WO2023191649A1 - Organosilica particles based on bridging polysilsesquioxanes for blocking ultraviolet rays - Google Patents

Organosilica particles based on bridging polysilsesquioxanes for blocking ultraviolet rays Download PDF

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WO2023191649A1
WO2023191649A1 PCT/RS2023/000004 RS2023000004W WO2023191649A1 WO 2023191649 A1 WO2023191649 A1 WO 2023191649A1 RS 2023000004 W RS2023000004 W RS 2023000004W WO 2023191649 A1 WO2023191649 A1 WO 2023191649A1
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particles
organosilica
organosilica particles
component
molecules
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PCT/RS2023/000004
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French (fr)
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Nikola Knezevic
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Institut Biosens - Istrazivacko-Razvojni Institut Za Informacione Tehnologije Biosistema
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Publication of WO2023191649A1 publication Critical patent/WO2023191649A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/14Polysiloxanes containing silicon bound to oxygen-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/22Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/26Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen nitrogen-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/80Siloxanes having aromatic substituents, e.g. phenyl side groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes
    • C08L83/06Polysiloxanes containing silicon bound to oxygen-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes
    • C08L83/08Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen

Abstract

Organosilica particles based on bridging polysilsesquioxanes for blocking ultraviolet rays, which have the novelty of components C and D in different ratios, which are covalently cross-linked within the organosilica particles, whereby particles of different structures and morphologies for application in protection from UV rays. The role of component C is to ensure potent absorption of UV rays, while component D can have a partial UV-protective effect, but its primary role is constructive, i.e. enables the construction of organosilica desired structure. Component C is based on organo-bridged polysilsesquioxanes, based on the structure of different organic UV blockers, from which bridging organosilicate precursors can be made by chemical modification. This component can be based on derivatives of triazine, cinnamate, salicylate, anthranilate, p-aminobenzoate, camphor, benzimidazole, benzophenone, dibenzoylmethane, diphenylacrylate and other organic molecules that have the ability to absorb UV rays. Component D is a bridged silsesquioxane that can serve the purpose of a particle building component. In the case of porous organosilica particles, the material can be loaded with molecules that can play a role in additional UV protection or exhibit other benefits for application (ROS scavenging, skin nourishing, drug delivery etc.). These additional molecules can be adsorbed on the surface or entrapped inside the pores of the organosilica particles through the application of various large molecules, which are covalently bound to the organosilica particles and prevent their exit or enable slow release from the pores into the surrounding environment. In addition, the particles with enhanced porosity exhibit enhanced surface area and lower density, both of which could be beneficial for dispersing the particles and increasing the stability of particles in formulations. The new organosilica particles can be applied as an integral part of sunscreens, although a wider application is also possible as an integral part of any material in which protection from UV radiation would be important, e.g. UV-proof glasses, resins and paints, which would be of interest for the protection of materials and devices in the mechanical, construction, automotive, aviation and space industries, as well as in agriculture for the protection of plants from the harmful effects of UV radiation.

Description

ORGANOSILICA PARTICLES BASED ON BRIDGING POLYSILSESQUIOXANES FOR
BLOCKING ULTRAVIOLET RAYS
Technical field
The invention relates to new organosilica particles composed entirely of covalently linked bridged polysilsesquioxanes as effective blockers for ultraviolet rays.
The invention relates to new organosilica particles used as a component of sunscreens, although broader application is also possible as a component of any material in which protection from UV radiation would be of importance, e.g., for the manufacture of UV-resistant glasses, resins and paints that would be of interest for the protection of materials and equipment in the engineering, construction, automotive, aviation and space industries, as well as in agricultural industries for the protection of crops from the harmful effects of UV radiation.
The invention focuses on different particle structures composed entirely of covalently bound bridged silsesquioxanes, where a mixture of bridged silsesquioxanes, including building silsesquioxane component (D) and UV-shielding silsesquioxane component (C) is used to produce efficient UV-shielding organosilica particles. Component C is based on organo-bridged polysilsesquioxanes, based on the structure of different organic UV blockers, from which bridging organosilicate precursors can be made by chemical modification. Component D can be different building units based on bridging organosilica precursors, e.g.: 4,4'- bis(triethoxy silyl)- 1,1 -biphenyl or l,4-bis(triethoxysilyl)benzene, which can also exhibit a partial benefit in UV protection.
The covalent linkages between the components prevent their leakage from the particles. The changes in components C and D, their ratios, and synthesis methodologies can yield a plethora of novel organosilica particles with different characteristics. Thus, the intensity and wavelength of the absorbed UV light can be finetuned, which can yield optimized organosilica particles for applications in different areas where UV-shielding is needed. Herein, an example of the synthesized organosilica particle is presented with absorption maximum in UVB region and thus containing potent ability for UV shielding of skin, with an estimated SPF = 30. The prepared organosilica particles constructed from 4, 4'-bis(triethoxysil)- 1,1 '-biphenyl as component D and a bridged silsesquioxane containing a triazine-based molecule as component C based in a ratio of 1:9.
Furthermore, the organosilica particles can be prepared in such a manner to contain a porous structure and high surface area. The surface and the pores can be utilized for storing different molecules and enabling their slow release from the particles, which may add additional benefit to the applications. These may include storing and release of vitamins, minerals, skin conditioners, scavengers of reactive oxygen species (ROS), additional UV-shielding molecules, medication drugs, antimicrobial and antifungal molecules, growth factors and other molecules and biomolecules that may benefit the users or to enhance the characteristics of the product. In addition, the particles with enhanced porosity exhibit enhanced surface area and lower density, both of which could be beneficial for dispersing the particles and increasing the stability of particles in formulations.
The International Patent Classification (IPC) designation is: A61K8/27, B82Y30/00, A61K8/0279, A61Q19/00, C01G9/02 and A61K/585.
The invention relates to new organosilica particles based on covalently interlocked bridged polysilsesquioxanes as effective blockers for ultraviolet rays. The new organosilica particles show stable, effective and safe ability to block ultraviolet rays.
The UV radiation of the sun can cause skin and eye damage in humans and animals. In plants, UV radiation causes damage to the cell membrane, chloroplasts, mitochondria and DNA, resulting in reduced yield and crop quality.
Currently, TiCh and ZnO nanoparticles or organic blockers are used in the market to protect against UV solar radiation. However, there is a growing concern about the harmful effects of these UV protection ingredients on human health and the environment, especially after exposure to UV radiation, which causes the production of highly destructive reactive oxygen species (ROS), leading to the degradation of the surrounding materials, but also to the degradation of the UV blockers themselves, reducing their ability to protect against UV radiation.
Organosilica particles as a new material represent a safer alternative (both in terms of health and environmental protection) as active ingredients for protection against UV radiation than the active UV blockers in current use. The invention precisely solves the above-mentioned problem of the harmfulness of UV rays and with the invention proposes a construction of novel biocompatible organosilica particles that are capable of protecting against ultraviolet solar radiation through the absorption and scattering of UV rays, while the organosilica particles remain stable under the effect of UV radiation and with a possible wide protection spectrum (UV A + UVB + UVC). Background art
For the first time, in our publication from 2018, the concept of using porous organosilica particles to protect against UVA and UVB radiation was described and proven (Knezevic et. al. ACS Appl. Mater. Interfaces 2018, 10, 20231-20236, DOI: 10.1021/acsami.8b04635). This publication describes a new application of organosilica particles, with a composition (based on a bridging benzene group) that was already known in the scientific literature. Our published results demonstrated a proof of concept that organosilica particles composed solely of covalently interlocked silsesquioxanes with bridging benzene groups have the ability to block UV radiation, with a maximum estimated protection factor (SPF) value of 18.2. In addition, surface functionalization with chelating ligands and zinc ions (important for skin wound healing, maintenance and protection against inflammation) also had a positive effect on the material's ability to protect against UV radiation. These materials also showed great stability when exposed to UV and visible light. The difference compared to the proposed invention is reflected in a different and new (unpublished) composition of organosilica particles, which in this invention are particularly adapted for protection against UV radiation. Organosilica particles based solely on bridging benzene are not covered by this invention. Therefore, the idea, structure (composition) and properties of organosilica particles that are included in this invention have not been published.
Patent application number WO2016189828A1 and titled Zinc oxide-containing composite particles, composition for blocking uv rays, and cosmetic material, published on December 1, 2016. describes zinc oxide nanoparticles as active components for blocking UV rays. The difference compared to the proposed invention is the new structure of organosilica particles.
Patent application W02018025610A1 entitled Zinc-oxide-containing composite particles, composition for uv shielding, and cosmetic published on February 8, 2018. also describes zinc oxide nanoparticles as active UV blocking components that are physically entrapped in organosilica particles which prevents the release of zinc. The difference compared to the proposed invention is that in the case of organosilica nanoparticles, the active component is an organic molecule (there is no presence of metal ions) which is an integral part of the particle bound by chemical bonds within the organosilica particle and they are all composed of organosilicas (on the basis of bridging polysilsesquioxanes).
Patent application W02001093812A1 entitled Cosmetic preparation, published on December 13, 2001. describes zinc oxide nanoparticles and titanium dioxide nanoparticles as active components for blocking UV rays that are physically trapped in the silicate particles. The difference compared to the proposed invention is reflected in the fact that organosilica particles have an active component, an organic molecule (there is no presence of metal ions), which is again, as above, an integral part of the particle bound by chemical (covalent Si-O-Si) bonds within the organosilica particle (bonded, not physically trapped), whereby organosilica particles are composed of organosilicas (contain Si-C bond), i.e. based on bridging polysilsesquioxane.
Patent US20070183992 entitled Cosmetic composition comprising porous particles incorporating optically active substances, published on August 9, 2007. differs from the invention in that, in the case of the invention, the organosilica particles are not coated with a silicate shell (they are not organic and inorganic substances that are physically trapped inside a porous silicate shell as in the case of the patent application), but the active components are found throughout the entire structure of the particle bound by chemical bonds in the structure of the particle, which is entirely composed of polysilsesquioxanes and there are no distinct features such as core and shell.
Patent application US20030170280A1 entitled Dermatological composition published on September 11, 2003. talks about the preparation of porous silicon and silicate particles for protection against UV radiation. The difference compared to the invention is in the structure and composition of the new organosilica particles.
Patent US10183868B2 entitled Mesoporous zinc oxide powder and method for production thereof, published on December 31, 2015. talks about the preparation of mesoporous zinc oxides. The difference compared to the invention is reflected in the fact that the organosilica particles in this invention are composed entirely of polysilsesquioxanes.
Patent US9138395B2 entitled Sunscreen compositions having synergistic combination of UV filters published on September 22, 2015. talks about the preparation of a formulation for protection against UV radiation based on a mixture of different organic components. In relation to the invention, the patent does not mention making particles with chemical (covalent) bonds as in the case of organosilica particles.
Patent US10682294B2 entitled Controlling zinc oxide particle size for sunscreen applications published on March 9, 2017, describes zinc oxide particles, which is a different composition compared to organosilica particles.
Patent JP5597549B2 entitled Mesoporous zinc oxide powder and method for producing the same published on March 31, 2011, also only describes zinc particles, not organosilica particles.
Patent US20100003204A1 entitled Nanoparticle hybrid sunscreens published on July 2, 2009. The status of this patent is listed as "abandoned". It refers to spherical particles with a diameter between 0.2 and 10 micrometers, prepared by emulsion polymerization of tetra-alkoxysilanes or organotrialkoxysilanes or organobridged trialkoxysilanes with a UV-absorbing chromophore monomer bearing two or more alkoxysilyl groups attached to the bridging chromophores. The synthesis of these particles takes place in anhydrous conditions in toxic solvents such as toluene and tetrahydrofuran, with the addition of formic acid as an acid catalyst. The difference compared to the invention is reflected in the composition of the particles, since the patent describes the use of silica precursors (Si(OMe4) on Fig 1) along with bridged silsesquioxane for the synthesis, while organosilica particles in this invention are constructed and composed entirely of bridged polysilsesquioxanes, including the use of building silsesquioxane component (D) and UV-shielding silsesquioxane component (C) to produce efficient UV-shielding organosilica particles. Furthermore, the synthesis methodology differs, since the invention uses mild synthesis conditions (room temperature) and as solvents methanol and water, with the addition of ammonia as a base catalyst and the presence of pore- templating species.
Patent DE102006025057A1 entitled Cosmetic sunscreen preparation with special texture published on July 2, 2009. The status of this patent is listed as "withdrawn". It refers to cosmetic formulations that contain molecules for UV protection in a formulation (in the form of a physical mixture) with liquid or pasty silicone oils or their mixtures, with the addition of other components. The difference compared to the invention is reflected in the composition, the method of synthesis and the nature of the formulation, since the invention describes organosilica particles that contain chemically (covalently) bound molecules for protection against UV radiation.
Patent US11389386B2 entitled Photochemically stable, non-leaching, bridged polysilsesquioxane based sunscreens published on January 30, 2017. The status of this patent is kept as "active". It refers to active particles (diameter 50 - 500 nm) for UV protection based on organobridged trialkoxysilanes (polysilsesquioxanes) that are prepared in the form of nanoparticles through oil/water microemulsion polymerization, sol-gel polymerization or a modified Stober process. The difference compared to the invention is reflected in the composition and to the method of particle synthesis. The patent also involves the use of bridged polysilsesquioxanes to incorporate covalently the UV-blocking molecules into the particles, however the patent claims (pages 11, 12) that the particle also: “comprise silicate comonomers in concentrations ranging from 0.001-95 mole % . Preferably , the silicate comonomers can copolymerize with the bridged compound monomers to form the bridged polysilsesquioxane-based sunscreen particles. The silicate comonomers may be selected from a group consisting of tetraalkoxysilane comonomers, sodium silicate comonomers , and organotrialkoxysilane comonomers”. In contrast, the invention herein relates to the particles that are produced solely from bridged polysilsesquioxane precursors, where a mixture of bridged silsesquioxanes, including building silsesquioxane component (D) and UV-shielding silsesquioxane component (C) is used to produce efficient UV-shielding organosilica particles. Therefore, the use of silica comonomers is not the subject of this invention as the organosilica particles in this invention are composed entirely of polysilsesquioxanes. Furthermore, the particles in the patent are not porous to a significant extent as there is no mention of the porosity of the particles and the use of this feature for storing different molecules and enabling their slow release from the particles, which may add additional benefit to the applications, which is also one of the claims in this invention.
Disclosure of invention
The invention is about new organosilica particles composed of covalently bound bridged polysilsesquioxane as effective blockers for ultraviolet rays.
The new organosilica particles are stable, efficient and safer in blocking UV rays. Current solutions are based on the use of TiCh and ZnO nanoparticles, however, there is growing concern about the harmful effects and effectiveness of these solutions.
Organosilica particles, as a new material, represent a safer alternative (both in terms of health and environmental protection) to active ingredients for protection against UV radiation that are currently in use. The invention solves this problem through the construction of new biocompatible organosilica particles that are capable of protecting against ultraviolet solar radiation by absorbing and scattering UV rays, while the organosilica particles are stable under the effect of UV radiation and with a possible wide spectrum of protection (UVA + UVB + UVC).
The main purpose of the invention is that the new organosilica particles can be used as an integral component of sunscreens, although broader application is also possible as an integral component of any material where protection from UV radiation is important.
According to current scientific knowledge, organosilica particles are safe for the environment and human health, without the ability to penetrate the skin.
Various types of silica particles, most commonly classified as synthetic amorphous silica (SAS), can be found in formulations since the 1950s as stabilizers and thickeners in various industry segments due to their high surface area and high water absorption capacity. In cosmetic products, SAS materials are considered health-safe additives, and they are most often used as abrasives, adsorbents, anti-caking agents, volumizers, coloring agents, and as thickening agents. In terms of internal composition, organosilica particles differ significantly from SAS materials, however, the outer surface of organosilica particles and SAS materials is similar in structure, as a result of which a similar interaction with biomolecules is expected and therefore good biocompatibility of organosilica particles. Also, due to the similar characteristics of the outer surface with SAS materials, the application of organosilica particles as UV blockers would provide a significant contribution to the improvement of product characteristics, for which SAS materials are currently used (abrasive agents, adsorbents, anti-caking agents, for increasing volume, coloring and as thickening agents...).
The invention relates to the composition of organosilica particles, which contain bridged polysilsesquioxane components C and D in different ratios, which are covalently cross-linked within the organosilica particles, whereby particles of different porous structures and morphology (spherical, cylindrical or bean-shaped) can be obtained for use in protection against UV rays. The role of component C is to ensure potent absorption of UV rays, while component D can have a partial UV-protective effect, but its primary role is constructive, i.e. enables the construction of organosilica desired structure.
In the case of porous organosilica particles, the pores can be filled with molecules that can play a role in additional UV protection or other benefits for the application. These additional molecules adsorbed on the surface or entrapped inside the pores of the organosilica particles through the application of various large molecules, which are covalently bound to the organosilica particles and prevent their leakage from the pores or enable their gradual release into the surrounding environment. In addition, the particles with enhanced porosity exhibit enhanced surface area and lower density, both of which could be beneficial for dispersing the particles and increasing the stability of particles in formulations.
Brief Description of Drawings
• Figure 1 shows UV VIS spectrum of ethanolic suspension (2 mg/mL) of organosilica particles-component D (contains only component D)
• Figure 2 shows UV VIS spectrum of ethanolic suspension (0.05 mg/mL) of organosilica particles-CD (contains components C and D)
• Figure 3 shows Assumed structure of an organosilica particle
• Figure 4 shows Scanning electron microscope images of particles
• Figure 5 shows Distribution of hydrodynamic diameter of particles in aqueous suspension
• Figure 6 shows Zeta potential of an organosilica particle
• Figure 7 shows BET isotherm and BJH pore size distribution for of organosilica particles-CD
• Figure 8 shows Component A- 4,4',4"-s-triazine-2,4,6-triyl-tribenzoic acid = TTBA and Component B - (3-aminopropyl)triethoxysilane = AP-TES
• Figure 9 shows Component C-4,4',4"-s-Triazine-2,4,6-triyl-tribenzamide- propyltriethoxysilane = TTTBA-TES
• Figure 10 shows Component D-4,4'-Bis(triethoxysilyl)- 1,1 '-biphenyl - BPH-TES Best Mode for Carrying Out of the Invention
The invention is about new organosilica particles, composed of bridging polysilsesquioxanes, which have the ability to block ultraviolet rays. Unlike the previous TiO2 and ZnO nanoparticles or organic blockers, the invention offers a more efficient and safer solution that does not lead to decomposition of UV blockers and formation of reactive oxygen species (ROS), which are harmful for the human health and the environment.
The invention solves this problem through the construction of new biocompatible organosilica particles that are capable of protecting against ultraviolet solar radiation by absorbing and scattering UV rays, while the organosilica particles are stable under the effect of UV radiation and with a possible wide spectrum of protection (UVA + UVB + UVC).
The primary purpose of the invention would be that the new organosilica particles can be applied as an integral part of sun creams, although a wider application is also possible as an integral part of any material in which protection from UV radiation would be important, e.g. for the preparation of UV-proof glasses, resins and paints, which would be of interest for the protection of materials and devices in the mechanical, construction, automotive, aviation and space industries, as well as in agriculture for the protection of plants from the harmful effects of UV radiation.
According to current scientific knowledge, organosilica particles are safe for the environment and human health, without the ability to penetrate the skin.
The invention relates to the composition of organosilica particles, which contain bridged polysilsesquioxane components C and D in different ratios, which are covalently cross-linked within the organosilica particle, whereby particles of different porous structure and morphology (spherical, cylindrical or bean-shaped) can be obtained for use in protection against UV rays. The role of component C is to ensure potent absorption of UV rays, while component D can have a partial UV-protective effect, but its primary role is constructive, i.e. enables the construction of organosilica desired structure.
Component C is based on organo-bridged polysilsesquioxanes, based on the structure of different organic UV blockers, from which bridging organosilicate precursors can be made by chemical modification. This component can be based on derivatives of triazine, cinnamate, salicylate, anthranilate, p-aminobenzoate, camphor, benzimidazole, benzophenone, dibenzoylmethane, diphenylacrylate and other organic molecules that have the ability to absorb UV rays. Herein, characteristics of a novel material are provided, which is obtained from the component C that is based on 1,3,5-triazine derivative-bridged polysilsesquioxane (compound which is analogous to bemotrizinol, a UV-absorbing molecule approved for use in sunscreens). Other examples of component C based on functionalized 1,3,5-triazine could include: 4,4',4"-(l,3,5-Triazine-2,4,6-triyl)tribenzoic acid), 4',4",,4""'-(l,3,5-Triazine-2,4,6-triyl)tris(([l,r-biphenyl]-4-carboxylic acid)), 3,3',3"-((l,3,5-Triazine- 2,4,6-triyl)tris(azanediyl))tribenzoic acid)).
Component D can be different building units based on bridging organosilica precursors. Examples: 4,4'-bis(triethoxysilyl)-l , 1 '-biphenyl, 1 ,4-bis(triethoxysilyl)benzene, 1 ,2-bis(triethoxysilyl)ethane, 1 ,2- bis(triethoxysilyl)ethylene, which they can also play a partial role in UV protection, as in the case of the use of precursors with significant absorption in the UVC region: 4,4'-bis(triethoxysil)-l,l'-biphenyl or 1,4- bis(triethoxysil)benzene.
In order to beter understand the innovative structure of the organosilica particle of the invention, we will observe the ability of the organosilica particle to block UV rays, by measuring the UV/VIS spectrum of this material. An example in Figure 1 is the UV/VIS spectrum of an organosilica material composed exclusively of component D (4,4'- bis (triethoxysil)- 1,1 '-biphenyl) (without component C) which shows a high ability to absorb UV rays in the area below 300 nm, which is partially covered by the UVB region, but the maximum absorption is in the UVC region.
Therefore, this material would have the greatest application potential for the preparation of glasses or coatings for protection against cosmic UVC radiation. Since UVC radiation does not reach the earth, a possible application of this material would be in protection against UV radiation in space, for use on visors on space suits or for glasses on spacecrafts. Porous organosilica particles based on this component D (4,4'- bis(triethoxysil)-l,l'-biphenyl) are already known in the literature, but their potential application for protection against UVC radiation has not been considered, which is a novelty within the scope of this invention.
Figure 2 shows the UV/VIS spectrum of the ethanolic suspension of the newly synthesized organosilica particles, which, in addition to the same component D (4,4'-bis(triethoxysil)-l,l'-biphenyl), also contain a triazine-based component C. It is noticeable that the maximum absorption of UV light is shifted to the area between 290 to 320 nm, which is the desired characteristic in the case of protection against UVB rays of solar radiation.
In the case of this example, organosilica particles contain component D (4,4'-bis(triethoxysil)-l,l'- biphenyl) and component C based on triazine at a ratio of 1 :9. Spectrophotometric measurements can be used to estimate the approximate value of the sun protection factor (SPF), which in the case of this material is 30. The SPF value indicates the amount of solar energy (UV radiation) required to produce sunburns on protected skin relative to the amount of solar energy required to produce sunburn on unprotected skin. The UV absorption efficiency and SPF of organosilica particles can be significantly increased by increasing the proportion of component C in the material. This kind of material would have a greater application for protection against harmful UV radiation on the surface of the earth. For example, as an active ingredient in sunscreens, in formulations to protect plants and animals, for the production of UV-resistant glass in the automotive, aviation and construction industries, and for use in greenhouses. It can also be used to prepare emulsions, paints, varnishes, resins and other coatings for use on surfaces that need to be protected from the sun's UVB radiation.
Partial UVA protection is also provided by these materials, which is evident from the material's significant UV absorption in the 320 to 400 nm region. It is also possible to significantly increase the absorption in the UVA range and thereby increase the protection against this radiation in case of need, if additional organic components were used in the composition of organosilica particles that have significant absorption in the UVA range.
Figure 3 shows the simplified structure of the new organosilica particles, while Figure 4 shows the image of the obtained organosilica particles with the help of a scanning electron microscope.
The surface of organosilica particles is typically dominated by silanol (Si-OH) and silica bonds (Si- O-Si). In the interior of the organosilica particle, there are organic groups (components C and D) that are chemically (covalently) bound via Si-O-Si bonds, and there is no possibility of their exit from the interior under standard ambient conditions. The surface of organosilica particles does not differ in structure from silicate particles, which are regularly applied in cosmetic preparations, which would indicate that their interactions with the skin do not differ significantly and it is expected that organosilica particles are bicompatible, as in the case of related silica particles. The surface of organosilica particles can also be additionally modified with various organosilicates, which can additionally favorably affect the ability to protect against UV radiation, biocompatibility of organosilica particles, miscibility with various components in formulations for cosmetic preparations, paints, varnishes, or for optimizing the preparation of UV-proof glasses.
Figure 4 shows organosilica particles containing component D (4,4'-bis(triethoxysil)-l,T-biphenyl) and component C based on triazine in a ratio of 1 :9. It is noticeable that spherical particles were obtained with their diameter in the range of 200-500 nm. The size of organosilica particles and their morphology can be modified by changes in the synthesis conditions.
Figure 5 shows the distribution of the hydrodynamic diameter of the suspension of particles in water for 5 measurements of the same sample containing component D (4,4'-bis(triethoxysil)-l,l'-biphenyl) and component C based on triazine in a ratio of 1 : 9. The result indicates that individual particles (which according to SEM measurements are 200 to 500 nm in size) cannot be detected, but it is indicative that individual organosilica particles are organized (agglomerated) in the aqueous environment into larger particles, which have a hydrodynamic diameter of about 1 micrometer . This result is particularly suitable in the case of the preparation of cosmetic preparations for protection against solar UV radiation, because such large particles have no possibilily of passing through the skin. The particle's ability to agglomerate can also be influenced by surface modification of organosilica particles with appropriate organosilanes.
Figure 6 shows the measurement of the surface charge of an organosilica particle (zeta potential), which confirms that the surface is negatively charged (zeta potential below -20 mV), which is characteristic of the as synthesized silica particles, with silanol groups present on the surface that are deprotonated in aqueous environment. Therefore, the surface charge of these organosilica particles is very similar to the charge of silica particles (SAS materials), which are standardly used in cosmetic and other preparations (paints, varnishes...), and a similar interaction of these particles with other components of the formulation and with skin.
Due to the similar characteristics of the outer surface with SAS materials, the application of organosilica particles as UV blockers would provide a significant contribution to the improvement of product characteristics, for which SAS materials are currently used (abrasive agents, adsorbents, anti-caking agents for increasing volume, coloring and as a thickening agent...).
The surface charge can also be modified into neutral or positive values by functionalization with organosilanes, depending on the desired application and the required miscibility in the formulation.
Figure 7 shows the results of the nitrogen sorption measurements which indicates the porous nature of the particles. The BET isotherm and BJH pore size distribution reveal predominantly microporous (pore diameter < 2 nm) nature of the material, with a portion of the pores in the mesoporous region (notable peak at 2.5 nm in the BJH graph). The prepared organosilica particles exhibit high surface area of 247 g/cm3 and average pore diameter of 1.7 nm. The amount of porosity and surface area can be influenced by modifications in the synthetic procedure, by changing the components C and D and their ratio.
In the case of porous organosilica particles, the material can be loaded with molecules that can play a role in additional UV protection or exhibit other benefits for application (ROS scavenging, skin nourishing, drug delivery etc.). These additional molecules can be adsorbed on the surface or entrapped inside the pores of the organosilica particles through the application of various large molecules, which are covalently bound to the organosilica particles and prevent their exit from the pores or enable their slow release into the surrounding environment. The loaded molecules can benefit the application, such as entrapping additional UV blocking molecules in the pores, enabling topical delivery of drugs, such as growth factors for wound healing, delivery of antimicrobial and antifungal molecules, vitamins and other molecules. In addition, the particles with enhanced porosity exhibit enhanced surface area and lower density, both of which could be beneficial for dispersing the particles and increasing the stability of particles in formulations.
A more detailed insight into the preparation of the organosilica particle requires that component C is obtained in the reaction of components A and B. Component A is given in Figure 8 under the name 4,4',4"-s- triazine-2,4,6-triyl-tribenzoic acid - TTBA, while component B is given in Figure 8 under the name (3- aminopropyl)triethoxysilane = AP-TES. They are mixed in a ratio of 1:3 (or at least in the ratio 1:2), in acetonitrile as a solvent in the presence of dicyclohexylcarbodiimide (DCC) as a catalyst.
To obtain organosilica particles, component C (Figure 9) is mixed with component D (Figure 10), in a solution of surfactant (cetyltrimethylammonium bromide) in a mixture of water and ethanol as a solvent, with the presence of ammonia as a catalyst. In the case of the presented result, a mixture of components C and D was used in a ratio of 1:9, but by applying a higher proportion of component C, organosilica particles with stronger UV protection can be expected.
Industrial applicability
The primary purpose of the invention would be that the new organosilica particles can be applied as an integral part of sunscreens, although a wider application is also possible as an integral part of any material in which protection from UV radiation would be important, e.g. for the preparation and improvement of the physico-chemical characteristics of UV-proof glasses, resins and paints, which would be of interest for the protection of materials and devices in the mechanical, construction, automotive, aviation and space industries, as well as in agriculture for the protection of plants from the harmful effects of UV radiation.
Furthermore, the surface and the pores of organosilica particles can be applied for storing molecules and enabling their release from the particles, which may yield an additional benefit to the applications. These may include storing and release of drugs, antimicrobial and antifungal molecules, vitamins, minerals, skin conditioners, growth factors, scavengers of reactive oxygen species (ROS), additional UV-shielding molecules, and other molecules and biomolecules that may be of benefit for the application.

Claims

Claims What is claimed is:
1. Organosilica particles formulation based on bridging polysilsesquioxanes for applications in blocking ultraviolet rays (UVA, UVB and UVC) of the general formula (I) Formula I: H-(O-SiO2-l-SiO2)n-(O-SiO2-H-SiO3)1n
Wherein C is a UV-absorbing organic moiety, wherein C is selected from a group consisting of triazine, cinnamate, salicylate, anthranilate, p-aminobenzoate, camphor, benzimidazole, benzophenone, dibenzoylmethane and diphenylacrylate and D is an organic moiety that facilitates particle formation with aditional UV absorbing capabilities; n, m > 0 And structural formula:
Figure imgf000015_0001
(I) are indicated by the fact that the external surface of the as-synthesized material contains silanol (Si-OH) groups. The Internal structure is composed of bridged silsesquioxanes, where the bridging organic components C and D are chemically, covalently bound to the particles via Si-C bonds, while covalent silicate bonds (Si-O-Si) exist between the individual bridging silsesquioxane moieties.
2. Claim 2 depends on Claim 1. Organosilica particles formulation according to claim 1, characterized in that component C is based on organic UV blockers, from which bridged silsesquioxane precursors are synthesized in chemical reactions between a parent UV-shielding organic molecule (component A), e.g. 4, 4', 4"- s-triazine-2,4,6-triyl-tribenzoic acid or other molecules based on derivatives of triazine, cinnamate, salicylate, anthranilate, p-aminobenzoate, camphor, benzimidazole, benzophenone, dibenzoylmethane, diphenylaciylate and other organic molecules that have the ability to absorb UV rays) and two or more equivalents of a component A, e.g. (3-aminopropyl)triethoxysilane, (3-isocyanatopropyl)triethoxysilane, (3- Glycidyloxypropyl)trimethoxysilane or other suitable organoalkoxysilane reagent to produce a covalent bond with the component B, with or without a presence of a catalyst, in anhydrous conditions.
3. Claim 3 depends on Claims 1 and 2. Organosilica particles formulation according to claim 1, characterized in that component C is based on derivatives of triazine, cinnamate, salicylate, anthranilate, p- aminobenzoate, camphor, benzimidazole, benzophenone, dibenzoylmethane, diphenylacrylate and other structural analogues of these classes of organic molecules that have the ability to absorb UV rays. In case of the component C that is based on 1,3,5-triazine derivative-bridged polysilsesquioxane, the reactants to produce the component C could include: 4,4',4"-(l,3,5-Triazine-2,4,6-triyl)tribenzoic acid), 4',4"',4""'-(l,3,5-Triazine- 2,4,6-triyI)tris(([I,r-biphenyI]-4-carboxylic acid)), 3,3',3"-((l,3,5-Triazine-2,4,6- triyl)tris(azanediyl))tribenzoic acid)) and other structural analogues of 1,3,5-triazine.
4. Claim 4 depends on Claims 1-3. Organosilica particles formulation according to claim 1, characterized in that component D is 4,4'-bis(triethoxysilyl)-l,l'-biphenyl, l,4-bis(triethoxysilyl)benzene, 1,2- bis(triethoxysilyl)ethane, l,2-bis(triethoxysyl)ethylene or other bridged silsesquioxanes that facilitate particle formation.
5. Claim 5 depends on Claims 1-4. Organosilica particles formulation according to claim 1, characterized in that said organosilica particles are porous with the pore diameter in the range 1-50 nm, and their morphology is spherical, or in the form of cylinders or beans.
6. Claim 6 depends on Claims 1-5. The application of the organosilica particles as claimed in claims 1-5 as components for sunscreen formulation comprising: a. the sunscreen composition according to claims 1-5, wherein the sunscreen composition is present in an amount effective to absorb UV radiation; and b. a pharmaceutically-acceptable sunscreen carrier.
7. Claim 7 depends on Claims 1 -5. The application of the surface and the pores of organosilica particles as claimed in claims 1-5 for storing molecules and enabling their release from the particles, which may yield an additional benefit to the applications. These may include entrapping additional UV-shielding molecules in the pores, storing and release of drugs, antibacterial or antifungal molecules, biomolecules, vitamins, minerals, skin conditioners, scavengers of reactive oxygen species (ROS), and other molecules that may benefit the application, such as for medicinal application in terms of topical delivery of drugs, such as growth factors for wound healing or vitamins, antimicrobials and other molecules.
8. Claim 8 depends on Claims 1-5. The application of the organosilica particles formulations as claimed in claims 1-5 for UV-resistant glasses in the automotive, aviation, space and construction industries, and in agriculture industry for the use in greenhouses.
9. Claim 9 depends on Claims 1-5. The application of the organosilica particles formulations as claimed in claims 1-5 for the preparation of UV-proof emulsions, paints, varnishes, resins and other coatings for use on surfaces that need to be protected from the UV radiation.
10. The organosilica particles formulations according to Claims 1-5, wherein the porosity is obtained by using surfactants or other substances such as cetyltrimethylammonium bromide, sodium dodecyl sulfate, Pluronic P123, and other charged or not charged surfactants and substances that serve as templates for the pores during the synthesis of the organosilica particles.
11. The organosilica particles formulations according to Claims 1-5, wherein they are prepared by sol gel polymerization or modified Stober polymerization of bridged silsesquioxane precursors in the presence of pore templating surfactants or substances.
12. The organosilica particles formulations according to Claims 1-5, wherein they are characterized in that the maximum and intensity of UV absorption of the obtained organosilica particles can be modified by changing the components C and D and their ratio.
13. The organosilica particles formulations according to Claims 1-5, wherein they are characterized in that the obtained particle diameter is 50-1000 nm and their size can be modified by applying changes in the synthesis conditions.
14. The organosilica particles formulations according to Claims 1-5, wherein they are characterized in that the organosilica particles are organized in the aqueous environment into larger particles, whereby the ability to organize is affected by the surface modification of the particle itself with organosilanes.
15. The organosilica particles formulations according to Claims 1-5, wherein they are characterized in that the as synthesized organosilica particles are negatively charged, whereby the surface charge can be modified into more positive, negative or neutral values by surface modifications and functionalization, depending on the desired application and the required miscibility in the formulation.
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