WO2023024746A1

WO2023024746A1 - Electronic atomization device and measurement method for consumption of matrix to be atomized of electronic atomization device

Info

Publication number: WO2023024746A1
Application number: PCT/CN2022/105779
Authority: WO
Inventors: 赵益华; 方伟明
Original assignee: 深圳麦克韦尔科技有限公司
Priority date: 2021-08-23
Filing date: 2022-07-14
Publication date: 2023-03-02
Also published as: CN115708599A

Abstract

An electronic atomization device and a measurement method for the consumption of a matrix to be atomized of the electronic atomization device. The method comprises: obtaining energy at different time periods, wherein the energy is energy applied to an atomizer (3), and the atomizer (3) is used for atomizing a matrix to be atomized (S1); obtaining a temperature at different time periods, wherein the temperature is a corresponding temperature of a heating body of the atomizer (3) under the energy (S2); and obtaining, according to the energy and the temperature, the consumption of the matrix to be atomized at phases (S3). According to the method, the real-time grasp of the atomization amount of an electronic atomization device is achieved by obtaining the consumption of a matrix to be atomized during atomization, such that a user can reasonably and sparingly use the electronic atomization device according to a real-time atomization amount, and an atomizer is prevented from burning due to absence of the matrix to be atomized so as to produce burnt smell to affect health.

Description

Electronic atomization device and method for detecting consumption of substrate to be atomized

Cross References to Related Applications

This application claims its priority based on the Chinese patent application 202110969951.X submitted on August 23, 2021, and its entire content is incorporated herein by reference.

【Technical field】

The present application relates to the field of atomization technology, in particular to an electronic atomization device and a consumption detection method of a substrate to be atomized.

【Background technique】

As an advanced aerosol delivery technology, nebulization inhalation technology has attracted more and more attention. It is necessary to ensure sufficient inhalation and prevent excessive intake during use. Therefore, it is very important to accurately measure the content of the inhaled aerosol during each atomization process. The existing electronic atomizers have no or less reminders on the dosage used and the remaining substrate to be atomized in the atomization chamber. ; Or the accuracy of its prompt is poor. At present, the relevant schemes for obtaining the dose consumption of the substrate to be atomized mainly include the following:

1. Based on the acquisition of suction time, the accuracy of this method is low;

2. Add an air pressure sensor to obtain the dose more accurately by detecting the suction airflow speed. Although this method has high accuracy, it needs to add an additional air pressure sensor, which increases the cost. At the same time, it has higher requirements for the battery structure and increases the battery volume of.

【Content of invention】

In view of this, the present application provides an electronic atomization device and a method for detecting the consumption of the substrate to be atomized, so as to solve the problems of low thermal efficiency and uneven heating of the atomization components in the prior art.

In order to solve the above technical problems, the first technical solution provided by the present application is to provide a method for detecting the consumption of the substrate to be atomized, including:

Acquiring energy in different periods, wherein the energy is the energy applied to the atomizer, and the atomizer is used to atomize the substrate to be atomized;

Obtaining the temperature in different periods, wherein the temperature is the temperature corresponding to the heating element of the atomizer under the energy;

The consumption of the substrate to be atomized at each stage is obtained according to the energy and the temperature.

Wherein, the step of obtaining the consumption of the substrate to be atomized at each stage according to the energy and the temperature comprises:

Obtaining the latent heat of atomization corresponding to the temperature, wherein the latent heat of atomization is the energy required for atomization of the unit substrate to be atomized at the temperature;

The consumption of the substrate to be atomized at a corresponding stage is obtained according to the energy and the latent heat of atomization.

Wherein, the step of obtaining the temperature by time intervals includes:

Obtain the current resistance value corresponding to the heating element;

The temperature is obtained according to the current resistance value.

Wherein, the step of obtaining the temperature according to the current resistance value further includes:

Acquiring the corrected resistance value according to the current resistance value and the resistance temperature curve corresponding to the previous puff;

The temperature is obtained according to the corrected resistance value.

Wherein, the latent heat of atomization includes the first latent heat of atomization and the second latent heat of atomization, and the first latent heat of atomization is the energy required for the atomization of the unit substrate to be atomized at different temperatures in the heating atomization stage, so The second latent heat of atomization is the energy required for the atomization of the unit to be atomized substrate in the constant temperature atomization stage;

The step of obtaining the consumption of the substrate to be atomized at the corresponding stage according to the energy and the latent heat of atomization includes:

In the heating up atomization stage, the consumption of the first substrate to be atomized is obtained according to the energy and the first atomization latent heat;

In the constant temperature atomization stage, the consumption of the second substrate to be atomized is obtained according to the energy and the second latent heat of atomization.

Wherein, the step of obtaining energy by time, and obtaining temperature by time includes:

harvesting the energy and the temperature at predetermined intervals in response to the temperature of the atomizer reaching an initial atomization temperature;

In the heating atomization phase, the consumption of the substrate to be atomized in the predetermined time period is obtained according to the energy in the predetermined time period and the first atomization latent heat;

In the constant temperature atomization stage, the consumption of the substrate to be atomized in the predetermined time period is obtained according to the energy in the predetermined time period and the second atomization latent heat.

Wherein, in the heating up atomization stage, the temperature of the atomizer at a predetermined time period is an average atomization temperature obtained from the highest atomization temperature and the minimum atomization temperature of the atomizer at a predetermined time.

obtaining a first energy and a first temperature of the heated atomization stage; and

Obtaining the second energy and the second temperature of the constant temperature atomization stage;

According to the first energy and the first latent heat of atomization, the consumption of the first substrate to be atomized in the whole temperature-rising atomization stage is obtained, wherein the first atomization latent heat is different temperatures in the temperature-rising atomization stage The energy required for the atomization of the substrate to be atomized per unit; and

According to the second energy and the second latent heat of atomization, the consumption of the second substrate to be atomized in the entire constant temperature atomization stage is obtained, wherein the second latent heat of atomization is the unit to be atomized in the constant temperature atomization stage The energy required for the atomization of the matrix.

Wherein, the second latent heat of atomization is obtained by the following method:

Obtaining the first consumption of the substance to be atomized to reach the constant temperature atomization stage at the first time of work;

weighing and measuring the second consumption of the substrate to be atomized to reach the constant temperature atomization stage at the second working time;

The second latent heat of atomization is divided by the difference between the energy applied to the atomizer during the second time and the first time, divided by the second consumption and the first consumption Quantity difference acquisition.

Wherein, the first latent heat of atomization is obtained by the following methods:

Obtain the average latent heat of atomization in the heating atomization stage;

The first latent heat of atomization is obtained according to the average latent heat of atomization, the second latent heat of atomization, and the resistance-time relationship of the heating up atomization stage.

Wherein, the average latent heat of atomization is obtained by the following method:

Obtaining the third consumption of the substrate to be atomized in the heating atomization stage;

The average latent heat of atomization is obtained by dividing the energy applied to the atomizer during the heating up atomization stage by the third consumption.

Wherein, after the step of obtaining the consumption of the substrate to be atomized at each stage according to the energy and the temperature, it further includes: obtaining the consumption of the substrate to be atomized in each stage according to the consumption of the substrate to be atomized at each stage, obtaining the The total consumption of the substrate to be atomized; wherein, the total consumption of the substrate to be atomized includes the consumption of the first substrate to be atomized and the consumption of the second substrate to be atomized.

In order to solve the above technical problems, the second technical solution provided by this application is to provide an electronic atomization device, including:

The controller includes an acquisition module for acquiring the consumption of the substrate to be atomized by the electronic atomization device; wherein, the method for the acquisition module to acquire the consumption of the substrate to be atomized by the electronic atomization device is any one of the above method described in the item.

Wherein, the electronic atomization device further includes: a memory for storing characteristic information of the atomizer of the electronic atomization device; wherein, the characteristic information includes the initial mass of the substance to be atomized by the atomizer; Wherein, the controller is further configured to acquire the remaining quantity of the substance to be atomized in the atomizer according to the initial mass of the substance to be atomized and the consumption amount of the substance to be atomized.

Beneficial effects of the present application: Different from the prior art, the present application discloses an electronic atomization device and its consumption detection method of the substrate to be atomized. The consumption detection method of the substrate to be atomized includes: According to the energy of the atomizer, the corresponding temperature of the heating element of the atomizer under the energy is obtained in time intervals; the consumption of the substrate to be atomized at each stage is obtained according to the energy and the temperature. The above method achieves real-time control of the atomization amount of the electronic atomization device by obtaining the consumption of the substrate to be atomized during the atomization process, so that the user can use the electronic atomization device reasonably and sparingly according to the real-time atomization amount , to prevent the atomizer from burning the atomized substrate without burning, which will affect health.

【Description of drawings】

In order to more clearly illustrate the technical solutions of the embodiments of the present application, the following will briefly introduce the accompanying drawings that need to be used in the description of the embodiments. Obviously, the accompanying drawings described below are only some embodiments of the present application. Those of ordinary skill in the art can also obtain other drawings based on these drawings without any creative effort.

Fig. 1 is a schematic structural block diagram of an electronic atomization device provided by the present application;

Fig. 2 is a schematic block diagram of the internal structure of the controller of the electronic atomization device provided by the present application;

Fig. 3 is a schematic flow chart of the consumption detection method of the substrate to be atomized provided by the present application;

Fig. 4 is a schematic flow chart of a specific embodiment of step S3 in the consumption detection method of the substrate to be atomized provided in Fig. 3;

Fig. 5 is a schematic flow chart of a specific embodiment of step S32 in the consumption detection method of the substrate to be atomized provided in Fig. 4;

Fig. 6 is a schematic flow diagram of a specific embodiment of the consumption detection method of the substrate to be atomized provided in Fig. 3;

Fig. 7 is a schematic flow chart of a specific embodiment of step S2 in the consumption detection method of the substrate to be atomized provided in Fig. 3;

Fig. 8 is a schematic flowchart of a specific embodiment of step S21 in the consumption detection method of the substrate to be atomized provided in Fig. 7;

Fig. 9 is a schematic flowchart of another specific embodiment of the consumption detection method of the substrate to be atomized provided in Fig. 3;

Fig. 10 is a schematic flow diagram of the application obtaining the _second latent heat of atomization X in the constant temperature atomization stage;

Fig. 11 is a schematic flow diagram of the application obtaining the first latent heat of atomization _X1 in the heating atomization stage;

Fig. 12 is the schematic flow sheet that the application obtains the average latent heat of atomization X ₃ in the heating atomization stage;

Fig. 13 is a schematic flow diagram of obtaining the third consumption amount M3 of the atomized substrate to be tested in the heating atomization stage of the present application;

Fig. 14 is a resistance-time variation curve of the heating element of the atomizer.

【Detailed ways】

The following will clearly and completely describe the technical solutions in the embodiments of the present application with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of them. Based on the embodiments in this application, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the scope of protection of this application.

The terms "first" and "second" in this application are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly specifying the quantity of indicated technical features. Thus, a feature defined as "first", "second", may explicitly or implicitly include at least one of the features. All directional indications (such as up, down, left, right, front, back...) in the embodiments of the present application are only used to explain the relative positional relationship between the various components in a certain posture (as shown in the drawings) , sports conditions, etc., if the specific posture changes, the directional indication also changes accordingly. Furthermore, the terms "include" and "have", as well as any variations thereof, are intended to cover a non-exclusive inclusion. For example, a process, method, system, product or device comprising a series of steps or units is not limited to the listed steps or units, but optionally also includes unlisted steps or units, or optionally further includes For other steps or units inherent in these processes, methods, products or apparatuses.

Reference herein to an "embodiment" means that a particular feature, structure, or characteristic described in connection with the embodiment can be included in at least one embodiment of the present application. The occurrences of this phrase in various places in the specification are not necessarily all referring to the same embodiment, nor are separate or alternative embodiments mutually exclusive of other embodiments. It is understood explicitly and implicitly by those skilled in the art that the embodiments described herein can be combined with other embodiments.

Please refer to FIG. 1 to FIG. 2 , FIG. 1 is a schematic structural block diagram of the electronic atomization device provided by the present application, and FIG. 2 is a schematic block diagram of the internal structure of the controller in the electronic atomization device provided by the present application.

The electronic atomization device includes a controller 1 , a memory 2 , an atomizer 3 and a battery 4 .

The atomizer 3 can be used for the atomization of liquid substrates. The atomizer 3 includes a housing, an atomizing seat, an atomizing core, and the like. The atomizing core includes a porous liquid-conducting matrix and a heating element. Specifically, the heating element can use a heating element with a large TCR (temperature coefficient of resistance), and the controller 1 detects and controls the resistance of the heating element to realize the detection and control of the atomization temperature of the atomization chamber.

The controller 1 is used to control the work of the atomizer 3 and obtain the consumption of the substance to be atomized by the electronic atomization device, etc., and the memory 2 is used to store the characteristic information of the atomizer 3 of the electronic atomization device; The initial quality of the substrate to be atomized by the atomizer 3, and the memory 2 can also store information such as the characteristic ID code of the atomizer 3.

The controller 1 can also obtain the characteristic information of the atomizer 3, and obtain the remaining amount of the substance to be atomized in the atomizer 3 according to the initial mass of the substance to be atomized and the consumption of the substance to be atomized in the atomizer 3, so as to remind and Information such as the consumed amount of the substrate to be atomized and the remaining amount of the substrate to be atomized in the nebulizer 3 is displayed, so that the user can know the specific usage data at any time.

The controller 1 includes an acquisition module 10 , a reminder module 11 and a cutoff module 12 . The obtaining module 10 is used to obtain the consumption amount and the remaining amount of the substrate to be atomized of the electronic atomization device. The reminder module 11 is used for reminding when the remaining amount of the substance to be atomized in the nebulizer 3 is less than or equal to the first preset threshold. The cut-off module 12 is used to perform a cut-off operation when the remaining amount of the substance to be atomized in the atomizer 3 is less than or equal to the second preset threshold, so as to stop the atomization, so as to prevent the atomizer 3 from drying out due to insufficient substance to be atomized. Burnt smell, affecting health. The electronic atomization device can also include an indicator light, etc., which are electrically connected to the reminder module 11, and the indicator light flashes, and cooperates with the reminder module 11 to remind the remaining amount of the substrate to be atomized.

Wherein, the first preset threshold is greater than the second preset threshold. The first preset threshold and the second preset threshold can be set according to the actual use needs. Once the consumption of the substance to be atomized is greater than the preset threshold, it will be reminded or cut off, which improves the safety of use and maximizes the Protect the health of users. The first preset threshold and the second preset threshold may be specific numerical values or percentages.

The existing electronic atomizer 3 has no or less prompts for the used dose and/or the remaining substance to be atomized in the atomization chamber; or the prompt for the dosage of the substance to be atomized is either poor in accuracy, or has a complex structure and low cost. higher.

For this reason, the application provides a method for detecting the consumption of the substrate to be atomized, which uses the principle of energy conservation in the process of heating and atomizing to obtain the consumption of the substrate to be atomized during the atomization process, and calculates the consumption of the substrate to be atomized. The consumption detection method is applied to the electronic atomization device.

Referring to Fig. 14, Fig. 14 is a resistance-time variation curve of the heating element of the nebulizer. Since the heating element of the atomizer 3 of the present application has a TCR (temperature coefficient of resistance) characteristic, Fig. 14 actually reflects the atomization temperature-time variation curve of the atomizer. Please refer to Figure 14, the abscissa is time, and the ordinate is the resistance AD value. The temperature of the heating element can be calculated from the resistance AD value, specifically: the higher the temperature of the metal conductor, the greater the resistance, and the lower the temperature, the smaller the resistance. It can be understood that in other embodiments, a special temperature sensor can also be provided to directly obtain the atomization temperature-time relationship diagram of the atomizer 3 .

Referring to Fig. 14, this application divides an atomization process into three stages: non-atomization stage, heating atomization stage and constant temperature atomization stage. In the early stage of pumping the electronic atomization device, the temperature of the heating element is low, and all the energy is used to heat up the substrate to be atomized. At this stage, the atomization process has not yet been carried out, so there is no consumption of the substrate to be atomized, and it is fog-free stage. When the temperature of the substrate to be atomized reaches the temperature value of the atomization point, atomization starts to occur. At this time, part of the energy supplied by the battery 4 is used to continue heating the substrate to be atomized by the atomizer 3, and a part is used for atomization of the substrate to be atomized. , that is, the heating atomization stage. Further, when the energy supplied by the battery 4 and the energy consumed by the atomization reach a balance state, the temperature will remain constant, and the amount of atomization will also maintain a stable level at this time, that is, the constant temperature atomization stage.

Based on the above characteristics and the law of energy conservation, the electronic atomization device can obtain the consumption of the substance to be atomized by obtaining the energy supply and measuring the energy value required for the atomization of the substance to be atomized at a specific temperature.

Since the consumption of the substrate to be atomized in the non-atomization stage is 0, to obtain the consumption of the substrate to be atomized during the process of inhaling a mouthful of the electronic atomization device by the user, it is only necessary to obtain the temperature-rising atomization stage and the constant temperature atomization stage Just wait for the consumption of the atomized substrate. Therefore, the present application specifically divides the consumption process of the substance to be atomized by sucking a mouthful of the electronic atomization device into two stages: the heating atomization stage and the constant temperature atomization stage. Then, the total consumption of the substrate to be atomized by taking one mouthful of the electronic atomization device is the sum of the amounts of the substrate to be atomized that are consumed in the heating up atomization stage and the constant temperature atomization stage.

It should be noted that not every time the user inhales the electronic atomization device, he needs to go through the three stages of no atomization, heating up atomization, and stable atomization. The time elapsed after a mouthful of the electronic atomization device is related to the ambient temperature of the user. Specifically, at normal temperatures, if the user takes a puff of the electronic atomization device and then takes a second puff (usually for a few seconds), the temperature of the electronic atomization device may still be stable. stage. If the ambient temperature is very low, when the user takes a puff of the electronic atomization device and takes a second puff at intervals of a few seconds, the electronic atomization device may need to heat the atomization again from the heating atomization stage. If the user takes a second puff after inhaling an electronic atomization device, after an interval of tens of minutes or hours, the electronic atomization device will experience no atomization, heated atomization and stable atomization again. three phases.

The present application obtains the latent heat of atomization of the electronic atomization device through experiments and stores it in the memory 2 . When the electronic atomization device is working, the consumption of the substance to be atomized can be obtained according to the energy output of the battery 4, the temperature of the atomizer 3, and the latent heat of atomization corresponding to the temperature of the atomizer 3.

Please refer to FIG. 3 for details. FIG. 3 is a schematic flowchart of the method for detecting the consumption of the substrate to be atomized provided by the present application.

A consumption detection method of a substrate to be atomized, specifically comprising:

S1: Obtain energy Q in different periods, where energy Q is the energy Q applied to the atomizer 3, and the atomizer 3 is used to atomize the substrate to be atomized;

S2: Obtain the temperature T in different periods, where the temperature T is the corresponding temperature T of the heating element of the atomizer 3 under the energy Q;

S3: Obtain the consumption of the substrate to be atomized at each stage according to the energy Q and the temperature T.

In steps S1 and S2, the energy Q is obtained by time intervals, and the temperature T is obtained by time intervals. "Division by time" can be understood as the process of dividing the pumping of the electronic atomization device according to different time intervals, or it can be understood as the Start the process of heating without atomization, the process of heating atomization and the process of constant temperature atomization, and the process of atomizing the substrate to be atomized when inhaling an electronic atomization device. "Acquiring energy Q by time period" refers to obtaining the energy supplied by the battery 4 to the atomizer 3 during this period, which is also the energy Q output by the battery 4 to the atomizer 3 . "Temperature T obtained by time period" refers to obtaining the corresponding temperature T of the heating element of the atomizer 3 under the energy Q. The atomization temperature T can be the atomization temperature T of the heating atomization process or the atomization temperature T of the constant temperature atomization process, and the temperature T includes the surface temperature, internal temperature and average temperature of the heating element of the atomizer 3 . Specifically, you can choose according to the actual situation, as long as you ensure that the temperature obtained multiple times before and after is the same type of parameter. Referring to Fig. 14, the atomization temperature T in the temperature-rising atomization process is a variable that changes with time, and the atomization temperature T in the constant temperature atomization process is basically a constant value.

In step S3, according to the period of obtaining the energy Q applied by the battery 4 to the atomizer 3 and the temperature T of the heating element of the atomizer 3 divided by the previous steps, the consumption of the substance to be atomized at each stage can be calculated.

Specifically, in order to obtain the consumption of the substrate to be atomized at each stage, this application introduces the latent heat of atomization X, wherein the latent heat of atomization X can be obtained through experiments in advance and stored in the memory 2, and the controller 1 passes the atomization of the atomizer 3 Find or obtain the latent heat of atomization X corresponding to the temperature T of the heating element, and then obtain the consumption of the substance to be atomized during the atomization process according to the energy Q applied by the battery 4 to the atomizer 3 and the corresponding latent heat of atomization X, The method is simple, quick and has high accuracy.

In one embodiment, please refer to FIG. 4 . FIG. 4 is a schematic flowchart of a specific embodiment of step S3 in the method for detecting the consumption of the substrate to be atomized provided in FIG. 3 . The steps of obtaining the consumption of the substrate to be atomized at each stage according to the energy Q and the temperature T include:

S31: Obtain the latent heat of atomization X corresponding to the temperature T, where the latent heat of atomization X is the energy Q required for atomization per unit of the substrate to be atomized at the temperature T;

S32: According to the energy Q and the latent heat of atomization X, the consumption of the substrate to be atomized in the corresponding stage is acquired.

In step S3, if an atomization process includes a temperature-rising atomization process and a constant-temperature atomization process at the same time, for example, the first suction or another suction after stopping the suction for a long time, it is necessary to obtain the temperature-rising atomization process separately. The consumption of atomized substrate and the consumption of the substrate to be atomized in the constant temperature atomization process, because the latent heat of atomization X in the temperature rise atomization process and the constant temperature atomization process are different, and the atomization latent heat X in the temperature rise atomization process varies with temperature changes, while the atomization latent heat X of the constant temperature atomization process is a constant value.

Specifically, the latent heat of atomization X includes the first latent heat of atomization X ₁ and the second latent heat of atomization X ₂ , the first latent heat of atomization X ₁ is required for the atomization of the unit to be atomized substrate at different temperatures in the heating atomization stage The energy of the second atomization latent heat X ₂ is the energy required for the atomization of the unit to be atomized substrate in the constant temperature atomization stage.

Please refer to FIG. 5 , which is a schematic flowchart of a specific embodiment of step S32 in the method for detecting the consumption of the substrate to be atomized provided in FIG. 4 . The step of obtaining the consumption of the substrate to be atomized at the corresponding stage according to the energy Q and the latent heat of atomization X. Specifically include:

S321: In the heating up atomization stage, obtain the consumption of the first substrate to be atomized according to the energy Q and the first atomization latent heat _X1 ;

S322: In the constant-temperature atomization stage, acquire the consumption of the second substrate to be atomized according to the energy Q and the second atomization latent heat X ₂ .

In step S321, since the first atomization latent heat X ₁ of the temperature-rising atomization process varies with temperature, the consumption of the substrate to be atomized during the temperature-rising atomization process can be obtained by integral or stage-by-stage accumulation.

In step S322, since the second atomization latent heat _X2 of the constant temperature atomization process is a constant value, the consumption of the substrate to be atomized in the constant temperature atomization process can be divided by the energy Q of the constant temperature atomization process divided by the atomization rate of the constant temperature atomization process Latent heat X is obtained directly.

If an atomization process only includes a constant temperature atomization process, such as continuous suction for multiple mouths, and the temperature of the atomizer 3 has not dropped below the temperature of the constant temperature atomization during the next suction, the atomization during the next suction The temperature is a constant value, and to obtain the consumption of the substrate to be atomized in the next puff, only the consumption of the substrate to be atomized during the constant temperature atomization process needs to be considered.

According to the difference in the time period for obtaining the energy Q applied by the battery 4 to the atomizer 3 and the temperature T of the heating element of the atomizer 3 , the consumption detection method of the substance to be atomized in the present application may include the following specific embodiments.

In one embodiment, please refer to FIG. 6 . FIG. 6 is a schematic flowchart of a specific embodiment of the method for detecting the consumption of the substrate to be atomized provided in FIG. 3 . In step S1 and step S2, the step of obtaining energy Q by time period, and obtaining temperature T by time period includes:

S1A, in response to the temperature T of the heating element of the atomizer 3 reaching the initial atomization temperature T ₀ , acquiring energy Q and temperature T every predetermined time;

In step S32, the step of obtaining the consumption of the substrate to be atomized at the corresponding stage according to the energy Q and the latent heat of atomization X includes:

S321A, in the heating up atomization stage, acquire the consumption of the substrate to be atomized in the predetermined time period according to the energy Q in the predetermined time period and the first atomization latent heat _X1 ;

S322A, in the constant temperature atomization stage, acquire the consumption of the substrate to be atomized in the predetermined time period according to the energy Q in the predetermined time period and the second atomization latent heat X ₂ .

In step S1A, since the atomization temperature T of the electronic atomization device is in the heating and atomization stage, the atomization temperature T is a variable that changes with time. Therefore, in this embodiment, the temperature T of the atomizer 3 at a predetermined time is according to the temperature T of the atomizer 3 The average atomization temperature obtained from the highest atomization temperature and the lowest atomization temperature at a predetermined time.

Under the condition that the electronic atomization device is heated, data is collected every predetermined time. Optionally, the predetermined time is 5-20 milliseconds, the collection interval can be selected according to needs, and the number of collections is related to the collection interval and the duration of one puff of the user. The initial atomization temperature T ₀ of the atomizer 3 is the temperature at which the substrate to be atomized by the atomizer 3 is at least partially atomized. In an embodiment of the present application, the initial atomization temperature T ₀ of the atomizer 3 is 200°C. When the temperature of the heating element reaches 200°C, part of the substrate to be atomized begins to be atomized; every 10 milliseconds, a battery 4 The energy Q applied to the atomizer 3 and the temperature T of the heating element of the atomizer 3, in order to ensure the accuracy of the collection temperature, the temperature T adopts the highest temperature atomization degree and the lowest atomization temperature in the current collection temperature range The average atomization temperature obtained. In other possible embodiments, the initial atomization temperature T ₀ may also be other temperatures, which vary according to different substrates to be atomized, and the collection interval may be selected according to actual needs. When the composition of the substrate to be atomized by the atomizer 3 is determined, the initial atomization temperature T ₀ of the atomizer 3 is also determined. The controller 1 can acquire the initial atomization temperature T ₀ of the atomizer 3 from the memory 2 according to the ID information of the atomizer 3 .

The time for taking a puff of the electronic atomization device, that is, the time for one atomization of the electronic atomization device is generally 3-6s.

In step S321A, since the corresponding table or functional relationship between the first atomization latent heat X ₁ and the temperature T is stored in the memory 2 in advance, the first atomization temperature corresponding to the temperature T in the predetermined time period can be obtained by looking up the table method or the formula acquisition method. Latent heat X ₁ . By dividing the energy Q in the predetermined time period by the first atomization latent heat X ₁ corresponding to the temperature T in the predetermined time period, the consumption of the substrate to be atomized in the predetermined time period can be obtained. In the same way, the consumption of the substrate to be atomized in each predetermined time period can be obtained during the temperature-rising atomization stage.

In step S322A, by dividing the energy Q in the predetermined time period by the second atomization latent heat X ₂ , the consumption of the substrate to be atomized in the predetermined time period can be obtained. In the same way, the consumption of the substrate to be atomized in each predetermined time period in the constant temperature atomization stage can be obtained.

It should be noted that, here, the consumption of substrates to be atomized can be obtained by adding up the consumption of substrates to be atomized in the heating atomization stage or constant temperature atomization stage for each observation predetermined time to obtain the respective substrates to be atomized Total consumption. It is also possible to only obtain the consumption of the substance to be atomized for each scheduled observation time in the heating atomization stage or the constant temperature atomization stage, and add them together at the end to obtain the total consumption of the substance to be atomized by pumping an electronic atomization device .

In one embodiment, please refer to FIG. 7 . FIG. 7 is a schematic flowchart of a specific embodiment of step S2 in the method for detecting the consumption of the substrate to be atomized provided in FIG. 3 . Specifically, the steps for obtaining the temperature in different periods include:

S21: Obtain the current resistance value corresponding to the heating element;

S22: Obtain the temperature T according to the current resistance value.

Specifically, in practical applications, the corresponding temperature value is obtained by collecting the resistance value of the atomizer 3 , and the temperature value cannot be obtained directly. In this embodiment, before obtaining the temperature T, it is first necessary to obtain the current resistance value corresponding to the heating element, and infer the temperature T of the heating element under the current situation according to the resistance value of the heating element during the operation of the battery 4, so as to judge the atomization at this moment The working state of device 3 (no atomization state, heating atomization state or stable atomization state). And the resistance curve is also used as the basis for judging the working state of the next atomization puff.

Please refer to FIG. 8 . FIG. 8 is a schematic flowchart of a specific embodiment of step S21 in the method for detecting the consumption of the substrate to be atomized provided in FIG. 7 . The step of obtaining the temperature T according to the current resistance value also includes:

S211: Obtain the corrected resistance value according to the current resistance value and the resistance-temperature curve corresponding to the previous puff;

S212: Obtain the temperature T according to the corrected resistance value.

The resistance value will change during use, so it needs to be corrected. Specifically, since the resistance value of the atomizer 3 will wear out with time, but the temperature point for stable atomization is basically fixed, so the resistance value-temperature relationship can be corrected accordingly. As the number of uses increases, the resistance value corresponding to reaching thermal equilibrium will increase. According to the historical data, the relationship between resistance and temperature is properly corrected, and at the same time, the latent heat of atomization X corresponding to the temperature T is properly corrected.

Exemplarily, suppose that the resistance value sampled when the thermal balance is reached for the first time is 20 ohms, and the corresponding thermal balance temperature is 210 degrees Celsius, and the resistance value sampled when the thermal balance is reached for the fifth time is 22 ohms, that is, the corresponding thermal balance temperature is 210 degrees Celsius, then when the fifth sampling reaches 20 ohms, the corresponding atomization latent heat X needs to be corrected, otherwise an error will occur.

In another embodiment, the energy Q and the temperature T are obtained respectively during the entire temperature-rising atomization stage and the entire constant-temperature atomization stage.

Please refer to FIG. 9 and FIG. 14 . FIG. 9 is a schematic flowchart of another specific embodiment of the method for detecting the consumption of the substrate to be atomized provided in FIG. 3 . The consumption detection method of the substrate to be atomized specifically includes:

S11B: Obtain the first energy Q ₁ and the first temperature T ₁ in the heating atomization stage;

S12B: Obtain the second energy Q ₂ and the second temperature T ₂ in the constant temperature atomization stage;

The steps of obtaining the consumption of the substrate to be atomized at the corresponding stage according to the energy Q and the latent heat of atomization X include:

S21B: According to the first energy Q ₁ and the first atomization latent heat X ₁ , obtain the consumption of the first substrate to be atomized during the entire heating and atomization stage, where the first atomization latent heat X ₁ is The energy required for the atomization of the unit to be atomized substrate at different temperatures in the stage;

S22B: According to the second energy Q ₂ and the second atomization latent heat X ₂ , the consumption of the second substrate to be atomized in the entire constant temperature atomization stage is obtained, wherein the second atomization latent heat X ₂ is the constant temperature atomization of the electronic atomization device The energy required for the atomization of the unit to be atomized substrate in the stage.

In steps S11B and S12B, the first temperature _T1 is a variable of time t, and the second temperature _T2 is a constant value. The first energy _Q1 and the second energy _Q2 can be obtained from the output power p and output time t of the battery 4 . For the convenience of understanding, it can be assumed that the conversion rate of electric energy to heat energy is 100%. If the control signal is a PWM signal, the energy supply here can be carried out according to the method of Q=pt=U ² /R×duty ratio×t Obtain, R is the resistance value of the heating element. In an embodiment of the present application, the battery 4 is directly driven to output a constant power p, and the constant power p multiplied by the output time t is the energy supplied by the battery 4 during this period. In another embodiment of the present application, the driving output power p of the battery 4 is a time variable, and it is necessary to obtain the energy output by the battery 4 during this period of time by means of integration.

In step S21B, the instantaneous energy of the battery 4 can be expressed as pt, and the instantaneous atomization amount of the atomizer 3 is (p×d(t))/X ₁ . Since the latent heat of atomization _X1 in the heating atomization stage is a variable of temperature _T1 , and temperature _T1 is a variable of time t, therefore, _X1 is also a variable of time t. That is, the instantaneous atomization amount of the atomizer 3 is (p×d(t))/X ₁ is only a variable of time t. By integrating the instantaneous atomization amount of the atomizer 3 as (p×d(t))/X ₁ in the entire temperature-rising atomization stage, the consumption amount of the first substrate to be atomized during the entire temperature-rising atomization stage can be directly obtained.

In step S22B, the second energy _Q2 can be obtained from the output power p and output time t of the battery 4 . For example, p is multiplied by the duration t of the constant temperature atomization phase. By dividing the second energy Q ₂ by the second latent heat of atomization X ₂ , the consumption of the second substance to be atomized by the electronic atomization device in the entire constant temperature atomization stage is obtained.

The method for obtaining the first latent heat of atomization X ₁ and the second latent heat of atomization X ₂ provided by the present application is introduced below. In the present application, the first latent heat of atomization X ₁ and the second latent heat of atomization X ₂ of the electronic atomization device are obtained by collecting working parameters of the electronic atomization device to be tested and weighing measurement. See below for details:

In an embodiment of the present application, please refer to FIG. 10. FIG. 10 is a schematic flow diagram of obtaining the second latent heat of atomization _X2 in the constant temperature atomization stage of the present application, specifically including:

M1: Let the electronic atomization device to be tested reach the constant temperature atomization stage as soon as it starts working at room temperature, and weigh and measure the first consumption of the substance to be atomized M1;

M2: Make the electronic atomization device to be tested start working from room temperature and reach the constant temperature atomization stage for a second time, and weigh and measure the second consumption M2 of the substance to be atomized;

M3: According to the formula X ₂ =Q ₂ '/(M2-M1), the second latent heat of atomization X ₂ is equal to Q ₂ ' divided by the difference between the second consumption M2 and the first consumption M1 to obtain the second latent heat of atomization X ₂ , wherein, Q ₂ ′ is the energy difference of the battery 4 when the electronic atomization device to be tested works for the second time and the first time respectively.

Specifically, the second latent heat of atomization X ₂ is obtained according to the formula X ₂ =Q ₂ '/(M2-M1), that is to say, the second latent heat of atomization X ₂ is equal to Q ₂ ' divided by the second consumption M2 and the second A difference in consumption M1, that is, by dividing the difference in energy output in the two heating processes by the difference in the consumption of the substrate to be atomized in the two heating processes, it can be obtained that the electronic atomization device in the constant temperature atomization stage is The unit of temperature T is the energy required for the atomization of the substrate to be atomized, that is, the second latent heat of atomization X ₂ .

In steps M1-M2, the electronic atomization device to be tested can also start to work at a temperature other than room temperature, as long as the temperature at which the test is started is not higher than the initial atomization temperature. In addition, the electronic atomization device to be tested may be an electronic atomization device specially used for testing, or an electronic atomization device that will be sold soon. If the electronic atomization device to be tested is an electronic atomization device that is about to be sold, it is necessary to write the substrate to be atomized during the test into memory 2 or replace the substrate to be atomized during the test after the test is completed. together.

In step M2, the electronic atomization device to be tested in step M1 can be operated from room temperature for a second time, or another electronic atomization device to be tested that is exactly the same as the electronic atomization device to be tested in step M1 can be used for testing.

Please refer to FIG. 11 . FIG. 11 is a schematic flow chart of the present application for obtaining the first latent heat of atomization _X1 in the stage of heating up and atomizing. On the basis of obtaining the second latent heat of atomization _X2 , the first latent heat of atomization _X1 can be specifically obtained by the following method:

M4: Obtain the average atomization latent heat X ₃ of the electronic atomization device to be tested during the heating atomization stage;

M5: Obtain the first latent heat of atomization X ₁ according to the average latent heat of atomization X ₃ , the second latent heat of atomization X ₂ , and the resistance-time curve of the electronic atomization device to be tested during the heating and atomization stage.

Please refer to FIG. 12 . FIG. 12 is a schematic flow chart of the present application for obtaining the average latent heat of atomization X ₃ in the heating up atomization stage. Specifically, the average latent heat of atomization X ₃ in the heating atomization stage is obtained by the following method:

M51: Obtain the third consumption amount M3 of the substance to be atomized in the heating atomization stage of the electronic atomization device to be tested;

M52: Obtain the average latent heat of atomization X ₃ according to the formula X ₃ =Q ₁ ′/M3, wherein, Q ₁ ′ is the energy of the battery 4 of the electronic atomization device under test during the heating and atomization stage.

Same as the specific description in step M3 above, the average latent heat of atomization X ₃ is obtained according to the formula X ₃ =Q ₁ ′/M3, that is, X ₃ is equal to Q ₁ ′ divided by the third consumption M3, that is, the temperature rise atomization The total energy of the battery 4 in the stage is divided by the total consumption of the substrate to be atomized in the heating atomization stage (ie the third consumption M3), and the average latent heat of atomization X ₃ at the temperature T in the heating atomization stage is obtained.

Further, please refer to FIG. 13 . FIG. 13 is a schematic flow chart of the present application for obtaining the third consumption amount M3 of the substrate to be atomized in the temperature-rising atomization stage to be tested. The steps of the third consumption M3 of the substrate to be atomized by the electronic atomization device to be tested in the heating atomization stage include:

M511: According to the first consumption amount M1, the second consumption amount M2, the first time and the second time in the constant temperature atomization stage, obtain the consumption amount M4 of the substance to be atomized per unit time in the constant temperature atomization stage of the electronic atomization device to be tested .

Specifically, M4 is equal to the difference between the second consumption amount M2 and the first consumption amount M1, divided by the difference between the second time and the first time, that is, M4=(M2-M1)/(second time-first time );

M512: According to the first consumption amount M1, the second consumption amount M2 of the constant temperature atomization stage, the consumption amount of the substrate to be atomized per unit time M4, and the duration C of the electronic atomization device to be tested in the constant temperature atomization stage, the Matrix third consumption M3.

Specifically, M3=M1-M4×C1, that is, the third consumption amount M3 is the difference between the first consumption amount M1 and the consumption amount of the substrate to be atomized in the duration C1 stage, and the consumption amount of the substrate to be atomized in the duration C1 stage It is the consumption of the substrate to be atomized M4 per unit time multiplied by the duration C1, or M3=M2-M4×C2, that is, the third consumption M3 is the consumption of the substrate to be atomized in the stage of the second consumption M2 and the duration C2 The difference, the consumption of the substrate to be atomized in the duration C2 stage is the consumption of the substrate to be atomized M4 per unit time multiplied by the duration C2, where C1 is the duration of the first time of the work to be tested in the constant temperature atomization stage , C2 is the duration of the second time of the work to be tested in the constant temperature atomization stage.

Exemplarily, as shown in Figure 14, the first consumption M1 of the constant temperature atomization stages A' to B (the corresponding temperature T is 250°C) is obtained through observation and detection, and the time A is obtained by X=Q/M1 The latent heat of atomization X from 'to B is 100J/g, and the second consumption M2 of the constant temperature atomization stage B to C (the corresponding temperature T is 250°C) is obtained through observation and detection, which can be obtained by X=Q/M2 The latent heat of atomization X from time B to C is 100 J/g, where B>A', A'>A, and A, A' and B are all time points. It can be determined that the latent heat of atomization X ₂ in the constant temperature atomization stage is 100J/g.

On the basis of obtaining the second latent heat of atomization _X2 , the first latent heat of atomization _X1 can be specifically obtained by the following method:

Firstly, the average latent heat of atomization X ₃ in the heating atomization stage is obtained according to the average atomization latent heat X 3 ₌ Q _{1 ′} /M3, wherein, Q ₁ ′ is the energy of the battery 4 to be tested in the heating atomization stage, and M3 is the heating atomization The third consumption of the substrate to be atomized in the stage.

Specifically, through observation and detection, the temperature T of the heating atomization stage A is 200°C, and the temperature T of A' is 250°C, assuming that the average atomization latent heat X ₃ =Q ₁ of the heating atomization stage A to A' here '/M3=150J/g, and according to the above content, it can be known that the latent heat of atomization _X2 of A' is 100J/g, using the method of the average value, the latent heat of atomization X=(150×2- 100) J/g=200J/g, that is, the latent heat of atomization at 200°C is 200J/g. Using the linear method, it can be obtained that: the first latent heat of atomization X ₁ =a×T+b. Among them, T is the temperature value corresponding to the first atomization latent heat X ₁ , a and b are constants, and can be atomized by substituting the latent heat of atomization at the temperature of A at 200°C is 200J/g, and the temperature of A' at 250°C The latent heat is 100J/g to obtain the specific values of a and b (such as a=-2, b=600 here), and the linear function of the first atomization latent heat X ₁ and temperature T is obtained: the first atomization latent heat X ₁ =(-2)×T+600, from which the latent heat at other temperature points can be obtained, for example, the latent heat at 230°C is 140J/g. In other embodiments of the present application, the average latent heat of atomization X ₃ in the temperature-rising atomization stages A to A' may also be other values according to specific circumstances. At the same time, in addition to using the above-mentioned linear function to represent the relationship between the first latent heat of atomization X ₁ and the temperature T, the first latent heat of atomization X ₁ can also be calculated according to the heating curve fitting, so that the result is more in line with the actual situation. Here, It is not limiting.

In the two embodiments of the present application, after the step of obtaining the consumption of the substrate to be atomized at each stage according to the energy Q and the temperature T, it may also include:

S4: Obtain the total consumption of the substrate to be atomized during the atomization process according to the consumption amount of the substrate to be atomized in each stage. Wherein, the total consumption of the substrate to be atomized includes the consumption of the first substrate to be atomized and the consumption of the second substrate to be atomized.

That is to say, after calculating the consumption of the substrate to be atomized in each stage, the results are added together to obtain the total consumption of the substrate to be atomized in this atomization process. Comparing the total amount with the quality of the substrate to be atomized prestored in the memory 2, the remaining amount of the substrate to be atomized can be obtained, which provides reference data for the reminding module 11 and the cutting module 12.

It should be noted that the electronic atomization device to be tested described here only refers to the electronic atomization device currently being tested, which is different from the consumption detection method of other electronic atomization device disclosed in this application. The object can be the same or the same type of electronic atomization device, or a similar or improved model with the same function.

The present application discloses an electronic atomization device and a method for detecting the consumption of the substrate to be atomized. The method for detecting the consumption of the substrate to be atomized includes: acquiring energy Q in different periods, where the energy Q is the energy applied to the atomizer 3 Q, the atomizer 3 is used to atomize the substrate to be atomized; the temperature T is obtained in different periods, where the temperature T is the temperature T corresponding to the heating element of the atomizer 3 under the energy Q; according to the energy Q and temperature T, each Consumption of the substrate to be atomized for the stage. The above method achieves real-time control of the atomization amount of the electronic atomization device by obtaining the consumption of the substrate to be atomized during the atomization process, so that the user can use the electronic atomization device reasonably and sparingly according to the real-time atomization amount , to prevent the atomizer 3 from burning without the substrate to be atomized to produce burnt smell, which affects health.

The above descriptions are only part of the embodiments of the application, and are not intended to limit the scope of protection of the application. All equivalent devices or equivalent process transformations made by using the description and drawings of the application, or directly or indirectly used in other related All technical fields are equally included in the patent protection scope of the present application.

Claims

A consumption detection method of a substrate to be atomized, comprising:

Acquiring energy in different periods, wherein the energy is the energy applied to the atomizer, and the atomizer is used to atomize the substrate to be atomized;

Obtaining the temperature in different periods, wherein the temperature is the temperature corresponding to the heating element of the atomizer under the energy;

The consumption of the substrate to be atomized at each stage is obtained according to the energy and the temperature.
The consumption detection method of the substrate to be atomized according to claim 1, wherein the step of obtaining the consumption of the substrate to be atomized at each stage according to the energy and the temperature comprises:

Obtaining the latent heat of atomization corresponding to the temperature, wherein the latent heat of atomization is the energy required for atomization of the unit substrate to be atomized at the temperature;

The consumption of the substrate to be atomized at a corresponding stage is obtained according to the energy and the latent heat of atomization.
The method for detecting the consumption of the substrate to be atomized according to claim 2, wherein the step of acquiring the temperature by time intervals comprises:

Obtain the current resistance value corresponding to the heating element;

The temperature is obtained according to the current resistance value.
The consumption detection method of the substrate to be atomized according to claim 3, wherein the step of obtaining the temperature according to the current resistance value further comprises:

Acquiring the corrected resistance value according to the current resistance value and the resistance temperature curve corresponding to the previous puff;

The temperature is obtained according to the corrected resistance value.
The method for detecting the consumption of the substrate to be atomized according to claim 2, wherein the latent heat of atomization comprises a first latent heat of atomization and a second latent heat of atomization, and the first latent heat of atomization is the temperature increase in the atomization stage. The energy required for the atomization of the unit substrate to be atomized at different temperatures, and the second latent heat of atomization is the energy required for the atomization of the unit substrate to be atomized in the constant temperature atomization stage;

The step of obtaining the consumption of the substrate to be atomized at the corresponding stage according to the energy and the latent heat of atomization includes:

In the heating up atomization stage, the consumption of the first substrate to be atomized is obtained according to the energy and the first atomization latent heat;

In the constant temperature atomization stage, the consumption of the second substrate to be atomized is obtained according to the energy and the second latent heat of atomization.
The consumption detection method of the substrate to be atomized according to claim 5, wherein the steps of obtaining energy by time intervals and obtaining temperature by time intervals include:

harvesting the energy and the temperature at predetermined intervals in response to the temperature of the atomizer reaching an initial atomization temperature;

The step of obtaining the consumption of the substrate to be atomized at the corresponding stage according to the energy and the latent heat of atomization includes:

In the heating atomization stage, the consumption of the substrate to be atomized in the predetermined time period is obtained according to the energy in the predetermined time period and the first atomization latent heat;

In the constant temperature atomization stage, the consumption of the substrate to be atomized in the predetermined time period is obtained according to the energy in the predetermined time period and the second atomization latent heat.
The method for detecting the consumption of the substrate to be atomized according to claim 6, wherein, in the heating up atomization stage, the temperature of the atomizer at a predetermined time period is based on the highest atomization rate of the atomizer at a predetermined time Temperature and the average atomization temperature obtained for the minimum atomization temperature.
The consumption detection method of the substrate to be atomized according to claim 5, wherein the steps of obtaining energy by time intervals and obtaining temperature by time intervals include:

obtaining a first energy and a first temperature of the heated atomization stage; and

Obtaining the second energy and the second temperature of the constant temperature atomization stage;

The step of obtaining the consumption of the substrate to be atomized at the corresponding stage according to the energy and the latent heat of atomization includes:

According to the first energy and the first latent heat of atomization, the consumption of the first substrate to be atomized in the whole temperature-rising atomization stage is obtained, wherein the first atomization latent heat is different temperatures in the temperature-rising atomization stage The energy required for the atomization of the substrate to be atomized per unit; and

According to the second energy and the second latent heat of atomization, the consumption of the second substrate to be atomized in the entire constant temperature atomization stage is obtained, wherein the second latent heat of atomization is the unit to be atomized in the constant temperature atomization stage The energy required for the atomization of the matrix.
The consumption detection method of the substrate to be atomized according to claim 5, wherein the second latent heat of atomization is obtained by the following method:

Obtaining the first consumption of the substance to be atomized to reach the constant temperature atomization stage at the first time of work;

weighing and measuring the second consumption of the substrate to be atomized to reach the constant temperature atomization stage at the second working time;

The second latent heat of atomization is divided by the difference between the energy applied to the atomizer during the second time and the first time, divided by the second consumption and the first consumption Quantity difference acquisition.
The consumption detection method of the substrate to be atomized according to claim 9, wherein the first latent heat of atomization is obtained by the following method:

Obtain the average latent heat of atomization in the heating atomization stage;

The first latent heat of atomization is obtained according to the average latent heat of atomization, the second latent heat of atomization, and the resistance-time relationship of the heating up atomization stage.
The consumption detection method of the substrate to be atomized according to claim 10, wherein the average latent heat of atomization is obtained by the following method:

Obtaining the third consumption of the substrate to be atomized in the heating atomization stage;

The average latent heat of atomization is obtained by dividing the energy applied to the atomizer during the heating up atomization stage by the third consumption.
The consumption detection method of the substrate to be atomized according to claim 8, wherein, after the step of obtaining the consumption of the substrate to be atomized at each stage according to the energy and the temperature, further comprising:

According to the consumption of the substrate to be atomized at each stage, the total consumption of the substrate to be atomized in the atomization process is obtained; wherein, the total consumption of the substrate to be atomized includes the consumption of the first substrate to be atomized amount and the consumption of the second substrate to be atomized.
An electronic atomization device, including:

The controller includes an acquisition module for acquiring the consumption of the substance to be atomized by the electronic atomization device; wherein, the method for the acquisition module to acquire the consumption of the substance to be atomized by the electronic atomization device is as claimed in the claims 1 method described.
The electronic atomization device according to claim 13, further comprising:

A memory for storing characteristic information of the atomizer of the electronic atomization device; wherein, the characteristic information includes the initial quality of the substance to be atomized by the atomizer;

Wherein, the controller is further configured to acquire the remaining quantity of the substance to be atomized in the atomizer according to the initial mass of the substance to be atomized and the consumption amount of the substance to be atomized.