WO2022217498A1

WO2022217498A1 - Gas pipeline cleaning mechanism for chemical vapor deposition system

Info

Publication number: WO2022217498A1
Application number: PCT/CN2021/087240
Authority: WO
Inventors: 钟锋; 刘芹康
Original assignee: 台湾积体电路制造股份有限公司; 台积电(中国)有限公司
Priority date: 2021-04-12
Filing date: 2021-04-14
Publication date: 2022-10-20
Also published as: CN213378315U

Abstract

A gas pipeline cleaning mechanism for a chemical vapor deposition system. The gas pipeline cleaning mechanism comprises a housing, a transfer pump and a first pipeline. The housing comprises a mounting cavity and a cleaning fluid cavity that are isolated from each other, and the cleaning fluid cavity is used for accommodating a cleaning fluid; the transfer pump is arranged in the mounting cavity, and the transfer pump comprises a fluid input end and a fluid output end, wherein the fluid input end communicates with the mounting cavity and is used for sucking the cleaning fluid; and one end of the first pipeline communicates with the fluid output end, and the other end thereof is provided with a pipeline interface fitted with a fluid inlet of a gas pipeline. In comparison with manually squeezing a spraying pot, the flowing speed of a cleaning fluid transferred by the transfer pump is stable, and the stress on the gas pipeline is uniform. In addition, the pipeline interface is fitted with the fluid inlet of the gas pipeline, and thus a good leakproof effect is achieved. Therefore, the gas pipeline cleaning mechanism is less prone to having leakage of a cleaning fluid, and is less prone to the risk of corroding an operator's hands and the risk of causing a machine to stop running, thereby improving the safety of an operator, and enhancing the stability of a machine.

Description

Gas Pipe Cleaning Mechanism for Chemical Vapor Deposition Systems

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims the priority of Chinese Patent Application No. 202120738129.8 filed on April 12, 2021, entitled "Gas Pipe Cleaning Mechanism for Chemical Vapor Deposition System", the entire content of which is incorporated herein by reference.

technical field

The present application relates to the field of chemical vapor deposition system cleaning, in particular to a gas pipeline cleaning mechanism for chemical vapor deposition systems.

Background technique

Chemical vapor deposition is mainly a method of using one or several gas-phase compounds or elemental substances containing thin film elements to perform chemical reactions on the surface of the substrate to form thin films. The gas lines of chemical vapor deposition systems (such as tungsten metal chemical vapor deposition systems) require periodic cleaning. At present, the cleaning solution is mainly squeezed into the gas pipeline through a hand-held cleaning solution bottle for cleaning. This method is easy to splash the cleaning solution, which has the risk of corroding the operator's hands and causing the machine to stop running.

SUMMARY OF THE INVENTION

The purpose of this application is to provide an energy storage device, an energy storage system, an energy storage method and a wind power generator set, the energy storage device can quickly consume the extra energy of an external energy device and store it in the form of thermal energy.

The present application provides a gas pipeline cleaning mechanism for a chemical vapor deposition system, which aims to solve the problem that cleaning liquid is easily splashed when cleaning the gas pipeline, which causes corrosion of the operator's hands and the risk of causing the machine to stop running.

The embodiment of the present application proposes a gas pipeline cleaning mechanism for a chemical vapor deposition system, which includes a casing, a delivery pump and a first pipeline.

The housing includes an installation cavity and a washing liquid cavity isolated from each other, and the washing liquid cavity is used for accommodating washing liquid;

a delivery pump, which is arranged in the installation cavity, the delivery pump includes a liquid inlet end and a liquid outlet end, and the liquid inlet end communicates with the installation cavity and is used for absorbing the cleaning liquid;

One end of the first pipeline is communicated with the liquid outlet end, and the other end is provided with a pipeline interface adapted to the liquid inlet of the gas pipeline.

According to an embodiment of the present application, the pipe interface includes a first interface section and a second interface section that communicate with each other, the first interface section communicates with the first pipe, and the second interface section has a connection with the In the threaded interface matched with the liquid inlet, the extension direction of the second interface segment and the extension direction of the first interface segment are not on the same straight line.

According to an embodiment of the present application, the extending direction of the second interface segment is perpendicular to the extending direction of the first interface segment.

According to an embodiment of the present application, the gas pipeline cleaning mechanism further includes a washing liquid bottle placed in the washing liquid cavity, and the washing liquid bottle is used for accommodating the washing liquid; Two pipelines are communicated with the lotion bottle.

According to an embodiment of the present application, the number of the lotion bottles is multiple, and the cleaning solutions contained in at least two lotion bottles are different.

According to an embodiment of the present application, the housing is further provided with an adjustment switch electrically connected to the infusion pump.

According to an embodiment of the present application, the gas pipeline cleaning mechanism further includes a waste liquid recovery chamber, and the waste liquid recovery chamber communicates with the liquid outlet of the gas pipeline through a third pipeline.

According to an embodiment of the present application, the gas pipeline cleaning mechanism further includes an alarm mechanism, and the alarm mechanism is a liquid level alarm mechanism disposed in the washing liquid chamber and/or a flow alarm mechanism disposed in the first pipeline .

According to an embodiment of the present application, the installation cavity is a closed cavity, and the top of the lotion cavity is open.

According to an embodiment of the present application, the gas pipeline cleaning mechanism further includes a handle provided at the top.

According to the gas pipeline cleaning mechanism for the chemical vapor deposition system according to the embodiment of the present application, the cleaning solution chamber contains the cleaning solution. The delivery pump is arranged in the installation cavity, sucks the cleaning liquid through the liquid inlet end, flows out through the liquid outlet end, and then transports it to the gas pipeline through the first pipeline. Compared with the manual squeezing of the watering can, the flow speed of the cleaning liquid delivered by the conveying pump is relatively stable, and the force of the gas pipeline is relatively uniform; and the pipeline interface is adapted to the liquid inlet of the gas pipeline, and the airtightness is better. Therefore, the gas pipeline cleaning mechanism is not prone to leakage of cleaning fluid, corrosion of the operator's hands and the risk of causing the machine to stop running, thereby improving the safety of the operator and enhancing the stability of the machine. sex.

Description of drawings

The present application can be better understood from the following description of specific embodiments of the present application in conjunction with the accompanying drawings, wherein other features, objects and advantages of the present application can be better understood by reading the following detailed description of non-limiting embodiments with reference to the accompanying drawings. It will become apparent that the same or similar reference numbers refer to the same or similar features.

1 is a partial structural schematic diagram of a gas pipeline cleaning mechanism for a chemical vapor deposition system disclosed in an embodiment of the present application;

2 is a partial structural schematic diagram of a gas pipeline cleaning mechanism for a chemical vapor deposition system disclosed in another embodiment of the present application;

FIG. 3 is a schematic structural diagram of a gas pipeline cleaning mechanism for a chemical vapor deposition system in cooperation with a gas pipeline according to an embodiment of the present application.

Detailed ways

The embodiments of the present application will be described in further detail below with reference to the accompanying drawings and examples. The following detailed description of the embodiments and the accompanying drawings are used to illustrate the principles of the present application by way of example, but should not be used to limit the scope of the present application, that is, the present application is not limited to the described embodiments.

In the description of this application, it should be noted that, unless otherwise specified, the meaning of "plurality" is two or more; the terms "upper", "lower", "left", "right", "inner", " The orientation or positional relationship indicated by "outside" is only for the convenience of describing the present application and simplifying the description, rather than indicating or implying that the indicated device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a reference to the present application. Application restrictions. Furthermore, the terms "first," "second," etc. are used for descriptive purposes only and should not be construed to indicate or imply relative importance. "Vertical" is not strictly vertical, but within the allowable range of errors. "Parallel" is not strictly parallel, but within the allowable range of errors.

In the description of this application, it should also be noted that, unless otherwise expressly specified and limited, the terms "installed", "connected" and "connected" should be understood in a broad sense, for example, it may be a fixed connection or a connectable connection. Detachable connection, or integral connection; it can be directly connected or indirectly connected through an intermediate medium. For those of ordinary skill in the art, the specific meanings of the above terms in the present application can be understood according to specific circumstances.

After noticing the problem that the cleaning solution is easily spilled by holding the cleaning solution bottle and squeezing the cleaning solution into the gas pipeline for cleaning, the applicant conducts research and finds that the problem is mainly caused by two reasons. First, the liquid outlet pipe of the lotion bottle extends into the liquid inlet of the gas pipeline. There is a large gap between the liquid outlet pipe and the gas pipeline, and the sealing is not strict, and the cleaning liquid is easy to flow out from the liquid inlet. Second, the manual squeezing of the lotion bottle cannot control the flow rate of the cleaning solution stably. The flow rate of the cleaning fluid is mainly determined by the squeezing force applied by the operator. When just squeezed in, the operator is prone to poor grasp of strength, resulting in the flow rate of the cleaning liquid being too low, and part of the cleaning liquid is not easy to enter the gas pipeline and drip from the liquid inlet of the gas pipeline; or the flow rate of the cleaning liquid is too high , part of the cleaning liquid and the inner wall of the gas pipeline impact sputtering rebound and drip from the liquid inlet of the gas pipeline.

Based on the above problems discovered by the applicant, the applicant has designed a gas pipeline cleaning mechanism for a chemical vapor deposition system, and the embodiments of the present application will be further described below.

The embodiment of the present application proposes a gas pipeline cleaning mechanism for a chemical vapor deposition system, including a casing 100 , a delivery pump 200 and a first pipeline 300 . The housing 100 includes an installation cavity 110 and a washing liquid cavity 120 which are isolated from each other. The washing liquid cavity 120 is used for accommodating the washing liquid; the delivery pump 200 is arranged in the installation cavity 110, and the delivery pump 200 includes a liquid inlet end and a liquid outlet end. One end of the first pipe 300 is communicated with the liquid outlet end, and the other end is provided with a pipe interface 310 adapted to the liquid inlet of the gas pipe 400 .

See Figures 1 and 2. FIG. 1 is a partial structural schematic diagram of a gas pipeline cleaning mechanism for a chemical vapor deposition system disclosed in an embodiment of the present application. FIG. 1 shows the internal structure of the gas duct cleaning mechanism. FIG. 2 is a partial structural schematic diagram of a gas pipeline cleaning mechanism for a chemical vapor deposition system disclosed in another embodiment of the present application. Figure 2 shows the main structure of the gas pipe cleaning mechanism. Fig. 3 is a schematic structural diagram of a gas pipeline cleaning mechanism for a chemical vapor deposition system and a gas pipeline as disclosed in an embodiment of the present application. FIG. 3 shows a schematic diagram of the gas pipeline cleaning mechanism cleaning the gas pipeline. It should be noted that, in order to comprehensively show the main structure of the gas pipeline cleaning mechanism, the corresponding pipelines are simplified. For example, the first pipeline 300 only shows the parts at both ends, and the middle part of the first pipeline 300 is omitted. It does not mean that the first pipe 300 is disconnected, and only includes the structure of both ends shown in FIG. 3 . Other pipelines have also been processed accordingly, which will be explained together here.

The washing liquid chamber 120 contains the washing liquid. The delivery pump 200 is arranged in the installation cavity 110 , sucks the cleaning fluid through the liquid inlet end, flows out through the liquid outlet end, and then transports it into the gas pipeline 400 through the first pipeline 300 . Compared with the manual squeezing of the watering can, the flow speed of the cleaning liquid delivered by the delivery pump 200 is relatively stable, and the force of the gas pipeline 400 is relatively uniform; Therefore, the gas pipeline cleaning mechanism is not prone to leakage of cleaning fluid, corrosion of the operator's hands and the risk of causing the machine to stop running, thereby improving the safety of the operator and enhancing the stability of the machine. sex.

It should be noted that, refer to FIG. 1 and FIG. 2 . The installation cavity 110 is provided with a delivery pump 200 and a matching circuit structure. The installation cavity 110 and the washing liquid cavity 120 are isolated from each other. The circuit structure is short-circuited, or the cleaning liquid can be prevented from corroding the delivery pump 200 or the circuit structure, thereby making the gas pipeline cleaning mechanism run smoothly and prolonging the service life. The washing liquid chamber 120 can directly hold the washing liquid, or hold a container containing the washing liquid, such as the washing liquid bottle 500 .

The transfer pump 200 includes many different types of liquid pumps, such as centrifugal pumps, piston pumps, and the like. The liquid inlet end of the delivery pump 200 is directly communicated with the installation cavity 110 or communicated with the installation cavity 110 through a pipeline, and the liquid inlet end is used to absorb the cleaning liquid. The speed at which the delivery pump 200 delivers the cleaning liquid is relatively stable.

See Figures 1 and 2. The first pipe 300 can be a hard pipe that cannot be bent, such as a metal pipe. The hard pipe has high strength and long service life. The first pipe 300 can also be a bendable flexible pipe, such as a plastic pipe. The flexible pipe can be bent and coiled, and is less limited by space, which is convenient to be arranged in the chemical vapor deposition system, and is convenient to be connected with the gas pipe 400. connect.

One end of the first pipe 300 is communicated with the liquid outlet end, and the other end is communicated with the liquid inlet of the gas pipe 400 through the pipe interface 310 . The pipeline interface 310 is adapted to the liquid inlet of the gas pipeline 400, so that the liquid inlet of the gas pipeline 400 forms a relatively closed structure to prevent the cleaning liquid from flowing out of the liquid inlet. For example, the pipeline interface 310 is a rubber plug with a cannula in the middle, the first pipeline 300 is communicated with the gas pipeline 400 through the cannula, and the rubber stopper and the inner wall of the gas pipeline 400 are closely attached. Threaded connection for liquid port adaptation.

In some embodiments, see FIG. 2 . The pipeline interface 310 includes a first interface segment 311 and a second interface segment 312 that communicate with each other, the first interface segment 311 communicates with the first pipeline 300, the second interface segment 312 has a threaded interface that is matched with the liquid inlet, and the second interface segment The extension direction of 312 and the extension direction of the first interface segment 311 are not on the same straight line.

The interior of the first interface segment 311 and the interior of the second interface segment 312 both have hollow lumen, and the hollow lumen of the two are communicated for the passage of cleaning liquid. The second interface section 312 has a threaded interface matched with the liquid inlet, and the threaded interface is designed as a matching external threaded interface or an internal threaded interface according to the threaded structure of the liquid inlet. The second interface section 312 is connected with the liquid inlet through threads, so the connection with the liquid inlet is relatively firm, with good airtightness and convenient disassembly and assembly. The space where the gas pipeline 400 is located is relatively narrow, and the installation of the pipeline interface 310 is limited to a certain extent. The extending direction of the second interface segment 312 is not on the same straight line as the extending direction of the first interface segment 311 , that is, there is a certain angle between the second interface segment 312 and the first interface segment 311 . The length of the pipe interface 310 in the extending direction of the second interface section 312 is relatively short, and the installation space required in this direction is small, so the pipe interface 310 is easy to be installed at the liquid inlet.

In some embodiments, referring to FIG. 2 , the extending direction of the second interface segment 312 is perpendicular to the extending direction of the first interface segment 311 . In this way, the length of the pipe interface 310 in the extending direction of the second interface section 312 is shorter, and the required installation space in this direction is smaller, so the installation of the pipe interface 310 is also more convenient.

In some embodiments, referring to FIG. 2 , the gas pipeline cleaning mechanism further includes a cleaning solution bottle 500 placed in the cleaning solution chamber 120 , and the cleaning solution bottle 500 is used for accommodating cleaning solution; the liquid inlet end communicates with the cleaning solution through the second pipeline 800 The liquid bottle 500 is communicated.

A washing liquid bottle 500 for use is placed in the washing liquid chamber 120, and the washing liquid is accommodated in the washing liquid bottle 500 and does not directly contact the casing 100, so as to keep the casing 100 hygienic and tidy. Meanwhile, there are various cleaning liquids required for cleaning the gas pipeline 400, including at least distilled water and hydrogen peroxide. The cleaning solution bottle 500 is also convenient to replace the cleaning solution. The bottle cap of the lotion bottle 500 is provided with a liquid outlet pipe 510 extending from the outside of the bottle cap to the inside of the bottle. The second pipe 800 may adopt a structure similar to that of the first pipe 300 , such as a rigid pipe or a soft pipe, and the specific structure thereof will not be described again.

In some embodiments, referring to FIG. 2 , the number of the lotion bottles 500 is multiple, and the cleaning solutions contained in at least two lotion bottles 500 are different.

The space of the lotion chamber 120 is relatively large, and a plurality of lotion bottles 500 can be placed at the same time. Among the plurality of washing liquid bottles 500 , at least two washing liquid bottles 500 are placed with different washing liquids, such as at least one washing liquid bottle 500 containing distilled water and one washing liquid bottle 500 containing hydrogen peroxide. Washing liquid bottles 500 with different washing liquids are placed in the washing liquid chamber 120 at the same time. When the washing liquid needs to be replaced, the operation is convenient and the cleaning efficiency of the gas pipeline 400 is improved.

In some embodiments, referring to FIG. 3 , the housing 100 is further provided with an adjustment switch 130 that is electrically connected to the infusion pump. The adjustment switch 130 can control the power of the infusion pump, thereby controlling the flow rate of the cleaning solution. In this way, the flow rate of the cleaning liquid can be controlled according to the requirements of the cleaning gas pipeline 400 .

In some embodiments, referring to FIG. 3 , the gas pipeline cleaning mechanism further includes a waste liquid recovery chamber 600 , and the waste liquid recovery chamber 600 communicates with the liquid outlet of the gas pipeline 400 through the third pipeline 900 . In this way, the function of the gas pipeline cleaning mechanism is more complete and the use is more convenient. The waste liquid recovery chamber 600 can be integrated into the casing 100 , or can be separately provided separately from the casing 100 . The third pipe 900 may adopt a structure similar to that of the first pipe 300 , such as a rigid pipe or a soft pipe, and the specific structure thereof will not be described again.

In some embodiments, the gas pipeline cleaning mechanism further includes an alarm mechanism, and the alarm mechanism is a liquid level alarm mechanism provided in the washing liquid chamber 120 and/or a flow rate alarm mechanism provided in the first pipeline 300 .

When the cleaning liquid is exhausted or nearly exhausted, the liquid level of the cleaning liquid chamber 120 is low, and the liquid level alarm mechanism triggers an alarm signal to remind the operator to close the gas pipeline cleaning mechanism or replenish the cleaning liquid. Similarly, when the cleaning liquid is exhausted or nearly exhausted, the flow rate of the first pipeline 300 is small, and the flow alarm mechanism triggers an alarm signal to remind the operator to close the gas pipeline cleaning mechanism or replenish the cleaning liquid. It can be understood that the alarm mechanism can also be electrically connected to the delivery pump 200, so that when the alarm mechanism is triggered, the delivery pump 200 can automatically stop running, thereby improving the automation degree of the gas pipeline cleaning mechanism.

In some embodiments, referring to FIG. 2 , the mounting cavity 110 is a closed cavity, and the top of the lotion cavity 120 is open. The installation cavity 110 is closed, which can better protect the delivery pump 200 . The top of the lotion chamber 120 is open, so that the lotion bottle 500 can be easily placed.

In some embodiments, referring to FIG. 2 , the gas duct cleaning mechanism further includes a handle 700 disposed on the top. The carrying handle 700 is provided to facilitate moving the gas pipe cleaning mechanism to a proper position.

While the application has been described with reference to preferred embodiments, various modifications may be made and equivalents may be substituted for parts thereof without departing from the scope of the application, particularly, provided that there is no structural conflict , each technical feature mentioned in each embodiment can be combined in any manner. The present application is not limited to the specific embodiments disclosed herein, but includes all technical solutions falling within the scope of the claims.

Claims

A gas pipeline cleaning mechanism for a chemical vapor deposition system, comprising:

a housing, including an installation cavity and a washing liquid cavity isolated from each other, the washing liquid cavity is used for accommodating washing liquid;

a delivery pump, which is arranged in the installation cavity, the delivery pump includes a liquid inlet end and a liquid outlet end, and the liquid inlet end communicates with the installation cavity and is used for absorbing the cleaning liquid;

A first pipeline, one end of the first pipeline is communicated with the liquid outlet end, and the other end is provided with a pipeline interface adapted to the liquid inlet of the gas pipeline.
The gas pipeline cleaning mechanism of claim 1, wherein the pipeline interface comprises a first interface section and a second interface section that communicate with each other, the first interface section is in communication with the first pipeline, and the second interface section is in communication with each other. The interface segment has a threaded interface matched with the liquid inlet, and the extension direction of the second interface segment and the extension direction of the first interface segment are not on the same straight line.
The gas pipeline cleaning mechanism according to claim 2, wherein the extending direction of the second interface segment is perpendicular to the extending direction of the first interface segment.
The gas pipeline cleaning mechanism according to claim 1, wherein the gas pipeline cleaning mechanism further comprises a washing liquid bottle placed in the washing liquid chamber, and the washing liquid bottle is used for accommodating the washing liquid; The liquid inlet end communicates with the lotion bottle through a second pipeline.
The gas pipeline cleaning mechanism according to claim 4, wherein the number of the washing liquid bottles is plural, and the washing liquids contained in at least two washing liquid bottles are different.
The gas pipeline cleaning mechanism according to claim 1, wherein the housing is further provided with an adjustment switch electrically connected with the infusion pump.
The gas pipeline cleaning mechanism according to claim 1, wherein the gas pipeline cleaning mechanism further comprises a waste liquid recovery chamber, and the waste liquid recovery chamber is communicated with the liquid outlet of the gas pipeline through a third pipeline.
The gas pipeline cleaning mechanism according to claim 1, wherein the gas pipeline cleaning mechanism further comprises an alarm mechanism, and the alarm mechanism is a liquid level alarm mechanism provided in the washing liquid chamber and/or a liquid level alarm mechanism provided in the A pipeline flow alarm mechanism.
The gas pipeline cleaning mechanism according to claim 1, wherein the installation cavity is a closed cavity, and the top of the washing liquid cavity is open.
The gas pipeline cleaning mechanism according to any one of claims 1 to 9, wherein the gas pipeline cleaning mechanism further comprises a handle provided on the top.