WO2023178683A1 - High electron mobility transistor, doherty power amplifier and electronic device - Google Patents

High electron mobility transistor, doherty power amplifier and electronic device Download PDF

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Publication number
WO2023178683A1
WO2023178683A1 PCT/CN2022/083158 CN2022083158W WO2023178683A1 WO 2023178683 A1 WO2023178683 A1 WO 2023178683A1 CN 2022083158 W CN2022083158 W CN 2022083158W WO 2023178683 A1 WO2023178683 A1 WO 2023178683A1
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Prior art keywords
drain
power amplifier
layer
electron mobility
high electron
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PCT/CN2022/083158
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French (fr)
Chinese (zh)
Inventor
丁瑶
汤岑
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华为技术有限公司
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Priority to PCT/CN2022/083158 priority Critical patent/WO2023178683A1/en
Publication of WO2023178683A1 publication Critical patent/WO2023178683A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/778Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F1/00Details of amplifiers with only discharge tubes, only semiconductor devices or only unspecified devices as amplifying elements
    • H03F1/02Modifications of amplifiers to raise the efficiency, e.g. gliding Class A stages, use of an auxiliary oscillation

Definitions

  • This application relates to the field of semiconductor technology, and in particular to a high electron mobility transistor, a Doherty power amplifier and electronic equipment.
  • Doherty power amplifier is a high-power amplifier currently widely used in wireless communication systems.
  • the Doherty power amplifier includes at least two power amplifier circuits, and each power amplifier circuit is equipped with a power amplifier. Since power amplifiers located in different channels use different dies and need to configure gate voltages separately, this leads to a series of problems such as complex peripheral circuits, poor consistency in mass production, and high costs.
  • Embodiments of the present application provide a high electron mobility transistor, a Doherty power amplifier and electronic equipment, which can reduce the number of dies used in the Doherty power amplifier.
  • the present application provides a high electron mobility transistor, including a substrate and a first channel layer, a first barrier layer, a second channel layer, and a second barrier layer that are stacked from bottom to top on the substrate. , cap layer.
  • the first barrier layer is located on a side of the first channel layer away from the substrate, and the second barrier layer is located on a side of the second channel layer away from the substrate.
  • the transistor also includes a gate electrode, a source electrode, a first drain electrode, and a second drain electrode.
  • the cap layer is disposed on a side of the second barrier layer away from the substrate, the source electrode, the gate electrode, and the second drain electrode are disposed on the cap layer, and the first drain electrode is disposed on the first channel layer and connected with the first channel layer.
  • the channel layer is electrically connected
  • the second drain electrode is electrically connected to the second channel layer
  • the source electrode is electrically connected to both the first channel layer and the second channel layer.
  • the above-mentioned high electron mobility transistor can form multiple channels (including the first channel and the second channel) by repeatedly setting the channel layer and the barrier layer, thereby breaking through the theoretical limit of single-channel devices and maintaining high
  • the electron mobility also increases the areal density of the two-dimensional electron gas in the channel.
  • this multi-channel HEMT can effectively reduce the on-resistance and increase the device power density.
  • two signal paths that do not interfere with each other can be formed, so that one bare chip can meet the needs of multiple amplification tubes in the Doherty power amplifier, while also avoiding the need for multiple amplification tubes.
  • the gate voltage of the tube is configured independently, thus simplifying the circuit complexity of the Doherty power amplifier and reducing the cost.
  • the first drain electrode is in ohmic contact with the first channel layer; the second drain electrode is in ohmic contact with the second channel layer; and the source electrode is in ohmic contact with both the first channel layer and the second channel layer. touch.
  • ways to achieve ohmic contact may include etching ohmic contact, implanting ohmic contact, and high-temperature metal ohmic contact.
  • a first insertion layer is provided between the first channel layer and the first barrier layer; a second insertion layer is provided between the second channel layer and the second barrier layer; by inserting
  • the arrangement of layers can improve the electron mobility of the two-dimensional electron gas generated at the channel.
  • a nucleation layer and a buffer layer are provided between the substrate and the first channel layer; the nucleation layer is close to the substrate relative to the buffer layer.
  • the high electron mobility transistor is a GaN HEMT.
  • An embodiment of the present application also provides a Doherty power amplifier, which includes a main power amplifier circuit and an auxiliary power amplifier circuit.
  • the main power amplifier circuit includes a first amplifier tube, which is used to amplify the signal input to the main power amplifier circuit.
  • the auxiliary power amplifier circuit includes a second amplifier tube, and the second amplifier tube is used to amplify the signal input to the auxiliary power amplifier circuit.
  • the first amplifying tube and the second amplifying tube multiplex the high electron mobility transistor provided in any of the aforementioned possible implementation methods.
  • the source electrode of the high electron mobility transistor serves as the source electrode of the first amplifier tube and the second amplifier tube.
  • the gate electrode of the high electron mobility transistor serves as the gate electrode of the first amplifier tube and the second amplifier tube.
  • the first drain of the high electron mobility transistor serves as the drain of the first amplifier tube.
  • the second drain of the high electron mobility transistor serves as the drain of the second amplifier tube.
  • a dual-channel high electron mobility transistor is used to replace the two amplifiers in the main power amplifier circuit and the auxiliary power amplifier circuit, and the auxiliary power amplifier is controlled by reasonably setting the distance between the two channels.
  • the gate voltage of the amplifier tube in the circuit is turned on, thus forming two signal paths that do not interfere with each other to meet the needs of the two power amplifier circuits.
  • the transistor can use one bare chip to meet the needs of multiple power amplifiers. It also avoids the need to separately configure gate voltages for multiple power amplifiers, thereby simplifying the circuit complexity of the Doherty power amplifier and reducing costs. .
  • the source of the high electron mobility transistor is connected to the ground terminal; after the input signal of the gate of the high electron mobility transistor is amplified by the first amplifying tube and the second amplifying tube, it passes through the first amplifying tube respectively. drain and 2nd drain output.
  • the Doherty power amplifier further includes: a third amplification tube, a fourth amplification tube, a first microstrip line, a second microstrip line, and a third microstrip line.
  • the first drain is connected to the gate of the third amplifier tube
  • the drain of the third amplifier tube is connected to the combining point through the first microstrip line
  • the source of the third amplifier tube is connected to the ground.
  • the second drain is connected to the gate of the fourth amplifier tube through the second microstrip line
  • the drain of the fourth amplifier tube is connected to the combining point
  • the source of the fourth amplifier tube is connected to the ground.
  • the combining point is connected to the output of the Doherty power amplifier through a third microstrip line.
  • the Doherty power amplifier is an E-Doherty architecture.
  • the high electron mobility transistor includes a plurality of transistor units arranged in sequence and in parallel.
  • the plurality of transistor units include a first transistor unit, a second transistor unit, and a third transistor unit that are arranged adjacently in sequence.
  • the first transistor unit and the second transistor unit share the same source, and the first transistor unit and the second transistor unit are symmetrically arranged along the source.
  • the second transistor unit and the third transistor unit share the same first drain, and the second transistor unit and the third transistor unit are symmetrical along the first drain.
  • the second drain electrode is located in a region between the source electrode and the first drain electrode
  • the gate electrode is located in a region between the source electrode and the second drain electrode.
  • An embodiment of the present application provides an electronic device, including a transmitter; the transmitter adopts the Doherty power amplifier provided in any of the above possible implementation methods.
  • Figure 1 is a schematic circuit diagram of a Doherty power amplifier provided by an embodiment of the present application.
  • Figure 2 is a schematic structural diagram of a high electron mobility transistor provided in the prior art
  • Figure 3 is a schematic structural diagram of a high electron mobility transistor provided by an embodiment of the present application.
  • Figure 4 is a schematic structural diagram of a high electron mobility transistor provided by an embodiment of the present application.
  • FIG. 5 is a schematic layout design diagram of a high electron mobility transistor used in a Doherty power amplifier according to an embodiment of the present application.
  • At least one of the following” or similar expressions thereof refers to any combination of these items, including any combination of a single item (items) or a plurality of items (items).
  • at least one of a, b or c can mean: a, b, c, "a and b", “a and c", “b and c", or "a and b and c” ”, where a, b, c can be single or multiple.
  • “Installation”, “connection”, “connection”, etc. should be understood in a broad sense.
  • it can be a fixed connection, a detachable connection, or an integral connection; it can be a direct connection, or an indirect connection through an intermediary, or it can be It is the internal connection between two components.
  • the terms “including” and “having” and any variations thereof are intended to cover a non-exclusive inclusion, for example, the inclusion of a series of steps or units. Methods, systems, products or devices are not necessarily limited to those steps or elements expressly listed, but may include other steps or elements not expressly listed or inherent to such processes, methods, products or devices. "Up”, “down”, “left”, “right”, “top”, “bottom”, etc. are only used relative to the orientation of the components in the drawings. These directional terms are relative concepts. Relative descriptions and clarifications are used, which may vary accordingly depending on changes in the orientation in which components in the drawings are placed.
  • An embodiment of the present application provides an electronic device, which is provided with a transmitter, and a Doherty power amplifier is used in the transmitter.
  • the Doherty power amplifier adopts a new multi-channel high-voltage amplifier tube as the amplifier tube in the multi-channel power amplifier circuit.
  • Replacement with high electron mobility transistor (HEMT) is equivalent to using one bare chip to meet the needs of multiple amplifier tubes. It also avoids the need to separately configure gate voltages for multiple amplifier tubes, thereby simplifying the Doherty power amplifier.
  • the circuit complexity is reduced and the cost is reduced.
  • the electronic device can be a mobile phone, a tablet computer, a notebook, a car computer, a smart watch, a smart bracelet, a radar, a base station and other electronic products.
  • the Doherty power amplifier provided by this application includes an input terminal IN, an output terminal OUT, and multiple power amplifier circuits connected between the input terminal IN and the output terminal OUT, such as main power amplifier circuit 1 (main) and Auxiliary power amplifier circuit 2 (peak).
  • the multi-channel power amplifier circuit in the Doherty power amplifier usually includes a main power amplifier circuit (main), and at least one auxiliary power amplifier circuit (peak) in addition to the main power amplifier circuit (main).
  • main main
  • auxiliary auxiliary power amplifier circuit
  • the embodiment of the present application is explained by taking a main power amplifier circuit (main) and an auxiliary power amplifier circuit 2 as an example.
  • the Doherty power amplifier may include two or more auxiliary power amplifier circuits (peaks).
  • the main power amplifier circuit 1 (main) includes a first amplifier tube D_1 (driver main), and the signal input to the main power amplifier circuit 1 is amplified through the first amplifier tube D_1.
  • the auxiliary power amplifier circuit 2 (peak) includes a second amplifier tube D_2 (driver peak), and the signal input to the auxiliary power amplifier circuit 2 is amplified through the second amplifier tube D_2.
  • a dual-channel transistor is used to replace the first amplifier tube D_1 and the second amplifier tube D_2.
  • the dual-channel transistor includes a gate, a source, a first The drain electrode and the second drain electrode; the first drain electrode and the second drain electrode are respectively connected to two different channels.
  • the first drain of the dual-channel transistor (HEMT) serves as the drain of the first amplifying tube D_1; the second drain of the dual-channel transistor (HEMT) serves as the drain of the second amplifying tube D_2.
  • the gate electrode of the dual-channel transistor (HEMT) serves as the gate electrode of the first amplifier tube D_1 and the second amplifier tube D_2, and the source electrode of the dual-channel transistor (HEMT) serves as the gate electrode of the first amplifier tube D_1 and the second amplifier tube D_2.
  • the sources of tube D_2 are the same, and the sources of the dual-channel transistor (HEMT) are multiplexed.
  • the source of the dual-channel transistor can be connected to the ground, the gate is connected to the input terminal IN of the Doherty power amplifier, and the first drain and the second drain are related
  • the circuit is connected to the output terminal OUT of the Doherty power amplifier.
  • a dual-channel transistor is used to replace the two amplifier tubes (D_1, D_2) in the main power amplifier circuit 1 and the auxiliary power amplifier circuit 2.
  • the channel transistor can use one bare chip to meet the needs of multiple power amplifiers. It also avoids the need to separately configure gate voltages for multiple power amplifiers, thereby simplifying the circuit complexity of the Doherty power amplifier and reducing costs.
  • FIG. 1 is only a schematic illustration using a dual-channel high electron mobility transistor (HEMT) to replace the amplifier tubes in the two-way power amplifier circuit.
  • the transistor may be provided with three or more channels, thereby enabling the replacement of amplifier tubes in three or more power amplifier circuits.
  • HEMT high electron mobility transistor
  • this application does not limit the architecture of the Doherty power amplifier.
  • the amplifier tubes in the multi-channel power amplifier circuit have in-phase input signals, they can be replaced by high electron mobility transistors (HEMTs) provided in the embodiments of this application.
  • HEMTs high electron mobility transistors
  • the Doherty power amplifier can be an E-Doherty architecture (enhance Doherty).
  • the Doherty power amplifier may include a third amplification tube D_3, a fourth amplification tube D_4, a first microstrip line 10, a second microstrip line 20, and a third microstrip line 30.
  • the drain of the first amplifier tube D_1 (that is, the first drain) is connected to the gate of the third amplifier tube D_3.
  • the drain of the third amplifier tube D_3 is connected to the combining point O through the first microstrip line 10.
  • the source of the third amplifier tube D_3 is connected to the ground; the drain of the second amplifier tube D_2 (that is, the second drain) is connected to the gate of the fourth amplifier tube D_4 through the second microstrip line 20.
  • the drain of D_4 is connected to the combining point O, and the source of the fourth amplifier tube D_4 is connected to the ground; the combining point O is connected to the output terminal OUT of the Doherty power amplifier through the third microstrip line 30 .
  • the first amplifier tube D_1 and the second amplifier tube D_2 have the same phase input signal, so a dual-channel HEMT can be used instead.
  • the signal input by the main power amplifier circuit 1 is amplified by the first amplifier tube D_1, further amplified by the third amplifier tube D_3, and impedance transformed through the first microstrip line 10 and output to the combining point. O.
  • the signal input to the auxiliary power amplifier circuit 2 is amplified by the second amplifier tube D_2, phase compensated through the second microstrip line 20, and then amplified by the fourth amplifier tube D_4 before being output to the combining point O.
  • the signals of the two power amplifier circuits (1, 2) undergo impedance transformation through the third microstrip line 30 after the combining point O and are output to the output terminal OUT of the Doherty power amplifier.
  • the total phase of the first power amplifier circuit 1 (including D_1, D_3, 10) and the total phase of the second power amplifier circuit 2 (including D_2, D_4, 20) are basically the same.
  • the input terminals may be correlated through an input matching circuit.
  • the circuit connection, the output terminal can be related to the circuit connection through the output matching circuit.
  • the order of turning on the driving power amplifiers is different.
  • the main power amplifier circuit main
  • the auxiliary power amplifier circuit peak
  • the distance between multiple channels can be designed according to actual needs to meet the control signal requirements of the multi-channel power amplifier circuit.
  • HEMT high electron mobility transistor
  • FIG 2 is a schematic structural diagram of a traditional single-channel electron mobility transistor (HEMT).
  • HEMT single-channel electron mobility transistor
  • a channel layer and a barrier layer are provided in a single-channel HEMT, and a two-dimensional electron gas is generated at the interface between the channel layer and the barrier layer (ie, the heterojunction interface) (2-dimension electron gas, 2DEG) forms channel 100.
  • 2DEG 2-dimension electron gas
  • the multi-channel HEMT used in the embodiment of the present application forms multiple channels (such as 101, 102) by repeatedly growing channel layers and barrier layers in the epitaxial structure.
  • multiple channels such as 101, 102
  • 2DEG two-dimensional electron gas
  • the lower channel i.e. the side closest to the substrate
  • the upper channel is relatively different from the lower channel It opens later, so the upper channel can be used for the auxiliary power amplifier circuit 2 (peak), and by reasonably setting the distance between adjacent channels, the turn-on gate voltage of the driving power amplifier in the auxiliary power amplifier circuit (peak) is controlled, thereby Two signal paths that do not interfere with each other are formed to meet the needs of the two power amplifier circuits (1, 2).
  • the embodiment of the present application provides a dual-channel HEMT.
  • the transistor includes a substrate 11 (substrate), a nucleation layer 12 (nucleation), and a buffer layer 13 sequentially provided on the substrate 11. (buffer), first channel layer 21 (channel), first barrier layer 31 (barrier), second channel layer 22 (channel), second barrier layer 32 (barrier), cap layer 40 (cap) .
  • the interface between the first channel layer 21 and the first barrier layer 31 forms the first channel 101
  • the interface between the second channel layer 22 and the second barrier layer 32 forms the second channel 102 .
  • the transistor also includes a gate G, a source S, a first drain D1, and a second drain D2.
  • the first drain D1 is electrically connected to the first channel layer 21
  • the second drain D2 is electrically connected to the second channel layer 22 .
  • the first drain electrode D1 may be disposed on the first channel layer 21 to form an electrical connection with the first channel layer 21 .
  • the gate G, the source S, and the second drain D2 may be disposed on the cap layer 40 , and the second drain D2 and the second channel layer 22 are electrically connected through ion implantation.
  • the source S is electrically connected to the first channel layer 21 and the second channel layer 22 through ion implantation.
  • the first drain D1 is equivalent to the drain of the aforementioned first amplifier tube D_1
  • the second drain D2 is equivalent to the second amplifier tube D_1.
  • This dual-channel HEMT can transform the traditional planar layout into a vertical layout.
  • the dual-channel HEMT can replace the two amplifier tubes (D_1, D_2). In this way, a bare One chip can meet the needs of two driving power amplifiers, and at the same time, it avoids the need to separately configure the gate voltage for the two power amplifier circuits, simplifying the circuit complexity of the Doherty power amplifier and reducing the production cost.
  • the voltage between the two drains (D1, D2) and the source S makes the voltage between the two channels (101, 102)
  • a lateral electric field is generated within the device, and under the action of the lateral electric field, the two-dimensional electron gas (2DEG) is transmitted along the two heterojunction interfaces to form a drain output current (as indicated by the arrow in Figure 3).
  • the depth of the potential well in the heterojunction can be controlled, and the surface density of the two-dimensional electron gas (2DEG) in the channel (101, 102) can be changed, thereby controlling the two drains (D1, 102). D2) output current.
  • first drain D1 and the first channel layer 21 may be arranged to form an ohmic contact, thereby ensuring the electrical connection between the first drain D1 and the first channel 101 .
  • second drain electrode D2 can be arranged to form ohmic contact with the second channel layer 22
  • the source electrode S can form ohmic contact with the first channel layer 21 and the second channel layer 22 .
  • the method of realizing ohmic contact between the source S, the drain (D1, D2) and the channel layer (21, 22) may include but is not limited to etching ohms, implanting ohms, and high-temperature metal ohms.
  • the first drain electrode D1 can be connected to the surface of the first channel layer 21 in an etched ohmic contact manner, and the second drain electrode D2 can be connected to the second drain electrode D2 by etching ohmic contact.
  • the surface of the channel layer 22 is connected by implanting ohmic contact, and the source S is connected with the first channel layer 21 and the second channel layer 22 by implanting ohmic contact.
  • an etching process can be used to remove the film layer above the first channel layer 21 to leak the surface of the first channel layer 21 , and perform the first drain electrode in the leakage area of the first channel layer 21 .
  • the fabrication of D1 ensures ohmic contact between the first drain electrode D1 and the surface of the first channel layer 21 .
  • An implantation process is used to perform ion implantation at a position below the source S to form an implantation region a1.
  • the source S forms ohmic contact with the first channel layer 21 and the second channel layer 22 in the implantation region a1.
  • An implantation process is used to perform ion implantation at a position below the second drain electrode D2 to form an implantation region a2.
  • the second drain electrode D2 forms an ohmic contact with the second channel layer 22 through the implantation region a2.
  • a first insertion layer n1 may be provided between the first channel layer 21 and the first barrier layer 31 , and between the second channel layer 22 and the second A second insertion layer n2 is provided between the barrier layers 32.
  • the electron mobility of the 2DEG generated at the channel (101, 102) can be improved by the arrangement of the insertion layer (n1, n2).
  • this application does not impose restrictions on the materials used for the above-mentioned substrate 11 and other related film layers in the transistor. In practice, they can be set as needed.
  • the substrate 11 can be made of materials including but not limited to SiC, Si, GaN, GaAs, InP, etc.
  • the nucleation layer 12 can be made of materials including but not limited to AlN, InAlN, InGaN, ScAlN and the like.
  • the buffer layer 13 may be made of materials including but not limited to AlN, GaN, InAlN, InGaN, ScAlN, etc.
  • the channel layers (21, 22) can use materials including but not limited to AlN, GaN, InAlN, InGaN, ScAlN and the like.
  • the above-mentioned transistors may be GaN HEMTs, and the channel layers (21, 22) may be GaN.
  • the barrier layers (31, 32) can use materials including but not limited to AlN, GaN, InAlN, InGaN, ScAlN and the like.
  • the insertion layer (n1, n2) can use materials including but not limited to AlN, GaN, InAlN, InGaN, ScAlN and other materials.
  • the cap layer 40 may be made of materials including but not limited to SiN, GaN, AIN, InAlN, InGaN, ScAlN, and the like.
  • both Figures 3 and 4 are schematically illustrated by taking the HEMT adopting a dual-channel structure as an example, but the application is not limited thereto. In some possible implementation methods, the HEMT also adopts a three-channel structure. , four-channel structure, etc., which can be applied to multi-channel Doherty power amplifiers.
  • a single HEMT structure can use multiple transistor units (cells) arranged in parallel.
  • multiple transistor cells arranged in parallel are used. (i.e., cellular structure) distribution method is not limited.
  • the HEMT may include multiple transistor units (such as C1, C2, and C3) arranged in parallel and arranged in parallel, and two adjacent transistor units are arranged symmetrically.
  • the plurality of transistor units include a first transistor unit C1, a second transistor unit C2, and a third transistor unit C3 that are arranged adjacently in sequence.
  • the first transistor unit C1 and the second transistor unit C2 use the same source S, that is, the first transistor unit C1 and the second transistor unit C2 use the same source pattern; and the first transistor unit C1 and the second transistor unit C2 is placed symmetrically along this source.
  • the second transistor unit C2 and the third transistor unit C3 share the first drain D1, that is, the second transistor unit C2 and the third transistor unit C3 adopt a common first drain pattern, and the second transistor unit C2 and the third transistor unit C3 share the first drain pattern.
  • C3 is arranged symmetrically along the first drain D1.
  • the second drain D2 is located in the area between the source S and the first drain D1
  • the gate G is located in the source S and the second drain D2 the area between.
  • the sources S of all transistor units are connected to the same conductive pattern as the source of the HEMT, and all the first drains D1 are connected to the same conductive pattern through wires as an output pin of the HEMT.
  • all the second drains D2 are connected to the same conductive pattern through leads as another output pin of the HEMT, so as to be connected to the subsequent circuit through the two output pins.
  • the lead connected to the first drain D1 and the lead connected to the second drain D2 can be isolated by a dielectric bridge or an air bridge to ensure the normal operation of the two output pins.
  • first transistor unit C1, second transistor unit C2, and third transistor unit C3 do not specifically refer to the three fixed transistor units in the HEMT. They are only relative concepts and can be any of the multiple transistor units. Three transistor units arranged adjacent to each other.

Abstract

The present application relates to the technical field of semiconductors. Provided in the present application are a high electron mobility transistor, a Doherty power amplifier and an electronic device. The present application uses novel channel high electron mobility transistors to replace power amplifiers of multiple power amplifier circuits in the Doherty power amplifier, so that the number of dies used by the Doherty power amplifier can be reduced. The high electron mobility transistor comprises a substrate, and a first channel layer, a first barrier layer, a second channel layer, a second barrier layer and a cap layer which are arranged on the substrate and are stacked from bottom to top, wherein the first barrier layer is located on the side of the first channel layer away from the substrate, and the second barrier layer is located on the side of the second channel layer away from the substrate; the transistor further comprises a gate, a source, a first drain and a second drain; the cap layer is arranged on the side of the second barrier layer away from the substrate; the source, the gate and the second drain are arranged on the cap layer; the first drain is arranged on the first channel layer and is electrically connected to the first channel layer.

Description

高电子迁移率晶体管、Doherty功率放大器及电子设备High electron mobility transistors, Doherty power amplifiers and electronic equipment 技术领域Technical field
本申请涉及半导体技术领域,尤其涉及一种高电子迁移率晶体管、Doherty功率放大器及电子设备。This application relates to the field of semiconductor technology, and in particular to a high electron mobility transistor, a Doherty power amplifier and electronic equipment.
背景技术Background technique
多赫尔蒂(Doherty)功率放大器是无线通信系统目前广泛应用的一种高功率放大器。目前Doherty功率放大器中包括至少两路功放电路,每一路功放电路中均设置有功率放大器。由于位于不同路的功率放大器采用不同的裸片(die),并需要单独配置栅压,从而导致周边电路复杂、量产一致性差、成本高等一系列问题。Doherty power amplifier is a high-power amplifier currently widely used in wireless communication systems. Currently, the Doherty power amplifier includes at least two power amplifier circuits, and each power amplifier circuit is equipped with a power amplifier. Since power amplifiers located in different channels use different dies and need to configure gate voltages separately, this leads to a series of problems such as complex peripheral circuits, poor consistency in mass production, and high costs.
发明内容Contents of the invention
本申请实施例提供一种高电子迁移率晶体管、Doherty功率放大器及电子设备,能够减少Doherty功率放大器采用裸片(die)的数量。Embodiments of the present application provide a high electron mobility transistor, a Doherty power amplifier and electronic equipment, which can reduce the number of dies used in the Doherty power amplifier.
本申请提供一种高电子迁移率晶体管,包括衬底以及设置在衬底上从下到上层叠设置的第一沟道层、第一势垒层、第二沟道层、第二势垒层、帽层。其中,第一势垒层位于第一沟道层远离衬底的一侧,第二势垒层位于第二沟道层远离衬底的一侧。该晶体管还包括栅极、源极、第一漏极、第二漏极。帽层设置在第二势垒层远离衬底的一侧,源极、栅极、第二漏极设置在帽层上,第一漏极设置在第一沟道层上、且与第一沟道层电连接,第二漏极与第二沟道层电连接,源极与第一沟道层、第二沟道层均电连接。The present application provides a high electron mobility transistor, including a substrate and a first channel layer, a first barrier layer, a second channel layer, and a second barrier layer that are stacked from bottom to top on the substrate. , cap layer. The first barrier layer is located on a side of the first channel layer away from the substrate, and the second barrier layer is located on a side of the second channel layer away from the substrate. The transistor also includes a gate electrode, a source electrode, a first drain electrode, and a second drain electrode. The cap layer is disposed on a side of the second barrier layer away from the substrate, the source electrode, the gate electrode, and the second drain electrode are disposed on the cap layer, and the first drain electrode is disposed on the first channel layer and connected with the first channel layer. The channel layer is electrically connected, the second drain electrode is electrically connected to the second channel layer, and the source electrode is electrically connected to both the first channel layer and the second channel layer.
上述高电子迁移率晶体管通过重复设置沟道层和势垒层,从而能够形成多个沟道(包括第一沟道和第二沟道),从而突破单沟道器件的理论极限,在保持高电子迁移率的同时增加沟道中的二维电子气的面密度,相对于传统的单沟道结构,此种多沟道HEMT能够有效降低导通电阻,提升器件功率密度。并且基于该高电子迁移率晶体管的多个沟道能够形成互不干扰的两个信号通路,从而通过一个裸片可以满足Doherty功率放大器中多个放大管的需求,同时还避免了针对多个放大管单独配置栅压,从而简化了Doherty功率放大器的电路复杂度,降低了成本。The above-mentioned high electron mobility transistor can form multiple channels (including the first channel and the second channel) by repeatedly setting the channel layer and the barrier layer, thereby breaking through the theoretical limit of single-channel devices and maintaining high The electron mobility also increases the areal density of the two-dimensional electron gas in the channel. Compared with the traditional single-channel structure, this multi-channel HEMT can effectively reduce the on-resistance and increase the device power density. And based on the multiple channels of the high electron mobility transistor, two signal paths that do not interfere with each other can be formed, so that one bare chip can meet the needs of multiple amplification tubes in the Doherty power amplifier, while also avoiding the need for multiple amplification tubes. The gate voltage of the tube is configured independently, thus simplifying the circuit complexity of the Doherty power amplifier and reducing the cost.
在一些可能实现的方式中,第一漏极与第一沟道层欧姆接触;第二漏极与第二沟道层欧姆接触,源极与第一沟道层、第二沟道层均欧姆接触。其中,实现欧姆接触方式可以包括为刻蚀欧姆接触、注入欧姆接触及高温金属欧姆接触等。In some possible implementation methods, the first drain electrode is in ohmic contact with the first channel layer; the second drain electrode is in ohmic contact with the second channel layer; and the source electrode is in ohmic contact with both the first channel layer and the second channel layer. touch. Among them, ways to achieve ohmic contact may include etching ohmic contact, implanting ohmic contact, and high-temperature metal ohmic contact.
在一些可能实现的方式中,第一沟道层和第一势垒层之间设置有第一插入层;第二沟道层和第二势垒层之间设置有第二插入层;通过插入层的设置能够提高沟道处产生的二维电子气的电子迁移率。In some possible implementations, a first insertion layer is provided between the first channel layer and the first barrier layer; a second insertion layer is provided between the second channel layer and the second barrier layer; by inserting The arrangement of layers can improve the electron mobility of the two-dimensional electron gas generated at the channel.
在一些可能实现的方式中,衬底与第一沟道层之间设置有成核层、缓冲层;成核层相对于缓冲层靠近衬底。In some possible implementations, a nucleation layer and a buffer layer are provided between the substrate and the first channel layer; the nucleation layer is close to the substrate relative to the buffer layer.
在一些可能实现的方式中,高电子迁移率晶体管为GaN HEMT。In some possible implementations, the high electron mobility transistor is a GaN HEMT.
本申请实施例还提供一种Doherty功率放大器,包括主功放电路和辅功放电路。主功放电路包括第一放大管,该第一放大管用于对输入至主功放电路的信号进行放大。该辅功放电路包括第二放大管,该第二放大管用于对输入至辅功放电路的信号进行放大。第一放大管和第二放大管复用如前述任一种可能实现的方式中提供的高电子迁移率晶体管。该高电子迁移率晶体管的源极作为第一放大管和第二放大管的源极。高电子迁移率晶体管的栅极作为第一放大管和第二放大管的栅极。高电子迁移率晶体管的第一漏极作为第一放大管的漏极。高电子迁移率晶体管的第二漏极作为第二放大管的漏极。An embodiment of the present application also provides a Doherty power amplifier, which includes a main power amplifier circuit and an auxiliary power amplifier circuit. The main power amplifier circuit includes a first amplifier tube, which is used to amplify the signal input to the main power amplifier circuit. The auxiliary power amplifier circuit includes a second amplifier tube, and the second amplifier tube is used to amplify the signal input to the auxiliary power amplifier circuit. The first amplifying tube and the second amplifying tube multiplex the high electron mobility transistor provided in any of the aforementioned possible implementation methods. The source electrode of the high electron mobility transistor serves as the source electrode of the first amplifier tube and the second amplifier tube. The gate electrode of the high electron mobility transistor serves as the gate electrode of the first amplifier tube and the second amplifier tube. The first drain of the high electron mobility transistor serves as the drain of the first amplifier tube. The second drain of the high electron mobility transistor serves as the drain of the second amplifier tube.
在上述Doherty功率放大器中,通过一个双沟道的高电子迁移率晶体管对主功放电路和辅功放电路中的两个放大器进行替代,通过合理的设置两个沟道之间的距离,控制辅功放电路中放大管的开启栅压,从而形成互不干扰的两个信号通路,以满足两路功放电路的需求。在此情况下,该晶体管可以采用一个裸片即可满足多个功率放大器的需求,同时也避免了针对多个功率放大器单独配置栅压,从而简化了Doherty功率放大器的电路复杂度,降低了成本。In the above-mentioned Doherty power amplifier, a dual-channel high electron mobility transistor is used to replace the two amplifiers in the main power amplifier circuit and the auxiliary power amplifier circuit, and the auxiliary power amplifier is controlled by reasonably setting the distance between the two channels. The gate voltage of the amplifier tube in the circuit is turned on, thus forming two signal paths that do not interfere with each other to meet the needs of the two power amplifier circuits. In this case, the transistor can use one bare chip to meet the needs of multiple power amplifiers. It also avoids the need to separately configure gate voltages for multiple power amplifiers, thereby simplifying the circuit complexity of the Doherty power amplifier and reducing costs. .
在一些可能实现的方式中,高电子迁移率晶体管的源极与接地端连接;高电子迁移率晶体管的栅极的输入信号经第一放大管和第二放大管进行放大后,分别通过第一漏极和第二漏极输出。In some possible implementation methods, the source of the high electron mobility transistor is connected to the ground terminal; after the input signal of the gate of the high electron mobility transistor is amplified by the first amplifying tube and the second amplifying tube, it passes through the first amplifying tube respectively. drain and 2nd drain output.
在一些可能实现的方式中,该Doherty功率放大器还包括:第三放大管、第四放大管、第一微带线、第二微带线、第三微带线。第一漏极与第三放大管的栅极连接,第三放大管的漏极通过第一微带线连接到合路点,第三放大管的源极与接地端连接。第二漏极通过第二微带线连接到第四放大管的栅极,第四放大管的漏极连接到合路点,第四放大管的源极与接地端连接。合路点通过第三微带线连接到Doherty功率放大器的输出端。在此情况下,该Doherty功率放大器为E-Doherty架构。In some possible implementation methods, the Doherty power amplifier further includes: a third amplification tube, a fourth amplification tube, a first microstrip line, a second microstrip line, and a third microstrip line. The first drain is connected to the gate of the third amplifier tube, the drain of the third amplifier tube is connected to the combining point through the first microstrip line, and the source of the third amplifier tube is connected to the ground. The second drain is connected to the gate of the fourth amplifier tube through the second microstrip line, the drain of the fourth amplifier tube is connected to the combining point, and the source of the fourth amplifier tube is connected to the ground. The combining point is connected to the output of the Doherty power amplifier through a third microstrip line. In this case, the Doherty power amplifier is an E-Doherty architecture.
在一些可能实现的方式中,高电子迁移率晶体管包括依次并列、且并联设置的多个晶体管单元。多个晶体管单元中包括依次相邻设置的第一晶体管单元、第二晶体管单元、第三晶体管单元。第一晶体管单元和第二晶体管单元共用同一源极,且第一晶体管单元和第二晶体管单元沿源极对称设置。第二晶体管单元和第三晶体管单元共用同一第一漏极,且第二晶体管单元和第三晶体管单元沿第一漏极对称。在每一晶体管单元中,第二漏极位于源极和第一漏极之间的区域,栅极位于源极与第二漏极之间的区域。In some possible implementations, the high electron mobility transistor includes a plurality of transistor units arranged in sequence and in parallel. The plurality of transistor units include a first transistor unit, a second transistor unit, and a third transistor unit that are arranged adjacently in sequence. The first transistor unit and the second transistor unit share the same source, and the first transistor unit and the second transistor unit are symmetrically arranged along the source. The second transistor unit and the third transistor unit share the same first drain, and the second transistor unit and the third transistor unit are symmetrical along the first drain. In each transistor unit, the second drain electrode is located in a region between the source electrode and the first drain electrode, and the gate electrode is located in a region between the source electrode and the second drain electrode.
本申请实施例提供一种电子设备,包括发射机;该发射机中采用如前述任一种可能实现的方式中提供的Doherty功率放大器。An embodiment of the present application provides an electronic device, including a transmitter; the transmitter adopts the Doherty power amplifier provided in any of the above possible implementation methods.
附图说明Description of the drawings
图1为本申请实施例提供的一种Doherty功率放大器的电路示意图;Figure 1 is a schematic circuit diagram of a Doherty power amplifier provided by an embodiment of the present application;
图2为现有技术中提供的一种高电子迁移率晶体管的结构示意图;Figure 2 is a schematic structural diagram of a high electron mobility transistor provided in the prior art;
图3为本申请实施例提供的一种高电子迁移率晶体管的结构示意图;Figure 3 is a schematic structural diagram of a high electron mobility transistor provided by an embodiment of the present application;
图4为本申请实施例提供的一种高电子迁移率晶体管的结构示意图;Figure 4 is a schematic structural diagram of a high electron mobility transistor provided by an embodiment of the present application;
图5为本申请实施例提供的一种Doherty功率放大器中采用的高电子迁移率晶体管的布图设计示意图。FIG. 5 is a schematic layout design diagram of a high electron mobility transistor used in a Doherty power amplifier according to an embodiment of the present application.
具体实施方式Detailed ways
为使本申请的目的、技术方案和优点更加清楚,下面将结合本申请中的附图,对本申请中的技术方案进行清楚、完整地描述,显然,所描述的实施例是本申请一部分实施例,而不是全部的实施例。基于本申请中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本申请保护的范围。In order to make the purpose, technical solutions and advantages of this application clearer, the technical solutions in this application will be clearly and completely described below in conjunction with the drawings in this application. Obviously, the described embodiments are part of the embodiments of this application. , not all examples. Based on the embodiments in this application, all other embodiments obtained by those of ordinary skill in the art without creative efforts fall within the scope of protection of this application.
本申请的说明书实施例和权利要求书及附图中的术语“第一”、“第二”等仅用于区分描述的目的,而不能理解为指示或暗示相对重要性,也不能理解为指示或暗示顺序。“和/或”,用于描述关联对象的关联关系,表示可以存在三种关系,例如,“A和/或B”可以表示:只存在A,只存在B以及同时存在A和B三种情况,其中A,B可以是单数或者复数。字符“/”一般表示前后关联对象是一种“或”的关系。“至少一个(项)”是指一个或者多个,“多个”是指两个或两个以上。“以下至少一项(个)”或其类似表达,是指这些项中的任意组合,包括单项(个)或复数项(个)的任意组合。例如,a,b或c中的至少一项(个),可以表示:a,b,c,“a和b”,“a和c”,“b和c”,或“a和b和c”,其中a,b,c可以是单个,也可以是多个。“安装”、“连接”、“相连”等应做广义理解,例如可以是固定连接,也可以是可拆卸连接,或者一体地连接;可以是直接连接,也可以是通过中间媒介间接,也可以是两个元件内部的连通。此外,术语“包括”和“具有”以及他们的任何变形,意图在于覆盖不排他的包含,例如,包含了一系列步骤或单元。方法、系统、产品或设备不必限于清楚地列出的那些步骤或单元,而是可包括没有清楚地列出的或对于这些过程、方法、产品或设备固有的其它步骤或单元。“上”、“下”、“左”、“右”、“顶”、“底”等仅用于相对于附图中的部件的方位而言的,这些方向性术语是相对的概念,它们用于相对于的描述和澄清,其可以根据附图中的部件所放置的方位的变化而相应地发生变化。The terms "first", "second", etc. in the description, embodiments, claims and drawings of this application are only used for the purpose of distinguishing and describing, and cannot be understood as indicating or implying relative importance, nor can they be understood as indicating. Or suggestive order. "And/or" is used to describe the relationship between associated objects, indicating that there can be three relationships. For example, "A and/or B" can mean: only A exists, only B exists, and A and B exist simultaneously. , where A and B can be singular or plural. The character "/" generally indicates that the related objects are in an "or" relationship. "At least one (item)" means one or more, and "plurality" means two or more. “At least one of the following” or similar expressions thereof refers to any combination of these items, including any combination of a single item (items) or a plurality of items (items). For example, at least one of a, b or c can mean: a, b, c, "a and b", "a and c", "b and c", or "a and b and c" ”, where a, b, c can be single or multiple. "Installation", "connection", "connection", etc. should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a direct connection, or an indirect connection through an intermediary, or it can be It is the internal connection between two components. Furthermore, the terms "including" and "having" and any variations thereof are intended to cover a non-exclusive inclusion, for example, the inclusion of a series of steps or units. Methods, systems, products or devices are not necessarily limited to those steps or elements expressly listed, but may include other steps or elements not expressly listed or inherent to such processes, methods, products or devices. "Up", "down", "left", "right", "top", "bottom", etc. are only used relative to the orientation of the components in the drawings. These directional terms are relative concepts. Relative descriptions and clarifications are used, which may vary accordingly depending on changes in the orientation in which components in the drawings are placed.
本申请实施例提供一种电子设备,该电子设备中设置有发射机,并且该发射机中采用Doherty功率放大器,该Doherty功率放大器将多路功放电路中的放大管采用一个新型的多沟道高电子迁移率晶体管(high electron mobility transistor,HEMT)进行替代,相当于采用一个裸片可以满足多个放大管的需求,同时还避免了针对多个放大管单独配置栅压,从而简化了Doherty功率放大器的电路复杂度,降低了成本。An embodiment of the present application provides an electronic device, which is provided with a transmitter, and a Doherty power amplifier is used in the transmitter. The Doherty power amplifier adopts a new multi-channel high-voltage amplifier tube as the amplifier tube in the multi-channel power amplifier circuit. Replacement with high electron mobility transistor (HEMT) is equivalent to using one bare chip to meet the needs of multiple amplifier tubes. It also avoids the need to separately configure gate voltages for multiple amplifier tubes, thereby simplifying the Doherty power amplifier. The circuit complexity is reduced and the cost is reduced.
本申请对于上述电子设备的设置形式不做限制。示意的,该电子设备可以为手机、平板电脑、笔记本、车载电脑、智能手表、智能手环、雷达、基站等电子产品。This application does not limit the installation form of the above-mentioned electronic equipment. Illustratively, the electronic device can be a mobile phone, a tablet computer, a notebook, a car computer, a smart watch, a smart bracelet, a radar, a base station and other electronic products.
以下对本申请实施例中提供的Doherty功率放大器的具体结构进行示意的说明。The following is a schematic description of the specific structure of the Doherty power amplifier provided in the embodiment of the present application.
参考图1所示,本申请提供的Doherty功率放大器中包括输入端IN、输出端OUT,以及连接在输入端IN和输出端OUT之间的多路功放电路,如主功放电路1(main)和辅功放电路2(peak)。Referring to Figure 1, the Doherty power amplifier provided by this application includes an input terminal IN, an output terminal OUT, and multiple power amplifier circuits connected between the input terminal IN and the output terminal OUT, such as main power amplifier circuit 1 (main) and Auxiliary power amplifier circuit 2 (peak).
此处可以理解的是,Doherty功率放大器中的多路功放电路通常包括一个主功放电路(main),以及除主功放电路(main)以外的至少一个辅功放电路(peak)。本申请实施例是以主功放电路(main)和一个辅功放电路2为例进行说明的。在另一些可能实现的方式中,Doherty功率放大器可以包括2路或2路以上的辅功放电路(peak)。It can be understood here that the multi-channel power amplifier circuit in the Doherty power amplifier usually includes a main power amplifier circuit (main), and at least one auxiliary power amplifier circuit (peak) in addition to the main power amplifier circuit (main). The embodiment of the present application is explained by taking a main power amplifier circuit (main) and an auxiliary power amplifier circuit 2 as an example. In other possible implementation methods, the Doherty power amplifier may include two or more auxiliary power amplifier circuits (peaks).
参考图1所示,主功放电路1(main)中包括第一放大管D_1(driver main),通过该第一放大管D_1对输入至主功放电路1的信号进行放大。辅功放电路2(peak)中包括第二放大管D_2(driver peak),通过该第二放大管D_2对输入至辅功放电路2的信号进 行放大。Referring to Figure 1, the main power amplifier circuit 1 (main) includes a first amplifier tube D_1 (driver main), and the signal input to the main power amplifier circuit 1 is amplified through the first amplifier tube D_1. The auxiliary power amplifier circuit 2 (peak) includes a second amplifier tube D_2 (driver peak), and the signal input to the auxiliary power amplifier circuit 2 is amplified through the second amplifier tube D_2.
在此基础上,本申请还提供一种新型的双沟道高电子迁移率晶体管(HEMT),具体结构可以参考图3以及下文的相关说明。参考图1所示,本申请中采用该双沟道晶体管(HEMT)对第一放大管D_1和第二放大管D_2进行替代,该双沟道晶体管(HEMT)包括栅极、源极、第一漏极、第二漏极;第一漏极和第二漏极分别连接两个不同的沟道。该双沟道晶体管(HEMT)的第一漏极作为第一放大管D_1的漏极;该双沟道晶体管(HEMT)的第二漏极作为第二放大管D_2的漏极。该双沟道晶体管(HEMT)的栅极作为第一放大管D_1和第二放大管D_2的栅极,双沟道晶体管(HEMT)的源极作为第一放大管D_1和第二放大管D_2的源极;也即第一放大管D_1的栅极和第二放大管D_2的栅极相同,复用该双沟道晶体管(HEMT)的栅极;第一放大管D_1的源极和第二放大管D_2的源极相同,复用该双沟道晶体管(HEMT)的源极。On this basis, this application also provides a new type of dual-channel high electron mobility transistor (HEMT). For the specific structure, please refer to Figure 3 and the relevant description below. Referring to Figure 1, in this application, a dual-channel transistor (HEMT) is used to replace the first amplifier tube D_1 and the second amplifier tube D_2. The dual-channel transistor (HEMT) includes a gate, a source, a first The drain electrode and the second drain electrode; the first drain electrode and the second drain electrode are respectively connected to two different channels. The first drain of the dual-channel transistor (HEMT) serves as the drain of the first amplifying tube D_1; the second drain of the dual-channel transistor (HEMT) serves as the drain of the second amplifying tube D_2. The gate electrode of the dual-channel transistor (HEMT) serves as the gate electrode of the first amplifier tube D_1 and the second amplifier tube D_2, and the source electrode of the dual-channel transistor (HEMT) serves as the gate electrode of the first amplifier tube D_1 and the second amplifier tube D_2. The source; that is, the gate of the first amplifier tube D_1 and the gate of the second amplifier tube D_2 are the same, and the gate of the dual-channel transistor (HEMT) is multiplexed; the source of the first amplifier tube D_1 and the gate of the second amplifier tube D_2 are the same. The sources of tube D_2 are the same, and the sources of the dual-channel transistor (HEMT) are multiplexed.
示意的,在Doherty功率放大器中,可以将双沟道晶体管(HEMT)的源极与接地端连接,栅极与该Doherty功率放大器的输入端IN连接,第一漏极和第二漏极通过相关电路连接到Doherty功率放大器的输出端OUT。这样一来,输入端IN输入信号经第一放大管D_1和第二放大管D_2进行放大后,分别通过第一漏极和第二漏极输出至输出端OUT。Schematically, in a Doherty power amplifier, the source of the dual-channel transistor (HEMT) can be connected to the ground, the gate is connected to the input terminal IN of the Doherty power amplifier, and the first drain and the second drain are related The circuit is connected to the output terminal OUT of the Doherty power amplifier. In this way, after the input signal at the input terminal IN is amplified by the first amplifier tube D_1 and the second amplifier tube D_2, it is output to the output terminal OUT through the first drain and the second drain respectively.
综上所述,在本申请实施例提供的Doherty功率放大器中,采用一个双沟道晶体管(HEMT)替代主功放电路1和辅功放电路2中的两个放大管(D_1、D_2),该双沟道晶体管(HEMT)可以采用一个裸片即可满足多个功率放大器的需求,同时也避免了针对多个功率放大器单独配置栅压,从而简化了Doherty功率放大器的电路复杂度,降低了成本。To sum up, in the Doherty power amplifier provided by the embodiment of the present application, a dual-channel transistor (HEMT) is used to replace the two amplifier tubes (D_1, D_2) in the main power amplifier circuit 1 and the auxiliary power amplifier circuit 2. The channel transistor (HEMT) can use one bare chip to meet the needs of multiple power amplifiers. It also avoids the need to separately configure gate voltages for multiple power amplifiers, thereby simplifying the circuit complexity of the Doherty power amplifier and reducing costs.
当然,图1仅是示意的以双沟道高电子迁移率晶体管(HEMT)对两路功放电路中的放大管进行替代为例进行示意说明的。在另一些可能实现的方式中,该晶体管中可以设置有三个或三个以上的沟道,从而能够实现对三路或三路以上的功放电路中的放大管的替代。Of course, FIG. 1 is only a schematic illustration using a dual-channel high electron mobility transistor (HEMT) to replace the amplifier tubes in the two-way power amplifier circuit. In other possible implementation methods, the transistor may be provided with three or more channels, thereby enabling the replacement of amplifier tubes in three or more power amplifier circuits.
另外,本申请对于Doherty功率放大器的架构不作限制,只要多路功放电路中具有同相相位输入信号的放大管,均可以采用本申请实施例提供的高电子迁移率晶体管(HEMT)进行替代。In addition, this application does not limit the architecture of the Doherty power amplifier. As long as the amplifier tubes in the multi-channel power amplifier circuit have in-phase input signals, they can be replaced by high electron mobility transistors (HEMTs) provided in the embodiments of this application.
示意的,在一些可能实现的方式中,参考图1所示,该Doherty功率放大器可以为E-Doherty架构(enhance Doherty)。在此情况下,该Doherty功率放大器可以包括第三放大管D_3、第四放大管D_4、第一微带线10、第二微带线20、第三微带线30。第一放大管D_1的漏极(也即第一漏极)与第三放大管D_3的栅极连接,第三放大管D_3的漏极通过第一微带线10连接到合路点O,第三放大管D_3的源极与接地端连接;第二放大管D_2的漏极(也即第二漏极)通过第二微带线20连接到第四放大管D_4的栅极,第四放大管D_4的漏极连接到合路点O,第四放大管D_4的源极与接地端连接;合路点O通过第三微带线30连接到Doherty功率放大器的输出端OUT。Schematically, in some possible implementation methods, as shown in Figure 1, the Doherty power amplifier can be an E-Doherty architecture (enhance Doherty). In this case, the Doherty power amplifier may include a third amplification tube D_3, a fourth amplification tube D_4, a first microstrip line 10, a second microstrip line 20, and a third microstrip line 30. The drain of the first amplifier tube D_1 (that is, the first drain) is connected to the gate of the third amplifier tube D_3. The drain of the third amplifier tube D_3 is connected to the combining point O through the first microstrip line 10. The source of the third amplifier tube D_3 is connected to the ground; the drain of the second amplifier tube D_2 (that is, the second drain) is connected to the gate of the fourth amplifier tube D_4 through the second microstrip line 20. The drain of D_4 is connected to the combining point O, and the source of the fourth amplifier tube D_4 is connected to the ground; the combining point O is connected to the output terminal OUT of the Doherty power amplifier through the third microstrip line 30 .
在上述E-Doherty架构(enhance Doherty)中,第一放大管D_1与第二放大管D_2为同相位的输入信号,从而能够采用双沟道HEMT进行替代。在该E-Doherty架构中,主功放电路1输入的信号经第一放大管D_1放大后,经第三放大管D_3进一步放大,并通过第一微带线10进行阻抗变换并输出至合路点O。辅功放电路2输入的信号通过第二放大 管D_2放大经第二微带线20进行相位补偿,再经第四放大管D_4放大后输出至合路点O。两路功放电路(1、2)的信号在合路点O之后通过第三微带线30进行阻抗变换并输出至Doherty功率放大器的输出端OUT。In the above-mentioned E-Doherty architecture (enhance Doherty), the first amplifier tube D_1 and the second amplifier tube D_2 have the same phase input signal, so a dual-channel HEMT can be used instead. In this E-Doherty architecture, the signal input by the main power amplifier circuit 1 is amplified by the first amplifier tube D_1, further amplified by the third amplifier tube D_3, and impedance transformed through the first microstrip line 10 and output to the combining point. O. The signal input to the auxiliary power amplifier circuit 2 is amplified by the second amplifier tube D_2, phase compensated through the second microstrip line 20, and then amplified by the fourth amplifier tube D_4 before being output to the combining point O. The signals of the two power amplifier circuits (1, 2) undergo impedance transformation through the third microstrip line 30 after the combining point O and are output to the output terminal OUT of the Doherty power amplifier.
可以理解的是,第一功放电路1的总相位(包括D_1、D_3、10)与第二功放电路2的总相位(包括D_2、D_4、20)基本相同。It can be understood that the total phase of the first power amplifier circuit 1 (including D_1, D_3, 10) and the total phase of the second power amplifier circuit 2 (including D_2, D_4, 20) are basically the same.
本领域的技术人员应当理解的是,对于上述放大器(D_1、D_2、D_3、D_4)的输入端(栅极)和输出端(漏极)连接而言,输入端可以是通过输入匹配电路进行相关的电路连接,输出端可以是通过输出匹配电路进行相关的电路连接。Those skilled in the art will understand that, for the connection between the input terminal (gate) and the output terminal (drain) of the above-mentioned amplifiers (D_1, D_2, D_3, D_4), the input terminals may be correlated through an input matching circuit. The circuit connection, the output terminal can be related to the circuit connection through the output matching circuit.
另外,还可以理解的是,在Doherty功率放大器的多路功放电路(1、2)中,驱动功率放大器的开启顺序不同,通常可以是主功放电路(main)先开启,辅功放电路(peak)后开启。因此,在采用多沟道高电子迁移率晶体管(HEMT)的情况下,可以根据实际的需要来设计多个沟道之间的距离来以满足多路功放电路的对控制信号的需求。In addition, it can also be understood that in the multi-channel power amplifier circuits (1, 2) of the Doherty power amplifier, the order of turning on the driving power amplifiers is different. Usually, the main power amplifier circuit (main) can be turned on first, and the auxiliary power amplifier circuit (peak) Then turn on. Therefore, when using a multi-channel high electron mobility transistor (HEMT), the distance between multiple channels can be designed according to actual needs to meet the control signal requirements of the multi-channel power amplifier circuit.
以下结合Doherty功率放大器,对本申请实施例提供的多沟道高电子迁移率晶体管(HEMT)的具体结构做进一步的说明。The specific structure of the multi-channel high electron mobility transistor (HEMT) provided in the embodiment of the present application will be further described below in conjunction with the Doherty power amplifier.
图2为传统的单沟道电子迁移率晶体管(HEMT)的结构示意图。参考图2所示,在单沟道HEMT中设置有一个沟道层和一个势垒层,并且在沟道层和势垒层之间的界面(即异质结界面)处产生二维电子气(2-dimension electron gas,2DEG)形成沟道100。Figure 2 is a schematic structural diagram of a traditional single-channel electron mobility transistor (HEMT). Referring to Figure 2, a channel layer and a barrier layer are provided in a single-channel HEMT, and a two-dimensional electron gas is generated at the interface between the channel layer and the barrier layer (ie, the heterojunction interface) (2-dimension electron gas, 2DEG) forms channel 100.
相比以下,参考图3所示,本申请实施例中采用的多沟道HEMT,通过在外延结构中反复生长沟道层和势垒层,从而形成多个沟道(如101、102),从而突破单沟道器件的理论极限,在保持高电子迁移率的同时增加沟道中的二维电子气(2DEG)面密度,相对于传统的单沟道结构,此种多沟道HEMT能够有效降低导通电阻,提升器件功率密度。Compared with the following, referring to Figure 3, the multi-channel HEMT used in the embodiment of the present application forms multiple channels (such as 101, 102) by repeatedly growing channel layers and barrier layers in the epitaxial structure. Thereby breaking through the theoretical limit of single-channel devices, increasing the two-dimensional electron gas (2DEG) surface density in the channel while maintaining high electron mobility. Compared with the traditional single-channel structure, this multi-channel HEMT can effectively reduce On-resistance, improve device power density.
此处可以理解的是,在多沟道HEMT中,下沟道(即最靠近衬底一侧)更早打开,因此可以用于主功放电路1(main);上沟道相对于下沟道较晚打开,因此上沟道可以用于辅功放电路2(peak),并且通过合理的设置相邻沟道之间的距离,控制辅功放电路(peak)中驱动功率放大器的开启栅压,从而形成互不干扰的两个信号通路,以满足两路功放电路(1、2)的需求。What can be understood here is that in multi-channel HEMT, the lower channel (i.e. the side closest to the substrate) is opened earlier and therefore can be used for the main power amplifier circuit 1 (main); the upper channel is relatively different from the lower channel It opens later, so the upper channel can be used for the auxiliary power amplifier circuit 2 (peak), and by reasonably setting the distance between adjacent channels, the turn-on gate voltage of the driving power amplifier in the auxiliary power amplifier circuit (peak) is controlled, thereby Two signal paths that do not interfere with each other are formed to meet the needs of the two power amplifier circuits (1, 2).
示意的,如图3所示,本申请实施例提供一种双沟道HEMT,该晶体管包括衬底11(substrate)以及依次设置在衬底11上的成核层12(nucleation)、缓冲层13(buffer)、第一沟道层21(channel)、第一势垒层31(barrier)、第二沟道层22(channel)、第二势垒层32(barrier)、帽层40(cap)。其中,第一沟道层21与第一势垒层31之间的界面形成第一沟道101,第二沟道层22与第二势垒层32之间的界面形成第二沟道102。Schematically, as shown in Figure 3, the embodiment of the present application provides a dual-channel HEMT. The transistor includes a substrate 11 (substrate), a nucleation layer 12 (nucleation), and a buffer layer 13 sequentially provided on the substrate 11. (buffer), first channel layer 21 (channel), first barrier layer 31 (barrier), second channel layer 22 (channel), second barrier layer 32 (barrier), cap layer 40 (cap) . The interface between the first channel layer 21 and the first barrier layer 31 forms the first channel 101 , and the interface between the second channel layer 22 and the second barrier layer 32 forms the second channel 102 .
另外,该晶体管还包括栅极G、源极S、第一漏极D1、第二漏极D2。其中,第一漏极D1与第一沟道层21电连接,第二漏极D2与第二沟道层22电连接。第一漏极D1可以设置在第一沟道层21上,与第一沟道层21之间形成电连接。栅极G、源极S、第二漏极D2可以设置在帽层40上,并且第二漏极D2与第二沟道层22之间通过离子注入的方式形成电连接。源极S与第一沟道层21、第二沟道层22之间过离子注入的方式形成电连接。In addition, the transistor also includes a gate G, a source S, a first drain D1, and a second drain D2. The first drain D1 is electrically connected to the first channel layer 21 , and the second drain D2 is electrically connected to the second channel layer 22 . The first drain electrode D1 may be disposed on the first channel layer 21 to form an electrical connection with the first channel layer 21 . The gate G, the source S, and the second drain D2 may be disposed on the cap layer 40 , and the second drain D2 and the second channel layer 22 are electrically connected through ion implantation. The source S is electrically connected to the first channel layer 21 and the second channel layer 22 through ion implantation.
在此情况下,在将上述双沟道HEMT应用至前述的E-Doherty架构中时,第一漏极D1相当于前述第一放大管D_1的漏极,第二漏极D2相当于第二放大管D_2的漏极,该双沟道HEMT能够将传统的平面型布局转变为垂直型布局,通过双沟道HEMT实现对两 个放大管(D_1、D_2)的替代,这样一来,采用一个裸片即可满足两个驱动功率放大器的需求,同时还避免了针对两路功放电路单独配置栅压,简化了Doherty功率放大器的电路复杂度,降低了制作成本。In this case, when the above-mentioned dual-channel HEMT is applied to the aforementioned E-Doherty architecture, the first drain D1 is equivalent to the drain of the aforementioned first amplifier tube D_1, and the second drain D2 is equivalent to the second amplifier tube D_1. The drain of tube D_2. This dual-channel HEMT can transform the traditional planar layout into a vertical layout. The dual-channel HEMT can replace the two amplifier tubes (D_1, D_2). In this way, a bare One chip can meet the needs of two driving power amplifiers, and at the same time, it avoids the need to separately configure the gate voltage for the two power amplifier circuits, simplifying the circuit complexity of the Doherty power amplifier and reducing the production cost.
上述双沟道HEMT的工作原理而言:两个漏极(D1、D2)与源极S之间的电压(即漏源电压V D1S、V D2S)使得在两个沟道(101、102)内产生横向电场,并在横向电场作用下,二维电子气(2DEG)沿两个异质结界面进行传输形成漏极输出电流(如图3中的箭头示意)。通过控制栅极G输入的电压大小能够控制异质结中势阱的深度,改变沟道(101、102)中二维电子气(2DEG)面密度的大小,从而控制两个漏极(D1、D2)的输出电流。 In terms of the working principle of the above-mentioned dual-channel HEMT: the voltage between the two drains (D1, D2) and the source S (that is, the drain-source voltage V D1S , V D2S ) makes the voltage between the two channels (101, 102) A lateral electric field is generated within the device, and under the action of the lateral electric field, the two-dimensional electron gas (2DEG) is transmitted along the two heterojunction interfaces to form a drain output current (as indicated by the arrow in Figure 3). By controlling the voltage input to the gate G, the depth of the potential well in the heterojunction can be controlled, and the surface density of the two-dimensional electron gas (2DEG) in the channel (101, 102) can be changed, thereby controlling the two drains (D1, 102). D2) output current.
本申请对于上述第一漏极D1与第一沟道层21的电连接方式不作限制。示意的,在一些可能实现的方式中,可以设置第一漏极D1与第一沟道层21形成欧姆接触,从而保证第一漏极D1与第一沟道101之间的电连接。类似的可以设置第二漏极D2与第二沟道层22形成欧姆接触,以及源极S与第一沟道层21、第二沟道层22形成欧姆接触。其中,实现源极S、漏极(D1、D2)与沟道层(21、22)之间的欧姆接触方式可以包括但不限于刻蚀欧姆、注入欧姆及高温金属欧姆等。This application does not limit the electrical connection method between the first drain electrode D1 and the first channel layer 21 . Illustratively, in some possible implementations, the first drain D1 and the first channel layer 21 may be arranged to form an ohmic contact, thereby ensuring the electrical connection between the first drain D1 and the first channel 101 . Similarly, the second drain electrode D2 can be arranged to form ohmic contact with the second channel layer 22 , and the source electrode S can form ohmic contact with the first channel layer 21 and the second channel layer 22 . Among them, the method of realizing ohmic contact between the source S, the drain (D1, D2) and the channel layer (21, 22) may include but is not limited to etching ohms, implanting ohms, and high-temperature metal ohms.
示意的,在一些可能实现的方式中,如图3所示,可以设置第一漏极D1与第一沟道层21的表面以刻蚀欧姆接触的方式连接,第二漏极D2与第二沟道层22的表面以注入欧姆接触的方式连接,源极S与第一沟道层21、第二沟道层22之间以注入欧姆接触的方式连接。在此情况下,可以采用刻蚀工艺将第一沟道层21上方的膜层去除,从而漏出第一沟道层21的表面,并在第一沟道层21的漏出区域进行第一漏极D1的制作,保证第一漏极D1与第一沟道层21的表面欧姆接触。采用注入工艺在源极S下方的位置进行离子注入形成注入区a1,源极S在该注入区a1与第一沟道层21和第二沟道层22形成欧姆接触。采用注入工艺在第二漏极D2下方的位置进行离子注入形成注入区a2,第二漏极D2通过该注入区a2与第二沟道层22形成欧姆接触。Schematically, in some possible implementation methods, as shown in FIG. 3 , the first drain electrode D1 can be connected to the surface of the first channel layer 21 in an etched ohmic contact manner, and the second drain electrode D2 can be connected to the second drain electrode D2 by etching ohmic contact. The surface of the channel layer 22 is connected by implanting ohmic contact, and the source S is connected with the first channel layer 21 and the second channel layer 22 by implanting ohmic contact. In this case, an etching process can be used to remove the film layer above the first channel layer 21 to leak the surface of the first channel layer 21 , and perform the first drain electrode in the leakage area of the first channel layer 21 . The fabrication of D1 ensures ohmic contact between the first drain electrode D1 and the surface of the first channel layer 21 . An implantation process is used to perform ion implantation at a position below the source S to form an implantation region a1. The source S forms ohmic contact with the first channel layer 21 and the second channel layer 22 in the implantation region a1. An implantation process is used to perform ion implantation at a position below the second drain electrode D2 to form an implantation region a2. The second drain electrode D2 forms an ohmic contact with the second channel layer 22 through the implantation region a2.
另外,如图4所示,在一些可能实现的方式中,可以在第一沟道层21与第一势垒层31之间设置第一插入层n1,在第二沟道层22和第二势垒层32之间设置第二插入层n2,通过插入层(n1、n2)的设置能够提高沟道(101、102)处产生的2DEG的电子迁移率。In addition, as shown in FIG. 4 , in some possible implementations, a first insertion layer n1 may be provided between the first channel layer 21 and the first barrier layer 31 , and between the second channel layer 22 and the second A second insertion layer n2 is provided between the barrier layers 32. The electron mobility of the 2DEG generated at the channel (101, 102) can be improved by the arrangement of the insertion layer (n1, n2).
另外,本申请对于上述衬底11以及晶体管中的其他相关膜层采用的材料不做限制,实际中可以根据需要进行设置即可。In addition, this application does not impose restrictions on the materials used for the above-mentioned substrate 11 and other related film layers in the transistor. In practice, they can be set as needed.
示意的,衬底11可以采用包括但不限于SiC,Si,GaN,GaAs,InP等材料。Illustratively, the substrate 11 can be made of materials including but not limited to SiC, Si, GaN, GaAs, InP, etc.
示意的,成核层12可以采用包括但不限于AlN,InAlN,InGaN,ScAlN等材料。Illustratively, the nucleation layer 12 can be made of materials including but not limited to AlN, InAlN, InGaN, ScAlN and the like.
示意的,缓冲层13可以采用包括但不限于AlN,GaN,InAlN,InGaN,ScAlN等材料。Illustratively, the buffer layer 13 may be made of materials including but not limited to AlN, GaN, InAlN, InGaN, ScAlN, etc.
示意的,沟道层(21、22)可以采用包括但不限于AlN,GaN,InAlN,InGaN,ScAlN等材料。例如,在一些实施例中,上述晶体管可以为GaN HEMT,沟道层(21、22)可以采用GaN。Illustratively, the channel layers (21, 22) can use materials including but not limited to AlN, GaN, InAlN, InGaN, ScAlN and the like. For example, in some embodiments, the above-mentioned transistors may be GaN HEMTs, and the channel layers (21, 22) may be GaN.
示意的,势垒层(31、32)可以采用包括但不限于AlN,GaN,InAlN,InGaN,ScAlN等材料。Illustratively, the barrier layers (31, 32) can use materials including but not limited to AlN, GaN, InAlN, InGaN, ScAlN and the like.
示意的,插入层(n1、n2)可以采用包括但不限于AlN,GaN,InAlN,InGaN,ScAlN等材料。Illustratively, the insertion layer (n1, n2) can use materials including but not limited to AlN, GaN, InAlN, InGaN, ScAlN and other materials.
示意的,帽层40可以采用包括但不限于SiN,GaN,AlN,InAlN,InGaN,ScAlN等材料。Illustratively, the cap layer 40 may be made of materials including but not limited to SiN, GaN, AIN, InAlN, InGaN, ScAlN, and the like.
需要说明的是,图3和图4均是以HEMT采用双沟道结构为例进行示意说明的,但本申请并不限制于此,在一些可能实现的方式中,HEMT也采用三沟道结构、四沟道结构等,从而可以适用于多路Doherty功率放大器。It should be noted that both Figures 3 and 4 are schematically illustrated by taking the HEMT adopting a dual-channel structure as an example, but the application is not limited thereto. In some possible implementation methods, the HEMT also adopts a three-channel structure. , four-channel structure, etc., which can be applied to multi-channel Doherty power amplifiers.
此外,本领域的技术人员应当理解的是,在实际的布图设计(layout)中,单个HEMT结构可以采用多个并联设置的晶体管单元(cell),本申请中对多个并联设置的晶体管单元(也即元胞结构)的分布方式不做限制。In addition, those skilled in the art should understand that in actual layout design (layout), a single HEMT structure can use multiple transistor units (cells) arranged in parallel. In this application, multiple transistor cells arranged in parallel are used. (i.e., cellular structure) distribution method is not limited.
示意的,以图4中的双沟道HEMT为例,以下对HEMT中多个晶体管单元的布图设计进行说明。如图5所示,在一些可能实现的方式中,HEMT中可以包括依次并列、且并联设置的多个晶体管单元(如C1、C2、C3),并且相邻的两个晶体管单元对称设置。具体的,多个晶体管单元中包括依次相邻设置的第一晶体管单元C1、第二晶体管单元C2、第三晶体管单元C3。其中,第一晶体管单元C1和第二晶体管单元C2同用同一源极S,也即第一晶体管单元C1和第二晶体管单元C2采用同一源极图案;并且第一晶体管单元C1和第二晶体管单元C2沿该源极对称设置。第二晶体管单元C2和第三晶体管单元C3共用第一漏极D1,也即第二晶体管单元C2和第三晶体管单元C3采用共用第一漏极图案,且第二晶体管单元C2和第三晶体管单元C3沿第一漏极D1对称设置。另外,在每一晶体管单元(如C1、C2、C3)中,第二漏极D2位于源极S与第一漏极D1之间的区域,栅极G位于源极S与第二漏极D2之间的区域。Schematically, taking the dual-channel HEMT in Figure 4 as an example, the layout design of multiple transistor units in the HEMT will be described below. As shown in FIG. 5 , in some possible implementations, the HEMT may include multiple transistor units (such as C1, C2, and C3) arranged in parallel and arranged in parallel, and two adjacent transistor units are arranged symmetrically. Specifically, the plurality of transistor units include a first transistor unit C1, a second transistor unit C2, and a third transistor unit C3 that are arranged adjacently in sequence. Among them, the first transistor unit C1 and the second transistor unit C2 use the same source S, that is, the first transistor unit C1 and the second transistor unit C2 use the same source pattern; and the first transistor unit C1 and the second transistor unit C2 is placed symmetrically along this source. The second transistor unit C2 and the third transistor unit C3 share the first drain D1, that is, the second transistor unit C2 and the third transistor unit C3 adopt a common first drain pattern, and the second transistor unit C2 and the third transistor unit C3 share the first drain pattern. C3 is arranged symmetrically along the first drain D1. In addition, in each transistor unit (such as C1, C2, C3), the second drain D2 is located in the area between the source S and the first drain D1, and the gate G is located in the source S and the second drain D2 the area between.
当然,在HEMT中,所有的晶体管单元的源极S均连接至同一导电图案作为该HEMT的源极,所有的第一漏极D1通过引线均连接至同一导电图案作为该HEMT的一个输出引脚,所有的第二漏极D2通过引线均连接至同一导电图案作为该HEMT的另一个输出引脚,以通过两个输出引脚与后级电路进行连接。其中,连接第一漏极D1的引线与连接第二漏极D2的引线之间可以通过介质桥或空气桥隔离,以保证两个输出引脚的正常工作。Of course, in the HEMT, the sources S of all transistor units are connected to the same conductive pattern as the source of the HEMT, and all the first drains D1 are connected to the same conductive pattern through wires as an output pin of the HEMT. , all the second drains D2 are connected to the same conductive pattern through leads as another output pin of the HEMT, so as to be connected to the subsequent circuit through the two output pins. Among them, the lead connected to the first drain D1 and the lead connected to the second drain D2 can be isolated by a dielectric bridge or an air bridge to ensure the normal operation of the two output pins.
可以理解的是,上述第一晶体管单元C1、第二晶体管单元C2、第三晶体管单元C3并不特指HEMT中固定的三个晶体管单元,其仅为相对概念,可以是多个晶体管单元中任意依次相邻设置的三个晶体管单元。It can be understood that the above-mentioned first transistor unit C1, second transistor unit C2, and third transistor unit C3 do not specifically refer to the three fixed transistor units in the HEMT. They are only relative concepts and can be any of the multiple transistor units. Three transistor units arranged adjacent to each other.
以上所述,仅为本申请的具体实施方式,但本申请的保护范围并不局限于此,任何熟悉本技术领域的技术人员在本申请揭露的技术范围内,可轻易想到变化或替换,都应涵盖在本申请的保护范围之内。因此,本申请的保护范围应以所述权利要求的保护范围为准。The above are only specific embodiments of the present application, but the protection scope of the present application is not limited thereto. Any person familiar with the technical field can easily think of changes or substitutions within the technical scope disclosed in the present application. should be covered by the protection scope of this application. Therefore, the protection scope of this application should be subject to the protection scope of the claims.

Claims (10)

  1. 一种高电子迁移率晶体管,其特征在于,包括:A high electron mobility transistor, characterized by:
    衬底;substrate;
    在所述衬底上层叠设置的第一沟道层和第一势垒层,所述第一势垒层位于所述第一沟道层远离所述衬底的一侧;A first channel layer and a first barrier layer are stacked on the substrate, and the first barrier layer is located on a side of the first channel layer away from the substrate;
    在所述第一势垒层上层叠设置的第二沟道层和第二势垒层,所述第二势垒层位于所述第二沟道层远离所述衬底的一侧;A second channel layer and a second barrier layer are stacked on the first barrier layer, and the second barrier layer is located on a side of the second channel layer away from the substrate;
    帽层,所述帽层设置在所述第二势垒层远离所述衬底的一侧;a cap layer, the cap layer being disposed on the side of the second barrier layer away from the substrate;
    第一漏极,所述第一漏极设置在所述第一沟道层上、且与所述第一沟道层电连接;A first drain electrode, the first drain electrode is disposed on the first channel layer and is electrically connected to the first channel layer;
    设置在所述帽层上的源极、栅极、第二漏极,所述第二漏极与所述第二沟道层电连接,所述源极与所述第一沟道层、所述第二沟道层均电连接。A source electrode, a gate electrode and a second drain electrode are provided on the cap layer. The second drain electrode is electrically connected to the second channel layer. The source electrode is connected to the first channel layer and the second drain electrode. The second channel layers are all electrically connected.
  2. 根据权利要求1所述的高电子迁移率晶体管,其特征在于,The high electron mobility transistor according to claim 1, characterized in that:
    所述第一漏极与所述第一沟道层欧姆接触;The first drain electrode is in ohmic contact with the first channel layer;
    所述第二漏极与所述第二沟道层欧姆接触;The second drain electrode is in ohmic contact with the second channel layer;
    所述源极与所述第一沟道层、所述第二沟道层均欧姆接触。The source electrode is in ohmic contact with the first channel layer and the second channel layer.
  3. 根据权利要求1或2所述的高电子迁移率晶体管,其特征在于,The high electron mobility transistor according to claim 1 or 2, characterized in that:
    所述第一沟道层和所述第一势垒层之间设置有第一插入层;A first insertion layer is provided between the first channel layer and the first barrier layer;
    所述第二沟道层和所述第二势垒层之间设置有第二插入层。A second insertion layer is provided between the second channel layer and the second barrier layer.
  4. 根据权利要求1-3任一项所述的高电子迁移率晶体管,其特征在于,The high electron mobility transistor according to any one of claims 1-3, characterized in that:
    所述衬底与所述第一沟道层之间设置有成核层、缓冲层;A nucleation layer and a buffer layer are provided between the substrate and the first channel layer;
    所述成核层相对于所述缓冲层靠近所述衬底。The nucleation layer is close to the substrate relative to the buffer layer.
  5. 根据权利要求1-4任一项所述的高电子迁移率晶体管,其特征在于,所述高电子迁移率晶体管为GaN HEMT。The high electron mobility transistor according to any one of claims 1 to 4, characterized in that the high electron mobility transistor is a GaN HEMT.
  6. 一种Doherty功率放大器,其特征在于,包括主功放电路、辅功放电路;A Doherty power amplifier, characterized in that it includes a main power amplifier circuit and an auxiliary power amplifier circuit;
    所述主功放电路包括第一放大管,所述第一放大管用于对输入至所述主功放电路的信号进行放大;The main power amplifier circuit includes a first amplifier tube, the first amplifier tube is used to amplify the signal input to the main power amplifier circuit;
    所述辅功放电路包括第二放大管,所述第二放大管用于对输入至所述辅功放电路的信号进行放大;The auxiliary power amplifier circuit includes a second amplifier tube, the second amplifier tube is used to amplify the signal input to the auxiliary power amplifier circuit;
    所述第一放大管和所述第二放大管复用如权利要求1-5任一项所述的高电子迁移率晶体管;The first amplifier tube and the second amplifier tube multiplex the high electron mobility transistor according to any one of claims 1 to 5;
    所述高电子迁移率晶体管的源极作为所述第一放大管和所述第二放大管的源极;The source of the high electron mobility transistor serves as the source of the first amplifier tube and the second amplifier tube;
    所述高电子迁移率晶体管的栅极作为所述第一放大管和所述第二放大管的栅极;The gate electrode of the high electron mobility transistor serves as the gate electrode of the first amplifier tube and the second amplifier tube;
    所述高电子迁移率晶体管的第一漏极作为所述第一放大管的漏极;The first drain of the high electron mobility transistor serves as the drain of the first amplifier tube;
    所述高电子迁移率晶体管的第二漏极作为所述第二放大管的漏极。The second drain of the high electron mobility transistor serves as the drain of the second amplifier tube.
  7. 根据权利要求6所述的Doherty功率放大器,其特征在于,The Doherty power amplifier according to claim 6, characterized in that,
    所述高电子迁移率晶体管的源极与接地端连接;The source of the high electron mobility transistor is connected to the ground;
    所述高电子迁移率晶体管的栅极的输入信号经所述第一放大管和所述第二放大管进行放大后,分别通过所述第一漏极和所述第二漏极输出。After the input signal of the gate of the high electron mobility transistor is amplified by the first amplifier tube and the second amplifier tube, it is output through the first drain electrode and the second drain electrode respectively.
  8. 根据权利要求6或7所述的Doherty功率放大器,其特征在于,The Doherty power amplifier according to claim 6 or 7, characterized in that,
    所述Doherty功率放大器还包括:第三放大管、第四放大管、第一微带线、第二微带线、第三微带线;The Doherty power amplifier also includes: a third amplification tube, a fourth amplification tube, a first microstrip line, a second microstrip line, and a third microstrip line;
    所述第一漏极与所述第三放大管的栅极连接,所述第三放大管的漏极通过所述第一微带线连接到合路点,所述第三放大管的源极与接地端连接;The first drain is connected to the gate of the third amplifier tube, the drain of the third amplifier tube is connected to the combining point through the first microstrip line, and the source of the third amplifier tube Connect to the ground terminal;
    所述第二漏极通过所述第二微带线连接到所述第四放大管的栅极,所述第四放大管的漏极连接到所述合路点,所述第四放大管的源极与接地端连接;The second drain is connected to the gate of the fourth amplifier tube through the second microstrip line, and the drain of the fourth amplifier tube is connected to the combining point. The source is connected to the ground terminal;
    所述合路点通过所述第三微带线连接到所述Doherty功率放大器的输出端。The combining point is connected to the output end of the Doherty power amplifier through the third microstrip line.
  9. 根据权利要求6-8任一项所述的Doherty功率放大器,其特征在于,The Doherty power amplifier according to any one of claims 6-8, characterized in that,
    所述高电子迁移率晶体管包括依次并列、且并联设置的多个晶体管单元;The high electron mobility transistor includes a plurality of transistor units arranged in parallel and arranged in parallel;
    所述多个晶体管单元中包括依次相邻设置的第一晶体管单元、第二晶体管单元、第三晶体管单元;The plurality of transistor units include a first transistor unit, a second transistor unit, and a third transistor unit arranged adjacently in sequence;
    所述第一晶体管单元和所述第二晶体管单元共用源极、且沿所述源极对称设置;The first transistor unit and the second transistor unit share a source and are symmetrically arranged along the source;
    所述第二晶体管单元和所述第三晶体管单元共用第一漏极、且沿所述第一漏极对称;The second transistor unit and the third transistor unit share a first drain and are symmetrical along the first drain;
    在每一所述晶体管单元中,第二漏极位于所述源极和所述第一漏极之间的区域,所述栅极位于所述源极与所述第二漏极之间的区域。In each of the transistor units, the second drain electrode is located in the area between the source electrode and the first drain electrode, and the gate electrode is located in the area between the source electrode and the second drain electrode. .
  10. 一种电子设备,其特征在于,包括发射机;所述发射机中采用如权利要求6-9任一项所述的Doherty功率放大器。An electronic device, characterized in that it includes a transmitter; the transmitter adopts the Doherty power amplifier according to any one of claims 6-9.
PCT/CN2022/083158 2022-03-25 2022-03-25 High electron mobility transistor, doherty power amplifier and electronic device WO2023178683A1 (en)

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