Classifications

• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
  • C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
  • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
  • C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
  • B23B—TURNING; BORING
  • B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
  • B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
  • B23B27/148—Composition of the cutting inserts
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/24—Vacuum evaporation
  • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
  • C23C14/325—Electric arc evaporation
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
  • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
  • C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
  • C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
  • C23C28/42—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
  • C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
  • C23C28/44—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by a measurable physical property of the alternating layer or system, e.g. thickness, density, hardness
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
  • B23B—TURNING; BORING
  • B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
  • B23B2228/10—Coatings
  • B23B2228/105—Coatings with specified thickness
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
  • C23C14/0641—Nitrides

Definitions

• the present invention relates to a coated cutting tool comprising a nano-multilayer of (Ti,Si,M)N and (Ti,AI,M)N.
• Nano-multilayered coatings are commonly used in the area of cutting tools for metal machining. In these coatings at least two layers, which are different in some respect, alternate and form a coating of nanolayers.
• Metal machining operations include, for example, turning, milling, and drilling.
• a coated cutting tool such as an insert, should have high resistance against different types of wear, e.g., flank wear resistance, crater wear resistance, chipping resistance and flaking resistance.
• Different metal machining operations affect a coated cutting tool in different ways.
• EP2883637 discloses a nanolayer coating with alternating layer stacks, where a first layer stack having an average layer period thickness of 60-500 nm is alternated with a second layer stack having an average layer period thickness of 2-60 nm.
• average layer period thickness is meant the average thickness of a combination A-B in the nano-multilayer coating of a first nanolayer A and second nanolayer B in a nano-multilayer A-B-A-B-A...
• a calculation can be made from a TEM analysis of a cross-section of the nano-multilayer counting the number of consecutive A-B nanolayer combinations over a length of at least 200 nm and calculating an average value. In some cases, if the deposition process is known, the calculation can be made by dividing the total thickness of the nano-multilayer by the number of A-B depositions.
• the present invention relates to a coated cutting tool comprising a substrate and a nano-multilayer coating, wherein the coating comprises
• - a first layer stack and a second layer stack that is alternated at least twice, wherein -the first layer stack comprising alternating nanolayers A and B wherein the average layer period thickness of A+B is between 15 and 50 nm,
• nanolayer A is (Tii-a bAlaMb)N where 0.5 ⁇ a ⁇ 0.75, 0 ⁇ b ⁇ 0.10 and M is one or more elements selected from Cr, Zr, Nb, Mo, Ta and V.
• composition of nanolayer B is (Tii-c dSicMd)N where 0.10 ⁇ c ⁇ 0.25, 0 ⁇ d ⁇ 0.10 and M is one or more elements selected from Cr, Zr, Nb, Mo, Ta and V.
• the average layer period thickness of A+B is between 15 and 50 nm, preferably between 18 and 35 nm.
• the average layer period thickness of A+B is between 2 and 10 nm, preferably between 3 and 8 nm.
• the thickness of the first and second layer stack can be the same or different from each other.
• the thickness of the different first layer stacks in the nano-multilayer coating can either be the same for all first layer stacks or different. The same is valid for the thickness of the different second layer stacks which also can be the same or different.
• the thickness is between 50 and 1000 nm, preferably between 100 and 500 nm.
• the total number of stacks alternating, i.e. total sum of both first and second layer stacks, is at least 4, preferably between 6 and 50, more preferably between 8 and 30.
• the composition of the nanolayer A (Ti i- a -bAl a Mb)N is preferably 0.55 ⁇ a ⁇ 0.7, 0 ⁇ b ⁇ 0.10.
• the composition of the first nanolayer A (Tii- a -bAl a Mb)N is preferably 0.55 ⁇ a ⁇ 0.7, 0 ⁇ b ⁇ 0.05.
• the element M in nano layer A is Cr.
• the composition of the nanolayer B (Tii- c-dSi c Md)N is preferably 0.15 ⁇ c ⁇ 0.22 and 0 ⁇ d ⁇ 0.10.
• the composition of the nanolayer B (Tii- c -dSi c Md)N is preferably 0.15 ⁇ c ⁇ 0.22 and 0 ⁇ d ⁇ 0.05.
• the element M in nanolayer B is Cr.
• the composition of the nanolayer B (Tii- c -dSi c Md)N is preferably 0.15 ⁇ c ⁇ 0.22 and d-0.
• the nano-multilayer coating comprises a starting layer, between said substrate and the alternating first and second layer stacks.
• the starting layer has a thickness of between 0.2 and 2 pm, preferably between 0.5 and 1.5 pm.
• the composition is (Tii. a -bAl a Mb)N where 0.5 ⁇ a ⁇ 0.75, 0 ⁇ b ⁇ 0.10 and M is one or more elements selected from Cr, Zr, Nb, Mo, Ta and V.
• 0.55 ⁇ a ⁇ 0.7, 0 ⁇ b ⁇ 0.10, more preferably 0.55 ⁇ a ⁇ 0.7 and b 0.
• the composition of starting layer is the same as that of nanolayer A.
• the total thickness of the coating is between 1 and 10 pm, preferably between 1 and 7 pm, more preferably between 2 and 4 pm.
• the nano-multilayer coating is suitably deposited using a PVD process, preferably any of cathodic arc evaporation, magnetron sputtering or HIPIMS, more preferably cathodic arc evaporation.
• the substrate of the coated cutting tool can be selected from the group of cemented carbide, cermet, ceramic, cubic boron nitride and high speed steel.
• the substrate is a cemented carbide comprising from 5 to 18 wt% Co and from 0 to 10 wt% carbides, nitrides or carbonitrides of one or more elements of group 4 to 5 in the periodic table of elements.
• the coated cutting tool is suitably a cutting tool insert, a drill, or a solid end-mill, for metal machining.
• the cutting tool insert is, for example, a turning insert or a milling insert.
• Figure 1 is a schematic drawing of the nano-multilayer coating where 1 and 2 show the alternating first layer and second layer stacks, 3 is the starting layer, 4 is the nano layered coating and 5 is the substrate.
• Figure 2 shows a Scanning Electron Microscope (SEM) image of a coating according to the invention where 1 and 2 show the alternating first layer and second layer stacks, 3 is the starting layer, 4 is the nano layered coating and 5 is the substrate.
• SEM Scanning Electron Microscope
• Different nano-multilayers of (Ti,Si)N and (Ti,AI)N were deposited on sintered cemented carbide cutting tool insert blanks of the geometries CNMG120408MM and R390- 11.
• the composition of the cemented carbide was 10 wt% Co, 0.4 wt% Cr and rest WC.
• the cemented carbide blanks were coated by cathodic arc evaporation in a vacuum chamber comprising four arc flanges.
• Targets of Ti-Si were mounted in two of the flanges opposite each other.
• Targets of Ti-AI were mounted in the two remaining flanges opposite each other.
• the targets were circular and planar with a diameter of 100 mm available on the open market. Suitable target technology packages for arc evaporation are available from suppliers on the market such as IHI Hauzer Techno Coating B.V., Kobelco (Kobe Steel Ltd.) and Oerlikon Balzers.
• the uncoated blanks were mounted on pins that undergo a three-fold rotation in the PVD chamber.
• the chamber was pumped down to high vacuum (less than 10 -2 Pa) and heated to 450-550°C by heaters located inside the chamber.
• the blanks were then etched for 60 minutes in an Ar plasma.
• nano-multilayer coating having a thickness of about 2 pm was then deposited.
• the chamber pressure (reaction pressure) was set to 4 Pa of N2 gas, and a DC bias voltage of -50 V (relative to the chamber walls) was applied to the blank assembly.
• the cathodes were run in an arc discharge mode at a current of 150 A (each) for 75 minutes (4 flanges).
• Ti-Si targets being Ti0.s0Si0.20
• Ti-AI targets being Tio.33Alo.67
• Comparative 3 Tio.33Alo.67 and Ti0.50AI0.50 was used.
• the rotational speed correlates to a certain period thickness.
• a series of depositions of blanks were made using different table rotational speeds.
• the rotational speed, the estimated average nano layer period thickness and the layer stack thickness are given in Table 1.
• the cut-off criteria are chipping of at least 0.5 mm of the edge line or a measured depth of 0.2 mm at either the flank- or the rake phase. Tool life is presented as the number of cut entrances in order to achieve these criteria.
• Feed rate: f n 0.072 mm/rev
• the cut-off criteria for tool life is a flank wear VB of 0.15 mm.
• Feed rate: f z 0.2 mm/rev
• the criteria for end of tool life is a max. chipped height VB>0.3 mm.

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• Chemical & Material Sciences (AREA)
• Engineering & Computer Science (AREA)
• Mechanical Engineering (AREA)
• Chemical Kinetics & Catalysis (AREA)
• Materials Engineering (AREA)
• Metallurgy (AREA)
• Organic Chemistry (AREA)
• Inorganic Chemistry (AREA)
• Cutting Tools, Boring Holders, And Turrets (AREA)
• Physical Vapour Deposition (AREA)

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• 2021
  • 2021-10-20 EP EP21203745.1A patent/EP4170064A1/en active Pending
• 2022
  • 2022-10-17 CN CN202280069049.5A patent/CN118103550A/zh active Pending
  • 2022-10-17 JP JP2024523842A patent/JP2024538214A/ja active Pending
  • 2022-10-17 US US18/702,448 patent/US20250262673A1/en active Pending
  • 2022-10-17 KR KR1020247012502A patent/KR20240090189A/ko active Pending
  • 2022-10-17 WO PCT/EP2022/078779 patent/WO2023066840A1/en not_active Ceased

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