WO2023116358A1 - 等离子喷射装置、喷涂设备及太阳能电池制造设备 - Google Patents

等离子喷射装置、喷涂设备及太阳能电池制造设备 Download PDF

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WO2023116358A1
WO2023116358A1 PCT/CN2022/134911 CN2022134911W WO2023116358A1 WO 2023116358 A1 WO2023116358 A1 WO 2023116358A1 CN 2022134911 W CN2022134911 W CN 2022134911W WO 2023116358 A1 WO2023116358 A1 WO 2023116358A1
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Prior art keywords
medium
spray
spraying
gas
gun head
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English (en)
French (fr)
Inventor
林维乐
陈国栋
刘召辉
王燕东
郭永胜
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Contemporary Amperex Technology Co Ltd
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Contemporary Amperex Technology Co Ltd
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Definitions

  • the present application relates to the field of battery manufacturing equipment, in particular to a plasma spraying device, spraying equipment and solar cell manufacturing equipment.
  • a solar cell is a device that uses the photovoltaic effect to directly convert solar energy into electrical energy. So far, many kinds of solar cells have been developed. Including: monocrystalline silicon solar cells, polycrystalline silicon solar cells, amorphous silicon solar cells, compound semiconductor solar cells, etc.
  • Thermal spraying technology is a surface processing method that uses a heat source to rapidly heat the sprayed material to a molten or semi-molten state, and sprays it on the surface of the pretreated workpiece through high-speed airflow or flame flow to accelerate the spraying to form a coating.
  • thermal spraying can be divided into arc spraying, plasma spraying, explosive spraying and so on.
  • the existing spraying equipment cannot adjust the spraying amount of the medium.
  • the present application provides a plasma spraying device, spraying equipment and solar cell manufacturing equipment, which can solve the problem that the medium spraying amount cannot be precisely controlled.
  • the present application provides a plasma spraying device, including an ionizing spray mechanism, a gas delivery channel and a medium delivery mechanism.
  • the gas delivery channel communicates with the ionization injection mechanism and is used to deliver gas to the ionization injection mechanism.
  • the screw feeder is used to transport the medium in the feeding channel to the ionizing spray mechanism to melt and spray the medium.
  • a gas delivery channel and a medium delivery mechanism are provided to deliver the gas to be ionized and the medium to the ionization injection mechanism, and the ionization injection mechanism is used to spray the medium in a molten or semi-molten state, and the ionization injection
  • the mechanism is used to ionize the gas conveyed by the gas conveying channel to melt and eject the medium conveyed by the feeding channel.
  • the amount of medium entering the ionizing spray mechanism can be changed to adjust the spraying volume of the ionizing spraying mechanism, thereby improving the accuracy of the spraying volume and the uniformity of spraying.
  • the plasma spraying device further includes a driver connected to one end of the screw feeder. Setting the driver can realize the automatic control of the screw feeder, and improve the efficiency and accuracy of the medium ejection control.
  • the gas delivery channel has an inlet and an outlet, the inlet is used to connect to the gas source, and the outlet communicates with the ionization injection mechanism.
  • the gas delivery channel in the above structure is used to connect the gas source and the ionization injection mechanism, and transport the gas in the gas source to the ionization injection mechanism, so that the gas is ionized and releases heat to melt the medium and eject the medium.
  • the inlet is provided with a control valve for controlling the gas flow.
  • Setting the gas flow control valve can realize the control of the gas flow, so as to adjust the amount of gas ionization and thus control the melting temperature of the medium.
  • the ionizing spray mechanism includes an anode gun head and a cathode gun head.
  • the anode gun head is arranged at one end of the feeding channel, and has a first cavity communicated with the feeding channel; The cavity communicates with the first cavity and forms an ionization cavity for ionized gas.
  • the ionization cavity is directly arranged in the cathode gun head and the anode gun head, which simplifies the structure of the ionization injection mechanism and improves the efficiency of the ionization reaction.
  • the end of the cathode gun head away from the anode gun head is also connected to a spray gun head, and a through injection channel is provided in the spray gun head, and the injection channel communicates with the ionization cavity. Setting the injection channel can control the direction of medium injection in molten or semi-molten state, and improve the accuracy of injection.
  • the size of the ejection channel gradually increases along the ejection direction of the medium. Setting the injection channel in the shape of a bell mouth increases the injection surface of the injection port, improves the dispersion of the medium, and improves the uniformity of the medium injection.
  • an injection mask is also provided on the injection port of the injection gun head. Setting the mask plate can precisely control the spraying area of powder and improve the accuracy of spraying.
  • an insulator is further provided between the anode gun head and the cathode gun head, and through holes are formed on the insulator.
  • the cathode gun head and the anode gun head are insulated and separated by setting an insulator to prevent them from short-circuiting, and through holes are provided for the smooth passage of the medium and the ionized gas.
  • the present application provides a spraying equipment, which includes a base and the plasma spraying device in the above embodiment, the plasma spraying device is arranged on the base; wherein, the number of the plasma spraying device is multiple, and the multiple plasma spraying devices The devices are arranged at intervals on the base, and the injection ports of the plurality of plasma spray devices face the same side of the base. Multiple plasma spraying devices are installed in one spraying equipment, which can spray multiple media at the same time and improve the spraying efficiency.
  • the spraying directions of the plasma spraying devices intersect at a certain angle, so as to spray the medium sprayed from multiple plasma spraying devices to the same target position.
  • the feeding channel is arranged in the base, and the gas delivery channel is an annular pipe arranged at intervals along the circumference of the feeding channel.
  • the gas conveying channel is arranged on the outer periphery of the feeding channel, and the extending direction of the gas conveying channel is the same as that of the feeding channel, so that the gas and the medium can be delivered to the injection mechanism at the same time.
  • the present application provides a solar cell manufacturing equipment, which includes the spraying equipment in the above embodiment.
  • FIG. 1 is a schematic structural view of a plasma spraying device in some embodiments of the present application.
  • Fig. 2 is the structural representation of the spraying equipment of some embodiments of the present application.
  • Fig. 3 is a schematic structural diagram of spraying equipment according to other embodiments of the present application.
  • Spraying equipment 10. Plasma spray device; 101. Ionization spray mechanism; 102. Gas delivery channel; 103. Medium delivery mechanism; 104. Feeding channel; 105. Screw feeder; 106. Driver; 107. Inlet; 108. Control valve; 109, anode gun head; 110, cathode gun head; 111, first cavity; 112, second cavity; 113, spray gun head; 114, injection channel; 115, injection mask plate; 116, feeding Tube; 117, feeding hole; 118, insulating piece; 119, ionization cavity; 20, base.
  • multiple refers to more than two (including two), similarly, “multiple groups” refers to more than two groups (including two), and “multiple pieces” refers to More than two pieces (including two pieces).
  • the main photoelectric conversion element in a solar cell is a photoelectric conversion film layer
  • the photoelectric conversion film layer is usually prepared by spraying coating equipment.
  • plasma spraying equipment is widely used because it can spray molten powder while melting the medium.
  • plasma spraying equipment uses electric energy to ionize mixed gases such as argon, hydrogen or helium into high-temperature plasma, and forms a plasma gas flow. It uses high-temperature and high-speed plasma gas flow to melt metal or metal oxide, metal carbide and spray it on the surface of the workpiece to form a photoelectric conversion film layer.
  • the plasma spraying method sprays particles at a fast speed, the coating is dense, and the bonding strength is strong. Therefore, most industrial atmospheric plasma spraying equipment prefers this spraying method.
  • plasma spraying equipment is used to melt the medium and spray it onto the substrate to form a solar light energy absorbing film.
  • the plasma spraying equipment in the embodiment of the present application includes an ionization spraying mechanism, a gas delivery channel, and a medium delivery structure.
  • the gas delivery channel communicates with the ionization injection mechanism and is used for delivering gas to the ionization injection mechanism, and the ionization injection mechanism is used for ionizing gas.
  • the medium conveying mechanism includes a feeding channel and a screw feeder arranged in the feeding channel. The feeding channel communicates with the ionizing injection mechanism. The screw feeder is used to transport the medium in the feeding channel to the ionizing spraying mechanism to melt and eject the medium.
  • a gas delivery channel and a medium delivery mechanism are provided to deliver the gas to be ionized and the medium to the ionization injection mechanism, and the ionization injection mechanism is used to spray the medium in a molten or semi-molten state, and the ionization injection
  • the mechanism is used to ionize the gas delivered by the gas delivery channel 102 to melt and eject the medium delivered by the delivery channel.
  • the amount of medium entering the ionization spray mechanism can be changed to adjust the injection volume of the ionization spray mechanism to improve the accuracy of the injection volume and the uniformity of the injection.
  • the plasma spraying device and spraying equipment disclosed in the embodiments of this application can be used, but not limited to, for solar cell thin film spraying, and can also be used for industrial equipment that needs to melt and spray the medium.
  • the equipment of this application can effectively improve the film formation of spraying Efficiency and precise control of film thickness.
  • FIG. 1 is a schematic structural diagram of a plasma spraying device 10 provided by some embodiments of the present application.
  • the plasma spraying device 10 includes an ionizing spray mechanism 101 , a gas delivery channel 102 and a medium delivery mechanism 103 .
  • the gas delivery channel 102 communicates with the ionization injection mechanism 101 and is used for delivering gas to the ionization injection mechanism 101, and the ionization injection mechanism 101 is used for ionizing gas.
  • the medium conveying mechanism 103 includes a feeding channel 104 and a screw feeder 105 disposed in the feeding channel 104 .
  • the feeding channel 104 communicates with the ionizing spray mechanism 101 , and the screw feeder 105 is used to transport the medium in the feeding channel 104 to the ionizing spraying mechanism 101 to melt and spray the medium.
  • the feeding channel 104 is also connected with a feeding tube 116 , and the feeding tube 116 is used to input the medium into the feeding channel 104 .
  • the feeding pipe 116 is provided with a through feeding hole 117, and the size of the feeding hole 117 gradually decreases along the conveying direction of the medium. The above-mentioned structure can facilitate the input of the medium from the feeding pipe 116 and improve the conveying efficiency of the medium.
  • the screw feeder 105 includes a rotating shaft and helical blades arranged on the rotating shaft along the circumferential direction.
  • the rotating shaft drives the helical blade to rotate around its own axis, and the helical blade is used to carry materials. Therefore, the faster the rotation speed of the rotary shaft is, the faster the material conveying speed of the helical blade is, and the more material is conveyed.
  • the ionization injection mechanism 101 is used to generate plasma.
  • the two ends of the ionization injection mechanism 101 are connected with positive charges and negative charges respectively.
  • an ionization reaction occurs, which ionizes the surrounding gas into plasma and releases a large amount of heat at the same time.
  • the surrounding medium melts.
  • the plasma is positively charged and moves towards the negatively charged end under the action of the electrodes, thus generating an ion wind that moves the molten medium.
  • the gas delivery channel 102 is used to deliver the gas to be ionized to the ionization injection mechanism 101.
  • the gas delivery channel 102 can be a cylindrical cavity to facilitate the uniform delivery of the gas.
  • gas delivery channel 102 can also be a square, Oval, etc., which are not limited in this embodiment of the present application.
  • the medium delivery mechanism 103 is spaced apart from the gas delivery channel 102 , and the medium delivery channel 103 is used to deliver the medium to be ionized to the ionization injection mechanism 101 .
  • the medium in the embodiment of the present application is used for spraying onto the substrate, and the medium is usually a solid powder, and its particle size can be calculated and determined according to the material of the medium and the spraying amount.
  • Commonly used media are titanium oxide, strontium oxide, lithium oxide, and tungsten oxide.
  • the specific medium type should also be selected according to the structural design of the solar cell, which is not limited here.
  • the gas to be ionized in the gas delivery channel 102 may be oxygen, carbon dioxide, argon, helium, ammonia, nitrogen, etc., which is not limited in this embodiment of the present application.
  • a gas delivery channel 102 and a medium delivery mechanism 103 are set to deliver the gas to be ionized and the medium to the ionization injection mechanism 101; Injection, the ionization injection mechanism 101 is used to ionize the gas delivered from the gas delivery channel 102 to melt and eject the medium delivered by the delivery channel 104 . Moreover, by controlling the rotation speed of the screw feeder 105, the amount of the medium entering the ionizing spray mechanism 101 can be changed to adjust the spraying quantity of the ionizing spraying mechanism 101, so as to improve the control accuracy of the spraying quantity and the uniformity of spraying. Purpose.
  • the plasma spraying device 10 further includes a driver 106 connected to one end of the screw feeder 105 .
  • the driver 106 may be a drive motor, which drives the screw feeder 105 to rotate by controlling the rotation of the drive motor, and controls the rotation rate of the screw feeder 105. Setting the driver 106 can realize the automatic control of the screw feeder 105 and improve the efficiency and accuracy of the medium ejection control.
  • the gas delivery channel 102 has an inlet 107 and an outlet (not shown in the figure).
  • the inlet 107 is used to connect with the gas source, and the outlet is in communication with the ionization spray mechanism 101 .
  • the gas source can be an inert gas, or a readily available gas such as hydrogen, nitrogen or oxygen.
  • the outlet and the inlet 107 are generally arranged at both ends of the gas delivery channel 102 respectively, so as to facilitate the delivery of the gas and prevent the waste of gas remaining in the gas delivery channel 102 .
  • the gas delivery channel 102 in the above structure is used to connect the gas source and the ionization injection mechanism 101, and deliver the gas in the gas source to the ionization injection mechanism 101, so that the gas is ionized and releases heat to melt the medium and eject the medium.
  • the inlet 107 is provided with a control valve 108 for controlling the gas flow.
  • the control valve 108 includes, but is not limited to, a pneumatic valve, an electric valve, and a solenoid valve.
  • the control valve 108 is not limited to manual control, but can also be connected to a controller for automatic control, or a remote control device for remote operation, so as to improve the convenience of operation. Setting the control valve 108 can realize the control of the flow rate of the gas entering the gas delivery channel 102.
  • the gas is used as the raw material of the plasma that melts the medium. The more the gas is, the more intense the ionization reaction occurs and the higher the heat generated. Different media have different melting points. Therefore, the heat of ionization can be adjusted by adjusting the flow rate of the gas to control the temperature of the ionization injection mechanism 101 , thereby controlling the melting temperature of the media.
  • the control valve 108 provided in the embodiment of the present application can adjust the air intake according to the condition of the medium, improve the quality of medium melting, reduce energy waste and improve efficiency.
  • the ionizing spray mechanism 101 includes an anode gun head 109 and a cathode gun head 110 .
  • the anode gun head 109 is disposed at one end of the feeding channel 104 and has a first cavity 111 communicating with the feeding channel 104 .
  • the cathode gun head 110 is arranged at the end of the anode gun head 109 away from the feeding channel 104 .
  • the cathode gun head 110 is provided with a second cavity 112, which communicates with the first cavity 111 and forms an ionization cavity 119 for ionizing gas.
  • the anode gun head 109 has a positive charge
  • the cathode gun head 110 has a negative charge
  • the gas between the two electrodes is ionized under the action of the anode gun head 109 and the cathode gun head 110 to generate plasma.
  • the plasma has a positive charge
  • the cathode gun head 110 is located at the end far away from the feeding channel 104 , which can guide the plasma to move towards the cathode gun head 110 and then ejected from the ionization spray mechanism 101 .
  • the ionization cavity 119 is used to accommodate the gas to be ionized and provide a space for ionization reaction to occur.
  • the ionization cavity 119 provides accommodating space for the ionization reaction of the gas.
  • the first cavity 111 and the second cavity 112 are respectively arranged on the anode gun head 109 and the cathode gun head 110, which can provide sufficient electric energy for the occurrence of the ion reaction, and also Can be easy to produce and install.
  • the first cavity 111 and/or the second cavity 112 are cylindrical, and the ionization reaction of the anode gun head 109 and the cathode gun head 110 generally occurs in the center of the cavity, so the present application
  • the medium-cylindrical first chamber 111 and the second chamber 112 have the same length from the surrounding medium when the ionization reaction occurs, so the electricity can evenly act on the gas in the ionization cavity 119, and then the gas will evenly act on the medium after ionization , to improve the efficiency of medium melting while reducing energy loss.
  • the first cavity 111 and the second cavity 112 may also be square, oval, etc., which is not limited in this embodiment of the present application.
  • the end of the cathode gun head 110 away from the anode gun head 109 is also connected to a spray gun head 113, and the spray gun head 113 is provided with a through injection channel 114, and the injection channel 114 communicates with the ionization cavity 119 .
  • the injection channel 114 is provided to effectively gather the plasma in the ionization cavity 119, and the injection direction of the medium in the molten or semi-molten state is controlled by setting the extension direction of the injection channel 114, thereby improving the accuracy of the injection.
  • the size of the injection channel 114 increases gradually along the injection direction of the medium.
  • the injection channel 114 is set in the shape of a bell mouth, the injection surface of the injection port is enlarged, the dispersion of the medium is improved, and the uniformity of medium injection is improved.
  • an injection mask 115 is also provided on the injection port of the injection gun head 113 .
  • Setting the spraying mask 115 can accurately control the spraying area of the powder and improve the accuracy of spraying.
  • the spraying mask 115 can also be designed into a specific shape according to application requirements, for spraying the medium into a corresponding shape, so as to meet different design requirements.
  • a square injection hole may be provided on the injection mask 115 , and the medium ejected from the injection gun head 113 will appear as a square injection pattern on the substrate after passing through the square injection hole of the injection mask 115 .
  • the square injection hole can also be circular, trapezoidal or any preset graphics, and the specific graphics can be selected according to the requirements.
  • the corresponding specific position on the spray mask 115 can be hollowed out, and other positions can be covered, and the medium sprayed by the spray gun head 113 can pass through the spray mask 115. After the injection hole, the graphics will only be formed at the corresponding specific position, and other positions will not be involved.
  • an insulator 118 is further provided between the anode gun head 109 and the cathode gun head 110 , and a through hole is formed on the insulator 118 .
  • the insulator 118 can be an insulating gasket or a rubber ring, and the insulator 118 insulates the cathode gun head 110 and the anode gun head 109 to prevent short circuit. Through holes are provided on the insulator 118 to allow the medium and ionized air to pass through smoothly.
  • the application provides a spraying equipment 1, as shown in Figure 2, the spraying equipment 1 includes a base 20 and the plasma spraying device 10 in any of the above-mentioned embodiments, the plasma spraying device 10 is set on the base 20.
  • the multiple plasma spraying devices 10 are arranged at intervals on the base 20 , and the injection ports of the multiple plasma spraying devices 10 face the same side of the base 20 .
  • Multiple plasma spraying devices 10 are set in one spraying equipment 1, which can spray multiple media at the same time and improve the spraying efficiency.
  • three plasma spraying devices 10 may be provided.
  • Three plasma spray devices 10 are arranged side by side in the base 20 . It can be understood that the number of plasma spraying devices 10 is not limited to three, and can be set as required, which is not limited here.
  • the medium conveying mechanism 103 and the gas conveying channel 102 are both arranged in the base 20 , and the control valve 108 extends into the plasma jet device 10 through the surface of the base 20 and communicates with the inlet 107 of the gas conveying channel 102 .
  • the integration of the control valve 108 and the base 20 can be improved to facilitate the control of the delivery volume of the medium.
  • the feeding tube 116 is arranged on the surface of the base 20 , one end of the feeding tube 116 extends into the base 20 and communicates with the medium delivery channel, and the delivery tube 116 feeds the medium from the outside of the base 20 into the medium delivery channel.
  • the gas conveying channel 102 and the medium conveying mechanism 103 are independent of each other, and can be used to spray at least three different media, and by controlling the feeding speed of each screw feeder 105, the quality of the medium is controlled, thereby Control the injection ratio of different media.
  • the spraying equipment 1 can accurately control the proportion and temperature of the spraying medium, and improve the spraying quality of the film layer.
  • the spraying directions of the plasma spraying devices 10 are intersected at a certain angle, so as to spray the media sprayed from multiple plasma spraying devices 10 to the same target position. It can be understood that a plurality of plasma spraying devices 10 can simultaneously spray different media to form mixed media, or successively spray different substrates to form multi-layer coatings, or successively spray the same kind of substrates.
  • the above-mentioned spray modes can effectively improve the film-forming efficiency of the film layer.
  • the selection of the specific injection method is not limited here, and can be designed according to actual conditions.
  • the spraying angle of the plasma spraying device 10 may be calculated and determined according to the spraying distance, the spraying area and the position of the spraying point, which is not limited here. By setting the plasma spraying devices 10 at different angles, the spraying directions of multiple plasma spraying devices 10 can be adjusted to the same target area, so as to realize spraying with multiple powders at the same time, and improve the mixing uniformity of spraying and the efficiency of spraying.
  • the feeding channel 104 is disposed in the base 20
  • the gas delivery channel 102 is an annular pipe arranged at intervals along the circumference of the feeding channel 104 .
  • the feeding channel 104 and the gas delivery channel 102 in the embodiment of the present application are both arranged in the base 20, which improves the integration of the device.
  • the gas delivery channel 102 is arranged on the outer periphery of the delivery channel 104 and the gas delivery channel 102 and the delivery channel 104 extend in the same direction, which can facilitate simultaneous delivery of gas and medium to the injection mechanism.
  • the present application also provides a solar cell manufacturing equipment, including the spraying equipment 1 described in any solution above. It can be understood that, in addition to the spraying equipment 1 in the above-mentioned embodiments, the solar cell manufacturing equipment provided by the present application may also include other necessary components of solar cell manufacturing equipment, and the solar cell manufacturing equipment in this embodiment can achieve the above The technical effect of any embodiment will not be repeated here.

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Abstract

本申请公开了一种等离子喷射装置、喷涂设备及太阳能电池制造设备，等离子喷涂设备包括电离喷射机构、气体输送通道以及介质输送机构。气体输送通道与电离喷射机构连通并用于向电离喷射机构输送气体，电离喷射机构用于电离气体。介质输送机构包括送料通道以及设于送料通道中的螺旋送料器，送料通道与电离喷射机构连通，螺旋送料器用于将送料通道内的介质输送至电离喷射机构中，以将介质熔化并喷出。本申请实施例提供的等离子喷射装置、喷涂设备及太阳能电池制造设备，能够精确控制介质喷出量，解决介质喷射量无法精确控制导致的成膜质量低的问题。

Description

等离子喷射装置、喷涂设备及太阳能电池制造设备
相关申请的交叉引用
本申请要求享有于2021年12月23日提交的名称为“等离子喷射装置、喷涂设备及太阳能电池制造设备”的中国专利申请202123269140.3的优先权，该申请的全部内容通过引用并入本文中。
技术领域
本申请涉及电池制造设备领域，特别是涉及一种等离子喷射装置、喷涂设备及太阳能电池制造设备。
背景技术
太阳能电池是一种利用光生伏特效应将太阳能直接转化为电能的器件。迄今为止，已研制出了很多种类的太阳能电池。包括：单晶硅太阳能电池、多晶硅太阳能电池、非晶硅太阳能电池、化合物半导体太阳能电池等。
太阳能电池制造过程中，通常使用热喷涂技术将光能吸收材料喷射至基材上。热喷涂技术是利用热源将喷涂材料迅速加热到熔融或半熔融状态，在经过高速气流或焰流将其雾化加速喷射到预处理过的工件表面上，从而形成涂层的一种表面加工方法，根据热源的不同，可将热喷涂分为电弧喷涂、等离子喷涂、爆炸喷涂等。但是，现有的喷涂设备无法调节介质的喷射量。
发明内容
鉴于上述问题，本申请提供一种等离子喷射装置、喷涂设备及太阳能电池制造设备，能够解决介质喷射量无法精确控制的问题。
第一方面，本申请提供了一种等离子喷射装置，包括电离喷射机构、气体输送通道和介质输送机构。其中，气体输送通道与电离喷射机构连通并用于向电离喷射机构输送气体，电离喷射机构用于电离气体；介质输送机构包括送料通道以及设于送料通道中的螺旋送料器，送料通道与电离喷射机构连通，螺旋送料器用于将送料通道内的介质输送至电离喷射机构中，以将介质熔化并喷出。
本申请实施例的技术方案中，设置气体输送通道以及介质输送机构将待电离的气体以及介质输送至电离喷射机构中，设置电离喷射机构用于将熔融或半熔融状态的介质进行喷射，电离喷射机构用于电离气体输送通道输送的气体以将送料通道输送的介质熔化并喷出。并且，通过控制螺旋送料器的转动速度，即可改变进入电离喷射机构中的介质的量，以调节电离喷射机构的喷射量，从而提升喷射量的准确性以及喷射的均匀度。
在一些实施例中，等离子喷射装置还包括连接于螺旋送料器一端的驱动器。设置驱动器能够实现对螺旋送料器的自动控制，提升对介质喷射控制的效率以及准确性。
在一些实施例中，气体输送通道具有入口以及出口，入口用于连接气源，出口与电离喷射机构连通。上述结构中的气体输送通道用于连接气源以及电离喷射机构，将气源中的气体输送至电离喷射机构中，使得气体被电离后释放热量将介质熔化，并且将介质喷出。
在一些实施例中，入口设有用于控制气体流量的控制阀。设置气体流量控制阀能够实现对气体流量的控制，以调节气体电离的量从而控制介 质熔融的温度。
在一些实施例中，电离喷射机构包括阳极枪头和阴极枪头。其中，阳极枪头设于送料通道的一端，且具有与送料通道连通的第一腔体；阴极枪头设置于阳极枪头远离送料通道的一端，阴极枪头设有第二腔体，第二腔体与第一腔体连通并形成用于电离气体的电离空腔。上述的结构将电离空腔直接设置于阴极枪头以及阳极枪头中，简化了电离喷射机构的结构，提升了电离反应的效率。
在一些实施例中，阴极枪头远离阳极枪头的一端还连接有喷射枪头，喷射枪头内设有贯通的喷射通道，喷射通道与电离空腔连通。设置喷射通道能够控制熔融或半熔融状态下介质喷射的方向，提升喷射的准确性。
在一些实施例中，喷射通道的尺寸沿介质的喷射方向逐渐增大。将喷射通道设置为喇叭口的形状增大喷射口的喷射面，提升介质的分散性，以提升介质喷射均匀性。
在一些实施例中，喷射枪头的喷射口上还设有喷射掩膜板。设置掩膜板，能够精确控制粉料的喷涂区域，提升喷射的准确性。
在一些实施例中，阳极枪头以及阴极枪头之间还设有绝缘件，绝缘件上设有贯穿的通孔。通过设置绝缘件将阴极枪头以及阳极枪头进行绝缘分离，防止其发生短路，并且设置通孔以供介质以及电离气体顺利通过。
第二方面，本申请提供了一种喷涂设备，其包括基座以及上述实施例中的等离子喷射装置，等离子喷射装置设于基座；其中，等离子喷射装置的数量为多个，多个等离子喷射装置间隔设于基座，多个等离子喷射装置的喷射口朝向基座的同一侧。一个喷涂设备中设置多个等离子喷射装置，能够同时喷射多种介质，提升喷射效率。
在一些实施例中，等离子喷射装置的喷射方向成一定角度相交设置，以将多个等离子喷射装置中喷出的介质喷射至同一目标位置。
在一些实施例中，送料通道设于基座内，气体输送通道为沿送料通道周向间隔环绕设置的环形管道。将气体输送通道设置于送料通道的外周且气体输送通道与送料通道延伸方向相同，能便于气体以及介质同时输送至喷射机构中。
第三方面，本申请提供了一种太阳能电池制造设备，其包括上述实施例中的喷涂设备。
上述说明仅是本申请技术方案的概述，为了能够更清楚了解本申请的技术手段，而可依照说明书的内容予以实施，并且为了让本申请的上述和其它目的、特征和优点能够更明显易懂，以下特举本申请的具体实施方式。
附图说明
下面将参考附图来描述本申请示例性实施例的特征、优点和技术效果。
图1为本申请一些实施例的等离子喷射装置的结构示意图；
图2位本申请一些实施例的喷涂设备的结构示意图；
图3为本申请另一些实施例的喷涂设备的结构示意图。
附图标记详细说明
1、喷涂设备；10、等离子喷射装置；101、电离喷射机构；102、气体输送通道；103、介质输送机构；104、送料通道；105、螺旋送料器；106、驱动器；107、入口；108、控制阀；109、阳极枪头；110、阴极枪 头；111、第一腔体；112、第二腔体；113、喷射枪头；114、喷射通道；115、喷射掩膜板；116、送料管；117、送料孔；118、绝缘件；119、电离空腔；20、基座。
具体实施方式
下面将结合附图对本申请技术方案的实施例进行详细的描述。以下实施例仅用于更加清楚地说明本申请的技术方案，因此只作为示例，而不能以此来限制本申请的保护范围。
除非另有定义，本文所使用的所有的技术和科学术语与属于本申请的技术领域的技术人员通常理解的含义相同；本文中所使用的术语只是为了描述具体的实施例的目的，不是旨在于限制本申请；本申请的说明书和权利要求书及上述附图说明中的术语“包括”和“具有”以及它们的任何变形，意图在于覆盖不排他的包含。
在本申请实施例的描述中，技术术语“第一”“第二”等仅用于区别不同对象，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量、特定顺序或主次关系。在本申请实施例的描述中，“多个”的含义是两个以上，除非另有明确具体的限定。
在本文中提及“实施例”意味着，结合实施例描述的特定特征、结构或特性可以包含在本申请的至少一个实施例中。在说明书中的各个位置出现该短语并不一定均是指相同的实施例，也不是与其它实施例互斥的独立的或备选的实施例。本领域技术人员显式地和隐式地理解的是，本文所描述的实施例可以与其它实施例相结合。
在本申请实施例的描述中，术语“和/或”仅仅是一种描述关联对象的关联关系，表示可以存在三种关系，例如A和/或B，可以表示：单独存 在A，同时存在A和B，单独存在B这三种情况。另外，本文中字符“/”，一般表示前后关联对象是一种“或”的关系。
在本申请实施例的描述中，术语“多个”指的是两个以上(包括两个)，同理，“多组”指的是两组以上(包括两组)，“多片”指的是两片以上(包括两片)。
在本申请实施例的描述中，技术术语“中心”“纵向”“横向”“长度”“宽度”“厚度”“上”“下”“前”“后”“左”“右”“竖直”“水平”“顶”“底”“内”“外”“顺时针”“逆时针”“轴向”“径向”“周向”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本申请实施例和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请实施例的限制。
在本申请实施例的描述中，除非另有明确的规定和限定，技术术语“安装”“相连”“连接”“固定”等术语应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或成一体；也可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通或两个元件的相互作用关系。对于本领域的普通技术人员而言，可以根据具体情况理解上述术语在本申请实施例中的具体含义。
太阳能电池由于具有高效率、低成本等优点，是未来绿色能源的主要发展方向之一。现有技术中，太阳能电池中的主要光电转换元件是光电转换膜层，光电转换膜层通常使用喷涂设备进行喷射成膜进行制备。其中，等离子喷涂设备由于其能在熔化介质的同时将熔融状态的粉料进行喷射，因此受到广泛的运用。
具体来说，等离子喷涂设备是使用电能将氩、氢或氦等混合气体电 离成为高温等离子体，并形成等离子气体流。其利用高温和高速等离子气体流将金属或金属氧化物、金属碳化物融化后喷射到工件的表面，以形成光电转换膜层。等离子喷涂方法喷射粒子的速度快，涂层致密，粘结强度大，因此大多工业上的大气等离子喷涂设备都偏向于选择这种喷涂方法。特别是太阳能薄膜电池中，利用等离子喷涂设备，将介质熔融后将其喷射至基材上以形成太阳能光能吸收薄膜。
但是，现有的等离子喷涂设备中，介质从粉料送料管中输入并喷出时，介质的用量无法进行精确控制，从而导致介质的喷射量无法进行精确控制。
申请人经过研究发现，通过在送料通道中设置螺旋送料器，当螺旋送料器中的介质运送的量保持稳定，通过调整螺旋送料器旋转送料的速度，即可以调整介质进入电离空腔中的重量，可以有效控制介质的喷射量。进而，能将介质的喷射量进行精确的控制，操作简便、控制精确。保证成膜效率，提升太阳能电池的性能。
具体的，本申请实施例中的等离子喷涂设备，包括电离喷射机构、气体输送通道以及介质输送结构。气体输送通道与电离喷射机构连通并用于向电离喷射机构输送气体，电离喷射机构用于电离气体。介质输送机构包括送料通道以及设于送料通道中的螺旋送料器，送料通道与电离喷射机构连通，螺旋送料器用于将送料通道内的介质输送至电离喷射机构中，以将介质熔化并喷出。
本申请实施例的技术方案中，设置气体输送通道以及介质输送机构将待电离的气体以及介质输送至电离喷射机构中，设置电离喷射机构用于将熔融或半熔融状态的介质进行喷射，电离喷射机构用于电离气体输送通道102输送的气体以将送料通道输送的介质熔化并喷出。并且，通过控制 螺旋送料器的转动速度，即可改变进入电离喷射机构中的介质的量，以调节电离喷射机构的喷射量以提升喷射量的准确性以及喷射的均匀度。
本申请实施例公开的等离子喷射装置、喷涂设备可以但不限用于太阳能电池薄膜喷涂，还可以用于需要将介质进行融化以及喷涂的工业设备，本申请的设备能够有效的提升喷涂的成膜效率以及精确控制膜层厚度。
以下实施例为了方便说明，以本申请一实施例的一种等离子喷涂装置为例进行说明。请参照图1，图1为本申请一些实施例提供的等离子喷射装置10的结构示意图。
如图1所示，本申请实施例提供的等离子喷涂装置10包括电离喷射机构101、气体输送通道102以及介质输送机构103。气体输送通道102与电离喷射机构101连通并用于向电离喷射机构101输送气体，电离喷射机构101用于电离气体。介质输送机构103包括送料通道104以及设于送料通道104中的螺旋送料器105。送料通道104与电离喷射机构101连通，螺旋送料器105用于将送料通道104内的介质输送至电离喷射机构101中，以将介质熔化并喷出。
在本申请的一些实施例中，送料通道104还连接有送料管116，送料管116用于将介质输入送料通道104中。送料管116内设有贯通的送料孔117，送料孔117的尺寸沿着介质的输送方向逐渐减小。上述的结构能够便于介质从送料管116中输入，提升介质的输送效率。
其中，螺旋送料器105包括旋转轴以及沿周向设于旋转轴上的螺旋叶片。旋转轴带动螺旋叶片绕自身轴向转动，螺旋叶片用于承载物料。因此，旋转轴的旋转速度越快，螺旋叶片的物料运送速度越快，且物料运送量越多。
电离喷射机构101用于生成等离子体，电离喷射机构101的两端分别通正电荷以及负电荷，两种电荷相遇，发生电离反应，将周围的气体电离成等离子体同时释放出大量的热量，将周围的介质熔化。等离子体带有正电荷，在电极作用下向带有负电荷的一端移动，因此生成了离子风带动熔化的介质移动。气体输送通道102用于将待电离的气体输送至电离喷射机构101中，气体输送通道102可以为圆柱形腔体，便于气体的均匀输送，需要注意的是，气体输送通道102也可以为方形、椭圆形等，本申请实施例对此不做限定。介质输送机构103与气体输送通道102间隔设置，介质输送通道103用于将待电离的介质输送至电离喷射机构101中。
本申请实施例中的介质，用于喷射至基材上，介质通常为固体粉料，其粒度可以根据介质的材质以及喷射量等进行计算确定。常用的介质有，钛氧化物、锶氧化物、锂氧化物以及钨氧化物等。具体的介质种类，也应根据太阳能电池的结构设计进行选择，在此不做限制。气体输送通道102中的待电离的气体可以是氧气、二氧化碳、氩气、氦气、氨气以及氮气等，本申请实施例对此亦不做限定。
本申请实施例的技术方案中，设置气体输送通道102以及介质输送机构103将待电离的气体以及介质输送至电离喷射机构101中；设置电离喷射机构101用于将熔融或半熔融状态的介质进行喷射，电离喷射机构101用于电离从气体输送通道102输送的气体以将送料通道104输送的介质熔化并喷出。并且，通过控制螺旋送料器105的转动速度，即可改变进入电离喷射机构101中的介质的量，以调节电离喷射机构101的喷射量，达到提升喷射量的控制准确性以及喷射的均匀度的目的。
在本申请的一些实施例中，等离子喷射装置10还包括连接于螺旋送料器105一端的驱动器106。可选的，驱动器106可以是驱动电机，通过 控制驱动电机的旋转从而带动螺旋送料器105转动，并控制螺旋送料器105的转动速率。设置驱动器106能够实现对螺旋送料器105的自动控制，提升对介质喷射控制的效率以及准确性。
在本申请的一些实施例中，气体输送通道102具有入口107以及出口(图中未示出)。入口107用于连接气源，出口与电离喷射机构101连通。气源可以是惰性气体，也可以是氢气、氮气或氧气等易于获得的气体。出口和入口107一般分别设于气体输送通道102的两端，以便于气体的输送，防止气体残留在气体输送通道102中形成浪费。上述结构中的气体输送通道102用于连接气源以及电离喷射机构101，将气源中的气体输送至电离喷射机构101中，使得气体被电离后释放热量将介质熔化，并且将介质喷出。
在本申请的一些实施例中，入口107设有用于控制气体流量的控制阀108。控制阀108包括但不限于气动阀、电动阀以及电磁阀等。控制阀108不仅限于人工手动控制，也可连接控制器进行自动控制，或者远程控制设备进行远程操作，以提升操作便利性。设置控制阀108能够实现对进入气体输送通道102内的气体流量的控制，气体作为熔化介质的等离子体的原料，气体的量越多发生的电离反应越剧烈，产生的热量越高。不同的介质具有不同的熔点，因此，通过调节气体的流量能够对电离的热量进行调整，以控制电离喷射机构101的温度，从而控制介质熔融的温度。
可以理解的是，气体的流量越大、气体的流速越快电离喷射机构101中的温度越高。高温的情况适用于熔化熔点较高的介质，或者用于熔化质量较多的介质。气体的流量越小，气体的流速越慢电离喷射机构101中的温度越低。低温的情况是用于熔化熔点较低的介质，或者用于熔化质量较少的介质。本申请实施例中设置的控制阀108，能够根据介质的情况 进行进气量的调整，提升介质熔化的质量，也能减少能源的浪费，提高效率。
在本申请的一些实施例中，电离喷射机构101包括，阳极枪头109以及阴极枪头110。阳极枪头109设于送料通道104的一端，且具有与送料通道104连通的第一腔体111。阴极枪头110，设置于阳极枪头109远离送料通道104的一端。阴极枪头110设有第二腔体112，第二腔体112与第一腔体111连通并形成用于电离气体的电离空腔119。
上述的结构中，阳极枪头109带有正电荷，阴极枪头110带有负电荷，两个电极之间的气体在阳极枪头109以及阴极枪头110的作用下电离生成等离子体。等离子体带有正电荷，因此阴极枪头110设在远离送料通道104的一端，能够引导等离子体朝向阴极枪头110运动，然后从电离喷射机构101中喷出。电离空腔119用于容纳待电离的气体，并提供发生电离反应的空间。
电离空腔119为气体的电离反应提供容纳空间，第一腔体111以及第二腔体112分别设于阳极枪头109以及阴极枪头110，能够为离子反应的发生提供充分的电能，同时也能便于生产和安装。
在本申请的一些实施例中，第一腔体111和、或第二腔体112为圆柱形，阳极枪头109以及阴极枪头110发生电离反应一般是在腔体的中心出，因此本申请中圆柱形的第一腔体111以及第二腔体112发生电离反应时距离周围的介质长度相等，因此电量能够均匀的作用于电离空腔119中的气体，气体电离后再均匀地作用于介质，以提升介质熔化的效率，同时降低能源损耗。当然，在不同的使用工况下，第一腔体111和第二腔体112也可以为方形、椭圆形等，本申请实施例对此不做限定。
在本申请的一些实施例中，阴极枪头110远离阳极枪头109的一端 还连接有喷射枪头113，喷射枪头113内设有贯通的喷射通道114，喷射通道114与电离空腔119连通。设置喷射通道114，能够将电离空腔119中的等离子体有效聚集，通过设置喷射通道114的延伸方向控制熔融或半熔融状态下介质喷射的方向，提升喷射的准确性。
在本申请的一些实施例中，喷射通道114的尺寸沿介质的喷射方向逐渐增大。将喷射通道114设置为喇叭口的形状，增大喷射口的喷射面，提升介质的分散度，以提升介质喷射均匀性。
在本申请的一些实施例中，喷射枪头113的喷射口上还设有喷射掩膜板115。设置喷射掩膜板115，能够精确控制粉料的喷涂区域，提升喷射的准确性。并且，喷射掩膜板115还可以根据应用需要设计成特定的形状，用于将介质喷射成相应的形状，以满足不同的设计需求。例如，可以在喷射掩膜板115上设置方形喷射孔，喷射枪头113喷射出的介质通过喷射掩膜板115的方形喷射孔后在基材上呈现为方形的喷射图形。方形喷射孔也可以为圆形、梯形或任何预设图形，具体图形按照需求进行选择。或者，当需要对基材的特定位置进行喷射时，可在喷射掩膜板115上对应的特定位置进行挖空，其他位置进行遮盖，则喷射枪头113喷射出的介质通过喷射掩膜板115的喷射孔后则只会在对应的特定位置形成图形，不会涉及到其他位置。
在本申请的一些实施例中，阳极枪头109以及阴极枪头110之间还设有绝缘件118，绝缘件118上设有贯穿的通孔。绝缘件118可以是绝缘垫片或橡胶圈，绝缘件118将阴极枪头110以及阳极枪头109进行绝缘，防止其发生短路。在绝缘件118上设置通孔以供介质以及电离空气顺利通过。
根据本申请的一些实施例，本申请提供了一种喷涂设备1，如图2所 示，喷涂设备1其包括基座20以及上述任一实施例中的等离子喷射装置10，等离子喷射装置10设于基座20。其中，等离子喷射装置10的数量为多个，多个等离子喷射装置10间隔设于基座20，多个等离子喷射装置10的喷射口朝向基座20的同一侧。一个喷涂设备1中设置多个等离子喷射装置10，能够同时喷射多种介质，提升喷射效率。
在本申请的实施例中，如图2以及图3所示，等离子喷射装置10可以设置三个。三个等离子喷射装置10并列设于基座20内。可以理解的是，等离子喷射装置10的数量不限于三个，可以根据需要进行设置，在此不做限定。其中，介质输送机构103以及气体输送通道102均设于基座20内，控制阀108穿过基座20表面伸入等离子喷射装置10中，并与气体输送通道102连通的入口107连通。能提升控制阀108与基座20的集成性，便于对介质的输送量的控制。送料管116设于基座20表面，送料管116的一端伸入基座20内并与介质输送通道连通，送料管116将介质从基座20外部输入介质输送通道内。
三个等离子喷射装置10中，气体输送通道102以及介质输送机构103相互独立，能够用于喷射至少三种不同的介质，并且通过控制各自螺旋送料器105的送料速度，控制介质的质量，以此控制不同介质的喷射比例。同时，通过控制各自的气体输送通道102中的气体流量，控制对应的介质的熔化温度，能保证每种介质均完全熔化。上述的结构，通过设置多个等离子喷射装置10，能够实现喷涂设备1对喷射介质的比例以及温度进行精确控制，提升膜层的喷涂质量。
在本申请的一些实施例中，等离子喷射装置10的喷射方向成一定角度相交设置，以将多个等离子喷射装置10中喷出的介质喷射至同一目标位置。可以理解的是，多个等离子喷射装置10可以是同时喷涂不同的介 质以形成混合介质，或者是先后喷涂不同的基材以形成多层涂层，或者是先后喷涂相同种类的基材。上述的喷射模式均能有效提升膜层的成膜效率。而具体的喷射方式的选择，在此不做限定，可以根据实际情况进行设计。
在本申请的一些实施例中，等离子喷射装置10的喷射角度，可以根据喷射距离、喷射面积以及喷射点的位置进行计算确定，在此不做限定。通过不同角度设置等离子喷射装置10，将多个等离子喷射装置10的喷涂方向调整至同一目标区域，实现同时使用多种粉料的喷涂，提升喷涂的混合均匀性以及喷涂的效率。
在本申请的一些实施例中，请结合参考图1以及图3，送料通道104设于基座20内，气体输送通道102为沿送料通道104周向间隔环绕设置的环形管道。本申请实施例中的送料通道104以及气体输送通道102均设置于基座20内，提升了设备的集成度。并且，将气体输送通道102设置于送料通道104的外周且气体输送通道102与送料通道104延伸方向相同，能便于气体以及介质同时输送至喷射机构中。
根据本申请的一些实施例，本申请还提供了一种太阳能电池制造设备，包括以上任一方案所述的喷涂设备1。可以理解的是，本申请提供的太阳能电池制造设备，除了包括上述实施例中的喷涂设备1，还可以包括其他太阳能电池制造设备必要的部件，并且本实施例中的太阳能制造设备，能够达到以上任意实施例的技术效果，在此不做赘述。
最后应说明的是：以上各实施例仅用以说明本申请的技术方案，而非对其限制；尽管参照前述各实施例对本申请进行了详细的说明，本领域的普通技术人员应当理解：其依然可以对前述各实施例所记载的技术方案进行修改，或者对其中部分或者全部技术特征进行等同替换；而这些修改 或者替换，并不使相应技术方案的本质脱离本申请各实施例技术方案的范围，其均应涵盖在本申请的权利要求和说明书的范围当中。尤其是，只要不存在结构冲突，各个实施例中所提到的各项技术特征均可以任意方式组合起来。本申请并不局限于文中公开的特定实施例，而是包括落入权利要求的范围内的所有技术方案。

Claims (13)

  1. 一种等离子喷射装置，包括：
    电离喷射机构；
    气体输送通道，与所述电离喷射机构连通并用于向所述电离喷射机构输送气体，所述电离喷射机构用于电离所述气体；以及，
    介质输送机构，包括送料通道以及设于所述送料通道中的螺旋送料器，所述送料通道与所述电离喷射机构连通，所述螺旋送料器用于将所述送料通道内的介质输送至所述电离喷射机构中，以将所述介质熔化并喷出。
  2. 根据权利要求1所述的等离子喷射装置，其中，还包括连接于所述螺旋送料器一端的驱动器。
  3. 根据权利要求1或2所述的等离子喷射装置，其中，所述气体输送通道具有入口以及出口，所述入口用于连接气源，所述出口与所述电离喷射机构连通。
  4. 根据权利要求3所述的等离子喷射装置，其中，所述入口设有用于控制所述气体流量的控制阀。
  5. 根据权利要求1-4中任意一项所述的等离子喷射装置，其中，所述电离喷射机构包括，
    阳极枪头，设于所述送料通道的一端，且具有与所述送料通道连通的第一腔体；
    阴极枪头，设置于所述阳极枪头远离所述送料通道的一端，所述阴极枪头设有第二腔体，所述第二腔体与所述第一腔体连通并形成用于电离所述气体的电离空腔。
  6. 根据权利要求5所述的等离子喷射装置，其中，所述阴极枪头远离 所述阳极枪头的一端还连接有喷射枪头，所述喷射枪头内设有贯通的喷射通道，所述喷射通道与所述电离空腔连通。
  7. 根据权利要求6所述的等离子喷射装置，其中，所述喷射通道的尺寸沿所述介质的喷射方向逐渐增大。
  8. 根据权利要求6或7所述的等离子喷射装置，其中，所述喷射枪头的喷射口上还设有喷射掩膜板。
  9. 根据权利要求5-8中任一项所述的等离子喷射装置，其中，所述阳极枪头以及所述阴极枪头之间还设有绝缘件，所述绝缘件上设有贯穿的通孔。
  10. 一种喷涂设备，包括：
    基座，
    如权利要求1-9中任意一项所述的等离子喷射装置，所述等离子喷射装置设于所述基座；
    其中，所述等离子喷射装置的数量为多个，多个所述等离子喷射装置间隔设于所述基座，多个所述等离子喷射装置的喷射口朝向所述基座的同一侧。
  11. 根据权利要求10所述的喷涂设备，其中，多个所述等离子喷射装置的喷射方向成一定角度相交设置，以将多个所述等离子喷射装置中喷出的所述介质喷射至同一目标位置。
  12. 根据权利要求10或11所述的喷涂设备，其中，所述送料通道设于所述基座内，所述气体输送通道为沿所述送料通道周向间隔环绕设置的环形管道。
  13. 一种太阳能电池制造设备，包括如权利要求10-12任意一项所述的喷涂设备。
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