WO2022211359A1 - 초점 가변형 액체렌즈 및 이의 제조방법 - Google Patents
초점 가변형 액체렌즈 및 이의 제조방법 Download PDFInfo
- Publication number
- WO2022211359A1 WO2022211359A1 PCT/KR2022/004087 KR2022004087W WO2022211359A1 WO 2022211359 A1 WO2022211359 A1 WO 2022211359A1 KR 2022004087 W KR2022004087 W KR 2022004087W WO 2022211359 A1 WO2022211359 A1 WO 2022211359A1
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- WIPO (PCT)
- Prior art keywords
- electrode
- liquid lens
- central electrode
- electrodes
- variable focus
- Prior art date
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 138
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 26
- 239000000758 substrate Substances 0.000 claims abstract description 31
- 230000003287 optical effect Effects 0.000 claims abstract description 29
- 239000002184 metal Substances 0.000 claims description 50
- 229910052751 metal Inorganic materials 0.000 claims description 50
- 239000003921 oil Substances 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 22
- 238000005538 encapsulation Methods 0.000 claims description 17
- 238000000151 deposition Methods 0.000 claims description 9
- 238000005229 chemical vapour deposition Methods 0.000 claims description 8
- 238000000059 patterning Methods 0.000 claims description 7
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 7
- 229920000642 polymer Polymers 0.000 claims description 7
- 239000010931 gold Substances 0.000 claims description 6
- 229920000052 poly(p-xylylene) Polymers 0.000 claims description 6
- 239000010936 titanium Substances 0.000 claims description 6
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 4
- 239000003792 electrolyte Substances 0.000 claims description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 4
- 229910004205 SiNX Inorganic materials 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 8
- 238000005516 engineering process Methods 0.000 description 7
- 238000003384 imaging method Methods 0.000 description 7
- 239000000523 sample Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 4
- 238000002604 ultrasonography Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 239000003504 photosensitizing agent Substances 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 238000012285 ultrasound imaging Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 239000004811 fluoropolymer Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000012811 non-conductive material Substances 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000003075 superhydrophobic effect Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/12—Fluid-filled or evacuated lenses
- G02B3/14—Fluid-filled or evacuated lenses of variable focal length
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
- C23C16/345—Silicon nitride
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/004—Optical devices or arrangements for the control of light using movable or deformable optical elements based on a displacement or a deformation of a fluid
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/004—Optical devices or arrangements for the control of light using movable or deformable optical elements based on a displacement or a deformation of a fluid
- G02B26/005—Optical devices or arrangements for the control of light using movable or deformable optical elements based on a displacement or a deformation of a fluid based on electrowetting
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/29—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the position or the direction of light beams, i.e. deflection
- G02F1/294—Variable focal length devices
Definitions
- the present invention relates to a variable focus liquid lens and a method for manufacturing the same, and more particularly, to a variable focus liquid lens and a method for manufacturing the same, which are applied to laser ultrasound imaging technology and manufactured in a modular form so that a three-dimensional focus is possible. .
- imaging technology using laser ultrasound has an advantage of high resolution compared to conventional ultrasound imaging technology, and thus various studies are being conducted as a next-generation medical device imaging technology.
- a light source for laser irradiation a mirror scanner or auto stage for scanning the light source on the target sample surface
- optical components such as a lens
- the focus of the light source is moved in the lateral direction by using a galvanometer and an autostage to implement three-dimensional imaging. performs a B-scan or C-scan.
- a radial signal is acquired through probe rotation for three-dimensional lateral imaging, and an additional external mechanical device for rotating the probe is essential. to be.
- the technical problem of the present invention was conceived in this regard, and the object of the present invention is to omit a mechanical driving device to configure a simple optical system, and to make the endoscope probe miniaturized and three-dimensional focus variable, so that it can be manufactured in a modular form. It is to provide a variable focus liquid lens that can be.
- Another object of the present invention is to provide a method of manufacturing the focus variable liquid lens.
- a liquid lens according to an embodiment for realizing the object of the present invention includes a base substrate, an electrode unit, and a lens unit.
- the electrode part is formed on the base substrate and includes a central electrode and a plurality of electrodes insulated from each other around the central electrode.
- the lens unit is positioned on the central electrode and includes a liquid lens through which light passes.
- the liquid lens when voltages of the same magnitude are applied to the plurality of electrodes, the liquid lens is located at the center of the central electrode so that the focus of the light is located on an optical axis passing through the center of the central electrode.
- voltages of different magnitudes are applied to any one of the plurality of electrodes, the liquid lens moves in a lateral direction from the central electrode so that the focal point of the light moves in a lateral direction from the center of the central electrode.
- the plurality of electrodes include a first electrode positioned at one side of the central electrode in a first direction, a second electrode positioned at the other side of the central electrode in the first direction, and the second electrode
- the third electrode may include a third electrode positioned on one side of the central electrode in a second direction perpendicular to the first direction, and a fourth electrode positioned on the other side of the central electrode along the second direction.
- the first to fourth electrodes are disposed in a concentric direction with respect to the central electrode, each of which has the same shape, and may be insulated from the central electrode through an insulating part.
- the central electrode and the first to fourth electrodes may receive a voltage independently of each other.
- a liquid lens manufacturing method for realizing the other object of the present invention, the step of forming an electrode portion including a center electrode and a plurality of electrodes to be spaced apart from each other on a base substrate, each of the electrodes Forming a metal layer, insulating the central electrode and the electrodes, forming an insulating layer exposing the metal layer to the outside, mounting a liquid lens on the central electrode, and forming an oil part to cover the liquid lens and forming an encapsulation part for encapsulating the oil part inside.
- the electrode part in the forming of the electrode part, after depositing the transparent electrode part on the transparent base substrate, the electrode part may be patterned to form a center electrode and a plurality of electrode parts spaced apart from each other.
- a metal layer including titanium (Ti) or gold (Au) may be formed on an externally exposed region of the electrode part.
- silicon nitride (SiNx) is deposited on the electrode portion on which the metal layer is formed by plasma enhanced chemical vapor deposition (PECVD), and then the central electrode , and the insulating layer may be formed by patterning the metal layer to be exposed to the outside.
- PECVD plasma enhanced chemical vapor deposition
- the method further comprises the step of mounting a circuit board part electrically connected to the metal layer exposed to the outside through the insulating layer, wherein the encapsulation part is an upper surface of the circuit board part.
- the circuit board unit may be a flexible printed circuit board (FPCB).
- FPCB flexible printed circuit board
- the encapsulation part may be formed by depositing a parylene polymer by chemical vapor deposition (CVD).
- CVD chemical vapor deposition
- the method may further include forming a patterned cover layer on the insulating layer to expose the metal layer and a portion of the insulating layer to the outside.
- the oil part may cover the liquid lens and may be formed up to the partially exposed insulating layer.
- the liquid lens may include an electrolyte and have conductivity, be mounted on the central electrode in a spherical shape, the oil portion may have non-conductivity including oil, and an upper surface may have a hemispherical shape.
- the position of the liquid lens positioned on the central lens is changed, and the liquid lens is formed.
- the position of the focal point of the passing light can be varied.
- the focal point of light can be positioned on the optical axis, and voltages of different magnitudes are applied to control the focal point of light to move in the lateral direction from the center of the central electrode. can do.
- the direction and focus of light can be controlled by variously controlling the magnitude of the voltage applied to the plurality of electrodes, the easiness of controlling or driving the liquid lens is also improved.
- the electrical connection with the flexible circuit board can be realized through the electrode exposure structure through patterning, the control or driving of the liquid lens can be easily performed.
- FIG. 1A is a perspective view illustrating a scan state along the optical axis of a light source in a variable focus liquid lens according to an embodiment of the present invention
- FIG. 1B is a scan in which the focus of the light source is moved in the transverse direction in the variable focus liquid lens of FIG. It is a perspective view illustrating the state.
- FIG. 2 is a schematic diagram illustrating a plurality of electrodes of the variable focus liquid lens of FIG. 1A .
- 3A to 3G are process diagrams illustrating a method of manufacturing the variable focus type liquid lens of FIG. 1A.
- 4A is a schematic diagram illustrating a driving state for scanning along an optical axis of a light source in the variable focus type liquid lens of FIG.
- FIG. 5A is a schematic diagram illustrating a driving state for scanning in which the focus of a light source is moved in the lateral direction in the variable focus type liquid lens of FIG. 1A, and FIG.
- 6A, 6B, 6C and 6D are images showing a side view of the light source in a state in which the variable focus type liquid lens of FIG. 1A is not driven, a plan view of the liquid lens, a plan view of a beam profile, and a perspective view of a beam profile.
- 7A, 7B, 7C and 7D are a side view of a light source in a driving state for scanning the variable focus liquid lens of FIG. 1A along an optical axis, a plan view of the liquid lens, a plan view of a beam profile, and a perspective view of a beam profile are images.
- 8A, 8B, 8C and 8D are a side view of a light source in a scan driving state in which the focal point of the variable focus liquid lens of FIG. 1A is moved in the lateral direction, a plan view of the liquid lens, a plan view of a beam profile, and a beam profile Images showing a perspective view of
- variable focus liquid lens 100 base substrate
- electrode part 111 center electrode
- first electrode 113 second electrode
- lens unit 210 lens unit
- FIG. 1A is a perspective view illustrating a scan state along the optical axis of a light source in a variable focus liquid lens according to an embodiment of the present invention
- FIG. 1B is a scan in which the focus of the light source is moved in the transverse direction in the variable focus liquid lens of FIG. It is a perspective view illustrating the state.
- FIG. 2 is a schematic diagram illustrating a plurality of electrodes of the variable focus liquid lens of FIG. 1A .
- variable focus liquid lens 10 includes a base substrate 100 , an electrode unit 110 , and a lens unit 200 .
- the base substrate 100 may have a plate shape extending to a predetermined width as a transparent substrate, and the material may be glass or plastic, and if transparent, various materials may be used.
- the electrode part 110 is formed on the base substrate 100, and a central electrode (refer to FIGS. 2 and 3A, 111) formed in the center (in FIGS. 1A and 1B, it extends from the central electrode and is exposed to the outside).
- a central electrode (refer to FIGS. 2 and 3A, 111) formed in the center (in FIGS. 1A and 1B, it extends from the central electrode and is exposed to the outside).
- a plurality of electrodes 112, 113, 114, and 115 radially formed around the central electrode 111 are examples of the central electrode 111.
- the central electrode 111 is formed in the center of the base substrate 100 , and the lens unit 200 is mounted and positioned on the central electrode 111 .
- a voltage must be applied from the outside through the center electrode 111 if necessary, and for this purpose, the center electrode 111 must be exposed to the outside.
- the lens unit 200 since the lens unit 200 is mounted on the central electrode 111 , it cannot be directly exposed to the outside in the upward direction like other electrodes.
- the center electrode 111 extends to an area adjacent to the area where the third electrode 114 is exposed and is exposed to the outside, and thus the center electrode 111 is exposed to the outside. is shown to be disposed adjacent to the third electrode 114 .
- the terminal for exposing the central electrode 111 is exposed to the outside, and substantially the central electrode 111 is the lens unit ( It is preferable to understand that it is located in the center of the base substrate 100 on which the 200) is mounted.
- the central electrode 111 is exposed at a position adjacent to the third electrode 114 , but unlike this, the central electrode 111 is the first electrode 112 . Of course, it may extend so as to be exposed at a position adjacent to the second electrode 113 or the fourth electrode 115 .
- the plurality of electrodes 112 , 113 , 114 , and 115 include first to fourth electrodes, and the first electrode 112 moves in a first direction ( is formed on one side along X), the second electrode 113 is formed on the other side of the central electrode 111 in the first direction X, and the third electrode 114 is the center electrode (111) is formed on one side along the second direction (Y), and the fourth electrode 115 is formed on the other side of the center electrode (111) along the second direction (Y).
- first direction (X) and the second direction (Y) extend perpendicular to each other.
- the first to fourth electrodes 112 , 113 , 114 , and 115 are disposed in a concentric or radial direction with respect to the central electrode 111 , and the central electrode Based on the center of (111), they are formed symmetrically to each other left and right and up and down.
- first to fourth electrodes 112 , 113 , 114 , and 115 are insulated from adjacent electrodes and disposed to be spaced apart from each other, and similarly, the center electrode 111 is also formed by the first to fourth electrodes ( 112, 113, 114, 115) and insulated from each other and disposed to be spaced apart from each other.
- the insulating state between the central electrode 111 and the first to fourth electrodes 112 , 113 , 114 , 115 may be schematically illustrated as shown in FIG. 2 , and insulation between the electrodes A portion 401 is formed.
- each of the first to fourth electrodes 112 , 113 , 114 , 115 is electrically connected to the first to fourth terminals 402 , 403 , 404 , and 405 . , may receive a voltage from the outside, and the voltages thus provided are independently provided to the first to fourth electrodes 112 , 113 , 114 and 115 .
- the first electrode 112 receives a first voltage Vx- through the first terminal 402
- the second electrode 113 receives the A second voltage (Vx+) is provided through the second terminal 403
- the third electrode 114 receives a third voltage Vy ⁇ through the third terminal 404
- the fourth electrode It can be assumed that 115 receives the fourth electrode Vy+ through the fourth terminal 405 .
- the lens unit 200 is mounted on the central electrode 111 , and includes a liquid lens 210 , an oil unit 220 , and an encapsulation unit 230 .
- the liquid lens 210 is formed of an electrolyte-based conductive material having a predetermined volume, and is mounted on the central electrode 111 to serve as a lens through which laser light is transmitted.
- the liquid lens 210 for example, has a spherical shape and corresponds to a lens that forms a focal point F as shown in the upper part as the laser light is transmitted.
- the oil part 220 covers the liquid lens 210 and includes, for example, non-conductive oil, and the outer surface may form a partial surface of a hemispherical shape. Therefore, the oil part 220 covers the liquid lens 210 positioned on the central electrode 111, and is formed while forming a hemispherical space therein with an area larger than the area formed by the central electrode 111.
- the encapsulation unit 230 covers the outer surface of the oil unit 220 as well as the electrode unit 110 to encapsulate the electrode unit 110 , the oil unit 220 , and the liquid lens 210 .
- encapsulation for example, may be formed of a material such as a parylene polymer (Parylene polymer).
- a pattern is formed so that a part of the electrode part 110 is exposed to the outside, and a part of the electrode part exposed in this way is not shown in FIGS. 1A and 1B, but a flexible circuit board. (flexible printed circuit board, FPCB) can be electrically connected.
- FPCB flexible printed circuit board
- the laser light source 300 provided from the outside is focused through the liquid lens 210.
- the irradiation direction of the laser light source 300 depends on the position of the liquid lens 210. is variable
- the laser light source 300 passing through the liquid lens 210 is the central electrode 111 .
- the focal point F is positioned on the optical axis L passing through the center of the .
- the liquid lens 210 is the central electrode. It is located at the center of (111), and accordingly, the focal point F of the laser light source 300 is located on the optical axis L.
- the laser light source 300 passing through the liquid lens 210 is The optical axis L passing through the center of the central electrode 111 and the axis inclined at a predetermined angle ⁇ ( ), the focus (F) is located.
- the liquid lens 210 . is positioned by moving in one direction from the central electrode 111, and accordingly, the focal point F of the laser light source 300 is inclined at a predetermined angle ⁇ with the optical axis L. ) is located on the
- the position of the liquid lens 210 is adjusted to either side. , and further, it can be changed to the various positions, and through this, the focus F of the laser light source 300 can be positioned on an axis inclined at a predetermined angle from the optical axis L.
- variable focus type liquid lens 10 a method of manufacturing the variable focus type liquid lens 10 will be described in detail.
- 3A to 3G are process diagrams illustrating a method of manufacturing the variable focus type liquid lens of FIG. 1A.
- the electrode unit 110 including a center electrode 111 and a plurality of electrodes 112 and 113 on a base substrate 100 . ) to form
- FIGS. 3A to 3G are cross-sectional views taken along the first direction X of FIGS. 1A and 1B , only the first and second electrodes 112 and 113 among the electrodes are shown in the drawings. However, in the case of arrangement and formation of other electrodes, it is possible to predict within an obvious range through arrangement and formation of the first and second electrodes 112 and 113 .
- a transparent electrode is deposited on the base substrate 100 , and then patterned by an etching process using a mask, and thus the central electrode 111 and the central electrode.
- the first and second electrodes 112 and 113 positioned on both sides of the central electrode 111 are formed to be spaced apart from the 111 by a predetermined distance.
- the base substrate 100 may be a transparent glass or plastic substrate
- the electrode unit 110 may also be a transparent electrode, for example, an indium tin oxide (ITO) electrode.
- ITO indium tin oxide
- a first metal layer 122 and a second metal layer 123 in partial regions on the first electrode 112 and the second electrode 113 of the electrode part 110 , respectively. ) forming the metal layer 120 is performed.
- a photosensitive agent is formed on the base substrate 100 on which the electrode part 110 is formed, and among the photosensitizers, a circuit board part 150 to be described later and A process of removing the contact area or the area where the alignment mark is formed may be performed.
- the metal layer 120 may be deposited only on the region from which the photosensitizer has been removed. Accordingly, the first metal layer 122 is formed on a partial region of the first electrode 112 and the second metal layer 123 is It may be deposited on a partial region on the second electrode 113 .
- the first and second metal layers 122 and 123 may include a metal such as titanium (Ti) or gold (Au).
- an insulating layer 130 is formed on the base substrate 100 on which the metal layer 120 and the electrode part 110 are formed.
- the insulating layer 130 is formed on the base substrate 100 on which the metal layer 120 and the electrode part 110 are formed, for example, by plasma enhanced chemical vapor deposition (PECVD). After deposition, it is patterned through an etching process or the like.
- PECVD plasma enhanced chemical vapor deposition
- the central exposed portion 131 is formed on the central electrode 111
- the first exposed portion 132 is formed on the first electrode 112 and the first metal layer 122 .
- a second exposed portion 133 is formed on the second electrode 113 and the second metal layer 123 .
- the insulating layer 130 may include, for example, silicon nitride (SiNx). Alternatively, the insulating layer 130 may include, for example, silicon oxide (SiO 2 ), aluminum oxide (Al 2 O 3 ), parylene polymer, or the like.
- the silicon nitride or silicon oxide it may be deposited through the plasma-enhanced chemical vapor deposition described above, and in the case of the aluminum oxide, it is to be deposited through an atomic layer deposition (ALD) or sputtering process.
- ALD atomic layer deposition
- the perylene polymer it may be deposited by a chemical vapor deposition (CVD) process.
- a pattern for exposing the metal layers 122 and 123 and a portion of the insulating layer 130 to the outside is included.
- a cover layer 140 is formed.
- cover layer 140 In the formation of the cover layer 140 , a superhydrophobic fluoropolymer-based CYTOP is applied on the base substrate 100 on which the insulating layer 130 is formed, and then patterned using a mask to form the cover layer 140 . ) to form
- the cover layer 140 forms the first metal layer 122 and the second metal layer 123 through the first exposed portion 132 and the second exposed portion 133 .
- the center electrode 111 is exposed through the central exposed portion 131 to the outside, and the first electrode portion 112 is exposed through the first opening 141 and the second opening 142
- a partial region of the insulating layer 130 formed on the ? and a partial region of the insulating layer 130 formed on the second electrode part 113 are exposed to the outside.
- the circuit board unit 150 is formed on the base substrate 100 on which the electrode unit 110 , the metal layer 120 , the insulating layer 130 , and the cover layer 140 are formed. ) is installed.
- the circuit board part 150 includes a first contact part 152 electrically connected to the first metal layer 122 through the first exposed part 132 , and the second exposed part ( a second contact portion 153 electrically connected to the second metal layer 123 through 133 , and a central contact portion 151 electrically connected to the central electrode 111 through the central exposed portion 131 . ) is included.
- the circuit board part 150 is electrically connected to the first metal layer 122 and the first electrode 112 through the first contact part 152 to supply power to the first electrode 112 .
- the circuit board part 150 is electrically connected to the central electrode 111 through the central contact part 151 to provide power to the central electrode 111 or to ground the central electrode 111 . can be grounded.
- the circuit board unit 150 may be, for example, a flexible printed circuit board (FPCB), and as described above, the first metal layer 122 , the second metal layer 123 , and the central electrode (111) and ACF (anisotropic conductive film) bonding (bonding) can be connected.
- FPCB flexible printed circuit board
- the circuit board unit 150 is shown as being entirely located and connected to the upper portion of the base substrate 100 in FIG. 3E, but the circuit board unit 150 is, as shown in FIGS. 1A and 1B,
- the first metal layer 122 , the second metal layer 123 , the third metal layer 124 , the fourth metal layer 125 , and the central metal layer 121 extending from the central electrode 111 and exposed to the outside are exposed to the outside. It is sufficient if it is electrically connected to the circuit board 150 , and thus the connection position of the circuit board unit 150 may be formed in various ways.
- the circuit board part 150 is not connected to the area adjacent to the central electrode 111 or the central electrode 111 in which the liquid lens 210 and the oil part 220, which will be described later, are formed. can do.
- the liquid lens 210 is mounted on the central electrode 111 located in the center of the base substrate 100 , and the oil part 220 covers the liquid lens 210 . to form
- the liquid lens 210 for example, as shown, has a spherical shape having a constant volume, and may be dispensed onto the central electrode 111 .
- the liquid lens 210 may be a material having electrolyte-based conductivity.
- the liquid lens 210 when the liquid lens 210 is positioned on the central electrode 111 , it is positioned to be seated on the central exposed portion 131 as shown in FIG. 3G .
- the oil part 220 is formed in the liquid lens 210 and a peripheral area of the liquid lens 210 to cover the liquid lens 210 .
- the oil part 220 covers the liquid lens 210 and forms the liquid lens 210 and the liquid lens 210 in a peripheral area of the first opening 141 and the liquid lens 210 to have a predetermined thickness. It is formed up to the area where the second opening 142 is formed.
- the oil part 220 may be formed to have an overall hemispherical shape.
- the oil part 220 may include a non-conductive material including oil, and accordingly, the oil part 220 insulates the liquid lens 210 .
- an encapsulation unit 230 for encapsulating the oil unit 220 therein is formed on the base substrate 100 on which the liquid lens 210 and the oil unit 220 are formed.
- the encapsulation part 230 may be uniformly deposited on the outer surface of the oil part 220 , and uniformly over the entire surface of the base substrate 100 up to a region where the oil part 200 is not formed. can be deposited.
- the encapsulation part 230 may be formed by depositing a parylene polymer by chemical vapor deposition (CVD).
- first metal layer 122 and the second metal layer 123 may be patterned to be exposed to the outside, and accordingly, the first external exposed part 231 and the second externally exposed part are also on the encapsulation part 230 .
- a portion 232 may be formed.
- the encapsulation unit 230 should be patterned in consideration of this.
- the liquid lens 210 and the oil part 220 are encapsulated inside and stably positioned through the encapsulation part 230, and the degree of variation of the liquid lens 210 is limited to a certain range.
- variable focus type liquid lens 10 is manufactured.
- 4A is a schematic diagram illustrating a driving state for scanning along an optical axis of a light source in the variable focus type liquid lens of FIG.
- the central electrode 111 and the first to fourth electrodes 112 , 113 , 114 and 115 in the variable focus type liquid lens 10 according to the present embodiment can be simply modeled. , through which the driving of the variable focus type liquid lens 10 will be described.
- the liquid lens 210 is positioned at the center of the central electrode 111 .
- the focal point F of the laser light 300 irradiated toward the liquid lens 210 is located on the optical axis L passing through the center of the central electrode 111 .
- the liquid lens 210 is positioned so that the center of the liquid lens 210 is located at the center of the central electrode 111 without changing from the initial position, and accordingly, the focus F is the optical axis. It is located on (L).
- the magnitude of the voltage of the first to fourth electrodes 112, 113, 114, 115 is varied (the voltage applied to all electrodes is the same, meaning that the magnitude of the applied voltage is increased or decreased),
- the refractive index of the liquid lens 210 is changed, and accordingly, the position of the focal point F of the laser light 300 is changed on the optical axis L.
- FIG. 5A is a schematic diagram illustrating a driving state for scanning in which the focus of a light source is moved in the lateral direction in the variable focus liquid lens of FIG. 1A, and FIG.
- the first electrode 112 , the third electrode 114 , and the fourth electrode 115 are all the same voltage Va is applied, but when the second electrode 113 is connected to the ground, as shown in FIG. 5B , the liquid lens 210 moves from the center of the central electrode 111 to one side.
- a voltage Va of a predetermined magnitude is applied to the first electrode 112, but a ground is connected to the second electrode 113, so that the first electrode 112 is located.
- direction is moved a predetermined distance. That is, it moves to a side to which a relatively high voltage is applied.
- the central electrode 111 is positioned on an axis shifted to one side from the optical axis L passing through the center.
- the focus F of the laser light 300 is an axis inclined in the direction of the second electrode 113 . may be located on the
- the focal point F passing through the liquid lens 210 . is located on the axis inclined at a predetermined angle from the optical axis L.
- the focus F may be located on an axis inclined toward the second electrode 113, In consideration of this, the position of the focal point F may be variously controlled by controlling the voltage applied to the respective electrodes.
- the inclination angle of the inclination axis at which the focus F is positioned is variously controlled. be able to do
- variable focus liquid lens 100 by variously controlling the voltage applied to the electrodes, the focus of light can be varied in various directions, and the focus of the liquid lens is variable in three-dimensional space. can be implemented.
- 6A, 6B, 6C and 6D are images showing a side view of the light source in a state in which the variable focus type liquid lens of FIG. 1A is not driven, a plan view of the liquid lens, a plan view of a beam profile, and a perspective view of a beam profile.
- variable focus liquid lens 10 in the variable focus liquid lens 10 according to the present embodiment, in a state in which no voltage is applied to all of the first to fourth electrodes 112, 113, 114, and 115 , In the case of the laser light 300 passing through the liquid lens 210, it is confirmed that the laser light 300 passes through the center of the central electrode 111 and the focus of the laser light 300 is located on the optical axis L. can
- 7A, 7B, 7C and 7D are a side view of a light source in a driving state for scanning the variable focus liquid lens of FIG. 1A along an optical axis, a plan view of the liquid lens, a plan view of a beam profile, and a perspective view of a beam profile are images.
- variable focus liquid lens 10 in the variable focus liquid lens 10 according to the present embodiment, the same voltage is applied to all of the first to fourth electrodes 112 , 113 , 114 and 115 .
- the laser light 300 passes through the center of the central electrode 111 and the focus of the laser light 300 is located on the optical axis L. that can be checked
- 8A, 8B, 8C and 8D are a side view of a light source in a scan driving state in which the focal point of the variable focus liquid lens of FIG. 1A is moved in the lateral direction, a plan view of the liquid lens, a plan view of a beam profile, and a beam profile Images showing a perspective view of
- variable focus liquid lens 10 in the variable focus liquid lens 10 according to the present embodiment, only any one of the first to fourth electrodes 112 , 113 , 114 , 115 is different.
- an axis inclined at a predetermined angle with respect to the optical axis L without passing through the center of the central electrode 111 is selected. Accordingly, it can be confirmed that the focus of the laser light 300 is located.
- variable focus liquid lens 10 As described above, even through the results of performing an experiment by applying an actual voltage through the variable focus liquid lens 10 manufactured through FIGS. 3A to 3G, it is applied to each electrode of the variable focus liquid lens 10 It can be seen that the position of the focus of the light passing through the focusable liquid lens 10 can be variously controlled by variously controlling the voltage to be applied.
- the position of the liquid lens positioned on the central lens is changed, and the liquid lens is formed.
- the position of the focal point of the passing light can be varied.
- the focal point of light can be positioned on the optical axis, and voltages of different magnitudes are applied to control the focal point of light to move in the lateral direction from the center of the central electrode. can do.
- the direction and focus of light can be controlled by variously controlling the magnitude of the voltage applied to the plurality of electrodes, the easiness of controlling or driving the liquid lens is also improved.
- the electrical connection with the flexible circuit board can be realized through the electrode exposure structure through patterning, the control or driving of the liquid lens can be easily performed.
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Abstract
Description
Claims (14)
- 베이스 기판;상기 베이스 기판 상에 형성되며, 중앙전극 및 상기 중앙전극의 주변에 서로 절연되며 위치하는 복수의 전극들을 포함하는 전극부; 및상기 중앙전극에 위치하며 광이 통과하는 액체렌즈를 포함하는 렌즈유닛을 포함하며,상기 복수의 전극들에 동일한 크기의 전압이 인가되는 경우, 상기 액체렌즈는 상기 중앙전극의 중앙에 위치하여 상기 광의 초점은 상기 중앙전극의 중심을 관통하는 광축 상에 위치하며,상기 복수의 전극들 중 어느 하나에 다른 크기의 전압이 인가되는 경우, 상기 액체렌즈는 상기 중앙전극으로부터 횡방향으로 이동하여 상기 광의 초점이 상기 중앙전극의 중심으로부터 횡방향으로 이동되는 것을 특징으로 하는 초점 가변형 액체렌즈.
- 제1항에 있어서, 상기 복수의 전극들은,제1 방향을 따라 상기 중앙전극의 일 측에 위치하는 제1 전극;상기 제1 방향을 따라 상기 중앙전극의 타 측에 위치하는 제2 전극;상기 제1 방향에 수직인 제2 방향을 따라 상기 중앙전극의 일 측에 위치하는 제3 전극; 및상기 제2 방향을 따라 상기 중앙전극의 타 측에 위치하는 제4 전극을 포함하는 것을 특징으로 하는 초점 가변형 액체렌즈.
- 제2항에 있어서, 상기 제1 내지 제4 전극들은,상기 중앙전극을 중심으로 동심원 방향으로 배치되며, 각각은 모두 동일한 형상을 가지며,상기 중앙전극과의 사이에서 절연부를 통해 절연되는 것을 특징으로 하는 초점 가변형 액체렌즈.
- 제3항에 있어서, 상기 중앙전극, 및 상기 제1 내지 제4 전극들은,서로 독립적으로 전압을 제공받는 것을 특징으로 하는 초점 가변형 액체렌즈.
- 베이스 기판 상에, 서로 이격되도록 중앙전극 및 복수의 전극들을 포함하는 전극부를 형성하는 단계;상기 전극들 각각에 금속층을 형성하는 단계;상기 중앙전극 및 상기 전극들을 절연시키며, 상기 금속층을 외부로 노출시키는 절연층을 형성하는 단계;상기 중앙전극 상에 액체렌즈를 실장시키고, 상기 액체렌즈를 커버하도록 오일부를 형성하는 단계; 및상기 오일부를 내부로 캡슐화하는 캡슐화부를 형성하는 단계를 포함하는 초점 가변형 액체렌즈 제조방법.
- 제5항에 있어서, 상기 전극부를 형성하는 단계에서,투명한 상기 베이스 기판 상에 투명한 상기 전극부를 증착시킨 후,상기 전극부를 패터닝하여 서로 이격되는 중앙전극 및 복수의 전극부들을 형성하는 것을 특징으로 하는 초점 가변형 액체렌즈 제조방법.
- 제5항에 있어서, 상기 금속층을 형성하는 단계에서,상기 전극부 중 외부로 노출되는 영역 상에 티타늄(Ti) 또는 금(Au)을 포함하는 금속층을 형성하는 것을 특징으로 하는 초점 가변형 액체렌즈 제조방법.
- 제5항에 있어서, 상기 절연층을 형성하는 단계에서,상기 금속층이 형성된 전극부 상에 질화실리콘(SiNx)을 플라즈마 강화 화학기상증착(plasma enhanced chemical vapor deposition, PECVD)으로 증착한 후,상기 중앙전극, 및 상기 금속층이 외부로 노출되도록 패터닝하여 상기 절연층을 형성하는 것을 특징으로 하는 초점 가변형 액체렌즈 제조방법.
- 제1항에 있어서, 상기 절연층을 형성하는 단계 이후,상기 절연층을 통해 외부로 노출되는 상기 금속층에 전기적으로 연결되는 회로기판부를 실장하는 단계를 더 포함하고,상기 캡슐화부는 상기 회로기판부의 상면을 따라 형성되는 것을 특징으로 하는 초점 가변형 액체렌즈 제조방법.
- 제9항에 있어서, 상기 회로기판부는,유연 회로기판(flexible printed circuit board, FPCB)인 것을 특징으로 하는 초점 가변형 액체렌즈 제조방법.
- 제9항에 있어서, 상기 캡슐화부는,페릴렌 폴리머(Parylene polymer)를 화학 기상증착(chemical vapor deposition, CVD)으로 증착하여 형성되는 것을 특징으로 하는 초점 가변형 액체렌즈 제조방법.
- 제9항에 있어서, 상기 회로기판부를 실장하는 단계 전에,상기 절연층 상에, 상기 금속층 및 상기 절연층의 일부를 외부로 노출시키도록 패터닝된 커버층을 형성하는 단계를 더 포함하는 초점 가변형 액체렌즈 제조방법.
- 제12항에 있어서, 상기 오일부는,상기 액체렌즈를 커버하며 상기 일부 노출된 절연층까지 형성되는 것을 특징으로 하는 초점 가변형 액체렌즈 제조방법.
- 제5항에 있어서,상기 액체렌즈는 전해질을 포함하여 전도성을 가지며, 구형 형상으로 상기 중앙전극 상에 실장되고,상기 오일부는 오일을 포함하는 비전도성을 가지며, 상면은 반구형 형상을 가지는 것을 특징으로 하는 초점 가변형 액체렌즈 제조방법.
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US18/284,030 US20240019611A1 (en) | 2021-03-31 | 2022-03-23 | Focus variable liquid lens and method of manufacturing the same |
EP22781479.5A EP4318053A1 (en) | 2021-03-31 | 2022-03-23 | Variable focus liquid lens and manufacturing method therefor |
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