WO2023016453A1 - Infrared detection chip and infrared detector - Google Patents

Infrared detection chip and infrared detector Download PDF

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Publication number
WO2023016453A1
WO2023016453A1 PCT/CN2022/111150 CN2022111150W WO2023016453A1 WO 2023016453 A1 WO2023016453 A1 WO 2023016453A1 CN 2022111150 W CN2022111150 W CN 2022111150W WO 2023016453 A1 WO2023016453 A1 WO 2023016453A1
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Prior art keywords
infrared detection
infrared
detection unit
intensity
visible light
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PCT/CN2022/111150
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French (fr)
Chinese (zh)
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王敏
金瑛
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南方科技大学
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Publication of WO2023016453A1 publication Critical patent/WO2023016453A1/en

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/10Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14643Photodiode arrays; MOS imagers
    • H01L27/14649Infrared imagers

Definitions

  • the invention relates to the technical field of infrared detection, in particular to an infrared detection chip and an infrared detector.
  • Pyro-optic uncooled infrared detectors require crystal thin films with high electro-optic properties, and the preparation and performance optimization of materials are very difficult. Therefore, it is very necessary to continue to improve the existing technology or research and develop new optical readout infrared thermal imaging technology.
  • the invention provides an infrared detection chip and an infrared detector.
  • the infrared detection chip includes an optical component, an infrared detection array and a photoelectric readout module.
  • the infrared detection array is arranged under the optical component, and the infrared detection array includes a plurality of infrared detection units arranged in an array, and the infrared detection units can emit visible light under the action of excitation light, and the infrared detection units also Under the action of the infrared radiation converged by the optical components, temperature changes can occur so that the intensity of the visible light changes; the intensity of the visible light is negatively correlated with the temperature of the infrared detection unit, and the infrared detection unit The size of the temperature is positively correlated with the intensity of the infrared radiation received by the infrared detection unit; and
  • the photoelectric readout module is arranged under the infrared detection array, and the photoelectric readout module includes a plurality of photoelectric readout units arranged in an array, and the photoelectric readout units correspond to the infrared detection units one by one, so The photoelectric readout unit is used to detect the intensity of the visible light and convert it into an electrical signal.
  • the infrared detection unit excited by the excitation light can emit visible light, and the infrared radiation will cause the temperature change of the infrared detection unit, thereby causing the intensity of the visible light emitted by the infrared detection unit to change.
  • the stronger the intensity the smaller the intensity of visible light. Therefore, when the infrared radiation is concentrated on the infrared detection unit, it will cause the change of the luminous intensity of visible light, and the photoelectric readout unit can convert the change of luminous intensity into an electrical signal.
  • the distribution of infrared radiation can be converted into the light intensity distribution of visible light, and finally the infrared radiation intensity of different positions and regions can be obtained through the change of the electrical signal of the photoelectric readout unit to realize the infrared imaging of the heat source.
  • the structure and preparation process of the detection chip are relatively simple, the cost is low, and the sensitivity is high.
  • the optical component includes a plurality of microlenses arranged in an array, and the microlenses are in one-to-one correspondence with the infrared detection units, and the infrared detection units are located on the focal plane of the microlenses, The microlens is used to focus the infrared radiation on the infrared detection unit.
  • the infrared detection unit is made of fluorescent thermosensitive material.
  • a vacuum cavity is formed in the infrared detection chip, and the infrared detection unit is located in the vacuum cavity.
  • the infrared detection chip further includes a thermal insulation structure, and the thermal insulation structure is stacked and disposed below the infrared detection unit and between the infrared detection unit and the photoelectric readout unit.
  • the infrared detector further includes a filter, and the filter is arranged between the infrared detection array and the photoelectric readout module and covers the photoelectric readout unit.
  • the photoelectric readout module includes at least one of a CCD chip, a CMOS chip, and a CIS chip.
  • the infrared detection chip further includes at least one light-shielding element, and each light-shielding element covers one infrared detection unit.
  • the infrared detector according to the embodiment of the present invention includes a casing and the infrared detection chip described in any of the above embodiments, and the infrared detection chip is arranged in the casing.
  • the infrared detection unit excited by the excitation light can emit visible light, and the infrared radiation will cause the temperature change of the infrared detection unit, thereby causing the intensity of the visible light emitted by the infrared detection unit to change.
  • the stronger the intensity the smaller the intensity of visible light. Therefore, when the infrared radiation is concentrated on the infrared detection unit, it will cause the change of the luminous intensity of visible light, and the photoelectric readout unit can convert the change of luminous intensity into an electrical signal. In this way, the distribution of infrared radiation can be converted into the intensity distribution of visible light.
  • the intensity of infrared radiation at different positions and regions can be obtained through the change of the electrical signal of the photoelectric readout unit to realize infrared imaging of heat sources.
  • the structure and preparation process of the detection chip are relatively simple, the cost is low, and the sensitivity is high.
  • Fig. 1 is a schematic structural view of an infrared detector according to an embodiment of the present invention
  • Fig. 2 is another structural schematic diagram of an infrared detector according to an embodiment of the present invention.
  • Fig. 3 is another structural schematic diagram of the infrared detector according to the embodiment of the present invention.
  • Infrared detection chip 100 optical components 10, infrared detection array 20, infrared detection unit 21, photoelectric readout module 30, photoelectric readout unit 31, optical film 32, back-end processing part 40, vacuum chamber 50, bracket 60, heat insulation structure 70 , a filter 80 , and a shading element 90 .
  • connection should be understood in a broad sense, for example, it can be a fixed connection or a detachable connection. Connected, or integrally connected; it can be mechanically connected, or electrically connected, or can communicate with each other; it can be directly connected, or indirectly connected through an intermediary, and it can be the internal communication of two components or the interaction of two components relation.
  • installation connection
  • connection connection
  • connection should be understood in a broad sense, for example, it can be a fixed connection or a detachable connection. Connected, or integrally connected; it can be mechanically connected, or electrically connected, or can communicate with each other; it can be directly connected, or indirectly connected through an intermediary, and it can be the internal communication of two components or the interaction of two components relation.
  • a first feature being “on” or “under” a second feature may include direct contact between the first and second features, and may also include the first and second features Not in direct contact but through another characteristic contact between them.
  • “above”, “above” and “above” the first feature on the second feature include that the first feature is directly above and obliquely above the second feature, or simply means that the first feature is horizontally higher than the second feature.
  • “Below”, “beneath” and “under” the first feature to the second feature include that the first feature is directly below and obliquely below the second feature, or simply means that the first feature has a lower level than the second feature.
  • the infrared detection chip 100 of the embodiment of the present invention includes an optical component 10, an infrared detection array 20 and a photoelectric readout module 30, the infrared detection array 20 is arranged under the optical component 10, and the infrared detection array 20 includes a plurality of array rows
  • the infrared detection unit 21 of the cloth, the infrared detection unit 21 can emit visible light under the action of the excitation light, and the infrared detection unit 21 can also generate visible light under the action of the infrared radiation (the solid arrow in Fig. 1 ) converged by the optical component 10.
  • the temperature changes so that the intensity of the visible light (dotted arrow in FIG. 1 ) emitted by the infrared detection unit 21 changes.
  • the intensity of visible light emitted by the infrared detection unit 21 is negatively correlated with the temperature of the infrared detection unit 21 , and the temperature of the infrared detection unit 21 is positively correlated with the intensity of infrared radiation received by the infrared detection unit 21 .
  • the photoelectric readout module 30 is arranged below the infrared detection array 20.
  • the photoelectric readout module 30 includes a plurality of photoelectric readout units 31 arranged in an array.
  • the photoelectric readout units 31 correspond to the infrared detection units 21 one by one. It is used to detect the intensity of the visible light emitted by the infrared detection unit 21 and convert it into an electrical signal.
  • infrared detection chips have very broad market application prospects.
  • 5G and AI era new application fields will surely open a new peak in the development of infrared detection chips.
  • the research and development of infrared chips in my country has achieved staged success, and the independent development of high-performance and low-cost infrared detection chips has the potential for source innovation.
  • Pyro-optic uncooled infrared detectors require crystal thin films with high electro-optic properties, and the preparation and performance optimization of materials are very difficult. Therefore, it still has important academic and practical application value to continue to improve the existing technology or research and develop new optical readout infrared thermal imaging technology to achieve low manufacturing cost and high sensitivity.
  • the infrared detection array 20 includes a plurality of infrared detection units 21 arranged in an array, the infrared detection units 21 can emit visible light under the action of excitation light, and the infrared detection units 21 can also pass through The temperature of the infrared radiation collected by the optical component 10 changes, so that the intensity of the visible light emitted by the infrared detection unit 21 changes.
  • the intensity of visible light is negatively correlated with the temperature of the infrared detection unit 21, the temperature of the infrared detection unit 21 is positively correlated with the intensity of the infrared radiation received by the infrared detection unit 21, and the photoelectric readout unit 31 can read the intensity of visible light to convert into an electrical signal.
  • the radiation of infrared radiation will cause the temperature of the infrared detection unit 21 to change, thereby causing the intensity of the visible light emitted by the infrared detection unit 21 to change.
  • the stronger the intensity of the infrared radiation the smaller the intensity of the visible light.
  • the photoelectric readout unit 31 can convert the change of luminous intensity into changes in electrical signals, so that the distribution of infrared radiation can be converted into visible light.
  • the intensity of the infrared radiation at different positions and regions can be obtained through the change of the electrical signal of the photoelectric readout unit 31 to realize the infrared imaging of the heat source.
  • the infrared detection unit in the infrared detection array 20 needs to be 21 is set so that it can be excited by the excitation light to emit visible light and can cause temperature changes under the action of infrared radiation to cause changes in the intensity of the emitted visible light to achieve infrared imaging.
  • the structure and manufacturing process of the infrared detection chip 100 are relatively simple and cost-effective. lower, higher sensitivity.
  • the infrared radiation with temperature information generated by the heat source will converge on the infrared detection unit 21 through the optical component 10, causing the temperature of the infrared detection unit 21 to rise, thereby changing the intensity of visible light emitted by the infrared detection unit 21 , so that the electrical signal of the photoelectric readout unit 31 changes, and the temperature is positively correlated with the intensity of the infrared radiation received by each infrared detection unit 21 .
  • the change of the intensity of visible light can be monitored through the change of the electrical signal to obtain the temperature rise of the infrared detection unit 21, and then the intensity of the infrared radiation can be obtained, so that the distribution of the infrared radiation can be detected and the thermal imaging of the heat source can be realized.
  • the infrared detection chip 100 in the embodiment of the present invention is a detection chip based on optical-optical-electrical conversion. Specifically, when receiving infrared radiation, the optical component 10 converges the infrared radiation to the infrared detection array 20.
  • the temperature of the infrared detection unit 21 changes under the action of infrared radiation, which causes the intensity of the visible light emitted by the infrared detection unit 21 to change, so that the distribution of infrared radiation can be converted into the light intensity distribution of visible light, that is, to achieve
  • the photoelectric readout unit 31 of the photoelectric readout module 30 can detect the light intensity change of the corresponding infrared detection unit 21 to generate a change in the electrical signal, that is, realize the "opto-electrical "Conversion, thus, according to the change of the electrical signal, the thermal image of the infrared target under test can be calculated and obtained.
  • the photoelectric readout module 30 may include at least one of a CCD chip, a CMOS chip, and a CIS chip. In this way, the photoelectric readout module 30 can directly and accurately detect the luminous intensity of each infrared detection unit 21 to generate an image.
  • the photoelectric readout unit 31 can be understood as a photosensitive unit, and the array composed of a plurality of photoelectric readout units 31 can be understood as a photosensitive array, and the photosensitive array can detect the intensity of visible light emitted by each infrared detection unit 21 to obtain the distribution of infrared radiation to generate an infrared image.
  • the photoelectric readout module 30 may further include an optical film 32 , and the optical film 32 is stacked above the photoelectric readout unit 31 and covers the photoelectric readout unit 31 .
  • infrared imaging can be realized by directly using the principle that the infrared detection unit 21 can change the intensity of the emitted visible light under the action of infrared radiation.
  • the infrared image is directly calculated through the distribution of light intensity, which can reduce the interference of useful signals such as environmental disturbances, and facilitate the realization of weak infrared images. detection perception.
  • the infrared detection chip 100 also includes a back-end processing part 40, and the back-end processing part 40 can be located below the photoelectric readout module 30, that is, the bottom layer
  • the back-end processing part 40 can properly process the electrical signal converted by the photoelectric readout unit 31 and then output it and perform subsequent processing to complete infrared imaging.
  • the back-end processing part 4031 can design the readout circuit of the infrared detector by combining the capacitive feedback transimpedance amplifier and the correlated double sampling circuit.
  • the optical component 10 includes a plurality of microlenses arranged in an array (not shown), the microlenses correspond to the infrared detection units 21 one by one, the infrared detection unit 21 is located on the focal plane of the microlenses, and the microlenses The lens is used to focus the infrared radiation on the infrared detection unit 21 .
  • the infrared light radiation can be more accurately focused on the corresponding infrared detection unit 21 through an array composed of multiple microlenses, so as to excite the infrared detection unit 21 to emit visible light, and then accurately convert the distribution of infrared radiation into the distribution of light intensity .
  • the infrared detection unit 21 can be made of fluorescent thermosensitive material
  • the fluorescent thermosensitive material excited by the excitation light can emit visible light, and when it absorbs the infrared radiation signal with the temperature information of the measured object, the temperature of the infrared detection unit 21 itself will change, so that the infrared detection unit 21
  • the intensity of the emitted visible light also changes, and then, the photoelectric readout module 30 can convert the change of the luminous intensity into a change of the electrical signal, and then perform subsequent processing by the back-end processing part 40 to generate an infrared image of the measured target.
  • the infrared detection unit 21 may be a fluorescent heat-sensitive thin film made of a fluorescent heat-sensitive material, and the infrared detection array 20 may be manufactured using a MEMS process.
  • the infrared detection unit 21 emits visible light when it receives the excitation light at normal temperature. When the infrared detection unit 21 receives infrared radiation, its temperature rises.
  • the luminous intensity of the infrared detection unit 21 at the position where the temperature rises will decrease, so that the intensity of visible light emitted by the infrared detection unit 21 at different positions and different regions of the infrared detection array 20 is different, and the photoelectric readout module 30
  • the readout unit 31 can convert the change of the luminous intensity into the change of the electrical signal, and output it after proper processing by the back-end processing part 40 to complete the infrared imaging.
  • the infrared detection unit 21 the greater the intensity of the received infrared radiation, the higher the temperature, and the higher the temperature, the lower the luminous intensity. It can be seen that the measured heat source is transferred to the optical component 10 through the microlens.
  • the temperature of the infrared detection unit 21 will change.
  • the fluorescent heat-sensitive material in the infrared detection unit 21 excited by the excitation light emits visible light, and the received infrared radiation
  • the size of the received infrared radiation enables thermal imaging of the measured heat source.
  • a vacuum cavity 50 is formed in the infrared detection chip 100 , and the infrared detection unit 21 is located in the vacuum cavity 50 .
  • a vacuum cavity 50 may be formed in the infrared detection chip 100, and the infrared detection array 20 is disposed in the vacuum cavity 50.
  • the infrared detection chip 100 It can include a bracket 60, the optical component 10 can be arranged on the top of the bracket 60, the infrared detection array 20 and the photoelectric readout module 30 can be stacked and arranged under the bracket 60, the infrared detection array 20 is accommodated in the bracket 60, and the bracket 60 can be Vacuuming is performed to form a vacuum chamber 50 .
  • the infrared detection array 20 may also be packaged in a vacuum package to form a vacuum chamber 50 inside, for example, the infrared detection array 20 may be vacuum packaged with a packaging film. It should be noted that, in such an embodiment, the installation position of the element generating the excitation light is not limited, and it is only required that the excitation light can be irradiated onto the infrared detection array 20 .
  • the thermal insulation structure 70 can be used to block the heat transfer between the infrared detection unit 21 and the photoelectric readout unit 31 as much as possible, thereby preventing the infrared detection unit 21 from causing more heat loss and causing the loss of part of the infrared radiation signal, and improving the detection efficiency. accuracy.
  • the thermal insulation structure 70 can adopt a micro-bridge structure, which can isolate the heat transfer between the infrared detection unit 21 and the photoelectric readout unit 31 as much as possible without affecting the transmission of visible light. Improve detection accuracy.
  • the infrared detection chip 100 further includes a filter 80 , the filter 80 is disposed between the infrared detection array 20 and the photoelectric readout module 30 and covers the photoelectric readout unit 31 .
  • the filter 80 can filter light to avoid affecting the accuracy of detection.
  • the filter 80 can be a bandpass filter, and the filter 80 can filter out light outside a specific wavelength range to ensure that the photoelectric readout unit 31 The accuracy of the intensity of the detected light.
  • the filter 80 may be disposed between the heat insulating structure 70 and the photoelectric readout module 30 .
  • the filter 80 may also be disposed between the infrared detection array 20 and the heat insulating structure 70 , which is not specifically limited here.
  • the infrared detection chip 100 further includes at least one light-shielding element 90 , and each light-shielding element covers one infrared detection unit 21 .
  • the light shielding element 90 can be used to shield part of the infrared detection unit 21 so as to compensate for the heat generated by the photoelectric readout unit 31 during operation and the intensity of visible light emitted by the infrared detection unit 21 .
  • the light-shielding element 90 can be a light-shielding film layer capable of shielding infrared light and visible light.
  • the lens is used to cover the infrared detection unit 21.
  • the shading element 90 can also be directly stacked on the infrared detection unit 21 to cover the infrared detection unit, which is not limited here.
  • part of the infrared detection unit 21 is covered by the shading element 90, and the covered infrared detection unit 21 can be called a blind pixel.
  • the infrared detection unit 21 corresponding to the shading element 90 ie, the blind pixel
  • the temperature can be realized only by obtaining the luminous intensity of the blind pixel and the luminous intensity of other pixels Compensation, so as to obtain the accurate temperature rise of the infrared detection unit 21 to obtain the distribution of infrared radiation
  • the temperature rise caused by the photoelectric readout module 30 can be calculated through blind pixels, and the photoelectric readout module 30 can be calculated by other pixels.
  • the temperature rise caused by both the module 30 and the infrared radiation can be obtained only by subtracting the former from the latter, and the infrared radiation can be accurately obtained according to the temperature rise of each position. distribution for thermal imaging.
  • the thermal insulation structure 70 and the introduction of blind pixels can be used simultaneously to eliminate and compensate the influence of the heat generated inside the infrared detection chip 100 itself on the temperature of the infrared detection unit 21 , improving the detection accuracy and sensitivity.
  • the infrared detector in the embodiment of the present invention includes a casing and the infrared detection chip 100 described in any of the above embodiments, and the infrared detection chip 100 is installed in the casing.
  • the infrared detection unit 21 excited by the excitation light emits visible light, and the infrared radiation will cause the temperature of the infrared detection unit 21 to change, thereby causing the intensity of the visible light emitted by the infrared detection unit 21 to change.
  • the stronger the intensity of the infrared radiation the smaller the intensity of the visible light. Therefore, when the infrared radiation is concentrated on the infrared detection unit 21, it will cause a change in the luminous intensity of the visible light, and the photoelectric readout unit 31 can convert the change of the luminous intensity In this way, the distribution of infrared radiation can be converted into the intensity distribution of visible light.
  • the intensity of infrared radiation at different positions and regions can be obtained through the change of the electrical signal of the photoelectric readout unit 31 to realize Infrared imaging of heat sources, in this way, only the infrared detection unit 21 in the infrared detection array 20 needs to be set to be able to be excited by the excitation light to emit visible light, and the temperature change under the action of infrared radiation can cause the intensity of the emitted visible light to change Infrared imaging can be realized.
  • the structure and manufacturing process of the infrared detection chip 100 are relatively simple, the cost is low, and the sensitivity is high.

Abstract

An infrared detection chip (100) and an infrared detector. The infrared detection chip (100) comprises an optical component (10), an infrared detection array (20), and a photoelectric readout module (30). The infrared detection array (20) comprises a plurality of infrared detection units (21) arranged in an array. The infrared detection units (21) can emit visible light under the effect of excitation light and can also have their temperature changed under the effect of infrared radiation to change the intensity of the visible light. The intensity of the visible light is negatively correlated with the temperature of the infrared detection units (21), and the temperature of the infrared detection units (21) is positively correlated with the intensity of the received infrared radiation. Photoelectric readout units (31) of the photoelectric readout module (30) have one-to-one correspondence to the infrared detection units (21), and the photoelectric readout units (31) are configured to detect the intensity of the visible light emitted by the infrared detection units (21) and convert same into an electrical signal.

Description

红外探测芯片和红外探测器Infrared detection chip and infrared detector 技术领域technical field
本发明涉及红外探测技术领域,尤其涉及一种红外探测芯片和红外探测器。The invention relates to the technical field of infrared detection, in particular to an infrared detection chip and an infrared detector.
背景技术Background technique
目前,非制冷红外焦平面阵列技术在相关领域得到了日益广泛地应用:在军事方面,已经成为了保卫国家安全的主要力量之一;在民用方面,已经广泛的应用到了工业、医疗、消防以及视频监控中。At present, uncooled infrared focal plane array technology has been widely used in related fields: in the military, it has become one of the main forces to defend national security; in civilian use, it has been widely used in industry, medical treatment, fire protection and Under video surveillance.
近年来,几种新型光学读出非制冷红外成像技术相继被开发出来,主要有双材料微悬臂梁探测技术、法布里-珀罗微腔红外探测技术、热电光非制冷红外探测技术等,但它们仍然存在一些技术难题没有解决。比如,双材料微悬臂梁探测器固有机械噪声不易除去,从而限制了其在工业上的推广;法布里-珀罗微腔红外探测器微腔可动微镜的残余应力和表面粗糙度的控制还有待提高。热电光非制冷红外探测器需要高电光性能的晶体薄膜,材料的制备和性能优化都非常困难。因此,继续改进现有技术或研究开发新的光学读出红外热成像技术是十分必要的。In recent years, several new optical readout uncooled infrared imaging technologies have been developed successively, mainly including dual-material micro-cantilever beam detection technology, Fabry-Perot microcavity infrared detection technology, pyroelectric-optic uncooled infrared detection technology, etc. But they still have some technical problems unresolved. For example, the inherent mechanical noise of the dual-material micro-cantilever detector is not easy to remove, which limits its industrial application; the residual stress and surface roughness of the movable micromirror of the Fabry-Perot microcavity infrared detector Control could be improved. Pyro-optic uncooled infrared detectors require crystal thin films with high electro-optic properties, and the preparation and performance optimization of materials are very difficult. Therefore, it is very necessary to continue to improve the existing technology or research and develop new optical readout infrared thermal imaging technology.
发明内容Contents of the invention
本发明提供一种红外探测芯片和红外探测器。The invention provides an infrared detection chip and an infrared detector.
本发明实施方式的红外探测芯片包括光学部件、红外探测阵列和光电读出模块。The infrared detection chip according to the embodiment of the present invention includes an optical component, an infrared detection array and a photoelectric readout module.
所述红外探测阵列设置在所述光学部件下方,所述红外探测阵列包括多个阵列排布的红外探测单元,所述红外探测单元能够在激发光的作用下发出可见光,所述红外探测单元还能够在通过所述光学部件汇聚后的红外辐射的作用下发生温度变化以使得所述可见光的强度发生变化;所述可见光的强度与所述红外探测单元的温度大小负相关,所述红外探测单元的温度大小与所述红外探测单元所接收的红外辐射的强度正相关;和The infrared detection array is arranged under the optical component, and the infrared detection array includes a plurality of infrared detection units arranged in an array, and the infrared detection units can emit visible light under the action of excitation light, and the infrared detection units also Under the action of the infrared radiation converged by the optical components, temperature changes can occur so that the intensity of the visible light changes; the intensity of the visible light is negatively correlated with the temperature of the infrared detection unit, and the infrared detection unit The size of the temperature is positively correlated with the intensity of the infrared radiation received by the infrared detection unit; and
所述光电读出模块设置在所述红外探测阵列下方,所述光电读出模块包括阵列排布的多个光电读出单元,所述光电读出单元与所述红外探测单元一一对应,所述光电读出单元用于检测所述可见光的强度并转化为电信号。The photoelectric readout module is arranged under the infrared detection array, and the photoelectric readout module includes a plurality of photoelectric readout units arranged in an array, and the photoelectric readout units correspond to the infrared detection units one by one, so The photoelectric readout unit is used to detect the intensity of the visible light and convert it into an electrical signal.
在本发明实施方式的红外探测芯片中,被激发光激发的红外探测单元可发出可见光,红外辐射会引起红外探测单元的温度变化,从而引起红外探测单元所发出的可见光的强度发生变化,红外辐射的强度越强,则可见光的强度越小,因此,当红外辐射被汇聚在红外探测单元上时会引起可见光的发光强度的变化,而光电读出单元则可将发光强度的变化转化为电信号的变化,这样就可以将红外辐射的分布转化为可见光的光强分布,最后可通过光电读出单元的电信号的变化来得出各个不同位置和区域的红外辐射强度以实现对热源的红外成像。这样,只需要将红外探测阵列中的红外探测单元设置成能够被激发光激发而发出可见光且能够在红外辐射的作用下发生温度变化而引起发出的可见光的强度发生变化即可实现红外成像,红外探测芯片的结构和制备工艺较为简单,成本较低,灵敏度较高。In the infrared detection chip of the embodiment of the present invention, the infrared detection unit excited by the excitation light can emit visible light, and the infrared radiation will cause the temperature change of the infrared detection unit, thereby causing the intensity of the visible light emitted by the infrared detection unit to change. The stronger the intensity, the smaller the intensity of visible light. Therefore, when the infrared radiation is concentrated on the infrared detection unit, it will cause the change of the luminous intensity of visible light, and the photoelectric readout unit can convert the change of luminous intensity into an electrical signal. In this way, the distribution of infrared radiation can be converted into the light intensity distribution of visible light, and finally the infrared radiation intensity of different positions and regions can be obtained through the change of the electrical signal of the photoelectric readout unit to realize the infrared imaging of the heat source. In this way, it is only necessary to set the infrared detection unit in the infrared detection array to be excited by the excitation light to emit visible light and to be able to change the temperature of the emitted visible light under the action of infrared radiation to cause changes in the intensity of the emitted visible light to achieve infrared imaging. The structure and preparation process of the detection chip are relatively simple, the cost is low, and the sensitivity is high.
在某些实施方式中,所述光学部件包括阵列排布的多个微透镜,所述微透镜与所述红外探测单元一一对应,所述红外探测单元位于所述微透镜的焦平面上,所述微透镜用于将所述红外辐射汇聚在所述红外探测单元上。In some embodiments, the optical component includes a plurality of microlenses arranged in an array, and the microlenses are in one-to-one correspondence with the infrared detection units, and the infrared detection units are located on the focal plane of the microlenses, The microlens is used to focus the infrared radiation on the infrared detection unit.
在某些实施方式中,所述红外探测单元由荧光热敏材料制成。In some embodiments, the infrared detection unit is made of fluorescent thermosensitive material.
在某些实施方式中,所述红外探测芯片内形成有真空腔,所述红外探测单元位于所述真空腔内。In some embodiments, a vacuum cavity is formed in the infrared detection chip, and the infrared detection unit is located in the vacuum cavity.
在某些实施方式中,所述红外探测芯片还包括绝热结构,所述绝热结构层叠设置在所述红外探测单元下方且位于所述红外探测单元和所述光电读出单元之间。In some embodiments, the infrared detection chip further includes a thermal insulation structure, and the thermal insulation structure is stacked and disposed below the infrared detection unit and between the infrared detection unit and the photoelectric readout unit.
在某些实施方式中,所述红外探测器还包括滤波片,所述滤波片设置在所述红外探测阵列和所述光电读出模块之间且覆盖所述光电读出单元。In some embodiments, the infrared detector further includes a filter, and the filter is arranged between the infrared detection array and the photoelectric readout module and covers the photoelectric readout unit.
在某些实施方式中,所述光电读出模块包括CCD芯片、CMOS芯片、CIS芯片中的至少一种。In some embodiments, the photoelectric readout module includes at least one of a CCD chip, a CMOS chip, and a CIS chip.
在某些实施方式中,所述红外探测芯片还包括至少一个遮光元件,每个所述遮光件均遮盖一个所述红外探测单元。In some embodiments, the infrared detection chip further includes at least one light-shielding element, and each light-shielding element covers one infrared detection unit.
本发明实施方式的红外探测器包括壳体和上述任意实施方式所述的红外探测芯片,所述红外探测芯片设置在所述壳体内。The infrared detector according to the embodiment of the present invention includes a casing and the infrared detection chip described in any of the above embodiments, and the infrared detection chip is arranged in the casing.
在本发明实施方式的红外探测器中,被激发光激发的红外探测单元可发出可见光,红外辐射会引起红外探测单元的温度变化,从而引起红外探测单元所发出的可见光的强度发生变化,红外辐射的强度越强,则可见光的强度越小,因此,当红外辐射被汇聚在红外探测单元上时会引起可见光的发光强度的变化,而光电读出单元则可将发光强度的变化转化为电信号的变化,这样就可以将红外辐射的分布转化为可见光的光强分布,最后可通过光电读出单元的电信号的变化来得出各个不同位置和区域的红外辐射强度以实现对热源的红外成像,这样,只需要将红外探测阵列中的红外探测单元设置成能够被激发光激发而发出可见光且能够在红外辐射的作用下发生温度变化而引起发出的可见光的强度发生变化即可实现红外成像,红外探测芯片的结构和制备工艺较为简单,成本较低,灵敏度较高。In the infrared detector according to the embodiment of the present invention, the infrared detection unit excited by the excitation light can emit visible light, and the infrared radiation will cause the temperature change of the infrared detection unit, thereby causing the intensity of the visible light emitted by the infrared detection unit to change. The stronger the intensity, the smaller the intensity of visible light. Therefore, when the infrared radiation is concentrated on the infrared detection unit, it will cause the change of the luminous intensity of visible light, and the photoelectric readout unit can convert the change of luminous intensity into an electrical signal. In this way, the distribution of infrared radiation can be converted into the intensity distribution of visible light. Finally, the intensity of infrared radiation at different positions and regions can be obtained through the change of the electrical signal of the photoelectric readout unit to realize infrared imaging of heat sources. In this way, it is only necessary to set the infrared detection unit in the infrared detection array to be excited by the excitation light to emit visible light and to be able to change the temperature of the emitted visible light under the action of infrared radiation to cause changes in the intensity of the emitted visible light to achieve infrared imaging. The structure and preparation process of the detection chip are relatively simple, the cost is low, and the sensitivity is high.
本发明的附加方面和优点将在下面的描述中部分给出,部分将从下面的描述中变得明显,或通过本发明的实践了解到。Additional aspects and advantages of the invention will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention.
附图说明Description of drawings
本申请的上述和/或附加的方面和优点从结合下面附图对实施方式的描述中将变得明显和容易理解,其中:The above and/or additional aspects and advantages of the present application will become apparent and understandable from the description of the embodiments in conjunction with the following drawings, wherein:
图1是本发明实施方式的红外探测器的结构示意图;Fig. 1 is a schematic structural view of an infrared detector according to an embodiment of the present invention;
图2是本发明实施方式的红外探测器的另一结构示意图;Fig. 2 is another structural schematic diagram of an infrared detector according to an embodiment of the present invention;
图3是本发明实施方式的红外探测器的又一结构示意图。Fig. 3 is another structural schematic diagram of the infrared detector according to the embodiment of the present invention.
主要元件符号说明:Description of main component symbols:
红外探测芯片100、光学部件10、红外探测阵列20、红外探测单元21、光电读出模块30、光电读出单元31、光学薄膜32、后端处理部分40、真空腔50、支架60、绝热结构70、滤波片80、遮光元件90。 Infrared detection chip 100, optical components 10, infrared detection array 20, infrared detection unit 21, photoelectric readout module 30, photoelectric readout unit 31, optical film 32, back-end processing part 40, vacuum chamber 50, bracket 60, heat insulation structure 70 , a filter 80 , and a shading element 90 .
具体实施方式Detailed ways
下面详细描述本发明的实施方式,所述实施方式的示例在附图中示出,其中自始至终相同或类似的标号表示相同或类似的元件或具有相同或类似功能的元件。下面通过参考附图描述的实施方式是示例性的,仅用于解释本发明,而不能理解为对本发明的限制。Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary only for explaining the present invention and should not be construed as limiting the present invention.
在本发明的描述中,需要理解的是,术语“中心”、“纵向”、“横向”、“长度”、“宽度”、“厚度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”、“顺时针”、“逆时针”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本发明和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本发明的限制。In describing the present invention, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " Orientation indicated by rear, left, right, vertical, horizontal, top, bottom, inside, outside, clockwise, counterclockwise, etc. The positional relationship is based on the orientation or positional relationship shown in the drawings, which is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, Therefore, it should not be construed as limiting the invention.
在本发明的描述中,需要说明的是,除非另有明确的规定和限定,术语“安装”、“相连”、“连接”应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或一体地连接;可以是机械连接,也可以是电连接或可以相互通讯;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通或两个元件的相互作用关系。对于本领域的普通技术人员而言,可以根据具体情况理解上述术语在本发明中的具体含义。In the description of the present invention, it should be noted that unless otherwise specified and limited, the terms "installation", "connection" and "connection" should be understood in a broad sense, for example, it can be a fixed connection or a detachable connection. Connected, or integrally connected; it can be mechanically connected, or electrically connected, or can communicate with each other; it can be directly connected, or indirectly connected through an intermediary, and it can be the internal communication of two components or the interaction of two components relation. Those of ordinary skill in the art can understand the specific meanings of the above terms in the present invention according to specific situations.
在本发明中,除非另有明确的规定和限定,第一特征在第二特征之“上”或之“下”可以包括第一和第二特征直接接触,也可以包括第一和第二特征不是直接接触而是通过它们之间的另外的特征接触。而且,第一特征在第二特征“之上”、“上方”和“上面”包括第一特征在第二特征正上方和斜上方,或仅仅表示第一特征水平高度高于第二特征。第一特征在第二特征“之下”、“下方”和“下面”包括第一特征在第二特征正下方和斜下方,或仅仅表示第一特征水平高度小于第二特征。In the present invention, unless otherwise clearly specified and limited, a first feature being "on" or "under" a second feature may include direct contact between the first and second features, and may also include the first and second features Not in direct contact but through another characteristic contact between them. Moreover, "above", "above" and "above" the first feature on the second feature include that the first feature is directly above and obliquely above the second feature, or simply means that the first feature is horizontally higher than the second feature. "Below", "beneath" and "under" the first feature to the second feature include that the first feature is directly below and obliquely below the second feature, or simply means that the first feature has a lower level than the second feature.
下文的公开提供了许多不同的实施方式或例子用来实现本发明的不同结构。为了简化本发明的公开,下文中对特定例子的部件和设置进行描述。当然,它们仅仅为示例,并且目的不在于限制本发明。此外,本发明可以在不同例子中重复参考数字和/或参考字母,这种重复是为了简化和清楚的目的,其本身不指示所讨论各种实施方式和/或设置之间的关系。此外,本发明提供了的各种特定的工艺和材料的例子,但是本领域普通技术人员可以意识本识到其他工艺的应用和/或其他材料的使用。The following disclosure provides many different embodiments or examples for implementing different structures of the present invention. To simplify the disclosure of the present invention, components and arrangements of specific examples are described below. Of course, they are only examples and are not intended to limit the invention. Furthermore, the present disclosure may repeat reference numerals and/or reference letters in different instances, such repetition is for simplicity and clarity and does not in itself indicate a relationship between the various embodiments and/or arrangements discussed. In addition, various specific process and material examples are provided herein, but one of ordinary skill in the art would recognize the use of other processes and/or the use of other materials.
请参阅图1,本发明实施方式的红外探测芯片100包括光学部件10、红外探测阵列20和光电读出模块30,红外探测阵列20设置在光学部件10下方,红外探测阵列20包括多个阵列排布的红外探测单元21,红外探测单元21能够在激发光的作用下发出可见光,红外探测单元21还能够在通过光学部件10汇聚后的红外辐射(图1中的实线箭头)的作用下发生温度变化以使得红外探测单元21发出的可见光(图1中的虚线箭头)的强度发生变化。红外探测单元21发出的可见光的强度与红外探测单元21的温度大小负相关,红外探测单元21的温度大小与红外探测单元21所接收的红外辐射的强度正相关。光电读出模块30设置在红外探测阵列20下方,光电读出模块30包括阵列排布的多个光电读出单元31,光电读出单元31与红外探测单元21一一对应,光电读出单元31用于检测红外探测单元21发出的可见光的强度并转化为电信号。Please refer to Fig. 1, the infrared detection chip 100 of the embodiment of the present invention includes an optical component 10, an infrared detection array 20 and a photoelectric readout module 30, the infrared detection array 20 is arranged under the optical component 10, and the infrared detection array 20 includes a plurality of array rows The infrared detection unit 21 of the cloth, the infrared detection unit 21 can emit visible light under the action of the excitation light, and the infrared detection unit 21 can also generate visible light under the action of the infrared radiation (the solid arrow in Fig. 1 ) converged by the optical component 10. The temperature changes so that the intensity of the visible light (dotted arrow in FIG. 1 ) emitted by the infrared detection unit 21 changes. The intensity of visible light emitted by the infrared detection unit 21 is negatively correlated with the temperature of the infrared detection unit 21 , and the temperature of the infrared detection unit 21 is positively correlated with the intensity of infrared radiation received by the infrared detection unit 21 . The photoelectric readout module 30 is arranged below the infrared detection array 20. The photoelectric readout module 30 includes a plurality of photoelectric readout units 31 arranged in an array. The photoelectric readout units 31 correspond to the infrared detection units 21 one by one. It is used to detect the intensity of the visible light emitted by the infrared detection unit 21 and convert it into an electrical signal.
可以理解,目前,非制冷红外焦平面阵列技术在相关领域得到了日益广泛地应用:在军事方面,已经成为了保卫国家安全的主要力量之一;在民用方面,已经广泛的应用到了工业、医疗、消防以及视频监控中。换句话说,红外探测芯片具有十分广阔的市场应用前景。随着5G和AI时代的到来,新型应用领域必将开启红外探测芯片发展的新高峰。目前我国的红外芯片的研发获得了阶段性的成功,自主开发高性能低成本红外探测芯片具有源头创新潜质。It can be understood that at present, uncooled infrared focal plane array technology has been widely used in related fields: in the military, it has become one of the main forces to defend national security; in civilian use, it has been widely used in industrial, medical , fire protection and video surveillance. In other words, infrared detection chips have very broad market application prospects. With the advent of the 5G and AI era, new application fields will surely open a new peak in the development of infrared detection chips. At present, the research and development of infrared chips in my country has achieved staged success, and the independent development of high-performance and low-cost infrared detection chips has the potential for source innovation.
近年来,几种新型光学读出非制冷红外成像技术相继被开发出来,主要有双材料微悬臂梁探测技术、法布里-珀罗微腔红外探测技术、热电光非制冷红外探测技术等,但它们仍然存在一些技术难题没有解决。比如,双材料微悬臂梁探测器固有机械噪声不易除去,从而限制了其在工业上的推广;法布里-珀罗微腔红外探测器微腔可动微镜的残余应力和表面粗糙度的控制还有待提高。热电光非制冷红外探测器需要高电光性能的晶体薄膜,材料的制备和性能优化都非常困难。因此,继续改进现有技术或研究开发新的光学读出红外热成像技术,以达到低制造成本和高灵敏性等特点,仍然具有重要的学术和实际应用价值。In recent years, several new optical readout uncooled infrared imaging technologies have been developed successively, mainly including dual-material micro-cantilever beam detection technology, Fabry-Perot microcavity infrared detection technology, pyroelectric-optic uncooled infrared detection technology, etc. But they still have some technical problems unresolved. For example, the inherent mechanical noise of the dual-material micro-cantilever detector is not easy to remove, which limits its industrial application; the residual stress and surface roughness of the movable micromirror of the Fabry-Perot microcavity infrared detector Control could be improved. Pyro-optic uncooled infrared detectors require crystal thin films with high electro-optic properties, and the preparation and performance optimization of materials are very difficult. Therefore, it still has important academic and practical application value to continue to improve the existing technology or research and develop new optical readout infrared thermal imaging technology to achieve low manufacturing cost and high sensitivity.
在本发明实施方式的红外探测芯片100中,红外探测阵列20包括多个阵列排布的红外探测单元21,红外探测单元21能够在激发光的作用下发出可见光,红外探测单元21还能够在通过光学部件10汇聚后的红外辐射的作用下发生温度变化从而使得红外探测单元21发出的可见光的强度发生变化。可见光的强度与红外探测单元21的温度大小负相关,红外探测单元21的温度大小与红外探测单元21所接收的红外辐射的强度正相关,而光电读出单元31可以读出可见光的强度从而转化成电信号。如此,红外辐射的辐射会引起红外探测单元21的温度变化,从而引起红外探测单元21所发出的可见光的强度发生变化,红外辐射的强度越强,则可见光的强度越小,因此,当红外辐射被汇聚在红外探测单元21上时会引起可见光的发光强度的变化,而光电读出单元31则可将发光强度的变化转化为电信号的变化,这样就可以将红外辐射的分布转化为可见光的光强分布,最后可通过光电读出单元31的电信号的变化来得出各个不同位置和区域的红外辐射强度以实现对热源的红外成像,这样,只需要将红外探测阵列20中的红外探测单元21设置成能够被激发光激发而发出可见光且能够在红外辐射的作用下发生温度变化而引起发出的可见光的强度发生变化即可实现红外成像,红外探测芯片100的结构和制备工艺较为简单,成本较低,灵敏度较高。In the infrared detection chip 100 of the embodiment of the present invention, the infrared detection array 20 includes a plurality of infrared detection units 21 arranged in an array, the infrared detection units 21 can emit visible light under the action of excitation light, and the infrared detection units 21 can also pass through The temperature of the infrared radiation collected by the optical component 10 changes, so that the intensity of the visible light emitted by the infrared detection unit 21 changes. The intensity of visible light is negatively correlated with the temperature of the infrared detection unit 21, the temperature of the infrared detection unit 21 is positively correlated with the intensity of the infrared radiation received by the infrared detection unit 21, and the photoelectric readout unit 31 can read the intensity of visible light to convert into an electrical signal. In this way, the radiation of infrared radiation will cause the temperature of the infrared detection unit 21 to change, thereby causing the intensity of the visible light emitted by the infrared detection unit 21 to change. The stronger the intensity of the infrared radiation, the smaller the intensity of the visible light. Therefore, when the infrared radiation When it is converged on the infrared detection unit 21, it will cause changes in the luminous intensity of visible light, and the photoelectric readout unit 31 can convert the change of luminous intensity into changes in electrical signals, so that the distribution of infrared radiation can be converted into visible light. Finally, the intensity of the infrared radiation at different positions and regions can be obtained through the change of the electrical signal of the photoelectric readout unit 31 to realize the infrared imaging of the heat source. In this way, only the infrared detection unit in the infrared detection array 20 needs to be 21 is set so that it can be excited by the excitation light to emit visible light and can cause temperature changes under the action of infrared radiation to cause changes in the intensity of the emitted visible light to achieve infrared imaging. The structure and manufacturing process of the infrared detection chip 100 are relatively simple and cost-effective. lower, higher sensitivity.
具体地,激发光可为白光、蓝光、紫外光或者是X光,在常温下,红外探测单元21能够在激发光的激发下发出可见光,当然,在此不对激发光的类型进行限制,只需要红外探测单元能够在激发光的作用下发出可见光即可。可以理解,激发光与红外辐射波长可以相同也可以是不同的。在本发明的实施方式中,可对红外探测芯片100进行标定,在初始情况下,通过激发光激发红外探测单元21发出一定强度的可见光,以此作为标定,在红外探测芯片100的对热源进行探测时,热源所产生的带有温度信息的红外辐射会经过光学部件10汇聚到红外探测单元21上而引起红外探测单元21的温度升高,从而使得红外探测单元21所发出的可见光强度发生变换,进而使得光电读出单元31的电信号发生变化,而温度的大小与各个红外探测单元21所接收到的红外辐射的强度正相关。由此,可通过电信号的变化来监测可见光强度的变化从而得到红外探测单元21的温升,进而得到红外辐射的强度大小,这样就可以检测到红外辐射的分布进而实现对热源的热成像。Specifically, the excitation light can be white light, blue light, ultraviolet light or X-ray. At normal temperature, the infrared detection unit 21 can emit visible light under the excitation of the excitation light. Of course, the type of excitation light is not limited here, only the It only needs that the infrared detection unit can emit visible light under the action of excitation light. It can be understood that the wavelengths of excitation light and infrared radiation can be the same or different. In the embodiment of the present invention, the infrared detection chip 100 can be calibrated. In the initial situation, the infrared detection unit 21 is excited by the excitation light to emit a certain intensity of visible light, which is used as a calibration. During detection, the infrared radiation with temperature information generated by the heat source will converge on the infrared detection unit 21 through the optical component 10, causing the temperature of the infrared detection unit 21 to rise, thereby changing the intensity of visible light emitted by the infrared detection unit 21 , so that the electrical signal of the photoelectric readout unit 31 changes, and the temperature is positively correlated with the intensity of the infrared radiation received by each infrared detection unit 21 . Thus, the change of the intensity of visible light can be monitored through the change of the electrical signal to obtain the temperature rise of the infrared detection unit 21, and then the intensity of the infrared radiation can be obtained, so that the distribution of the infrared radiation can be detected and the thermal imaging of the heat source can be realized.
可以理解,本发明实施方式的红外探测芯片100是一种基于光-光-电转换的探测芯片,具体地,在接收到红外辐射时,光学部件10将红外辐射汇聚至红外探测阵列20的红外探测单元21上,红外探测单元21在红外辐射的作用下发生温度变化从而引起红外探测单元21发出的可见光的强度变化,这样即可将红外辐射的分布转换为可见光的光强分布,也即实现了“光-光”转换,然后,光电读出模块30的光电读出单元31可以检测到与其对应的红外探测单元21的光强变化从而生成电信号的变化,也即实现了“光-电”转换,由此,根据电信号的变化即可计算获得被测红外目标的热图像。It can be understood that the infrared detection chip 100 in the embodiment of the present invention is a detection chip based on optical-optical-electrical conversion. Specifically, when receiving infrared radiation, the optical component 10 converges the infrared radiation to the infrared detection array 20. On the detection unit 21, the temperature of the infrared detection unit 21 changes under the action of infrared radiation, which causes the intensity of the visible light emitted by the infrared detection unit 21 to change, so that the distribution of infrared radiation can be converted into the light intensity distribution of visible light, that is, to achieve After the "light-to-light" conversion, then the photoelectric readout unit 31 of the photoelectric readout module 30 can detect the light intensity change of the corresponding infrared detection unit 21 to generate a change in the electrical signal, that is, realize the "opto-electrical "Conversion, thus, according to the change of the electrical signal, the thermal image of the infrared target under test can be calculated and obtained.
在本发明中,光电读出模块30可以包括CCD芯片、CMOS芯片、CIS芯片中的至少一种。这样,光电读出模块30可以较为直接且准确地探测到各个红外探测单元21的发光强度从而生成图像。光电读出单元31可以理解为光敏单元,多个光电读出单元31组成的阵列可以理解为光敏阵列,光敏阵列可以检测到每个红外探测单元21所发出的可见光的强度从而获得红外辐射的分布以生成红外图像。In the present invention, the photoelectric readout module 30 may include at least one of a CCD chip, a CMOS chip, and a CIS chip. In this way, the photoelectric readout module 30 can directly and accurately detect the luminous intensity of each infrared detection unit 21 to generate an image. The photoelectric readout unit 31 can be understood as a photosensitive unit, and the array composed of a plurality of photoelectric readout units 31 can be understood as a photosensitive array, and the photosensitive array can detect the intensity of visible light emitted by each infrared detection unit 21 to obtain the distribution of infrared radiation to generate an infrared image.
在某些实施方式中,光电读出模块30还可包括光学薄膜32,光学薄膜32层叠设置在光电读出单元31上方且覆盖光电读出单元31。In some embodiments, the photoelectric readout module 30 may further include an optical film 32 , and the optical film 32 is stacked above the photoelectric readout unit 31 and covers the photoelectric readout unit 31 .
可以理解的是,在本发明的实施方式中,可直接利用红外探测单元21能够在红外辐射的作用下使得发出的可见光的强度发生变化的原理来实现红外成像,结构和制备工艺相较现有技术中的上述几种红外成型技术要简单,成本也较低,同时,本发明中是直接通过光强的分布来计算获得红外图像,可以降低环境扰动等对有用信号的干扰,便于实现微弱红外的探测感知。It can be understood that, in the embodiments of the present invention, infrared imaging can be realized by directly using the principle that the infrared detection unit 21 can change the intensity of the emitted visible light under the action of infrared radiation. Compared with the existing The above-mentioned infrared forming technologies in the technology are simple and the cost is low. At the same time, in the present invention, the infrared image is directly calculated through the distribution of light intensity, which can reduce the interference of useful signals such as environmental disturbances, and facilitate the realization of weak infrared images. detection perception.
此外,还可以理解的是,请参阅图1,在发明的实施方式中,红外探测芯片100还包括后端处理部分40,后端处理部分40可位于光电读出模块30下方,也即最底层,后端处理部分40部分可将光电读出单元31转化的电学信号进行适当的处理后输出并进行后续处理以完成红外成像。具体地,后端处理部分4031可采用电容反馈跨阻放大器和相关双采样电路相结合设计红外探测器的读出电路。In addition, it can also be understood that referring to FIG. 1 , in an embodiment of the invention, the infrared detection chip 100 also includes a back-end processing part 40, and the back-end processing part 40 can be located below the photoelectric readout module 30, that is, the bottom layer The back-end processing part 40 can properly process the electrical signal converted by the photoelectric readout unit 31 and then output it and perform subsequent processing to complete infrared imaging. Specifically, the back-end processing part 4031 can design the readout circuit of the infrared detector by combining the capacitive feedback transimpedance amplifier and the correlated double sampling circuit.
在某些实施方式中,光学部件10包括阵列排布的多个微透镜(图未示出),微透镜与红外探测单元21一一对应,红外探测单元21位于微透镜的焦平面上,微透镜用于将红外辐射汇聚在红外探测单元21上。In some embodiments, the optical component 10 includes a plurality of microlenses arranged in an array (not shown), the microlenses correspond to the infrared detection units 21 one by one, the infrared detection unit 21 is located on the focal plane of the microlenses, and the microlenses The lens is used to focus the infrared radiation on the infrared detection unit 21 .
如此,通过多个微透镜组成的阵列可以将红外光辐射较为精准地汇聚到对应的红外探测单元21上从而激发红外探测单元21发出可见光,进而准地将红外辐射的分布转化为光强的分布。In this way, the infrared light radiation can be more accurately focused on the corresponding infrared detection unit 21 through an array composed of multiple microlenses, so as to excite the infrared detection unit 21 to emit visible light, and then accurately convert the distribution of infrared radiation into the distribution of light intensity .
具体地,在这样的实施方式中,微透镜可以为硅微透镜、PS微透镜,例如,可以采用化学腐蚀、光刻胶热熔法或离子束刻蚀等手段在硅晶圆和有机材料上形成微透镜阵列。可以理解的是,在本发明的实施方式中,微透镜的数量与红外探测单元21以及光电读出单元31的数量相对应,三者一一对应。Specifically, in such an embodiment, the microlenses can be silicon microlenses or PS microlenses, for example, chemical etching, photoresist hot melting, or ion beam etching can be used to etch silicon wafers and organic materials. A microlens array is formed. It can be understood that, in the embodiment of the present invention, the number of microlenses corresponds to the number of infrared detection units 21 and photoelectric readout units 31 , and the three correspond one-to-one.
在某些实施方式中,红外探测单元21可由荧光热敏材料制成In some embodiments, the infrared detection unit 21 can be made of fluorescent thermosensitive material
如此,被激发光激发的荧光热敏材料可发出可见光,并且其在吸收带有被测目标的温度信息的红外辐射信号时,红外探测单元21自身会发生温度变化,从而使得红外探测单元21所发出的可见 光的强度也会变化,随后,光电读出模块30可将发光强度的变化转化为电学信号的变化进而通过后端处理部分40进行后续处理后生成被测目标的红外图像。In this way, the fluorescent thermosensitive material excited by the excitation light can emit visible light, and when it absorbs the infrared radiation signal with the temperature information of the measured object, the temperature of the infrared detection unit 21 itself will change, so that the infrared detection unit 21 The intensity of the emitted visible light also changes, and then, the photoelectric readout module 30 can convert the change of the luminous intensity into a change of the electrical signal, and then perform subsequent processing by the back-end processing part 40 to generate an infrared image of the measured target.
具体地,在这样的实施方式中,红外探测单元21可为荧光热敏薄膜,其采用荧光热敏材料制成,红外探测阵列20可以采用MEMS工艺进行制备。红外探测单元21在常温条件下受到激发光向外发出可见光,当红外探测单元21在接收到红外辐射后,其温度升高,由于红外探测单元21中的荧光热敏材料发生热淬灭效应,温度升高位置的红外探测单元21的发光强度会降低,从而使得红外探测阵列20的不同位置和不同区域的红外探测单元21所发出的可见光的强度有所区别,而光电读出模块30的光电读出单元31则可将发光强度的变化转换为电学信号的变化,并将其通过后端处理部分40进行适当处理后输出以完成红外成像。Specifically, in such an embodiment, the infrared detection unit 21 may be a fluorescent heat-sensitive thin film made of a fluorescent heat-sensitive material, and the infrared detection array 20 may be manufactured using a MEMS process. The infrared detection unit 21 emits visible light when it receives the excitation light at normal temperature. When the infrared detection unit 21 receives infrared radiation, its temperature rises. Due to the thermal quenching effect of the fluorescent heat-sensitive material in the infrared detection unit 21, The luminous intensity of the infrared detection unit 21 at the position where the temperature rises will decrease, so that the intensity of visible light emitted by the infrared detection unit 21 at different positions and different regions of the infrared detection array 20 is different, and the photoelectric readout module 30 The readout unit 31 can convert the change of the luminous intensity into the change of the electrical signal, and output it after proper processing by the back-end processing part 40 to complete the infrared imaging.
可以理解,针对红外探测单元21而言,接收到的红外辐射的强度越大则温度越高,温度越高则发光强度越低,由此可知,在光学部件10通过微透镜将被测热源向外辐射的红外线聚焦在红外探测单元21的表面上时,红外探测单元21的温度会发生变化,例如,被激发光激发的红外探测单元21内的荧光热敏材料发出可见光,接收到的红外辐射越多则温度越高,温度越高的红外探测单元21所发出的可见光的强度越低,这样,只需要通过将可见光强度的变化转化为电学信号的变化即可得到每个红外探测单元21所接收的红外辐射的大小从而实现对被测热源的热成像。It can be understood that for the infrared detection unit 21, the greater the intensity of the received infrared radiation, the higher the temperature, and the higher the temperature, the lower the luminous intensity. It can be seen that the measured heat source is transferred to the optical component 10 through the microlens. When the infrared rays of external radiation are focused on the surface of the infrared detection unit 21, the temperature of the infrared detection unit 21 will change. For example, the fluorescent heat-sensitive material in the infrared detection unit 21 excited by the excitation light emits visible light, and the received infrared radiation The higher the temperature, the lower the intensity of the visible light emitted by the infrared detection unit 21 with the higher temperature. In this way, it is only necessary to convert the change of the visible light intensity into the change of the electrical signal to get the result of each infrared detection unit 21. The size of the received infrared radiation enables thermal imaging of the measured heat source.
请参阅图2,在某些实施方式中,红外探测芯片100内形成有真空腔50,红外探测单元21位于真空腔50内。Please refer to FIG. 2 , in some embodiments, a vacuum cavity 50 is formed in the infrared detection chip 100 , and the infrared detection unit 21 is located in the vacuum cavity 50 .
如此,将红外探测单元21在真空环境下可以尽可能地减少外界环境对探测结果的影响。In this way, placing the infrared detection unit 21 in a vacuum environment can minimize the influence of the external environment on the detection results.
具体地,在这样的实施方式中,在红外探测芯片100内可形成有真空腔50,红外探测阵列20设置在真空腔50内,例如,在图2所示的实施方式中,红外探测芯片100可包括支架60,光学部件10可设置在支架60顶部,红外探测阵列20与光电读出模块30可堆叠设置在支架60的下方,红外探测阵列20容置在支架60内,可对支架60进行抽真空处理以形成真空腔50。在这样的实施方式中,支架60可采用光学材料制成,用于产生激发光的元件(图未示出)可设置在支架60的一侧,激发光可从支架60射入至真空腔50内照射在红外探测阵列20上以使红外探测阵列20能够发出可见光。Specifically, in such an embodiment, a vacuum cavity 50 may be formed in the infrared detection chip 100, and the infrared detection array 20 is disposed in the vacuum cavity 50. For example, in the embodiment shown in FIG. 2, the infrared detection chip 100 It can include a bracket 60, the optical component 10 can be arranged on the top of the bracket 60, the infrared detection array 20 and the photoelectric readout module 30 can be stacked and arranged under the bracket 60, the infrared detection array 20 is accommodated in the bracket 60, and the bracket 60 can be Vacuuming is performed to form a vacuum chamber 50 . In such an embodiment, the support 60 can be made of optical materials, and an element (not shown) for generating excitation light can be arranged on one side of the support 60, and the excitation light can be injected into the vacuum chamber 50 from the support 60 The internal illumination is on the infrared detection array 20 so that the infrared detection array 20 can emit visible light.
此外,在一些实施方式中,也可采用真空封装的方式将对红外探测阵列20进行封装处理以使其内部形成真空腔50,例如,可采用封装薄膜对红外探测阵列20进行真空封装。需要说明的是,在这样的实施方式中,不对产生激发光的元件的安装位置进行限制,只需要激发光能够照射至红外探测阵列20上即可。In addition, in some embodiments, the infrared detection array 20 may also be packaged in a vacuum package to form a vacuum chamber 50 inside, for example, the infrared detection array 20 may be vacuum packaged with a packaging film. It should be noted that, in such an embodiment, the installation position of the element generating the excitation light is not limited, and it is only required that the excitation light can be irradiated onto the infrared detection array 20 .
可以理解,由于红外探测单元21与光电读出单元31的物理接触将会提供导热途径,红外探测单元21吸收的部分热信号将会传递到光电读出单元31上,造成部分红外辐射信号的丢失。因此,请参阅图2,在某些实施方式中,红外探测芯片100还包括绝热结构70,绝热结构70层叠设置在红外探测单元21下方且位于红外探测单元21和光电读出单元31之间。It can be understood that since the physical contact between the infrared detection unit 21 and the photoelectric readout unit 31 will provide a heat conduction path, part of the heat signal absorbed by the infrared detection unit 21 will be transmitted to the photoelectric readout unit 31, resulting in the loss of part of the infrared radiation signal . Therefore, referring to FIG. 2 , in some implementations, the infrared detection chip 100 further includes a thermal insulation structure 70 , and the thermal insulation structure 70 is stacked under the infrared detection unit 21 and located between the infrared detection unit 21 and the photoelectric readout unit 31 .
如此,可通过绝热结构70来尽可能阻隔红外探测单元21与光电读出单元31之间的热传递,从而避免红外探测单元21造成较多的热损失而导致部分红外辐射信号的丢失,提高探测的准确性。In this way, the thermal insulation structure 70 can be used to block the heat transfer between the infrared detection unit 21 and the photoelectric readout unit 31 as much as possible, thereby preventing the infrared detection unit 21 from causing more heat loss and causing the loss of part of the infrared radiation signal, and improving the detection efficiency. accuracy.
具体地,在这样的实施方式中,绝热结构70可以采用微桥结构,其可以在不影响可见光透过的情况下尽可能的隔绝红外探测单元21与光电读出单元31之间的热传递以提高探测的准确性。Specifically, in such an embodiment, the thermal insulation structure 70 can adopt a micro-bridge structure, which can isolate the heat transfer between the infrared detection unit 21 and the photoelectric readout unit 31 as much as possible without affecting the transmission of visible light. Improve detection accuracy.
请继续参阅图2,在某些实施方式中,红外探测芯片100还包括滤波片80,滤波片80设置在红外探测阵列20和光电读出模块30之间且覆盖光电读出单元31。Please continue to refer to FIG. 2 , in some embodiments, the infrared detection chip 100 further includes a filter 80 , the filter 80 is disposed between the infrared detection array 20 and the photoelectric readout module 30 and covers the photoelectric readout unit 31 .
如此,滤波片80可以光线进行过滤以避免影响探测的准确性,例如,滤波片80可为带通滤波片,滤波片80可以将特定波长范围以外的光线进行滤除以保证光电读出单元31所检测到的光线的强度的准确性。具体地,在2所示的实施方式中滤波片80可设置在绝热结构70和光电读出模块30之间。当然,在其它实施方式中,滤波片80也可以是设置在红外探测阵列20和绝热结构70之间,具体在此不作限制。In this way, the filter 80 can filter light to avoid affecting the accuracy of detection. For example, the filter 80 can be a bandpass filter, and the filter 80 can filter out light outside a specific wavelength range to ensure that the photoelectric readout unit 31 The accuracy of the intensity of the detected light. Specifically, in the embodiment shown in 2 , the filter 80 may be disposed between the heat insulating structure 70 and the photoelectric readout module 30 . Certainly, in other implementation manners, the filter 80 may also be disposed between the infrared detection array 20 and the heat insulating structure 70 , which is not specifically limited here.
请参阅图3,在某些实施方式中,红外探测芯片100还包括至少一个遮光元件90,每个遮光件均遮盖一个红外探测单元21。Referring to FIG. 3 , in some implementations, the infrared detection chip 100 further includes at least one light-shielding element 90 , and each light-shielding element covers one infrared detection unit 21 .
如此,可采用遮光元件90对部分红外探测单元21进行遮挡从而来对光电读出单元31在工作时产生的热量对红外探测单元21发出的可见光的强度进行补偿。In this way, the light shielding element 90 can be used to shield part of the infrared detection unit 21 so as to compensate for the heat generated by the photoelectric readout unit 31 during operation and the intensity of visible light emitted by the infrared detection unit 21 .
具体地,遮光元件90可以为能够遮盖红外光以及可见光的遮光膜层,在图3所示的实施方式中,遮光元件90可设置在光学部件10上,例如,可遮盖光学部件10上的微透镜从而实现对红外探测单元21的遮盖,当然,可以理解,在其它实施方式中,遮光元件90也可以是直接层叠设置在红外探测单元21上从而实现遮盖,具体在此不作限制。Specifically, the light-shielding element 90 can be a light-shielding film layer capable of shielding infrared light and visible light. In the embodiment shown in FIG. The lens is used to cover the infrared detection unit 21. Of course, it can be understood that in other embodiments, the shading element 90 can also be directly stacked on the infrared detection unit 21 to cover the infrared detection unit, which is not limited here.
在本发明中,每个红外探测单元21可以看做是一个像素点(即像元),由上述可知,由于红外探测单元21与光电读出单元31的物理接触将会提供导热途径,因此,光电读出单元31在工作时所产生的热量可传递至红外探测单元21上从而引起红外探测单元21的温度升高而影响可见光的强度,或者红外探测单元21上的热量传递至光电读出单元31从而使光电读出单元31的噪声增加,容易对检测结果造成干扰。在本实施方式中,通过遮光元件90对部分红外探测单元21进行遮盖,被遮盖的红外探测单元21可称为盲像元,这样,与遮光元件90对应的红外探测单元21(即盲像元)所发出的可见光的强度的变化是来源于光电读出单元21等元件所产生的热量所引起的,因此,只需要通过获得盲像元的发光强度以及其它像元的发光强度即可实现温度的补偿,从而获得红外探测单元21准确的温升以获得红外辐射的分布,例如,通过盲像元可计算出光电读出模块30所带来的温升,而其它的像元可计算出光电读出模块30和红外辐射共同带来的温升,因此,只需要将后者减去前者即可得到红外辐射所带来的温升,根据各个位置的温升不同即可准确地得到红外辐射的分布以实现热成像。In the present invention, each infrared detection unit 21 can be regarded as a pixel point (i.e., a picture element). As can be seen from the above, since the physical contact between the infrared detection unit 21 and the photoelectric readout unit 31 will provide a heat conduction path, therefore, The heat generated by the photoelectric readout unit 31 during operation can be transferred to the infrared detection unit 21 to cause the temperature of the infrared detection unit 21 to rise and affect the intensity of visible light, or the heat on the infrared detection unit 21 can be transferred to the photoelectric readout unit 31 Therefore, the noise of the photoelectric readout unit 31 is increased, which is likely to interfere with the detection results. In this embodiment, part of the infrared detection unit 21 is covered by the shading element 90, and the covered infrared detection unit 21 can be called a blind pixel. In this way, the infrared detection unit 21 corresponding to the shading element 90 (ie, the blind pixel ) is caused by the heat generated by components such as the photoelectric readout unit 21, so the temperature can be realized only by obtaining the luminous intensity of the blind pixel and the luminous intensity of other pixels Compensation, so as to obtain the accurate temperature rise of the infrared detection unit 21 to obtain the distribution of infrared radiation, for example, the temperature rise caused by the photoelectric readout module 30 can be calculated through blind pixels, and the photoelectric readout module 30 can be calculated by other pixels. Read out the temperature rise caused by both the module 30 and the infrared radiation. Therefore, the temperature rise caused by the infrared radiation can be obtained only by subtracting the former from the latter, and the infrared radiation can be accurately obtained according to the temperature rise of each position. distribution for thermal imaging.
进一步地,为了提高补偿的准确性,在这样的实施方式中,遮光元件90的数量与红外探测阵列20的列数相同,红外探测阵列20的每一行上均设置有一个遮光元件90。例如,红外探测阵列20为行数为N,列数为M组成的N×M阵列,此时,可以引入M个盲像元来对温度进行补偿,每一列或者每一行均采用一个盲像元进行温度补偿以提高补偿的准确性。Further, in order to improve the accuracy of compensation, in such an embodiment, the number of shading elements 90 is the same as the number of columns of the infrared detection array 20 , and each row of the infrared detection array 20 is provided with one shading element 90 . For example, the infrared detection array 20 is an N×M array composed of N rows and M columns. At this time, M blind pixels can be introduced to compensate the temperature, and each column or row uses a blind pixel. Perform temperature compensation to improve the accuracy of compensation.
此外,还可以理解的是,在本发明中,可同时采用绝热结构70以及引入盲像元的方式来对红外探测芯片100本身内部所产生的热量对红外探测单元21的温度影响进行消除和补偿,提高了检测的准确性和灵敏度。In addition, it can also be understood that in the present invention, the thermal insulation structure 70 and the introduction of blind pixels can be used simultaneously to eliminate and compensate the influence of the heat generated inside the infrared detection chip 100 itself on the temperature of the infrared detection unit 21 , improving the detection accuracy and sensitivity.
本发明实施方式的红外探测器包括壳体和上述任一实施方式所述的红外探测芯片100,红外探测芯片100安装在壳体内。The infrared detector in the embodiment of the present invention includes a casing and the infrared detection chip 100 described in any of the above embodiments, and the infrared detection chip 100 is installed in the casing.
在本发明实施方式的红外探测器中,被激发光激发的红外探测单元21发出可见光,红外辐射会引起红外探测单元21的温度变化,从而引起红外探测单元21所发出的可见光的强度发生变化,红外辐射的强度越强,则可见光的强度越小,因此,当红外辐射被汇聚在红外探测单元21上时会引起可见光的发光强度的变化,而光电读出单元31则可将发光强度的变化转化为电信号的变化,这样就可以将红外辐射的分布转化为可见光的光强分布,最后可通过光电读出单元31的电信号的变化来得出各个不同位置和区域的红外辐射强度以实现对热源的红外成像,这样,只需要将红外探测阵列20中的红外探测单元21设置成能够被激发光激发而发出可见光且能够在红外辐射的作用下发生温度变化而引起发出的可见光的强度发生变化即可实现红外成像,红外探测芯片100的结构和制备工艺较为简单,成本较低,灵敏度较高。In the infrared detector in the embodiment of the present invention, the infrared detection unit 21 excited by the excitation light emits visible light, and the infrared radiation will cause the temperature of the infrared detection unit 21 to change, thereby causing the intensity of the visible light emitted by the infrared detection unit 21 to change. The stronger the intensity of the infrared radiation, the smaller the intensity of the visible light. Therefore, when the infrared radiation is concentrated on the infrared detection unit 21, it will cause a change in the luminous intensity of the visible light, and the photoelectric readout unit 31 can convert the change of the luminous intensity In this way, the distribution of infrared radiation can be converted into the intensity distribution of visible light. Finally, the intensity of infrared radiation at different positions and regions can be obtained through the change of the electrical signal of the photoelectric readout unit 31 to realize Infrared imaging of heat sources, in this way, only the infrared detection unit 21 in the infrared detection array 20 needs to be set to be able to be excited by the excitation light to emit visible light, and the temperature change under the action of infrared radiation can cause the intensity of the emitted visible light to change Infrared imaging can be realized. The structure and manufacturing process of the infrared detection chip 100 are relatively simple, the cost is low, and the sensitivity is high.
在本说明书的描述中,参考术语“一个实施方式”、“某些实施方式”、“示意性实施方式”、“示例”、“具体示例”、或“一些示例”等的描述意指结合所述实施方式或示例描述的具体特征、结构、材料或者特点包含于本发明的至少一个实施方式或示例中。在本说明书中,对上述术语的示意性表述不一定指的是相同的实施方式或示例。而且,描述的具体特征、结构、材料或者特点可以在任何的一个或多个实施方式或示例中以合适的方式结合。In the description of this specification, descriptions referring to the terms "one embodiment", "certain embodiments", "exemplary embodiments", "example", "specific examples", or "some examples" are meant to be combined with Specific features, structures, materials, or characteristics described in the preceding embodiments or examples are included in at least one embodiment or example of the present invention. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the described specific features, structures, materials or characteristics may be combined in any suitable manner in any one or more embodiments or examples.
尽管已经示出和描述了本发明的实施方式,本领域的普通技术人员可以理解:在不脱离本发明的原理和宗旨的情况下可以对这些实施方式进行多种变化、修改、替换和变型,本发明的范围由权利要求及其等同物限定。Although the embodiments of the present invention have been shown and described, those skilled in the art can understand that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principle and spirit of the present invention. The scope of the invention is defined by the claims and their equivalents.

Claims (9)

  1. 一种红外探测芯片,其特征在于,包括:An infrared detection chip is characterized in that, comprising:
    光学部件;optical components;
    设置在所述光学部件下方的红外探测阵列,所述红外探测阵列包括多个阵列排布的红外探测单元,所述红外探测单元能够在激发光的作用下发出可见光,所述红外探测单元还能够在通过所述光学部件汇聚后的红外辐射的作用下发生温度变化以使得所述可见光的强度发生变化;所述可见光的强度与所述红外探测单元的温度大小负相关,所述红外探测单元的温度大小与所述红外探测单元所接收的红外辐射的强度正相关;和An infrared detection array arranged under the optical component, the infrared detection array includes a plurality of infrared detection units arranged in an array, the infrared detection units can emit visible light under the action of excitation light, and the infrared detection units can also Under the action of the infrared radiation converged by the optical components, the temperature changes so that the intensity of the visible light changes; the intensity of the visible light is negatively correlated with the temperature of the infrared detection unit, and the intensity of the infrared detection unit The temperature is positively correlated with the intensity of the infrared radiation received by the infrared detection unit; and
    设置在所述红外探测阵列下方的光电读出模块,所述光电读出模块包括阵列排布的多个光电读出单元,所述光电读出单元与所述红外探测单元一一对应,所述光电读出单元用于检测所述可见光的强度并转化为电信号。A photoelectric readout module arranged under the infrared detection array, the photoelectric readout module includes a plurality of photoelectric readout units arranged in an array, the photoelectric readout units correspond to the infrared detection units one by one, the The photoelectric readout unit is used to detect the intensity of the visible light and convert it into an electrical signal.
  2. 根据权利要求1所述的红外探测芯片,其特征在于,所述光学部件包括阵列排布的多个微透镜,所述微透镜与所述红外探测单元一一对应,所述红外探测单元位于所述微透镜的焦平面上,所述微透镜用于将所述红外辐射汇聚在所述红外探测单元上。The infrared detection chip according to claim 1, wherein the optical component comprises a plurality of microlenses arranged in an array, and the microlenses are in one-to-one correspondence with the infrared detection unit, and the infrared detection unit is located at the On the focal plane of the microlens, the microlens is used to focus the infrared radiation on the infrared detection unit.
  3. 根据权利要求1所述的红外探测芯片,其特征在于,所述红外探测单元由荧光热敏材料制成。The infrared detection chip according to claim 1, wherein the infrared detection unit is made of fluorescent heat-sensitive material.
  4. 根据权利要求1所述的红外探测芯片,其特征在于,所述红外探测芯片内形成有真空腔,所述红外探测单元位于所述真空腔内。The infrared detection chip according to claim 1, wherein a vacuum cavity is formed in the infrared detection chip, and the infrared detection unit is located in the vacuum cavity.
  5. 根据权利要求1所述的红外探测芯片,其特征在于,所述红外探测芯片还包括绝热结构,所述绝热结构层叠设置在所述红外探测单元下方且位于所述红外探测单元和所述光电读出单元之间。The infrared detection chip according to claim 1, characterized in that, the infrared detection chip further comprises a thermal insulation structure, and the thermal insulation structure is stacked under the infrared detection unit and is located between the infrared detection unit and the photoelectric reader. between units.
  6. 根据权利要求1所述的红外探测芯片,其特征在于,所述红外探测器还包括滤波片,所述滤波片设置在所述红外探测阵列和所述光电读出模块之间且覆盖所述光电读出单元。The infrared detection chip according to claim 1, wherein the infrared detector further comprises a filter, the filter is arranged between the infrared detection array and the photoelectric readout module and covers the photoelectric readout module. Read unit.
  7. 根据权利要求1所述的红外探测芯片,其特征在于,所述光电读出模块包括CCD芯片、CMOS芯片、CIS芯片中的至少一种。The infrared detection chip according to claim 1, wherein the photoelectric readout module comprises at least one of a CCD chip, a CMOS chip, and a CIS chip.
  8. 根据权利要求1所述的红外探测芯片,其特征在于,所述红外探测芯片还包括至少一个遮光元件,每个所述遮光件均遮盖一个所述红外探测单元。The infrared detection chip according to claim 1, further comprising at least one light-shielding element, each of the light-shielding elements covers one of the infrared detection units.
  9. 一种红外探测器,其特征在于,包括:An infrared detector, characterized in that, comprising:
    壳体;和shell; and
    权利要求1-8任一项所述的红外探测芯片,所述红外探测芯片设置在所述壳体内。The infrared detection chip according to any one of claims 1-8, wherein the infrared detection chip is arranged in the housing.
PCT/CN2022/111150 2021-08-09 2022-08-09 Infrared detection chip and infrared detector WO2023016453A1 (en)

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