WO2023119569A1 - Dispositif de capteur - Google Patents

Dispositif de capteur Download PDF

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Publication number
WO2023119569A1
WO2023119569A1 PCT/JP2021/047927 JP2021047927W WO2023119569A1 WO 2023119569 A1 WO2023119569 A1 WO 2023119569A1 JP 2021047927 W JP2021047927 W JP 2021047927W WO 2023119569 A1 WO2023119569 A1 WO 2023119569A1
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WIPO (PCT)
Prior art keywords
light source
source element
beams
light
group
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Application number
PCT/JP2021/047927
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English (en)
Japanese (ja)
Inventor
琢也 白戸
Original Assignee
パイオニア株式会社
パイオニアスマートセンシングイノベーションズ株式会社
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Application filed by パイオニア株式会社, パイオニアスマートセンシングイノベーションズ株式会社 filed Critical パイオニア株式会社
Priority to PCT/JP2021/047927 priority Critical patent/WO2023119569A1/fr
Publication of WO2023119569A1 publication Critical patent/WO2023119569A1/fr

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S7/00—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00
    • G01S7/48—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00 of systems according to group G01S17/00
    • G01S7/481—Constructional features, e.g. arrangements of optical elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S7/00—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00
    • G01S7/48—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00 of systems according to group G01S17/00
    • G01S7/483—Details of pulse systems
    • G01S7/486—Receivers
    • G01S7/4861—Circuits for detection, sampling, integration or read-out

Definitions

  • the present invention relates to sensor devices.
  • the sensor device includes a light source such as a pulse laser, a deflection unit such as a polygon mirror or a MEMS (Micro Electro Mechanical Systems) mirror, and a receiver such as an avalanche photodiode (APD).
  • the deflection section deflects the plurality of beams temporally repeatedly emitted from the light source section toward a plurality of spatially different measurement positions.
  • the receiver receives reflected light or scattered light from a plurality of measurement positions of a plurality of beams.
  • waveforms generated from a receiving unit are integrated in order to remove noise in the waveform generated from the receiving unit.
  • the inventors of the present application deflect a predetermined beam incident in a predetermined incident direction from a light source unit toward a predetermined measurement position existing in a predetermined irradiation direction by a deflection unit, and deflect the beam from the light source unit in a predetermined incident direction.
  • the waveform generated from the receiving unit by the reflected light or scattered light of the predetermined beam from the measurement position, and the waveform generated from the receiving unit by the reflected light or scattered light from the measurement position of the other predetermined beam waveforms can be integrated to increase the signal-to-noise ratio of these waveforms.
  • One example of the problem to be solved by the present invention is to identify which beam emitted from the light source unit originates the waveform generated in the receiving unit.
  • a light source deflecting a first beam incident in a predetermined first incident direction from the light source unit toward a first measurement position existing in a predetermined first irradiation direction; a deflection unit that deflects a second beam incident in a second incident direction different from the incident direction toward the first measurement position existing in substantially the same direction as the predetermined first irradiation direction; a first receiver that receives reflected light or scattered light from the first measurement position of the first beam; a second receiver that receives reflected light or scattered light from the first measurement position of the second beam; A waveform generated from the first receiving section by the reflected light or the scattered light of the first beam and a waveform generated from the second receiving section by the reflected light or the scattered light of the second beam are integrated.
  • a signal processing unit that A sensor device comprising:
  • each of a first group of beams incident in a predetermined first incident direction from the light source unit is deflected toward each of a plurality of measurement positions existing in a plurality of irradiation directions; a deflection unit that deflects each of the second group of beams incident in different second incident directions toward each of the plurality of measurement positions existing in substantially the same direction as the plurality of irradiation directions; a first receiver that receives reflected light or scattered light from each of the plurality of measurement positions of the first group of beams; a second receiver that receives reflected light or scattered light from each of the plurality of measurement positions of the second group of beams; with In the sensor device, 90% or more of the area where the point group is formed by the second group of beams overlaps 90% or more of the area where the point group is formed by the first group of beams.
  • FIG. 4 is a diagram showing an example of a timing chart of pulse triggering of the first light source element and a timing chart of pulse triggering of the second light source element in the normal mode of the sensor device according to the embodiment; It is a figure for demonstrating an example of operation
  • FIG. 5 is a diagram showing an example of a timing chart of irradiation directions of beams from a deflector in a normal mode of the sensor device according to the embodiment; FIG.
  • FIG. 5 is a diagram showing an example of a timing chart of irradiation directions of beams from a deflection unit in the first high resolution mode of the sensor device according to the embodiment
  • FIG. 10 is a diagram showing an example of a timing chart of irradiation directions of beams from the deflection unit in the second high-resolution mode of the sensor device according to the embodiment
  • FIG. 10 is a diagram showing an example of a timing chart of irradiation directions of beams from the deflection unit in the third high resolution mode of the sensor device according to the embodiment
  • It is a circuit diagram which shows the 1st example of the 1st light source element which concerns on embodiment. It is a figure which shows the 2nd example of the 1st light source element which concerns on embodiment.
  • FIG. 1 is a diagram showing a sensor device 10 according to an embodiment.
  • FIG. 2 is a diagram showing an example of a pulse trigger timing chart of the first light source element 110 and a pulse trigger timing chart of the second light source element 120 in the normal mode of the sensor device 10 according to the embodiment.
  • the arrows indicating the first direction X and the third direction Z indicate that the direction from the base end of the arrow to the tip is the positive direction of the direction indicated by the arrow, and the direction from the tip of the arrow to the base end It indicates that the heading direction is the negative direction of the direction indicated by the arrow.
  • the white circle with a black dot indicating the second direction Y indicates that the direction from the back to the front of the paper is the positive direction of the second direction Y, and the direction from the front to the back of the paper is the negative direction of the second direction Y. showing.
  • the first direction X is one direction parallel to the horizontal direction perpendicular to the vertical direction.
  • the second direction Y is a direction parallel to the vertical direction.
  • the positive direction of the second direction Y is the direction from bottom to top in the vertical direction
  • the negative direction of the second direction Y is the direction from top to bottom in the vertical direction.
  • a third direction Z is a direction parallel to the horizontal direction and perpendicular to the first direction X. As shown in FIG.
  • the positive direction of the third direction Z is from left to right in the horizontal direction
  • the negative direction of the third direction Z is from right to left in the horizontal direction. It is the direction to go.
  • the relationship between the first direction X, the second direction Y, the third direction Z, the horizontal direction, and the vertical direction is not limited to the example described above.
  • the relationship between the first direction X, the second direction Y, the third direction Z, the horizontal direction, and the vertical direction varies depending on the arrangement of the sensor device 10 .
  • the third direction Z may be parallel to the vertical direction.
  • the timing chart in the upper part of FIG. 2 shows the timing chart of the pulse trigger of the first light source element 110 .
  • the horizontal axis of the timing chart in the upper part of FIG. 2 indicates time.
  • the timing chart in the upper part of FIG. 2 shows that the beam is emitted at the trigger timings labeled "A1" to "A5".
  • the beams emitted at the trigger timings denoted by "A1" to "A5" will be referred to as A1 beam to A5 beam, respectively, as required.
  • the timing chart in the lower part of FIG. 2 shows the timing chart of the pulse trigger of the second light source element 120 .
  • the horizontal axis of the timing chart in the lower part of FIG. 2 indicates time.
  • the timing chart in the lower part of FIG. 2 shows that the beam is emitted at the trigger timings labeled “B1” to “B5”.
  • the beams emitted at the trigger timings labeled "B1” to “B5" are referred to as B1 beam to B5 beam, respectively, as required.
  • the sensor device 10 includes a light source section 100, a deflection section 200, a first reception section 310, a second reception section 320, a beam splitter 400 and a signal processing section 500.
  • the light source section 100 has a first light source element 110 and a second light source element 120 .
  • the deflection section 200 has a first reflecting surface 202 , a second reflecting surface 204 , a third reflecting surface 206 and a fourth reflecting surface 208 .
  • Each of the first receiver 310 and the second receiver 320 is, for example, an APD (avalanche photodiode).
  • the first receiver 310 and the second receiver 320 are capable of receiving light independently of each other.
  • the signal processing unit 500 shown in FIG. 1 is a functional block diagram.
  • the signal processing section 500 shown in FIG. 1 is not meant to suggest the actual size or location of the signal processing section 500 in the sensor device 10 .
  • the signal processing unit 500 is implemented by hardware such as a microcomputer, a DSP (digital signal processor), and an FPGA (Field-Programmable Gate Array).
  • the first light source element 110 is, for example, a pulse laser.
  • the wavelength of the beam emitted from the first light source element 110 is infrared rays, for example.
  • the first light source element 110 temporally repeatedly emits a plurality of beams. In the upper timing chart of FIG. 2, the first light source element 110 sequentially emits the A1 beam, the A2 beam, and the A3 beam, and then sequentially emits the A4 beam and the A5 beam.
  • the first light source element 110 may or may not emit other beams at timings between the emission timing of the A3 beam and the emission timing of the A4 beams.
  • the first light source element 110 may or may not emit another beam at a timing after the timing of emitting the A5 beam.
  • the second light source element 120 is, for example, a pulse laser.
  • the wavelength of the beam emitted from the second light source element 120 is infrared rays, for example.
  • the second light source element 120 temporally repeatedly emits a plurality of beams.
  • the second light source element 120 sequentially emits the B1 beam, the B2 beam, and the B3 beam, and then sequentially emits the B4 beam and the B5 beam.
  • the second light source element 120 may or may not emit another beam at a timing between the emission timing of the B3 beam and the emission timing of the B4 beam.
  • the second light source element 120 may or may not emit another beam at a timing after the timing of emitting the B5 beam.
  • the first light source element 110 and the second light source element 120 emit beams at different timings. Specifically, the first light source element 110 and the second light source element 120 emit beams alternately in time.
  • the first light source element 110 and the second light source element 120 are A1 beam, B1 beam, A2 beam, B2 beam, A3 beam, B3 beam, .
  • a plurality of beams are emitted in order of the beam and the B5 beam.
  • the second light source element 120 delays the emission timing of each beam of the first light source element 110 by the time difference ⁇ t, as indicated by the time difference ⁇ t between the emission timing of the A1 beam and the emission timing of the B1 beam.
  • Each beam is emitted at the same timing.
  • the timing at which a group of beams including the A1 beam to A5 beam is incident on the deflection section 200 and the timing at which another group of beams including the B1 beam to B5 beam are incident on the deflection section 200 are different from each other. .
  • a solid-line arrow extending from the first light source element 110 through the beam splitter 400 and the deflection section 200 toward the positive direction side of the deflection section 200 in the third direction Z indicates that the light emitted from the first light source element 110
  • the optical axis of the beam reflected by the first reflective surface 202 is shown.
  • the dashed arrow extending from the second light source element 120 through the beam splitter 400 and the deflection section 200 toward the positive direction side of the deflection section 200 in the third direction Z indicates the timing from the emission timing of the beam from the first light source element 110.
  • the optical axis of the beam emitted from the second light source element 120 with a delay of ⁇ t and reflected by the first reflecting surface 202 is shown.
  • the solid arrows extending from the beam splitter 400 toward the first receiver 310 indicate the optical axes of reflected light or scattered light from the first measurement position P1 to the fifth measurement position P5 of the beam emitted from the first light source element 110. showing.
  • Broken line arrows extending from the beam splitter 400 toward the second receiving unit 320 indicate optical axes of reflected light or scattered light from the first measurement position P1 to the fifth measurement position P5 of the beam emitted from the second light source element 120. showing.
  • the deflection unit 200 indicated by a solid line in FIG. A deflection section 200 is shown.
  • the deflection unit 200 indicated by the solid line is rotated clockwise around the rotational axis parallel to the second direction Y when viewed from the positive direction of the second direction Y.
  • the deflection section 200 is a polygon mirror.
  • the deflection section 200 is not limited to a polygon mirror as long as it is an optical member capable of deflecting the beam emitted from the light source section 100 .
  • the first reflecting surface 202, the second reflecting surface 204, the third reflecting surface 206, and the fourth reflecting surface 208 are arranged in order counterclockwise around the center of the deflection section 200. I'm in.
  • the normal directions of the first reflecting surface 202, the second reflecting surface 204, the third reflecting surface 206, and the fourth reflecting surface 208 are directed in different directions at intervals of 90°.
  • the deflection section 200 when viewed from the positive direction of the second direction Y, the deflection section 200 rotates around the rotation axis parallel to the second direction Y at a constant angular velocity regardless of time. is rotating clockwise. Therefore, the irradiation direction of the beam deflected by the deflection unit 200 rotates clockwise around the rotation axis parallel to the second direction Y at the angular velocity v.
  • the first light source element 110 and the second light source element 120 cause beams to enter from directions different by an angle ⁇ q around a direction perpendicular to the second direction Y when viewed from the deflection section 200 .
  • the optical axis of the beam incident on the deflection section 200 from the second light source element 120 is the optical axis of the beam incident on the deflection section 200 from the first light source element 110.
  • a group of beams including the A1 to A5 beams are incident on the deflection section 200 from the first light source element 110 in a predetermined first incident direction.
  • Another group of beams including the B1 to B5 beams is incident on the deflection section 200 from the second light source element 120 in a second incident direction different from the first incident direction.
  • the timing of the beam emitted from the first light source element 110 and the beam emitted from the first light source element 110 are determined by the deflection unit 200. can be regarded as the same timing in the operation of the sensor device 10 .
  • the timing of the beam emitted from the second light source element 120 and the beam emitted from the second light source element 120 reaches the deflection unit 200 can be regarded as the same timing in the operation of the sensor device 10 .
  • the first light source element 110 and the second light source element 120 deflect the beams at different timings in the same manner as the beam emission timings from the first light source element 110 and the second light source element 120 described with reference to FIG. It is made incident on the part 200 .
  • the irradiation direction of the beam emitted from the first light source element 110 and deflected by the deflection unit 200 and the direction of the beam emitted from the first light source element 110 can be adjusted.
  • the irradiation direction of the beam emitted from the second light source element 120 at a timing delayed by a time difference ⁇ t from the emission timing and deflected by the deflection section 200 can be substantially the same direction.
  • the angle ⁇ q can be approximately equal to v ⁇ t.
  • the first measurement position P1 to the fifth measurement position P5 are spatially shifted from each other.
  • the deflection unit 200 causes each of the A1 beam to A5 beam included in the group of beams emitted from the first light source element 110 to be positioned at the first measurement position P1 to the fifth measurement position P5. and each of the B1 beam to B5 beam included in another group of beams emitted from the second light source element 120 is deflected toward each of the first measurement position P1 to the fifth measurement position P5. are doing.
  • the first receiver 310 receives reflected light or scattered light from the first measurement position P1 to the fifth measurement position P5 of each of the A1 beam to the A5 beam.
  • the second receiver 320 receives reflected light or scattered light from the first measurement position P1 to the fifth measurement position P5 of each of the B1 beam to the B5 beam.
  • reflected light or scattered light from each measurement position of each beam will be referred to as return light as required.
  • the A1 beam is emitted from the first light source element 110, passes through the beam splitter 400, and is incident on the first reflecting surface 202.
  • the A1 beam is reflected by the first reflecting surface 202 and deflected from the first reflecting surface 202 toward the first measurement position P1 existing in the predetermined irradiation direction.
  • the returning light of the A1 beam from the first measurement position P1 is irradiated to the first reflecting surface 202 , reflected by the first reflecting surface 202 and reflected by the beam splitter 400 , and then irradiated to the first receiver 310 .
  • the first receiver 310 is located on the positive side in the first direction X with respect to the second receiver 320 .
  • the returning light from the first measurement position P1 of the A1 beam is not irradiated to the second receiving section 320 but is irradiated to the first receiving section 310 due to the angle ⁇ q. Therefore, the return light from the first measurement position P1 of the A1 beam is not received by the second receiver 320 but is received by the first receiver 310 .
  • the B1 beam is emitted from the second light source element 120 , passes through the beam splitter 400 and enters the first reflecting surface 202 .
  • the B1 beam is reflected by the first reflecting surface 202 and deflected from the first reflecting surface 202 toward the first measurement position P1 that exists in substantially the same direction as the predetermined irradiation direction of the A1 beam.
  • the return light of the B1 beam from the first measurement position P1 is applied to the first reflecting surface 202 , reflected by the first reflecting surface 202 and reflected by the beam splitter 400 , and applied to the second receiving section 320 .
  • the second receiver 320 is located on the negative direction side in the first direction X with respect to the first receiver 310 . Therefore, the return light of the B1 beam from the first measurement position P1 is not irradiated to the first receiving section 310 but is irradiated to the second receiving section 320 due to the angle ⁇ q. Therefore, the return light of the B1 beam from the first measurement position P1 is not received by the first receiver 310 but is received by the second receiver 320 .
  • the signal processing unit 500 integrates the waveform generated from the first receiving unit 310 by the returning light of the A1 beam and the waveform generated from the second receiving unit 320 by the returning light of the B1 beam.
  • the signal-to-noise ratio of these waveforms can be increased compared to when only one of these waveforms is used.
  • these waveforms are, for example, when the light source unit 100 does not have the second light source element 120 and has only the first light source element 110, and after the A1 beam to the A5 beam are irradiated from the first light source element 110, , can be obtained at closer timing than when another beam is irradiated from the first light source element 110 to the first measurement position P1.
  • a memory for storing the waveform generated from the first receiver 310 by the return light of the A1 beam and the waveform generated by the second receiver 320 by the return light of the B1 beam for a relatively long period of time is provided. can be made unnecessary.
  • the A2 beam and the B2 beam are incident on the first reflecting surface 202 in order.
  • the A2 beam and the B2 beam are sequentially deflected toward the second measurement position P2 in the same manner as described for the A1 beam and the B1 beam.
  • the return light from the second measurement position P2 of the A2 beam is received by the first receiver 310 without being irradiated to the second receiver 320 .
  • the return light of the B2 beam from the second measurement position P2 is received by the second receiver 320 without being irradiated to the first receiver 310 .
  • the signal processing unit 500 In the same manner as described for the A1 beam and the B1 beam, the signal processing unit 500 generates a waveform generated from the first receiving unit 310 by the return light from the second measurement position P2 of the A2 beam and the second measurement position P2 of the B2 beam. and the waveform generated from the second receiving section 320 by the return light from the position P2.
  • the A3 beam and the B3 beam are incident on the first reflecting surface 202 in order.
  • the A3 beam and the B3 beam are sequentially deflected toward the third measurement position P3 in the same manner as described for the A1 beam and the B1 beam.
  • the return light from the third measurement position P3 of the A3 beam is received by the first receiver 310 without being irradiated to the second receiver 320 .
  • the return light from the third measurement position P3 of the B3 beam is received by the second receiver 320 without being irradiated to the first receiver 310 .
  • the signal processing unit 500 In the same manner as described for the A1 beam and the B1 beam, the signal processing unit 500 generates a waveform generated from the first receiving unit 310 by the return light from the third measurement position P3 of the A3 beam and the third measurement position P3 of the B3 beam. and the waveform generated from the second receiving section 320 by the return light from the position P3.
  • the angular velocity of rotation of the deflection section 200 is relatively high. For this reason, the beams emitted from the first light source element 110 and the second light source element 120 in the time interval from the emission timing of the A1 beam to the emission timing of the B3 beam are located between the first measurement position P1 and the second measurement position P2. A fourth measurement position P4 located between and a fifth measurement position P5 located between the second measurement position P2 and the third measurement position P3 are not irradiated.
  • the A4 beam is emitted from the first light source element 110 , passes through the beam splitter 400 and enters the second reflecting surface 204 .
  • the A4 beam is reflected by the second reflecting surface 204 and deflected from the second reflecting surface 204 toward the fourth measurement position P4 existing in the predetermined irradiation direction.
  • the return light from the fourth measurement position P4 of the A4 beam is irradiated to the second reflecting surface 204, reflected by the second reflecting surface 204 and reflected by the beam splitter 400, and then irradiated to the first receiving section 310.
  • the return light from the fourth measurement position P4 of the A4 beam is not received by the second receiver 320 but is received by the first receiver 310 in the same manner as described for the A1 beam.
  • the B4 beam is emitted from the second light source element 120 , passes through the beam splitter 400 and enters the second reflecting surface 204 .
  • the B4 beam is reflected by the second reflecting surface 204 and deflected from the second reflecting surface 204 toward the fourth measurement position P4 that exists in substantially the same direction as the predetermined irradiation direction of the A4 beam.
  • the return light from the fourth measurement position P4 of the B4 beam is irradiated to the second reflecting surface 204, reflected by the second reflecting surface 204 and reflected by the beam splitter 400, and then irradiated to the second receiving section 320.
  • the return light from the fourth measurement position P4 of the B4 beam is not received by the first receiver 310 but is received by the second receiver 320 in the same manner as described for the B1 beam.
  • the A5 beam and the B5 beam are incident on the second reflecting surface 204 in order.
  • the A5 beam and the B5 beam are sequentially deflected toward the fifth measurement position P5 in the same manner as described for the A4 beam and the B4 beam.
  • the return light from the fifth measurement position P5 of the A5 beam is received by the first receiver 310 .
  • the return light from the second measurement position P2 of the B5 beam is received by the second receiver 320 .
  • the signal processing unit 500 In the same manner as described for the A4 beam and the B4 beam, the signal processing unit 500 generates a waveform generated from the first receiving unit 310 by the return light from the fifth measurement position P5 of the A5 beam and the fifth measurement position P5 of the B5 beam. and the waveform generated from the second receiving section 320 by the return light from the position P5.
  • the angle difference between the optical axes of two beams irradiated toward adjacent measurement positions among a plurality of measurement positions including the first measurement position P1 to the fifth measurement position P5 is ⁇ p.
  • the first light source element 110 and the second light source element 120 periodically repeat the emission of the A1 beam to the B5 beam shown in FIG.
  • the A1 to B5 beams emitted in a predetermined cycle are deflected toward the first measurement position P1 to the fifth measurement position P5 by the first reflecting surface 202 or the second reflecting surface 204, as described above.
  • the A1 beam to B5 beam emitted in the period next to the predetermined period are subjected to the first measurement by the third reflecting surface 206 or the fourth reflecting surface 208 according to the aspect of the predetermined period described above. It can be deflected toward the position P1 to the fifth measurement position P5.
  • every time the deflection unit 200 makes one clockwise rotation around the rotation axis parallel to the second direction Y when viewed from the positive direction of the second direction Y it is possible to acquire point groups of two frames.
  • the deflection unit 200 directs the beams emitted from the first light source element 110 and the second light source element 120 to the first measurement position P1, the second measurement position P2, and the third measurement position P3.
  • the beams emitted from the first light source element 110 and the second light source element 120 are deflected toward a group of measurement positions, and then the beams emitted from the first light source element 110 and the second light source element 120 are transferred to another group of measurement positions exemplified by the fourth measurement position P4 and the fifth measurement position P5. It is deflected toward the measurement position.
  • Each of the other group of measurement positions is located between adjacent measurement positions of the group of measurement positions. In this method, the resolution of the sensor device 10 can be increased compared to the case where the beam is deflected to only one of the group of measurement positions and the other group of measurement positions.
  • 90% or more, preferably 95% or more, more preferably 99% or more of the area where the point cloud is generated by the other group of beams from the second light source element 120 overlap.
  • the method of deflecting the beams emitted from the first light source element 110 and the second light source element 120 toward the first measurement position P1 to the fifth measurement position P5 by the deflection section 200 is not limited to the above method.
  • the second reflective surface 204 and the fourth reflective surface 208 deflect the A1 and B1 beams toward the first measurement location P1, the A2 and B2 beams toward the second measurement location P2, and the A3 beams toward the second measurement location P2.
  • the beam and the B3 beam are deflected toward the third measuring position P3, the first reflecting surface 202 and the third reflecting surface 206 deflect the A4 beam and the B4 beam toward the fourth measuring position P4, and the A5 beam and the B5 beam are deflected toward the fourth measuring position P4.
  • the beam may be deflected towards the fifth measurement position P5.
  • FIG. 3 is a diagram for explaining an example of the operation of the sensor device 10 according to the embodiment.
  • FIG. 4 is a diagram for explaining an example of the operation of the sensor device according to the comparative example.
  • the arrows attached to the timing charts in the upper, middle and lower stages of FIG. 3 indicate times.
  • the arrows attached to the timing charts in the upper and lower stages of FIG. 4 indicate time.
  • the sensor device according to the comparative example is the same as the sensor device 10 according to the embodiment except that a single receiver is provided instead of the first receiver 310 and the second receiver 320 according to the embodiment. It has become.
  • the timing chart in the upper part of FIG. 3 shows the timing at which beams are emitted from the first light source element 110 and the second light source element 120 .
  • the beam is emitted from the first light source element 110 at the first time t1
  • the beam is emitted from the second light source element 120 at the second time t2.
  • the second time t2 is the time after the first time t1.
  • the beam emitted from the first light source element 110 at the first time t1 is, for example, the A1 beam shown in FIG. 2
  • the beam emitted from the second light source element 120 at the second time t2 is, for example, the B1 beam shown in FIG. Beam.
  • the timing chart in the middle of FIG. 3 shows waveforms output from the first receiving section 310 according to the embodiment.
  • the patterns applied throughout this timing chart schematically show the noise output from the first receiving section 310 .
  • the waveform output from first receiving section 310 has a peak at third time t3.
  • the third time t3 is the time after the second time t2.
  • the peak at the third time t3 is generated from the first receiver 310 by return light of the beam emitted from the first light source element 110 at the first time t1.
  • the signal processing unit 500 converts the peak generated by the first receiving unit 310 from the first time t1 until the first period T1 has passed into the beam emitted from the first light source element 110 at the first time t1. It is treated as a peak generated by return light.
  • the first period T1 according to the embodiment is from the emission timing of the beam from the first light source element 110 to the reception timing of the return light of the beam from the maximum detection distance of the sensor device 10 according to the embodiment at the first receiving unit 310. It is a period until
  • the timing chart in the lower part of FIG. 3 shows waveforms output from the second receiving section 320 according to the embodiment.
  • the patterns applied throughout this timing chart schematically show the noise output from the second receiving section 320 .
  • the waveform output from the second receiving section 320 has a peak at the fourth time t4.
  • the fourth time t4 is the time after the third time t3.
  • the peak at the fourth time t4 is generated from the second receiver 320 by return light of the beam emitted from the second light source element 120 at the second time t2.
  • the signal processing unit 500 converts the peak generated from the second receiving unit 320 from the second time t2 until the second time period T2 has elapsed into the peak of the beam emitted from the second light source element 120 at the second time t2. It is treated as a peak generated by return light.
  • the second period T2 according to the embodiment is from the emission timing of the beam from the second light source element 120 to the reception timing of the return light of the beam from the maximum detection distance of the sensor device 10 according to the embodiment at the second receiving unit 320. It is a period until
  • the timing chart in the upper part of FIG. 4 shows the timing at which beams are emitted from the first light source element 110 and the second light source element 120 in the same way as the timing chart in the upper part of FIG.
  • the timing chart in the lower part of FIG. 4 shows waveforms output from a single receiving unit according to the comparative example.
  • the patterns applied throughout this timing chart schematically show the noise output from a single receiving section.
  • the waveform output from a single receiving section has peaks at the third time t3 and the fourth time t4.
  • the peak at the third time t3 is generated from a single receiving section by return light of the beam emitted from the first light source element 110 at the first time t1.
  • the peak at the fourth time t4 is generated from a single receiver due to return light of the beam emitted from the second light source element 120 at the second time t2.
  • the signal processing unit 500 according to the comparative example converts the peak generated from the single receiving unit from the first time t1 until the first period T1′ has passed into the beam emitted from the first light source element 110 at the first time t1. is treated as a peak generated by the return light of . Further, the signal processing unit 500 according to the comparative example outputs the peak generated from the single receiving unit during the second period T2' from the second time t2 to the second light source element 120 at the second time t2. It is treated as a peak generated by the return light of the beam.
  • FIG. 3 The embodiment of FIG. 3 and the comparative example of FIG. 4 are compared.
  • the peak generated at the third time t3 from the single receiver according to the comparative example is actually generated by return light of the beam emitted from the first light source element 110 at the first time t1, as described above. ing.
  • the peak generated at the third time t3 from the single receiving unit is 0 from a relatively long distance of the beam emitted from the first light source element 110 at the first time t1. or the peak generated by the return light from a relatively short distance of the beam emitted from the second light source element 120 at the second time t2 is determined by a single receiver.
  • the signal processing unit 500 detects a peak generated from a single receiving unit from the first time t1 until the first period T1′ elapses, and Regardless of whether it originates from the beam or from the beam emitted from the second light source element 120, it is treated as a peak generated by return light of the beam emitted from the first light source element 110 at the first time t1. .
  • the signal processing unit 500 according to the comparative example detects the peak generated from the single receiving unit from the second time t2 until the second period T2' elapses as the beam emitted from the first light source element 110. or the beam emitted from the second light source element 120, the peak is treated as the peak generated by the return light of the beam emitted from the second light source element 120 at the second time t2.
  • the peak generated at the third time t3 from the first receiving unit 310 is the peak of the beam emitted from the second light source element 120 at the second time t2 from a relatively short distance. It can be identified that the peak is not caused by return light, but is caused by return light from a relatively long distance of the beam emitted from the first light source element 110 at the first time t1.
  • the first period T1' according to the comparative example cannot be longer than the absolute value of the difference between the first time t1 and the second time t2.
  • the first period T1 according to the embodiment can be longer than the absolute value of the difference between the first time t1 and the second time t2. Therefore, the maximum detection distance of the sensor device 10 according to the embodiment can be made longer than the maximum detection distance of the sensor device 10 according to the comparative example.
  • the signal processing unit 500 integrates the waveform generated from the single receiving unit during the first period T1′ and the waveform generated from the single receiving unit during the second period T2′.
  • the SN ratio of the peak generated from a single receiver at the third time t3 cannot be improved.
  • the signal processing unit 500 integrates the waveform generated from the first receiving unit 310 in the first period T1 and the waveform generated from the second receiving unit 320 in the second period T2. By doing so, it is possible to improve the SN ratio between the peak generated from the first receiving unit 310 at the third time t3 and the peak generated from the second receiving unit 320 at the fourth time t4.
  • the signal processing unit 500 does not include the first receiving unit in the same manner as when the second time t2 is after the first time t1.
  • 310 can be identified as the peak generated by the return light of the beam emitted from the first light source element 110, and the peak of the waveform generated from the second receiving section 320 can be identified as the peak generated by the second light source element 110. It can be identified as the peak generated by the return light of the beam emitted from the light source element 120 .
  • the signal processing unit 500 is designed so that the peak of the waveform generated from the first receiving unit 310 is equal to the first light source element 110 , and the peak of the waveform generated from the second receiving unit 320 was generated by the return light of the beam emitted from the second light source element 120. It can be identified as a peak.
  • FIG. 5 is a diagram showing an example of a timing chart of irradiation directions of beams from the deflection unit 200 in the normal mode of the sensor device 10 according to the embodiment.
  • the horizontal axis of the timing chart in FIG. 5 indicates time.
  • the vertical axis of the timing chart in FIG. 5 indicates the irradiation direction of the beam from the deflecting section 200 .
  • the black circles in the timing chart of FIG. 5 indicate that the beam from the first light source element 110 was deflected by the deflecting section 200 at the times indicated by the black circles.
  • the white circles in the timing chart of FIG. 5 indicate that the beam from the second light source element 120 was deflected by the deflection section 200 at the time marked with the white circle.
  • the deflection speed of the deflection section 200 in the embodiment is the angular velocity of rotation of the deflection section 200 .
  • the beam from the first light source element 110 is deflected by the deflection section 200 in each of the three irradiation directions, and then the beam from the second light source element 120 is deflected by the deflection section 200.
  • the dashed lines surrounding the black and white circles in each of the three irradiation directions indicate the waveform generated from the first receiver 310 by the return light of the beam indicated by the black circle surrounded by the dashed lines, and the waveform surrounded by the dashed lines.
  • the signal processing unit 500 integrates the waveform generated from the second receiving unit 320 by the return light of the beam indicated by the white circles.
  • between the emission timing of the beam from the second light source element 120 and the emission timing of the beam from the first light source element 110 immediately after the emission timing of the beam from the second light source element 120 is, for example, the period from the emission timing of the beam from the second light source element 120 to the reception timing of the return light of the beam from the maximum detection distance of the sensor device 10 according to the embodiment at the second receiving unit 320. That's it.
  • FIG. 6 is a diagram showing an example of a timing chart of irradiation directions of beams from the deflection unit 200 in the first high resolution mode of the sensor device 10 according to the embodiment.
  • the first high resolution mode shown in FIG. 6 is similar to the normal mode shown in FIG. 5 except for the following points.
  • Time interval of emission of a group of beams from the first light source element 110 in the first high resolution mode shown in FIG. 6 and another group of beams from the second light source element 120 in the first high resolution mode shown in FIG. are emitted from the first light source element 110 in the normal mode shown in FIG. 5 and another group from the second light source element 120 in the normal mode shown in FIG. It is shorter than the time interval of beam emission.
  • the time interval of emission of the other group of beams is 1/2 of the time interval of emission of the group of beams from the first light source element 110 in the normal mode shown in FIG. It is 1/2 the time interval between the other group of beams emitted from the light source element 120 .
  • each of the group of beams from the first light source element 110 and each of the other group of beams from the second light source element 120 are emitted at substantially the same timing. there is Even in this case, as described with reference to FIGS.
  • the peak of the waveform generated from the second receiver 320 is the peak generated by the return light of the beam emitted from the second light source element 120. can be identified.
  • the spatial density of the plurality of measurement positions in the first high-resolution mode shown in FIG. 6 is double the spatial density of the plurality of measurement positions in the normal mode shown in FIG. Therefore, in the first high resolution mode shown in FIG. 6, the resolution of the sensor device 10 can be made higher than in the normal mode shown in FIG.
  • FIG. 7 is a diagram showing an example of a timing chart of irradiation directions of beams from the deflection unit 200 in the second high resolution mode of the sensor device 10 according to the embodiment.
  • the second high resolution mode shown in FIG. 7 is similar to the normal mode shown in FIG. 5 except for the following points.
  • the deflection speed of the deflection section 200 in the second high resolution mode shown in FIG. 7 is lower than the deflection speed of the deflection section 200 in the normal mode shown in FIG. Specifically, the deflection speed of the deflection section 200 in the second high resolution mode shown in FIG. 7 is half the deflection speed of the deflection section 200 in the normal mode shown in FIG.
  • each of the group of beams from the first light source element 110 and each of the other group of beams from the second light source element 120 are emitted at substantially the same timing. there is Even in this case, as described with reference to FIGS.
  • the peak of the waveform generated from the second receiver 320 is the peak generated by the return light of the beam emitted from the second light source element 120. can be identified.
  • the spatial density of the plurality of measurement positions in the second high resolution mode shown in FIG. 7 is double the spatial density of the plurality of measurement positions in the normal mode shown in FIG. Therefore, in the second high resolution mode shown in FIG. 7, the resolution of the sensor device 10 can be made higher than in the normal mode shown in FIG.
  • FIG. 8 is a diagram showing an example of a timing chart of irradiation directions of beams from the deflection unit 200 in the third high resolution mode of the sensor device 10 according to the embodiment.
  • the third high resolution mode shown in FIG. 8 is similar to the normal mode shown in FIG. 5 except for the following points.
  • Time interval of emission of a group of beams from the first light source element 110 in the third high resolution mode shown in FIG. 8 and another group of beams from the second light source element 120 in the third high resolution mode shown in FIG. are emitted from the first light source element 110 in the normal mode shown in FIG. 5 and another group from the second light source element 120 in the normal mode shown in FIG. It is shorter than the time interval of beam emission.
  • the time interval of emission of the other group of beams is 1/2 of the time interval of emission of the group of beams from the first light source element 110 in the normal mode shown in FIG. It is 1/2 the time interval between the other group of beams emitted from the light source element 120 .
  • the deflection speed of the deflection section 200 in the third high resolution mode shown in FIG. 8 is lower than the deflection speed of the deflection section 200 in the normal mode shown in FIG. Specifically, the deflection speed of the deflection section 200 in the third high resolution mode shown in FIG. 8 is half the deflection speed of the deflection section 200 in the normal mode shown in FIG.
  • each of the group of beams from the first light source element 110 and each of the other group of beams from the second light source element 120 are emitted at substantially the same timing. there is Even in this case, as described with reference to FIGS.
  • the peak of the waveform generated from the second receiver 320 is the peak generated by the return light of the beam emitted from the second light source element 120. can be identified.
  • the spatial density of the plurality of measurement positions in the third high resolution mode shown in FIG. 8 is four times the spatial density of the plurality of measurement positions in the normal mode shown in FIG. Therefore, in the third high-resolution mode shown in FIG. 8, the sensor device 10 is more sensitive than in the normal mode shown in FIG. 5, the first high-resolution mode shown in FIG. 6, and the second high-resolution mode shown in FIG. resolution can be increased.
  • each of the group of beams from the first light source element 110 and each of the other group of beams from the second light source element 120 are emitted at substantially the same timing.
  • the next beam may be emitted from the first light source element 110 after a predetermined time interval has passed since the second light source element 120 emitted the beam.
  • the time interval is from the emission timing of the beam from the second light source element 120 to the reception timing of the return light of the beam from the maximum detection distance of the sensor device 10 according to the embodiment at the second receiving unit 320. may be less than the period of Even in this case, as described with reference to FIGS.
  • the peak of the waveform generated from the second receiver 320 is the peak generated by the return light of the beam emitted from the second light source element 120. can be identified.
  • FIG. 9 is a circuit diagram showing a first example of the first light source element 110 according to the embodiment. The following matters described using FIG. 9 are also applicable to the second light source element 120 .
  • the capacitor C is charged by the first power supply V1 through the resistor R.
  • the transistor Q When the transistor Q is turned on, current flows through the inductor L, the laser diode D, and the transistor Q due to the discharge of the electric charge stored in the capacitor C.
  • ON/OFF of the transistor Q is controlled by the second power supply V2, the switch S and the gate driver U.
  • the gate driver U is electrically connected by a switch S to the second power supply V2 or grounded. In the example shown in FIG. 9, the gate driver U is electrically connected to the second power supply V2.
  • the first light source element 110 emits a beam generated from the laser diode D. As shown in FIG.
  • the intensity of the beam emitted from the laser diode D is determined depending on the charging voltage of the capacitor C. Therefore, by variably adjusting the voltage of the first power supply V1, the charging voltage of the capacitor C can be variably adjusted. Thereby, the intensity of the beam emitted from the first light source element 110 can be variably adjusted.
  • each of the intensity of the beam emitted from the first light source element 110 and the intensity of the beam emitted from the second light source element 120 can be set below the upper limit allowed in eye-safe.
  • beams are emitted from the first light source element 110 and the second light source element 120 at approximately the same timing.
  • the sum of the intensity of the beam emitted from the first light source element 110 and the intensity of the beam emitted from the second light source element 120 must be less than or equal to the upper limit allowed for eye-safety.
  • each of the intensity of the beam emitted from the first light source element 110 and the intensity of the beam emitted from the second light source element 120 may be set to 1/2 or less of the allowable upper limit for eye-safety. Therefore, depending on whether the sensor device 10 is in the normal mode or in the first to third high resolution modes, light is emitted from the first light source element 110 as described with reference to FIG.
  • the intensity of the beam and the intensity of the beam emitted from the second light source element 120 can be variably adjusted.
  • FIG. 10 is a diagram showing a second example of the first light source element 110 according to the embodiment. The following matters described using FIG. 10 are also applicable to the second light source element 120 .
  • the first light source element 110 has a first split light source element 112 and a second split light source element 114 .
  • the first divided light source element 112 and the second divided light source element 114 are arranged in the third direction Z. As shown in FIG.
  • the first split light source element 112 emits the first split beam b1 toward the negative direction side of the first direction X of the first split light source element 112 .
  • the second split light source element 114 emits the second split beam b2 toward the negative direction side of the first direction X of the second split light source element 114 .
  • the intensity of the second split beam b2 is substantially equal to the intensity of the first split beam b1.
  • the optical axis parallel to the first direction X of the first split beam b1 and the optical axis parallel to the first direction X of the second split beam b2 are shifted in the third direction Z from each other.
  • the spread angle of the second split beam b2 is approximately equal to the spread angle of the first split beam b1. Therefore, when the first split beam b1 and the second split beam b2 are irradiated relatively far from the first light source element 110, the deviation between the optical axis of the first split beam b1 and the optical axis of the second split beam b2 is The effect is negligible.
  • the intensity of the beam emitted from the first light source element 110 can be adjusted so that the split beams are emitted from both the first split light source element 112 and the second split light source element 114, or the first split light source element 112 and the second split light source element It can be variably adjusted depending on whether the split beams are emitted from only one of 114 .
  • split beams can be emitted from both the first split light source element 112 and the second split light source element 114 .
  • split beams are emitted from only one of the first split light source element 112 and the second split light source element 114. be able to.

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  • Engineering & Computer Science (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Optical Radar Systems And Details Thereof (AREA)

Abstract

Selon la présente invention, une première surface réfléchissante (202) est éclairée avec une lumière de retour à partir d'une première position de mesure (P1) dans un faisceau A1 et une première unité de réception (310) est éclairée avec une lumière de retour qui a subi une réflexion par la première surface réfléchissante (202) et une réflexion par un diviseur de faisceau (400). La première surface réfléchissante (202) est éclairée avec une lumière de retour à partir d'une première position de mesure (P1) dans un faisceau B1 et une seconde unité de réception (320) est éclairée avec une lumière de retour qui a subi une réflexion par la première surface réfléchissante (202) et une réflexion par le diviseur de faisceau (400). Une unité de traitement de signal (500) intègre une forme d'onde générée à partir de la première unité de réception (310) en raison de la lumière de retour du faisceau A1 et une forme d'onde générée à partir de la seconde unité de réception (320) en raison de la lumière de retour du faisceau B1.
PCT/JP2021/047927 2021-12-23 2021-12-23 Dispositif de capteur WO2023119569A1 (fr)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011215089A (ja) * 2010-04-02 2011-10-27 Pulstec Industrial Co Ltd ３次元形状測定装置
US20150009485A1 (en) * 2013-07-02 2015-01-08 Electronics And Telecommunications Research Institute Laser radar system
JP2018109560A (ja) * 2017-01-04 2018-07-12 オムロンオートモーティブエレクトロニクス株式会社 走査式距離測定装置
JP2021110739A (ja) * 2020-01-07 2021-08-02 三星電子株式会社Samsung Electronics Co., Ltd. ライダー装置及びその動作方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011215089A (ja) * 2010-04-02 2011-10-27 Pulstec Industrial Co Ltd ３次元形状測定装置
US20150009485A1 (en) * 2013-07-02 2015-01-08 Electronics And Telecommunications Research Institute Laser radar system
JP2018109560A (ja) * 2017-01-04 2018-07-12 オムロンオートモーティブエレクトロニクス株式会社 走査式距離測定装置
JP2021110739A (ja) * 2020-01-07 2021-08-02 三星電子株式会社Samsung Electronics Co., Ltd. ライダー装置及びその動作方法

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