a thickness of 10 to 500 pm, more preferably 20 to 400 pm.
- the substrate layer (A) is flexible, bendable or both, such that it is capable of being bent about a mandrel having a first minimum radius of curvature without breaking.
- a layered structure of the present kind is in particular capable of being bent about a mandrel having a second minimum radius of curvature without breaking, said first minimum radius being smaller or equal to the second minimum radius of curvature.
- the layered structure is preferably bendable without crack formation in an outfolding motion for up to 20,000 times using a minimum radius of 2.5 mm.
- the layered structure is preferably bendable without crack formation in an infolding motion for up to 200,000 times using a minimum radius of 1.5 mm, preferably of 1.0 mm. Still further, the layered structure preferably does not show crack formation when elongated to 8% at an elongation rate of 0.25 inches/minute (0,64 cm/min).
- the at least one surface of the substrate layer (A) can be modified before depositing the first composition onto at least one surface of the substrate to form a monolayer coating (B).
- the at least one surface of the substrate layer (A) can be modified physically or chemically. Suitable physical modifications are plasma treatment or corona treatment or similar treatments.
- Suitable chemical modifications could be a chemical cleaning process for cleaning the at least one surface of the substrate layer (A).
- the at least one surface is preferably activated to promote adhesion between the substrate layer (A) and the first coating layer (B).
- an optional coating composition is deposited onto the at least one surface of the substrate layer (A) as such that an optional additional coating layer is formed onto the at least one surface of the substrate layer (A). Said optional additional coating layer is then on one side in adherent contact with the at least one surface of the substrate layer (A) and on the other side in adherent contact with the monolayer coating (B).
- “Adherent contact” in this regard means that there is no further coating layer or adhesive layer between the at least one surface of the substrate layer (A) and the optional additional coating layer and the optional additional coating layer and the monolayer coating (B).
- Said optional additional coating layer can have a thickness of 5 to 300 nm or a thickness of 300 nm to 5 pm.
- Said optional additional coating layer is usually applied in specific cases such as promoting the adhesion between the substrate layer (A) and the monolayer coating (B), wetting of the monolayer coating (B), promoting the optical performance of the layered structure or promoting the mechanical performance of the layered structure.
- the layered structure comprises a monolayer coating coated on at least one surface of the substrate layer (A) so that the monolayer coating (B).
- the monolayer coating (B) is in adherent contact with at least one surface of the substrate layer (A).
- “Adherent contact” in this regard means that there is no further coating layer or adhesive layer between the monolayer coating (B) and the at least one surface of the substrate layer (A).
- the monolayer coating (B) preferably has a thickness of 1 to 100 pm, preferably of 2 to 50 pm, more preferably 5 to 40 pm.
- the monolayer coating (B) comprises a siloxane polymer, which comprises side chains comprising one or more fluorinated polymer groups.
- the siloxane polymer comprises monomer units selected from at least two different silane monomers, wherein at least one of the silane monomers includes an active group capable of achieving cross-linking to adjacent siloxane polymer chains, and wherein the adjacent siloxane polymer chains are crosslinked by means of said an active groups.
- the siloxane polymer can comprise monomer units selected from 2 to 10, such as from 2 to 6, preferably from 2 to 4 different silane monomers. “Different” in this connection means that the silane monomers differ in at least one chemical moiety.
- Active groups are preferably epoxy, alicyclic epoxy groups (e.g. glycidyl), vinyl, allyl, acrylate, methacrylate and silane groups and combinations thereof.
- the epoxy, alicyclic epoxy groups e.g. glycidyl
- vinyl, allyl, acrylate, methacrylate groups are capable of achieving cross-linking to adjacent siloxane polymer chains upon a thermal or radiation initiation, preferably in the presence of a suitable initiator such as a thermal or radical initiator.
- Suitable thermal or radical initiators are preferably selected from tert-amyl peroxybenzoate, 4,4-azobis(4-cyanovaleric acid), l,l'-azobis(cyclohexanecarbonitrile), benzoyl peroxide, 2,2- bis(tert-butylperoxy)butane, 1 , 1 -bis(tert-butylperoxy)cyclohexane, 2,2'-azobisisobutyronitrile (AIBN), 2, 5 -bi s(tert-butylperoxy)-2, 5 -dimethylhexane, 2,5-bis(tert-Butylperoxy)- 2,5 - dimethyl-3 -hexyne, bis(l -(tert-butylperoxy)- 1 -methylethyl)benzene, 1 , l-bis(tert- butylperoxy)-3,3,5- trimethylcyclohexane, tert-butyl hydroper
- the silane group is capable of achieving cross-linking to a carbon-carbon double bond, such as a vinyl or allyl group) of an adjacent siloxane polymer chains upon hydrosilylation, preferably in the presence of a suitable catalyst, such as a platinum (Pt)-based catalyst such as the Speier catalyst (EbPtCle.EEO), Karstedt’s catalyst (Pt(0)-l,3-divinyl-l, 1,3,3- tetramethyldisiloxane complex solution) or a rhodium (Rh)-based catalyst such as Tris(triphenylphosphine)rhodium (I) chloride.
- a platinum (Pt)-based catalyst such as the Speier catalyst (EbPtCle.EEO)
- Karstedt’s catalyst Pt(0)-l,3-divinyl-l, 1,3,3- tetramethyldisiloxane complex solution
- Rh rhodium
- the molar ratio between monomers containing a first active group, e.g. selected from epoxy, alicyclic epoxy groups (e. g. glycidyl), and vinyl and allyl groups, to monomers containing a second active group, e.g. selected from acrylate and methacrylate groups varies in the range of 1 : 100 to 100: 1, in particular 1 : 10 to 10:1, for example 5: 1 to 1 :2 or 3 : 1 to 1: 1.
- the components containing the second active group also be selected from acrylate and metacrylate containing compounds other than silane monomers, such as tetraethylene glycol diacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, ditrimethylol propane tetraacrylate, dipentaerythritol pentaacrylate, and dipentaerythritol hexaacrylate and combinations thereof.
- silane monomers such as tetraethylene glycol diacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, ditrimethylol propane tetraacrylate, dipentaerythritol pentaacrylate, and dipentaerythritol hexaacrylate and combinations thereof.
- the active group or active groups will be present in a concentration of about 1 to 35 % based on the molar portion of monomers.
- Suitable silane monomers are preferably represented by formula (I) R 1 aSiX4-a (I) wherein
- R 1 is selected from hydrogen and a group comprising linear and branched alkyl, cycloalkyl, alkenyl, alkynyl, (alk)acrylate, epoxy, allyl, vinyl and alkoxy and aryl having 1 to 6 rings, and wherein the group is substituted or unsubstituted;
- X is a hydrolysable group or a hydrocarbon residue; and a is an integer 1 to 3.
- the hydrolysable group is in particular an alkoxy group (cf. formula II).
- alkoxy groups of R 1 and/or the hydrolysable group X can be identical or different and preferably selected from the group of radicals having the formula
- R 2 stands for a linear or branched alkyl group having 1 to 10, preferably 1 to 6 carbon atoms, and optionally exhibiting one or two substituents selected from the group of halogen, hydroxyl, vinyl, epoxy and allyl. Most preferred are methoxy and ethoxy groups.
- di-, tri- or tetraalkoxysilanes comprising alkoxy groups according to formula (II).
- silane monomers are selected from the group of tetraethoxy silane (TEOS), tetramethoxysilane (TMS), methyltriethoxysilane (MTEOS), methyltrimethoxysilane (MTMS), dimethyldiethoxysilane (DMDEOS), dimethyldimethoxysilane (DMDMS), diphenyldimethoxysilane (DPDMS), 3-(Trimethoxysilyl)propylmethacrylate (MEMO), 3- (Triethoxysilyl)propylmethacrylate, 5-(Bicycloheptenyl)triethoxysilane (BCHTEOS), (3- Glycidoxypropyl)tri ethoxy silane, (3 -Glycidoxypropyl)trimethoxy silane (GPTMS), (Heptadecafluoro- 1 , 1 , 2, 2-tetrahydrodecyl)trimethoxy silane, (Heptadecafluor
- Said silane monomers are preferably present in the siloxane polymer in a molar amount of 50 to 99.99 wt%, preferably of 60 to 99 wt%, still more preferably of 75 to 97 wt%.
- the at least two different silane monomers of the first siloxane polymer (B-l) comprise at least one bi-silane.
- Suitable bi-silanes are preferably represented by formula (III) (R 3 ) 3 Si-Y-Si(R 4 ) 3 , (III) wherein
- R 3 and R 4 are independently selected from hydrogen and a group consisting of linear or branched alkyl, cycloalkyl, alkenyl, alkynyl, (alk)acrylate, epoxy, allyl, vinyl, alkoxy and aryl having 1 to 6 rings, and wherein the group is substituted or unsub stitued; and
- alkyl residue stands for 1 to 10, preferably 1 to 8, or 1 to 6 or even 1 to 4 carbon atoms, examples include ethylene and methylene and propylene.
- “Arylene” stands for an aromatic bivalent group containing typically 1 to 3 aromatic rings, and 6 to 18 carbon atoms. Such groups are exemplified by phenylene (e.g. 1,4-phenylene and 1,3-phenylene groups) and biphenylene groups as well as naphthylene or anthracenylene groups.
- alkylene and arylene groups can optionally be substituted with 1 to 5 substituents selected from hydroxy, halo, vinyl, epoxy and allyl groups as well as alkyl, aryl and aralkyl groups.
- Preferred alkoxy groups contain 1 to 4 carbon atoms. Examples are methoxy and ethoxy.
- phenyl includes substituted phenyls such as phenyltrialkoxy, in particular phenyltrimethoxy or tri ethoxy, and perfluorophenyl.
- phenyltrialkoxy in particular phenyltrimethoxy or tri ethoxy
- perfluorophenyl perfluorophenyl.
- the phenyl as well as other aromatic or alicyclic groups can be coupled directly to a silicon atom or they can be coupled to a silicon atom via a methylene or ethylene bridge.
- bi-silanes include 1,2-Bis(triethoxysilyl)ethane (BTESE), 1,2- Bis(trimethoxysilyl)ethane (MEOS) and mixtures thereof.
- the bi-silane present in the siloxane polymer in a molar amount of 0 to 35 wt%, preferably of 1 to 25 wt%, still more preferably of 3 to 20 wt%.
- the siloxane polymer comprises at least one, such as 1 to 10, preferably 1 to 6, more preferably 1 or 2, most preferably one monomer comprising a fluorinated polymer group.
- Said monomer comprising a fluorinated polymer group is preferably selected from fluorinated polysiloxanes and modified perfluoropolyethers.
- the modified perfluoropolyethers are preferably selected from silane modified perfluoropolyethers, carboxyester modified perfluoropolyethers, such as acrylate modified perfluoropolyethers and methacrylate modified perfluoropolyethers, epoxy-based perfluoropolyethers and mixtures thereof.
- Such fluorinated polysiloxanes and modified perfluoropolyethers can be commercially available from Shin-Etsu Subelyn® fluorinated anti-smudge coating components of the KY- 100 Series, such as KY-1900 and KY-1901, Shin-Etsu Subelyn® fluorinated anti-smudge additives of the KY-1200 Series, such as KY-1271, or Daikin fluorinated anti-smudge coating components of the OPTOOL Series such as OPTOOL UD-509, OPTOOL UD-120 and OPTOOL DSX.
- fluorinated polysiloxanes are for example poly(methyl-3,3,3- trifluoropropyl)siloxane having a molecular weight in the range of from 1500 to 20000 g/mol, preferably from 2000 to 15000 g/mol.
- the at least one fluorinated monomer is preferably present in the siloxane polymer in a weight amount of 0.01 to 10 wt%, preferably of 0.02 to 7 wt%, still more preferably of 0.05 to 5 wt%.
- the monomers are selected from mixture of two or more of the group of 1,2-Bis(triethoxysilyl)ethane (BTESE), 3-(Trimethoxysilyl)propylmethacrylate (MEMO), and (3 -Glycidoxypropyl)trimethoxy silane (GPTMS) and additionally a fluorinated monomer selected from KY-1900, and KY-1901, KY-1271, OPTOOL UD-509, OPTOOL UD-120, OPTOOL DSX or poly(methyl-3,3,3-trifluoropropyl)siloxane having a molecular weight in the range of from 1500 to 20000 g/mol, preferably from 2000 to 15000 g/mol .
- composition comprising the siloxane polymer is preferably formed by a method comprising the steps of
- the first solvent is preferably selected from the group of acetone, tetrahydrofuran (THF), toluene, 1 -propanol, 2-propanol, methanol, ethanol, water (H2O), cyclopentanone, acetonitrile, propylene glycol propyl ether, methyl-tert-butylether (MTBE), propylene glycol monomethylether acetate (PGMEA), methyl ethyl ketone, methyl isobutyl ketone, propylene glycol monomethylether (PGME) and propylene glycol propyl ether (PnP).
- the monomers can be admixed in the first solvent at any suitable temperature for solving the monomers. Usually, room temperature suffices.
- the mixture is subjected to an at least partial hydrolysis in the presence of a catalyst.
- Suitable catalysts are acidic catalysts, basic catalysts or other catalysts.
- Acidic catalysts are preferably selected from nitric acid (HNO3), sulfuric acid (H2SO4), formic acid (HCOOH), hydrochloric acid (HC1), sulfonic acid, hydrogen fluoride (HF), acetic acid (CH3COOH), trifluoromethanesulfonic acid or -toluene sulfonic acid.
- nitric acid HNO3
- sulfuric acid H2SO4
- formic acid HCOOH
- hydrochloric acid HC1
- sulfonic acid hydrogen fluoride
- HF hydrogen fluoride
- CH3COOH acetic acid
- trifluoromethanesulfonic acid or -toluene sulfonic acid Especially preferred acidic catalysts are nitric acid (HNO3) and hydrochloric acid (HC1).
- Basic catalysts are preferably selected from triethylamine (TEA), ammonium hydroxide (NH4OH), tetraethylammonium hydroxide (TEAH), tetramethylammonium hydroxide (TMEA), l,4-diazabicyclo[2.2.2]octane, imidazole and diethylenetriamine.
- Other catalysts are preferably selected from 2,2,3,3,4,4,5,5-octafluoropentylacrylate, poly(ethylene glycol) 200, poly(ethylene glycol) 300 and n-butylated melamine formaldehyde resin.
- the hydrolysis step is preferably performed at a temperature of from 20 to 80°C for 1 to 24 hours, such as at room temperature overnight.
- the monomers are at least partially hydrolysed.
- Said at least partially hydrolysed monomers then are at least partially polymerized, preferably by condensation polymerization and crosslinked to form a siloxane polymer, which comprises side chains comprising one or more fluorinated carbon groups.
- Said siloxane polymer usually has a relatively low molecular weight in range of about 500 to 30000 g/mol.
- the subjecting the mixture to an at least partial hydrolysis includes refluxing.
- a typical refluxing time is 2 h.
- the first solvent can be changed to a second solvent in an optional further method step after the hydrolysis step.
- the optional solvent change is advantageous, since it assists the removal of water and alcohols formed during hydrolysis of the monomers. In addition, it improves the properties of the final siloxane polymer solution when used as coating layer(s) on the substrate.
- the second solvent is preferably selected from the group of propylene glycol methyl ether (PGME), propylene glycol methyl ether acetate (PGMEA), 1 -ethanol, 2-ethanol (IP A), acrylonitrile diacetone alcohol (DAA), methyl isobutyl ketone (MIBK) or propylene glycol n- propyl ether (PnP).
- PGME propylene glycol methyl ether
- PMEA propylene glycol methyl ether acetate
- IP A 2-ethanol
- DAA acrylonitrile diacetone alcohol
- MIBK methyl isobutyl ketone
- PnP propylene glycol n- propyl ether
- the mixture comprising the siloxane polymer can be further subjected to a crosslinking step after the hydrolysis step. Thereby, the siloxane polymer is preferably at least partially crosslinked by hydrosilylation, thermal or radiation initiation.
- the term “partially crosslinked” means that the polymer is capable of further crosslinking at conditions conducive to cross-linking.
- the polymer still contains at least some reactive, crosslinking groups after the first polymerisation step.
- the further crosslinking which typically takes place after deposition of the partially crosslinked composition on a substrate, will be described below.
- the siloxane polymer is preferably at least partially crosslinked by hydrosilylation, thermal or radiation initiation using catalysts as described above.
- thermal crosslinking is preferably conducted at temperatures in the range of about 30 to 200 °C.
- cross-linking is carried out at refluxing conditions of the solvent.
- the siloxane polymer can be optionally partially cross-linked during polymerization, in particular during or immediately after condensation polymerization.
- Various methods can be used for achieving cross-linking.
- cross-linking method where two chains are joined via reactive groups not affecting any of the active groups intended for the UV curing can be employed.
- hydrosilylation for example using a proton on one chain reacting with a double bond on another chain will achieve cross-linking of desired kind.
- Another example is cross-linking through double bonds or epoxy groups.
- the cross-linking of the siloxane polymer can be achieved with an active group having double bonds or epoxy groups or both, such as epoxy, vinyl or allyl or methacrylate group using radical initiators and photoacid generators.
- Epoxy groups can be employed for UV-curing and vice versa.
- the proportion of active groups required for cross-linking is generally smaller than for UV curing, e.g. about 0.1 to 10 mol%, based on the monomers, for cross-linking and about 5 to 50 mol%, based on the monomers, for UV curing.
- the amount of the initiator added to the reaction mixture/ solution is generally about 0.1 to 10 wt%, preferably about 0.5 to 5 wt%, calculated from the total weight of the siloxane polymer.
- the molecular weight will typically be 2- to 10-folded.
- the crosslinking will increase it above 3000, preferably to 4000 to 20000 g/mol.
- resulting free Si-OH groups present in backbone of the siloxane polymer can be protected by an end-capping.
- the free Si-OH groups are reacted with silanes such as methyldichlorofluorosilane (ChFSiCHs, methylfluorodimethoxy silane ((MeO)2SiFCH3), 3 -chloropropyltrimethoxy silane (Cl(CH2)3Si(OMe)3), ethyltrimethoxysilane (ETMS), or trimethylchlorosilane (CISiMes) in presence of a catalyst such as tri ethylaluminium (TEA) or imidazole.
- TSA tri ethylaluminium
- imidazole ethylaluminium
- the amount of catalyst varies from 1.5 to 2 wt% of total solid.
- the reaction time varies from 40 to 45 min.
- additives typically introduced into the first composition comprising the third siloxane polymer (D-l) include chemicals that can further modify the final surface properties of coated and cured film or improve wettability/adhesion properties of the coating layer (B) to the substrate layer (A) or the other coating layer (C) or improve coating drying and packing behavior during deposition and drying to reach good visual quality.
- additives can be surfactants, defoamers, antifouling agents, wetting agents etc.
- additives include: BYK-301, BYK-306, BYK-307, BYK-308, BYK-333, BYK-051, BYK-036, BYK-028, BYK-057A, BYK-011, BYK-055, BYK-036, BYK-067A, BYK-088, BYK-302, BYK-310, BYK-322, BYK-323, BYK-331, BYK-333, BYK-341, BYK- 345, BYK-348, BYK-377, BYK-378, BYK-381, BYK-390, BYK-3700, all commercially available from BYK Chemie GmbH.
- the additives are preferably present in an amount of 0.01-5 wt% by weight, more preferably 0.1 to 1 wt% of the total weight of the solids.
- the excess of water is preferably removed from the material and at this stage it is possible to make a solvent exchange to another synthesis solvent if desired.
- This other synthesis solvent may function as the final or one of the final processing solvents of the siloxane polymer.
- the residual water and alcohols and other by-products may be removed after the further condensation step is finalized.
- Additional processing solvent(s) may be added during the formulation step to form the final processing solvent combination. Additives such as thermal initiators, radiation sensitive initiators, sensitizers, surfactants and other additives may be added prior to final filtration of the siloxane polymer.
- the polymer is ready for processing in, for example, roll-to-roll film deposition or in a lithographic process.
- the concentration/ content of the group capable of being deprotonated e. g. an OH-group
- any residual leaving groups from the silane precursors e.g. alkoxy groups
- the concentration/ content of the group capable of being deprotonated e. g. an OH-group
- any residual leaving groups from the silane precursors e.g. alkoxy groups
- the molecular weight of the polymer greatly affects dissolution of the siloxane polymer material into the aqueous based developer solution.
- the molecular weight of the polymer also greatly effects on the dissolution properties of the siloxane polymer into developer solutions.
- the final siloxane polymer when the final siloxane polymer has a high content of hydroxyl groups remaining and a low content of alkoxy (e.g. ethoxy) groups, the final siloxane polymer can be dissolved into an alkaline-water developer solution (e.g. tetra methyl ammonium hydroxide; TMAH, or potassium hydroxide; KOH).
- an alkaline-water developer solution e.g. tetra methyl ammonium hydroxide; TMAH, or potassium hydroxide; KOH.
- the final siloxane polymer has a very low solubility in an alkaline-water developer of the above kind.
- the OH-groups or other functional groups such as amino (NH2), thiol (SH), carboxyl, phenol or similar that result in solubility to the alkaline developer systems, can be attached directly to the silicon atoms of the siloxane polymer backbone or optionally attached to organic functionalities attached into the siloxane polymer backbone to further facilitate and control the alkaline developer solubility.
- the siloxane polymer composition can be diluted using a proper solvent or solvent combination to give a solid content which in film deposition will yield the preselected film thickness.
- an initiator molecule compound is added to the siloxane composition after synthesis.
- the initiator which can be optionally similar to the one added during polymerization, is used for creating a species that can initiate the polymerization of the “active” functional group in the UV curing step.
- cationic or anionic initiators can be used in case of an epoxy group.
- radical initiators can be employed in case of a group with double bonds as “active” functional group in the synthesized material.
- thermal initiators working according to the radical, cationic or anionic mechanism
- the choice of a proper combination of the photoinitiators and sensitizers also depends on the used exposure source (wavelength).
- the concentration of the thermal or radiation initiator and sensitizers in the composition is generally about 0.1 to 10 %, preferably about 0.5 to 5 %, calculated from the mass of the siloxane polymer.
- the composition as described above may comprise solid nanoparticles or other compounds in an amount of between 1 and 50 wt.-% of the composition.
- the nanoparticles (or similar nano- , or microscale rods, crystals, spheres, dots, buds etc.) are in particular selected from the group of light scattering, light absorbing, light emitting and/or conductive pigments, dyes, organic and inorganic phosphors, oxides, quantum dots, polymers or metals.
- composition comprising the siloxane polymer as described above is deposited onto the onto at least one surface of the substrate layer (A) to form a monolayer coating (B).
- the monolayer coating (B) is in adherent contact with the at least one surface of the substrate layer (A).
- Suitable deposition methods include spin-on, clip, spray, ink-jet, roll-to-roll, gravure, reverse gravure, bar coating, slot, flexo-graphic, curtain, screen printing coating methods, extrusion coating, dip coating, flow coating or slit coating.
- the deposited composition forms the monolayer coating (B) on the surface of the substrate layer (A).
- the solvent is evaporated and the monolayer coating (B), preferably by thermal drying or optionally by vacuum and/or thermal drying combined. This step is also referred to as pre-curing.
- the monolayer coating (B) is cured to final hardness by using UV exposure followed by thermal curing at elevated temperature.
- the pre-curing and the final curing steps are combined by carrying out heating by using an increasing heating gradient.
- the curing can be performed in three steps, the process comprising thermal pre-cure and UV- cure followed by final thermal cure. It is also possible to apply a two step curing process where thermal pre-cure is followed by UV-cure. In such a case no final thermal cure is preferably applied after UV-cure.
- the method further includes developing the deposited film.
- developing comprises exposing (full area or selective exposure using photomask or reticle or laser direct imaging) the deposited first siloxane polymer composition to UV light.
- the step of developing is typically carried out after any pre-curing step and before a final curing step.
- the method comprises the steps of
- Exemplary epoxy -functional group containing monomers include (3- glycidoxypropyl)trimethoxysilane, l-(2-(Trimethoxysilyl)ethyl)cyclohexane-3,4-epoxide, (3- glycidoxypropyl)tri ethoxy silane, (3- glycidoxypropyl)tripropoxy silane, 3- glycidoxypropyltri(2-methoxyethoxy)silane, 2,3 -epoxypropyltri ethoxy silane, 3,4- epoxybutyltriethoxysilane, 4,5- epoxypentyltriethoxysilane, 5,6-epoxyhexyltriethoxysilane, 5,6- epoxyhexyltrimethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltriethoxysilane, 2-(3,4- epoxy cy cl ohexyl)e
- acrylate and metacrylate compounds such as tetraethylene glycol diacrylate, trimethylo Ipropane triacrylate, pentaerythritol triacrylate, ditrimethylolpropane tetraacrylate, dipentaerythritol pentaacrylate, and dipentaerythritol hexaacrylate and combinations thereof.
- tetraethylene glycol diacrylate trimethylo Ipropane triacrylate
- pentaerythritol triacrylate ditrimethylolpropane tetraacrylate
- dipentaerythritol pentaacrylate dipentaerythritol hexaacrylate and combinations thereof.
- Such compounds can be used as part of the silane compositions.
- the method further includes curing the composition.
- the thickness of the monolayer coating (B) on the at least one surface of the substrate layer (A) may range from 1 to 100 pm, preferably of 2 to 50 pm, more preferably 5 to 40 pm.
- the monolayer coating (B) preferably is a flexible hard coat layer.
- the pencil hardness of the monolayer coating (B) is at least 2H, more preferably 3H, still more preferably at least 4H, as determined by ASTM D3363-00, Elcometer tester.
- the monolayer coating (B) has an adhesion of 4B-5B, as tested by ASTM D3359- 09, Cross-Hatch tester.
- the monolayer coating (B) preferably has scratch resistance as evidenced by no visual scratches on a Taber linear abrasion test (Using Linear Abraser from Taber Industries) carried out at up to 2000 linear cycles with BonStar steel wool #0000, at 1kg weight, 2x2 cm head size, 2.0 inch stroke length, 60 cycles/min and Rubber abrasion test.
- the monolayer coating (B) preferably has a scratch resistance as evidenced by no visual scratches in a Minoan rubber abrasion test using TABER ® Linear Abraser-Model 5750, Minoan rubber, 1 kg weight lead, 40 cycles / min, 1000 cycles.
- the layered structure according to the present invention comprises the substrate layer (A) and the monolayer coating (B).
- the monolayer coating (B) is preferably the outermost layer of the layered structure and preferably in adherent contact with at least one surface of the substrate layer (A). This means that no further coatings or coating layers are applied on the at least one surface of the substrate layer (A).
- the layered structure shows a good balance of properties of adhesion of the different layers to each other, high scratch resistance and low reflectance.
- the layered structure of preferably shows a scratch resistance of no visual scratches in a Taber linear abrasion test (Using Linear Abraser from Taber Industries) carried out at up to 2000 linear cycles with BonStar steel wool #0000, at 1kg weight, 2x2 cm head size, 2.0-inch stroke length, 60 cycles/min.
- the layered structure preferably has a scratch resistance as evidenced by no visual scratches in a Minoan rubber abrasion test using TABER ® Linear Abraser-Model 5750, Minoan rubber, 1 kg weight lead, 40 cycles / min, 1000 cycles.
- the layered structure preferably has a water contact angle (WCA) of at least 95°, more preferably at least 98°, still more preferably at least 100° in a Taber linear abrasion test (Using Linear Abraser from Taber Industries) carried out at up to 2000 linear cycles with BonStar steel wool #0000, at 1kg weight, 2x2 cm head size, 2.0-inch stroke length, 60 cycles/min.
- WCA water contact angle
- the layered structure preferably has a water contact angle (WCA) of at least 90 in a Minoan rubber abrasion test using TABER ® Linear Abraser-Model 5750, Minoan rubber, 1 kg weight lead, 40 cycles / min, 1000 cycles. Additionally, the layered structure preferably shows a refractive index of from 1.40 to 1.55, more preferably from 1.45 to 1.50.
- WCA water contact angle
- the layered structure preferably shows a transmittance of at least 89.5%, more preferably from 89.8% to 90.5% at a wavelength of 550 nm, when measured on a coated colorless polyimide (CPI) 50-micron film.
- CPI coated colorless polyimide
- the layered structure preferably shows an increase of transmittance of from 0.5 to 1.5%, compared to the uncoated CPI film at a wavelength of 550 nm.
- the layered structure preferably shows a transmittance of at least 90.8%, more preferably from 90.9% to 91.5% at a wavelength of 550 nm, when measured on a coated polyethylene terephthalate (PET) 50 micron film.
- PET polyethylene terephthalate
- the layered structure preferably shows an increase of transmittance of from 0.2 to 1.0%, compared to the uncoated PET film at a wavelength of 550 nm.
- the layered structure preferably has a haze of not more than 0.5%, preferably from 0.1 to 0.4%, when measured on a coated colorless polyimide (CPI) film.
- CPI coated colorless polyimide
- the layered structure preferably has a haze of not more than 0.8%, preferably from 0.2 to 0.6%, when measured on a coated polyethylene terephthalate (PET) film.
- PET polyethylene terephthalate
- the layered structure is preferably capable of being bent about a mandrel having a radius of curvature without breaking, as evidenced as a value of less than 0.8 cm, in particular less than 0.4 cm, on an outfolding mandrel diameter test.
- the layered structure according to the present invention is suitable for flexible electronics applications, including displays, optical lens, transparent boards, and automotive industries especially as a lightweight alternative to glass.
- Molecular weight the polymers were characterized by gel permeation chromatography.
- the chromatographic system consisted of a GPC apparatus equipped with an isocratic HPLC pump and a refractive index detector.
- the polysiloxanes (0,20 g; 50% solid content) were dissolved in THF (HPLC-grade; 2,30 g).
- the analyte injection volume was 100 pL, the flow was 0,70 mL / min, and the column temperature was set to 40 °C.
- Four polysterene exclusion-based columns were used.
- the mobile phase was THF (HPLC grade).
- Number-average molecular weight (Mn) and the weight-average molecular weight ( ) of the polymers were determined using internal standards, e.g.
- Solid contents The solid content of the polymers was determined using a Mettler Toledo HB43 instrument. The sample was weighted on aluminum dish / cup and the measurement was performed using about 1 g of material.
- Film thickness and refractive index (RI) the film thickness and refractive index were measured using Ellipsometer UVISEL-VASE Horiba Jobin-Yvon. Measurements are performed using Gorilla Glass 4 or silicon wafer (diameter: 150 mm, Type/Dopant: P/Bor, Orientation: ⁇ l-0-0>, Resistivity: 1-30 Q.cm, thickness: 675 +/- 25 pm, TTV: ⁇ 5 pm, particle: ⁇ 20 @ 0,2 pm, Front surface: polished; back surface: etched; Flat 1 SEMI standard) or other suitable substrates.
- RI Film thickness and refractive index
- a spray tool typically sprat process: scan speed: 300 mm/s; pitch: 50 mm; gap: 100 mm; flow rate: 5-6 ml/min; atomization air pressure: 5 kg / cm 2 .
- T% and reflection (R%) A Konica Minolta spectrophotometer CM-3700A (Specta Magic NX software) was used to measure transmittance and reflectance.
- Pencil hardness the pencil hardness was determined according to ASTM standard D3363-00 using a Elcometer pencil hardness tester.
- WCA Water contact angle
- Abrasion testing was carried out using for example Bon Star steel wool #000, 1 kg load, 1 x 1 cm head, 2.0-inch stroke, 60 cycles / min speed, using taber linear abraser 5750 and using TABER ® Linear Abraser-Model 5750, Minoan rubber, 1 kg weight lead, 40 cycles / min, 1000 cycles.
- VQ Visual quality: the visual inspection can be observed with bare eyes, under microscope using a green or red-light quality lamp inspection. The visual quality can be scored between 0 (best) to 3 (worse).
- Adhesion the adhesion was determined according to ASTM standard D3359-D9 using a Elcometer cross-hatch tester and Elcometer tape test.
- BTESE In a 500 mL round bottom flask, BTESE (5,3g; 0,0150 mol), GPTMS (22,8 g; 0.0965 mol), MEMO (9,25 g; 0,0372 mol), KY1900 (0,5g) are mixed in Acetone (28g; 0.4821 mol). HNO3 (0,lM; 9,5 g; 0,5278 mol) is added dropwise over 15 min and the reaction mixture is stirred at room temperature overnight. PGME (7,8 g; 0,086 mol) is added and solvent exchange procedure from acetone to PGME was performed.
- BTESE In a 500 mL round bottom flask, BTESE (5,3g; 0,0150 mol), GPTMS (22,8 g; 0.0965 mol), MEMO (9,25 g; 0,0372 mol), KY1900 (1,0g) are mixed in Acetone (28g; 0.4821 mol). HNO3 (0,lM; 9,5 g; 0,5278 mol) is added dropwise over 15 min and the reaction mixture is stirred at room temperature overnight. PGME (7,8 g; 0,086 mol) is added and solvent exchange procedure from acetone to PGME was performed.
- Example 3 FlexHC with KY1900 in IPA instead of acetone (solubility issues of KY1900 in acetone)
- BTESE In a 500 mL round bottom flask, BTESE (5,3g; 0,0150 mol), GPTMS (22,8 g; 0.0965 mol), MEMO (9,25 g; 0,0372 mol), KY1900 (0,5g) are mixed in IPA (26,25g; 0.4368 mol). HNO3 (0,lM; 8,87 g; 0,4928 mol) is added dropwise over 15 min and the reaction mixture is stirred at room temperature overnight. PGME (27,26 g; 0,3024 mol) is added and solvent exchange procedure from acetone to PGME was performed.
- Example 4 FlexHC with KY1900 in IPA (KY1900 added in 2 nd step)
- BTESE 5,3g; 0,0150 mol
- GPTMS 22,8 g; 0.0965 mol
- MEMO 9,25 g; 0,0372 mol
- HNO 3 (0,lM; 8,87 g; 0,4928 mol) is added dropwise over 15 min and the reaction mixture is stirred at room temperature overnight.
- KY1900 (0.15g) added HNO3 (0,lM; 1,0 g; 0,0556 mol) dropwise.
- PGME 27,26 g; 0,3024 mol
- solvent exchange procedure from acetone to PGME was performed.
- BTESE In a 500 mL round bottom flask, BTESE (5,3g; 0,0150 mol), GPTMS (22,8 g; 0.0965 mol), MEMO (9,25 g; 0,0372 mol), OPTOOL DSX (0,2g) are mixed in IPA (26,25g; 0.4368 mol). HNO3 (0,lM; 8,87 g; 0,4928 mol) is added dropwise over 15 min and the reaction mixture is stirred at room temperature overnight. PGME (27,26 g; 0,3024 mol) is added and solvent exchange procedure from acetone to PGME was performed.
- BTESE 24,0 g; 0.0677 mol
- GPTMS 100 g; 0,4231 mol
- MEMO 40g; 0.1611 mol
- KY1271 0.1 wt% to 2,5 wt%)
- Acetone 160g; 2,75 mol
- HNO3 0.1611 mol
- PGME 140 g; 1,553 mol
- BTESE 24,0 g; 0.0677 mol
- GPTMS 100 g; 0,4231 mol
- MEMO 40g; 0.1611 mol
- OPTOOL 0.1 wt% to 2,5 wt%)
- Acetone 160g; 2,75 mol
- HNO3 0.1611 mol
- PGME 140 g; 1,553 mol
- composition of example 9 comprising the polymer of BTESE, GPTMS, MEMO and 0.5 wt% KY1271 in PGME was mixed with 1% BYK333 and 1% BYK067A in order to obtain the coating composition.
- the coating compositions were deposited onto a polyethyleneterephtalate (PET) film 50 pm and on a colorless polyimide (CPI) film 50 pm and cured.
- PET polyethyleneterephtalate
- CPI colorless polyimide
- the coating and curing compositions were as follows: for PET film: 120 degree celcius/90 sec, UV-500W (90sec), 120 degree celcius/10 min, bar coater #4 (for thick film- 7-8 pm) or Mayer rod for CPI film: 120-140 degree celcius /90 sec, UV-500W (90sec), 140 degree celcius /10 min, bar coater #4 (for thick film- 7-8 m)
- Abrasion test The coated PET and CPI films were subjected to a steelwool abrasion test and Minoan rubber abrasion test. After 400, 800 1200, 1600 and 2000 cycles in the steelwool abrasion test and after 1000 cycles in the Minoan rubber abrasion test visual quality and the water contact angle were determined. The results are shown in Table 1 below.
- ble 1 Results of abrasion test, comparison of visual quality (VQ) and water contact angle (WCA)
- Figure 1 shows the transmittance of the CPI film coated with the inventive coating compared with uncoated CPI film.
- the coated CPI film shows a higher transmittance compared to the uncoated CPI film (bare CPI).
- Figure 2 shows the transmittance of the PET film coated with the inventive coating compared with uncoated PET film.
- the coated PET film shows a higher transmittance compared to the uncoated PET film (bare PET).
- Table 2 shows the optical properties and pencil hardness of the inventive coating on PET and CPI films compared with uncoated PET and CPI films.
Abstract
The present invention relates to a layered structure comprising a flexible or bendable substrate layer (A) and a monolayer coating comprises a siloxane polymer, which comprises side chains comprising one or more fluorinated polymer groups, and a method for preparing said layered structure.
Description
Flexible monolayered polysiloxane hard coating
The present invention relates to a layered structure comprising a flexible or bendable substrate layer (A) and a monolayer coating comprises a siloxane polymer, which comprises side chains comprising one or more fluorinated polymer groups, and a method for preparing said layered structure.
Technical background
Transparent plastics have been widely used as a core material in optical and transparent display industries. In particular, transparent plastics such as PET (polyethylene terephthalate), PI (polyimide), PC (polycarbonate) or PMMA (polymethyl methacrylate) have been applied in flexible electronics applications, including displays, optical lens, transparent boards, and automotive industries as a lightweight alternative to glass owing to the properties of high light transmittance and suitable refractive index. However, these plastics have the disadvantage of low abrasion resistance, because they have lower surface hardness than glass.
For increasing abrasion resistance and photopatternability hard coating films have been suggested, which are flexible and bendable. Suitable flexible hard coatings are for instance polysiloxane based flexible hard coatings as e.g. disclosed in WO 2019/193258.
Hard coatings have the drawback of reducing the visibility of e.g. the display due to an increased light reflection. In order to reduce light reflections antireflective coatings have been proposed as additional layer on hard coating layers in multilayer approaches.
For instance WO 2006/082701 Al discloses a two-layer coating on a transparent plastic film substrate with a first hard coating layer from a material which contains a (meth)acrylate group containing curable compound and a (meth)acrylate group-containing reactive silicone and a second antireflection (low refractive) coating layer from a material which contains a siloxane component containing compound.
Other two layer approaches of a hard coating layer and a low refractive layer are suggested e.g. in US 11,046,827 B2 and KR 2004-0076422A.
Even three-layer coatings of a hard coating layer, a high refractive layer and a low refractive layer have been suggested e.g. in JP 2001-293818A.
Such multilayer approaches have the drawback of reduced scratch resistance and a mismatch of refractive indices, which results in a heavy rainbow pattern as discussed e.g. in as discussed in CN 206270519 U. On reason for the poor scratch resistance could be that the hard coating layer for improving scratch resistance is usually the inner layer in direct contact with the plastic substrate and the adhesion to the low refractive outer layer is rather weak.
When applying the low refractive layer as inner layer and the hard coating layer as outer layer as discussed in TW 2009-16818 A the coating shows good scratch resistance and lower rainbow pattern but does not address the problem of high reflectance.
As the multilayer structures have technical challenges, a more efficient method would be to decrease the reflectance and increase the scratch resistance in a single layer. Attempts to increase the low-refractive layer scratch-resistance has been performed by adding nanometer sized particles, such as silica or alumina, but affecting the scratch resistance and lowering the reflectance in a single layer has been challenging. The single-layer solution typically compromises both in optics and scratch resistance properties. TW 2014-11177 A describes a monolayer coating which contains a nanoparticle mixture and a binder, having a dry-etched surface, and exhibiting a moth-eye structure formed on the dry-etched surface. This creates a plurality of prismatic structures on the hard-coating surface. So, in addition to anti -reflective hard-coating having high level of nanoparticles, a dry-etching procedure is performed, nanoparticles acting as an etching mask, resulting in a surface having good adhesion properties for the possible external layers like printing inks.
Generally, when the refractive index is higher than 1.45, the refractive index difference between the plastic substrate and the hard-coating layer is not large and thus the effect of reflectance decreasement is not very big.
Thus, there is a need in the art for flexible coatings on transparent plastic substrates, which are flexible and show an improved balance of properties in regard of mechanical properties such
as scratch resistance and optical properties such as a low refractive index for reducing light reflection.
In the present invention a monolayer coating is suggested which shows such an improved balance of properties. Said monolayer coating comprises a siloxane polymer which comprises side chains comprising one or more fluorinated polymer groups.
Summary of the invention
The present invention relates to a layered structure comprising
(A) a substrate layer; and
(B) a monolayer coating coated on at least one surface of the substrate layer (A), wherein the monolayer coating (B) comprises a siloxane polymer which comprises side chains comprising one or more fluorinated polymer groups; and the substrate layer (A) is flexible, bendable or both.
Further, the present invention relates to a method for producing a layered structure as described above or below comprising the following steps:
• Providing a composition comprising at least three different silane monomers, wherein at least one of the silane monomers includes an active group capable of achieving crosslinking to adjacent siloxane polymer, and at least one monomer comprising a fluorinated polymer group;
• Subjecting the composition to at least partial hydrolysis of the monomers to form a composition comprising a siloxane polymer comprising side chains comprising one or more fluorinated polymer groups;
• Providing a substrate which is flexible or bendable or both;
• Depositing the composition comprising the siloxane polymer comprising side chains comprising one or more fluorinated polymer groups onto at least one surface of the
substrate to form a monolayer coating of the composition comprising the siloxane polymer;
• Cross-linking the siloxane polymer chains as to obtain a monolayer coating comprising a cross-linked siloxane polymer in adherent contact with the at least one surface of the substrate.
Still further, the present invention relates to a silane composition comprising, dispersed or dissolved in a solvent,
• at least three different silane monomers, wherein at least one of the silane monomers includes an active group capable of achieving cross-linking to adjacent siloxane polymer, and
• at least one monomer comprising a fluorinated polymer group; said composition being capable for forming upon polymerization a monolayer coating having a thickness of 1 to 50 pm, in particular about 5 to 20 pm on at least one surface of a substrate layer, which is flexible, bendable or both.
Additionally, the present invention relates to a process for producing a siloxane polymer comprising side chains comprising one or more fluorinated polymer groups comprising the following steps:
• Admixing the at least three different silane monomers and at least one monomer comprising a fluorinated polymer group in a first solvent to form a mixture;
• Subjecting the mixture to a at least partial hydrolysis of the monomers in the presence of a catalyst, whereby the hydrolysed monomers are at least partially polymerized and crosslinked
• Optionally changing the first solvent to a second solvent;
• Subjecting the mixture to further crosslinking by thermal or radiation initiation to form the siloxane polymer comprising side chains comprising one or more fluorinated polymer groups,
said siloxane polymer being capable for forming a monolayer coating having a thickness of 1 to 50 pm, in particular about 5 to 20 pm on at least one surface of a substrate layer, which is flexible, bendable or both.
The silane composition, the siloxane polymer, its monomers, the monolayer coating and the substrate layer preferably are defined by all their embodiments and properties as described above and below.
The inventive monolayer coating shows an improved balance of properties in regard of mechanical properties, especially scratch resistance, and optical properties, especially a low refractive index. Due to using a monolayer coating no interlayer adhesion problems as in multilayer coatings occur.
“Monolayer coating” in the sense of the present invention means a coating on at least one surface of the substrate layer (A) which consists of a single layer.
The monolayer coating (B) being in adherent contact with at least one surface of the substrate layer (A) in the sense of the present invention means that there is no further coating layer or adhesive layer between the at least one surface of the substrate layer (A) and the monolayer coating (B).
Various exemplifying and non-limiting embodiments of the invention both as to constructions and to methods of operation, together with additional objects and advantages thereof, will be best understood from the following description of specific exemplifying embodiments when read in connection with the accompanying drawings.
The verbs “to comprise” and “to include” are used in this document as open limitations that neither exclude nor require the existence of also un-recited features. The features recited in depending on claims are mutually free combinable unless otherwise explicitly stated.
Description of the invention
The present technology provides for layered structures wherein a substrate layer (A) is provided with a monolayer coating comprising a siloxane polymer, which comprises side chains comprising one or more fluorinated polymer groups. The layered structure is “bendable” in the sense that it is capable of being bent about a mandrel, having a radius of curvature, without breaking.
The properties of bendability can be tested using a test involving infolding or out-folding of the layered structure about a mandrel as described in WO 2019/193258.
Substrate layer (A)
The substrate layer (A) can be any kind of substrates such as glass, quartz, silicon, silicon nitride, polymers, metals and plastics or mixtures thereof. Furthermore, the substrate layer (A) can also include number of different surfaces such as different oxides, doped oxides, semimetals and the like or mixture thereof.
Suitable polymers are e.g. thermoplastic polymers, such as polyolefins, polyesters, polyamides, polyimides, polycarbonates, acrylic polymers, such as poly(methylmethacrylate), and Custom Design polymers.
Especially preferred polymers are polymethylmethacrylate (PMMA), polyethyleneterephtalate (PET) and colorless polyimide (CPI).
The substrate layer (A) can be the outmost layer of a device or an internal layer of a single stack. The substrate layer (A) can be coated on one or both sides.
The substrate layer (A) preferably has a thickness of 10 to 500 pm, more preferably 20 to 400 pm.
The substrate layer (A) is flexible, bendable or both, such that it is capable of being bent about a mandrel having a first minimum radius of curvature without breaking.
A layered structure of the present kind is in particular capable of being bent about a mandrel having a second minimum radius of curvature without breaking, said first minimum radius being smaller or equal to the second minimum radius of curvature.
Thereby, the layered structure is preferably bendable without crack formation in an outfolding motion for up to 20,000 times using a minimum radius of 2.5 mm.
Further, the layered structure is preferably bendable without crack formation in an infolding motion for up to 200,000 times using a minimum radius of 1.5 mm, preferably of 1.0 mm. Still further, the layered structure preferably does not show crack formation when elongated to 8% at an elongation rate of 0.25 inches/minute (0,64 cm/min).
The at least one surface of the substrate layer (A) can be modified before depositing the first composition onto at least one surface of the substrate to form a monolayer coating (B). The at least one surface of the substrate layer (A) can be modified physically or chemically. Suitable physical modifications are plasma treatment or corona treatment or similar treatments.
Suitable chemical modifications could be a chemical cleaning process for cleaning the at least one surface of the substrate layer (A).
By means of physical or chemical modification the at least one surface is preferably activated to promote adhesion between the substrate layer (A) and the first coating layer (B).
In one embodiment an optional coating composition is deposited onto the at least one surface of the substrate layer (A) as such that an optional additional coating layer is formed onto the at least one surface of the substrate layer (A). Said optional additional coating layer is then on one side in adherent contact with the at least one surface of the substrate layer (A) and on the other side in adherent contact with the monolayer coating (B).
“Adherent contact” in this regard means that there is no further coating layer or adhesive layer between the at least one surface of the substrate layer (A) and the optional additional coating layer and the optional additional coating layer and the monolayer coating (B).
Said optional additional coating layer can have a thickness of 5 to 300 nm or a thickness of 300 nm to 5 pm.
Said optional additional coating layer is usually applied in specific cases such as promoting the adhesion between the substrate layer (A) and the monolayer coating (B), wetting of the monolayer coating (B), promoting the optical performance of the layered structure or promoting the mechanical performance of the layered structure.
It is, however, preferred that no optional additional coating layer is applied between the substrate layer and the monolayer coating (B).
Monolayer coating (B)
The layered structure comprises a monolayer coating coated on at least one surface of the substrate layer (A) so that the monolayer coating (B).
It is preferred that the monolayer coating (B) is in adherent contact with at least one surface of the substrate layer (A).
“Adherent contact” in this regard means that there is no further coating layer or adhesive layer between the monolayer coating (B) and the at least one surface of the substrate layer (A).
The monolayer coating (B) preferably has a thickness of 1 to 100 pm, preferably of 2 to 50 pm, more preferably 5 to 40 pm.
The monolayer coating (B) comprises a siloxane polymer, which comprises side chains comprising one or more fluorinated polymer groups.
Preferably the siloxane polymer comprises monomer units selected from at least two different silane monomers, wherein at least one of the silane monomers includes an active group capable of achieving cross-linking to adjacent siloxane polymer chains, and wherein the adjacent siloxane polymer chains are crosslinked by means of said an active groups.
The siloxane polymer can comprise monomer units selected from 2 to 10, such as from 2 to 6, preferably from 2 to 4 different silane monomers. “Different” in this connection means that the silane monomers differ in at least one chemical moiety.
Active groups are preferably epoxy, alicyclic epoxy groups (e.g. glycidyl), vinyl, allyl, acrylate, methacrylate and silane groups and combinations thereof.
Thereby, the epoxy, alicyclic epoxy groups (e.g. glycidyl), vinyl, allyl, acrylate, methacrylate groups are capable of achieving cross-linking to adjacent siloxane polymer chains upon a thermal or radiation initiation, preferably in the presence of a suitable initiator such as a thermal or radical initiator.
Suitable thermal or radical initiators are preferably selected from tert-amyl peroxybenzoate, 4,4-azobis(4-cyanovaleric acid), l,l'-azobis(cyclohexanecarbonitrile), benzoyl peroxide, 2,2- bis(tert-butylperoxy)butane, 1 , 1 -bis(tert-butylperoxy)cyclohexane, 2,2'-azobisisobutyronitrile (AIBN), 2, 5 -bi s(tert-butylperoxy)-2, 5 -dimethylhexane, 2,5-bis(tert-Butylperoxy)- 2,5 - dimethyl-3 -hexyne, bis(l -(tert-butylperoxy)- 1 -methylethyl)benzene, 1 , l-bis(tert- butylperoxy)-3,3,5- trimethylcyclohexane, tert-butyl hydroperoxide, tert-butyl peracetate, tert-butyl peroxide, tert-butyl peroxybenzoate, tert-butylperoxy isopropyl carbonate, bumene hydroperoxide, byclohexanone peroxide, bicumyl peroxide, lauroyl peroxide, 2,4- pentanedione peroxide, peracetic acid or potassium persulfate. Especially preferred is 2,2'- azobisisobutyronitrile (AIBN).
The silane group is capable of achieving cross-linking to a carbon-carbon double bond, such as a vinyl or allyl group) of an adjacent siloxane polymer chains upon hydrosilylation, preferably in the presence of a suitable catalyst, such as a platinum (Pt)-based catalyst such as the Speier catalyst (EbPtCle.EEO), Karstedt’s catalyst (Pt(0)-l,3-divinyl-l, 1,3,3- tetramethyldisiloxane complex solution) or a rhodium (Rh)-based catalyst such as Tris(triphenylphosphine)rhodium (I) chloride.
In one embodiment, the molar ratio between monomers containing a first active group, e.g. selected from epoxy, alicyclic epoxy groups (e. g. glycidyl), and vinyl and allyl groups, to monomers containing a second active group, e.g. selected from acrylate and methacrylate groups, varies in the range of 1 : 100 to 100: 1, in particular 1 : 10 to 10:1, for example 5: 1 to 1 :2 or 3 : 1 to 1: 1.
In some embodiments, the components containing the second active group also be selected from acrylate and metacrylate containing compounds other than silane monomers, such as tetraethylene glycol diacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, ditrimethylol propane tetraacrylate, dipentaerythritol pentaacrylate, and dipentaerythritol hexaacrylate and combinations thereof.
In some embodiments, the active group or active groups will be present in a concentration of about 1 to 35 % based on the molar portion of monomers.
Suitable silane monomers are preferably represented by formula (I) R1aSiX4-a (I) wherein
R1 is selected from hydrogen and a group comprising linear and branched alkyl, cycloalkyl, alkenyl, alkynyl, (alk)acrylate, epoxy, allyl, vinyl and alkoxy and aryl having 1 to 6 rings, and wherein the group is substituted or unsubstituted;
X is a hydrolysable group or a hydrocarbon residue; and a is an integer 1 to 3.
The hydrolysable group is in particular an alkoxy group (cf. formula II).
The alkoxy groups of R1 and/or the hydrolysable group X can be identical or different and preferably selected from the group of radicals having the formula
-O-R2 (II)
wherein
R2 stands for a linear or branched alkyl group having 1 to 10, preferably 1 to 6 carbon atoms, and optionally exhibiting one or two substituents selected from the group of halogen, hydroxyl, vinyl, epoxy and allyl. Most preferred are methoxy and ethoxy groups.
Especially preferred are di-, tri- or tetraalkoxysilanes comprising alkoxy groups according to formula (II).
Particularly suitable silane monomers are selected from the group of tetraethoxy silane (TEOS), tetramethoxysilane (TMS), methyltriethoxysilane (MTEOS), methyltrimethoxysilane (MTMS), dimethyldiethoxysilane (DMDEOS), dimethyldimethoxysilane (DMDMS), diphenyldimethoxysilane (DPDMS), 3-(Trimethoxysilyl)propylmethacrylate (MEMO), 3- (Triethoxysilyl)propylmethacrylate, 5-(Bicycloheptenyl)triethoxysilane (BCHTEOS), (3- Glycidoxypropyl)tri ethoxy silane, (3 -Glycidoxypropyl)trimethoxy silane (GPTMS), (Heptadecafluoro- 1 , 1 , 2, 2-tetrahydrodecyl)trimethoxy silane, (Heptadecafluoro- 1 , 1 ,2,2- tetrahydrodecyl)triethoxysilane (F 17), 1H, 1H,2H,2H-Perfluorododecyltriethoxysilane, 1H, 1H,2H,2H-Perfluorododecyltrimethoxysilane, 1H, 1H,2H,2H- Perfluorooctyltriethoxysilane, 1H, 1H,2H,2H-Perfluorooctyltrimethoxysilane, 1H, 1H,2H,2H- Perfluoropentyltriethoxysilane, 1H,1H,2H,2H-Perfluoropentyltrimethoxysilane, 1H, 1H,2H,2H-Perfluorotetradecyltriethoxysilane, 1H, 1H,2H,2H- Perfluorotetradecyltrimethoxysilane, allyltrimethoxysilane (allylTMS), allyltriethoxysilane (allylTEOS), vinyltrimethoxysilane (vinylTMS), vinyltriethoxysilane (vinylTEOS), (3- Glycidopropyl)dimethoxymethylsilane (Me-GPTMS), methacryloxypropylmethyldimethoxysilane (Me-MEMO), phenylmethyldimethoxysilane (PMDMS), Bis[(2,2,3,3,4,4-hexafluorobutyl)propanoic ester]-3- aminopropyltrimethoxy silane, [2-(3,4-Epoxycy cl ohexyl)ethyl]trimethoxy silane (ECTMS) and mixtures thereof.
Preferred are silane monomers are selected from the group of 3- (Trimethoxysilyl)propylmethacrylate (MEMO) and (3-Glycidoxypropyl)trimethoxysilane (GPTMS).
Said silane monomers are preferably present in the siloxane polymer in a molar amount of 50 to 99.99 wt%, preferably of 60 to 99 wt%, still more preferably of 75 to 97 wt%.
In one embodiment the at least two different silane monomers of the first siloxane polymer (B-l) comprise at least one bi-silane.
Suitable bi-silanes are preferably represented by formula (III) (R3)3Si-Y-Si(R4)3, (III) wherein
R3 and R4 are independently selected from hydrogen and a group consisting of linear or branched alkyl, cycloalkyl, alkenyl, alkynyl, (alk)acrylate, epoxy, allyl, vinyl, alkoxy and aryl having 1 to 6 rings, and wherein the group is substituted or unsub stitued; and
Y is a linking group selected from bivalent unsubstituted or substituted aliphatic and aromatic groups, such as alkylene, arylene, -O-alkylene-O-; -O-arylene-O-; alkylene-O-alkylene, arylene-O-arylene; alkylene-Z1C(=O)Z2-alkylene, arylene-Z1C(=O)Z2-arylene and -O- alkylene-Z1C(=O)Z2-alkylene-O-; -O-arylene-Z1C(=O)Z2-arylene-O-, wherein Z1 and Z2 are each selected from a direct bond or -O-.
In the bivalent “alkylene” groups and other similar aliphatic groups, the alkyl residue (or residue derived from an alkyl moiety) stands for 1 to 10, preferably 1 to 8, or 1 to 6 or even 1 to 4 carbon atoms, examples include ethylene and methylene and propylene.
“Arylene” stands for an aromatic bivalent group containing typically 1 to 3 aromatic rings, and 6 to 18 carbon atoms. Such groups are exemplified by phenylene (e.g. 1,4-phenylene and
1,3-phenylene groups) and biphenylene groups as well as naphthylene or anthracenylene groups.
The alkylene and arylene groups can optionally be substituted with 1 to 5 substituents selected from hydroxy, halo, vinyl, epoxy and allyl groups as well as alkyl, aryl and aralkyl groups.
Preferred alkoxy groups contain 1 to 4 carbon atoms. Examples are methoxy and ethoxy.
The term “phenyl” includes substituted phenyls such as phenyltrialkoxy, in particular phenyltrimethoxy or tri ethoxy, and perfluorophenyl. The phenyl as well as other aromatic or alicyclic groups can be coupled directly to a silicon atom or they can be coupled to a silicon atom via a methylene or ethylene bridge.
Exemplary bi-silanes include 1,2-Bis(triethoxysilyl)ethane (BTESE), 1,2- Bis(trimethoxysilyl)ethane (MEOS) and mixtures thereof.
It is preferable to have the bi-silane present in the siloxane polymer in a molar amount of 0 to 35 wt%, preferably of 1 to 25 wt%, still more preferably of 3 to 20 wt%.
Additionally, the siloxane polymer comprises at least one, such as 1 to 10, preferably 1 to 6, more preferably 1 or 2, most preferably one monomer comprising a fluorinated polymer group.
Said monomer comprising a fluorinated polymer group is preferably selected from fluorinated polysiloxanes and modified perfluoropolyethers.
The modified perfluoropolyethers are preferably selected from silane modified perfluoropolyethers, carboxyester modified perfluoropolyethers, such as acrylate modified perfluoropolyethers and methacrylate modified perfluoropolyethers, epoxy-based perfluoropolyethers and mixtures thereof.
Such fluorinated polysiloxanes and modified perfluoropolyethers can be commercially available from Shin-Etsu Subelyn® fluorinated anti-smudge coating components of the KY- 100 Series, such as KY-1900 and KY-1901, Shin-Etsu Subelyn® fluorinated anti-smudge additives of the KY-1200 Series, such as KY-1271, or Daikin fluorinated anti-smudge coating components of the OPTOOL Series such as OPTOOL UD-509, OPTOOL UD-120 and OPTOOL DSX.
Other suitable fluorinated polysiloxanes are for example poly(methyl-3,3,3- trifluoropropyl)siloxane having a molecular weight in the range of from 1500 to 20000 g/mol, preferably from 2000 to 15000 g/mol.
The at least one fluorinated monomer is preferably present in the siloxane polymer in a weight amount of 0.01 to 10 wt%, preferably of 0.02 to 7 wt%, still more preferably of 0.05 to 5 wt%.
It is especially preferred that the monomers are selected from mixture of two or more of the group of 1,2-Bis(triethoxysilyl)ethane (BTESE), 3-(Trimethoxysilyl)propylmethacrylate (MEMO), and (3 -Glycidoxypropyl)trimethoxy silane (GPTMS) and additionally a fluorinated monomer selected from KY-1900, and KY-1901, KY-1271, OPTOOL UD-509, OPTOOL UD-120, OPTOOL DSX or poly(methyl-3,3,3-trifluoropropyl)siloxane having a molecular weight in the range of from 1500 to 20000 g/mol, preferably from 2000 to 15000 g/mol .
The composition comprising the siloxane polymer is preferably formed by a method comprising the steps of
• Admixing the at least two different silane monomers and the at least one monomer comprising a fluorinated polymer group, preferably as described above or below, in a first solvent to form a mixture;
• Subjecting the mixture to an at least partial hydrolysis of the monomers in the presence of a catalyst, whereby the hydrolysed monomers are at least partially polymerized and crosslinked;
• Optionally changing the first solvent to a second solvent;
• Optionally subjecting the mixture to further crosslinking by hydrosilylation, thermal or radiation initiation.
The first solvent is preferably selected from the group of acetone, tetrahydrofuran (THF), toluene, 1 -propanol, 2-propanol, methanol, ethanol, water (H2O), cyclopentanone, acetonitrile, propylene glycol propyl ether, methyl-tert-butylether (MTBE), propylene glycol monomethylether acetate (PGMEA), methyl ethyl ketone, methyl isobutyl ketone, propylene glycol monomethylether (PGME) and propylene glycol propyl ether (PnP).
The monomers can be admixed in the first solvent at any suitable temperature for solving the monomers. Usually, room temperature suffices.
In the next method step the mixture is subjected to an at least partial hydrolysis in the presence of a catalyst.
Suitable catalysts are acidic catalysts, basic catalysts or other catalysts.
Acidic catalysts are preferably selected from nitric acid (HNO3), sulfuric acid (H2SO4), formic acid (HCOOH), hydrochloric acid (HC1), sulfonic acid, hydrogen fluoride (HF), acetic acid (CH3COOH), trifluoromethanesulfonic acid or -toluene sulfonic acid. Especially preferred acidic catalysts are nitric acid (HNO3) and hydrochloric acid (HC1).
Basic catalysts are preferably selected from triethylamine (TEA), ammonium hydroxide (NH4OH), tetraethylammonium hydroxide (TEAH), tetramethylammonium hydroxide (TMEA), l,4-diazabicyclo[2.2.2]octane, imidazole and diethylenetriamine.
Other catalysts are preferably selected from 2,2,3,3,4,4,5,5-octafluoropentylacrylate, poly(ethylene glycol) 200, poly(ethylene glycol) 300 and n-butylated melamine formaldehyde resin.
The hydrolysis step is preferably performed at a temperature of from 20 to 80°C for 1 to 24 hours, such as at room temperature overnight.
During the hydrolysis step the monomers are at least partially hydrolysed. Said at least partially hydrolysed monomers then are at least partially polymerized, preferably by condensation polymerization and crosslinked to form a siloxane polymer, which comprises side chains comprising one or more fluorinated carbon groups.
Said siloxane polymer usually has a relatively low molecular weight in range of about 500 to 30000 g/mol.
According to a preferable embodiment the subjecting the mixture to an at least partial hydrolysis includes refluxing. A typical refluxing time is 2 h.
The first solvent can be changed to a second solvent in an optional further method step after the hydrolysis step. The optional solvent change is advantageous, since it assists the removal of water and alcohols formed during hydrolysis of the monomers. In addition, it improves the properties of the final siloxane polymer solution when used as coating layer(s) on the substrate.
The second solvent is preferably selected from the group of propylene glycol methyl ether (PGME), propylene glycol methyl ether acetate (PGMEA), 1 -ethanol, 2-ethanol (IP A), acrylonitrile diacetone alcohol (DAA), methyl isobutyl ketone (MIBK) or propylene glycol n- propyl ether (PnP).
The mixture comprising the siloxane polymer can be further subjected to a crosslinking step after the hydrolysis step. Thereby, the siloxane polymer is preferably at least partially crosslinked by hydrosilylation, thermal or radiation initiation.
In the present context, the term “partially crosslinked” means that the polymer is capable of further crosslinking at conditions conducive to cross-linking. In practice, the polymer still contains at least some reactive, crosslinking groups after the first polymerisation step. The further crosslinking, which typically takes place after deposition of the partially crosslinked composition on a substrate, will be described below.
The siloxane polymer is preferably at least partially crosslinked by hydrosilylation, thermal or radiation initiation using catalysts as described above.
Thereby, thermal crosslinking is preferably conducted at temperatures in the range of about 30 to 200 °C.
Typically cross-linking is carried out at refluxing conditions of the solvent.
To improve resolution of the material when applied to photolithography, the siloxane polymer can be optionally partially cross-linked during polymerization, in particular during or immediately after condensation polymerization. Various methods can be used for achieving cross-linking. For example, cross-linking method where two chains are joined via reactive groups not affecting any of the active groups intended for the UV curing can be employed. To mention an example, hydrosilylation for example using a proton on one chain reacting with a double bond on another chain will achieve cross-linking of desired kind. Another example is cross-linking through double bonds or epoxy groups.
Different active groups are preferably used for cross-linking. Thus, the cross-linking of the siloxane polymer can be achieved with an active group having double bonds or epoxy groups or both, such as epoxy, vinyl or allyl or methacrylate group using radical initiators and photoacid generators.
Epoxy groups can be employed for UV-curing and vice versa. The proportion of active groups required for cross-linking is generally smaller than for UV curing, e.g. about 0.1 to 10 mol%, based on the monomers, for cross-linking and about 5 to 50 mol%, based on the monomers, for UV curing.
The amount of the initiator added to the reaction mixture/ solution is generally about 0.1 to 10 wt%, preferably about 0.5 to 5 wt%, calculated from the total weight of the siloxane polymer.
As a result of the partial cross-linking, the molecular weight will typically be 2- to 10-folded. Thus from a molecular weight in the range of about 500 to 2000 g/mol, the crosslinking will increase it above 3000, preferably to 4000 to 20000 g/mol.
Optionally, resulting free Si-OH groups present in backbone of the siloxane polymer can be protected by an end-capping. For end capping, the free Si-OH groups are reacted with silanes such as methyldichlorofluorosilane (ChFSiCHs, methylfluorodimethoxy silane ((MeO)2SiFCH3), 3 -chloropropyltrimethoxy silane (Cl(CH2)3Si(OMe)3), ethyltrimethoxysilane (ETMS), or trimethylchlorosilane (CISiMes) in presence of a catalyst such as tri ethylaluminium (TEA) or imidazole. The amount of catalyst varies from 1.5 to 2 wt% of total solid. The reaction time varies from 40 to 45 min.
Other additives typically introduced into the first composition comprising the third siloxane polymer (D-l) include chemicals that can further modify the final surface properties of coated and cured film or improve wettability/adhesion properties of the coating layer (B) to the substrate layer (A) or the other coating layer (C) or improve coating drying and packing behavior during deposition and drying to reach good visual quality.
These additives can be surfactants, defoamers, antifouling agents, wetting agents etc.
Examples of such additives include: BYK-301, BYK-306, BYK-307, BYK-308, BYK-333,
BYK-051, BYK-036, BYK-028, BYK-057A, BYK-011, BYK-055, BYK-036, BYK-067A, BYK-088, BYK-302, BYK-310, BYK-322, BYK-323, BYK-331, BYK-333, BYK-341, BYK- 345, BYK-348, BYK-377, BYK-378, BYK-381, BYK-390, BYK-3700, all commercially available from BYK Chemie GmbH.
The additives are preferably present in an amount of 0.01-5 wt% by weight, more preferably 0.1 to 1 wt% of the total weight of the solids.
Before further condensation the excess of water is preferably removed from the material and at this stage it is possible to make a solvent exchange to another synthesis solvent if desired. This other synthesis solvent may function as the final or one of the final processing solvents of the siloxane polymer. The residual water and alcohols and other by-products may be removed after the further condensation step is finalized. Additional processing solvent(s) may be added during the formulation step to form the final processing solvent combination. Additives such as thermal initiators, radiation sensitive initiators, sensitizers, surfactants and other additives may be added prior to final filtration of the siloxane polymer. After the formulation of the composition, the polymer is ready for processing in, for example, roll-to-roll film deposition or in a lithographic process.
By adjusting the hydrolysis and condensation conditions it is possible to control the concentration/ content of the group capable of being deprotonated (e. g. an OH-group) and any residual leaving groups from the silane precursors (e.g. alkoxy groups) of the siloxane polymer composition and also to control the final molecular weight of the siloxane polymer. This greatly affects dissolution of the siloxane polymer material into the aqueous based developer solution. Furthermore, the molecular weight of the polymer also greatly effects on the dissolution properties of the siloxane polymer into developer solutions.
Thus, for example, it has been found that when the final siloxane polymer has a high content of hydroxyl groups remaining and a low content of alkoxy (e.g. ethoxy) groups, the final
siloxane polymer can be dissolved into an alkaline-water developer solution (e.g. tetra methyl ammonium hydroxide; TMAH, or potassium hydroxide; KOH).
On the other hand, if the remaining alkoxy-group content of the final siloxane polymer is high and it contains hardly any OH-groups, the final siloxane polymer has a very low solubility in an alkaline-water developer of the above kind. The OH-groups or other functional groups, such as amino (NH2), thiol (SH), carboxyl, phenol or similar that result in solubility to the alkaline developer systems, can be attached directly to the silicon atoms of the siloxane polymer backbone or optionally attached to organic functionalities attached into the siloxane polymer backbone to further facilitate and control the alkaline developer solubility.
After synthesis, the siloxane polymer composition can be diluted using a proper solvent or solvent combination to give a solid content which in film deposition will yield the preselected film thickness.
Usually, a further amount of an initiator molecule compound is added to the siloxane composition after synthesis. The initiator, which can be optionally similar to the one added during polymerization, is used for creating a species that can initiate the polymerization of the “active” functional group in the UV curing step. Thus, in case of an epoxy group, cationic or anionic initiators can be used. In case of a group with double bonds as “active” functional group in the synthesized material, radical initiators can be employed. Also, thermal initiators (working according to the radical, cationic or anionic mechanism) can be used to facilitate the crosslinking of the “active” functional groups. The choice of a proper combination of the photoinitiators and sensitizers also depends on the used exposure source (wavelength). Furthermore the selection of the used sensitizer depends on the selected initiator type.
The concentration of the thermal or radiation initiator and sensitizers in the composition is generally about 0.1 to 10 %, preferably about 0.5 to 5 %, calculated from the mass of the siloxane polymer.
The composition as described above may comprise solid nanoparticles or other compounds in an amount of between 1 and 50 wt.-% of the composition. The nanoparticles (or similar nano- , or microscale rods, crystals, spheres, dots, buds etc.) are in particular selected from the group of light scattering, light absorbing, light emitting and/or conductive pigments, dyes, organic and inorganic phosphors, oxides, quantum dots, polymers or metals.
The composition comprising the siloxane polymer as described above is deposited onto the onto at least one surface of the substrate layer (A) to form a monolayer coating (B).
It is preferred that the monolayer coating (B) is in adherent contact with the at least one surface of the substrate layer (A).
Suitable deposition methods include spin-on, clip, spray, ink-jet, roll-to-roll, gravure, reverse gravure, bar coating, slot, flexo-graphic, curtain, screen printing coating methods, extrusion coating, dip coating, flow coating or slit coating.
The deposited composition forms the monolayer coating (B) on the surface of the substrate layer (A). Typically, after deposition, or during the deposition step, the solvent is evaporated and the monolayer coating (B), preferably by thermal drying or optionally by vacuum and/or thermal drying combined. This step is also referred to as pre-curing.
In a second, subsequent step the monolayer coating (B) is cured to final hardness by using UV exposure followed by thermal curing at elevated temperature.
In one embodiment, the pre-curing and the final curing steps are combined by carrying out heating by using an increasing heating gradient. In addition to the thermal cure only process, the curing can be performed in three steps, the process comprising thermal pre-cure and UV- cure followed by final thermal cure. It is also possible to apply a two step curing process where thermal pre-cure is followed by UV-cure. In such a case no final thermal cure is preferably applied after UV-cure.
According to a particular embodiment the method further includes developing the deposited film. In one embodiment, developing comprises exposing (full area or selective exposure using photomask or reticle or laser direct imaging) the deposited first siloxane polymer composition to UV light. The step of developing is typically carried out after any pre-curing step and before a final curing step.
Thus, in one embodiment the method comprises the steps of
- pre-curing or drying the monolayer coating (B) deposited on at least one surface of the substrate layer (A); optionally exposing the thus obtained monolayer coating (B); optionally developing the thus obtained monolayer coating (B); and curing the monolayer coating (B).
Exemplary epoxy -functional group containing monomers include (3- glycidoxypropyl)trimethoxysilane, l-(2-(Trimethoxysilyl)ethyl)cyclohexane-3,4-epoxide, (3- glycidoxypropyl)tri ethoxy silane, (3- glycidoxypropyl)tripropoxy silane, 3- glycidoxypropyltri(2-methoxyethoxy)silane, 2,3 -epoxypropyltri ethoxy silane, 3,4- epoxybutyltriethoxysilane, 4,5- epoxypentyltriethoxysilane, 5,6-epoxyhexyltriethoxysilane, 5,6- epoxyhexyltrimethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltriethoxysilane, 2-(3,4- epoxy cy cl ohexyl)ethyltrimethoxy silane, 4-(trimethoxy silyl)butane- 1 ,2-epoxide.
Further examples of functionalized compounds are acrylate and metacrylate compounds, such as tetraethylene glycol diacrylate, trimethylo Ipropane triacrylate, pentaerythritol triacrylate, ditrimethylolpropane tetraacrylate, dipentaerythritol pentaacrylate, and dipentaerythritol hexaacrylate and combinations thereof. Such compounds can be used as part of the silane compositions.
According to a particular embodiment the method further includes curing the composition.
The thickness of the monolayer coating (B) on the at least one surface of the substrate layer (A) (i.e. the film thickness) may range from 1 to 100 pm, preferably of 2 to 50 pm, more preferably 5 to 40 pm.
The monolayer coating (B) preferably is a flexible hard coat layer.
It is preferred that the pencil hardness of the monolayer coating (B) is at least 2H, more preferably 3H, still more preferably at least 4H, as determined by ASTM D3363-00, Elcometer tester.
Preferably the monolayer coating (B) has an adhesion of 4B-5B, as tested by ASTM D3359- 09, Cross-Hatch tester.
Further, the monolayer coating (B) preferably has scratch resistance as evidenced by no visual scratches on a Taber linear abrasion test (Using Linear Abraser from Taber Industries) carried out at up to 2000 linear cycles with BonStar steel wool #0000, at 1kg weight, 2x2 cm head size, 2.0 inch stroke length, 60 cycles/min and Rubber abrasion test.
Still further, the monolayer coating (B) preferably has a scratch resistance as evidenced by no visual scratches in a Minoan rubber abrasion test using TABER ® Linear Abraser-Model 5750, Minoan rubber, 1 kg weight lead, 40 cycles / min, 1000 cycles.
Layered structure
The layered structure according to the present invention comprises the substrate layer (A) and the monolayer coating (B). The monolayer coating (B) is preferably the outermost layer of the layered structure and preferably in adherent contact with at least one surface of the substrate layer (A). This means that no further coatings or coating layers are applied on the at least one surface of the substrate layer (A).
The layered structure shows a good balance of properties of adhesion of the different layers to each other, high scratch resistance and low reflectance.
The layered structure of preferably shows a scratch resistance of no visual scratches in a Taber linear abrasion test (Using Linear Abraser from Taber Industries) carried out at up to 2000 linear cycles with BonStar steel wool #0000, at 1kg weight, 2x2 cm head size, 2.0-inch stroke length, 60 cycles/min.
Still further, the layered structure preferably has a scratch resistance as evidenced by no visual scratches in a Minoan rubber abrasion test using TABER ® Linear Abraser-Model 5750, Minoan rubber, 1 kg weight lead, 40 cycles / min, 1000 cycles.
Further the layered structure preferably has a water contact angle (WCA) of at least 95°, more preferably at least 98°, still more preferably at least 100° in a Taber linear abrasion test (Using Linear Abraser from Taber Industries) carried out at up to 2000 linear cycles with BonStar steel wool #0000, at 1kg weight, 2x2 cm head size, 2.0-inch stroke length, 60 cycles/min.
Still further, the layered structure preferably has a water contact angle (WCA) of at least 90 in a Minoan rubber abrasion test using TABER ® Linear Abraser-Model 5750, Minoan rubber, 1 kg weight lead, 40 cycles / min, 1000 cycles.
Additionally, the layered structure preferably shows a refractive index of from 1.40 to 1.55, more preferably from 1.45 to 1.50.
Further, the layered structure preferably shows a transmittance of at least 89.5%, more preferably from 89.8% to 90.5% at a wavelength of 550 nm, when measured on a coated colorless polyimide (CPI) 50-micron film.
The layered structure preferably shows an increase of transmittance of from 0.5 to 1.5%, compared to the uncoated CPI film at a wavelength of 550 nm.
Still further, the layered structure preferably shows a transmittance of at least 90.8%, more preferably from 90.9% to 91.5% at a wavelength of 550 nm, when measured on a coated polyethylene terephthalate (PET) 50 micron film.
The layered structure preferably shows an increase of transmittance of from 0.2 to 1.0%, compared to the uncoated PET film at a wavelength of 550 nm.
Additionally, the layered structure preferably has a haze of not more than 0.5%, preferably from 0.1 to 0.4%, when measured on a coated colorless polyimide (CPI) film.
Still further, the layered structure preferably has a haze of not more than 0.8%, preferably from 0.2 to 0.6%, when measured on a coated polyethylene terephthalate (PET) film.
The layered structure is preferably capable of being bent about a mandrel having a radius of curvature without breaking, as evidenced as a value of less than 0.8 cm, in particular less than 0.4 cm, on an outfolding mandrel diameter test.
The layered structure according to the present invention is suitable for flexible electronics applications, including displays, optical lens, transparent boards, and automotive industries especially as a lightweight alternative to glass.
The present invention is further characterized by the following non-limiting examples:
Examples:
Determination methods
Molecular weight: the polymers were characterized by gel permeation chromatography. The chromatographic system consisted of a GPC apparatus equipped with an isocratic HPLC pump and a refractive index detector. The polysiloxanes (0,20 g; 50% solid content) were dissolved in THF (HPLC-grade; 2,30 g). The analyte injection volume was 100 pL, the flow was 0,70 mL / min, and the column temperature was set to 40 °C. Four polysterene exclusion-based columns were used. The mobile phase was THF (HPLC grade). Number-average molecular weight (Mn) and the weight-average molecular weight ( ) of the polymers were determined using internal standards, e.g. two series of polystyrenes (Serie A: 5 polystyrenes with Mw = 120.000 g/mol, 42.400 g/mol, 10.700 g/mol, 2.640 g/mol, 474 g/mol and Serie B: 4 polymers with Mr = 193.000 g/mol, 16.700 g/mol, 6.540 g/mol, 890 g/mol).
Solid contents: The solid content of the polymers was determined using a Mettler Toledo HB43 instrument. The sample was weighted on aluminum dish / cup and the measurement was performed using about 1 g of material.
Viscosity: the used tool was a Grabner Instruments Viscometer MINIVIS-II. The used method was “falling ball viscosity measurement”. Samples were measured at T = 20 °C by using a stell ball with3.175 mm diameter.
Film thickness and refractive index (RI): the film thickness and refractive index were measured using Ellipsometer UVISEL-VASE Horiba Jobin-Yvon. Measurements are performed using Gorilla Glass 4 or silicon wafer (diameter: 150 mm, Type/Dopant: P/Bor, Orientation: <l-0-0>, Resistivity: 1-30 Q.cm, thickness: 675 +/- 25 pm, TTV: < 5 pm, particle: < 20 @ 0,2 pm, Front surface: polished; back surface: etched; Flat 1 SEMI standard)
or other suitable substrates. The material fil could be prepared on pre-treated (plasma) glass substrate ny using a spray tool (typical sprat process: scan speed: 300 mm/s; pitch: 50 mm; gap: 100 mm; flow rate: 5-6 ml/min; atomization air pressure: 5 kg / cm2), followed by thermal cure example at T = 150 °C for 60 min.
Transmission (T%) and reflection (R%): A Konica Minolta spectrophotometer CM-3700A (Specta Magic NX software) was used to measure transmittance and reflectance.
Color and Haze measurement: L*(D 65), a*(D 65) and b*(D 65) and Haze were determined by using A Konica Minolta spectrophotometer CM-3700A (Specta Magic NX software)
Pencil hardness (PEHA): the pencil hardness was determined according to ASTM standard D3363-00 using a Elcometer pencil hardness tester.
Water contact angle (WCA): the static contact angle measurement was performed by optical tensiometer using distilled water, 4 pL droplet size, three measurement points average was recorded as the measurement result value and Young-Laplace equation was used as the numerical method to describe the contour of the drop (tool: attention theta optical tensiometer).
Abrasion: abrasion testing was carried out using for example Bon Star steel wool #000, 1 kg load, 1 x 1 cm head, 2.0-inch stroke, 60 cycles / min speed, using taber linear abraser 5750 and using TABER ® Linear Abraser-Model 5750, Minoan rubber, 1 kg weight lead, 40 cycles / min, 1000 cycles.
Visual quality (VQ): the visual inspection can be observed with bare eyes, under microscope using a green or red-light quality lamp inspection. The visual quality can be scored between 0 (best) to 3 (worse).
Adhesion: the adhesion was determined according to ASTM standard D3359-D9 using a Elcometer cross-hatch tester and Elcometer tape test.
Preparation examples
Example 1: FlexHC with KY1900
In a 500 mL round bottom flask, BTESE (5,3g; 0,0150 mol), GPTMS (22,8 g; 0.0965 mol), MEMO (9,25 g; 0,0372 mol), KY1900 (0,5g) are mixed in Acetone (28g; 0.4821 mol). HNO3 (0,lM; 9,5 g; 0,5278 mol) is added dropwise over 15 min and the reaction mixture is stirred at room temperature overnight. PGME (7,8 g; 0,086 mol) is added and solvent exchange procedure from acetone to PGME was performed.
Example 2: FlexHC with KY1900 (different amount)
In a 500 mL round bottom flask, BTESE (5,3g; 0,0150 mol), GPTMS (22,8 g; 0.0965 mol), MEMO (9,25 g; 0,0372 mol), KY1900 (1,0g) are mixed in Acetone (28g; 0.4821 mol). HNO3 (0,lM; 9,5 g; 0,5278 mol) is added dropwise over 15 min and the reaction mixture is stirred at room temperature overnight. PGME (7,8 g; 0,086 mol) is added and solvent exchange procedure from acetone to PGME was performed.
Example 3: FlexHC with KY1900 in IPA instead of acetone (solubility issues of KY1900 in acetone)
In a 500 mL round bottom flask, BTESE (5,3g; 0,0150 mol), GPTMS (22,8 g; 0.0965 mol), MEMO (9,25 g; 0,0372 mol), KY1900 (0,5g) are mixed in IPA (26,25g; 0.4368 mol). HNO3 (0,lM; 8,87 g; 0,4928 mol) is added dropwise over 15 min and the reaction mixture is stirred at room temperature overnight. PGME (27,26 g; 0,3024 mol) is added and solvent exchange procedure from acetone to PGME was performed.
Example 4: FlexHC with KY1900 in IPA (KY1900 added in 2nd step)
In a 500 mL round bottom flask, BTESE (5,3g; 0,0150 mol), GPTMS (22,8 g; 0.0965 mol), MEMO (9,25 g; 0,0372 mol) are mixed in IPA (26,25g; 0.4368 mol). HNO3 (0,lM; 8,87 g; 0,4928 mol) is added dropwise over 15 min and the reaction mixture is stirred at room temperature overnight. KY1900 (0.15g) added HNO3 (0,lM; 1,0 g; 0,0556 mol) dropwise. After 1 hour, PGME (27,26 g; 0,3024 mol) is added and solvent exchange procedure from acetone to PGME was performed.
Example 5: FlexHC with OPTOOL DSX in IPA
In a 500 mL round bottom flask, BTESE (5,3g; 0,0150 mol), GPTMS (22,8 g; 0.0965 mol), MEMO (9,25 g; 0,0372 mol), OPTOOL DSX (0,2g) are mixed in IPA (26,25g; 0.4368 mol). HNO3 (0,lM; 8,87 g; 0,4928 mol) is added dropwise over 15 min and the reaction mixture is stirred at room temperature overnight. PGME (27,26 g; 0,3024 mol) is added and solvent exchange procedure from acetone to PGME was performed.
Example 6: FlexHC with poly(methyl-3,3,3-trifluoropropyl)siloxane Mw = 2400
In a 500 mL round bottom flask, BTESE (21.15 g; 0.06 mol), GPTMS (91,0 g; 0,3850 mol), MEMO (37g; 0,1490 mol), poly(methyl-3,3,3-trifluoropropyl)siloxane (2,0 g) are mixed in Acetone (130,77g; 2,8373 mol) were mixed in Acetone (112 g; 1,9353 mol). HNO3 (0,lM; 35,47 g; 1,9706 mol) is added dropwise over 15 min and the reaction mixture is stirred overnight at room temperature. PGME (90 g; 0,9986 mol) is added and solvent exchange procedure from acetone to PGME was performed.
Example 7: FlexHC with poly(methyl-3,3,3-trifluoropropyl)siloxane Mw = 14000
In a 500 mL round bottom flask, BTESE (21.15 g; 0.06 mol), GPTMS (91,0 g; 0,3850 mol), MEMO (37g; 0,1490 mol), poly(methyl-3,3,3-trifluoropropyl)siloxane (2,0 g) are mixed in Acetone (130,77g; 2,8373 mol) were mixed in Acetone (112 g; 1,9353 mol). HNO3 (0,lM; 35,47 g; 1,9706 mol) is added dropwise over 15 min and the reaction mixture is stirred overnight at room temperature. PGME (90 g; 0,9986 mol) is added and solvent exchange procedure from acetone to PGME was performed.
Example 8: FlexHC with KY1271
In a 500 mL round bottom flask, BTESE (24,0 g; 0.0677 mol), GPTMS (100 g; 0,4231 mol), MEMO (40g; 0.1611 mol), KY1271 (0.1 wt% to 2,5 wt%) are mixed in Acetone (160g; 2,75 mol). HNO3 (0,lM; 35,2 g; 1,9556 mol) is added dropwise over 15 min and the reaction mixture is stirred at room temperature overnight. PGME (140 g; 1,553 mol) is added and solvent exchange procedure from acetone to PGME was performed.
Example 9: FlexHC with OPTOOL UD-509 & UD-120
In a 500 mL round bottom flask, BTESE (24,0 g; 0.0677 mol), GPTMS (100 g; 0,4231 mol), MEMO (40g; 0.1611 mol), OPTOOL (0.1 wt% to 2,5 wt%) are mixed in Acetone (160g; 2,75 mol). HNO3 (0,lM; 35,2 g; 1,9556 mol) is added dropwise over 15 min and the reaction mixture is stirred at room temperature overnight. PGME (140 g; 1,553 mol) is added and solvent exchange procedure from acetone to PGME was performed.
Application examples
Inventive coating:
The composition of example 9 comprising the polymer of BTESE, GPTMS, MEMO and 0.5 wt% KY1271 in PGME was mixed with 1% BYK333 and 1% BYK067A in order to obtain the coating composition.
Coating:
The coating compositions were deposited onto a polyethyleneterephtalate (PET) film 50 pm and on a colorless polyimide (CPI) film 50 pm and cured.
The coating and curing compositions were as follows: for PET film: 120 degree celcius/90 sec, UV-500W (90sec), 120 degree celcius/10 min, bar coater #4 (for thick film- 7-8 pm) or Mayer rod
for CPI film: 120-140 degree celcius /90 sec, UV-500W (90sec), 140 degree celcius /10 min, bar coater #4 (for thick film- 7-8 m)
Abrasion test: The coated PET and CPI films were subjected to a steelwool abrasion test and Minoan rubber abrasion test. After 400, 800 1200, 1600 and 2000 cycles in the steelwool abrasion test and after 1000 cycles in the Minoan rubber abrasion test visual quality and the water contact angle were determined. The results are shown in Table 1 below.
Optical properties:
Figure 1 shows the transmittance of the CPI film coated with the inventive coating compared with uncoated CPI film. The coated CPI film shows a higher transmittance compared to the uncoated CPI film (bare CPI).
5
Figure 2 shows the transmittance of the PET film coated with the inventive coating compared with uncoated PET film. The coated PET film shows a higher transmittance compared to the uncoated PET film (bare PET).
10 Table 2 shows the optical properties and pencil hardness of the inventive coating on PET and CPI films compared with uncoated PET and CPI films.
Table 2: Optical properties and PEHA of the inventive coating on PET and CPI films compared with uncoated PET and CPI films
15
Claims
Claims A layered structure comprising
(A) a substrate layer; and
(B) a monolayer coating coated on at least one surface of the substrate layer (A), wherein the monolayer coating (B) comprises a siloxane polymer, which comprises side chains comprising one or more fluorinated polymer groups; and the substrate layer (A) is flexible, bendable or both. The layered structure according to claim 1, wherein the siloxane polymer comprises monomer units selected from at least two different silane monomers, wherein at least one of the silane monomers includes an active group capable of achieving cross-linking to adjacent siloxane polymer chains, and at least one monomer comprising a fluorinated polymer group and wherein the adjacent siloxane polymer chains are crosslinked by means of said an active groups and, wherein at least two different silane monomers preferably comprise at least one bi-silane. The layered structure according to claim 2, wherein at least two different silane monomers are selected from tetraethoxysilane (TEOS), tetramethoxysilane (TMS), methyltriethoxysilane (MTEOS), methyltrimethoxysilane (MTMS), dimethyldi ethoxy silane (DMDEOS), dimethyldimethoxy silane (DMDMS), diphenyldimethoxysilane (DPDMS), 3-(Trimethoxysilyl)propylmethacrylate (MEMO), 3-(Triethoxysilyl)propylmethacrylate, 5- (Bicycloheptenyl)triethoxysilane (BCHTEOS), (3- Glycidoxypropyljtriethoxysilane, (3-Glycidoxypropyl)trimethoxysilane (GPTMS), (Heptadecafluoro- 1 , 1 , 2, 2-tetrahydrodecyl)trimethoxy silane, (Heptadecafluoro- 1 , 1 ,2,2-tetrahydrodecyl)triethoxysilane (F 17), 1H, 1H,2H,2H-
Perfluorododecyltri ethoxysilane, 1H, 1H,2H,2H- Perfluorododecyltrimethoxysilane, 1H,1H,2H,2H-Perfluorooctyltriethoxysilane, 1H, 1H,2H,2H-Perfluorooctyltrimethoxysilane, 1H, 1H,2H,2H- Perfluoropentyltriethoxysilane, 1H,1H,2H,2H-Perfluoropentyltrimethoxysilane, 1H, 1H,2H,2H-Perfluorotetradecyltriethoxysilane, 1H, 1H,2H,2H- Perfluorotetradecyltrimethoxysilane, allyltrimethoxysilane (allylTMS), allyltri ethoxy silane (allylTEOS), vinyltrimethoxy silane (vinylTMS), vinyltriethoxysilane (vinylTEOS), (3-Glycidopropyl)dimethoxymethylsilane (Me-GPTMS), methacryloxypropylmethyldimethoxysilane (Me-MEMO), phenylmethyldimethoxysilane (PMDMS), Bis[(2,2,3,3,4,4- hexafluorobutyl)propanoic ester]-3-aminopropyltrimethoxysilane, 1,2- Bis(triethoxysilyl)ethane (BTESE), 1,2-Bis(trimethoxysilyl)ethane (MEOS), [2- (3, 4-Epoxycyclohexyl)ethyl]trimethoxy silane (ECTMS) and mixtures thereof. The layered structure according to claims 2 or 3, wherein at least one monomer comprising a fluorinated polymer group is selected from fluorinated polysiloxanes, modified perfluoropolyethers and mixtures thereof, wherein the modified perfluoropolyethers are preferably selected from silane modified perfluoropolyethers, carboxyester modified perfluoropolyethers, such as acrylate modified perfluoropolyethers, methacrylate modified perfluoropolyethers, epoxy-based perfluoropolyethers and mixtures thereof. The layered structure according to any one of claims 1 to 4, wherein the monolayer coating (B) has a thickness of 1 to 100 pm, preferably of 2 to 50 pm, more preferably 5 to 40 pm. The layered structure according to any one of claims 1 to 5, wherein the material of the substrate layer (A) is selected from the group of glass, quartz, silicon, silicon nitride, polymers, metals and plastics and combinations thereof, wherein the material of the substrate layer (A) is preferably selected from oxide, doped
oxide, semimetal and mixtures thereof, wherein the plastics are preferably selected from thermoplastic polymers, such as polyolefins, polyesters, polyamides, polyimides, polycarbonates, acrylic polymers, such as poly(methylmethacrylate), and Custom Design polymers., and wherein substrate layer (A) preferably has a thickness of 10 to 500 pm, preferably 20 to 400 pm. The layered structure according to any one of claims 1 to 6, having one or more, preferably all of the following properties:
• a pencil hardness of at least 2H, as determined by ASTM D3363-00, Elcometer tester; and/or
• an adhesion of 4B-5B, as tested by ASTM D3359-09, Cross-Hatch tester; and/or
• a scratch resistance as evidenced by no visual scratches on a Taber linear abrasion test (Using Linear Abraser from Taber Industries) carried out at up to 2000 linear cycles with BonStar steel wool #0000, at 1kg weight, 2x2 cm head size, 2.0 inch stroke length, 60 cycles/min; and/or
• a scratch resistance as evidenced by no visual scratches in a Minoan rubber abrasion test using TABER ® Linear Abraser-Model 5750, Minoan rubber, 1 kg weight lead, 40 cycles / min, 1000 cycles; and/or
• a water contact angle of at least 95° on a Taber linear abrasion test (Using Linear Abraser from Taber Industries) carried out at up to 2000 linear cycles with BonStar steel wool #0000, at 1kg weight, 2x2 cm head size, 2.0 inch stroke length, 60 cycles/min; and/or
• a water contact angle (WCA) of at least 90° in a Minoan rubber abrasion test using TABER ® Linear Abraser-Model 5750, Minoan rubber, 1 kg weight lead, 40 cycles / min, 1000 cycles; and/or
• a refractive index of from 1.40 to 1.55; and/or
• a transmittance of at least 89.5% at a wavelength of 550 nm, when measured on a coated colorless polyimide (CPI) film; and/or
• an increase of transmittance of from 0.5 to 1.5%, compared to the uncoated CPI film at a wavelength of 550 nm; and/or
• a haze of not more than 0.5%, when measured on a coated colorless polyimide (CPI) film; and/or
• a transmittance of at least 90.8% at a wavelength of 550 nm, when measured on a coated polyethylene terephthalate (PET) film; and/or
• an increase of transmittance of from 0.2 to 1.0%, compared to the uncoated PET film at a wavelength of 550 nm; and/or
• a haze of not more than 0.8%, when measured on a coated polyethylene terephthalate (PET) film. A method for producing a layered structure according to any one of claims 1 to 7 comprising the following steps:
• Providing a composition comprising at least three different silane monomers, wherein at least one of the silane monomers includes an active group capable of achieving cross-linking to adjacent siloxane polymer, and at least one monomer comprising a fluorinated polymer group;
• Subjecting the composition to at least partial hydrolysis of the monomers to form a composition comprising a siloxane polymer comprising side chains comprising one or more fluorinated polymer groups;
• Providing a substrate which is flexible or bendable or both;
• Depositing the composition comprising the siloxane polymer comprising side chains comprising one or more fluorinated polymer groups onto at least one surface of the substrate to form a monolayer coating of the composition comprising the siloxane polymer;
• Cross-linking the siloxane polymer chains as to obtain a monolayer coating comprising a cross-linked siloxane polymer in adherent contact with the at least one surface of the substrate.
The method according to claim 8, wherein the composition comprising a siloxane polymer comprising side chains comprising one or more fluorinated polymer groups is formed by
• Admixing the at least two different silane monomers and at least one monomer comprising a fluorinated polymer group in a first solvent to form a mixture;
• Subjecting the mixture to an at least partial hydrolysis of the monomers in the presence of a catalyst, whereby the hydrolysed monomers are at least partially polymerized and cross-linked;
• Optionally changing the first solvent to a second solvent;
• Subjecting the mixture to further crosslinking by thermal or radiation initiation. The method according to claim 9, wherein the mixture is further cross-linked by thermal initiation in the presence of a thermal initiator selected from tert-amyl peroxybenzoate, 4,4-azobis(4-cyanovaleric acid), 1,1'- azobis(cyclohexanecarbonitrile), benzoyl peroxide, 2,2-bis(tert- butylperoxyjbutane, l,l-bis(tert-butylperoxy)cyclohexane, 2,2'- azobisisobutyronitrile (AIBN), 2,5-bis(tert-butylperoxy)-Z,S-dimethylhexane, 2,5-bis(tert-Butylperoxy)- 2,5 -dimethyl-3 -hexyne, bis(l -(tert-butylperoxy)- 1 - methylethyljbenzene, l,l-bis(tert-butylperoxy)-3,3,5- trimethylcyclohexane, tert-butyl hydroperoxide, tert-butyl peracetate, tert-butyl peroxide, tert-butyl peroxybenzoate, tert-butylperoxy isopropyl carbonate, bumene hydroperoxide, byclohexanone peroxide, bicumyl peroxide, lauroyl peroxide, 2,4- pentanedione peroxide, peracetic acid or potassium persulfate, preferably 2,2'- azobisisobutyronitrile (AIBN).
11. The method according to claim 9 or 10, wherein the thermal cross-linking is in the range of about 30 to 200 °C, typically cross-linking is carried out at refluxing conditions of the solvent.
12. The method according to any one of claims 8 to 11, wherein the composition is deposited by spin-on, clip, spray, ink-jet, roll-to-roll, gravure, reverse gravure, bar coating, slot, flexo-graphic, curtain, screen printing coating methods, extrusion coating or slit coating.
13. The method according to any of claims 8 to 12, wherein the active group is epoxy, glycidyl, vinyl, allyl, acrylate or methacrylate group or a combination thereof.
14. A silane composition comprising, dispersed or dissolved in a solvent,
• at least three different silane monomers, wherein at least one of the silane monomers includes an active group capable of achieving cross-linking to adjacent siloxane polymer, and
• at least one monomer comprising a fluorinated polymer group; said composition being capable for forming upon polymerization a monolayer coating having a thickness of 1 to 50 pm, in particular about 5 to 20 pm on at least one surface of a substrate layer, which is flexible, bendable or both.
15. A process for producing a siloxane polymer comprising side chains comprising one or more fluorinated polymer groups comprising the following steps:
• Admixing the at least three different silane monomers and at least one monomer comprising a fluorinated polymer group in a first solvent to form a mixture;
• Subjecting the mixture to a at least partial hydrolysis of the monomers in the presence of a catalyst, whereby the hydrolysed monomers are at least partially polymerized and cross-linked
• Optionally changing the first solvent to a second solvent; • Subjecting the mixture to further crosslinking by thermal or radiation initiation to form the siloxane polymer comprising side chains comprising one or more fluorinated polymer groups, said siloxane polymer being capable for forming a monolayer coating having a thickness of 1 to 50 pm, in particular about 5 to 20 pm on at least one surface of a substrate layer, which is flexible, bendable or both.
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