WO2023184788A1 - Welding method, welding structure of elastic electric contact terminal, and electronic device - Google Patents

Welding method, welding structure of elastic electric contact terminal, and electronic device Download PDF

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Publication number
WO2023184788A1
WO2023184788A1 PCT/CN2022/105628 CN2022105628W WO2023184788A1 WO 2023184788 A1 WO2023184788 A1 WO 2023184788A1 CN 2022105628 W CN2022105628 W CN 2022105628W WO 2023184788 A1 WO2023184788 A1 WO 2023184788A1
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layer
thickness
component
welding
auxiliary layer
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PCT/CN2022/105628
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French (fr)
Chinese (zh)
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陈木久
陈方
陈巧
刘晶云
邹志强
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深圳市卓汉材料技术有限公司
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Publication of WO2023184788A1 publication Critical patent/WO2023184788A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/20Bonding
    • B23K26/21Bonding by welding
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/70Auxiliary operations or equipment

Definitions

  • the present application relates to the technical field of communication equipment, and in particular to a welding method, a welding structure of elastic electrical contact terminals, and electronic equipment.
  • elastic electrical contact terminals or welding shrapnel are generally used to make electrical connections between two contact surfaces that require electrical contact inside the electronic equipment.
  • Elastic electrical contact terminals generally include two parts, an elastic member for buffering and rebound and an elastic member for connecting the elastic member. Flexible electrical contact terminals fixed to the base plate. Among them, in this patent application, ultrasonic welding is used to fix the welding segments to the base plate - the metal mid-plate.
  • the ultrasonic welding method requires the design and production of a specific ultrasonic indenter to meet the ultrasonic welding needs of the above-mentioned welding sections.
  • the initial investment cost is high; and the service life of this ultrasonic indenter is limited, so it is difficult to use. It needs to be replaced in time after a period of time, and the cost of later maintenance is also high. It can be seen that the cost of fixing the elastic electrical contact terminals to the substrate using ultrasonic welding is relatively high.
  • An object of the present application is to provide a welding method suitable for welding the conductive layer of the elastic electrical contact terminal to the substrate, which has a lower cost of fixing the conductive layer on the substrate, thereby reducing the production cost of related electronic equipment.
  • the thickness ⁇ 1 of the first component is less than or equal to 25 ⁇ m, including:
  • a first auxiliary layer is adhered to the upper surface of the first component through an intermediate glue layer.
  • the laser absorption rate of the first auxiliary layer is greater than that of the first component; wherein the thickness ⁇ 2 of the first auxiliary layer is 35 ⁇ m. to 100 ⁇ m, the sum of the thickness ⁇ 1 of the first member and the thickness ⁇ 2 of the first auxiliary layer is greater than or equal to 50 ⁇ m;
  • a laser welding device is used to emit laser light so that the laser light passes through the first auxiliary layer, the first component and the second component in order to laser weld the first component and the second component.
  • the thickness of the intermediate adhesive layer is h1, and 3 ⁇ m ⁇ h1 ⁇ 10 ⁇ m.
  • the first auxiliary layer includes a second base material and a metal coating plated on the upper surface of the second base material and used to absorb laser energy.
  • the laser absorption rate of the metal coating is respectively Greater than the laser absorptivity of the first component and the second substrate.
  • the intermediate glue layer is one of acrylic pressure-sensitive glue, epoxy hot melt glue, polyurethane thermosetting glue, polyurethane thermoplastic glue and silicone glue.
  • the first auxiliary layer before adhering the first auxiliary layer to the upper surface of the first component through the intermediate glue layer, it also includes: The lower surface of the first auxiliary layer is roughened.
  • stacking the first component on the second component specifically includes: providing a bottom glue layer on the lower surface of the first component, so that the first component It is bonded to the second component through the bottom glue layer.
  • the thickness of the bottom adhesive layer is h2, and 3 ⁇ m ⁇ h2 ⁇ 10 ⁇ m.
  • the thickness of the middle glue layer be h1
  • the thickness of the bottom glue layer be h2, h1+h2 ⁇ 12 ⁇ m.
  • the bottom glue layer is one of acrylic pressure-sensitive glue, epoxy hot-melt glue, polyurethane thermosetting glue, polyurethane thermoplastic glue, and silicone glue.
  • the method before setting the bottom glue layer on the lower surface of the first component, the method further includes: roughening the lower surface of the first component.
  • the first auxiliary layer after the first auxiliary layer is adhered to the upper surface of the first component through the intermediate glue layer, it further includes: using a knife to apply The force toward the first member drives the first auxiliary layer and the first member to simultaneously recess downward until a penetrating force is formed from the upper surface of the first auxiliary layer to the lower surface of the first member.
  • the incision is in the shape of a wedge with a width that gradually decreases from top to bottom.
  • the first auxiliary layer is formed with a bend along the top edge of the incision, and the bend extends downward along the inner peripheral wall of the incision. , and the bent end expands to wrap the lower surface of the first member.
  • a welding structure of an elastic electrical contact terminal including a terminal body and a substrate;
  • the terminal body includes an elastic core and a conductive layer wrapped around the outer periphery of the elastic core, the conductive layer has an outwardly extending protrusion and forms a weld
  • the thickness of the conductive layer is 9 ⁇ m to 25 ⁇ m;
  • the conductive layer and the substrate are made of different metal materials;
  • the welding segment is welded to the substrate by the above welding method, wherein, The welding section is used as the first component, and the substrate is used as the second component.
  • the substrate is an aluminum plate.
  • the conductive layer includes a first base material and a conductive coating plated on the outer surface of the first base material; wherein the first base material includes copper, and the conductive coating The anti-oxidation ability of the coating is better than that of the first substrate.
  • the first base material is electrolytic copper foil or rolled copper foil
  • the conductive plating film is a gold layer with a thickness >10 nm or a nickel layer with a thickness >0.3 ⁇ m or a thickness greater than 0.1 ⁇ m tin layer.
  • the first auxiliary layer includes a second base material and a metal plating film plated on the upper surface of the second base material, and the intermediate adhesive layer is provided on the second base material.
  • the second base material includes copper
  • the metal plating film includes nickel.
  • An electronic device includes a display screen and a welding structure of an elastic electrical contact terminal according to any one of claims 14 to 18; the conductive layer is sandwiched between the display screen and the substrate.
  • the welding method proposed in this application is suitable for laser welding of first components with small thickness and low laser absorption rate.
  • the laser of the first auxiliary layer that first contacts the laser in this application ensures that the first component in this application can absorb enough laser energy, so that the laser energy reaching between the first component and the second component is sufficient to form a molten pool.
  • the thickness of the first auxiliary layer is greater than or equal to 35 ⁇ m and the sum of the thicknesses of the first auxiliary layer and the first member is ⁇ 50 ⁇ m, it is equivalent to thickening the first member and increasing its laser absorption. Efficient processing ensures that the first component at the micron level can form a molten pool with sufficient depth and strength between the first component and the second component during welding.
  • a plurality of first auxiliary layers are generally obtained in batches by cutting a larger-sized blank.
  • the thickness of the first auxiliary layer is not likely to be too large. If the thickness exceeds 100 ⁇ m, the production efficiency will be too low.
  • the first auxiliary layer has sufficient thickness, it can also play a supporting effect on the structure of the first member and effectively prevent the first member from breaking.
  • the welding method proposed in this application can weld a first component with a smaller thickness and a lower laser absorption rate to a second component of a heterogeneous metal through laser welding by providing a first auxiliary layer;
  • using laser welding instead of ultrasonic welding can reduce the cost of welding and solve the technical problem of high ultrasonic welding cost raised in the background art.
  • Proposed welding structure of elastic electrical contact terminals please refer to the second aspect of this application.
  • Figure 1 is a flow chart of the welding method proposed according to the first aspect of the embodiment of the present application.
  • Figure 2 is a schematic diagram of the welding of the first component and the second component in the welding method proposed according to the first aspect of the embodiment of the present application.
  • FIG. 3 is a schematic structural diagram of the terminal body in the welding structure of the elastic electrical contact terminal proposed according to the second aspect of the embodiment of the present application.
  • Figure 4 is an enlarged view of point A in Figure 3.
  • FIG. 5 is a structural diagram when cuts and bends are formed in the welding structure of the elastic electrical contact terminal proposed according to the second aspect of the embodiment of the present application.
  • FIG. 6 is a structural diagram of an electronic device according to the third aspect of the embodiment of the present application.
  • Terminal body 110. Elastic core; 120. Heat-resistant polymer film layer;
  • Conductive layer 131. Welding section; 132. First base material; 133. Conductive coating; 134. Incision;
  • First auxiliary layer 141.
  • Second base material 142.
  • Metal coating 143. Bending;
  • first, second, etc. are used herein to describe various information, but this information should not be limited to these terms, and these terms are only used to distinguish the same type of information from each other.
  • first information may also be called “second” information
  • second information may also be called “first” information.
  • the first aspect of the present application proposes a welding method for welding the first member 400 and the second member 500 which are made of different metal materials, wherein the thickness ⁇ 1 of the first member 400 is Between 9 ⁇ m and 25 ⁇ m, including:
  • Step S100 stack the first component 400 on the second component 500.
  • Step S200 adhere the first auxiliary layer 140 to the upper surface of the first component 400 through the intermediate glue layer 150.
  • the laser absorption rate of the first auxiliary layer 140 is greater than that of the first component 400; wherein, the thickness ⁇ 2 of the first auxiliary layer 140 is Between 35 ⁇ m and 100 ⁇ m, the sum of the thickness ⁇ 1 of the first member 400 and the thickness ⁇ 2 of the second member 500 is greater than or equal to 50 ⁇ m.
  • Step S300 Use a laser welding device to emit laser light so that the laser light passes through the first auxiliary layer 140, the first component 400 and the second component 500 in order to laser weld the first component 400 and the second component 500.
  • the function of the first auxiliary layer 140 is mainly used to absorb laser energy, so that the laser energy reaching between the first component 400 and the second component 500 is sufficient; since the materials have different wavelengths, The laser absorption rate is different. Therefore, as the laser welding parameters are different, such as the wavelength of the laser welding, the material selection of the first auxiliary layer 140 will also be different.
  • the function of the intermediate glue layer 150 is to relatively fix the first component 400 and the first auxiliary layer 140 before laser welding, so that no misalignment occurs between the first auxiliary layer 140 and the first component 400 during laser welding. situation to ensure the progress of laser welding.
  • the area of the first member 400 is not less than 1.5mm ⁇ 1.5mm, that is, the first member 400 is rectangular, and its length and width are respectively greater than or equal to 1.5mm.
  • the middle glue layer 150 is configured as: After the intermediate adhesive layer 150 is provided, the relative peeling force at an angle of 180 degrees between the first auxiliary layer 140 and the first member 400 is greater than or equal to 500gf/25mm; more preferably, the relative peeling force is greater than or equal to 800gf/25mm to ensure that The first component 400 and the first auxiliary layer 140 are relatively fixed before laser welding.
  • the welding method proposed in this application is suitable for laser welding the first component 400 with a small thickness and low laser absorption rate.
  • laser welding is generally suitable for welding components with large thickness or large laser absorption rate, because components with too small thickness will be directly penetrated by laser energy during laser welding, and the laser absorption rate Smaller components are difficult to weld because they are difficult to absorb laser energy; therefore, when welding some common materials, due to different laser parameters and different laser absorption rates of the materials, the materials are often required to have different thicknesses to ensure that the materials will not be Welding through; at the same time, the smaller the laser absorption rate of the material, the greater the thickness that can be used for laser welding to ensure that the material can absorb sufficient laser energy. Table 1 below lists the thickness required for laser welding of some materials:
  • the laser welding method proposed in this application overcomes the existing problems. Due to technical bias, laser welding is applied to the first component 400 with a thickness of micron level and a small laser absorption rate.
  • the first auxiliary device in the present application first contacts the laser.
  • the laser absorption rate of layer 140 is relatively large, which ensures that the first component 400 in this application can absorb sufficient laser energy, so that the laser energy reaching between the first component 400 and the second component 500 is sufficient to form a molten pool.
  • the thickness of the first auxiliary layer 140 is greater than or equal to 35 ⁇ m and the sum of the thicknesses of the first auxiliary layer 140 and the first member 400 is ⁇ 50 ⁇ m, it is equivalent to thickening the first member 400 and The process of increasing its laser absorption rate ensures that a molten pool with sufficient depth and strength can be formed between the micron-level first component 400 and the second component 500 during welding.
  • a plurality of first auxiliary layers 140 are generally obtained in batches by cutting a larger-sized blank. In terms of the effect of laser welding, the thickness of the first auxiliary layer 140 The larger the thickness, the better the effect of laser welding.
  • the efficiency is improved, so the thickness of the first auxiliary layer 140 is not likely to be too large. If the thickness exceeds 100 ⁇ m, the production efficiency will be too low.
  • the first auxiliary layer 140 since the first auxiliary layer 140 has sufficient thickness, it can also provide a supporting effect on the structure of the first member 400 and effectively prevent the first member 400 from breaking.
  • the welding method proposed in the first aspect of the present application can laser weld the first component 400 with a smaller thickness and lower laser absorption rate to the second component 500 of a heterogeneous metal by providing the first auxiliary layer 140 Above; when applying the welding method of this application to the welding of elastic electrical contact terminals, using laser welding instead of ultrasonic welding can reduce the cost of welding and solve the technical problem of high ultrasonic welding cost raised in the background art.
  • using laser welding instead of ultrasonic welding can reduce the cost of welding and solve the technical problem of high ultrasonic welding cost raised in the background art.
  • the thickness of the intermediate adhesive layer 150 is h1, and 3 ⁇ m ⁇ h1 ⁇ 10 ⁇ m.
  • the greater the thickness the better the bonding effect, that is to say, the better the stability between the first auxiliary layer 140 and the first component 400 before laser welding.
  • the thicker the middle glue layer 150 the greater the obstruction to the conduction of laser energy, resulting in worse laser welding effects; in addition, the resistance of the middle glue layer 150 after laser welding is higher, affecting the resistance of the elastic electrical contact terminals.
  • the thickness of the middle glue layer 150 should not be too large and must satisfy h1 ⁇ 10 ⁇ m; however, the smaller the thickness of the middle glue layer 150, the better the connection stability between the first auxiliary layer 140 and the first component 400 before laser welding. The worse, the relative position fixing effect is limited, which is not conducive to laser welding. Therefore, the thickness of the middle adhesive layer 150 should not be too small and must satisfy h1 ⁇ 3 ⁇ m.
  • connection stability between the first auxiliary layer 140 and the first component 400 before laser welding it can be further ensured through other methods; it should be noted that the description of other methods in this preferred embodiment does not limit this preferred method.
  • the implementation of the embodiment must rely on other methods to stabilize the connection stability between the first auxiliary layer 140 and the first component 400 before laser welding. Even without other methods, the intermediate adhesive layer 150 still has a certain degree of adhesion ability to ensure laser welding. Connection stability between the first auxiliary layer 140 and the first component 400 before welding.
  • the first auxiliary layer 140 needs to have both good bonding effect with the intermediate adhesive layer 150 and high laser absorption rate.
  • the first auxiliary layer 140 can be made of silver-nickel copper, carbon steel, aluminum foil, etc.
  • the first auxiliary layer 140 includes a second substrate 141 and a metal coating 142 plated on the upper surface of the second substrate 141 and used to absorb laser energy.
  • the laser absorption rate of the metal coating 142 is greater than that of the first component 400 respectively. and the laser absorption rate of the second substrate 141.
  • the second base material 141 is used to bond with the first base material 132 through the intermediate adhesive layer 150, and the metal coating 142 is used to absorb sufficient laser energy; such an arrangement can easily achieve the guarantee and the intermediate adhesive layer at the same time.
  • the adhesion effect between the layers 150 and the effect of being able to absorb sufficient energy of the laser energy do not need to be unduly harsh in the selection of the first auxiliary layer 140, so there is no need to repeatedly verify which material can simultaneously meet the requirements of good laser absorption rate and
  • the requirement of being able to adhere well to the intermediate adhesive layer 150 increases the manufacturing steps of plating the metal film layer on the second substrate 141, but reduces the difficulty of material selection and can better control the cost of the product.
  • the middle glue layer 150 can be one of acrylic pressure-sensitive glue, epoxy hot melt glue, polyurethane thermosetting glue, polyurethane thermoplastic glue, and silicone glue. Specifically, the cost, bonding effect, and Laser energy conduction hindrance effect and other factors are selected.
  • the method before adhering the first auxiliary layer 140 to the upper surface of the first member 400 through the intermediate glue layer 150 , that is, before step S200 , the method further includes: At least one of the surface and the lower surface of the first auxiliary layer 140 is roughened. Due to the small thickness of the intermediate adhesive layer 150, the bonding effect with the upper surface of the first member 400 and the lower surface of the first auxiliary layer 140 is limited. At least one surface of the lower surface of an auxiliary layer 140 is roughened, which can improve the bonding effect between the intermediate adhesive layer 150 and the roughened surface.
  • the upper surface of the first member 400 and the lower surface of the first auxiliary layer 140 are roughened at the same time, so that the intermediate adhesive layer 150 can achieve a better bonding effect.
  • the step S100 of stacking the first component 400 on the second component 500 specifically includes: providing a bottom glue layer 160 on the lower surface of the first component 400 to allow the first component 400 to pass through
  • the bottom glue layer 160 is bonded to the second component 500 so that the first component 400 can be preliminarily fixed to the second component 500 before laser welding, thereby ensuring the progress of laser welding without requiring additional components like traditional laser welding.
  • Positioning fixture wherein, when the conductive coating 133 is provided, the bottom glue layer 160 adheres to the lower surface of the conductive coating 133 of the first component 400 .
  • the thickness of the bottom glue layer 160 is h2, and 3 ⁇ m ⁇ h2 ⁇ 10 ⁇ m.
  • the bottom glue layer 160 is similar to the middle glue layer 150 in that the bonding effect increases with the increase in thickness, but the resistance to the conduction of laser energy also increases with the increase in thickness, so the bottom glue layer 160 should also not be too large or too small, and must satisfy 3 ⁇ m ⁇ h2 ⁇ 10 ⁇ m.
  • the sum of the thickness of the middle glue layer 150 and the thickness of the bottom glue layer 160 is h1 + h2 ⁇ 12 ⁇ m to further ensure the effect of laser energy transmission.
  • the bottom glue layer 160 can be one of acrylic pressure-sensitive glue, epoxy hot melt glue, polyurethane thermosetting glue, polyurethane thermoplastic glue, and silicone glue. Specifically, the cost, bonding effect, and Laser energy conduction hindrance effect and other factors are selected.
  • the method further includes: roughening the lower surface of the first component 400 before disposing the bottom glue layer 160 on the lower surface of the first component 400 .
  • the bonding effect of the bottom glue layer 160 with limited thickness is limited.
  • the bond between the bottom glue layer 160 and the lower surface of the first member 400 can be improved. The bonding effect between them.
  • the method before arranging the bottom glue layer 160 on the lower surface of the first component 400, the method further includes: using a knife to apply a glue on the upper surface of the first auxiliary layer 140 toward the first auxiliary layer 140.
  • the force of a member 400 drives the first auxiliary layer 140 and the first member 400 to recess downward at the same time until a penetrating form is formed from the upper surface of the first auxiliary layer 140 to the lower surface of the first member 400 .
  • the cutout 134 on the surface is in the shape of a wedge with a width that gradually decreases from top to bottom.
  • the first auxiliary layer 140 is formed with a bend 143 along the top edge of the cutout 134.
  • the bend 143 is formed along the top edge of the cutout 134.
  • the inner peripheral wall of the cutout 134 extends downward, and the end of the bend 143 expands to wrap the lower surface of the first member 400 , as shown in FIG. 4 .
  • the number of cuts 134 and bends 143 formed is multiple to form multiple lock-like structures, further improving the stability between the first auxiliary layer 140 and the first member 400 .
  • connection stability can be formed by providing multiple force-applying parts on the tool or by applying force multiple times through the tool.
  • the intermediate glue layer 150 cannot be too thick to affect the laser energy conduction, there is a problem of poor relative connection stability between the first auxiliary layer 140 and the first component 400 before laser welding. Furthermore, in some embodiments, It also includes: disposing a second auxiliary layer below the first component 400 .
  • a cutter is used to apply a predetermined force toward the first member 400 on the upper surface of the first auxiliary layer 140 to drive the first auxiliary layer 140 , the first member 400 and the second auxiliary layer to simultaneously dent downwardly until the first auxiliary layer 140 is formed.
  • the cutout 134 extends from the upper surface to the lower surface of the second auxiliary layer.
  • the cutout 134 is in the shape of a wedge with a gradually decreasing width from top to bottom.
  • the first auxiliary layer 140 is formed with a bend 143 along the top edge of the cutout 134.
  • the bend 143 is formed along the top edge of the cutout 134.
  • the inner peripheral wall of the cutout 134 extends downward, and the end of the bend 143 expands to wrap the lower surface of the second auxiliary layer.
  • a molten pool is formed between the second auxiliary layer and the second member 500 and fixed as a whole, which is different from the solution in which the second auxiliary layer is not provided.
  • the connection effect is more stable; secondly, since the thickness of the first component 400 is further increased, the laser welding effect is better; however, the solution of setting the second auxiliary layer is more difficult in production and processing. .
  • the second aspect of the present application proposes a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; the terminal body 100 includes an elastic core 110 and an elastic core wrapped around the outer circumference of the elastic core 110.
  • the conductive layer 130 has an end that extends outward and forms a welding section 131.
  • the thickness of the conductive layer 130 is 9 ⁇ m to 25 ⁇ m; the conductive layer 130 and the substrate 200 are made of different metal materials;
  • the welding section 131 is welded to the substrate 200 through the welding method proposed in the first aspect of this application, wherein the welding section 131 is used as the first component 400 and the substrate 200 is used as the Second component 500.
  • the first auxiliary layer 140 is first adhered to the upper surface of the welding section 131 using the intermediate adhesive layer 150, and then the welding section 131 is set on the substrate 200. Then, the laser welding device is used to emit laser light. The emitted laser light passes through the first auxiliary layer 140, the intermediate adhesive layer 150 and the welding section 131 in sequence and reaches the gap between the lower surface of the welding section 131 and the substrate 200, and the welding is performed. The segment 131 and the base plate 200 are welded respectively, so that the welding segment 131 is welded to the base plate 200 .
  • the above-mentioned conductive layer 130 is mainly used on the elastic electrical contact terminal as a conductive path to conductively connect the energized components that need electromagnetic shielding, elimination of signal interference or grounding, such as the display screen 300, to other components, such as the second component 500. .
  • the thickness ⁇ 1 of the conductive layer 130 is between 9 ⁇ m and 25 ⁇ m, which meets the resilience performance requirements of the elastic core 110 and the miniaturization requirements of the terminal body 100 .
  • the first component 400 in this solution cannot be simply thickened to enable it to be laser welded.
  • the reason is that this solution involves elastic electrical contact terminal products in the field of communication equipment technology.
  • the first member 400 is a part of the conductive layer 130. If the first member 400 needs to be thickened, the conductive layer 130 must be thickened, and because the conductive layer 130 has average resilience, thickening The conductive layer 130 will then inhibit the elastic core 110 of the elastic electrical contact terminal from rebounding after being compressed, resulting in a reduction in the resilience of the elastic core 110 , thereby affecting the operation of the elastic electrical contact terminal.
  • the greater the thickness of the first member 400 the greater the space required for installing the elastic electrical contact terminals, which is not conducive to the miniaturization design of the elastic electrical contact terminals.
  • the thickness of the first member 400 cannot be increased by repeatedly folding the first member 400 so that it can be laser welded. The reason is that if the first member 400 is repeatedly folded to form a larger If the thick first member 400 is to be laser welded, it must be folded at least multiple times.
  • the multi-layered first member 400 formed after folding is not suitable for setting an adhesive layer for bonding. On the one hand, it consumes a large amount of adhesive layer, and on the other hand, it consumes a lot of adhesive layer. On the one hand, the operation is not convenient, because the multi-layer first component 400 often needs to be pressed with a customized jig to ensure that the gaps between the layers can be eliminated during the laser welding process to ensure the laser welding effect.
  • the volume of this application is small Moreover, the space where the installation is located is small, and the setting of the jig is restricted; moreover, the setting of the jig correspondingly increases the cost, and the laminating process of the jig also limits the production efficiency.
  • the first auxiliary layer 140 when the first auxiliary layer 140 with a laser absorption rate greater than that of the first member 400 and a thickness ⁇ 2 between 35 ⁇ m and 100 ⁇ m is adhered to the upper surface of the first member 400 through the intermediate glue layer 150 , the first auxiliary layer 140 can be bonded by pressing The first auxiliary layer 140 is pressed onto the middle adhesive layer 150 in this way.
  • the lamination here is different from the lamination using multi-layer folded copper foil.
  • the lamination here refers to the lamination process required before laser welding to produce the elastic electrical contact terminals of the present application.
  • the lamination can be completed after the lamination is completed.
  • the jig is removed, and during the laser welding process, the first auxiliary layer 140 and the first component 400 are fixed by the intermediate glue layer 150; and the lamination of multi-layer folded copper foil requires that the jig be kept pressed until the laser welding is completed.
  • the fixture can be removed.
  • the substrate 200 is an aluminum plate.
  • the conductive layer 130 includes a first base material 132 and a conductive plating film 133 plated on the lower surface of the first base material 132; wherein, the first base material 132 includes copper, and the conductive plating film 133 is The anti-oxidation ability is better than that of the first substrate 132 .
  • the conductive coating 133 is mainly used to create an electrical connection with the substrate 200 after the welding section 131 is fixed on the substrate 200 by laser welding, so as to obtain the effects of electromagnetic shielding, elimination of signal interference, grounding, etc. and to keep it from being oxidized for a long time; the above-mentioned conductivity
  • the anti-oxidation ability of the coating 133 is better than that of the first substrate 132. This means that under the temperature of the working environment of the elastic electrical contact terminal, the material selection of the conductive coating 133 is different as the anti-oxidation ability requirements of the working environment of the elastic electrical contact terminal are different. .
  • the lower surface of the first component 400 is roughened, specifically: the lower surface of the conductive coating 133 is roughened.
  • the first substrate 132 is rolled copper foil.
  • the first base material 132 is electrolytic copper foil. Compared with rolled copper foil, electrolytic copper foil has higher conductivity, and one side surface of the electrolytic copper foil has a rough burr surface, which is more conducive to adhesion with the intermediate adhesive layer 150. Together, the connection stability between the intermediate adhesive layer 150 and the first base material 132 is improved.
  • the conductive coating 133 can be a gold layer with a thickness >10 nm, a nickel layer with a thickness >0.3 ⁇ m, or a tin layer with a thickness greater than 0.1 ⁇ m, to meet the conductive connection requirements between the welding section 131 and the substrate 200 .
  • the first auxiliary layer 140 can be made of silver-nickel copper, carbon steel, aluminum foil, etc.; but preferably, the first auxiliary layer 140 includes the second base material 141 and is plated on the upper surface of the second base material 141 and is used to absorb The laser energy of the metal coating 142 and the laser absorption rate of the metal coating 142 are respectively greater than the laser absorption rates of the first substrate 132 and the second substrate 141.
  • the second base material 141 is used to bond with the first base material 132 through the intermediate adhesive layer 150, and the metal coating 142 is used to absorb sufficient laser energy; such an arrangement can easily achieve the guarantee and the intermediate adhesive layer at the same time.
  • the adhesion effect between the layers 150 and the effect of being able to absorb sufficient energy of the laser energy do not need to be unduly harsh in the selection of the first auxiliary layer 140, so there is no need to repeatedly verify which material can simultaneously meet the requirements of good laser absorption rate and
  • the requirement of being able to adhere well to the intermediate adhesive layer 150 increases the manufacturing steps of plating the metal film layer on the second substrate 141, but reduces the difficulty of material selection and can better control the cost of the product.
  • the metal plating film 142 includes nickel, and the second base material 141 includes copper foil.
  • the copper foil used as the second base material 141 of the first auxiliary layer 140 used in this preferred manner has lower strength, so even if its thickness is larger, it can be more easily formed from a larger size.
  • Multiple first auxiliary layers 140 are cut from the large blank to ensure that the first auxiliary layer 140 with thickness ⁇ 2 ⁇ 35 ⁇ m and satisfying ⁇ 1+ ⁇ 2 ⁇ 50 ⁇ m can be cut.
  • the first auxiliary layer 140 of this preferred mode The processing is more convenient; moreover, the first base material 132 and the second base material 141 are made of the same material, have the same chemical properties and physical properties, and are less difficult to laser weld.
  • the terminal body 100 further includes a heat-resistant polymer film layer 120; the heat-resistant polymer film layer 120 is bonded to the outer periphery of the elastic core 110, and the conductive layer 130 includes an upper conductive portion connected in sequence, The side conductive part and the lower conductive part, the welding section 131 is formed by the lower conductive part protruding outward in a direction parallel to the lower surface of the elastic core 110; the upper conductive part is bonded to the upper surface of the heat-resistant polymer film layer 120, and the lower conductive part is bonded to the upper surface of the heat-resistant polymer film layer 120. The portion is bonded to the lower surface of the heat-resistant polymer film layer 120.
  • the elastic electrical contact terminal has a P-shaped structure as a whole, and the elastic core 110 is fully wrapped around the elastic core 110 by the heat-resistant polymer film layer 120 and the conductive layer 130, which can better protect the elastic core 110. , to prevent the right opening position of the elastic core 110 from delamination and other damage during use, and improve the service life.
  • the elastic electrical contact terminal also includes an adhesive layer 170, and the heat-resistant polymer film layer 120 is bonded to the outer periphery of the elastic core 110 through the adhesive layer 170.
  • the subject name is “One Chinese patent application for "Grounding Elastomer and Electronic Equipment”.
  • the conductive layer 130 and the substrate 200 are welded into one body by the welding method of the first aspect. Therefore, it has all the beneficial effects of the welding method proposed by the first aspect, which will not be discussed here. Repeat.
  • the welding structure of the elastic electrical contact terminal of the present application will be further described in detail below using specific examples and comparative examples.
  • the area of the laser welding area in the following examples and comparative examples is a rectangular area of 3mm ⁇ 5mm, and the solder joint size is 0.36mm/ , the solder joints are arranged in 2 rows ⁇ 4 columns or 4 rows ⁇ 4 columns. In the same row or column, the spacing between adjacent solder joints is 0.2mm.
  • the substrate 200 is a 6063 aluminum plate.
  • the parameters of laser welding are as follows :
  • the speed is 0mm/s to 60mm/s, the power is 30% to 100%, the frequency is 0KHz to 180KHz, and the Q pulse width is 15ns to 200ns.
  • This embodiment provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is ⁇ 1 is 25 ⁇ m, the thickness ⁇ 2 of the first auxiliary layer 140 is 35 ⁇ m, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 6 ⁇ m, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, there is no bottom adhesive layer 160.
  • the first base material 132 is an electrolytic copper foil
  • the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm
  • the thickness of the welding section 131 is ⁇ 1 is 25 ⁇ m
  • the thickness ⁇ 2 of the first auxiliary layer 140 is 35 ⁇
  • This embodiment provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is ⁇ 1 is 25 ⁇ m, the thickness ⁇ 2 of the first auxiliary layer 140 is 100 ⁇ m, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 6 ⁇ m, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, there is no bottom adhesive layer 160.
  • the first base material 132 is an electrolytic copper foil
  • the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm
  • the thickness of the welding section 131 is ⁇ 1 is 25 ⁇ m
  • the thickness ⁇ 2 of the first auxiliary layer 140 is 100 ⁇
  • This embodiment provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m, the thickness ⁇ 2 of the first auxiliary layer 140 is 38 ⁇ m, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 6 ⁇ m, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, there is no bottom adhesive layer 160.
  • the first base material 132 is an electrolytic copper foil
  • the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm
  • the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m
  • the thickness ⁇ 2 of the first auxiliary layer 140 is 38 ⁇
  • This embodiment provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m, the thickness ⁇ 2 of the first auxiliary layer 140 is 50 ⁇ m, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 6 ⁇ m, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, there is no bottom adhesive layer 160.
  • the first base material 132 is an electrolytic copper foil
  • the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm
  • the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m
  • the thickness ⁇ 2 of the first auxiliary layer 140 is 50 ⁇
  • This embodiment provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m, the thickness ⁇ 2 of the first auxiliary layer 140 is 50 ⁇ m, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 3 ⁇ m, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, there is no bottom adhesive layer 160.
  • the first base material 132 is an electrolytic copper foil
  • the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm
  • the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m
  • the thickness ⁇ 2 of the first auxiliary layer 140 is 50 ⁇
  • This embodiment provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m, the thickness ⁇ 2 of the first auxiliary layer 140 is 50 ⁇ m, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 6 ⁇ m, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, there is no bottom adhesive layer 160.
  • the first base material 132 is an electrolytic copper foil
  • the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm
  • the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m
  • the thickness ⁇ 2 of the first auxiliary layer 140 is 50 ⁇
  • This embodiment provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m, the thickness ⁇ 2 of the first auxiliary layer 140 is 50 ⁇ m, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 10 ⁇ m, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, there is no bottom adhesive layer 160.
  • the first base material 132 is an electrolytic copper foil
  • the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm
  • the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m
  • the thickness ⁇ 2 of the first auxiliary layer 140 is 50 ⁇
  • This embodiment provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m, the thickness ⁇ 2 of the first auxiliary layer 140 is 50 ⁇ m, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 3 ⁇ m, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and nickel plating layer, the thickness of the bottom adhesive layer 160 is 3 ⁇ m.
  • the first base material 132 is an electrolytic copper foil
  • the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm
  • the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m
  • the thickness ⁇ 2 of the first auxiliary layer 140 is 50 ⁇ m
  • This embodiment provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m, the thickness ⁇ 2 of the first auxiliary layer 140 is 50 ⁇ m, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 3 ⁇ m, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and a nickel plating layer, the thickness of the bottom adhesive layer 160 is 6 ⁇ m.
  • the first base material 132 is an electrolytic copper foil
  • the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm
  • the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m
  • the thickness ⁇ 2 of the first auxiliary layer 140 is 50 ⁇
  • This comparative example provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is ⁇ 1 is 25 ⁇ m, the thickness ⁇ 2 of the first auxiliary layer 140 is 30 ⁇ m, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 6 ⁇ m, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, there is no bottom adhesive layer 160.
  • the first base material 132 is an electrolytic copper foil
  • the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm
  • the thickness of the welding section 131 is ⁇ 1 is 25 ⁇ m
  • the thickness ⁇ 2 of the first auxiliary layer 140 is 30 ⁇ m
  • This comparative example provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is ⁇ 1 is 25 ⁇ m, the thickness ⁇ 2 of the first auxiliary layer 140 is 110 ⁇ m, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 6 ⁇ m, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, there is no bottom adhesive layer 160.
  • the first base material 132 is an electrolytic copper foil
  • the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm
  • the thickness of the welding section 131 is ⁇ 1 is 25 ⁇ m
  • the thickness ⁇ 2 of the first auxiliary layer 140 is 110 ⁇ m
  • This comparative example provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m, the thickness ⁇ 2 of the first auxiliary layer 140 is 35 ⁇ m, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 6 ⁇ m, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, there is no bottom adhesive layer 160.
  • the first base material 132 is an electrolytic copper foil
  • the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm
  • the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m
  • the thickness ⁇ 2 of the first auxiliary layer 140 is 35 ⁇ m
  • This comparative example provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m, the thickness ⁇ 2 of the first auxiliary layer 140 is 50 ⁇ m, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 1 ⁇ m, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, there is no bottom adhesive layer 160.
  • the first base material 132 is an electrolytic copper foil
  • the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm
  • the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m
  • the thickness ⁇ 2 of the first auxiliary layer 140 is 50 ⁇ m
  • This comparative example provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m, the thickness ⁇ 2 of the first auxiliary layer 140 is 50 ⁇ m, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 12 ⁇ m, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, there is no bottom adhesive layer 160.
  • the first base material 132 is an electrolytic copper foil
  • the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm
  • the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m
  • the thickness ⁇ 2 of the first auxiliary layer 140 is 50 ⁇ m
  • This comparative example provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m, the thickness ⁇ 2 of the first auxiliary layer 140 is 50 ⁇ m, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 6 ⁇ m, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and a nickel plating layer, the thickness of the bottom adhesive layer 160 is 1 ⁇ m.
  • the first base material 132 is an electrolytic copper foil
  • the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm
  • the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m
  • the thickness ⁇ 2 of the first auxiliary layer 140 is 50 ⁇ m
  • This comparative example provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m, the thickness ⁇ 2 of the first auxiliary layer 140 is 50 ⁇ m, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 6 ⁇ m, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and a nickel plating layer, the thickness of the bottom adhesive layer 160 is 12 ⁇ m.
  • the first base material 132 is an electrolytic copper foil
  • the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm
  • the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m
  • the thickness ⁇ 2 of the first auxiliary layer 140 is 50 ⁇ m
  • This comparative example provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m, the thickness ⁇ 2 of the first auxiliary layer 140 is 50 ⁇ m, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 8 ⁇ m, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, the thickness of the bottom adhesive layer 160 is 6 ⁇ m.
  • the first base material 132 is an electrolytic copper foil
  • the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm
  • the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m
  • the thickness ⁇ 2 of the first auxiliary layer 140
  • This comparative example provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m, the thickness ⁇ 2 of the first auxiliary layer 140 is 50 ⁇ m, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 3 ⁇ m, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and a nickel plating layer, the thickness of the bottom adhesive layer 160 is 10 ⁇ m.
  • the first base material 132 is an electrolytic copper foil
  • the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm
  • the thickness of the welding section 131 is ⁇ 1 is 12 ⁇ m
  • the thickness ⁇ 2 of the first auxiliary layer 140 is 50 ⁇ m
  • the tensile strength refers to the maximum value of the tensile force that the terminal body 100 can withstand after it is welded and fixed to the substrate 200. When the force away from the substrate 200 is greater than the tensile strength, the terminal body 100 will peel off from the substrate 200.
  • the tensile strength is The larger the value, the greater the welding bonding strength, which can be determined by, for example, a tensile testing device.
  • the sum of the tensile strength and the thickness of the first auxiliary layer 140, the thickness of the first auxiliary layer 140 and the thickness of the welding section 131, the intermediate glue layer 150 and The bottom adhesive layer 160 is all related. When the tensile strength is greater than 5N, it is considered that the tensile strength can meet the usage requirements.
  • Contact resistance refers to the resistance value between the terminal body 100 and the substrate 200 after welding. The smaller the contact resistance, the better the conduction effect of the terminal body 100, that is, the better the terminal body 100's ability to ground or eliminate signal interference. This can be determined by resistance testing.
  • the contact resistance is mainly related to the middle glue layer 150 and the bottom glue layer 160. The contact resistance is below 0.3 ⁇ . It is considered that the contact resistance can meet the usage requirements.
  • the production efficiency of the auxiliary layer is mainly limited by the thickness of the first auxiliary layer. The greater the thickness of the first auxiliary layer, the lower the production efficiency of the auxiliary layer.
  • the stability before welding refers to the connection stability between the welding section 31, the first auxiliary layer 130 and the substrate 200 before laser welding.
  • the stability before welding is mainly Limited by the thickness of the middle glue layer 150 and the bottom glue layer 160, the greater the thickness of the middle glue layer 150 and the bottom glue layer 160, the better the stability before welding. Its size is represented by levels. The larger the number of levels, the better the stability before welding.
  • material versatility mainly refers to the applicability of the selected middle glue layer 150 , bottom glue layer 160 and first auxiliary layer 140 to conductive layers 130 of various thicknesses. ; Among them, the middle glue layer 150 and the bottom glue layer 160 can be suitable for the production of conductive layers 130 of various thicknesses, and the thickness of the first auxiliary layer 140 needs to ensure that the corresponding conductive layer 130 can be laser welded, so the versatility of the material is important.
  • the thickness of the first auxiliary layer 140 Limited by the thickness of the first auxiliary layer 140, the smaller the thickness of the first auxiliary layer 140, the greater the thickness requirement of the conductive layer 130 that can be used for production, but the upper limit of the thickness of the conductive layer 130 is limited by the elastic terminal's resilience requirements. That is to say, the thickness of the conductive layer 130 needs to meet the requirements of less than or equal to 25 ⁇ m at the same time.
  • Example 1 Example 2 Example 3 Example 4 Example 5 ⁇ 1/ ⁇ m 25 25 12 12 12 h1/ ⁇ m 6 6 6 6 3 ⁇ 2/ ⁇ m 35 100 38 50 50 ⁇ 1+ ⁇ 2/ ⁇ m 60 125 50 62 62 h2/ ⁇ m / / / / / h1+h2/ ⁇ m 6 6 6 6 3 Tensile strength/N 7.5 15.2 5.5 8.5 9 Contact resistance/ ⁇ 0.01 0.01 0.01 0.01 0.01 Auxiliary layer production efficiency high Low medium medium medium Stability before welding Level 2 Level 2 Level 2 Level 2 Level 2 Level 1 Material versatility Low high medium medium medium medium
  • Example 6 Example 7 Example 8 Example 9 ⁇ 1/ ⁇ m 12 12 12 12 h1/ ⁇ m 6 10 6 6 ⁇ 2/ ⁇ m 50 50 50 ⁇ 1+ ⁇ 2/ ⁇ m 62 62 62 62 h2/ ⁇ m / / 3 6 h1+h2/ ⁇ m 6 10 9 12 Tensile strength/N 8 5.2 9.1 6.9 Contact resistance/ ⁇ 0.02 0.1 0.1 0.2 Auxiliary layer production efficiency medium medium medium medium Stability before welding Level 2 Level three Level three Level 4 Material versatility medium medium medium medium medium medium medium
  • Comparative example 1 Comparative example 2 Comparative example 3 Comparative example 4 Comparative example 5 ⁇ 1/ ⁇ m 25 25 12 12 12 h1/ ⁇ m 6 6 6 1 12 ⁇ 2/ ⁇ m 25 110 25 50 50 ⁇ 1+ ⁇ 2/ ⁇ m 50 135 37 62 62 h2/ ⁇ m / / / / / h1+h2/ ⁇ m 6 6 6 1 12 Tensile strength/N 3.6 15.2 1.2 9 2.8 Contact resistance/ ⁇ 0.01 0.01 0.01 0.01 0.1 Auxiliary layer production efficiency extremely high extremely low high medium medium Stability before welding Level 2 Level 2 Level 2 Level zero Level 4 Material versatility extremely low extremely high Low medium medium
  • Comparative example 6 Comparative example 7 Comparative example 8 Comparative example 9 ⁇ 1/ ⁇ m 12 12 12 12 h1/ ⁇ m 6 6 8 12 ⁇ 2/ ⁇ m 50 50 50 50 ⁇ 1+ ⁇ 2/ ⁇ m 60 62 62 62 h2/ ⁇ m 1 12 6 6 h1+h2/ ⁇ m 7 18 14 18 Tensile strength/N 8 0.7 2.3 1 Contact resistance/ ⁇ 0.02 2.0 0.4 1.8 Auxiliary layer production efficiency medium medium medium medium Stability before welding Level 2 Level 5 Level 4 Level 5 Material versatility medium medium medium medium medium medium medium
  • the thickness of the first auxiliary layer 140, the middle glue layer 150 and the bottom glue layer 160 in the actual production process, since the difference is about 1 ⁇ m, it is difficult to process and the effect difference is not significant, so the first auxiliary layer 140, the middle glue layer 160 are difficult to process.
  • the thicknesses that can be selected for the glue layer 150 and the bottom glue layer 160 are not continuous, but are single values.
  • the thickness of the first auxiliary layer 140 is generally selected at intervals of 5 ⁇ m or 10 ⁇ m.
  • the thickness of the middle glue layer 150 and The thickness of the bottom adhesive layer 160 is generally selected at intervals of 2 ⁇ m or 3 ⁇ m.
  • Example 1 Comparing Example 1, Example 2, Comparative Example 1 and Comparative Example 2, it can be seen that as the thickness of the first auxiliary layer 140 increases, the production efficiency of the auxiliary layer becomes lower and the material versatility becomes higher. The production efficiency of the auxiliary layer in Example 2 has reached a low value. If the thickness of the first auxiliary layer 140 continues to increase to greater than 100 ⁇ m, as shown in Comparative Example 2, the production efficiency of the auxiliary layer is extremely low and cannot meet the production efficiency requirements of the auxiliary layer; the material of Embodiment 1 The versatility has reached a low value.
  • the material versatility is extremely low because the thickness of the first auxiliary layer accounts for the sum of the thickness of the first auxiliary layer and the conductive layer.
  • the proportion of the molten pool is low, so the depth of the molten pool formed is shallow and the tensile strength is also very low, which does not meet the most basic material versatility and application performance requirements.
  • the thickness of the first auxiliary layer 140 is preferably: 35 ⁇ m ⁇ ⁇ 2 ⁇ 100 ⁇ m.
  • Example 4 Comparing Example 3, Example 4 and Comparative Example 3, it can be seen that in Example 3, as the sum of the thicknesses between the first auxiliary layer 140 and the welding section 131 decreases to 50 ⁇ m, the tensile force at this time is 5.5N. , quite close to 5N. Considering factors such as measurement errors, if the sum of the thicknesses between the first auxiliary layer 140 and the welding section 131 continues to decrease to less than 50 ⁇ m, as shown in Comparative Example 3, the tensile strength will not be able to meet the use requirements. , causing the formed welded structure of the elastic electrical contact terminal to easily fall off during use; in Embodiment 4, as the thickness of the first auxiliary layer 140 and the welding section 131 increases, the tensile strength is significantly improved, meeting the usage requirements.
  • the sum of the thickness of the first auxiliary layer 140 and the thickness of the welding section 131 should be greater than or equal to 50 ⁇ m.
  • Example 5 Comparing Example 5, Example 6 and Example 7, Comparative Example 4 and Comparative Example 5, it can be seen that as the thickness of the intermediate adhesive layer 150 increases, the tensile strength gradually decreases, and the stability before welding also gradually increases. Among them, in Example 5, the stability before welding is the lowest. If the thickness of the middle adhesive layer 150 continues to decrease, as shown in Comparative Example 4, the stability before welding reaches zero level, and it is difficult to adhere the first auxiliary layer 140 to the welding section. 131; in Example 7, the tensile strength is as low as 5.2N, which is quite close to the required 5N. If the thickness of the middle adhesive layer 150 is continued to be increased, as shown in Comparative Example 5, the tensile strength cannot meet the usage requirements.
  • the thickness of the intermediate adhesive layer 150 should satisfy: 3 ⁇ m ⁇ h1 ⁇ 10 ⁇ m, and more preferably, 3 ⁇ m ⁇ h1 ⁇ 6 ⁇ m.
  • Example 10 When the thickness of the bottom adhesive layer 160 is continued to be increased, When Example 10 was obtained, although the stability before welding was further improved, the tensile strength was further reduced and the contact resistance was further increased; when the thickness of the bottom adhesive layer 160 was continued to be increased, as shown in Comparative Example 7, although The stability before welding has been further improved, but the tensile strength and contact resistance are difficult to meet the needs of use.
  • Example 9 after increasing the thickness of the middle glue layer, that is, when the sum of the thicknesses of the middle glue layer and the bottom glue layer is greater than 12 ⁇ m, as shown in Comparative Example 8, the tensile strength will be reduced. to not meet the usage requirements.
  • the thickness of the bottom adhesive layer 160 should satisfy: 3 ⁇ m ⁇ h2 ⁇ 10 ⁇ m, and more preferably, 3 ⁇ m ⁇ h2 ⁇ 6 ⁇ m.
  • Comparative Example 7 and Comparative Example 9 in Example 9, the tensile strength, contact resistance and pre-welding stability are well balanced, and can simultaneously satisfy the tensile strength, contact resistance and pre-welding stability. Stability requirements, at this time, whether it is to continue to increase the thickness of the middle glue layer 150 or the bottom glue layer 160, as shown in Comparative Example 7 and Comparative Example 9, although the stability before welding has been further improved Improved, but the tensile strength and contact resistance are difficult to meet the needs of use.
  • the sum of the thickness of the middle adhesive layer 150 and the thickness of the bottom adhesive layer should satisfy: h1+h2 ⁇ 12 ⁇ m.
  • the third aspect of this application also proposes an electronic device, including a display screen 300 and a welding structure of elastic electrical contact terminals proposed in the second aspect of this application; the conductive layer 130 is sandwiched between the display screen 300 and the substrate 200. between.
  • the electronic device proposed in this application can be any electronic device that needs to avoid signal interference or eliminate internal silence of the electronic device, such as mobile phones, tablet computers, etc.; the display screen 300 and the substrate 200 refer to the two parts of the electronic device that require elastic electrical contact. structure.
  • the welding section 131 of the elastic electrical contact terminal and the substrate 200 are welded by laser, so the production cost is low.
  • the electronic device proposed in this application includes the welding structure of the elastic electrical contact terminal proposed in the second aspect.
  • the conductive layer 130 and the substrate 200 are connected by the first aspect.
  • the welding method is welded into one body, so it has all the beneficial effects of the welding method proposed in the first aspect and the welding structure of the elastic electrical contact terminal proposed in the second aspect, which will not be described again here.

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Abstract

A welding method for welding a first component (400) and a second component (500) made of different metal materials, comprising: stacking a first component on a second component; adhering a first auxiliary layer (140) to the upper surface of the first component by means of an intermediate adhesive layer (150), wherein the laser absorptivity of the first auxiliary layer is greater than the laser absorptivity of the first component, the thickness of the first auxiliary layer is between 35 μm and 100 μm, and the sum of the thickness of the first component and the thickness of the first auxiliary layer is greater than or equal to 50 μm; and emitting laser that sequentially passes through the first auxiliary layer, the first component and the second component to laser weld the first component and the second component. When the welding method is used to weld the elastic electric contact terminal, the first auxiliary layer is arranged to laser weld an conductive layer with low thickness and low laser absorptivity to a heterogeneous metal, thereby reducing the cost of welding. The invention further provides a welding structure of the elastic electric contact terminal, and an electronic device.

Description

焊接方法、弹性电接触端子的焊接结构以及电子设备Welding method, welding structure of elastic electrical contact terminal and electronic device 技术领域Technical field
本申请涉及通信设备技术领域,特别是涉及一种焊接方法、弹性电接触端子的焊接结构以及电子设备。The present application relates to the technical field of communication equipment, and in particular to a welding method, a welding structure of elastic electrical contact terminals, and electronic equipment.
背景技术Background technique
在通信装置中,为了避免电子设备受到信号干扰或者消除电子设备内部的静电,一般会在电子设备内部需要电接触的两个接触面之间采用弹性电接触端子或者焊接弹片的方式进行电连接。In communication devices, in order to prevent electronic equipment from being subject to signal interference or to eliminate static electricity inside the electronic equipment, elastic electrical contact terminals or welding shrapnel are generally used to make electrical connections between two contact surfaces that require electrical contact inside the electronic equipment.
请参阅公开号为CN113993362A,主题名称为“一种接地弹性体及电子设备”的中国专利申请,弹性电接触端子一般包括两个部分,用于缓冲和回弹的弹性构件以及用于将弹性构件固定在基板的弹性电接触端子。其中,在该专利申请中,采用了超声波焊接的方式将焊接段分固定在基板——金属中板上。Please refer to the Chinese patent application with publication number CN113993362A and the subject title "A grounding elastomer and electronic equipment". Elastic electrical contact terminals generally include two parts, an elastic member for buffering and rebound and an elastic member for connecting the elastic member. Flexible electrical contact terminals fixed to the base plate. Among them, in this patent application, ultrasonic welding is used to fix the welding segments to the base plate - the metal mid-plate.
然而,该专利申请中,超声波焊接的方式需要设计和生产特定的超声波压头,以满足上述焊接段分的超声波焊接需求,前期投入的成本高;且这种超声波压头的使用寿命有限,使用一段时间后需要及时更换,后期维护的成本同样较高。由此可见,采用超声波焊接的方式将弹性电接触端子固定在基板上的方式成本较高。However, in this patent application, the ultrasonic welding method requires the design and production of a specific ultrasonic indenter to meet the ultrasonic welding needs of the above-mentioned welding sections. The initial investment cost is high; and the service life of this ultrasonic indenter is limited, so it is difficult to use. It needs to be replaced in time after a period of time, and the cost of later maintenance is also high. It can be seen that the cost of fixing the elastic electrical contact terminals to the substrate using ultrasonic welding is relatively high.
发明内容Contents of the invention
本申请的一个目的在于提供一种适用于将弹性电接触端子的导电层焊接在基板上的焊接方法,其固定在基板上的成本较低,从而降低相关电子设备的生产成本。An object of the present application is to provide a welding method suitable for welding the conductive layer of the elastic electrical contact terminal to the substrate, which has a lower cost of fixing the conductive layer on the substrate, thereby reducing the production cost of related electronic equipment.
本申请的目的是通过如下技术方案实现的:The purpose of this application is achieved through the following technical solutions:
一种焊接方法,用于焊接互为不同金属材料的第一构件与第二构件,所述第一构件的厚度δ1小于等于25μm,包括:A welding method for welding a first component and a second component that are made of different metal materials. The thickness δ1 of the first component is less than or equal to 25 μm, including:
将所述第一构件叠设于所述第二构件上;Stack the first component on the second component;
通过中间胶层在所述第一构件的上表面粘附第一辅助层,所述第一辅助层的激光吸收率大于所述第一构件;其中,所述第一辅助层的厚度δ2在35μm至100μm之间,所述第一构件的厚度δ1和所述第一辅助层的厚度δ2之和大于等于50μm;A first auxiliary layer is adhered to the upper surface of the first component through an intermediate glue layer. The laser absorption rate of the first auxiliary layer is greater than that of the first component; wherein the thickness δ2 of the first auxiliary layer is 35 μm. to 100 μm, the sum of the thickness δ1 of the first member and the thickness δ2 of the first auxiliary layer is greater than or equal to 50 μm;
利用激光焊接装置发射激光,使得激光依次穿过所述第一辅助层、所述第一构件以及所述第二构件,以激光焊接所述第一构件和所述第二构件。A laser welding device is used to emit laser light so that the laser light passes through the first auxiliary layer, the first component and the second component in order to laser weld the first component and the second component.
在本申请的焊接方法中,设所述中间胶层的厚度为h1,3μm≤h1≤10μm。In the welding method of this application, the thickness of the intermediate adhesive layer is h1, and 3 μm ≤ h1 ≤ 10 μm.
在本申请的焊接方法中,3μm≤h1≤6μm。In the welding method of this application, 3μm≤h1≤6μm.
在本申请的焊接方法中,所述第一辅助层包括第二基材和镀设于所述第二基材上表面上并用于吸收激光能量的金属镀膜,所述金属镀膜的激光吸收率分别大于所述第一构件和所述第二基材的激光吸收率。In the welding method of the present application, the first auxiliary layer includes a second base material and a metal coating plated on the upper surface of the second base material and used to absorb laser energy. The laser absorption rate of the metal coating is respectively Greater than the laser absorptivity of the first component and the second substrate.
在本申请的焊接方法中,所述中间胶层为丙烯酸压敏胶胶水、环氧热熔胶水、聚氨酯热固胶、聚氨酯热塑胶以及硅胶中的其中一种。In the welding method of the present application, the intermediate glue layer is one of acrylic pressure-sensitive glue, epoxy hot melt glue, polyurethane thermosetting glue, polyurethane thermoplastic glue and silicone glue.
在本申请的焊接方法中,在所述通过所述中间胶层在所述第一构件的上表面粘附第一辅助层前,还包括:对所述第一构件的上表面和/或所述第一辅助层的下表面进行粗化处理。In the welding method of the present application, before adhering the first auxiliary layer to the upper surface of the first component through the intermediate glue layer, it also includes: The lower surface of the first auxiliary layer is roughened.
在本申请的焊接方法中,所述将所述第一构件叠设于所述第二构件上具体包括:在所述第一构件的下表面上设置底部胶层,以使所述第一构件通过所述底部胶层粘合于所述第二构件上。In the welding method of the present application, stacking the first component on the second component specifically includes: providing a bottom glue layer on the lower surface of the first component, so that the first component It is bonded to the second component through the bottom glue layer.
在本申请的焊接方法中,设所述底部胶层的厚度为h2,3μm≤h2≤10μm。In the welding method of this application, the thickness of the bottom adhesive layer is h2, and 3μm≤h2≤10μm.
在本申请的焊接方法中,3μm≤h2≤6μm。In the welding method of this application, 3μm≤h2≤6μm.
在本申请的焊接方法中,设所述中间胶层的厚度为h1,设所述底部胶层的厚度为h2,h1+h2≤12μm。In the welding method of this application, let the thickness of the middle glue layer be h1, let the thickness of the bottom glue layer be h2, h1+h2≤12 μm.
在本申请的焊接方法中,所述底部胶层为丙烯酸压敏胶胶水、环氧热熔胶水、聚氨酯热固胶、聚氨酯热塑胶以及硅胶中的其中一种。In the welding method of this application, the bottom glue layer is one of acrylic pressure-sensitive glue, epoxy hot-melt glue, polyurethane thermosetting glue, polyurethane thermoplastic glue, and silicone glue.
在本申请的焊接方法中,在所述第一构件的下表面上设置所述底部胶层前,还包括:对所述第一构件的下表面进行粗化处理。In the welding method of the present application, before setting the bottom glue layer on the lower surface of the first component, the method further includes: roughening the lower surface of the first component.
在本申请的焊接方法中,在所述通过所述中间胶层在所述第一构件的上表面粘附第一辅助层后,还包括:利用刀具在所述第一辅助层的上表面施加朝向所述第一构件的作用力,驱使所述第一辅助层和所述第一构件同时向下凹陷,直至形成从所述第一辅助层的上表面贯穿至所述第一构件的下表面的切口,所述切口呈宽度从上至下逐渐减小的楔形,所述第一辅助层沿所述切口的顶部边缘形成有折弯,所述折弯沿所述切口的内周壁向下延伸,且所述折弯的末端外扩至包裹所述第一构件的下表面。In the welding method of the present application, after the first auxiliary layer is adhered to the upper surface of the first component through the intermediate glue layer, it further includes: using a knife to apply The force toward the first member drives the first auxiliary layer and the first member to simultaneously recess downward until a penetrating force is formed from the upper surface of the first auxiliary layer to the lower surface of the first member. The incision is in the shape of a wedge with a width that gradually decreases from top to bottom. The first auxiliary layer is formed with a bend along the top edge of the incision, and the bend extends downward along the inner peripheral wall of the incision. , and the bent end expands to wrap the lower surface of the first member.
本申请的目的还通过如下技术方案实现:The purpose of this application is also achieved through the following technical solutions:
一种弹性电接触端子的焊接结构,包括端子本体和基板;所述端子本体包括弹性芯部和包裹在所述弹性芯部外周上的导电层,所述导电层具有向外延伸突出并形成焊接段的端部,所述导电层的厚度为9μm~25μm;所述导电层和所述基板互为不同的金属材料;所述焊接段通过如上述的焊接方法焊接于所述基板上,其中,以所述焊接段作为所述第一构件,以所述基板作为所述第二构件。A welding structure of an elastic electrical contact terminal, including a terminal body and a substrate; the terminal body includes an elastic core and a conductive layer wrapped around the outer periphery of the elastic core, the conductive layer has an outwardly extending protrusion and forms a weld At the end of the segment, the thickness of the conductive layer is 9 μm to 25 μm; the conductive layer and the substrate are made of different metal materials; the welding segment is welded to the substrate by the above welding method, wherein, The welding section is used as the first component, and the substrate is used as the second component.
在本申请的弹性电接触端子的焊接结构中,所述基板为铝板。In the welding structure of the elastic electrical contact terminal of the present application, the substrate is an aluminum plate.
在本申请的弹性电接触端子的焊接结构中,所述导电层包括第一基材和镀设于所述第一基材外侧面的导电镀膜;其中,所述第一基材包括铜,导电镀膜的抗氧化能力优于第一基材。In the welding structure of the elastic electrical contact terminal of the present application, the conductive layer includes a first base material and a conductive coating plated on the outer surface of the first base material; wherein the first base material includes copper, and the conductive coating The anti-oxidation ability of the coating is better than that of the first substrate.
在本申请的弹性电接触端子的焊接结构中,所述第一基材为电解铜箔或者压延铜箔,所述导电镀膜为厚度>10nm的金层或厚度>0.3μm的镍层或厚度大于0.1μm的锡层。In the welding structure of the elastic electrical contact terminal of the present application, the first base material is electrolytic copper foil or rolled copper foil, and the conductive plating film is a gold layer with a thickness >10 nm or a nickel layer with a thickness >0.3 μm or a thickness greater than 0.1μm tin layer.
在本申请的弹性电接触端子的焊接结构中,所述第一辅助层包括第二基材和镀设于所述第二基材上表面的金属镀膜,所述中间胶层设于所述第一基材的上表面与所述第二基材的下表面之间,所述第二基材包括铜,所述金属镀膜包括镍。In the welding structure of the elastic electrical contact terminal of the present application, the first auxiliary layer includes a second base material and a metal plating film plated on the upper surface of the second base material, and the intermediate adhesive layer is provided on the second base material. Between the upper surface of a base material and the lower surface of the second base material, the second base material includes copper, and the metal plating film includes nickel.
本申请的目的还通过如下技术方案实现:The purpose of this application is also achieved through the following technical solutions:
一种电子设备,包括显示屏和如权利要求14至18任一项所述的弹性电接触端子的焊接结构;所述导电层夹持于所述显示屏和所述基板之间。An electronic device includes a display screen and a welding structure of an elastic electrical contact terminal according to any one of claims 14 to 18; the conductive layer is sandwiched between the display screen and the substrate.
本申请提出的焊接方法适用于对厚度较小且激光吸收率较低的第一构件进行激光焊接。The welding method proposed in this application is suitable for laser welding of first components with small thickness and low laser absorption rate.
具体地,在本申请的焊接方法中,由于第一构件的厚度δ1较小,因此为保证第一构件能够被焊接在第二构件上,本申请中首先与激光接触的第一辅助层的激光吸收率较大,可以保证本申请中第一构件能够吸收足够的激光能 量,使得达到第一构件和第二构件之间的激光能量足够形成熔池。Specifically, in the welding method of this application, since the thickness δ1 of the first component is small, in order to ensure that the first component can be welded to the second component, the laser of the first auxiliary layer that first contacts the laser in this application The larger absorption rate ensures that the first component in this application can absorb enough laser energy, so that the laser energy reaching between the first component and the second component is sufficient to form a molten pool.
在本申请的焊接方法中,由于厚度大于等于35μm的第一辅助层且第一辅助层和第一构件的厚度之和≥50μm,因此相当于对第一构件作了加厚以及增加其激光吸收率的处理,保证微米级别的第一构件在焊接时能够与第二构件之间形成具有足够深度和强度的熔池。此外,在制作得到第一辅助层时,一般通过切割一个尺寸较大的胚料以批量地获得多个第一辅助层,从激光焊接的效果上而言,第一辅助层的厚度越大,对于激光焊接的效果越好,但是,所对应的胚料厚度越大,切割的难度也就越大,且切割后获得的第一辅助层越容易产生毛刺等瑕疵,不利于生产效率的提高,因此第一辅助层的厚度不易过大,超过100μm后生产效率过低。另外,由于第一辅助层具有足够的厚度,还能够对第一构件的结构起到支撑效果,有效防止第一构件发生断裂的情况。In the welding method of this application, since the thickness of the first auxiliary layer is greater than or equal to 35 μm and the sum of the thicknesses of the first auxiliary layer and the first member is ≥ 50 μm, it is equivalent to thickening the first member and increasing its laser absorption. Efficient processing ensures that the first component at the micron level can form a molten pool with sufficient depth and strength between the first component and the second component during welding. In addition, when producing the first auxiliary layer, a plurality of first auxiliary layers are generally obtained in batches by cutting a larger-sized blank. In terms of the effect of laser welding, the greater the thickness of the first auxiliary layer, the The better the effect of laser welding, but the greater the thickness of the corresponding blank, the more difficult it is to cut, and the first auxiliary layer obtained after cutting is more likely to produce burrs and other defects, which is not conducive to the improvement of production efficiency. Therefore, the thickness of the first auxiliary layer is not likely to be too large. If the thickness exceeds 100 μm, the production efficiency will be too low. In addition, since the first auxiliary layer has sufficient thickness, it can also play a supporting effect on the structure of the first member and effectively prevent the first member from breaking.
综上可得,本申请提出的焊接方法通过设置第一辅助层,能够将厚度较小且激光吸收率较低的第一构件通过激光焊接在异质金属的第二构件上;将本申请的焊接方法应用在弹性电接触端子的焊接时,利用激光焊接替代超声波焊接,可以降低焊接所需的成本,解决背景技术中提出的超声波焊接成本较高的技术问题,具体请参阅本申请第二方面提出的弹性电接触端子的焊接结构。In summary, it can be concluded that the welding method proposed in this application can weld a first component with a smaller thickness and a lower laser absorption rate to a second component of a heterogeneous metal through laser welding by providing a first auxiliary layer; When the welding method is applied to the welding of elastic electrical contact terminals, using laser welding instead of ultrasonic welding can reduce the cost of welding and solve the technical problem of high ultrasonic welding cost raised in the background art. For details, please refer to the second aspect of this application. Proposed welding structure of elastic electrical contact terminals.
附图说明Description of drawings
以下结合附图和优选实施例来对本申请进行进一步详细描述,但是本领域技术人员将领会的是,这些附图仅是出于解释优选实施例的目的而绘制的,并且因此不应当作为本申请范围的限制。The present application will be described in further detail below with reference to the accompanying drawings and preferred embodiments, but those skilled in the art will appreciate that these drawings are drawn for the purpose of explaining the preferred embodiments only, and therefore should not be used as a basis for the present application. Scope limitations.
图1是根据本申请实施例第一方面提出的焊接方法的流程图。Figure 1 is a flow chart of the welding method proposed according to the first aspect of the embodiment of the present application.
图2是根据本申请实施例第一方面提出的焊接方法中第一构件和第二构件的焊接示意图。Figure 2 is a schematic diagram of the welding of the first component and the second component in the welding method proposed according to the first aspect of the embodiment of the present application.
图3是根据本申请实施例第二方面提出的弹性电接触端子的焊接结构中端子本体结构示意图。3 is a schematic structural diagram of the terminal body in the welding structure of the elastic electrical contact terminal proposed according to the second aspect of the embodiment of the present application.
图4是图3中的A处放大图。Figure 4 is an enlarged view of point A in Figure 3.
图5是根据本申请实施例第二方面提出的弹性电接触端子的焊接结构中形成切口和折弯时的结构图。FIG. 5 is a structural diagram when cuts and bends are formed in the welding structure of the elastic electrical contact terminal proposed according to the second aspect of the embodiment of the present application.
图6是根据本申请实施例第三方面提出的电子设备的结构图。FIG. 6 is a structural diagram of an electronic device according to the third aspect of the embodiment of the present application.
图中,In the picture,
100、端子本体;110、弹性芯部;120、耐热聚合物膜层;100. Terminal body; 110. Elastic core; 120. Heat-resistant polymer film layer;
130、导电层;131、焊接段;132、第一基材;133、导电镀膜;134、切口;130. Conductive layer; 131. Welding section; 132. First base material; 133. Conductive coating; 134. Incision;
140、第一辅助层;141、第二基材;142、金属镀膜;143、折弯;140. First auxiliary layer; 141. Second base material; 142. Metal coating; 143. Bending;
150、中间胶层;160、底部胶层;170、粘合层;150. Middle glue layer; 160. Bottom glue layer; 170. Adhesive layer;
200、基板;200. Substrate;
300、显示屏;300. Display screen;
400、第一构件;400. First component;
500、第二构件。500. Second component.
具体实施方式Detailed ways
以下将参考附图来详细描述本申请的优选实施例。本领域中的技术人员将领会的是,这些描述仅为描述性的、示例性的,并且不应当被解释为限定了本申请的保护范围。Preferred embodiments of the present application will be described in detail below with reference to the accompanying drawings. Those skilled in the art will appreciate that these descriptions are descriptive and exemplary only and should not be construed as limiting the scope of the present application.
首先,需要说明的是,在本文中所提到的顶部、底部、朝上、朝下等方位是相对于各个附图中的方向来定义的,它们是相对的概念,并且因此能够根据其所处于的不同位置和不同的实用状态而改变。所以,不应将这些或其他方 位用于理解为限制性用语。First of all, it should be noted that the top, bottom, upward, downward and other directions mentioned in this article are defined relative to the directions in each drawing. They are relative concepts, and therefore can be defined according to their respective It changes with different positions and different practical states. Therefore, these or other terms should not be construed as limiting terms.
应注意,术语“包括”并不排除其他要素或步骤,并且“一”或“一个”并不排除复数。It should be noted that the term "comprising" does not exclude other elements or steps, and "a" or "an" does not exclude the plural.
此外,还应当指出的是,对于本文的实施例中描述或隐含的任意单个技术特征,或在附图中示出或隐含的任意单个技术特征,仍能够在这些技术特征(或其等同物)之间继续进行组合,从而获得未在本文中直接提及的本申请的其他实施例。In addition, it should also be noted that any single technical feature described or implied in the embodiments herein, or any single technical feature shown or implied in the drawings, can still be used in these technical features (or their equivalents). Combinations continue to be made between objects) to obtain other embodiments of the application not directly mentioned herein.
另外还应当理解的是,本文中采用术语“第一”、“第二”等来描述各种信息,但这些信息不应限于这些术语,这些术语仅用来将同一类型的信息彼此区分开。例如,在不脱离本申请范围的情况下,“第一”信息也可以被称为“第二”信息,类似的,“第二”信息也可以被称为“第一”信息。It should also be understood that the terms "first", "second", etc. are used herein to describe various information, but this information should not be limited to these terms, and these terms are only used to distinguish the same type of information from each other. For example, without departing from the scope of the present application, "first" information may also be called "second" information, and similarly, "second" information may also be called "first" information.
应当注意的是,在不同的附图中,相同的参考标号表示相同或大致相同的组件。It should be noted that in different drawings, the same reference numbers refer to the same or substantially the same components.
请参阅图1-图2所示,本申请第一方面提出一种焊接方法,其用于焊接互为不同金属材料的第一构件400和第二构件500,其中第一构件400的厚度δ1在9μm至25μm之间,包括:Referring to FIGS. 1-2 , the first aspect of the present application proposes a welding method for welding the first member 400 and the second member 500 which are made of different metal materials, wherein the thickness δ1 of the first member 400 is Between 9μm and 25μm, including:
步骤S100:将所述第一构件400叠设于所述第二构件500上。Step S100: stack the first component 400 on the second component 500.
步骤S200:通过中间胶层150在第一构件400的上表面粘附第一辅助层140,第一辅助层140的激光吸收率大于第一构件400;其中,第一辅助层140的厚度δ2在35μm至100μm之间,第一构件400的厚度δ1和第二构件500的厚度δ2之和大于等于50μm。Step S200: adhere the first auxiliary layer 140 to the upper surface of the first component 400 through the intermediate glue layer 150. The laser absorption rate of the first auxiliary layer 140 is greater than that of the first component 400; wherein, the thickness δ2 of the first auxiliary layer 140 is Between 35 μm and 100 μm, the sum of the thickness δ1 of the first member 400 and the thickness δ2 of the second member 500 is greater than or equal to 50 μm.
步骤S300:利用激光焊接装置发射激光,使得激光依次穿过第一辅助层140、第一构件400以及第二构件500,以激光焊接第一构件400和第二构件500。Step S300: Use a laser welding device to emit laser light so that the laser light passes through the first auxiliary layer 140, the first component 400 and the second component 500 in order to laser weld the first component 400 and the second component 500.
其中,在本申请提出的焊接方法中,第一辅助层140的作用主要用于吸收激光能量,以使得抵达至第一构件400和第二构件500之间的激光能量足够;由于材料对于不同波长的激光吸收率不同,因此随着激光焊接参数的不同,如激光焊接的波长不同,第一辅助层140的材质选择也会不同。Among them, in the welding method proposed in this application, the function of the first auxiliary layer 140 is mainly used to absorb laser energy, so that the laser energy reaching between the first component 400 and the second component 500 is sufficient; since the materials have different wavelengths, The laser absorption rate is different. Therefore, as the laser welding parameters are different, such as the wavelength of the laser welding, the material selection of the first auxiliary layer 140 will also be different.
其中,中间胶层150的作用是在激光焊接前将第一构件400和第一辅助层140相对固定,以使得在激光焊接时,第一辅助层140和第一构件400之间不会发生错位的情况,保证激光焊接的进行。在一种实施方式中,第一构件400的面积不小于1.5mm×1.5mm,即第一构件400呈矩形,其长和宽分别大于等于1.5mm,此时的中间胶层150被配置为:设置中间胶层150后,第一辅助层140和第一构件400之间夹角呈180度的相对剥离力大于等于500gf/25mm;更优选地,该相对剥离力大于等于800gf/25mm,以确保激光焊接前第一构件400和第一辅助层140之间的相对固定。The function of the intermediate glue layer 150 is to relatively fix the first component 400 and the first auxiliary layer 140 before laser welding, so that no misalignment occurs between the first auxiliary layer 140 and the first component 400 during laser welding. situation to ensure the progress of laser welding. In one embodiment, the area of the first member 400 is not less than 1.5mm×1.5mm, that is, the first member 400 is rectangular, and its length and width are respectively greater than or equal to 1.5mm. At this time, the middle glue layer 150 is configured as: After the intermediate adhesive layer 150 is provided, the relative peeling force at an angle of 180 degrees between the first auxiliary layer 140 and the first member 400 is greater than or equal to 500gf/25mm; more preferably, the relative peeling force is greater than or equal to 800gf/25mm to ensure that The first component 400 and the first auxiliary layer 140 are relatively fixed before laser welding.
本申请提出的焊接方法适用于对厚度较小且激光吸收率较低的第一构件400进行激光焊接。The welding method proposed in this application is suitable for laser welding the first component 400 with a small thickness and low laser absorption rate.
然而,现有技术中,激光焊接一般适用于对厚度较大或者激光吸收率较大的构件进行焊接,因为厚度过小的构件在进行激光焊接时会被激光能量直接击穿,而激光吸收率较小的构件由于难以吸收激光能量而难以焊接;因此,在焊接一些常见的材料时,由于激光参数的不同以及材料的激光吸收率不同,往往要求材料具备不同的厚度,以保证材料不会被焊穿;同时,材料激光吸收率越小,其能够进行激光焊接的厚度应当越大,以确保材料能够吸收足够的激光能量,如下表1列出了部分材料进行激光焊接时需要的厚度:However, in the existing technology, laser welding is generally suitable for welding components with large thickness or large laser absorption rate, because components with too small thickness will be directly penetrated by laser energy during laser welding, and the laser absorption rate Smaller components are difficult to weld because they are difficult to absorb laser energy; therefore, when welding some common materials, due to different laser parameters and different laser absorption rates of the materials, the materials are often required to have different thicknesses to ensure that the materials will not be Welding through; at the same time, the smaller the laser absorption rate of the material, the greater the thickness that can be used for laser welding to ensure that the material can absorb sufficient laser energy. Table 1 below lists the thickness required for laser welding of some materials:
【表1】【Table 1】
材料种类Material type 厚度/mmThickness/mm 脉冲激光能量/JPulse laser energy/J 脉冲宽度/msPulse width/ms
纯铜箔Pure copper foil 0.10.1 2.32.3 4.04.0
不锈钢薄片stainless steel sheet 0.290.29 1.211.21 3.73.7
可见,一般地,当材料的厚度达到微米级别时,尤其是达到十位数的微米级别时,现有技术中不会考虑对其进行激光焊接处理;本申请提出的激光焊接方法克服了现有技术的偏见,将激光焊接应用在了厚度达微米级别且激光 吸收率较小的第一构件400上。It can be seen that generally, when the thickness of the material reaches the micron level, especially when it reaches the ten-digit micron level, laser welding processing will not be considered in the existing technology; the laser welding method proposed in this application overcomes the existing problems. Due to technical bias, laser welding is applied to the first component 400 with a thickness of micron level and a small laser absorption rate.
具体地,在本申请的焊接方法中,由于第一构件400的厚度δ1较小,因此为保证第一构件400能够被焊接在第二构件500上,本申请中首先与激光接触的第一辅助层140的激光吸收率较大,可以保证本申请中第一构件400能够吸收足够的激光能量,使得达到第一构件400和第二构件500之间的激光能量足够形成熔池。Specifically, in the welding method of the present application, since the thickness δ1 of the first component 400 is small, in order to ensure that the first component 400 can be welded to the second component 500, the first auxiliary device in the present application first contacts the laser. The laser absorption rate of layer 140 is relatively large, which ensures that the first component 400 in this application can absorb sufficient laser energy, so that the laser energy reaching between the first component 400 and the second component 500 is sufficient to form a molten pool.
在本申请的焊接方法中,由于厚度大于等于35μm的第一辅助层140且第一辅助层140和第一构件400的厚度之和≥50μm,因此相当于对第一构件400作了加厚以及增加其激光吸收率的处理,保证微米级别的第一构件400在焊接时能够与第二构件500之间形成具有足够深度和强度的熔池。此外,在制作得到第一辅助层140时,一般通过切割一个尺寸较大的胚料以批量地获得多个第一辅助层140,从激光焊接的效果上而言,第一辅助层140的厚度越大,对于激光焊接的效果越好,但是,所对应的胚料厚度越大,切割的难度也就越大,且切割后获得的第一辅助层140越容易产生毛刺等瑕疵,不利于生产效率的提高,因此第一辅助层140的厚度不易过大,超过100μm后生产效率过低。另外,由于第一辅助层140具有足够的厚度,还能够对第一构件400的结构起到支撑效果,有效防止第一构件400发生断裂的情况。In the welding method of the present application, since the thickness of the first auxiliary layer 140 is greater than or equal to 35 μm and the sum of the thicknesses of the first auxiliary layer 140 and the first member 400 is ≥50 μm, it is equivalent to thickening the first member 400 and The process of increasing its laser absorption rate ensures that a molten pool with sufficient depth and strength can be formed between the micron-level first component 400 and the second component 500 during welding. In addition, when the first auxiliary layer 140 is produced, a plurality of first auxiliary layers 140 are generally obtained in batches by cutting a larger-sized blank. In terms of the effect of laser welding, the thickness of the first auxiliary layer 140 The larger the thickness, the better the effect of laser welding. However, the greater the thickness of the corresponding blank, the more difficult it is to cut, and the first auxiliary layer 140 obtained after cutting is more likely to have defects such as burrs, which is not conducive to production. The efficiency is improved, so the thickness of the first auxiliary layer 140 is not likely to be too large. If the thickness exceeds 100 μm, the production efficiency will be too low. In addition, since the first auxiliary layer 140 has sufficient thickness, it can also provide a supporting effect on the structure of the first member 400 and effectively prevent the first member 400 from breaking.
综上可得,本申请第一方面提出的焊接方法通过设置第一辅助层140,能够将厚度较小且激光吸收率较低的第一构件400通过激光焊接在异质金属的第二构件500上;将本申请的焊接方法应用在弹性电接触端子的焊接时,利用激光焊接替代超声波焊接,可以降低焊接所需的成本,解决背景技术中提出的超声波焊接成本较高的技术问题,具体请参阅本申请第二方面提出的弹性电接触端子的焊接结构。In summary, it can be concluded that the welding method proposed in the first aspect of the present application can laser weld the first component 400 with a smaller thickness and lower laser absorption rate to the second component 500 of a heterogeneous metal by providing the first auxiliary layer 140 Above; when applying the welding method of this application to the welding of elastic electrical contact terminals, using laser welding instead of ultrasonic welding can reduce the cost of welding and solve the technical problem of high ultrasonic welding cost raised in the background art. For details, please Please refer to the welding structure of the elastic electrical contact terminal proposed in the second aspect of this application.
优选地,在一种实施方式中,设中间胶层150的厚度为h1,3μm≤h1≤10μm。对于中间胶层150,其厚度越大,粘合效果越好,也就是说在激光焊接前第一辅助层140和第一构件400之间的稳定性越好。但激光焊接时,厚度越大的中间胶层150对于激光能量的传导阻碍越大,导致激光焊接的效果越差;此外,中间胶层150激光焊接后电阻较高,影响弹性电接触端子的电阻;因此,中间胶层150的厚度不宜过大,需满足h1≤10μm;但是,中间胶层150的厚度越小,在激光焊接前第一辅助层140和第一构件400之间的连接稳定性越差,相对位置的固定效果有限,不利于激光焊接的进行,因此,中间胶层150的厚度同样不宜过小,需满足h1≥3μm。Preferably, in one embodiment, the thickness of the intermediate adhesive layer 150 is h1, and 3 μm≤h1≤10 μm. For the middle adhesive layer 150, the greater the thickness, the better the bonding effect, that is to say, the better the stability between the first auxiliary layer 140 and the first component 400 before laser welding. However, during laser welding, the thicker the middle glue layer 150, the greater the obstruction to the conduction of laser energy, resulting in worse laser welding effects; in addition, the resistance of the middle glue layer 150 after laser welding is higher, affecting the resistance of the elastic electrical contact terminals. ; Therefore, the thickness of the middle glue layer 150 should not be too large and must satisfy h1 ≤ 10 μm; however, the smaller the thickness of the middle glue layer 150, the better the connection stability between the first auxiliary layer 140 and the first component 400 before laser welding. The worse, the relative position fixing effect is limited, which is not conducive to laser welding. Therefore, the thickness of the middle adhesive layer 150 should not be too small and must satisfy h1≥3μm.
作为更进一步的优选方式,3μm≤h1≤6μm,以确保中间胶层150不会对激光能量的传导造成影响焊接效果的阻碍。至于激光焊接前第一辅助层140和第一构件400之间的连接稳定性,可通过其它方式得到进一步地保证;需要说明的是,本优选实施方式对其它方式的说明,并不限定本优选实施方式的实施必须依靠其它方式稳固激光焊接前第一辅助层140和第一构件400之间的连接稳定性,即便不通过其它方式,中间胶层150也存在一定程度的粘合能力,保证激光焊接前第一辅助层140和第一构件400之间的连接稳定性。As a further preferred method, 3 μm ≤ h1 ≤ 6 μm to ensure that the intermediate adhesive layer 150 will not hinder the transmission of laser energy and affect the welding effect. As for the connection stability between the first auxiliary layer 140 and the first component 400 before laser welding, it can be further ensured through other methods; it should be noted that the description of other methods in this preferred embodiment does not limit this preferred method. The implementation of the embodiment must rely on other methods to stabilize the connection stability between the first auxiliary layer 140 and the first component 400 before laser welding. Even without other methods, the intermediate adhesive layer 150 still has a certain degree of adhesion ability to ensure laser welding. Connection stability between the first auxiliary layer 140 and the first component 400 before welding.
其中,第一辅助层140需同时具备与中间胶层150的粘合效果良好和激光吸收率较大的性能,可选地,第一辅助层140可以是洋白铜、碳钢以及铝箔等。但优选地,第一辅助层140包括第二基材141和镀设在第二基材141上表面上并用于吸收激光能量的金属镀膜142,金属镀膜142的激光吸收率分别大于第一构件400和第二基材141的激光吸收率。其中,第二基材141用于通过中间胶层150粘合与第一基材132上,而金属镀膜142则用于吸收足够的激光能量;这样的设置能够较为容易地同时实现保证与中间胶层150之间的粘合效果和能够吸收足够能量的激光能量的效果,无需对第一辅助层140的选择过分地苛责,从而无需重复验证具体何种材料能够同时符合具有良好的激光吸收率和能够较好地粘合于中间胶层150的要求,虽然增加了将金属膜层镀设于第二基材141上的制作步骤,但降低了选材的难度,能够更好地控制产品的成本。Among them, the first auxiliary layer 140 needs to have both good bonding effect with the intermediate adhesive layer 150 and high laser absorption rate. Optionally, the first auxiliary layer 140 can be made of silver-nickel copper, carbon steel, aluminum foil, etc. But preferably, the first auxiliary layer 140 includes a second substrate 141 and a metal coating 142 plated on the upper surface of the second substrate 141 and used to absorb laser energy. The laser absorption rate of the metal coating 142 is greater than that of the first component 400 respectively. and the laser absorption rate of the second substrate 141. Among them, the second base material 141 is used to bond with the first base material 132 through the intermediate adhesive layer 150, and the metal coating 142 is used to absorb sufficient laser energy; such an arrangement can easily achieve the guarantee and the intermediate adhesive layer at the same time. The adhesion effect between the layers 150 and the effect of being able to absorb sufficient energy of the laser energy do not need to be unduly harsh in the selection of the first auxiliary layer 140, so there is no need to repeatedly verify which material can simultaneously meet the requirements of good laser absorption rate and The requirement of being able to adhere well to the intermediate adhesive layer 150 increases the manufacturing steps of plating the metal film layer on the second substrate 141, but reduces the difficulty of material selection and can better control the cost of the product.
可选地,中间胶层150可以是丙烯酸压敏胶胶水、环氧热熔胶水、聚氨酯热固胶、聚氨酯热塑胶以及硅胶中的其中一种,具体可通过综合考虑成本、粘合效果以及对于激光能量传导阻碍效果等因素选择。Optionally, the middle glue layer 150 can be one of acrylic pressure-sensitive glue, epoxy hot melt glue, polyurethane thermosetting glue, polyurethane thermoplastic glue, and silicone glue. Specifically, the cost, bonding effect, and Laser energy conduction hindrance effect and other factors are selected.
进一步地,在一些实施方式中,在所述通过中间胶层150在第一构件400的上表面上粘附第一辅助层140前,即步骤S200前,还包括:对第一构件400的上表面和第一辅助层140的下表面中的至少一个表面进行粗化处理。中间胶层150由于厚度较小,与第一构件400的上表面和第一辅助层140的下表面之间的粘合效果有限,本实施方式中,通过对第一构件400的上表面和第一辅助层140的下表面中的至少一个表面进行粗化处理,能够提高中间胶层150与被粗化处理后的表面之间的粘合效果。优选地,同时对第一构件400的上表面和第一辅助层140的下表面进行粗化处理,以使得中间胶层150能够起到更好的粘合效果。Further, in some embodiments, before adhering the first auxiliary layer 140 to the upper surface of the first member 400 through the intermediate glue layer 150 , that is, before step S200 , the method further includes: At least one of the surface and the lower surface of the first auxiliary layer 140 is roughened. Due to the small thickness of the intermediate adhesive layer 150, the bonding effect with the upper surface of the first member 400 and the lower surface of the first auxiliary layer 140 is limited. At least one surface of the lower surface of an auxiliary layer 140 is roughened, which can improve the bonding effect between the intermediate adhesive layer 150 and the roughened surface. Preferably, the upper surface of the first member 400 and the lower surface of the first auxiliary layer 140 are roughened at the same time, so that the intermediate adhesive layer 150 can achieve a better bonding effect.
可选地,粗化处理的方式有多种,如使用化学试剂腐蚀,此处并不作限制。Optionally, there are many methods of roughening treatment, such as using chemical reagents for etching, which are not limited here.
进一步地,所述将所述第一构件400叠设于所述第二构件500上,即步骤S100具体包括:在第一构件400下表面上设置底部胶层160,以使第一构件400通过底部胶层160粘合于第二构件500上,以使得第一构件400在激光焊接前能够初步地固定在第二构件500,从而保证激光焊接的进行,同时无需像传统激光焊接那样需要额外的定位治具。其中,当设置有导电镀膜133时,底部胶层160粘附于第一构件400的导电镀膜133下表面上。Further, the step S100 of stacking the first component 400 on the second component 500 specifically includes: providing a bottom glue layer 160 on the lower surface of the first component 400 to allow the first component 400 to pass through The bottom glue layer 160 is bonded to the second component 500 so that the first component 400 can be preliminarily fixed to the second component 500 before laser welding, thereby ensuring the progress of laser welding without requiring additional components like traditional laser welding. Positioning fixture. Wherein, when the conductive coating 133 is provided, the bottom glue layer 160 adheres to the lower surface of the conductive coating 133 of the first component 400 .
优选地,在一种实施方式中,设底部胶层160的厚度为h2,3μm≤h2≤10μm。对于底部胶层160而言,其与中间胶层150类似,都是粘合效果随着厚度的增加而提高,但对激光能量的传导阻碍也会随着厚度的增加而增加,因此底部胶层160同样不宜过大或者过小,需满足3μm≤h2≤10μm。Preferably, in one embodiment, the thickness of the bottom glue layer 160 is h2, and 3 μm≤h2≤10 μm. The bottom glue layer 160 is similar to the middle glue layer 150 in that the bonding effect increases with the increase in thickness, but the resistance to the conduction of laser energy also increases with the increase in thickness, so the bottom glue layer 160 should also not be too large or too small, and must satisfy 3μm≤h2≤10μm.
作为更进一步的优选方式,3μm≤h2≤6μm,以确保底部胶层160不会对激光能量的传导造成影响焊接效果的阻碍。As a further preferred method, 3 μm ≤ h2 ≤ 6 μm to ensure that the bottom adhesive layer 160 will not hinder the transmission of laser energy and affect the welding effect.
更进一步地,中间胶层150的厚度和底部胶层160的厚度之和,即h1+h2≤12μm,以更进一步地确保激光能量传导的效果。Furthermore, the sum of the thickness of the middle glue layer 150 and the thickness of the bottom glue layer 160 is h1 + h2 ≤ 12 μm to further ensure the effect of laser energy transmission.
可选地,底部胶层160可以是丙烯酸压敏胶胶水、环氧热熔胶水、聚氨酯热固胶、聚氨酯热塑胶以及硅胶中的其中一种,具体可通过综合考虑成本、粘合效果以及对于激光能量传导阻碍效果等因素选择。Optionally, the bottom glue layer 160 can be one of acrylic pressure-sensitive glue, epoxy hot melt glue, polyurethane thermosetting glue, polyurethane thermoplastic glue, and silicone glue. Specifically, the cost, bonding effect, and Laser energy conduction hindrance effect and other factors are selected.
进一步地,在一些实施方式中,还包括:在第一构件400下表面上设置底部胶层160前,对第一构件400的下表面进行粗化处理。Further, in some embodiments, the method further includes: roughening the lower surface of the first component 400 before disposing the bottom glue layer 160 on the lower surface of the first component 400 .
本实施方式中,同理,厚度有限的底部胶层160的粘合效果有限,通过对第一构件400的下表面进行粗化处理,能够提高底部胶层160与第一构件400的下表面之间的粘合效果。In this embodiment, similarly, the bonding effect of the bottom glue layer 160 with limited thickness is limited. By roughening the lower surface of the first member 400, the bond between the bottom glue layer 160 and the lower surface of the first member 400 can be improved. The bonding effect between them.
同样地,粗化处理的方式有多种,如使用化学试剂腐蚀,此处并不作限制。Similarly, there are many methods of roughening treatment, such as using chemical reagents for etching, which are not limited here.
进一步地,在一些实施方式中,在所述第一构件400的下表面上设置所述底部胶层160前,还包括:利用刀具在所述第一辅助层140的上表面施加朝向所述第一构件400的作用力,驱使所述第一辅助层140和所述第一构件400同时向下凹陷,直至形成从所述第一辅助层140的上表面贯穿至所述第一构件400的下表面的切口134,所述切口134呈宽度从上至下逐渐减小的楔形,所述第一辅助层140沿所述切口134的顶部边缘形成有折弯143,所述折弯143沿所述切口134的内周壁向下延伸,且所述折弯143的末端外扩至包裹所述第一构件400的下表面,如图4所示。Further, in some embodiments, before arranging the bottom glue layer 160 on the lower surface of the first component 400, the method further includes: using a knife to apply a glue on the upper surface of the first auxiliary layer 140 toward the first auxiliary layer 140. The force of a member 400 drives the first auxiliary layer 140 and the first member 400 to recess downward at the same time until a penetrating form is formed from the upper surface of the first auxiliary layer 140 to the lower surface of the first member 400 . The cutout 134 on the surface is in the shape of a wedge with a width that gradually decreases from top to bottom. The first auxiliary layer 140 is formed with a bend 143 along the top edge of the cutout 134. The bend 143 is formed along the top edge of the cutout 134. The inner peripheral wall of the cutout 134 extends downward, and the end of the bend 143 expands to wrap the lower surface of the first member 400 , as shown in FIG. 4 .
本实施方式中,考虑到中间胶层150不能过厚导致激光能量传导受到影响,因此存在第一辅助层140和第一构件400在激光焊接前相对连接稳定性较差的问题,通过上述的折弯143和切口134之间的相互配合关系,使得第一辅助层140和第一构件400之间能够形成类似锁扣的结构,提高了第一辅助层140和第一构件400之间的连接稳定性。In this embodiment, considering that the intermediate glue layer 150 cannot be too thick to affect the laser energy conduction, there is a problem of poor relative connection stability between the first auxiliary layer 140 and the first component 400 before laser welding. Through the above-mentioned folding The mutual cooperation between the bend 143 and the cutout 134 enables a lock-like structure to be formed between the first auxiliary layer 140 and the first member 400, thereby improving the stability of the connection between the first auxiliary layer 140 and the first member 400. sex.
可选地,在一些实施方式中,形成的切口134和折弯143的数量分别为多个,以形成多个类似锁扣的结构,进一步地提高了第一辅助层140和第一构件400之间的连接稳定性。多个类似锁扣的结构可以通过在刀具上设置多个 施力部或通过刀具多次施力形成。Optionally, in some embodiments, the number of cuts 134 and bends 143 formed is multiple to form multiple lock-like structures, further improving the stability between the first auxiliary layer 140 and the first member 400 . connection stability. Multiple lock-like structures can be formed by providing multiple force-applying parts on the tool or by applying force multiple times through the tool.
考虑到中间胶层150不能过厚导致激光能量传导受到影响,因此存在第一辅助层140和第一构件400在激光焊接前相对连接稳定性较差的问题,进一步地,在一些实施方式中,还包括:在第一构件400下方设置第二辅助层。Considering that the intermediate glue layer 150 cannot be too thick to affect the laser energy conduction, there is a problem of poor relative connection stability between the first auxiliary layer 140 and the first component 400 before laser welding. Furthermore, in some embodiments, It also includes: disposing a second auxiliary layer below the first component 400 .
利用刀具在第一辅助层140的上表面施加朝向第一构件400的预定作用力驱使第一辅助层140、第一构件400以及第二辅助层同时向下凹陷,直至形成从第一辅助层140上表面贯穿至第二辅助层的下表面的切口134,切口134呈从上之下宽度逐渐减小的楔形,第一辅助层140沿切口134的顶部边缘形成有折弯143,折弯143沿切口134的内周壁向下延伸,且折弯143的末端外扩至包裹第二辅助层的下表面。A cutter is used to apply a predetermined force toward the first member 400 on the upper surface of the first auxiliary layer 140 to drive the first auxiliary layer 140 , the first member 400 and the second auxiliary layer to simultaneously dent downwardly until the first auxiliary layer 140 is formed. The cutout 134 extends from the upper surface to the lower surface of the second auxiliary layer. The cutout 134 is in the shape of a wedge with a gradually decreasing width from top to bottom. The first auxiliary layer 140 is formed with a bend 143 along the top edge of the cutout 134. The bend 143 is formed along the top edge of the cutout 134. The inner peripheral wall of the cutout 134 extends downward, and the end of the bend 143 expands to wrap the lower surface of the second auxiliary layer.
由此,上述实施方式中,通过折弯143和切口134之间的相互配合关系,使得第一辅助层140、第一构件400以及第二辅助层之间能够形成更为稳固的锁扣结构,从而进一步地提高了第一辅助层140和第一构件400之间的连接稳定性。Therefore, in the above embodiment, through the mutual cooperation between the bends 143 and the cuts 134, a more stable locking structure can be formed between the first auxiliary layer 140, the first member 400 and the second auxiliary layer. Thereby, the connection stability between the first auxiliary layer 140 and the first member 400 is further improved.
其中,在激光焊接时,本实施方式的弹性电接触端子中,激光焊接时,第二辅助层与第二构件500之间形成熔池并固定为一体,与没有设置第二辅助层的方案相比,其一,连接效果更为稳固;其二,由于相当于进一步地增加了第一构件400的厚度,激光焊接效果更佳;但是,设置第二辅助层的方案在生产、加工时更加困难。During laser welding, in the elastic electrical contact terminal of this embodiment, during laser welding, a molten pool is formed between the second auxiliary layer and the second member 500 and fixed as a whole, which is different from the solution in which the second auxiliary layer is not provided. Compared with, firstly, the connection effect is more stable; secondly, since the thickness of the first component 400 is further increased, the laser welding effect is better; however, the solution of setting the second auxiliary layer is more difficult in production and processing. .
请参阅图2至图4,本申请第二方面提出一种弹性电接触端子的焊接结构,包括端子本体100和基板200;端子本体100包括弹性芯部110和包裹在弹性芯部110外周上的导电层130,导电层130具有向外延伸突出并形成焊接段131的端部,所述导电层130的厚度为9μm~25μm;所述导电层130和所述基板200互为不同的金属材料;其中,所述焊接段131通过如本申请第一方面提出的焊接方法焊接于所述基板200上,其中,以所述焊接段131作为所述第一构件400,以所述基板200作为所述第二构件500。Referring to Figures 2 to 4, the second aspect of the present application proposes a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; the terminal body 100 includes an elastic core 110 and an elastic core wrapped around the outer circumference of the elastic core 110. The conductive layer 130 has an end that extends outward and forms a welding section 131. The thickness of the conductive layer 130 is 9 μm to 25 μm; the conductive layer 130 and the substrate 200 are made of different metal materials; Wherein, the welding section 131 is welded to the substrate 200 through the welding method proposed in the first aspect of this application, wherein the welding section 131 is used as the first component 400 and the substrate 200 is used as the Second component 500.
具体地,本申请的端子本体100被激光焊接固定在基板200上时,首先利用中间胶层150将第一辅助层140粘附于焊接段131上表面上,而后将焊接段131设于基板200上,继而,利用激光焊接装置发射激光,发射的激光依次穿过第一辅助层140、中间胶层150以及焊接段131并到达焊接段131的下表面和基板200之间的间隙内,对焊接段131和基板200分别进行熔接,使得焊接段131被焊接在基板200上。Specifically, when the terminal body 100 of the present application is fixed on the substrate 200 by laser welding, the first auxiliary layer 140 is first adhered to the upper surface of the welding section 131 using the intermediate adhesive layer 150, and then the welding section 131 is set on the substrate 200. Then, the laser welding device is used to emit laser light. The emitted laser light passes through the first auxiliary layer 140, the intermediate adhesive layer 150 and the welding section 131 in sequence and reaches the gap between the lower surface of the welding section 131 and the substrate 200, and the welding is performed. The segment 131 and the base plate 200 are welded respectively, so that the welding segment 131 is welded to the base plate 200 .
其中,上述的导电层130主要用在弹性电接触端子上作为导电路径,将需要电磁屏蔽、消除信号干扰或接地的通电元件,如显示屏300,导电连接至其他元件,如第二构件500上。导电层130的厚度δ1在9μm至25μm之间,满足弹性芯部110的回弹性能需求和端子本体100的小型化需求。Among them, the above-mentioned conductive layer 130 is mainly used on the elastic electrical contact terminal as a conductive path to conductively connect the energized components that need electromagnetic shielding, elimination of signal interference or grounding, such as the display screen 300, to other components, such as the second component 500. . The thickness δ1 of the conductive layer 130 is between 9 μm and 25 μm, which meets the resilience performance requirements of the elastic core 110 and the miniaturization requirements of the terminal body 100 .
此外,在获得本申请上述弹性电接触端子的焊接结构的过程中,本申请的发明人在想到利用激光焊接替代现有的超声波焊接,以降低厚度较小的导电层130焊接所需的生产成本后,进一步地得出本实施例还克服了如下技术难点:In addition, in the process of obtaining the welding structure of the elastic electrical contact terminal of the present application, the inventor of the present application thought of using laser welding to replace the existing ultrasonic welding to reduce the production cost required for welding the conductive layer 130 with a smaller thickness. Finally, it is further concluded that this embodiment also overcomes the following technical difficulties:
第一,在进行激光焊接时,不能简单地通过加厚本方案中第一构件400的厚度的方式使其能够被激光焊接,原因在于:本方案涉及通信设备技术领域中的弹性电接触端子产品,在应用时,第一构件400是导电层130的一部分,若需要对第一构件400进行加厚,那么势必需要对导电层130进行加厚,又因为导电层130回弹性能一般,加厚之后导电层130必将抑制弹性电接触端子的弹性芯部110被压缩后的回弹,导致弹性芯部110的回弹性能降低,从而影响弹性电接触端子的工作。且,第一构件400的厚度越大,弹性电接触端子安装所需的空间越大,不利于弹性电接触端子的小型化设计。First, when performing laser welding, the first component 400 in this solution cannot be simply thickened to enable it to be laser welded. The reason is that this solution involves elastic electrical contact terminal products in the field of communication equipment technology. , in application, the first member 400 is a part of the conductive layer 130. If the first member 400 needs to be thickened, the conductive layer 130 must be thickened, and because the conductive layer 130 has average resilience, thickening The conductive layer 130 will then inhibit the elastic core 110 of the elastic electrical contact terminal from rebounding after being compressed, resulting in a reduction in the resilience of the elastic core 110 , thereby affecting the operation of the elastic electrical contact terminal. Moreover, the greater the thickness of the first member 400, the greater the space required for installing the elastic electrical contact terminals, which is not conducive to the miniaturization design of the elastic electrical contact terminals.
第二,在进行激光焊接时,也不能通过第一构件400的反复折叠的方式增加第一构件400的厚度,以使其能够被激光焊接,原因在于:若第一构件400反复折叠以形成较厚的第一构件400,从而进行激光焊接,则至少多次折叠,折叠后形成的多层第一构件400不适于设置胶层粘合,一方面是因为对于胶层的消耗较大,另一方面是操作并 不便捷,因为多层第一构件400往往需要定制的治具压合,以保证在激光焊接过程中各层之间的间隙能够被消除,保证激光焊接效果,但本申请体积小且安装所处的空间狭小,治具的设置受到了限制;况且治具的设置相应地也提高了成本,治具的压合过程也限制了生产效率。Second, when performing laser welding, the thickness of the first member 400 cannot be increased by repeatedly folding the first member 400 so that it can be laser welded. The reason is that if the first member 400 is repeatedly folded to form a larger If the thick first member 400 is to be laser welded, it must be folded at least multiple times. The multi-layered first member 400 formed after folding is not suitable for setting an adhesive layer for bonding. On the one hand, it consumes a large amount of adhesive layer, and on the other hand, it consumes a lot of adhesive layer. On the one hand, the operation is not convenient, because the multi-layer first component 400 often needs to be pressed with a customized jig to ensure that the gaps between the layers can be eliminated during the laser welding process to ensure the laser welding effect. However, the volume of this application is small Moreover, the space where the installation is located is small, and the setting of the jig is restricted; moreover, the setting of the jig correspondingly increases the cost, and the laminating process of the jig also limits the production efficiency.
可选地,在第一构件400的上表面上通过中间胶层150粘附激光吸收率大于第一构件400且厚度δ2在35μm至100μm之间的第一辅助层140时,可通过压合的方式将第一辅助层140压合在中间胶层150上。需要说明的是,这里的压合与采用多层折叠铜箔的压合并不同,这里的压合是指激光焊接前制作得到本申请的弹性电接触端子需要压合过程,压合完成后即可撤去治具,在激光焊接过程中,由中间胶层150固定第一辅助层140和第一构件400;而多层折叠铜箔的压合需要始终保持治具的压合,直至激光焊接完成才可撤去治具。Optionally, when the first auxiliary layer 140 with a laser absorption rate greater than that of the first member 400 and a thickness δ2 between 35 μm and 100 μm is adhered to the upper surface of the first member 400 through the intermediate glue layer 150 , the first auxiliary layer 140 can be bonded by pressing The first auxiliary layer 140 is pressed onto the middle adhesive layer 150 in this way. It should be noted that the lamination here is different from the lamination using multi-layer folded copper foil. The lamination here refers to the lamination process required before laser welding to produce the elastic electrical contact terminals of the present application. The lamination can be completed after the lamination is completed. The jig is removed, and during the laser welding process, the first auxiliary layer 140 and the first component 400 are fixed by the intermediate glue layer 150; and the lamination of multi-layer folded copper foil requires that the jig be kept pressed until the laser welding is completed. The fixture can be removed.
优选地,基板200为铝板。Preferably, the substrate 200 is an aluminum plate.
优选地,在一些实施方式中,导电层130包括第一基材132和镀设于第一基材132下表面的导电镀膜133;其中,所述第一基材132包括铜,导电镀膜133的抗氧化能力优于第一基材132。导电镀膜133主要用于在焊接段131被激光焊接固定在基板200上后,与基板200产生电连接,以获得电磁屏蔽、消除信号干扰以及接地等的效果并长期保持不被氧化;上述的导电镀膜133的抗氧化能力优于第一基材132,是指在弹性电接触端子的工作环境的温度下,随着弹性电接触端子的工作环境抗氧化能力要求不同,导电镀膜133的材质选择不同。Preferably, in some embodiments, the conductive layer 130 includes a first base material 132 and a conductive plating film 133 plated on the lower surface of the first base material 132; wherein, the first base material 132 includes copper, and the conductive plating film 133 is The anti-oxidation ability is better than that of the first substrate 132 . The conductive coating 133 is mainly used to create an electrical connection with the substrate 200 after the welding section 131 is fixed on the substrate 200 by laser welding, so as to obtain the effects of electromagnetic shielding, elimination of signal interference, grounding, etc. and to keep it from being oxidized for a long time; the above-mentioned conductivity The anti-oxidation ability of the coating 133 is better than that of the first substrate 132. This means that under the temperature of the working environment of the elastic electrical contact terminal, the material selection of the conductive coating 133 is different as the anti-oxidation ability requirements of the working environment of the elastic electrical contact terminal are different. .
其中,当底部胶层160粘附于导电镀膜133上时,所述的第一构件400的下表面进行粗化处理具体为:对导电镀膜133下表面进行粗化处理。When the bottom adhesive layer 160 adheres to the conductive coating 133, the lower surface of the first component 400 is roughened, specifically: the lower surface of the conductive coating 133 is roughened.
可选地,第一基材132为压延铜箔。优选地,第一基材132为电解铜箔,与压延铜箔相比,电解铜箔的导电性更高,且电解铜箔一侧表面为粗糙的毛刺面,更利于与中间胶层150粘合,提高中间胶层150与第一基材132的连接稳定性。Optionally, the first substrate 132 is rolled copper foil. Preferably, the first base material 132 is electrolytic copper foil. Compared with rolled copper foil, electrolytic copper foil has higher conductivity, and one side surface of the electrolytic copper foil has a rough burr surface, which is more conducive to adhesion with the intermediate adhesive layer 150. Together, the connection stability between the intermediate adhesive layer 150 and the first base material 132 is improved.
可选地,导电镀膜133可以是厚度>10nm的金层,或是厚度>0.3μm的镍层,或是厚度大于0.1μm的锡层,以满足焊接段131与基板200之间的导电连接需求。Optionally, the conductive coating 133 can be a gold layer with a thickness >10 nm, a nickel layer with a thickness >0.3 μm, or a tin layer with a thickness greater than 0.1 μm, to meet the conductive connection requirements between the welding section 131 and the substrate 200 .
可选地,第一辅助层140可以是洋白铜、碳钢以及铝箔等;但优选地,第一辅助层140包括第二基材141和镀设在第二基材141上表面上并用于吸收激光能量的金属镀膜142,金属镀膜142的激光吸收率分别大于第一基材132和第二基材141的激光吸收率。其中,第二基材141用于通过中间胶层150粘合与第一基材132上,而金属镀膜142则用于吸收足够的激光能量;这样的设置能够较为容易地同时实现保证与中间胶层150之间的粘合效果和能够吸收足够能量的激光能量的效果,无需对第一辅助层140的选择过分地苛责,从而无需重复验证具体何种材料能够同时符合具有良好的激光吸收率和能够较好地粘合于中间胶层150的要求,虽然增加了将金属膜层镀设于第二基材141上的制作步骤,但降低了选材的难度,能够更好地控制产品的成本。Optionally, the first auxiliary layer 140 can be made of silver-nickel copper, carbon steel, aluminum foil, etc.; but preferably, the first auxiliary layer 140 includes the second base material 141 and is plated on the upper surface of the second base material 141 and is used to absorb The laser energy of the metal coating 142 and the laser absorption rate of the metal coating 142 are respectively greater than the laser absorption rates of the first substrate 132 and the second substrate 141. Among them, the second base material 141 is used to bond with the first base material 132 through the intermediate adhesive layer 150, and the metal coating 142 is used to absorb sufficient laser energy; such an arrangement can easily achieve the guarantee and the intermediate adhesive layer at the same time. The adhesion effect between the layers 150 and the effect of being able to absorb sufficient energy of the laser energy do not need to be unduly harsh in the selection of the first auxiliary layer 140, so there is no need to repeatedly verify which material can simultaneously meet the requirements of good laser absorption rate and The requirement of being able to adhere well to the intermediate adhesive layer 150 increases the manufacturing steps of plating the metal film layer on the second substrate 141, but reduces the difficulty of material selection and can better control the cost of the product.
其中,金属镀膜142包括镍,第二基材141包括铜箔。与其它材料相比,本优选方式使用的第一辅助层140由于其中作为第二基材141的铜箔强度较低,因此即便其厚度较大,也能够更为容易地从一整块尺寸较大的胚料上切割得到多个第一辅助层140,保证能够切割得到厚度δ2≥35μm且满足δ1+δ2≥50μm的第一辅助层140,也就是说,本优选方式的第一辅助层140加工更为便捷;且,第一基材132与第二基材141的材质一致,化学性能和物理性能一致,激光焊接难度较低。The metal plating film 142 includes nickel, and the second base material 141 includes copper foil. Compared with other materials, the copper foil used as the second base material 141 of the first auxiliary layer 140 used in this preferred manner has lower strength, so even if its thickness is larger, it can be more easily formed from a larger size. Multiple first auxiliary layers 140 are cut from the large blank to ensure that the first auxiliary layer 140 with thickness δ2≥35 μm and satisfying δ1+δ2≥50 μm can be cut. In other words, the first auxiliary layer 140 of this preferred mode The processing is more convenient; moreover, the first base material 132 and the second base material 141 are made of the same material, have the same chemical properties and physical properties, and are less difficult to laser weld.
进一步地,在一些实施方式中,端子本体100还包括耐热聚合物膜层120;耐热聚合物膜层120粘接于弹性芯部110的外周,导电层130包括依次连接的上导电部、侧导电部以及下导电部,焊接段131由下导电部沿平行于弹性芯部110下表面的方向向外突出形成;上导电部粘接于耐热聚合物膜层120的上表面,下导电部粘接于耐热聚合物膜层120的下表面。Further, in some embodiments, the terminal body 100 further includes a heat-resistant polymer film layer 120; the heat-resistant polymer film layer 120 is bonded to the outer periphery of the elastic core 110, and the conductive layer 130 includes an upper conductive portion connected in sequence, The side conductive part and the lower conductive part, the welding section 131 is formed by the lower conductive part protruding outward in a direction parallel to the lower surface of the elastic core 110; the upper conductive part is bonded to the upper surface of the heat-resistant polymer film layer 120, and the lower conductive part is bonded to the upper surface of the heat-resistant polymer film layer 120. The portion is bonded to the lower surface of the heat-resistant polymer film layer 120.
基于上述实施方式,弹性电接触端子整体为P型结构,由耐热聚合物膜层120和导电层130对弹性芯部110实现整周的一体化全包裹,能够更好地保护弹性芯部110,防止弹性芯部110的右侧开口位置在使用过程中发生分层等破坏现象,提高使用寿命。Based on the above embodiments, the elastic electrical contact terminal has a P-shaped structure as a whole, and the elastic core 110 is fully wrapped around the elastic core 110 by the heat-resistant polymer film layer 120 and the conductive layer 130, which can better protect the elastic core 110. , to prevent the right opening position of the elastic core 110 from delamination and other damage during use, and improve the service life.
可选地,弹性电接触端子还包括粘合层170,耐热聚合物膜层120通过粘合层170粘接于弹性芯部110的外周,具体可参阅公开号为CN113993362A,主题名称为“一种接地弹性体及电子设备”的中国专利申请。Optionally, the elastic electrical contact terminal also includes an adhesive layer 170, and the heat-resistant polymer film layer 120 is bonded to the outer periphery of the elastic core 110 through the adhesive layer 170. For details, please refer to the publication number CN113993362A, the subject name is "One Chinese patent application for "Grounding Elastomer and Electronic Equipment".
本申请提出的弹性电接触端子的焊接结构中,导电层130和基板200之间通过第一方面的焊接方法焊接为一体,因此具有第一方面提出的焊接方法的全部有益效果,在此不再赘述。In the welding structure of the elastic electrical contact terminal proposed by the present application, the conductive layer 130 and the substrate 200 are welded into one body by the welding method of the first aspect. Therefore, it has all the beneficial effects of the welding method proposed by the first aspect, which will not be discussed here. Repeat.
下面使用具体实施例和对比例进一步详细说明本申请的弹性电接触端子的焊接结构,其中,以下实施例和对比例的激光焊接区域面积为3mm×5mm的矩形区域,焊点大小为0.36mm/个,焊点排布方式为2排×4列或4排×4列,同一排或同一列中,相邻焊点之间的间距为0.2mm,基板200为6063铝板,激光焊接的参数如下:The welding structure of the elastic electrical contact terminal of the present application will be further described in detail below using specific examples and comparative examples. The area of the laser welding area in the following examples and comparative examples is a rectangular area of 3mm×5mm, and the solder joint size is 0.36mm/ , the solder joints are arranged in 2 rows × 4 columns or 4 rows × 4 columns. In the same row or column, the spacing between adjacent solder joints is 0.2mm. The substrate 200 is a 6063 aluminum plate. The parameters of laser welding are as follows :
速度为0mm/s至60mm/s,功率为30%至100%,频率为0KHz至180KHz,Q脉冲宽度为15ns至200ns。The speed is 0mm/s to 60mm/s, the power is 30% to 100%, the frequency is 0KHz to 180KHz, and the Q pulse width is 15ns to 200ns.
以下的实施例为示例,并不限定本申请。The following examples are examples and do not limit this application.
实施例1Example 1
本实施例提供一种弹性电接触端子的焊接结构,包括端子本体100和基板200;其中,第一基材132为电解铜箔,导电镀膜133为厚度大于10nm镀金层,焊接段131的厚度δ1为25μm,第一辅助层140的厚度δ2为35μm,中间胶层150选用丙烯酸压敏胶胶水,中间胶层150的厚度h1为6μm,第一辅助层140包括铜箔制作得到的第二基材141和镀镍层制作得到的金属镀膜142,不设置底部胶层160。This embodiment provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is δ1 is 25 μm, the thickness δ2 of the first auxiliary layer 140 is 35 μm, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 6 μm, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, there is no bottom adhesive layer 160.
实施例2Example 2
本实施例提供一种弹性电接触端子的焊接结构,包括端子本体100和基板200;其中,第一基材132为电解铜箔,导电镀膜133为厚度大于10nm镀金层,焊接段131的厚度δ1为25μm,第一辅助层140的厚度δ2为100μm,中间胶层150选用丙烯酸压敏胶胶水,中间胶层150的厚度h1为6μm,第一辅助层140包括铜箔制作得到的第二基材141和镀镍层制作得到的金属镀膜142,不设置底部胶层160。This embodiment provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is δ1 is 25 μm, the thickness δ2 of the first auxiliary layer 140 is 100 μm, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 6 μm, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, there is no bottom adhesive layer 160.
实施例3Example 3
本实施例提供一种弹性电接触端子的焊接结构,包括端子本体100和基板200;其中,第一基材132为电解铜箔,导电镀膜133为厚度大于10nm镀金层,焊接段131的厚度δ1为12μm,第一辅助层140的厚度δ2为38μm,中间胶层150选用丙烯酸压敏胶胶水,中间胶层150的厚度h1为6μm,第一辅助层140包括铜箔制作得到的第二基材141和镀镍层制作得到的金属镀膜142,不设置底部胶层160。This embodiment provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is δ1 is 12 μm, the thickness δ2 of the first auxiliary layer 140 is 38 μm, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 6 μm, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, there is no bottom adhesive layer 160.
实施例4Example 4
本实施例提供一种弹性电接触端子的焊接结构,包括端子本体100和基板200;其中,第一基材132为电解铜箔,导电镀膜133为厚度大于10nm镀金层,焊接段131的厚度δ1为12μm,第一辅助层140的厚度δ2为50μm,中间胶层150选用丙烯酸压敏胶胶水,中间胶层150的厚度h1为6μm,第一辅助层140包括铜箔制作得到的第二基材141和镀镍层制作得到的金属镀膜142,不设置底部胶层160。This embodiment provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is δ1 is 12 μm, the thickness δ2 of the first auxiliary layer 140 is 50 μm, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 6 μm, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, there is no bottom adhesive layer 160.
实施例5Example 5
本实施例提供一种弹性电接触端子的焊接结构,包括端子本体100和基板200;其中,第一基材132为电解铜箔,导电镀膜133为厚度大于10nm镀金层,焊接段131的厚度δ1为12μm,第一辅助层140的厚度δ2为50μm,中间胶层150选用丙烯酸压敏胶胶水,中间胶层150的厚度h1为3μm,第一辅助层140包括铜箔制作得到的第二基材141和镀镍层制作得到的金属镀膜142,不设置底部胶层160。This embodiment provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is δ1 is 12 μm, the thickness δ2 of the first auxiliary layer 140 is 50 μm, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 3 μm, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, there is no bottom adhesive layer 160.
实施例6Example 6
本实施例提供一种弹性电接触端子的焊接结构,包括端子本体100和基板200;其中,第一基材132为电解铜箔,导电镀膜133为厚度大于10nm镀金层,焊接段131的厚度δ1为12μm,第一辅助层140的厚度δ2为50μm,中间胶层150选用丙烯酸压敏胶胶水,中间胶层150的厚度h1为6μm,第一辅助层140包括铜箔制作得到的第二基材141和镀镍层制作得到的金属镀膜142,不设置底部胶层160。This embodiment provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is δ1 is 12 μm, the thickness δ2 of the first auxiliary layer 140 is 50 μm, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 6 μm, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, there is no bottom adhesive layer 160.
实施例7Example 7
本实施例提供一种弹性电接触端子的焊接结构,包括端子本体100和基板200;其中,第一基材132为电解铜箔,导电镀膜133为厚度大于10nm镀金层,焊接段131的厚度δ1为12μm,第一辅助层140的厚度δ2为50μm,中间胶层150选用丙烯酸压敏胶胶水,中间胶层150的厚度h1为10μm,第一辅助层140包括铜箔制作得到的第二基材141和镀镍层制作得到的金属镀膜142,不设置底部胶层160。This embodiment provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is δ1 is 12 μm, the thickness δ2 of the first auxiliary layer 140 is 50 μm, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 10 μm, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, there is no bottom adhesive layer 160.
实施例8Example 8
本实施例提供一种弹性电接触端子的焊接结构,包括端子本体100和基板200;其中,第一基材132为电解铜箔,导电镀膜133为厚度大于10nm镀金层,焊接段131的厚度δ1为12μm,第一辅助层140的厚度δ2为50μm,中间胶层150选用丙烯酸压敏胶胶水,中间胶层150的厚度h1为3μm,第一辅助层140包括铜箔制作得到的第二基材141和镀镍层制作得到的金属镀膜142,底部胶层160的厚度为3μm。This embodiment provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is δ1 is 12 μm, the thickness δ2 of the first auxiliary layer 140 is 50 μm, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 3 μm, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and nickel plating layer, the thickness of the bottom adhesive layer 160 is 3 μm.
实施例9Example 9
本实施例提供一种弹性电接触端子的焊接结构,包括端子本体100和基板200;其中,第一基材132为电解铜箔,导电镀膜133为厚度大于10nm镀金层,焊接段131的厚度δ1为12μm,第一辅助层140的厚度δ2为50μm,中间胶层150选用丙烯酸压敏胶胶水,中间胶层150的厚度h1为3μm,第一辅助层140包括铜箔制作得到的第二基材141和镀镍层制作得到的金属镀膜142,底部胶层160的厚度为6μm。This embodiment provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive plating film 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is δ1 is 12 μm, the thickness δ2 of the first auxiliary layer 140 is 50 μm, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 3 μm, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and a nickel plating layer, the thickness of the bottom adhesive layer 160 is 6 μm.
对比例1Comparative example 1
本对比例提供一种弹性电接触端子的焊接结构,包括端子本体100和基板200;其中,第一基材132为电解铜箔,导电镀膜133为厚度大于10nm镀金层,焊接段131的厚度δ1为25μm,第一辅助层140的厚度δ2为30μm,中间胶层150选用丙烯酸压敏胶胶水,中间胶层150的厚度h1为6μm,第一辅助层140包括铜箔制作得到的第二基材141和镀镍层制作得到的金属镀膜142,不设置底部胶层160。This comparative example provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is δ1 is 25 μm, the thickness δ2 of the first auxiliary layer 140 is 30 μm, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 6 μm, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, there is no bottom adhesive layer 160.
对比例2Comparative example 2
本对比例提供一种弹性电接触端子的焊接结构,包括端子本体100和基板200;其中,第一基材132为电解铜箔,导电镀膜133为厚度大于10nm镀金层,焊接段131的厚度δ1为25μm,第一辅助层140的厚度δ2为110μm,中间胶层150选用丙烯酸压敏胶胶水,中间胶层150的厚度h1为6μm,第一辅助层140包括铜箔制作得到的第二基材141和镀镍层制作得到的金属镀膜142,不设置底部胶层160。This comparative example provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is δ1 is 25 μm, the thickness δ2 of the first auxiliary layer 140 is 110 μm, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 6 μm, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, there is no bottom adhesive layer 160.
对比例3Comparative example 3
本对比例提供一种弹性电接触端子的焊接结构,包括端子本体100和基板200;其中,第一基材132为电解铜箔,导电镀膜133为厚度大于10nm镀金层,焊接段131的厚度δ1为12μm,第一辅助层140的厚度δ2为35μm,中间胶层150选用丙烯酸压敏胶胶水,中间胶层150的厚度h1为6μm,第一辅助层140包括铜箔制作得到的第二基材141和镀镍层制作得到的金属镀膜142,不设置底部胶层160。This comparative example provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is δ1 is 12 μm, the thickness δ2 of the first auxiliary layer 140 is 35 μm, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 6 μm, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, there is no bottom adhesive layer 160.
对比例4Comparative example 4
本对比例提供一种弹性电接触端子的焊接结构,包括端子本体100和基板200;其中,第一基材132为电解铜 箔,导电镀膜133为厚度大于10nm镀金层,焊接段131的厚度δ1为12μm,第一辅助层140的厚度δ2为50μm,中间胶层150选用丙烯酸压敏胶胶水,中间胶层150的厚度h1为1μm,第一辅助层140包括铜箔制作得到的第二基材141和镀镍层制作得到的金属镀膜142,不设置底部胶层160。This comparative example provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is δ1 is 12 μm, the thickness δ2 of the first auxiliary layer 140 is 50 μm, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 1 μm, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, there is no bottom adhesive layer 160.
对比例5Comparative example 5
本对比例提供一种弹性电接触端子的焊接结构,包括端子本体100和基板200;其中,第一基材132为电解铜箔,导电镀膜133为厚度大于10nm镀金层,焊接段131的厚度δ1为12μm,第一辅助层140的厚度δ2为50μm,中间胶层150选用丙烯酸压敏胶胶水,中间胶层150的厚度h1为12μm,第一辅助层140包括铜箔制作得到的第二基材141和镀镍层制作得到的金属镀膜142,不设置底部胶层160。This comparative example provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is δ1 is 12 μm, the thickness δ2 of the first auxiliary layer 140 is 50 μm, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 12 μm, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, there is no bottom adhesive layer 160.
对比例6Comparative example 6
本对比例提供一种弹性电接触端子的焊接结构,包括端子本体100和基板200;其中,第一基材132为电解铜箔,导电镀膜133为厚度大于10nm镀金层,焊接段131的厚度δ1为12μm,第一辅助层140的厚度δ2为50μm,中间胶层150选用丙烯酸压敏胶胶水,中间胶层150的厚度h1为6μm,第一辅助层140包括铜箔制作得到的第二基材141和镀镍层制作得到的金属镀膜142,底部胶层160厚度为1μm。This comparative example provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is δ1 is 12 μm, the thickness δ2 of the first auxiliary layer 140 is 50 μm, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 6 μm, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and a nickel plating layer, the thickness of the bottom adhesive layer 160 is 1 μm.
对比例7Comparative example 7
本对比例提供一种弹性电接触端子的焊接结构,包括端子本体100和基板200;其中,第一基材132为电解铜箔,导电镀膜133为厚度大于10nm镀金层,焊接段131的厚度δ1为12μm,第一辅助层140的厚度δ2为50μm,中间胶层150选用丙烯酸压敏胶胶水,中间胶层150的厚度h1为6μm,第一辅助层140包括铜箔制作得到的第二基材141和镀镍层制作得到的金属镀膜142,底部胶层160厚度为12μm。This comparative example provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is δ1 is 12 μm, the thickness δ2 of the first auxiliary layer 140 is 50 μm, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 6 μm, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and a nickel plating layer, the thickness of the bottom adhesive layer 160 is 12 μm.
对比例8Comparative example 8
本对比例提供一种弹性电接触端子的焊接结构,包括端子本体100和基板200;其中,第一基材132为电解铜箔,导电镀膜133为厚度大于10nm镀金层,焊接段131的厚度δ1为12μm,第一辅助层140的厚度δ2为50μm,中间胶层150选用丙烯酸压敏胶胶水,中间胶层150的厚度h1为8μm,第一辅助层140包括铜箔制作得到的第二基材141和镀镍层制作得到的金属镀膜142,底部胶层160厚度为6μm。This comparative example provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is δ1 is 12 μm, the thickness δ2 of the first auxiliary layer 140 is 50 μm, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 8 μm, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and the metal coating 142 produced by the nickel plating layer, the thickness of the bottom adhesive layer 160 is 6 μm.
对比例9Comparative example 9
本对比例提供一种弹性电接触端子的焊接结构,包括端子本体100和基板200;其中,第一基材132为电解铜箔,导电镀膜133为厚度大于10nm镀金层,焊接段131的厚度δ1为12μm,第一辅助层140的厚度δ2为50μm,中间胶层150选用丙烯酸压敏胶胶水,中间胶层150的厚度h1为3μm,第一辅助层140包括铜箔制作得到的第二基材141和镀镍层制作得到的金属镀膜142,底部胶层160的厚度为10μm。This comparative example provides a welding structure of an elastic electrical contact terminal, including a terminal body 100 and a substrate 200; wherein the first base material 132 is an electrolytic copper foil, the conductive coating 133 is a gold plating layer with a thickness greater than 10 nm, and the thickness of the welding section 131 is δ1 is 12 μm, the thickness δ2 of the first auxiliary layer 140 is 50 μm, the middle glue layer 150 is made of acrylic pressure-sensitive glue, the thickness h1 of the middle glue layer 150 is 3 μm, and the first auxiliary layer 140 includes a second base material made of copper foil 141 and a nickel plating layer, the thickness of the bottom adhesive layer 160 is 10 μm.
对实施例1至实施例10以及对比例1至对比例8进行如下性能测试:The following performance tests were performed on Examples 1 to 10 and Comparative Examples 1 to 8:
1、抗拉力。抗拉力是指端子本体100焊接固定在基板200后,能够抵御的拉力的最大值,当受到背离基板200的力大于抗拉力时,端子本体100将从基板200上剥离,抗拉力的数值越大,表明焊接结合力越大,其可通过如拉力测试装置检测的方式确定。本申请第二方面提出的弹性电接触端子的焊接结构中,抗拉力与第一辅助层140的厚度、第一辅助层140的厚度与焊接段131的厚度值之和、中间胶层150以及底部胶层160均相关,抗拉力大于5N时,认为该抗拉力可以满足使用需求。1. Tensile strength. The tensile strength refers to the maximum value of the tensile force that the terminal body 100 can withstand after it is welded and fixed to the substrate 200. When the force away from the substrate 200 is greater than the tensile strength, the terminal body 100 will peel off from the substrate 200. The tensile strength is The larger the value, the greater the welding bonding strength, which can be determined by, for example, a tensile testing device. In the welding structure of the elastic electrical contact terminal proposed in the second aspect of the present application, the sum of the tensile strength and the thickness of the first auxiliary layer 140, the thickness of the first auxiliary layer 140 and the thickness of the welding section 131, the intermediate glue layer 150 and The bottom adhesive layer 160 is all related. When the tensile strength is greater than 5N, it is considered that the tensile strength can meet the usage requirements.
2、接触电阻。接触电阻是指焊接后的端子本体100和基板200之间的电阻值,接触电阻越小,表明端子本体100的导通效果越好,即端子本体100的接地或消除信号干扰的能力越好,可通过电阻测试的方式确定。本申请第二方面提出的弹性电接触端子的焊接结构中,接触电阻主要与中间胶层150和底部胶层160有关,接触电阻在0.3 Ω以下,认为接触电阻可以满足使用需求。2. Contact resistance. Contact resistance refers to the resistance value between the terminal body 100 and the substrate 200 after welding. The smaller the contact resistance, the better the conduction effect of the terminal body 100, that is, the better the terminal body 100's ability to ground or eliminate signal interference. This can be determined by resistance testing. In the welding structure of the elastic electrical contact terminal proposed in the second aspect of this application, the contact resistance is mainly related to the middle glue layer 150 and the bottom glue layer 160. The contact resistance is below 0.3 Ω. It is considered that the contact resistance can meet the usage requirements.
3、辅助层生产效率。在本申请第二方面提出的弹性电接触端子的焊接结构中,辅助层生产效率主要受限于第一辅助层的厚度,第一辅助层的厚度越大,辅助层生产效率越低。3. Auxiliary layer production efficiency. In the welding structure of the elastic electrical contact terminal proposed in the second aspect of this application, the production efficiency of the auxiliary layer is mainly limited by the thickness of the first auxiliary layer. The greater the thickness of the first auxiliary layer, the lower the production efficiency of the auxiliary layer.
4、焊接前稳定性。在本申请第二方面提出的弹性电接触端子的焊接结构中,焊接前稳定性是指激光焊接前焊接段31、第一辅助层130以及基板200之间的连接稳定性,焊接前稳定性主要受限于中间胶层150和底部胶层160的厚度,中间胶层150和底部胶层160的厚度越大,焊接前稳定性越好。以级别表示其大小,级别数越大,焊接前稳定性越好。4. Stability before welding. In the welding structure of the elastic electrical contact terminal proposed in the second aspect of this application, the stability before welding refers to the connection stability between the welding section 31, the first auxiliary layer 130 and the substrate 200 before laser welding. The stability before welding is mainly Limited by the thickness of the middle glue layer 150 and the bottom glue layer 160, the greater the thickness of the middle glue layer 150 and the bottom glue layer 160, the better the stability before welding. Its size is represented by levels. The larger the number of levels, the better the stability before welding.
5、材料通用性。在本申请第二方面提出的弹性电接触端子的焊接结构中,材料通用性主要指选取的中间胶层150、底部胶层160以及第一辅助层140对于各种厚度的导电层130的适用程度;其中,中间胶层150和底部胶层160可适用于各种厚度的导电层130的生产,而第一辅助层140的厚度需要保证对应的导电层130能够被激光焊接,因此材料通用性主要受限于第一辅助层140的厚度,第一辅助层140的厚度越小,能够用于生产的导电层130厚度要求越大,但导电层130的厚度上限受制于弹性端子对反弹性要求,即导电层130的厚度又需要同时满足小于等于25μm的要求,因此实际上能够生产的导电层130厚度范围越小,材料通用性越低;如35μm厚度的第一辅助层只适于具有15μm至25μm的导电层130的弹性电接触端子的生产;而50μm厚度的第一辅助层适于具有9μm至25μm任意厚度的导电层130的弹性电接触端子的生产。5. Material versatility. In the welding structure of the elastic electrical contact terminal proposed in the second aspect of this application, material versatility mainly refers to the applicability of the selected middle glue layer 150 , bottom glue layer 160 and first auxiliary layer 140 to conductive layers 130 of various thicknesses. ; Among them, the middle glue layer 150 and the bottom glue layer 160 can be suitable for the production of conductive layers 130 of various thicknesses, and the thickness of the first auxiliary layer 140 needs to ensure that the corresponding conductive layer 130 can be laser welded, so the versatility of the material is important. Limited by the thickness of the first auxiliary layer 140, the smaller the thickness of the first auxiliary layer 140, the greater the thickness requirement of the conductive layer 130 that can be used for production, but the upper limit of the thickness of the conductive layer 130 is limited by the elastic terminal's resilience requirements. That is to say, the thickness of the conductive layer 130 needs to meet the requirements of less than or equal to 25 μm at the same time. Therefore, the smaller the thickness range of the conductive layer 130 that can actually be produced, the lower the material versatility; for example, the first auxiliary layer with a thickness of 35 μm is only suitable for products with a thickness of 15 μm to The first auxiliary layer with a thickness of 50 μm is suitable for the production of elastic electrical contact terminals with a conductive layer 130 having any thickness from 9 μm to 25 μm.
实施例1至实施例9的试验结果如下表2,对比例1至对比例9的试验结果如下表3。The test results of Examples 1 to 9 are shown in Table 2 below, and the test results of Comparative Examples 1 to 9 are shown in Table 3 below.
【表2】【Table 2】
  实施例1Example 1 实施例2Example 2 实施例3Example 3 实施例4Example 4 实施例5Example 5
δ1/μmδ1/μm 2525 2525 1212 1212 1212
h1/μmh1/μm 66 66 66 66 33
δ2/μmδ2/μm 3535 100100 3838 5050 5050
δ1+δ2/μmδ1+δ2/μm 6060 125125 5050 6262 6262
h2/μmh2/μm // // // // //
h1+h2/μmh1+h2/μm 66 66 66 66 33
抗拉力/NTensile strength/N 7.57.5 15.215.2 5.55.5 8.58.5 99
接触电阻/ΩContact resistance/Ω 0.010.01 0.010.01 0.010.01 0.010.01 0.010.01
辅助层生产效率Auxiliary layer production efficiency high Low 中等medium 中等medium 中等medium
焊接前稳定性Stability before welding 二级Level 2 二级Level 2 二级Level 2 二级Level 2 一级 Level 1
材料通用性Material versatility Low high 中等medium 中等medium 中等medium
【续表2】[Continued Table 2]
  实施例6Example 6 实施例7Example 7 实施例8Example 8 实施例9Example 9
δ1/μmδ1/μm 1212 1212 1212 1212
h1/μmh1/μm 66 1010 66 66
δ2/μmδ2/μm 5050 5050 5050 5050
δ1+δ2/μmδ1+δ2/μm 6262 6262 6262 6262
h2/μmh2/μm // // 33 66
h1+h2/μmh1+h2/μm 66 1010 99 1212
抗拉力/NTensile strength/N 88 5.25.2 9.19.1 6.96.9
接触电阻/ΩContact resistance/Ω 0.020.02 0.10.1 0.10.1 0.20.2
辅助层生产效率Auxiliary layer production efficiency 中等medium 中等medium 中等medium 中等medium
焊接前稳定性Stability before welding 二级Level 2 三级Level three 三级Level three 四级Level 4
材料通用性Material versatility 中等medium 中等medium 中等medium 中等medium
【表3】【table 3】
  对比例1Comparative example 1 对比例2Comparative example 2 对比例3Comparative example 3 对比例4Comparative example 4 对比例5Comparative example 5
δ1/μmδ1/μm 2525 2525 1212 1212 1212
h1/μmh1/μm 66 66 66 11 1212
δ2/μmδ2/μm 2525 110110 2525 5050 5050
δ1+δ2/μmδ1+δ2/μm 5050 135135 3737 6262 6262
h2/μmh2/μm // // // // //
h1+h2/μmh1+h2/μm 66 66 66 11 1212
抗拉力/NTensile strength/N 3.63.6 15.215.2 1.21.2 99 2.82.8
接触电阻/ΩContact resistance/Ω 0.010.01 0.010.01 0.010.01 0.010.01 0.10.1
辅助层生产效率Auxiliary layer production efficiency 极高extremely high 极低extremely low high 中等medium 中等medium
焊接前稳定性Stability before welding 二级Level 2 二级Level 2 二级Level 2 零级Level zero 四级Level 4
材料通用性Material versatility 极低extremely low 极高extremely high Low 中等medium 中等medium
【续表3】[Continued from Table 3]
  对比例6Comparative example 6 对比例7Comparative example 7 对比例8Comparative example 8 对比例9Comparative example 9
δ1/μmδ1/μm 1212 1212 1212 1212
h1/μmh1/μm 66 66 88 1212
δ2/μmδ2/μm 5050 5050 5050 5050
δ1+δ2/μmδ1+δ2/μm 6060 6262 6262 6262
h2/μmh2/μm 11 1212 66 66
h1+h2/μmh1+h2/μm 77 1818 1414 1818
抗拉力/NTensile strength/N 88 0.70.7 2.32.3 11
接触电阻/ΩContact resistance/Ω 0.020.02 2.02.0 0.40.4 1.81.8
辅助层生产效率Auxiliary layer production efficiency 中等medium 中等medium 中等medium 中等medium
焊接前稳定性Stability before welding 二级Level 2 五级Level 5 四级Level 4 五级Level 5
材料通用性Material versatility 中等medium 中等medium 中等medium 中等medium
其中,关于第一辅助层140、中间胶层150以及底部胶层160厚度的取值,在实际生产过程中,由于相差1μm左右难以加工且效果差异并不显著,因此第一辅助层140、中间胶层150以及底部胶层160能够选择的厚度并不是连续的,而是一个个单值,如第一辅助层140的厚度选取一般以5μm或是10μm为间隔进行取值,中间胶层150和底部胶层160的厚度选取一般以2μm或3μm为间隔进行取值。Among them, regarding the values of the thickness of the first auxiliary layer 140, the middle glue layer 150 and the bottom glue layer 160, in the actual production process, since the difference is about 1 μm, it is difficult to process and the effect difference is not significant, so the first auxiliary layer 140, the middle glue layer 160 are difficult to process. The thicknesses that can be selected for the glue layer 150 and the bottom glue layer 160 are not continuous, but are single values. For example, the thickness of the first auxiliary layer 140 is generally selected at intervals of 5 μm or 10 μm. The thickness of the middle glue layer 150 and The thickness of the bottom adhesive layer 160 is generally selected at intervals of 2 μm or 3 μm.
对比实施例1至实施例9以及对比例1至对比例9,可以发现:Comparing Examples 1 to 9 and Comparative Examples 1 to 9, it can be found that:
第一,关于第一辅助层140的厚度选择:First, regarding the thickness selection of the first auxiliary layer 140:
对比实施例1、实施例2、对比例1以及对比例2可见,随着第一辅助层140厚度的增加,辅助层生产效率越低且材料通用性越高,实施例2的辅助层生产效率已经达到了一个低值,若第一辅助层140的厚度继续升高至大于100μm,如对比例2所示,则辅助层生产效率极低,不能满足辅助层生产效率需求;实施例1的材料通用性已经达到一个低值,若继续降低第一辅助层140的厚度,如对比例1所示,材料通用性极低,由于第一辅助层的厚度占第一辅助层和导电层厚度之和的比例较低,因此形成的熔池深度浅,抗拉力也非常低,不满足最基本的材料通用性和应用性能需求。Comparing Example 1, Example 2, Comparative Example 1 and Comparative Example 2, it can be seen that as the thickness of the first auxiliary layer 140 increases, the production efficiency of the auxiliary layer becomes lower and the material versatility becomes higher. The production efficiency of the auxiliary layer in Example 2 has reached a low value. If the thickness of the first auxiliary layer 140 continues to increase to greater than 100 μm, as shown in Comparative Example 2, the production efficiency of the auxiliary layer is extremely low and cannot meet the production efficiency requirements of the auxiliary layer; the material of Embodiment 1 The versatility has reached a low value. If the thickness of the first auxiliary layer 140 is continued to be reduced, as shown in Comparative Example 1, the material versatility is extremely low because the thickness of the first auxiliary layer accounts for the sum of the thickness of the first auxiliary layer and the conductive layer. The proportion of the molten pool is low, so the depth of the molten pool formed is shallow and the tensile strength is also very low, which does not meet the most basic material versatility and application performance requirements.
因此,综合考虑辅助层生产效率,抗拉力可靠性和材料通用性后,得到结论一:第一辅助层140的厚度优选为:35μm≤δ2≤100μm。Therefore, after comprehensively considering the production efficiency of the auxiliary layer, tensile strength reliability and material versatility, conclusion one is reached: the thickness of the first auxiliary layer 140 is preferably: 35 μm ≤ δ 2 ≤ 100 μm.
第二,关于第一辅助层140的厚度以及焊接段131的厚度之和:Second, regarding the sum of the thickness of the first auxiliary layer 140 and the thickness of the welding section 131:
对比实施例3、实施例4以及对比例3可见,实施例3中随着第一辅助层140和焊接段131之间的厚度之和降低至50μm时,此时抗拉力的大小为5.5N,相当接近5N,综合考虑测量误差等因素,若第一辅助层140和焊接段131之间的厚度之和继续降低至小于50μm时,如对比例3所示,抗拉力将不能满足使用需求,导致形成的弹性电 接触端子的焊接结构在使用时容易发生脱落;而实施例4中,随着第一辅助层140和焊接段131的厚度提高,抗拉力得到明显提高,满足使用需求。Comparing Example 3, Example 4 and Comparative Example 3, it can be seen that in Example 3, as the sum of the thicknesses between the first auxiliary layer 140 and the welding section 131 decreases to 50 μm, the tensile force at this time is 5.5N. , quite close to 5N. Considering factors such as measurement errors, if the sum of the thicknesses between the first auxiliary layer 140 and the welding section 131 continues to decrease to less than 50 μm, as shown in Comparative Example 3, the tensile strength will not be able to meet the use requirements. , causing the formed welded structure of the elastic electrical contact terminal to easily fall off during use; in Embodiment 4, as the thickness of the first auxiliary layer 140 and the welding section 131 increases, the tensile strength is significantly improved, meeting the usage requirements.
因此,考虑抗拉力可靠性后,得到结论二:第一辅助层140的厚度和焊接段131的厚度之和应当大于等于50μm。Therefore, after considering the tensile strength reliability, conclusion 2 is obtained: the sum of the thickness of the first auxiliary layer 140 and the thickness of the welding section 131 should be greater than or equal to 50 μm.
第三,关于中间胶层150的厚度选择:Third, regarding the thickness selection of the intermediate adhesive layer 150:
对比实施例5、实施例6以及实施例7、对比例4以及对比例5可见,随着中间胶层150厚度的增加,抗拉力逐渐降低,且焊接前稳定性也逐渐升高。其中,实施例5中,焊接前稳定性最低,若中间胶层150的厚度继续降低,如对比例4所示,焊接前稳定性达到零级,难以将第一辅助层140粘附在焊接段131上;而实施例7中,抗拉力低至5.2N,与要求的5N相当接近,如继续增大中间胶层150的厚度,如对比例5所示,抗拉力无法满足使用需求。另外,如实施例6和实施例7所示,当中间胶层150从6μm升高至10μm时,此时提升中间胶层150的厚度虽然能够提高焊接前稳定性,但对应的抗拉力的降幅较大,中间胶层150厚度提升的性价比不高。Comparing Example 5, Example 6 and Example 7, Comparative Example 4 and Comparative Example 5, it can be seen that as the thickness of the intermediate adhesive layer 150 increases, the tensile strength gradually decreases, and the stability before welding also gradually increases. Among them, in Example 5, the stability before welding is the lowest. If the thickness of the middle adhesive layer 150 continues to decrease, as shown in Comparative Example 4, the stability before welding reaches zero level, and it is difficult to adhere the first auxiliary layer 140 to the welding section. 131; in Example 7, the tensile strength is as low as 5.2N, which is quite close to the required 5N. If the thickness of the middle adhesive layer 150 is continued to be increased, as shown in Comparative Example 5, the tensile strength cannot meet the usage requirements. In addition, as shown in Embodiment 6 and Embodiment 7, when the middle glue layer 150 is increased from 6 μm to 10 μm, although increasing the thickness of the middle glue layer 150 at this time can improve the stability before welding, the corresponding tensile strength is The decrease is large, and the increase in the thickness of the middle adhesive layer by 150 is not cost-effective.
因此,综合考虑抗拉力可靠性和焊接前稳定性后,得到结论三:中间胶层150的厚度应当满足:3μm≤h1≤10μm,且更优选地,3μm≤h1≤6μm。Therefore, after comprehensively considering the tensile strength reliability and pre-welding stability, conclusion three is reached: the thickness of the intermediate adhesive layer 150 should satisfy: 3 μm ≤ h1 ≤ 10 μm, and more preferably, 3 μm ≤ h1 ≤ 6 μm.
第四,关于底部胶层160及其厚度选择:Fourth, regarding the bottom adhesive layer 160 and its thickness selection:
对比实施例4、实施例8、实施例9、对比例6、对比例7以及对比例8所示,设置底部胶层160后,焊接前稳定性得到升高,但相应的接触电阻也随之升高;随着底部胶层160厚度的升高,虽然焊接稳定性得到了进一步的提高,但抗拉力逐渐降低且接触电阻也逐渐升高。在实施例8中,若继续降低底部胶层160的厚度,如对比例6所示,则底部胶层160能够起到的提高焊接稳定性效果十分有限,底部胶层160的设置失去意义;在实施例9中,抗拉力、接触电阻以及焊接前稳定性得到了较好的平衡,能够同时满足抗拉力、接触电阻以及焊接前稳定性的要求,当继续增大底部胶层160的厚度并得到实施例10时,虽然焊接前稳定性得到了进一步提高,但此时抗拉力进一步降低和接触电阻进一步提高;当继续增大底部胶层160的厚度,如对比例7所示,虽然焊接前稳定性得到了更进一步提高,但抗拉力和接触电阻均难以满足使用需求。此外,在实施例9的基础上,增大中间胶层的厚度后,即使得中间胶层和底部胶层的厚度之和大于12μm时,如对比例8所示,将会使得抗拉力降低至不满足使用需求。As shown in Comparative Example 4, Example 8, Example 9, Comparative Example 6, Comparative Example 7 and Comparative Example 8, after setting the bottom adhesive layer 160, the stability before welding is improved, but the corresponding contact resistance also increases. increases; as the thickness of the bottom adhesive layer 160 increases, although the welding stability is further improved, the tensile strength gradually decreases and the contact resistance also gradually increases. In Embodiment 8, if the thickness of the bottom glue layer 160 is continued to be reduced, as shown in Comparative Example 6, the effect of the bottom glue layer 160 on improving welding stability is very limited, and the setting of the bottom glue layer 160 is meaningless; In Embodiment 9, the tensile strength, contact resistance and stability before welding are well balanced and can simultaneously meet the requirements of tensile strength, contact resistance and stability before welding. When the thickness of the bottom adhesive layer 160 is continued to be increased, When Example 10 was obtained, although the stability before welding was further improved, the tensile strength was further reduced and the contact resistance was further increased; when the thickness of the bottom adhesive layer 160 was continued to be increased, as shown in Comparative Example 7, although The stability before welding has been further improved, but the tensile strength and contact resistance are difficult to meet the needs of use. In addition, based on Example 9, after increasing the thickness of the middle glue layer, that is, when the sum of the thicknesses of the middle glue layer and the bottom glue layer is greater than 12 μm, as shown in Comparative Example 8, the tensile strength will be reduced. to not meet the usage requirements.
因此,综合考虑抗拉力可靠性、接触电阻以及焊接前稳定性后,得到结论四:底部胶层160的厚度应满足:3μm≤h2≤10μm,且更优选地,3μm≤h2≤6μm。Therefore, after comprehensively considering the tensile strength reliability, contact resistance and pre-welding stability, conclusion 4 is reached: the thickness of the bottom adhesive layer 160 should satisfy: 3 μm ≤ h2 ≤ 10 μm, and more preferably, 3 μm ≤ h2 ≤ 6 μm.
第五,关于中间胶层150的厚度和底部胶层160的厚度之和:Fifth, regarding the sum of the thickness of the middle glue layer 150 and the thickness of the bottom glue layer 160:
对比实施例9、对比例7以及对比例9所示,实施例9中,抗拉力、接触电阻以及焊接前稳定性得到了较好的平衡,能够同时满足抗拉力、接触电阻以及焊接前稳定性的要求,此时,无论是继续增大中间胶层150的厚度还是继续增大底部胶层160的厚度,如对比例7和对比例9所示,虽然焊接前稳定性都得到了进一步提高,但抗拉力和接触电阻均难以满足使用需求。As shown in Comparative Example 9, Comparative Example 7 and Comparative Example 9, in Example 9, the tensile strength, contact resistance and pre-welding stability are well balanced, and can simultaneously satisfy the tensile strength, contact resistance and pre-welding stability. Stability requirements, at this time, whether it is to continue to increase the thickness of the middle glue layer 150 or the bottom glue layer 160, as shown in Comparative Example 7 and Comparative Example 9, although the stability before welding has been further improved Improved, but the tensile strength and contact resistance are difficult to meet the needs of use.
综合考虑抗拉力可靠性、接触电阻、焊接前稳定性、结论三以及结论四后,得到结论五:中间胶层150的厚度和底部胶层的厚度之和应满足:h1+h2≤12μm。After comprehensively considering the tensile strength reliability, contact resistance, pre-welding stability, conclusion three and conclusion four, conclusion five is obtained: the sum of the thickness of the middle adhesive layer 150 and the thickness of the bottom adhesive layer should satisfy: h1+h2≤12μm.
请参阅图5,本申请第三方面还提出一种电子设备,包括显示屏300和本申请第二方面提出的弹性电接触端子的焊接结构;导电层130夹持于显示屏300和基板200之间。Please refer to Figure 5. The third aspect of this application also proposes an electronic device, including a display screen 300 and a welding structure of elastic electrical contact terminals proposed in the second aspect of this application; the conductive layer 130 is sandwiched between the display screen 300 and the substrate 200. between.
本申请提出的电子设备,可以是任何需要避免信号干扰或消除电子设备内部静音的电子设备,如手机、平板电脑等;显示屏300和基板200指代电子设备中需要进行弹性电接触的两个结构。The electronic device proposed in this application can be any electronic device that needs to avoid signal interference or eliminate internal silence of the electronic device, such as mobile phones, tablet computers, etc.; the display screen 300 and the substrate 200 refer to the two parts of the electronic device that require elastic electrical contact. structure.
本申请提出的电子设备,弹性电接触端子的焊接段131和基板200之间通过激光焊接,生产成本低。In the electronic device proposed in this application, the welding section 131 of the elastic electrical contact terminal and the substrate 200 are welded by laser, so the production cost is low.
本申请提出的电子设备,包括第二方面提出的弹性电接触端子的焊接结构,而本申请第二方面提出的弹性电接触端子的焊接结构中,导电层130和基板200之间通过第一方面的焊接方法焊接为一体,因此具有第一方面提出的焊接方法和第二方面提出的弹性电接触端子的焊接结构的全部有益效果,在此不再赘述。The electronic device proposed in this application includes the welding structure of the elastic electrical contact terminal proposed in the second aspect. In the welding structure of the elastic electrical contact terminal proposed in the second aspect of this application, the conductive layer 130 and the substrate 200 are connected by the first aspect. The welding method is welded into one body, so it has all the beneficial effects of the welding method proposed in the first aspect and the welding structure of the elastic electrical contact terminal proposed in the second aspect, which will not be described again here.
本说明书参考附图来公开本申请,并且还使本领域中的技术人员能够实施本申请,包括制造和使用任何装置或系统、采用合适的材料以及使用任何结合的方法。本申请的范围由请求保护的技术方案限定,并且包括本领域中的技术人员想到的其他实例。只要此类其他实例包括并非不同于请求保护的技术方案字面语言的结构元件,或此类其他实例包含与请求保护的技术方案的字面语言没有实质性区别的等价结构元件,则此类其他实例应当被认为处于本申请请求保护的技术方案所确定的保护范围内。This specification discloses the application with reference to the accompanying drawings, and also enables any person skilled in the art to practice the application, including making and using any devices or systems, employing suitable materials and using any combined methods. The scope of the application is defined by the claimed technology, and includes other examples that occur to those skilled in the art. So long as such other examples include structural elements that are not different from the literal language of the claimed technical solution, or such other examples include equivalent structural elements that are not substantially different from the literal language of the claimed technical solution, then such other examples are It should be considered to be within the protection scope determined by the technical solution claimed in this application.

Claims (19)

  1. 一种焊接方法,用于焊接互为不同金属材料的第一构件与第二构件,所述第一构件的厚度δ1小于等于25μm,其特征在于,包括:A welding method for welding a first component and a second component that are made of different metal materials. The thickness δ1 of the first component is less than or equal to 25 μm, which is characterized by including:
    将所述第一构件叠设于所述第二构件上;Stack the first component on the second component;
    通过中间胶层在所述第一构件的上表面粘附第一辅助层,所述第一辅助层的激光吸收率大于所述第一构件;其中,所述第一辅助层的厚度δ2在35μm至100μm之间,通过切割厚度与所述第一辅助层对应的胚料,以得到所述第一辅助层;所述第一构件的厚度δ1和所述第一辅助层的厚度δ2之和大于等于50μm;A first auxiliary layer is adhered to the upper surface of the first component through an intermediate glue layer. The laser absorption rate of the first auxiliary layer is greater than that of the first component; wherein the thickness δ2 of the first auxiliary layer is 35 μm. to 100 μm, by cutting the blank material with a thickness corresponding to the first auxiliary layer to obtain the first auxiliary layer; the sum of the thickness δ1 of the first member and the thickness δ2 of the first auxiliary layer is greater than equal to 50μm;
    利用激光焊接装置发射激光,使得激光依次穿过所述第一辅助层、所述第一构件以及所述第二构件,以激光焊接所述第一构件和所述第二构件。A laser welding device is used to emit laser light so that the laser light passes through the first auxiliary layer, the first component and the second component in order to laser weld the first component and the second component.
  2. 根据权利要求1所述的焊接方法,其特征在于,设所述中间胶层的厚度为h1,3μm≤h1≤10μm。The welding method according to claim 1, wherein the thickness of the intermediate adhesive layer is h1, and 3 μm≤h1≤10 μm.
  3. 根据权利要求2所述的焊接方法,其特征在于,3μm≤h1≤6μm。The welding method according to claim 2, characterized in that 3μm≤h1≤6μm.
  4. 根据权利要求1所述的焊接方法,其特征在于,所述第一辅助层包括第二基材和镀设于所述第二基材上表面上并用于吸收激光能量的金属镀膜,所述金属镀膜的激光吸收率分别大于所述第一构件和所述第二基材的激光吸收率。The welding method according to claim 1, wherein the first auxiliary layer includes a second base material and a metal coating plated on the upper surface of the second base material and used to absorb laser energy, and the metal The laser absorption rate of the coating is greater than the laser absorption rate of the first component and the second substrate respectively.
  5. 根据权利要求1所述的焊接方法,其特征在于,所述中间胶层为丙烯酸压敏胶胶水、环氧热熔胶水、聚氨酯热固胶、聚氨酯热塑胶以及硅胶中的其中一种。The welding method according to claim 1, wherein the intermediate glue layer is one of acrylic pressure-sensitive glue, epoxy hot melt glue, polyurethane thermosetting glue, polyurethane thermoplastic glue and silicone glue.
  6. 根据权利要求1所述的焊接方法,其特征在于,在所述通过所述中间胶层在所述第一构件的上表面粘附第一辅助层前,还包括:The welding method according to claim 1, characterized in that before adhering the first auxiliary layer to the upper surface of the first component through the intermediate adhesive layer, it further includes:
    对所述第一构件的上表面和/或所述第一辅助层的下表面进行粗化处理。The upper surface of the first member and/or the lower surface of the first auxiliary layer is roughened.
  7. 根据权利要求1所述的焊接方法,其特征在于,所述将所述第一构件叠设于所述第二构件上具体包括:The welding method according to claim 1, wherein said stacking the first component on the second component specifically includes:
    在所述第一构件的下表面上设置底部胶层,所述第一构件通过所述底部胶层粘合于所述第二构件上。A bottom glue layer is provided on the lower surface of the first component, and the first component is bonded to the second component through the bottom glue layer.
  8. 根据权利要求7所述的焊接方法,其特征在于,设所述底部胶层的厚度为h2,3μm≤h2≤10μm。The welding method according to claim 7, wherein the thickness of the bottom adhesive layer is h2, 3 μm≤h2≤10 μm.
  9. 根据权利要求8所述的焊接方法,其特征在于,3μm≤h2≤6μm。The welding method according to claim 8, characterized in that 3μm≤h2≤6μm.
  10. 根据权利要求7所述的焊接方法,其特征在于,设所述中间胶层的厚度为h1,设所述底部胶层的厚度为h2,h1+h2≤12μm。The welding method according to claim 7, wherein the thickness of the middle glue layer is h1, the thickness of the bottom glue layer is h2, and h1+h2≤12 μm.
  11. 根据权利要求7所述的焊接方法,其特征在于,所述底部胶层为丙烯酸压敏胶胶水、环 氧热熔胶水、聚氨酯热固胶、聚氨酯热塑胶以及硅胶中的其中一种。The welding method according to claim 7, wherein the bottom glue layer is one of acrylic pressure-sensitive glue, epoxy hot melt glue, polyurethane thermosetting glue, polyurethane thermoplastic glue and silicone glue.
  12. 根据权利要求7所述的焊接方法,其特征在于,在所述第一构件的下表面上设置所述底部胶层前,还包括:The welding method according to claim 7, characterized in that, before setting the bottom adhesive layer on the lower surface of the first component, it further includes:
    对所述第一构件的下表面进行粗化处理。The lower surface of the first component is roughened.
  13. 根据权利要求1至12任一项所述的焊接方法,其特征在于,在所述通过所述中间胶层在所述第一构件的上表面粘附第一辅助层后,还包括:The welding method according to any one of claims 1 to 12, characterized in that after adhering the first auxiliary layer to the upper surface of the first component through the intermediate adhesive layer, it further includes:
    利用刀具在所述第一辅助层的上表面施加朝向所述第一构件的作用力,驱使所述第一辅助层和所述第一构件同时向下凹陷,直至形成从所述第一辅助层的上表面贯穿至所述第一构件的下表面的切口,所述切口呈宽度从上至下逐渐减小的楔形,所述第一辅助层沿所述切口的顶部边缘形成有折弯,所述折弯沿所述切口的内周壁向下延伸,且所述折弯的末端外扩至包裹所述第一构件的下表面。Use a tool to apply a force toward the first member on the upper surface of the first auxiliary layer, driving the first auxiliary layer and the first member to dent downward at the same time until a layer from the first auxiliary layer is formed. The upper surface of the incision penetrates to the lower surface of the first member. The incision is in the shape of a wedge with a gradually decreasing width from top to bottom. The first auxiliary layer is formed with a bend along the top edge of the incision, so The bend extends downward along the inner peripheral wall of the cutout, and the end of the bend extends outward to wrap the lower surface of the first member.
  14. 一种弹性电接触端子的焊接结构,其特征在于,包括:A welding structure of elastic electrical contact terminals, which is characterized by including:
    端子本体,所述端子本体包括弹性芯部和包裹在所述弹性芯部外周上的导电层,所述导电层具有向外延伸突出并形成焊接段的端部,所述导电层的厚度为9μm~25μm;和Terminal body, the terminal body includes an elastic core and a conductive layer wrapped around the outer circumference of the elastic core. The conductive layer has an end that extends outward and forms a welding section. The thickness of the conductive layer is 9 μm. ~25μm; and
    基板,所述导电层和所述基板互为不同的金属材料;A substrate, the conductive layer and the substrate are made of different metal materials;
    所述焊接段通过如权利要求1-13中任一项所述的焊接方法焊接于所述基板上,其中,以所述焊接段作为所述第一构件,以所述基板作为所述第二构件。The welding section is welded to the substrate by the welding method according to any one of claims 1 to 13, wherein the welding section is used as the first component, and the substrate is used as the second component. member.
  15. 根据权利要求14所述的弹性电接触端子的焊接结构,其特征在于,所述基板为铝板。The welding structure of elastic electrical contact terminals according to claim 14, wherein the base plate is an aluminum plate.
  16. 根据权利要求14所述的弹性电接触端子的焊接结构,其特征在于,所述导电层包括第一基材和镀设于所述第一基材外侧面的导电镀膜;其中,所述第一基材包括铜,导电镀膜的抗氧化能力优于第一基材。The welding structure of elastic electrical contact terminals according to claim 14, wherein the conductive layer includes a first base material and a conductive coating plated on the outer surface of the first base material; wherein, the first base material The base material includes copper, and the anti-oxidation ability of the conductive coating is better than that of the first base material.
  17. 根据权利要求16所述的弹性电接触端子的焊接结构,其特征在于,所述第一基材为电解铜箔或者压延铜箔,所述导电镀膜为厚度>10nm的金层或厚度>0.3μm的镍层或厚度大于0.1μm的锡层。The welding structure of elastic electrical contact terminals according to claim 16, characterized in that the first base material is electrolytic copper foil or rolled copper foil, and the conductive coating is a gold layer with a thickness >10 nm or a thickness >0.3 μm. A nickel layer or a tin layer with a thickness greater than 0.1μm.
  18. 根据权利要求16所述的弹性电接触端子的焊接结构,其特征在于,所述第一辅助层包括第二基材和镀设于所述第二基材上表面的金属镀膜,所述中间胶层设于所述第一基材的上表面与所述第二基材的下表面之间,所述第二基材包括铜,所述金属镀膜包括镍。The welding structure of elastic electrical contact terminals according to claim 16, wherein the first auxiliary layer includes a second base material and a metal coating plated on the upper surface of the second base material, and the intermediate glue The layer is provided between the upper surface of the first substrate and the lower surface of the second substrate, the second substrate includes copper, and the metal plating film includes nickel.
  19. 一种电子设备,其特征在于,包括显示屏和如权利要求14至18任一项所述的弹性电接触端子的焊接结构;所述导电层夹持于所述显示屏和所述基板之间。An electronic device, characterized in that it includes a display screen and a welding structure of an elastic electrical contact terminal according to any one of claims 14 to 18; the conductive layer is sandwiched between the display screen and the substrate .
PCT/CN2022/105628 2022-03-28 2022-07-14 Welding method, welding structure of elastic electric contact terminal, and electronic device WO2023184788A1 (en)

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