WO2023130579A1 - 流量控制装置和自动补液系统 - Google Patents

流量控制装置和自动补液系统 Download PDF

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Publication number
WO2023130579A1
WO2023130579A1 PCT/CN2022/081507 CN2022081507W WO2023130579A1 WO 2023130579 A1 WO2023130579 A1 WO 2023130579A1 CN 2022081507 W CN2022081507 W CN 2022081507W WO 2023130579 A1 WO2023130579 A1 WO 2023130579A1
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WIPO (PCT)
Prior art keywords
liquid
flow
flow control
liquid level
control device
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Application number
PCT/CN2022/081507
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English (en)
French (fr)
Inventor
刘波
梁学玉
Original Assignee
长鑫存储技术有限公司
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Application filed by 长鑫存储技术有限公司 filed Critical 长鑫存储技术有限公司
Priority to US17/807,020 priority Critical patent/US20230223288A1/en
Publication of WO2023130579A1 publication Critical patent/WO2023130579A1/zh

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    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means

Definitions

  • the present disclosure relates to semiconductor lithography equipment, in particular to a flow control device and an automatic liquid replenishment system.
  • LCWC liquid cooling water cabinet, lens cooling water cabinet
  • LCWC liquid cooling water cabinet
  • a flow control device and an automatic fluid replenishment system are provided.
  • the first aspect of the present disclosure provides a flow control device, comprising: a casing, including a drain hole, located at the bottom of the casing; a liquid inlet pipe, connected to the top of the casing; and a motor, located inside the casing;
  • the lock-flow blade and several flow control blades are connected with the motor, and each flow control blade is provided with water leakage holes of different sizes; the motor drives the flow control blade and the lock-flow blade to rotate to align different water leakage holes with the water hole, or Block the water hole; the liquid outlet pipe is connected with the water hole.
  • a filter membrane is also arranged in the casing, which is located above the motor and the flow control vanes.
  • the second aspect of the present disclosure discloses an automatic liquid replenishment system, comprising: the flow control device in any one of the above embodiments; a liquid supply device connected to a liquid inlet pipe for supplying liquid; a controller, Connected with the flow control device, the controller is configured to: control the rotation of the motor to rotate the lock-flow blade or the flow control blade above the water hole; the liquid buffer tank is connected to the liquid outlet pipe; the liquid tank is located in the liquid buffer tank Below, it is used to hold liquids.
  • the shape of the liquid buffer tank includes a cylinder, a cube, a sphere or an ellipsoid.
  • liquid buffer tanks there are one or more liquid buffer tanks and flow control devices.
  • the bottom or side wall of the liquid buffer tank is provided with several drainage holes, and the heights of the drainage holes are the same or different;
  • the automatic liquid replenishment system also includes: several drainage tubes, the drainage tubes are connected with the drainage holes for Drain the liquid in the liquid buffer tank to the side wall of the liquid tank.
  • the liquid buffer tanks communicate with each other through a drainage tube.
  • the automatic liquid replenishment system further includes: a flow meter disposed on the liquid inlet pipe, and the flow meter is configured to collect flow data and send the flow data to the controller.
  • the automatic replenishment system further includes: a liquid level measuring device, arranged in the liquid tank; the liquid level measuring device is configured to: measure the liquid level of the liquid in the liquid tank, and send the liquid level to the control device.
  • the liquid level measuring device includes a piezoresistive strain gauge, and the piezoresistive strain gauge is arranged at the bottom of the liquid tank.
  • the controller is configured to: record the flow data and the change amount of the liquid level within a preset time period; Consumption rate and consumption.
  • the lower limit value of the liquid level and the upper limit value of the liquid level are stored in the controller, and the controller is configured to: if the height of the liquid level reaches the lower limit value of the liquid level, generate a liquid replenishment instruction, and send the liquid replenishment instruction sent to the flow control device; if the liquid level reaches the upper limit of the liquid level, a lock flow command is generated and sent to the flow control device; the flow control device is configured to rotate the flow control blade according to the liquid replenishment command To the top of the drain hole, or according to the lock flow command, rotate the lock flow blade to the top of the drain hole.
  • a standard consumption rate interval of the liquid is stored in the controller; the controller is configured to generate an alarm signal if the consumption rate exceeds the standard consumption rate interval.
  • a preset target liquid level is stored in the controller, and the controller is configured to: generate a flow adjustment instruction according to the preset target liquid level, flow data and consumption rate, and send the flow adjustment instruction to the flow
  • the control device the flow control device increases or decreases the flow of the liquid based on the flow adjustment command, so that the liquid level is equal to or close to the preset target liquid level.
  • the automatic liquid replenishment system further includes: a display device connected to the controller; the display device is configured to display flow data, liquid level, consumption rate and consumption.
  • Embodiments of the present disclosure may/at least have the following advantages:
  • the above-mentioned flow control device drives the flow control blades to rotate through the motor, aligns the water leakage holes of different sizes with the water holes, and adjusts the liquid flow with a small change, which can slowly increase the liquid flow and avoid excessive changes in the liquid flow that cause Fluctuation in temperature reduces the impact of liquid replenishment operation on machine productivity.
  • the above-mentioned automatic liquid replenishment system can precisely control and adjust the flow of liquid entering the liquid tank by setting the controller and flow control device, so as to avoid excessive liquid flow during the liquid replenishment operation, which will cause fluctuations in liquid temperature and affect the normal operation of the machine. and, by setting the liquid buffer tank, the impact force when the liquid enters the liquid tank can be further buffered, and the influence of the liquid replenishment operation on the liquid temperature can be reduced.
  • FIG. 1 is a schematic structural diagram of a flow control device in an embodiment of the present disclosure.
  • FIG. 2 is a schematic structural diagram of a current limiter in an embodiment of the present disclosure.
  • Fig. 3 is a schematic structural diagram of an automatic fluid replenishment system in an embodiment of the present disclosure.
  • 4a and 4b are structural schematic diagrams of a liquid buffer tank in an embodiment of the present disclosure.
  • Fig. 5 is a schematic structural diagram of an automatic fluid replenishment system in another embodiment of the present disclosure.
  • FIG. 6 is a schematic diagram of a display interface displaying a consumption rate curve in an embodiment of the present disclosure.
  • FIG. 7 is a schematic diagram of a display interface for displaying liquid level in an embodiment of the present disclosure.
  • connection or “connected” should be interpreted in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integrated Connection; it can be a direct connection, or an indirect connection through an intermediary, or an internal connection between two components.
  • connection or “connected” should be interpreted in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integrated Connection; it can be a direct connection, or an indirect connection through an intermediary, or an internal connection between two components.
  • an embodiment of the present disclosure discloses a flow control device 10 .
  • the flow control device 10 can be used to control the flow of liquid, for example, the flow control device 10 can be applied to the liquid replenishment system of LCWC to regulate the liquid replenishment speed of the machine cooling water.
  • the flow control device 10 may include: a housing 11, including a drain hole 111, located at the bottom of the housing 11; a liquid inlet pipe 12, communicating with the top of the housing 11; a motor 141, located inside the housing 11; Blade 142 and some flow control blades 143 are connected with motor 141, and each flow control blade 143 is provided with leak holes of different sizes; Quasi water hole 111, or block water hole 111; liquid outlet pipe 15 communicates with water hole 111.
  • the motor 141 may be a micro motor.
  • the motor 141 can drive the flow control vane 143 to rotate, and align the water leakage holes of different sizes with the water hole 111 to realize the adjustment of the liquid flow. For example, when the liquid flow needs to be adjusted down, the motor 141 can be controlled to drive the flow control blade 143 to rotate, and the smaller leak hole is rotated to the top of the water hole 111; when the liquid flow needs to be increased, the motor 141 can be controlled to drive the flow control blade 143 rotations, the larger leakage hole is rotated to the top of the water hole 111.
  • the shapes of the water leakage holes on the respective flow control blades 143 may be the same or different, for example, the water leakage holes may be circular, oval or trapezoidal.
  • the area of each leaking hole can be increased from the smallest leaking hole, and the area value increased each time determines the adjustment accuracy of the flow control device 10 .
  • the operator can set the number of flow control vanes 143 according to actual needs, and strike a balance between cost and precision. For example, when it is necessary to stop the liquid replenishment operation, the lock-flow blade 142 can be rotated above the water discharge hole 111 to completely block the water discharge hole 111 . At this time, the liquid flow rate is zero, and the liquid replenishment process ends.
  • the lock-flow vane and the flow control vane can be of an integral piece structure, and a plurality of leakage holes are provided on the integral structure.
  • the accuracy of the flow control device is ensured.
  • the operator controls the motor according to the needs, and drives the one-piece structure to rotate, so that the leakage hole communicates with the water hole to realize fluid replacement.
  • a certain lock-flow area is reserved on the one-piece mechanism.
  • the motor is continuously controlled to drive the one-piece structure to rotate, so that the lock-flow area is located above the drain hole, the drain hole is blocked, and the fluid replenishment is stopped.
  • the above-mentioned flow control device 10 adjusts the liquid flow with a small amount of change by aligning the leakage holes of different sizes with the water hole 111, so that the liquid replenishment process is closer and softer, and avoids fluctuations in the temperature of the machine caused by excessive changes in the liquid flow. The impact of liquid replenishment operation on machine productivity is reduced.
  • the housing 11 of the flow control device 10 is further provided with a filter membrane 13 located above the motor 141 and the flow control vane 143 .
  • the filter membrane 13 may use a PP cotton filter element to filter impurities in the liquid. Moreover, by arranging the filter membrane 13 above the flow control vane 143, the liquid entering the flow control device 10 can be buffered and the flow velocity of the liquid can be reduced.
  • an embodiment of the present disclosure also discloses an automatic fluid replenishment system, as shown in FIG. 3 .
  • the automatic replenishment system includes: the flow control device 10 in any of the above-mentioned embodiments; the liquid supply device 21, which is connected to the liquid inlet pipe 12, and is used to provide liquid; the controller (not shown in the figure), and The flow control device 10 is connected, and the controller is configured to: control the rotation of the motor 141 to rotate the lock-flow blade 142 or the flow control blade 143 above the water hole 111; the liquid buffer tank 23 is connected to the liquid outlet pipe 15; the liquid The tank 25 is located under the liquid buffer tank 23 and is used to hold the liquid.
  • the liquid supply device 21 may be a water supply pipeline at the service end, for providing pure water to the automatic liquid replenishment system.
  • the liquid supply device 21 can also provide other required liquids, such as some chemical reagents.
  • the liquid supply device 21 provides pure water to the automatic liquid replenishment system as an example for illustration.
  • the liquid supply device 21 is connected to the liquid inlet pipe 12 of the flow control device 10.
  • the first buffer is realized through flow control, and then flows through the liquid outlet pipe 15 to
  • the liquid buffer tank 23 realizes the second buffer, and then flows into the liquid tank 25 .
  • the velocity of the water flowing into the liquid tank 25 is greatly reduced, the impact force is obviously reduced, and the influence on the water temperature in the liquid tank 25 is reduced.
  • the adjustment of fluid flow is controlled by a controller (not shown in the figure).
  • the controller is connected with the flow control device 10 to control the rotation of the motor 141 , and the motor 141 drives the lock-flow blade 142 or the flow control blade 143 to rotate above the water hole 111 .
  • different flow control blades 143 correspond to different liquid flow rates.
  • the above-mentioned automatic liquid replenishment system can accurately control and adjust the flow of liquid entering the liquid tank 25 by controlling the flow control device 10, so as to avoid excessive liquid flow during the liquid replenishment operation, causing liquid temperature fluctuations and affecting the normal operation of the machine; Moreover, by setting the liquid buffer tank 23 , the secondary buffering of the liquid can be realized, preventing the liquid replenishment operation from causing large fluctuations in the temperature of the liquid in the liquid tank 25 .
  • the shape of the liquid buffer tank 23 may include a cylinder and a cube.
  • the shape of the liquid buffer tank 23 can also be a sphere or an ellipsoid.
  • the liquid buffer tank 23 can be made of stainless steel, which is corrosion-resistant and has high cleanliness.
  • the numbers of the liquid buffer tanks 23 and the flow control devices 10 are equal, and the liquid buffer tanks 23 and the flow control devices 10 are connected in one-to-one correspondence.
  • the number of the flow control device 10 can be set to one, and the number of the liquid buffer tanks 23 can be set to multiple, and the flow control device 10 is equipped with a plurality of liquid outlet pipes 15 connected to each liquid buffer tank 23, so that the liquid After being dispersed into a plurality of liquid buffer tanks 23 for buffering, it flows into the liquid tank 25 to enhance the buffering effect.
  • the number of the flow control device 10 can be set to be multiple, and the number of the liquid buffer tank 23 can be set to one. The present disclosure does not limit the quantity of the liquid buffer tank 23 and the flow control device 10 .
  • the bottom or the side wall of the liquid buffer tank 23 is provided with several drainage holes 231, and the heights of the drainage holes 231 are the same or different.
  • the automatic liquid replenishment system further includes several drain tubes 24 connected to the drain holes 231 for draining the liquid in the liquid buffer tank 23 to the side wall of the liquid tank 25 .
  • the drainage tube 24 may be made of stainless steel to improve corrosion resistance and cleanliness.
  • the height of the cylindrical liquid buffer tank 23 may be 20mm-50mm, such as 20mm, 30mm, 40mm or 50mm.
  • the diameter of the cylinder may be between 20mm-40mm, such as 20mm, 30mm or 40mm.
  • the side length of the cubic liquid buffer tank 23 may be 20mm-50mm, such as 20mm, 30mm, 40mm or 50mm.
  • the drain hole 231 is connected to the drain tube 24 to drain the liquid to the side wall of the liquid tank 25 .
  • the heights of the drainage holes 231 can be the same or different.
  • the distance between the drainage hole 231 and the bottom of the tank may be between 0mm-10mm.
  • the heights of the drainage holes 231 are different.
  • the liquid in the liquid buffer tank 23 can be released in stages to realize the buffering of the liquid flow rate; at the same time, the liquid is drained to the side wall of the liquid tank 25 through the drainage tube 24, so that the liquid Slowly flowing into the liquid tank 25 along the side wall can further buffer the liquid flow rate, so that the liquid with the same flow rate can be injected into the liquid tank 25 at a slower speed, avoiding violent fluctuations in the water temperature, and ensuring the smoothness of the machine during the liquid replenishment process. normal operation.
  • the diameters of the drainage holes 231 are the same or different, and the diameter of the drainage tube 24 matches the diameter of the drainage holes 231 .
  • the liquid buffer tanks 23 communicate with each other through a drainage tube 24 .
  • the height of the drainage tube 24 connected to the liquid buffer tank 23 is lower than that of other drainage tubes 24 .
  • Each liquid buffer tank 23 is communicated by the drain tube 24, and the liquid flow flowing into the liquid buffer tank 23 can be averaged.
  • the liquid in the liquid buffer tank 23 is drained to other liquid buffer tanks 23 , and then drained to the side wall of the liquid tank 25 through each drain tube 24 , which slows down the flow rate of the liquid entering the liquid tank 25 .
  • the automatic liquid replenishment system further includes: a flow meter 22 disposed on the liquid inlet pipe 12 , and the flow meter 22 is configured to collect flow data and send the flow data to the controller.
  • the flow meter 22 can count the amount of water injected into the liquid tank 25 within a period of time, and send the flow data to the controller for storage. By setting the flow meter 22 on the liquid inlet pipe 12, the flow rate of each liquid inlet pipe 12 can be obtained in real time.
  • the automatic liquid replenishment system further includes: a liquid level measuring device 26, which is arranged in the liquid tank 25; the liquid level measuring device 26 is configured to: measure the liquid level of the liquid in the liquid tank 25 height, and send the liquid level height to the controller.
  • the liquid level measuring device 26 may be a piezoresistive strain gauge, and the piezoresistive strain gauge is arranged at the bottom of the liquid tank 25 .
  • the hydraulic pressure value F at the bottom of the liquid tank 25 is measured by piezoresistive strain gauges, and then the liquid height in the liquid tank 25 is calculated according to the following formula.
  • P is the pressure
  • s is the area of the piezoresistive strain gauge
  • ⁇ is the density of the liquid
  • g is the acceleration of gravity
  • h is the height of the liquid.
  • the liquid level in the liquid tank 25 can be obtained in real time, so as to judge whether liquid replacement is required according to the liquid level.
  • the controller is configured to: record the flow data and the variation of the liquid level within a preset time period; calculate the liquid consumption within the preset time period according to the flow data and the variation of the liquid level rate and consumption.
  • the liquid level in the liquid tank 25 will continue to decrease as time increases.
  • the cooling water consumption rate of the machine under normal operation is v
  • the product of the time length T and the cooling water consumption rate v of the machine is the amount of cooling water V1 consumed by the machine within the time length.
  • the machine is also consuming cooling water while the liquid replenishment operation is being performed, and the liquid level in the liquid tank 25 will increase after a time T, and the liquid level can be measured by the liquid level measuring device 26 The increase in height ⁇ h.
  • the bottom surface area of the liquid tank 25 is S. According to the formula
  • V2-V1 S ⁇ h
  • the cooling water consumption rate v of the machine within the time length T can be calculated.
  • the automatic liquid replenishment system further includes a display device for displaying information such as liquid consumption rate, consumption, liquid level and flow data, so as to facilitate users to intuitively obtain the operation device of the liquid replenishment system.
  • a standard consumption rate interval of the liquid is stored in the controller; the controller is configured to generate an alarm signal if the consumption rate exceeds the standard consumption rate interval.
  • the controller stores a standard consumption rate range of cooling water when the machine is working normally.
  • the controller can compare the calculated consumption rate b with the standard consumption rate interval a-c, and when the consumption rate b exceeds the consumption rate interval a-c stored in the controller, the controller controls the alarm device to send an alarm signal. For example, when the measured consumption rate b is greater than the maximum value c of the standard consumption rate interval a-c, then there may be a water leakage fault in the liquid tank 25; when the measured consumption rate b is less than the minimum value a of the standard consumption rate interval a-c , it may be that there is a problem with the operation of the machine.
  • the display interface of the display device may include a consumption rate curve button and a liquid level button.
  • the user can obtain the consumption rate curve b within the time interval by clicking the consumption rate curve button, and then selecting the time interval to be queried.
  • the curve of the standard consumption rate interval a-c may also be displayed, so that the user can intuitively judge whether the liquid consumption rate b is normal.
  • the value corresponding to the current consumption rate curve b of the coolant is 0.3ml/min
  • the standard consumption rate range a-c is 0.28ml/min-0.32ml/min.
  • 0.3ml/min is between 0.28ml/min-0.32ml/min, indicating that the consumption rate of the coolant is normal, that is, the machine is operating normally.
  • the lower limit value of the liquid level and the upper limit value of the liquid level are stored in the controller, and the controller is configured to: if the height of the liquid level reaches the lower limit value of the liquid level, generate a liquid replenishment instruction, and send the liquid replenishment instruction sent to the flow control device 10; if the liquid level reaches the upper limit of the liquid level, a lock flow command is generated and sent to the flow control device 10; the flow control device 10 is configured to: The control blade 143 is rotated to be above the water hole 111 , or the lock flow blade 142 is rotated to be above the water hole 111 according to the lock flow command.
  • the flow can be locked in time, or when the liquid level height drops to the lower limit value of the liquid level, the replenishment operation can be started in time; Realize automatic operation without human intervention.
  • the display interface can be switched to a schematic diagram of the liquid level, and information such as the current capacity of the liquid tank 25, the liquid level, and the current month's liquid consumption can be displayed at the same time.
  • the positions of the upper limit value and the lower limit value of the liquid level can also be marked in the figure, and the user can intuitively obtain the current liquid level height, which is convenient for the user to make a decision whether to replenish the liquid or stop the liquid replenishment.
  • a preset target liquid level is stored in the controller, and the controller is configured to: generate a flow adjustment instruction according to the preset target liquid level, flow data and consumption rate, and send the flow adjustment instruction to the flow control The device 10; the flow control device 10 increases or decreases the flow of the liquid based on the flow adjustment command, so that the liquid level is equal to or close to the preset target liquid level.
  • the preset target liquid level is marked with a dotted line.

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Abstract

本发明涉及一种流量控制装置和自动补液系统。流量控制装置包括：壳体，包括下水孔，位于壳体底部；进液管，与壳体的顶部相连通；电机，位于壳体内部；锁流叶片和若干流量控制叶片，与电机相连接，各流量控制叶片上设置有大小不同的漏水孔；电机带动流量控制叶片和锁流叶片旋转，以将不同的漏水孔对准下水孔，或封堵下水孔；出液管，与下水孔相连通。上述流量控制装置，通过电机带动流量控制叶片旋转，将不同大小的漏水孔对准下水孔，以较小的变化量地调整液体流量，可以缓慢增加液体流量，避免液体流量变化过大造成机台温度的波动，减小了补液操作对机台产能的影响。

Description

流量控制装置和自动补液系统
相关申请的交叉引用
本公开要求于2022年01月10日提交中国专利局、申请号为202210020964.7的中国专利的优先权，所述专利申请的全部内容通过引用结合在本公开中。
技术领域
本公开涉及半导体光刻设备，特别是涉及一种流量控制装置和自动补液系统。
背景技术
LCWC(lens cooling water cabinet，镜头冷却水柜)用于为主机台提供冷却水，保证机台的正常运转。随着冷却水的消耗，LCWC的水位不断下降，当水位低于补水界面(refill)时系统会发出补水信号，提醒工作人员到现场进行手动补水。
但是，手动补水容易造成补水速度过快，造成水温剧烈波动，影响机台的正常运转，机台需要3-5小时才能重新进入生产状态，造成了一定的产能损失。
发明内容
根据本公开的各种实施例，提供一种流量控制装置和自动补液系统。
根据一些实施例，本公开第一方面提供一种流量控制装置，包括：壳体，包括下水孔，位于壳体底部；进液管，与壳体的顶部相连通；电机，位于壳体内部；锁流叶片和若干流量控制叶片，与电机相连接，各流量控制叶片上设置有大小不同的漏水孔；电机带动流量控制叶片和锁流叶片旋转，以将不 同的漏水孔对准下水孔，或封堵下水孔；出液管，与下水孔相连通。
在其中一个实施例中，壳体中还设置有过滤膜，位于电机和流量控制叶片的上方。
根据一些实施例，本公开第二方面公开了一种自动补液系统，包括：上述任一实施例中的流量控制装置；供液装置，与进液管相连接，用于提供液体；控制器，与流量控制装置相连接，控制器被配置为：控制电机转动，以将锁流叶片或流量控制叶片旋转至下水孔上方；液体缓冲槽，与出液管相连接；液体箱，位于液体缓冲槽下方，用于盛放液体。
在其中一个实施例中，液体缓冲槽的形状包括圆柱体、正方体、球体或椭球体。
在其中一个实施例中，液体缓冲槽和流量控制装置的数量为一个或多个。
在其中一个实施例中，液体缓冲槽的底部或侧壁设置有若干引流孔，各引流孔的高度相同或不同；自动补液系统还包括：若干引流管，引流管与引流孔相连接，用于将液体缓冲槽中的液体引流至液体箱的侧壁。
在其中一个实施例中，液体缓冲槽之间通过引流管连通。
在其中一个实施例中，自动补液系统还包括：流量计，设置于进液管上，流量计被配置为：采集流量数据，并将流量数据发送至控制器。
在其中一个实施例中，自动补液系统还包括：液位测量装置，设置于液体箱中；液位测量装置被配置为：测量液体箱中液体的液位高度，并将液位高度发送至控制器。
在其中一个实施例中，液位测量装置包括压敏电阻应变片，压敏电阻应变片设置于液体箱底部。
在其中一个实施例中，控制器被配置为：记录预设时间段内的流量数据和液位高度的变化量；根据流量数据和液位高度的变化量，计算得到预设时间段内液体的消耗速率和消耗量。
在其中一个实施例中，控制器中存储有液位下限值和液位上限值，控制器被配置为：若液位高度达到液位下限值，则生成补液指令，并将补液指令 发送至流量控制装置；若液位高度达到液位上限值，则生成锁流指令，并将锁流指令发送至流量控制装置；流量控制装置被配置为：根据补液指令，将流量控制叶片旋转至下水孔上方，或根据锁流指令，将锁流叶片旋转至下水孔上方。
在其中一个实施例中，控制器内存储有液体的标准消耗速率区间；控制器被配置为：若消耗速率超出标准消耗速率区间，则生成报警信号。
在其中一个实施例中，控制器中存储有预设目标液位，控制器被配置为：根据预设目标液位、流量数据和消耗速率，生成流量调节指令，并将流量调节指令发送至流量控制装置；流量控制装置基于流量调整指令，调大或调小液体的流量，以使得液位高度等于或接近预设目标液位。
在其中一个实施例中，自动补液系统还包括：显示装置，与控制器相连接；显示装置被配置为：显示流量数据、液位高度、消耗速率和消耗量。
本公开实施例可以/至少具有以下优点：
上述流量控制装置，通过电机带动流量控制叶片旋转，将不同大小的漏水孔对准下水孔，以较小的变化量地调整液体流量，可以缓慢增加液体流量，避免液体流量变化过大造成机台温度的波动，减小了补液操作对机台产能的影响。
上述自动补液系统，通过设置控制器和流量控制装置，可以精确地控制和调整进入液体箱中的液体流量，避免在进行补液操作时液体流量过大，引起液体温度波动，影响机台的正常运转；并且，通过设置液体缓冲槽，可以进一步缓冲液体进入液体箱时的冲击力，减小补液操作对液体温度造成的影响。
本公开的一个或多个实施例的细节在下面的附图和描述中提出。本公开的其他特征、目的和优点将从说明书、附图以及权利要求书变得明显。
附图说明
为了更清楚地说明本公开实施例的技术方案，下面将对实施例描述中所 需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本公开的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他实施例的附图。
图1为本公开一实施例中流量控制装置的结构示意图。
图2为本公开一实施例中限流器的结构示意图。
图3为本公开一实施例中自动补液系统的结构示意图。
图4a和图4b为本公开一实施例中液体缓冲槽的结构示意图。
图5为本公开另一实施例中自动补液系统的结构示意图。
图6为本公开一实施例中显示消耗速率曲线的显示界面示意图。
图7为本公开一实施例中显示液位高度的显示界面示意图。
具体实施方式
为了便于理解本公开，下面将参照相关附图对本公开进行更全面的描述。附图中给出了本公开的较佳的实施例。但是，本公开可以以许多不同的形式来实现，并不限于本文所描述的实施例。相反地，提供这些实施例的目的是使对本公开的公开内容的理解更加透彻全面。
除非另有定义，本文所使用的所有的技术和科学术语与属于本公开的技术领域的技术人员通常理解的含义相同。本文中在本公开的说明书中所使用的术语只是为了描述具体的实施例的目的，不是旨在限制本公开。本文所使用的术语“及/或”包括一个或多个相关的所列项目的任意的和所有的组合。
在描述位置关系时，除非另有规定，否则当一个元件例如层基板被指为在另一膜层“上”时，其能直接在其他膜层上或亦可存在中间膜层。进一步说，当层被指为在另一层“下”时，其可直接在下方，亦可存在一个或多个中间层。亦可以理解的是，当层被指为在两层“之间”时，其可为两层之间的唯一层，或亦可存在一个或多个中间层。本公开所称“上”、“下”是相对于触觉反馈模组在应用过程中与使用者靠近的程度而言，相对靠近使用者 的一侧为“上”，相对远离使用者的一侧为“下”。
在使用本文中描述的“包括”、“具有”、和“包含”的情况下，除非使用了明确的限定用语，例如“仅”、“由……组成”等，否则还可以添加另一部件。除非相反地提及，否则单数形式的术语可以包括复数形式，并不能理解为其数量为一。
在本公开的描述中，需要说明的是，除非另有明确规定和限定，术语“相连”或“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是直接连接，亦可以是通过中间媒介间接连接，可以是两个部件内部的连通。对于本领域的普通技术人员而言，可以具体情况理解上述术语在本公开中的具体含义。
此外，在本公开的描述中，除非另有说明，“多个”、“相互”、“叠合”、“层叠”和“若干”的含义是两个或两个以上。
如图1和图2所示，本公开的一个实施例公开了一种流量控制装置10。该流量控制装置10可以用于控制液体流量，例如，可以将该流量控制装置10应用于LCWC的补液系统中，以调控机台冷却水的补液速度。示例地，流量控制装置10可以包括：壳体11，包括下水孔111，位于壳体11底部；进液管12，与壳体11的顶部相连通；电机141，位于壳体11内部；锁流叶片142和若干流量控制叶片143，与电机141相连接，各流量控制叶片143上设置有大小不同的漏水孔；电机141带动流量控制叶片143和锁流叶片142旋转，以将不同的漏水孔对准下水孔111，或封堵下水孔111；出液管15，与下水孔111相连通。
其中，电机141、锁流叶片142和流量控制叶片143共同组成限流器14，如图2所示。示例地，电机141可以为微型电机。电机141可以带动流量控制叶片143进行旋转，将不同大小的漏水孔对准下水孔111，以实现对液体流量的调节。例如，当需要调小液体流量时，可以控制电机141带动流量控制叶片143旋转，将较小的漏水孔旋转至下水孔111上方；当需要调大液体流量时，可以控制电机141带动流量控制叶片143旋转，将较大的漏水孔旋转 至下水孔111上方。
示例地，各个流量控制叶片143上的漏水孔的形状可以相同或不同，例如，漏水孔可以为圆形、椭圆形或梯形。各个漏水孔的面积可以从最小的漏水孔开始递增，每次增加的面积值决定了流量控制装置10的调节精度。操作者可以根据实际需求设置流量控制叶片143的数量，在成本和精度之间取得平衡。示例地，当需要停止补液操作时，可以将锁流叶片142旋转至下水孔111上方，将下水孔111完全封堵，此时液体流量为零，补液过程结束。
在其他实施例中，锁流叶片和流量控制叶片可以为一体片式结构，一体片式结构上开设有多个漏水孔，漏水孔的大小不同，且相邻的漏水孔的截面面积之差决定了流量控制装置的精度，此时，操作者根据需要，控制电机，带动一体片式结构旋转，使得漏水孔与下水孔相通，实现补液。且一体片式机构上预留一定的锁流区域，当补液完成，继续控制电机，带动一体片式结构转动，使得锁流区域位于下水孔的上方，将下水孔封堵，停止补液。
上述流量控制装置10，通过将不同大小的漏水孔对准下水孔111，以较小的变化量地调整液体流量，使得补液过程更近柔和，避免液体流量变化过大造成机台温度的波动，减小了补液操作对机台产能的影响。
在一个实施例中，请继续参考图1，流量控制装置10的壳体11中还设置有过滤膜13，位于电机141和流量控制叶片143的上方。
示例地，过滤膜13可以采用PP棉滤芯，以过滤液体中的杂质。并且，通过在流量控制叶片143上方设置过滤膜13，可以对进入流量控制装置10的液体进行缓冲，减小液体流速。
本公开的一个实施例还公开了一种自动补液系统，如图3所示。具体地，该自动补液系统包括：上述任一实施例中的流量控制装置10；供液装置21，与进液管12相连接，用于提供液体；控制器(图中未示出)，与流量控制装置10相连接，控制器被配置为：控制电机141转动，以将锁流叶片142或流量控制叶片143旋转至下水孔111上方；液体缓冲槽23，与出液管15相连接；液体箱25，位于液体缓冲槽23下方，用于盛放液体。
示例地，供液装置21可以是厂务端的供水管路，用于向自动补液系统提供纯净水。可选地，供液装置21还可以提供其他所需液体，例如一些化学试剂。
在本实施例中，以供液装置21向自动补液系统提供纯净水为例进行说明。如图3所示，供液装置21与流量控制装置10的进液管12相连接，纯净水流到流量控制装置10后，经过流量调控实现第一次缓冲，然后再通过出液管15流至液体缓冲槽23，实现第二次缓冲，然后再流入液体箱25。经过两次缓冲，流入液体箱25的水流速度大大下降，冲击力明显降低，减小了对液体箱25中的水温的影响。
在整个补液的过程中，液体流量的调节由控制器(图中未示出)控制。控制器与流量控制装置10相连接，以控制电机141转动，电机141带动锁流叶片142或流量控制叶片143旋转至下水孔111的上方。示例地，不同的流量控制叶片143对应不同的液体流量。通过将液体流量控制在较小的范围内，可以避免短时间内向液体箱25中注入较多的水，防止水温产生较大波动。
上述自动补液系统，通过控制流量控制装置10，可以精确地控制和调整进入液体箱25中的液体流量，避免在进行补液操作时液体流量过大，引起液体温度波动，影响机台的正常运转；并且，通过设置液体缓冲槽23，可以实现对液体的二次缓冲，防止补液操作对液体箱25中的液体温度造成较大波动。
在一个实施例中，如图4a和图4b所示，液体缓冲槽23的形状可以包括圆柱体和正方体。可选地，液体缓冲槽23的形状还可以是球体或椭球体。示例地，液体缓冲槽23可以采用不锈钢材质，耐腐蚀且洁净度高。
在一个实施例中，液体缓冲槽23和流量控制装置10的数量为一个或多个。作为示例，液体缓冲槽23和流量控制装置10的数量相等，且液体缓冲槽23和流量控制装置10一一对应连接。可选地，可以将流量控制装置10的数量设置为一个，液体缓冲槽23的数量设置为多个，流量控制装置10配置多个出液管15分别连接至各个液体缓冲槽23，以将液体分散至多个液体缓 冲槽23进行缓冲后流入液体箱25，加强缓冲效果。可选地，可以将流量控制装置10的数量设置为多个，液体缓冲槽23的数量设置为一个。本公开对液体缓冲槽23和流量控制装置10的数量不做限制。
通过调整液体缓冲槽23和流量控制装置10的数量，可以设计多种补液方案，以适应不同的补液需求。
在一个实施例中，如图4a和图4b所示，液体缓冲槽23的底部或侧壁设置有若干引流孔231，各引流孔231的高度相同或不同。如图5所示，自动补液系统还包括若干引流管24，引流管24与引流孔231相连接，用于将液体缓冲槽23中的液体引流至液体箱25的侧壁。
示例地，引流管24可以采用不锈钢材质，以提高耐腐蚀度和洁净度。
示例地，如图4a和图4b所示，圆柱状的液体缓冲槽23的高度可以为20mm-50mm，例如为20mm、30mm、40mm或50mm。圆柱的直径可以在20mm-40mm之间，例如为20mm、30mm或40mm。立方体的液体缓冲槽23的边长可以为20mm-50mm，例如为20mm、30mm、40mm或50mm。
示例地，如图5所示，引流孔231与引流管24相连接，将液体引流至液体箱25的侧壁。各个引流孔231的高度可以相同，也可以不同。作为示例，引流孔231距离水槽底部距离可以在0mm-10mm之间。
作为示例，各个引流孔231的高度不同。通过将引流孔231设置在不同的高度，可以将液体缓冲槽23中的液体分阶段放出，实现对液体流速的缓冲；同时，通过引流管24将液体引流至液体箱25的侧壁，使得液体沿着侧壁缓慢流入液体箱25，可以实现对液体流速的进一步缓冲，使相同流量的液体以更缓慢的速度注入液体箱25中，避免引起水温的剧烈波动，保证机台在补液过程中的正常运转。
在一个实施例中，各个引流孔231的直径相同或不同，引流管24与引流孔231的直径相匹配。通过调整引流孔231的直径，并为各个引流孔231配备相匹配的引流管24，可以提供更加丰富的补液方案，调整液体流出液体缓冲槽23的速率。
在一个实施例中，请继续参考图5，液体缓冲槽23之间通过引流管24连通。示例地，连接液体缓冲槽23的引流管24的高度低于其他引流管24的高度。通过引流管24将各个液体缓冲槽23连通，可以将流至液体缓冲槽23中的液体流量进行平均，当进入某个液体缓冲槽23中的液体流量过大时，通过引流管24可以将进入该液体缓冲槽23的液体引流至其他液体缓冲槽23，再经过各个引流管24引流至液体箱25的侧壁，减缓了进入液体箱25的液体流速。
在一个实施例中，请继续参考图5，自动补液系统还包括：流量计22，设置于进液管12上，流量计22被配置为：采集流量数据，并将流量数据发送至控制器。
示例地，流量计22可以统计一段时间内注入液体箱25的水量，并将流量数据发送至控制器进行存储。通过在进液管12上设置流量计22，可以实时获取各个进液管12的流量。
在其中一个实施例中，请继续参考图5，自动补液系统还包括：液位测量装置26，设置于液体箱25中；液位测量装置26被配置为：测量液体箱25中液体的液位高度，并将液位高度发送至控制器。
示例地，如图5所示，液位测量装置26可以是压敏电阻应变片，压敏电阻应变片设置于液体箱25底部。具体地，通过压敏电阻应变片测量得到液体箱25底部的液压值F，然后根据下列公式计算得到液体箱25中的液体高度。
F＝P·s；
P＝ρ·g·h；
其中，P为压强，s为压敏电阻应变片的面积，ρ为液体密度，g为重力加速度，h为液体高度。
通过在液体箱25中设置液位测量装置26，可以实时获取液体箱25中的液位高度，便于根据液位高度判断是否需要补液。
在一个实施例中，控制器被配置为：记录预设时间段内的流量数据和液位高度的变化量；根据流量数据和液位高度的变化量，计算得到预设时间段 内液体的消耗速率和消耗量。
示例地，当机台处于正常运转的状态时，需要不断消耗冷却水。因此，当没有执行补液操作时，液体箱25中的液位高度会随着时间的增加不断下降。假设正常运转状态下的机台的冷却水消耗速率为v，那么时间长度T与机台的冷却水消耗速率v的乘积，即为该时间长度内机台消耗的冷却水的量V1。
当执行补液操作时，通过进液管12不断向液体箱25中输入新的冷却水，通过流量计22可以实时采集进液管12内的流量数据。控制器根据流量数据在时间上的累积，可以获得时间长度T内注入液体箱25中的冷却水的量V2。
以V2大于V1为例进行说明，在执行补液操作的同时，机台也在消耗冷却水，经过时间T后液体箱25内的液位高度会增加，通过液位测量装置26可以测得液位高度的增加量△h。液体箱25的底面面积为S。根据公式
V2-V1＝S·△h
可以计算出时间长度T内机台对冷却水的消耗速率v。时间长度T内机台对冷却水的消耗量V1可以根据公式V1＝v·T计算得到。
在一个实施例中，自动补液系统还包括显示装置，用于显示液体的消耗速率、消耗量、液位高度和流量数据等信息，便于用户直观地获取补液系统的运行装置。
在一个实施例中，控制器内存储有液体的标准消耗速率区间；控制器被配置为：若消耗速率超出标准消耗速率区间，则生成报警信号。
示例地，控制器中存储有机台正常工作时对冷却水的标准消耗速率区间。控制器可以将计算得到的消耗速率b与该标准消耗速率区间a-c进行对比，当消耗速率b超出控制器中存储的消耗速率区间a-c后，控制器控制报警装置发出报警信号。例如，当测量到的消耗速率b大于该标准消耗速率区间a-c的最大值c，则可能是液体箱25出现了漏水故障；当测量到的消耗速率b小于该标准消耗速率区间a-c的最小值a，则可能是机台运转出现了问题。
示例地，如图6所示，显示装置的显示界面可以包括消耗速率曲线按钮 和液位高度按钮。用户通过点击消耗速率曲线按钮，然后选择想要查询的时间区间，即可获得该时间区间内的消耗速率曲线b。可选地，在显示消耗速率曲线b的同时，还可以显示标准消耗速率区间a-c的曲线，以便于用户直观地判断液体消耗速率b是否正常。作为示例，当前冷却液的消耗速率曲线b对应的数值为0.3ml/min，标准消耗速率区间a-c为0.28ml/min-0.32ml/min。0.3ml/min位于0.28ml/min-0.32ml/min之间，表示冷却液的消耗速率正常，即机台运行正常。
通过设置标准消耗速率区间，并在消耗速率超出标准消耗速率区间时生成报警信号，可以及时提醒操作人员对补液系统进行检查，提高了系统的安全性，避免液体箱25发生泄漏而长时间未被发现。
在其中一个实施例中，控制器中存储有液位下限值和液位上限值，控制器被配置为：若液位高度达到液位下限值，则生成补液指令，并将补液指令发送至流量控制装置10；若液位高度达到液位上限值，则生成锁流指令，并将锁流指令发送至流量控制装置10；流量控制装置10被配置为：根据补液指令，将流量控制叶片143旋转至下水孔111上方，或根据锁流指令，将锁流叶片142旋转至下水孔111上方。
通过设置液位上限值和液位下限值，可以在液位高度到达液位上限值时，及时锁流，或者在液位高度降至液位下限值时，及时启动补液操作；实现自动化操作，无需人工参与。
示例地，如图7所示，通过点击液位高度按钮，可以将显示界面切换至液位高度示意图，同时显示当前液体箱25的容量、液位高度和本月液体消耗量等信息。具体地，还可以在图中标识出液位上限值和液位下限值的位置，用户可以直观地获取当前的液位高度，便于用户做出是否需要补液或停止补液的决定。
在一个实施例中，控制器中存储有预设目标液位，控制器被配置为：根据预设目标液位、流量数据和消耗速率，生成流量调节指令，并将流量调节指令发送至流量控制装置10；流量控制装置10基于流量调整指令，调大或 调小液体的流量，以使得液位高度等于或接近预设目标液位。
如图7所示，预设目标液位用虚线标出。通过设置预设目标液位，并根据预设目标液位、流量数据和消耗速率对进液流量进行调节，将液体箱25中的液体始终维持在预设目标液位附近，可以确保为机台提供充足且稳定的液体供应。
以上所述实施例的各技术特征可以进行任意的组合，为使描述简洁，未对上述实施例中的各个技术特征所有可能的组合都进行描述，然而，只要这些技术特征的组合不存在矛盾，都应当认为是本说明书记载的范围。
以上所述实施例仅表达了本公开的几种实施方式，其描述较为具体和详细，但并不能因此而理解为对申请专利范围的限制。应当指出的是，对于本领域的普通技术人员来说，在不脱离本公开构思的前提下，还可以做出若干变形和改进，这些都属于本公开的保护范围。因此，本公开专利的保护范围应以所附权利要求为准。

Claims (15)

  1. 一种流量控制装置，包括：
    壳体，包括下水孔，位于所述壳体底部；
    进液管，与所述壳体的顶部相连通；
    电机，位于所述壳体内部；
    锁流叶片和若干流量控制叶片，与所述电机相连接，各流量控制叶片上设置有大小不同的漏水孔；所述电机带动所述流量控制叶片和所述锁流叶片旋转，以将不同的漏水孔对准所述下水孔，或封堵所述下水孔；
    出液管，与所述下水孔相连通。
  2. 根据权利要求1所述的流量控制装置，其中，所述壳体中还设置有过滤膜，位于所述电机和所述流量控制叶片的上方。
  3. 一种自动补液系统，包括：
    如权利要求1或2所述的流量控制装置；
    供液装置，与所述进液管相连接，用于提供液体；
    控制器，与所述流量控制装置相连接，所述控制器被配置为：控制所述电机转动，以将所述锁流叶片或所述流量控制叶片旋转至所述下水孔上方；
    液体缓冲槽，与所述出液管相连接；
    液体箱，位于所述液体缓冲槽下方，用于盛放所述液体。
  4. 根据权利要求3所述的自动补液系统，其中，所述液体缓冲槽的形状包括圆柱体、正方体、球体或椭球体。
  5. 根据权利要求3所述的自动补液系统，其中，所述液体缓冲槽和所述流量控制装置的数量为一个或多个。
  6. 根据权利要求5所述的自动补液系统，其中，所述液体缓冲槽的底部或侧壁设置有若干引流孔，各所述引流孔的高度相同或不同；所述自动补液系统还包括：
    若干引流管，所述引流管与所述引流孔相连接，用于将所述液体缓冲槽中的液体引流至所述液体箱的侧壁。
  7. 根据权利要求6所述的自动补液系统，其中，所述液体缓冲槽之间通过所述引流管连通。
  8. 根据权利要求3所述的自动补液系统，其中，还包括：
    流量计，设置于所述进液管上，所述流量计被配置为：采集流量数据，并将所述流量数据发送至所述控制器。
  9. 根据权利要求8所述的自动补液系统，其中，还包括：
    液位测量装置，设置于所述液体箱中；
    所述液位测量装置被配置为：测量所述液体箱中液体的液位高度，并将所述液位高度发送至所述控制器。
  10. 根据权利要求9所述的自动补液系统，其中，所述液位测量装置包括压敏电阻应变片，所述压敏电阻应变片设置于所述液体箱底部。
  11. 根据权利要求9所述的自动补液系统，其中，所述控制器被配置为：
    记录预设时间段内的所述流量数据和所述液位高度的变化量；
    根据所述流量数据和所述液位高度的变化量，计算得到所述预设时间段内所述液体的消耗速率和消耗量。
  12. 根据权利要求9所述的自动补液系统，其中，所述控制器中存储有液位下限值和液位上限值，所述控制器被配置为：
    若所述液位高度达到所述液位下限值，则生成补液指令，并将所述补液指令发送至所述流量控制装置；
    若所述液位高度达到所述液位上限值，则生成锁流指令，并将所述锁流指令发送至所述流量控制装置；
    所述流量控制装置被配置为：
    根据所述补液指令，将所述流量控制叶片旋转至所述下水孔上方，或根据所述锁流指令，将所述锁流叶片旋转至所述下水孔上方。
  13. 根据权利要求11所述的自动补液系统，其中，所述控制器内存储有所述液体的标准消耗速率区间；
    所述控制器被配置为：若所述消耗速率超出所述标准消耗速率区间，则 生成报警信号。
  14. 根据权利要求11所述的自动补液系统，其中，所述控制器中存储有预设目标液位，所述控制器被配置为：
    根据所述预设目标液位、所述流量数据和所述消耗速率，生成流量调节指令，并将所述流量调节指令发送至所述流量控制装置；
    所述流量控制装置基于所述流量调整指令，调大或调小所述液体的流量，以使得所述液位高度等于或接近所述预设目标液位。
  15. 根据权利要求11所述的自动补液系统，其中，还包括：显示装置，与所述控制器相连接；
    所述显示装置被配置为：显示所述流量数据、所述液位高度、所述消耗速率和所述消耗量。
PCT/CN2022/081507 2022-01-10 2022-03-17 流量控制装置和自动补液系统 WO2023130579A1 (zh)

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