WO2023090002A1 - Semiconductor device, electronic apparatus, and manufacturing method for semiconductor device - Google Patents

Semiconductor device, electronic apparatus, and manufacturing method for semiconductor device Download PDF

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Publication number
WO2023090002A1
WO2023090002A1 PCT/JP2022/038198 JP2022038198W WO2023090002A1 WO 2023090002 A1 WO2023090002 A1 WO 2023090002A1 JP 2022038198 W JP2022038198 W JP 2022038198W WO 2023090002 A1 WO2023090002 A1 WO 2023090002A1
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WO
WIPO (PCT)
Prior art keywords
frame member
semiconductor element
peripheral wall
housing
frame
Prior art date
Application number
PCT/JP2022/038198
Other languages
French (fr)
Japanese (ja)
Inventor
亮 谷田貝
健一 田口
Original Assignee
ソニーセミコンダクタソリューションズ株式会社
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Application filed by ソニーセミコンダクタソリューションズ株式会社 filed Critical ソニーセミコンダクタソリューションズ株式会社
Publication of WO2023090002A1 publication Critical patent/WO2023090002A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/02Containers; Seals
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/38Cooling arrangements using the Peltier effect

Definitions

  • the present disclosure relates to semiconductor devices, electronic devices, and methods of manufacturing semiconductor devices.
  • the package structure of a semiconductor device equipped with a semiconductor element such as an imaging element such as a CMOS image sensor or a light emitting element such as a semiconductor laser has the following configuration. That is, it is a configuration in which a lid body in which a transparent member such as glass is supported by a frame-shaped member is joined to a housing that forms a package main body in which a semiconductor element is mounted, and the arrangement space of the semiconductor element is hermetically sealed ( For example, see Patent Document 1.).
  • Patent Literature 1 discloses a configuration including a frame member made of a metal plate, a frame member made of ceramics or the like, and a translucent member made of a glass material, as a configuration of the lid of the package structure.
  • the outer edge of the frame member is projected from the frame, and the stepped portion formed on the inner peripheral side of the frame is translucent. It has a structure in which elastic members are joined together.
  • the frame member and the translucent member are bonded to the frame by a bonding material so as to sandwich the frame from above and below.
  • the outer edge of the frame member projecting in a flange shape from the outer edge of the frame serves as the joint to the package body.
  • the outer edge of the frame member is joined to the upper surface of the peripheral wall-like portion surrounding the semiconductor element in the package body by welding such as seam welding.
  • the joint portion of the frame member to the frame is It needs to be positioned outside the joint portion of the translucent member with respect to the frame. Therefore, there is a problem that the process control in the manufacturing process of the lid becomes complicated.
  • the present technology can simplify the configuration of the lid bonded to the package body, simplify the manufacturing process, and reduce costs.
  • An object of the present invention is to provide a semiconductor device, an electronic device, and a method of manufacturing a semiconductor device that can reduce the influence of stress.
  • a semiconductor device includes: a semiconductor element; a housing having a peripheral wall portion surrounding the semiconductor element; a transparent member, a flange portion joined to the peripheral wall portion, and a supporting surface portion located closer to the semiconductor element than the flange portion and supporting the transparent member, and a frame member forming an airtight space around the element.
  • the flange portion of the frame member is welded to the peripheral wall portion.
  • the frame member has a side surface portion that connects the flange portion and the support surface portion, and the support surface portion and the side surface portion connect the flange portion with the side surface portion. and the transparent member is positioned entirely within the recess.
  • the supporting surface portion of the frame member is provided on a side opposite to the transparent member side, and supports the supporting surface portion with respect to the housing side. It further comprises a support member.
  • the support member is provided so as to support the support surface portion with respect to the semiconductor element.
  • the frame member includes a frame member main body made of an alloy containing iron, nickel, and cobalt, and at least the peripheral wall of the surface of the frame member main body. and a metal film portion formed to cover a joint surface for the portion.
  • the side portion of the frame member is formed to have a zigzag shape when viewed in vertical cross section.
  • the semiconductor element is provided in a state of being supported by a cooling element with respect to the housing.
  • An electronic device includes: a semiconductor element; a transparent member, a flange portion joined to the peripheral wall portion, and a supporting surface portion located closer to the semiconductor element than the flange portion and supporting the transparent member, and a frame member forming an airtight space around the element.
  • a method for manufacturing a semiconductor device includes steps of preparing a housing having a peripheral wall portion surrounding a semiconductor element and electrically connected to the semiconductor element; a step of providing the semiconductor element in a state of being electrically connected to the housing; a step of forming a frame shape as a whole, having a flange portion on a peripheral edge portion, forming a concave portion corresponding to the flange portion; preparing a frame member having an opening in the bottom surface of the recess; attaching the frame member to the housing by welding the flange portion to the peripheral wall portion; providing a transparent member on the bottom surface so as to cover the opening.
  • the present technology simplifies the structure of the device, simplifies the manufacturing process, and reduces the cost by devising the structure of the lid bonded to the main body of the package.
  • An object of the present invention is to reduce the influence of thermal stress associated with joining a lid to a package body.
  • an imaging device solid-state imaging device including a solid-state imaging element, which is an example of a semiconductor element, will be described as an example of a semiconductor device.
  • description of embodiment is performed in the following order.
  • the imaging device 1 includes an image sensor 2 as a solid-state imaging device, a housing 3, glass 4, and a frame member 5.
  • the imaging device 1 includes a package main body 6 having a configuration in which the image sensor 2 is mounted on the housing 3, and a lid 7 having a configuration in which the glass 4 is attached to the frame member 5.
  • the lid 7 is attached to the package main body 6.
  • a cavity 8 as an airtight space is formed, and an integral package structure in which the image sensor 2 is airtightly sealed is provided.
  • the imaging device 1 is configured symmetrically or substantially symmetrically with respect to each of the left-right direction and the direction orthogonal to the left-right direction in plan view.
  • the package main body 6 will be explained.
  • the package main body 6 has a housing 3 and an image sensor 2 .
  • the housing 3 has a peripheral wall portion 10 surrounding the image sensor 2 and is electrically connected to the image sensor 2 .
  • the housing 3 has a housing body portion 11 to which the image sensor 2 is connected, and the peripheral wall portion 10 is composed of a seal frame 12 which is a frame-shaped member provided for the housing body portion 11. ing. That is, in the housing 3 , the peripheral wall portion 10 is configured by the seal frame 12 which is separate from the housing main body 11 , and the housing 3 fixes the seal frame 12 to the housing main body 11 . Thus, it is configured as an integral member provided with the peripheral wall portion 10 .
  • the housing body 11 is a ceramic package made of ceramic such as alumina (Al 2 O 3 ), aluminum nitride (AlN), silicon nitride (Si 3 N 4 ), or the like.
  • the housing main body 11 has a thick plate-like outer shape that is rectangular in plan view.
  • the housing main body 11 has a top surface 11a as one plate surface and a back surface 11b as a bottom surface opposite to the surface 11a as the other plate surface. Both the front surface 11a and the back surface 11b are horizontal surfaces.
  • the rear surface 11 b is the lower surface (back surface) of the housing 3 .
  • the housing main body 11 has four side surfaces 11c. Wiring layers, electrodes, predetermined circuits, and the like are provided in the housing main body 11 .
  • the housing main body 11 has a concave portion 13 that opens toward the surface 11a as a portion for arranging the image sensor 2 .
  • the concave portion 13 is formed in the central portion of the housing main body portion 11 on the side of the surface 11a.
  • the concave portion 13 has a rectangular opening shape corresponding to the outer shape of the image sensor 2 and is formed in a range that occupies most of the surface 11a side of the housing main body portion 11 .
  • the concave portion 13 is a rectangular hole in a plan view and is formed by a surface portion including four side surface portions 13a formed perpendicular to the plate surface of the housing main body portion 11 and a horizontal bottom surface portion 13b. be.
  • the portion where the recess 13 is formed is a bottom plate portion 11d that is thinner than the peripheral portion where the recess 13 is not formed by the depth of the recess 13.
  • the recessed portion 13 has an opening dimension larger than the external dimension of the image sensor 2 and is formed so that the entire image sensor 2 can be accommodated within the recessed portion 13 in plan view.
  • the material of the housing main body 11 is not limited, and may be made of other materials.
  • the housing main body 11 may be, for example, an organic package or the like made of an organic material such as glass epoxy resin, which is a type of fiber-reinforced plastic.
  • the peripheral wall portion 10 has four wall portions 10a so as to form a rectangular shape in plan view corresponding to the rectangular shape in plan view of the housing main body portion 11, and these wall portions 10a form a frame shape. ing.
  • the wall portion 10a is a portion that follows a rectangular outer shape whose longitudinal direction is the vertical direction in a side cross-sectional view.
  • the wall portion 10a has an inner wall surface 10b, which is a wall surface on the image sensor 2 side, and an outer wall surface 10c, which is an outer wall surface on the opposite side.
  • the peripheral wall portion 10 positions the outer wall surface 10c of each wall portion 10a slightly inside the side surface 11c of the housing main body portion 11 .
  • the peripheral wall portion 10 may be provided so that the outer wall surface 10c of each wall portion 10a is flush with the side surface 11c of the housing main body portion 11 .
  • the peripheral wall portion 10 has an upper surface 10d having a rectangular frame shape in plan view.
  • the upper surface 10d is formed as a plane located on a predetermined imaginary plane perpendicular to the vertical direction.
  • An upper surface 10d of the peripheral wall portion 10 serves as a surface to which the frame member 5 is joined.
  • the seal frame 12 is a portion of the housing 3 that forms the peripheral wall portion 10 to which the frame member 5 is joined.
  • the seal frame 12 is a metal member, and the frame member 5 is welded to the seal frame 12 (peripheral wall portion 10).
  • the seal frame 12 has a configuration in which the surface of a seal frame main body 14 made of a metal material is covered with a metal coating portion 15 (see FIG. 1).
  • the covering portion 15 forms an inner wall surface 10b, an outer wall surface 10c, and an upper surface 10d of the peripheral wall portion 10 .
  • Examples of the metal material forming the seal frame main body 14 include Kovar, which is an alloy containing iron (Fe), nickel (Ni), and cobalt, copper (Cu), a copper alloy, tungsten (W), and aluminum (Al). , stainless steel (SUS), 42 alloy, and the like.
  • the covering portion 15 is a thin-film plated layer formed by plating with nickel (Ni), gold (Au), or the like, for example.
  • the seal frame 12 has a lower surface opposite to the upper surface 10d, which is bonded to the surface 11a of the housing main body 11 by metal brazing material using, for example, a silver-copper (Ag—Cu) alloy. It is joined to the housing body portion 11 .
  • metal brazing material using, for example, a silver-copper (Ag—Cu) alloy. It is joined to the housing body portion 11 .
  • the seal frame 12 has a configuration in which the covering portion 15 is formed on the surface of the seal frame main body 14, but the configuration is not limited to this.
  • the seal frame 12 may be configured with only the seal frame main body 14 , that is, with a configuration in which the covering portion 15 is omitted.
  • the seal frame main body 14 may be a portion formed as a part of the housing main body portion 11 using ceramics or the like as a material, for example.
  • the image sensor 2 is electrically connected to the housing body 11 .
  • the image sensor 2 is a semiconductor element including a semiconductor substrate made of silicon (Si), which is an example of a semiconductor.
  • the image sensor 2 is a rectangular plate-shaped chip, and the front surface 2a, which is the upper plate surface, is the light receiving surface side, and the opposite plate surface is the back surface 2b.
  • the image sensor 2 also has four side portions 2c formed perpendicular to the plate surface.
  • the image sensor 2 is a CMOS (Complementary Metal Oxide Semiconductor) type image sensor.
  • the image sensor 2 may be a CCD (Charge Coupled Device) type image sensor or other imaging device such as a short wavelength infrared (SWIR: Short Wavelength Infra-Red) image sensor.
  • SWIR Short Wavelength Infra-Red
  • the image sensor 2 has, on the surface 2a side, a pixel region 16, which is a light receiving region in which a large number of pixels are formed, and a peripheral region 17, which is a region surrounding the pixel region 16.
  • a large number of pixels are arranged in a predetermined arrangement such as a Bayer arrangement, and constitute a light receiving section of the image sensor 2 .
  • a predetermined peripheral circuit is formed in the peripheral region 17 .
  • the pixel region 16 includes an effective pixel region for generating, amplifying, and reading out signal charges by photoelectric conversion in each pixel.
  • a pixel in the pixel region 16 has a photodiode as a photoelectric conversion unit having a photoelectric conversion function and a plurality of pixel transistors.
  • the pixel area 16 is indicated by a light black portion.
  • a color filter and an on-chip lens are attached to each pixel through an antireflection film made of an oxide film or the like, a planarizing film made of an organic material, or the like, with respect to the semiconductor substrate. correspondingly formed.
  • Light incident on the on-chip lens is received by a photodiode through a color filter, a planarization film, or the like.
  • the image sensor 2 is provided in the housing 3 while being supported by a Peltier element 18, which is a cooling element.
  • the Peltier element 18 is a semiconductor thermoelectric element that uses the Peltier effect, is electrically connected to a power supply (not shown), and generates a temperature difference by passing current supplied from the power supply.
  • the Peltier element 18 has a substantially rectangular plate-like outer shape, and has an upper surface 18a and a lower surface 18b, which are both horizontal surfaces, as upper and lower plate surfaces.
  • the Peltier element 18 is provided in a state of being accommodated within the recess 13 of the housing main body 11 .
  • the Peltier element 18 has an upper surface 18a positioned below the surface 11a of the housing main body 11 in the vertical direction.
  • the Peltier element 18 is fixed on the bottom plate portion 11d with the lower surface 18b as a joint surface for the bottom surface portion 13b.
  • the Peltier element 18 is made of a thermally conductive adhesive such as a die-bonding material, which is a resin-based adhesive with relatively high thermal conductivity, or a TIM (Thermal Interface Material) material to which a filler is added to increase thermal conductivity. It is fixed to the bottom plate portion 11d by bonding, soldering, or the like.
  • the Peltier element 18 by passing a direct current in a predetermined direction, the upper surface 18a side becomes a heat absorption side (cooling side) surface, and the lower surface 18b side becomes a heat radiation side surface. As a result, the image sensor 2 bonded to the upper surface 18 a of the Peltier element 18 is cooled by the Peltier element 18 .
  • the image sensor 2 is electrically connected to the housing main body 11 by a plurality of bonding wires (not shown) as connection members, which are fine metal wires made of Au (gold) or Cu (copper), for example.
  • One end of the bonding wire is connected to the pad electrode formed in the peripheral area 17 on the surface 2a of the image sensor 2, and the other end is connected to the inner side of the peripheral wall 10 on the surface 11a of the housing main body 11. is connected to the lead electrode formed in the inner lead stage.
  • These electrodes are terminals for transmitting/receiving signals to/from the outside in each of the image sensor 2 and the housing main body 11.
  • Al (aluminum), Au (gold), Ag (silver), Cu (copper), etc. is formed as a metal film made of a metal material of
  • a plurality of connectors 19 are provided as terminals for external connection on the rear surface 11b side of the housing main body 11 .
  • the connector 19 is a plug for electrically connecting the imaging device 1 to a circuit board or the like of an external device.
  • the connectors 19 are provided at two locations on the left and right sides on the rear surface 11 b side of the housing main body 11 .
  • the two connectors 19 are provided extending along the left and right edges of the housing main body 11, and form ridges protruding from the rear surface 11b.
  • the imaging device 1 is configured as an image sensor connector package having the connector 19.
  • the external connection terminal of the imaging device 1 is not limited to the connector 19, and may be, for example, a PGA (Pin Grid Array) in which a plurality of pins are arranged in a grid pattern.
  • Lid 7 has glass 4 and frame member 5 .
  • the glass 4 is an example of a transparent member provided so as to face the semiconductor element, and is made of a glass material such as borosilicate glass or soda glass, for example.
  • the glass 4 has a rectangular plate-like outer shape, and has substantially the same outer dimensions as the image sensor 2 in plan view. It has a lower surface 4b, which is a plate surface on the side facing the image sensor 2, and an upper surface 4a, which is a surface on the opposite side.
  • the glass 4 constitutes an optical window and allows various kinds of light entering from an optical system such as a lens positioned above the imaging device 1 to pass therethrough. Light transmitted through the glass 4 enters the light receiving surface of the image sensor 2 via the cavity 8 .
  • the glass 4 has a function of protecting the light receiving surface side of the image sensor 2 .
  • a plastic plate or a silicon plate that transmits only infrared light can be used.
  • the frame member 5 is a metal member formed by molding a metal plate into a predetermined shape.
  • the frame member 5 has a rectangular outer shape in a plan view, and has a flat, substantially inverted hat shape in a side cross-sectional view.
  • the frame member 5 includes a support surface portion 21 which is a bottom surface portion of the frame member 5 and has a rectangular shape in a plan view, and side portions formed along the four sides of the support surface portion 21 as a surface portion having an approximately inverted hat shape in a side sectional view. 22 and a flange portion 23 formed along the upper outer edge of the frame member 5 .
  • the support surface portion 21 is a horizontal surface portion that supports the glass 4 .
  • the side surface portion 22 is a vertical surface portion bent upward from the four edges of the support surface portion 21 so as to form a right angle with the support surface portion 21 .
  • the flange portion 23 is a frame-shaped horizontal surface portion formed by bending outward from the upper edges of the four side surface portions 22 so as to form a right angle with the side surface portions 22 .
  • the four side surface portions 22 are portions that connect the flange portion 23 and the support surface portion 21 .
  • the frame member 5 forms a recess 25 with respect to the flange portion 23 by the support surface portion 21 and the side surface portion 22 .
  • a box-shaped portion with an open top is formed by the support surface portion 21 and the four side portions 22, and the flange portion 23 is formed on the outer side of the opening edge portion on the upper side of the box-shaped portion. .
  • the outer dimensions of the frame member 5 in plan view are the same or substantially the same as the outer dimensions of the seal frame 12 in plan view.
  • the flange portion 23 forming the outer shape in plan view is the portion that is joined to the upper surface 10 d of the peripheral wall portion 10 .
  • the frame member 5 has the flange portion 23 placed on the peripheral wall portion 10, and the box-shaped portion composed of the support surface portion 21 and the side surface portion 22 is positioned below the upper surface 10d of the peripheral wall portion 10 inside the peripheral wall portion 10. It is installed in the Therefore, in the imaging device 1 , the support surface portion 21 of the frame member 5 is positioned closer to the image sensor 2 than the flange portion 23 by the vertical height of the side surface portion 22 .
  • the frame member 5 has a structure in which the surface of a frame member main body 26 made of a metal material is covered with a metal film portion 27 that is a metal film. That is, the frame member 5 has a frame member main body 26 made of a metal material and a metal film portion 27 covering the surface of the frame member main body 26 . 1 and 4, the frame member 5 is shown in a simplified manner.
  • the frame member main body 26 has portions corresponding to the support surface portion 21, the side surface portion 22, and the flange portion 23 as the main body portion of the frame member 5.
  • the frame member main body 26 is obtained by processing a plate material made of a predetermined metal material by press forming such as drawing.
  • the metal material forming the frame member main body 26 include Kovar, which is an alloy containing iron (Fe), nickel (Ni), and cobalt, copper (Cu), a copper alloy, tungsten (W), aluminum (Al), Examples include stainless steel (SUS), 42 alloy, and the like.
  • the metal film portion 27 is formed so as to cover the entire surface of the frame member main body 26, but may be formed on a part of the surface of the frame member main body 26.
  • the metal film portion 27 may be formed so as to cover at least the joint surface with respect to the peripheral wall portion 10 among the surfaces of the frame member main body 26 . That is, in the frame member 5, the lower surface 23b of the flange portion 23 serves as a joint surface with respect to the peripheral wall portion 10, so the metal film portion 27 corresponds to at least the lower surface 23b of the flange portion 23 among the surfaces of the frame member main body 26. It is sufficient that it is formed so as to cover the lower flange surface 26b.
  • the glass 4 is positioned in the recess 25 of the frame member 5 and is provided so as to block the opening 24 with respect to the support surface 21 from above.
  • the glass 4 has a plan view outer shape larger than the opening size of the opening 24 , and is fixed to the support surface 21 in a state where the peripheral portion is placed on the support surface 21 .
  • the glass 4 is fixed on the upper surface 21a of the support surface portion 21 by a glass bonding portion 28 formed of a predetermined bonding material, with the lower surface 4b serving as a bonding surface for the support surface portion 21.
  • the glass bonding portion 28 is interposed between the glass 4 and the support surface portion 21 over the entire or substantially the entire range in which the glass 4 covers the support surface portion 21 .
  • the glass bonding portion 28 is formed in the width direction inner side (opening 24 side) of each side of the supporting surface 21 having a rectangular frame shape with four sides formed by the opening 24 . there is Therefore, the portions of the support surface portion 21 on the outside in the width direction of each side portion are portions on the outside of the outer shape of the glass 4 in plan view, and are exposed surface portions.
  • the glass joint 28 is formed along the entire periphery of the opening 24 so as to follow the opening shape of the opening 24 , and hermetically seals the opening 24 with the glass 4 .
  • the bonding material forming the glass bonding portion 28 is, for example, a low-melting-point glass that melts at a predetermined temperature (eg, a temperature of about 300° C.), a metal brazing material using, for example, a silver-copper (Ag—Cu) alloy, solder, or the like. is.
  • the glass 4 is entirely positioned within the recess 25 of the frame member 5 .
  • the dimensions of the outer shape of the glass 4 in plan view are smaller than the outer dimensions of the concave portion 25 in plan view. It is opposed to the portion 22 with a gap therebetween.
  • the glass 4 has a plate thickness smaller than the vertical dimension of the side surface portion 22 , and in a state of being fixed to the frame member 5 , the upper surface 4 a is vertically aligned with the flange portion 23 of the frame member 5 . is located below the upper surface 23a of the .
  • the upper surface 4a of the glass 4 is located below the upper surface 10d of the peripheral wall portion 10. As shown in FIG.
  • the upper surface 23 a of the flange portion 23 of the frame member 5 serves as the upper surface of the imaging device 1 .
  • An upper surface 23a of the flange portion 23 is a plane positioned on a predetermined imaginary plane perpendicular to the vertical direction.
  • the frame member 5 is joined to the peripheral wall portion 10 to form an airtight space around the image sensor 2 together with the housing 3 and the glass 4. That is, the lid 7 having a configuration in which the opening 24 of the frame member 5 is airtightly sealed with the glass 4 is joined to the peripheral wall 10 so as to airtightly seal the flange 23 of the frame member 5 over the entire circumference.
  • a cavity 8 around the image sensor 2 is an airtight space that does not allow gas to enter or leave the outside.
  • the flange portion 23 of the frame member 5 is welded to the upper surface 10d of the peripheral wall portion 10 .
  • the frame member 5 is welded to the peripheral wall portion 10 at the outer edge side portion in the width direction of the flange portion 23 .
  • the position of the outer edge of the flange portion 23 of the frame member 5 matches or substantially matches the position of the outer edge of the upper surface 10 d of the peripheral wall portion 10 .
  • the dimension of the upper surface 10d of the peripheral wall portion 10 in the width direction (horizontal direction in FIG. 1), that is, the wall thickness of the wall portion 10a is approximately half the dimension of the flange portion 23 in the width direction (horizontal direction in FIG. 1). ing.
  • substantially half of the outer edge side of the flange portion 23 in the width direction is a portion that covers the upper surface 10 d of the peripheral wall portion 10 and is a welded portion to the peripheral wall portion 10 .
  • the outer edge portion having a dimension smaller than half of the overall width dimension of the flange portion 23 in the width direction is a welded portion to the peripheral wall portion 10 .
  • the wall thickness of the wall portion 10 a is smaller than half of the widthwise dimension of the flange portion 23
  • the peripheral wall portion 10 is provided so as to match the outer edge of the flange portion 23 .
  • the outer edge of the flange portion 23 may protrude further outward than the peripheral wall portion 10 .
  • seam welding which is a type of resistance welding that is welded by resistance heat generated by applying an electric current to the target portion, is used.
  • each side portion of the flange portion 23 of the frame member 5 is welded to the upper surface 10d formed by the four wall portions 10a forming the peripheral wall portion 10.
  • the flange portion 23 is continuously welded to the peripheral wall portion 10 over the entire circumference, and the package is hermetically sealed.
  • joining using other welding methods such as laser welding, metal brazing material, or soldering can be used. It may be a joining using a method other than welding, such as joining.
  • the process of bonding the lid 7 to the package body 6 is performed. .
  • a housing 3 having a peripheral wall 10 surrounding the image sensor 2 and electrically connected to the image sensor 2 is prepared. process is performed.
  • the housing 3 is obtained by joining the sealing frame 12 to the housing main body 11 having the concave portion 13 with metal brazing material or the like.
  • a Peltier element 18 to which the image sensor 2 is attached is provided inside the concave portion 13 of the housing 3 .
  • a connector 19 is mounted on the rear surface 11 b of the housing main body 11 .
  • a step of providing the image sensor 2 electrically connected to the housing 3 inside the peripheral wall 10 of the housing main body 11 is performed.
  • the image sensor 2 is fixed to the upper surface 18a of the Peltier element 18 by bonding with a thermally conductive adhesive, soldering, or the like.
  • the image sensor 2 is electrically connected to the housing 3 by bonding wires (not shown) that connect electrodes formed on the surface side of the housing body 11 of the housing 3 and the image sensor 2 .
  • the package main body 6 is obtained through the steps described above.
  • the frame member 5 has a frame shape as a whole, has a flange portion 23 on the peripheral edge, forms a recess 25 for the flange portion 23 , and has an opening 24 in the support surface portion 21 that is the bottom portion of the recess 25 .
  • a metal plate is processed into a concave shape by press forming such as drawing, and a frame member main body 26 having portions to be the support surface portion 21, the side surface portion 22, and the flange portion 23 is formed.
  • Kovar for example, is used as the material of the frame member main body 26 .
  • the frame member main body 26 is plated with a material such as nickel (Ni) or gold (Au) by a known method such as electrolytic plating, so that the surface of the frame member main body 26 is entirely covered.
  • a covering metal film portion 27 is formed. Thereby, the frame member 5 is obtained.
  • a step of providing the glass 4 on the support surface portion 21 of the frame member 5 so as to close the opening 24 is performed.
  • the glass 4 is bonded onto the support surface portion 21 by low-melting-point glass that serves as the glass bonding portion 28 .
  • a pair of electrode rollers 30 are used as seam welding rollers in seam welding.
  • the electrode roller 30 has a truncated cone-shaped roller main body 31 and a shaft 32 extending from the bottom side of the roller main body 31.
  • the central axis of the roller main body 31 and the shaft 32 is the rotation axis R1. It is a rotating body that rotates.
  • the pair of electrode rollers 30 are arranged coaxially with the roller main body 31 side facing each other, and are provided so as to rotate in the same direction in synchronization with each other (coaxial rotation).
  • the left-right direction is the rotation axis direction of the pair of electrode rollers 30 .
  • the four side portions of the rectangular flange portion 23 are the first side portion 23c, the second side portion 23d, the third side portion 23e and the fourth side portion 23f in order in the circumferential direction (Fig. 5), first, the first side portion 23 c and the third side portion 23 e facing each other are welded to the peripheral wall portion 10 by the pair of electrode rollers 30 .
  • one electrode roller 30 welds the first side portion 23c, and the other electrode roller 30 welds the third side portion 23e.
  • the direction of the rotation axis of the pair of electrode rollers 30 is rotated relative to the package side by 90° in plan view, and the remaining pair of side portions of the flange portion 23 facing each other, that is, the second side portion 23d and the fourth side portion 23d, are rotated.
  • Welding is performed on the side portion 23f with the moving direction of the pair of electrode rollers 30 being the Y direction (second direction).
  • the Y direction is a direction perpendicular to the X direction in plan view.
  • the imaging apparatus 1 as shown in FIG. 1 is obtained.
  • the configuration of the lid body 7 joined to the package main body 6 can be simplified, and the manufacturing process can be simplified and the cost can be reduced. In addition, it is possible to reduce the influence of the thermal stress that accompanies the bonding of the lid 7 to the package main body 6 .
  • the constituent members of the lid 7 are two members, the glass 4 and the frame member 5 , and the glass 4 is joined to the frame member 5 by a predetermined glass joint 28 .
  • the number of constituent members of the lid body 7 can be reduced, the construction of the lid body 7 can be simplified, and only one type of joining material is required for joining the constituent members of the lid body 7 together. becomes possible.
  • the manufacturing process of the lid body 7 including the bonding process of the members can be simplified, and the material cost can be reduced.
  • the welded portion of the frame member 5 to the peripheral wall portion 10 serving as a heat source (hereinafter referred to as the “lid welded portion”) is extended to the joint portion of the glass 4 to the frame member 5 (hereinafter referred to as the “glass jointed portion”). ) can be lengthened.
  • the lid welded portion is the outer edge of the flange portion 23
  • the glass bonded portion is the opening edge of the support surface portion 21 on the opening 24 side. Therefore, in the frame member 5, the widthwise inner portion of the flange portion 23, the side surface portion 22, and the widthwise outer portion of the support surface portion 21 are interposed between the cover welded portion and the glass welded portion. are doing. Moreover, these surface portions are bent to form a crank shape when viewed in cross section from the side.
  • the heat transfer path from the lid welding portion to the glass bonding portion in the frame member 5 can be easily secured.
  • the thermal stress acting on the portion supporting the glass 4 in the frame member 5, particularly the glass joint portion can be reduced. . Therefore, breakage such as cracking of the glass 4 due to residual stress in the frame member 5 can be suppressed.
  • the outer edge side portion of the flange portion 23 is welded to the peripheral wall portion 10 as in the present embodiment, it is possible to increase the distance from the cover welded portion to the glass joint portion. can effectively reduce the effect of thermal stress on
  • the upper surface 10d of the peripheral wall portion 10 can be set as an optical reference. This makes it possible to prevent the optical reference used for setting the height position of the image sensor 2 in the imaging device 1 from being affected by the parallelism of the glass 4 or the like. Therefore, without considering the parallelism between the glass 4 and the image sensor 2, it is possible to easily and accurately perform optical settings and adjustments in the imaging device 1.
  • FIG. The imaging device 1 is positioned in the external device such that the surface 2a of the image sensor 2 is perpendicular to the optical axis.
  • the frame member 5 has a concave portion 25 protruding toward the image sensor 2 side, and the glass 4 is provided in the concave portion 25 .
  • the glass 4 can be arranged close to the image sensor 2 due to the depth of the concave portion 25 with respect to the lid welding portion.
  • the incident angle is the angle of inclination of the incident light with respect to the image sensor 2 and the angle of inclination with respect to a line perpendicular to the light receiving surface of the image sensor 2 .
  • the frame member 5 constituting the lid 7 is formed in a concave shape by the supporting surface portion 21 and the side surface portion 22 so as to form a concave portion 25 , and supports the glass 4 so that the entire glass 4 is contained within the concave portion 25 . are doing. According to such a configuration, the glass 4 can be protected by the frame member 5, and the upper surface 23a of the flange portion 23 of the frame member 5 or the upper surface 10d of the peripheral wall portion 10 serving as the lid weld portion can be used as an optical reference. can be set to
  • the peripheral wall portion 10 is composed of a seal frame 12 that is separate from the housing body portion 11 to which the image sensor 2 is connected.
  • the peripheral wall portion 10 can be configured and made of a suitable material as a portion to be welded to the frame member 5, so that good bondability can be obtained at the joint portion between the frame member 5 and the peripheral wall portion 10. .
  • the members constituting the housing main body portion 11 and the peripheral wall portion 10 can be manufactured separately. This makes it possible to easily manufacture the housing 3 .
  • the frame member 5 has a structure in which the surface of the frame member main body 26 made of a metal material such as Kovar is covered with a metal film portion 27 that is a plated layer of gold or the like. According to such a configuration, it is possible to obtain good weldability in welding the frame member 5 to the peripheral wall portion 10 by seam welding or the like.
  • the image sensor 2 is provided in a state of being supported by the Peltier element 18 with respect to the housing 3 . According to such a configuration, the image sensor 2 can be cooled by the Peltier element 18 while preventing dew condensation in the cavity 8 due to the temperature difference caused by the Peltier element 18 due to the airtight sealing structure of the package. Therefore, a good operating state of the imaging device 1 can be ensured.
  • a first modified example is a modified example of the configuration of the package body portion 6 . As shown in FIG. 9 , in the first modification, the package main body 6 does not include the Peltier element 18 and the image sensor 2 is directly supported by the housing main body 11 .
  • the housing main body 11 has a relatively shallow concave portion 33 formed on the surface 11a side as a portion for arranging the image sensor 2 .
  • the concave portion 33 is formed in the central portion of the housing main body portion 11 on the surface 11a side.
  • the concave portion 33 has a rectangular opening shape corresponding to the outer shape of the image sensor 2 and is formed in a range that occupies most of the surface 11a side of the housing main body portion 11 .
  • the concave portion 33 is a rectangular hole in a plan view and is formed by a surface portion including four side surface portions 33a formed perpendicular to the plate surface of the housing main body portion 11 and a horizontal bottom surface portion 33b. be.
  • the recessed portion 33 has an opening dimension larger than the external dimension of the image sensor 2 and is formed so that the entire image sensor 2 can be accommodated within the recessed portion 33 in plan view.
  • a portion of the surface 11a of the housing main body 11 that is inside the peripheral wall 10 and outside the recess 33 serves as an inner lead step on which lead electrodes and the like for receiving connection of bonding wires are formed.
  • the image sensor 2 is provided on the bottom surface portion 33b of the recessed portion 33.
  • the image sensor 2 is fixed on the housing main body 11 by bonding with a thermally conductive adhesive or the like using the rear surface 2b as a bonding surface to the bottom surface portion 33b.
  • the image sensor 2 has four side portions 2c facing the four side portions 33a of the recess 33, respectively, and a gap exists between the image sensor 2 and the opening end of the recess 33. As shown in FIG.
  • the support surface to which the image sensor 2 is fixed may be formed as part of the housing main body 11.
  • the configuration of the imaging device 1 can be simplified.
  • the configuration of this modification may be a configuration in which the image sensor 2 is mounted on the flat surface 11a without forming the concave portion 33 on the surface 11a side of the housing body portion 11 .
  • a second modification is a modification of the method for manufacturing the imaging device 1 .
  • the method of the second modification is a method of joining the frame member 5 alone to the package main body 6 side before joining the glass 4 to the frame member 5 .
  • the frame member 5 is first attached to the package main body 6. A joining step is performed.
  • a step of bonding the glass 4 to the support surface portion 21 of the frame member 5 with the low-melting-point glass serving as the glass bonding portion 28 so as to close the opening 24 is performed (see arrow A1). ).
  • a method of first bonding only the frame member 5 to the package body 6 and then bonding the glass 4 to the frame member 5 may be used without manufacturing the lid 7 in advance.
  • the package can be hermetically sealed without generating residual stress itself due to welding in the frame member 5 .
  • the glass 4 is not joined.
  • the glass 4 is joined to the frame member 5 in a stress-free state with respect to the thermal stress that accompanies the welding of the frame member 5 . Therefore, the generation of residual stress in the frame member 5 can be suppressed or prevented, and the influence of thermal stress on the glass joint can be effectively reduced.
  • the support frame 50 is a substantially plate-like member having a rectangular outer shape in plan view, and includes a horizontal plate-like body plate portion 51 and an outer edge of the body plate portion 51. and an outer edge support portion 52 that is a portion that is formed along and protrudes downward.
  • the support frame body 50 has a substantially “L”-shaped cross-sectional shape at each side portion forming a frame shape by the main body plate portion 51 and the outer edge support portion 52 .
  • the support frame 50 has external dimensions to fit inside the peripheral wall portion 10 . Note that FIG. 12 shows a part of the support frame 50 cut away for the sake of convenience.
  • the support frame 50 has the upper surface of the main body plate portion 51 as an upper surface 51a that is a horizontal plane. Further, the support frame 50 has a lower surface 52a formed as a plane positioned on a predetermined imaginary plane perpendicular to the vertical direction as the surface on the lower side of the outer edge support portion 52. As shown in FIG. Further, the support frame 50 has four side surfaces 50a formed perpendicular to the upper surface 51a and the lower surface 52a.
  • the support frame 50 is provided in a fixed state by being joined to the housing main body 11 with a predetermined joint material such as brazing material or adhesive, with the lower surface 52a serving as a joint surface for the surface 11a of the housing main body 11. there is
  • the support frame 50 is fitted into the peripheral wall portion 10 by matching the outer dimensions to the opening size of the peripheral wall portion 10, and the four side surfaces 50a are in contact with the inner wall surface 10b of the peripheral wall portion 10. , and may be provided without being joined to the housing main body 11 .
  • the support frame 50 extends the body plate portion 51 from the outer edge support portion 52 toward the center of the imaging device 1 , and the peripheral area 17 of the image sensor 2 is held upward by the portion of the body plate portion 51 on the side of the opening 53 . covered from Between the body plate portion 51 and the surface 2 a of the image sensor 2 , there is a gap corresponding to the protrusion height of the outer edge support portion 52 from the bottom surface 51 b of the body plate portion 51 .
  • the support frame 50 has the upper surface 51a as a joint surface or a contact surface with respect to the lower surface 21b of the support surface portion 21, and the support surface portion 21 of the frame member 5 is placed on the main body plate portion 51. It supports the member 5.
  • the body plate portion 51 may be provided in a state of being joined to the support surface portion 21 with a joining material such as a brazing material or an adhesive, or may be provided in a state of surface contact without a joining material.
  • the support frame 50 is provided to the housing 3 in the manufacturing process of the imaging device 41, before the process of welding the frame member 5 to the peripheral wall portion 10.
  • the step of providing the support frame 50 to the housing main body 11 may be a step preceding the step of providing the peripheral wall 10 by joining the seal frame 12 to the housing main body 11. It may be a later step.
  • the concave portion 25 of the frame member 5 is grounded on the support frame 50 .
  • the following effects can be obtained in addition to the effects obtained by the imaging device 1 of the first embodiment. That is, by interposing the support frame 50 between the housing main body 11 and the frame member 5 inside the peripheral wall portion 10, the recessed portion 25 of the frame member 5 including the support surface portion 21 that supports the glass 4 is formed. , can be supported by the support frame 50 with respect to the housing main body 11 . As a result, the frame member 5, to which the flange portion 23 is fixed at the lid welded portion, can be supported from below and fixed, thereby suppressing elastic deformation of the frame member 5, which is relatively prone to elastic deformation.
  • the glass 4 can be stably supported, and the parallelism between the glass 4 supported by the frame member 5 and the surface 2a, which is the sensor surface of the image sensor 2, can be ensured. Moreover, since deformation of the frame member 5 can be suppressed, the influence of thermal stress acting on the glass joint portion during welding of the frame member 5 can be effectively reduced.
  • FIG. 13 and 14 A configuration example of an imaging device 61 according to a third embodiment of the present technology will be described with reference to FIGS. 13 and 14.
  • FIG. This embodiment differs from the second embodiment in the configuration of the support member.
  • an imaging device 61 further includes a support frame 70 as a support member in the configuration according to the first embodiment.
  • the support frame 70 is provided on the side opposite to the glass 4 side with respect to the support surface portion 21 of the frame member 5 and is a member that supports the support surface portion 21 with respect to the housing 3 side.
  • the support frame 70 is provided so as to support the support surface portion 21 of the frame member 5 with respect to the image sensor 2 .
  • the support frame 70 is a frame-shaped member having a rectangular outer shape in a plan view and four linear side portions 71 .
  • Side portion 71 has a rectangular cross-sectional shape.
  • the support frame 70 has external dimensions to fit inside the peripheral wall portion 10 . Note that FIG. 14 shows a part of the support frame 70 cut away for the sake of convenience.
  • the support frame 70 has four side portions 71 forming an opening 73 in the central portion for securing a passage of light received by the image sensor 2 .
  • the opening 73 is a hole vertically penetrating the support frame 70 and has a rectangular opening shape corresponding to the outer shape of the image sensor 2 .
  • the opening 73 has substantially the same opening dimensions as the opening 24 of the frame member 5 , and includes the entire pixel region 16 of the image sensor 2 in its opening area in a plan view, and also includes the peripheral edge of the image sensor 2 as the opening area. is formed so as to be positioned outside the
  • the support frame 70 has an upper surface 70a and a lower surface 70b which are horizontal planes formed as planes positioned on a predetermined imaginary plane perpendicular to the vertical direction.
  • the support frame 70 also has four side surfaces 70c formed perpendicular to the upper surface 70a and the lower surface 70b.
  • the support frame 70 has an outer dimension in plan view that is large enough to position the whole on the peripheral region 17 formed around the pixel region 16 as a frame-shaped region in the image sensor 2 in plan view. That is, on the image sensor 2, the four inner side surfaces 73a forming the opening 73 of the support frame 70 are located outside the pixel region 16, and the four side surfaces 70c are located inside the side surface portion 2c. positioned. Thus, the support frame 70 is positioned outside the pixel region 16 and within the outline of the image sensor 2 in plan view.
  • the material of the support frame 70 is not particularly limited as long as the support frame 70 can obtain a predetermined support strength.
  • the support frame 70 is a solid member with relatively high rigidity made of, for example, ceramics, metal, resin material, or the like.
  • the material of the support frame 70 is preferably a material that is less susceptible to heat, light, and the like, and that is less likely to deteriorate or deform over time.
  • the support frame 70 is fixed to the image sensor 2 with a predetermined bonding material such as brazing material or adhesive, with the lower surface 70b serving as a bonding surface for the portion of the peripheral region 17 on the surface 2a of the image sensor 2. It is
  • the imaging device 61 According to the imaging device 61 according to the present embodiment, the following operational effects can be obtained in addition to the operational effects obtained by the imaging device 1 of the first embodiment. That is, by interposing the support frame body 70 between the image sensor 2 and the frame member 5 inside the peripheral wall portion 10, the recessed portion 25 of the frame member 5 including the support surface portion 21 for supporting the glass 4 is imaged.
  • the sensor 2 can be supported by a support frame 70 . That is, the recessed portion 25 of the frame member 5 can be supported by the housing 3 via the image sensor 2 and the Peltier element 18 .
  • the frame member 5, to which the flange portion 23 is fixed at the lid welded portion can be supported from below and fixed, thereby suppressing elastic deformation of the frame member 5, which is relatively prone to elastic deformation.
  • the glass 4 can be stably supported, and the parallelism between the glass 4 supported by the frame member 5 and the surface 2a, which is the sensor surface of the image sensor 2, can be ensured.
  • deformation of the frame member 5 can be suppressed, the influence of thermal stress acting on the glass joint portion during welding of the frame member 5 can be effectively reduced.
  • the imaging device 61 of the present embodiment since the support frame 70 is interposed between the frame member 5 and the image sensor 2, the support frame 70 is provided in the housing main body 11. no space is required for As a result, the housing 3 can be downsized, and the imaging device 61 can be made compact.
  • the support frame 70 is a frame-shaped member that supports the entire circumference of the frame member 5 in plan view.
  • a support that partially supports the outer shape in the circumferential direction may be used, or a plurality of supports may be provided.
  • the support member according to the present embodiment may be any member as long as it supports the support surface portion 21 of the frame member 5 with respect to the housing main body portion 11 without blocking incident light to the image sensor 2.
  • the shape is not particularly limited.
  • the support frame 70 may have a substantially "L"-shaped cross-sectional shape at each side portion 71, like the support frame 50 according to the second embodiment.
  • the side surface portion 22 of the frame member 5 is formed to have a zigzag shape when viewed in longitudinal section. That is, the four side surface portions 22 forming the concave portion 25 of the frame member 5 are processed and formed to have a bellows shape as a whole.
  • the following effects can be obtained in addition to the effects obtained by the imaging device 1 of the first embodiment. That is, by forming the side portion 22 in a zigzag shape, compared to the configuration in which the side portion 22 is a vertical flat surface portion as in the first embodiment, the heat transfer path from the lid welding portion to the glass bonding portion is reduced. can be lengthened. As a result, it is possible to make it difficult for heat generated by welding to be conducted to the glass joints, and to effectively reduce the influence of thermal stress on the glass joints.
  • a camera device 200 as an electronic device includes an optical unit 202, an imaging device 201, a DSP (Digital Signal Processor) circuit 203 as a camera signal processing circuit, a frame memory 204, and a display unit 205. , a recording unit 206 , an operation unit 207 , and a power supply unit 208 .
  • the DSP circuit 203, frame memory 204, display unit 205, recording unit 206, operation unit 207, and power supply unit 208 are appropriately connected via a connection line 209 such as a bus line.
  • the imaging device 201 is, for example, the imaging device 1 according to the first embodiment described above.
  • a semiconductor element (10) a semiconductor element; a housing having a peripheral wall surrounding the semiconductor element and electrically connected to the semiconductor element; a transparent member provided to face the semiconductor element; a flange portion joined to the upper surface of the peripheral wall portion; and a supporting surface portion positioned closer to the semiconductor element than the flange portion and supporting the transparent member, and supporting the semiconductor element together with the casing and the transparent member.
  • An electronic device having a semiconductor device comprising: a frame member having an airtight space around it.
  • (11) preparing a housing having a peripheral wall surrounding a semiconductor element and electrically connected to the semiconductor element; a step of providing the semiconductor element inside the peripheral wall portion of the housing in a state of being electrically connected to the housing; a step of preparing a frame member that is configured in a frame shape as a whole, has a flange portion on the peripheral edge portion, forms a recess for the flange portion, and has an opening on the bottom surface of the recess; a step of attaching the frame member to the housing by welding the flange portion to the upper surface of the peripheral wall portion; and providing a transparent member on the bottom surface of the frame member so as to block the opening.
  • Imaging device 2 Image sensor (semiconductor element) 3 housing 4 glass (transparent member) 5 frame member 8 cavity 10 peripheral wall portion 10d upper surface 11 housing body portion 12 seal frame (frame-shaped member) 13 recess 16 pixel region 17 peripheral region 18 Peltier element (cooling element) 21 support surface portion 22 side surface portion 23 flange portion 24 opening portion 25 concave portion 26 frame member main body 27 metal film portion 41 imaging device (semiconductor device) 50 support frame (support member) 61 imaging device (semiconductor device) 70 support frame (support member) 81 imaging device (semiconductor device) 200 camera device (electronic device) 201 imaging device (semiconductor device)

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Abstract

This semiconductor device simplifies the configuration of a lid body bonded to a package body to simplify and reduce the cost of the manufacturing process, and also reduces the influence of thermal stress associated with the bonding of the lid body to the package body. The semiconductor device comprises: a semiconductor element; a housing that has a peripheral wall part surrounding the periphery of the semiconductor element and is electrically connected to the semiconductor element; a transparent member that is provided so as to face the semiconductor element; and a frame member that has a flange part bonded to the peripheral wall part, and a support surface part positioned further to the semiconductor element side than the flange part and supporting the transparent member, the frame member creating an airtight space in the periphery of the semiconductor element together with the housing and the transparent member.

Description

半導体装置、電子機器および半導体装置の製造方法Semiconductor device, electronic device, and method for manufacturing semiconductor device
 本開示は、半導体装置、電子機器および半導体装置の製造方法に関する。 The present disclosure relates to semiconductor devices, electronic devices, and methods of manufacturing semiconductor devices.
 従来、CMOSイメージセンサ等の撮像素子や半導体レーザ等の発光素子といった半導体素子を備えた半導体装置のパッケージ構造として、次のような構成のものがある。すなわち、半導体素子を実装したパッケージ本体をなす筐体に対して、ガラス等の透明部材を枠状の部材に支持した蓋体を接合し、半導体素子の配置空間を気密封止した構成である(例えば、特許文献1参照。)。 Conventionally, the package structure of a semiconductor device equipped with a semiconductor element such as an imaging element such as a CMOS image sensor or a light emitting element such as a semiconductor laser has the following configuration. That is, it is a configuration in which a lid body in which a transparent member such as glass is supported by a frame-shaped member is joined to a housing that forms a package main body in which a semiconductor element is mounted, and the arrangement space of the semiconductor element is hermetically sealed ( For example, see Patent Document 1.).
 特許文献1には、パッケージ構造の蓋体の構成として、金属板からなる枠部材と、セラミックス等からなる枠体と、ガラス材料からなる透光性部材とを備えた構成が開示されている。このような構成において、装置の小型化および気密信頼性の向上を目的として、枠部材の外縁部を枠体から突出させるとともに、枠体の内周側に形成された段差部に対して透光性部材を接合させた構成がとられている。枠部材および透光性部材は、枠体を上下から挟む態様で、それぞれ枠体に対して接合材により接合されている。 Patent Literature 1 discloses a configuration including a frame member made of a metal plate, a frame member made of ceramics or the like, and a translucent member made of a glass material, as a configuration of the lid of the package structure. In such a configuration, in order to reduce the size of the device and improve the airtightness reliability, the outer edge of the frame member is projected from the frame, and the stepped portion formed on the inner peripheral side of the frame is translucent. It has a structure in which elastic members are joined together. The frame member and the translucent member are bonded to the frame by a bonding material so as to sandwich the frame from above and below.
特開2019-145762号公報JP 2019-145762 A
 特許文献1に開示された構成によれば、次のような問題がある。枠部材と枠体の接合と、枠体と透光性部材の接合とは、互いに異なるタイミングで行われる。このため、後の接合の際に先の接合に用いた接合材が溶融してしまうことがないように、両接合では、互いに融点が異なる接合材が用いられる。したがって、蓋体の製造プロセスが長期化し、材料費が嵩むという問題がある。 According to the configuration disclosed in Patent Document 1, there are the following problems. The joining of the frame member and the frame and the joining of the frame and the translucent member are performed at different timings. For this reason, bonding materials having different melting points are used in both bonding so that the bonding material used for the previous bonding does not melt during the subsequent bonding. Therefore, there is a problem that the manufacturing process of the lid is lengthened and the material cost is increased.
 また、特許文献1に開示された蓋体においては、枠体の外縁からフランジ状に突出した枠部材の外縁部が、パッケージ本体に対する接合部となる。この枠部材の外縁部は、パッケージ本体において半導体素子を囲む周壁状の部分の上面に対して、シーム溶接等の溶接によって接合される。このような接合構成においては、枠体に対する透光性部材の接合部分に対して、シーム溶接等の溶接により生じる熱応力による影響を低減させるべく、例えば、枠体に対する枠部材の接合部分を、枠体に対する透光性部材の接合部分よりも外側に位置させる必要がある。このため、蓋体の製造プロセスにおける工程管理が複雑化するという問題がある。 In addition, in the lid disclosed in Patent Document 1, the outer edge of the frame member projecting in a flange shape from the outer edge of the frame serves as the joint to the package body. The outer edge of the frame member is joined to the upper surface of the peripheral wall-like portion surrounding the semiconductor element in the package body by welding such as seam welding. In such a joint structure, in order to reduce the influence of thermal stress generated by welding such as seam welding on the joint portion of the translucent member to the frame, for example, the joint portion of the frame member to the frame is It needs to be positioned outside the joint portion of the translucent member with respect to the frame. Therefore, there is a problem that the process control in the manufacturing process of the lid becomes complicated.
 本技術は、パッケージ本体部に接合される蓋体の構成を簡単にすることができ、製造プロセスの簡便化およびコストの低減を図ることができるとともに、パッケージ本体部に対する蓋体の接合にともなう熱応力による影響を低減することができる半導体装置、電子機器および半導体装置の製造方法を提供することを目的とする。 The present technology can simplify the configuration of the lid bonded to the package body, simplify the manufacturing process, and reduce costs. An object of the present invention is to provide a semiconductor device, an electronic device, and a method of manufacturing a semiconductor device that can reduce the influence of stress.
 本技術に係る半導体装置は、半導体素子と、前記半導体素子の周囲を囲む周壁部を有し、前記半導体素子と電気的に接続された筐体と、前記半導体素子に対向するように設けられた透明部材と、前記周壁部に接合されるフランジ部、および前記フランジ部よりも前記半導体素子側に位置し、前記透明部材を支持する支持面部を有し、前記筐体および前記透明部材とともに前記半導体素子の周囲を気密空間とする枠部材と、を備えたものである。 A semiconductor device according to an embodiment of the present technology includes: a semiconductor element; a housing having a peripheral wall portion surrounding the semiconductor element; a transparent member, a flange portion joined to the peripheral wall portion, and a supporting surface portion located closer to the semiconductor element than the flange portion and supporting the transparent member, and a frame member forming an airtight space around the element.
 本技術に係る半導体装置の他の態様は、前記半導体装置において、前記枠部材の前記フランジ部は、前記周壁部に対して溶接により接合されているものである。 According to another aspect of the semiconductor device according to the present technology, in the semiconductor device, the flange portion of the frame member is welded to the peripheral wall portion.
 本技術に係る半導体装置の他の態様は、前記半導体装置において、前記枠部材は、前記フランジ部と前記支持面部とをつなぐ側面部を有し、前記支持面部および前記側面部により、前記フランジ部に対する凹部をなしており、前記透明部材は、全体を前記凹部内に位置させているものである。 In another aspect of the semiconductor device according to the present technology, in the semiconductor device, the frame member has a side surface portion that connects the flange portion and the support surface portion, and the support surface portion and the side surface portion connect the flange portion with the side surface portion. and the transparent member is positioned entirely within the recess.
 本技術に係る半導体装置の他の態様は、前記半導体装置において、前記筐体は、前記半導体素子の接続を受ける筐体本体部を有し、前記周壁部は、前記筐体本体部に対して設けられた枠状の部材により構成されているものである。 In another aspect of the semiconductor device according to the present technology, in the semiconductor device, the housing has a housing main body portion to which the semiconductor element is connected, and the peripheral wall portion is provided with respect to the housing main body portion. It is configured by a provided frame-shaped member.
 本技術に係る半導体装置の他の態様は、前記半導体装置において、前記枠部材の前記支持面部に対して前記透明部材側と反対側に設けられ、前記支持面部を前記筐体側に対して支持する支持部材をさらに備えたものである。 In another aspect of the semiconductor device according to the present technology, in the semiconductor device, the supporting surface portion of the frame member is provided on a side opposite to the transparent member side, and supports the supporting surface portion with respect to the housing side. It further comprises a support member.
 本技術に係る半導体装置の他の態様は、前記半導体装置において、前記支持部材は、前記半導体素子に対して前記支持面部を支持するように設けられているものである。 According to another aspect of the semiconductor device according to the present technology, in the semiconductor device, the support member is provided so as to support the support surface portion with respect to the semiconductor element.
 本技術に係る半導体装置の他の態様は、前記半導体装置において、前記枠部材は、鉄、ニッケル、およびコバルトを含む合金からなる枠部材本体と、前記枠部材本体の表面のうち、少なくとも前記周壁部に対する接合面を被覆するように形成された金属膜部と、を有するものである。 Another aspect of the semiconductor device according to the present technology is the semiconductor device, wherein the frame member includes a frame member main body made of an alloy containing iron, nickel, and cobalt, and at least the peripheral wall of the surface of the frame member main body. and a metal film portion formed to cover a joint surface for the portion.
 本技術に係る半導体装置の他の態様は、前記半導体装置において、前記枠部材の前記側面部は、縦断面視でジグザグ状をなすように形成されているものである。 According to another aspect of the semiconductor device according to the present technology, in the semiconductor device, the side portion of the frame member is formed to have a zigzag shape when viewed in vertical cross section.
 本技術に係る半導体装置の他の態様は、前記半導体装置において、前記半導体素子は、前記筐体に対して、冷却素子に支持された状態で設けられているものである。 According to another aspect of the semiconductor device according to the present technology, in the semiconductor device, the semiconductor element is provided in a state of being supported by a cooling element with respect to the housing.
 本技術に係る電子機器は、半導体素子と、前記半導体素子の周囲を囲む周壁部を有し、前記半導体素子と電気的に接続された筐体と、前記半導体素子に対向するように設けられた透明部材と、前記周壁部に接合されるフランジ部、および前記フランジ部よりも前記半導体素子側に位置し、前記透明部材を支持する支持面部を有し、前記筐体および前記透明部材とともに前記半導体素子の周囲を気密空間とする枠部材と、を備えた半導体装置を有するものである。 An electronic device according to an embodiment of the present technology includes: a semiconductor element; a transparent member, a flange portion joined to the peripheral wall portion, and a supporting surface portion located closer to the semiconductor element than the flange portion and supporting the transparent member, and a frame member forming an airtight space around the element.
 本技術に係る半導体装置の製造方法は、半導体素子の周囲を囲む周壁部を有し、前記半導体素子と電気的に接続される筐体を準備する工程と、前記筐体の前記周壁部の内側に、前記半導体素子を前記筐体に対して電気的に接続した状態で設ける工程と、全体として枠状に構成され、周縁部にフランジ部を有し、前記フランジ部に対する凹部をなすとともに、前記凹部の底面部に開口部を有する枠部材を準備する工程と、前記枠部材を、前記周壁部に対して前記フランジ部を溶接により接合することで前記筐体に取り付ける工程と、前記枠部材の前記底面部上に、前記開口部を塞ぐように透明部材を設ける工程と、を含むものである。 A method for manufacturing a semiconductor device according to an embodiment of the present technology includes steps of preparing a housing having a peripheral wall portion surrounding a semiconductor element and electrically connected to the semiconductor element; a step of providing the semiconductor element in a state of being electrically connected to the housing; a step of forming a frame shape as a whole, having a flange portion on a peripheral edge portion, forming a concave portion corresponding to the flange portion; preparing a frame member having an opening in the bottom surface of the recess; attaching the frame member to the housing by welding the flange portion to the peripheral wall portion; providing a transparent member on the bottom surface so as to cover the opening.
本技術の第1実施形態に係る撮像装置の構成を示す側面断面図である。It is a side sectional view showing the composition of the imaging device concerning a 1st embodiment of this art. 本技術の第1実施形態に係る筐体の構成を示す斜視図である。It is a perspective view showing composition of a case concerning a 1st embodiment of this art. 本技術の第1実施形態に係る蓋体の構成を示す斜視図である。It is a perspective view showing composition of a lid concerning a 1st embodiment of this art. 本技術の第1実施形態に係る蓋体の構成を示す側面断面図である。It is a side sectional view showing composition of a lid concerning a 1st embodiment of this art. 本技術の第1実施形態に係る蓋体の構成を示す分解斜視図である。It is an exploded perspective view showing composition of a lid concerning a 1st embodiment of this art. 本技術の第1実施形態に係る枠部材の構成を示す一部側面断面図である。It is a partial side sectional view showing composition of a frame member concerning a 1st embodiment of this art. 本技術の第1実施形態に係る撮像装置の製造方法についての説明図である。It is an explanatory view about a manufacturing method of an imaging device concerning a 1st embodiment of this art. 本技術の第1実施形態に係る撮像装置の製造方法についての説明図である。It is an explanatory view about a manufacturing method of an imaging device concerning a 1st embodiment of this art. 本技術の第1実施形態に係る撮像装置の変形例の構成を示す側面断面図である。It is a side sectional view showing the composition of the modification of the imaging device concerning a 1st embodiment of this art. 本技術の第1実施形態に係る撮像装置の製造方法の変形例についての説明図である。It is explanatory drawing about the modification of the manufacturing method of the imaging device which concerns on 1st Embodiment of this technique. 本技術の第2実施形態に係る撮像装置の構成を示す側面断面図である。It is a side sectional view showing composition of an imaging device concerning a 2nd embodiment of this art. 本技術の第2実施形態に係る支持枠体を示す斜視図である。It is a perspective view showing a support frame body concerning a 2nd embodiment of this art. 本技術の第3実施形態に係る撮像装置の構成を示す側面断面図である。It is a side sectional view showing composition of an imaging device concerning a 3rd embodiment of this art. 本技術の第3実施形態に係る支持枠体を示す斜視図である。It is a perspective view showing a support frame body concerning a 3rd embodiment of this art. 本技術の第4実施形態に係る撮像装置の構成を示す側面断面図である。It is a side sectional view showing composition of an imaging device concerning a 4th embodiment of this art. 本技術の実施形態に係る撮像装置を備えた電子機器の構成例を示すブロック図である。1 is a block diagram showing a configuration example of an electronic device including an imaging device according to an embodiment of the present technology; FIG.
 本技術は、半導体装置のパッケージ構造において、パッケージの本体部に接合される蓋体の構成等を工夫することにより、装置構成の簡略化、製造プロセスの簡便化、およびコストの低減を図るとともに、パッケージの本体部に対する蓋体の接合にともなう熱応力による影響の低減を図ろうとするものである。 In the package structure of a semiconductor device, the present technology simplifies the structure of the device, simplifies the manufacturing process, and reduces the cost by devising the structure of the lid bonded to the main body of the package. An object of the present invention is to reduce the influence of thermal stress associated with joining a lid to a package body.
 以下、図面を参照して、本技術を実施するための形態(以下「実施形態」と称する。)を説明する。以下に説明する実施形態では、半導体装置として、半導体素子の一例である固体撮像素子を含む撮像装置(固体撮像装置)を例にとって説明する。なお、実施形態の説明は以下の順序で行う。
 1.第1実施形態に係る撮像装置の構成例
 2.第1実施形態に係る撮像装置の製造方法
 3.第1実施形態に係る変形例
 4.第2実施形態に係る撮像装置の構成例
 5.第3実施形態に係る撮像装置の構成例
 6.第4実施形態に係る撮像装置の構成例
 7.電子機器の構成例
EMBODIMENT OF THE INVENTION Hereinafter, with reference to drawings, the form (henceforth "embodiment" is called.) for implementing this technique is demonstrated. In the embodiments described below, an imaging device (solid-state imaging device) including a solid-state imaging element, which is an example of a semiconductor element, will be described as an example of a semiconductor device. In addition, description of embodiment is performed in the following order.
1. Configuration example of imaging device according to first embodiment2. 2. Manufacturing method of imaging device according to first embodiment; Modified example according to the first embodiment 4. Configuration example of imaging device according to second embodiment5. Configuration example of imaging device according to third embodiment6. Configuration example of imaging device according to fourth embodiment7. Configuration example of electronic equipment
 <1.第1実施形態に係る撮像装置の構成例>
 本技術の第1実施形態に係る撮像装置の構成例について、図1から図6を参照して説明する。なお、便宜上、図1における上下方向を撮像装置1における上下方向とする。
<1. Configuration Example of Imaging Apparatus According to First Embodiment>
A configuration example of an imaging device according to a first embodiment of the present technology will be described with reference to FIGS. 1 to 6. FIG. For the sake of convenience, the up-down direction in FIG.
 図1に示すように、撮像装置1は、固体撮像素子としてのイメージセンサ2と、筐体3と、ガラス4と、枠部材5とを備える。撮像装置1は、筐体3にイメージセンサ2を実装した構成をパッケージ本体部6とするとともに、枠部材5にガラス4を取り付けた構成を蓋体7として、パッケージ本体部6に蓋体7を接合させることで、気密空間としてのキャビティ8を形成し、イメージセンサ2を気密封止した一体的なパッケージ構造を有する。図1における左右方向を撮像装置1の左右方向とした場合、撮像装置1は、左右方向および平面視で左右方向に直交する方向の各方向について、対称または略対称に構成されている。 As shown in FIG. 1, the imaging device 1 includes an image sensor 2 as a solid-state imaging device, a housing 3, glass 4, and a frame member 5. The imaging device 1 includes a package main body 6 having a configuration in which the image sensor 2 is mounted on the housing 3, and a lid 7 having a configuration in which the glass 4 is attached to the frame member 5. The lid 7 is attached to the package main body 6. By bonding, a cavity 8 as an airtight space is formed, and an integral package structure in which the image sensor 2 is airtightly sealed is provided. Assuming that the left-right direction in FIG. 1 is the left-right direction of the imaging device 1, the imaging device 1 is configured symmetrically or substantially symmetrically with respect to each of the left-right direction and the direction orthogonal to the left-right direction in plan view.
 パッケージ本体部6について説明する。パッケージ本体部6は、筐体3とイメージセンサ2とを有する。 The package main body 6 will be explained. The package main body 6 has a housing 3 and an image sensor 2 .
 筐体3は、イメージセンサ2の周囲を囲む周壁部10を有し、イメージセンサ2と電気的に接続されている。筐体3は、イメージセンサ2の接続を受ける筐体本体部11を有し、周壁部10は、筐体本体部11に対して設けられた枠状の部材であるシール枠体12により構成されている。すなわち、筐体3においては、筐体本体部11とは別体のシール枠体12により周壁部10が構成されており、筐体3は、筐体本体部11にシール枠体12を固定することで周壁部10を設けた一体の部材として構成されている。 The housing 3 has a peripheral wall portion 10 surrounding the image sensor 2 and is electrically connected to the image sensor 2 . The housing 3 has a housing body portion 11 to which the image sensor 2 is connected, and the peripheral wall portion 10 is composed of a seal frame 12 which is a frame-shaped member provided for the housing body portion 11. ing. That is, in the housing 3 , the peripheral wall portion 10 is configured by the seal frame 12 which is separate from the housing main body 11 , and the housing 3 fixes the seal frame 12 to the housing main body 11 . Thus, it is configured as an integral member provided with the peripheral wall portion 10 .
 筐体本体部11は、例えば、アルミナ(Al)や窒化アルミニウム(AlN)窒化ケイ素(Si)等のセラミックスを材料として形成されたセラミックパッケージである。筐体本体部11は、平面視で矩形状をなす厚板状の外形を有する。 The housing body 11 is a ceramic package made of ceramic such as alumina (Al 2 O 3 ), aluminum nitride (AlN), silicon nitride (Si 3 N 4 ), or the like. The housing main body 11 has a thick plate-like outer shape that is rectangular in plan view.
 筐体本体部11は、一方の板面として、上面である表面11aを有するとともに、他方の板面として、表面11aの反対側の板面であって下面である裏面11bを有する。表面11aおよび裏面11bは、いずれも水平状の面である。裏面11bが、筐体3の下面(裏面)となる。また、筐体本体部11は、四方の側面11cを有する。筐体本体部11には、配線層や電極や所定の回路等が設けられている。 The housing main body 11 has a top surface 11a as one plate surface and a back surface 11b as a bottom surface opposite to the surface 11a as the other plate surface. Both the front surface 11a and the back surface 11b are horizontal surfaces. The rear surface 11 b is the lower surface (back surface) of the housing 3 . Further, the housing main body 11 has four side surfaces 11c. Wiring layers, electrodes, predetermined circuits, and the like are provided in the housing main body 11 .
 筐体本体部11は、イメージセンサ2を配置するための部分として、表面11a側に開口した凹部13を有する。凹部13は、筐体本体部11の表面11a側の中央部に形成されている。凹部13は、イメージセンサ2の外形に対応して矩形状の開口形状を有し、筐体本体部11の表面11a側の大部分を占める範囲に形成されている。 The housing main body 11 has a concave portion 13 that opens toward the surface 11a as a portion for arranging the image sensor 2 . The concave portion 13 is formed in the central portion of the housing main body portion 11 on the side of the surface 11a. The concave portion 13 has a rectangular opening shape corresponding to the outer shape of the image sensor 2 and is formed in a range that occupies most of the surface 11a side of the housing main body portion 11 .
 凹部13は、筐体本体部11の板面に対して垂直状に形成された四方の側面部13aと、水平状の底面部13bとを含む面部により形成された平面視矩形状の穴部である。筐体本体部11において、凹部13の形成部位は、凹部13の非形成部位である周縁部に対して凹部13の深さ分、板厚が薄い底板部11dとなっている。凹部13は、イメージセンサ2の外形寸法より大きい開口寸法を有し、平面視でイメージセンサ2の全体が凹部13内に納まるように形成されている。 The concave portion 13 is a rectangular hole in a plan view and is formed by a surface portion including four side surface portions 13a formed perpendicular to the plate surface of the housing main body portion 11 and a horizontal bottom surface portion 13b. be. In the housing main body 11, the portion where the recess 13 is formed is a bottom plate portion 11d that is thinner than the peripheral portion where the recess 13 is not formed by the depth of the recess 13. As shown in FIG. The recessed portion 13 has an opening dimension larger than the external dimension of the image sensor 2 and is formed so that the entire image sensor 2 can be accommodated within the recessed portion 13 in plan view.
 なお、筐体本体部11の材料は限定されるものではなく、他の材料により形成されたものであってもよい。筐体本体部11は、例えば、繊維強化プラスチックの一種であるガラスエポキシ樹脂等の有機材料により形成された有機パッケージ等であってもよい。 The material of the housing main body 11 is not limited, and may be made of other materials. The housing main body 11 may be, for example, an organic package or the like made of an organic material such as glass epoxy resin, which is a type of fiber-reinforced plastic.
 周壁部10は、筐体本体部11の矩形状の平面視形状に対応して平面視で矩形状をなすように四方の壁部10aを有し、これらの壁部10aにより枠状に形成されている。壁部10aは、側面断面視で上下方向を長手方向とする矩形状の外形に沿う部分である。壁部10aは、内側となるイメージセンサ2側の壁面である内壁面10bと、その反対側である外側の壁面である外壁面10cとを有する。 The peripheral wall portion 10 has four wall portions 10a so as to form a rectangular shape in plan view corresponding to the rectangular shape in plan view of the housing main body portion 11, and these wall portions 10a form a frame shape. ing. The wall portion 10a is a portion that follows a rectangular outer shape whose longitudinal direction is the vertical direction in a side cross-sectional view. The wall portion 10a has an inner wall surface 10b, which is a wall surface on the image sensor 2 side, and an outer wall surface 10c, which is an outer wall surface on the opposite side.
 周壁部10は、各壁部10aの外壁面10cを、筐体本体部11の側面11cよりもわずかに内側に位置させている。ただし、周壁部10は、各壁部10aの外壁面10cを、筐体本体部11の側面11cと面一状とするように設けられてもよい。 The peripheral wall portion 10 positions the outer wall surface 10c of each wall portion 10a slightly inside the side surface 11c of the housing main body portion 11 . However, the peripheral wall portion 10 may be provided so that the outer wall surface 10c of each wall portion 10a is flush with the side surface 11c of the housing main body portion 11 .
 周壁部10は、平面視で矩形枠状をなす上面10dを有する。上面10dは、上下方向に対して垂直な所定の仮想平面上に位置する平面として形成されている。周壁部10においては、上面10dが、枠部材5の接合を受ける面となる。  The peripheral wall portion 10 has an upper surface 10d having a rectangular frame shape in plan view. The upper surface 10d is formed as a plane located on a predetermined imaginary plane perpendicular to the vertical direction. An upper surface 10d of the peripheral wall portion 10 serves as a surface to which the frame member 5 is joined. 
 シール枠体12は、筐体3において、枠部材5の接合を受ける周壁部10をなす部分である。本実施形態では、シール枠体12は、金属製の部材であり、枠部材5は、溶接によりシール枠体12(周壁部10)に接合される。 The seal frame 12 is a portion of the housing 3 that forms the peripheral wall portion 10 to which the frame member 5 is joined. In this embodiment, the seal frame 12 is a metal member, and the frame member 5 is welded to the seal frame 12 (peripheral wall portion 10).
 シール枠体12は、金属材料からなるシール枠体本体14の表面を金属製の被覆部15により被覆した構成を有する(図1参照)。被覆部15により、周壁部10における内壁面10b、外壁面10cおよび上面10dが形成される。 The seal frame 12 has a configuration in which the surface of a seal frame main body 14 made of a metal material is covered with a metal coating portion 15 (see FIG. 1). The covering portion 15 forms an inner wall surface 10b, an outer wall surface 10c, and an upper surface 10d of the peripheral wall portion 10 .
 シール枠体本体14をなす金属材料としては、例えば、鉄(Fe)、ニッケル(Ni)、およびコバルトを含む合金であるコバール、銅(Cu)、銅合金、タングステン(W)、アルミニウム(Al)、ステンレス鋼(SUS)、42アロイ等が挙げられる。被覆部15は、例えば、ニッケル(Ni)、金(Au)等のメッキにより形成された薄膜状のメッキ層である。 Examples of the metal material forming the seal frame main body 14 include Kovar, which is an alloy containing iron (Fe), nickel (Ni), and cobalt, copper (Cu), a copper alloy, tungsten (W), and aluminum (Al). , stainless steel (SUS), 42 alloy, and the like. The covering portion 15 is a thin-film plated layer formed by plating with nickel (Ni), gold (Au), or the like, for example.
 シール枠体12は、上面10dとなる面の反対側の面である下面を、筐体本体部11の表面11aに対する接合面として、例えば銀銅(Ag-Cu)合金を用いた金属ロウ材により筐体本体部11に接合されている。 The seal frame 12 has a lower surface opposite to the upper surface 10d, which is bonded to the surface 11a of the housing main body 11 by metal brazing material using, for example, a silver-copper (Ag—Cu) alloy. It is joined to the housing body portion 11 .
 本実施形態では、シール枠体12は、シール枠体本体14の表面に被覆部15を形成した構成のものであるが、このような構成に限定されるものではない。シール枠体12は、シール枠体本体14のみの構成、つまり被覆部15を省略した構成のものであってもよい。また、シール枠体本体14は、例えばセラミックス等を材料として、筐体本体部11の一部として形成された部分であってもよい。 In this embodiment, the seal frame 12 has a configuration in which the covering portion 15 is formed on the surface of the seal frame main body 14, but the configuration is not limited to this. The seal frame 12 may be configured with only the seal frame main body 14 , that is, with a configuration in which the covering portion 15 is omitted. Further, the seal frame main body 14 may be a portion formed as a part of the housing main body portion 11 using ceramics or the like as a material, for example.
 イメージセンサ2は、筐体本体部11に電気的に接続されている。イメージセンサ2は、半導体の一例であるシリコン(Si)により構成された半導体基板を含む半導体素子である。イメージセンサ2は、矩形板状のチップであり、上側の板面である表面2a側を受光面側とし、その反対側の板面を裏面2bとする。また、イメージセンサ2は、その板面に対して垂直状に形成された四方の側面部2cを有する。 The image sensor 2 is electrically connected to the housing body 11 . The image sensor 2 is a semiconductor element including a semiconductor substrate made of silicon (Si), which is an example of a semiconductor. The image sensor 2 is a rectangular plate-shaped chip, and the front surface 2a, which is the upper plate surface, is the light receiving surface side, and the opposite plate surface is the back surface 2b. The image sensor 2 also has four side portions 2c formed perpendicular to the plate surface.
 イメージセンサ2の表面2a側には、複数の受光素子(光電変換素子)が形成されている。本実施形態に係るイメージセンサ2は、CMOS(Complementary Metal Oxide Semiconductor)型のイメージセンサである。ただし、イメージセンサ2はCCD(Charge Coupled Device)型のイメージセンサや、短波長赤外(SWIR:Short Wavelength Infra-Red)イメージセンサ等の他の撮像素子であってもよい。 A plurality of light receiving elements (photoelectric conversion elements) are formed on the surface 2a side of the image sensor 2 . The image sensor 2 according to this embodiment is a CMOS (Complementary Metal Oxide Semiconductor) type image sensor. However, the image sensor 2 may be a CCD (Charge Coupled Device) type image sensor or other imaging device such as a short wavelength infrared (SWIR: Short Wavelength Infra-Red) image sensor.
 イメージセンサ2は、表面2a側に、多数の画素が形成された受光領域である画素領域16、および画素領域16の周囲の領域である周辺領域17を有する。画素領域16において、多数の画素は、例えばベイヤ(Bayer)配列等の所定の配列で形成されており、イメージセンサ2における受光部を構成する。周辺領域17には、所定の周辺回路が形成されている。画素領域16は、各画素における光電変換により信号電荷の生成、増幅、および読み出しを行う有効画素領域を含む。画素領域16の画素は、光電変換機能を有する光電変換部としてのフォトダイオードと、複数の画素トランジスタとを有する。なお、図1において、画素領域16を薄墨部分で示している。 The image sensor 2 has, on the surface 2a side, a pixel region 16, which is a light receiving region in which a large number of pixels are formed, and a peripheral region 17, which is a region surrounding the pixel region 16. In the pixel region 16 , a large number of pixels are arranged in a predetermined arrangement such as a Bayer arrangement, and constitute a light receiving section of the image sensor 2 . A predetermined peripheral circuit is formed in the peripheral region 17 . The pixel region 16 includes an effective pixel region for generating, amplifying, and reading out signal charges by photoelectric conversion in each pixel. A pixel in the pixel region 16 has a photodiode as a photoelectric conversion unit having a photoelectric conversion function and a plurality of pixel transistors. In addition, in FIG. 1, the pixel area 16 is indicated by a light black portion.
 イメージセンサ2の表面2a側には、半導体基板に対して、酸化膜等からなる反射防止膜や、有機材料により形成された平坦化膜等を介して、カラーフィルタおよびオンチップレンズが各画素に対応して形成されている。オンチップレンズに入射した光が、カラーフィルタや平坦化膜等を介してフォトダイオードで受光される。 On the front surface 2a side of the image sensor 2, a color filter and an on-chip lens are attached to each pixel through an antireflection film made of an oxide film or the like, a planarizing film made of an organic material, or the like, with respect to the semiconductor substrate. correspondingly formed. Light incident on the on-chip lens is received by a photodiode through a color filter, a planarization film, or the like.
 イメージセンサ2は、筐体3に対して、冷却素子であるペルチェ素子18に支持された状態で設けられている。ペルチェ素子18は、ペルチェ効果を用いた半導体熱電素子であり、図示せぬ電源部と電気的に接続されており、電源部から供給された電流を流すことで温度差を生じさせる。 The image sensor 2 is provided in the housing 3 while being supported by a Peltier element 18, which is a cooling element. The Peltier element 18 is a semiconductor thermoelectric element that uses the Peltier effect, is electrically connected to a power supply (not shown), and generates a temperature difference by passing current supplied from the power supply.
 ペルチェ素子18は、略矩形板状の外形を有し、上下の板面としていずれも水平状の面である上面18aおよび下面18bを有する。ペルチェ素子18は、筐体本体部11の凹部13内に収容された状態で設けられている。ペルチェ素子18は、上下方向について、上面18aを、筐体本体部11の表面11aよりも下方に位置させている。 The Peltier element 18 has a substantially rectangular plate-like outer shape, and has an upper surface 18a and a lower surface 18b, which are both horizontal surfaces, as upper and lower plate surfaces. The Peltier element 18 is provided in a state of being accommodated within the recess 13 of the housing main body 11 . The Peltier element 18 has an upper surface 18a positioned below the surface 11a of the housing main body 11 in the vertical direction.
 ペルチェ素子18は、下面18bを底面部13bに対する接合面として底板部11d上に固定されている。ペルチェ素子18は、例えば比較的熱伝導率が高い樹脂系の接着剤であるダイボンド材や、熱伝導率を上げるためのフィラーを添加したTIM(Thermal Interface Material)材等の熱伝導性接着剤による接着、あるいは半田付けによる接合等によって底板部11dに固定されている。 The Peltier element 18 is fixed on the bottom plate portion 11d with the lower surface 18b as a joint surface for the bottom surface portion 13b. The Peltier element 18 is made of a thermally conductive adhesive such as a die-bonding material, which is a resin-based adhesive with relatively high thermal conductivity, or a TIM (Thermal Interface Material) material to which a filler is added to increase thermal conductivity. It is fixed to the bottom plate portion 11d by bonding, soldering, or the like.
 ペルチェ素子18の上面18a上に、イメージセンサ2が設けられている。イメージセンサ2は、裏面2bを上面18aに対する接合面として、熱伝導性接着剤による接着や半田付けによる接合等により、ペルチェ素子18上に固定されている。イメージセンサ2は、上下方向について、表面2aを、筐体本体部11の表面11aと略同じ高さに位置させている。また、イメージセンサ2は、四方の側面部2cを、それぞれ凹部13の四方の側面部13aに対向させており、イメージセンサ2と凹部13の開口端部との間に隙間が存在している。 An image sensor 2 is provided on the upper surface 18 a of the Peltier element 18 . The image sensor 2 is fixed on the Peltier element 18 by bonding with a thermally conductive adhesive, soldering, or the like, using the rear surface 2b as a joint surface to the upper surface 18a. The image sensor 2 has the surface 2a located at substantially the same height as the surface 11a of the housing body 11 in the vertical direction. In addition, the image sensor 2 has four side portions 2c opposed to the four side portions 13a of the recess 13, respectively, and a gap exists between the image sensor 2 and the opening end of the recess 13. As shown in FIG.
 ペルチェ素子18においては、所定の方向に直流電流を流すことにより、上面18a側が吸熱側(冷却側)の面となり、下面18b側が放熱側の面となる。これにより、ペルチェ素子18の上面18aに接合されたイメージセンサ2は、ペルチェ素子18による冷却作用を受ける。 In the Peltier element 18, by passing a direct current in a predetermined direction, the upper surface 18a side becomes a heat absorption side (cooling side) surface, and the lower surface 18b side becomes a heat radiation side surface. As a result, the image sensor 2 bonded to the upper surface 18 a of the Peltier element 18 is cooled by the Peltier element 18 .
 イメージセンサ2は、例えばAu(金)またはCu(銅)からなる金属細線である接続部材としての複数のボンディングワイヤ(図示略)によって筐体本体部11に電気的に接続されている。ボンディングワイヤは、一端側を、イメージセンサ2の表面2aにおける周辺領域17に形成されたパッド電極に接続させ、他端側を、筐体本体部11の表面11aのうち周壁部10の内側の部分であるインナーリード段に形成されたリード電極に接続させる。これらの電極は、イメージセンサ2および筐体本体部11のそれぞれにおける外部に対する信号の送受信のための端子であり、例えばAl(アルミニウム)、Au(金)、Ag(銀)、Cu(銅)等の金属材料からなる金属膜として形成されている。 The image sensor 2 is electrically connected to the housing main body 11 by a plurality of bonding wires (not shown) as connection members, which are fine metal wires made of Au (gold) or Cu (copper), for example. One end of the bonding wire is connected to the pad electrode formed in the peripheral area 17 on the surface 2a of the image sensor 2, and the other end is connected to the inner side of the peripheral wall 10 on the surface 11a of the housing main body 11. is connected to the lead electrode formed in the inner lead stage. These electrodes are terminals for transmitting/receiving signals to/from the outside in each of the image sensor 2 and the housing main body 11. For example, Al (aluminum), Au (gold), Ag (silver), Cu (copper), etc. is formed as a metal film made of a metal material of
 筐体本体部11の裏面11b側には、外部接続用の端子として複数のコネクタ19が設けられている。コネクタ19は、撮像装置1を外部装置の回路基板等に対して電気的に接続するためのプラグである。コネクタ19は、筐体本体部11の裏面11b側において、左右両側の2箇所に設けられている。2つのコネクタ19は、筐体本体部11の左右両側の縁部に沿って延伸状に設けられており、裏面11bから突出した突条部分をなしている。 A plurality of connectors 19 are provided as terminals for external connection on the rear surface 11b side of the housing main body 11 . The connector 19 is a plug for electrically connecting the imaging device 1 to a circuit board or the like of an external device. The connectors 19 are provided at two locations on the left and right sides on the rear surface 11 b side of the housing main body 11 . The two connectors 19 are provided extending along the left and right edges of the housing main body 11, and form ridges protruding from the rear surface 11b.
 コネクタ19は、その外形をなす樹脂製の本体部19aに対して所定の部位に金属製のリード部等の配線部19bを設けた構成を有する。コネクタ19は、コネクタ19の嵌合を受ける被嵌合部に対応した所定の嵌合形状を有する。コネクタ19は、筐体本体部11に形成された配線部分に対して配線部を電気的に接続させるように、筐体本体部11の裏面11bに対して半田等により実装されている。 The connector 19 has a configuration in which a wiring portion 19b such as a metal lead portion is provided at a predetermined portion on a resin main body portion 19a forming the outer shape of the connector. The connector 19 has a predetermined fitting shape corresponding to a fitted portion to which the connector 19 is fitted. The connector 19 is mounted on the rear surface 11 b of the housing main body 11 by soldering or the like so as to electrically connect the wiring portion to the wiring portion formed on the housing main body 11 .
 このように、撮像装置1は、コネクタ19を有するイメージセンサコネクタパッケージとして構成されている。なお、撮像装置1が有する外部接続端子は、コネクタ19に限らず、例えば、複数のピンを格子点状に配置したPGA(Pin Grid Array)等であってもよい。 In this way, the imaging device 1 is configured as an image sensor connector package having the connector 19. The external connection terminal of the imaging device 1 is not limited to the connector 19, and may be, for example, a PGA (Pin Grid Array) in which a plurality of pins are arranged in a grid pattern.
 蓋体7について説明する。蓋体7は、ガラス4と枠部材5とを有する。 The lid body 7 will be explained. Lid 7 has glass 4 and frame member 5 .
 ガラス4は、前記半導体素子に対向するように設けられた透明部材の一例であり、例えば、ホウケイ酸ガラスやソーダガラス等のガラス材料からなる。ガラス4は、矩形板状の外形を有し、平面視でイメージセンサ2と略同じ外形寸法を有する。イメージセンサ2に対向する側の板面である下面4bと、その反対側の面である上面4aとを有する。 The glass 4 is an example of a transparent member provided so as to face the semiconductor element, and is made of a glass material such as borosilicate glass or soda glass, for example. The glass 4 has a rectangular plate-like outer shape, and has substantially the same outer dimensions as the image sensor 2 in plan view. It has a lower surface 4b, which is a plate surface on the side facing the image sensor 2, and an upper surface 4a, which is a surface on the opposite side.
 ガラス4は、イメージセンサ2の受光側において、平面視でイメージセンサ2の外形に略一致するように、かつ、イメージセンサ2に対して平行状に所定の間隔を隔てて設けられている。ガラス4は、周壁部10に対して、枠部材5を介して固定状態で支持されている。 The glass 4 is provided on the light-receiving side of the image sensor 2 so as to substantially match the outer shape of the image sensor 2 in a plan view and to be parallel to the image sensor 2 at a predetermined interval. The glass 4 is fixedly supported by the peripheral wall portion 10 via the frame member 5 .
 ガラス4は、光学窓を構成し、撮像装置1の上方に位置するレンズ等の光学系から入射する各種光を透過させる。ガラス4を透過した光は、キャビティ8を介してイメージセンサ2の受光面に入射する。ガラス4は、イメージセンサ2の受光面側を保護する機能を有する。なお、本技術に係る透明部材としては、ガラス4の代わりに、例えば、プラスチック板、あるいは赤外光のみを透過するシリコン板等を用いることができる。 The glass 4 constitutes an optical window and allows various kinds of light entering from an optical system such as a lens positioned above the imaging device 1 to pass therethrough. Light transmitted through the glass 4 enters the light receiving surface of the image sensor 2 via the cavity 8 . The glass 4 has a function of protecting the light receiving surface side of the image sensor 2 . As the transparent member according to the present technology, instead of the glass 4, for example, a plastic plate or a silicon plate that transmits only infrared light can be used.
 枠部材5は、金属板を所定の形状に成形した金属製の部材である。枠部材5は、平面視で矩形状の外形を有するとともに、側面断面視で扁平な略逆ハット形状を有する。枠部材5は、側面断面視で略逆ハット形状をなす面部として、枠部材5の底面部である平面視矩形状の支持面部21と、支持面部21の4辺に沿って形成された側面部22と、枠部材5の上側の外縁に沿って形成されたフランジ部23とを有する。 The frame member 5 is a metal member formed by molding a metal plate into a predetermined shape. The frame member 5 has a rectangular outer shape in a plan view, and has a flat, substantially inverted hat shape in a side cross-sectional view. The frame member 5 includes a support surface portion 21 which is a bottom surface portion of the frame member 5 and has a rectangular shape in a plan view, and side portions formed along the four sides of the support surface portion 21 as a surface portion having an approximately inverted hat shape in a side sectional view. 22 and a flange portion 23 formed along the upper outer edge of the frame member 5 .
 支持面部21は、ガラス4を支持する水平状の面部である。側面部22は、支持面部21の四方の縁部から上方に向けて支持面部21とともに直角状をなすように屈曲した鉛直面状の面部である。フランジ部23は、四方の側面部22の上縁から外側に向けて側面部22とともに直角状をなすように屈曲した面部からなる平面視枠状の水平状の面部である。 The support surface portion 21 is a horizontal surface portion that supports the glass 4 . The side surface portion 22 is a vertical surface portion bent upward from the four edges of the support surface portion 21 so as to form a right angle with the support surface portion 21 . The flange portion 23 is a frame-shaped horizontal surface portion formed by bending outward from the upper edges of the four side surface portions 22 so as to form a right angle with the side surface portions 22 .
 支持面部21の中央部には、イメージセンサ2に受光される光の通路を確保するための開口部24が形成されている。開口部24は、支持面部21を板厚方向に貫通した孔部であり、イメージセンサ2の外形に対応して矩形状の開口形状を有する。開口部24は、平面視でその開口領域にイメージセンサ2の画素領域16の全体を含むとともに、イメージセンサ2の周縁部を開口領域の外側に位置させるように形成されている。開口部24により、支持面部21は、平面視で枠状の面部となっている。 An opening 24 is formed in the central portion of the support surface portion 21 to secure a passage of light received by the image sensor 2 . The opening 24 is a hole penetrating through the support surface 21 in the plate thickness direction, and has a rectangular opening shape corresponding to the outer shape of the image sensor 2 . The opening 24 is formed so that the entire pixel region 16 of the image sensor 2 is included in the opening area in plan view, and the periphery of the image sensor 2 is positioned outside the opening area. The opening 24 makes the support surface 21 a frame-shaped surface in a plan view.
 枠部材5においては、四方の側面部22が、フランジ部23と支持面部21とをつなぐ部分となる。枠部材5は、支持面部21および側面部22により、フランジ部23に対する凹部25をなしている。つまり、支持面部21および四方の側面部22により、上側を開放側とした箱状の部分が形成されており、箱状の部分の上側の開口縁部の外側にフランジ部23が形成されている。 In the frame member 5 , the four side surface portions 22 are portions that connect the flange portion 23 and the support surface portion 21 . The frame member 5 forms a recess 25 with respect to the flange portion 23 by the support surface portion 21 and the side surface portion 22 . In other words, a box-shaped portion with an open top is formed by the support surface portion 21 and the four side portions 22, and the flange portion 23 is formed on the outer side of the opening edge portion on the upper side of the box-shaped portion. .
 枠部材5の平面視の外形寸法は、シール枠体12の平面視の外形寸法と同一または略同一となっている。枠部材5においては、その平面視外形をなすフランジ部23が、周壁部10の上面10dに接合される部分となる。枠部材5は、フランジ部23を周壁部10上に乗せるとともに、支持面部21および側面部22からなる箱状の部分を、周壁部10の内側において周壁部10の上面10dよりも下方に位置させた状態で設けられている。したがって、撮像装置1において、枠部材5の支持面部21は、側面部22の上下高さ分、フランジ部23よりもイメージセンサ2側に位置している。 The outer dimensions of the frame member 5 in plan view are the same or substantially the same as the outer dimensions of the seal frame 12 in plan view. In the frame member 5 , the flange portion 23 forming the outer shape in plan view is the portion that is joined to the upper surface 10 d of the peripheral wall portion 10 . The frame member 5 has the flange portion 23 placed on the peripheral wall portion 10, and the box-shaped portion composed of the support surface portion 21 and the side surface portion 22 is positioned below the upper surface 10d of the peripheral wall portion 10 inside the peripheral wall portion 10. It is installed in the Therefore, in the imaging device 1 , the support surface portion 21 of the frame member 5 is positioned closer to the image sensor 2 than the flange portion 23 by the vertical height of the side surface portion 22 .
 枠部材5は、図6に示すように、金属材料からなる枠部材本体26の表面を金属製の被膜である金属膜部27により被覆した構成を有する。すなわち、枠部材5は、金属材料からなる枠部材本体26と、枠部材本体26の表面を被覆する金属膜部27とを有する。なお、図1および図4においては、枠部材5を簡略化して示している。 As shown in FIG. 6, the frame member 5 has a structure in which the surface of a frame member main body 26 made of a metal material is covered with a metal film portion 27 that is a metal film. That is, the frame member 5 has a frame member main body 26 made of a metal material and a metal film portion 27 covering the surface of the frame member main body 26 . 1 and 4, the frame member 5 is shown in a simplified manner.
 枠部材本体26は、枠部材5の本体部として、支持面部21、側面部22およびフランジ部23の各部に対応した部分を有する。枠部材本体26は、所定の金属材料からなる板材を絞り加工等のプレス成形等によって加工することにより得られる。枠部材本体26をなす金属材料としては、例えば、鉄(Fe)、ニッケル(Ni)、およびコバルトを含む合金であるコバール、銅(Cu)、銅合金、タングステン(W)、アルミニウム(Al)、ステンレス鋼(SUS)、42アロイ等が挙げられる。 The frame member main body 26 has portions corresponding to the support surface portion 21, the side surface portion 22, and the flange portion 23 as the main body portion of the frame member 5. The frame member main body 26 is obtained by processing a plate material made of a predetermined metal material by press forming such as drawing. Examples of the metal material forming the frame member main body 26 include Kovar, which is an alloy containing iron (Fe), nickel (Ni), and cobalt, copper (Cu), a copper alloy, tungsten (W), aluminum (Al), Examples include stainless steel (SUS), 42 alloy, and the like.
 金属膜部27は、枠部材本体26の全体を被覆するように形成されている。金属膜部27は、例えば、ニッケル(Ni)、金(Au)等のメッキにより形成された薄膜状のメッキ層である。 The metal film portion 27 is formed so as to cover the entire frame member main body 26 . The metal film portion 27 is, for example, a thin-film plated layer formed by plating with nickel (Ni), gold (Au), or the like.
 本実施形態では、金属膜部27は、枠部材本体26の表面の全体を被覆するように形成されているが、枠部材本体26の表面の一部に形成されてもよい。金属膜部27は、枠部材本体26の表面のうち、少なくとも周壁部10に対する接合面を被覆するように形成されていればよい。すなわち、枠部材5においては、フランジ部23の下面23bが、周壁部10に対する接合面となるため、金属膜部27は、枠部材本体26の表面のうち、少なくともフランジ部23の下面23bに対応したフランジ下面26bを被覆するように形成されていればよい。 In this embodiment, the metal film portion 27 is formed so as to cover the entire surface of the frame member main body 26, but may be formed on a part of the surface of the frame member main body 26. The metal film portion 27 may be formed so as to cover at least the joint surface with respect to the peripheral wall portion 10 among the surfaces of the frame member main body 26 . That is, in the frame member 5, the lower surface 23b of the flange portion 23 serves as a joint surface with respect to the peripheral wall portion 10, so the metal film portion 27 corresponds to at least the lower surface 23b of the flange portion 23 among the surfaces of the frame member main body 26. It is sufficient that it is formed so as to cover the lower flange surface 26b.
 また、枠部材5は、枠部材本体26を金属膜部27で被覆した構成を備えているが、金属膜部27を省略した構成のものであってもよい。つまり、枠部材5は、所定の金属板をプレス成形等によって凹型に加工した枠部材本体26そのものを枠部材5としたものであってもよい。 In addition, the frame member 5 has a structure in which the frame member main body 26 is covered with the metal film portion 27, but may have a structure in which the metal film portion 27 is omitted. In other words, the frame member 5 may be the frame member body 26 itself, which is formed by processing a predetermined metal plate into a concave shape by press molding or the like.
 蓋体7において、ガラス4は、枠部材5の凹部25内に位置し、支持面部21に対して開口部24を上方から塞ぐように設けられている。ガラス4は、開口部24の開口寸法よりも大きい平面視外形を有し、周縁部を支持面部21上に乗せた状態で支持面部21に固定されている。 In the lid 7 , the glass 4 is positioned in the recess 25 of the frame member 5 and is provided so as to block the opening 24 with respect to the support surface 21 from above. The glass 4 has a plan view outer shape larger than the opening size of the opening 24 , and is fixed to the support surface 21 in a state where the peripheral portion is placed on the support surface 21 .
 ガラス4は、下面4bを支持面部21に対する接合面として、所定の接合材料により形成されたガラス接合部28により支持面部21の上面21a上に固定されている。ガラス接合部28は、ガラス4と支持面部21との間において、支持面部21に対してガラス4が被さる範囲の全体または略全体にわたる範囲に介在している。 The glass 4 is fixed on the upper surface 21a of the support surface portion 21 by a glass bonding portion 28 formed of a predetermined bonding material, with the lower surface 4b serving as a bonding surface for the support surface portion 21. The glass bonding portion 28 is interposed between the glass 4 and the support surface portion 21 over the entire or substantially the entire range in which the glass 4 covers the support surface portion 21 .
 ガラス接合部28は、開口部24によって4つの辺部からなる矩形枠状をなす支持面部21において、支持面部21の各辺部の幅方向の内側(開口部24側)の部分に形成されている。したがって、支持面部21における各辺部の幅方向の外側の部分は、平面視においてガラス4の外形の外側の部分となり、露出した面部となっている。ガラス接合部28は、開口部24の開口形状に沿うように、開口部24の周りにおける全周にわたって形成されており、ガラス4により開口部24を気密封止させている。 The glass bonding portion 28 is formed in the width direction inner side (opening 24 side) of each side of the supporting surface 21 having a rectangular frame shape with four sides formed by the opening 24 . there is Therefore, the portions of the support surface portion 21 on the outside in the width direction of each side portion are portions on the outside of the outer shape of the glass 4 in plan view, and are exposed surface portions. The glass joint 28 is formed along the entire periphery of the opening 24 so as to follow the opening shape of the opening 24 , and hermetically seals the opening 24 with the glass 4 .
 ガラス接合部28をなす接合材料は、例えば、所定の温度(例えば300℃程度の温度)で溶融する低融点ガラスや、例えば銀銅(Ag-Cu)合金を用いた金属ロウ材や、半田等である。 The bonding material forming the glass bonding portion 28 is, for example, a low-melting-point glass that melts at a predetermined temperature (eg, a temperature of about 300° C.), a metal brazing material using, for example, a silver-copper (Ag—Cu) alloy, solder, or the like. is.
 蓋体7において、ガラス4は、全体を枠部材5の凹部25内に位置させている。ガラス4の平面視外形の寸法は、凹部25の平面視外形の寸法よりも小さく、ガラス4は、枠部材5に固定された状態で、四方の側面4cを、それぞれ枠部材5の四方の側面部22に対して隙間を隔てて対向させている。また、ガラス4は、側面部22の上下方向の寸法よりも小さい寸法の板厚を有し、枠部材5に固定された状態で、上下方向について、上面4aを、枠部材5のフランジ部23の上面23aよりも下方に位置させている。なお、ガラス4の上面4aは、周壁部10の上面10dよりも下方に位置している。 In the lid 7 , the glass 4 is entirely positioned within the recess 25 of the frame member 5 . The dimensions of the outer shape of the glass 4 in plan view are smaller than the outer dimensions of the concave portion 25 in plan view. It is opposed to the portion 22 with a gap therebetween. Further, the glass 4 has a plate thickness smaller than the vertical dimension of the side surface portion 22 , and in a state of being fixed to the frame member 5 , the upper surface 4 a is vertically aligned with the flange portion 23 of the frame member 5 . is located below the upper surface 23a of the . The upper surface 4a of the glass 4 is located below the upper surface 10d of the peripheral wall portion 10. As shown in FIG.
 このようにガラス4の全体が枠部材5の凹部25内に位置する構成の蓋体7によれば、枠部材5のフランジ部23の上面23aが、撮像装置1における上面となる。フランジ部23の上面23aは、上下方向に対して垂直な所定の仮想平面上に位置する平面となっている。 According to the cover body 7 configured such that the entire glass 4 is positioned within the recess 25 of the frame member 5 , the upper surface 23 a of the flange portion 23 of the frame member 5 serves as the upper surface of the imaging device 1 . An upper surface 23a of the flange portion 23 is a plane positioned on a predetermined imaginary plane perpendicular to the vertical direction.
 撮像装置1において、枠部材5は、周壁部10に対して接合されることで、筐体3およびガラス4とともにイメージセンサ2の周囲を気密空間とする。すなわち、ガラス4により枠部材5の開口部24を気密封止した構成の蓋体7が、枠部材5のフランジ部23を周壁部10に対して全周にわたって気密封止するように接合させることで、イメージセンサ2の周囲のキャビティ8が、外部との間で気体を出入りさせない気密空間となっている。 In the image capturing apparatus 1, the frame member 5 is joined to the peripheral wall portion 10 to form an airtight space around the image sensor 2 together with the housing 3 and the glass 4. That is, the lid 7 having a configuration in which the opening 24 of the frame member 5 is airtightly sealed with the glass 4 is joined to the peripheral wall 10 so as to airtightly seal the flange 23 of the frame member 5 over the entire circumference. A cavity 8 around the image sensor 2 is an airtight space that does not allow gas to enter or leave the outside.
 枠部材5のフランジ部23は、周壁部10の上面10dに対して溶接により接合されている。枠部材5は、フランジ部23の幅方向について外縁側の部分を周壁部10に溶接させている。 The flange portion 23 of the frame member 5 is welded to the upper surface 10d of the peripheral wall portion 10 . The frame member 5 is welded to the peripheral wall portion 10 at the outer edge side portion in the width direction of the flange portion 23 .
 具体的には、枠部材5は、フランジ部23の外側の縁端の位置を、周壁部10の上面10dにおける外側の縁端の位置に一致または略一致させている。また、周壁部10の上面10dの幅方向(図1における左右方向)の寸法、つまり壁部10aの壁厚は、フランジ部23の幅方向の寸法(図1における左右方向)の略半分となっている。 Specifically, the position of the outer edge of the flange portion 23 of the frame member 5 matches or substantially matches the position of the outer edge of the upper surface 10 d of the peripheral wall portion 10 . Further, the dimension of the upper surface 10d of the peripheral wall portion 10 in the width direction (horizontal direction in FIG. 1), that is, the wall thickness of the wall portion 10a is approximately half the dimension of the flange portion 23 in the width direction (horizontal direction in FIG. 1). ing.
 したがって、フランジ部23の幅方向について外縁側の略半分の部分が、周壁部10の上面10dを被覆する部分となっており、周壁部10に対する溶接部分となっている。本実施形態では、フランジ部23のうち、その幅方向についてフランジ部23の全体の幅寸法の半分よりも小さい寸法の外側の縁部が、周壁部10に対する溶接部分となっている。言い換えると、壁部10aの壁厚は、フランジ部23の幅方向の寸法の半分よりも小さく、フランジ部23の外縁端に一致するように周壁部10が設けられている。なお、フランジ部23の外側の縁部は、周壁部10よりも外側に突出していてもよい。 Therefore, substantially half of the outer edge side of the flange portion 23 in the width direction is a portion that covers the upper surface 10 d of the peripheral wall portion 10 and is a welded portion to the peripheral wall portion 10 . In this embodiment, of the flange portion 23 , the outer edge portion having a dimension smaller than half of the overall width dimension of the flange portion 23 in the width direction is a welded portion to the peripheral wall portion 10 . In other words, the wall thickness of the wall portion 10 a is smaller than half of the widthwise dimension of the flange portion 23 , and the peripheral wall portion 10 is provided so as to match the outer edge of the flange portion 23 . Note that the outer edge of the flange portion 23 may protrude further outward than the peripheral wall portion 10 .
 枠部材5の溶接には、対象部分に電流を流すことで生じた抵抗熱により溶着させる抵抗溶接の一種であるシーム溶接が用いられる。 For the welding of the frame member 5, seam welding, which is a type of resistance welding that is welded by resistance heat generated by applying an electric current to the target portion, is used.
 シーム溶接により、枠部材5のフランジ部23の各辺部が、周壁部10をなす四方の壁部10aにより形成された上面10dに対して溶接される。これにより、フランジ部23が周壁部10に対して全周にわたって連続して溶接され、パッケージが気密封止された状態となっている。なお、筐体3に対する枠部材5の接合としては、パッケージを気密封止することができるものであれば、例えば、レーザ溶接等の他の溶接方法を用いた接合や、金属ロウ材や半田を用いた接合等の溶接以外の方法を用いた接合であってもよい。 By seam welding, each side portion of the flange portion 23 of the frame member 5 is welded to the upper surface 10d formed by the four wall portions 10a forming the peripheral wall portion 10. As a result, the flange portion 23 is continuously welded to the peripheral wall portion 10 over the entire circumference, and the package is hermetically sealed. As for joining the frame member 5 to the housing 3, as long as the package can be airtightly sealed, for example, joining using other welding methods such as laser welding, metal brazing material, or soldering can be used. It may be a joining using a method other than welding, such as joining.
 <2.第1実施形態に係る撮像装置の製造方法>
 本実施形態に係る撮像装置1の製造方法の一例について、図7および図8を参照して説明する。
<2. Method for Manufacturing Imaging Device According to First Embodiment>
An example of a method for manufacturing the imaging device 1 according to this embodiment will be described with reference to FIGS. 7 and 8. FIG.
 撮像装置1の製造方法においては、パッケージ本体部6を製造する工程と、蓋体7を製造する工程とが行われた後、パッケージ本体部6に対して蓋体7を接合する工程が行われる。 In the manufacturing method of the imaging device 1, after the process of manufacturing the package body 6 and the process of manufacturing the lid 7, the process of bonding the lid 7 to the package body 6 is performed. .
 パッケージ本体部6を製造する工程においては、まず、図7Aに示すように、イメージセンサ2の周囲を囲む周壁部10を有し、イメージセンサ2と電気的に接続される筐体3を準備する工程が行われる。筐体3は、凹部13を有する筐体本体部11に対して、シール枠体12を金属ロウ材等により接合することによって得られる。 In the process of manufacturing the package body 6, first, as shown in FIG. 7A, a housing 3 having a peripheral wall 10 surrounding the image sensor 2 and electrically connected to the image sensor 2 is prepared. process is performed. The housing 3 is obtained by joining the sealing frame 12 to the housing main body 11 having the concave portion 13 with metal brazing material or the like.
 図7Aに示すように、筐体3の凹部13内には、イメージセンサ2の取付けを受けるペルチェ素子18が設けられている。また、筐体本体部11の裏面11bには、コネクタ19が実装されている。 As shown in FIG. 7A, a Peltier element 18 to which the image sensor 2 is attached is provided inside the concave portion 13 of the housing 3 . A connector 19 is mounted on the rear surface 11 b of the housing main body 11 .
 次に、図7Bに示すように、筐体本体部11の周壁部10の内側に、イメージセンサ2を筐体3に対して電気的に接続した状態で設ける工程が行われる。イメージセンサ2は、ペルチェ素子18の上面18aに対して、熱伝導性接着剤による接着や半田付けによる接合等によって固定されている。イメージセンサ2は、イメージセンサ2および筐体3の筐体本体部11の表面側に形成された電極同士をつなぐボンディングワイヤ(図示略)により、筐体3に対して電気的に接続される。以上のような工程により、パッケージ本体部6が得られる。 Next, as shown in FIG. 7B, a step of providing the image sensor 2 electrically connected to the housing 3 inside the peripheral wall 10 of the housing main body 11 is performed. The image sensor 2 is fixed to the upper surface 18a of the Peltier element 18 by bonding with a thermally conductive adhesive, soldering, or the like. The image sensor 2 is electrically connected to the housing 3 by bonding wires (not shown) that connect electrodes formed on the surface side of the housing body 11 of the housing 3 and the image sensor 2 . The package main body 6 is obtained through the steps described above.
 一方、蓋体7を製造する工程においては、まず、図8Aに示すように、枠部材5を準備する工程が行われる。枠部材5は、全体として枠状に構成され、周縁部にフランジ部23を有し、フランジ部23に対する凹部25をなすとともに、凹部25の底面部である支持面部21に開口部24を有する。 On the other hand, in the process of manufacturing the lid body 7, first, as shown in FIG. 8A, the process of preparing the frame member 5 is performed. The frame member 5 has a frame shape as a whole, has a flange portion 23 on the peripheral edge, forms a recess 25 for the flange portion 23 , and has an opening 24 in the support surface portion 21 that is the bottom portion of the recess 25 .
 枠部材5を準備する工程では、まず、金属製の板材を絞り加工等のプレス成形によって凹型に加工し、支持面部21、側面部22およびフランジ部23となる部分を有する枠部材本体26を形成する(図6参照)。枠部材本体26の材料としては、例えばコバールが用いられる。そして、枠部材本体26に対して、電解メッキ法等の公知の方法により、ニッケル(Ni)、金(Au)等の材料によるメッキ処理を施すことで、枠部材本体26の表面を全体的に被覆する金属膜部27を形成する。これにより、枠部材5が得られる。 In the process of preparing the frame member 5, first, a metal plate is processed into a concave shape by press forming such as drawing, and a frame member main body 26 having portions to be the support surface portion 21, the side surface portion 22, and the flange portion 23 is formed. (see Figure 6). Kovar, for example, is used as the material of the frame member main body 26 . Then, the frame member main body 26 is plated with a material such as nickel (Ni) or gold (Au) by a known method such as electrolytic plating, so that the surface of the frame member main body 26 is entirely covered. A covering metal film portion 27 is formed. Thereby, the frame member 5 is obtained.
 次に、図8Bに示すように、枠部材5の支持面部21上に、開口部24を塞ぐようにガラス4を設ける工程が行われる。ガラス4は、ガラス接合部28となる低融点ガラスにより、支持面部21上に接合される。 Next, as shown in FIG. 8B, a step of providing the glass 4 on the support surface portion 21 of the frame member 5 so as to close the opening 24 is performed. The glass 4 is bonded onto the support surface portion 21 by low-melting-point glass that serves as the glass bonding portion 28 .
 低融点ガラスは、例えば、ペースト状態でディスペンサやスクリーン印刷法により支持面部21またはガラス4に塗布され、加熱されて溶剤を蒸発させた後、支持面部21上にガラス4がマウントされた状態で、所定の温度に加熱されて溶融して部材同士を溶着させる。ただし、ガラス4は、例えば銀銅(Ag-Cu)合金を用いた金属ロウ材や半田等により接合されてもよい。 For example, the low-melting-point glass is applied in a paste state to the support surface portion 21 or the glass 4 by a dispenser or a screen printing method, and after heating to evaporate the solvent, the glass 4 is mounted on the support surface portion 21. It is heated to a predetermined temperature and melted to weld the members together. However, the glass 4 may be joined by a metal brazing material using a silver-copper (Ag—Cu) alloy, solder, or the like.
 そして、図8Cに示すように、枠部材5を、周壁部10の上面10dに対してフランジ部23をシーム溶接により接合することで筐体3に取り付ける工程が行われる。 Then, as shown in FIG. 8C, a step of attaching the frame member 5 to the housing 3 by joining the flange portion 23 to the upper surface 10d of the peripheral wall portion 10 by seam welding is performed.
 すなわち、まず、リッドとなる蓋体7が、セラミックパッケージであるパッケージ本体部6上にマウントされる。ここで、蓋体7は、ガラス4を収納した凹部25を周壁部10の内側に位置させるとともに、フランジ部23を、周壁部10上に重ねた状態となる。パッケージ本体部6上に蓋体7がマウントされた後、フランジ部23が周壁部10に対してシーム溶接により全周にわたって溶接され、パッケージが気密封止される。 That is, first, the lid body 7, which is a lid, is mounted on the package main body 6, which is a ceramic package. Here, the lid body 7 is in a state in which the concave portion 25 containing the glass 4 is positioned inside the peripheral wall portion 10 and the flange portion 23 is superimposed on the peripheral wall portion 10 . After the lid 7 is mounted on the package body 6, the flange 23 is seam-welded to the peripheral wall 10 over the entire periphery, thereby hermetically sealing the package.
 具体的には、図8Cに示すように、シーム溶接においては、シーム溶接ローラとして、一対の電極ローラ30が用いられる。電極ローラ30は、円錐台状のローラ本体部31と、ローラ本体部31の底側から延出した軸部32とを有し、ローラ本体部31および軸部32の中心軸を回転軸R1とする回転体である。一対の電極ローラ30は、ローラ本体部31側を互いに対向させるとともに同軸上に配置されており、互いに同期して同じ方向に回転(同軸回転)するように設けられている。図8Cにおいては、左右方向が、一対の電極ローラ30の回転軸方向となる。 Specifically, as shown in FIG. 8C, a pair of electrode rollers 30 are used as seam welding rollers in seam welding. The electrode roller 30 has a truncated cone-shaped roller main body 31 and a shaft 32 extending from the bottom side of the roller main body 31. The central axis of the roller main body 31 and the shaft 32 is the rotation axis R1. It is a rotating body that rotates. The pair of electrode rollers 30 are arranged coaxially with the roller main body 31 side facing each other, and are provided so as to rotate in the same direction in synchronization with each other (coaxial rotation). In FIG. 8C , the left-right direction is the rotation axis direction of the pair of electrode rollers 30 .
 電極ローラ30は、ローラ本体部31の外周面31aを、フランジ部23に対する接触面とし、周壁部10上に位置するフランジ部23に対して上側から接触する。一対の電極ローラ30を通じて、周壁部10および枠部材5に電気が流される。一対の電極ローラ30を用いた通電により、電極ローラ30の接触部の抵抗が高くなって発熱し、この熱により金属が溶融され、フランジ部23が周壁部10に溶接される。 The electrode roller 30 contacts the flange portion 23 located on the peripheral wall portion 10 from above by using the outer peripheral surface 31a of the roller main body portion 31 as a contact surface with respect to the flange portion 23 . Electricity is applied to the peripheral wall portion 10 and the frame member 5 through the pair of electrode rollers 30 . When the pair of electrode rollers 30 are energized, the resistance of the contact portion of the electrode rollers 30 increases and heat is generated.
 シーム溶接の工程では、まず、一対の電極ローラ30により、平面視で矩形状に沿うフランジ部23の4つの辺部のうち、互いに対向する一対の辺部が同時的に溶接される。すなわち、一対の電極ローラ30が、フランジ部23の4つの辺部のうち互いに対向する一対の辺部に沿って、加圧、通電をともない、辺部の延伸方向の一端から他端まで回転しながらX方向(第1の方向)に移動し、線状の連続的な溶接が行われる。 In the seam welding process, first, of the four sides of the flange portion 23 along the rectangular shape in plan view, a pair of sides facing each other are simultaneously welded by the pair of electrode rollers 30 . That is, the pair of electrode rollers 30 are rotated from one end to the other end in the extending direction of the side portions along the pair of side portions that face each other among the four side portions of the flange portion 23 while being pressurized and energized. While moving in the X direction (first direction), linear continuous welding is performed.
 このように、矩形状をなすフランジ部23の4つの辺部を周方向に順番に第1辺部23c、第2辺部23d、第3辺部23eおよび第4辺部23fとした場合(図5参照)、まず、一対の電極ローラ30により、互いに対向する第1辺部23cおよび第3辺部23eが、周壁部10に対して溶接される。ここで、一対の電極ローラ30のうち、一方の電極ローラ30により第1辺部23cが溶接され、他方の電極ローラ30により第3辺部23eが溶接される。 In this way, when the four side portions of the rectangular flange portion 23 are the first side portion 23c, the second side portion 23d, the third side portion 23e and the fourth side portion 23f in order in the circumferential direction (Fig. 5), first, the first side portion 23 c and the third side portion 23 e facing each other are welded to the peripheral wall portion 10 by the pair of electrode rollers 30 . Here, of the pair of electrode rollers 30, one electrode roller 30 welds the first side portion 23c, and the other electrode roller 30 welds the third side portion 23e.
 その後、一対の電極ローラ30の回転軸方向がパッケージ側に対して平面視で90°相対回転させられ、フランジ部23における互いに対向する残りの一対の辺部、つまり第2辺部23dおよび第4辺部23fについて、一対の電極ローラ30の移動方向をY方向(第2の方向)とした溶接が行われる。なお、Y方向は、X方向に対して平面視で直交する方向である。 After that, the direction of the rotation axis of the pair of electrode rollers 30 is rotated relative to the package side by 90° in plan view, and the remaining pair of side portions of the flange portion 23 facing each other, that is, the second side portion 23d and the fourth side portion 23d, are rotated. Welding is performed on the side portion 23f with the moving direction of the pair of electrode rollers 30 being the Y direction (second direction). Note that the Y direction is a direction perpendicular to the X direction in plan view.
 これにより、4つの辺部からなるフランジ部23の全周が周壁部10に対して溶接され、パッケージが気密封止された状態となる。なお、シーム溶接の工程においては、1つの電極ローラ30が用いられ、フランジ部23が有する4つの辺部に対して1つの辺部ずつの溶接が行われてもよい。以上のような工程により、図1に示すような撮像装置1が得られる。 As a result, the entire periphery of the flange portion 23 consisting of four sides is welded to the peripheral wall portion 10, and the package is hermetically sealed. In the seam welding step, one electrode roller 30 may be used to weld the four sides of the flange portion 23 one by one. Through the steps described above, the imaging apparatus 1 as shown in FIG. 1 is obtained.
 以上のような本実施形態に係る撮像装置1によれば、パッケージ本体部6に接合される蓋体7の構成を簡単にすることができ、製造プロセスの簡便化およびコストの低減を図ることができるとともに、パッケージ本体部6に対する蓋体7の接合にともなう熱応力による影響を低減することができる。 According to the imaging device 1 according to the present embodiment as described above, the configuration of the lid body 7 joined to the package main body 6 can be simplified, and the manufacturing process can be simplified and the cost can be reduced. In addition, it is possible to reduce the influence of the thermal stress that accompanies the bonding of the lid 7 to the package main body 6 .
 撮像装置1においては、蓋体7の構成部材がガラス4と枠部材5の2つの部材となり、ガラス4は、所定のガラス接合部28により枠部材5に接合されている。このため、蓋体7の構成部材を少なくすることができ、蓋体7の構成を簡単にすることができるとともに、蓋体7の構成部材同士を接合するための接合材を1種類で済ますことが可能となる。これにより、部材同士の接合プロセスを含む蓋体7の製造プロセスを簡略化することができ、材料費を低減することができる。 In the imaging device 1 , the constituent members of the lid 7 are two members, the glass 4 and the frame member 5 , and the glass 4 is joined to the frame member 5 by a predetermined glass joint 28 . As a result, the number of constituent members of the lid body 7 can be reduced, the construction of the lid body 7 can be simplified, and only one type of joining material is required for joining the constituent members of the lid body 7 together. becomes possible. Thereby, the manufacturing process of the lid body 7 including the bonding process of the members can be simplified, and the material cost can be reduced.
 また、蓋体7によれば、発熱源となる周壁部10に対する枠部材5の溶接部(以下「蓋溶接部」という。)から、枠部材5に対するガラス4の接合部(以下「ガラス接合部」という。)までの熱伝達経路を長くすることができる。具体的には、枠部材5において、蓋溶接部は、フランジ部23の外側の縁部であり、ガラス接合部は、支持面部21の開口部24側の開口縁部である。したがって、枠部材5において、蓋溶接部とガラス接合部との間には、フランジ部23の幅方向の内側の部分と、側面部22と、支持面部21の幅方向の外側の部分とが介在している。しかも、これらの面部は、側面断面視でクランク状をなすように屈曲した面部となっている。 In addition, according to the lid 7, the welded portion of the frame member 5 to the peripheral wall portion 10 serving as a heat source (hereinafter referred to as the “lid welded portion”) is extended to the joint portion of the glass 4 to the frame member 5 (hereinafter referred to as the “glass jointed portion”). ) can be lengthened. Specifically, in the frame member 5 , the lid welded portion is the outer edge of the flange portion 23 , and the glass bonded portion is the opening edge of the support surface portion 21 on the opening 24 side. Therefore, in the frame member 5, the widthwise inner portion of the flange portion 23, the side surface portion 22, and the widthwise outer portion of the support surface portion 21 are interposed between the cover welded portion and the glass welded portion. are doing. Moreover, these surface portions are bent to form a crank shape when viewed in cross section from the side.
 このように、蓋体7によれば、枠部材5における蓋溶接部からガラス接合部までの熱伝達経路を容易に確保することができる。これにより、シーム溶接による枠部材5の溶接時において溶接部で生じる熱に起因する熱応力に関し、枠部材5におけるガラス4の支持部分、特にガラス接合部に作用する熱応力を低減することができる。したがって、枠部材5における残留応力によるガラス4の割れ等の破損を抑制することができる。特に、本実施形態のように、フランジ部23の外縁側の部分を周壁部10に溶接させた構成によれば、蓋溶接部からガラス接合部までの距離を稼ぐことができるため、ガラス接合部に対する熱応力の影響を効果的に低減することができる。 Thus, according to the lid body 7, the heat transfer path from the lid welding portion to the glass bonding portion in the frame member 5 can be easily secured. As a result, regarding the thermal stress caused by the heat generated at the welded portion when the frame member 5 is welded by seam welding, the thermal stress acting on the portion supporting the glass 4 in the frame member 5, particularly the glass joint portion, can be reduced. . Therefore, breakage such as cracking of the glass 4 due to residual stress in the frame member 5 can be suppressed. In particular, according to the configuration in which the outer edge side portion of the flange portion 23 is welded to the peripheral wall portion 10 as in the present embodiment, it is possible to increase the distance from the cover welded portion to the glass joint portion. can effectively reduce the effect of thermal stress on
 また、枠部材5の側面断面視で略逆ハット形状をなす屈曲面形状によれば、枠部材5が有する弾性による一定程度の柔軟性を得ることができる。これにより、シーム溶接時におけるガラス接合部への熱応力を緩和することができ、熱応力の影響を低減することができる。 In addition, according to the bent surface shape of the frame member 5 which has a substantially inverted hat shape when viewed in cross section from the side, a certain degree of flexibility can be obtained due to the elasticity of the frame member 5 . As a result, the thermal stress applied to the glass joint portion during seam welding can be relaxed, and the influence of the thermal stress can be reduced.
 また、撮像装置1においては、周壁部10の上面10dを、光学的な基準として設定することができる。これにより、撮像装置1におけるイメージセンサ2の高さ位置の設定等に用いられる光学基準がガラス4の平行度等の影響を受けないようにすることができる。したがって、ガラス4とイメージセンサ2の平行度を考慮することなく、撮像装置1における光学的な設定や調整を容易かつ正確に行うことが可能となる。なお、撮像装置1は、外部装置において、イメージセンサ2の表面2aが光軸に対して垂直となるように位置決めされる。 Further, in the imaging device 1, the upper surface 10d of the peripheral wall portion 10 can be set as an optical reference. This makes it possible to prevent the optical reference used for setting the height position of the image sensor 2 in the imaging device 1 from being affected by the parallelism of the glass 4 or the like. Therefore, without considering the parallelism between the glass 4 and the image sensor 2, it is possible to easily and accurately perform optical settings and adjustments in the imaging device 1. FIG. The imaging device 1 is positioned in the external device such that the surface 2a of the image sensor 2 is perpendicular to the optical axis.
 また、撮像装置1においては、枠部材5がイメージセンサ2側へと突出させた凹部25を有し、凹部25内にガラス4が設けられている。このような構成によれば、蓋溶接部に対して、凹部25の深さにより、ガラス4をイメージセンサ2に近接配置することができる。これにより、ガラス4を透過する光について、イメージセンサ2が取り込むことができる光の入射角度の範囲を広く確保することが可能となる。ここで、入射角度は、イメージセンサ2に対する入射光の傾斜角度であり、イメージセンサ2の受光面に対して垂直な線に対する傾斜角度である。 Further, in the imaging device 1 , the frame member 5 has a concave portion 25 protruding toward the image sensor 2 side, and the glass 4 is provided in the concave portion 25 . According to such a configuration, the glass 4 can be arranged close to the image sensor 2 due to the depth of the concave portion 25 with respect to the lid welding portion. As a result, it is possible to secure a wide range of incident angles of light that can be captured by the image sensor 2 with respect to the light that is transmitted through the glass 4 . Here, the incident angle is the angle of inclination of the incident light with respect to the image sensor 2 and the angle of inclination with respect to a line perpendicular to the light receiving surface of the image sensor 2 .
 また、撮像装置1において、蓋体7は、周壁部10に対して溶接により接合されている。このような構成によれば、接合材を用いることなく、簡単かつ確実にパッケージを気密封止することが可能となる Further, in the imaging device 1, the lid body 7 is welded to the peripheral wall portion 10. As shown in FIG. With such a configuration, the package can be hermetically sealed easily and reliably without using a bonding material.
 また、蓋体7を構成する枠部材5は、支持面部21および側面部22により凹部25をなすように凹状に構成されており、凹部25内にガラス4の全体が納まるようにガラス4を支持している。このような構成によれば、枠部材5によってガラス4を保護することができるとともに、蓋溶接部となる枠部材5のフランジ部23の上面23aまたは周壁部10の上面10dを、光学的な基準に設定することができる。 Further, the frame member 5 constituting the lid 7 is formed in a concave shape by the supporting surface portion 21 and the side surface portion 22 so as to form a concave portion 25 , and supports the glass 4 so that the entire glass 4 is contained within the concave portion 25 . are doing. According to such a configuration, the glass 4 can be protected by the frame member 5, and the upper surface 23a of the flange portion 23 of the frame member 5 or the upper surface 10d of the peripheral wall portion 10 serving as the lid weld portion can be used as an optical reference. can be set to
 また、筐体3において、周壁部10は、イメージセンサ2の接続を受ける筐体本体部11とは別体のシール枠体12により構成されている。このような構成によれば、枠部材5の接合を受ける周壁部10の構成や材料等についての自由度を向上させることができる。これにより、例えば周壁部10を、枠部材5と溶接される部分として適した構成や材料にすることができるので、枠部材5と周壁部10の接合部において良好な接合性を得ることができる。 In addition, in the housing 3 , the peripheral wall portion 10 is composed of a seal frame 12 that is separate from the housing body portion 11 to which the image sensor 2 is connected. With such a configuration, it is possible to improve the degree of freedom regarding the configuration, material, etc. of the peripheral wall portion 10 to which the frame member 5 is joined. As a result, for example, the peripheral wall portion 10 can be configured and made of a suitable material as a portion to be welded to the frame member 5, so that good bondability can be obtained at the joint portion between the frame member 5 and the peripheral wall portion 10. .
 また、筐体本体部11とは別体のシール枠体12によって周壁部10を構成することにより、筐体本体部11および周壁部10の各部を構成する部材を別々に製造することができる。これにより、筐体3の製造を容易に行うことができる。 In addition, by configuring the peripheral wall portion 10 with the seal frame 12 that is separate from the housing main body portion 11, the members constituting the housing main body portion 11 and the peripheral wall portion 10 can be manufactured separately. This makes it possible to easily manufacture the housing 3 .
 また、枠部材5は、コバール等の金属材料からなる枠部材本体26の表面を金等のメッキ層である金属膜部27により被覆した構成を備える。このような構成によれば、周壁部10に対する枠部材5のシーム溶接等による溶接に関して良好な接合性を得ることができる。 Further, the frame member 5 has a structure in which the surface of the frame member main body 26 made of a metal material such as Kovar is covered with a metal film portion 27 that is a plated layer of gold or the like. According to such a configuration, it is possible to obtain good weldability in welding the frame member 5 to the peripheral wall portion 10 by seam welding or the like.
 また、撮像装置1において、イメージセンサ2は、筐体3に対してペルチェ素子18に支持された状態で設けられている。このような構成によれば、パッケージの気密封止構造により、ペルチェ素子18が生じさせる温度差に起因するキャビティ8内における結露を防止しながら、ペルチェ素子18によりイメージセンサ2を冷却することができるので、撮像装置1の良好な動作状態を確保することができる。 Also, in the imaging device 1 , the image sensor 2 is provided in a state of being supported by the Peltier element 18 with respect to the housing 3 . According to such a configuration, the image sensor 2 can be cooled by the Peltier element 18 while preventing dew condensation in the cavity 8 due to the temperature difference caused by the Peltier element 18 due to the airtight sealing structure of the package. Therefore, a good operating state of the imaging device 1 can be ensured.
 <3.第1実施形態に係る変形例>
 第1実施形態に係る変形例について説明する。
<3. Modified example according to the first embodiment>
A modification of the first embodiment will be described.
 (第1の変形例)
 第1の変形例は、パッケージ本体部6の構成についての変形例である。図9に示すように、第1の変形例では、パッケージ本体部6は、ペルチェ素子18を備えておらず、イメージセンサ2は、筐体本体部11に対して直接的に支持されている。
(First modification)
A first modified example is a modified example of the configuration of the package body portion 6 . As shown in FIG. 9 , in the first modification, the package main body 6 does not include the Peltier element 18 and the image sensor 2 is directly supported by the housing main body 11 .
 図9に示す例では、筐体本体部11は、イメージセンサ2を配置するための部分として、表面11a側に形成された比較的浅い凹部33を有する。凹部33は、筐体本体部11の表面11a側の中央部に形成されている。凹部33は、イメージセンサ2の外形に対応して矩形状の開口形状を有し、筐体本体部11の表面11a側の大部分を占める範囲に形成されている。 In the example shown in FIG. 9, the housing main body 11 has a relatively shallow concave portion 33 formed on the surface 11a side as a portion for arranging the image sensor 2 . The concave portion 33 is formed in the central portion of the housing main body portion 11 on the surface 11a side. The concave portion 33 has a rectangular opening shape corresponding to the outer shape of the image sensor 2 and is formed in a range that occupies most of the surface 11a side of the housing main body portion 11 .
 凹部33は、筐体本体部11の板面に対して垂直状に形成された四方の側面部33aと、水平状の底面部33bとを含む面部により形成された平面視矩形状の穴部である。凹部33は、イメージセンサ2の外形寸法より大きい開口寸法を有し、平面視でイメージセンサ2の全体が凹部33内に納まるように形成されている。筐体本体部11の表面11aのうち、周壁部10の内側であって凹部33の外側の部分が、ボンディングワイヤの接続を受けるリード電極等が形成されるインナーリード段となる。 The concave portion 33 is a rectangular hole in a plan view and is formed by a surface portion including four side surface portions 33a formed perpendicular to the plate surface of the housing main body portion 11 and a horizontal bottom surface portion 33b. be. The recessed portion 33 has an opening dimension larger than the external dimension of the image sensor 2 and is formed so that the entire image sensor 2 can be accommodated within the recessed portion 33 in plan view. A portion of the surface 11a of the housing main body 11 that is inside the peripheral wall 10 and outside the recess 33 serves as an inner lead step on which lead electrodes and the like for receiving connection of bonding wires are formed.
 凹部33の底面部33b上に、イメージセンサ2が設けられている。イメージセンサ2は、裏面2bを底面部33bに対する接合面として、熱伝導性接着剤による接着等により、筐体本体部11上に固定されている。イメージセンサ2は、四方の側面部2cを、それぞれ凹部33の四方の側面部33aに対向させており、イメージセンサ2と凹部33の開口端部との間に隙間が存在している。 The image sensor 2 is provided on the bottom surface portion 33b of the recessed portion 33. The image sensor 2 is fixed on the housing main body 11 by bonding with a thermally conductive adhesive or the like using the rear surface 2b as a bonding surface to the bottom surface portion 33b. The image sensor 2 has four side portions 2c facing the four side portions 33a of the recess 33, respectively, and a gap exists between the image sensor 2 and the opening end of the recess 33. As shown in FIG.
 このように、イメージセンサ2が固定される支持面は、筐体本体部11の一部として形成されてもよい。このような構成によれば、撮像装置1を簡単な構成にすることができる。なお、本変形例の構成は、筐体本体部11の表面11a側に凹部33を形成することなく、平坦な表面11a上にイメージセンサ2を実装した構成であってもよい。 Thus, the support surface to which the image sensor 2 is fixed may be formed as part of the housing main body 11. With such a configuration, the configuration of the imaging device 1 can be simplified. Note that the configuration of this modification may be a configuration in which the image sensor 2 is mounted on the flat surface 11a without forming the concave portion 33 on the surface 11a side of the housing body portion 11 .
 (第2の変形例)
 第2の変形例は、撮像装置1の製造方法についての変形例である。第2の変形例の方法は、枠部材5にガラス4を接合する前に、枠部材5を単体でパッケージ本体部6側に接合する方法である。
(Second modification)
A second modification is a modification of the method for manufacturing the imaging device 1 . The method of the second modification is a method of joining the frame member 5 alone to the package main body 6 side before joining the glass 4 to the frame member 5 .
 まず、パッケージ本体部6を製造する工程(図7A、図7B参照)、および枠部材5を準備する工程(図8A)が行われた後、パッケージ本体部6に対して先に枠部材5を接合する工程が行われる。 First, after the step of manufacturing the package main body 6 (see FIGS. 7A and 7B) and the step of preparing the frame member 5 (FIG. 8A) are performed, the frame member 5 is first attached to the package main body 6. A joining step is performed.
 すなわち、図10Aに示すように、枠部材5を、周壁部10の上面10dに対してフランジ部23をシーム溶接により接合することで筐体3に取り付ける工程が行われる。ここでは、上述したシーム溶接の工程と同様に、枠部材5がパッケージ本体部6上にマウントされた後、一対の電極ローラ30が用いられ、フランジ部23が周壁部10に対してシーム溶接により全周にわたって溶接され、パッケージが気密封止される。 That is, as shown in FIG. 10A, a step of attaching the frame member 5 to the housing 3 by seam-welding the flange portion 23 to the upper surface 10d of the peripheral wall portion 10 is performed. Here, after the frame member 5 is mounted on the package main body 6, a pair of electrode rollers 30 are used, and the flange portion 23 is seam-welded to the peripheral wall portion 10 in the same manner as in the seam welding process described above. Welded all around to hermetically seal the package.
 その後、図10Bに示すように、枠部材5の支持面部21上に、ガラス接合部28となる低融点ガラスにより、開口部24を塞ぐようにガラス4を接合する工程が行われる(矢印A1参照)。 After that, as shown in FIG. 10B , a step of bonding the glass 4 to the support surface portion 21 of the frame member 5 with the low-melting-point glass serving as the glass bonding portion 28 so as to close the opening 24 is performed (see arrow A1). ).
 このように、事前に蓋体7を製造することなく、先に枠部材5のみをパッケージ本体部6に接合した後に、枠部材5に対してガラス4を接合する方法が用いられてもよい。このような製造方法によれば、枠部材5において、溶接による残留応力自体を発生させることなく、パッケージの気密封止を行うことができる。 In this way, a method of first bonding only the frame member 5 to the package body 6 and then bonding the glass 4 to the frame member 5 may be used without manufacturing the lid 7 in advance. According to such a manufacturing method, the package can be hermetically sealed without generating residual stress itself due to welding in the frame member 5 .
 すなわち、枠部材5は、周壁部10に溶接により接合される際、ガラス4の接合を受けてない状態となる。これにより、ガラス4は、枠部材5の溶接にともなう熱応力について応力フリーの状態で枠部材5に接合されることになる。したがって、枠部材5において残留応力が生じることを抑制ないし防止することができ、ガラス接合部に対する熱応力の影響を効果的に低減することができる。 That is, when the frame member 5 is joined to the peripheral wall portion 10 by welding, the glass 4 is not joined. As a result, the glass 4 is joined to the frame member 5 in a stress-free state with respect to the thermal stress that accompanies the welding of the frame member 5 . Therefore, the generation of residual stress in the frame member 5 can be suppressed or prevented, and the influence of thermal stress on the glass joint can be effectively reduced.
 <4.第2実施形態に係る撮像装置の構成例>
 本技術の第2実施形態に係る撮像装置41の構成例について、図11および図12を参照して説明する。以下に説明する各実施形態では、第1実施形態と共通の構成については同一の符号を付し、重複する内容についての説明を適宜省略する。
<4. Configuration Example of Imaging Apparatus According to Second Embodiment>
A configuration example of an imaging device 41 according to a second embodiment of the present technology will be described with reference to FIGS. 11 and 12. FIG. In each embodiment described below, the same reference numerals are given to the configurations common to those of the first embodiment, and the description of overlapping contents is omitted as appropriate.
 図11に示すように、本実施形態に係る撮像装置41は、第1実施形態に係る構成において、支持部材としての支持枠体50をさらに備えている。支持枠体50は、枠部材5の支持面部21に対してガラス4側と反対側(下側)に設けられ、支持面部21を筐体3側に対して支持する部材である。 As shown in FIG. 11, the imaging device 41 according to this embodiment further includes a support frame 50 as a support member in the configuration according to the first embodiment. The support frame 50 is provided on the opposite side (lower side) of the support surface portion 21 of the frame member 5 to the glass 4 side, and is a member that supports the support surface portion 21 on the housing 3 side.
 図11および図12に示すように、支持枠体50は、平面視で矩形状の外形を有する略板状の部材であり、水平な板状の本体板部51と、本体板部51の外縁に沿って形成され下側に向けて突出した部分である外縁支持部52とを有する。支持枠体50は、本体板部51および外縁支持部52により、枠状をなす各辺部において略「L」字状の横断面形状を有する。支持枠体50は、周壁部10の内側に納まる外形寸法を有する。なお、図12は、便宜上、支持枠体50の一部を切り欠いて示している。 As shown in FIGS. 11 and 12, the support frame 50 is a substantially plate-like member having a rectangular outer shape in plan view, and includes a horizontal plate-like body plate portion 51 and an outer edge of the body plate portion 51. and an outer edge support portion 52 that is a portion that is formed along and protrudes downward. The support frame body 50 has a substantially “L”-shaped cross-sectional shape at each side portion forming a frame shape by the main body plate portion 51 and the outer edge support portion 52 . The support frame 50 has external dimensions to fit inside the peripheral wall portion 10 . Note that FIG. 12 shows a part of the support frame 50 cut away for the sake of convenience.
 本体板部51の中央部には、イメージセンサ2に受光される光の通路を確保するための開口部53が形成されている。開口部53は、本体板部51を板厚方向に貫通した孔部であり、イメージセンサ2の外形に対応して矩形状の開口形状を有する。開口部53は、枠部材5の開口部24と略同じ開口寸法を有し、平面視でその開口領域にイメージセンサ2の画素領域16の全体を含むとともに、イメージセンサ2の周縁部を開口領域の外側に位置させるように形成されている。開口部53により、支持枠体50は枠状の部材となっている。 An opening 53 is formed in the central portion of the body plate portion 51 to secure a passage of light received by the image sensor 2 . The opening 53 is a hole penetrating through the main body plate 51 in the plate thickness direction, and has a rectangular opening shape corresponding to the outer shape of the image sensor 2 . The opening 53 has substantially the same opening dimensions as the opening 24 of the frame member 5 , and includes the entire pixel region 16 of the image sensor 2 in its opening area in a plan view, and the peripheral edge of the image sensor 2 as the opening area. is formed so as to be positioned outside the The opening 53 makes the support frame 50 a frame-shaped member.
 本体板部51は、枠部材5の支持面部21を下側から支持する水平状の面部である。外縁支持部52は、本体板部51の下側において、本体板部51の矩形状の外形に沿うように枠状に形成されており、側面断面視で矩形状に沿う突出形状を有する。 The body plate portion 51 is a horizontal surface portion that supports the support surface portion 21 of the frame member 5 from below. The outer edge support portion 52 is formed in a frame shape along the rectangular outer shape of the main body plate portion 51 on the lower side of the main body plate portion 51, and has a protruding shape along the rectangular shape in a side sectional view.
 支持枠体50は、本体板部51の上側の面を、水平状の平面である上面51aとしている。また、支持枠体50は、外縁支持部52の下側の面を、上下方向に対して垂直な所定の仮想平面上に位置する平面として形成された下面52aとしている。また、支持枠体50は、上面51aおよび下面52aに対して垂直状に形成された四方の側面50aを有する。 The support frame 50 has the upper surface of the main body plate portion 51 as an upper surface 51a that is a horizontal plane. Further, the support frame 50 has a lower surface 52a formed as a plane positioned on a predetermined imaginary plane perpendicular to the vertical direction as the surface on the lower side of the outer edge support portion 52. As shown in FIG. Further, the support frame 50 has four side surfaces 50a formed perpendicular to the upper surface 51a and the lower surface 52a.
 支持枠体50の材料は、支持枠体50において所定の支持強度が得られるものであれば特に限定されるものではない。支持枠体50は、例えば、セラミックス、金属、樹脂材料等の材料により形成された比較的高剛性の堅牢な部材である。支持枠体50の材料としては、熱や光等の影響を受けにくく、継時的に変質や変形を生じさせにくい材料であることが好ましい。 The material of the support frame 50 is not particularly limited as long as the support frame 50 can obtain a predetermined support strength. The support frame 50 is a solid member with relatively high rigidity made of, for example, a material such as ceramics, metal, or resin material. The material of the support frame 50 is preferably a material that is not easily affected by heat, light, or the like, and is not easily deteriorated or deformed over time.
 支持枠体50は、下面52aを、筐体本体部11の表面11aに対する接合面として、ロウ材や接着剤等の所定の接合材により筐体本体部11に接合され、固定状態で設けられている。なお、支持枠体50は、その外形寸法を周壁部10の開口寸法に合致させることで、周壁部10内に嵌合させ、四方の側面50aを周壁部10の内壁面10bに接触させた状態で、筐体本体部11に対して接合することなく設けられてもよい。 The support frame 50 is provided in a fixed state by being joined to the housing main body 11 with a predetermined joint material such as brazing material or adhesive, with the lower surface 52a serving as a joint surface for the surface 11a of the housing main body 11. there is The support frame 50 is fitted into the peripheral wall portion 10 by matching the outer dimensions to the opening size of the peripheral wall portion 10, and the four side surfaces 50a are in contact with the inner wall surface 10b of the peripheral wall portion 10. , and may be provided without being joined to the housing main body 11 .
 支持枠体50は、外縁支持部52から撮像装置1の中心側へと本体板部51を延出させ、本体板部51の開口部53側の部分により、イメージセンサ2の周辺領域17を上方から覆っている。なお、本体板部51とイメージセンサ2の表面2aとの間には、本体板部51の下面51bからの外縁支持部52の突出高さ分の隙間が存在している。 The support frame 50 extends the body plate portion 51 from the outer edge support portion 52 toward the center of the imaging device 1 , and the peripheral area 17 of the image sensor 2 is held upward by the portion of the body plate portion 51 on the side of the opening 53 . covered from Between the body plate portion 51 and the surface 2 a of the image sensor 2 , there is a gap corresponding to the protrusion height of the outer edge support portion 52 from the bottom surface 51 b of the body plate portion 51 .
 支持枠体50は、上面51aを支持面部21の下面21bに対する接合面または接触面として、本体板部51上に枠部材5の支持面部21を載置させ、筐体本体部11に対して枠部材5を支持する。本体板部51は、支持面部21に対してロウ材や接着剤等の接合材により接合された状態で設けられてもよく、接合材を介することなく面接触した状態で設けられてもよい。 The support frame 50 has the upper surface 51a as a joint surface or a contact surface with respect to the lower surface 21b of the support surface portion 21, and the support surface portion 21 of the frame member 5 is placed on the main body plate portion 51. It supports the member 5. The body plate portion 51 may be provided in a state of being joined to the support surface portion 21 with a joining material such as a brazing material or an adhesive, or may be provided in a state of surface contact without a joining material.
 支持枠体50は、撮像装置41の製造工程において、周壁部10に枠部材5を溶接する工程の前段階で、筐体3に対して設けられる。筐体本体部11に対して支持枠体50を設ける工程は、筐体本体部11に対してシール枠体12を接合することによって周壁部10を設ける工程に対し、前の工程であっても後の工程であってもよい。筐体本体部11上に支持枠体50を配置した状態で枠部材5を溶接により周壁部10に接合することで、枠部材5の凹部25が支持枠体50上に接地した状態となる。 The support frame 50 is provided to the housing 3 in the manufacturing process of the imaging device 41, before the process of welding the frame member 5 to the peripheral wall portion 10. The step of providing the support frame 50 to the housing main body 11 may be a step preceding the step of providing the peripheral wall 10 by joining the seal frame 12 to the housing main body 11. It may be a later step. By joining the frame member 5 to the peripheral wall portion 10 by welding while the support frame 50 is arranged on the housing main body 11 , the concave portion 25 of the frame member 5 is grounded on the support frame 50 .
 本実施形態に係る撮像装置41によれば、第1実施形態の撮像装置1により得られる作用効果に加えて、次のような作用効果が得られる。すなわち、周壁部10の内側において、筐体本体部11と枠部材5との間に支持枠体50を介装することにより、ガラス4を支持する支持面部21を含む枠部材5の凹部25を、筐体本体部11に対して支持枠体50により支持することができる。これにより、蓋溶接部においてフランジ部23を固定させた枠部材5を、下側から支持して固定状態とすることができるため、比較的弾性変形しやすい枠部材5の弾性変形を抑制してガラス4を安定して支持することができ、枠部材5に支持されたガラス4と、イメージセンサ2のセンサ面である表面2aとの平行度を確保することができる。また、枠部材5の変形を抑制できることから、枠部材5の溶接時においてガラス接合部に作用する熱応力による影響を効果的に低減することができる。 According to the imaging device 41 according to this embodiment, the following effects can be obtained in addition to the effects obtained by the imaging device 1 of the first embodiment. That is, by interposing the support frame 50 between the housing main body 11 and the frame member 5 inside the peripheral wall portion 10, the recessed portion 25 of the frame member 5 including the support surface portion 21 that supports the glass 4 is formed. , can be supported by the support frame 50 with respect to the housing main body 11 . As a result, the frame member 5, to which the flange portion 23 is fixed at the lid welded portion, can be supported from below and fixed, thereby suppressing elastic deformation of the frame member 5, which is relatively prone to elastic deformation. The glass 4 can be stably supported, and the parallelism between the glass 4 supported by the frame member 5 and the surface 2a, which is the sensor surface of the image sensor 2, can be ensured. Moreover, since deformation of the frame member 5 can be suppressed, the influence of thermal stress acting on the glass joint portion during welding of the frame member 5 can be effectively reduced.
 なお、本実施形態では、支持枠体50は、枠部材5を平面視で全周にわたって支持する枠状の部材であるが、本実施形態に係る支持部材としては、枠部材5の枠状の外形における周方向について部分的に支持する支持体であってもよく、また、複数の支持体が設けられてもよい。また、本実施形態に係る支持部材は、イメージセンサ2への入射光を遮ることなく、枠部材5の支持面部21を筐体本体部11に対して支持するものであればよく、支持部材の形状は特に限定されない。 In the present embodiment, the support frame 50 is a frame-shaped member that supports the entire circumference of the frame member 5 in plan view. A support that partially supports the outer shape in the circumferential direction may be used, or a plurality of supports may be provided. Further, the support member according to the present embodiment may be any member as long as it supports the support surface portion 21 of the frame member 5 with respect to the housing main body portion 11 without blocking incident light to the image sensor 2. The shape is not particularly limited.
 <5.第3実施形態に係る撮像装置の構成例>
 本技術の第3実施形態に係る撮像装置61の構成例について、図13および図14を参照して説明する。本実施形態は、第2実施形態との対比において、支持部材の構成の点で異なっている。
<5. Configuration Example of Imaging Apparatus According to Third Embodiment>
A configuration example of an imaging device 61 according to a third embodiment of the present technology will be described with reference to FIGS. 13 and 14. FIG. This embodiment differs from the second embodiment in the configuration of the support member.
 図13に示すように、本実施形態に係る撮像装置61は、第1実施形態に係る構成において、支持部材としての支持枠体70をさらに備えている。支持枠体70は、枠部材5の支持面部21に対してガラス4側と反対側に設けられ、支持面部21を筐体3側に対して支持する部材である。本実施形態では、支持枠体70は、イメージセンサ2に対して枠部材5の支持面部21を支持するように設けられている。 As shown in FIG. 13, an imaging device 61 according to this embodiment further includes a support frame 70 as a support member in the configuration according to the first embodiment. The support frame 70 is provided on the side opposite to the glass 4 side with respect to the support surface portion 21 of the frame member 5 and is a member that supports the support surface portion 21 with respect to the housing 3 side. In this embodiment, the support frame 70 is provided so as to support the support surface portion 21 of the frame member 5 with respect to the image sensor 2 .
 図13および図14に示すように、支持枠体70は、平面視で矩形状の外形を有するとともに直線状の4つの辺部71を有する枠状の部材である。辺部71は、矩形状の横断面形状を有する。支持枠体70は、周壁部10の内側に納まる外形寸法を有する。なお、図14は、便宜上、支持枠体70の一部を切り欠いて示している。 As shown in FIGS. 13 and 14, the support frame 70 is a frame-shaped member having a rectangular outer shape in a plan view and four linear side portions 71 . Side portion 71 has a rectangular cross-sectional shape. The support frame 70 has external dimensions to fit inside the peripheral wall portion 10 . Note that FIG. 14 shows a part of the support frame 70 cut away for the sake of convenience.
 支持枠体70は、4つの辺部71により中央部に、イメージセンサ2に受光される光の通路を確保するための開口部73を形成している。開口部73は、支持枠体70を上下方向に貫通した孔部であり、イメージセンサ2の外形に対応して矩形状の開口形状を有する。開口部73は、枠部材5の開口部24と略同じ開口寸法を有し、平面視でその開口領域にイメージセンサ2の画素領域16の全体を含むとともに、イメージセンサ2の周縁部を開口領域の外側に位置させるように形成されている。 The support frame 70 has four side portions 71 forming an opening 73 in the central portion for securing a passage of light received by the image sensor 2 . The opening 73 is a hole vertically penetrating the support frame 70 and has a rectangular opening shape corresponding to the outer shape of the image sensor 2 . The opening 73 has substantially the same opening dimensions as the opening 24 of the frame member 5 , and includes the entire pixel region 16 of the image sensor 2 in its opening area in a plan view, and also includes the peripheral edge of the image sensor 2 as the opening area. is formed so as to be positioned outside the
 支持枠体70は、いずれも上下方向に対して垂直な所定の仮想平面上に位置する平面として形成された水平状の平面である上面70aおよび下面70bを有する。また、支持枠体70は、上面70aおよび下面70bに対して垂直状に形成された四方の側面70cを有する。 The support frame 70 has an upper surface 70a and a lower surface 70b which are horizontal planes formed as planes positioned on a predetermined imaginary plane perpendicular to the vertical direction. The support frame 70 also has four side surfaces 70c formed perpendicular to the upper surface 70a and the lower surface 70b.
 支持枠体70は、平面視での外形寸法について、イメージセンサ2において平面視で枠状の領域として画素領域16の周囲に形成された周辺領域17上に全体を位置させる大きさを有する。すなわち、イメージセンサ2上において、支持枠体70の開口部73を形成する四方の内側面73aは、画素領域16の外側に位置しており、四方の側面70cは、側面部2cよりも内側に位置している。このように、支持枠体70は、平面視で画素領域16の外側かつイメージセンサ2の外形の範囲内に位置している。 The support frame 70 has an outer dimension in plan view that is large enough to position the whole on the peripheral region 17 formed around the pixel region 16 as a frame-shaped region in the image sensor 2 in plan view. That is, on the image sensor 2, the four inner side surfaces 73a forming the opening 73 of the support frame 70 are located outside the pixel region 16, and the four side surfaces 70c are located inside the side surface portion 2c. positioned. Thus, the support frame 70 is positioned outside the pixel region 16 and within the outline of the image sensor 2 in plan view.
 支持枠体70の材料は、支持枠体70において所定の支持強度が得られるものであれば特に限定されるものではない。支持枠体70は、例えば、セラミックス、金属、樹脂材料等の材料により形成された比較的高剛性の堅牢な部材である。支持枠体70の材料としては、熱や光等の影響を受けにくく、継時的に変質や変形を生じさせにくい材料であることが好ましい。 The material of the support frame 70 is not particularly limited as long as the support frame 70 can obtain a predetermined support strength. The support frame 70 is a solid member with relatively high rigidity made of, for example, ceramics, metal, resin material, or the like. The material of the support frame 70 is preferably a material that is less susceptible to heat, light, and the like, and that is less likely to deteriorate or deform over time.
 支持枠体70は、下面70bを、イメージセンサ2の表面2aにおける周辺領域17の部分に対する接合面として、ロウ材や接着剤等の所定の接合材によりイメージセンサ2に接合され、固定状態で設けられている。 The support frame 70 is fixed to the image sensor 2 with a predetermined bonding material such as brazing material or adhesive, with the lower surface 70b serving as a bonding surface for the portion of the peripheral region 17 on the surface 2a of the image sensor 2. It is
 支持枠体70は、上面70aを支持面部21の下面21bに対する接合面または接触面として、枠部材5の支持面部21を下側から支持し、イメージセンサ2に対して枠部材5を支持する。詳細には、支持枠体70は、各辺部71の幅寸法を、開口部24をなす支持面部21の4つの辺部の幅寸法の略半分とし、支持面部21に対して、支持面部21の各辺部の幅方向について、開口部24の開口縁側(内周側)に位置している。支持枠体70は、支持面部21に対してロウ材や接着剤等の接合材により接合された状態で設けられてもよく、接合材を介することなく面接触した状態で設けられてもよい。 The support frame 70 supports the support surface portion 21 of the frame member 5 from below and supports the frame member 5 with respect to the image sensor 2 by using the upper surface 70a as a joint surface or contact surface with respect to the lower surface 21b of the support surface portion 21 . Specifically, the width of each side portion 71 of the support frame 70 is approximately half the width of the four sides of the support surface portion 21 forming the opening 24 . is located on the opening edge side (inner peripheral side) of the opening 24 in the width direction of each side of the opening 24 . The support frame 70 may be provided in a state of being joined to the support surface portion 21 with a bonding material such as a brazing material or an adhesive, or may be provided in a state of surface contact without a bonding material.
 なお、本実施形態では、支持枠体70は、その全体をイメージセンサ2の外形の範囲内に位置させているが、例えば、平面視でイメージセンサ2の外形からはみ出すような大きさを有するものであってもよい。この場合、支持枠体70は、外縁部を筐体本体部11の表面11a上に位置させ、表面11aに対して接合材により接合させたものであってもよい。また、支持枠体70がイメージセンサ2からはみ出す大きさを有するものである場合、支持枠体70は、その外形寸法を周壁部10の開口寸法に合致させることで、周壁部10内に嵌合させ、四方の側面70cを周壁部10の内壁面10bに接触させた状態で、イメージセンサ2に対して接合することなく設けられてもよい。 In the present embodiment, the entire support frame 70 is positioned within the contour of the image sensor 2. However, for example, the support frame 70 has a size that protrudes from the contour of the image sensor 2 in plan view. may be In this case, the support frame 70 may have an outer edge positioned on the surface 11a of the housing body 11 and bonded to the surface 11a with a bonding material. If the support frame 70 has a size that protrudes from the image sensor 2 , the support frame 70 fits inside the peripheral wall 10 by matching the outer dimensions to the opening size of the peripheral wall 10 . and the four side surfaces 70c are in contact with the inner wall surface 10b of the peripheral wall portion 10, and may be provided without being joined to the image sensor 2. FIG.
 支持枠体70は、撮像装置61の製造工程において、周壁部10に枠部材5を溶接する工程の前段階で、イメージセンサ2に対して設けられる。イメージセンサ2に対して支持枠体70を設ける工程は、筐体本体部11に対してシール枠体12を接合することによって周壁部10を設ける工程に対し、前の工程であっても後の工程であってもよい。イメージセンサ2上に支持枠体70を配置した状態で枠部材5を溶接により周壁部10に接合することで、枠部材5の凹部25が支持枠体70上に接地した状態となる。 The support frame 70 is provided for the image sensor 2 in the manufacturing process of the imaging device 61, before the process of welding the frame member 5 to the peripheral wall portion 10. The step of providing the support frame 70 for the image sensor 2 may be before or after the step of providing the peripheral wall portion 10 by joining the seal frame 12 to the housing body portion 11. It may be a process. By joining the frame member 5 to the peripheral wall portion 10 by welding while the support frame 70 is arranged on the image sensor 2 , the concave portion 25 of the frame member 5 is grounded on the support frame 70 .
 本実施形態に係る撮像装置61によれば、第1実施形態の撮像装置1により得られる作用効果に加えて、次のような作用効果が得られる。すなわち、周壁部10の内側において、イメージセンサ2と枠部材5との間に支持枠体70を介装することにより、ガラス4を支持する支持面部21を含む枠部材5の凹部25を、イメージセンサ2に対して支持枠体70により支持することができる。つまり、枠部材5の凹部25を、イメージセンサ2およびペルチェ素子18を介して筐体3に対して支持することができる。これにより、蓋溶接部においてフランジ部23を固定させた枠部材5を、下側から支持して固定状態とすることができるため、比較的弾性変形しやすい枠部材5の弾性変形を抑制してガラス4を安定して支持することができ、枠部材5に支持されたガラス4と、イメージセンサ2のセンサ面である表面2aとの平行度を確保することができる。また、枠部材5の変形を抑制できることから、枠部材5の溶接時においてガラス接合部に作用する熱応力による影響を効果的に低減することができる。 According to the imaging device 61 according to the present embodiment, the following operational effects can be obtained in addition to the operational effects obtained by the imaging device 1 of the first embodiment. That is, by interposing the support frame body 70 between the image sensor 2 and the frame member 5 inside the peripheral wall portion 10, the recessed portion 25 of the frame member 5 including the support surface portion 21 for supporting the glass 4 is imaged. The sensor 2 can be supported by a support frame 70 . That is, the recessed portion 25 of the frame member 5 can be supported by the housing 3 via the image sensor 2 and the Peltier element 18 . As a result, the frame member 5, to which the flange portion 23 is fixed at the lid welded portion, can be supported from below and fixed, thereby suppressing elastic deformation of the frame member 5, which is relatively prone to elastic deformation. The glass 4 can be stably supported, and the parallelism between the glass 4 supported by the frame member 5 and the surface 2a, which is the sensor surface of the image sensor 2, can be ensured. Moreover, since deformation of the frame member 5 can be suppressed, the influence of thermal stress acting on the glass joint portion during welding of the frame member 5 can be effectively reduced.
 さらに、本実施形態に係る撮像装置61によれば、支持枠体70を枠部材5とイメージセンサ2との間に介装する構成であるため、筐体本体部11において支持枠体70を設けるためのスペースが不要となる。これにより、筐体3を小型化することができ、撮像装置61をコンパクトにすることができる。 Furthermore, according to the imaging device 61 of the present embodiment, since the support frame 70 is interposed between the frame member 5 and the image sensor 2, the support frame 70 is provided in the housing main body 11. no space is required for As a result, the housing 3 can be downsized, and the imaging device 61 can be made compact.
 なお、本実施形態では、支持枠体70は、枠部材5を平面視で全周にわたって支持する枠状の部材であるが、本実施形態に係る支持部材としては、枠部材5の枠状の外形における周方向について部分的に支持する支持体であってもよく、また、複数の支持体が設けられてもよい。また、本実施形態に係る支持部材は、イメージセンサ2への入射光を遮ることなく、枠部材5の支持面部21を筐体本体部11に対して支持するものであればよく、支持部材の形状は特に限定されない。例えば、支持枠体70は、第2実施形態に係る支持枠体50と同様に、各辺部71において略「L」字状の横断面形状を有するものであってもよい。 In the present embodiment, the support frame 70 is a frame-shaped member that supports the entire circumference of the frame member 5 in plan view. A support that partially supports the outer shape in the circumferential direction may be used, or a plurality of supports may be provided. Further, the support member according to the present embodiment may be any member as long as it supports the support surface portion 21 of the frame member 5 with respect to the housing main body portion 11 without blocking incident light to the image sensor 2. The shape is not particularly limited. For example, the support frame 70 may have a substantially "L"-shaped cross-sectional shape at each side portion 71, like the support frame 50 according to the second embodiment.
 <6.第4実施形態に係る撮像装置の構成例>
 本技術の第4実施形態に係る撮像装置81の構成例について、図15を参照して説明する。本実施形態は、第1実施形態との対比において、枠部材5の構成の点で異なっている。
<6. Configuration Example of Imaging Apparatus According to Fourth Embodiment>
A configuration example of an imaging device 81 according to a fourth embodiment of the present technology will be described with reference to FIG. 15 . This embodiment differs from the first embodiment in the configuration of the frame member 5 .
 図15に示すように、本実施形態に係る撮像装置81において、枠部材5の側面部22は、縦断面視でジグザグ状をなすように形成されている。つまり、枠部材5において凹部25を形成する四方の側面部22は、全体として蛇腹状となるように加工形成されている。 As shown in FIG. 15, in the imaging device 81 according to this embodiment, the side surface portion 22 of the frame member 5 is formed to have a zigzag shape when viewed in longitudinal section. That is, the four side surface portions 22 forming the concave portion 25 of the frame member 5 are processed and formed to have a bellows shape as a whole.
 側面部22は、上側から下側にかけて枠部材5の外側から内側に向かうように傾斜した第1の斜面部22aと、第1の斜面部22aと反対方向に傾斜した第2の斜面部22bとを交互に連続的に配置した形状を有する。図15に示すような側面断面視において、第1の斜面部22aの下縁部と第2の斜面部22bの上縁部とにより、内側に凸の角部22cが形成され、第2の斜面部22bの下縁部と第1の斜面部22aの上縁部とにより、外側に凸の角部22dが形成されている。 The side surface portion 22 includes a first slope portion 22a that slopes from the outside to the inside of the frame member 5 from the top to the bottom, and a second slope portion 22b that slopes in the opposite direction to the first slope portion 22a. are arranged alternately and continuously. In a side sectional view as shown in FIG. 15, the lower edge of the first slope portion 22a and the upper edge of the second slope portion 22b form an inwardly convex corner portion 22c, forming a second slope. The lower edge of the portion 22b and the upper edge of the first slope portion 22a form an outwardly convex corner portion 22d.
 図15に示す例では、側面部22の下縁部においては、支持面部21の外側の縁部に下縁部をつなげるように第1の斜面部22aが形成されている。また、側面部22の上縁部においては、フランジ部23の内側の縁部に上縁部をつなげるように第1の斜面部22aが形成されている。なお、側面部22の上縁部および下縁部は、第2の斜面部22bにより形成されてもよい。また、側面部22において、第1の斜面部22aおよび第2の斜面部22bの繰り返しの数は特に限定されない。また、側面部22において、角部22c,22dは、鋭角状であっても鈍角状であってもよい。 In the example shown in FIG. 15 , a first slope portion 22 a is formed on the lower edge of the side surface portion 22 so as to connect the lower edge to the outer edge of the support surface portion 21 . A first slope portion 22 a is formed on the upper edge of the side surface portion 22 so as to connect the upper edge to the inner edge of the flange portion 23 . In addition, the upper edge portion and the lower edge portion of the side surface portion 22 may be formed by the second slope portion 22b. Moreover, in the side surface portion 22, the number of repetitions of the first slope portion 22a and the second slope portion 22b is not particularly limited. Also, in the side surface portion 22, the corners 22c and 22d may be acute-angled or obtuse-angled.
 本実施形態に係る撮像装置81によれば、第1実施形態の撮像装置1により得られる作用効果に加えて、次のような作用効果が得られる。すなわち、側面部22をジグザグ状に形成することにより、第1実施形態のように側面部22が鉛直状の平坦な面部である構成と比べて、蓋溶接部からガラス接合部までの熱伝達経路を長くすることができる。これにより、ガラス接合部に溶接による熱を伝わりにくくすることができ、ガラス接合部に対する熱応力の影響を効果的に低減することができる。 According to the imaging device 81 according to this embodiment, the following effects can be obtained in addition to the effects obtained by the imaging device 1 of the first embodiment. That is, by forming the side portion 22 in a zigzag shape, compared to the configuration in which the side portion 22 is a vertical flat surface portion as in the first embodiment, the heat transfer path from the lid welding portion to the glass bonding portion is reduced. can be lengthened. As a result, it is possible to make it difficult for heat generated by welding to be conducted to the glass joints, and to effectively reduce the influence of thermal stress on the glass joints.
 また、側面部22のジグザグ形状によれば、シーム溶接による枠部材5の溶接時において溶接部で生じる熱に起因する熱応力を、側面部22において吸収させることができる。これにより、枠部材5の略逆ハット形状となる側面断面形状と相俟って、枠部材5が有する弾性による柔軟性を向上させることができ、枠部材5のシーム溶接時におけるガラス接合部への熱応力の影響を効果的に低減することができる。 In addition, according to the zigzag shape of the side portion 22, the side portion 22 can absorb the thermal stress caused by the heat generated in the welded portion when the frame member 5 is welded by seam welding. As a result, together with the side cross-sectional shape of the frame member 5 having a substantially inverted hat shape, the flexibility due to the elasticity of the frame member 5 can be improved. can effectively reduce the effect of thermal stress.
 また、側面部22をジグザグ状に形成することにより、枠部材5の強度を向上させることができるとともに、ガラス4等に作用した外部応力を側面部22において吸収することができる。これにより、外部からの衝撃に対して強いパッケージ構造を得ることができる。 Further, by forming the side portions 22 in a zigzag shape, the strength of the frame member 5 can be improved, and the external stress acting on the glass 4 or the like can be absorbed by the side portions 22 . This makes it possible to obtain a package structure that is resistant to external shocks.
 <7.電子機器の構成例>
 上述した実施形態に係る撮像装置の電子機器への適用例について、図16を用いて説明する。
<7. Configuration example of electronic device>
An application example of the imaging device according to the above-described embodiment to an electronic device will be described with reference to FIG. 16 .
 本技術に係る撮像装置(固体撮像装置)は、デジタルスチルカメラやビデオカメラ等のカメラ装置や、撮像機能を有する携帯端末装置や、画像読取部に固体撮像素子を用いる複写機など、画像取込部(光電変換部)に固体撮像素子を用いる電子機器全般に対して適用可能である。撮像装置は、ワンチップとして形成された形態のものであってもよいし、撮像部と信号処理部または光学系とがまとめてパッケージングされた撮像機能を有するモジュール状の形態のものであってもよい。 Imaging devices (solid-state imaging devices) according to the present technology include camera devices such as digital still cameras and video cameras, mobile terminal devices having an imaging function, and copiers that use solid-state imaging devices for image reading. The present invention can be applied to electronic devices in general that use a solid-state imaging device as a section (photoelectric conversion section). The imaging device may be formed as a single chip, or may be in the form of a module having an imaging function in which an imaging unit and a signal processing unit or an optical system are packaged together. good too.
 図16に示すように、電子機器としてのカメラ装置200は、光学部202と、撮像装置201と、カメラ信号処理回路であるDSP(Digital Signal Processor)回路203と、フレームメモリ204と、表示部205と、記録部206と、操作部207と、電源部208とを備える。DSP回路203、フレームメモリ204、表示部205、記録部206、操作部207および電源部208は、バスライン等の接続線209を介して適宜接続されている。撮像装置201は、例えば上述した第1実施形態に係る撮像装置1である。 As shown in FIG. 16, a camera device 200 as an electronic device includes an optical unit 202, an imaging device 201, a DSP (Digital Signal Processor) circuit 203 as a camera signal processing circuit, a frame memory 204, and a display unit 205. , a recording unit 206 , an operation unit 207 , and a power supply unit 208 . The DSP circuit 203, frame memory 204, display unit 205, recording unit 206, operation unit 207, and power supply unit 208 are appropriately connected via a connection line 209 such as a bus line. The imaging device 201 is, for example, the imaging device 1 according to the first embodiment described above.
 光学部202は、複数のレンズを含み、被写体からの入射光(像光)を取り込んで撮像装置201の撮像面上に結像する。撮像装置201は、光学部202によって撮像面上に結像された入射光の光量を画素単位で電気信号に変換して画素信号として出力する。 The optical unit 202 includes a plurality of lenses, captures incident light (image light) from a subject, and forms an image on the imaging surface of the imaging device 201 . The imaging device 201 converts the amount of incident light imaged on the imaging surface by the optical unit 202 into an electric signal in units of pixels, and outputs the electric signal as a pixel signal.
 表示部205は、例えば、液晶パネルや有機EL(Electro Luminescence)パネル等のパネル型表示装置からなり、撮像装置201で撮像された動画または静止画を表示する。記録部206は、撮像装置201で撮像された動画または静止画を、ハードディスクや半導体メモリ等の記録媒体に記録する。 The display unit 205 is, for example, a panel type display device such as a liquid crystal panel or an organic EL (Electro Luminescence) panel, and displays moving images or still images captured by the imaging device 201 . A recording unit 206 records a moving image or still image captured by the imaging device 201 in a recording medium such as a hard disk or a semiconductor memory.
 操作部207は、ユーザによる操作の下に、カメラ装置200が持つ様々な機能について操作指令を発する。電源部208は、DSP回路203、フレームメモリ204、表示部205、記録部206および操作部207の動作電源となる各種の電源を、これら供給対象に対して適宜供給する。 The operation unit 207 issues operation commands for various functions of the camera device 200 under the user's operation. The power supply unit 208 appropriately supplies various power supplies as operating power supplies for the DSP circuit 203, the frame memory 204, the display unit 205, the recording unit 206, and the operation unit 207 to these supply targets.
 以上のようなカメラ装置200によれば、撮像装置201に関し、パッケージ本体部6に接合される蓋体7の構成を簡単にすることができ、製造プロセスの簡便化およびコストの低減を図ることができるとともに、パッケージ本体部6に対する蓋体7の接合にともなう熱応力による影響を低減することができる。これにより、カメラ装置200においてコストを低減することができるとともに、所望の特性を得ることができる。 According to the camera device 200 as described above, regarding the imaging device 201, the configuration of the lid body 7 joined to the package main body 6 can be simplified, and the manufacturing process can be simplified and the cost can be reduced. In addition, it is possible to reduce the influence of the thermal stress that accompanies the bonding of the lid 7 to the package main body 6 . As a result, the cost of the camera device 200 can be reduced, and desired characteristics can be obtained.
 上述した実施形態の説明は本技術の一例であり、本技術は上述の実施形態に限定されることはない。このため、上述した実施形態以外であっても、本開示に係る技術的思想を逸脱しない範囲であれば、設計等に応じて種々の変更が可能であることは勿論である。また、本開示に記載された効果はあくまで例示であって限定されるものでは無く、また他の効果があってもよい。また、上述した各実施形態の構成および変形例の構成は適宜組み合せることができる。 The above description of the embodiment is an example of the present technology, and the present technology is not limited to the above-described embodiment. Therefore, it goes without saying that various modifications other than the above-described embodiment are possible according to the design and the like as long as they do not deviate from the technical idea of the present disclosure. In addition, the effects described in the present disclosure are only examples and are not limited, and other effects may also occur. In addition, the configurations of the embodiments and the configurations of the modifications described above can be appropriately combined.
 上述した実施形態では、撮像装置が備える半導体素子は、受光素子であるイメージセンサ2であるが、本技術に係る半導体素子はこれに限定されない。本技術に係る半導体素子は、例えば、VCSEL(Vertical Cavity Surface Emitting LASER:垂直共振器面発光レーザ)、レーザーダイオード、LED(Light Emitting Diode)等の発光素子であってもよい。また、撮像装置は、1つのチップに複数の半導体素子を備えた構成のものや、複数の半導体素子を複数のチップとして備えた構成のものであってもよい。 In the above-described embodiment, the semiconductor element included in the imaging device is the image sensor 2, which is a light receiving element, but the semiconductor element according to the present technology is not limited to this. The semiconductor device according to the present technology may be, for example, a light-emitting device such as a VCSEL (Vertical Cavity Surface Emitting LASER), a laser diode, or an LED (Light Emitting Diode). Further, the imaging device may have a configuration in which a plurality of semiconductor elements are provided on one chip, or a configuration in which a plurality of semiconductor elements are provided as a plurality of chips.
 なお、本技術は、以下のような構成を取ることができる。
 (1)
 半導体素子と、
 前記半導体素子の周囲を囲む周壁部を有し、前記半導体素子と電気的に接続された筐体と、
 前記半導体素子に対向するように設けられた透明部材と、
 前記周壁部の上面に接合されるフランジ部、および前記フランジ部よりも前記半導体素子側に位置し、前記透明部材を支持する支持面部を有し、前記筐体および前記透明部材とともに前記半導体素子の周囲を気密空間とする枠部材と、を備えた
 半導体装置。
 (2)
 前記枠部材の前記フランジ部は、前記周壁部の上面に対して溶接により接合されている
 前記(1)に記載の半導体装置。
 (3)
 前記枠部材は、前記フランジ部と前記支持面部とをつなぐ側面部を有し、前記支持面部および前記側面部により、前記フランジ部に対する凹部をなしており、
 前記透明部材は、全体を前記凹部内に位置させている
 前記(1)または前記(2)に記載の半導体装置。
 (4)
 前記筐体は、前記半導体素子の接続を受ける筐体本体部を有し、
 前記周壁部は、前記筐体本体部に対して設けられた枠状の部材により構成されている
 前記(1)~(3)のいずれか1つに記載の半導体装置。
 (5)
 前記枠部材の前記支持面部に対して前記透明部材側と反対側に設けられ、前記支持面部を前記筐体側に対して支持する支持部材をさらに備えた
 前記(1)~(4)のいずれか1つに記載の半導体装置。
 (6)
 前記支持部材は、前記半導体素子に対して前記支持面部を支持するように設けられている
 前記(5)に記載の半導体装置。
 (7) 前記枠部材は、鉄、ニッケル、およびコバルトを含む合金からなる枠部材本体と、前記枠部材本体の表面のうち、少なくとも前記周壁部に対する接合面を被覆するように形成された金属膜部と、を有する
 前記(1)~(6)のいずれか1つに記載の半導体装置。
 (8)
 前記枠部材の前記側面部は、縦断面視でジグザグ状をなすように形成されている
 前記(3)に記載の半導体装置。
 (9)
 前記半導体素子は、前記筐体に対して、冷却素子に支持された状態で設けられている
 前記(1)~(8)のいずれか1つに記載の半導体装置。
 (10)
 半導体素子と、
 前記半導体素子の周囲を囲む周壁部を有し、前記半導体素子と電気的に接続された筐体と、
 前記半導体素子に対向するように設けられた透明部材と、
 前記周壁部の上面に接合されるフランジ部、および前記フランジ部よりも前記半導体素子側に位置し、前記透明部材を支持する支持面部を有し、前記筐体および前記透明部材とともに前記半導体素子の周囲を気密空間とする枠部材と、を備えた
 半導体装置を有する
 電子機器。
 (11)
 半導体素子の周囲を囲む周壁部を有し、前記半導体素子と電気的に接続される筐体を準備する工程と、
 前記筐体の前記周壁部の内側に、前記半導体素子を前記筐体に対して電気的に接続した状態で設ける工程と、
 全体として枠状に構成され、周縁部にフランジ部を有し、前記フランジ部に対する凹部をなすとともに、前記凹部の底面部に開口部を有する枠部材を準備する工程と、
 前記枠部材を、前記周壁部の上面に対して前記フランジ部を溶接により接合することで前記筐体に取り付ける工程と、
 前記枠部材の前記底面部上に、前記開口部を塞ぐように透明部材を設ける工程と、を含む
 半導体装置の製造方法。
In addition, this technique can take the following configurations.
(1)
a semiconductor element;
a housing having a peripheral wall surrounding the semiconductor element and electrically connected to the semiconductor element;
a transparent member provided to face the semiconductor element;
a flange portion joined to the upper surface of the peripheral wall portion; and a supporting surface portion positioned closer to the semiconductor element than the flange portion and supporting the transparent member, and supporting the semiconductor element together with the casing and the transparent member. A semiconductor device comprising: a frame member having an airtight space around it.
(2)
The semiconductor device according to (1), wherein the flange portion of the frame member is welded to the upper surface of the peripheral wall portion.
(3)
The frame member has a side surface portion connecting the flange portion and the support surface portion, and the support surface portion and the side surface portion form a recess with respect to the flange portion,
The semiconductor device according to (1) or (2), wherein the transparent member is entirely positioned within the recess.
(4)
The housing has a housing main body for receiving connection of the semiconductor element,
The semiconductor device according to any one of (1) to (3), wherein the peripheral wall portion is configured by a frame-shaped member provided for the housing body portion.
(5)
Any one of (1) to (4) above, further comprising a support member provided on the side opposite to the transparent member side with respect to the support surface portion of the frame member and supporting the support surface portion with respect to the housing side. 1. The semiconductor device according to 1.
(6)
The semiconductor device according to (5), wherein the support member is provided to support the support surface portion with respect to the semiconductor element.
(7) The frame member includes a frame member main body made of an alloy containing iron, nickel, and cobalt, and a metal film formed so as to cover at least a surface of the frame member main body to be joined to the peripheral wall portion. The semiconductor device according to any one of (1) to (6) above.
(8)
The semiconductor device according to (3), wherein the side surface portion of the frame member is formed to have a zigzag shape in a vertical cross-sectional view.
(9)
The semiconductor device according to any one of (1) to (8), wherein the semiconductor element is supported by a cooling element with respect to the housing.
(10)
a semiconductor element;
a housing having a peripheral wall surrounding the semiconductor element and electrically connected to the semiconductor element;
a transparent member provided to face the semiconductor element;
a flange portion joined to the upper surface of the peripheral wall portion; and a supporting surface portion positioned closer to the semiconductor element than the flange portion and supporting the transparent member, and supporting the semiconductor element together with the casing and the transparent member. An electronic device having a semiconductor device, comprising: a frame member having an airtight space around it.
(11)
preparing a housing having a peripheral wall surrounding a semiconductor element and electrically connected to the semiconductor element;
a step of providing the semiconductor element inside the peripheral wall portion of the housing in a state of being electrically connected to the housing;
a step of preparing a frame member that is configured in a frame shape as a whole, has a flange portion on the peripheral edge portion, forms a recess for the flange portion, and has an opening on the bottom surface of the recess;
a step of attaching the frame member to the housing by welding the flange portion to the upper surface of the peripheral wall portion;
and providing a transparent member on the bottom surface of the frame member so as to block the opening.
 1   撮像装置(半導体装置)
 2   イメージセンサ(半導体素子)
 3   筐体
 4   ガラス(透明部材)
 5   枠部材
 8   キャビティ
 10  周壁部
 10d 上面
 11  筐体本体部
 12  シール枠体(枠状の部材)
 13  凹部
 16  画素領域
 17  周辺領域
 18  ペルチェ素子(冷却素子)
 21  支持面部
 22  側面部
 23  フランジ部
 24  開口部
 25  凹部
 26  枠部材本体
 27  金属膜部
 41  撮像装置(半導体装置)
 50  支持枠体(支持部材)
 61  撮像装置(半導体装置)
 70  支持枠体(支持部材)
 81  撮像装置(半導体装置)
 200 カメラ装置(電子機器)
 201 撮像装置(半導体装置)
1 Imaging device (semiconductor device)
2 Image sensor (semiconductor element)
3 housing 4 glass (transparent member)
5 frame member 8 cavity 10 peripheral wall portion 10d upper surface 11 housing body portion 12 seal frame (frame-shaped member)
13 recess 16 pixel region 17 peripheral region 18 Peltier element (cooling element)
21 support surface portion 22 side surface portion 23 flange portion 24 opening portion 25 concave portion 26 frame member main body 27 metal film portion 41 imaging device (semiconductor device)
50 support frame (support member)
61 imaging device (semiconductor device)
70 support frame (support member)
81 imaging device (semiconductor device)
200 camera device (electronic device)
201 imaging device (semiconductor device)

Claims (11)

  1.  半導体素子と、
     前記半導体素子の周囲を囲む周壁部を有し、前記半導体素子と電気的に接続された筐体と、
     前記半導体素子に対向するように設けられた透明部材と、
     前記周壁部に接合されるフランジ部、および前記フランジ部よりも前記半導体素子側に位置し、前記透明部材を支持する支持面部を有し、前記筐体および前記透明部材とともに前記半導体素子の周囲を気密空間とする枠部材と、を備えた
     半導体装置。
    a semiconductor element;
    a housing having a peripheral wall surrounding the semiconductor element and electrically connected to the semiconductor element;
    a transparent member provided to face the semiconductor element;
    a flange portion joined to the peripheral wall portion; and a supporting surface portion positioned closer to the semiconductor element than the flange portion and supporting the transparent member, and surrounding the semiconductor element together with the casing and the transparent member. A semiconductor device comprising: a frame member forming an airtight space.
  2.  前記枠部材の前記フランジ部は、前記周壁部に対して溶接により接合されている
     請求項1に記載の半導体装置。
    The semiconductor device according to claim 1, wherein the flange portion of the frame member is welded to the peripheral wall portion.
  3.  前記枠部材は、前記フランジ部と前記支持面部とをつなぐ側面部を有し、前記支持面部および前記側面部により、前記フランジ部に対する凹部をなしており、
     前記透明部材は、全体を前記凹部内に位置させている
     請求項1に記載の半導体装置。
    The frame member has a side surface portion connecting the flange portion and the support surface portion, and the support surface portion and the side surface portion form a recess with respect to the flange portion,
    2. The semiconductor device according to claim 1, wherein said transparent member is positioned entirely within said recess.
  4.  前記筐体は、前記半導体素子の接続を受ける筐体本体部を有し、
     前記周壁部は、前記筐体本体部に対して設けられた枠状の部材により構成されている
     請求項1に記載の半導体装置。
    The housing has a housing main body for receiving connection of the semiconductor element,
    2. The semiconductor device according to claim 1, wherein the peripheral wall portion is configured by a frame-shaped member provided for the housing body portion.
  5.  前記枠部材の前記支持面部に対して前記透明部材側と反対側に設けられ、前記支持面部を前記筐体側に対して支持する支持部材をさらに備えた
     請求項1に記載の半導体装置。
    2. The semiconductor device according to claim 1, further comprising a support member provided on a side opposite to the transparent member side with respect to the support surface portion of the frame member, the support member supporting the support surface portion to the housing side.
  6.  前記支持部材は、前記半導体素子に対して前記支持面部を支持するように設けられている
     請求項5に記載の半導体装置。
    6. The semiconductor device according to claim 5, wherein said support member is provided so as to support said support surface portion with respect to said semiconductor element.
  7.  前記枠部材は、鉄、ニッケル、およびコバルトを含む合金からなる枠部材本体と、前記枠部材本体の表面のうち、少なくとも前記周壁部に対する接合面を被覆するように形成された金属膜部と、を有する
     請求項1に記載の半導体装置。
    The frame member includes a frame member main body made of an alloy containing iron, nickel, and cobalt; a metal film portion formed so as to cover at least a joint surface of the frame member main body with respect to the peripheral wall portion; The semiconductor device according to claim 1, comprising:
  8.  前記枠部材の前記側面部は、縦断面視でジグザグ状をなすように形成されている
     請求項3に記載の半導体装置。
    4 . The semiconductor device according to claim 3 , wherein the side surface portion of the frame member is formed to have a zigzag shape when viewed in vertical cross section.
  9.  前記半導体素子は、前記筐体に対して、冷却素子に支持された状態で設けられている
     請求項1に記載の半導体装置。
    2. The semiconductor device according to claim 1, wherein said semiconductor element is provided in said housing while being supported by a cooling element.
  10.  半導体素子と、
     前記半導体素子の周囲を囲む周壁部を有し、前記半導体素子と電気的に接続された筐体と、
     前記半導体素子に対向するように設けられた透明部材と、
     前記周壁部に接合されるフランジ部、および前記フランジ部よりも前記半導体素子側に位置し、前記透明部材を支持する支持面部を有し、前記筐体および前記透明部材とともに前記半導体素子の周囲を気密空間とする枠部材と、を備えた
     半導体装置を有する
     電子機器。
    a semiconductor element;
    a housing having a peripheral wall surrounding the semiconductor element and electrically connected to the semiconductor element;
    a transparent member provided to face the semiconductor element;
    a flange portion joined to the peripheral wall portion; and a supporting surface portion positioned closer to the semiconductor element than the flange portion and supporting the transparent member, and surrounding the semiconductor element together with the casing and the transparent member. An electronic device having a semiconductor device, comprising: a frame member forming an airtight space.
  11.  半導体素子の周囲を囲む周壁部を有し、前記半導体素子と電気的に接続される筐体を準備する工程と、
     前記筐体の前記周壁部の内側に、前記半導体素子を前記筐体に対して電気的に接続した状態で設ける工程と、
     全体として枠状に構成され、周縁部にフランジ部を有し、前記フランジ部に対する凹部をなすとともに、前記凹部の底面部に開口部を有する枠部材を準備する工程と、
     前記枠部材を、前記周壁部に対して前記フランジ部を溶接により接合することで前記筐体に取り付ける工程と、
     前記枠部材の前記底面部上に、前記開口部を塞ぐように透明部材を設ける工程と、を含む
     半導体装置の製造方法。
    preparing a housing having a peripheral wall surrounding a semiconductor element and electrically connected to the semiconductor element;
    a step of providing the semiconductor element inside the peripheral wall portion of the housing in a state of being electrically connected to the housing;
    a step of preparing a frame member that is configured in a frame shape as a whole, has a flange portion on the peripheral edge portion, forms a recess for the flange portion, and has an opening on the bottom surface of the recess;
    a step of attaching the frame member to the housing by welding the flange portion to the peripheral wall portion;
    and providing a transparent member on the bottom surface of the frame member so as to block the opening.
PCT/JP2022/038198 2021-11-18 2022-10-13 Semiconductor device, electronic apparatus, and manufacturing method for semiconductor device WO2023090002A1 (en)

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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0536840U (en) * 1991-10-11 1993-05-18 新日本無線株式会社 Photoelectric conversion element
JP2000277648A (en) * 1999-03-29 2000-10-06 Hamamatsu Photonics Kk Semiconductor device
JP2006145610A (en) * 2004-11-16 2006-06-08 Shinko Electric Ind Co Ltd Package for housing optical component
WO2013027669A1 (en) * 2011-08-22 2013-02-28 京セラ株式会社 Optical semiconductor device
JP2017126673A (en) * 2016-01-14 2017-07-20 株式会社フジクラ Optical device and manufacturing method of optical device
WO2020026639A1 (en) * 2018-08-03 2020-02-06 ソニーセミコンダクタソリューションズ株式会社 Semiconductor device, imaging device, and method for manufacturing semiconductor device
JP2021166291A (en) * 2020-03-23 2021-10-14 日亜化学工業株式会社 Light emitting device

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0536840U (en) * 1991-10-11 1993-05-18 新日本無線株式会社 Photoelectric conversion element
JP2000277648A (en) * 1999-03-29 2000-10-06 Hamamatsu Photonics Kk Semiconductor device
JP2006145610A (en) * 2004-11-16 2006-06-08 Shinko Electric Ind Co Ltd Package for housing optical component
WO2013027669A1 (en) * 2011-08-22 2013-02-28 京セラ株式会社 Optical semiconductor device
JP2017126673A (en) * 2016-01-14 2017-07-20 株式会社フジクラ Optical device and manufacturing method of optical device
WO2020026639A1 (en) * 2018-08-03 2020-02-06 ソニーセミコンダクタソリューションズ株式会社 Semiconductor device, imaging device, and method for manufacturing semiconductor device
JP2021166291A (en) * 2020-03-23 2021-10-14 日亜化学工業株式会社 Light emitting device

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