WO2022224576A1 - Method for controlling lighting device, and exposure device - Google Patents

Method for controlling lighting device, and exposure device Download PDF

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Publication number
WO2022224576A1
WO2022224576A1 PCT/JP2022/006788 JP2022006788W WO2022224576A1 WO 2022224576 A1 WO2022224576 A1 WO 2022224576A1 JP 2022006788 W JP2022006788 W JP 2022006788W WO 2022224576 A1 WO2022224576 A1 WO 2022224576A1
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Prior art keywords
exposure
pressure mercury
lamp
mercury lamp
substrate
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PCT/JP2022/006788
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French (fr)
Japanese (ja)
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芳幸 吉本
幸緒 菊田
健太郎 下里
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株式会社ブイ・テクノロジー
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Publication of WO2022224576A1 publication Critical patent/WO2022224576A1/en

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/56—One or more circuit elements structurally associated with the lamp
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
    • Y02B20/00—Energy efficient lighting technologies, e.g. halogen lamps or gas discharge lamps
    • Y02B20/40—Control techniques providing energy savings, e.g. smart controller or presence detection

Definitions

  • the present invention relates to a method of controlling an illumination device and an exposure device, and more particularly to a method of controlling an illumination device using a high-pressure mercury lamp as a light source and an exposure device equipped with the illumination device.
  • high-pressure mercury lamps used in exposure equipment generally have low turn-on/turn-off responsiveness.
  • LEDs exhibit responsiveness on the order of milliseconds, while lamps require several minutes until the illuminance stabilizes. Therefore, the LED can be controlled to light only when performing exposure, but the lamp is basically always lit except for maintenance etc. where long-term lighting is unnecessary, and the downstream of the lamp By opening and closing a shutter arranged on the side, the substrate is switched between exposure and non-exposure.
  • the life of a lamp is generally several hundred to several thousand hours, which is short compared to the life of an LED, which is several tens of thousands of hours. That is, the illuminance of the lamp that emits light when a constant voltage is supplied is It has a characteristic that it gradually decreases in inverse proportion to the lighting time. For the above reasons, compared to LEDs, lamps lose their illuminance in a very short period of time, and are required to be replaced relatively quickly.
  • a control device for a proximity exposure apparatus described in Patent Document 1 converts the illuminance detected by an illuminance sensor when a predetermined voltage is applied to a high-pressure mercury lamp to a predetermined illuminance for each combination of a plurality of integrators and a plurality of filters. , and the supplied voltage is controlled so that the illuminance detected by the illuminance sensor at the start of exposure transfer is a predetermined illuminance corresponding to the selected integrator and filter.
  • the present invention has been made in view of the above-mentioned problems, and its object is to extend the interval between lamp replacement periods (apparent life) by changing the lamp operation method without changing the performance of the lamp itself. It is an object of the present invention to provide an illumination device control method and an exposure device that can
  • a high-pressure mercury lamp is used as a light source, and the substrate is irradiated with exposure light from the high-pressure mercury lamp through a mask for exposure.
  • a method for controlling an illumination device of an exposure apparatus capable of switching between the exposure and the suspension of the exposure comprising: In an idling period in which the exposure is suspended while the high pressure mercury lamp is lit, the shutter is closed and the power supplied to the high pressure mercury lamp is set to be smaller than the power supplied to the high pressure mercury lamp immediately before the idling period.
  • a method of controlling a lighting device comprising: [2] Using a high-pressure mercury lamp as a light source, irradiating the substrate with exposure light from the high-pressure mercury lamp through a mask for exposure, and opening and closing a shutter arranged downstream of the high-pressure mercury lamp, An exposure apparatus capable of switching between the exposure and the suspension of the exposure, An exposure apparatus comprising a control device that performs the method for controlling an illumination device according to [1].
  • the lighting device control method and the exposure device of the present invention it is possible to extend the interval between lamp replacement periods (apparent life) depending on the method of operating the lamp without changing the performance of the lamp itself.
  • FIG. 1 is a block diagram showing a schematic configuration of an exposure apparatus according to the present invention.
  • FIG. It is a top view which shows the whole structure of a substrate processing apparatus. It is a graph which shows the relationship between the lighting time of an illuminating device, and the power supply in comparison with the conventional illuminating device.
  • an exposure apparatus 100 includes a mask stage Ms that holds a mask M, a substrate stage Ws that holds a substrate W, an illumination device 10 that irradiates the substrate W with exposure light through the mask M, It mainly includes a control device 40 that controls the illumination device 10, the mask stage Ms, the substrate stage Ws, and the like.
  • the illumination device 10 includes a high-pressure mercury lamp (hereinafter simply referred to as a lamp) 20 as a light source for ultraviolet irradiation, a concave mirror 21 for condensing the light emitted from the lamp 20, and a plane mirror for changing the direction of the optical path. 22, a shutter 23 for controlling the opening and closing of the optical path, an optical integrator 24 arranged downstream of the shutter 23 to uniform the illuminance distribution of the light emitted from the plane mirror 22, and the light emitted from the optical integrator 24. parallel light, and a collimation mirror 25 for illuminating the substrate W through the mask M.
  • a high-pressure mercury lamp hereinafter simply referred to as a lamp
  • a concave mirror 21 for condensing the light emitted from the lamp 20
  • a plane mirror for changing the direction of the optical path.
  • a shutter 23 for controlling the opening and closing of the optical path
  • an optical integrator 24 arranged downstream of the shutter 23 to uniform the illuminance distribution
  • the illumination device 10 may include a blower for cooling the lamp 20 and a pitot tube for measuring the cooling air velocity (both not shown) in addition to the optical system such as the mirrors described above.
  • the blower generates a volume of air proportional to the power supplied to the lamp 20 and blows the air onto the lamp 20 to cool it.
  • a filter such as an ND filter, a bandpass filter, and a DUV cut filter may be arranged on the downstream side of the optical integrator 24 .
  • the ND filter is a filter that reduces the amount of light from the lamp 20
  • the bandpass filter is a filter that cuts out part of the spectrum distribution
  • the DUV cut filter is a filter that cuts the short wavelength spectrum.
  • the lamp 20 is provided with a lamp lighting device 31 capable of adjusting power supplied to the lamp 20 . Further, behind the collimation mirror 25, an illuminance sensor 32 for detecting the illuminance of the light incident on the collimation mirror 25, that is, the illuminance of the light irradiated onto the exposure surface of the substrate W is arranged.
  • the lamp lighting device 31, the illuminance sensor 32, and the shutter 23 are connected to and controlled by the control device 40.
  • the collimation mirror 25 is a half mirror, and part of the irradiated light passes through the collimation mirror 25 and enters the illuminance sensor 32 arranged behind. Thereby, the illuminance sensor 32 detects the illuminance of the light incident on the collimation mirror 25 .
  • the collimation mirror 25 is not a half-mirror, but a small hole (not shown) is provided on the incident light path to the illuminance sensor 32. Light passing through the hole is guided to the illuminance sensor 32, and the illuminance of the light is measured. may be detected.
  • the light emitted from the lamp 20 passes through the plane mirror 22, the optical integrator 24, and the collimation mirror 25, and passes through the mask M held by the mask stage Ms and the substrate.
  • the exposure surface of the substrate W held on the stage Ws is irradiated with light for pattern exposure, and the exposure pattern of the mask M is transferred onto the substrate W by exposure.
  • constant illumination intensity operation is performed in which exposure is performed while the illumination intensity of the irradiated exposure light on the exposure surface is kept constant.
  • the control device 40 includes an arithmetic processing unit 41, a storage device 42, a timer 43, and an input and output interface (not shown), and detects illuminance of the illuminance sensor 32, controls the opening and closing of the shutter 23, and controls the operation of the lamp lighting device 31. Controls power supply.
  • the control device 40 also executes feed control and step feed control of the substrate stage Ws, drive control of the alignment adjustment mechanism and the tilt adjustment mechanism, and the like.
  • the controller 40 is also connected to the controllers and sensors of each device of the substrate processing apparatus 200, which will be described later, via a field network.
  • the substrate processing apparatus 200 includes a loading/unloading unit 201, a cleaning device 202, a photosensitive material coating device 203, a drying device 204, an exposure device 100, a developing device 205, and a post-baking device 206, which are arranged in this order.
  • a transport robot 210 is arranged between them.
  • the transport robot 210 includes a base 211 and an arm 212 that is vertically and rotatably provided with respect to the base 211, receives the substrate W from the preceding device, and transfers it to the subsequent device.
  • At least one of the devices 201 to 204 (here, the loading/unloading unit 201) arranged upstream from the exposure apparatus 100 and performing preprocessing of the substrate W is a substrate to be transported and preprocessed.
  • a sensor (for example, a transport-side detection mechanism) 44 for detecting the presence or absence of W is provided, and information on the presence or absence of the substrate W is sent to the controller 40 of the exposure apparatus 100 .
  • the timer 43 of the control device 40 sets the time during which the substrate W is not processed in the pretreatment section to the first period. T1 (for example, 30 seconds or more and less than 30 minutes) and a second period T2 (30 minutes or more) longer than the first period T1 are detected. Then, the control device 40 controls the lighting device 10 based on whether the detected periods are the first and second periods T1 and T2. Further, the control device of the pretreatment section may be provided with a timer to transmit to the control device 40 the time during which the substrate W is not processed in the pretreatment section.
  • the main factors for the decrease in the illuminance of the lamp 20 are the consumption of the electrodes of the lamp 20 and the decrease in the transparency of the glass covering the electrodes. decreases as . Therefore, if the lighting time is the same, the deterioration of the lamp 20 becomes faster as the supplied power increases, and the life of the lamp 20 increases as the supplied power decreases.
  • the illuminance sensor 32 detects the illuminance, and the lamp lighting device 31 controls to increase the supplied power so that the detected illuminance is constant.
  • the reduced illuminance of the lamp 20 is returned to the original illuminance.
  • FIG. 3 is a graph showing the relationship between the lighting time and the power supply of the lighting device 10 in comparison with a conventional lighting device.
  • the automatic operation shown in FIG. 3 includes a short non-exposure time (time shorter than the first period T1) achieved by opening and closing the shutter 23.
  • a user processes a plurality of substrates W in one lot. This is a period of exposure (exposure step), during which the lamp 20 is continuously lit.
  • the idle operation is a period (idling process) during which the substrate W of the next lot is ready for exposure.
  • the lamp 20 is lit continuously.
  • the maintenance operation is a period during which the lamp 20 does not need to be lit for a period longer than the second period T2 for maintenance work of the apparatus, and is a period during which the lamp 20 is extinguished (power supply stop step). .
  • the lamp lighting device 31 gradually increases the supplied power based on the illuminance measured by the illuminance sensor 32 each time the shutter 23 is controlled to open, and increases the illuminance of the lamp 20 by the decreased (deteriorated) illuminance.
  • the last period in the automatic operation A is detected.
  • the idle operation B is entered.
  • the supply power B2 which is the power supply at the end of the automatic operation A
  • the lighting device 10 of the present embodiment provides more than the power supply at the end of the automatic operation A.
  • the load on the lamp 20 is reduced by supplying a small supply power B1.
  • the power supply B1 is set to 50% to 99% of the power supplied at the end of the automatic operation A, for example.
  • the power supply B1 during idle operation may be set constant within a range of 50% to 99% of the power supplied at the end of automatic operation A. It may be set variably according to the length of the period of idle operation, such as setting a high ratio to the power supply at the end of A.
  • the illuminance decreases in proportion to the magnitudes of the supplied power B1 and the supplied power B2.
  • the supply power B1 of the illumination device 10 of the present embodiment is smaller than the supply power B2 of the conventional illumination device, the decrease in illuminance is small.
  • the illuminance sensor 32 cannot measure illuminance because the shutter 23 is not controlled to open. Therefore, in the idle operation B, the constant supply power B1 or B2 is supplied without adjustment (increase) of the power supply for correcting the decrease in illuminance.
  • the conventional lighting device supplies relatively large supply power C2 capable of correcting the decrease in illuminance that occurred during the period of idle operation B.
  • the illuminance drop that occurs during the period of the idle operation B is small, the illuminance drop is corrected by supplying the supply power C1 that is smaller than the supply power C2.
  • the small supply power B1 continues to be supplied even during the idle operation B. Therefore, in the automatic operation C, the rise time until the illuminance of the lamp 20 stabilizes is set to The rise time can be shortened compared to when the During the automatic operation C, similarly to the automatic operation A, the supplied electric powers C1 and C2 are gradually increased and supplied so as to correct the decrease in illuminance during the automatic operation C.
  • the automatic operation C After the exposure of the last substrate W is completed in , the maintenance operation (power supply stop step) D is entered and the lamps 20 are turned off. That is, the supplied power D1 is set to zero. Therefore, the illuminance reduction does not occur during the maintenance operation D.
  • the second period T2 is a relatively long period for maintenance of the substrate processing apparatus 200 and the like.
  • the lamp 20 is turned on again. Since there is no decrease in illuminance during maintenance operation D in which the supply power D1 is zero, supply powers E1 and E2 of the same magnitude as the last power supply C1 and C2 in automatic operation C are supplied at the start of automatic operation E. In the automatic operation E, similarly to the automatic operation C, the supplied electric powers E1 and E2 are gradually increased so as to correct the decrease in illuminance during the automatic operation E. Note that the lamp 20 may be turned off or turned on again in the maintenance operation D either automatically or manually.
  • the idling operation F is entered.
  • the shutter 23 is closed while the lamp 20 is left on, and the lighting device 10 of the present embodiment supplies power F1 smaller than the power supplied at the end of the automatic operation E, for example, at the end of the automatic operation E. 50% to 99% of the supplied power F1 is supplied.
  • the supply power F1 that is smaller than the supply power at the end of the automatic operation E is supplied, so the decrease in illuminance is smaller than that of the conventional lighting device.
  • Automatic operation and idle operation are repeated as necessary, and if the switching between automatic operation and idle operation is rapid, that is, if the supplied power fluctuates greatly, the illuminance of the exposure surface may become unstable when automatic operation resumes. Otherwise, the cooling mechanism for the lamp 20 may not be able to follow the fluctuations in the supplied power, and cooling may not be performed appropriately, which may accelerate the deterioration of the lamp 20 .
  • the power supplied during idling is controlled so that it does not fall below a predetermined set power. You may adjust the timing which changes the power supply of an idle operation. Alternatively, when the automatic operation is resumed from the idle operation, the exposure may not be performed for a predetermined time from the start of the automatic operation until the illuminance is stabilized.
  • a method for controlling an illumination device of an exposure apparatus capable of switching between the exposure and the suspension of the exposure comprising: In an idling period in which the exposure is suspended while the high pressure mercury lamp is lit, the shutter is closed and the power supplied to the high pressure mercury lamp is set to be smaller than the power supplied to the high pressure mercury lamp immediately before the idling period.
  • a method of controlling a lighting device comprising: According to this configuration, the interval between lamp replacement periods (apparent life) can be extended depending on the operation method of the lamp without changing the performance of the lamp itself.
  • the illumination device performs the idling process when a preprocessing unit that performs preprocessing for exposure on the substrate detects a first period in which the substrate is not processed; 2)
  • the lighting device stops supplying power to the high-pressure mercury lamp.
  • the lighting device control method according to (3) further comprising a supply stop step. According to this configuration, the power supply stop process can be set at an appropriate timing, and the interval between lamp replacement periods can be extended.
  • An exposure apparatus capable of switching between the exposure and the suspension of the exposure, (1) to (4), comprising a control device that performs the method for controlling the lighting device, Exposure equipment. According to this configuration, the intervals between lamp replacement periods are lengthened, and an exposure apparatus with high maintainability can be obtained.

Abstract

Provided is a method for controlling a lighting device that uses a high-pressure mercury lamp as a light source, wherein, in an idling period during which exposure is suspended in a state where the high-pressure mercury lamp is lighted, a shutter is closed, and power supply to the high-pressure mercury lamp is made smaller than power supply to the high-pressure mercury lamp immediately before the idling period. Consequently, the replacement interval (apparent life) of the lamp can be extended by an operation method for the lamp without changing the performance of the lamp itself.

Description

照明装置の制御方法及び露光装置Lighting device control method and exposure device
　本発明は、照明装置の制御方法及び露光装置に関し、特に、高圧水銀ランプを光源とする照明装置の制御方法及び該照明装置を備える露光装置に関する。 The present invention relates to a method of controlling an illumination device and an exposure device, and more particularly to a method of controlling an illumination device using a high-pressure mercury lamp as a light source and an exposure device equipped with the illumination device.
　露光装置に用いる高圧水銀ランプ(以下、ランプとも言う)は、ＬＥＤと異なり、一般的に点灯/消灯の応答性が低い。例えば、ＬＥＤはｍｓｅｃオーダーでの応答性を示すのに対し、ランプは照度が安定するまでに数分を要する。そのため、ＬＥＤにおいては、露光を行うときのみ点灯する制御が可能となるが、ランプにおいては、長期間の点灯が不要となるメンテナンス等を除いて、基本的に常時点灯しており、ランプの下流側に配置されたシャッターを開閉することにより、基板の露光と露光休止とを切り替えている。 Unlike LEDs, high-pressure mercury lamps (hereinafter also referred to as lamps) used in exposure equipment generally have low turn-on/turn-off responsiveness. For example, LEDs exhibit responsiveness on the order of milliseconds, while lamps require several minutes until the illuminance stabilizes. Therefore, the LED can be controlled to light only when performing exposure, but the lamp is basically always lit except for maintenance etc. where long-term lighting is unnecessary, and the downstream of the lamp By opening and closing a shutter arranged on the side, the substrate is switched between exposure and non-exposure.
　また、ランプの寿命は、一般的に数百～数千時間であり、ＬＥＤの寿命が数万時間であるのに比べて短命である。即ち、一定電圧が供給されたときに発光するランプの照度は、
点灯時間に反比例して次第に低下する特性を有している。以上のことから、ＬＥＤに比べてランプは非常に短期間で照度が低下し、比較的早く交換が要求される。 Moreover, the life of a lamp is generally several hundred to several thousand hours, which is short compared to the life of an LED, which is several tens of thousands of hours. That is, the illuminance of the lamp that emits light when a constant voltage is supplied is
It has a characteristic that it gradually decreases in inverse proportion to the lighting time. For the above reasons, compared to LEDs, lamps lose their illuminance in a very short period of time, and are required to be replaced relatively quickly.
　特許文献１に記載の近接露光装置の制御装置は、高圧水銀ランプに所定の電圧を印加した際に照度センサによって検出される照度を、複数のインテグレータ及び複数のフィルタの組合せ毎に、所定の照度としてそれぞれ記憶し、且つ、露光転写開始時の照度センサによって検出される照度が選択されたインテグレータ及びフィルタに応じた所定の照度となるように、供給する電圧を制御している。 A control device for a proximity exposure apparatus described in Patent Document 1 converts the illuminance detected by an illuminance sensor when a predetermined voltage is applied to a high-pressure mercury lamp to a predetermined illuminance for each combination of a plurality of integrators and a plurality of filters. , and the supplied voltage is controlled so that the illuminance detected by the illuminance sensor at the start of exposure transfer is a predetermined illuminance corresponding to the selected integrator and filter.
日本国特開２００８－１２９０４７号公報Japanese Patent Application Laid-Open No. 2008-129047
　ところで、特許文献１に記載の近接露光装置では、高圧水銀ランプを点灯した状態で、
比較的長時間露光を休止し、再度露光転写する場合には、所定の照度に戻すため、供給電圧を制御することが記載されているが、ランプの長寿命化についての記載はなく、さらなる改善の余地があった。 By the way, in the proximity exposure apparatus described in Patent Document 1, while the high-pressure mercury lamp is on,
It is described that the supply voltage is controlled in order to return to the predetermined illuminance when the relatively long exposure is paused and the exposure and transfer is performed again. There was room for
　本発明は、前述した課題に鑑みてなされたものであり、その目的は、ランプ自体の性能は変えずに、ランプの運用方法によって、ランプ交換期間の間隔（見かけ上の寿命）を延ばすことができる照明装置の制御方法及び露光装置を提供することにある。 The present invention has been made in view of the above-mentioned problems, and its object is to extend the interval between lamp replacement periods (apparent life) by changing the lamp operation method without changing the performance of the lamp itself. It is an object of the present invention to provide an illumination device control method and an exposure device that can
　本発明の上記目的は、下記の構成により達成される。
［１］　高圧水銀ランプを光源とし、マスクを介して基板に前記高圧水銀ランプからの露光光を照射して露光するとともに、前記高圧水銀ランプの下流側に配置されるシャッターを開閉することで、前記露光と前記露光の休止とを切り替え可能な、露光装置の照明装置の制御方法であって、
　前記高圧水銀ランプを点灯した状態で、前記露光を休止するアイドリング期間において、前記シャッターを閉じると共に、前記高圧水銀ランプへの供給電力を、前記アイドリング期間直前における前記高圧水銀ランプへの供給電力より小さくする、アイドリング工程、
を備える、照明装置の制御方法。
［２］　高圧水銀ランプを光源とし、マスクを介して基板に前記高圧水銀ランプからの露光光を照射して露光するとともに、前記高圧水銀ランプの下流側に配置されるシャッターを開閉することで、前記露光と前記露光の休止とを切り替え可能な、露光装置であって、
　［１］に記載の照明装置の制御方法を行う制御装置を備える、露光装置。 The above objects of the present invention are achieved by the following configurations.
[1] A high-pressure mercury lamp is used as a light source, and the substrate is irradiated with exposure light from the high-pressure mercury lamp through a mask for exposure. A method for controlling an illumination device of an exposure apparatus capable of switching between the exposure and the suspension of the exposure, comprising:
In an idling period in which the exposure is suspended while the high pressure mercury lamp is lit, the shutter is closed and the power supplied to the high pressure mercury lamp is set to be smaller than the power supplied to the high pressure mercury lamp immediately before the idling period. , idling process,
A method of controlling a lighting device, comprising:
[2] Using a high-pressure mercury lamp as a light source, irradiating the substrate with exposure light from the high-pressure mercury lamp through a mask for exposure, and opening and closing a shutter arranged downstream of the high-pressure mercury lamp, An exposure apparatus capable of switching between the exposure and the suspension of the exposure,
An exposure apparatus comprising a control device that performs the method for controlling an illumination device according to [1].
　本発明の照明装置の制御方法及び露光装置によれば、ランプ自体の性能は変えずに、ランプの運用方法によって、ランプ交換期間の間隔（見かけ上の寿命）を延ばすことができる。 According to the lighting device control method and the exposure device of the present invention, it is possible to extend the interval between lamp replacement periods (apparent life) depending on the method of operating the lamp without changing the performance of the lamp itself.
本発明に係る露光装置の概略構成を示すブロック図である。1 is a block diagram showing a schematic configuration of an exposure apparatus according to the present invention; FIG. 基板処理装置の全体構成を示す平面図である。It is a top view which shows the whole structure of a substrate processing apparatus. 照明装置の点灯時間と供給電力との関係を、従来の照明装置と比較して示すグラフである。It is a graph which shows the relationship between the lighting time of an illuminating device, and the power supply in comparison with the conventional illuminating device.
　以下、本発明に係る露光装置の一実施形態を図面に基づいて詳細に説明する。
　図１に示すように、露光装置１００は、マスクＭを保持するマスクステージＭｓと、基板Ｗを保持する基板ステージＷｓと、マスクＭを介して基板Ｗに露光光を照射する照明装置１０と、照明装置１０、マスクステージＭｓ及び基板ステージＷｓなどを制御する制御装置４０と、を主に備える。 An embodiment of an exposure apparatus according to the present invention will be described in detail below with reference to the drawings.
As shown in FIG. 1, an exposure apparatus 100 includes a mask stage Ms that holds a mask M, a substrate stage Ws that holds a substrate W, an illumination device 10 that irradiates the substrate W with exposure light through the mask M, It mainly includes a control device 40 that controls the illumination device 10, the mask stage Ms, the substrate stage Ws, and the like.
　照明装置１０は、紫外線照射用の光源である高圧水銀ランプ（以下、単にランプとも言う）２０と、ランプ２０から照射された光を集光する凹面鏡２１と、光路の向きを変えるための平面ミラー２２と、光路を開閉制御するシャッター２３と、シャッター２３の下流側に配置され、平面ミラー２２から出射される光の照度分布を均一にするオプティカルインテグレータ２４と、オプティカルインテグレータ２４から出射された光を平行光とし、
マスクＭを介して基板Ｗに向けて照射するコリメーションミラー２５と、を備える。 The illumination device 10 includes a high-pressure mercury lamp (hereinafter simply referred to as a lamp) 20 as a light source for ultraviolet irradiation, a concave mirror 21 for condensing the light emitted from the lamp 20, and a plane mirror for changing the direction of the optical path. 22, a shutter 23 for controlling the opening and closing of the optical path, an optical integrator 24 arranged downstream of the shutter 23 to uniform the illuminance distribution of the light emitted from the plane mirror 22, and the light emitted from the optical integrator 24. parallel light,
and a collimation mirror 25 for illuminating the substrate W through the mask M.
　照明装置１０は、上記した各ミラーなどの光学系以外にも、ランプ２０を冷却するためのブロアや、冷却風速を測定するためのピトー管（いずれも図示せず）なども含んでもよい。なお、ブロアは、ランプ２０への供給電力に比例した風量の風を発生させ、ランプ２０に吹き付けて冷却する。 The illumination device 10 may include a blower for cooling the lamp 20 and a pitot tube for measuring the cooling air velocity (both not shown) in addition to the optical system such as the mirrors described above. The blower generates a volume of air proportional to the power supplied to the lamp 20 and blows the air onto the lamp 20 to cool it.
　また、オプティカルインテグレータ２４の下流側には、ＮＤフィルタ、バンドパスフィルタ、ＤＵＶカットフィルタ等の不図示のフィルタが配置されてもよい。ＮＤフィルタは、ランプ２０からの光の量を減光するフィルタであり、バンドパスフィルタは、スペクトル分布の一部を切り出すフィルタであり、ＤＵＶカットフィルタは、短波長のスペクトルをカットするフィルタである。 Further, on the downstream side of the optical integrator 24, a filter (not shown) such as an ND filter, a bandpass filter, and a DUV cut filter may be arranged. The ND filter is a filter that reduces the amount of light from the lamp 20, the bandpass filter is a filter that cuts out part of the spectrum distribution, and the DUV cut filter is a filter that cuts the short wavelength spectrum. .
　ランプ２０には、ランプ２０に対する供給電力を調整可能なランプ点灯装置３１が設けられる。また、コリメーションミラー２５の後方には、コリメーションミラー２５に入射された光の照度、即ち、基板Ｗの露光面に照射される光の照度を検出する照度センサ３２が配置される。ランプ点灯装置３１、照度センサ３２、シャッター２３は、制御装置４０に接続されて制御される。 The lamp 20 is provided with a lamp lighting device 31 capable of adjusting power supplied to the lamp 20 . Further, behind the collimation mirror 25, an illuminance sensor 32 for detecting the illuminance of the light incident on the collimation mirror 25, that is, the illuminance of the light irradiated onto the exposure surface of the substrate W is arranged. The lamp lighting device 31, the illuminance sensor 32, and the shutter 23 are connected to and controlled by the control device 40. FIG.
　コリメーションミラー２５はハーフミラーであり、照射された光の一部はコリメーションミラー２５を通過して、後方に配置された照度センサ３２に入射する。これにより、コリメーションミラー２５に入射された光の照度が、照度センサ３２によって検出される。
　なお、コリメーションミラー２５は、ハーフミラーとせずに、照度センサ３２への入射光路上に小さな孔(図示せず)を設けておき、該孔を通過した光を照度センサ３２に導いて光の照度を検出するようにしてもよい。 The collimation mirror 25 is a half mirror, and part of the irradiated light passes through the collimation mirror 25 and enters the illuminance sensor 32 arranged behind. Thereby, the illuminance sensor 32 detects the illuminance of the light incident on the collimation mirror 25 .
The collimation mirror 25 is not a half-mirror, but a small hole (not shown) is provided on the incident light path to the illuminance sensor 32. Light passing through the hole is guided to the illuminance sensor 32, and the illuminance of the light is measured. may be detected.
　そして、露光時にそのシャッター２３が開制御されると、ランプ２０から照射された光は、平面ミラー２２、オプティカルインテグレータ２４、コリメーションミラー２５を介して、マスクステージＭｓに保持されるマスクＭ、ひいては基板ステージＷｓに保持される基板Ｗの露光面にパターン露光用の光として照射され、マスクＭの露光パターンが基板Ｗ上に露光転写される。
　また、本実施形態の露光装置１００では、照射される露光光の露光面での照度を一定に保ちながら露光する、定照度運転で行われる。 When the shutter 23 is controlled to be opened during exposure, the light emitted from the lamp 20 passes through the plane mirror 22, the optical integrator 24, and the collimation mirror 25, and passes through the mask M held by the mask stage Ms and the substrate. The exposure surface of the substrate W held on the stage Ws is irradiated with light for pattern exposure, and the exposure pattern of the mask M is transferred onto the substrate W by exposure.
Further, in the exposure apparatus 100 of the present embodiment, constant illumination intensity operation is performed in which exposure is performed while the illumination intensity of the irradiated exposure light on the exposure surface is kept constant.
　制御装置４０は、演算処理装置４１と、記憶装置４２と、タイマー４３と、不図示の入力及び出力インターフェースを備えており、照度センサ３２の照度検出、シャッター２３の開閉制御、ランプ点灯装置３１の供給電力の制御を行なう。また、制御装置４０は、基板ステージＷｓの送り制御、ステップ送り制御、アライメント調整機構及びチルト調整機構の駆動制御などを実行する。また、制御装置４０は、後述する基板処理装置２００の各装置の制御装置やセンサとフィールドネットワーク経由で接続されている。 The control device 40 includes an arithmetic processing unit 41, a storage device 42, a timer 43, and an input and output interface (not shown), and detects illuminance of the illuminance sensor 32, controls the opening and closing of the shutter 23, and controls the operation of the lamp lighting device 31. Controls power supply. The control device 40 also executes feed control and step feed control of the substrate stage Ws, drive control of the alignment adjustment mechanism and the tilt adjustment mechanism, and the like. The controller 40 is also connected to the controllers and sensors of each device of the substrate processing apparatus 200, which will be described later, via a field network.
　このような露光装置１００は、図２に示すように、基板処理装置２００の一部に組み込まれている。基板処理装置２００は、搬入・搬出部２０１、洗浄装置２０２、感光材塗布装置２０３、乾燥装置２０４、露光装置１００、現像装置２０５、及びポストベーク装置２０６がこの順で配置されており、各装置間には、搬送ロボット２１０がそれぞれ配置されている。搬送ロボット２１０は、基台２１１と、基台２１１に対して昇降かつ旋回可能に設けられたアーム２１２とを備え、前の装置から基板Ｗを受け取り、後の装置に受け渡す。 Such an exposure apparatus 100 is incorporated in a part of a substrate processing apparatus 200, as shown in FIG. The substrate processing apparatus 200 includes a loading/unloading unit 201, a cleaning device 202, a photosensitive material coating device 203, a drying device 204, an exposure device 100, a developing device 205, and a post-baking device 206, which are arranged in this order. A transport robot 210 is arranged between them. The transport robot 210 includes a base 211 and an arm 212 that is vertically and rotatably provided with respect to the base 211, receives the substrate W from the preceding device, and transfers it to the subsequent device.
　また、少なくとも、露光装置１００より上流側に配置されて、基板Ｗの前処理を行う各装置２０１～２０４のいずれか（ここでは、搬入・搬出部２０１）は、搬送されて前処理される基板Ｗの有無を検出するセンサ（例えば、搬送側の検出機構）４４を備え、基板Ｗの有無情報が露光装置１００の制御装置４０に送られる。 Further, at least one of the devices 201 to 204 (here, the loading/unloading unit 201) arranged upstream from the exposure apparatus 100 and performing preprocessing of the substrate W is a substrate to be transported and preprocessed. A sensor (for example, a transport-side detection mechanism) 44 for detecting the presence or absence of W is provided, and information on the presence or absence of the substrate W is sent to the controller 40 of the exposure apparatus 100 .
　具体的には、フィールドネットワーク経由で送られてきた前処理部におけるセンサ４４の基板供給信号に基づき、制御装置４０のタイマー４３は、前処理部において基板Ｗを処理しない時間が、第１の期間Ｔ１（例えば、３０秒以上、３０分未満）、及び第１の期間Ｔ１より長い第２の期間Ｔ２（３０分以上）であることを検出する。そして、制御装置４０が、検出された期間が、第１及び第２の期間Ｔ１、Ｔ２であるかに基づいて照明装置１０を制御する。また、前処理部の制御装置がタイマーを備え、前処理部において基板Ｗを処理しない時間を制御装置４０に送信するようにしてもよい。 Specifically, based on the substrate supply signal from the sensor 44 in the pretreatment section sent via the field network, the timer 43 of the control device 40 sets the time during which the substrate W is not processed in the pretreatment section to the first period. T1 (for example, 30 seconds or more and less than 30 minutes) and a second period T2 (30 minutes or more) longer than the first period T1 are detected. Then, the control device 40 controls the lighting device 10 based on whether the detected periods are the first and second periods T1 and T2. Further, the control device of the pretreatment section may be provided with a timer to transmit to the control device 40 the time during which the substrate W is not processed in the pretreatment section.
　ランプ２０の照度低下の主な要因は、ランプ２０の電極の消耗や、電極を覆うガラスの透明度低下であり、ランプ２０の照度は、点灯時間が長くなるにつれて徐々に低下し、また、供給電力が大きいほど低下する。したがって、ランプ２０の劣化は、点灯時間が同じであれば、供給電力が大きいほど速くなり、供給電力が小さいほど、ランプ２０の寿命が長くなる。 The main factors for the decrease in the illuminance of the lamp 20 are the consumption of the electrodes of the lamp 20 and the decrease in the transparency of the glass covering the electrodes. decreases as . Therefore, if the lighting time is the same, the deterioration of the lamp 20 becomes faster as the supplied power increases, and the life of the lamp 20 increases as the supplied power decreases.
　一方、上述した定照度運転を行うためには、点灯時間に比例して供給電力を増加させる必要がある。具体的には、シャッター２３により光路が開いた時、照度センサ３２が照度を検出し、この検出された照度が一定となるようにランプ点灯装置３１によって供給電力を大きくなるように制御して、低下したランプ２０の照度を元の照度に戻している。 On the other hand, in order to perform the constant illumination operation described above, it is necessary to increase the power supply in proportion to the lighting time. Specifically, when the light path is opened by the shutter 23, the illuminance sensor 32 detects the illuminance, and the lamp lighting device 31 controls to increase the supplied power so that the detected illuminance is constant. The reduced illuminance of the lamp 20 is returned to the original illuminance.
　図３は、照明装置１０の点灯時間と供給電力との関係を、従来の照明装置と比較して示すグラフである。なお、図３に示す自動運転とは、シャッター２３の開閉により達成される短時間（第１の期間Ｔ１より短い時間）の非露光時間を含む、例えば、ユーザーが１ロットにおいて複数の基板Ｗを露光している期間（露光工程）であり、この期間中、ランプ２０は連続点灯される。また、アイドル運転とは、次のロットの基板Ｗの露光準備が整うのを待っている期間(アイドリング工程)であり、非露光時間が第１の期間Ｔ１の範囲にある場合で、この期間中も、ランプ２０は連続点灯している。また、メンテナンス運転は、装置のメンテナンス作業のために第２の期間Ｔ２より長い期間に亘ってランプ２０を点灯する必要がない期間であり、ランプ２０を消灯する期間(電力供給停止工程)である。 FIG. 3 is a graph showing the relationship between the lighting time and the power supply of the lighting device 10 in comparison with a conventional lighting device. Note that the automatic operation shown in FIG. 3 includes a short non-exposure time (time shorter than the first period T1) achieved by opening and closing the shutter 23. For example, a user processes a plurality of substrates W in one lot. This is a period of exposure (exposure step), during which the lamp 20 is continuously lit. The idle operation is a period (idling process) during which the substrate W of the next lot is ready for exposure. Also, the lamp 20 is lit continuously. The maintenance operation is a period during which the lamp 20 does not need to be lit for a period longer than the second period T2 for maintenance work of the apparatus, and is a period during which the lamp 20 is extinguished (power supply stop step). .
　図３に示すように、自動運転Ａ（露光工程）において、図中破線で示す本実施形態の照明装置１０への供給電力Ａ１と、図中実線で示す従来の照明装置への供給電力Ａ２は、シャッター２３が開制御される度に照度センサ３２で測定される照度に基づいて、ランプ点灯装置３１が供給電力を次第に増加させて、低下（劣化）した照度分だけランプ２０の照度を高める。 As shown in FIG. 3, in the automatic operation A (exposure step), the power supply A1 to the lighting device 10 of the present embodiment indicated by the broken line in the figure and the power supply A2 to the conventional lighting device indicated by the solid line in the figure are , the lamp lighting device 31 gradually increases the supplied power based on the illuminance measured by the illuminance sensor 32 each time the shutter 23 is controlled to open, and increases the illuminance of the lamp 20 by the decreased (deteriorated) illuminance.
　なお、本実施形態及び従来における自動運転Ａの運転条件は、同一であるので、照度低下も同じである。従って、本実施形態の供給電力Ａ１と、従来の供給電力Ａ２は、同一であり次第に増加する。この供給電力の制御は、以下の自動運転Ｃ、Ｅ、Ｇにおいても同様である。 It should be noted that since the operating conditions of automatic operation A in this embodiment and the conventional one are the same, the illuminance decrease is also the same. Therefore, the supplied power A1 of the present embodiment and the conventional supplied power A2 are the same and gradually increase. This control of power supply is the same in automatic operation C, E, and G below.
　次いで、フィールドネットワーク経由で送られてきた前処理部におけるセンサ４４（図２参照）の基板供給信号により、基板Ｗを処理しない第１の期間Ｔ１が検出されると、自動運転Ａでの最後の基板Ｗの露光が終了した後、アイドル運転Ｂに入る。ここでは、ランプ２０を点灯したまま、シャッター２３を閉じる。そして、従来の照明装置では、自動運転Ａの終了時の供給電力である供給電力Ｂ２を供給し続けるのに対して、本実施形態の照明装置１０は、自動運転Ａの終了時の供給電力より小さい供給電力Ｂ１を供給してランプ２０への負荷を軽減させる。供給電力Ｂ１は、例えば、自動運転Ａの終了時の供給電力の５０％～９９％に設定される。
　なお、アイドル運転時の供給電力Ｂ１は、自動運転Ａの終了時の供給電力の５０％～９９％の範囲で一定に設定されてもよいし、アイドル運転の期間が短い場合には、自動運転Ａの終了時の供給電力に対して高い比率に設定するなど、アイドル運転の期間の長さに応じて可変に設定してもよい。 Next, when the first period T1 during which the substrate W is not processed is detected by the substrate supply signal from the sensor 44 (see FIG. 2) in the preprocessing section sent via the field network, the last period in the automatic operation A is detected. After the exposure of the substrate W is completed, the idle operation B is entered. Here, the shutter 23 is closed while the lamp 20 is left on. Further, in the conventional lighting device, the supply power B2, which is the power supply at the end of the automatic operation A, continues to be supplied, whereas the lighting device 10 of the present embodiment provides more than the power supply at the end of the automatic operation A. The load on the lamp 20 is reduced by supplying a small supply power B1. The power supply B1 is set to 50% to 99% of the power supplied at the end of the automatic operation A, for example.
The power supply B1 during idle operation may be set constant within a range of 50% to 99% of the power supplied at the end of automatic operation A. It may be set variably according to the length of the period of idle operation, such as setting a high ratio to the power supply at the end of A.
　アイドル運転Ｂにおいても、ランプ２０に電力が供給され続けるため、供給電力Ｂ１、及び供給電力Ｂ２の大きさに比例して照度の低下が発生する。しかし、本実施形態の照明装置１０の供給電力Ｂ１は、従来の照明装置の供給電力Ｂ２より小さいため照度低下は小さくなる。 Since power continues to be supplied to the lamp 20 even during idle operation B, the illuminance decreases in proportion to the magnitudes of the supplied power B1 and the supplied power B2. However, since the supply power B1 of the illumination device 10 of the present embodiment is smaller than the supply power B2 of the conventional illumination device, the decrease in illuminance is small.
　また、アイドル運転Ｂにおいては、シャッター２３が開制御されないため、照度センサ３２による照度測定を行うことができない。このため、アイドル運転Ｂにおいては、照度低下を補正するための供給電力の調整（増加）が行われず、一定の供給電力Ｂ１又はＢ２が供給される。 Also, in idle operation B, the illuminance sensor 32 cannot measure illuminance because the shutter 23 is not controlled to open. Therefore, in the idle operation B, the constant supply power B1 or B2 is supplied without adjustment (increase) of the power supply for correcting the decrease in illuminance.
　なお、第１の期間Ｔ１は、ランプ２０を一旦消灯してしまうと、再点灯時に照度が安定するまでに時間を要するため、露光を要する次の基板Ｗの到着時刻（待機時間）との兼ね合いから総合的に決定される時間である。 In the first period T1, once the lamp 20 is turned off, it takes time for the illuminance to stabilize when the lamp 20 is turned on again. is the time determined comprehensively from
　そして、再び自動運転Ｃが実行されると、従来の照明装置では、アイドル運転Ｂの期間に生じた照度低下を補正可能な比較的大きな供給電力Ｃ２が供給される。一方、本実施形態の照明装置１０では、アイドル運転Ｂの期間に生じた照度低下が小さいので、供給電力Ｃ２と比較して小さな供給電力Ｃ１の供給により照度低下が補正される。 Then, when automatic operation C is executed again, the conventional lighting device supplies relatively large supply power C2 capable of correcting the decrease in illuminance that occurred during the period of idle operation B. On the other hand, in the lighting device 10 of the present embodiment, since the illuminance drop that occurs during the period of the idle operation B is small, the illuminance drop is corrected by supplying the supply power C1 that is smaller than the supply power C2.
　また、本実施形態の照明装置１０では、アイドル運転Ｂにおいても小さな供給電力Ｂ１が供給され続けているので、自動運転Ｃにおいて、ランプ２０の照度が安定するまでの立ち上がり時間を、ランプ２０を消灯したときの立ち上がり時間と比較して短くすることができ、作業効率が向上する。そして、自動運転Ｃ中においては、自動運転Ａと同様に、自動運転Ｃ中おける照度低下を補正するように、供給電力Ｃ１、Ｃ２が次第に増加して供給される。 In addition, in the lighting device 10 of the present embodiment, the small supply power B1 continues to be supplied even during the idle operation B. Therefore, in the automatic operation C, the rise time until the illuminance of the lamp 20 stabilizes is set to The rise time can be shortened compared to when the During the automatic operation C, similarly to the automatic operation A, the supplied electric powers C1 and C2 are gradually increased and supplied so as to correct the decrease in illuminance during the automatic operation C.
　次いで、フィールドネットワーク経由で送られてきた前処理部におけるセンサ４４の基板供給信号により、基板Ｗを処理しない、第１の期間Ｔ１より長い、第２の期間Ｔ２が検出されると、自動運転Ｃでの最後の基板Ｗの露光が終了した後、メンテナンス運転（電力供給停止工程）Ｄに入り、ランプ２０を消灯する。即ち、供給電力Ｄ１をゼロとする。従って、メンテナンス運転Ｄにおける照度低下は発生しない。なお、第２の期間Ｔ２は、基板処理装置２００のメンテナンスを行うなどのための比較的長い期間である。 Next, when a substrate supply signal from the sensor 44 in the preprocessing section sent via the field network detects a second period T2 longer than the first period T1 during which the substrate W is not processed, the automatic operation C After the exposure of the last substrate W is completed in , the maintenance operation (power supply stop step) D is entered and the lamps 20 are turned off. That is, the supplied power D1 is set to zero. Therefore, the illuminance reduction does not occur during the maintenance operation D. The second period T2 is a relatively long period for maintenance of the substrate processing apparatus 200 and the like.
　次いで、メンテナンス終了後に再び自動運転Ｅが実行されると、ランプ２０が再点灯される。供給電力Ｄ１がゼロであるメンテナンス運転Ｄにおける照度低下はないので、自動運転Ｃにおける最後の供給電力Ｃ１、Ｃ２と同じ大きさの供給電力Ｅ１、Ｅ２が自動運転Ｅの開始時に供給される。そして、自動運転Ｅにおいても、自動運転Ｃと同様に、自動運転Ｅ中おける照度低下を補正するように供給電力Ｅ１、Ｅ２が次第に増加されて供給される。なお、メンテナンス運転Ｄにおけるランプ２０の消灯や再点灯は、自動・手動のいずれで行われてもよい。 　Next, when the automatic operation E is executed again after the maintenance is finished, the lamp 20 is turned on again. Since there is no decrease in illuminance during maintenance operation D in which the supply power D1 is zero, supply powers E1 and E2 of the same magnitude as the last power supply C1 and C2 in automatic operation C are supplied at the start of automatic operation E. In the automatic operation E, similarly to the automatic operation C, the supplied electric powers E1 and E2 are gradually increased so as to correct the decrease in illuminance during the automatic operation E. Note that the lamp 20 may be turned off or turned on again in the maintenance operation D either automatically or manually.
　そして、フィールドネットワーク経由で送られてきた前処理部におけるセンサ４４の基板供給信号により、基板Ｗを処理しない第１の期間Ｔ１が再び検出されると、自動運転Ｅでの最後の基板Ｗの露光が終了した後、アイドル運転Ｆに入る。アイドル運転Ｆでは、ランプ２０を点灯したまま、シャッター２３を閉じると共に、本実施形態の照明装置１０は、自動運転Ｅの終了時の供給電力より小さい供給電力Ｆ１、例えば、自動運転Ｅの終了時の供給電力の５０％～９９％の供給電力Ｆ１を供給する。アイドル運転Ｆでも、自動運転Ｅの終了時の供給電力より小さい供給電力Ｆ１が供給されるため、照度低下は従来の照明装置と比較して小さくなる。 Then, when the first period T1 in which the substrate W is not processed is detected again by the substrate supply signal from the sensor 44 in the preprocessing section sent via the field network, the final exposure of the substrate W in the automatic operation E is performed. is completed, the idling operation F is entered. In the idling operation F, the shutter 23 is closed while the lamp 20 is left on, and the lighting device 10 of the present embodiment supplies power F1 smaller than the power supplied at the end of the automatic operation E, for example, at the end of the automatic operation E. 50% to 99% of the supplied power F1 is supplied. Even during the idling operation F, the supply power F1 that is smaller than the supply power at the end of the automatic operation E is supplied, so the decrease in illuminance is smaller than that of the conventional lighting device.
　アイドル運転Ｆに続く自動運転Ｇでも、開始時に、アイドル運転Ｆ中に低下した照度を補正可能な電力Ｇ１が供給されるが、本実施形態の照明装置１０は、アイドル運転Ｆ中の供給電力Ｆ１が小さく、よって、照度低下も小さいので、供給電力の増加量は、従来の照明装置と比較して少なく抑えられる。従って、このような運転が繰り返されると、本実施形態の照明装置１０では、供給電力が、ランプ２０に供給可能な最大電力（寿命）に達するまでの期間を従来よりも長くすることができ、ランプ２０の交換期間の間隔が長くなり、見かけ上の寿命を延ばすことができる。 At the start of automatic operation G following idling operation F, power G1 that can correct the illuminance that decreased during idling operation F is supplied. is small, and therefore the decrease in illuminance is also small, so the amount of increase in power supply can be kept small compared to conventional lighting devices. Therefore, when such operation is repeated, in the lighting device 10 of the present embodiment, the period until the supplied power reaches the maximum power (service life) that can be supplied to the lamp 20 can be made longer than before, The intervals between replacement periods of the lamp 20 are lengthened, and the apparent life can be extended.
　なお、自動運転とアイドル運転は必要に応じて繰り返し行われ、自動運転とアイドル運転の切り替えが激しい場合、即ち、供給電力が激しく変動する場合、自動運転の再開時に露光面の照度が不安定になったり、供給電力の変動にランプ２０の冷却機構が追従できず、冷却が適切に行えずに、ランプ２０の劣化が早まることが懸念される。 Automatic operation and idle operation are repeated as necessary, and if the switching between automatic operation and idle operation is rapid, that is, if the supplied power fluctuates greatly, the illuminance of the exposure surface may become unstable when automatic operation resumes. Otherwise, the cooling mechanism for the lamp 20 may not be able to follow the fluctuations in the supplied power, and cooling may not be performed appropriately, which may accelerate the deterioration of the lamp 20 .
　上記実施形態では、アイドル運転時の供給電力が、所定の設定電力以下にならないように制御しているが、このほかに、アイドル運転開始から任意の時間経過、或いは制御装置４０からの指令により、アイドル運転の供給電力を変更するタイミングを調整してもよい。或いは、アイドル運転から自動運転に復帰したとき、自動運転開始時から、照度が安定するまでの所定の時間の間は露光を行わないようにしてもよい。 In the above embodiment, the power supplied during idling is controlled so that it does not fall below a predetermined set power. You may adjust the timing which changes the power supply of an idle operation. Alternatively, when the automatic operation is resumed from the idle operation, the exposure may not be performed for a predetermined time from the start of the automatic operation until the illuminance is stabilized.
　尚、本発明は、前述した実施形態に限定されるものではなく、適宜、変形、改良、等が可能である。 It should be noted that the present invention is not limited to the above-described embodiments, and can be modified, improved, etc. as appropriate.
　以上の通り、本明細書には次の事項が開示されている。
（１）　高圧水銀ランプを光源とし、マスクを介して基板に前記高圧水銀ランプからの露光光を照射して露光するとともに、前記高圧水銀ランプの下流側に配置されるシャッターを開閉することで、前記露光と前記露光の休止とを切り替え可能な、露光装置の照明装置の制御方法であって、
　前記高圧水銀ランプを点灯した状態で、前記露光を休止するアイドリング期間において、前記シャッターを閉じると共に、前記高圧水銀ランプへの供給電力を、前記アイドリング期間直前における前記高圧水銀ランプへの供給電力より小さくする、アイドリング工程、
を備える、照明装置の制御方法。
　この構成によれば、ランプ自体の性能は変えずに、ランプの運用方法によって、ランプ交換期間の間隔（見かけ上の寿命）を延ばすことができる。 As described above, this specification discloses the following matters.
(1) Using a high-pressure mercury lamp as a light source, irradiating the substrate with exposure light from the high-pressure mercury lamp through a mask for exposure, and opening and closing a shutter arranged downstream of the high-pressure mercury lamp, A method for controlling an illumination device of an exposure apparatus capable of switching between the exposure and the suspension of the exposure, comprising:
In an idling period in which the exposure is suspended while the high pressure mercury lamp is lit, the shutter is closed and the power supplied to the high pressure mercury lamp is set to be smaller than the power supplied to the high pressure mercury lamp immediately before the idling period. , idling process,
A method of controlling a lighting device, comprising:
According to this configuration, the interval between lamp replacement periods (apparent life) can be extended depending on the operation method of the lamp without changing the performance of the lamp itself.
（２）　前記アイドリング工程の前記供給電力は、前記アイドリング期間直前における前記供給電力の５０％から９９％である、（１）に記載の照明装置の制御方法。
　この構成によれば、アイドリング期間における照度低下を低減することができ、これによりランプ交換期間の間隔（見かけ上の寿命）を延ばすことができる。また、再点灯時の立ち上がり時間を短くして作業効率が向上する。 (2) The lighting device control method according to (1), wherein the supplied power in the idling process is 50% to 99% of the supplied power immediately before the idling period.
According to this configuration, it is possible to reduce the decrease in illuminance during the idling period, thereby extending the interval between lamp replacement periods (apparent life). Also, the work efficiency is improved by shortening the rise time at the time of relighting.
（３）　前記基板に対して露光の前処理を行う前処理部において、前記基板を処理しない第１の期間が検出されたときに、前記照明装置は前記アイドリング工程を行う、（１）または（２）に記載の照明装置の制御方法。
　この構成によれば、適切なタイミングでアイドリング工程を設定できる。 (3) the illumination device performs the idling process when a preprocessing unit that performs preprocessing for exposure on the substrate detects a first period in which the substrate is not processed; 2) The control method of the lighting device according to the above.
According to this configuration, the idling process can be set at an appropriate timing.
（４）　前記前処理部において、前記第１の期間より長い、前記基板を処理しない第２の期間が検出されたときに、前記照明装置は前記高圧水銀ランプへ供給する電力を停止する、電力供給停止工程をさらに備える、（３）に記載の照明装置の制御方法。
　この構成によれば、適切なタイミングで電力供給停止工程を設定でき、ランプ交換期間の間隔を延ばすことができる。 (4) When the preprocessing unit detects a second period during which the substrate is not processed and is longer than the first period, the lighting device stops supplying power to the high-pressure mercury lamp. The lighting device control method according to (3), further comprising a supply stop step.
According to this configuration, the power supply stop process can be set at an appropriate timing, and the interval between lamp replacement periods can be extended.
（５）　高圧水銀ランプを光源とし、マスクを介して基板に前記高圧水銀ランプからの露光光を照射して露光するとともに、前記高圧水銀ランプの下流側に配置されるシャッターを開閉することで、前記露光と前記露光の休止とを切り替え可能な露光装置であって、
　（１）～（４）のいずれか１つに記載の照明装置の制御方法を行う制御装置を備える、
露光装置。
　この構成によれば、ランプ交換期間の間隔が長くなり、メンテナンス性の高い露光装置が得られる。 (5) Using a high-pressure mercury lamp as a light source, irradiating the substrate with exposure light from the high-pressure mercury lamp through a mask for exposure, and opening and closing a shutter arranged downstream of the high-pressure mercury lamp, An exposure apparatus capable of switching between the exposure and the suspension of the exposure,
(1) to (4), comprising a control device that performs the method for controlling the lighting device,
Exposure equipment.
According to this configuration, the intervals between lamp replacement periods are lengthened, and an exposure apparatus with high maintainability can be obtained.
　なお、本出願は、２０２１年４月２３日出願の日本特許出願（特願２０２１－０７３３２９）に基づくものであり、その内容は本出願の中に参照として援用される。 This application is based on a Japanese patent application (Japanese Patent Application No. 2021-073329) filed on April 23, 2021, the contents of which are incorporated herein by reference.
１０　　照明装置
２０　　高圧水銀ランプ
２３　　シャッター
１００　露光装置
２０１　インデクサ部（前処理部）
２０２　洗浄装置（前処理部）
２０３　感光材塗布装置（前処理部）
２０４　乾燥装置（前処理部）
Ａ１，Ｂ１，Ｃ１，Ｄ１，Ｅ１，Ｆ１，Ｇ１　　供給電力
Ｂ，Ｆ　アイドル運転（アイドリング期間、アイドリング工程）
Ｄ　　　メンテナンス運転（電力供給停止工程）
Ｍ　　　マスク
Ｗ　　　基板 10 lighting device 20 high-pressure mercury lamp 23 shutter 100 exposure device 201 indexer section (preprocessing section)
202 cleaning device (pretreatment unit)
203 Photosensitive material coating device (preprocessing unit)
204 drying device (pretreatment unit)
A1, B1, C1, D1, E1, F1, G1 Supply power B, F Idle operation (idling period, idling process)
D Maintenance operation (power supply stop process)
M Mask W Substrate

Claims (5)

  1. 　高圧水銀ランプを光源とし、マスクを介して基板に前記高圧水銀ランプからの露光光を照射して露光するとともに、前記高圧水銀ランプの下流側に配置されるシャッターを開閉することで、前記露光と前記露光の休止とを切り替え可能な、露光装置の照明装置の制御方法であって、
    　前記高圧水銀ランプを点灯した状態で、前記露光を休止するアイドリング期間において、前記シャッターを閉じると共に、前記高圧水銀ランプへの供給電力を、前記アイドリング期間直前における前記高圧水銀ランプへの供給電力より小さくする、アイドリング工程、
    を備える、照明装置の制御方法。     Using a high-pressure mercury lamp as a light source, the substrate is irradiated with exposure light from the high-pressure mercury lamp through a mask for exposure, and by opening and closing a shutter disposed downstream of the high-pressure mercury lamp, the exposure and A control method for an illumination device of an exposure apparatus capable of switching between exposure and pause, comprising:
    In an idling period in which the exposure is suspended while the high pressure mercury lamp is lit, the shutter is closed and the power supplied to the high pressure mercury lamp is set to be smaller than the power supplied to the high pressure mercury lamp immediately before the idling period. , idling process,
    A method of controlling a lighting device, comprising:
  2. 　前記アイドリング工程の前記供給電力は、前記アイドリング期間直前における前記供給電力の５０％から９９％である、請求項１に記載の照明装置の制御方法。 The method of controlling a lighting device according to claim 1, wherein the supplied power in the idling process is 50% to 99% of the supplied power immediately before the idling period.
  3. 　前記基板に対して露光の前処理を行う前処理部において、前記基板を処理しない第１の期間が検出されたときに、前記照明装置は前記アイドリング工程を行う、請求項１または２に記載の照明装置の制御方法。 3. The lighting device according to claim 1, wherein in a preprocessing unit that performs preprocessing for exposure on the substrate, the illumination device performs the idling step when a first period during which the substrate is not processed is detected. A control method for a lighting device.
  4. 　前記前処理部において、前記第１の期間より長い、前記基板を処理しない第２の期間が検出されたときに、前記照明装置は前記高圧水銀ランプへ供給する電力を停止する、電力供給停止工程をさらに備える、請求項３に記載の照明装置の制御方法。 A power supply stopping step of stopping power supply to the high-pressure mercury lamp by the lighting device when the pretreatment unit detects a second period during which the substrate is not processed and is longer than the first period. The method of controlling a lighting device according to claim 3, further comprising:
  5. 　高圧水銀ランプを光源とし、マスクを介して基板に前記高圧水銀ランプからの露光光を照射して露光するとともに、前記高圧水銀ランプの下流側に配置されるシャッターを開閉することで、前記露光と前記露光の休止とを切り替え可能な露光装置であって、
    　請求項１～４のいずれか１項に記載の照明装置の制御方法を行う制御装置を備える、露光装置。     Using a high-pressure mercury lamp as a light source, the substrate is irradiated with exposure light from the high-pressure mercury lamp through a mask for exposure, and by opening and closing a shutter disposed downstream of the high-pressure mercury lamp, the exposure and An exposure apparatus capable of switching between exposure and pausing,
    An exposure apparatus comprising a control device that performs the control method for an illumination device according to any one of claims 1 to 4.
PCT/JP2022/006788 2021-04-23 2022-02-18 Method for controlling lighting device, and exposure device WO2022224576A1 (en)

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JPS6120324A (en) * 1984-07-07 1986-01-29 Ushio Inc Method for exposing material of semiconductor wafer by mercury lamp
JPS6120323A (en) * 1984-07-07 1986-01-29 Ushio Inc Method for exposing material of semiconductor wafer by mercury lamp
JP2000003846A (en) * 1998-06-15 2000-01-07 Canon Inc Aligner
JP2000181075A (en) * 1998-12-11 2000-06-30 Ushio Inc Lamp illumination control method of exposure device
JP2008281934A (en) * 2007-05-14 2008-11-20 Harison Toshiba Lighting Corp Ultraviolet radiation device
WO2019111769A1 (en) * 2017-12-08 2019-06-13 フェニックス電機株式会社 Lamp lighting method

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS605119U (en) * 1983-06-24 1985-01-14 沖電気工業株式会社 exposure equipment
JPS6120324A (en) * 1984-07-07 1986-01-29 Ushio Inc Method for exposing material of semiconductor wafer by mercury lamp
JPS6120323A (en) * 1984-07-07 1986-01-29 Ushio Inc Method for exposing material of semiconductor wafer by mercury lamp
JP2000003846A (en) * 1998-06-15 2000-01-07 Canon Inc Aligner
JP2000181075A (en) * 1998-12-11 2000-06-30 Ushio Inc Lamp illumination control method of exposure device
JP2008281934A (en) * 2007-05-14 2008-11-20 Harison Toshiba Lighting Corp Ultraviolet radiation device
WO2019111769A1 (en) * 2017-12-08 2019-06-13 フェニックス電機株式会社 Lamp lighting method

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